TW201608305A - Method for manufacturing liquid crystal display panel - Google Patents

Method for manufacturing liquid crystal display panel Download PDF

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Publication number
TW201608305A
TW201608305A TW104125387A TW104125387A TW201608305A TW 201608305 A TW201608305 A TW 201608305A TW 104125387 A TW104125387 A TW 104125387A TW 104125387 A TW104125387 A TW 104125387A TW 201608305 A TW201608305 A TW 201608305A
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substrate
line
brittle substrate
crack
main surface
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TW104125387A
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Chinese (zh)
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TWI667515B (en
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Hiroshi Soyama
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Mitsuboshi Diamond Ind Co Ltd
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133351Manufacturing of individual cells out of a plurality of cells, e.g. by dicing

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

The present invention provides a method for manufacturing a liquid crystal display panel, which allows performance of a breaking step without turning over a cell substrate and comprises: forming a trench line TL in a first primary surface SF1 of a first brittle substrate 11, the trench line TL being formed in a state of no cracking; laminating the first brittle substrate 11 and a second brittle substrate 12 in a manner that the first primary surface SF 1 of the first brittle substrate 11 and a third primary surface SF3 of the second brittle substrate 12 face each other; forming a cracking line CL by allowing cracking of the first brittle substrate 11 to extend in a thickness direction along the trench line TL; forming a cracking line CL in the fourth primary surface SF4 of the second brittle substrate 12; breaking the first and second brittle substrates 11, 12 by applying a load, in a localized manner, to a second primary surface SF2 of the first brittle substrate 11 and bending the first brittle substrate 11 and the second brittle substrate 12.

Description

液晶顯示面板之製造方法 Liquid crystal display panel manufacturing method

本發明係關於一種液晶顯示面板之製造方法。 The present invention relates to a method of fabricating a liquid crystal display panel.

在液晶顯示(LCD)面板之製造方法中,有必要對玻璃基板等脆性基板進行分斷。首先,在基板上形成刻劃線,接著沿該刻劃線分斷基板。刻劃線,可藉由使用刃前端機械性地加工基板而形成。藉由使切刀在基板上位移,而在基板上形成塑性變形之溝槽(trench),同時在該溝槽之緊鄰下方形成垂直裂紋。之後,進行稱為裂斷步驟之應力賦予。藉由裂斷步驟而使裂紋往厚度方向完全地進展,藉此將基板分斷。 In the method of manufacturing a liquid crystal display (LCD) panel, it is necessary to break a brittle substrate such as a glass substrate. First, a scribe line is formed on the substrate, and then the substrate is separated along the scribe line. The scribe line can be formed by mechanically processing the substrate using the tip end. A plastically deformed trench is formed on the substrate by displacing the cutter on the substrate while forming a vertical crack immediately below the groove. Thereafter, a stress imparting called a cracking step is performed. The crack is completely progressed in the thickness direction by the cracking step, thereby breaking the substrate.

專利文獻1例示有面板製品之製造方法。根據該例,首先準備具有已貼合有第1基板與第2基板之構造的玻璃基板。在玻璃基板之表面及背面分別形成刻劃線。對玻璃基板之表面及背面分別以裂斷桿按壓,藉此將玻璃基板分斷。 Patent Document 1 exemplifies a method of manufacturing a panel product. According to this example, first, a glass substrate having a structure in which a first substrate and a second substrate are bonded is prepared. A scribe line is formed on each of the front and back surfaces of the glass substrate. The glass substrate is divided by pressing the cracked rod on the front and back surfaces of the glass substrate.

專利文獻1:日本特開2011-161674號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2011-161674

根據上述公報記載之技術,必須對玻璃基板(單位(cell)基板)之一面及另一面分別以裂斷桿按壓。因此,為了在對一面進行處理後,進行對另一面之處理,因而有必要使單位基板反轉。 According to the technique described in the above publication, it is necessary to press the one surface and the other surface of the glass substrate (cell substrate) with the rupture rod. Therefore, in order to perform processing on the other side after processing one surface, it is necessary to invert the unit substrate.

本發明係為了解決如以上般之課題而完成者,其目的在於提 供一種能夠在不使單位基板反轉之下,進行裂斷步驟之液晶顯示面板之製造方法。 The present invention has been made in order to solve the above problems, and its purpose is to provide A method of manufacturing a liquid crystal display panel capable of performing a cracking step without inverting a unit substrate.

本發明之液晶顯示面板之製造方法具有以下步驟。 The method of manufacturing a liquid crystal display panel of the present invention has the following steps.

準備第1脆性基板,該第1脆性基板具有第1主面、及與第 1主面相反之第2主面,且具有與第1主面垂直之厚度方向。準備第2脆性基板,該第2脆性基板具有第3主面、及與第3主面相反之第4主面。 Preparing a first brittle substrate having a first main surface and a first main surface The second main surface opposite to the main surface has a thickness direction perpendicular to the first main surface. A second brittle substrate having a third main surface and a fourth main surface opposite to the third main surface is prepared.

將刃前端按壓於第1脆性基板之第1主面。藉由使已按壓之 刃前端在第1脆性基板之第1主面上滑動而在第1脆性基板之第1主面上使塑性變形產生,藉此形成具有槽形狀之第1溝槽線。第1溝槽線,係以在第1溝槽線之緊鄰下方,第1脆性基板獲得在與第1溝槽線交叉之方向連續地相連之狀態即無裂紋狀態的方式形成。 The tip end of the blade is pressed against the first main surface of the first brittle substrate. By having pressed The tip end of the blade slides on the first main surface of the first brittle substrate, and plastic deformation occurs on the first main surface of the first brittle substrate, thereby forming a first groove line having a groove shape. The first groove line is formed immediately below the first groove line, and the first brittle substrate is formed in a state in which the first brittle substrate is continuously connected in a direction intersecting the first groove line, that is, in a non-crack state.

在形成有第1溝槽線後,以第1脆性基板之第1主面與第2 脆性基板之第3主面相對向之方式,使第1脆性基板及第2脆性基板相互貼合。第1脆性基板及第2脆性基板,以形成在第1脆性基板之第1溝槽線至少部分覆蓋於第2脆性基板之方式,相互貼合。 After the first groove line is formed, the first main surface and the second surface of the first brittle substrate The first brittle substrate and the second brittle substrate are bonded to each other so that the third main surface of the brittle substrate faces. The first brittle substrate and the second brittle substrate are bonded to each other such that the first groove line formed on the first brittle substrate at least partially covers the second brittle substrate.

在第1脆性基板及第2脆性基板相互貼合後,藉由沿著第1 溝槽線使厚度方向中的第1脆性基板之裂紋伸展,而形成第1裂紋線。藉由第1裂紋線,切斷在第1溝槽線之緊鄰下方、第1脆性基板在與第1溝槽線交叉之方向連續的相連。 After the first brittle substrate and the second brittle substrate are bonded to each other, The groove line extends the crack of the first brittle substrate in the thickness direction to form a first crack line. By the first crack line, the first brittle substrate is continuously connected in the direction immediately intersecting with the first groove line, and the first brittle substrate is continuous in the direction intersecting the first groove line.

在第2脆性基板之第4主面上形成第2裂紋線。 A second crack line is formed on the fourth main surface of the second brittle substrate.

藉由在第1脆性基板之第2主面上局部地施加負載而使第1 脆性基板及第2脆性基板彎曲,藉此分別沿第1裂紋線及第2裂紋線分斷 第1脆性基板及第2脆性基板。 The first one is applied locally on the second main surface of the first brittle substrate to make the first The brittle substrate and the second brittle substrate are bent, thereby being separated along the first crack line and the second crack line, respectively The first brittle substrate and the second brittle substrate.

根據本發明,第1脆性基板及第2脆性基板之裂斷步驟,藉 由第1脆性基板之第2主面上之負載施加而進行。藉此,在裂斷步驟中,無需使具有第1脆性基板及第2脆性基板之單位基板反轉。據此能夠更容易地進行裂斷步驟。 According to the present invention, the first brittle substrate and the second brittle substrate are broken. It is carried out by application of a load on the second main surface of the first brittle substrate. Thereby, in the cracking step, it is not necessary to invert the unit substrate having the first brittle substrate and the second brittle substrate. According to this, the breaking step can be performed more easily.

11‧‧‧CF基板(脆性基板) 11‧‧‧CF substrate (brittle substrate)

12‧‧‧TFT基板(脆性基板) 12‧‧‧TFT substrate (brittle substrate)

20‧‧‧液晶層 20‧‧‧Liquid layer

21‧‧‧密封部 21‧‧‧ Sealing Department

51、51v‧‧‧刃前端 51, 51v‧‧‧ blade front end

60‧‧‧平台 60‧‧‧ platform

61‧‧‧裂斷用墊 61‧‧‧breaking mat

71‧‧‧裂斷桿 71‧‧‧crack

72‧‧‧裂斷滾子 72‧‧‧Break the roller

101‧‧‧LCD面板(液晶顯示面板) 101‧‧‧LCD panel (liquid crystal display panel)

AL‧‧‧輔助線 AL‧‧‧Auxiliary line

CL‧‧‧裂紋線 CL‧‧‧crack line

ED1‧‧‧邊(第1邊) ED1‧‧‧ side (1st side)

ED2‧‧‧邊(第2邊) ED2‧‧‧ side (2nd side)

N1‧‧‧位置(第1位置) N1‧‧‧ position (1st position)

N2‧‧‧位置(第2位置) N2‧‧‧ position (2nd position)

SF1、SF3‧‧‧內面(主面) SF1, SF3‧‧‧ inside (main surface)

SF2、SF4‧‧‧外面(主面) SF2, SF4‧‧‧ outside (main surface)

SL‧‧‧刻劃線 SL‧‧ scribe

TL‧‧‧溝槽線 TL‧‧‧ trench line

PP、PPv‧‧‧突起部 PP, PPv‧‧‧ protrusion

PS、PSv‧‧‧側部 PS, PSv‧‧‧ side

圖1(A),係概略性地表示本發明之實施形態1中的液晶顯示面板之構成之立體圖;圖1(B)係沿圖1(A)之線IB-IB之概略剖面圖。 Fig. 1(A) is a perspective view schematically showing a configuration of a liquid crystal display panel in accordance with a first embodiment of the present invention; and Fig. 1(B) is a schematic cross-sectional view taken along line IB-IB of Fig. 1(A).

圖2,係概略性地表示圖1之液晶顯示面板之製造方法之流程圖。 Fig. 2 is a flow chart schematically showing a method of manufacturing the liquid crystal display panel of Fig. 1.

圖3(A),係概略性地表示本發明之實施形態1中的液晶顯示面板之製造方法中的基板刻劃方法之第1步驟之沿線IIIA-IIIA(圖4)之端面圖;圖3(B),係概略性地表示其第2步驟之沿線IIIB-IIIB(圖5)之端面圖;圖3(C),係概略性地表示其第3步驟之沿線IIIC-IIIC(圖6)之端面圖;圖3(D),係概略性地表示其第4步驟之沿線IIID-IIID(圖7)之端面圖。 FIG. 3(A) is a cross-sectional view along line IIIA-IIIA (FIG. 4) of the first step of the substrate scribing method in the method of manufacturing a liquid crystal display panel according to the first embodiment of the present invention; FIG. (B) is a schematic end view of the second step along the line IIIB-IIIB (Fig. 5); Fig. 3(C) is a schematic view of the third step along the line IIIC-IIIC (Fig. 6) Fig. 3(D) is a schematic end view showing the fourth step along the line IIID-IIID (Fig. 7).

圖4,係概略性地表示本發明之實施形態1中的液晶顯示面板之製造方法中的基板刻劃方法之第1步驟之俯視圖。 FIG. 4 is a plan view schematically showing a first step of the substrate scribing method in the method of manufacturing the liquid crystal display panel in the first embodiment of the present invention.

圖5,係概略性地表示本發明之實施形態1中的液晶顯示面板之製造方法中的基板刻劃方法之第2步驟之俯視圖。 FIG. 5 is a plan view schematically showing a second step of the substrate scribing method in the method of manufacturing the liquid crystal display panel in the first embodiment of the present invention.

圖6,係概略性地表示本發明之實施形態1中的液晶顯示面板之製造方法中的基板刻劃方法之第3步驟之俯視圖。 FIG. 6 is a plan view schematically showing a third step of the substrate scribing method in the method of manufacturing a liquid crystal display panel according to the first embodiment of the present invention.

圖7,係概略性地表示本發明之實施形態1中的液晶顯示面板之製造方 法中的基板刻劃方法之第4步驟之俯視圖。 Fig. 7 is a view schematically showing the manufacture of a liquid crystal display panel in the first embodiment of the present invention; A plan view of the fourth step of the substrate scribing method in the method.

圖8(A),係概略性地表示本發明之實施形態1中的液晶顯示面板之製造方法中的基板刻劃方法中所形成之溝槽線之構成之端面圖;圖8(B),係概略性地表示裂紋線之構成之端面圖。 FIG. 8(A) is a plan view schematically showing a configuration of a groove line formed in a substrate scribing method in a method of manufacturing a liquid crystal display panel according to Embodiment 1 of the present invention; FIG. 8(B), The end view of the configuration of the crack line is schematically shown.

圖9(A),係概略性地表示本發明之實施形態1中的液晶顯示面板之製造方法中的基板裂斷方法之第1步驟之端面圖;圖9(B),係概略性地表示其第2步驟之沿著線IXB-IXB(圖12)之端面圖。 FIG. 9(A) is a plan view schematically showing a first step of the substrate cracking method in the method for manufacturing a liquid crystal display panel according to the first embodiment of the present invention, and FIG. 9(B) is a view schematically showing The end view of the second step along line IXB-IXB (Fig. 12).

圖10(A),係概略性地表示藉由裂斷桿進行圖9(A)中的負載施加的情形之樣子之前視圖;圖10(B),係沿圖10(A)之線XB-XB之概略剖面圖。 Fig. 10(A) is a front view schematically showing a state in which the load application in Fig. 9(A) is performed by a split rod; Fig. 10(B) is a line XB- along the line of Fig. 10(A) A schematic cross-sectional view of XB.

圖11(A),係概略性地表示藉由裂斷桿進行圖9(A)中的負載施加的情形之樣子之前視圖;圖11(B),係沿圖11(A)之線XIB-XIB之概略剖面圖。 Fig. 11(A) is a front view schematically showing a state in which the load application in Fig. 9(A) is performed by a rupture rod; Fig. 11(B) is a line XIB- along the line of Fig. 11(A) A schematic cross-sectional view of the XIB.

圖12,係與圖9(B)對應之概略俯視圖。 Fig. 12 is a schematic plan view corresponding to Fig. 9(B).

圖13(A),係表示第1比較例中的第1步驟之端面圖;圖13(B),係表示其第2步驟之端面圖。 Fig. 13(A) is an end view showing a first step in the first comparative example, and Fig. 13(B) is an end view showing the second step.

圖14(A),係表示第2比較例中的第1步驟之端面圖;圖14(B),係表示其第2步驟之端面圖;圖14(C),係表示其第3步驟之端面圖。 Fig. 14(A) is an end view showing a first step in the second comparative example; Fig. 14(B) is an end view showing the second step; and Fig. 14(C) is a third step thereof. End view.

圖15(A),係概略性地表示本發明之實施形態2中的液晶顯示面板之製造方法之第1步驟之沿著線XVA-XVA(圖16)之端面圖;圖15(B),係概略性地表示其第2步驟之沿著線XVB-XVB(圖17)之端面圖;圖15(C),係概略性地表示其第3步驟之沿著線XVC-XVC(圖18)之端面圖;圖15(D),係概略性地表示其第4步驟之沿著線XVD-XVD(圖19)之端面圖;圖15(E),係概略性地表示其第5步驟之沿著線XVE-XVE(圖20)之端面圖。 Fig. 15(A) is a plan view schematically showing the first step of the method for manufacturing a liquid crystal display panel according to the second embodiment of the present invention along the line XVA-XVA (Fig. 16); Fig. 15(B), The end view of the second step along the line XVB-XVB (Fig. 17) is schematically shown; and Fig. 15(C) is a schematic view of the third step along the line XVC-XVC (Fig. 18). Fig. 15(D) is a plan view schematically showing the fourth step along the line XVD-XVD (Fig. 19); Fig. 15(E) is a schematic view showing the fifth step. An end view along the line XVE-XVE (Fig. 20).

圖16,係概略性地表示本發明之實施形態2中的液晶顯示面板之製造方法之第1步驟之俯視圖。 FIG. 16 is a plan view schematically showing a first step of the method of manufacturing the liquid crystal display panel in the second embodiment of the present invention.

圖17,係概略性地表示本發明之實施形態2中的液晶顯示面板之製造方法之第2步驟之俯視圖。 Fig. 17 is a plan view schematically showing a second step of the method of manufacturing the liquid crystal display panel in the second embodiment of the present invention.

圖18,係概略性地表示本發明之實施形態2中的液晶顯示面板之製造方法之第3步驟之俯視圖。 FIG. 18 is a plan view schematically showing a third step of the method of manufacturing the liquid crystal display panel in the second embodiment of the present invention.

圖19,係概略性地表示本發明之實施形態2中的液晶顯示面板之製造方法之第4步驟之俯視圖。 FIG. 19 is a plan view schematically showing a fourth step of the method of manufacturing the liquid crystal display panel in the second embodiment of the present invention.

圖20,係概略性地表示本發明之實施形態2中的液晶顯示面板之製造方法之第5步驟之俯視圖。 FIG. 20 is a plan view schematically showing a fifth step of the method of manufacturing the liquid crystal display panel in the second embodiment of the present invention.

圖21,係概略性地表示本發明之實施形態3中的液晶顯示面板之製造方法之流程圖。 Fig. 21 is a flow chart schematically showing a method of manufacturing a liquid crystal display panel in accordance with a third embodiment of the present invention.

圖22(A),係概略性地表示本發明之實施形態3中的液晶顯示面板之製造方法之第1步驟之沿著線XXIIA-XXIIA(圖23)之端面圖;圖22(B),係概略性地表示其第2步驟之沿著線XXIIB-XXIIB(圖24)之端面圖;圖22(C),係概略性地表示其第3步驟之沿著線XXIIC-XXIIC(圖25)之端面圖;圖22(D),係概略性地表示其第4步驟之沿著線XXIID-XXIID(圖26)之端面圖;圖22(E),係概略性地表示其第5步驟之沿著線XXIIE-XXIIE(圖27)之端面圖。 Fig. 22 (A) is a plan view schematically showing an end face along the line XXIIA-XXIIA (Fig. 23) of the first step of the method for manufacturing a liquid crystal display panel according to the third embodiment of the present invention; and Fig. 22(B). The end view of the second step along the line XXIIB-XXIIB (Fig. 24) is schematically shown; Fig. 22(C) is a schematic view of the third step along the line XXIC-XXIIC (Fig. 25). Fig. 22(D) is a plan view schematically showing the fourth step along the line XXIID-XXIID (Fig. 26); Fig. 22(E) is a schematic view showing the fifth step. An end view along the line XXIIE-XXIIE (Figure 27).

圖23,係概略性地表示本發明之實施形態3中的液晶顯示面板之製造方法之第1步驟之俯視圖。 FIG. 23 is a plan view schematically showing a first step of the method of manufacturing the liquid crystal display panel in the third embodiment of the present invention.

圖24,係概略性地表示本發明之實施形態3中的液晶顯示面板之製造方法之第2步驟之俯視圖。 Fig. 24 is a plan view schematically showing a second step of the method of manufacturing the liquid crystal display panel in the third embodiment of the present invention.

圖25,係概略性地表示本發明之實施形態3中的液晶顯示面板之製造方法之第3步驟之俯視圖。 Fig. 25 is a plan view schematically showing a third step of the method of manufacturing the liquid crystal display panel in the third embodiment of the present invention.

圖26,係概略性地表示本發明之實施形態3中的液晶顯示面板之製造方法之第4步驟之俯視圖。 FIG. 26 is a plan view schematically showing a fourth step of the method of manufacturing the liquid crystal display panel in the third embodiment of the present invention.

圖27,係概略性地表示本發明之實施形態3中的液晶顯示面板之製造方法之第5步驟之俯視圖。 FIG. 27 is a plan view schematically showing a fifth step of the method of manufacturing the liquid crystal display panel in the third embodiment of the present invention.

圖28,係概略性地表示本發明之實施形態3之變形例中的液晶顯示面板之製造方法之流程圖。 FIG. 28 is a flow chart schematically showing a method of manufacturing a liquid crystal display panel in a modification of the third embodiment of the present invention.

圖29,係概略性地表示本發明之實施形態3之變形例中的液晶顯示面板之製造方法之一步驟之沿著線XXIX-XXIX(圖30)之端面圖。 Fig. 29 is a plan view schematically showing a step along the line XXIX-XXIX (Fig. 30) of a step of manufacturing a liquid crystal display panel in a modification of the third embodiment of the present invention.

圖30,係概略性地表示本發明之實施形態3之變形例中的液晶顯示面板之製造方法之一步驟之俯視圖。 FIG. 30 is a plan view schematically showing a step of a method of manufacturing a liquid crystal display panel in a modification of the third embodiment of the present invention.

圖31,係概略性地表示本發明之實施形態4中的液晶顯示面板之製造方法之流程圖。 Fig. 31 is a flow chart schematically showing a method of manufacturing a liquid crystal display panel in accordance with a fourth embodiment of the present invention.

圖32(A),係概略性地表示本發明之實施形態4中的液晶顯示面板之製造方法之第1步驟之沿著線XXXIIA-XXXIIA(圖33)之端面圖;圖32(B),係概略性地表示其第2步驟之沿著線XXXIIB-XXXIIB(圖34)之端面圖;圖32(C),係概略性地表示其第3步驟之沿著線XXXIIC-XXXIIC(圖35)之端面圖;圖32(D),係概略性地表示其第4步驟之沿著線XXXIID-XXXIID(圖36)之端面圖;圖32(E),係概略性地表示其第5步驟之沿著線XXXIIE-XXXIIE(圖37)之端面圖。 FIG. 32(A) is a cross-sectional view along line XXXIIA-XXXIIA (FIG. 33) of the first step of the method for manufacturing a liquid crystal display panel according to Embodiment 4 of the present invention; FIG. 32(B), The end view of the second step along the line XXXIIB-XXXIIB (Fig. 34) is schematically shown; Fig. 32(C) is a schematic view of the third step along the line XXXIIC-XXXIIC (Fig. 35) FIG. 32(D) schematically shows an end view along the line XXXIID-XXXIID (FIG. 36) of the fourth step; and FIG. 32(E) schematically shows the fifth step thereof. An end view along line XXXIIE-XXXIIE (Fig. 37).

圖33,係概略性地表示本發明之實施形態4中的液晶顯示面板之製造 方法之第1步驟之俯視圖。 Figure 33 is a view schematically showing the manufacture of a liquid crystal display panel in Embodiment 4 of the present invention. A top view of the first step of the method.

圖34,係概略性地表示本發明之實施形態4中的液晶顯示面板之製造方法之第2步驟之俯視圖。 Fig. 34 is a plan view schematically showing a second step of the method of manufacturing the liquid crystal display panel in the fourth embodiment of the present invention.

圖35,係概略性地表示本發明之實施形態4中的液晶顯示面板之製造方法之第3步驟之俯視圖。 35 is a plan view schematically showing a third step of the method of manufacturing the liquid crystal display panel in the fourth embodiment of the present invention.

圖36,係概略性地表示本發明之實施形態4中的液晶顯示面板之製造方法之第4步驟之俯視圖。 Fig. 36 is a plan view schematically showing a fourth step of the method of manufacturing the liquid crystal display panel in the fourth embodiment of the present invention.

圖37,係概略性地表示本發明之實施形態4中的液晶顯示面板之製造方法之第5步驟之俯視圖。 37 is a plan view schematically showing a fifth step of the method of manufacturing the liquid crystal display panel in the fourth embodiment of the present invention.

圖38,係概略性地表示本發明之實施形態4之變形例中的液晶顯示面板之製造方法之流程圖。 Fig. 38 is a flow chart schematically showing a method of manufacturing a liquid crystal display panel in a modification of the fourth embodiment of the present invention.

圖39,係概略性地表示本發明之實施形態4之變形例中的液晶顯示面板之製造方法之一步驟之沿著線XXXIX-XXXIX(圖40)之端面圖。 Fig. 39 is a plan view schematically showing a step along the line XXXIX-XXXIX (Fig. 40) of a step of manufacturing a liquid crystal display panel in a modification of the fourth embodiment of the present invention.

圖40,係概略性地表示本發明之實施形態4之變形例中的液晶顯示面板之製造方法之一步驟之俯視圖。 Fig. 40 is a plan view schematically showing a step of a method of manufacturing a liquid crystal display panel in a modification of the fourth embodiment of the present invention.

圖41,係概略性地表示本發明之實施形態5中的液晶顯示面板之製造方法之流程圖。 Fig. 41 is a flow chart schematically showing a method of manufacturing a liquid crystal display panel in accordance with a fifth embodiment of the present invention.

圖42(A),係概略性地表示本發明之實施形態6中的液晶顯示面板之製造方法中所使用之器具之構成之側視圖;圖42(B),係以圖42(A)之箭頭XLIIB之視點概略性地表示上述器具所具有之刃前端之構成之俯視圖。 Fig. 42(A) is a side view schematically showing a configuration of an apparatus used in a method of manufacturing a liquid crystal display panel according to a sixth embodiment of the present invention; and Fig. 42(B) is a view of Fig. 42(A) The viewpoint of the arrow XIIIB is a plan view schematically showing the configuration of the tip end of the blade.

圖43(A),係概略性地表示本發明之實施形態6中的液晶顯示面板之製造方法之第1步驟之俯視圖;圖43(B),係概略性地表示其第2步驟之俯視 圖。 43(A) is a plan view schematically showing a first step of the method for manufacturing a liquid crystal display panel in the sixth embodiment of the present invention, and FIG. 43(B) is a plan view schematically showing the second step. Figure.

圖44(A),係概略性地表示本發明之實施形態6之第1變形例之液晶顯示面板之製造方法之第1步驟之俯視圖;圖44(B),係概略性地表示其第2步驟之俯視圖。 FIG. 44(A) is a plan view schematically showing a first step of a method of manufacturing a liquid crystal display panel according to a first modification of the sixth embodiment of the present invention, and FIG. 44(B) is a view schematically showing the second step. Top view of the steps.

圖45,係概略性地表示本發明之實施形態6之第2變形例之液晶顯示面板之製造方法之俯視圖。 Fig. 45 is a plan view schematically showing a method of manufacturing a liquid crystal display panel according to a second modification of the sixth embodiment of the present invention.

圖46,係概略性地表示本發明之實施形態6之第3變形例之液晶顯示面板之製造方法之俯視圖。 Fig. 46 is a plan view schematically showing a method of manufacturing a liquid crystal display panel according to a third modification of the sixth embodiment of the present invention.

圖47,係概略性地表示本發明之實施形態7中的液晶顯示面板之製造方法之第1步驟之俯視圖。 Fig. 47 is a plan view schematically showing a first step of the method of manufacturing the liquid crystal display panel in the seventh embodiment of the present invention.

圖48,係概略性地表示本發明之實施形態7中的液晶顯示面板之製造方法之第2步驟之俯視圖。 Fig. 48 is a plan view schematically showing a second step of the method of manufacturing the liquid crystal display panel in the seventh embodiment of the present invention.

圖49,係概略性地表示本發明之實施形態7中的液晶顯示面板之製造方法之第3步驟之俯視圖。 Fig. 49 is a plan view schematically showing a third step of the method of manufacturing the liquid crystal display panel in the seventh embodiment of the present invention.

圖50,係概略性地表示本發明之實施形態7之第2變形例之液晶顯示面板之製造方法之俯視圖。 Fig. 50 is a plan view schematically showing a method of manufacturing a liquid crystal display panel according to a second modification of the seventh embodiment of the present invention.

圖51(A),係概略性地表示本發明之實施形態8中的液晶顯示面板之製造方法之第1步驟之俯視圖;圖51(B),係概略性地表示其第2步驟之俯視圖。 Fig. 51 (A) is a plan view schematically showing a first step of the method for producing a liquid crystal display panel in the eighth embodiment of the present invention, and Fig. 51 (B) is a plan view schematically showing the second step.

圖52(A),係概略性地表示本發明之實施形態9中的液晶顯示面板之製造方法之第1步驟之俯視圖;圖52(B),係概略性地表示其第2步驟之俯視圖。 Fig. 52(A) is a plan view schematically showing a first step of the method for manufacturing a liquid crystal display panel in the ninth embodiment of the present invention, and Fig. 52(B) is a plan view schematically showing the second step.

圖53,係概略性地表示本發明之實施形態9之變形例之液晶顯示面板之製造方法之俯視圖。 Fig. 53 is a plan view schematically showing a method of manufacturing a liquid crystal display panel according to a modification of the ninth embodiment of the present invention.

圖54(A),係概略性地表示本發明之實施形態10中的液晶顯示面板之製造方法中所使用之器具之構成之側視圖;圖54(B),係以圖54(A)之箭頭LIVB之視點概略性地表示上述器具所具有之刃前端之構成之俯視圖。 Fig. 54(A) is a side view schematically showing a configuration of an apparatus used in a method of manufacturing a liquid crystal display panel in accordance with a tenth embodiment of the present invention; and Fig. 54(B) is a view of Fig. 54(A) The viewpoint of the arrow LIVB schematically shows a plan view of the configuration of the tip end of the blade.

以下,根據圖式針對本發明之實施形態進行說明。另外,在以下之圖式中,對相同或者相當之部分標記相同參照編號,其說明則不再重複。 Hereinafter, embodiments of the present invention will be described based on the drawings. In the following figures, the same or corresponding parts are denoted by the same reference numerals, and the description will not be repeated.

(實施形態1) (Embodiment 1)

參照圖1(A)及(B),本實施形態之LCD面板101,具有CF(濾光片)基板11(本實施形態中的第1脆性基板)、TFT(薄膜電晶體)基板12(本實施形態中的第2脆性基板)、密封部21、及液晶層20。 1(A) and (B), the LCD panel 101 of the present embodiment includes a CF (filter) substrate 11 (first brittle substrate in the present embodiment) and a TFT (thin film transistor) substrate 12 (this). The second brittle substrate in the embodiment, the sealing portion 21, and the liquid crystal layer 20.

CF基板11,作為主面,而具有內面SF1(本實施形態中的第1主面)及其相反之外面SF2(本實施形態中的第2主面)。CF基板11,具有與內面SF1垂直之厚度方向DT。CF基板11,具體而言係玻璃基板,且具有濾光片、黑矩陣(black matrix)及定向膜(不圖示)。TFT基板12,作為主面,而具有內面SF3(本實施形態中的第3主面)及其相反之外面SF4(本實施形態中的第4主面)。TFT基板12,具有與內面SF3垂直之厚度方向DT。TFT基板12,具體而言係玻璃基板,且具有配線、主動元件、電極及定向膜(不圖示)。 The CF substrate 11 has an inner surface SF1 (first main surface in the present embodiment) and an opposite outer surface SF2 (second main surface in the present embodiment) as a main surface. The CF substrate 11 has a thickness direction DT perpendicular to the inner surface SF1. The CF substrate 11, specifically, a glass substrate, has a filter, a black matrix, and an alignment film (not shown). The TFT substrate 12 has an inner surface SF3 (the third main surface in the present embodiment) and an opposite outer surface SF4 (the fourth main surface in the present embodiment) as a main surface. The TFT substrate 12 has a thickness direction DT perpendicular to the inner surface SF3. The TFT substrate 12 is specifically a glass substrate and has wiring, an active element, an electrode, and an alignment film (not shown).

CF基板11及TFT基板12,以內面SF1及SF3相對向之方 式,隔著密封部21而相互貼合。液晶層20,配置在內面SF1及SF3間之間隙內,並藉由密封部21而密封。TFT基板12之內面SF3,具有由液晶層20或密封部21覆蓋的部分。此外,內面SF3亦可具有露出之端子區域SF3e。 端子區域SF3e,可使用於將TFT基板12與外部配線連接。 The CF substrate 11 and the TFT substrate 12 face each other with the inner faces SF1 and SF3 The molds are bonded to each other via the sealing portion 21. The liquid crystal layer 20 is disposed in the gap between the inner surfaces SF1 and SF3, and is sealed by the sealing portion 21. The inner surface SF3 of the TFT substrate 12 has a portion covered by the liquid crystal layer 20 or the sealing portion 21. Further, the inner surface SF3 may have an exposed terminal region SF3e. The terminal region SF3e can be used to connect the TFT substrate 12 to external wiring.

接下來,針對LCD面板101之製造方法中的基板刻劃方法, 於以下進行說明。 Next, with respect to the substrate scribing method in the manufacturing method of the LCD panel 101, It is explained below.

參照圖3(A)及圖4,準備CF基板11(圖2:步驟S11)。在此 時點,CF基板11係包含用於獲得多個最終製品而切出之多個區域的基板(母基板)。接下來,將刃前端按壓在CF基板11之內面SF1(圖2:步驟S12)。 藉由使已按壓之刃前端在CF基板11之內面SF1上滑動而在CF基板11之內面SF1上使塑性變形產生,藉此形成具有槽形狀之溝槽線TL(圖2:步驟S13)。 Referring to Fig. 3 (A) and Fig. 4, a CF substrate 11 is prepared (Fig. 2: step S11). here At this time, the CF substrate 11 is a substrate (mother substrate) including a plurality of regions cut out for obtaining a plurality of final products. Next, the tip end of the blade is pressed against the inner surface SF1 of the CF substrate 11 (FIG. 2: Step S12). Plastic deformation is generated on the inner surface SF1 of the CF substrate 11 by sliding the tip end of the pressed blade on the inner surface SF1 of the CF substrate 11, thereby forming a groove line TL having a groove shape (FIG. 2: Step S13) ).

參照圖8(A),CF基板11之溝槽線TL以獲得無裂紋狀態之 方式形成。所謂的無裂紋狀態,係在溝槽線TL之緊鄰下方,在與溝槽線TL之延伸方向(與圖8(A)所示之剖面垂直之方向)交叉之方向DC,基板(圖中CF基板11)連續性地相連之狀態。在無裂紋狀態,雖形成由塑性變形所產生之溝槽線TL,但未形成有沿該溝槽線TL之裂紋。據此,即使如習知的裂斷步驟般對基板施加單純產生彎曲力矩般之外力,亦不容易產生沿溝槽線TL之分斷。因此,在無裂紋狀態中不進行沿溝槽線TL之裂斷步驟。 Referring to FIG. 8(A), the trench line TL of the CF substrate 11 is obtained in a crack-free state. The way is formed. The so-called crack-free state is in the direction immediately adjacent to the groove line TL, in the direction of the direction in which the groove line TL extends (the direction perpendicular to the section shown in Fig. 8(A)), and the substrate (CF in the figure) The substrate 11) is continuously connected. In the crack-free state, although the groove line TL resulting from the plastic deformation is formed, the crack along the groove line TL is not formed. According to this, even if a force other than the bending moment is simply applied to the substrate as in the conventional breaking step, the breaking along the groove line TL is less likely to occur. Therefore, the cracking step along the groove line TL is not performed in the crack-free state.

參照圖3(B)及圖5,準備TFT基板12(圖2:步驟S21)。在 此時點,TFT基板12係包含用於獲得多個最終製品而切出之多個區域的基 板(母基板)。接下來,將刃前端按壓在TFT基板12之外面SF4(圖2:步驟S22)。藉由使已按壓之刃前端在TFT基板12之外面SF4上滑動而在TFT基板12之外面SF4上使塑性變形產生,藉此形成具有槽形狀之溝槽線TL(圖2:步驟S23)。 Referring to Fig. 3 (B) and Fig. 5, a TFT substrate 12 is prepared (Fig. 2: step S21). in At this point, the TFT substrate 12 includes a base of a plurality of regions cut out for obtaining a plurality of final products. Board (mother substrate). Next, the tip end of the blade is pressed against the outer surface SF4 of the TFT substrate 12 (FIG. 2: Step S22). Plastic deformation is generated on the outer surface SF4 of the TFT substrate 12 by sliding the tip end of the pressed blade on the outer surface SF4 of the TFT substrate 12, thereby forming a groove line TL having a groove shape (FIG. 2: step S23).

參照圖3(C)及圖6,接下來,以CF基板11之內面SF1與 TFT基板12之內面SF3相對向之方式將CF基板11及TFT基板12相互貼合(圖2:步驟S40)。藉此,獲得CF基板11及TFT基板12之積層體之單位基板10。形成於CF基板11之溝槽線TL被TFT基板12覆蓋。在本實施形態中,形成於CF基板11之溝槽線TL部分地被TFT基板12覆蓋。換言之,形成於CF基板11之內面SF1上的溝槽線TL部分地露出。 Referring to FIG. 3(C) and FIG. 6, next, the inner surface SF1 of the CF substrate 11 is used. The CF substrate 11 and the TFT substrate 12 are bonded to each other with the inner surface SF3 of the TFT substrate 12 facing each other (FIG. 2: Step S40). Thereby, the unit substrate 10 of the laminated body of the CF substrate 11 and the TFT substrate 12 is obtained. The trench line TL formed on the CF substrate 11 is covered by the TFT substrate 12. In the present embodiment, the trench line TL formed on the CF substrate 11 is partially covered by the TFT substrate 12. In other words, the groove line TL formed on the inner surface SF1 of the CF substrate 11 is partially exposed.

參照圖3(D)及圖7,接下來,沿著CF基板11及TFT基板12之溝槽線TL,在基板上形成裂紋延伸之線即裂紋線CL(圖2:步驟S60)。裂紋線CL之形成,係藉由沿著溝槽線TL使厚度方向中的基板之裂紋伸展而進行。 Referring to Fig. 3(D) and Fig. 7, next, along the groove line TL of the CF substrate 11 and the TFT substrate 12, a crack line CL which is a line extending from the crack is formed on the substrate (Fig. 2: Step S60). The formation of the crack line CL is performed by stretching the crack of the substrate in the thickness direction along the groove line TL.

參照圖8(B),藉由裂紋線CL,切斷在溝槽線TL之緊鄰下方、CF基板11在與溝槽線TL之延伸方向(與圖8(B)所示之剖面垂直之方向)交叉之方向DC連續的相連。此處所謂的「連續的相連」,換言之,係未被裂紋中斷之相連。另外,如上所述,在切斷連續的相連之狀態中,亦可隔著裂紋線CL之裂紋而基板之部分彼此相接觸。關於TFT基板12亦相同。 Referring to Fig. 8(B), the crack line CL is cut immediately below the groove line TL, and the CF substrate 11 is in a direction perpendicular to the direction in which the groove line TL extends (the cross section shown in Fig. 8(B)). The direction of intersection is continuously connected by DC. The so-called "continuous connection" here, in other words, is not connected by crack interruption. Further, as described above, in the state in which the continuous connection is cut, the portions of the substrate may be in contact with each other via the crack of the crack line CL. The same applies to the TFT substrate 12.

CF基板11之裂紋線CL之形成,係藉由在露出之溝槽線TL之端部對CF基板11施加如使溝槽線TL附近之內部應力之挫曲(buckle)解放般之應力而開始。應力之施加,例如,可藉由在所形成之溝槽線TL上再度 以刃前端按壓所產生之外部應力之施加、或是雷射光之照射等所產生之加熱而進行。藉此,從CF基板11之溝槽線TL之中露出之部分,往被TFT基板12覆蓋之部分,沿溝槽線TL使裂紋伸展。關於TFT基板12亦相同。 The formation of the crack line CL of the CF substrate 11 is started by applying a stress such as a buckling of the internal stress in the vicinity of the groove line TL to the CF substrate 11 at the end portion of the exposed groove line TL. . The application of stress, for example, can be repeated by forming the groove line TL It is carried out by application of external stress generated by blade tip pressing or heating by laser irradiation or the like. Thereby, the portion exposed from the trench line TL of the CF substrate 11 is spread toward the portion covered by the TFT substrate 12 along the trench line TL. The same applies to the TFT substrate 12.

接下來,針對已進行上述刻劃步驟之單位基板10(圖3(D)) 之裂斷步驟,於以下進行說明。 Next, the unit substrate 10 on which the above scribing step has been performed (Fig. 3(D)) The breaking step is explained below.

參照圖9(A),以未形成有裂紋線CL之面即CF基板11之外 面SF2露出之方式,在已貼於平台60之裂斷用墊61上配置單位基板10。 Referring to FIG. 9(A), the surface of the CF substrate 11 which is not formed with the crack line CL is formed. The unit substrate 10 is placed on the cracking mat 61 attached to the stage 60 so that the surface SF2 is exposed.

接著,在外面SF2上藉由局部地施加負載而將CF基板11 及TFT基板12彎曲。具體而言,在外面SF2上之裂斷部位B0~B2依序施加負載。裂斷部位B0,在俯視觀察下,與CF基板11及TFT基板12各個的裂紋線CL重疊,據此,沿著CF基板11及TFT基板12各個的裂紋線CL將CF基板11及TFT基板12分斷。裂斷部位B1,在俯視觀察下,僅與CF基板11之裂紋線CL重疊,據此,沿著CF基板11之裂紋線CL將CF基板11分斷。裂斷部位B2,在俯視觀察下,僅與TFT基板12之裂紋線CL重疊,據此,沿著TFT基板12之裂紋線CL將TFT基板12分斷。 Next, the CF substrate 11 is applied on the outer surface SF2 by locally applying a load. And the TFT substrate 12 is bent. Specifically, the load is sequentially applied to the fractured portions B0 to B2 on the outer surface SF2. The cracked portion B0 overlaps with the crack line CL of each of the CF substrate 11 and the TFT substrate 12 in a plan view, whereby the CF substrate 11 and the TFT substrate 12 are formed along the crack line CL of each of the CF substrate 11 and the TFT substrate 12. Break. The cracked portion B1 overlaps only the crack line CL of the CF substrate 11 in a plan view, whereby the CF substrate 11 is broken along the crack line CL of the CF substrate 11. The cracked portion B2 overlaps only the crack line CL of the TFT substrate 12 in a plan view, whereby the TFT substrate 12 is separated along the crack line CL of the TFT substrate 12.

參照圖10(A)及(B),可藉由使用裂斷桿71而對裂紋線CL整 體施加負載LD。在該情形,大致同時進行沿裂紋線CL整體之分斷。參照圖11(A)及(B),或者可藉由使用裂斷滾子72施加負載LD。在該情形,伴隨在外面SF2上之旋轉RT之裂斷滾子72之行進PR,緩步地進行沿裂紋線CL之分斷。 Referring to Figures 10(A) and (B), the crack line CL can be completed by using the split rod 71. The body applies a load LD. In this case, the division along the entire crack line CL is performed substantially simultaneously. Referring to Figures 11 (A) and (B), the load LD may be applied by using a split roller 72. In this case, the break along the crack line CL is gradually performed along with the travel PR of the splitting roller 72 of the rotation RT on the outer surface SF2.

參照圖9(B)及圖12,如上所述,作為步驟S90(圖2),係沿 著CF基板11之裂紋線CL將CF基板11分斷,此外,沿著TFT基板12之 裂紋線CL將TFT基板12分斷。亦即,進行單位基板10之裂斷步驟。 Referring to FIG. 9(B) and FIG. 12, as described above, as step S90 (FIG. 2), the edge is along The crack line CL of the CF substrate 11 breaks the CF substrate 11 and, in addition, along the TFT substrate 12 The crack line CL breaks the TFT substrate 12. That is, the breaking step of the unit substrate 10 is performed.

再次參照圖1(B),接下來,藉由在CF基板11及TFT基板 12間之間隙內注入液晶而形成液晶層20。藉由以上方式,可從一單位基板10(圖9(A))獲得多個LCD面板101。 Referring again to FIG. 1(B), next, by using the CF substrate 11 and the TFT substrate A liquid crystal layer 20 is formed by injecting liquid crystal into the gap between the twelve. By the above manner, a plurality of LCD panels 101 can be obtained from one unit substrate 10 (Fig. 9(A)).

接下來,針對第1比較例進行說明。參照圖13(A)及(B),將 CF基板11及TFT基板12相互貼合。接著,在CF基板11及TFT基板12之各個外面SF2及SF4形成刻劃線SL。刻劃線SL,可藉由公知的典型刻劃技術而形成,且具有在刻劃時所形成之垂直裂紋之線。亦即,刻劃線SL包含裂紋線。接著,沿刻劃線SL將CF基板11及TFT基板12分斷。此時,在沿CF基板11之刻劃線SL之分斷中,往TFT基板12之外面SF4上之負載施加L1是必要的,在沿TFT基板12之刻劃線SL之分斷中,往CF基板11之外面SF2上之負載施加L2是必要的。因此在裂斷步驟中必須使單位基板10反轉。 Next, the first comparative example will be described. Referring to Figures 13(A) and (B), The CF substrate 11 and the TFT substrate 12 are bonded to each other. Next, the scribe lines SL are formed on the outer surfaces SF2 and SF4 of the CF substrate 11 and the TFT substrate 12. The score line SL can be formed by a well-known typical scribing technique and has a line of vertical cracks formed during scoring. That is, the score line SL includes a crack line. Next, the CF substrate 11 and the TFT substrate 12 are separated along the scribe line SL. At this time, in the division of the scribe line SL along the CF substrate 11, it is necessary to apply L1 to the load on the outer surface SF4 of the TFT substrate 12, and in the division along the scribe line SL along the TFT substrate 12, It is necessary to apply L2 to the load on the outer surface SF2 of the CF substrate 11. Therefore, the unit substrate 10 must be reversed in the cracking step.

對此,根據本實施形態,如在圖9(A)中所說明般,負載施加 僅在CF基板11之外面SF2上進行。據此,無需使單位基板10反轉。藉此,能夠更容易地進行裂斷步驟。例如,能夠使用於裂斷步驟之裝置簡約化。 此外,能夠縮短裂斷步驟所需之時間。 In contrast, according to the present embodiment, load application is as described in FIG. 9(A). It is performed only on the outer surface SF2 of the CF substrate 11. According to this, it is not necessary to invert the unit substrate 10. Thereby, the breaking step can be performed more easily. For example, the device that can be used in the cracking step can be simplified. In addition, the time required for the cracking step can be shortened.

接下來,針對第2比較例進行說明。參照圖14(A)及(B),個別地準備形成有刻劃線SL之CF基板11與形成有刻劃線SL之TFT基板12。參照圖14(C),將CF基板11及TFT基板12相互貼合。之後,以與圖9(A)同樣之方法,沿刻劃線SL將CF基板11及TFT基板12分斷。在本比較例中,由於在形成有伴隨垂直裂紋之刻劃線SL後,將CF基板11及TFT基板 12貼合,因此,因刻劃線SL之裂紋往厚度方向無意圖地伸展,而在較所意圖之時點更早前,將使CF基板11及TFT基板12之至少任某一者容易分斷。 其結果為,將難以繼續進行LCD面板101(圖1(B))之製造步驟。 Next, a second comparative example will be described. Referring to FIGS. 14(A) and 14(B), the CF substrate 11 on which the scribe line SL is formed and the TFT substrate 12 on which the scribe line SL is formed are separately prepared. Referring to Fig. 14(C), the CF substrate 11 and the TFT substrate 12 are bonded to each other. Thereafter, the CF substrate 11 and the TFT substrate 12 are separated along the scribe line SL in the same manner as in FIG. 9(A). In the present comparative example, the CF substrate 11 and the TFT substrate are formed after the scribe line SL with the vertical crack is formed. 12 is attached, and therefore, the crack of the scribe line SL is unintentionally extended in the thickness direction, and at least one of the CF substrate 11 and the TFT substrate 12 is easily broken off earlier than the intended time. . As a result, it will be difficult to continue the manufacturing steps of the LCD panel 101 (Fig. 1(B)).

對此,根據本實施形態,作為限制分斷CF基板11之位置 的線,係形成在其緊鄰下方不具有裂紋之溝槽線TL(圖8(A))。被使用作為分斷之直接開端的裂紋線CL(圖8(B)),係在溝槽線TL之形成後形成。藉此,溝槽線TL之形成後且裂紋線CL之形成前的CF基板11,其分斷位置由溝槽線TL限制且尚未形成裂紋線CL,因此處於不容易產生分斷之穩定狀態(無裂紋狀態)。在該穩定狀態中,在CF基板11之溝槽線TL、亦即限制分斷CF基板11之位置之線上,配置TFT基板12。之後,藉由沿溝槽線TL使裂紋伸展而形成被使用作為分斷之直接開端的裂紋線CL。藉此,亦能夠在被TFT基板12所覆蓋之位置形成裂紋線CL。如以上說明般,在與CF基板11及TFT基板12之貼合相關之作業中,能夠避免CF基板11無意圖地分斷,且亦能夠在CF基板11上之被TFT基板12所覆蓋的部分,設置供進行沿其分斷的線。 On the other hand, according to the present embodiment, the position at which the CF substrate 11 is cut off is restricted. The line is formed in a groove line TL having no crack immediately below it (Fig. 8(A)). The crack line CL (Fig. 8(B)) used as the direct start of the division is formed after the formation of the groove line TL. Thereby, after the formation of the trench line TL and before the formation of the crack line CL, the breaking position of the CF substrate 11 is restricted by the groove line TL and the crack line CL is not formed, so that it is in a stable state in which breakage is unlikely to occur ( No cracking state). In this steady state, the TFT substrate 12 is placed on the line of the trench line TL of the CF substrate 11, that is, the position at which the CF substrate 11 is restricted from being cut. Thereafter, the crack line CL which is used as the direct opening end of the breaking is formed by stretching the crack along the groove line TL. Thereby, the crack line CL can also be formed at the position covered by the TFT substrate 12. As described above, in the work relating to the bonding of the CF substrate 11 and the TFT substrate 12, the CF substrate 11 can be prevented from being unintentionally broken, and the portion of the CF substrate 11 covered by the TFT substrate 12 can be prevented. , set the line for the break along it.

此外,同樣地,在與貼合相關之作業中,能夠避免TFT基 板12無意圖地分斷,且亦能夠在TFT基板12上之被CF基板11所覆蓋的部分,設置供進行沿其分斷的線。 In addition, similarly, in the work related to bonding, the TFT base can be avoided. The board 12 is unintentionally broken, and can also be provided on a portion of the TFT substrate 12 covered by the CF substrate 11 to be cut along the line.

另外,本實施形態中的裂紋線CL之形成步驟,與習知所謂 的裂斷步驟在本質上是不同的。裂斷步驟,係使既已形成之裂紋往厚度方向進一步伸展。另一方面,本實施形態中的裂紋線CL之形成步驟,係具有從藉由溝槽線TL之形成而獲得之無裂紋狀態往具有裂紋之狀態之變化。該 變化,藉由無裂紋狀態所具有之內部應力開放而產生。溝槽線TL形成時之塑性變形、及因溝槽線TL之形成而生成之內部應力之大小或方向性等之狀態,在使用旋轉刀刃之轉動的情形、與如本實施形態般使用刃前端之滑動的情形是有所不同的,在使用刃前端之滑動的情形,成為可在較寬之刻劃條件中使裂紋容易產生。此外,對於內部應力之開放,某種開端是必要的,且如上述般來自外部之應力施加而造成的溝槽線TL上之裂紋產生,係作為這種開端而起作用。溝槽線TL及裂紋線CL較佳的形成方法之細節將於下述。 Further, the step of forming the crack line CL in the present embodiment is similar to the conventional method. The breaking steps are essentially different. The cracking step causes the crack that has formed to be further extended in the thickness direction. On the other hand, the step of forming the crack line CL in the present embodiment has a change from the crack-free state obtained by the formation of the groove line TL to the state having the crack. The The change is caused by the opening of the internal stress in the crack-free state. In the state of the plastic deformation at the time of formation of the groove line TL and the magnitude or directivity of the internal stress generated by the formation of the groove line TL, the rotation of the rotary blade is used, and the tip of the blade is used as in the present embodiment. The case of sliding is different, and in the case of using the sliding of the tip end of the blade, cracks can be easily generated in a wide scribe condition. Further, for the opening of the internal stress, a certain beginning is necessary, and as described above, the crack on the groove line TL due to the external stress application acts as such an opening. Details of a preferred method of forming the trench line TL and the crack line CL will be described below.

(實施形態2) (Embodiment 2)

圖15(A)~(E),分別係概略性地表示本實施形態中的液晶顯示面板101(圖1(A)及(B))之製造方法之第1~第5步驟之剖面圖。圖15(A)~(E)各個的剖面,係分別沿線XVA-XVA(圖16)、線XVB-XVB(圖17)、線XVC-XVC(圖18)、線XVD-XVD(圖19)及線XVE-XVE(圖20)。另外,在本實施形態中,與實施形態1不同,TFT基板12對應第1脆性基板,CF基板11對應第2脆性基板。此外,內面SF3對應第1主面,外面SF4對應第2主面,內面SF1對應第3主面,外面SF2對應第4主面。 15(A) to 15(E) are cross-sectional views schematically showing first to fifth steps of the manufacturing method of the liquid crystal display panel 101 (Figs. 1(A) and (B)) of the present embodiment. The cross sections of Figs. 15(A) to (E) are along the line XVA-XVA (Fig. 16), line XVB-XVB (Fig. 17), line XVC-XVC (Fig. 18), and line XVD-XVD (Fig. 19). And line XVE-XVE (Figure 20). Further, in the present embodiment, unlike the first embodiment, the TFT substrate 12 corresponds to the first brittle substrate, and the CF substrate 11 corresponds to the second brittle substrate. Further, the inner surface SF3 corresponds to the first main surface, the outer surface SF4 corresponds to the second main surface, the inner surface SF1 corresponds to the third main surface, and the outer surface SF2 corresponds to the fourth main surface.

在本實施形態中,TFT基板12之溝槽線TL形成於內面SF3上(圖15(A)),此外,CF基板11之溝槽線TL形成於外面SF2上(圖15(B))。藉此,TFT基板12之裂紋線CL形成於內面SF3上,此外,CF基板11之裂紋線CL形成於外面SF2上(圖15(D))。作為步驟S90(圖2)之裂斷方法本身係與實施形態1之圖9(A)大致相同,但負載施加並非在外面SF2上進行, 而是在外面SF4上進行。 In the present embodiment, the groove line TL of the TFT substrate 12 is formed on the inner surface SF3 (FIG. 15(A)), and the groove line TL of the CF substrate 11 is formed on the outer surface SF2 (FIG. 15(B)). . Thereby, the crack line CL of the TFT substrate 12 is formed on the inner surface SF3, and the crack line CL of the CF substrate 11 is formed on the outer surface SF2 (FIG. 15(D)). The cracking method itself in step S90 (Fig. 2) is substantially the same as Fig. 9(A) of the first embodiment, but the load application is not performed on the outer surface SF2. It is done on the outside SF4.

另外,關於上述以外之構成,由於係與上述實施形態1之構 成大致相同,因此對相同或相對應之元件標記相同符號,且不重複其說明。 In addition, the configuration other than the above is based on the configuration of the first embodiment described above. The same or corresponding elements are denoted by the same reference numerals and the description thereof is not repeated.

亦能夠藉由本實施形態,獲得與實施形態1大致同樣之效 果。此外,根據本實施形態,能夠取代因配置濾光片及黑矩陣等而大多具有複雜之構成的內面SF1,在外面SF2配置溝槽線TL。藉此,能夠穩定地形成CF基板11之溝槽線TL。 According to this embodiment, the same effect as that of the first embodiment can be obtained. fruit. Further, according to the present embodiment, the groove surface TL can be disposed on the outer surface SF2 instead of the inner surface SF1 having a complicated structure in which a filter, a black matrix, or the like is disposed. Thereby, the groove line TL of the CF substrate 11 can be stably formed.

(實施形態3) (Embodiment 3)

圖21,係概略性地表示本實施形態中的LCD面板101(圖1(A)及(B))之製造方法之流程圖。圖22(A)~(E)之各個剖面,為分別沿著線XXIIA-XXIIA(圖23)、線XXIIB-XXIIB(圖24)、線XXIIC-XXIIC(圖25)、線XXIID-XXIID(圖26)、及線XXIIE-XXIIE(圖27)。 Fig. 21 is a flow chart schematically showing a method of manufacturing the LCD panel 101 (Figs. 1 (A) and (B)) in the present embodiment. 22(A) to (E) are respectively along the line XXIIA-XXIIA (Fig. 23), line XXIIB-XXIIB (Fig. 24), line XXIIC-XXIIC (Fig. 25), line XXIID-XXIID (Fig. 26), and line XXIIE-XXIIE (Figure 27).

參照圖22(A)及圖23,藉由與實施形態1同樣之步驟S11~S13(圖21),準備形成有溝槽線TL之CF基板11。 Referring to Fig. 22 (A) and Fig. 23, the CF substrate 11 on which the groove lines TL are formed is prepared by the steps S11 to S13 (Fig. 21) similar to those in the first embodiment.

參照圖22(B)及圖24,準備TFT基板12(圖21:步驟S21)。以CF基板11之內面SF1與TFT基板12之內面SF3相對向之方式,將CF基板11及TFT基板12相互貼合(圖21:步驟S40)。藉此,獲得CF基板11及TFT基板12之積層體之單位基板10。形成於CF基板11之溝槽線TL被TFT基板12覆蓋。在本實施形態中,形成於CF基板11之溝槽線TL部分地被TFT基板12覆蓋。換言之,形成於CF基板11之內面SF1上的溝槽線TL部分地露出。 Referring to Fig. 22 (B) and Fig. 24, the TFT substrate 12 is prepared (Fig. 21: step S21). The CF substrate 11 and the TFT substrate 12 are bonded to each other such that the inner surface SF1 of the CF substrate 11 faces the inner surface SF3 of the TFT substrate 12 (FIG. 21: Step S40). Thereby, the unit substrate 10 of the laminated body of the CF substrate 11 and the TFT substrate 12 is obtained. The trench line TL formed on the CF substrate 11 is covered by the TFT substrate 12. In the present embodiment, the trench line TL formed on the CF substrate 11 is partially covered by the TFT substrate 12. In other words, the groove line TL formed on the inner surface SF1 of the CF substrate 11 is partially exposed.

參照圖22(C)及圖25,接下來,沿著CF基板11之溝槽線TL形成裂紋線CL(圖21:步驟S61)。 Referring to Fig. 22(C) and Fig. 25, next, a crack line CL is formed along the groove line TL of the CF substrate 11 (Fig. 21: step S61).

參照圖22(D)及圖26,接下來,在TFT基板12之外面SF4上形成刻劃線SL(圖21:步驟S72)。刻劃線SL,如上所述,包含在刻劃時所形成之垂直裂紋之線(裂紋線)。刻劃線SL,藉由沿著供形成其之線而在TFT基板12之外面SF4上使刃前端位移而形成。 Referring to Fig. 22 (D) and Fig. 26, next, a scribe line SL is formed on the outer surface SF4 of the TFT substrate 12 (Fig. 21: step S72). The score line SL, as described above, contains a line (crack line) of a vertical crack formed at the time of scribing. The scribe line SL is formed by displacing the tip end of the blade on the outer surface SF4 of the TFT substrate 12 along the line on which the line is formed.

進一步參照圖22(E)及圖27,作為步驟S90(圖21),係沿著CF基板11之裂紋線CL將CF基板11分斷,此外,沿著TFT基板12之刻劃線SL將TFT基板12分斷。另外,分斷之方法,係與圖9(A)大致相同。 Referring further to FIGS. 22(E) and 27, in step S90 (FIG. 21), the CF substrate 11 is cut along the crack line CL of the CF substrate 11, and further, the TFT is formed along the scribe line SL of the TFT substrate 12. The substrate 12 is broken. Further, the method of breaking is substantially the same as that of Fig. 9(A).

再次參照圖1(B),接下來藉由在CF基板11及TFT基板12間之間隙內注入液晶而形成液晶層20。藉由以上方式,可從一單位基板10(圖22(D))獲得多個LCD面板101。 Referring again to FIG. 1(B), the liquid crystal layer 20 is formed by injecting liquid crystal into the gap between the CF substrate 11 and the TFT substrate 12. By the above manner, a plurality of LCD panels 101 can be obtained from one unit substrate 10 (Fig. 22(D)).

另外,關於上述以外之構成,由於與上述之實施形態1之構成大致相同,因此針對相同或相對應之元件標記相同符號,且不重複其說明。 The components other than the above are substantially the same as those of the above-described first embodiment. Therefore, the same or corresponding elements are denoted by the same reference numerals and the description thereof will not be repeated.

藉由本實施形態,亦可獲得與實施形態1大致相同的效果。 According to this embodiment, substantially the same effects as those of the first embodiment can be obtained.

此外,根據本實施形態,在形成刻劃線SL之時點,CF基板11及TFT基板12既已相互貼合,而進一步地在CF基板11形成裂紋線CL。據此,即使刻劃線SL之垂直裂紋因某種原因而伸展而導致沿刻劃線SL之分斷無意圖地產生,一般而言也尤其無礙於事。 Further, according to the present embodiment, at the time of forming the scribe line SL, the CF substrate 11 and the TFT substrate 12 are bonded to each other, and the crack line CL is further formed on the CF substrate 11. Accordingly, even if the vertical crack of the score line SL is stretched for some reason, the break along the score line SL is unintentionally generated, and in general, it is particularly uncomfortable.

此外,TFT基板12之刻劃線SL,並非形成在因配置TFT等而大多具有複雜之構成的內面SF3,而是形成在外面SF4。藉此,能夠穩定 地形成刻劃線SL。 In addition, the scribe line SL of the TFT substrate 12 is not formed on the inner surface SF3 which is often complicated by a TFT or the like, but is formed on the outer surface SF4. Thereby, it can be stabilized The ground line is formed with a score line SL.

參照圖28,在本實施形態之變形例中,上述之步驟S61及 S72(圖21)之順序可交換。圖29及圖30,係概略性地表示在以步驟S72形成刻劃線SL之時點之構成。 Referring to Fig. 28, in a modification of the embodiment, the above-described step S61 and The order of S72 (Fig. 21) can be exchanged. FIG. 29 and FIG. 30 schematically show the configuration at the time when the scribe line SL is formed in step S72.

(實施形態4) (Embodiment 4)

圖31,係概略性地表示本實施形態中的LCD面板101(圖1(A)及(B))之製造方法之流程圖。圖32(A)~(E)之各個剖面,為分別沿著線XXXIIA-XXXIIA(圖33)、線XXXIIB-XXXIIB(圖34)、線XXXIIC-XXXIIC(圖35)、線XXXIID-XXXIID(圖36)、及線XXXIIE-XXXIIE(圖37)。 Fig. 31 is a flow chart schematically showing a method of manufacturing the LCD panel 101 (Figs. 1 (A) and (B)) in the present embodiment. 32(A) to (E) are respectively along the line XXXIIA-XXXIIA (Fig. 33), line XXXIIB-XXXIIB (Fig. 34), line XXXIIC-XXXIIC (Fig. 35), line XXXIID-XXXIID (Fig. 36), and line XXXIIE-XXXIIE (Figure 37).

參照圖32(A)及圖33,藉由與實施形態1同樣之步驟S21~S23(圖31),準備形成有溝槽線TL之TFT基板12。 Referring to Fig. 32 (A) and Fig. 33, the TFT substrate 12 on which the trench lines TL are formed is prepared by the steps S21 to S23 (Fig. 31) similar to those in the first embodiment.

參照圖32(B)及圖34,準備CF基板11(圖31:步驟S11)。以CF基板11之內面SF1與TFT基板12之內面SF3相對向之方式,將CF基板11及TFT基板12相互貼合(圖31:步驟S40)。藉此,獲得CF基板11及TFT基板12之積層體之單位基板10。形成於TFT基板12之溝槽線TL被CF基板11覆蓋。在本實施形態中,形成於TFT基板12之溝槽線TL部分地被CF基板11覆蓋。換言之,形成於TFT基板12之內面SF3上的溝槽線TL部分地露出。 Referring to Fig. 32 (B) and Fig. 34, a CF substrate 11 is prepared (Fig. 31: Step S11). The CF substrate 11 and the TFT substrate 12 are bonded to each other such that the inner surface SF1 of the CF substrate 11 faces the inner surface SF3 of the TFT substrate 12 (FIG. 31: Step S40). Thereby, the unit substrate 10 of the laminated body of the CF substrate 11 and the TFT substrate 12 is obtained. The trench line TL formed on the TFT substrate 12 is covered by the CF substrate 11. In the present embodiment, the trench line TL formed on the TFT substrate 12 is partially covered by the CF substrate 11. In other words, the groove line TL formed on the inner surface SF3 of the TFT substrate 12 is partially exposed.

參照圖32(C)及圖35,接下來,沿著TFT基板12之溝槽線TL形成裂紋線CL(圖31:步驟S62)。 Referring to Fig. 32(C) and Fig. 35, next, a crack line CL is formed along the groove line TL of the TFT substrate 12 (Fig. 31: step S62).

參照圖32(D)及圖36,接下來,在CF基板11之外面SF2上 形成刻劃線SL(圖31:步驟S71)。刻劃線SL,如上所述,可藉由公知的典型的刻劃技術而形成,具有在刻劃時形成之垂直裂紋之線。 Referring to FIG. 32(D) and FIG. 36, next, on the outer surface SF2 of the CF substrate 11. A score line SL is formed (FIG. 31: step S71). The score line SL, as described above, can be formed by a well-known typical scoring technique having a line of vertical cracks formed during scoring.

進一步參照圖32(E)及圖37,作為步驟S90(圖31),係沿著 TFT基板12之裂紋線CL將TFT基板12分斷,此外,沿著CF基板11之刻劃線SL將CF基板11分斷。 Referring further to FIG. 32(E) and FIG. 37, as step S90 (FIG. 31), along the line The crack line CL of the TFT substrate 12 breaks the TFT substrate 12, and the CF substrate 11 is cut along the scribe line SL of the CF substrate 11.

接下來藉由在CF基板11及TFT基板12間之間隙內注入液 晶而形成液晶層20(圖1(B))。藉由以上方式,可從一單位基板10(圖32(D))獲得多個LCD面板101(圖1(B))。 Next, the liquid is injected into the gap between the CF substrate 11 and the TFT substrate 12 The liquid crystal layer 20 is formed by crystal formation (Fig. 1 (B)). By the above manner, a plurality of LCD panels 101 (FIG. 1(B)) can be obtained from one unit substrate 10 (FIG. 32(D)).

另外,關於上述以外之構成,由於與上述之實施形態2之構 成大致相同,因此針對相同或相對應之元件標記相同符號,且不重複其說明。 In addition, the configuration other than the above is due to the configuration of the above-described second embodiment. The same reference numerals are given to the same or corresponding elements, and the description thereof is not repeated.

藉由本實施形態,亦可獲得與實施形態1大致相同的效果。 According to this embodiment, substantially the same effects as those of the first embodiment can be obtained.

此外,根據本實施形態,在形成刻劃線SL之時點,CF基板 11及TFT基板12既已相互貼合,而進一步地在TFT基板12形成裂紋線CL。 據此,即使刻劃線SL之垂直裂紋因某種原因而伸展而導致沿刻劃線SL之分斷無意圖地產生,一般而言也尤其無礙於事。 Further, according to the present embodiment, at the time of forming the scribe line SL, the CF substrate 11 and the TFT substrate 12 are bonded to each other, and a crack line CL is further formed on the TFT substrate 12. Accordingly, even if the vertical crack of the score line SL is stretched for some reason, the break along the score line SL is unintentionally generated, and in general, it is particularly uncomfortable.

此外,CF基板11之刻劃線SL,並非形成在因配置濾光片 及黑矩陣等而大多具有複雜之構成的內面SF1,而是形成在外面SF2。藉此,能夠穩定地形成刻劃線SL。 In addition, the scribe line SL of the CF substrate 11 is not formed by the arrangement of the filter. Most of the inner surface SF1 having a complicated configuration, such as a black matrix, is formed on the outer surface SF2. Thereby, the score line SL can be stably formed.

參照圖38,在本實施形態之變形例中,上述之步驟S62及 S71(圖31)之順序可交換。圖39及圖40,係概略性地表示在以步驟S71形成刻劃線SL之時點之構成。 Referring to Fig. 38, in a modification of the embodiment, the above-described step S62 and The order of S71 (Fig. 31) can be exchanged. FIG. 39 and FIG. 40 schematically show the configuration at the time when the scribe line SL is formed in step S71.

(實施形態5) (Embodiment 5)

圖41,係概略性地表示本實施形態中的LCD面板101(圖1(A)及(B))之製造方法之流程圖。與實施形態2~4不同,在本實施形態中,對CF基板11及TFT基板12之任某一者,將供分斷之位置之規定,分成溝槽線TL之形成(步驟S13或S23)、與刻劃線SL之形成(步驟S70)而進行。該分法為任意的,例如,在平面布局(layout)之XY正交座標中,形成沿X軸之溝槽線TL、與沿Y軸之刻劃線SL。另外,步驟S60及S70之順序亦可交換。 Fig. 41 is a flow chart schematically showing a method of manufacturing the LCD panel 101 (Figs. 1 (A) and (B)) of the present embodiment. Unlike the second to fourth embodiments, in the present embodiment, the position of the position to be separated is divided into the groove line TL for either of the CF substrate 11 and the TFT substrate 12 (step S13 or S23). And forming with the scribe line SL (step S70). This division method is arbitrary, for example, in the XY orthogonal coordinates of the layout, the groove line TL along the X axis and the scribe line SL along the Y axis are formed. In addition, the order of steps S60 and S70 can also be exchanged.

另外,關於上述以外之構成,由於與上述之實施形態2~4 之構成大致相同,因此針對相同或相對應之元件標記相同符號,且不重複其說明。 In addition, the configuration other than the above is the same as the above-described embodiments 2 to 4. The components are substantially the same, and therefore the same or corresponding elements are denoted by the same reference numerals and the description thereof is not repeated.

(實施形態6) (Embodiment 6)

針對在上述各實施形態中的溝槽線TL之形成中所使用之具有刃前端之切割器具,於以下進行說明。 A cutting tool having a tip end for use in forming the groove line TL in each of the above embodiments will be described below.

圖42(A)及(B),表示將刃前端51按壓於CF基板11之樣子。 切割器具50具有刃前端51及柄52。在刃前端51,設置有前端面SD1(第1面)、及圍繞前端面SD1之多個面。該等多個面包含側面SD2(第2面)及側面SD3(第3面)。前端面SD1、側面SD2及SD3(第1~第3面),朝向相互不同之方向,且相互相鄰。刃前端51,具有前端面SD1、側面SD2及SD3交會之頂點,藉由該頂點構成刃前端51之突起部PP。此外,側面SD2及SD3,形成有構成刃前端51之側部PS之稜線。側部PS從突起部PP起呈線狀延 伸。此外,側部PS,如上所述般係為稜線,因此具有呈線狀延伸之凸形狀。 42(A) and (B) show the state in which the blade tip end 51 is pressed against the CF substrate 11. The cutting instrument 50 has a blade front end 51 and a shank 52. The blade tip end 51 is provided with a front end surface SD1 (first surface) and a plurality of surfaces surrounding the front end surface SD1. The plurality of faces include a side surface SD2 (second surface) and a side surface SD3 (third surface). The front end surface SD1, the side surfaces SD2, and SD3 (the first to third surfaces) are oriented in mutually different directions and adjacent to each other. The blade tip end 51 has a vertex of the intersection of the front end surface SD1, the side surfaces SD2, and SD3, and the vertex constitutes the protrusion portion PP of the blade tip end 51. Further, the side faces SD2 and SD3 are formed with ridge lines constituting the side portions PS of the blade tip end 51. The side portion PS is linearly extended from the protrusion PP Stretch. Further, since the side portion PS is a ridge line as described above, it has a convex shape extending in a line shape.

刃前端51較佳為鑽石尖點。亦即,刃前端51,從硬度及可 將表面粗糙度設為較小的觀點來看,較佳為由鑽石製作成。更佳為以結晶學而言,前端面SD1為{001}面,側面SD2及SD3分別為{111}面。在該情形,側面SD2及SD3,雖具有不同的朝向,但在結晶學上是相互等價之結晶面。 The blade front end 51 is preferably a diamond cusp. That is, the front end 51 of the blade, from the hardness and From the viewpoint of setting the surface roughness to be small, it is preferably made of diamond. More preferably, in terms of crystallography, the front end surface SD1 is a {001} plane, and the side surfaces SD2 and SD3 are respectively a {111} plane. In this case, the side faces SD2 and SD3 have crystal faces which are mutually equivalent in crystallography, although they have different orientations.

另外,亦可使用非單結晶之鑽石,例如,亦可使用以化學氣 相沉積法(CVD;Chemical Vapor Deposition)合成之多結晶體鑽石。或者,亦可使用從微粒之石墨(graphite)或非石墨狀碳素以不含有鐵族元素等之結合材之方式燒結而成之多結晶體鑽石、或使鑽石粒子藉由鐵族元素等之結合材結合而成之燒結鑽石。 In addition, non-single crystal diamonds can also be used, for example, chemical gases can also be used. Polycrystalline diamond synthesized by phase deposition (CVD; Chemical Vapor Deposition). Alternatively, a polycrystalline diamond obtained by sintering graphite or non-graphite carbon in the form of a combination of iron-free elements or the like may be used, or a combination of diamond particles and the like may be used. Sintered diamonds combined with wood.

柄52沿軸方向AX延伸。刃前端51,較佳為以前端面SD1 之法線方向大致沿軸方向AX之方式安裝於柄52。 The shank 52 extends in the axial direction AX. Blade front end 51, preferably front end face SD1 The normal direction is attached to the shank 52 substantially in the axial direction AX.

為了使用切割器具50形成溝槽線TL(圖8(A)),在CF基板 11之內面SF1,將刃前端51之突起部PP及側部PS,往CF基板11具有之厚度方向DT按壓。接著,以大致沿著側部PS投影至內面SF1上之方向的方式,使刃前端51滑動於內面SF1上。藉此在內面SF1上形成未伴隨有垂直裂紋之溝狀之溝槽線TL。溝槽線TL雖藉由CF基板11之塑性變形而產生,但亦可在此時稍微切削CF基板11。由於僅如刀鞘般之切削將會產生微細的碎片,因此較佳為盡可能減少。 In order to form the groove line TL using the cutting instrument 50 (Fig. 8(A)), on the CF substrate The inner surface SF1 of the blade 11 presses the projection portion PP and the side portion PS of the blade tip end 51 in the thickness direction DT of the CF substrate 11. Next, the blade tip end 51 is slid on the inner surface SF1 so as to be projected substantially in the direction in which the side portion PS is projected onto the inner surface SF1. Thereby, a groove-like groove line TL which is not accompanied by a vertical crack is formed on the inner surface SF1. Although the groove line TL is generated by plastic deformation of the CF substrate 11, the CF substrate 11 may be slightly cut at this time. Since the cutting only as a scabbard will produce fine fragments, it is preferably as small as possible.

藉由刃前端51之滑動,有同時形成溝槽線TL及裂紋線CL 的情形(圖8(B))、以及僅形成溝槽線TL的情形(圖8(A))。裂紋線CL,係從 溝槽線TL之凹槽往厚度方向DT伸展之裂紋,且在內面SF1上呈線狀延伸。 根據下述之方法,能夠在僅形成溝槽線TL後,沿該溝槽線TL形成裂紋線CL。 By the sliding of the front end 51 of the blade, the groove line TL and the crack line CL are simultaneously formed. The case (Fig. 8(B)), and the case where only the groove line TL is formed (Fig. 8(A)). Crack line CL, from The groove of the groove line TL is cracked in the thickness direction DT, and extends linearly on the inner surface SF1. According to the method described below, the crack line CL can be formed along the groove line TL after only the groove line TL is formed.

接下來,尤其著重在針對CF基板11(本實施形態中的第1 脆性基板)之分斷方法,於以下進行說明。另外,為了易於理解圖式及說明,僅針對沿一方向(各俯視圖中的橫方向)之分斷進行說明,但分斷如在實施形態1~5已說明般,可進行沿多個方向(例如,各俯視圖中的橫方向及縱方向)之分斷。此外,針對TFT基板12(本實施形態中的第2脆性基板)亦可適用相同之分斷方法。此外,亦可為將TFT基板12作為第1脆性基板,將CF基板11作為第2脆性基板。此外,關於CF基板11與TFT基板12間之貼合,如已在實施形態1~5中所說明,省略其圖示。 Next, the focus is on the CF substrate 11 (the first in the present embodiment). The breaking method of the brittle substrate) will be described below. In addition, in order to facilitate understanding of the drawings and the description, only the division in one direction (the horizontal direction in each plan view) will be described, but the division can be performed in a plurality of directions as described in the first to fifth embodiments ( For example, the horizontal direction and the vertical direction in each plan view are divided. Further, the same breaking method can be applied to the TFT substrate 12 (the second brittle substrate in the present embodiment). Further, the TFT substrate 12 may be used as the first brittle substrate, and the CF substrate 11 may be used as the second brittle substrate. In addition, the bonding between the CF substrate 11 and the TFT substrate 12 is as described in the first to fifth embodiments, and the illustration thereof is omitted.

參照圖43(A),CF基板11具有平坦的內面SF1。圍繞內面 SF1之緣,包含相互對向之邊ED1(第1邊)及邊ED2(第2邊)。在圖43(A)中所示之例子中,緣係長方形狀。據此,邊ED1及ED2係相互平行的邊。此外,在圖43(A)中所示之例子中,邊ED1及ED2係長方形之短邊。 Referring to Fig. 43 (A), the CF substrate 11 has a flat inner surface SF1. Around the inner surface The edge of SF1 includes the opposite sides ED1 (first side) and side ED2 (second side). In the example shown in Fig. 43 (A), the edges are rectangular. Accordingly, the sides ED1 and ED2 are sides parallel to each other. Further, in the example shown in FIG. 43(A), the sides ED1 and ED2 are the short sides of the rectangle.

將刃前端51在位置N1按壓於內面SF1。位置N1之細節將 於下述。刃前端51之按壓,參照圖42(A),以在CF基板11之內面SF1上將刃前端51之突起部PP配置在邊ED1及側部PS間之方式,且以刃前端51之側部PS配置在突起部PP與邊ED2間之方式進行。 The blade tip end 51 is pressed against the inner surface SF1 at the position N1. The details of position N1 will As described below. Referring to FIG. 42(A), the projection portion PP of the blade tip end 51 is disposed between the side ED1 and the side portion PS on the inner surface SF1 of the CF substrate 11, and the side of the blade tip end 51 is provided. The portion PS is disposed between the protrusion portion PP and the side ED2.

接著,在內面SF1上形成多個溝槽線TL(在圖中為2條線)。 溝槽線TL之形成,係在位置N1(第1位置)及位置N3間進行。在位置N1及N3間配置位置N2(第2位置)。據此,溝槽線TL,形成在位置N1及N2 間、與位置N2及N3間。位置N1及N3亦可以與CF基板11之內面SF1之緣分離之方式配置,或者,亦可其一方或兩方位於內面SF1之緣。形成之溝槽線TL,在前者之情形係與CF基板11之緣分離,在後者之情形係與CF基板11之緣相接。在位置N1及N2之中,位置N1較接近邊ED1,此外,在位置N1及N2之中,位置N2較接近邊ED2。另外,在圖43(A)中所示之例子中,位置N1接近邊ED1及ED2中的邊ED1。位置N2接近邊ED1及ED2中的邊ED2,但位置N1及N2兩者亦可位於邊ED1或ED2之任某一方之附近。 Next, a plurality of groove lines TL (two lines in the drawing) are formed on the inner surface SF1. The formation of the groove line TL is performed between the position N1 (first position) and the position N3. A position N2 (second position) is placed between the positions N1 and N3. Accordingly, the groove line TL is formed at positions N1 and N2. Between, and between positions N2 and N3. The positions N1 and N3 may be arranged to be separated from the edge of the inner surface SF1 of the CF substrate 11, or one or both of them may be located at the edge of the inner surface SF1. The groove line TL formed is separated from the edge of the CF substrate 11 in the former case, and is in contact with the edge of the CF substrate 11 in the latter case. Among the positions N1 and N2, the position N1 is closer to the side ED1, and further, among the positions N1 and N2, the position N2 is closer to the side ED2. Further, in the example shown in FIG. 43(A), the position N1 is close to the side ED1 of the sides ED1 and ED2. The position N2 is close to the side ED2 of the sides ED1 and ED2, but both of the positions N1 and N2 may be located near any one of the sides ED1 or ED2.

在形成溝槽線TL時,在本實施形態中,使刃前端51從位 置N1往位置N2位移,進一步地從位置N2往位置N3位移。亦即,參照圖42(A),使刃前端51往方向DA位移,該方向DA係從邊ED1朝向邊ED2之方向。方向DA,與將從刃前端51延伸之軸方向AX投影至內面SF1上之方向對應。在該情形,刃前端51藉由柄52而被拖移於內面SF1上。 When the groove line TL is formed, in the present embodiment, the blade leading end 51 is placed in position. The displacement of N1 to the position N2 is further shifted from the position N2 to the position N3. That is, referring to Fig. 42 (A), the blade leading end 51 is displaced in the direction DA from the side ED1 toward the side ED2. The direction DA corresponds to a direction in which the axial direction AX extending from the blade tip end 51 is projected onto the inner surface SF1. In this case, the blade leading end 51 is dragged onto the inner surface SF1 by the shank 52.

接下來,維持在實施形態1中已說明之無裂紋狀態(圖8(A)) 經過所欲之時間。在此期間,如在實施形態1~5中已說明般,進行CF基板11與TFT基板12(不圖示)之貼合。 Next, the crack-free state described in the first embodiment is maintained (Fig. 8(A)). After the time of the desire. In the meantime, as described in the first to fifth embodiments, the CF substrate 11 and the TFT substrate 12 (not shown) are bonded together.

參照圖43(B),在形成溝槽線TL後,沿溝槽線TL從位置N2往位置N1之側(參照圖中的虛線箭頭),使厚度方向DT中的CF基板11之裂紋伸展,藉此形成裂紋線CL。裂紋線CL之形成,藉由輔助線AL及溝槽線TL在位置N2互相交叉而開始。在其目的中,在形成溝槽線TL後形成輔助線AL。輔助線AL,係伴隨有厚度方向DT之裂紋之一般的刻劃線。輔助線AL之形成方法,並不特別限定,但亦可如圖43(B)所示般,以內面 SF1之緣為基點而形成。 Referring to FIG. 43(B), after the groove line TL is formed, the crack of the CF substrate 11 in the thickness direction DT is stretched along the groove line TL from the position N2 toward the side of the position N1 (see the dotted arrow in the drawing). Thereby, the crack line CL is formed. The formation of the crack line CL is started by the auxiliary line AL and the groove line TL crossing each other at the position N2. In its purpose, the auxiliary line AL is formed after the groove line TL is formed. The auxiliary line AL is a general scribe line accompanied by a crack in the thickness direction DT. The method of forming the auxiliary line AL is not particularly limited, but may be as shown in FIG. 43(B). The edge of SF1 is formed as a base point.

另外,與從位置N2往位置N1之方向相比,往從位置N2 往位置N3之方向,較難形成裂紋線CL。也就是,裂紋線CL之伸展之進行容易度存在有方向依存性。據此,產生裂紋線CL在位置N1及N2間形成而不在位置N2及N3間形成之現象。本實施形態,係以沿著位置N1及N2間之CF基板11之分斷為目的,不以沿著位置N2及N3間之CF基板11之分斷為目的。據此,必須在位置N1及N2間形成裂紋線CL,而另一方面難以在位置N2及N3間形成裂紋線CL,並不成為問題。 In addition, compared to the direction from the position N2 to the position N1, the direction to the slave position N2 In the direction of the position N3, it is difficult to form the crack line CL. That is, the ease of progressing the extension of the crack line CL is directional. Accordingly, the crack line CL is formed between the positions N1 and N2 without being formed between the positions N2 and N3. In the present embodiment, for the purpose of breaking the CF substrate 11 between the positions N1 and N2, the purpose is not to divide the CF substrate 11 between the positions N2 and N3. Accordingly, it is necessary to form the crack line CL between the positions N1 and N2, and on the other hand, it is difficult to form the crack line CL between the positions N2 and N3, which is not a problem.

接著,沿裂紋線CL將CF基板11分斷。具體而言,為進行 裂斷步驟。另外,裂紋線CL在其形成時往厚度方向DT完全進展的情形,裂紋線CL之形成與CF基板11之分斷可同時產生。在該情形,可省略裂斷步驟。 Next, the CF substrate 11 is broken along the crack line CL. Specifically, for Breaking step. Further, in the case where the crack line CL is completely progressed in the thickness direction DT at the time of formation, the formation of the crack line CL and the breaking of the CF substrate 11 can be simultaneously generated. In this case, the cracking step can be omitted.

藉由以上方式進行CF基板11之分斷。 The division of the CF substrate 11 is performed by the above method.

接下來,針對上述分斷方法之第1~第3變形例,於以下進 行說明。 Next, in the first to third modifications of the above-described breaking method, the following is Line description.

參照圖44(A),第1變形例,係關於輔助線AL與溝槽線TL 之交叉作為裂紋線CL(圖43(B))之形成開始之開端不充分的情形。參照圖44(B),藉由對CF基板11施加使彎曲力矩等產生之外力,而沿輔助線AL使厚度方向DT之裂紋伸展,其結果為,將CF基板11分離。藉此,裂紋線CL之形成開始。另外,在圖44(A)中,雖輔助線AL形成於CF基板11之內面SF1上,但用於分離CF基板11之輔助線AL亦可形成於CF基板11之外面SF2上。在該情形,輔助線AL及溝槽線TL,在平面布局上、於位置 N2互相交叉,但不互相直接接觸。在該情形,與第1實施形態不同,無需使CF基板11之溝槽線TL之端部露出。 Referring to Fig. 44(A), the first modification relates to the auxiliary line AL and the groove line TL. The intersection is not sufficient as the beginning of the formation of the crack line CL (Fig. 43 (B)). Referring to Fig. 44(B), by applying an external force to the CF substrate 11 such as a bending moment or the like, the crack in the thickness direction DT is stretched along the auxiliary line AL, and as a result, the CF substrate 11 is separated. Thereby, the formation of the crack line CL starts. Further, in FIG. 44(A), although the auxiliary line AL is formed on the inner surface SF1 of the CF substrate 11, the auxiliary line AL for separating the CF substrate 11 may be formed on the outer surface SF2 of the CF substrate 11. In this case, the auxiliary line AL and the groove line TL are in a planar layout at the position N2 cross each other but not in direct contact with each other. In this case, unlike the first embodiment, it is not necessary to expose the end portion of the groove line TL of the CF substrate 11.

此外,在第1變形例中,藉由CF基板11之分離而解放溝 槽線TL附近之內部應力之挫曲,藉此開始裂紋線CL之形成。因此,輔助線AL本身亦可為藉由對溝槽線TL施加應力所形成之裂紋線CL。 Further, in the first modification, the trench is liberated by the separation of the CF substrate 11 The internal stress of the groove line TL is frustrated, thereby starting the formation of the crack line CL. Therefore, the auxiliary line AL itself may be the crack line CL formed by applying stress to the groove line TL.

參照圖45,在第2變形例中,在CF基板11之內面SF1,將 刃前端51按壓於位置N3。在形成溝槽線TL時,在本變形例中,使刃前端51從位置N3往位置N2位移,進一步地從位置N2往位置N1位移。亦即,參照圖42,刃前端51往方向DB位移,該方向DB係從邊ED2朝向邊ED1之方向。方向DB,與將從刃前端51延伸之軸方向AX投影至內面SF1上之方向對應。在該情形,刃前端51藉由柄52而被推進於內面SF1上。 Referring to Fig. 45, in the second modification, the inner surface SF1 of the CF substrate 11 will be The blade leading end 51 is pressed at the position N3. When the groove line TL is formed, in the present modification, the blade tip end 51 is displaced from the position N3 to the position N2, and further displaced from the position N2 to the position N1. That is, referring to Fig. 42, the blade leading end 51 is displaced in the direction DB from the side ED2 toward the side ED1. The direction DB corresponds to a direction in which the axial direction AX extending from the blade tip end 51 is projected onto the inner surface SF1. In this case, the blade leading end 51 is advanced on the inner surface SF1 by the shank 52.

參照圖46,在第3變形例中,在形成溝槽線TL時,刃前端 51在CF基板11之內面SF1與位置N1相比在位置N2以較大的力按壓。具體而言,將位置N4設為在位置N1及N2間之位置,在溝槽線TL之形成到達位置N4之時點,提高刃前端51之負載。換言之,溝槽線TL之負載,相較於位置N1,在溝槽線TL之終端部即位置N4及N3間提高。藉此,能夠減輕在終端部以外之負載,並且使從位置N2起之裂紋線CL之形成容易被誘發。 Referring to Fig. 46, in the third modification, the blade front end is formed when the groove line TL is formed. The inner surface SF1 of the CF substrate 11 is pressed with a large force at the position N2 as compared with the position N1. Specifically, the position N4 is set to a position between the positions N1 and N2, and when the groove line TL is formed to reach the position N4, the load of the blade tip end 51 is increased. In other words, the load of the groove line TL is increased between the positions N4 and N3 at the end portion of the groove line TL as compared with the position N1. Thereby, the load other than the terminal portion can be alleviated, and the formation of the crack line CL from the position N2 can be easily induced.

根據本實施形態,能夠從溝槽線TL更確實地形成裂紋線 CL。 According to the present embodiment, the crack line can be formed more reliably from the groove line TL. CL.

此外,與下述之實施形態7不同,在本實施形態中,在形成 溝槽線TL之時點(圖43(A)),輔助線AL尚未形成。據此,能夠不受來自輔 助線AL之影響而更穩定地維持無裂紋狀態。另外,在無裂紋狀態之穩定性不成問題的情形下,亦可取代未形成輔助線AL之圖43(A)之狀態,以形成有輔助線AL之圖43(B)之狀態維持無裂紋狀態。 Further, unlike the seventh embodiment described below, in the present embodiment, it is formed. At the time of the groove line TL (Fig. 43 (A)), the auxiliary line AL has not yet been formed. According to this, it is not possible to The effect of the auxiliary line AL is more stably maintained in a crack-free state. Further, in the case where the stability in the crack-free state is not a problem, the state of FIG. 43(A) in which the auxiliary line AL is not formed may be replaced, and the state in which the auxiliary line AL is formed in FIG. 43(B) is maintained in a crack-free state. .

(實施形態7) (Embodiment 7)

針對本實施形態中的液晶顯示面板之製造方法,一邊使用圖47~圖49,一邊於以下進行說明。 The method of manufacturing the liquid crystal display panel of the present embodiment will be described below with reference to FIGS. 47 to 49.

參照圖47,在本實施形態中,輔助線AL係於溝槽線TL之形成前形成。輔助線AL之形成方法本身,與圖43(B)(實施形態6)相同。 Referring to Fig. 47, in the present embodiment, the auxiliary line AL is formed before the formation of the groove line TL. The method of forming the auxiliary line AL itself is the same as that of Fig. 43 (B) (Embodiment 6).

參照圖48,接著,將刃前端51按壓於內面SF1,然後形成溝槽線TL。溝槽線TL之形成方法本身,與圖43(A)(實施形態6)相同。輔助線AL及溝槽線TL在位置N2互相交叉。接著,如在實施形態1~5中已說明般,進行CF基板11與TFT基板12(不圖示)之貼合。 Referring to Fig. 48, next, the blade leading end 51 is pressed against the inner surface SF1, and then the groove line TL is formed. The method of forming the groove line TL itself is the same as that of Fig. 43 (A) (Embodiment 6). The auxiliary line AL and the groove line TL cross each other at the position N2. Next, as described in the first to fifth embodiments, the CF substrate 11 and the TFT substrate 12 (not shown) are bonded together.

參照圖49,接著,藉由對CF基板11施加使彎曲力矩等產生之外力之一般的裂斷步驟,而沿著輔助線AL將CF基板11分離。藉此,裂紋線CL(圖8(B))之形成開始(參照圖中的虛線箭頭)。另外,在圖47中,輔助線AL雖形成在CF基板11之內面SF1上,但用於分離CF基板11之輔助線AL亦可形成在CF基板11之外面SF2上。在該情形,輔助線AL及溝槽線TL,在平面布局上、於位置N2互相交叉,但不互相直接接觸。 Referring to Fig. 49, a CF substrate 11 is separated along the auxiliary line AL by applying a general cracking step for generating an external force such as a bending moment to the CF substrate 11. Thereby, the formation of the crack line CL (Fig. 8(B)) is started (refer to the dotted arrow in the figure). Further, in FIG. 47, the auxiliary line AL is formed on the inner surface SF1 of the CF substrate 11, but the auxiliary line AL for separating the CF substrate 11 may be formed on the outer surface SF2 of the CF substrate 11. In this case, the auxiliary line AL and the groove line TL cross each other at the position N2 in the planar layout, but are not in direct contact with each other.

另外,關於上述以外之構成,係與上述之實施形態6之構成大致相同。 Further, the configuration other than the above is substantially the same as the configuration of the above-described sixth embodiment.

參照圖50,在變形例中,在形成溝槽線TL時,刃前端51 在CF基板11之內面SF1與位置N1相比在位置N2以較大的力按壓。具體而言,將位置N4設為在位置N1及N2間之位置,在溝槽線TL之形成到達位置N4之時點,提高刃前端51之負載。換言之,溝槽線TL之負載,相較於位置N1,在溝槽線TL之終端部即位置N4及N3間提高。藉此,能夠減輕在終端部以外之負載,並且使從位置N2起之裂紋線CL之形成容易被誘發。 Referring to Fig. 50, in the modification, the blade leading end 51 is formed when the groove line TL is formed. The inner surface SF1 of the CF substrate 11 is pressed with a large force at the position N2 as compared with the position N1. Specifically, the position N4 is set to a position between the positions N1 and N2, and when the groove line TL is formed to reach the position N4, the load of the blade tip end 51 is increased. In other words, the load of the groove line TL is increased between the positions N4 and N3 at the end portion of the groove line TL as compared with the position N1. Thereby, the load other than the terminal portion can be alleviated, and the formation of the crack line CL from the position N2 can be easily induced.

(實施形態8) (Embodiment 8)

參照圖51(A),在本實施形態中的液晶顯示面板之製造方法中,形成從位置N1起經由位置N2抵達邊ED2之溝槽線TL。接下來,維持在實施形態1中已說明之無裂紋狀態(圖8(A))經過所欲之時間。在此期間,如在實施形態1~5中已說明般,進行CF基板11與TFT基板12(不圖示)之貼合。 Referring to Fig. 51(A), in the method of manufacturing a liquid crystal display panel of the present embodiment, the groove line TL which reaches the side ED2 from the position N1 via the position N2 is formed. Next, the crack-free state (Fig. 8(A)) described in the first embodiment is maintained for the desired period of time. In the meantime, as described in the first to fifth embodiments, the CF substrate 11 and the TFT substrate 12 (not shown) are bonded together.

參照圖51(B),接下來在位置N2與邊ED2之間,施加如使 溝槽線TL附近之內部應力之挫曲解放般之應力。藉此,誘發起沿溝槽線TL之裂紋線之形成。 Referring to FIG. 51(B), next between the position N2 and the side ED2, as applied The internal stress near the groove line TL is abruptly liberated. Thereby, the formation of the crack line along the groove line TL is induced.

作為應力之施加,具體而言,在內面SF1上、於位置N2與邊ED2之間(圖中的虛線及邊ED2間之區域),使已按壓之刃前端51滑動。該滑動進行抵達至邊ED2。刃前端51較佳為以與最初形成之溝槽線TL之軌道交叉之方式滑動,更佳為以與最初形成之溝槽線TL之軌道重疊之方式滑動。該再度滑動之長度,例如為0.5mm左右。 Specifically, as the application of the stress, the pressed blade tip end 51 is slid on the inner surface SF1 between the position N2 and the side ED2 (the area between the broken line and the side ED2 in the drawing). The slide is made to reach the side ED2. The blade leading end 51 preferably slides in such a manner as to intersect the track of the groove line TL initially formed, and more preferably slides in a manner overlapping the track of the groove line TL initially formed. The length of the re-sliding is, for example, about 0.5 mm.

作為變形例,為了在位置N2與邊ED2之間施加應力,亦可取代上述之刃前端51之再度滑動,而在內面SF1上、於位置N2與邊ED2 之間照射雷射光。藉由藉此生成之熱應力,亦能夠將溝槽線TL附近之內部應力之挫曲解放,而藉此誘發起裂紋線之形成開始。 As a modification, in order to apply a stress between the position N2 and the side ED2, it is also possible to replace the above-mentioned blade front end 51 with the re-sliding, and on the inner surface SF1, at the position N2 and the side ED2. The laser light is irradiated between. By the thermal stress generated thereby, it is also possible to liberate the internal stress of the vicinity of the groove line TL, thereby inducing the start of the formation of the crack line.

另外,關於上述以外之構成,係與上述之實施形態6之構成 大致相同。 Further, the configuration other than the above is the same as the configuration of the above-described sixth embodiment. Roughly the same.

(實施形態9) (Embodiment 9)

參照圖52(A),在本實施形態中的液晶顯示面板之製造方法中,藉由使刃前端51從位置N1往位置N2,然後進一步往位置N3位移,而形成與內面SF1之緣分開之溝槽線TL。溝槽線TL之形成方法本身,與圖43(A)(實施形態6)大致相同。 Referring to Fig. 52(A), in the method of manufacturing a liquid crystal display panel of the present embodiment, the blade tip end 51 is separated from the edge of the inner surface SF1 by moving the blade tip end 51 from the position N1 to the position N2 and then further to the position N3. The groove line TL. The method of forming the groove line TL itself is substantially the same as that of FIG. 43(A) (Embodiment 6).

接下來,維持在實施形態1中已說明之無裂紋狀態(圖8(A)) 經過所欲之時間。在此期間,如在實施形態1~5中已說明般,進行CF基板11與TFT基板12(不圖示)之貼合。 Next, the crack-free state described in the first embodiment is maintained (Fig. 8(A)). After the time of the desire. In the meantime, as described in the first to fifth embodiments, the CF substrate 11 and the TFT substrate 12 (not shown) are bonded together.

參照圖52(B),進行與圖51(B)(實施形態8或其變形例)同樣 之應力施加。藉此,誘發起沿溝槽線TL之裂紋線之形成。 Referring to Fig. 52 (B), the same as Fig. 51 (B) (Embodiment 8 or a modification thereof) is performed. The stress is applied. Thereby, the formation of the crack line along the groove line TL is induced.

參照圖53,作為圖52(A)之步驟之變形例,亦可在溝槽線TL 之形成中,使刃前端51從位置N3往位置N2,然後從位置N2往位置N1位移。 Referring to Fig. 53, as a modification of the step of Fig. 52(A), it is also possible to use the groove line TL. In the formation, the blade leading end 51 is displaced from the position N3 to the position N2 and then from the position N2 to the position N1.

另外,關於上述以外之構成,係與上述之實施形態6之構成 大致相同。 Further, the configuration other than the above is the same as the configuration of the above-described sixth embodiment. Roughly the same.

(實施形態10) (Embodiment 10)

參照圖54(A)及(B),在上述各實施形態中,亦可取代刃前端51(圖42(A)及(B)),使用刃前端51v。刃前端51v,具有圓錐形狀,該圓錐形狀具有頂點、與圓錐面SC。刃前端51v之突起部PPv以頂點構成。刃前端之側部PSv係從頂點起沿著於圓錐面SC上延伸之假想線(圖54(B)中的虛線)而構成。藉此,側部PSv具有呈線狀延伸之凸形狀。 Referring to Figs. 54(A) and (B), in the above embodiments, the blade tip end 51v may be used instead of the blade tip end 51 (Figs. 42(A) and (B)). The blade tip end 51v has a conical shape having a vertex and a conical surface SC. The projection PPv of the blade tip end 51v is formed by a vertex. The side portion PSv of the tip end of the blade is formed from an imaginary line extending along the conical surface SC (dashed line in FIG. 54(B)). Thereby, the side portion PSv has a convex shape extending in a line shape.

另外,在上述實施形態6~10中,基板之緣之第1及第2邊 雖為長方形之短邊,但第1及第2邊亦可為長方形之長邊。此外,緣之形狀並不限定於長方形,例如亦可為正方形。此外,第1及第2邊並不限定於直線狀,亦可為曲線狀。此外,在上述各實施形態中,基板之主面雖為平坦,但基板之主面亦可彎曲。 Further, in the above embodiments 6 to 10, the first and second sides of the edge of the substrate Although the short side of the rectangle, the first and second sides may also be the long sides of the rectangle. Further, the shape of the edge is not limited to a rectangle, and may be, for example, a square. Further, the first and second sides are not limited to a straight line, and may be curved. Further, in each of the above embodiments, the main surface of the substrate is flat, but the main surface of the substrate may be curved.

此外,在上述各實施形態中,為了獲得多個液晶顯示面板, 亦可為:首先將具有脆性基板之一單位基板分斷成多個部分,接著將各部分進一步分斷,藉此獲得多個顯示面板。例如,亦可為:將單位基板首先分斷成長方形狀之部分,接著以分割其長邊之方式將該長方形狀之部分進一步分斷,藉此獲得多個顯示面板。 Further, in each of the above embodiments, in order to obtain a plurality of liquid crystal display panels, Alternatively, the unit substrate having one of the brittle substrates may be first divided into a plurality of portions, and then the portions may be further divided, thereby obtaining a plurality of display panels. For example, the unit substrate may be first divided into a portion having a square shape, and then the rectangular portion may be further divided so as to divide the long side thereof, thereby obtaining a plurality of display panels.

此外,在上述之分斷方法中,作為特別合適之脆性基板雖使 用玻璃基板,但脆性基板並不限定於玻璃基板,例如亦可為藍寶石。 Further, in the above-described breaking method, although a brittle substrate which is particularly suitable is used The glass substrate is used, but the brittle substrate is not limited to the glass substrate, and may be, for example, sapphire.

此外,在上述之液晶顯示面板之製造方法中,雖對在玻璃基 板設有濾光片、黑矩陣及定向膜之CF基板11,與在玻璃基板設有配線、主動元件、電極及定向膜之TFT基板12形成溝槽線,但亦可為:在玻璃基板形成有溝槽線後,對玻璃基板進行用於設置作為CF基板11或TFT基板12之構成之加工。 Further, in the above method of manufacturing a liquid crystal display panel, although the pair is on the glass base The board is provided with a CF substrate 11 of a filter, a black matrix and an alignment film, and a trench line is formed with the TFT substrate 12 having wiring, active elements, electrodes and alignment films on the glass substrate, but may be formed on the glass substrate. After the grooved line is formed, processing for arranging the CF substrate 11 or the TFT substrate 12 is performed on the glass substrate.

本發明可在其發明之範圍內,自由地組合各實施形態、或適當地對各實施形態進行變形、省略等。 The present invention can be freely combined with the respective embodiments or appropriately modified, omitted, and the like according to the scope of the invention.

10‧‧‧單位基板 10‧‧‧unit substrate

11‧‧‧CF基板(脆性基板) 11‧‧‧CF substrate (brittle substrate)

12‧‧‧TFT基板(脆性基板) 12‧‧‧TFT substrate (brittle substrate)

21‧‧‧密封部 21‧‧‧ Sealing Department

CL‧‧‧裂紋線 CL‧‧‧crack line

SF1、SF3‧‧‧內面(主面) SF1, SF3‧‧‧ inside (main surface)

SF2、SF4‧‧‧外面(主面) SF2, SF4‧‧‧ outside (main surface)

TL‧‧‧溝槽線 TL‧‧‧ trench line

Claims (4)

一種液晶顯示面板之製造方法,其特徵在於,具備:準備第1脆性基板之步驟,該第1脆性基板具有第1主面、及與該第1主面相反之第2主面,且具有與該第1主面垂直之厚度方向;準備第2脆性基板之步驟,該第2脆性基板具有第3主面、及與該第3主面相反之第4主面;按壓步驟,係將刃前端按壓於該第1脆性基板之該第1主面;以及形成第1溝槽線之步驟,係使藉由該按壓步驟而按壓之該刃前端在該第1脆性基板之該第1主面上滑動,而在該第1脆性基板之該第1主面上使塑性變形產生,藉此形成具有槽形狀之該第1溝槽線;形成該第1溝槽線之步驟,係以在該第1溝槽線之緊鄰下方,該第1脆性基板獲得在與該第1溝槽線交叉之方向連續地相連之狀態即無裂紋狀態的方式進行;進一步具備:貼合步驟,係在形成該第1溝槽線之步驟後,以該第1脆性基板之該第1主面與該第2脆性基板之該第3主面相對向之方式,使該第1脆性基板及該第2脆性基板相互貼合;使該第1脆性基板及該第2脆性基板相互貼合之該貼合步驟,係以形成在該第1脆性基板之該第1溝槽線至少部分覆蓋於該第2脆性基板之方式進行;進一步具備:形成第1裂紋線之步驟,係在使該第1脆性基板及該第2脆性基板相 互貼合之步驟後,藉由沿著該第1溝槽線使該厚度方向中的該第1脆性基板之裂紋伸展,而形成該第1裂紋線;藉由該第1裂紋線,切斷在該第1溝槽線之緊鄰下方、該第1脆性基板在與該第1溝槽線交叉之方向連續的相連;進一步具備:形成第2裂紋線之步驟,係在該第2脆性基板之該第4主面上形成該第2裂紋線;以及分斷步驟,係藉由在該第1脆性基板之該第2主面上局部地施加負載而使該第1脆性基板及該第2脆性基板彎曲,藉此分別沿該第1裂紋線及該第2裂紋線分斷該第1脆性基板及該第2脆性基板。 A method of manufacturing a liquid crystal display panel, comprising: preparing a first fragile substrate having a first main surface and a second main surface opposite to the first main surface, and having a step in which the first main surface is perpendicular to the thickness direction; a second brittle substrate having a third main surface and a fourth main surface opposite to the third main surface; and a pressing step of the blade front end Pressing the first main surface of the first brittle substrate; and forming a first groove line, the tip end of the blade pressed by the pressing step is on the first main surface of the first brittle substrate Sliding, plastic deformation is generated on the first main surface of the first brittle substrate, thereby forming the first groove line having a groove shape; and the step of forming the first groove line is 1 immediately below the groove line, the first brittle substrate is obtained in a state in which the first brittle substrate is continuously connected to the first groove line, that is, in a state of no crack, and further includes a bonding step for forming the first After the step of the groove line, the first main surface and the second surface of the first brittle substrate The first brittle substrate and the second brittle substrate are bonded to each other in such a manner that the third main surface of the substrate is opposed to each other; and the bonding step of bonding the first brittle substrate and the second brittle substrate to each other is The first groove line formed on the first brittle substrate is at least partially covered on the second brittle substrate, and further includes a step of forming a first crack line, and the first brittle substrate and the first brittle substrate are provided Second brittle substrate phase After the step of bonding each other, the first crack line is formed by stretching a crack of the first brittle substrate in the thickness direction along the first groove line, and the first crack line is cut by the first crack line Immediately below the first groove line, the first brittle substrate is continuously connected in a direction intersecting the first groove line, and further includes a step of forming a second crack line in the second brittle substrate Forming the second crack line on the fourth main surface; and dividing the first brittle substrate and the second brittleness by locally applying a load on the second main surface of the first brittle substrate The substrate is bent, whereby the first fragile substrate and the second brittle substrate are separated along the first crack line and the second crack line, respectively. 如申請專利範圍第1項之液晶顯示面板之製造方法,其中,形成該第2裂紋線之步驟,係在使該第1脆性基板及該第2脆性基板相互貼合之步驟後,藉由使刃前端沿著供形成該第2裂紋線之線而在該第2脆性基板之該第4主面上位移而進行。 The method of manufacturing a liquid crystal display panel according to claim 1, wherein the step of forming the second crack line is performed by bonding the first brittle substrate and the second brittle substrate to each other The tip end of the blade is displaced along the fourth main surface of the second brittle substrate along a line for forming the second crack line. 如申請專利範圍第1項之液晶顯示面板之製造方法,其中,形成該第2裂紋線之步驟,包含藉由在該第2脆性基板之該第4主面上使塑性變形產生,而形成具有槽形狀之第2溝槽線之步驟。 The method of manufacturing a liquid crystal display panel according to claim 1, wherein the step of forming the second crack line includes forming plastic deformation on the fourth main surface of the second brittle substrate to form The step of the second groove line of the groove shape. 如申請專利範圍第3項之液晶顯示面板之製造方法,其中,形成該第2溝槽線之步驟,係在使該第1脆性基板及該第2脆性基板相互貼合之步驟前進行。 The method of manufacturing a liquid crystal display panel according to claim 3, wherein the step of forming the second trench line is performed before the step of bonding the first brittle substrate and the second brittle substrate to each other.
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