TW201534679A - Adhesive composition and surface-protective adhesive film - Google Patents

Adhesive composition and surface-protective adhesive film Download PDF

Info

Publication number
TW201534679A
TW201534679A TW104111773A TW104111773A TW201534679A TW 201534679 A TW201534679 A TW 201534679A TW 104111773 A TW104111773 A TW 104111773A TW 104111773 A TW104111773 A TW 104111773A TW 201534679 A TW201534679 A TW 201534679A
Authority
TW
Taiwan
Prior art keywords
meth
acrylate
group
weight
adhesive composition
Prior art date
Application number
TW104111773A
Other languages
Chinese (zh)
Other versions
TWI570209B (en
Inventor
Takeshi Nagakura
Ryuusuke Shimaguchi
Original Assignee
Fujimori Kogyo Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimori Kogyo Co filed Critical Fujimori Kogyo Co
Publication of TW201534679A publication Critical patent/TW201534679A/en
Application granted granted Critical
Publication of TWI570209B publication Critical patent/TWI570209B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • G02B5/3041Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
    • G02B5/305Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/318Applications of adhesives in processes or use of adhesives in the form of films or foils for the production of liquid crystal displays
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/302Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/312Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/408Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer

Abstract

The invention provides an adhesive composition and a surface-protective adhesive film, which have excellent electrical resistance and excellent adhesive balance, durability and rework performance during peeling in high speed and low speed. The adhesive composition contains (A) acrylate monomer (methyl) containing alkyl carbons of C4-C10, (B) comonomer containing hydroxyl, (C) comonomer containing carboxyl and (D) acrylic polymer of copolymer of poly alkylene glycol single (meth) acrylate monomer. The adhesive composition further contains (E) over three-functional isocyanate compound, (F) crosslinking inhibitor, (G) Crosslinking catalyst, (H) antistatic agent and (I) polyether modified siloxane compound, wherein the acid value of the acrylic polymer ranges from 0.01-8.0.

Description

黏著劑組成物,黏著薄膜及表面保護膜 Adhesive composition, adhesive film and surface protective film

本發明係有關於一種液晶顯示器的製造步驟中所使用的表面保護膜。更具體地,本發明係有關於貼合在構成液晶顯示器的偏光板、相位差板等的光學構件的表面上、用以保護偏光板及相位差板等的光學構件表面之表面保護膜用黏著劑組成物,以及使用其之表面保護膜。 The present invention relates to a surface protective film used in a manufacturing step of a liquid crystal display. More specifically, the present invention relates to adhesion of a surface protective film for bonding the surface of an optical member such as a polarizing plate or a retardation plate which constitutes a polarizing plate or a phase difference plate of a liquid crystal display. The composition of the agent, and a surface protective film using the same.

一直以來,在用以構成液晶顯示器的偏光板、相位差板等的光學構件的製造步驟中,會在光學構件表面暫時貼合表面保護膜。在將光學構件組裝入液晶顯示器時,將表面保護膜從光學構件剝離而除去。為了保護光學構件表面的表面保護膜僅在製造步驟中使用。因此,一般亦稱為步驟膜。 Conventionally, in the manufacturing step of an optical member for forming a polarizing plate or a phase difference plate of a liquid crystal display, a surface protective film is temporarily bonded to the surface of the optical member. When the optical member is assembled in the liquid crystal display, the surface protective film is peeled off from the optical member and removed. The surface protective film for protecting the surface of the optical member is used only in the manufacturing step. Therefore, it is also generally referred to as a step film.

在製造光學構件的步驟中使用的表面保護膜,在具有光學透明性的聚對苯二甲酸乙二醇酯(PET)樹脂薄膜一面上形成有黏著劑層。此外,直至貼合於光學構件為止,用以保護該黏著劑層而經剝離處理的剝離膜被貼合於黏著劑層的上面。 The surface protective film used in the step of producing an optical member has an adhesive layer formed on one surface of an optically transparent polyethylene terephthalate (PET) resin film. Further, the release film for protecting the adhesive layer and being subjected to the release treatment is bonded to the upper surface of the adhesive layer until it is bonded to the optical member.

又,由於偏光板、相位差板等的光學構件,在貼合有表面保護膜的狀態下,進行伴隨液晶顯示板的顯示能力、色度、對比度、雜質混 入等的光學評價的產品檢驗,因此,對於表面保護膜必要的性能係在黏著劑層中不附著氣泡或雜質。 In addition, in the optical member such as a polarizing plate or a retardation film, the display capability, chromaticity, contrast, and impurity mixing accompanying the liquid crystal display panel are performed in a state in which the surface protective film is bonded. In the optical inspection of the product inspection, the necessary performance for the surface protective film is that no bubbles or impurities adhere to the adhesive layer.

而且,近年來,在將表面保護膜從偏光板、相位差板等的光學構件剝離時防止產生靜電之優異的抗靜電性能是必要的。這是因為從被黏著物剝離黏著劑層時,伴隨著所產生的靜電產生的剝離時的帶電可能使液晶顯示器的電氣控制電路發生故障。 In addition, in recent years, when the surface protective film is peeled off from an optical member such as a polarizing plate or a phase difference plate, it is necessary to prevent the occurrence of excellent antistatic performance of static electricity. This is because when the adhesive layer is peeled off from the adherend, the electrification at the time of peeling accompanying the generated static electricity may cause the electrical control circuit of the liquid crystal display to malfunction.

而且,在使表面保護膜貼合於偏光板、相位差板等的光學構件時,由於各種原因,有暫時剝離表面保護膜,再重新黏貼表面保護膜的情況。此時,希望有可輕易地自被黏著體的光學構件剝離(具有重工性)之表面保護膜。 In addition, when the surface protective film is bonded to an optical member such as a polarizing plate or a retardation plate, the surface protective film may be temporarily peeled off and the surface protective film may be reattached for various reasons. At this time, it is desirable to have a surface protective film which can be easily peeled off from the optical member to be adhered (having heavy workability).

而且,從偏光板、相位差板等的光學構件剝離表面保護膜時,要求可快速地剝離。要求即使是高速剝離亦可快速地剝離,對於黏著力的剝離速度所造成的影響亦少。 Further, when the surface protective film is peeled off from an optical member such as a polarizing plate or a phase difference plate, it is required to be peeled off quickly. It is required that even high-speed peeling can be quickly peeled off, and the influence on the peeling speed of the adhesive force is small.

如此,近年來,作為對於用以構成表面保護膜的黏著劑層的要求性能,要求以下(1)~(4)的性能。 As described above, in recent years, the performance of the following (1) to (4) is required as a required performance for the adhesive layer constituting the surface protective film.

(1)取得低速剝離和高速剝離中的黏著力平衡。 (1) A balance of adhesion in low-speed peeling and high-speed peeling is obtained.

(2)防止黏著劑殘留的發生。 (2) Prevent the occurrence of adhesive residue.

(3)具有優異的抗靜電性能。 (3) It has excellent antistatic properties.

(4)具有重工性能。 (4) Has heavy work performance.

然而,雖然可滿足該等(1)~(4)的分別單獨的要求性能,但同時具備在表面保護膜的黏著劑層中所要求的(1)~(4)的所有要求性能是非常困難的。 However, although the respective required performances of the above (1) to (4) can be satisfied, it is extremely difficult to have all the required performances of (1) to (4) required in the adhesive layer of the surface protective film. of.

例如,關於(1)取得低速剝離和高速剝離中的黏著力平衡;及(2)能防止黏著劑殘留的發生,已知有以下的提案。 For example, the following proposals are known regarding (1) obtaining an adhesive balance in low-speed peeling and high-speed peeling; and (2) preventing occurrence of adhesive residue.

以具有碳原子數在7以下烷基之(甲基)丙烯酸烷基酯與含有羧基的共聚性化合物的共聚物作為主成分,以交聯劑對其交聯處理製成的丙烯酸系黏著劑,在貼合後如果經過長時間,則具有黏著劑向被黏物一側移動,並且對被黏物的黏著力經時上升的問題。為了防止該問題產生,已知如下黏著劑(壓敏黏著劑):上述黏著劑使用具有碳原子數為8~10烷基之(甲基)丙烯酸烷基酯與具有醇性羥基的共聚性化合物的共聚物,以交聯劑進行交聯處理而獲得(專利文獻1)。 An acrylic adhesive prepared by crosslinking a copolymer of a (meth)acrylic acid alkyl ester having an alkyl group having 7 or less carbon atoms and a carboxyl group-containing copolymerizable compound as a main component, and crosslinking the mixture with a crosslinking agent. If it takes a long time after the bonding, there is a problem that the adhesive moves toward the adherend side, and the adhesion to the adherend increases with time. In order to prevent this problem, an adhesive (pressure-sensitive adhesive) is known which uses an alkyl (meth)acrylate having an alkyl group having 8 to 10 carbon atoms and a copolymerizable compound having an alcoholic hydroxyl group. The copolymer is obtained by crosslinking treatment with a crosslinking agent (Patent Document 1).

並且提出如下黏著劑等:對於與上述相同的共聚物中少量摻合(甲基)丙烯酸烷基酯與含有羧基的共聚性化合物的共聚物,以交聯劑將其進行交聯處理而獲得。但是,當將其使用於表面張力低、表面光滑的塑膠板等表面保護中時,則有由於加工時或保存時的加熱產生浮起等的剝離現象的問題、或以手工剝離高速剝離時再剝離性差的可能性。 Further, an adhesive or the like is proposed in which a copolymer in which a small amount of a (meth)acrylic acid alkyl ester and a carboxyl group-containing copolymerizable compound are blended in a copolymer similar to the above is obtained by crosslinking treatment with a crosslinking agent. However, when it is used for surface protection such as a plastic sheet having a low surface tension and a smooth surface, there is a problem of peeling phenomenon such as floating due to heating during processing or storage, or peeling at a high speed by manual peeling. Poor peelability.

為了解決該等問題,提出有一種黏著劑組成物,上述黏著劑組成物係對(a)100重量份之具有以碳原子數為8~10烷基之(甲基)丙烯酸烷基酯作為主成分之(甲基)丙烯酸烷基酯中,加入(b)1~15重量份的含有羧基的共聚性化合物、及(c)3~100重量份的碳原子數為1~5脂肪族羧酸的乙烯基酯而獲得之單體混合物的共聚物,且於該共聚物中混合入相對於上述(b)成分的羧基為當量以上的交聯劑而獲得(專利文獻2)。 In order to solve such problems, there has been proposed an adhesive composition which comprises (a) 100 parts by weight of an alkyl (meth)acrylate having an alkyl group of 8 to 10 carbon atoms as a main component. To the (meth)acrylic acid alkyl ester, (b) 1 to 15 parts by weight of a carboxyl group-containing copolymerizable compound, and (c) 3 to 100 parts by weight of a 1 to 5 aliphatic carboxylic acid A copolymer of a monomer mixture obtained by a vinyl ester is obtained by mixing a copolymer having a carboxyl group equivalent or more with respect to the carboxyl group of the component (b) (Patent Document 2).

專利文獻2中所記載的黏著劑組成物,不會在加工時或保存時等產生浮起等剝離現象,且黏著力的經時上升也小,再剝離性優異,即 使是長期保存、特別是高溫環境下的長期保存,亦可以小的力再剝離,此時,在被黏物上沒有產生黏著劑殘留,並且,在進行高速剝離時亦可以小的力再剝離。 The adhesive composition described in Patent Document 2 does not cause a peeling phenomenon such as floating during processing or storage, and the adhesion time rises little, and the removability is excellent, that is, It can be stored for a long period of time, especially in a high-temperature environment, and can be peeled off with a small force. At this time, no adhesive residue remains on the adherend, and it can be peeled off with a small force when performing high-speed peeling. .

並且,關於(3)具有優異的抗靜電性能,作為賦予表面保護膜抗靜電性能的方法,顯示有對基材膜捏合入抗靜電劑的方法等。作為抗靜電劑,例如公開有(a)具有季銨鹽、吡啶嗡鹽、第1~3級胺基等的陽離子基的各種陽離子抗靜電劑;(b)具有磺酸鹽基、硫酸酯鹽基、磷酸酯鹽基、膦酸鹽基等的陰離子基的陰離子抗靜電劑;(c)胺基酸類、胺基硫酸酯系等的兩性抗靜電劑、(d)胺基醇類、甘油類、聚乙二醇系等的非離子抗靜電劑;及(e)將如上述的抗靜電劑高分子量化之高分子型抗靜電劑等(專利文獻3)。 Further, (3) has an excellent antistatic property, and as a method of imparting antistatic properties to the surface protective film, a method of kneading an antistatic agent to a base film is shown. As the antistatic agent, for example, various cationic antistatic agents having (a) a cationic group having a quaternary ammonium salt, a pyridinium salt, a first to third amino group, and the like; (b) having a sulfonate group or a sulfate salt are disclosed. An anionic antistatic agent such as an anion group such as a phosphate group, a phosphonate group or a phosphonate group; (c) an amphoteric antistatic agent such as an amino acid or an aminosulfate group; (d) an amino alcohol or a glycerin And a nonionic antistatic agent such as a polyethylene glycol; and (e) a polymer type antistatic agent which is obtained by polymerizing an antistatic agent as described above (Patent Document 3).

並且,近年來,不只提出將如此抗靜電劑含於基材膜、或塗布於基材膜表面,尚提出直接地使黏著劑層含有如此之抗靜電劑。 Further, in recent years, it has been proposed not only to contain such an antistatic agent on a substrate film or to apply it to the surface of a substrate film, but it has been proposed to directly include the antistatic agent in the adhesive layer.

而且,關於(4)具有重工性能,例如提出一種黏著劑組成物,係於丙烯酸樹脂中摻合有異氰酸酯系化合物之硬化劑、及相對於丙烯酸系樹脂100重量份為0.0001~10重量份之特定的矽酸鹽低聚物(專利文獻4)。 Further, (4) has a rework property, for example, an adhesive composition is proposed, which is a hardener in which an isocyanate compound is blended in an acrylic resin, and is specific to 0.0001 to 10 parts by weight based on 100 parts by weight of the acrylic resin. Citrate oligomer (Patent Document 4).

在專利文獻4中,以烷基碳原子數為約2~12的丙烯酸烷基酯、烷基碳原子數為約4~12的甲基丙烯酸烷基酯等為主要單體成分,例如,可在羧基的單體等含有其它官能基的單體成分。一般而言,最好含有50重量%以上的上述主要單體,並且,希望含有官能基的單體成分的含量為0.001~50重量%,以0.001~25重量%為佳,且以0.01~25重量 %為佳。由於專利文獻4中記載的黏著劑組成物即使在高溫下或高溫高濕下,凝聚力和黏著力經時變化亦小,且,相對於曲面的黏著力中也顯示優異的效果,因此具有重工性。 In Patent Document 4, an alkyl acrylate having an alkyl group having about 2 to 12 carbon atoms, an alkyl methacrylate having an alkyl group having about 4 to 12 carbon atoms, or the like is used as a main monomer component, and for example, A monomer component containing another functional group in a monomer such as a carboxyl group. In general, it is preferable to contain 50% by weight or more of the above-mentioned main monomer, and it is preferable that the content of the monomer component containing a functional group is 0.001 to 50% by weight, preferably 0.001 to 25% by weight, and 0.01 to 25% by weight. weight % is better. The adhesive composition described in Patent Document 4 has a small change in cohesive force and adhesive force over a high temperature or high temperature and high humidity, and exhibits an excellent effect in adhesion to a curved surface, and thus has reworkability. .

一般而言,若將黏著劑層製成柔軟性狀,則黏著劑殘留變得容易發生,重工性也容易降低。即,在誤貼合時剝離困難、重新貼合亦變得困難。因此,需要將具有羧基等官能基的單體交聯於主劑上,將黏著劑層製成一定的硬度,使其具有重工性。 In general, when the adhesive layer is made into a soft property, the adhesive residue tends to occur, and the workability is also liable to lower. That is, it is difficult to peel off and re-attach when it is erroneously bonded. Therefore, it is necessary to crosslink a monomer having a functional group such as a carboxyl group to a host agent, and to form a certain hardness of the adhesive layer to have a reworkability.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開昭63-225677號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. SHO 63-225677

[專利文獻2]日本專利特開平11-256111號公報 [Patent Document 2] Japanese Patent Laid-Open No. Hei 11-256111

[專利文獻3]日本專利特開平11-070629號公報 [Patent Document 3] Japanese Patent Laid-Open No. Hei 11-070629

[專利文獻4]日本專利特開平8-199130號公報 [Patent Document 4] Japanese Patent Laid-Open No. Hei 8-199130

在現有技術中,作為對於構成表面保護膜的黏著劑層的要求性能,希望可取得低速剝離及高速剝離中的黏著力的平衡、優異的抗靜電性能、以及重工性。但是,雖然可分別滿足各個要求性能,但是無法滿足表面保護膜的黏著劑層中要求的全部要求性能。 In the prior art, as a required performance for the adhesive layer constituting the surface protective film, it is desired to achieve a balance of adhesion in low-speed peeling and high-speed peeling, excellent antistatic properties, and reworkability. However, although the respective required properties can be respectively satisfied, the required performance required in the adhesive layer of the surface protective film cannot be satisfied.

本發明係有鑒於上述情況而完成的。本發明的課題係提供一種黏著劑組成物及表面保護膜,上述黏著劑組成物及表面保護膜具有優異 的抗靜電性能,在低速剝離和高速剝離中黏著力的平衡優異,且耐久性以及重工性亦優異。 The present invention has been made in view of the above circumstances. An object of the present invention is to provide an adhesive composition and a surface protective film, which are excellent in the above adhesive composition and surface protective film. The antistatic property is excellent in the balance of adhesion in low-speed peeling and high-speed peeling, and is excellent in durability and reworkability.

為了解決上述課題,本發明提供一種黏著劑組成物,係由含有(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體、(B)含有羥基的可共聚合單體、(C)含有羧基的可共聚合單體、及(D)聚伸烷基二醇單(甲基)丙烯酸酯單體的共聚物的丙烯酸系聚合物所構成,其進一步含有(E)3官能基以上的異氰酸酯化合物、(F)交聯抑制劑、(G)交聯催化劑、(H)抗靜電劑、(I)聚醚改質的矽氧烷化合物,上述丙烯酸系聚合物的酸值為0.01~8.0。 In order to solve the above problems, the present invention provides an adhesive composition comprising (A) a (meth) acrylate monomer having an alkyl group having a carbon number of C4 to C10, and (B) a copolymerizable monomer having a hydroxyl group. And (C) an acrylic polymer comprising a carboxyl group-containing copolymerizable monomer and (D) a polyalkylene glycol mono(meth)acrylate monomer copolymer, further comprising (E)3 An isocyanate compound having a functional group or more, (F) a crosslinking inhibitor, (G) a crosslinking catalyst, (H) an antistatic agent, (I) a polyether modified siloxane compound, and an acid value of the above acrylic polymer It is 0.01~8.0.

上述(B)含有羥基的可共聚合單體為選自由(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸2-羥基乙酯、N-羥基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥乙基(甲基)丙烯醯胺組成的化合物組中的至少一種以上;優選是相對於100重量份的上述(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,含有0.1~5.0重量份的上述(B)含有羥基的可共聚合單體,且,上述(B)含有羥基的可共聚單體中,(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸4-羥基丁酯的合計含有量為0~0.9重量份。 The above (B) hydroxyl group-containing copolymerizable monomer is selected from the group consisting of 8-hydroxyoctyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, (A) a group of compounds consisting of 2-hydroxyethyl acrylate, N-hydroxy(meth) acrylamide, N-methylol (meth) acrylamide, N-hydroxyethyl (meth) acrylamide At least one or more; preferably, the (A) alkyl (C)-C10 (C)-C10 (meth) acrylate monomer having 0.1 to 5.0 parts by weight of the above (B) hydroxyl group-containing monomer The monomer may be copolymerized, and among the above (B) hydroxyl group-containing copolymerizable monomers, 8-hydroxyoctyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, and (meth)acrylic acid 4- The total content of the hydroxybutyl ester is 0 to 0.9 parts by weight.

上述(C)含有羧基的可共聚合單體為選自由(甲基)丙烯酸、羧乙基(甲基)丙烯酸酯、羧戊基(甲基)丙烯酸酯、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基丙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基琥珀酸、2-(甲基)丙烯醯氧基乙基馬來酸、羧基聚己內酯單(甲基)丙烯酸酯、2-(甲基)丙 烯醯氧基乙基四氫鄰苯二甲酸所構成的化合物群組中的至少一種以上,優選是相對於100重量份的上述(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,含有0.35~1.0重量份的上述(C)含有羧基的可共聚合單體。 The above (C) carboxyl group-containing copolymerizable monomer is selected from the group consisting of (meth)acrylic acid, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate, 2-(methyl) propylene oxime Ethyl hexahydrophthalic acid, 2-(methyl) propylene methoxypropyl hexahydrophthalic acid, 2-(methyl) propylene methoxyethyl phthalate, 2-(A Acryloxyethyl succinic acid, 2-(methyl) propylene oxiranyl ethyl maleic acid, carboxy polycaprolactone mono (meth) acrylate, 2-(methyl) propyl At least one or more of the group consisting of enelicoxyethyltetrahydrophthalic acid is preferably a (meth) group having (C) a C4 to C10 (meth) group with respect to 100 parts by weight of the (A) alkyl group. The acrylate monomer contains 0.35 to 1.0 part by weight of the above (C) carboxyl group-containing copolymerizable monomer.

上述(D)聚伸烷基二醇單(甲基)丙烯酸酯單體為選自聚伸烷基二醇單(甲基)丙烯酸酯、甲氧基聚伸烷基二醇(甲基)丙烯酸酯、乙氧基聚伸烷基二醇(甲基)丙烯酸酯中的至少一種以上,相對於100重量份的上述(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,含有1~20重量份的上述(D)聚伸烷基二醇單(甲基)丙烯酸酯單體。 The above (D) polyalkylene glycol mono(meth)acrylate monomer is selected from the group consisting of polyalkylene glycol mono(meth)acrylate, methoxypolyalkylene glycol (meth)acrylate At least one or more of an ester and an ethoxylated polyalkylene glycol (meth) acrylate, wherein the (A) alkyl group having a CA to C10 alkyl group has a C4 to C10 The body contains 1 to 20 parts by weight of the above (D) polyalkylene glycol mono(meth)acrylate monomer.

上述(E)3官能基以上的異氰酸酯化合物為選自六亞甲基二異氰酸酯化合物的異氰脲酸酯體、異佛爾酮二異氰酸酯化合物的異氰脲酸酯體、六亞甲基二異氰酸酯化合物的加合物體、異佛爾酮二異氰酸酯化合物的加合物體、六亞甲基二異氰酸酯化合物的縮二脲體、異佛爾酮二異氰酸酯化合物的縮二脲體所構成的化合物群組中的至少一種以上,優選是相對於100重量份的上述共聚物,含有0.5~5.0重量份的上述(E)3官能基以上的異氰酸酯化合物。 The above (E) trifunctional or higher isocyanate compound is an isocyanurate body selected from a hexamethylene diisocyanate compound, an isocyanurate body of an isophorone diisocyanate compound, and hexamethylene diisocyanate. a compound composed of an adduct of a compound, an adduct of an isophorone diisocyanate compound, a biuret of a hexamethylene diisocyanate compound, and a biuret of an isophorone diisocyanate compound At least one or more of them preferably contain 0.5 to 5.0 parts by weight of the above (E) trifunctional or higher isocyanate compound per 100 parts by weight of the copolymer.

優選是上述(H)抗靜電劑為相對於100重量份的上述共聚物含有量為0.1~5.0重量份且熔點為30~80℃的離子性化合物,或者,在上述共聚物中以0.1~5.0重量%共聚的含有丙烯醯基的季銨鹽型離子性化合物。 Preferably, the (H) antistatic agent is an ionic compound having a content of the copolymer of 0.1 to 5.0 parts by weight and a melting point of 30 to 80 ° C with respect to 100 parts by weight of the copolymer, or 0.1 to 5.0 in the above copolymer. A quaternary ammonium salt type ionic compound containing an acrylonitrile group copolymerized by weight%.

上述(I)聚醚改質的矽氧烷化合物係HLB值為7~12的聚醚改質的矽氧烷化合物,優選是相對於100重量份的上述共聚物,含有0.01~0.5重量份的上述(I)聚醚改質的矽氧烷化合物。 The polyether-modified polyoxane compound of the above (I) polyether modified by a polyether having a HLB value of 7 to 12 is preferably 0.01 to 0.5 part by weight based on 100 parts by weight of the above copolymer. The above (I) polyether modified oxirane compound.

上述(F)交聯抑制劑為酮烯醇互變異構性化合物,優選是相對於 100重量份的上述共聚物,含有1.0~5.0重量份的上述(F)交聯抑制劑。 The above (F) crosslinking inhibitor is a ketoenol tautomerizing compound, preferably relative to 100 parts by weight of the above copolymer contains 1.0 to 5.0 parts by weight of the above (F) crosslinking inhibitor.

上述(G)交聯催化劑為有機錫化合物,優選是相對於100重量份的上述共聚物,含有0.01~0.5重量份的上述(G)交聯催化劑。 The (G) crosslinking catalyst is an organotin compound, and preferably contains 0.01 to 0.5 part by weight of the above (G) crosslinking catalyst based on 100 parts by weight of the copolymer.

優選是使上述黏著劑組成物交聯而成的黏著劑層在低速剝離速度0.3m/min下的黏著力為0.05~0.1N/25mm,在高速剝離速度30m/min下的黏著力為1.0N/25mm以下。 Preferably, the adhesive layer obtained by crosslinking the above-mentioned adhesive composition has an adhesive force of 0.05 to 0.1 N/25 mm at a low-speed peeling speed of 0.3 m/min, and an adhesive force of 1.0 N at a high-speed peeling speed of 30 m/min. /25mm or less.

優選是使上述黏著劑組成物交聯而成的黏著劑層的表面電阻率在5.0×10+10Ω/□以下,剝離帶電壓為±0~0.3kV。 Preferably, the adhesive layer obtained by crosslinking the above-mentioned adhesive composition has a surface resistivity of 5.0 × 10 + 10 Ω / □ or less and a peeling tape voltage of ± 0 to 0.3 kV.

此外,本發明提供一種黏著薄膜,係在樹脂薄膜一面或兩面上形成有使上述黏著劑組成物交聯而成之黏著劑層而獲得的黏著薄膜。 Further, the present invention provides an adhesive film obtained by forming an adhesive layer obtained by crosslinking the above-mentioned adhesive composition on one or both sides of a resin film.

並且,本發明提供一種表面保護膜,係在樹脂薄膜一面上形成有使上述黏著劑組成物交聯而成之黏著劑層之表面保護膜,該表面保護膜係透過上述黏著劑層,以圓珠筆於表面保護膜上描繪後,不致對被黏著物轉移污染。 Further, the present invention provides a surface protective film in which a surface protective film of an adhesive layer obtained by crosslinking the above-mentioned adhesive composition is formed on one surface of a resin film, and the surface protective film is passed through the adhesive layer to be a ballpoint pen After being painted on the surface protective film, it will not be contaminated by the transfer of the adhesive.

上述表面保護膜,可作為偏光板用表面保護膜的用途使用。 The surface protective film can be used as a surface protective film for a polarizing plate.

優選是在上述樹脂薄膜形成有上述黏著劑層一側之相反面上,進行抗靜電和防污染處理。 Preferably, antistatic and anti-pollution treatment is performed on the opposite side of the side on which the above-mentioned adhesive layer is formed on the resin film.

依據本發明,可滿足現有技術中無法解決如在表面保護膜的黏著劑層中所要求的全部性能。另外,尚可獲得優異的抗靜電性能以及優異的防止發生黏著劑殘留的性能。具體地講,可維持優異的抗靜電性能的同時減少抗靜電劑的添加量,並可進一步改善防止發生黏著劑殘留的性能。 According to the present invention, it is possible to satisfy the prior art that it is impossible to solve all the properties required in the adhesive layer of the surface protective film. In addition, excellent antistatic properties and excellent performance against sticking of adhesives are obtained. In particular, it is possible to maintain excellent antistatic properties while reducing the amount of addition of the antistatic agent, and further improve the performance of preventing the occurrence of adhesive residue.

以下,基於較佳的實施形態說明本發明。 Hereinafter, the present invention will be described based on preferred embodiments.

本發明的黏著劑組成物其主劑是由含有(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體、(B)含有羥基的可共聚合單體、(C)含有羧基的可共聚合單體、及(D)聚伸烷基二醇單(甲基)丙烯酸酯單體的共聚物的丙烯酸系聚合物所構成,其進一步含有(E)3官能基以上的異氰酸酯化合物、(F)交聯抑制劑、(G)交聯催化劑、(H)抗靜電劑、(I)聚醚改質的矽氧烷化合物,上述丙烯酸系聚合物的酸值是0.01~8.0。 The adhesive composition of the present invention is mainly composed of a (meth) acrylate monomer having (A) an alkyl group having a carbon number of C4 to C10, (B) a hydroxyl group-containing copolymerizable monomer, and (C) An acrylic polymer containing a copolymerizable monomer of a carboxyl group and a copolymer of (D) a polyalkylene glycol mono(meth)acrylate monomer, further containing (E) 3 functional groups or more Isocyanate compound, (F) crosslinking inhibitor, (G) crosslinking catalyst, (H) antistatic agent, (I) polyether modified siloxane compound, the acid value of the above acrylic polymer is 0.01 to 8.0 .

作為(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體可舉出:(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯等。 Examples of the (meth) acrylate monomer having (A) an alkyl group having a carbon number of C4 to C10 include butyl (meth)acrylate, isobutyl (meth)acrylate, and amyl (meth)acrylate. , (meth) hexyl acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (methyl) Ethyl acrylate, isodecyl (meth)acrylate, decyl (meth)acrylate, and the like.

作為(B)含有羥基的可共聚合單體可舉出:(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸2-羥基乙酯等的(甲基)丙烯酸羥基烷基酯類,N-羥基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥乙基(甲基)丙烯醯胺等的含有羥基的(甲基)丙烯醯胺類等。 Examples of the (B) hydroxyl group-containing copolymerizable monomer include 8-hydroxyoctyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate. (meth)acrylic acid hydroxyalkyl esters such as 2-hydroxyethyl methacrylate, N-hydroxy(methyl) acrylamide, N-methylol (meth) acrylamide, N-hydroxyl A hydroxyl group-containing (meth) acrylamide such as a (meth) acrylamide or the like.

優選是選自(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸6-羥基己酯、 (甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸2-羥基乙酯、N-羥基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥乙基(甲基)丙烯醯胺所構成的化合物群組中的至少一種以上。 Preferably, it is selected from the group consisting of 8-hydroxyoctyl (meth)acrylate and 6-hydroxyhexyl (meth)acrylate. 4-hydroxybutyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, N-hydroxy(meth)acrylamide, N-hydroxymethyl(meth)acrylamide, N-hydroxyl At least one or more of the group consisting of a group of (meth)acrylamides.

相對於100重量份的上述(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,優選是含有0.1~5.0重量份的上述(B)含有羥基的可共聚合單體。 The (B) (4) hydroxyl group-containing copolymerizable monomer is preferably contained in an amount of 0.1 to 5.0 parts by weight based on 100 parts by weight of the (A) (C)-C10-C10 (meth) acrylate monomer. .

並且,在(B)含有羥基的可共聚合單體中,(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸4-羥基丁酯的合計含有量為以未滿1重量份(允許不含有的情況)為佳,又以0~0.9重量份為佳。 Further, in (B) a hydroxyl group-containing copolymerizable monomer, a total of 8-hydroxyoctyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, and 4-hydroxybutyl (meth)acrylate The content is preferably less than 1 part by weight (may not be contained), and preferably 0 to 0.9 parts by weight.

(C)含有羧基的可共聚合單體為選自(甲基)丙烯酸、羧乙基(甲基)丙烯酸酯、羧戊基(甲基)丙烯酸酯、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基丙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基琥珀酸、2-(甲基)丙烯醯氧基乙基馬來酸、羧基聚己內酯單(甲基)丙烯酸酯、2-(甲基)丙烯醯氧基乙基四氫鄰苯二甲酸所構成的化合物群組中的至少一種以上。 (C) The carboxyl group-containing copolymerizable monomer is selected from the group consisting of (meth)acrylic acid, carboxyethyl (meth) acrylate, carboxypentyl (meth) acrylate, 2-(methyl) propylene fluorenyloxy group Ethyl hexahydrophthalic acid, 2-(methyl)propenyloxypropyl hexahydrophthalic acid, 2-(meth) propylene methoxyethyl phthalate, 2-(methyl ) acryloxyethyl succinic acid, 2-(methyl) propylene oxiranyl ethyl maleic acid, carboxy polycaprolactone mono (meth) acrylate, 2-(methyl) propylene methoxy ethoxylate At least one or more of the group consisting of tetrahydrophthalic acid.

相對於100重量份的(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,(C)含有羧基的可共聚合單體以含有0.35~1.0重量份為佳、且以含有0.35~0.6重量份更佳。 The (C) carboxyl group-containing copolymerizable monomer is preferably contained in an amount of 0.35 to 1.0 part by weight, based on 100 parts by weight of the (A) (C) alkyl group having a C4 to C10 alkyl group. It is more preferably contained in an amount of 0.35 to 0.6 parts by weight.

作為(D)聚伸烷基二醇單(甲基)丙烯酸酯單體,可以是在聚伸烷基二醇具有的複數羥基中,一個羥基作為(甲基)丙烯酸酯經酯化之化合物。由於(甲基)丙烯酸酯基成為聚合性基團,因此可與主劑聚合物進行共聚合。其它的羥基既可以保持OH不變,亦可成為甲醚或乙醚等烷 基醚,或者乙酸酯等飽和羧酸酯等。 The (D) polyalkylene glycol mono(meth)acrylate monomer may be a compound in which a hydroxyl group is esterified as a (meth)acrylate in a plurality of hydroxyl groups of the polyalkylene glycol. Since the (meth) acrylate group becomes a polymerizable group, it can be copolymerized with the main agent polymer. Other hydroxyl groups can maintain OH or become an alkyl ether or an ether. Alkyl ether, or a saturated carboxylic acid ester such as acetate.

作為聚伸烷基二醇具有的伸烷基,可舉出伸乙基、伸丙基、伸丁基等,但不限定於該等。聚伸烷基二醇也可為聚伸乙基二醇、聚伸丙基二醇、聚伸丁基二醇等的2種以上的聚伸烷基二醇的共聚物。作為聚伸烷基二醇的共聚物,可舉出聚伸乙基二醇-聚伸丙基二醇、聚伸乙基二醇-聚伸丁基二醇、聚伸丙基二醇-聚伸丁基二醇、聚伸乙基二醇-聚伸丙基二醇-聚伸丁基二醇等,該共聚物可為嵌段共聚物、無規共聚物。 Examples of the alkylene group which the polyalkylene glycol has are an exoethyl group, a propyl group, a butyl group, and the like, but are not limited thereto. The polyalkylene glycol may be a copolymer of two or more kinds of polyalkylene glycols such as polyethyl diol, poly propyl diol, and polybutylene glycol. Examples of the copolymer of the polyalkylene glycol include a polyethylene glycol-polypropylene glycol, a polyethylene glycol-polybutylene glycol, and a poly(propylidene glycol)-polymer. Stretching butyl diol, polyethyl propylene glycol - poly propylene glycol - polybutylene glycol, etc., the copolymer may be a block copolymer or a random copolymer.

作為(D)聚伸烷基二醇單(甲基)丙烯酸酯單體,優選為選自聚伸烷基二醇單(甲基)丙烯酸酯、甲氧基聚伸烷基二醇(甲基)丙烯酸酯、乙氧基聚伸烷基二醇(甲基)丙烯酸酯中的至少一種以上。 As the (D) polyalkylene glycol mono(meth) acrylate monomer, preferably selected from the group consisting of polyalkylene glycol mono(meth)acrylates, methoxypolyalkylene glycols (methyl groups) At least one of an acrylate and an ethoxylated polyalkylene glycol (meth) acrylate.

更具體地,可舉出聚伸乙基二醇-單(甲基)丙烯酸酯、聚伸丙基二醇-單(甲基)丙烯酸酯、聚伸丁基二醇-單(甲基)丙烯酸酯、聚伸乙基二醇-聚伸丙基二醇-單(甲基)丙烯酸酯、聚伸乙基二醇-聚伸丁基二醇-單(甲基)丙烯酸酯、聚伸丙基二醇-聚伸丁基二醇-單(甲基)丙烯酸酯、聚伸乙基二醇-聚伸丙基二醇-聚伸丁基二醇-單(甲基)丙烯酸酯;甲氧基聚伸乙基二醇-(甲基)丙烯酸酯、甲氧基聚伸丙基二醇-(甲基)丙烯酸酯、甲氧基聚伸丁基二醇-(甲基)丙烯酸酯、甲氧基-聚伸乙基二醇-聚伸丙基二醇-(甲基)丙烯酸酯、甲氧基-聚伸乙基二醇-聚伸丁基二醇-(甲基)丙烯酸酯、甲氧基-聚伸丙基二醇-聚伸丁基二醇-(甲基)丙烯酸酯、甲氧基-聚伸乙基二醇-聚伸丙基二醇-聚伸丁基二醇-(甲基)丙烯酸酯;乙氧基聚伸乙基二醇-(甲基)丙烯酸酯、乙氧基聚伸丙基二醇-(甲基)丙烯酸酯、乙氧基聚伸丁基二醇-(甲基)丙烯酸酯、乙氧基-聚伸乙基二醇-聚伸丙基 二醇-(甲基)丙烯酸酯、乙氧基-聚伸乙基二醇-聚伸丁基二醇-(甲基)丙烯酸酯、乙氧基-聚伸丙基二醇-聚伸丁基二醇-(甲基)丙烯酸酯、乙氧基-聚伸乙基二醇-聚伸丙基二醇-聚伸丁基二醇-(甲基)丙烯酸酯等。 More specifically, polyethyl epoxide-mono (meth) acrylate, poly propyl diol-mono (meth) acrylate, polybutylene butyl diol - mono (meth) acrylic acid Ester, polyethyl epoxide - poly propyl diol - mono (meth) acrylate, polyethyl propylene glycol - polybutylene diol - mono (meth) acrylate, poly propyl Glycol-polybutylene glycol-mono(meth)acrylate, polyethylene glycol-polypropylene glycol-polybutylene glycol-mono(meth)acrylate; methoxy Polyethyl epoxide-(meth) acrylate, methoxy-poly-propyl diol-(meth) acrylate, methoxy-polybutylene glycol-(meth) acrylate, methoxy Base-polyethyl diol-poly propyl diol-(meth) acrylate, methoxy-polyethyl diol-polybutylene glycol-(meth) acrylate, methoxy -Polymeric propyl diol-polybutylene glycol-(meth) acrylate, methoxy-polyethyl diol-poly propylene glycol-polybutylene glycol-(A Acrylate; ethoxylated polyethylene glycol-(meth)acrylate, ethoxylated polypropylene glycol-(meth)acrylate, ethoxylate Polyethylene glycol extending butyl - (meth) acrylate, ethoxy - extending poly ethylene glycol - poly extending propyl Glycol-(meth) acrylate, ethoxy-polyethyl diol-polybutylene glycol-(meth) acrylate, ethoxy-poly propylene glycol-polybutylene Glycol-(meth) acrylate, ethoxy-polyethyl diol-poly propyl diol-polybutylene glycol-(meth) acrylate, and the like.

優選是相對於100重量份的上述(A)烷基的碳原子數為C4~C10的(甲基)丙烯酸酯單體,含有1~20重量份的上述(D)聚伸烷基二醇單(甲基)丙烯酸酯單體。 Preferably, it is a (meth) acrylate monomer having a C4 to C10 carbon number in the above (A) alkyl group, and contains 1 to 20 parts by weight of the above (D) polyalkylene glycol monomer. (Meth) acrylate monomer.

作為(E)3官能基以上的異氰酸酯化合物,1分子中具有至少3個以上異氰酸酯(NCO)基的多異氰酸酯化合物即可,可以舉出:六亞甲基二異氰酸酯、異佛爾酮二異氰酸酯、二苯基甲烷二異氰酸酯、甲代亞苯基二異氰酸酯、苯二甲撐二異氰酸酯等的二異氰酸酯類(1分子中具有2個NCO基的化合物)的縮二脲改質體或異氰脲酸酯改質體、三羥甲基丙烷或甘油等的3價以上的多元醇(1分子中具有至少3個以上的OH基的化合物)的加合物體(多元醇改質體)等。 The (E) trifunctional or higher isocyanate compound may have at least three or more isocyanate (NCO) groups in one molecule, and examples thereof include hexamethylene diisocyanate and isophorone diisocyanate. Biuret modified or isocyanuric acid of diisocyanate (compound having two NCO groups in one molecule) such as diphenylmethane diisocyanate, phenylene diisocyanate or xylylene diisocyanate An adduct (polyol modified body) of a trivalent or higher polyvalent alcohol (a compound having at least three or more OH groups in one molecule) such as an ester modified product, trimethylolpropane or glycerin.

(E)3官能基以上的異氰酸酯化合物是1分子中至少具有3個以上的異氰酸酯(NCO)基的多異氰酸酯化合物,特別地優選選自六亞甲基二異氰酸酯化合物的異氰脲酸酯體、異佛爾酮二異氰酸酯化合物的異氰脲酸酯體、六亞甲基二異氰酸酯化合物的加合物體、異佛爾酮二異氰酸酯化合物的加合物體、六亞甲基二異氰酸酯化合物的縮二脲體、異佛爾酮二異氰酸酯化合物的縮二脲體組成的化合物群組中的至少一種以上。相對於100重量份的共聚物,優選含有0.5~5.0重量份的(E)3官能基以上的異氰酸酯化合物。 The (E) trifunctional or higher isocyanate compound is a polyisocyanate compound having at least three or more isocyanate (NCO) groups in one molecule, and particularly preferably an isocyanurate body selected from a hexamethylene diisocyanate compound, An isocyanurate body of an isophorone diisocyanate compound, an adduct of a hexamethylene diisocyanate compound, an adduct of an isophorone diisocyanate compound, and a biuret of a hexamethylene diisocyanate compound At least one or more of the compound group consisting of a biuret body of a body or an isophorone diisocyanate compound. The (E) trifunctional or higher isocyanate compound is preferably contained in an amount of 0.5 to 5.0 parts by weight based on 100 parts by weight of the copolymer.

作為(F)交聯抑制劑,可以舉出:乙醯乙酸甲酯、乙醯乙酸乙酯、 乙醯乙酸辛酯、乙醯乙酸油基酯、乙醯乙酸月桂酯、乙醯乙酸硬脂醯酯等的β-酮酯,乙醯丙酮、2,4-己二酮、苯甲醯丙酮等的β-二酮。這些是酮烯醇互變異構化合物,在以多異氰酸酯化合物作為交聯劑的黏著劑組成物中,藉由阻斷具有交聯劑的異氰酸酯基,能夠抑制交聯劑摻合後黏著劑組成物的過度黏度上升或凝膠化,延長黏著劑組成物的貯存期。 Examples of the (F) crosslinking inhibitor include methyl ethyl acetate and ethyl acetate. Β-ketoesters such as octyl acetate, ethyl acetoacetate, lauryl acetate, stearyl acetate, acetamidine, 2,4-hexanedione, benzamidine, etc. Beta-diketone. These are ketoenol tautomer compounds, and in the adhesive composition using a polyisocyanate compound as a crosslinking agent, by blocking the isocyanate group having a crosslinking agent, it is possible to suppress the adhesion agent composition after the crosslinking agent is blended. The excessive viscosity rises or gels, prolonging the shelf life of the adhesive composition.

(F)交聯抑制劑優選為酮烯醇互變異構化合物,特別地優選為選自乙醯丙酮、乙醯乙酸乙酯組成的化合物群組中的至少一種以上。 (F) The crosslinking inhibitor is preferably a ketoenol tautomer compound, and particularly preferably at least one selected from the group consisting of ethyl acetate and ethyl acetate.

相對於100重量份的共聚物,優選含有1.0~5.0重量份的(F)交聯抑制劑。 It is preferred to contain 1.0 to 5.0 parts by weight of (F) a crosslinking inhibitor with respect to 100 parts by weight of the copolymer.

在以多異氰酸酯化合物作為交聯劑的情況中,(G)交聯催化劑為對於上述共聚物和交聯劑的反應(交聯反應)作為催化劑而發揮功能的物質即可,可以舉出:第三級胺等的胺系化合物、有機錫化合物、有機鉛化合物、有機鋅化合物等的有機金屬化合物等。 In the case where the polyisocyanate compound is used as the crosslinking agent, the (G) crosslinking catalyst may be a substance that functions as a catalyst in the reaction (crosslinking reaction) between the copolymer and the crosslinking agent, and may be exemplified: An amine compound such as a tertiary amine, an organometallic compound such as an organotin compound, an organic lead compound or an organozinc compound.

作為第三級胺可以舉出:三烷基胺、N,N,N’,N’-四烷基二胺、N,N-二烷基胺基醇、三伸乙基二胺、嗎啉衍生物、呱嗪衍生物等。 As the tertiary amine, there may be mentioned: a trialkylamine, N,N,N',N'-tetraalkyldiamine, N,N-dialkylamino alcohol, tri-ethylenediamine, morpholine Derivatives, oxazine derivatives, and the like.

作為有機錫化合物,可以舉出:二烷基錫氧化物、二烷基錫的脂肪酸鹽、亞錫的脂肪酸鹽等。 Examples of the organotin compound include a dialkyl tin oxide, a fatty acid salt of a dialkyl tin, a fatty acid salt of stannous, and the like.

(G)交聯催化劑優選有機錫化合物,特別地優選為選自氧化二辛基錫、二月桂酸二辛基錫組成的化合物群組中的至少一種以上。 (G) The crosslinking catalyst is preferably an organotin compound, and particularly preferably at least one selected from the group consisting of dioctyltin oxide and dioctyltin dilaurate.

相對於100重量份的共聚物,優選含有0.01~0.5重量份的(G)交聯催化劑。 It is preferable to contain 0.01 to 0.5 part by weight of the (G) crosslinking catalyst with respect to 100 parts by weight of the copolymer.

(H)抗靜電劑優選(H1)熔點為30~80℃的離子化合物,或者(H2)含有丙烯醯基的季銨鹽型離子化合物。 The (H) antistatic agent is preferably (H1) an ionic compound having a melting point of 30 to 80 ° C or (H2) a quaternary ammonium salt type ionic compound containing an acrylonitrile group.

本發明中,作為(H)抗靜電劑,向共聚物中添加(H1)熔點是30~80℃的離子性化合物,或將(H2)含有丙烯醯基的季銨鹽型離子化合物於共聚物中共聚和。由於這些(H)抗靜電劑的熔點低,且具有長鏈烷基,因此推測其與丙烯酸共聚物的親和性高。 In the present invention, as the (H) antistatic agent, (H1) an ionic compound having a melting point of 30 to 80 ° C or (H2) a quaternary ammonium salt type ionic compound containing an acrylonitrile group is added to the copolymer. Medium copolymerization. Since these (H) antistatic agents have a low melting point and a long-chain alkyl group, it is presumed to have high affinity with an acrylic copolymer.

作為(H1)熔點為30~80℃的離子化合物,為具有陽離子和陰離子的離子性化合物,可以舉出以下化合物:陽離子為吡啶嗡陽離子、咪唑鎓陽離子、嘧啶鎓陽離子、吡唑鎓陽離子、吡咯鎓陽離子、銨基陽離子等的含氮鎓陽離子、或磷鎓陽離子、硫鎓陽離子等的化合物;陰離子為六氟化磷酸根(PF6 -)、硫氰酸根(SCN-)、烷基苯磺酸根(RC6H4SO3 -)、高氯酸根(ClO4 -)、四氟化硼酸根(BF4 -)等的無機或有機陰離子的化合物。優選是在常溫(例如30℃)下是固體,藉由烷基鏈長或取代基位置、個數等的選擇,可獲得熔點為30~80℃的物質。陽離子優選是季含氮鎓陽離子,可以舉出:1-烷基吡啶嗡(2~6位的碳原子可具有取代基,亦可無取代)等的季吡啶嗡陽離子、1,3-二烷基咪唑鎓(2、4、5位的碳原子可具有取代基,亦可無取代)等的季咪唑鎓陽離子、四烷基銨基等的季銨陽離子等。 The ionic compound having a (H1) melting point of 30 to 80 ° C is an ionic compound having a cation and an anion, and examples thereof include a pyridinium cation, an imidazolium cation, a pyrimidine cation, a pyrazolium cation, and a pyrrole. a nitrogen-containing phosphonium cation such as a phosphonium cation or an ammonium cation, or a compound such as a phosphonium cation or a sulfonium cation; the anion is a hexafluorophosphate (PF 6 - ), a thiocyanate (SCN - ), an alkylbenzene sulfonate. A compound of an inorganic or organic anion such as an acid radical (RC 6 H 4 SO 3 - ), perchlorate (ClO 4 - ), or tetrafluoroborate (BF 4 - ). Preferably, it is a solid at normal temperature (for example, 30 ° C), and a material having a melting point of 30 to 80 ° C can be obtained by selection of an alkyl chain length or a substituent position and number. The cation is preferably a quaternary nitrogen-containing cerium cation, and examples thereof include a quaternary pyridinium cation such as 1-alkylpyridinium (the carbon atom at the 2nd to 6th position may have a substituent or may be unsubstituted), and 1,3-dioxane. A quaternary ammonium cation such as a quaternary imidazolium cation or a tetraalkylammonium group such as a carbaryl imidazolium group (the carbon atom at the 2, 4, and 5 positions may have a substituent or may be unsubstituted).

優選是相對於100重量份的共聚物,含有0.1~5.0重量份的(H1)熔點為30~80℃的離子性化合物。 It is preferred to contain 0.1 to 5.0 parts by weight of (H1) an ionic compound having a melting point of 30 to 80 ° C with respect to 100 parts by weight of the copolymer.

作為(H2)含有丙烯醯基的季銨鹽型離子性化合物,為具有陽離子和陰離子的離子性化合物,可舉出以下化合物:陽離子為(甲基)丙烯醯 氧基烷基三烷基銨(R3N+-CnH2n-OCOCQ=CH2、但是、Q=H或CH3、R=烷基)等含(甲基)丙烯醯基的季銨化合物,陰離子為六氟化磷酸根(PF6 -)、硫氰酸根(SCN-)、有機磺酸根(RSO3 -)、高氯酸根(ClO4 -)、四氟化硼酸根(BF4 -)、含有F的醯亞胺鹽(RF 2N-)等的無機或有機陰離子的化合物。作為含有F的醯亞胺鹽(RF 2N-)的RF,可以舉例為:三氟甲基磺醯基、五氟乙基磺醯基等的全氟烷基磺醯基、氟磺醯基。作為含有F的醯亞胺鹽,可舉出雙(氟磺醯基)醯亞胺鹽〔(FSO2)2N-〕、雙(三氟甲基磺醯基)醯亞胺鹽〔(CF3SO2)2N-〕、雙(五氟乙基磺醯基)醯亞胺鹽〔(C2F5SO2)2N-〕等的雙磺醯基醯亞胺鹽。 The (H2) quaternary ammonium salt type ionic compound containing an acrylonitrile group is an ionic compound having a cation and an anion, and examples thereof include a compound: (cation) (meth) propylene decyloxyalkyltrialkylammonium ( a quaternary ammonium compound containing a (meth)acryl fluorenyl group such as R 3 N + -C n H 2n -OCOCQ=CH 2 , but Q=H or CH 3 , R=alkyl group, and an anion of hexafluorophosphate (PF 6 - ), thiocyanate (SCN - ), organic sulfonate (RSO 3 - ), perchlorate (ClO 4 - ), tetrafluoroborate (BF 4 - ), yttrium imide containing F A compound of an inorganic or organic anion such as (R F 2 N - ). As R F of the yttrium imine salt (R F 2 N - ) containing F , a perfluoroalkylsulfonyl group such as a trifluoromethylsulfonyl group or a pentafluoroethylsulfonyl group, or a fluorosulfonate can be exemplified.醯基. Examples of the yttrium imide salt containing F include bis(fluorosulfonyl) quinone imide salt ((FSO 2 ) 2 N - ), bis(trifluoromethylsulfonyl) ruthenium salt [(CF). 3 SO 2 ) 2 N - 〕, bis(pentafluoroethylsulfonyl) sulfinium imide salt ((C 2 F 5 SO 2 ) 2 N - ) and the like.

(H2)含有丙烯醯基的季銨鹽型離子性化合物,優選是在共聚物中以0.1~5.0重量%共聚合。 (H2) A quaternary ammonium salt type ionic compound containing an acrylonitrile group, preferably copolymerized in the copolymer in an amount of 0.1 to 5.0% by weight.

作為(H)抗靜電劑的具體例,並無特別限定,作為(H1)熔點為30~80℃的離子性化合物的具體例可舉出:1-辛基吡啶鎓六氟化磷酸鹽、1-壬基吡啶鎓六氟化磷酸鹽、2-甲基-1-十二烷基吡啶鎓六氟磷酸鹽、1-辛基吡啶鎓十二烷基苯磺酸鹽、1-十二烷基吡啶鎓硫氰酸鹽、1-十二烷基吡啶鎓十二烷基苯磺酸鹽、4-甲基-1-辛基吡啶鎓六氟化磷酸鹽等。而且,作為(H2)含有丙烯醯基的季銨鹽型離子化合物的具體例可舉出:(甲基)丙烯酸二甲基胺基甲基酯六氟化磷酸甲基鹽〔(CH3)3N+CH2OCOCQ=CH2‧PF6 -,但是,Q=H或CH3〕,(甲基)丙烯酸二甲基胺基乙基酯雙(三氟甲基磺醯基)醯亞胺甲基鹽〔(CH3)3N+(CH2)2OCOCQ=CH2‧(CF3SO2)2N-,但是,Q=H或CH3〕,甲基丙烯酸二甲基胺基甲基酯雙(氟磺醯基)醯亞胺甲基鹽〔(CH3)3N+CH2OCOCQ=CH2‧(FSO2)2N-,但是,Q=H或CH3〕等。 Specific examples of the (H) antistatic agent are not particularly limited, and specific examples of the ionic compound having a (H1) melting point of 30 to 80 ° C include 1-octylpyridinium hexafluoride phosphate, and 1 - mercaptopyridinium hexafluorophosphate, 2-methyl-1-dodecylpyridinium hexafluorophosphate, 1-octylpyridinium dodecylbenzenesulfonate, 1-dodecyl Pyridinium thiocyanate, 1-dodecylpyridinium dodecylbenzenesulfonate, 4-methyl-1-octylpyridinium hexafluorophosphate, and the like. Further, specific examples of the (H2) quaternary ammonium salt type ionic compound containing an acrylonitrile group include dimethylaminomethyl (meth) acrylate hexafluorophosphate methyl salt [(CH 3 ) 3 N + CH 2 OCOCQ=CH 2 ‧PF 6 - , however, Q=H or CH 3 ], dimethylaminoethyl (meth) acrylate bis(trifluoromethylsulfonyl) fluorene Base salt [(CH 3 ) 3 N + (CH 2 ) 2 OCOCQ=CH 2 ‧(CF 3 SO 2 ) 2 N - , but, Q=H or CH 3 ], dimethylaminomethyl methacrylate Ester bis(fluorosulfonyl) quinone imine methyl salt [(CH 3 ) 3 N + CH 2 OCOCQ = CH 2 ‧ (FSO 2 ) 2 N - , but Q = H or CH 3 ] and the like.

(I)聚醚改質的矽氧烷化合物是具有聚醚基的矽氧烷化合物,除了常規的矽氧烷單元〔-SiR1 2-O-〕,尚具有聚醚基的矽氧烷單元〔-SiR1(R2O(R3O)nR4)-O-〕。此處,R1表示1種或2種以上的烷基或芳基,R2和R3表示1種或2種以上的伸烷基、R4表示1種或2種以上的烷基、醯基等(末端基)。作為聚醚基可以舉出:聚氧化乙烯基〔(C2H4O)n〕或聚氧化丙烯基〔(C3H6O)n〕等的聚氧化伸烷基。 (I) The polyether-modified oxirane compound is a polyoxyl group-containing oxirane compound, in addition to the conventional oxime unit [-SiR 1 2 -O-], a polyether-based oxirane unit [-SiR 1 (R 2 O(R 3 O) n R 4 )-O-]. Here, R 1 represents one or two or more alkyl groups or aryl groups, R 2 and R 3 represent one or two or more kinds of alkylene groups, and R 4 represents one or two or more kinds of alkyl groups and hydrazines. Base or the like (end group). The polyether group may, for example, be a polyoxyalkylene group such as a polyoxyethylene group [(C 2 H 4 O) n ] or a polyoxypropylene group [(C 3 H 6 O) n ].

(I)聚醚改質的矽氧烷化合物最好為HLB值是7~12的聚醚改質的矽氧烷化合物。此外,相對於100重量份的共聚物,優選是含有0.01~0.5重量份的上述(I)聚醚改質的矽氧烷化合物。更優選為0.1~0.5重量份。 (I) The polyether-modified oxime compound is preferably a polyether-modified oxirane compound having an HLB value of 7 to 12. Further, it is preferred to contain 0.01 to 0.5 part by weight of the above (I) polyether modified oxoxane compound with respect to 100 parts by weight of the copolymer. More preferably, it is 0.1 to 0.5 part by weight.

所謂HLB係例如JIS K3211(表面活性劑用語)等中規定的親水親油平衡(親水性與親油性的比)。 The HLB system is, for example, a hydrophilic-lipophilic balance (ratio of hydrophilicity to lipophilicity) prescribed in JIS K3211 (surfactant terminology).

聚醚改質的矽氧烷化合物係例如,對於具有矽烷基的聚有機矽氧烷主鏈,可藉由氫化矽烷化反應使具有不飽和鍵和聚氧化伸烷基的有機化合物接枝而獲得。具體地可以舉出:二甲基矽氧烷.甲基(聚氧化乙烯)矽氧烷共聚物、二甲基矽氧烷.甲基(聚氧化乙烯)矽氧烷.甲基(聚氧化丙烯)矽氧烷共聚物、二甲基矽氧烷.甲基(聚氧化丙烯)矽氧烷共聚物等。 The polyether-modified siloxane compound is, for example, obtained by grafting an organic compound having an unsaturated bond and a polyoxyalkylene group by a hydrogenation oximation reaction for a polyorganosiloxane chain having a decyl group. . Specifically, dimethyl methoxyoxane can be mentioned. Methyl (polyethylene oxide) alkane copolymer, dimethyl methoxy alkane. Methyl (polyoxyethylene) oxirane. Methyl (polyoxypropylene) siloxane copolymer, dimethyl methoxy alkane. A methyl (polyoxypropylene) siloxane copolymer or the like.

藉由將(I)聚醚改質的矽氧烷化合物摻合至黏著劑組成物,可改善黏著劑的黏著力和重工性能。 The adhesion and reworkability of the adhesive can be improved by blending the (I) polyether-modified siloxane compound to the adhesive composition.

再者,作為其它的成分,可適當地摻合含有氧化烯烴的可共聚合(甲基)丙烯酸單體、(甲基)丙烯醯胺單體、二烷基取代的丙烯醯胺單體、界面活性劑、硬化促進劑、增塑劑、填充劑、硬化抑制劑、加工 助劑、抗老化劑、抗氧化劑等的公知的添加劑。該等可單獨或合併2種以上使用。 Further, as other components, a copolymerizable (meth)acrylic monomer, a (meth)acrylamide monomer, a dialkyl-substituted acrylamide monomer, and an interface containing an olefin oxide may be appropriately blended. Active agent, hardening accelerator, plasticizer, filler, hardening inhibitor, processing A well-known additive such as an auxiliary agent, an anti-aging agent, an antioxidant, and the like. These may be used alone or in combination of two or more.

本發明的黏著劑組成物中使用的主劑的共聚物可藉由聚合(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體、(B)含有羥基的可共聚合單體、(C)含有羧基的可共聚合單體、及(D)聚伸烷基二醇單(甲基)丙烯酸酯單體合成。共聚物的聚合方法並無特別的限定,可使用溶液聚合、乳化聚合等適當的聚合方法。 The copolymer of the main component used in the adhesive composition of the present invention can be copolymerized by (A) a (meth) acrylate monomer having an alkyl group having a C4 to C10 carbon number, and (B) a copolymerizable group having a hydroxyl group. A monomer, (C) a carboxyl group-containing copolymerizable monomer, and (D) a polyalkylene glycol mono(meth)acrylate monomer are synthesized. The polymerization method of the copolymer is not particularly limited, and an appropriate polymerization method such as solution polymerization or emulsion polymerization can be used.

作為(H)抗靜電劑,使用(H2)含有丙烯醯基的季銨鹽型離子性化合物的情況下,在本發明的黏著劑組成物中使用的主劑的共聚物可藉由聚合(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體、(B)含有羥基的可共聚合單體、(C)含有羧基的可共聚合單體、(D)聚伸烷基二醇單(甲基)丙烯酸酯單體、及(H2)含有丙烯醯基的季銨鹽型離子性化合物合成。 When (H2) a quaternary ammonium salt type ionic compound containing an acrylonitrile group is used as the (H) antistatic agent, the copolymer of the main agent used in the adhesive composition of the present invention can be polymerized (A). a (meth) acrylate monomer having an alkyl group having a carbon number of C4 to C10, (B) a copolymerizable monomer having a hydroxyl group, (C) a copolymerizable monomer having a carboxyl group, and (D) a polyalkylene oxide A diol mono(meth) acrylate monomer and (H2) a quaternary ammonium salt type ionic compound containing an acryl oxime group are synthesized.

本發明的黏著劑組成物可藉由在上述共聚物中摻合(E)3官能基以上的異氰酸酯化合物、(F)交聯抑制劑、(G)交聯催化劑、(H)抗靜電劑、(I)聚醚改質的矽氧烷化合物,進一步地適當任意的添加劑來進行調製。另外,將(H2)含有丙烯醯基的季銨鹽型離子性化合物聚合於主劑的共聚物中的情況下,對於共聚物無論是否進一步添加(H)抗靜電劑皆可。 The adhesive composition of the present invention may be obtained by blending (E) a trifunctional or higher isocyanate compound, (F) a crosslinking inhibitor, (G) a crosslinking catalyst, (H) an antistatic agent, or the like in the above copolymer. (I) A polyether-modified siloxane compound is further prepared by appropriately adding an optional additive. Further, when (H2) a quaternary ammonium salt type ionic compound containing an acrylonitrile group is polymerized in a copolymer of a main component, the (H) antistatic agent may be added to the copolymer.

上述共聚物,優選為丙烯酸系聚合物,優選為含有50~100重量%的(甲基)丙烯酸酯單體、(甲基)丙烯酸、(甲基)丙烯醯胺類等的丙烯酸系單體。 The copolymer is preferably an acrylic polymer, and preferably contains an acrylic monomer such as 50 to 100% by weight of a (meth) acrylate monomer, (meth)acrylic acid or (meth) acrylamide.

另外,丙烯酸系聚合物的酸值優選為0.01~8.0。藉此,可改善污染 性、提高防止黏著劑殘留發生的性能。 Further, the acid value of the acrylic polymer is preferably from 0.01 to 8.0. Thereby improving pollution Improves the performance of preventing the occurrence of adhesive residue.

在此,「酸值」係表示酸含有量的指標之一,表示為了中和1g含有羧基的聚合物所需的氫氧化鉀的mg數。 Here, the "acid value" is one of the indexes indicating the acid content, and indicates the number of mg of potassium hydroxide required to neutralize 1 g of the carboxyl group-containing polymer.

優選是使上述黏著劑組成物交聯而成之黏著劑層在低速剝離速度0.3m/min下的黏著力為0.05~0.1N/25mm,在高速剝離速度30m/min下的黏著力為1.0N/25mm以下。藉此,可獲得黏著力隨著剝離速度變化少的性能,即使是經高速剝離,亦可迅速地剝離。並且,為了重新貼合,暫時剝離表面保護膜時,不需要過大的力,亦可輕易地從被黏物剝離。 Preferably, the adhesive layer obtained by crosslinking the above-mentioned adhesive composition has an adhesive force of 0.05 to 0.1 N/25 mm at a low-speed peeling speed of 0.3 m/min, and an adhesive force of 1.0 N at a high-speed peeling speed of 30 m/min. /25mm or less. Thereby, it is possible to obtain a performance in which the adhesive force changes little with the peeling speed, and even if it is peeled off at a high speed, it can be peeled off quickly. Further, in order to re-bond, when the surface protective film is temporarily peeled off, excessive force is not required, and it is also easy to peel off from the adherend.

優選是使上述黏著劑組成物交聯而成的黏著劑層的表面電阻率在5.0×10+10Ω/□以下,剝離帶電壓為±0~0.3kV。另外,在本發明中,上述「±0~0.3kV」係指0~-0.3kV和0~+0.3kV,即,-0.3~+0.3kV。由於表面電阻率大時則在剝離時由於帶電所產生的靜電逸失的性能差,因此,藉由充分降低表面電阻率,可降低伴隨從被黏物剝離黏著劑層時所產生的靜電生成的剝離帶電壓,抑制對被黏物的電氣控制電路等的影響。 Preferably, the adhesive layer obtained by crosslinking the above-mentioned adhesive composition has a surface resistivity of 5.0 × 10 + 10 Ω / □ or less and a peeling tape voltage of ± 0 to 0.3 kV. Further, in the present invention, the above "±0 to 0.3 kV" means 0 to -0.3 kV and 0 to +0.3 kV, that is, -0.3 to +0.3 kV. When the surface resistivity is large, the performance of electrostatic escaping due to charging at the time of peeling is poor. Therefore, by sufficiently lowering the surface resistivity, peeling of static electricity generated when the adhesive layer is peeled off from the adherend can be reduced. With voltage, it suppresses the influence on the electrical control circuit of the adherend.

使本發明的黏著劑組成物交聯而成的黏著劑層(交聯後的黏著劑)的凝膠分率最好是95~100%。如此,由於凝膠分率高,可使低速剝離速度下的黏著力不致變得過大,降低從共聚物的未聚合單體或寡聚物的溶出,改善重工性、高溫.高濕中的耐久性,抑制被黏物的污染。 The adhesive layer (adhesive after crosslinking) obtained by crosslinking the adhesive composition of the present invention preferably has a gel fraction of 95 to 100%. Thus, since the gel fraction is high, the adhesive force at the low-speed peeling speed can be prevented from becoming excessively large, the dissolution of the unpolymerized monomer or oligomer from the copolymer is lowered, and the workability and high temperature are improved. Durability in high humidity, inhibiting contamination of adherends.

本發明的黏著薄膜是使本發明的黏著劑組成物交聯而成的黏著劑層在樹脂薄膜一面或兩面上形成。此外,本發明的表面保護膜是將本發明的黏著劑組成物交聯而成的黏著劑層在樹脂膜一面上形成的表面保護膜。本發明的黏著劑組成物由於使上述(A)~(I)的各個成分平衡良好地摻合,具有優異的抗靜電性能,在低速剝離速度和高速剝離速度下黏著力的平衡優異,且耐久性能以及重工性能(以圓珠筆透過上述黏著劑層於表面保護膜上描繪後,不致對被黏物轉移污染)亦優異。因此,本發明的表面保護膜可作為偏光板用表面保護膜的用途適當地使用。 The adhesive film of the present invention is formed by crosslinking an adhesive composition of the present invention on one or both sides of a resin film. Further, the surface protective film of the present invention is a surface protective film in which an adhesive layer obtained by crosslinking the adhesive composition of the present invention is formed on one surface of a resin film. The adhesive composition of the present invention has excellent antistatic properties by blending the components of the above (A) to (I) in a well-balanced manner, and is excellent in balance of adhesion at a low-speed peeling speed and a high-speed peeling speed, and is durable. The performance and the rework performance (except that the ballpoint pen is drawn on the surface protective film through the above adhesive layer is not contaminated by the adherend) is also excellent. Therefore, the surface protective film of the present invention can be suitably used as a surface protective film for a polarizing plate.

作為黏著劑層的基材膜、保護黏著面的剝離膜(隔片)可使用聚酯膜等的樹脂膜等。 A resin film such as a polyester film or the like can be used as the base film of the adhesive layer and the release film (separator) for protecting the adhesive surface.

在基材膜中,可在樹脂膜形成有黏著劑層一側之相反面上,施加藉由矽酮類、氟類的脫模劑或塗層劑、二氧化矽微粒子等的防污處理;藉由防靜電劑的塗布或捏合等的防靜電處理。 In the base film, an antifouling treatment by an anthrone, a fluorine-based release agent or a coating agent, cerium oxide microparticles or the like may be applied to the opposite side of the resin film on the side where the adhesive layer is formed; Antistatic treatment by coating or kneading of an antistatic agent.

在剝離膜中,在與黏著劑層的黏著面黏合一側之面上,藉由矽酮類、氟類的脫模劑等施加脫模處理。 In the release film, a release treatment is applied to the surface on the side where the adhesive surface of the adhesive layer is adhered by an anthrone or a fluorine-based release agent.

[實施例] [Examples]

下面,基於實施例,具體說明本發明。 Hereinafter, the present invention will be specifically described based on examples.

<丙烯酸共聚物的製備> <Preparation of acrylic acid copolymer> [實施例1] [Example 1]

對具備有攪拌器、溫度計、回流冷凝器和氮導入管的反應裝置中 導入氮氣,以氮氣取代反應裝置內的空氣。然後,於反應裝置中加入丙烯酸2-乙基己酯100重量份、丙烯酸8-羥基辛酯0.9重量份、丙烯酸0.5重量份、聚伸乙基二醇單丙烯酸酯3重量份和溶劑(乙酸乙酯)60重量份。然後,經過2小時滴入作為聚合起始劑的偶氮二異丁腈0.1重量份,於65℃使其反應6小時,得到重量平均分子量為50萬的實施例1中所使用的丙烯酸共聚物溶液1。取樣丙烯酸共聚物的一部分,作為後述的酸值測定樣品使用。 For a reaction device equipped with a stirrer, a thermometer, a reflux condenser, and a nitrogen introduction tube Nitrogen gas was introduced to replace the air in the reaction device with nitrogen. Then, 100 parts by weight of 2-ethylhexyl acrylate, 0.9 parts by weight of 8-hydroxyoctyl acrylate, 0.5 parts by weight of acrylic acid, 3 parts by weight of polyethylene glycol monoacrylate, and a solvent (acetic acid B) were added to the reaction apparatus. Ester) 60 parts by weight. Then, 0.1 part by weight of azobisisobutyronitrile as a polymerization initiator was dropped over 2 hours, and reacted at 65 ° C for 6 hours to obtain an acrylic copolymer used in Example 1 having a weight average molecular weight of 500,000. Solution 1. A part of the acrylic copolymer was sampled and used as an acid value measurement sample to be described later.

[實施例2~9和比較例1~9] [Examples 2 to 9 and Comparative Examples 1 to 9]

除了單體的組成分別按照表1的(A)~(D)以及(H2)所記載般設定以外,均按照與上述實施例1中所使用的丙烯酸共聚物溶液1同樣地進行,而獲得實施例2~9和比較例1~9中所使用的丙烯酸共聚物溶液。 The composition was carried out in the same manner as in the acrylic copolymer solution 1 used in the above Example 1 except that the composition of the monomers was set as described in (A) to (D) and (H2) of Table 1, respectively. The acrylic copolymer solutions used in Examples 2 to 9 and Comparative Examples 1 to 9.

<黏著劑組成物和表面保護膜的製造> <Manufacture of Adhesive Composition and Surface Protective Film> [實施例1] [Example 1]

依如上述所製造之丙烯酸共聚物溶液1(其中丙烯酸共聚物為100重量份),加入1-辛基吡啶鎓六氟化磷酸鹽1.5重量份、KF-351A(HLB=12的聚醚改質的矽氧烷化合物)0.1重量份、乙醯丙酮2.5重量份並攪拌後,加入CORONATE HX(六亞甲基二異氰酸酯化合物的異氰脲酸酯體)1.5重量份、二月桂酸二辛基錫0.02重量份並攪拌混合,而獲得實施例1的黏著劑組成物。將該黏著劑組成物塗布於矽酮樹脂塗層的聚對苯二甲酸乙二醇酯(PET)膜所構成的剝離膜上後,並利用在90℃進行乾燥以除去溶劑,而獲得黏著劑層的厚度為25μm的黏著片。 According to the acrylic copolymer solution 1 prepared above (in which the acrylic copolymer is 100 parts by weight), 1.5 parts by weight of 1-octylpyridinium hexafluorophosphate, KF-351A (HB=12 polyether modified) 0.1 parts by weight of oxirane compound and 2.5 parts by weight of acetamidine acetone, and stirred, and then added 1.5 parts by weight of CORONATE HX (isocyanurate body of hexamethylene diisocyanate compound) and dioctyltin dilaurate. The adhesive composition of Example 1 was obtained by mixing 0.02 parts by weight with stirring. The adhesive composition is applied onto a release film composed of an oxime resin coated polyethylene terephthalate (PET) film, and then dried at 90 ° C to remove the solvent to obtain an adhesive. The layer has an adhesive sheet having a thickness of 25 μm.

然後,將黏著片轉移至一面上經防靜電和防污處理的聚對苯二甲酸乙二醇酯(PET)膜中經防靜電和防污處理面的反面,而獲得具有「經 防靜電和防污處理的PET膜/黏著劑層/剝離膜(矽酮樹脂塗層的PET膜)」積層構成之實施例1的表面保護膜。 Then, the adhesive sheet is transferred to the opposite side of the antistatic and antifouling treatment surface of the antistatic and antifouling treated polyethylene terephthalate (PET) film on one side, and The anti-static and anti-fouling PET film/adhesive layer/release film (anthracene resin-coated PET film) was laminated to the surface protective film of Example 1.

[實施例2~9和比較例1~9] [Examples 2 to 9 and Comparative Examples 1 to 9]

除了添加劑的組成分別如表1的(E)~(I)所記載般設定以外,均按照與上述實施例1的表面保護膜同樣地進行,而獲得實施例2~9和比較例1~9的表面保護膜。 Except that the composition of the additive was set as described in (E) to (I) of Table 1, the same manner as in the surface protective film of Example 1 was carried out, and Examples 2 to 9 and Comparative Examples 1 to 9 were obtained. Surface protection film.

表1中,各成分的混合比例用括號表示以(A)組的總和為100重量份所要求的重量份的數值。並且,表2中顯示表1中所使用的各成分的縮寫對應的化合物名稱。另外,CORONATE HX(註冊商標)和相同的HL是日本聚胺酯工業股份有限公司(Nippon Polyurethane Industry Co.,Ltd)的商品名,Takenate D-140N(註冊商標)是三井化學股份有限公司的商品名,DURANATE 24A-100(註冊商標)是旭化成化學股份有限公司(Asahi Kasei Chemicals Corporation)的商品名,KF-351A、KF-352A、KF-353、KF-640和X-22-6191是信越化學股份有限公司的商品名。 In Table 1, the mixing ratio of each component is indicated by parentheses in the numerical value of the required part by weight of 100 parts by weight of the total of the group (A). Further, Table 2 shows the compound names corresponding to the abbreviations of the respective components used in Table 1. In addition, CORONATE HX (registered trademark) and the same HL are trade names of Nippon Polyurethane Industry Co., Ltd., and Takenate D-140N (registered trademark) is a trade name of Mitsui Chemicals Co., Ltd. DURANATE 24A-100 (registered trademark) is the trade name of Asahi Kasei Chemicals Corporation, KF-351A, KF-352A, KF-353, KF-640 and X-22-6191 are Shin-Etsu Chemical Co., Ltd. The company's trade name.

表1中,(H)抗靜電劑中,在共聚物中使之共聚合的(H2)含有丙烯醯基的季銨鹽型離子性化合物係與在聚合後被添加之(H1)熔點為30~80℃的離子性化合物記載於不同欄中。另,比較例9中所使用的H1-8是熔點不足30℃的(常溫下為液體),為求方便記載於(H1)同一欄。 In Table 1, in the (H) antistatic agent, the (H2) quaternary ammonium salt type ionic compound containing the acryl fluorenyl group copolymerized in the copolymer and the (H1) melting point added after the polymerization are 30 The ionic compounds at ~80 ° C are described in different columns. Further, H1-8 used in Comparative Example 9 is a melting point of less than 30 ° C (liquid at normal temperature), and is described in the same column as (H1) for convenience.

<試驗方法和評價> <Test method and evaluation>

將實施例1~9和比較例1~9中的表面保護膜於23℃、50%RH的環境下老化7天後,剝離剝離膜(矽酮樹脂塗層的PET膜),以露出黏著劑層的物質作為凝膠分率及表面電阻率的測試樣品。 The surface protective films of Examples 1 to 9 and Comparative Examples 1 to 9 were aged for 7 days in an environment of 23° C. and 50% RH, and then the release film (PET film coated with an anthrone resin) was peeled off to expose the adhesive. The layer material was used as a test sample for gel fraction and surface resistivity.

進而,透過黏著劑層將露出該黏著劑層的表面保護膜貼合於與液晶晶胞貼合的偏光板表面,放置1天後,經50℃、5個大氣壓、20分鐘的高壓釜處理、於室溫進一步放置12小時,將經以上得到的物質作為黏著力、剝離帶電壓和耐久性的測試樣品。 Further, the surface protective film exposing the adhesive layer is bonded to the surface of the polarizing plate bonded to the liquid crystal cell through the adhesive layer, and left for 1 day, and then subjected to autoclaving at 50 ° C, 5 atm, and 20 minutes. After further standing at room temperature for 12 hours, the material obtained above was used as a test sample for adhesion, peeling tape voltage and durability.

<酸值> <acid value>

丙烯酸系聚合物的酸值,係將樣品溶解於溶劑(二乙醚和乙醇以體積比2:1混合而獲得的物質),使用電位差自動滴定裝置(京都電子工業製,AT-610),使用0.1上述電位差滴定裝置,以濃度約0.1mol/l的氫氧化鉀乙醇溶液進行電位差滴定,測定為了中和樣品所需的氫氧化鉀乙醇溶液的量。然後,通過下式求得酸值。 The acid value of the acrylic polymer is obtained by dissolving a sample in a solvent (a substance obtained by mixing diethyl ether and ethanol in a volume ratio of 2:1), using a potential difference automatic titrator (manufactured by Kyoto Electronics Industrial Co., Ltd., AT-610), using 0.1. The potentiometric titration apparatus described above was subjected to potentiometric titration with a potassium hydroxide ethanol solution having a concentration of about 0.1 mol/l, and the amount of the potassium hydroxide ethanol solution required for neutralizing the sample was measured. Then, the acid value was obtained by the following formula.

酸值=(B×f×5.611)/S Acid value = (B × f × 5.611) / S

B=滴定中所使用的0.1mol/l氫氧化鉀乙醇溶液的量(ml) B = amount of 0.1 mol/l potassium hydroxide ethanol solution used in the titration (ml)

f=0.1mol/l氫氧化鉀乙醇溶液的因數 f=0.1mol/l factor of potassium hydroxide ethanol solution

S=樣品的固體成分的品質(g) S = quality of the solid component of the sample (g)

<凝膠分率> <gel fraction>

老化結束後,正確地測定貼合於偏光板前的測試樣品的質量,於甲苯中浸泡24小時後,通過200網目的金屬網過濾。然後,於100℃ 乾燥過濾物1小時後,正確地測定殘留物的質量,從下式計算出黏著劑層(交聯後的黏著劑)的凝膠分率。 After the aging was completed, the quality of the test sample attached to the polarizing plate was accurately measured, and after immersing in toluene for 24 hours, it was filtered through a metal mesh of 200 mesh. Then at 100 ° C After drying the filtrate for 1 hour, the mass of the residue was accurately measured, and the gel fraction of the adhesive layer (adhesive after crosslinking) was calculated from the following formula.

凝膠分率(%)=不溶物質量(g)/黏著劑質量(g)×100 Gel fraction (%) = insoluble mass (g) / adhesive mass (g) × 100

<黏著力> <adhesion>

以下述所測定之剝離強度作為黏著力:使用拉力試驗機以低速的剝離速度(0.3m/min)和高速的剝離速度(30m/min)朝180°方向剝離上述所獲得的測試樣品(在偏光板表面貼合寬度為25mm的表面保護膜的物質)並測定的剝離強度。 The peel strength measured as follows was used as the adhesive force: the test sample obtained above was peeled off in the 180° direction at a low speed peeling speed (0.3 m/min) and a high speed peeling speed (30 m/min) using a tensile tester (in polarized light) The surface of the board was bonded to a surface protective film having a width of 25 mm) and the peel strength measured was measured.

<表面電阻率> <surface resistivity>

老化後,在貼合於偏光板之前,剝離剝離膜(矽酮樹脂塗層之PET膜)露出黏著劑層,使用電阻率計Hiresta UP-HT450(Mitsubishi Chemical Analytech Co.,Ltd製)測定黏著劑層的表面電阻率。 After the aging, the release film (PET film of the fluorenone resin coating) was peeled off to expose the adhesive layer, and the adhesive was measured using a resistivity meter Hiresta UP-HT450 (manufactured by Mitsubishi Chemical Analytech Co., Ltd.). The surface resistivity of the layer.

<剝離帶電壓> <Peel strip voltage>

以30m/min的拉伸速度180°剝離上述所獲得的測試樣品時,使用高精密度靜電感測器SK-035、SK-200(KEYENCE CORPORATION製造)測定偏光板帶電產生的電壓(帶電壓),以測定值的最大值作為剝離帶電壓。 When the test sample obtained above was peeled off at a tensile speed of 180° at a tensile rate of 30 m/min, the voltage generated by the polarizing plate was charged using a high-precision electrostatic sensor SK-035, SK-200 (manufactured by KEYENCE CORPORATION). The maximum value of the measured value is taken as the peeling strip voltage.

<重工性> <Reworkability>

以圓珠筆(載重500g,往復3次)在上述所獲得的測試樣品的表面保護膜上描繪後,從偏光板剝離表面保護膜觀察偏光板表面,確認沒 有向偏光板轉移污染。評價目標基準為沒有向偏光板轉移污染的情況評價為「○」,確認沿著圓珠筆描繪的軌跡向至少一部分轉移污染的情況評價為「△」,確認沿著圓珠筆描繪的軌跡轉移污染、從黏著劑表面也有黏著劑脫離的情況評價為「×」。 After drawing on a surface protective film of the test sample obtained above with a ballpoint pen (loading weight: 500 g, reciprocating three times), the surface of the polarizing plate was observed from the polarizing plate peeling off the surface protective film, and it was confirmed that Contaminated polarizing plates transfer pollution. The evaluation target was evaluated as "○" when no contamination was transferred to the polarizing plate, and it was confirmed that the contamination was traced along at least a part of the trajectory drawn by the ballpoint pen as "△", and it was confirmed that the contamination was traced along the trajectory drawn by the ballpoint pen. The case where the adhesive was detached on the surface of the agent was evaluated as "x".

<耐久性> <Durability>

將上述得到的測試樣品在60℃、90%RH環境下放置250小時後,在室溫將其取出,進一步地放置12小時後,測定黏著力,確認與最初的黏著力相比較沒有明顯的增加。評價目標基準為試驗後的黏著力是最初黏著力的1.5倍以下的情況評價為「○」、超過1.5倍的情況評價為「×」。 The test sample obtained above was allowed to stand at 60 ° C and 90% RH for 250 hours, and then taken out at room temperature. After further standing for 12 hours, the adhesion was measured, and it was confirmed that there was no significant increase compared with the initial adhesion. . The evaluation target was evaluated as "○" when the adhesive strength after the test was 1.5 times or less of the initial adhesive force, and "x" when it was more than 1.5 times.

評價結果示於表3中。另外,表面電阻率係藉由將「m×10+n」設定為「mE+n」的方式(其中,m為任意的實數,n為正整數)標記。 The evaluation results are shown in Table 3. Further, the surface resistivity is marked by setting "m × 10 + n " to "mE + n" (where m is an arbitrary real number and n is a positive integer).

實施例1~9的表面保護膜在低速剝離速度0.3m/min下的黏著力是0.05~0.1N/25mm,在高速剝離速度30m/min下的黏著力是1.0N/25mm以下。而且,表面電阻率為5.0×10+10Ω/□以下,剝離帶電壓為±0~0.3kV。以圓珠筆透過上述黏著劑層於表面保護膜上描繪後,沒有向被黏物轉移污染,60℃、90%RH的環境下250小時放置時的耐久性也是優異的。 The surface protective films of Examples 1 to 9 had an adhesive force of 0.05 to 0.1 N/25 mm at a low-speed peeling speed of 0.3 m/min, and an adhesive strength of 1.0 N/25 mm or less at a high-speed peeling speed of 30 m/min. Further, the surface resistivity is 5.0 × 10 + 10 Ω / □ or less, and the peeling tape voltage is ± 0 to 0.3 kV. After the ballpoint pen was drawn on the surface protective film through the above-mentioned adhesive layer, it was not contaminated by the adherend, and was excellent in durability when placed in an environment of 60 ° C and 90% RH for 250 hours.

即,關於(1)取得低速剝離速度和高速剝離速度中的黏著力的平衡;(2)可防止黏著劑殘留的發生;(3)具有優異的抗靜電性能;及(4)具有重工性能,同時地亦滿足全部的要求性能。 That is, (1) achieving a balance between the low-speed peeling speed and the high-speed peeling speed; (2) preventing the occurrence of the adhesive residue; (3) having excellent antistatic properties; and (4) having rework performance, At the same time, it also meets all the required performance.

比較例1的表面保護膜似因不含(D)聚伸烷基二醇單(甲基)丙烯酸酯單體,而使低速剝離速度0.3m/min下的黏著力低,剝離帶電壓高,重工性也略差。 The surface protective film of Comparative Example 1 seems to contain no (D) polyalkylene glycol mono(meth)acrylate monomer, and the adhesion at a low-speed peeling speed of 0.3 m/min is low, and the peeling tape voltage is high. Heavy work is also slightly worse.

比較例2的表面保護膜中,似因(B)含有羥基的單體過少、(D)聚伸烷基二醇單(甲基)丙烯酸酯單體過少、(E)異氰酸酯化合物過多、(I)聚醚改質的矽氧烷化合物的HLB值過小,而使低速剝離速度0.3m/min下的黏著力和高速剝離速度30m/min下的黏著力變得過大、剝離帶電壓變高、重工性和耐久性變差、凝膠分率變低。 In the surface protective film of Comparative Example 2, it is considered that (B) the monomer having a hydroxyl group is too small, (D) the polyalkylene glycol mono(meth)acrylate monomer is too small, and (E) the isocyanate compound is excessive (I). The HLB value of the polyether-modified helioxane compound is too small, and the adhesion at a low-speed peeling speed of 0.3 m/min and the adhesive force at a high-speed peeling speed of 30 m/min become too large, the peeling strip voltage becomes high, and the rework The properties and durability are deteriorated, and the gel fraction is lowered.

比較例3的表面保護膜中,似因(B)含有羥基的單體過多、(C)含酸單體過多、(D)聚伸烷基二醇單(甲基)丙烯酸酯單體過多、(I)聚醚改質的矽氧烷化合物的HLB值過大,而使丙烯酸系聚合物的酸值高,低速剝離速度0.3m/min下的黏著力低、表面電阻率高、剝離帶電壓高、重工性和耐久性差。 In the surface protective film of Comparative Example 3, it is considered that (B) the monomer having a hydroxyl group is excessive, (C) the acid-containing monomer is excessive, and (D) the polyalkylene glycol mono(meth)acrylate monomer is excessively large. (I) The HLB value of the polyether-modified siloxane compound is too large, so that the acid value of the acrylic polymer is high, the adhesion at a low-speed peeling speed of 0.3 m/min is low, the surface resistivity is high, and the peeling band voltage is high. , heavy workability and poor durability.

比較例4的表面保護膜中,似因(C)含有酸的單體過少、不含(D)聚伸烷基二醇單(甲基)丙烯酸酯單體,而使低速剝離速度0.3m/min下的黏著力低,剝離帶電壓高,重工性和耐久性差。 In the surface protective film of Comparative Example 4, it was found that the (C) acid-containing monomer was too small, and the (D) polyalkylene glycol mono(meth)acrylate monomer was not contained, and the low-speed peeling speed was 0.3 m/ The adhesion at min is low, the stripping voltage is high, and the workability and durability are poor.

比較例5的表面保護膜中,似因(B)含有羥基的單體過多、(C)含酸的單體過多、(D)聚伸烷基二醇單(甲基)丙烯酸酯單體過少、(E)異氰酸酯化合物過少,而使丙烯酸系聚合物的酸值高,低速剝離速度0.3m/min下的黏著力和高速剝離速度30m/min下的黏著力變得過大、剝離帶電壓變高、重工性和耐久性變差、凝膠分率變低。 In the surface protective film of Comparative Example 5, it is considered that (B) the monomer having a hydroxyl group is excessive, (C) the acid-containing monomer is excessive, and (D) the polyalkylene glycol mono(meth)acrylate monomer is too small. (E) The isocyanate compound is too small, and the acid value of the acrylic polymer is high, and the adhesive force at a low-speed peeling speed of 0.3 m/min and the adhesive force at a high-speed peeling speed of 30 m/min become excessively large, and the peeling band voltage becomes high. The workability and durability are deteriorated, and the gel fraction is lowered.

比較例6的表面保護膜可能是似因未混合(F)交聯抑制劑,而使貯 存期過於變短,在塗布前進行交聯而無法進行塗覆。 The surface protective film of Comparative Example 6 may be a cause of unmixed (F) crosslinking inhibitor, so that the storage The shelf life is too short and cross-linking is not possible before coating.

比較例7的表面保護膜似因含有在(A)具有烷基的(甲基)丙烯酸酯單體中具有C1烷基的MA、(B)含有羥基的單體過多、不含(D)聚伸烷基二醇單(甲基)丙烯酸酯單體、未混合(G)交聯催化劑,而使低速剝離速度0.3m/min下的黏著力和高速剝離速度30m/min下的黏著力過大、表面電阻率高、剝離帶電壓高、重工性和耐久性差。 The surface protective film of Comparative Example 7 seems to contain MA having a C1 alkyl group in (A) a (meth) acrylate monomer having an alkyl group, (B) a monomer having a hydroxyl group, and no (D) poly The alkyl diol mono(meth) acrylate monomer and the unmixed (G) crosslinking catalyst have an adhesive force at a low-speed peeling speed of 0.3 m/min and an adhesive force at a high-speed peeling speed of 30 m/min, High surface resistivity, high strip voltage, poor workability and durability.

比較例8的表面保護膜中,似因(D)聚伸烷基二醇單(甲基)丙烯酸酯單體過多、未混合(I)聚醚改質的矽氧烷化合物,而使低速剝離速度0.3m/min下的黏著力和高速剝離速度30m/min下的黏著力過大、表面電阻率高、剝離帶電壓高、重工性差。 In the surface protective film of Comparative Example 8, the (D) polyalkylene glycol mono(meth)acrylate monomer was excessively mixed, and the (I) polyether modified naphthenic compound was not mixed, and the low-speed peeling was caused. The adhesion at a speed of 0.3 m/min and the high-speed peeling speed at 30 m/min are too high, the surface resistivity is high, the stripping voltage is high, and the reworkability is poor.

比較例9的表面保護膜中,似因不含(D)聚伸烷基二醇單(甲基)丙烯酸酯單體、(H)抗靜電劑的熔點未滿30℃(常溫下為液體)、(I)聚醚改質的矽氧烷化合物過多,而使低速剝離速度0.3m/min下的黏著力低、剝離帶電壓高、重工性略差、耐久性差。 In the surface protective film of Comparative Example 9, it is considered that the (D) polyalkylene glycol mono(meth)acrylate monomer and the (H) antistatic agent have a melting point of less than 30 ° C (liquid at normal temperature). (I) The polyether-modified polyoxane compound is too much, and the adhesion at a low-speed peeling speed of 0.3 m/min is low, the peeling tape voltage is high, the workability is slightly poor, and the durability is poor.

如此,在比較例1~9的表面保護膜中,無法同時地滿足(1)取得低速剝離速度和高速剝離速度中的黏著力的平衡;(2)防止黏著劑殘留的發生;(3)優異的抗靜電性能;及(4)重工性能等全部的要求性能。 As described above, in the surface protective films of Comparative Examples 1 to 9, it is impossible to simultaneously satisfy (1) the balance of the adhesive force at the low-speed peeling speed and the high-speed peeling speed; (2) prevention of the occurrence of the adhesive residue; (3) excellent Antistatic performance; and (4) heavy performance and other required performance.

Claims (12)

一種黏著劑組成物,係由含有(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體、(B)含有羥基的可共聚合單體、(C)含有羧基的可共聚合單體、及(D)聚伸烷基二醇單(甲基)丙烯酸酯單體的共聚物的丙烯酸系聚合物所構成,其進一步含有(E)3官能基以上的異氰酸酯化合物、(F)交聯抑制劑、(G)交聯催化劑、(H)抗靜電劑、(I)HLB值為7~12的聚醚改質的矽氧烷化合物,其中,上述丙烯酸系聚合物的酸值為0.01~8.0,上述(H)抗靜電劑為融點30~80℃且於溫度30℃呈固體並具有陽離子及陰離子之離子化合物。 An adhesive composition comprising (A) a (meth) acrylate monomer having an alkyl group having C4 to C10, (B) a copolymerizable monomer having a hydroxyl group, and (C) a carboxyl group; An acrylic polymer comprising a copolymer of a copolymerizable monomer and (D) a polyalkylene glycol mono(meth)acrylate monomer, further containing an (E) trifunctional or higher isocyanate compound, ( F) a crosslinking inhibitor, (G) a crosslinking catalyst, (H) an antistatic agent, (I) a polyether-modified oxirane compound having an HLB value of 7 to 12, wherein the acid of the above acrylic polymer The value is 0.01 to 8.0, and the above (H) antistatic agent is an ionic compound having a melting point of 30 to 80 ° C and a solid at a temperature of 30 ° C and having a cation and an anion. 如申請專利範圍第1項之黏著劑組成物,其中,上述(B)含有羥基的可共聚合單體為選自由(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸2-羥基乙酯、N-羥基(甲基)丙烯醯胺、N-羥甲基(甲基)丙烯醯胺、N-羥乙基(甲基)丙烯醯胺所構成的化合物群組中的至少一種以上,相對於100重量份的上述(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,含有0.1~5.0重量份的上述(B)含有羥基的可共聚合單體,且,上述(B)含有羥基的可共聚合單體中,(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸4-羥基丁酯的合計含有量為0~0.9重量份。 The adhesive composition of claim 1, wherein the (B) hydroxyl group-containing copolymerizable monomer is selected from the group consisting of 8-hydroxyoctyl (meth)acrylate and 6-hydroxyhexyl (meth)acrylate. Ester, 4-hydroxybutyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, N-hydroxy(meth)acrylamide, N-hydroxymethyl(meth)acrylamide, N- At least one or more of the group of compounds consisting of hydroxyethyl (meth) acrylamide, and the (meth) acrylate monomer having a C4 to C10 alkyl group having the above (A) alkyl group 0.1 to 5.0 parts by weight of the above (B) hydroxyl group-containing copolymerizable monomer, and (B) the hydroxyl group-containing copolymerizable monomer, (meth)acrylic acid 8-hydroxyoctyl ester, (A) The total content of 6-hydroxyhexyl acrylate and 4-hydroxybutyl (meth)acrylate is 0 to 0.9 parts by weight. 如申請專利範圍第1或2項之黏著劑組成物,其中,上述(C)含有羧基的可共聚合單體為選自由(甲基)丙烯酸、羧乙基(甲基)丙烯酸酯、羧戊基(甲基)丙烯酸酯、2-(甲基)丙烯醯氧基乙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基丙基六氫鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基鄰苯二甲酸、2-(甲基)丙烯醯氧基乙基琥珀酸、2-(甲基)丙烯醯氧基乙基 馬來酸、羧基聚己內酯單(甲基)丙烯酸酯、2-(甲基)丙烯醯氧基乙基四氫鄰苯二甲酸所構成的化合物群組中的至少一種以上,相對於100重量份的上述(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,含有0.35~1.0重量份的上述(C)含有羧基的可共聚合單體。 The adhesive composition according to claim 1 or 2, wherein the (C) carboxyl group-containing copolymerizable monomer is selected from the group consisting of (meth)acrylic acid, carboxyethyl (meth) acrylate, and carboxy pentane. (meth) acrylate, 2-(methyl) propylene methoxyethyl hexahydrophthalic acid, 2-(methyl) propylene methoxy propyl hexahydrophthalic acid, 2- (A) Acryloxyethyl phthalic acid, 2-(methyl) propylene methoxyethyl succinic acid, 2-(methyl) propylene methoxyethyl At least one or more of the group consisting of maleic acid, carboxypolycaprolactone mono(meth)acrylate, and 2-(meth)acryloxyethyltetrahydrophthalic acid, relative to 100 The (A) (C) alkyl group having a C4 to C10 alkyl group has a C4 to C10 content, and contains 0.35 to 1.0 part by weight of the above (C) carboxyl group-containing copolymerizable monomer. 如申請專利範圍第1或2項之黏著劑組成物,其中,上述(D)聚伸烷基二醇單(甲基)丙烯酸酯單體為選自聚伸烷基二醇單(甲基)丙烯酸酯、甲氧基聚伸烷基二醇(甲基)丙烯酸酯、乙氧基聚伸烷基二醇(甲基)丙烯酸酯中的至少一種以上;相對於100重量份的上述(A)烷基碳原子數為C4~C10的(甲基)丙烯酸酯單體,含有1~20重量份的上述(D)聚伸烷基二醇單(甲基)丙烯酸酯單體。 The adhesive composition according to claim 1 or 2, wherein the (D) polyalkylene glycol mono(meth)acrylate monomer is selected from the group consisting of polyalkylene glycol mono(methyl) At least one or more of an acrylate, a methoxy-polyalkylene glycol (meth) acrylate, and an ethoxy-polyalkylene glycol (meth) acrylate; and the above (A) with respect to 100 parts by weight The (meth) acrylate monomer having an alkyl group having a carbon number of C4 to C10 contains 1 to 20 parts by weight of the above (D) polyalkylene glycol mono(meth) acrylate monomer. 如申請專利範圍第1或2項之黏著劑組成物,其中,上述(E)3官能基以上的異氰酸酯化合物為選自由六亞甲基二異氰酸酯化合物的異氰脲酸酯體、異佛爾酮二異氰酸酯化合物的異氰脲酸酯體、六亞甲基二異氰酸酯化合物的加合物體、異佛爾酮二異氰酸酯化合物的加合物體、六亞甲基二異氰酸酯化合物的縮二脲體、異佛爾酮二異氰酸酯化合物的縮二脲體所構成的化合物群組中的至少一種以上;相對於100重量份的上述共聚物,含有0.5~5.0重量份的上述(E)3官能基以上的異氰酸酯化合物。 The adhesive composition according to claim 1 or 2, wherein the (E) trifunctional or higher isocyanate compound is an isocyanurate or isophorone selected from a hexamethylene diisocyanate compound. An isocyanurate body of a diisocyanate compound, an adduct body of a hexamethylene diisocyanate compound, an adduct of an isophorone diisocyanate compound, a biuret body of a hexamethylene diisocyanate compound, and a different Buddha At least one or more of the group consisting of biuret bodies of the ketone diisocyanate compound; and 0.5 to 5.0 parts by weight of the above (E) trifunctional or higher isocyanate compound per 100 parts by weight of the copolymer . 如申請專利範圍第1或2項之黏著劑組成物,其中,上述(H)抗靜電劑之上述陽離子為選自由吡啶嗡陽離子、咪唑鎓陽離子、嘧啶鎓陽離子、吡唑鎓陽離子、吡咯鎓陽離子、銨陽離子、磷鎓陽離子、硫鎓陽離子所構成群組之一種;上述陰離子為選自由六氟化磷酸根(PF6 -)、硫氰酸根(SCN-)、烷基苯磺酸根(RC6H4SO3 -)、高氯酸根(ClO4 -)、四氟化硼酸根(BF4 -)所構成群組之一種。 The adhesive composition of claim 1 or 2, wherein the cation of the (H) antistatic agent is selected from the group consisting of pyridinium cations, imidazolium cations, pyrimidine cations, pyrazolium cations, pyrrole cations One of the group consisting of ammonium cation, phosphonium cation, and sulfonium cation; the above anion is selected from the group consisting of hexafluorophosphate (PF 6 - ), thiocyanate (SCN - ), alkyl benzene sulfonate (RC 6 H 4 SO 3 - ), a group of perchlorate (ClO 4 - ), and tetrafluoroborate (BF 4 - ). 如申請專利範圍第1或2項之黏著劑組成物,其中,相對於100重量份的上述共聚物,含有0.01~0.5重量份的上述(I)HLB值為7~12的聚醚改質的矽氧烷化合物。 The adhesive composition according to claim 1 or 2, wherein 0.01 to 0.5 part by weight of the polyether modified by the above (I) HLB value of 7 to 12 is contained with respect to 100 parts by weight of the above copolymer. A siloxane compound. 如申請專利範圍第1或2項之黏著劑組成物,其中,上述(F)交聯抑制劑為酮烯醇互變異構性化合物,相對於100重量份的上述共聚物,含有1.0~5.0重量份的上述(F)交聯抑制劑;上述(G)交聯催化劑為有機錫化合物,相對於100重量份的上述共聚物,含有0.01~0.5重量份的上述(G)交聯催化劑。 The adhesive composition according to claim 1 or 2, wherein the (F) crosslinking inhibitor is a ketoenol tautomerizing compound, and contains 1.0 to 5.0 parts by weight based on 100 parts by weight of the copolymer. The above (F) crosslinking inhibitor; the (G) crosslinking catalyst is an organotin compound, and 0.01 to 0.5 part by weight of the above (G) crosslinking catalyst is contained per 100 parts by weight of the copolymer. 如申請專利範圍第1或2項之黏著劑組成物,其中,使上述黏著劑組成物交聯而成的黏著劑層在低速剝離速度0.3m/min下的黏著力為0.05~0.1N/25mm,在高速剝離速度30m/min下的黏著力為1.0N/25mm以下。 The adhesive composition according to claim 1 or 2, wherein the adhesive layer obtained by crosslinking the adhesive composition has an adhesive force at a low-speed peeling speed of 0.3 m/min of 0.05 to 0.1 N/25 mm. The adhesive force at a high-speed peeling speed of 30 m/min is 1.0 N/25 mm or less. 如申請專利範圍第1或2項之黏著劑組成物,其中,使上述黏著劑組成物交聯而成的黏著劑層的表面電阻率在5.0×10+10Ω/□以下,剝離帶電壓為±0~0.3kV。 The adhesive composition according to claim 1 or 2, wherein the adhesive layer obtained by crosslinking the adhesive composition has a surface resistivity of 5.0 × 10 + 10 Ω / □ or less, and the peeling strip voltage is ±0~0.3kV. 一種黏著薄膜,係在樹脂薄膜一面或兩面上形成有使申請專利範圍第1至10項中任一項之黏著劑組成物交聯而成之黏著劑層。 An adhesive film comprising an adhesive layer formed by crosslinking an adhesive composition according to any one of claims 1 to 10 on one or both sides of a resin film. 一種表面保護膜,係在樹脂薄膜一面上形成有使申請專利範圍第1至10項中任一項之黏著劑組成物交聯而成之黏著劑層。 A surface protective film in which an adhesive layer obtained by crosslinking an adhesive composition according to any one of claims 1 to 10 is formed on one surface of a resin film.
TW104111773A 2012-03-06 2013-01-28 Adhesive composition, adhesive film and surface protective film TWI570209B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012049489A JP5879160B2 (en) 2012-03-06 2012-03-06 Adhesive composition and surface protective film

Publications (2)

Publication Number Publication Date
TW201534679A true TW201534679A (en) 2015-09-16
TWI570209B TWI570209B (en) 2017-02-11

Family

ID=49130887

Family Applications (2)

Application Number Title Priority Date Filing Date
TW104111773A TWI570209B (en) 2012-03-06 2013-01-28 Adhesive composition, adhesive film and surface protective film
TW102103073A TWI485220B (en) 2012-03-06 2013-01-28 Adhesive composition, adhesive film and surface protective film

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW102103073A TWI485220B (en) 2012-03-06 2013-01-28 Adhesive composition, adhesive film and surface protective film

Country Status (4)

Country Link
JP (1) JP5879160B2 (en)
KR (1) KR101447087B1 (en)
CN (1) CN103305157B (en)
TW (2) TWI570209B (en)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6221091B2 (en) * 2012-11-16 2017-11-01 藤森工業株式会社 Surface protection film
JP6187896B2 (en) * 2012-11-16 2017-08-30 藤森工業株式会社 Adhesive layer, adhesive film and surface protective film
JP6393920B2 (en) * 2012-11-20 2018-09-26 藤森工業株式会社 Adhesive composition, adhesive film and surface protective film
JP6058390B2 (en) * 2012-12-27 2017-01-11 日本カーバイド工業株式会社 Adhesive composition and optical member surface protective film
JP6181958B2 (en) * 2013-03-28 2017-08-16 日東電工株式会社 Antistatic adhesive sheet and optical film
TWI568812B (en) * 2013-06-19 2017-02-01 Lg化學股份有限公司 Pressure-sensitive adhesive composition
KR101710443B1 (en) 2013-09-20 2017-02-27 후지모리 고교 가부시키가이샤 Adhesive composition and surface protection film
JP6113036B2 (en) * 2013-09-20 2017-04-12 藤森工業株式会社 Adhesive composition and surface protective film
JP5972845B2 (en) * 2013-09-20 2016-08-17 藤森工業株式会社 Adhesive composition and surface protective film
JP6393921B2 (en) * 2013-11-20 2018-09-26 藤森工業株式会社 Adhesive composition and surface protective film
JP5953289B2 (en) * 2013-11-29 2016-07-20 藤森工業株式会社 Adhesive composition and surface protective film
CN103788886B (en) * 2014-02-17 2015-11-18 广东可逸智膜科技有限公司 The antistatic acidproof protective membrane of OGS processing procedure
JP6222698B2 (en) * 2014-02-21 2017-11-01 藤森工業株式会社 Adhesive film and surface protective film
JP6246021B2 (en) * 2014-02-27 2017-12-13 日本カーバイド工業株式会社 Adhesive composition and optical member surface protective film
JP6246020B2 (en) * 2014-02-27 2017-12-13 日本カーバイド工業株式会社 Adhesive composition and optical member surface protective film
JP6905502B2 (en) * 2014-04-16 2021-07-21 日東電工株式会社 Adhesive sheet and optical member
JP6433143B2 (en) * 2014-04-16 2018-12-05 日東電工株式会社 Adhesive sheet and optical member
JP6248312B2 (en) * 2014-04-24 2017-12-20 藤森工業株式会社 Adhesive composition and surface protective film
JP6607663B2 (en) * 2014-05-30 2019-11-20 日東電工株式会社 Adhesive composition, adhesive sheet, and optical member
JP6342229B2 (en) * 2014-06-13 2018-06-13 日東電工株式会社 Adhesive composition, adhesive sheet, and optical member
JP6419467B2 (en) * 2014-06-27 2018-11-07 日東電工株式会社 Adhesive composition, adhesive sheet, and optical member
JP6483519B2 (en) * 2015-05-11 2019-03-13 藤森工業株式会社 Adhesive composition and surface protective film
JP6370742B2 (en) * 2015-06-04 2018-08-08 藤森工業株式会社 Adhesive composition and surface protective film
JP2017144608A (en) * 2016-02-16 2017-08-24 藤森工業株式会社 Surface protective film and optical component laminated with the same
TW201800539A (en) * 2016-02-29 2018-01-01 富士軟片股份有限公司 Temporary adhesive composition and laminate
JP6521896B2 (en) * 2016-04-25 2019-05-29 藤森工業株式会社 Pressure sensitive adhesive composition and antistatic surface protective film
JP6249572B2 (en) * 2016-07-12 2017-12-20 藤森工業株式会社 Adhesive composition and surface protective film
JP6738693B2 (en) * 2016-09-01 2020-08-12 日本カーバイド工業株式会社 Adhesive composition for protective film and protective film
KR101893558B1 (en) * 2017-02-03 2018-08-30 에스케이씨 주식회사 Polymerizable composition for plastic lens
JP6965788B2 (en) * 2017-03-02 2021-11-10 日油株式会社 A curable resin composition for a release sheet, a process base material using the same, and a method for protecting the base material.
JP6404973B2 (en) * 2017-03-13 2018-10-17 藤森工業株式会社 Adhesive composition and surface protective film
JP6368017B2 (en) * 2017-08-07 2018-08-01 藤森工業株式会社 Adhesive composition and surface protective film
JP7020606B2 (en) * 2017-08-10 2022-02-16 日本カーバイド工業株式会社 Adhesive composition for protective film and protective film
JP6460549B2 (en) * 2017-09-26 2019-01-30 藤森工業株式会社 Surface protection film
JP6799517B2 (en) * 2017-09-28 2020-12-16 藤森工業株式会社 Adhesive composition and surface protective film
KR102097142B1 (en) 2017-09-28 2020-04-03 닛토덴코 가부시키가이샤 Device with reinforcing film
JP6467548B1 (en) 2017-09-28 2019-02-13 日東電工株式会社 Reinforcement film
JP6431162B2 (en) * 2017-11-17 2018-11-28 藤森工業株式会社 Adhesive composition and surface protective film
KR102159513B1 (en) * 2017-12-15 2020-09-25 주식회사 엘지화학 Crosslinkable Composition
JP6635611B2 (en) * 2018-02-02 2020-01-29 藤森工業株式会社 Surface protection film
JP6636556B2 (en) * 2018-03-16 2020-01-29 日東電工株式会社 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheet, and optical member
JP6559283B2 (en) * 2018-03-27 2019-08-14 藤森工業株式会社 Adhesive composition and surface protective film
KR102294139B1 (en) * 2018-04-25 2021-08-26 산진 옵토일렉트로닉스 (쑤저우) 컴퍼니 리미티드 Crosslinkable Composition
KR102236532B1 (en) * 2018-04-25 2021-04-06 주식회사 엘지화학 Crosslinkable Composition
JP6580759B2 (en) * 2018-07-03 2019-09-25 藤森工業株式会社 Surface protection film
JP6691176B2 (en) * 2018-07-10 2020-04-28 藤森工業株式会社 Adhesive composition and surface protection film
JP6619071B2 (en) * 2018-09-12 2019-12-11 藤森工業株式会社 Adhesive composition and surface protective film
JP6945609B2 (en) * 2018-09-12 2021-10-06 藤森工業株式会社 Surface protective film
JP6995033B2 (en) * 2018-09-27 2022-01-14 日東電工株式会社 Reinforcing film
JP7152234B2 (en) * 2018-09-27 2022-10-12 藤森工業株式会社 Adhesive composition, and adhesive film and surface protective film using the same
CN109355029A (en) * 2018-09-28 2019-02-19 苏州泰仑电子材料有限公司 Dedicated scratch resistant, antistatic acrylic protective film of polaroid and preparation method thereof
JP6698133B2 (en) * 2018-10-10 2020-05-27 日東電工株式会社 Adhesive composition, adhesive sheet, and optical member
JP6705878B2 (en) * 2018-11-01 2020-06-03 藤森工業株式会社 Surface protection film
JP2020083955A (en) * 2018-11-19 2020-06-04 日本カーバイド工業株式会社 Adhesive composition for acrylic substrate protection film and acrylic substrate protection film
JP6744385B2 (en) * 2018-12-20 2020-08-19 藤森工業株式会社 Surface protection film
JP6821739B2 (en) * 2019-04-22 2021-01-27 藤森工業株式会社 Adhesive composition and antistatic surface protective film
JP6983959B2 (en) * 2019-08-27 2021-12-17 藤森工業株式会社 Surface protective film
JP6744466B2 (en) * 2019-08-27 2020-08-19 藤森工業株式会社 Surface protection film
JP2021050266A (en) * 2019-09-24 2021-04-01 積水化学工業株式会社 Adhesive tape
JP7282135B2 (en) * 2019-11-12 2023-05-26 藤森工業株式会社 surface protection film
JP2022548755A (en) * 2020-03-25 2022-11-21 エルジー・ケム・リミテッド Adhesive composition for protective film, adhesive containing the same, and adhesive sheet using the same
KR20210119664A (en) * 2020-03-25 2021-10-06 주식회사 엘지화학 Adhesive composition for protective film, adhesive including the same and adhesive sheet using the same
JP6994070B2 (en) * 2020-04-08 2022-01-14 藤森工業株式会社 Adhesive layer, adhesive film and surface protective film
JP7321240B2 (en) * 2020-04-08 2023-08-04 藤森工業株式会社 adhesive film
JP7005685B2 (en) * 2020-05-13 2022-01-21 藤森工業株式会社 Surface protective film
JP7242914B2 (en) * 2020-05-13 2023-03-20 藤森工業株式会社 Adhesive composition, adhesive film and surface protective film
JP7041210B2 (en) * 2020-07-29 2022-03-23 藤森工業株式会社 Surface protection film
JP7239751B2 (en) * 2020-11-19 2023-03-14 藤森工業株式会社 Adhesive composition, adhesive film, surface protective film and optical film with adhesive layer
JP7090755B2 (en) * 2021-01-05 2022-06-24 藤森工業株式会社 Adhesive composition and antistatic surface protective film

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003073638A (en) * 2001-08-31 2003-03-12 Nippon Synthetic Chem Ind Co Ltd:The Self-adhesive composition
JP4776272B2 (en) * 2004-05-20 2011-09-21 サイデン化学株式会社 Polymer composition for pressure-sensitive adhesive, pressure-sensitive adhesive composition for surface protective film, and surface protective film
DE102004044086A1 (en) * 2004-09-09 2006-03-16 Tesa Ag Thermally crosslinked acrylate hotmelts
JP4917267B2 (en) * 2004-09-16 2012-04-18 日東電工株式会社 Adhesive composition, adhesive sheet, and surface protective film
TWI266902B (en) * 2005-01-19 2006-11-21 Lg Chemical Ltd Filter for plasma display panel with good re-workability and plasma display panel comprising the same
JP2008069202A (en) * 2006-09-12 2008-03-27 Nippon Carbide Ind Co Inc Pressure-sensitive adhesive composition for optical member surface protective film and optical member surface protective film
JP4942171B2 (en) * 2006-09-14 2012-05-30 綜研化学株式会社 Adhesive composition and adhesive sheet
JP2009058859A (en) * 2007-09-03 2009-03-19 Sumitomo Chemical Co Ltd Optical film with pressure-sensitive adhesive and optical laminate
JP2009091406A (en) * 2007-10-04 2009-04-30 Nippon Carbide Ind Co Inc Pressure-sensitive adhesive composition and surface protection film
JP5354673B2 (en) * 2008-08-11 2013-11-27 住友化学株式会社 Optical film with adhesive and optical laminate using the same
JP5611527B2 (en) * 2009-01-08 2014-10-22 日本カーバイド工業株式会社 Adhesive and optical film
JP5580069B2 (en) * 2009-02-26 2014-08-27 日東電工株式会社 Adhesive composition for surface protective film and use thereof
JP5623020B2 (en) * 2009-02-27 2014-11-12 日東電工株式会社 Adhesive composition, adhesive layer, and adhesive sheet
JP5187973B2 (en) * 2009-04-30 2013-04-24 日東電工株式会社 Optical film adhesive composition, optical film adhesive layer, adhesive optical film, and image display device
WO2010143643A1 (en) * 2009-06-09 2010-12-16 日本合成化学工業株式会社 Pressure-sensitive adhesive composition, pressure-sensitive adhesive, pressure-sensitive adhesive for optical member, and optical member with pressure-sensitive adhesive layer obtained using same
JP5544800B2 (en) * 2009-09-17 2014-07-09 サイデン化学株式会社 Surface protection film
JP5737763B2 (en) * 2010-03-31 2015-06-17 リンテック株式会社 Adhesive sheet
CN102858872B (en) * 2010-04-27 2016-06-29 日本合成化学工业株式会社 Acrylic resin solution, adhesive composition, binding agent, bonding sheet, optical component with adhesive phase
JP5906064B2 (en) * 2011-11-21 2016-04-20 藤森工業株式会社 Adhesive composition and surface protective film
JP5877092B2 (en) * 2012-03-06 2016-03-02 藤森工業株式会社 Adhesive composition and surface protective film

Also Published As

Publication number Publication date
CN103305157A (en) 2013-09-18
CN103305157B (en) 2016-08-03
JP2013185007A (en) 2013-09-19
TWI485220B (en) 2015-05-21
TWI570209B (en) 2017-02-11
TW201339270A (en) 2013-10-01
KR20130101987A (en) 2013-09-16
KR101447087B1 (en) 2014-10-06
JP5879160B2 (en) 2016-03-08

Similar Documents

Publication Publication Date Title
TWI570209B (en) Adhesive composition, adhesive film and surface protective film
TWI491697B (en) Adhesive composition and surface protection film
TWI544048B (en) Adhesive composition and surface protective film
TWI495699B (en) Adhesive composition and surface-protective adhesive film
TWI545167B (en) Adhesive composition, adhesive film and surface protective film
TWI557199B (en) Adhesive composition, adhesive film, and surface-protective adhesive film
TW201425519A (en) Adhesive composition, adhesive film, and surface-protective adhesive film
TW201710434A (en) Surface-protective film for polarizing plate
TW201708476A (en) Adhesive composition, adhesive film, and surface-protective adhesive film
JP2018138666A (en) Adhesive composition, adhesive film, and surface protective film
JP6219482B2 (en) Adhesive composition and surface protective film
JP6039118B2 (en) Adhesive composition and surface protective film
JP2015091988A (en) Adhesive agent composition and surface protective film
JP6460549B2 (en) Surface protection film
JP6744385B2 (en) Surface protection film
JP2020079399A (en) Surface protective film
JP2019196501A (en) Surface protective film
JP7416893B2 (en) surface protection film
JP6734335B2 (en) Surface protection film
JP2020180299A (en) Surface protective film
JP2020117727A (en) Surface protective film
JP2018044170A (en) Surface protective film
JP2017014515A (en) Surface protective film