JP4322837B2 - Exposure apparatus calibration method, exposure method, and exposure apparatus - Google Patents

Description

  The present invention relates to an exposure apparatus calibration method, an exposure method, and an exposure apparatus, and more particularly to calibrate an exposure alignment function in an exposure apparatus that exposes a photosensitive material with a light beam modulated by a spatial modulation element or the like according to image information. The present invention relates to an exposure apparatus calibration method, an exposure method, and an exposure apparatus.

  Conventionally, various exposure apparatuses that use a spatial light modulation element (SLM) such as a digital micromirror device (DMD) to perform image exposure with a light beam modulated according to image data (image information) have been proposed. ing.

  For example, the DMD is a mirror device in which a number of micromirrors whose reflecting surfaces change in response to a control signal are two-dimensionally arranged on a semiconductor substrate such as silicon. In an exposure apparatus of a scanning exposure method (maskless exposure method), a light source that emits laser light, a lens system that collimates the laser light emitted from the light source, and a DMD and DMD that are arranged at a substantially focal position of the lens system are reflected. The laser beam is modulated by controlling the on / off of each DMD micromirror with a control signal generated according to image data, etc., by an exposure head (scanner) equipped with a lens system that forms an image of the laser beam on the scanning surface. Then, an image (pattern) is scanned and exposed to the photosensitive material that is set on the stage and moved along the scanning direction (Y direction) with the modulated laser light. To have.

  In this exposure apparatus, in order to accurately align the exposure position in the XY direction with respect to the photosensitive material, an alignment mark provided on the photosensitive material, which serves as a reference for the exposure position, is aligned with an alignment camera such as a CCD camera. And aligning the exposure position to the appropriate position based on the mark measurement position (reference position data) obtained by this shooting. For this alignment camera, the exposure apparatus determines the size and alignment mark position. Since a plurality of different types of photosensitive materials are to be exposed, for example, it extends along the direction orthogonal to the scanning direction (X direction) so that it can be photographed even when the position of the alignment mark is changed in the direction orthogonal to the scanning direction. Guided by a guide rail, etc., and driven by a drive mechanism such as a ball screw, And it is adapted to be movable and positioned positioned anywhere across the entire dimension. The position of the alignment camera is detected and measured by position detection means such as a linear scale, and the above-described alignment is performed with reference to the position (see, for example, Patent Document 1).

  Further, with respect to such an alignment function (exposure position alignment function), calibration of each part related to alignment measurement is performed at the time of manufacturing, maintenance, or the like in order to guarantee the accuracy.

  Various techniques relating to the calibration of the alignment function have been proposed for exposure apparatuses of a type in which an image is scanned and exposed by irradiating a photosensitive material moved in the sub-scanning direction while performing main scanning with a laser beam.

For example, in the alignment calibration of the alignment scope, a device that calibrates the position of the alignment scope that measures the printed circuit board prior to performing a predetermined process on the printed circuit board mounted on the mounting table by the processing unit. , The reference mask on which the reference pattern is formed is provided on the mounting table, the alignment scope is moved to the reference pattern at a predetermined position, and then the alignment scope is based on the amount of positional deviation between the intersection of the reference patterns and the center of the alignment scope field of view. There is a technique in which the position calibration of the alignment scope is easily and highly accurately performed with a simple configuration by performing the position calibration (see, for example, Patent Document 2).
Japanese Patent Application Laid-Open No. 8-222511 JP 2000-329523 A

  However, in the above-described digital scanning exposure system and the conventional scanning type exposure apparatus that performs main scanning with laser light, the above-described camera drive is performed when the alignment camera is moved to a position for photographing the alignment mark in alignment prior to exposure. Due to errors in the accuracy of the parts that make up the mechanism, assembly accuracy, etc., the alignment camera changes its posture due to rolling, pitching, and yawing, and the optical axis center of the photographing lens is normal when placed in the photographing position. Deviation from position. This misalignment directly affects the measurement error of the alignment mark. Therefore, even if the exposure position is corrected using the alignment function described above and image exposure is performed, the alignment accuracy is affected by the change in posture caused by the movement of the alignment camera. There is a problem that the exposure position is deviated from the proper position.

  In addition, even the techniques described in Patent Documents 1 and 2 do not consider the influence of the orientation change factor of the alignment camera, so that exposure is performed even when alignment adjustment or alignment function calibration is performed using these techniques. The positional deviation cannot be corrected with high accuracy.

  In the case of the technique described in Patent Document 2, a two-dimensional (lattice-shaped) reference pattern is formed in order to calibrate a plurality of (four) alignment scopes arranged two-dimensionally at a time. Although a large reference mask is used, in order to equip this drawing mask on the drawing stage, the reference mask is arranged between the drawing stage base and the suction table, and the suction table is made of transparent glass. In this way, by providing a large reference mask, the drawing stage is increased in size and weight in the thickness direction, and the suction table is made of glass. There is. Further, in this conventional technique, the alignment scope is calibrated based on the amount of positional deviation between the reference pattern formed on the reference mask and the alignment scope, but in order to achieve more accurate exposure position correction, For example, it is desirable to perform position calibration of the alignment scope based on the exposure position in consideration of the relationship with the exposure position by the light beam.

  In consideration of the above facts, the present invention enables calibration of an exposure alignment function whose accuracy is affected by a posture change factor accompanying movement of an alignment camera for photographing an alignment mark of a photosensitive material, and an exposure position with respect to the photosensitive material. It is an object of the present invention to provide an exposure apparatus calibration method, an exposure method, and an exposure apparatus that can improve the correction accuracy of deviation.

  The present invention also provides an exposure apparatus and an exposure method capable of photographing an alignment mark, detecting an exposure beam position on an exposure surface, and exposing a desired image on a photosensitive material with high positional accuracy based on the alignment mark. This is the issue.

According to the first aspect of the present invention, a photosensitive material provided with a reference mark serving as a reference for the exposure position is placed, a moving means for moving the photosensitive material in a direction along the scanning direction, and a crossing with the scanning direction. A reading means for reading the reference mark of the photosensitive material placed on the moving means, and a light beam obtained by modulating the photosensitive material moved by the moving means in accordance with image data Exposure means for performing exposure by the exposure means, and exposure operation by adjusting the exposure means by adjusting the exposure position by the light beam based on the reference position data obtained by reading the reference mark by the reading means in the exposure by the exposure means A plurality of reading unit reference marks arranged along a moving direction of the reading unit. A reading unit position scale disposed on the reading can be positioned by the reading means the plurality of reading means reference mark with comprising, when reading the reference mark by the reading means, at least one of said plurality of reading means reference mark one read by the reading means disposed at a position for reading the reference mark, and reading position data storage means for storing position data of the reading unit obtained in the reading, detection for detecting the exposure position by the light beam a beam position detecting means comprising a section, the predetermined light beam of the exposure point position said beam position detection means by detecting and exposing spot position information storage for storing the exposure point position data obtained outputted from an exposure means a means, and wherein in the exposure of the photosensitive material, or position data storage means and said control means said read And the reference position data read, reads out the exposure point position data from the exposure point position information storage means, in a plane including a direction perpendicular to the scanning direction and which, in the beam position detecting means, said reading means reference The exposure is performed on the basis of the image data for exposure formed by correcting the image data based on the reference position data and the exposure point position data based on the distance and direction with respect to the mark.

In the invention of the above configuration, the alignment mark formed on the substrate is photographed, the beam position of the exposure beam on the exposure surface is detected, and based on these, a desired image is exposed on the photosensitive material. Can be exposed with high positional accuracy on the substrate.

  The invention according to claim 2 is characterized in that the beam position detecting means and the reading means position scale are provided integrally.

  According to the second aspect of the present invention, the calibration member is integrally provided in the beam position detection means including the detection unit for detecting the exposure position by the light beam, so that the detection unit and the detection unit are separated from each other. The relative position with the reading unit reference mark can be measured with high accuracy, and misalignment or the like is less likely to occur between the detection unit and the reading unit reference mark. A reading means position scale provided integrally with the detecting means is read at a position where the reading means reads the reference mark, and reading position data is obtained. On the other hand, exposure position data of the light beam is obtained by this detecting means, and these reading positions are obtained. Since the desired image is exposed on the photosensitive material based on the data and the exposure beam position data, the exposure image can be exposed on the substrate with high positional accuracy.

According to a third aspect of the present invention, a photosensitive material provided with a reference mark serving as a reference for an exposure position is placed, and a moving means for moving the photosensitive material in a direction along the scanning direction, and intersecting the scanning direction. A reading means for reading the reference mark of the photosensitive material placed on the moving means, and a light beam obtained by modulating the photosensitive material moved by the moving means in accordance with image data Exposure means for performing exposure by the exposure means, and exposure operation by adjusting the exposure means by adjusting the exposure position by the light beam based on the reference position data obtained by reading the reference mark by the reading means in the exposure by the exposure means An exposure apparatus comprising: a control unit configured to cause the exposure apparatus to further include a plurality of calibration reference marks arranged along a moving direction of the reading unit. Wherein a plurality of reading by the reading means calibration reference mark reading was placed possible position position adjustment member with obtaining, at least one of the plurality of calibration reference mark, the position for reading the reference mark reading the arrangement and said reading means comprises a calibration data storing means for storing calibration data calculated on the basis of the position data of the reading unit obtained in the reading, the detector for detecting the exposure position by the light beam Yes a beam position detecting means, an exposure point position information storage means for storing the exposure point position data obtained by detecting by the beam position detecting means exposing spot position of a predetermined light beam output from the exposure means In the exposure of the photosensitive material, the control means reads the calibration data from the calibration data storage means, And the reference position correction data to Tadashiyo data is reflected in the reference position data, reads out the exposure point position data from the exposure point position information storage means, in a plane including a direction perpendicular to the scanning direction and which, said beam Exposure is performed based on exposure image data formed by correcting the image data from the distance and orientation of the position detection unit with respect to the reading unit reference mark by the reference position correction data and the exposure point position data. It is a feature.

  According to the third aspect of the present invention, the alignment mark formed on the substrate is photographed, the beam position of the exposure beam on the exposure surface is detected, and a desired image is exposed on the photosensitive material based on these. The exposure image can be exposed with high positional accuracy on the substrate.

  The invention according to claim 4 is characterized in that the beam position detecting means and the reading position calibration member are provided integrally.

  In the invention according to claim 4, the calibration member is integrally provided in the beam position detection means including the detection unit for detecting the exposure position by the light beam, so that the detection unit and the detection unit are separated from each other. The relative position with the reading unit reference mark can be measured with high accuracy, and misalignment or the like is less likely to occur between the detection unit and the reading unit reference mark. A reading means position scale provided integrally with the detecting means is read at a position where the reading means reads the reference mark, and reading position data is obtained. On the other hand, exposure position data of the light beam is obtained by this detecting means, and these reading positions are obtained. Since the desired image is exposed on the photosensitive material based on the data and the exposure beam position data, the exposure image can be exposed on the substrate with high positional accuracy.

  According to a fifth aspect of the present invention, the beam position detecting unit measures the exposure point position of the light beam at a plurality of measurement points that are not aligned in the scanning direction with respect to the exposure exposure unit, and at the plurality of measurement points. An angle detecting means for detecting an angle of the beam position detecting means with respect to the scanning direction from the measured exposure point position is provided.

  According to the fifth aspect of the present invention, an accurate and simple detection method can be obtained by detecting the angle of the beam position detecting means with respect to the scanning direction from the exposure point positions measured at a plurality of measurement points.

  According to a sixth aspect of the invention, there is provided image data correction means for correcting image data exposed on an exposure surface based on an angle of the beam position detection means detected by the angle detection means with respect to the scanning direction. It is characterized by that.

  In the invention described in claim 6, since the angle correction means is an image data correction means, an accurate adjustment method can be obtained.

  The invention according to claim 7 is provided with an angle adjusting means for adjusting an angle of the beam position detecting means with respect to the scanning direction based on an angle with respect to the scanning direction of the beam position detecting means detected by the angle detecting means. It is characterized by that.

  According to the seventh aspect of the present invention, the angle correction unit is an angle adjustment unit that adjusts the angle of the beam position detection unit with respect to the scanning direction, thereby providing a simple adjustment method.

  According to an eighth aspect of the present invention, a photosensitive material provided with a reference mark serving as a reference for an exposure position is placed, moving means for moving the photosensitive material in a direction along a scanning direction, and crossing the scanning direction. A reading means for reading the reference mark of the photosensitive material placed on the moving means, and after the reading by the reading means, the photosensitive material moved by the moving means is converted into image data. An exposure unit that performs exposure using a light beam modulated in response to the exposure unit, and controls the exposure unit by performing exposure position alignment using the light beam based on reference position data obtained by reading by the reading unit during exposure by the exposure unit. And an exposure apparatus having a control means for performing an exposure operation, wherein the exposure apparatus is further provided in the moving means, and the moving direction of the reading means A calibration member having a plurality of calibration reference marks arranged at predetermined intervals along the plurality of calibration reference marks and arranged at positions where the plurality of calibration reference marks can be read by the reading means, and the plurality of calibration reference marks At least one of them is read by a reading means arranged at a position where the reference mark is read, and a data storage means for storing calibration data calculated based on the position data of the reading means obtained by the reading is provided. In the exposure of the photosensitive material, the control unit reads the calibration data from the data storage unit, reflects the calibration data in the reference position data, aligns the exposure position, and controls the exposure unit. The exposure operation is performed.

  According to the eighth aspect of the present invention, it is possible to calibrate the exposure position alignment function whose accuracy is affected by the posture change factor accompanying the movement of the reading means, and it is possible to improve the correction accuracy of the exposure position deviation with respect to the photosensitive material.

According to a ninth aspect of the present invention, a photosensitive material provided with a reference mark serving as a reference for an exposure position is placed, and a moving means for moving the photosensitive material in a direction along the scanning direction crosses the scanning direction. A reading means for reading the reference mark of the photosensitive material placed on the moving means, and a light beam obtained by modulating the photosensitive material moved by the moving means in accordance with image data Exposure means for performing exposure by the exposure means, and exposure operation by adjusting the exposure means by adjusting the exposure position by the light beam based on the reference position data obtained by reading the reference mark by the reading means in the exposure by the exposure means An exposure method using the control means, wherein the exposure method further includes a plurality of reading means reference marks arranged along a moving direction of the reading means. A reading unit position scale disposed on the reading can be positioned by the reading means the plurality of reading means reference mark with comprising, when reading the reference mark by the reading means, at least one of said plurality of reading means reference mark one read by the reading means disposed at a position for reading the reference mark, and reading position data storage means for storing position data of the reading unit obtained in the reading, detection for detecting the exposure position by the light beam using a beam position detecting means comprising a section, a predetermined light beam exposure point position information storage means for the exposure point position storing exposure point position data obtained by detecting by said beam position detection means outputted from said exposure means In the exposure of the photosensitive material, the control means reads out from the data storage means. And the reference position data, the read exposure point position data from the exposure point position information storage means, in a plane including a direction perpendicular to the scanning direction and which, with the distance to the reading means reference mark of the beam position detection means From the azimuth , exposure is performed based on exposure image data formed by correcting the image data with the reference position correction data and the exposure point position data .

  According to the ninth aspect of the present invention, it is possible to calibrate the exposure position alignment function whose accuracy is affected by the posture change factor accompanying the movement of the reading means, and it is possible to improve the correction accuracy of the exposure position deviation with respect to the photosensitive material.

According to a tenth aspect of the present invention, a photosensitive material provided with a reference mark serving as a reference for an exposure position is placed, a moving means for moving the photosensitive material in a direction along the scanning direction, and a crossing with the scanning direction. A reading means for reading the reference mark of the photosensitive material placed on the moving means, and a light beam obtained by modulating the photosensitive material moved by the moving means in accordance with image data Exposure means for performing exposure by the exposure means, and exposure operation by adjusting the exposure means by adjusting the exposure position by the light beam based on the reference position data obtained by reading the reference mark by the reading means in the exposure by the exposure means An exposure method using the control means, wherein the exposure method further includes a plurality of calibration reference marks arranged along a moving direction of the reading means. Wherein a plurality of reading by the reading means calibration reference mark reading was placed possible position position adjustment member with comprising, at least one of the plurality of calibration reference mark, the position for reading the reference mark reading the arrangement and said reading means comprises a calibration data storing means for storing calibration data calculated on the basis of the position data of the reading unit obtained in the reading, the detector for detecting the exposure position by the light beam using a beam position detecting means, an exposure point position information storage means for storing the exposure point position data obtained by detecting the predetermined light beam said beam position detection means exposing spot position of the output from the exposing unit , wherein in the exposure of the photosensitive material, said control means reads the calibration data from the calibration data storing means, before And the reference position correction data that reflects the calibration data to the reference position data, reads out the exposure point position data from the exposure point position information storage means, in a plane including a direction perpendicular to the scanning direction and which, the beam position Exposure is performed on the basis of exposure image data formed by correcting the image data from the distance and orientation of the detection unit relative to the reading unit reference mark by the reference position correction data and the exposure point position data. It is said.

  According to the tenth aspect of the present invention, the alignment mark formed on the substrate is photographed, the beam position of the exposure beam on the exposure surface is detected, and a desired image is exposed on the photosensitive material based on these. The exposure image can be exposed with high positional accuracy on the substrate.

  In the invention according to claim 11, the beam position detecting means measures the exposure point position of the light beam at a plurality of measurement points that are not aligned in the scanning direction with respect to the exposure exposure means, and at the plurality of measurement points. Using an angle detection unit that detects an angle of the beam position detection unit with respect to the scanning direction from the measured exposure point position, exposure is performed based on the angle of the beam position detection unit detected by the angle detection unit. The image data correcting means for correcting the image data exposed on the surface is used.

  In the eleventh aspect of the present invention, the angle correction means is an image data correction means, thereby providing an accurate adjustment method.

  According to a twelfth aspect of the present invention, the beam position detection unit measures the exposure point position of the light beam at a plurality of measurement points that are not aligned in the scanning direction with respect to the exposure exposure unit, and Based on the angle with respect to the scanning direction of the beam position detecting means detected by the angle detecting means, using the angle detecting means for detecting the angle with respect to the scanning direction of the beam position detecting means from the measured exposure point position, An angle adjusting means for adjusting the angle of the beam position detecting means with respect to the scanning direction is used.

  In the invention described in claim 12, the angle correcting means is an angle adjusting means for adjusting the angle of the beam position detecting means with respect to the scanning direction, whereby a simple adjustment method can be achieved.

  According to a thirteenth aspect of the present invention, a photosensitive material provided with a reference mark serving as a reference for an exposure position is placed, and moving means for moving the photosensitive material in a direction along a scanning direction, and intersecting the scanning direction. A reading means for reading the reference mark of the photosensitive material placed on the moving means, and after the reading by the reading means, the photosensitive material moved by the moving means is converted into image data. An exposure unit that performs exposure using a light beam modulated in response to the exposure unit, and controls the exposure unit by performing exposure position alignment using the light beam based on reference position data obtained by reading by the reading unit during exposure by the exposure unit. And an exposure method using a control means for performing an exposure operation, wherein the exposure method is further provided in the moving means, and the moving means of the reading means And a plurality of calibration reference marks arranged at predetermined intervals along the calibration member arranged at positions where the plurality of calibration reference marks can be read by the reading means, and the plurality of calibration reference marks At least one of them is read by a reading means arranged at a position where the reference mark is read, and a data storage means for storing calibration data calculated based on the position data of the reading means obtained by the reading; In the exposure of the photosensitive material, the control means reads the calibration data from the data storage means, reflects the calibration data in the reference position data, aligns the exposure position, and controls the exposure means. The exposure operation is performed.

  According to the thirteenth aspect of the present invention, the alignment mark formed on the substrate is photographed, the beam position of the exposure beam on the exposure surface is detected, and a desired image is exposed on the photosensitive material based on these. The exposure image can be exposed with high positional accuracy on the substrate.

According to a fourteenth aspect of the present invention, a reference position obtained by reading a reference mark serving as a reference of an exposure position provided on a photosensitive material by a reading unit that is movable in a direction crossing the scanning direction of the photosensitive material. The exposure position alignment function of the exposure apparatus that performs exposure alignment with the light beam modulated according to the image data while aligning the exposure position with respect to the photosensitive material based on the data and moving the photosensitive material in the scanning direction by the moving means is calibrated. A plurality of calibration methods arranged at predetermined intervals along the moving direction of the reading means at positions where the reading means can read before reading the reference mark by the reading means. A position where a calibration member having a reference mark is arranged, and at least one of the plurality of calibration reference marks is read from the reference mark An exposure alignment function of the exposure apparatus by reading with the arranged reading means, calculating calibration data based on the position data of the reading means obtained by the reading, and reflecting the calibration data in the reference position data A calibration method for an exposure apparatus, characterized in that the exposure apparatus has a detection unit having a detection unit for detecting an exposure position by the light beam, and the calibration member is integrated with the detection unit. And correcting the exposure position alignment function of the exposure apparatus by reflecting the exposure position data of the light beam detected by the detection means and the correction data obtained by calculating the calibration data in the reference position data. It is characterized in that.

In the invention of the above configuration, in order to calibrate the exposure position alignment function of the exposure apparatus, the reference mark serving as the reference of the exposure position provided on the photosensitive material is read at a position where the reading means can read the reference mark. A calibration member having a plurality of calibration reference marks arranged at predetermined intervals along the moving direction of the reading means is arranged, and at least one of the plurality of calibration reference marks is used as the reference mark. Based on the position data of the reading means obtained by reading by the reading means arranged at the reading position, for example, when the reading means is the imaging means, the positions of the imaging optical axis (lens optical axis) and the calibration reference mark Calibration data is calculated based on the deviation data and the calibration data is reflected in the reference position data. As a result, it is possible to calibrate the exposure position alignment function whose accuracy is affected by the posture change factor accompanying the movement of the reading means, and it is possible to improve the correction accuracy of the exposure position deviation with respect to the photosensitive material. Further, by providing a calibration member integrally with the detection means having a detection unit for detecting the exposure position by the light beam, the relative position between the detection unit and the calibration reference mark is higher than when separate members are used. In addition to being able to measure with accuracy, misalignment or the like hardly occurs between the detection unit and the calibration reference mark. If the correction data is obtained by calculating the exposure position data of the light beam detected by the detection means and the calibration data obtained using the calibration member provided integrally with the detection means, the error amount The exposure position alignment performed by reflecting the correction data in the reference position data can be performed with higher accuracy.

  Since the exposure apparatus calibration method and exposure apparatus of the present invention have the above-described method and configuration, the exposure alignment function whose accuracy is affected by the attitude change factor accompanying the movement of the alignment camera for photographing the alignment mark of the photosensitive material. Calibration can be performed, and the correction accuracy of the exposure position deviation with respect to the photosensitive material can be improved.

  Further, the exposure method and the exposure apparatus of the present invention photograph an alignment mark formed on a substrate, detect an exposure beam position on the exposure surface, and based on these, expose a desired image on a photosensitive material. The exposure image can be exposed on the substrate with high positional accuracy.

  An exposure apparatus according to an embodiment of the present invention will be described below with reference to the drawings.

  FIG. 1 shows an exposure apparatus according to an embodiment of the present invention. 2 to 6 show an exposure head and a spatial light modulation element applied to the exposure apparatus according to this embodiment, and FIG. 7 shows an alignment unit applied to the exposure apparatus according to this embodiment. Has been.

  As shown in FIG. 1, the exposure apparatus 10 includes a rectangular thick plate-shaped installation base 18 supported by four legs 16. Two guides 20 extend along the longitudinal direction on the upper surface of the installation table 18, and a rectangular flat plate-like stage 14 is provided on the two guides 20. The stage 14 is arranged so that the longitudinal direction thereof is directed to the extending direction of the guide 20, and is supported by the guide 20 so as to be able to reciprocate on the installation table 18. Move (in the direction of arrow Y in FIG. 1).

  On the upper surface of the stage 14, a rectangular plate-shaped photosensitive material 12 serving as an exposure object is placed in a state of being positioned at a predetermined placement position by a positioning unit (not shown). A plurality of grooves (not shown) are formed on the upper surface (photosensitive material placement surface) of the stage 14, and the photosensitive material 12 is placed on the stage 14 by applying a negative pressure to the grooves by a negative pressure supply source. It is adsorbed and held on the upper surface. In addition, the photosensitive material 12 is provided with a plurality of alignment marks 13 indicating the reference of the exposure position. In this embodiment, the alignment marks 13 constituted by circular through holes are each in the vicinity of the four corners of the photosensitive material 12. A total of four are arranged.

  A U-shaped gate 22 is provided at the center of the installation table 18 so as to straddle the movement path of the stage 14. Both ends of the gate 22 are fixed to both side surfaces of the installation base 18. A scanner 24 for exposing the photosensitive material 12 is provided on one side of the gate 22, and the photosensitive material 12 is provided on the other side. An alignment unit 100 including a plurality (for example, two) of CCD cameras 26 for photographing the alignment mark 13 provided on the camera is provided.

  As shown in FIG. 7, the alignment unit 100 includes a rectangular unit base 102 attached to the gate 22. A pair of guide rails 104 are extended on the camera mounting surface side of the unit base 102 along a direction (arrow X direction) orthogonal to the moving direction (arrow Y direction) of the stage 14. Is slidably guided by the pair of guide rails 104 and driven by a drive source such as a ball screw mechanism 106 prepared individually and a stepping motor (not shown) for driving the mechanism, It moves independently in the direction orthogonal to the moving direction. Each CCD camera 26 is arranged in such a posture that the lens portion 26B provided at the tip of the camera body 26A is directed downward and the lens optical axis is substantially vertical, and a ring is provided at the tip of the lens portion 26B. A strobe light source (LED strobe light source) 26C is attached.

  Then, when photographing the alignment mark 13 of the photosensitive material 12, each CCD camera 26 is moved in the direction of the arrow X by the drive source and the ball screw mechanism 106 and arranged at a predetermined photographing position. The optical axis of the lens is arranged so as to match the passing position of the alignment mark 13 of the photosensitive material 12 that moves as the stage 14 moves, and the strobe light source 26C emits light when the alignment mark 13 reaches a predetermined photographing position. Then, the reflected light from the top surface of the photosensitive material 12 of the stroboscopic light irradiated to the photosensitive material 12 is input to the camera body 26A through the lens portion 26B, thereby photographing the alignment mark 13.

  Further, the drive device for the stage 14, the scanner 24, the CCD camera 26, and the drive source for moving the CCD camera 26 are connected to a controller 28 for controlling them. The controller 28 controls the stage 14 so as to move at a predetermined speed during the exposure operation of the exposure apparatus 10 to be described later, and the CCD camera 26 is disposed at a predetermined position and aligned with the alignment mark 13 of the photosensitive material 12 at a predetermined timing. The scanner 24 is controlled to expose the photosensitive material 12 at a predetermined timing.

  As shown in FIG. 2, a plurality of (for example, eight) exposure heads 30 arranged in a substantially matrix of m rows and n columns (for example, 2 rows and 4 columns) are installed in the scanner 24.

  The exposure area 32 by the exposure head 30 is configured in, for example, a rectangular shape having a short side in the scanning direction. In this case, a strip-shaped exposed region 34 is formed for each exposure head 30 in the photosensitive material 12 in accordance with the scanning exposure moving operation.

  In addition, as shown in FIG. 2, the exposure heads 30 in each row arranged in a line are arranged at a predetermined interval (in the arrangement direction) so that the strip-shaped exposed regions 34 are arranged without gaps in the direction orthogonal to the scanning direction. The exposure area is shifted by a natural number times the long side). For this reason, for example, a portion that cannot be exposed between the exposure area 32 of the first row and the exposure area 32 of the second row can be exposed by the exposure area 32 of the second row.

  As shown in FIG. 3, each exposure head 30 includes a digital micromirror device (DMD) 36 as a spatial light modulation element that modulates an incident light beam for each pixel in accordance with image data. Yes. The DMD 36 is connected to the above-described controller 28 having a data processing unit and a mirror drive control unit.

  The data processing unit of the controller 28 generates a control signal for driving and controlling each micromirror in the area to be controlled by the DMD 36 for each exposure head 30 based on the input image data. The area to be controlled will be described later. Further, the mirror drive control unit as the DMD controller controls the angle of the reflection surface of each micromirror in the DMD 36 for each exposure head 30 based on the control signal generated by the data processing unit. The control of the angle of the reflecting surface will be described later.

  On the light incident side of the DMD 36 in each exposure head 30, as shown in FIG. 1, a bundle-like shape drawn out from an illumination device 38 that emits a multi-beam extending in one direction including an ultraviolet wavelength region as laser light. An optical fiber 40 is connected.

  Although not shown, the illuminating device 38 includes a plurality of multiplexing modules that multiplex laser beams emitted from a plurality of semiconductor laser chips and input them to the optical fiber. The optical fiber extending from each multiplexing module is a multiplexing optical fiber that propagates the combined laser beam, and a plurality of optical fibers are bundled into one to form a bundle-shaped optical fiber 40.

  Further, on the light incident side of the DMD 36 in each exposure head 30, as shown in FIG. 3, a uniform illumination optical system 41 that converts the laser light emitted from the connection end of the optical fiber 40 into uniform illumination light, and uniform illumination A mirror 42 that reflects the laser light transmitted through the optical system 41 toward the DMD 36 is disposed.

  The projection optical system provided on the light reflection side of the DMD 36 in each exposure head 30 projects a light source image on the photosensitive material 12 on the exposure surface on the light reflection side of the DMD 36, and therefore in order from the DMD 36 toward the photosensitive material 12. The optical members for exposure of the lens system 50, the microlens array 54, and the objective lens system 56 are arranged.

  Here, as shown in FIG. 3, the lens system 50 and the objective lens system 56 are configured as a magnifying optical system in which a plurality of lenses (such as a convex lens and a concave lens) are combined, and a laser beam (light beam) reflected by the DMD 36. By enlarging the cross-sectional area of the bundle, the area of the exposure area 32 on the photosensitive material 12 by the laser beam reflected by the DMD 36 is enlarged to a predetermined size. Note that the photosensitive material 12 is disposed at the rear focal position of the objective lens system 56.

  As shown in FIG. 3, the microlens array 54 includes two microlenses 60 corresponding one-to-one to each micromirror 46 of the DMD 36 that reflects the laser light emitted from the illumination device 38 through each optical fiber 40. The microlenses 60 are arranged in a dimensional shape and are integrally formed to form a rectangular flat plate. Each microlens 60 is arranged on the optical axis of each laser beam (exposure beam) that has passed through the lens system 50. Has been.

  Further, as shown in FIG. 5, the DMD 36 includes a micromirror (micromirror) 46 supported by a support column on an SRAM cell (memory cell) 44, and has a large number of pixels (pixels). It is configured as a mirror device in which minute mirrors (for example, 600 × 800) are arranged in a lattice pattern. Each pixel is provided with a micromirror 46 supported by a support column at the top, and a material having high reflectance such as aluminum is deposited on the surface of the micromirror 46.

  A silicon gate CMOS SRAM cell 44 manufactured on a normal semiconductor memory manufacturing line is disposed directly below the micromirror 46 via a post including a hinge and a yoke (not shown). (Integrated type).

  When a digital signal is written in the SRAM cell 44 of the DMD 36, the micromirror 46 supported by the support is tilted in a range of ± α degrees (for example, ± 10 degrees) with respect to the substrate side on which the DMD 36 is disposed with the diagonal line as the center. It is done. FIG. 6 shows an example of a state in which a part of the DMD 36 is enlarged and the micromirror 46 is controlled to + α degrees or −α degrees. FIG. 6A shows that the micromirror 46 is in an on state. FIG. 6B shows a state in which the micromirror 46 is inclined to −α degrees, which is in an off state. Therefore, by controlling the inclination of the micromirror 46 in each pixel of the DMD 36 as shown in FIG. 6 according to the image signal, the light incident on the DMD 36 is reflected in the inclination direction of each micromirror 46. .

  On / off control of each micromirror 46 is performed by the mirror drive control unit of the controller 28 connected to the DMD 36, and the light reflected by the on-state micromirror 46 is modulated into an exposure state, and the DMD 36 Is incident on a projection optical system (see FIG. 3) provided on the light exit side. The light reflected by the micromirror 46 in the off state is modulated into a non-exposure state and is incident on a light absorber (not shown).

  Further, it is preferable that the DMD 36 is disposed slightly inclined so that the short side direction forms a predetermined angle (for example, 0.1 ° to 0.5 °) with the scanning direction. 4A shows the scanning trajectory of the reflected light image (exposure beam) 48 by each micromirror when the DMD 36 is not tilted, and FIG. 4B shows the scanning trajectory of the exposure beam 48 when the DMD 36 is tilted. Show.

  In the DMD 36, a number of micromirror arrays in which a large number (for example, 800) of micromirrors 46 are arranged along the longitudinal direction (row direction) are arranged in a short direction (for example, 600 sets). As shown in FIG. 4B, by tilting the DMD 36, the pitch P2 of the scanning trajectory (scanning line) of the exposure beam 48 by each micromirror 46 is greater than the pitch P1 of the scanning line when the DMD 36 is not tilted. It becomes narrower and the resolution can be greatly improved. On the other hand, since the tilt angle of the DMD 36 is very small, the scan width W2 when the DMD 36 is tilted and the scan width W1 when the DMD 36 is not tilted are substantially the same.

  Further, substantially the same position (dot) on the same scanning line is overlapped and exposed (multiple exposure) by different micromirror rows. In this way, by performing multiple exposure, it is possible to control a minute amount of the exposure position and to realize high-definition exposure. Further, the joints between the plurality of exposure heads arranged in the scanning direction can be connected without any step by controlling a very small amount of exposure position.

  Note that the same effect can be obtained by arranging the micromirror rows in a staggered manner at a predetermined interval in the direction orthogonal to the scanning direction instead of inclining the DMD 36.

  In the exposure apparatus 10 of the present embodiment, as shown in FIGS. 1 and 2, a beam irradiated on the downstream side in the alignment measurement direction (upstream side in the exposure direction) in the moving direction of the stage 14 (arrow Y direction). Detection means for detecting the position and the above-described positional deviation is detected by detecting the position and the amount of light, and this detection means includes a reference plate 70 attached to the downstream edge of the stage 14 in the alignment measurement direction. The photo sensor 72 is movably mounted on the back side of the reference plate 70.

  The reference plate 70 is formed of a rectangular glass plate having the entire length in the width direction of the stage 14, a beam position detection unit 70 </ b> A is provided on the downstream side in the alignment measurement direction of the stage 14, and the camera on the upstream side. A position detection unit 70B is provided (see FIG. 8).

  The beam position detection unit 70A has a plurality of detection slits 74 formed in a transparent portion (translucent portion) with a “<” shape that opens in the X direction by patterning with a metal film such as chrome plating. They are arranged at predetermined intervals along the direction.

  As shown in FIG. 9A, the “<”-shaped detection slit 74 includes a linear first slit portion 74 a having a predetermined length located on the upstream side in the stage moving direction, and the stage moving direction. And a linear second slit portion 74b having a predetermined length located on the downstream side of the first end portion and each end portion of the second slit portion 74b. That is, the first slit portion 74a and the second slit portion 74b are orthogonal to each other, and the first slit portion 74a has an angle of 135 degrees and the second slit portion 74b has an angle of 45 degrees with respect to the Y axis. .

  In addition, although the 1st slit part 74a and the 2nd slit part 74b in the slit 74 for a detection illustrated what was formed so that an angle of 45 degrees might be made with respect to the moving direction (scanning direction) of the stage 14, The first slit portion 74a and the second slit portion 74b are inclined with respect to the pixel arrangement of the exposure head 30 and at the same time inclined with respect to the stage moving direction (a state in which they are not parallel to each other). If possible, the angle with respect to the stage moving direction may be arbitrarily set. Further, a diffraction grating may be used instead of the detection slit 74.

  Below the detection slit 74 in the beam position detector 70A, a photosensor 72 (which may be a CCD, CMOS, or a photodetector) that detects light from the exposure head 30, and a moving device 76 that moves the photosensor 72. And are arranged. The moving device 76 moves the photosensor 72 along the X direction and stops at each predetermined position by conveying means such as a linear motor feeding mechanism, a screw feeding mechanism, or a conveying belt mechanism, which is driven and controlled by a command from the controller 28. Here, based on a command from the controller 28, the photosensor 72 is moved to a predetermined position directly below each detection slit 74 in the beam position detection unit 70A and stopped.

  On the other hand, in the camera position detection unit 70B, as shown in FIG. 8, the detection mark 77A formed in a circular shape and the detection mark 77B formed in a cross shape are patterned in the X direction by patterning with a metal film such as chrome plating. Are arranged alternately at predetermined intervals.

  As shown in FIGS. 11A to 11D, the width dimension of the detection mark 77A: MA and the width dimension of the detection mark 77B: MB are equal (MA = MB), and the detection marks 77A, 77B are equal to each other. Is set to a value obtained by subtracting ½ of the width dimension of the detection marks 77A and 77B from the length dimension L in the X direction of the field of view (imaging field of view) V of the CCD camera 26. (P1 = L− (MA / 2) = L− (MB / 2)). Further, here, the movement unit U1 in the X direction of the CCD camera 26 is set to ½ of the width dimension of the detection marks 77A and 77B (U1 = MA / 2 = MB / 2).

  Next, a schematic configuration of the control electric system in the controller 28 provided in the exposure apparatus 10 of the present embodiment will be described with reference to the block diagram of FIG.

  In the electrical system for control in the controller 28, the CPU 80 as the above-mentioned data processing unit, which is a main control unit that controls the respective units of the apparatus through the bus 78, and the controller 28 for inputting an instruction by the operator. Instruction input means 82 having mounted switches, a memory 84 for temporarily storing image data and the like, a memory 85 for storing calibration data described later, and each micromirror 46 in each DMD 36. A DMD controller 86 as a mirror drive control unit to be controlled, a camera movement controller 88 for driving and controlling a drive source (stepping motor or the like) for moving each CCD camera 26, and a stage 14 on which the photosensitive material 12 is placed. A negative pressure supply source for generating a negative pressure in the groove on the upper surface, and the stage 14 in the scanning direction A stage driving controller 90 that controls the driving of the driving device and the like, and an exposure processing control controller 92 that controls various devices such as the illumination device 38 required when the exposure apparatus 10 performs the exposure processing. Are connected and configured.

  When performing the exposure process with this control electric system, the operator operates the instruction input means 82 of the controller 28 to input an instruction such as image data to be subjected to the exposure process, for example. Then, the CPU 80 to which the image data has been transmitted temporarily stores the image data in the memory 84, and controls the DMD controller 86 to perform an image forming process based on the image data read from the memory 84 in response to an exposure process start command. In addition, the stage driving controller 90 and the exposure processing control controller 92 control the driving device, the illumination device 38, and the like to perform the exposure processing.

  Next, the beam position irradiated from each exposure head 30 of the scanner 24 provided in the exposure apparatus 10 is detected, and one specific pixel Z1 of the DMD 36 is turned on (when one specific pixel is turned on). A procedure for specifying the actual position will be described. Note that this method, which is performed by specifying the actual position where the specific pixel Z1 is lit and detecting the amount of light of the lit specific pixel Z1, confirms the appropriate state of the specific pixel Z1, confirms the initial conditions, etc. Can also be used.

  First, when the operator operates the instruction input means 82 of the controller 28 to input an instruction for specifying an actual position where one specific pixel Z1 is lit, the CPU 80 that has received this instruction moves the stage 14. Then, the predetermined detection slit 74 for the predetermined exposure head 30 of the reference plate 70 is positioned below the scanner 24.

  Next, the CPU 80 outputs a control signal to the DMD controller 86 and the exposure processing control controller 92 to control only a specific pixel Z1 in the predetermined DMD 36 to be in a lighting state. Further, the CPU 80 outputs a control signal to the stage drive controller 90 to control the movement of the stage 14, and as shown by a solid line in FIG. 9A, the detection slit 74 has a predetermined position (for example, the origin) on the exposure area 32. Move to the position that should be. At this time, the CPU 80 recognizes the intersection of the first slit portion 74 a and the second slit portion 74 b as (X0, Y0) and stores it in the memory 84. In FIG. 9A, the direction rotating counterclockwise from the Y axis is a positive angle.

  Next, as shown in FIG. 9A, the CPU 80 outputs a control signal to the stage drive controller 90 to control the movement of the stage 14, thereby moving the detection slit 74 along the Y axis in FIG. Start moving to the right in A). Then, the CPU 80 detects that the light from the lit specific pixel Z1 is the first slit as illustrated in FIG. 9B at the position where the detection slit 74 is indicated by the imaginary line on the right side of the predetermined position. When it is detected that the light has been detected by the photosensor 72 through the section 74a, a control signal is output to the stage driving controller 90 to stop the stage 14. The CPU 80 recognizes the intersection of the first slit portion 74a and the second slit portion 74b at this time as (X0, Y11) and stores it in the memory 84.

  Next, the CPU 80 outputs a control signal to the stage driving controller 90 to move the stage 14, and starts to move the detection slit 74 to the left in FIG. 9A along the Y axis. Then, the CPU 80 detects that the light from the lit specific pixel Z1 is the second slit, as illustrated in FIG. 9B, at the position where the detection slit 74 is indicated by the left imaginary line of the predetermined position. When it is detected by the photosensor 72 that has passed through the part 74b, a control signal is output to the stage drive controller 90 to stop the stage 14. The CPU 80 recognizes the intersection of the first slit portion 74a and the second slit portion 74b at this time as (X0, Y12) and stores it in the memory 84.

  Next, the CPU 80 reads the coordinates (X0, Y11) and (X0, Y12) stored in the memory 84 to obtain the coordinates of the specific pixel Z1, and specifies the actual position. Here, if the coordinates of the specific pixel Z1 are (X1, Y1), X1 = X0 + (Y11−Y12) / 2 and Y1 = (Y11 + Y12) / 2.

  As described above, when the detection slit 74 having the second slit portion 74b intersecting with the first slit portion 74a and the photosensor 72 are used in combination, the photosensor 72 is connected to the first slit portion 74a or Only a predetermined range of light passing through the second slit portion 74b is detected. Therefore, the photo sensor 72 can use a commercially available inexpensive one without having a fine and special configuration for detecting the light amount in a narrow range corresponding to the first slit portion 74a or the second slit portion 74b.

  Next, an exposure operation for the photosensitive material 12 by the exposure apparatus 10 configured as described above will be described.

  First, when image data corresponding to the exposure pattern is input to the controller 28, it is temporarily stored in the memory 84 in the controller 28. This image data is data representing the density of each pixel constituting the image by binary values (whether or not dots are recorded).

  Next, the photosensitive material 12 is set on the stage 14, and the operator performs an input operation for starting exposure from the instruction input means 82 of the controller 28. The photosensitive material 12 for image exposure by the exposure apparatus 10 is a photosensitive epoxy resin or the like on the surface of a substrate or a glass plate as a material for forming a pattern (image exposure) such as a printed wiring board or a liquid crystal display element. In the case of a dry film, a laminate or the like is applied.

  When the exposure operation of the exposure apparatus 10 is started by the above input operation, the drive device is controlled by the controller 28, and the stage 14 that has adsorbed the photosensitive material 12 to the upper surface moves along the guide 20 in the movement direction (arrow Y direction). The movement starts at a constant speed from the upstream side to the downstream side in the alignment measurement direction. Each CCD camera 26 is controlled and operated by the controller 28 in synchronization with the start of the movement of the stage or at a timing just before the leading edge of the photosensitive material 12 reaches just below each CCD camera 26.

  When the photosensitive material 12 passes below the CCD camera 26 as the stage 14 moves, alignment measurement by the CCD camera 26 is performed.

  In this alignment measurement, first, when the two alignment marks 13 provided near the corner on the downstream side (front end side) of the photosensitive material 12 in the movement direction reach directly below each CCD camera 26 (on the optical axis of the lens). Each CCD camera 26 images the alignment mark 13 at a predetermined timing, and the image data including the image data including the reference position data in which the reference of the exposure position is indicated by the alignment mark 13 is obtained by the controller 28. It outputs to CPU80 which is a data processing part. After the alignment mark 13 is photographed, the stage 14 resumes moving downstream.

  When a plurality of alignment marks 13 are provided along the movement direction (scanning direction) as in the photosensitive material 12 of this embodiment, the next alignment mark 13 (upstream side (rear end side) in the movement direction is used. When the two alignment marks 13) provided in the vicinity of the corners of () reach directly below each CCD camera 26, each CCD camera 26 similarly shoots the alignment mark 13 at a predetermined timing and takes the image data. Output to the CPU 80 of the controller 28.

  Similarly, when the photosensitive material is provided with three or more alignment marks along the moving direction, each time the alignment marks pass below the CCD camera 26, the CCD camera 26 uses a predetermined timing. The imaging of the alignment mark is repeatedly performed, and the captured image data is output to the CPU 80 of the controller 28 for all the alignment marks.

  The CPU 80 determines the mark position and pitch between marks in the image determined from the input image data (reference position data) of each alignment mark 13, the position of the stage 14 when the alignment mark 13 is photographed, and the CCD camera 26. From this position, the deviation of the mounting position of the photosensitive material 12 on the stage 14, the deviation of the inclination of the photosensitive material 12 with respect to the moving direction, the dimensional accuracy error of the photosensitive material 12, etc. are ascertained by arithmetic processing. The appropriate exposure position for the exposed surface is calculated. Then, at the time of image exposure by the scanner 24, which will be described later, correction control (alignment) is performed in which a control signal generated based on the image data of the exposure pattern stored in the memory 84 is adjusted to the appropriate exposure position to perform image exposure. To do.

  When the photosensitive material 12 passes under the CCD camera 26, the alignment measurement by the CCD camera 26 is completed, and then the stage 14 is driven in the reverse direction by the driving device and moves along the guide 20 in the exposure direction. Then, the photosensitive material 12 moves below the scanner 24 to the downstream side in the exposure direction as the stage 14 moves, and when the image exposure area on the exposed surface reaches the exposure start position, each exposure head 30 of the scanner 24 emits a light beam. And image exposure on the exposed surface of the photosensitive material 12 is started.

  Here, the image data stored in the memory 84 of the controller 28 is sequentially read out for each of a plurality of lines, and a control signal is generated for each exposure head 30 based on the image data read out by the CPU 80 as a data processing unit. Is done. This control signal is subjected to the correction of the exposure position deviation with respect to the photosensitive material 12 subjected to the alignment measurement by the above-described correction control (alignment). Then, the DMD controller 86 as a mirror drive control unit performs on / off control of each micro mirror 46 of the DMD 36 for each exposure head 30 based on the generated and corrected control signals.

  When the laser light emitted from the optical fiber 40 of the illumination device 38 is applied to the DMD 36, the laser light reflected when the micromirrors of the DMD 36 are in the on state passes through the corresponding microlenses 60 of the microlens array 54. An image is formed on the exposed surface of the photosensitive material 12 by the lens system including the lens system. In this manner, the laser light emitted from the illumination device 38 is turned on / off for each pixel, and the photosensitive material 12 is exposed in a pixel unit (exposure area) that is approximately the same number as the number of used pixels of the DMD 36.

  Further, when the photosensitive material 12 is moved at a constant speed together with the stage 14, the photosensitive material 12 is scanned in the direction opposite to the stage moving direction by the scanner 24, and a strip-shaped exposed region 34 (see FIG. 2).

  When the image exposure of the photosensitive material 12 by the scanner 24 is completed, the stage 14 is directly driven to the downstream side in the exposure direction by the driving device and returns to the origin on the most downstream side in the exposure direction (the most upstream side in the alignment measurement direction). . Thus, the exposure operation for the photosensitive material 12 by the exposure apparatus 10 is completed.

  Next, a calibration method for the alignment function (exposure alignment function) in the exposure apparatus 10 of the present embodiment will be described.

  In the exposure apparatus 10 of the present embodiment having the above-described alignment function, as described above, the CCD camera 26 undergoes posture changes (rolling, pitching, and yawing) as it moves, and is placed in a shooting position in a state where it is placed at the shooting position. As a result, the center of the optical axis may deviate from the normal position. Therefore, even if the exposure position is corrected using the alignment function and image exposure is performed, the exposure position deviates from the proper position and exceeds the allowable range. There is a case.

  In order to calibrate the alignment function whose accuracy is affected by the cause of the optical axis deviation due to the change in the attitude of the CCD camera 26, the alignment function is calibrated by the calibration method described below at the time of manufacturing the exposure apparatus 10 or during maintenance. carry out.

  As a procedure of this calibration work, the CCD camera 26 is first calibrated, then the positional relationship between the exposure reference and the camera optical axis center is acquired, and the acquired information is reflected in the exposure position alignment by the exposure head 30. Although it is performed in accordance with the procedure, this calibration operation can be performed in advance separately from the exposure procedure for the photosensitive material 12, or can be performed simultaneously with the exposure of the photosensitive material 12. Further, the calibration of the CCD camera 26 and the acquisition of the positional relationship between the exposure reference and the center of the optical axis of the camera can be performed continuously or individually. Here, the case where they are performed continuously will be described.

  Regarding the calibration of the CCD camera 26, first, in step 150 shown in FIG. 12, the operator inputs the position data of the alignment mark 13 of the photosensitive material 12 to be exposed to the controller 28. By inputting this position data, the coordinates of the alignment mark 13 are acquired.

  Subsequently, when the operator performs a calibration start input operation from the instruction input means 82 of the controller 28, the calibration operation of the exposure apparatus 10 is started. In step 152, the camera movement controller 88 of the controller 28 receives the above input. The drive source of each CCD camera 26 is controlled based on the position data, and each CCD camera 26 is moved to a predetermined photographing position where the alignment mark 13 of the photosensitive material 12 is photographed. At this time, the position of each CCD camera 26 is controlled by the controller 28 by counting the pulses of each drive source (stepping motor), and is sent in the above-mentioned step of moving unit (U1).

  When each CCD camera 26 is arranged at the photographing position of the alignment mark 13, the stage 14 moves from the upstream side to the downstream side in the alignment measurement direction along the guide 20 in step 154, and the camera position detection unit of the reference plate 70. 70B is moved to a position where it is arranged below each CCD camera 26 (within the visual field).

  When the camera position detection unit 70B of the reference plate 70 is disposed within the field of view of each CCD camera 26, each CCD camera 26 is controlled by the controller 28 to photograph the camera position detection unit 70B. At this time, each CCD camera 26 photographs at least one of the plurality of detection marks 77A and 77B arranged in the camera position detector 70B.

  Next, in step 156, the controller 28 measures the amount of displacement of the detected detection marks 77A and 77B from the center of the visual field (center of the optical axis) by image processing or the like. Here, whether the photographed detection mark is the detection mark 77A or the detection mark 77B is switched using image processing such as pattern matching.

  Here, which of the plurality of detection marks 77A and 77B that have been photographed is specified by the above pulse, and the absolute position data of the detection marks 77A and 77B. Is measured in advance by another measuring means and stored in the controller 28. The difference between this absolute position data and the above measurement result (measurement value) is calculated, and the light from the reference plate 70 and each CCD camera 26 is calculated. Acquires positional deviation data from the axis center. From the measurement and calculation results, calibration data for correcting the optical axis center shift amount of each CCD camera 26 at the position where the alignment mark 13 is photographed (alignment measurement position) is obtained. It is stored in the memory 85 (see FIG. 7). Then, the calibration operation of the CCD camera 26 is finished, and then the operation proceeds to an operation for obtaining the positional relationship between the exposure reference and the center of the camera optical axis.

  When this operation starts, the controller 28 is controlled by the controller 28 in step 160 shown in FIG. 13, and the stage 14 moves the beam position detection unit 70A of the reference plate 70 to the irradiation position (exposure position) of the laser beam by the exposure head 30. Moving. Next, in step 162, a laser beam is irradiated from the exposure head 30 toward the beam position detection unit 70A of the reference plate 70, and the position of the exposure reference point is measured by the beam position detection operation described above.

  Here, the beam position detection unit 70A and the camera position detection unit 70B are provided on the same reference plate 70, and their positional relationship is measured in advance by another measurement means. Thereby, the positional relationship between the exposure reference and the detection marks 77A and 77B photographed by the above-described camera calibration operation is determined. Therefore, by calculating the exposure reference data measured by this operation and the positional deviation data (calibration data) between the optical axis center of the CCD camera 26 acquired by the camera calibration operation, the exposure reference and the camera optical axis center are calculated. Exposure reference-camera optical axis center position data (correction data) indicating the positional relationship is obtained, and this data is stored in the memory 85 of the controller 28. Then, the operation for obtaining the positional relationship between the exposure reference and the camera optical axis center is terminated, and the calibration operation is terminated.

  When the exposure apparatus 10 is calibrated by the calibration method of the above alignment function (exposure position alignment function) and the photosensitive material 12 is image-exposed with the calibrated exposure apparatus 10, the CPU 80 reads the exposure reference from the memory 85. -The camera optical axis center position data is read, and a control signal (exposure data) generated based on the image data of the exposure pattern stored in the memory 84 is calculated using the exposure reference-camera optical axis center position data. By doing so, the calibration data is reflected in the exposure data. Further, as described above, correction control (alignment) is performed to reflect the correction data of the exposure position obtained by measuring the alignment of the photosensitive material 12 as described above, and image exposure is performed in accordance with the appropriate exposure position. .

  As described above, in the calibration method of the alignment function (exposure position alignment function) of the present embodiment, the CCD camera 26 photographs the alignment mark 13 of the photosensitive material 12 (alignment measurement) in order to calibrate the alignment function of the exposure apparatus 10. ), A plurality of detection marks 77A and 77B arranged at predetermined intervals along the moving direction (X direction) of the CCD camera 26 at positions (in the field of view) where the image can be taken by the CCD camera 26. A CCD camera 26 in which a camera position detection unit 70B of the reference plate 70 provided is arranged and at least one of the plurality of detection marks 77A and 77B is arranged at a position for reading the alignment mark 13 provided on the photosensitive material 12. Based on the optical axis positional deviation data (position data of the CCD camera 26) acquired by the imaging. Calibration data is calculated, and in the exposure of the photosensitive material 12, the calibration data is reflected in the reference position data, alignment is performed, and image exposure is performed by adjusting to the appropriate exposure position. Calibration of the alignment function whose accuracy is influenced by the posture change factor accompanying the movement is possible, and the correction accuracy of the exposure position deviation with respect to the photosensitive material 12 can be improved.

  In the present embodiment, the camera position detection unit 70B is integrally provided on the reference plate 70 (beam position detection unit 70A) provided with the detection slit 74 for detecting the exposure position by the laser beam, so that they are separated from each other. Compared to the case, the relative position between the detection slit 74 and the detection marks 77A and 77B can be measured with high accuracy, and a positional deviation or the like occurs between the detection slit 74 and the detection marks 77A and 77B. It becomes difficult. Thus, the exposure position data of the laser beam detected by the beam position detector 70A (and the photosensor 72) of the reference plate 70 and the camera position detector 70B provided integrally with the reference plate 70 are acquired. If the correction data is obtained by calculating the calibration data, the error is suppressed, and the alignment performed by reflecting the correction data can be performed with higher accuracy.

  At this time, the effect of the present invention is further exhibited by using a plurality of CCD cameras 26. That is, when a plurality of CCD cameras 26 are used for shortening the reading time, the mutual positional relationship between the plurality of CCD cameras 26 is likely to be shifted, so that the calibration effect is increased.

  Further, the optical axis shift of the CCD camera 26 can be detected in the Y direction (FIG. 1), and this may be calibrated.

  Further, exposure can be performed as follows as an application example of the present embodiment using the exposure apparatus of the present embodiment.

  This will be described with reference to the flowchart of FIG. 14 and the configuration diagram of FIG. The detection marks 77A and 77B are read at the position of the CCD camera 26 that has read the alignment mark 13 before or after the CCD camera 26 reads the alignment mark 13 by the above-described operation (step 174). As described above, the absolute position data of the detection marks 77A and 77B is measured in advance by another measuring means and stored in the controller 28. The position data of the alignment mark 13 read by the CCD camera 26 is used as the detection marks 77A and 77B. Obtained as position data based on the absolute position data (step 176).

  Next, according to the procedure from Step 160 to Step 164 in FIG. 13 described above, the beam position on the exposure surface when a specific pixel of the DMD 36 is lit is measured (Step 170), and the beam position data is acquired (Step 170). 172). This is position data relative to the beam position detector 70A of the exposure reference point.

  Here, the beam position detector 70A and the camera position detector 70B are provided on the same reference plate 70, and their relative positional relationship is measured in advance by another measuring means (step 178).

  Thereby, the beam position on the exposure surface of the exposure reference point with respect to the beam position detection unit 70A and the alignment mark position based on the camera position detection unit 70B can be acquired. That is, since the relative position between the beam position detector 70A and the camera position detector 70B is measured, the position data of the alignment mark 13 with reference to the beam position detector 70A can be obtained.

  At the stage of exposing the photosensitive material, the alignment mark 13 is read by the CCD camera 26 (step 182), and position data is acquired based on the read alignment mark 13 (step 184). The controller 28 calculates reference position data based on the detection marks 77A and 77B of the alignment mark 13 in the procedure of steps 174 and 176 (step 186). Further, the controller 28 detects the alignment mark 13 on the image data of the exposure image based on the beam position data of the exposure reference point for the beam position detection unit 70A and the position data of the alignment mark 13 for the beam position detection unit 70A. Each pixel of the DMD 36 is assigned to the image data so as to match the position of the alignment mark 13 with respect to 70A, and each pixel of the DMD 36 is modulated according to the image data to expose the exposure image (step 188).

  By performing exposure according to the application example of the present embodiment described above, the CCD camera 26 measures the position of the reading unit reference mark (detection mark 77) and the alignment mark 13 whose relative positional relationship is known with the beam position detection unit 70A. Thus, the positional relationship between the reference mark position and the exposure point position is known, and the drawn image is exposed based on these data, so that the drawn image can be exposed with high accuracy.

That is, the exposure position of the alignment mark 13 and the exposure reference point is obtained as relative positions with respect to the same scale (beam position detection unit 70A or camera position detection unit 70B), and the respective position data and exposure point of the alignment mark 13 are acquired. Since exposure is performed based on the reference position data, a drawn image can be exposed on the photosensitive material with high accuracy.

Although the exposure reference point has been described as one point, it is possible to expose the drawn image on the photosensitive material with higher accuracy by measuring the position using a plurality of pixels as the exposure reference point.

  In the present embodiment, a reference plate 70 including a camera position detection unit 70B is provided on the stage 14 on which the photosensitive material 12 is placed, and detection is performed by the CCD camera 26 in a state where the photosensitive material 12 is placed on the stage 14. Since the marks 77A and 77B are arranged so that they can be photographed, the alignment function can be calibrated even when the photosensitive material 12 is exposed by the exposure apparatus 10, and calibration work is facilitated.

  15 and 16 show a modification example in which one type of detection mark is provided on the camera position detection unit 70B of the reference plate 70 described above.

  In the camera position detection unit 70B shown in FIG. 15, a plurality of circular detection marks 77A are arrayed at predetermined intervals along the X direction. In this modification, the arrangement pitch P2 of the plurality of detection marks 77A and the movement unit U2 in the X direction of the CCD camera 26 are set to be the same (P2 = U2), and each detection mark is further set. 77A is arranged so as to be positioned at the center of the visual field (shooting visual field) V of the CCD camera 26.

  Also, in the camera position detection unit 70B shown in FIGS. 16A to 16D, only a plurality of circular detection marks 77A are arranged at predetermined intervals along the X direction. The arrangement pitch P3 of the detection marks 77A and the length dimension L in the X direction of the visual field V of the CCD camera 26 are set to be the same (P3 = L). Here, the unit of movement of the CCD camera 26 in the X direction: U3 is set to the width dimension of the detection mark 77A (U3 = MA).

  As described above, even when one type of detection mark is provided in the camera position detection unit 70B, by adopting the above setting, the CCD camera 26 can be moved in units of movement (U2 / U3). In this step, only one detection mark 77A out of a plurality of arrays can be photographed regardless of the position of the feed. In these modified examples, image processing such as pattern matching is performed in order to determine which of the two types of detection marks 77A and 77B is captured by the CCD camera 26, as in the above-described embodiment. Since it is not necessary to use it, processing related to the calibration operation can be simplified.

  FIG. 17 shows a method for measuring the angle between the reference plate and the exposure head.

  As shown in FIG. 17, each exposure head 30 can be turned on and off for each pixel.

  That is, a digital micromirror device (DMD) 36 is provided as a spatial light modulation element that modulates each incident light beam for each pixel in accordance with image data. When the laser light emitted from the exposure head 30 is irradiated onto the DMD 36, the laser light reflected when the micromirror of the DMD 36 is in an on state forms an image on the exposure surface of the photosensitive material 12 by the lens system. The laser light is turned on and off for each pixel, and the photosensitive material 12 is exposed in a pixel unit (exposure area) of approximately the same number as the number of used pixels of the DMD 36.

  As a means for detecting the exposure beam position, a reference plate 70 (beam position detector 70A) provided with a slit 74 for detecting the exposure position by the laser beam is provided, and at least two detections are performed for one exposure head 30. A slit 74 is provided.

  First, the pixels 1-a, 1-b, and 1-c are sequentially turned on in the head 1 shown in FIG. Among these, by obtaining the pixel positions (coordinates) on the head 1 of 1-a and 1-b aligned on the straight line in the scanning direction (Y direction), θhead (θhead_h1) which is the angle of the head 1 with respect to the scanning direction. Can be calculated.

  Further, by obtaining the pixel positions (coordinates) on the head 1 of the pixels 1-b and 1-c on the same row (on the head 1), θscale (θscale_h1) that is the angle of the reference plate 70 with respect to the head 1 is calculated. it can.

  Similarly, the head angle θhead_hn and the angle θscale_hn of the reference plate 70 are obtained by a plurality of exposure heads 30 (head 1 to head n), and the angle of the reference plate 70 is adjusted so that the average values thereof are equal. Adjust at 95.

  With the above adjustment, the reference plate 70 can be correctly aligned in the vertical direction with respect to the scanning direction (Y direction), so that the positions of the pixels in the plurality of exposure heads 30 and the alignment camera 26 can be measured with an accurate coordinate system. Thus, it is possible to realize exposure with accurate alignment correction of the exposure position.

  That is, since the angle between the head 1 and the scanning direction and the angle between the head 1 and the reference plate 70 can be detected, the angle between the scanning direction and the reference plate 70 can be detected and calibrated from these two.

  With the above configuration, the position of the reference plate 70 serving as a coordinate reference in the exposure apparatus 10 can be corrected with high accuracy by itself. As a result, when there is a change in diameter in the exposure apparatus 10, for example, when the scanning direction of the stage 14 changes or when the mounting angle of the reference plate 70 changes with respect to the scanning direction, the scanning direction is measured. Therefore, it is possible to calibrate only with the function in the apparatus, so that the reliability of the exposure apparatus 10 as a whole is improved.

  As mentioned above, although this invention was demonstrated in detail by embodiment mentioned above, this invention is not limited to it, Other various embodiment is possible within the scope of the present invention.

  For example, in the above-described embodiment, the case where the detection marks (calibration reference marks) are of two types, circular and cruciform, has been described, but the shapes of the detection marks are shapes other than circular and cruciform. In addition, it is possible to use three or more kinds of detection marks. Even in such a case, as described above, by defining the visual field and movement unit of the CCD camera 26 and the arrangement pitch of the detection marks under predetermined conditions, an equivalent function can be realized.

  In the exposure operation of the exposure apparatus 10 in the above-described embodiment, the case where the photosensitive material 12 is scanned and exposed while moving the stage 14 has been described. However, the exposure operation is not limited to such scanning exposure. In addition, the photosensitive material 12 that has been moved to the first exposure position is temporarily stopped to expose only a predetermined exposure region, and after that exposure, the photosensitive material 12 is moved to the next exposure position and then stopped again. It is also possible to repeat the movement of the photosensitive material 12, the stop at the exposure position, the image exposure, the movement, and so on.

  In the exposure apparatus 10 in the above embodiment, the exposure head provided with the DMD as the spatial modulation element has been described. In addition to such a reflective spatial light modulation element, a transmissive spatial light modulation element (LCD). Can also be used. For example, liquid crystal shutters such as MEMS (Micro Electro Mechanical Systems) type spatial light modulator (SLM), optical elements that modulate transmitted light by electro-optic effect (PLZT elements), and liquid crystal light shutters (FLC) It is also possible to use a spatial light modulation element other than the MEMS type, such as an array. Note that MEMS is a general term for a micro system that integrates micro-sized sensors, actuators, and control circuits based on a micro-machining technology based on an IC manufacturing process, and a MEMS type spatial light modulator is an electrostatic force. It means a spatial light modulation element driven by an electromechanical operation using Further, a plurality of grating light valves (GLVs) arranged in two dimensions can be used. In the configuration using these reflective spatial light modulator (GLV) and transmissive spatial light modulator (LCD), a lamp or the like can be used as a light source in addition to the laser described above.

  The light source in the above embodiment includes a fiber array light source including a plurality of combined laser light sources, and a single optical fiber that emits laser light incident from a single semiconductor laser having one light emitting point. A fiber array light source obtained by arraying fiber light sources provided with a light source (for example, an LD array, an organic EL array, etc.) in which a plurality of light emitting points are arranged in a two-dimensional manner can be applied.

  Further, the exposure apparatus 10 can use either a photon mode photosensitive material in which information is directly recorded by exposure or a heat mode photosensitive material in which information is recorded by heat generated by exposure. When using a photon mode photosensitive material, a GaN-based semiconductor laser, a wavelength conversion solid-state laser, or the like is used for the laser device. When using a heat mode photosensitive material, an AlGaAs-based semiconductor laser (infrared laser), A solid state laser is used.

1 is a perspective view showing an exposure apparatus according to an embodiment of the present invention. 1 is a perspective view illustrating a configuration of a scanner according to an embodiment of the present invention. It is a schematic block diagram which shows the optical system of the exposure head which concerns on one Embodiment of this invention. (A) is a principal part top view which shows the scanning locus | trajectory of the exposure beam by each micromirror in the exposure apparatus which concerns on the 1st Embodiment of this invention when DMD (digital micromirror device) is not inclined, (B) is. It is a principal part top view which shows the scanning trace of the exposure beam at the time of inclining DMD. FIG. 5 is a partially enlarged view showing a configuration of a DMD provided in an exposure apparatus according to an embodiment of the present invention. (A) And (B) is explanatory drawing for demonstrating operation | movement of DMD of FIG. It is a perspective view which shows the structure of the alignment unit which concerns on one Embodiment of this invention. It is a top view which shows the reference | standard board which concerns on one Embodiment of this invention. (A) is explanatory drawing which shows the state which detects the specific pixel and light wraparound pixel which are lit using the detection slit in the exposure apparatus which concerns on one Embodiment of this invention, (B) is lit. It is explanatory drawing which shows a signal when a photo sensor detects the specific pixel which is. It is a block diagram which shows schematic structure of the electric system for control in the controller provided in the exposure apparatus which concerns on one Embodiment of this invention. (A)-(D) is explanatory drawing which shows the relationship between the mark for a detection at the time of image | photographing the camera position detection part which concerns on one Embodiment of this invention with a CCD camera, and an imaging | photography visual field. It is a flowchart which shows the flow of the control content of camera calibration operation | movement performed with the exposure apparatus which concerns on one Embodiment of this invention. It is a flowchart which shows the flow of the control content of acquisition operation | movement of the positional relationship of an exposure reference | standard and camera optical axis center performed with the exposure apparatus which concerns on one Embodiment of this invention. It is a flowchart which shows the flow of the control content of the acquisition operation | movement of the positional relationship of the exposure reference | standard and camera calibration reference | standard performed with the exposure apparatus which concerns on one Embodiment of this invention. It is a top view which shows the modification of a camera position detection part. (A)-(D) is explanatory drawing which shows the relationship between the mark for a detection at the time of image | photographing the camera position detection part which concerns on another modification with a CCD camera, and an imaging | photography visual field. It is a figure which shows the angle | corner measuring method of the reference | standard board and exposure head which concerns on one Embodiment of this invention. It is a figure which shows the acquisition method of the positional relationship of the exposure reference | standard and camera calibration reference | standard performed with the exposure apparatus which concerns on one Embodiment of this invention.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Exposure apparatus 12 Photosensitive material 13 Alignment mark (reference mark)
14 Stage (moving means)
24 Scanner (exposure means)
26 CCD camera (reading means)
28 controller (control means)
30 exposure head (exposure means)
70 Reference plate (detection means / calibration member)
70A Beam position detector (detection means)
70B Camera position detector (calibration member)
74 Slit for detection (detection part)
77A Detection mark (calibration reference mark)
77B Detection mark (calibration reference mark)
85 memory (data storage means)
95 Angle adjustment device

Claims (14)

A photosensitive material provided with a reference mark serving as a reference for the exposure position is placed, and moving means for moving the photosensitive material in a direction along the scanning direction;
A reading unit that is movable in a direction crossing the scanning direction, and that reads the reference mark of the photosensitive material placed on the moving unit;
Exposure means for exposing the photosensitive material moved by the moving means with a light beam modulated in accordance with image data;
Control means for performing exposure operation by controlling exposure means by performing exposure position alignment with the light beam based on reference position data acquired by reading the reference mark by the reading means in exposure by the exposure means;
An exposure apparatus comprising:
The exposure apparatus further includes:
A reading unit position scale disposed on the reading can be positioned by the reading means the plurality of reading means reference marks provided with a plurality of reading means reference marks arranged along the moving direction of the reading means,
When reading the reference mark by the reading means, at least one of said plurality of reading means reference mark, read by the reading means disposed at a position for reading the reference mark, the reading unit acquired in the read Reading position data storage means for storing the position data;
Beam position detecting means comprising a detector for detecting an exposure position by the light beam;
And a predetermined light beam exposure point position information storage means for storing the exposure point position data obtained by detecting by the beam position detecting means exposing spot position of the output from the exposing unit,
Have
Wherein in the exposure of the photosensitive material, and the reference position data and the control unit is read from the reading position data storage means, reads out the exposure point position data from the exposure point position information storage means,
In the plane including the scanning direction and the direction perpendicular thereto , the image data is corrected by the reference position data and the exposure point position data from the distance and orientation of the beam position detection means with respect to the reading means reference mark. An exposure apparatus that performs exposure based on the exposure image data formed in this manner .   2. The exposure apparatus according to claim 1, wherein the beam position detecting means and the reading means position scale are provided integrally. A photosensitive material provided with a reference mark serving as a reference for the exposure position is placed, and moving means for moving the photosensitive material in a direction along the scanning direction;
A reading unit that is movable in a direction crossing the scanning direction, and that reads the reference mark of the photosensitive material placed on the moving unit;
Exposure means for exposing the photosensitive material moved by the moving means with a light beam modulated in accordance with image data;
Control means for performing exposure operation by performing exposure position alignment by the light beam based on reference position data acquired by reading the reference mark by the reading means and controlling the exposure means in exposure by the exposure means. An exposure apparatus,
The exposure apparatus further includes:
Said plurality read by the reading means calibration reference marks are placed on possible position reading position calibration member provided with a plurality of calibration reference marks arranged along the moving direction of the reading means,
At least one of the plurality of calibration reference mark, read by the reading means disposed at a position for reading the reference mark, the correction data calculated on the basis of the position data of the reading unit acquired in the read Calibration data storage means for storing;
Beam position detection means comprising a detection unit for detecting an exposure position by the light beam;
Anda exposure point position information storage means for storing the exposure point position data obtained by detecting the predetermined light beam said beam position detection means exposing spot position of the output from the exposing unit,
In exposure to the photosensitive material, the control means reads the calibration data from the calibration data storage means, and the reference position correction data in which the calibration data is reflected in the reference position data, and the exposure point position information storage It reads the exposure point position data from the means,
In the plane including the scanning direction and a direction perpendicular thereto , the image data is corrected by the reference position correction data and the exposure point position data from the distance and direction of the beam position detection means with respect to the reading means reference mark. An exposure apparatus that performs exposure based on the exposure image data formed in this manner .   4. The exposure apparatus according to claim 3, wherein the beam position detecting means and the reading position calibration member are integrally provided.   The beam position detection unit measures the exposure point position of the light beam at a plurality of measurement points that are not aligned in the scanning direction with respect to the exposure exposure unit, and from the exposure point positions measured at the plurality of measurement points, 5. The exposure apparatus according to claim 1, further comprising an angle detection unit that detects an angle of the beam position detection unit with respect to the scanning direction.   6. An image data correction unit that corrects image data exposed on an exposure surface based on an angle of the beam position detection unit detected by the angle detection unit with respect to a scanning direction. The exposure apparatus described in 1.   6. The apparatus according to claim 5, further comprising an angle adjusting unit that adjusts an angle of the beam position detecting unit with respect to the scanning direction based on an angle of the beam position detecting unit with respect to the scanning direction detected by the angle detecting unit. The exposure apparatus described. A photosensitive material provided with a reference mark serving as a reference for the exposure position is placed, and moving means for moving the photosensitive material in a direction along the scanning direction;
A reading unit that is movable in a direction intersecting the scanning direction, and that reads the reference mark of the photosensitive material placed on the moving unit;
An exposure unit that exposes the photosensitive material moved by the moving unit with a light beam modulated in accordance with image data after being read by the reading unit;
An exposure apparatus comprising: a control unit configured to perform exposure operation by performing exposure position alignment by the light beam based on reference position data acquired by reading by the reading unit and controlling the exposure unit in exposure by the exposure unit. And
The exposure apparatus further includes:
A plurality of calibration reference marks provided on the moving means and arranged at predetermined intervals along the moving direction of the reading means, and the plurality of calibration reference marks are arranged at positions where the reading means can read them. Calibration member,
At least one of the plurality of calibration reference marks is read by reading means arranged at a position where the reference marks are read, and calibration data calculated based on the position data of the reading means obtained by the reading is stored. Data storage means for
Have
In exposure to the photosensitive material, the control means reads the calibration data from the data storage means, reflects the calibration data in the reference position data, performs the exposure alignment, and controls the exposure means to perform exposure. An exposure apparatus that is operated. A photosensitive material provided with a reference mark serving as a reference for the exposure position is placed, and moving means for moving the photosensitive material in a direction along the scanning direction;
A reading unit that is movable in a direction crossing the scanning direction, and that reads the reference mark of the photosensitive material placed on the moving unit;
Exposure means for exposing the photosensitive material moved by the moving means with a light beam modulated in accordance with image data;
Control means for performing exposure operation by controlling exposure means by performing exposure position alignment with the light beam based on reference position data acquired by reading the reference mark by the reading means in exposure by the exposure means;
An exposure method using
The exposure method further includes:
A reading unit position scale disposed on the reading can be positioned by the reading means the plurality of reading means reference marks provided with a plurality of reading means reference marks arranged along the moving direction of the reading means,
When reading the reference mark by the reading means, at least one of said plurality of reading means reference mark, read by the reading means disposed at a position for reading the reference mark, the reading unit acquired in the read Reading position data storage means for storing the position data;
Using a beam position detecting means comprising a detector for detecting the exposure position by said light beam, the exposure point position which is obtained by detecting the exposure point position by the beam position detecting means of a predetermined light beam output from the exposure means Exposure point position information storage means for storing data;
Use
In exposure to the photosensitive material, the control means reads the reference position data read from the data storage means and the exposure point position data from the exposure point position information storage means,
In the plane including the scanning direction and a direction perpendicular thereto , the image data is corrected by the reference position correction data and the exposure point position data from the distance and direction of the beam position detection means with respect to the reading means reference mark. An exposure method for performing exposure based on image data for exposure formed in this way. A photosensitive material provided with a reference mark serving as a reference for the exposure position is placed, and moving means for moving the photosensitive material in a direction along the scanning direction;
A reading unit that is movable in a direction crossing the scanning direction, and that reads the reference mark of the photosensitive material placed on the moving unit;
Exposure means for exposing the photosensitive material moved by the moving means with a light beam modulated in accordance with image data;
Control means for performing exposure operation by controlling exposure means by performing exposure position alignment with the light beam based on reference position data acquired by reading the reference mark by the reading means in exposure by the exposure means;
An exposure method using
The exposure method further includes:
Said plurality read by the reading means calibration reference marks are placed on possible position reading position calibration member provided with a plurality of calibration reference marks arranged along the moving direction of the reading means,
At least one of the plurality of calibration reference mark, read by the reading means disposed at a position for reading the reference mark, the correction data calculated on the basis of the position data of the reading unit acquired in the read Calibration data storage means for storing;
Beam position detection means comprising a detection unit for detecting an exposure position by the light beam;
Using an exposure point position information storage means for storing the exposure point position data obtained by detecting the predetermined light beam said beam position detection means exposing spot position of the output from the exposing unit,
Wherein in the exposure to the photosensitive material, the control means reads the data for the calibration of the calibration data storing means, and the reference position correction data of the calibration data was reflected in the reference position data, the exposure point position information storage Read exposure point position data from the means,
In the plane including the scanning direction and a direction perpendicular thereto , the image data is corrected by the reference position correction data and the exposure point position data from the distance and direction of the beam position detection means with respect to the reading means reference mark. An exposure method for performing exposure based on image data for exposure formed in this way. The beam position detection unit measures the exposure point position of the light beam at a plurality of measurement points that are not aligned in the scanning direction with respect to the exposure exposure unit, and from the exposure point positions measured at the plurality of measurement points, Using an angle detection means for detecting the angle of the beam position detection means with respect to the scanning direction,
10. An image data correction unit that corrects image data exposed on an exposure surface based on an angle of the beam position detection unit detected by the angle detection unit with respect to a scanning direction. The exposure method according to claim 10. The beam position detection unit measures the exposure point position of the light beam at a plurality of measurement points that are not aligned in the scanning direction with respect to the exposure exposure unit, and from the exposure point positions measured at the plurality of measurement points, Using an angle detection means for detecting the angle of the beam position detection means with respect to the scanning direction,
10. An angle adjusting unit that adjusts an angle of the beam position detecting unit with respect to the scanning direction based on an angle of the beam position detecting unit with respect to the scanning direction detected by the angle detecting unit is used. Item 11. The exposure method according to any one of Items10. A photosensitive material provided with a reference mark serving as a reference for the exposure position is placed, and moving means for moving the photosensitive material in a direction along the scanning direction;
A reading unit that is movable in a direction intersecting the scanning direction, and that reads the reference mark of the photosensitive material placed on the moving unit;
An exposure unit that exposes the photosensitive material moved by the moving unit with a light beam modulated in accordance with image data after being read by the reading unit;
An exposure method using a control means for performing exposure operation by performing exposure position alignment by the light beam based on reference position data acquired by reading by the reading means and controlling the exposure means in exposure by the exposure means. There,
The exposure method further includes:
A plurality of calibration reference marks provided on the moving means and arranged at predetermined intervals along the moving direction of the reading means, and the plurality of calibration reference marks are arranged at positions where the reading means can read them. Calibration member,
At least one of the plurality of calibration reference marks is read by reading means arranged at a position where the reference marks are read, and calibration data calculated based on the position data of the reading means obtained by the reading is stored. Data storage means for
Use
In exposure to the photosensitive material, the control means reads the calibration data from the data storage means, reflects the calibration data in the reference position data, performs the exposure alignment, and controls the exposure means to perform exposure. An exposure method characterized by operating. An exposure position for the photosensitive material based on reference position data obtained by reading a reference mark serving as a reference for the exposure position provided on the photosensitive material by reading means that is movable in a direction crossing the scanning direction of the photosensitive material. A calibration method for calibrating the exposure alignment function of an exposure apparatus that performs exposure with a light beam modulated according to image data while moving the photosensitive material in the scanning direction by a moving unit,
Prior to reading the reference mark by the reading means,
A calibration member provided with a plurality of calibration reference marks arranged at a predetermined interval along the moving direction of the reading means is arranged at a position where the reading means can read.
Reading at least one of the plurality of calibration reference marks by reading means arranged at a position for reading the reference marks, calculating calibration data based on position data of the reading means obtained by the reading, An exposure apparatus calibration method characterized by calibrating an exposure alignment function of the exposure apparatus by reflecting the calibration data in the reference position data ,
The exposure apparatus includes a detection unit including a detection unit that detects an exposure position by the light beam, and the calibration member is provided integrally with the detection unit, and exposure position data of the light beam detected by the detection unit. And correcting the exposure position alignment function of the exposure apparatus by reflecting correction data obtained by calculating the calibration data in the reference position data .

Images