TW201603870A - 集塵用治具、基板處理裝置及微粒捕捉方法 - Google Patents

集塵用治具、基板處理裝置及微粒捕捉方法 Download PDF

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Publication number
TW201603870A
TW201603870A TW104111248A TW104111248A TW201603870A TW 201603870 A TW201603870 A TW 201603870A TW 104111248 A TW104111248 A TW 104111248A TW 104111248 A TW104111248 A TW 104111248A TW 201603870 A TW201603870 A TW 201603870A
Authority
TW
Taiwan
Prior art keywords
substrate
dust collecting
filter
particles
atmosphere
Prior art date
Application number
TW104111248A
Other languages
English (en)
Chinese (zh)
Inventor
Hitoshi Hashima
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW201603870A publication Critical patent/TW201603870A/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
    • B01D46/0032—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions using electrostatic forces to remove particles, e.g. electret filters

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electrostatic Separation (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
TW104111248A 2014-04-14 2015-04-08 集塵用治具、基板處理裝置及微粒捕捉方法 TW201603870A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014083062A JP6036742B2 (ja) 2014-04-14 2014-04-14 集塵用治具、基板処理装置及びパーティクル捕集方法。

Publications (1)

Publication Number Publication Date
TW201603870A true TW201603870A (zh) 2016-02-01

Family

ID=54324055

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104111248A TW201603870A (zh) 2014-04-14 2015-04-08 集塵用治具、基板處理裝置及微粒捕捉方法

Country Status (3)

Country Link
JP (1) JP6036742B2 (ja)
TW (1) TW201603870A (ja)
WO (1) WO2015159849A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7005288B2 (ja) * 2017-11-02 2022-01-21 株式会社ニューフレアテクノロジー 集塵装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0650987Y2 (ja) * 1985-07-02 1994-12-21 東京エレクトロン株式会社 ウエハ吸着保持装置
JP3271207B2 (ja) * 1993-03-18 2002-04-02 ソニー株式会社 基板搬送装置
JP3981246B2 (ja) * 2001-05-02 2007-09-26 日東電工株式会社 クリーニングシ―ト、クリーニング機能付き搬送部材、及びこれらを用いた基板処理装置のクリーニング方法
KR101073546B1 (ko) * 2009-08-13 2011-10-17 삼성모바일디스플레이주식회사 스토커
JP5932592B2 (ja) * 2011-12-05 2016-06-08 東京エレクトロン株式会社 除電用治具及びそれを用いた基板処理装置並びに基板処理装置の除電方法

Also Published As

Publication number Publication date
JP6036742B2 (ja) 2016-11-30
WO2015159849A1 (ja) 2015-10-22
JP2015204378A (ja) 2015-11-16

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