JP2015115348A - Encapsulation sheet adhesion method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent contamination of a holding table and the like caused by a softened encapsulation layer extending off a semiconductor substrate in a process of adhering an encapsulation sheet with the semiconductor substrate.SOLUTION: Between a holding surface of an encapsulation sheet T on which a release liner having the same shape as the encapsulation sheet T is attached and a pressing member 35, a first cover film F1 larger than the encapsulation sheet T and having air permeability is interposed, and the encapsulation sheet T is sucked and held by the pressing member 35. Between a holding table 37 and a substrate W, a second cover film F2 larger than the substrate W and having air permeability is interposed, and the substrate W is held by the holding table 37. In this state, the substrate W and the encapsulation sheet T are positioned opposite each other, and the encapsulation sheet T is adhered to the substrate W while being heated.

Description

  In the process of manufacturing a semiconductor device, the present invention applies a sealing sheet in which a sealing layer made of a resin composition is formed on a circuit surface of a semiconductor substrate including a circuit substrate, and seals the circuit surface The present invention relates to a sheet pasting method.

  After surrounding one semiconductor chip with a frame, both sides of the semiconductor chip are sandwiched from each other by a first sealing resin sheet and a second sealing resin sheet made of a prepreg impregnated with resin. A semiconductor device is manufactured by sealing a semiconductor chip (see Patent Document 1).

JP-A-5-291319

  However, the above conventional method has the following problems.

  That is, in recent years, semiconductor devices tend to be miniaturized due to the demand for high-density mounting accompanying rapid development of applications. Therefore, after the semiconductor wafer is divided into semiconductor elements by the dicing process, the semiconductor elements are individually sealed with resin, resulting in a problem that throughput is lowered and production efficiency is lowered.

  This invention is made | formed in view of such a situation, Comprising: It aims at providing the sealing sheet affixing method which can affix a sealing sheet to a semiconductor substrate efficiently and accurately. .

  Therefore, the present inventors have obtained the following knowledge as a result of intensive studies by repeating experiments and simulations in order to solve the inconvenience.

  An attempt was made to divide into a semiconductor device after a single-sheet sealing sheet on which a sealing layer made of a resin composition was formed was applied to the entire surface of the semiconductor substrate and cured.

  However, the sealing layer is softened by heating in order to allow the resin composition, which is the sealing layer, to enter between the pitches of a plurality of semiconductor elements formed on the semiconductor substrate at a narrow pitch and to adhere to the pitch. When the sealing sheet in a state where the sealing layer is softened is pressed and attached to the semiconductor substrate, there is a new problem that the resin composition protrudes from the semiconductor substrate by the pressing and adheres to and adheres to the attaching member and the holding table. occured.

  In order to achieve such an object, the present invention has the following configuration.

That is, a sealing sheet attaching method for attaching a sealing sheet on which a sealing layer made of a resin composition is formed in a process of manufacturing a semiconductor device to a semiconductor substrate,
Between the holding surface of the sealing sheet to which the release liner having the same shape as the sealing sheet is attached and the pasting member, a first cover film having a larger air permeability than the sealing sheet is interposed in the pasting member. A sheet holding process for adsorbing and holding the sealing sheet;
A substrate holding process for holding the semiconductor substrate on the holding table by interposing a second cover film having a larger air permeability than the semiconductor substrate between the semiconductor substrates on the holding table;
An affixing process for affixing to the semiconductor substrate while heating the sealing sheet;
It is provided with.

  (Action / Effect) According to the above method, since the sealing sheet and the holding substrate are interposed between the sealing sheet and the holding member and between the semiconductor substrate and the holding table, respectively, the cover film is held, so that Even if the softened sealing layer protrudes from the semiconductor substrate, it is received by each cover film. Therefore, it can prevent that a sealing layer adheres to a sticking member and a holding table, and is contaminated.

  Note that in the above method, in the pasting process, the sealing sheet may be pasted on the semiconductor substrate in a vacuum chamber in a vacuum state.

  According to this method, it is possible to avoid entrainment of bubbles at the adhesive interface between the semiconductor substrate and the sealing sheet.

  In the above method, the first cover film that comes into contact with the release liner may have a through hole in a portion of the release liner that faces the outside of the plurality of semiconductor element groups formed on the semiconductor substrate.

  In this case, negative pressure due to suction does not act on the region of the sealing layer covering the semiconductor element. Therefore, deformation of the softened sealing layer is suppressed, and as a result, the semiconductor element can be coated with the sealing layer having a uniform thickness.

  According to the sealing sheet sticking method of the present invention, it is possible to prevent contamination of the sticking member and the holding table due to adhesion of the sealing layer protruding from the semiconductor substrate in the process of sticking the sealing sheet to the semiconductor substrate.

It is sectional drawing of a sealing sheet. It is a top view of a sealing sheet. It is a top view which shows the whole structure of a sealing sheet sticking apparatus. It is a top view of the 1st and 2nd cover film supply part. It is a front view of the 1st and 2nd cover film supply part. It is a top view of the 1st and 2nd cover film. It is a bottom view of the 1st conveyance mechanism. It is a front view of a 1st conveyance mechanism. It is a top view of a 2nd conveyance mechanism. It is a front view of a 2nd conveyance mechanism. It is a top view which shows the adsorption | suction surface of a holding table and a press member. It is a front view of a workpiece conveyance mechanism. It is a top view of the holding table with which the cutting unit was equipped. It is a front view of the holding table with which the cutting unit was equipped. It is a perspective view of a cutting unit. It is a flowchart of a sealing sheet sticking process. It is a figure which shows carrying out of a 1st cover film. It is a figure which shows carrying out of a 1st cover film. It is a figure which shows carrying out of a sealing sheet. It is a figure which shows carrying out of a sealing sheet. It is a figure which shows delivery of the sealing sheet from a 1st conveyance mechanism to a 2nd conveyance mechanism. It is a figure which shows delivery of the sealing sheet from a 2nd conveyance mechanism to a press member. It is a figure which shows delivery of the sealing sheet from a 2nd conveyance mechanism to a press member. It is a figure which peels a 2nd peeling liner from a sealing sheet. It is a figure which shows the operation | movement which affixes a sealing sheet on a board | substrate. It is a figure which peels a 1st cover film from a sealing sheet. It is a figure which shows the operation | movement which carries a board | substrate out from a holding table. It is a figure which shows the cutting | disconnection operation | movement of a sealing sheet. It is a figure which shows the cutting | disconnection operation | movement of a sealing sheet. It is a figure which shows the operation | movement which peels a 1st peeling liner from a sealing sheet.

  An embodiment of the present invention will be described below with reference to the drawings. Affixing a sealing sheet on which a sealing layer made of a resin composition is formed on a semiconductor substrate (hereinafter simply referred to as “substrate”) having a plurality of semiconductor elements formed on the surface, A case where cutting is performed along the substrate shape will be described as an example.

<Sealing sheet>
As the sealing sheet T, for example, as shown in FIG. 1, a sheet having the same shape as a semiconductor substrate W (hereinafter simply referred to as “substrate W”) is used. Further, the sealing sheet T is provided with a protective first release liner S1 and a second release liner S2 on both surfaces of the sealing layer M. In the present embodiment, the sealing layer M has the same shape to the extent that it can cover the outlines of the plurality of semiconductor element CP groups formed on the substrate W, as shown in FIG. The first release liners S1 and S2 are the same size as the substrate W and have the same shape. Note that the first release liner S1 and the second release liner S2 can be the same shape or rectangle as the substrate W and larger than the size of the substrate W regardless of the shape of the semiconductor element group.

  The sealing layer M is formed in a sheet shape from a sealing material. Examples of the sealing material include thermosetting silicone resin, epoxy resin, thermosetting polyimide resin, phenol resin, urea resin, melamine resin, unsaturated polyester resin, diallyl phthalate resin, thermosetting urethane resin, and the like. A curable resin is mentioned. Moreover, as a sealing material, the above-mentioned thermosetting resin and the thermosetting resin composition which contains an additive in an appropriate ratio can also be mentioned.

Examples of the additive include a filler and a phosphor. Examples of the filler include inorganic fine particles such as silica, titania, talc, alumina, aluminum nitride, and silicon nitride, and organic fine particles such as silicone particles. The phosphor has a wavelength conversion function, and examples thereof include a yellow phosphor capable of converting blue light into yellow light, and a red phosphor capable of converting blue light into red light. . Examples of the yellow phosphor include garnet phosphors such as Y ₃ Al ₅ O ₁₂ : Ce (YAG (yttrium, aluminum, garnet): Ce). Examples of the red phosphor include nitride phosphors such as CaAlSiN ₃ : Eu and CaSiN ₂ : Eu.

  The sealing layer M is adjusted to a semi-solid state before sealing the semiconductor element. Specifically, when the sealing material contains a thermosetting resin, for example, complete curing (C It is adjusted before being staged, that is, in a semi-cured (B stage) state.

  The dimension of the sealing layer M is appropriately set according to the dimensions of the semiconductor element and the substrate. Specifically, when the sealing sheet is prepared as a long sheet, the length in the left-right direction of the sealing layer, that is, the width is, for example, 100 mm or more, preferably 200 mm or more, for example, 1500 mm. Hereinafter, it is preferably 700 mm or less. The thickness of the sealing layer is appropriately set according to the size of the semiconductor element, and is, for example, 30 μm or more, preferably 100 μm or more, and for example, 3000 μm or less, preferably 1000 μm or less.

  Examples of the first release liner S1 and the second release liner S2 include polymer sheets such as polyethylene sheets, polyester sheets (such as PET), polystyrene sheets, polycarbonate sheets, and polyimide sheets, such as ceramic sheets, such as metal foil. It is done. In the release liner, the contact surface in contact with the sealing layer can be subjected to a release treatment such as a fluorine treatment. The dimensions of the first release liner and the second release liner are appropriately set according to the release conditions, and the thickness is, for example, 15 μm or more, preferably 25 μm or more, and for example, 125 μm or less, preferably 75 μm. It is as follows.

<Sealing sheet pasting device>
Hereinafter, the apparatus which affixes the said sealing sheet on a board | substrate with the sealing sheet sticking apparatus provided with the cutting device of one Embodiment of this invention is demonstrated. In the present embodiment, a case where the sealing sheet is pressed and attached to the substrate in a state where the sealing sheet and the substrate are sandwiched between two cover sheets larger than the sealing sheet will be described as an example.

  FIG. 3 is a plan view showing the entire configuration of the sealing sheet attaching apparatus.

  As shown in FIG. 3, the sealing sheet pasting apparatus includes a substrate supply / recovery unit 1, a substrate transport mechanism 2, an alignment stage 3, a first cover film supply unit 4, a sealing sheet supply unit 5, and a first transport mechanism 6. The second cover film supply unit 7, the second transport mechanism 8, the third transport mechanism 9, the pasting unit 10, the first peeling unit 11, the work transport mechanism 12, the cutting device 13, the second peeling unit 14, and the like. Yes. Here, the first and third transport mechanisms 6 and 9 and the work transport mechanism 12 are suspended and held movably along a guide rail laid on the ceiling. Other configurations are arranged on the apparatus base. Hereinafter, each configuration will be described in detail.

  The substrate supply / recovery unit 1 loads the cassettes C1 and C2 into which the substrate W before the sealing sheet T is pasted and the substrate W after the sealing sheet T is pasted and stored on the cassette base. It has become. The substrates W are stored in the cassettes C1 and C2 in multiple stages with the circuit surface facing upward and at a predetermined interval in the vertical direction.

  The substrate transfer mechanism 2 is provided with a robot arm 16. The robot arm 16 moves horizontally by a movable table. The robot arm 16 itself is configured to be able to move forward and backward, turn, and move up and down. Further, the robot arm 16 includes a horseshoe-shaped Bernoulli chuck 17 at the tip. The Bernoulli chuck 17 takes out the substrate W from the cassette C1 in which the substrate W to be processed is stored in a non-contact manner, and contacts the substrate W in the order of the alignment stage 3, the holding table 37, the holding table 49, and the collection cassette C2. Carry in.

  The alignment stage 3 detects an alignment notch formed on the outer periphery of the substrate W while rotating in a state where the back surface of the substrate W is sucked and held by a suction pad that advances and retreats from the holding surface. Thereafter, the alignment stage 3 performs center alignment of the substrate based on the detection result.

  As shown in FIGS. 4 and 5, the first cover film supply unit 4 has positioning pins 18 provided upright on the bottom. That is, as shown in FIG. 6, the first cover film supply unit 4 inserts the positioning pins 18 into the positioning holes 19 formed on the outer periphery of the first cover film F1, and a predetermined number of first cover films F1. Are stored in layers. In addition, the 1st cover film F1 has the several hole 20 for adsorption conveyance along the outer periphery of the sealing sheet T shown by the dashed-two dotted line of FIG.

  As shown in FIGS. 19 and 20, the sealing sheet supply unit 5 stores a predetermined number of sealing sheets T in a stacked manner.

  As shown in FIGS. 7 and 8, the first transport mechanism 6 includes positioning pins 22, a first cover film suction pad 23, and a sealing sheet suction pad 24 on the bottom surface of the first holding portion 21. I have. Note that the third transport mechanism 9 has the same layout and the same configuration as the first transport mechanism 6.

  As illustrated in FIGS. 9 and 10, the second transport mechanism 8 includes a second holding unit 26. The second holding unit 26 includes a suction pad 28 for the first cover film and a seal at respective positions facing the suction pad 23 and the suction pad 24 provided on the bottom surface of the first holding unit 21 of the first transport mechanism 6. A suction pad 29 for the sheet is provided. In addition, a positioning hole 27 into which the pin 22 is inserted is formed in one facing the pin 22 of the first holding portion 21. Further, each corner of the second holding part 26 is provided with positioning pins 30 inserted through the positioning holes 19 of the first cover film F1. The pin 30 is configured to move up and down by a spring or a cylinder. That is, the second transport mechanism 8 is configured to receive from the first transport mechanism 6 while maintaining the alignment of the first cover film F1 and the sealing sheet T.

  As shown in FIGS. 24 to 27, the affixing unit 10 includes an upper press unit 32, a lower press unit 33, and the like. The upper press unit 32 includes a pressing member 35 that moves up and down along the guide rail by the operation of the cylinder 34.

  The lower press unit 33 includes a holding table 37 that holds the second cover film F2 and the substrate W by suction. The holding table 37 can reciprocate along the guide rail at a position below the pressing member 35 of the upper press unit 33 from the receiving position of the second cover film F2 and the substrate W, as indicated by the one-dot chain line in FIG. It is configured.

  As shown in FIG. 11, suction pads 38 and 39 are respectively provided on the bottom surface of the pressing member 35 and the surface of the holding table 37 with the same layout as the first transport mechanism 6. That is, one pressing member 35 adsorbs and holds the first cover film F1 and the sealing sheet T at the same time. The other holding table 37 sucks and holds the second cover film F2 and the substrate W at the same time. In addition, as shown in FIG. 25, a heater H is embedded in at least one of the pressing member 35 and the holding table 37.

  As shown in FIG. 24 and FIG. 26, the first peeling unit 11 includes two sets of peeling units including a tape supply unit 41, a tape recovery unit 42, a pasting roller 43, and the like. Both peeling units are arranged in parallel at a predetermined pitch on guide rails laid along the horizontal direction of FIG. These peeling units are configured to be horizontally movable individually. Further, the affixing roller 43 of each peeling unit is configured to be movable over a standby position outside the upper press unit 32 and a predetermined peeling position between the upper press unit 32 and the lower press unit 33. Further, both the pasting rollers 43 are configured to be moved up and down by a cylinder 44 or the like.

  Each tape supply unit 41 supplies a release tape Ts that is narrower than the substrate W. One tape collecting unit 42 winds and collects the peeling tape Ts peeled off integrally with the second peeling liner S2. The other tape collecting unit 42 winds and collects the peeling tape Ts peeled off integrally with the first cover sheet F1.

  As shown in FIG. 12, the work transport mechanism 12 includes a plurality of suction pads 47 in the holding portion 46 at the tip of the arm. The holding | maintenance part 46 is comprised so that raising / lowering is possible. Therefore, the workpiece conveyance mechanism 12 sucks the substrate W on which the sealing sheet T is adhered by the holding unit 46, and conveys and places the substrate W on the holding table 49 on the cutting device 13 side illustrated in FIG.

  The cutting device 13 includes a holding table 49 and a cutting unit 50. As shown in FIGS. 13 and 14, the holding table 49 has a suction plate 51 having a diameter smaller than the diameter of the substrate W, and is transferred by the workpiece transfer mechanism 12 and placed in a predetermined alignment posture. Vacuum back the back of W. Further, the holding table 49 is configured to horizontally move front and rear and right and left by the first movable base 53 and the second movable base 54 and to be rotatable about the central axis X by a turning motor. That is, the first movable stand 53 moves along the guide rail 55 toward the receiving position and the cutting unit 50 side. The second movable base 54 moves in a direction intersecting with the guide rail 55 by the guide rail 56.

  In addition, a camera 52 that acquires a contour image of the outer periphery of the substrate W for alignment is provided near the lower portion of the holding table 49.

  As shown in FIG. 15, the cutting unit 50 includes a wire supply unit 60, a cutting unit 61, a wire winding unit 62, and the like.

  In the wire supply unit 60, a reel 64 around which a wire 63 is wound is loaded on a rotary shaft 65. The rotation shaft 65 is interlocked with an electromagnetic brake and applied with an appropriate rotational resistance. Accordingly, excessive feeding of the wire 63 is prevented. The wire 63 may be any metal that can be energized, such as nichrome or tungsten.

As shown in FIGS. 28 and 29, the cutting unit 61 includes a guide pin 66, a power supply unit 67, a controller 68, and the like. The guide pins 66 are a pair of upper and lower, and guide the wire 63 in a direction intersecting the substrate W. The guide pin 66 has a metal tip, and is configured such that a current is supplied from the power supply unit 67 via the controller 68. That is, the controller 68 energizes and heats the wire 63 between the guide pins. As shown in FIG. 15, a tension roller 69 that applies an appropriate tension to the wire 63 guided between the guide pins via the guide roller G is disposed on the upstream side and the downstream side with the cutting portion 61 interposed therebetween. Yes. The guide pin 66, the guide roller G, and the tension roller 69 have a guide groove for preventing the wire 63 from being detached.

The tension roller 69 is connected to a drive unit such as a motor or a cylinder, and is configured to move up and down along the guide shaft.

  In the wire winding unit 62, an empty reel 70 for winding the wire 63 after cutting the sealing sheet is loaded on the winding shaft 71. The take-up shaft 71 is configured to take up and collect the wire 63 by the rotational drive of the motor M.

  As shown in FIG. 30, the second peeling unit 14 includes a tape supply unit 75, a peeling bar 76, a tape collecting unit 77, and the like. Each of these components is fixedly arranged on a vertical wall fixed to the apparatus frame.

  The tape supply unit 75 unwinds the peeling tape Ts narrower than the substrate W from the roll-rolled original roll 78 and guides it to the knife-edge peeling bar 72 via the guide roller 79.

  The release bar 76 presses the release tape Ts and affixes it to the first cover film F1, and after folding the release tape Ts and inverting it, the first cover film F1 integrated with the release tape Ts is sealed with the sealing sheet. Peel from T.

  The peeling tape Ts and the first cover film F1 are wound and collected on the winding shaft 80 in the tape collecting part 77.

  Next, a series of operations for attaching the sealing sheet T for surface protection to the surface of the substrate W and cutting it into the shape of the substrate W using the apparatus of the above embodiment is shown in the flowchart of FIG. 16 and FIGS. Based on

  When the pasting command is issued, the first transport mechanism 6, the third transport mechanism 9, and the substrate transport mechanism 2 operate substantially simultaneously.

  The first transport mechanism 6 moves the first holding unit 21 above the first cover film supply unit 4. Then, as shown in FIG. 17, the 1st holding | maintenance part 21 is dropped and the 1st cover film F1 is adsorbed-held.

  As shown in FIG. 18, the first holding unit 21 of the first transport mechanism 6 moves above the sealing sheet supply unit 5 while holding the first cover film F1 by suction (step S1A). Thereafter, as shown in FIG. 19, the first holding unit 21 lowers the first holding unit 21 and sucks and holds the sealing sheet T through the suction holes 20 formed in the first cover film F1. (Step S2A).

  As shown in FIG. 20, the second holding unit 26 of the second transport mechanism 8 moves below the first holding unit 21 that has moved upward by adsorbing and holding the sealing sheet T. When the alignment between the first holding unit 21 and the second holding unit 26 is completed, the first holding unit 21 is lowered as shown in FIG. At this time, the positioning pins 22 of the first holding part 21 are inserted into the positioning holes 27 of the second holding part 26. At the same time, the pins 30 provided at the corners of the second transport mechanism 8 are inserted into the holes 19 at the corners of the first cover film F1. Therefore, the first cover film F1 is transferred from the first transport mechanism 6 to the second transport mechanism 8 while maintaining the alignment posture (step S3A).

  When the delivery is completed, the first holding unit 21 moves up and performs the next carry-out process of the first cover film F1.

  The second holding unit 26 moves below the upper press unit 32. When the positioning of the pressing member 35 of the upper press unit 32 and the second holding portion 26 facing each other is completed, the second holding portion 26 is raised as shown in FIG. The pressing member 35 sucks and holds the first cover film F1 and the sealing sheet T by the suction pads 38 and 39 on the bottom surface (step S4A). Thereafter, as shown in FIG. 23, the second holding unit 26 moves down and moves to a standby position outside the first press unit 32.

  The sticking roller 43 of any one peeling unit of the first peeling unit 11 moves between the first press unit 32 and the second press unit 33. When the affixing roller 43 reaches the end on the back surface side of the sealing sheet T, the affixing roller 43 rises and affixes the release tape Ts to the second release liner S2, as shown in FIG. Thereafter, the peeling unit sticks the peeling tape Ts to the second peeling liner S2 while moving the sticking roller 43, and winds the peeling tape Ts in synchronization with the moving speed. At this time, the second release liner S2 is peeled off from the sealing sheet T together with the release tape Ts (step S5A). At the time when the second release liner S2 is peeled off, the holding table 37 holding the substrate W by suction via the second cover film F2 has moved below the pressing member 35.

  Next, as with the first transport mechanism 6, the other third transport mechanism 9 moves the third holding unit 31 above the second cover film supply unit 7 as shown in FIGS. 17 and 18. Then, the third holding portion 31 is lowered to hold the second cover film F2 by suction. The third holding unit 31 rises when the second cover film F2 is held by suction, and moves to the lower press unit 33 (step S1B). Thereafter, the third holding unit 31 places the second cover film F2 on the holding table 37 (step S2B).

  The robot arm 16 of the substrate transport mechanism 2 moves the Bernoulli chuck 17 at the tip toward the cassette C1 placed on the cassette base. The Bernoulli chuck 17 is inserted into the gap between the substrates W accommodated in the cassette C1. The robot arm 16 that holds the substrate W by the Bernoulli chuck 17 in a non-contact manner carries the substrate W from the cassette C1 and places it on the alignment stage 3 (step S1C).

  The substrate W placed on the alignment stage 3 is aligned using notches formed on the outer periphery (step S2C). The aligned substrate W is carried out by the Bernoulli chuck 17 again. The Bernoulli chuck 17 places the substrate W on the second cover film F2 placed on the holding table 37 (step S3C).

  The holding table 37 sucks and holds the second cover film F2, and holds the substrate W by suction through the suction holes 20 of the second cover film F2, and moves downward to the pressing member 35 of the upper press unit 32. Moving.

  When the alignment between the pressing member 35 and the holding table 37 is completed, the pressing member 35 heated by the heater H is lowered to a predetermined position as shown in FIG. That is, the sealing layer M of the sealing sheet T sandwiched between the pressing member 35 and the holding table 37 is pressed against the substrate W (step S6). At this time, since the sealing layer M of the sealing sheet T is softened by the heating of the heater H, the sealing layer M enters and adheres to the unevenness formed on the surface of the substrate W. Moreover, the sealing layer M will be in a semi-hardened state by pressurizing and heating over predetermined time.

  After a predetermined time elapses, the pressing member 35 is raised. The peeling roller 43 of the peeling unit moves between the first press unit 32 and the second press unit 33. When the application roller 43 reaches the end of the first cover film F1, the application roller 43 is lowered and the release tape Ts is applied to the first cover film F1 as shown in FIG. Thereafter, the release tape Ts is applied to the first cover film F1 while moving the application roller 43, and the first cover film F1 is taken up in synchronization with the moving speed, thereby removing the first cover film F1 from the release tape Ts. And peeled off from the sealing sheet T (step S7).

  The holding table 37 that sucks and holds the substrate W to which the sealing sheet T is attached moves to the delivery position of the work transport mechanism 12. As shown in FIG. 27, the holding unit 46 of the workpiece transfer mechanism 12 sucks and holds the surface of the sealing sheet T to transfer the substrate W to the holding table 49, and then places the substrate W on the holding table 49. (Step S8). At this time, the second cover film F2 is left adsorbed and held on the holding table 37. The second cover film F2 is not shown by the third transport mechanism 9, and is transported to the collection unit and discarded.

  When the substrate W is sucked and held on the suction plate 51, the outer periphery of the substrate W is photographed by the camera 52 while rotating the suction plate 51. The obtained contour image of the substrate W is subjected to image processing such as binarization processing and pattern matching, for example, to obtain the center coordinates of the substrate W. Based on the center coordinates, the movable bases 53 and 54 are operated to perform alignment (step S9).

  When the alignment is completed, the holding table 49 moves to the cutting unit 50 side. When the holding table 49 reaches the cutting unit 50 side, it further moves horizontally to the cutting unit 50 side (X direction in the figure). Along with the horizontal movement of the holding table 49, the motor M of the cutting unit 50 is driven to run the wire 63 in one direction, and a predetermined current is passed from the power source 67 to the guide pin 66 via the controller 68. When the holding table 49 moves to the cutting position, the first cover film F1 and the sealing layer M are cut until the wire 63 comes into contact with the peripheral edge of the substrate W as shown in FIG. When the wire 63 reaches a predetermined position, as shown in FIG. 28, the suction plate 51 rotates around the central axis X, and only the heated portion of the wire 63 is moved to the substrate while the wire 63 travels in one direction. Contact the outer periphery of W. Accordingly, the sealing layer M protruding from the substrate W by the pasting process is cut into a substrate shape (step S10).

  In the cutting process, when the substrate periphery has irregularities such as notches, it is moved to the holding table 49 so that a predetermined pressure of the wire 63 acts on the substrate periphery. That is, the holding table 49 is moved based on the position information of the contour image data of the substrate W acquired by the alignment stage 3. At the same time, the tension roller 69 is moved up and down so that a predetermined tension is applied between the guide pins 66.

  When the cutting process is completed, the holding table 49 moves to the peeling start position on the initial course. When the holding table 49 reaches the predetermined position, the second peeling unit 14 operates to lower the peeling bar 76 to the tape application start end of the sealing sheet T on the substrate W as shown in FIG. When the peeling tape Ts is affixed to the end of the first peeling liner S1 on the sealing sheet T by the pressing of the peeling bar 76, the movable base 54 moves. By winding the release tape Ts around the take-up shaft 80 in synchronization with the movement of the movable base 54, the first release liner S1 is peeled off from the sealing sheet T together with the release tape Ts ( Step S11).

  When the first release liner S <b> 1 is peeled from the surface of the sealing sheet T, the holding table 49 moves to a delivery position to the substrate transport mechanism 2.

  When the Bernoulli chuck 17 of the substrate transport apparatus 2 holds the substrate W in a non-contact manner, the substrate W is transported to and stored in the cassette C2 (step S12).

  The above-described operation is sequentially repeated until the process of pasting the sealing sheet T to the substrate W is completed, and thereafter the sheet pasting process is completed for a predetermined number of substrates W (step S13).

  According to the above embodiment, the first cover film F 1 having a size larger than the sealing sheet T is interposed between the sealing sheet T and the pressing member 35, and the substrate W is interposed between the substrate W and the holding table 37. Since each of the second cover fills F2 having a larger size is interposed, the first cover film F1 and the second cover film F2 receive the sealing layer M protruding from the substrate W by pressing. Therefore, the sealing layer M can be prevented from adhering to the holding surfaces of the pressing member 35 and the holding table 37, and the number of times of maintenance of both holding surfaces can be reduced.

  In addition, this invention can also be implemented with the following forms.

  (1) In the above-described embodiment device, the first cover film F1 and the second cover film F2 are not limited to the form that adsorbs only the region (non-active region) of the non-formation surface of the semiconductor element CP. For example, the entire surfaces of the first and second cover films F1, F2 may have air permeability.

  (2) In the above-described embodiment apparatus, the sealing sheet T may be attached to the substrate W in a decompression chamber. For example, the holding table 37 and the pressing member 35 are housed in a box-shaped housing. The upper housing is configured to descend as the pressing member 35 descends, and the lower end of the upper housing and the upper end of the lower housing are brought into contact with each other to form a decompression chamber. By connecting the decompression chamber to an external vacuum source through a flow path, the interior can be decompressed to a vacuum state.

  (3) In the above-described embodiment device, the case where the sealing sheet T is attached to the circular substrate W has been described as an example. However, the substrate shape may be a square, a rectangle, or a polygon. When cutting the sealing sheet attached to the substrate having these shapes, the adhesive body can be accurately cut into the substrate shape by repeating the linear movement of the holding table 49 and the rotation of a predetermined angle.

DESCRIPTION OF SYMBOLS 10 ... Pasting unit 13 ... Cutting device 35 ... Pressing member 37 ... Holding table 49 ... Holding table 50 ... Cutting unit 51 ... Suction plate 60 ... Wire supply part 61 ... Cutting part
62 ... Wire winding part 63 ... Wire 66 ... Guide pin 67 ... Power supply part 68 ... Controller 69 ... Tension roller T ... Sealing sheet M ... Sealing layer CF1 ... First cover film CF2 ... Second cover film S1 ... First Peeling liner S2 ... Second peeling liner W ... Semiconductor substrate

Claims (3)

A sealing sheet attaching method for attaching a sealing sheet on which a sealing layer made of a resin composition is formed in a process of manufacturing a semiconductor device to a semiconductor substrate,
Between the holding surface of the sealing sheet to which the release liner having the same shape as the sealing sheet is attached and the pasting member, a first cover film having a larger air permeability than the sealing sheet is interposed in the pasting member. A sheet holding process for adsorbing and holding the sealing sheet;
A substrate holding process for holding the semiconductor substrate on the holding table by interposing a second cover film having a larger air permeability than the semiconductor substrate between the semiconductor substrates on the holding table;
An affixing process for affixing to the semiconductor substrate while heating the sealing sheet;
The sealing sheet sticking method characterized by having provided. In the sealing sheet sticking method of Claim 1,
The said sticking process affixes a sealing sheet on a semiconductor substrate in the decompression chamber made into the vacuum state. The sealing sheet sticking method characterized by the above-mentioned. In the sealing sheet sticking method according to claim 1 or 2,
The first cover film that contacts the release liner has a through hole in a part of the release liner that faces the outside of the plurality of semiconductor element groups formed on the semiconductor substrate.

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