TW201639934A - Surface protection film, and optical member - Google Patents

Surface protection film, and optical member Download PDF

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TW201639934A
TW201639934A TW105101081A TW105101081A TW201639934A TW 201639934 A TW201639934 A TW 201639934A TW 105101081 A TW105101081 A TW 105101081A TW 105101081 A TW105101081 A TW 105101081A TW 201639934 A TW201639934 A TW 201639934A
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acid
group
mass
cation
meth
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TW105101081A
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TWI684634B (en
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Kenichi Kataoka
Natsuko Watanabe
Kazuma Mitsui
Tatsumi Amano
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Nitto Denko Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/08Macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04Polyurethanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/16Anti-static materials

Abstract

Provided are a surface protection film with which it is possible to achieve anti-static properties and temporal stability in peeling electrostatic potential, and an optical member. The surface protection film of the present invention is provided with a base material having a first surface and a second surface, an anti-static layer provided on the first surface of the base material, and an adhesive layer formed from an adhesive composition on the second surface of the base material, wherein the surface protection film is characterized in that: the anti-static layer is formed from an anti-static composition containing polyaniline sulfonic acid and polythiophenes doped by polyanions as conductive polymer components, and a binder; and the mixture ratio (mass ratio) of the polyaniline sulfonic acid and the polythiophenes doped by polyanions is 90:10-10:90.

Description

表面保護薄膜及光學構件 Surface protection film and optical member 技術領域 Technical field

本發明有關於表面保護薄膜及光學構件。 The present invention relates to a surface protective film and an optical member.

本發明有關於一種表面保護薄膜,具有:具第一面及第二面之基材、設於前述基材之前述第一面的抗靜電層、及設於前述基材之前述第二面的黏著劑層,詳而言之係有關於一種具有抗靜電機能之表面保護薄膜。本發明之表面保護薄膜適用於貼附在容易產生靜電的塑膠製品等用途。其中,特別以作為保護光學構件(例如,液晶顯示器等所使用之偏光板、波長板、相位差板、光學補償膜、反射片材、亮度提升膜)等表面為目的所使用之表面保護薄膜有用。 The present invention relates to a surface protection film comprising: a substrate having a first surface and a second surface; an antistatic layer provided on the first surface of the substrate; and a second surface provided on the second surface of the substrate The adhesive layer, in detail, relates to a surface protective film having an antistatic function. The surface protective film of the present invention is suitable for use in applications such as plastic products which are prone to generate static electricity. In particular, it is useful as a surface protective film for the purpose of protecting surfaces such as a polarizing plate, a wavelength plate, a phase difference plate, an optical compensation film, a reflection sheet, and a brightness enhancement film used for a liquid crystal display or the like. .

背景技術 Background technique

表面保護薄膜(亦稱表面保護片材。),一般具有於薄膜狀之基材(支撐體)上設有黏著劑層的構造。該保護膜係透過前述黏著劑層貼合於被著體(被保護體),目的係藉此保護被著體於加工、搬運時等受到損傷或汙染。例如,液晶顯示器之面板係藉由透過黏著劑層將偏光板或波長板等 光學構件貼合至液晶單元所形成。該液晶顯示器面板之製造中,貼合於液晶單元之偏光板於暫時被製造成輥之形態後,自該輥捲出,再對應液晶單元之形狀切割成所期之尺寸後使用。此處,為防止偏光板於中間步驟中與搬運輥等擦傷,而有採取於偏光板之一面或兩面(典型係一面)貼合表面保護薄膜的對策。該表面保護薄膜於不需要的時候即可剝離去除。 The surface protective film (also referred to as a surface protective sheet) generally has a structure in which an adhesive layer is provided on a film-form substrate (support). The protective film is bonded to the object (protected body) through the adhesive layer, thereby protecting the object from damage or contamination during processing, transportation, and the like. For example, a panel of a liquid crystal display is provided by a polarizing plate or a wavelength plate through an adhesive layer. The optical member is formed by bonding to the liquid crystal cell. In the manufacture of the liquid crystal display panel, the polarizing plate bonded to the liquid crystal cell is temporarily wound into a roll, and is taken out from the roll, and then cut into a desired size corresponding to the shape of the liquid crystal cell. Here, in order to prevent the polarizing plate from being scratched by the conveyance roller or the like in the intermediate step, there is a measure for bonding the surface protection film to one surface or both surfaces (typically one side) of the polarizing plate. The surface protective film can be peeled off when it is not needed.

一般而言,表面保護薄膜或光學構件因由塑膠材料所構成,故電絕緣性高,藉由摩擦或剝離將產生靜電。因此,自偏光板等光學構件剝離表面保護薄膜時亦容易產生靜電,於留有該靜電之狀態下對液晶施加電壓時,將有損失液晶分子之配向、或產生面板缺陷的疑慮。又,靜電之存在將成為吸引塵埃、造成作業性下降的原因。因此等情事,有人進行了於表面保護薄膜施行抗靜電處理的方法,例如,於表面保護薄膜之表面層(表塗層、背面層)形成抗靜電層或施行抗靜電塗布,以賦與抗靜電機能(參照專利文獻1)。 In general, since the surface protective film or the optical member is made of a plastic material, electrical insulation is high, and static electricity is generated by rubbing or peeling. Therefore, when the surface protective film is peeled off from the optical member such as a polarizing plate, static electricity is likely to be generated, and when a voltage is applied to the liquid crystal in a state where the static electricity is left, there is a fear that the alignment of the liquid crystal molecules or the occurrence of panel defects may occur. Moreover, the presence of static electricity is a cause of attracting dust and causing a decrease in workability. Therefore, a method of performing antistatic treatment on the surface protective film has been carried out, for example, an antistatic layer is formed on the surface layer (surface coating, back layer) of the surface protective film or an antistatic coating is applied to impart antistatic effect. Function (refer to Patent Document 1).

又,近年來,為賦與表面保護薄膜表面層抗靜電機能所使用之導電性聚合物,使用有PEDOT(聚(3,4-乙二氧基噻吩)/PSS(聚苯乙烯磺酸)(聚噻吩型)系之水分散型者。但,使用前述導電性聚合物形成有抗靜電層時,隨著時間經過PSS(相當於摻雜物)將自PEDOT脫離,造成表面電阻率或剝離靜電位上升等,又,有產生氧化降解或光降解所造成表面電阻率上升(劣化)等問題的疑慮。又,產生表面電阻 率上升(劣化)等時,自被著體剝離表面保護薄膜時將產生靜電,而有產生問題的疑慮。 Further, in recent years, PEDOT (poly(3,4-ethylenedioxythiophene)/PSS (polystyrenesulfonic acid)) has been used for the conductive polymer used for imparting antistatic function to the surface layer of the surface protective film. Polythiophene type) is a water-dispersible type. However, when an antistatic layer is formed using the above conductive polymer, PSS (corresponding to a dopant) will be detached from PEDOT over time, causing surface resistivity or peeling off static electricity. The position rises, etc., and there are doubts about problems such as an increase in surface resistivity (deterioration) caused by oxidative degradation or photodegradation. When the rate rises (deterioration) or the like, static electricity is generated when the surface protective film is peeled off from the object, and there is a concern that a problem arises.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1:日本專利特開2008-255332號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2008-255332

發明概要 Summary of invention

因此,本發明有鑑於前述情事,致力研究的結果,目的在於提供可達成抗靜電性與剝離靜電位之經時穩定性的表面保護薄膜及光學構件。 Accordingly, the present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a surface protective film and an optical member which can achieve antistatic properties and temporal stability of a peeling electrostatic potential.

換言之,本發明之表面保護薄膜具有:具第一面及第二面之基材、設於前述基材之前述第一面的抗靜電層、及形成於前述基材之前述第二面且由黏著劑組成物形成的黏著劑層,該表面保護薄膜之特徵在於:前述抗靜電層係由抗靜電劑組成物形成者,該抗靜電劑組成物含有作為導電性聚合物成分的聚苯胺磺酸及以聚陰離子類摻雜之聚噻吩類、以及黏合劑;前述聚苯胺磺酸與前述以聚陰離子類摻雜之聚噻吩類的摻合比例(質量比)係90:10~10:90。 In other words, the surface protection film of the present invention has a substrate having a first surface and a second surface, an antistatic layer provided on the first surface of the substrate, and a second surface formed on the substrate and An adhesive layer formed of an adhesive composition characterized in that the antistatic layer is formed of an antistatic agent composition containing polyaniline sulfonic acid as a conductive polymer component. And a polythiophene doped with a polyanion, and a binder; the blending ratio (mass ratio) of the polyaniline sulfonic acid to the polyanion-doped polythiophene is 90:10 to 10:90.

本發明之表面保護薄膜中,前述聚噻吩類以聚(3,4-乙二氧基噻吩)(PEDOT)為佳。 In the surface protective film of the present invention, the polythiophene is preferably poly(3,4-ethylenedioxythiophene) (PEDOT).

本發明之表面保護薄膜中,前述聚陰離子類以聚苯乙烯磺酸(PSS)為佳。 In the surface protective film of the present invention, the polyanion is preferably polystyrenesulfonic acid (PSS).

本發明之表面保護薄膜中,前述黏合劑以聚酯樹脂為佳。 In the surface protection film of the present invention, the binder is preferably a polyester resin.

本發明之表面保護薄膜中,前述抗靜電劑組成物宜含有三聚氰胺系交聯劑及/或異氰酸酯系交聯劑作為交聯劑。 In the surface protection film of the present invention, the antistatic agent composition preferably contains a melamine crosslinking agent and/or an isocyanate crosslinking agent as a crosslinking agent.

本發明之表面保護薄膜中,前述抗靜電劑組成物宜含有選自於由脂肪酸醯胺、脂肪酸酯、聚矽氧系潤滑劑、氟系潤滑劑及蠟系潤滑劑所構成群組中之至少1種作為潤滑劑。 In the surface protection film of the present invention, the antistatic agent composition preferably contains a group selected from the group consisting of fatty acid guanamines, fatty acid esters, polyfluorene-based lubricants, fluorine-based lubricants, and wax-based lubricants. At least one type is used as a lubricant.

本發明之表面保護薄膜中,前述基材以聚酯薄膜為佳。 In the surface protection film of the present invention, the substrate is preferably a polyester film.

本發明之表面保護薄膜中,前述黏著劑組成物宜含有選自於由丙烯酸系黏著劑、胺基甲酸酯系黏著劑及聚矽氧系黏著劑所構成群組中之至少1種。 In the surface protection film of the present invention, the adhesive composition preferably contains at least one selected from the group consisting of an acrylic adhesive, an urethane adhesive, and a polyoxygen adhesive.

本發明之表面保護薄膜中,前述黏著劑組成物宜含有聚醚系化合物。 In the surface protection film of the present invention, the adhesive composition preferably contains a polyether compound.

本發明之表面保護薄膜中,前述黏著劑組成物宜含有抗靜電成分。 In the surface protective film of the present invention, the above-mentioned adhesive composition preferably contains an antistatic component.

本發明之光學構件宜受前述表面保護薄膜保護。 The optical member of the present invention is preferably protected by the aforementioned surface protective film.

本發明之表面保護薄膜中,設於前述基材之前述第一面(背面)的抗靜電層係由以特定比例含有特定導電性聚合物成分的抗靜電劑組成物所形成者,藉此,可有用於提供一種可達成由前述抗靜電層帶來之抗靜電性或剝離靜 電位之經時穩定性的表面保護薄膜及光學構件。 In the surface protection film of the present invention, the antistatic layer provided on the first surface (back surface) of the substrate is formed of an antistatic agent composition containing a specific conductive polymer component in a specific ratio, whereby It may be used to provide an antistatic property or peeling static which can be achieved by the aforementioned antistatic layer. A surface protective film and an optical member having a potential stability over time.

1‧‧‧表面保護薄膜 1‧‧‧Surface protection film

10‧‧‧壓克力板 10‧‧‧Acrylic sheet

11‧‧‧帶電防止層 11‧‧‧Electrified prevention layer

12‧‧‧基材 12‧‧‧Substrate

13‧‧‧黏著劑層 13‧‧‧Adhesive layer

20‧‧‧偏光板 20‧‧‧Polar plate

30‧‧‧試樣固定台 30‧‧‧sample fixed table

40‧‧‧電位測量器 40‧‧‧potentiometer

圖1係顯示本發明之表面保護薄膜一構成例的示意截面圖。 Fig. 1 is a schematic cross-sectional view showing a configuration example of a surface protective film of the present invention.

圖2係顯示剝離靜電位之測量方法的說明圖。 Fig. 2 is an explanatory view showing a method of measuring the peeling electrostatic potential.

用以實施發明之形態 Form for implementing the invention

以下,詳細地說明本發明之實施形態。 Hereinafter, embodiments of the present invention will be described in detail.

<表面保護薄膜之全體構造> <Overall construction of surface protection film>

此處所揭示之表面保護薄膜一般係稱作黏著片材、黏著膠帶、黏著標籤、黏著膜等之形態者,特別以作為加工或搬運光學部件(例如,作為偏光板、波長板等液晶顯示器面板構成要素所使用的光學部件)時保護光學部件表面的表面保護薄膜為佳。典型之前述表面保護薄膜之黏著劑層係連續形成,但並未受該形態所限定,亦可為形成有例如,點狀、條紋狀等規則或隨機之圖案的黏著劑層。又,此處所揭示之表面保護薄膜亦可為輥狀或片狀。 The surface protective film disclosed herein is generally referred to as an adhesive sheet, an adhesive tape, an adhesive label, an adhesive film, etc., and is particularly useful as a processing or handling optical component (for example, as a liquid crystal display panel such as a polarizing plate or a wave plate). It is preferable to protect the surface protective film on the surface of the optical member when the optical member used for the element is used. Typically, the adhesive layer of the surface protective film is continuously formed, but is not limited by the form, and may be an adhesive layer formed with a regular or random pattern such as a dot or a stripe. Further, the surface protective film disclosed herein may be in the form of a roll or a sheet.

於圖1示意顯示此處所揭示之表面保護薄膜的典型構造例。該表面保護薄膜1具有:基材(例如,聚酯薄膜)12、設於該第一面12上之抗靜電層11、設於基材12之第二面(與抗靜電層11相反側之表面)的黏著劑層13。表面保護薄膜1係藉由將該黏著劑層13貼附於被著體(保護對象,例如,偏光板等光學部件表面)後使用。使用前(即,貼附至被著體前)之表面保護薄膜1亦可呈黏著劑層13之表面(對被著 體之貼附面)至少受黏著劑層13側之成為剝離面的剝離襯墊保護的形態。抑或,亦可呈藉由將表面保護薄膜1捲取成輥狀,黏著劑層13抵接基材12之背面(抗靜電層11之表面)而保護其表面的形態。 A typical configuration example of the surface protective film disclosed herein is schematically shown in FIG. The surface protection film 1 has a substrate (for example, a polyester film) 12, an antistatic layer 11 provided on the first surface 12, and a second surface provided on the substrate 12 (on the opposite side to the antistatic layer 11). Adhesive layer 13 of the surface). The surface protective film 1 is used by attaching the adhesive layer 13 to a subject (protecting object, for example, a surface of an optical member such as a polarizing plate). The surface protective film 1 before use (that is, attached to the front of the object) may also be on the surface of the adhesive layer 13 The attached surface of the body is protected by at least a release liner which is a release surface on the side of the adhesive layer 13. Alternatively, the surface protective film 1 may be wound into a roll shape, and the adhesive layer 13 may be in contact with the back surface of the substrate 12 (the surface of the antistatic layer 11) to protect the surface thereof.

如圖1所示,直接(不透過其他層)於基材12之第一面上形成抗靜電層11,該抗靜電層11露出表面保護薄膜1背面之態樣(即,抗靜電層11兼具表塗層之態樣),相較於另外設置有表塗層與抗靜電層的構造,於基材12上設有抗靜電層11之附抗靜電層之薄膜(甚至是使用該薄膜而成的表面保護薄膜)因可減少構成表面保護薄膜之層的數量而作成,由提升生產性等之觀點來看亦有利。 As shown in FIG. 1, the antistatic layer 11 is formed directly on the first surface of the substrate 12 (without other layers), and the antistatic layer 11 exposes the back surface of the surface protective film 1 (ie, the antistatic layer 11 is also In the form of a surface coating layer, a film with an antistatic layer of the antistatic layer 11 is provided on the substrate 12 compared to a configuration in which a surface coating layer and an antistatic layer are additionally provided (even using the film) The formed surface protective film is produced by reducing the number of layers constituting the surface protective film, and is also advantageous from the viewpoint of improving productivity and the like.

<基材> <Substrate>

本發明之表面保護薄膜的特徵係具有具第一面(背面)及第二面(與第一面相反側之面)之基材。此處所揭示之技術中,並未特別限制使用構成基材之樹脂材料,但以使用例如,透明性、機械強度、熱穩定性、水分遮蔽性、等向性、可撓性、尺寸穩定性等特性優異者為佳。特別是,藉使基材具可撓性,可以輥塗布器等塗布黏著劑組成物,可捲取成輥狀係為有用。 The surface protective film of the present invention is characterized in that it has a substrate having a first surface (back surface) and a second surface (surface opposite to the first surface). In the technique disclosed herein, the resin material constituting the substrate is not particularly limited, but for example, transparency, mechanical strength, thermal stability, moisture shielding property, isotropic property, flexibility, dimensional stability, and the like are used. Those with excellent characteristics are preferred. In particular, if the substrate is flexible, the adhesive composition can be applied by a roll coater or the like, and it can be wound into a roll.

前述基材(支撐體)可舉例如以:聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯等聚酯系聚合物;二乙醯纖維素、三乙醯纖維素等纖維素系聚合物;聚碳酸酯系聚合物;聚甲基丙烯酸甲酯等丙烯酸系聚合物等作為主要樹脂成分(樹脂成分中之主成 分,典型而言係佔50質量%以上之成分)的樹脂材料所構成的塑膠薄膜作為前述基材使用為佳。前述樹脂材料之其他例,可舉以下述作為樹脂材料者為例:聚苯乙烯、丙烯腈-苯乙烯共聚物等苯乙烯系聚合物;聚乙烯、聚丙烯、聚環狀或降烯構造之聚烯烴、乙烯-丙烯共聚物等烯烴系聚合物;氯化乙烯系聚合物;尼龍6、尼龍6,6、芳香族聚醯胺等醯胺系聚合物等。前述樹脂材料之另外的例,可舉例如:醯亞胺系聚合物、碸系聚合物、聚醚碸系聚合物、聚醚醚酮系聚合物、聚苯硫系聚合物、乙烯醇系聚合物、氯化亞乙烯基系聚合物、乙烯丁醛系聚合物、芳酯系聚合物、聚甲醛系聚合物、環氧系聚合物等。亦可為由2種以上之上述聚合物的摻合物所構成的基材。 The base material (support) may, for example, be a polyester polymer such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN) or polybutylene terephthalate; A cellulose-based polymer such as diacetyl cellulose or triacetyl cellulose; a polycarbonate polymer; an acrylic polymer such as polymethyl methacrylate or the like as a main resin component (a main component of a resin component, typically A plastic film composed of a resin material containing 50% by mass or more of the component is preferably used as the substrate. Other examples of the resin material include, as a resin material, a styrene polymer such as polystyrene or acrylonitrile-styrene copolymer; polyethylene, polypropylene, polycyclic or descending; An olefin polymer such as an olefin structure or an ethylene-propylene copolymer; a chlorinated ethylene polymer; a amide amine polymer such as nylon 6, nylon 6,6 or an aromatic polyamine. Further examples of the resin material include a quinone imine polymer, a fluorene polymer, a polyether fluorene polymer, a polyether ether ketone polymer, a polyphenylene sulfide polymer, and a vinyl alcohol polymerization. A vinyl chloride polymer, an ethylene butyral polymer, an aryl ester polymer, a polyoxymethylene polymer, or an epoxy polymer. It may be a substrate composed of a blend of two or more of the above polymers.

前述基材可較佳地使用由透明之熱可塑性樹脂材料所構成的塑膠薄膜。前述塑膠薄膜中亦以使用聚酯薄膜為較佳態樣。此處,聚酯薄膜係指以聚合物材料(聚酯樹脂)作為主要樹脂成分者,前述聚合物材料(聚酯樹脂)具以聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯等酯鍵作為基本之主骨架。該聚酯薄膜除了具優異之光學特性或尺寸穩定性等作為表面保護薄膜之基材較佳的特性以外,亦有其原本就具容易帶電的性質。 As the substrate, a plastic film composed of a transparent thermoplastic resin material can be preferably used. A polyester film is also preferred in the above plastic film. Here, the polyester film refers to a polymer material (polyester resin) having polyethylene terephthalate (PET) or polynaphthalene dicarboxylic acid as a main resin component. An ester bond such as ethylene glycol (PEN) or polybutylene terephthalate is used as a basic main skeleton. In addition to the excellent properties of the substrate as a surface protective film, such as excellent optical properties or dimensional stability, the polyester film is also inherently easy to charge.

構成前述基材之樹脂材料,亦可視需要摻合抗氧化劑、紫外線吸收劑、可塑劑、著色劑(顏料、染料等)、抗靜電劑、抗結塊劑等各種添加劑。亦可於前述聚酯薄膜之第一面(設置抗靜電層側之表面)施行例如:電暈放電處理、 電漿處理、紫外線照射處理、酸處理、鹼處理、底塗劑之塗布等眾所皆知或慣用的表面處理。如此之表面處理可使用例如,提高基材與抗靜電層之密著性的處理。以使用於基材表面導入羥基等極性基之表面處理為佳。又,亦可於基材之第二面(形成黏著劑層側之表面)施行與前述相同之表面處理。該表面處理係可提高膜與黏著劑層之密著性(黏著劑層之錨定性)的處理。 The resin material constituting the substrate may be blended with various additives such as an antioxidant, an ultraviolet absorber, a plasticizer, a colorant (pigment, dye, etc.), an antistatic agent, and an anti-caking agent, as needed. The first surface of the polyester film (the surface on which the antistatic layer is disposed) may be subjected to, for example, corona discharge treatment, A well-known or conventional surface treatment such as plasma treatment, ultraviolet irradiation treatment, acid treatment, alkali treatment, and application of a primer. Such a surface treatment can use, for example, a treatment for improving the adhesion between the substrate and the antistatic layer. It is preferred to use a surface treatment for introducing a polar group such as a hydroxyl group on the surface of the substrate. Further, the same surface treatment as described above may be applied to the second surface of the substrate (the surface on the side where the adhesive layer is formed). This surface treatment can improve the adhesion of the film to the adhesive layer (the anchoring property of the adhesive layer).

本發明之表面保護薄膜藉於基材上具有抗靜電層而具有抗靜電機能,此外,亦可使用經抗靜電處理之塑膠薄膜作為前述基材。藉由使用前述基材,因可抑制剝離後表面保護薄膜本身之帶電,故為佳。又,基材係塑膠薄膜,藉於前述塑膠薄膜施行抗靜電處理,可降低表面保護薄膜本身之帶電,且可得對被著體之抗靜電能優異者。再者,並未特別限制賦與抗靜電機能之方法,可使用以往眾所皆知的方法,可舉例如:塗布由抗靜電劑與樹脂成分所構成之抗靜電性樹脂或導電性聚合物、含導電性物質之導電性樹脂的方法、或蒸鍍或鍍敷導電性物質的方法,又,混練抗靜電劑等之方法等。 The surface protective film of the present invention has an antistatic function by having an antistatic layer on the substrate, and an antistatic treated plastic film can also be used as the substrate. By using the above-mentioned substrate, it is preferable since the charging of the surface protective film itself after peeling can be suppressed. Further, the base material is a plastic film, and the antistatic treatment of the plastic film can reduce the charging of the surface protection film itself, and the antistatic property of the object can be excellent. Further, a method of imparting an antistatic function is not particularly limited, and a conventionally known method can be used, and for example, an antistatic resin or a conductive polymer composed of an antistatic agent and a resin component is applied. A method of a conductive resin containing a conductive material, a method of vapor-depositing or plating a conductive material, a method of kneading an antistatic agent, or the like.

前述基材之厚度通常係5~200μm,以10~150μm左右為佳。前述基材之厚度於前述範圍內時,對被著體之貼合作業性與自被著體之剝離作業性優異,故為佳。 The thickness of the substrate is usually 5 to 200 μm, preferably about 10 to 150 μm. When the thickness of the base material is within the above range, it is preferable because it is excellent in the workability of the adherend and the peeling workability from the object.

<抗靜電層(表塗層)> <Antistatic layer (surface coating)>

本發明之表面保護薄膜具有:具第一面(背面)及第二面(與第一面相反側之面)之基材、設於前述基材之前述第一面 (背面)的抗靜電層、及形成於前述基材之前述第二面且由黏著劑組成物形成之黏著劑層,該表面保護薄膜之特徵在於:前述抗靜電層係由抗靜電劑組成物形成者,該抗靜電劑組成物含有作為導電性聚合物成分的聚苯胺磺酸及以聚陰離子類摻雜之聚噻吩類、以及黏合劑,前述聚苯胺磺酸與前述以聚陰離子類摻雜之聚噻吩類的摻合比例(質量比)係90:10~10:90。前述表面保護薄膜具有抗靜電層(表塗層),所以會提升表面保護薄膜之抗靜電性與剝離靜電位之經時穩定性,而為較佳態樣。特別是,相較於單獨摻合前述聚苯胺磺酸、或單獨摻合前述以聚陰離子類摻雜之聚噻吩類的情形,藉於前述範圍內摻合前述聚苯胺磺酸與前述以聚陰離子類摻雜之聚噻吩類時,抗靜電性之經時穩定性提升,其理由推測如下。以聚陰離子類摻雜之聚噻吩類係於聚噻吩類配位有聚陰離子類之陰離子基而形成複合體,已知其導電機構係複合體內產生之聚噻吩類的分子內導電、聚噻吩類之分子間導電、及複合體構造間之導電。此處,複合體構造間之導電因分子間距離遠,故以速率決定過程。一般而言,藉由併用較聚噻吩類高分子之聚苯胺磺酸,聚苯胺磺酸將成為由聚噻吩類與聚陰離子類所構成之複合體間的連接,因其本身亦具導電性,故推測可提高複合體間之導電性、提升抗靜電性、增加穩定性,藉由併用該等,作為表面保護薄膜係非常有用。 The surface protection film of the present invention has a substrate having a first surface (back surface) and a second surface (surface opposite to the first surface), and is provided on the first surface of the substrate An antistatic layer (back surface) and an adhesive layer formed on the second surface of the substrate and formed of an adhesive composition, wherein the surface protection film is characterized in that the antistatic layer is composed of an antistatic agent The antistatic agent composition contains polyaniline sulfonic acid as a conductive polymer component, polythiophene doped with polyanion, and a binder, and the polyaniline sulfonic acid is doped with a polyanion as described above. The blending ratio (mass ratio) of the polythiophenes is 90:10 to 10:90. The surface protective film has an antistatic layer (surface coating), so that the antistatic property of the surface protective film and the temporal stability of the peeling electrostatic potential are improved, which is preferable. In particular, the polyaniline sulfonic acid is blended with the polyanion sulfonic acid in the foregoing range as compared with the case where the polyaniline sulfonic acid is blended separately or the polythiophene doped with the polyanion described above is blended in the foregoing range. When the polythiophene is doped, the stability over time of the antistatic property is improved, and the reason is presumed as follows. The polythiophene doped with polyanion is a polythiophene-supported polyanion-based anion group to form a complex, and the conductive mechanism is known to be a polythiophene-derived intramolecular conductive polythiophene produced in the composite body. The intermolecular conduction and the electrical conduction between the composite structures. Here, the conduction between the composite structures is determined by the rate because of the long distance between the molecules. In general, by using a polyaniline sulfonic acid which is a polythiophene-based polymer in combination, the polyaniline sulfonic acid becomes a connection between a complex of polythiophenes and polyanions, and is itself electrically conductive. Therefore, it is presumed that the conductivity between the composites can be improved, the antistatic property can be improved, and the stability can be increased. By using these together, it is very useful as a surface protective film system.

<導電性聚合物> <Electrically conductive polymer>

前述抗靜電層之特徵在於含有聚苯胺磺酸及以聚陰離 子類摻雜之聚噻吩類作為導電性聚合物成分。藉由組合前述導電性聚合物,相較於分別單獨摻合的情形,因聚苯胺磺酸負責聚噻吩類/聚陰離子類之複合體構造間的導電,故導電性提高,且可穩定由抗靜電層帶來之抗靜電性及經時之剝離靜電位,係為有用。 The antistatic layer is characterized by containing polyaniline sulfonic acid and Sub-doped polythiophenes are used as conductive polymer components. By combining the above-mentioned conductive polymers, since the polyaniline sulfonic acid is responsible for the conduction between the polythiophene/polyanion composite structures, the conductivity is improved and the stability is stabilized. The antistatic property of the electrostatic layer and the peeling of the electrostatic potential over time are useful.

相對於抗靜電層(表塗層)所含之黏合劑100質量份,前述導電性聚合物之使用量以1~1000質量份為佳,較佳者為5~750質量份,更佳者是10~500質量份。前述導電性聚合物之使用量過少時,有抗靜電效果變小的情形,導電性聚合物之使用量過多時,有對抗靜電層基材之密著性下降、透明性下降的疑慮而不佳。 The conductive polymer is preferably used in an amount of from 1 to 1,000 parts by mass, more preferably from 5 to 750 parts by mass, based on 100 parts by mass of the binder contained in the antistatic layer (surface coating layer), more preferably 10 to 500 parts by mass. When the amount of the conductive polymer used is too small, the antistatic effect is small, and when the amount of the conductive polymer used is too large, there is a concern that the adhesion to the antistatic layer substrate is lowered and the transparency is lowered. .

作為前述導電性聚合物成分所使用之聚苯胺磺酸,以聚苯乙烯換算之重量平均分子量(Mw)為5×105以下為佳,以3×105以下較佳。又,該等導電性聚合物之重量平均分子量通常以1×103以上為佳,較佳者為5×103以上。 The polyaniline sulfonic acid used as the conductive polymer component preferably has a weight average molecular weight (Mw) in terms of polystyrene of 5 × 10 5 or less, preferably 3 × 10 5 or less. Further, the weight average molecular weight of the conductive polymers is usually 1 × 10 3 or more, preferably 5 × 10 3 or more.

前述聚苯胺磺酸之市售品,可舉三菱RAYON社製之商品名「aqua-PASS」等為例。 The commercial product of the polyaniline sulfonic acid is exemplified by the trade name "aqua-pass" manufactured by Mitsubishi Rayon Co., Ltd., and the like.

作為前述導電性聚合物成分所使用之聚噻吩類,可舉例如:聚噻吩、聚(3-甲基噻吩)、聚(3-乙基噻吩)、聚(3-丙基噻吩)、聚(3-丁基噻吩)、聚(3-己基噻吩)、聚(3-庚基噻吩)、聚(3-辛基噻吩)、聚(3-癸基噻吩)、聚(3-十二基噻吩)、聚(3-十八基噻吩)、聚(3-溴噻吩)、聚(3-氯噻吩)、聚(3-碘噻吩)、聚(3-氰基噻吩)、聚(3-苯基噻吩)、聚(3,4-二甲基噻吩)、聚(3,4-二丁基噻吩)、聚(3-羥基噻吩)、聚(3- 甲氧基噻吩)、聚(3-乙氧基噻吩)、聚(3-丁氧基噻吩)、聚(3-己氧基噻吩)、聚(3-庚氧基噻吩)、聚(3-辛氧基噻吩)、聚(3-癸氧基噻吩)、聚(3-十二烷氧基噻吩)、聚(3-十八烷氧基噻吩)、聚(3,4-二羥基噻吩)、聚(3,4-二甲氧基噻吩)、聚(3,4-二乙氧基噻吩)、聚(3,4-二丙氧基噻吩)、聚(3,4-二丁氧基噻吩)、聚(3,4-二己氧基噻吩)、聚(3,4-二庚氧基噻吩)、聚(3,4-二辛氧基噻吩)、聚(3,4-二十二烷氧基噻吩)、聚(3,4-二十八烷氧基噻吩)、聚(3,4-乙二氧基噻吩)、聚(3,4-丙二氧基噻吩)、聚(3,4-丁二氧基噻吩)、聚(3-甲基-4-甲氧基噻吩)、聚(3-甲基-4-乙氧基噻吩)、聚(3-羧基噻吩、聚(3-甲基-4-羧基噻吩)、聚(3-甲基-4-羧基乙基噻吩)、聚(3-甲基-4-羧基丁基噻吩)。該等可單獨使用,亦可混合2種以上使用。其中,由導電性之觀點來看,以聚(3,4-乙二氧基噻吩)(PEDOT)為佳。 The polythiophene used as the conductive polymer component may, for example, be polythiophene, poly(3-methylthiophene), poly(3-ethylthiophene), poly(3-propylthiophene) or poly( 3-butylthiophene), poly(3-hexylthiophene), poly(3-heptylthiophene), poly(3-octylthiophene), poly(3-mercaptothiophene), poly(3-dodecylthiophene) ), poly(3-octadecylthiophene), poly(3-bromothiophene), poly(3-chlorothiophene), poly(3-iodothiophene), poly(3-cyanothiophene), poly(3-benzene Thiophene), poly(3,4-dimethylthiophene), poly(3,4-dibutylthiophene), poly(3-hydroxythiophene), poly(3- Methoxythiophene), poly(3-ethoxythiophene), poly(3-butoxythiophene), poly(3-hexyloxythiophene), poly(3-heptyloxythiophene), poly(3- Octyloxythiophene), poly(3-decyloxythiophene), poly(3-dodecyloxythiophene), poly(3-octadecyloxythiophene), poly(3,4-dihydroxythiophene) , poly(3,4-dimethoxythiophene), poly(3,4-diethoxythiophene), poly(3,4-dipropoxythiophene), poly(3,4-dibutoxy) Thiophene), poly(3,4-dihexyloxythiophene), poly(3,4-diheptyloxythiophene), poly(3,4-dioctyloxythiophene), poly(3,4-twenty) Dialkoxythiophene), poly(3,4-dioctadecyloxythiophene), poly(3,4-ethylenedioxythiophene), poly(3,4-propanedioxythiophene), poly( 3,4-butadioxythiophene), poly(3-methyl-4-methoxythiophene), poly(3-methyl-4-ethoxythiophene), poly(3-carboxythiophene, poly( 3-methyl-4-carboxythiophene), poly(3-methyl-4-carboxyethylthiophene), poly(3-methyl-4-carboxybutylthiophene). These may be used alone or in combination. Two or more types are used, and among them, poly(3,4-ethylenedioxythiophene) (PEDOT) is preferred from the viewpoint of conductivity.

前述聚噻吩類之聚合度以2~1000為佳,較佳者為5~100。於前述範圍內時,因導電性優異故為佳。 The degree of polymerization of the polythiophene is preferably from 2 to 1,000, more preferably from 5 to 100. When it is in the above range, it is excellent in electrical conductivity.

前述聚陰離子類係具陰離子基之構成單位的聚合物,對聚噻吩類作為摻雜物作用。前述聚陰離子類可舉例如:聚苯乙烯磺酸、聚乙烯磺酸、聚烯丙基磺酸、聚丙烯基磺酸、聚甲基丙烯磺酸、聚(2-丙烯醯胺-2-甲基丙烷磺酸)、聚異戊二烯磺酸、聚磺乙基甲基丙烯酸酯、聚(4-磺丁基甲基丙烯酸酯)、聚甲基烯丙氧基苯磺酸、聚乙烯羧酸、聚苯乙烯羧酸、聚烯丙基羧酸、聚丙烯基羧酸、聚甲基丙烯羧酸、聚(2-丙烯醯胺-2-甲基丙烷羧酸)、聚異戊二烯羧 酸、聚丙烯酸、聚碸化苯基乙炔等。可為該等之單獨聚合物,亦可為2種以上之共聚物。其中,由提升分散性之觀點來看,聚噻吩類之導電性以聚苯乙烯磺酸(PSS)為佳。 The polyanion-based polymer having a constituent unit of an anionic group acts as a dopant on the polythiophene. Examples of the polyanion species include polystyrenesulfonic acid, polyvinylsulfonic acid, polyallylsulfonic acid, polyacrylsulfonic acid, polymethacrylic acid, and poly(2-acrylamidamine-2-methyl). Propane sulfonic acid), polyisoprene sulfonic acid, polysulfoethyl methacrylate, poly(4-sulfobutyl methacrylate), polymethylallyloxybenzene sulfonic acid, polyethylene carboxylic acid, Polystyrene carboxylic acid, polyallyl carboxylic acid, polypropylene carboxylic acid, polymethyl propylene carboxylic acid, poly(2-propenylamine-2-methylpropane carboxylic acid), polyisoprene carboxylate Acid, polyacrylic acid, polyphenylene phenyl acetylene, and the like. These may be individual polymers or may be two or more copolymers. Among them, from the viewpoint of improving dispersibility, the conductivity of the polythiophene is preferably polystyrenesulfonic acid (PSS).

前述聚陰離子類之重量平均分子量(Mw)以1000~100萬為佳,較佳者為2000~50萬。於前述範圍內時,因對聚噻吩類之摻雜性與分散性優異,故為佳。 The weight average molecular weight (Mw) of the polyanion is preferably from 1,000 to 1,000,000, more preferably from 2,000 to 500,000. When it is in the above range, it is excellent in the doping property and dispersibility of the polythiophene.

前述以聚陰離子類摻雜之聚噻吩類的市售品,可舉例如:聚(3,4-乙二氧基噻吩)/聚苯乙烯磺酸(PEDOT/PSS)之BAYER社製的商品名「Bytron P」、信越聚合物社製之商品名「SEPLEGYDA」、綜研化學社製之商品名「VERAZOL」等。 The commercially available product of the polyanion-doped polythiophene may, for example, be a trade name of BAYER Co., Ltd. of poly(3,4-ethylenedioxythiophene)/polystyrenesulfonic acid (PEDOT/PSS). "Bytron P", the trade name "SEPLEGYDA" manufactured by Shin-Etsu Chemical Co., Ltd., and the trade name "VERAZOL" manufactured by Synopsys Chemical Co., Ltd.

前述抗靜電劑組成物中,前述聚苯胺磺酸與前述以聚陰離子類摻雜之聚噻吩類的摻合比例(質量比)(前述聚苯胺磺酸:前述以聚陰離子類摻雜之聚噻吩類))係90:10~10:90,以85:15~15:85為佳,較佳者為80:20~20:80。只要於前述範圍內,即可抑制表面電阻率,特別是表面電阻率的經時穩定性優異,而成為較佳之態樣。再者,單獨為前述聚苯胺磺酸時,因初期導電性低,故經時容易產生剝離靜電位或表面電阻率等之上升;單獨為前述以聚陰離子類摻雜之聚噻吩類時,初期導電性雖高,但隨著時間聚陰離子類(相當於摻雜物)將容易自聚噻吩類脫離,故經時容易產生剝離靜電位或表面電阻率等之上升,而不佳。 In the antistatic agent composition, the blending ratio (mass ratio) of the polyaniline sulfonic acid to the polyanion-doped polythiophene (the aforementioned polyaniline sulfonic acid: the polyanion group doped with the polyanion described above) Class)) 90:10~10:90, preferably 85:15~15:85, preferably 80:20~20:80. As long as it is within the above range, the surface resistivity can be suppressed, and in particular, the temporal stability of the surface resistivity is excellent, which is a preferable aspect. In addition, when the polyaniline sulfonic acid is used alone, since the initial conductivity is low, an increase in the peeling electrostatic potential or the surface resistivity is likely to occur over time, and when the polythiophene doped with the polyanion is used alone, the initial stage is Although the conductivity is high, the polyanion (corresponding to the dopant) tends to be detached from the polythiophene over time, so that it is less likely to cause an increase in the peeling electrostatic potential or the surface resistivity over time.

<黏合劑> <Binder>

前述抗靜電層之特徵在於為了賦與耐溶劑性、機械強 度、熱穩定性而含有黏合劑。黏合劑可舉例如:丙烯酸樹脂、丙烯酸胺基甲酸酯樹脂、丙烯酸苯乙烯樹脂、丙烯酸聚矽氧樹脂、聚矽氧樹脂、氟樹脂、苯乙烯樹脂、聚酯樹脂、酸醇樹脂、聚胺基甲酸酯樹脂、醯胺樹脂、聚烯烴樹脂、聚矽氮烷樹脂、或該等之改質或共聚合樹脂。又,前述樹脂可單獨或組合2種以上使用。特別由耐溶劑性優異之點來看,前述樹脂中以使用聚酯樹脂為佳。 The antistatic layer is characterized in that it is solvent-resistant and mechanically strong. It contains a binder and is thermally stable. The binder may, for example, be an acrylic resin, an urethane acrylate resin, an acrylic styrene resin, an acrylic polyoxyl resin, a polyoxyn resin, a fluororesin, a styrene resin, a polyester resin, an acid alcohol resin, a polyamine. A urethane resin, a guanamine resin, a polyolefin resin, a polyazide resin, or such a modified or copolymerized resin. Further, the above resins may be used alone or in combination of two or more. In particular, it is preferable to use a polyester resin in the above resin from the viewpoint of excellent solvent resistance.

前述聚酯樹脂以包含聚酯作為主成分(典型係大於50質量%,以75質量%以上為佳,例如佔有90質量%以上之成分)的樹脂材料為佳。前述聚酯典型的以具縮合有以下兩種化合物的結構為佳,選自於1分子中具有2個以上羧基之多價羧酸類(典型的係二羧酸類)及其衍生物(該多價羧酸之酸酐、酯化物、鹵化物等)的1種或2種以上之化合物(多價羧酸成分)、及選自於1分子中具有2個以上羥基之多元醇類(典型的係二醇類)的1種或2種以上之化合物(多元醇成分)。 The polyester resin is preferably a resin material containing a polyester as a main component (typically more than 50% by mass, preferably 75% by mass or more, for example, 90% by mass or more). The polyester is preferably a structure having two compounds condensed, and is selected from polyvalent carboxylic acids (typically dicarboxylic acids) having two or more carboxyl groups in one molecule and derivatives thereof (the multivalent value) One or two or more compounds (polyvalent carboxylic acid component) of a carboxylic acid anhydride, an esterified product, a halide, or the like, and a polyhydric alcohol having two or more hydroxyl groups selected from one molecule (typically two One or two or more compounds (polyol components) of an alcohol.

可使用作為前述多價羧酸成分之化合物的例,可舉例如:草酸、丙二酸、二氟丙二酸、烷基丙二酸、琥珀酸、四氟琥珀酸、烷基琥珀酸、(±)-蘋果酸、內消旋酒石酸、伊康酸、順丁烯二酸、甲基順丁烯二酸、反丁烯二酸、甲基反丁烯二酸、乙炔二羧酸、戊二酸、六氟戊二酸、甲基戊二酸、戊烯二酸、己二酸、二硫基己二酸、甲基己二酸、二甲基己二酸、四甲基己二酸、亞甲基己二酸、己二烯二酸、半乳糖二酸、庚二酸、辛二酸、全氟辛二酸、3,3,6,6-四甲基辛二酸、壬二酸、癸二酸、全氟癸二酸、十三烷二 酸、十二基二羧酸、十三基二羧酸、十四基二羧酸等脂肪族二羧酸類;環烷基二羧酸(例如,1,4-環己烷二羧酸、1,2-環己烷二羧酸)、1,4-(2-降烯)二羧酸、5-降烯-2,3-二羧酸(腐植酸)、金剛烷二羧酸、旋庚烷二羧酸等脂環式二羧酸類;鄰苯二甲酸、間苯二甲酸、二硫基間苯二甲酸、甲基間苯二甲酸、二甲基間苯二甲酸、氯間苯二甲酸、二氯間苯二甲酸、對苯二甲酸、甲基對苯二甲酸、二甲基對苯二甲酸、氯對苯二甲酸、溴對苯二甲酸、萘二羧酸、側氧茀二羧酸、蒽二羧酸、聯苯二羧酸、聯伸苯基二羧酸、二甲基聯伸苯基二羧酸、4,4”-對聯伸三苯基二羧酸(4,4”-p-terephenylene dicarboxylic acid)、4,4”-對聯四苯基二羧酸(4,4”-p-quaterphenyl dicarboxylic acid)、聯苄二羧酸、偶氮苯二羧酸、升酞酸、伸苯基二乙酸、伸苯基二丙酸、萘二羧酸、萘二丙酸、聯苯二乙酸、聯苯二丙酸、3,3'-[4,4’-(亞甲基二-對聯伸二苯基)二丙酸、4,4’-聯苄二乙酸、3,3’(4,4’-聯苄)二丙酸、氧二-對伸苯基二乙酸等芳香族二羧酸類;上述之任一多價羧酸的酸酐;上述之任一多價羧酸的酯(可為例如,烷基酯。單酯、二酯等。);對應於上述之任一多價羧酸的酸鹵化物(例如,二羧酸氯)等。 Examples of the compound which is the above polyvalent carboxylic acid component can be used, and examples thereof include oxalic acid, malonic acid, difluoromalonic acid, alkylmalonic acid, succinic acid, tetrafluorosuccinic acid, and alkylsuccinic acid. ±)-Malic acid, meso-tartaric acid, itaconic acid, maleic acid, methyl maleic acid, fumaric acid, methyl fumaric acid, acetylene dicarboxylic acid, pentane Acid, hexafluoroglutaric acid, methyl glutaric acid, glutaconic acid, adipic acid, dithioadipic acid, methyl adipic acid, dimethyl adipate, tetramethyl adipate, Methylene adipate, hexadiene diacid, galactosuccinic acid, pimelic acid, suberic acid, perfluorooctanoic acid, 3,3,6,6-tetramethyloctanedioic acid, sebacic acid , an aliphatic dicarboxylic acid such as azelaic acid, perfluorosebacic acid, tridecanedioic acid, dodecyl dicarboxylic acid, thirteen-based dicarboxylic acid, tetradecyl dicarboxylic acid; cycloalkyl dicarboxylic acid (eg, 1,4-cyclohexanedicarboxylic acid, 1,2-cyclohexanedicarboxylic acid), 1,4-(2-lower) Alkene dicarboxylic acid, 5-nor Ethylene-2,3-dicarboxylic acid (humic acid), adamantane dicarboxylic acid, cyclopentane dicarboxylic acid and other alicyclic dicarboxylic acids; phthalic acid, isophthalic acid, dithioisophthalene Formic acid, methyl isophthalic acid, dimethyl isophthalic acid, chloroisophthalic acid, dichloroisophthalic acid, terephthalic acid, methyl terephthalic acid, dimethyl terephthalic acid, Chloro terephthalic acid, bromine terephthalic acid, naphthalene dicarboxylic acid, oxonium dicarboxylic acid, stilbene dicarboxylic acid, biphenyl dicarboxylic acid, extended phenyl dicarboxylic acid, dimethyl linked phenyl Dicarboxylic acid, 4,4"-p-terephenylene dicarboxylic acid, 4,4"-terphenyl tetracarboxylic acid (4,4"-p-quaterphenyl Dicarboxylic acid), bibenzyl dicarboxylic acid, azobenzene dicarboxylic acid, decanoic acid, phenyl diacetic acid, phenyl dipropionic acid, naphthalene dicarboxylic acid, naphthalene dipropionic acid, biphenyl diacetic acid, Benzylpropionic acid, 3,3'-[4,4'-(methylenebis-pair-linked diphenyl)dipropionic acid, 4,4'-bibenzyldiacetic acid, 3,3'(4,4' - an aromatic dicarboxylic acid such as dibenzyl acid or dioxo-p-phenylenediacetic acid; or any of the above polyvalent carboxylic acids An anhydride; an ester of any of the above polyvalent carboxylic acids (which may be, for example, an alkyl ester, a monoester, a diester, etc.); an acid halide corresponding to any of the above polyvalent carboxylic acids (for example, a dicarboxylic acid) Chlorine).

可作為前述多價羧酸成分使用之化合物的較佳例,可舉例如:對苯二甲酸、間苯二甲酸、萘二羧酸等芳香族二羧酸類及其酸酐;己二酸、癸二酸、壬二酸、琥珀酸、反丁烯二酸、順丁烯二酸、腐植酸、1,4-環己烷二羧酸等脂肪族二羧酸類及其酸酐;以及前述二羧酸類之低級烷 基酯(例如,碳原子數1~3之單醇與酯)等。 Preferable examples of the compound which can be used as the polyvalent carboxylic acid component include aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid and naphthalene dicarboxylic acid, and acid anhydrides thereof; adipic acid and bismuth An aliphatic dicarboxylic acid such as an acid, azelaic acid, succinic acid, fumaric acid, maleic acid, humic acid or 1,4-cyclohexanedicarboxylic acid, and an acid anhydride thereof; and the aforementioned dicarboxylic acid Lower alkane A base ester (for example, a monool and an ester having 1 to 3 carbon atoms).

另一方面,可作為前述多元醇成分使用之化合物的例,可舉例如:乙二醇、丙二醇、1,2-丙烷二醇、1,3-丙烷二醇、1,3-丁烷二醇、1,4-丁烷二醇、新戊二醇、1,5-戊烷二醇、1,6-己烷二醇、3-甲基戊烷二醇、二乙二醇、1,4-環己烷二甲醇、3-甲基-1,5-戊烷二醇、2-甲基-1,3-丙烷二醇、2,2-二乙基-1,3-丙烷二醇、2-丁基-2-乙基-1,3-丙烷二醇、二甲苯醇、氫化雙酚A、雙酚A等二醇類。其他之例,可舉該等化合物之環氧烷加成物(例如,氧乙烷加成物、環氧丙烷加成物等)為例。 On the other hand, examples of the compound which can be used as the polyol component include ethylene glycol, propylene glycol, 1,2-propanediol, 1,3-propanediol, and 1,3-butanediol. , 1,4-butanediol, neopentyl glycol, 1,5-pentanediol, 1,6-hexanediol, 3-methylpentanediol, diethylene glycol, 1,4 - cyclohexanedimethanol, 3-methyl-1,5-pentanediol, 2-methyl-1,3-propanediol, 2,2-diethyl-1,3-propanediol, Glycols such as 2-butyl-2-ethyl-1,3-propanediol, xylene alcohol, hydrogenated bisphenol A, and bisphenol A. As another example, an alkylene oxide adduct of such a compound (for example, an oxyethylene adduct or a propylene oxide adduct) may be mentioned.

前述聚酯樹脂之分子量利用凝膠滲透層析法(GPC)所測量之標準聚苯乙烯換算的數量平均分子量(Mn)可為例如,1×103~1.5×105左右(以1×103~6×104左右為佳)。又,前述聚酯樹脂之玻璃轉移溫度(Tg),可為例如,0~120℃(以10~80℃為佳)。 The molecular weight of the polyester resin is a standard polystyrene-equivalent number average molecular weight (Mn) measured by gel permeation chromatography (GPC), for example, about 1 × 10 3 to 1.5 × 10 5 (by 1 × 10). 3 ~ 6 × 10 4 is better). Further, the glass transition temperature (Tg) of the polyester resin may be, for example, 0 to 120 ° C (preferably 10 to 80 ° C).

前述聚酯樹脂,可舉例如:東洋紡織社製之商品名VYLONAL MD-1100、MD-1200、MD-1245、MD-1335、MD-1480、MD-1500、MD-1930、MD-1985、MD-2000、互應化學工業社製之商品名PLAS COAT Z-221、Z-446、Z-561、Z-565、Z-880、Z-3310、RZ-105、RZ-570、Z-730、Z-760、Z-592、Z-687、Z-690、高松油脂社製之PESRESIN A-110、A-120、A-124GP、A-125S、A-160P、A-520、A-613D、A-615GE、A-640、A-645GH、A-647GEX、A-680、A-684G、WAC-14、WAC-17XC等。 The polyester resin may, for example, be manufactured by Toyobo Co., Ltd. under the trade names of VYLONAL MD-1100, MD-1200, MD-1245, MD-1335, MD-1480, MD-1500, MD-1930, MD-1985, MD. -2000, the trade name of the chemical industry company, PLAS COAT Z-221, Z-446, Z-561, Z-565, Z-880, Z-3310, RZ-105, RZ-570, Z-730, Z-760, Z-592, Z-687, Z-690, PESRESIN A-110, A-120, A-124GP, A-125S, A-160P, A-520, A-613D, manufactured by Takamatsu Oil Co., Ltd. A-615GE, A-640, A-645GH, A-647GEX, A-680, A-684G, WAC-14, WAC-17XC, etc.

只要在不會大幅損害此處所揭示之表面保護薄膜性能(例如,抗靜電性等性能)的限度內,前述抗靜電層(表塗層)之黏合劑更可含有聚酯樹脂以外之樹脂(例如,丙烯酸樹脂、丙烯酸胺基甲酸酯樹脂、丙烯酸苯乙烯樹脂、丙烯酸聚矽氧樹脂、聚矽氧樹脂、氟樹脂、苯乙烯樹脂、酸醇樹脂、聚胺基甲酸酯樹脂、醯胺樹脂、聚烯烴樹脂、聚矽氮烷樹脂等、或選自於該等之改質或共聚合樹脂的1種或2種以上之樹脂)。此處所揭示之技術的一較佳態樣係抗靜電層之黏合劑實質上僅由聚酯樹脂所構成的情形。例如,以黏合劑中所佔之聚酯樹脂的比例為98~100質量%的抗靜電層為佳。抗靜電層全體中所佔之黏合劑的比例可為例如50~95質量%,通常以60~90質量%為佳。 The adhesive of the antistatic layer (surface coating) may further contain a resin other than the polyester resin (for example, as long as the performance of the surface protective film disclosed herein (for example, performance such as antistatic property) is not greatly impaired. , acrylic resin, urethane acrylate resin, acrylic styrene resin, acrylic polyoxyl resin, polyoxyn oxy resin, fluororesin, styrene resin, acid alcohol resin, polyurethane resin, guanamine resin A polyolefin resin, a polyazide resin, or the like, or one or two or more resins selected from the modified or copolymerized resins. A preferred aspect of the technique disclosed herein is the case where the adhesive of the antistatic layer consists essentially of only a polyester resin. For example, an antistatic layer having a ratio of the polyester resin in the binder of 98 to 100% by mass is preferred. The proportion of the binder in the entire antistatic layer may be, for example, 50 to 95% by mass, and usually 60 to 90% by mass.

<潤滑劑> <Lubricant>

此處所揭示之技術的抗靜電層(表塗層),其較佳態樣為使用選自於由脂肪酸醯胺、脂肪酸酯、聚矽氧系潤滑劑、氟系潤滑劑及蠟系潤滑劑所構成群組中之至少1種作為潤滑劑。藉由使用前述潤滑劑,即使於未於抗靜電層表面更加施行剝離處理(例如,塗布聚矽氧系剝離劑、長鏈烷基系剝離劑等眾所皆知的剝離處理劑後使其乾燥的處理)的態樣中,因可得到兼具充分之潤滑性與印字密著性的抗靜電層(表塗層),故可為較佳態樣。如此,未於抗靜電層表面更加施行剝離處理的態樣,由可事先防止因剝離處理劑產生的白化(例如,加熱加溼條件下保存所造成的白化)來看係為佳。又,由耐溶劑性來看亦有利。 The antistatic layer (surface coating) of the technology disclosed herein is preferably selected from the group consisting of fatty acid amides, fatty acid esters, polyfluorene-based lubricants, fluorine-based lubricants and wax-based lubricants. At least one of the constituent groups is used as a lubricant. By using the lubricant, the peeling treatment is further performed on the surface of the antistatic layer (for example, a well-known release treatment agent such as a polyoxyalkylene release agent or a long-chain alkyl release agent is applied, and then dried. In the aspect of the treatment, an antistatic layer (surface coating) having both sufficient lubricity and printing adhesion can be obtained, which is preferable. As described above, the surface which is not subjected to the release treatment on the surface of the antistatic layer is preferably prevented from being whitened by the release treatment agent (for example, whitening caused by storage under heating and humidification conditions). Moreover, it is also advantageous from the viewpoint of solvent resistance.

前述脂肪酸醯胺之具體例,可舉例如:月桂酸醯胺、棕櫚酸醯胺、硬脂酸醯胺、二十二酸醯胺、羥基硬脂酸醯胺、油酸醯胺、芥子酸醯胺、N-油醯基棕櫚酸醯胺、N-硬脂醯硬脂酸醯胺、N-硬脂醯油酸醯胺、N-油醯基硬脂酸醯胺、N-硬脂醯芥子酸醯胺、羥甲基硬脂酸醯胺、亞甲基雙硬脂酸醯胺、乙烯雙癸酸醯胺、乙烯雙月桂酸醯胺、乙烯雙硬脂酸醯胺、乙烯雙羥基硬脂酸醯胺、乙烯雙二十二酸醯胺、六亞甲基雙硬脂酸醯胺、六亞甲基雙二十二酸醯胺、六亞甲基羥基硬脂酸醯胺、N,N’-二硬脂醯己二酸醯胺、N,N’-二硬脂醯癸二酸醯胺、乙烯雙油酸醯胺、乙烯雙芥子酸醯胺、六亞甲基雙油酸醯胺、N,N’-二油醯基己二酸醯胺、N,N’-二油醯基癸二酸醯胺、m-茬雙硬脂酸醯胺、m-茬雙羥基硬脂酸醯胺、N,N’-硬脂醯間苯二甲酸醯胺等。該等潤滑劑可單獨使用1種,亦可組合2種以上使用。 Specific examples of the fatty acid guanamine include, for example, decyl laurate, decyl palmitate, decylamine stearate, decyl octadecylamine, decyl hydroxystearate, decyl oleate, guanidine succinate. Amine, N-oil decyl palmitate, N-stearin, decylamine stearate, N-stearin decyl decylamine, N-oleyl stearate decylamine, N-stear mustard Acid amide, hydroxymethyl stearyl decylamine, methylene bis-stearate decylamine, ethylene bismuth decyl decylamine, ethylene bismuth laurate decylamine, ethylene bisstearate decylamine, ethylene bishydroxyl hard fat Acid amide, ethylene bisbehenate decylamine, hexamethylenebisstearate decylamine, hexamethylenebisbehenic acid decylamine, hexamethylene hydroxystearic acid decylamine, N,N '-Distearyl adipic acid decylamine, N,N'-distearyl decanoate, ethylene bis oleate, ethylene erucic acid decylamine, hexamethylene bis oleate , N,N'-dioleyl decanoic acid decylamine, N,N'-dioleyl decanoic acid decylamine, m-indole bis-stearic acid amide, m- bis bishydroxystearate Amine, N, N'-stearyl phthalate, decylamine and the like. These lubricants may be used alone or in combination of two or more.

前述脂肪酸酯之具體例,可舉例如:聚氧乙烯雙酚A月桂酸酯、硬脂酸丁酯、軟酯酸2-乙基己基酯、硬脂酸2-乙基己基酯、二十二酸單甘油酯、2-乙基己酸十六基酯、十四酸異丙酯、軟酯酸異丙酯、異硬脂酸膽固醇酯、甲基丙烯酸月桂酯、椰子油脂酸甲酯、月桂酸甲酯、油酸甲酯、硬脂酸甲酯、十四酸十四酯、十四酸辛基十二基、新戊四醇單油酸酯、新戊四醇單硬脂酸酯、新戊四醇四棕櫚酸酯、硬脂酸硬脂醯、硬脂酸異十三基、2-乙基己酸三酸甘油脂、月桂酸丁酯、油酸辛基等。該等潤滑劑可單獨使用1種,亦可組合2種以上使用。 Specific examples of the fatty acid esters include polyoxyethylene bisphenol A laurate, butyl stearate, 2-ethylhexyl soft acid ester, 2-ethylhexyl stearate, and twenty Diacid monoglyceride, hexadecyl 2-ethylhexanoate, isopropyl myristate, isopropyl soft acid ester, cholesteryl isostearate, lauryl methacrylate, methyl oleate, Methyl laurate, methyl oleate, methyl stearate, tetradecyl myristate, octyldodecyl myristate, pentaerythritol monooleate, pentaerythritol monostearate, Pentaerythritol tetrapalmitate, stearic acid stearate, isotridecyl stearate, 2-ethylhexanoic acid triglyceride, butyl laurate, octyl oleate, and the like. These lubricants may be used alone or in combination of two or more.

前述聚矽氧系潤滑劑之具體例,可舉例如:聚二甲基矽氧烷、聚醚改質聚二甲基矽氧烷、胺基改質聚二甲基矽氧烷、環氧改質聚二甲基矽氧烷、甲醇改質聚二甲基矽氧烷、巰基改質聚二甲基矽氧烷、羧基改質聚二甲基矽氧烷、甲基氫聚矽氧、甲基丙烯改質聚二甲基矽氧烷、酚改質聚二甲基矽氧烷、矽醇改質聚二甲基矽氧烷、芳烷基改質聚二甲基矽氧烷、氟烷基改質聚二甲基矽氧烷、長鏈烷基改質聚二甲基矽氧烷、高級脂肪酸改質酯改質聚二甲基矽氧烷、高級脂肪酸醯胺改質聚二甲基矽氧烷、苯基改質聚二甲基矽氧烷等。該等潤滑劑可單獨使用1種,亦可組合2種以上使用。 Specific examples of the polyfluorene-based lubricant include polydimethyl siloxane, polyether modified polydimethyl siloxane, amine modified polydimethyl siloxane, and epoxy modification. Polydimethyl methoxy oxane, methanol modified polydimethyl methoxy oxane, fluorenyl modified polydimethyl siloxane, carboxy modified polydimethyl oxa oxide, methyl hydrogen polyoxyl, A Propylene modified polydimethyl siloxane, phenol modified polydimethyl siloxane, sterol modified polydimethyl siloxane, aralkyl modified polydimethyl siloxane, halothane Modified dimethyl methoxy oxane, long chain alkyl modified polydimethyl siloxane, higher fatty acid modified ester modified polydimethyl siloxane, higher fatty acid guanamine modified polydimethyl A siloxane, a phenyl modified polydimethyl siloxane, and the like. These lubricants may be used alone or in combination of two or more.

前述氟系潤滑劑之具體例,可舉全氟烷、全氟羧酸酯、含氟嵌段共聚物、具氟化烷基之聚醚聚合物等為例。該等潤滑劑可單獨使用1種,亦可組合2種以上使用。 Specific examples of the fluorine-based lubricant include perfluoroalkane, perfluorocarboxylic acid ester, fluorine-containing block copolymer, and polyether polymer having a fluorinated alkyl group. These lubricants may be used alone or in combination of two or more.

前述蠟系潤滑劑之具體例,可舉如石油系蠟(石蠟等)、植物系蠟(棕櫚蠟等)、礦物系蠟(褐煤蠟等)、高級脂肪酸(蟲蠟酸等)、中性脂肪(軟酯酸三酸甘油脂等)之各種蠟為例。該等潤滑劑可單獨使用1種,亦可組合2種以上使用。 Specific examples of the wax-based lubricant include petroleum wax (such as paraffin), plant wax (such as palm wax), mineral wax (such as montan wax), higher fatty acid (such as ceric acid), and neutral fat. For example, various waxes of (soft acid triglyceride, etc.) are mentioned. These lubricants may be used alone or in combination of two or more.

前述抗靜電層全體中所佔之潤滑劑的比例可設為1~50質量%,通常以設為5~40質量%為適當。潤滑劑之含有比例過少時,將有潤滑性下降的傾向。潤滑劑之含有比例過多時,將造成印字密著性或背面剝離力下降。 The ratio of the lubricant to the entire antistatic layer may be 1 to 50% by mass, and usually 5 to 40% by mass. When the content ratio of the lubricant is too small, the lubricity tends to decrease. When the content ratio of the lubricant is too large, the printing adhesion or the back peeling force is lowered.

<交聯劑> <crosslinker>

前述抗靜電層宜含有選自於由矽烷偶合劑、環氧系交 聯劑、三聚氰胺系交聯劑及異氰酸酯系交聯劑所構成群組中之至少1種作為交聯劑,其中特別以使用前述三聚氰胺系交聯劑及/或異氰酸酯系交聯劑為較佳態樣。可將形成抗靜電層時之必需成分的導電性聚合物成分、即聚苯胺磺酸及以聚陰離子類摻雜之聚噻吩類固定於黏合劑中,如此將會有優異的耐水性、耐溶劑性,且可實現提升印字密著性等的效果。特別是,藉由使用三聚氰胺系交聯劑,可提升耐水性或耐溶劑性,藉由使用異氰酸酯系交聯劑,可提升耐水性或印字密著性,藉由併用該等交聯劑,可有效提升耐水性、耐溶劑性、印字密著性。 Preferably, the antistatic layer is selected from the group consisting of a decane coupling agent and an epoxy system. At least one of the group consisting of a crosslinking agent, a melamine crosslinking agent, and an isocyanate crosslinking agent is used as a crosslinking agent, and among them, it is preferable to use the melamine crosslinking agent and/or the isocyanate crosslinking agent in particular. kind. The conductive polymer component which is an essential component in forming the antistatic layer, that is, polyaniline sulfonic acid and polythiophene doped with polyanion can be fixed in the binder, so that it has excellent water resistance and solvent resistance. Sexuality, and can achieve the effect of improving the printing adhesion. In particular, by using a melamine-based crosslinking agent, water resistance or solvent resistance can be improved, and by using an isocyanate crosslinking agent, water resistance or printing adhesion can be improved, and by using the crosslinking agent in combination, Effectively improve water resistance, solvent resistance, and printing adhesion.

前述三聚氰胺系交聯劑,可使用三聚氰胺、烷基化三聚氰胺、羥甲基三聚氰胺、烷氧基化甲基三聚氰胺等。 As the melamine-based crosslinking agent, melamine, alkylated melamine, methylol melamine, alkoxylated methyl melamine or the like can be used.

又,前述異氰酸酯系交聯劑,以使用於水溶液中仍為穩定之嵌段化異氰酸酯系交聯劑為較佳態樣。前述嵌段化異氰酸酯系交聯劑之具體例,可使用:將於調製一般之黏著劑層或抗靜電層(表塗層)時可使用的異氰酸酯系交聯劑(例如,後述之黏著劑層中所使用的異氰酸酯化合物),經醇類、酚類、硫酚類、胺類、醯亞胺類、肟類、內醯胺類、活性亞甲基化合物類、硫醇類、亞胺類、尿素類、二芳基化合物類、及亞硫酸氫鈉等嵌段化而成者。 Further, the isocyanate crosslinking agent is preferably a blocked isocyanate crosslinking agent which is stable in an aqueous solution. As a specific example of the above-mentioned blocked isocyanate-based crosslinking agent, an isocyanate-based crosslinking agent (for example, an adhesive layer described later) which can be used in preparation of a general adhesive layer or an antistatic layer (surface coating layer) can be used. The isocyanate compound used in the production of alcohols, phenols, thiophenols, amines, quinones, anthraquinones, indoleamines, active methylene compounds, mercaptans, imines, Blocked by urea, diaryl compounds, and sodium hydrogen sulfite.

此處所揭示之技術中的抗靜電層,視需要可含有其他抗靜電成分、抗氧化劑、著色劑(顏料、染料等)、流動性調整劑(觸變性試劑、增黏劑等)、成膜助劑、界面活性劑(消泡劑等)、防腐劑等添加劑。又,亦可含有作為導電性提 升劑之環氧丙基化合物、極性溶劑、多價脂肪族醇、內醯胺化合物等。 The antistatic layer in the technology disclosed herein may contain other antistatic components, antioxidants, colorants (pigments, dyes, etc.), fluidity adjusters (thixotropic agents, tackifiers, etc.), film forming aids as needed. Additives such as agents, surfactants (antifoaming agents, etc.), preservatives. Also, it can also contain as a conductivity An epoxy propyl compound, a polar solvent, a polyvalent aliphatic alcohol, an indoleamine compound, or the like.

<抗靜電層之形成> <Formation of antistatic layer>

前述抗靜電層(表塗層)可藉由包含如下之方法較佳地形成,於基材賦與液狀組成物,該液狀組成物係將前述導電性聚合物成分等必需成分及視需要所使用之添加劑於適當之溶劑(水等)中溶解或分散的液狀組成物(形成抗靜電層用之塗布材、抗靜電劑組成物)。可較佳地使用例如,於基材之第一面塗布前述塗布材並使其乾燥,視需要進行硬化處理(熱處理、紫外線處理等)之方法。前述塗布材之NV(不揮發部分)可為例如,5質量%以下(典型係0.05~5質量%),通常以1質量%以下(典型係0.10~1質量%)為適當。於形成厚度小之抗靜電層時,前述塗布材之NV以例如0.05~0.50質量%(例如0.10~0.40質量%)為佳。藉由使用如此低NV之塗布材,可形成較均一之抗靜電層。 The antistatic layer (surface coating layer) can be preferably formed by a method comprising: imparting a liquid composition to the substrate, the liquid composition being an essential component such as the conductive polymer component, and optionally A liquid composition (a coating material for forming an antistatic layer, an antistatic agent composition) in which an additive to be used is dissolved or dispersed in a suitable solvent (water or the like). For example, a method of applying the above-mentioned coating material to the first surface of the substrate, drying it, and performing a curing treatment (heat treatment, ultraviolet treatment, or the like) as needed may be preferably used. The NV (non-volatile portion) of the coating material may be, for example, 5% by mass or less (typically 0.05 to 5% by mass), and usually 1% by mass or less (typically 0.10 to 1% by mass). When the antistatic layer having a small thickness is formed, the NV of the coating material is preferably, for example, 0.05 to 0.50% by mass (for example, 0.10 to 0.40% by mass). By using such a low NV coating material, a more uniform antistatic layer can be formed.

構成前述形成抗靜電層用塗布材之溶劑,以可穩定抗靜電層之形成成分,可溶解或分散者為佳。該溶劑可為有機溶劑、水、或該等之混合溶劑。前述有機溶劑可使用選自於以下之1種或2種以上,例如:乙酸乙酯等酯類;甲基乙基酮、丙酮、環己酮等酮類;四氫呋喃(THF)、二烷等環狀醚類;正己烷、環己烷等脂肪族或脂環族烴類;甲苯、二甲苯等芳香族烴類;甲醇、乙醇、正丙醇、異丙醇、環已醇等脂肪族或脂環族醇類;烷二醇單烷基醚(例如,乙二醇單甲醚、乙二醇單乙醚)、二烷二醇單烷基醚等 二醇醚類等。較佳之一態樣係前述塗布材之溶劑為水或以水作為主成分之混合溶劑(例如,水與乙醇之混合溶劑)。 The solvent for forming the coating material for an antistatic layer is preferably a component which can stabilize the formation component of the antistatic layer and can be dissolved or dispersed. The solvent may be an organic solvent, water, or a mixed solvent of these. The organic solvent may be one or more selected from the group consisting of esters such as ethyl acetate; ketones such as methyl ethyl ketone, acetone, and cyclohexanone; tetrahydrofuran (THF) and a cyclic ether such as an alkane; an aliphatic or alicyclic hydrocarbon such as n-hexane or cyclohexane; an aromatic hydrocarbon such as toluene or xylene; or a fat such as methanol, ethanol, n-propanol, isopropanol or cyclohexanol. a family or an alicyclic alcohol; an alkylene glycol monoalkyl ether (for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether), a glycol ether such as a dialkyl glycol monoalkyl ether, or the like. In a preferred embodiment, the solvent of the coating material is water or a mixed solvent containing water as a main component (for example, a mixed solvent of water and ethanol).

又,為提升對溶劑之分散穩定性,可包含可作為離子對配位或鍵結於聚陰離子類之陰離子基的鹽基性有機化合物。鹽基性有機化合物可舉眾所皆知的胺化合物、胺化合物之鹽酸鹽、陽離子性乳化劑、鹽基性樹脂等為例。 Further, in order to enhance the dispersion stability to the solvent, a salt-based organic compound which can be coordinated as an ion pair or bonded to an anionic group of a polyanion can be contained. The salt-based organic compound is exemplified by an amine compound, an amine compound hydrochloride, a cationic emulsifier, a salt-based resin and the like.

前述鹽基性有機化合物,具體而言可舉例如:甲基辛基胺、甲苄基胺、N-甲基苯胺、二甲基胺、二乙基胺、二乙醇胺、N-甲基乙醇胺、二正丙基胺、二異丙基胺、甲基-異丙醇胺、二丁基胺、二-2-乙基己基胺、胺基乙基乙醇胺、3-胺基-1-丙醇、異丙基胺、單乙基胺、2-乙基己基胺、第三丁基胺、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、N-苯基-3-胺基丙基三甲氧基矽烷等胺化合物、單甲基胺、單乙基胺、硬脂醯胺等1級胺之鹽酸鹽、二甲基胺、二乙基胺、二硬脂醯胺等2級胺之鹽酸鹽、三甲基胺、三乙基胺、硬脂醯二甲基胺等3級胺之鹽酸鹽、硬脂醯三甲基銨氯、二硬脂醯二甲基銨氯、硬脂醯二甲基苯甲基銨氯等4級銨鹽、單乙醇胺、二乙醇胺、三乙醇胺等乙醇胺類之鹽酸鹽、乙二胺、二乙二醇三胺等聚乙烯聚胺類之鹽酸鹽等。 Specific examples of the salt-based organic compound include methyloctylamine, methylbenzylamine, N-methylaniline, dimethylamine, diethylamine, diethanolamine, and N-methylethanolamine. Di-n-propylamine, diisopropylamine, methyl-isopropanolamine, dibutylamine, di-2-ethylhexylamine, aminoethylethanolamine, 3-amino-1-propanol, Isopropylamine, monoethylamine, 2-ethylhexylamine, tert-butylamine, N-(2-aminoethyl)-3-aminopropylmethyldimethoxydecane, N- (2-Aminoethyl)-3-aminopropyltrimethoxydecane, N-(2-aminoethyl)-3-aminopropyltriethoxydecane, 3-aminopropyltrimethyl An amine compound such as oxydecane, 3-aminopropyltriethoxydecane, N-phenyl-3-aminopropyltrimethoxydecane, monomethylamine, monoethylamine, stearic acidamine, etc. a hydrochloride of a grade II amine such as a hydrochloride of a first grade amine, a dimethylamine, a diethylamine or a distearylamine, a trimethylamine, a triethylamine, a stearin dimethylamine, etc. Grade 4 ammonium salt, such as a tertiary amine hydrochloride, stearic acid trimethylammonium chloride, distearyl dimethyl ammonium chloride, stearyl dimethyl benzyl ammonium chloride, A hydrochloride of an ethanolamine such as monoethanolamine, diethanolamine or triethanolamine, or a hydrochloride of a polyethylene polyamine such as ethylenediamine or diethylene glycol triamine.

前述陽離子性乳化劑,具體而言,可舉烷基銨鹽、烷基醯胺甜菜鹼、烷基氧化二甲基胺等為例。 Specific examples of the cationic emulsifier include an alkylammonium salt, a alkylguanamine betain, an alkyl oxyalkylamine, and the like.

前述鹽基性樹脂之具體例,可舉由聚酯系、丙烯酸系、胺基甲酸酯系之高分子共聚合物所構成者,且重量平均分子量(Mw)為1000~100萬者為例。鹽基性樹脂之重量平均分子量小於1000時未能得到充分之立體阻礙,有分散效果下降的情形,重量平均分子量大於100萬時反倒有產生凝集作用的情形。 Specific examples of the above-mentioned salt-based resin include a polyester-based, acrylic-based, or urethane-based polymer copolymer, and a weight average molecular weight (Mw) of 1,000 to 1,000,000 is taken as an example. . When the weight average molecular weight of the salt-based resin is less than 1,000, sufficient steric hindrance is not obtained, and the dispersion effect is lowered. When the weight average molecular weight is more than 1,000,000, agglomeration may occur.

又,前述鹽基性樹脂之胺價以5~200mgKOH/g為佳。小於5mgKOH/g時,有與摻雜於聚噻吩類之聚陰離子類的相互作用容易變得不充分,未能得到充分之分散效果的情形。另一方面,鹽基性樹脂之胺價大於200mgKOH/g時,相較於對摻雜於聚噻吩類之聚陰離子類的親和部,有立體阻礙層變少,分散效果變得不充分的情形。 Further, the amine-based resin preferably has an amine value of 5 to 200 mgKOH/g. When the amount is less than 5 mgKOH/g, the interaction with the polyanion doped with polythiophene is likely to be insufficient, and a sufficient dispersion effect may not be obtained. On the other hand, when the amine valence of the salt-based resin is more than 200 mgKOH/g, the steric hindrance layer is less and the dispersion effect is insufficient as compared with the affinity portion of the polyanion doped with polythiophene. .

前述鹽基性樹脂,可舉例如:Solsperse17000、Solsperse20000、Solsperse24000、Solsperse32000(Zeneca股份有限公司製)、Disperbyk-160、Disperbyk-161、Disperbyk-162、Disperbyk-163、Disperbyk-170、Disperbyk-2000、Disperbyk-2001(BIG Chemie社製)、AJISPER PB711、AJISPER PB821、AJISPER PB822、AJISPER PB824(味之素股份有限公司製)、EPOMIN006、EPOMIN012、EPOMIN018(日本SHOKUBAI股份有限公司製)、EFKA4046、EFKA4300、EFKA4330、EFKA4510(EFKA社製)、DISPARLON DA-400N(楠本化成化學社製)等,可單獨使用或併用。特別是,AJISPER PB821、AJISPER PB822、AJISPER PB824由分散性或使用時之導電性來看係為佳。 Examples of the salt-based resin include Solsperse 17000, Solsperse 20000, Solsperse 24000, Solsperse 32000 (manufactured by Zeneca Co., Ltd.), Disperbyk-160, Disperbyk-161, Disperbyk-162, Disperbyk-163, Disperbyk-170, Disperbyk-2000, Disperbyk. -2001 (manufactured by BIG Chemie), AJISPER PB711, AJISPER PB821, AJISPER PB822, AJISPER PB824 (manufactured by Ajinomoto Co., Ltd.), EPOMIN006, EPOMIN012, EPOMIN018 (made by SHOKUBAI Co., Ltd., Japan), EFKA4046, EFKA4300, EFKA4330, EFKA4510 (made by EFKA Co., Ltd.), DISPARLON DA-400N (made by Kusumoto Kasei Chemical Co., Ltd.), etc., can be used individually or in combination. In particular, AJISPER PB821, AJISPER PB822, and AJISPER PB824 are preferred from the viewpoint of dispersibility or conductivity at the time of use.

並未限制前述鹽基性化合物之使用量,但相對於聚噻吩類與聚陰離子類之合計100質量份,係1質量份~10萬質量份,以於10質量份~1萬質量份之範圍內添加為佳。 The amount of the above-mentioned salt-based compound is not limited, but it is in the range of 10 parts by mass to 100,000 parts by mass per 100 parts by mass of the polythiophene and the polyanion. It is better to add it inside.

<抗靜電層之性質> <Properties of Antistatic Layer>

此處所揭示之技術中抗靜電層之厚度,典型者係3~500nm,以3~100nm為佳,較佳者為3~60nm。抗靜電層之厚度過小時,將不易形成均一之抗靜電層(例如,抗靜電層之厚度方面,因位置不同厚度之差異變大),因此,容易使表面保護薄膜之外觀產生不均勻。另一方面,厚度過厚時則有對基材之特性(光學特性、尺寸穩定性等)造成影響的情形。 The thickness of the antistatic layer in the technique disclosed herein is typically from 3 to 500 nm, preferably from 3 to 100 nm, and more preferably from 3 to 60 nm. When the thickness of the antistatic layer is too small, it is difficult to form a uniform antistatic layer (for example, the thickness of the antistatic layer is large due to the difference in thickness between the positions), and therefore, the appearance of the surface protective film is likely to be uneven. On the other hand, when the thickness is too thick, there is a case where the properties (optical characteristics, dimensional stability, and the like) of the substrate are affected.

此處所揭示之表面保護薄膜的一較佳態樣係抗靜電層表面所測量之表面電阻率(Ω/□),以小於1.0×1011為佳,較佳者為小於5.0×1010,更佳者是小於1.0×1010。顯示前述範圍內之表面電阻率的表面保護薄膜可較佳地利用在,例如,液晶單元或半導體裝置等不耐靜電之物品的加工或搬運過程等中所使用的表面保護薄膜。再者,前述表面電阻率可藉由使用市售之絕緣電阻測量裝置於23℃、50%RH之環境氣體下所測量的表面電阻率算出。 A preferred aspect of the surface protective film disclosed herein is a surface resistivity (Ω/□) measured on the surface of the antistatic layer, preferably less than 1.0×10 11 , preferably less than 5.0×10 10 , more preferably The best is less than 1.0×10 10 . The surface protective film which exhibits the surface resistivity in the above range can be preferably used for a surface protective film used in, for example, a process of processing or handling an article which is not resistant to static electricity such as a liquid crystal cell or a semiconductor device. Further, the surface resistivity can be calculated by using a commercially available insulation resistance measuring device at a surface resistivity measured under an ambient gas of 23 ° C and 50% RH.

此處所揭示之表面保護薄膜以具有可輕易於其背面(抗靜電層表面)以水性墨水或油性墨水(使用例如,油性標示筆)印字的性質為佳。該表面保護薄膜適合於貼附有表面保護薄膜之狀態下進行被著體(例如光學部件)的加工或搬運等之過程中,於前述表面保護薄膜標記作為保護對 象之被著體的識別號碼等。因此,以印字性優異之表面保護薄膜為佳。以例如,對溶劑為醇系之包含顏料型的油性墨水具有高印字性為佳。又,以經印字之墨水不易因摩擦或轉印而掉落(即,印字密著性優異)為佳。又,此處所揭示之表面保護薄膜以具於修正或去除印字時,即使以醇(例如乙醇)擦拭印字仍不會於外觀產生明顯變化程度的耐溶劑性為佳。 The surface protective film disclosed herein preferably has a property of being easily printed on the back surface (antistatic layer surface) with an aqueous ink or an oily ink (using, for example, an oily marker). The surface protective film is suitable for processing or transporting a subject (for example, an optical member) in a state in which a surface protective film is attached, and the surface protective film is labeled as a protective pair. The identification number of the elephant being used, etc. Therefore, it is preferable to use a surface protection film excellent in printability. For example, it is preferred that the solvent-based oil-based ink having a solvent of an alcohol type has high printing property. Further, it is preferable that the ink to be printed is not easily dropped by friction or transfer (that is, excellent in printing adhesion). Further, the surface protective film disclosed herein preferably has a solvent resistance which does not significantly change the appearance even when the printing is performed with an alcohol (for example, ethanol) in the case of correction or removal of printing.

此處所揭示之表面保護薄膜除了基材、黏著劑層、及抗靜電層以外,於包含其他層之態樣中亦可實施。該「其他層」之配置可例示如於基材之第二面(前面)與黏著劑層之間等。配置於基材前面與黏著劑層之間的層可為例如,可提升黏著劑層對前述第二面之錨定性的底塗層(錨層)、抗靜電層等。亦可為於基材前面配置抗靜電層,再於抗靜電層上配置錨層,再於其上配置有黏著劑層之構造的表面保護薄膜。 The surface protective film disclosed herein can be carried out in addition to the substrate, the adhesive layer, and the antistatic layer in the form of including other layers. The configuration of the "other layer" can be exemplified as being between the second surface (front surface) of the substrate and the adhesive layer. The layer disposed between the front surface of the substrate and the adhesive layer may be, for example, an undercoat layer (anchor layer), an antistatic layer, or the like which enhances the anchoring of the adhesive layer to the second surface. Alternatively, an antistatic layer may be disposed on the front surface of the substrate, and an anchor layer may be disposed on the antistatic layer, and a surface protective film having a structure of an adhesive layer may be disposed thereon.

<黏著劑組成物> <Adhesive Composition>

本發明之表面保護薄膜具有前述黏著劑層,前述黏著劑層係由黏著劑組成物形成者,前述黏著劑組成物只要為具黏著性者即可,不需特別限制即可使用,亦可使用例如,丙烯酸系黏著劑、胺基甲酸酯系黏著劑、合成橡膠系黏著劑、天然橡膠系黏著劑、聚矽氧系黏著劑等,其中,較佳者為選自於由丙烯酸系黏著劑、胺基甲酸酯系黏著劑及聚矽氧系黏著劑所構成群組中之至少1種,特佳者是使用用有(甲基)丙烯酸系聚合物的丙烯酸系黏著劑。 The surface protection film of the present invention has the above-mentioned adhesive layer, and the adhesive layer is formed of an adhesive composition. The adhesive composition may be any adhesive, and may be used without any particular limitation. For example, an acrylic adhesive, a urethane-based adhesive, a synthetic rubber-based adhesive, a natural rubber-based adhesive, a polyoxynoxy adhesive, or the like, and preferably an acrylic adhesive is selected from the group consisting of acrylic adhesives. At least one of the group consisting of a urethane-based pressure-sensitive adhesive and a polyoxymethylene-based pressure-sensitive adhesive is preferably an acrylic pressure-sensitive adhesive using a (meth)acrylic polymer.

前述黏著劑層使用丙烯酸系黏著劑時,構成前述丙烯酸系黏著劑之(甲基)丙烯酸系聚合物的構成其之原料單體,可使用具碳數1~14之烷基的(甲基)丙烯酸系單體作為主單體。前述(甲基)丙烯酸系單體可使用1種或2種以上。藉由使用前述具碳數1~14之烷基的(甲基)丙烯酸系單體,可輕易地控制對被著體(被保護體)之剝離力(黏著力)為低,可得輕剝離性或再剝離性優異之表面保護薄膜。再者,本發明中的(甲基)丙烯酸系聚合物係指丙烯酸系聚合物及/或甲基丙烯酸系聚合物,而(甲基)丙烯酸酯係指丙烯酸酯及/或甲基丙烯酸酯。 When an acrylic pressure-sensitive adhesive is used as the pressure-sensitive adhesive layer, the raw material monomer constituting the (meth)acrylic polymer of the acrylic pressure-sensitive adhesive can be used to form a (meth) group having an alkyl group having 1 to 14 carbon atoms. An acrylic monomer is used as a main monomer. One type or two or more types of the above (meth)acrylic monomers can be used. By using the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms, the peeling force (adhesion) to the object (protected body) can be easily controlled to be low, and light peeling can be obtained. A surface protection film excellent in properties or removability. Further, the (meth)acrylic polymer in the present invention means an acrylic polymer and/or a methacrylic polymer, and the (meth)acrylate means an acrylate and/or a methacrylate.

前述具碳數1~14之烷基的(甲基)丙烯酸系單體之具體例,可舉例如:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸正十二酯、(甲基)丙烯酸正十三酯、(甲基)丙烯酸正十四酯等。 Specific examples of the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms include methyl (meth)acrylate, ethyl (meth)acrylate, and n-butyl (meth)acrylate. Ester, second butyl (meth)acrylate, tert-butyl (meth)acrylate, isobutyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate , n-octyl (meth)acrylate, isooctyl (meth)acrylate, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-decyl (meth)acrylate, (methyl) Isodecyl acrylate, n-dodecyl (meth)acrylate, n-tridecyl (meth)acrylate, n-tetradecyl (meth)acrylate, and the like.

其中,本發明之表面保護薄膜亦以具碳數6~14之烷基的(甲基)丙烯酸系單體較佳,可舉例如:(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸異癸酯、(甲基)丙 烯酸正十二酯、(甲基)丙烯酸正十三酯、(甲基)丙烯酸正十四酯等。特別是,藉由使用具碳數6~14之烷基的(甲基)丙烯酸系單體,將輕易地控制對被著體之剝離力(黏著力)為低,可成為再剝離性優異者。 Among them, the surface protective film of the present invention is preferably a (meth)acrylic monomer having an alkyl group having 6 to 14 carbon atoms, and examples thereof include (meth)acrylic acid acrylate and (meth)acrylic acid 2- Ethylhexyl ester, n-octyl (meth)acrylate, isooctyl (meth)acrylate, n-decyl (meth)acrylate, isodecyl (meth)acrylate, n-decyl (meth)acrylate, Isodecyl (meth)acrylate, (meth) propyl N-dodecanoic acid ester, n-tridecyl (meth)acrylate, n-tetradecyl (meth)acrylate, and the like. In particular, by using a (meth)acrylic monomer having an alkyl group having 6 to 14 carbon atoms, it is easy to control the peeling force (adhesion) against the object to be low, and it is excellent in re-peelability. .

特別是,相對於構成前述(甲基)丙烯酸系聚合物之單體成分全量100質量%,具碳數1~14之烷基的(甲基)丙烯酸系單體,以含有50質量%以上為佳,較佳者為60質量%以上,更佳者係70~99質量%,最佳者是80~98質量%。小於50質量%時,黏著劑組成物之適當之濕潤性、或黏著劑層之凝集力將變差,而不佳。 In particular, the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms is contained in an amount of 50% by mass or more based on 100% by mass of the total monomer component constituting the (meth)acrylic polymer. Preferably, it is 60% by mass or more, more preferably 70% to 99% by mass, and most preferably 80% to 98% by mass. When the amount is less than 50% by mass, the proper wettability of the adhesive composition or the aggregation force of the adhesive layer will be deteriorated, which is not preferable.

又,本發明之黏著劑組成物以前述(甲基)丙烯酸系聚合物的原料單體含有含羥基之(甲基)丙烯酸系單體為佳。前述含羥基之(甲基)丙烯酸系單體可使用1種或2種以上。 Moreover, it is preferable that the adhesive composition of the present invention contains a hydroxyl group-containing (meth)acrylic monomer as a raw material monomer of the (meth)acrylic polymer. One type or two or more types of the hydroxyl group-containing (meth)acrylic monomers may be used.

藉由使用前述含羥基之(甲基)丙烯酸系單體,可輕易地控制黏著劑組成物之交聯等,甚至是可輕易地控制改善利用流動之濕潤性與降低剝離之剝離力(黏著力)的均衡。此外,與一般可作為交聯部位作用之羧基或磺酸酯基等不同,羥基因與作為抗靜電成分(抗靜電劑)之離子性化合物、或聚醚系化合物具適當之相互作用,故由抗靜電性來看亦適用。 By using the aforementioned hydroxyl group-containing (meth)acrylic monomer, the crosslinking of the adhesive composition can be easily controlled, and even the wettability of the flow can be easily controlled and the peeling force of the peeling can be easily improved (adhesion) Equilibrium. Further, unlike a carboxyl group or a sulfonate group which can be generally used as a crosslinking site, a hydroxyl group has an appropriate interaction with an ionic compound or a polyether compound which is an antistatic component (antistatic agent). Antistatic properties also apply.

前述含羥基之(甲基)丙烯酸系單體,可舉例如:(甲基)丙烯酸2-羥乙酯、(甲基)丙烯酸2-羥丙酯、(甲基)丙烯酸4-羥丁酯、(甲基)丙烯酸6-羥己酯、(甲基)丙烯酸8-羥 辛酯、(甲基)丙烯酸10-羥癸酯、(甲基)丙烯酸12-羥月桂酯、(甲基)丙烯酸(4-羥甲基環己基)甲酯、N-羥甲基(甲基)丙烯醯胺等。特別是,以使用烷基之碳數為4以上之含羥基之(甲基)丙烯酸系單體,可使高速剝離時之輕剝離化變得容易而為佳。 The hydroxyl group-containing (meth)acrylic monomer may, for example, be 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate or 4-hydroxybutyl (meth)acrylate. 6-hydroxyhexyl (meth)acrylate, 8-hydroxyl (meth)acrylate Octyl ester, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, (4-hydroxymethylcyclohexyl)methyl (meth)acrylate, N-hydroxymethyl (methyl) ) acrylamide and the like. In particular, it is preferred to use a hydroxyl group-containing (meth)acrylic monomer having 4 or more carbon atoms in the alkyl group to facilitate light peeling at the time of high-speed peeling.

相對於前述具碳數1~14之烷基的(甲基)丙烯酸系單體100質量份,以含有前述含羥基之(甲基)丙烯酸系單體25質量份以下為佳,較佳者為1~22質量份,更佳者係2~20質量份,最佳者是3~18質量份。於前述範圍內時,因可輕易地控制黏著劑組成物之濕潤性與所得之黏著劑層之凝集力的均衡,故為佳。 The amount of the (meth)acrylic monomer having a hydroxyl group of 1 to 14 is preferably 25 parts by mass or less, more preferably 25 parts by mass or less, based on 100 parts by mass of the (meth)acrylic monomer having a hydroxyl group. 1 to 22 parts by mass, more preferably 2 to 20 parts by mass, and most preferably 3 to 18 parts by mass. When it is within the above range, it is preferred because the wetting property of the adhesive composition can be easily controlled to balance the cohesive force of the obtained adhesive layer.

又,由可輕易取得均衡之黏著性能的理由來看,其他之聚合性單體成分可於不損及本發明效果之範圍內使用用以調整(甲基)丙烯酸系聚合物之玻璃轉移溫度或剝離性的聚合性單體等,使Tg為0℃以下(通常為-100℃以上)。 Further, from the viewpoint of easily obtaining a balanced adhesive property, other polymerizable monomer components can be used to adjust the glass transition temperature of the (meth)acrylic polymer or can be used within a range not impairing the effects of the present invention. The peelable polymerizable monomer or the like has a Tg of 0 ° C or lower (usually -100 ° C or higher).

前述(甲基)丙烯酸系聚合物中所使用之前述具碳數1~14之烷基的(甲基)丙烯酸系單體、及前述含羥基之(甲基)丙烯酸系單體以外的其他之聚合性單體,可使用含羧基之(甲基)丙烯酸系單體。 a (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms and a hydroxyl group-containing (meth)acrylic monomer used in the (meth)acrylic polymer. As the polymerizable monomer, a carboxyl group-containing (meth)acrylic monomer can be used.

前述含羧基之(甲基)丙烯酸系單體,可舉(甲基)丙烯酸、(甲基)丙烯酸羧乙酯、(甲基)丙烯酸羧戊酯等為例。 Examples of the carboxyl group-containing (meth)acrylic monomer include (meth)acrylic acid, carboxyethyl (meth)acrylate, and carboxypentyl (meth)acrylate.

相對於前述具碳數1~14之烷基的(甲基)丙烯酸系單體100質量份,前述含羧基之(甲基)丙烯酸系單體以5質量份以下為佳,以3質量份以下較佳,以2質量份以下更 佳,最佳者是0.01質量份以上,小於0.1質量份。大於5質量份時,存在多數極性作用大之羧基等酸官能基,於摻合作為抗靜電成分(抗靜電劑)之離子性化合物、或聚醚系化合物時,藉於前述抗靜電成分等中羧基等酸官能基相互作用,將妨礙離子傳導,有造成導電效率下降,未能得到充分之抗靜電性的疑慮而不佳。 The carboxyl group-containing (meth)acrylic monomer is preferably 5 parts by mass or less, and preferably 3 parts by mass or less, based on 100 parts by mass of the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms. Preferably, it is 2 parts by mass or less. Preferably, the most preferred one is 0.01 parts by mass or more and less than 0.1 parts by mass. When the amount is more than 5 parts by mass, an acid functional group such as a carboxyl group having a large polarity is present, and when an ionic compound or a polyether compound which is an antistatic component (antistatic agent) is blended, the antistatic component or the like is used. The interaction of an acid functional group such as a carboxyl group interferes with ion conduction, and there is a concern that the conductivity is lowered and sufficient antistatic property is not obtained.

此外,只要於不損及本發明之特性的範圍內,不需特別限定即可使用前述(甲基)丙烯酸系聚合物中所使用之前述具碳數1~14之烷基的(甲基)丙烯酸系單體、含羥基之(甲基)丙烯酸系單體、及含羧基之(甲基)丙烯酸系單體以外的其他聚合性單體。可適當地使用例如:含氰基之單體、乙烯酯單體、芳香族乙烯單體等凝集力.耐熱性提升成分、或含醯胺基之單體、含醯亞胺基之單體、含胺基之單體、含環氧基之單體、N-丙烯醯基啉、乙烯醚單體等剝離力(黏著力)提升或具有作為交聯化基點作用之官能基的成分。其中,以使用含氰基之單體、含醯胺基之單體、含醯亞胺基之單體、含胺基之單體、及含N-丙烯醯基啉等含氮之單體為佳。藉由使用含氮之單體,可確保不會產生浮起或剝落等適當之剝離力(黏著力),更可得具優異剪切力之表面保護薄膜,故為有用。該等聚合性單體可使用1種或2種以上。 In addition, as long as the properties of the present invention are not impaired, the (meth) group having the alkyl group having 1 to 14 carbon atoms used in the (meth)acrylic polymer can be used without particular limitation. A polymerizable monomer other than an acrylic monomer, a hydroxyl group-containing (meth)acrylic monomer, and a carboxyl group-containing (meth)acrylic monomer. For example, a cohesive force such as a cyano group-containing monomer, a vinyl ester monomer, or an aromatic vinyl monomer can be suitably used. Heat resistance improving component, or a mercapto group-containing monomer, a quinone imine group-containing monomer, an amine group-containing monomer, an epoxy group-containing monomer, an N-propylene fluorenyl group A peeling force (adhesion) such as a porphyrin or a vinyl ether monomer is increased or a component having a functional group acting as a crosslinking crosslinking point. Wherein, a cyano group-containing monomer, a guanamine group-containing monomer, a ruthenium group-containing monomer, an amine group-containing monomer, and an N-containing fluorenyl group are used. A nitrogen-containing monomer such as a porphyrin is preferred. By using a nitrogen-containing monomer, it is possible to ensure that a suitable peeling force (adhesive force) such as lifting or peeling does not occur, and a surface protective film having excellent shearing force can be obtained. These polymerizable monomers may be used alone or in combination of two or more.

前述含氰基之單體可舉丙烯腈、甲基丙烯腈為例。 Examples of the cyano group-containing monomer include acrylonitrile and methacrylonitrile.

前述含醯胺基之單體,可舉例如:丙烯醯胺、甲 基丙烯醯胺、二乙基丙烯醯胺、N-乙烯吡咯啶酮、N,N-二甲基丙烯醯胺、N,N-二甲基甲基丙烯醯胺、N,N-二乙基丙烯醯胺、N,N-二乙基甲基丙烯醯胺、N,N’-亞甲基雙丙烯醯胺、N,N-二甲基胺基丙基丙烯醯胺、N,N-二甲基胺基丙基甲基丙烯醯胺、二丙酮丙烯醯胺等。 The above-mentioned monomer containing a guanamine group may, for example, be acrylamide, A Acrylamide, diethyl acrylamide, N-vinylpyrrolidone, N,N-dimethylpropenamide, N,N-dimethylmethacrylamide, N,N-diethyl Acrylamide, N,N-diethylmethacrylamide, N,N'-methylenebispropenylamine, N,N-dimethylaminopropylpropenylamine, N,N-di Methylaminopropyl methacrylamide, diacetone acrylamide, and the like.

前述含醯亞胺基之單體,可舉例如:環己基順丁烯二亞醯胺、異丙基順丁烯二亞醯胺、N-環己基順丁烯二亞醯胺、亞甲基丁二酸醯亞胺等。 The quinone imine group-containing monomer may, for example, be cyclohexylmethylenediamine, isopropyl maleimide, N-cyclohexylmethyleneamine, methylene. Succinic acid succinate and the like.

前述含胺基之單體,可舉例如:胺基乙基(甲基)丙烯酸酯、N,N-二甲基胺基乙基(甲基)丙烯酸酯、N,N-二甲基胺基丙基(甲基)丙烯酸酯等。 The amino group-containing monomer may, for example, be an aminoethyl (meth) acrylate, N,N-dimethylaminoethyl (meth) acrylate or N,N-dimethylamino group. Propyl (meth) acrylate and the like.

前述乙烯酯單體可舉乙酸乙烯酯、丙酸乙烯酯、月桂酸乙烯酯等為例。 Examples of the vinyl ester monomer include vinyl acetate, vinyl propionate, and vinyl laurate.

前述芳香族乙烯單體可舉苯乙烯、氯苯乙烯、氯甲基苯乙烯、α-甲基苯乙烯、其他之取代苯乙烯等。 Examples of the aromatic vinyl monomer include styrene, chlorostyrene, chloromethylstyrene, α-methylstyrene, and other substituted styrenes.

前述含環氧基之單體可舉環氧丙基(甲基)丙烯酸酯、甲基環氧丙基(甲基)丙烯酸酯、烯丙基環氧丙基醚等為例。 Examples of the epoxy group-containing monomer include epoxypropyl (meth)acrylate, methyl epoxypropyl (meth)acrylate, allylepoxypropyl ether and the like.

前述乙烯醚單體可舉甲基乙烯醚、乙基乙烯醚、異丁基乙烯基醚等為例。 The vinyl ether monomer may, for example, be methyl vinyl ether, ethyl vinyl ether or isobutyl vinyl ether.

本發明中,除了具碳數1~14之烷基的(甲基)丙烯酸系單體、含羥基之(甲基)丙烯酸系單體、含羧基之(甲基)丙烯酸系單體以外的其他聚合性單體,相對於前述具碳數1~14之烷基的(甲基)丙烯酸系單體100質量份,以0~40質量 份為佳,以0~30質量份較佳。藉於前述範圍內使用前述其他聚合性單體,於使用作為抗靜電成分之離子性化合物、或聚醚系化合物時,可適當地調節良好之相互作用、及良好之再剝離性。 In the present invention, a (meth)acrylic monomer having a carbon number of 1 to 14 or a hydroxyl group-containing (meth)acrylic monomer or a carboxyl group-containing (meth)acrylic monomer may be used. The polymerizable monomer is 0 to 40% by mass based on 100 parts by mass of the (meth)acrylic monomer having an alkyl group having 1 to 14 carbon atoms. Preferably, it is preferably 0 to 30 parts by mass. When the above-mentioned other polymerizable monomer is used in the above range, when an ionic compound or a polyether compound as an antistatic component is used, good interaction and good removability can be appropriately adjusted.

前述(甲基)丙烯酸系聚合物之單體成分,更亦可含有含環氧烷基之反應性單體。 The monomer component of the (meth)acrylic polymer may further contain a reactive monomer containing an alkylene oxide group.

又,前述含環氧烷基之反應性單體的氧伸烷單位之平均加成莫耳數,由與作為抗靜電成分之離子性化合物、或與聚醚系化合物之相溶性的觀點來看,以1~40為佳,以3~40較佳,以4~35更佳,以5~30特佳。前述平均加成莫耳數為1以上時,有可有效地得到降低被著體(被保護體)之汙染效果的傾向。又,前述平均加成莫耳數大於40時,與離子性化合物或聚醚系化合物之相互作用大,黏著劑組成物之黏度上升,有不易塗敷的傾向故不佳。再者,氧伸烷鏈之末端可為羥基、或以其它官能基等取代。 Further, the average addition mole number of the oxyalkylene unit of the epoxy group-containing reactive monomer is determined from the viewpoint of compatibility with an ionic compound as an antistatic component or a polyether compound. It is better to use 1~40, 3~40 is better, 4~35 is better, and 5~30 is better. When the average addition molar number is 1 or more, the effect of reducing the contamination effect of the object (protected body) tends to be effectively obtained. Further, when the average addition mole number is more than 40, the interaction with the ionic compound or the polyether compound is large, and the viscosity of the adhesive composition increases, which tends to be difficult to apply, which is not preferable. Further, the terminal of the oxyalkylene chain may be a hydroxyl group or substituted with another functional group or the like.

前述含環氧烷基之反應性單體可單獨使用、或混合2種以上使用,但全體之含量以為前述(甲基)丙烯酸系聚合物之單體成分全量中20質量%以下為佳,以10質量%以下較佳,以5質量%以下更佳,以4質量%以下尤其佳,以3質量%以下特佳,以1質量%以下更為佳。含環氧烷基之反應性單體的含量大於20質量%時,與離子性化合物、或聚醚系化合物之相互作用變大,將妨礙離子傳導,造成抗靜電性下降而不佳。 The epoxy group-containing reactive monomer may be used alone or in combination of two or more. The total content of the monomeric component of the (meth)acrylic polymer is preferably 20% by mass or less. 10% by mass or less is more preferably 5% by mass or less, particularly preferably 4% by mass or less, particularly preferably 3% by mass or less, and more preferably 1% by mass or less. When the content of the epoxy group-containing reactive monomer is more than 20% by mass, the interaction with the ionic compound or the polyether compound becomes large, which hinders ion conduction and causes deterioration of antistatic property.

前述含環氧烷基之反應性單體的氧伸烷單位可 舉具碳數1~6之伸烷基者為例,可舉例如:氧亞甲基、氧伸乙基、氧伸丙基、氧伸丁基等。氧伸烷鏈之烴基可為直鏈,亦可為支鏈。 The oxygen-athane unit of the aforementioned epoxy group-containing reactive monomer can be Examples of the alkylene group having a carbon number of 1 to 6 are exemplified by an oxymethylene group, an oxygen-extended ethyl group, an oxygen-extended propyl group, and an oxygen-extended butyl group. The hydrocarbyl group of the oxyalkylene chain may be linear or branched.

又,前述含環氧烷基之反應性單體以具環氧乙烷基之反應性單體較佳。藉由使用含有具環氧乙烷基之反應性單體的(甲基)丙烯酸系聚合物作為基質聚合物,可提升基質聚合物與作為抗靜電成分之離子性化合物、或聚醚系化合物的相溶性,並較佳地抑制洩漏至被著體,可得低汙染性之黏著劑組成物。 Further, the epoxy group-containing reactive monomer is preferably a reactive monomer having an oxirane group. By using a (meth)acrylic polymer containing a reactive monomer having an oxiranyl group as a matrix polymer, the matrix polymer can be enhanced with an ionic compound or a polyether compound as an antistatic component. It is compatible, and it is preferable to suppress leakage to the object, and a low-contaminant adhesive composition can be obtained.

前述含環氧烷基之反應性單體,可舉(甲基)丙烯酸環氧烷加成物、或分子中具丙烯醯基、甲基丙烯醯基、烯丙基等反應性取代基之反應性界面活性劑等為例。 The epoxy group-containing reactive monomer may, for example, be a (meth)acrylic acid alkylene oxide adduct or a reactive substituent having a propylene group, a methacryloyl group or an allyl group in the molecule. A sexual surfactant or the like is exemplified.

前述(甲基)丙烯酸環氧烷加成物之具體例,可舉例如:聚乙二醇(甲基)丙烯酸酯、聚丙二醇(甲基)丙烯酸酯、聚乙二醇-聚丙二醇(甲基)丙烯酸酯、聚乙二醇-聚丁二醇(甲基)丙烯酸酯、聚丙二醇-聚丁二醇(甲基)丙烯酸酯、甲氧基聚乙二醇(甲基)丙烯酸酯、乙氧基聚乙二醇(甲基)丙烯酸酯、丁氧基聚乙二醇(甲基)丙烯酸酯、辛氧基聚乙二醇(甲基)丙烯酸酯、月桂氧基聚乙二醇(甲基)丙烯酸酯、硬脂氧基聚乙二醇(甲基)丙烯酸酯、苯氧基聚乙二醇(甲基)丙烯酸酯、甲氧基聚丙二醇(甲基)丙烯酸酯、辛氧基聚乙二醇-聚丙二醇(甲基)丙烯酸酯等。 Specific examples of the (meth)acrylic acid alkylene oxide adduct include polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, and polyethylene glycol-polypropylene glycol (methyl). Acrylate, polyethylene glycol-polybutylene glycol (meth) acrylate, polypropylene glycol-polybutylene glycol (meth) acrylate, methoxy polyethylene glycol (meth) acrylate, ethoxy Polyethylene glycol (meth) acrylate, butoxy polyethylene glycol (meth) acrylate, octyloxy polyethylene glycol (meth) acrylate, lauryl oxy polyethylene glycol (methyl Acrylate, stearyloxy polyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, methoxy polypropylene glycol (meth) acrylate, octyloxy polyethylene Glycol-polypropylene glycol (meth) acrylate, and the like.

又,前述反應性界面活性劑之具體例,可舉例如:具(甲基)丙烯醯基或烯丙基之陰離子型反應性界面活 性劑、非離子型反應性界面活性劑、陽離子型反應性界面活性劑等。 Further, specific examples of the reactive surfactant include an anionic reactive interface having a (meth) acrylonitrile group or an allyl group. A reagent, a nonionic reactive surfactant, a cationic reactive surfactant, and the like.

前述(甲基)丙烯酸系聚合物之重量平均分子量(Mw)以10萬~500萬為佳,較佳者為20萬~400萬,更佳者是30萬~300萬。重量平均分子量小於10萬時,因黏著劑層之凝集力變小而有產生黏合劑殘留的傾向。另一方面,重量平均分子量大於500萬時,聚合物之流動性下降,對被著體(例如,偏光板)的濕潤變得不充分,有成為被著體與表面保護薄膜之黏著劑層之間產生膨脹之原因的傾向。再者,重量平均分子量係指藉GPC(凝膠(滲透(層析法)測量所得者。 The weight average molecular weight (Mw) of the (meth)acrylic polymer is preferably from 100,000 to 5,000,000, preferably from 200,000 to 4,000,000, and more preferably from 300,000 to 3,000,000. When the weight average molecular weight is less than 100,000, the cohesive force of the adhesive layer becomes small, and the adhesive tends to remain. On the other hand, when the weight average molecular weight is more than 5,000,000, the fluidity of the polymer is lowered, and the wettability of the object (for example, a polarizing plate) is insufficient, and the adhesive layer of the adherend and the surface protective film is formed. There is a tendency to cause expansion. Further, the weight average molecular weight means a GPC (gel (permeation (chromatography) measurement).

又,前述(甲基)丙烯酸系聚合物之玻璃轉移溫度(Tg)以0℃以下為佳,較佳者為-10℃以下(通常-100℃以上)。玻璃轉移溫度大於0℃時,聚合物不易流動,例如,對偏光板之濕潤變得不充分,有成為偏光板與表面保護薄膜之黏著劑層之間產生膨脹之原因的傾向。特別是藉將玻璃轉移溫度設為-61℃以下,將容易得到對偏光板之濕潤性與輕剝離性優異的黏著劑層。再者,可藉由適當地改變使用之單體成分或組成比將(甲基)丙烯酸系聚合物之玻璃轉移溫度調整至前述範圍內。 Further, the glass transition temperature (Tg) of the (meth)acrylic polymer is preferably 0 ° C or lower, more preferably -10 ° C or lower (normally -100 ° C or higher). When the glass transition temperature is more than 0 ° C, the polymer does not easily flow, and for example, the wettability of the polarizing plate is insufficient, and there is a tendency that expansion occurs between the polarizing plate and the adhesive layer of the surface protective film. In particular, by setting the glass transition temperature to -61 ° C or lower, an adhesive layer excellent in wettability and light peelability to the polarizing plate can be easily obtained. Further, the glass transition temperature of the (meth)acrylic polymer can be adjusted to the above range by appropriately changing the monomer component or composition ratio to be used.

並未特別限制前述(甲基)丙烯酸系聚合物之聚合方法,可藉由溶液聚合、乳化聚合、塊狀聚合、懸浮聚合等眾所皆知的方法聚合,但特別由作業性之觀點、或對被著體(被保護體)之低汙染性等特性面來看,溶液聚合係 較佳態樣。又,所得之聚合物可為隨機共聚物、嵌段共聚物、交互共聚物、接枝共聚物等之任一者。 The polymerization method of the above (meth)acrylic polymer is not particularly limited, and it can be polymerized by a well-known method such as solution polymerization, emulsion polymerization, bulk polymerization, suspension polymerization, etc., but particularly from the viewpoint of workability, or Solution polymerization system for the characteristics of the low contamination of the object (protected body) The preferred aspect. Further, the obtained polymer may be any of a random copolymer, a block copolymer, an interactive copolymer, a graft copolymer, and the like.

於前述黏著劑層使用胺基甲酸酯系黏著劑時,可使用任意適當之胺基甲酸酯系黏著劑。如此之胺基甲酸酯系黏著劑之較佳例,可舉由使多元醇與聚異氰酸酯化合物反應而得之胺基甲酸酯樹脂(胺基甲酸酯系聚合物)所構成者為例。多元醇可舉聚醚多元醇、聚酯多元醇、聚碳酸酯多元醇、聚己內酯多元醇等為例。聚異氰酸酯化合物可舉二苯基甲烷二異氰酸酯、甲苯二異氰酸酯、六亞甲基二異氰酸酯等為例。 When a urethane-based adhesive is used for the above adhesive layer, any appropriate urethane-based adhesive can be used. A preferred example of such a urethane-based adhesive is exemplified by a urethane resin (urethane-based polymer) obtained by reacting a polyol with a polyisocyanate compound. . The polyhydric alcohol may, for example, be a polyether polyol, a polyester polyol, a polycarbonate polyol, a polycaprolactone polyol or the like. The polyisocyanate compound may, for example, be diphenylmethane diisocyanate, toluene diisocyanate or hexamethylene diisocyanate.

於前述黏著劑層中使用聚矽氧系黏著劑時,可使用任意適當之聚矽氧系黏著劑。如此之聚矽氧系黏著劑宜使用藉摻合或凝集聚矽氧樹脂(聚矽氧系聚合物、聚矽氧成分)所得者。 When a polyfluorene-based pressure-sensitive adhesive is used for the pressure-sensitive adhesive layer, any appropriate polyoxynitride-based pressure-sensitive adhesive can be used. Such a polyoxygen-based adhesive is preferably obtained by blending or agglomerating a polyoxynoxy resin (polyoxymethylene polymer or polyoxymethylene component).

又,前述聚矽氧系黏著劑可舉加成反應硬化型聚矽氧系黏著劑或過氧化物硬化型聚矽氧系黏著劑為例。該等聚矽氧系黏著劑中,由不使用過氧化物(過氧化苯甲醯基等)且不產生分解物來看,以加成反應硬化型聚矽氧系黏著劑為佳。 Moreover, the polyoxygen-based adhesive may be an addition reaction-curable polyoxynoxy adhesive or a peroxide-curable polyoxynoxy adhesive. Among the above-mentioned polyoxynoxy adhesives, an addition reaction-curable polysulfoxy-based adhesive is preferred because no peroxide (benzyl peroxide, etc.) is used and no decomposition product is produced.

前述加成反應硬化型聚矽氧系黏著劑之硬化反應,若以得到聚烷基聚矽氧系黏著劑的情形為例,一般係使用藉由鉑觸媒使聚烷基氫矽氧烷組成物硬化的方法。 The hardening reaction of the addition reaction-hardening type polyoxynene-based adhesive is generally carried out by using a platinum catalyst to form a polyalkylhydroquinone-based adhesive. The method of hardening the object.

<黏著劑層之抗靜電成分> <Antistatic component of adhesive layer>

本發明之表面保護薄膜中構成前述黏著劑層之黏著劑 組成物,以含有抗靜電成分為佳,前述抗靜電成分以含有離子性化合物較佳。前述離子性化合物可舉鹼金屬鹽及/或離子液體為例。藉由含有該等離子性化合物,可賦與優異之抗靜電性。再者,交聯如前述之含抗靜電成分之黏著劑組成物而成的黏著劑層(使用抗靜電成分),可於剝離時對未抗靜電化之被著體(例如,偏光板)具抗靜電性,而成為降低有對被著體之汙染的表面保護薄膜。因此,作為帶電或汙染為特別嚴重之問題的光學.電子部件相關技術領域中的抗靜電性表面保護薄膜係非常有用。 The adhesive layer constituting the aforementioned adhesive layer in the surface protective film of the present invention The composition preferably contains an antistatic component, and the antistatic component preferably contains an ionic compound. The ionic compound may be exemplified by an alkali metal salt and/or an ionic liquid. By containing the ionic compound, excellent antistatic properties can be imparted. Further, an adhesive layer (using an antistatic component) obtained by crosslinking an adhesive composition containing an antistatic component as described above can be used for an antistatic body (for example, a polarizing plate) at the time of peeling. Antistatic property, which is a surface protection film that reduces contamination of the object. Therefore, as a problem of charging or pollution is a particularly serious problem. An antistatic surface protective film in the technical field related to electronic components is very useful.

因前述鹼金屬鹽之離子解離性高,由即使以微量之添加量仍可顯現優異之抗靜電能之點來看係為佳。前述鹼金屬鹽可較佳地使用例如:由Li+、Na+、K+而成之陽離子與由Cl-、Br-、I-、AlCl4 -、Al2Cl7 -、BF4 -、PF6 -、SCN-、ClO4 -、NO3 -、CH3COO-、C9H19COO-、CF3COO-、C3F7COO-、CH3SO3 -、CF3SO3 -、C4F9SO3 -、C2H5OSO3 -、C6H13OSO3 -、C8H17OSO3 -、(CF3SO2)2N-、(C2F5SO2)2N-、(C3F7SO2)2N-、(C4F9SO2)2N-、(CF3SO2)3C-、AsF6 -、SbF6 -、NbF6 -、TaF6 -、HF2 -、(CN)2N-、(CF3SO2)(CF3CO)N-、(CH3)2PO4 -、(C2H5)2PO4 -、CH3(OC2H4)2OSO3 -、C6H4(CH3)SO3 -、(C2F5)3PF3 -、CH3CH(OH)COO-、及(FSO2)2N-而成之陰離子所構成的金屬鹽。可使用之較佳者為LiBr、LiI、LiBF4、LiPF6、LiSCN、LiClO4、LiCF3SO3、Li(CF3SO2)2N、Li(C2F5SO2)2N、Li(FSO2)2N、Li(CF3SO2)3C等鋰鹽,更佳 者是LiCF3SO3、Li(CF3SO2)2N、Li(C2F5SO2)2N、Li(C3F7SO2)2N、Li(C4F9SO2)2N、Li(FSO2)2N、Li(CF3SO2)3C。可單獨使用該等鹼金屬鹽、或亦可混合2種以上使用。 Since the ionic dissociation property of the alkali metal salt is high, it is preferable from the viewpoint of exhibiting excellent antistatic energy even in a small amount of addition. As the alkali metal salt, for example, a cation derived from Li + , Na + , K + and Cl - , Br - , I - , AlCl 4 - , Al 2 Cl 7 - , BF 4 - , PF can be preferably used. 6 - , SCN - , ClO 4 - , NO 3 - , CH 3 COO - , C 9 H 19 COO - , CF 3 COO - , C 3 F 7 COO - , CH 3 SO 3 - , CF 3 SO 3 - , C 4 F 9 SO 3 - , C 2 H 5 OSO 3 - , C 6 H 13 OSO 3 - , C 8 H 17 OSO 3 - , (CF 3 SO 2 ) 2 N - , (C 2 F 5 SO 2 ) 2 N - , (C 3 F 7 SO 2 ) 2 N - , (C 4 F 9 SO 2 ) 2 N - , (CF 3 SO 2 ) 3 C - , AsF 6 - , SbF 6 - , NbF 6 - , TaF 6 - , HF 2 - , (CN) 2 N - , (CF 3 SO 2 )(CF 3 CO)N - , (CH 3 ) 2 PO 4 - , (C 2 H 5 ) 2 PO 4 - , CH 3 (OC 2 H 4 ) 2 OSO 3 - , C 6 H 4 (CH 3 )SO 3 - , (C 2 F 5 ) 3 PF 3 - , CH 3 CH(OH)COO - , and (FSO 2 ) 2 N - anion formed from the metal salt. Preferred for use are LiBr, LiI, LiBF 4 , LiPF 6 , LiSCN, LiClO 4 , LiCF 3 SO 3 , Li(CF 3 SO 2 ) 2 N, Li(C 2 F 5 SO 2 ) 2 N, Li (FSO 2 ) 2 N, Li(CF 3 SO 2 ) 3 C and other lithium salts, more preferably LiCF 3 SO 3 , Li(CF 3 SO 2 ) 2 N, Li(C 2 F 5 SO 2 ) 2 N Li(C 3 F 7 SO 2 ) 2 N, Li(C 4 F 9 SO 2 ) 2 N, Li(FSO 2 ) 2 N, Li(CF 3 SO 2 ) 3 C. These alkali metal salts may be used singly or in combination of two or more kinds.

又,藉由使用前述離子液體作為抗靜電成分(抗靜電劑),不需損及黏著特性即可得到抗靜電效果高之黏著劑層。使用離子液體即可得到優異之抗靜電特性的詳細理由尚未明確,但因離子液體與通常之離子性化合物相較係低熔點(熔點100℃以下),故分子運動容易,可知可得優異之抗靜電能。特別是於追求對被著體之抗靜電時,因轉印極微量之離子液體至被著體,可知可於被著體得到優異之剝離抗靜電性。特別是,熔點為室溫(25℃)以下之離子液體因可較有效率地進行對被著體之轉印,可得優異之抗靜電性。 Further, by using the ionic liquid as an antistatic component (antistatic agent), an adhesive layer having a high antistatic effect can be obtained without damaging the adhesive property. The reason why the excellent antistatic property can be obtained by using an ionic liquid is not clear. However, since the ionic liquid has a low melting point (melting point of 100 ° C or lower) as compared with a usual ionic compound, molecular motion is easy, and excellent resistance can be obtained. Static energy. In particular, when the antistatic property against the object is sought, it is known that a very small amount of the ionic liquid is transferred to the object, and it is found that excellent peeling antistatic property can be obtained in the object. In particular, an ionic liquid having a melting point of room temperature (25 ° C) or less can be more efficiently transferred to an object, and excellent antistatic property can be obtained.

又,因前述離子液體於100℃以下均為液狀,故相較於固體之鹽,較容易進行對黏著劑之添加及分散或溶解。此外,因離子液體無蒸氣壓(不揮發性),故不會隨時間而消失,具有可持續之抗靜電特性的特徵。再者,離子液體係指熔點100℃以下且呈液狀之熔融鹽(離子性化合物)。 Further, since the ionic liquid is liquid at 100 ° C or lower, it is easier to add, disperse or dissolve the adhesive than the solid salt. In addition, since the ionic liquid has no vapor pressure (non-volatile), it does not disappear with time and has a characteristic of sustainable antistatic properties. Further, the ionic liquid system refers to a molten salt (ionic compound) having a melting point of 100 ° C or less and being in a liquid form.

前述離子液體,以使用由下述通式(A)~(E)所表示之有機陽離子成分與陰離子成分所構成者為佳。藉由該等具陽離子之離子液體,更可得抗靜電能優異者。 The ionic liquid is preferably one composed of an organic cation component and an anion component represented by the following general formulae (A) to (E). By these cationic ionic liquids, those having excellent antistatic properties are more preferable.

[化1] [Chemical 1]

前述式(A)中之Ra表示碳數4至20的烴基,前述烴基之一部分亦可為經雜原子取代的官能基,Rb及Rc可相同或相異,表示氫或碳數1至16之烴基,前述烴基之一部分亦可為經雜原子取代的官能基。但,氮原子包含雙鍵時並無RcR a in the above formula (A) represents a hydrocarbon group having 4 to 20 carbon atoms, and a part of the hydrocarbon group may be a hetero atom-substituted functional group, and R b and R c may be the same or different, and represent hydrogen or a carbon number of 1. To the hydrocarbon group of 16, a part of the aforementioned hydrocarbon group may also be a hetero atom-substituted functional group. However, when the nitrogen atom contains a double bond, there is no R c .

前述式(B)中之Rd表示碳數2至20的烴基,前述烴基之一部分亦可為經雜原子取代的官能基,Re、Rf、及Rg可相同或相異,表示氫或碳數1至16之烴基,前述烴基之一部分亦可為經雜原子取代的官能基。 R d in the above formula (B) represents a hydrocarbon group having 2 to 20 carbon atoms, and a part of the above hydrocarbon group may be a hetero atom-substituted functional group, and R e , R f and R g may be the same or different and represent hydrogen. Or a hydrocarbon group having 1 to 16 carbon atoms, and a part of the aforementioned hydrocarbon group may be a hetero atom-substituted functional group.

前述式(C)中之Rh表示碳數2至20的烴基,前述烴基之一部分亦可為經雜原子取代的官能基,Ri、Rj、及Rk可相同或相異,表示氫或碳數1至16之烴基,前述烴基之一部分亦可為經雜原子取代的官能基。 R h in the above formula (C) represents a hydrocarbon group having 2 to 20 carbon atoms, and a part of the above hydrocarbon group may be a hetero atom-substituted functional group, and R i , R j , and R k may be the same or different, and represent hydrogen. Or a hydrocarbon group having 1 to 16 carbon atoms, and a part of the aforementioned hydrocarbon group may be a hetero atom-substituted functional group.

前述式(D)中之Z表示氮、硫、或磷原子,Rl、Rm、Rn、及Ro可相同或相異,表示碳數1至20之烴基,前述烴基之一部分亦可為經雜原子取代的官能基。但,Z為硫原子時並無RoZ in the above formula (D) represents a nitrogen, sulfur, or phosphorus atom, and R l , R m , R n , and R o may be the same or different, and represent a hydrocarbon group having 1 to 20 carbon atoms, and a part of the hydrocarbon group may also be used. It is a functional group substituted with a hetero atom. However, when Z is a sulfur atom, there is no R o .

前述式(E)中之RP表示碳數1至18的烴基,前述烴基之一部分亦可為經雜原子取代的官能基。 R P in the above formula (E) represents a hydrocarbon group having 1 to 18 carbon atoms, and a part of the above hydrocarbon group may be a functional group substituted with a hetero atom.

式(A)所表示之陽離子,可舉例如:吡啶鎓陽離子、哌啶鎓陽離子、吡咯啶鎓陽離子、具二氫吡咯骨架之陽離子、具吡咯骨架之陽離子、啉鎓陽離子等。 Examples of the cation represented by the formula (A) include a pyridinium cation, a piperidinium cation, a pyrrolidinium cation, a cation having a dihydropyrrole skeleton, a cation having a pyrrole skeleton, and the like. A porphyrin cation or the like.

具體例可舉例如:1-乙基吡啶鎓陽離子、1-丁基吡啶鎓陽離子、1-己基吡啶鎓陽離子、1-丁基-3-甲基吡啶鎓陽離子、1-丁基-4-甲基吡啶鎓陽離子、1-己基-3-甲基吡啶鎓陽離子、1-丁基-3,4-二甲基吡啶鎓陽離子、1,1-二甲基吡咯啶鎓陽離子、1-乙基-1-甲基吡咯啶鎓陽離子、1-甲基-1-丙基吡咯啶鎓陽離子、1-甲基-1-丁基吡咯啶鎓陽離子、1-甲基-1-戊基吡咯啶鎓陽離子、1-甲基-1-己基吡咯啶鎓陽離子、1-甲基-1-庚基吡咯啶鎓陽離子、1-乙基-1-丙基吡咯啶鎓陽離子、1-乙基-1-丁基吡咯啶鎓陽離子、1-乙基-1-戊基吡咯啶鎓陽離子、1-乙基-1-己基吡咯啶鎓陽離子、1-乙基-1-庚基吡咯啶鎓陽離子、1,1-二丙基吡咯啶鎓陽離子、1-丙基-1-丁基吡咯啶鎓陽離子、1,1-二丁基吡咯啶鎓陽離子、吡咯啶鎓-2-酮陽離子、1-丙基哌啶鎓陽離子、1-戊基哌啶鎓陽離子、1,1-二甲基哌啶鎓陽離子、1-甲基-1-乙基哌啶鎓陽離子、1-甲基-1-丙基哌啶鎓陽離子、1-甲基-1-丁基哌啶鎓陽離子、1-甲基-1-戊基哌啶鎓陽離子、1-甲基-1-己基哌啶鎓陽離子、1-甲基-1-庚基哌啶鎓陽離子、1-乙基-1-丙基哌啶鎓陽離子、1-乙基-1-丁基哌啶鎓陽離子、1-乙基-1-戊基哌啶鎓陽離子、1-乙基-1-己基哌啶鎓陽離子、1-乙基-1-庚基哌啶鎓陽離子、1,1-二丙基哌啶鎓陽離子、1-丙基-1-丁基哌啶鎓陽離子、1,1-二丁基哌啶鎓陽離 子、2-甲基-1-二氫吡咯陽離子、1-乙基-2-苯基吲哚陽離子、1,2-二甲基吲哚陽離子、1-乙基咔唑陽離子、N-乙基-N-甲基啉鎓陽離子等。 Specific examples thereof include 1-ethylpyridinium cation, 1-butylpyridinium cation, 1-hexylpyridinium cation, 1-butyl-3-methylpyridinium cation, 1-butyl-4-methyl Pyridinium cation, 1-hexyl-3-methylpyridinium cation, 1-butyl-3,4-dimethylpyridinium cation, 1,1-dimethylpyrrolidinium cation, 1-ethyl- 1-methylpyrrolidinium cation, 1-methyl-1-propylpyrrolidinium cation, 1-methyl-1-butylpyrrolidinium cation, 1-methyl-1-pentylpyrrolidinium cation , 1-methyl-1-hexylpyrrolidinium cation, 1-methyl-1-heptylpyrrolidinium cation, 1-ethyl-1-propylpyrrolidinium cation, 1-ethyl-1-butene Pyridone cation, 1-ethyl-1-pentylpyrrolidinium cation, 1-ethyl-1-hexylpyrrolidinium cation, 1-ethyl-1-heptylpyrrolidinium cation, 1,1 -dipropylpyrrolidone cation, 1-propyl-1-butylpyrrolidinium cation, 1,1-dibutylpyrrolidinium cation, pyrrolidin-2-one cation, 1-propylpiperidine Ruthenium cation, 1-pentylpiperidinium cation, 1,1-dimethylpiperidinium cation, 1-methyl 1-ethylpiperidinium cation, 1-methyl-1-propylpiperidinium cation, 1-methyl-1-butylpiperidinium cation, 1-methyl-1-pentylpiperidinium Cation, 1-methyl-1-hexylpiperidinium cation, 1-methyl-1-heptylpiperidinium cation, 1-ethyl-1-propylpiperidinium cation, 1-ethyl-1- Butyl piperidinium cation, 1-ethyl-1-pentylpiperidinium cation, 1-ethyl-1-hexylpiperidinium cation, 1-ethyl-1-heptylpiperidinium cation, 1, 1-dipropyl piperidinium cation, 1-propyl-1-butylpiperidinium cation, 1,1-dibutylpiperidinium cation, 2-methyl-1-dihydropyrrole cation, 1- Ethyl-2-phenylphosphonium cation, 1,2-dimethylhydrazine cation, 1-ethylcarbazole cation, N-ethyl-N-methyl A porphyrin cation or the like.

式(B)所表示之陽離子,可舉例如:咪唑啶陽離子、四氫嘧啶鎓陽離子、二氫嘧啶鎓陽離子等。 The cation represented by the formula (B) may, for example, be an imidazolium cation, a tetrahydropyrimidinium cation or a dihydropyrimidinium cation.

具體例,可舉例如:1,3-二甲基咪唑啶陽離子、1,3-二乙基咪唑啶陽離子、1-乙基-3-甲基咪唑啶陽離子、1-丁基-3-甲基咪唑啶陽離子、1-己基-3-甲基咪唑啶陽離子、1-辛基-3-甲基咪唑啶陽離子、1-癸基-3-甲基咪唑啶陽離子、1-十二基-3-甲基咪唑啶陽離子、1-十四基-3-甲基咪唑啶陽離子、1,2-二甲基-3-丙基咪唑啶陽離子、1-乙基-2,3-二甲基咪唑啶陽離子、1-丁基-2,3-二甲基咪唑啶陽離子、1-己基-2,3-二甲基咪唑啶陽離子、1-(2-甲氧基乙基)-3-甲基咪唑啶陽離子、1,3-二甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3-三甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3,5-四甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,3-二甲基-1,4-二氫嘧啶鎓陽離子、1,3-二甲基-1,6-二氫嘧啶鎓陽離子、1,2,3-三甲基-1,4-二氫嘧啶鎓陽離子、1,2,3-三甲基-1,6-二氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,4-二氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,6-二氫嘧啶鎓陽離子等。 Specific examples include, for example, 1,3-dimethylimidazolium cation, 1,3-diethylimidazolium cation, 1-ethyl-3-methylimidazolium cation, 1-butyl-3-methyl Imidazolidinium cation, 1-hexyl-3-methylimidazolium cation, 1-octyl-3-methylimidazolium cation, 1-mercapto-3-methylimidazolium cation, 1-dodecyl-3 -methylimidazolium cation, 1-tetradecyl-3-methylimidazolium cation, 1,2-dimethyl-3-propylimidazolium cation, 1-ethyl-2,3-dimethylimidazole Pyridinium cation, 1-butyl-2,3-dimethylimidazolium cation, 1-hexyl-2,3-dimethylimidazolium cation, 1-(2-methoxyethyl)-3-methyl Imidazolium cation, 1,3-dimethyl-1,4,5,6-tetrahydropyrimidinium cation, 1,2,3-trimethyl-1,4,5,6-tetrahydropyrimidinium cation, 1,2,3,4-tetramethyl-1,4,5,6-tetrahydropyrimidinium cation, 1,2,3,5-tetramethyl-1,4,5,6-tetrahydropyrimidine a cation, a 1,3-dimethyl-1,4-dihydropyrimidinium cation, a 1,3-dimethyl-1,6-dihydropyrimidinium cation, 1,2,3-trimethyl-1, 4-dihydropyrimidinium cation, 1,2,3-trimethyl-1,6-dihydropyrimidinium cation, 1,2,3,4-tetramethyl-1, a 4-dihydropyrimidinium cation, a 1,2,3,4-tetramethyl-1,6-dihydropyrimidinium cation or the like.

式(C)所表示之陽離子,可舉吡唑鎓陽離子、二氫吡唑鎓(pyrazolinium)陽離子等為例。 The cation represented by the formula (C) may, for example, be a pyrazolium cation or a pyrazolinium cation.

具體例,可舉例如:1-甲基吡唑鎓陽離子、3- 甲基吡唑鎓陽離子、1-乙基-2-甲基二氫吡唑鎓陽離子、1-乙基-2,3,5-三甲基吡唑鎓陽離子、1-丙基-2,3,5-三甲基吡唑鎓陽離子、1-丁基-2,3,5-三甲基吡唑鎓陽離子、1-乙基-2,3,5-三甲基二氫吡唑鎓陽離子、1-丙基-2,3,5-三甲基二氫吡唑鎓陽離子、1-丁基-2,3,5-三甲基二氫吡唑鎓陽離子等。 Specific examples include 1-methylpyrazolium cations, and 3- Methylpyrazolium cation, 1-ethyl-2-methyldihydropyrazolium cation, 1-ethyl-2,3,5-trimethylpyrazolium cation, 1-propyl-2,3 , 5-trimethylpyrazolium cation, 1-butyl-2,3,5-trimethylpyrazolium cation, 1-ethyl-2,3,5-trimethyldihydropyrazolium cation , 1-propyl-2,3,5-trimethyldihydropyrazolium cation, 1-butyl-2,3,5-trimethyldihydropyrazolium cation, and the like.

式(D)所表示之陽離子,可舉例如:四烷基銨陽離子、三烷基鋶陽離子、四烷基鏻陽離子、或前述烷基之一部分經烯基或烷氧基,甚至是環氧基取代者等。 The cation represented by the formula (D) may, for example, be a tetraalkylammonium cation, a trialkylsulfonium cation, a tetraalkylphosphonium cation, or a part of the aforementioned alkyl group via an alkenyl group or an alkoxy group, or even an epoxy group. Replacement, etc.

具體例,可舉例如:四甲基銨陽離子、四乙基銨陽離子、四丁基銨陽離子、四戊基銨陽離子、四己基銨陽離子、四庚基銨陽離子、三乙基甲基銨陽離子、三丁基乙基銨陽離子、三甲基癸基銨陽離子、N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨陽離子、環氧丙基三甲基銨陽離子、三甲基鋶陽離子、三乙基鋶陽離子、三丁基鋶陽離子、三己基鋶陽離子、二乙基甲基鋶陽離子、二丁基乙基鋶陽離子、二甲基癸基鋶陽離子、四甲基鏻陽離子、四乙基鏻陽離子、四丁基鏻陽離子、四己基鏻陽離子、四辛基鏻陽離子、三乙基甲基鏻陽離子、三丁基乙基鏻陽離子、三甲基癸基鏻陽離子、二烯丙基二甲基銨陽離子、三丁基-(2-甲氧基乙基)鏻陽離子等。其中,亦以使用以下為佳:三乙基甲基銨陽離子、三丁基乙基銨陽離子、三甲基癸基銨陽離子、二乙基甲基鋶陽離子、二丁基乙基鋶陽離子、二甲基癸基鋶陽離子、三乙基甲基鏻陽離子、三丁基乙基 鏻陽離子、三甲基癸基鏻陽離子等非對稱之四烷基銨陽離子、三烷基鋶陽離子、四烷基鏻陽離子、或N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨陽離子、環氧丙基三甲基銨陽離子、二烯丙基二甲基銨陽離子、N,N-二甲基-N-乙基-N-丙基銨陽離子、N,N-二甲基-N-乙基-N-丁基銨陽離子、N,N-二甲基-N-乙基-N-戊基銨陽離子、N,N-二甲基-N-乙基-N-己基銨陽離子、N,N-二甲基-N-乙基-N-庚基銨陽離子、N,N-二甲基-N-乙基-N-壬基銨陽離子、N,N-二甲基-N,N-二丙基銨陽離子、N,N-二乙基-N-丙基-N-丁基銨陽離子、N,N-二甲基-N-丙基-N-戊基銨陽離子、N,N-二甲基-N-丙基-N-己基銨陽離子、N,N-二甲基-N-丙基-N-庚基銨陽離子、N,N-二甲基-N-丁基-N-己基銨陽離子、N,N-二乙基-N-丁基-N-庚基銨陽離子、N,N-二甲基-N-戊基-N-己基銨陽離子、N,N-二甲基-N,N-己基銨陽離子、三甲基庚基銨陽離子、N,N-二乙基-N-甲基-N-丙基銨陽離子、N,N-二乙基-N-甲基-N-戊基銨陽離子、N,N-二乙基-N-甲基-N-庚基銨陽離子、N,N-二乙基-N-丙基-N-戊基銨陽離子、三乙基丙基銨陽離子、三乙基戊基銨陽離子、三乙基庚基銨陽離子、N,N-二丙基-N-甲基-N-乙基銨陽離子、N,N-二丙基-N-甲基-N-戊基銨陽離子、N,N-二丙基-N-丁基-N-己基銨陽離子、N,N-二丙基-N,N-二己基銨陽離子、N,N-二丁基-N-甲基-N-戊基銨陽離子、N,N-二丁基-N-甲基-N-己基銨陽離子、三辛基甲基銨陽離子、N-甲基-N-乙基-N-丙基-N-戊基銨陽離子。 Specific examples include tetramethylammonium cation, tetraethylammonium cation, tetrabutylammonium cation, tetraamylammonium cation, tetrahexylammonium cation, tetraheptyl ammonium cation, and triethylmethylammonium cation. Tributylethylammonium cation, trimethylsulfonium ammonium cation, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium cation, epoxypropyltrimethyl Ammonium cation, trimethyl phosphonium cation, triethyl phosphonium cation, tributyl phosphonium cation, trihexyl phosphonium cation, diethyl methyl phosphonium cation, dibutyl ethyl phosphonium cation, dimethyl fluorenyl cation, Tetramethyl phosphonium cation, tetraethyl phosphonium cation, tetrabutyl phosphonium cation, tetrahexyl phosphonium cation, tetraoctyl phosphonium cation, triethylmethyl phosphonium cation, tributyl ethyl phosphonium cation, trimethyl fluorenyl a phosphonium cation, a diallyldimethylammonium cation, a tributyl-(2-methoxyethyl)phosphonium cation, and the like. Among them, the following is also preferred: triethylmethylammonium cation, tributylethylammonium cation, trimethylsulfonium ammonium cation, diethylmethyl phosphonium cation, dibutylethyl phosphonium cation, two Asymmetric tetraalkylammonium cation such as methylmercaptopurine cation, triethylmethylsulfonium cation, tributylethylphosphonium cation, trimethylsulfonium sulfonium cation, trialkylsulfonium cation, tetraalkylphosphonium a cation, or a N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium cation, a propylene oxide trimethylammonium cation, a diallyldimethylammonium cation, N,N-dimethyl-N-ethyl-N-propylammonium cation, N,N-dimethyl-N-ethyl-N-butylammonium cation, N,N-dimethyl-N- Ethyl-N-amylammonium cation, N,N-dimethyl-N-ethyl-N-hexylammonium cation, N,N-dimethyl-N-ethyl-N-heptyl ammonium cation, N , N-dimethyl-N-ethyl-N-decyl ammonium cation, N,N-dimethyl-N,N-dipropyl ammonium cation, N,N-diethyl-N-propyl- N-butylammonium cation, N,N-dimethyl-N-propyl-N-amylammonium cation, N,N-dimethyl-N-propyl-N-hexylammonium cation, N,N- Dimethyl-N-propyl -N-heptyl ammonium cation, N,N-dimethyl-N-butyl-N-hexylammonium cation, N,N-diethyl-N-butyl-N-heptyl ammonium cation, N,N - dimethyl-N-pentyl-N-hexylammonium cation, N,N-dimethyl-N,N- Hexyl ammonium cation, trimethylheptyl ammonium cation, N,N-diethyl-N-methyl-N-propyl ammonium cation, N,N-diethyl-N-methyl-N-amyl ammonium a cationic, N,N-diethyl-N-methyl-N-heptyl ammonium cation, N,N-diethyl-N-propyl-N-amyl ammonium cation, triethyl propyl ammonium cation, Triethyl amyl ammonium cation, triethylheptyl ammonium cation, N,N-dipropyl-N-methyl-N-ethyl ammonium cation, N,N-dipropyl-N-methyl-N - amyl ammonium cation, N,N-dipropyl-N-butyl-N-hexylammonium cation, N,N-dipropyl-N,N-dihexyl ammonium cation, N,N-dibutyl- N-methyl-N-amylammonium cation, N,N-dibutyl-N-methyl-N-hexylammonium cation, trioctylmethylammonium cation, N-methyl-N-ethyl-N -propyl-N-amyl ammonium cation.

式(E)所表示之陽離子可舉鋶陽離子等為例。又,前述式(E)中之RP的具體例,可舉例如:甲基、乙基、丙基、丁基、己基、辛基、壬基、癸基、十二基、十三基、十四基、十八基等。 The cation represented by the formula (E) is exemplified by a cation or the like. Further, specific examples of the RP in the above formula (E) include methyl, ethyl, propyl, butyl, hexyl, octyl, decyl, decyl, dodecyl, thirteen, and ten. Four bases, eighteen bases, etc.

另一方面,並未特別限定陰離子成分,只要滿足可成為離子液體者即可,可使用例如:Cl-、Br-、I-、AlCl4 -、Al2Cl7 -、BF4 -、PF6 -、ClO4 -、NO3 -、CH3COO-、CF3COO-、CH3SO3 -、CF3SO3 -、C4F9SO3 -、(CF3SO2)2N-、(C2F5SO2)2N-、(C3F7SO2)2N-、(C4F9SO2)2N-、(CF3SO2)3C-、AsF6-、SbF6 -、NbF6 -、TaF6 -、HF2 -、(CN)2N-、C4F9SO3 -、(C2F5SO2)2N-、C3F7COO-、(CF3SO2)(CF3CO)N-、C9H19COO-、(CH3)2PO4 -、(C2H5)2PO4 -、C2H5OSO3 -、C6H13OSO3 -、C8H17OSO3 -、CH3(OC2H4)2OSO3 -、C6H4(CH3)SO3 -、(C2F5)3PF3 -、CH3CH(OH)COO-、及(FSO2)2N-等。 On the other hand, the anion component is not particularly limited, and as long as it can satisfy an ionic liquid, for example, Cl - , Br - , I - , AlCl 4 - , Al 2 Cl 7 - , BF 4 - , PF 6 can be used. - , ClO 4 - , NO 3 - , CH 3 COO - , CF 3 COO - , CH 3 SO 3 - , CF 3 SO 3 - , C 4 F 9 SO 3 - , (CF 3 SO 2 ) 2 N - , (C 2 F 5 SO 2 ) 2 N - , (C 3 F 7 SO 2 ) 2 N - , (C 4 F 9 SO 2 ) 2 N - , (CF 3 SO 2 ) 3 C - , AsF 6 -, SbF 6 - , NbF 6 - , TaF 6 - , HF 2 - , (CN) 2 N - , C 4 F 9 SO 3 - , (C 2 F 5 SO 2 ) 2 N - , C 3 F 7 COO - , (CF 3 SO 2 )(CF 3 CO)N - , C 9 H 19 COO - , (CH 3 ) 2 PO 4 - , (C 2 H 5 ) 2 PO 4 - , C 2 H 5 OSO 3 - , C 6 H 13 OSO 3 - , C 8 H 17 OSO 3 - , CH 3 (OC 2 H 4 ) 2 OSO 3 - , C 6 H 4 (CH 3 )SO 3 - , (C 2 F 5 ) 3 PF 3 - , CH 3 CH(OH)COO - , and (FSO 2 ) 2 N - and the like.

又,陰離子成分亦可使用下述式(F)所表示之陰離子等。 Further, an anion or the like represented by the following formula (F) can also be used as the anion component.

又,陰離子成分中特別以使用包含氟原子之陰離子成分因可得低熔點之離子液體而為佳。 Further, among the anion components, an anionic component containing a fluorine atom is preferably used because an ionic liquid having a low melting point can be obtained.

本發明所使用之離子液體的具體例,可自前述 陽離子成分與陰離子成分之組合適當地選擇使用,可舉例如:1-丁基吡啶鎓四氟硼酸、1-丁基吡啶鎓六氟磷酸、1-丁基-3-甲基吡啶鎓四氟硼酸、1-丁基-3-甲基吡啶鎓三氟甲烷磺酸酯、1-丁基-3-甲基吡啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-丁基-3-甲基吡啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-己基吡啶鎓四氟硼酸、1,1-二甲基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-乙基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-丙基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-丁基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-戊基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-己基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-庚基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-丙基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-丁基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-戊基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-己基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-庚基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1,1-二丙基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-丙基-1-丁基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1,1-二丁基吡咯啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-丙基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-戊基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1,1-二甲基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-乙基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-丙基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-丁基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1- 甲基-1-戊基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-己基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基-1-庚基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-丙基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-丁基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-戊基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-己基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-1-庚基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1,1-二丙基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-丙基-1-丁基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1,1-二丁基哌啶鎓雙(三氟甲烷磺醯基)醯亞胺、1,1-二甲基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-乙基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-丙基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-丁基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-戊基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-己基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-庚基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-丙基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-丁基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-戊基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-己基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-庚基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1,1-二丙基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-丙基-1-丁基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1,1-二丁基吡咯啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-丙基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-戊 基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1,1-二甲基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-乙基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-丙基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-丁基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-戊基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-己基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-甲基-1-庚基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-丙基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-丁基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-戊基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-己基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-1-庚基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1,1-二丙基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-丙基-1-丁基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、1,1-二丁基哌啶鎓雙(五氟乙烷磺醯基)醯亞胺、2-甲基-1-二氫吡咯四氟硼酸、1-乙基-2-苯基吲哚四氟硼酸、1,2-二甲基吲哚四氟硼酸、1-乙基咔唑四氟硼酸、1-乙基-3-甲基咪唑啶鎓四氟硼酸、1-乙基-3-甲基咪唑啶鎓乙酸酯、1-乙基-3-甲基咪唑啶鎓三氟乙酸酯、1-乙基-3-甲基咪唑啶鎓七氟丁酯、1-乙基-3-甲基咪唑啶鎓三氟甲烷磺酸酯、1-乙基-3-甲基咪唑啶鎓全氟丁烷磺酸酯、1-乙基-3-甲基咪唑啶鎓二氰亞胺、1-乙基-3-甲基咪唑啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-3-甲基咪唑啶鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-3-甲基咪唑啶鎓參(三氟甲烷磺醯基)甲基金屬化合物、1-丁基-3-甲基咪唑啶鎓四氟硼酸、1-丁基-3-甲基咪唑啶鎓六氟 磷酸、1-丁基-3-甲基咪唑啶鎓三氟乙酸酯、1-丁基-3-甲基咪唑啶鎓七氟丁酯、1-丁基-3-甲基咪唑啶鎓三氟甲烷磺酸酯、1-丁基-3-甲基咪唑啶鎓全氟丁烷磺酸酯、1-丁基-3-甲基咪唑啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-己基-3-甲基咪唑啶鎓溴、1-己基-3-甲基咪唑啶鎓氯、1-己基-3-甲基咪唑啶鎓四氟硼酸、1-己基-3-甲基咪唑啶鎓六氟磷酸、1-己基-3-甲基咪唑啶鎓三氟甲烷磺酸酯、1-辛基-3-甲基咪唑啶鎓四氟硼酸、1-辛基-3-甲基咪唑啶鎓六氟磷酸、1-己基-2,3-二甲基咪唑啶鎓四氟硼酸、1,2-二甲基-3-丙基咪唑啶鎓雙(三氟甲烷磺醯基)醯亞胺、1-甲基吡唑鎓四氟硼酸、2-甲基吡唑鎓四氟硼酸、1-乙基-2,3,5-三甲基吡唑鎓雙(三氟甲烷磺醯基)醯亞胺、1-丙基-2,3,5-三甲基吡唑鎓雙(三氟甲烷磺醯基)醯亞胺、1-丁基-2,3,5-三甲基吡唑鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-2,3,5-三甲基吡唑鎓雙(五氟乙烷磺醯基)醯亞胺、1-丙基-2,3,5-三甲基吡唑鎓雙(五氟乙烷磺醯基)醯亞胺、1-丁基-2,3,5-三甲基吡唑鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-2,3,5-三甲基吡唑鎓雙(三氟甲烷磺醯基)三氟乙醯胺、1-丙基-2,3,5-三甲基吡唑鎓雙(三氟甲烷磺醯基)三氟乙醯胺、1-丁基-2,3,5-三甲基吡唑鎓雙(三氟甲烷磺醯基)三氟乙醯胺、1-乙基-2,3,5-三甲基二氫吡唑鎓雙(三氟甲烷磺醯基)醯亞胺、1-丙基-2,3,5-三甲基二氫吡唑鎓雙(三氟甲烷磺醯基)醯亞胺、1-丁基-2,3,5-三甲基二氫吡唑鎓雙(三氟甲烷磺醯基)醯亞胺、1-乙基-2,3,5-三甲基二氫吡唑鎓雙(五氟乙烷磺醯基)醯亞胺、1- 丙基-2,3,5-三甲基二氫吡唑鎓雙(五氟乙烷磺醯基)醯亞胺、1-丁基-2,3,5-三甲基二氫吡唑鎓雙(五氟乙烷磺醯基)醯亞胺、1-乙基-2,3,5-三甲基二氫吡唑鎓雙(三氟甲烷磺醯基)三氟乙醯胺、1-丙基-2,3,5-三甲基二氫吡唑鎓雙(三氟甲烷磺醯基)三氟乙醯胺、1-丁基-2,3,5-三甲基二氫吡唑鎓雙(三氟甲烷磺醯基)三氟乙醯胺、四戊基銨三氟甲烷磺酸酯、四戊基銨雙(三氟甲烷磺醯基)醯亞胺、四己基銨三氟甲烷磺酸酯、四己基銨雙(三氟甲烷磺醯基)醯亞胺、四庚基銨三氟甲烷磺酸酯、四庚基銨雙(三氟甲烷磺醯基)醯亞胺、二烯丙基二甲基銨四氟硼酸、二烯丙基二甲基銨三氟甲烷磺酸酯、二烯丙基二甲基銨雙(三氟甲烷磺醯基)醯亞胺、二烯丙基二甲基銨雙(五氟乙烷磺醯基)醯亞胺、N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨四氟硼酸、N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨三氟甲烷磺酸酯、N,N-二乙基-N-甲基-N-(2-甲氧基乙基)銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二乙基-N甲基-N-(2-甲氧基乙基)銨雙(五氟乙烷磺醯基)醯亞胺、環氧丙基三甲基銨三氟甲烷磺酸酯、環氧丙基三甲基銨雙(三氟甲烷磺醯基)醯亞胺、環氧丙基三甲基銨雙(五氟乙烷磺醯基)醯亞胺、四辛基鏻三氟甲烷磺酸酯、四辛基鏻雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-乙基-N-丙基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-乙基-N-丁基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-乙基-N-戊基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-乙基-N-己基銨雙(三氟甲烷磺醯基)醯亞胺、 N,N-二甲基-N-乙基-N-庚基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-乙基-N-壬基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N,N-二丙基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-丙基-N-丁基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-丙基-N-戊基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-丙基-N-己基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-丙基-N-庚基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-丁基-N-己基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-丁基-N-庚基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N-戊基-N-己基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二甲基-N,N-己基銨雙(三氟甲烷磺醯基)醯亞胺、三甲基庚基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二乙基-N-甲基-N-丙基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二乙基-N-甲基-N-戊基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二乙基-N-甲基-N-庚基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二乙基-N-丙基-N-戊基銨雙(三氟甲烷磺醯基)醯亞胺、三乙基丙基銨雙(三氟甲烷磺醯基)醯亞胺、三乙基戊基銨雙(三氟甲烷磺醯基)醯亞胺、三乙基庚基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二丙基-N-甲基-N-乙基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二丙基-N-甲基-N-戊基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二丙基-N-丁基-N-己基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二丙基-N,N-己基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二丁基-N-甲基-N-戊基銨雙(三氟甲烷磺醯基)醯亞胺、N,N-二丁基-N-甲基-N-己基 銨雙(三氟甲烷磺醯基)醯亞胺、三辛基甲基銨雙(三氟甲烷磺醯基)醯亞胺、N-甲基-N-乙基-N-丙基-N-戊基銨雙(三氟甲烷磺醯基)醯亞胺、1-丁基吡啶鎓(三氟甲烷磺醯基)三氟乙醯胺、1-丁基-3-甲基吡啶鎓(三氟甲烷磺醯基)三氟乙醯胺、1-乙基-3-甲基咪唑啶鎓(三氟甲烷磺醯基)三氟乙醯胺、N-乙基-N-甲基啉鎓氰酸酯、4-乙基-4-甲基啉鎓甲基碳酸酯等。 Specific examples of the ionic liquid used in the present invention can be appropriately selected from the combination of the above cationic component and anionic component, and examples thereof include 1-butylpyridinium tetrafluoroboric acid and 1-butylpyridinium hexafluorophosphoric acid. 1-butyl-3-methylpyridinium tetrafluoroborate, 1-butyl-3-methylpyridinium trifluoromethanesulfonate, 1-butyl-3-methylpyridinium bis(trifluoromethanesulfonate Mercapto) quinone imine, 1-butyl-3-methylpyridinium bis(pentafluoroethanesulfonyl) quinone imine, 1-hexylpyridinium tetrafluoroborate, 1,1-dimethylpyrrolidine Bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-ethylpyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-propylpyrrolidine Bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-butylpyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-pentyl pyrrolidine Bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-hexylpyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-heptylpyrrolidinium Bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1-propylpyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1- Pyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1-pentylpyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1-hexyl Pyrrolizinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1-heptylpyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1,1-dipropyl pyrrolidine Bis(trifluoromethanesulfonyl) quinone imine, 1-propyl-1-butylpyrrolidinium bis(trifluoromethanesulfonyl) quinone imine, 1,1-dibutylpyrrolidinium (Trifluoromethanesulfonyl) quinone imine, 1-propylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-pentylpiperidinium bis(trifluoromethanesulfonyl) fluorene Amine, 1,1-dimethylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-ethylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-propylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-butylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-pentylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-methyl-1-hexylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1 -methyl-1-heptylpiperidinium bis(trifluoromethanesulfonyl)pyrene , 1-ethyl-1-propylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1-butylpiperidinium bis(trifluoromethanesulfonyl) quinone , 1-ethyl-1-pentylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1-hexylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-1-heptylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1,1-dipropyl piperidinium bis(trifluoromethanesulfonyl) quinone imine, 1- Propyl-1-butylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1,1-dibutylpiperidinium bis(trifluoromethanesulfonyl) quinone imine, 1,1- Dimethylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-methyl-1-ethylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-methyl 1-propylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-methyl-1-butylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1- Methyl-1-pentylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-methyl-1-hexylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1 -Methyl-1-heptylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-propylpyrrolidine Bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-butylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-pentylpyrrole Pyridinium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-hexylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-heptyl Pyrrolizinium bis(pentafluoroethanesulfonyl) quinone imine, 1,1-dipropylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-propyl-1-butyl Pyrrolizinium bis(pentafluoroethanesulfonyl) quinone imine, 1,1-dibutylpyrrolidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-propylpiperidinium bis ( Pentafluoroethanesulfonyl) quinone imine, 1-pentylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1,1-dimethylpiperidinium bis(pentafluoroethane sulfonate Indole, hydrazide, 1-methyl-1-ethylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-methyl-1-propylpiperidinium bis(pentafluoroethyl) Alkylsulfonyl) quinone imine, 1-methyl-1-butylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-methyl-1-pentylpiperidinium bis (five Fluoroethanesulfonyl) quinone imine, 1-methyl-1-hexylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-methyl- 1-heptylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-propylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-B N-butylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-pentylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1 -ethyl-1-hexylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-1-heptylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1,1-dipropyl piperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1-propyl-1-butylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 1,1-dibutylpiperidinium bis(pentafluoroethanesulfonyl) quinone imine, 2-methyl-1-dihydropyrrole tetrafluoroboric acid, 1-ethyl-2-phenylindole IV Fluoroboric acid, 1,2-dimethylindole tetrafluoroboric acid, 1-ethyloxazole tetrafluoroboric acid, 1-ethyl-3-methylimidazolium tetrafluoroboric acid, 1-ethyl-3-methyl Imidazolidinium acetate, 1-ethyl-3-methylimidazolium trifluoroacetate, 1-ethyl-3-methylimidazolidinium heptafluorobutylate, 1-ethyl-3- Methylimidazolium trifluoromethanesulfonate, 1-ethyl-3-methylimidazolidinium perfluorobutane sulfonate, 1-ethyl-3-methyl Oxazolidine dicyandiamide, 1-ethyl-3-methylimidazolidinium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-3-methylimidazolidinium bis(pentafluoroethylene) Alkylsulfonyl)imine, 1-ethyl-3-methylimidazolidinium (trifluoromethanesulfonyl)methyl metal compound, 1-butyl-3-methylimidazolium tetrafluoroboric acid , 1-butyl-3-methylimidazolium hexafluorophosphoric acid, 1-butyl-3-methylimidazolidinium trifluoroacetate, 1-butyl-3-methylimidazolidinium hexafluorobutane Ester, 1-butyl-3-methylimidazolium trifluoromethanesulfonate, 1-butyl-3-methylimidazolidinium perfluorobutanesulfonate, 1-butyl-3-methyl Imidazolium bis(trifluoromethanesulfonyl) quinone imine, 1-hexyl-3-methylimidazolidinium bromide, 1-hexyl-3-methylimidazolidinium chloride, 1-hexyl-3-methyl Imidazolinium tetrafluoroborate, 1-hexyl-3-methylimidazolium hexafluorophosphate, 1-hexyl-3-methylimidazolium trifluoromethanesulfonate, 1-octyl-3-methylimidazole Pyridinium tetrafluoroborate, 1-octyl-3-methylimidazolium hexafluorophosphate, 1-hexyl-2,3-dimethylimidazolium tetrafluoroborate, 1,2-dimethyl-3- Propyl imidazolium bis(trifluoromethanesulfonyl) hydrazine Imine, 1-methylpyrazolium tetrafluoroboric acid, 2-methylpyrazolium tetrafluoroboric acid, 1-ethyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonyl)醯imino, 1-propyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonyl) quinone imine, 1-butyl-2,3,5-trimethylpyridinium Oxazolium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-2,3,5-trimethylpyrazolium bis(pentafluoroethanesulfonyl) quinone imine, 1-propyl -2,3,5-trimethylpyrazolium bis(pentafluoroethanesulfonyl) quinone imine, 1-butyl-2,3,5-trimethylpyrazolium bis(pentafluoroethane Sulfhydryl) quinone imine, 1-ethyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonyl)trifluoroacetamide, 1-propyl-2,3,5 -trimethylpyrazolium bis(trifluoromethanesulfonyl)trifluoroacetamide, 1-butyl-2,3,5-trimethylpyrazolium bis(trifluoromethanesulfonyl)trifluoro Acetamide, 1-ethyl-2,3,5-trimethyldihydropyrazolium bis(trifluoromethanesulfonyl) quinone imine, 1-propyl-2,3,5-trimethyl Dihydropyrazol bis(trifluoromethanesulfonyl) quinone imine, 1-butyl-2,3,5-trimethyldihydropyrazolium bis(trifluoromethanesulfonyl) quinone imine, 1-ethyl-2,3,5-trimethyldihydropyrazolium Bis(pentafluoroethanesulfonyl) quinone imine, 1-propyl-2,3,5-trimethyldihydropyrazolium bis(pentafluoroethanesulfonyl) quinone imine, 1-butyl Bis-2,3,5-trimethyldihydropyrazolium bis(pentafluoroethanesulfonyl) quinone imine, 1-ethyl-2,3,5-trimethyldihydropyrazolium double (Trifluoromethanesulfonyl) trifluoroacetamide, 1-propyl-2,3,5-trimethyldihydropyrazolium bis(trifluoromethanesulfonyl)trifluoroacetamide, 1- Butyl-2,3,5-trimethyldihydropyrazolium bis(trifluoromethanesulfonyl)trifluoroacetamide, tetraamylammonium trifluoromethanesulfonate, tetraamylammonium double (three Fluoromethanesulfonyl) ruthenium imine, tetrahexylammonium trifluoromethanesulfonate, tetrahexylammonium bis(trifluoromethanesulfonyl) ruthenium, tetraheptyl ammonium trifluoromethanesulfonate, tetraheptyl Ammonium bis(trifluoromethanesulfonyl) quinone imine, diallyldimethylammonium tetrafluoroborate, diallyldimethylammonium trifluoromethanesulfonate, diallyldimethylammonium double (Trifluoromethanesulfonyl) quinone imine, diallyldimethylammonium bis(pentafluoroethanesulfonyl) quinone imine, N,N-diethyl-N-methyl-N-( 2-methoxyethyl)ammonium tetrafluoroborate, N,N-diethyl-N-methyl-N-(2 -Methoxyethyl)ammonium trifluoromethanesulfonate, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium bis(trifluoromethanesulfonyl)anthracene Imine, N,N-diethyl-N-methyl-N-(2-methoxyethyl)ammonium bis(pentafluoroethanesulfonyl) quinone imine, epoxypropyltrimethylammonium Fluoromethanesulfonate, epoxypropyltrimethylammonium bis(trifluoromethanesulfonyl) quinone imine, epoxypropyltrimethylammonium bis(pentafluoroethanesulfonyl) quinone imine, four Octyl sulfonium trifluoromethanesulfonate, tetraoctyl bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-ethyl-N-propyl ammonium bis(trifluoromethane Sulfhydryl) quinone imine, N,N-dimethyl-N-ethyl-N-butylammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-B --N-amyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-ethyl-N-hexyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-Dimethyl-N-ethyl-N-heptyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-ethyl-N-decyl ammonium (Trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N,N-dipropylammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N -propyl-N-butyl Alkyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-propyl-N-pentyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N- Dimethyl-N-propyl-N-hexyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-propyl-N-heptyl ammonium bis(trifluoromethanesulfonate Indenylamine, N,N-dimethyl-N-butyl-N-hexylammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-butyl- N-heptyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dimethyl-N-pentyl-N-hexyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N, N-dimethyl-N,N- Hexyl ammonium bis(trifluoromethanesulfonyl) quinone imine, trimethylheptyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-diethyl-N-methyl-N-propyl Alkyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-diethyl-N-methyl-N-pentyl ammonium bis(trifluoromethanesulfonyl) ruthenium, N,N- Diethyl-N-methyl-N-heptyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-diethyl-N-propyl-N-pentyl ammonium bis(trifluoromethane Sulfhydryl) sulfoximine, triethylpropylammonium bis(trifluoromethanesulfonyl) quinone imine, triethylammonium bis(trifluoromethanesulfonyl) ruthenium, triethylglycol Alkyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dipropyl-N-methyl-N-ethylammonium bis(trifluoromethanesulfonyl) quinone imine, N,N- Dipropyl-N-methyl-N-pentyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dipropyl-N-butyl-N-hexylammonium bis(trifluoromethanesulfonate Indenylamine, N,N-dipropyl-N,N- Hexyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N-dibutyl-N-methyl-N-pentyl ammonium bis(trifluoromethanesulfonyl) quinone imine, N,N- Dibutyl-N-methyl-N-hexyl ammonium bis(trifluoromethanesulfonyl) quinone imine, trioctylmethylammonium bis(trifluoromethanesulfonyl) quinone imine, N-methyl- N-ethyl-N-propyl-N-pentyl ammonium bis(trifluoromethanesulfonyl) quinone imine, 1-butylpyridinium (trifluoromethanesulfonyl) trifluoroacetamide, 1- Butyl-3-methylpyridinium (trifluoromethanesulfonyl) trifluoroacetamide, 1-ethyl-3-methylimidazolidinium (trifluoromethanesulfonyl) trifluoroacetamide, N -ethyl-N-methyl Phthalate cyanate, 4-ethyl-4-methyl 鎓 鎓 methyl carbonate and the like.

再者,前述離子液體可單獨使用,亦可混合2種以上使用。 Further, the ionic liquid may be used singly or in combination of two or more.

又,相對於前述(甲基)丙烯酸系聚合物100質量份,抗靜電成分之含量(合計量)以1質量份以下為佳,以0.001~0.9質量份較佳,更佳者為0.005~0.8質量份,最佳者是0.01~0.7質量份。於前述範圍內時,因可兼具抗靜電性與低汙染性故為佳。 In addition, the content (total amount) of the antistatic component is preferably 1 part by mass or less, more preferably 0.001 to 0.9 part by mass, even more preferably 0.005 to 0.8, based on 100 parts by mass of the (meth)acrylic polymer. The mass fraction is preferably 0.01 to 0.7 parts by mass. When it is within the above range, it is preferable because it can have both antistatic property and low pollution.

<黏著劑層之聚醚系化合物> <Polyether compound of adhesive layer>

本發明之表面保護薄膜中以前述黏著劑組成物含有聚醚系化合物(聚醚成分)為佳,其中亦以含有具氧伸烷鏈之有機聚矽氧烷較佳,以含有具氧伸烷主鏈之有機聚矽氧烷更佳。藉由使用前述有機聚矽氧烷,推測黏著劑表面之表面自由能下降,而實現輕剝離化。 In the surface protection film of the present invention, it is preferred that the above-mentioned adhesive composition contains a polyether compound (polyether component), and it is preferable to use an organopolyoxane having an oxygen-containing alkylene chain to contain an aerobic alkylene. The organopolyoxane of the main chain is more preferred. By using the aforementioned organopolyoxane, it is presumed that the surface free energy of the surface of the adhesive is lowered to achieve light peeling.

前述有機聚矽氧烷可適當地使用眾所皆知的具聚氧伸烷主鏈之有機聚矽氧烷,但以下述式所示者為佳。 As the above organopolyoxane, a well-known organopolyoxane having a polyoxyalkylene main chain can be suitably used, but it is preferably represented by the following formula.

[化3] [Chemical 3]

(式中,R1及/或R2具碳數1~6之氧伸烷鏈,前述氧伸烷鏈中之伸烷基可為直鏈或支鏈,前述氧伸烷鏈之末端亦可為烷氧基、或羥基。又,R1或R2之任一者可為羥基、或烷基、烷氧基,前述烷基、烷氧基之一部分亦可為經雜原子取代的官能基。n係1~300之整數。) (wherein R 1 and/or R 2 has an oxygen alkylene chain having 1 to 6 carbon atoms; and the alkylene group in the above oxygen alkyl chain may be linear or branched, and the terminal of the above oxygen chain may also be Further, any of R 1 or R 2 may be a hydroxyl group or an alkyl group or an alkoxy group, and a part of the above alkyl group or alkoxy group may be a hetero atom-substituted functional group. n is an integer from 1 to 300.)

前述有機聚矽氧烷係使用以包含矽氧烷之部位(矽氧烷部位)作為主鏈,並於該主鏈末端鍵結有氧伸烷鏈者。藉由使用前述具氧伸烷鏈之有機矽氧烷,推測可取得與(甲基)丙烯酸系聚合物或抗靜電成分等之相溶性的均衡,而實現輕剝離化。 The above organopolyoxyalkylene is used as a main chain comprising a site containing a decane (a oxane moiety), and an oxyalkylene chain is bonded to the end of the main chain. By using the above-mentioned organooxane having an aerobic alkylene chain, it is presumed that a balance between compatibility with a (meth)acrylic polymer or an antistatic component can be obtained, and light peeling can be achieved.

又,本發明中的前述有機聚矽氧烷可使用如以下之構造。具體而言,式中之R1及/或R2具有包含碳數1~6之烴基的氧伸烷鏈,前述氧伸烷鏈可舉氧亞甲基、氧伸乙基、氧伸丙基、氧伸丁基等為例,其中亦以氧伸乙基或氧伸丙基為佳。再者,R1及R2均具氧伸烷鏈時,可相同亦可相異。 Further, the above-mentioned organopolyoxane in the present invention can be used in the following constitution. Specifically, R 1 and/or R 2 in the formula has an oxyalkylene chain containing a hydrocarbon group having 1 to 6 carbon atoms, and the oxyalkylene chain may be an oxymethylene group, an oxygen-extended ethyl group or an oxygen-extended propyl group. For example, an oxygen-extended butyl group is also preferred, and an oxygen-extended ethyl group or an oxygen-extended propyl group is also preferred. Further, when both of R 1 and R 2 have an oxyalkylene chain, they may be the same or different.

又,前述氧伸烷鏈之烴基可為直鏈亦可為支 鏈。 Further, the hydrocarbon group of the oxygen alkylene chain may be a straight chain or a branch chain.

此外,前述氧伸烷鏈之末端亦可為烷氧基、或羥基,其中以烷氧基較佳。以保護黏著面之目的於黏著劑層表面貼合隔離片時,末端為羥基之有機聚矽氧烷將與隔離片產生相互作用,有自黏著劑層表面剝除隔離片時的黏著(剝離)力上升的情形。 Further, the terminal of the oxyalkylene chain may be an alkoxy group or a hydroxyl group, and an alkoxy group is preferred. When the separator is attached to the surface of the adhesive layer for the purpose of protecting the adhesive surface, the organic polyoxyalkylene having a hydroxyl group at the end will interact with the separator, and the adhesion (peeling) when the separator is peeled off from the surface of the adhesive layer The situation of rising power.

又,n係1~300之整數,以10~200為佳,較佳者為20至150。n於前述範圍內時,將成為與基質聚合物之相溶性均衡的態樣。此外,分子中亦可具有(甲基)丙烯醯基、烯丙基、羥基等反應性取代基。前述有機聚矽氧烷可單獨使用,亦可混合2種以上使用。 Further, n is an integer of 1 to 300, preferably 10 to 200, more preferably 20 to 150. When n is within the above range, it will be in a state of compatibility with the matrix polymer. Further, the molecule may have a reactive substituent such as a (meth)acrylinyl group, an allyl group or a hydroxyl group. The above organopolyoxane may be used singly or in combination of two or more.

前述具氧伸烷鏈之有機聚矽氧烷的具體例,可舉例如:市售品的商品名X-22-4952、X-22-4272、X-22-6266、KF-6004、KF-889(以上,信越化學工業社製)、BY16-201、SF8427(以上,TORAY(Dow Corning社製)、IM22(旭化成WACKER社製)等。該等化合物可單獨使用,亦可混合2種以上使用。 Specific examples of the organopolyoxane of the aerobic alkylene chain include, for example, commercially available products under the trade names of X-22-4952, X-22-4272, X-22-6266, KF-6004, and KF-. 889 (above, Shin-Etsu Chemical Co., Ltd.), BY16-201, SF8427 (above, TORAY (manufactured by Dow Corning), IM22 (made by Asahi Kasei WACKER Co., Ltd.), etc. These compounds may be used singly or in combination of two or more. .

又,除了於主鏈具氧伸烷鏈之(鍵結)有機矽氧烷以外,亦可於側鏈使用具氧伸烷鏈之(鍵結)有機矽氧烷,不於主鏈而於側鏈使用具氧伸烷鏈之有機矽氧烷係較佳態樣。前述有機聚矽氧烷可適當使用具眾所皆知的聚氧伸烷側鏈之有機聚矽氧烷,但以下述式所示者為佳。 Further, in addition to the (bonded) organooxane in the main chain having an alkylene chain, it is also possible to use an (oxygen) alkoxyalkylene (bonded) organic oxirane in the side chain, not on the side of the main chain. The chain employs a preferred aspect of the organooxane of the aerobic alkylene chain. As the above organopolyoxane, an organic polyoxyalkylene having a well-known polyoxyalkylene side chain can be suitably used, but it is preferably represented by the following formula.

[化5] [Chemical 5]

(式中,R1係1價之有機基、R2、R3及R4係伸烷基、R5係氫或有機基、m及n係0~1000之整數。但,m,n並未同時為0。a及b係0~100之整數。但,a,b並未同時為0。) (wherein R 1 is an organic group having 1 valence, R 2 , R 3 and R 4 are an alkylene group, R 5 is a hydrogen or an organic group, and m and n are an integer of 0 to 1000. However, m, n is Not both 0. a and b are integers from 0 to 100. However, a and b are not 0 at the same time.)

又,本發明中之前述有機聚矽氧烷可使用例如以下之構造。具體而言,式中之R1可例示如:甲基、乙基、丙基等烷基;苯基、甲苯基等芳基;或苯甲基、苯乙基等芳烷基的1價有機基,亦可分別具有羥基等取代基。R2、R3及R4可使用亞甲基、伸乙基、伸丙基等碳數1~8之伸烷基。此處,R3及R4係相異之伸烷基,R2可與R3或R4相同或相異。R3及R4為提升其可溶解於聚氧伸烷側鏈中之抗靜電成分(例如,離子性化合物等)濃度,以其任一者為伸乙基或伸丙基為佳。R5可例示如:甲基、乙基、丙基等烷基或乙醯基、丙醯基等醯基的1價有機基,亦可分別具有羥基等取代基。該等化合物可單獨使用,亦可混合2種以上使用。又,分子中亦可具有(甲基)丙烯醯基、烯丙基、羥基等反應性取代基。於前述具聚氧伸烷側鏈之有機矽氧烷中,推測具有具羥基末端之聚氧伸烷側鏈的有機矽氧烷容易取得相溶性均衡故為佳。 Further, as the above-mentioned organopolyoxane in the present invention, for example, the following constitution can be used. Specifically, R 1 in the formula may, for example, be an alkyl group such as a methyl group, an ethyl group or a propyl group; an aryl group such as a phenyl group or a tolyl group; or a monovalent organic group of an aralkyl group such as a benzyl group or a phenethyl group; The base may also have a substituent such as a hydroxyl group. As the R 2 , R 3 and R 4 , a methylene group having a carbon number of 1 to 8 such as a methylene group, an exoethyl group or a propyl group can be used. Here, R 3 and R 4 are different alkylene groups, and R 2 may be the same as or different from R 3 or R 4 . R 3 and R 4 are those which increase the concentration of an antistatic component (for example, an ionic compound or the like) which is soluble in the polyoxyalkylene side chain, and either one of them is an ethylidene group or a propyl group. R 5 may, for example, be an alkyl group such as a methyl group, an ethyl group or a propyl group, or a monovalent organic group having a mercapto group such as an ethyl fluorenyl group or a propyl fluorenyl group, and each may have a substituent such as a hydroxyl group. These compounds may be used singly or in combination of two or more. Further, the molecule may have a reactive substituent such as a (meth)acrylinyl group, an allyl group or a hydroxyl group. In the above organooxane having a polyoxyalkylene side chain, it is presumed that an organic oxane having a hydroxyl group-terminated polyoxyalkylene side chain is easily balanced in compatibility.

[化6] [Chemical 6]

前述有機矽氧烷之具體例可舉例如:作為市售品之商品名KF-351A、KF-352A、KF-353、KF-354L、KF-355A、KF-615A、KF-945、KF-640、KF-642、KF-643、KF-6022、X-22-6191、X-22-4515、KF-6011、KF-6012、KF-6015、KF-6017、X-22-2516(以上,信越化學工業社製)SF8428、FZ-2162、SH3749、FZ-77、L-7001、FZ-2104、FZ-2110、L-7002、FZ-2122、FZ-2164、FZ-2203、FZ-7001、SH8400、SH8700、SF8410、SF8422(以上,TORAY(Dow Corning社製)、TSF-4440,TSF-4441、TSF-4445、TSF-4450、TSF-4446、TSF-4452、TSF-4460(Momentive Performance Materials社製)、BYK-333、BYK-307、BYK-377、BYK-UV3500、BYK-UV3570(BIG Chemie(Japan社製)等。該等化合物可單獨使用,亦可混合2種以上使用。 Specific examples of the above-mentioned organic oxirane include, for example, commercially available products such as KF-351A, KF-352A, KF-353, KF-354L, KF-355A, KF-615A, KF-945, and KF-640. , KF-642, KF-643, KF-6022, X-22-6191, X-22-4515, KF-6011, KF-6012, KF-6015, KF-6017, X-22-2516 (above, Shin-Etsu Chemical Industry Co., Ltd.) SF8428, FZ-2162, SH3749, FZ-77, L-7001, FZ-2104, FZ-2110, L-7002, FZ-2122, FZ-2164, FZ-2203, FZ-7001, SH8400 , SH8700, SF8410, SF8422 (above, TORAY (Dow Corning), TSF-4440, TSF-4441, TSF-4445, TSF-4450, TSF-4446, TSF-4452, TSF-4460 (manufactured by Momentive Performance Materials) ), BYK-333, BYK-307, BYK-377, BYK-UV3500, BYK-UV3570 (BIG Chemie, manufactured by Japan), etc. These compounds may be used singly or in combination of two or more.

本發明中使用之前述有機矽氧烷的HLB(Hydrophile-Lipophile Balance:親水性-親油性均衡)值以1~16為佳,較佳者為3~14。HLB值超出前述範圍內時,對被著體之汙染性變差而不佳。 The HLB (Hydrophile-Lipophile Balance) value of the above-mentioned organodecane used in the present invention is preferably from 1 to 16, more preferably from 3 to 14. When the HLB value is outside the above range, the contamination of the object is deteriorated.

前述黏著劑組成物中亦可含有未含有機聚矽氧烷之聚醚系化合物(聚醚成分)的含聚氧伸烷鏈之化合物。藉於黏著劑中含有前述化合物,更可得對被著體之濕潤性 優異的黏著劑。 The above-mentioned adhesive composition may also contain a polyoxyalkylene chain-containing compound which does not contain a polyether compound (polyether component) of a polysiloxane. By the inclusion of the aforementioned compound in the adhesive, the wettability of the object can be obtained. Excellent adhesive.

前述未含有機聚矽氧烷之含聚氧伸烷鏈之化合物的具體例,可舉例如:聚氧伸烷烷基胺、聚氧伸烷二胺、聚氧伸烷脂肪酸酯、聚氧伸烷山梨醇脂肪酸酯、聚氧伸烷烷基苯基醚、聚氧伸烷烷基醚、聚氧伸烷烷基烯丙基醚、聚氧伸烷烷基苯基烯丙基醚等非離子性界面活性劑;聚氧伸烷烷基醚硫酸酯鹽、聚氧伸烷烷基醚磷酸酯鹽、聚氧伸烷烷基苯基醚硫酸酯鹽、聚氧伸烷烷基苯基醚磷酸酯鹽等陰離子性界面活性劑;其他,具聚氧伸烷鏈(聚環氧烷鏈)之陽離子性界面活性劑或兩離子性界面活性劑、具聚氧伸烷鏈之聚醚系化合物(及包含其衍生物)、具聚氧伸烷鏈之丙烯酸化合物(及包含其衍生物)等。又,亦可將含聚氧伸烷鏈之單體作為含聚氧伸烷鏈之化合物摻合於丙烯酸系聚合物。該含聚氧伸烷鏈之化合物可單獨使用,亦可組合2種以上使用。 Specific examples of the polyoxyalkylene chain-containing compound not containing the polyoxyalkylene oxide include polyoxyalkylene alkylamine, polyoxyalkylene diamine, polyoxyalkylene fatty acid ester, and polyoxygen. Alkylene sorbitan fatty acid ester, polyoxyalkylene alkyl phenyl ether, polyoxyalkylene alkyl ether, polyoxyalkylene alkyl allyl ether, polyoxyalkylene phenyl allyl ether, etc. Nonionic surfactant; polyoxyalkylene ether sulfate, polyoxyalkylene ether phosphate, polyoxyalkylene phenyl ether sulfate, polyoxyalkylene phenyl An anionic surfactant such as an ether phosphate; other, a cationic surfactant having a polyoxyalkylene chain (polyalkylene oxide chain) or a two-ionic surfactant, a polyether having a polyoxyalkylene chain a compound (and a derivative thereof), an acrylic acid compound having a polyoxyalkylene chain (and a derivative thereof), and the like. Further, a monomer containing a polyoxyalkylene chain may be blended as a polyoxyalkylene chain-containing compound in an acrylic polymer. The polyoxyalkylene chain-containing compound may be used singly or in combination of two or more.

具前述聚氧伸烷鏈之聚醚系化合物(聚醚成分)的具體例,可舉聚丙二醇(PPG)-聚乙二醇(PEG)之嵌段共聚物、PPG-PEG-PPG之嵌段共聚物、PEG-PPG-PEG之嵌段共聚物等為例。前述具聚氧伸烷鏈之聚醚系化合物的衍生物可舉末端經醚化之含氧伸丙基之化合物(PPG單烷基醚、PEG-PPG單烷基醚等)、末端經乙醯化之含氧伸丙基之化合物(末端乙醯化PPG等)等為例。 Specific examples of the polyether compound (polyether component) having the polyoxyalkylene chain include a block copolymer of polypropylene glycol (PPG)-polyethylene glycol (PEG) and a block of PPG-PEG-PPG. A copolymer, a block copolymer of PEG-PPG-PEG, and the like are exemplified. The derivative of the polyoxyalkylene compound having a polyoxyalkylene chain may be an etherified propyl group-terminated compound (PPG monoalkyl ether, PEG-PPG monoalkyl ether, etc.), terminally substituted with acetamidine. For example, a compound containing an oxygen-containing propyl group (terminal acetophenone PPG, etc.) is exemplified.

又,前述具聚氧伸烷鏈之丙烯酸化合物的具體例,可舉具氧伸烷基之(甲基)丙烯酸酯聚合物為例。前述 氧伸烷基之氧伸烷單位的加成莫耳數,於使用離子性化合物作為抗靜電成分時,由配位離子性化合物之觀點來看,以1~50為佳,以2~30較佳,以2~20更佳。又,前述氧伸烷鏈之末端可為原本之羥基、或以烷基、苯基等取代。 Further, a specific example of the polyoxyalkylene chain-containing acrylic compound may be exemplified by an oxygen-extended alkyl (meth)acrylate polymer. The foregoing When the ionic compound is used as the antistatic component, the ionic compound is preferably 1 to 50, and 2 to 30. Good, better than 2~20. Further, the terminal of the oxyalkylene chain may be an original hydroxyl group or substituted with an alkyl group, a phenyl group or the like.

前述具氧伸烷基之(甲基)丙烯酸酯聚合物的單體單位(成分),以包含(甲基)丙烯酸環氧烷之聚合物為佳,前述(甲基)丙烯酸環氧烷之具體例方面,以含乙二醇基之(甲基)丙烯酸酯為例,可舉例如:甲氧基-二乙二醇(甲基)丙烯酸酯、甲氧基-三乙二醇(甲基)丙烯酸酯等甲氧基-聚乙二醇(甲基)丙烯酸酯型;乙氧基-二乙二醇(甲基)丙烯酸酯、乙氧基-三乙二醇(甲基)丙烯酸酯等乙氧基-聚乙二醇(甲基)丙烯酸酯型;丁氧基-二乙二醇(甲基)丙烯酸酯、丁氧基-三乙二醇(甲基)丙烯酸酯等丁氧基-聚乙二醇(甲基)丙烯酸酯型;苯氧基-二乙二醇(甲基)丙烯酸酯、苯氧基-三乙二醇(甲基)丙烯酸酯等苯氧基-聚乙二醇(甲基)丙烯酸酯型;2-乙基己基-聚乙二醇(甲基)丙烯酸酯、壬基酚-聚乙二醇(甲基)丙烯酸酯型、甲氧基-二丙二醇(甲基)丙烯酸酯等甲氧基-聚丙二醇(甲基)丙烯酸酯型等。 The monomer unit (component) of the above-mentioned (meth) acrylate polymer having an alkylene group is preferably a polymer containing alkyl (meth) acrylate, and the specific (meth) acrylate alkylene oxide In an example, the ethylene glycol group-containing (meth) acrylate is exemplified by methoxy-diethylene glycol (meth) acrylate and methoxy-triethylene glycol (methyl). a methoxy-polyethylene glycol (meth) acrylate type such as acrylate; ethoxy-diethylene glycol (meth) acrylate, ethoxy-triethylene glycol (meth) acrylate, etc. Oxy-polyethylene glycol (meth) acrylate type; butoxy-poly group such as butoxy-diethylene glycol (meth) acrylate, butoxy-triethylene glycol (meth) acrylate Ethylene glycol (meth) acrylate type; phenoxy-polyethylene glycol such as phenoxy-diethylene glycol (meth) acrylate or phenoxy-triethylene glycol (meth) acrylate ( Methyl) acrylate type; 2-ethylhexyl-polyethylene glycol (meth) acrylate, nonyl phenol-polyethylene glycol (meth) acrylate type, methoxy-dipropylene glycol (methyl) A methoxy-polypropylene glycol (meth) acrylate type such as acrylate.

又,前述單體單位(成分)亦可使用前述(甲基)丙烯酸環氧烷以外的其他單體單位(成分)。其他單體成分之具體例,可舉例如:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲 基)丙烯酸異辛酯、(甲基)丙烯酸正壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸正十二酯、(甲基)丙烯酸正十三酯、(甲基)丙烯酸正十四酯等具碳數1~14之烷基的丙烯酸酯及/或甲基丙烯酸酯。 Further, the monomer unit (component) may be a monomer unit (component) other than the above-mentioned (meth)acrylic acid alkylene oxide. Specific examples of the other monomer component include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, and second butyl (meth)acrylate. ) tert-butyl acrylate, isobutyl (meth)acrylate, hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-octyl (meth)acrylate, (A) Isooctyl acrylate, n-decyl (meth) acrylate, isodecyl (meth) acrylate, n-decyl (meth) acrylate, isodecyl (meth) acrylate, (meth) acrylate Acrylates and/or methacrylates having a C 1-14 alkyl group such as a diester, n-tride (meth)acrylate or n-tetradecyl (meth)acrylate.

此外,前述(甲基)丙烯酸環氧烷以外之其他單體單位(成分),可適當地使用例如:含羧基之(甲基)丙烯酸酯、含磷酸基之(甲基)丙烯酸酯、含氰基之(甲基)丙烯酸酯、乙烯酯類、芳香族乙烯化合物、含酸酐基之(甲基)丙烯酸酯、含羥基之(甲基)丙烯酸酯、含醯胺基之(甲基)丙烯酸酯、含胺基之(甲基)丙烯酸酯、含環氧基之(甲基)丙烯酸酯、N-丙烯醯基啉、乙烯醚類等。 Further, as the monomer unit (component) other than the above (meth)acrylic acid alkylene oxide, for example, a carboxyl group-containing (meth) acrylate, a phosphoric acid group-containing (meth) acrylate, and a cyanide group can be suitably used. (meth) acrylate, vinyl ester, aromatic vinyl compound, acid anhydride group-containing (meth) acrylate, hydroxyl group-containing (meth) acrylate, decyl group-containing (meth) acrylate Amino group-containing (meth) acrylate, epoxy group-containing (meth) acrylate, N-propylene fluorenyl group Porphyrins, vinyl ethers, and the like.

較佳之一態樣係前述未含有機聚矽氧烷之含聚氧伸烷鏈之化合物的至少一部分具有(聚)環氧乙烷鏈之化合物。藉由摻合前述含(聚)環氧乙烷鏈之化合物,可提升基質聚合物與抗靜電成分之相溶性,並較佳地抑制外滲至被著體,可得低汙染性之黏著劑組成物。其中,可得特別於使用有PPG-PEG-PPG之嵌段共聚物時低汙染性優異之黏著劑。前述含聚環氧乙烷鏈之化合物,以不含前述有機聚矽氧烷之含聚氧伸烷鏈之化合物全體中所佔的(聚)環氧乙烷鏈之質量為5~90質量%為佳,較佳者為5~85質量%,更佳者是5~80質量%,最佳者係5~75質量%。 A preferred embodiment is a compound having at least a part of the polyoxyalkylene chain-containing compound having no polyoxyalkylene oxide having a (poly)ethylene oxide chain. By blending the compound containing the (poly)ethylene oxide chain, the compatibility of the matrix polymer with the antistatic component can be improved, and the extravasation to the object can be preferably inhibited, and the adhesive having low pollution can be obtained. Composition. Among them, an adhesive excellent in low contamination property particularly when a block copolymer having PPG-PEG-PPG is used can be obtained. The polyethylene oxide chain-containing compound has a mass of (poly)ethylene oxide chain of 5 to 90% by mass based on the total of the polyoxyalkylene chain-containing compound not containing the organopolysiloxane. Preferably, it is preferably 5 to 85% by mass, more preferably 5 to 80% by mass, and most preferably 5 to 75% by mass.

前述不含有機聚矽氧烷之含聚氧伸烷鏈之化合物的分子量,以數量平均分子量(Mn)為50000以下者為適 當,以200~30000為佳,更以200~10000較佳,通常則較佳地使用200~5000者。Mn大於50000時,有與丙烯酸系聚合物之相溶性下降,黏著劑層白化的傾向。Mn過小於200時,將容易產生因前述聚氧伸烷化合物所造成的汙染。再者,此處之Mn係由GPC(凝膠(滲透(層析法)所得之聚苯乙烯換算的值。 The molecular weight of the compound containing a polyoxyalkylene chain containing no organopolyoxyalkylene is suitable for a number average molecular weight (Mn) of 50,000 or less. When it is 200 to 30000, it is preferably 200 to 10000, and usually 200 to 5000 is preferably used. When Mn is more than 50,000, the compatibility with the acrylic polymer is lowered, and the adhesive layer tends to be whitened. When Mn is less than 200, contamination due to the above polyoxyalkylene compound is liable to occur. In addition, the Mn here is a value derived from GPC (gel (permeation (chromatography)).

又,前述不含有機聚矽氧烷之含聚氧伸烷鏈之化合物的市售品之具體例,可舉例如:ADEKA Pluronic17R-4、ADEKA Pluronic25R-2(以上,均為ADEKA社製)、LATEMUL PD-420、LATEMUL PD-420、LATEMUL PD-450、EMULGEN120(花王社製)、AQUALON HS-10、KH-10、NOIGEN EA-87、EA-137、EA-157、EA-167、EA-177(以上,第一工業製藥社製)等。 In addition, specific examples of the commercially available product of the polyoxyalkylene chain-containing compound containing no organic polyoxane may be, for example, ADEKA Pluronic 17R-4 or ADEKA Pluronic 25R-2 (all manufactured by ADEKA). LATEMUL PD-420, LATEMUL PD-420, LATEMUL PD-450, EMULGEN120 (made by Kao), AQUALON HS-10, KH-10, NOIGEN EA-87, EA-137, EA-157, EA-167, EA- 177 (above, manufactured by Daiichi Kogyo Co., Ltd.).

相對於前述(甲基)丙烯酸系聚合物100質量份,前述聚醚系化合物之含量以0.01~3質量份為佳,較佳者為0.03~2質量份,更佳者是0.05~1質量份,最佳者係0.05~0.5質量份。於前述範圍內時因容易兼具抗靜電性與輕剝離性(再剝離性),故為佳。 The content of the polyether compound is preferably 0.01 to 3 parts by mass, more preferably 0.03 to 2 parts by mass, even more preferably 0.05 to 1 part by mass based on 100 parts by mass of the (meth)acrylic polymer. The best one is 0.05 to 0.5 parts by mass. When it is within the above range, it is preferable because it is easy to have both antistatic property and light peelability (repeelability).

<交聯劑> <crosslinker>

本發明之表面保護薄膜以前述黏著劑組成物含有交聯劑為佳。又,本發明中,使用前述黏著劑組成物作為黏著劑層。例如,前述黏著劑含有前述(甲基)丙烯酸系聚合物時,藉由適當地調節前述(甲基)丙烯酸系聚合物之構成單位、構成比率、交聯劑之選擇及添加比率等地交聯,可得 耐熱性更優異之表面保護薄膜(黏著劑層)。 The surface protective film of the present invention preferably contains a crosslinking agent in the above-mentioned adhesive composition. Further, in the present invention, the above-described adhesive composition is used as the adhesive layer. For example, when the (meth)acrylic polymer is contained in the above-mentioned adhesive, cross-linking is carried out by appropriately adjusting the constituent unit of the (meth)acryl-based polymer, the constitutional ratio, the selection of the crosslinking agent, and the addition ratio. ,Available A surface protection film (adhesive layer) which is more excellent in heat resistance.

本發明所使用之交聯劑,可使用異氰酸酯化合物、環氧化合物、三聚氰胺系樹脂、吖環丙烷衍生物、及金屬螯合化合物等,特別以使用異氰酸酯化合物為較佳之態樣。又,該等化合物可單獨使用,亦可混合2種以上後使用。 As the crosslinking agent used in the present invention, an isocyanate compound, an epoxy compound, a melamine resin, an anthracene cyclopropane derivative, a metal chelate compound or the like can be used, and in particular, an isocyanate compound is preferably used. Further, these compounds may be used singly or in combination of two or more.

前述異氰酸酯化合物,可舉例如:三亞甲基二異氰酸酯、丁二醇二異氰酸酯、六亞甲基二異氰酸酯(HDI)、二聚酸二異氰酸酯等脂肪族聚異氰酸酯類、伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛酮二異氰酸酯(IPDI)、1,3-雙(異氫氧基甲基)環己烷等脂環族異氰酸酯類、2,4-甲苯二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯、茬二異氰酸酯(XDI)等芳香族異氰酸酯類、將前述異氰酸酯化合物以脲基甲酸酯鍵、雙脲鍵、異三聚氰酸鍵、脲二酮鍵、脲鍵、碳二醯亞胺鍵、脲酮亞胺(uretone imine)鍵、三酮(oxadiazinetrione)鍵等改質之聚異氰酸酯改質體。市售品可舉例如:商品名TAKENATE300S、TAKENATE500、TAKENATE600、TAKENATE D165N、TAKENATE D178N(以上,武田藥品工業社製)、SumidurT80、SumidurL、DesmodurN3400(以上,住化Bayer Urethane社製)、MillionateMR、MillionateMT、CoronateL、CoronateHL、CoronateHX(以上,日本Polyurethane工業社製)等。該等異氰酸酯化合物可單獨使用,亦可混合2種以上使用,亦可併用2官能異氰酸酯化合物與3官能以上之異氰酸酯化合物 使用。藉由併用交聯劑可兼具黏著性與耐反斥性(對曲面之接著性),可得接著可靠性更優異之表面保護薄膜。 Examples of the isocyanate compound include aliphatic polyisocyanates such as trimethylene diisocyanate, butanediol diisocyanate, hexamethylene diisocyanate (HDI), and dimer acid diisocyanate, and cyclopentyl diisocyanate. Cyclohexyl diisocyanate, isophorone diisocyanate (IPDI), alicyclic isocyanate such as 1,3-bis(isohydroxyoxymethyl)cyclohexane, 2,4-toluene diisocyanate, 4,4'- An aromatic isocyanate such as diphenylmethane diisocyanate or decyl diisocyanate (XDI), or an allophanate bond, a diurea bond, an iso-cyanuric bond, a uretdione bond, or a urea bond; a carbodiimide bond, a uretone imine bond, two A modified polyisocyanate modified body such as an oxadiazinetrione bond. Commercially available products include, for example, trade names TAKENATE 300S, TAKENATE 500, TAKENATE 600, TAKENATE D165N, TAKENATE D178N (above, Takeda Pharmaceutical Co., Ltd.), Sumidur T80, Sumidur L, Desmodur N3400 (above, manufactured by Bayer Urethane Co., Ltd.), Millionate MR, Millionate MT, Coronate L, Coronate HL, Coronate HX (above, manufactured by Polyurethane Industrial Co., Ltd., Japan). These isocyanate compounds may be used singly or in combination of two or more kinds thereof, or a bifunctional isocyanate compound or a trifunctional or higher isocyanate compound may be used in combination. By using a crosslinking agent in combination, it is possible to have both adhesiveness and repellency (adhesion to a curved surface), and a surface protective film which is more excellent in reliability can be obtained.

又,於合併使用前述異氰酸酯化合物(2官能之異氰酸酯化合物與3官能以上之異氰酸酯化合物)時,兩化合物之摻合比(質量比),以[2官能之異氰酸酯化合物]/[3官能以上之異氰酸酯化合物](質量比)為0.1/99.9~50/50地摻合為佳,以0.1/99.9~20/80較佳,以0.1/99.9~10/90更佳,以0.1/99.9~5/95更為佳,以0.1/99.9~1/99最佳。藉由調整於前述範圍內摻合,將成為黏著性與耐反斥性優異之黏著劑層,而為較佳態樣。 Further, when the above isocyanate compound (a bifunctional isocyanate compound and a trifunctional or higher isocyanate compound) are used in combination, the blend ratio (mass ratio) of the two compounds is [2-functional isocyanate compound] / [3 functional or higher isocyanate The compound] (mass ratio) is preferably 0.1/99.9 to 50/50, preferably 0.1/99.9 to 20/80, more preferably 0.1/99.9 to 10/90, and 0.1/99.9 to 5/95. More preferably, the best is 0.1/99.9~1/99. It is preferable to adjust the adhesive layer which is excellent in adhesiveness and repellent property by blending in the said range.

前述環氧化合物可舉例如:N,N,N’,N’-四環氧丙基-m-二甲苯二胺(商品名TETRAD-X,三菱瓦斯化學社製)或1,3-雙(N,N-二環氧丙基胺基甲基)環己烷(商品名TETRAD-C,三菱瓦斯化學社製)等。 The epoxy compound may, for example, be N,N,N',N'-tetraepoxypropyl-m-xylenediamine (trade name: TETRAD-X, manufactured by Mitsubishi Gas Chemical Co., Ltd.) or 1,3-double (manufactured by Mitsubishi Gas Chemical Co., Ltd.) N,N-diepoxypropylaminomethyl)cyclohexane (trade name: TETRAD-C, manufactured by Mitsubishi Gas Chemical Co., Ltd.) or the like.

前述三聚氰胺系樹脂可舉六羥甲基三聚氰胺等為例。吖環丙烷衍生物可舉市售品之商品名HDU、TAZM、TAZO(以上,相互藥工社製)等為例。 The melamine-based resin may, for example, be hexamethylol melamine or the like. The anthracycline derivative is exemplified by a commercial product name of HDU, TAZM, TAZO (above, manufactured by Mutual Pharmaceutical Co., Ltd.).

前述金屬螯合化合物之金屬成分可舉鋁、鐵、錫、鈦、鎳等為例,螯合成分則可舉乙炔、乙醯乙酸甲酯、乳酸乙酯等為例。 Examples of the metal component of the metal chelate compound include aluminum, iron, tin, titanium, nickel, and the like, and examples of the chelate synthesis include acetylene, ethyl acetonate acetate, and ethyl lactate.

本發明所使用之交聯劑的含量,例如,相對於前述(甲基)丙烯酸系聚合物100質量份,以含有0.01~20質量份為佳,以含有0.1~15質量份較佳,以含有0.5~10質量份更佳,以含有1.0~6質量份最佳。前述含量小於0.01質量 份時,利用交聯劑之交聯形成不充分,所得之黏著劑層的凝集力變小,有未能得到充分之耐熱性的情形,又有成為黏合劑殘留之原因的傾向。另一方面,含量大於20質量份時,聚合物之凝集力大、流動性下降,對被著體(例如,偏光板)之濕潤變得不充分,有成為於被著體與黏著劑層(黏著劑組成物層)之間產生膨脹之原因的傾向。此外,交聯劑量多時,則有剝離帶電特性下降的傾向。又,該等交聯劑可單獨使用、或亦可混合2種以上使用。 The content of the crosslinking agent to be used in the present invention is preferably 0.01 to 20 parts by mass, more preferably 0.1 to 15 parts by mass, per 100 parts by mass of the (meth)acrylic polymer. 0.5 to 10 parts by mass is more preferable, and it is preferably 1.0 to 6 parts by mass. The aforementioned content is less than 0.01 mass In the case of the mixture, the crosslinking by the crosslinking agent is insufficient, and the cohesive force of the obtained adhesive layer is small, and sufficient heat resistance is not obtained, and the binder tends to remain. On the other hand, when the content is more than 20 parts by mass, the cohesive force of the polymer is large, the fluidity is lowered, and the wetting of the object (for example, a polarizing plate) is insufficient, and the adherend and the adhesive layer are formed ( There is a tendency for the cause of swelling to occur between the adhesive composition layers. Further, when the amount of the crosslinking agent is large, the peeling electrification property tends to decrease. Further, these crosslinking agents may be used singly or in combination of two or more kinds.

前述黏著劑組成物更亦可含有可使上述任一交聯反應更有效地進行的交聯觸媒。該交聯觸媒可使用例如:二月桂酸二辛基錫、二月桂酸二辛基錫等錫系觸媒、參(乙醯丙酮)鐵、參(己烷-2,4-二酮)鐵、參(庚烷-2,4-二酮)鐵、參(庚烷-3,5-二酮)鐵、參(5-甲基己烷-2,4-二酮)鐵、參(辛烷-2,4-二酮)鐵、參(6-甲基庚烷-2,4-二酮)鐵、參(2,6-二甲基庚烷-3,5-二酮)鐵、參(壬烷-2,4-二酮)鐵、參(壬烷-4,6-二酮)鐵、參(2,2,6,6-四甲基庚烷-3,5-二酮)鐵、參(十三烷-6,8-二酮)鐵、參(1-苯基丁烷-1,3-二酮)鐵、參(六氟乙醯丙酮)鐵、參(乙醯乙酸乙酯)鐵、參(乙醯乙酸-正丙基)鐵、參(乙醯乙酸異丙基)鐵、參(乙醯乙酸-正丁基)鐵、參(乙醯乙酸-第二丁基)鐵、參(乙醯乙酸-第三丁基)鐵、參(丙醯乙酸甲基)鐵、參(丙醯乙酸乙酯)鐵、參(丙醯乙酸-正丙基)鐵、參(丙醯乙酸異丙基)鐵、參(丙醯乙酸-正丁基)鐵、參(丙醯乙酸-第二丁基)鐵、參(丙醯乙酸-第三丁基)鐵、參(乙醯乙酸苯甲基)鐵、參(丙二酸二甲基)鐵、參(丙 二酸二乙基)鐵、三甲氧基鐵、三乙氧基鐵、三異丙氧基鐵、氯化第二鐵等鐵系觸媒。該等交聯觸媒可使用1種,亦可併用2種以上。 The above-mentioned adhesive composition may further contain a crosslinking catalyst which can carry out any of the above crosslinking reactions more efficiently. As the cross-linking catalyst, for example, tin-based catalyst such as dioctyltin dilaurate or dioctyltin dilaurate, ginseng (acetonitrile) iron, and ginseng (hexane-2,4-dione) can be used. Iron, ginseng (heptane-2,4-dione) iron, ginseng (heptane-3,5-dione) iron, ginseng (5-methylhexane-2,4-dione) iron, ginseng Octane-2,4-dione) iron, ginseng (6-methylheptane-2,4-dione) iron, ginseng (2,6-dimethylheptane-3,5-dione) iron , ginseng (-2,4-dione) iron, ginseng (-4,6-dione) iron, ginseng (2,2,6,6-tetramethylheptane-3,5-di Ketone) iron, ginseng (tridecane-6,8-dione) iron, ginseng (1-phenylbutane-1,3-dione) iron, ginseng (hexafluoroacetamidine) iron, ginseng (B)醯Ethyl acetate) iron, ginseng (acetonitrile-n-propyl) iron, ginseng (isopropyl acetate isopropyl) iron, ginseng (acetic acid-n-butyl) iron, ginseng (acetamidine acetic acid - second Butyl) iron, ginseng (acetic acid-t-butyl) iron, ginseng (methyl hydrazine acetate) iron, ginseng (acetic acid ethyl acetate) iron, ginseng (propylene acetate-n-propyl) iron, Ginseng (isopropylidene acetate) iron, ginseng (propionylacetate-n-butyl) iron, ginseng (propionacetic acid-t-butyl) iron, ginseng (propionacetic acid-t-butyl) iron, ginseng (acetic acid benzyl) Iron, ginseng (dimethyl malonate) iron, ginseng (C Iron-based catalysts such as diethyl diacid) iron, trimethoxy iron, triethoxy iron, iron triisopropoxide, and second iron chloride. These cross-linking catalysts may be used alone or in combination of two or more.

並未特別限制前述交聯觸媒之含量,例如,相對於前述(甲基)丙烯酸系聚合物100質量份,以設為約0.0001~1質量份為佳,0.001~0.5質量份較佳。於前述範圍內時,形成黏著劑層後之交聯反應速度快,黏著劑組成物之使用期限亦變長而為較佳態樣。 The content of the cross-linking catalyst is not particularly limited. For example, it is preferably about 0.0001 to 1 part by mass, and preferably 0.001 to 0.5 part by mass, based on 100 parts by mass of the (meth)acryl-based polymer. When it is within the above range, the crosslinking reaction rate after the formation of the adhesive layer is fast, and the life of the adhesive composition is also long, which is preferable.

此外,前述黏著劑組成物中亦可含有丙烯酸寡聚物。丙烯酸寡聚物之重量平均分子量(Mw)以1000以上、小於30000為佳,以1500以上、小於20000較佳,以2000以上、小於10000更佳。前述丙烯酸寡聚物係包含將下述通式所表示之含脂環式構造之(甲基)丙烯酸系單體作為單體單位的(甲基)丙烯酸系聚合物,於作為丙烯酸系黏著劑使用時,具有賦與黏著之樹脂的機能,使接著性提升,有效抑制表面保護薄膜之浮起。 Further, the above-mentioned adhesive composition may also contain an acrylic oligomer. The weight average molecular weight (Mw) of the acrylic oligomer is preferably 1,000 or more and less than 30,000, more preferably 1,500 or more and less than 20,000, more preferably 2,000 or more and less than 10,000. The acrylic oligomer includes a (meth)acrylic polymer having a alicyclic structure-containing (meth)acrylic monomer represented by the following formula as a monomer unit, and is used as an acrylic adhesive. At the time, the function of imparting the resin to be adhered improves the adhesion and effectively suppresses the floating of the surface protective film.

CH2=C(R1)COOR2 CH 2 =C(R 1 )COOR 2

[前述通式中,R1係氫原子或甲基,R2係具脂環式構造之脂環式烴基] [In the above formula, R 1 is a hydrogen atom or a methyl group, and R 2 is an alicyclic hydrocarbon group having an alicyclic structure]

前述通式之脂環式烴基R2,可舉例如:環己基、異莰基、二環戊烷基、二環戊烯基、金剛烷基、三環戊烷基、三環戊烯基等脂環式烴基等。如此之具脂環式烴基的(甲基)丙烯酸酯,可舉例如:具環己基之(甲基)丙烯酸環己基、具異莰基之(甲基)丙烯酸異莰、具二環戊烷基 之(甲基)丙烯酸二環戊烷等與(甲基)丙烯酸之脂環族醇的酯。如此,藉由將具有較大體積構造之丙烯酸系單體作為單體單位,而存在於丙烯酸寡聚物中,可提升接著性。 Examples of the alicyclic hydrocarbon group R 2 of the above formula include a cyclohexyl group, an isodecyl group, a dicyclopentanyl group, a dicyclopentenyl group, an adamantyl group, a tricyclopentanyl group, a tricyclopentenyl group, and the like. An alicyclic hydrocarbon group or the like. Such an alicyclic hydrocarbon group-containing (meth) acrylate may, for example, be a cyclohexyl (meth)acrylic acid cyclohexyl group, an isodecyl group (meth)acrylic acid isoindole, having a dicyclopentanyl group. An ester of an alicyclic alcohol of (meth)acrylic acid such as dicyclopentane (meth)acrylate. As described above, the acrylic monomer having a large volume structure is present as a monomer unit in the acrylic oligomer, and the adhesion can be improved.

相對於前述(甲基)丙烯酸系聚合物100質量份,前述丙烯酸寡聚物之摻合量,以含有0.01~10質量份為佳,以含有0.1~7質量份較佳,以含有0.2~5質量份更佳,以含有0.3~2質量份最佳。藉於前述範圍內使用摻合量,可期待提升對被著體之剝離力(黏著力),並期待抑制浮起而成為較佳態樣。 The amount of the acrylic oligomer to be blended is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 7 parts by mass, even more preferably 0.2 to 5, based on 100 parts by mass of the (meth)acrylic polymer. The mass fraction is better, and it is preferably 0.3 to 2 parts by mass. By using the blending amount within the above range, it is expected to improve the peeling force (adhesive force) to the object, and it is expected to suppress the floating and to obtain a preferable aspect.

另外,前述黏著劑組成物中亦可含有其他眾所皆知的添加劑,可視用途適當地添加例如:潤滑劑、著色劑、顏料等粉體、可塑劑、黏著賦與劑、低分子量聚合物、表面潤潤滑劑、均染劑、抗氧化劑、防腐劑、光穩定劑、紫外線吸收劑、聚合禁止劑、矽烷耦合劑、無機或有機之填充劑、金屬粉、粒子狀、箔狀物等。 Further, the above-mentioned adhesive composition may contain other well-known additives, and may be appropriately added, for example, a powder such as a lubricant, a colorant or a pigment, a plasticizer, an adhesive agent, a low molecular weight polymer, or the like. Surface lubricants, leveling agents, antioxidants, preservatives, light stabilizers, UV absorbers, polymerization inhibitors, decane coupling agents, inorganic or organic fillers, metal powders, particulates, foils, and the like.

<黏著劑層(表面保護薄膜> <Adhesive layer (surface protective film)

本發明之表面保護薄膜係將前述黏著劑層形成於基材上而成者,此時,一般係於黏著劑組成物之塗布後進行黏著劑組成物之交聯,亦可將由交聯後之黏著劑組成物所構成的黏著劑層轉印於基材等。 The surface protective film of the present invention is obtained by forming the above-mentioned adhesive layer on a substrate. In this case, the adhesion of the adhesive composition is generally performed after the application of the adhesive composition, and the crosslinking may be carried out after crosslinking. The adhesive layer composed of the adhesive composition is transferred to a substrate or the like.

又,並未特別限制於基材上形成黏著劑層之方法,例如,藉由於基材塗布前述黏著劑組成物(溶液),再乾燥去除聚合溶劑等後於基材上形成黏著劑層地製作。之後,以黏著劑層之調整成分改變或調整交聯反應等為目的 亦可進行養護。又,於基材上塗布黏著劑組成物製作表面保護薄膜時,亦可另外於前述黏著劑組成物中添加聚合溶劑以外之一種以上的溶劑,以可均一地塗布於基材上。 Further, it is not particularly limited to a method of forming an adhesive layer on a substrate, for example, by coating the substrate with the above-described adhesive composition (solution), drying and removing the polymerization solvent, and the like, and then forming an adhesive layer on the substrate. . After that, the adjustment component of the adhesive layer is changed or the crosslinking reaction is adjusted. It can also be cured. Further, when the surface protective film is formed by applying the adhesive composition to the substrate, one or more solvents other than the polymerization solvent may be added to the adhesive composition to uniformly coat the substrate.

又,製造本發明之表面保護薄膜時的黏著劑層之形成方法,可使用製造黏著膠帶類時所使用之眾所皆知的方法。具體而言,可舉例如:輥塗布、凹板塗布、反輥塗布、輥刷、噴霧塗布、空氣刀塗布法、利用模具塗布機等擠壓塗布法等。 Further, as a method of forming the adhesive layer in the production of the surface protective film of the present invention, a well-known method for producing an adhesive tape can be used. Specific examples thereof include roll coating, gravure coating, reverse roll coating, roll brushing, spray coating, air knife coating, and extrusion coating using a die coater.

通常將本發明之表面保護薄膜的前述黏著劑層之厚度製作為3~100μm,以5~50μm左右為佳。黏著劑層之厚度於前述範圍內時,因容易得到適當之再剝離性與接著性的均衡故為佳。 The thickness of the above-mentioned adhesive layer of the surface protective film of the present invention is usually 3 to 100 μm, preferably about 5 to 50 μm. When the thickness of the adhesive layer is within the above range, it is preferable to easily obtain a suitable balance between re-peelability and adhesion.

又,本發明之表面保護薄膜的總厚度以8~300μm為佳,以10~200μm較佳,以20~100μm最佳。於前述範圍內時,黏著特性(再剝離性、接著性等)、作業性、外觀特性優異,而成為較佳態樣。再者,前述總厚度係包含基材、黏著劑層、抗靜電層等全部之層的厚度之合計之意。 Further, the total thickness of the surface protective film of the present invention is preferably 8 to 300 μm, more preferably 10 to 200 μm, and most preferably 20 to 100 μm. When it is in the above range, the adhesive properties (removability, adhesion, and the like), workability, and appearance characteristics are excellent, which is preferable. Further, the total thickness is intended to include the total thickness of all the layers of the substrate, the adhesive layer, and the antistatic layer.

<隔離片> <isolation sheet>

本發明之表面保護薄膜中,視需要以保護黏著面為目的,可於黏著劑層表面貼合隔離片。 In the surface protective film of the present invention, for the purpose of protecting the adhesive surface, the separator may be attached to the surface of the adhesive layer.

構成前述隔離片之材料有紙或塑膠薄膜,但由表面平滑性優異之點來看,以使用塑膠薄膜為佳。該膜只要係可保護前述黏著劑層之膜即可,並未特別限定,可舉 例如:聚乙烯膜、聚丙烯膜、聚丁烯膜、聚丁二烯膜、聚甲基戊稀膜、聚氯乙烯膜、氯化乙烯共聚物膜、聚對苯二甲酸乙二酯膜、聚對苯二甲酸丁二酯膜、聚胺基甲酸酯膜、乙烯-乙酸乙烯酯共聚物膜等。 The material constituting the separator is a paper or a plastic film, but it is preferable to use a plastic film from the viewpoint of excellent surface smoothness. The film is not particularly limited as long as it can protect the film of the adhesive layer, and For example: polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethyl pentylene film, polyvinyl chloride film, chlorinated ethylene copolymer film, polyethylene terephthalate film, A polybutylene terephthalate film, a polyurethane film, an ethylene-vinyl acetate copolymer film, or the like.

前述隔離片之厚度通常係5~200μm,以10~100μm左右為佳。於前述範圍內時,因對黏著劑層之貼合作業性與自黏著劑層之剝離作業性優異,故為佳。視需要,可於前述隔離片進行利用聚矽氧系、氟系、長鏈烷基系或脂肪酸醯胺系之脫模劑、二氧化矽粉等的脫模及防汙處理、或塗布型、捏入型、蒸鍍型等抗靜電處理。 The thickness of the spacer is usually 5 to 200 μm, preferably about 10 to 100 μm. When it is in the above range, it is preferable because it is excellent in adhesion workability to the adhesive layer and peeling workability from the adhesive layer. If necessary, the release sheet may be subjected to mold release and antifouling treatment using a polyfluorene-based, fluorine-based, long-chain alkyl or fatty acid amide-based release agent, cerium oxide powder, or the like, or a coating type. Antistatic treatment such as pinch type or vapor deposition type.

本發明之光學構件宜受前述表面保護薄膜保護。前述表面保護薄膜因抗靜電性與剝離靜電位之經時穩定性優異,故可使用於加工、搬運、出貨時等之表面保護用途(表面保護薄膜),對保護前述光學構件(偏光板等)表面係為有用。特別因可使用於容易產生靜電之塑膠製品等,故於帶電成為非常嚴重之問題的光學.電子部件相關之技術領域中,對於抗靜電用途係非常有用。 The optical member of the present invention is preferably protected by the aforementioned surface protective film. Since the surface protective film is excellent in antistatic property and stability over time of the peeling electrostatic potential, it can be used for surface protection applications (surface protection film) for processing, transportation, and shipment, and to protect the optical member (polarizing plate, etc.). The surface system is useful. Especially for plastic products that are easy to generate static electricity, etc., it is an optical problem that becomes a very serious problem. In the technical field related to electronic components, it is very useful for antistatic applications.

[實施例] [Examples]

以下,說明與本發明相關之幾個實施例,但並無以該等具體例中所示者限定本發明之意。再者,若無特別說明的話,以下說明中之「份」及「%」係質量基準。又,表中之摻合量(添加量)顯示固體成分或固體成分比。 In the following, several embodiments related to the present invention are described, but the invention is not limited by the specific examples. In addition, unless otherwise stated, the "parts" and "%" in the following description are the quality standards. Further, the blending amount (addition amount) in the table shows a solid component or a solid component ratio.

又,分別如以下地測量或評定以下說明中之各特性。 Further, each of the characteristics in the following description is measured or evaluated as follows.

<重量平均分子量(Mw)之測量> <Measurement of Weight Average Molecular Weight (Mw)>

重量平均分子量(Mw)係使用Tosoh股份有限公司製GPC裝置(HLC-8220GPC)進行測量。測量條件係如下述。 The weight average molecular weight (Mw) was measured using a GPC apparatus (HLC-8220GPC) manufactured by Tosoh Corporation. The measurement conditions are as follows.

試樣濃度:0.2質量%(THF溶液) Sample concentration: 0.2% by mass (THF solution)

試樣注入量:10μl Sample injection amount: 10μl

溶離液:THF Dissolution: THF

流速:0.6ml/min Flow rate: 0.6ml/min

測量溫度:40℃ Measuring temperature: 40 ° C

管柱: Column:

試樣管柱;TSKguardcolumn SuperHZ-H(1根)+ TSKgel SuperHZM-H(2枝) Sample column; TSKguardcolumn SuperHZ-H (1) + TSKgel SuperHZM-H (2 sticks)

參考管柱;TSKgel SuperH-RC(1枝) Reference column; TSKgel SuperH-RC (1 branch)

檢測器:微差折射計(RI) Detector: differential refractometer (RI)

再者,重量平均分子量係以聚苯乙烯換算值求出。又,於需要測量數量平均分子量(Mn)時,係與重量平均分子量同樣地測量。 Further, the weight average molecular weight was determined in terms of polystyrene. Further, when it is necessary to measure the number average molecular weight (Mn), it is measured in the same manner as the weight average molecular weight.

<玻璃轉移溫度(Tg)> <glass transition temperature (Tg)>

玻璃轉移溫度Tg(℃),利用各單體之同元聚合物的玻璃轉移溫度Tgn(℃)並使用下述文獻值,由下述式求出。 The glass transition temperature Tg (° C.) was determined by the following formula using the glass transition temperature Tgn (° C.) of the homopolymer of each monomer and using the following literature values.

式:1/(Tg+273)=Σ[Wn/(Tgn+273)] Formula: 1/(Tg+273)=Σ[Wn/(Tgn+273)]

[前述式中,Tg(℃)表示共聚物之玻璃轉移溫度、Wn(-)表示各單體之質量分率、Tgn(℃)表示各單體之同元聚合物的玻璃轉移溫度、n表示各單體種類。] [In the above formula, Tg (°C) represents the glass transition temperature of the copolymer, Wn(-) represents the mass fraction of each monomer, Tgn (°C) represents the glass transition temperature of the homopolymer of each monomer, and n represents Each monomer type. ]

文獻值: Literature value:

丙烯酸2-乙己基酯(2EHA):-70℃ 2-ethylhexyl acrylate (2EHA): -70 ° C

丙烯酸正丁酯(BA):-55℃ N-butyl acrylate (BA): -55 ° C

丙烯酸4-羥丁酯(4HBA):-32℃ 4-hydroxybutyl acrylate (4HBA): -32 ° C

丙烯酸2-羥乙酯(HEA):-15℃ 2-Hydroxyethyl acrylate (HEA): -15 ° C

丙烯酸(AA):106℃ Acrylic acid (AA): 106 ° C

N-乙烯吡咯啶酮(NVP):80℃ N-vinylpyrrolidone (NVP): 80 ° C

二乙基丙烯醯胺(DEAA):81℃ Diethyl acrylamide (DEAA): 81 ° C

再者,文獻值係參照「丙烯酸樹脂之合成.設計與新用途展開」(中央經營開發中心出版部發行)及「Polymer Handbook」(John Wiley&Sons)。 In addition, the literature values refer to "Synthesis of Acrylic Resin, Design and New Use" (published by the Central Business Development Center Publishing Department) and "Polymer Handbook" (John Wiley & Sons).

<表面電阻率之測量> <Measurement of surface resistivity>

於溫度23℃、溼度50%RH之環境氣體下,使用電阻率計(三菱化學ANALYTECH製,Hiresta UP MCP-HT450型),依據JIS-K-6911測量表面電阻率。 The surface resistivity was measured in accordance with JIS-K-6911 using a resistivity meter (manufactured by Mitsubishi Chemical Corporation, HILYSTA UP MCP-HT450 type) under an ambient gas having a temperature of 23 ° C and a humidity of 50% RH.

再者,本發明中之抗靜電層表面所測量的表面電阻率(Ω/□)於以下各條件下,以小於1.0×1011為佳,較佳者為小於5.0×1010,更佳者是小於1.0×1010,條件係:塗敷後(初期)於室溫(23℃×50%RH)中直接照射螢光燈之光(400勒克司)的環境下放置1個月(30天)後(經時),再於23℃×50%RH環境下照射紫外線(高壓水銀燈,累積光量:4000mJ/cm2,照射時間:30秒)並靜置後(UV照射)。顯示前述範圍內之表面電阻率的表面保護薄膜可較佳地作為例如,如液晶單元或半導體裝置等不耐靜電之物品的加工或搬運過程等所使用之表面保護薄膜使用。再者,塗敷後係 指塗敷抗靜電劑組成物(溶液)並乾燥,形成抗靜電層後之意。以下係相同。 Furthermore, the surface resistivity (Ω/□) measured on the surface of the antistatic layer in the present invention is preferably less than 1.0 × 10 11 , more preferably less than 5.0 × 10 10 , more preferably under the following conditions. It is less than 1.0×10 10 , and the condition is: after application (initial), it is placed in the environment of direct irradiation of fluorescent light (400 lux) at room temperature (23 ° C × 50% RH) for 1 month (30 days). After (time), ultraviolet rays (high pressure mercury lamp, cumulative light amount: 4000 mJ/cm 2 , irradiation time: 30 seconds) were further irradiated in an environment of 23 ° C × 50% RH and left to stand (UV irradiation). The surface protective film which exhibits the surface resistivity in the above range can be preferably used as, for example, a surface protective film used for processing or handling of an object which is not resistant to static electricity such as a liquid crystal cell or a semiconductor device. Further, after application, it means that the antistatic agent composition (solution) is applied and dried to form an antistatic layer. The following are the same.

<印字性(印字密著性)之評定> <Identification (printing adhesion) evaluation>

於23℃×50%RH之測量環境下使用Shachihata社製X Stamper,於抗靜電層表面上施行印字後,自該印字上方貼附Nichiban社製之商品名CELLOTAPE(登錄商標),接著,以剝離速度30m/min、剝離角度180度之條件剝離。之後,目視觀察剝離後之表面,將印字面積之50%以上被剝離的情形評定為×(印字性不良)、印字面積之50%以上未剝離而殘留的情形評定為○(印字性良好)。 After printing on the surface of the antistatic layer using a X Stamper manufactured by Shachihata Co., Ltd. under the measurement environment of 23 ° C × 50% RH, the product name CELLOTAPE (registered trademark) manufactured by Nichiban Co., Ltd. was attached from the top of the printing, and then peeled off. The condition was peeled off at a speed of 30 m/min and a peeling angle of 180 degrees. After that, the surface after peeling was visually observed, and the case where 50% or more of the printing area was peeled off was evaluated as × (printing failure), and 50% or more of the printing area was not peeled off and remained as ○ (printing property was good).

<背面剝離力之測量> <Measurement of back peeling force>

將各例之表面保護薄膜切割成寬度70mm、長度100mm的大小,再將Nichiban社製之商品名CELLOTAPE(登錄商標)(寬24mm,橡膠系黏著膠帶)、或日東電工社製之商品名No.31B(寬19mm,丙烯酸系黏著膠帶),以0.25MPa之壓力、0.3m/min之速度壓附黏著於表面保護薄膜之抗靜電層(背面層)上。將其於23℃×50%RH之環境下放置30分鐘後,於相同環境下以剝離速度0.3m/min、剝離角度180度剝離,測量此時之背面剝離力(N/24mm:對CELLOTAPE、或N/19mm:對No.31B)。 The surface protective film of each example was cut into a width of 70 mm and a length of 100 mm, and the brand name CELLOTAPE (registered trademark) (width 24 mm, rubber-based adhesive tape) manufactured by Nichiban Co., Ltd., or the trade name No. manufactured by Nitto Denko Corporation was used. 31B (19 mm wide, acrylic adhesive tape) was pressure-bonded to the antistatic layer (back layer) of the surface protective film at a pressure of 0.25 MPa and a speed of 0.3 m/min. After leaving it in an environment of 23 ° C × 50% RH for 30 minutes, it was peeled off at a peeling speed of 0.3 m/min and a peeling angle of 180 degrees in the same environment, and the back peeling force at this time was measured (N/24 mm: for CELLOTAPE, Or N/19mm: for No. 31B).

再者,本發明中之背面剝離力(N/24mm:對CELLOTAPE)以1~15N/24mm為佳,較佳者為2~13N/24mm,更佳者是3~10N/24mm。又,背面剝離力(N/19mm:對No.31B)以1~15N/19mm為佳,較佳者為2~13N/19mm,更佳 者是3~10N/19mm。超出前述範圍內,背面剝離力過輕(過低)時,抽取式膠帶將不會附著於表面保護薄膜背面,未能剝離表面保護薄膜,背面剝離力過高時,將不易從表面保護薄膜剝離抽取式膠帶而不佳。 Further, the back peeling force (N/24 mm: for CELLOTAPE) in the present invention is preferably 1 to 15 N/24 mm, preferably 2 to 13 N/24 mm, and more preferably 3 to 10 N/24 mm. Further, the back peeling force (N/19 mm: for No. 31B) is preferably 1 to 15 N/19 mm, more preferably 2 to 13 N/19 mm, more preferably It is 3~10N/19mm. If the back surface peeling force is too light (too low), the removable tape will not adhere to the back surface of the surface protective film, and the surface protective film will not be peeled off. When the back surface peeling force is too high, it will not be easily peeled off from the surface protective film. The removable tape is not good.

<滑動性(動摩擦力)之測量> <Measurement of slidability (dynamic friction)>

準備將表面保護薄膜切割成寬度70mm、長度100mm大小,貼合於壓克力板(三菱RAYON社製,商品名「ACRYLATE」,厚度:1mm、寬度:70mm、長度:100mm)的試驗片。將該試驗片之背面(抗靜電層表面)朝下,置於保持為水平的平滑PET薄膜上,於該試驗片上放上1.5kg的負載。使用無伸縮性之線將前述載有負載之試驗片裝附於拉伸試驗機,於測量溫度25℃中以拉伸速度300mm/min、拉伸距離300mm之條件水平地拉伸試驗片,求出施加於試驗片之動摩擦力(N)的平均值(n=3)。 The surface protective film was cut into a test piece having a width of 70 mm and a length of 100 mm and bonded to an acrylic plate (trade name "ACRYLATE", manufactured by Mitsubishi Rayon Co., Ltd., thickness: 1 mm, width: 70 mm, length: 100 mm). The back surface of the test piece (the surface of the antistatic layer) was placed face down on a smooth PET film which was kept horizontal, and a load of 1.5 kg was placed on the test piece. The test piece loaded with the load was attached to a tensile tester using a non-stretchable wire, and the test piece was horizontally stretched at a measurement temperature of 25 ° C at a tensile speed of 300 mm/min and a tensile distance of 300 mm. The average value (n=3) of the dynamic frictional force (N) applied to the test piece was taken.

再者,本發明中之滑動性(動摩擦力)(N)以2~5為佳,較佳者為2~4.8以下,更佳者是3~4.5以下。位於前述範圍內時,在處理貼附有表面保護薄膜之被著體時,可期兼具表面保護薄膜背面(抗靜電層表面)之滑動性良好、及背面剝離力(黏著力),由作業性來看係為有利。 Further, the slidability (dynamic friction) (N) in the present invention is preferably 2 to 5, more preferably 2 to 4.8 or less, and still more preferably 3 to 4.5 or less. When it is located in the above range, when the object to which the surface protective film is attached is treated, it is possible to have both the slidability of the back surface of the surface protective film (the surface of the antistatic layer) and the back peeling force (adhesion). Sexuality is beneficial.

<耐溶劑性(外觀)> <Solvent resistance (appearance)>

以浸染有乙醇之BEMCOT(旭化成紡織社製)來回擦拭各例之表面保護薄膜的抗靜電層(背面層)10次,以目視觀察其外觀變化,將脫離有抗靜電層之情形評定為×、將未脫離抗靜電層之情形評定為○。 The antistatic layer (back layer) of the surface protective film of each example was wiped back and forth 10 times with BEMCOT (manufactured by Asahi Kasei Textile Co., Ltd.) impregnated with ethanol, and the appearance change was visually observed, and the case where the antistatic layer was separated was evaluated as ×, The case where the antistatic layer was not separated was evaluated as ○.

<耐溶劑性(表面電阻率之測量)> <Solvent resistance (measurement of surface resistivity)>

以浸染有乙醇之BEMCOT(旭化成紡織社製)來回擦拭各例之表面保護薄膜的抗靜電層(背面層)10次,於溫度23℃、溼度50%RH之環境氣體下,使用電阻率計(三菱化學ANALYTECH製,Hiresta UP MCP-HT450型)依據JIS-K-6911測量表面電阻率。 The antistatic layer (back layer) of each surface protective film was wiped back and forth 10 times with BEMCOT (manufactured by Asahi Kasei Textile Co., Ltd.) impregnated with ethanol, and a resistivity meter was used under ambient gas at a temperature of 23 ° C and a humidity of 50% RH. Mitsubishi Chemical ANALYTECH, Hiresta UP MCP-HT450 type) measures surface resistivity according to JIS-K-6911.

再者,本發明中之抗靜電層表面所測量的表面電阻率(Ω/□)以小於1.0×1011為佳,較佳者為小於5.0×1010,更佳者是小於1.0×1010。顯示前述範圍內之表面電阻率的表面保護薄膜可較佳地利用作為液晶單元或半導體裝置等不耐靜電之物品的加工或搬運過程等中所使用的表面保護薄膜,例如,於為擦除表面保護薄膜上之髒汙而以乙醇擦拭時,仍可抑制表面電阻率為低。 Further, the surface resistivity (Ω/□) measured on the surface of the antistatic layer in the present invention is preferably less than 1.0 × 10 11 , preferably less than 5.0 × 10 10 , more preferably less than 1.0 × 10 10 . The surface protective film which exhibits the surface resistivity in the above range can preferably be used as a surface protective film used in processing or handling processes of an electrostatically resistant article such as a liquid crystal cell or a semiconductor device, for example, for erasing a surface. When the protective film is dirty and wiped with ethanol, the surface resistivity can be suppressed to be low.

<偏光板剝離靜電位(偏光板側)之測量> <Measurement of polarizing plate peeling electrostatic potential (polarizing plate side)>

將各例之表面保護薄膜1切成寬度70mm、長度130mm大小,剝離剝離襯墊後,如圖2所示,於貼合在預先除電之壓克力板10(三菱RAYON社製,商品名「ACRYLATE」,厚度:1mm、寬度:70mm、長度:100mm)的偏光板20(日東電工社製,SEG1423DU偏光板、寬度:70mm、長度:100mm)表面以手墨輥壓附表面保護薄膜1使其一邊之端部自偏光板20之端部突出30mm。 The surface protective film 1 of each example was cut into a width of 70 mm and a length of 130 mm, and after peeling off the release liner, as shown in Fig. 2, the acrylic sheet 10 (manufactured by Mitsubishi Rayon Co., Ltd., trade name " ACRYLATE, thickness: 1 mm, width: 70 mm, length: 100 mm) The polarizing plate 20 (made by Nitto Denko Co., Ltd., SEG1423DU polarizing plate, width: 70 mm, length: 100 mm), the surface protective film 1 was pressed by a hand roller. The end of one side protrudes 30 mm from the end of the polarizing plate 20.

將該試樣於23℃×50%RH之環境下放置1天後,固定於高度20mm之試樣固定台30的預定位置。以自動捲取機(未圖示)固定自偏光板20突出30mm之表面保護薄膜1的端 部,以剝離角度150°、剝離速度10m/min剝離。此時產生之被著體(偏光板)表面的電位係以固定於自偏光板20中央起高度100mm之位置的電位測量器40(春日電機社製,型式「KSD-0103」)測量「初期之偏光板剝離靜電位」。測量係於23℃、50%RH之環境下進行。 The sample was allowed to stand in an environment of 23 ° C × 50% RH for one day, and then fixed to a predetermined position of the sample fixing table 30 having a height of 20 mm. The end of the surface protective film 1 which protrudes from the polarizing plate 20 by 30 mm is fixed by an automatic winder (not shown) The part was peeled off at a peeling angle of 150° and a peeling speed of 10 m/min. The potential of the surface of the object (polarizing plate) which is generated at this time is measured by a potential measuring device 40 (type "KSD-0103" manufactured by Kasuga Electric Co., Ltd.) which is fixed at a height of 100 mm from the center of the polarizing plate 20. The polarizing plate peels off the electrostatic potential." The measurement was carried out in an environment of 23 ° C and 50% RH.

又,於室溫(23℃×50%RH)且直接照射螢光燈之光(400勒克司)的環境下放置1個月(30天)後,與「初期之偏光板剝離靜電位」相同地,測量「經時之偏光板剝離靜電位」,於23℃×50%RH之環境下照射紫外線(高壓水銀燈,累積光量:4000mJ/cm2,照射時間:30秒)後,測量「照射UV後之偏光板剝離靜電位」,該等測量係於23℃×50%RH之環境下進行。 In addition, after leaving it at room temperature (23 ° C × 50% RH) and directly irradiating the light of a fluorescent lamp (400 lux) for one month (30 days), it is the same as the "dissociation of the polarizing plate of the initial polarizing plate". Ground, measuring the "dissociation of the polarizing plate over time", irradiating ultraviolet rays (high-pressure mercury lamp, cumulative light amount: 4000 mJ/cm 2 , irradiation time: 30 seconds) in an environment of 23 ° C × 50% RH, and measuring "irradiation UV" The polarizing plate was then stripped of the electrostatic potential, and the measurements were carried out in an environment of 23 ° C × 50% RH.

再者,偏光板剝離靜電位係來自於構成本發明之表面保護薄膜之抗靜電層及黏著劑層的剝離靜電位,有助於抗靜電性。 Further, the polarizing plate peeling electrostatic level is derived from the peeling electrostatic potential of the antistatic layer and the adhesive layer constituting the surface protective film of the present invention, and contributes to antistatic property.

本發明中之偏光板剝離靜電位(kV)(絕對值、初期、經時、照射UV後全部)以0.6以下為佳,較佳者為0.5以下,更佳者是0.4以下。於前述範圍內時,例如,可防止液晶顯示驅動等之損傷而成為較佳態樣。 In the polarizing plate of the present invention, the electrostatic potential (kV) (absolute value, initial value, time, and UV exposure) is preferably 0.6 or less, preferably 0.5 or less, and more preferably 0.4 or less. When it is in the above range, for example, it is possible to prevent damage such as liquid crystal display driving, and it is preferable.

<膜側剝離靜電位(表面保護薄膜之抗靜電層側)之測量> <Measurement of film side peeling electrostatic potential (antistatic layer side of surface protective film)>

與前述偏光板剝離靜電位之測量相同,以剝離角度150°、剝離速度10m/min將表面保護薄膜1自偏光板20表面剝離。此時產生之表面保護薄膜1的電位係以固定於自該 表面保護薄膜1中央起高度100mm之位置的電位測量器40(春日電機社製,型式「KSD-0103」)測量「初期之膜側剝離靜電位」。測量係於23℃、50%RH之環境下進行。 The surface protective film 1 was peeled off from the surface of the polarizing plate 20 at a peeling angle of 150° and a peeling speed of 10 m/min, as in the measurement of the peeling electrostatic potential of the polarizing plate. The potential of the surface protective film 1 generated at this time is fixed to The potential measuring device 40 (type "KSD-0103" manufactured by Kasuga Electric Co., Ltd.) at a position of a height of 100 mm in the center of the surface protective film 1 measures "initial film side peeling electrostatic potential". The measurement was carried out in an environment of 23 ° C and 50% RH.

又,於室溫(23℃×50%RH)且直接照射螢光燈之光(400勒克司)的環境下放置1個月(30天間)後,與「初期之膜側剝離靜電位」相同地,測量「經時之膜側剝離靜電位」,於23℃×50%RH之環境下照射紫外線(高壓水銀燈,累積光量:4000mJ/cm2,照射時間:30秒)後,測量「UV照射後之膜側剝離靜電位」,該等測量係於23℃×50%RH的環境下進行。 In addition, after leaving it at room temperature (23 ° C × 50% RH) and directly irradiating the light of the fluorescent lamp (400 lux) for one month (within 30 days), the "electrode position at the initial film side is peeled off". Similarly, the "film-side peeling electrostatic potential" was measured, and ultraviolet rays were irradiated in an environment of 23 ° C × 50% RH (high-pressure mercury lamp, cumulative light amount: 4000 mJ/cm 2 , irradiation time: 30 seconds), and then "UV was measured. The film side peeled off the electrostatic potential after the irradiation, and the measurement was performed in an environment of 23 ° C × 50% RH.

再者,膜側剝離靜電位係來自於構成本發明之表面保護薄膜之抗靜電層的剝離靜電位,有助於抗靜電性。 Further, the film side peeling electrostatic level is derived from the peeling electrostatic potential of the antistatic layer constituting the surface protective film of the present invention, and contributes to antistatic property.

本發明中之膜側剝離靜電位(kV)(絕對值、初期、經時、照射UV後全部)以0.6以下為佳,較佳者為0.5以下,更佳者是0.4以下。於前述範圍內時,因剝離後之表面保護薄膜未帶電,作業性優異,故成為較佳態樣。 In the present invention, the film side peeling electrostatic potential (kV) (absolute value, initial period, time, and UV exposure) is preferably 0.6 or less, preferably 0.5 or less, and more preferably 0.4 or less. When it is in the above range, the surface protective film after peeling is not charged, and workability is excellent, so that it is preferable.

<抗靜電層A用水分散液之調製> <Preparation of Antistatic Layer A with Water Dispersion>

令黏合劑為聚酯樹脂VYLONAL MD-1480(25%水溶液,東洋紡織社製),導電性聚合物為聚苯胺磺酸(aqua-PASS,重量平均分子量4萬,三菱RAYON社製)及聚(3,4-乙二氧基噻吩)(PEDOT)/聚苯乙烯磺酸(PSS)(Baytron P、H,C,Starck社製),交聯劑為經二異丙胺嵌段之六亞甲基二異氰酸酯的異三聚氰酸體,潤滑劑為脂肪酸醯胺之油酸醯胺;於水/乙醇(1/1)之混合溶劑中添加固體成分量計 100質量份之黏合劑、固體成分量計80質量份之聚苯胺磺酸、固體成分量計20質量份之PEDOT/PSS、固體成分量計10質量份之交聯劑、固體成分量計10質量份之潤滑劑,攪拌約20分鐘使其等充分地混合。如此,調製NV約0.4%之抗靜電層A用水分散液。 The binder is a polyester resin VYLONAL MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.), and the conductive polymer is polyaniline sulfonic acid (aqua-pass, weight average molecular weight 40,000, manufactured by Mitsubishi Rayon Co., Ltd.) and poly( 3,4-ethylenedioxythiophene) (PEDOT) / polystyrenesulfonic acid (PSS) (Baytron P, H, C, manufactured by Starck), the cross-linking agent is a hexamethylene group of diisopropylamine block a hetero-isocyanate of a diisocyanate, the lubricant is a decylamine oleate of a fatty acid decylamine; a solid component meter is added to a mixed solvent of water/ethanol (1/1) 100 parts by mass of a binder, 80 parts by mass of a polyaniline sulfonic acid, a solid content meter of 20 parts by mass of PEDOT/PSS, a solid content meter of 10 parts by mass of a crosslinking agent, and a solid content meter 10 mass The lubricant is stirred for about 20 minutes to allow it to be thoroughly mixed. Thus, an aqueous dispersion of the antistatic layer A having an NV of about 0.4% was prepared.

<抗靜電層B用水分散液之調製> <Preparation of Antistatic Layer B with Water Dispersion>

令黏合劑為聚酯樹脂VYLONAL MD-1480(25%水溶液,東洋紡織社製),導電性聚合物為聚苯胺磺酸(aqua-PASS,重量平均分子量4萬,三菱RAYON社製)及聚(3,4-乙二氧基噻吩)(PEDOT)/聚苯乙烯磺酸(PSS)(Baytron P、H,C,Starck社製),交聯劑為甲氧基化羥甲基三聚氰胺,潤滑劑為聚矽氧系潤滑劑之甲醇改質聚二甲基矽氧烷(BY16-201、TORAY(Dow Corning社製);於水/乙醇(1/1)之混合溶劑中添加固體成分量計100質量份之黏合劑、固體成分量計45質量份之聚苯胺磺酸、固體成分量計30質量份之PEDOT/PSS、固體成分量計10質量份之交聯劑、固體成分量計10質量份之潤滑劑,攪拌約20分鐘使其等充分地混合。如此,調製NV約0.4%之抗靜電層B用水分散液。 The binder is a polyester resin VYLONAL MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.), and the conductive polymer is polyaniline sulfonic acid (aqua-pass, weight average molecular weight 40,000, manufactured by Mitsubishi Rayon Co., Ltd.) and poly( 3,4-ethylenedioxythiophene) (PEDOT) / polystyrenesulfonic acid (PSS) (Baytron P, H, C, manufactured by Starck), the crosslinking agent is methoxylated methylol melamine, lubricant Methanol-modified polydimethyl siloxane (polystyrene-based lubricant) (BY16-201, TORAY (manufactured by Dow Corning); solid content meter 100 in a mixed solvent of water/ethanol (1/1) 50 parts by mass of the polyaniline sulfonic acid, 30 parts by mass of the PEDOT/PSS of the solid content meter, 10 parts by mass of the cross-linking agent of the solid content meter, and 10 parts by mass of the solid content meter The lubricant was stirred for about 20 minutes to be sufficiently mixed, etc. Thus, an aqueous dispersion of the antistatic layer B having an NV of about 0.4% was prepared.

<抗靜電層C用水分散液之調製> <Preparation of Antistatic Layer C with Water Dispersion>

令黏合劑為聚酯樹脂VYLONAL MD-1480(25%水溶液,東洋紡織社製),導電性聚合物為聚苯胺磺酸(aqua-PASS,重量平均分子量4萬,三菱RAYON社製)及聚(3,4-乙二氧基噻吩)(PEDOT)/聚苯乙烯磺酸(PSS)(Baytron P、H,C,Starck社製),交聯劑為經二異丙胺嵌段之六亞甲 基二異氰酸酯的異三聚氰酸體、及甲氧基化羥甲基三聚氰胺,潤滑劑為氟系潤滑劑之含氟嵌段共聚物(MODIPER F200,日油社製);於水/乙醇(1/1)之混合溶劑中添加固體成分量計100質量份之黏合劑、固體成分量計25質量份之聚苯胺磺酸、固體成分量計25質量份之PEDOT/PSS、固體成分量計10質量份之各交聯劑、固體成分量計10質量份之潤滑劑,攪拌約20分鐘使其等充分地混合。如此,調製NV約0.4%之抗靜電層C用水分散液。 The binder is a polyester resin VYLONAL MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.), and the conductive polymer is polyaniline sulfonic acid (aqua-pass, weight average molecular weight 40,000, manufactured by Mitsubishi Rayon Co., Ltd.) and poly( 3,4-ethylenedioxythiophene) (PEDOT) / polystyrenesulfonic acid (PSS) (Baytron P, H, C, manufactured by Starck), cross-linking agent is diammonium block of hexamethylene A hetero-isocyanate of a diisocyanate and a methoxymethylol melamine, and the lubricant is a fluorine-containing block copolymer of a fluorine-based lubricant (MODIPER F200, manufactured by Nippon Oil Co., Ltd.); in water/ethanol ( To the mixed solvent of 1/1), a binder of 100 parts by mass of a solid content meter, a mass fraction of 25 parts by mass of polyaniline sulfonic acid, a solid content meter of 25 parts by mass of PEDOT/PSS, and a solid content meter 10 are added. Each part of the crosslinking agent and the solid content of 10 parts by mass of the lubricant were stirred for about 20 minutes to be sufficiently mixed. Thus, an aqueous dispersion of the antistatic layer C having an NV of about 0.4% was prepared.

<抗靜電層D用水分散液之調製> <Preparation of Antistatic Layer D with Water Dispersion>

令黏合劑為聚酯樹脂VYLONAL MD-1480(25%水溶液、東洋紡織社製),導電性聚合物為聚苯胺磺酸(aqua-PASS,重量平均分子量4萬,三菱RAYON社製)及聚(3,4-乙二氧基噻吩)(PEDOT)/聚苯乙烯磺酸(PSS)(Baytron P、H,C,Starck社製),交聯劑為甲氧基化羥甲基三聚氰胺,潤滑劑為蠟系潤滑劑之棕櫚蠟;於水/乙醇(1/1)之混合溶劑中添加固體成分量計100質量份之黏合劑、固體成分量計20質量份之聚苯胺磺酸、固體成分量計80質量份之PEDOT/PSS、固體成分量計10質量份之交聯劑、固體成分量計20質量份之潤滑劑,攪拌約20分鐘使其等充分地混合。如此,調製NV約0.4%之抗靜電層D用水分散液。 The binder is a polyester resin VYLONAL MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.), and the conductive polymer is polyaniline sulfonic acid (aqua-pass, weight average molecular weight 40,000, manufactured by Mitsubishi Rayon Co., Ltd.) and poly( 3,4-ethylenedioxythiophene) (PEDOT) / polystyrenesulfonic acid (PSS) (Baytron P, H, C, manufactured by Starck), the crosslinking agent is methoxylated methylol melamine, lubricant a palm wax of a wax-based lubricant; a binder of 100 parts by mass of a solid content meter, a mass fraction of 20 parts by mass of polyaniline sulfonic acid, and a solid content in a mixed solvent of water/ethanol (1/1) 80 parts by mass of PEDOT/PSS, a solid content meter of 10 parts by mass of a crosslinking agent, and a solid content of 20 parts by mass of a lubricant were stirred for about 20 minutes to be sufficiently mixed. Thus, an aqueous dispersion of the antistatic layer D having an NV of about 0.4% was prepared.

<抗靜電層K用水分散液之調製> <Preparation of antistatic layer K with water dispersion>

令黏合劑為丙烯酸樹脂(甲基丙烯酸甲酯/丙烯酸正丁酯/甲基丙烯酸環己酯=6/2/1之共聚物),導電性聚合物為聚苯胺磺酸(aqua-PASS,重量平均分子量4萬,三菱 RAYON社製)及聚(3,4-乙二氧基噻吩)(PEDOT)/聚苯乙烯磺酸(PSS)(Baytron P、H,C,Starck社製),交聯劑為甲氧基化羥甲基三聚氰胺;於水/乙醇(1/1)之混合溶劑中添加固體成分量計100質量份之黏合劑、固體成分量計25質量份之聚苯胺磺酸、固體成分量計75質量份之PEDOT/PSS、固體成分量計10質量份之交聯劑,攪拌約20分鐘使其等充分地混合。如此,調製NV約0.4%之抗靜電層K用水分散液。 The adhesive is acrylic resin (methyl methacrylate / n-butyl acrylate / cyclohexyl methacrylate = 6 / 2 / 1 copolymer), conductive polymer is polyaniline sulfonic acid (aqua-PASS, weight Average molecular weight of 40,000, Mitsubishi RAYON Co., Ltd.) and poly(3,4-ethylenedioxythiophene) (PEDOT)/polystyrenesulfonic acid (PSS) (Baytron P, H, C, manufactured by Starck), methoxylation of a crosslinking agent Methylol melamine; 100 parts by mass of a solid content meter binder, 25 parts by mass of polyaniline sulfonic acid, and 75 parts by mass of a solid content meter in a mixed solvent of water/ethanol (1/1) The PEDOT/PSS and the solid content meter were mixed with 10 parts by mass of a crosslinking agent, and the mixture was stirred for about 20 minutes to be sufficiently mixed. Thus, an aqueous dispersion of the antistatic layer K of about 0.4% of NV was prepared.

<抗靜電層E~J用水分散液之調製> <Preparation of antistatic layer E~J with water dispersion>

又,依據表1之摻合內容,以與前述抗靜電層A~D用水分散液之調製方法相同的方式得到抗靜電層E~J用水分散液。 Further, according to the blending contents of Table 1, the aqueous dispersion of the antistatic layer E to J was obtained in the same manner as the preparation method of the above-mentioned antistatic layer A to D aqueous dispersion.

<抗靜電層L用水分散液之調製> <Preparation of Antistatic Layer L with Water Dispersion>

令黏合劑為聚酯樹脂VYLONAL MD-1480(25%水溶液,東洋紡織社製),導電性聚合物為聚苯胺磺酸(aqua-PASS,重量平均分子量4萬,三菱RAYON社製)及聚(3,4-乙二氧基噻吩)(PEDOT)/聚苯乙烯磺酸(PSS)(Baytron P、H,C,Starck社製),交聯劑為經二異丙胺嵌段之六亞甲基二異氰酸酯的異三聚氰酸體,潤滑劑為氟系潤滑劑之含氟嵌段共聚物(MODIPER F200,日油社製);於水/乙醇(1/1)之混合溶劑中添加固體成分量計100質量份之黏合劑、固體成分量計25質量份之聚苯胺磺酸、固體成分量計25質量份之PEDOT/PSS、固體成分量計10質量份之交聯劑、固體成分量計170質量份之潤滑劑,攪拌約20分鐘使其等充分地混合。如此,調製NV約0.4%之抗靜電層L用水 分散液。 The binder is a polyester resin VYLONAL MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.), and the conductive polymer is polyaniline sulfonic acid (aqua-pass, weight average molecular weight 40,000, manufactured by Mitsubishi Rayon Co., Ltd.) and poly( 3,4-ethylenedioxythiophene) (PEDOT) / polystyrenesulfonic acid (PSS) (Baytron P, H, C, manufactured by Starck), the cross-linking agent is a hexamethylene group of diisopropylamine block A hetero-isocyanate of a diisocyanate, a lubricant is a fluorine-containing block copolymer of a fluorine-based lubricant (MODIPER F200, manufactured by Nippon Oil Co., Ltd.); and a solid component is added to a mixed solvent of water/ethanol (1/1) 100 parts by mass of a binder, 25 parts by mass of a polyaniline sulfonic acid, a solid content meter of 25 parts by mass of PEDOT/PSS, a solid content meter of 10 parts by mass of a crosslinking agent, and a solid content meter 170 parts by mass of the lubricant was stirred for about 20 minutes to allow it to be thoroughly mixed. Thus, the antistatic layer L with a NV of about 0.4% is prepared. Dispersions.

<抗靜電層M用水分散液之調製> <Preparation of Antistatic Layer M with Water Dispersion>

令黏合劑為聚酯樹脂VYLONAL MD-1480(25%水溶液,東洋紡織社製),導電性聚合物為聚苯胺(重量平均分子量1.5萬,Aldrich社製)及聚(3,4-乙二氧基噻吩)(PEDOT)/聚苯乙烯磺酸(PSS)(Baytron P、H,C,Starck社製),交聯劑為甲氧基化羥甲基三聚氰胺,潤滑劑為作為蠟系潤滑劑之棕櫚蠟;於水/乙醇(1/1)之混合溶劑中添加固體成分量計100質量份之黏合劑、固體成分量計10質量份之聚苯胺、固體成分量計90質量份之PEDOT/PSS、固體成分量計10質量份之交聯劑、固體成分量計20質量份之潤滑劑,攪拌約20分鐘使其等充分地混合。如此,調製NV約0.4%之抗靜電層M用水分散液。 The binder was a polyester resin VYLONAL MD-1480 (25% aqueous solution, manufactured by Toyobo Co., Ltd.), and the conductive polymer was polyaniline (weight average molecular weight: 15,000, manufactured by Aldrich Co., Ltd.) and poly(3,4-ethylenedioxygen). Thiophene) (PEDOT) / polystyrene sulfonic acid (PSS) (Baytron P, H, C, manufactured by Starck), the crosslinking agent is methoxylated methylol melamine, and the lubricant is used as a wax-based lubricant. Palmitol wax; 100 parts by mass of a solid content meter binder, 10 parts by mass of polyaniline, and 90 parts by mass of PEDOT/PSS of a solid content meter in a mixed solvent of water/ethanol (1/1) A solid content metering agent of 10 parts by mass of a crosslinking agent or a solid content of 20 parts by mass of a lubricant was stirred for about 20 minutes to be sufficiently mixed. Thus, an aqueous dispersion of the antistatic layer M having an NV of about 0.4% was prepared.

<黏著劑層用之丙烯酸系聚合物1的調製> <Preparation of Acrylic Polymer 1 for Adhesive Layer>

於具有攪拌葉片、溫度計、氮氣導入管、冷卻器之四頸燒瓶中,饋入100質量份之2-乙基己基丙烯酸酯(2EHA)、4質量份之2-羥基乙基丙烯酸酯(HEA)、0.2質量份之作為聚合起始劑的2,2’-偶氮雙異丁腈、157質量份之乙酸乙酯,一面緩慢地攪拌一面導入氮氣,維持燒瓶內之液溫為65℃左右進行聚合反應6小時,調製丙烯酸系聚合物1溶液(40質量%)。前述丙烯酸系聚合物1之重量平均分子量係54萬、玻璃轉移溫度(Tg)係-68℃。 100 parts by mass of 2-ethylhexyl acrylate (2EHA) and 4 parts by mass of 2-hydroxyethyl acrylate (HEA) were fed into a four-necked flask equipped with a stirring blade, a thermometer, a nitrogen introduction tube, and a cooler. 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator, and 157 parts by mass of ethyl acetate, and nitrogen gas was introduced while slowly stirring, and the liquid temperature in the flask was maintained at about 65 °C. The polymerization reaction was carried out for 6 hours to prepare an acrylic polymer 1 solution (40% by mass). The acrylic polymer 1 had a weight average molecular weight of 540,000 and a glass transition temperature (Tg) of -68 °C.

<黏著劑層用之丙烯酸系聚合物8的調製> <Preparation of Acrylic Polymer 8 for Adhesive Layer>

於具有攪拌羽根、溫度計、氮氣導入管、冷卻器之四 頸燒瓶中,饋入100質量份之2-乙基己基丙烯酸酯(2EHA)、10質量份之4-羥基丙烯酸丁酯(4HBA)、0.02質量份之丙烯酸(AA)、0.1質量份之N-乙烯吡咯啶酮(NVP)、0.2質量份之作為聚合起始劑的2,2’-偶氮雙異丁腈、157質量份之乙酸乙酯,一面緩慢地攪拌一面導入氮氣,維持燒瓶內之液溫為65℃左右進行聚合反應6小時,調製丙烯酸系聚合物8溶液(40質量%)。前述丙烯酸系聚合物8之重量平均分子量係54萬、玻璃轉移溫度(Tg)係-67℃。 With stirring feather root, thermometer, nitrogen inlet tube, cooler In the neck flask, 100 parts by mass of 2-ethylhexyl acrylate (2EHA), 10 parts by mass of 4-hydroxybutyl acrylate (4HBA), 0.02 parts by mass of acrylic acid (AA), and 0.1 part by mass of N- were fed. Vinylpyrrolidone (NVP), 0.2 parts by mass of 2,2'-azobisisobutyronitrile as a polymerization initiator, and 157 parts by mass of ethyl acetate, while introducing nitrogen gas while slowly stirring, maintaining the inside of the flask The polymerization was carried out for 6 hours at a liquid temperature of about 65 ° C to prepare an acrylic polymer 8 solution (40% by mass). The acrylic polymer 8 had a weight average molecular weight of 540,000 and a glass transition temperature (Tg) of -67 °C.

<黏著劑層用之丙烯酸系聚合物2~7、9及10的調製> <Preparation of Acrylic Polymers 2 to 7, 9 and 10 for Adhesive Layer>

以與前述黏著劑層用之丙烯酸系聚合物1或8的調製方法相同的方式得到丙烯酸系聚合物2~7、9及10。再者,單體成分以外之成分係與丙烯酸系聚合物1摻合相同份量。 Acrylic polymers 2 to 7, 9 and 10 were obtained in the same manner as in the preparation of the acrylic polymer 1 or 8 for the above-mentioned pressure-sensitive adhesive layer. Further, the components other than the monomer component are blended in the same amount as the acrylic polymer 1.

<黏著劑層用之丙烯酸系黏著劑1溶液的調製> <Preparation of Acrylic Adhesive 1 Solution for Adhesive Layer>

以乙酸乙酯將前述丙烯酸系聚合物1溶液(40質量%)稀釋成20質量%,並於該溶液500質量份(固體成分100質量份)中添加3.5質量份(固體成分3.5質量份)之交聯劑六亞甲基二異氰酸酯的異三聚氰酸體(日本聚胺基甲酸酯工業社製,CoronateHX:C/HX)、3質量份(固體成分0.03質量份)之交聯觸媒二月桂酸二丁錫(1質量%乙酸乙酯溶液)後進行混合攪拌,調製丙烯酸系黏著劑1溶液。 The acrylic polymer 1 solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and 3.5 parts by mass (solid content: 3.5 parts by mass) was added to 500 parts by mass of the solution (100 parts by mass of the solid component). Cross-linking catalyst of a cross-linked hexamethylene diisocyanate isomeric cyanuric acid (manufactured by Nippon Polycarbonate Co., Ltd., Coronate HX: C/HX) and 3 parts by mass (solid content: 0.03 parts by mass) Dibutyltin dilaurate (1% by mass ethyl acetate solution) was mixed and stirred to prepare an acrylic adhesive 1 solution.

<黏著劑層用之丙烯酸系黏著劑10溶液的調製> <Preparation of Acrylic Adhesive 10 Solution for Adhesive Layer>

以乙酸乙酯將前述丙烯酸系聚合物10溶液(40質量%)稀釋成20質量%,並於該溶液500質量份(固體成分100質量 份)中添加經乙酸乙酯稀釋成10%之有機聚矽氧烷(KF-353、信越化學工業社製)溶液2質量份(固體成分0.2質量份)、15質量份(固體成分0.15質量份)之作為抗靜電成分之鹼金屬鹽即經乙酸乙酯稀釋成1%之鋰雙(三氟甲烷碸)醯亞胺(LiN(CF3SO2)2:LiTFSI,東京化成工業社製)溶液、1.0質量份(固體成分1.0質量份)之交聯劑六亞甲基二異氰酸酯的異三聚氰酸體(日本聚胺基甲酸酯工業社製,CoronateHX:C/HX)、及0.3質量份(固體成分0.3質量份)之1,3-雙(異氫氧基甲基)環己烷(三井化學社製,TAKENATE600)、0.5質量份(固體成分0.005質量份)之交聯觸媒鐵(III)乙醯丙酮(1質量%乙酸乙酯溶液)後進行混合攪拌,調製丙烯酸系黏著劑10溶液。 The acrylic polymer 10 solution (40% by mass) was diluted to 20% by mass with ethyl acetate, and an organic polycondensation diluted to 10% by ethyl acetate was added to 500 parts by mass of the solution (100 parts by mass of the solid component). 2 parts by mass of a solution of a decane (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.) (solid content: 0.2 parts by mass) and 15 parts by mass (solid content: 0.15 parts by mass) of an alkali metal salt as an antistatic component, that is, ethyl acetate Diluted into 1% lithium bis(trifluoromethane hydrazide) quinone imine (LiN(CF 3 SO 2 ) 2 :LiTFSI, manufactured by Tokyo Chemical Industry Co., Ltd.) solution, 1.0 part by mass (solid content: 1.0 part by mass) of a crosslinking agent Iso-polyisocyanate of hexamethylene diisocyanate (manufactured by Nippon Polycarbonate Co., Ltd., Coronate HX: C/HX), and 0.3 parts by mass (solid content: 0.3 parts by mass) of 1,3-double ( Isohydrooxymethyl)cyclohexane (TAKENATE 600, manufactured by Mitsui Chemicals, Inc.), 0.5 parts by mass (solid content: 0.005 parts by mass) of crosslinked catalyst iron (III) acetamidine acetone (1% by mass ethyl acetate solution) Thereafter, the mixture was stirred and mixed to prepare an acrylic adhesive 10 solution.

<黏著劑層用之丙烯酸系黏著劑2~9溶液的調製> <Preparation of Acrylic Adhesive 2~9 Solution for Adhesive Layer>

以與前述丙烯酸系黏著劑1或10之調製方法相同的方式得到丙烯酸系黏著劑2~9溶液。 An acrylic adhesive 2 to 9 solution was obtained in the same manner as in the above-described method of preparing the acrylic adhesive 1 or 10.

<胺基甲酸酯系黏著劑11溶液之調製> <Preparation of urethane-based adhesive 11 solution>

按下述條件摻合多元醇、交聯劑、觸媒及稀釋溶劑而得到胺基甲酸酯系黏著劑11溶液:多元醇為具3個羥基之多元醇PREMINOL S3011(旭硝子社製,Mn=10000)85質量份、具3個羥基之多元醇SANNIX GP3000(三洋化成社製,Mn=3000)13質量份及具3個羥基之多元醇SANNIX GP1000(三洋化成社製,Mn=1000)2質量份;交聯劑為異氰酸酯化合物(CoronateHX:C/HX,日本聚胺基甲酸酯社 製)18質量份;觸媒為鐵(III)乙醯丙酮(東京化成工業社製)0.04質量份;稀釋溶劑為乙酸乙酯210質量份。再者,胺基甲酸酯系黏著劑溶液之原料除了溶劑以外均係濃度100%的原料。 The polyol, the crosslinking agent, the catalyst, and the diluent solvent were blended under the following conditions to obtain an urethane-based adhesive 11 solution: the polyol was a polyol having three hydroxyl groups, PREMINOL S3011 (manufactured by Asahi Glass Co., Ltd., Mn = 10000) 85 parts by mass of a polyol having three hydroxyl groups, SANNIX GP3000 (manufactured by Sanyo Chemical Co., Ltd., Mn = 3000), 13 parts by mass, and a polyol having three hydroxyl groups, SANNIX GP1000 (manufactured by Sanyo Chemical Co., Ltd., Mn = 1000) 2 mass Crosslinker is an isocyanate compound (CoronateHX: C/HX, Japan Polyurethane Co., Ltd. 18 parts by mass; the catalyst was 0.04 parts by mass of iron (III) acetamidine acetone (manufactured by Tokyo Chemical Industry Co., Ltd.); and the dilution solvent was 210 parts by mass of ethyl acetate. Further, the raw material of the urethane-based adhesive solution is a raw material having a concentration of 100% except for the solvent.

<胺基甲酸酯系黏著劑12溶液之調製> <Preparation of urethane-based adhesive 12 solution>

除了觸媒係使用錫系觸媒之二月桂酸二丁錫0.08質量份以外,以與前述胺基甲酸酯系黏著劑11溶液相同之方法得到胺基甲酸酯系黏著劑12溶液。 The urethane-based pressure-sensitive adhesive 12 solution was obtained in the same manner as the above-described urethane-based pressure-sensitive adhesive 11 solution except that the catalyst was 0.08 parts by mass of dibutyltin dilaurate using a tin-based catalyst.

<胺基甲酸酯系黏著劑13溶液之調製> <Preparation of urethane-based adhesive 13 solution>

除了更摻合有作為濕潤性提升劑之肉豆蔻酸異丙酯(EXCEPARL IPM,花王社製)30質量份、作為抗氧化劑之Irganox1010(BASF社製)0.5質量份以外,以與前述胺基甲酸酯系黏著劑11溶液相同之方法得到胺基甲酸酯系黏著劑13溶液。 In addition to the above-mentioned amine group, in addition to 30 parts by mass of isopropyl myristate (EXCEPARL IPM, manufactured by Kao), and 0.5 parts by mass of Irganox 1010 (manufactured by BASF Corporation) as an antioxidant, The urethane-based adhesive 11 solution was obtained in the same manner to obtain a urethane-based adhesive 13 solution.

<胺基甲酸酯系黏著劑14溶液之調製> <Preparation of urethane-based adhesive 14 solution>

除了更摻合有聚醚系化合物(KF-6004,信越化學工業社製)0.1質量份、抗靜電成分之1-乙基-3-甲基咪唑啶鎓雙(氟磺醯基)醯亞胺(EMIFSI,第一工業藥品社製)0.5質量份以外,以與前述胺基甲酸酯系黏著劑13溶液相同之方法得到胺基甲酸酯系黏著劑14溶液。 In addition to a polyether compound (KF-6004, manufactured by Shin-Etsu Chemical Co., Ltd.), 0.1 parts by mass of an antistatic component of 1-ethyl-3-methylimidazolidinium bis(fluorosulfonyl) quinone imine The urethane-based pressure-sensitive adhesive 14 solution was obtained in the same manner as the above-described urethane-based pressure-sensitive adhesive 13 solution, except for 0.5 parts by mass of EMIFSI (manufactured by Daiichi Seiki Co., Ltd.).

<聚矽氧系黏著劑15溶液之調製> <Preparation of Polyoxyl Adhesive 15 Solution>

摻合以固體成分計為100質量份之聚矽氧系黏著劑「X-40-3229](固體成分60質量%,信越化學工業社製)、0.5質量份之鉑觸媒「CAT-PL-50T」(信越化學工業社製)、 100質量份之作為溶劑之甲苯,而得到聚矽氧系黏著劑15溶液。 100 parts by mass of the polyoxynoxy-based adhesive "X-40-3229" (solid content: 60% by mass, manufactured by Shin-Etsu Chemical Co., Ltd.) and 0.5 part by mass of platinum catalyst "CAT-PL-" 50T" (manufactured by Shin-Etsu Chemical Co., Ltd.), 100 parts by mass of toluene as a solvent to obtain a solution of a polyoxynoxy-based adhesive 15.

<聚矽氧系黏著劑16溶液之調製> <Preparation of Polyoxyl Adhesive 16 Solution>

除了更摻合有聚醚系化合物(KF-353,信越化學工業社製)0.2質量份、抗靜電成分之鋰雙(三氟甲烷磺醯基)醯亞胺(LiN(CF3SO2)2:LiTFSI,東京化成工業社製)0.3質量份以外,以與前述聚矽氧系黏著劑15溶液相同之方法得到聚矽氧系黏著劑16溶液。 In addition to a polyether compound (KF-353, manufactured by Shin-Etsu Chemical Co., Ltd.), 0.2 parts by mass of an antistatic component of lithium bis(trifluoromethanesulfonyl) quinone imine (LiN(CF 3 SO 2 ) 2 A polyfluorene-based adhesive 16 solution was obtained in the same manner as the above-mentioned polyoxygen-based adhesive 15 solution, except that 0.3 parts by mass of LiTFSI (manufactured by Tokyo Chemical Industry Co., Ltd.) was used.

<附抗靜電層之基材的調製> <Modulation of substrate with antistatic layer>

於厚度38μm、寬度30cm、長度40cm之透明聚對苯二甲酸乙二酯(PET)薄膜(聚酯薄膜)上以使乾燥後的厚度為20、30、45nm之條件塗布前述抗靜電層(A)~(K)任一者之水分散液。以130℃加熱該塗布物1分鐘使其乾燥,藉此製作於PET薄膜之第一面具有抗靜電層的附抗靜電層之基材。 The antistatic layer (A) was coated on a transparent polyethylene terephthalate (PET) film (polyester film) having a thickness of 38 μm, a width of 30 cm, and a length of 40 cm so as to have a thickness of 20, 30, and 45 nm after drying. ) ~(K) Any of the aqueous dispersions. The coating was heated at 130 ° C for 1 minute and dried to prepare a substrate with an antistatic layer having an antistatic layer on the first side of the PET film.

<實施例1> <Example 1>

<表面保護薄膜之製作> <Production of surface protective film>

將前述丙烯酸系黏著劑1溶液塗布於前述具抗靜電層之基材(附抗靜電層之基材)的與抗靜電層相反之面,再以130℃加熱1分鐘,形成厚度15μm的黏著劑層。接著,於前述黏著劑層表面貼合一於單面施行過聚矽氧處理之隔離片的聚對苯二甲酸乙二酯薄膜(厚度25μm)之聚矽氧處理面,製作表面保護薄膜。 The acrylic adhesive 1 solution was applied to the surface of the substrate having the antistatic layer (substrate with an antistatic layer) opposite to the antistatic layer, and further heated at 130 ° C for 1 minute to form an adhesive having a thickness of 15 μm. Floor. Next, a polyfluorinated epoxy-treated surface of a polyethylene terephthalate film (thickness: 25 μm) which was subjected to a polyfluorene-treated separator on one surface was bonded to the surface of the pressure-sensitive adhesive layer to prepare a surface protective film.

<實施例11> <Example 11>

<表面保護薄膜之製作> <Production of surface protective film>

將前述胺基甲酸酯系黏著劑11溶液塗布於前述具抗靜電層之基材(附抗靜電層之基材)的與抗靜電層相反之面,再以130℃加熱1分鐘,形成厚度10μm的黏著劑層。接著,於前述黏著劑層表面貼合一於單面施行過聚矽氧處理之隔離片的聚對苯二甲酸乙二酯薄膜(厚度25μm)之聚矽氧處理面,製作表面保護薄膜。 Applying the solution of the urethane-based adhesive 11 to the surface of the substrate having the antistatic layer (substrate with an antistatic layer) opposite to the antistatic layer, and heating at 130 ° C for 1 minute to form a thickness 10 μm adhesive layer. Next, a polyfluorinated epoxy-treated surface of a polyethylene terephthalate film (thickness: 25 μm) which was subjected to a polyfluorene-treated separator on one surface was bonded to the surface of the pressure-sensitive adhesive layer to prepare a surface protective film.

<實施例15> <Example 15>

<表面保護薄膜之製作> <Production of surface protective film>

將前述聚矽氧系黏著劑15溶液塗布於前述具抗靜電層之基材(附抗靜電層之基材)的與抗靜電層相反之面,再以150℃加熱1分鐘,形成厚度10μm的黏著劑層。接著,於前述黏著劑層表面貼合一於單面施行過聚矽氧處理之隔離片的聚對苯二甲酸乙二酯薄膜(厚度25μm)之聚矽氧處理面,製作表面保護薄膜。 The polyfluorene-based adhesive 15 solution was applied to the surface of the substrate (antistatic layer-attached substrate) having the antistatic layer opposite to the antistatic layer, and further heated at 150 ° C for 1 minute to form a thickness of 10 μm. Adhesive layer. Next, a polyfluorinated epoxy-treated surface of a polyethylene terephthalate film (thickness: 25 μm) which was subjected to a polyfluorene-treated separator on one surface was bonded to the surface of the pressure-sensitive adhesive layer to prepare a surface protective film.

<實施例2~10、實施例17、實施例18、及比較例1~5> <Examples 2 to 10, Example 17, Example 18, and Comparative Examples 1 to 5>

依據表1~表3之摻合內容並以與實施例1相同方式製作表面保護薄膜。 A surface protective film was produced in the same manner as in Example 1 in accordance with the blending contents of Tables 1 to 3.

<實施例12~14> <Examples 12 to 14>

依據表1、表4之摻合內容並以與實施例11相同方式製作表面保護薄膜。 A surface protective film was produced in the same manner as in Example 11 in accordance with the blending contents of Tables 1 and 4.

<實施例16> <Example 16>

依據表1、表5之摻合內容並以與實施例15相同方式製 作表面保護薄膜。 According to the blending contents of Tables 1 and 5, and in the same manner as in the embodiment 15, As a surface protection film.

於表6顯示對實施例及比較例之表面保護薄膜進行上述各種測量及評定的結果。 The results of the above various measurements and evaluations of the surface protective films of the examples and the comparative examples are shown in Table 6.

再者,於以下說明表2及表3中之簡稱。其他表中之簡稱係依據實施例。 Furthermore, the abbreviation in Table 2 and Table 3 will be described below. The abbreviations in other tables are based on the examples.

[單體成分] [monomer composition]

2EHA:2-乙基己基丙烯酸酯 2EHA: 2-ethylhexyl acrylate

BA:丙烯酸正丁酯 BA: n-butyl acrylate

4HBA:丙烯酸4-羥丁酯 4HBA: 4-hydroxybutyl acrylate

HEA:丙烯酸2-羥乙酯 HEA: 2-hydroxyethyl acrylate

AA:丙烯酸 AA: Acrylic

NVP:N-乙烯吡咯啶酮 NVP: N-vinylpyrrolidone

DEAA:二乙基丙烯醯胺 DEAA: diethyl acrylamide

[聚醚系化合物] [Polyether compound]

KF353:具氧伸烷鏈之有機聚矽氧烷(HLB值:10)(信越化學工業社製,商品名:KF-353) KF353: an organopolyoxane having an oxyalkylene chain (HLB value: 10) (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KF-353)

KF6004:具氧伸烷鏈之有機聚矽氧烷(HLB值:9)(信越化學工業社製,商品名:KF-6004) KF6004: an organopolyoxane having an oxygen-extended alkyl chain (HLB value: 9) (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KF-6004)

HS10:第一工業製藥(股)製,商品名「AQUALON HS-10」(陰離子系界面活性劑) HS10: First Industrial Pharmaceutical Co., Ltd., trade name "AQUALON HS-10" (anionic surfactant)

EA137:第一工業製藥(股)製,商品名「NOIGEN EA-137」(非離子系界面活性劑) EA137: First Industrial Pharmaceutical Co., Ltd., trade name "NOIGEN EA-137" (nonionic surfactant)

[抗靜電成分(離子性化合物)] [antistatic component (ionic compound)]

LITFSI:鋰雙(三氟甲烷磺醯基)醯亞胺(鹼金屬鹽,東 京化成工業社製)(有效成分100%) LITFSI: lithium bis(trifluoromethanesulfonyl) quinone imine (alkali metal salt, east Jinghuacheng Industrial Co., Ltd.) (100% active ingredient)

BMPTFSI:1-丁基-3-甲基吡啶鎓雙(三氟甲烷磺醯基)醯亞胺(離子液體,Sigma Aldrich社製,25℃中為液狀)(有效成分100%) BMPTFSI: 1-butyl-3-methylpyridinium bis(trifluoromethanesulfonyl) quinone imine (ionic liquid, manufactured by Sigma Aldrich, liquid at 25 ° C) (active ingredient 100%)

EMIFSI:離子液體:1-乙基-3-甲基咪唑啶鎓雙(氟磺醯基)醯亞胺(離子液體,第一工業製藥社製)(有效成分100%) EMIFSI: ionic liquid: 1-ethyl-3-methylimidazolidinium bis(fluorosulfonyl) quinone imine (ionic liquid, manufactured by Daiichi Kogyo Co., Ltd.) (active ingredient 100%)

[交聯劑] [crosslinking agent]

C/HX:六亞甲基二異氰酸酯之異三聚氰酸體(日本聚胺基甲酸酯社製,商品名:CoronateHX)(有效成分100%) C/HX: isomeric cyanuric acid of hexamethylene diisocyanate (manufactured by Japan Polyurethane Co., Ltd., trade name: Coronate HX) (active ingredient 100%)

C/L:三羥甲基丙烷/甲苯二異氰酸酯(日本聚胺基甲酸酯工業社製,商品名:CoronateL)(有效成分75%) C/L: trimethylolpropane/toluene diisocyanate (manufactured by Japan Polyurethane Industry Co., Ltd., trade name: Coronate L) (active ingredient: 75%)

TAKENATE600:1,3-雙(異氰酸甲酯)環己烷(三井化學社製,商品名:TAKENATE600)(有效成分100%) TAKENATE 600: 1,3-bis(isocyanatomethyl)cyclohexane (manufactured by Mitsui Chemicals, Inc., trade name: TAKENATE 600) (active ingredient 100%)

[交聯觸媒] [crosslinking catalyst]

Sn:二月桂酸二丁錫(二丁錫二月桂酸)(東京化成工業社製) Sn: dibutyltin dilaurate (dibutyltin dilaurate) (manufactured by Tokyo Chemical Industry Co., Ltd.)

Fe:參(乙醯丙酮)鐵(鐵(III)乙醯丙酮)(東京化成工業社製) Fe: ginseng (acetonitrile) iron (iron (III) acetonitrile) (manufactured by Tokyo Chemical Industry Co., Ltd.)

由表6中全部之實施例中,可確認表面電阻率或薄膜側剝離靜電位等優異、及於摻合有抗靜電劑之離子性化合物、及聚醚系化合物時,偏光板剝離靜電位亦優異,此外,於抗靜電層中摻合有潤滑劑時,滑動性亦優異,於黏著劑層中摻合有抗靜電成分時,偏光板剝離靜電位亦優異。又,相較於使用有丙烯酸樹脂作為黏合劑的實施例17,使用有聚酯樹脂之實施例中可確認耐溶劑性亦優異。 In all of the examples in Table 6, it was confirmed that the surface resistivity, the film side peeling electrostatic potential, and the like, and the ionic compound and the polyether compound doped with the antistatic agent, the polarizing plate peeled off the electrostatic potential. It is excellent, and when the lubricant is blended in the antistatic layer, the slidability is also excellent. When the antistatic component is blended in the adhesive layer, the polarizing plate is also excellent in peeling off the electrostatic potential. Further, in Example 17 using an acrylic resin as a binder, it was confirmed that the solvent resistance was also excellent in the examples using the polyester resin.

另一方面,由表6可確認,比較例1~5因未以所期之比例摻合構成抗靜電層之導電性聚合物,故經時及照射UV後之表面電阻率或薄膜側剝離靜電位較實施例差。特別是比較例5中,因使用外部摻雜型之聚苯胺取代其自身具有導電性的自身摻雜型之聚苯胺磺酸,故隨著時間將產生聚陰離子類(PSS)(相當於摻雜物)自聚噻吩類(PEDOT)脫離之情形,確認經時之表面電阻率較實施例差。 On the other hand, it can be confirmed from Table 6 that in Comparative Examples 1 to 5, since the conductive polymer constituting the antistatic layer was not blended in the desired ratio, the surface resistivity after the irradiation of UV or the peeling of the film side was static. The bit is worse than the embodiment. In particular, in Comparative Example 5, since the polyaniline sulfonic acid of its own doping type was replaced with an externally doped polyaniline, a polyanion (PSS) (corresponding to doping) was generated with time. In the case of detachment from polythiophene (PEDOT), it was confirmed that the surface resistivity over time was inferior to that of the examples.

產業上之可利用性 Industrial availability

此處所揭示之表面保護薄膜適於作為製造或搬運光學構件等時用以保護該光學構件的表面保護薄膜,前述光學構件係用作液晶顯示器面板、電漿顯示器面板(PDP)、有機電致發光(EL)顯示器等之構成要素。尤有用於作為適用在液晶顯示器面板用之偏光板(偏光膜)、波長板、相位差板、光學補償膜、亮度提升膜、光擴散片材、反射片材等光學構件的表面保護薄膜(光學用表面保護薄膜)。 The surface protection film disclosed herein is suitable as a surface protection film for protecting the optical member when manufacturing or handling an optical member, which is used as a liquid crystal display panel, a plasma display panel (PDP), and an organic electroluminescence. (EL) Components such as displays. It is especially useful as a surface protection film (optical) for optical members such as a polarizing plate (polarizing film) for a liquid crystal display panel, a wave plate, a phase difference plate, an optical compensation film, a brightness enhancement film, a light diffusion sheet, and a reflection sheet. Use a surface protection film).

Claims (11)

一種表面保護薄膜,具有:具第一面及第二面之基材、設於前述基材之前述第一面的抗靜電層、及形成於前述基材之前述第二面且由黏著劑組成物形成的黏著劑層,該表面保護薄膜之特徵在於:前述抗靜電層係由抗靜電劑組成物形成者,該抗靜電劑組成物含有作為導電性聚合物成分的聚苯胺磺酸及以聚陰離子類摻雜之聚噻吩類、以及黏合劑;前述聚苯胺磺酸與前述以聚陰離子類摻雜之聚噻吩類的摻合比例(質量比)係90:10~10:90。 A surface protection film comprising: a substrate having a first surface and a second surface; an antistatic layer provided on the first surface of the substrate; and the second surface formed on the substrate and composed of an adhesive The surface protective film is characterized in that the antistatic layer is formed of an antistatic agent composition containing polyaniline sulfonic acid as a conductive polymer component and An anionic doped polythiophene and a binder; the blending ratio (mass ratio) of the polyaniline sulfonic acid to the polyanion-doped polythiophene is 90:10 to 10:90. 如請求項1之表面保護薄膜,其中前述聚噻吩類係聚(3,4-乙二氧基噻吩)(PEDOT)。 The surface protective film of claim 1, wherein the polythiophene is poly(3,4-ethylenedioxythiophene) (PEDOT). 如請求項1或2之表面保護薄膜,其中前述聚陰離子類係聚苯乙烯磺酸(PSS)。 The surface protective film of claim 1 or 2, wherein the polyanionic polystyrene sulfonic acid (PSS) is used. 如請求項1至3中任一項之表面保護薄膜,其中前述黏合劑係聚酯樹脂。 The surface protection film according to any one of claims 1 to 3, wherein the binder is a polyester resin. 如請求項1至4中任一項之表面保護薄膜,其中前述抗靜電劑組成物含有三聚氰胺系交聯劑及/或異氰酸酯系交聯劑作為交聯劑。 The surface protection film according to any one of claims 1 to 4, wherein the antistatic agent composition contains a melamine-based crosslinking agent and/or an isocyanate-based crosslinking agent as a crosslinking agent. 如請求項1至5中任一項之表面保護薄膜,其中前述抗靜電劑組成物含有選自於由脂肪酸醯胺、脂肪酸酯、聚矽氧系潤滑劑、氟系潤滑劑及蠟系潤滑劑所構成群組中之至少1種作為潤滑劑。 The surface protection film according to any one of claims 1 to 5, wherein the antistatic agent composition is selected from the group consisting of fatty acid amides, fatty acid esters, polyfluorene-based lubricants, fluorine-based lubricants, and wax-based lubricants. At least one of the groups consisting of the agents serves as a lubricant. 如請求項1至6中任一項之表面保護薄膜,其中前述基材係聚酯薄膜。 The surface protection film according to any one of claims 1 to 6, wherein the substrate is a polyester film. 如請求項1至7中任一項之表面保護薄膜,其中前述黏著劑組成物含有選自於由丙烯酸系黏著劑、胺基甲酸酯系黏著劑及聚矽氧系黏著劑所構成群組中之至少1種。 The surface protection film according to any one of claims 1 to 7, wherein the adhesive composition contains a group selected from the group consisting of an acrylic adhesive, an urethane adhesive, and a polyoxygen adhesive. At least one of them. 如請求項1至8中任一項之表面保護薄膜,其中前述黏著劑組成物含有聚醚系化合物。 The surface protection film according to any one of claims 1 to 8, wherein the above-mentioned adhesive composition contains a polyether compound. 如請求項1至9中任一項之表面保護薄膜,其中前述黏著劑組成物含有抗靜電成分。 The surface protection film according to any one of claims 1 to 9, wherein the aforementioned adhesive composition contains an antistatic component. 一種光學構件,其特徵在於受如請求項1至10中任一項之表面保護薄膜保護。 An optical member characterized by being protected by a surface protective film according to any one of claims 1 to 10.
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