TW201525615A - Photosensitive resin element - Google Patents

Photosensitive resin element Download PDF

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TW201525615A
TW201525615A TW103141486A TW103141486A TW201525615A TW 201525615 A TW201525615 A TW 201525615A TW 103141486 A TW103141486 A TW 103141486A TW 103141486 A TW103141486 A TW 103141486A TW 201525615 A TW201525615 A TW 201525615A
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photosensitive resin
mass
solvent
resin layer
integer
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TWI592753B (en
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Tsutomu Igarashi
Tomohiro Kino
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Asahi Kasei E Materials Corp
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Laminated Bodies (AREA)

Abstract

Provided is a photosensitive element which has an aesthetic appearance, long product life, and which reduces defects caused by resist chips in the lamination step when fabricating printed circuit boards. This photosensitive resin element contains a support layer and a photosensitive resin layer on top of said support layer. The photosensitive resin layer contains: (a) a binder resin having a carboxyl group content of 100-600 (acid equivalent), and a weight-average molecular weight of 5,000-500,000; (b) a photopolymerizable unsaturated compound; (c) a photopolymerization initiator; and (d) a solvent. The photosensitive resin layer contains 0.001 mass % to 1 mass % of the solvent (d) with reference to the mass of the photosensitive resin layer, and the photosensitive resin layer contains at least one compound selected from general formulae (I) to (III) as (b) the polymerizable unsaturated compound.

Description

感光性樹脂元件 Photosensitive resin element

本發明係關於一種感光性樹脂元件等。 The present invention relates to a photosensitive resin element or the like.

用以製作印刷電路之感光性樹脂組合物之製造方法通常包含如下步驟,即,將黏合劑用樹脂、可進行光聚合之不飽和化合物、光聚合起始劑、染料等在主要成分為以甲基乙基酮為代表之酮類、以乙酸乙酯為代表之酯類、以四氫呋喃為代表之醚類等的溶劑中均勻地攪拌溶解。例如專利文獻1中記述有,藉由使用甲基乙基酮/1-甲氧基-2-丙醇=2/1(重量比)之混合溶劑所製備之溶液。專利文獻1中記載有,使用模具塗佈機等將此種溶液均勻地塗佈至作為支持層之聚酯膜等上,並於乾燥步驟中將溶劑乾燥去除,而可獲得具有感光性樹脂組合物之層之積層體;並且,亦可進而層壓作為保護層之聚乙烯膜等,而獲得具有包含感光性樹脂組合物之層的3層構造之積層體。通常將該等積層體稱為乾式膜光阻(以下簡稱為「DF」)。 The method for producing a photosensitive resin composition for producing a printed circuit generally comprises the steps of: a resin for a binder, an unsaturated compound capable of photopolymerization, a photopolymerization initiator, a dye, etc. The base ketone is a solvent which is represented by a ketone, an ester represented by ethyl acetate, and an ether represented by tetrahydrofuran, and the mixture is uniformly stirred and dissolved. For example, Patent Document 1 describes a solution prepared by using a mixed solvent of methyl ethyl ketone / 1-methoxy-2-propanol = 2 / 1 (weight ratio). Patent Document 1 discloses that such a solution is uniformly applied onto a polyester film or the like as a support layer by using a die coater or the like, and the solvent is dried and removed in a drying step to obtain a photosensitive resin composition. Further, a laminate having a three-layer structure including a layer of the photosensitive resin composition may be obtained by laminating a polyethylene film or the like as a protective layer. These laminates are generally referred to as dry film photoresists (hereinafter abbreviated as "DF").

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平11-143069號公報 [Patent Document 1] Japanese Patent Laid-Open No. Hei 11-143069

然而,於將甲基乙基酮用作溶劑之主要成分的先前製造方法中,黏合劑用樹脂及可進行光聚合之不飽和化合物之溶解性、以及染 料等添加劑之溶解性不充分,時常發生於過濾調合液時過濾器發生堵塞之情況。又,就減少所製造之DF之表面之微小凹凸、減少於外觀之目測檢查中作為不均而被觀察到之頻度之觀點而言,調合液尚存改良之餘地。 However, in the prior manufacturing method in which methyl ethyl ketone is used as a main component of the solvent, the solubility of the resin for the binder and the unsaturated compound which can be photopolymerized, and dyeing The solubility of additives such as materials is insufficient, and it often occurs when the filter is clogged with the filter solution. Moreover, there is still room for improvement in the blending liquid from the viewpoint of reducing the minute irregularities on the surface of the produced DF and reducing the frequency of observation as unevenness in the visual inspection of the appearance.

本發明者等人發現,若乾燥後殘留於感光性樹脂組合物中之溶劑較多,則於由感光性樹脂組合物形成DF之情形時,於捲取成輥狀之DF中,產生感光層經時地自輥端面滲出之邊緣熔融之現象,由此產生製品壽命變短之問題,另一方面,若殘留於乾燥後之感光性樹脂組合物中之溶劑過少,則會產生如下問題:於對感光層切入切割刀時會產生感光層之切屑。切割刀係於層壓步驟中使用,若產生感光層之切屑,則切屑會再附著於基板上而成為不良之原因。 The inventors of the present invention have found that when a large amount of a solvent remains in the photosensitive resin composition after drying, when a DF is formed from the photosensitive resin composition, a photosensitive layer is produced in the DF wound into a roll. The phenomenon that the edge oozing out from the end surface of the roll melts over time, thereby causing a problem that the life of the product is shortened. On the other hand, if the solvent remaining in the photosensitive resin composition after drying is too small, the following problem occurs: When the photosensitive layer is cut into the cutting blade, chips of the photosensitive layer are generated. The dicing blade is used in the laminating step, and if the chips of the photosensitive layer are generated, the swarf may adhere to the substrate again and cause a defect.

因此,本發明之問題在於提供一種感光性樹脂元件,其外觀良好,製品壽命較長,且於製作印刷電路板時減少層壓步驟中之因光阻劑切屑引起之不良。 Therefore, the problem of the present invention is to provide a photosensitive resin element which is excellent in appearance, long in product life, and which reduces defects caused by photoresist chips in the laminating step in the production of a printed circuit board.

本發明者等人為了解決上述問題而反覆進行努力研究,結果發現,根據具有特定組成並且溶劑之殘留量被控制在特定範圍之感光性樹脂層,外觀良好且製品壽命較長,可減少層壓步驟中之因光阻劑切屑引起之不良,從而完成了本發明。即,本發明如下所述。 In order to solve the above problems, the inventors of the present invention have conducted intensive studies, and as a result, it has been found that a photosensitive resin layer having a specific composition and a residual amount of a solvent is controlled to a specific range, and the appearance is good and the life of the product is long, and lamination can be reduced. The present invention has been accomplished in the step due to defects caused by the photoresist chips. That is, the present invention is as follows.

[1]一種感光性元件,其係包含支持層、及該支持層上之感光性樹脂層之感光性樹脂元件,並且該感光性樹脂層包含(a)羧基含量以酸當量計為100~600且重量平均分子量為5000~500000之黏合劑用樹脂、(b)可進行光聚合之不飽和化合物、(c)光聚合起始劑、及(d)溶劑,該感光性樹脂層以該感光性樹脂層之質量基準計以0.001質量% 以上且1質量%以下之量包含該(d)溶劑,該感光性樹脂層包含選自下述通式(I)~(III)中之1種以上化合物作為該(b)可進行光聚合之不飽和化合物。 [1] A photosensitive element comprising a support layer and a photosensitive resin element of a photosensitive resin layer on the support layer, wherein the photosensitive resin layer contains (a) a carboxyl group content of from 100 to 600 in terms of acid equivalent And a resin for a binder having a weight average molecular weight of 5,000 to 500,000, (b) a photopolymerizable unsaturated compound, (c) a photopolymerization initiator, and (d) a solvent, the photosensitive resin layer having the photosensitivity The mass of the resin layer is 0.001% by mass The (d) solvent is contained in an amount of at least 1% by mass or less, and the photosensitive resin layer contains one or more compounds selected from the following general formulae (I) to (III) as the (b) photopolymerizable. Unsaturated compound.

(式中,R1及R2分別獨立地表示氫原子或甲基,A表示C2H4,B表示CH2CH(CH3)基,m1+m2為2~30之整數,m3+m4為0~30之整數,m1及m2分別獨立為1~29之整數,m3及m4分別獨立為0~29之整數,-(A-O)-及-(B-O)-之重複單元之排列可為無規亦可為嵌段,於嵌段之情形時,-(A-O)-及-(B-O)-之任一者可於聯苯基側)[化2] (wherein R 1 and R 2 each independently represent a hydrogen atom or a methyl group, A represents C 2 H 4 , B represents a CH 2 CH(CH 3 ) group, and m 1 + m 2 is an integer of 2 to 30, m 3 + m 4 is an integer from 0 to 30, m 1 and m 2 are each independently an integer from 1 to 29, and m 3 and m 4 are each independently an integer from 0 to 29, -(AO)- and -(BO)- The arrangement of the repeating units may be random or block, and in the case of a block, any of -(AO)- and -(BO)- may be on the biphenyl side) [Chemical 2]

(式中,R3表示氫原子或碳數為1~8之一價有機基,R4、R5及R6分別獨立地表示氫原子或甲基,D表示碳數2~6之伸烷基,n1、n2及n3為滿足n1+n2+n3=3~60之0以上之整數,n4為0或1,其中,式中存在複數個之D可分別相同亦可不同,-(O-D)-之重複結構可為無規亦可為嵌段) (wherein R 3 represents a hydrogen atom or a one-valent organic group having 1 to 8 carbon atoms; R 4 , R 5 and R 6 each independently represent a hydrogen atom or a methyl group, and D represents a hydrocarbon having 2 to 6 carbon atoms; The base, n 1 , n 2 and n 3 are integers of 0 or more satisfying n 1 + n 2 + n 3 = 3 to 60, and n 4 is 0 or 1, wherein a plurality of Ds in the formula may be the same Differently, the repeating structure of -(OD)- can be random or block)

(式中,R7~R11分別獨立地表示氫原子或甲基,A1表示C2H4基,B1表示CH2CH(CH3)基,n5+n6為0~30之整數,n7+n8為0~30之整數,n5及n6分別獨立為0~30之整數,n7及n8分別獨立為0~30之整數,-(O-A1)-及-(O-B1)-之重複單元之排列可為無規亦可為嵌段,於嵌 段之情形時,-(O-A1)-及-(O-B1)-之任一者可於胺基甲酸酯基側) (wherein R 7 to R 11 each independently represent a hydrogen atom or a methyl group, A 1 represents a C 2 H 4 group, B 1 represents a CH 2 CH(CH 3 ) group, and n 5 + n 6 is 0 to 30 Integer, n 7 + n 8 is an integer from 0 to 30, n 5 and n 6 are each an integer of 0 to 30, and n 7 and n 8 are each independently an integer of 0 to 30, -(OA 1 )-and- The arrangement of the repeating units of (OB 1 )- may be random or block, and in the case of a block, any of -(OA 1 )- and -(OB 1 )- may be used in the urethane. Ester side)

[2]如上述態樣1之感光性樹脂元件,其包含丙二醇單甲醚作為該(d)溶劑。 [2] The photosensitive resin element according to the above aspect 1, which comprises propylene glycol monomethyl ether as the solvent (d).

[3]如上述態樣1之感光性樹脂元件,其包含甲苯作為該(d)溶劑。 [3] The photosensitive resin element according to the above aspect 1, which comprises toluene as the solvent (d).

[4]如上述態樣1之感光性樹脂元件,其包含丙酮作為該(d)溶劑。 [4] The photosensitive resin element according to the above aspect 1, which comprises acetone as the solvent (d).

[5]如上述態樣1至4中任一項之感光性樹脂元件,其包含該通式(I)所表示之化合物及該通式(II)所表示之化合物作為該(b)可進行光聚合之不飽和化合物。 [5] The photosensitive resin element according to any one of the above aspects 1 to 4, which comprises the compound represented by the formula (I) and the compound represented by the formula (II) as the (b) Photopolymerized unsaturated compounds.

[6]如上述態樣1至4中任一項之感光性樹脂元件,其包含該通式(I)所表示之化合物及該通式(III)所表示之化合物作為該(b)可進行光聚合之不飽和化合物。 [6] The photosensitive resin element according to any one of the above aspects 1 to 4, which comprises the compound represented by the formula (I) and the compound represented by the formula (III) as the (b) Photopolymerized unsaturated compounds.

[7]如上述態樣1至4中任一項之感光性樹脂元件,其包含該通式(II)所表示之化合物及該通式(III)所表示之化合物作為該(b)可進行光聚合之不飽和化合物。 [7] The photosensitive resin element according to any one of the above aspects 1 to 4, which comprises the compound represented by the formula (II) and the compound represented by the formula (III) as the (b) Photopolymerized unsaturated compounds.

[8]如上述態樣1至7中任一項之感光性樹脂元件,其中該支持層為聚酯膜。 [8] The photosensitive resin member according to any one of the above aspects 1 to 7, wherein the support layer is a polyester film.

[9]如上述態樣8之感光性樹脂元件,其中自該感光性樹脂元件剝離並經乾燥之該聚酯膜之TD(Transverse Direction,橫向方向)方向之熱收縮率為3.2%以下。 [9] The photosensitive resin element according to the above aspect 8, wherein a heat shrinkage ratio in a TD (Transverse Direction) direction of the polyester film peeled off from the photosensitive resin element and dried is 3.2% or less.

[10]如上述態樣8或9之感光性樹脂元件,其中該聚酯膜之膜厚為12μm~16μm。 [10] The photosensitive resin element according to the above aspect 8 or 9, wherein the polyester film has a film thickness of from 12 μm to 16 μm.

又,本發明提供一種藉由將包含上述(a)~(d)之成分之感光性樹脂組合物塗敷於支持層上,並使該組合物乾燥而形成感光性樹脂層從而製造DF之方法,進而亦提供一種於形成於該支持層上之該感光性樹脂層之表面進而形成保護層,而製造3層構造之DF之方法。 Moreover, the present invention provides a method for producing DF by applying a photosensitive resin composition containing the components (a) to (d) to a support layer, and drying the composition to form a photosensitive resin layer. Further, a method of producing a DF having a three-layer structure by forming a protective layer on the surface of the photosensitive resin layer formed on the support layer is further provided.

根據本發明,提供一種感光性樹脂元件,其外觀良好,製品壽命較長,且可減少製作印刷配線板時之層壓步驟中之因光阻劑切屑引起之不良情況。又,根據本發明之特定態樣,提供上述感光性樹脂元件之製造方法。 According to the present invention, there is provided a photosensitive resin element which is excellent in appearance, long in product life, and which can reduce defects caused by photoresist chips in a laminating step in producing a printed wiring board. Moreover, according to a specific aspect of the present invention, a method of producing the above-mentioned photosensitive resin element is provided.

以下,對用以實施本發明之例示之形態(以下,簡稱為「實施形態」)進行詳細說明。再者,本發明並不限定於實施形態,可在其主旨之範圍內進行各種變化而實施。 Hereinafter, an exemplary embodiment (hereinafter, simply referred to as "embodiment") for carrying out the invention will be described in detail. The present invention is not limited to the embodiment, and various modifications can be made without departing from the spirit and scope of the invention.

本發明之實施形態係一種感光性元件,其係包含支持層、及該支持層上之感光性樹脂層之感光性樹脂元件,並且該感光性樹脂層包含(a)羧基含量以酸當量計為100~600且重量平均分子量為5000~500000之黏合劑用樹脂、(b)可進行光聚合之不飽和化合物、(c)光聚合起始劑、及(d)溶劑,該感光性樹脂層以該感光性樹脂層之質量基準計以0.001質量%以上且1質量%以下之量包含該(d)溶劑,該感光性樹脂層包含選自下述通式(I)~(III)中之1種以上化合物作為該(b)可進行光聚合之不飽和化合物。 The embodiment of the present invention is a photosensitive element comprising a support layer and a photosensitive resin element of a photosensitive resin layer on the support layer, and the photosensitive resin layer contains (a) a carboxyl group content in terms of acid equivalent a resin for a binder having a weight average molecular weight of from 5,000 to 500,000, (b) a photopolymerizable unsaturated compound, (c) a photopolymerization initiator, and (d) a solvent, wherein the photosensitive resin layer is 100 to 600 The (d) solvent is contained in an amount of 0.001% by mass or more and 1% by mass or less based on the mass of the photosensitive resin layer, and the photosensitive resin layer contains one selected from the following general formulae (I) to (III). The above compounds are used as the (a) photopolymerizable unsaturated compound.

[化4] [Chemical 4]

(式中,R1及R2分別獨立地表示氫原子或甲基,A表示C2H4基,B表示CH2CH(CH3)基,m1+m2為2~30之整數,m3+m4為0~30之整數,m1及m2分別獨立為1~29之整數,m3及m4分別獨立為0~29之整數,-(A-O)-及-(B-O)-之重複單元之排列可為無規亦可為嵌段,於嵌段之情形時,-(A-O)-及-(B-O)-之任一者可於聯苯基側) (wherein R 1 and R 2 each independently represent a hydrogen atom or a methyl group, A represents a C 2 H 4 group, B represents a CH 2 CH(CH 3 ) group, and m 1 + m 2 is an integer of 2 to 30, m 3 + m 4 is an integer from 0 to 30, m 1 and m 2 are each independently an integer from 1 to 29, and m 3 and m 4 are each independently an integer from 0 to 29, -(AO)- and -(BO). - the arrangement of the repeating units may be random or block, and in the case of a block, any of -(AO)- and -(BO)- may be on the biphenyl side)

(式中,R3表示氫原子或碳數為1~8之一價有機基,R4、R5及R6分別獨立地表示氫原子或甲基,D表示碳數2~6之伸烷基,n1、n2及n3為滿足n1+n2+n3=3~60之0以上之整數,n4為0或1,其中,式中 存在複數個之D可分別相同亦可不同,-(O-D)-之重複結構可為無規亦可為嵌段) (wherein R 3 represents a hydrogen atom or a one-valent organic group having 1 to 8 carbon atoms; R 4 , R 5 and R 6 each independently represent a hydrogen atom or a methyl group, and D represents a hydrocarbon having 2 to 6 carbon atoms; The base, n 1 , n 2 and n 3 are integers of 0 or more satisfying n 1 + n 2 + n 3 = 3 to 60, and n 4 is 0 or 1, wherein a plurality of Ds in the formula may be the same Differently, the repeating structure of -(OD)- can be random or block)

(式中,R7~R11分別獨立地表示氫原子或甲基,A1表示C2H4基,B1表示CH2CH(CH3)基,n5+n6為0~30之整數,n7+n8為0~30之整數,n5及n6分別獨立為0~30之整數,n7及n8分別獨立為0~30之整數,-(O-A1)-及-(O-B1)-之重複單元之排列可為無規亦可為嵌段,於嵌段之情形時,-(O-A1)-及-(O-B1)-之任一者可於胺基甲酸酯基側。) (wherein R 7 to R 11 each independently represent a hydrogen atom or a methyl group, A 1 represents a C 2 H 4 group, B 1 represents a CH 2 CH(CH 3 ) group, and n 5 + n 6 is 0 to 30 Integer, n 7 + n 8 is an integer from 0 to 30, n 5 and n 6 are each an integer of 0 to 30, and n 7 and n 8 are each independently an integer of 0 to 30, -(OA 1 )-and- The arrangement of the repeating units of (OB 1 )- may be random or block, and in the case of a block, any of -(OA 1 )- and -(OB 1 )- may be used in the urethane. Ester side.)

感光性樹脂元件例如可藉由包含以下步驟之方法而製造:將(a)羧基含量以酸當量計為100~600且重量平均分子量為5000~500,000之黏合劑用樹脂、(b)可進行光聚合之不飽和化合物、(c)光聚合起始劑、(d)溶劑、及視需要之(e)其他添加劑進行調合而獲得調合液之步驟;及將該調合液應用於支持層上,繼而使該調合液乾燥而於該支持層上形成感光性樹脂層之步驟。 The photosensitive resin element can be produced, for example, by a method comprising the steps of: (a) a binder resin having a carboxyl group content of from 100 to 600 in terms of acid equivalent weight and a weight average molecular weight of from 5,000 to 500,000, and (b) light-receiving a step of obtaining a blending solution by polymerizing an unsaturated compound, (c) a photopolymerization initiator, (d) a solvent, and optionally (e) other additives, and applying the blending solution to the support layer, and then applying the blending solution to the support layer, and then The step of drying the preparation liquid to form a photosensitive resin layer on the support layer.

於本實施形態中,殘留於感光性樹脂層(例如上述方法中調合液之乾燥、成膜後所獲得者)中之溶劑之量相對於感光性樹脂層需要為0.001質量%以上且1質量%以下。若超過1質量%,則於將感光性樹脂 組合物製成DF之情形時,會產生如下問題:於捲取成輥狀之DF中,產生感光層經時地自輥端面滲出之邊緣熔融之現象,使製品壽命縮短。另一方面,若未達0.001質量%,則會產生如下問題:當將切割刀插入感光性樹脂層時,產生感光性樹脂層之切屑。切割刀係於層壓步驟中使用,若產生感光性樹脂層之切屑,則切屑會再附著於基板上而成為不良之原因。殘留於感光性樹脂層中之溶劑之量較佳為0.005質量%以上,進而較佳為0.01質量%以上,尤佳為0.05質量%以上。又,殘留於感光性樹脂層中之溶劑之量較佳為0.7質量%以下,進而較佳為0.5質量%以下,尤佳為0.2質量%以下。殘留於感光性樹脂層中之溶劑之量及種類係藉由下述[實施例]之項所記載之方法或從業者認為與該方法同等之方法所測得之值。 In the present embodiment, the amount of the solvent remaining in the photosensitive resin layer (for example, the drying of the preparation liquid in the above-mentioned method and the film formation) is 0.001% by mass or more and 1% by mass based on the photosensitive resin layer. the following. If it exceeds 1% by mass, the photosensitive resin is used. When the composition is made into DF, there is a problem that in the DF wound into a roll shape, a phenomenon in which the edge of the photosensitive layer oozes from the end face of the roll is melted over time, and the life of the product is shortened. On the other hand, if it is less than 0.001% by mass, there is a problem in that when the dicing blade is inserted into the photosensitive resin layer, chips of the photosensitive resin layer are generated. The dicing blade is used in the laminating step, and if chips of the photosensitive resin layer are generated, the swarf may adhere to the substrate again, which may cause a defect. The amount of the solvent remaining in the photosensitive resin layer is preferably 0.005% by mass or more, more preferably 0.01% by mass or more, and still more preferably 0.05% by mass or more. Moreover, the amount of the solvent remaining in the photosensitive resin layer is preferably 0.7% by mass or less, more preferably 0.5% by mass or less, and still more preferably 0.2% by mass or less. The amount and type of the solvent remaining in the photosensitive resin layer are values measured by the method described in the following [Examples] or the method considered by the practitioner to be equivalent to the method.

於本實施形態中,作為控制殘留於感光性樹脂層中之溶劑之量的方法,可列舉形成感光性樹脂層時之感光性樹脂組合物之乾燥條件(溫度及時間)之調整。殘留於感光性樹脂層中之溶劑之量係藉由氣相層析法所測得之值。 In the present embodiment, as a method of controlling the amount of the solvent remaining in the photosensitive resin layer, the drying conditions (temperature and time) of the photosensitive resin composition when the photosensitive resin layer is formed are adjusted. The amount of the solvent remaining in the photosensitive resin layer is a value measured by gas chromatography.

通常,所謂感光性元件係指因接收光而改變性質者。感光性元件例如可為膜、板、片材、輥、成形品等各種形態,例如可為作為包含感光性樹脂、或由感光性樹脂所構成者的感光性樹脂元件。更詳細而言,藉由將包含感光性樹脂之組合物(於本發明中,稱為「感光性樹脂組合物」)塗佈至膜等支持層上,而將包含感光性樹脂組合物之層、或使感光性樹脂組合物乾燥而獲得之層(於本發明中,將該等統稱為「感光性樹脂層」)積層於支持層上,由此而獲得之感光性樹脂積層體作為感光性樹脂元件而較佳。本發明提供此種作為具有感光性樹脂層及支持層之積層體之感光性樹脂元件。再者,感光性樹脂組合物可為任意之狀態(例如,溶液、固體、乳液、懸浮物等),較佳為溶液、乳液、懸浮物等液體(於本發明中亦稱為「調合液」)。進而,藉 由於支持層與感光性樹脂層之積層體之露出感光性樹脂層之部分進而積層保護層(例如,保護膜、間隔紙膜等)並捲取而獲得之作為感光性樹脂積層體之感光性樹脂輥作為感光性樹脂元件更佳,尤佳為使感光性樹脂輥之整體或感光性樹脂層部分乾燥之乾式膜輥之形態。 Generally, a photosensitive element refers to a person who changes properties due to receiving light. The photosensitive element may be, for example, a film, a plate, a sheet, a roll, a molded article, or the like, and may be, for example, a photosensitive resin element including a photosensitive resin or a photosensitive resin. More specifically, a composition containing a photosensitive resin (referred to as "photosensitive resin composition" in the present invention) is applied onto a support layer such as a film to form a layer containing the photosensitive resin composition. The layer obtained by drying the photosensitive resin composition (in the present invention, collectively referred to as "photosensitive resin layer") is laminated on the support layer, whereby the photosensitive resin laminate obtained as a photosensitive property A resin element is preferred. The present invention provides such a photosensitive resin element as a laminate having a photosensitive resin layer and a support layer. Further, the photosensitive resin composition may be in any state (for example, a solution, a solid, an emulsion, a suspension, etc.), preferably a solution, an emulsion, a suspension, or the like (also referred to as "blending liquid" in the present invention). ). Further, borrow A photosensitive resin as a photosensitive resin laminate obtained by laminating a protective layer (for example, a protective film, a spacer film, or the like) by laminating a portion of the photosensitive resin layer between the support layer and the photosensitive resin layer The roller is more preferably a photosensitive resin element, and is preferably in the form of a dry film roll in which the entire photosensitive resin roll or the photosensitive resin layer is partially dried.

感光性樹脂元件之厚度較佳為5μm~50μm。關於感光性樹脂元件之厚度,就將調合液塗佈至支持層上之精度之觀點而言,較佳為調整為5μm以上,另一方面,就乾燥步驟中之乾燥性之觀點而言,較佳為調整為50μm以下。感光性樹脂元件之厚度更佳為30μm~50μm。 The thickness of the photosensitive resin element is preferably 5 μm to 50 μm. The thickness of the photosensitive resin element is preferably adjusted to 5 μm or more from the viewpoint of the accuracy of applying the preparation liquid onto the support layer, and on the other hand, from the viewpoint of the drying property in the drying step, The optimum is adjusted to 50 μm or less. The thickness of the photosensitive resin element is more preferably from 30 μm to 50 μm.

再者,感光性樹脂層越薄則解像度越高,又,感光性樹脂層越厚則膜強度越大,因此感光性樹脂層之膜厚可根據用途適當選擇。例如,感光性樹脂層之膜厚可為15μm~50μm,例如15μm~30μm、或30μm~40μm、或40μm~50μm。 In addition, the thinner the photosensitive resin layer is, the higher the resolution is, and the thicker the photosensitive resin layer is, the larger the film strength is. Therefore, the film thickness of the photosensitive resin layer can be appropriately selected depending on the application. For example, the photosensitive resin layer may have a film thickness of 15 μm to 50 μm, for example, 15 μm to 30 μm, or 30 μm to 40 μm, or 40 μm to 50 μm.

<感光性樹脂組合物> <Photosensitive Resin Composition>

感光性樹脂組合物較佳為包含(a)黏合劑用樹脂、(b)可進行光聚合之不飽和化合物、(c)光聚合起始劑、及(d)溶劑、以及視需要之(e)其他添加劑。感光性樹脂組合物較佳為調合液。 The photosensitive resin composition preferably contains (a) a binder resin, (b) a photopolymerizable unsaturated compound, (c) a photopolymerization initiator, and (d) a solvent, and optionally (e) ) other additives. The photosensitive resin composition is preferably a blending liquid.

於感光性樹脂組合物為調合液之情形時,於感光性樹脂元件之製造方法中,調合液中之全部固形物成分之比率較佳為30質量%~80質量%。調合液中之全部固形物成分之比率例如係藉由將成分(a)~(c)及(e)溶解於(d)溶劑中而獲得之調合液之固形物成分濃度。關於全部固形物成分之比率,就控制乾燥、蒸發之溶劑量以獲得提高塗敷速度之效果之觀點而言,較佳為30質量%以上,另一方面,就調合液之均勻性之觀點而言,較佳為80質量%以下。調合液中之全部固形物成分之比率更佳為40質量%以上,進而較佳為50質量%以上,另一方面,作為上限更佳為70質量%以下,進而較佳為60質量%以下。將全部固形物成分之比率設定於如該等之範圍就以下觀點而言較佳,即,提高 乾燥後之膜表面之平滑性之觀點、或於乾燥步驟中減少針狀氣孔等未塗敷部分之觀點、獲得良好之塗佈面之觀點。 In the case where the photosensitive resin composition is a preparation liquid, in the method for producing a photosensitive resin element, the ratio of all the solid content in the preparation liquid is preferably 30% by mass to 80% by mass. The ratio of all the solid content components in the preparation liquid is, for example, the solid content concentration of the preparation liquid obtained by dissolving the components (a) to (c) and (e) in the solvent (d). The ratio of all the solid content components is preferably 30% by mass or more from the viewpoint of controlling the amount of the solvent to be dried and evaporated to obtain an effect of increasing the coating speed, and on the other hand, from the viewpoint of the uniformity of the preparation liquid. In other words, it is preferably 80% by mass or less. The ratio of all the solid content in the preparation liquid is more preferably 40% by mass or more, further preferably 50% by mass or more, and more preferably 70% by mass or less, and still more preferably 60% by mass or less. It is preferable to set the ratio of all the solid components to such a range from the viewpoint of improving, that is, increasing From the viewpoint of the smoothness of the surface of the film after drying, or the viewpoint of reducing the uncoated portion such as needle-like pores in the drying step, and obtaining a favorable coated surface.

以下,對成分(a)~(e)進行詳細說明。 Hereinafter, the components (a) to (e) will be described in detail.

(a)黏合劑用樹脂 (a) Resin for resin

(a)黏合劑用樹脂之羧基含量以酸當量計為100~600,且重量平均分子量為5000~500,000,而且係用作黏合劑之樹脂。 (a) The resin for the binder is a resin having a carboxyl group content of from 100 to 600 in terms of acid equivalent weight and a weight average molecular weight of from 5,000 to 500,000, and is used as a binder.

(a)黏合劑用樹脂為了對感光性樹脂元件賦予對鹼性水溶液之顯影性或剝離性而具有羧基。就耐顯影性、解像性及密接性之觀點而言,羧基之含量以酸當量計較佳為100以上,另一方面,就顯影性及剝離性之觀點而言,較佳為600以下。於本發明中,所謂酸當量係指其中具有1當量之羧基的樹脂之質量(克)。於本發明中,酸當量係藉由電位差滴定法(例如使用平沼產業股份有限公司製造之平沼自動滴定裝置(COM-555),並使用0.1mol/L之氫氧化鈉)所測得之值。 (a) The binder resin has a carboxyl group in order to impart developability or releasability to an alkaline aqueous solution to the photosensitive resin element. The content of the carboxyl group is preferably 100 or more in terms of acid resistance, and is preferably 600 or less from the viewpoint of developability and peelability from the viewpoint of the development resistance, the resolution, and the adhesion. In the present invention, the acid equivalent means a mass (gram) of a resin having 1 equivalent of a carboxyl group. In the present invention, the acid equivalent is measured by a potentiometric titration method (for example, using a flat-automatic titrator (COM-555) manufactured by Hiranuma Sangyo Co., Ltd., and using 0.1 mol/L of sodium hydroxide).

又,就均勻地維持DF之厚度並獲得對顯影液之耐性之觀點而言,(a)黏合劑用樹脂之重量平均分子量為5,000以上,較佳為20,000以上。另一方面,重量平均分子量就維持顯影性之觀點而言為500,000以下,較佳為300,000以下。 In addition, the weight average molecular weight of the resin for the adhesive (a) is 5,000 or more, preferably 20,000 or more, from the viewpoint of maintaining the thickness of the DF uniformly and obtaining resistance to the developer. On the other hand, the weight average molecular weight is 500,000 or less, and preferably 300,000 or less from the viewpoint of maintaining developability.

又,較佳之分子量分佈(重量平均分子量/數量平均分子量之比)為1.5以上,更佳為2以上。另一方面,分子量分佈較佳為7以下,更佳為5以下。於本發明中,分子量及分子量分佈係使用凝膠滲透層析法並藉由標準聚苯乙烯換算所測得之值。 Further, a preferred molecular weight distribution (ratio of weight average molecular weight / number average molecular weight) is 1.5 or more, and more preferably 2 or more. On the other hand, the molecular weight distribution is preferably 7 or less, more preferably 5 or less. In the present invention, the molecular weight and molecular weight distribution are values measured by gel permeation chromatography and converted by standard polystyrene.

典型而言,(a)黏合劑用樹脂係至少包含含羧基之單體作為共聚合成分之熱塑性共聚物。熱塑性共聚物較佳為使下述第一單體之至少1種與下述第二單體之至少1種進行共聚合而獲得。 Typically, (a) the resin for a binder is a thermoplastic copolymer containing at least a carboxyl group-containing monomer as a copolymerization component. The thermoplastic copolymer is preferably obtained by copolymerizing at least one of the following first monomers and at least one of the following second monomers.

第一單體為分子中含有羧基之單體。作為第一單體,例如可列舉:(甲基)丙烯酸、反丁烯二酸、肉桂酸、丁烯酸、伊康酸、順丁烯 二酸酐、及順丁烯二酸半酯等。其中,尤佳為(甲基)丙烯酸。於本說明書中,所謂(甲基)丙烯酸表示丙烯酸或甲基丙烯酸。 The first monomer is a monomer having a carboxyl group in the molecule. Examples of the first monomer include (meth)acrylic acid, fumaric acid, cinnamic acid, crotonic acid, itaconic acid, and norbutene. Diacid anhydride, maleic acid half ester, and the like. Among them, (meth)acrylic acid is particularly preferred. In the present specification, the term "(meth)acrylic acid" means acrylic acid or methacrylic acid.

第二單體為非酸性且分子中具有至少1個聚合性不飽和基之單體。作為第二單體,例如可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸苄酯、乙酸乙烯酯等乙烯醇之酯類;(甲基)丙烯腈、苯乙烯系單體(例如,苯乙烯、及可進行聚合之苯乙烯衍生物)等。其中,較佳為(甲基)丙烯酸甲酯、(甲基)丙烯酸正丁酯、苯乙烯、及(甲基)丙烯酸苄酯,而且就解像度之觀點而言尤佳為使用苯乙烯。 The second monomer is a monomer that is non-acidic and has at least one polymerizable unsaturated group in the molecule. Examples of the second monomer include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, and (meth)acrylic acid. Butyl ester, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, (meth)acrylic acid ring An ester of vinyl alcohol such as hexyl ester, 2-ethylhexyl (meth)acrylate, benzyl (meth)acrylate or vinyl acetate; (meth)acrylonitrile, styrene monomer (for example, styrene) And a styrene derivative which can be polymerized) and the like. Among them, methyl (meth)acrylate, n-butyl (meth)acrylate, styrene, and benzyl (meth)acrylate are preferred, and styrene is particularly preferably used from the viewpoint of resolution.

(a)黏合劑用樹脂較佳為藉由如下方式合成,即,向將第一單體及第二單體混合並利用溶劑、例如丙酮、甲基乙基酮、或異丙醇加以稀釋而成之溶液中適量添加自由基聚合起始劑、例如過氧化苯甲醯或偶氮異丁腈並加熱攪拌。亦存在一面將混合物之一部分滴加至反應液中一面進行合成之情形。反應結束後,亦存在進而向(a)黏合劑用樹脂中添加溶劑而調整為所需濃度之情形。作為合成方法,除溶液聚合以外亦可使用塊狀聚合、懸浮聚合、或乳化聚合。 (a) The binder resin is preferably synthesized by mixing the first monomer and the second monomer and diluting with a solvent such as acetone, methyl ethyl ketone or isopropyl alcohol. A suitable amount of a radical polymerization initiator such as benzoyl peroxide or azoisobutyronitrile is added to the resulting solution and stirred under heating. There is also a case where a part of the mixture is added dropwise to the reaction liquid for synthesis. After the completion of the reaction, the solvent is added to the (a) binder resin to adjust the concentration to a desired concentration. As the synthesis method, bulk polymerization, suspension polymerization, or emulsion polymerization may be used in addition to solution polymerization.

於(a)黏合劑用樹脂中,第一單體及第二單體之較佳之共聚比率為第一單體為10質量%~60質量%,且第二單體為40質量%~90質量%。更佳為,第一單體為15質量%~35質量%,且第二單體為65質量%~85質量%。 In (a) the resin for a binder, a preferred copolymerization ratio of the first monomer and the second monomer is 10% by mass to 60% by mass of the first monomer, and 40% by mass to 90% by mass of the second monomer. %. More preferably, the first monomer is 15% by mass to 35% by mass, and the second monomer is 65% by mass to 85% by mass.

作為(a)黏合劑用樹脂之更具體之例,例如可列舉:包含甲基丙烯酸甲酯、甲基丙烯酸及苯乙烯作為共聚合成分之聚合物、包含甲基丙烯酸甲酯、甲基丙烯酸及丙烯酸正丁酯作為共聚合成分之聚合物、 以及包含甲基丙烯酸苄酯、甲基丙烯酸甲酯及丙烯酸2-乙基己酯作為共聚合成分之聚合物等。 More specific examples of the (a) binder resin include a polymer containing methyl methacrylate, methacrylic acid, and styrene as a copolymerization component, and methyl methacrylate and methacrylic acid. N-butyl acrylate as a polymer of a copolymerization component, And a polymer comprising benzyl methacrylate, methyl methacrylate and 2-ethylhexyl acrylate as a copolymerization component.

於本實施形態中,感光性樹脂元件中之(a)黏合劑用樹脂之含量(其中,該含量係相對於感光性樹脂元件之固形物成分總量者;以下,除特別規定之情形以外,對於各含有成分而言均相同)為20質量%~90質量%之範圍,較佳之下限為25質量%,較佳之上限為75質量%,更佳之下限為40質量%,更佳之上限為65質量%。該含量就維持鹼性顯影性之觀點而言較佳為20質量%以上,另一方面,就藉由曝光而形成之光阻圖案充分發揮出作為光阻之性能之觀點而言,較佳為90質量%以下。 In the present embodiment, the content of the (a) binder resin in the photosensitive resin element (wherein the content is based on the total amount of the solid content of the photosensitive resin element; unless otherwise specified) The same is true for each component contained) in the range of 20% by mass to 90% by mass, preferably the lower limit is 25% by mass, preferably the upper limit is 75% by mass, the lower limit is more preferably 40% by mass, and the upper limit is more preferably 65% by mass. %. The content is preferably 20% by mass or more from the viewpoint of maintaining alkali developability. On the other hand, it is preferable that the photoresist pattern formed by exposure sufficiently exhibits performance as a photoresist. 90% by mass or less.

(b)可進行光聚合之不飽和化合物 (b) Photopolymerizable unsaturated compounds

(b)可進行光聚合之不飽和化合物例如為因具有乙烯性不飽和鍵而具有加成聚合性之單體。乙烯性不飽和鍵較佳為末端乙烯性不飽和基。 (b) The photopolymerizable unsaturated compound is, for example, a monomer having an addition polymerizable property due to an ethylenically unsaturated bond. The ethylenically unsaturated bond is preferably a terminal ethylenically unsaturated group.

(b)可進行光聚合之不飽和化合物包含選自下述通式(I)~(III)中之1種以上化合物: (b) The photopolymerizable unsaturated compound contains one or more compounds selected from the group consisting of the following general formulae (I) to (III):

(式中,R1及R2分別獨立地表示氫原子或甲基,A表示C2H4基,B表示CH2CH(CH3)基,m1+m2為2~30之整數,m3+m4為0~30之整數,m1及m2分別獨立為1~29之整數,m3及m4分別獨立為0~29之整數,-(A-O)-及-(B-O)-之重複單元之排列可為無規亦可為嵌段,於嵌段之情形時,-(A-O)-及-(B-O)-之任一者可於聯苯基側) (wherein R 1 and R 2 each independently represent a hydrogen atom or a methyl group, A represents a C 2 H 4 group, B represents a CH 2 CH(CH 3 ) group, and m 1 + m 2 is an integer of 2 to 30, m 3 + m 4 is an integer from 0 to 30, m 1 and m 2 are each independently an integer from 1 to 29, and m 3 and m 4 are each independently an integer from 0 to 29, -(AO)- and -(BO). - the arrangement of the repeating units may be random or block, and in the case of a block, any of -(AO)- and -(BO)- may be on the biphenyl side)

(式中,R3表示氫原子或碳數為1~8之一價有機基,R4、R5及R6分別獨立地表示氫原子或甲基,D表示碳數2~6之伸烷基,n1、n2及n3為n1+n2+n3=3~60之0以上之整數,n4為0或1,其中,式中存在複數個之D可分別相同亦可不同,-(O-D)-之重複結構可為無規亦可為嵌段)[化9] (wherein R 3 represents a hydrogen atom or a one-valent organic group having 1 to 8 carbon atoms; R 4 , R 5 and R 6 each independently represent a hydrogen atom or a methyl group, and D represents a hydrocarbon having 2 to 6 carbon atoms; The bases, n 1 , n 2 and n 3 are integers of 0 or more of n 1 + n 2 + n 3 = 3 to 60, and n 4 is 0 or 1, wherein a plurality of Ds in the formula may be the same Different, -(OD)- the repeating structure may be random or block) [Chemical 9]

(式中,R7~R11分別獨立地表示氫原子或甲基,A1表示C2H4基,B1表示CH2CH(CH3)基,n5+n6為0~30之整數,n7+n8為0~30之整數,n5及n6分別獨立為0~30之整數,n7及n8分別獨立為0~30之整數,-(O-A1)-及-(O-B1)-之重複單元之排列可為無規亦可為嵌段,於嵌段之情形時,-(O-A1)-及-(O-B1)-之任一者可於胺基甲酸酯基側) (wherein R 7 to R 11 each independently represent a hydrogen atom or a methyl group, A 1 represents a C 2 H 4 group, B 1 represents a CH 2 CH(CH 3 ) group, and n 5 + n 6 is 0 to 30 Integer, n 7 + n 8 is an integer from 0 to 30, n 5 and n 6 are each an integer of 0 to 30, and n 7 and n 8 are each independently an integer of 0 to 30, -(OA 1 )-and- The arrangement of the repeating units of (OB 1 )- may be random or block, and in the case of a block, any of -(OA 1 )- and -(OB 1 )- may be used in the urethane. Ester side)

之情形時,對於提高解像性或改善切割屑性有效。又,就該觀點而言,尤佳為(b)可進行光聚合之不飽和化合物包含通式(I)所表示之化合物及通式(II)所表示之化合物之兩者、通式(I)所表示之化合物及通式(III)所表示之化合物之兩者、或通式(II)所表示之化合物及通式(III)所表示之化合物之兩者。 In the case of the case, it is effective for improving the resolution or improving the chipping property. Further, from this point of view, it is particularly preferred that (b) the photopolymerizable unsaturated compound comprises both the compound represented by the formula (I) and the compound represented by the formula (II), and the formula (I). And a compound represented by the formula (III), and a compound represented by the formula (III) and a compound represented by the formula (III).

尤其是(b)可進行光聚合之不飽和化合物大量含有乙二醇鏈或丙二醇鏈之情況對於改善切割屑性更有效。就該觀點而言,於通式(I)中,m1+m2、及m3+m4分別較佳為8~30,更佳為10~30,又,m1+m2+m3+m4較佳為8~60,更佳為10~60。又,於通式(II)中,就切割屑性及解像性之觀點而言,D之碳數較佳為2或3,更佳為2,又,n1+n2+n3較佳為3~50,更佳為3~35。 In particular, (b) the case where the photopolymerizable unsaturated compound contains a large amount of an ethylene glycol chain or a propylene glycol chain is more effective for improving chip cutting property. From this point of view, in the general formula (I), m 1 + m 2 and m 3 + m 4 are each preferably 8 to 30, more preferably 10 to 30, and further, m 1 + m 2 + m. 3 + m 4 is preferably 8 to 60, more preferably 10 to 60. Further, in the general formula (II), the carbon number of D is preferably 2 or 3, more preferably 2, and more preferably n 1 + n 2 + n 3 from the viewpoint of chipping property and resolution. Good for 3~50, better for 3~35.

作為通式(I)所表示之化合物,例如有:於雙酚A之兩端分別加成平均1單元之環氧乙烷而成之聚乙二醇之二甲基丙烯酸酯或於雙酚A 之兩端分別加成平均2單元之環氧乙烷而成之聚乙二醇之二甲基丙烯酸酯、於雙酚A之兩端分別加成平均5單元之環氧乙烷而成之聚乙二醇之二甲基丙烯酸酯、於雙酚A之兩端分別加成平均7單元之環氧乙烷而成之聚乙二醇之二甲基丙烯酸酯、於雙酚A之兩端分別加成平均6單元之環氧乙烷及平均2單元之環氧丙烷而成之聚伸烷基二醇之二甲基丙烯酸酯、於雙酚A之兩端分別加成平均15單元之環氧乙烷及平均2單元之環氧丙烷而成之聚伸烷基二醇之二甲基丙烯酸酯等。 The compound represented by the formula (I) is, for example, a dimethacrylate of polyethylene glycol or an bisphenol A obtained by adding an average of one unit of ethylene oxide to both ends of bisphenol A. The two ends are respectively added with an average of two units of ethylene oxide to form a polyethylene glycol dimethacrylate, and an average of five units of ethylene oxide is added to both ends of the bisphenol A to form a poly Ethylene glycol dimethacrylate, dimethyl acrylate of ethylene glycol formed by adding an average of 7 units of ethylene oxide to both ends of bisphenol A, respectively, at the two ends of bisphenol A Adding an average of 6 units of ethylene oxide and an average of 2 units of propylene oxide to a polyalkylene glycol dimethacrylate, adding an average of 15 units of epoxy to both ends of bisphenol A Ethane and an average of two units of propylene oxide, such as dialkyl diol diol dimethacrylate.

作為通式(II)所表示之化合物,例如可較佳地列舉:對三羥甲基丙烷加成以平均計合計3單元之環氧乙烷而成之三(甲基)丙烯酸酯、對三羥甲基丙烷加成以平均計合計3單元之環氧丙烷而成之三(甲基)丙烯酸酯、對三羥甲基丙烷加成以平均計合計6單元之環氧乙烷而成之三(甲基)丙烯酸酯、對三羥甲基丙烷加成以平均計合計9單元之環氧乙烷而成之三(甲基)丙烯酸酯、對三羥甲基丙烷加成以平均計合計12單元之環氧乙烷而成之三(甲基)丙烯酸酯、對三羥甲基丙烷加成以平均計合計21單元之環氧乙烷而成之三(甲基)丙烯酸酯、對三羥甲基丙烷加成以平均計合計30單元之環氧乙烷而成之三(甲基)丙烯酸酯等。 The compound represented by the formula (II) is, for example, preferably a tri(meth)acrylate obtained by adding 3 units of ethylene oxide to an average of trimethylolpropane. Hydroxymethylpropane is added to a total of three units of propylene oxide to form a tri(meth) acrylate, and trimethylolpropane is added in an average of 6 units of ethylene oxide. (Meth) acrylate, trimethylolpropane addition to a total of 9 units of ethylene oxide to a total of 9 (meth) acrylate, trimethylolpropane addition to average 12 a unit of ethylene oxide to a tris(meth)acrylate, a trimethylolpropane addition to an average of 21 units of ethylene oxide to a tris(meth)acrylate, p-trihydroxyl Methylpropane is added to a total of 30 units of ethylene oxide to form a tris(meth)acrylate.

作為通式(III)所表示之化合物,例如有於異佛酮二異氰酸酯之兩末端加成丙二醇(甲基)丙烯酸酯或聚乙二醇(甲基)丙烯酸酯或者包含該兩者之化合物而成之胺基甲酸酯(甲基)丙烯酸酯。 As the compound represented by the formula (III), for example, propylene glycol (meth) acrylate or polyethylene glycol (meth) acrylate or a compound containing the two is added to both ends of the isophorone diisocyanate. Amino methacrylate (meth) acrylate.

作為(b)可進行光聚合之不飽和化合物之其他具體例,例如就高解像性、硬化膜之剝離性能、及硬化膜柔軟性之觀點而言,較佳為4-壬基苯基七乙二醇二丙二醇(甲基)丙烯酸酯或4-壬基苯基八乙二醇(甲基)丙烯酸酯、4-壬基苯基四乙二醇(甲基)丙烯酸酯、4-辛基苯基五丙二醇(甲基)丙烯酸酯等。 Other examples of the (b) photopolymerizable unsaturated compound are, for example, 4-mercaptophenyl 7 from the viewpoint of high resolution, peeling property of the cured film, and softness of the cured film. Ethylene glycol dipropylene glycol (meth) acrylate or 4-mercaptophenyl octaethylene glycol (meth) acrylate, 4-mercaptophenyltetraethylene glycol (meth) acrylate, 4-octyl Phenyl pentapropylene glycol (meth) acrylate, and the like.

作為其他(b)可進行光聚合之不飽和化合物之具體例,例如可列 舉:丙烯酸2-羥基-3-苯氧基丙酯、鄰苯二甲酸酐與丙烯酸2-羥基丙酯之半酯化合物與環氧丙烷的反應物、1,6-己二醇二(甲基)丙烯酸酯、1,4-環己二醇二(甲基)丙烯酸酯、2-二(對羥基苯基)丙烷二(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、2,2-雙(4-丙烯醯氧基五乙氧基苯基)丙烷、甘油三丙烯酸酯、對季戊四醇加成平均4莫耳之環氧乙烷而成之二醇之四丙烯酸酯、及異三聚氰酸酯化合物之多官能(甲基)丙烯酸酯等。該等可單獨使用,亦可併用2種以上。 Specific examples of the other (b) photopolymerizable unsaturated compound, for example, A reaction of 2-hydroxy-3-phenoxypropyl acrylate, a half ester of phthalic anhydride with 2-hydroxypropyl acrylate and propylene oxide, 1,6-hexanediol di(methyl Acrylate, 1,4-cyclohexanediol di(meth)acrylate, 2-bis(p-hydroxyphenyl)propane di(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol (Meth) acrylate, dipentaerythritol hexa(meth) acrylate, trimethylolpropane tri(meth) acrylate, 2,2-bis(4-propenyl methoxypentaethoxyphenyl)propane A glycerol triacrylate, a tetraacrylate of a diol having an average of 4 moles of ethylene oxide added to pentaerythritol, and a polyfunctional (meth) acrylate of an isomeric cyanurate compound. These may be used alone or in combination of two or more.

感光性樹脂元件中之(b)可進行光聚合之不飽和化合物之含量較佳為5質量%~75質量%之範圍。該含量就抑制硬化不良及顯影時間之延遲之觀點而言較佳為5質量%以上,更佳為15質量%以上,進而較佳為30質量%以上。另一方面,就抑制冷流及硬化光阻之剝離延遲之觀點而言較佳為75質量%以下,更佳為60質量%以下,進而較佳為50質量%以下。 The content of the (a) photopolymerizable unsaturated compound in the photosensitive resin element is preferably in the range of 5 mass% to 75% by mass. The content is preferably 5% by mass or more, more preferably 15% by mass or more, and still more preferably 30% by mass or more from the viewpoint of suppressing the curing failure and the delay in the development time. On the other hand, from the viewpoint of suppressing the peeling delay of the cold flow and the cured photoresist, it is preferably 75% by mass or less, more preferably 60% by mass or less, and still more preferably 50% by mass or less.

(c)光聚合起始劑 (c) Photopolymerization initiator

(c)光聚合起始劑係利用光使單體進行聚合之化合物。作為(c)光聚合起始劑,例如可適當使用通常用作感光性樹脂之光聚合起始劑者,尤其可較佳地使用六芳基聯咪唑(以下,亦稱為三芳基咪唑基二聚物)。 (c) A photopolymerization initiator is a compound which polymerizes a monomer by light. As the (c) photopolymerization initiator, for example, a photopolymerization initiator which is generally used as a photosensitive resin can be suitably used, and in particular, hexaarylbiimidazole (hereinafter, also referred to as triarylimidazolyl) can be preferably used. Polymer).

作為三芳基咪唑基二聚物,例如可列舉:2-(鄰氯苯基)-4,5-二苯基咪唑基二聚物(以下,亦稱為「2,2'-雙(2-氯苯基)-4,4',5,5'-四苯基-1,1'-聯咪唑」)、2,2',5-三(鄰氯苯基)-4-(3,4-二甲氧基苯基)-4',5'-二苯基咪唑基二聚物、2,4-雙(鄰氯苯基)-5-(3,4-二甲氧基苯基)-二苯基咪唑基二聚物、2,4,5-三(鄰氯苯基)-二苯基咪唑基二聚物、2-(鄰氯苯基)-雙-4,5- (3,4-二甲氧基苯基)-咪唑基二聚物、2,2'-雙(2-氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,3-二氟甲基苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,4-二氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,5-二氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,6-二氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,3,4-三氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,3,5-三氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,3,6-三氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,4,5-三氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,4,6-三氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,3,4,5-四氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、2,2'-雙(2,3,4,6-四氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物、及2,2'-雙(2,3,4,5,6-五氟苯基)-4,4',5,5'-四(3-甲氧基苯基)-咪唑基二聚物等。 Examples of the triarylimidazolyl dimer include 2-(o-chlorophenyl)-4,5-diphenylimidazolyl dimer (hereinafter, also referred to as "2,2'-bis(2- Chlorophenyl)-4,4',5,5'-tetraphenyl-1,1'-biimidazole", 2,2',5-tris(o-chlorophenyl)-4-(3,4 -dimethoxyphenyl)-4',5'-diphenylimidazolyl dimer, 2,4-bis(o-chlorophenyl)-5-(3,4-dimethoxyphenyl) -diphenylimidazolyl dimer, 2,4,5-tris(o-chlorophenyl)-diphenylimidazolyl dimer, 2-(o-chlorophenyl)-bis-4,5- (3,4-dimethoxyphenyl)-imidazolyl dimer, 2,2'-bis(2-fluorophenyl)-4,4',5,5'-tetrakis(3-methoxy Phenyl)-imidazolyl dimer, 2,2'-bis(2,3-difluoromethylphenyl)-4,4',5,5'-tetrakis(3-methoxyphenyl)- Imidazolyl dimer, 2,2'-bis(2,4-difluorophenyl)-4,4',5,5'-tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis(2,5-difluorophenyl)-4,4',5,5'-tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-double (2,6-difluorophenyl)-4,4',5,5'-tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis (2,3,4 -trifluorophenyl)-4,4',5,5'-tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis(2,3,5-trifluorobenzene -4,4',5,5'-tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis(2,3,6-trifluorophenyl)-4 , 4',5,5'-tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis(2,4,5-trifluorophenyl)-4,4', 5,5'-tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis(2,4,6-trifluorophenyl)-4,4',5,5' -tetrakis(3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis(2,3,4,5-tetrafluorophenyl)-4,4',5,5'-four (3-methoxyphenyl)-imidazolyl dimer, 2,2'-bis(2,3,4,6-tetrafluorophenyl)-4,4',5,5'-tetra (3 - Oxyphenyl)-imidazolyl dimer, and 2,2'-bis(2,3,4,5,6-pentafluorophenyl)-4,4',5,5'-tetra (3- Methoxyphenyl)-imidazolyl dimer, and the like.

尤其是,2-(鄰氯苯基)-4,5-二苯基咪唑基二聚物係對解像性或硬化光阻膜之強度具有較高效果之光聚合起始劑,可較佳地使用。上述所列舉之三芳基咪唑基二聚物可單獨使用,或者亦可將2種以上組合而使用。又,上述所列舉之三芳基咪唑基二聚物可與下述吖啶化合物、吡唑啉化合物等併用而使用。 In particular, the 2-(o-chlorophenyl)-4,5-diphenylimidazolyl dimer is preferably a photopolymerization initiator having a high effect on the strength of the resolution or cured photoresist film. Use. The triaryl imidazolyl dimers listed above may be used singly or in combination of two or more. Further, the above-mentioned triaryl imidazolyl dimer can be used in combination with the following acridine compound, pyrazoline compound or the like.

作為(c)光聚合起始劑,可適宜地使用吖啶化合物或吡唑啉化合物。作為吖啶化合物,例如可列舉:吖啶、9-苯基吖啶、9-(4-甲苯基)吖啶、9-(4-甲氧基苯基)吖啶、9-(4-羥基苯基)吖啶、9-乙基吖啶、9-氯乙基吖啶、9-甲氧基吖啶、9-乙氧基吖啶、9-(4-甲基苯基)吖啶、9-(4-乙基苯基)吖啶、9-(4-正丙基苯基)吖 啶、9-(4-正丁基苯基)吖啶、9-(4-第三丁基苯基)吖啶、9-(4-乙氧基苯基)吖啶、9-(4-乙醯基苯基)吖啶、9-(4-二甲基胺基苯基)吖啶、9-(4-氯苯基)吖啶、9-(4-溴苯基)吖啶、9-(3-甲基苯基)吖啶、9-(3-第三丁基苯基)吖啶、9-(3-乙醯基苯基)吖啶、9-(3-二甲基胺基苯基)吖啶、9-(3-二乙基胺基苯基)吖啶、9-(3-氯苯基)吖啶、9-(3-溴苯基)吖啶、9-(2-吡啶基)吖啶、9-(3-吡啶基)吖啶、9-(4-吡啶基)吖啶等。其中,較佳為9-苯基吖啶。 As the (c) photopolymerization initiator, an acridine compound or a pyrazoline compound can be suitably used. Examples of the acridine compound include acridine, 9-phenyl acridine, 9-(4-methylphenyl)acridine, 9-(4-methoxyphenyl)acridine, and 9-(4-hydroxyl group. Phenyl) acridine, 9-ethyl acridine, 9-chloroethyl acridine, 9-methoxyacridine, 9-ethoxy acridine, 9-(4-methylphenyl)acridine, 9-(4-ethylphenyl)acridine, 9-(4-n-propylphenyl)anthracene Pyridine, 9-(4-n-butylphenyl)acridine, 9-(4-t-butylphenyl)acridine, 9-(4-ethoxyphenyl)acridine, 9-(4- Ethyl phenyl) acridine, 9-(4-dimethylaminophenyl) acridine, 9-(4-chlorophenyl)acridine, 9-(4-bromophenyl)acridine, 9 -(3-methylphenyl)acridine, 9-(3-tert-butylphenyl)acridine, 9-(3-acetamidophenyl)acridine, 9-(3-dimethylamine Phenyl) acridine, 9-(3-diethylaminophenyl) acridine, 9-(3-chlorophenyl)acridine, 9-(3-bromophenyl)acridine, 9-( 2-pyridyl) acridine, 9-(3-pyridyl)acridine, 9-(4-pyridyl)acridine, and the like. Among them, 9-phenyl acridine is preferred.

作為吡唑啉化合物,例如可列舉:1-苯基-3-(4-第三丁基-苯乙烯基)-5-(4-第三丁基-苯基)-吡唑啉、1-(4-(苯并唑-2-基)苯基)-3-(4-第三丁基-苯乙烯基)-5-(4-第三丁基-苯基)-吡唑啉、1-苯基-3-(4-聯苯)-5-(4-第三丁基-苯基)-吡唑啉、1-苯基-3-(4-聯苯基)-5-(4-第三辛基-苯基)-吡唑啉等。 As the pyrazoline compound, for example, 1-phenyl-3-(4-t-butyl-styryl)-5-(4-t-butyl-phenyl)-pyrazoline, 1- (4-(benzoxyl) Zin-2-yl)phenyl)-3-(4-t-butyl-styryl)-5-(4-t-butyl-phenyl)-pyrazoline, 1-phenyl-3- (4-biphenyl)-5-(4-t-butyl-phenyl)-pyrazoline, 1-phenyl-3-(4-biphenyl)-5-(4-t-octyl- Phenyl)-pyrazoline and the like.

作為上述以外之(c)光聚合起始劑,例如可列舉:2-乙基蒽醌、八乙基蒽醌、1,2-苯并蒽醌、2,3-苯并蒽醌、2-苯基蒽醌、2,3-二苯基蒽醌、1-氯蒽醌、1,4-萘醌、9,10-菲醌、2-甲基-1,4-萘醌、2,3-二甲基蒽醌、及3-氯-2-甲基蒽醌等醌類,二苯甲酮、米其勒酮[4,4'-雙(二甲基胺基)二苯甲酮]、及4,4'-雙(二乙基胺基)二苯甲酮等芳香族酮類,安息香、安息香乙醚、安息香苯醚、甲基安息香、及乙基安息香等安息香醚類,苯偶醯二甲基縮酮、苯偶醯二乙基縮酮、9-氧硫類與烷基胺基苯甲酸之組合、1-苯基-1,2-丙烷二酮-2-O-安息香肟、1-苯基-1,2-丙烷二酮-2-(O-乙氧基羰基)肟等肟酯類。 Examples of the photopolymerization initiator other than the above (c) include 2-ethyl hydrazine, octaethyl hydrazine, 1,2-benzopyrene, 2,3-benzopyrene, and 2- Phenylhydrazine, 2,3-diphenylfluorene, 1-chloroindole, 1,4-naphthoquinone, 9,10-phenanthrenequinone, 2-methyl-1,4-naphthoquinone, 2,3 - dimethyl hydrazine, and chloroquinones such as 3-chloro-2-methyl hydrazine, benzophenone, and miscene [4,4'-bis(dimethylamino)benzophenone] And aromatic ketones such as 4,4'-bis(diethylamino)benzophenone, benzoin ethers such as benzoin, benzoin ethyl ether, benzoin phenyl ether, methyl benzoin, and ethyl benzoin, benzoin Dimethyl ketal, benzoin diethyl ketal, 9-oxygen sulphide Combination with alkylaminobenzoic acid, 1-phenyl-1,2-propanedione-2-O-benzoin, 1-phenyl-1,2-propanedione-2-(O-B An oxoester such as oxycarbonyl)anthracene.

再者,作為上述9-氧硫類與烷基胺基苯甲酸之組合,例如可列舉:乙基-9-氧硫與二甲基胺基苯甲酸乙酯之組合、2-氯-9-氧硫與二甲基胺基苯甲酸乙酯之組合、及異丙基-9-氧硫與二甲基胺基苯甲酸乙酯之組合等。又,亦可使用N-芳基胺基酸作為(c)光 聚合起始劑。作為N-芳基胺基酸之例,可列舉:N-苯基甘胺酸、N-甲基-N-苯基甘胺酸、N-乙基-N-苯基甘胺酸等。其中,尤佳為N-苯基甘胺酸。 Furthermore, as the above 9-oxygen sulfur A combination of a class and an alkylaminobenzoic acid, for example, ethyl-9-oxygen sulfide Combination with ethyl dimethylaminobenzoate, 2-chloro-9-oxosulfur Combination with ethyl dimethylaminobenzoate and isopropyl-9-oxosulfur Combination with ethyl dimethylaminobenzoate and the like. Further, an N-arylamino acid can also be used as the (c) photopolymerization initiator. Examples of the N-arylamino acid include N-phenylglycine, N-methyl-N-phenylglycine, and N-ethyl-N-phenylglycine. Among them, N-phenylglycine is particularly preferred.

感光性樹脂元件中之(c)光聚合起始劑之含量為0.01質量%~30質量%之範圍,更佳之下限為0.05質量%,進而較佳之下限為0.1質量%,更佳之上限為15質量%,進而較佳之上限為10質量%。關於(c)光聚合起始劑之含量,就於藉由曝光所進行之光聚合時獲得充分之感度之觀點而言,較佳為0.01質量%以上,另一方面,就於光聚合時使光充分地透過直至到達感光性樹脂元件之底面(即,離光源較遠之部分)而獲得良好之解像性及密接性之觀點而言,較佳為30質量%以下。 The content of the (c) photopolymerization initiator in the photosensitive resin element is in the range of 0.01% by mass to 30% by mass, more preferably 0.05% by mass, and further preferably 0.1% by mass, more preferably 15% by mass. %, and further preferably, the upper limit is 10% by mass. The content of the (c) photopolymerization initiator is preferably 0.01% by mass or more from the viewpoint of obtaining sufficient sensitivity in photopolymerization by exposure, and on the other hand, in photopolymerization. The light is sufficiently transmitted until it reaches the bottom surface of the photosensitive resin element (that is, a portion farther from the light source), and is preferably 30% by mass or less from the viewpoint of obtaining good resolution and adhesion.

(d)溶劑 (d) solvent

作為溶劑,就溶解性之觀點而言,可適宜地使用酮系、醇系、醚系、酯系等之溶劑。作為酮系溶劑,可列舉甲基乙基酮或丙酮。作為醇系溶劑,可列舉:甲醇、乙醇、異丙醇、正丙醇、正丁醇等。就溶解性及塗膜外觀之觀點而言,尤佳為乙醇。作為醚系,可使用四氫呋喃、丙二醇單甲醚等。作為酯系溶劑例如可列舉乙酸乙酯等。又,亦有為了抑制乾燥步驟中之氣泡產生而添加甲苯等作為非極性溶劑而併用之情形。 As a solvent, a solvent such as a ketone system, an alcohol system, an ether system or an ester system can be suitably used from the viewpoint of solubility. Examples of the ketone solvent include methyl ethyl ketone or acetone. Examples of the alcohol solvent include methanol, ethanol, isopropanol, n-propanol, and n-butanol. From the viewpoint of solubility and appearance of the coating film, ethanol is particularly preferred. As the ether system, tetrahydrofuran, propylene glycol monomethyl ether or the like can be used. Examples of the ester solvent include ethyl acetate and the like. Further, in order to suppress the generation of bubbles in the drying step, toluene or the like is added as a non-polar solvent.

調合液典型而言係藉由將上述(a)黏合劑用樹脂、上述(b)可進行光聚合之不飽和化合物、及上述(c)光聚合起始劑以任意順序或一次性地溶解於(d)溶劑中並加以混合而獲得。 The blending liquid is typically dissolved in an arbitrary order or in a single pass by the above-mentioned (a) binder resin, the above (b) photopolymerizable unsaturated compound, and the above (c) photopolymerization initiator. (d) Obtained in a solvent and mixed.

(d)溶劑就乾燥性之觀點而言較佳為酮系,尤佳為(d)溶劑包含丙酮。又,就提高(b)可進行光聚合之不飽和化合物及/或(e)任意添加劑(例如染料等)之溶解性之觀點而言,較佳為併用丙酮及以乙醇為代表之醇系溶劑。尤佳為丙酮與作為醇系溶劑之乙醇之併用系。 (d) The solvent is preferably a ketone system from the viewpoint of drying property, and particularly preferably (d) the solvent contains acetone. Further, from the viewpoint of improving (b) the photopolymerizable unsaturated compound and/or (e) the solubility of any additive (for example, a dye or the like), it is preferred to use acetone and an alcohol solvent represented by ethanol in combination. . It is especially preferred to use acetone in combination with ethanol as an alcohol solvent.

又,丙酮與醇之併用就成為使調合液之黏度降低之傾向、可將 調合液中之固形物成分濃度設定為更高、以及提高生產性之觀點而言較佳。又,丙酮與醇之併用就於乾燥步驟中一面良好地維持乾燥膜表面一面去除溶劑之觀點而言亦較佳。即,丙酮與醇之併用就可提高調合液之塗敷速度而提高感光性樹脂元件之生產性之觀點而言較佳。再者,此處所謂「一面維持乾燥膜表面良好」係指膜表面之平滑性較高,而且目測到之外觀不均較少。 Moreover, the combination of acetone and alcohol is a tendency to lower the viscosity of the preparation liquid, and it is possible to It is preferable from the viewpoint of setting the concentration of the solid content in the blending liquid to be higher and improving the productivity. Further, the combination of acetone and alcohol is also preferable from the viewpoint of maintaining the surface of the dried film while removing the solvent while maintaining the surface of the dried film well. In other words, the combination of acetone and alcohol is preferable from the viewpoint of improving the coating speed of the preparation liquid and improving the productivity of the photosensitive resin element. In addition, the term "maintaining a dry film surface while maintaining good" means that the surface of the film has high smoothness, and the visually uneven appearance is small.

於(d)溶劑包含丙酮之情形時,丙酮之質量相對於溶劑之合計質量之比率較佳為30質量%以上,更佳為40質量%以上,進而較佳為50質量%以上,尤佳為60質量%以上。另一方面,作為上限較佳為98質量%以下,更佳為90質量%以下,進而較佳為80質量%以下,尤佳為70質量%以下。將丙酮之比率設定為如該等之範圍,就提高乾燥後之膜表面之平滑性之觀點、或於乾燥步驟中減少針狀氣孔等未塗敷部分之觀點、獲得良好之塗佈面之觀點而言較佳。 When (d) the solvent contains acetone, the ratio of the mass of acetone to the total mass of the solvent is preferably 30% by mass or more, more preferably 40% by mass or more, still more preferably 50% by mass or more, and particularly preferably 60% by mass or more. On the other hand, the upper limit is preferably 98% by mass or less, more preferably 90% by mass or less, further preferably 80% by mass or less, and particularly preferably 70% by mass or less. When the ratio of the acetone is set to such a range, the viewpoint of improving the smoothness of the surface of the film after drying, or the viewpoint of reducing the uncoated portion such as needle-like pores in the drying step, and obtaining a good coated surface are obtained. It is better.

再者,作為上述醇系溶劑,較佳為含有乙醇作為主要成分(較佳為50質量%以上,更佳為70質量%以上,進而較佳為90質量%以上,亦可為100質量%)。 In addition, as the alcohol solvent, ethanol is preferably contained as a main component (preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 90% by mass or more, or 100% by mass). .

又,作為上述調合液之黏度,25℃下之黏度較佳為500Pa.sec~4000mPa.sec。 Moreover, as the viscosity of the above-mentioned mixing liquid, the viscosity at 25 ° C is preferably 500 Pa. Sec~4000mPa. Sec.

(e)其他添加劑 (e) Other additives

於調合液中,除成分(a)~(d)以外,亦可含有(e)其他添加劑。具體而言,(e)其他添加劑例如包含染料、顏料等著色物質。作為此種著色物質,可使用基礎染料。作為基礎染料,例如可列舉:鹼性綠1[CAS編號(以下相同):633-03-4]、孔雀綠草酸鹽[2437-29-8]、亮綠[633-03-4]、品紅[632-99-5]、甲基紫[603-47-4]、甲基紫2B[8004-87-3]、結晶紫[548-62-9]、甲基綠[82-94-0]、維多利亞藍B[2580-56-5]、鹼性藍7[2390-60-5]、玫瑰紅B[81-88-9]、玫瑰紅6G[989-38-8]、鹼性 黃2[2465-27-2]等。其中,較佳為鹼性綠1、孔雀綠草酸鹽、及鹼性藍7,就提高色相穩定性及曝光對比度之觀點而言,尤佳為鹼性綠1、及鹼性藍7。 In the blending solution, in addition to the components (a) to (d), (e) other additives may be contained. Specifically, (e) other additives include, for example, a coloring matter such as a dye or a pigment. As such a coloring substance, a base dye can be used. Examples of the base dye include basic green 1 [CAS number (the same applies hereinafter): 633-03-4], peacock green grass salt [2437-29-8], bright green [633-03-4], Magenta [632-99-5], methyl violet [603-47-4], methyl violet 2B [8004-87-3], crystal violet [548-62-9], methyl green [82-94] -0], Victoria Blue B [2580-56-5], Basic Blue 7 [2390-60-5], Rose Red B [81-88-9], Rose Red 6G [989-38-8], alkali Sex Huang 2 [2465-27-2] and so on. Among them, alkaline green 1, peacock green grass, and basic blue 7 are preferable, and alkali green 1 and basic blue 7 are particularly preferable from the viewpoint of improving hue stability and exposure contrast.

感光性樹脂元件中之著色物質之含量較佳為0.001質量%~1質量%。當著色物質之含量為0.001質量%以上時有提高操作性之效果,故而較佳,另一方面,當含量為1質量%以下時有維持保存穩定性之效果,故而較佳。 The content of the coloring matter in the photosensitive resin element is preferably 0.001% by mass to 1% by mass. When the content of the coloring matter is 0.001% by mass or more, the effect of improving workability is improved. Therefore, when the content is 1% by mass or less, the effect of maintaining storage stability is preferable.

又,為了可藉由曝光而賦予可見影像,亦可使調合液中含有顯色劑、例如顯色系染料等。作為此種顯色系染料,例如可列舉隱色染料、或螢光黃母體染料與鹵素化合物之組合等。 Further, in order to provide a visible image by exposure, a coloring agent such as a chromogenic dye or the like may be contained in the preparation liquid. Examples of such a color-developing dye include a leuco dye, a combination of a fluorescent yellow mother dye and a halogen compound, and the like.

作為隱色染料,例如可列舉:三(4-二甲基胺基-2-甲基苯基)甲烷[隱色結晶紫]、三(4-二甲基胺基-2-甲基苯基)甲烷[隱色孔雀綠]、及螢光黃母體染料等。其中,於使用隱色結晶紫之情形時,對比度良好,故而較佳。 As the leuco dye, for example, tris(4-dimethylamino-2-methylphenyl)methane [leuco crystal violet], tris(4-dimethylamino-2-methylphenyl) Methane [hidden malachite green], and fluorescent yellow mother dye. Among them, in the case of using leuco crystal violet, the contrast is good, so that it is preferable.

作為鹵素化合物,例如可列舉:溴戊烷、溴異戊烷、1,2-二溴-2-甲基丙烷、1,2-二溴乙烷、二苯溴代甲烷、二溴甲苯、二溴甲烷、三溴甲基苯基碸、四溴化碳、磷酸三(2,3-二溴丙基)酯、三氯乙醯胺、碘戊烷、碘異戊烷、1,1,1-三氯-2,2-雙(對氯苯基)乙烷、六氯乙烷、氯化三化合物等。 Examples of the halogen compound include bromopentane, bromoisopentane, 1,2-dibromo-2-methylpropane, 1,2-dibromoethane, diphenylbromomethane, dibrominated toluene, and the like. Methyl bromide, tribromomethylphenyl hydrazine, carbon tetrabromide, tris(2,3-dibromopropyl) phosphate, trichloroacetamide, iodopentane, iodine isopentane, 1,1,1- Trichloro-2,2-bis(p-chlorophenyl)ethane, hexachloroethane, chlorinated three Compounds, etc.

感光性樹脂元件中之顯色劑之含量分別獨立地較佳為0.1質量%~10質量%。 The content of the color developing agent in the photosensitive resin element is preferably from 0.1% by mass to 10% by mass, respectively.

進而,為了提高感光性樹脂組合物之熱穩定性及保存穩定性,較佳為使調合液含有選自由自由基聚合抑制劑、或苯并三唑類及羧基苯并三唑類所組成之群中之至少1種以上之化合物。 Further, in order to improve the thermal stability and storage stability of the photosensitive resin composition, it is preferred that the preparation liquid contains a group selected from the group consisting of a radical polymerization inhibitor, or a benzotriazole and a carboxybenzotriazole. At least one or more compounds.

作為自由基聚合抑制劑,例如可列舉:對甲氧基苯酚、對苯二酚、鄰苯三酚、萘胺、第三丁基鄰苯二酚、氯化亞銅、2,6-二第三丁 基-對甲酚、2,2'-亞甲基雙(4-甲基-6-第三丁基苯酚)、2,2'-亞甲基雙(4-乙基-6-第三丁基苯酚)、亞硝基苯基羥胺鋁鹽、N-亞硝基二苯胺等。 Examples of the radical polymerization inhibitor include p-methoxyphenol, hydroquinone, pyrogallol, naphthylamine, tert-butyl catechol, cuprous chloride, and 2,6-di Sanding Base-p-cresol, 2,2'-methylenebis(4-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-ethyl-6-third Phenol), nitrosophenylhydroxylamine aluminum salt, N-nitrosodiphenylamine, and the like.

作為苯并三唑類,例如可列舉:1,2,3-苯并三唑、1-氯-1,2,3-苯并三唑、雙(N-2-乙基己基)胺基亞甲基-1,2,3-苯并三唑、雙(N-2-乙基己基)胺基亞甲基-1,2,3-甲苯基三唑、雙(N-2-羥基乙基)胺基亞甲基-1,2,3-苯并三唑等。 Examples of the benzotriazoles include 1,2,3-benzotriazole, 1-chloro-1,2,3-benzotriazole, and bis(N-2-ethylhexyl)aminone. Methyl-1,2,3-benzotriazole, bis(N-2-ethylhexyl)aminomethylene-1,2,3-tolyltriazole, bis(N-2-hydroxyethyl) Aminomethylene-1,2,3-benzotriazole and the like.

作為羧基苯并三唑類,例如可列舉:4-羧基-1,2,3-苯并三唑、5-羧基-1,2,3-苯并三唑、(N,N-二丁基胺基)羧基苯并三唑、N-(N,N-二-2-乙基己基)胺基亞甲基羧基苯并三唑、N-(N,N-二-2-羥基乙基)胺基亞甲基羧基苯并三唑、N-(N,N-二-2-乙基己基)胺基伸乙基羧基苯并三唑等。 Examples of the carboxybenzotriazoles include 4-carboxy-1,2,3-benzotriazole, 5-carboxy-1,2,3-benzotriazole, and (N,N-dibutyl). Amino)carboxybenzotriazole, N-(N,N-di-2-ethylhexyl)aminomethylenecarboxybenzotriazole, N-(N,N-di-2-hydroxyethyl) Aminomethylenecarboxybenzotriazole, N-(N,N-di-2-ethylhexyl)amine-based ethylcarboxybenzotriazole, and the like.

感光性樹脂元件中之自由基聚合抑制劑、苯并三唑類、及/或羧基苯并三唑類之合計含量較佳為0.001質量%~3質量%,更佳之下限為0.05質量%,更佳之上限為1質量%。關於該合計含量,就對感光性樹脂組合物賦予保存穩定性之觀點而言,較佳為0.001質量%以上,就維持感度之觀點而言,較佳為3質量%以下。 The total content of the radical polymerization inhibitor, the benzotriazole, and/or the carboxybenzotriazole in the photosensitive resin element is preferably 0.001% by mass to 3% by mass, and more preferably 0.05% by mass or less. The upper limit is preferably 1% by mass. The total content is preferably 0.001% by mass or more from the viewpoint of imparting storage stability to the photosensitive resin composition, and is preferably 3% by mass or less from the viewpoint of maintaining sensitivity.

亦可視需要使調合液含有其他塑化劑。作為此種塑化劑,例如可列舉:聚乙二醇、聚丙二醇、聚氧丙烯聚氧乙烯醚、聚氧乙烯單甲醚、聚氧丙烯單甲醚、聚氧乙烯聚氧丙烯單甲醚、聚氧乙烯單乙醚、聚氧丙烯單乙醚、聚氧乙烯聚氧丙烯單乙醚等二醇/酯類,聚氧乙烯山梨醇酐月桂酸酯、聚氧乙烯山梨醇酐油酸酯等山梨醇酐衍生物,鄰苯二甲酸二乙酯等鄰苯二甲酸酯類,鄰甲苯磺醯胺、對甲苯磺醯胺、檸檬酸三丁酯、檸檬酸三乙酯、乙醯檸檬酸三乙酯、乙醯檸檬酸三正丙酯、及乙醯檸檬酸三正丁酯、於雙酚A之兩側分別加成環氧丙烷而成之丙二醇、於雙酚A之兩側分別加成環氧乙烷而成之乙二醇等。 The blending solution may also contain other plasticizers as needed. Examples of such a plasticizer include polyethylene glycol, polypropylene glycol, polyoxypropylene polyoxyethylene ether, polyoxyethylene monomethyl ether, polyoxypropylene monomethyl ether, and polyoxyethylene polyoxypropylene monomethyl ether. , diol/ester such as polyoxyethylene monoethyl ether, polyoxypropylene monoethyl ether, polyoxyethylene polyoxypropylene monoethyl ether, sorbitol such as polyoxyethylene sorbitan laurate, polyoxyethylene sorbitan oleate Anhydride derivative, phthalic acid ester such as diethyl phthalate, o-toluenesulfonamide, p-toluenesulfonamide, tributyl citrate, triethyl citrate, triethyl citrate , acetonitrile tri-n-propyl citrate, and tri-n-butyl citrate, propylene glycol formed by adding propylene oxide to both sides of bisphenol A, and epoxy added to both sides of bisphenol A Ethylene glycol and the like.

感光性樹脂元件中之塑化劑之含量較佳為0.1質量%~50質量%, 更佳之下限為1質量%,更佳之上限為30質量%。關於該含量,就抑制顯影時間之延遲,對硬化膜賦予柔軟性之觀點而言,較佳為0.1質量%以上,另一方面,就抑制硬化不足及感光層自輥端面滲出之邊緣熔融之觀點而言,較佳為50質量%以下。 The content of the plasticizer in the photosensitive resin element is preferably from 0.1% by mass to 50% by mass. A lower limit is preferably 1% by mass, and a more preferred upper limit is 30% by mass. With respect to the content, the retardation of the development time is suppressed, and from the viewpoint of imparting flexibility to the cured film, it is preferably 0.1% by mass or more. On the other hand, the viewpoint of suppressing insufficient hardening and melting of the edge of the photosensitive layer from the roll end surface is suppressed. Therefore, it is preferably 50% by mass or less.

亦可視需要使調合液含有其他抗氧化劑。作為抗氧化劑,例如可列舉:亞磷酸三苯酯、亞磷酸三(2,4-二第三丁基苯基)酯、亞磷酸三(單壬基苯基)酯、及亞磷酸二壬基苯酯雙(單壬基苯基)酯等。 The blending solution may also contain other antioxidants as needed. Examples of the antioxidant include triphenyl phosphite, tris(2,4-di-t-butylphenyl) phosphite, tris(monodecylphenyl) phosphite, and dinonyl phosphite. Phenyl ester bis(monodecylphenyl) ester and the like.

感光性樹脂元件中之抗氧化劑之含量較佳為0.01質量%~0.8質量%之範圍,更佳之下限為0.01質量%,更佳之上限為0.3質量%。於該含量為0.01質量%以上之情形時,良好地表現出感光性樹脂組合物之色相穩定性優異之效果,感光性樹脂組合物於曝光時之感度變得良好,故而較佳,另一方面,於該含量為0.8質量%以下之情形時,因顯色性受到抑制,故而色相穩定性變得良好,並且密接性亦變得良好,故而較佳。 The content of the antioxidant in the photosensitive resin element is preferably in the range of 0.01% by mass to 0.8% by mass, more preferably 0.01% by mass, and still more preferably 0.3% by mass. When the content is 0.01% by mass or more, the coloring stability of the photosensitive resin composition is excellent, and the sensitivity of the photosensitive resin composition at the time of exposure is good, and therefore, it is preferable. When the content is 0.8% by mass or less, the coloring property is suppressed, so that the hue stability is good and the adhesion is also good, which is preferable.

支持層係支持形成於其上之感光性樹脂層。又,感光性樹脂元件之製造方法可包括視需要於感光性樹脂層之與支持層側相反之側形成保護層之步驟。 The support layer supports the photosensitive resin layer formed thereon. Moreover, the method of manufacturing the photosensitive resin element may include a step of forming a protective layer on the side opposite to the support layer side of the photosensitive resin layer as needed.

作為支持層,較佳為使自曝光光源放射之光透過的透明支持層。作為此種支持層,例如可列舉:聚對苯二甲酸乙二酯膜、聚乙烯醇膜、聚氯乙烯膜、氯乙烯共聚物膜、聚偏二氯乙烯膜、偏二氯乙烯共聚物膜、聚甲基丙烯酸甲酯共聚物膜、聚苯乙烯膜、聚丙烯腈膜、苯乙烯共聚物膜、聚醯胺膜、及纖維素衍生物膜等。支持層就耐溶劑性、耐熱性、透明性等觀點而言較佳為聚酯膜。作為該等膜,亦可視需要使用經延伸者。支持層之霧度較佳為5以下。支持層之厚度較薄時於圖像形成性及經濟性方面有利,但就維持強度之需要而言,較佳為使用厚度為10μm~30μm者,更佳為12μm~16μm。尤佳之支持 層係厚度為12~16μm之聚酯膜。 As the support layer, a transparent support layer that transmits light emitted from the exposure light source is preferable. Examples of such a support layer include a polyethylene terephthalate film, a polyvinyl alcohol film, a polyvinyl chloride film, a vinyl chloride copolymer film, a polyvinylidene chloride film, and a vinylidene chloride copolymer film. A polymethyl methacrylate copolymer film, a polystyrene film, a polyacrylonitrile film, a styrene copolymer film, a polyamide film, a cellulose derivative film, or the like. The support layer is preferably a polyester film from the viewpoints of solvent resistance, heat resistance, transparency, and the like. As such films, an extender can also be used as needed. The haze of the support layer is preferably 5 or less. When the thickness of the support layer is thin, it is advantageous in terms of image formation property and economy. However, in order to maintain the strength, it is preferably used in a thickness of 10 μm to 30 μm, more preferably 12 μm to 16 μm. You Jia's support A polyester film having a layer thickness of 12 to 16 μm.

就製成積層體時之皺褶產生之觀點而言,自感光性樹脂元件剝離並經乾燥之聚酯膜於TD方向上之熱收縮率較佳為3.2%以下。上述所謂「經乾燥」意指已實質上去除聚酯膜中之揮發成分(例如殘留溶劑)。此種乾燥狀態例如可藉由於常壓、200℃下加熱30分鐘,繼而於常壓、室溫(例如20℃)下放置30分鐘而獲得。TD方向之熱收縮率係藉由下述[實施例]項所記載之方法或從業者認為與該方法同等之方法所測得之值。 The heat shrinkage ratio of the polyester film peeled off from the photosensitive resin element and dried in the TD direction is preferably 3.2% or less from the viewpoint of occurrence of wrinkles in the case of producing a laminate. The above-mentioned "drying" means that the volatile component (for example, a residual solvent) in the polyester film has been substantially removed. Such a dry state can be obtained, for example, by heating at normal pressure, heating at 200 ° C for 30 minutes, and then standing at normal pressure at room temperature (for example, 20 ° C) for 30 minutes. The heat shrinkage ratio in the TD direction is a value measured by the method described in the following [Examples] or the method considered by the practitioner to be equivalent to the method.

保護層較佳為具有如下性質,即,保護層與感光性樹脂層之密接力充分小於支持層與感光性樹脂層之密接力,從而可容易地剝離保護層。例如,可較佳地使用聚乙烯膜、及聚丙烯膜等作為保護層。作為保護層,例如可使用日本專利特開昭59-202457號公報所揭示之剝離性優異之膜。保護層之厚度較佳為10μm~100μm,更佳為10μm~50μm。 The protective layer preferably has such a property that the adhesion between the protective layer and the photosensitive resin layer is sufficiently smaller than the adhesion between the support layer and the photosensitive resin layer, so that the protective layer can be easily peeled off. For example, a polyethylene film, a polypropylene film, or the like can be preferably used as the protective layer. As the protective layer, for example, a film excellent in peelability as disclosed in JP-A-59-202457 can be used. The thickness of the protective layer is preferably from 10 μm to 100 μm, more preferably from 10 μm to 50 μm.

於感光性樹脂元件之製造方法中,將調合液應用於支持層上並加以乾燥而於支持層上形成感光性樹脂元件之步驟可藉由塗佈機構及視需要之乾燥機構進行。作為塗佈機構,例如可利用旋轉塗佈機、模具塗佈機、噴霧塗佈機、浸漬、印刷、刮刀塗佈機、輥塗等。作為乾燥機構,例如可利用風乾、熱風乾燥、光照射、加熱板、無氧化烘箱、可設定溫度程式之升溫式烘箱等。又,調合液所包含之複數種成分之調製與調合液之應用及乾燥可在空氣、或氮氣、氬氣等惰性氣體環境中進行。此時,藉由控制溫度及乾燥時間,可將感光性樹脂元件中之殘留溶劑量控制在所需範圍。 In the method for producing a photosensitive resin element, the step of applying the preparation liquid to the support layer and drying it to form a photosensitive resin element on the support layer can be carried out by a coating mechanism and a drying mechanism as needed. As the coating means, for example, a spin coater, a die coater, a spray coater, dipping, printing, a knife coater, roll coating, or the like can be used. As the drying means, for example, air drying, hot air drying, light irradiation, a hot plate, an oxidation-free oven, a temperature-increasing oven capable of setting a temperature program, or the like can be used. Further, the preparation and drying of the plurality of components contained in the preparation liquid can be carried out in an inert gas atmosphere such as air or nitrogen or argon. At this time, by controlling the temperature and the drying time, the amount of residual solvent in the photosensitive resin element can be controlled to a desired range.

藉由上述製造方法而製造之感光性樹脂元件較佳為用於印刷配線板之製造、IC晶片搭載用引線框架製造、金屬掩膜製造等金屬箔精密加工、球柵陣列(BGA,ball grid array)、或晶片級封裝(CSP,chip size package)等封裝之製造、覆晶薄膜(COF,chip-on-film)或捲帶式自動接合(TAB,tape automated bonding)等帶狀基板之製造、半導體凸塊之製造、氧化銦錫(ITO)電極或定址電極、電磁波遮罩等平板顯示器之間隔壁之製造。 The photosensitive resin element manufactured by the above-described production method is preferably used for manufacturing a printed wiring board, manufacturing a lead frame for IC chip mounting, metal foil manufacturing, and the like, and ball grid array (BGA). ), or wafer level package (CSP, chip Manufacturing of package such as size package), fabrication of strip substrate such as chip-on-film (COF) or tape automated bonding (TAB), fabrication of semiconductor bumps, indium tin oxide ( Manufacture of partition walls of flat panel displays such as ITO electrodes or address electrodes, electromagnetic wave masks, etc.

根據本實施形態之感光性樹脂元件,可良好地改善由對印刷電路之形成有用之感光性樹脂元件所形成之DF之外觀。 According to the photosensitive resin element of the present embodiment, the appearance of the DF formed of the photosensitive resin element useful for forming a printed circuit can be satisfactorily improved.

[實施例] [Examples]

以下,列舉實施例及比較例而更具體地說明本實施形態,但本發明只要不超出其主旨,則並不限定於實施例。 Hereinafter, the present embodiment will be more specifically described by way of examples and comparative examples, but the present invention is not limited to the examples as long as the scope of the invention is not exceeded.

[實施例1~14及比較例1~4] [Examples 1 to 14 and Comparative Examples 1 to 4]

調製表1所示之感光性樹脂組合物之成分,於溶解槽中進行攪拌溶解,並通過過濾器而過濾調合液。繼而,利用泵將調合液輸送至模具塗佈機而均勻地塗佈至作為支持層之聚對苯二甲酸乙二酯膜上,並輸送至乾燥區將溶劑乾燥去除。其後,層壓於作為保護層之聚乙烯膜上,獲得具有表1所記載之感光性樹脂層之厚度的DF。DF之膜厚為40μm。 The components of the photosensitive resin composition shown in Table 1 were prepared, stirred and dissolved in a dissolution tank, and the mixture was filtered through a filter. Then, the blending liquid was transferred by a pump to a die coater to be uniformly applied onto a polyethylene terephthalate film as a support layer, and sent to a drying zone to dry the solvent. Thereafter, it was laminated on a polyethylene film as a protective layer to obtain DF having the thickness of the photosensitive resin layer described in Table 1. The film thickness of DF was 40 μm.

於上述步驟中,藉由下文所示之方法進行邊緣熔融評估及切割屑評估。又,藉由下文所示之方法測定樹脂之重量平均分子量。結果見下文。 In the above steps, edge melting evaluation and chip cutting evaluation were performed by the method shown below. Further, the weight average molecular weight of the resin was measured by the method shown below. The results are shown below.

再者,作為支持層之聚對苯二甲酸乙二酯膜係使用帝人股份有限公司製造之GR-16(厚度16μm),而且作為保護層之聚乙烯膜係使用TAMAPOLY股份有限公司製造之GF-18(厚度19μm)。 Further, the polyethylene terephthalate film as the support layer was GR-16 (thickness: 16 μm) manufactured by Teijin Co., Ltd., and the polyethylene film used as the protective layer was GF-manufactured by TAMAPOLY Co., Ltd. 18 (thickness 19 μm).

(1)邊緣熔融評估 (1) Edge melting assessment

使用模具塗佈機將調合液塗佈至作為支持層之聚對苯二甲酸乙二酯膜上並將溶劑乾燥去除而形成感光性樹脂層後,進而於該感光性樹脂層上積層作為保護層之聚乙烯膜,而獲得支持層/感光性樹脂層/ 保護層之3層構造之積層體。捲取該積層體而形成輥狀積層體(使用切條機加工成寬度500mm、捲取長度150m),於20℃下保管該輥狀積層體。測定自保管開始至以目測確認到感光性樹脂層自輥端面之滲出為止之天數,並基於下述等級進行評估。 The preparation liquid is applied onto a polyethylene terephthalate film as a support layer by a die coater, and the solvent is dried and removed to form a photosensitive resin layer, and then a layer is laminated on the photosensitive resin layer as a protective layer. Polyethylene film to obtain support layer / photosensitive resin layer / A layered structure of a three-layer structure of a protective layer. This laminated body was taken up to form a roll-shaped laminated body (processed into a width of 500 mm and a winding length of 150 m using a slitter), and the roll-shaped laminated body was stored at 20 °C. The number of days from the start of storage to the visual observation of the bleeding of the photosensitive resin layer from the end surface of the roll was measured, and the evaluation was performed based on the following grade.

A:於50天以上發現感光性樹脂層之滲出。 A: Exudation of the photosensitive resin layer was observed over 50 days.

B:於30天以上且未達50天發現感光性樹脂層之滲出。 B: Exudation of the photosensitive resin layer was observed for 30 days or more and less than 50 days.

C:於10天以上且未達30天發現感光性樹脂層之滲出。 C: Exudation of the photosensitive resin layer was observed for 10 days or more and less than 30 days.

D:於未達10天發現感光性樹脂層之滲出。 D: Exudation of the photosensitive resin layer was observed in less than 10 days.

(2)切割屑評估 (2) Cutting chip evaluation

使用模具塗佈機將調合液塗佈至作為支持層之聚對苯二甲酸乙二酯膜上並將溶劑乾燥去除後,進而積層作為保護層之聚乙烯膜,以支持層/感光性樹脂層/保護層之3層構造獲得輥狀之積層體,自該積層體切出10cm×10cm之試樣。自切出之試樣剝離保護層,並自感光性樹脂層面側利用NT切割器(使用新切割刀)將積層體刺紮5次。目測觀察切割器刺紮之部分及切割刀表面,基於以下等級而評估感光性樹脂層切屑之產生狀況。 The coating liquid is applied onto a polyethylene terephthalate film as a support layer by a die coater, and the solvent is dried and removed, and then a polyethylene film as a protective layer is laminated to support the layer/photosensitive resin layer. The three-layer structure of the protective layer was obtained as a roll-like laminated body, and a sample of 10 cm × 10 cm was cut out from the laminated body. The self-cut sample was peeled off from the protective layer, and the laminate was punctured 5 times from the photosensitive resin layer side using an NT cutter (using a new cutter). The portion where the cutter was punctured and the surface of the dicing blade were visually observed, and the generation of chips of the photosensitive resin layer was evaluated based on the following grades.

A:於刺紮之部分完全未產生感光性樹脂層之切屑,於切割刀上亦完全未附著感光性樹脂層之切屑。 A: The chips of the photosensitive resin layer were not generated at all in the punctured portion, and the chips of the photosensitive resin layer were not attached to the dicing blade at all.

B:於切割刀上未附著感光性樹脂層之切屑,但於刺紮之部分產生了極少量之感光性樹脂層切屑。 B: The chips of the photosensitive resin layer were not attached to the dicing blade, but a very small amount of the photosensitive resin layer chips were generated in the punctured portion.

C:於刺紮之部分產生少量感光性樹脂層之切屑,於切割刀上亦附著少量之感光性樹脂層之切屑。 C: A small amount of chips of the photosensitive resin layer are generated in the punctured portion, and a small amount of chips of the photosensitive resin layer are also adhered to the dicing blade.

D:於刺紮之部分明顯地產生感光性樹脂層之切屑,於切割刀上亦明顯地附著感光性樹脂層之切屑。 D: The chips of the photosensitive resin layer were apparently produced in the punctured portion, and the chips of the photosensitive resin layer were also clearly adhered to the dicing blade.

(3)重量平均分子量及酸當量 (3) Weight average molecular weight and acid equivalent

藉由凝膠滲透層析法(標準聚苯乙烯換算)而測定樹脂之重量平均 分子量(Mw)。測定時所使用之管柱係昭和電工公司製造之商標名Shodex 805M/806M串接,標準單分散聚苯乙烯係選擇昭和電工股份有限公司製造之Shodex STANDARD SM-105,展開溶劑為N-甲基-2-吡咯啶酮,檢測器係使用昭和電工製造之商標名Shodex RI-930。 Determination of the weight average of the resin by gel permeation chromatography (standard polystyrene conversion) Molecular weight (Mw). The column used for the measurement was serially sold under the trade name Shodex 805M/806M manufactured by Showa Denko Co., Ltd., and the standard monodisperse polystyrene was selected from Shodex STANDARD SM-105 manufactured by Showa Denko Co., Ltd., and the solvent was N-methyl. -2-pyrrolidone, the detector was sold under the trade name Shodex RI-930 by Showa Denko.

又,酸當量係藉由電位差滴定法(使用平沼產業股份有限公司製造之平沼自動滴定裝置(COM-555),並使用0.1mol/L之氫氧化鈉)而測定。 Further, the acid equivalent was measured by a potentiometric titration method (using a homogenate automatic titrator (COM-555) manufactured by Hiranuma Sangyo Co., Ltd. and using 0.1 mol/L of sodium hydroxide).

(4)聚酯膜於TD方向上之熱收縮率 (4) Thermal shrinkage of polyester film in TD direction

使用模具塗佈機將調合液塗佈至作為支持層之聚對苯二甲酸乙二酯膜(作為聚酯膜)上並將溶劑乾燥去除後,進而積層作為保護層之聚乙烯膜,以支持層/感光性樹脂層/保護層之3層構造獲得輥狀之積層體,並自該積層體將保護層及感光性樹脂層剝離而獲得作為支持層之聚對苯二甲酸乙二酯膜。自該聚對苯二甲酸乙二酯膜切出寬度20mm、長度200mm之試片,於該試片之中央部隔開100mm之距離而標註2個記號,並將試片垂直懸掛於熱風循環式恆溫槽中,於常壓、200℃下加熱30分鐘。加熱後,於室溫、常壓下放置30分鐘後,測定記號間之距離並算出熱收縮率。 The coating liquid is applied onto a polyethylene terephthalate film (as a polyester film) as a support layer using a die coater, and the solvent is dried and removed, and then a polyethylene film as a protective layer is laminated to support In the three-layer structure of the layer/photosensitive resin layer/protective layer, a roll-shaped laminate is obtained, and the protective layer and the photosensitive resin layer are peeled off from the laminate to obtain a polyethylene terephthalate film as a support layer. A test piece having a width of 20 mm and a length of 200 mm was cut out from the polyethylene terephthalate film, and two marks were placed at a distance of 100 mm from the center of the test piece, and the test piece was vertically suspended in a hot air circulation type. In a constant temperature bath, it was heated at 200 ° C for 30 minutes under normal pressure. After heating, the mixture was allowed to stand at room temperature under normal pressure for 30 minutes, and the distance between the marks was measured to calculate the heat shrinkage ratio.

(5)感光性樹脂層中之殘留溶劑之質量比率 (5) Mass ratio of residual solvent in the photosensitive resin layer

藉由自與上述(4)同樣地形成之輥狀之積層體將保護層及支持層剝離而獲得之感光性樹脂層之氣相層析法測定,而獲得殘留溶劑之質量比率、及殘留溶劑中之比率。 By measuring the photosensitive resin layer obtained by peeling the protective layer and the support layer from the roll-like laminated body formed in the same manner as in the above (4), the mass ratio of the residual solvent and the residual solvent are obtained. The ratio in the middle.

(比較例4) (Comparative Example 4)

將比較例1之感光性樹脂組合物之調合液均勻地塗佈至厚度20μm之聚對苯二甲酸乙二酯膜(霧度:1.8)上,並於100℃之熱風滯留式乾燥機中乾燥10分鐘,而獲得感光性膜。感光性樹脂層於乾燥後之膜厚為25μm。固形物成分質量比率為43%,殘留丙酮之質量比率為 0%。該DF之各種評估結果如下。 The preparation liquid of the photosensitive resin composition of Comparative Example 1 was uniformly applied onto a polyethylene terephthalate film (haze: 1.8) having a thickness of 20 μm, and dried in a hot air retention type dryer at 100 ° C. 10 minutes to obtain a photosensitive film. The film thickness of the photosensitive resin layer after drying was 25 μm. The mass ratio of solid components is 43%, and the mass ratio of residual acetone is 0%. The various evaluation results of the DF are as follows.

邊緣熔融評估:B,切割屑評估:D。 Edge melt evaluation: B, chip removal evaluation: D.

<符號說明> <Symbol description>

P-1:甲基丙烯酸甲酯67質量%、甲基丙烯酸23質量%、丙烯酸丁酯10質量%之三元共聚物之丙酮與乙醇混合溶液((溶劑質量比率:丙酮/乙醇=80/20),固形物成分質量比率34%,重量平均分子量20萬,酸當量374) P-1: a mixed solution of acetone and ethanol of a terpolymer of 67% by mass of methyl methacrylate, 23% by mass of methacrylic acid, and 10% by mass of butyl acrylate ((solvent ratio: acetone/ethanol = 80/20) ), solid content component mass ratio 34%, weight average molecular weight 200,000, acid equivalent 374)

P-2:甲基丙烯酸甲酯50質量%、甲基丙烯酸25質量%、苯乙烯25質量%之三元共聚物之丙酮與乙醇混合溶液((溶劑質量比率:丙酮/乙醇=75/25),固形物成分質量比率47%,重量平均分子量5萬,酸當量344) P-2: a mixed solution of acetone and ethanol of a terpolymer of 50% by mass of methyl methacrylate, 25% by mass of methacrylic acid, and 25% by mass of styrene ((solvent mass ratio: acetone/ethanol = 75/25) , solid matter mass ratio 47%, weight average molecular weight 50,000, acid equivalent 344)

P-3:甲基丙烯酸甲酯50質量%、甲基丙烯酸25質量%、苯乙烯25質量%之三元共聚物之甲基乙基酮與乙醇混合溶液((溶劑質量比率:甲基乙基酮/乙醇=75/25),固形物成分質量比率45%,重量平均分子量5萬,酸當量344) P-3: a mixed solution of methyl ethyl ketone and ethanol of a terpolymer of 50% by mass of methyl methacrylate, 25% by mass of methacrylic acid and 25% by mass of styrene ((solvent mass ratio: methyl ethyl group) Ketone/ethanol = 75/25), solid content ratio 45%, weight average molecular weight 50,000, acid equivalent 344)

M-1:於雙酚A之兩端分別加成各平均2莫耳之環氧乙烷而成之聚乙二醇之二甲基丙烯酸酯(新中村化學股份有限公司製造之BPE-200) M-1: a polyethylene glycol dimethacrylate obtained by adding an average of 2 moles of ethylene oxide to both ends of bisphenol A (BPE-200 manufactured by Shin-Nakamura Chemical Co., Ltd.)

M-2:於雙酚A之兩端分別加成各平均5莫耳之環氧乙烷而成之聚乙二醇之二甲基丙烯酸酯(新中村化學股份有限公司製造之BPE-500) M-2: Diethylene glycol dimethacrylate (each BPE-500 manufactured by Shin-Nakamura Chemical Co., Ltd.) obtained by adding an average of 5 moles of ethylene oxide to both ends of bisphenol A.

M-3:於雙酚A之兩端分別加成平均2莫耳之環氧丙烷及平均6莫耳之環氧乙烷而成之聚伸烷基二醇之二甲基丙烯酸酯 M-3: Dimethyl methacrylate of a polyalkylene glycol formed by adding an average of 2 moles of propylene oxide and an average of 6 moles of ethylene oxide to both ends of bisphenol A

M-4:對加成有平均12莫耳之環氧丙烷之聚丙二醇進而於兩端分別加成各平均3莫耳之環氧乙烷而成之聚伸烷基二醇之二甲基丙烯酸酯 M-4: a dialkyl diol obtained by adding a polypropylene propylene glycol having an average of 12 moles of propylene oxide and further adding an average of 3 moles of ethylene oxide to both ends. ester

M-5:於三羥甲基丙烷加成平均3莫耳之環氧乙烷而成之丙烯酸酯(新中村化學股份有限公司製造之A-TMPT-3EO) M-5: an acrylate obtained by adding an average of 3 moles of ethylene oxide to trimethylolpropane (A-TMPT-3EO manufactured by Shin-Nakamura Chemical Co., Ltd.)

M-6:4-壬基苯基五乙二醇二丙二醇丙烯酸酯 M-6: 4-mercaptophenylpentaethylene glycol dipropylene glycol acrylate

M-7:對異佛酮二異氰酸酯於兩末端加成聚丙二醇丙烯酸酯而成之丙烯酸胺基甲酸酯化合物(式III中,R7=R8=H,R9、R10、R11=CH3,n5=n6=0,n7=n8=12之化合物) M-7: an urethane urethane compound obtained by adding polypropylene glycol acrylate to both ends of isophorone diisocyanate (in the formula III, R 7 = R 8 = H, R 9 , R 10 , R 11 =CH 3 ,n 5 =n 6 =0,n 7 =n 8 =12)

I-1:4,4'-雙(二乙基胺基)二苯甲酮 I-1: 4,4'-bis(diethylamino)benzophenone

I-2:2-(鄰氯苯基)-4,5-二苯基咪唑二聚物 I-2: 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer

D-1:鑽石綠 D-1: Diamond Green

D-2:隱色結晶紫 D-2: leuco crystal violet

A-1:對甲苯磺醯胺 A-1: p-toluenesulfonamide

A-2:苯并三唑 A-2: benzotriazole

A-3:加成有3莫耳之亞硝基苯基羥胺之鋁鹽 A-3: Addition of 3 moles of aluminum salt of nitrosophenylhydroxylamine

A-4:於雙酚A之兩端分別加成平均2莫耳之環氧丙烷而成之聚丙二醇 A-4: Polypropylene glycol obtained by adding an average of 2 moles of propylene oxide to both ends of bisphenol A

A-5:Ciba Specialty Chemicals股份有限公司製造之IRGANOX 245 A-5: IRGANOX 245 manufactured by Ciba Specialty Chemicals, Inc.

A-6:Newcol 3-85(日本乳化劑股份有限公司製造) A-6: Newcol 3-85 (manufactured by Nippon Emulsifier Co., Ltd.)

S-1:乙醇 S-1: ethanol

S-2:丙二醇單甲醚 S-2: propylene glycol monomethyl ether

S-3:甲苯 S-3: toluene

[產業上之可利用性] [Industrial availability]

本發明之感光性樹脂元件可用於印刷配線板之製造、IC晶片搭載用引線框架製造、金屬掩膜製造等金屬箔精密加工、BGA、或CSP等封裝之製造、COF或TAB等帶狀基板之製造、半導體凸塊之製造、ITO電極或定址電極、電磁波遮罩等平板顯示器之間隔壁之製造。 The photosensitive resin element of the present invention can be used for manufacturing a printed wiring board, manufacturing a lead frame for IC chip mounting, metal foil precision processing such as metal mask manufacturing, manufacturing of a package such as BGA or CSP, or a strip substrate such as COF or TAB. Fabrication of manufacturing, fabrication of semiconductor bumps, spacers for flat panel displays such as ITO electrodes or address electrodes, and electromagnetic wave masks.

Claims (10)

一種感光性樹脂元件,其係包含支持層、及上述支持層上之感光性樹脂層之感光性樹脂元件,並且上述感光性樹脂層包含(a)羧基含量以酸當量計為100~600且重量平均分子量為5000~500000之黏合劑用樹脂、(b)可進行光聚合之不飽和化合物、(c)光聚合起始劑、及(d)溶劑,上述感光性樹脂層以上述感光性樹脂層之質量基準計以0.001質量%以上且1質量%以下之量包含上述(d)溶劑,上述感光性樹脂層包含選自下述通式(I)~(III)中之1種以上化合物作為上述(b)可進行光聚合之不飽和化合物, (式中,R1及R2分別獨立地表示氫原子或甲基,A表示C2H4基,B表示CH2CH(CH3)基,m1+m2為2~30之整數,m3+m4為0~30之整數,m1及m2分別獨立為1~29之整數,m3及m4分別獨立 為0~29之整數,-(A-O)-及-(B-O)-之重複單元之排列可為無規亦可為嵌段,於嵌段之情形時,-(A-O)-及-(B-O)-之任一者可於聯苯基側) (式中,R3表示氫原子或碳數為1~8之一價有機基,R4、R5及R6分別獨立地表示氫原子或甲基,D表示碳數2~6之伸烷基,n1、n2及n3為滿足n1+n2+n3=3~60之0以上之整數,n4為0或1,其中,式中存在複數個之D可分別相同亦可不同,-(O-D)-之重複結構可為無規亦可為嵌段) (式中,R7~R11分別獨立地表示氫原子或甲基,A1表示C2H4基,B1表示CH2CH(CH3)基,n5+n6為0~30之整數,n7+n8為0~30之整數,n5及n6分別獨立為0~30之整數,n7及n8分別獨立為0~30之整數,-(O-A1)-及-(O-B1)-之重複單元之排列亦可為無規亦可為嵌段,於嵌段之情形時,-(O-A1)-及-(O-B1)-之任一者可於胺基甲酸酯基側)。 A photosensitive resin element comprising a support layer and a photosensitive resin element of the photosensitive resin layer on the support layer, wherein the photosensitive resin layer contains (a) a carboxyl group content of from 100 to 600 in terms of acid equivalent weight a resin for a binder having an average molecular weight of 5,000 to 500,000, (b) a photopolymerizable unsaturated compound, (c) a photopolymerization initiator, and (d) a solvent, wherein the photosensitive resin layer is a photosensitive resin layer The (d) solvent is contained in an amount of 0.001% by mass or more and 1% by mass or less, and the photosensitive resin layer contains one or more compounds selected from the following general formulae (I) to (III) as the above-mentioned (b) an unsaturated compound which is photopolymerizable, (wherein R 1 and R 2 each independently represent a hydrogen atom or a methyl group, A represents a C 2 H 4 group, B represents a CH 2 CH(CH 3 ) group, and m 1 + m 2 is an integer of 2 to 30, m 3 + m 4 is an integer from 0 to 30, m 1 and m 2 are each independently an integer from 1 to 29, and m 3 and m 4 are each independently an integer from 0 to 29, -(AO)- and -(BO). - the arrangement of the repeating units may be random or block, and in the case of a block, any of -(AO)- and -(BO)- may be on the biphenyl side) (wherein R 3 represents a hydrogen atom or a one-valent organic group having 1 to 8 carbon atoms; R 4 , R 5 and R 6 each independently represent a hydrogen atom or a methyl group, and D represents a hydrocarbon having 2 to 6 carbon atoms; The base, n 1 , n 2 and n 3 are integers of 0 or more satisfying n 1 + n 2 + n 3 = 3 to 60, and n 4 is 0 or 1, wherein a plurality of Ds in the formula may be the same Differently, the repeating structure of -(OD)- can be random or block) (wherein R 7 to R 11 each independently represent a hydrogen atom or a methyl group, A 1 represents a C 2 H 4 group, B 1 represents a CH 2 CH(CH 3 ) group, and n 5 + n 6 is 0 to 30 Integer, n 7 + n 8 is an integer from 0 to 30, n 5 and n 6 are each an integer of 0 to 30, and n 7 and n 8 are each independently an integer of 0 to 30, -(OA 1 )-and- The arrangement of the repeating units of (OB 1 )- may also be random or block, and in the case of a block, any of -(OA 1 )- and -(OB 1 )- may be used in the amine group. Acid ester side). 如請求項1之感光性樹脂元件,其包含丙二醇單甲醚作為上述(d)溶劑。 The photosensitive resin element of claim 1, which comprises propylene glycol monomethyl ether as the above (d) solvent. 如請求項1之感光性樹脂元件,其包含甲苯作為上述(d)溶劑。 The photosensitive resin element of claim 1, which contains toluene as the above (d) solvent. 如請求項1之感光性樹脂元件,其包含丙酮作為上述(d)溶劑。 The photosensitive resin element of claim 1, which comprises acetone as the above (d) solvent. 如請求項1至4中任一項之感光性樹脂元件,其包含上述通式(I)所表示之化合物及上述通式(II)所表示之化合物作為上述(b)可進行光聚合之不飽和化合物。 The photosensitive resin element according to any one of claims 1 to 4, which comprises the compound represented by the above formula (I) and the compound represented by the above formula (II) as the above (b) photopolymerizable Saturated compound. 如請求項1至4中任一項之感光性樹脂元件,其包含上述通式(I)所表示之化合物及上述通式(III)所表示之化合物作為上述(b)可進行光聚合之不飽和化合物。 The photosensitive resin element according to any one of claims 1 to 4, which comprises the compound represented by the above formula (I) and the compound represented by the above formula (III) as the above (b) photopolymerizable Saturated compound. 如請求項1至4中任一項之感光性樹脂元件,其包含上述通式(II)所表示之化合物及上述通式(III)所表示之化合物作為上述(b)可進行光聚合之不飽和化合物。 The photosensitive resin element according to any one of claims 1 to 4, which comprises the compound represented by the above formula (II) and the compound represented by the above formula (III) as the above (b) photopolymerizable Saturated compound. 如請求項1至7中任一項之感光性樹脂元件,其中上述支持層為聚酯膜。 The photosensitive resin member according to any one of claims 1 to 7, wherein the support layer is a polyester film. 如請求項8之感光性樹脂元件,其中自上述感光性樹脂元件剝離並經乾燥之上述聚酯膜於TD方向上之熱收縮率為3.2%以下。 The photosensitive resin element of claim 8, wherein the polyester film peeled off from the photosensitive resin element and dried in the TD direction has a heat shrinkage ratio of 3.2% or less. 如請求項8或9之感光性樹脂元件,其中上述聚酯膜之膜厚為12μm~16μm。 The photosensitive resin element according to claim 8 or 9, wherein the polyester film has a film thickness of from 12 μm to 16 μm.
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KR102494967B1 (en) * 2017-02-01 2023-02-02 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device produced using the same
CN108490737B (en) * 2018-03-14 2021-11-02 杭州福斯特电子材料有限公司 Photosensitive resin composition and application thereof
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JP7376712B2 (en) * 2019-12-31 2023-11-08 コーロン インダストリーズ インク Photosensitive resin composition and dry film photoresist, photosensitive element, circuit board, and display device using the same
JP2023509597A (en) * 2019-12-31 2023-03-09 コーロン インダストリーズ インク Photosensitive resin layer, dry film photoresist using the same, and photosensitive element
CN114761874A (en) * 2019-12-31 2022-07-15 可隆工业株式会社 Photosensitive resin layer, dry film photoresist using the same, and photosensitive element
JP7376723B2 (en) * 2019-12-31 2023-11-08 コーロン インダストリーズ インク Photosensitive resin composition and dry film photoresist, photosensitive element, circuit board, and display device using the same
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Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11143069A (en) 1997-11-10 1999-05-28 Fuji Photo Film Co Ltd Master plate for printed wiring
SG85613A1 (en) * 1998-02-06 2002-01-15 Morton Int Inc Photoimageable compositions having hydrophilic binder polymers and hydrophilic monomers
JP2001312056A (en) * 2000-04-27 2001-11-09 Nichigo Morton Co Ltd Photosensitive resin composition and photosensitive film using the same
JP3824508B2 (en) * 2001-08-10 2006-09-20 旭化成エレクトロニクス株式会社 Dry film resist and manufacturing method thereof
JP2006106287A (en) * 2004-10-04 2006-04-20 Hitachi Chem Co Ltd Photosensitive resin composition, photosensitive element and method for manufacturing photosensitive element
JP4966528B2 (en) * 2005-09-14 2012-07-04 旭化成イーマテリアルズ株式会社 Pattern forming material, pattern forming apparatus and pattern forming method
JP2007310201A (en) * 2006-05-19 2007-11-29 Kaneka Corp Photosensitive dry film resist and printed wiring board using the same
JP2008239743A (en) * 2007-03-27 2008-10-09 Toray Ind Inc Polyester film for dry film resist carrier
JP2011048270A (en) * 2009-08-28 2011-03-10 Hitachi Chem Co Ltd Photosensitive element, method for forming resist pattern using the same, and method for manufacturing printed wiring board
KR20110041925A (en) * 2009-10-16 2011-04-22 삼성전자주식회사 Double layered patternable adhesive film, method of preparing the same, and method for forming patternable adhesive layer using the same
JP2011257632A (en) * 2010-06-10 2011-12-22 Hitachi Chem Co Ltd Photosensitive element, method for forming resist pattern using the same, and method for producing lead frame and printed wiring board
JP5688116B2 (en) * 2013-05-13 2015-03-25 太陽ホールディングス株式会社 Photo-curable thermosetting resin composition, dry film and cured product thereof, and printed wiring board using them

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