TW201514639A - Drawing device and drawing method - Google Patents

Abstract

Provided are a drawing device and drawing method which, when drawing a pattern on an inclined drawing region of an object to be drawn upon, are capable of: increasing the resolution of the pattern by aligning the focal point of patterning light with the inclined drawing region; preventing pattern deformation; and increasing the resolution of the pattern by irradiating the resist film on the inclined drawing region with orthogonal patterning light. Specifically provided is a drawing device for irradiating an object to be drawn upon with drawing light from a light-modulating element and drawing a pattern on the object to be drawn upon while continuously scanning the object to be drawn upon relative to the drawing light, said device being characterized by comprising a holding means for holding the object to be drawn upon, a measurement means for measuring the inclination of the surface to be drawn upon of the object to be drawn upon held by the holding means, an inclination adjustment means for adjusting the inclination of the holding means, and an inclination control means for controlling the inclination adjustment means according to the measurement results from the measurement means so that the surface to be drawn upon of the object to be drawn upon is irradiated with substantially orthogonal drawing light.

Description

Drawing device and drawing method

The present invention relates to a drawing device and a drawing method used in a photolithography process such as a liquid crystal display or a printed circuit board, and more particularly to drawing a drawing area (drawn surface) of an inclined surface of a drawing object (a drawing object) Direct drawing device for patterns and direct drawing methods.

A photo-etching program is included in a production program such as a liquid crystal display or a printed circuit board constituting an electronic device component, and a drawing device and a drawing method are used in the photo-etching process.

In the past, the drawing object of the drawing device and the drawing method was a plate-shaped planar member, and the drawing area was a horizontal plane. Therefore, by focusing the focus distance of the irradiated pattern light on the plate-like plane (the horizontal plane of the drawing area) of the drawing object to perform scanning, appropriate drawing can be performed.

However, in recent years, with the development of, for example, portable electronic devices and the like, in order to improve portability or design-based viewpoints, the above-described components such as a liquid crystal display or a printed circuit board are formed into a three-dimensional shape (for example, a non-single plane). The demand for a shape with an inclined surface is increasing. That is, the drawing area of the drawing object changes from a single single plate-like plane (horizontal plane) to a three-dimensional shape of an inclined surface (including a curved surface curved to a horizontal plane) inclined to the horizontal plane.

When the pattern is drawn in the drawing area of such a three-dimensional shape, there will be Three question points described later.

The first problem is that since the drawing area includes the inclined surface, the pattern light is out of focus at the time of scanning, and an image blur state (the focus is in the front state and the focus is in the back state) occurs, and the resolution of the pattern is lowered.

The second problem is the case where the pattern is deformed (mainly elongated) when drawing on the inclined surface of the drawing area.

The third problem is that the resolution of the pattern is lowered because the light is obliquely incident on the photoresist film in the oblique drawing region.

Patent Documents 1 and 2 disclose techniques that are recognized by the above three technical problems.

In Patent Document 1, when scanning exposure is performed on a plate (drawing body) placed on a jig (holding device), the jig is adjusted along the inclination of the plate in the Z direction (up and down direction), thereby preventing scanning exposure. Defocus.

However, it is impossible to prevent the difference in the focus position from occurring in the exposure region (the region where the exposure unit illuminates the pattern light), and it is also impossible to prevent the deformation of the pattern in the exposure region.

In Patent Document 2, before the exposure of the wafer (the object to be drawn) fixed on the sample platform, the amount of pattern distortion caused by the inclination of the wafer is calculated in advance, and the pattern data drawn by the electron line is corrected to Prevent distortion of the pattern in the exposed area. However, when the inclined surface of the wafer is exposed, the pattern light is out of focus and the image is blurred (the focus is in the front state and the focus is in the back state), and the resolution of the pattern is lowered.

Advanced technical literature Patent literature

Patent Document 1: Japanese Patent Laid-Open Publication No. 2001-313241

Patent Document 2: Japanese Patent Laid-Open No. Hei 10-106928

The present invention has been made based on the above-described problem, and an object thereof is to obtain a drawing device and a drawing method for focusing a pattern light on an oblique drawing area to improve pattern analysis when drawing a pattern on a drawing area of an inclined shape of a drawing object. The degree of deformation of the pattern is prevented, so that the pattern light is perpendicularly incident on the photoresist film of the oblique drawing area to improve the resolution of the pattern.

The drawing device of the present invention is characterized in that the drawing object is irradiated with the drawing light by the light modulation element, and the drawing body continuously scans the drawing light while drawing the pattern on the object to be drawn, the drawing device comprising a holding device for holding the object to be drawn; a measuring device for measuring a tilt of a drawing surface of the drawing object held by the holding device; a tilt adjusting device for adjusting a tilt of the holding device; and a tilt control device Corresponding to the measurement result of the measuring device, the tilt adjusting device is controlled such that the drawing light is incident perpendicularly to the drawn surface of the object to be drawn.

The measuring device may have at least three detectors that measure the distance between the drawing surface and the reference position at a predetermined position on the drawn surface of the object to be drawn; the predetermined positions are respectively located on the scanning of the drawing light. Direction side.

At least one of the detectors has a position inside the region illuminated by the drawing light of the scanned surface of the scan as a predetermined position; and another detector, the region illuminated by the scanning light of the scan Vertical direction of the scanning direction The position near the boundary of the direction is a predetermined position.

The measuring device includes an approximate plane calculating device that calculates an approximate plane corresponding to a predetermined region of the drawn surface based on a distance measured by the plurality of detectors; and the tilt control device controls the tilt adjusting device to cause the drawing light It is slightly perpendicular to the approximate plane.

In the drawing method of the present invention, the drawing object is irradiated with the drawing light by the light modulation element, and the drawing body continuously scans the drawing light, and the pattern is drawn on the object to be drawn, and the drawing method is for drawing. During the period, the steps described later are performed plural times: a measurement step of measuring the inclination of the drawn surface of the object to be drawn by the holding device; and a tilt adjustment control step of adjusting the holding device according to the measurement result in the measuring step Tilting so that the drawing light is incident perpendicularly to the drawn surface of the object to be drawn.

According to the present invention, it is possible to obtain a drawing device and a drawing method for focusing a pattern light on an oblique drawing area to improve the resolution of the pattern and preventing the pattern from being deformed when the pattern is drawn on the drawing area of the inclined shape of the object to be drawn. The light is incident perpendicularly on the photoresist film of the oblique drawing area to improve the resolution of the pattern.

1‧‧‧Drawing device (scanning type drawing device)

1X‧‧‧shell

1Y‧‧‧ mounting table

10‧‧‧ platform (holding device)

10A‧‧‧Guiding materials

10B‧‧‧Clock Department

20‧‧‧ platform moving mechanism

21‧‧‧ rails

30‧‧‧Position adjustment device (tilt adjustment device)

31‧‧‧Bottom plate

31A‧‧‧Guiding materials

31B‧‧‧Care Department

32‧‧‧中板部

32A‧‧‧Guiding materials

32B‧‧‧Clock Department

32C‧‧‧Guiding materials

32D‧‧‧Clock Department

40‧‧‧Exposure unit base (drawing unit base)

50‧‧‧Exposure unit moving mechanism (drawing unit moving mechanism)

60‧‧‧Exposure unit (drawing unit)

61‧‧‧Light source

70‧‧‧ tilt detector unit (tilt measuring device, approximate plane calculating device)

71‧‧‧1st detector

72‧‧‧2nd detector

73‧‧‧3rd detector

80‧‧‧calculation device

90‧‧‧Control device (tilt control device, posture control device)

110‧‧‧ oblique drawing area (drawing surface)

A1~A7 B1~B7 C1~C7 D1~D7 E1~E7‧‧‧Split oblique drawing area (segment area)

W‧‧‧Substrate (drawn object)

Figs. 1(A) and 1(B) are perspective views showing a structure (a three-dimensional shape) of a substrate as a drawing object of a drawing device.

Fig. 2 is a conceptual diagram showing a state in which an oblique drawing area of a substrate is divided into a plurality of divided areas.

Fig. 3 is a conceptual diagram showing the overall configuration of a drawing device according to an embodiment of the present invention.

Fig. 4 is a functional block diagram of a drawing device according to an embodiment of the present invention.

Fig. 5 is a perspective view showing the appearance of a drawing device according to an embodiment of the present invention.

Fig. 6 (A) and (B) are diagrams showing the detailed structure and principle of the tilt detector unit (tilt measuring device, approximate plane calculating device).

Fig. 7 is a flow chart showing the drawing operation of the drawing device.

Fig. 8(A) is a view showing a state in which the pattern light is irradiated to the plane (horizontal plane) of the drawing area of the substrate of Fig. 1(A), and Fig. 8(B) is a view showing the substrate of Fig. 1(A). The state in which the drawing area illuminates the pattern light.

A drawing device 1 according to an embodiment of the present invention will be described with reference to Figs.

<Configuration of Substrate W as Graphic Object>

First, the structure (stereoscopic shape) of the substrate W as the object to be drawn of the drawing device will be described with reference to Figs. 1(A) and 1(B). The substrate W is, for example, a liquid crystal display or a printed circuit board that constitutes a component of an electronic device.

In the first drawings (A) and (B), the substrate W has a drawing area (drawn surface) of an inclined shape extending in the scanning direction (the vertical direction of the paper surface in the drawing) (hereinafter referred to as "tilt drawing" Area") 110. In the first diagram (A), the drawing area extending in the left-right direction in the same figure is sharper toward the conversion portion of the oblique drawing area 110, and in the first drawing (B), the drawing area extending from the left-right direction in the same figure. The conversion portion to the oblique drawing region 110 is a relatively gentle R surface.

In the present specification, the "inclined drawing area (drawn surface) 110" indicates a three-dimensional shape including an inclined surface inclined to a horizontal plane and a curved surface curved to a horizontal plane.

The inclined drawing region 110 of the substrate W may have an inclined surface or a curved surface whose sectional shape changes depending on the position of the scanning direction. For example, in the first drawings (A) and (B), the inclined drawing region 110 of the substrate W can be set to the scanning direction (the vertical direction of the paper in the same drawing) and the sub scanning direction (the horizontal direction in the same figure). ) Change the shape.

That is, the shape of the inclined drawing region 110 of the substrate W shown in FIGS. 1(A) and (B) is only an example, and the oblique drawing region 110 may have any shape.

<Configuration of Drawing Device 1>

Next, the configuration of the drawing device 1 will be described with reference to FIGS. 2 to 6 . The drawing device 1 is a device that irradiates the substrate W with the drawing light by the optical modulation element, continuously scans the drawing light, and draws the pattern on the substrate W. In the same figure, the substrate W having the oblique drawing region 110 shown in Fig. 1(A) is illustrated and described as a drawing object of the drawing device 1.

As shown in Fig. 2, the drawing device 1 is a scanning type drawing device that divides the oblique drawing region 110 as the substrate W of the object to be divided into a plurality of divided oblique drawing regions juxtaposed in the scanning direction and the sub-scanning direction. (hereinafter referred to as "divided area") A1 to A7, B1 to B7, C1 to C7, D1 to D7, and E1 to E7, and pattern light is continuously applied to each of the divided areas A1 to E7.

The oblique drawing region 110 of the substrate W is actually divided into a plurality of divided regions of, for example, 8 (divided) × 25 (column) = 200 (divided region). In order to improve the resolution of the pattern drawing, the number of divisions of the segmentation area is as large as possible. However, in this embodiment In the state, in order to make the invention easy to understand (to display all of the above-described plurality of divided regions is practically impossible), the oblique drawing region 110 of the substrate W is illustrated and described as being divided into 7 × 5 = 35 divided regions A1. ~E7 case.

The drawing device 1 has a casing 1X on which the constituent elements of the drawing device 1 are supported by the mounting table 1Y.

The drawing device 1 has a platform (holding device) 10 that holds a substrate W that is a drawing object. The stage 10 has a vacuum suction holding mechanism (not shown) that vacuum-adsorbs the lower surface (platform contact surface) of the substrate W to hold it. Further, in the case where the lower surface (platform contact surface) of the substrate W is a non-planar special shape, a substrate holding mechanism corresponding to the special shape is mounted on the stage 10.

The drawing device 1 has a stage moving mechanism 20 that continuously moves the stage 10 holding the substrate W in the X direction (scanning direction). The stage moving mechanism 20 includes two guide rails 21 (fifth drawing) which are formed in the X direction (scanning direction) on the mounting table 1Y, and guide members on the platform 10 side guided by the guide rails 21 (not A driving device (not shown) that continuously drives the guiding member against the guide rail 21 is shown. Further, the stage moving mechanism 20 may include a structure that can move the stage 10 in the Y direction (sub scanning direction), the Z direction (height direction), and the θ direction (swing direction).

A posture adjusting device (tilt adjusting device) 30 is provided between the platform 10 and the platform moving mechanism 20, and the platform 10 is moved in a three-dimensional manner in synchronization with the continuous movement of the platform 10 holding the substrate W in the X direction (scanning direction). The movement is such that the posture (inclination angle) of the platform 10 and the inclined drawing region 110 (the divided regions A1 to E7) of the substrate W held by the platform 10 is continuously or stepwise changed.

As shown in FIG. 5, the posture adjusting device 30 includes: a transmission guide structure The bottom plate portion 31 guided by the guide rail 21 of the platform moving mechanism 20 and the intermediate plate portion 32 located above the bottom plate portion 31, the platform 10 is located above the middle plate portion 32 (platform) 10 constitutes a top plate portion of the posture adjusting device 30). On the upper surface of the bottom plate portion 31 and the lower surface of the intermediate plate portion 32, four guide members 31A and a guide member 32A are respectively provided, and each of the guide members has a portion constituting an imaginary arc drawn on the XZ plane and A guiding surface extending in the Y direction. The guiding faces of the guiding member 31A and the guiding member 32A are guided along an imaginary arc drawn in the XZ plane, whereby the platform 10 and the inclined drawing region 110 of the substrate W held by the platform 10 can be changed in the XZ plane. Position (tilt) of (divided areas A1 to E7). The engaging member 31A and the guiding member 32A are formed with an engaging portion 31B and an engaging portion 32B for preventing the guiding faces of the two guiding members from coming off.

Four guide members 32C and a guide member 10A are respectively disposed on the upper surface of the intermediate plate portion 32 and the lower surface of the platform 10, and each of the guide members has a portion constituting an imaginary arc drawn on the YZ plane and is in the X direction. Extended guide surface. The guiding surface of the guiding member 32C and the guiding member 10A is guided along an imaginary arc drawn on the YZ plane, whereby the inclination of the platform 10 and the substrate W held by the platform 10 can be changed in the YZ plane. The posture (tilt) of the region 110 (the divided regions A1 to E7). The guiding member 32C and the guiding member 10A are formed with an engaging portion 32D and an engaging portion 10B for preventing the guiding faces of the two guiding members from coming off.

The drawing device 1 is provided with a driving device (not shown) that drives the guiding member 31A of the bottom plate portion 31 and the guiding member 32A of the intermediate plate portion 32, and a guiding member 32C and a platform that are driven to guide the intermediate plate portion 32. A driving device (not shown) of the guiding member 10A of 10. In this manner, the posture adjustment mechanism disposed in the XZ plane between the bottom plate portion 31 and the intermediate plate portion 32 and the YZ flat disposed between the intermediate plate portion 32 and the platform 10 are provided. The in-plane posture adjustment mechanism is combined to move the platform 10 in a three-dimensional manner, and the posture (tilt) of the platform 10 and the inclined drawing region 110 (divided regions A1 to E7) of the substrate W held by the platform 10 can be performed. Change continuously or stepwise. Further, the specific aspect of the posture adjusting device (tilt adjusting device) is not limited to the one described herein, and may be, for example, a device using a linear linear slide or a device using a wedge structure. Known institutions.

The drawing device 1 has a gate-type exposure unit base (drawing unit base) 40 on the mounting table 1Y that straddles the stage 10, the stage moving mechanism 20, and the posture adjusting device 30 in the Y direction (sub-scanning direction). The exposure unit (drawing unit) 60 is supported by the exposure unit base 40 so as to be movable in the Y direction (sub-scanning direction) by the exposure unit moving mechanism (drawing unit moving mechanism) 50.

The exposure unit 60 irradiates the pattern drawing light to the oblique drawing region 110 of the substrate W held by the stage 10, thereby exposing (drawing) the pattern.

More specifically, the exposure unit 60 continuously shifts the irradiation position of the pattern light from the initial state of the divided division area A1 by the stage moving mechanism 20 in the X direction (scanning direction) while the pattern light is applied to the substrate. The divided areas A1 to A7 of W are continuously irradiated. Then, by the stage moving mechanism 20 and the exposure unit moving mechanism 50, the irradiation position of the pattern light of the exposure unit 60 is aligned with the divided area B1. Then, the exposure unit 60 continuously moves the stage 10 in the X direction (scanning direction) by the stage moving mechanism 20, and simultaneously irradiates the pattern light to the divided areas B1 to B7 of the substrate W. By repeating the above operation, the exposure unit 60 continuously irradiates the pattern light to the divided regions A1 to E7 of the substrate W.

The exposure unit 60 has a light source 61 that emits light (Fig. 3). In addition, although illustration is omitted, the exposure unit 60 includes adjustment to make the light source 61 The amount of light to be irradiated is uniformized so that it becomes an illumination optical system of a parallel beam, a DMD that causes the adjusted light in the illumination optical system to become pattern light, and a tilt that guides the pattern light reflected by the DMD to the substrate W A projection optical system and a focus adjustment optical system in which the drawing region 110 (divided regions A1 to E7) are imaged. A method of continuously drawing a pattern using DMD is described in detail in, for example, Japanese Laid-Open Patent Publication No. 2003-057837, and in the present embodiment, drawing (exposure) is performed in the same manner.

The exposure unit 60 is provided with a tilt detector unit (tilt measuring device, approximate plane calculating device) 70 that measures the tilt drawing region 110 (each divided region A1 to E7) of the substrate W held by the stage 10, and calculates the tilt based on the tilt Approximate plane.

The tilt detector unit 70 is disposed at a position shifted from the exposure unit 60 in the X direction (scanning direction). Therefore, when the exposure unit 60 continuously irradiates the pattern light to the divided region of the same scanning line, the tilt detector unit 70 calculates another division of the predetermined illumination pattern light that is later than the pattern light irradiation position of the exposure unit 60. The approximate plane of the area.

In the present embodiment, when the exposure unit 60 applies the pattern light to the divided area A1, the tilt detector unit 70 calculates an approximate plane of the divided area A2 on which the pattern light is to be irradiated later. On the other hand, when the exposure unit 60 irradiates the divided area A7 with the pattern light, since the divided area on which the pattern light is to be irradiated is not scheduled to be thereafter on the scanning line, the tilt detector unit 70 does not calculate (cannot calculate) any of The approximate plane of the segmentation region.

The tilt detector unit 70 obtains the inclination of each of the divided regions A1 to E7 of the substrate W. Specifically, the tilt detector unit 70 calculates each of the substrates W. The approximate plane of the divided areas A1 to E7.

As shown in FIGS. 6(A) and (B), the tilt detector unit 70 unitizes the three detectors of the first detector 71, the second detector 72, and the third detector 73. The three detectors 71 to 73 are, for example, detectors for measuring the distance, and it is preferable to be able to measure the substrate W in a non-contact manner. For example, a laser displacement gauge, an ultrasonic displacement gauge, and an air micro-test can be used. And so on.

The three detectors 71 to 73 are combined with the scanning of the substrate W to obtain a plurality of reference positions for each of the divided regions A1 to E7 of the substrate W (the position is not inclined in the divided region and the focal plane of the exposure unit 60 is aligned). The approximate plane between each divided region A1 to E7 of the substrate W is calculated based on the distance between the measurement position on the drawing surface and the plurality of distances.

At this time, the distance of the plural number cannot be obtained at one time, and the scan corresponding to the substrate W is divided into at least two times for measurement. Thereby, the distance can be measured at a position that is appropriately separated in the scanning direction and the two directions perpendicular to the scanning direction. For the measurement position (established position) of the tilt data, at least one of the detectors measures the distance in the region (the illuminated region) in which the drawing light is continuously irradiated by scanning in the oblique drawing region, and the other tilt detectors The distance is measured near the boundary of the illuminated area. Furthermore, the vicinity of the illuminated area may be either the inside of the illuminated area or the outside of the illuminated area.

The first detector 71, the second detector 72, and the third detector 73 use a commercially available displacement gauge made by a known technique. A known technique is described in detail in, for example, Japanese Laid-Open Patent Publication No. 2001-159516.

Further, when the tilt direction of the substrate W is only one direction, the measurement by the three detectors 71 to 73 may be performed not once but only once, and the measurement of three points at this time The position is arranged on a straight line.

As shown in FIG. 4, the drawing device 1 has a calculation device 80 that receives an input of an approximate plane of the oblique drawing region 110 (each divided region A1 to E7) of the substrate W calculated by the tilt detector unit 70.

The calculation device 80 calculates a posture of the platform 10 (inclination) in which the pattern light irradiated by the exposure unit 60 is incident perpendicularly to the oblique drawing region 110 (divided regions A1 to E7) of the substrate W based on the input information from the tilt detector unit 70. degree).

In other words, the calculation device 80 calculates that the pattern light irradiated by the exposure unit 60 is incident perpendicularly on the approximate plane of the oblique drawing region 110 of the substrate W calculated by the tilt detector unit 70 based on the input information from the tilt detector unit 70. Platform 10 posture (inclination).

More specifically, the calculation device 80 calculates the posture of the platform 10 in which the pattern light continuously irradiated by the exposure unit 60 is slightly incident on the approximate plane of each of the divided regions A1 to E7 of the substrate W calculated by the tilt detector unit 70.

As shown in FIG. 4, the drawing device 1 has a control device (tilt control device, posture control device) 90.

The control device 90 causes the platform 10 and the platform 10 by the posture adjusting device 30 in the scanning exposure of the oblique drawing region 110 (each divided region A1 to E7) of the substrate W based on the calculation result of the calculating device 80. The posture (tilt) of the inclined drawing region 110 (divided regions A1 to E7) of the held substrate W changes instantaneously.

The control device 90 changes the posture (tilt) of the inclined drawing region 110 of the substrate W held by the platform 10 and the platform 10 by the posture adjusting device 30, so that the pattern light irradiated by the exposure unit 60 is incident perpendicularly to the substrate. The oblique drawing area 110 of W (divided areas A1 to E7).

That is, the control device 90 changes the inclined drawing area 110 of the substrate W held by the platform 10 and the platform 10 by the posture adjusting device 30. The posture (tilt) is such that the pattern light irradiated by the exposure unit 60 is incident slightly perpendicular to the approximate plane of the oblique drawing region 110 of the substrate W calculated by the tilt detector unit 70.

More specifically, the control device 90 changes the posture (tilt) of the inclined drawing region 110 of the substrate W held by the platform 10 and the platform 10 in a stepwise manner by the posture adjusting device 30 to continuously irradiate the exposure unit 60. The pattern light is slightly incident on the approximate plane of each of the divided regions A1 to E7 of the substrate W calculated by the tilt detector unit 70.

<Drawing (Exposure) Method of Drawing Device 1 for Substrate W>

Next, the drawing (exposure) operation of the drawing device 1 will be described mainly with reference to FIGS. 7 and 8.

Fig. 7 is a flow chart showing the on the fly measurement processing of the drawing device 1. In the so-called immediate response mode, the tilt detector unit 70 sequentially irradiates the pattern light to each of the divided areas A1 to E7 of the substrate W, and the platform is stepwisely controlled by the control device 90 and the posture adjusting device 30. When the posture of 10 is changed in each of the divided regions (A1 to E7), the inclination and the approximate plane of each divided region of the substrate W are calculated for each posture of the stage 10.

In step S1, the tilt detector unit 70 measures the tilt of the divided area A1 of the substrate W, and calculates an approximate plane based on the tilt. At this time, the exposure unit 60 does not perform irradiation of the pattern light.

In step S2, at the time point when the stage moving mechanism 20 moves the stage 10 by only one step in the X direction (scanning direction), the tilt detector unit 70 calculates the tilt and the approximate plane of the divided area A2 of the substrate W, and at the same time, the exposure unit 60 pairs of divided areas A1 Irradiation of the pattern light. At this time, the posture adjusting device 30 changes the posture (tilt) of the inclined drawing region 110 of the substrate W held by the platform 10 and the platform 10 under the control of the control device 90, so that the pattern light irradiated by the exposure unit 60 is slightly omitted. It is incident perpendicularly to the approximate plane of the divided area A1 of the substrate W calculated by the tilt detector unit 70.

In step S3, in the same manner as steps S1 to S2, while the stage moving mechanism 20 continuously moves the stage 10 in the X direction (scanning direction), the tilt detector unit 70 calculates the division of the substrate W stepwise. The inclination of the areas A3 to A7 and the approximate plane, the exposure unit 60 continuously irradiates the pattern lights to the divided areas A2 to A7.

At this time, the posture adjusting device 30 changes the posture (tilt) of the inclined drawing region 110 of the substrate W and the substrate W held by the platform 10 in a stepwise manner under the control of the control device 90, so that the exposure unit 60 The pattern light to be irradiated is incident perpendicularly to the approximate plane of the divided regions A2 to A7 of the substrate W calculated by the tilt detector unit 70.

In step S4, the tilt detector unit 70 stepwise calculates the tilt and approximate plane of the divided regions B1 to E7 of the substrate W in the same manner as the steps S1 to S3, and the exposure unit 60 continuously irradiates the divided regions B1 to E7. Pattern light. At this time, the posture adjusting device 30 continuously changes the posture (tilt) of the inclined drawing region 110 of the substrate W held by the platform 10 and the platform 10 under the control of the control device 90, so that the pattern light irradiated by the exposure unit 60 is caused. The approximation plane of the divided regions B1 to E7 of the substrate W calculated by the tilt detector unit 70 is incident slightly perpendicularly.

Fig. 8(A) is a view showing a state in which the pattern light is irradiated on the plane (horizontal plane) of the drawing area of the substrate W of Fig. 1(A), and Fig. 8(B) is a view showing the first figure (B). The inclined drawing area 110 of the substrate W illuminates the pattern light status. In Fig. 8(B), the posture adjusting device 30 performs adjustment so that the oblique drawing region 110 of the substrate W and the horizontal plane are substantially coincident, and the pattern light is incident perpendicularly to these approximate planes.

Further, in the above-described embodiment, the posture control device 30 operates in a stepwise manner, and measures the approximate plane of the second divided region in front and the approximate plane of the first divided region in front, and performs the complementary operation. The posture of the two approximate planes is changed, whereby the posture (tilt) of the stage 10 can be continuously changed. In this case, the interval between the tilt detector unit 70 and the exposure unit 60 is determined so that the tilt data of the second divided region in front can be measured.

Further, in the above-described embodiment, the measurement and the drawing processing of the tilt data are simultaneously performed. However, the measurement processing of the mapping method may be employed. First, the tilt data is measured for all the divided regions at one time, and then the drawing processing is executed. The mapping method is such that all the tilt data is acquired before the drawing processing, and the posture control device 30 performs the complementary operation between the divided regions so that the posture of the platform 10 can be continuously changed. Further, the approximate plane of the divided regions of one column may be averaged, and the posture of the stage 10 may be maintained constant, and the drawing process may be directly performed.

As described above, in the drawing device 1 of the present embodiment, the tilt detector unit 70 calculates the approximate plane of the oblique drawing region 110 (each divided region A1 to E7) of the substrate W held by the stage 10, and the control device (tilt control device, posture control) The device 90 changes the posture (tilt) of the stage 10 such that the pattern light irradiated by the exposure unit 60 is incident perpendicularly to the oblique drawing area 110 of the substrate W calculated by the tilt detector unit 70 (each divided area A1 to E7) Approximate plane.

Thereby, in the oblique drawing area 110 of the substrate W (each divided area) A1~E7) When drawing (exposure), the pattern light can be focused on the oblique drawing area to improve the resolution of the pattern, preventing the deformation of the pattern, and causing the pattern light to be perpendicularly incident on the photoresist film of the oblique drawing area to improve the resolution of the pattern. .

In the above-described embodiment, the case where the three detectors of the first detector 71, the second detector 72, and the third detector 73 are unitized by the tilt detector unit 70 will be described as an example. However, from the viewpoint of the accuracy of the calculated approximate plane, the number of detectors is preferably as large as possible, and depending on the arrangement space and cost, there may be a case where four or more detectors are unitized.

In the above-described embodiment, the case where the inclination detector unit 70 is provided in the exposure unit 60 and the two are integrated is described as an example. However, the inclination detector unit 70 is not necessarily provided in the exposure unit 60. It is also possible to have a separate device from the exposure unit 60. However, the fact that the tilt detector unit 70 is provided in the exposure unit 60 and the two are integrated is advantageous in that the positional relationship of the pattern light irradiated by the tilt detector unit 70 and the exposure unit 60 can be clearly defined.

In the above-described embodiment, the case where one substrate W is held on the stage 10 is exemplified. However, a plurality of small substrates W may be disposed and held on the stage 10. In this case, the posture of the stage 10 is separately controlled such that each exposure light is perpendicular to a plurality of oblique drawing areas 110 corresponding to the number of substrates W.

1‧‧‧Drawing device (scanning type drawing device)

1X‧‧‧shell

1Y‧‧‧ mounting table

10‧‧‧ platform (holding device)

10A‧‧‧Guiding materials

10B‧‧‧Clock Department

20‧‧‧ platform moving mechanism

21‧‧‧ rails

30‧‧‧Position adjustment device (tilt adjustment device)

31‧‧‧Bottom plate

31A‧‧‧Guiding materials

31B‧‧‧Care Department

32‧‧‧中板部

32A‧‧‧Guiding materials

32B‧‧‧Clock Department

32C‧‧‧Guiding materials

32D‧‧‧Clock Department

40‧‧‧Exposure unit base (drawing unit base)

50‧‧‧Exposure unit moving mechanism (drawing unit moving mechanism)

60‧‧‧Exposure unit (drawing unit)

61‧‧‧Light source

70‧‧‧ tilt detector unit (tilt measuring device, approximate plane calculating device)

90‧‧‧Control device (tilt control device, posture control device)

110‧‧‧ oblique drawing area (drawing surface)

W‧‧‧Substrate (drawn object)

Claims (5)

A drawing device that irradiates a drawing object with a drawing light by a light modulation component, continuously scans the drawing light, and draws a pattern on the object to be drawn, the drawing device comprising: holding the image a holding device for the drawing body; a measuring device that measures the inclination of the drawn surface of the drawing object held by the holding device; a tilt adjusting device that adjusts the tilt of the holding device; and a tilt control device corresponding to the measuring As a result of the measurement of the apparatus, the tilt adjustment means is controlled such that the drawing light is incident perpendicularly to the drawn surface of the object to be drawn. The drawing device of claim 1, wherein the measuring device has at least three detectors that measure a distance between the drawn surface and the reference position at a predetermined position on the drawn surface of the drawn object; The positions are respectively located on the side of the scanning direction of the scanning light. The drawing device of claim 2, wherein: at least one of the detectors has an inner position of a region illuminated by the drawing light of the scanned surface of the scan as a predetermined position; The detector has a position near a boundary in the vertical direction of the scanning direction of the region irradiated by the scanning light of the scanning. The drawing device according to claim 2, wherein the measuring device has an approximate plane calculating device that calculates a vicinity of a predetermined region corresponding to the drawn surface based on a distance measured by the plurality of the detectors. The plane control device controls the tilt adjustment device such that the drawing light is slightly perpendicular to the approximate plane. A drawing method for irradiating a drawing object with a drawing light by a light modulation element, continuously scanning the drawing object with the drawing light, and simultaneously drawing a pattern on the object to be drawn, the drawing method being executed during drawing The steps described later are plural times: a measurement step of measuring the inclination of the drawn surface of the object to be drawn by the holding device; and a tilt adjustment control step of adjusting the tilt of the holding device in accordance with the measurement result in the measuring step, The drawing light is incident perpendicularly to the drawn surface of the object to be drawn.