TW201618951A - Layer system for use in a touch screen panel, method for manufacturing a layer system for use in a touch screen panel, and touch screen panel - Google Patents

Abstract

A layer system (100) adapted for use in a touch screen panel is provided. The layer system (100) includes at least one layer stack having three or more layers which are structured in the same structuring process. The three or more layers include a metal layer (110) including aluminium or an aluminium alloy and two or more further layers. The two or more further layers include an indium gallium zinc oxide (IGZO) layer or an indium zinc oxide (IZO) layer; and a first layer (120) including molybdenum or a molybdenum alloy.

Description

Layered system for touch screen panel, manufacturing method for layered system for touch screen panel, and touch screen panel

Embodiments of the present disclosure relate to a layered system for a touch screen panel, a method of fabricating a layered system for a touch screen panel, and a touch screen panel.

A touch screen panel is a special type of electronic visual display that is capable of detecting and locating a touch in a display area. The touch screen panel can include a layer system configured to sense touches on the screen. The layered system can be substantially transparent such that light in the visible spectral range emitted by the screen can pass therethrough. At least some known touch panels include a layered system of structured layers that are formed on a substrate. A touch on the display area of such a panel typically produces a measurable change in capacitance in an area of the layered system. The change in capacitance can be measured using different techniques so that the location of the touch can be determined.

Layered systems used in touch panels are subject to specific requirements. For example, optical characteristics (such as the appearance of the user) need to be considered as a touch screen panel. In particular, the structure of the layer of a layered system, such as a structured conductor, should not be visible to the user. Another aspect to be considered is the increase in the size of the display, in addition to the aforementioned optical characteristics, electrical characteristics are also receiving attention. In particular, the high conductivity of structured conductors is believed to be beneficial for large touch panels.

In view of the above, there is a need for a layered system for use in a touch screen panel that provides improved optical and electrical performance over conventional structures.

In view of the above, a layered system for a touch screen panel, a manufacturing method for a layered system for a touch screen panel, and a touch screen panel are provided. Other aspects, advantages and features of the invention are indicated by the dependent items, the description and the drawings.

According to one aspect of the present disclosure, a layered system for a touch screen panel is provided. The layered system comprises at least one layer stack having 3 or more layers, and these 3 or more layers are structured in the same structuring process. These three or more than three layers include one metal layer and two or more than two other layers. The metal layer includes aluminum or an aluminum alloy. The other layers of 2 or more include an indium gallium zinc oxide layer or an indium zinc oxide layer, and a first layer including a molybdenum or a molybdenum alloy.

According to another aspect of the present disclosure, a touch screen panel is provided. The touch screen panel includes a screen device (particularly a liquid crystal display) and a layered system as described herein. The layered system comprises at least one layer stack having 3 or more layers, and these 3 or more layers are structured in the same structuring process. These three or more than three layers include one metal layer and two or more than two other layers. The metal layer includes aluminum or an aluminum alloy. The other layers of 2 or more include an indium gallium zinc oxide layer or an indium zinc oxide layer, and a first layer including a molybdenum or a molybdenum alloy.

According to still another aspect of the present disclosure, a method of fabricating a layered system for a touch screen panel is provided. The method includes providing a metal layer over a substrate, the metal layer comprising aluminum or an aluminum alloy; providing a first layer over the metal layer, wherein the first layer comprises a molybdenum or molybdenum alloy; providing an indium gallium zinc oxide layer or an indium a zinc oxide layer over the first layer; and a structured metal layer, a first layer, and an indium gallium zinc oxide layer or an indium zinc oxide layer.

Embodiments are also related to apparatus for implementing the disclosed methods and apparatus including portions of equipment for performing the various methods described. Aspects of the method may be performed by hardware components, a computer programmed with appropriate software, any combination of the two, or otherwise. Moreover, embodiments are also related to the method of operation of the apparatus described herein. Methods can include implementing each function of the device.

Therefore, the above-described features of the present disclosure can be understood in more detail with reference to the embodiments. The drawings regarding embodiments of the present disclosure will be described below.

Different embodiments will be described in detail below, one or more embodiments of which are illustrated in the drawings. In the following description of the drawings, the same component symbols denote the same components. In general, only the differences between the individual embodiments are described. Each of the examples is provided to provide an explanation and is not intended to limit the invention. Further, the features illustrated or described as part of the embodiments can be used in other embodiments or in conjunction with other embodiments to produce other embodiments. It will be appreciated that these descriptions include such retouching and alterations.

The term "substrate" as used herein shall include a substrate that can be used in the manufacture of a display, such as a glass or plastic substrate. For example, the substrate described herein includes a substrate that can be used in a liquid crystal display (LCD), a plasma display panel (PDP), an organic light emitting diode display (OLED display), and the like. Unless specifically stated herein, the term "substrate" shall be taken to mean the specific "large area substrate" herein. In accordance with the present disclosure, a large area substrate can have a size of at least 0.174 square meters (m2). For example, the size may be from about 1.4 m2 to about 8 m2, and in particular from about 2 m2 to about 9 m2, or even up to 12 m2. However, the disclosure is not limited thereto, and the term "substrate" may also include a flexible substrate such as a web or a foil.

As used herein, the term "transparent" shall specifically include the ability of a structure to penetrate light with relatively low scattering, for example, such that light can be substantially clearly seen as it penetrates therefrom. For example, the substrate comprises glass or polyethylene terephthalate (PET). PET can have a penetration rate of about 90%.

1 is a cross-sectional view of a layered system 100 for a touch screen panel in accordance with an embodiment described herein.

The layered system 100 includes at least one layer stack having three layers or more than three layers structured in the same structured process (eg, an etch process). The three layers or more than three layers include a metal layer 110 and two layers or more than two layers. The metal layer 110 includes aluminum or aluminum alloy. The other layers of 2 or more include an Indium Gallium Zinc Oxide (IGZO) layer or an Indium Zinc Oxide (IZO) layer, and a first layer 120. The first layer 120 comprises a molybdenum or molybdenum alloy In some embodiments, the layered system 100 is configured for touch detection. Hereinafter, "IGZO layer" or "Indium zinc oxide layer (IZO layer)" is also referred to as "IGZO or IZO layer 130".

In some embodiments, the aluminum alloy can be aluminum ruthenium (AlNd).

According to some embodiments, which may be combined with other embodiments described herein, the layered system 100 includes at least one substrate, such as a first substrate 10. The metal layer 110 and two or more layers may be disposed on the first substrate 10 as shown in the example of FIG.

According to some embodiments, which may be combined with other embodiments described herein, two or more other layers are configured to darken the metal layer 110 such that the structure of the metal layer 110 is substantially It is invisible. The term "darkening" as used herein may refer to the low surface reflectance of the layered system 100, particularly in the range of visible wavelengths (e.g., about 350 to 800 nanometers (nm)). The low surface reflectance may be due to the combination of the first layer 120 with the IGZO or IZO layer 130. The surface reflectance of the layered system of the present disclosure may be less than 20%, specifically less than 10%, and more specifically less than 5%, in at least a portion of the visible wavelength range. For an example of the surface reflectance of a layered system according to some embodiments, please refer to Figures 2C and 3C.

The layered system 100 of the present disclosure has improved optical properties (eg, presented to the user's appearance). In particular, the structure of the layer (e.g., metal layer 110) is invisible to the user. The layered system 100 further provides improved electrical characteristics. In particular, the structured conductor for touch detection is a metal layer 110 comprising aluminum or/and an aluminum alloy having high conductivity, which is particularly advantageous for the size of a large touch panel. In view of this, the present disclosure provides a layered system for a touch screen panel that provides improved optical and electrical performance over conventional structures. By layering the structure in a single structured process, the layered system can be manufactured with less effort and cost.

According to some embodiments, which can be combined with other embodiments described herein, the thickness of the metal layer 110 is less than 500 microns, particularly less than 300 microns, and especially about 200 microns. In some embodiments, the metal-based conductive layer 110 is at least 2 × 10 ⁷ Siemens / meter (S / m), especially about 3.5 × 10 ⁷ S / m. In some embodiments, the resistivity of the metal layer 120 is less than 5 x 10 ^-8 ohm meters (Ohm.m), especially about 3 x 10 ^-8 Ohm. m or 2.8×10 ^-8 Ohm. m.

In some embodiments, metal layer 110 provides a wiring pattern having one or more wires. These wires can be parallel wires, such as horizontal wires or vertical wires. For example, the wiring pattern can be configured for touch detection, particularly in conjunction with additional wiring patterns. The two wiring patterns can be separated by an insulating layer. The wiring of the two wiring patterns may extend in a substantially vertical direction to form a matrix. This matrix can be configured for touch detection, for example by detecting changes in capacitance between two wiring patterns.

According to some embodiments, the width of these wires may be less than 10 microns, particularly less than 5 microns, and may more particularly have a width ranging from about 2 microns to about 3 microns. The combination of the first layer 120 and the IGZO or IZO layer 130 can darken the wiring (i.e., make the wiring dark), making the wiring substantially invisible to the human eye.

In some embodiments, the first layer 120 is provided on or over the metal layer 110 and/or the IGZO or IZO layer 130 is provided on or over the first layer 120. That is, the metal layer 110, the first layer 120, and the IGZO or IZO layer 130 are arranged in this order, particularly on or above the first substrate 10. The metal layer 110 and the first layer 120, and/or the first layer 120 and the IGZO or IZO layer 130 may be disposed directly on one another. Alternatively, at least one additional layer may be provided between the metal layer 110 and the first layer 120 and/or between the first layer 120 and the IGZO or IZO layer 130.

When using the terms "upper" or "above" (i.e., one layer is on or above another layer), it should be understood that a layer is deposited on or over the first substrate 10 (e.g., by A substrate 10 begins), another layer deposited after the layer is on or above the layer and is located above the first substrate 10. In other words, the terms "upper" and "above" are used to define the order of layers, layer stacks, and/or films, wherein the starting point may be the first substrate 10, and regardless of whether the layered system is depicted as being up and down. reverse. Also, the term "above" shall include an embodiment in which one or more additional layers are provided between one layer and another. The term "upper" shall include an embodiment in which one layer is not provided with another layer, that is, one layer and another layer are disposed directly on the other, or, in other words, one layer and the other layer are in contact with each other.

In some embodiments, the first layer 120 is selected from the group consisting of a molybdenum oxide layer (MoOxlayer), a molybdenum alloy layer (Mo-alloy Oxlayer), a molybdenum oxynitride layer (MoOxNx layer), a molybdenum oxynitride alloy layer (( Mo-alloy) OxNx layer), a molybdenum tantalum oxide layer (MoNbOx layer), and a molybdenum molybdenum layer (MoNb layer). The combination of the first layer 120 with the IGZO or IZO layer 130 provides a blackening effect of the metal layer 110. That is, the metal layer 110 becomes dark and thus cannot be seen by the user.

Indium tin oxide (ITO) can be used as a conductive layer (electrode) for touch panel applications. However, the resistivity of the indium tin oxide layer is limited and depends on a substrate temperature (e.g., during a deposition or post annealing process). Higher conductivity is beneficial for larger touch panel sizes (such as notebook computers or TVs), and on cell touch panel solutions / in-cell touch panels (in cell touch) Panel solution) can be deposited using low temperature. The metal layer of the present disclosure achieves these aspects by depositing layers at a limited substrate temperature to achieve high conductivity.

The (inert) high reflectance of the metal layer allows the touch panel structure to be visible to the human eye. Compared to the surface reflectance of the metal layer of aluminum and/or aluminum alloy, two or more layers in the layered system cause the reflectivity of the layered system to decrease. The other layers of 2 or more may be electrically and/or optically active layers and may reduce the visibility of the structured aluminum and/or aluminum alloy layers to an acceptable level for the end user. Two or more other layers may be selected in sequence to enable wet etching of the completely dark metal layer structure in a process block. The dark metal structure can be disposed, for example, on a color filter glass or a cover lens, and can be invisible to the touch panel structure.

2A is a schematic cross-sectional view of a layered system 200 for a touch screen panel in accordance with other embodiments described herein.

According to some embodiments, which may be combined with other embodiments described herein, the layered system 200 (particularly two or more other layers) includes a second layer 240 comprising molybdenum or molybdenum alloy. For example, the second layer 240 can be a molybdenum layer or a molybdenum molybdenum layer. According to some embodiments, the second layer 240 comprising an alloy of molybdenum or molybdenum may be configured as an adhesive layer, such as between the metal layer 110 and the substrate (eg, the first substrate 10).

In some embodiments, the second layer 240 is provided on or over the metal layer 110. The second layer 240 can be provided on one side of the metal layer 110 with respect to the side on which the first layer is provided. For example, the second layer 240 is provided between at least one substrate (eg, the first substrate 10) and the metal layer 110.

FIG. 2B is a schematic cross-sectional view showing the layered system of FIG. 2A with the protective cover 20.

The layered system further includes a protective outer cover 20 in accordance with some embodiments that can be combined with other embodiments described herein. The protective cover 20 can be provided on or above the IGZO or IZO layer 130. For example, a transparent adhesive layer 15 (including, for example, an Optically Clear Adhesive (OCA)) may be provided between the protective cover 20 and the IGZO or IZO layer 130 to adhere the protective cover 20 to the IGZO or IZO layer 130. In some embodiments, the term "protective cover" may refer to the topmost glass of the touch screen panel. The protective cover 20 can be made of glass having a thickness of 0.1 mm or more (for example, about 0.5 mm, 0.7 mm, 0.9 mm, or 1 mm).

Fig. 2C is a diagram showing the reflectance R of the layered system of Figs. 2A and 2B.

The x-axis of the graph represents the wavelength L of the nano meter, and the y-axis represents the reflectance R. The first curve 250 represents the reflectance measured directly on the IGZO layer of Figure 2A. The second curve 260 represents the reflectance measured on the protective cover 20 of Figure 2B. The layered system provides a low surface reflectance, particularly in the range of visible wavelengths (e.g., from about 350 to about 800 nanometers). The low surface reflectivity can be caused by the combination of the first layer 120 with the IGZO or IZO layer 130 and the optical additional layer (eg, the second layer 240).

3A is a schematic cross-sectional view of a layered system 300 for a touch screen panel in accordance with other additional embodiments described herein.

According to some embodiments, which may be combined with other embodiments described herein, the layered system 300 (particularly 2 or more than 2 other layers) includes a third layer 350. The third layer 350 comprises a molybdenum or molybdenum alloy, particularly wherein the third layer 350 is a molybdenum layer or a molybdenum molybdenum layer. In some embodiments, the third layer 350 is provided on or above the metal layer 110. For example, a third layer 350 can be provided between the metal layer 110 and the first layer 120.

The combination of the first layer 120, the IGZO or IZO layer 130, the second layer 240, and the third layer 350 can further reduce surface reflectance and further improve the optical properties of the layered system 300.

FIG. 3B is a schematic cross-sectional view showing the layered system of FIG. 3A with the protective cover 20.

The layered system further includes a protective outer cover 20 in accordance with some embodiments that can be combined with other embodiments described herein. The protective cover 20 can be provided on or above the IGZO or IZO layer 130. For example, a transparent adhesive layer 15 (including, for example, an OCA) may be provided between the protective cover 20 and the IGZO or IZO layer 130 to attach the protective cover 20 to the IGZO or IZO layer 130. In some embodiments, the "protective cover" may represent the topmost glass of the touch screen panel. The protective cover 20 may be made of glass having a thickness of 0.1 mm or more, for example, about 0.5 mm, 0.7 mm, 0.9 mm, or 1 mm.

Figure 3C is a graph showing the reflectance of the layered system of Figures 3A and 3B.

The x-axis of the graph represents the wavelength in nanometers and the y-axis represents reflectivity. The first curve 351 represents the reflectance R measured directly on the IGZO layer of FIG. 3A. The second curve 360 represents the reflectance R measured on the protective cover 20 of FIG. 3B. The layered system provides a low surface reflectance, particularly in the range of visible wavelengths (e.g., from about 350 to about 800 nanometers). The low surface reflectance may be caused by the combination of the first layer 120 with the IGZO or IZO layer 130 and the selective layers (eg, the second layer 240 and the third layer 350).

The following description of the embodiments shown in Figures 4 to 6 shows that at least one layer is stacked on one or more different substrates (for example, a first substrate, a second substrate (for example, a color filter substrate or a color filter glass). And an example above or above the third substrate (for example, a thin film transistor substrate or a thin film transistor glass).

4 is a schematic diagram of a touch screen panel 400 having a layered system in accordance with an embodiment described herein.

In accordance with one aspect of the present disclosure, touch screen panel 400 includes a screen device and a layered system as described herein. For example, the screen device may be a liquid crystal display (LCD) as shown in the examples of FIGS. 4 to 6. However, the disclosure is not limited to LCDs, and other screen technologies may be employed in conjunction with the layered system of the present disclosure, such as an OLED display.

According to some embodiments, which can be combined with other embodiments described herein, the layered system includes a first wiring pattern 430 and a second wiring pattern 440, the first wiring pattern 430 having one or more first wirings, a second wiring pattern The 440 has one or more second wires, wherein the first wiring pattern 430 and the second wiring pattern 440 are separated by an insulating layer 435. The first wiring pattern 430 and the second wiring pattern 440 can be configured for touch detection.

One or more of the first wiring patterns 430 or one or more of the second wiring and/or the second wiring patterns 440 may be parallel wiring, such as horizontal wiring or vertical wiring. One or more of the first wiring patterns 430 or one or more of the second wirings 440 may extend in a substantially vertical direction to form a matrix. For example, one or more of the first wiring patterns 430 may extend in a first direction (eg, in the x direction). One or more of the second wiring patterns 440 may extend in a second direction (eg, in the y-direction). The first direction and the second direction may be substantially perpendicular. The matrix can be configured for touch detection, for example, by detecting a change in capacitance between the first wiring pattern 430 and the second wiring pattern 440.

The term "substantially perpendicular" relates to, for example, a substantially vertical direction of one or a plurality of first wirings and a plurality of second wirings of the first wiring pattern 430 and the second wiring pattern 440, wherein A small amount of angular deviation in the vertical direction (for example, reaching 10° or even 15°) is still considered to be "substantially perpendicular".

In some embodiments, one or more of the first wiring patterns 430 are provided by a transparent conductive oxide, particularly indium tin oxide. One or more of the second wiring patterns 440 are provided by stacking at least one layer of the layered system. In other embodiments, one or more of the second wiring patterns 440 are provided by a transparent conductive oxide, particularly indium tin oxide. One or more of the first wiring patterns 430 are provided by stacking at least one layer of the layered system.

In accordance with embodiments described herein, a wiring pattern (e.g., second wiring pattern 440) provided by stacking at least one layer of a layered system can be configured in accordance with embodiments described herein. For example, the second wiring pattern 440 (or the first wiring pattern 430) may include the first substrate 10, the metal layer 110, and two or more other layers. These 2 or more other layers may include an IGZO layer or IZO layer, a first layer (labeled as component symbol 470), and optionally a second layer (labeled as component symbol 460).

According to some embodiments, which may be combined with other embodiments described herein, the transparent conductive oxide may be an ITO layer, impurity doped zinc oxide (ZnO), indium trioxide (In ₂ O ₃ ), tin dioxide. (SnO ₂ ) and cadmium oxide (CdO), tin-doped indium trioxide (ITO, In ₂ O ₃ :Sn), aluminum-doped zinc oxide (AZO, ZnO:Al), indium-doped zinc oxide (IZO, ZnO: In), gallium-doped zinc oxide (GZO, ZnO: Ga), multi-component oxide including or consisting of a combination of ZnO, a combination of In ₂ O ₃ and SnO ₂ , having at least one ITO layer and one metal layer For example, ITO/metal/ITO stacks or metal/ITO/metal stacks.

In the LCD, the liquid crystal layer is arranged between two electrodes, and two polarizing layers or polarizing filters (for example, parallel and vertical) having transmission axes perpendicular to each other are provided. Whether the light penetrating a polarizing filter is blocked by another polarizing filter depends on the direction of the liquid crystal. In some embodiments, the layered system includes a polarizing layer 450, wherein the first wiring of the first wiring pattern 430 or the second wiring of the second wiring pattern 440 is embedded in the polarizing layer 450.

According to some embodiments, the layered system includes at least one substrate, such as a second substrate 425. The second substrate 425 may be a substrate on which the color filter matrix 420 of the screen device is disposed. The second substrate 425 can represent a "color filter substrate" or a "color filter glass." The second substrate 425 can have a first side and a second side. The first wiring pattern 430, the insulating layer 435, the second wiring pattern 440, the polarizing layer 450, and the selective adhesive layer 15 and the protective cover 20 may be disposed on or above the first side of the second substrate 425. The color filter matrix 420 (or color filter layer) can be disposed on or above the second side of the second substrate 425. The first side of the second substrate 425 can be opposite the second side of the second substrate 425.

In some embodiments, touch screen panel 400 includes a screen device. The screen device may include a third substrate 405, such as a glass substrate ("film transistor-glass"). An array or layer 410 of thin film transistors can be disposed on or over the third substrate 405. The liquid crystal layer 415 can be disposed on or over the array or layer 410 of thin film transistors. An array or layer 410 of thin film transistors can be configured to drive the pixels of the screen device. The screen device can further include a backlight. The color filter matrix 420 can be disposed on or above the liquid crystal layer 415.

FIG. 5 is a schematic diagram of a touch screen panel 500 having a layered system in accordance with other embodiments described herein. The embodiment of Fig. 5 is similar to the embodiment of Fig. 4, and the description of similar or identical elements has been omitted. The embodiment of Fig. 5 differs from the embodiment of Fig. 4 in the configuration of the first wiring pattern. The first wiring pattern 530 in FIG. 5 does not include a transparent conductive oxide, but includes a layer stack of the layered system of the present disclosure.

According to some embodiments, which may be combined with other embodiments described herein, at least one layer stack includes a first layer stack and a second layer stack, wherein one or more of the first wiring patterns 530 may be Provided by a stack of layers, one or more of the second wiring patterns 440 may be provided by a second layer stack.

According to embodiments described herein, the first wiring pattern 530 and/or the second wiring pattern 440 may comprise a layered system, such as the layered system illustrated by reference numeral 440 of FIG. The first wiring pattern 430 and the second wiring pattern 440 having the layer stack of the layered system of the present disclosure provide high conductivity in two wiring patterns, resulting in improved performance of the touch detection function.

In some embodiments, the layered system includes at least one substrate, such as a second substrate 425. The at least one substrate may have a first side and a second side, wherein the first layer stack and the second layer stack (both) are provided above the first side. The first side may be one side of the second substrate 425, for example, providing a layer for touch detection, a polarizing layer(s), and/or a protective cover 20. The second side of the second substrate 425 may be the second substrate 425 that provides one side of the screen device. The screen device can include a third substrate 405, such as a glass substrate ("thin film transistor-glass"), an array or layer 410 of thin film transistors, and a liquid crystal layer 415.

FIG. 6 is a schematic diagram of a touch screen panel 600 having a layered system in accordance with still other embodiments described herein. The embodiment of Fig. 6 is similar to the embodiment of Figs. 4 and 5, and similar or identical descriptions are omitted. The embodiment of Fig. 6 differs from the embodiments of Figs. 4 and 5 in the structure of the second wiring pattern. The second wiring pattern 640 of FIG. 6 is embedded in the color filter matrix 420.

In some embodiments, the layered system includes at least one substrate, such as a second substrate 425. The at least one substrate may have a first side and a second side, wherein the first layer stack is provided above the first side and the second layer stack is provided above the second side. According to some embodiments, the layered system may include a color filter matrix 420, wherein one or more of the first wiring patterns 530 or one or more of the second wiring patterns 640 are embedded in color In the filter matrix 420. In the example of FIG. 6, the second wiring pattern 640 is embedded in the color filter matrix 420.

According to some embodiments, which may be combined with other embodiments described herein, one or more of the first or second first wiring patterns 530 embedded in the color filter matrix 420, or one or more of the second wiring patterns 640 The second wiring system is configured as a black matrix. The black matrix can be configured to spatially separate individual colors or segments of the color filter matrix, such as colors or portions of red (R), green (G), and blue (B). By providing one or a plurality of first wirings or second wiring patterns 640 of the first wiring pattern 530 as one black matrix, the process steps for forming a separate black matrix can be omitted, and manufacturing can be reduced. Complexity and cost.

Although in the above examples of FIGS. 4 to 6, the first wiring pattern and the second wiring pattern may define one matrix for touch detection (xy pattern), it should be understood that a wiring pattern may be provided (for example, The first wiring pattern or the second wiring pattern) and can be configured for touch detection. In such an example, there may be no matrix wiring pattern, but there may be only one wiring pattern. For example, a wiring pattern can include the layer stack of the present disclosure. One or more of the wiring patterns may be, for example, a contact line. In particular, since the x-y pattern is not provided, the manufacturing process can be accelerated.

FIG. 7 is a schematic illustration of a deposition apparatus 700 for fabricating a layered system in accordance with embodiments described herein.

By way of example, a vacuum chamber 702 for depositing a layer therein is shown. As shown in FIG. 7, an additional chamber may be provided adjacent to the vacuum chamber 702. The vacuum chamber 702 can be separated from the adjacent chamber by a valve having a valve housing 704 and a valve unit 705. Therefore, after the carrier 714 having the substrate 701 thereon is inserted into the vacuum chamber 702 as indicated by the arrow 1, the valve unit 705 can be closed. Thus, the atmosphere in the vacuum chamber 702 can be created by creating a technical vacuum (for example, a vacuum pump connected to the vacuum chamber 702, and/or by injecting a process gas into the vacuum chamber 702). Individually controlled in the deposition zone).

According to some embodiments, the process gas may include an inert gas and/or a reactive gas, an inert gas such as argon, a reactive gas such as oxygen, nitrogen, hydrogen, and ammonia (NH ₃ ), ozone (O ₃ ), or an activating gas. Or an analogue thereof. In the vacuum chamber 702, a roller 710 is provided to carry the carrier 714 having the substrate 701 thereon into and out of the vacuum chamber 702.

While the example of FIG. 7 shows that at least two different groups of deposition sources 722 and 724 are in the same vacuum chamber 702, it should be understood that the different deposition processes are provided by groups of deposition sources 722 and 724. The group of deposition sources 722 and 724 can be provided in different vacuum chambers 702. Deposition sources 722 and 724 can be configured as layers for depositing a layered system, such as a metal layer, 2 or more layers, such as an IGZO layer and/or an IZO layer, and including molybdenum or molybdenum alloys. level one.

For example, deposition sources 722 and 724 can be rotatable cathodes of a target having a material to be deposited onto substrate 701. The cathode can be a rotatable cathode having a magnetron therein. Therefore, magnetron sputtering can be used for the deposition of layers. Deposition sources 722 and 724 are connected to an alternating current (AC) power supply 723 such that deposition sources 722 and 724 can be biased in an alternating manner.

As used herein, "magnetron sputtering" means sputtering using a magnet assembly, that is, a magnet assembly is a unit capable of generating a magnetic field. This magnet assembly consists of a permanent magnet. The permanent magnet can be placed in a rotatable target or coupled to a planar target such that free electrons within the generated magnetic field generated below the surface of the rotatable target can be trapped. Such a magnet assembly can also be arranged to be coupled to a planar cathode. Dual magnetron sputtering by magnetron cathode can be achieved, i.e., double magnetron cathode deposition sources 722 and 724, for example, but not limited to a cathode assembly TwinMag ^TM.

According to an embodiment, the layer of the layered system can be deposited by sputtering (e.g., magnetron sputtering) of a rotatable cathode having an AC power supply. Further, the transparent conductive oxide layer is sputtered from a target by direct current (DC) sputtering. During the sputtering process, deposition sources 722 and 724 are connected to a DC power supply 726 to collect electrons along with the anode 725. Thus, in accordance with additional embodiments that may be combined with other embodiments described herein, a transparent conductive oxide layer, such as an ITO layer, may be formed by DC sputtering, ie, a component having deposition sources 722 and 724. Sputtering.

For simplicity, deposition sources 722 and 724 are shown as being provided in a vacuum chamber 702. Typically, the deposition source used to deposit the different layers is provided in a different vacuum chamber 702, for example, a vacuum chamber 702 and another vacuum chamber adjacent to the vacuum chamber 702, as shown in FIG. . By providing a group of deposition sources 722 and 724 within different vacuum chambers 702, an atmosphere having a suitable process gas and/or a suitable technical vacuum can be provided at each deposition zone.

According to some embodiments, the depositing is performed by sputtering of one or more rotatable targets. More precisely, according to embodiments herein, at least one of the layers of the above mentioned layered system is deposited by sputtering of a rotatable target, thereby facilitating the formation of a high quality, stable layered system. For example, according to embodiments herein, the layers can be deposited to have higher uniformity and have low defects and contaminating particle density. The manufacture of high quality layered systems not only produces suitable optical and electrical properties, but also produces time-stable performance. In addition, manufacturing processes including sputtering by one or more rotatable targets can further drive higher production rates and produce lower amounts of contaminating particles compared to other deposition methods.

FIG. 8 is a flow chart showing a method 800 of fabricating a layered system for a touch screen panel in accordance with an embodiment of the present disclosure.

The method 800 includes providing a metal layer over the substrate, the metal layer comprising aluminum or an aluminum alloy (block 810); providing a first layer over the metal layer, wherein the first layer comprises a molybdenum or molybdenum alloy (block 820); providing an IGZO A layer or an IZO layer is over the first layer (block 830); a structured metal layer, a first layer, an IGZO layer, or an IZO layer (block 840), particularly in a step.

According to some embodiments, which may be combined with other embodiments described herein, the structuring of the metal layer, the first layer, and the IGZO layer or IZO layer is performed in the same structuring process. For example, the structured process is an etch process, particularly a wet etch process. By structuring all layers in a single structured process, a layered system can be fabricated with lower effort and cost.

According to the embodiments described herein, the manufacturing method of the layered system for the touch screen panel can be performed by a computer program, a software, a computer software product, and an interrelated controller, and can have a central processing unit, Memory, user interface, and input and output methods for communicating with corresponding components of equipment used to process large-area substrates.

The layered system of the present disclosure has improved optical properties (e.g., appearance presented to the user). In particular, the structure of the layer, such as a structured metal layer, is not visible to the user. Layered systems provide improved electrical properties. In particular, the structured conductor is a metal layer comprising aluminum or/and an aluminum alloy having high electrical conductivity. This is advantageous for large touch panel sizes. In view of this, the present disclosure provides a layered system for a touch screen panel that provides improved optical and electrical performance over conventional structures. By structuring multiple layers in a single structured process, a layered system can be fabricated with less effort and cost.

While the present invention has been described above by way of example, the embodiments of the present invention may be devised without departing from the scope of the invention. .

1‧‧‧ arrow
15‧‧‧Transparent adhesive layer
20‧‧‧Protection cover
10‧‧‧First substrate
100, 200, 300‧‧‧ layered systems
110‧‧‧metal layer
120, 470‧‧‧ first floor
130‧‧‧Indium gallium zinc oxide or indium zinc oxide layer
240, 460‧‧‧ second floor
250, 260, 351, 360‧‧‧ curves
350‧‧‧ third floor
400, 500, 600‧‧‧ touch screen panel
405‧‧‧ third substrate
410‧‧‧Array or layer of thin film transistors
415‧‧‧Liquid layer
420‧‧‧Color Filter Matrix
425‧‧‧second substrate
430, 530‧‧‧ first wiring pattern
435‧‧‧Insulation
440, 640‧‧‧second wiring pattern
450‧‧‧ polarizing layer
700‧‧‧Deposition equipment
701‧‧‧Substrate
702‧‧‧vacuum chamber
704‧‧‧Valve room
705‧‧‧Valve unit
710‧‧‧roller
714‧‧‧ Carrier
722, 724‧‧ ‧ sedimentary sources
723‧‧‧AC power supply
725‧‧‧Anode
726‧‧‧DC power supply
800‧‧‧ method
810, 820, 830, 840‧‧‧ squares
L‧‧‧wavelength
R‧‧‧reflectance

1 is a cross-sectional view of a layered system for a touch screen panel in accordance with an embodiment described herein. 2A is a cross-sectional view of a layered system for a touch screen panel in accordance with other embodiments described herein. Figure 2B is a cross-sectional view showing the layered system of Figure 2A with a protective cover. Fig. 2C is a graph showing the reflectance of the layered system of Figs. 2A and 2B. 3A is a cross-sectional view of a layered system for a touch screen panel in accordance with other embodiments described herein. Figure 3B is a cross-sectional view showing the layered system of Figure 3A with a protective cover. Figure 3C is a graph showing the reflectance of the layered system of Figures 3A and 3B. 4 is a schematic diagram of a touch screen panel having a layered system in accordance with an embodiment described herein. FIG. 5 is a schematic diagram of a touch screen panel having a layered system according to other embodiments described herein. FIG. 6 is a schematic diagram of a touch screen panel having a layered system according to still other embodiments described herein. Figure 7 is a schematic illustration of a deposition apparatus for fabricating a layered system in accordance with embodiments described herein. FIG. 8 is a flow chart showing a method of fabricating a layered system for a touch screen panel according to embodiments described herein.

10‧‧‧First substrate

100‧‧‧ layered system

110‧‧‧metal layer

120‧‧‧ first floor

130‧‧‧Indium gallium zinc oxide or indium zinc oxide layer

Claims (20)

A layered system for a touch screen panel, comprising: at least one layer stack having three or more layers, the three or more layers being in the same structured process Structured, wherein the three or more than three layers comprise: a metal layer comprising aluminum or an aluminum alloy; two or more than two other layers, wherein the two or more than two others The layer comprises: an indium gallium zinc oxide layer or an indium zinc oxide layer; and a first layer comprising molybdenum or a molybdenum alloy. The layered system of claim 1, wherein the two or more of the other layers are configured to darken the metal layer such that the metal layer is for human eyes It is invisible. The layered system of claim 1, wherein the first layer is provided on or over the metal layer, and/or wherein the indium gallium zinc oxide layer or the indium zinc oxide layer is provided On or above the first layer. The layered system of claim 1, wherein the first layer is selected from the group consisting of a molybdenum oxide layer (MoOxlayer), a molybdenum oxide alloy layer ((Mo-alloy) Oxlayer), and a molybdenum oxynitride layer (MoOxNx). Layer), molybdenum oxynitride alloy layer (Mo-alloy OxNx layer), molybdenum niobium oxide layer (MoNbOx layer), and molybdenum molybdenum layer (MoNb layer) group. The layered system of claim 1, further comprising at least one of the following: a second layer comprising molybdenum or a molybdenum alloy, in particular wherein the second layer is a molybdenum layer or a molybdenum molybdenum layer And a third layer comprising molybdenum or a molybdenum alloy, in particular wherein the three layers are a molybdenum layer or a molybdenum molybdenum layer. The layered system of claim 5, wherein the second layer is provided on or above the metal layer, in particular wherein the second layer is provided between a substrate and the metal layer. The layered system of claim 5, wherein the third layer is provided on or above the metal layer, in particular wherein the third layer is provided between the metal layer and the first layer. The layered system of claim 6, wherein the third layer is provided on or above the metal layer, in particular wherein the third layer is provided between the metal layer and the first layer. The layered system according to any one of claims 1 to 8, comprising a first wiring pattern and/or a second wiring pattern, the first wiring pattern having one or more first wirings, The second wiring pattern has one or more second wires, wherein the first wiring pattern and/or the second wiring pattern is configured for touch detection, in particular, the first wiring pattern and the second wiring The pattern is separated by an insulating layer. The layered system of claim 9, wherein the or the first wiring system is provided by the at least one layer stack, and/or wherein the second wiring system is comprised of a transparent conductive oxide Providing, in particular, indium tin oxide, or wherein the or the second wiring system is provided by the at least one layer stack, and/or wherein the or the first wiring system is provided by a transparent conductive oxide, in particular Indium tin oxide. The layered system of claim 9, wherein the at least one layer stack comprises a first layer stack and a second layer stack, wherein the first wiring pattern of the first wiring pattern or the first wiring system is A layer stack is provided, and the second wiring pattern of the second wiring pattern is provided by the second layer stack. The layered system of claim 10, wherein the at least one layer stack comprises a first layer stack and a second layer stack, wherein the first wiring pattern of the first wiring pattern or the first wiring system is A layer stack is provided, and the second wiring pattern of the second wiring pattern is provided by the second layer stack. The layered system of claim 11, further comprising at least one substrate, wherein the at least one substrate has a first side and a second side, wherein the first layer stack is provided above the first side And the second layer stack is provided above the second side, or wherein the first layer stack and the second layer stack are provided above the first side. The layered system of claim 12, further comprising at least one substrate, wherein the at least one substrate has a first side and a second side, wherein the first layer stack is provided above the first side And the second layer stack is provided above the second side, or wherein the first layer stack and the second layer stack are provided above the first side. The layered system of claim 9, further comprising at least one of: a polarizing layer, wherein the one or the first wiring or the second wiring pattern of the first wiring pattern a second wiring system is embedded in the polarizing layer, and a color filter matrix, wherein the one or the second wiring lines of the first wiring pattern or the first wiring patterns or the second wiring patterns are embedded in the first wiring pattern In the color filter matrix, particularly the first wiring or the second wiring pattern of the first wiring pattern or the second wiring pattern embedded in the color filter matrix Configured as a black matrix. A touch screen panel comprising: a screen device, in particular a liquid crystal screen display; and a layered system according to any one of claims 1 to 8 above the screen device. The touch screen panel of claim 16, wherein the layered system comprises a first wiring pattern and/or a second wiring pattern, the first wiring pattern having one or more first wirings, The second wiring pattern has one or more second wires, wherein the first wiring pattern and/or the second wiring pattern is configured for touch detection, in particular, the first wiring pattern and the second wiring The pattern is separated by an insulating layer. A manufacturing method for a layered system of a touch screen panel, the manufacturing method comprising: providing a metal layer over a substrate, the metal layer comprising aluminum or an aluminum alloy; providing a first layer above the metal layer Wherein the first layer comprises a molybdenum or molybdenum alloy; an indium gallium zinc oxide layer or an indium zinc oxide layer is provided over the first layer; and the metal layer, the first layer, and the indium gallium are structured A zinc oxide layer or the indium zinc oxide layer. The manufacturing method of claim 18, wherein the step of structuring the metal layer, the first layer, and the indium gallium zinc oxide layer or the indium zinc oxide layer is in the same structural process In progress, in particular, wherein the structured process is an etching process. The manufacturing method of claim 18 or 19, further comprising: providing a first wiring pattern and/or a second wiring pattern, the first wiring pattern having one or more first wirings, the second The wiring pattern has one or more second wires, wherein the first wiring pattern and/or the second wiring pattern is configured for touch detection, in particular, the first wiring pattern and the second wiring pattern are Separated by an insulating layer.