TW201604935A - Cylindrical-member-position detection device, substrate processing device, device manufacturing method, and sheet substrate conveying device - Google Patents

Abstract

A cylindrical-member-position detection device is provided with: a second drum member (22); a plurality of scale increments (GP) that are disposed annularly along the direction of the rotation of the second drum member (22), rotate around a second central axis (AX2) together with the second drum member (22), and are for measuring positional variation of the second drum member (22) in the circumferential direction; an encoder head (EN4), which is for reading the scale increments (GP); and an encoder head (EN5), which is disposed in a different position than encoder head (EN4) and is for reading the scale increments (GP). Further, the cylindrical-member-position detection device corrects error in the scale increments (GP) on the basis of the value read by encoder head (EN4) and the value read by encoder head (EN5).

Description

Position detecting device for cylindrical member, substrate processing device, component manufacturing method, and sheet substrate transfer device

The present invention relates to a position detecting device for a cylindrical member, a substrate processing device, a device manufacturing method, and a sheet substrate transfer device.

Among the exposure apparatuses used in the lithography process, there is an exposure apparatus which exposes a substrate using a cylindrical or cylindrical mask as disclosed in the following patent document (for example, Patent Document 1).

In the case where a plate-shaped reticle is used, when a substrate is exposed by using a cylindrical or cylindrical reticle, in order to expose the image of the reticle pattern to the substrate, Patent Document 1 describes a predetermined area of the pattern forming surface of the cylindrical mask, the position pattern is formed with a position information acquisition mark (scale, alignment mark, etc.) in a predetermined position relationship, and the encoder system detects the scale to obtain a pattern on the pattern forming surface. The composition of the position information in the circumferential direction (or the direction of the rotation axis).

In addition, it is also proposed to continuously expose the long strip-shaped substrate by using a cylindrical mask on a flexible long strip-shaped substrate, and to wind the long sheet-like substrate around the feed roller to make the cylindrical mask close to winding. An exposure apparatus capable of producing a high-productivity element (exposure treatment) by rotating the feed roller and the cylindrical mask on the sheet substrate of the feed roller (for example, see Patent Document 2).

Advanced technical literature

[Patent Document 1] Japanese Patent Laid-Open No. Hei 7-153672

[Patent Document 2] Japanese Patent Laid-Open No. Hei 8-213305

The processing device for treating the object to be processed (sheet substrate) having a curved surface of a cylindrical member such as a feed roller is required to be able to detect the position in the circumferential direction of the cylindrical member with good precision. As disclosed in Patent Document 1, even in the case where the position information acquisition mark (scale) is engraved on the circumferential surface of the cylindrical mask, there is a possibility that the coding is caused by the manufacturing error of the scale of the scale or the expansion and contraction caused by the temperature. The result of the measurement of the device causes an error, and the position detection accuracy of the cylindrical member in the circumferential direction is lowered.

An object of the present invention is to correct an error caused by a scale for position detection when detecting a position of a cylindrical member in a circumferential direction.

According to a first aspect of the present invention, a position detecting device for a cylindrical member includes: a cylindrical member having a curved surface curved at a constant radius from a predetermined axis, rotating about the predetermined axis; a plurality of scales along the circle The tubular member is arranged in a ring shape in a ring shape, and rotates around the shaft together with the cylindrical member to measure a positional change in at least a circumferential direction of the curved surface; the first reading portion is disposed opposite to the scale. The second reading unit is disposed opposite to the scale and disposed at a position different from the first reading unit in a circumferential direction of the cylindrical member for reading the scale; and The correction unit corrects the interval between the complex scale obtained from the read value of the first reading unit based on the read value of the first reading unit and the read value of the second reading unit 2 At least one of the intervals of the complex scale obtained by the read value of the reading unit.

According to a second aspect of the present invention, there is provided a substrate processing apparatus comprising: the position detecting device for the cylindrical member; the cylindrical member being attached to a portion of the curved-wound substrate and rotating around the shaft to carry the substrate; A processing unit that applies a predetermined process to the substrate at a specific position in a circumferential direction of the curved surface in a portion of the substrate wound around the curved surface.

According to a third aspect of the present invention, a method of manufacturing a device for forming the pattern on the substrate by using the substrate processing apparatus is provided.

According to a fourth aspect of the present invention, there is provided a sheet-like substrate conveying apparatus which supports a flexible long sheet-like substrate while supporting an outer peripheral surface of a cylindrical member which is rotated about a predetermined central axis of rotation In the directional direction, the scale portion is arranged in a ring shape along a direction in which the cylindrical member rotates, and rotates around the central axis of rotation together with the cylindrical member, and is provided at all circumferences to at least measure the circumference of the outer peripheral surface a plurality of scales in which the position of the direction changes; the first reading unit is disposed opposite to the scale for reading the scale; and the second reading unit is opposed to the scale and in a circumferential direction of the cylindrical member Arranging at an angular position different from the first reading unit for reading the scale; and the memory unit reading the scale of the first reading unit and the scale of the second reading unit The value difference is successively stored for each predetermined rotation angle of the scale portion, and according to the difference, the error information related to the error between the scale portion and the scale is stored; and the correction portion is corrected according to the error information. The reading value of the scale of the first reading unit The value of at least one of the read values of the scale of the second reading unit is output as the transport position or the transport amount of the sheet substrate in the longitudinal direction.

According to a fifth aspect of the present invention, there is provided a sheet-like substrate conveying apparatus which supports a flexible sheet-like substrate with an outer peripheral surface of a cylindrical member which is rotated about a predetermined central axis of rotation. Carrying, in the direction of the strip, comprising: a scale portion having a scale formed at a predetermined pitch in a rotation direction of the cylindrical member along a circumference of a radius of a central axis of the cylindrical member, and the cylindrical member Rotating around the central axis; the first reading unit is configured to read the scale of the scale portion at a first position in the circumferential direction of the scale portion as the position of the cylindrical member rotates; and the second reading unit The scale of the scale portion is read at a second position separated by the angle θs from the first position in the circumferential direction of the scale portion, and the position of the cylindrical member is rotated; and the chart forming portion is rotated every time the cylindrical member is rotated. When the angle α is different from the angle θs, the cylindrical member is rotated once or more by the position information of the scale measured by the reading of each of the first reading unit and the second reading unit. The period of the plurality of rotations is successively determined to obtain a graph relating to the error between the scales of the scale portion.

According to the aspect of the invention, the error generated by the position detecting scale can be corrected when the position of the cylindrical member in the circumferential direction is detected.

9‧‧‧Transporting device

11‧‧‧Substrate processing unit

12‧‧‧Photomask holder

13‧‧‧Light source device

14‧‧‧Control device

21‧‧‧1st tubular member

22‧‧‧2nd tubular member

23‧‧‧ Guide roller

24‧‧‧Drive roller

25‧‧‧1st detector

26‧‧‧First Drive Department

31‧‧‧1st guiding member

33‧‧‧2nd guiding member

35‧‧‧2nd detector

36‧‧‧2nd drive department

41‧‧‧1st Optical Department

42‧‧‧2nd Optical Department

43‧‧‧1st field of view

44‧‧‧Focus correction optical components

45‧‧‧Image offset correction optical components

46‧‧‧Rotary correction mechanism

47‧‧‧ magnification correction optical components

50‧‧‧1st deflecting member

51‧‧‧1st lens group

52‧‧‧1st concave mirror

57‧‧‧2nd deflecting member

58‧‧‧2nd lens group

59‧‧‧2nd concave mirror

60‧‧‧Adjustment components

61‧‧‧ Screw Department

62‧‧‧ head

AM1, AM2‧‧‧ observation of the bearing line

AMG1, AMG2‧‧‧ alignment microscope

AX1‧‧‧Rotation centerline (1st central axis)

AX2‧‧‧Rotation centerline (2nd central axis)

Cs‧‧‧ roundness adjustment mechanism

Dc‧‧‧ slot

DM‧‧‧Cylinder reticle

EN, EN1, EN2, EN3, EN4, EN5, EH1, EH2, EH3, EH4, EH5‧‧‧ encoder read head

EX, EX1, EX2, EX3, EX4‧‧‧ exposure devices

GP, GPd, GPM, GPM‧‧ ‧ ruler

IA‧‧ ‧ sheet entry area

IL‧‧‧Lighting Module

IR1~IR6‧‧‧Lighting area

Le1, Le2, Le3, Le4, Le5‧‧‧ set the bearing line

NS‧‧‧Measurement ruler number

OA‧‧ ‧ sheet detachment area

P‧‧‧Substrate

P3‧‧‧ center face

PA1~PA6‧‧‧projection area

PL‧‧‧Projection Optics

SB‧‧‧ bearing components

Sc‧‧ slot

SD‧‧‧Encoder scale disc

SP1, SP2‧‧‧ polarizing beam splitter

ST‧‧‧Rotary axis

TBc‧‧‧Revision chart

Fig. 1 is a schematic view showing the overall configuration of a substrate processing apparatus (exposure apparatus) according to an embodiment.

2 is a schematic view showing the arrangement of the illumination area and the projection area in FIG. 1.

Fig. 3 is a schematic view showing the configuration of a projection optical system applied to the substrate processing apparatus (exposure apparatus) of Fig. 1.

4 is a perspective view showing a second tubular member (rotating cylinder) applied to the substrate processing apparatus (exposure apparatus) of FIG. 1.

Fig. 5 is a perspective view for explaining a relationship between a detector and a reading device which are applied to the substrate processing apparatus (exposure apparatus) of Fig. 1.

Fig. 6 is an explanatory view showing the position of the encoder scale disk and the reading device of the embodiment seen in a plane orthogonal to the rotation center line.

Figure 7 is an enlarged view showing the scale of the scale in a schematic manner.

Figure 8 is a schematic diagram showing the positional relationship between the scale and the encoder read head.

Figure 9 is a flow chart showing the sequence of correcting the scale pitch error of the scale.

Fig. 10 is a view showing the relationship between the scale disk having the scale on the outer peripheral surface and the encoder read head.

Fig. 11 is a view showing an example of a correction map.

Figure 12 is a conceptual diagram showing the timing of obtaining such read values from a pair of encoder read heads.

Figure 13 is a conceptual diagram showing the timing of obtaining such read values from a pair of encoder read heads.

Figure 14 is a flow chart showing the sequence of correcting the scale error.

Fig. 15 is an explanatory view for explaining a true roundness adjustment mechanism for adjusting the roundness of the encoder scale disk.

Fig. 16 is an explanatory view for explaining a true roundness adjustment mechanism for adjusting the roundness of the encoder scale disk.

Fig. 17 is a schematic view showing a first modification of the substrate processing apparatus (exposure apparatus).

Fig. 18 is an explanatory view for explaining the position of the reading device as seen from the direction of the center line of rotation of the encoder scale disk of the first modification of the substrate processing apparatus (exposure apparatus).

Fig. 19 is a schematic view showing the overall configuration of a second modification of the substrate processing apparatus (exposure apparatus).

20 is a view showing the overall configuration of a third modification of the substrate processing apparatus (exposure apparatus). intention.

Fig. 21 is a schematic view showing the overall configuration of a modification of the substrate processing apparatus (exposure apparatus).

Fig. 22 is a signal waveform diagram for explaining the actual reading operation using the scale of the encoder read head shown in each of Figs. 4 to 6, 10, and 16 to 21, respectively.

Fig. 23 is a view showing a configuration in which the side end faces of the scale disc are formed with a scale, and the same as Fig. 6 is seen from the direction in which the center line of rotation extends.

Figure 24 is a cross-sectional view taken along line A-A' of the configuration of Figure 23 taken along the plane including the orientation line and the center line of rotation.

Figure 25 is a view similar to the prior Figure 6 showing the arrangement of the scale disc and the encoder read head seen from the XZ plane.

Fig. 26 is a flow chart showing the procedure of a method of manufacturing an element using the substrate processing apparatus (exposure apparatus) of the embodiment.

The embodiment (embodiment) for carrying out the invention will be described in detail with reference to the drawings. The present invention is not limited by the embodiments described below. In the following embodiments, a so-called roll-to-roll exposure apparatus in which a substrate is continuously manufactured by various processes for manufacturing one type of element will be described. Further, hereinafter, an XYZ orthogonal coordinate system is set, and the positional relationship of each unit will be described with reference to the XYZ orthogonal coordinate system. For example, the predetermined direction in the horizontal plane is the X-axis direction, the direction orthogonal to the X-axis direction in the horizontal plane is the Y-axis direction, and the direction orthogonal to the X-axis direction and the Y-axis direction (ie, vertical) Direction) is the Z-axis direction.

1 is a view showing the overall structure of a substrate processing apparatus (exposure apparatus) of an embodiment; A schematic diagram of the formation. 2 is a schematic view showing the arrangement of the illumination area and the projection area of FIG. 1. Fig. 3 is a schematic view showing the configuration of a projection optical system applied to the substrate processing apparatus (exposure apparatus) of Fig. 1. As shown in FIG. 1, the substrate processing apparatus 11 includes an exposure apparatus (processing unit) EX and a sheet-like substrate transport apparatus (hereinafter, referred to as a transport apparatus). In the exposure apparatus EX, the substrate P (sheet, film, or the like) is supplied by the transport device 9. For example, there is a flexible long sheet-like substrate P which is pulled out from a supply roll (not shown), and sequentially subjected to a substrate processing apparatus for a pre-process, and then a substrate processing apparatus (exposure apparatus) 11 The processing is carried out by the transfer device 9 to the substrate processing apparatus for the post-process, and then wound up to the component manufacturing system of the recovery roll. As described above, the substrate processing apparatus 11 can be used as part of a component manufacturing system (manufacturing line of a flexible display).

The exposure apparatus EX of the substrate processing apparatus 11 is a so-called scanning exposure apparatus that transmits the image of the pattern formed in the cylindrical mask DM while synchronously driving the rotation of the cylindrical mask DM and the conveyance of the flexible substrate P. The projection optical system PL (PL1 to PL6) whose projection magnification is equal to (×1) is projected on the substrate P. Further, in the exposure apparatus EX shown in Fig. 1, the Y-axis of the XYZ orthogonal coordinate system is set to be parallel to the rotation center line AX1 of the first drum member 21 constituting the cylindrical mask DM. Similarly, the rotation center line AX2 of the second tubular member 22, which is a cylindrical member of the cylindrical member, is supported in a one-to-one direction in the longitudinal direction of the substrate P, and is set to be parallel to the Y-axis of the XYZ orthogonal coordinate system.

As shown in FIG. 1, the exposure apparatus EX includes a mask holding device 12, an illumination unit IU, a projection optical system PL, and a control device 14. In the exposure device EX, the cylindrical mask DM held by the mask holding device 12 is rotationally moved (swiveled), and the substrate P is transported by the transport device 9. The illumination mechanism IU will be held in a portion (illumination area IR) of the cylindrical mask DM of the mask holding device 12, and illuminated by the illumination beam EL1 with uniform brightness. Projection optics PL, round The image of the pattern of the illumination mask IR in the cylindrical mask DM is projected onto one of the substrates P (projection area PA) transported by the transport device 9. As the cylindrical mask DM moves, the portion disposed on the cylindrical mask DM of the illumination region IR changes. Further, as the substrate P moves, the portion disposed on the substrate P of the projection area PA changes. In this manner, the image of the predetermined pattern (mask pattern) formed on the surface of the cylindrical mask DM is projected onto the cylindrical surface of the substrate P through the projection optical system PL (PL1 to PL6). The control device 14 controls each unit of the exposure device EX so that each unit performs processing. Further, in the present embodiment, the control device 14 controls the transport device 9.

The control device 14 may be a part or all of the plurality of substrate processing device upper control devices that collectively control the component manufacturing system. Further, the control device 14 may be another device that is controlled by the higher-level control device and that is different from the higher-level control device. The control device 14, for example, includes a computer system. The computer system includes hardware such as a CPU (Central Processing Unit), various memories, an OS (Operating System), and peripheral devices. The operation program and parameters of each unit of the substrate processing apparatus 11 are stored in a computer-readable recording medium in the form of a computer program, and the program is read and executed by the computer system to perform various processes.

When the computer system can be connected to the Internet or the internal network system of the enterprise, it also includes the environment (or display environment) provided by the home page. Further, the computer readable recording medium includes a storage medium such as a floppy disk, a magneto-optical disk, a ROM, a CD-ROM, and the like, and a storage device built in a hard disk of a computer system. A computer-readable recording medium, which also includes a communication line that transmits a program through a communication line such as the Internet or a telephone line, etc., can dynamically maintain the computer program in a short period of time, and the server in such a situation and As a volatile memory inside the customer's computer system, the programmer is kept for a certain period of time. In addition, the computer program may be implemented to implement part of the functions of the substrate processing apparatus 11, or may be implemented by a combination with a program already recorded in the computer system. The function of the substrate processing apparatus 11. The upper control device can be realized by a computer system similarly to the control device 14.

As shown in FIG. 1, the mask holding device 12 includes a first tubular member 21 that holds the cylindrical mask DM, a guide roller 23 that supports the first tubular member 21, and a first driving unit according to a control command of the control device 14. The drive roller 24 that drives the first tubular member 21 and the first detector 25 that detects the position of the first tubular member 21 are driven.

The first tubular member 21 has a cylindrical member that is curved from a rotation center line AX1 (hereinafter, also referred to as a first central axis AX1 as appropriate) having a predetermined radius, and is rotated around the rotation center line AX1. The first tubular member 21 has a first surface P1 on which an illumination region IR of the cylindrical mask DM is disposed, and the first surface P1 is formed by rotating a line (busbar) around a first central axis AX1 parallel to the line. Cylinder surface. The cylindrical surface is, for example, a peripheral surface other than the cylinder or a cylindrical outer surface or the like. The first tubular member 21 is made of, for example, glass or quartz, has a cylindrical shape having a constant thickness, and its outer peripheral surface (cylindrical surface) is the first surface P1. That is, in the present embodiment, the illumination region IR of the cylindrical mask DM is curved in a cylindrical shape having a constant radius r1 from the rotation center line AX1. As described above, the first tubular member 21 has a curved surface (a cylindrical surface having a predetermined curvature) curved at a constant radius from the rotation center line AX1.

The cylindrical reticle DM is, for example, a sheet-shaped reticle that is formed by a light-shielding layer of chrome or the like on one side of a short strip-shaped ultra-thin glass plate (for example, a thickness of 100 μm to 500 μm) having a high flatness. . In the mask holding device 12, the cylindrical mask DM formed of the extremely thin glass plate is bent along the curved surface of the outer peripheral surface of the first tubular member 21, and is used in a state of being wound around (attached) the curved surface. The cylindrical mask DM has a pattern non-formation region in which no pattern is formed, and the pattern non-formation region is attached to the first tubular member 21. The cylindrical mask DM can be attached to the first tubular member 21 or from the first The tubular member 21 is removed.

Further, instead of forming the cylindrical mask DM with an extremely thin glass plate, the cylindrical mask DM may be wound around the first tubular member 21 made of a transparent cylindrical base material, and the first tubular member 21 may be made of quartz. In the production of a transparent cylindrical base material, a reticle pattern formed of a light shielding layer such as chrome is directly formed on the outer peripheral surface thereof. At this time, the function of the first tubular member 21 is also a supporting member of the pattern of the cylindrical mask DM.

The first detector 25 optically detects the rotational position of the first tubular member 21, and is configured by, for example, a rotary encoder or the like. The encoder can be either absolute or incremental. The first detector 25 outputs information indicating the rotational position of the first tubular member 21, for example, a 2-phase signal from an encoder read head to be described later, to the control device 14. The first drive unit 26 including an actuator such as an electric motor adjusts a torque and a rotational speed for rotating the drive roller 24 in accordance with a control signal input from the control device 14. The control device 14 controls the first drive unit 26 based on the detection result of the first detector 25 to control the rotational position of the first tubular member 21. The control device 14 controls one or both of the rotational position and the rotational speed of the cylindrical mask DM held by the first tubular member 21.

The transport device 9 includes a drive roller DR4, a first guide member 31, a second tubular member 22 that forms a second surface P2 of the projection area PA on which the substrate P is placed, a second guide member 33, drive rollers DR4 and DR5, and a second 2 detector 35 and second drive unit 36.

In the present embodiment, the substrate P transported from the upstream side of the transport path of the substrate P, that is, from the side opposite to the transport (movement) direction of the substrate P, to the drive roller DR4 is transported to the first guide member via the drive roller DR4. 31. The substrate P that has passed through the first guiding member 31 is supported on the surface of the cylindrical or cylindrical second tubular member 22 having a radius r2, and is transported to the second guiding member 33. The substrate P that has passed through the second guiding member 33 is transported to the downstream of the transport path. Further, the rotation center line AX2 of the second tubular member 22 and the respective rotation center lines of the drive rollers DR4 and DR5 are set to be parallel to the Y-axis.

For example, the first guiding member 31 and the second guiding member 33 can be moved in the conveying direction of the substrate P, thereby adjusting the tension acting on the conveying path of the substrate P in the conveying direction. Further, the first guiding member 31 (and the driving roller DR4) and the second guiding member 33 (and the driving roller DR5) can be formed, for example, in the width direction of the substrate P (orthogonal to the conveying direction of the substrate P). The direction and the Y direction are moved, and the position of the substrate P wound around the outer circumference of the second tubular member 22 in the Y direction is adjusted. Further, the transport device 9 can transport the substrate P along the projection area PA of the projection optical system PL, and the configuration of the transport device 9 can be appropriately changed.

The second tubular member 22 has a curved surface (a cylindrical surface having a predetermined curvature) which is curved at a constant radius from a rotation center line AX2 (hereinafter, also referred to as a second central axis AX2) which is a predetermined axis, and is a cylindrical member. A rotating cylinder that rotates around the second central axis AX2. The second tubular member 22 forms a second surface (support surface) P2. The second surface P2 is a portion of the substrate P from which the imaging beam of the projection optical system PL is projected, and the portion including the projection area PA is supported in an arc shape (cylindrical shape). In the present embodiment, the second tubular member 22 serves as a supporting member (substrate stage) for supporting the substrate P to be exposed together with one of the conveying devices 9. That is, the second tubular member 22 may be a part of the exposure device EX. As described above, the second tubular member 22 is rotatable about the rotation center line AX2 (second center axis AX2), and the substrate P is curved into a cylindrical shape along the outer circumferential surface (cylindrical surface) of the second tubular member 22. The projection area PA is disposed on one of the curved substrate P. Therefore, the substrate P includes a rotational movement of the peripheral surface portion of the projection area PA in the cylindrical surface of the radius r2.

In the present embodiment, the second tubular member 22 is caused by including an electric motor or the like. The torque supplied by the second drive unit 36 of the actuator rotates. The second detector 35 is configured by, for example, a rotary encoder, and optically detects the rotational position of the second tubular member 22. The second detector 35 outputs information indicating the detected rotational position of the second tubular member 22 (for example, two-phase signals from encoder read heads EN1, EN2, EN3, EN4, and EN5, which will be described later) to the control device 14. The second drive unit 36 adjusts the torque and the rotational speed at which the second tubular member 22 rotates in accordance with the control signal supplied from the control device 14. The control device 14 controls the second drive unit 36 based on the detection result of the second detector 35, and controls the rotational position of the second tubular member 22 to control the first tubular member 21 (cylinder mask DM) and the second tubular member. 22 synchronous movement (synchronous rotation). Details of the second detector 35 will be described later.

The exposure apparatus EX is an exposure apparatus that mounts a so-called multi-lens projection optical system PL. The projection optical system PL includes a plurality of projection modules that project an image of one of the patterns of the cylindrical mask DM. For example, in FIG. 1, the rotation center line AX1 of the cylindrical mask DM and the second central axis AX2 of the second tubular member 22 and the center plane P3 parallel to the YZ plane are on the left side (the side opposite to the transport direction of the substrate P). Three projection modules (projection optical systems) PL1, PL3, and PL5 are arranged at regular intervals in the Y direction, and three units are arranged at a predetermined interval in the Y direction on the right side of the center plane P3 (the transport direction side of the substrate P). Projection modules (projection optics) PL2, PL4, PL6.

In the multi-lens type exposure apparatus EX, the areas (projection areas PA1 to PA6) exposed by the plurality of projection modules PL1 to PL6 are superimposed on each other in the Y direction by scanning, so as to be projected. The overall image of the pattern. In such an exposure apparatus EX, even if the size of the pattern in the Y direction is large on the cylindrical mask DM, and the necessity of processing the substrate P having a large width in the Y direction is inevitable, it is only necessary to set the projection mode in the Y direction. Group PL, and corresponding projection module Since the module of the illumination mechanism of the PL is on the IU side, there is an advantage that the size of the display panel (the width of the substrate P) can be easily increased.

Of course, the exposure device EX may not be in a multi-lens mode. For example, when the dimension of the substrate P in the width direction is somewhat small, the exposure apparatus EX can project an image of the full width of the pattern onto the substrate P by one projection module. Further, a plurality of projection modules PL1 to PL6 may respectively project a pattern corresponding to one element. That is, the exposure device EX can project a plurality of component pattern projections in parallel by a plurality of projection modules.

The illumination unit IU includes a light source device 13 and an illumination optical system. The illumination optical system corresponds to each of the plurality of projection modules PL1 to PL6, and includes a plurality of (for example, six) illumination modules IL arranged in the Y-axis direction. The light source device 13 includes a solid light source such as a lamp light source such as a mercury lamp, a laser diode, or a light emitting diode (LED), or a gas laser light source. The illumination light emitted from the light source device is, for example, a bright line (g line, h line, i line) emitted from a light source, far ultraviolet light (DUV light) such as KrF excimer laser light (wavelength 248 nm), or ArF excimer laser light ( Wavelength 193 nm) and the like. The illumination light emitted from the light source device 13 is uniformized and transmitted to a plurality of illumination modules IL through a light guiding member such as an optical fiber.

Each of the plurality of illumination modules IL includes a plurality of optical members such as lenses. In the present embodiment, the light that is emitted from the light source device 13 and passed through any of the plurality of illumination modules IL is referred to as an illumination light beam EL1. Each of the plurality of illumination modules IL includes, for example, an integrator optical system, a rod lens, a fly-eye lens, etc., and the illumination region IR is illuminated by the illumination beam EL1 having a uniform illumination distribution. In the present embodiment, a plurality of illumination modules IL are disposed inside the cylindrical mask DM. Each of the plurality of illumination modules IL illuminates the illumination regions IR of the mask pattern formed on the outer circumferential surface of the cylindrical mask DM from the inside of the cylindrical mask DM.

Fig. 2 is a view showing the arrangement of the illumination area IR and the projection area PA in the present embodiment. Further, Fig. 2 shows a plan view (left side view in Fig. 2) of the illumination region IR disposed on the cylindrical mask DM of the first tubular member 21 as seen from the -Z side, and the configuration seen from the +Z side. A plan view of the projection area PA on the substrate P of the second tubular member 22 (the right side view in Fig. 2). The symbol Xs in Fig. 2 indicates the rotation direction (moving direction) of the first tubular member 21 (cylindrical mask DM) or the second tubular member 22.

A plurality of illumination modules IL respectively illuminate the first to sixth illumination regions IR1 to IR6 on the cylindrical mask DM. For example, the first illumination module IL illuminates the first illumination region IR1 and the second illumination module IL illuminates the second illumination region IR2.

The first illumination region IR1 is described as a trapezoidal region elongated in the Y direction. However, when the projection optical system (projection module) PL is used to form the projection optical system of the intermediate image plane, the intermediate image can be used. A position diaphragm plate having a trapezoidal opening is disposed at a position. Therefore, the first illumination region IR1 may be a rectangular region including the trapezoidal opening. Each of the third illumination region IR3 and the fifth illumination region IR5 has a region having the same shape as the first illumination region IR1, and is disposed at a constant interval in the Y-axis direction. Further, the second illumination region IR2 is a trapezoidal (or rectangular) region in which the center plane P3 and the first illumination region IR1 are symmetrical. Each of the fourth illumination region IR4 and the sixth illumination region IR6 has a region having the same shape as the second illumination region IR2, and is disposed at a constant interval in the Y-axis direction.

As shown in FIG. 2, each of the first to sixth illumination regions IR1 to IR6 is arranged such that the triangular portion of the oblique portion of the trapezoidal illumination region adjacent to the Y-axis direction is overlapped when viewed in the circumferential direction of the first surface P1. (overlap). Therefore, for example, the first region A1 on the cylindrical mask DM passing through the first illumination region IR1 due to the rotation of the first tubular member 21, that is, the rotation of the first tubular member 21 One of the second regions A2 on the cylindrical mask DM passing through the second illumination region IR2 is partially overlapped.

In the present embodiment, the cylindrical mask DM includes a pattern forming region A3 in which a pattern is formed and a pattern non-forming region A4 in which a pattern is not formed. The pattern non-formation region A4 is configured to be disposed to surround the pattern formation region A3 in a frame shape, and has a characteristic of shielding the illumination light beam EL1. The pattern forming region A3 of the cylindrical mask DM moves in the moving direction Xs as the first tubular member 21 rotates, and the first to sixth illumination regions IR1 to IR6 pass through the partial regions in the Y-axis direction in the pattern forming region A3. One of them. In other words, the first to sixth illumination regions IR1 to IR6 are arranged to cover the full width in the Y-axis direction of the pattern forming region A3.

As shown in FIG. 1, each of the plurality of projection modules PL1 to PL6 arranged in the Y-axis direction corresponds to each of the first to sixth illumination modules IL in a one-to-one correspondence, and will appear in the corresponding illumination module IL. An image of a partial pattern of the cylindrical mask DM in the illumination area IR of the illumination is projected onto each of the projection areas PA on the substrate P. For example, the first projection module PL1 corresponds to the first illumination module IL, and projects the image of the pattern of the cylindrical mask DM in the first illumination region IR1 (see FIG. 2) illuminated by the first illumination module IL. The first projection area PA1 on the substrate P. The third projection module PL3 and the fifth projection module PL5 correspond to the third to fifth illumination modules IL, respectively. The third projection module PL3 and the fifth projection module PL5 are disposed at positions overlapping the first projection module PL1 when viewed in the Y-axis direction.

Further, the second projection module PL2 corresponds to the second illumination module IL, and projects the image of the pattern of the cylindrical mask DM in the second illumination region IR2 (see FIG. 2) illuminated by the second illumination module IL. The second projection area PA2 on the substrate P. When viewed from the Y-axis direction, the second projection module PL2 is disposed at a symmetrical position with respect to the first projection module PL1 with the center plane P3 interposed therebetween.

The fourth projection module PL4 and the sixth projection module PL6 are respectively the fourth and sixth photos The Ming module IL is disposed correspondingly, and the fourth projection module PL4 and the sixth projection module PL6 are disposed at positions overlapping the second projection module PL2 when viewed in the Y-axis direction. With this arrangement, the odd-numbered first projection area PA1, the third projection area PA3, and the fifth projection area PA5 are shifted by a constant amount from the center plane P3 in the -X direction, and arranged in a line in the Y-axis direction. The even projection second projection area PA2, the fourth projection area PA4, and the sixth projection area PA6 are shifted by a constant amount from the center plane P3 in the +X direction, and arranged in a line in the Y-axis direction.

In the present embodiment, the illumination light beams EL1 are obtained from the illumination modules IL of the illumination unit IU to the illumination areas IR1 to IR6 on the cylindrical mask DM. Further, the intensity distribution of the cylindrical mask DM pattern appearing in each of the illumination regions IR1 to IR6 is modulated, and the light is incident on each of the projection modules PL1 to PL6 to reach the respective projection areas PA1 to PA6, and is imaged. Beam EL2. Among the imaging light beams EL2 reaching the respective projection areas PA1 to PA6, the chief ray passing through the respective center points of the projection areas PA1 to PA6, as shown in FIG. 1, is viewed from the second central axis AX2 of the second cylindrical member 22, and is clipped. The center plane P3 is disposed at a position (specific position) of the angle θ in the circumferential direction.

Each of the first to sixth projection regions PA1 to PA6 is disposed at an end portion (a triangular portion of a trapezoidal shape) of a projection region (odd number and even number) adjacent to a direction parallel to the second central axis AX2. The circumferential direction of the second surface P2 overlaps. Therefore, for example, the third region A5 on the substrate P that has passed through the first projection region PA1 due to the rotation of the second tubular member 22 is on the substrate P that has passed through the second projection region PA2 due to the rotation of the second tubular member 22. One of the fourth regions A6 is partially repeated. The first projection area PA1 and the second projection area PA2 are each set such that the exposure amount in the area overlapping the third area A5 and the fourth area A6 is substantially the same as the exposure amount of the non-overlapping area.

Next, the detailed configuration of the projection optical system PL of the present embodiment is referred to Figure 3 illustrates. Further, in the present embodiment, each of the second projection module PL2 to the fifth projection module PL5 has the same configuration as the first projection module PL1. Therefore, the configuration of the first projection module PL1 on behalf of the projection optical system PL will be described, and the description of each of the second projection module PL2 to the fifth projection module PL5 will be omitted.

The first projection module PL1 shown in FIG. 3 includes a first optical system 41 that images an image of the pattern of the cylindrical mask DM disposed in the first illumination region IR1 on the intermediate image plane P7, and the first optical system 41. At least a part of the formed intermediate image is re-imaged on the second optical system 42 of the first projection area PA1 of the substrate P, and the first field stop 43 disposed on the intermediate image plane P7 of the intermediate image.

Further, the first projection module PL1 includes a focus correction optical member 44, an image shift correction optical member 45, a rotation correction mechanism 46, and a magnification correction optical member 47. The focus correction optical member 44 is a focus adjustment device for finely adjusting the focus state of the pattern image (hereinafter, referred to as projection image) of the photomask formed on the substrate P. Further, the offset correction optical member 45 is an adjustment device for causing the projection image to slightly traverse in the image plane. The magnification correction optical member 47 is an adjustment device for micro-correcting the projection image magnification. The rotation correcting mechanism 46 is an adjusting device for rotating the projected image slightly in the image plane.

The imaging light beam EL2 from the pattern of the cylindrical mask DM is emitted from the first illumination region IR1 in the normal direction (D1), and enters the image shift correction optical member 45 through the focus correction optical member 44. The imaging beam EL2 that has passed through the image-correcting optical member 45 is reflected by the first reflecting surface (planar mirror) p4 of the first deflecting member 50 which is an element of the first optical system 41, and is disposed in the light after passing through the first lens group 51. The first concave mirror 52 is reflected by the first concave group 52, and is again reflected by the second reflecting surface (planar mirror) p5 of the first deflecting member 50, and is incident on the first field stop 43. The imaging light beam EL2 passing through the first field stop 43 is used as an element of the second optical system 42 The third reflecting surface (plane mirror) p8 of the second deflecting member 57 is reflected by the second lens group 58 and then reflected by the second concave mirror 59 disposed at the pupil position, and passes through the second lens group 58 to the second deflecting member 57 again. The fourth reflecting surface (planar mirror) p9 is reflected and incident on the magnification correcting optical member 47. The imaging light beam EL2 emitted from the magnification correction optical member 47 is incident on the first projection area PA1 on the substrate P, and the image of the pattern appearing in the first illumination area IR1 is projected onto the first projection at a magnification (×1). Area PA1.

When the radius of the cylindrical mask DM shown in FIG. 1 is r1, the radius of the substrate P wound on the second tubular member 22 on the cylindrical surface is r2, the radius r1 and the radius r2 are equal, each projection module The principal rays of the imaging beam EL2 of PL1 to PL6 on the reticle side are inclined to pass through the central axis AX1 of the cylindrical mask DM. The inclination angle thereof is the same as the inclination angle θ of the chief ray of the imaging light beam EL2 on the substrate P side (±θ with respect to the center plane P3).

In order to impart the inclination angle θ, the angle θ1 of the first reflection surface p4 of the first deflection member 50 with respect to the optical axis AX3 shown in FIG. 3 is set to be smaller than 45° Δθ1 and to be biased to the second relative to the optical axis AX4. The angle θ4 of the fourth reflecting surface p9 of the member 57 is set to be smaller than 45° by Δθ4. Δθ1 and Δθ4 are set to an angle Δθ1=Δθ4=θ/2 with respect to the angle θ shown in Fig. 1 .

4 is a perspective view of a second tubular member 22 (rotary cylinder) applied to the substrate processing apparatus (exposure apparatus) of FIG. 1. Fig. 5 is a perspective view for explaining a relationship between a detector and a reading device which are applied to the substrate processing apparatus (exposure apparatus) of Fig. 1. Fig. 6 is an explanatory view showing the position of the encoder scale disk and the reading device of the embodiment seen in the XZ plane orthogonal to the rotation center line AX2. In FIG. 4, for convenience of explanation, only the second to fourth projection areas PA2 to PA4 are illustrated, and illustration of the first, fifth, and sixth projection areas PA1, PA5, and PA6 is omitted.

The second detector 35 shown in FIG. 1 optically detects the position of the second tubular member 22 (specifically, the rotational position), and as shown in FIGS. 4 to 6, includes a high true circle as a scale member. The encoder encoder disc (disc) SD and the encoder read heads EN1, EN2, EN3, EN4, EN5 as reading units.

The encoder scale disk SD is fixed to one end of the second tubular member 22 that is orthogonal to the rotation axis ST of the second tubular member 22. Therefore, the encoder scale disk SD rotates integrally with the rotation axis ST about the rotation center line AX2. The encoder scale disc SD may be fixed to both end portions of the second tubular member 22. In other words, the encoder scale disk SD may be fixed to at least one end of the second tubular member 22.

On the outer peripheral surface of the encoder scale disc SD, a plurality of plural gauges for detecting the position or positional change in the circumferential direction of the second tubular member 22 (cylindrical member) as the scale for position detection are engraved (the score line) ) GP. Hereinafter, the scale GP is appropriately referred to as a scale GP. The portion of the scale GP at the encoder scale disc SD is the scale portion. The plurality of scales GP are arranged in a ring shape along the direction in which the second tubular member 22 rotates, for example, a lattice line having a pitch of 20 μm, and rotate together with the second tubular member 22 around the rotation axis ST (the second central axis AX2).

When viewed from the rotation axis ST (second rotation center line AX2), the encoder heads EN1, EN2, EN3, EN4, and EN5 are arranged at a predetermined pitch around the scale GP at a predetermined pitch. Each of the encoder read heads EN1 to EN5 is a non-contact type sensor that projects a measuring beam on the scale GP and photoelectrically detects a beam (diffracted light) reflected by the scale GP. Further, when the encoder heads EN1 to EN5 are viewed from the rotation axis ST (second rotation center line AX2) of the second tubular member 22, they are arranged in mutually different directions (angular positions) in the circumferential direction of the scale disk SD. ).

Each encoder read head EN1~EN5 is in the tangential direction of the scale GP (XZ The variation of the displacement of the in-plane has a reading device for measuring the sensitivity (detection sensitivity). As shown in FIG. 4, when the set orientation of each of the encoder heads EN1 to EN5 (the angular direction in the XZ plane centered on the rotation center line AX2) is represented by the set orientation lines Le1, Le2, Le3, Le4, and Le5, As shown in Fig. 6, the encoder read heads EN1, EN2 are arranged such that the orientation lines Le1, Le2 are set at an angle ± θ° with respect to the center plane P3. Further, in the present embodiment, the angle θ is set to, for example, 15°, but is not limited thereto.

In the projection modules PL1 to PL6 shown in FIG. 3, the substrate P is a processed object, and the substrate P is irradiated with a light beam as a pattern image to perform exposure processing. Therefore, the exposure apparatus EX includes the first processing unit including the odd-numbered projection modules PL1, PL3, and PL5 and the second processing unit including the even-numbered projection modules PL2, PL4, and PL6, and the substrate P is from the first processing unit. The chief ray of the imaging beam EL2 of each of the processing unit and the second processing unit (for example, the chief ray passing through the center point of the projection area PA) is incident on the substrate P perpendicularly when viewed from the XZ plane. As described above, the principal ray is incident on the substrate P at a specific position where the substrate P is subjected to processing (here, irradiation of the imaging beam).

When viewed from the second central axis AX2 of the second tubular member 22, the specific position is set at a position ±1 from the center plane P3 in the circumferential direction of the substrate P supported by the outer peripheral surface of the second tubular member 22. As shown in FIG. 4 and FIG. 6, the set azimuth line Le1 of the encoder read head EN1 is arranged to be the center point of each of the projection areas (projection fields) PA1, PA3, PA5 passing through the odd-numbered projection modules PL1, PL3, and PL5. The chief ray has the same inclination angle θ with respect to the center plane P3. Similarly, the set orientation line Le2 of the encoder read head EN2 is also configured to be opposite to the chief ray passing through the center points of the projection areas (projection fields) PA2, PA4, and PA6 of the even number projection modules PL2, PL4, and PL6. The inclination angle θ of the center plane P3 is uniform. Therefore, the encoder read heads EN1, EN2 The reading bit is on the scale GP connecting the specific position and the direction of the second central axis AX2.

The encoder read head EN4 is disposed on the upstream side in the transport direction of the substrate P, that is, before the exposure position (projection area), than the encoder read head EN1. And the encoder read head EN4 is arranged on the set orientation line Le4. The orientation line Le4 is set at a position where the set azimuth line Le1 of the encoder read head EN1 is directed to the upstream side of the transfer direction of the substrate P around the axis of the rotation center line AX2 to a position rotated by 90°. Further, the encoder read head EN5 is disposed on the set azimuth line Le5. The azimuth line Le5 is set at a position where the set azimuth line Le2 of the encoder read head EN2 is rotated by 90° about the axis of the rotation center line AX2 toward the upstream side in the transport direction of the substrate P.

As in the example previously shown, the chief ray of the imaging beam EL2 passing through the center of the odd-numbered projection areas PA1, PA3, PA5 and the principal ray of the imaging beam EL2 passing through the center of the even-numbered projection areas PA2, PA4, PA6 are opposite to the center plane P3. When the inclination angle ±θ is set to 15°, the deployment angle of the orientation line Le1 and the set orientation line Le2 in the XZ plane is set to 30°. Therefore, the deployment angle of the orientation line Le4 and the set orientation line Le5 in the XZ plane is also approximately 30°.

By arranging the encoder read heads EN4 and EN5 in the above manner, the direction of the set orientation lines Le4 and Le5 of the encoder read heads EN4 and EN5 of the read scale GP is arranged, and when viewed from the XZ plane and the rotation center line AX2, That is, the direction in which the principal ray of the counter substrate P and the imaging light beam EL2 enters the specific position of the substrate P is substantially orthogonal. Therefore, even when the second tubular member 22 is displaced in the Z direction due to a slight gap (about 2 μm to 3 μm) of the bearing supporting the rotating shaft ST, the second tubular member 22 can be traversed and possibly projected. The positional error in the direction of the imaging beam EL2 occurring in the regions PA1 to PA6 is measured with high precision by the encoder read heads EN1 and EN2.

Further, the encoder read head EN3 is disposed on the set azimuth line Le3. Set orientation The line Le3 is set to be rotated by 120° around the axis of the rotation center line AX2 at the set orientation line Le2 of the encoder read head EN2, and the set orientation line Le4 of the encoder read head EN4 is arranged around the axis of the rotation center line AX2 and the set orientation line Le2. The direction in which the direction of rotation is opposite is approximately 120°. That is, when viewed in the XZ plane, the three sets of orientation lines Le2, Le3, and Le4 extending from the rotation center line AX2 are set at intervals of approximately 120 degrees.

The scale member encoder scale disc SD is made of, for example, a metal having a low thermal expansion rate, glass, or ceramic as a base material. The encoder scale disc SD is made to have a large diameter (for example, a diameter of 20 cm or more) in order to improve the decomposition ability of the measurement. In FIG. 4, although the diameter of the encoder scale disk SD is smaller than the diameter of the second cylindrical member 22, the diameter of the outer peripheral surface of the substrate P is wound by the outer peripheral surface of the second cylindrical member 22. Consistent with the diameter of the SD scale GP of the encoder scale disc (to make it substantially uniform), the so-called measurement Abbe error can be further reduced.

The minimum pitch of the scale GP engraved in the SD circumferential direction of the encoder scale disc is limited by the performance of the scale engraving device for processing the encoder scale disc SD. Therefore, if the diameter of the encoder scale disc SD is increased, the angle measurement decomposition capability corresponding to the minimum pitch can be improved accordingly. The direction of the set azimuth lines Le1, Le2 of the encoder read heads EN1, EN2 for reading the scale GP is configured to be incident on the principal axis of the opposite substrate P and the imaging beam EL2 when viewed from the rotation center line AX2. The direction of the substrate P is the same. For example, even when the second tubular member 22 is displaced in the X direction due to a slight gap (about 2 μm to 3 μm) of the bearing that is supported by the rotating shaft ST, the second tubular member 22 can be displaced in the X direction. Therefore, the positional error of the substrate P in the transport direction (Xs) which may occur in the projection areas PA1 to PA6 due to the offset is accurately measured by the encoder read heads EN1 and EN2.

As shown in FIG. 5, in order to be supported on the curved surface of the second tubular member 22 In one of the parts P, the image of one portion of the mask pattern projected by the projection optical system PL shown in FIG. 1 is positioned (aligned) with respect to the substrate P, and the alignment mark or the like which is formed in advance on the substrate P is provided. A plurality of alignment microscopes AMG1, AMG2. The alignment microscopes AMG1 and AMG2 are pattern detecting devices arranged around the second tubular member 22. The alignment microscopes AMG1, AMG2 are detectors for detecting discrete or continuously formed specific patterns on the substrate P. The detection area of the detector is disposed on the upstream side in the transport direction of the substrate P from the specific position.

As shown in FIG. 5, the alignment microscopes AMG1 and AMG2 have a plurality of (for example, four) detectors arranged in a row in the Y-axis direction (the width direction of the substrate P). By aligning the microscopes AMG1 and AMG2, the alignment marks formed in the vicinity of both ends in the width direction of the substrate P can be observed or detected at any time by the detectors at the opposite ends of the second cylindrical member 22 in the Y-axis direction. Further, the alignment microscopes AMG1 and AMG2 can be observed or detected by, for example, a detector other than the both side ends of the second tubular member 22 in the Y-axis direction (the width direction of the substrate P) in the longitudinal direction. A plurality of alignment marks formed by a white portion or the like between the pattern forming regions of the display panel.

As shown in FIG. 5, the center of each observation region (detection center) on the substrate P and the line orthogonal to the second central axis AX2 by the alignment microscopes AMG1 and AMG2 are the observation azimuth lines AM1 and AM2. In this case, the observation direction lines AM1 of the four alignment microscopes AMG1 are arranged in parallel in the Y-axis direction. Similarly, the observation direction lines AM2 of the four alignment microscopes AMG2 are also arranged in parallel in the Y-axis direction.

As shown in FIGS. 5 and 6, when viewed in the XZ plane, the set azimuth line Le4 of the encoder read head EN4 is set in the same orientation as the respective observation direction lines AM1 of the four alignment microscopes AMG1. Further, the set azimuth line Le5 of the encoder read head EN5 is set in the same orientation as each of the observation azimuth lines AM2 of the four alignment microscopes AMG2.

As described above, each of the detectors of the alignment microscopes AMG1 and AMG2 is disposed around the second tubular member 22 when viewed from the second central axis AX2. Further, the detectors for the alignment microscopes AMG1 and AMG2 are connected to the arrangement positions of the encoder heads EN4 and EN5 and the direction of the second central axis AX2 (the installation direction lines Le4 and Le5) and the second central axis AX2 and the pair. The directions of the detection centers of the quasi-microscopes AMG1 and AMG2 are arranged in a same manner. Further, the encoders EN1 and EN5 corresponding to the respective observation areas (detection centers) of the alignment microscopes AMG1 and AMG2 are arranged, and the encoders EN1 and EN2 corresponding to the projection areas PA1 to PA6 of the corresponding projection modules PL1 to PL6 are rotated. As shown in FIG. 6, the position in the direction around the center line AX2 is set to the sheet detachment area OA where the substrate P starts to contact the sheet entry region IA of the second cylinder member 22 and the substrate P is detached from the second cylinder member 22. between.

The alignment microscopes AMG1, AMG2 are placed before the exposure position (projection area PA). The alignment microscopes AMG1 and AMG2 are formed, for example, by forming an image of an alignment mark (a region formed in a diagonal of several tens of μm to several hundreds μm) in the vicinity of the end portion of the sheet P in the Y direction, at a predetermined speed on the substrate P. In the state of being transported, image detection (sampling sampling) is performed at a high speed such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal Oxide Semiconductor). At the instant of the sampling, the control device 14 latches the rotational angular position of the encoder scale disk SD successively measured by the encoder read head EN4, thereby determining the marked position on the substrate P and the second tubular member 22 Correspondence of the position of the rotation angle.

When the mark detected by the alignment microscope AMG1 is also detected by the subsequent alignment microscope AMG2, the expansion and contraction of the substrate P and the slight sliding on the second cylindrical member 22 can also be measured. Storing the angle of the encoder reading head EN4 when storing the alignment microscope AMG1 for sampling The angular position Φa1 measured by the encoder read head EN5 when the same position is sampled with the alignment microscope AMG2.

Further, it is connected to each of the two encoder heads EN4, EN5 (and EN1, EN2, EN3) for outputting a corresponding angle position measurement worthy of a reversible counter (counter), for example, engraved on the scale disc SD The origin mark (not shown) of the outer peripheral surface is zero reset at the instant or any time detected by the specific encoder read head (any one of EN1 to EN5). The difference between the angular positions Φa1 and Φa2 obtained in this way is compared with the developed angle Φ0 of the set orientation lines Le4 and Le5 of the two alignment microscopes AMG1 and AMG2 which have been precisely corrected in advance. When an error occurs between the difference (Φa1 - Φa2) and the unfolding angle Φ0, there is a slight slip or transfer of the substrate P between the sheet entry region IA and the sheet detachment region OA on the second tubular member 22. The possibility of stretching in the direction (circumferential direction).

In general, the positional error during patterning depends on the fineness of the element pattern formed on the substrate P and the accuracy of the overlap. For example, a line pattern of 10 μm width is to be accurately overlapped with the bottom pattern layer, and only the line pattern can be allowed. The error of one-third or less, that is, the size on the conversion substrate P, can only allow positional errors of about ±2 μm. In order to achieve such high-precision measurement, it is necessary to measure the measurement direction of the mark image (the tangential direction of the outer circumference of the second cylindrical member 22 in the XZ plane) of each alignment microscope AMG1, AMG2, and the measurement of each encoder read head EN4, EN5. The direction (the tangential direction outside the scale GP in the XZ plane) is consistent within the allowable angle error.

As described above, the encoder read heads EN4 and EN5 are arranged to coincide with the alignment directions of the alignment marks on the substrate P (the tangential direction of the circumferential surface of the second cylindrical member 22) with the alignment microscopes AMG1 and AMG2. Therefore, even when the position of the substrate P (mark) is detected by the alignment microscopes AMG1 and AMG2 (during image sampling), the second cylinder member 22 (encoder scale disc SD) When the XZ plane is shifted to the circumferential direction (tangential direction) orthogonal to the set orientation line Le4 or Le5, high-precision position measurement in consideration of the offset of the second tubular member 22 can be performed.

Moreover, if the scale interval of the scale GP is constant, and there is no speed unevenness in the rotation, the interval between the read values of the encoder read heads EN1, EN2, EN3, EN4, and EN5 (the generation time of the rising and falling pulses of the counter) That is to be sure. However, in fact, there is a possibility that the encoder scale disk SD is deformed when the encoder scale disk SD is mounted on the second cylinder member 22, and the position of the encoder read heads EN1, EN2, EN3, EN4, EN5 is mounted ( The tilt, tilt error, the accuracy of the encoder scale disc SD, the eccentricity during installation, etc., cause an inherent error in the scale GP (the distance between the scale itself is uneven, eccentricity and deformation, etc.). Further, in the scale GP, there is a possibility that the encoder scale disk SD is stretched and contracted due to a temperature change of the substrate processing apparatus 11 during the operation, and the inherent error caused by the element that changes at any time. In the present embodiment, the measurement error caused by the inherent error of the scale GP caused by the above-described cause is obtained. And according to the obtained measurement error, a correction chart (map, correction amount data) for correcting the inherent error component of the scale GP is prepared, and each of the reading values (actual measurement values) of the plurality of encoder read heads EN1 to EN5 is corrected according to the correction chart. To perform a measurement that offsets or reduces the measurement error score caused by the inherent error of the scale GP.

In the present embodiment, the correction chart of the measurement error caused by the difference in the pitch between the scales of the scale GP and the unevenness of the pitch is formed by the outer circumference of the scale disc SD coaxially mounted with the second tubular member 22 as the cylindrical member. The actual measured values of the plurality of encoder read heads are implemented. Here, the correction chart is created by the encoder read head EN4 as the first reading unit, the encoder read head EN5 as the second reading unit, and the control unit 14 as the correction unit and the chart forming unit. In the present embodiment, the encoder read head EN4 is set to the first reading for the sake of convenience. The encoder read head EN5 is the second reading unit, but the first reading unit and the second reading unit may be any encoder read head that knows at least two positions of the mounting angle in advance.

As the control unit 14 of the correction unit, the difference between the read value of the encoder read head EN4 (the count value m4 of the set counter) and the read value of the encoder read head EN5 (the count value m5 of the set counter) is M4-m5), or from the predetermined value of the angular interval of the corresponding encoder read head EN4 and the encoder read head EN5 (for example, the value corresponding to the number of scales between them, set K45) minus the difference (m4-m5) The difference (K45-m4-m5) is the difference in the scale pitch generated in one minute of the scale GP, for example, from the origin position of the scale GP to the position of the predetermined angle. Next, the control device 14 stores the scale pitch error data of one of the scales GP as a correction chart, and corrects the read value of the encoder read head EN4, the read value of the encoder read head EN5 or other code according to the correction chart. The read values of the read heads EN1~EN3.

Fig. 7 is an enlarged view showing the scale of the scale GP in a schematic manner. Fig. 8 is a view showing the positional relationship between the scale GP and the encoder read heads EN4 and EN5. As shown in FIG. 7, the scale of the scale GP is constituted by, for example, a repetition of the convex portion GPt having the rising portion GPa and the descending portion GPb and the concave portion GPU between the adjacent convex portions GPT. In the present embodiment, one convex portion GPt and one concave portion GPU are one unit of the scale GP, that is, one pitch of the scale. For simplification of explanation, each of the encoder heads EN1 to EN5 outputs an up pulse U when reading the rising portion GPa of the scale, and outputs a down pulse D when reading the falling portion GPb.

The scale of the scale GP, the distance SS1 from the rising portion GPa to the rising portion GPa of the adjacent scale GP or the distance SS2 from the falling portion GPb to the descending portion GPb of the adjacent scale is the distance between the scales (interval) . When the designation of the encoder scale disc SD is set to the SS pitch, if the scale GP is correctly manufactured, it is on the scale GP. In either part, the distance SS1 or SS2 is consistent with the scale spacing SS.

Therefore, when the scale GP moves in the direction indicated by the arrow R of FIG. 7, when the pulse of the output of the encoder read head EN is observed, when two rising pulses U and one falling pulse U are output, or two falling pulses are output. When D and one rising pulse U, the outer circumference (scale GP) of the encoder scale disk SD (refer to FIG. 6) is a moving (rotation) scale pitch SS. If the pulse type of the encoder read head EN output is not distinguished, each time three pulses are detected, the outer circumference of the encoder scale disc SD is shifted by the scale interval SS.

Moreover, in the actual encoder measurement, a 2-phase signal (sin wave, cos wave) is generated from the encoder read head, and the interpolated signal processing for further subdividing the scale interval SS is performed based on the 2-phase signal. Therefore, the rising pulse U and the falling pulse D actually counted by the digital counter are generated at each position where the scale pitch SS is equally divided by one-tenth to one-tenth.

Fig. 8 is a schematic diagram showing that a plurality of scales of the scale GP provided on the outer peripheral portion of the scale disc SD are arranged in a straight line. In Fig. 8, the scale GP provided on the outer circumference of the encoder scale disk SD is moved in the direction indicated by the arrow R. The encoder read head EN4 as the first reading unit and the encoder read head EN5 as the second reading unit are arranged in this order toward the moving direction of the scale GP. The two encoder heads EN4 and EN5 move relative to the direction in which the scale GP moves in the case of the scale GP.

As shown in Fig. 6, a pair of encoder read heads EN4 and EN5 connect the line between the encoder read head EN4 and the second central axis AX2 (set the azimuth line Le4), and the coupled encoder read head EN5 and the second central axis AX2. The center angle (encoder mounting angle) sandwiched by the line (set the azimuth line Le5) is θs. Further, as shown in Fig. 8, a pair of encoder read heads EN4 and EN5 read the position of the scale GP on the surface of the encoder scale disk SD, and the linear distance in the circumferential direction of the scale GP (distance between the read heads) For XS.

When the pair of encoder heads EN4 and EN5 are mounted on the frame of the substrate processing apparatus 11, etc., the encoder mounting angle θs and the head-to-read distance XS are constant. As described above, the scale spacing SS is encoded due to the deformation of the encoder scale disc SD, the manufacturing accuracy of the encoder scale disc SD, the eccentricity during installation, the expansion and contraction of the encoder scale disc SD due to temperature changes, and the like. The circumferential direction of the gauge disc SD is not necessarily constant. For example, as illustrated in a very schematic manner, as shown in FIG. 8, the areas a, c, and d on the scale GP will have a rising portion GPa between one encoder mounting angle θs and one inter-header distance XS. When the descending portion GPb is set to one set, there are three scales GP. However, there are 2.5 regions b, and there are 6 scale GPs for region e.

In the example shown in Fig. 8, when the scale pitch SS is a design value, for example, between one encoder mounting angle θs and one inter-header distance XS, there is a predetermined number GP (three in this example). Actually, due to the error of the above-mentioned scale GP, the number of scales GP existing between one encoder mounting angle θs and one head-to-head distance XS is reduced by the aforementioned number. In the area a in Fig. 8, although the scale pitch is SSa, the number of scales GP in the region b is smaller than the predetermined number, so the scale pitch SSb of the region b is larger than the scale pitch SSa of the region a. Further, since the number of scales GP of the region e is larger than the prescribed number, the scale pitch SSe of the region e is smaller than the scale pitch SSa.

For example, suppose the design has a scale spacing SS of 100 and a design readhead distance XS of 300. In the areas a, c, and d of Fig. 8, the actual inter-header distance X calculated by reading the values of the scale GP (the counter count) by the encoder read heads EN4 and EN5 is 300. This is consistent with the distance XS between the read heads on the design. On the other hand, in the region b of FIG. 8, the actual read head distance X calculated based on the values read by the encoder read heads EN4 and EN5 (the count value of the counter) is 250. The actual inter-header distance X of the domain e, according to the read value of the encoder read heads EN4, EN5 (the counter value of the counter) is 600.

As described above, the difference between the design read head distance XS and the actual read head distance X is caused by the scale pitch error of the scale GP. After the pair of encoder read heads EN4 and EN5 are fixed to the device, the distance XS between the read heads does not change if the device is placed in a certain temperature environment. Therefore, for example, a graph of the scale pitch error of the scale GP obtained from the read values of the encoder heads EN4 and EN5 is made based on the inter-head reading distance XS after the encoder heads EN4 and EN5 are fixed (every week). The amount of error in the angular position of 360° or the correction amount of the error). After the chart is created, according to the reading value of the scale GP (counter value of the counter) of the encoder read head EN4, EN5 (or other read heads EN1~EN3), the error amount or correction amount corresponding to the angular position is taken from the chart. If it is called out and corrected one by one, it can instantly correct the moving distance error of the circumference of the scale GP.

When correcting the actual scale spacing error and the moving distance error of the scale GP, for example, the scale spacing SS when the scale GP has no error, the distance XS between the read heads and the distance X between the real heads, and thus the scale GP The actual scale pitch (actual scale pitch) SSr at the time of the error is obtained, for example, by the equation (1). The error of the scale GP is corrected by the use of the actual scale pitch SSr, and as a result, the error of the moving distance of the scale GP can also be corrected.

SSr=SS×XS/X...(1)

Moreover, the error of the scale GP can be corrected according to the number of scales GP (measured scale line) NS existing between the read heads XS read by the pair of encoder read heads EN4 and EN5 to correct the moving distance of the scale GP. error. The number of scale lines NS existing between the read heads and the XS is such that the rising pulse U and the falling pulse D obtained from the pair of encoder read heads EN4 and EN5 are transmitted. The count value of the counter is found. When the measurement scale line NS is used, the actual scale pitch SSr can be obtained by the equation (2) of the distance XS between the read heads.

SSr=XS/NS...(2)

The error of the scale pitch and the error of the moving distance of the scale GP may be applied to the control device 14 as the correction unit of the position detecting device of the cylindrical member, for example, by using the operation of the formula (1) or (2). The correction amount of the read value of a pair of encoder read heads EN4 and EN5. Therefore, the position detecting device and the substrate processing device 11 including the cylindrical member of the control device 14 can cause an error in the scale pitch SS by the deformation of the encoder scale disk SD on which the scale GP is provided, so that the error chart or the correction can be used. Since the use of the graph corrects the error almost instantaneously, it is possible to realize high-accuracy position measurement (position measurement in the circumferential direction) for the encoder scale disc SD and the second cylinder member 22. Next, the correction of the error of the scale pitch and the error of the moving distance will be described.

Figure 9 is a flow chart showing the sequence of correcting the scale pitch error of the scale. Fig. 10 is a view showing the relationship between the scale disk SD having the scale on the outer peripheral surface and the encoder read heads EN4 and EN5. Fig. 11 is a view showing an example of a correction chart. When the scale pitch error of the scale GP is corrected, as shown in FIG. 10, the inter-reader distance XS of a pair of encoder read heads EN4 and EN5 is measured in advance and stored in all the memory sections of the control device 14. The head-to-head distance XS is obtained by reading the scale GP on the outer peripheral surface of the encoder scale disk SD by a pair of encoder heads EN4 and EN5. The position of the pair of encoder read heads EN4 and EN5 reading the scale GP can be set to a position in which the encoder scale disk SD is a true circle and the encoder scale disk SD is not eccentric with respect to the rotation center line AX2. In this case, as shown in FIG. 10, on the curved surface Pd (the scale surface of the scale GP) curved from the rotation center line AX2 to the design value radius (the distance from the center to the outer peripheral surface) of the encoder scale disk SD, one is measured. The read head distance XS of the encoder read heads EN4 and EN5. In the example shown in Figure 10, The scale GP of the encoder scale disc SD is rotated (rotated back) from the encoder read head EN4 to the encoder read head EN5 in the direction indicated by the arrow R.

As shown in FIG. 9, in step S101, when the processing of the substrate processing apparatus 11 shown in FIG. 1 has not been started (steps S101 and No), the correction of the scale GP or the like is not performed. In step S101, when the processing of the substrate processing apparatus 11 is started and the scale disk SD is stably rotated (steps S101 and Yes), in step S102, the control device 14 acquires these from the encoder heads EN4 and EN5 at a predetermined timing. The read value (count value of the counter). Obtaining at a predetermined timing means that, for example, when the scale GP of the encoder scale disk SD is rotated by a predetermined angle α (degrees) around the rotation center line AX2, the control device 14 acquires the readings of the encoder read heads EN4 and EN5. The value, that is, the count value of each counter is stored and stored. Hereinafter, the angle α and the appropriate rotation angle α are also referred to. When the encoder scale disk SD is rotated at an equal angular velocity (equal velocity), the read values of the encoder read heads EN4 and EN5 of both of the encoders can be obtained by the control device 14 every predetermined time t. In this example, α (degree) is preferably about 360, but the angle α is not limited thereto. The angle α is determined by the tendency of the scale pitch error (the amplitude of the error and the rate of change in the circumferential direction).

In the case where the encoder scale disc SD is rotated at an equal angular velocity, the control unit 14 obtains the read values from the encoder read heads EN4, EN5 of both sides every time t. When the control device 14 obtains the read values from the encoder read heads EN4 and EN5 at both of the predetermined angles α, for example, the rotation angle detecting means of the encoder scale disk SD is prepared. The control device 14 acquires the read values of the encoder heads SD4 from the encoder heads EN4 and EN5 at the timing when the rotation angle detecting means detects the rotation angle α of the encoder scale disk SD. Further, either one of the encoder read heads EN4 and EN5 can be used as the rotation angle detecting means. For example, when the encoder is read When EN4 is used as the rotation angle detecting means, the control device 14 acquires the timing of the encoder scale disk SD having the rotation angle α every time the encoder head EN4 is obtained, and obtains these from the encoder heads EN4 and EN5 of both sides. Read the value. The encoder scale disc SD has a rotation angle α, which means that, for example, the encoder read head EN4 detects the number of scales GP corresponding to the rotation angle α, and can detect by outputting the number of pulses corresponding thereto.

Next, the process proceeds to step S103, and the control device 14 obtains the actual scale pitch SSr which is the correction value of the scale GP based on the read value obtained in step S102. For example, when the actual scale pitch SSr is obtained using the above equation (2), the control device 14 obtains the number of measurement scales NS from the read values of the encoder heads EN4 and EN5. The number of measurement scales NS is the difference (NSa-NSb) between the read value NSa of the number GP of the encoder read head EN4 and the read value NSb of the number GP of the encoder read head EN5. Next, the control device 14 reads the inter-header distance XS stored in its own memory unit, and obtains the actual scale pitch SSr from the equation (2). The actual scale spacing SSr is the correction value of the interval of the scale GP in the range of the angle α (degrees). Further, when the actual scale pitch SSr is obtained by the above equation (2), the distance between the measurement encoders X is obtained from the product of the measurement scale number NS and the scale interval SS when the scale GP has no error, and the distance between the read heads XS and the scale is obtained. The distance SS and the distance between the measurement encoders X can be obtained by determining the number of measurement scales NS.

The number of measurement scales NS can be obtained, for example, in the following manner. When the encoder read head EN4 reads the position (scale reference position) GPb which is the reference of the plurality of scales GP of the encoder scale disk SD, the control device 14 resets the encoder read head EN4 (encoder) After the zero point of the Z phase of the read head EN4 is reset, the count of the number of scale GPs detected by the encoder read head EN4 is counted. Next, when the encoder read head EN5 reads the scale reference position GPb, the control device 14 resets the encoder read head EN5 (the zero point of the Z phase of the encoder read head EN5 is reset). Control device 14 The number of scales GP of the encoder read head EN4 when the encoder read head EN5 is reset to 0 is obtained, and the number of scales GP when the encoder read head EN5 is read to the scale reference position GPb, that is, 0 is obtained. Difference. This difference is the number of measurement scales NS. After that, the control device 14 continues the counting of the scale GP of the encoder read heads EN4, EN5, and obtains the count value of the read values of the encoder read heads EN4, EN5 for each of the predetermined angles α or every predetermined time t. (The count value of the scale GP), and the difference is obtained, and this is taken as the measurement scale number NS at the predetermined angle α or the predetermined time t. In this example, when the encoder scale disc SD is wound one turn, the scale reference position GPb will return to the original position. At this time, the counters connected to the encoder read heads EN4 and EN5 can be reset or not reset. .

In step S103, when the actual scale interval SSr (corresponding to the correction value of the scale GP) at a certain angle α is obtained, in step S104, the control device 14 records the corresponding angle α in FIG. Correct the chart TBc. For example, in No. 2 of the correction chart TBc, the angle 2×α and the actual scale interval SSr2 (=XS/NS2) corresponding thereto are described. The correction chart TBc is stored in the memory of the control device 14. The control device 14 obtains the actual scale pitch SSr for the entire circumference of the plurality of scales GP (the entire circumference of the encoder scale disk SD). In the processing of the substrate processing apparatus 11, the control device 14 corrects the angle corresponding to the angle of the encoder scale disk SD detected by at least one of the encoder read head EN4 and the encoder read head EN5, that is, the actual scale pitch. SSr is read from the correction chart TBc to correct the error of the scale GP. As shown in FIG. 6, when the substrate processing apparatus 11 has three or more encoder heads EN1, EN2, EN3, EN4, and EN5, the control unit 14 can also use a correction chart for the encoder heads EN4 and EN5. TBc corrects the error of the scale GP. Next, the process proceeds to step S105, and when the processing of the substrate processing apparatus 11 has not been completed (steps S105 and No), the control device 14 continues to steps S102 to S104, and the processing of the substrate processing apparatus 11 is completed (step S105, Yes). , the control device 14 ends the scale GP Correction.

In the above example, in the processing of the substrate processing apparatus 11, that is, when the processing unit applies a predetermined process (for example, exposure processing) to the substrate, the control device 14 corrects the interval between the plurality of scales GP so as to be constant. By adopting such a method, the error of the scale GP generated in the operation of the substrate processing apparatus 11 can be corrected, that is, the error of the scale interval can be read, so that the processing precision of the substrate processing apparatus 11 can be improved.

When the disc SD is wound one turn, that is, when the scale reference position GPb originally at the position of the encoder read head EN4 is returned to the position of the encoder read head EN4, the correction value of the scale GP of the full circumference is obtained, and the actual scale pitch is obtained. SSr. The control device 14 can then correct the scale GP after each round of the disc SD, or end the correction of the scale GP after the disc SD is wound one turn, at a predetermined timing (for example, after a predetermined time or a predetermined time) When the temperature changes, etc.) restart the correction of the scale GP. When the former is selected, since the correction chart TBc is updated at any time, it is possible to quickly respond to deformation or dimensional change of the encoder scale disk SD and the scale GP in a short time. When the latter is selected, since the update frequency of the correction map TBc can be suppressed, the hardware resources of the control device 14 can be effectively utilized.

When the control device 14 obtains the read values from the encoder heads EN4 and EN5, the shorter the acquisition timing is, or the smaller the interval between the encoder heads EN4 and EN5 is, the higher the correction accuracy of the scale GP can be improved. The interval between the encoder read heads EN4 and EN5 is limited to some extent due to the size of the encoder read heads EN4 and EN5 and the balance with other parts. Therefore, shortening the timing at which the read values are obtained from the encoder read heads EN4 and EN5 has the advantage of improving versatility.

Figure 12 and Figure 13 show the reading of these values from a pair of encoder readers. Conceptual diagram of the timing. In the above example, when the plurality of scales GP of the encoder scale disk SD are rotated by a predetermined rotation angle α (degrees) around the rotation center line AX2, the control device 14 obtains these from the encoder heads EN4 and EN5. Read the value. When the rotation angle α (degree) at this time is set to a divisor of 360, the encoder read heads EN4 and EN5 read the same position every revolution while the encoder scale disk SD is rotated by a plurality of turns (refer to FIG. 12). ). In this case, in order to improve the correction accuracy of the scale GP, it is necessary to reduce the predetermined rotation angle α, but the rotation angle α cannot be uniformly reduced due to limitations of the device.

In the present embodiment, since the encoder scale disk SD having a plurality of scales GP is a rotating body (continuous body), the encoder read heads EN4 and EN5 can be continuously measured without guaranteeing the periodicity of each turn. . Therefore, for example, by setting the rotation angle α (degree) to a number that is not a divisor of 360 degrees, it is possible to destroy the reading positions of the encoder read heads EN4 and EN5 when the encoder scale disk SD is rotated by a plurality of turns. Periodic. In particular, by setting α (degree) to a number that is not a divisor of 360 degrees and is a prime number, the periodicity can be more effectively broken. As a result, even if the predetermined rotation angle α is large, since the offset of the plurality of scale GPs (encoder scale disc SD) is extremely small each time the winding is repeated, the result can be reduced by the encoder read head EN4. , EN5 measurement interval of the scale GP (refer to Figure 13).

For example, although the angle α is set to be not a value of about 360 degrees between 10 degrees and 35 degrees, the value of 360/α may be set to be 1 to 4 decimal places, preferably. It is a value that can be divisible by 1 to 4 digits below the decimal point. For example, when the angle α is a prime number of 11 degrees, 17 degrees, 19 degrees, 23 degrees, or the like, 360/α to 4 points below the decimal point cannot be divisible. On the other hand, when the angle α is set to any of 12.5 degrees, 16 degrees, 25 degrees, and 28.8 degrees, 360/α can be divided by one point below the decimal point. When the angle α is set to 19.2 degrees and 32.0 degrees, 360/α It can be divisible by 2 digits below the decimal point. When the angle α is set to 12.8 degrees, 360/α can be divisible by 3 digits below the decimal point. When the angle α is set to 25.6 degrees, 360/α can be divisible by 4 digits below the decimal point. In addition, the rotation angle α is between 10 degrees and 35 degrees, and the angles (360/α is an integer) are 10 degrees, 12 degrees, 14.4 degrees, 15 degrees, 18 degrees, 20 degrees, 22.5 degrees, 24 degrees, 30 degrees. Further, although the rotation angle α may be in the range of 1 to 10 degrees, the rotation angle α may be 7 degrees or 9 degrees in order to avoid 360/α becoming an integer number. In addition, depending on the required resolution of the error correction, the rotation angle α may be set to 1 degree or less, for example, every 0.5 degrees, the difference between the read values of the encoder read heads EN4 and EN5 may be obtained to make a pitch. A chart of the error.

Figure 14 is a flow chart showing the sequence of correcting the scale error. In the example of Fig. 14, when a plurality of scales GP of the encoder scale disk SD are rotated by a predetermined angle α (degrees) around the rotation center line AX2, a pair of encoder read heads EN4 and EN5 read these. In the case, the rotation angle α is set to a processing order when the prime number is not a divisor of 360. In this example, the rotation angle α can be set to, for example, 7 degrees, 11 degrees, or the like.

Steps S201 to S204 are the same as steps S101 to S104 in the above-described example in which α (degree) is set to about 360, and therefore the description thereof will be omitted. In step S205, the control device 14 repeats steps S202 to S205 when the encoder scale disk SD has not been rotated to a predetermined number of rotations after starting the correction value (steps S205 and No). In step S205, when the encoder scale disc SD is rotated to the predetermined number of rotations after starting the correction value (step S205, Yes), the control device 14 proceeds to step S206. Step S206 is the same as step S105 in the above-described example in which α (degree) is set to about 360, and therefore the description thereof will be omitted. The number of rotations specified in step S205 may be two or more rotations. However, the larger the number of rotations as specified, the smaller the effect of improving the correction accuracy of the scale GP. Therefore, it is best to be able to rotate above 2 When the range is set, the specified number of rotations.

Next, the configuration of the encoder read heads EN4 and EN5 will be described. As shown in FIG. 6, the encoder read head EN4 as the first reading unit and the encoder read head EN5 as the second reading unit are disposed in comparison with the exposure apparatus EX (see FIG. 1) as the processing unit. It is preferable that the second tubular member 22 of the cylindrical member has the opposite rotation direction. Specifically, it is preferable that the portion of the substrate P supported by the second tubular member 22 exposed to the exposure apparatus EX is disposed on the side opposite to the rotation direction of the second tubular member 22. In other words, the scale GP is read and the correction value is obtained, two points before the substrate P supported by the second tubular member 22 is exposed by the exposure apparatus EX. In the example shown in Fig. 6, the rotation direction of the second tubular member 22 is from the encoder head EN4 toward the encoder read head EN5. By arranging the encoder heads EN4 and EN5 in this manner, the position information in the circumferential direction of the second tubular member 22 can be fed back to the control (in this example, the exposure processing) by the scale GP correction, so that the processing accuracy can be improved.

In the present embodiment, the two portions of the encoder read heads EN4 and EN5 are exposed to the exposure unit EX by the exposure device EX, and are disposed on the opposite side to the rotation direction of the second tubular member 22. In the part that is exposed to exposure. For example, the encoder read head EN5 can be used as the first reading unit and the encoder read head EN1 as the second reading unit, and the correction value of the scale GP can be obtained from the difference between the read values of the two.

Further, in the present embodiment, since the alignment microscopes AMG1 and AMG2 are disposed at positions corresponding to the encoder heads EN4 and EN5, it is possible to predict the processing on the surface of the substrate P by the alignment microscopes AMG1 and AMG2. The change of the substrate P at the position is corrected at the time of processing. Furthermore, in addition to the encoder read heads EN4, EN5, at least one of the encoder read heads EN1, EN2 disposed at a different position, for example, disposed at the processing position, may be added. Then, the deflection of the rotation center line AX2 (the operation in the direction orthogonal to the rotation center line AX2), the roundness (shape deformation), or the eccentricity of the second tubular member 22 are measured, and the correction of the processing is performed based on the measured value.

When measuring the deflection of the rotation center line AX2 or the eccentricity of the second tubular member 22, it is preferable to use the relative processing position (position of the exposure processing) together with the encoder read heads EN4 and EN5 in the encoder read head EN4, The encoder read head EN3 (see Fig. 6) serving as the third reading unit on the opposite side of EN5. In this way, the measurement result of the deflection or the like of the rotation center line AX2 can be compared after the processing position, and the intermediate value is used as the correction value for the deflection of the rotation center line AX2. Further, by using the encoder read heads EN4 and EN5 disposed before and after the processing position, and the encoder read head EN3, the deflection of the rotation center line AX2 is measured, and the correction is performed based on the measured value, thereby improving the deflection of the corrected rotation center line AX2, and the like. The precision of time. When the encoder read head EN3 is used as the third reading unit, a line connecting the encoder read head EN5 and the rotation center line AX2 (setting the bearing line Le5) and a line connecting the encoder head EN3 and the rotation center line AX2 (setting) The angle of the orientation line Le3) is not limited to 210 degrees as shown in FIG. 6, and the encoder read head EN3 may be on the processing position side.

In addition to the encoder read head EN4 as the first reading unit and the encoder read head EN5 as the second reading unit, and the encoder read head EN3 as the third reading unit, the encoder scale is used. The interval between the encoder read head EN4 and the encoder read head EN5 in the circumferential direction of the disc SD is preferably smaller than the interval between the encoder read head EN5 and the encoder read head EN3. Reducing the interval between the encoder read head EN4 and the encoder read head EN5 improves the correction accuracy of the scale GP. Further, by increasing the interval between the encoder read head EN5 and the encoder read head EN3, the sensitivity of detecting the eccentricity of the second tubular member 22 can be improved.

Next, the description will be made of the encoder read head EN4 and the configuration as the first reading unit. The interval between the encoder read heads EN5 of the second reading unit. The encoder read head EN4 and the encoder read head EN5 are configured to connect the line between the encoder read head EN4 and the rotation center line AX2 (set the orientation line Le4) and the line connecting the encoder read head EN5 and the rotation center line AX2 (setting The central angle encoder mounting angle θs sandwiched by the bearing line Le5) is preferably an angle other than 90 degrees, 180 degrees, and 270 degrees. With this configuration, the deflection of the rotation center line AX2 or the eccentricity of the second tubular member 22 can be detected by the two encoder heads EN4 and EN5. Further, the encoder mounting angle θs is preferably 45 degrees or less, and is preferably an angle other than 120 degrees and 240 degrees. With this arrangement, the correction accuracy of the scale GP can be improved while detecting the deflection of the rotation center line AX2 or the eccentricity of the second barrel member 22 by the two encoder heads EN4 and EN5. Next, a description will be given of a case where the substrate processing apparatus 11 has a mechanism for adjusting the true roundness of the encoder scale disk SD.

15 and 16 are explanatory views for explaining a true roundness adjustment mechanism for adjusting the roundness of the encoder scale disk. In the above-described FIGS. 4 and 5, the diameter of the encoder scale disk SD is smaller than the diameter of the second tubular member 22, but the outer peripheral surface of the second tubular member 22 is wound around the outer surface of the substrate P. The diameter is preferably the same as the diameter of the scale GP of the encoder scale disc SD. In this way, the so-called measurement Abbe error can be further reduced. In this case, the exposure apparatus EX is provided with a roundness adjustment mechanism Cs having the roundness of the encoder scale disk SD as shown in FIG.

An encoder scale disc SD-based annular member as a scale member. The encoder scale disk SD having the scale GP on the outer peripheral surface is fixed to an end portion of at least one of the second tubular members 22 that is orthogonal to the second central axis AX2 of the second tubular member 22. The encoder scale disk SD is provided in the groove Sc of the encoder scale disk SD along the circumferential direction of the second central axis AX2, and is provided in the same radius as the groove Sc and along the circumferential direction of the second central axis AX2. Slot Dc of 2 cylinder member 22 Opposite. The encoder scale disk SD is provided with a bearing member SB such as a rolling element (for example, a ball) between the groove Sc and the groove Dc.

The roundness adjustment mechanism Cs is mounted on the inner peripheral side of the encoder scale disk SD, and includes an adjustment member 60 and a pressing member PP. Further, the roundness adjustment mechanism Cs has a plurality of (for example, eight places) at a predetermined pitch in the circumferential direction around the rotation center line AX2, and for example, the direction parallel to the installation direction line Le4 can be changed from the second center axis. A pressing mechanism for pressing the AX2 toward the direction of the scale GP. The adjustment member 60 is inserted into the pressing member PP, and includes a nut portion FP3 of the encoder scale disk SD, a screw portion 61 screwed into the nut portion FP4 of the second tubular member 22, and a head portion 62 that is in contact with the pressing member PP. The pressing member PP is an annular fixing plate having a smaller radius in the circumferential direction than the encoder scale disk SD at the end of the encoder scale disk SD. The encoder scale disk SD is fixed to at least one of the second tubular members 22 by a plurality of solid structural members, that is, the adjusting members 60 including the screw portions 61 and the head portions 62 in the circumferential direction of the second tubular member 22. The end.

The set orientation line Le4 is extended to the inner peripheral side end of the encoder scale disk SD, and is formed on the inner peripheral side of the encoder scale disk SD and parallel to the second central axis AX2 and including the second central axis AX2. There is a sloped surface FP2. The inclined surface FP2 is an inclined surface that is thinner in thickness in a direction parallel to the second central axis AX2 and parallel to the second central axis AX2. The pressing member PP is formed with an inclined surface FP1 which is thicker in thickness in a direction parallel to the second central axis AX2 and parallel to the second central axis AX2. The pressing member PP fixes the encoder scale disk SD by the adjusting member 60 such that the inclined surface FP2 faces the inclined surface FP1.

The roundness adjustment mechanism Cs transmits the pressing force of the inclined surface FP1 of the pressing member PP to the inclined surface FP2 by screwing the screw portion 61 of the adjusting member 60 into the nut portion FP3 of the encoder scale disk SD, from the encoder The inner side of the scale disc SD is slightly elastically deformed toward the outer peripheral side. On the other hand, by rotating the screw portion 61 to the opposite side, the pressing surface FP1 of the pressing member PP is suppressed from being pressed to the inclined surface FP2, and is slightly elastically deformed from the outer peripheral side toward the inner side of the encoder scale disk SD. .

In the roundness adjustment mechanism Cs, the diameter of the circumferential direction of the scale GP can be minutely adjusted by operating the screw portion 61 at a plurality of adjustment members 60 provided at a predetermined pitch in the circumferential direction around the rotation center line AX2. Further, since the roundness adjusting mechanism Cs can slightly deform the scale GP positioned on the above-described set azimuth lines Le1 to Le5, the diameter of the circumferential direction of the scale GP can be adjusted with high precision. Therefore, the adjustment member 60 can be operated at an appropriate position depending on the true roundness of the encoder scale disc SD, with the roundness of the scale GP of the encoder scale disc SD or the slight eccentricity error of the relative rotation center line AX2. The position detection accuracy of the rotation direction of the second tubular member 22 is improved. Further, the adjustment amount by which the roundness adjustment mechanism Cs is adjusted differs depending on the diameter of the encoder scale disk SD or the radial position of the adjustment member 60, and is not so much as large as several μm.

As shown in FIG. 16, the encoder scale disk SD is fixed to the second tubular member 22 through the eight adjustment members 60. In this case, the encoder read head EN4 as the first reading unit and the encoder read head EN5 as the second reading unit are preferably arranged as the encoder read head EN4 and the second central axis AX2 and the encoder read head. The encoder mounting angle θs of the central angle of EN5 is smaller than the central angle β between the adjacent adjustment member 60 and the second central axis AX2.

Since the encoder scale disc SD is fixed to the second tubular member 22 through the adjustment member 60, deformation may occur in the vicinity of the adjustment member 60. As described above, by making θs < β, the encoder read heads EN4 and EN5 can surely detect the error of the scale GP due to the deformation between the adjacent adjustment members 60. As a result, the correction accuracy of the scale GP can be improved. Next, a modification of the substrate processing apparatus (exposure apparatus) will be described.

(First Modification of Substrate Processing Apparatus (Exposure Apparatus))

Fig. 17 is a schematic view showing a first modification of the substrate processing apparatus (exposure apparatus). FIG. 18 is an explanatory view for explaining the position of the reading device of the encoder scale disk according to the first modification of the substrate processing apparatus (exposure device) from the direction of the rotation center line. In the above embodiment, the case where the position of the second cylindrical member 22 in the circumferential direction of the support substrate P is detected is described as an example. However, the present invention is not limited to this. When the position of the first tubular member 21 in the circumferential direction of the cylindrical mask DM is detected as in the exposure apparatus EX1 of the present modification, a pair of encoder read head corrections can be used for detection. The error of the scale GP (scale) at the position in the circumferential direction of the first tubular member 21.

The encoder scale disk SD included in the exposure device EX1 is fixed to both end portions of the second tubular member 22 that is orthogonal to the rotation axis AX2 of the second tubular member 22. The scale GP is provided on the outer circumference of the encoder disc SD of both sides. Therefore, the scale GP is disposed at both end portions of the second tubular member 22. The encoder read heads EN1 to EN5 for reading the respective scales GP are disposed on the both end sides of the second tubular member 22, respectively.

The first detector 25 (see FIG. 1) described in the above embodiment optically detects the rotational position of the first tubular member 21, and includes an encoder scale disc (scale member) SD having high roundness and reading. Take the device encoder read heads EH1, EH2, EH3, EH4, EH5. The encoder scale disc SD is fixed to at least one end portion (both end portions in FIG. 16) of the first tubular member 21 that is orthogonal to the rotation axis of the first tubular member 21. Therefore, the encoder scale disk SD rotates integrally with the rotation axis ST about the rotation center line AX1. A scale GPM is engraved on the outer circumference of the encoder scale disc SD. The encoder heads EH1, EH2, EH3, EH4, and EH5 are arranged around the scale GP as viewed from the rotation axis STM. The encoder read heads EH1, EH2, EH3, EH4, and EH5 are arranged opposite to the scale GPM, and the scale GPM can be read in a non-contact manner. Also, the encoder read heads EH1, EH2 EH3, EH4, and EH5 are disposed at different positions in the circumferential direction of the first tubular member 21. The first tubular member 21 is rotated from the encoder read head EH4 toward the encoder read head EH5.

The encoder heads EH1, EH2, EH3, EH4, and EH5 have reading means for measuring the sensitivity (detection sensitivity) in the variation of the displacement in the tangential direction (in the XZ plane) of the scale GPM. As shown in FIG. 17, when the set orientations of the encoder read heads EH1, EH2 (the angular directions in the XZ plane centered on the rotation center line AX1) are indicated by the set orientation lines Le11, Le12, the orientation lines are set by this. Each of the encoder read heads EH1 and EH2 is disposed such that Le11 and Le12 are at an angle of ±θ° with respect to the center plane P3. Further, the orientation lines Le11 and Le12 are arranged to coincide with the angular direction of the illumination light beam EL1 shown in FIG. 1 in the XZ plane centered on the rotation center line AX1. Here, the processing unit illumination unit IU performs a process of penetrating the illumination light beam EL1 to a predetermined pattern (a mask pattern) on the cylindrical mask DM of the object to be processed. According to this, the projection optical system PL can project the image of the pattern of the illumination region IR on the cylindrical mask DM to a portion (projection area PA) of the substrate P transported by the transport device.

The encoder read head EH4 is set to be rotated about 90° from the axis of the rotation center line AX1 to the side after the center line P3 of the first cylinder member 21 is oriented in the rotation direction with respect to the center plane P3 of the first head member 21; The bearing line is on Le14. Further, the encoder read head EH5 is set such that the set azimuth line Le12 of the encoder read head EH2 is rotated by 90° about the axis of the rotation center line AX1 with respect to the center plane P3 of the first tubular member 21 toward the rotational direction. Set the bearing line Le15. Here, when it is approximately 90 degrees, when it is 90 degrees ± γ, the range of γ is the same as that of the above embodiment.

Moreover, the encoder read head EH3 is set to rotate the set azimuth line Le12 of the encoder read head EH2 around the axis of the rotation center line AX1 by 120°, and the encoder read head EH4 The azimuth line Le13 is rotated approximately 120° about the axis of the rotation center line AX1. In the present embodiment, the arrangement of the encoder heads EH1, EH2, EH3, EH4, and EH5 disposed around the first tubular member 21 is the encoder read head EN1 disposed around the second tubular member 22 in the above embodiment. EN2, EN3, EN4, and EN5 are in the form of mirror inversion.

As described above, the exposure apparatus EX1 includes the second cylindrical member 22 of the cylindrical member, the scale GP, the processing unit projection modules PL1 to PL6 of the exposure apparatus EX1, and the first reading apparatus encoder reading of the reading scale GP. The heads EN4, EN5, and the second reading device encoder reading heads EN1, EN2 of the reading scale GP.

The first tubular member 21 has a curved surface curved at a constant radius from the first central axis AX1 which is a predetermined axis, and is rotated around the first central axis AX1. The scale GPM is arranged in a ring shape in the circumferential direction of the first tubular member 21 and rotates around the first central axis AX1 together with the first tubular member 21 . When the processing unit illumination unit IU of the exposure apparatus EX1 is viewed from the second central axis AX2, the substrate P is placed inside the first tubular member 21 and aligned on a curved surface at a specific position in the circumferential direction of the first tubular member 21 ( The object to be processed is subjected to a process of penetrating the two illumination light beams EL1. When viewed from the first central axis AX1, the encoder heads EH4 and EH5 are disposed around the scale GPM and are arranged to rotate the specific position about the first central axis AX1 by approximately 90 degrees around the first central axis AX1. Position, read the scale GPM. The encoder read heads EH1, EH2 read the scale GPM of the aforementioned specific position. The exposure device EX1 corrects the error (pitch error) of the scale GPM provided on the outer peripheral portion of the encoder scale disk SD attached to the first tubular member 21 based on the read values of the encoder read heads EH4 and EH5. Therefore, the exposure apparatus EX1 can measure the position in the circumferential direction of the first tubular member 21 with good precision, and can perform processing for the object to be processed, that is, the substrate P, which is positioned on the curved surface of the second tubular member 22. As described above, in the present embodiment, when the error is corrected based on the read values of the encoder read heads EH4 and EH5, Specifically, the control device 14 of the exposure device EX corrects the pitch error based on the difference between the read value of the encoder read head EH4 and the read value of the encoder read head EH5. However, when another encoder read head is provided around the scale GPM of the first tubular member 21 at a set angle close to either of the encoder read heads EH4 and EH5, it is not limited to the encoder read heads EH4 and EH5. The direct difference calculation between the two read values can also be performed by calculating the read values of the encoder read heads EH4, EH5 and the three encoder read heads of the other encoder read heads. The measurement of the error between the heads of the three encoders is used, and will be described in detail later.

(Second Modification of Substrate Processing Apparatus (Exposure Apparatus))

Fig. 19 is a schematic view showing the overall configuration of a second modification of the substrate processing apparatus (exposure apparatus). The exposure device EX2 emits an illumination light beam EL1 that is illuminated by the cylindrical mask DM by a light source device (not shown). The illumination light beam EL1 emitted from the light source of the light source device is guided to the illumination module IL. When a plurality of illumination optical systems are emitted, the illumination light beam EL1 from the light source is separated into a plurality of adjustments, and the plurality of illumination light beams EL1 are guided to a plurality of Lighting module IL.

The illumination light beam EL1 emitted from the light source device is incident on the polarization beam splitters SP1, SP2. In order to suppress the energy loss due to the separation of the illumination light beam EL1, the polarization beam splitters SP1 and SP2 are preferably formed to completely reflect the incident illumination light beam EL1. Here, the polarization beam splitters SP1 and SP2 transmit a light beam that is a linearly polarized light that is S-polarized light and a light beam that is a linearly polarized light that is P-polarized. Therefore, the light source device emits the illumination light beam EL1 that is incident on the illumination beam EL1 of the polarization beam splitters SP1 and SP2 into a linearly polarized (S-polarized) light beam, and is emitted to the first tubular member 21. Accordingly, the light source device emits the illumination light beam EL1 having the same wavelength and phase.

The polarization beam splitters SP1, SP2 reflect the illumination light beam EL1 from the light source, and on the other hand, the projection light beam EL2 reflected by the cylindrical mask DM is penetrated. In other words, from the illumination The illumination beam EL1 of the module ILM is incident on the polarization beam splitters SP1, SP2 as a reflected beam, and the projection beam EL2 from the cylindrical mask DM is incident on the polarization beam splitters SP1, SP2 as a penetrating beam.

As described above, the processing unit illumination module IL performs processing for reflecting the illumination light beam EL1 to a predetermined pattern (mask pattern) on the cylindrical mask DM of the object to be processed. According to this, the projection optical system PL can project an image of the pattern of the illumination region IR on the cylindrical mask DM to a portion (projection region) of the substrate P transported by the transport device.

In the case where such a predetermined pattern (mask pattern) for reflecting the illumination light beam EL1 to the curved surface of the cylindrical mask DM is provided, the scale GPm may be provided on the curved surface together with the mask pattern. When the scale GPM is formed simultaneously with the mask pattern, the scale GPm is formed with the same precision as the mask pattern. Therefore, it is possible to perform sampling of the image of the mark of the scale GPM with high speed and high precision with the curved surface detectors GS1, GS2 of the detection scale GPM. At the moment of sampling, the correspondence relationship between the rotational angular position of the first tubular member 21 and the scale GPM can be obtained, and the rotational angular position of the first tubular member 21 measured successively can be stored.

The encoder read heads EH4 and EH5 on the cylindrical mask DM side read the scale GPm. The exposure device EX2 corrects the error of the scale GPm provided on the surface of the cylindrical mask DM based on the difference between the reading values of the encoder heads EH4 and EH5. Therefore, the exposure apparatus EX2 can measure the position in the circumferential direction of the cylindrical mask DM with good precision, and treat the substrate P on the curved surface of the second tubular member 22.

The encoder reading heads EN4 and EN5 on the second tubular member 22 side read the scale GPd of the encoder scale disk SD attached to the second tubular member 22. Further, the exposure device EX2 corrects the error of the scale GPd provided on the surface of the encoder scale disk SD based on the difference between the read values of the encoder read heads EN4 and EN5. Therefore, the exposure device EX2 can be measured at the second cylinder member 22 with good precision. The substrate P on the curved surface of the second tubular member 22 is treated at a position in the circumferential direction.

(Third Modification of Substrate Processing Apparatus (Exposure Apparatus))

Fig. 20 is a schematic view showing the overall configuration of a third modification of the substrate processing apparatus (exposure apparatus). The exposure device EX3 includes the polygon scanning units PO1 and PO2 that are incident on the exposure light beam from a light source device (not shown), and the polygon scanning unit PO scans the intensity-modulated spot light along the one-dimensional scanning line on the substrate P. The exposure apparatus EX3 included in the substrate processing apparatus can irradiate the exposure light to the substrate P at a specific position without the cylindrical mask DM, and can draw a predetermined pattern.

The encoder heads EN4 and EN5 on the second tubular member 22 side of the exposure device EX3 read the scale GPd attached to the encoder scale disk SD of the second tubular member 22. The exposure device EX2 corrects the error of the scale GPd provided on the surface of the encoder scale disk SD based on the difference between the read values of the encoder read heads EN4 and EN5. Therefore, the exposure apparatus EX2 can process the substrate P on the curved surface of the second tubular member 22 at a position in the circumferential direction of the second tubular member 22 with good precision.

As shown in FIG. 20 (and FIG. 19), the encoder read heads EN4 and EN5 on the second tubular member 22 side are arranged in the circumferential direction so as to arrange the alignment microscopes AMG1 and AMG2 in the circumferential direction. However, in the alignment microscopes AMG1 and AMG2, for example, only the alignment microscope AMG2 (and the corresponding encoder read head EN5) are disposed. Even in this case, it is preferable to set the encoder read head EN4. Only when the alignment microscope AMG2 (and the corresponding encoder read head EN5) is configured, and the encoder read head EN4 cannot be set at a rotation angle α in the vicinity thereof, the encoder read head EN1 corresponding to the exposure position can also be used. , EN2, to make the error chart of the error and eccentricity between the scale GPd of the scale disc SD.

Further, at least one error chart such as the error between the scale GPd and the eccentricity obtained by using the two encoder heads EN4 and EN5 is compared, and two encoder read heads are used. At least one error graph such as the error between the scale and the eccentricity of the scale GPd obtained by EN1 and EN2, verify whether there is a large difference between the two error graphs, and when the difference between the allowable values is generated, by re-writing the error graph and correcting it, That is to improve the accuracy and reliability of the error chart.

(Fourth Modification of Substrate Processing Apparatus (Exposure Apparatus))

Fig. 21 is a schematic view showing the overall configuration of a fourth modification of the substrate processing apparatus (exposure apparatus). The exposure apparatus EX4 is a so-called substrate processing apparatus that applies proximity exposure to the substrate P. In the exposure apparatus EX4, the gap between the cylindrical mask DM and the second tubular member 22 is set to be extremely small, and the illumination mechanism IU directly irradiates the substrate P with the illumination light beam EL1 to perform non-contact exposure. In the present embodiment, the second tubular member 22 is rotated by a torque supplied from the second driving portion 36 including an actuator such as an electric motor. The first tubular member 21 is driven by, for example, a driving roller MMG coupled by a magnetic gear so as to rotate in the opposite direction to the rotational direction of the second driving portion 36. The second driving unit 36 rotates the second tubular member 22 and rotates the driving roller MGG and the first tubular member 21 to move the first tubular member 21 (the cylindrical mask DM) synchronously with the second tubular member 22 (synchronous rotation) ).

Further, the exposure device EX4 includes an encoder read head EN6 that detects that the principal ray of the imaging light beam EL2 is incident on the substrate P at the position PX6 of the scale GP at a specific position of the substrate P. Here, since the diameter of the outer peripheral surface of the outer peripheral surface of the second tubular member 22 wound around the substrate P coincides with the diameter of the scale GP of the encoder scale disk SD, the position PX6 is from the second central axis AX2. When observed, it is consistent with the above specific position. The encoder read head EN7 is set on the set azimuth line Le7 in which the set azimuth line Le6 of the encoder head EN6 is rotated substantially by 90 degrees about the axis of the rotation center line AX2 toward the rear side in the conveyance direction of the substrate P.

In the exposure apparatus EX4, for example, the encoder read head EN3 is the first reading unit, and the encoder head EN7 is the second reading unit. Encoder read head EN3, EN7, read and installed in the second The scale GPd of the encoder scale disc SD of the barrel member 22. The control unit 14 corrects the error of the scale GPd provided on the surface of the encoder scale disk SD based on the difference between the read values of the encoder heads EN3 and EN7. Therefore, the exposure apparatus EX4 can measure the position in the circumferential direction of the second tubular member 22 with good precision, and applies the treatment to the substrate P of the curved surface of the second tubular member 22. The encoder read heads EN3 and EN7 can connect the line between the encoder read head EN3 and the second central axis AX2 (set the bearing line Le3) and the line connecting the encoder read head EN7 and the second central axis AX2 (set the bearing line Le7). The encoder mounting angle θs is set to be less than 90 degrees, preferably 45 degrees or less.

In the first to fourth modifications of the above-described embodiment and the substrate processing apparatus (exposure apparatus), an exposure apparatus is exemplified as the substrate processing apparatus. However, the substrate processing apparatus is not limited to the exposure apparatus, and the processing unit may be a device that prints a pattern on the substrate P as an object to be processed by an inkjet ink dropping device. Further, the processing unit may be an inspection device.

Further, in the above description of the reading operation of the scale GP using the encoder heads EN4 and EN5 of FIGS. 7 and 8, it is assumed that the rising pulse U is output when the rising portion GPa of one scale of the scale GP is read, and reading is performed. When the falling portion GPb is taken, the falling pulse D is output, and the interval between the adjacent two rising portions GPa or the interval between the adjacent falling portions GPb is defined as the interval GP between the scales GP. However, the actual encoder measuring system, as disclosed in Japanese Laid-Open Patent Publication No. Hei 9-196702, is a 2-phase signal (a sine wave signal and a cosine wave having a phase difference of 90 degrees) output from a signal generating portion (encoder head). The signal is generated by interpolating the circuit or the comparator to generate the rising pulse U and the falling pulse D at intervals of one to one tenth of the distance between the actual dimensions of the scale GP.

Figure 22 is a brief description of the actual reading of the encoder heads EN1~EN7, EH1~EH5 to the scale GP (GPd, GPM) shown in each of Figures 4-6, 10 and 16-21. Read the signal waveform of the action. As shown in Figure 22, the encoder read heads EN1~EN7, EH1 Each of ~EH5 has two measurement signals (here shown by rectangular waves) having a phase difference of 90 degrees, EcA, EcB. One cycle of the measurement signals EcA, EcB corresponds to 1/n of the distance between the scales GP and SS. Although n (integer) differs depending on the optical reading form in the encoder read head, it is set to any value of a multiple of a series such as 1, 2, 4, 8, or . In the general encoder measuring system, the scale disc SD rotates in the forward direction, and the interpolated rising pulse signal EcU is continuously generated according to the measurement signals EcA, EcB while the scale GP is moving in one direction with respect to the encoder head. . When the scale disc SD is rotated in the reverse direction, from this point of time, the interpolated falling pulse signal is continuously generated according to the measurement signals EcA, EcB.

In Fig. 22, a processing circuit for generating a pulsed rising pulse signal EcU (or a falling pulse signal EcD) at intervals of eight divisions of one cycle of the measurement signals EcA and EcB is used. As the reversible counter of the counter, the number of pulses is counted up successively when the rising pulse signal EcU is input, and the number of pulses is counted down successively when the falling pulse signal EcD is input. Here, for example, when one cycle of the measurement signals EcA, EcB corresponds to 1/8 of the SS between the actual dimensions of the scale GP, the reversible counter moves in the direction of the scale surface of the scale disk SD (scale GP) by 1 pitch SS. During this period, it is counted as 64 pulses of the rising pulse signal EcU. Therefore, when the distance between the scales GP is 20 μm, the increment of the 1st pitch of the up/down counter is 64, which is the measurement decomposition capability of the encoder measurement system (the amount of movement per pulse of the signal EcU) is 0.3125. Μm (20 μm/64). As described above, as the measurement resolution capability of the encoder measurement system, since the actual size of the SS between the scales GP is interpolated and quantized by a fraction of a tenth to a few tenths, the pitch SS is The error can be obtained with the accuracy corresponding to the degree of interpolation.

Moreover, the circumferential distance (diameter × π) of the scale surface of the scale disc SD is set. In order to divide the value by a finite number of scales (the number of grids), the actual size of the SS between the actual scales GP also has a companion score of 20 μm. On the other hand, the pitch SS can be set so that the decomposition ability becomes an appropriate value (for example, 0.25 μm), and the ruler surface can be set such that the circumferential distance of the scale surface of the scale disk SD can be divisible within a predetermined accuracy. The diameter.

Further, on the scale surface of the scale disc SD or the like, an origin mark which is the origin of the rotation of the scale disc SD is also provided together with the scale GP, and each of the encoder read heads EN1 to EN7 is detected. When the marker is clicked, the origin signal (pulse) EcZ is output at this moment. The reversible counter responds to the origin signal EcZ, and after resetting the count value up to this point, continues counting the number of pulses of the rising pulse signal EcU (or the falling pulse signal EcD). Therefore, each of the reversible counters corresponding to the respective settings of the encoder read heads EN1 to EN7 is based on the instant of receiving the origin signal EcZ (0 point), and the number of pulses of the rising pulse signal EcU (or the falling pulse signal EcD) is performed. Add (or subtract).

In summary, for example, when the difference between the scales GP is obtained by the difference between the measured values of the encoder read head EN4 and the encoder read head EN5, the scale disc SD (the second cylinder member 22) is as shown in FIG. As described with reference to Fig. 13, the difference between the count value of the up/down counter corresponding to the encoder read head EN4 and the count value of the up/down counter corresponding to the encoder read head EN5 can be calculated digitally every rotation angle α. Further, the angle α can be determined by adding or subtracting the count value of the reversible counter corresponding to either one of the encoder read head EN4 and the encoder read head EN5 (or one of the other encoder read heads). It is detected by a certain value corresponding to the angle α.

(Modification 1)

In the above embodiments and modifications, the scale GP constituting the encoder measuring system is engraved on The cylindrical outer peripheral surface of at least one of the scale disk SD and the second tubular member 22 of the rotating body. However, the scale GP may be formed at a predetermined pitch in the circumferential direction on the side end surface perpendicular to the rotation center line AX2 of at least one of the scale disk SD and the second tubular member 22. Fig. 23 is a view showing a configuration in which the scale GP is formed on the side end surface of the scale disk SD in this manner, and the same direction as the previous FIG. 6 is extended from the rotation center line AX2 (Y-axis direction), and Fig. 24 is a view. The configuration of 23 is a cross-sectional view taken along line A-A' of the plane including the orientation line Le4 and the rotation center line AX2.

In Fig. 23, the annular scale disk SD is attached to the end surface of the second tubular member 22 side by an adjusting member (screw) 60. The mounting angle β of the adjustment member (screw) 60 is 45° here. On the side parallel to the XZ plane of the scale disc SD, a scale GP of a certain distance SS and an origin mark Zs are formed on the circumference of the radius ra from the rotation center line AX2. As shown in FIG. 24, the encoder read heads EN4 and EN5 are arranged to face the Y-axis direction so as to face the scale GP with a certain gap therebetween. As shown in Fig. 23, the reading position RP4 of the encoder read head EN4 is set at the radius ra and is set on the bearing line Le4. The reading position RP5 of the encoder read head EN5 is set at the radius ra and is set on the bearing line Le5. The radius ra is as shown in Fig. 24, and the second tubular member 22 is in contact with the radius of the outer peripheral surface 22s of the support substrate P. Therefore, the maximum diameter of the annular scale disc SD is set to be slightly larger than the radius ra. As described above, by configuring the scale disc SD and the encoder heads EN4, EN5, the Abbe error at the time of measurement can be minimized. The other encoder read heads (EN1~EN3, EN6~EN7) for the ring scale disc SD of Figs. 23 and 24 are also configured similarly to the read heads EN4 and EN5 to satisfy the measured Abbe conditions.

(Modification 2)

In the above embodiments and modifications, in order to measure the error between the scales GP, the measurement values of the two encoder read heads (for example, the encoder read heads EN4 and EN5) are placed in the vicinity. The difference is stored when the scale disk SD (the second tubular member 22) is rotated by the angle α (α < θs), so as to be a graph about the error between the full circumferences of the scale disk SD. In this case, in order to improve the accuracy of the graph, it is preferable to reduce the reading position of each of the two encoder read heads (for example, the encoder read heads EN4 and EN5) on the scale surface (corresponding to RP4 in FIG. 23, The angle θs sandwiched by RP5) is preferred. However, the angle θs may not be sufficiently small due to the shape and size of the encoder heads EN4 and EN5 or the angle between the orientation lines Le4 and Le5 determined by the arrangement of the microscopes AMG1 and AMG2. situation.

Therefore, in the second modification, for example, together with the two encoder read heads EN4 and EN5 used for the pitch error measurement in the previous embodiment, the encoder read head EN1 (or EN2) disposed in the vicinity thereof is used. The measured values of each of the three or more encoder read heads further refine the pitch error map. Figure 25 is a view similar to Figure 6 above, showing the arrangement of the scale disc SD (here ring) and the encoder heads EN1, EN2, EN4, EN5 seen in the XZ plane, here, A scale GP and an origin mark Zs are formed along the outer peripheral surface of the scale disc SD. Further, the scale disk SD is fixed to the side end surface of the second tubular member 22 by an adjusting member (screw) 60 at 16 in the circumferential direction. Therefore, the mounting angle β of the adjusting member (screw) 60 is 22.5°.

As shown in FIG. 25, the encoder read head EN1 of the read position is set on the set orientation line Le1 corresponding to the odd-numbered exposure position, and the encoder read of the read position is set on the set orientation line Le2 of the corresponding even-numbered exposure position. The head EN2, in the XZ plane, is arranged at an angle ±θ with respect to the center plane P3. Further, the angle θs between the set azimuth lines Le4 and Le5 of the reading positions of the encoder heads EN4 and EN5 is θs>β. Further, the angle between the set azimuth line Le1 of the reading position of the encoder read head EN1 and the set azimuth line Le4 of the reading position by the encoder read head EN4 is set to θq. In addition, it will be with the encoder read heads EN1, EN2, EN4, EN5 The count values of the reversible counters corresponding to each of the settings are set to Cm1, Cm2, Cm4, and Cm5, respectively.

When the scale disc SD (the second cylinder member 22) shown in Fig. 25 rotates clockwise in the XZ plane, the origin mark Zs formed on the scale surface of the scale disc SD will be the encoder read heads EN4, EN5, EN1. The sequence of EN2 traverses each reading position. Therefore, the moment when the origin mark Zs traverses the reading position of the encoder read head EN4, the count value Cm4 corresponding to the up/down counter is reset to zero, and the origin mark Zs traverses the reading position of the encoder read head EN5. The count value Cm5 corresponding to the reversible counter is reset to zero, and the origin mark Zs crosses the reading position of the encoder read head EN1, and the count value Cm1 corresponding to the reversible counter is reset to zero, and the origin mark Zs is horizontally The count value Cm2 corresponding to the up/down counter is reset to zero at the instant of the reading position of the encoder read head EN2. When the scale disc SD rotates clockwise, the count values Cm1, Cm2, Cm4, and Cm5 after all the four reversible counters are reset to zero are constant in the relationship of Cm2 < Cm1 < Cm5 < Cm4.

The pitch error is obtained by using three encoder read heads EN1 (count value Cm1), EN4 (count value Cm4), and EN5 (count value Cm5) to create an error chart (correction chart) on the scale disc SD ( When the second tubular member 22) is rotated by a predetermined angle α (α<β<θs), the measured value ΔMs associated with the error between the unit angles α is obtained by the following formula (1). This measured value ΔMs is equivalent to the number NS of the scale GP shown in Fig. 11 previously, but is actually the pulse count value of the rising pulse (or falling pulse) EcU shown in Fig. 22.

△Ms=(Cm4+Cm1)/2-Cm5...(1)

In the equation (1), the calculated value of (Cm4 + Cm1)/2, as shown in Fig. 25, represents the reading position set at the reading position RP4 as the encoder read head EN4 and the encoder read head EN1. Imagine setting the bearing line Lei at the angular position of the middle point of RP1, setting the encoder read head The count value that is expected when reading the position RPi. Therefore, the measured value ΔMs obtained by the equation (1) or the following (2) is the count value Cmi (calculated value) of the reading position RPi of the imaginary encoder read head, and the encoder read head EN5. The difference between the count value Cm5 of the reading position RP5. By obtaining the measured value ΔMs at 360 degrees per unit angle α, it is possible to create an error map or a pitch error correction map between the scale (scale GP) of the scale disc SD or the like.

In the case of the configuration shown in Fig. 25, the period between the reading position RP4 of the encoder read head EN4 and the reading position RP1 of the encoder head EN1 is due to the count value Cm4 and the measured value Cm5. After being reset to zero, there is a possibility that the continuity of the three count values Cm1, Cm4, Cm5 cannot be guaranteed. During this period, the magnitude relationship of the count values Cm1, Cm4, and Cm5 (absolute value) is Cm4 < Cm1 < Cm5, or Cm5 < Cm4 < Cm1. Therefore, during the period from reset to zero until the next reset to zero, the maximum count value (fixed value) counted by the up/down counter is set to Cmf, and for each angle α, the corresponding encoder read head EN1 is read. When the count values Cm1, Cm4, and Cm5 of EN4 and EN5 are between the reading position RP4 of the encoder read head EN4 and the reading position RP5 of the encoder read head EN5, instead of the equation (1) The count value Cm4 may be used for the count value Cm4 of the up/down counter plus the new count value Cm4' of the maximum count value Cmf. Similarly, when the origin mark Zs is located between the reading position RP5 of the encoder read head EN5 and the reading position RP1 of the encoder read head EN1, the count values Cm4 and Cm5 in the equation (1) are used for the up/down counter. The count values Cm4 and Cm5 may be added to the new count values Cm4' and Cm5' of the maximum count value Cmf.

In the second modification, the first reading unit includes two encoder read heads EN1 and EN4 (or one encoder read head EN5, and the second read unit includes one encoder read head EN5 (or two codes). The heads EN1, EN4) are constructed. In the above configuration, when the angle θs and the angle θq are set When it is determined to be an appropriate relationship, the angle between the imaginary reading position RPi and the reading position RP5 can be set smaller than the mounting angle β (22.5° in FIG. 25) of the adjusting member (screw) 60, and the adjusting member can be adjusted. After the adjustment of the roundness, eccentricity, etc. of the 60, the scale surface of the scale disc SD is slightly deformed to cause an error in the distance (uneven pitch), and is measured in detail by the width of the angle β or less.

Further, as described above, in the method of setting the virtual reading position RPi on the scale surface, for example, by setting the reading positions RP4 of the two encoder reading heads EN4 and EN1 shown in FIG. 25, The calculated count value obtained by the virtual first reading position RPi at the intermediate point of RP1 and the hypothetical second reading set at the intermediate point between the reading positions RP5 and RP2 of the two encoder heads EN5 and EN2 The difference between the calculated count values obtained by the position RPi is taken, and the pitch error is obtained. The measured value ΔMs per unit angle α at this time is calculated by the following formula (2).

△Ms=(Cm4+Cm1)/2-(Cm5+Cm2)/2...(2)

(Component manufacturing method)

Fig. 26 is a flow chart showing the procedure of a method of manufacturing an element using the substrate processing apparatus (exposure apparatus) of the embodiment. In the device manufacturing method, for example, the function and performance design of a display panel using a self-luminous element such as an organic EL are designed, and a desired circuit pattern and wiring pattern are designed by CAD or the like (step S201). Next, the cylindrical mask DM of the desired layer is produced in accordance with one of the various layers designed by CAD or the like (step S202). Moreover, the supply roll FR1 of the flexible substrate P (resin film, metal foil film, plastic, etc.) which is a base material of a display panel is prepared (step S203). Further, the roll substrate P prepared in the step S203 may be a surface-modified one if necessary, or may have an undercoat layer formed in advance (for example, a micro unevenness is formed by an imprint method), or a layer of light may be laminated in advance. Inductive functional film or transparent film (insulating material) By.

Then, a backplane layer composed of an electrode and a wiring constituting the display panel element, an insulating film, a TFT (thin film semiconductor), or the like is formed on the substrate P, and a self-luminous layer such as an organic EL is formed so as to be laminated on the substrate. The light-emitting layer (display pixel portion) of the element (step S204). In the step S204, the conventional lithography process for exposing the photoresist layer by using the exposure devices EX, EX2, EX3, and EX4 described in the above embodiments includes a photosensitive decane coupling agent. After the substrate P pattern is exposed, an exposure process for patterning the water-repellent pattern is formed on the surface, and the photo-sensitive catalyst layer pattern is exposed, and a metal film pattern (wiring, electrode, etc.) is formed by electroless plating. A process such as a printing process for drawing a pattern such as a conductive ink of silver nanoparticles.

Next, the substrate P is cut by each of the display panel elements continuously formed on the long substrate P by a roll, and a protective film (for an environmental barrier layer) or a color filter sheet is bonded to the surface of each display panel element. Etc. to assemble the component (step S205). Connect, do the display panel components operate normally? Whether or not the inspection process of the desired performance and characteristics is satisfied (step S206). In the above manner, a display panel (flexible display) can be manufactured.

In the above embodiment, a light-transmitting type reticle in which a predetermined light-shielding pattern (or a phase pattern or a light-reducing pattern) is formed on a light-transmitting substrate is used, but instead of the reticle, for example, the United States may be used. a variable forming reticle (also referred to as an electronic reticle, an active reticle, or an illuminating pattern) that forms a transmissive pattern or a reflective pattern, or a luminescent pattern, according to the electronic data of the pattern to be exposed disclosed in the specification No. 6778257 Image generator). Further, instead of a variable-shaped reticle having a non-light-emitting image display element, a pattern forming device including a self-luminous image display element may be provided.

Further, in the exposure apparatus of the above-described embodiment, various sub-systems including the respective constituent elements exemplified in the scope of the application of the present application are assembled and manufactured so as to maintain predetermined mechanical precision, electrical precision, and optical precision. In order to ensure the accuracy of these, before and after the assembly of the exposure apparatus, various optical systems are used to adjust the optical precision, to adjust the mechanical precision for various mechanical systems, and to achieve electrical for various electrical systems. Adjustment of accuracy. The steps of assembling the various sub-systems and assembling them in the exposure apparatus include mechanical connection of various sub-systems, wiring connection of circuits, and piping connection of pneumatic circuits. Before the various sub-systems are assembled to the assembly step of the exposure apparatus, of course, the individual assembly steps of each system are included. After the assembly steps of the various subsystems assembled to the exposure apparatus are completed, comprehensive adjustment is performed to ensure various precisions of the entire exposure apparatus. Further, the exposure apparatus can be preferably manufactured in a clean room in which temperature and cleanliness are managed.

Further, the constituent elements of the above embodiments can be combined as appropriate. In addition, some components are not used. Further, the substitution or alteration of the constituent elements can be made without departing from the spirit and scope of the invention. Further, all the publications of the exposure apparatus and the like, which are cited in the above-mentioned embodiments, and the description of the U.S. Patent are incorporated herein by reference. As described above, other embodiments, operational techniques, and the like according to the above embodiments are included in the scope of the present invention.

22‧‧‧2nd tubular member

AX2‧‧‧Rotation centerline (2nd central axis)

EL2‧‧‧ imaging beam

EN, EN1, EN2, EN3, EN4, EN5‧‧‧ encoder read head

GP‧‧‧ ruler

Le1, Le2, Le3, Le4, Le5‧‧‧ set the bearing line

P‧‧‧Substrate

P3‧‧‧ center face

PA2, PA3, PA4‧‧‧ projection area

SD‧‧‧Encoder scale disc

ST‧‧‧Rotary axis

Claims (23)

A position detecting device for a cylindrical member, comprising: a cylindrical member having a curved surface curved from a predetermined axis with a certain radius, rotating around the predetermined axis; and a plurality of scales arranged in a ring along the direction of rotation of the cylindrical member And rotating around the shaft together with the cylindrical member for measuring a position change at least in a circumferential direction of the curved surface; the first reading portion is disposed opposite to the scale for reading the scale; a reading unit that faces the scale and is disposed at a position different from the first reading unit in a circumferential direction of the cylindrical member for reading the scale, and a correction unit according to the first reading The read value of the pickup unit and the read value of the second read unit correct the interval between the plurality of scales obtained from the read value of the first read unit and the read from the second read unit The value is obtained by at least one of the intervals of the plurality of scales. The position detecting device for a cylindrical member according to the first aspect of the invention, wherein the correction unit corrects the plurality of the plurality of scales and corrects the plurality of readings from the read value of the first reading unit At least one of the interval between the scale and the plurality of scales obtained from the read value of the second reading unit. The position detecting device for a cylindrical member according to the first or second aspect of the invention, wherein the correction portion acquires a reading value of the first reading portion when the plurality of scales are rotated by an angle of a degree about the axis The correction is performed with the read value of the second reading unit. The position detecting device for a cylindrical member according to claim 3, wherein the value of the angle α is not a divisor of 360. a position detecting device for a cylindrical member according to claim 4, wherein the angle The value of α is the prime number. The position detecting device for a cylindrical member according to any one of claims 1 to 4, wherein the first reading unit and the second reading unit are arranged to connect the first reading unit and the shaft The line and the central angle between the line connecting the second reading unit and the axis are angles other than 90 degrees, 180 degrees, and 270 degrees. The position detecting device for a cylindrical member according to any one of claims 1 to 6, wherein the plurality of scales are provided on an outer peripheral portion of the cylindrical member. The position detecting device for a cylindrical member according to any one of claims 1 to 6, wherein the plurality of scales are provided on an outer peripheral portion of the disk fixed to at least one end of the cylindrical member. The position detecting device for a cylindrical member according to the eighth aspect of the invention, wherein the disk is fixed to the circumferential direction of the cylindrical member by a plurality of solid structural members; the first reading portion and the second reading The taking portion is disposed such that a central angle between the first reading portion and the axis and the second reading portion is smaller than a central angle of the adjacent solid member and the shaft. The position detecting device for a cylindrical member according to any one of claims 1 to 9, which has a direction opposite to the scale, and is disposed in the circumferential direction of the cylindrical member and the first reading unit a position at which the second reading unit is different, and a third reading unit for reading the scale; and a distance between the first reading unit and the second reading unit in the circumferential direction of the cylindrical member The interval between the second reading portion and the third reading portion in the circumferential direction of the cylindrical member is small. A substrate processing apparatus comprising: a position detecting device for a cylindrical member according to any one of claims 1 to 10; wherein the cylindrical member is attached to a portion of the curved-wound substrate and is rotated around the shaft for transporting The And a processing unit that applies a predetermined process to the substrate at a specific position in a circumferential direction of the curved surface in a portion of the substrate wound around the curved surface. The substrate processing apparatus according to claim 11, wherein the first reading unit and the second reading unit are disposed on a side opposite to a rotation direction of the cylindrical member. The substrate processing apparatus according to claim 11 or 12, wherein the correction unit performs the predetermined correction between the plurality of scales when the processing unit applies the predetermined processing to the substrate. The substrate processing apparatus according to any one of claims 11 to 13, wherein the processing unit irradiates the substrate with exposure light to project an exposure image of the pattern formed on the photomask to the substrate. A device manufacturing method for forming a pattern on a substrate using the substrate processing apparatus of claim 14. A sheet-like substrate conveying apparatus is configured to support a flexible sheet-like substrate that is supported by an outer peripheral surface of a cylindrical member that rotates about a predetermined central axis of rotation, and that is provided in the longitudinal direction, and includes a scale portion Arranging in a ring shape along the direction in which the cylindrical member rotates, and rotating around the central axis of rotation together with the cylindrical member, and providing a plurality of scales for measuring at least the positional change in the circumferential direction of the outer peripheral surface a first reading unit disposed opposite the scale for reading the scale; the second reading unit facing the scale and disposed in the circumferential direction of the cylindrical member and the first reading a different angular position for reading the scale; The memory unit stores the difference between the read value of the scale of the first reading unit and the read value of the scale of the second reading unit for each predetermined rotation angle of the scale portion, and according to the difference, And storing correction information related to an error between the scales of the scale portion and the scale; and the correction unit correcting the read value of the scale of the first reading unit and the second reading unit according to the error information The value of at least one of the read values of the scale is output as the transport position or the transport amount of the sheet substrate in the longitudinal direction. The carrier apparatus for a sheet substrate according to claim 16, wherein the predetermined rotation angle is set to an angle that does not become a divisor of 360 degrees. A sheet-like substrate conveying apparatus is configured to support a flexible sheet-like substrate that is supported by an outer peripheral surface of a cylindrical member that rotates around a predetermined central axis of rotation, and that is conveyed in the longitudinal direction, and includes a scale portion having a scale formed at a predetermined pitch in a rotation direction of the cylindrical member along a circumference of a radius of the central axis of the cylindrical member, and rotating around the central axis together with the cylindrical member; the first reading portion is configured to The first position in the circumferential direction of the scale portion reads the scale of the scale portion to change in accordance with the position at which the cylindrical member rotates, and the second reading portion separates the angle θs from the first position in the circumferential direction of the scale portion. The second position reads the scale of the scale portion as the position of the cylindrical member rotates, and the graph creation portion is the first read when the cylindrical member rotates at an angle α different from the angle θs Each of the position information of the scale measured by the reading of each of the pickup portion and the second reading portion is sequentially determined during a plurality of rotations of the cylindrical member by one or more rotations to create the scale. Error interval between the scales Close the chart. The conveying device of the sheet substrate of claim 18, wherein the angle θs The angle α is set to be smaller than the angle θs and is a value other than the approximate number of 360 degrees or a value of 360 degrees. The apparatus for conveying a sheet-like substrate according to claim 18, wherein the angle θs is set to be 90 degrees or less, the angle α is set to be smaller than the angle θs, and the value of 360/α is equal to or less than a decimal point. The value of 1 bit to 4 digits can be divisible. The sheet-like substrate conveying apparatus according to claim 19, wherein the scale portion is formed on an outer circumference of a scale disc that is coaxially mounted to the central axis at an end portion of the cylindrical member in the central axis direction. Face, or side end face. The sheet-like substrate conveying apparatus according to claim 21, wherein the scale disc is fixed to an end portion of the cylindrical member, and has a plurality of solid structures arranged at intervals of an angle β around the central axis. Pieces. The apparatus for conveying a sheet-like substrate according to claim 22, wherein the angle β between the arrangement intervals of the plurality of solid structural members and the angle θs is set to a relationship of β>θs.