TW201534391A - Reaction method and apparatus - Google Patents

Abstract

A reaction method and an apparatus are presented by containing a conductive supercritical fluid in a closeness chamber. With the energizing effect, the conductive supercritical fluid can become a charged supercritical fluid. In conjunction with an illumination unit to timely introduce ultraviolet light or laser light, or introduction of a chemical reaction gas may generate three effects: (1) with the charged supercritical fluid, the material's surface or internal impurities are dissolved and removed, so that the material is optimized; (2) the closeness chamber can also be used as a gas phase chemical reaction chamber, so that the polymerization of polymers or the chemical vapor deposition can be performed at low temperatures; and (3) with the irradiation of ultraviolet light or laser light, the material's maturation, purification and optimization processes can be carried out at low temperatures to shorten the reaction time and increase the degree of uniformity.

Description

Reaction method and device

The invention relates to a processing device for a material, in particular to a material which can be accelerated aging, purification or optimization at a low temperature, and can also be used for high molecular polymer or chemical vapor deposition (CVD). A method and apparatus for carrying out a reaction under low temperature conditions.

In recent years, due to the booming development of the electronics industry and the popularity of mobile devices, the continuous development of semiconductor technology has become an indispensable fact and has become an indispensable role, and most of the existing semiconductor products are processed and manufactured. Physical vapor deposition (PVD), arc physical vapor deposition (PVD), or chemical vapor deposition (CVD) deposition methods deposit a thin film on a substrate, using Lithography and etching ( The Etching technique transfers the pattern to be formed onto the substrate and stacks the desired three-dimensional structure. However, since the glass transition temperature of all flexible substrates is very low, in the future, the wave of soft substrates will inevitably encounter the test of layers, and it must be developed to enable the substrate to be under low temperature conditions (<100 ° C). A low temperature chemical reaction chamber for depositing high quality films.

In addition, all products made by injection molding are still after molding. The curing step needs to be applied to make the bonding more complete. The conventional method is to statically place the product in an oven (Oven) and promote the curing by blowing the fan, but the disadvantage is that the curing time is long, and Poor uniformity.

Furthermore, all current chemical reactions involve placing a chemical involved in the reaction in a solution and adding a catalyst to increase the temperature of the reaction chamber to accelerate the rate of chemical reaction. However, this type of chemical reaction is in a liquid solvent, and the chemical involved in the reaction The molecules must meet (collision) to react, and the reaction process that requires chemical equilibrium is difficult, so it is difficult to completely complete the chemical reaction in a short time. Moreover, the separation solvent needs to be applied after the chemical reaction is over. It is necessary to develop a set of techniques for replacing traditional chemical reactions in a new gaseous reaction chamber, and the process of purification is equivalent to the time of the conventional chemical reaction.

Accordingly, it is an object of the present invention to provide a reaction apparatus which enables accelerated aging, purification or optimization of a material at a low temperature, and which enables polymerization of a polymer or chemical vapor deposition at a low temperature.

Another object of the present invention is to provide a reaction process which enables simultaneous decontamination and ripening, purification or optimization of materials under low temperature conditions.

It is still another object of the present invention to provide a method of illuminating, purifying or optimizing a reaction with a luminescent light (ultraviolet light or laser light) during the action of a conductive supercritical fluid, and shortening the curing time and A reaction device that increases the uniformity.

A further object of the present invention is to provide a reaction method capable of reacting with a chemical reaction gas in the action of a conductive supercritical fluid so that a polymer or chemical vapor deposition can be carried out at a low temperature.

Thus, the reaction apparatus of the present invention comprises a body unit, a fluid supply unit, a supercritical catalytic unit, a power supply unit, and an electrode unit. The body unit includes a housing and a cover detachably disposed on the housing, the housing and the cover together define a closed chamber. The fluid supply unit is configured to input a predetermined amount of electrically conductive working fluid into the closed chamber. The supercritical catalytic unit is disposed on the body unit and is configured to apply heating and pressurization to the electrically conductive working fluid in the sealed chamber, so that the electrically conductive working fluid in the closed chamber becomes a conductive supercritical fluid . The power supply unit is disposed outside the body unit for supplying power required for operation, and the power supply unit has a positive pole and a negative pole. The electrode unit is disposed in the housing and includes a positive electrode member and a negative electrode member. The positive electrode member and the negative electrode member are respectively electrically connected to the positive electrode and the negative electrode of the power supply unit, and the positive electrode member is used for carrying a material to be matured, wherein the electrically conductive supercritical fluid becomes a charged supercritical fluid by energization of the positive electrode member and the negative electrode member, thereby extracting the impurity atoms from the material to be matured, and accelerating the ripening reaction and Structural purification or reforming.

Further, the fluid supply unit of the reaction apparatus of the present invention may be further configured to input a predetermined amount of chemical reaction gas into the closed chamber. And the positive electrode member of the electrode unit is usable to carry a material to be processed, The energization of the positive electrode member and the negative electrode member causes the electrically conductive supercritical fluid to become a charged supercritical fluid, thereby performing impurity atom extraction and structural purification or reforming of the material to be treated, and chemical reaction. The gas will form a plating layer on the surface of the material to be treated.

In another aspect, the reaction method of the present invention comprises a preparation step, a conductive supercritical fluid action step, and a material optimization step.

In the preparation step, a sealed chamber is disposed, and a positive electrode member and a negative electrode member are disposed inside the sealed chamber, and the positive electrode member and the negative electrode member are respectively connected to one positive electrode and one power supply unit The negative electrode is electrically connected, and a material to be aged is placed on the positive electrode member.

In the conductive supercritical fluid action step, the sealed chamber is filled with a predetermined amount of a conductive supercritical fluid, and the surface of the material to be cured or internal impurities is dissolved by the conductive supercritical fluid.

In the material optimization step, the power supply unit is powered to electrically energize the positive electrode member and the negative electrode member, so that the conductive supercritical fluid becomes a charged supercritical fluid, thereby performing impurities on the material to be matured. Atom extraction, accelerated ripening reaction and structural purification or reforming.

Furthermore, in the reactive supercritical fluid action step of the reaction method of the present invention, the sealed chamber may be filled with a predetermined amount of conductive supercritical fluid, and a chemical reaction gas may be introduced into the closed chamber. The electrically conductive supercritical fluid dissolves the surface or internal impurities of the material to be treated. Further, in the material optimization step, when the positive electrode member and the negative electrode member are energized, the conductive supercritical fluid becomes a charged supercritical fluid, and the impurity to be removed and structurally purified or heavy whole When it acts, the chemical reaction gas forms a plating layer on the surface of the material to be treated.

The effect of the present invention is to dissolve the surface or internal impurities of the material to be cured or the material to be treated by the electrically conductive supercritical fluid while utilizing the energization of the positive electrode member and the negative electrode member to make the charged super The critical fluid can dissolve and remove the surface or internal impurities of the material to be cured or the material to be treated, so that the material to be cooked or the material to be treated is purified and optimized. In addition, by simultaneously inputting the chemical reaction gas, the maturation process of the material to be aged or the material to be treated can be performed under low temperature conditions, shortening the reaction time and increasing the uniformity. In addition, the closed chamber can also be used as a gas phase chemical reaction chamber, and polymerization can be carried out under high temperature conditions by polymer polymerization or chemical vapor deposition.

2‧‧‧Reaction device

21‧‧‧ Body unit

211‧‧‧Shell

212‧‧‧ Cover

213‧‧‧Closed chamber

22‧‧‧Fluid supply unit

221‧‧‧Electrically conductive working fluid supply

222‧‧‧Chemical reaction gas supply

23‧‧‧Supercritical Catalytic Unit

231‧‧‧heater

232‧‧‧ pressurizer

24‧‧‧Power supply unit

241‧‧‧ positive

242‧‧‧negative

25‧‧‧Electrode unit

251‧‧‧ positive electrode parts

252‧‧‧Negative electrode parts

26‧‧‧Lighting unit

31‧‧‧Materials to be matured

32‧‧‧Materials to be processed

41‧‧‧Preparation steps

42‧‧‧ Conductive supercritical fluid action steps

43‧‧‧Material optimization steps

Other features and advantages of the present invention will be apparent from the embodiments of the present invention, wherein: FIG. 1 is a schematic diagram illustrating a first preferred embodiment of the reaction apparatus of the present invention; FIG. 2 is a flow chart. A first preferred embodiment of the reaction method of the present invention is illustrated; FIG. 3 is a schematic view showing a second preferred embodiment of the reaction apparatus of the present invention; and FIG. 4 is a schematic view showing a third preferred embodiment of the reaction apparatus of the present invention. And Figure 5 is a schematic diagram to aid in the description of Figure 4.

Referring to FIG. 1, a first preferred embodiment of a reaction device 2 of the present invention comprises a body unit 21, a fluid supply unit 22, a supercritical catalytic unit 23, a power supply unit 24, and an electrode unit 25.

The main body unit 21 includes a housing 211 and a cover 212 detachably disposed on the housing 211. The cover 212 is disposed behind the housing 211, and together define a closed chamber. 213.

The fluid supply unit 22 is configured to hold the sealed chamber 213 with a predetermined amount of electrically conductive working fluid (not shown). The electrically conductive working fluid is selected from the group consisting of water, a combination of carbon dioxide and water, and a combination of carbon dioxide and methanol. In the preferred embodiment, water is used for illustration.

The supercritical catalytic unit 23 includes a heater 231 disposed on the body unit 21 for heating the electrically conductive working fluid in the sealed chamber 213, and a heater 231 disposed on the body unit 21 for use in the sealed chamber The pressurizing device 232 of the electrically conductive working fluid in the chamber 213 is pressurized, and the conductive working fluid in the closed chamber 213 is activated by starting the heating of the heater 231 and the pressurization of the pressurizing device 232. Become a conductive supercritical fluid.

The power supply unit 24 is a DC power source and has a positive pole and a negative pole. The power supply unit 24 is disposed outside the body unit 21 to supply power required for operation.

The electrode unit 25 is disposed in the housing 211 and includes a positive electrode member 251 and a negative electrode member 252. The positive electrode member 251 and the negative electrode member 252 are electrically connected to the positive electrode 241 and the negative electrode 242 of the power supply unit 24, respectively. .

Referring to Figures 1 and 2, a first preferred embodiment of the reaction method of the present invention comprises a preparation step 41, an electrically conductive supercritical fluid action step 42, and a material optimization step 43. In the preparation step 41, a reaction device 2 as described above is disposed, and a material to be cooked 31 is placed on the positive electrode member 251, and the cover 212 is placed on the housing 211, and The sealed chamber 213 is evacuated.

Next, in the conductive supercritical fluid action step 42, the fluid supply unit 22 is used to input the conductive working fluid into the sealed chamber 213, and it is confirmed that the conductive working fluid in the closed chamber 213 has reached the predetermined time. After the amount, the electrically conductive working fluid in the sealed chamber 213 becomes the electrically conductive supercritical fluid by adjusting the heating temperature of the heater 231 and the pressure applied by the pressurizer 232. Since the electrically conductive supercritical fluid has an extremely high dissolving power, the surface or internal impurities of the material to be matured 31 can be dissolved.

Then, the material optimization step 43 is performed, and the power supply unit 24 supplies power, so that the positive electrode member 251 and the negative electrode member 252 of the electrode unit 25 are energized. At this time, the positive electrode member 252 serves as a sacrificial anode to treat the mature material 31 with impurities. Atom pull-off. After the preset execution time expires, the cover 212 is opened again, and the material to be matured 31 is taken out.

In particular, the material to be aged 31 refers to a material that needs to undergo a ripening reaction process. For example, after polyurethane (Polyurethane, PU), it needs to be left to cool for a period of time after the injection molding operation, so as to carry out the ripening reaction process. The structure matures and tends to be stable. Therefore, through the implementation of the method of the present invention, not only the material to be aged 31 can be pulled out from the front work (such as injection). The impurity atoms remaining in the molding operation and the like, and the impurity atoms are removed, and the structure of the material to be matured 31 can be purified or reformed, so that the material to be matured 31 is purified, optimized, and the reaction time, uniformity, and density are shortened. The degree will also increase.

Referring to FIG. 3, a second preferred embodiment of the reaction device 2 of the present invention, the preferred embodiment is substantially the same as the first preferred embodiment of the reaction device 2, and the difference is that the casing may be further disposed on the casing. The illumination unit 26 for irradiating the material to be matured 31 with light is provided in the body 211. The light output by the illumination unit 26 is selected from ultraviolet light (i.e., UV light) or laser light.

2 and 3, a second preferred embodiment of the present invention, the preferred embodiment is substantially the same as the first preferred embodiment of the foregoing method, and the difference is that in the preparation step 41, It is provided as shown in the second preferred embodiment of the reaction device 2. In the material optimization step 43, the illuminating unit 31 can be simultaneously irradiated with light by the illuminating unit 26 disposed in the sealed chamber 213, and the aging reaction of the material to be matured 31 can be induced and accelerated. Shorten the ripening reaction time.

Referring to FIG. 4, a third preferred embodiment of the reaction device 2 of the present invention, the preferred embodiment is substantially the same as the first preferred embodiment of the reaction device 2, except that the fluid supply unit 22 includes a An electrically conductive working fluid supply source 221 for supplying the electrically conductive working fluid, and a chemical reaction gas supply source 222 for supplying the chemical reaction gas. A predetermined amount of the conductive working fluid and the chemical reaction gas are respectively respectively supplied by the conductive working fluid supply source 221 and the chemical reaction gas supply source 222 The body is input into the closed chamber 213. The subsequent operations are detailed below.

2 and 4, a third preferred embodiment of the present invention, the preferred embodiment is substantially the same as the first preferred embodiment of the foregoing method, and the difference is that in the preparation step 41, It is provided as shown in the third preferred embodiment of the reaction device 2, and a material to be treated 32 is placed on the positive electrode member 251. The material to be treated 32 is described in the form of a substrate, but should not This is limited to this. In the conductive supercritical fluid action step 42 , a predetermined amount of the conductive working fluid and the chemical reaction gas are respectively input into the sealed chamber 213 by using the conductive working fluid supply source 221 and the chemical reaction gas supply source 222 . The electrically conductive supercritical fluid dissolves surface or internal impurities of the material to be treated. In the material optimization step 43, the positive electrode member 251 and the negative electrode member 252 are energized by the power supply unit 24, so that the electrically conductive supercritical fluid becomes a charged supercritical fluid, and the The processing material 32 performs impurity atom detachment, and at the same time, the high pressure condition implemented in the process of catalyzing the charged supercritical fluid into the charged supercritical fluid also rearranges the atoms of the material to be treated 32 to perform the structure. The aging, purification or reforming action, at this time, the chemical reaction gas uniformly forms a plating layer (not shown) uniformly on the surface of the material to be treated 32 by thin film deposition.

The reaction device 2 of the present embodiment may also include an illumination unit 26 disposed in the housing 211 for illuminating the material to be treated 32. The light output by the illumination unit 26 is selected from the group consisting of ultraviolet light or thunder. Shoot light. In the material optimization step 43 , the positive electrode member 251 and the negative electrode member 252 are energized and the illumination sheet is matched. The material 26 is irradiated with ultraviolet light or laser light to form the chemical reaction gas on the surface of the material to be treated 32 to form the plating layer (not shown), and accelerates the aging of the material to be treated 32. Purification or optimization of the reaction effectively shortens the reaction time.

Specifically, as shown in FIG. 5, the material to be treated 32 may also be in the form of a chemical reaction tank, but it should not be limited thereto. After the operation of the preferred embodiment, the plating layer (not shown) can be deposited on the inner and outer surfaces of the material to be treated 32, so that the material to be treated 32 can be used for a specific chemical reaction. Required.

Therefore, by the above-described reaction method of the present invention and the design thereof, not only the material to be aged 31 can be structurally reformed at a low temperature to rapidly perform the aging process, or the material to be treated 32 can still be subjected to a low temperature condition. After the optimization process, the material after structural purification or reforming can be transformed from amorphous to polycrystalline or single crystal material, or polycrystal-line. Conversion into a single crystal material because the reaction device 2 can still increase the atomic or molecular regularity region of the material to be treated 32 at a low temperature, that is, the original atom or molecule of the material to be treated 32 A grain of grain that is aligned and inconsistent is corrected, except that the heterogeneous atoms of the grain boundary are extracted to the negative electrode by a sacrificial anode effect similar to the electroplating process, and the atoms are rearranged under sufficient energy to cause a possession cycle. The region of the sexual arrangement can be expanded and enlarged, and in addition, the entire surface of the material to be aged 31 or the material to be treated 32 becomes flat.

In summary, the reaction method and apparatus of the present invention are described by The conductive supercritical fluid dissolves the surface or internal impurities of the material to be cured 31 or the material to be treated 32, and simultaneously energizes the positive electrode member 251 and the negative electrode member 252, and whether the illumination unit 26 introduces ultraviolet light or laser light. A different reaction occurs: when no ultraviolet light or laser light is introduced, the positive electrode member 251 acts as a sacrificial anode to perform impurity atom extraction on the material to be matured 31 or the material to be treated 32, so that the material to be matured 31 or The material to be treated 32 is matured or purified or optimized. In addition, when ultraviolet light or laser light is introduced, the material to be aged 31 or the material to be treated 32 may be subjected to low-temperature curing between the positive electrode member 251 and the negative electrode member 252, so that the ripening reaction time can be shortened. And the uniformity increases. In addition, the sealed chamber 213 can also be used as a gas phase chemical reaction chamber to allow a polymer or chemical vapor deposition to react at a low temperature. Therefore, the object of the present invention can be achieved.

The above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, that is, the simple equivalent changes and modifications made by the patent application scope and patent specification content of the present invention, All remain within the scope of the invention patent.

2‧‧‧Reaction device

21‧‧‧ Body unit

211‧‧‧Shell

212‧‧‧ Cover

213‧‧‧Closed chamber

22‧‧‧Fluid supply unit

23‧‧‧Supercritical Catalytic Unit

231‧‧‧heater

232‧‧‧ pressurizer

24‧‧‧Power supply unit

241‧‧‧ positive

242‧‧‧negative

25‧‧‧Electrode unit

251‧‧‧ positive electrode parts

252‧‧‧Negative electrode parts

26‧‧‧Lighting unit

32‧‧‧Materials to be processed

Claims (10)

A reaction device comprising: a body unit, comprising a casing, and a cover detachably disposed on the casing, the casing and the cover body together define a closed chamber; a fluid supply unit a predetermined amount of electrically conductive working fluid is introduced into the closed chamber; a supercritical catalytic unit is disposed on the body unit for applying heat and pressure to the electrically conductive working fluid in the closed chamber The electrically conductive working fluid in the closed chamber is made into a conductive supercritical fluid; a power supply unit is disposed outside the body unit for supplying power required for operation, the power supply unit having a positive pole and a negative pole; An electrode unit is disposed in the housing and includes a positive electrode member and a negative electrode member. The positive electrode member and the negative electrode member are respectively electrically connected to the positive electrode and the negative electrode of the power supply unit, and the positive electrode member is used for Carrying a material to be matured, and energizing the positive electrode member and the negative electrode member to make the electrically conductive supercritical fluid become a charged supercritical fluid, thereby further Impurity atoms pulled out from, or purified reforming action to accelerate the reaction and aging structure. The reaction device of claim 1, further comprising an illumination unit disposed in the housing for illuminating the material to be cured to accelerate the curing of the material to be cured, wherein the light output by the illumination unit is selected from the group consisting of Ultraviolet light or laser light. The reaction device of claim 2, wherein the electrically conductive working fluid is one selected from the group consisting of water, a combination of carbon dioxide and water, a combination of carbon dioxide and methanol; in addition, the supercritical catalytic unit comprises a a heater disposed on the body unit for heating the electrically conductive working fluid in the sealed chamber, and a heater disposed on the body unit for pressurizing the electrically conductive working fluid in the sealed chamber The pressurizer for action. A reaction device comprising: a body unit, comprising a casing, and a cover detachably disposed on the casing, the casing and the cover body together define a closed chamber; a fluid supply unit And a predetermined amount of the electrically conductive working fluid and the chemical reaction gas are input into the sealed chamber; a supercritical catalytic unit is disposed on the body unit and configured to heat the electrically conductive working fluid in the sealed chamber And pressing, the electrically conductive working fluid in the sealed chamber becomes a conductive supercritical fluid; a power supply unit is disposed outside the body unit for supplying power required for operation, the power supply unit having a positive pole and a negative electrode; and an electrode unit disposed in the housing and including a positive electrode member and a negative electrode member, wherein the positive electrode member and the negative electrode member are electrically connected to the positive electrode and the negative electrode of the power supply unit, respectively. The electrode member is used to carry a material to be treated, and the conductive electrode and the negative electrode member are energized to make the conductive supercritical fluid into a charged supercritical fluid. The material to be treated is subjected to impurity atom extraction and structural purification or reforming, and a chemical reaction gas forms a plating layer on the surface of the material to be treated. The reaction device of claim 4, wherein the fluid supply unit comprises an electrically conductive working fluid supply source for supplying the electrically conductive working fluid, and a chemical reaction gas for supplying the chemical reaction gas. In addition, the electrically conductive working fluid is selected from one of the group consisting of water, a combination of carbon dioxide and water, and a combination of carbon dioxide and methanol. The reaction device of claim 5, further comprising an illumination unit disposed in the housing for illuminating the material to be matured to accelerate the aging, and the light output by the illumination unit is selected from the group consisting of ultraviolet light or thunder. Shoot light. A reaction method includes: a preparation step of preparing a sealed chamber, and providing a positive electrode member and a negative electrode member inside the sealed chamber, the positive electrode member and the negative electrode member respectively being connected to one of the power supply units The positive electrode is electrically connected to a negative electrode, and a material to be matured is placed on the positive electrode member; and a conductive supercritical fluid is applied to the chamber to contain a predetermined amount of conductive supercritical fluid, The conductive supercritical fluid dissolves the surface or internal impurities of the material to be matured; and a material optimization step of supplying power to the power supply unit to energize the positive electrode member and the negative electrode member, so that the conductive supercritical fluid becomes a belt Charge supercritical fluid, and then impurity to the material to be matured Atom extraction, accelerated ripening reaction and structural purification or reforming. The reaction method of claim 7, wherein in the material optimization step, the light-receiving unit disposed in the sealed chamber can simultaneously irradiate the material to be matured to accelerate the structural purification of the material to be matured. Or reforming, the light output by the illumination unit is selected from ultraviolet light or laser light; in addition, the conductive working fluid is selected from one of the following: water, a combination of carbon dioxide and water, carbon dioxide and methanol. combination. A reaction method includes: a preparation step of preparing a sealed chamber, and providing a positive electrode member and a negative electrode member inside the sealed chamber, the positive electrode member and the negative electrode member respectively being connected to one of the power supply units The positive electrode is electrically connected to a negative electrode, and a material to be treated is placed on the positive electrode member; a conductive supercritical fluid is applied to the chamber to hold a predetermined amount of the conductive supercritical fluid, and a chemical is The reaction gas is introduced into the sealed chamber, and the surface of the material to be treated is dissolved by the conductive supercritical fluid; and a material optimization step is performed by the power supply unit to make the positive electrode member and the negative electrode member The electric current is made to make the electrically conductive supercritical fluid into a charged supercritical fluid, thereby performing impurity atom extraction and structural purification or reforming on the material to be treated, and the chemical reaction gas forms a surface on the surface of the material to be treated. Plating layer. The reaction method of claim 9, wherein in the material optimization step, the illumination unit disposed in the sealed chamber can simultaneously The material to be treated illuminates light to accelerate structural purification or reforming of the material to be treated, and the light output by the illumination unit is selected from ultraviolet light or laser light; in addition, the conductive supercritical fluid is selected from the group consisting of One of them: water, a combination of carbon dioxide and water, a combination of carbon dioxide and methanol.