TW201521097A - 膠體之去除方法 - Google Patents
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/225—Correcting or repairing of printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0264—Peeling insulating layer, e.g. foil, or separating mask
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0769—Dissolving insulating materials, e.g. coatings, not used for developing resist after exposure
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
- H05K2203/108—Using a plurality of lasers or laser light with a plurality of wavelengths
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1377—Protective layers
- H05K2203/1383—Temporary protective insulating layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/17—Post-manufacturing processes
- H05K2203/176—Removing, replacing or disconnecting component; Easily removable component
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/30—Details of processes not otherwise provided for in H05K2203/01 - H05K2203/17
- H05K2203/304—Protecting a component during manufacturing
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/303—Surface mounted components, e.g. affixing before soldering, aligning means, spacing means
- H05K3/305—Affixing by adhesive
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- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
一種膠體之去除方法,用於去除塗覆於基板上之膠體,複數配件裝設於該基板上並鄰近該膠體,該膠體之去除方法包括以下步驟:在該基板上塗覆一遮蔽層,該遮蔽層完全覆蓋該複數配件,且至少部份覆蓋該膠體;固化該遮蔽層;去除位於該膠體上之部份遮蔽層,以露出該膠體;將基板放置在除膠藥水中浸泡,以軟化膠體,並使膠體之黏性將低,該遮蔽層能夠耐該除膠藥水以保護該複數配件;刮除軟化後之膠體;去除剩餘之遮蔽層。
Description
本發明涉及一種膠體之去除方法,特別涉及一種適用於電子產品上之膠體之去除方法。
印刷電路板製備中,一般藉由焊接將各晶片電性連接於襯底上。為了提高晶片與襯底之連接強度,通常於晶片邊緣塗抹膠體,膠體藉由毛細作用滲入晶片與襯底之間,當膠體固化後可將晶片牢固連接於襯底上。當晶片與襯底上之電路連接不良時,需將晶片從襯底上拔出,並去除填充膠,以重新焊接晶片。然,由於膠體之材料成份一般為環氧樹脂,其固化後附著力非常強,採用人工刮除時較為困難,導致加工效率之降低;且人工刮除膠體時,易導致其周圍電子元件之損壞,降低了產品良率。
鑒於前述內容,有必要提供一種效率較高且不損傷產品之膠體之去除方法。
一種膠體之去除方法,用於去除塗覆在基板上之膠體,該基板上鄰近該膠體間隔裝設有複數配件,該膠體之去除方法包括以下步驟:在該基板上塗覆一遮蔽層,該遮蔽層完全覆蓋該複數配件,且至少部份覆蓋該膠體;固化該遮蔽層;去除位於該膠體上之部份遮蔽層,以露出該膠體;將基板放置在除膠藥水中浸泡,以軟化膠體,並使膠體之黏性將低,該遮蔽層能夠耐該除膠藥水以保護該複數配件;刮除軟化後之膠體;去除剩餘之遮蔽層。
本發明之膠體去除方法,藉由除膠藥水軟化膠體,從而使膠體更易去除,提高了加工效率;另,藉由遮蔽層覆蓋膠體周圍區域,從而在去除膠體時,不會損傷其周圍之配件,提高了產品良率。
圖1係本發明實施方式之膠體之去除方法之流程示意圖。
圖2至圖7係本發明實施方式之膠體之去除過程之剖面示意圖。
請一併參閱圖1及圖2,本實施方式之去除方法用於去除基板10上之膠體20。基板10之上表面12上間隔裝設有電子元件70及複數配件30,複數配件30鄰近電子元件70設置。將膠體20塗覆於電子元件70之周緣,膠體20滲入電子元件70與基板10之間,當膠體20固化後,膠體20將電子元件70牢固黏接於基板10上。膠體20之成份為環氧樹脂,其黏附力強,可在0~180℃範圍內固化。本實施方式中之基板10為印刷電路板,電子元件70為晶片。可理解,基板10還可為液晶屏等其他電子元件。當電子元件70與基板10接觸不良時,需拆下電子元件70並去除膠體20,以重新連接電子元件70與基板10。
前述膠體之去除方法包括以下步驟:
S1:在基板10之上表面12形成一遮蔽層40,該遮蔽層40覆蓋基板10之整個上表面12,且完全覆蓋膠體20及至少部份覆蓋複數配件30,以保護該基板10及該複數配件30(參閱圖3);
遮蔽層40之耐化性較佳,其可保護基板10及配件30不被化學試劑(如除膠藥水)腐蝕。在本實施方式中,遮蔽層40之成份為矽系或氟系樹脂。遮蔽層40之形成方法可採用本領域技術人員熟知之各種方法,如:噴墨印刷、磁控濺射等。可理解,遮蔽層40亦可不覆蓋膠體而使膠體裸露。
S2:固化該遮蔽層40;
本實施方式中採用UV固化方法固化遮蔽層40。可理解,根據遮蔽層40之具體成份,還可採用室溫固化、高溫固化等其他固化方式固化遮蔽層40。
S3:提供一掩模50,其上開設有與膠體20之形狀相配合之照射孔52(參閱圖4),將掩模50設置於基板10上方並使照射孔52對應膠體20;
S4:利用鐳射控制系統60去除位於膠體20上之部份遮蔽層40,使膠體20裸露(參閱圖4及圖5);
本實施方式中,鐳射控制系統60發出之聚焦後之高功率雷射光束經照射孔52照射位於膠體20上之遮蔽層40之表面,當鐳射之功率密度超過材料閥值功率密度後,可直接將常態下之遮蔽層高溫離子氣化,輔助外力抽吸,使鐳射照射位置之遮蔽層40快速移除以露出該膠體20。
S5:將基板10放置在具有預設溫度之除膠藥水中浸泡預定時間,以軟化膠體20,並使膠體20之黏性降低;
該除膠藥水可溶脹固化後之膠體,使其軟化,並使膠體20之黏性降低。該除膠藥水可依膠體20之成份而變化,如其可為芳香族溶劑、酯類溶劑、酮類溶劑、醇醚類溶劑、亞碸類溶劑、醯胺類溶劑等,只要其可軟化膠體20即可。本實施方式中,除膠藥水為醇醚類溶劑、亞碸類溶劑及醯胺類溶劑中之一種或其混合物。優選之,本實施方式之浸泡溫度為100~120℃,浸泡時間為60~120min。
S6:刮除軟化後之膠體20(參閱圖6);
S7:去除剩餘之遮蔽層40(參閱圖7);
去除遮蔽層40時,可採用本領域技術人員熟知之各種方法,如:撕除、浸泡溶解或高壓設備去除等。
可理解,掩模50可省略,可使雷射光束直接聚焦於遮蔽層40位於膠體20上之區域,進而除去位於膠體20上之部份遮蔽層40。
本實施方式之膠體去除方法,藉由除膠藥水軟化膠體20,從而使其更易去除,提高了加工效率;另,藉由遮蔽層40遮蔽膠體20周圍區域,從而在去除膠體20時,不會損傷其周圍之配件30,提高了產品良率。
綜上所述,本發明符合發明專利要件,爰依法提出申請專利。惟,以上該者僅為本發明之較佳實施例,舉凡熟悉本案技藝之人士,在爰依本發明精神所作之等效修飾或變化,皆應涵蓋於以下之如申請專利範圍內。
10‧‧‧基板
12‧‧‧上表面
20‧‧‧膠體
30‧‧‧配件
40‧‧‧遮蔽層
50‧‧‧掩模
52‧‧‧照射孔
60‧‧‧鐳射控制系統
70‧‧‧電子元件
無
Claims (9)
- 一種膠體之去除方法,用於去除塗覆於基板上之膠體,複數配件裝設於該基板上並鄰近該膠體,該膠體之去除方法包括以下步驟:
在該基板上塗覆一遮蔽層,該遮蔽層完全覆蓋該複數配件,且至少部份覆蓋該膠體;
固化該遮蔽層;
去除位於該膠體上之部份遮蔽層,以露出該膠體;
將基板放置在除膠藥水中浸泡,以軟化膠體,並使膠體之黏性將低,該遮蔽層能夠耐該除膠藥水以保護該複數配件;
刮除軟化後之膠體;
去除剩餘之遮蔽層。 - 如申請專利範圍第1項所述之膠體之去除方法中,其中該遮蔽層之成份為矽系樹脂或氟系樹脂。
- 如申請專利範圍第1項所述之膠體之去除方法中,其中該除膠藥水為芳香族溶劑、酯類溶劑、酮類溶劑、醇醚類溶劑、亞碸類溶劑及醯胺類溶劑中之一種或多種。
- 如申請專利範圍第1項所述之膠體之去除方法中,其中將基板放置於除膠藥水中浸泡時,需預設一浸泡溫度及一浸泡時間,以使膠體可充分地軟化。
- 如申請專利範圍第4項所述之膠體之去除方法中,其中該浸泡溫度為100~120℃,該浸泡時間為60~120分鐘。
- 如申請專利範圍第1項所述之膠體之去除方法中,其中去除該遮蔽層之方法為撕除、浸泡溶解及高壓設備去除中之一種或多種。
- 如申請專利範圍第1項所述之膠體之去除方法中,其中採用鐳射控制系統去除位於膠體上之部份遮蔽層。
- 如申請專利範圍第7項所述之膠體之去除方法中,其中鐳射控制系統去除位於膠體上之部份遮蔽層前,提供一掩模,該掩模上開設有與該膠體之形狀相配合之照射孔,將該掩模設置於基板上並使照射孔對應膠體,鐳射控制系統發出之鐳射經照射孔照射在膠體上並去除膠體。
- 如申請專利範圍第1項所述之膠體之去除方法中,其中固化該遮蔽層之方法採用UV固化、室溫固化及高溫固化中之一種或多種。
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TW102142012A TW201521097A (zh) | 2013-11-19 | 2013-11-19 | 膠體之去除方法 |
US14/520,910 US20150136170A1 (en) | 2013-11-19 | 2014-10-22 | Method for removing adhesive agent |
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TW102142012A TW201521097A (zh) | 2013-11-19 | 2013-11-19 | 膠體之去除方法 |
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CN108704869B (zh) * | 2018-03-22 | 2020-03-03 | 京东方科技集团股份有限公司 | 保护层去除装置和方法 |
CN113050391A (zh) * | 2021-03-18 | 2021-06-29 | 歌尔股份有限公司 | 涂覆有uv胶的元器件的回收方法 |
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TW583497B (en) * | 2002-05-29 | 2004-04-11 | Sipix Imaging Inc | Electrode and connecting designs for roll-to-roll format flexible display manufacturing |
US7586060B2 (en) * | 2003-12-25 | 2009-09-08 | Nitto Denko Corporation | Protective sheet for laser processing and manufacturing method of laser processed parts |
US7223674B2 (en) * | 2004-05-06 | 2007-05-29 | Micron Technology, Inc. | Methods for forming backside alignment markers useable in semiconductor lithography |
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2013
- 2013-11-19 TW TW102142012A patent/TW201521097A/zh unknown
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2014
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