TW201514591A - Light source module, fabrication method therefor, and backlight unit including the same - Google Patents

Light source module, fabrication method therefor, and backlight unit including the same Download PDF

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TW201514591A
TW201514591A TW103133503A TW103133503A TW201514591A TW 201514591 A TW201514591 A TW 201514591A TW 103133503 A TW103133503 A TW 103133503A TW 103133503 A TW103133503 A TW 103133503A TW 201514591 A TW201514591 A TW 201514591A
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light
source module
light source
substrate
led wafer
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TWI533062B (en
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Ki-Bum Nam
Seoung-Ho Jung
Yu-Dae Han
Chung-Hoon Lee
Hyuck-Jung Choi
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Seoul Semiconductor Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements
    • H01L33/60Reflective elements
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21KNON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K9/00Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
    • F21K9/20Light sources comprising attachment means
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/1336Illuminating devices
    • G02F1/133615Edge-illuminating devices, i.e. illuminating from the side
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/50Wavelength conversion elements
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21YINDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2115/00Light-generating elements of semiconductor light sources
    • F21Y2115/10Light-emitting diodes [LED]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

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  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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  • Chemical & Material Sciences (AREA)
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  • Led Device Packages (AREA)

Abstract

A light source module, a fabrication method therefore, and a slim backlight unit including the same. The light source module includes a light emitting diode (LED) chip electrically connected to a substrate through a lower surface thereof, a wavelength conversion layer formed on the LED chip and enclosing at least the light exit face of the LED chip, and a reflector formed on a region of the LED chip excluding the light exit face.

Description

光源模組、其製造方法以及包含上述的背光單元 Light source module, manufacturing method thereof and backlight unit including the same 【相關申請案的交叉參考】[Cross-Reference to Related Applications]

本申請案主張2013年9月26日申請的韓國專利申請案第10-2013-0114736號以及2014年9月16日申請的韓國專利申請案第10-2014-0123053號的優先權及權益,所述申請案特此出於所有目的如同完全闡述於本文中一般以引用方式併入本文中。 The priority and interest of Korean Patent Application No. 10-2013-0114736, filed on Sep. 26, 2013, and Korean Patent Application No. 10-2014-0123053, filed on Sep. The application is hereby incorporated by reference in its entirety for all purposes as if it is fully incorporated herein.

本發明是關於光源模組、其製造方法以及包含所述光源模組的背光單元,且更特定言之,是關於具有優良發光效率的光源模組、其製造方法以及包含所述光源模組的纖薄背光單元。 The present invention relates to a light source module, a method of fabricating the same, and a backlight unit including the same, and more particularly to a light source module having excellent luminous efficiency, a method of manufacturing the same, and a method including the same. Slim backlight unit.

一般而言,背光單元廣泛用於將光提供至顯示元件,諸如,液晶顯示器(liquid crystal display,LCD)元件或表面發光元件。 In general, backlight units are widely used to provide light to display elements such as liquid crystal display (LCD) elements or surface light emitting elements.

提供至LCD元件的背光單元取決於發光元件的位置而主 要劃分為直射型以及邊射型。 The backlight unit provided to the LCD element is mainly depending on the position of the light emitting element It is divided into a direct type and an edge type.

直射型背光單元已主要與20英寸或20英寸以上的大螢幕LCD一起開發,且特徵在於,安置於擴散板之下的多個光源直接朝向LCD面板的前表面發射光。此等直射型背光單元由於具有比邊射型背光單元高的發光效率而主要用於需要高明度的大螢幕LCD元件。 Direct-type backlight units have been developed primarily with large screen LCDs of 20 inches or more, and are characterized in that a plurality of light sources disposed below the diffuser plate emit light directly toward the front surface of the LCD panel. These direct type backlight units are mainly used for large screen LCD elements requiring high brightness because they have higher luminous efficiency than edge type backlight units.

邊射型背光單元用於相對小型的LCD元件(諸如,膝上型電腦以及桌上型電腦的監視器),且具有優良的光均一性、長使用壽命,且由於纖薄而具有適用於LCD元件中的優點。 The edge-emitting type backlight unit is used for a relatively small LCD element such as a laptop computer and a monitor of a desktop computer, and has excellent light uniformity, long life, and is suitable for LCD due to slimness. Advantages in components.

圖1為典型發光二極體(light emitting diode,LED)封裝以及包含所述LED封裝的背光單元的剖視圖。參看圖1,在先前技術中,LED封裝10安裝於背光單元的側表面上。在此狀況下,由於對應於LED封裝的寬度的高度,背光單元的纖薄性受到限制。 1 is a cross-sectional view of a typical light emitting diode (LED) package and a backlight unit including the same. Referring to Fig. 1, in the prior art, an LED package 10 is mounted on a side surface of a backlight unit. In this case, the slimness of the backlight unit is limited due to the height corresponding to the width of the LED package.

當LED封裝具有減小的寬度以克服此限制時,電流散佈降低LED封裝的效率。因此,雖然如上所述由於LED封裝而在實現背光單元的纖薄性方面受到限制,但使用者仍需要較纖薄的背光單元。因此,需要包含新穎LED封裝的邊射型背光單元。 Current spreading reduces the efficiency of the LED package when the LED package has a reduced width to overcome this limitation. Therefore, although the thinning of the backlight unit is limited due to the LED package as described above, the user still needs a slimner backlight unit. Therefore, there is a need for an edge-emitting backlight unit that includes a novel LED package.

本發明旨在提供藉由與光導板並排安裝發光二極體(LED)晶片而實施的邊射型纖薄背光單元。 The present invention is directed to an edge-emitting thin backlight unit implemented by mounting a light emitting diode (LED) wafer side by side with a light guiding plate.

此外,本發明旨在提供光源模組、其製造方法以及包含 所述光源模組的背光單元,其中藉由在面向所述光導板的LED晶片的側表面上形成波長轉換層,接著在除所述LED晶片的所述側表面之外的所述LED晶片的區域上形成反射體,而使光出射路徑朝向所述光導板,藉此在所述LED晶片與所述光導板並排安裝時,提高所述LED晶片的發光效率。 Furthermore, the present invention is directed to providing a light source module, a method of manufacturing the same, and a backlight unit of the light source module, wherein a wavelength conversion layer is formed on a side surface of the LED wafer facing the light guide plate, and then the LED wafer is removed except for the side surface of the LED wafer A reflector is formed on the region, and the light exit path is directed toward the light guide plate, thereby improving the light-emitting efficiency of the LED wafer when the LED wafer is mounted side by side with the light guide plate.

此外,本發明旨在提供光源模組、其製造方法以及包含所述光源模組的背光單元,其中包含反射性材料的底填料形成於LED晶片與基板之間以防止自所述LED晶片產生的光經由除指定的光出射面之外的其他面發射且將光集中於光出射面上,藉此提高發光效率。 Furthermore, the present invention is directed to a light source module, a method of fabricating the same, and a backlight unit including the same, wherein an underfill comprising a reflective material is formed between the LED wafer and the substrate to prevent generation from the LED wafer. Light is emitted through other faces than the designated light exit face and concentrates the light on the light exit face, thereby improving luminous efficiency.

此外,本發明旨在提供光源模組、其製造方法以及包含所述光源模組的背光單元,其中底填料經形成以使得反射性材料未塗佈至光出射面上,藉此自光出射路徑移除障礙且減小LED晶片與光導板之間的距離以提高發光效率。 Furthermore, the present invention is directed to a light source module, a method of fabricating the same, and a backlight unit including the same, wherein the underfill is formed such that a reflective material is not applied to the light exit surface, thereby exiting the light exit path The barrier is removed and the distance between the LED wafer and the light guide plate is reduced to increase luminous efficiency.

根據本發明的一個態樣,一種光源模組包含:發光二極體(LED)晶片,經由其下表面而電連接至基板,且包含形成於其一個側表面上的光出射面,以使得所述LED晶片的光經由所述光出射面而發射;波長轉換層,形成於所述LED晶片上且封閉至少所述LED晶片的所述光出射面;以及反射體,形成於除所述光出射面之外的所述LED晶片的區域上。 According to an aspect of the present invention, a light source module includes: a light emitting diode (LED) wafer electrically connected to a substrate via a lower surface thereof, and including a light exit surface formed on one side surface thereof so that The light of the LED wafer is emitted via the light exit surface; a wavelength conversion layer is formed on the LED wafer and encloses at least the light exit surface of the LED wafer; and a reflector is formed in addition to the light exiting On the area of the LED chip outside the face.

所述光源模組可更包含介入於所述基板與所述LED晶片之間且包含反射性材料的底填料。 The light source module may further include an underfill interposed between the substrate and the LED wafer and comprising a reflective material.

所述反射性材料可包含選自由以下各者組成的群組的一種材料:TiO2、SiO2、ZrO2、PbCO3、PbO、Al2O3、ZnO、Sb2O3及其組合。 The reflective material may comprise a material selected from the group consisting of TiO 2 , SiO 2 , ZrO 2 , PbCO 3 , PbO, Al 2 O 3 , ZnO, Sb 2 O 3 , and combinations thereof.

所述底填料可包含螢光材料。 The underfill may comprise a phosphor material.

所述LED晶片可藉由覆晶接合或表面安裝技術(SMT)而安裝於所述基板上。 The LED wafer can be mounted on the substrate by flip chip bonding or surface mount technology (SMT).

所述LED晶片可包含:第一半導體層,以第一導電類型雜質摻雜;主動層,形成於所述第一半導體層之下;第二半導體層,以第二導電類型雜質摻雜且形成於所述主動層之下;第一電極,電連接至所述第一半導體層;第二電極,電連接至所述第二半導體層;第一電極襯墊,電連接至所述第一電極;以及第二電極襯墊,電連接至所述第二電極,其中所述LED晶片可經由所述第一電極襯墊以及所述第二電極襯墊而電連接至所述基板。 The LED chip may include: a first semiconductor layer doped with a first conductivity type impurity; an active layer formed under the first semiconductor layer; and a second semiconductor layer doped with a second conductivity type impurity and formed Under the active layer; a first electrode electrically connected to the first semiconductor layer; a second electrode electrically connected to the second semiconductor layer; and a first electrode pad electrically connected to the first electrode And a second electrode pad electrically connected to the second electrode, wherein the LED chip is electrically connectable to the substrate via the first electrode pad and the second electrode pad.

根據本發明的另一態樣,一種背光單元包含:光導板;以及光源模組,設置於所述光導板的至少一側上且發射光,其中所述光源模組包含:發光二極體(LED)晶片,經由其下表面而電連接至基板,且包含形成於其一個側表面上的光出射面,以使得所述LED晶片的光經由所述光出射面而發射;波長轉換層,形成於所述LED晶片上且封閉至少所述LED晶片的所述光出射面;以及反射體,形成於除所述光出射面之外的所述LED晶片的區域上。 According to another aspect of the present invention, a backlight unit includes: a light guide plate; and a light source module disposed on at least one side of the light guide plate and emitting light, wherein the light source module comprises: a light emitting diode ( An LED) wafer electrically connected to the substrate via a lower surface thereof and including a light exit surface formed on one side surface thereof such that light of the LED wafer is emitted via the light exit surface; a wavelength conversion layer is formed And affixing at least the light exit surface of the LED wafer; and a reflector formed on a region of the LED chip except the light exit surface.

所述光源模組可更包含介入於所述基板與所述LED晶片 之間且包含反射性材料的底填料。 The light source module may further include an intervention in the substrate and the LED chip An underfill comprising a reflective material.

所述底填料可包含螢光材料。 The underfill may comprise a phosphor material.

所述LED晶片可藉由覆晶接合或表面安裝技術(SMT)而安裝於所述基板上。 The LED wafer can be mounted on the substrate by flip chip bonding or surface mount technology (SMT).

根據本發明的另一態樣,一種製造光源模組的方法包含:製造發光二極體(LED)晶片,所述LED晶片包含形成於其一個側表面上的光出射面,以使得所述LED晶片的光經由所述光出射面而發射;在所述LED晶片上形成波長轉換層,以封閉至少所述LED晶片的所述光出射面;以及在除所述光出射面之外的所述LED晶片的區域上形成反射體。 According to another aspect of the present invention, a method of manufacturing a light source module includes: manufacturing a light emitting diode (LED) wafer including a light exit surface formed on one side surface thereof such that the LED Light of the wafer is emitted via the light exit surface; a wavelength conversion layer is formed on the LED wafer to enclose the light exit surface of at least the LED wafer; and the said light exit surface A reflector is formed on the area of the LED wafer.

形成所述反射體可包含:在所述LED晶片的上表面以及側表面上形成所述反射體;以及當所述反射體形成於所述光出射面上時,藉由自對應於所述光出射面的區域移除所述反射體而暴露所述波長轉換層。 Forming the reflector may include: forming the reflector on an upper surface and a side surface of the LED wafer; and when the reflector is formed on the light exit surface, by self-corresponding to the light The area of the exit face removes the reflector to expose the wavelength conversion layer.

暴露所述波長轉換層可包含藉由高速切割而自對應於所述光出射面的所述區域移除所述反射體。 Exposing the wavelength conversion layer can include removing the reflector from the region corresponding to the light exit face by high speed cutting.

所述方法可更包含在形成所述反射體之後在所述基板與所述LED晶片之間形成包含反射性材料的底填料。 The method can further include forming an underfill comprising a reflective material between the substrate and the LED wafer after forming the reflector.

形成所述底填料可包含:形成設置於所述基板上以鄰接所述LED晶片的所述光出射面的屏障;將所述底填料注入至所述基板與所述LED晶片之間的區域中;以及在形成所述底填料之後移除所述屏障。 Forming the underfill may include: forming a barrier disposed on the substrate to abut the light exit surface of the LED wafer; injecting the underfill into a region between the substrate and the LED wafer And removing the barrier after forming the underfill.

所述方法可更包含將所述LED晶片電連接至基板,其中所述LED晶片可藉由覆晶接合或表面安裝技術(SMT)而安裝於所述基板上。 The method can further include electrically connecting the LED wafer to a substrate, wherein the LED wafer can be mounted on the substrate by flip chip bonding or surface mount technology (SMT).

製造所述LED晶片可包含:形成以第一導電類型雜質摻雜的第一半導體層;在所述第一半導體層之下形成主動層;在所述主動層之下形成以第二導電類型雜質摻雜的第二半導體層;形成電連接至所述第一半導體層的第一電極;形成電連接至所述第二半導體層的第二電極;形成電連接至所述第一電極的第一襯墊;以及形成電連接至所述第二電極的第二襯墊。 Manufacturing the LED wafer may include: forming a first semiconductor layer doped with a first conductivity type impurity; forming an active layer under the first semiconductor layer; forming a second conductivity type impurity under the active layer a doped second semiconductor layer; forming a first electrode electrically connected to the first semiconductor layer; forming a second electrode electrically connected to the second semiconductor layer; forming a first electrode electrically connected to the first electrode a liner; and a second liner electrically connected to the second electrode.

根據本發明的實施例,LED晶片與光導板並排安裝,藉此提供邊射型纖薄背光單元。 According to an embodiment of the present invention, the LED chips are mounted side by side with the light guiding plate, thereby providing a side-emitting thin backlight unit.

此外,根據本發明的實施例,藉由在面向光導板的LED晶片的側表面上形成波長轉換層,接著在除所述LED晶片的所述側表面之外的所述LED晶片的區域上形成反射體,而使光出射路徑朝向所述光導板,藉此在所述LED晶片與所述光導板並排安裝時,提高所述LED晶片的發光效率。 Further, according to an embodiment of the present invention, a wavelength conversion layer is formed on a side surface of the LED wafer facing the light guide plate, and then formed on a region of the LED wafer other than the side surface of the LED wafer The reflector has a light exiting path toward the light guiding plate, thereby improving luminous efficiency of the LED wafer when the LED chip is mounted side by side with the light guiding plate.

此外,根據本發明的實施例,包含反射性材料的底填料形成於LED晶片與基板之間以防止自所述LED晶片產生的光經由除指定的光出射面之外的所述LED晶片的其他面發射且將光集中於光出射面上,藉此提高發光效率。 Further, in accordance with an embodiment of the present invention, an underfill comprising a reflective material is formed between the LED wafer and the substrate to prevent light generated from the LED wafer from passing through the LED wafer other than the designated light exit surface. The surface emits and concentrates the light on the light exit surface, thereby improving the luminous efficiency.

此外,根據本發明的實施例,底填料經形成以使得反射性材料未塗佈至光出射面上,藉此自光出射路徑移除障礙且減小 LED晶片與光導板之間的距離以提高發光效率。 Further, according to an embodiment of the present invention, the underfill is formed such that the reflective material is not applied to the light exit surface, thereby removing the obstacle from the light exit path and reducing The distance between the LED wafer and the light guide plate to improve luminous efficiency.

10‧‧‧LED封裝 10‧‧‧LED package

23‧‧‧第一半導體層 23‧‧‧First semiconductor layer

25‧‧‧主動層 25‧‧‧ active layer

27‧‧‧第二半導體層 27‧‧‧Second semiconductor layer

28‧‧‧反射性層 28‧‧‧reflective layer

29‧‧‧阻障層 29‧‧‧Barrier layer

30‧‧‧反射性電極 30‧‧‧Reflective electrode

31‧‧‧下方絕緣層 31‧‧‧Under insulation

33‧‧‧電流散佈層 33‧‧‧current distribution layer

35‧‧‧上方絕緣層 35‧‧‧Upper insulation

37a‧‧‧第一電極襯墊 37a‧‧‧First electrode pad

37b‧‧‧第二電極襯墊 37b‧‧‧Second electrode pad

100‧‧‧光源模組 100‧‧‧Light source module

110‧‧‧LED晶片 110‧‧‧LED chip

111‧‧‧基板 111‧‧‧Substrate

113‧‧‧半導體堆疊 113‧‧‧Semiconductor stacking

120‧‧‧波長轉換層 120‧‧‧wavelength conversion layer

130‧‧‧反射體 130‧‧‧ reflector

140‧‧‧基板 140‧‧‧Substrate

141a‧‧‧基板襯墊 141a‧‧‧Substrate liner

141b‧‧‧基板襯墊 141b‧‧‧Substrate liner

150a‧‧‧凸塊 150a‧‧‧bump

150b‧‧‧凸塊 150b‧‧‧bump

170‧‧‧屏障 170‧‧‧ barrier

200‧‧‧底填料 200‧‧‧ bottom filler

230‧‧‧光學薄片 230‧‧‧ optical sheets

240‧‧‧框架 240‧‧‧Frame

250‧‧‧光導板 250‧‧‧Light guide

260‧‧‧反射性薄片 260‧‧‧Reflective flakes

270‧‧‧下蓋 270‧‧‧Under the cover

280‧‧‧頂蓋 280‧‧‧ top cover

BLU‧‧‧背光單元 BLU‧‧‧Backlight unit

DP‧‧‧顯示面板 DP‧‧‧ display panel

EA‧‧‧光出射面 EA‧‧‧ light exit surface

FS‧‧‧彩色濾光片基板 FS‧‧‧Color Filter Substrate

M‧‧‧台面 M‧‧‧ countertop

SS‧‧‧薄膜電晶體基板 SS‧‧‧thin film transistor substrate

結合附圖,自以下實施例的詳細描述,本發明的上述及其他態樣、特徵以及優點將變得顯而易見。 The above and other aspects, features, and advantages of the present invention will become apparent from the Detailed Description of the Drawing.

圖1為先前技術中的發光二極體封裝以及包含所述發光二極體封裝的背光單元的剖視圖。 1 is a cross-sectional view of a prior art light emitting diode package and a backlight unit including the light emitting diode package.

圖2至圖5為根據本發明的實施例的光源模組的剖視圖。 2 through 5 are cross-sectional views of a light source module in accordance with an embodiment of the present invention.

圖6(a)為圖2至圖5所示的LED晶片的平面圖。 Fig. 6(a) is a plan view of the LED chip shown in Figs. 2 to 5.

圖6(b)為沿著圖6(a)所示的線I-I'截取的LED晶片的剖視圖。 Fig. 6(b) is a cross-sectional view of the LED wafer taken along line II' shown in Fig. 6(a).

圖7為根據本發明的一個實施例的包含背光單元的顯示元件的分解透視圖。 Figure 7 is an exploded perspective view of a display element including a backlight unit, in accordance with one embodiment of the present invention.

圖8為沿著圖7所示的線II-II'截取的顯示元件的剖視圖。 Figure 8 is a cross-sectional view of the display element taken along line II-II' shown in Figure 7.

圖9至圖11展示根據本發明的一個實施例的光源模組的製造程序。 9 through 11 show a manufacturing procedure of a light source module in accordance with one embodiment of the present invention.

在下文中,將參看附圖來詳細描述本發明的例示性實施例。以舉例方式提供以下實施例以便將本發明的精神全面地傳達給熟習此項技術者。因此,本發明不限於本文中所揭露的實施例且亦可按照不同形式實施。此外,可在圖式中誇示部件的形狀。在本說明書全文中,類似參考數字表示具有相同或相似功能的類 似部件。落入本文的精神及範疇內的部件的修改不包含限制性含義,是為了清楚表示本發明的精神而提供,且可僅受隨附申請專利範圍限制。 Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. The following examples are provided by way of example in order to fully convey the spirit of the invention to those skilled in the art. Therefore, the invention is not limited to the embodiments disclosed herein and may be embodied in various forms. In addition, the shape of the components can be exaggerated in the drawings. Throughout the specification, like reference numerals indicate classes that have the same or similar functions. Like a component. The modifications of the components within the spirit and scope of the present invention are not intended to be limiting, and are provided for the purpose of clarity of the present invention and may be limited only by the scope of the accompanying claims.

下文中,將參看附圖來具體描述本發明的實施例,以使得熟習本發明所屬技術者可容易進行本發明。 Hereinafter, the embodiments of the present invention will be specifically described with reference to the drawings, so that the present invention can be easily carried out by those skilled in the art.

圖2至圖5為根據本發明的例示性實施例的光源模組的剖視圖。參看圖2至圖5,根據本發明的一個例示性實施例的光源模組100包含發光二極體(LED)晶片110、波長轉換層120以及反射體130。 2 through 5 are cross-sectional views of a light source module in accordance with an exemplary embodiment of the present invention. Referring to FIGS. 2 through 5, a light source module 100 according to an exemplary embodiment of the present invention includes a light emitting diode (LED) wafer 110, a wavelength conversion layer 120, and a reflector 130.

LED晶片110包含生長基板111以及半導體堆疊113。LED晶片110可藉由直接覆晶接合或表面安裝技術(SMT)而電連接至基板140。暴露於LED晶片110的下表面上的電極襯墊37a、37b分別經由凸塊150a、150b而電連接至基板襯墊141a、141b。因為光源模組100不使用導線,所以不需要模組組件來保護導線,且不需要移除波長轉換層120的部分來暴露接合襯墊。因此,相比使用接合導線的LED晶片,覆晶型LED晶片110展現較小的顏色偏差以及明度不均一性。此亦使得有可能簡化模組製造程序。 The LED wafer 110 includes a growth substrate 111 and a semiconductor stack 113. The LED wafer 110 can be electrically connected to the substrate 140 by direct flip-chip bonding or surface mount technology (SMT). The electrode pads 37a, 37b exposed on the lower surface of the LED wafer 110 are electrically connected to the substrate pads 141a, 141b via the bumps 150a, 150b, respectively. Because the light source module 100 does not use wires, no module assembly is needed to protect the wires, and portions of the wavelength conversion layer 120 need not be removed to expose the bond pads. Therefore, the flip chip type LED wafer 110 exhibits less color deviation and brightness unevenness than the LED wafer using the bonding wires. This also makes it possible to simplify the module manufacturing process.

波長轉換層120覆蓋LED晶片110。LED晶片110包含藉以發射光的側表面,即,光出射面EA。波長轉換層120可封閉至少光出射面EA且亦可封閉LED晶片110的上表面以及側表面。亦即,波長轉換層可僅形成於LED晶片110的光出射面EA 上,或LED晶片110的光出射面EA、上表面以及一些側表面上。或者,波長轉換層亦可形成於LED晶片110的上表面以及所有側表面(包含光出射面EA)上。此外,波長轉換層120可由能夠轉換自LED晶片110發射的光的波長的螢光材料形成。波長轉換層120可塗佈至LED晶片110上達預定厚度,以覆蓋LED晶片110的上表面以及側表面。當波長轉換層120覆蓋LED晶片的上表面以及側表面時,覆蓋上表面的區域的厚度可與覆蓋側表面的區域的厚度相同或不同。此外,覆蓋光出射面EA的區域可具有與覆蓋上表面以及除光出射面EA之外的側表面的區域的厚度不同的厚度。 The wavelength conversion layer 120 covers the LED wafer 110. The LED wafer 110 includes a side surface through which light is emitted, that is, a light exit surface EA. The wavelength conversion layer 120 may enclose at least the light exit surface EA and may also close the upper surface and the side surface of the LED wafer 110. That is, the wavelength conversion layer may be formed only on the light exit surface EA of the LED wafer 110. Upper, or the light exit surface EA of the LED wafer 110, the upper surface, and some side surfaces. Alternatively, a wavelength conversion layer may be formed on the upper surface of the LED wafer 110 and on all side surfaces (including the light exit surface EA). Further, the wavelength conversion layer 120 may be formed of a fluorescent material capable of converting the wavelength of light emitted from the LED wafer 110. The wavelength conversion layer 120 may be coated onto the LED wafer 110 to a predetermined thickness to cover the upper surface and the side surface of the LED wafer 110. When the wavelength conversion layer 120 covers the upper surface and the side surface of the LED wafer, the thickness of the region covering the upper surface may be the same as or different from the thickness of the region covering the side surface. Further, the region covering the light exit surface EA may have a thickness different from the thickness of the region covering the upper surface and the side surface other than the light exit surface EA.

反射體130形成於除光出射面EA之外的LED晶片110的區域上。此時,反射體130可直接形成於LED晶片110上或介入於兩者之間的另一部件上。亦即,根據各種實施例,反射體130可如圖2所示直接形成於LED晶片110上,或如圖3及圖4所示形成於LED晶片110上所形成的波長轉換層120上。 The reflector 130 is formed on a region of the LED wafer 110 other than the light exit surface EA. At this time, the reflector 130 may be formed directly on the LED wafer 110 or on another component interposed therebetween. That is, according to various embodiments, the reflector 130 may be formed directly on the LED wafer 110 as shown in FIG. 2 or formed on the wavelength conversion layer 120 formed on the LED wafer 110 as shown in FIGS. 3 and 4.

反射體130用於朝向光出射面EA反射光。亦即,形成於除光出射面EA之外的LED晶片110的區域上的反射體用於朝向光出射面EA導引光,以便經由所述光出射面EA發射光。 The reflector 130 is for reflecting light toward the light exit surface EA. That is, the reflector formed on the area of the LED wafer 110 other than the light exit surface EA is used to guide light toward the light exit surface EA to emit light via the light exit surface EA.

基板140包含電連接至LED晶片110的基板襯墊141a、141b。凸塊150a、150b分別設置於基板襯墊141a、141b上。雖然不受特定限制,但基板140可為(例如)有利於散熱的金屬印刷電路板(PCB)。基板140可為具有長軸及短軸的杆型基板。 The substrate 140 includes substrate pads 141a, 141b that are electrically connected to the LED wafer 110. The bumps 150a, 150b are respectively disposed on the substrate pads 141a, 141b. Although not particularly limited, the substrate 140 may be, for example, a metal printed circuit board (PCB) that facilitates heat dissipation. The substrate 140 may be a rod type substrate having a long axis and a short axis.

底填料200介入於LED晶片110與基板140之間。底填料200用於反射自LED晶片110產生的光,藉此提高發光效率。此外,底填料200用於防止LED晶片110與基板140之間的濕氣滲入。底填料200包含反射性材料。舉例而言,底填料200可包含樹脂以及樹脂內的反射性材料。反射性材料可包含選自以下各者的材料:TiO2、SiO2、ZrO2、PbCO3、PbO、Al2O3、ZnO、Sb2O3及其組合。底填料200形成為直至與被界定為光出射面EA的LED晶片110的一個表面對準的區域為止。雖然不受特定限制,但底填料200可藉由施配而形成。底填料200可更包含螢光材料(未圖示)。底填料200可具有預定黏著強度。 The underfill 200 is interposed between the LED wafer 110 and the substrate 140. The underfill 200 is used to reflect light generated from the LED wafer 110, thereby improving luminous efficiency. Further, the underfill 200 serves to prevent moisture infiltration between the LED wafer 110 and the substrate 140. The underfill 200 comprises a reflective material. For example, the underfill 200 can comprise a resin as well as a reflective material within the resin. The reflective material may comprise a material selected from the group consisting of TiO 2 , SiO 2 , ZrO 2 , PbCO 3 , PbO, Al 2 O 3 , ZnO, Sb 2 O 3 , and combinations thereof. The underfill 200 is formed up to an area aligned with one surface of the LED wafer 110 defined as the light exit surface EA. Although not particularly limited, the underfill 200 may be formed by dosing. The underfill 200 may further comprise a fluorescent material (not shown). The underfill 200 can have a predetermined adhesive strength.

因此,光源模組100可使用反射體130以及底填料200而將光集中於其側表面(光出射面EA)上,同時將光損耗最小化,藉此將發光效率最大化。 Therefore, the light source module 100 can concentrate the light on its side surface (light exit surface EA) using the reflector 130 and the underfill 200 while minimizing optical loss, thereby maximizing luminous efficiency.

此外,LED晶片110藉由直接覆晶接合或SMT而電連接至基板140,藉此,與使用導線的封裝型的典型光源模組相比,光源模組100可實現高效率及緊湊性,此外,可將光源模組100製造為比安裝於光導板的側表面上的典型封裝型光源模組纖薄。 In addition, the LED chip 110 is electrically connected to the substrate 140 by direct flip-chip bonding or SMT, whereby the light source module 100 can achieve high efficiency and compactness compared to a typical light source module of a package type using a wire. The light source module 100 can be made thinner than a typical package type light source module mounted on a side surface of the light guide plate.

將參看圖6(a)及圖6(b)更詳細地描述LED晶片110的結構。圖6(a)為圖5所示的LED晶片的平面圖,且圖6(b)為沿著圖6(a)所示的線I-I'截取的LED晶片的剖視圖。參看圖6(a)及圖6(b),根據本發明的發光二極體(LED)晶片可包含生長基板111以及半導體堆疊113。 The structure of the LED wafer 110 will be described in more detail with reference to FIGS. 6(a) and 6(b). 6(a) is a plan view of the LED wafer shown in FIG. 5, and FIG. 6(b) is a cross-sectional view of the LED wafer taken along line II' shown in FIG. 6(a). Referring to FIGS. 6(a) and 6(b), a light emitting diode (LED) wafer according to the present invention may include a growth substrate 111 and a semiconductor stack 113.

半導體堆疊113包含:第一半導體層23,形成於生長基板111上且以第一導電類型雜質摻雜;以及台面M,在第一半導體層23上彼此分離。台面M中的每一者包含:主動層25;以及第二半導體層27,以第二導電類型雜質摻雜。主動層25介入於第一半導體層23與第二半導體層27之間。反射性電極30分別設置於台面M上。 The semiconductor stack 113 includes a first semiconductor layer 23 formed on the growth substrate 111 and doped with impurities of a first conductivity type, and a mesa M separated from each other on the first semiconductor layer 23. Each of the mesas M includes: an active layer 25; and a second semiconductor layer 27 doped with a second conductivity type impurity. The active layer 25 is interposed between the first semiconductor layer 23 and the second semiconductor layer 27. The reflective electrodes 30 are respectively disposed on the mesa M.

台面M可具有細長形狀且如圖所示在一個方向上彼此平行地延伸。此形狀使得在生長基板111的晶片區域上形成相同形狀的台面M是簡單的。 The mesas M may have an elongated shape and extend parallel to each other in one direction as shown. This shape makes it simple to form the mesa M of the same shape on the wafer area of the growth substrate 111.

雖然反射性電極30可在台面M形成之後形成於各別台面M上,但本發明不限於此。或者,在台面M的形成之前且在第二半導體層27的生長之後,反射性電極30可預先形成於第二半導體層27上。反射性電極30覆蓋實質上台面M的所有上表面且具有實質上與台面M的平面的形狀相同的形狀。 Although the reflective electrode 30 may be formed on the respective mesas M after the mesa M is formed, the present invention is not limited thereto. Alternatively, the reflective electrode 30 may be previously formed on the second semiconductor layer 27 before the formation of the mesa M and after the growth of the second semiconductor layer 27. The reflective electrode 30 covers all of the upper surfaces of the mesa M and has substantially the same shape as the plane of the mesa M.

反射性電極30包含反射性層28且可更包含阻障層29。阻障層29可覆蓋反射性層28的上表面以及側表面。舉例而言,藉由形成反射性層28的圖案,接著在圖案上形成阻障層29,阻障層29可形成為覆蓋反射性層28的上表面以及側表面。舉例而言,可藉由沉積Ag、Ag合金、Ni/Ag、NiZn/Ag或TiO/Ag,接著圖案化,而形成反射性層28。阻障層29可由Ni、Cr、Ti、Pt、Rd、Ru、W、Mo、TiW或其複合層形成,且防止金屬材料在反射性層中的擴散或污染。 The reflective electrode 30 includes a reflective layer 28 and may further include a barrier layer 29. The barrier layer 29 may cover the upper surface and the side surface of the reflective layer 28. For example, by forming a pattern of the reflective layer 28 and then forming a barrier layer 29 on the pattern, the barrier layer 29 may be formed to cover the upper surface and the side surface of the reflective layer 28. For example, the reflective layer 28 can be formed by depositing Ag, Ag alloy, Ni/Ag, NiZn/Ag, or TiO/Ag followed by patterning. The barrier layer 29 may be formed of Ni, Cr, Ti, Pt, Rd, Ru, W, Mo, TiW or a composite layer thereof, and prevents diffusion or contamination of the metal material in the reflective layer.

在台面M形成之後,第一半導體層23的邊緣亦可經受蝕刻。因此,可暴露基板21的上表面。亦可形成第一半導體層23的側表面。 After the mesa M is formed, the edges of the first semiconductor layer 23 may also be subjected to etching. Therefore, the upper surface of the substrate 21 can be exposed. A side surface of the first semiconductor layer 23 may also be formed.

根據本發明的LED晶片更包含下方絕緣層31以覆蓋台面M以及第一半導體層23。下方絕緣層31在其特定區域中具有開口以允許電連接至第一半導體層23以及第二半導體層27。舉例而言,下方絕緣層31可具有暴露第一半導體層23的開口以及暴露反射性電極30的開口。 The LED wafer according to the present invention further includes a lower insulating layer 31 to cover the mesas M and the first semiconductor layer 23. The lower insulating layer 31 has an opening in a specific region thereof to allow electrical connection to the first semiconductor layer 23 and the second semiconductor layer 27. For example, the lower insulating layer 31 may have an opening exposing the first semiconductor layer 23 and an opening exposing the reflective electrode 30.

開口可設置於台面M之間且接近基板21的邊緣,且可具有沿著台面M延伸的細長形狀。此外,開口可限制性地設置於台面M上以偏向台面的相同末端。 The openings may be disposed between the mesas M and near the edges of the substrate 21, and may have an elongated shape extending along the mesas M. Further, the opening may be restrictively disposed on the mesa M to be biased toward the same end of the mesa.

根據本發明的LED晶片更包含形成於下方絕緣層31上的電流散佈層33。電流散佈層33覆蓋台面M以及第一半導體層23。電流散佈層33具有設置於各別台面M上方的開口,以使得反射性電極經由所述開口而暴露。電流散佈層33可經由下方絕緣層31的開口而與第一半導體層23形成歐姆接觸。電流散佈層33藉由下方絕緣層31而與台面M以及反射性電極30電絕緣。 The LED wafer according to the present invention further includes a current spreading layer 33 formed on the lower insulating layer 31. The current spreading layer 33 covers the mesas M and the first semiconductor layer 23. The current spreading layer 33 has openings disposed above the respective mesas M such that the reflective electrodes are exposed through the openings. The current spreading layer 33 may form an ohmic contact with the first semiconductor layer 23 via the opening of the lower insulating layer 31. The current spreading layer 33 is electrically insulated from the mesa M and the reflective electrode 30 by the lower insulating layer 31.

電流散佈層33的開口具有比下方絕緣層31的面積大的面積,以便防止電流散佈層33接觸反射性電極30。 The opening of the current spreading layer 33 has an area larger than the area of the lower insulating layer 31 in order to prevent the current spreading layer 33 from contacting the reflective electrode 30.

電流散佈層33形成於其開口之外的基板31的實質上整個上方區域上方。因此,電流可容易經由電流散佈層33而分散。電流散佈層33可包含高反射性金屬層,諸如,Al層,且高反射性 金屬層可形成於接合層(諸如,Ti、Cr、Ni層或其類似者)上。此外,具有Ni、Cr或Au的單層或複合層結構的保護層可形成高反射性金屬層上。電流散佈層33可具有(例如)Ti/Al/Ti/Ni/Au的多層結構。 The current spreading layer 33 is formed over substantially the entire upper region of the substrate 31 outside its opening. Therefore, the current can be easily dispersed through the current spreading layer 33. The current spreading layer 33 may comprise a highly reflective metal layer, such as an Al layer, and is highly reflective. The metal layer may be formed on a bonding layer such as a Ti, Cr, Ni layer or the like. Further, a protective layer having a single layer or a composite layer structure of Ni, Cr or Au may be formed on the highly reflective metal layer. The current spreading layer 33 may have a multilayer structure of, for example, Ti/Al/Ti/Ni/Au.

LED晶片更包含形成於電流散佈層33上的上方絕緣層35。上方絕緣層35具有暴露電流散佈層33的開口以及暴露反射性電極30的開口。上方絕緣層35可使用氧化物絕緣層、氮化物絕緣層、此等絕緣層的混合層或交替堆疊、或聚合物(諸如,聚醯亞胺、鐵氟龍、聚對二甲苯或其類似者)而形成。 The LED wafer further includes an upper insulating layer 35 formed on the current spreading layer 33. The upper insulating layer 35 has an opening exposing the current spreading layer 33 and an opening exposing the reflective electrode 30. The upper insulating layer 35 may use an oxide insulating layer, a nitride insulating layer, a mixed layer of such insulating layers or alternately stacked, or a polymer such as polyimine, Teflon, parylene or the like. ) formed.

第一電極襯墊37a以及第二電極襯墊37b形成於上方絕緣層35上。第一電極襯墊37a經由上方絕緣層35的開口而連接至電流散佈層33,且第二電極襯墊37b經由上方絕緣層35的開口而連接至反射性電極30。第一電極襯墊37a以及第二電極襯墊37b可用作用於將LED晶片安裝於電路板上的凸塊的連接的襯墊或用於SMT的襯墊。 The first electrode pad 37a and the second electrode pad 37b are formed on the upper insulating layer 35. The first electrode pad 37a is connected to the current spreading layer 33 via the opening of the upper insulating layer 35, and the second electrode pad 37b is connected to the reflective electrode 30 via the opening of the upper insulating layer 35. The first electrode pad 37a and the second electrode pad 37b may be used as a pad for connecting the bumps of the LED chip on the circuit board or a pad for the SMT.

第一電極襯墊37a以及第二電極襯墊37b可藉由同一製程(例如,藉由光微影及蝕刻,或藉由剝離技術)而同時形成。第一電極襯墊37a以及第二電極襯墊37b可包含由(例如)Ti、Cr、Ni或其類似者形成的接合層以及由Ag、Au及其類似者形成的高導電金屬層。第一電極襯墊37a以及第二電極襯墊37b可經形成以使得其末端設置於同一平面上,且LED晶片可因此藉由覆晶接合而接合至在基板上形成於同一高度處的導電圖案。 The first electrode pad 37a and the second electrode pad 37b may be simultaneously formed by the same process (for example, by photolithography and etching, or by a lift-off technique). The first electrode pad 37a and the second electrode pad 37b may include a bonding layer formed of, for example, Ti, Cr, Ni, or the like, and a highly conductive metal layer formed of Ag, Au, and the like. The first electrode pad 37a and the second electrode pad 37b may be formed such that their ends are disposed on the same plane, and the LED chips may thus be bonded to the conductive patterns formed at the same height on the substrate by flip chip bonding .

LED晶片藉由將生長基板111劃分為個別LED晶片單元而完整地製造。亦可在劃分為個別LED晶片單元之前或之後自LED晶片移除生長基板111。 The LED wafer is completely fabricated by dividing the growth substrate 111 into individual LED wafer units. The growth substrate 111 can also be removed from the LED wafer before or after being divided into individual LED wafer units.

因此,與封裝型的典型發光元件相比,藉由覆晶接合而直接接合至基板的根據本發明的LED晶片具有實現高效率及緊湊性的優點。 Therefore, the LED wafer according to the present invention directly bonded to the substrate by flip chip bonding has an advantage of achieving high efficiency and compactness as compared with a typical light-emitting element of a package type.

圖7為根據本發明的一個實施例的包含背光單元的顯示元件的分解透視圖,且圖8為沿著圖7所示的線II-II'截取的顯示元件的剖視圖。 7 is an exploded perspective view of a display element including a backlight unit, and FIG. 8 is a cross-sectional view of the display element taken along line II-II' shown in FIG. 7, in accordance with an embodiment of the present invention.

參看圖7及圖8,顯示元件包含:顯示面板DP,用於顯示影像;背光單元BLU,安置於顯示面板DP的後側處且發射光;框架240,支撐顯示面板DP且收納背光單元BLU;以及頂蓋280,圍繞顯示面板DP。 Referring to FIG. 7 and FIG. 8 , the display element includes: a display panel DP for displaying an image; a backlight unit BLU disposed at a rear side of the display panel DP and emitting light; and a frame 240 supporting the display panel DP and accommodating the backlight unit BLU; And a top cover 280 surrounding the display panel DP.

顯示面板DP包含彩色濾光片基板FS以及薄膜電晶體(TFT)基板SS,其彼此組裝以面向彼此,同時維持均一胞元間隙。取決於其類型,顯示面板DP可更包含位於彩色濾光片基板FS與薄膜電晶體基板SS之間的液晶層。 The display panel DP includes a color filter substrate FS and a thin film transistor (TFT) substrate SS which are assembled to face each other while maintaining a uniform cell gap. The display panel DP may further include a liquid crystal layer between the color filter substrate FS and the thin film transistor substrate SS depending on the type thereof.

雖然未詳細展示,但薄膜電晶體基板SS包含彼此交叉以在兩者之間界定像素的閘極線及資料線,以及設置於其之間的每一交叉區域中且以一對一的對應關係連接至像素中的每一者中所安裝的像素電極的薄膜電晶體。彩色濾光片基板FS包含對應於各別像素的R、G及B彩色濾光片、沿著基板的周邊而安置且屏蔽 閘極線、資料線以及薄膜電晶體的黑色矩陣,以及覆蓋所有此等組件的共同電極。此處,共同電極可形成於薄膜電晶體基板SS上。 Although not shown in detail, the thin film transistor substrate SS includes gate lines and data lines that cross each other to define pixels therebetween, and each of the intersection regions disposed therebetween and in a one-to-one correspondence A thin film transistor connected to the pixel electrode mounted in each of the pixels. The color filter substrate FS includes R, G, and B color filters corresponding to respective pixels, disposed along the periphery of the substrate and shielded The black matrix of the gate line, the data line, and the thin film transistor, and the common electrode covering all of these components. Here, the common electrode may be formed on the thin film transistor substrate SS.

背光單元BLU將光供應至顯示面板DP,且包含:下蓋270,在其上側處部分開放;光源模組100,在下蓋270內安置於一側上;以及光導板250,平行於光源模組100而安置以將點光轉換為表面光。在先前技術中,光源模組100通常安置於下蓋270的內側表面上。在此狀況下,由於光源模組100的寬度,在減小背光單元或包含背光單元的顯示面板的高度方面存在限制。根據本發明,光源模組100在下蓋270內設置於底表面上,藉此使得背光單元或包含背光單元的顯示面板比先前技術中的背光單元或包含背光單元的顯示面板纖薄。根據描述,在下蓋270內設置於底表面上的光源模組100可被說明為平行於光導板250而安置。 The backlight unit BLU supplies light to the display panel DP, and includes: a lower cover 270 partially open at an upper side thereof; a light source module 100 disposed on one side in the lower cover 270; and a light guide plate 250 parallel to the light source module 100 is placed to convert the point light into surface light. In the prior art, the light source module 100 is generally disposed on the inner side surface of the lower cover 270. In this case, there is a limitation in reducing the height of the backlight unit or the display panel including the backlight unit due to the width of the light source module 100. According to the present invention, the light source module 100 is disposed on the bottom surface in the lower cover 270, whereby the backlight unit or the display panel including the backlight unit is made thinner than the backlight unit of the prior art or the display panel including the backlight unit. According to the description, the light source module 100 disposed on the bottom surface in the lower cover 270 can be illustrated as being disposed parallel to the light guide plate 250.

此外,根據本發明的背光單元BLU更包含:光學薄片230,設置於光導板250上以擴散及收集光;以及反射性薄片260,設置於光導板250之下以朝向顯示面板DP反射朝向光導板250的下方部分行進的光。 In addition, the backlight unit BLU according to the present invention further includes: an optical sheet 230 disposed on the light guiding plate 250 to diffuse and collect light; and a reflective sheet 260 disposed under the light guiding plate 250 to be reflected toward the display panel DP toward the light guiding plate The light traveling in the lower part of 250.

本文中,將不省略光源模組100的詳細描述。參看圖5以瞭解其細節。 In this document, a detailed description of the light source module 100 will not be omitted. See Figure 5 for details.

藉由以覆晶接合或SMT將LED晶片直接安裝於基板上,接著在基板與LED晶片之間形成包含反射性材料的底填料而製造光源模組100。因此,光源模組100有利於背光單元的纖薄性,且能夠藉由使用反射體以及底填料而將光集中於光源模組100 的一側上而使發光效率最大化,同時使光損耗最小化。 The light source module 100 is fabricated by directly mounting an LED wafer on a substrate by flip chip bonding or SMT, and then forming an underfill containing a reflective material between the substrate and the LED wafer. Therefore, the light source module 100 facilitates the slimness of the backlight unit, and can concentrate the light on the light source module 100 by using the reflector and the underfill. On one side, the luminous efficiency is maximized while minimizing light loss.

圖9至圖11展示根據本發明的例示性實施例的光源模組的製造程序。參看圖9至圖11,光源模組的製造程序包含製造LED晶片。在此操作中,首先製造LED晶片110。 9 through 11 show a manufacturing procedure of a light source module in accordance with an exemplary embodiment of the present invention. Referring to Figures 9 through 11, the manufacturing process of the light source module includes manufacturing an LED wafer. In this operation, the LED wafer 110 is first fabricated.

可藉由在生長基板111上形成半導體堆疊113而製造LED晶片110。LED 110可在其下方部分上形成有電極襯墊37a、37b。光源模組的特徵與圖2至圖5所示的光源模組的特徵相同。因此,類似特徵由類似參考數字表示,且將關於製造程序來簡要地描述,而不提供所述特徵的詳細描述。 The LED wafer 110 can be fabricated by forming the semiconductor stack 113 on the growth substrate 111. The LED 110 may be formed with electrode pads 37a, 37b on a lower portion thereof. The features of the light source module are the same as those of the light source module shown in FIGS. 2 to 5. Therefore, similar features are denoted by like reference numerals and will be briefly described with respect to the manufacturing process, without a detailed description of the features.

LED晶片的製造包含形成以第一導電類型雜質摻雜的第一半導體層、在第一半導體層之下形成主動層以及在主動層之下形成以第二導電類型雜質摻雜的第二半導體層。此後,形成第一電極以電連接至第一半導體層,形成第二電極以電連接至第二半導體,且形成第一襯墊以及第二襯墊以分別電連接至第一電極以及第二電極。 The fabrication of the LED wafer includes forming a first semiconductor layer doped with a first conductivity type impurity, forming an active layer under the first semiconductor layer, and forming a second semiconductor layer doped with a second conductivity type impurity under the active layer . Thereafter, a first electrode is formed to be electrically connected to the first semiconductor layer, a second electrode is formed to be electrically connected to the second semiconductor, and a first pad and a second pad are formed to be electrically connected to the first electrode and the second electrode, respectively .

接著,在形成波長轉換層的操作中,形成波長轉換層120以封閉至少LED晶片的光出射面。接著,在形成反射體130的操作中,在除光出射面之外的LED晶片的區域上形成反射體130。 Next, in the operation of forming the wavelength conversion layer, the wavelength conversion layer 120 is formed to block at least the light exit surface of the LED wafer. Next, in the operation of forming the reflector 130, the reflector 130 is formed on the area of the LED wafer other than the light exit surface.

根據各種實施例,反射體130可直接形成於LED晶片上或LED晶片上所形成的另一部件(諸如,波長轉換層120)上。當反射體形成於光出射面上時,波長轉換層藉由自對應於光出射面的區域移除反射體而暴露。 According to various embodiments, the reflector 130 may be formed directly on the LED wafer or another component formed on the LED wafer, such as the wavelength conversion layer 120. When the reflector is formed on the light exit surface, the wavelength conversion layer is exposed by removing the reflector from a region corresponding to the light exit surface.

所暴露的波長轉換層120對應於LED晶片110的光出射面EA。雖然不受特定限制,但高速切割可用於移除反射體130。 The exposed wavelength conversion layer 120 corresponds to the light exit surface EA of the LED wafer 110. Although not particularly limited, high speed cutting can be used to remove the reflector 130.

根據本發明的實施例的光源模組的製造程序更包含將LED晶片電連接至基板。在此操作中,LED晶片110的電極襯墊37a、37b分別連接至基板140的基板襯墊141a、141b。此時,LED晶片110可藉由覆晶接合或表面安裝技術(SMT)而直接電連接至基板140。此處,凸塊150a、150b分別介入於基板襯墊141a、141b與電極襯墊37a、37b之間。 The manufacturing process of the light source module according to an embodiment of the present invention further includes electrically connecting the LED chip to the substrate. In this operation, the electrode pads 37a, 37b of the LED wafer 110 are respectively connected to the substrate pads 141a, 141b of the substrate 140. At this time, the LED wafer 110 can be directly electrically connected to the substrate 140 by flip chip bonding or surface mount technology (SMT). Here, the bumps 150a, 150b are interposed between the substrate pads 141a, 141b and the electrode pads 37a, 37b, respectively.

根據本發明的實施例,形成波長轉換層以及反射體的操作以及將LED晶片電連接至基板的操作可按照不同次序來執行。亦即,LED晶片可在波長轉換層以及反射體形成於LED晶片上之前或之後電連接至基板。 According to an embodiment of the present invention, the operations of forming the wavelength conversion layer and the reflector and the operation of electrically connecting the LED wafer to the substrate may be performed in different orders. That is, the LED wafer can be electrically connected to the substrate before or after the wavelength conversion layer and the reflector are formed on the LED wafer.

光源模組的製造程序更包含在基板140與LED晶片110之間形成底填料200。具體言之,屏障170形成於對應於LED晶片110的光出射面EA的表面上。屏障170接觸LED晶片110的光出射面EA。屏障170設置為鄰接基板140。屏障170可藉由包含光阻或黏著劑的框架結構而形成於基板140上。在屏障170形成之後,底填料注入至基板與LED晶片之間的區域中。在此狀況下,屏障170用於限制將形成底填料200的區域。特定言之,屏障170防止底填料200延伸至光出射面EA。屏障170可在底填料200形成之後藉由蝕刻或其他物理方法來移除。 The manufacturing process of the light source module further includes forming an underfill 200 between the substrate 140 and the LED wafer 110. Specifically, the barrier 170 is formed on the surface corresponding to the light exit surface EA of the LED wafer 110. The barrier 170 contacts the light exit surface EA of the LED wafer 110. The barrier 170 is disposed adjacent to the substrate 140. The barrier 170 may be formed on the substrate 140 by a frame structure including a photoresist or an adhesive. After the barrier 170 is formed, the underfill is implanted into the region between the substrate and the LED wafer. In this case, the barrier 170 serves to limit the area where the underfill 200 will be formed. In particular, the barrier 170 prevents the underfill 200 from extending to the light exit surface EA. The barrier 170 can be removed by etching or other physical methods after the underfill 200 is formed.

底填料200用於反射自LED晶片110產生的光,藉此提 高發光效率,且防止濕氣的滲入。底填料200包含反射性材料。舉例而言,底填料200可包含樹脂以及樹脂內的反射性材料,且反射性材料可包含選自由以下各者組成的群組的一種材料:TiO2、SiO2、ZrO2、PbCO3、PbO、Al2O3、ZnO、Sb2O3及其組合。屏障170允許底填料200形成為直至與光出射面EA對準的區域為止。雖然不受特定限制,但底填料200可藉由施配而形成。底填料200可更包含螢光材料(未圖示)。底填料200可具有預定黏著強度。 The underfill 200 serves to reflect light generated from the LED wafer 110, thereby improving luminous efficiency and preventing infiltration of moisture. The underfill 200 comprises a reflective material. For example, the underfill 200 may comprise a resin and a reflective material within the resin, and the reflective material may comprise a material selected from the group consisting of TiO 2 , SiO 2 , ZrO 2 , PbCO 3 , PbO , Al 2 O 3 , ZnO, Sb 2 O 3 and combinations thereof. The barrier 170 allows the underfill 200 to be formed up to the area aligned with the light exit surface EA. Although not particularly limited, the underfill 200 may be formed by dosing. The underfill 200 may further comprise a fluorescent material (not shown). The underfill 200 can have a predetermined adhesive strength.

如上所述,根據本發明的實施例的光源模組可使用反射體130以及底填料200而將光集中於其一側上,同時將光損耗最小化,藉此將發光效率最大化。 As described above, the light source module according to the embodiment of the present invention can use the reflector 130 and the underfill 200 to concentrate light on one side thereof while minimizing light loss, thereby maximizing luminous efficiency.

此外,與使用導線的封裝型的典型光源模組相比,LED晶片110藉由直接覆晶接合或SMT而電連接至基板140的根據本發明的光源模組可實現高效率及緊湊性。 In addition, the light source module according to the present invention in which the LED chip 110 is electrically connected to the substrate 140 by direct flip-chip bonding or SMT can achieve high efficiency and compactness compared to a typical light source module of a package type using a wire.

雖然已描述本發明的各種實施例,但本發明不限於特定實施例。此外,特定實施例中所說明的部件可按相同或相似方式用於其他實施例,而不偏離本發明的精神及範疇。 Although various embodiments of the invention have been described, the invention is not limited to the specific embodiments. In addition, the components described in the specific embodiments may be applied to other embodiments in the same or similar manner without departing from the spirit and scope of the invention.

37a‧‧‧第一電極襯墊 37a‧‧‧First electrode pad

37b‧‧‧第二電極襯墊 37b‧‧‧Second electrode pad

100‧‧‧光源模組 100‧‧‧Light source module

110‧‧‧LED晶片 110‧‧‧LED chip

111‧‧‧基板 111‧‧‧Substrate

113‧‧‧半導體堆疊 113‧‧‧Semiconductor stacking

120‧‧‧波長轉換層 120‧‧‧wavelength conversion layer

130‧‧‧反射體 130‧‧‧ reflector

140‧‧‧基板 140‧‧‧Substrate

141a‧‧‧基板襯墊 141a‧‧‧Substrate liner

141b‧‧‧基板襯墊 141b‧‧‧Substrate liner

150a‧‧‧凸塊 150a‧‧‧bump

150b‧‧‧凸塊 150b‧‧‧bump

200‧‧‧底填料 200‧‧‧ bottom filler

Claims (17)

一種光源模組,包括:發光二極體(LED)晶片,經由其下表面而電連接至基板,且包括橫向安置的光出射面,其中所述LED晶片的光經由所述光出射面而發射;波長轉換層,安置於所述LED晶片上且至少覆蓋所述光出射面;以及反射體,安置於所述LED晶片上且暴露所述光出射面。 A light source module comprising: a light emitting diode (LED) wafer electrically connected to a substrate via a lower surface thereof, and comprising a laterally disposed light exit surface, wherein light of the LED wafer is emitted via the light exit surface a wavelength conversion layer disposed on the LED wafer and covering at least the light exit surface; and a reflector disposed on the LED wafer and exposing the light exit surface. 如申請專利範圍第1項所述的光源模組,更包括介入於所述基板與所述LED晶片之間且包括反射性材料的底填料。 The light source module of claim 1, further comprising an underfill interposed between the substrate and the LED wafer and comprising a reflective material. 如申請專利範圍第2項所述的光源模組,其中所述反射性材料包括選自由以下各者組成的群組的一種材料:TiO2、SiO2、ZrO2、PbCO3、PbO、Al2O3、ZnO、Sb2O3及其組合。 The light source module of claim 2, wherein the reflective material comprises a material selected from the group consisting of TiO 2 , SiO 2 , ZrO 2 , PbCO 3 , PbO, Al 2 O 3 , ZnO, Sb 2 O 3 and combinations thereof. 如申請專利範圍第2項所述的光源模組,其中所述底填料包括螢光材料。 The light source module of claim 2, wherein the underfill comprises a fluorescent material. 如申請專利範圍第1項所述的光源模組,其中所述LED晶片藉由覆晶接合或表面安裝技術(SMT)而安裝於所述基板上。 The light source module of claim 1, wherein the LED chip is mounted on the substrate by flip chip bonding or surface mount technology (SMT). 如申請專利範圍第1項所述的光源模組,其中所述LED晶片包括:第一半導體層,以第一導電類型雜質摻雜;主動層,形成於所述第一半導體層之下;第二半導體層,以第二導電類型雜質摻雜且形成於所述主動 層之下;第一電極,電連接至所述第一半導體層;第二電極,電連接至所述第二半導體層;第一電極襯墊,電連接至所述第一電極;以及第二電極襯墊,電連接至所述第二電極,其中所述LED晶片經由所述第一電極襯墊以及所述第二電極襯墊而電連接至所述基板。 The light source module of claim 1, wherein the LED chip comprises: a first semiconductor layer doped with a first conductivity type impurity; an active layer formed under the first semiconductor layer; a second semiconductor layer doped with a second conductivity type impurity and formed on the active a layer; a first electrode electrically connected to the first semiconductor layer; a second electrode electrically connected to the second semiconductor layer; a first electrode pad electrically connected to the first electrode; and a second An electrode pad electrically connected to the second electrode, wherein the LED chip is electrically connected to the substrate via the first electrode pad and the second electrode pad. 一種背光單元,包括:光導板;以及光源模組,安置於所述光導板的至少一側上且經設置以發射光,其中所述光源模組包括:發光二極體(LED)晶片,經由其下表面而電連接至基板,且包括橫向安置的光出射面,其中所述LED晶片的光經由所述光出射面而發射;波長轉換層,安置於所述LED晶片上且至少覆蓋所述光出射面;以及反射體,安置於所述LED晶片上且暴露所述光出射面。 A backlight unit includes: a light guide plate; and a light source module disposed on at least one side of the light guide plate and configured to emit light, wherein the light source module comprises: a light emitting diode (LED) chip, via a lower surface thereof electrically connected to the substrate, and comprising a laterally disposed light exit surface, wherein light of the LED wafer is emitted via the light exit surface; a wavelength conversion layer disposed on the LED wafer and covering at least the a light exit surface; and a reflector disposed on the LED wafer and exposing the light exit surface. 如申請專利範圍第7項所述的背光單元,其中所述光源模組更包括介入於所述基板與所述LED晶片之間且包括反射性材料的底填料。 The backlight unit of claim 7, wherein the light source module further comprises an underfill interposed between the substrate and the LED wafer and comprising a reflective material. 如申請專利範圍第8項所述的背光單元,其中所述底填 料包括螢光材料。 The backlight unit of claim 8, wherein the underfill Materials include fluorescent materials. 如申請專利範圍第7項所述的背光單元,其中所述LED晶片藉由覆晶接合或表面安裝技術(SMT)而安裝於所述基板上。 The backlight unit of claim 7, wherein the LED chip is mounted on the substrate by flip chip bonding or surface mount technology (SMT). 一種製造光源模組的方法,包括:製造發光二極體(LED)晶片,所述LED晶片包含光出射面,其中所述LED晶片的光經由所述光出射面而發射;在所述LED晶片上形成波長轉換層以至少覆蓋所述LED晶片的所述光出射面;以及在所述LED晶片上形成暴露所述光出射面的反射體。 A method of fabricating a light source module, comprising: fabricating a light emitting diode (LED) wafer, the LED chip including a light exit surface, wherein light of the LED wafer is emitted via the light exit surface; Forming a wavelength conversion layer thereon to cover at least the light exit surface of the LED wafer; and forming a reflector on the LED wafer that exposes the light exit surface. 如申請專利範圍第11項所述的製造光源模組的方法,其中形成所述反射體包括:在所述LED晶片的上表面以及側表面上形成所述反射體;以及若所述反射體形成於所述光出射面上,則藉由自對應於所述光出射面的區域移除所述反射體而暴露所述波長轉換層。 The method of manufacturing a light source module according to claim 11, wherein the forming the reflector comprises: forming the reflector on an upper surface and a side surface of the LED wafer; and if the reflector is formed On the light exit surface, the wavelength conversion layer is exposed by removing the reflector from a region corresponding to the light exit surface. 如申請專利範圍第12項所述的製造光源模組的方法,其中暴露所述波長轉換層包括切割所述反射體以暴露所述光出射面。 The method of manufacturing a light source module of claim 12, wherein exposing the wavelength conversion layer comprises cutting the reflector to expose the light exit surface. 如申請專利範圍第11項所述的製造光源模組的方法,更包括在形成所述反射體之後在所述基板與所述LED晶片之間形成包括反射性材料的底填料。 The method of manufacturing a light source module according to claim 11, further comprising forming an underfill comprising a reflective material between the substrate and the LED wafer after forming the reflector. 如申請專利範圍第14項所述的製造光源模組的方法,其 中形成所述底填料包括:形成設置於所述基板上以鄰接所述LED晶片的所述光出射面的屏障;將所述底填料注入至所述基板與所述LED晶片之間的區域中;以及在形成所述底填料之後移除所述屏障。 A method of manufacturing a light source module according to claim 14, wherein Forming the underfill in the middle layer includes: forming a barrier disposed on the substrate to abut the light exit surface of the LED wafer; injecting the underfill into a region between the substrate and the LED wafer And removing the barrier after forming the underfill. 如申請專利範圍第11項所述的製造光源模組的方法,更包括將所述LED晶片電連接至基板,其中所述LED晶片藉由覆晶接合或表面安裝技術(SMT)而安裝於所述基板上。 The method of manufacturing a light source module according to claim 11, further comprising electrically connecting the LED chip to a substrate, wherein the LED chip is mounted on the substrate by flip chip bonding or surface mount technology (SMT) On the substrate. 如申請專利範圍第11項所述的製造光源模組的方法,其中製造所述LED晶片包括:形成以第一導電類型雜質摻雜的第一半導體層;在所述第一半導體層之下形成主動層;在所述主動層之下形成以第二導電類型雜質摻雜的第二半導體層;形成電連接至所述第一半導體層的第一電極;形成電連接至所述第二半導體層的第二電極;形成電連接至所述第一電極的第一襯墊;以及形成電連接至所述第二電極的第二襯墊。 The method of manufacturing a light source module according to claim 11, wherein the manufacturing the LED chip comprises: forming a first semiconductor layer doped with a first conductivity type impurity; forming under the first semiconductor layer An active layer; forming a second semiconductor layer doped with a second conductivity type impurity under the active layer; forming a first electrode electrically connected to the first semiconductor layer; forming an electrical connection to the second semiconductor layer a second electrode; forming a first pad electrically connected to the first electrode; and forming a second pad electrically connected to the second electrode.
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