TW201609902A - Curable composition, manufacturing method for a cured film, cured film, touch screen and display device - Google Patents

Curable composition, manufacturing method for a cured film, cured film, touch screen and display device Download PDF

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TW201609902A
TW201609902A TW104128736A TW104128736A TW201609902A TW 201609902 A TW201609902 A TW 201609902A TW 104128736 A TW104128736 A TW 104128736A TW 104128736 A TW104128736 A TW 104128736A TW 201609902 A TW201609902 A TW 201609902A
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curable composition
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Hideyuki Nakamura
Daisuke Kashiwagi
Junichi Fujimori
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Fujifilm Corp
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Abstract

The present invention provides a curable composition for a cured film, a cured film formed by curing the curable composition and manufacturing method thereof, a variety of display devices having the cured film, and a touch screen. The curable composition provided by the present invention is characterized by comprising: component A which is a specific titanium-containing compound and/or a zirconium-containing compound; component B, which is a curable compound; and component C, which is a solvent and includes component C-1 and component C-2, wherein component C-1 comprises at least one organic solvent whose viscosity at 20 DEG C is from 50 mPa.s to 200 mPa.s and surface tension is from 30 mN /m to 41 mN /m, and component C-2 comprises at least one organic solvent whose viscosity at 20 DEG C is less than 50 mPa.s. Relative to the total mass of the component C, the component C-1 is from 20 % to 95 % by mass. The viscosity of the curable composition at 20 DEG C is from 1 mPa.s to 30 mPa.s.

Description

硬化性組合物、硬化膜的製造方法、硬化膜、觸摸屏及顯示裝置Curing composition, method for producing cured film, cured film, touch screen and display device

本發明涉及一種硬化性組合物、硬化膜的製造方法、硬化膜、以及使用所述硬化膜的觸摸屏、液晶顯示裝置、有機電致發光(Electroluminescence,EL)顯示裝置及觸摸屏顯示裝置等各種顯示裝置。The present invention relates to a curable composition, a method for producing a cured film, a cured film, and various display devices such as a touch panel, a liquid crystal display device, an organic electroluminescence (EL) display device, and a touch panel display device using the cured film. .

近年來, 為了形成層間絕緣膜、保護膜、光取出層、間隔件( spacer)構件、微透鏡(microlens)構件等而使用透明硬化性組合物。使用透明硬化性組合物所得的硬化物可用作液晶顯示裝置或有機EL 顯示裝置等各種顯示裝置、觸摸屏、攝像裝置、太陽電池等多種電子器件的構件。另外,已知為了進一步提高有機EL 顯示裝置的光提取效率或防止透視到觸摸屏的觸控檢測電極等而對透明硬化性組合物的折射率加以調整。作為已調整折射率的透明硬化性組合物, 已知使用了氧化金屬、或金屬烷氧化物的組合物( 例如參照專利文獻1)。另外, 作為具有圖案形成( patterning) 性能的已調整折射率的透明硬化性組合物, 已知專利文獻2 中記載的組合物。 [現有技術文獻] [專利文獻]In recent years, a transparent curable composition has been used in order to form an interlayer insulating film, a protective film, a light extraction layer, a spacer member, a microlens member, or the like. The cured product obtained by using the transparent curable composition can be used as a member of various electronic devices such as a liquid crystal display device or an organic EL display device, and various electronic devices such as a touch panel, an image pickup device, and a solar cell. Further, it is known to adjust the refractive index of the transparent curable composition in order to further improve the light extraction efficiency of the organic EL display device or to prevent the touch detection electrode or the like from seeping to the touch panel. As the transparent curable composition having a refractive index adjusted, a composition using an oxidized metal or a metal alkoxide is known (for example, see Patent Document 1). Further, the composition described in Patent Document 2 is known as a transparent curable composition having a refractive index having a patterning property. [Prior Art Document] [Patent Literature]

[專利文獻1]國際公開第2010/050580號 [專利文獻2]日本專利特開2012-203061號公報[Patent Document 1] International Publication No. 2010/050580 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2012-203061

[發明所要解決的問題][Problems to be solved by the invention]

近年來,從省液性、可對各種基板恰當塗布的觀點考慮,正在謀求可通過印刷法來塗布在製造顯示裝置或觸摸屏等電子器件時所使用的組合物。可知專利文獻1及專利文獻2中記載的組合物存在面內均勻性不充分等問題。 本發明所要解決的問題在於提供一種可獲得透明性高、面內均勻性高的硬化膜的硬化性組合物、使所述硬化性組合物硬化而成的硬化膜及其製造方法、以及具有所述硬化膜的有機EL顯示裝置、液晶顯示裝置、觸摸屏及觸摸屏顯示裝置。 [解決問題的技術手段]In recent years, from the viewpoint of liquid-saving property and application of various substrates, it is desired to apply a composition which can be applied to an electronic device such as a display device or a touch panel by a printing method. The compositions described in Patent Document 1 and Patent Document 2 have problems such as insufficient in-plane uniformity. The problem to be solved by the present invention is to provide a curable composition capable of obtaining a cured film having high transparency and high in-plane uniformity, a cured film obtained by curing the curable composition, a method for producing the same, and a method for producing the same. An organic EL display device, a liquid crystal display device, a touch panel, and a touch panel display device of the cured film. [Technical means to solve the problem]

本發明的所述問題是通過以下的<1>、<9>~<11>或<14>~<17>所記載的手段來解決。以下一併記載作為優選實施方式的<2>~<8>、<12>及<13>。 <1> 一種硬化性組合物,其特徵在於含有:作為成分A的選自由下述a1~a3所組成的組群中的至少一種、作為成分B的硬化性化合物、以及作為成分C的溶劑;且成分C含有:作為成分C-1的20℃下的粘度為50 mPa·s以上且200 mPa·s以下並且表面張力為30 mN/m以上且41 mN/m以下的至少一種有機溶劑、及作為成分C-2的20℃下的粘度小於50 mPa·s的至少一種有機溶劑,相對于成分C的總質量,成分C-1的含量為20質量%~95質量%,硬化性組合物的20℃下的粘度為1 mPa·s以上且30 mPa·s以下; a1:具有烷氧基的鈦化合物及/或鋯化合物, a2:具有至少一個直接鍵結在鈦原子或鋯原子上的烷氧基的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物, a3:含有鈦原子及/或鋯原子的金屬氧化物。為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above problems of the present invention are solved by the means described in <1>, <9> to <11> or <14> to <17> below. <2> to <8>, <12>, and <13> which are preferred embodiments are described below. <1> A curable composition comprising, as component A, at least one selected from the group consisting of a1 to a3 described below, a curable compound as component B, and a solvent as component C; Further, the component C contains at least one organic solvent having a viscosity at 20 ° C of 50 mPa·s or more and 200 mPa·s or less and a surface tension of 30 mN/m or more and 41 mN/m or less as the component C-1, and The content of the component C-1 is 20% by mass to 95% by mass based on the total mass of the component C as at least one organic solvent having a viscosity at 20 ° C of 20 ° C as the component C-2, and the curable composition is The viscosity at 20 ° C is 1 mPa·s or more and 30 mPa·s or less; a1: a titanium compound having an alkoxy group and/or a zirconium compound, a2: having at least one alkane directly bonded to a titanium atom or a zirconium atom Alkoxy alkane, zirconium oxymethane and/or titanyl-zirconoxane condensate, a3: a metal oxide containing a titanium atom and/or a zirconium atom. The above described features and advantages of the invention will be apparent from the following description.

<2> 根據<1>所記載的硬化性組合物,其中成分B為聚合性化合物。 <3> 根據<1>或<2>所記載的硬化性組合物,其中成分C-1含有選自由萜品醇(terpineol)、二氫萜品醇(dihydroterpineol)、4-(乙醯氧基)-α,α,4-三甲基環己烷甲醇乙酸酯、及2-[1-甲基-1-(4-甲基-3-環己烯-1-基)乙氧基]乙醇所組成的組群中的至少一個。 <4> 根據<1>至<3>中任一項所記載的硬化性組合物,其中相對於硬化性組合物的總質量,所述硬化性組合物中的固體成分的總量為2質量%~15質量%。 <5> 根據<1>至<4>中任一項所記載的硬化性組合物,其中成分B含有六官能以上的聚合性化合物。 <6> 根據<1>至<5>中任一項所記載的硬化性組合物,其中所述a2是通過相對於鈦原子及鋯原子的總摩爾量1.0摩爾為0.5倍~1.9倍摩爾當量的水,使選自由具有烷氧基的鈦化合物、具有烷氧基的鋯化合物以及具有鹵素基的鈦化合物及具有鹵素基的鋯化合物所組成的組群中的至少一種進行水解縮合所得的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物。 <7> 根據<1>至<6>中任一項所記載的硬化性組合物,其中成分A包含所述a2。 <8> 根據<1>至<7>中任一項所記載的硬化性組合物,其含有光聚合引發劑作為成分D。<2> The curable composition according to <1>, wherein the component B is a polymerizable compound. <3> The curable composition according to <1> or <2> wherein the component C-1 is selected from the group consisting of terpineol, dihydroterpineol, and 4-(ethylideneoxy). )-α,α,4-trimethylcyclohexanemethanol acetate, and 2-[1-methyl-1-(4-methyl-3-cyclohexen-1-yl)ethoxy] At least one of the groups consisting of ethanol. The curable composition according to any one of <1> to <3> wherein the total amount of solid components in the curable composition is 2 mass based on the total mass of the curable composition. % to 15% by mass. The curable composition according to any one of <1> to <4> wherein the component B contains a hexafunctional or higher functional polymerizable compound. The curable composition according to any one of <1> to <5> wherein the a2 is 0.5 to 1.9 times molar equivalent by 1.0 mol of the total molar amount with respect to the titanium atom and the zirconium atom. Titanium obtained by hydrolyzing and condensing at least one selected from the group consisting of a titanium compound having an alkoxy group, a zirconium compound having an alkoxy group, and a titanium compound having a halogen group and a zirconium compound having a halogen group Oxyalkane, zirconium oxide and/or titanyl-zirconoxane condensate. The curable composition according to any one of <1> to <6> wherein the component A contains the a2. <8> The curable composition according to any one of <1> to <7> which contains a photopolymerization initiator as component D.

<9> 一種硬化膜的製造方法,其至少依次包括工序a~工序d, 工序a:塗布工序,將根據<1>至<8>中任一項所記載的硬化性組合物塗布在基板上; 工序b:溶劑除去工序,從所塗布的硬化性組合物中除去溶劑; 工序c:曝光工序,利用光化射線對除去了溶劑的硬化性組合物的至少一部分進行曝光; 工序d:熱處理工序,對硬化性組合物進行熱處理。<9> A method for producing a cured film, comprising at least a step a to a step d, and a step a: a coating step of applying the curable composition according to any one of <1> to <8> on a substrate Step b: solvent removal step, removing solvent from the applied curable composition; Step c: Exposure step, exposing at least a portion of the curable composition from which the solvent has been removed by actinic radiation; Step d: Heat treatment step The heat-treated composition is heat-treated.

<10> 一種硬化膜的製造方法,其至少依次包括工序1~工序5, 工序1:塗布工序,將根據<1>至<8>中任一項所記載的硬化性組合物塗布在基板上; 工序2:溶劑除去工序,從所塗布的硬化性組合物中除去溶劑; 工序3:曝光工序,利用光化射線對除去了溶劑的硬化性組合物的至少一部分進行曝光; 工序4:顯影工序,利用水性顯影液對經曝光的硬化性組合物進行顯影; 工序5:熱處理工序,對經顯影的硬化性組合物進行熱處理。 <11> 一種硬化膜,其是使根據<1>至<8>中任一項所記載的硬化性組合物硬化而成。 <12> 根據<11>所記載的硬化膜,其為層間絕緣膜或外塗膜。 <13> 根據<11>或<12>所記載的硬化膜,其波長550 nm下的折射率為1.6~1.9。 <14> 一種液晶顯示裝置,具有根據<11>至<13>中任一項所記載的硬化膜。 <15> 一種有機EL顯示裝置,具有根據<11>至<13>中任一項所記載的硬化膜。 <16> 一種觸摸屏,具有根據<11>至<13>中任一項所記載的硬化膜。 <17> 一種觸摸屏顯示裝置,具有根據<11>至<13>中任一項所記載的硬化膜。 [發明的效果]<10> A method for producing a cured film, comprising at least a step 1 to a step 5, and a step 1: a coating step of applying the curable composition according to any one of <1> to <8> on a substrate Step 2: solvent removal step, removing solvent from the applied curable composition; Step 3: Exposure step, exposing at least a portion of the curable composition from which the solvent has been removed by actinic radiation; Step 4: Developing step The exposed curable composition is developed with an aqueous developing solution; Step 5: A heat treatment step of heat-treating the developed curable composition. <11> A cured film obtained by curing the curable composition according to any one of <1> to <8>. <12> The cured film according to <11>, which is an interlayer insulating film or an overcoat film. <13> The cured film according to <11> or <12> has a refractive index of 1.6 to 1.9 at a wavelength of 550 nm. <14> A liquid crystal display device having the cured film according to any one of <11> to <13>. <15> An organic EL display device having the cured film according to any one of <11> to <13>. <16> A touch panel having the cured film according to any one of <11> to <13>. <17> A touch panel display device having the cured film according to any one of <11> to <13>. [Effects of the Invention]

根據本發明,可提供一種可獲得透明性高、面內均勻性高的硬化膜的硬化性組合物、使所述硬化性組合物硬化而成的硬化膜及其製造方法、以及具有所述硬化膜的有機EL顯示裝置、液晶顯示裝置、觸摸屏及觸摸屏顯示裝置。According to the present invention, it is possible to provide a curable composition capable of obtaining a cured film having high transparency and high in-plane uniformity, a cured film obtained by curing the curable composition, a method for producing the same, and the same An organic EL display device for a film, a liquid crystal display device, a touch panel, and a touch panel display device.

以下, 對本發明的內容加以詳細說明。以下記載的構成要件的說明有時是根據本發明的具代表性的實施方式來進行, 但本發明不限定於此種實施方式。此外, 本案說明書中, 所謂“~ ”是以包含其前後所記載的數值作為下限值及上限值的含意而使用。另外,所謂本發明的有機EL 元件,是指有機電致發光元件。在本說明書中的基團( 原子團) 的表述中, 未記載經取代及未經取代的表述不僅包含不具有取代基的基團( 原子團),並且也包含具有取代基的基團( 原子團)。例如所謂“烷基”, 不僅包含不具有取代基的烷基( 未經取代的烷基),而且也包含具有取代基的烷基( 經取代的烷基)。另外,本說明書中的化學結構式有時也以省略氫原子的簡略結構式來記載。此外, 本說明書中, “(甲基)丙烯酸酯”表示丙烯酸酯及甲基丙烯酸酯,“(甲基)丙烯酸”表示丙烯酸及甲基丙烯酸,“(甲基)丙烯醯基”表示丙烯醯基及甲基丙烯醯基。本發明中, 也將“選自由a1~ a3 所組成的組群中的至少一種”等簡稱為“成分A”等。另外, 本發明中, “質量%”與“重量%”為相同含意, “質量份”與“重量份”為相同含意。另外,本發明中,優選實施方式的組合為更優選的實施方式。Hereinafter, the contents of the present invention will be described in detail. The description of the constituent elements described below may be performed according to a representative embodiment of the present invention, but the present invention is not limited to such an embodiment. In the present specification, the term "~" is used to mean that the numerical values described before and after are included as the lower limit and the upper limit. In addition, the organic EL element of the present invention means an organic electroluminescence element. In the expression of the group (atomic group) in the present specification, the unsubstituted and unsubstituted expression is not described to include not only a group having no substituent (atomic group) but also a group having a substituent (atomic group). For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group). Further, the chemical structural formula in the present specification may be described in a simplified structural formula in which a hydrogen atom is omitted. Further, in the present specification, "(meth)acrylate" means acrylate and methacrylate, "(meth)acrylic" means acrylic acid and methacrylic acid, and "(meth)acrylylene group" means acrylonitrile group. And methacryl oxime. In the present invention, "at least one selected from the group consisting of a1 to a3" or the like is simply referred to as "component A" or the like. In the present invention, "% by mass" and "% by weight" have the same meaning, and "parts by mass" and "parts by weight" have the same meaning. Further, in the present invention, the combination of the preferred embodiments is a more preferred embodiment.

本發明的鈦氧烷、鋯氧烷及鈦氧烷-鋯氧烷縮合物中的重量平均分子量及數量平均分子量是利用凝膠滲透色譜(Gel Permeation Chromatography,GPC)法來測定。The weight average molecular weight and the number average molecular weight of the titanyl, zirconium and titanyl-zirconoxane condensate of the present invention are measured by a gel permeation chromatography (GPC) method.

(硬化性組合物) 本發明的硬化性組合物(以下也簡稱為“組合物”)的特徵在於含有:作為成分A的選自由下述a1~a3所組成的組群中的至少一種、作為成分B的硬化性化合物、以及作為成分C的溶劑;且成分C含有:作為成分C-1的20℃下的粘度為50 mPa·s以上且200 mPa·s以下並且表面張力為30 mN/m以上且41 mN/m以下的至少一種有機溶劑、及作為成分C-2的20℃下的粘度小於50 mPa·s的至少一種有機溶劑,相對于成分C的總質量,成分C-1的含量為20質量%~95質量%,硬化性組合物的20℃下的粘度為1 mPa·s以上且30 mPa·s以下。 a1:具有烷氧基的鈦化合物及/或鋯化合物, a2:具有至少一個直接鍵結在鈦原子或鋯原子上的烷氧基的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物, a3:含有鈦原子及/或鋯原子的金屬氧化物。 本發明的硬化性組合物適合用於用以改良可見度的折射率調整層(指數匹配(Index Matching)層)、或用以防止透視的折射率調整絕緣膜或外塗層等用途中。(Curable composition) The curable composition of the present invention (hereinafter also referred to simply as "composition") is characterized by containing at least one selected from the group consisting of a1 to a3 described below as component A. The curable compound of the component B and the solvent of the component C; and the component C contains the viscosity at 20 ° C as the component C-1 of 50 mPa·s or more and 200 mPa·s or less and a surface tension of 30 mN/m. The content of the component C-1 is at least one organic solvent of 41 mN/m or less and at least one organic solvent having a viscosity of less than 50 mPa·s at 20 ° C as the component C-2, and the total mass of the component C. The viscosity of the curable composition at 20° C. is from 20% by mass to 95% by mass, and is from 1 mPa·s to 30 mPa·s. A1: a titanium compound having an alkoxy group and/or a zirconium compound, a2: a titanyl, zirconium and/or a titanyl-zirconium having at least one alkoxy group directly bonded to a titanium atom or a zirconium atom Oxyalkyl condensate, a3: a metal oxide containing a titanium atom and/or a zirconium atom. The curable composition of the present invention is suitably used in applications such as a refractive index adjusting layer (index matching layer) for improving visibility, or a refractive index adjusting insulating film or overcoat layer for preventing fluoroscopy.

在觸摸屏領域中,聚合物絕緣體(insulator)可見或氧化銦錫(Indium Tin Oxide,ITO)等配線可見(所謂的透視)已成為問題。為了解決此問題而使用折射率調整層(指數匹配層)。 從前,作為指數匹配層一直使用的是濺鍍式的指數匹配層,例如氧化鈮的濺鍍蒸鍍層等,但由於材料或製作花費費用,因此正在研究賦予高折射率的氧化鈦或氧化鋯等金屬氧化物、或者烷氧化鈦或烷氧化鋯等金屬烷氧化物、或者作為這些的縮合物的鈦氧烷或鋯氧烷等來作為塗布液而形成層的塗布形式。 發明者等人進行了努力研究,結果可知,若為使用通常的溶劑的塗布液則會產生以下問題:乾燥時成為白濁的表面狀態、或者透明性惡化、或者產生凹陷故障、或者在利用柔版印刷或噴墨印刷進行賦予時產生面內分佈等。 本發明者等人發現,通過組合使用特定的溶劑而能夠獲得可獲得透明性高、面內均勻性高的硬化膜的硬化性組合物,從而完成了本發明。 此外,詳細效果的表現機制並不明確,但若為了獲得適於柔版印刷或噴墨印刷的粘度而使用醇系的高粘度溶劑,則存在因高粘度溶劑通常而言表面張力高而產生凹陷的問題。另外,若使用表面張力高的溶劑,則還存在因乾燥時或乾燥後與基板的相性而產生針孔(pinhole)的問題。進而,還存在與成分A及成分B的相容性低,在乾燥時發生相分離而白濁,透明性惡化的問題。可推測,在本發明中,通過組合使用特定的溶劑來作為溶劑,組合物的粘度提高,而且表面張力降低,進而抑制乾燥時的相分離及隨之出現的白濁的產生,但詳細效果的表現機制不明確。In the field of touch screens, it has become a problem that polymer insulators are visible or wiring such as indium tin oxide (ITO) is visible (so-called perspective). In order to solve this problem, a refractive index adjusting layer (index matching layer) is used. In the past, as an index matching layer, a sputtering-type index matching layer, such as a sputtering vapor deposition layer of cerium oxide, has been used. However, due to the cost of materials or production, titanium oxide or zirconium oxide which imparts a high refractive index is being studied. A metal oxide, or a metal alkoxide such as a titanium alkoxide or a zirconium alkoxide, or a titanyl or zirconium oxide which is a condensate of these, is used as a coating liquid to form a coating form of a layer. As a result of intensive studies, the inventors of the present invention have found that the coating liquid using a usual solvent has a problem in that it becomes a cloudy surface state during drying, or the transparency is deteriorated, or a dishing failure occurs, or a flexo is used. In-plane distribution or the like occurs when printing or inkjet printing is performed. The present inventors have found that a curable composition capable of obtaining a cured film having high transparency and high in-plane uniformity can be obtained by using a specific solvent in combination, and completed the present invention. Further, the expression mechanism of the detailed effect is not clear, but if an alcohol-based high-viscosity solvent is used in order to obtain a viscosity suitable for flexographic printing or inkjet printing, there is a case where a high-viscosity solvent generally has a high surface tension and a depression occurs. The problem. Further, when a solvent having a high surface tension is used, there is a problem that pinholes are generated due to the phase property with the substrate during drying or drying. Further, there is a problem that compatibility with the component A and the component B is low, phase separation occurs during drying, white turbidity, and transparency is deteriorated. It is presumed that in the present invention, by using a specific solvent in combination as a solvent, the viscosity of the composition is improved, and the surface tension is lowered, thereby suppressing phase separation during drying and the occurrence of white turbidity, but the effect of detailed effects is exhibited. The mechanism is not clear.

本發明的硬化性組合物優選感光性組合物,可為正型感光性組合物,也可為負型感光性組合物,優選負型感光性組合物。 在本發明的硬化性組合物為負型感光性組合物的情況下,優選的是成分B為聚合性化合物。 在本發明的硬化性組合物為正型感光性組合物的情況下,優選含有如下聚合物及光酸產生劑,所述聚合物包含具有酸基由酸分解性基保護的基團的結構單元。另外,在本發明的硬化性組合物為正型感光性組合物的情況下,優選化學增幅型的正型感光性組合物(化學增幅正型感光性組合物),另外,也可為使用1,2-醌二疊氮化合物作為感應光化射線的光酸產生劑的非化學增幅型的正型感光性組合物。就高感度且透明性優異的方面來看,優選化學增幅正型感光性組合物。The curable composition of the present invention is preferably a photosensitive composition, and may be a positive photosensitive composition or a negative photosensitive composition, and is preferably a negative photosensitive composition. When the curable composition of the present invention is a negative photosensitive composition, it is preferred that the component B is a polymerizable compound. In the case where the curable composition of the present invention is a positive photosensitive composition, it is preferred to contain a polymer containing a structural unit having a group in which an acid group is protected by an acid-decomposable group, and a photoacid generator. . Further, when the curable composition of the present invention is a positive photosensitive composition, a chemically amplified positive photosensitive composition (chemically amplified positive photosensitive composition) is preferably used, or 1 may be used. A 2-quinonediazide compound is a non-chemically amplified positive photosensitive composition which is a photoacid generator for inducing actinic rays. A chemically amplified positive photosensitive composition is preferred in terms of high sensitivity and excellent transparency.

另外,在本發明的硬化性組合物為負型感光性組合物的情況下,優選的是在利用光化射線的聚合後,通過對所得的硬化膜等硬化物進行熱處理,而硬化物的強度變得更高的組合物。 進而,在本發明的硬化性組合物為正型感光性組合物的情況下,優選的是在將曝光部除去後,通過對未曝光部進行加熱,而產生交聯反應並硬化。Moreover, when the curable composition of the present invention is a negative photosensitive composition, it is preferable to heat-treat the cured product such as the obtained cured film after polymerization by actinic rays, and the strength of the cured product is preferably obtained. A composition that becomes higher. Further, when the curable composition of the present invention is a positive photosensitive composition, it is preferred that after the exposed portion is removed, the unexposed portion is heated to cause a crosslinking reaction and harden.

本發明的硬化性組合物優選透明硬化物製造用硬化性組合物,更優選透明硬化膜製造用硬化性組合物。 進而,本發明的硬化性組合物優選的是所得的硬化物的波長550 nm下的折射率為1.60以上的硬化性組合物,更優選的是所得的硬化物的波長550 nm下的折射率為1.62以上的硬化性組合物。另外,所得的硬化物的波長550 nm下的折射率優選1.90以下,更優選1.85以下。 此外,在無特別說明的情況下,本發明的折射率是25℃下的波長550 nm的光的折射率。 另外,本發明的硬化性組合物可合適地用作層間絕緣膜用或外塗膜用硬化性組合物。 進而,本發明的硬化性組合物可合適地用作折射率調整層用硬化性組合物。The curable composition of the present invention is preferably a curable composition for producing a transparent cured product, and more preferably a curable composition for producing a transparent cured film. Further, the curable composition of the present invention preferably has a curable composition having a refractive index of 1.60 or more at a wavelength of 550 nm of the obtained cured product, and more preferably a refractive index of the obtained cured product at a wavelength of 550 nm. A curable composition of 1.62 or more. Further, the refractive index of the obtained cured product at a wavelength of 550 nm is preferably 1.90 or less, more preferably 1.85 or less. Further, the refractive index of the present invention is a refractive index of light having a wavelength of 550 nm at 25 ° C unless otherwise specified. Further, the curable composition of the present invention can be suitably used as a curable composition for an interlayer insulating film or an overcoat film. Further, the curable composition of the present invention can be suitably used as a curable composition for a refractive index adjusting layer.

成分A:選自由a1~a3所組成的組群中的至少一種 本發明的硬化性組合物含有選自由下述a1~a3所組成的組群中的至少一種作為成分A,且相對於硬化性組合物的總固體成分,成分A的含量為40質量%~80質量%。 a1:具有烷氧基的鈦化合物及/或鋯化合物, a2:具有至少一個直接鍵結在鈦原子或鋯原子上的烷氧基的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物, a3:含有鈦原子及/或鋯原子的金屬氧化物。 另外,若為本領域技術人員則當然明知,所述a1與“具有烷氧基的鈦化合物及/或具有烷氧基的鋯化合物”為相同含意,所述a2與“具有至少一個直接鍵結在鈦原子上的烷氧基的鈦氧烷、具有至少一個直接鍵結在鋯原子上的烷氧基的鋯氧烷、或具有至少一個直接鍵結在鈦原子或鋯原子上的烷氧基的鈦氧烷-鋯氧烷縮合物”為相同含意,所述a3與“含有鈦原子的金屬氧化物及/或含有鋯原子的金屬氧化物”為相同含意。Component A: At least one of the curable compositions of the present invention selected from the group consisting of a1 to a3 contains at least one selected from the group consisting of a1 to a3 described below as component A, and is relative to curability. The total solid content of the composition, the content of the component A is 40% by mass to 80% by mass. A1: a titanium compound having an alkoxy group and/or a zirconium compound, a2: a titanyl, zirconium and/or a titanyl-zirconium having at least one alkoxy group directly bonded to a titanium atom or a zirconium atom Oxyalkyl condensate, a3: a metal oxide containing a titanium atom and/or a zirconium atom. Further, it is of course understood by those skilled in the art that the a1 has the same meaning as "a titanium compound having an alkoxy group and/or a zirconium compound having an alkoxy group", and the a2 and "having at least one direct bond" a titanyl alkoxy group on a titanium atom, a zirconium oxide having at least one alkoxy group directly bonded to a zirconium atom, or an alkoxy group having at least one directly bonded to a titanium atom or a zirconium atom The aluminoxane-zirconoxane condensate has the same meaning, and the a3 has the same meaning as the "metal oxide containing a titanium atom and/or a metal oxide containing a zirconium atom".

相對於硬化性組合物的總固體成分,成分A的含量優選15質量%~90質量%。在將硬化物(硬化膜)的折射率設為1.60~1.90的情況下,從折射率調整的觀點來看,更優選15質量%~60質量%,進而優選17.5質量%~45質量%,特別優選20質量%~35質量%。另外,在用作高折射率材料的情況下,從折射率調整的觀點來看,優選40質量%~90質量%,更優選50質量%~85質量%,進而優選60質量%~80質量%。此外,所謂硬化性組合物的“固體成分”,表示去掉溶劑等揮發性成分所得的成分。另外,所述固體成分當然也可為並非固體的液狀成分。The content of the component A is preferably 15% by mass to 90% by mass based on the total solid content of the curable composition. When the refractive index of the cured product (cured film) is 1.60 to 1.90, from the viewpoint of refractive index adjustment, it is more preferably 15% by mass to 60% by mass, still more preferably 17.5% by mass to 45% by mass, and particularly It is preferably 20% by mass to 35% by mass. Further, when used as a high refractive index material, from the viewpoint of refractive index adjustment, it is preferably 40% by mass to 90% by mass, more preferably 50% by mass to 85% by mass, still more preferably 60% by mass to 80% by mass. . In addition, the "solid component" of the curable composition means a component obtained by removing a volatile component such as a solvent. Further, the solid component may of course be a liquid component which is not solid.

成分A可為單獨a1、單獨a2、單獨a3、a1與a2的混合物、a1與a3的混合物、a2與a3的混合物、a1與a2與a3的混合物的任一種,從組合物的保存穩定性的觀點來看,優選單獨a2、單獨a3、或a1與a2的混合物,更優選單獨a2。 另外,也可並用鈦化合物與鋯化合物作為a1。 另外,從折射率及保存穩定性的觀點來看,成分A優選的是至少包含a2。 從折射率及顯影性的觀點來看,成分A優選的是選自由鈦化合物、鈦氧烷及氧化鈦所組成的組群中,另外,從低溫硬化性、硬化速度及穩定性的觀點來看,優選的是選自由鋯化合物、鋯氧烷及氧化鋯所組成的組群中。Component A may be a single a1, a single a2, a single a3, a mixture of a1 and a2, a mixture of a1 and a3, a mixture of a2 and a3, a mixture of a1 and a2 and a3, from the storage stability of the composition. From the viewpoint, it is preferred to use a2 alone, a3 alone, or a mixture of a1 and a2, and more preferably a2 alone. Further, a titanium compound and a zirconium compound may be used in combination as a1. Further, from the viewpoint of refractive index and storage stability, the component A preferably contains at least a2. From the viewpoint of the refractive index and the developability, the component A is preferably selected from the group consisting of a titanium compound, a titanate, and a titanium oxide, and from the viewpoint of low-temperature curability, curing speed, and stability. Preferably, it is selected from the group consisting of zirconium compounds, zirconium oxides and zirconium oxides.

a1:具有烷氧基的鈦化合物及/或鋯化合物, 作為a1:具有烷氧基的鈦化合物及具有烷氧基的鋯化合物,可舉出:單烷氧化鈦、二烷氧化鈦、三烷氧化鈦、四烷氧化鈦、單烷氧化鋯、二烷氧化鋯、三烷氧化鋯及四烷氧化鋯,從膜物性的觀點來看,優選四烷氧化鈦及四烷氧化鋯,更優選四烷氧化鈦。 此外,a1只要具有至少一個烷氧基即可,也可具有鹵素基或烷基等其他基團。 從膜物性的觀點來看,四烷氧化鈦優選下述式a1-1所表示的四烷氧化鈦。 另外,從膜物性的觀點來看,四烷氧化鋯優選下述式a1-2所表示的四烷氧化鋯。A1: a titanium compound having an alkoxy group and/or a zirconium compound, and a1: a titanium compound having an alkoxy group and a zirconium compound having an alkoxy group, examples thereof include monoalcobalt titanium oxide, dialkyl titanium oxide, and trioxane Titanium oxide, titanium tetraaloxide, zirconium monosilane, zirconium dialkylate, zirconium trioxide, and zirconium tetranitride are preferably tetraalkyltitanium oxide and tetraalkylzirconia, and more preferably four, from the viewpoint of film physical properties. Alkyl oxide. Further, a1 may have at least one alkoxy group, and may have another group such as a halogen group or an alkyl group. From the viewpoint of the physical properties of the film, the tetraalkyl titanium oxide is preferably a tetraalkyl titanium oxide represented by the following formula a1-1. Further, from the viewpoint of the physical properties of the film, the tetraalkyl zirconia is preferably a tetraalkyl zirconia represented by the following formula a1-2.

[化1] [Chemical 1]

式a1-1及式a1-2中,R1 ~R4 分別獨立地表示碳數1~18的烷基、碳數6~18的芳基或碳數7~18的芳烷基。In the formula a1-1 and the formula a1-2, R 1 to R 4 each independently represent an alkyl group having 1 to 18 carbon atoms, an aryl group having 6 to 18 carbon atoms or an aralkyl group having 7 to 18 carbon atoms.

從膜物性的觀點來看,式a1-1及式a1-2中的R1 ~R4 分別獨立地優選碳數1~18的烷基,更優選碳數1~8的烷基,特別優選碳數1~5的烷基。From the viewpoint of the physical properties of the film, R 1 to R 4 in the formula a1-1 and the formula a1-2 are each independently preferably an alkyl group having 1 to 18 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably. An alkyl group having 1 to 5 carbon atoms.

式a1-1所表示的四烷氧化鈦不限定於以下的具體例,例如可舉出:四甲氧化鈦、四乙氧化鈦、四正丙氧化鈦、四異丙氧化鈦、四正丁氧化鈦、四異丁氧化鈦、二異丙氧基二正丁氧化鈦、二叔丁氧基二異丙氧化鈦、四叔丁氧化鈦、四異辛氧化鈦、四硬脂基烷氧化鈦等。 式a1-2所表示的四烷氧化鋯不限定於以下的具體例,例如可舉出:四甲氧化鋯、四乙氧化鋯、四正丙氧化鋯、四異丙氧化鋯、四正丁氧化鋯、四異丁氧化鋯、二異丙氧基二正丁氧化鋯、二叔丁氧基二異丙氧化鋯、四叔丁氧化鋯、四異辛氧化鋯、四硬脂基烷氧化鋯等。 這些化合物可單獨使用一種或混合使用兩種以上。The tetraalkyl titanate represented by the formula a1-1 is not limited to the following specific examples, and examples thereof include tetratitanium oxide, tetra-titanium oxide, tetra-n-propoxide-titanium oxide, titanium tetraisopropoxide, and tetra-n-butoxide. Titanium, tetraisobutyl titanium oxide, diisopropoxy di-n-butoxide titanium oxide, di-tert-butoxy diisopropyl titanium oxide, tetra-tert-butyl titanium oxide, tetraisooctyl titanium oxide, tetrastearyl titanium oxide, etc. . The tetradecyl zirconia represented by the formula a1-2 is not limited to the following specific examples, and examples thereof include zirconium tetrachloride, zirconium tetraoxide, tetra-n-propoxide zirconia, zirconium tetraisopropoxide, and tetra-n-butoxide. Zirconium, tetraisobutyl zirconia, diisopropoxy bis-n-butoxide zirconia, di-tert-butoxy-zirconium diiso-zirconia, tetra-tert-butyl zirconia, tetraiso-octyl zirconia, tetra-stearyl alkoxy zirconium oxide, etc. . These compounds may be used alone or in combination of two or more.

鈦氧烷也被稱為聚鈦氧烷,為具有兩個以上的Ti-O-Ti鍵的化合物。其製造方法例如可舉出:使用水使所述式a1-1所表示的四烷氧化鈦進行水解縮合而獲得鈦氧烷的方法。除此以外,也可使四氯化鈦等鹵化鈦進行水解·縮合。其中,從合成的容易性來看,優選烷氧化鈦、氯化鈦,更優選烷氧化鈦。 鋯氧烷也被稱為聚鋯氧烷,為具有兩個以上的Zr-O-Zr鍵的化合物。另外,其製造方法可舉出:除了將原料變更為烷氧化鋯或鹵化鋯等鋯化合物以外,與所述鈦氧烷的製造方法相同的方法。 鈦氧烷-鋯氧烷縮合物為使用所述鈦化合物及所述鋯化合物兩者進行水解縮合而成的縮合物。另外,其製造方法可舉出:除了並用鈦化合物與鋯化合物作為原料以外,與所述製造方法相同的方法。The titanyl oxide, also called polytitanium oxide, is a compound having two or more Ti-O-Ti bonds. The production method is, for example, a method in which a titanium alkoxide represented by the formula a1-1 is hydrolyzed and condensed using water to obtain a titanyl oxide. In addition to this, it is also possible to carry out hydrolysis and condensation of a titanium halide such as titanium tetrachloride. Among them, from the viewpoint of easiness of synthesis, a titanium alkoxide or a titanium chloride is preferable, and a titanium alkoxide is more preferable. Zirconoxane, also known as polyzirconium oxide, is a compound having two or more Zr-O-Zr bonds. Further, the production method thereof is the same as the method for producing the titanal oxide, except that the raw material is changed to a zirconium compound such as zirconium azide or zirconium halide. The titanyl-zirconoxane condensate is a condensate obtained by hydrolysis-condensation using both the titanium compound and the zirconium compound. Further, the production method thereof is the same as the above-described production method except that a titanium compound and a zirconium compound are used in combination as a raw material.

a2:具有至少一個直接鍵結在鈦原子或鋯原子上的烷氧基的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物 所述a2優選的是通過相對於鈦原子及鋯原子的總摩爾量1.0摩爾為0.5倍~1.9倍摩爾當量的水,使選自由具有烷氧基的鈦化合物、具有烷氧基的鋯化合物、具有鹵素基的鈦化合物及具有鹵素基的鋯化合物所組成的組群中的至少一種進行水解縮合所得的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物,更優選的是通過相對於鈦原子及鋯原子的總摩爾量1.0摩爾為0.5倍~1.9倍摩爾當量的水,使選自由具有烷氧基的鈦化合物及具有烷氧基的鋯化合物所組成的組群中的至少一種進行水解縮合所得的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物。 在使用具有鹵素基的鈦化合物及/或具有鹵素基的鋯化合物的情況下,優選的是與具有烷氧基的鈦化合物及/或具有烷氧基的鋯化合物並用,或使用為具有鹵素基的鈦化合物及具有鹵素基的鋯化合物且至少具有一個以上的烷氧基的化合物,或添加到水中並添加醇化合物進行水解縮合。 具有鹵素基的鈦化合物及具有鹵素基的鋯化合物可舉出:單鹵化鈦、二鹵化鈦、三鹵化鈦、四鹵化鈦、單鹵化鋯、二鹵化鋯、三鹵化鋯及四鹵化鋯,從膜物性的觀點來看,可優選地舉出四鹵化鈦及四鹵化鋯,更優選四鹵化鈦。這些化合物可單獨使用一種或混合使用兩種以上。A2: a titanyl, zirconium oxide and/or a titanyl-zirconoxane condensate having at least one alkoxy group directly bonded to a titanium atom or a zirconium atom. The a2 is preferably passed through a titanium atom. And a total molar amount of zirconium atom of 1.0 mol to 0.5 to 1.9 times molar equivalent of water, selected from a titanium compound having an alkoxy group, a zirconium compound having an alkoxy group, a titanium compound having a halogen group, and a halogen group. The titanate, zirconium oxide and/or titanyl-zirconoxane condensate obtained by hydrolytic condensation of at least one of the groups consisting of zirconium compounds, more preferably by total relative to titanium atoms and zirconium atoms a molar amount of 1.0 mole to 0.5 to 1.9 times molar equivalent of water, and a titanium oxyalkylene obtained by subjecting at least one selected from the group consisting of a titanium compound having an alkoxy group and a zirconium compound having an alkoxy group to undergo hydrolysis hydrolysis. Zirconoxane and/or titanyl-zirconoxane condensate. In the case of using a titanium compound having a halogen group and/or a zirconium compound having a halogen group, it is preferably used in combination with a titanium compound having an alkoxy group and/or a zirconium compound having an alkoxy group, or a halogen group. A titanium compound and a compound having a halogen group and a zirconium compound and having at least one alkoxy group are added to water and an alcohol compound is added to carry out hydrolysis condensation. The titanium compound having a halogen group and the zirconium compound having a halogen group may, for example, be a monohalogen halide, a titanium dihalide, a titanium trihalide, a titanium tetrahalide, a zirconium monohalide, a zirconium dihalide, a zirconium trihalide or a zirconium tetrahalide. From the viewpoint of film properties, titanium tetrahalide and zirconium tetrahalide are preferable, and titanium tetrahalide is more preferable. These compounds may be used alone or in combination of two or more.

另外,所述水解縮合時,不僅使用水,也可使用溶劑等,也可使用醇化合物作為添加劑。另外,溶劑可合適地舉出醇化合物。 從所得的膜的機械強度的觀點來看,相對於原料的鈦原子及鋯原子的總摩爾量1.0摩爾,所述水解縮合時所用的水的量優選0.5摩爾當量~1.9摩爾當量,從膜強度的觀點來看,下限優選0.9摩爾當量以上,更優選1.2摩爾當量以上,另外,從膜柔軟性的觀點來看,上限優選1.8摩爾當量以下,更優選1.7摩爾當量以下。 從組合物的保存穩定性及膜物性的觀點來看,成分A優選的是包含具有至少一個直接鍵結在鈦原子上的烷氧基的鈦氧烷(以下也簡稱為“鈦氧烷”)、具有至少一個直接鍵結在鋯原子上的烷氧基的鋯氧烷(以下也簡稱為“鋯氧烷”)、或具有至少一個直接鍵結在鈦原子或鋯原子上的烷氧基的鈦氧烷-鋯氧烷縮合物(以下也簡稱為“鈦氧烷-鋯氧烷縮合物”),更優選的是包含鈦氧烷或鋯氧烷,進而優選的是包含鈦氧烷。Further, in the hydrolysis condensation, not only water but also a solvent or the like may be used, and an alcohol compound may be used as an additive. Further, the solvent may suitably be an alcohol compound. From the viewpoint of mechanical strength of the obtained film, the amount of water used in the hydrolysis condensation is preferably 0.5 molar equivalent to 1.9 molar equivalent, relative to the total molar amount of titanium atom and zirconium atom of the raw material of 1.0 mol, from the film strength. The lower limit is preferably 0.9 molar equivalent or more, more preferably 1.2 molar equivalent or more, and the upper limit is preferably 1.8 molar equivalent or less, and more preferably 1.7 molar equivalent or less, from the viewpoint of film flexibility. From the viewpoint of storage stability of the composition and film physical properties, the component A is preferably a titanyl oxide (hereinafter also simply referred to as "titanium oxide") having at least one alkoxy group directly bonded to a titanium atom. a zirconium oxide having at least one alkoxy group directly bonded to a zirconium atom (hereinafter also referred to simply as "zirconium oxyalkylene") or having at least one alkoxy group directly bonded to a titanium atom or a zirconium atom. The titanyl-zirconoxane condensate (hereinafter also referred to simply as "titanoxane-zirconoxane condensate") more preferably contains a titanyl or zirconium oxide, and more preferably contains a titanyl oxide.

鈦氧烷、鋯氧烷及鈦氧烷-鋯氧烷縮合物可為直鏈狀、分支狀、三維網狀、懸臂狀、梯狀、籠狀等的任一聚合物形態,其形態並無特別限定,優選的是與成分B具有相容性的鈦氧烷或鋯氧烷。另外,鈦氧烷及鋯氧烷在常溫(25℃)下可為固體也可為液體。The titanate, zirconium oxide and titanate-zirconoxane condensate may be in the form of a linear, branched, three-dimensional network, a cantilever, a ladder, a cage or the like, and the form thereof is not Particularly preferred is a titanyl or zirconium oxide which is compatible with the component B. Further, the titanol and the zirconium oxide may be solid or liquid at normal temperature (25 ° C).

鈦氧烷、鋯氧烷及鈦氧烷-鋯氧烷縮合物的重量平均分子量並無特別限制,優選500~50,000,更優選1,000~20,000。The weight average molecular weight of the titanyl, zirconium and titanyl-zirconoxane condensate is not particularly limited, but is preferably 500 to 50,000, more preferably 1,000 to 20,000.

從膜物性的觀點來看,所述鈦氧烷優選下述式a2-1所表示的鈦氧烷。 另外,從膜物性的觀點來看,所述鋯氧烷優選下述式a2-2所表示的鋯氧烷。   Tiα Oβ (OR)γ (a2-1)   Zrα Oβ (OR)γ (a2-2)   式a2-1及式a2-2中,R分別獨立地表示氫原子、碳數1~18的烷基、碳數6~18的芳基或碳數7~18的芳烷基,α、β及γ滿足下述條件a'~條件c',α表示正整數,β及γ表示正數。 a':200≧α≧2、 b':1.9α≧β≧1.0α、 c':γ=4α-2βThe titanyl oxide is preferably a titanyl oxide represented by the following formula a2-1 from the viewpoint of film physical properties. Further, the zirconium oxide is preferably a zirconium oxide represented by the following formula a2-2 from the viewpoint of film physical properties. Ti α O β (OR) γ (a2-1) Zr α O β (OR) γ (a2-2) In the formula a2-1 and the formula a2-2, R independently represents a hydrogen atom and has a carbon number of 1 to 18 The alkyl group, the aryl group having 6 to 18 carbon atoms or the aralkyl group having 7 to 18 carbon atoms, α, β and γ satisfy the following conditions a' to c', α represents a positive integer, and β and γ represent a positive number. a': 200≧α≧2, b':1.9α≧β≧1.0α, c':γ=4α-2β

所述a2的鈦氧烷、鋯氧烷及鈦氧烷-鋯氧烷縮合物可為單一組成,也可為兩種以上的混合物。The titanate, zirconium oxide and titanyl-zirconoxane condensate of a2 may be a single composition or a mixture of two or more kinds.

a3:含有鈦原子及/或鋯原子的金屬氧化物 作為a3,可例示氧化鈦、氧化鋯、及包含鈦原子及/或鋯原子的複合氧化物。 作為包含鈦原子及/或鋯原子的複合氧化物,優選氧化鈦、鈦複合氧化物、氧化鋯、或鋯複合氧化物,更優選氧化鈦、鈦複合氧化物、或氧化鋯,進而優選氧化鈦或氧化鋯,特別優選氧化鈦。氧化鈦特別優選折射率高的金紅石型。這些金屬氧化物粒子也可為了賦予分散穩定性而利用有機材料對表面進行處理。 作為複合氧化物,可例示氧化錫-氧化鈦複合粒子、氧化矽-氧化鈦複合粒子、氧化錫-氧化鋯複合粒子等。 氧化鈦特別優選折射率高的金紅石型。這些金屬氧化物粒子也可為了賦予分散穩定性而利用有機材料對表面進行處理。A3: Metal oxide containing a titanium atom and/or a zirconium atom Examples of a3 include titanium oxide, zirconium oxide, and a composite oxide containing a titanium atom and/or a zirconium atom. The composite oxide containing a titanium atom and/or a zirconium atom is preferably titanium oxide, a titanium composite oxide, a zirconium oxide or a zirconium composite oxide, more preferably titanium oxide, a titanium composite oxide, or zirconium oxide, and further preferably titanium oxide. Or zirconia, particularly preferably titanium oxide. Titanium oxide is particularly preferably a rutile type having a high refractive index. These metal oxide particles may also be treated with an organic material in order to impart dispersion stability. Examples of the composite oxide include tin oxide-titanium oxide composite particles, cerium oxide-titanium oxide composite particles, and tin oxide-zirconia composite particles. Titanium oxide is particularly preferably a rutile type having a high refractive index. These metal oxide particles may also be treated with an organic material in order to impart dispersion stability.

a3也可使用市售品,例如,可舉出:作為氧化鈦粒子的石原產業(股)製造的TTO系列(TTO-51(A)、TTO-51(C)等),TTO-S、TTO-V系列(TTO-S-1、TTO-S-2、TTO-V-3等),帝化(Tayca)(股)製造的MT系列(MT-01、MT-05等);作為氧化錫-氧化鈦複合粒子的奧普拓萊克(Optolake)TR-502、奧普拓萊克(Optolake)TR-504;作為氧化矽-氧化鈦複合粒子的奧普拓萊克(Optolake)TR-503、奧普拓萊克(Optolake)TR-513、奧普拓萊克(Optolake)TR-520、奧普拓萊克(Optolake)TR-521、奧普拓萊克(Optolake)TR-527(以上為日揮催化劑化成工業(股)製造);氧化鋯粒子(高純度化學研究所(股)製造);氧化錫-氧化鋯複合粒子(日揮催化劑化成工業(股)製造)等。For example, a TTO series (TTO-51 (A), TTO-51 (C), etc.) manufactured by Ishihara Industries Co., Ltd., which is a titanium oxide particle, TTO-S, TTO, may be used. -V series (TTO-S-1, TTO-S-2, TTO-V-3, etc.), MT series (MT-01, MT-05, etc.) manufactured by Tayca (shares); as tin oxide - Optolake TR-502, Optolake TR-504 of titanium oxide composite particles; Optolake TR-503, Opp as yttrium oxide-titanium oxide composite particles Optolake TR-513, Optolake TR-520, Optolake TR-521, Optolake TR-527 (above is the Japanese catalyst catalyst industry) Manufactured); zirconia particles (manufactured by High Purity Chemical Research Institute); tin oxide-zirconia composite particles (produced by Nisshin Catalyst Chemical Co., Ltd.).

從硬化性組合物的透明性的觀點來看,a3的平均一次粒徑優選1 nm~200 nm,更優選3 nm~80 nm,特別優選5 nm~50 nm。這裡,粒子的平均一次粒徑是指利用電子顯微鏡測定任意200個粒子的粒徑並求出的其算術平均值。另外,在粒子的形狀並非球形的情況下,將最長邊視為粒徑。 另外,a3也能以分散液的形式供使用,所述分散液是通過使用球磨機、棒磨機等混合裝置將a3在適當的分散劑及溶劑中混合·分散而製備。The average primary particle diameter of a3 is preferably from 1 nm to 200 nm, more preferably from 3 nm to 80 nm, and particularly preferably from 5 nm to 50 nm, from the viewpoint of transparency of the curable composition. Here, the average primary particle diameter of the particles means an arithmetic mean value obtained by measuring the particle diameter of an arbitrary 200 particles by an electron microscope. Further, in the case where the shape of the particles is not spherical, the longest side is regarded as the particle diameter. Further, a3 can also be used in the form of a dispersion which is prepared by mixing and dispersing a3 in a suitable dispersant and a solvent using a mixing device such as a ball mill or a rod mill.

另外,從高折射率及膜物性的觀點來看,相對于本發明的硬化性組合物的總固體成分,鈦原子及鋯原子的總含量優選5質量%~60質量%,更優選10質量%~50質量%,進而優選15質量%~40質量%。Further, from the viewpoint of high refractive index and film physical properties, the total content of titanium atoms and zirconium atoms is preferably 5% by mass to 60% by mass, and more preferably 10% by mass based on the total solid content of the curable composition of the present invention. ~50% by mass, more preferably 15% by mass to 40% by mass.

成分B:硬化性化合物 本發明的硬化性組合物含有硬化性化合物作為成分B。 硬化性化合物是通過加熱、自由基活性種、陽離子活性種及陰離子活性種的至少任一種而硬化的化合物。 其中,優選具有環氧基的化合物、具有氧雜環丁基的化合物、及/或下述所說明的聚合性化合物。Component B: Curable Compound The curable composition of the present invention contains a curable compound as Component B. The curable compound is a compound which is cured by heating, at least one of a radical active species, a cationic active species, and an anionic active species. Among them, a compound having an epoxy group, a compound having an oxetanyl group, and/or a polymerizable compound described below are preferable.

<具有環氧基或氧雜環丁基的化合物> 在本發明的硬化性組合物為正型感光性組合物的情況下,硬化性化合物優選的是含有具有環氧基的化合物、及/或具有氧雜環丁基的化合物,更優選的是含有分子內具有兩個以上的環氧基的化合物及/或分子內具有兩個以上的氧雜環丁基的化合物。 另外,在本發明的硬化性組合物為負型感光性組合物且通過陽離子活性種而硬化的情況下,聚合性化合物優選的是含有具有環氧基的化合物、及/或具有氧雜環丁基的化合物,更優選的是含有分子內具有兩個以上的環氧基的化合物及/或分子內具有兩個以上的氧雜環丁基的化合物。 通過進行加熱,分子內具有環氧基或氧雜環丁基的化合物的環氧基或氧雜環丁基彼此發生反應、或與組合物中的酸(羧酸等)發生反應。另外,通過使其與陽離子活性種並存,而引發陽離子聚合。 分子內具有環氧基的化合物的具體例可舉出:雙酚A型環氧樹脂、雙酚F型環氧樹脂、苯酚酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、脂肪族環氧樹脂、在側鏈具有環氧基的丙烯酸系樹脂等。 所謂丙烯酸系樹脂,是指結構單元的70摩爾%以上是包含下述結構單元的聚合物。丙烯酸系樹脂的重量平均分子量優選3,000~300,000,更優選7,000~50,000。<Compound having an epoxy group or oxetanyl group> When the curable composition of the present invention is a positive photosensitive composition, the curable compound preferably contains a compound having an epoxy group, and/or The compound having an oxetanyl group is more preferably a compound having two or more epoxy groups in the molecule and/or a compound having two or more oxetanyl groups in the molecule. Further, in the case where the curable composition of the present invention is a negative photosensitive composition and is cured by a cationic active species, the polymerizable compound preferably contains a compound having an epoxy group and/or has an oxetane. The compound of the group is more preferably a compound having two or more epoxy groups in the molecule and/or a compound having two or more oxetanyl groups in the molecule. By heating, an epoxy group or an oxetanyl group of a compound having an epoxy group or an oxetanyl group in the molecule reacts with each other or with an acid (carboxylic acid or the like) in the composition. Further, cationic polymerization is initiated by coexisting with a cationically active species. Specific examples of the compound having an epoxy group in the molecule include a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a phenol novolak type epoxy resin, a cresol novolak type epoxy resin, and an aliphatic group. An epoxy resin or an acrylic resin having an epoxy group in a side chain. The acrylic resin means that 70% by mole or more of the structural unit is a polymer containing the following structural unit. The weight average molecular weight of the acrylic resin is preferably 3,000 to 300,000, more preferably 7,000 to 50,000.

[化2]式中,R1 表示氫原子或甲基,R2 表示氫原子或一價有機基。[Chemical 2] In the formula, R 1 represents a hydrogen atom or a methyl group, and R 2 represents a hydrogen atom or a monovalent organic group.

式中,R2 表示氫原子或一價有機基,一價有機基優選包含氫原子、碳原子、氧原子、及氮原子的任一種。 所述有機基的碳數優選1~25,更優選1~15。In the formula, R 2 represents a hydrogen atom or a monovalent organic group, and the monovalent organic group preferably contains any one of a hydrogen atom, a carbon atom, an oxygen atom, and a nitrogen atom. The carbon number of the organic group is preferably from 1 to 25, more preferably from 1 to 15.

這些化合物可作為市售品而獲取。例如可舉出:JER152、JER157S70、JER157S65、JER806、JER828、JER1007(三菱化學控股(Mitsubishi Chemical Holdings)(股)製造)等,日本專利特開2011-221494號公報的段落0189中記載的市售品等,除此以外,也可舉出:代那考爾(Denacol)EX-611、EX-612、EX-614、EX-614B、EX-622、EX-512、EX-521、EX-411、EX-421、EX-313、EX-314、EX-321、EX-211、EX-212、EX-810、EX-811、EX-850、EX-851、EX-821、EX-830、EX-832、EX-841、EX-911、EX-941、EX-920、EX-931、EX-212L、EX-214L、EX-216L、EX-321L、EX-850L、DLC-201、DLC-203、DLC-204、DLC-205、DLC-206、DLC-301、DLC-402(以上為長瀨化成(Nagase ChemteX)(股)製造),YH-300、YH-301、YH-302、YH-315、YH-324、YH-325(以上為新日鐵住金化學(股)製造)等。這些化合物可單獨使用一種或組合使用兩種以上。 這些中,更優選舉出雙酚A型環氧樹脂、雙酚F型環氧樹脂、苯酚酚醛清漆型環氧樹脂、在側鏈具有環氧基的丙烯酸系樹脂及脂肪族環氧樹脂,特別優選舉出雙酚A型環氧樹脂、脂環式環氧樹脂及在側鏈具有環氧基的丙烯酸系樹脂。These compounds are available as commercial products. For example, JER152, JER157S70, JER157S65, JER806, JER828, JER1007 (manufactured by Mitsubishi Chemical Holdings Co., Ltd.), and the like as described in paragraph 0189 of JP-A-2011-221494 And, in addition, Denacol EX-611, EX-612, EX-614, EX-614B, EX-622, EX-512, EX-521, EX-411, EX-421, EX-313, EX-314, EX-321, EX-211, EX-212, EX-810, EX-811, EX-850, EX-851, EX-821, EX-830, EX- 832, EX-841, EX-911, EX-941, EX-920, EX-931, EX-212L, EX-214L, EX-216L, EX-321L, EX-850L, DLC-201, DLC-203, DLC-204, DLC-205, DLC-206, DLC-301, DLC-402 (above is manufactured by Nagase ChemteX), YH-300, YH-301, YH-302, YH-315 YH-324, YH-325 (the above is manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd.). These compounds may be used alone or in combination of two or more. Among these, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a phenol novolak type epoxy resin, an acrylic resin having an epoxy group in a side chain, and an aliphatic epoxy resin are more preferable. Preferably, a bisphenol A type epoxy resin, an alicyclic epoxy resin, and an acrylic resin which has an epoxy group in a side chain are mentioned.

作為具有氧雜環丁基的化合物的具體例,可使用:亞龍氧雜環丁烷(Aron Oxetane)OXT-121、OXT-221、OX-SQ、PNOX(以上為東亞合成(股)製造),在側鏈具有氧雜環丁基的丙烯酸系樹脂。 另外,含氧雜環丁基的化合物優選的是單獨使用或與含環氧基的化合物混合而使用。Specific examples of the compound having an oxetanyl group include: Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (above, manufactured by Toagosei Co., Ltd.) An acrylic resin having an oxetanyl group in a side chain. Further, the oxetanyl group-containing compound is preferably used singly or in combination with an epoxy group-containing compound.

在側鏈具有環氧基或氧雜環丁基的丙烯酸系樹脂的優選具體例可例示具有下述結構單元的丙烯酸系樹脂。此外,下述結構單元中,R表示氫原子或甲基。A preferred example of the acrylic resin having an epoxy group or an oxetanyl group in the side chain is exemplified by an acrylic resin having the following structural unit. Further, in the following structural unit, R represents a hydrogen atom or a methyl group.

[化3] [Chemical 3]

<聚合性化合物> 本發明的硬化性組合物優選的是含有下述聚合性化合物作為成分B。 聚合性化合物並無特別限定,可使用自由基聚合性化合物、陽離子聚合性化合物的任一種,從硬化性的觀點來看優選自由基聚合性化合物。從透明性的觀點來看優選陽離子聚合性化合物。 自由基聚合性化合物只要是具有至少一個乙烯性不飽和基、優選的是末端乙烯性不飽和基的化合物,則並無特別限定,可自公知的乙烯性不飽和化合物中適宜選擇來使用。 這些中,成分B優選的是包含六官能以上的聚合性化合物,更優選的是包含成分B-1:六官能以上的乙烯性不飽和化合物,進而優選的是包含六官能以上的(甲基)丙烯酸氨基甲酸酯。<Polymerizable Compound> The curable composition of the present invention preferably contains the following polymerizable compound as the component B. The polymerizable compound is not particularly limited, and any of a radical polymerizable compound and a cationically polymerizable compound can be used, and a radical polymerizable compound is preferred from the viewpoint of curability. A cationically polymerizable compound is preferred from the viewpoint of transparency. The radically polymerizable compound is not particularly limited as long as it has at least one ethylenically unsaturated group, and is preferably a terminal ethylenically unsaturated group, and can be appropriately selected from known ethylenically unsaturated compounds. Among these, component B preferably contains a hexafunctional or higher polymerizable compound, and more preferably contains component B-1: a hexafunctional or higher ethylenically unsaturated compound, and more preferably contains a hexafunctional or higher functional group (methyl). Acrylic urethane.

成分B-1:六官能以上的乙烯性不飽和化合物 本發明的硬化性組合物優選的是含有成分B-1:六官能以上的乙烯性不飽和化合物作為成分B。六官能以上的乙烯性不飽和化合物可例示:成分B-1-1:六官能以上的(甲基)丙烯酸氨基甲酸酯、成分B-1-2:其他六官能以上的乙烯性不飽和化合物。這些中,優選的是含有成分B-1-1作為成分B。 以下,對成分B-1-1及成分B-1-2加以說明。Component B-1: Hexafunctional or higher functional ethylenically unsaturated compound The curable composition of the present invention preferably contains Component B-1: a hexafunctional or higher ethylenically unsaturated compound as Component B. The hexafunctional or higher ethylenically unsaturated compound can be exemplified by the component B-1-1: a hexa-functional or higher (meth)acrylic acid urethane, and the component B-1-2: other hexa-functional or more ethylenically unsaturated compound. . Among these, it is preferable to contain the component B-1-1 as the component B. Hereinafter, the component B-1-1 and the component B-1-2 will be described.

成分B-1-1:六官能以上的(甲基)丙烯酸氨基甲酸酯 本發明的硬化性組合物優選的是含有成分B-1-1:六官能以上的(甲基)丙烯酸氨基甲酸酯作為成分B。 六官能以上的(甲基)丙烯酸氨基甲酸酯中的(甲基)丙烯醯氧基的個數優選8以上,更優選10以上,最優選12以上。通過設為這樣的構成,可更有效地發揮本發明的效果。 另外,所述(甲基)丙烯醯氧基的個數的上限並無特別限制,在並非高分子結構的情況下,優選50以下,更優選30以下,進而優選20以下。 本發明的硬化性組合物可僅包含一種六官能以上的(甲基)丙烯酸氨基甲酸酯,也可包含兩種以上。在包含兩種以上的情況下,合計量優選為所述範圍。Component B-1-1: Hexafunctional or higher (meth)acrylic acid urethane The curable composition of the present invention preferably contains the component B-1-1: a hexafunctional or higher (meth)acrylic acid carbamate The ester is used as component B. The number of (meth)acryloxy groups in the hexafunctional or higher (meth)acrylic urethane is preferably 8 or more, more preferably 10 or more, and most preferably 12 or more. By adopting such a configuration, the effects of the present invention can be exhibited more effectively. In addition, the upper limit of the number of the (meth) acryloxy group is not particularly limited, and when it is not a polymer structure, it is preferably 50 or less, more preferably 30 or less, still more preferably 20 or less. The curable composition of the present invention may contain only one type of hexafunctional or higher (meth)acrylic acid urethane, or may contain two or more types. In the case where two or more kinds are contained, the total amount is preferably the above range.

本發明中可使用的六官能以上的(甲基)丙烯酸氨基甲酸酯可例示利用異氰酸酯與羥基的加成反應所製造的氨基甲酸酯加成聚合性化合物,可例示日本專利特開昭51-37193號公報、日本專利特公平2-32293號公報、日本專利特公平2-16765號公報中記載那樣的丙烯酸氨基甲酸酯類,將這些記載併入到本申請說明書中。The hexa-functional or higher (meth)acrylic acid urethane which can be used in the present invention is exemplified by a urethane addition polymerizable compound produced by an addition reaction of an isocyanate and a hydroxyl group, and is exemplified by Japanese Patent Laid-Open No. 51. Acrylic urethanes as described in Japanese Laid-Open Patent Publication No. Hei. No. Hei.

從硬化膜硬度的觀點來看,六官能以上的(甲基)丙烯酸氨基甲酸酯的分子量優選500~20,000,更優選650~6,000,進而優選800~3,000。 通過設為這樣的構成,可更有效地發揮本發明的效果。The molecular weight of the hexa-functional or higher (meth)acrylic urethane is preferably from 500 to 20,000, more preferably from 650 to 6,000, still more preferably from 800 to 3,000, from the viewpoint of hardness of the cured film. By adopting such a configuration, the effects of the present invention can be exhibited more effectively.

六官能以上的(甲基)丙烯酸氨基甲酸酯中的(甲基)丙烯醯氧基可為丙烯醯氧基、甲基丙烯醯氧基的任一種,也可為兩種,從硬化性的觀點來看,優選丙烯醯氧基。 六官能以上的(甲基)丙烯酸氨基甲酸酯中的氨基甲酸酯鍵的個數並無特別限制,優選1~30,更優選1~20,進而優選2~10,特別優選2~5,最優選2或3。 六官能以上的(甲基)丙烯酸氨基甲酸酯優選六官能以上的脂肪族(甲基)丙烯酸氨基甲酸酯。 另外,六官能以上的(甲基)丙烯酸氨基甲酸酯優選的是具有異氰脲酸環(isocyanuric ring)結構。 另外,六官能以上的(甲基)丙烯酸氨基甲酸酯優選的是包含具有一個以上的氨基甲酸酯鍵的核部分、與鍵結於核部分且具有一個以上的(甲基)丙烯醯氧基的末端部分的化合物,更優選的是在所述核部分上鍵結有2個以上的所述末端部分的化合物,進而優選的是在所述核部分上鍵結有2個~5個所述末端部分的化合物,特別優選的是在所述核部分上鍵結有2個或3個所述末端部分的化合物。The (meth) acryloxy group in the hexa-functional or higher (meth) acrylate urethane may be either propylene methoxy or methacryloxy, or may be two types, from curable. From the viewpoint, propylene methoxy group is preferred. The number of the urethane bonds in the hexafunctional or higher (meth)acrylic acid urethane is not particularly limited, but is preferably 1 to 30, more preferably 1 to 20, still more preferably 2 to 10, particularly preferably 2 to 5. Most preferably 2 or 3. The hexa-functional or higher (meth)acrylic urethane is preferably a hexa-functional or higher aliphatic (meth) acrylate urethane. Further, the hexa-functional or higher (meth)acrylic urethane preferably has an isocyanuric ring structure. Further, the hexa-functional or higher (meth)acrylic acid urethane preferably contains a core portion having one or more urethane bonds, and is bonded to the core portion and has one or more (meth) propylene oxides. The compound of the terminal portion of the group is more preferably a compound having two or more terminal moieties bonded to the core moiety, and it is further preferred that two to five of the core moiety are bonded to each other. The compound of the terminal moiety is particularly preferably a compound having 2 or 3 of the terminal moieties bonded to the core moiety.

六官能以上的(甲基)丙烯酸氨基甲酸酯優選的是至少具有下述式Be-1或式Be-2所表示的基團的化合物,更優選的是至少具有下述式Be-1所表示的基團的化合物。另外,六官能以上的(甲基)丙烯酸氨基甲酸酯更優選的是具有兩個以上的選自由下述式Be-1所表示的基團及式Be-2所表示的基團所組成的組群中的基團的化合物。 另外,六官能以上的(甲基)丙烯酸氨基甲酸酯中的所述末端部分優選下述式Be-1或式Be-2所表示的基團。The hexa-functional or higher (meth)acrylic acid urethane is preferably a compound having at least a group represented by the following formula Be-1 or formula Be-2, and more preferably at least having the following formula Be-1; The compound of the group indicated. Further, the hexa-functional or higher (meth)acrylic acid urethane is more preferably composed of two or more groups selected from the group represented by the following formula Be-1 and the group represented by the formula Be-2. A compound of a group in a group. Further, the terminal moiety in the hexa-functional or higher (meth)acrylic acid urethane is preferably a group represented by the following formula Be-1 or the formula Be-2.

[化4] [Chemical 4]

式Be-1及式Be-2中,R分別獨立地表示丙烯酸基或甲基丙烯酸基,波線部分表示與其他結構的鍵結位置。In the formulas Be-1 and Be-2, R independently represents an acryl group or a methacryl group, and the wave line portion indicates a bonding position with another structure.

另外,六官能以上的(甲基)丙烯酸氨基甲酸酯優選的是至少具有下述式Bc-1或式Bc-2所表示的基團的化合物,更優選的是至少具有下述式Bc-1所表示的基團的化合物。 另外,六官能以上的(甲基)丙烯酸氨基甲酸酯中的所述核部分優選下述式Bc-1或式Bc-2所表示的基團。Further, the hexa-functional or higher (meth)acrylic acid urethane is preferably a compound having at least a group represented by the following formula Bc-1 or formula Bc-2, and more preferably at least having the following formula Bc- A compound of the group represented by 1. Further, the core portion in the hexa-functional or higher (meth)acrylic acid urethane is preferably a group represented by the following formula Bc-1 or formula Bc-2.

[化5] [Chemical 5]

式Bc-1及式Bc-2中,L1 ~L4 分別獨立地表示碳數2~20的二價烴基,波線部分表示與其他結構的鍵結位置。 優選L1 ~L4 分別獨立地表示碳數2~20的亞烷基,更優選碳數2~10的亞烷基,進而優選碳數4~8的亞烷基。另外,所述亞烷基也可分支或具有環結構,優選直鏈亞烷基。 另外,六官能以上的(甲基)丙烯酸氨基甲酸酯特別優選的是式Bc-1或式Bc-2所表示的基團、與選自由式Be-1及式Be-2所表示的基團所組成的組群中的2個或3個基團鍵結而成的化合物。In the formula Bc-1 and the formula Bc-2, L 1 to L 4 each independently represent a divalent hydrocarbon group having 2 to 20 carbon atoms, and the wave line portion indicates a bonding position with another structure. L 1 to L 4 each independently represent an alkylene group having 2 to 20 carbon atoms, more preferably an alkylene group having 2 to 10 carbon atoms, and still more preferably an alkylene group having 4 to 8 carbon atoms. Further, the alkylene group may also be branched or have a ring structure, preferably a linear alkylene group. Further, a hexa-functional or higher (meth)acrylic acid urethane is particularly preferably a group represented by the formula Bc-1 or the formula Bc-2, and a group selected from the group consisting of the formula Be-1 and the formula Be-2. A compound in which two or three groups in a group consisting of groups are bonded.

以下,例示本發明中可優選地使用的六官能以上的(甲基)丙烯酸氨基甲酸酯,但本發明當然並不限定於這些化合物。Hereinafter, the hexa-functional or higher (meth)acrylic urethane which can be preferably used in the present invention is exemplified, but the present invention is of course not limited to these compounds.

[化6] [Chemical 6]

[化7] [Chemistry 7]

[化8] [化8]

六官能以上的(甲基)丙烯酸氨基甲酸酯的市售品可例示:可自新中村化学工业(股)获取的U-6HA、UA-1100H、U-6LPA、U-15HA、U-6H、U-10HA、U-10PA、UA-53H、UA-33H(均为注册商标);或可自共荣社化学(股)获取的UA-306H、UA-306T、UA-306I、UA-510H;可自巴斯夫(BASF)公司获取的拉罗莫(Laromer)UA-9048、UA-9050、PR9052;可自大赛璐奧奈科斯(Daicel-Allnex)(股)获取的艾巴克利(EBECRYL)220、5129、8301、KRM8200、8200AE、8452等。A commercially available product of a hexa-functional or higher (meth)acrylic acid urethane can be exemplified by U-6HA, UA-1100H, U-6LPA, U-15HA, U-6H available from Shin-Nakamura Chemical Industry Co., Ltd. , U-10HA, U-10PA, UA-53H, UA-33H (all registered trademarks); or UA-306H, UA-306T, UA-306I, UA-510H available from Gongrongshe Chemical Co., Ltd. Laromer UA-9048, UA-9050, PR9052 available from BASF; EBCRYL 220 available from Daicel-Allnex (shares) , 5129, 8301, KRM8200, 8200AE, 8452, etc.

成分B-1-2:其他六官能以上的乙烯性不飽和化合物 本發明中也可含有成分B-1-1以外的成分B-1-2:其他六官能以上的乙烯性不飽和化合物作為成分B。成分B-1-2可為高分子(例如分子量為2,000以上),也可為單量體(例如分子量小於2,000,優選的是分子量為100以上且小於2,000),優選單量體。 成分B-1-2優選(甲基)丙烯酸酯化合物,例如可例示二季戊四醇六(甲基)丙烯酸酯。Component B-1-2: Other hexafunctional or higher ethylenically unsaturated compound In the present invention, component B-1-2 other than component B-1-1 may be contained: other hexafunctional or higher ethylenically unsaturated compound as a component B. The component B-1-2 may be a polymer (for example, having a molecular weight of 2,000 or more), or may be a monomer (for example, having a molecular weight of less than 2,000, preferably having a molecular weight of 100 or more and less than 2,000), and is preferably a monomer. The component B-1-2 is preferably a (meth) acrylate compound, and for example, dipentaerythritol hexa(meth) acrylate can be exemplified.

成分B-2:小於六官能的乙烯性不飽和化合物 本發明的硬化性組合物不僅包含所述六官能以上的乙烯性不飽和化合物,也可包含小於六官能的乙烯性不飽和化合物 所述B-2只要是具有少於6個的乙烯性不飽和基的化合物則並無特別限制,可根據目的而適宜選擇。例如可舉出酯化合物、醯胺化合物、氨基甲酸酯化合物及其他化合物。 具有乙烯性不飽和基的化合物可為單官能乙烯性不飽和化合物、二官能~五官能的多官能乙烯性不飽和化合物的任一種,優選的是包含二官能~五官能的多官能乙烯性不飽和化合物,更優選二官能~五官能的多官能乙烯性不飽和化合物。Component B-2: less than hexafunctional ethylenically unsaturated compound The curable composition of the present invention comprises not only the above-mentioned hexafunctional or higher ethylenically unsaturated compound but also less than hexafunctional ethylenically unsaturated compound. -2 is not particularly limited as long as it is a compound having less than 6 ethylenically unsaturated groups, and may be appropriately selected depending on the purpose. For example, an ester compound, a guanamine compound, a carbamate compound, and other compounds are mentioned. The compound having an ethylenically unsaturated group may be any of a monofunctional ethylenically unsaturated compound and a difunctional to pentafunctional polyfunctional ethylenically unsaturated compound, and preferably contains a difunctional to pentafunctional polyfunctional ethylenic group. A saturated compound is more preferably a difunctional to pentafunctional polyfunctional ethylenically unsaturated compound.

所述酯化合物例如可舉出:多官能(甲基)丙烯酸酯、衣康酸酯、丁烯酸酯、異丁烯酸酯、馬來酸酯、其他酯化合物等。這些中,優選多官能(甲基)丙烯酸酯(多官能(甲基)丙烯酸酯化合物)等。Examples of the ester compound include polyfunctional (meth) acrylate, itaconate, crotonate, methacrylate, maleate, and other ester compounds. Among these, a polyfunctional (meth) acrylate (polyfunctional (meth) acrylate compound), etc. are preferable.

所述多官能(甲基)丙烯酸酯化合物例如可舉出:聚乙二醇二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、1,3-丁二醇二(甲基)丙烯酸酯、四亞甲基二醇二(甲基)丙烯酸酯、己二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇二(甲基)丙烯酸酯、二季戊四醇三(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、山梨糖醇三(甲基)丙烯酸酯、山梨糖醇四(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、己二醇二(甲基)丙烯酸酯等。其中,特別優選季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、及二季戊四醇五(甲基)丙烯酸酯。Examples of the polyfunctional (meth) acrylate compound include polyethylene glycol di(meth) acrylate, ethylene glycol di(meth) acrylate, and triethylene glycol di (meth) acrylate. 1,3-butanediol di(meth)acrylate, tetramethylene glycol di(meth)acrylate, hexanediol di(meth)acrylate, pentaerythritol tri(meth)acrylate, Pentaerythritol tetra(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, sorbus Sugar alcohol tri(meth)acrylate, sorbitol tetra(meth)acrylate, trimethylolethane tri(meth)acrylate, neopentyl glycol di(meth)acrylate, hexanediol Di(meth)acrylate and the like. Among them, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, and dipentaerythritol penta(meth)acrylate are particularly preferable.

所述多官能(甲基)丙烯酸酯的其他例可舉出:在甘油或三羥甲基乙烷、雙酚A等多官能醇上加成環氧乙烷或環氧丙烷後加以(甲基)丙烯酸酯化而成的化合物,日本專利特公昭48-41708號公報、日本專利特公昭50-6034號公報、日本專利特開昭51-37193號公報中記載的丙烯酸氨基甲酸酯類,日本專利特開昭48-64183號公報、日本專利特公昭49-43191號公報及日本專利特公昭52-30490號公報中記載的聚酯丙烯酸酯類,作為環氧樹脂與(甲基)丙烯酸的反應產物的環氧丙烯酸酯類,日本專利特開昭60-258539號公報中記載的(甲基)丙烯酸酯或(甲基)丙烯酸氨基甲酸酯或乙烯酯等。Other examples of the polyfunctional (meth) acrylate include addition of ethylene oxide or propylene oxide to a polyfunctional alcohol such as glycerin, trimethylolethane or bisphenol A (methyl group). The acrylated compound, the urethane acrylate described in Japanese Patent Laid-Open Publication No. SHO-48-41708, the Japanese Patent Publication No. SHO-50-6034, and the Japanese Patent Publication No. Sho 51-37193, Japanese Patent Polyester acrylates described in JP-A-48-64183, JP-A-49-43191, and Japanese Patent Publication No. Sho 52-30490, as reaction products of an epoxy resin and (meth)acrylic acid (Ethylene acrylate) or (meth)acrylic acid urethane or vinyl ester described in JP-A-60-258539.

其他多官能乙烯性不飽和化合物例如可舉出:三羥甲基丙烷三(丙烯醯氧基丙基)醚、異氰脲酸三(丙烯醯氧基乙基)酯、《日本接著協會雜誌》(Vol.20,No.7,第300頁~第308頁)中記載的光硬化性單體及寡聚物等。Examples of the other polyfunctional ethylenically unsaturated compound include trimethylolpropane tris(propylene methoxypropyl) ether, isocyanuric acid tris(propylene decyloxyethyl) ester, and the Journal of Japan Next Association. Photocurable monomers and oligomers described in (Vol. 20, No. 7, pages 300 to 308).

另外,所述醯胺化合物例如可舉出不飽和羧酸與脂肪族多元胺化合物的醯胺(單體)等,具體可舉出:亞甲基雙(甲基)丙烯醯胺、1,6-六亞甲基雙(甲基)丙烯醯胺、二乙三胺三(甲基)丙烯醯胺、二甲苯雙(甲基)丙烯醯胺等,另外,可舉出日本專利特開昭60-258539號公報中記載的(甲基)丙烯酸醯胺等。 另外,所述氨基甲酸酯化合物可例示利用異氰酸酯與羥基的加成反應所製造的氨基甲酸酯鏈聚合性化合物,例如可舉出:季戊四醇三丙烯酸酯與六亞甲基二異氰酸酯的氨基甲酸酯化物、季戊四醇三丙烯酸酯與甲苯二異氰酸酯的氨基甲酸酯化物、季戊四醇三丙烯酸酯與異佛爾酮二異氰酸酯的氨基甲酸酯化物、二季戊四醇五丙烯酸酯與六亞甲基二異氰酸酯的氨基甲酸酯化物、二季戊四醇五丙烯酸酯與甲苯二異氰酸酯的氨基甲酸酯化物、二季戊四醇五丙烯酸酯與異佛爾酮二異氰酸酯的氨基甲酸酯化物等。 具體可例示:日本專利特開2011-126921號公報、日本專利特開昭51-37193號公報、日本專利特公平2-32293號公報、日本專利特公平2-16765號公報中記載那樣的丙烯酸氨基甲酸酯類,將這些記載併入到本案說明書中。In addition, examples of the guanamine compound include decylamine (monomer) of an unsaturated carboxylic acid and an aliphatic polyamine compound, and specific examples thereof include methylene bis(meth) acrylamide and 1,6. - hexamethylene bis(meth) acrylamide, diethylene triamine tri (meth) acrylamide, xylene bis (meth) acrylamide, etc., and Japanese Patent Laid-Open No. 60 -Methyl methacrylate or the like described in JP-258539. Further, the urethane compound may be a urethane chain polymerizable compound produced by an addition reaction of an isocyanate and a hydroxyl group, and examples thereof include a carbamate of pentaerythritol triacrylate and hexamethylene diisocyanate. An acid ester, a carbamate of pentaerythritol triacrylate and toluene diisocyanate, a carbamate of pentaerythritol triacrylate and isophorone diisocyanate, dipentaerythritol pentaacrylate and hexamethylene diisocyanate A urethane compound, a carbamic acid ester of dipentaerythritol pentaacrylate and toluene diisocyanate, a pentoxide of dipentaerythritol pentaacrylate and isophorone diisocyanate, and the like. Specific examples of the acrylamide group include those described in JP-A-2011-126921, JP-A-53-37193, JP-A-2-332293, and JP-A No. 2-16765. These salts are incorporated into the specification of the present invention.

另外,其他多官能乙烯性不飽和化合物可舉出:日本專利特開昭60-258539號公報、國際公開第2010/050580號中記載的烯丙基化合物或含烯基的化合物等。 具體可舉出:1,2-二乙烯基苯、1,4-二乙烯基苯、1,2-二烯丙基苯、1,3-二烯丙基苯、1,4-二烯丙基苯、1,3,5-三乙烯基苯、1,3,5-三烯丙基苯、1,2,4,5-四烯丙基苯、六烯丙基苯、二乙烯基甲苯、雙酚A二烯丙基醚、1,2-二烯丙氧基苯、1,4-二烯丙氧基苯、對苯二甲酸二烯丙酯、間苯二甲酸二烯丙酯、1,4-雙(二甲基乙烯基矽烷基)苯、二乙烯基甲基苯基矽烷、二乙烯基二苯基矽烷、二烯丙基二苯基矽烷等。In addition, examples of the other polyfunctional ethylenically unsaturated compound include an allyl compound or an alkenyl group-containing compound described in JP-A-60-258539, and International Publication No. 2010/050580. Specific examples thereof include 1,2-divinylbenzene, 1,4-divinylbenzene, 1,2-diallylbenzene, 1,3-diallylbenzene, and 1,4-dienepropene. Benzobenzene, 1,3,5-trivinylbenzene, 1,3,5-triallylbenzene, 1,2,4,5-tetraallylbenzene, hexaallylbenzene, divinyltoluene , bisphenol A diallyl ether, 1,2-diallyloxybenzene, 1,4-diallyloxybenzene, diallyl terephthalate, diallyl isophthalate, 1,4-bis(dimethylvinyldecyl)benzene, divinylmethylphenylnonane, divinyldiphenylnonane, diallyldiphenyldecane, and the like.

單官能乙烯性不飽和化合物可舉出:丙烯酸、甲基丙烯酸、衣康酸、丁烯酸、異丁烯酸、馬來酸等不飽和羧酸類及這些酸的鹽,(甲基)丙烯酸酯類、(甲基)丙烯醯胺類、(甲基)丙烯腈類、苯乙烯類等單官能乙烯性不飽和化合物。Examples of the monofunctional ethylenically unsaturated compound include unsaturated carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, crotonic acid, methacrylic acid, and maleic acid, and salts of these acids, (meth) acrylates, and the like. A monofunctional ethylenically unsaturated compound such as (meth)acrylamide, (meth)acrylonitrile or styrene.

另外,也可合適地使用具有羥基或氨基、巰基等親核性取代基的不飽和羧酸酯或醯胺類與異氰酸酯類或環氧類的加成反應物、及與單官能或多官能的羧酸的脫水縮合反應物等。3 進而,以下反應物也合適:具有異氰酸基(異氰酸酯基)或環氧基等親電子性取代基的不飽和羧酸酯或醯胺類與醇類、胺類、硫醇類的加成反應物,進而具有鹵素基或甲苯磺醯氧基等脫離性取代基的不飽和羧酸酯或醯胺類與醇類、胺類、硫醇類的取代反應物。 另外,作為其他例,也可使用替換成不飽和膦酸、苯乙烯、乙烯基醚等而成的化合物組群來代替所述不飽和羧酸。 單官能乙烯性不飽和化合物並無特別限制,除了所述例示化合物以外,可使用眾所周知的各種化合物,例如也可使用日本專利特開2009-204962號公報中記載的化合物等。Further, an unsaturated carboxylic acid ester having a nucleophilic substituent such as a hydroxyl group, an amino group or a fluorenyl group, or an addition reaction product of an isocyanate or an epoxy group, and a monofunctional or polyfunctional group may also be suitably used. a dehydration condensation reaction product of a carboxylic acid or the like. Further, the following reactants are also suitable: an unsaturated carboxylic acid ester having an electrophilic substituent such as an isocyanato group (isocyanate group) or an epoxy group, or an oxime amine and an alcohol, an amine or a thiol. The reactant is further substituted with an unsaturated carboxylic acid ester such as a halogen group or a toluenesulfonyloxy group or a substituted reactant of an oxime amine and an alcohol, an amine or a thiol. Further, as another example, a compound group substituted with an unsaturated phosphonic acid, styrene, vinyl ether or the like may be used instead of the unsaturated carboxylic acid. The monofunctional ethylenically unsaturated compound is not particularly limited, and various known compounds can be used in addition to the above-exemplified compounds. For example, a compound described in JP-A-2009-204962 or the like can be used.

進而,單官能乙烯性不飽和化合物可優選地使用:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸-2-乙基己酯、卡必醇(甲基)丙烯酸酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苄酯、環氧(甲基)丙烯酸酯等(甲基)丙烯酸衍生物,N-乙烯基吡咯烷酮、N-乙烯基己內醯胺等N-乙烯基化合物類,烯丙基縮水甘油醚等烯丙基化合物的衍生物。Further, a monofunctional ethylenically unsaturated compound can be preferably used: methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, and 2-ethylhexyl (meth)acrylate. (meth)acrylic acid derivatives such as esters, carbitol (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, epoxy (meth) acrylate, N-vinyl N-vinyl compounds such as pyrrolidone and N-vinyl caprolactam, and derivatives of allyl compounds such as allyl glycidyl ether.

本發明的硬化性組合物中,優選的是相對于成分B的總質量100質量份而言的成分B-1的含量為70質量份~100質量份,更優選75質量份~100質量份,進而優選90質量份~100質量份,特別優選95質量份~100質量份。若為所述實施方式,則更有效地發揮本發明的效果。 本發明的硬化性組合物中,從兼具硬化膜的折射率與顯影性的觀點來看,相對於硬化性組合物的總固體成分,成分B的含量優選5質量%~85質量%,更優選10質量%~82.5質量%,進而優選15質量%~80質量%。In the curable composition of the present invention, the content of the component B-1 is preferably 70 parts by mass to 100 parts by mass, more preferably 75 parts by mass to 100 parts by mass, per 100 parts by mass of the total mass of the component B. Further, it is preferably 90 parts by mass to 100 parts by mass, and particularly preferably 95 parts by mass to 100 parts by mass. According to the above embodiment, the effects of the present invention are more effectively exhibited. In the curable composition of the present invention, the content of the component B is preferably 5% by mass to 85% by mass based on the total solid content of the curable composition, from the viewpoint of the refractive index and the developability of the cured film. It is preferably 10% by mass to 82.5% by mass, and more preferably 15% by mass to 80% by mass.

成分C:溶劑 本發明的硬化性組合物含有溶劑作為成分C,成分C含有:作為成分C-1的20℃下的粘度為50 mPa·s以上且200 mPa·s以下、並且表面張力為30 mN/m以上且41 mN/m以下的至少一種有機溶劑;及作為成分C-2的20℃下的粘度小於50 mPa·s的至少一種有機溶劑,相對于成分C的總質量,所述成分C-1的含量為20質量%~95質量%。 本發明的硬化性組合物優選的是製備成將必需成分與後述的任意成分溶解及/或分散於溶劑中而成的液體。 以下,對成分C-1及成分C-2加以說明。Component C: Solvent The curable composition of the present invention contains a solvent as component C, and component C contains a viscosity at 20 ° C as component C-1 of 50 mPa·s or more and 200 mPa·s or less, and a surface tension of 30. At least one organic solvent having a mN/m or more and 41 mN/m or less; and at least one organic solvent having a viscosity at 20 ° C of 20 ° C as the component C-2, the component is relative to the total mass of the component C The content of C-1 is from 20% by mass to 95% by mass. The curable composition of the present invention is preferably a liquid prepared by dissolving and/or dispersing an essential component and any component described later in a solvent. Hereinafter, the component C-1 and the component C-2 will be described.

成分C-1:20℃下的粘度為50 mPa·s以上且200 mPa·s以下、並且表面張力為30 mN/m以上且41 mN/m以下的至少一種有機溶劑 本發明的硬化性組合物含有成分C-1。成分C-1是粘度較高、而且表面張力低的有機溶劑。通過含有成分C-1,可在提高組合物整體的粘度的同時獲得表面張力低的組合物。Component C-1: at least one organic solvent having a viscosity at 20 ° C of 50 mPa·s or more and 200 mPa·s or less and a surface tension of 30 mN/m or more and 41 mN/m or less. The curable composition of the present invention Contains ingredient C-1. Component C-1 is an organic solvent having a high viscosity and a low surface tension. By containing the component C-1, a composition having a low surface tension can be obtained while increasing the viscosity of the entire composition.

成分C-1在20℃下的粘度為50 mPa·s以上且200 mPa·s以下。若20℃下的粘度為50 mPa·s以下,則組合物整體的粘度低,面內均勻性差。另外,若20℃下的粘度超過200 mPa·s,則組合物整體的粘度過高,面內均勻性或凹陷故障抑制性差。 成分C-1在20℃下的粘度優選80 mPa·s~200 mPa·s。 成分C-1的粘度是在20℃下測定而得的值,具體來說,是利用東機產業(股)製造的RE85L型粘度計,並使用錐型(cone):1°34′×R24,在液溫20℃下進行測定。The viscosity of the component C-1 at 20 ° C is 50 mPa·s or more and 200 mPa·s or less. When the viscosity at 20 ° C is 50 mPa·s or less, the viscosity of the entire composition is low, and the in-plane uniformity is poor. Further, when the viscosity at 20 ° C exceeds 200 mPa·s, the viscosity of the entire composition is too high, and the in-plane uniformity or the dent failure inhibition property is inferior. The viscosity of the component C-1 at 20 ° C is preferably 80 mPa·s to 200 mPa·s. The viscosity of the component C-1 is a value measured at 20 ° C, specifically, a RE85L type viscometer manufactured by Toki Sangyo Co., Ltd., and a cone type: 1° 34' × R24 The measurement was carried out at a liquid temperature of 20 °C.

成分C-1的表面張力為30 mN/m以上且41 mN/m以下。若成分C-1的表面張力超過41 mN/m,則組合物整體的表面張力變高,會導致凹陷。另外,若表面張力小於30 mN/m,則因表面張力過低而過於浸潤擴散,從而在基板產生液體的滲出。 成分C-1的表面張力優選30 mN/m~41 mN/m,更優選32 mN/m~36 mN/m。 成分C-1的表面張力是依照日本工業標準(Japanese Industrial Standards,JIS)K 2241,在20℃下,以鋼絲的張度為指數,利用杜努依(Dunouy)表面張力計來測定液面與鉑環的張力。 從塗布性的觀點來看,成分C-1的沸點優選100℃~300℃,更優選120℃~250℃,進而優選200℃~250℃。The surface tension of the component C-1 is 30 mN/m or more and 41 mN/m or less. When the surface tension of the component C-1 exceeds 41 mN/m, the surface tension of the entire composition becomes high, which causes dents. Further, when the surface tension is less than 30 mN/m, the surface tension is too low to be excessively wetted and diffused, so that liquid bleed out on the substrate. The surface tension of the component C-1 is preferably from 30 mN/m to 41 mN/m, more preferably from 32 mN/m to 36 mN/m. The surface tension of the component C-1 was measured according to the Japanese Industrial Standards (JIS) K 2241 at 20 ° C using the Duunou surface tension meter as the index of the steel wire. The tension of the platinum ring. The boiling point of the component C-1 is preferably from 100 ° C to 300 ° C, more preferably from 120 ° C to 250 ° C, even more preferably from 200 ° C to 250 ° C from the viewpoint of coatability.

本發明的硬化性組合物中,相對于成分C的總質量,成分C-1的含量為20質量%~95質量%,若相對于成分C的總質量而成分C-1的含量小於20質量%,則無法獲得硬化性組合物所需的粘度,印刷適性差。另外,若成分C-1的含量超過95質量%,則有時粘度變得過高。 另外,本發明的硬化性組合物中,相對于成分C的總質量,成分C-1的含量優選30質量%~95質量%,更優選50質量%~95質量%。 此外,成分C-1可單獨使用一種,也可並用兩種以上。在並用兩種以上作為成分C-1的情況下,只要合計為所述含量即可。In the curable composition of the present invention, the content of the component C-1 is 20% by mass to 95% by mass based on the total mass of the component C, and the content of the component C-1 is less than 20% with respect to the total mass of the component C. %, the viscosity required for the curable composition could not be obtained, and the printability was poor. In addition, when the content of the component C-1 exceeds 95% by mass, the viscosity may become too high. Further, in the curable composition of the present invention, the content of the component C-1 is preferably 30% by mass to 95% by mass, and more preferably 50% by mass to 95% by mass based on the total mass of the component C. Further, the component C-1 may be used alone or in combination of two or more. When two or more types are used together as the component C-1, the total content may be sufficient.

成分C-1只要為具有所述粘度及表面張力的溶劑則並無特別限定,優選具有羥基及/或乙醯氧基(acetoxy group)的萜烯(terpene)化合物,更優選的是含有選自由萜品醇、二氫萜品醇、4-(乙醯氧基)-α,α,4-三甲基環己烷甲醇乙酸酯、及2-[1-甲基-1-(4-甲基-3-環己烯-1-基)乙氧基]乙醇所組成的組群中的至少一個。 萜品醇存在以下的α-、β-、γ-的異構體,是由日本香料藥品(股)、日本萜品烯化學(股)市售(粘度為54 mPa·s,表面張力為38 mN/m)。The component C-1 is not particularly limited as long as it has the above viscosity and surface tension, and is preferably a terpene compound having a hydroxyl group and/or an acetoxy group, and more preferably contains a selected from the group consisting of Terpineol, dihydroterpineol, 4-(ethoxycarbonyl)-α,α,4-trimethylcyclohexanemethanol acetate, and 2-[1-methyl-1-(4- At least one of the group consisting of methyl-3-cyclohexen-1-yl)ethoxy]ethanol. Terpineol has the following α-, β-, and γ-isomers, which are commercially available from Japanese perfume medicines and Japanese terpene chemicals (viscosity: 54 mPa·s, surface tension 38). mN/m).

[化9]α-萜品醇         β-萜品醇        γ-萜品醇[Chemistry 9] 萜-terpineol β-terpineol γ-terpineol

另外,二氫萜品醇存在以下兩種異構體(1-羥基-對薄荷烷(1-hydroxy-p-menthane)、及8-羥基-對薄荷烷),由日本萜品烯化學(股)市售有二氫萜品醇(粘度為83 mPa·s,表面張力為36 mN/m)、特索布(Terusolve)DTO-210(粘度為72 mPa·s,表面張力為36 mN/m)。In addition, dihydroterpineol exists in the following two isomers (1-hydroxy-p-menthane, and 8-hydroxy-p-menthane), from the Japanese terpene chemistry (shares) Commercially available dihydroterpineol (viscosity 83 mPa·s, surface tension 36 mN/m), Terusolve DTO-210 (viscosity 72 mPa·s, surface tension 36 mN/m) ).

[化10] [化10]

4-(乙醯氧基)-α,α,4-三甲基環己烷甲醇乙酸酯是下述式C-3所表示的化合物,作為與式C-1所表示的化合物及式C-2所表示的化合物的混合物,例如,由日本萜品烯化學(股)市售有特索布(Terusolve)THA-90(粘度為144 mPa·s,表面張力為32.8 mN/m)、特索布(Terusolve)THA-70(粘度為144 mPa·s,表面張力為32.9 mN/m)。4-(ethoxycarbonyl)-α,α,4-trimethylcyclohexanemethanol acetate is a compound represented by the following formula C-3, which is a compound represented by the formula C-1 and a formula C a mixture of the compounds represented by -2, for example, Terusolve THA-90 (viscosity: 144 mPa·s, surface tension: 32.8 mN/m), commercially available from Japan Terpinene Chemical Co., Ltd. Terusolve THA-70 (viscosity 144 mPa·s, surface tension 32.9 mN/m).

[化11] [11]

2-[1-甲基-1-(4-甲基-3-環己烯-1-基)乙氧基]乙醇是下述式所表示的化合物,例如,由日本萜品烯化學(股)市售有特索布(Terusolve)TOE-100(粘度為62 mPa·s,表面張力為40.6 mN/m)。2-[1-methyl-1-(4-methyl-3-cyclohexen-1-yl)ethoxy]ethanol is a compound represented by the following formula, for example, from the Japanese terpene chemistry (shares) Commercially available Terusolve TOE-100 (viscosity 62 mPa·s, surface tension 40.6 mN/m).

[化12] [化12]

這些中,本發明的成分C-1優選的是包含選自由萜品醇、二氫萜品醇、式C-1~式C-3的任一個所表示的化合物及2-[1-甲基-1-(4-甲基-3-環己烯-1-基)乙氧基]乙醇所組成的組群中的化合物,更優選的是包含二氫萜品醇及式C-1~式C-3的任一個所表示的化合物,進而優選的是式C-1所表示的化合物與式C-2所表示的化合物與式C-3所表示的化合物的混合物。Among these, the component C-1 of the present invention preferably contains a compound selected from terpineol, dihydroterpineol, or any of the formulae C-1 to C-3, and 2-[1-methyl. a compound of the group consisting of -1-(4-methyl-3-cyclohexen-1-yl)ethoxy]ethanol, more preferably comprising dihydroterpineol and formula C-1~ The compound represented by any one of C-3 is more preferably a mixture of the compound represented by the formula C-1 and the compound represented by the formula C-2 and the compound represented by the formula C-3.

成分C-2:20℃下的粘度小於50 mPa·s的有機溶劑 本發明中,含有20℃下的粘度小於50 mPa·s的有機溶劑作為成分C-2。若成分C-2的粘度超過50 mPa·s,則組合物整體的粘度過高,因此面內均勻性差。 成分C-2在20℃下的粘度優選10 mPa·s以下,更優選5 mPa·s以下,進而優選3 mPa·s以下。另外,其下限並無特別限定,優選0.5 mPa·s以上。Component C-2: Organic solvent having a viscosity at 20 ° C of less than 50 mPa·s In the present invention, an organic solvent having a viscosity at 20 ° C of less than 50 mPa·s is contained as the component C-2. When the viscosity of the component C-2 exceeds 50 mPa·s, the viscosity of the entire composition is too high, and thus the in-plane uniformity is inferior. The viscosity of the component C-2 at 20 ° C is preferably 10 mPa·s or less, more preferably 5 mPa·s or less, still more preferably 3 mPa·s or less. Further, the lower limit thereof is not particularly limited, but is preferably 0.5 mPa·s or more.

本發明的硬化性組合物中使用的成分C-2可使用眾所周知的溶劑,可例示:醇類、乙二醇單烷基醚類、乙二醇二烷基醚類、乙二醇單烷基醚乙酸酯類、丙二醇單烷基醚類、丙二醇二烷基醚類、丙二醇單烷基醚乙酸酯類、二乙二醇二烷基醚類、二乙二醇單烷基醚乙酸酯類、二丙二醇單烷基醚類、丁二醇二乙酸酯類、二丙二醇二烷基醚類、二丙二醇單烷基醚乙酸酯類、酯類、酮類、醯胺類、內酯類等。其他具體例可參照日本專利特開2009-098616號公報的段落0062。 這些溶劑中,優選的具體例可舉出:丁醇、四氫糠醇、苯氧基乙醇、1,3-丁二醇二乙酸酯、二乙二醇甲基乙基醚、丙二醇單甲醚乙酸酯、乙醯丙酮、乳酸乙酯,可特別優選地例示:丁醇、1,3-丁二醇二乙酸酯、二乙二醇甲基乙基醚、乙醯丙酮、乳酸乙酯。 成分C-2可單獨使用一種,也可並用兩種以上。As the component C-2 used in the curable composition of the present invention, a well-known solvent can be used, and examples thereof include alcohols, ethylene glycol monoalkyl ethers, ethylene glycol dialkyl ethers, and ethylene glycol monoalkyl groups. Ether acetates, propylene glycol monoalkyl ethers, propylene glycol dialkyl ethers, propylene glycol monoalkyl ether acetates, diethylene glycol dialkyl ethers, diethylene glycol monoalkyl ether acetates, Dipropylene glycol monoalkyl ethers, butanediol diacetate, dipropylene glycol dialkyl ethers, dipropylene glycol monoalkyl ether acetates, esters, ketones, guanamines, lactones, and the like. For other specific examples, reference is made to paragraph 0062 of Japanese Patent Laid-Open Publication No. 2009-098616. Among these solvents, preferred examples thereof include butanol, tetrahydrofurfuryl alcohol, phenoxyethanol, 1,3-butylene glycol diacetate, diethylene glycol methyl ethyl ether, and propylene glycol monomethyl ether. Acetate, acetamidineacetone, ethyl lactate, particularly preferably exemplified by butanol, 1,3-butanediol diacetate, diethylene glycol methyl ethyl ether, acetamidine acetone, ethyl lactate . The component C-2 may be used alone or in combination of two or more.

從塗布性的觀點來看,成分C-2的沸點優選100℃~300℃,更優選120℃~250℃,進而優選120℃~200℃。The boiling point of the component C-2 is preferably from 100 ° C to 300 ° C, more preferably from 120 ° C to 250 ° C, even more preferably from 120 ° C to 200 ° C from the viewpoint of coatability.

從調整為適於塗布的粘度的觀點來看,本發明的硬化性組合物中的溶劑的含量優選的是以硬化性組合物的總固體成分量成為3質量%~30質量%的方式而含有。更優選5質量%~20質量%,進而優選8質量%~15質量%。即,優選的是總固體成分:總溶劑(質量比)=8:92~30:70,更優選5:95~20:80,進而優選8:92~15:85。The content of the solvent in the curable composition of the present invention is preferably such that the total solid content of the curable composition is from 3% by mass to 30% by mass, from the viewpoint of the viscosity to be applied. . It is more preferably 5% by mass to 20% by mass, still more preferably 8% by mass to 15% by mass. That is, it is preferred that the total solid content: total solvent (mass ratio) = 8: 92 to 30: 70, more preferably 5: 95 to 20: 80, still more preferably 8: 92 to 15: 85.

本發明的硬化性組合物的20℃下的粘度為1 mPa·s~30 mPa·s。若硬化性組合物的粘度小於1 mPa·s,則粘度低、印刷適性差。另外,若粘度超過30 mPa·s,則粘度過高,噴墨噴出性、或面內均勻性差。 本發明的硬化性組合物的20℃下的粘度優選5 mPa·s~30 mPa·s,更優選10 mPa·s~25 mPa·s,進而優選10 mPa·s~20 mPa·s。 粘度例如優選的是使用東機產業(股)製造的RE-80L型旋轉粘度計在20℃±0.2℃下測定。關於測定時的旋轉速度,粘度小於5 mPa·s的情況下優選的是以1,000 rpm~100 rpm來進行測定,粘度為5 mPa·s以上且小於10 mPa·s的情況下優選的是以50 rpm來進行測定,粘度為10 mPa·s以上且小於30 mPa·s的情況下優選的是以20 rpm來進行測定,粘度為30 mPa·s以上的情況下優選的是以10 rpm來進行測定。The curable composition of the present invention has a viscosity at 20 ° C of 1 mPa·s to 30 mPa·s. When the viscosity of the curable composition is less than 1 mPa·s, the viscosity is low and the printability is poor. On the other hand, when the viscosity exceeds 30 mPa·s, the viscosity is too high, and the inkjet discharge property or the in-plane uniformity is inferior. The viscosity of the curable composition of the present invention at 20 ° C is preferably 5 mPa·s to 30 mPa·s, more preferably 10 mPa·s to 25 mPa·s, still more preferably 10 mPa·s to 20 mPa·s. The viscosity is preferably, for example, measured at 20 ° C ± 0.2 ° C using an RE-80L type rotational viscometer manufactured by Toki Sangyo Co., Ltd. In the case of the rotation speed at the time of measurement, when the viscosity is less than 5 mPa·s, it is preferably measured at 1,000 rpm to 100 rpm, and when the viscosity is 5 mPa·s or more and less than 10 mPa·s, it is preferably 50. When the viscosity is 10 mPa·s or more and less than 30 mPa·s, it is preferably measured at 20 rpm, and when the viscosity is 30 mPa·s or more, it is preferably measured at 10 rpm. .

-具有配位性基的化合物- 本發明中,在使用a1及/或a2的情況下,優選的是含有具有鈦配位性基及/或鋯配位性基的化合物作為成分A。 所謂本發明中的“鈦配位性基及/或鋯配位性基”,是指可與鈦原子及/或鋯原子形成配位鍵的基團,可與鈦原子或鋯原子的僅任一個形成配位鍵,也可與鈦原子及鋯原子兩者形成配位鍵。 另外,由鈦配位性基及/或鋯配位性基所形成的配位可為單牙配位(一牙配位)、二牙配位、三牙配位及四牙以上的配位的任一種,所述配位性基優選單牙配位或二牙配位的配位性基,更優選二牙配位的配位性基。 進而,鈦配位性基及/或鋯配位性基優選的是配位在鈦原子及/或鋯原子上而成為鈦原子及/或鋯原子上的中性配體的基團。 在至少具有鈦配位性基及/或鋯配位性基的化合物配位在a1及/或a2上的情況下,經配位的鈦原子或鋯原子的d軌道的能階分裂。因此,通過觀測能階的分裂而獲知配位的有無。 確認是否為鈦配位性基及/或鋯配位性基的方法可舉出觀測配位有無的方法。具體的配位有無的觀測方法可使用眾所周知的觀測方法,例如可舉出光譜學方法或電子自旋共振法(Electron Spin Resonance,ESR)等。- Compound having a Coordinating Group - In the present invention, in the case of using a1 and/or a2, a compound having a titanium complex group and/or a zirconium complex group is preferably contained as the component A. The "titanium coordination group and/or zirconium coordination group" in the present invention means a group which can form a coordinate bond with a titanium atom and/or a zirconium atom, and can be used only for a titanium atom or a zirconium atom. One forms a coordinate bond, and can also form a coordinate bond with both a titanium atom and a zirconium atom. In addition, the coordination formed by the titanium coordination group and/or the zirconium coordination group may be a single tooth coordination (one tooth coordination), a second tooth coordination, a three tooth coordination, and a coordination of four teeth or more. Any one of the ligand groups is preferably a monodentate or a bidentate coordinating group, and more preferably a bidentate coordinating group. Further, the titanium ligand group and/or the zirconium ligand group are preferably a group which is coordinated to a titanium atom and/or a zirconium atom to form a neutral ligand on a titanium atom and/or a zirconium atom. In the case where a compound having at least a titanium coordinating group and/or a zirconium ligand group is coordinated to a1 and/or a2, the energy level of the d orbital of the coordinated titanium atom or zirconium atom is split. Therefore, the presence or absence of the coordination is known by observing the division of the energy level. A method of confirming whether or not it is a titanium complex group and/or a zirconium complex group includes a method of observing the presence or absence of coordination. A well-known observation method can be used for the specific observation method, and examples thereof include a spectroscopy method or an Electron Spin Resonance (ESR).

從組合物的穩定性或膜物性的觀點來看,本發明中的鈦配位性基及/或鋯配位性基優選的是具有氧原子的基團,更優選的是具有兩個以上的氧原子的基團,進而優選的是至少具有2個氧原子在中間介隔2原子~4原子的其他原子而鍵結的結構的基團,特別優選的是至少具有2個氧原子在中間介隔3原子或4原子的其他原子而鍵結的結構的基團。另外,所述氧原子的至少一個優選的是羰基或酯結構中的羰基的氧原子。 另外,從組合物的穩定性或膜物性的觀點來看,本發明的鈦配位性基及/或鋯配位性基優選的是可通過氧原子而配位在鈦原子及/或鋯原子上的基團。The titanium coordinating group and/or the zirconium complexing group in the present invention is preferably a group having an oxygen atom, and more preferably having two or more, from the viewpoint of stability of the composition or film properties. The group of the oxygen atom is more preferably a group having a structure in which at least two oxygen atoms are bonded via another atom of 2 to 4 atoms in the middle, and it is particularly preferred to have at least 2 oxygen atoms in the middle. A group of structures bonded by another atom of 3 atoms or 4 atoms. Further, at least one of the oxygen atoms is preferably an oxygen atom of a carbonyl group in a carbonyl or ester structure. Further, from the viewpoint of stability of the composition or film physical properties, the titanium coordinating group and/or the zirconium complexing group of the present invention preferably is coordinated to the titanium atom and/or the zirconium atom by an oxygen atom. The group on the top.

本發明的鈦配位性基及/或鋯配位性基優選的是具有選自由1,2-二酮結構、1,3-二酮結構、1,4-二酮結構、α-羥基酮結構、α-羥基酯結構、α-酮基酯結構、β-酮基酯結構、丙二酸二酯結構、富馬酸二酯結構及鄰苯二甲酸二酯結構所組成的組群中的至少一個結構的基團,更優選的是具有選自由1,2-二酮結構、1,3-二酮結構、α-羥基酮結構、α-羥基酯結構、α-酮基酯結構、β-酮基酯結構及鄰苯二甲酸二酯結構所組成的組群中的至少一個結構的基團,進而優選的是具有選自由1,3-二酮結構、α-羥基酮結構、β-酮基酯結構及鄰苯二甲酸二酯結構所組成的組群中的至少一個結構的基團,特別優選的是具有選自由1,3-二酮結構、α-羥基酮結構及β-酮基酯結構所組成的組群中的至少一個結構的基團,最優選的是具有選自由1,3-二酮結構及β-酮基酯結構所組成的組群中的至少一個結構的基團。若為所述實施方式,則所得的硬化膜的折射率及保存穩定性更優異。The titanium coordinating group and/or zirconium ligand group of the present invention preferably has a structure selected from the group consisting of a 1,2-diketone structure, a 1,3-diketone structure, a 1,4-diketone structure, and an α-hydroxyketone. In a group consisting of a structure, an α-hydroxyester structure, an α-ketoester structure, a β-ketoester structure, a malonic acid diester structure, a fumaric acid diester structure, and a phthalic acid diester structure More preferably, at least one structural group has a structure selected from the group consisting of a 1,2-diketone structure, a 1,3-diketone structure, an α-hydroxyketone structure, an α-hydroxyester structure, an α-ketoester structure, and β. a group having at least one structure in a group consisting of a ketoester structure and a phthalic acid diester structure, and further preferably having a structure selected from the group consisting of a 1,3-diketone structure, an α-hydroxyketone structure, and β- A group having at least one structure in a group consisting of a ketoester structure and a phthalic acid diester structure, particularly preferably having a structure selected from the group consisting of a 1,3-diketone structure, an α-hydroxyketone structure, and a β-ketone The group of at least one structure in the group consisting of the ester structure, most preferably having at least one selected from the group consisting of a 1,3-diketone structure and a β-ketoester structure Group structure. According to the embodiment, the cured film obtained is more excellent in refractive index and storage stability.

本發明的鈦配位性基或鋯配位性基優選的是具有下述式b-1~式b-5所表示的結構的任一個的基團,更優選的是具有下述式b-1、式b-2、式b-3或式b-5所表示的結構的基團,進而優選的是具有下述式b-1、式b-2或式b-3所表示的結構的基團,特別優選的是具有下述式b-1或式b-2所表示的結構的基團。The titanium ligand group or the zirconium ligand group of the present invention is preferably a group having any one of the structures represented by the following formulas b-1 to b-5, and more preferably has the following formula b- 1. A group having a structure represented by the formula b-2, the formula b-3 or the formula b-5, and more preferably having a structure represented by the following formula b-1, formula b-2 or formula b-3 The group is particularly preferably a group having a structure represented by the following formula b-1 or formula b-2.

[化13] [Chemistry 13]

式b-1~式b-5中,L1 及L2 分別獨立地表示單鍵或者碳數1或2的亞烷基,R'分別獨立地表示烷基、烷氧基、鹵素原子、醯基或烷氧基羰基,nb表示0~4的整數,波線部分表示與其他結構的鍵結位置。In the formulae b-1 to b-5, L 1 and L 2 each independently represent a single bond or an alkylene group having 1 or 2 carbon atoms, and R' each independently represents an alkyl group, an alkoxy group, a halogen atom or a hydrazine. The base or alkoxycarbonyl group, nb represents an integer of 0 to 4, and the wave line portion indicates a bonding position with another structure.

L1 及L2 優選亞甲基。 R'的碳數優選0~20。另外,R'分別獨立地優選烷基、烷氧基或鹵素原子。 nb優選0或1,更優選0。L 1 and L 2 are preferably methylene groups. The carbon number of R' is preferably 0 to 20. Further, R' is each independently preferably an alkyl group, an alkoxy group or a halogen atom. Nb is preferably 0 or 1, more preferably 0.

鈦配位性基或鋯配位性基具體可優選地舉出下述所示的基團。此外,波線部分表示與其他結構的鍵結位置。Specific examples of the titanium coordinating group or the zirconium complexing group are as shown below. In addition, the wave line portion indicates the bonding position with other structures.

[化14] [Chemistry 14]

本發明中,具有鈦配位性基及/或鋯配位性基的化合物也可作為成分B而添加,另外也可作為成分C而添加,並無特別限定,優選的是作為成分C而添加,特別優選的是作為成分C-2而添加。 在作為成分B而添加的情況下,乙烯性不飽和基並無特別限制,可優選地舉出(甲基)丙烯醯氧基、(甲基)丙烯醯胺基、烯丙基、苯乙烯基及乙烯氧基,可更優選地舉出(甲基)丙烯醯氧基及烯丙基,可特別優選地舉出(甲基)丙烯醯氧基。 從顯影性的觀點來看,具有鈦配位性基及/或鋯配位性基以及乙烯性不飽和基的化合物優選的是具有1,3-二酮結構或β-酮基酯結構的(甲基)丙烯酸酯化合物、或具有鄰苯二甲酸二酯結構的乙烯性不飽和化合物,更優選的是具有1,3-二酮結構或β-酮基酯結構的(甲基)丙烯酸酯化合物。 另外,具有鈦配位性基及/或鋯配位性基以及乙烯性不飽和基的化合物可單獨使用一種,也可並用兩種以上。 從硬化膜的耐化學品性的觀點來看,所述具有鈦配位性基及/或鋯配位性基以及乙烯性不飽和基的化合物優選的是具有鈦配位性基及/或鋯配位性基的(甲基)丙烯酸酯化合物,更優選的是具有鈦配位性基及/或鋯配位性基的單官能(甲基)丙烯酸酯化合物,進而優選的是下述所示的化合物。 另外,所述具有鄰苯二甲酸二酯結構的乙烯性不飽和化合物可優選地例示鄰苯二甲酸二烯丙脂。In the present invention, the compound having a titanium complex group and/or a zirconium complex group may be added as the component B, or may be added as the component C, and is not particularly limited, and it is preferably added as the component C. It is especially preferable to add as component C-2. In the case of being added as the component B, the ethylenically unsaturated group is not particularly limited, and preferably (meth)acryloxy group, (meth)acrylamide group, allyl group, styryl group The vinyloxy group is more preferably a (meth) propylene decyloxy group and an allyl group, and a (meth) acryloxy group is particularly preferable. From the viewpoint of developability, a compound having a titanium coordinating group and/or a zirconium complex group and an ethylenically unsaturated group preferably has a 1,3-diketone structure or a β-ketoester structure ( a (meth) acrylate compound, or an ethylenically unsaturated compound having a phthalic acid diester structure, more preferably a (meth) acrylate compound having a 1,3-diketone structure or a β-ketoester structure . Further, the compound having a titanium complex group and/or a zirconium complex group and an ethylenically unsaturated group may be used alone or in combination of two or more. From the viewpoint of chemical resistance of the cured film, the compound having a titanium coordinating group and/or a zirconium complex group and an ethylenically unsaturated group preferably has a titanium coordinating group and/or zirconium. The (meth) acrylate compound having a ligand group is more preferably a monofunctional (meth) acrylate compound having a titanium coordinating group and/or a zirconium dentate group, and further preferably shown below. compound of. Further, the ethylenically unsaturated compound having a phthalic acid diester structure may preferably be exemplified by diallyl phthalate.

[化15] [化15]

另外,不具有乙烯性不飽和基且具有鈦配位性基及/或鋯配位性基的化合物優選1,2-二酮化合物、1,3-二酮化合物、1,4-二酮化合物、α-羥基酮化合物、α-羥基酯化合物、α-酮基酯化合物、β-酮基酯化合物、丙二酸二酯化合物、富馬酸二酯化合物或鄰苯二甲酸二酯化合物,更優選1,2-二酮化合物、1,3-二酮化合物、α-羥基酮化合物、α-酮基酯化合物、β-酮基酯化合物或鄰苯二甲酸二酯化合物,進而優選1,3-二酮化合物、α-羥基酮化合物或β-酮基酯化合物,特別優選1,3-二酮化合物或β-酮基酯化合物。 所述不具有乙烯性不飽和基且具有鈦配位性基及/或鋯配位性基的化合物的具體例可舉出下述所示的化合物。Further, the compound having no ethylenically unsaturated group and having a titanium coordinating group and/or a zirconium complexing group is preferably a 1,2-diketone compound, a 1,3-diketone compound, or a 1,4-diketone compound. , an α-hydroxyketone compound, an α-hydroxyester compound, an α-ketoester compound, a β-ketoester compound, a malonic acid diester compound, a fumaric acid diester compound or a phthalic acid diester compound, A 1,2-diketone compound, a 1,3-diketone compound, an α-hydroxyketone compound, an α-ketoester compound, a β-ketoester compound or a phthalic acid diester compound is preferred, and 1,3 is further preferred. a diketone compound, an α-hydroxyketone compound or a β-ketoester compound, and a 1,3-diketone compound or a β-ketoester compound is particularly preferable. Specific examples of the compound having no ethylenically unsaturated group and having a titanium coordinating group and/or a zirconium ligand group include the compounds shown below.

[化16] [Chemistry 16]

這些化合物中,優選乙醯丙酮(2,4-戊二酮)、乙醯乙酸乙酯(3-氧代丁酸乙酯)、或乳酸乙酯,特別優選乙醯丙酮或乙醯乙酸乙酯。這些適用于成分C-2。Among these compounds, acetonitrile acetone (2,4-pentanedione), ethyl acetate (ethyl 3-oxobutanoate), or ethyl lactate is preferred, and ethyl acetate or ethyl acetate is particularly preferred. . These apply to ingredient C-2.

相對於a1及a2的總含量100質量份,這些具有配位性基的化合物的含量優選15質量份~140質量份。The content of these compounds having a coordinating group is preferably 15 parts by mass to 140 parts by mass based on 100 parts by mass of the total content of a1 and a2.

成分D:光聚合引發劑 本發明的硬化性組合物優選的是含有光聚合引發劑作為成分D。在本發明的硬化性組合物為負型感光性組合物的情況下,特別優選含有光聚合引發劑。 光聚合引發劑優選的是包含光自由基聚合引發劑。 本發明中可使用的光聚合引發劑為可利用光化射線引發、促進具有乙烯性不飽和基的化合物等聚合性化合物的聚合的化合物。 所謂“光化射線”,只要為可通過其照射而賦予可由成分D產生引發種的能量的活性能量線,則並無特別限制,廣泛地包含α射線、γ射線、X射線、紫外線(UV)、可見光線、電子束等。這些中,優選的是至少包含紫外線的光。Component D: Photopolymerization Initiator The curable composition of the present invention preferably contains a photopolymerization initiator as component D. When the curable composition of the present invention is a negative photosensitive composition, it is particularly preferable to contain a photopolymerization initiator. The photopolymerization initiator preferably contains a photoradical polymerization initiator. The photopolymerization initiator which can be used in the present invention is a compound which can initiate polymerization of a polymerizable compound such as a compound having an ethylenically unsaturated group by irradiation with actinic rays. The "actinic ray" is not particularly limited as long as it is an active energy ray that can impart energy for inducing species to the component D by irradiation, and includes α rays, γ rays, X rays, and ultraviolet rays (UV) in a wide range. , visible light, electron beam, etc. Among these, light containing at least ultraviolet rays is preferred.

光聚合引發劑例如可舉出:肟酯化合物、有機鹵化化合物、氧基二唑化合物、羰基化合物、縮酮(ketal)化合物、安息香化合物、吖啶化合物、有機過氧化化合物、偶氮化合物、香豆素化合物、疊氮化合物、茂金屬化合物、六芳基聯咪唑化合物、有機硼酸化合物、二磺酸化合物、鎓鹽化合物、醯基膦(氧化物)化合物。這些化合物中,從感度的方面來看,優選肟酯化合物及/或六芳基聯咪唑化合物,更優選肟酯化合物。Examples of the photopolymerization initiator include an oxime ester compound, an organic halogenated compound, an oxydiazole compound, a carbonyl compound, a ketal compound, a benzoin compound, an acridine compound, an organic peroxidation compound, an azo compound, and a fragrance. A soy compound, an azide compound, a metallocene compound, a hexaarylbiimidazole compound, an organoboronic acid compound, a disulfonic acid compound, a phosphonium salt compound, a mercaptophosphine (oxide) compound. Among these compounds, an oxime ester compound and/or a hexaarylbiimidazole compound is preferable from the viewpoint of sensitivity, and an oxime ester compound is more preferable.

肟酯化合物可使用:日本專利特開2000-80068號公報、日本專利特開2001-233842號公報、特表2004-534797號公報、日本專利特開2007-231000號公報、日本專利特開2009-134289號公報中記載的化合物。 肟酯化合物優選下述式D-1或式D-2所表示的化合物。The oxime ester compound can be used, for example, in JP-A-2000-80068, JP-A-2001-233842, JP-A-2004-534797, JP-A-2007-231000, and JP-A-2009- The compound described in Japanese Patent Publication No. 134289. The oxime ester compound is preferably a compound represented by the following formula D-1 or formula D-2.

[化17] [化17]

式D-1或式D-2中,Ar表示芳香族基或雜芳香族基,RD1 表示烷基、芳香族基或烷氧基,RD2 表示氫原子或烷基,進而RD2 也可與Ar基鍵結而形成環。In the formula D-1 or the formula D-2, Ar represents an aromatic group or a heteroaromatic group, R D1 represents an alkyl group, an aromatic group or an alkoxy group, and R D2 represents a hydrogen atom or an alkyl group, and further R D2 may be used. Bonded to the Ar group to form a ring.

Ar表示芳香族基或雜芳香族基,優選的是從苯環、萘環或哢唑環中去掉一個氫原子所得的基團,更優選的是與RD2 一起形成環的萘基、哢唑基。雜芳香族基中的雜原子可優選地舉出氮原子、氧原子及硫原子。其中,優選氮原子。 RD1 表示烷基、芳香族基或烷氧基,優選甲基、乙基、苄基、苯基、萘基、甲氧基或乙氧基,更優選甲基、乙基、苯基或甲氧基。 RD2 表示氫原子或烷基,優選氫原子或經取代的烷基,更優選氫原子、與Ar一起形成環的經取代的烷基或甲苯硫烷基。 另外,Ar優選碳數4~20的基團,RD1 優選碳數1~30的基團,另外,RD2 優選碳數1~50的基團。Ar represents an aromatic group or a heteroaromatic group, preferably a group obtained by removing one hydrogen atom from a benzene ring, a naphthalene ring or a carbazole ring, and more preferably a naphthyl group or a carbazole which forms a ring together with R D2 . base. The hetero atom in the heteroaromatic group may preferably be a nitrogen atom, an oxygen atom or a sulfur atom. Among them, a nitrogen atom is preferred. R D1 represents an alkyl group, an aromatic group or an alkoxy group, preferably a methyl group, an ethyl group, a benzyl group, a phenyl group, a naphthyl group, a methoxy group or an ethoxy group, more preferably a methyl group, an ethyl group, a phenyl group or a methyl group. Oxygen. R D2 represents a hydrogen atom or an alkyl group, preferably a hydrogen atom or a substituted alkyl group, more preferably a hydrogen atom, a substituted alkyl group or a toluenesulfanyl group which forms a ring together with Ar. Further, Ar is preferably a group having 4 to 20 carbon atoms, R D1 is preferably a group having 1 to 30 carbon atoms, and R D2 is preferably a group having 1 to 50 carbon atoms.

肟酯化合物更優選下述式D-3、式D-4或式D-5所表示的化合物,特別優選下述式D-5所表示的化合物。The oxime ester compound is more preferably a compound represented by the following formula D-3, formula D-4 or formula D-5, and particularly preferably a compound represented by the following formula D-5.

[化18] [化18]

式D-3~式D-5中,RD1 表示烷基、芳香族基或烷氧基,X表示-CH2 -、-C2 H4 -、-O-或-S-,RD3 分別獨立地表示鹵素原子,RD4 分別獨立地表示烷基、苯基、經烷基取代的氨基、芳硫基、烷硫基、烷氧基、芳氧基或鹵素原子,RD5 表示氫原子、烷基或芳基,RD6 表示烷基,n1及n2分別獨立地表示0~6的整數,n3表示0~5的整數。In the formulae D-3 to D-5, R D1 represents an alkyl group, an aromatic group or an alkoxy group, and X represents -CH 2 -, -C 2 H 4 -, -O- or -S-, and R D3 respectively. Independently represents a halogen atom, and R D4 each independently represents an alkyl group, a phenyl group, an alkyl-substituted amino group, an arylthio group, an alkylthio group, an alkoxy group, an aryloxy group or a halogen atom, and R D5 represents a hydrogen atom, An alkyl group or an aryl group, R D6 represents an alkyl group, n1 and n2 each independently represent an integer of 0 to 6, and n3 represents an integer of 0 to 5.

RD1 表示烷基、芳香族基或烷氧基,優選RD11 -X'-亞烷基-所表示的基團。RD11 表示烷基或芳基,X'表示硫原子或氧原子。RD11 優選芳基,更優選苯基。作為RD11 的烷基及芳基可經鹵素原子(優選氟原子、氯原子或溴原子)或烷基取代。 X優選硫原子。 RD3 及RD4 可在芳香環上的任意位置上鍵結。 RD4 表示烷基、苯基、經烷基取代的氨基、芳硫基、烷硫基、烷氧基、芳氧基或鹵素原子,優選烷基、苯基、芳硫基或鹵素原子,更優選烷基、芳硫基或鹵素原子,進而優選烷基或鹵素原子。烷基優選碳數1~5的烷基,更優選甲基或乙基。鹵素原子優選氯原子、溴原子或氟原子。 另外,RD4 的碳數優選0~50,更優選0~20。 RD5 表示氫原子、烷基或芳基,優選烷基。烷基優選碳數1~5的烷基,更優選甲基或乙基。芳基優選碳數6~10的芳基。 RD6 表示烷基,優選碳數1~5的烷基,更優選甲基或乙基。 n1及n2分別表示式D-3或式D-4的芳香環上的RD3 的取代數,n3表示式D-5的芳香環上的RD4 的取代數。 n1~n3分別獨立地優選0~2的整數,更優選0或1。R D1 represents an alkyl group, an aromatic group or an alkoxy group, and preferably a group represented by R D11 -X'-alkylene group. R D11 represents an alkyl group or an aryl group, and X' represents a sulfur atom or an oxygen atom. R D11 is preferably an aryl group, more preferably a phenyl group. The alkyl group and the aryl group as R D11 may be substituted by a halogen atom (preferably a fluorine atom, a chlorine atom or a bromine atom) or an alkyl group. X is preferably a sulfur atom. R D3 and R D4 can be bonded at any position on the aromatic ring. R D4 represents alkyl, phenyl, alkyl-substituted amino, arylthio, alkylthio, alkoxy, aryloxy or halogen atom, preferably alkyl, phenyl, arylthio or halogen atom, more An alkyl group, an arylthio group or a halogen atom is preferred, and an alkyl group or a halogen atom is further preferred. The alkyl group is preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group or an ethyl group. The halogen atom is preferably a chlorine atom, a bromine atom or a fluorine atom. Further, the carbon number of R D4 is preferably 0 to 50, and more preferably 0 to 20. R D5 represents a hydrogen atom, an alkyl group or an aryl group, preferably an alkyl group. The alkyl group is preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group or an ethyl group. The aryl group is preferably an aryl group having 6 to 10 carbon atoms. R D6 represents an alkyl group, preferably an alkyl group having 1 to 5 carbon atoms, more preferably a methyl group or an ethyl group. N1 and n2 respectively represent the substitution number of R D3 on the aromatic ring of the formula D-3 or the formula D-4, and n3 represents the substitution number of R D4 on the aromatic ring of the formula D-5. N1 to n3 are each independently preferably an integer of 0 to 2, and more preferably 0 or 1.

以下示出本發明中可優選地使用的肟酯化合物的例子。然而,本發明中所用的肟酯化合物當然不限定於這些化合物。此外,Me表示甲基,Ph表示苯基。另外,這些化合物中的肟的雙鍵的順式-反式異構可為EZ的任一種,也可為EZ的混合物。Examples of the oxime ester compound which can be preferably used in the present invention are shown below. However, the oxime ester compound used in the present invention is of course not limited to these compounds. Further, Me represents a methyl group, and Ph represents a phenyl group. Further, the cis-trans isomer of the double bond of fluorene in these compounds may be either EZ or a mixture of EZ.

[化19] [Chemistry 19]

有機鹵化化合物的例子具體可舉出:若林等人的《日本化學會公報(Bull Chem. Soc. Japan)》(42、2924(1969))、美國專利第3,905,815號說明書、日本專利特公昭46-4605號公報、日本專利特開昭48-36281號公報、日本專利特開昭55-32070號公報、日本專利特開昭60-239736號公報、日本專利特開昭61-169835號公報、日本專利特開昭61-169837號公報、日本專利特開昭62-58241號公報、日本專利特開昭62-212401號公報、日本專利特開昭63-70243號公報、日本專利特開昭63-298339號公報、M.P.亨特(M.P.Hutt)的《雜環化學雜誌(Journal of Heterocyclic Chemistry)》(1(No3),(1970))等中記載的化合物,特別可舉出經三鹵代甲基取代的噁唑化合物、均三嗪化合物。Specific examples of the organic halogenated compound include: Bull Chem. Soc. Japan (42, 2924 (1969)), US Patent No. 3,905,815, and Japanese Patent Publication No. 46-- Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. JP-A-61-169837, JP-A-62-58241, JP-A-62-212401, JP-A-63-70243, and JP-A-63-298339 The compound described in "Journal of Heterocyclic Chemistry" (1 (No. 3), (1970)) of MP Hutt, and the like, in particular, is substituted by a trihalogenated methyl group. Oxazole compound, s-triazine compound.

六芳基聯咪唑化合物的例子例如可舉出:日本專利特公平6-29285號公報、美國專利第3,479,185號、美國專利第4,311,783號、美國專利第4,622,286號等各說明書中記載的各種化合物。Examples of the hexaarylbiimidazole compound include various compounds described in each specification, such as Japanese Patent Publication No. Hei. 6-29285, U.S. Patent No. 3,479,185, U.S. Patent No. 4,311,783, and U.S. Patent No. 4,622,286.

醯基膦(氧化物)化合物可例示單醯基膦氧化物化合物及雙醯基膦氧化物化合物,具體來說,例如可舉出巴斯夫公司製造的豔佳固(IRGACURE)819、達羅固(Darocure)4265、達羅固(Darocure)TPO等。 苯乙酮化合物可例示巴斯夫公司製造的豔佳固(IRGACURE)127。The mercaptophosphine (oxide) compound is exemplified by a monodecylphosphine oxide compound and a bis-fluorenylphosphine oxide compound, and specific examples thereof include IRGACURE 819 and Darooco (manufactured by BASF Corporation). Darocure) 4265, Darocure TPO, etc. The acetophenone compound can be exemplified by IRGACURE 127 manufactured by BASF Corporation.

光聚合引發劑可使用一種或組合使用兩種以上。另外,在使用在曝光波長下不具有吸收的光聚合引發劑的情況下,也可使用增感劑。 相對於組合物中的總固體成分100質量份,本發明的硬化性組合物中的光聚合引發劑的總量優選0.5質量份~30質量份,更優選1質量份~20質量份,進而優選1質量份~10質量份,特別優選2質量份~5質量份。The photopolymerization initiator may be used alone or in combination of two or more. Further, in the case of using a photopolymerization initiator which does not have absorption at an exposure wavelength, a sensitizer can also be used. The total amount of the photopolymerization initiator in the curable composition of the present invention is preferably 0.5 parts by mass to 30 parts by mass, more preferably 1 part by mass to 20 parts by mass, even more preferably 100 parts by mass of the total solid content in the composition. 1 part by mass to 10 parts by mass, particularly preferably 2 parts by mass to 5 parts by mass.

-增感劑- 本發明的硬化性組合物中,除了光聚合引發劑、後述的光酸產生劑以外,也可添加增感劑。 增感劑吸收光化射線或放射線而成為激發狀態。成為激發狀態的增感劑與成分D相互作用,由此產生電子移動、能量移動、發熱等作用,可引發·促進聚合。 優選的增感劑的例子可舉出:屬於以下的化合物類、且在350 nm~450 nm範圍內具有吸收波長的化合物。多核芳香族類(例如芘、苝、三亞苯、蒽、菲)、呫噸類(例如熒光素、曙紅、赤蘚紅、羅丹明B、孟加拉紅)、呫噸酮類(例如呫噸酮、噻噸酮、二甲基噻噸酮、二乙基噻噸酮、異丙基噻噸酮、2-氯噻噸酮)、花青類(例如硫羰花青、氧羰花青)、部花青類(例如部花青、碳部花青)、若丹菁類、氧雜菁類、噻嗪類(例如硫堇、亞甲基藍、甲苯胺藍)、吖啶類(例如吖啶橙、氯黃素、丙烯黃素、苯並黃素)、吖啶酮類(例如吖啶酮、10-丁基-2-氯吖啶酮)、蒽醌類(例如蒽醌、9,10-二丁氧基蒽)、方酸化合物類(例如方酸化合物)、苯乙烯基類、鹼性苯乙烯基類、香豆素類(例如7-二乙基氨基-4-甲基香豆素、酮基香豆素)、哢唑類(例如N-乙烯基哢唑)、樟腦醌類、吩噻嗪類。 此外,本發明中可使用的典型的增感劑可舉出克裡維洛[J.V.Crivello,先進聚合物科技(Adv. in Polymer Sci.),62,1(1984)]中公開的增感劑。 增感劑的優選具體例可舉出:芘、苝、吖啶橙、噻噸酮、2-氯噻噸酮、苯並黃素、N-乙烯基哢唑、9,10-二丁氧基蒽、蒽醌、香豆素、酮基香豆素、菲、樟腦醌、吩噻嗪類等。相對于聚合引發劑100質量份,增感劑優選的是以30質量份~200質量份的比例添加。- Sensitizer - A sensitizer may be added to the curable composition of the present invention in addition to a photopolymerization initiator and a photoacid generator to be described later. The sensitizer absorbs actinic rays or radiation and becomes an excited state. The sensitizer which is in an excited state interacts with the component D, thereby generating an action of electron movement, energy movement, heat generation, etc., and can initiate and promote polymerization. Examples of preferred sensitizers include compounds belonging to the following compounds and having an absorption wavelength in the range of 350 nm to 450 nm. Polynuclear aromatics (such as lanthanum, cerium, triphenylene, anthracene, phenanthrene), xanthene (such as fluorescein, eosin, erythrosine, rhodamine B, bengal red), xanthone (such as xanthone) , thioxanthone, dimethyl thioxanthone, diethyl thioxanthone, isopropyl thioxanthone, 2-chlorothioxanthone), cyanines (eg, thiocarbocyanine, oxycarbocyanine), Cyanines (eg, merocyanine, carbonaceous cyanine), rhodamines, oxaphthalocyanines, thiazides (eg, thioindigo, methylene blue, toluidine blue), acridines (eg acridine orange, Chlorophyll, propylene flavin, benzoflavin), acridone (eg acridone, 10-butyl-2-chloroacridone), anthraquinones (eg hydrazine, 9,10-two Butyloxy), squaraine compounds (eg, squaraine compounds), styryls, basic styryls, coumarins (eg, 7-diethylamino-4-methylcoumarin, Ketocoumarins, carbazoles (eg N-vinylcarbazole), camphorquinones, phenothiazines. Further, as a typical sensitizer which can be used in the present invention, a sensitizer disclosed in JV Vrivello, Adv. in Polymer Sci., 62, 1 (1984) can be cited. . Preferable specific examples of the sensitizer include ruthenium, osmium, acridine orange, thioxanthone, 2-chlorothioxanthone, benzoflavin, N-vinylcarbazole, and 9,10-dibutoxy group.蒽, 蒽醌, coumarin, keto coumarin, phenanthrene, camphorquinone, phenothiazine and the like. The sensitizer is preferably added in a ratio of 30 parts by mass to 200 parts by mass based on 100 parts by mass of the polymerization initiator.

成分E:巰基化合物 本發明的硬化性組合物優選的是還含有巰基化合物作為成分E。通過含有巰基化合物,可獲得保存穩定性更優異、折射率更高的硬化物,另外硬化物的耐化學品性優異。 巰基化合物為在分子中具有至少一個巰基(-SH)的化合物。 巰基化合物可舉出單官能巰基化合物及多官能巰基化合物,其中,從感度、保存穩定性及膜物性的觀點來看,優選多官能巰基化合物。 巰基化合物的巰基可為一級巰基,也可為二級巰基,還可為三級巰基,從感度及耐化學品性的觀點來看,優選一級巰基或二級巰基,更優選二級巰基。另外,從保存穩定性的觀點來看,優選二級巰基或三級巰基,更優選二級巰基。 本發明中可使用的巰基化合物的分子量優選100~2,000,更優選200~1,000。 本發明中可使用的巰基化合物的巰基的個數並無特別限制,優選1~20,更優選2~10,進而優選2~6。Component E: mercapto compound The curable composition of the present invention preferably further contains a mercapto compound as component E. By containing a mercapto compound, a cured product having more excellent storage stability and a higher refractive index can be obtained, and the cured product is excellent in chemical resistance. The mercapto compound is a compound having at least one mercapto group (-SH) in the molecule. The mercapto compound is a monofunctional mercapto compound and a polyfunctional mercapto compound. Among them, a polyfunctional mercapto compound is preferred from the viewpoints of sensitivity, storage stability, and film physical properties. The mercapto group of the mercapto compound may be a primary mercapto group, a secondary mercapto group, or a third-order mercapto group. From the viewpoint of sensitivity and chemical resistance, a primary mercapto group or a second mercapto group is preferred, and a divalent mercapto group is more preferred. Further, from the viewpoint of storage stability, a secondary fluorenyl group or a tertiary fluorenyl group is preferred, and a second fluorenyl group is more preferred. The molecular weight of the mercapto compound which can be used in the present invention is preferably from 100 to 2,000, more preferably from 200 to 1,000. The number of the fluorenyl group of the mercapto compound which can be used in the present invention is not particularly limited, but is preferably 1 to 20, more preferably 2 to 10, still more preferably 2 to 6.

-單官能巰基化合物- 從經時穩定性、在溶劑中的溶解性的觀點來看,巰基化合物優選單官能巰基化合物。單官能巰基化合物優選的是分子量為100以上的低分子化合物,具體來說,優選的是分子量為80~1,000,更優選100~800。 另外,從感度的觀點來看,單官能巰基化合物優選的是具有雜環,更優選的是具有噻唑結構。- Monofunctional mercapto compound - The mercapto compound is preferably a monofunctional mercapto compound from the viewpoint of stability over time and solubility in a solvent. The monofunctional mercapto compound is preferably a low molecular compound having a molecular weight of 100 or more. Specifically, it is preferably a molecular weight of 80 to 1,000, more preferably 100 to 800. Further, from the viewpoint of sensitivity, the monofunctional mercapto compound preferably has a hetero ring, and more preferably has a thiazole structure.

單官能巰基化合物可舉出單官能脂肪族巰基化合物、單官能芳香族巰基化合物等,具體例可舉出:巰基乙醇(mercapto ethanol)、巰基丙醇、巰基丁醇、巰基丙二醇、巰基丁二醇、羥基苯硫醇(hydroxybenzenethiol)及其衍生物、2-巰基苯並噻唑、2-巰基苯並噁唑、2-巰基苯並咪唑、1-苯基-1H-苯並咪唑-2-硫醇、2-巰基-4(3H)-喹唑啉、β-巰基萘等巰基化合物。 除此以外,可舉出日本專利特開2011-65087號公報的段落0097~段落0098中記載的化合物、日本專利特開2008-299211號公報的段落0086~段落0088中記載的化合物。The monofunctional thiol compound may, for example, be a monofunctional aliphatic mercapto compound or a monofunctional aromatic mercapto compound, and specific examples thereof include mercapto ethanol, mercaptopropanol, mercaptobutanol, mercaptopropanediol, and mercaptobutanediol. , hydroxybenzenethiol and its derivatives, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 1-phenyl-1H-benzimidazole-2-thiol a mercapto compound such as 2-mercapto-4(3H)-quinazoline or β-mercaptophthalene. In addition, the compound described in paragraph 0097 to paragraph 0098 of JP-A-2011-65087, and the compound described in paragraphs 0086 to 0,088 of JP-A-2008-299211.

-多官能巰基化合物- 另外,從感度、保存穩定性及膜物性的觀點來看,巰基化合物優選多官能巰基化合物。多官能巰基化合物可舉出多官能脂肪族巰基化合物、多官能芳香族巰基化合物等。 本發明中,所謂“多官能巰基化合物”,是指在分子內具有兩個以上的巰基的化合物。多官能硫醇化合物優選的是分子量為100以上的低分子化合物,具體來說,優選的是分子量為100~1,500,更優選150~1,000。 多官能巰基化合物優選的是在分子內具有2個~10個巰基,更優選具有2個~6個。 脂肪族多官能硫醇化合物優選的是具有兩個以上的下述式e-1所表示的基團的化合物。- Polyfunctional mercapto compound - Further, the mercapto compound is preferably a polyfunctional mercapto compound from the viewpoints of sensitivity, storage stability, and film physical properties. The polyfunctional fluorenyl compound may, for example, be a polyfunctional aliphatic mercapto compound or a polyfunctional aromatic mercapto compound. In the present invention, the "polyfunctional thiol compound" means a compound having two or more fluorenyl groups in the molecule. The polyfunctional thiol compound is preferably a low molecular compound having a molecular weight of 100 or more. Specifically, it is preferably a molecular weight of from 100 to 1,500, more preferably from 150 to 1,000. The polyfunctional fluorenyl compound preferably has 2 to 10 fluorenyl groups in the molecule, and more preferably has 2 to 6 groups. The aliphatic polyfunctional thiol compound is preferably a compound having two or more groups represented by the following formula e-1.

[化20] [Chemistry 20]

式e-1中,R表示氫原子或烷基,A表示-CO-或-CH2 -。 多官能巰基化合物優選的是具有2個以上且6個以下的式e-1所表示的基團的化合物,更優選的是具有2個以上且4個以下的化合物。 式e-1中的R的烷基為直鏈、分支或環狀的烷基,碳數的範圍優選1~16,更優選1~10。烷基的具體例為甲基、乙基、丙基、異丙基、丁基、仲丁基、叔丁基、戊基、己基、2-乙基己基等,優選甲基、乙基、丙基或異丙基。 R優選氫原子、甲基、乙基、丙基或異丙基,更優選甲基或乙基。In the formula e-1, R represents a hydrogen atom or an alkyl group, and A represents -CO- or -CH 2 -. The polyfunctional fluorenyl compound is preferably a compound having two or more and six or less groups represented by the formula e-1, and more preferably having two or more and four or less compounds. The alkyl group of R in the formula e-1 is a linear, branched or cyclic alkyl group, and the carbon number is preferably in the range of 1 to 16, more preferably 1 to 10. Specific examples of the alkyl group are methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, tert-butyl, pentyl, hexyl, 2-ethylhexyl and the like, preferably methyl, ethyl or propyl. Base or isopropyl. R is preferably a hydrogen atom, a methyl group, an ethyl group, a propyl group or an isopropyl group, more preferably a methyl group or an ethyl group.

本發明中,多官能巰基化合物特別優選的是具有多個所述式e-1所表示的基團的下述式e-2所表示的化合物。In the present invention, the polyfunctional mercapto compound is particularly preferably a compound represented by the following formula e-2 having a plurality of the groups represented by the formula e-1.

[化21] [Chem. 21]

式e-2中,R表示氫原子或烷基,A表示-CO-或-CH2 -。L表示n價連結基,n表示2~6的整數。In the formula e-2, R represents a hydrogen atom or an alkyl group, and A represents -CO- or -CH 2 -. L represents an n-valent linking group, and n represents an integer of 2 to 6.

式e-2中的R的烷基與式e-1中的R為相同含意,優選的範圍也相同。n優選2~4。 式e-2中的作為n價連結基的L例如可舉出:-(CH2 )m -(m表示2~6的整數)等二價連結基;三羥甲基丙烷殘基、且具有三個-(CH2 )p -(p表示2~6的整數)的異氰脲酸環(isocyanuric ring)等三價連結基;季戊四醇殘基等四價連結基或五價連結基;及二季戊四醇殘基等六價連結基。The alkyl group of R in the formula e-2 has the same meaning as R in the formula e-1, and the preferred range is also the same. n is preferably 2 to 4. L which is an n-valent linking group in the formula e-2 includes, for example, a divalent linking group such as -(CH 2 ) m - (m represents an integer of 2 to 6); a trimethylolpropane residue; a trivalent linking group such as an isocyanuric ring of three -(CH 2 ) p - (p represents an integer of 2 to 6); a tetravalent linking group such as a pentaerythritol residue; or a pentavalent linking group; A hexavalent linking group such as a pentaerythritol residue.

多官能巰基化合物的具體例例如可舉出以下化合物作為優選的多官能硫醇化合物:三羥甲基丙烷三(3-巰基丙酸酯)、季戊四醇四(3-巰基丙酸酯)、四乙二醇雙(3-巰基丙酸酯)、二季戊四醇六(3-巰基丙酸酯)、季戊四醇四(巰基乙酸酯)(pentaerythritol tetrakis(2-thioglycollate))、季戊四醇四(3-巰基丁酸酯)、丁二醇雙(3-巰基丁酸酯)、1,4-雙(3-巰基丁醯氧基)丁烷、1,4-雙(3-巰基丁基氧基)丁烷、1,3,5-三(3-巰基丁氧基乙基)-1,3,5-三嗪-2,4,6(1H,3H,5H)-三酮等。 多官能巰基化合物的市售品可舉出卡倫茨MT(KarenzMT)(注冊商標)BD1、NR1或PE1(昭和電工(股)製造)、特姆皮克(TEMPIC)(SC有機化學(股)製造)等。Specific examples of the polyfunctional mercapto compound include, for example, the following compounds as a preferred polyfunctional thiol compound: trimethylolpropane tris(3-mercaptopropionate), pentaerythritol tetrakis(3-mercaptopropionate), tetraethyl Diol bis(3-mercaptopropionate), dipentaerythritol hexa(3-mercaptopropionate), pentaerythritol tetrakis (2-thioglycollate), pentaerythritol tetrakis(3-mercaptobutyric acid) Ester), butanediol bis(3-mercaptobutyrate), 1,4-bis(3-mercaptobutoxy)butane, 1,4-bis(3-mercaptobutyloxy)butane, 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione and the like. Commercial products of the polyfunctional mercapto compound include Karenz MT (registered trademark) BD1, NR1 or PE1 (manufactured by Showa Denko), and TEMPIC (SC organic chemistry) Manufacturing) and so on.

[化22] [化22]

其他具體例可舉出日本專利特開2012-14052號公報的段落0165~段落0167中記載的化合物。 芳香族巰基化合物可舉出國際公開第2010/050580號的段落0021~段落0022中記載的化合物。其中,優選4,4'-硫代雙苯硫醇。Other specific examples include the compounds described in paragraphs 0165 to 0167 of JP-A-2012-14052. The aromatic mercapto compound is exemplified by the compounds described in paragraphs 0021 to 0022 of International Publication No. 2010/050580. Among them, 4,4'-thiobisbenzenethiol is preferred.

另外,芳香族巰基化合物可優選地舉出式e-3所表示的化合物。Further, the aromatic mercapto compound is preferably a compound represented by the formula e-3.

[化23] [化23]

式e-3中,Xe 表示N原子或C原子,Ye 表示N原子、C原子、S原子或O原子,Le 表示單鍵或二價有機基,Ae 表示與Xe =C-Ye 一起形成芳香環的原子團。Ae 所形成的芳香環可具有羥基、醚基、酯基、氨基、醯胺基、硝基、氰基等取代基,進而也可具有與式中所描述者不同的巰基。E-3 in formula, X e represents a C atom or N atom, Y e represents a N atom, C atom, S atom or O atom, L e represents a single bond or a divalent organic group, A e represents X e = C- Y e together form an atomic group of an aromatic ring. The aromatic ring formed by A e may have a substituent such as a hydroxyl group, an ether group, an ester group, an amino group, a decylamino group, a nitro group, a cyano group or the like, and further may have a thiol group different from those described in the formula.

芳香族巰基化合物例如可舉出:苯硫醇、4-乙醯胺苯硫醇、4-叔丁基苯硫醇、2-萘硫醇、2-氨基苯硫醇、4-氨基苯硫醇、4-(二甲基氨基)苯硫醇、2-巰基噻唑、2-巰基苯並噻唑、三苯基甲硫醇(triphenylmethanthiol)、5-巰基-1-苯基-1H-四唑、2-巰基吡啶、2-巰基-5-甲基-1,3,4-噻二唑、2-巰基-1,3,4-噻二唑、2-氨基-5-巰基-1,3,4-噻二唑等單官能芳香族巰基化合物、或Examples of the aromatic mercapto compound include phenylthiol, 4-ethylguanamine thiol, 4-tert-butylbenzenethiol, 2-naphthylthiol, 2-aminobenzenethiol, and 4-aminobenzenethiol. , 4-(dimethylamino)benzenethiol, 2-mercaptothiazole, 2-mercaptobenzothiazole, triphenylmethanthiol, 5-mercapto-1-phenyl-1H-tetrazole, 2 - mercaptopyridine, 2-mercapto-5-methyl-1,3,4-thiadiazole, 2-mercapto-1,3,4-thiadiazole, 2-amino-5-mercapto-1,3,4 a monofunctional aromatic mercapto compound such as thiadiazole, or

1,2-二巰基苯、1,3-二巰基苯、1,4-二巰基苯、1,2-雙(巰基甲基)苯、1,3-雙(巰基甲基)苯、1,4-雙(巰基甲基)苯、1,3-雙(巰基乙基)苯、1,4-雙(巰基乙基)苯、1,2-雙(巰基甲氧基)苯、1,3-雙(巰基甲氧基)苯、1,4-雙(巰基甲氧基)苯、1,2-雙(巰基乙氧基)苯、1,3-雙(巰基乙氧基)苯、1,4-雙(巰基乙氧基)苯、1,2,3-三巰基苯、1,2,4-三巰基苯、1,3,5-三巰基苯、1,2,3-三(巰基甲基)苯、1,2,4-三(巰基甲基)苯、1,3,5-三(巰基甲基)苯、1,2,3-三(巰基乙基)苯、1,2,4-三(巰基乙基)苯、1,3,5-三(巰基乙基)苯、1,2,3-三(巰基甲氧基)苯、1,2,4-三(巰基甲氧基)苯、1,3,5-三(巰基甲氧基)苯、1,2,3-三(巰基乙氧基)苯、1,2,4-三(巰基乙氧基)苯、1,3,5-三(巰基乙氧基)苯、1,2,3,4-四巰基苯、1,2,3,5-四巰基苯、1,2,4,5-四巰基苯、1,2,3,4-四(巰基甲基)苯、1,2,3,5-四(巰基甲基)苯、1,2,4,5-四(巰基甲基)苯、1,2,3,4-四(巰基乙基)苯、1,2,3,5-四(巰基乙基)苯、1,2,4,5-四(巰基乙基)苯、1,2,3,4-四(巰基甲氧基)苯、1,2,3,5-四(巰基甲氧基)苯、1,2,4,5-四(巰基甲氧基)苯、1,2,3,4-四(巰基乙氧基)苯、1,2,3,5-四(巰基乙氧基)苯、1,2,4,5-四(巰基乙氧基)苯、2,2'-二巰基聯苯、4,4'-二巰基聯苯、4,4'-二巰基聯苄、2,5-甲苯二硫醇、3,4-甲苯二硫醇、1,4-萘二硫醇、1,5-萘二硫醇、2,6-萘二硫醇、2,7-萘二硫醇、2,4-二甲基苯-1,3-二硫醇、4,5-二甲基苯-1,3-二硫醇、9,10-蒽二甲硫醇、1,3-二(對甲氧基苯基)丙烷-2,2-二硫醇、1,3-二苯基丙烷-2,2-二硫醇、苯基甲烷-1,1-二硫醇、2,4-二(對巰基苯基)戊烷、1,2-雙(巰基甲硫基)苯、1,3-雙(巰基甲硫基)苯、1,4-雙(巰基甲硫基)苯、1,2-雙(巰基乙硫基)苯、1,3-雙(巰基乙硫基)苯、1,4-雙(巰基乙硫基)苯、1,2,3-三(巰基甲硫基)苯、1,2,4-三(巰基甲硫基)苯、1,3,5-三(巰基甲硫基)苯、1,2,3-三(巰基乙硫基)苯、1,2,4-三(巰基乙硫基)苯、1,3,5-三(巰基乙硫基)苯、1,2,3,4-四(巰基甲硫基)苯、1,2,3,5-四(巰基甲硫基)苯、1,2,4,5-四(巰基甲硫基)苯、1,2,3,4-四(巰基乙硫基)苯、1,2,3,5-四(巰基乙硫基)苯、1,2,4,5-四(巰基乙硫基)苯、4,4'-硫代雙苯硫醇(4,4'-thiobisbenzenethiol)、2,5-二巰基-1,3,4-噻二唑、2,6-二巰基嘌呤、1,3,5-三嗪-2,4,6-三硫醇等多官能芳香族巰基化合物。1,2-dimercaptobenzene, 1,3-dimercaptobenzene, 1,4-dimercaptobenzene, 1,2-bis(decylmethyl)benzene, 1,3-bis(decylmethyl)benzene, 1, 4-bis(decylmethyl)benzene, 1,3-bis(decylethyl)benzene, 1,4-bis(decylethyl)benzene, 1,2-bis(decylmethoxy)benzene, 1,3 - bis(indenylmethoxy)benzene, 1,4-bis(decylmethoxy)benzene, 1,2-bis(decylethoxy)benzene, 1,3-bis(decylethoxy)benzene, 1 , 4-bis(decylethoxy)benzene, 1,2,3-trimethylbenzene, 1,2,4-trimethylbenzene, 1,3,5-trimethylbenzene, 1,2,3-tri Mercaptomethyl)benzene, 1,2,4-tris(decylmethyl)benzene, 1,3,5-tris(decylmethyl)benzene, 1,2,3-tris(decylethyl)benzene, 1, 2,4-tris(decylethyl)benzene, 1,3,5-tris(decylethyl)benzene, 1,2,3-tris(fluorenylmethoxy)benzene, 1,2,4-trisyl (fluorenyl) Methoxy)benzene, 1,3,5-tris(fluorenylmethoxy)benzene, 1,2,3-tris(decylethoxy)benzene, 1,2,4-tris(decylethoxy)benzene 1,3,5-tris(decylethoxy)benzene, 1,2,3,4-tetradecylbenzene, 1,2,3,5-tetradecylbenzene, 1,2,4,5-tetradecyl Benzene, 1,2,3,4-tetrakis(fluorenylmethyl)benzene, 1,2,3,5-tetrakis(fluorenylmethyl)benzene, 1,2,4,5-tetrakisylmethyl)benzene, 1,2,3,4-tetrakis(decylethyl)benzene, 1,2,3, 5-tetrakis(decylethyl)benzene, 1,2,4,5-tetrakis(fluorenylethyl)benzene, 1,2,3,4-tetrakis(fluorenylmethoxy)benzene, 1,2,3,5 -tetrakis(methoxymethyl)benzene, 1,2,4,5-tetrakis(fluorenylmethoxy)benzene, 1,2,3,4-tetrakis(decylethoxy)benzene, 1,2,3, 5-tetrakis(decylethoxy)benzene, 1,2,4,5-tetrakis(decylethoxy)benzene, 2,2'-dimercaptobiphenyl, 4,4'-dimercaptobiphenyl, 4, 4'-dimercaptobenzyl, 2,5-toluene dithiol, 3,4-toluene dithiol, 1,4-naphthalene dithiol, 1,5-naphthalene dithiol, 2,6-naphthalene Mercaptan, 2,7-naphthalene dithiol, 2,4-dimethylbenzene-1,3-dithiol, 4,5-dimethylbenzene-1,3-dithiol, 9,10- Dimethyl mercaptan, 1,3-bis(p-methoxyphenyl)propane-2,2-dithiol, 1,3-diphenylpropane-2,2-dithiol, phenylmethane- 1,1-dithiol, 2,4-di(p-nonylphenyl)pentane, 1,2-bis(mercaptomethylthio)benzene, 1,3-bis(decylmethylthio)benzene, 1, 4-bis(mercaptomethylthio)benzene, 1,2-bis(mercaptoethylthio)benzene, 1,3-bis(mercaptoethylthio)benzene, 1,4-bis(decylethylthio)benzene, 1,2,3-tris(mercaptomethylthio)benzene, 1,2,4-tris(mercaptomethylthio)benzene, 1,3,5-tris(decylmethylthio)benzene, 1,2,3 -Tris(decylethylthio)benzene, 1,2,4- Tris(mercaptoethylthio)benzene, 1,3,5-tris(mercaptoethylthio)benzene, 1,2,3,4-tetrakis(fluorenylmethylthio)benzene, 1,2,3,5-tetra (mercaptomethylthio)benzene, 1,2,4,5-tetrakis(fluorenylmethylthio)benzene, 1,2,3,4-tetrakis(mercaptoethylthio)benzene, 1,2,3,5- Tetrakis(mercaptoethylthio)benzene, 1,2,4,5-tetrakis(mercaptoethylthio)benzene, 4,4'-thiobisbenzenethiol, 2,5- A polyfunctional aromatic mercapto compound such as dimercapto-1,3,4-thiadiazole, 2,6-dimercaptopurine, 1,3,5-triazine-2,4,6-trithiol.

巰基化合物可僅使用一種,也可並用兩種以上。 另外,從折射率的觀點來看,巰基化合物優選的是具有芳香環的巰基化合物。 進而,從顯影性的觀點來看,巰基化合物優選的是在分子內具有酯基、硫酯基(thioester group)、羥基、醯胺基、醚基、硫醚基(thioether group)等極性官能基。 從膜物性的觀點來看,相對於硬化性組合物的總固體成分,巰基化合物的含量優選0.1質量份~20質量份,更優選0.5質量份~15質量份,進而優選1質量份~10質量份。The mercapto compound may be used alone or in combination of two or more. Further, from the viewpoint of the refractive index, the mercapto compound is preferably a mercapto compound having an aromatic ring. Further, from the viewpoint of developability, the mercapto compound preferably has a polar functional group such as an ester group, a thioester group, a hydroxyl group, a guanamine group, an ether group, or a thioether group in the molecule. . The content of the mercapto compound is preferably 0.1 parts by mass to 20 parts by mass, more preferably 0.5 parts by mass to 15 parts by mass, even more preferably 1 part by mass to 10 parts by mass, based on the total solid content of the curable composition. Share.

成分F:表面活性劑 本發明的硬化性組合物也可含有表面活性劑。 表面活性劑可使用陰離子系、陽離子系、非離子系或兩性的任一種,優選的表面活性劑為非離子系表面活性劑。另外,表面活性劑優選氟系表面活性劑,更優選氟系非離子表面活性劑。 本發明中可使用的表面活性劑例如可舉出:作為市售品的美佳法(Megafac)F142D、美佳法(Megafac)F172、美佳法(Megafac)F173、美佳法(Megafac)F176、美佳法(Megafac)F177、美佳法(Megafac)F183、美佳法(Megafac)F479、美佳法(Megafac)F482、美佳法(Megafac)F554、美佳法(Megafac)F780、美佳法(Megafac)F781、美佳法(Megafac)F781-F、美佳法(Megafac)R30、美佳法(Megafac)R08、美佳法(Megafac)F-472SF、美佳法(Megafac)BL20、美佳法(Megafac)R-61、美佳法(Megafac)R-90(迪愛生(DIC)(股)製造),弗拉德(Fluorad)FC-135、弗拉德(Fluorad)FC-170C、弗拉德(Fluorad)FC-430、弗拉德(Fluorad)FC-431、諾貝克(Novec)FC-4430(住友3M(股)製造),旭嘉德(Asahiguard)AG7105、7000、950、7600、沙福隆(Surflon)S-112、沙福隆(Surflon)S-113、沙福隆(Surflon)S-131、沙福隆(Surflon)S-141、沙福隆(Surflon)S-145、沙福隆(Surflon)S-382、沙福隆(Surflon)SC-101、沙福隆(Surflon)SC-102、沙福隆(Surflon)SC-103、沙福隆(Surflon)SC-104、沙福隆(Surflon)SC-105、沙福隆(Surflon)SC-106(旭硝子(股)製造),艾福拓(Eftop)EF351、艾福拓(Eftop)352、艾福拓(Eftop)801、艾福拓(Eftop)802(三菱材料電子化成(股)製造),福吉特(Ftergent)250(尼奧斯(Neos)(股)製造)。另外,除了所述以外,也可舉出:KP(信越化學工業(股)製造),寶理弗洛(Polyflow)(共榮社化學(股)製造),艾福拓(Eftop)(三菱材料電子化成(股)製造),美佳法(Megafac)(迪愛生(DIC)(股)製造),弗拉德(Fluorad)(住友3M(股)製造),旭嘉德(Asahiguard)、沙福隆(Surflon)(旭硝子(股)製造),寶理佛斯(PolyFox)(歐諾瓦(OMNOVA)公司製造)等的各系列。Component F: Surfactant The curable composition of the present invention may also contain a surfactant. As the surfactant, any of an anionic, cationic, nonionic or amphoteric surfactant can be used, and a preferred surfactant is a nonionic surfactant. Further, the surfactant is preferably a fluorine-based surfactant, and more preferably a fluorine-based nonionic surfactant. Examples of the surfactant which can be used in the present invention include Megafac F142D, Megafac F172, Megafac F173, Megafac F176, and Megafa (commercially available). Megafac) F177, Megafac F183, Megafac F479, Megafac F482, Megafac F554, Megafac F780, Megafac F781, Megafac ) F781-F, Megafac R30, Megafac R08, Megafac F-472SF, Megafac BL20, Megafac R-61, Megafac R -90 (made by DiCai (DIC)), Fluorad FC-135, Fluorad FC-170C, Fluorad FC-430, Fluorad FC-431, Novec FC-4430 (made by Sumitomo 3M), Asahiguard AG7105, 7000, 950, 7600, Surflon S-112, Surflon S-113, Surflon S-131, Surflon S-141, Surflon S-145, Surflon S-382, Surflon SC-101, Surflon SC-102, Surflon SC-103, Sand Surflon SC-104, Surflon SC-105, Surflon SC-106 (made by Asahi Glass), Eftop EF351, Eftop 352, Eftop 801, Eftop 802 (Mitsubishi Materials Electronics Co., Ltd.), Ftergent 250 (manufactured by Neos). In addition, in addition to the above, KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Polyflow (manufactured by Kyoeisha Chemical Co., Ltd.), and Eftop (Mitsubishi Materials) are also mentioned. Electronic manufacturing (share) manufacturing), Megafac (made by DiCai (DIC)), Fluorad (made by Sumitomo 3M), Asahiguard, Shafulong ( Surflon) (made by Asahi Glass Co., Ltd.), various series of PolyFox (manufactured by OMNOVA).

另外,表面活性劑可舉出以下共聚物作為優選例:含有下述式F-1所表示的結構單元A及結構單元B、以四氫呋喃作為溶劑由凝膠滲透色譜所測定的聚苯乙烯換算的重量平均分子量(Mw)為1,000以上且10,000以下的共聚物。In addition, as a surfactant, the following copolymer is preferable, and the structural unit A and the structural unit B represented by the following formula F-1 are contained, and the polystyrene conversion by the gel permeation chromatography using tetrahydrofuran as a solvent is used. A copolymer having a weight average molecular weight (Mw) of 1,000 or more and 10,000 or less.

[化24]        結構單元A    結構單元B Structural unit A structural unit B

式F-1中,R401 及R403 分別獨立地表示氫原子或甲基,R402 表示碳數1以上且4以下的直鏈亞烷基,R404 表示氫原子或碳數1以上且4以下的烷基,L表示碳數3以上且6以下的亞烷基,p及q為表示聚合比的質量百分率,p表示10質量%以上且80質量%以下的數值,q表示20質量%以上且90質量%以下的數值,r表示1以上且18以下的整數,s表示1以上且10以下的整數。In the formula F-1, R 401 and R 403 each independently represent a hydrogen atom or a methyl group, R 402 represents a linear alkylene group having 1 or more and 4 or less carbon atoms, and R 404 represents a hydrogen atom or a carbon number of 1 or more and 4 In the following alkyl group, L represents an alkylene group having 3 or more and 6 or less carbon atoms, p and q are mass percentages indicating a polymerization ratio, p is a numerical value of 10% by mass or more and 80% by mass or less, and q is 20% by mass or more. And a numerical value of 90% by mass or less, r represents an integer of 1 or more and 18 or less, and s represents an integer of 1 or more and 10 or less.

所述L優選下述式F-2所表示的分支亞烷基。式F-2中的R405 表示碳數1以上且4以下的烷基,就相容性及對被塗布面的濡濕性的方面來看,優選碳數1以上且3以下的烷基,更優選碳數2或3的烷基。 式F-1中的p與q之和(p+q)優選p+q=100、即100質量%。The L is preferably a branched alkylene group represented by the following formula F-2. R 405 in the formula F-2 represents an alkyl group having 1 or more and 4 or less carbon atoms, and is preferably an alkyl group having 1 or more and 3 or less carbon atoms from the viewpoint of compatibility and wettability to a surface to be coated. An alkyl group having 2 or 3 carbon atoms is preferred. The sum of p and q (p+q) in the formula F-1 is preferably p+q=100, that is, 100% by mass.

[化25] [化25]

所述共聚物的重量平均分子量(Mw)更優選1,500以上且5,000以下。 這些表面活性劑可單獨使用一種或混合使用兩種以上。 在調配表面活性劑的情況下,相對於硬化性組合物的總固體成分100質量份,本發明的硬化性組合物中的表面活性劑的含量優選0.001質量份~5.0質量份,更優選0.01質量份~2.0質量份。The weight average molecular weight (Mw) of the copolymer is more preferably 1,500 or more and 5,000 or less. These surfactants may be used alone or in combination of two or more. In the case of formulating a surfactant, the content of the surfactant in the curable composition of the present invention is preferably 0.001 part by mass to 5.0 parts by mass, more preferably 0.01 mass, based on 100 parts by mass of the total solid content of the curable composition. Parts to 2.0 parts by mass.

成分G:烷氧基矽烷化合物 本發明的組合物也可含有烷氧基矽烷化合物作為密接改良劑。若使用烷氧基矽烷化合物,則可提高由本發明的硬化性組合物所形成的膜與基板的密接性,或可調整由本發明的硬化性組合物所形成的膜與基板的錐角(taper angle)。 本發明的組合物中可使用的烷氧基矽烷化合物優選的是使成為基材的無機物、例如矽、氧化矽、氮化矽等矽化合物、金、銅、鉬、鈦、鋁等金屬與絕緣膜的密接性提高的化合物。具體來說,眾所周知的矽烷偶合劑等也有效。 矽烷偶合劑可優選地舉出具有環氧基或(甲基)丙烯醯氧基的烷氧基矽烷化合物。 矽烷偶合劑例如可舉出:γ-氨基丙基三甲氧基矽烷、γ-氨基丙基三乙氧基矽烷、γ-縮水甘油氧基丙基三甲氧基矽烷、γ-縮水甘油氧基丙基三烷氧基矽烷、γ-縮水甘油氧基丙基二烷氧基矽烷、γ-甲基丙烯醯氧基丙基三烷氧基矽烷、γ-甲基丙烯醯氧基丙基二烷氧基矽烷、γ-氯丙基三烷氧基矽烷、γ-巰基丙基三烷氧基矽烷、β-(3,4-環氧環己基)乙基三烷氧基矽烷、乙烯基三烷氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷。這些中,更優選γ-縮水甘油氧基丙基三烷氧基矽烷或γ-甲基丙烯醯氧基丙基三烷氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷。 本發明的硬化性組合物中可使用的烷氧基矽烷化合物不特別限定於這些化合物,可使用眾所周知的化合物。Component G: alkoxydecane compound The composition of the present invention may also contain an alkoxydecane compound as a adhesion improving agent. When an alkoxydecane compound is used, the adhesion between the film formed of the curable composition of the present invention and the substrate can be improved, or the taper angle of the film formed by the curable composition of the present invention and the substrate can be adjusted (taper angle) ). The alkoxydecane compound which can be used in the composition of the present invention is preferably an inorganic material which is a substrate, an antimony compound such as cerium, cerium oxide or cerium nitride, or a metal such as gold, copper, molybdenum, titanium or aluminum. A compound having improved adhesion to a film. Specifically, a well-known decane coupling agent or the like is also effective. The decane coupling agent may preferably be an alkoxydecane compound having an epoxy group or a (meth) propylene fluorenyloxy group. Examples of the decane coupling agent include γ-aminopropyltrimethoxydecane, γ-aminopropyltriethoxydecane, γ-glycidoxypropyltrimethoxydecane, and γ-glycidoxypropyl group. Trialkoxy decane, γ-glycidoxypropyl dialkoxy decane, γ-methyl propylene methoxy propyl trialkoxy decane, γ-methyl propylene methoxy propyl dialkoxy Decane, γ-chloropropyltrialkoxydecane, γ-mercaptopropyltrialkoxydecane, β-(3,4-epoxycyclohexyl)ethyltrialkoxydecane, vinyltrialkoxy Decane, 3-propenyloxypropyltrimethoxydecane. Among these, γ-glycidoxypropyltrialkoxydecane or γ-methacryloxypropyltrialkoxydecane and 3-propenyloxypropyltrimethoxydecane are more preferable. The alkoxydecane compound which can be used in the curable composition of the present invention is not particularly limited to these compounds, and a well-known compound can be used.

烷氧基矽烷化合物可單獨使用一種或組合使用兩種以上。 在本發明的硬化性組合物含有烷氧基矽烷化合物的情況下,相對於硬化性組合物中的總固體成分100質量份,烷氧基矽烷化合物的含量優選0.1質量份~30質量份,更優選0.5質量份~20質量份。另外,優選的是相對于成分B 100質量份為0.1質量份~20質量份,更優選0.5質量份~10質量份。The alkoxydecane compound may be used alone or in combination of two or more. When the curable composition of the present invention contains an alkoxydecane compound, the content of the alkoxydecane compound is preferably 0.1 parts by mass to 30 parts by mass, based on 100 parts by mass of the total solid content in the curable composition. It is preferably 0.5 parts by mass to 20 parts by mass. Moreover, it is preferably 0.1 parts by mass to 20 parts by mass, more preferably 0.5 parts by mass to 10 parts by mass, per 100 parts by mass of the component B.

成分H:交聯劑 本發明的硬化性組合物視需要也可含有交聯劑。通過添加交聯劑,可使由本發明的硬化性組合物所得的硬化膜成為更牢固的膜。 交聯劑只要通過熱而引起交聯反應,則並無限制(其中,將上文所述的各成分除外),可使用公知的交聯劑。 在本發明的硬化性組合物含有交聯劑的情況下,相對於硬化性組合物中的總固體成分100質量份,交聯劑的含量優選0.1質量份~50質量份,更優選0.1質量份~30質量份,進而優選0.5質量份~20質量份。通過在所述範圍內添加,可獲得機械強度及耐溶劑性優異的硬化膜。也可將不同種類的交聯劑並用多種,此時將所有交聯劑相加來計算含量。Component H: Crosslinking agent The curable composition of the present invention may contain a crosslinking agent as needed. The cured film obtained from the curable composition of the present invention can be made into a stronger film by adding a crosslinking agent. The crosslinking agent is not limited as long as it causes a crosslinking reaction by heat (excluding each component described above), and a known crosslinking agent can be used. When the curable composition of the present invention contains a crosslinking agent, the content of the crosslinking agent is preferably 0.1 part by mass to 50 parts by mass, more preferably 0.1 part by mass, per 100 parts by mass of the total solid content of the curable composition. ~30 parts by mass, more preferably 0.5 parts by mass to 20 parts by mass. By adding in the said range, the hardening film which is excellent in mechanical strength and solvent resistance can be obtained. It is also possible to use a plurality of different kinds of crosslinking agents in combination, and at this time, all the crosslinking agents are added to calculate the content.

成分I:抗氧化劑 本發明的硬化性組合物也可含有抗氧化劑。抗氧化劑可含有眾所周知的抗氧化劑。通過添加抗氧化劑,有可防止硬化膜的著色、或可減少由分解所致的膜厚的薄化、另外耐熱透明性優異等優點。 這種抗氧化劑例如可舉出:磷系抗氧化劑、醯胺類、醯肼類、受阻胺系抗氧化劑、硫系抗氧化劑、酚系抗氧化劑、抗壞血酸類、硫酸鋅、糖類、亞硝酸鹽、亞硫酸鹽、硫代硫酸鹽、羥基胺衍生物等。這些中,從硬化膜的著色、膜厚的薄化的觀點來看,特別優選酚系抗氧化劑(受阻酚類)、受阻胺系抗氧化劑、磷系抗氧化劑(烷基亞磷酸酯類)、硫系抗氧化劑(硫醚類),最優選酚系抗氧化劑。這些抗氧化劑可單獨使用一種,也可混合兩種以上。 具體例可舉出:日本專利特開2005-29515號公報的段落0026~段落0031中記載的化合物、日本專利特開2011-227106號公報的段落0106~段落0116中記載的化合物,將這些內容併入到本案說明書中。 優選的市售品可舉出:艾迪科斯塔波(Adekastab)AO-60、艾迪科斯塔波(Adekastab)AO-80(以上為艾迪科(ADEKA)(股)製造),豔諾斯(Irganox)1035、豔諾斯(Irganox)1098、豔諾斯(Irganox)1726、豔佛斯(IRGAFOS)168(以上為巴斯夫公司製造)。Ingredient I: Antioxidant The curable composition of the present invention may also contain an antioxidant. Antioxidants can contain well known antioxidants. By adding an antioxidant, it is possible to prevent the coloration of the cured film, or to reduce the thickness of the film due to decomposition, and to improve the heat-resistant transparency. Examples of such an antioxidant include phosphorus-based antioxidants, guanamines, guanidines, hindered amine-based antioxidants, sulfur-based antioxidants, phenolic antioxidants, ascorbic acid, zinc sulfate, saccharides, and nitrites. Sulfite, thiosulfate, hydroxylamine derivative, and the like. Among these, from the viewpoint of coloring of the cured film and thinning of the film thickness, phenol-based antioxidants (hindered phenols), hindered amine-based antioxidants, and phosphorus-based antioxidants (alkyl phosphites) are particularly preferable. A sulfur-based antioxidant (thioether) is most preferably a phenol-based antioxidant. These antioxidants may be used alone or in combination of two or more. Specific examples include the compounds described in paragraphs 0026 to 0031 of JP-A-2005-29515, and the compounds described in paragraphs 0106 to 0116 of JP-A-2011-227106. Enter the instructions in this case. Preferred commercially available products include: Adekastab AO-60, Adekastab AO-80 (above, manufactured by ADEKA), Yannos (Irganox) 1035, Irganox 1098, Irganox 1726, IRGAFOS 168 (above, BASF).

在本發明的硬化性組合物含有抗氧化劑的情況下,相對於硬化性組合物中的總固體成分100質量份,抗氧化劑的含量優選0.1質量份~10質量份,更優選0.2質量份~5質量份,進而優選0.5質量份~4質量份。When the curable composition of the present invention contains an antioxidant, the content of the antioxidant is preferably 0.1 parts by mass to 10 parts by mass, more preferably 0.2 parts by mass to 5 parts by mass per 100 parts by mass of the total solid content of the curable composition. The part by mass is more preferably 0.5 parts by mass to 4 parts by mass.

成分J:其他金屬氧化物粒子 本發明的硬化性組合物為了調節折射率或光透射性,可不含鈦原子及鋯原子而含有其他金屬氧化物粒子。其他金屬氧化物粒子的金屬中,也包含硼(B)、矽(Si)、鍺(Ge)、砷(As)、銻(Sb)、碲(Te)等半金屬。 優選的其他金屬氧化物粒子優選的是包含鈹(Be)、鎂(Mg)、鈣(Ca)、鍶(Sr)、鋇(Ba)、鈧(Sc)、釔(Y)、鑭(La)、鈰(Ce)、釓(Gd)、鋱(Tb)、鏑(Dy)、鐿(Yb)、鑥(Lu)、鉿(Hf)、鈮(Nb)、鉬(Mo)、鎢(W)、鋅(Zn)、硼(B)、鋁(Al)、矽(Si)、鍺(Ge)、錫(Sn)、鉛(Pb)、銻(Sb)、鉍(Bi)、碲(Te)等原子的氧化物粒子,更優選氧化鋅、銦/錫氧化物、銻/錫氧化物。Component J: Other metal oxide particles The curable composition of the present invention may contain other metal oxide particles in order to adjust the refractive index or light transmittance without containing titanium atoms and zirconium atoms. The metal of the other metal oxide particles also contains a semimetal such as boron (B), bismuth (Si), germanium (Ge), arsenic (As), antimony (Sb) or tellurium (Te). Preferred other metal oxide particles preferably include beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba), strontium (Sc), strontium (Y), and lanthanum (La). , Ce (Ce), G (Gd), Tb (Tb), Dy, Yb, Lu, Hf, Nb, Mo (Mo), Tungsten (W) , zinc (Zn), boron (B), aluminum (Al), germanium (Si), germanium (Ge), tin (Sn), lead (Pb), antimony (Sb), antimony (Bi), antimony (Te) As the oxide particles of the equal atom, zinc oxide, indium/tin oxide, and antimony/tin oxide are more preferable.

從硬化性組合物的透明性的觀點來看,其他金屬氧化物粒子的平均一次粒徑優選1 nm~200 nm,更優選3 nm~80 nm,特別優選5 nm~50 nm。這裡,粒子的平均一次粒徑是指利用電子顯微鏡測定任意200個粒子的粒徑並求出的其算術平均值。另外,在粒子的形狀並非球形的情況下,將最長邊視為粒徑。The average primary particle diameter of the other metal oxide particles is preferably from 1 nm to 200 nm, more preferably from 3 nm to 80 nm, and particularly preferably from 5 nm to 50 nm from the viewpoint of transparency of the curable composition. Here, the average primary particle diameter of the particles means an arithmetic mean value obtained by measuring the particle diameter of an arbitrary 200 particles by an electron microscope. Further, in the case where the shape of the particles is not spherical, the longest side is regarded as the particle diameter.

另外,其他金屬氧化物粒子可單獨使用一種,也可並用兩種以上。 本發明的硬化性組合物中的其他金屬氧化物粒子的含量只要考慮到對由硬化性組合物所得的光學構件所要求的折射率、或光透射性等來適當決定即可,相對于本發明的硬化性組合物的總固體成分,優選的是設定為0質量%~50質量%,更優選的是設定為1質量%~40質量%,進而優選的是設定為2質量%~30質量%。Further, the other metal oxide particles may be used alone or in combination of two or more. The content of the other metal oxide particles in the curable composition of the present invention may be appropriately determined in consideration of the refractive index or light transmittance required for the optical member obtained from the curable composition, and the present invention. The total solid content of the curable composition is preferably from 0% by mass to 50% by mass, more preferably from 1% by mass to 40% by mass, even more preferably from 2% by mass to 30% by mass. .

本發明中,其他金屬氧化物粒子也能以分散液的形式供使用,所述分散液是通過使用球磨機、棒磨機等混合裝置將其他金屬氧化物粒子在適當的分散劑及溶劑中混合·分散而製備。In the present invention, other metal oxide particles can also be used in the form of a dispersion which mixes other metal oxide particles in a suitable dispersant and solvent by using a mixing device such as a ball mill or a rod mill. Prepared by dispersion.

-其他成分- 本發明的硬化性組合物中,視需要可添加塑化劑、聚合抑制劑、熱酸產生劑、酸增殖劑、粘合劑聚合物、包含具有酸基由酸分解性基保護的基團的結構單元的聚合物、光酸產生劑、芴(fluorene)化合物、分散劑、具有兩個以上的氮原子的雜環化合物等其他成分。關於這些成分,例如可使用日本專利特開2009-98616號公報、日本專利特開2009-244801號公報中記載的成分、日本專利特開2014-132292號公報段落0203~段落0298中記載的成分、國際公開第2014/199967號公報段落0025~段落0050中記載的成分、其他眾所周知的成分。另外,也可將《高分子添加劑的新展開(日刊工業報社(股))》中記載的各種紫外線吸收劑或金屬鈍化劑等添加到本發明的硬化性組合物中。-Other components - In the curable composition of the present invention, a plasticizer, a polymerization inhibitor, a thermal acid generator, an acid proliferator, a binder polymer, and an acid group-containing group having an acid group may be added as needed. Other components such as a polymer of a structural unit of a group, a photoacid generator, a fluorene compound, a dispersant, and a heterocyclic compound having two or more nitrogen atoms. For the components, for example, the components described in JP-A-2009-98616, JP-A-2009-244801, and the components described in paragraphs 0203 to 0298 of JP-A-2014-132292 can be used. The components described in paragraphs 0025 to 0050 of International Publication No. 2014/199967, and other well-known components. In addition, various ultraviolet absorbers, metal deactivators, and the like described in "New Development of Polymer Additives (Nikko Kogyo Co., Ltd.)" may be added to the curable composition of the present invention.

<聚合抑制劑> 本發明的硬化性組合物可含有聚合抑制劑。 所謂聚合抑制劑,是指發揮以下作用的物質:對由聚合引發劑所產生的聚合引發自由基成分實施供氫(或授氫)、供能(或授能)、供電子(或授電子)等,使聚合引發自由基失活,抑制聚合引發。例如可使用日本專利特開2007-334322號公報的段落0154~段落0173中記載的化合物等。 優選的化合物可舉出:吩噻嗪、吩噁嗪、對苯二酚、3,5-二丁基-4-羥基甲苯。 聚合抑制劑的含量並無特別限制,相對於硬化性組合物的總固體成分,優選0.0001質量%~5質量%。<Polymerization inhibitor> The curable composition of the present invention may contain a polymerization inhibitor. The polymerization inhibitor refers to a substance that performs hydrogen supply (or hydrogen transfer), energy supply (or energy transfer), and electron supply (or electron donation) to a polymerization-initiated radical component generated by a polymerization initiator. Etc., the polymerization initiates the inactivation of free radicals and inhibits polymerization initiation. For example, the compound described in paragraphs 0154 to 0173 of JP-A-2007-334322 can be used. Preferred examples of the compound include phenothiazine, phenoxazine, hydroquinone, and 3,5-dibutyl-4-hydroxytoluene. The content of the polymerization inhibitor is not particularly limited, and is preferably 0.0001% by mass to 5% by mass based on the total solid content of the curable composition.

<包含具有酸基由酸分解性基保護的基團的結構單元的聚合物> 本發明的硬化性組合物也可含有以下聚合物,所述聚合物包含具有酸基由酸分解性基保護的基團的結構單元。 此外,本發明中,也將“具有酸基由酸分解性基保護的基團的結構單元”稱為“(a1)具有酸基由酸分解性基保護的基團的結構單元”。<Polymer of a structural unit containing a group having an acid group protected by an acid-decomposable group> The curable composition of the present invention may also contain a polymer containing an acid group which is protected by an acid-decomposable group. The structural unit of the group. Further, in the present invention, the "structural unit having a group having an acid group protected by an acid-decomposable group" is also referred to as "(a1) a structural unit having a group in which an acid group is protected by an acid-decomposable group".

本發明的硬化性組合物可進而含有以下聚合物,所述聚合物是包含具有酸基由酸分解性基保護的基團的結構單元的聚合物以外的聚合物。 本發明的硬化性組合物優選含有包含滿足下述(1)及(2)的至少一個的聚合物的聚合物成分。 (1)包含(a1)具有酸基由酸分解性基保護的基團的結構單元及(a2)具有交聯性基的結構單元的聚合物 (2)包含(a1)具有酸基由酸分解性基保護的基團的結構單元的聚合物、及包含(a2)具有交聯性基的結構單元的聚合物 本發明的硬化性組合物可進而含有這些以外的聚合物。 從硬化後的透明性(霧度)及未曝光部的殘膜率的觀點來看,本發明的硬化性組合物優選的是包含滿足所述(1)的成分。此外,本發明中是將滿足所述(1)的成分或所述(2)中的包含(a2)具有交聯性基的結構單元的聚合物視作所述成分B。The curable composition of the present invention may further contain a polymer other than a polymer including a structural unit having a group in which an acid group is protected by an acid-decomposable group. The curable composition of the present invention preferably contains a polymer component containing a polymer satisfying at least one of the following (1) and (2). (1) A polymer (2) comprising (a1) a structural unit having a group having an acid group protected by an acid-decomposable group and (a2) a structural unit having a crosslinkable group (a1) having an acid group decomposed by an acid Polymer of a structural unit of a group which protects a group, and a polymer which comprises (a2) structural unit which has a bridge|crosslinking group The hardening composition of this invention can further contain the polymer other than these. The curable composition of the present invention preferably contains a component satisfying the above (1) from the viewpoints of transparency (haze) after curing and residual film ratio of the unexposed portion. Further, in the present invention, a polymer satisfying the component (1) or a structural unit containing (a2) a crosslinkable group in the above (2) is regarded as the component B.

本發明中的“酸基由酸分解性基保護的基團”可使用作為酸基及酸分解性基而眾所周知的基團,並無特別限定。具體的酸基可優選地舉出羧基、及酚性羥基。另外,酸分解性基可使用比較容易因酸而分解的基團(例如後述的式a1-10等所表示的基團的酯結構、四氫吡喃酯基、或四氫呋喃酯基等縮醛系官能基)或比較難以因酸而分解的基團(例如叔丁酯基等三級烷基、碳酸叔丁酯基等碳酸三級烷基酯基)。In the present invention, the "group in which the acid group is protected by the acid-decomposable group" can be used as the acid group and the acid-decomposable group, and is not particularly limited. Specific acid groups are preferably exemplified by a carboxyl group and a phenolic hydroxyl group. Further, as the acid-decomposable group, a group which is relatively easily decomposed by an acid (for example, an ester structure of a group represented by the formula a1-10 or the like described later, a tetrahydropyranyl ester group, or an acetal system such as a tetrahydrofuran ester group) can be used. A functional group) or a group which is relatively difficult to be decomposed by an acid (for example, a tertiary alkyl group such as a tertiary alkyl group such as a tert-butyl ester group or a tertiary alkyl carbonate group such as a tert-butyl carbonate group).

酸基由酸分解性基保護的基團中,從硬化性組合物的基本物性,特別是感度或圖案形狀、接觸孔的形成性、硬化性組合物的保存穩定性的觀點來看,優選的是羧基為由縮醛的形式保護的保護羧基。進而,酸基由酸分解性基保護的基團中,從感度的觀點來看,更優選的是羧基為由下述式a1-10所表示的縮醛的形式保護的保護羧基。此外,在羧基為由下述式a1-10所表示的縮醛的形式保護的保護羧基的情況下,保護羧基的整體變成-(C=O)-O-CR101 R102 (OR103 )的結構。Among the groups in which the acid group is protected by the acid-decomposable group, it is preferable from the viewpoint of the basic physical properties of the curable composition, particularly the sensitivity or pattern shape, the formation of contact pores, and the storage stability of the curable composition. It is a carboxyl group which is a protected carboxyl group protected by the form of an acetal. Further, in the group in which the acid group is protected by the acid-decomposable group, it is more preferable that the carboxyl group is a protected carboxyl group protected by the form of the acetal represented by the following formula a1-10 from the viewpoint of sensitivity. Further, in the case where the carboxyl group is a protected carboxyl group protected by the form of an acetal represented by the following formula a1-10, the entire protected carboxyl group becomes -(C=O)-O-CR 101 R 102 (OR 103 ) structure.

[化26](式a1-10中,R101 及R102 分別獨立地表示氫原子或烷基,其中,排除R101 與R102 均為氫原子的情況。R103 表示烷基。R101 或R102 與R103 可連結而形成環狀醚)[Chem. 26] (In the formula a1-10, R 101 and R 102 each independently represent a hydrogen atom or an alkyl group, wherein R 101 and R 102 are each a hydrogen atom. R 103 represents an alkyl group. R 101 or R 102 and R 103 can be linked to form a cyclic ether)

所述式a1-10中,R101 ~R103 分別獨立地表示氫原子或烷基,所述烷基可為直鏈狀、支鏈狀、環狀的任一種。這裡,不存在R101 及R102 兩者表示氫原子的情況,R101 及R102 的至少一個表示烷基。 所述直鏈狀或支鏈狀的烷基優選碳數1~12,更優選碳數1~6,進而優選碳數1~4。具體可舉出:甲基、乙基、正丙基、異丙基、正丁基、異丁基、仲丁基、叔丁基、正戊基、新戊基、正己基、2,3-二甲基-2-丁基(thexyl)、正庚基、正辛基、2-乙基己基、正壬基、正癸基等。In the formula a1-10, R 101 to R 103 each independently represent a hydrogen atom or an alkyl group, and the alkyl group may be any of a linear chain, a branched chain, and a cyclic group. Here, there is no case where both R 101 and R 102 represent a hydrogen atom, and at least one of R 101 and R 102 represents an alkyl group. The linear or branched alkyl group preferably has 1 to 12 carbon atoms, more preferably 1 to 6 carbon atoms, still more preferably 1 to 4 carbon atoms. Specific examples thereof include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, neopentyl, n-hexyl, 2,3- Dimethyl-2-butyl (thexyl), n-heptyl, n-octyl, 2-ethylhexyl, n-decyl, n-decyl, and the like.

所述環狀烷基優選碳數3~12,更優選碳數4~8,進而優選碳數4~6。所述環狀烷基例如可舉出:環丙基、環丁基、環戊基、環己基、環庚基、環辛基、降冰片基、異冰片基等。The cyclic alkyl group preferably has 3 to 12 carbon atoms, more preferably 4 to 8 carbon atoms, still more preferably 4 to 6 carbon atoms. Examples of the cyclic alkyl group include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a norbornyl group, an isobornyl group and the like.

所述烷基也可具有取代基,取代基可例示:鹵素原子、芳基、烷氧基。在具有鹵素原子作為取代基的情況下,R101 、R102 、R103 成為鹵代烷基,在具有芳基作為取代基的情況下,R101 、R102 、R103 成為芳烷基。 所述鹵素原子可例示:氟原子、氯原子、溴原子、碘原子,這些中,優選氟原子或氯原子。 另外,所述芳基優選碳數6~20的芳基,更優選碳數6~12,具體可例示:苯基、α-甲基苯基、萘基等,作為由芳基取代的烷基整體、即芳烷基,可例示苄基、α-甲基苄基、苯乙基、萘基甲基等。 所述烷氧基優選碳數1~6的烷氧基,更優選碳數1~4,進而優選甲氧基或乙氧基。 另外,在所述烷基為環烷基的情況下,所述環烷基可具有碳數1~10的直鏈狀或支鏈狀的烷基作為取代基,在烷基為直鏈狀或支鏈狀的烷基的情況下,可具有碳數3~12的環烷基作為取代基。 這些取代基也可由所述取代基進一步取代。The alkyl group may have a substituent, and the substituent may, for example, be a halogen atom, an aryl group or an alkoxy group. When a halogen atom is used as a substituent, R 101 , R 102 and R 103 are a halogenated alkyl group, and when an aryl group is used as a substituent, R 101 , R 102 and R 103 are an aralkyl group. The halogen atom may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and among these, a fluorine atom or a chlorine atom is preferred. Further, the aryl group is preferably an aryl group having 6 to 20 carbon atoms, more preferably a carbon number of 6 to 12, and specific examples thereof include a phenyl group, an α-methylphenyl group, a naphthyl group and the like, and an alkyl group substituted with an aryl group. The mono-, i.e., aralkyl group, may, for example, be a benzyl group, an α-methylbenzyl group, a phenethyl group or a naphthylmethyl group. The alkoxy group is preferably an alkoxy group having 1 to 6 carbon atoms, more preferably 1 to 4 carbon atoms, still more preferably a methoxy group or an ethoxy group. Further, when the alkyl group is a cycloalkyl group, the cycloalkyl group may have a linear or branched alkyl group having 1 to 10 carbon atoms as a substituent, and the alkyl group may be linear or In the case of a branched alkyl group, a cycloalkyl group having 3 to 12 carbon atoms may be used as a substituent. These substituents may also be further substituted by the substituents.

所述式a1-10中,在R101 、R102 及R103 表示芳基的情況下,所述芳基優選碳數6~12,更優選碳數6~10。所述芳基可具有取代基,所述取代基可優選地例示碳數1~6的烷基。芳基例如可例示:苯基、甲苯基、二甲苯基、枯烯基、1-萘基等。 另外,R101 、R102 及R103 可相互鍵結,並與這些所鍵結的碳原子一同形成環。R101 與R102 、R101 與R103 、或R102 與R103 鍵結時的環結構例如可舉出:環丁基、環戊基、環己基、環庚基、四氫呋喃基、金剛烷基及四氫吡喃基等。In the formula a1-10, when R 101 , R 102 and R 103 represent an aryl group, the aryl group preferably has 6 to 12 carbon atoms, more preferably 6 to 10 carbon atoms. The aryl group may have a substituent, and the substituent may preferably be an alkyl group having 1 to 6 carbon atoms. Examples of the aryl group include a phenyl group, a tolyl group, a xylyl group, a cumenyl group, a 1-naphthyl group and the like. Further, R 101 , R 102 and R 103 may be bonded to each other and form a ring together with these bonded carbon atoms. Examples of the ring structure when R 101 and R 102 , R 101 and R 103 or R 102 and R 103 are bonded include a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a tetrahydrofuranyl group, and an adamantyl group. And tetrahydropyranyl and the like.

此外,所述式a1-10中,優選的是R101 及R102 的任一個為氫原子或甲基。關於其他具體的包含具有酸基由酸分解性基保護的基團的結構單元的聚合物,還可優選地使用日本專利特開2014-238438號公報段落0037~段落0101中記載的包含具有酸基由酸分解性基保護的基團的結構單元的聚合物。Further, in the formula a1-10, it is preferred that any of R 101 and R 102 is a hydrogen atom or a methyl group. With respect to other specific polymers including a structural unit having a group in which an acid group is protected by an acid-decomposable group, it is also preferred to use an acid group as described in paragraphs 0037 to 0101 of JP-A-2014-238438. A polymer of structural units of a group protected by an acid-decomposable group.

<光酸產生劑> 本發明的硬化性組合物可含有光酸產生劑。在本發明的硬化性組合物為正型感光性組合物的情況下,優選含有光酸產生劑。 本發明中所使用的光酸產生劑優選的是感應波長300 nm以上、優選的是波長300 nm~450 nm的光化射線而產生酸的化合物,但不受其化學結構限制。另外,關於不直接感應波長300 nm以上的光化射線的光酸產生劑,若為通過與增感劑並用來感應波長300 nm以上的光化射線而產生酸的化合物,則也可與增感劑組合後優選地使用。作為本發明中所使用的光酸產生劑,優選的是產生pKa為4以下的酸的光酸產生劑,更優選的是產生pKa為3以下的酸的光酸產生劑,最優選的是產生pKa為2以下的酸的光酸產生劑。<Photoacid generator> The curable composition of the present invention may contain a photoacid generator. When the curable composition of the present invention is a positive photosensitive composition, it is preferred to contain a photoacid generator. The photoacid generator used in the present invention is preferably a compound which induces an acid by irradiation of an actinic ray having a wavelength of 300 nm or more, preferably 300 nm to 450 nm, but is not limited by its chemical structure. In addition, a photoacid generator that does not directly induce actinic rays having a wavelength of 300 nm or more can be sensitized if it is a compound that generates an acid by using an actinic ray with a sensitizer and a wavelength of 300 nm or more. The agents are preferably used after combination. The photoacid generator used in the present invention is preferably a photoacid generator which produces an acid having a pKa of 4 or less, more preferably a photoacid generator which produces an acid having a pKa of 3 or less, and most preferably is produced. A photoacid generator of an acid having a pKa of 2 or less.

光酸產生劑的例子可舉出:三氯甲基-均三嗪類、鋶鹽或錪鹽、四級銨鹽類、重氮甲烷化合物、醯亞胺磺酸酯化合物、及肟磺酸酯化合物等。這些中,從感度的觀點來看,優選的是使用醯亞胺磺酸酯化合物或肟磺酸酯化合物。這些光酸產生劑可單獨使用一種或將兩種以上組合使用。三氯甲基-均三嗪類、二芳基錪鹽類、三芳基鋶鹽類(例如下述化合物)、四級銨鹽類、及重氮甲烷衍生物的具體例可例示:日本專利特開2011-221494號公報的段落0083~段落0088中記載的化合物、或日本專利特開2011-105645號公報的段落0013~段落0049中記載的化合物,將所述內容併入至本申請說明書中。醯亞胺磺酸酯化合物的具體例可例示國際公開第2011/087011號的段落0065~段落0075中記載的化合物,將所述內容併入至本申請說明書中。 肟磺酸酯化合物的具體例可例示:日本專利特開2014-122972號公報的段落0074~段落0102、日本專利特開2014-238438號公報的段落0103~段落0133中記載的化合物,將所述內容併入至本申請說明書中。Examples of the photoacid generator include trichloromethyl-s-triazine, sulfonium or phosphonium salt, quaternary ammonium salt, diazomethane compound, sulfhydryl sulfonate compound, and sulfonate. Compounds, etc. Among these, from the viewpoint of sensitivity, it is preferred to use a ruthenium sulfonate compound or an oxime sulfonate compound. These photoacid generators may be used alone or in combination of two or more. Specific examples of trichloromethyl-s-triazines, diarylsulfonium salts, triarylsulfonium salts (for example, the following compounds), quaternary ammonium salts, and diazomethane derivatives can be exemplified: Japanese Patent The compound described in paragraphs 0083 to 0888 of JP-A-2011-221494, or the compound described in paragraphs 0013 to 0049 of JP-A-2011-105645, the contents of which are incorporated herein by reference. Specific examples of the sulfhydryl sulfonate compound can be exemplified by the compounds described in paragraph 0063 to paragraph 0075 of International Publication No. 2011/087011, which is incorporated herein by reference. Specific examples of the oxime sulfonate compound include those described in paragraphs 0074 to 0 203 of JP-A-2014-122972, and paragraphs 0103 to 0133 of JP-A-2014-238438. The content is incorporated into the specification of the present application.

在本發明的硬化性組合物中,相對於硬化性組合物中的總固體成分100質量份,光酸產生劑的含量優選0.1質量份~20質量份,更優選0.5質量份~10質量份,進而優選0.5質量份~5質量份。光酸產生劑可僅使用一種,也可並用兩種以上。In the curable composition of the present invention, the content of the photoacid generator is preferably 0.1 parts by mass to 20 parts by mass, more preferably 0.5 parts by mass to 10 parts by mass, per 100 parts by mass of the total solid content in the curable composition. Further, it is preferably 0.5 parts by mass to 5 parts by mass. The photoacid generator may be used singly or in combination of two or more.

<硬化性組合物的製備方法> 本發明的硬化性組合物的製備方法並無特別限制,可利用眾所周知的方法來製備,例如能以既定的比例且利用任意的方法將各成分混合,攪拌溶解及/或分散而製備硬化性組合物。另外,例如也可將各成分製成分別預先溶解在溶劑中的溶液後,將這些溶液以既定的比例混合而製備硬化性組合物。像以上那樣所製備的硬化性組合物例如也可使用孔徑0.2 μm的過濾器等進行過濾後使用。<Method for Producing Curable Composition> The method for producing the curable composition of the present invention is not particularly limited, and it can be produced by a known method. For example, the components can be mixed at a predetermined ratio and by any method, and stirred and dissolved. And/or dispersed to prepare a curable composition. Further, for example, each component may be prepared as a solution each dissolved in a solvent in advance, and these solutions may be mixed at a predetermined ratio to prepare a curable composition. The curable composition prepared as described above can be used, for example, by filtration using a filter having a pore size of 0.2 μm or the like.

(硬化膜及其製造方法) 本發明的硬化物是使本發明的硬化性組合物硬化而成的硬化物。另外,本發明的硬化物優選的是硬化膜。本發明的硬化膜優選的是通過本發明的硬化膜的製造方法所得的硬化膜。 本發明的硬化膜的製造方法只要是使本發明的硬化性組合物硬化而製造硬化膜的方法,則並無特別限制,優選的是依次包括以下的工序a~工序d。 工序a:將本發明的硬化性組合物塗布在基板上的塗布工序 工序b:從所塗布的硬化性組合物中除去溶劑的溶劑除去工序 工序c:利用光化射線對除去了溶劑的硬化性組合物的至少一部分進行曝光的曝光工序 工序d:對硬化性組合物進行熱處理的熱處理工序 另外,本發明的硬化膜的製造方法優選的是依次包括以下的工序1~工序5。 工序1:將本發明的硬化性組合物塗布在基板上的塗布工序 工序2:從所塗布的硬化性組合物中除去溶劑的溶劑除去工序 工序3:利用光化射線對除去了溶劑的硬化性組合物的至少一部分進行曝光的曝光工序 工序4:利用水性顯影液對經曝光的硬化性組合物進行顯影的顯影工序 工序5:對經顯影的硬化性組合物進行熱處理的熱處理工序(Cured film and method for producing the same) The cured product of the present invention is a cured product obtained by curing the curable composition of the present invention. Further, the cured product of the present invention is preferably a cured film. The cured film of the present invention is preferably a cured film obtained by the method for producing a cured film of the present invention. The method for producing a cured film of the present invention is not particularly limited as long as it is a method for producing a cured film by curing the curable composition of the present invention, and it is preferable to include the following steps a to d in order. Step a: Coating step b of applying the curable composition of the present invention on a substrate: solvent removal step for removing a solvent from the applied curable composition Step c: Curing property of the solvent removed by actinic radiation Exposure step d at least a part of the composition is exposed. Heat treatment step of heat-treating the curable composition. The method for producing a cured film of the present invention preferably includes the following steps 1 to 5 in this order. Step 1: Coating step of applying the curable composition of the present invention on a substrate Step 2: Solvent removal step for removing a solvent from the applied curable composition Step 3: Curing property of the solvent removed by actinic radiation Exposure step of exposing at least a part of the composition Step 4: Developing step of developing the exposed curable composition by an aqueous developing solution Step 5: Heat treatment step of heat-treating the developed curable composition

在包括工序a~工序d的硬化膜的製造方法中,顯影工序成為任意工序,可例示例如將折射率調整層設於基材上的一面的情況等無需圖案形成的情況。In the method of producing a cured film including the step a to the step d, the development step is an arbitrary step, and a case where the refractive index adjusting layer is provided on one surface of the substrate or the like is not required, and the pattern formation is not required.

所述塗布工序中,優選的是將本發明的硬化性組合物塗布在基板上而製成含有溶劑的濕潤膜。可在將硬化性組合物塗布到基板上前,進行堿清洗或等離子體清洗等基板的清洗。進而,可在基板清洗後利用六甲基二矽氮烷等對基板表面進行處理。通過進行所述處理,有硬化性組合物對基板的密接性提高的傾向。 所述基板可舉出無機基板、樹脂、樹脂複合材料等。 無機基板例如可舉出:玻璃、石英、矽、氮化矽及在這種基板上蒸鍍有鉬、鈦、鋁、銅等的複合基板。 關於樹脂,可舉出包含以下的合成樹脂:聚對苯二甲酸丁二酯、聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯、聚萘二甲酸丁二酯、聚苯乙烯、聚碳酸酯、聚碸、聚醚碸、聚芳酯、烯丙基二甘醇碳酸酯樹脂、聚醯胺、聚醯亞胺、聚醯胺醯亞胺、聚醚醯亞胺、聚吲哚、聚苯硫醚、聚環烯烴、降冰片烯樹脂、聚氯三氟乙烯等氟樹脂、液晶聚合物、丙烯酸系樹脂、環氧樹脂、矽酮樹脂、離子聚合物樹脂、氰酸酯樹脂、交聯富馬酸二酯、環狀聚烯烴、芳香族醚樹脂、馬來醯亞胺-烯烴共聚物、纖維素、環硫樹脂等。這些基板很少以所述形態直接使用,通常根據最終產品的形態而形成有例如薄膜晶體管(Thin Film Transistor,TFT)元件那樣的多層積層結構。In the coating step, it is preferred that the curable composition of the present invention is applied onto a substrate to form a wet film containing a solvent. The substrate may be cleaned such as a ruthenium cleaning or a plasma cleaning before the curable composition is applied onto the substrate. Further, the surface of the substrate can be treated with hexamethyldiazane or the like after the substrate is cleaned. By performing the above treatment, the adhesion of the curable composition to the substrate tends to be improved. The substrate may, for example, be an inorganic substrate, a resin, a resin composite material or the like. Examples of the inorganic substrate include glass, quartz, tantalum, tantalum nitride, and a composite substrate on which molybdenum, titanium, aluminum, copper, or the like is vapor-deposited. The resin includes the following synthetic resins: polybutylene terephthalate, polyethylene terephthalate, polyethylene naphthalate, polybutylene naphthalate, polystyrene, Polycarbonate, polyfluorene, polyether oxime, polyarylate, allyl diglycol carbonate resin, polyamine, polyimine, polyamidimide, polyether quinone, polyfluorene , polyphenylene sulfide, polycycloolefin, norbornene resin, fluororesin such as polychlorotrifluoroethylene, liquid crystal polymer, acrylic resin, epoxy resin, fluorenone resin, ionic polymer resin, cyanate resin, Cross-linked fumaric acid diester, cyclic polyolefin, aromatic ether resin, maleic imine-olefin copolymer, cellulose, episulfide resin, and the like. These substrates are rarely used as they are in the above-described form, and a multilayer laminated structure such as a thin film transistor (TFT) element is usually formed depending on the form of the final product.

本發明的硬化性組合物對通過濺鍍而制膜的金屬膜或金屬氧化物的密接良好,因此基板優選的是含有通過濺鍍而制膜的金屬膜。金屬優選鈦、銅、鋁、銦、錫、錳、鎳、鈷、鉬、鎢、鉻、銀、釹及這些金屬的氧化物或合金,更優選鉬、鈦、鋁、銅及這些金屬的合金。此外,金屬或金屬氧化物可單獨使用一種,也可並用多種。Since the curable composition of the present invention has good adhesion to a metal film or a metal oxide formed by sputtering, the substrate preferably contains a metal film formed by sputtering. The metal is preferably titanium, copper, aluminum, indium, tin, manganese, nickel, cobalt, molybdenum, tungsten, chromium, silver, lanthanum and oxides or alloys of these metals, more preferably molybdenum, titanium, aluminum, copper and alloys of these metals. . Further, the metal or the metal oxide may be used singly or in combination of two or more.

對基板的塗布方法並無特別限定,例如可使用狹縫塗布法、噴霧法、輥塗法、旋轉塗布法、流延塗布法、狹縫及旋轉法、印刷法(噴墨、柔版、凹版、網版等)等方法。印刷法可集中在必要的部位來設置組合物,可實現組合物的省液化,因此優選。 這些中,本發明的硬化性組合物適合用於印刷法,特別適合於柔版印刷法及噴墨印刷法。 塗布時的濕潤膜厚並無特別限定,能以與用途相對應的膜厚來塗布,優選0.05 μm~10 μm的範圍。 進而,也可在將本發明的硬化性組合物塗布在基板上之前,應用日本專利特開2009-145395號公報中記載那樣的所謂預濕法。The method of applying the substrate is not particularly limited, and for example, a slit coating method, a spray method, a roll coating method, a spin coating method, a cast coating method, a slit and a spin method, and a printing method (inkjet, flexo, gravure) can be used. , screen, etc.). The printing method is preferable because it concentrates on a necessary portion to provide a composition, and it is possible to achieve a liquid-saving composition. Among these, the curable composition of the present invention is suitable for use in a printing method, and is particularly suitable for a flexographic printing method and an inkjet printing method. The wet film thickness at the time of application is not particularly limited, and it can be applied in a film thickness corresponding to the application, and is preferably in the range of 0.05 μm to 10 μm. Further, a so-called pre-wet method as described in JP-A-2009-145395 may be applied before the curable composition of the present invention is applied onto a substrate.

所述溶劑除去工序中,通過減壓(真空)及/或加熱等從所塗布的所述膜中除去溶劑而在基板上形成乾燥塗膜。溶劑除去工序的加熱條件優選70℃~130℃且30秒鐘~300秒鐘左右。 此外,所述塗布工序與所述溶劑除去工序可依次進行,也可同時進行,也可交替反復進行。例如可在所述塗布工序中的噴墨塗布全部結束後,進行所述溶劑除去工序,也可預先加熱基板,一面進行所述塗布工序中的利用噴墨塗布方式的硬化性組合物的噴出一面進行溶劑除去。In the solvent removal step, a solvent is removed from the applied film by pressure reduction (vacuum) and/or heating to form a dried coating film on the substrate. The heating conditions in the solvent removal step are preferably from 70 ° C to 130 ° C and from about 30 seconds to 300 seconds. Further, the coating step and the solvent removal step may be sequentially performed, or may be carried out simultaneously or alternately. For example, after the inkjet coating in the coating step is completed, the solvent removal step may be performed, and the substrate may be heated in advance to perform the discharge of the curable composition by the inkjet coating method in the coating step. The solvent was removed.

在硬化性組合物為負型感光性組合物的情況下,所述曝光工序優選的是使用光化射線,由光聚合引發劑產生聚合引發種,而進行具有乙烯性不飽和基的化合物等聚合性化合物的聚合,使除去了溶劑的硬化性組合物的至少一部分硬化的工序。 另外,在硬化性組合物為正型感光性組合物的情況下,利用光化射線而自光酸產生劑產生酸,從而包含具有酸基由酸分解性基保護的基團的結構單元的聚合物的保護基分解,成為包含具有酸基的結構單元的聚合物,由此在水性顯影液中的溶解性提高。 所述曝光工序中可使用的曝光光源可使用低壓水銀燈、高壓水銀燈、超高壓水銀燈、化學燈、發光二極體(Light Emitting Diode,LED)光源、准分子激光產生裝置等,可優選地使用i射線(365 nm)、h射線(405 nm)、g射線(436 nm)等具有300 nm以上且450 nm以下的波長的光化射線。另外,視需要也可通過長波長截止濾波器、短波長截止濾波器、帶通濾波器那樣的分光濾波器來調整照射光。 曝光裝置可使用:鏡面投影對準曝光機、步進機、掃描儀、近接式曝光裝置、接觸式曝光裝置、微透鏡陣列、透鏡掃描儀、激光曝光等各種方式的曝光裝置。 另外,所述曝光工序中的曝光量也無特別限制,優選1 mJ/cm2 ~3,000 mJ/cm2 ,更優選1 mJ/cm2 ~500 mJ/cm2 。 從促進硬化的觀點來看,所述曝光工序中的曝光優選的是在經氧阻斷的狀態下進行。阻斷氧的方法可例示:在氮氣環境下進行曝光,或設置氧阻斷膜。 另外,所述曝光工序中的曝光只要是對除去了溶劑的硬化性組合物的至少一部分進行即可,例如可為全面曝光,也可為圖案曝光。 另外,在所述曝光工序後,可進行曝光後加熱處理:Post Exposure Bake(以下也稱為“PEB”)。進行PEB的情況下的溫度優選30℃以上且130℃以下,更優選40℃以上且120℃以下,特別優選50℃以上且110℃以下。 加熱的方法並無特別限定,可使用眾所周知的方法。例如可舉出熱板、烘箱、紅外線加熱器等。 另外,關於加熱時間,熱板的情況下優選1分鐘~30分鐘左右,除此以外的情況下優選20分鐘~120分鐘左右。所述範圍內,可在不對基板、裝置造成損傷的情況下進行加熱。In the case where the curable composition is a negative photosensitive composition, it is preferable to use an actinic ray to generate a polymerization initiating species from a photopolymerization initiator, and to carry out polymerization of a compound having an ethylenically unsaturated group. The polymerization of the compound to cure at least a part of the curable composition from which the solvent has been removed. Further, in the case where the curable composition is a positive photosensitive composition, an acid is generated from the photoacid generator by actinic rays, thereby polymerizing a structural unit containing a group having an acid group protected by an acid-decomposable group. The protective group of the substance is decomposed to become a polymer containing a structural unit having an acid group, whereby the solubility in the aqueous developing solution is improved. The exposure light source usable in the exposure process may be a low pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a chemical lamp, a light emitting diode (LED) light source, an excimer laser generating device, or the like, and may preferably be used. Actinic rays having a wavelength of 300 nm or more and 450 nm or less, such as rays (365 nm), h rays (405 nm), and g rays (436 nm). Further, the irradiation light may be adjusted by a long-wavelength cut filter, a short-wavelength cut filter, or a spectral filter such as a band pass filter as needed. The exposure apparatus can use various types of exposure apparatuses such as a mirror projection alignment machine, a stepper, a scanner, a proximity exposure apparatus, a contact exposure apparatus, a microlens array, a lens scanner, and a laser exposure. Further, the amount of exposure in the exposure step is not particularly limited, but is preferably 1 mJ/cm 2 to 3,000 mJ/cm 2 , and more preferably 1 mJ/cm 2 to 500 mJ/cm 2 . From the viewpoint of promoting hardening, the exposure in the exposure step is preferably carried out in a state of being blocked by oxygen. The method of blocking oxygen can be exemplified by exposure under a nitrogen atmosphere or by setting an oxygen blocking membrane. Further, the exposure in the exposure step may be performed on at least a part of the curable composition from which the solvent has been removed, and for example, it may be a full exposure or a pattern exposure. Further, after the exposure step, post-exposure heat treatment: Post Exposure Bake (hereinafter also referred to as "PEB") may be performed. The temperature in the case of performing PEB is preferably 30° C. or higher and 130° C. or lower, more preferably 40° C. or higher and 120° C. or lower, and particularly preferably 50° C. or higher and 110° C. or lower. The method of heating is not particularly limited, and a well-known method can be used. For example, a hot plate, an oven, an infrared heater, etc. are mentioned. Further, in the case of the heating time, the hot plate is preferably about 1 minute to 30 minutes, and in other cases, it is preferably about 20 minutes to 120 minutes. Within the above range, heating can be performed without causing damage to the substrate or the device.

本發明的硬化膜的製造方法優選的是還包括:利用顯影液對經曝光的硬化性組合物進行顯影的顯影工序。 顯影工序中,利用溶劑或鹼性顯影液對曝光成圖案狀的硬化性組合物進行顯影,形成圖案。顯影工序中使用的顯影液中,優選的是含有鹼性化合物。鹼性化合物例如可使用:氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物類;碳酸鈉、碳酸鉀等鹼金屬碳酸鹽類;重碳酸鈉、重碳酸鉀等鹼金屬重碳酸鹽類;氫氧化四甲基銨、氫氧化四乙基銨、氫氧化四丙基銨、氫氧化四丁基銨、氫氧化苄基三甲基銨、氫氧化膽鹼等氫氧化銨類;矽酸鈉、偏矽酸鈉等的水溶液。另外,也可將在所述堿類的水溶液中添加適當量的甲醇或乙醇等水溶性有機溶劑或表面活性劑而成的水溶液用作顯影液。 優選的顯影液可舉出氫氧化四甲基銨的0.4質量%~2.5質量%水溶液。 顯影液的pH值優選10.0~14.0。顯影時間優選30秒鐘~500秒鐘,另外,顯影的方法可為覆液法(水坑式顯影法)、噴淋法、浸漬法等的任一種。 顯影後,也可進行淋洗工序。淋洗工序中,利用純水等對顯影後的基板進行清洗,進行附著的顯影液除去、顯影殘渣除去。淋洗方法可使用眾所周知的方法。例如可舉出噴淋淋洗或浸漬淋洗等。 關於圖案曝光及顯影,可使用眾所周知的方法或眾所周知的顯影液。例如可合適地使用日本專利特開2011-186398號公報、日本專利特開2013-83937號公報中記載的圖案曝光方法及顯影方法。The method for producing a cured film of the present invention preferably further comprises a developing step of developing the exposed curable composition with a developing solution. In the developing step, the curable composition exposed to the pattern is developed with a solvent or an alkali developing solution to form a pattern. It is preferable that the developing solution used in the developing step contains a basic compound. As the basic compound, for example, an alkali metal hydroxide such as lithium hydroxide, sodium hydroxide or potassium hydroxide; an alkali metal carbonate such as sodium carbonate or potassium carbonate; or an alkali metal bicarbonate such as sodium bicarbonate or potassium bicarbonate; a salt; tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, choline hydroxide, etc.; An aqueous solution of sodium citrate or sodium metasilicate. Further, an aqueous solution obtained by adding an appropriate amount of a water-soluble organic solvent such as methanol or ethanol or a surfactant to the aqueous solution of the hydrazine may be used as the developing solution. A preferred developer is a 0.4% by mass to 2.5% by mass aqueous solution of tetramethylammonium hydroxide. The pH of the developer is preferably from 10.0 to 14.0. The development time is preferably from 30 seconds to 500 seconds, and the development method may be any one of a liquid coating method (a puddle development method), a shower method, and a dipping method. After the development, the rinsing process can also be performed. In the rinsing step, the developed substrate is washed with pure water or the like, and the adhered developing solution is removed and the developing residue is removed. A well-known method can be used for the rinsing method. For example, spray rinsing, immersion rinsing, etc. are mentioned. As the pattern exposure and development, a well-known method or a well-known developer can be used. For example, the pattern exposure method and the development method described in JP-A-2011-186398 and JP-A-2013-83937 can be suitably used.

本發明的硬化膜的製造方法優選的是在所述曝光工序後,包括對硬化性組合物進行熱處理的工序。通過在將本發明的硬化性組合物曝光後進行熱處理,可獲得強度更優異的硬化膜。 所述熱處理的溫度優選80℃~300℃,更優選100℃~280℃,特別優選120℃~250℃。若為所述實施方式,則推定在使用a1及/或a2作為成分A的情況下,適當發生成分A的縮合,硬化膜的物性更優異。 另外,所述熱處理的時間並無特別限制,優選1分鐘~360分鐘,更優選5分鐘~240分鐘,進而優選10分鐘~120分鐘。 另外,所述本發明的硬化膜的製造方法中的利用光及/或熱的硬化可連續進行,也可依次進行。 另外,進行熱處理時,也可通過在氮氣環境下進行而進一步提高透明性。 在熱處理工序(後烘烤)之前,也可在比較低溫下進行烘烤後進行熱處理工序(追加中烘烤工序)。進行中烘烤時,優選的是在90℃~150℃下加熱1分鐘~60分鐘後,在200℃以上的高溫下進行後烘烤。另外,也可將中烘烤、後烘烤分成三階段以上的多階段來進行加熱。通過設法進行這種中烘烤、後烘烤,可調整圖案的錐角。這些加熱可使用熱板、烘箱、紅外線加熱器等眾所周知的加熱方法。 此外,也可在後烘烤之前,在利用光化射線對形成有圖案的基板進行全面再曝光(後曝光)後進行後烘烤,由此推測因熱分解而由成分A彼此的縮合反應、及/或殘存於曝光部分的光聚合引發劑產生引發種,而作為促進交聯工序的催化劑發揮功能,從而可促進膜硬化。包含後曝光工序的情況下的優選曝光量優選100 mJ/cm2 ~3,000 mJ/cm2 ,特別優選100 mJ/cm2 ~500 mJ/cm2The method for producing a cured film of the present invention preferably includes a step of heat-treating the curable composition after the exposure step. By performing heat treatment after exposing the curable composition of the present invention, a cured film having more excellent strength can be obtained. The temperature of the heat treatment is preferably from 80 ° C to 300 ° C, more preferably from 100 ° C to 280 ° C, particularly preferably from 120 ° C to 250 ° C. In the case of the above-described embodiment, it is estimated that when a1 and/or a2 are used as the component A, the condensation of the component A is appropriately caused, and the physical properties of the cured film are more excellent. Further, the time of the heat treatment is not particularly limited, but is preferably from 1 minute to 360 minutes, more preferably from 5 minutes to 240 minutes, still more preferably from 10 minutes to 120 minutes. Further, the curing by light and/or heat in the method for producing a cured film of the present invention may be carried out continuously or sequentially. Further, when the heat treatment is performed, the transparency can be further improved by performing in a nitrogen atmosphere. Before the heat treatment step (post-baking), the heat treatment step (additional baking step) may be performed after baking at a relatively low temperature. In the case of the baking in progress, it is preferred to carry out post-baking at a high temperature of 200 ° C or higher after heating at 90 ° C to 150 ° C for 1 minute to 60 minutes. In addition, the middle baking and the post baking may be divided into three stages or more in multiple stages for heating. By attempting to perform such a middle baking and post baking, the taper angle of the pattern can be adjusted. These heating can be carried out using a well-known heating method such as a hot plate, an oven, or an infrared heater. Further, before the post-baking, the substrate on which the pattern is formed may be subjected to post-baking by full re-exposure (post-exposure) using actinic rays, thereby presuming condensation reaction of the components A by thermal decomposition. The photopolymerization initiator remaining in the exposed portion generates an initiating species and functions as a catalyst for promoting the crosslinking step, thereby promoting film hardening. The preferable exposure amount in the case of including the post-exposure step is preferably 100 mJ/cm 2 to 3,000 mJ/cm 2 , and particularly preferably 100 mJ/cm 2 to 500 mJ/cm 2 .

(硬化膜) 本發明的硬化膜或硬化物(以下有時稱為硬化膜等)是使本發明的硬化性組合物硬化而獲得。 本發明的硬化膜等可為如上所述經顯影的硬化膜等,也可為未顯影的硬化膜等,優選的是可進一步發揮本發明的效果的經顯影的硬化膜等。 本發明的硬化膜等的折射率高、具有高透明性,因此可合適地用作微透鏡、光波導、抗反射膜、太陽電池或有機EL發光元件的光取入/取出效率改善層、LED用密封材料及LED用芯片塗材等光學構件、有機EL顯示裝置或液晶顯示裝置等顯示裝置中使用的保護膜或絕緣膜、觸摸屏中使用的配線電極的保護膜。 另外,本發明的硬化膜也可合適地用於液晶顯示裝置或有機EL顯示裝置等中的彩色濾光片的保護膜、液晶顯示裝置中的用來將液晶層保持於一定厚度的間隔件、微機電系統(Micro Electro Mechanical Systems,MEMS)用器件的結構構件等。(Cured film) The cured film or cured product of the present invention (hereinafter sometimes referred to as a cured film or the like) is obtained by curing the curable composition of the present invention. The cured film or the like of the present invention may be a cured film or the like which is developed as described above, or may be an undeveloped cured film or the like, and is preferably a developed cured film or the like which can further exhibit the effects of the present invention. Since the cured film of the present invention has a high refractive index and high transparency, it can be suitably used as a light extraction/extraction efficiency improving layer of a microlens, an optical waveguide, an antireflection film, a solar cell or an organic EL light-emitting element, and an LED. An optical member such as a sealing material or a chip coating material for LED, a protective film or an insulating film used in a display device such as an organic EL display device or a liquid crystal display device, or a protective film for a wiring electrode used in a touch panel. Further, the cured film of the present invention can also be suitably used for a protective film of a color filter in a liquid crystal display device or an organic EL display device, or a spacer for holding a liquid crystal layer at a certain thickness in a liquid crystal display device, Structural members of devices for Micro Electro Mechanical Systems (MEMS), etc.

另外,本發明的硬化膜等可用於觸摸屏中使用的配線電極等的可見度降低層。此外,所謂觸摸屏中使用的配線電極的可見度降低層,是指降低觸摸屏中使用的配線電極等的可見度、即、使配線電極等不易被看到的層,例如可舉出觸控檢測電極(例如氧化銦錫(ITO)制)間的層間絕緣膜、電極的保護膜(外塗膜)等。另外,也適於指數匹配層(有時也稱為IM(Index Matching)層或折射率調整層)。所謂指數匹配層,是指調整顯示裝置的光的反射率或透射率的層。關於指數匹配層,在日本專利特開2012-146217號公報中有詳細描述,將所述內容併入至本說明書中。通過將本發明的硬化膜用於可見度降低層,可製成可見度優異的觸摸屏。 其中,本發明的硬化膜作為顯示裝置等中的層間絕緣膜或外塗膜合適。 在用於觸控檢測電極間的層間絕緣膜或保護膜的情況下,從可見度改良的觀點來看,硬化膜的折射率優選的是接近電極的折射率,具體來說,優選的是波長550 nm下的折射率為1.60~1.90,更優選1.62~1.85。Further, the cured film of the present invention or the like can be used for a visibility reducing layer such as a wiring electrode used in a touch panel. In addition, the visibility reduction layer of the wiring electrode used in the touch panel refers to a layer that reduces visibility of a wiring electrode or the like used in the touch panel, that is, a wiring electrode or the like is not easily seen, and for example, a touch detection electrode (for example, An interlayer insulating film between indium tin oxide (ITO), a protective film for an electrode (overcoat film), and the like. In addition, it is also suitable for an index matching layer (sometimes referred to as an IM (Index Matching) layer or a refractive index adjusting layer). The index matching layer refers to a layer that adjusts the reflectance or transmittance of light of the display device. The content of the index matching layer is described in detail in Japanese Patent Laid-Open No. 2012-146217, the entire contents of which are incorporated herein. By using the cured film of the present invention for the visibility reducing layer, a touch panel excellent in visibility can be produced. Among them, the cured film of the present invention is suitable as an interlayer insulating film or an overcoat film in a display device or the like. In the case of an interlayer insulating film or a protective film for use between the touch detecting electrodes, the refractive index of the cured film is preferably close to the refractive index of the electrode from the viewpoint of visibility improvement, and specifically, the wavelength is preferably 550. The refractive index at nm is from 1.60 to 1.90, more preferably from 1.62 to 1.85.

(液晶顯示裝置) 本發明的液晶顯示裝置的特徵在於具有本發明的硬化膜。 本發明的液晶顯示裝置除了具有使用本發明的硬化性組合物所形成的平坦化膜或層間絕緣膜以外,並無特別限制,可舉出採用各種結構的眾所周知的液晶顯示裝置。 例如本發明的液晶顯示裝置所具備的薄膜晶體管(Thin-Film Transistor,TFT)的具體例可舉出:非晶矽-TFT、低溫多晶矽-TFT、氧化物半導體TFT(例如銦鎵鋅氧化物,所謂IGZO)等。本發明的硬化膜由於電特性優異,因此可組合到這些TFT中而優選地使用。 另外,本發明的液晶顯示裝置可取的液晶驅動方式可舉出:扭轉向列(Twisted Nematic,TN)方式、垂直取向(Vertical Alignment,VA)方式、面內切換(In-Plane-Switching,IPS)方式、邊緣場切換(Fringe Field Switching,FFS)方式、光學補償彎曲(Optically Compensated Bend,OCB)方式等。 在面板構成中,彩色濾光片陣列(Color Filter on Array,COA)方式的液晶顯示裝置中也可使用本發明的硬化膜,例如可用作日本專利特開2005-284291號公報的有機絕緣膜(115)或日本專利特開2005-346054號公報的有機絕緣膜(212)。另外,本發明的液晶顯示裝置可取的液晶取向膜的具體取向方式可舉出摩擦取向法、光取向法等。另外,也可通過日本專利特開2003-149647號公報或日本專利特開2011-257734號公報中記載的聚合物支持取向(Polymer Sustained Alignment,PSA)技術來進行聚合物取向支持。 另外,本發明的硬化性組合物及本發明的硬化膜不限定於所述用途,可用於各種用途。例如除了平坦化膜或層間絕緣膜以外,也可合適地用作彩色濾光片的保護膜、或液晶顯示裝置中的用來將液晶層保持於一定厚度的間隔件、或固體攝像元件中設置在彩色濾光片上的微透鏡等。(Liquid Crystal Display Device) The liquid crystal display device of the present invention is characterized by having the cured film of the present invention. The liquid crystal display device of the present invention is not particularly limited as long as it has a planarizing film or an interlayer insulating film formed using the curable composition of the present invention, and a known liquid crystal display device having various structures can be cited. Specific examples of the thin film transistor (TFT) included in the liquid crystal display device of the present invention include amorphous germanium-TFT, low-temperature polysilicon-TFT, and oxide semiconductor TFT (for example, indium gallium zinc oxide, So-called IGZO). Since the cured film of the present invention is excellent in electrical characteristics, it can be used in combination with these TFTs. Further, the liquid crystal driving method which can be obtained by the liquid crystal display device of the present invention includes a twisted nematic (TN) method, a vertical alignment (VA) method, and an in-plane switching (In-Plane-Switching, IPS). Mode, Fringe Field Switching (FFS) mode, Optically Compensated Bend (OCB) mode, etc. In the panel configuration, the cured film of the present invention can also be used in a liquid crystal display device of a color filter on Array (COA) type, for example, as an organic insulating film of JP-A-2005-284291. (115) or an organic insulating film (212) of JP-A-2005-346054. In addition, a specific orientation of the liquid crystal aligning film which can be obtained by the liquid crystal display device of the present invention is a rubbing alignment method, a photo-alignment method, or the like. In addition, the polymer orientation support can also be carried out by the Polymer Sustained Alignment (PSA) technique described in JP-A-2003-149647 or JP-A-2011-257734. Further, the curable composition of the present invention and the cured film of the present invention are not limited to the above applications, and can be used in various applications. For example, in addition to the planarization film or the interlayer insulating film, it can be suitably used as a protective film for a color filter, or a spacer for holding a liquid crystal layer at a certain thickness in a liquid crystal display device, or a solid-state image sensor. Microlenses and the like on a color filter.

圖1為表示有源矩陣方式的液晶顯示裝置10的一例的概念性剖面圖。所述彩色液晶顯示裝置10為在背面上具有背光單元12的液晶面板,且液晶面板中配置有TFT 16的元件,所述TFT 16的元件與在貼附有偏光膜的2片玻璃基板14、玻璃基板15之間配置的所有畫素相對應。對於形成在玻璃基板上的各元件,通過形成在硬化膜17中的接觸孔18而進行形成畫素電極的ITO透明電極19的配線。在ITO透明電極19上,設有液晶20的層及配置有黑色矩陣的紅綠藍(Red Green Blue,RGB)彩色濾光片22。 背光的光源並無特別限定,可使用眾所周知的光源。例如可舉出:白色LED、藍色·紅色·綠色等的多色LED、熒光燈(冷陰極管)、有機EL等。 另外,液晶顯示裝置可製成三維(Three dimension,3D)(立體視)型,也可製成觸摸屏型。進而也可製成柔性型,可用作日本專利特開2011-145686號公報中記載的第2層間絕緣膜(48)、或日本專利特開2009-258758號公報中記載的層間絕緣膜(520)。FIG. 1 is a conceptual cross-sectional view showing an example of an active matrix type liquid crystal display device 10. The color liquid crystal display device 10 is a liquid crystal panel having a backlight unit 12 on the back surface, and an element of the TFT 16 is disposed in the liquid crystal panel, and the elements of the TFT 16 and the two glass substrates 14 to which the polarizing film is attached are All the pixels arranged between the glass substrates 15 correspond. The wiring of the ITO transparent electrode 19 forming the pixel electrode is formed by the contact holes 18 formed in the cured film 17 for each element formed on the glass substrate. On the ITO transparent electrode 19, a layer of the liquid crystal 20 and a red green blue (RGB) color filter 22 in which a black matrix is disposed are provided. The light source of the backlight is not particularly limited, and a well-known light source can be used. For example, a white LED, a multicolor LED such as blue, red, and green, a fluorescent lamp (cold cathode tube), an organic EL, or the like can be given. In addition, the liquid crystal display device can be made into a three-dimensional (3D) (stereoscopic) type, or can be made into a touch screen type. Further, it can be made into a flexible type, and it can be used as the second interlayer insulating film (48) described in Japanese Laid-Open Patent Publication No. 2011-145686, or the interlayer insulating film (520) disclosed in Japanese Laid-Open Patent Publication No. 2009-258758. ).

(有機EL顯示裝置) 本發明的有機EL顯示裝置的特徵在於具有本發明的硬化膜。 本發明的有機EL顯示裝置除了具有使用本發明的硬化性組合物所形成的平坦化膜或層間絕緣膜以外,並無特別限制,可舉出採取各種結構的眾所周知的各種有機EL顯示裝置或液晶顯示裝置。 例如本發明的有機EL顯示裝置所具備的薄膜晶體管(Thin-Film Transistor,TFT)的具體例可舉出非晶矽-TFT、低溫多晶矽-TFT、氧化物半導體TFT等。本發明的硬化膜由於電特性優異,因此可組合到這些TFT中而優選地使用。(Organic EL display device) The organic EL display device of the present invention is characterized by having the cured film of the present invention. The organic EL display device of the present invention is not particularly limited as long as it has a planarizing film or an interlayer insulating film formed using the curable composition of the present invention, and various well-known organic EL display devices or liquid crystals having various configurations are exemplified. Display device. Specific examples of the thin film transistor (TFT) included in the organic EL display device of the present invention include an amorphous germanium-TFT, a low-temperature polysilicon-TFT, an oxide semiconductor TFT, and the like. Since the cured film of the present invention is excellent in electrical characteristics, it can be used in combination with these TFTs.

圖2為有機EL顯示裝置的一例的構成概念圖,表示底部發光型的有機EL顯示裝置中的基板的示意性剖面圖,具有平坦化膜4。 在玻璃基板6上形成底部柵極型的TFT 1,以覆蓋所述TFT 1的狀態形成包含Si3 N4 的絕緣膜3。在絕緣膜3中形成這裡省略圖示的接觸孔後,在絕緣膜3上形成經過所述接觸孔而連接於TFT 1的配線2(高度1.0 μm)。配線2是用來將TFT 1間連接、或將後續工序中形成的有機EL元件與TFT 1連接的配線。 進而,為了使因形成配線2所致的凹凸平坦化,以填埋由配線2所致的凹凸的狀態在絕緣膜3上形成平坦化膜4。 在平坦化膜4上形成有底部發光型的有機EL元件。即,在平坦化膜4上,經由接觸孔7連接於配線2而形成包含ITO的第一電極5。另外,第一電極5相當於有機EL元件的陽極。 形成覆蓋第一電極5的邊緣的形狀的絕緣膜8,通過設置所述絕緣膜8,可防止第一電極5與其後續工序中形成的第二電極之間的短路。 進而,圖2中雖未圖示,但隔著所需的圖案掩模依次蒸鍍設置電洞傳輸層、有機發光層、電子傳輸層,然後在基板上方的整個面上形成包含Al的第二電極,使用密封用玻璃板及紫外線硬化型環氧樹脂進行貼合,由此進行密封,獲得對各有機EL元件連接用來驅動所述各有機EL元件的TFT 1而成的有源矩陣型的有機EL顯示裝置。2 is a conceptual view showing an example of an organic EL display device, and is a schematic cross-sectional view of a substrate in a bottom emission type organic EL display device, and has a planarizing film 4. A bottom gate type TFT 1 is formed on the glass substrate 6 to cover the state of the TFT 1 to form an insulating film 3 containing Si 3 N 4 . After the contact hole (not shown) is formed in the insulating film 3, the wiring 2 (having a height of 1.0 μm) connected to the TFT 1 through the contact hole is formed on the insulating film 3. The wiring 2 is a wiring for connecting the TFTs 1 or connecting the organic EL elements formed in the subsequent steps to the TFT 1. Further, in order to flatten the unevenness due to the formation of the wiring 2, the planarizing film 4 is formed on the insulating film 3 in a state in which the unevenness due to the wiring 2 is filled. A bottom emission type organic EL element is formed on the planarization film 4. That is, the first electrode 5 including ITO is formed on the planarizing film 4 by being connected to the wiring 2 via the contact hole 7. Further, the first electrode 5 corresponds to the anode of the organic EL element. The insulating film 8 having a shape covering the edge of the first electrode 5 is formed, and by providing the insulating film 8, a short circuit between the first electrode 5 and the second electrode formed in the subsequent process can be prevented. Further, although not shown in FIG. 2, a hole transport layer, an organic light-emitting layer, and an electron transport layer are sequentially deposited by vapor deposition through a desired pattern mask, and then a second layer containing Al is formed on the entire upper surface of the substrate. The electrode is bonded by using a glass plate for sealing and an ultraviolet curable epoxy resin, and sealed to obtain an active matrix type in which the TFTs 1 for driving the respective organic EL elements are connected to the respective organic EL elements. Organic EL display device.

(觸摸屏及觸摸屏顯示裝置) 本發明的觸摸屏為絕緣層及/或保護層的全部或一部分包含本發明的硬化性組合物的硬化物的觸摸屏。另外,本發明的觸摸屏優選的是至少具有透明基板、電極及絕緣層及/或保護層。 本發明的觸摸屏顯示裝置優選的是具有本發明的觸摸屏的觸摸屏顯示裝置。本發明的觸摸屏可為電阻膜方式、靜電電容方式、超聲波方式、電磁感應方式等眾所周知的方式的任一種。其中,優選靜電電容方式。 靜電電容方式的觸摸屏可舉出日本專利特開2010-28115號公報中公開的觸摸屏、或國際公開第2012/057165號中公開的觸摸屏。作為其他觸摸屏,可舉出:所謂內嵌(in-cell)型(例如日本專利特表2012-517051號公報的圖5、圖6、圖7、圖8)、所謂外嵌(on-cell)型(例如日本專利特開2012-43394號公報的圖14、國際公開第2012/141148號的圖2(b))、OGS型、TOL型、其他構成(例如日本專利特開2013-164871號公報的圖6)。 [實施例](Touch Screen and Touch Screen Display Device) The touch panel of the present invention is a touch panel in which all or a part of the insulating layer and/or the protective layer contains a cured product of the curable composition of the present invention. Further, the touch panel of the present invention preferably has at least a transparent substrate, an electrode, and an insulating layer and/or a protective layer. The touch screen display device of the present invention is preferably a touch screen display device having the touch screen of the present invention. The touch panel of the present invention may be any one of well-known methods such as a resistive film method, a capacitive method, an ultrasonic method, and an electromagnetic induction method. Among them, a capacitive method is preferred. The touch panel disclosed in Japanese Laid-Open Patent Publication No. 2010-28115 or the touch panel disclosed in Japanese Laid-Open Patent Publication No. 2012/057165. Other touch panels include an in-cell type (for example, FIG. 5, FIG. 6, FIG. 7, and FIG. 8 of Japanese Patent Laid-Open Publication No. 2012-517051), so-called on-cell. (for example, FIG. 14 of Japanese Laid-Open Patent Publication No. 2012-43394, FIG. 2(b) of International Publication No. 2012/141148), OGS type, TOL type, and other configurations (for example, Japanese Patent Laid-Open Publication No. 2013-164871) Figure 6). [Examples]

以下舉出實施例對本發明加以更具體說明。以下的實施例中所示的材料、使用量、比例、處理內容、處理順序等只要不偏離本發明的主旨,則可適當變更。因此,本發明的範圍不限定於以下所示的具體例。此外,只要無特別說明,則“份”、“%”為質量基準。The invention will now be described more specifically by way of examples. The materials, the amounts used, the ratios, the processing contents, the processing order, and the like shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In addition, “parts” and “%” are quality standards unless otherwise specified.

(表面張力的測定) 表面張力是依照JIS K2241,並利用杜努依(Dunouy)表面張力計在20℃下進行測定。(Measurement of Surface Tension) The surface tension was measured at 20 ° C using a Dunouy surface tension meter in accordance with JIS K2241.

(粘度的測定) 利用東機產業(股)製造的RE85L型粘度計(轉子名稱:錐型1°34′×R24進行測定。將液溫設為20℃。(Measurement of Viscosity) The RE85L type viscometer manufactured by Toki Sangyo Co., Ltd. (rotor name: cone type 1°34'×R24 was used for measurement. The liquid temperature was set to 20 °C.

實施例及比較例中所使用的各種成分如下所述。 (成分A) ·A-1:鈦氧烷、B-4、日本曹達(股)製造、固體成分為98質量% ·A-2:四正丁氧化鈦、和光純藥工業(股)製造 ·A-3:鋯氧烷、ZA-65、松本精化(Matsumoto Fine Chemical)(股)製造、固體成分為87質量%(丁醇為13質量%) (成分B) ·B-1:丙烯酸氨基甲酸酯、15官能、U-15HA、新中村化學工業(股)製造 ·B-2:丙烯酸氨基甲酸酯、15官能、UA-32P、興和(Kowa)(股)製造 ·B-3:二季戊四醇六丙烯酸酯、DPHA、日本化藥(股)製造 ·B-4:季戊四醇四丙烯酸酯、A-TMMT、新中村化學工業(股)製造The various components used in the examples and comparative examples are as follows. (Component A) · A-1: manufactured by titanate, B-4, and Japan's Soda Co., Ltd., solid content: 98% by mass · A-2: tetra-n-butyl titanium oxide, and Wako Pure Chemical Industries Co., Ltd. A-3: zirconium oxymethane, ZA-65, Matsumoto Fine Chemical (manufactured by Matsumoto Fine Chemical Co., Ltd.), solid content: 87% by mass (butanol: 13% by mass) (ingredient B) · B-1: acrylic acid amino group Formate, 15-functional, U-15HA, manufactured by Shin-Nakamura Chemical Industry Co., Ltd. · B-2: Acrylic urethane, 15-functional, UA-32P, Kowa (manufactured), B-3: Manufacture of dipentaerythritol hexaacrylate, DPHA, Nippon Kayaku Co., Ltd. · B-4: pentaerythritol tetraacrylate, A-TMMT, manufacturing of Shin-Nakamura Chemical Industry Co., Ltd.

(成分C) ·C-1-1:萜品醇C(日本萜品烯化學(股)製造、下述三種的混合物) ·C-1-2:二氫萜品醇(日本萜品烯化學(股)製造、下述兩種的混合物) ·C-1-3:特索布(Terusolve)DTO-210(日本萜品烯化學(股)製造、二氫萜品醇(1-羥基-對薄荷烷及8-羥基-對薄荷烷的混合物)) ·C-1-4:特索布(Terusolve)THA-90(日本萜品烯化學(股)製造、下述三種的混合物) ·C-1-5:特索布(Terusolve)THA-70(日本萜品烯化學(股)製造、下述三種的混合物) ·C-1-6:特索布(Terusolve)TOE-100(日本萜品烯化學(股)製造、下述化合物)(Component C) · C-1-1: Terpineol C (manufactured by Japan Terpinene Chemical Co., Ltd., a mixture of the following three types) · C-1-2: Dihydroterpineol (Japanese terpene chemistry) (Stock) Manufacture, a mixture of the following two types) C-1-3: Terusolve DTO-210 (manufactured by Japan Terpinene Chemical Co., Ltd., dihydroterpineol (1-hydroxy-pair) a mixture of menthane and 8-hydroxy-p-menthan)) C-1-4: Terusolve THA-90 (manufactured by Nippon Terpinol Chemical Co., Ltd., a mixture of the following three types) · C- 1-5: Terusolve THA-70 (manufactured by Japan Terpinene Chemical Co., Ltd., a mixture of the following three types) · C-1-6: Terusolve TOE-100 (Japanese product) Alkene chemical (manufacturing), the following compounds)

[化27] [化27]

(比較例) ·C'-1-1:PGMEA(丙二醇單甲醚乙酸酯)(大賽璐(Daicel)(股)製造) ·C'-1-2:海索布(Hisolve)EDE(二乙二醇二乙醚)(東邦化學工業(股)製造) ·C'-1-3:MEDG(二乙二醇乙基甲醚)(東邦化學工業(股)製造) ·C'-1-4:海索布(Hisolve)EPH(乙二醇單苯醚)(東邦化學工業(股)製造) ·C'-1-5:四氫糠醇(和光純藥工業(股)製造) ·C'-1-6:二氫萜品基甲基醚(日本萜品烯化學(股)製造、下述兩種的混合物) ·C'-1-7:特索布(Terusolve)MTPH(異冰片基環己醇)(日本萜品烯化學(股)製造) (其他) ·C-2-1:海索布(Hisolve)EDE(二乙二醇二乙醚、20℃下的粘度:1.47 mPa·s、東邦化學工業(股)製造) ·C-2-2:乙醯丙酮(20℃下的粘度:0.6 mPa·s、和光純藥工業(股)製造)(Comparative Example) · C'-1-1: PGMEA (propylene glycol monomethyl ether acetate) (made by Daicel (share)) · C'-1-2: Hisolve EDE (two Ethylene glycol diethyl ether) (Manufactured by Toho Chemical Industry Co., Ltd.) · C'-1-3: MEDG (diethylene glycol ethyl methyl ether) (manufactured by Toho Chemical Industry Co., Ltd.) · C'-1-4 : Hisolve EPH (ethylene glycol monophenyl ether) (manufactured by Toho Chemical Industry Co., Ltd.) · C'-1-5: tetrahydrofurfuryl alcohol (manufactured by Wako Pure Chemical Industries, Ltd.) · C'- 1-6: Dihydrofurfuryl methyl ether (manufactured by Japanese terpene chemistry (stock), a mixture of the following two) · C'-1-7: Terusolve MTPH (isolated base ring) Hexanol) (manufactured by Japan Terpinene Chemical Co., Ltd.) (Others) · C-2-1: Hisolve EDE (diethylene glycol diethyl ether, viscosity at 20 ° C: 1.47 mPa·s, Manufactured by Toho Chemical Industry Co., Ltd.) ·C-2-2: Acetylacetone (viscosity at 20 ° C: 0.6 mPa·s, manufactured by Wako Pure Chemical Industries Co., Ltd.)

[化28] [化28]

(成分D) ·D-1:豔佳固(IRGACURE)CGI-242(1-[9-乙基-6-(2-甲基苯甲醯基)-9H-哢唑-3-基]乙烷-1-酮肟-O-乙酸酯、汽巴精化(Ciba Specialty Chemicals)公司製造) (其他) ·KBM-5103:3-丙烯醯氧基丙基三甲氧基矽烷、信越化學工業(股)製造(Component D) · D-1: IRGACURE CGI-242 (1-[9-ethyl-6-(2-methylbenzhydryl)-9H-indazol-3-yl]B Alkan-1-one oxime-O-acetate, manufactured by Ciba Specialty Chemicals Co., Ltd. (Others) · KBM-5103: 3-propenyloxypropyltrimethoxydecane, Shin-Etsu Chemical Industry ( Manufacturing

(實施例1) <硬化性組合物的製作> 如下所述進行製備。 ·A-1:B-4(鈦氧烷、日本曹達(股)、固體成分為98質量%):2.60份 ·B-1:丙烯酸氨基甲酸酯(U-15HA、15官能、新中村化學工業(股)製造):2.16份 ·B-2:丙烯酸氨基甲酸酯(UA-32P、15官能、興和(Kowa)(股)製造):2.16份 ·C-1-1:萜品醇C(日本萜品烯化學(股)製造):80份 ·C-2-1:海索布(Hisolve)EDE(東邦化學工業(股)製造):10份 ·C-2-2:乙醯丙酮(和光純藥工業(股)製造):2.86份 ·D-1:豔佳固(IRGACURE)OXE-02(巴斯夫公司製造):0.30份 ·F-1:美佳法(Megafac)F-554(含全氟烷基的非離子表面活性劑、迪愛生(DIC)(股)製造):0.004份 利用磁力攪拌器(magnetic stirrer)將所述成分攪拌1小時,利用孔徑0.3 μm的聚四氟乙烯制過濾器進行過濾,獲得實施例1的硬化性組合物。(Example 1) <Preparation of curable composition> Preparation was carried out as follows. · A-1: B-4 (titanium oxide, Japan's Soda (stock), solid content: 98% by mass): 2.60 parts · B-1: Acrylic urethane (U-15HA, 15-functional, Shin-Nakamura Chemical Industrial (manufactured by the company): 2.16 parts · B-2: Acrylic urethane (manufactured by UA-32P, 15-functional, Kowa): 2.16 parts · C-1-1: Terpineol C (Manufactured by Japanese terpene chemistry (stock)): 80 parts · C-2-1: Hisolve EDE (manufactured by Toho Chemical Industry Co., Ltd.): 10 parts · C-2-2: Acetylacetone (Manufactured by Wako Pure Chemical Industries Co., Ltd.): 2.86 parts·D-1: IRGACURE OXE-02 (manufactured by BASF Corporation): 0.30 parts·F-1: Megafac F-554 (including Perfluoroalkyl nonionic surfactant, manufactured by Diane (DIC): 0.004 parts of the component was stirred for 1 hour using a magnetic stirrer, and made of polytetrafluoroethylene having a pore diameter of 0.3 μm. The filter was filtered to obtain the curable composition of Example 1.

(實施例2~實施例6及比較例1~比較例8) 將實施例1的C-1-1變更為表1中所記載的各溶劑,而且依照表1來變更添加量,除此以外,與實施例1同樣地進行而獲得硬化性組合物。 (實施例7) 將實施例2的B-1及B-2分別變更為B-3,除此以外,與實施例2同樣地進行而獲得硬化性組合物。(Examples 2 to 6 and Comparative Examples 1 to 8) The C-1-1 of Example 1 was changed to each solvent described in Table 1, and the amount of addition was changed according to Table 1, and The curable composition was obtained in the same manner as in Example 1. (Example 7) A curable composition was obtained in the same manner as in Example 2 except that B-1 and B-2 of Example 2 were changed to B-3, respectively.

(實施例8) 將實施例4中A-1的添加量變更為3.25份,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 8) A curable composition was obtained in the same manner as in Example 4 except that the amount of A-1 added in Example 4 was changed to 3.25 parts.

(實施例9) 將特索布(Terusolve)THA-90的添加量變更為60份,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 9) A curable composition was obtained in the same manner as in Example 4 except that the amount of the addition of Terusolve THA-90 was changed to 60 parts.

(實施例10) 將A-1變更為A-2,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 10) A curable composition was obtained in the same manner as in Example 4 except that A-1 was changed to A-2.

(實施例11) 將A-1變更為A-3,且如表1般變更所添加的C-1及C-2-1的量,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 11) A hardening was carried out in the same manner as in Example 4 except that A-1 was changed to A-3, and the amounts of C-1 and C-2-1 added were changed as shown in Table 1. Composition.

(實施例12) 不使用C-2-2,且將特索布(Terusolve)THA-90的添加量變更為90份,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 12) A curable composition was obtained in the same manner as in Example 4 except that C-2-2 was not used, and the amount of the addition of the Terusolve THA-90 was changed to 90 parts.

(實施例13) 將實施例4的B-1及B-2分別變更為B-4,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 13) A curable composition was obtained in the same manner as in Example 4 except that B-1 and B-2 of Example 4 were changed to B-4, respectively.

(實施例14) 將實施例1中萜品醇C的添加量變更為32份,進而,將海索布(Hisolve)EDE的添加量變更為4份,除此以外,與實施例1同樣地進行而獲得硬化性組合物。(Example 14) In the same manner as in Example 1, except that the amount of the terpineol C added in Example 1 was changed to 32 parts, and the amount of the addition of the Hisolve EDE was changed to 4 parts. The hardening composition is obtained by carrying out.

(實施例15) 將實施例4中特索布(Terusolve)THA-90的添加量變更為100份,進而,將海索布(Hisolve)EDE的添加量變更為12.5份,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 15) The amount of addition of Terusolve THA-90 in Example 4 was changed to 100 parts, and the amount of addition of Hisolve EDE was changed to 12.5 parts, and Example 4 was carried out in the same manner to obtain a curable composition.

(實施例16) 相對於組合物的總固體成分量而添加1質量%的KBM-5103,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Example 16) A curable composition was obtained in the same manner as in Example 4 except that 1% by mass of KBM-5103 was added to the total solid content of the composition.

(實施例17) <氧化鈦分散液1的製備> 調配下述組成的分散液,將其與氧化鋯珠(0.3 mmf)17,000份混合,並使用塗料振動器(paint shaker)進行12小時的分散。過濾分離氧化鋯珠(0.3 mmf),獲得分散液。 ·二氧化鈦(石原產業(股)製造、商品名:TTO-51(A)、平均一次粒徑:10 nm~30 nm):1,875份 ·分散劑(迪斯帕畢克(DISPERBYK)-111、100%品次):660份 ·溶劑(PGMEA、丙二醇單甲醚乙酸酯):1,710份 此外,所使用的成分如下所述。 TTO-51(A):二氧化鈦、石原產業(股)製造、平均一次粒徑為10 nm~30 nm、表面處理種類:Al(OH)3 迪斯帕畢克(DISPERBYK)-111:具有一個以上的磷酸酯結構的高分子分散劑、畢克化學(BYK-Chemie)公司製造(Example 17) <Preparation of titanium oxide dispersion liquid 1> A dispersion liquid of the following composition was prepared, mixed with 17,000 parts of zirconia beads (0.3 mmf), and dispersed for 12 hours using a paint shaker (paint shaker). . The zirconia beads (0.3 mmf) were separated by filtration to obtain a dispersion. · Titanium dioxide (Ishihara Industry Co., Ltd., trade name: TTO-51 (A), average primary particle size: 10 nm to 30 nm): 1,875 parts · Dispersant (DISPERBYK-111, 100) % grade): 660 parts·solvent (PGMEA, propylene glycol monomethyl ether acetate): 1,710 parts Further, the components used were as follows. TTO-51(A): Manufactured by Titanium Dioxide and Ishihara Industries, with an average primary particle size of 10 nm to 30 nm, surface treatment type: Al(OH) 3 DISPERBYK-111: with more than one Phosphate structure polymer dispersant, manufactured by BYK-Chemie

以二氧化鈦含量與A-1的含量成為相同比例的方式,將A-1變更為所述氧化鈦分散液,且將所添加的C-2-1的量變更為6.47份,除此以外,與實施例4同樣地進行而獲得硬化性組合物。In the same ratio as the content of the titanium oxide and the content of A-1, A-1 was changed to the titanium oxide dispersion liquid, and the amount of C-2-1 added was changed to 6.47 parts, and Example 4 was carried out in the same manner to obtain a curable composition.

(實施例18) 將實施例1中萜品醇C的量變更為115份,進而,將C-2-1(海索布(Hisolve)EDE)的量變更為115份,除此以外,與實施例1同樣地進行而獲得硬化性組合物。(Example 18) The amount of terpineol C in Example 1 was changed to 115 parts, and the amount of C-2-1 (Hisolve EDE) was changed to 115 parts, and Example 1 was carried out in the same manner to obtain a curable composition.

(實施例19) 將實施例2中二氫萜品醇的量變更為115份,進而,將C-2-1(海索布(Hisolve)EDE)的量變更為115份,除此以外,與實施例2同樣地進行而獲得硬化性組合物。(Example 19) The amount of dihydroterpineol in Example 2 was changed to 115 parts, and the amount of C-2-1 (Hisolve EDE) was changed to 115 parts, and The curable composition was obtained in the same manner as in Example 2.

(實施例20) 將實施例3中特索布(Terusolve)DTO-210的量變更為115份,進而,將C-2-1(海索布(Hisolve)EDE)的量變更為115份,除此以外,與實施例3同樣地進行而獲得硬化性組合物。(Example 20) The amount of Terusolve DTO-210 in Example 3 was changed to 115 parts, and the amount of C-2-1 (Hisolve EDE) was changed to 115 parts. Otherwise in the same manner as in Example 3, a curable composition was obtained.

(比較例9) 在實施例4中,將特索布(Terusolve)THA-90的添加量變更為15份,進而,將海索布(Hisolve)EDE的添加量變更為65份,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Comparative Example 9) In Example 4, the amount of addition of Terusolve THA-90 was changed to 15 parts, and the amount of addition of Hisolve EDE was changed to 65 parts. The curable composition was obtained in the same manner as in Example 4.

(比較例10) 在實施例4中,將特索布(Terusolve)THA-90的添加量變更為90份,進而,不添加海索布(Hisolve)EDE,除此以外,與實施例4同樣地進行而獲得硬化性組合物。(Comparative Example 10) In the same manner as in Example 4, the amount of the addition of Terusolve THA-90 was changed to 90 parts in the fourth embodiment, and further, without the addition of Hisolve EDE. The curing is carried out to obtain a curable composition.

[表1] [Table 1]

(硬化性組合物的評價) 如下所述對所製作的硬化性組合物進行評價。將評價結果匯總示於表2中。 此外,在利用柔版印刷進行塗布的情況下,是使用柔版印刷機(型號A45、納康(NAKAN)(股)製造)作為印刷機。在300 mm×400 mm的玻璃基板(商品名:XG、康寧(Corning)公司製造)上,使用網紋輥(anilox roll)#400來印刷硬化性組合物。另外,在利用旋塗機進行塗布的情況下,是使用10 cm×10 cm的玻璃基板(商品名:XG、康寧公司製造)。 在噴墨印刷的情況下,是使用噴墨打印機(inkjet printer)(德麥特克斯(Dimatix)公司製造、DMP-281打印機),在10 cm×10 cm的玻璃基板(商品名:XG、康寧公司製造)上塗布硬化性組合物。(Evaluation of Curable Composition) The produced curable composition was evaluated as follows. The evaluation results are summarized in Table 2. Further, in the case of coating by flexographic printing, a flexographic printing machine (Model A45, manufactured by NAKAN Co., Ltd.) was used as a printing machine. The curable composition was printed on an 300 mm × 400 mm glass substrate (trade name: XG, manufactured by Corning) using an anilox roll #400. Further, in the case of coating by a spin coater, a glass substrate (trade name: XG, manufactured by Corning Incorporated) of 10 cm × 10 cm was used. In the case of inkjet printing, an inkjet printer (manufactured by Dimatix Co., Ltd., DMP-281 printer) is used, and a glass substrate of 10 cm × 10 cm (trade name: XG, The hardening composition is coated on the Corning Company.

<基板白濁> 在10 cm×10 cm的玻璃基板(商品名:XG,康寧公司製造)上,以乾燥膜厚成為100 nm的方式旋塗硬化性組合物,利用90℃的烘箱乾燥(預烘烤)100秒。目測觀察所得的基板上的膜,按以下基準進行評價。若白濁更少,則是指可獲得透明性更優異的膜。若評價為1或2,則實用上並無問題,更優選1。 5:基板整個面的乾燥膜白濁 4:基板整個面的乾燥膜略微白濁 3:基板的一半左右的乾燥膜略微白濁 2:基板的一部分的乾燥膜略微白濁 1:乾燥膜無白濁<Substrate turbidity> On a glass substrate (trade name: XG, manufactured by Corning Incorporated) of 10 cm × 10 cm, the curable composition was spin-coated so that the dry film thickness became 100 nm, and dried at 90 ° C in an oven (prebaking) Bake) 100 seconds. The film on the obtained substrate was visually observed and evaluated according to the following criteria. If the white turbidity is less, it means that a film which is more excellent in transparency can be obtained. If the evaluation is 1 or 2, there is no problem in practical use, and 1 is more preferable. 5: The dry film on the entire surface of the substrate is white turbid. 4: The dried film on the entire surface of the substrate is slightly turbid. 3: The dried film of about half of the substrate is slightly cloudy. 2: The dried film of a part of the substrate is slightly cloudy. 1: The dry film is not turbid.

<凹陷故障> 在10 cm×10 cm的玻璃基板(商品名:XG,康寧公司製造)上,以乾燥膜厚成為100 nm的方式旋塗硬化性組合物,利用90℃的烘箱乾燥(預烘烤)100秒。目測觀察所得的基板整體中基板上的膜,按以下基準進行評價。若評價為1或2,則實用上並無問題,更優選1。 1:未產生凹陷 2:產生1個以上且小於3個的凹陷 3:產生3個以上且小於10個的凹陷 4:產生10個以上的凹陷<Concave failure> On a glass substrate of 10 cm × 10 cm (trade name: XG, manufactured by Corning Incorporated), the curable composition was spin-coated at a dry film thickness of 100 nm, and dried at 90 ° C in an oven (prebaking) Bake) 100 seconds. The film on the substrate in the entire substrate obtained was visually observed and evaluated according to the following criteria. If the evaluation is 1 or 2, there is no problem in practical use, and 1 is more preferable. 1: no depression is generated 2: one or more and less than 3 depressions are generated 3: 3 or more and less than 10 depressions are produced 4: 10 or more depressions are generated

<面內膜厚均勻性> 在玻璃基板(商品名:XG,康寧公司製造)上,以乾燥膜厚成為100 nm的方式利用旋塗、柔版印刷、噴墨印刷來塗布硬化性組合物,利用90℃的烘箱乾燥(預烘烤)100秒。其後,使用超高壓水銀燈,對整個面進行150 mJ/cm2 的曝光(照度為24 mW/cm2 ),其後利用烘箱在200℃下加熱30分鐘。 對64處進行膜厚的面內分佈測定,如下所述進行評價。 1:面內分佈為100 nm±5 nm以下 2:面內分佈超過100 nm±5 nm且為100 nm±10 nm以下 3:面內分佈超過100 nm±10 nm且為100 nm±20 nm以下 4:面內分佈超過100 nm±20 nm 5:無需測定面內分佈,而在基板上存在塗覆部分與未塗覆部分<In-plane film thickness uniformity> The curable composition was applied by spin coating, flexographic printing, or inkjet printing so as to have a dry film thickness of 100 nm on a glass substrate (trade name: XG, manufactured by Corning Incorporated). It was dried (prebaked) in an oven at 90 ° C for 100 seconds. Thereafter, the entire surface was exposed to 150 mJ/cm 2 (illuminance of 24 mW/cm 2 ) using an ultrahigh pressure mercury lamp, and then heated at 200 ° C for 30 minutes in an oven. The in-plane distribution measurement of the film thickness at 64 places was evaluated as described below. 1: In-plane distribution is below 100 nm ± 5 nm 2: In-plane distribution exceeds 100 nm ± 5 nm and is below 100 nm ± 10 nm 3: In-plane distribution exceeds 100 nm ± 10 nm and is below 100 nm ± 20 nm 4: In-plane distribution exceeds 100 nm ± 20 nm 5: There is no need to measure in-plane distribution, and there are coated and uncoated portions on the substrate.

<耐化學品性評價> 在10 cm×10 cm的玻璃基板(商品名:XG,康寧公司製造)上,以乾燥膜厚成為100 nm的方式旋塗硬化性組合物,利用90℃的烘箱乾燥(預烘烤)100秒。其後,使用超高壓水銀燈,對整個面進行150 mJ/cm2 的曝光(照度為24 mW/cm2 ),其後利用烘箱在200℃下加熱30分鐘。 然後,以25℃在N-甲基吡咯烷酮中浸漬2分鐘,測定浸漬前後的膜厚,來測定膜的殘存率。將評價基準示於以下。 5:殘存率小於80% 4:殘存率為80%以上且小於90% 3:殘存率為90%以上且小於95% 2:殘存率為95%以上且小於98% 1:殘存率為98%以上且100%以下<Evaluation of Chemical Resistance> The curable composition was spin-coated on a glass substrate (trade name: XG, manufactured by Corning Incorporated) of 10 cm × 10 cm so that the dried film thickness was 100 nm, and dried in an oven at 90 ° C. (prebaking) for 100 seconds. Thereafter, the entire surface was exposed to 150 mJ/cm 2 (illuminance of 24 mW/cm 2 ) using an ultrahigh pressure mercury lamp, and then heated at 200 ° C for 30 minutes in an oven. Then, the film was immersed in N-methylpyrrolidone at 25 ° C for 2 minutes, and the film thickness before and after the immersion was measured to measure the residual ratio of the film. The evaluation criteria are shown below. 5: Residual rate is less than 80% 4: Residual rate is 80% or more and less than 90% 3: Residual rate is 90% or more and less than 95% 2: Residual rate is 95% or more and less than 98% 1: Residual rate is 98% Above and below 100%

<鉛筆硬度評價> 在10 cm×10 cm的玻璃基板(商品名:XG,康寧公司製造)上,以乾燥膜厚成為100 nm的方式旋塗硬化性組合物,利用90℃的烘箱乾燥(預烘烤)100秒。其後,使用超高壓水銀燈,對整個面進行150 mJ/cm2 的曝光(照度為24 mW/cm2 ),其後利用烘箱在200℃下加熱30分鐘。依照JIS K5600-5-4:1999來測定所得的硬化膜的鉛筆硬度。<Evaluation of pencil hardness> On a glass substrate (trade name: XG, manufactured by Corning Incorporated) of 10 cm × 10 cm, the curable composition was spin-coated so that the dried film thickness became 100 nm, and dried in an oven at 90 ° C (pre- Bake) 100 seconds. Thereafter, the entire surface was exposed to 150 mJ/cm 2 (illuminance of 24 mW/cm 2 ) using an ultrahigh pressure mercury lamp, and then heated at 200 ° C for 30 minutes in an oven. The pencil hardness of the obtained cured film was measured in accordance with JIS K5600-5-4:1999.

<折射率評價> 在10 cm×10 cm的矽晶圓上,以乾燥膜厚成為500 nm的方式旋塗硬化性組合物,利用90℃的烘箱乾燥(預烘烤)100秒。其後,使用超高壓水銀燈,對整個面進行150 mJ/cm2 的曝光(照度為24 mW/cm2 ),其後利用烘箱在200℃下加熱30分鐘。 使用橢偏儀(ellipsometer)VUV-VASE(日本J.A.沃蘭(J.A.Woollam Japan)(股)製造),在25℃下測定550 nm下的硬化膜的折射率。<Refractive Index Evaluation> The curable composition was spin-coated on a 10 cm × 10 cm ruthenium wafer so that the dry film thickness was 500 nm, and dried (prebaked) in an oven at 90 ° C for 100 seconds. Thereafter, the entire surface was exposed to 150 mJ/cm 2 (illuminance of 24 mW/cm 2 ) using an ultrahigh pressure mercury lamp, and then heated at 200 ° C for 30 minutes in an oven. The refractive index of the cured film at 550 nm was measured at 25 ° C using an ellipsometer VUV-VASE (manufactured by JA Woollam Japan Co., Ltd.).

[表2] [Table 2]

(實施例21) <氧化鈦分散液2的製備> 調配下述組成的分散液,將其與氧化鋯珠(0.3 mmf)100.0份混合,並使用塗料振動器進行12小時的分散。過濾分離氧化鋯珠(0.3 mmf),獲得分散液。 ·二氧化鈦(石原產業(股)製造、商品名:TTO-51(C)、平均一次粒徑:10 nm~30 nm):25.0份 ·分散劑:25.0份 ·溶劑(PGMEA、丙二醇單甲醚乙酸酯):50.0份 此外,所使用的成分如下所述。 ·TTO-51(C):二氧化鈦、石原產業(股)製造、平均一次粒徑為10 nm~30 nm、表面處理種類:Al(OH)3 、進行硬脂酸處理 ·分散劑:使用下述化合物1(分子量Mw=13,800、固體成分為30%的PGMEA溶液)(Example 21) <Preparation of titanium oxide dispersion liquid 2> A dispersion liquid having the following composition was prepared, mixed with 100.0 parts of zirconia beads (0.3 mmf), and dispersed for 12 hours using a paint shaker. The zirconia beads (0.3 mmf) were separated by filtration to obtain a dispersion. · Titanium dioxide (Ishihara industry (stock) manufacturing, trade name: TTO-51 (C), average primary particle size: 10 nm ~ 30 nm): 25.0 parts · Dispersant: 25.0 parts · Solvent (PGMEA, propylene glycol monomethyl ether B Acid ester): 50.0 parts Further, the components used were as follows. ·TTO-51(C): Manufactured by Titanium Dioxide and Ishihara Industries, with an average primary particle size of 10 nm to 30 nm, surface treatment type: Al(OH) 3 , and stearic acid treatment and dispersant: Compound 1 (PGMEA solution with molecular weight Mw = 13,800 and solid content of 30%)

[化29] [化29]

此外,化合物1中,與聚合物鏈鍵結的硫原子可與P1的單體單元鍵結,也可與P2的單體單元鍵結。Further, in the compound 1, the sulfur atom bonded to the polymer chain may be bonded to the monomer unit of P1 or may be bonded to the monomer unit of P2.

<具有酸基由酸分解性基保護的基團的聚合物(聚合物-1)的合成> 以下的合成例中,以下略稱分別表示以下化合物。 V-601:二甲基-2,2'-偶氮雙(丙酸2-甲酯) GMA:甲基丙烯酸縮水甘油酯 PGMEA:丙二醇單甲醚乙酸酯<Synthesis of a polymer (Polymer-1) having a group in which an acid group is protected by an acid-decomposable group> In the following synthesis examples, the following compounds are respectively indicated below. V-601: dimethyl-2,2'-azobis(2-methylpropionate) GMA: glycidyl methacrylate PGMEA: propylene glycol monomethyl ether acetate

<聚合物-1(K-1)的合成> 將下述成分的混合溶液在氮氣流下加熱至70℃: 甲基丙烯酸四氫呋喃-2-基酯(63.2份(0.405摩爾當量))、 甲基丙烯酸(8.2份(0.095摩爾當量))、 甲基丙烯酸(3-乙基氧雜環丁烷-3-基)甲酯(69份(0.375摩爾當量))、 甲基丙烯酸2-羥基乙酯(16.3份(0.125摩爾當量))、及 丙二醇單甲醚乙酸酯(PGMEA)(120份)。一面攪拌所述混合溶液,一面用3.5小時滴加自由基聚合引發劑(V-601:二甲基-2,2'-偶氮雙(丙酸2-甲酯)、和光純藥工業(股)製造、12.0份)及PGMEA(80份)的混合溶液。在滴加結束後,在70℃下反應2小時,由此獲得聚合物-1的PGMEA溶液。進而,添加PGMEA而將固體成分濃度調整為40質量%。 利用凝膠滲透色譜法(GPC)對所得的聚合物-1進行測定而得的重量平均分子量(Mw)為15,000。<Synthesis of Polymer-1 (K-1)> A mixed solution of the following components was heated to 70 ° C under a nitrogen stream: tetrahydrofuran-2-yl methacrylate (63.2 parts (0.405 molar equivalent)), methacrylic acid (8.2 parts (0.095 molar equivalent)), (3-ethyloxetan-3-yl)methyl methacrylate (69 parts (0.375 molar equivalent)), 2-hydroxyethyl methacrylate (16.3 Parts (0.125 molar equivalents), and propylene glycol monomethyl ether acetate (PGMEA) (120 parts). While stirring the mixed solution, a radical polymerization initiator (V-601: dimethyl-2,2'-azobis(2-methylpropionate), and Wako Pure Chemical Industries Co., Ltd. was added dropwise over 3.5 hours. A mixed solution of manufactured, 12.0 parts) and PGMEA (80 parts). After the completion of the dropwise addition, the reaction was carried out at 70 ° C for 2 hours, thereby obtaining a PGMEA solution of Polymer-1. Further, PGMEA was added to adjust the solid content concentration to 40% by mass. The obtained polymer-1 was measured by gel permeation chromatography (GPC) to have a weight average molecular weight (Mw) of 15,000.

<光酸產生劑1的合成> 向2-萘酚(10 g)、氯苯(30 mL)的懸浮溶液中添加氯化鋁(10.6 g)、2-氯丙醯氯(10.1 g),將混合液加熱至40℃後反應2小時。在冰浴冷卻下,向反應液中滴加4N的HCl水溶液(60 mL),然後添加乙酸乙酯(50 mL)來進行分液。向有機層中添加碳酸鉀(19.2 g),在40℃下反應1小時後,添加2N的HCl水溶液(60 mL)來進行分液,將有機層濃縮後,利用二異丙醚(10 mL)將結晶再漿料化(reslurry),然後進行過濾、乾燥而獲得酮化合物(6.5 g)。 向所獲得的酮化合物(3.0 g)、甲醇(30 mL)的懸浮溶液中添加乙酸(7.3 g)、50質量%羥胺水溶液(8.0 g),並進行加熱回流。放置冷卻後,添加水(50 mL),對所析出的結晶進行過濾,利用冷甲醇進行清洗後,加以乾燥而獲得肟化合物(2.4 g)。 使所獲得的肟化合物(1.8 g)溶解於丙酮(20 mL)中,在冰浴冷卻下添加三乙胺(1.5 g)、對甲苯磺醯氯(2.4 g),升溫至室溫後反應1小時。向反應液中添加水(50 mL),對所析出的結晶進行過濾後,利用甲醇(20 mL)再漿料化,然後進行過濾、乾燥而獲得B-1的化合物(下述結構)(2.3 g)。 此外,B-1的1 H-NMR光譜(300 MHz,CDCl3 )為δ=8.3 (d, 1H), 8.0 (d, 2H), 7.9 (d, 1H), 7.8 (d, 1H), 7.6 (dd, 1H), 7.4 (dd, 1H), 7.3 (d, 2H), 7.1 (d, 1H), 5.6 (q, 1H), 2.4 (s, 3H), 1.7 (d, 3H)。<Synthesis of Photoacid Generator 1> To a suspension solution of 2-naphthol (10 g) and chlorobenzene (30 mL), aluminum chloride (10.6 g) and 2-chloropropionyl chloride (10.1 g) were added. The mixture was heated to 40 ° C and reacted for 2 hours. Under ice cooling, a 4N aqueous HCl solution (60 mL) was added dropwise, and then ethyl acetate (50 mL) was added to carry out liquid separation. Potassium carbonate (19.2 g) was added to the organic layer, and the mixture was reacted at 40 ° C for 1 hour, and then a 2N aqueous HCl solution (60 mL) was added to carry out liquid separation, and the organic layer was concentrated, and then diisopropyl ether (10 mL) was used. The crystals were reslurryed, then filtered and dried to obtain a ketone compound (6.5 g). To a suspension solution of the obtained ketone compound (3.0 g) and methanol (30 mL), acetic acid (7.3 g) and a 50% by mass aqueous hydroxylamine solution (8.0 g) were added, and the mixture was heated under reflux. After standing to cool, water (50 mL) was added, and the precipitated crystals were filtered, washed with cold methanol, and dried to obtain a hydrazine compound (2.4 g). The obtained hydrazine compound (1.8 g) was dissolved in acetone (20 mL), and triethylamine (1.5 g) and p-toluenesulfonyl chloride (2.4 g) were added under ice-cooling, and the mixture was warmed to room temperature. hour. Water (50 mL) was added to the reaction liquid, and the precipitated crystals were filtered, and then re-slurryed with methanol (20 mL), and then filtered and dried to obtain a compound of B-1 (the following structure) (2.3) g). Further, the 1 H-NMR spectrum of B-1 (300 MHz, CDCl 3 ) was δ = 8.3 (d, 1H), 8.0 (d, 2H), 7.9 (d, 1H), 7.8 (d, 1H), 7.6 (dd, 1H), 7.4 (dd, 1H), 7.3 (d, 2H), 7.1 (d, 1H), 5.6 (q, 1H), 2.4 (s, 3H), 1.7 (d, 3H).

[化30] [化30]

<硬化性組合物的製作> 如下所述進行製備。 ·A-3:所述氧化鈦分散液2:3.0份 ·K-1:所述聚合物-1溶液:2.5份 ·C-1:萜品醇C(日本萜品烯化學(股)製造):48.5份 ·C-2:丙二醇單甲醚乙酸酯(大賽璐(股)製造):45.0份 ·L-1:所述光酸產生劑1:0.075份 ·M-1:1-环己基-3-(2-嗎啉基乙基)硫脲(DSP五協食品與化學(DSP GOKYO FOOD & CHEMICAL)(股)):0.0007份 ·O-1:奧古索爾(OGSOL)PG-100(環氧-芴衍生物、大阪氣體化學(股)製造):0.37份 ·O-2:奧古索爾(OGSOL)BPEF(9,9-雙[4-(2-羥基乙氧基)苯基]芴、芴系單體、大阪氣體化學(股)製造):0.29份 ·G-1:希奎斯特A-187矽烷(Silquest A-187 SILANE)(γ-縮水甘油氧基丙基三甲氧基矽烷、邁圖高新材料(Momentive Performance Materials)(股)製造):0.065份 ·G-2:KBE-846(雙(三乙氧基矽烷基丙基)四硫醚、信越化學工業(股)製造):0.12份 ·B-1:賽羅西德(Celloxide)2021P(3',4'-環氧環己基甲基-3,4-環氧環己烷羧酸酯、大賽璐(股)製造):0.022份 ·P-1:1,3-二甲基咪唑烷-2-酮(和光純藥工業(股)製造):0.056份 ·F-1:美佳法(Megafac)F-554(含全氟烷基的非離子表面活性劑,迪愛生(DIC)(股)製造):0.0032份 利用磁力攪拌器將所述成分攪拌1小時,利用孔徑0.3 μm的聚四氟乙烯制過濾器進行過濾,獲得實施例21的硬化性組合物。<Preparation of Curable Composition> Preparation was carried out as follows. A-3: The titanium oxide dispersion 2: 3.0 parts·K-1: The polymer-1 solution: 2.5 parts·C-1: Terpineol C (manufactured by Japan Terpinene Chemical Co., Ltd.) : 48.5 parts·C-2: propylene glycol monomethyl ether acetate (manufactured by Daicel): 45.0 parts·L-1: the photoacid generator 1: 0.075 parts·M-1:1-cyclohexyl -3-(2-morpholinoethyl)thiourea (DSP GOKYO FOOD & CHEMICAL): 0.0007 parts·O-1: OGSOL PG-100 (epoxy-anthracene derivative, manufactured by Osaka Gas Chemical Co., Ltd.): 0.37 parts·O-2: OGSOL BPEF (9,9-bis[4-(2-hydroxyethoxy)benzene) Base] 芴, 芴 monomer, manufactured by Osaka Gas Chemical Co., Ltd.): 0.29 parts G-1: Silquest A-187 SILANE (γ-glycidoxypropyl trimethyl) Oxydecane, manufactured by Momentive Performance Materials (stock): 0.065 parts G-2: KBE-846 (bis(triethoxydecylpropyl) tetrasulfide, Shin-Etsu Chemical Industry Co., Ltd. ))): 0.12 parts · B-1: Celloxide 2021P 3',4'-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, manufactured by Daicelin): 0.022 parts·P-1: 1,3-dimethylimidazolidine -2-ketone (manufactured by Wako Pure Chemical Industries, Ltd.): 0.056 parts·F-1: Megafac F-554 (perfluoroalkyl-containing nonionic surfactant, Di Aisheng (DIC) (manufacturing): 0.0032 parts of the components were stirred for 1 hour by a magnetic stirrer, and filtered using a filter made of polytetrafluoroethylene having a pore diameter of 0.3 μm to obtain a curable composition of Example 21.

(實施例22~實施例26、實施例29、實施例30、及比較例11~比較例13) 將實施例21的C-1、C-2變更為表3中所記載的各溶劑,而且,依照表3來變更添加量,除此以外,與實施例21同樣地進行而獲得硬化性組合物。(Examples 22 to 26, Example 29, Example 30, and Comparative Example 11 to Comparative Example 13) C-1 and C-2 of Example 21 were changed to the respective solvents described in Table 3, and The curable composition was obtained in the same manner as in Example 21 except that the amount of addition was changed in accordance with Table 3.

(實施例27及實施例28) 將實施例21的C-1及C-2變更為表3中所記載的各溶劑,進而,以成為表3的組合物固體成分的方式變更溶劑的添加量,除此以外,與實施例21同樣地進行而獲得硬化性組合物。(Example 27 and Example 28) C-1 and C-2 of Example 21 were changed to the respective solvents described in Table 3, and the amount of the solvent added was changed so as to become the solid content of the composition of Table 3. A curable composition was obtained in the same manner as in Example 21 except for the above.

(實施例31) 將實施例21的C-1及C-2變更為表3中所記載的各溶劑,進而,將氧化鈦分散液2變更為下述氧化鋯分散液,除此以外,與實施例21同樣地進行而獲得硬化性組合物。(Example 31) C-1 and C-2 of Example 21 were changed to the respective solvents described in Table 3, and the titanium oxide dispersion liquid 2 was changed to the following zirconia dispersion liquid, and Example 21 was carried out in the same manner to obtain a curable composition.

<氧化鋯分散液的製備> 將實施例21中所記載的氧化鈦分散液2的氧化鈦變更為下述氧化鋯(UPE-100、第一稀元素化學工業(股)製造),除此以外,與氧化鈦分散液2同樣地進行分散處理而獲得氧化鋯分散液。<Preparation of the zirconia dispersion liquid> The titanium oxide of the titanium oxide dispersion liquid 2 described in the example 21 was changed to the following zirconia (UPE-100, manufactured by the first rare element chemical industry), and The dispersion treatment was carried out in the same manner as in the titanium oxide dispersion 2 to obtain a zirconia dispersion.

針對所得的硬化性組合物,與實施例1同樣地進行凹陷、基板白濁、面內膜厚均勻性、耐化學品性、折射率、及鉛筆硬度的評價。 此外,關於對面內膜厚均勻性、耐化學品性、及鉛筆硬度的評價,除不進行曝光以外,與實施例1同樣地進行評價。With respect to the obtained curable composition, in the same manner as in Example 1, evaluation of the depression, the substrate turbidity, the in-plane film thickness uniformity, the chemical resistance, the refractive index, and the pencil hardness were performed. In addition, the evaluation of the in-plane film thickness uniformity, the chemical resistance, and the pencil hardness was evaluated in the same manner as in Example 1 except that the exposure was not performed.

[表3] [table 3]

[表4] [Table 4]

(實施例32) 在圖3~圖5所記載的觸摸屏中,如以下所述來形成與基板111一併圍繞所述圖4的Y(102a)電極的絕緣層W(以下也稱為“台座層W”),除此以外,與日本專利特開2013-97692號公報所記載方法同樣地來形成,獲得本發明的觸摸屏。進而,使用所述觸摸屏,依照日本專利特開2013-97692號公報而獲得帶有觸摸屏的顯示裝置。 台座層的形成:將實施例4的硬化性組合物塗布在基板上,進行預烘烤後,使用超高壓水銀燈進行曝光,利用鹼性水溶液進行顯影而形成圖案,在200℃下進行30分鐘的加熱處理,形成台座層W。此外,所述台座層具有作為觸控檢測電極間的層間絕緣膜的功能。 對所得的顯示裝置施加驅動電壓,結果可知:表現出良好的顯示特性及觸控檢測性能,為可靠性高的裝置。(Embodiment 32) In the touch panel shown in Figs. 3 to 5, an insulating layer W (hereinafter also referred to as "a pedestal" which surrounds the Y (102a) electrode of Fig. 4 together with the substrate 111 is formed as follows. The layer W") is formed in the same manner as the method described in Japanese Laid-Open Patent Publication No. 2013-97692, and the touch panel of the present invention is obtained. Further, using the touch panel, a display device with a touch panel is obtained in accordance with Japanese Laid-Open Patent Publication No. 2013-97692. Formation of a pedestal layer: The curable composition of Example 4 was applied onto a substrate, prebaked, exposed to light using an ultrahigh pressure mercury lamp, developed by an aqueous alkaline solution to form a pattern, and subjected to a pattern at 200 ° C for 30 minutes. Heat treatment to form a pedestal layer W. Further, the pedestal layer has a function as an interlayer insulating film between the touch detection electrodes. When a driving voltage was applied to the obtained display device, it was found that the display characteristics and the touch detection performance were excellent, and the device was highly reliable.

(實施例33) 在圖3~圖5所記載的觸摸屏中,如以下所述來形成與基板11一併圍繞所述圖4的Y(102a)電極的絕緣層W(台座層W)、絕緣層112及保護層113,除此以外,與日本專利特開2013-97692號公報所記載方法同樣地來形成,獲得本發明的觸摸屏。進而,使用所述觸摸屏,依照日本專利特開2013-97692號公報而獲得帶有觸摸屏的顯示裝置。 台座層W、絕緣層112及保護層113的形成:將實施例4的硬化性組合物狹縫塗布在基板上,進行預烘烤後,使用超高壓水銀燈進行曝光,利用鹼性水溶液進行顯影而形成圖案,在200℃下進行30分鐘的加熱處理,形成各層。 對所得的顯示裝置施加驅動電壓,結果可知:表現出良好的顯示特性及觸控檢測性能,為可靠性高的裝置。(Example 33) In the touch panel shown in Figs. 3 to 5, an insulating layer W (a pedestal layer W) which surrounds the Y (102a) electrode of Fig. 4 together with the substrate 11 and insulation is formed as follows. The layer 112 and the protective layer 113 are formed in the same manner as the method described in Japanese Laid-Open Patent Publication No. 2013-97692, and the touch panel of the present invention is obtained. Further, using the touch panel, a display device with a touch panel is obtained in accordance with Japanese Laid-Open Patent Publication No. 2013-97692. Formation of the pedestal layer W, the insulating layer 112, and the protective layer 113: The sclerosing composition of Example 4 is slit-coated on a substrate, pre-baked, exposed to an ultrahigh pressure mercury lamp, and developed with an alkaline aqueous solution. A pattern was formed and heat treatment was performed at 200 ° C for 30 minutes to form each layer. When a driving voltage was applied to the obtained display device, it was found that the display characteristics and the touch detection performance were excellent, and the device was highly reliable.

1‧‧‧TFT(薄膜晶體管)
2‧‧‧配線
3‧‧‧絕緣膜
4‧‧‧平坦化膜
5‧‧‧第一電極
6‧‧‧玻璃基板
7‧‧‧接觸孔
8‧‧‧絕緣膜
10‧‧‧液晶顯示裝置
12‧‧‧背光單元
14、15‧‧‧玻璃基板
16‧‧‧TFT
17‧‧‧硬化膜
18‧‧‧接觸孔
19‧‧‧ITO透明電極
20‧‧‧液晶
22‧‧‧彩色濾光片
102a‧‧‧電極
111‧‧‧基板
112‧‧‧絕緣層
113‧‧‧保護層
W‧‧‧絕緣層(台座層)
Y‧‧‧電極
1‧‧‧TFT (thin film transistor)
2‧‧‧Wiring
3‧‧‧Insulation film
4‧‧‧Flat film
5‧‧‧First electrode
6‧‧‧ glass substrate
7‧‧‧Contact hole
8‧‧‧Insulation film
10‧‧‧Liquid crystal display device
12‧‧‧Backlight unit
14, 15‧‧‧ glass substrate
16‧‧‧TFT
17‧‧‧ hardened film
18‧‧‧Contact hole
19‧‧‧ITO transparent electrode
20‧‧‧LCD
22‧‧‧Color filters
102a‧‧‧electrode
111‧‧‧Substrate
112‧‧‧Insulation
113‧‧‧Protective layer
W‧‧‧Insulation (seat floor)
Y‧‧‧electrode

圖1 表示液晶顯示裝置的一例的構成概念圖, 表示液晶顯示裝置中的有源矩陣基板的示意性剖面圖, 具有作為層間絕緣膜的硬化膜17。圖2 表示有機EL 顯示裝置的一例的構成概念圖,表示底部發光型的有機EL 顯示裝置中的基板的示意性剖面圖, 具有平坦化膜4。圖3 是表示帶有觸摸屏的顯示裝置的一例中的觸摸屏的電極圖案的平面圖。圖4 是表示沿圖3 所示的A1-A2 線的剖面結構的剖面圖。圖5 是表示沿圖3 所示的B1-B2 線的剖面結構的剖面圖。1 is a conceptual view showing an example of a liquid crystal display device, and is a schematic cross-sectional view showing an active matrix substrate in a liquid crystal display device, and has a cured film 17 as an interlayer insulating film. 2 is a conceptual view showing an example of an organic EL display device, and is a schematic cross-sectional view of a substrate in a bottom emission type organic EL display device, and has a planarizing film 4. 3 is a plan view showing an electrode pattern of a touch panel in an example of a display device with a touch panel. Fig. 4 is a cross-sectional view showing a cross-sectional structure taken along line A1-A2 shown in Fig. 3. Fig. 5 is a cross-sectional view showing a cross-sectional structure taken along the line B1-B2 shown in Fig. 3.

Claims (17)

一種硬化性組合物,其特徵在於含有: 作為成分A的選自由下述a1~a3所組成的組群中的至少一種, 作為成分B的硬化性化合物,以及 作為成分C的溶劑;且 成分C含有:作為成分C-1的20℃下的粘度為50 mPa·s以上且200 mPa·s以下並且表面張力為30 mN/m以上且41 mN/m以下的至少一種有機溶劑、及作為成分C-2的20℃下的粘度小於50 mPa·s的至少一種有機溶劑, 相對于成分C的總質量,成分C-1的含量為20質量%~95質量%, 硬化性組合物的20℃下的粘度為1 mPa·s以上且30 mPa·s以下; a1:具有烷氧基的鈦化合物及/或鋯化合物, a2:具有至少一個直接鍵結在鈦原子或鋯原子上的烷氧基的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物, a3:含有鈦原子及/或鋯原子的金屬氧化物。A curable composition comprising: at least one selected from the group consisting of a1 to a3 described below as a component A, a curable compound as component B, and a solvent as component C; and component C Containing at least one organic solvent having a viscosity at 20° C. of 20° C. as component C-1 of 50 mPa·s or more and 200 mPa·s or less and a surface tension of 30 mN/m or more and 41 mN/m or less, and as component C -2 at least one organic solvent having a viscosity at 20 ° C of less than 50 mPa·s, and the content of the component C-1 is 20% by mass to 95% by mass based on the total mass of the component C, at 20 ° C of the curable composition The viscosity is 1 mPa·s or more and 30 mPa·s or less; a1: a titanium compound having an alkoxy group and/or a zirconium compound, a2: having at least one alkoxy group directly bonded to a titanium atom or a zirconium atom. A titanate, a zirconium oxide and/or a titanyl-zirconoxane condensate, a3: a metal oxide containing a titanium atom and/or a zirconium atom. 如申請專利範圍第1項所述的硬化性組合物,其中成分B為聚合性化合物。The curable composition according to claim 1, wherein the component B is a polymerizable compound. 如申請專利範圍第1項或第2項所述的硬化性組合物,其中成分C-1含有選自由萜品醇、二氫萜品醇、4-(乙醯氧基)-α,α,4-三甲基環己烷甲醇乙酸酯、及2-[1-甲基-1-(4-甲基-3-環己烯-1-基)乙氧基]乙醇所組成的組群中的至少一個。The sclerosing composition according to claim 1 or 2, wherein the component C-1 is selected from the group consisting of terpineol, dihydroterpineol, 4-(ethyloxy)-α, α, a group consisting of 4-trimethylcyclohexane methanol acetate and 2-[1-methyl-1-(4-methyl-3-cyclohexen-1-yl)ethoxy]ethanol At least one of them. 如申請專利範圍第1項或第2項所述的硬化性組合物,其中相對於硬化性組合物的總質量,所述硬化性組合物中的固體成分的總量為2質量%~15質量%。The curable composition according to claim 1 or 2, wherein the total amount of the solid components in the curable composition is from 2% by mass to 15% by mass based on the total mass of the curable composition. %. 如申請專利範圍第1項或第2項所述的硬化性組合物,其中成分B含有六官能以上的聚合性化合物。The curable composition according to claim 1 or 2, wherein the component B contains a hexafunctional or higher polymerizable compound. 如申請專利範圍第1項或第2項所述的硬化性組合物,其中所述a2是通過相對於鈦原子及鋯原子的總摩爾量1.0摩爾為0.5倍~1.9倍摩爾當量的水,使選自由具有烷氧基的鈦化合物、具有烷氧基的鋯化合物以及具有鹵素基的鈦化合物及具有鹵素基的鋯化合物所組成的組群中的至少一種進行水解縮合所得的鈦氧烷、鋯氧烷及/或鈦氧烷-鋯氧烷縮合物。The curable composition according to claim 1 or 2, wherein the a2 is 0.5 to 1.9 times molar equivalent of water per 1.0 mol of the total of the titanium atom and the zirconium atom. a titanate or zirconium obtained by hydrolysis-condensation of at least one selected from the group consisting of a titanium compound having an alkoxy group, a zirconium compound having an alkoxy group, and a titanium compound having a halogen group and a zirconium compound having a halogen group Oxyalkane and/or titanyl-zirconoxane condensate. 如申請專利範圍第1項或第2項所述的硬化性組合物,其中成分A包含所述a2。The sclerosing composition according to claim 1 or 2, wherein the component A comprises the a2. 如申請專利範圍第1項或第2項所述的硬化性組合物,其含有光聚合引發劑作為成分D。The curable composition according to claim 1 or 2, which contains a photopolymerization initiator as component D. 一種硬化膜的製造方法,其至少依次包括工序a~工序d, 工序a:塗布工序,將如申請專利範圍第1項或第2項所述的硬化性組合物塗布在基板上; 工序b:溶劑除去工序,從所塗布的硬化性組合物中除去溶劑; 工序c:曝光工序,利用光化射線對除去了溶劑的硬化性組合物的至少一部分進行曝光;以及 工序d:熱處理工序,對硬化性組合物進行熱處理。A method for producing a cured film, comprising at least a step a to a step d, a step a: a coating step, and applying the curable composition according to the first or second aspect of the patent application to a substrate; The solvent removal step removes the solvent from the applied curable composition; Step c: Exposure step, exposing at least a portion of the curable composition from which the solvent has been removed by actinic rays; and step d: heat treatment step to hardening The composition is subjected to heat treatment. 一種硬化膜的製造方法,其至少依次包括工序1~工序5, 工序1:塗布工序,將如申請專利範圍第1項或第2項所述的硬化性組合物塗布在基板上; 工序2:溶劑除去工序,從所塗布的硬化性組合物中除去溶劑; 工序3:曝光工序,利用光化射線對除去了溶劑的硬化性組合物的至少一部分進行曝光; 工序4:顯影工序,利用水性顯影液對經曝光的硬化性組合物進行顯影;以及 工序5:熱處理工序,對經顯影的硬化性組合物進行熱處理。A method for producing a cured film, comprising at least a step 1 to a step 5, a step 1: a coating step, and applying the curable composition according to the first or second aspect of the patent application to a substrate; The solvent removal step removes the solvent from the applied curable composition; Step 3: Exposure step exposes at least a portion of the curable composition from which the solvent has been removed by actinic radiation; Step 4: Development step, using aqueous development The liquid is subjected to development of the exposed curable composition; and in the step 5: heat treatment step, the developed curable composition is subjected to heat treatment. 一種硬化膜,其是使如申請專利範圍第1項或第2項所述的硬化性組合物硬化而成。A cured film obtained by curing the curable composition according to the first or second aspect of the invention. 如申請專利範圍第11項所述的硬化膜,其為層間絕緣膜或外塗膜。The cured film according to claim 11, which is an interlayer insulating film or an overcoat film. 如申請專利範圍第11項所述的硬化膜,其波長550 nm下的折射率為1.6~1.9。The cured film according to claim 11, wherein the refractive index at a wavelength of 550 nm is from 1.6 to 1.9. 一種液晶顯示裝置,具有如申請專利範圍第11項所述的硬化膜。A liquid crystal display device having the cured film as described in claim 11 of the patent application. 一種有機電致發光顯示裝置,具有如申請專利範圍第11項所述的硬化膜。An organic electroluminescence display device comprising the cured film according to claim 11 of the patent application. 一種觸摸屏,具有如申請專利範圍第11項所述的硬化膜。A touch screen having a cured film as described in claim 11 of the patent application. 一種觸摸屏顯示裝置,具有如申請專利範圍第11項所述的硬化膜。A touch screen display device having the cured film according to claim 11 of the patent application.
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