TW201641293A - Apparatus for manufacturing lamination device - Google Patents

Apparatus for manufacturing lamination device Download PDF

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Publication number
TW201641293A
TW201641293A TW105110146A TW105110146A TW201641293A TW 201641293 A TW201641293 A TW 201641293A TW 105110146 A TW105110146 A TW 105110146A TW 105110146 A TW105110146 A TW 105110146A TW 201641293 A TW201641293 A TW 201641293A
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Taiwan
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workpiece
holding member
holding surface
workpieces
holding
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TW105110146A
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Chinese (zh)
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TWI604952B (en
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Yoshikazu Ohtani
Kenji Sato
Kazuya Fujita
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Shinetsu Eng Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/0046Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by constructional aspects of the apparatus
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/10Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the pressing technique, e.g. using action of vacuum or fluid pressure
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133302Rigid substrates, e.g. inorganic substrates
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/33Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes
    • G09F9/335Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes being organic light emitting diodes [OLED]
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/35Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being liquid crystals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Fluid Mechanics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Liquid Crystal (AREA)
  • Laminated Bodies (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The abrasion of a first workpiece holding surface and a second workpiece holding surface with time is prevented, while the contact areas of the first workpiece holding surface and the second workpiece holding surface with respect to a workpiece are minimized. The present invention pertains to an apparatus for manufacturing a lamination device in which a pair of workpieces is held by a first holding member and a second holding member, respectively, and is positioned and laminated to each other by the relative approaching movements between the first holding member and the second holding member, wherein one of or both the first workpiece holding surface of the first holding member and the second workpiece holding surface of the second holding member are provided with a hard covering layer opposed to one of or both the pair of workpieces and having a front surface thereof formed in a concavo-convex shape by a material harder than those of the first holding member, the second holding member, and the pair of workpieces, and the hard covering layer has a plurality of supporting projections projecting from one of or both the first workpiece holding surface and the second workpiece holding surface toward one of or both the pair of workpieces in a chevron shape and brought into point-contact with one of or both smooth surfaces of the pair of workpieces.

Description

貼合設備的製造裝置 Manufacturing device for bonding equipment

本發明係有關一種於例如液晶顯示器(LCD)、有機EL顯示器(OLED)、電漿顯示器(PDP)、可撓性顯示器等平板顯示器(FPD)或感測器設備、或者例如觸控面板式FPD或3D(3維)顯示器或電子書籍等液晶模組(LCM)或可撓性印刷電路板(FPC)等板狀工件上,再貼合一張如觸控面板或保護玻璃或保護膜或FPD等板狀工件之貼合設備的製造裝置。 The present invention relates to a flat panel display (FPD) or sensor device such as a liquid crystal display (LCD), an organic EL display (OLED), a plasma display (PDP), a flexible display, or a touch panel type FPD. Or a 3D (3D) display or a liquid crystal module (LCM) such as an electronic book or a flexible printed circuit board (FPC), such as a touch panel or a protective glass or protective film or FPD. A manufacturing apparatus for a bonding apparatus such as a plate-like workpiece.

以往,作為該種貼合設備的製造裝置,有如下基板重疊裝置,亦即沿設置於上側基板保持件及下側基板保持件之貫穿孔,以能夠上下移動之方式分別設置上側基板及下側基板的交接用升降銷,在大氣壓下搬入時,藉由以從上側基板保持件及下側基板保持件的表面突出之方式上下移動之升降銷個別地接收以搬送機器人臂保持並搬送之上側基板及下側基板,接著,升降銷進行反向移動,將上側基板及下側基板分別地交接到上側基板保持件及下側基板保持件的表面(例如,參照專利文獻1)。 Conventionally, as a manufacturing apparatus of such a bonding apparatus, there is a substrate stacking device in which an upper substrate and a lower side are provided so as to be movable up and down along a through hole provided in the upper substrate holder and the lower substrate holder. When the lift pins of the substrate are transported under the atmospheric pressure, the lift pins that are vertically moved so as to protrude from the surfaces of the upper substrate holder and the lower substrate holder are individually received by the transfer robot arm and transported to the upper substrate. In the lower substrate, the lift pins are moved in the reverse direction, and the upper substrate and the lower substrate are respectively transferred to the surfaces of the upper substrate holder and the lower substrate holder (see, for example, Patent Document 1).

接著,上側基板保持件真空吸附所接收之上側基板而保持,下側基板保持件吸附下側基板而保持,上側基板保持件與下側基板保持件靠近移動而使兩者之間的真空容器內成為真空狀態之後,將上側基板與下側基板定位之後進行重疊並臨時固定。臨時固定之後,解除上側基板保持件對上側基板的保持,使上側基板保持件遠離移動至原來 的位置,接下來待真空容器內成為大氣壓之後,藉由升降銷將被貼合之一對基板交接到搬送機器人臂並搬出。 Then, the upper substrate holder is vacuum-sucked and received by the upper substrate, the lower substrate holder is held by the lower substrate, and the upper substrate holder and the lower substrate holder are moved closer to each other in the vacuum container. After the vacuum state is reached, the upper substrate and the lower substrate are positioned, and then overlapped and temporarily fixed. After the temporary fixing, the upper substrate holding member is released from the upper substrate, and the upper substrate holding member is moved away from the original Then, after the inside of the vacuum container becomes atmospheric pressure, one of the bonded substrates is transferred to the transfer robot arm by the lift pins and carried out.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本特開2002-229471號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2002-229471

然而,就該種習知之貼合設備的製造裝置而言,上側基板保持件藉由吸附口真空吸附上側基板而保持,因此基板的一部分向吸附口彎曲變形而發生翹曲。由此,無法將上側基板及下側基板高精度地對準位置來進行貼合。 However, in the manufacturing apparatus of the conventional bonding apparatus, the upper substrate holder is held by vacuum suction of the upper substrate by the adsorption port, and therefore a part of the substrate is bent and deformed toward the adsorption port to cause warpage. Therefore, the upper substrate and the lower substrate cannot be aligned with each other with high precision.

而且,從上側基板保持件的基板保持面剝離上側基板之動作在真空中,以絕乾狀態(濕度幾乎為0%的狀態)下進行,因此伴隨著基板對基板保持面的接觸及剝離,在為絕緣體的基板中積蓄靜電,剝離帶電之影響變得非常大。並且,為了保持真空狀態而在密閉空間內進行剝離動作,因此與在空氣中的剝離動作不同,使用氣壓吹氣型靜電消除器(Blow type ionizer)或光照射型靜電消除器(Photoionizer)來輕鬆地去除所產生之剝離帶電實際上亦為困難之條件。 Further, the operation of peeling off the upper substrate from the substrate holding surface of the upper substrate holder is performed in a vacuum state in a state of absolute humidity (a state in which the humidity is almost 0%), so that the substrate is in contact with and peeled off from the substrate holding surface. Static electricity is accumulated in the substrate of the insulator, and the influence of the peeling electrification becomes extremely large. Further, since the peeling operation is performed in the sealed space in order to maintain the vacuum state, it is easy to use a Blow type ionizer or a photo-irradiation static eliminator (Photoionizer) unlike the peeling operation in the air. The stripping charge generated by the ground removal is actually a difficult condition.

由此,由於剝離帶電所產生之電荷而對導電部分發生電弧放電,存在於基板的貼合面之電子電路等引起斷線、或者雖然不至破損,但具有因靜電而改變其特性之問題。 As a result, arc discharge occurs in the conductive portion due to the electric charge generated by the stripping, and the electronic circuit or the like which is present on the bonding surface of the substrate causes disconnection or does not break, but has a problem of changing its characteristics due to static electricity.

並且,在完成基板的貼合而返回到大氣壓之後,使用升降銷從下側基板保持件的基板保持面分開已貼合之一對基板,但由於基板保持面與基板的界面彼此平滑地形成,因此會存在基板保持面與基板的界面黏贴之情況。這種情況下,若使用升降銷將已貼合之一對基板的 一部分強行推離,則基板保持面與基板之間會暫時成為真空狀態,已貼合之一對基板瞬間被拉至下側基板保持件而發生翹曲。即使以高精度貼合基板,若在剝離時造成局部翹曲,則會存在對位精度變差而造成部分產品出現缺陷之問題。 After the substrate is bonded and returned to the atmospheric pressure, the pair of substrates are bonded from the substrate holding surface of the lower substrate holder by the lift pins, but since the interface between the substrate holding surface and the substrate is smoothly formed, Therefore, there is a case where the substrate holding surface is adhered to the interface of the substrate. In this case, if the lift pin is used, it will be attached to one of the substrates. When a part of the substrate is forcibly pushed away, the substrate holding surface and the substrate temporarily become in a vacuum state, and one of the bonded substrates is instantaneously pulled to the lower substrate holder and warped. Even if the substrate is bonded with high precision, if local warpage occurs at the time of peeling, there is a problem that the alignment accuracy is deteriorated and some products are defective.

因此,為了解決這種問題,藉由在上側基板保持件及下側基板保持件的基板保持面形成凹凸部以減少與基板的接觸面積,認為能夠在抑制基板保持面與基板的界面所產生之靜電的同時,防止基板保持面與基板的真空密著可想而知。 Therefore, in order to solve such a problem, it is considered that the interface between the substrate holding surface and the substrate can be suppressed by forming the uneven portion on the substrate holding surface of the upper substrate holder and the lower substrate holder to reduce the contact area with the substrate. At the same time as static electricity, it is conceivable to prevent vacuum adhesion between the substrate holding surface and the substrate.

然而,在這種情況下,若上側基板保持件的基板保持面及下側基板保持件的基板保持面係由與作為基板的材質之玻璃或矽等相比更軟的鋁等金屬形成,則由於基板與上側基板保持件及下側基板保持件的基板保持面反復接觸時產生之摩擦,會導致隨著時間的經過凸部逐漸磨損,最終基板會成為面接觸。 However, in this case, when the substrate holding surface of the upper substrate holder and the substrate holding surface of the lower substrate holder are formed of a metal such as aluminum which is softer than glass or tantalum as a material of the substrate, The friction generated when the substrate repeatedly contacts the substrate holding surface of the upper substrate holder and the lower substrate holder causes the convex portion to gradually wear over time, and finally the substrate becomes surface contact.

其結果,經長時間,存在著無法抑制基板保持面與基板的界面所產生之靜電、無法防止基板保持面與基板的真空密著之問題。 As a result, there is a problem that static electricity generated at the interface between the substrate holding surface and the substrate cannot be suppressed over a long period of time, and it is impossible to prevent vacuum adhesion between the substrate holding surface and the substrate.

為了實現此種問題,本發明之貼合設備的製造裝置係將一對工件分別保持於第1保持構件和第2保持構件,藉由前述第1保持構件和前述第2保持構件相對地靠近移動,而將前述一對工件對位貼合者,且,前述第1保持構件的第1工件保持面或前述第2保持構件的第2工件保持面中的任意一方或雙方具備硬塗層,該硬塗層與前述一對工件中的一方或雙方對向,並且其表面以較前述第1保持構件、前述第2保持構件、及前述一對工件的材質更硬之材料形成為凹凸形狀,前述硬塗層係自前述第1工件保持面或前述第2工件保持面中的任意一方或雙方向前述一對工件中的一方或雙方呈山狀突出,且具有與前述一對工件中的一方的平滑表面或雙方的平滑表面分別地點接觸之複數個支撐突 起。 In order to achieve such a problem, the manufacturing apparatus of the bonding apparatus of the present invention holds the pair of workpieces in the first holding member and the second holding member, respectively, and the first holding member and the second holding member move relatively close to each other. And the pair of workpieces are aligned, and one or both of the first workpiece holding surface of the first holding member or the second workpiece holding surface of the second holding member are provided with a hard coat layer. The hard coat layer faces one or both of the pair of workpieces, and the surface thereof is formed into a concavo-convex shape by a material harder than the materials of the first holding member, the second holding member, and the pair of workpieces, and the The hard coat layer protrudes in a mountain shape from one of the first workpiece holding surface or the second workpiece holding surface or the pair of workpieces in the bidirectional direction, and has one of the pair of workpieces. a plurality of support protrusions on a smooth surface or a smooth surface on both sides Start.

1‧‧‧第1保持構件 1‧‧‧1st holding member

1a‧‧‧第1工件保持面 1a‧‧‧1st workpiece holding surface

1b‧‧‧第1工件保持面1a的域外面 1b‧‧‧ outside the domain of the first workpiece holding surface 1a

1h‧‧‧開鑿於第1保持構件之貫穿孔 1h‧‧‧through hole in the first holding member

2‧‧‧第2保持構件 2‧‧‧2nd holding member

2a‧‧‧第2工件保持面 2a‧‧‧2nd workpiece holding surface

2b‧‧‧第2工件保持面2a的域外面 2b‧‧‧ outside the domain of the second workpiece holding surface 2a

2h‧‧‧開鑿於第2保持構件2之貫穿孔 2h‧‧‧through hole in the second holding member 2

3‧‧‧保持卡盤 3‧‧‧ Keeping the chuck

4‧‧‧接觸分離用驅動部 4‧‧‧Contact separation drive unit

5‧‧‧定位用驅動部 5‧‧‧ Positioning drive unit

6‧‧‧控制部 6‧‧‧Control Department

7‧‧‧剝離構件 7‧‧‧ peeling members

7a‧‧‧升降銷 7a‧‧‧lifting pin

7b‧‧‧剝離用從動部 7b‧‧‧Removal slave

7c‧‧‧剝離用驅動部 7c‧‧‧ peeling drive unit

12‧‧‧硬塗層 12‧‧‧hard coating

12a‧‧‧支撐突起 12a‧‧‧Support protrusion

12b‧‧‧吸氣槽 12b‧‧‧Intake tank

12c‧‧‧山狀凸部 12c‧‧‧Mountain-like convex

12d‧‧‧谷狀凹部 12d‧‧‧ valley recess

12P‧‧‧面板 12P‧‧‧ panel

12s‧‧‧空間部 12s‧‧‧ Space Department

31‧‧‧吸附卡盤 31‧‧‧Adsorption chuck

31a‧‧‧吸附口 31a‧‧‧Adsorption port

31b‧‧‧通氣道 31b‧‧‧Airway

31c‧‧‧吸氣源 31c‧‧‧ Inhalation source

32‧‧‧黏著卡盤 32‧‧‧Adhesive chuck

32a‧‧‧升降部 32a‧‧‧ Lifting Department

32b‧‧‧黏著部 32b‧‧‧Adhesive

32c‧‧‧黏著用從動部 32c‧‧‧Adhesive follower

32d‧‧‧黏著用驅動部 32d‧‧‧Adhesive drive unit

A‧‧‧貼合設備的製造裝置 A‧‧‧ manufacturing equipment for bonding equipment

B‧‧‧變壓室 B‧‧‧Various pressure chamber

AP‧‧‧大氣氣氛 AP‧‧‧ atmosphere

DP‧‧‧減壓氣氛 DP‧‧‧ decompression atmosphere

W‧‧‧貼合設備 W‧‧‧Fitting equipment

W1‧‧‧工件(第1工件) W1‧‧‧ workpiece (1st workpiece)

W2‧‧‧工件(第2工件) W2‧‧‧ workpiece (second workpiece)

W3‧‧‧密封材 W3‧‧‧ sealing material

第1圖係表示本發明的實施形態之貼合設備的製造裝置的整體結構之說明圖,係工件貼合工序中的工件貼合前之縱剖前視圖。 1 is an explanatory view showing an overall configuration of a manufacturing apparatus of a bonding apparatus according to an embodiment of the present invention, and is a longitudinal cross-sectional front view before a workpiece is bonded in a workpiece bonding step.

第2圖係工件貼合工序中的貼合工件時的縱剖前視圖。 Fig. 2 is a longitudinal sectional front view of the workpiece in the workpiece bonding process.

第3圖係工件貼合工序中的貼合工件後之縱剖前視圖。 Fig. 3 is a longitudinal sectional front view of the workpiece bonding process after the workpiece is bonded.

第4圖係工件貼合工序中的剝離貼合設備時的縮小縱剖前視圖。 Fig. 4 is a front view showing a reduced longitudinal section of the peeling and bonding apparatus in the workpiece bonding step.

以下,根據圖式詳細說明本發明的實施形態。 Hereinafter, embodiments of the present invention will be described in detail based on the drawings.

如第1圖~第4圖所示,本發明的實施形態之貼合設備W的製造裝置A為如下工件貼合裝置:將形成為板狀之一對工件W1、W2分別保持於第1保持構件1和第2保持構件2上,藉由第1保持構件1和第2保持構件2相對地靠近移動,使一對工件W1、W2高精度對位貼合之工件貼合裝置。完成貼合之一對工件W1、W2從第1保持構件1及第2保持構件2剝離為較佳。 As shown in FIG. 1 to FIG. 4, the manufacturing apparatus A of the bonding apparatus W according to the embodiment of the present invention is a workpiece bonding apparatus in which one of the plates is formed to hold the workpieces W1 and W2 in the first holding. In the member 1 and the second holding member 2, the first holding member 1 and the second holding member 2 are moved relatively close to each other, and the pair of workpieces W1 and W2 are attached to the workpiece bonding apparatus with high precision alignment. It is preferable that the workpieces W1 and W2 are peeled off from the first holding member 1 and the second holding member 2 in one of the completed bonding.

作為該工件貼合裝置之具體例,第1保持構件1和第2保持構件2在變壓室B的內部對向地配置,使用設置於第1保持構件1和第2保持構件2之保持卡盤3分別接收搬入至變壓室B之第1工件W1和第2工件W2。然後,在已減壓之變壓室B內,使第1保持構件1或第2保持構件2中的任意一方或雙方向前述對向方向相對地靠近移動的同時,向與前述對向方向交叉的方向相對地進行對位之後,將第1工件W1和第2工件W2高精度貼合(黏合)。藉此,製成內部具有密封空間之貼合設備W。接著,從第1保持構件1剝離貼合設備W的第1工件W1之後,將變壓室B返回到大氣壓從而與貼合設備W的密封空間的內壓產生壓力差,藉由該壓力差,貼合設備W被均勻地加壓至規定間隙。然後,將完成之貼合設備W從第2保持構件2剝離並搬出至變壓室B的外部為較 佳。 As a specific example of the workpiece bonding apparatus, the first holding member 1 and the second holding member 2 are disposed to face each other inside the pressure changing chamber B, and the holding cards provided in the first holding member 1 and the second holding member 2 are used. The disk 3 receives the first workpiece W1 and the second workpiece W2 that are carried into the pressure change chamber B, respectively. Then, in the pressure-reducing chamber B that has been depressurized, one of the first holding member 1 or the second holding member 2 or the opposite direction in the two directions is relatively moved, and intersects with the opposing direction. After the orientation is relatively aligned, the first workpiece W1 and the second workpiece W2 are bonded (bonded) with high precision. Thereby, a bonding apparatus W having a sealed space inside is produced. Then, after the first workpiece W1 of the bonding apparatus W is peeled off from the first holding member 1, the pressure changing chamber B is returned to the atmospheric pressure to generate a pressure difference with the internal pressure of the sealing space of the bonding apparatus W, and the pressure difference is caused by the pressure difference. The bonding apparatus W is uniformly pressurized to a prescribed gap. Then, the completed bonding apparatus W is peeled off from the second holding member 2 and carried out to the outside of the pressure changing chamber B. good.

另外,如第1圖~第4圖所示,第1工件W1及第2工件W2通常被配置成向上下方向對向,以下,將上側的第1工件W1與下側的第2工件W2貼合之方向稱為“Z方向”。以下,將與Z方向交叉之沿第1工件W1及第2工件W2之方向稱為“XY方向”。 Further, as shown in FIGS. 1 to 4, the first workpiece W1 and the second workpiece W2 are normally arranged to face in the up-down direction, and the upper first workpiece W1 and the lower second workpiece W2 are attached below. The direction of the combination is called the "Z direction." Hereinafter, the direction along the first workpiece W1 and the second workpiece W2 that intersects the Z direction is referred to as "XY direction".

詳細說明如下:本發明的實施形態之貼合設備W的製造裝置A具備如下構成要素作為主要構成要素:第1保持構件1及第2保持構件2,設置成在Z方向上對向;保持卡盤3,用於將一對工件W1、W2分別裝卸自如且無法移動地保持於第1保持構件1及第2保持構件2上;接觸分離用驅動部4,使第1保持構件1或第2保持構件2中的任意一方或雙方向Z方向相對地靠近移動;定位用驅動部5,使第1保持構件1或第2保持構件2中的任意一方或雙方向XY方向和XYθ方向相對地調整移動;及控制部6,用於至少對保持卡盤3、接觸分離用驅動部4、定位用驅動部5等分別進行作動控制。 Specifically, the manufacturing apparatus A of the bonding apparatus W according to the embodiment of the present invention includes the following constituent elements as main components: the first holding member 1 and the second holding member 2 are disposed to face each other in the Z direction; The disk 3 is for detachably and detachably holding the pair of workpieces W1 and W2 on the first holding member 1 and the second holding member 2, and the contact separating drive unit 4 to make the first holding member 1 or the second One of the holding members 2 or the two-direction Z direction relatively moves, and the positioning drive unit 5 adjusts one of the first holding member 1 or the second holding member 2 or the two-direction XY direction and the XYθ direction. The movement unit and the control unit 6 are configured to perform actuation control of at least the holding chuck 3, the contact separating drive unit 4, the positioning driving unit 5, and the like.

而且,具備用於從第2保持構件2剝去完成貼合之一對工件W1、W2之剝離構件7為較佳。 Further, it is preferable to provide the peeling member 7 for peeling off one of the workpieces W1 and W2 from the second holding member 2 to complete the bonding.

並且,作為後述之保持卡盤3,較佳之吸附卡盤31係使用向第1保持構件1的第1工件保持面1a吸引第1工件W1而保持、及使用第2保持構件2的第2工件保持面2a吸引第2工件W2而保持。除此之外,亦可以使用黏著第1工件W1及第2工件W2而保持之黏著卡盤32、靜電卡盤等。 In addition, as the holding chuck 3 to be described later, the suction chuck 31 is preferably held by the first workpiece W1 and held by the first workpiece holding surface 1a of the first holding member 1 and the second workpiece using the second holding member 2. The holding surface 2a sucks and holds the second workpiece W2. In addition to this, an adhesive chuck 32, an electrostatic chuck, or the like which is held by adhering the first workpiece W1 and the second workpiece W2 may be used.

貼合設備W係構成零件組裝成一體之薄板狀結構體,例如FPD、3D(3維)顯示器、電子書籍、或有機EL顯示器等。 The bonding apparatus W is a thin plate-like structure in which components are integrally assembled, such as an FPD, a 3D (three-dimensional) display, an electronic book, or an organic EL display.

第1工件W1係例如由玻璃製觸控面板、保護玻璃等構成,以覆蓋之方式黏結由LCM、可撓性印刷電路板(FPC)等構成之第2工件W2而構成FPD、OLED等者。 The first workpiece W1 is made of, for example, a glass touch panel or a cover glass, and is bonded to the second workpiece W2 made of an LCM or a flexible printed circuit board (FPC) to form an FPD or an OLED.

而且,根據需要,在第1工件W1及第2工件W2的對向面中的任意一方或雙方,使用點膠機等定量吐出噴嘴塗佈密封材W3。 In addition, the sealing material W3 is applied to the one or both of the opposing surfaces of the first workpiece W1 and the second workpiece W2 by a quantitative discharge nozzle such as a dispenser.

作為密封材W3係使用,藉由吸收紫外線等光能進行聚合來硬化並體現黏結性之UV硬化性光學透明樹脂(OCR)等光硬化型黏結劑。 As the sealing material W3, a photocurable bonding agent such as a UV curable optically transparent resin (OCR) which is cured by absorption of light energy such as ultraviolet rays and which is cured and which exhibits adhesion is used.

並且,作為其他例子,密封材W3亦可以變更為使用藉由熱能的吸收進行聚合來硬化之熱硬化型黏結劑、二液混合硬化型黏結劑等,或亦可以不夾有密封材W3而將第1工件W1和第2工件W2的對向面彼此進行貼合。 Further, as another example, the sealing material W3 may be changed to a thermosetting type bonding agent or a two-liquid mixing curing type bonding agent which is cured by polymerization by absorption of thermal energy, or may be provided without interposing the sealing material W3. The opposing faces of the first workpiece W1 and the second workpiece W2 are bonded to each other.

第1保持構件1由以金屬等剛體形成為不會畸變(撓曲)變形的厚度的平板狀之平面板等構成,其表面具有與已搬入之第1工件W1向Z方向對向地接觸之第1工件保持面1a。 The first holding member 1 is formed of a flat plate or the like which is formed of a rigid body such as a metal so as to be deformed without being distorted (flexed), and has a surface that is in contact with the first workpiece W1 that has been moved in the Z direction. The first workpiece holding surface 1a.

第2保持構件2由以金屬等剛體形成為不會畸變(撓曲)變形的厚度的平板狀之平面板等構成,其表面具有,與已搬入之第2工件W2向Z方向對向地接觸之第2工件保持面2a。 The second holding member 2 is formed of a flat plate or the like which is formed of a rigid body such as a metal so as not to be distorted (flexed), and has a surface which is in contact with the second workpiece W2 that has been moved in the Z direction. The second workpiece holding surface 2a.

作為第1工件保持面1a及第2工件保持面2a之具體例,如第1圖~第4圖所示之情況下,第1保持構件1的略平滑表面中與第1工件W1接觸之僅一部分形成第1工件保持面1a,第2保持構件2的略平滑表面中與第2工件W2接觸之僅一部分形成第2工件保持面2a。 As a specific example of the first workpiece holding surface 1a and the second workpiece holding surface 2a, as shown in FIGS. 1 to 4, only the first workpiece W1 is in contact with the slightly smooth surface of the first holding member 1. A part of the first workpiece holding surface 1a is formed, and only a part of the slightly smooth surface of the second holding member 2 that is in contact with the second workpiece W2 forms the second workpiece holding surface 2a.

並且,作為其他例子,雖未圖示,但是亦可以變更為將第1保持構件1的表面整體作為第1工件保持面1a,將第2保持構件2的表面整體作為第2工件保持面2a。 In addition, although not shown in the figure, the entire surface of the first holding member 1 may be the first workpiece holding surface 1a, and the entire surface of the second holding member 2 may be the second workpiece holding surface 2a.

為了減少第1工件保持面1a與第1工件W1、第2工件保持面2a與第2工件W2之間的接觸面積,第1工件保持面1a或第2工件保持面2a形成為硬質凹凸形狀的同時,具有保持卡盤3。 In order to reduce the contact area between the first workpiece holding surface 1a and the first workpiece W1, the second workpiece holding surface 2a, and the second workpiece W2, the first workpiece holding surface 1a or the second workpiece holding surface 2a is formed into a hard uneven shape. At the same time, there is a holding chuck 3.

亦即,第1保持構件1的第1工件保持面1a或第2保持構件2的第2工 件保持面2a中的任意一方或雙方與一對工件W1、W2中的一方或雙方對向且至少在其表面具備形成為凹凸形狀之硬塗層12。 In other words, the first workpiece holding surface 1a of the first holding member 1 or the second workpiece of the second holding member 2 One or both of the member holding faces 2a are opposed to one or both of the pair of workpieces W1, W2 and have a hard coat layer 12 formed in a concavo-convex shape at least on the surface thereof.

而且,第1保持構件1的第1工件保持面1a或第2保持構件2的第2工件保持面2a中的任意一方或雙方,具備吸附口31a作為裝卸自如地保持一對工件W1、W2中的一方或雙方之保持卡盤3為較佳。 In either or both of the first workpiece holding surface 1a of the first holding member 1 or the second workpiece holding surface 2a of the second holding member 2, the suction port 31a is provided to detachably hold the pair of workpieces W1 and W2. It is preferred that one or both of the holding chucks 3 are provided.

所謂成為保持卡盤3之吸附口31a係指,以與第1工件W1的表面對向之方式開設來吸引第1工件W1及以與第2工件W2的表面對向之方式開設來吸引第2工件W2之吸附卡盤31之吸引孔,吸附口31a上連接有通氣道31b且與吸氣源31c連通。 The suction port 31a that serves as the holding chuck 3 is opened so as to be opposed to the surface of the first workpiece W1 to attract the first workpiece W1 and to face the surface of the second workpiece W2 to attract the second. The suction hole of the suction chuck 31 of the workpiece W2 is connected to the suction port 31a via the air passage 31b and communicates with the intake air source 31c.

複數個吸附口31a以向XY方向分散之方式配置於第1工件保持面1a及第2工件保持面2a,吸附口31a的個數及間隔係與第1工件W1及第2工件W2的尺寸、厚度、材質、重量等對應地進行確定。 The plurality of adsorption ports 31a are disposed on the first workpiece holding surface 1a and the second workpiece holding surface 2a so as to be dispersed in the XY direction, and the number and interval of the adsorption ports 31a and the sizes of the first workpiece W1 and the second workpiece W2 are The thickness, material, weight, and the like are determined correspondingly.

吸氣源31c由泵和壓縮機等構成,藉由後述之控制部6,至少從接收搬入至變壓室B內之第1工件W1及第2工件W2時至貼合時為止,以從吸附口31a經由通氣道31b吸引之方式進行作動控制。 The intake air source 31c is composed of a pump, a compressor, and the like, and is controlled by the control unit 6 to be sucked at least from the time of receiving and feeding the first workpiece W1 and the second workpiece W2 in the pressure change chamber B to the bonding. The mouth 31a is actuated by suction through the air passage 31b.

並且,貼合第1工件W1及第2工件W2之後,亦可以從吸附口31a向保持於第1保持構件1的第1工件保持面1a之第1工件W1及保持於第2保持構件2的第2工件保持面2a之第2工件W2噴出壓縮空氣等流體。 After the first workpiece W1 and the second workpiece W2 are bonded together, the first workpiece W1 held by the first workpiece holding surface 1a of the first holding member 1 and the second workpiece W1 may be held from the suction port 31a. The second workpiece W2 of the second workpiece holding surface 2a discharges a fluid such as compressed air.

作為保持卡盤3的具體例,如第1圖~第4圖所示之例子的情況下,在配置於上方之第1保持構件1的第1工件保持面1a上設置吸附卡盤31及黏著卡盤32,在配置於下方之第2保持構件2的第2工件保持面2a上僅設置吸附卡盤31。 As a specific example of the holding chuck 3, in the case of the example shown in FIGS. 1 to 4, the adsorption chuck 31 and the adhesion are provided on the first workpiece holding surface 1a of the first holding member 1 disposed above. In the chuck 32, only the suction chuck 31 is provided on the second workpiece holding surface 2a of the second holding member 2 disposed below.

黏著卡盤32具有:升降部32a,通過開鑿於第1保持構件1之貫穿孔1h向Z方向往復移動自如地設置;黏著部32b,在升降部32a的前端設置成向Z方向與第1工件W1對向;黏著用從動部32c,設置於升降部32a的基端;及黏著用驅動部32d,與黏著用從動部32c連接。 The adhesive chuck 32 has a lifting portion 32a that is reciprocally movable in the Z direction by a through hole 1h that is cut into the first holding member 1, and an adhesive portion 32b that is provided at the tip end of the lifting portion 32a in the Z direction and the first workpiece. W1 is opposed; the adhesive follower portion 32c is provided at the base end of the lift portion 32a; and the adhesive drive portion 32d is connected to the adhesive follower portion 32c.

以向XY方向分散之方式配置複數組升降部32a及黏著部32b,升降部32a及黏著部32b的個數及間隔係與第1工件W1的尺寸、厚度、材質、重量等對應地進行確定。 The plurality of array lifting portions 32a and the adhesive portions 32b are disposed so as to be dispersed in the XY direction, and the number and interval of the lifting portions 32a and the adhesive portions 32b are determined in accordance with the size, thickness, material, weight, and the like of the first workpiece W1.

黏著用驅動部32d由向Z方向能夠往復移動之驅動器等構成,如第1圖的實線所示,藉由後述之控制部6,以在搬入至變壓室B內之第1工件W1的表面上接觸黏著部32b來進行黏著保持之方式進行作動控制。貼合第1工件W1及第2工件W2之後,如第3圖的實線所示,在第1保持構件1的第1工件保持面1a與第1工件W1的表面接觸之狀態下,以從第1工件W1的表面向Z方向遠離黏著部32b之方式進行作動控制。 The adhesive drive unit 32d is configured by a driver or the like that can reciprocate in the Z direction. As shown by the solid line in FIG. 1, the control unit 6 described later is used to carry the first workpiece W1 into the pressure change chamber B. The actuation control is performed in such a manner that the adhesive portion 32b is contacted on the surface to be adhered and held. After the first workpiece W1 and the second workpiece W2 are bonded together, as shown by the solid line in FIG. 3, the first workpiece holding surface 1a of the first holding member 1 is in contact with the surface of the first workpiece W1. The surface of the first workpiece W1 is controlled to move away from the adhesive portion 32b in the Z direction.

並且,作為其他例子雖未圖示,但是亦可以變更為在第1保持構件1的第1工件保持面1a上不設置黏著卡盤32,而代替為,將靜電卡盤與吸附卡盤31組合設置,或者在第2保持構件2的第2工件保持面2a上將黏著卡盤32及靜電卡盤與吸附卡盤31組合設置。 Further, although not shown in the drawings, the adhesive chuck 32 may not be provided on the first workpiece holding surface 1a of the first holding member 1, instead, the electrostatic chuck and the adsorption chuck 31 may be combined. The adhesive chuck 32 and the electrostatic chuck are provided in combination with the adsorption chuck 31 on the second workpiece holding surface 2a of the second holding member 2.

然而,作為第1保持構件1及第2保持構件2的材質,由於鋁系等金屬材料,容易進行精密加工(加工性優異)且重量輕(作業性優異)並價格低廉,因此被普遍使用。 However, the material of the first holding member 1 and the second holding member 2 is generally used because it is easy to perform precision machining (excellent workability), light weight (excellent workability), and low cost.

相對於此,作為構成LCD及OLED等的基板之第1工件W1及第2工件W2的材質,比鋁系等金屬材料更硬之玻璃和矽等被普遍使用。 On the other hand, as the material of the first workpiece W1 and the second workpiece W2 constituting the substrate such as the LCD and the OLED, a glass and a crucible which are harder than a metal material such as an aluminum-based material are generally used.

因此,若使第1工件W1與第1保持構件1的第1工件保持面1a、第2工件W2與第2保持構件2的第2工件保持面2a接觸並反復地進行裝卸,則由於每次接觸時產生之摩擦,導致軟質的第1工件保持面1a及第2工件保持面2a將會逐漸磨損。 Therefore, when the first workpiece W1 and the first workpiece holding surface 1a of the first holding member 1 and the second workpiece W2 are brought into contact with the second workpiece holding surface 2a of the second holding member 2 and repeatedly attached and detached, each time The friction generated during the contact causes the soft first workpiece holding surface 1a and the second workpiece holding surface 2a to gradually wear.

並且,作為第1保持構件1和第2保持構件2的材質,亦可以想到使用比玻璃等硬度高且難以磨損之陶瓷等硬質材料。然而,在這種情況下,若藉由噴砂法等噴砂處理或蝕刻處理或拋光處理等將第1工件保持面1a及第2工件保持面2a製成凹凸形狀,則凸部的山狀前端不僅 容易缺損,而且在與第1工件W1及第2工件W2接觸時可能會被凸部的山狀前端捅破。因此,與金屬材料相比,凹凸形狀的加工精度及加工性(加工時間及加工成本)較差,且在第1工件W1及第2工件W2上產生龜裂等破損之觀點來看亦不利。尤其,在陶瓷材料之情況下,會需要燒製等工序,因此在很難大型化方面而言亦不利。 Further, as the material of the first holding member 1 and the second holding member 2, it is also conceivable to use a hard material such as ceramic which is harder than glass and hard to wear. However, in this case, when the first workpiece holding surface 1a and the second workpiece holding surface 2a are formed into a concavo-convex shape by sandblasting, etching, polishing, or the like, such as a sandblasting method, the mountain-shaped front end of the convex portion is not only It is easy to be damaged, and may be broken by the mountain-shaped front end of the convex portion when it comes into contact with the first workpiece W1 and the second workpiece W2. Therefore, the processing precision and the workability (processing time and processing cost) of the uneven shape are inferior to those of the metal material, and it is also disadvantageous in that the first workpiece W1 and the second workpiece W2 are damaged by cracks or the like. In particular, in the case of a ceramic material, a process such as firing is required, which is disadvantageous in terms of difficulty in enlargement.

因此,為了同時實現這種防止磨損及加工性等課題,在第1保持構件1的第1工件保持面1a及第2保持構件2的第2工件保持面2a上形成由比第1保持構件1、第2保持構件2、及一對工件W1、W2的材質更硬之材料構成之硬塗層12。 Therefore, in order to simultaneously achieve such problems as wear prevention and workability, the first holding member 1a of the first holding member 1 and the second workpiece holding surface 2a of the second holding member 2 are formed by the first holding member 1 . The second holding member 2 and the hard coating layer 12 made of a material having a harder material than the pair of workpieces W1 and W2.

硬塗層12藉由沿第1工件保持面1a及第2工件保持面2a塗佈比一對工件W1、W2的材質更硬之材料,以規定厚度層疊地形成。而且,硬塗層12隔著第1工件保持面1a及第2工件保持面2a接地連接(接地)為較佳。 The hard coat layer 12 is formed by laminating a material having a thickness smaller than that of the pair of workpieces W1 and W2 along the first workpiece holding surface 1a and the second workpiece holding surface 2a. Further, it is preferable that the hard coat layer 12 is grounded (grounded) via the first workpiece holding surface 1a and the second workpiece holding surface 2a.

作為硬塗層12的材料的具體例,如在硬塗層12的表面上不發生氧化膜等絕緣體之例如,使用包含由鈦及碳化矽或鎢及碳粒子等構成之由導電材料之陶瓷及玻璃或金屬基質構成之材料為較佳。 As a specific example of the material of the hard coat layer 12, for example, an insulator such as an oxide film does not occur on the surface of the hard coat layer 12, for example, a ceramic containing a conductive material composed of titanium, tantalum carbide or tungsten, carbon particles, or the like is used. A material composed of a glass or a metal substrate is preferred.

作為硬塗層12的塗佈方法之具體例,可以舉出塗裝及浸漬、蒸鍍、電鍍、濺射、噴鍍等。 Specific examples of the coating method of the hard coat layer 12 include coating, dipping, vapor deposition, plating, sputtering, and thermal spraying.

作為硬塗層12的具體例,如第1圖~第4圖所示之情況下,具有硬塗層12之面板12P裝卸自如地鋪設於包含在第1保持構件1中局部形成之第1工件保持面1a及其域外面1b之整體表面上。同樣地,具有硬塗層12之面板12P亦裝卸自如地鋪設於在包含第2保持構件2中局部形成之第2工件保持面2a及其域外面2b之整體表面上。 As a specific example of the hard coat layer 12, as shown in FIGS. 1 to 4, the panel 12P having the hard coat layer 12 is detachably laid on the first workpiece partially formed in the first holding member 1. The surface 1a and its outer surface 1b are held on the entire surface. Similarly, the panel 12P having the hard coat layer 12 is also detachably laid on the entire surface of the second workpiece holding surface 2a and the outer surface 2b of the region which are partially formed in the second holding member 2.

面板12P由鋁等金屬形成為薄板狀,並在其表面一體形成硬塗層12。面板12P形成為矩形等形狀,並安裝一張與第1工件保持面1a及第2工件保持面2a的尺寸大致相同之面板12P,或以分別向XY方向排列 之方式安裝複數張比第1工件保持面1a及第2工件保持面2a的尺寸小之面板12P。 The panel 12P is formed of a metal such as aluminum into a thin plate shape, and a hard coat layer 12 is integrally formed on the surface thereof. The panel 12P is formed in a rectangular shape or the like, and a panel 12P having substantially the same size as that of the first workpiece holding surface 1a and the second workpiece holding surface 2a is attached, or is arranged in the XY direction. In this manner, a plurality of panels 12P having a smaller size than the first workpiece holding surface 1a and the second workpiece holding surface 2a are mounted.

並且,作為其他例,雖未圖示,但亦可以變更為,僅在除了域外面1b以外之第1工件保持面1a局部形成硬塗層12,或僅在除了域外面2b以外之第2工件保持面2a局部形成硬塗層12,或僅在第1工件保持面1a或第2工件保持面2a中的任意一側上形成硬塗層12,或不使用面板12P並沿第1工件保持面1a及第2工件保持面2a的表面直接形成硬塗層12。 Further, as another example, although not shown, the hard coating layer 12 may be partially formed only on the first workpiece holding surface 1a except the domain outer surface 1b, or only the second workpiece other than the domain outer surface 2b. The holding surface 2a is partially formed with the hard coat layer 12, or the hard coating layer 12 is formed only on either of the first workpiece holding surface 1a or the second workpiece holding surface 2a, or the panel 12P is not used and the first workpiece holding surface is used. The surface of the 1a and the second workpiece holding surface 2a directly forms the hard coat layer 12.

而且,硬塗層12具有:複數個支撐突起12a,從第1工件保持面1a或第2工件保持面2a中的任意一方或雙方向一對工件W1、W2中的一方或雙方突出並點接觸;及複數個吸氣槽12b,形成為在複數個支撐突起12a以分別與吸附卡盤31的吸附口31a相互連通之方式形成。 Further, the hard coat layer 12 has a plurality of support protrusions 12a protruding from one of the first workpiece holding surface 1a or the second workpiece holding surface 2a or one or both of the pair of workpieces W1 and W2 in two directions and in point contact. And a plurality of suction grooves 12b are formed such that the plurality of support protrusions 12a communicate with the adsorption ports 31a of the adsorption chuck 31, respectively.

複數個支撐突起12a係將其前端部與第1工件W1及第2工件W2的表面分別點接觸,以使第1工件W1及第2工件W2成為平滑狀態之方式保持者。因此,為了不使第1工件W1及第2工件W2的點接觸部位因重量而變形,以使每單位面積稠密地配置多個微小的支撐突起12a來保持為較佳。 The plurality of support projections 12a are in contact with the surfaces of the first workpiece W1 and the second workpiece W2, respectively, so that the first workpiece W1 and the second workpiece W2 are maintained in a smooth state. Therefore, in order to prevent the point contact portions of the first workpiece W1 and the second workpiece W2 from being deformed by weight, it is preferable to hold a plurality of minute support projections 12a densely arranged per unit area.

複數個吸氣槽12b在第1工件W1及第2工件W2之間以分散之方式形成多個微小的空間部12s,並以使與第1工件W1及第2工件W2之接觸面積縮小之方式構成。 The plurality of suction grooves 12b form a plurality of minute space portions 12s in a dispersed manner between the first workpiece W1 and the second workpiece W2, and reduce the contact area with the first workpiece W1 and the second workpiece W2. Composition.

作為確保平滑地保持工件之方法,向一對工件W1、W2中的一方或雙方呈山狀突出之方式分別形成複數個支撐突起12a為較佳。以向XY方向和XYθ方向與複數個支撐突起12a相鄰之方式分別以谷狀形成複數個吸氣槽12b為較佳。 As a method of ensuring that the workpiece is smoothly held, it is preferable to form a plurality of support protrusions 12a so that one or both of the pair of workpieces W1 and W2 protrude in a mountain shape. It is preferable to form a plurality of suction grooves 12b in a valley shape so as to be adjacent to the plurality of support protrusions 12a in the XY direction and the XYθ direction.

而且,第1工件保持面1a或第2工件保持面2a中的任意一方或雙方具有藉由表面粗化處理而形成之複數個山狀凸部12c和複數個谷狀凹 部12d,沿複數個山狀凸部12c及複數個谷狀凹部12d層疊硬塗層12為較佳。複數個山狀凸部12c及複數個谷狀凹部12d亦與支撐突起12a及吸氣槽12b相同地,以使每單位面積稠密地分別配置多個為較佳。 Further, either or both of the first workpiece holding surface 1a or the second workpiece holding surface 2a have a plurality of mountain-shaped convex portions 12c and a plurality of valley-shaped concave portions formed by surface roughening treatment. In the portion 12d, it is preferable to laminate the hard coat layer 12 along the plurality of mountain-like convex portions 12c and the plurality of valley-shaped concave portions 12d. The plurality of mountain-shaped convex portions 12c and the plurality of valley-shaped concave portions 12d are also preferably arranged in a plurality of densely arranged portions per unit area, similarly to the support protrusions 12a and the intake grooves 12b.

藉此,在複數個山狀凸部12c的外側層疊地形成複數個支撐突起12a的同時,在複數個谷狀凹部12d的外側層疊地形成複數個吸氣槽12b。 Thereby, a plurality of support protrusions 12a are formed on the outer side of the plurality of mountain-shaped convex portions 12c, and a plurality of suction grooves 12b are formed on the outer side of the plurality of valley-shaped concave portions 12d.

作為表面粗化處理,例如可以舉出噴砂法等噴砂處理、蝕刻處理、及拋光處理等。 Examples of the surface roughening treatment include blasting treatment such as sand blasting, etching treatment, and polishing treatment.

作為表面粗化處理的具體例,如第1圖~第4圖所示之情況下,對成為面板12P的表面之金屬面進行噴砂處理來進行表面粗化,在該粗糙面上層疊地形成硬塗層12。詳細而言,藉由將粒度為# 60~# 240左右的陶瓷、玻璃、金屬等粒子與成為面板12P的表面之金屬面快速地接觸,使得以規定的表面粗糙度同時形成複數個山狀凸部12c和複數個谷狀凹部12d。 As a specific example of the surface roughening treatment, as shown in FIGS. 1 to 4, the metal surface which is the surface of the panel 12P is sandblasted to roughen the surface, and the rough surface is laminated to form a hard surface. Coating 12. Specifically, particles such as ceramics, glass, and metal having a particle size of #60 to #240 are brought into rapid contact with the metal surface of the surface of the panel 12P, so that a plurality of mountain-like convexities are simultaneously formed with a predetermined surface roughness. a portion 12c and a plurality of valley recesses 12d.

並且,作為其他例,雖未圖示,但亦可以變更為、作為表面粗化處理,進行蝕刻處理和拋光處理等來代替噴砂處理,或者不使用面板12P而使第1工件保持面1a及第2工件保持面2a的表面直接被表面粗化處理,並在該粗糙面上層疊地形成硬塗層12。 Further, although not shown, the surface roughening treatment may be changed, the etching treatment and the polishing treatment may be performed instead of the sandblasting treatment, or the first workpiece holding surface 1a and the first workpiece holding surface 1a may be used without using the panel 12P. 2 The surface of the workpiece holding surface 2a is directly roughened by the surface, and the hard coat layer 12 is laminated on the rough surface.

作為前述之基於表面粗化處理之粗糙面狀態之程度,使表面粗糙度(Ra)成為0.1~3.0左右為較佳。 The degree of surface roughness (Ra) of about 0.1 to 3.0 is preferable as the degree of the rough surface state by the surface roughening treatment.

根據實驗,複數個支撐突起12a及複數個吸氣槽12b的表面粗糙度(Ra)為小於0.1之情況下,支撐突起12a與吸氣槽12b的高度差變得過小,來自吸附卡盤31的吸附口31a之吸引力難以充分地遍及到複數個吸氣槽12b。因此,得知無法用整體第1工件保持面1a來穩定地吸引保持第1工件W1、用整體第2工件保持面2a來穩定地吸引保持第2工件W2。 According to the experiment, when the surface roughness (Ra) of the plurality of support protrusions 12a and the plurality of suction grooves 12b is less than 0.1, the difference in height between the support protrusions 12a and the suction grooves 12b becomes too small, from the adsorption chuck 31. It is difficult for the suction force of the adsorption port 31a to sufficiently extend to the plurality of suction grooves 12b. Therefore, it is known that the first workpiece W1 can be stably sucked and held by the entire first workpiece holding surface 1a, and the second workpiece W2 can be stably sucked and held by the entire second workpiece holding surface 2a.

並且,複數個支撐突起12a及複數個吸氣槽12b的表面粗糙度(Ra)為大於3.0之情況下,支撐突起12a與吸氣槽12b的高度差變得過大,導致來自吸附卡盤31的吸附口31a之吸引力會過度地流向複數個吸氣槽12b。尤其,如圖示例,若硬塗層12形成至第1工件保持面1a的域外面1b及第2工件保持面2a的域外面2b,則洩漏到該等域外面1b、2b之量會過多。因此,得知無法用整體第1工件保持面1a來穩定地吸引保持第1工件W1、用整體第2工件保持面2a來穩定地吸引保持第2工件W2。 Further, when the surface roughness (Ra) of the plurality of support protrusions 12a and the plurality of suction grooves 12b is more than 3.0, the difference in height between the support protrusions 12a and the suction grooves 12b becomes excessive, resulting in the adsorption chuck 31. The suction force of the adsorption port 31a excessively flows to the plurality of suction grooves 12b. In particular, as shown in the example, when the hard coat layer 12 is formed on the outer surface 1b of the first workpiece holding surface 1a and the outer surface 2b of the second workpiece holding surface 2a, the amount of leakage outside the domains 1b, 2b is excessive. . Therefore, it is known that the first workpiece W1 can be stably sucked and held by the entire first workpiece holding surface 1a, and the second workpiece W2 can be stably sucked and held by the entire second workpiece holding surface 2a.

並且,為了證實前述之基於硬塗層12的點接觸的摩擦力之改善,進行了如下實驗。 Further, in order to confirm the above-described improvement in the frictional force by the point contact of the hard coat layer 12, the following experiment was conducted.

準備具有分散配置有前述之支撐突起12a及吸氣槽12b之硬塗層12之點接觸板、露出有鋁的平滑面之面接觸板、載置於該等上之玻璃塊。分別使前述點接觸板及前述塊的接觸部分與前述面接觸板及前述塊的接觸部分成為真空狀態,然後,在返回到大氣壓之狀態下分別進行摩擦測定試驗(塊.接觸.板)。 A contact plate having a hard coat layer 12 in which the above-described support protrusions 12a and the suction grooves 12b are dispersed, a surface contact plate in which a smooth surface of aluminum is exposed, and a glass block placed thereon are prepared. The contact portion between the point contact plate and the block and the contact portion between the surface contact plate and the block were brought into a vacuum state, and then a friction measurement test (block. contact plate) was performed while returning to atmospheric pressure.

摩擦測定試驗之結果,前述點接觸板的摩擦力為“0.090Kg”,前述面接觸板的摩擦力為“0.193Kg”,前述點接觸板的摩擦係數約為前述面接觸板的摩擦係數的1/2。藉此,得知與前述面接觸板相比前述點接觸板之摩擦力可以減半。 As a result of the friction measurement test, the frictional force of the point contact plate is "0.090 Kg", the frictional force of the surface contact plate is "0.193 Kg", and the friction coefficient of the point contact plate is about 1 of the friction coefficient of the surface contact plate. /2. Thereby, it is found that the frictional force of the above-mentioned point contact plate can be halved compared with the above-mentioned surface contact plate.

接觸分離用驅動部4由使第1保持構件1或第2保持構件2中的任意一方或雙方向Z方向進行往復移動之驅動器等構成,藉由後述之控制部6而進行作動控制。作為基於控制部6之接觸分離用驅動部4之控制例,如第1圖的實線所示,在交接搬入至變壓室B內之第1工件W1及第2工件W2時,接觸分離用驅動部4使第1保持構件1或第2保持構件2中的任意一方從另一方向Z方向相對地進行遠離移動,或使第1保持構件1及第2保持構件2的雙方相互間向Z方向相對地進行遠離移動。然後, 如第1圖的二點虛線及第2圖所示,藉由接觸分離用驅動部4使第1保持構件1側或第2保持構件2側中的任意一方從另一方向Z方向進行靠近移動,或者使第1保持構件1側及第2保持構件2側的雙方相互向Z方向進行靠近移動,從而使第1工件W1與第2工件W2夾著密封材W3向Z方向重疊,有需要之情況下進一步加壓貼合。 The contact/separation drive unit 4 is configured by a driver or the like that reciprocates either one of the first holding member 1 or the second holding member 2 or the two-direction Z direction, and is controlled by the control unit 6 to be described later. As a control example of the contact/separation drive unit 4 based on the control unit 6, as shown by the solid line in FIG. 1, when the first workpiece W1 and the second workpiece W2 are transferred to the pressure change chamber B, the contact separation is performed. The drive unit 4 moves the first holding member 1 or the second holding member 2 away from each other in the other direction Z direction, or causes the first holding member 1 and the second holding member 2 to move toward each other. The direction is relatively moved away. then, As shown by the two-dotted line in FIG. 1 and the second drawing, the contact holding drive unit 4 moves the first holding member 1 side or the second holding member 2 side closer to the other direction Z direction. Or both the first holding member 1 side and the second holding member 2 side are moved closer to each other in the Z direction, and the first workpiece W1 and the second workpiece W2 are overlapped in the Z direction with the sealing material W3 interposed therebetween. In the case of further press fit.

作為接觸分離用驅動部4之具體例,如第1圖~第4圖所示之情況下,僅使第1保持構件1與接觸分離用驅動部4連接、使第1保持構件1側朝向第2保持構件2側並向Z方向相對地靠近移動。 As a specific example of the contact separation drive unit 4, as shown in FIGS. 1 to 4, only the first holding member 1 is connected to the contact separation drive unit 4, and the first holding member 1 side is oriented. 2 The member 2 is held and moved relatively close to the Z direction.

並且,作為其他例,雖未圖示,但亦可以變更為,僅使第2保持構件2與接觸分離用驅動部4連接,使第2保持構件2側朝向第1保持構件1側並向Z方向進行相對地靠近移動,或使第1保持構件1及第2保持構件2分別與接觸分離用驅動部4連接,使第1保持構件1側與第2保持構件2側同時向Z方向相對地進行靠近移動。 In addition, although it is not shown in the figure, the second holding member 2 may be connected to the contact separation drive unit 4, and the second holding member 2 side may be directed toward the first holding member 1 side. The first holding member 1 and the second holding member 2 are connected to the contact separating drive unit 4, and the first holding member 1 side and the second holding member 2 side are simultaneously opposed to each other in the Z direction. Move closer.

定位用驅動部5由使第1保持構件1或第2保持構件2中的任意一方或雙方向XY方向和XYθ方向調整移動之驅動器等構成,基於後述之控制部6進行作動控制。如第2圖所示,作為基於控制部6之定位用驅動部5的控制例,在搬入至變壓室B內之第1工件W1及第2工件W2將要進行貼合之前,定位用驅動部5使第1保持構件1或第2保持構件2中的任意一方從另一方向XY方向和XYθ方向相對地調整移動,使第1工件W1及第2工件W2進行對位,或者使第1保持構件1及第2保持構件2的雙方相互向XY方向和XYθ方向相對地調整移動,使第1工件W1及第2工件W2進行對位。 The positioning drive unit 5 is configured by a driver or the like that adjusts the movement of either the first holding member 1 or the second holding member 2 or the two-direction XY direction and the XYθ direction, and performs the actuation control by the control unit 6 to be described later. As shown in Fig. 2, as a control example of the positioning drive unit 5 by the control unit 6, the positioning drive unit is placed before the first workpiece W1 and the second workpiece W2 that are carried into the pressure changing chamber B are to be bonded together. 5, one of the first holding member 1 or the second holding member 2 is relatively moved from the other direction XY direction and the XYθ direction, and the first workpiece W1 and the second workpiece W2 are aligned or the first holder is held. Both the member 1 and the second holding member 2 are relatively moved in the XY direction and the XYθ direction, and the first workpiece W1 and the second workpiece W2 are aligned.

作為定位用驅動部5的具體例,如第1圖~第4圖所示之例之情況下,僅使第1保持構件1與定位用驅動部5連接,使第1保持構件1側朝向第2保持構件2側向XYθ方向相對地調整移動。 As a specific example of the positioning drive unit 5, in the case of the examples shown in FIGS. 1 to 4, only the first holding member 1 is connected to the positioning drive unit 5, and the first holding member 1 side is oriented. 2 The holding member 2 is laterally adjusted to move in the XYθ direction.

並且,作為其他例,雖未圖示,但亦可以變更為,藉由僅使第2 保持構件2與定位用驅動部5連接,使第2保持構件2側朝向第1保持構件1側向XY方向和XYθ方向相對地調整移動而進行對位,或使第1保持構件1及第2保持構件2分別與定位用驅動部5連接,從而使第1保持構件1側與第2保持構件2側同時向XY方向和XYθ方向相對地調整移動而進行對位。 Further, although not shown, other examples may be changed by merely making the second The holding member 2 is connected to the positioning drive unit 5, and the second holding member 2 side is moved toward the first holding member 1 side in the XY direction and the XYθ direction to be aligned, or the first holding member 1 and the second holder are placed. Each of the holding members 2 is connected to the positioning driving unit 5, and the first holding member 1 side and the second holding member 2 side are simultaneously moved in the XY direction and the XYθ direction to be aligned and aligned.

控制部6為如下控制器,係不僅分別與吸附卡盤31的吸氣源31c、黏著卡盤32的黏著用驅動部32d、接觸分離用驅動部4及定位用驅動部5等電連接,而且還用於在變壓室B的內外取出放入第1工件W1及第2工件W2之開閉部(未圖示)、將變壓室B內之氣氛從大氣氣氛AP調整為規定真空度的減壓氣氛DP之室內壓力調節單元(未圖示)等電連接之控制器。 The controller 6 is not only electrically connected to the intake source 31c of the adsorption chuck 31, the adhesion drive unit 32d of the adhesive chuck 32, the contact separation drive unit 4, and the positioning drive unit 5, but also to the controller. Further, the opening and closing portion (not shown) in which the first workpiece W1 and the second workpiece W2 are placed is taken out inside and outside the pressure changing chamber B, and the atmosphere in the pressure changing chamber B is adjusted from the atmospheric atmosphere AP to a predetermined degree of vacuum. A controller that is electrically connected to an indoor pressure adjusting unit (not shown) that presses the atmosphere DP.

成為控制部6之控制器,依預設於其控制電路(未圖示)之程序,並在預設之時刻依次分別地進行作動控制。 The controller that becomes the control unit 6 performs the actuation control in sequence at a preset time according to a program preset to its control circuit (not shown).

詳細說明如下,如第1圖的實線所示,控制部6以藉由吸附卡盤31及黏著卡盤32將搬入至大氣氣氛AP的變壓室B內之第1工件W1接收至第1保持構件1的第1工件保持面1a上,藉由吸附卡盤31將第2工件W2接收至第2保持構件2的第2工件保持面2a之方式進行作動控制。 As described in detail below, the control unit 6 receives the first workpiece W1 that has been carried into the pressure changing chamber B of the atmospheric atmosphere AP by the adsorption chuck 31 and the adhesive chuck 32 as shown by the solid line in FIG. The first workpiece holding surface 1a of the holding member 1 is controlled to be moved so that the second workpiece W2 is received by the suction chuck 31 to the second workpiece holding surface 2a of the second holding member 2.

然後,如第1圖的二點虛線及第2圖所示,當變壓室B內切換為減壓氣氛DP之後,藉由黏著卡盤32的黏著用驅動部32d及接觸分離用驅動部4,使第1保持構件1及黏著部32b相對於第2保持構件2相對地向Z方向靠近移動,從而以第1工件W1和第2工件W2夾著密封材W3向Z方向重疊之方式進行作動控制。 Then, as shown in the two-dotted line in FIG. 1 and the second figure, after the pressure change chamber B is switched to the reduced pressure atmosphere DP, the adhesion driving portion 32d and the contact separation driving portion 4 of the adhesive chuck 32 are used. The first holding member 1 and the adhesive portion 32b are moved in the Z direction relative to the second holding member 2, and the first workpiece W1 and the second workpiece W2 are moved in the Z direction with the sealing material W3 interposed therebetween. control.

與該重疊幾乎同時地,藉由定位用驅動部5使第1保持構件1或第2保持構件2中的任意一方相對另一方向XY方向和XYθ方向調整移動,高精度地進行第1工件W1與第2工件W2之相對對位(定位)。完成該對位之後,藉由接觸分離用驅動部4,以使第1工件M1與第2工件 W2貼合之方式進行作動控制。 At the same time as the overlap, the first holding member 1 or the second holding member 2 is adjusted to move in the XY direction and the XYθ direction in the other direction, and the first workpiece W1 is accurately performed. Opposing (positioning) with respect to the second workpiece W2. After the alignment is completed, the first workpiece M1 and the second workpiece are brought into contact by the separation driving unit 4 W2 fits the way to control the action.

而且,如第3圖的實線所示,將第1工件W1及第2工件W2貼合之後,以藉由接觸分離用驅動部4保持第1保持構件1的第1工件保持面1a與第1工件W1的表面接觸之狀態,藉由黏著卡盤32的黏著用驅動部32d使黏著部32b移動至從第1工件W1分離的方向並剝下之方式進行作動控制。 Then, as shown by the solid line in FIG. 3, after the first workpiece W1 and the second workpiece W2 are bonded together, the first workpiece holding surface 1a and the first holding member 1 are held by the contact separating drive unit 4 In the state in which the surface of the workpiece W1 is in contact with each other, the adhesive portion 32b of the adhesive chuck 32 moves the adhesive portion 32b to the direction separated from the first workpiece W1 and is peeled off to perform the actuation control.

依據該種本發明的實施形態之貼合設備W的製造裝置A,使工件(第1工件W1、第2工件W2)與形成於第1保持構件1的第1工件保持面1a及第2保持構件2的第2工件保持面2a之硬塗層12反復接觸,即使工件(第1工件W1、第2工件W2)以平滑狀保持,向工件(第1工件W1、第2工件W2)呈山狀突出之複數個支撐突起12a亦與工件(第1工件W1、第2工件W2)點接觸,從而接觸面積非常小。因此,基於與工件(第1工件W1、第2工件W2)摩擦之約束力較小。 According to the manufacturing apparatus A of the bonding apparatus W of the embodiment of the present invention, the workpiece (the first workpiece W1 and the second workpiece W2) and the first workpiece holding surface 1a and the second holding formed on the first holding member 1 are held. The hard coat layer 12 of the second workpiece holding surface 2a of the member 2 is repeatedly contacted, and the workpiece (the first workpiece W1 and the second workpiece W2) is held in a smooth shape, and the workpiece (the first workpiece W1 and the second workpiece W2) is mountained. The plurality of support projections 12a projecting in a manner also come into point contact with the workpieces (the first workpiece W1 and the second workpiece W2), so that the contact area is extremely small. Therefore, the binding force based on friction with the workpiece (the first workpiece W1 and the second workpiece W2) is small.

除此之外,由於複數個支撐突起12a的材質比第1保持構件1、第2保持構件2、及工件(第1工件W1、第2工件W2)更硬,不會隨時間的經過而磨損。 In addition, since the material of the plurality of support protrusions 12a is harder than the first holding member 1, the second holding member 2, and the workpieces (the first workpiece W1 and the second workpiece W2), it does not wear out over time. .

藉此,即使使用加工精度、加工性等優異之金屬材料來形成第1保持構件1及第2保持構件2,能夠經長時間,僅使支撐突起12a的前端部無磨損地與平滑狀工件(第1工件W1、第2工件W2)點接觸來高精度地保持。 With this configuration, even if the first holding member 1 and the second holding member 2 are formed using a metal material excellent in processing precision, workability, and the like, only the tip end portion of the support protrusion 12a can be worn without a wear and a smooth workpiece over a long period of time ( The first workpiece W1 and the second workpiece W2) are in point contact and are held with high precision.

由此,可以使相對於工件(第1工件W1、第2工件W2)之第1工件保持面1a及第2工件保持面2a之接觸面積成為非常小之同時,防止第1工件保持面1a及第2工件保持面2a的隨時間經過之磨損。 Thereby, the contact area between the first workpiece holding surface 1a and the second workpiece holding surface 2a of the workpiece (the first workpiece W1 and the second workpiece W2) can be made very small, and the first workpiece holding surface 1a can be prevented. The second workpiece holding surface 2a is worn over time.

其結果,能夠經長時間地持續製造亞微米精度之高精度貼合設備W。 As a result, it is possible to continuously manufacture a high-precision bonding apparatus W of submicron precision over a long period of time.

尤其,第1工件保持面1a或第2工件保持面2a中的任意一方或雙方 具有表面粗化之複數個山狀凸部12c,在複數個山狀凸部12c的外側藉由塗佈而層疊地形成複數個支撐突起12a為較佳。 In particular, either or both of the first workpiece holding surface 1a or the second workpiece holding surface 2a It is preferable that a plurality of mountain-like convex portions 12c having a roughened surface are formed by laminating a plurality of support protrusions 12a on the outer side of the plurality of mountain-shaped convex portions 12c by coating.

在這種情況下,即使複數個山狀凸部12c的前端因表面粗化而呈銳角狀之尖頭形,但藉由塗佈複數個山狀凸部12c的外側,複數個支撐突起12a的山狀前端部會因塗佈材料的表面張力而成為球面狀。 In this case, even if the front ends of the plurality of mountain-like convex portions 12c are sharp-angled in a pointed shape due to the roughening of the surface, a plurality of support protrusions 12a are coated by coating the outer sides of the plurality of mountain-shaped convex portions 12c. The mountain-shaped front end portion is spherical in shape due to the surface tension of the coating material.

由此,能夠同時實現防止與工件(第1工件W1、第2工件W2)接觸時之工件之局部發生翹曲,及防止複數個支撐突起12a的穿刺。 Thereby, it is possible to simultaneously prevent warpage of a part of the workpiece when the workpiece (the first workpiece W1 and the second workpiece W2) comes into contact with each other, and to prevent puncture of the plurality of support protrusions 12a.

其結果,能夠抑制將工件W1保持於第1工件保持面1a、將工件W2保持於第2工件保持面2a時之翹曲,且工件(第1工件W1、第2工件W2)不會發生龜裂等破損。因此,尤其對厚度較薄的工件(第1工件W1、第2工件W2)非常有效。 As a result, it is possible to suppress warpage when the workpiece W1 is held by the first workpiece holding surface 1a and the workpiece W2 is held by the second workpiece holding surface 2a, and the workpiece (the first workpiece W1 and the second workpiece W2) does not cause turtles. Cracked and so on. Therefore, it is particularly effective for the workpieces having a small thickness (the first workpiece W1 and the second workpiece W2).

而且,第1工件保持面1a或第2工件保持面2a中的任意一方或雙方具備吸引一對工件(W1、W2)中的一方或雙方而保持之吸附口31a,硬塗層12具有在複數個支撐突起12a相互之間以與吸附口31a連通之方式形成為谷狀之複數個吸氣槽12b為較佳。 In addition, either or both of the first workpiece holding surface 1a and the second workpiece holding surface 2a are provided with suction ports 31a for sucking one or both of the pair of workpieces (W1, W2), and the hard coat layer 12 has a plurality of Preferably, the plurality of suction grooves 12b are formed in a valley shape so that the support projections 12a communicate with each other.

在這種情況下,即使使工件(第1工件W1、第2工件W2)與硬塗層12反復接觸,吸氣槽12b亦不會經長時間而消失。因此,來自吸附口31a之吸引力遍及到整體第1工件保持面1a及第2工件保持面2a,確保工件(第1工件W1、第2工件W2)被吸引保持。 In this case, even if the workpiece (the first workpiece W1 and the second workpiece W2) is repeatedly brought into contact with the hard coat layer 12, the intake groove 12b does not disappear over a long period of time. Therefore, the suction force from the suction port 31a spreads over the entire first workpiece holding surface 1a and the second workpiece holding surface 2a, and the workpiece (the first workpiece W1 and the second workpiece W2) is sucked and held.

另外,在複數個支撐突起12a相互之間形成之複數個吸氣槽12b上不會與工件(第1工件W1、第2工件W2)緊貼,因此,從第1保持構件1的第1工件保持面1a及第2保持構件2的第2工件保持面2a剝離工件(第1工件W1、第2工件W2)時,可順利剝去且幾乎不會發生伴隨剝離之靜電。 Further, since the plurality of suction grooves 12b formed between the plurality of support projections 12a do not abut against the workpieces (the first workpiece W1 and the second workpiece W2), the first workpiece from the first holding member 1 is not attached. When the holding surface 1a and the second workpiece holding surface 2a of the second holding member 2 are peeled off from the workpiece (the first workpiece W1 and the second workpiece W2), the workpiece can be smoothly peeled off and static electricity accompanying peeling hardly occurs.

由此,能夠確保防止因吸附保持引起之工件W1、W2的局部發生翹曲。 Thereby, it is possible to ensure that local warpage of the workpieces W1, W2 due to adsorption holding is prevented.

其結果,與習知之吸引保持時基板的一部分向吸附口彎曲變形而發生翹曲者相比,能夠抑制將工件W1保持於第1工件保持面1a、將工件W2保持於第2工件保持面2a時之翹曲,尤其,對於要求亞微米精度之貼合,亦能夠將面內以均勻的狀態貼合。因此,能夠製造高精度貼合設備W。 As a result, it is possible to prevent the workpiece W1 from being held by the first workpiece holding surface 1a and the workpiece W2 from being held by the second workpiece holding surface 2a as compared with the case where warpage is caused by bending and deforming a part of the substrate to the suction port during the conventional suction holding. The warpage of the time, in particular, for the bonding requiring submicron precision, it is also possible to fit the in-plane in a uniform state. Therefore, it is possible to manufacture the high-precision bonding apparatus W.

並且,與習知之剝離基板時產生靜電而帶電者相比,能夠將一對工件W1、W2長時間地保持平行狀態來進行貼合,並且能夠確保防止剝離帶電之影響。藉此,能夠長時間地進行穩定且高精度之貼合的同時,不僅能夠確保防止貼合設備W的破損、電路的斷線,還能夠確保防止因靜電帶來之其特性的改變。 In addition, it is possible to cause the pair of workpieces W1 and W2 to be in parallel with each other for a long period of time, and to prevent the influence of the peeling electrification, compared with the case where the substrate is separated from the conventional one. Thereby, it is possible to ensure stable and high-precision bonding for a long period of time, and it is possible to ensure not only damage of the bonding apparatus W but also disconnection of the circuit, and to prevent deterioration of characteristics due to static electricity.

尤其,以與複數個支撐突起12a相鄰之方式,將複數個吸氣槽12b相互靠近地配置為較佳。 In particular, it is preferable to arrange a plurality of suction grooves 12b close to each other so as to be adjacent to the plurality of support projections 12a.

在這種情況下,遍及整體硬塗層12的面上,每單位面積高密度地配置有支撐突起12a及吸氣槽12b。 In this case, the support protrusions 12a and the suction grooves 12b are disposed at a high density per unit area on the surface of the entire hard coat layer 12.

由此,能夠更平滑地保持工件(第1工件W1、第2工件W2)。 Thereby, the workpiece (the first workpiece W1 and the second workpiece W2) can be held more smoothly.

其結果,可以實現進一步提高工件(第1工件W1、第2工件W2)的貼合精度。 As a result, it is possible to further improve the bonding accuracy of the workpieces (the first workpiece W1 and the second workpiece W2).

而且,第1工件保持面1a或第2工件保持面2a中的任意一方或雙方具有表面粗化之複數個谷狀凹部12d,複數個谷狀凹部12d的外側藉由塗佈而層疊地形成複數個吸氣槽12b為較佳。 Further, either or both of the first workpiece holding surface 1a or the second workpiece holding surface 2a have a plurality of valley-shaped recesses 12d having a roughened surface, and the outer sides of the plurality of valley-shaped recesses 12d are laminated to form a plurality of layers by coating. A suction groove 12b is preferred.

在這種情況下,作為前加工,藉由將第1工件保持面1a及第2工件保持面2a進行表面粗化處理,同時形成複數個山狀凸部12c和複數個谷狀凹部12d,作為後處理,藉由在其外側以塗佈硬塗層12而層疊,同時形成複數個支撐突起12a及吸氣槽12b。 In this case, as the pre-machining, the first workpiece holding surface 1a and the second workpiece holding surface 2a are subjected to surface roughening treatment, and a plurality of mountain-shaped convex portions 12c and a plurality of valley-shaped concave portions 12d are simultaneously formed as The post-treatment is carried out by laminating the hard coat layer 12 on the outer side thereof, and at the same time, a plurality of support protrusions 12a and suction grooves 12b are formed.

由此,能夠以簡單的處理大致均勻地製成多個微小的山狀凸部12c及谷狀凹部12d。 Thereby, a plurality of minute mountain-shaped convex portions 12c and valley-shaped concave portions 12d can be formed substantially uniformly with a simple process.

其結果,能夠以短時間且低成本來緻密地製成山狀凸部12c及谷狀凹部12d。 As a result, the mountain-shaped convex portion 12c and the valley-shaped concave portion 12d can be densely formed in a short time and at low cost.

並且,將層疊地形成於複數個山狀凸部12c的外側之複數個支撐突起12a與層疊地形成於複數個谷狀凹部12d的外側之複數個吸氣槽12b進行表面粗化,以使其表面粗糙度(Ra)成為0.1~3.0左右為較佳。 Further, a plurality of support protrusions 12a formed on the outer side of the plurality of mountain-shaped convex portions 12c and a plurality of suction grooves 12b formed on the outer side of the plurality of valley-shaped concave portions 12d are roughened to have a surface roughened It is preferable that the surface roughness (Ra) is about 0.1 to 3.0.

在這種情況下,支撐突起12a與吸氣槽12b之高度差能夠使來自吸附卡盤31的吸附口31a之吸引力以所需量分別地遍及至複數個吸氣槽12b,在整體第1工件保持面1a上穩定地吸引保持第1工件W1及在整體第2工件保持面2a上穩定地吸引保持第2工件W2。 In this case, the difference in height between the support protrusion 12a and the suction groove 12b enables the suction force from the adsorption port 31a of the adsorption chuck 31 to spread to the plurality of suction grooves 12b in the required amount, respectively, in the whole first The workpiece holding surface 1a stably sucks and holds the first workpiece W1 and stably sucks and holds the second workpiece W2 on the entire second workpiece holding surface 2a.

而且,硬塗層12隔著第1工件保持面1a及第2工件保持面2a接地連接(接地),作為硬塗層12的材料,使用含有如在硬塗層12的表面上不會發生氧化被膜等絕緣體之導電材料之材料為進一步較佳。 Further, the hard coat layer 12 is grounded (grounded) via the first workpiece holding surface 1a and the second workpiece holding surface 2a, and the material of the hard coat layer 12 is used so as not to be oxidized on the surface of the hard coat layer 12. A material of a conductive material such as an insulator such as a film is further preferable.

在這種情況下,搬入至變壓室B時,存在於第1工件W1及第2工件W2的表面之大部分電荷會因與硬塗層12之接觸,經由第1工件保持面1a及第2工件保持面2a而流出。 In this case, when the pressure is applied to the pressure change chamber B, most of the electric charges existing on the surfaces of the first workpiece W1 and the second workpiece W2 are in contact with the hard coat layer 12, and pass through the first workpiece holding surface 1a and the first 2 The workpiece holding surface 2a flows out.

除此之外,由於複數個支撐突起12a與第1工件W1及第2工件W2點接觸而接觸面積非常小,因此亦很難引起剝離帶電。 In addition, since the plurality of support projections 12a are in point contact with the first workpiece W1 and the second workpiece W2, the contact area is extremely small, so that it is difficult to cause peeling electrification.

藉此,基本上能夠完全防止產生靜電。 Thereby, it is basically possible to completely prevent the generation of static electricity.

並且,第1工件保持面1a或第2工件保持面2a中的任意一方或雙方安裝具有硬塗層12之面板12P為進一步較佳。 Further, it is more preferable to attach the panel 12P having the hard coat layer 12 to either or both of the first workpiece holding surface 1a or the second workpiece holding surface 2a.

在這種情況下,藉由將面板12P安裝與第1工件保持面1a及第2工件保持面2a,由複數個支撐突起12a及複數個吸氣槽12b構成之精密的凹凸結構被組裝成一體。 In this case, by attaching the panel 12P to the first workpiece holding surface 1a and the second workpiece holding surface 2a, the precise uneven structure composed of the plurality of support projections 12a and the plurality of suction grooves 12b is assembled into one body. .

由此,能夠以簡單的安裝加工來輕鬆地設置複數個支撐突起12a及複數個吸氣槽12b。 Thereby, a plurality of support protrusions 12a and a plurality of suction grooves 12b can be easily provided by a simple mounting process.

其結果,能夠提高組裝精度。 As a result, the assembly accuracy can be improved.

[實施例] [Examples]

接著,根據圖式對本發明的一實施例進行說明。 Next, an embodiment of the present invention will be described based on the drawings.

如第1圖~第4圖所示,該實施例係,第2保持構件2具有將完成貼合之一對工件W1、W2,亦即,將貼合設備W從第2工件保持面2a剝去之剝離構件7者。 As shown in FIGS. 1 to 4, in this embodiment, the second holding member 2 has one of the completed workpieces W1 and W2, that is, the bonding apparatus W is peeled off from the second workpiece holding surface 2a. The peeling member 7 is removed.

如第1圖~第4圖所示之例子,藉由剝離構件7之按壓而從第2工件保持面2a按壓剝離第2工件W2。 In the example shown in FIGS. 1 to 4, the second workpiece W2 is pressed and peeled from the second workpiece holding surface 2a by the pressing of the peeling member 7.

剝離構件7具有:複數個升降銷7a,通過開鑿於第2保持構件2之貫穿孔2h,以與第2工件W2的表面向Z方向對向之方式向Z方向往復移動自如地設置;剝離用從動部7b,遍及複數個升降銷7a的基端而設置;及剝離用驅動部7c,與剝離用從動部7b連接。 The peeling member 7 has a plurality of lift pins 7a, and is inserted into the through hole 2h of the second holding member 2, and is reciprocally movable in the Z direction so as to face the surface of the second workpiece W2 in the Z direction; The driven portion 7b is provided over the base end of the plurality of lift pins 7a, and the peeling drive portion 7c is connected to the peeling driven portion 7b.

升降銷7a以相對第2工件保持面2a向XY方向分散之方式配置,升降銷7a的個數及間隔係與第2工件W2的尺寸、厚度、材質、貼合設備W的重量等對應地進行確定。 The lift pins 7a are disposed so as to be dispersed in the XY direction with respect to the second workpiece holding surface 2a, and the number and interval of the lift pins 7a are performed in accordance with the size, thickness, material, weight of the bonding apparatus W, and the like of the second workpiece W2. determine.

剝離用驅動部7c由向Z方向能夠往復移動之驅動器等構成,如第1圖~第3圖所示,藉由控制部6,從接收搬入至變壓室B內之第2工件W2時至貼合第1工件W1及第2工件W2時為止,以使升降銷7a的前端部陷入至貫穿孔2h內之方式進行作動控制。如第4圖所示,貼合第1工件W1及第2工件W2之後,以使升降銷7a的前端部從貫穿孔2h向第2工件W2的表面突出,第2工件W2從第2工件保持面2a被剝去之方式進行作動控制。 The peeling drive unit 7c is configured by a driver or the like that can reciprocate in the Z direction. As shown in FIGS. 1 to 3, the control unit 6 receives the second workpiece W2 in the pressure change chamber B from the reception to the second workpiece W2. When the first workpiece W1 and the second workpiece W2 are bonded together, the operation of controlling the movement of the tip end portion of the lift pin 7a into the through hole 2h is performed. As shown in Fig. 4, after the first workpiece W1 and the second workpiece W2 are bonded together, the front end portion of the lift pin 7a protrudes from the through hole 2h toward the surface of the second workpiece W2, and the second workpiece W2 is held from the second workpiece. The surface 2a is stripped to perform actuation control.

並且,升降銷7a的前端部設置工件保持用卡盤部(未圖示)為較佳。 Further, it is preferable that the front end portion of the lift pin 7a is provided with a workpiece holding chuck portion (not shown).

依據該種本發明的實施例之貼合設備W的製造裝置A,由於工件(第2工件W2)與第2保持構件2之間產生(由微小的空間部12s構成 之多個)空氣層,因此基於壓力差之工件(第2工件W2)與第2保持構件2之緊貼消失。與此同時,由於藉由複數個吸氣槽12b,工件(第2工件W2)與第2保持構件2的接觸面積非常小,因此剝離帶電被抑制而靜電帶來之拘束消失。藉此,即使使用剝離構件7將完成貼合之一對工件(第1工件W1、第2工件W2),亦即將貼合設備W從第2保持構件2的第2工件保持面2a剝去,但由於工件(第2工件W2)與第2工件保持面2a的界面不會黏貼,因此能夠順利地將貼合設備W的按壓部分無翹曲變形地剝去。 According to the manufacturing apparatus A of the bonding apparatus W of the embodiment of the present invention, the workpiece (the second workpiece W2) and the second holding member 2 are generated (consisting of the minute space portion 12s) Since the air layer is plural, the adhesion between the workpiece (the second workpiece W2) based on the pressure difference and the second holding member 2 disappears. At the same time, since the contact area of the workpiece (second workpiece W2) and the second holding member 2 is extremely small by the plurality of suction grooves 12b, the peeling electrification is suppressed and the restraint of the static electricity is lost. Thereby, even if the pair of workpieces (the first workpiece W1 and the second workpiece W2) are completed and bonded by using the peeling member 7, the bonding apparatus W is peeled off from the second workpiece holding surface 2a of the second holding member 2, However, since the interface between the workpiece (the second workpiece W2) and the second workpiece holding surface 2a is not adhered, the pressing portion of the bonding apparatus W can be smoothly peeled off without warping deformation.

由此,能夠使用剝離構件7將已貼合之一對工件(貼合設備W)無翹曲變形地剝離而防止對位精度之改變。 Thereby, it is possible to peel off one of the bonded workpieces (bonding device W) without warpage deformation using the peeling member 7, and to prevent the change in the alignment accuracy.

其結果,與習知之藉由升降銷將已貼合之一對基板分開時容易發生局部翹曲者相比,即使係高清晰的液晶顯示器或有機EL顯示器等,亦可以防止因偏位引起之不均勻和漏光等局部缺陷,具有能夠實現提高成品率之優點。 As a result, it is possible to prevent the occurrence of partial warpage by a high-definition liquid crystal display or an organic EL display, etc., compared with a conventional one in which a pair of substrates are separated by a lift pin. Local defects such as unevenness and light leakage have the advantage of achieving improved yield.

另外,前述之實施形態中,作為保持卡盤3的具體例,在第1保持構件1的第1工件保持面1a及第2保持構件2的第2工件保持面2a上分別設置了吸附卡盤31,但並不限定於此,第1工件保持面1a及第2工件保持面2a上亦可以不設置吸附卡盤31,而設置黏著卡盤32或靜電卡盤等。 Further, in the above-described embodiment, as a specific example of the holding chuck 3, adsorption chucks are provided on the first workpiece holding surface 1a of the first holding member 1 and the second workpiece holding surface 2a of the second holding member 2, respectively. 31. However, the first workpiece holding surface 1a and the second workpiece holding surface 2a may be provided with an adhesive chuck 32 or an electrostatic chuck without providing the chuck 31.

而且,前述之實施例中,藉由第2保持構件2所具有之剝離構件7從第2工件保持面2a剝去了完成貼合之一對工件W1、W2,但並不限定於此,亦可以藉由於第2保持構件2無關地設置之剝離構件從第2工件保持面2a剝去完成貼合之一對工件W1、W2。 Further, in the above-described embodiment, the pair of workpieces W1 and W2 are removed from the second workpiece holding surface 2a by the peeling member 7 of the second holding member 2, but the present invention is not limited thereto. One of the pair of workpieces W1 and W2 can be peeled off from the second workpiece holding surface 2a by the peeling member provided independently of the second holding member 2.

1‧‧‧第1保持構件 1‧‧‧1st holding member

1a‧‧‧第1工件保持面 1a‧‧‧1st workpiece holding surface

1b‧‧‧第1工件保持面1a的域外面 1b‧‧‧ outside the domain of the first workpiece holding surface 1a

1h‧‧‧開鑿於第1保持構件之貫穿孔 1h‧‧‧through hole in the first holding member

2‧‧‧第2保持構件 2‧‧‧2nd holding member

2a‧‧‧第2工件保持面 2a‧‧‧2nd workpiece holding surface

2b‧‧‧第2工件保持面2a的域外面 2b‧‧‧ outside the domain of the second workpiece holding surface 2a

2h‧‧‧開鑿於第2保持構件2之貫穿孔 2h‧‧‧through hole in the second holding member 2

3‧‧‧保持卡盤 3‧‧‧ Keeping the chuck

4‧‧‧接觸分離用驅動部 4‧‧‧Contact separation drive unit

5‧‧‧定位用驅動部 5‧‧‧ Positioning drive unit

6‧‧‧控制部 6‧‧‧Control Department

7‧‧‧剝離構件 7‧‧‧ peeling members

7a‧‧‧升降銷 7a‧‧‧lifting pin

7b‧‧‧剝離用從動部 7b‧‧‧Removal slave

7c‧‧‧剝離用驅動部 7c‧‧‧ peeling drive unit

12‧‧‧硬塗層 12‧‧‧hard coating

12a‧‧‧支撐突起 12a‧‧‧Support protrusion

12b‧‧‧吸氣槽 12b‧‧‧Intake tank

12c‧‧‧山狀凸部 12c‧‧‧Mountain-like convex

12d‧‧‧谷狀凹部 12d‧‧‧ valley recess

12P‧‧‧面板 12P‧‧‧ panel

12s‧‧‧空間部 12s‧‧‧ Space Department

31‧‧‧吸附卡盤 31‧‧‧Adsorption chuck

31a‧‧‧吸附口 31a‧‧‧Adsorption port

31b‧‧‧通氣道 31b‧‧‧Airway

31c‧‧‧吸氣源 31c‧‧‧ Inhalation source

32‧‧‧黏著卡盤 32‧‧‧Adhesive chuck

32a‧‧‧升降部 32a‧‧‧ Lifting Department

32b‧‧‧黏著部 32b‧‧‧Adhesive

32c‧‧‧黏著用從動部 32c‧‧‧Adhesive follower

32d‧‧‧黏著用驅動部 32d‧‧‧Adhesive drive unit

A‧‧‧貼合設備的製造裝置 A‧‧‧ manufacturing equipment for bonding equipment

B‧‧‧變壓室 B‧‧‧Various pressure chamber

DP‧‧‧減壓氣氛 DP‧‧‧ decompression atmosphere

W‧‧‧貼合設備 W‧‧‧Fitting equipment

W1‧‧‧第1工件 W1‧‧‧1st workpiece

W2‧‧‧第2工件 W2‧‧‧2nd workpiece

W3‧‧‧密封材 W3‧‧‧ sealing material

Claims (6)

一種貼合設備的製造裝置,其特徵在於:其係將一對工件分別保持於第1保持構件和第2保持構件,藉由上述第1保持構件和上述第2保持構件相對地接近移動,而將上述一對工件對位貼合者,且上述第1保持構件的第1工件保持面或上述第2保持構件的第2工件保持面中的任意一方或雙方具備硬塗層,該硬塗層與上述一對工件中的一方或雙方對向,並且其表面以較上述第1保持構件、上述第2保持構件及上述一對工件的材質更硬之材料形成為凹凸形狀,上述硬塗層係自上述第1工件保持面或上述第2工件保持面中的任意一方或雙方向上述一對工件中的一方或雙方呈山狀突出,且具有與上述一對工件中的一方的平滑表面或雙方的平滑表面分別地點接觸之複數個支撐突起。 A manufacturing apparatus for a bonding apparatus, wherein a pair of workpieces are respectively held by the first holding member and the second holding member, and the first holding member and the second holding member are relatively moved toward each other, and One or both of the first workpiece holding surface of the first holding member or the second workpiece holding surface of the second holding member are provided with a hard coat layer, and the hard coat layer is provided. Or facing the one or both of the pair of workpieces, and the surface thereof is formed into a concavo-convex shape by a material harder than the materials of the first holding member, the second holding member, and the pair of workpieces, and the hard coat layer is One or both of the pair of workpieces from the first workpiece holding surface or the second workpiece holding surface or both of the pair of workpieces protrude in a mountain shape, and have a smooth surface or both of the pair of workpieces The smooth surfaces are in contact with a plurality of support protrusions. 如請求項1之貼合設備的製造裝置,其中上述第1工件保持面或上述第2工件保持面中的任意一方或雙方具有經表面粗化之複數個山狀凸部,上述複數個支撐突起藉由塗佈而層疊形成於上述複數個山狀凸部的外側。 The apparatus for manufacturing a bonding apparatus according to claim 1, wherein one or both of the first workpiece holding surface and the second workpiece holding surface have a plurality of mountain-shaped convex portions that are roughened by a surface, and the plurality of support protrusions The laminate is formed on the outer side of the plurality of mountain-shaped convex portions by coating. 如請求項1或2之貼合設備的製造裝置,其中上述第1工件保持面或上述第2工件保持面中的任意一方或雙方具備吸引並保持上述一對工件中的一方或雙方之吸附口,上述硬塗層具有以於上述複數個支撐突起之彼此間與上述吸附口連通之方式形成為谷狀之複數個吸氣槽。 The manufacturing apparatus of the bonding apparatus according to claim 1 or 2, wherein either or both of the first workpiece holding surface and the second workpiece holding surface are provided with suction ports for sucking and holding one or both of the pair of workpieces The hard coat layer has a plurality of suction grooves formed in a valley shape so that the plurality of support protrusions communicate with the adsorption port. 如請求項3之貼合設備的製造裝置,其中 上述第1工件保持面或上述第2工件保持面中的任意一方或雙方具有經表面粗化之複數個谷狀凹部,上述複數個吸氣槽藉由塗佈而層疊形成於上述複數個谷狀凹部的外側。 The manufacturing apparatus of the bonding apparatus of claim 3, wherein One or both of the first workpiece holding surface or the second workpiece holding surface has a plurality of valley-shaped recesses that are roughened by a surface, and the plurality of suction grooves are laminated and formed on the plurality of valleys by coating The outside of the recess. 如請求項3之貼合設備的製造裝置,其中於上述第1工件保持面或上述第2工件保持面中的任意一方或雙方安裝具有上述硬塗層之面板。 The apparatus for manufacturing a bonding apparatus according to claim 3, wherein a panel having the hard coat layer is attached to either or both of the first workpiece holding surface or the second workpiece holding surface. 如請求項3之貼合設備的製造裝置,其中上述第2保持構件具有自上述第2工件保持面剝去完成貼合之上述一對工件之剝離構件。 The manufacturing apparatus of the bonding apparatus of claim 3, wherein the second holding member has a peeling member that peels off the pair of workpieces that have been bonded from the second workpiece holding surface.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI745481B (en) * 2016-12-27 2021-11-11 日商迪思科股份有限公司 Electrostatic chuck device and electrostatic adsorption method

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108602342B (en) * 2016-10-17 2020-06-12 信越工程株式会社 Vacuum laminating device for laminating device
JP6255546B1 (en) * 2016-10-17 2017-12-27 信越エンジニアリング株式会社 Vacuum bonding equipment for bonding devices
JP2018206993A (en) * 2017-06-06 2018-12-27 日本特殊陶業株式会社 Substrate holding member and manufacturing method thereof
JP6374132B1 (en) * 2018-04-06 2018-08-15 信越エンジニアリング株式会社 Bonding device manufacturing apparatus and bonding device manufacturing method
JP6733966B2 (en) * 2018-07-09 2020-08-05 Aiメカテック株式会社 Board assembly apparatus and board assembly method
CN110126247A (en) * 2019-05-14 2019-08-16 东莞市集银智能装备有限公司 A kind of material conveying platform, the full-automatic abutted equipment and automatic attaching method for having it

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5523941A (en) * 1978-08-09 1980-02-20 Agency Of Ind Science & Technol Immobilization of enzyme using water-soluble photo- crosslinkable resin
JPH0945753A (en) * 1995-07-28 1997-02-14 Kyocera Corp Object supporting device
JP4690572B2 (en) 2000-11-30 2011-06-01 キヤノンアネルバ株式会社 Substrate overlay device
JP2003332411A (en) * 2002-05-17 2003-11-21 Nikon Corp Substrate holding equipment and aligner
JP2004009165A (en) * 2002-06-04 2004-01-15 Ngk Spark Plug Co Ltd Sucking chuck
JP3926231B2 (en) * 2002-07-18 2007-06-06 鹿児島日本電気株式会社 Manufacturing method of liquid crystal display device
JP2005199380A (en) * 2004-01-15 2005-07-28 Fujikura Rubber Ltd Buffer material for sucking and holding
JP4899357B2 (en) * 2005-07-01 2012-03-21 株式会社Ihi Substrate adsorption device
JP4895635B2 (en) * 2006-02-20 2012-03-14 セイコーインスツル株式会社 Transport device
WO2008114337A1 (en) * 2007-02-22 2008-09-25 Shin-Etsu Engineering Co., Ltd. Vacuum bonding method and vacuum bonding device
US8485507B2 (en) * 2007-11-13 2013-07-16 Ulvac, Inc. Movable table and processing stage
JP5654155B1 (en) * 2014-04-04 2015-01-14 信越エンジニアリング株式会社 Work bonding machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI745481B (en) * 2016-12-27 2021-11-11 日商迪思科股份有限公司 Electrostatic chuck device and electrostatic adsorption method

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