JPWO2015182483A1 - Pellicle manufacturing equipment - Google Patents

Abstract

A pellicle frame member including a pellicle frame having a groove provided on at least one of the one end surface and the other end surface in the thickness direction and a through-hole penetrating between the outer peripheral surface and the wall surface of the groove, and a pellicle film including a pellicle film A pellicle frame member and a pellicle film member in the bonding chamber, and an end surface of the pellicle frame provided with the groove and the pellicle film member are opposed to each other. A pellicle manufacturing apparatus comprising: a bonding unit including an exhaust pipe for exhausting the inside of the groove through the through hole of the pellicle frame in a state where the pellicle frame is disposed.

Description

  The present invention relates to a pellicle manufacturing apparatus.

High integration and miniaturization of semiconductor devices (semiconductor devices) are accelerating year by year.
For example, currently, a pattern with a line width of about 45 nm is formed by excimer exposure, but in recent years, with the further miniaturization of semiconductor devices, the formation of a pattern with a line width of 32 nm or less is required. Such microfabrication is difficult to handle with conventional excimer exposure. Therefore, it has been studied to change the exposure light to EUV (Extreme Ultra Violet) light having a shorter wavelength.

EUV light has the property of being easily absorbed by any substance.
Therefore, in photolithography using EUV light as exposure light (hereinafter also referred to as “EUV lithography”), exposure is performed using a reflective optical system. Specifically, the EUV light is reflected by the original plate reflecting the exposure pattern, and the resist is exposed by the EUV light as the reflected light. At this time, if a foreign substance adheres to the original, the EUV light is absorbed by the foreign substance or the EUV light is scattered, so that a desired pattern may not be exposed.
Thus, it has been studied to protect the EUV light irradiation surface of the original plate with a pellicle.
The configuration of the pellicle includes a pellicle film for protecting the EUV light irradiation surface of the original plate, and a pellicle frame that supports the pellicle film.

  A pellicle film used for EUV lithography is required to have high transparency to EUV light and not to be decomposed or deformed by irradiation with EUV light. As a pellicle film satisfying such requirements, a silicon crystal film such as a single crystal silicon film (see, for example, References 1 and 2), an aluminum nitride film (see, for example, Reference 3) laminated on a metal mesh, a graphene film ( For example, refer to Document 4).

Literature 1: JP 2010-256434 A Literature 2: JP 2009-116284 A Literature 3: JP 2005-43895 A Literature 4: International Publication No. 2011/160861

By the way, a pellicle including a pellicle film and a pellicle frame, including a pellicle for EUV lithography, is generally manufactured by a method of manually bonding the pellicle frame and the pellicle to each other using an adhesive as necessary. In this case, it is general that the film surface of the pellicle film is brought into contact with an apparatus, a jig, a hand or the like at the time of bonding.
However, since the pellicle film has the property of being easily broken, careful handling is required for handling the pellicle film. Among the pellicle films, the pellicle film containing an inorganic material (for example, the pellicle film described in Documents 1 to 4) is not only a film that is not self-supporting, but also causes mechanical scratches and dust generation. Therefore, further attention is required for the handling.
Further, with the miniaturization of semiconductor devices, further attention is required to prevent foreign matters from adhering to the pellicle film.

  From the above viewpoint, when manufacturing a pellicle by laminating a pellicle frame member including a pellicle frame and a pellicle film member including a pellicle film, the device, jig, hand, etc. are in contact with the film surface of the pellicle film as much as possible. We studied a pellicle manufacturing device that bonds the two together.

This invention is made | formed in view of the above, and makes it a subject to achieve the following objectives.
That is, an object of the present invention is to manufacture a pellicle by bonding a pellicle frame member including a pellicle frame and a pellicle film member including a pellicle film, and bonding both of them together without contacting the film surface of the pellicle film as much as possible. It is to provide a pellicle manufacturing apparatus that can be combined.

  Specific means for solving the above problems are as follows.

<1> A pellicle frame member including a pellicle frame having a pellicle frame having a groove provided on at least one of the one end surface and the other end surface in the thickness direction and a through-hole penetrating between the outer peripheral surface and the wall surface of the groove; A pellicle film member including a bonding chamber in which the bonding is performed;
The pellicle frame member and the pellicle film member are disposed in the bonding chamber in a state where the end surface of the pellicle frame provided with the groove and the pellicle film member are opposed to each other. An exhaust pipe for exhausting the inside of the groove through the through hole;
A pellicle manufacturing apparatus comprising a bonding unit including:

<2> The pellicle manufacturing apparatus according to <1>, wherein the bonding unit further includes an introduction pipe for introducing a gas into the bonding chamber to pressurize the bonding chamber.
<3> The introduction pipe includes a first introduction pipe that introduces a gas from a side facing the pellicle film member of the pellicle frame member and the pellicle film member disposed in the bonding chamber,
The bonding unit further includes:
The pellicle manufacturing apparatus according to <2>, including a gas dispersion member for dispersing the gas introduced from the first introduction pipe.
<4> The pellicle manufacturing apparatus according to any one of <1> to <3>, further including a holding member for holding the pellicle film member and carrying it into the bonding chamber.
<5> The pellicle film member includes any one of <1> to <4>, including the pellicle film and a support substrate that has an opening and supports the pellicle film at a portion other than the opening. The pellicle manufacturing apparatus according to Item.
<6> The pellicle film member includes the pellicle film, and a support substrate that has an opening and supports the pellicle film at a portion other than the opening,
The pellicle manufacturing apparatus according to <4>, wherein the holding member holds the pellicle film member in contact with the support substrate and not in contact with the pellicle film.

<7> The bonding unit includes a communication member that is connected to one end of the exhaust pipe in the bonding chamber and connects the exhaust pipe and the through hole of the pellicle frame. The pellicle manufacturing apparatus according to any one of 6>.
<8> The pellicle manufacturing apparatus according to <7>, wherein the communication member is provided so as to be movable in a direction in which an outer peripheral surface of the pellicle frame is pushed.
<9> The pellicle manufacturing apparatus according to <7> or <8>, wherein the communication member has an open end that can be inserted into the through hole.

<10> The pellicle manufacturing apparatus according to any one of <1> to <9>, further including a cut unit that cuts the pellicle film member according to an outer peripheral shape of the pellicle frame member.
<11> The pellicle film member is a support substrate that has an opening and supports the pellicle film at a portion other than the opening, and is cut according to the outer peripheral shape of the pellicle frame member The pellicle manufacturing apparatus according to <10>, including a support substrate having a notch portion.
<12> The pellicle manufacturing according to <11>, wherein the cut unit includes a push-up unit that cuts the pellicle film member by pushing up a portion inside the cut portion of the support substrate with respect to an outer portion. apparatus.
<13> The cut unit is
A cut chamber in which an operation of cutting the pellicle film member is performed;
The push-up means arranged in the cut chamber;
An introduction tube for introducing a gas into the cut chamber;
A gas dispersion member that disperses the gas introduced by the introduction pipe and that blows the inner portion from a direction opposite to the pushing-up direction;
The pellicle manufacturing apparatus according to <12>, including:

<14> The pellicle manufacturing apparatus according to any one of <10> to <13>, further including a cleaning unit that cleans the cut pellicle film member.
<15> The pellicle manufacturing apparatus according to any one of <1> to <14>, further including an inspection unit that performs an appearance inspection of the pellicle frame member and the pellicle film member after the bonding.
<16> first measuring means for measuring the shape of the pellicle frame of the pellicle frame member before being bonded to the pellicle film member;
Second measuring means for measuring the shape of the pellicle frame of the pellicle frame member after being bonded to the pellicle film member;
The pellicle manufacturing apparatus according to any one of <1> to <15>, comprising:
<17> Alignment means for aligning the pellicle frame member and the pellicle film member before bonding the pellicle frame member and the pellicle film member;
Based on the measurement result of the shape of the pellicle frame before the pasting and the measurement result of the shape of the pellicle frame after the pasting, control means for feedforward controlling the alignment by the alignment means;
The pellicle manufacturing apparatus according to <16>, comprising:
<18> Based on the difference between the measurement result of the shape of the pellicle frame before the bonding and the measurement result of the shape of the pellicle frame after the bonding, the distortion amount of the pellicle frame due to the bonding is calculated. The pellicle manufacturing apparatus according to <16>, further comprising a calculating means for
<19> A direction in which the bonding unit is connected to one end of the exhaust pipe in the bonding chamber, connects the exhaust pipe and the through-hole of the pellicle frame, and pushes the outer peripheral surface of the pellicle frame Including a communication member provided movably in the
The pellicle manufacturing apparatus according to <18>, wherein the calculation unit is a control unit that feed-forward-controls the amount by which the communication member pushes the pellicle frame based on the distortion amount.

  According to the present invention, in manufacturing a pellicle by bonding a pellicle frame member including a pellicle frame and a pellicle film member including a pellicle film, the two are bonded without contacting the film surface of the pellicle film as much as possible. A pellicle manufacturing apparatus is provided.

In the pellicle manufacturing apparatus of this embodiment, it is the schematic perspective view which looked at the example of the pellicle frame of the pellicle frame member which is one of the objects of bonding from the direction which can observe the end surface of the thickness direction. It is the schematic perspective view which looked at the pellicle frame shown in FIG. 1 from the direction which can observe the other end surface of thickness direction. It is the sectional view on the AA line of FIG. It is the schematic perspective view which looked at the pellicle frame which concerns on the modification of this embodiment from the direction which can observe the end surface of the thickness direction. In the pellicle manufacturing apparatus of this embodiment, it is a schematic sectional drawing which shows an example of the pellicle frame member which is one of the objects of bonding. In the pellicle manufacturing apparatus of this embodiment, it is a schematic plan view which shows an example of the pellicle film member which is one of the objects of bonding. It is the BB sectional view taken on the line of FIG. It is a schematic sectional drawing which shows an example of the pellicle manufactured with the pellicle manufacturing apparatus of this embodiment. It is a schematic block diagram which shows an example of the bonding unit in the pellicle manufacturing apparatus of this embodiment. It is a schematic sectional drawing which shows an example of the bonding unit in the pellicle manufacturing apparatus of this embodiment. It is a schematic sectional drawing which shows an example of the bonding unit in the pellicle manufacturing apparatus of this embodiment. In an example of this embodiment, it is a fragmentary sectional view which shows notionally one mode that one of exhaust pipes is connected to the penetration hole of a pellicle frame. In the modification of this embodiment, it is a fragmentary sectional view which shows notably a mode that one of the exhaust pipes is connected to the through-hole of a pellicle frame. It is a schematic plan view which shows a mode that the hand member in an example of this embodiment hold | maintains a pellicle membrane member. It is a schematic plan view which shows a mode that the hand member in an example of this embodiment hold | maintains a pellicle frame member. It is a schematic process drawing which shows the flow of the bonding process in an example of this embodiment. It is a schematic process drawing which shows the flow of the bonding process in an example of this embodiment. It is a schematic process drawing which shows the flow of the bonding process in an example of this embodiment. It is a schematic process drawing which shows the flow of the bonding process in an example of this embodiment. It is a schematic block diagram which shows an example of the pellicle manufacturing apparatus of this embodiment. It is a schematic process drawing which shows the flow of the cut process in an example of this embodiment. It is a schematic process drawing which shows the flow of the cut process in an example of this embodiment. It is a schematic process drawing which shows the flow of the cut process in an example of this embodiment. It is a schematic process drawing which shows the flow of the cut process in an example of this embodiment. It is a flowchart which shows an example of the pellicle manufacturing flow by the pellicle manufacturing apparatus which concerns on an example of this embodiment. It is a schematic sectional drawing of EUV exposure apparatus which is an example of the exposure apparatus provided with an example of the pellicle manufactured by this embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings as appropriate. However, the present invention is not limited to a specific embodiment such as a drawing. In addition, elements common to the drawings may be denoted by the same reference numerals, and redundant description may be omitted. In the drawings, some hidden lines may be omitted in order to make the structure easy to see.

The pellicle manufacturing apparatus of the present embodiment includes a pellicle frame including a groove provided on at least one of the one end surface and the other end surface in the thickness direction and a pellicle frame having a through hole penetrating between the outer peripheral surface and the wall surface of the groove. A bonding chamber in which a member and a pellicle film member including a pellicle film are bonded, and the pellicle frame member and the pellicle film member are provided in the bonding chamber with the groove of the pellicle frame A bonding unit including an exhaust pipe for exhausting the inside of the groove through the through hole of the pellicle frame in a state where the end surface and the pellicle film member are arranged to face each other.
The pellicle manufacturing apparatus of this embodiment may include other configurations (for example, other units) as necessary.

The pellicle frame of the pellicle frame member in the present embodiment has a groove provided on at least one of the one end surface and the other end surface in the thickness direction. The through hole penetrates between a part of the outer peripheral surface of the pellicle frame and a part of the wall surface (side surface or bottom surface; the same applies hereinafter) of the groove.
In the bonding unit according to the present embodiment, the pellicle frame member and the pellicle film member are arranged so that the end surface of the pellicle frame provided with the groove and the pellicle film member face each other. The inside of the groove is exhausted through the through hole of the frame. Thereby, a pressing force can be exerted between the pellicle frame of the pellicle frame member and the pellicle film member. For this reason, both can be bonded together without making contact with the film surface of the pellicle film as much as possible (by an apparatus, jig, hand, etc.).
Therefore, according to the pellicle manufacturing apparatus of this embodiment, when a pellicle is manufactured by bonding a pellicle frame member including a pellicle frame and a pellicle film member including a pellicle film, the pellicle film is in contact as much as possible. The effect that both can be pasted together is produced.
In the present embodiment, the “force for pressing” is synonymous with the force for attracting each other.

  Furthermore, according to the pellicle manufacturing apparatus of the present embodiment, it is possible to suppress adhesion of foreign matter to the pellicle film and tearing of the pellicle film due to contact with the film surface of the pellicle.

By the way, in recent years, with the miniaturization of semiconductor devices, there is an increasing demand for suppressing the adhesion of foreign matter to the pellicle.
Further, pattern formation with a line width of 32 nm or less is performed, for example, by EUV lithography. A pellicle film containing an inorganic material used for EUV lithography tends to be less likely to be self-supporting than a pellicle film containing an organic material, and is likely to cause scratches and dust generation even by mechanical contact. Therefore, when a pellicle is manufactured using a pellicle film containing an inorganic material, there is a great demand for manufacturing the pellicle without making contact with the film surface of the pellicle film as much as possible. Here, “self-supporting” indicates that the film shape can be maintained independently.
According to the pellicle manufacturing apparatus of the present embodiment, it is possible to meet these requirements accompanying the miniaturization of semiconductor devices.
Specifically, the pellicle manufacturing apparatus according to the present embodiment is particularly suitable for lithography pellicles using exposure light having a short wavelength (for example, EUV light, light having a shorter wavelength than EUV light, etc.), especially inorganic materials. It is suitable for manufacturing a pellicle provided with a pellicle film containing a system material.

In this embodiment, EUV (Extreme Ultra Violet) light refers to light having a wavelength of 5 nm to 30 nm.
The wavelength of EUV light is preferably 5 nm to 13.5 nm.
In the present embodiment, EUV light and light having a shorter wavelength than EUV light are collectively referred to as “EUV light or the like”.

In the present embodiment, the “end surface in the thickness direction” of the pellicle frame may be simply referred to as “end surface”.
Further, in the present embodiment, “one end surface and the other end surface in the thickness direction” needless to say, one of the end surfaces in the thickness direction and the other of the end surfaces in the thickness direction, respectively.

  In the present embodiment, the pellicle frame member and the pellicle film member are disposed in the bonding chamber so that the end surface of the pellicle frame provided with the groove and the pellicle film member face each other. Here, in the case where grooves are provided on both one end surface and the other end surface in the thickness direction of the pellicle frame, either the one end surface or the other end surface may face the pellicle film member.

Further, the pellicle frame member in the present embodiment may be composed only of the pellicle frame, but in addition to the pellicle frame, an adhesive containing an adhesive on at least the side of the end surface facing the pellicle film member of the pellicle frame A layer may be provided. Thereby, the pellicle frame member and the pellicle film member can be firmly attached.
In addition to the pellicle frame, the pellicle frame member may include an adhesive layer containing an adhesive on both end face sides of the pellicle frame. Further, the pellicle frame member may include the adhesive layer and the release liner in this order on the side of the end surface of the pellicle frame that does not face the pellicle film member.

In addition, the pellicle film member in the present embodiment may be composed of only the pellicle film, but may include other members such as a support substrate that supports the pellicle film in addition to the pellicle film. The aspect in which the pellicle film member includes a support substrate that supports the pellicle film is a film in which the pellicle film is difficult to stand by itself (for example, a pellicle film containing an inorganic material such as a silicon crystal film, a thin pellicle film, etc.) It is particularly suitable in some cases.
The support substrate is preferably a support substrate having an opening and supporting the pellicle film at a portion other than the opening. In other words, the opening of the support substrate is an opening that exposes the pellicle film. The shape of the opening (for example, opening 127 described later) of the support substrate is a region (for example, an opening described later) surrounded by the pellicle frame when the pellicle film member and the pellicle frame member are bonded to form a pellicle. 50) and a shape having an overlapping portion. As an example, the shape of the opening of the support substrate may be the same as the region surrounded by the pellicle frame, but the alignment accuracy between the pellicle film member and the pellicle frame member, the processing accuracy of the opening, From the viewpoint of the processing accuracy of the frame member, etc., it is not necessary that both have the same shape.

In this embodiment, it is preferable that the bonding unit further includes an introduction tube for introducing a gas into the bonding chamber and pressurizing the bonding chamber.
Since the inside of the bonding chamber can be pressurized by this introduction tube, the difference (differential pressure) between the pressure of the entire atmosphere where the pellicle frame member and the pellicle film member are arranged and the pressure inside the groove is further increased. Can be bigger. For this reason, the pressing force generated between the pellicle frame member and the pellicle film member can be increased, and both can be bonded together more easily.

In the present embodiment, the introduction pipe is a first introduction pipe that introduces gas from the side facing the pellicle film member among the pellicle frame member and the pellicle film member disposed in the bonding chamber. More preferably, the bonding unit further includes a gas dispersion member for dispersing the gas introduced from the first introduction pipe.
In this aspect, the influence on the pellicle membrane due to the gas flow introduced by the first introduction pipe is reduced.

  When the introduction pipe includes the first introduction pipe, the introduction pipe may include a second introduction pipe that is another introduction pipe other than the first introduction pipe in addition to the first introduction pipe.

The pellicle manufacturing apparatus of this embodiment may further include a holding member for holding the pellicle film member and carrying it into the bonding chamber. Thus, the pellicle film member can be carried into the bonding chamber without touching the pellicle film member.
The holding member has not only a function of holding the pellicle film member but also other functions such as a function of holding the pellicle frame member, a function of holding the pellicle frame member and the pellicle film member (that is, the pellicle) after bonding. It may be.

When the pellicle manufacturing apparatus of this embodiment includes the holding member, the pellicle film member includes the pellicle film and a support substrate that has an opening and supports the pellicle film at a portion other than the opening. The holding member preferably holds the pellicle film member in contact with the support substrate and not in contact with the pellicle film.
Thereby, the pellicle film member can be carried into the bonding chamber without contacting the pellicle film.

In this embodiment, it is preferable that the bonding unit includes a communication member that is connected to one end of the exhaust pipe and communicates the exhaust pipe and the through hole of the pellicle frame in the bonding chamber.
Thereby, when exhausting the inside of the groove through the through-hole of the pellicle frame, the exhaust efficiency can be further improved.

The shape of the communication member may be any shape as long as the exhaust pipe and the through hole can communicate with each other.
Examples of the shape of the communicating member include a shape having an open end that contacts the outer peripheral surface of the pellicle frame, and the diameter of the open end is larger than the diameter of the through hole. In this case, it becomes easier to align the opening end of the communication member with the through hole.
In addition, examples of the shape of the communication member include a shape having an open end whose diameter is smaller than the diameter of the through hole. In this case, since the open end can be inserted into the through hole, the open end of the communicating member and the through hole can be more securely connected.

As described above, examples of the shape of the communication member include a shape having an open end that can be inserted into the through hole of the pellicle frame. In this case, the open end of the communication member and the through hole can be more securely connected.
As an example of this case, the through hole of the frame member has a tapered shape whose diameter increases toward the outer peripheral surface of the pellicle frame, and the communication member has a tapered shape that can be inserted into the tapered through hole. An example having an open end is given.

Moreover, it is preferable that the said communication member is provided so that a movement in the direction which pushes in the outer peripheral surface of the said pellicle frame is possible.
Thereby, a communicating member and a pellicle frame can be connected more firmly. Furthermore, even if the pellicle frame is distorted and deformed in the exhaust direction by exhausting the inside of the groove through the through-hole of the pellicle frame, the frame member can be obtained by pushing the outer peripheral surface of the pellicle frame in advance with the communication member. Can be suppressed (corrected).
In this case, needless to say, the communication member may be provided not only in the direction in which the outer peripheral surface of the pellicle frame is pushed in but also in the opposite direction (return direction; that is, the direction away from the outer peripheral surface).

The pellicle manufacturing apparatus of the present embodiment may further include a cut unit that cuts (cuts) the pellicle film member in accordance with the outer peripheral shape of the pellicle frame member.
In an aspect including a cut unit, a pellicle film member having a size larger than the outer peripheral shape of the pellicle frame member is used as the pellicle film member. In this case, the pellicle film member may be cut before the pellicle film member and the pellicle frame member are bonded to each other or after the pellicle film member and the pellicle frame member are bonded to each other.
In the aspect in which the pellicle manufacturing apparatus according to the present embodiment includes a cut unit separately from the bonding unit, the pellicle film member and the pellicle frame member are bonded to each other as compared with the case where the cutting is performed in the bonding unit. , The sticking of cut waste generated by cutting (cutting) to each member is suppressed.
More specifically, in the bonding chamber of the bonding unit, gas convection may occur due to the exhaust (reduced pressure) of the groove through the through hole and the release of the bonding chamber to the atmosphere. When the bonding unit includes a gas introduction tube and pressurizes the bonding chamber, gas convection is more likely to occur.
With respect to this gas convection, in the aspect in which the pellicle manufacturing apparatus of the present embodiment includes a cut unit separately from the bonding unit, the phenomenon that the cut dust flies in the bonding chamber is suppressed by the gas convection, and as a result, Adhering of cut waste to each member at the time of alignment is suppressed.

  When the pellicle manufacturing apparatus of this embodiment includes a cut unit, the pellicle film member is a support substrate that has the pellicle film and supports the pellicle film at a portion other than the opening, and the pellicle And a support substrate having a cut portion for cutting in accordance with the outer peripheral shape of the frame member. This makes it easier to cut the pellicle film member.

When the pellicle manufacturing apparatus of the present embodiment includes a cut unit, the cut unit pushes up the pellicle film member by pushing up the inner part of the support substrate with respect to the outer part with respect to the outer part. It is preferable to contain.
Thereby, compared with the case where the said outer part is pushed up with respect to the said inner part, the unintentional crack (crack in parts other than a notch | incision part) of a support substrate can be suppressed, and it is with a simpler apparatus structure. The pellicle film member can be cut.
As this aspect, for example, in the cut unit, a support member (for example, a mounting board) that supports the inner portion and a support member (for example, a mounting board) that supports the outer portion are separately provided, For example, the support member that supports the inner portion may be configured to be movable in a pushing-up direction with respect to the support member that supports the outer portion.
In this aspect, the inner part is an effective part that is a component of the pellicle that is the final object, and the outer part is an unnecessary part that is not a component of the pellicle that is the final object.

When the pellicle manufacturing apparatus of the present embodiment includes a cut unit, the cut unit includes a cut chamber in which an operation of cutting the pellicle film member is performed, the push-up means disposed in the cut chamber, and the cut chamber It is preferable that an introduction pipe for introducing gas into the inside and a gas dispersion member that disperses the gas introduced by the introduction pipe and sprays it on the inner portion from a direction opposite to the pushing-up direction.
In this aspect, the cutting waste generated by the cutting can be easily removed from the inner portion (effective portion) by blowing the gas with the gas dispersion member.

When the pellicle manufacturing apparatus of this embodiment includes a cut unit, the cut pellicle film member (the pellicle film member before being bonded to the pellicle frame member or the pellicle film after being bonded to the pellicle frame member) It is preferable to provide a cleaning unit for cleaning the member.
Thereby, foreign substances, such as cut waste generated by cutting, can be removed from the inner portion (effective portion).

The pellicle manufacturing apparatus of the present embodiment preferably further includes an inspection unit that performs an appearance inspection of the pellicle frame member and the pellicle film member after the bonding.
Appearance inspection includes inspection of foreign matter attached to at least one of the pellicle frame member and the pellicle film member, measurement of the shape of the pellicle frame member (pellicle frame), measurement of misalignment between the pellicle frame member and the pellicle film member, and the like. Can be mentioned.
The “positioning” between the pellicle frame member and the pellicle film member can also be referred to as “superposition”.

The pellicle manufacturing apparatus according to the present embodiment further includes a first measuring unit that measures the shape of the pellicle frame of the pellicle frame member before being bonded to the pellicle film member, and the pellicle film member after being bonded to the pellicle film member. And a second measuring means for measuring the shape of the pellicle frame of the pellicle frame member.
In this aspect, it is possible to examine the presence / absence of the deformation of the pellicle frame and the amount of deformation due to the bonding (particularly, exhaust inside the groove of the pellicle frame).

When the pellicle manufacturing apparatus according to the present embodiment includes the first measuring unit and the second measuring unit, the pellicle manufacturing apparatus according to the present embodiment is configured so that the pellicle frame member is bonded to the pellicle frame member and the pellicle film member. And alignment means for aligning the pellicle film member, and the alignment means based on the measurement result of the shape of the pellicle frame before bonding and the measurement result of the shape of the pellicle frame after bonding It is more preferable to include a control means for performing feedforward control on the alignment according to.
In this aspect, the control means allows for the deformation of the pellicle frame due to bonding, and the alignment deviation (positioning deviation) due to the deformation is reduced in advance by aligning the pellicle frame member and the pellicle film member by the alignment means. (Preferably minimized).
In this aspect, the control means may be omitted, and the alignment adjustment by the alignment means may be performed manually.

When the pellicle manufacturing apparatus according to the present embodiment includes the first measurement unit and the second measurement unit, the pellicle manufacturing apparatus according to the present embodiment further bonds the measurement result of the shape of the pellicle frame before the bonding together with the bonding. It is preferable to include a calculation unit that calculates a distortion amount of the pellicle frame due to the bonding based on a difference from a subsequent measurement result of the shape of the pellicle frame.
In this aspect, the calculation means allows for the amount of distortion of the pellicle frame due to bonding (for example, the amount of distortion of the pellicle frame due to exhaust of the groove through the through hole). Control can be performed so that the distortion of the frame is reduced (preferably minimized).

When the pellicle manufacturing apparatus according to the present embodiment includes the calculation unit, the pellicle manufacturing apparatus according to the present embodiment includes the bonding unit connected to one end of the exhaust pipe in the bonding chamber, A communication member that communicates with the through-hole of the pellicle frame and is movable in a direction to push in the outer peripheral surface of the pellicle frame, and the calculation means uses the communication member based on the amount of distortion. It is preferable that the control unit performs feedforward control on the amount of pushing of the pellicle frame.
In this aspect, the calculation means can control not only the distortion amount but also the push amount of the pellicle frame.

<Specific example>
Next, an example of this embodiment will be described with reference to FIGS. 1 to 26, but the present invention is not limited to the following example.

(Specific example of pellicle frame)
1 and 2 are schematic perspective views showing an example of a pellicle frame of a pellicle frame member that is one of objects to be bonded in the pellicle manufacturing apparatus of the present embodiment.
FIG. 1 is a schematic perspective view seen from a direction in which one end face in the thickness direction of a pellicle frame according to an example can be observed. FIG. 2 is a schematic perspective view seen from a direction in which the other end face in the thickness direction of the same pellicle frame can be observed. FIG.
FIG. 3 is a partial cross-sectional view of the pellicle frame according to the above example, and in detail, is a cross-sectional view taken along line AA of FIG.

As shown in FIGS. 1 and 2, the shape of the pellicle frame 100 according to this example is a rectangular frame shape. When the pellicle frame 100 is a member of the pellicle, the exposure light passes through the opening 50 surrounded by the pellicle frame 100.
The outer shape of the pellicle frame 100 is determined by one end surface 10 in the thickness direction of the pellicle frame 100, the other end surface 20, an outer peripheral surface 30 composed of four surfaces, and an inner peripheral surface 40 composed of four surfaces.
The shape viewed from the thickness direction of the pellicle frame 100 is a rectangular shape as described above, but the shape viewed from the thickness direction of the pellicle frame of the present embodiment is not limited to a rectangular shape, and is a shape other than a rectangular shape. (For example, a trapezoidal shape, a shape having a protrusion on the outer side of the frame, etc.) may be used.

As shown in FIGS. 1 and 3, the one end face 10 is provided with a groove 12.
In this embodiment, the shape of the groove 12 viewed from the thickness direction of the pellicle frame 100 is an endless shape that goes around the shape of the pellicle frame 100.
A modification of the shape of the groove viewed from the thickness direction of the pellicle frame will be described later.

The pellicle frame 100 has a through hole 14A and a through hole 14B.
The through hole 14A and the through hole 14B penetrate between the bottom surface of the groove 12 and the outer peripheral surface 30, respectively.

Here, each of the through holes 14 </ b> A and 14 </ b> B may penetrate between the side surface of the groove 12 and the outer peripheral surface 30.
Further, either one of the through holes 14A and 14B may be omitted. That is, in the pellicle frame 100, two through holes (through holes 14A and 14B) are connected to one groove (groove 12), but this embodiment is not limited to this mode. In the present embodiment, it is only necessary that at least one through hole is connected to one groove (groove 12, groove 22).

Further, as shown in FIGS. 2 and 3, a groove 22 is provided on the other end surface 20 opposite to the one end surface 10.
In this embodiment, the shape of the groove 22 is also an endless shape that goes around the shape of the pellicle frame 100 when viewed from the thickness direction, similarly to the shape of the groove 12.

The pellicle frame 100 has a through hole 24A and a through hole 24B.
The through hole 24 </ b> A and the through hole 24 </ b> B penetrate between the bottom surface of the groove 22 and the outer peripheral surface 30.
The variations of the through holes 24A and 24B are the same as the variations of the through holes 14A and 14B.

The pellicle frame 100 described above is suitable for use in manufacturing a pellicle by supporting a pellicle film on the one end face 10 side or the other end face 20 side.
For example, the case where the pellicle film is supported on the side of the one end surface 10 will be described. Through holes 14A and 14B are provided. For this reason, when the pellicle film is fixed to the one end face 10 side, the inside of the groove 12 is exhausted (for example, by an exhausting means such as a vacuum pump) through the through holes 14A and 14B. The pressure between can be reduced. By this pressure reduction, a pressing force can be exerted between the pellicle frame 100 and the pellicle film, so that both can be bonded together without contacting the film surface of the pellicle film as much as possible.
The same effect can be obtained when the pellicle film is supported on the other end face 20 side.

  Since the pellicle frame 100 is a member that supports the pellicle film on one end face side, the groove may be provided only on the end face facing the pellicle film. That is, any one of the combination of the groove 12, the through hole 14A, and the through hole 14B and the combination of the groove 22, the through hole 24A, and the through hole 24B may be omitted.

Since the pellicle frame 100 has grooves (grooves 12 and 22) on both the one end face 10 and the other end face 20, there is an advantage that the selection range of the end faces that support the pellicle film is wide.
Further, since the pellicle frame 100 has grooves (grooves 12 and 22) on both the one end face 10 and the other end face 20, a pellicle film is disposed on the one end face 10 side (or the other end face 20 side). There is also an advantage that it is suitable for producing an exposure original plate with a pellicle, in which the original plate (mask) is arranged on the other end surface 20 side (or one end surface 10 side). In this case, the pellicle frame 100 and the pellicle film can be bonded to each other without contacting the film surface of the pellicle film by the above-described exhaust (reduced pressure) of the groove through the through hole, and the film surface of the pellicle film is contacted as much as possible. The pellicle frame 100 and the original plate can be bonded together without doing so.

  Hereinafter, for the sake of convenience, the case where the pellicle film is supported on the one end face 10 side of the pellicle frame 100 will be mainly described. However, the pellicle film may be supported on the other end face 20 side of the pellicle frame 100. is there.

The dimension of the pellicle frame 100 can be set to the following dimensions, for example.
The length L1 in the long side direction of the pellicle frame 100 can be set to, for example, 135 mm to 153 mm, preferably 140 mm to 152 mm, and more preferably 145 mm to 151 mm.
The length L2 of the pellicle frame 100 in the short side direction can be set to, for example, 100 mm to 130 mm, preferably 105 mm to 125 mm, and more preferably 110 mm to 120 mm.
The length L1 in the long side direction and the length L2 in the short side direction may be the same dimension. That is, the shape of the pellicle frame 100 may be a square shape.
The frame width (frame width) W of the pellicle frame 100 can be, for example, 1.0 mm to 5.0 mm, preferably 1.2 mm to 3.5 mm, and more preferably 1.5 mm to 2.5 mm. The frame width may be the same or different for the four sides of the rectangular pellicle frame 100.
Moreover, the length of the long side direction of the opening part 50 (through-hole) enclosed by the pellicle frame 100 can be 130 mm-152 mm, for example, 135 mm-151 mm are preferable, and 140 mm-150 mm are more preferable.
Moreover, the width | variety of the opening part 50 can be 95 mm-130 mm, for example, 100 mm-125 mm are preferable, and 105 mm-120 mm are more preferable.
The thickness t of the pellicle frame can be, for example, 0.5 mm to 5.0 mm, preferably 0.5 mm to 3.0 mm, and more preferably 0.5 mm to 2.0 mm.

The width of the groove 12 and the groove 22 can be appropriately set in consideration of the pressure loss reduction in the groove, the relationship with the frame width of the pellicle frame, etc., but can be set to, for example, 10 μm to 1.0 mm, 50 μm ˜700 μm is preferable, 100 μm to 600 μm is more preferable, and 200 μm to 500 μm is particularly preferable.
Further, the depth of the groove 12 and the groove 22 can be appropriately set in consideration of the pressure loss reduction in the groove, the relationship with the thickness of the pellicle frame, etc., but can be set to 10 μm to 1.0 mm, for example, 50 μm ˜700 μm is preferable, 100 μm to 600 μm is more preferable, and 200 μm to 500 μm is particularly preferable.

The widths of the through holes 14A, 14B, 24A, and 24B can be appropriately set in consideration of the pressure loss reduction in the through holes, the relationship with the thickness of the pellicle frame, and the like, for example, 10 μm to 1.0 mm. 50 μm to 700 μm are preferable, 100 μm to 600 μm are more preferable, and 200 μm to 500 μm are particularly preferable.
In addition, the lengths of the through holes 14A, 14B, 24A, and 24B can be appropriately set in consideration of pressure loss reduction in the through holes, etc., but can be set to 0.5 mm to 10 mm, for example, 0.7 mm ˜5.0 mm is preferable, and 1.0 mm to 2.0 mm is more preferable.
Here, the width of the through hole refers to the flow path width of the flow path formed of the through hole (or the diameter when the cross section of the through hole is circular), and the length of the through hole refers to the flow of the through hole. Refers to the length of the channel.

The material of the pellicle frame 100 is not particularly limited, and can be a normal material used for the pellicle frame.
Specific examples of the material of the pellicle frame 100 include aluminum, aluminum alloys (5000 series, 6000 series, 7000 series, etc.), stainless steel, silicon, silicon alloys, iron, iron alloys, carbon steel, tool steel, ceramics, and metal. -Ceramic composite materials, resins and the like. Among these, aluminum and aluminum alloys are more preferable from the viewpoint of light weight and rigidity.

The pellicle frame 100 may have a protective film on the surface thereof.
As the protective film, a protective film having resistance to hydrogen radicals and EUV light present in the exposure atmosphere is preferable.
An example of the protective film is an oxide film.
The oxide film can be formed by a known method such as anodic oxidation.
The oxide film may be colored with a black dye. When the pellicle frame 100 has an oxide film colored with a black dye, the detection of foreign matter on the pellicle frame 100 becomes easier.
In addition, for other configurations of the pellicle frame 100, for example, configurations of known pellicle frames such as JP2014-021217A and JP2010-146027A can be referred to as appropriate.

Next, a modified example of the pellicle frame will be described.
In the pellicle frame 100 shown in FIGS. 1 to 3, one groove is provided for one end face. However, in the present embodiment, two or more grooves may be provided for one end face. When two or more grooves are provided for one end face, the through hole is preferably connected to each of the two or more grooves (see, for example, FIG. 4).
Further, when the pellicle frame has a rectangular shape, it is preferable that grooves be present on the four sides of the pellicle frame from the viewpoint of more effectively exerting a pressing force between the pellicle frame and another member.
Here, in the aspect that “grooves exist on the four sides of the pellicle frame”, for example,
A mode in which one groove is provided over the four sides of the pellicle frame (for example, see FIGS. 1 and 2),
A mode in which one or more grooves are provided for each of the four sides of the pellicle frame (for example, see FIG. 4),
A mode in which one groove extending over two sides of the pellicle frame is provided and one groove extending over the remaining two sides is provided,
Etc. are included.

FIG. 4 is a schematic perspective view of a pellicle frame 101 according to a modification of the present embodiment as seen from a direction in which one end face in the thickness direction can be observed.
As shown in FIG. 4, the end surface 10 of the pellicle frame 101 is provided with four grooves, that is, grooves 12A, 12B, 12C, and 12D. The pellicle frame 101 is provided with through holes 16A, 16B, 16C, and 16D penetrating between the bottom surfaces of the grooves 12A, 12B, 12C, and 12D and the outer peripheral surface 30, respectively.
In the pellicle frame 101, each groove has a shape that extends over two sides centering on a corner portion of the pellicle frame 101 and has an end part in the middle of the two sides. However, the shape of the groove of this embodiment may be any.
In the pellicle frame 101, a through hole is connected to one end of each groove. However, in this embodiment, the position of the through hole connected to the groove may be any part. In short, the through hole only needs to penetrate between the wall surface of the groove and the outer peripheral surface of the pellicle frame.

Although not shown in FIG. 4, a groove is provided on the other end surface of the pellicle frame 101 in the same manner as the other end surface 20 of the pellicle frame 100, and the wall surface and outer peripheral surface of the groove on the other end surface side are further provided. And a through hole is provided. However, the shape of the groove on the other end surface side of the pellicle frame 101 may be the same shape as the shape of the groove on the one end surface side of the pellicle frame 101.
In the pellicle frame 101, configurations other than those described above are the same as the configuration of the pellicle frame 100, and a preferable range is also the same.

(Specific examples of pellicle frame members)
FIG. 5 is a schematic cross-sectional view showing an example of a pellicle frame member that is one of objects to be bonded in the pellicle manufacturing apparatus of the present embodiment.
As shown in FIG. 5, a pellicle frame member 110 that is an example of a pellicle frame member includes a pellicle frame 100 described above, an adhesive layer 102 that contacts one end surface 10 of the pellicle frame 100, and the other end surface of the pellicle frame 100. 20 and an adhesive layer 104 in contact with the adhesive layer 104 and a release liner 106 in contact with the adhesive layer 104.

  In the pellicle frame member 110, the adhesive layer 102 is provided in a portion other than the groove 12 in the one end surface 10 of the pellicle frame 100. Thereby, the exhaust of the groove 12 through the through holes 14A and 14B can be efficiently performed.

The adhesive layer 102 is a layer for bonding the pellicle film member and the pellicle frame 100 and includes an adhesive.
In this embodiment, “adhesive” refers to an adhesive in a broad sense, and the concept of “adhesive” includes an adhesive.
As an adhesive contained in the adhesive layer 102, an acrylic resin adhesive, an epoxy resin adhesive, a polyimide resin adhesive, a silicone resin adhesive, an inorganic adhesive, a double-sided adhesive tape, a silicone resin adhesive, an acrylic adhesive And polyolefin pressure-sensitive adhesives.
Among these, acrylic resin adhesives, epoxy resin adhesives, polyimide resin adhesives, silicone resin adhesives, and inorganic adhesives are preferable.
Although there is no restriction | limiting in particular in the thickness of the adhesive bond layer 102, 1 micrometer-500 micrometers are preferable, 10 micrometers-400 micrometers are more preferable, and 20 micrometers-300 micrometers are especially preferable.

  The adhesive layer 102 may be formed before being carried into the pellicle manufacturing apparatus of the present embodiment, or may be formed in the pellicle manufacturing apparatus of the present embodiment (for example, an adhesive layer forming unit). It may be a thing.

The adhesive layer 104 is used for bonding the pellicle frame 100 and the original plate (mask) after manufacturing the pellicle (that is, bonding the pellicle frame member 110 and the pellicle film member) by the pellicle manufacturing apparatus of the present embodiment. Layer, which includes an adhesive.
Examples of the adhesive contained in the adhesive layer 104 include the same adhesives as those contained in the adhesive layer 102. Among them, double-sided pressure-sensitive adhesive tapes, silicone resin pressure-sensitive adhesives, acrylic pressure-sensitive adhesives, and polyolefin-based pressure-sensitive adhesives. Is preferred.
Although there is no restriction | limiting in particular in the thickness of the adhesive bond layer 104, 1 micrometer-500 micrometers are preferable, 10 micrometers-400 micrometers are more preferable, and 20 micrometers-300 micrometers are especially preferable.

  The release liner 106 is formed by the adhesive layer 104 before the manufacture of the pellicle by the pellicle manufacturing apparatus of the present embodiment, during the manufacture of the pellicle, and after the manufacture of the pellicle and before the pellicle and the original plate are bonded together. This is a member for preventing stickiness and adhesion of foreign matter to the adhesive layer 104. In addition, the release liner 106 has a meaning that it is a member that has little influence even if it is contacted by an apparatus, a jig, a hand, or the like among the members of the pellicle frame member 110.

The release liner is a member also called a release film or a separator.
As the release liner, a known one such as a PET (polyethylene terephthalate) film having a release layer such as a silicone compound can be used without particular limitation.
In the pellicle frame member 110, the shape of the release liner 106 viewed from the thickness direction is a shape extending over the pellicle frame 100 and the opening 50 (an opening surrounded by the pellicle frame 100), that is, a flat plate shape having no opening. ing. However, the release liner 106 may have any shape. The release liner may be a frame-shaped member (a member having an opening) that contacts only the surface of the adhesive layer 104. Further, the release liner may be a member larger than the pellicle frame 100, for example, a member having a size that protrudes outside the pellicle frame 100 when viewed from the thickness direction of the pellicle frame 100. .

  Although there is no restriction | limiting in particular in the thickness of the release liner 106, 5 micrometers-500 micrometers are preferable, 10 micrometers-400 micrometers are more preferable, and 20 micrometers-300 micrometers are especially preferable.

  An alignment mark for improving alignment (positioning) accuracy with the pellicle film member may be formed on the constituent member of the pellicle frame member 110 (preferably the pellicle frame 100).

(Specific examples of pellicle membrane members)
FIG. 6 is a schematic plan view showing an example of a pellicle film member that is one of objects to be bonded in the pellicle manufacturing apparatus of the present embodiment.
7 is a cross-sectional view taken along line BB in FIG. However, in FIG. 7, the ratio of the size of the outer portion 124 to the overall size of the pellicle film member is smaller than that in FIG. 6 (the same is shown in FIGS. 9, 12, and 13. ing).

As shown in FIGS. 6 and 7, the pellicle film member 120 according to this example includes a pellicle film 130 and a support substrate 126 that supports the pellicle film 130.
FIG. 6 is a schematic plan view of the pellicle film member 120 as seen from the direction in which the support substrate 126 can be observed.

The support substrate 126 is a circular substrate typified by a silicon wafer, and has a rectangular opening 127 at the center thereof.
The support substrate 126 supports the pellicle film 130 at a portion other than the opening 127. In other words, in FIG. 6, the pellicle film 130 is exposed at the opening 127 of the support substrate 126.
In the pellicle film member 120, the shape and size of the opening 127 of the support substrate 126 are substantially the same as the shape and size of the opening 50 surrounded by the pellicle frame 100 described above. Thus, when the pellicle is manufactured by bonding the pellicle film member 120 and the above-described pellicle frame member 110, the pellicle film member 120 and the pellicle frame member 110 can be bonded so that the opening 127 and the opening 50 overlap (for example, FIG. And FIG. 9). When the manufactured pellicle is attached to the original plate and attached to the exposure apparatus, the exposure light passes through the region where the opening 127 and the opening 50 overlap.
However, the size of the opening 127 and the size of the opening 50 do not have to be completely the same. For example, the size of the opening 127 may be smaller than the size of the opening 50, The size may be larger than the size of the opening 50. However, it is preferable to suppress the difference in length of one side of the opening within 2 mm (preferably within 1 mm).

Further, the support substrate 126 has a cut portion 128 for cutting (cutting) in accordance with the outer peripheral shape of the pellicle frame member 110 before or after the pellicle film member 120 and the pellicle frame member 110 are bonded. Is provided.
In the support substrate 126, the inner portion 122 that is an area inside the notch 128 is a portion remaining in the final pellicle. The inner portion 122 is a frame-shaped member similar to the pellicle frame when viewed as a single member. In the support substrate 126, the outer portion 124, which is an area outside the notch 128, is a portion that does not remain on the final pellicle (ie, an unnecessary portion).
The shape and size of the outer periphery of the inner portion 122 are substantially the same as the shape and size of the outer periphery of the pellicle frame 100, respectively.
Although it is not necessary for both sizes to be completely the same, it is preferable to suppress the difference in length of one side of the outer periphery to within 2 mm (preferably within 1 mm).

  Examples of the material of the support substrate 126 include aluminum, aluminum alloys (5000 series, 6000 series, 7000 series, etc.), stainless steel, silicon, silicon alloys, iron, iron alloys, carbon steel, tool steel, ceramics, and metal-ceramic composites. Examples thereof include materials and resins. Of these, silicon and silicon alloys are preferable.

The shape of the support substrate 126 is not necessarily limited to a circular shape, and may be other shapes such as a rectangular shape and an elliptical shape.
Further, the support substrate 126 may be provided with a notch such as a notch or an orientation flat.

  The thickness of the support substrate 126 can be set to, for example, 0.03 to 5.0 mm, preferably 0.05 to 3.0 mm, more preferably 0.15 to 2.0 mm, and 0.3 mm to 1.0 mm. Is particularly preferred.

The material of the pellicle film 130 is not particularly limited, and may be an organic material, an inorganic material, or a mixed material of an organic material and an inorganic material.
Examples of the organic material include a fluorine-based polymer.
Examples of the inorganic material include crystalline silicon (eg, single crystal silicon, polycrystalline silicon, etc.), diamond-like carbon (DLC), graphite, amorphous carbon, graphene, silicon carbide, silicon nitride, aluminum nitride, and the like.
The pellicle film 130 may contain one of the above materials alone or two or more of them.

Further, the configuration of the pellicle film 130 may be a single layer configuration or a configuration composed of two or more layers.
The thickness of the pellicle film (total thickness in the case of two or more layers) can be, for example, 10 nm to 200 nm, preferably 10 nm to 100 nm, more preferably 10 nm to 70 nm, and particularly preferably 10 to 50 nm.

As described above, in the pellicle film member 120, the pellicle film 130 is supported by the support substrate 126.
Even if the pellicle film member of this aspect is a film in which the pellicle film is difficult to stand on its own (for example, a pellicle film containing an inorganic material such as a silicon crystal film, a thin pellicle film, etc.), This has the advantage that the pellicle can be manufactured while maintaining the film shape of the pellicle film.

For example, the pellicle film member 120 first has a silicon crystal film as the pellicle film 130 on a silicon wafer (for example, an 8-inch silicon wafer) as a material of the support substrate 126 (support substrate before the opening 127 is provided). Then, from the silicon crystal film non-formation surface side of this silicon wafer, the central portion of the silicon wafer is etched to remove the central silicon wafer to form the opening 127.
As the pellicle film 130, in addition to the silicon crystal film, other films such as a laminated film having a structure of silicon nitride film / silicon crystal film / silicon nitride film can also be used. Further, as the support substrate 126, a substrate other than the silicon wafer can be used.
Even when other materials (film, substrate) are used, the pellicle film member can be produced by the same method as described above.

  An alignment mark for improving alignment (positioning) accuracy with the pellicle frame member may be formed on the constituent member (preferably the support substrate 126) of the pellicle film member 120.

(Specific example of pellicle)
FIG. 8 is a schematic cross-sectional view showing an example of a pellicle manufactured by the pellicle manufacturing apparatus of the present embodiment.
As shown in FIG. 8, the pellicle 200 is formed by bonding the pellicle frame member 110 described above, and the pellicle film member 140 including the pellicle film 130 and the inner portion 122 of the support substrate. Specifically, in the pellicle 200, the pellicle frame member 110 and the pellicle film member 140 are bonded together so that the inner portion 122 of the pellicle film member 140 and the adhesive layer 102 of the pellicle frame member 110 are in contact with each other. .
Here, the pellicle film member 140 cuts the above-described pellicle film member 120 at the position of the cut portion 128, thereby causing the pellicle film member 120 to contact the outer portion 124 and the outer portion 124 (hereinafter referred to as “the pellicle film”). It is obtained by removing the “outer part 124”.
The cut of the pellicle film member 120 (removal of the outer portion 124 and the like) may be performed before or after the pellicle film member and the pellicle frame member are bonded.

In the pellicle 200, the preferable range of the thickness of each member is as described above.
The thickness of each member is preferably adjusted so that the total thickness of the pellicle 200 is 5.0 mm or less (more preferably 3.0 μm or less, more preferably 2.0 mm or less).

(Specific example of the bonding unit)
9 to 11 are schematic configuration diagrams illustrating an example of a bonding unit in the pellicle manufacturing apparatus according to the present embodiment. The bonding unit is a unit that functions as a pellicle manufacturing apparatus as a single unit.
FIG. 9 is a schematic cross-sectional view focusing on how the pellicle frame member including the pellicle frame and the pellicle film member including the pellicle film are bonded in the bonding chamber of the bonding unit. In FIG. 9, the detailed configuration in the bonding chamber is not shown.
FIGS. 10 and 11 are schematic cross-sectional views focusing on the detailed configuration in the bonding chamber and the state in which the pellicle film member is carried into the bonding chamber. 10 and 11, the detailed configurations of the pellicle frame member and the pellicle film member are not shown.

As shown in FIG. 9, the pellicle film member 120 and the pellicle frame member 110 are disposed in the bonding chamber 310 of the bonding unit 300. Both are arranged such that the inner portion 122 of the support substrate of the pellicle film member 120 and the adhesive layer 102 of the pellicle frame member 110 face each other. A groove 12 is provided on the end face (one end face 10) of the pellicle frame 100 on the side facing the pellicle film member 120. The adhesive layer 102 is provided in a portion other than the groove 12 on the one end face 10 of the pellicle frame 100.
In the bonding chamber 310, the exhaust pipe (not shown in FIG. 9; exhaust pipes 312A and 312B in FIGS. 10 and 11) exhausts (reduces pressure) inside the groove 12 through the through hole 14B (arrow E2). And exhaust (pressure reduction) inside the groove 12 is performed through the through hole 14A (arrow E1). By these exhausts (decompression), an attractive force F (that is, a pressing force) attracting between the pellicle film member 120 and the pellicle frame member 110 can be exerted. By the action of this force F, the two can be bonded together without contacting the pellicle film 130 as much as possible.
At this time, it is preferable to pressurize the inside of the bonding chamber 310 by introducing a gas into the bonding chamber 310 using an introduction pipe (not shown). Thereby, the difference (differential pressure) between the pressure of the atmosphere in the entire bonding chamber 310 in which the pellicle frame member and the pellicle film member are arranged and the pressure in the groove 12 can be further increased. The force F can be worked more effectively.

The force F (force applied to the entire pellicle frame) is preferably 1N or more, and more preferably 2N or more.
The force F (force applied to the entire pellicle frame) is more preferably 10N or more, and particularly preferably 20N or more.
The upper limit of the force F (force applied to the entire pellicle frame) is not particularly limited, but is, for example, 500 N, preferably 400 N from the viewpoint of productivity.

Next, the configuration of the bonding unit 300 will be described with reference to FIGS.
FIG. 10 shows a state after the pellicle frame member 110 is loaded into the bonding chamber 310 of the bonding unit 300 and before the pellicle film member 120 is loaded into the bonding chamber 310.

  As shown in FIGS. 10 and 11, the bonding unit 300 includes a bonding chamber 310, a first introduction pipe 322 for introducing a gas into the bonding chamber 310 and pressurizing the bonding chamber 310, and a first 2 and an exhaust pipe 312A and 312B for exhausting the inside of the groove through the through-hole of the pellicle frame 100 of the pellicle frame member 110.

Here, when the pellicle film member 120 and the pellicle frame member 110 are disposed in the bonding chamber 310, the first introduction tube 322 is formed from the side facing the pellicle film member 120 (in this example, the upper surface of the bonding chamber 310). From) is arranged at a position where gas can be introduced. The bonding unit 300 may include a plurality of first introduction pipes 322.
On the other hand, when the pellicle film member 120 and the pellicle frame member 110 are disposed in the bonding chamber 310, the second introduction pipe 326 can introduce gas from the side surface of the bonding chamber 310 below the pellicle frame member 110. Placed in position. The second introduction pipe 326 is not limited to this position, and can be provided at any position where gas can be introduced into the bonding chamber 310. Further, the bonding unit 300 may include a plurality of second introduction pipes 326.

The other ends of the first introduction pipe 322 and the second introduction pipe 326 can be connected to gas supply means such as a cylinder (via other pipes if necessary).
In addition, a valve (not shown) for switching whether to introduce gas may be provided in the middle of the first introduction pipe 322 and the second introduction pipe 326. This valve may be an adjusting valve provided with a mechanism for adjusting the gas flow rate or the like.
The gas supplied through the first introduction pipe 322 and the second introduction pipe 326 is not particularly limited. For example, dry air, inert gas, or the like can be used.

  Each of the exhaust pipes 312A and 312B can be connected to the through-hole of the pellicle frame of the pellicle frame member 110 via a communication member connected to one end.

FIG. 12 is a partial cross-sectional view conceptually showing a state in which the exhaust pipe 312B, which is one of the exhaust pipes in FIGS. 10 and 11, is connected to the through-hole of the pellicle frame.
As shown in FIG. 12, a communication member 314 that connects the through hole 14B of the pellicle frame 100 and the exhaust pipe 312B is connected to one end of the exhaust pipe 312B. When the bonding unit 300 includes the communication member 314, the exhaust efficiency is further improved when the inside of the groove 12 through the through hole 14B is exhausted. The communication member 314 is not necessarily a member independent of the exhaust pipe 312B. That is, the exhaust pipe 312B and the communication member 314 may be a single member that is integrally formed.

  The shape of the communication member 314 has an open end that comes into contact with the outer peripheral surface of the pellicle frame 100, and the diameter of the open end is larger than the diameter of the through hole. Since the shape of the communication member 314 is such a shape, the opening end of the communication member 314 and the through hole 14B can be easily aligned. More specifically, the shape of the communication member 314 is a tapered shape whose diameter increases as the distance from one end of the exhaust pipe 312B increases.

Further, the communication member 314 is provided so as to be movable in the direction in which the outer peripheral surface of the pellicle frame 100 is pushed in (direction of arrow J2). Thereby, the communication member 314 and the pellicle frame 100 can be more securely connected. Further, even if the pellicle frame 100 is distorted and deformed in the exhaust direction (the direction of the arrow E2) by exhausting the inside of the groove 12 through the through-hole 14B of the pellicle frame 100, the pellicle frame 100 is previously formed by the communication member 314. The distortion deformation of the pellicle frame 100 can be corrected by pushing the outer peripheral surface of the pellicle frame.
As a matter of course, the communication member 314 is also movable in the direction opposite to the arrow J2 (in the returning direction).

FIG. 13 is a partial cross-sectional view conceptually showing a state in which one of the exhaust pipes is connected to the through-hole of the pellicle frame in the modification of the present embodiment, and corresponds to the partial cross-sectional view of FIG. 12 in the above example. FIG.
As shown in FIG. 13, the through holes 114 </ b> B and 124 </ b> B of the pellicle frame 103 according to the modification have a tapered shape whose diameter increases toward the outer peripheral surface of the pellicle frame 103. The communication member 316 according to the modification has a tapered shape that can be inserted into a tapered portion of the through hole 114B.
According to this modification, the exhaust pipe 312B and the through hole 114B can be more firmly connected by inserting the communication member 316 into the tapered portion of the through hole 114B (see arrow J12).
In the above modification, points other than those described above are the same as those in the above example, and preferred embodiments are also the same.
In addition, even if it is a case where a communicating member and a through-hole are shapes other than a taper shape, if it is a structure which can insert a communicating member in a through-hole, the effect similar to the said modification will be show | played. For example, even when the communication member is a cylindrical member and the through hole is a columnar space, the communication member is inserted into the through hole by making the diameter of the communication member smaller than the diameter of the through hole. can do.

  In the present embodiment, the communication member may be omitted. In short, in this embodiment, what is necessary is just to become the structure which can connect an exhaust pipe and a through-hole.

Next, returning to FIGS. 10 and 11, the other ends (not shown) of the exhaust pipes 312 </ b> A and 312 </ b> B are disposed outside the bonding chamber 310. Each of these other ends can be connected to an evacuation means such as a vacuum pump (via other piping if necessary).
A valve (not shown) for switching whether or not to exhaust the groove 12 may be provided in the middle of the exhaust pipes 312A and 312B. This valve may be an adjusting valve provided with a mechanism for adjusting the gas flow rate or the like.

  In the bonding unit 300, two exhaust pipes are provided in accordance with the number (two) of through holes connected to the grooves 12 of the pellicle frame 100. However, the number of exhaust pipes in this embodiment is two. Needless to say, it is not limited to. The number of exhaust pipes is not particularly limited, but it is preferable to match the number of exhaust pipe end portions with the number of through holes. A branched exhaust pipe may be used as the exhaust pipe. In short, in this embodiment, each end of the exhaust pipe can be connected to each through-hole connected to the groove provided on the end surface of the pellicle frame facing the pellicle film member. It is preferable.

As shown in FIGS. 10 and 11, a mounting plate 330 for mounting the pellicle frame member 110 is further provided in the bonding chamber 310. The mounting board 330 is provided with a suction mechanism (for example, a plurality of suction holes; the same applies hereinafter) for sucking the pellicle frame member 110.
In the bonding chamber 310, an elevating pin 332 that can be moved up and down with respect to the mounting board 330 is further provided. The elevating pins 332 receive the pellicle frame member 110 carried into the bonding chamber 310 and then lower the pin pin 332 to place the pellicle frame member 110 on the placement board 330, and on the placement board 330. The pellicle frame member 110 placed on the board is lifted away from the placement board 330.
In the bonding chamber 310, a lifting pin for the pellicle frame member 110 and a lifting pin for the pellicle film member 120 may be provided separately, or the pellicle frame member 110 and the pellicle film member 120 are provided. A lifting pin may also be provided.

The mounting board 330 may be provided so as to be movable in the horizontal direction (more specifically, the X direction and the Y direction orthogonal to each other, and the θ direction that is the rotation direction), and thereby the pellicle frame member 110. And the pellicle film member 120 may be adjusted.
That is, the mounting board 330 when it is provided so as to be movable in the horizontal direction functions as an alignment means.

A plurality of sensors 340 are further provided in the bonding chamber 310.
The sensor 340 is a member for reading the position of the pellicle film member 120 in the bonding chamber 310. The sensor 340 reads, for example, the position of the cut portion 128 and the position of the alignment mark that may be provided on the support substrate 126 of the pellicle film member 120.
The plurality of sensors 340 are provided so as to be movable in accordance with the position of the object to be read (the cut portion 128 and the alignment mark).
Reading by the sensor 340 may be performed by image recognition.
A fiber sensor is preferably used as the sensor 340.

  For the alignment mechanism in the bonding unit (movement of the mounting board, reading of the position by the center, etc.), a known alignment mechanism of a known apparatus such as an exposure apparatus (for example, a stepper) or a chip mounter apparatus is applied. You can also.

A gas dispersion member 324 for dispersing the gas introduced from the first introduction pipe 322 is further provided in the bonding chamber 310. The gas dispersion member 324 is a cover-shaped member that covers the end portion (gas introduction port) of the first introduction pipe 322 and a part of the inner wall surface above the bonding chamber 310. A plurality of holes (not shown) are provided on the side of the gas dispersion member 324 facing the pellicle film member 120. The gas introduced from the first introduction pipe 322 first reaches the space formed by the inner wall surface above the bonding chamber 310 and the gas dispersion member 324, and is then dispersed by the plurality of holes.
Thereby, the influence on the pellicle film due to the gas flow from the first introduction pipe 322 is reduced. From the viewpoint of further reducing the influence of the gas flow on the pellicle film, it is preferable that the plurality of holes be provided in such a manner that the central portion of the pellicle film 130 is not exposed to gas.

The bonding chamber 310 is provided with a member entrance 350.
Each member is carried into and out of the bonding chamber 310 through the member inlet / outlet 350. Specifically, the pellicle film member 120 before bonding and the pellicle frame member 110 before bonding are respectively carried into the bonding chamber 310 through the member entrance 350. Further, the pellicle film member 120 and the pellicle frame member 110 after bonding are carried out of the bonding chamber 310 through the member entrance 350.
Further, the bonding unit 300 is provided with a shutter 352 for opening (see FIG. 11) and closing (see FIG. 10) the member doorway 350.

As shown in FIGS. 10 and 11, the pellicle film member 120 held by a hand member 410 as a holding member is carried into the bonding chamber 310.
Although not shown, the pellicle frame member 110 is also held by a hand member (for example, a hand member 412 shown in FIG. .
The holding member that holds the pellicle frame member 110 and the holding member that holds the pellicle film member 120 may be the same member or different members.

FIG. 14 is a schematic plan view showing a state in which the hand member 410 in this example holds the pellicle film member 120.
As shown in FIG. 14, the hand member 410 is held so as to contact only the outer portion 124 (that is, the unnecessary region) of the support substrate in the pellicle film member 120 in a plan view as viewed from the thickness direction of the member. By using such a hand member 410, when the pellicle film member 120 is loaded into the bonding chamber 310, it can be loaded without contacting the pellicle film 130.
The hand member may contact the inner portion 122 of the support substrate in the pellicle film member 120. For example, as a hand member that holds the pellicle film member 120, a hand member 412 (a hand member that holds the pellicle frame member 110) described later may be used instead of the hand member 410 in this example. That is, the pellicle film member 120 and the pellicle frame member 110 may be held by the same hand member 412.

FIG. 15 is a schematic plan view showing the pellicle frame member 110 and the hand member 412 that holds the pellicle frame member 110 in this example.
As shown in FIG. 15, the hand member 412 holds a region overlapping a part of the pellicle frame 100 in a plan view as viewed from the thickness direction of the member. This hand member 412 is in contact only with the release liner 106 of the pellicle frame member 110.

  The hand member 410 and the hand member 412 described above may be provided in separate transfer means (for example, a transfer robot), but from the viewpoint of reducing the installation area of the pellicle film manufacturing apparatus, they are provided in the same transfer means. Is preferred.

Next, with reference to FIGS. 16 to 19, an example of the flow of the bonding process by the bonding unit 300 (bonding chamber 310) described above is shown.
16 to 19, in order to make the flow of the bonding process easier to understand, a part of the configuration of the bonding unit 300 and a part of the configuration of the bonding chamber 310 are omitted.

  First, as shown in FIG. 16, the pellicle frame member 110 is carried into the bonding chamber 310. Next, the exhaust pipes 312A and 312B are connected to the through holes 14A and 14B of the pellicle frame 100 of the pellicle frame member 110, respectively (arrows J1 and J2).

Next, as shown in FIG. 17, the pellicle film member 120 is carried into the bonding chamber 310, and after adjusting the alignment (positioning) between the pellicle film member 120 and the pellicle frame member 110, the pellicle film member 120. Is lowered (arrow D1) and placed on the pellicle frame member 110. This placement is performed mainly using the lowering of the lifting pins and the weight of the pellicle film member 120.
In addition, apart from this example, the pellicle film member 120 may be placed on the pellicle frame member 110 by raising the pellicle frame member 110.

Next, as shown in FIG. 18, the inside of the groove 12 of the pellicle frame 100 of the pellicle frame member 110 is exhausted (depressurized) through the exhaust pipes 312A and 312B and the through hole of the pellicle frame member 110. This evacuation (decompression) is performed by an evacuation means (for example, a vacuum pump) connected to an end of each exhaust pipe outside the bonding chamber 310. As described above with reference to FIG. 9, this exhaust causes an attractive force F (that is, a pressing force) between the pellicle film member 120 and the pellicle frame member 110 to be bonded together. .
Thereby, the pellicle film member 120 and the pellicle frame member 110 can be bonded together without contacting the film surface of the pellicle film as much as possible.

Next, as shown in FIG. 19, a gas is introduced into the bonding chamber 310 through the first introduction pipe 322. The introduced gas is dispersed in the bonding chamber 310 by the gas dispersion member 324. At this time, the gas is preferably dispersed so that at least the central portion of the pellicle film member 120 (pellicle film 130) does not hit the gas (see arrow G1).
By introducing gas into the bonding chamber 310, the pressure in the bonding chamber 310 is increased, and the pressure of the atmosphere in the entire bonding chamber 310 in which the pellicle frame member and the pellicle film member are disposed, and the inside of the groove 12 are increased. The difference (pressure difference) from the pressure increases. Due to this differential pressure, the force F is increased, and the pellicle film member 120 and the pellicle frame member 110 are more strongly pressed against each other. In addition, although illustration is abbreviate | omitted in FIG. 19, in addition to gas introduction (pressurization) by the 1st introduction pipe | tube 322, gas introduction (pressurization) can also be performed by a 2nd introduction pipe | tube.

The degree of the pressurization and the depressurization is the pressing between the pellicle film member and the pellicle frame member caused by the difference (differential pressure) between the overall pressure in the bonding chamber 310 and the pressure in the groove. The force F (force applied to the entire pellicle frame) is adjusted so as to be within the above-described preferable range (for example, about 2N).
For example, the pressure in the bonding chamber 310 is adjusted to be, for example, about 0.15 MPa.

(Specific example of pellicle manufacturing equipment)
The pellicle manufacturing apparatus of the present embodiment may be an apparatus including only a bonding unit (for example, the bonding unit 300), or may be an apparatus including a bonding unit and another unit.
FIG. 20 is a schematic configuration diagram of a pellicle manufacturing apparatus including a bonding unit and another unit, which is an example of the pellicle manufacturing apparatus of the present embodiment.

  As shown in FIG. 20, the pellicle manufacturing apparatus 600 includes a transfer robot 400 as a transfer means, a pellicle film member loader 610, a pellicle frame member loader 620, the above-described bonding unit 300, the cut unit 500, and a cleaning unit. A unit 640, an inspection unit 650, and an unloader 630 are provided.

The transfer robot 400 is a transfer means for transferring a material (pellicle film member and pellicle frame member) and a product (pellicle) to each unit (including each loader and unloader; the same applies hereinafter).
Although not shown in detail, the transfer robot 400 includes a hand member 410 as a holding member that holds a pellicle film member, and a hand member 412 as a holding member that holds a pellicle frame member.
The hand member 410 and the hand member 412 are each connected to a robot arm. In the transfer robot 400, the pellicle film member and the pellicle frame member are held and can be carried into the bonding chamber 310 by the operation of the robot arm.
Note that the transfer robot 400 may include only one hand member, or may include two or more hand members.

  Needless to say, the pellicle film member loader 610 and the pellicle frame member loader 620 are units in which the pellicle film member 120 and the pellicle frame member 110 are set, respectively.

The bonding unit 300 is as described above.
The bonding unit 300 preferably includes first measurement means for measuring the shape of the pellicle frame of the pellicle frame member before being bonded to the pellicle film member.
Examples of the shape of the pellicle frame include the length L1 in the long side direction described above, the length L2 in the short side direction (see FIG. 1 above), and the orthogonality of the pellicle frame.
Further, as the first measuring means, the above-described sensor 340 having a function of measuring the shape of the pellicle frame can be cited. Further, a means for detecting contact with the pellicle frame may be provided in the bonding unit 300 as the first measuring means.

  Moreover, it is preferable that the bonding unit 300 includes an alignment unit that performs alignment (positioning) between the pellicle frame member and the pellicle film member before bonding the pellicle frame member and the pellicle film member. As described above, as the alignment means, there is a mounting board 330 provided so as to be movable in the horizontal direction (X direction, Y direction, and θ direction).

In the pellicle manufacturing apparatus 600, in addition to the movable mounting board 330, a robot arm of the transfer robot 400 having a horizontal position adjusting function can be used in combination as an alignment unit.
Further, in the pellicle manufacturing apparatus 600, the rough positioning of each member is provided on the hand member, and is provided on the mounting board 330; a guide member for determining the position of the pellicle film member and the pellicle frame member with respect to the hand member. The guide member for determining the position of the pellicle frame member with respect to the mounting board 330;
The guide member provided on the mounting board 330 is in contact with the outer peripheral surface of the pellicle frame of the pellicle frame member and does not come into contact with the release liner 106 in order to improve the positioning accuracy of the pellicle frame with respect to the mounting board 330. Is preferred.

The cut unit 500 is a unit for cutting the pellicle film member 120 at the cut portion 128 and removing the outer part 124 and the like (the pellicle film in contact with the outer part 124 and the outer part 124) that are unnecessary parts.
As described above, the pellicle manufacturing apparatus 600 includes the cut unit 500 as a unit different from the bonding unit 300, and as described above, adhesion of cut waste to each member due to gas convection at the time of bonding is suppressed. .
Further, as described above, the cut by the cut unit 500 may be performed before the pellicle film member and the pellicle frame member are bonded together, or may be performed after the bonding.
A specific example of the cut unit 500 will be described later.

The cleaning unit 640 is a unit that cleans the pellicle film member 120 after cutting and cleans and removes foreign matters such as cut waste.
When the cutting of the pellicle film member is performed before the bonding with the pellicle frame member, the cleaning unit 640 cleans the pellicle film member after the cutting before the bonding with the pellicle frame member. Further, in the case where the pellicle film member is cut after being bonded to the pellicle frame member, the cleaning unit 640 provides the pellicle film member after the cut with the pellicle frame member (that is, the pellicle film member). The pellicle film member) is cleaned.
As the configuration of the cleaning unit 640, for example, a configuration of a known cleaning device in the field of electronic devices such as a semiconductor device, a display device (a liquid crystal display device, an organic electroluminescence device (organic EL device), etc.), a printed wiring board, or the like is appropriately used. You can refer to it.

The inspection unit 650 is a unit that performs an appearance inspection of the pellicle frame member and the pellicle film member after bonding.
Appearance inspection includes detection of foreign matter adhering to at least one of the pellicle frame member and the pellicle film member, shape measurement of the pellicle frame member (pellicle frame), alignment measurement between the pellicle frame member and the pellicle film member, and the like. .
In particular, the inspection unit 650 preferably includes second measurement means for measuring the shape of the pellicle frame of the pellicle frame member after being bonded to the pellicle film member.
Examples of the second measuring means include the same examples as the first measuring means.

  The unloader 630 is a unit that accommodates the finally manufactured pellicle.

The pellicle manufacturing apparatus 600 further includes a control unit 660.
The control means 660 includes a measurement result of the shape of the pellicle frame before bonding (measurement result by the first measurement means), a measurement result of the shape of the pellicle frame after bonding (measurement result by the second measurement means), The control means performs feed-forward control (FF control) on alignment based on the alignment means.
However, the control means 660 may be omitted.

The pellicle manufacturing apparatus 600 further includes a calculation unit 670.
The calculation means 670 includes a measurement result of the shape of the pellicle frame before bonding (measurement result by the first measurement means), a measurement result of the shape of the pellicle frame after bonding (measurement result by the second measurement means), Is a calculation means for calculating the amount of distortion of the pellicle frame due to bonding in the bonding unit. The calculating means 670 further has a function of performing feedforward control (FF control) on the amount of pushing of the pellicle frame 100 by the communication member 314 based on the amount of distortion.
However, the calculation means 670 may be omitted.

The pellicle manufacturing apparatus 600 includes the above-described units, but units other than the bonding unit 300 may be omitted as appropriate.
That is, units other than the bonding unit 300 can be provided as an apparatus different from the pellicle manufacturing apparatus including the bonding unit 300.

Further, the pellicle manufacturing apparatus 600 may include other units other than the above-described units.
As other units, an adhesive layer forming unit that forms an adhesive layer 102 by applying an adhesive to the pellicle frame 100, and an adhesive layer formation that forms an adhesive layer 104 by applying an adhesive to the pellicle frame 100. Examples thereof include a unit and a release liner attaching unit for attaching the release liner 106 on the adhesive layer 104. In this case, the pellicle manufacturing apparatus 600 may include an inversion mechanism that inverts the one end surface 10 and the other end surface 20 of the pellicle frame 100.

(Specific example of cut unit)
Next, an example of the cut unit in the present embodiment will be described with reference to FIGS.
21 to 24 are schematic cross-sectional views of a cut unit 500 according to an example.
FIG. 21 to FIG. 24 show an example of the flow of the cutting process of the pellicle film member 120 in the cutting unit 500.

  As shown in FIG. 21, the cut unit 500 includes a cut chamber 510, a placement board 530 disposed in the center of the cut chamber 510, a push-up means 532 for pushing up the placement board 530, and the cut chamber 510. And a placement board 540 on which the outer portion 124 of the pellicle film member 120 is placed.

In the mounting board 530, when cutting is performed after the pellicle film member 120 and the pellicle frame member 110 are bonded together, the pellicle frame member 110 is cut before the pellicle film member 120 and the pellicle frame member 110 are bonded together. When performed, the inner portions 122 of the pellicle membrane member 120 are each mounted.
In either case, the outer portion 124 of the pellicle film member 120 is placed on the placement board 540.
In this example, the pellicle frame member 110 is mounted on the mounting board 530 when cutting is performed after the pellicle film member 120 and the pellicle frame member 110 are bonded together.

  The placement board 530 and the placement board 540 are each provided with a known suction mechanism for sucking and holding the object to be placed.

  The mounting board 530 can be moved in the vertical direction by the push-up operation and the return operation of the push-up means 532. The push-up means 532 has a push-up speed variable function.

  In addition, as a modified example of the mounting board 530, the mounting board 530 may be movable in a direction having an inclination with respect to the vertical direction. Further, the push-up direction may remain the vertical direction, and the pellicle film member 120 may be placed so as to be inclined with respect to the horizontal direction. Each of the modified examples is an example in which the inner portion 122 is pushed up at an angle having an inclination with respect to a direction perpendicular to the surface of the pellicle film member 120.

  With respect to the mounting board 530, the mounting board 540 is fixedly arranged in the cut chamber 510 (that is, not movable).

The cut unit 500 further includes an introduction pipe 522 for introducing gas into the cut chamber 510. That is, one end of the introduction pipe 522 is disposed in the cut chamber 510 and the other end is disposed outside the cut chamber 510.
In the cut chamber 510, a gas dispersion member 524 for dispersing the gas introduced from the introduction pipe 522 is further provided.
The gas dispersion member 524 is a cover-shaped member that covers an end portion (gas introduction port) of the introduction pipe 522 and a part of the inner wall surface above the cut chamber 510. A plurality of holes (not shown) are provided on the side of the gas dispersion member 524 facing the pellicle film member 120. The gas introduced from the introduction pipe 522 first reaches the space formed by the upper inner wall surface in the cut chamber 510 and the gas dispersion member 524, and then is dispersed by the plurality of holes. The dispersed gas flows downward in the vertical direction (the direction of the arrow G2 in FIGS. 23 and 24) or radially.
With these configurations, the sticking of cut waste generated at the time of cutting to the pellicle film 130 is suppressed. Moreover, the effect which removes the burr | flash produced at the time of cutting is also show | played.

The other ends of the introduction pipes 522 can be connected to gas supply means such as cylinders (via other pipes as necessary).
Further, a valve (not shown) for switching whether or not to introduce gas may be provided in the middle of the introduction pipe 522. This valve may be an adjusting valve provided with a mechanism for adjusting the gas flow rate or the like.
The gas supplied through the introduction pipe 522 is not particularly limited, and for example, dry air, inert gas, or the like can be used.

  The cut unit 500 further includes an exhaust pipe 512 for exhausting the inside of the cut chamber 510. The exhaust pipe 512 is branched into four, and the four branch ends exist in the cut chamber 510. Two of the four branch ends, which are located between the mounting board 530 and the mounting board 540, are connected to a member 514 having a groove having a V-shaped cross section. The member 514 is provided along the cut portion 128 of the pellicle film member 120. The inside of the groove of the member 514 communicates with the exhaust pipe 512. With these configurations, when the pellicle film member 120 is cut along the cut portion 128, the cut waste generated by the cut can be discharged out of the cut chamber 510 through the member 514 and the exhaust pipe 512. Yes. The groove shape of the member 514 is not limited to the V shape.

  An end (not shown) of the exhaust pipe 512 outside the cut chamber 510 can be connected to an exhaust means such as a vacuum pump (via another pipe if necessary).

The cut chamber 510 is provided with a member entrance / exit 550.
Through the member entrance / exit 550, the members (the pellicle film member 120 and the pellicle frame member 110 before and after cutting) are carried into and out of the cut chamber 510. Further, the cut unit 500 is provided with a shutter 552 for opening and closing the member doorway 550.

As shown in FIGS. 21 and 22, the pellicle film member 120 and the pellicle frame member 110 after being bonded, which are held by a hand member 410 as a holding member, are carried into the cut chamber 510. Specifically, the hand member 410 holds the pellicle film member 120 and the pellicle frame member 110 after bonding so as to contact only the outer portion 124 (that is, the unnecessary area) of the support substrate in the pellicle film member 120. .
FIG. 21 shows a state before the pellicle film member 120 and the pellicle frame member 110 after bonding are carried into the cut chamber 510, and FIG. 22 shows the pellicle after bonding into the cut chamber 510. The state after the film member 120 and the pellicle frame member 110 are carried in is shown.
As described above, the hand member 410 is a hand member that is also used to carry the pellicle film member 120 before bonding into the bonding chamber 310.
In this example, the hand member 410 is in contact with the outer portion 124 of the pellicle film member 120 of the pellicle film member 120 and the pellicle frame member 110 after bonding.

  Although not shown, the pellicle film member 120 and the pellicle frame member 110 (that is, the pellicle) after cutting can be carried out of the cut chamber 510 while holding the pellicle frame member 110 by the hand member 412 described above. it can.

  As a modification, the above-described hand member 412 may be used even when the pellicle film member 120 and the pellicle frame member 110 are carried into the cut chamber 510. In this case, the pellicle frame member 110 is supported by the hand member 412.

  The pasted pellicle film member 120 and pellicle frame member 110 carried into the cut chamber 510 are placed on the placement board 530 and the placement board 540 as shown in FIG. At this time, the release liner 106 is attracted to the placement board 530 by the adsorption mechanism of the placement board 530 so that the release liner 106 of the pellicle frame member 110 contacts the placement board 530. Then, the outer portion 124 of the support substrate of the pellicle film member 120 is in contact with the mounting board 540, and the outer portion 124 is sucked to the mounting board 540 by the suction mechanism of the mounting board 540. Further, the gas is introduced into the cut chamber 510 through the introduction pipe 522 and the gas dispersion member 524. In this example, in the cut chamber 510, the gas flows downward in the extension direction (the direction of the arrow G2).

Next, as shown in FIG. 24, the placing board 530 is pushed up in the vertical direction (direction of the arrow P <b> 1) by the pushing-up means 532. As a result, the pellicle frame member 110 and the inner portion 122 of the pellicle film member 120 are pushed up.
By this push-up, the pellicle film member 120 is cut along the cut portion 128.
The push-up direction (arrow P1) at this time is opposite to the gas flow direction (arrow G2). This gas suppresses the attachment of the cut waste generated by the cutting to the pellicle film 130.

(Example of pellicle manufacturing flow of the pellicle manufacturing apparatus 600)
Next, an example of a pellicle manufacturing flow by the pellicle manufacturing apparatus 600 will be described with reference to FIG.
Note that among the steps in FIG. 25, steps surrounded by a broken line (steps 702, 708, 710, and 712) mean steps that can be omitted in this example.

As shown in FIG. 25, first, in step 700, the pellicle film member is set on the pellicle film member loader, and the pellicle frame member is set on the pellicle frame member loader. Subsequently, it carries in in a bonding chamber by robot conveyance.
Next, as step 702, the shape of the pellicle frame (the shape before bonding) of the pellicle frame member is measured by the first measuring means in the bonding chamber.
Next, as step 704, the alignment of the pellicle film member and the pellicle frame member is performed by the alignment means in the bonding chamber. Next, the pellicle film member and the pellicle frame member are bonded in the bonding chamber.
Next, in step 706, the pellicle film member and the pellicle frame member after bonding are carried into a cut chamber, and the pellicle film member is cut.
Next, in step 708, the cut pellicle film member and pellicle frame member are transferred to a cleaning unit, and the cut pellicle film member and pellicle frame member are cleaned.

Next, in step 710, the pellicle film member and the pellicle frame member are transported to the appearance inspection unit, and the appearance inspection unit measures the shape (post-bonding shape) of the pellicle frame of the pellicle frame member by the second measuring means. .
Here, if necessary, feed-forward control (hereinafter also referred to as “FF1 (alignment correction)”) of the alignment unit in step 704 is performed based on the measurement result by the first measurement unit and the measurement result by the second measurement unit. Is called. FF1 (alignment correction) is performed by the control unit 660.

Next, as step 712, based on the measurement result by the first measurement unit and the measurement result by the second measurement unit, the distortion amount of the pellicle frame due to bonding is calculated. The calculation of the distortion amount is performed by the calculation unit 670.
Here, if necessary, based on the calculated distortion amount, feed-forward control (hereinafter referred to as “FF2 (distortion correction)”) is performed on the pressing amount of the pellicle frame 100 by the communication member 314 in the bonding process in step 704. Also called). In this example, FF2 (distortion correction) is also performed by the calculation unit 670. However, as a modification, a control unit that performs FF2 (distortion correction) may be provided separately from a calculation unit that calculates a distortion amount.

  Next, in step 714, the pellicle film member and the pellicle frame member (that is, the pellicle) are transported to the unloader and stored.

Although an example of the pellicle manufacturing flow by the pellicle manufacturing apparatus has been described above, the present embodiment is not limited to this example.
For example, as described above, in the pellicle manufacturing apparatus 600, the control unit 660 and the calculation unit 670 may be omitted. That is, FF1 (alignment correction) and FF2 (distortion correction) may be performed manually instead of being automatically performed by the control means.
In the pellicle manufacturing apparatus 600, the control unit 660 and the calculation unit 670 may be the same control unit. That is, FF1 (alignment correction), distortion amount calculation, and FF2 (distortion correction) may be performed by one control unit.
Furthermore, as described above, the pellicle manufacturing apparatus of the present embodiment may be an apparatus including only a bonding unit. That is, even by performing only the bonding process in step 704, the pellicle can be manufactured by bonding the pellicle film member and the pellicle frame member without contacting the pellicle film as much as possible.

(Specific example of exposure apparatus equipped with a pellicle)
The pellicle manufactured according to the present embodiment is used in an exposure apparatus while being mounted on an original (mask).
FIG. 26 is a schematic cross-sectional view of an EUV exposure apparatus 800 that is an example of an exposure apparatus that includes an example of a pellicle manufactured according to the present embodiment.
As shown in FIG. 26, the EUV exposure apparatus 800 includes a light source 831 that emits EUV light, an exposure original plate 850, and an illumination optical system 837 that guides the EUV light emitted from the light source 831 to the exposure original plate 850. .
The exposure original plate 850 includes a pellicle 810 including a pellicle film 812 and a pellicle frame 814, and an original plate 833 (EUV mask). The exposure original plate 850 is arranged such that EUV light emitted from the light source 831 passes through the pellicle film 812 and is irradiated onto the original plate 833.
The original 833 reflects the irradiated EUV light in a pattern.

  Here, as the original 833, an original including a support substrate, a reflective layer laminated on the support substrate, and an absorber layer formed on the reflective layer can be used. Of the surfaces of the original plate, the surface on which the reflective layer and the absorber layer are provided is the light irradiation surface. The absorber layer partially absorbs EUV light, whereby a desired image is formed on a sensitive substrate (for example, a semiconductor substrate with a photoresist film). The reflective layer can be a multilayer film of molybdenum (Mo) and silicon (Si). The absorber layer can be a material having high absorbability such as EUV light, such as chromium (Cr) or tantalum nitride.

The pellicle 810 is an example of a pellicle manufactured according to this embodiment.
The pellicle 810 corresponds to the pellicle 200 from which the release liner 106 is removed.
The pellicle film 812 corresponds to, for example, the pellicle film 130 described above.
The pellicle frame 814 corresponds to the composite of the inner portion 122 described above, the adhesive layer 102 described above, the pellicle frame 100 described above, and the adhesive layer 104 described above.

In the EUV exposure apparatus 800, filter windows 820 and 825 are installed between the light source 831 and the illumination optical system 837 and between the illumination optical system 837 and the original 833, respectively.
Further, the EUV exposure apparatus 800 includes a projection optical system 838 that guides the EUV light reflected by the original 833 to the sensitive substrate 834.

  In the EUV exposure apparatus 800, the EUV light reflected by the original 833 is guided onto the sensitive substrate 834 through the projection optical system 838, and the sensitive substrate 834 is exposed in a pattern. Note that exposure by EUV is performed under reduced pressure conditions.

The EUV light source 831 emits EUV light toward the illumination optical system 837.
The EUV light source 831 includes a target material, a pulse laser irradiation unit, and the like. EUV is obtained by irradiating this target material with a pulse laser to generate plasma. When the target material is Xe, EUV having a wavelength of 13 to 14 nm is obtained. The wavelength of the light emitted from the EUV light source is not limited to 13 to 14 nm, and may be light having a wavelength suitable for the purpose within a wavelength range of 5 to 30 nm.

The illumination optical system 837 collects the light emitted from the EUV light source 831, makes the illuminance uniform, and irradiates the original 833.
The illumination optical system 837 includes a plurality of multilayer mirrors 832 for adjusting the EUV optical path, an optical coupler (optical integrator), and the like. The multilayer film mirror is a multilayer film in which molybdenum (Mo) and silicon (Si) are alternately stacked.

The method for attaching the filter windows 820 and 825 is not particularly limited, and examples thereof include a method of attaching via an adhesive or the like, and a method of mechanically fixing in the EUV exposure apparatus.
The filter window 820 disposed between the light source 831 and the illumination optical system 837 captures scattered particles (debris) generated from the light source, and the scattered particles (debris) are elements inside the illumination optical system 837 (for example, a multilayer film). Avoid sticking to the mirror 832).
On the other hand, the filter window 825 disposed between the illumination optical system 837 and the original 833 captures particles (debris) scattered from the light source 831 side and prevents the scattered particles (debris) from adhering to the original 833. .

  Further, the foreign matter adhering to the original plate absorbs or scatters EUV light, which causes poor resolution on the wafer. Therefore, the pellicle 810 is mounted so as to cover the EUV irradiation area of the original 833. The EUV light passes through the pellicle film 812 and is irradiated on the original 833.

The EUV light reflected by the original 833 passes through the pellicle film 812 and is irradiated onto the sensitive substrate 834 through the projection optical system 838.
The projection optical system 838 condenses the light reflected by the original 833 and irradiates the sensitive substrate 834. The projection optical system 838 includes a plurality of multilayer mirrors 835 and 836 for preparing an EUV optical path.

  The sensitive substrate 834 is a substrate on which a resist is applied on a semiconductor wafer, and the resist is exposed in a pattern by EUV reflected by the original 833. By developing this resist and etching the semiconductor wafer, a desired pattern is formed on the semiconductor wafer.

The disclosure of Japanese Patent Application No. 2014-109483 filed on May 27, 2014 is incorporated herein by reference in its entirety.
All documents, patent applications, and technical standards mentioned in this specification are to the same extent as if each individual document, patent application, and technical standard were specifically and individually stated to be incorporated by reference, Incorporated herein by reference.

Claims (19)

A pellicle frame member including a pellicle frame having a groove provided on at least one of the one end surface and the other end surface in the thickness direction and a through-hole penetrating between the outer peripheral surface and the wall surface of the groove, and a pellicle film including a pellicle film A bonding chamber in which the member and the member are bonded together;
The pellicle frame member and the pellicle film member are disposed in the bonding chamber in a state where the end surface of the pellicle frame provided with the groove and the pellicle film member are opposed to each other. An exhaust pipe for exhausting the inside of the groove through the through hole;
A pellicle manufacturing apparatus comprising a bonding unit including:   The pellicle manufacturing apparatus according to claim 1, wherein the bonding unit further includes an introduction tube for introducing a gas into the bonding chamber and pressurizing the bonding chamber. The introduction pipe includes a first introduction pipe that introduces gas from a side of the pellicle frame member and the pellicle film member that are disposed in the bonding chamber, and faces the pellicle film member,
The bonding unit further includes:
The pellicle manufacturing apparatus according to claim 2, further comprising a gas dispersion member for dispersing the gas introduced from the first introduction pipe.   The pellicle manufacturing apparatus according to any one of claims 1 to 3, further comprising a holding member for holding the pellicle film member and carrying it into the bonding chamber.   The said pellicle film member contains the said pellicle film | membrane and the support substrate which supports the said pellicle film | membrane in parts other than the said opening part which have an opening part. Pellicle manufacturing equipment. The pellicle film member includes the pellicle film, and a support substrate that has an opening and supports the pellicle film at a portion other than the opening,
The pellicle manufacturing apparatus according to claim 4, wherein the holding member holds the pellicle film member in contact with the support substrate and not in contact with the pellicle film.   The said bonding unit is connected to the end of the said exhaust pipe in the said bonding chamber, The communication member which connects the said exhaust pipe and the said through-hole of the said pellicle frame is included. The pellicle manufacturing apparatus according to any one of the above.   The pellicle manufacturing apparatus according to claim 7, wherein the communication member is provided so as to be movable in a direction in which an outer peripheral surface of the pellicle frame is pushed.   The pellicle manufacturing apparatus according to claim 7 or 8, wherein the communication member has an open end that can be inserted into the through hole.   Furthermore, the pellicle manufacturing apparatus of any one of Claims 1-9 provided with the cut unit which cuts the said pellicle film member according to the outer periphery shape of the said pellicle frame member.   The pellicle film member includes the pellicle film and a support substrate that has an opening and supports the pellicle film at a portion other than the opening, and is a cut portion for cutting in accordance with the outer peripheral shape of the pellicle frame member The pellicle manufacturing apparatus according to claim 10, further comprising:   12. The pellicle manufacturing apparatus according to claim 11, wherein the cut unit includes a push-up unit that cuts the pellicle film member by pushing up a portion inside the cut portion of the support substrate with respect to an outer portion. The cut unit is
A cut chamber in which an operation of cutting the pellicle film member is performed;
The push-up means arranged in the cut chamber;
An introduction tube for introducing a gas into the cut chamber;
A gas dispersion member that disperses the gas introduced by the introduction pipe and that blows the inner portion from a direction opposite to the pushing-up direction;
The pellicle manufacturing apparatus according to claim 12, comprising:   The pellicle manufacturing apparatus according to claim 10, further comprising a cleaning unit that cleans the cut pellicle film member.   The pellicle manufacturing apparatus according to claim 1, further comprising an inspection unit that performs an appearance inspection of the pellicle frame member and the pellicle film member after the bonding. First measuring means for measuring the shape of the pellicle frame of the pellicle frame member before being bonded to the pellicle film member;
Second measuring means for measuring the shape of the pellicle frame of the pellicle frame member after being bonded to the pellicle film member;
The pellicle manufacturing apparatus according to any one of claims 1 to 15, further comprising: Alignment means for aligning the pellicle frame member and the pellicle film member before bonding the pellicle frame member and the pellicle film member;
Based on the measurement result of the shape of the pellicle frame before the pasting and the measurement result of the shape of the pellicle frame after the pasting, control means for feedforward controlling the alignment by the alignment means;
The pellicle manufacturing apparatus according to claim 16, further comprising:   Calculation means for calculating a distortion amount of the pellicle frame due to the bonding based on a difference between the measurement result of the shape of the pellicle frame before the bonding and the measurement result of the shape of the pellicle frame after the bonding The pellicle manufacturing apparatus according to claim 16, further comprising: The bonding unit is connected to one end of the exhaust pipe in the bonding chamber, communicates with the exhaust pipe and the through-hole of the pellicle frame, and can move in a direction to push in the outer peripheral surface of the pellicle frame Including a communication member provided in the
The pellicle manufacturing apparatus according to claim 18, wherein the calculation unit is a control unit that performs feedforward control of an amount by which the pellicle frame is pushed by the communication member based on the distortion amount.