TW201521098A - Adhesive material cutting method and adhesive material cutting apparatus - Google Patents

Adhesive material cutting method and adhesive material cutting apparatus Download PDF

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Publication number
TW201521098A
TW201521098A TW103132352A TW103132352A TW201521098A TW 201521098 A TW201521098 A TW 201521098A TW 103132352 A TW103132352 A TW 103132352A TW 103132352 A TW103132352 A TW 103132352A TW 201521098 A TW201521098 A TW 201521098A
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TW
Taiwan
Prior art keywords
workpiece
substrate
metal wire
cutting
adhesive body
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TW103132352A
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Chinese (zh)
Inventor
Takao Matsushita
Atsushi Hashimoto
Shinichirou Mori
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Nitto Denko Corp
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Publication of TW201521098A publication Critical patent/TW201521098A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26FPERFORATING; PUNCHING; CUTTING-OUT; STAMPING-OUT; SEVERING BY MEANS OTHER THAN CUTTING
    • B26F3/00Severing by means other than cutting; Apparatus therefor
    • B26F3/06Severing by using heat
    • B26F3/08Severing by using heat with heated members
    • B26F3/12Severing by using heat with heated members with heated wires
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D7/00Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
    • B26D7/08Means for treating work or cutting member to facilitate cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment

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  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Forests & Forestry (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
  • Adhesive Tapes (AREA)

Abstract

Provided are an adhesive material cutting method and an adhesive material cutting apparatus. A metal wire drawn from a reel and moving toward a direction is directed between guide pins. The guide pins are electrified via the metal wire to heat the metal wire between the guide pins. The metal wire is abutted against the outer periphery of a substrate held by an adsorption table with a diameter less than the substrate, and the sealing sheet exposed from the substrate W is cut in the radial direction, such that the adsorption table is rotated to make the metal wire cut the excessive portion of the sealing sheet along the outer periphery of the substrate.

Description

黏著體的切斷方法及黏著體的切斷裝置 Method for cutting adhesive body and cutting device for adhesive body

本發明係有關一種將貼附於半導體元件、半導體晶圓及電路基板等之工件的密封片、表面保護用黏著帶及黏著片等之黏著體按工件形狀切斷之黏著體的切斷方法及黏著體的切斷裝置。 The present invention relates to a method of cutting an adhesive body which is attached to a workpiece such as a semiconductor element, a semiconductor wafer, a circuit board, or the like, a sealing sheet for a surface protection, and an adhesive sheet such as an adhesive sheet, and the like. The cutting device for the adhesive.

已提案及實施一種將貼附於半導體晶圓(以下,適當地稱為「晶圓」)的電路面之表面保護用保護片沿著該半導體晶圓外徑切斷之方法。亦即,一邊變更刀具的角度及旋轉方向,一邊使該刀具沿著半導體晶圓的圓弧部分與缺口部分將保護片切斷。具體言之,從缺口的近旁將刀具扎入,使刀具的側面沿著缺口的一方傾斜面迄達裏端將保護帶切斷。之後,沿著切斷軌道使該刀具後退至刻痕開始的初期位置,變更刀尖的方向並沿著圓弧部分切斷保護帶。然後,當刀具一到達缺口的另一方的開口端時即變更刀具的角度,使刀具的側面沿著缺口的傾斜面迄達裏端為止將保護帶切斷,並與前半段的刻痕繋接而剪下保護帶。(參照日本國特開2009-125871號公報)。 A method of cutting a surface protection sheet attached to a circuit surface of a semiconductor wafer (hereinafter, referred to as "wafer" as appropriate) along the outer diameter of the semiconductor wafer has been proposed and implemented. That is, while changing the angle and the direction of rotation of the tool, the tool is cut along the arc portion and the notch portion of the semiconductor wafer. Specifically, the cutter is inserted from the vicinity of the notch so that the side of the cutter is cut along the inclined surface of the notch to the inner end. Thereafter, the tool is moved back to the initial position at which the scoring starts along the cutting rail, and the direction of the cutting edge is changed to cut the protective tape along the arc portion. Then, when the tool reaches the open end of the other side of the notch, the angle of the tool is changed, so that the side of the tool is cut along the inclined surface of the notch until the inner end reaches the inner end, and is connected with the first half of the score. And cut off the protective tape. (Refer to Japanese Patent Laid-Open Publication No. 2009-125871).

先行技術文獻 Advanced technical literature 專利文獻 Patent literature

專利文獻1 日本國特開2009-125871號公報 Patent Document 1 Japanese Patent Laid-Open Publication No. 2009-125871

近年伴隨高密度封裝之要求,有晶圓的厚度變薄的傾向。由於晶圓的剛性會伴隨該薄型化而降低,故有表面保護用黏著帶是利用採用了比以往厚或硬質的基材之黏著帶的情形。 In recent years, with the demand for high-density packaging, the thickness of the wafer tends to be thin. Since the rigidity of the wafer is reduced in accordance with the reduction in thickness, the surface protective adhesive tape is a case where an adhesive tape of a substrate thicker or harder than the conventional one is used.

由於是用刀具來切斷增加了厚度及硬度的黏著帶,所以因刀具的磨耗或缺損所導致的品質降低變得顯著。又,由於黏著劑對刀具之附著會使之變鈍,所以會發生所謂無法將黏著帶以良好精度切斷之問題。 Since the adhesive tape having increased thickness and hardness is cut by a cutter, the quality deterioration due to abrasion or defect of the cutter becomes remarkable. Further, since the adhesion of the adhesive to the cutter is made dull, there is a problem that the adhesive tape cannot be cut with good precision.

本發明係有鑒於此種情況而完成者,主要目的為提供一種可將貼附於工件的黏著體長期以良好精度切斷之黏著體的切斷方法及黏著體的切斷裝置。 The present invention has been made in view of such circumstances, and it is a primary object of the invention to provide a cutting method for an adhesive body capable of cutting an adherend attached to a workpiece with good precision for a long period of time and a cutting device for the adhesive body.

本發明為達成此種目的,採取如次者的構成。 In order to achieve such a purpose, the present invention adopts the composition of the second.

亦即,係將貼附於工件的黏著體沿著工件的外形切斷之黏著體的切斷方法,使行進的金屬線抵接於自前述工件露出的黏著體,將該抵接部位的金屬線通電,一邊加熱一邊切斷黏著體。 In other words, the adhesive body attached to the workpiece is cut along the outer shape of the workpiece, and the traveling metal wire is brought into contact with the adhesive body exposed from the workpiece, and the metal of the contact portion is abutted. The wire is energized and the adhesive is cut while heating.

依據上述方法,因為使金屬線一邊行進一邊切斷黏著體,所以沒有將在切斷時附著有黏著劑或樹脂等的金屬線的部分再利用之情形。亦即,可使未被污染的金屬線的部位始終抵接黏著體並切斷。又,因為一邊加熱金屬線一邊切斷黏著體,所以可使具有硬質基材之黏著帶或較厚的密封片軟化而容易切斷。因此,不論黏著體的種類,均可將黏著體長期地沿著工件形狀以良好精度切斷。 According to the above method, the metal wire is cut while the metal wire is being moved. Therefore, the portion where the metal wire such as the adhesive or the resin is adhered at the time of cutting is not reused. That is, the portion of the uncontaminated metal wire can be always abutted against the adhesive and cut. Moreover, since the adhesive body is cut while heating the metal wire, the adhesive tape having a hard base material or a thick sealing sheet can be softened and cut easily. Therefore, regardless of the type of the adherend, the adherend can be cut with good precision along the shape of the workpiece for a long time.

此外,關於上述方法,亦可使工件旋轉並使金屬線與該旋轉速度同步地行進。 Further, with the above method, the workpiece can be rotated and the wire can travel in synchronization with the rotation speed.

依此方法,透過工件的旋轉與金屬線的行進之乘數效果,可將黏著體以高速且以良好精度切斷。 According to this method, the adherend can be cut at a high speed and with good precision by the multiplier effect of the rotation of the workpiece and the progress of the metal wire.

又,關於上述方法,係以因應於工件外周的凹凸形狀調整金屬線的張力,俾在抵接部位之金屬線的推壓成為一定者較佳。 Further, in the above method, it is preferable to adjust the tension of the metal wire in accordance with the uneven shape of the outer circumference of the workpiece, and it is preferable that the pressing of the metal wire at the contact portion is constant.

例如,在形成有被形成於工件外周的定位用缺口之情況,朝工件外周進行推壓的金屬線是追隨著缺口形狀行進。因此,金屬線係可按照外周具有凹凸的工件形狀將黏著體以良好精度切斷。 For example, in the case where the positioning notch formed on the outer circumference of the workpiece is formed, the metal wire pressed against the outer circumference of the workpiece travels following the notch shape. Therefore, the metal wire can cut the adhesive body with good precision in accordance with the shape of the workpiece having irregularities on the outer circumference.

又,本發明為達成此種目的,採取如次者的構成。 Further, in order to achieve such a purpose, the present invention adopts a configuration as the second.

亦即,一種黏著體的切斷裝置,係將貼附於工件的黏著體沿著工件的外形切斷之黏著體的切斷裝置,該裝置包含以下構成;保持台,將前述工件載置保持;切斷機構,使金屬線抵接於自前述工件露出的黏著 體以切斷黏著體;及旋轉驅動機構,以金屬線沿著前述工件的外形行進的方式使保持台與金屬線相對旋轉,前述切斷機構具備:驅動機構,藉由導輥引導前述金屬線在切斷部位行進;及電源部,經由夾著前述黏著體與金屬線之抵接部位而配置之一對導銷使該導銷間的金屬線導通。 That is, an adhesive cutting device is a cutting device for adhering an adhesive attached to a workpiece along an outer shape of the workpiece, the device comprising the following structure; a holding table for holding the workpiece Cutting mechanism to make the metal wire abut on the adhesive exposed from the aforementioned workpiece The body is configured to cut the adhesive body; and the rotation driving mechanism rotates the holding table and the metal wire so that the metal wire travels along the outer shape of the workpiece. The cutting mechanism includes: a driving mechanism, and the wire is guided by the guide roller The power supply unit is disposed to pass through one of the contact portions of the adhesive body and the metal wire, and the metal wire between the guide pins is electrically connected.

依此構成,可經由導銷使通過該導銷間的金屬線通電而加熱。亦即,將不因黏著體之切斷而污染的金屬線部分一邊加熱一邊抵接於黏著體,可使該黏著體一邊軟化一邊切斷。因此,依此構成,可適當地實施上述方法。 According to this configuration, the wire passing through the guide pin can be electrically heated by the guide pin. In other words, the portion of the wire that is not contaminated by the cutting of the adherend is heated while abutting against the adherend, and the adhesive can be cut while being softened. Therefore, according to this configuration, the above method can be suitably carried out.

此外,上述裝置係以具備調整導銷間之金屬線的張力之張力調整機構者較佳。 Further, the above apparatus is preferably a tension adjusting mechanism having a tension for adjusting a wire between the guide pins.

依此構成,使金屬線追隨被形成於工件外周的凹凸,可以良好精度切斷黏著體。 According to this configuration, the metal wire follows the irregularities formed on the outer circumference of the workpiece, and the adherend can be cut with good precision.

依據本發明之黏著體的切斷方法及黏著體的切斷裝置,無關乎黏著體的種類‧特性及工件形狀,均可沿著工件形狀將黏著體以良好精度切斷。 According to the cutting method of the adherend and the cutting device for the adherend according to the present invention, the adherend can be cut with good precision along the shape of the workpiece irrespective of the type of the adhesive, the characteristics, and the shape of the workpiece.

1‧‧‧基板供給/回收部 1‧‧‧Substrate supply/recycling department

2‧‧‧基板搬送機構 2‧‧‧Substrate transport mechanism

3‧‧‧校準台 3‧‧‧ Calibration table

4‧‧‧第1蓋膜供給部 4‧‧‧1st cover film supply department

5‧‧‧密封片供給部 5‧‧‧Seaner supply unit

6‧‧‧第1搬送機構 6‧‧‧1st transport agency

7‧‧‧第2蓋膜供給部 7‧‧‧2nd cover film supply department

8‧‧‧第2搬送機構 8‧‧‧2nd transport agency

9‧‧‧第3搬送機構 9‧‧‧3rd transport agency

10‧‧‧貼附單元 10‧‧‧ Attachment unit

11‧‧‧第1剝離單元 11‧‧‧1st stripping unit

12‧‧‧工件搬送機構 12‧‧‧Workpiece transport mechanism

13‧‧‧切斷裝置 13‧‧‧cutting device

14‧‧‧第2剝離單元 14‧‧‧2nd peeling unit

16‧‧‧機械手臂 16‧‧‧ Robotic arm

17‧‧‧白努利夾盤 17‧‧‧White Nuoli chuck

18‧‧‧定位用銷 18‧‧‧ Positioning pins

19‧‧‧定位用孔 19‧‧‧Positioning holes

20‧‧‧吸附搬送用孔 20‧‧‧Adsorption transport hole

21‧‧‧第1保持部 21‧‧‧1st Maintenance Department

22‧‧‧定位用銷 22‧‧‧ Positioning pins

23‧‧‧第1蓋膜用吸附墊 23‧‧‧1st cover film adsorption pad

24‧‧‧密封片用吸附墊 24‧‧‧Adhesive pad for sealing sheet

26‧‧‧第2保持部 26‧‧‧2nd Maintenance Department

27‧‧‧定位用孔 27‧‧‧Positioning holes

29‧‧‧密封片用吸附墊 29‧‧‧Adhesive pad for sealing sheet

30‧‧‧定位用銷 30‧‧‧ Positioning pins

32‧‧‧上側加壓單元 32‧‧‧Upper pressurizing unit

33‧‧‧下側加壓單元 33‧‧‧Bottom pressurizing unit

34‧‧‧缸體 34‧‧‧Cylinder block

35‧‧‧推壓構件 35‧‧‧ Pushing members

37‧‧‧保持台 37‧‧‧ Keeping the table

38、39‧‧‧吸附墊 38, 39‧‧‧Adsorption pad

41‧‧‧帶供給部 41‧‧‧With the supply department

42‧‧‧帶回收部 42‧‧‧With recycling department

43‧‧‧貼附輥 43‧‧‧ Attachment roller

44‧‧‧缸體 44‧‧‧Cylinder block

46‧‧‧保持部 46‧‧‧ Keeping Department

47‧‧‧吸附墊 47‧‧‧Adsorption pad

49‧‧‧保持台 49‧‧‧ Keeping the table

50‧‧‧切斷單元 50‧‧‧cutting unit

51‧‧‧吸附板 51‧‧‧Adsorption plate

52‧‧‧相機 52‧‧‧ camera

53‧‧‧第1可動台 53‧‧‧1st movable table

54‧‧‧第2可動台 54‧‧‧2nd movable table

55‧‧‧導軌 55‧‧‧rail

56‧‧‧導軌 56‧‧‧rails

60‧‧‧金屬線供給部 60‧‧‧Metal wire supply department

61‧‧‧切斷部 61‧‧‧cutting department

62‧‧‧金屬線捲繞部 62‧‧‧Wire winding department

63‧‧‧金屬線 63‧‧‧Metal wire

64‧‧‧捲筒 64‧‧‧ reel

65‧‧‧旋轉軸 65‧‧‧Rotary axis

66‧‧‧導銷 66‧‧‧Marketing

67‧‧‧電源部 67‧‧‧Power Supply Department

68‧‧‧控制器 68‧‧‧ Controller

69‧‧‧張力輥 69‧‧‧ Tension roller

70‧‧‧空捲筒 70‧‧‧ empty reel

71‧‧‧捲繞軸 71‧‧‧Rolling shaft

72‧‧‧馬達 72‧‧‧Motor

75‧‧‧帶供給部 75‧‧‧With the supply department

76‧‧‧剝離棒 76‧‧‧ peeling bar

77‧‧‧帶回收部 77‧‧With recycling department

78‧‧‧原料輥 78‧‧‧ Raw material roll

79‧‧‧導引輥 79‧‧‧ Guide roller

80‧‧‧捲繞軸 80‧‧‧Winding shaft

C1、C2‧‧‧匣 C1, C2‧‧‧匣

F1‧‧‧第1蓋膜 F1‧‧‧1st cover film

F2‧‧‧第2蓋膜 F2‧‧‧2nd cover film

H‧‧‧加熱器 H‧‧‧heater

M‧‧‧密封層 M‧‧‧ sealing layer

G‧‧‧導輥 G‧‧·guide roller

S1‧‧‧第1剝離襯墊 S1‧‧‧1st release liner

S2‧‧‧第2剝離襯墊 S2‧‧‧2nd release liner

T‧‧‧密封片 T‧‧‧ Sealing film

Ts‧‧‧剝離帶 Ts‧‧‧ peeling tape

W‧‧‧基板 W‧‧‧Substrate

X‧‧‧中心軸 X‧‧‧ central axis

圖1係密封片的剖面圖。 Figure 1 is a cross-sectional view of a sealing sheet.

圖2係顯示密封片貼附裝置的整體構成之上視圖。 Fig. 2 is a top view showing the overall configuration of the sealing sheet attaching device.

圖3係第1及第2蓋膜供給部之上視圖。 Fig. 3 is a top view of the first and second cover film supply portions.

圖4係第1及第2蓋膜供給部之前視圖。 Fig. 4 is a front view of the first and second cover film supply portions.

圖5係第1及第2蓋膜之上視圖。 Figure 5 is a top view of the first and second cover films.

圖6係第1搬送機構之上視圖。 Fig. 6 is a top view of the first conveying mechanism.

圖7係第1搬送機構之前視圖。 Fig. 7 is a front view of the first conveying mechanism.

圖8係第2搬送機構之上視圖。 Fig. 8 is a top view of the second conveying mechanism.

圖9係第2搬送機構之前視圖。 Fig. 9 is a front view of the second conveying mechanism.

圖10係顯示保持台及推壓構件的吸附面之上視圖。 Fig. 10 is a top view showing the adsorption surface of the holding table and the pressing member.

圖11係工件搬送機構之前視圖。 Figure 11 is a front view of the workpiece transport mechanism.

圖12係切斷單元所具備之保持台的上視圖。 Fig. 12 is a top view of the holding table provided in the cutting unit.

圖13係切斷單元所具備之保持台的前視圖。 Fig. 13 is a front view of the holding table provided in the cutting unit.

圖14係切斷單元之斜視圖。 Figure 14 is a perspective view of the cutting unit.

圖15係密封片貼附處理之流程圖。 Figure 15 is a flow chart of the sealing sheet attaching process.

圖16係顯示第1蓋膜之搬出的圖。 Fig. 16 is a view showing the carrying out of the first cover film.

圖17係顯示第1蓋膜之搬出的圖。 Fig. 17 is a view showing the carrying out of the first cover film.

圖18係顯示密封片之搬出的圖。 Fig. 18 is a view showing the carrying out of the sealing sheet.

圖19係顯示密封片之搬出的圖。 Fig. 19 is a view showing the carrying out of the sealing sheet.

圖20係顯示從第1搬送機構朝第2搬送機構交付密封片之圖。 Fig. 20 is a view showing the delivery of the sealing sheet from the first conveying mechanism to the second conveying mechanism.

圖21係顯示從第2搬送機構朝推壓構件交付密封片之圖。 Fig. 21 is a view showing the delivery of the sealing sheet from the second conveying mechanism to the pressing member.

圖22係顯示從第2搬送機構朝推壓構件交付密封片之圖。 Fig. 22 is a view showing the delivery of the sealing sheet from the second conveying mechanism to the pressing member.

圖23係從密封片剝離第2剝離襯墊之圖。 Fig. 23 is a view showing the second release liner peeled off from the sealing sheet.

圖24係於基板貼附密封片的動作之圖。 Fig. 24 is a view showing an operation of attaching a sealing sheet to a substrate.

圖25係從密封片剝離第1蓋膜之圖。 Fig. 25 is a view showing the first cover film peeled off from the sealing sheet.

圖26係顯示從保持台搬出基板的動作之圖。 Fig. 26 is a view showing an operation of carrying out the substrate from the holding table.

圖27係顯示密封片的切斷動作之圖。 Fig. 27 is a view showing the cutting operation of the sealing sheet.

圖28係顯示密封片的切斷動作之圖。 Fig. 28 is a view showing the cutting operation of the sealing sheet.

圖29係顯示從密封片剝離第1剝離襯墊的動作之圖。 Fig. 29 is a view showing an operation of peeling off the first release liner from the sealing sheet.

以下,參照圖式來說明本發明的一實施例。係以在表面上形成有複數個半導體元件之半導體基板(以下,僅稱為「基板」)上,貼附了形成有樹脂組成物所構成的密封層之密封片後,將該密封片沿著基板形狀切斷的情況為例作說明。 Hereinafter, an embodiment of the present invention will be described with reference to the drawings. A sealing sheet having a sealing layer formed of a resin composition is attached to a semiconductor substrate (hereinafter simply referred to as a "substrate") having a plurality of semiconductor elements formed on its surface, and the sealing sheet is placed along the sealing sheet. The case where the shape of the substrate is cut is described as an example.

<密封片> <sealing sheet>

密封片T係例如圖1所示,採用比工件形狀大且呈矩形者。又,該密封片T係在密封層M的兩面添設有保護用第1剝離襯墊S1及第2剝離襯墊S2。 The sealing sheet T is, for example, as shown in Fig. 1, and has a rectangular shape larger than the shape of the workpiece. Further, in the sealing sheet T, the first release liner S1 for protection and the second release liner S2 are attached to both surfaces of the sealing layer M.

密封層M係由密封材料形成片狀。在密封材料方面,例如可舉出熱硬化性矽氧樹脂、環氧樹脂、熱硬化性聚醯亞胺樹脂、苯酚樹脂(phenol resin)、脲樹脂(urea resin)、三聚氫胺樹脂、不飽和聚酯樹脂、酞酸二烯丙酯(diallyl phthalate)樹脂、熱硬化性胺基甲酸乙酯樹脂(urethane resin)等之熱硬化性樹脂。又,在密封材料方面,也可舉出與上述的熱硬化性樹脂以含有適當比例的添加劑而成的熱硬化性樹脂組成物。 The sealing layer M is formed into a sheet shape from a sealing material. Examples of the sealing material include a thermosetting epoxy resin, an epoxy resin, a thermosetting polyimide resin, a phenol resin, a urea resin, a melamine resin, and an unsaturated polyester. A thermosetting resin such as a resin, a diallyl phthalate resin, or a thermosetting urethane resin. In addition, as the sealing material, a thermosetting resin composition containing an additive in an appropriate ratio to the above-mentioned thermosetting resin may be mentioned.

在添加劑方面,例如可舉出充填劑、螢光體等。在充填劑方面,例如可舉出矽石(silica)、二氧化鈦(titania)、滑石(talc)、氧化鋁、氮化鋁、氮化矽等之無 機微粒子,例如矽氧(silicone)粒子等之有機微粒子等。螢光體具有波長變換機能,例如可舉出能將藍色光變換成黃色光之黃色螢光體、能將藍色光變換成紅色光之紅色螢光體等。在黃色螢光體方面,例如可舉出Y3Al5O12:Ce(YAG(釔‧鋁‧石榴石):Ce)等之石榴石型螢光體。在紅色螢光體方面,例如可舉出CaAlSiN3:Eu,CaSiN2:Eu等之氮化物螢光體等。 Examples of the additive include a filler, a phosphor, and the like. Examples of the filler include inorganic fine particles such as silica, titania, talc, alumina, aluminum nitride, and tantalum nitride, and the like, for example, organic particles such as silicon oxide particles. Microparticles, etc. The phosphor has a wavelength conversion function, and examples thereof include a yellow phosphor that can convert blue light into yellow light, a red phosphor that can convert blue light into red light, and the like. Examples of the yellow phosphor include garnet-type phosphors such as Y 3 Al 5 O 12 :Ce (YAG (yttrium aluminum garnet): Ce). Examples of the red phosphor include a nitride phosphor such as CaAlSiN 3 :Eu, CaSiN 2 :Eu, or the like.

密封層M在密封半導體元件之前被調整成半固形狀,具體言之,在密封材料是含有熱硬化性樹脂之情況,例如,在完全硬化(C階段化)前,亦即在半硬化(B階段)狀態下被調整。 The sealing layer M is adjusted to a semi-solid shape before sealing the semiconductor element, in particular, in the case where the sealing material contains a thermosetting resin, for example, before being completely hardened (C-staged), that is, in a semi-hardening (B) In the phase) state is adjusted.

密封層M的尺寸係因應半導體元件及基板的尺寸被適當地設定。具體言之,在以準備長條片作為密封片的情況中密封層在左右方向的長度,亦即寬度為,例如100mm以上,較佳為200mm以上,例如1500mm以下,較佳為700mm以下。又,密封層的厚度係對應半導體元件之尺寸作適當地設定,例如30μm以上,較佳為100μm以上,又,例如3000μm以下,較佳為1000μm以下。 The size of the sealing layer M is appropriately set in accordance with the size of the semiconductor element and the substrate. Specifically, in the case where the long piece is prepared as the sealing sheet, the length of the sealing layer in the left-right direction, that is, the width is, for example, 100 mm or more, preferably 200 mm or more, for example, 1500 mm or less, preferably 700 mm or less. Further, the thickness of the sealing layer is appropriately set in accordance with the size of the semiconductor element, and is, for example, 30 μm or more, preferably 100 μm or more, and further, for example, 3000 μm or less, preferably 1,000 μm or less.

第1剝離襯墊S1及第2剝離襯墊S2,例如可舉出聚乙烯片、聚酯片(PET等)、聚苯乙烯片、聚碳酸酯片、聚醯亞胺片等之聚合物片,例如陶瓷片,例如金屬箔等。關於剝離襯墊,在與密封層接觸的接觸面,亦可施作氟處理等之脫模處理。第1剝離襯墊及第2剝離襯墊的尺寸係因應剝離條件作適當地設定,厚度是例 如15μm以上,較佳為25μm以上,又,例如125μm以下,較佳為75μm以下。 Examples of the first release liner S1 and the second release liner S2 include a polymer sheet such as a polyethylene sheet, a polyester sheet (PET or the like), a polystyrene sheet, a polycarbonate sheet, and a polyimide sheet. For example, a ceramic sheet such as a metal foil or the like. The release liner may be subjected to a release treatment such as fluorine treatment on the contact surface in contact with the seal layer. The dimensions of the first release liner and the second release liner are appropriately set in accordance with the peeling conditions, and the thickness is an example. For example, it is 15 μm or more, preferably 25 μm or more, and further, for example, 125 μm or less, preferably 75 μm or less.

<密封片貼附裝置> <Sealing sheet attachment device>

以下,針對利用具備本發明的一實施形態的切斷裝置之密封片貼附裝置將上述密封片貼附於基板上的裝置作說明。此外,就本實施例而言,係以比密封片的形狀還大的2張蓋片夾住密封片與基板之狀態下推壓密封片並貼附於基板之情況為例作說明。 Hereinafter, a device in which the sealing sheet is attached to a substrate by a sealing sheet attaching device including a cutting device according to an embodiment of the present invention will be described. In the present embodiment, the case where the sealing sheet and the substrate are pressed by the two cover sheets larger than the shape of the sealing sheet and the sealing sheet is pressed and attached to the substrate will be described as an example.

圖2係顯示密封片貼附裝置的整體構成之上視圖。 Fig. 2 is a top view showing the overall configuration of the sealing sheet attaching device.

如圖2所示,密封片貼附裝置係由基板供給/回收部1、基板搬送機構2、校準台3、第1蓋膜供給部4、密封片供給部5、第1搬送機構6、第2蓋膜供給部7、第2搬送機構8、第3搬送機構9、貼附單元10、第1剝離單元11、工件搬送機構12、切斷裝置13及第2剝離單元14等所構成。此處,第1、第3搬送機構6、9及工件搬送機構12係以可沿鋪設於天井的導軌移動般地懸垂保持。其以外的構成係配備於裝置基台上。以下,詳細敘明各構成。 As shown in FIG. 2, the sealing sheet attaching device is a substrate supply/recovery unit 1, a substrate transfer mechanism 2, a calibration table 3, a first cover film supply unit 4, a sealing sheet supply unit 5, a first transfer mechanism 6, and a first The cover film supply unit 7, the second transfer mechanism 8, the third transfer mechanism 9, the attaching unit 10, the first peeling unit 11, the workpiece transport mechanism 12, the cutting device 13, and the second peeling unit 14 are configured. Here, the first and third conveying mechanisms 6 and 9 and the workpiece conveying mechanism 12 are suspended and held so as to be movable along the guide rails laid on the patio. The other configuration is provided on the apparatus base. Hereinafter, each configuration will be described in detail.

基板供給/回收部1係在匣台之上裝填用以將貼附密封片T前的基板W及貼附密封片T後的基板W插入並收納的匣C1、C2。基板W係電路面朝上且上下隔有既定間隔,多層地收納於各匣C1、C2。 The substrate supply/recovery unit 1 is provided with 匣C1 and C2 for inserting and accommodating the substrate W before the sealing sheet T and the substrate W to which the sealing sheet T is attached, on the cymbal. The substrate W has a circuit surface facing upward and spaced apart from each other at a predetermined interval, and is housed in a plurality of layers C1 and C2.

基板搬送機構2具備機械手臂16。該機械手臂16係利用可動台進行水平移動。機械手臂16自體係 建構成可水平進退、旋轉及昇降。再者,機械手臂16係於前端具備馬蹄形的白努利夾盤(Bernoulli chuck)17。白努利夾盤17係由收納有處理對象的基板W之匣C1以非接觸方式取出基板W,按校準台3、保持台37(參照圖23)、保持台49及回收用匣C2的順序以非接觸方式搬送基板W。 The substrate transfer mechanism 2 includes a robot arm 16 . The robot arm 16 is horizontally moved by the movable table. Robotic arm 16 system The structure can be advanced, retracted, rotated and lifted horizontally. Further, the robot arm 16 is a Bernoulli chuck 17 having a horseshoe shape at the front end. The white Nucleus chuck 17 takes out the substrate W in a non-contact manner from the substrate C in which the substrate W to be processed is stored, and presses the calibration table 3, the holding table 37 (see FIG. 23), the holding table 49, and the recovery cassette C2. The substrate W is transferred in a non-contact manner.

校準台3係在以從保持面進退的吸附墊將基板W的背面吸附保持的狀態下一邊旋轉一邊檢測出被形成於基板W的外周之校準用缺口。之後,校準台3係依據該檢測結果進行基板的對中心。 The calibration table 3 detects a calibration notch formed on the outer circumference of the substrate W while rotating while holding the back surface of the substrate W in a state in which the back surface of the substrate W is sucked and held by the adsorption pad that advances and retreats from the holding surface. Thereafter, the calibration station 3 performs the centering of the substrate based on the detection result.

如圖3及圖4所示,第1蓋膜供給部4係在底部立設有定位用銷18。亦即,如圖5所示,第1蓋膜供給部4係將定位銷18插通於被形成在第1蓋膜F1的外周的定位用孔19,將既定片數的第1蓋膜F1積層收納。此外,第1蓋膜F1係沿著圖5的2點鏈線所示的密封片T的外周形成複數個吸附搬送用孔20。 As shown in FIG. 3 and FIG. 4, the first cover film supply unit 4 has a positioning pin 18 standing upright on the bottom. In other words, as shown in FIG. 5, the first cover film supply unit 4 inserts the positioning pin 18 into the positioning hole 19 formed on the outer circumference of the first cover film F1, and sets the predetermined number of the first cover film F1. Stacked storage. In addition, the first cover film F1 is formed with a plurality of adsorption transfer holes 20 along the outer circumference of the sealing sheet T indicated by the two-dot chain line of FIG. 5 .

如圖18及圖19所示,密封片供給部5係將既定片數的密封片T積層並收納。 As shown in FIG. 18 and FIG. 19, the sealing sheet supply unit 5 laminates and stores a predetermined number of the sealing sheets T.

如圖6及圖7所示,第1搬送機構6係於第1保持部21的底面具備定位用銷22、第1蓋膜用吸附墊23及密封片用吸附墊24。此外,第3搬送機構9亦具有與第1搬送機構6相同佈設的相同構成。 As shown in FIG. 6 and FIG. 7 , the first transfer mechanism 6 includes a positioning pin 22 , a first cover film adsorption pad 23 , and a sealing sheet adsorption pad 24 on the bottom surface of the first holding unit 21 . Further, the third transport mechanism 9 also has the same configuration as that of the first transport mechanism 6.

第2搬送機構8具備第2保持部26(參照圖19至圖22)。如圖8及圖9所示,第2保持部26係具備第1搬送機構6的第1保持部21的底面所具備之吸附墊 23及在和吸附墊24對向的各個位置具備第1蓋膜用吸附墊28及密封片用吸附墊29。此外,第1保持部21的和銷22對向之一係形成有供該銷22插入的定位用孔27。又,第2保持部26的各角部具備供插通於第1蓋膜F1的定位用孔19之定位用銷30。此外,銷30係建構成依彈簧或缸體而昇降。亦即,第2搬送機構8係建構成維持第1蓋膜F1及密封片T的校準狀態從第1搬送機構6進行接取作業。 The second transport mechanism 8 includes a second holding unit 26 (see FIGS. 19 to 22 ). As shown in FIG. 8 and FIG. 9 , the second holding portion 26 includes the adsorption pad provided on the bottom surface of the first holding portion 21 of the first conveying mechanism 6 . 23 and the first cover film adsorption pad 28 and the sealing sheet adsorption pad 29 are provided at respective positions facing the adsorption pad 24. Further, a positioning hole 27 into which the pin 22 is inserted is formed in the first holding portion 21 and the pin 22 opposite to each other. Further, each corner portion of the second holding portion 26 is provided with a positioning pin 30 through which the positioning hole 19 of the first cover film F1 is inserted. In addition, the pin 30 is constructed to be raised and lowered by a spring or a cylinder. In other words, the second transport mechanism 8 is configured to perform the pick-up operation from the first transport mechanism 6 in a state in which the first cover film F1 and the seal sheet T are maintained.

如圖23至圖26所示,貼附單元10係由上側加壓單元32與下側加壓單元33等所構成。上側加壓單元32具備依缸體34的作動而沿著導軌昇降的推壓構件35。 As shown in FIGS. 23 to 26, the attaching unit 10 is constituted by the upper pressurizing unit 32, the lower pressurizing unit 33, and the like. The upper pressurizing unit 32 includes a pressing member 35 that moves up and down along the guide rail in response to the operation of the cylinder 34.

下側加壓單元33具備吸附保持第2蓋膜F2及基板W的保持台37。如圖2所示,保持台37係建構成可從接取第2蓋膜F2及基板W的位置到上側加壓單元32的和推壓構件35對向的下方位置沿著導軌往復移動。 The lower press unit 33 includes a holding stage 37 that sucks and holds the second cover film F2 and the substrate W. As shown in FIG. 2, the holding base 37 is configured such that it can reciprocate along the guide rail from the position where the second cover film F2 and the substrate W are picked up to the lower position of the upper press unit 32 opposed to the pressing member 35.

此外,如圖10所示,在推壓構件35的底面及保持台37的表面,係以和第1搬送機構6相同的佈設分別設有吸附墊38、39。亦即,一方的推壓構件35係同時吸附保持第1蓋膜F1與密封片T。另一方的保持台37係同時吸附保持第2蓋膜F2與基板W。又,如圖24所示,在推壓構件35及保持台37之至少一方埋設有加熱器H。 Further, as shown in FIG. 10, the bottom surface of the pressing member 35 and the surface of the holding table 37 are provided with adsorption pads 38 and 39, respectively, in the same arrangement as the first conveying mechanism 6. In other words, one of the pressing members 35 simultaneously adsorbs and holds the first cover film F1 and the sealing sheet T. The other holding stage 37 simultaneously adsorbs and holds the second cover film F2 and the substrate W. Moreover, as shown in FIG. 24, the heater H is embedded in at least one of the pressing member 35 and the holding stand 37.

如圖23及圖25所示,第1剝離單元11係由帶供給部41、帶回收部42及貼附輥43等構成的兩組剝離單元所構成。兩剝離單元係在沿著圖2的水平方向鋪設的導軌上取既定間隔地並列配備。此等剝離單元係建構成可各自水平移動。又,各剝離單元的貼附輥43係建構成可在涵蓋上側加壓單元32的外側之待機位置與上側加壓單元32及下側加壓單元33之間的既定剝離位置之範圍移動。又,兩貼附輥43係建構成可藉由缸體44等而昇降。 As shown in FIG. 23 and FIG. 25, the first peeling unit 11 is composed of two sets of peeling units including a tape supply unit 41, a tape collecting unit 42, and an attaching roller 43. The two peeling units are juxtaposed at predetermined intervals on the guide rails laid in the horizontal direction of Fig. 2 . These stripping unit systems are constructed to be horizontally movable. Moreover, the attaching roller 43 of each peeling unit is configured to be movable in a range from a predetermined position that covers the outer side of the upper side press unit 32 to a predetermined peeling position between the upper press unit 32 and the lower press unit 33. Further, the two attachment rollers 43 are constructed such that they can be raised and lowered by the cylinder 44 or the like.

此外,各帶供給部41係供給比基板W還窄幅的剝離帶Ts。一方的帶回收部42係將與第2剝離襯墊S2成一體而被剝離的剝離帶Ts捲繞回收。另一方的帶回收部42係將與第1蓋片F1成一體而被剝離剝離帶Ts捲繞回收。 Further, each tape supply unit 41 supplies a peeling tape Ts which is narrower than the substrate W. One of the tape collecting portions 42 is obtained by winding and collecting the peeling tape Ts which is integrated with the second release liner S2 and peeled off. The other tape collecting portion 42 is integrally wound with the first cover sheet F1 and is wound and collected by the peeling peeling tape Ts.

如圖11所示,工件搬送機構12係於臂部前端的保持部46具備複數個吸附墊47。保持部46係建構成可昇降。因此,工件搬送機構12係藉由保持部46吸附被貼附有密封片T的基板W,從接取位置朝切斷裝置13側的保持台49搬送並載置。 As shown in FIG. 11, the workpiece transfer mechanism 12 is provided with a plurality of adsorption pads 47 in the holding portion 46 at the tip end of the arm portion. The holding portion 46 is constructed to be movable up and down. Therefore, the workpiece transport mechanism 12 sucks the substrate W to which the sealing sheet T is attached by the holding portion 46, and transports and mounts the substrate W from the pick-up position toward the holding table 49 on the cutting device 13 side.

如圖2所示,切斷裝置13係由保持台49及切斷單元50等所構成。如圖12及圖13所示,保持台49係具有比基板W的直徑還小徑的吸附板51,將藉由工件搬送機構12移載並以既定的對位姿勢載置的基板W之背面真空吸附。又,保持台49係建構成藉由第1可動台53及第2可動台54在前後左右水平移動,且可 藉由旋轉馬達繞中心軸X旋轉。亦即,第1可動台53係沿著導軌55朝接取位置與切斷單元50側移動。第2可動台54係利用導軌56在與導軌55交叉的方向移動。 As shown in FIG. 2, the cutting device 13 is constituted by a holding table 49, a cutting unit 50, and the like. As shown in FIGS. 12 and 13, the holding table 49 has a suction plate 51 having a smaller diameter than the diameter of the substrate W, and the back surface of the substrate W placed by the workpiece transfer mechanism 12 and placed in a predetermined alignment posture is provided. Vacuum adsorption. Further, the holding base 49 is configured to be horizontally moved forward and backward by the first movable table 53 and the second movable table 54, and Rotating around the central axis X by a rotary motor. In other words, the first movable table 53 moves along the guide rail 55 toward the pick-up position and the cutting unit 50 side. The second movable table 54 is moved by the guide rail 56 in a direction crossing the guide rail 55.

又,在保持台49的下方近旁配備有校準用的取得基板W的外周之輪廓影像的相機52。 Further, a camera 52 for obtaining a contour image of the outer circumference of the substrate W for calibration is provided near the lower side of the holding table 49.

如圖14所示,切斷單元50係由金屬線供給部60、切斷部61及金屬線捲繞部62等所構成。 As shown in FIG. 14, the cutting unit 50 is composed of a wire supply unit 60, a cutting unit 61, a wire winding unit 62, and the like.

在金屬線供給部60,捲繞金屬線63的捲筒64被裝填於旋轉軸65。旋轉軸65係與電磁剎車連動連結而被施加適度的旋轉阻力。因而防止過量的金屬線63抽出。此外,金屬線63只要是可通電的金屬等即可,例如採用鎳鉻合金、鎢等。 In the wire supply portion 60, the spool 64 around which the wire 63 is wound is loaded on the rotary shaft 65. The rotating shaft 65 is coupled to the electromagnetic brake and is applied with a moderate rotational resistance. Excessive wire 63 is thus prevented from being withdrawn. Further, the metal wire 63 may be a metal that can be energized, for example, a nickel-chromium alloy, tungsten, or the like.

如圖14、圖27及圖28所示,切斷部61係由導銷66、電源部67及控制器68等所構成。導銷66係上下一對所構成,在和基板W交叉的方向引導金屬線63。又,導銷66係其前端是金屬製且建構成經由控制器68從電源部67供給電流。亦即,控制器68係使導銷間的金屬線63通電加熱。此外,經由導輥G對在導銷間被引導的金屬線63賦予適度張力的張力輥69係夾住切斷部61而配備在上游側與下游側。此外,導銷66、導輥G及張力輥69係形成有防止金屬線63脫離用引導溝。 As shown in FIGS. 14, 27, and 28, the cutting portion 61 is constituted by a guide pin 66, a power supply portion 67, a controller 68, and the like. The guide pins 66 are formed by a pair of upper and lower sides, and guide the metal wires 63 in a direction crossing the substrate W. Further, the guide pin 66 has a tip end made of metal and is configured to supply a current from the power supply unit 67 via the controller 68. That is, the controller 68 energizes the metal wires 63 between the guide pins. Further, the tension roller 69 that applies a moderate tension to the wire 63 guided between the guide pins via the guide roller G is provided on the upstream side and the downstream side by sandwiching the cutting portion 61. Further, the guide pin 66, the guide roller G, and the tension roller 69 are formed with guide grooves for preventing the wire 63 from coming off.

張力輥69係建構成與馬達或缸體等之驅動部連結且沿著引導軸昇降。 The tension roller 69 is configured to be coupled to a driving portion such as a motor or a cylinder and to ascend and descend along the guide shaft.

金屬線捲繞部62係將捲繞密封片切斷後的金屬線63的空捲筒70裝填於捲繞軸71。捲繞軸71係建構成藉由馬達72的旋轉驅動將金屬線63捲繞回收。 The wire winding portion 62 is mounted on the winding shaft 71 by the empty drum 70 that winds the wire 63 after the sealing piece is cut. The winding shaft 71 is constructed to wind and recover the wire 63 by the rotational driving of the motor 72.

如圖29所示,第2剝離單元14係由帶供給部75、剝離棒76及帶回收部77等所構成。此等各構成係固定配備於被固定於裝置架的縱壁。 As shown in FIG. 29, the second peeling unit 14 is composed of a tape supply unit 75, a peeling bar 76, a tape collecting portion 77, and the like. These components are fixedly attached to the longitudinal wall that is fixed to the device frame.

帶供給部75係從被捲成筒的原料輥78抽出比基板W還窄幅的剝離帶Ts,經由導引輥79引導至刀緣狀的剝離棒76。 The tape supply unit 75 extracts the peeling tape Ts which is narrower than the substrate W from the raw material roll 78 wound into a cylinder, and guides it to the blade-shaped peeling bar 76 via the guide roller 79.

剝離棒76係在將剝離帶Ts推壓使貼附於第1蓋膜F1並使剝離帶Ts折返並反轉後,將與剝離帶Ts成為一體的第1蓋膜F1從密封片T上剝離。 The peeling bar 76 is pressed against the peeling tape Ts so as to be attached to the first cover film F1 and the peeling tape Ts is folded back and reversed, and the first cover film F1 integrated with the peeling tape Ts is peeled off from the sealing sheet T. .

帶回收部77係建構成將剝離帶Ts及第1蓋膜F1捲繞回收於捲繞軸80。 The belt collecting portion 77 is configured to wind and wind the peeling tape Ts and the first cover film F1 on the winding shaft 80.

其次,針對用以使用上述實施例裝置將表面保護用密封片T貼附於基板W的表面並按基板W的形狀切斷之一連串的動作,依據圖15的流程圖及圖16至圖33來作說明。 Next, an operation for attaching the surface protective sealing sheet T to the surface of the substrate W by the apparatus of the above-described embodiment and cutting one of the shapes of the substrate W is performed according to the flowchart of FIG. 15 and FIGS. 16 to 33. Give instructions.

當貼附指令發出時,第1搬送機構6、第3搬送機構9及基板搬送機構2大致同時作動。 When the attaching command is issued, the first conveying mechanism 6, the third conveying mechanism 9, and the substrate conveying mechanism 2 are operated at substantially the same time.

第1搬送機構6係使第1保持部21朝第1蓋膜供給部4的上方移動。之後,如圖16所示,使第1保持部21下降並吸附保持第1蓋膜F1。 The first transport mechanism 6 moves the first holding portion 21 upward of the first cover film supply unit 4 . Thereafter, as shown in FIG. 16, the first holding portion 21 is lowered and the first cover film F1 is sucked and held.

如圖17所示,第1搬送機構6的第1保持部21係維持將第1蓋膜F1吸附保持的狀態朝密封片供給部5的上方移動(步驟S1A)。之後,如圖18所示,第1保持部21係使第1保持部21下降並利用被形成在第1蓋膜F1的吸附用孔20將密封片T吸附保持。 As shown in FIG. 17 , the first holding portion 21 of the first conveying mechanism 6 moves the upper side of the sealing sheet supply unit 5 while the first cover film F1 is sucked and held (step S1A). Then, as shown in FIG. 18, the first holding portion 21 lowers the first holding portion 21 and sucks and holds the sealing sheet T by the adsorption hole 20 formed in the first cover film F1.

如圖19所示,第2搬送機構8的第2保持部26是在將密封片T吸附保持並朝上方移動的第1保持部21之下方移動(步驟S2A)。當第1保持部21與第2保持部26對向的對位完了時,如圖20所示,第1保持部21下降。此時,第1保持部21的定位用銷22被插入於第2保持部26的定位用孔27。同時,設在第2搬送機構8的角部的銷30被插入於第1蓋膜F1的角部的孔19。因此,第1蓋膜F1係維持著對位姿勢狀態從第1搬送機構6被交付於第2搬送機構8(步驟S3A)。 As shown in FIG. 19, the second holding portion 26 of the second conveying mechanism 8 moves downward in the first holding portion 21 that moves and holds the sealing sheet T upward (step S2A). When the alignment of the first holding portion 21 and the second holding portion 26 is completed, as shown in FIG. 20, the first holding portion 21 is lowered. At this time, the positioning pin 22 of the first holding portion 21 is inserted into the positioning hole 27 of the second holding portion 26 . At the same time, the pin 30 provided at the corner of the second conveying mechanism 8 is inserted into the hole 19 of the corner portion of the first cover film F1. Therefore, the first cover film F1 is delivered to the second transfer mechanism 8 from the first transfer mechanism 6 while maintaining the alignment posture state (step S3A).

當交付完了時,第1保持部21係上昇,進行下一個第1蓋膜F1之搬出處理。 When the delivery is completed, the first holding portion 21 is raised, and the next first cover film F1 is carried out.

第2保持部26往上側加壓單元32的下方移動。當上側加壓單元32的推壓構件35與第2保持部26對向之對位完了時,如圖21所示,使第2保持部26上昇。推壓構件35係依底面的吸附墊38、39將第1蓋膜F1及密封片T吸附保持(步驟S4A)。之後,如圖22所示,第2保持部26係下降,朝第1加壓單元32的外側之待機位置移動。 The second holding portion 26 moves below the upper pressing unit 32. When the pressing member 35 of the upper pressing unit 32 is aligned with the second holding portion 26, as shown in FIG. 21, the second holding portion 26 is raised. The pressing member 35 adsorbs and holds the first cover film F1 and the sealing sheet T by the suction pads 38 and 39 on the bottom surface (step S4A). Thereafter, as shown in FIG. 22, the second holding portion 26 is lowered and moved toward the standby position outside the first pressurizing unit 32.

第1剝離單元11的任一方的剝離單元的貼附輥43是在第1加壓單元32與第2加壓單元33之間移動。當貼附輥43到達密封片T背面側的端部時,如圖23所示,貼附輥43上昇將剝離帶Ts貼附於第2剝離襯墊S2。之後,剝離單元係使貼附輥43一邊移動一邊將剝離帶Ts貼附於第2剝離襯墊S2,並與該移動速度同步地捲繞剝離帶Ts。此時,第2剝離襯墊S2係與剝離 帶Ts成一體而從密封片T被剝離(步驟S5A)。此外,在剝離第2剝離襯墊S2的時點,隔著第2蓋膜F2將基板W吸附保持的保持台37朝推壓構件35下方移動過來。 The attaching roller 43 of the peeling unit of any one of the first peeling units 11 moves between the first pressurizing unit 32 and the second pressurizing unit 33. When the attaching roller 43 reaches the end portion on the back side of the sealing sheet T, as shown in FIG. 23, the attaching roller 43 is raised to attach the peeling tape Ts to the second release liner S2. After that, the peeling unit attaches the peeling tape Ts to the second release liner S2 while moving the attaching roller 43, and winds the peeling tape Ts in synchronization with the moving speed. At this time, the second release liner S2 is peeled off. The tape Ts is integrated and peeled off from the sealing sheet T (step S5A). Further, at the time of peeling off the second release liner S2, the holding table 37 that adsorbs and holds the substrate W via the second cover film F2 is moved below the pressing member 35.

其次,另一方的第3搬送機構9係與第1搬送機構6同樣,如圖16及圖17所示,在使第3保持部31朝第2蓋膜供給部7的上方移動後,使第3保持部31下降而將第2蓋膜F2吸附保持。第3保持部31係在將第2蓋膜F2吸附保持後上昇,朝下側加壓單元33移動(步驟S1B)。之後,第3保持部31將第2蓋膜F2載置於保持台37(步驟S2B)。 In the same manner as the first transport mechanism 6, the third transport unit 9 is moved to the upper side of the second cover film supply unit 7 as shown in FIG. 16 and FIG. 3 The holding portion 31 is lowered to adsorb and hold the second cover film F2. The third holding portion 31 is lifted and held by the second cover film F2, and is moved toward the lower pressing unit 33 (step S1B). Thereafter, the third holding portion 31 places the second cover film F2 on the holding table 37 (step S2B).

基板搬送機構2的機械手臂16係使前端的白努利夾盤17朝載置於匣台的匣C1移動。白努利夾盤17被插入匣C1所收容的基板W彼此的間隙。藉白努利夾盤17以非接觸方式吸附保持著基板W的機械手臂16係從匣C1搬出基板W並載置於校準台3(步驟S1C)。 The robot arm 16 of the substrate transfer mechanism 2 moves the white Nucleus chuck 17 at the tip end toward the crucible C1 placed on the crucible. The white Null chuck 17 is inserted into the gap between the substrates W accommodated in the crucible C1. The robot arm 16 that sucks and holds the substrate W by the white Nucleus chuck 17 in a non-contact manner carries out the substrate W from the crucible C1 and mounts it on the calibration table 3 (step S1C).

載置於校準台3的基板W係利用形成於外周的缺口進行對位(步驟S2C)。已對位的基板W再藉由白努利夾盤17搬出。白努利夾盤17係將基板W載置於被載置於保持台37的第2蓋膜F2之上(步驟S3C)。 The substrate W placed on the calibration table 3 is aligned by a notch formed on the outer circumference (step S2C). The aligned substrate W is then carried out by the white Nucleus chuck 17. The white Null chuck 17 mounts the substrate W on the second cover film F2 placed on the holding table 37 (step S3C).

保持台37係吸附保持第2蓋膜F2並藉由第2蓋膜F2的吸附用孔20維持將基板W吸附保持的狀態朝上側加壓單元32的推壓構件35之下方移動。 The holding stage 37 sucks and holds the second cover film F2 and moves the lower side of the pressing member 35 of the upper pressing unit 32 while maintaining the substrate W by the adsorption hole 20 of the second cover film F2.

當推壓構件35與保持台37對向的對位完了時,如圖24所示,使藉由加熱器H加熱的推壓構件35下降至既定位置。亦即,被推壓構件35與保持台37所 夾進的密封片T的密封層M被推壓於基板W(步驟S6)。此時,由於密封片T的密封層M因加熱器H之加熱而軟化,所以侵入被形成於基板W表面的凹凸並密接。又,藉由經過既定時間並加壓及加熱使密封層M成為半硬化狀態。 When the opposing of the pressing member 35 and the holding table 37 is completed, as shown in FIG. 24, the pressing member 35 heated by the heater H is lowered to a predetermined position. That is, the pressed member 35 and the holding table 37 The sealing layer M of the sandwiched sealing sheet T is pressed against the substrate W (step S6). At this time, since the sealing layer M of the sealing sheet T is softened by the heating of the heater H, the unevenness formed on the surface of the substrate W is intruded and adhered. Further, the sealing layer M is in a semi-hardened state by being pressurized and heated for a predetermined period of time.

經過既定時間後使推壓構件35上昇。剝離單元的貼附輥43在第1加壓單元32與第2加壓單元33之間移動。當貼附輥43到達第1蓋膜F1的端部時,如圖25所示,使貼附輥43下降而將剝離帶Ts貼附於第1蓋膜F1。之後,使貼附輥43一邊移動一邊將剝離帶Ts朝第1蓋膜F1逐漸貼附,並與該移動速度同步捲繞剝離帶Ts,藉以使第1蓋膜F1與剝離帶Ts成一體而從密封片T剝離(步驟S7)。 After a predetermined period of time, the pressing member 35 is raised. The attaching roller 43 of the peeling unit moves between the first pressurizing unit 32 and the second pressurizing unit 33. When the attaching roller 43 reaches the end of the first cover film F1, as shown in FIG. 25, the attaching roller 43 is lowered to attach the peeling tape Ts to the first cover film F1. After that, the peeling tape Ts is gradually attached to the first cover film F1 while moving the attaching roller 43, and the peeling tape Ts is wound in synchronization with the moving speed, whereby the first cover film F1 and the peeling tape Ts are integrated. It peels from the sealing sheet T (step S7).

將貼附有密封片T的基板W吸附保持的保持台37係朝工件搬送機構12的交付位置移動。如圖26所示,工件搬送機構12的保持部46將密封片T的表面吸附保持並將基板W搬送於保持台49,之後將基板W載置於保持台49(步驟S8)。此時,第2蓋膜F2係維持被保持台37所吸附保持地残留。此外,第2蓋膜F2係藉由第3搬送機構9搬送到未圖示之回收部並廢棄。 The holding table 37 that sucks and holds the substrate W to which the sealing sheet T is attached is moved toward the delivery position of the workpiece conveying mechanism 12. As shown in FIG. 26, the holding portion 46 of the workpiece transfer mechanism 12 adsorbs and holds the surface of the sealing sheet T and transports the substrate W to the holding table 49, and then mounts the substrate W on the holding table 49 (step S8). At this time, the second cover film F2 is maintained to be retained by the holding stage 37. In addition, the second cover film F2 is transported to the collection unit (not shown) by the third transfer mechanism 9 and discarded.

當基板W被吸附板51吸附保持時,使吸附板51一邊旋轉一邊用相機52拍攝基板W的外周。將所取得之基板W的輪廓影像例如施以2值化處理及圖案匹配等之影像處理而求取基板W的中心座標。依據該中心座標,操作可動台53、54進行對位(步驟S9)。 When the substrate W is suction-held by the adsorption plate 51, the outer periphery of the substrate W is imaged by the camera 52 while rotating the adsorption plate 51. The contour image of the obtained substrate W is subjected to image processing such as binarization processing and pattern matching, for example, to obtain the center coordinates of the substrate W. According to the center coordinates, the movable tables 53 and 54 are operated to be aligned (step S9).

當對位完了時,保持台49朝切斷單元50側移動。當保持台49到達切斷單元50側時,再朝切斷單元50側水平移動(圖中的X方向)。伴隨此保持台49的水平移動,驅動切斷單元50的馬達72,使金屬線63朝一方向行進,並透過控制器68使既定的電流從電源部67流通於導銷66。當保持台49移動至切斷位置時,如圖27所示,持續於第1蓋膜F1及密封層M刻上痕跡直到金屬線63接觸基板W的周緣為止。當金屬線63到達既定位置時,如圖28所示,吸附板51繞中心軸X旋轉,並使金屬線63朝一方向行進並僅將該金屬線63的被加熱部分抵接於基板W的外周。因此,依貼附處理而從基板W露出的密封層M係按基板形狀被切斷(步驟S10)。 When the registration is completed, the holding table 49 is moved toward the cutting unit 50 side. When the holding table 49 reaches the cutting unit 50 side, it moves horizontally toward the cutting unit 50 side (X direction in the drawing). With the horizontal movement of the holding table 49, the motor 72 of the cutting unit 50 is driven to move the wire 63 in one direction, and the predetermined current is transmitted from the power supply unit 67 to the guide pin 66 through the controller 68. When the holding table 49 is moved to the cutting position, as shown in FIG. 27, the first cover film F1 and the sealing layer M are continuously engraved with traces until the metal wire 63 contacts the periphery of the substrate W. When the metal wire 63 reaches the predetermined position, as shown in FIG. 28, the suction plate 51 rotates about the central axis X, and the metal wire 63 travels in one direction and only the heated portion of the metal wire 63 abuts against the outer periphery of the substrate W. . Therefore, the sealing layer M exposed from the substrate W by the attaching process is cut in accordance with the shape of the substrate (step S10).

此外,在切斷過程,於基板外周具有缺口等之凹凸的情況,以金屬線63的既定推壓可作用於基板外周的方式使保持台49移動。亦即,依據在校準台3取得之基板W的輪廓影像資料的位置資訊使保持台49移動。同時昇降操作張力輥69俾在導銷66間施加既定的張力。 Further, in the cutting process, when the outer periphery of the substrate has irregularities such as notches, the holding table 49 is moved so that the predetermined pressing of the metal wire 63 can act on the outer periphery of the substrate. That is, the holding table 49 is moved in accordance with the position information of the contour image data of the substrate W obtained at the calibration table 3. At the same time, the lifting operation tension roller 69 施加 applies a predetermined tension between the guide pins 66.

當切斷處理完了時,保持台49往處於初期進路上的剝離開始位置移動。當保持台49到達既定位置時,如圖29所示,第2剝離單元14作動並使剝離棒76下降至基板W上的密封片T之帶貼附開始端。當藉由剝離棒76的推壓使剝離帶Ts被貼附於密封片T上的第1剝離襯墊S1之端部時,可動台54移動。透過與此可動台54的移動同步將剝離帶Ts捲繞於捲繞軸80,第1剝 離襯墊S1與剝離帶Ts成一體而從密封片T被剝離掉(步驟S11)。 When the cutting process is completed, the holding table 49 moves to the peeling start position on the initial approach path. When the holding table 49 reaches the predetermined position, as shown in FIG. 29, the second peeling unit 14 is actuated and the peeling bar 76 is lowered to the tape attachment start end of the sealing sheet T on the substrate W. When the peeling tape Ts is attached to the end portion of the first release liner S1 on the sealing sheet T by the pressing of the peeling bar 76, the movable table 54 moves. The peeling tape Ts is wound around the winding shaft 80 in synchronization with the movement of the movable table 54, and the first peeling The liner S1 and the peeling tape Ts are integrated and are peeled off from the sealing sheet T (step S11).

當從密封片T的表面剝離第1剝離襯墊S1時,保持台49往朝向基板搬送機構2交付的位置移動。 When the first release liner S1 is peeled off from the surface of the sealing sheet T, the holding table 49 moves to a position where it is delivered toward the substrate conveyance mechanism 2.

當基板搬送裝置2的白努利夾盤17以非接觸方式保持基板W後,搬送至匣C2並收納(步驟S12)。 When the white Nucleus chuck 17 of the substrate transfer device 2 holds the substrate W in a non-contact manner, it is transported to the crucible C2 and stored (step S12).

以上完成朝基板W貼附1次密封片T的處理,以後,持續依序反覆上述作動,直到對既定片數的基板W進行薄片貼附處理完了為止(步驟S13)。 In the above, the process of attaching the sealing sheet T to the substrate W once is completed, and thereafter, the above-described operation is repeated in sequence until the sheet bonding processing of the predetermined number of substrates W is completed (step S13).

如同上述,藉由使已加熱的金屬線63抵接於基板W的外周並沿著該外周移動,可使密封層M及第1剝離襯墊S1軟化而容易切斷。又,因為在該切斷過程使金屬線63朝一方向行進,而沒有將已利用過的切斷部位再利用的情況。亦即,沒有使用被軟化的密封層M之附著所污染的金屬線63之情況,因此,可避免因金屬線63的污染而發生切斷不良之虞。又,透過使金屬線63朝下方行進,可防止進行切斷時產生的塵埃附著於基板表面側。再者,透過利用被捲回於捲筒的金屬線63,可長期利用乾淨的金屬線63。 As described above, by bringing the heated metal wire 63 into contact with the outer circumference of the substrate W and moving along the outer circumference, the sealing layer M and the first release liner S1 can be softened and easily cut. Further, since the wire 63 is moved in one direction during the cutting process, the used cut portion is not reused. That is, the metal wire 63 contaminated by the adhesion of the softened sealing layer M is not used, and therefore, the occurrence of the cutting failure due to the contamination of the metal wire 63 can be avoided. Moreover, by causing the metal wire 63 to travel downward, it is possible to prevent dust generated during cutting from adhering to the surface side of the substrate. Further, by using the metal wire 63 wound back to the reel, the clean metal wire 63 can be used for a long period of time.

此外,本發明亦能用如以下的形態實施。 Further, the present invention can also be carried out in the following forms.

(1)關於上述實施例裝置,亦可使金屬線63一邊往復移動一邊切斷密封層M及第1剝離襯墊S1。 (1) With regard to the apparatus of the above embodiment, the sealing layer M and the first release liner S1 may be cut while the metal wire 63 reciprocates.

(2)關於上述實施例裝置,亦可在將第1剝離襯墊S1剝離後,僅將密封層M切斷。 (2) Regarding the apparatus of the above embodiment, only the sealing layer M may be cut after the first release liner S1 is peeled off.

(3)上述實施例的切斷裝置不限定利用於上述實施例,亦可利用於切斷被貼附在半導體晶圓之電路形成面的表面保護用黏著帶。 (3) The cutting device of the above embodiment is not limited to the above embodiment, and may be used for cutting the surface protective adhesive tape attached to the circuit forming surface of the semiconductor wafer.

(4)在上述實施例裝置中雖以切斷圓形的基板W之情況為例作說明,但基板形狀亦可為正方形、長方形或多角形。在切斷貼附於此等形狀的基板之密封片或黏著帶等之黏著體的情況,透過反覆保持台49之直線移動與既定角度的旋轉,可將黏著體按基板形狀以良好精度切斷。 (4) Although the case where the circular substrate W is cut is described as an example in the apparatus of the above embodiment, the shape of the substrate may be square, rectangular or polygonal. When the adhesive sheet such as the sealing sheet or the adhesive tape attached to the substrate of the same shape is cut, the linear movement of the holding table 49 and the rotation of the predetermined angle are transmitted, so that the adhesive body can be cut with good precision according to the shape of the substrate. .

(5)在上述實施例裝置中,密封片T朝基板W之貼附亦可在將基板W收納於腔室內並在真空狀態進行。 (5) In the apparatus of the above embodiment, the bonding of the sealing sheet T to the substrate W may be performed by accommodating the substrate W in the chamber and in a vacuum state.

49‧‧‧保持台 49‧‧‧ Keeping the table

50‧‧‧切斷單元 50‧‧‧cutting unit

51‧‧‧吸附板 51‧‧‧Adsorption plate

53‧‧‧第1可動台 53‧‧‧1st movable table

54‧‧‧第2可動台 54‧‧‧2nd movable table

63‧‧‧金屬線 63‧‧‧Metal wire

66‧‧‧導銷 66‧‧‧Marketing

67‧‧‧電源部 67‧‧‧Power Supply Department

68‧‧‧控制器 68‧‧‧ Controller

T‧‧‧密封片 T‧‧‧ Sealing film

W‧‧‧基板 W‧‧‧Substrate

Claims (5)

一種黏著體的切斷方法,係將貼附於工件的黏著體沿著工件的外形切斷之黏著體的切斷方法,前述方法包含以下過程;使行進的金屬線抵接於自前述工件露出的黏著體,將該抵接部位的金屬線通電,一邊加熱一邊切斷黏著體。 A method of cutting an adhesive body is a method of cutting an adhesive body attached to an adhesive body attached to a workpiece along an outer shape of the workpiece, and the method includes the following process; causing the traveling metal wire to abut from the workpiece The adhesive body energizes the metal wire of the contact portion, and cuts the adhesive while heating. 如請求項1之黏著體的切斷方法,其中使前述工件旋轉並使金屬線與該旋轉速度同步地行進。 A method of cutting an adherend of claim 1, wherein the workpiece is rotated and the wire is advanced in synchronization with the rotational speed. 如請求項1之黏著體的切斷方法,其中以因應於前述工件外周的凹凸形狀調整金屬線的張力,俾在抵接部位之金屬線的推壓成為一定。 In the method of cutting an adhesive body according to claim 1, wherein the tension of the metal wire is adjusted in accordance with the uneven shape of the outer periphery of the workpiece, the pressing of the wire at the abutting portion is constant. 一種黏著體的切斷裝置,係將貼附於工件的黏著體沿著工件的外形切斷之黏著體的切斷裝置,前述裝置包含以下構成;保持台,將前述工件載置保持;切斷機構,使金屬線抵接於自前述工件突出的黏著體以切斷黏著體;及旋轉驅動機構,以金屬線沿著前述工件的外形行進的方式使保持台與金屬線相對旋轉,前述切斷機構具備:驅動機構,藉由導輥引導前述金屬線在切斷部位行進;及電源部,經由夾著前述黏著體與金屬線之抵接部位而配置之一對導銷使該導銷間的金屬線導通。 A cutting device for an adhesive body is a cutting device for an adhesive body that is attached to an adhesive body of a workpiece and cut along an outer shape of the workpiece. The device includes the following configuration; the holding table holds and holds the workpiece; a mechanism for abutting the metal wire against the adhering body protruding from the workpiece to cut the adhesive body; and a rotation driving mechanism for rotating the holding table and the metal wire in a manner that the metal wire travels along the outer shape of the workpiece, the cutting The mechanism includes a driving mechanism that guides the wire to travel at the cutting portion by the guide roller, and a power supply portion that is disposed between the guide pin and the guide pin via a contact portion between the adhesive body and the wire The metal wire is turned on. 如請求項4之黏著體的切斷裝置,其中具備調整前述導銷間之金屬線的張力的張力調整機構。 The cutting device for an adhesive body according to claim 4, further comprising a tension adjusting mechanism for adjusting a tension of the wire between the guide pins.
TW103132352A 2013-09-20 2014-09-19 Adhesive material cutting method and adhesive material cutting apparatus TW201521098A (en)

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JPH03170292A (en) * 1989-11-28 1991-07-23 Bando Chem Ind Ltd Apparatus for cutting soft material
EP0755771A1 (en) * 1995-07-28 1997-01-29 Sintokogio, Ltd. Electrically heatable severing element attached to a mold in order to trim a film
US5890481A (en) * 1996-04-01 1999-04-06 Saint-Gobain/Norton Industrial Ceramics Corporation Method and apparatus for cutting diamond
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