TW201544898A - Pellicle production apparatus - Google Patents

Abstract

A pellicle production apparatus includes a bonding unit that includes: a bonding chamber at which bonding of a pellicle frame member and a pellicle film member is performed, the pellicle frame member including a pellicle frame having a groove formed at least one of one end face and the other end face in a thickness direction of the pellicle frame and having a through-hole passing between an outer peripheral face of the pellicle frame and a wall surface of the groove, and the pellicle film member including a pellicle film; and an evacuation tube for evacuating the inside of the groove via the through-hole in a state in which the pellicle frame member and the pellicle film member are arranged in the bonding chamber such that the end face of the pellicle frame member at which the groove is formed and the pellicle film member oppose each other.

Description

Dust film manufacturing device

The present invention relates to a device for manufacturing a pellicle.

The high integration and miniaturization of semiconductor devices (semiconductor devices) are accelerating year by year. For example, a pattern having a line width of about 45 nm is formed by excimer exposure. However, in recent years, with the further miniaturization of semiconductor devices, it has been required to form a pattern having a line width of 32 nm or less. It is difficult to cope with such microfabrication by existing excimer exposure. Therefore, it is being studied to replace the exposure light with a shorter wavelength Ultra Light Violet (EUV) light.

EUV light has characteristics that are easily absorbed by all substances. Therefore, in photolithography (hereinafter also referred to as "EUV lithography") using EUV light as exposure light, exposure is performed using a reflection optical system. Specifically, the EUV light is reflected by reflecting the original plate of the exposure pattern, and the resist is exposed by EUV light as reflected light. At this time, if foreign matter adheres to the original plate, the EUV light is absorbed by the foreign matter or the EUV light is scattered, so that the desired pattern cannot be exposed. Therefore, it is being studied to protect the original EUV light irradiation surface with a pellicle. The pellicle assembly is configured to include a pellicle film for protecting the original EUV light-irradiating surface and a pellicle frame for supporting the pellicle.

As a dustproof film used for EUV lithography, it is required to have high permeability to EUV light, and it is not decomposed and deformed by irradiation of EUV light. As a pellicle film which satisfies such a requirement, a ruthenium crystal film such as a single crystal ruthenium film (for example, Reference 1 and Document 2), an aluminum nitride film laminated on a metal mesh (for example, Reference 3), and graphene are proposed. A film (for example, Reference 4) or the like.

Document 1: Japanese Patent Laid-Open Publication No. 2010-256434. Document 2: Japanese Patent Laid-Open Publication No. 2009-116284 No. JP-A-2005-43895

[Problems to be solved by the invention]

In addition, a pellicle film assembly including a pellicle film and a pellicle frame as represented by a pellicle for EUV lithography is generally manufactured by a method in which a pellicle is attached by hand and optionally using an adhesive. Frame with pellicle assembly. In this case, when bonding is performed, it is generally brought into contact with the film surface of the pellicle by means of a device, a jig, a hand or the like. However, the pellicle film has a property of being easily broken, and therefore it is required to pay careful attention to the treatment of the pellicle film. In the pellicle film, a pellicle film containing an inorganic material (for example, the pellicle film described in Documents 1 to 4) is not only a film that is difficult to be self-supporting, but also a film that is damaged or dusted by mechanical contact. Therefore, further attention is required when processing it. Further, in order to prevent the foreign matter from adhering to the pellicle film, it is required to further pay attention to the miniaturization of the semiconductor device.

In view of the above, a device for manufacturing a pellicle film assembly is disclosed. When a pellicle frame member including a pellicle frame is bonded to a pellicle member including a pellicle, a pellicle is manufactured without any device. The jig, the hand, and the like are brought into contact with the film surface of the pellicle film.

The present invention has been made in view of the above, and it is an object of the present invention to achieve the following objects. In other words, it is an object of the present invention to provide a pellicle frame member including a pellicle frame and a pellicle member including a pellicle, and to prevent the film from being in contact with the film of the pellicle as much as possible. A pellicle manufacturing apparatus that bonds the two together. [Means for solving the problem]

Specific means for solving the problem are as follows.

<1> A device for manufacturing a pellicle film assembly, comprising: a bonding unit comprising: a bonding chamber; and a pellicle frame member including a pellicle frame and a pellicle member including a pellicle The pellicle frame has at least one groove disposed at one end surface and the other end surface in the thickness direction, and a through hole penetrating between the outer peripheral surface and the wall surface of the groove; and an exhaust pipe The pellicle frame member and the pellicle member are disposed in the bonding chamber such that an end surface of the pellicle frame in which the groove is provided faces the pellicle member In the state of the trench, the inside of the trench is exhausted through the through hole of the pellicle frame.

<2> The apparatus for manufacturing a pellicle according to the above aspect, wherein the bonding unit further includes an introduction tube for introducing a gas into the bonding chamber to perform the inside of the bonding chamber Pressurize. The apparatus for manufacturing a pellicle according to the above aspect, wherein the introduction tube includes a first introduction tube, and the first introduction tube is configured from the pellicle frame disposed in the bonding chamber. The member and the pellicle member of the pellicle member are introduced with gas to the side, and the bonding unit further includes a gas dispersing member for introducing a gas introduced from the first introduction pipe dispersion. The pellicle assembly manufacturing apparatus according to any one of the aspects of the present invention, further comprising a holding member for holding the pellicle member and carrying the pellicle into the fitting Inside the chamber. The pellicle film manufacturing apparatus according to any one of the aspects of the present invention, wherein the pellicle film comprises the pellicle film and a support substrate, the support substrate having an opening portion The dust-proof film is supported by a portion other than the opening. The apparatus for manufacturing a pellicle according to the above aspect, wherein the pellicle member includes the pellicle and a support substrate, the support substrate having an opening and a portion opposite to the opening The pellicle film is supported, and the holding member holds the pellicle member so as to be in contact with the support substrate and not in contact with the pellicle.

The pellicle assembly manufacturing apparatus according to any one of the above aspects, wherein the bonding unit includes a communication member that is connected to the row in the bonding chamber One end of the air tube and the exhaust pipe communicate with the through hole of the pellicle frame. The device for manufacturing a pellicle according to the above aspect, wherein the communication member is provided to be movable in a direction of being pushed into an outer peripheral surface of the pellicle frame. <9> The pellicle manufacturing apparatus according to <7>, wherein the communicating member has an open end insertable into the through hole.

The apparatus for manufacturing a pellicle according to any one of the aspects of the present invention, further comprising a cutting unit, wherein the cutting unit cuts the outer peripheral shape of the pellicle frame member Dust-proof film member. The apparatus for manufacturing a pellicle according to the above aspect, wherein the pellicle member includes the pellicle film and a support substrate, wherein the support substrate has an opening portion and a portion other than the opening portion The pellicle film is supported, and the support substrate has a cut-in portion for cutting in accordance with an outer peripheral shape of the pellicle frame member. The apparatus for manufacturing a pellicle according to the above aspect, wherein the cutting unit includes a push-up member that is on the outer side of the support substrate with respect to the cut portion. The pellicle member is cut by pushing a portion of the support substrate further inside than the cut portion. The apparatus for manufacturing a pellicle according to the above aspect, wherein the cutting unit comprises: a cutting chamber that performs an operation of cutting the pellicle member; and the push-up member disposed in the cutting chamber Introducing a tube for introducing a gas into the cutting chamber; and a gas dispersing member that disperses a gas introduced through the introduction tube and blows to the inner portion from a direction opposite to the push-up direction.

The apparatus for manufacturing a pellicle according to any one of the above aspects, further comprising a cleaning unit that cleans the cut pellicle member. The apparatus for manufacturing a pellicle according to any one of the above aspects, further comprising an inspection unit, wherein the inspection unit attaches the pellicle frame member and the attached The pellicle member is subjected to visual inspection. The apparatus for manufacturing a pellicle according to any one of the above aspects, comprising: the first measuring member, the pellicle frame member before bonding the pellicle member The shape of the pellicle frame is measured, and the second measuring member measures the shape of the pellicle frame of the pellicle frame member that is bonded to the pellicle member. The device for manufacturing a pellicle according to the above aspect, comprising: an alignment member that performs the pellicle frame member before bonding the pellicle frame member to the pellicle member Alignment with the pellicle member; and control result of the control member based on the measurement result of the shape of the pellicle frame before the bonding and the shape of the pellicle frame after the bonding Feedforward control by alignment of the alignment components. <18> The pellicle manufacturing apparatus according to <16>, comprising: a calculation member that is based on a measurement result of a shape of the pellicle frame before the bonding and the bonding The amount of measurement of the shape of the pellicle frame is determined by the difference in the measurement results of the pellicle frame. The apparatus for manufacturing a pellicle according to the above aspect, wherein the bonding unit includes a communication member that is connected to one end of the exhaust pipe in the bonding chamber, and The exhaust pipe communicates with the through hole of the pellicle frame, and is disposed to be movable in a direction of pushing into an outer peripheral surface of the pellicle frame, the calculation component being based on the strain amount A control member that performs feedforward control on the amount of pushing of the pellicle frame caused by the communicating member. [Effects of the Invention]

According to the present invention, when a pellicle frame member including a pellicle frame is bonded to a pellicle member including a pellicle, a pellicle is manufactured, and the pellicle is in contact with the film of the pellicle as much as possible. A laminated pellicle assembly manufacturing device.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings as appropriate. However, the present invention is not limited to the specific embodiments such as the drawings. In addition, the same reference numerals are attached to the elements common to the respective drawings, and the overlapping description will be omitted. Further, in the drawings, in order to easily observe the structure, there is a case where a part of the hidden line is omitted.

The pellicle manufacturing apparatus of the present embodiment includes a bonding unit including: a bonding chamber and an exhaust pipe, wherein the bonding chamber performs a pellicle frame member including a pellicle frame a bonding of a pellicle member including a pellicle having a groove provided at least one of an end surface and the other end surface in a thickness direction and a wall between the outer peripheral surface and the wall surface of the groove a through hole, the exhaust pipe is configured to dispose the pellicle frame member and the pellicle member in a manner in which an end surface of the pellicle frame in which the groove is disposed is opposed to the pellicle member The inside of the groove is exhausted through the through hole of the pellicle frame in a state of being disposed in the bonding chamber. The pellicle manufacturing apparatus of the present embodiment may have other configurations (for example, other units) as needed.

The pellicle frame of the pellicle frame member of the present embodiment has at least one groove provided on one end surface and the other end surface in the thickness direction. The through hole penetrates between a part of the outer peripheral surface of the pellicle frame and a part of the wall surface (side surface or bottom surface of the groove). Further, in the bonding unit according to the present embodiment, the pellicle frame member and the pellicle member are disposed such that the end surface of the pellicle frame in which the groove is provided faces the pellicle member, and The exhaust pipe exhausts the inside of the groove through the through hole of the pellicle frame. Thereby, the pressing force can be exerted between the pellicle frame of the pellicle frame member and the pellicle member. Therefore, (by means of a device, a jig, a hand, etc.), it is possible to bond the two without contacting the film surface of the pellicle film as much as possible. Therefore, the dust-proof film module manufacturing apparatus according to the present embodiment is configured to bond the pellicle frame member including the pellicle frame to the pellicle member including the pellicle film to form the pellicle. The film is in contact with the surface to bring the two together. Further, in the present embodiment, the "compression force" has the same meaning as the suction force.

Further, according to the pellicle manufacturing apparatus of the present embodiment, it is possible to suppress adhesion of foreign matter to the pellicle film or damage of the pellicle film due to contact with the film surface of the pellicle.

In addition, in recent years, with the miniaturization of semiconductor devices, the demand for suppressing adhesion of foreign matter to the pellicle film assembly has become stronger. Further, the pattern of the line width of 32 nm or less is formed by, for example, EUV lithography. The dust-proof film containing an inorganic material used for EUV lithography tends to be less likely to stand up than a dust-proof film containing an organic material, and is liable to cause damage or dusting due to mechanical contact. Therefore, when a pellicle is produced by using a pellicle film containing an inorganic material, it is highly demanded to produce a pellicle film without contacting the film surface of the pellicle. Here, "self-standing" means that the film shape can be maintained separately. According to the pellicle manufacturing apparatus of the present embodiment, it is possible to cope with these requirements accompanying the miniaturization of the semiconductor device. Specifically, the pellicle manufacturing apparatus of the present embodiment is particularly suitable for the production of a lithographic pellicle assembly using a short-wavelength exposure light (for example, EUV light, light having a shorter wavelength than EUV light, etc.), wherein It is suitable for the production of a pellicle film assembly having a pellicle film containing an inorganic material.

In the present embodiment, the term "Extreme Ultra Violet (EUV)" refers to light having a wavelength of 5 nm to 30 nm. The wavelength of the EUV light is preferably from 5 nm to 13.5 nm. In the present embodiment, the EUV light and the light having a shorter wavelength than the EUV light are collectively referred to as "EUV light or the like".

In the present embodiment, the "end surface in the thickness direction" of the pellicle frame is simply referred to as "end surface". In the present embodiment, the "one end surface and the other end surface in the thickness direction" are of course the other one of the end faces in the thickness direction and the other end faces in the thickness direction.

Further, in the present embodiment, the pellicle frame member and the pellicle member are disposed in the bonding chamber such that the grooved end surface of the pellicle frame is opposed to the pellicle member. Here, in the case where the groove is provided on both the one end surface and the other end surface in the thickness direction of the pellicle frame, either one end surface or the other end surface may be opposed to the pellicle member.

Further, the pellicle frame member of the present embodiment may include only the pellicle frame, and may include an adhesive on the side of the end face of the pellicle frame facing at least the pellicle member, in addition to the pellicle frame. The layer of the adhesive. Thereby, the pellicle frame member and the pellicle member can be attached securely. Further, in addition to the pellicle frame, the pellicle frame member may be provided with an adhesive layer containing an adhesive on the side of both end faces of the pellicle frame. Further, the pellicle frame member may be provided with the adhesive layer and the release liner in this order on the side of the end surface of the pellicle frame that does not face the pellicle member.

In addition, the pellicle member of the present embodiment may include only a pellicle film, and may be provided with other members such as a support substrate that supports the pellicle film in addition to the pellicle film. The pellicle film member is provided with a support substrate that supports the pellicle film, and is particularly suitable for a film in which the pellicle film is difficult to be self-supporting (for example, a pellicle film containing an inorganic material such as a ruthenium crystal film, or a thin pellicle film having a small thickness). As the support substrate, a support substrate having an opening and supporting the pellicle at a portion other than the opening is preferable. In other words, the opening of the support substrate is an opening that exposes the pellicle. The shape of the opening of the support substrate (for example, the opening 127 to be described later) is preferably a shape that is formed when the pellicle member and the pellicle frame member are bonded together to form a pellicle. A region surrounded by the film module frame (for example, an opening portion 50 to be described later) has a shape of an overlapping portion. As an example, the shape of the opening of the support substrate is the same as the area surrounded by the pellicle frame, but the alignment accuracy of the pell film member and the pellicle frame member is as described above. From the viewpoints of the processing accuracy of the opening portion, the processing accuracy of the frame member, and the like, the two need not be identical shapes.

Further, in the present embodiment, it is preferable that the bonding unit further includes an introduction tube for introducing a gas into the bonding chamber to pressurize the bonding chamber. Since the introduction tube can pressurize the inside of the bonding chamber, the pressure of the entire environment in which the pellicle frame member and the pellicle member are disposed and the difference in pressure between the grooves (differential pressure) are further increased. Therefore, the pressing force generated between the pellicle frame member and the pellicle member can be further increased, and the two can be more easily attached.

Further, in the present embodiment, it is preferable that the introduction tube includes a first introduction tube, and the first introduction tube is from the pellicle frame member and the pellicle disposed in the bonding chamber. The pellicle member in the member introduces a gas to the side, and the bonding unit further includes a gas dispersing member for dispersing a gas introduced from the first introduction pipe. In this aspect, the influence of the flow of the gas introduced through the first introduction tube on the pellicle film is reduced.

In the case where the introduction tube includes the first introduction tube, the introduction tube may include a second introduction tube as another introduction tube other than the first introduction tube, in addition to the first introduction tube.

The pellicle manufacturing apparatus of the present embodiment may further include a holding member for holding the pellicle member and carrying it into the bonding chamber. Thereby, the pellicle member can be carried into the bonding chamber without touching the pellicle member. The holding member not only has the function of holding the pellicle member, but also functions to hold the pellicle frame member, and to maintain the functions of the pellicle frame member and the pellicle member (ie, the pellicle). .

In the case where the pellicle manufacturing apparatus of the present embodiment includes the holding member, the pellicle member preferably includes the pellicle and the support substrate, and the support substrate has an opening and the opening. The dust-proof film is supported by a portion other than the dust-proof film that is in contact with the support substrate and that does not contact the dust-proof film. Thereby, the pellicle member can be carried into the bonding chamber without coming into contact with the pellicle film.

In the embodiment, it is preferable that the bonding unit includes a communication member that is connected to one end of the exhaust pipe in the bonding chamber, and the exhaust pipe and the dustproof The through holes of the membrane module frame are in communication. Thereby, when the inside of the groove is exhausted through the through hole of the pellicle frame, the efficiency of the exhaust can be further improved.

The shape of the communicating member may be any shape if it has a shape that allows the exhaust pipe to communicate with the through hole. The shape of the communicating member may be, for example, a shape having an open end that is in contact with the outer peripheral surface of the pellicle frame, and the diameter of the open end is larger than the diameter of the through hole. In this case, it is easier to align the open end of the communication member with the position of the through hole. Further, the shape of the communicating member may also be a shape having an open end having a diameter smaller than the diameter of the through hole. In this case, the open end can be inserted into the through hole, and therefore, the open end of the communicating member can be firmly connected to the through hole.

As described above, the shape of the communicating member may be, for example, a shape having an open end that can be inserted into the through hole of the pellicle frame. In this case, the open end of the communication member can be more firmly connected to the through hole. As an example of the case, the through hole of the frame member has a tapered shape that increases in diameter toward the outer peripheral surface of the pellicle frame, and the communicating member has a shape that can be inserted into the tapered shape. The open end of the tapered shape of the through hole.

Further, the communication member is preferably provided to be movable in a direction of being pushed into the outer peripheral surface of the pellicle frame. Thereby, the connecting member can be connected to the pellicle frame more securely. Further, even when the pellicle frame is strain-deformed in the exhaust direction due to the exhaust of the inside of the groove through the through hole of the pellicle frame, the pellicle can be pushed in by using the connecting member in advance. The outer peripheral surface of the component frame suppresses (corrects) the strain deformation of the frame member. Further, of course, in this case, the communication member may be provided not only to be moved in the direction of pushing into the outer peripheral surface of the pellicle frame, but also to be opposite thereto (return direction; that is, away from the outer peripheral surface) )mobile.

The pellicle manufacturing apparatus of the present embodiment may further include a cutting unit that cuts (cuts) the pellicle member in accordance with the outer peripheral shape of the pellicle frame member. In the aspect in which the cutting unit is provided, as the pell film member, a pellicle member having a size larger than the outer peripheral shape of the pellicle frame member is used. In this case, the pellicle member can be cut before the pellicle member and the pellicle frame member are bonded together, or the pellicle member can be cut after the pellicle member and the pellicle frame member are bonded together. Compared with the case where the cutting is performed in the bonding unit, the pellicle manufacturing apparatus of the present embodiment includes the cutting unit independent of the bonding unit, and the pell film member and the pellicle frame member. At the time of bonding, the adhesion of cutting chips due to cutting (cutting) to each member is suppressed. More specifically, in the bonding chamber of the bonding unit, convection of gas may occur due to exhaust (decompression) of the groove passing through the through hole and opening of the atmosphere of the bonding chamber. When the bonding unit has a gas introduction tube and pressurizes the bonding chamber, convection of the gas is more likely to occur. In the convection of the gas, the pellicle module manufacturing apparatus of the present embodiment includes a cutting unit that is independent of the bonding unit, and the cutting debris in the bonding chamber is caused by the convection of the gas. It is suppressed, and the adhesion of the cutting chips to the respective members at the time of bonding is suppressed.

In the case where the pellicle manufacturing apparatus of the present embodiment includes a dicing unit, the pellicle member preferably includes the pellicle and the support substrate, and the support substrate has an opening and is outside the opening. The pellicle is partially supported, and the support substrate has a cut-in portion for cutting in accordance with an outer peripheral shape of the pellicle frame member. Thereby, the pellicle member can be cut more easily.

In the case where the pellicle manufacturing apparatus of the present embodiment includes a dicing unit, the dicing unit preferably includes a push-up member that is further outward than the cut-in portion with respect to the support substrate. The pellicle member is cut by partially pushing up a portion of the support substrate that is further inside than the cut portion. Thereby, unplanned cracking of the support substrate (breakage in a portion other than the cut portion) can be suppressed as compared with a case where the outer portion is pushed up with respect to the inner portion, and a simpler device can be used It is configured to cut the pellicle member. As such an aspect, for example, a configuration is adopted in which a support member (for example, a mounting plate) that supports the inner portion and a support member that supports the outer portion are independently provided in the cutting unit (for example, The support member that supports the inner portion is movable in the push-up direction with respect to the support member that supports the outer portion. In this aspect, the inner portion is an effective portion of the constituent elements of the pellicle film assembly as the final target, and the outer portion is an unnecessary portion that does not become a constituent element of the pellicle film assembly as the final target.

In the case where the pellicle manufacturing apparatus of the present embodiment includes a cutting unit, the cutting unit preferably includes a cutting chamber for performing an operation of cutting the pellicle member, and the push-up member is disposed at the a cutting chamber for introducing a gas into the cutting chamber; and a gas dispersing member that disperses a gas introduced through the introduction tube and blows the gas into the opposite direction from the push-up direction Inner part. In this aspect, by using the gas blowing of the gas dispersing member, cutting chips and the like which are generated by the cutting can be easily removed from the inner portion (effective portion).

In the case where the pellicle manufacturing apparatus of the present embodiment includes a dicing unit, it is preferable to further include a cleaning unit that protects the diced pellicle film (the dustproof material before being attached to the pellicle frame member) The film member or the pellicle member attached to the pellicle frame member is cleaned. Thereby, foreign matter such as cutting chips generated by cutting can be removed from the inner portion (effective portion).

The pellicle manufacturing apparatus of the present embodiment preferably further includes an inspection unit that performs an appearance inspection on the bonded pellicle frame member and the pellicle member. The inspection of the foreign matter attached to at least one of the pellicle frame member and the pellicle member, the shape measurement of the pellicle frame member (the pellicle frame), the pellicle frame member, and the pellicle film The measurement of the positional deviation of the member, and the like. Furthermore, the "alignment" of the pellicle frame member and the pellicle member may also be referred to as "coincidence".

Preferably, the pellicle manufacturing apparatus of the present embodiment further includes: a first measuring member that measures a shape of the pellicle frame of the pellicle frame member before bonding the pellicle member; And the second measuring member measures the shape of the pellicle frame of the pellicle frame member that is bonded to the pellicle member. In this aspect, it is possible to investigate the presence or absence of deformation of the pellicle frame due to the bonding (especially the exhaust inside the groove of the pellicle frame) and the amount of deformation.

In the case where the pellicle manufacturing apparatus of the present embodiment includes the first measuring member and the second measuring member, the pellicle manufacturing apparatus of the present embodiment preferably further includes an aligning member for arranging the pellicle frame Aligning the pellicle frame member with the pellicle member before bonding the member to the pellicle member; and controlling the member based on the shape of the pellicle frame before the bonding As a result, the result of measurement of the shape of the bonded pellicle frame is subjected to feedforward control by alignment of the alignment member. In this aspect, the control member can predict the deformation of the pellicle frame caused by the lamination, and the alignment deviation (position misalignment) caused by the deformation can be reduced in advance (preferably The method of minimizing the control of the alignment of the pellicle frame member and the pellicle member by the alignment member. In this aspect, the control components can be omitted and the alignment by the alignment components can be manually adjusted.

In the case where the pellicle manufacturing apparatus of the present embodiment includes the first measuring member and the second measuring member, the pellicle manufacturing apparatus of the present embodiment preferably further includes a calculating member, and the calculating member is based on the bonding. The measurement result of the shape of the front pellicle frame is different from the measurement result of the shape of the pellicle frame after the bonding, and the pellicle frame is caused by the bonding. The dependent variable. In this aspect, the calculation component can predict the strain amount of the pellicle frame caused by the lamination (for example, the strain amount of the pellicle frame due to the exhaust of the groove passing through the through hole) The amount of pushing of the frame member due to the communicating member can be controlled in advance so that the strain of the pellicle frame becomes small (preferably minimized).

In the case where the pellicle manufacturing apparatus of the present embodiment includes the calculation member, the pellicle assembly manufacturing apparatus of the present embodiment preferably includes the communication unit, and the communication member is in the bonding cavity. Indoorly connected to one end of the exhaust pipe, and the exhaust pipe is communicated with the through hole of the pellicle frame, and is disposed to be pushed into the outer peripheral surface of the pellicle frame The direction is moved, and the calculation means is a control means for performing feedforward control of the amount of pushing of the pellicle frame caused by the communication member based on the strain amount. In this aspect, the calculation means can not only calculate the amount of strain but also control the amount of pushing of the pellicle frame.

<Specific Example> Next, an example of the present embodiment will be described with reference to Figs. 1 to 26, but the present invention is not limited to the following examples.

(Specific Example of PSA Module Frame) FIG. 1 and FIG. 2 are schematic diagrams showing an example of a pellicle frame of a pellicle frame member which is one of the bonding objects in the pellicle manufacturing apparatus of the present embodiment. Stereo picture. 1 is a schematic perspective view of a direction of one end surface in the thickness direction of an example of a pellicle frame which can be observed, and FIG. 2 is a view showing the direction of the other end surface in the thickness direction of the pellicle frame of the same example. A schematic perspective view of the observation. Fig. 3 is a partial cross-sectional view showing the dustproof film module frame of the above-described example, and is a cross-sectional view taken along line A-A of Fig. 1 in detail.

As shown in FIGS. 1 and 2, the pellicle frame 100 of the present example has a rectangular frame shape. When the pellicle frame 100 is used as a member of the pellicle assembly, the exposure light passes through the opening 50 surrounded by the pellicle frame 100. The outer shape of the pellicle frame 100 is determined by one end surface 10 in the thickness direction of the pellicle frame 100, the other end surface 20, the outer peripheral surface 30 including four faces, and the inner peripheral surface 40 including four faces. In addition, the shape of the pellicle frame 100 of the present embodiment is not limited to a rectangular shape, and may be a rectangular shape as viewed from the thickness direction. A shape other than (for example, a trapezoidal shape, an outer portion of the frame having a convex shape, or the like).

As shown in FIGS. 1 and 3, a groove 12 is provided on one end surface 10. In this embodiment, the shape of the groove 12 viewed from the thickness direction of the pellicle frame 100 is an endless shape that is wound around the shape of the pellicle frame 100. A modification of the shape of the groove viewed from the thickness direction of the pellicle frame will be described later.

The pellicle frame 100 has a through hole 14A and a through hole 14B. The through hole 14A and the through hole 14B penetrate between the bottom surface of the groove 12 and the outer peripheral surface 30, respectively.

Here, the through hole 14A and the through hole 14B may also pass between the side surface of the groove 12 and the outer peripheral surface 30, respectively. In addition, any of the through hole 14A and the through hole 14B may be omitted. That is, in the pellicle frame 100, two through holes (the through hole 14A and the through hole 14B) are connected to one groove (groove 12), but the embodiment is not limited to this. In the present embodiment, at least one through hole may be connected to one trench (groove 12, trench 22).

Further, as shown in FIGS. 2 and 3, a groove 22 is provided on the other end surface 20 opposite to the one end surface 10. In this embodiment, the shape of the groove 22 is also the same as that of the groove 12, and is an endless shape that is wound around the shape of the pellicle frame 100 when viewed from the thickness direction.

The pellicle frame 100 has a through hole 24A and a through hole 24B. The through hole 24A and the through hole 24B penetrate between the bottom surface of the groove 22 and the outer peripheral surface 30, respectively. The variation of the through hole 24A and the through hole 24B is the same as that of the through hole 14A and the through hole 14B.

The pellicle frame 100 is adapted to support the pellicle film on the side of one end face 10 or the other end face 20 to make a pellicle assembly. For example, in the case where the dust-proof film is supported on the side of the one end surface 10, the dust-proof film module frame 100 is provided with a groove 12 on one end surface 10 facing the dust-proof film, and is provided with a connection. The through hole 14A and the through hole 14B of the trench 12. Therefore, when the pellicle film is fixed to the side of the one end surface 10, the inside of the groove 12 (for example, an exhaust member such as a vacuum pump) is exhausted through the through hole 14A and the through hole 14B, thereby reducing dustproof The pressure between the membrane module frame 100 and the pellicle film. By this pressure reduction, the pressing force can be made to function between the pellicle frame 100 and the pellicle film, so that the two can be bonded together without being in contact with the film surface of the pellicle film. Further, when the dustproof film is supported on the side of the other end surface 20, the same effect can be exerted.

Since the pellicle frame 100 is a member that supports the pellicle on either side of the end face, the groove may be provided only on the end surface facing the pellicle. That is, any combination of the combination of the trench 12, the via hole 14A, and the via hole 14B, and the combination of the trench 22, the via hole 24A, and the via hole 24B can be omitted.

Since the pellicle frame 100 has grooves (grooves 12 and grooves 22) on both the one end surface 10 and the other end surface 20, there is an advantage that the end face supporting the pellicle film has a wide selection range. In addition, the pellicle frame 100 has grooves (grooves 12, grooves 22) on both the one end face 10 and the other end face 20, and therefore has an advantage of being suitable for producing an exposure original plate with a pellicle assembly as follows. In the above configuration, the dustproof film is disposed on the one end surface 10 side (or the other end surface 20 side), and the original plate (mask) is disposed on the other end surface 20 side (or the one end surface 10 side). In this case, the pellicle frame 100 and the pellicle can be attached to the pellicle without contact with the film of the pellicle by the exhaust (decompression) of the through-hole. The pellicle frame 100 is bonded to the original plate by the film surface of the pellicle.

In the following, for the sake of convenience, the dust-proof film is supported on the side of the one end surface 10 of the pellicle frame 100, and of course, the pellicle may be supported on the other end of the pellicle frame 100. 20 side.

The size of the pellicle frame 100 can be set, for example, to the following dimensions. The length L1 in the longitudinal direction of the pellicle frame 100 can be, for example, 135 mm to 153 mm, preferably 140 mm to 152 mm, and more preferably 145 mm to 151 mm. The length L2 of the pellicle frame 100 in the short-side direction can be, for example, 100 mm to 130 mm, preferably 105 mm to 125 mm, and more preferably 110 mm to 120 mm. The length L1 in the longitudinal direction and the length L2 in the short-side direction may be the same size. That is, the shape of the pellicle frame 100 may be a square shape. The flame width W of the pellicle frame 100 can be, for example, 1.0 mm to 5.0 mm, preferably 1.2 mm to 3.5 mm, more preferably 1.5 mm to 2.5 mm. Among the four sides of the rectangular pellicle frame 100, the frame width may be the same size or may be set to a different size. In addition, the length of the opening 50 (through hole) surrounded by the pellicle frame 100 can be, for example, 130 mm to 152 mm, preferably 135 mm to 151 mm, and more preferably 140 mm. 150 mm. Further, the width of the opening portion 50 can be, for example, 95 mm to 130 mm, preferably 100 mm to 125 mm, and more preferably 105 mm to 120 mm. The thickness t of the pellicle frame can be, for example, 0.5 mm to 5.0 mm, preferably 0.5 mm to 3.0 mm, more preferably 0.5 mm to 2.0 mm.

Further, the width of the groove 12 and the groove 22 can be appropriately set in consideration of the pressure loss at the groove, the relationship with the frame width of the pellicle frame, and the like, and can be, for example, 10 μm to 1.0 mm, preferably 50. Μm to 700 μm, more preferably 100 μm to 600 μm, and particularly preferably 200 μm to 500 μm. Further, the depth of the groove 12 and the groove 22 can be appropriately set in consideration of the relationship between the pressure loss at the groove and the thickness of the pellicle frame, and can be, for example, 10 μm to 1.0 mm, preferably 50 μm. ～700 μm, more preferably 100 μm to 600 μm, and particularly preferably 200 μm to 500 μm.

In addition, the width of the through hole 14A, the through hole 14B, the through hole 24A, and the through hole 24B can be appropriately set in consideration of the relationship between the pressure loss at the through hole and the thickness of the pellicle frame, and the like, for example, can be set to 10 Μm to 1.0 mm, preferably 50 μm to 700 μm, more preferably 100 μm to 600 μm, and particularly preferably 200 μm to 500 μm. Further, the length of the through hole 14A, the through hole 14B, the through hole 24A, and the through hole 24B can be appropriately set in consideration of reducing the pressure loss at the through hole, and the like, and can be, for example, 0.5 mm to 10 mm, preferably 0.7 mm. 5.0 mm, more preferably 1.0 mm to 2.0 mm. Here, the width of the through hole refers to the passage width of the passage including the through hole (the diameter when the cross section of the through hole is a circular shape), and the length of the through hole refers to the length of the passage of the passage including the through hole. .

The material of the pellicle frame 100 is not particularly limited, and can be used as a normal material used for the pellicle frame. Specific examples of the material of the pellicle frame 100 include aluminum, aluminum alloy (5000 series, 6000 series, 7000 series, etc.), stainless steel, niobium, tantalum alloy, iron, iron alloy, carbon steel, and tool steel. , ceramics, metal-ceramic composites, resins, etc. Among them, aluminum and aluminum alloys are more preferable in terms of light weight and rigidity.

In addition, the pellicle frame 100 may have a protective film on its surface. As the protective film, a protective film which is resistant to hydrogen radicals and EUV light existing in an exposure environment is preferable. As a protective film, an oxide film is mentioned, for example. The oxide film can be formed by a known method such as anodization. Further, the oxide film can be colored by a black dye. When the pellicle frame 100 has an oxide film colored with a black dye, it is easier to detect foreign matter on the pellicle frame 100. In addition, as for the other configuration of the pellicle frame 100, for example, a configuration of a known pellicle frame such as JP-A-2014-021217 and JP-A-2010-146027 can be referred to.

Next, a modification of the pellicle frame will be described. In the pellicle frame 100 shown in FIGS. 1 to 3, one groove is provided on each end surface. However, in the present embodiment, two or more grooves may be provided on each end surface. In the case where two or more grooves are provided on each end surface, it is preferable to connect the through holes to two or more grooves (for example, refer to FIG. 4). Further, in the case where the pellicle frame is rectangular, it is preferable to have four sides of the pellicle frame from the viewpoint of more effectively exerting a pressing force between the pellicle frame and other members. Groove. Here, the aspect of "there is a groove on the four sides of the pellicle frame" includes, for example, a pattern in which a groove is provided across the four sides of the pellicle frame (for example, referring to FIGS. 1 and 2), Each of the four sides of the pellicle frame is provided with one or more grooves (for example, refer to FIG. 4), and a groove is provided across the two sides of the pellicle frame and across the pellicle frame. The remaining two sides are provided with a groove pattern and the like.

4 is a schematic perspective view of the pellicle frame 101 according to a modification of the embodiment, in a direction in which one end surface in the thickness direction can be observed. As shown in FIG. 4, one end surface 10 of the pellicle frame 101 is provided with four grooves, that is, a groove 12A, a groove 12B, a groove 12C, and a groove 12D. The pellicle frame 101 is provided with a through hole 16A, a through hole 16B, a through hole 16C, and a through hole between the bottom surface of each of the through groove 12A, the groove 12B, the groove 12C, and the groove 12D and the outer peripheral surface 30, respectively. Hole 16D. In the pellicle frame 101, each of the grooves has a shape that spans two sides around the corner portion of the pellicle frame 101 and has an end portion in the middle of the two sides. However, the shape of the groove of the present embodiment may be any shape. Further, in the pellicle frame 101, a through hole is connected to one end portion of each of the grooves. However, in the present embodiment, the position of the through hole connected to the groove may be any portion. In short, the through hole may pass between the wall surface of the groove and the outer peripheral surface of the pellicle frame.

In addition, although not shown in FIG. 4, similarly to the other end surface 20 of the pellicle frame 100, a groove is provided on the other end surface of the pellicle frame 101, and a groove penetrating the other end side is provided. a through hole in the wall surface of the groove and the outer peripheral surface. In addition, the shape of the groove on the other end surface side of the pellicle frame 101 can be the same shape as the shape of the groove on the one end surface side of the pellicle frame 101. In the pellicle frame 101, the other configuration is the same as that of the pellicle frame 100, and the preferred range is also the same.

(Specific Example of the Pellicle Frame Member) FIG. 5 is a schematic cross-sectional view showing an example of the pellicle frame member as one of the bonding targets in the pellicle manufacturing apparatus of the present embodiment. As shown in FIG. 5, the pellicle frame member 110 as an example of the pellicle frame member includes the pellicle frame 100, an adhesive layer 102 that is in contact with the one end surface 10 of the pellicle frame 100, An adhesive layer 104 that is in contact with the other end surface 20 of the pellicle frame 100 and a release liner 106 that is in contact with the adhesive layer 104.

In the pellicle frame member 110, the adhesive layer 102 is provided in a portion other than the groove 12 in one end surface 10 of the pellicle frame 100. Thereby, the exhaust of the grooves 12 passing through the through holes 14A and the through holes 14B is efficiently performed.

The adhesive layer 102 is a layer for adhering the pellicle member to the pellicle frame 100 and contains an adhesive. In the present embodiment, the "adhesive" means a generalized adhesive, and the concept of "adhesive" also includes an adhesive. Examples of the adhesive agent contained in the adhesive layer 102 include an acrylic resin adhesive, an epoxy resin adhesive, a polyimide resin adhesive, an anthrone resin adhesive, an inorganic adhesive, a double-sided adhesive tape, and an anthrone. A resin adhesive, an acrylic adhesive, a polyolefin adhesive, or the like. Among them, an acrylic resin adhesive, an epoxy resin adhesive, a polyimide resin adhesive, an anthrone resin adhesive, and an inorganic adhesive are preferable. The thickness of the subsequent agent layer 102 is not particularly limited, but is preferably 1 μm to 500 μm, more preferably 10 μm to 400 μm, still more preferably 20 μm to 300 μm.

The adhesive layer 102 can be formed before being carried into the pellicle manufacturing apparatus of the present embodiment, and the adhesive layer 102 can be formed in the pellicle manufacturing apparatus (for example, the adhesive layer forming unit) of the present embodiment.

The adhesive layer 104 is used to manufacture the pellicle assembly of the pellicle assembly manufacturing apparatus of the present embodiment (that is, the bonding of the pellicle frame member 110 and the pellicle member) to the pellicle frame 100 and The original (mask) is the next layer and contains an adhesive. The adhesive agent contained in the adhesive layer 104 may be the same adhesive as the adhesive contained in the adhesive layer 102, and preferably a double-sided adhesive tape, an anthrone resin adhesive, an acrylic adhesive, or a polyolefin. Adhesive. The thickness of the subsequent agent layer 104 is not particularly limited, but is preferably 1 μm to 500 μm, more preferably 10 μm to 400 μm, still more preferably 20 μm to 300 μm.

The release liner 106 is used in the manufacture of the pellicle assembly of the pellicle assembly manufacturing apparatus of the present embodiment, in the middle of the manufacture of the pellicle assembly, and after the manufacture of the pellicle assembly, and the pellicle assembly and the original sticker. In the past, a member for preventing adhesion of foreign matter or foreign matter to the adhesive layer 104 due to the adhesive layer 104. Further, the release liner 106 also has a meaning that the members of the pellicle frame member 110 are less affected by contact with a device, a jig, a hand or the like.

The release liner is a member also referred to as a release film or separator. As the release liner, a polyethylene terephthalate (PET) film having a release layer such as an anthrone compound can be used without any particular limitation. In the pellicle frame member 110, the shape of the release liner 106 viewed from the thickness direction is a shape that spans the pellicle frame 100 and the opening 50 (the opening surrounded by the pellicle frame 100), that is, A flat plate shape having an opening. Among them, the shape of the release liner 106 may be any shape. The release liner may be a frame-shaped member (a member having an opening) that is in contact only with the surface of the adhesive layer 104. Further, the release liner may be a member larger than the pellicle frame 100, and may have a member that exceeds the outer side of the pellicle frame 100 when viewed from the thickness direction of the pellicle frame 100.

The thickness of the release liner 106 is not particularly limited, but is preferably 5 μm to 500 μm, more preferably 10 μm to 400 μm, and still more preferably 20 μm to 300 μm.

The constituent members of the pellicle frame member 110 (preferably the pellicle frame 100) may also be formed with alignment marks for improving the alignment (position alignment) accuracy of the pellicle member.

(Specific Example of PSA Member) FIG. 6 is a schematic plan view showing an example of a pellicle member which is one of the bonding objects in the pellicle manufacturing apparatus of the present embodiment. Fig. 7 is a sectional view taken along line B-B of Fig. 6; In FIG. 7, the ratio of the size of the outer portion 124 to the overall size of the pellicle member is reduced as shown in FIG. 6 (the same applies to FIGS. 9, 12, and 13). Show).

As shown in FIGS. 6 and 7, the pellicle member 120 of the present example includes a pellicle film 130 and a support substrate 126 that supports the pellicle film 130. FIG. 6 is a schematic plan view of the pellicle member 120 viewed from a direction in which the support substrate 126 can be observed.

The support substrate 126 is a circular-shaped substrate typified by a germanium wafer, and has a rectangular opening 127 at a central portion thereof. The support substrate 126 supports the pellicle film 130 at a portion other than the opening portion 127. In other words, in FIG. 6, the pellicle film 130 is exposed at the opening portion 127 of the support substrate 126. In the pellicle member 120, the shape and size of the opening portion 127 of the support substrate 126 are substantially the same as the shape and size of the opening portion 50 surrounded by the pellicle frame 100. When the pellicle member 120 is bonded to the pellicle frame member 110 to produce the pellicle, the opening 127 can be bonded to the opening 50 (for example, refer to FIG. 8 and FIG. Figure 9). When the produced pellicle is attached to the original plate and attached to the exposure apparatus, the exposure light passes through the area where the opening 127 overlaps the opening 50. However, the size of the opening portion 127 and the size of the opening portion 50 need not be completely the same. For example, the size of the opening portion 127 may be smaller than the size of the opening portion 50, or the size of the opening portion 127 may be larger than the size of the opening portion 50. Among them, it is preferable to suppress the difference in length of one side of the opening portion to within 2 mm (preferably within 1 mm).

In addition, before or after bonding the pellicle member 120 to the pellicle frame member 110, the support substrate 126 is provided to be cut (cut) in accordance with the outer peripheral shape of the pellicle frame member 110. The cutting portion 128 is cut. In the support substrate 126, the inner portion 122 which is the inner side of the cut portion 128 is a portion remaining in the final pellicle. When viewed as a separate member, the inner portion 122 is a member having the same frame shape as the pellicle frame. In the support substrate 126, the outer portion 124 which is the outer side than the cut portion 128 is a portion (i.e., an unnecessary portion) that does not remain in the final pellicle. The shape and size of the outer circumference of the inner portion 122 are substantially the same as the shape and size of the outer circumference of the pellicle frame 100. The sizes of the two are not necessarily the same, and it is preferable to suppress the difference in length of one side of the outer circumference to be within 2 mm (preferably within 1 mm).

Examples of the material of the support substrate 126 include aluminum, aluminum alloy (5000 series, 6000 series, and 7000 series), stainless steel, niobium, tantalum alloy, iron, iron alloy, carbon steel, tool steel, ceramic, and metal. - Ceramic composite materials, resins, and the like. Among them, ruthenium and osmium alloys are preferred.

Further, the shape of the support substrate 126 is not necessarily limited to a circular shape, and may be other shapes such as a rectangular shape or an elliptical shape. Further, the support substrate 126 may be provided with a notch such as a notch or an orientation flat.

The thickness of the support substrate 126 can be, for example, 0.03 mm to 5.0 mm, preferably 0.05 mm to 3.0 mm, more preferably 0.15 mm to 2.0 mm, and particularly preferably 0.3 mm to 1.0 mm.

The material of the pellicle film 130 is not particularly limited, and may be an organic material, an inorganic material, or a mixture of an organic material and an inorganic material. As an organic material, a fluorine-based polymer etc. are mentioned. Examples of the inorganic material include crystalline germanium (for example, single crystal germanium, polycrystalline germanium, etc.), diamond like carbon (DLC), graphite, amorphous carbon, graphene, tantalum carbide, and tantalum nitride. , aluminum nitride, etc. The pellicle film 130 may contain one type of the above material alone or two or more types.

Further, the pellicle film 130 may have a single layer structure or a structure including two or more layers. The thickness of the pellicle film (the total thickness in the case of including two or more layers) can be, for example, 10 nm to 200 nm, preferably 10 nm to 100 nm, more preferably 10 nm to 70 nm, and particularly preferably 10 nm. ~50 nm.

As described above, in the pellicle member 120, the pellicle film 130 is supported by the support substrate 126. The pellicle film of the above-described aspect has the advantage that even when the pellicle film is a film that is difficult to stand on its own (for example, a pellicle film containing an inorganic material such as a ruthenium crystal film or a pellicle film having a small thickness), The pellicle is manufactured by supporting the substrate to maintain the film shape of the pellicle film.

The pellicle member 120 can be produced, for example, by first forming a pellicle film on a crucible wafer (for example, a crucible wafer of 8 turns) which is a material of the support substrate 126 (a support substrate before the opening portion 127 is provided). The ruthenium crystal film of 130 is then etched from the central portion of the ruthenium wafer from the non-formed surface side of the ruthenium crystal film of the ruthenium wafer, and the ruthenium wafer at the center portion is removed to form the opening portion 127. As the pellicle film 130, in addition to the ruthenium crystal film, another film such as a laminate film of a ruthenium nitride film, a ruthenium crystal film, or a tantalum nitride film may be used. Further, as the support substrate 126, another substrate other than the germanium wafer may be used. In other words, when it is convenient to use other materials (film or substrate), the pellicle member can be produced by the same method as described above.

The constituent members of the pellicle member 120 (preferably the support substrate 126) may also form alignment marks for improving the alignment (position alignment) accuracy with the pellicle frame member.

(Specific Example of PSA Module) FIG. 8 is a schematic cross-sectional view showing an example of a pellicle film assembly manufactured by the pellicle module manufacturing apparatus of the present embodiment. As shown in FIG. 8, the pellicle film assembly 200 is formed by bonding the pellicle frame member 110 to the pellicle member 140 including the pellicle film 130 and the inner portion 122 of the support substrate. In detail, in the pellicle film assembly 200, the pellicle frame member 110 and the pellicle member are disposed by the arrangement in which the inner portion 122 of the pellicle member 140 is in contact with the adhesive layer 102 of the pellicle frame member 110. 140 fits. Here, the pellicle film member 140 is a pellicle film that is removed from the pellicle film member 120 by the cutting of the pellicle film member 120 by the position of the cut-in portion 128 and is in contact with the outer portion 124 (hereinafter, also referred to as The "outer portion 124, etc.") is obtained. The cutting of the pellicle member 120 (removal of the outer portion 124 and the like) may be performed before the pellicle film member and the pellicle frame member are bonded together, or may be performed after bonding.

In the pellicle film assembly 200, the preferred range of the thickness of each member is as described above. The thickness of each member is preferably adjusted so that the total thickness of the pellicle film assembly 200 is 5.0 mm or less (more preferably 3.0 μm or less, and further preferably 2.0 mm or less).

(Specific Example of Bonding Unit) FIG. 9 to FIG. 11 are schematic configuration diagrams showing an example of a bonding unit in the pellicle manufacturing apparatus of the present embodiment. The bonding unit is a unit that functions as a device for manufacturing a pellicle. FIG. 9 is a schematic cross-sectional view showing a state in which a view is placed in a bonding chamber of a bonding unit, and a pellicle frame member including a pellicle frame is bonded to a pellicle member including a pellicle. In Fig. 9, the detailed configuration of the inside of the bonding chamber is omitted. 10 and FIG. 11 are schematic cross-sectional views showing a detailed configuration in which a viewpoint is placed in a bonding chamber, and a configuration in which a pellicle member is carried into a bonding chamber. The detailed configuration of the pellicle frame member and the pellicle member is omitted in FIGS. 10 and 11 .

As shown in FIG. 9, the pellicle member 120 and the pellicle frame member 110 are disposed in the bonding chamber 310 of the bonding unit 300. Both of them are disposed such that the inner portion 122 of the support substrate of the pellicle member 120 faces the adhesive layer 102 of the pellicle frame member 110. A groove 12 is provided in an end surface (one end surface 10) of the pellicle frame 100 opposite to the pellicle member 120. Further, the adhesive layer 102 is provided on a portion of the end surface 10 of the pellicle frame 100 other than the groove 12. In the bonding chamber 310, the inside of the trench 12 is passed through the through hole 14B by an exhaust pipe (not shown in FIG. 9; the exhaust pipe 312A and the exhaust pipe 312B in FIGS. 10 and 11). Exhaust (decompression) (arrow E2) is performed, and the inside of the groove 12 is exhausted (reduced pressure) via the through hole 14A (arrow E1). By the exhaust (decompression), the suction force F (that is, the pressing force) can be made to function between the pellicle member 120 and the pellicle frame member 110. By the action of the force F, the two can be bonded together without contacting the pellicle film 130 as much as possible. At this time, it is preferable to introduce the gas into the bonding chamber 310 by an introduction pipe (not shown) to pressurize the inside of the bonding chamber 310. Thereby, the difference between the pressure of the entire environment in the bonding chamber 310 in which the pellicle frame member and the pellicle member is disposed and the pressure inside the groove 12 (differential pressure) can be further increased, so that the Descriptive force F works more effectively.

The force F (the force applied to the entire pellicle frame) is preferably 1 N or more, more preferably 2 N or more. The force F (the force applied to the entire pellicle frame) is more preferably 10 N or more, and particularly preferably 20 N or more. The upper limit of the force F (the force applied to the entire pellicle frame) is not particularly limited, and is, for example, 500 N, preferably 400 N, in terms of productivity and the like.

Next, the configuration of the bonding unit 300 will be described with reference to FIGS. 10 and 11 . FIG. 10 shows a state before the pellicle frame member 110 of the bonding unit 300 is carried into the bonding chamber 310 and the pellicle member 120 is carried into the bonding chamber 310.

As shown in FIGS. 10 and 11 , the bonding unit 300 includes a bonding chamber 310 , a first introduction tube 322 for introducing a gas into the bonding chamber 310 , and pressurizing the inside of the bonding chamber 310 . The introduction pipe 326 and the exhaust pipe 312A and the exhaust pipe 312B for exhausting the inside of the groove through the through hole of the pellicle frame 100 of the pellicle frame member 110.

Here, when the pellicle member 120 and the pellicle frame member 110 are disposed in the bonding chamber 310, the first introduction tube 322 is disposed on the side opposite to the pellicle member 120 (in this example) The position of the gas is introduced from the upper surface of the bonding chamber 310. The bonding unit 300 may include a plurality of first introduction tubes 322. On the other hand, when the pellicle member 120 and the pellicle frame member 110 are placed in the bonding chamber 310, the second introduction tube 326 is disposed under the pellicle frame member 110 and is attached to the chamber. The side of the 310 is introduced into the position of the gas. The second introduction pipe 326 is not limited to this position, and may be provided at all positions where gas can be introduced into the bonding chamber 310. Further, the bonding unit 300 may include a plurality of second introduction tubes 326.

The other ends of the first introduction pipe 322 and the second introduction pipe 326 may be connected to a gas supply member such as a gas cylinder, respectively (via other piping or the like as necessary). Further, a valve (not shown) for switching whether or not to introduce gas may be provided in the middle of the first introduction pipe 322 and the second introduction pipe 326. The valve may be a regulating valve having a mechanism for adjusting the flow rate of the gas or the like. In addition, the gas supplied through the first introduction pipe 322 and the second introduction pipe 326 is not particularly limited, and for example, dry air, an inert gas, or the like can be used.

The exhaust pipe 312A and the exhaust pipe 312B are respectively connectable to the through holes of the pellicle frame of the pellicle frame member 110 via a communication member connected to one end.

FIG. 12 is a partial cross-sectional view conceptually showing a form in which one of the exhaust pipes of FIGS. 10 and 11 , that is, the exhaust pipe 312B is connected to the through hole of the pellicle frame. As shown in FIG. 12, a communication member 314 that communicates the through hole 14B of the pellicle frame 100 with the exhaust pipe 312B is connected to one end of the exhaust pipe 312B. The bonding unit 300 is provided with the communication member 314 to further improve the efficiency of the exhaust gas when exhausting the inside of the trench 12 passing through the through hole 14B. The communication member 314 does not need to be an independent member with respect to the exhaust pipe 312B. That is, the exhaust pipe 312B and the communication member 314 may be one member that is integrally formed.

The shape of the communication member 314 is a shape having an open end that is in contact with the outer peripheral surface of the pellicle frame 100, and the diameter of the open end is larger than the diameter of the through hole. By the shape of the communication member 314 being the shape, the positional alignment of the open end of the communication member 314 with the through hole 14B can be easily performed. More specifically, the shape of the communication member 314 is a tapered shape that increases in diameter as it goes away from one end of the exhaust pipe 312B.

Further, the communication member 314 is provided to be movable in a direction (direction of the arrow J2) that is pushed into the outer peripheral surface of the pellicle frame 100. Thereby, the communication member 314 and the pellicle frame 100 can be connected more securely. Further, even when the inside of the groove 12 is exhausted through the through hole 14B of the pellicle frame 100, the pellicle frame 100 is strain-deformed in the exhaust direction (the direction of the arrow E2). The strain deformation of the pellicle frame 100 is corrected by pushing the outer peripheral surface of the pellicle frame 100 by the communication member 314 in advance. Further, of course, the communication member 314 can also move in a direction (return direction) opposite to the arrow J2.

FIG. 13 is a partial cross-sectional view conceptually showing a state in which one of the exhaust pipes is connected to the through hole of the pellicle frame in the modification of the embodiment, and is a portion of FIG. 12 in the example. The corresponding diagram of the section view. As shown in FIG. 13, the through hole 114B and the through hole 124B of the pellicle frame 103 of the modification have a tapered shape which increases in diameter toward the outer peripheral surface of the pellicle frame 103. The communication member 316 of the modification has a tapered shape that can be inserted into the tapered shape portion of the through hole 114B. According to this modification, the exhaust pipe 312B can be more firmly connected to the through hole 114B by inserting the communication member 316 into the tapered shape portion of the through hole 114B (refer to the arrow J12). In the above-described modification, the aspects other than the above are the same as the above-described example, and the preferred aspects are also the same. In addition, even when the communicating member and the through hole have a shape other than the tapered shape, the same effect as the above-described modification can be exerted as long as the connecting member can be inserted into the through hole. For example, in the case where the communication member is a cylindrical member and the through hole is a cylindrically shaped space, the communication member can be inserted into the through hole by making the diameter of the communication member smaller than the diameter of the through hole.

Further, in the present embodiment, the communication member may be omitted. In other words, in the present embodiment, the exhaust pipe may be connected to the through hole.

Then, returning to FIG. 10 and FIG. 11, the other end (not shown) of the exhaust pipe 312A and the exhaust pipe 312B is disposed outside the bonding chamber 310, and the other ends of the exhaust pipe 312A and the exhaust pipe 312B are separately (other pipes are required as needed) Etc.) Connected to exhaust components such as vacuum mercury. Further, a valve (not shown) for switching whether or not to exhaust the groove 12 may be provided in the middle of the exhaust pipe 312A and the exhaust pipe 312B. The valve may be a regulating valve having a mechanism for adjusting the flow rate of the gas or the like.

Further, in the bonding unit 300, two exhaust pipes are provided corresponding to the number (two) of the through holes connected to the grooves 12 of the pellicle frame 100, of course, the row in the present embodiment The number of trachea is not limited to two. The number of the exhaust pipes is not particularly limited, and it is preferable to make the number of the ends of the exhaust pipe coincide with the number of the through holes. Further, as the exhaust pipe, a branched exhaust pipe can also be used. In general, in the present embodiment, it is preferable that each end portion of the exhaust pipe is connected to each of the through holes connected to the groove, and the groove is provided on a side of the pellicle frame opposite to the pellicle member. End face.

As shown in FIGS. 10 and 11, a mounting plate 330 for placing the pellicle frame member 110 is further provided in the bonding unit 310. The mounting plate 330 is provided with an adsorption mechanism (for example, a plurality of adsorption holes, the same applies hereinafter) for adsorbing the pellicle frame member 110. In the bonding chamber 310, a lift pin 332 that can be raised and lowered with respect to the mounting plate 330 is further provided. The lift pin 332 has a function of receiving the pellicle frame member 110 carried into the bonding chamber 310, and thereafter, the function of placing the pellicle frame member 110 on the mounting plate 330 by lowering; And a function of lifting the pellicle frame member 110 placed on the mounting plate 330 and moving away from the mounting plate 330. In the bonding chamber 310, the lift pins for the pellicle frame member 110 and the lift pins for the pellicle member 120 may be provided independently, and the use for the pellicle frame member 110 may be provided. A lift pin for the use of the pellicle member 120.

The mounting plate 330 can be disposed to be movable in the horizontal direction (more specifically, the X direction and the Y direction orthogonal to each other, and the q direction as the rotation direction), whereby the pellicle frame member 110 can be performed. The alignment (position alignment) adjustment with the pellicle member 120. That is, the mounting plate 330 when it is set to be movable in the horizontal direction functions as an alignment member.

A plurality of sensors 340 are further disposed in the bonding chamber 310. The sensor 340 is a member for reading the position of the pellicle member 120 in the fitting chamber 310. The sensor 340 reads, for example, the position of the cut portion 128 of the support substrate 126 which is sometimes provided on the pellicle member 120, the position of the alignment mark, and the like. The sensor 340 is disposed to be movable in accordance with the position of the reading object (the cut-in portion 128, the alignment mark). The reading by the sensor 340 can be performed by image discrimination. As the sensor 340, a fiber sensor can be preferably used.

Further, as for the alignment mechanism (movement of the mounting plate, reading of the position by the center, etc.) in the bonding unit, a well-known device such as an exposure device (for example, a stepping machine) or a wafer mounting device can be applied. Align the mechanism.

Further, a gas dispersion member 324 for dispersing a gas introduced from the first introduction pipe 322 is further provided in the bonding chamber 310. The gas dispersion member 324 is a cover-shaped member that covers an end portion (introduction port of gas) of the first introduction pipe 322 and a part of an inner wall surface of the upper portion of the bonding chamber 310. Further, a plurality of holes (not shown) are provided on the surface of the gas dispersion member 324 facing the pellicle member 120. The gas introduced from the first introduction pipe 322 first reaches the space formed by the inner wall surface of the upper portion of the bonding chamber 310 and the gas dispersion member 324, and is then dispersed by the plurality of holes. Thereby, the influence of the flow of the gas from the first introduction pipe 322 on the pellicle film is reduced. In view of further reducing the influence of the flow of the gas on the pellicle film, it is preferable that the plurality of holes are provided in a configuration in which the gas does not contact the central portion of the pellicle film 130.

Further, a member inlet and outlet 350 is provided in the bonding chamber 310. The members are carried into and out of the bonding chamber 310 via the member inlet and outlet 350. Specifically, the pellicle member 120 before bonding and the pellicle frame member 110 before bonding are carried into the bonding chamber 310 via the member inlet and outlet 350. Further, the bonded pellicle member 120 and the pellicle frame member 110 are carried out of the bonding chamber 310 via the member inlet and outlet 350. Further, a shutter 352 for opening (see FIG. 11) and closing (see FIG. 10) of the member inlet/outlet 350 is provided in the bonding unit 300.

As shown in FIGS. 10 and 11, the pellicle member 120 held by the hand member 410 as a holding member is carried into the bonding chamber 310. In addition, the dust-proof film module frame member 110 is held by the hand member (for example, the hand member 412 shown in FIG. 15 described later) in the same manner as the pellicle film member 120, and is carried into the bonding cavity. Inside the chamber 310. The holding member that holds the pellicle frame member 110 and the holding member that holds the pellicle member 120 may be the same member or different members.

FIG. 14 is a schematic plan view showing a state in which the hand member 410 holds the pellicle member 120 in the present example. As shown in FIG. 14, the hand member 410 is held in contact with only the outer portion 124 (i.e., the unnecessary region) of the support substrate in the pellicle member 120 when viewed from the thickness direction of the member. By using the hand member 410, when the pellicle member 120 is carried into the bonding chamber 310, it can be carried in without coming into contact with the pellicle film 130. Further, the hand member may also be in contact with the inner portion 122 of the support substrate in the pellicle member 120. For example, as the hand member that holds the pellicle member 120, the hand member 412 (the hand member that holds the pellicle frame member 110) to be described later can be used without using the hand member 410 in the present example. That is, the pellicle member 120 and the pellicle frame member 110 can be held by the same hand member 412.

Fig. 15 is a schematic plan view showing the pellicle frame member 110 of the present example and the hand member 412 holding the pellicle frame member 110. As shown in FIG. 15, the hand member 412 holds a region overlapping a part of the pellicle frame 100 in a plan view as viewed in the thickness direction of the member. The hand member 412 is only in contact with the release liner 106 of the pellicle frame member 110.

The hand member 410 and the hand member 412 may be included in separate transport members (for example, transport robots). However, from the viewpoint of a small installation area of the dust-proof film manufacturing apparatus, it is preferable to include them in the same transport member.

Next, an example of the flow of the bonding process by the bonding unit 300 (the bonding chamber 310) will be described with reference to FIGS. 16 to 19 . In FIGS. 16 to 19, in order to make it easier to understand the flow of the bonding process, a part of the configuration of the bonding unit 300 and a part of the configuration of the bonding chamber 310 are omitted.

First, as shown in FIG. 16, the pellicle frame member 110 is carried into the bonding chamber 310. Then, the exhaust pipe 312A and the exhaust pipe 312B are respectively connected to the through hole 14A and the through hole 14B (arrow J1 and arrow J2) of the pellicle frame 100 of the pellicle frame member 110.

Then, as shown in FIG. 17, the pellicle member 120 is carried into the bonding chamber 310, and the alignment (alignment) of the pellicle member 120 and the pellicle frame member 110 is adjusted, and the pellicle member 120 is lowered. (arrow D1) is placed on the pellicle frame member 110. This placement is mainly performed by the lowering of the lift pins and the weight of the pellicle member 120. Further, unlike the above example, the pellicle frame member 110 may be raised, whereby the pellicle member 120 is placed on the pellicle frame member 110.

Then, as shown in FIG. 18, the inside of the groove 12 of the pellicle frame 100 of the pellicle frame member 110 is subjected to the through holes of the exhaust pipe 312A and the exhaust pipe 312B and the pellicle frame member 110. Exhaust (decompression). The exhaust (decompression) is performed by an exhaust member (for example, vacuum mercury) connected to an end portion of the exhaust pipe that is outside the bonding chamber 310. By this exhaust gas, as described with reference to FIG. 9, the suction force F (that is, the pressing force) acts between the pellicle member 120 and the pellicle frame member 110, and the two are bonded together. Thereby, the pellicle film member 120 and the pellicle frame member 110 can be bonded together without contacting the film surface of the pellicle film as much as possible.

Then, as shown in FIG. 19, gas is introduced into the bonding chamber 310 via the first introduction tube 322. The introduced gas is dispersed in the bonding chamber 310 by the gas dispersion member 324. At this time, it is preferable to disperse the gas so that the gas does not at least contact the central portion of the pellicle member 120 (pustproof film 130) (see an arrow G1). The introduction of the gas into the bonding chamber 310 causes the bonding chamber 310 to be pressurized, thereby arranging the pressure and the groove of the entire environment in the bonding chamber 310 of the pellicle frame member and the pellicle member. The difference in pressure (differential pressure) inside the groove 12 is increased. Due to the differential pressure, the force F is increased, and the pellicle member 120 and the dust-proof envelope frame member 110 are pressed more strongly with each other. In addition, although illustration is abbreviate|omitted in FIG. 19, in addition to the introduction of the gas (pressurization) by the 1st introduction tube 322, the introduction of the gas (pressurization) by the 2nd introduction tube is possible.

The pressing force F between the pellicle member and the pellicle frame member due to the difference (differential pressure) between the total pressure in the bonding chamber 310 and the pressure inside the groove (for the entire pellicle frame) The applied force is adjusted to a degree within the preferred range (for example, about 2 N) to adjust the degree of pressurization and the pressure reduction. For example, the pressure in the bonding chamber 310 is adjusted to, for example, about 0.15 MPa.

(Specific example of the pellicle manufacturing apparatus) The pellicle manufacturing apparatus of the present embodiment may be a device including only a bonding unit (for example, the bonding unit 300), but may be provided with a bonding unit and other units. Device. 20 is a schematic configuration diagram of a pellicle manufacturing apparatus including a bonding unit and another unit, which is an example of a pellicle manufacturing apparatus of the present embodiment.

As shown in FIG. 20, the pellicle manufacturing apparatus 600 includes a transfer robot 400 as a transport member, a pellicle member loader 610, a pellicle frame member loader 620, the bonding unit 300, a cutting unit 500, and cleaning. Unit 640, inspection unit 650, and unloader 630.

The transport robot 400 is a transport member for transporting a material (a dust-proof film member and a pellicle frame member) and a product (a pellicle assembly) to each unit (including the respective loaders and unloaders, the same applies hereinafter). Although the detailed illustration is omitted, the transfer robot 400 includes a hand member 410 as a holding member that holds the pellicle member, and a hand member 412 as a holding member that holds the pellicle frame member. The hand member 410 and the hand member 412 are respectively coupled to the robot arm. The transport robot 400 can hold the pellicle member and the pellicle frame member and carry it into the bonding chamber 310 by the operation of the robot arm. Furthermore, the transport robot 400 may have only one hand member, and may have two or more hand members.

Of course, the pellicle member loader 610 and the pellicle frame member loader 620 are units in which the pellicle member 120 and the pellicle frame member 110 are respectively disposed.

The bonding unit 300 is as described above. The bonding unit 300 preferably includes a first measuring member that measures the shape of the pellicle frame of the pellicle frame member before bonding with the pellicle member. The shape of the pellicle frame as described herein may be, for example, the length L1 in the longitudinal direction, the length L2 in the short-side direction (see FIG. 1 above), the degree of orthogonality of the pellicle frame, and the like. Further, the first measuring member includes the sensor 340 having a function of measuring the shape of the pellicle frame. Further, in the bonding unit 300, a member that detects contact with the pellicle frame may be provided as the first measuring member.

Moreover, it is preferable that the bonding unit 300 is provided with an alignment member which performs alignment (position alignment) of the pellicle frame member and the pell film member before bonding the pellicle frame member and the pellicle member. As the alignment member, a mounting plate 330 that is movable in the horizontal direction (X direction, Y direction, and q direction) as described above can be cited.

Further, in the pellicle manufacturing apparatus 600, in addition to the movable mounting plate 330, a robot arm of the transport robot 400 having a horizontal position adjustment function may be used in combination as an alignment member. Further, in the pellicle manufacturing apparatus 600, the approximate position of each member can be determined by a member or the like which is provided on the hand member and is used to position the pell film member or the pellicle frame member with respect to the hand member. A guiding member that performs the determination; a guiding member that is disposed on the mounting plate 330 and that determines the position of the pellicle frame member relative to the mounting plate 330. The guiding member provided on the placing plate 330 is preferably in contact with the outer peripheral surface of the pellicle frame of the pellicle frame member in terms of improving the accuracy of determining the position of the pellicle frame relative to the placing plate 330. And not in contact with the release liner 106.

The cutting unit 500 is a unit for cutting the pellicle member 120 at the cutting portion 128 and removing an unnecessary portion, that is, the outer portion 124 or the like (the outer portion 124 and the pellicle film that is in contact with the outer portion 124). As described above, the pellicle module manufacturing apparatus 600 includes the cutting unit 500 as a unit independent of the bonding unit 300, and the adhesion of the cutting chips to the respective members due to the convection of the gas at the time of bonding is suppressed. Further, as described above, the cutting by the cutting unit 500 may be performed before the bonding of the pellicle member and the pellicle frame member, or may be performed after bonding. Specific examples of the cutting unit 500 will be described later.

The cleaning unit 640 is a unit that cleans the cut dust-proof film member 120 and cleans and removes foreign matter such as cutting chips. When the pellicle member is cut before bonding with the pellicle frame member, the cleaning unit 640 cleans the pell film member before and after the bonding with the pellicle frame member. In addition, when the pellicle film member is cut after bonding with the pellicle frame member, the cleaning unit 640 plies the pell film member after the bonding with the pellicle frame member (ie, the pellicle film) The dust-proof film member of the module is cleaned. As a configuration of the cleaning unit 640, for example, a semiconductor device, a display device (a liquid crystal display device, an organic electroluminescence device (organic EL device) or the like), and a cleaning device known in the field of electronic devices such as a printed wiring board can be appropriately referred to. Composition.

The inspection unit 650 is a unit that performs visual inspection of the pellicle frame member and the pellicle member after bonding. For the visual inspection, the detection of the foreign matter adhering to at least one of the pellicle frame member and the pellicle member, the shape measurement of the pellicle frame member (the pellicle frame), the pellicle frame member and the pellicle film Position alignment of components, etc. The inspection unit 650 is preferably a second measurement member that measures the shape of the pellicle frame of the pellicle frame member that is bonded to the pellicle member. Examples of the second measuring member include the same examples as the first measuring member.

The unloader 630 is a unit that houses the finally manufactured pellicle.

The pellicle manufacturing apparatus 600 further includes a control member 660. The control member 660 is a measurement result based on the shape of the pellicle frame before bonding (the measurement result by the first measuring member) and the measurement result of the shape of the pellicle frame after bonding (by the second measuring member) The measurement result) is a control unit that performs feedforward control (FF (feedforward) control) by alignment of the alignment members. However, the control unit 660 may be omitted.

The pellicle manufacturing apparatus 600 further includes a calculation member 670. The calculation member 670 is a measurement result based on the shape of the pellicle frame before bonding (the measurement result by the first measurement member) and the measurement result of the shape of the pellicle frame after bonding (by the second measurement member) The measurement result) is a calculation means for calculating the strain amount of the pellicle frame by the bonding in the bonding unit. Further, the calculation unit 670 further includes a function of performing feedforward control (FF control) on the amount of pushing of the pellicle frame 100 by the communication member 314 based on the amount of strain. However, the calculation unit 670 may be omitted.

Further, although the pellicle manufacturing apparatus 600 includes the above-described respective units, units other than the bonding unit 300 may be omitted as appropriate. That is, the unit other than the bonding unit 300 can be provided as a device independent of the pellicle manufacturing apparatus including the bonding unit 300.

Further, the pellicle manufacturing apparatus 600 may be provided with other units than the above units. The other unit includes an adhesive layer forming unit that forms an adhesive layer on the pellicle frame 100, and an adhesive layer forming unit that forms an adhesive layer on the pellicle frame 100 to form an adhesive layer 104. The release liner 106 is attached to a release liner attaching unit or the like on the adhesive layer 104. In this case, the pellicle manufacturing apparatus 600 may include an inversion mechanism that reverses the one end surface 10 and the other end surface 20 of the pellicle frame 100.

(Specific Example of Cutting Unit) Next, an example of the cutting unit in the present embodiment will be described with reference to Figs. 21 to 24 . 21 to 24 are schematic cross-sectional views of an example of the cutting unit 500. 21 to 24 show an example of the flow of the cutting process of the pellicle member 120 in the dicing unit 500.

As shown in FIG. 21, the cutting unit 500 includes a cutting chamber 510, a placing plate 530 disposed at a central portion of the cutting chamber 510, a push-up member 532 for pushing the mounting plate 530, and a cutting chamber 510. A placing plate 540 on which the outer portion 124 of the pellicle member 120 is placed is placed.

When the mounting plate 530 is cut after the pellicle member 120 and the pellicle frame member 110 are bonded together, the pellicle frame member 110 is placed on the pellicle member 120 and the pellicle frame member. When the cutting is performed before the bonding of 110, the inner portion 122 of the pellicle member 120 is placed. In either case, the mounting plate 540 carries the outer portion 124 of the pellicle member 120. This example is an example in which the pellicle member 120 and the pellicle frame member 110 are bonded together, that is, the pellicle frame member 110 is placed on the placing plate 530.

Each of the placing plate 530 and the placing plate 540 is provided with a known suction mechanism for sucking and holding the object to be placed.

The placing plate 530 is movable in the vertical direction by the push-up operation and the returning operation of the push-up member 532. The push-up member 532 has a function of changing the push-up speed.

Further, as a modification of the placing plate 530, it is possible to move in a direction inclined with respect to the vertical direction. Further, the push-up direction may be maintained in the vertical direction, or the pellicle member 120 may be placed so as to be inclined with respect to the horizontal direction. In any of the modifications, the inner portion 122 is pushed up at an angle inclined with respect to a direction perpendicular to the surface of the pellicle member 120.

The mounting plate 540 is fixedly disposed within the cutting chamber 510 with respect to the mounting plate 530 (ie, is not movable).

The cutting unit 500, in turn, has an introduction tube 522 for introducing a gas into the cutting chamber 510. That is, one end of the introduction tube 522 is disposed in the cutting chamber 510, and the other end is disposed outside the cutting chamber 510. Further, a gas dispersion member 524 for dispersing a gas introduced from the introduction tube 522 is further provided in the cutting chamber 510. The gas dispersion member 524 is a cover-shaped member that covers an end portion (introduction port of gas) of the introduction tube 522 and a part of an inner wall surface of the upper portion of the cutting chamber 510. Further, a plurality of holes (not shown) are provided on the surface of the gas dispersion member 524 facing the pellicle member 120. The gas introduced from the introduction pipe 522 first reaches the space formed by the inner wall surface of the upper portion in the cutting chamber 510 and the gas dispersion member 524, and is then dispersed by the plurality of holes. The dispersed gas flows downward in the vertical direction (the direction of the arrow G2 in FIGS. 23 and 24) or radially. With these configurations, the adhesion of the cutting chips generated at the time of cutting to the pellicle film 130 is suppressed. In addition, it also exerts the effect of removing burrs generated during cutting.

The other end of the introduction pipe 522 can be connected to a gas supply member such as a gas cylinder via a separate pipe or the like as needed. Further, a valve (not shown) for switching whether or not to introduce gas may be provided in the middle of the introduction pipe 522. The valve may be a regulating valve having a mechanism for adjusting the flow rate of the gas or the like. Further, the gas supplied through the introduction pipe 522 is not particularly limited, and for example, dry air, an inert gas or the like can be used.

The cutting unit 500, in turn, has an exhaust pipe 512 for exhausting the interior of the cutting chamber 510. The exhaust pipe 512 is branched into four, and four branch ends are present in the cutting chamber 510. Two of the four branch ends between the mounting plate 530 and the mounting plate 540 are connected to a member 514 having a V-shaped cross section. The member 514 is provided along the cut-in portion 128 of the pellicle member 120. The interior of the groove of member 514 is in communication with exhaust pipe 512. According to these configurations, when the pellicle member 120 is cut along the cutting portion 128, the cutting chips generated by the cutting can be discharged to the outside of the cutting chamber 510 via the member 514 and the exhaust pipe 512. Furthermore, the shape of the groove of the member 514 is not limited to the V shape.

An end portion (not shown) outside the cutting chamber 510 of the exhaust pipe 512 may be connected to an exhaust member such as a vacuum pump (via other piping or the like as necessary).

In addition, a member inlet and outlet 550 is provided in the cutting chamber 510. The member (the pellicle member 120 and the pellicle frame member 110 before and after the cutting) are carried into and out of the cutting chamber 510 via the member inlet/outlet 550. In addition, a shutter 552 for opening and closing the member inlet and outlet 550 is provided in the cutting unit 500.

As shown in FIG. 21 and FIG. 22, the pell film member 120 and the pellicle frame member 110 which are held by the hand member 410 as a holding member are carried into the cutting chamber 510. Specifically, the hand member 410 is performed only in contact with the outer portion 124 (ie, the unnecessary region) of the support substrate in the pellicle member 120 and the pellicle frame member 110 after the bonding. maintain. FIG. 21 shows a state before the bonded pellicle member 120 and the pellicle frame member 110 are carried into the cutting chamber 510, and FIG. 22 shows the pell film member 120 and the pellicle frame member 110 that have been bonded together. The state after the inside of the chamber 510. As described above, the hand member 410 is a hand member that also serves to carry the pellicle member 120 before bonding into the attachment chamber 310. In this example, the hand member 410 is in contact with the outer portion 124 of the pellicle member 120 in the bonded pellicle member 120 and the pellicle frame member 110.

Further, although not shown, the cut-up pellicle member 120 and the pellicle frame member 110 (that is, the pellicle assembly) can be carried out to the cutting by holding the pellicle frame member 110 by the hand member 412. Outside the chamber 510.

Further, as a modification, the hand member 412 may be used in a stage in which the pellicle member 120 and the pellicle frame member 110 are carried into the cutting chamber 510. In this case, the portion of the pellicle frame member 110 is supported by the hand member 412.

As shown in FIG. 23, the pellicle member 120 and the pellicle frame member 110 which are carried in the cutting chamber 510 are placed on the placing plate 530 and the placing plate 540. At this time, the release liner 106 is adsorbed to the placing plate 530 by the suction mechanism of the mounting plate 530 so as to be in contact with the release liner 106 of the pellicle frame member 110 on the placing plate 530. Further, on the placing plate 540, the outer portion 124 is attracted to the placing plate 540 by the suction mechanism of the placing plate 540 so as to be in contact with the outer portion 124 of the supporting substrate of the pellicle member 120. Further, gas is introduced into the cutting chamber 510 via the introduction pipe 522 and the gas dispersion member 524. In this example, in the cutting chamber 510, the gas flows downward in the extending direction (the direction of the arrow G2).

Then, as shown in FIG. 24, the placing plate 530 is pushed up by the push-up member 532 in the vertical direction (the direction of the arrow P1). Thereby, the inner portion 122 of the pellicle frame member 110 and the pellicle member 120 is pushed up. By this push-up, the pellicle member 120 is cut along the cut-in portion 128. The push-up direction (arrow P1) at this time is opposite to the flow direction of the gas (arrow G2). With this gas, the adhesion of the cutting chips generated by the cutting to the pellicle film 130 is suppressed.

(An example of the manufacturing process of the pellicle assembly of the pellicle assembly manufacturing apparatus 600) Next, an example of the manufacturing process of the pellicle component by the pellicle manufacturing apparatus 600 is shown with reference to FIG. Further, in each step of FIG. 25, the steps (step 702, step 708, step 710, and step 712) surrounded by broken lines refer to steps that can be omitted in this example.

As shown in Fig. 25, first, as a step 700, the pellicle member is placed on the pellicle member loader, and the pellicle frame member is placed on the pellicle frame member loader. Then, it is carried by the robot and moved into the bonding chamber. Then, in step 702, the shape of the pellicle frame of the pellicle frame member (the shape before bonding) is measured by the first measuring member in the bonding chamber. Then, in step 704, the alignment of the pellicle member and the pellicle frame member is performed by the alignment member in the bonding chamber. Then, the pellicle film member and the pellicle frame member are bonded together in the bonding chamber. Then, in step 706, the pell film member and the pellicle frame member after bonding are carried into the cutting chamber, and the pellicle member is cut. Then, in step 708, the cut pellicle member and the pellicle frame member are conveyed to the cleaning unit, and the cut pellicle member and the pellicle frame member are cleaned.

Then, in step 710, the pellicle member and the pellicle frame member are transported to the visual inspection unit, and in the visual inspection unit, the shape of the pellicle frame of the pellicle frame member is measured by the second measuring member. Shape after closing). Here, the feedforward control of the alignment member in step 704 is performed based on the measurement result by the first measurement member and the measurement result by the second measurement member as needed (hereinafter, also referred to as "FF1 (alignment) Correct))). FF1 (alignment correction) is performed by the control unit 660.

Then, in step 712, the strain amount of the pellicle frame due to the bonding is calculated based on the measurement result by the first measuring member and the measurement result by the second measuring member. The calculation of the dependent variable is performed by the calculation unit 670. Here, the feed-in control of the pellicle frame 100 due to the communication member 314 in the bonding process of the step 704 is performed based on the calculated strain amount (hereinafter, also referred to as "FF2 ( Strain correction))). In this example, FF2 (strain correction) is also performed by the calculation unit 670. However, as a modification, a control means for performing FF2 (strain correction) may be separately provided independently of the calculation means for calculating the corresponding variable.

Then, in step 714, the pellicle member and the pellicle frame member (that is, the pellicle assembly) are conveyed to the unloader and stored.

Although an example of the manufacturing process of the pellicle assembly by the pellicle manufacturing apparatus has been described above, the embodiment is not limited to this example. For example, as described above, in the pellicle manufacturing apparatus 600, the control member 660 and the calculation member 670 may be omitted. That is, FF1 (alignment correction) and FF2 (strain correction) can be manually performed instead of being automatically performed by the control unit. Further, in the pellicle manufacturing apparatus 600, the control member 660 and the calculation member 670 may be the same control member. That is, FF1 (alignment correction), calculation of the strain amount, and FF2 (strain correction) can be performed by one control unit. Further, as described above, the pellicle manufacturing apparatus of the present embodiment may be a device including only the bonding unit. In other words, even if only the bonding process in step 704 is performed, the pellicle film member and the pellicle frame member can be bonded to the pellicle without contacting the pellicle film as much as possible.

(Specific Example of Exposure Apparatus Provided with PSA Module) The pellicle film manufactured by the present embodiment is used in an exposure apparatus in a state of being mounted on a master (mask). FIG. 26 is a schematic cross-sectional view of an EUV exposure apparatus 800 which is an example of an exposure apparatus including an example of a pellicle film assembly manufactured by the present embodiment. As shown in FIG. 26, the EUV exposure apparatus 800 includes a light source 831 that emits EUV light, an exposure master 850, and an illumination optical system 837 that guides EUV light emitted from the light source 831 to the exposure master 850. The exposure master 850 includes a pellicle film 810 including a pellicle film 812 and a pellicle frame 814, and a master 833 (EUV mask). The exposure original plate 850 is disposed such that EUV light emitted from the light source 831 passes through the pellicle film 812 and is irradiated onto the original plate 833. The original 833 is a person who reflects the irradiated EUV light in a pattern.

Here, as the master 833, a master including a support substrate, a reflective layer laminated on the support substrate, and an absorber layer formed on the reflective layer can be used. The surface on the side where the reflection layer and the absorber layer are provided in the surface of the original plate is a light irradiation surface. A desired image is formed on the sensing substrate (e.g., the semiconductor substrate with the photoresist film) by absorbing the portion of the EUV light by the absorber layer. The reflective layer can be a multilayer film of molybdenum (Mo) and bismuth (Si). The absorber layer may be a highly absorptive material such as EUV light such as chromium (Gr) or tantalum nitride.

The pellicle film assembly 810 is an example of a pellicle film assembly manufactured by the present embodiment. The pellicle assembly 810 corresponds to the removal of the glass liner 106 from the pellicle assembly 200. The dustproof film 812 corresponds to the pellicle film 130, for example. The pellicle frame 814 corresponds to the composite of the inner portion 122, the adhesive layer 102, the pellicle frame 100, and the adhesive layer 104.

In the EUV exposure apparatus 800, a filter window 820 and a filter window 825 are provided between the light source 831 and the illumination optical system 837, and between the illumination optical system 837 and the original 833, respectively. Further, the EUV exposure apparatus 800 includes a projection optical system 838 that guides EUV light reflected by the original 833 to the sensing substrate 834.

In the EUV exposure apparatus 800, the EUV light reflected by the original 833 is guided onto the sensing substrate 834 via the projection optical system 838, and the sensing substrate 834 is exposed in a pattern. Further, the exposure by EUV is carried out under reduced pressure.

The EUV light source 831 emits EUV light toward the illumination optical system 837. The EUV light source 831 includes a target, a pulsed laser irradiation unit, and the like. EUV is obtained by irradiating a pulsed laser onto the target to produce a plasma. When the target is set to Xe, EUV having a wavelength of 13 nm to 14 nm can be obtained. The wavelength of the light emitted by the EUV light source is not limited to 13 nm to 14 nm, and may be any suitable wavelength of light in the range of 5 nm to 30 nm.

The illumination optical system 837 collects light irradiated from the EUV light source 831, and uniformizes the illuminance to illuminate the original 833. The illumination optical system 837 includes a plurality of multilayer film mirrors 832 for adjusting the optical path of the EUV, an optical coupler (optical integrator), and the like. The multilayer film mirror is a multilayer film in which molybdenum (Mo) or bismuth (Si) is alternately laminated.

The method of installing the filter window 820 and the filter window 825 is not particularly limited, and examples thereof include a method of attaching via an adhesive or the like, or a method of mechanically fixing the same in an EUV exposure apparatus. A filter window 820 disposed between the light source 831 and the illumination optics 837 captures scattered particles (debris) generated from the light source to prevent scattered particles (debris) from adhering to components within the illumination optics 837 (eg, multiple layers) Membrane mirror 832). On the other hand, the filter window 825 disposed between the illumination optical system 837 and the original 833 captures particles (debris) scattered from the side of the light source 831 to prevent scattered particles (debris) from adhering to the original 833.

Further, since foreign matter adhering to the original plate absorbs EUV light or scatters EUV light, the wafer is poorly analyzed. Therefore, the pellicle assembly 810 is installed in such a manner as to cover the EUV irradiation area of the original 833. The EUV light is irradiated to the original 833 through the pellicle film 812.

The EUV light reflected by the original 833 passes through the pellicle film 812 and is irradiated to the sensing substrate 834 via the projection optical system 838. The projection optical system 838 collects light reflected by the original 833 and irradiates the sensing substrate 834. A plurality of multilayer film mirrors 835, a multilayer film mirror 836, and the like for preparing an optical path of the EUV are included in the projection optical system 838.

The sensing substrate 834 is a substrate or the like on which a resist is applied on a semiconductor wafer, and the resist is exposed in a pattern shape by EUV reflected by the original plate 833. The desired pattern is formed on the semiconductor wafer by developing the resist and etching the semiconductor wafer.

All of the contents disclosed in Japanese Patent Application No. 2014-109483, filed on May 27, 2014, is incorporated herein by reference. All the documents, patent applications, and technical standards described in the present specification are incorporated into the present specification in the same manner as the following, which is specific and separately describes each document, patent application, And the case where technical standards are incorporated by reference.

10‧‧‧One end
12, 12A, 12B, 12C, 12D, 22‧‧‧ trench
14A, 14B, 16A, 16B, 16C, 16D, 24A, 24B, 114B, 124B‧‧‧ through holes
20‧‧‧Other end face
30‧‧‧ outer perimeter
40‧‧‧ inner circumference
50, 127‧‧‧ openings
100, 101, 103, 814‧‧‧Plastic membrane module frame
102, 104‧‧‧ adhesive layer
106‧‧‧Release liner
110‧‧‧Plastic membrane module frame member
120, 140‧‧‧Dust film components
122‧‧‧ inside part
124‧‧‧Outer part
126‧‧‧Support substrate
128‧‧‧cutting department
130, 812‧‧‧Dust film
200, 810‧‧‧Dust film assembly
300‧‧‧Finishing unit
310‧‧‧Fitting chamber
312A, 312B‧‧‧ exhaust pipe
314, 316‧‧‧Connected components
322‧‧‧1st introduction tube
324, 524‧‧‧ gas dispersing members
326‧‧‧2nd introduction tube
330, 530, 540‧‧‧ mounting boards
332‧‧‧lifting pin
340‧‧‧ sensor
350, 550‧‧‧ component import and export
352, 552‧‧ ‧ door
400‧‧‧Handling robot
410, 412‧‧‧ hand components
500‧‧‧Cutting unit
510‧‧‧Cutting chamber
512‧‧‧Exhaust pipe
514‧‧‧ Components with V-shaped grooves in section
522‧‧‧Introduction tube
532‧‧‧Pushing parts
600‧‧‧Dust film assembly manufacturing device
610‧‧‧Dust film member loader
620‧‧‧Plastic membrane module frame member loader
630‧‧‧ Unloader
640‧‧‧cleaning unit
650‧‧‧Check unit
660‧‧‧Control components
670‧‧‧ Calculated parts
700-714‧‧‧ steps
800‧‧‧EUV exposure device
820, 825‧‧‧ filter window
831‧‧‧Light source
832, 835, 836‧‧‧ multilayer film mirror
833‧‧‧ original
834‧‧‧Induction substrate
837‧‧‧Lighting optical system
838‧‧‧Projection optical system
850‧‧‧Expo original
D1, E1, E2, G1, G2, J1, J2, J12, P1‧‧‧ arrows
F‧‧‧ suction force (compression force)
L1‧‧‧ Length in the long direction
L2‧‧‧ Length in the short side direction
T‧‧‧thickness
W‧‧‧ frame width

1 is a schematic perspective view showing an example of a pellicle frame of a pellicle frame member which is one of the bonding objects in a direction in which one end surface in the thickness direction is observed in the pellicle manufacturing apparatus of the present embodiment. . Fig. 2 is a schematic perspective view of the pellicle frame shown in Fig. 1 as seen from the direction in which the other end face in the thickness direction is observed. Fig. 3 is a cross-sectional view taken along line A-A of Fig. 1; 4 is a schematic perspective view of the pellicle frame according to a modification of the embodiment, in a direction in which one end surface in the thickness direction is observed. FIG. 5 is a schematic cross-sectional view showing an example of a pellicle frame member as one of the bonding targets in the pellicle manufacturing apparatus of the present embodiment. FIG. 6 is a schematic plan view showing an example of a pellicle member which is one of the bonding objects in the pellicle manufacturing apparatus of the present embodiment. Fig. 7 is a sectional view taken along line B-B of Fig. 6; FIG. 8 is a schematic cross-sectional view showing an example of a pellicle film assembly manufactured by the pellicle manufacturing apparatus of the present embodiment. FIG. 9 is a schematic configuration diagram showing an example of a bonding unit in the pellicle manufacturing apparatus of the embodiment. FIG. 10 is a schematic cross-sectional view showing an example of a bonding unit in the pellicle manufacturing apparatus of the embodiment. FIG. 11 is a schematic cross-sectional view showing an example of a bonding unit in the pellicle manufacturing apparatus of the embodiment. FIG. 12 is a partial cross-sectional view conceptually showing a state in which one of the exhaust pipes is connected to the through hole of the pellicle frame in the example of the embodiment. Fig. 13 is a partial cross-sectional view conceptually showing a state in which one of the exhaust pipes is connected to the through hole of the pellicle frame in the modification of the embodiment. FIG. 14 is a schematic plan view showing a state in which a hand member holds a pellicle member in an example of the embodiment. FIG. 15 is a schematic plan view showing a state in which the hand member holds the pellicle frame member in the example of the embodiment. FIG. 16 is a schematic flow chart showing the flow of the bonding process in the example of the embodiment. 17 is a schematic flow chart showing the flow of the bonding process in an example of the embodiment. FIG. 18 is a schematic flowchart showing the flow of the bonding process in the example of the embodiment. FIG. 19 is a schematic flowchart showing the flow of the bonding process in the example of the embodiment. FIG. 20 is a schematic configuration diagram showing an example of a pellicle manufacturing apparatus of the present embodiment. FIG. 21 is a schematic flow chart showing a flow of a cutting process in an example of the embodiment. FIG. 22 is a schematic process diagram showing a flow of a cutting process in an example of the embodiment. FIG. 23 is a schematic flow chart showing a flow of a cutting process in an example of the embodiment. FIG. 24 is a schematic flow chart showing a flow of a cutting process in an example of the embodiment. FIG. 25 is a flowchart showing an example of a manufacturing flow of a pellicle according to an example of the present embodiment. FIG. 26 is a schematic cross-sectional view of an EUV exposure apparatus, which is an example of an exposure apparatus including an example of a pellicle film assembly manufactured by the present embodiment.

12‧‧‧ trench

14A, 14B‧‧‧through holes

100‧‧‧Plastic membrane module frame

102, 104‧‧‧ adhesive layer

106‧‧‧Release liner

110‧‧‧Plastic membrane module frame member

120‧‧‧Dust film components

122‧‧‧ inside part

124‧‧‧Outer part

130‧‧‧Plastic film

300‧‧‧Finishing unit

310‧‧‧Fitting chamber

E1, E2‧‧‧ arrows

F‧‧‧ suction force (compression force)

Claims (19)

A dust-proof film module manufacturing apparatus comprising: a bonding unit comprising: a bonding chamber; and bonding a pellicle frame member including a pellicle frame to a pellicle member including a pellicle; The pellicle frame has at least one groove disposed at one end surface and the other end surface in the thickness direction, and a through hole penetrating between the outer peripheral surface and the wall surface of the groove; and an exhaust pipe for The pellicle frame member and the pellicle member are disposed in the bonding chamber such that the end surface of the pellicle frame is disposed such that the end surface of the groove faces the pellicle member The inside of the groove is exhausted through the through hole of the pellicle frame. The apparatus for manufacturing a pellicle according to claim 1, wherein the bonding unit further includes an introduction tube for introducing a gas into the bonding chamber to perform indoors in the bonding chamber. Pressurize. The pellicle manufacturing apparatus according to claim 2, wherein the introduction pipe includes a first introduction pipe, and the first introduction pipe is configured from the pellicle frame disposed in the bonding chamber The member and the pellicle member of the pellicle member are introduced with gas to the side, and the bonding unit further includes a gas dispersing member for introducing a gas introduced from the first introduction pipe dispersion. The pellicle manufacturing apparatus according to any one of the first to third aspects of the present invention, further comprising a holding member for holding the pellicle member and carrying the pellicle Inside the chamber. The dust-proof film module manufacturing apparatus according to any one of the preceding claims, wherein the dust-proof film member includes the dustproof film and a support substrate, the support substrate having an opening portion The dust-proof film is supported by a portion other than the opening. The pellicle manufacturing apparatus according to claim 4, wherein the pellicle member includes the pellicle and a support substrate, the support substrate having an opening and a portion opposite to the opening The pellicle film is supported, and the holding member holds the pellicle member so as to be in contact with the support substrate and not in contact with the pellicle. The pellicle assembly manufacturing apparatus according to any one of claims 1 to 3, wherein the bonding unit includes a communication member, the communication member being connected to the row in the bonding chamber One end of the air tube and the exhaust pipe communicate with the through hole of the pellicle frame. The pellicle manufacturing apparatus according to claim 7, wherein the communication member is provided to be movable in a direction of pushing into an outer peripheral surface of the pellicle frame. The pellicle manufacturing apparatus of claim 7, wherein the communication member has an open end insertable into the through hole. The pellicle manufacturing apparatus according to any one of the first to third aspects of the present invention, further comprising a cutting unit, wherein the cutting unit cuts the outer peripheral shape of the pellicle frame member Dust-proof film member. The pellicle manufacturing apparatus according to claim 10, wherein the pellicle member comprises the pellicle film and a support substrate, wherein the support substrate has an opening portion and a portion other than the opening portion The pellicle film is supported, and the support substrate has a cut-in portion for cutting in accordance with an outer peripheral shape of the pellicle frame member. The pellicle manufacturing apparatus according to claim 11, wherein the cutting unit includes a push-up member that is upper than a portion of the support substrate that is more outward than the cut-in portion The pellicle member is cut by pushing a portion of the support substrate further inside than the cut portion. The apparatus for manufacturing a pellicle according to claim 12, wherein the cutting unit comprises: a cutting chamber for performing an operation of cutting the pellicle member; and the pushing member disposed in the cutting chamber Introducing a tube for introducing a gas into the cutting chamber; and a gas dispersing member that disperses a gas introduced through the introduction tube and blows to the inner portion from a direction opposite to the push-up direction. The pellicle manufacturing apparatus according to claim 10, further comprising a cleaning unit that cleans the cut pellicle member. The pellicle manufacturing apparatus according to any one of the first to third aspect of the present invention, further comprising an inspection unit, wherein the inspection unit attaches the pellicle frame member and the bonded film module The pellicle member is subjected to visual inspection. The pellicle manufacturing apparatus according to any one of the first to third aspects of the present invention, comprising: a first measuring member; the pellicle frame member before bonding the pellicle member The shape of the pellicle frame is measured, and the second measuring member measures the shape of the pellicle frame of the pellicle frame member that is bonded to the pellicle member. The pellicle assembly manufacturing apparatus according to claim 16, comprising: an alignment member that performs the pellicle frame member before bonding the pellicle frame member to the pellicle member Alignment with the pellicle member; and control result of the control member based on the measurement result of the shape of the pellicle frame before the bonding and the shape of the pellicle frame after the bonding Feedforward control by alignment of the alignment components. The pellicle manufacturing apparatus according to claim 16, comprising: a calculation member that is based on a measurement result of a shape of the pellicle frame before the bonding and the bonding The amount of measurement of the shape of the pellicle frame is determined by the difference in the measurement results of the pellicle frame. The pellicle assembly manufacturing apparatus according to claim 18, wherein the bonding unit includes a communication member that is connected to one end of the exhaust pipe in the bonding chamber, and The exhaust pipe communicates with the through hole of the pellicle frame, and is disposed to be movable in a direction of pushing into an outer peripheral surface of the pellicle frame, the calculation component being based on the strain amount A control member that performs feedforward control on the amount of pushing of the pellicle frame caused by the communicating member.