JP2006234959A - Exposure method and exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus in which errors due to out-of-focus range are prevented even when a photosensitive material having large fluctuation in waviness or thickness is used, and productivity therefore is maintained. <P>SOLUTION: The center positions of focus control ranges by exposure heads 166 are denoted as P1 to P4, respectively, and an average focus position D0 of P1 to P4 is determined. A stage 152 is moved along the a Z-direction, that is, the optical axis direction so as to align the surface of a photosensitive material 150 on the stage 152, that is, the center position in the variation range D56 of an exposure face 56, that is, a reference plane D560 in the figure of the exposure face 56 to the position D0. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to an exposure method and an exposure apparatus, and more particularly to an exposure method and an exposure apparatus for exposing a photosensitive material with a light beam modulated by a spatial modulation element or the like according to image information.

  Conventionally, various exposure apparatuses that use a spatial light modulation element (SLM) such as a digital micromirror device (DMD) to perform image exposure with a light beam modulated according to image data (image information) have been proposed. ing.

  For example, the DMD is a mirror device in which a number of micromirrors whose reflecting surfaces change in response to a control signal are arranged two-dimensionally on a semiconductor substrate such as silicon, and FIG. 9 using this DMD. In the exposure apparatus 300 of the conventional digital scanning exposure method (maskless exposure method) shown, a light source that emits laser light, a lens system that collimates the laser light emitted from the light source, and a substantially focal position of the lens system are arranged. Each of the DMD micromirrors is turned on / off by a control signal generated in accordance with image data or the like by an exposure head (scanner) 302 equipped with DMD and a lens system that forms an image of the laser light reflected by the DMD on the scanning surface. The laser beam is controlled to be modulated, and the modulated laser beam is set on the stage 304 and moved to the photosensitive material 306 moved along the scanning direction. It is doing the image exposure.

  In addition, the exposure apparatus 300 follows an alignment function that corrects an exposure position deviation (X, Y direction) with respect to the photosensitive material 306 and a variation in waviness and thickness (Z direction) of the photosensitive material 306. Are provided with an autofocus function for focusing the laser beam, and alignment marks and reference holes provided in the photosensitive material 306 are used as a reference portion for alignment for measuring the position (X, Y direction) of the photosensitive material 306. A CCD camera 308 for alignment is detected, and an autofocus displacement sensor 310 for measuring the distance (Z direction) from the exposed surface of the photosensitive material 306 is provided upstream of the exposure head 302. Has been.

  In the exposure operation, the position of the photosensitive material 306 is detected (detection of the alignment reference portion) by the CCD camera 308 before exposure, and the exposure position deviation is corrected and controlled based on the acquired measurement information. After completion of the above, a distance measurement (focus measurement) from the exposed surface of the photosensitive material 306 by the displacement sensor 310 is performed, and control is performed by the controller 390 based on the acquired measurement information, which is provided on the laser light emission side of the exposure head 302. By performing exposure while performing autofocus control so that the focus of the laser beam is aligned with the surface to be exposed by driving the focus mechanism or adjusting the movement of the exposure head 302 in the optical axis direction, the exposure position by the laser beam and The focus position accuracy is improved.

  However, in the case of using a photosensitive material with large fluctuations in waviness and thickness, the optical characteristics are maintained when a large focus adjustment range is used in the autofocus control as used in the exposure apparatus 300 of the conventional digital scanning exposure method described above. This makes it difficult to perform high-definition exposure, resulting in deterioration of image quality.

Therefore, it is necessary to limit the focus adjustment range to a range where high-definition exposure is possible. On the other hand, when the focus adjustment range is limited in this way, when exposure is performed on an exposure target having a large swell or thickness variation, focus measurement is performed by the displacement sensor 310, and the distance between the photosensitive material 306 and the exposure head 302 is determined. At the time of detection, for example, if the undulation or thickness fluctuation range D of the exposure target 306 exceeds the maximum focus range D ′ of the exposure head 302, an error occurs due to the focus range being over, and as a result, the ratio at which exposure is impossible. There is a problem that productivity increases and productivity decreases.
Japanese Patent No. 3305448

  In view of the above facts, the present invention provides an exposure method and an exposure apparatus capable of preventing the occurrence of an error due to overfocus range and ensuring the productivity even when a photosensitive material having a large fluctuation in waviness and thickness is used. Is an issue.

  The exposure method according to claim 1, wherein a plurality of exposure means for scanning and exposing a photosensitive material with a light beam modulated according to image information, and the exposure means and the photosensitive material are scanned by placing the photosensitive material. A moving means for relatively moving in a direction along the direction, a focus detecting means for detecting a focal position of a light beam emitted from the plurality of exposure means, the plurality of exposure means, and an exposed surface of the photosensitive material. Distance measuring means for measuring a distance, and control means for performing focus control for matching the focal position of the light beam emitted from the plurality of exposure means based on the distance information measured by the distance measuring means with the exposed surface And an exposure surface adjustment unit that moves the moving unit in a focus direction of the exposure unit, and the focus position adjustment range in the focus control is adjusted by the focus detection unit. Detecting a plurality of exposure means, calculating a common range of focus position adjustment ranges of the plurality of exposure means, and aligning the center value of the common range and the surface of the moving means by the exposure surface adjustment means for exposure. It is characterized by performing an operation.

  In the invention with the above configuration, the exposure stage is moved so that the photosensitive material is placed at the center of the focus adjustment range in consideration of the focus position variation of the exposure means, and the occurrence of errors due to overrange is prevented, thereby suppressing the decrease in productivity. be able to.

The exposure method according to claim 2, a plurality of exposure means for scanning and exposing a photosensitive material with a light beam modulated according to image information;
A moving means for placing the photosensitive material and relatively moving the exposure means and the photosensitive material in a direction along a scanning direction; and a focus detection means for detecting a focal position of a light beam emitted from the plurality of exposure means. Distance measuring means for measuring the distance between the plurality of exposure means and the exposed surface of the photosensitive material, and light beams emitted from the plurality of exposure means based on distance information measured by the distance measuring means Control means for performing focus control to match the focal position of the exposure surface with the surface to be exposed, and exposure surface adjustment means for moving the moving means in the focus direction of the exposure means. The focus position adjustment range is detected for the plurality of exposure units, a common range of the focus position adjustment ranges of the plurality of exposure units is calculated, and the center of the common range is calculated. And a surface of said moving means is matched by the exposure surface adjusting means and wherein the performing the exposure operation.

  In the invention with the above-described configuration, the exposure stage is moved so that the exposed surface of the photosensitive material is positioned at the center of the focus adjustment range in consideration of variations in the focus position of the exposure means, and the occurrence of errors due to the overrange is prevented, thereby reducing productivity. Can be suppressed.

  The exposure apparatus according to claim 3, wherein a plurality of exposure means for scanning and exposing the photosensitive material with a light beam modulated in accordance with image information, and the exposure means and the photosensitive material are scanned by placing the photosensitive material thereon. A moving means for relatively moving in a direction along the direction, a focus detecting means for detecting a focal position of a light beam emitted from the plurality of exposure means, the plurality of exposure means, and an exposed surface of the photosensitive material. A distance measuring means for measuring a distance; a focus control means for matching a focal position of a light beam emitted from the plurality of exposure means based on the distance information measured by the distance measuring means; Exposure surface adjustment means for moving the movement means in the focus direction of the exposure means, and the focus position adjustment range of the focus control means by the focus detection means. A common range of focus position adjustment ranges of the plurality of exposure units is calculated, and an exposure operation is performed by matching the center value of the common range and the surface of the moving unit by the exposure surface adjustment unit. It is characterized by performing.

  In the invention with the above configuration, the exposure stage is moved so that the photosensitive material or the exposed surface of the photosensitive material is placed at the center of the focus adjustment range in consideration of variations in the focus position of the exposure means, thereby preventing the occurrence of an error due to the range over. In this way, productivity reduction can be suppressed.

  5. The exposure apparatus according to claim 4, wherein a plurality of exposure means for scanning and exposing the photosensitive material with a light beam modulated in accordance with image information, the photosensitive material is placed, and the exposure means and the photosensitive material are scanned. A moving means for relatively moving in a direction along the direction, a focus detecting means for detecting a focal position of a light beam emitted from the plurality of exposure means, the plurality of exposure means, and an exposed surface of the photosensitive material. A distance measuring means for measuring a distance; a focus control means for matching a focal position of a light beam emitted from the plurality of exposure means based on the distance information measured by the distance measuring means; Exposure surface adjustment means for moving the movement means in the focus direction of the exposure means, and the focus position adjustment range of the focus control means by the focus detection means. A common range of focus position adjustment ranges of the plurality of exposure units is calculated, and an exposure operation is performed by matching the center value of the common range and the exposed surface by the exposure surface adjustment unit. It is characterized by that.

  In the invention with the above-described configuration, the exposure stage is moved so that the exposed surface of the photosensitive material is positioned at the center of the focus adjustment range in consideration of variations in the focus position of the exposure means, and the occurrence of errors due to the overrange is prevented, thereby reducing productivity. Can be suppressed.

  Since the present invention has the above-described configuration, it is possible to provide an exposure method and an exposure apparatus that can prevent the occurrence of an error due to overfocus range and ensure the productivity even when using a photosensitive material with large fluctuations in waviness and thickness. I was able to.

  FIG. 1 shows an exposure apparatus according to the first embodiment of the present invention.

  As shown in FIG. 1, the exposure apparatus 100 includes a rectangular thick plate-shaped installation base 156 supported by four legs 154. Two guides 158 extend along the longitudinal direction on the upper surface of the installation table 156, and a rectangular flat plate-like stage 152 is provided on the two guides 158. The stage 152 is arranged so that the longitudinal direction thereof faces the extending direction of the guide 158, is supported by the guide 158 so as to be reciprocally movable on the installation table 156, and is reciprocated along the guide 158 by being driven by a driving device (not shown). Moving. The photosensitive material 150 is sucked and held on the upper surface of the stage 152 in a state where the mounting position is determined by a positioning unit (not shown).

  Gates 160 and 161 are arranged at predetermined intervals on the upstream side and the downstream side in the moving direction of the stage 152 with respect to the center of the installation table 156. The gates 160 and 161 are formed in a U shape so as to straddle the moving path of the stage 152, and both end portions are fixed to both side surfaces of the installation table 156.

  In the gate 160 arranged on the upstream side in the moving direction of the stage 152, three detection units 180 are moved in the moving direction of the stage 152 on the upper part of the front surface (above the moving path of the stage 152) facing the upstream side. Are fixedly arranged at predetermined intervals along a direction orthogonal to the direction. In the detection unit 180, a CCD camera 182 disposed on the upstream side and a displacement sensor 184 disposed on the downstream side are integrated into a substantially box shape. The lens unit 186 of the CCD camera 182 and the displacement sensor 184 Both sensor parts 188 are directed downward.

  In the gate 161 arranged on the downstream side in the moving direction of the stage 152, the scanner 162 is fixedly arranged on the upper part of the rear surface facing the downstream side (above the moving path of the stage 152). The distance between the scanner 162 and the detection unit 180 is an exposure start position by an exposure head 166 described later provided in the scanner 162 and a photographing position by the CCD camera 182 of the detection unit 180 (the optical axis center of the lens unit 186). The distance is set to be slightly longer than the longitudinal dimension of the photosensitive material 150.

  Further, the driving device of the stage 152, the scanner 162, and the detection unit 180 are connected to a controller 190 that controls them. By this controller 190, during the exposure operation of the exposure apparatus 100 described later, the stage 152 is controlled to move at a predetermined speed, the detection unit 180 is controlled to detect the photosensitive material 150 at a predetermined timing, and the exposure head 166 is controlled. The photosensitive material 150 is controlled to be exposed at a predetermined timing.

  2 and 3 show an exposure head according to the first embodiment of the present invention.

  As shown in FIGS. 2 and 3B, the scanner 162 includes a plurality of (for example, eight) exposure heads 166 arranged in an approximately matrix of m rows and n columns (for example, 2 rows and 4 columns). ing.

  As shown in FIG. 2, the exposure area 168 that is an area exposed by the exposure head 166 has a rectangular shape with a short side along the scanning direction, and is inclined at a predetermined inclination angle θ with respect to the scanning direction. . As the stage 152 moves, a strip-shaped exposed area 170 is formed for each exposure head 166 in the photosensitive material 150. As shown in FIGS. 1 and 2, the scanning direction is opposite to the stage moving direction.

  As shown in FIGS. 3A and 3B, the exposure heads 166 are arranged in a line, and each of the strip-shaped exposed areas 170 partially overlaps the adjacent exposed areas 170. Further, they are arranged at a predetermined interval (natural number times the long side of the exposure area, 1 time in the present embodiment) in the arrangement direction. Therefore, for example, the unexposed portion between the image region 168A located on the leftmost side of the first row and the image region 168C located on the right side of the image region 168A is the image located on the leftmost side of the second row. The area 168B is exposed. Similarly, a portion that cannot be exposed between the image area 168B and the image area 168D located on the right side of the image area 168B is exposed by the image area 168C.

  4 and 5 show the optical system of the exposure head according to the first embodiment of the present invention.

  As shown in FIGS. 4A and 4B, each of the exposure heads 166A to 166H uses a digital micromirror as a spatial light modulation element that modulates an incident light beam for each pixel in accordance with image data. A device (DMD) 50 is provided. The DMD 50 is connected to the controller 190 having a scanner control unit including a data processing unit and a mirror drive control unit. The data processing unit of the controller 190 generates a control signal for driving and controlling each micromirror in the region to be controlled by the DMD 50 for each exposure head 166 based on the input image data.

  In addition, the mirror drive control unit controls the angle of the reflection surface of each micromirror of the DMD 50 for each exposure head 166 based on the control signal generated by the data processing unit. The control of the angle of the reflecting surface will be described later.

  On the light incident side of the DMD 50, a fiber array light source 66 including a laser emitting section in which emission ends (light emitting points) of an optical fiber are arranged in a line along a direction corresponding to the long side direction of the exposure area 168, a fiber A lens system 67 for correcting the laser light emitted from the array light source 66 and condensing it on the DMD 50, and a reflecting mirror 69 for reflecting the laser light transmitted through the lens system 67 toward the DMD 50 are arranged in this order.

  The lens system 67 includes a pair of combination lenses 71 that collimate the laser light emitted from the fiber array light source 66 and a pair of combination lenses that correct the light quantity distribution of the collimated laser light to be uniform. 73 and a condensing lens 75 that condenses the laser light whose light quantity distribution has been corrected on the DMD 50. With respect to the arrangement direction of the laser emitting ends, the combination lens 73 spreads the light beam at a portion close to the optical axis of the lens and contracts the light beam at a portion away from the optical axis, and with respect to a direction orthogonal to the arrangement direction Has a function of allowing light to pass through as it is, and corrects the laser light so that the light quantity distribution is uniform.

  Further, on the light reflection side of the DMD 50, as shown in FIG. 5, lens systems 54 and 58 for forming an image of the laser light reflected by the DMD 50 on the scanning surface (exposed surface) 56 of the photosensitive material 150, the lens system 54, A focus mechanism 59 for adjusting the focal length of the laser beam that has passed through 58 is arranged in this order.

  The lens systems 54 and 58 are arranged so that the DMD 50 and the exposed surface 56 are in a conjugate relationship. In this embodiment, the laser light emitted from the fiber array light source 66 is made uniform and incident on the DMD 50. Then, each pixel is enlarged by about 5 times by these lens systems 54 and 58 and is set to be condensed.

  Next, an exposure operation for the photosensitive material 150 by the exposure apparatus 100 configured as described above will be described with reference to FIGS.

  First, when image data corresponding to an exposure pattern is input to the controller 190, it is temporarily stored in a frame memory in the controller. This image data is data representing the density of each pixel constituting the image by binary values (whether or not dots are recorded).

  Next, the photosensitive material 150 is set on the stage 152, and the operator performs an exposure start input operation from the operation unit of the controller 190. The photosensitive material 150 for performing image exposure by the exposure apparatus 100 includes a photosensitive epoxy resin or the like on the surface of a substrate or a glass plate as a material for forming a pattern (image exposure) such as a printed wiring board or a liquid crystal display device. In the case of a dry film, a laminate or the like is applied.

  When the exposure operation of the exposure apparatus 100 is started by the above input operation, the controller 190 controls the driving device, and the stage 152 starts moving at a constant speed from the origin position shown in FIG. . Each detection unit 180 is controlled and operated by the controller 190 in synchronization with the start of the movement of the stage or at a timing just before the leading edge of the photosensitive material 150 reaches just below the CCD camera 182 of the detection unit 180.

  As the stage 152 moves, when the photosensitive material 150 passes below the detection unit 180, alignment measurement by the CCD camera 182 and focus measurement by the displacement sensor 184 are performed simultaneously.

  First, as shown in FIGS. 6 and 7, when the photosensitive material 150 passes below the three CCD cameras 182, each CCD camera 182 images the photosensitive material 150, and the captured image data (imaging data). ) To the data processing unit of the controller 190.

  The data processing unit detects an alignment mark or a reference hole provided in the photosensitive material 150 as an alignment reference portion or an edge portion or a corner portion of the photosensitive material 150 as an alignment reference portion from the input photographing data. A proper exposure position with respect to the position and the exposed surface 56 is grasped. At the time of image exposure by the scanner 162, correction control (alignment) is performed in which the control signal generated based on the image data of the exposure pattern stored in the frame memory is adjusted to the appropriate exposure position to perform image exposure.

  Further, when the photosensitive material 150 passes below the displacement sensor 184, each displacement sensor 184 measures the distance between the exposed surface 56 including detection of the leading edge and the trailing edge of the photosensitive material 150 (edge detection processing). (FIG. 7A), the measured distance data (focus measurement data) is output to the scanner controller of the controller 190.

  The scanner control unit of the controller 190 recognizes the leading end and the trailing end of the photosensitive material 150 based on the input focus measurement data, and executes arithmetic processing for grasping the waviness and thickness dimension error of the photosensitive material 150. . Further, based on the processing result, a control signal for driving and controlling the focus mechanism 59 of each exposure head 166 is generated and output to the scanner 162, and the focal position of the light beam emitted from each exposure head 166 is set to the photosensitive material 150. Focus control for matching with the exposed surface 56 is performed. In this scanning exposure, the focus of the laser beam is adjusted on the surface to be exposed 56 so as to follow the shape of the surface to be exposed 56 and to smoothly follow the shape of the surface to be exposed in synchronization with the scanning.

  At this time, the scanner control unit of the normal controller 190 determines that the difference between the maximum value and the minimum value of the Z coordinate value (optical axis direction) exceeds a preset threshold value from mapping data created based on the focus measurement data. If the difference between the maximum value and the minimum value exceeds the threshold value, it is determined that the waviness or thickness dimension error of the photosensitive material 150 is large and the accuracy is poor, and the controller 190 causes an error. Take control. In the error control, when it is determined that the photosensitive material 150 is inaccurate, the exposure is not immediately performed and the exposure operation is immediately stopped and the stage 152 is returned to the most upstream position. Then, information (error information) for notifying that the exposure operation is stopped is displayed on the monitor of the controller 190. That is, the photosensitive material 150 is not exposed.

  This is because, in order to make the focus of the laser beam on the exposed surface 56 so as to follow the shape of the exposed surface 56 in synchronization with scanning by focus control, the waviness or thickness of the photosensitive material 150 is adjusted. This is because the fluctuation range of the exposed surface 56 due to the error needs to be within the focus adjustment range of the laser beam, and the focus position of each exposure head 166 has a slight deviation, which causes the above-described deviation. The focus adjustment range of the laser beam is narrowed. Further, the surface of the stage 152 also has an error in the optical axis direction (focus direction), which also narrows the focus adjustment range of the laser beam.

  However, even when the waviness or thickness dimension error of the photosensitive material 150 is large as described above, the difference between the maximum value and the minimum value of the Z coordinate value (optical axis direction) is within the maximum width of the focus control, that is, the focus adjustment range of the laser beam. If it is within the range, exposure is actually possible, and there is no need to treat it as an error.

  That is, even when the waviness or thickness dimension error of the photosensitive material 150 is large as described above, the fluctuation range of the exposed surface 56 falls within the focus adjustment range of the laser light depending on the position in the focus direction of the stage 152 on which the photosensitive material 150 is placed. Therefore, it is possible to prevent the occurrence of errors and the decrease in productivity.

  In the present invention, the focus adjustment amount of each exposure head 166 is minimized so that the focus of the laser beam can be adjusted on the exposed surface 56 so as to follow the shape of the exposed surface 56 in a synchronized manner with the focus control. In this way, productivity is ensured by making errors less likely to occur.

  FIG. 8 shows the relationship between the exposure apparatus and the exposed surface according to the present invention.

  For example, when four exposure heads 166 are used and the center position of the focus adjustment range of each exposure head 166 is P1 to P4, the average focal position of P1 to P4 is D0.

  Here, the stage 152 is moved in the Z direction so that the surface of the photosensitive material 150 on the stage 152, that is, the center position of the fluctuation range D56 of the exposed surface 56, that is, D560 in the drawing, which is the reference surface of the exposed surface 56, coincides with D0. That is, it is moved in the optical axis direction.

  Specifically, as shown in FIG. 8, the lifting device 157 provided on the installation table 156 is driven to move the stage 152 in the Z direction, that is, the optical axis direction. As a result, the reference position of the surface of the photosensitive material 150 on the stage 152, that is, the exposed surface 56 becomes D0.

  For this reason, the fluctuation range of the exposed surface 56 due to the waviness or thickness dimension error of the photosensitive material 150, that is, D56 in the figure is focused on D0, and the focus adjustment by the autofocus mechanism is performed in each exposure head 166. D0 is the average of the focus adjustment range of each exposure head 166, that is, the center position of P1 to P4, and this D0 is the surface of the photosensitive material 150, that is, the reference surface of the exposed surface 56 (= the surface height of the stage 156 + the photosensitive material 150). By matching the thickness standard value), the fluctuation range D56 of the exposed surface 56 due to the waviness of the photosensitive material 150 or the thickness dimension error can be easily accommodated in D166, which is the focus adjustment range of each exposure head 166, resulting in an error. Occurrence can be prevented and productivity can be prevented from decreasing.

  Here, the lifting device 157 is provided on the installation base 156 and is a mechanism for adjusting the height of the guide 158, but is not limited thereto, and may be provided between the guide 158 and the stage 152, for example.

  In the conventional exposure apparatus, the measurement data of the distance from the exposed surface 56 of the photosensitive material 150 measured by the displacement sensor 184 has a large unevenness or undulating shape of the exposed surface 56 due to the waviness or warpage of the photosensitive material 150. Alternatively, when a preset threshold value is exceeded due to a large thickness dimensional error of the photosensitive material 150, the scanner control unit of the controller 190 controls the scanner 162 so as not to expose the photosensitive material 150. .

  For this reason, for the photosensitive material 150 that is determined not to be subjected to the exposure process, the time required for setting is lost and the productivity is lowered. Further, since the photosensitive material 150 itself that is determined not to be subjected to the exposure process cannot be used, the photosensitive material is lost and the cost increases.

  In the present invention, it is possible to prevent a decrease in productivity by preventing the occurrence of an error itself, and to suppress an increase in cost by preventing the occurrence of a photosensitive material loss.

It is a perspective view which shows the exposure apparatus which concerns on the 1st form of this invention. It is a perspective view which shows the structure of the scanner which concerns on the 1st form of this invention. It is a figure which shows the arrangement | sequence of the exposure area | region by the exposure head which concerns on the 1st form of this invention. It is a perspective view which shows the structure of the exposure head which concerns on the 1st form of this invention. It is a perspective view which shows the structure of the exposure head which concerns on the 1st form of this invention. It is a figure which shows the exposure operation | movement by the exposure apparatus which concerns on the 1st form of this invention. It is a figure which shows the exposure operation | movement by the exposure apparatus which concerns on the 1st form of this invention. It is a figure which shows the photosensitive material position alignment operation | movement of the exposure apparatus which concerns on the 1st form of this invention. It is a figure which shows the exposure operation | movement by the conventional exposure apparatus.

Explanation of symbols

56 Surface to be exposed 59 Focus mechanism (focusing means)
100 exposure apparatus 150 photosensitive material 152 stage (moving means)
157 Lifting device 162 Scanner (exposure means)
166 Exposure head (exposure means / exposure head)
180 Detection unit 182 CCD camera (reference part detection means)
184 Displacement sensor (distance measuring means)
190 Controller (control means)

Claims (4)

A plurality of exposure means for scanning and exposing a photosensitive material with a light beam modulated according to image information;
Moving means for placing the photosensitive material and relatively moving the exposure means and the photosensitive material in a direction along a scanning direction;
A focus detection means for detecting a focal position of a light beam emitted from the plurality of exposure means;
Distance measuring means for measuring the distance between the plurality of exposure means and the exposed surface of the photosensitive material;
A focus control means for matching the focal position of the light beam emitted from the plurality of exposure means to the exposed surface based on the distance information measured by the distance measurement means;
And an exposure surface adjustment unit that moves the moving unit in a focus direction of the exposure unit. The focus detection unit detects the focus position adjustment range in the focus control unit by the focus detection unit, and the plurality of exposure units. An exposure method comprising: calculating a common range of the focal position adjustment range of the means, and performing an exposure operation by causing the exposure surface adjustment means to match the center value of the common range and the surface of the moving means.
A plurality of exposure means for scanning and exposing a photosensitive material with a light beam modulated according to image information;
Moving means for placing the photosensitive material and relatively moving the exposure means and the photosensitive material in a direction along a scanning direction;
A focus detection means for detecting a focal position of a light beam emitted from the plurality of exposure means;
Distance measuring means for measuring the distance between the plurality of exposure means and the exposed surface of the photosensitive material;
A focus control means for matching the focal position of the light beam emitted from the plurality of exposure means to the exposed surface based on the distance information measured by the distance measurement means;
And an exposure surface adjustment unit that moves the moving unit in a focus direction of the exposure unit. The focus detection unit detects the focus position adjustment range in the focus control unit by the focus detection unit, and the plurality of exposure units. An exposure method comprising: calculating a common range of a focal position adjustment range of the means, and performing an exposure operation by matching a center value of the common range and the surface to be exposed by the exposure surface adjustment unit.
A plurality of exposure means for scanning and exposing a photosensitive material with a light beam modulated according to image information;
Moving means for placing the photosensitive material and relatively moving the exposure means and the photosensitive material in a direction along a scanning direction;
A focus detection means for detecting a focal position of a light beam emitted from the plurality of exposure means;
Distance measuring means for measuring the distance between the plurality of exposure means and the exposed surface of the photosensitive material;
A focus control means for matching the focal position of the light beam emitted from the plurality of exposure means to the exposed surface based on the distance information measured by the distance measurement means;
An exposure surface adjustment unit that moves the moving unit in a focus direction of the exposure unit. The focus detection unit detects the focus position adjustment range in the focus control unit by the focus detection unit, and the plurality of exposure units. An exposure apparatus that calculates a common range of the focal position adjustment range of the means and performs an exposure operation by causing the exposure surface adjustment means to match the center value of the common range and the surface of the moving means.
A plurality of exposure means for scanning and exposing a photosensitive material with a light beam modulated according to image information;
Moving means for placing the photosensitive material and relatively moving the exposure means and the photosensitive material in a direction along a scanning direction;
A focus detection means for detecting a focal position of a light beam emitted from the plurality of exposure means;
Distance measuring means for measuring the distance between the plurality of exposure means and the exposed surface of the photosensitive material;
A focus control means for matching the focal position of the light beam emitted from the plurality of exposure means to the exposed surface based on the distance information measured by the distance measurement means;
An exposure surface adjustment unit that moves the moving unit in a focus direction of the exposure unit. The focus detection unit detects the focus position adjustment range in the focus control unit by the focus detection unit, and the plurality of exposure units. An exposure apparatus that calculates a common range of a focus position adjustment range of the means, and performs an exposure operation by matching a center value of the common range and the surface to be exposed by the exposure surface adjustment unit.

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