TW201508040A - Polyimide adhesive - Google Patents
Polyimide adhesive Download PDFInfo
- Publication number
- TW201508040A TW201508040A TW102131403A TW102131403A TW201508040A TW 201508040 A TW201508040 A TW 201508040A TW 102131403 A TW102131403 A TW 102131403A TW 102131403 A TW102131403 A TW 102131403A TW 201508040 A TW201508040 A TW 201508040A
- Authority
- TW
- Taiwan
- Prior art keywords
- triazabenzene
- diamine
- dianhydride
- copper foil
- adhesive
- Prior art date
Links
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
本發明係與適用於銅箔基板的聚醯亞胺黏合劑有關,特別是有關於具有高耐熱性、高黏結性和高平坦性的銅箔基板使用的聚醯亞胺黏合劑。The present invention relates to a polyimide conjugate adhesive suitable for use in a copper foil substrate, and more particularly to a polyimide conjugate adhesive for use in a copper foil substrate having high heat resistance, high adhesion, and high flatness.
軟性印刷電路板具有柔軟、輕、薄及可撓性等優點,在資通訊電子產品快速走向輕、薄、短、小趨勢下,目前已廣泛的應用在筆記型電腦、數位相關、手機、液晶顯示器等到用途。Soft printed circuit boards have the advantages of softness, lightness, thinness and flexibility. They are widely used in notebook computers, digital related devices, mobile phones, and LCDs in the trend of fast, thin, short, and small trends in telecom electronic products. The display waits for the purpose.
傳統的軟板材料,主要是以聚醯亞胺(PI)膜/接著劑/銅箔之三層結構為主,接著劑是以環氧樹脂/丙烯酸酯為主,但接著劑的耐熱性與尺寸安定性不佳,長期使用溫度限制在100-200℃,使得三層有膠軟板基材的應用領域受限。新近發展的二層無膠軟板基材(2-Layer FCCL)僅由PI膜/銅箔所組成,因為不需使用接著劑而能增加產品長期使用的可靠性及應用範圍。The traditional soft board material is mainly composed of a three-layer structure of polyimine (PI) film/adhesive/copper foil, and the adhesive is mainly epoxy resin/acrylate, but the heat resistance of the adhesive is The dimensional stability is not good, and the long-term use temperature is limited to 100-200 ° C, which makes the application area of the three-layered flexible board substrate limited. The newly developed two-layer non-adhesive soft board substrate (2-Layer FCCL) consists only of PI film/copper foil, because it does not require the use of an adhesive agent to increase the reliability and application range of the product for long-term use.
目前大多數的二層軟性印刷電路基板都是以聚醯亞胺的前驅體,即聚醯胺酸(PAA),塗布到銅箔上進行加熱乾燥,然後固化得到直接黏結在銅箔上的聚醯亞胺膜。通常聚醯胺酸是由芳香族四羧酸二酐和芳香族二胺反應合成得到。然而,由於一般的聚醯亞胺之銅箔接合性不佳,所以需選擇具有高銅箔接合性的單體改質聚醯亞胺。At present, most of the two-layer flexible printed circuit substrates are coated with a polyimide precursor, polyacrylamide (PAA), coated on a copper foil, dried, and then cured to obtain a poly bond directly bonded to the copper foil.醯 imine film. Usually, polylysine is synthesized by reacting an aromatic tetracarboxylic dianhydride with an aromatic diamine. However, since the general copper foil of the polyimine has poor bondability, it is necessary to select a monomer-modified polyimine having high copper foil bondability.
另外,在無接著劑型的聚醯亞胺/銅箔積層材料的開發上,除了提高聚醯亞胺之銅箔接合性以外,尚面臨到黏合後之聚醯亞胺/銅箔產生捲曲等問題。In addition, in the development of a polyimide-free copper foil laminate material without an adhesive type, in addition to improving the copper foil bondability of polyimine, there is a problem that the polyimide/copper foil after bonding is curled. .
本發明之一目的,在於提供一種供銅箔基板使用的聚醯亞胺黏合劑,其具有高耐熱性、高黏結性和高平坦性。It is an object of the present invention to provide a polyimide pigment adhesive for use in a copper foil substrate which has high heat resistance, high adhesion and high flatness.
為了達成上述之目的,本發明係一種聚醯亞胺黏著劑,其係由包含選自四羧酸二酐和芳香族二胺的下列單體之反應物共聚合而成:(a)三氮雜苯二元胺;(b)均苯四羧酸二酐(PMDA);及(c)二胺基二苯醚(ODA),其中,四羧酸二酐和芳香族二胺的重量比為1:0.7-1.3,且三氮雜苯二元胺的含量占胺基組成係小於70%。適用於製備本發明聚醯亞胺黏著劑的三氮雜苯二元胺,例如是3,5二胺基-1,2,4-三氮雜苯(DATA)。In order to achieve the above object, the present invention is a polyimine adhesive which is obtained by copolymerizing a reactant comprising the following monomers selected from the group consisting of tetracarboxylic dianhydride and aromatic diamine: (a) trinitrogen a heterobenzene diamine; (b) pyromellitic dianhydride (PMDA); and (c) a diaminodiphenyl ether (ODA), wherein the weight ratio of the tetracarboxylic dianhydride to the aromatic diamine is 1:0.7-1.3, and the content of the triazabenzenediamine is less than 70% of the amine group. A triazabenzene diamine suitable for use in the preparation of the polyimine adhesive of the present invention is, for example, 3,5-diamino-1,2,4-triazabenzene (DATA).
藉由三氮雜苯二元胺官能基上的氮原子與金屬銅形成Cu-N鍵結,以達成提升與銅金屬的接合強度。又,均苯四羧酸二酐的主鏈結構呈現高剛性,可以改善黏合後之聚醯亞胺/銅箔產生捲曲之問題。此外,由於DATA單體反應性不甚理想,可藉由加入ODA進行共聚反應來彌補黏度過低的缺失,來達到成膜的要求。The Cu-N bond is formed with the metal copper by the nitrogen atom on the triazabenzene diamine functional group to achieve a bonding strength with the copper metal. Further, the main chain structure of the pyromellitic dianhydride exhibits high rigidity, and the problem of curling of the polyimide/copper foil after bonding can be improved. In addition, since the reactivity of the DATA monomer is not ideal, the addition of ODA can be carried out to compensate for the lack of viscosity, thereby achieving the film formation requirement.
另外,本發明人經過長期研究發現,用來製備本發明之聚醯亞胺黏著劑組成中,若未包含三氮雜苯二元胺單體,則由於缺乏官能基上的氮原子與金屬銅形成Cu-N鍵結,與銅箔之接合性會降低。然而,若三氮雜苯二元胺單體的含量過高,例如占胺基組成70wt%以上,所得聚醯亞胺之熱膨脹係數與銅箔之熱膨脹係數相差過大,黏合後之聚醯亞胺/銅箔會產生捲曲現象。因此,三氮雜苯二元胺單體的含量必須在特定範圍內,方能同時兼顧與銅箔之接合性及避免產生捲曲現象。In addition, the inventors have found through long-term studies that the composition of the polyimine imide adhesive used in the preparation of the present invention does not contain a nitrogen atom and a metal copper on the functional group if the triazine benzene diamine monomer is not contained. The Cu-N bond is formed, and the bondability with the copper foil is lowered. However, if the content of the arsenazo diamine monomer is too high, for example, 70% by weight or more of the amine group composition, the thermal expansion coefficient of the obtained polyimine is too large compared with the thermal expansion coefficient of the copper foil, and the polyimine after bonding / Copper foil will cause curling. Therefore, the content of the triazabenzene diamine monomer must be within a specific range in order to achieve both the adhesion to the copper foil and the occurrence of curling.
本發明之一態樣中,四羧酸二酐更包含聯二苯四羧酸二酐,其中聯二苯四羧酸二酐與均苯四羧酸二酐之莫爾比為1:0.2-5。另一態樣中,四羧酸二酐更包含二苯酮四羧酸二酐,其中二苯酮四羧酸二酐與均苯四羧酸二酐之莫爾比為1:0.2-5。In one aspect of the invention, the tetracarboxylic dianhydride further comprises a biphenyltetracarboxylic dianhydride, wherein the molar ratio of the biphenyltetracarboxylic dianhydride to the pyromellitic dianhydride is 1:0.2- 5. In another aspect, the tetracarboxylic dianhydride further comprises benzophenone tetracarboxylic dianhydride, wherein the molar ratio of benzophenone tetracarboxylic dianhydride to pyromellitic dianhydride is 1:0.2-5.
本發明之一態樣中,芳香族二胺更包含4,4’-二胺基二苯酮,其中三氮雜苯二元胺與4,4’-二胺基二苯酮之莫爾比為1:0.2-5。另一態樣中,芳香族二胺更包含4,4’-二胺基二苯醚,其中三氮雜苯二元胺與4,4’-二胺基二苯醚之莫爾比為1:0.2-5。In one aspect of the invention, the aromatic diamine further comprises 4,4'-diaminobenzophenone, wherein the molar ratio of the triazabenzene diamine to the 4,4'-diaminobenzophenone It is 1:0.2-5. In another aspect, the aromatic diamine further comprises 4,4'-diaminodiphenyl ether, wherein the molar ratio of the triazabenzene diamine to the 4,4'-diaminodiphenyl ether is 1 : 0.2-5.
與先前技術比較,本發明之聚醯亞胺黏著劑 具有良好的外觀、高耐熱性、高黏結性、高平坦性和透光性好等優點。Compared with the prior art, the polyimine adhesive of the present invention has the advantages of good appearance, high heat resistance, high adhesion, high flatness and good light transmittance.
下面結合具體實施方式對本發明做進一步描述:The present invention is further described below in conjunction with specific embodiments:
本發明係一種聚醯亞胺黏著劑,其係由包含選自四羧酸二酐和芳香族二胺的下列單體之反應物共聚合而成:(a)三氮雜苯二元胺;(b)均苯四羧酸二酐(PMDA);及(c)二胺基二苯醚(ODA),其中,四羧酸二酐和芳香族二胺的重量比為1:0.7-1.3,且三氮雜苯二元胺的含量占胺基組成係小於70%。適用於製備本發明聚醯亞胺黏著劑的三氮雜苯二元胺,例如是3,5二胺基-1,2,4-三氮雜苯(DATA)。The present invention is a polyamidene adhesive which is obtained by copolymerizing a reactant comprising the following monomers selected from the group consisting of tetracarboxylic dianhydride and aromatic diamine: (a) triazabenzene diamine; (b) pyromellitic dianhydride (PMDA); and (c) diaminodiphenyl ether (ODA), wherein the weight ratio of the tetracarboxylic dianhydride to the aromatic diamine is 1:0.7-1.3, And the content of the arsenazo diamine is less than 70% of the amine group. A triazabenzene diamine suitable for use in the preparation of the polyimine adhesive of the present invention is, for example, 3,5-diamino-1,2,4-triazabenzene (DATA).
適用於製備本發明聚醯亞胺黏著劑的三氮雜苯二元胺,例如是2,4-雙(4-胺基苯胺基)-6-苯胺基-1,3,5-三氮雜苯、2,4-雙(3-胺基苯胺基)-6-苯胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-苯甲胺基-1,3,5-三氮雜苯、2,4-雙(3-胺基苯胺基)-6--苯甲胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-萘胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-聯苯胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-聯苯胺基-1,3,5-三氮雜苯、2,4-雙(3-胺基苯胺基)-6-聯苯胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-二苯甲胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-二萘胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-N-甲苯胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-N-甲萘胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-甲胺基-1,3,5-三氮雜苯、2,4-雙(3-胺基苯胺基)-6-甲胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-乙胺基-1,3,5-三氮雜苯、2,4-雙(3-胺基苯胺基)-6-乙胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-二甲胺基-1,3,5-三氮雜苯、2,4-雙(3-胺基苯胺基)-6-二甲胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-二乙胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-二丁胺基-1,3,5-三氮雜苯、2,4-雙(4-胺基苯胺基)-6-胺基-1,3,5-三氮雜苯、2,4-雙(3-胺基苯胺基)-6-胺基-1,3,5-三氮雜苯;及3,5二胺基-1,2,4-三氮雜苯等,其中較佳為3,5二胺基-1,2,4-三氮雜苯。Triazabenzene diamine suitable for use in preparing the polyimine adhesive of the present invention, for example, 2,4-bis(4-aminoanilino)-6-anilino-1,3,5-triaza Benzene, 2,4-bis(3-aminoanilino)-6-anilino-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-benzene Amino-1,3,5-triazabenzene, 2,4-bis(3-aminoanilino)-6--benzylamino-1,3,5-triazabenzene, 2,4 - bis(4-aminoanilino)-6-naphthylamino-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-benzidine-1, 3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-benzidine-1,3,5-triazabenzene, 2,4-bis(3-amino group Anilino)-6-benzidine-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-diphenylmethylamino-1,3,5-tri Azabenzene, 2,4-bis(4-aminoanilino)-6-dinaphthylamino-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)- 6-N-toluidine-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-N-naphthylamino-1,3,5-triazo Heterobenzene, 2,4-bis(4-aminoanilino)-6-methylamino-1,3,5-triazabenzene, 2,4-bis(3-aminoanilino)-6- Methylamino-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-ethylamino-1,3,5 -Triazabenzene, 2,4-bis(3-aminoanilino)-6-ethylamino-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino) -6-dimethylamino-1,3,5-triazabenzene, 2,4-bis(3-aminoanilino)-6-dimethylamino-1,3,5-triazabenzene , 2,4-bis(4-aminoanilino)-6-diethylamino-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-di Butyryl-1,3,5-triazabenzene, 2,4-bis(4-aminoanilino)-6-amino-1,3,5-triazabenzene, 2,4-double (3-aminoanilino)-6-amino-1,3,5-triazabenzene; and 3,5-diamino-1,2,4-triazabenzene, etc., of which 3 is preferred , 5 diamino-1,2,4-triazabenzene.
(實施例1)(Example 1)
在裝有水夾套的500ml反應器中加入溶劑二甲基乙醯胺(DMAC)200ml,以200r/min的轉速均勻攪拌,再緩慢將3,5二胺基-1,2,4-三氮雜苯(DATA)7.50g、二胺基二苯醚(ODA)3.90g和4,4’-二胺基二苯酮6.80g加入反應器中,溫度保持在20℃,攪拌2小時,然後緩慢加入聯二苯四羧酸二酐(BPDA)15.11g和均苯四羧酸二酐(PMDA)16.55g,攪拌速度調至300r/min繼續攪拌,反應3小時後停止。Add 200 ml of the solvent dimethylacetamide (DMAC) to a 500 ml reactor equipped with water jacket, stir evenly at 200 r/min, and slowly add 3,5-diamino-1,2,4-three. 7.50 g of azabenzene (DATA), 3.90 g of diaminodiphenyl ether (ODA) and 6.80 g of 4,4'-diaminobenzophenone were added to the reactor at a temperature of 20 ° C and stirred for 2 hours. 15.11 g of biphenyltetracarboxylic dianhydride (BPDA) and 16.55 g of pyromellitic dianhydride (PMDA) were slowly added, and the stirring speed was adjusted to 300 r/min to continue stirring, and the reaction was stopped after 3 hours.
將上述所得聚醯胺酸溶液塗布在由日礦公司製造,型號為:BHY22BT,厚度為18um的銅箔上,然後在160℃烘烤10分鐘,並且在氮氣保護下分別依次在120℃、160℃、200℃、250℃、300℃及380℃加熱20分鐘,聚醯胺酸可以醯胺化形成聚醯亞胺膜,所製得膜厚度為25um,得到無接著劑軟性銅箔基板。The polylysine solution obtained above was coated on a copper foil manufactured by Nippon Mining Co., Ltd., model: BHY22BT, thickness 18um, and then baked at 160 ° C for 10 minutes, and sequentially under the protection of nitrogen at 120 ° C, 160 After heating at °C, 200 ° C, 250 ° C, 300 ° C and 380 ° C for 20 minutes, the poly-proline can be amidated to form a polyimide film, and the film thickness is 25 μm to obtain a non-adhesive soft copper foil substrate.
(實施例2)(Example 2)
在裝有水夾套的500ml反應器中加入溶劑二甲基乙醯胺(DMAC)200ml,以200r/min的轉速均勻攪拌,再緩慢將3,5二胺基-1,2,4-三氮雜苯(DATA)7.50g、二胺基二苯醚(ODA)3.90g和4,4’-二胺基二苯酮6.80g加入反應器中,溫度保持在20℃,攪拌2小時,然後緩慢加入聯二苯四羧酸二酐(BPDA)24.18g和均苯四羧酸二酐(PMDA)6.58g,攪拌速度調至300r/min繼續攪拌,反應3小時後停止。Add 200 ml of the solvent dimethylacetamide (DMAC) to a 500 ml reactor equipped with water jacket, stir evenly at 200 r/min, and slowly add 3,5-diamino-1,2,4-three. 7.50 g of azabenzene (DATA), 3.90 g of diaminodiphenyl ether (ODA) and 6.80 g of 4,4'-diaminobenzophenone were added to the reactor at a temperature of 20 ° C and stirred for 2 hours. 24.18 g of biphenyltetracarboxylic dianhydride (BPDA) and 6.58 g of pyromellitic dianhydride (PMDA) were slowly added, and the stirring speed was adjusted to 300 r/min to continue stirring, and the reaction was stopped after 3 hours.
將上述所得聚醯胺酸溶液塗布在由日礦公司製造,型號為:BHY22BT,厚度為18um的銅箔上,然後在160℃烘烤10分鐘,並且在氮氣保護下分別依次在120℃、160℃、200℃、250℃、300℃及380℃加熱20分鐘,聚醯胺酸可以醯胺化形成聚醯亞胺膜,所製得膜厚度為25um,得到無接著劑軟性銅箔基板。The polylysine solution obtained above was coated on a copper foil manufactured by Nippon Mining Co., Ltd., model: BHY22BT, thickness 18um, and then baked at 160 ° C for 10 minutes, and sequentially under the protection of nitrogen at 120 ° C, 160 After heating at °C, 200 ° C, 250 ° C, 300 ° C and 380 ° C for 20 minutes, the poly-proline can be amidated to form a polyimide film, and the film thickness is 25 μm to obtain a non-adhesive soft copper foil substrate.
(實施例3)(Example 3)
在裝有水夾套的500ml反應器中加入溶劑二甲基乙醯胺(DMAC)200ml,以200r/min的轉速均勻攪拌,再緩慢將3,5二胺基-1,2,4-三氮雜苯(DATA)7.50g、二胺基二苯醚(ODA)3.90g和4,4’-二胺基二苯酮6.80g加入反應器,溫度保持20℃不變,攪拌2小時,然後緩慢加入二苯酮四羧酸二酐(BTDA)18.00g和均苯四羧酸二酐(PMDA)6.58g,攪拌速度調至300r/min繼續攪拌,反應3小時後停止。Add 200 ml of the solvent dimethylacetamide (DMAC) to a 500 ml reactor equipped with water jacket, stir evenly at 200 r/min, and slowly add 3,5-diamino-1,2,4-three. 7.50 g of azabenzene (DATA), 3.90 g of diaminodiphenyl ether (ODA) and 6.80 g of 4,4'-diaminobenzophenone were added to the reactor, the temperature was kept at 20 ° C, stirred for 2 hours, then 18.00 g of benzophenonetetracarboxylic dianhydride (BTDA) and 6.58 g of pyromellitic dianhydride (PMDA) were slowly added, and the stirring speed was adjusted to 300 r/min to continue stirring, and the reaction was stopped after 3 hours.
將上述所得聚醯胺酸溶液塗布在由日礦公司製造,型號為:BHY22BT,厚度為18um的銅箔上,然後在160℃烘烤10分鐘,並且在氮氣保護下分別依次在120℃、160℃、200℃、250℃、300℃及380℃加熱20分鐘,聚醯胺酸可以醯胺化形成聚醯亞胺膜,所製得膜厚度為25um,得到無接著劑軟性銅箔基板。The polylysine solution obtained above was coated on a copper foil manufactured by Nippon Mining Co., Ltd., model: BHY22BT, thickness 18um, and then baked at 160 ° C for 10 minutes, and sequentially under the protection of nitrogen at 120 ° C, 160 After heating at °C, 200 ° C, 250 ° C, 300 ° C and 380 ° C for 20 minutes, the poly-proline can be amidated to form a polyimide film, and the film thickness is 25 μm to obtain a non-adhesive soft copper foil substrate.
(實施例4)(Example 4)
在裝有水夾套的500ml反應器中加入溶劑二甲基乙醯胺(DMAC)200ml,以200r/min的轉速勻速攪拌,再緩慢將3,5二胺基-1,2,4-三氮雜苯(DATA)4.65g、二胺基二苯醚(ODA)2.15g和4,4’-二胺基二苯酮21.62g加入反應器,溫度保持20℃不變,攪拌2h,然後緩慢加入二苯酮四羧酸二酐(BTDA)18.04g和均苯四羧酸二酐(PMDA)6.66g,攪拌速度調至300r/min繼續攪拌,反應3h後停止。Add 200 ml of the solvent dimethylacetamide (DMAC) to a 500 ml reactor equipped with water jacket, stir at 200 r/min, and slowly add 3,5-diamino-1,2,4-three. Azabenzene (DATA) 4.65g, diaminodiphenyl ether (ODA) 2.15g and 4,4'-diaminobenzophenone 21.62g were added to the reactor, the temperature was kept at 20 ° C, stirred for 2h, then slowly 18.04 g of benzophenonetetracarboxylic dianhydride (BTDA) and 6.66 g of pyromellitic dianhydride (PMDA) were added, and the stirring speed was adjusted to 300 r/min to continue stirring, and the reaction was stopped after 3 hours.
將上述所得聚醯胺酸溶液塗布在由日礦公司製造,型號為:BHY22BT,厚度為18um的銅箔上,然後在160℃烘烤10分鐘,並且在氮氣保護下分別依次在120℃、160℃、200℃、250℃、300℃及380℃加熱20min,聚醯胺酸可以醯胺化形成聚醯亞胺膜,所製得膜厚度為25um,得到無接著劑軟性銅箔基板。The polylysine solution obtained above was coated on a copper foil manufactured by Nippon Mining Co., Ltd., model: BHY22BT, thickness 18um, and then baked at 160 ° C for 10 minutes, and sequentially under the protection of nitrogen at 120 ° C, 160 After heating at °C, 200 °C, 250 °C, 300 °C and 380 °C for 20 min, the polylysine can be amidated to form a polyimide film, and the film thickness is 25 μm, and a non-adhesive soft copper foil substrate is obtained.
(實施例5)(Example 5)
在裝有水夾套的500ml反應器中加入溶劑二甲基乙醯胺(DMAC)200ml,以200r/min的轉速均勻攪拌,再緩慢將3,5二胺基-1,2,4-三氮雜苯(DATA)10.35g和二胺基二苯醚(ODA)2.15g加入反應器,溫度保持在20℃,攪拌2小時,然後緩慢加入聯二苯四羧酸二酐(BPDA)24.18g和均苯四羧酸二酐(PMDA)6.58g,攪拌速度調至300r/min繼續攪拌,反應3小時後停止。Add 200 ml of the solvent dimethylacetamide (DMAC) to a 500 ml reactor equipped with water jacket, stir evenly at 200 r/min, and slowly add 3,5-diamino-1,2,4-three. Azabenzene (DATA) 10.35g and diaminodiphenyl ether (ODA) 2.15g were added to the reactor, the temperature was kept at 20 ° C, stirred for 2 hours, then slowly added biphenyltetracarboxylic dianhydride (BPDA) 24.18g And 6.58 g of pyromellitic dianhydride (PMDA), the stirring speed was adjusted to 300 r / min, stirring was continued, and the reaction was stopped after 3 hours.
將上述所得聚醯胺酸溶液塗布在由日礦公司製造,型號為:BHY22BT,厚度為18um的銅箔上,然後在160℃烘烤10分鐘,並且在氮氣保護下分別依次在120℃、160℃、200℃、250℃、300℃及380℃加熱20分鐘,聚醯胺酸可以醯胺化形成聚醯亞胺膜,所製得膜厚度為25um,得到無接著劑軟性銅箔基板。The polylysine solution obtained above was coated on a copper foil manufactured by Nippon Mining Co., Ltd., model: BHY22BT, thickness 18um, and then baked at 160 ° C for 10 minutes, and sequentially under the protection of nitrogen at 120 ° C, 160 After heating at °C, 200 ° C, 250 ° C, 300 ° C and 380 ° C for 20 minutes, the poly-proline can be amidated to form a polyimide film, and the film thickness is 25 μm to obtain a non-adhesive soft copper foil substrate.
(實施例6)(Example 6)
在裝有水夾套的500ml反應器中加入溶劑二甲基乙醯胺(DMAC)200ml,以200r/min的轉速均勻攪拌,緩慢將3,5二胺基-1,2,4-三氮雜苯(DATA)9.20g、和 4,4’-二胺基二苯酮3.70g加入反應器,溫度保持在20℃,攪拌2小時,然後緩慢加入二苯酮四羧酸二酐(BTDA)18.00g和均苯四羧酸二酐(PMDA)6.58g,攪拌速度調至300r/min繼續攪拌,反應3小時後停止。In a 500 ml reactor equipped with a water jacket, 200 ml of the solvent dimethylacetamide (DMAC) was added, and the mixture was uniformly stirred at a rate of 200 r/min, and 3,5-diamino-1,2,4-triazo was slowly added. 1.00 g of benzene (DATA) 9.20 g and 3.70 g of 4,4'-diaminobenzophenone were added to the reactor at a temperature of 20 ° C, stirred for 2 hours, and then benzophenone tetracarboxylic dianhydride (BTDA) was slowly added. 18.00 g and 6.58 g of pyromellitic dianhydride (PMDA) were stirred at a stirring speed of 300 r/min, and the reaction was stopped after 3 hours.
將上述所得聚醯胺酸溶液塗布在由日礦公司製造,型號為:BHY22BT,厚度為18um的銅箔上,然後在160℃烘烤10分鐘,並且在氮氣保護下分別依次在120℃、160℃、200℃、250℃、300℃及380℃加熱20分鐘,聚醯胺酸可以醯胺化形成聚醯亞胺膜,所製得膜厚度為25um,得到無接著劑軟性銅箔基板。The polylysine solution obtained above was coated on a copper foil manufactured by Nippon Mining Co., Ltd., model: BHY22BT, thickness 18um, and then baked at 160 ° C for 10 minutes, and sequentially under the protection of nitrogen at 120 ° C, 160 After heating at °C, 200 ° C, 250 ° C, 300 ° C and 380 ° C for 20 minutes, the poly-proline can be amidated to form a polyimide film, and the film thickness is 25 μm to obtain a non-adhesive soft copper foil substrate.
(測定方法)(test methods)
對實施例1至實施例6中各無接著劑軟性銅箔基板進行測定,具體的測定方法如下:1.剝離強度,按照IPC-TM-6502.4.9方法測試剝離強度,通過如下方式:將無接著劑軟性銅箔基板蝕刻成0.375mm寬的線路,在常溫下與聚醯亞胺膜表面成90度角的方向上測量銅箔以50mm/min的速度剝離所需最小的力,用該力除於0.375可得出剝離強度的值;2.焊接耐熱性,按照IPC-TM-650 2.4.13方法測試焊接耐熱性,將無接著劑軟性銅箔基板裁成5cm×5cm樣品,在400℃焊條浴浸10秒,觀察是否分層來判斷;3.捲曲外觀,按照IPC-TM-650 2.4.22方法測試蝕刻前後的捲曲,將無接著劑軟性銅箔基板裁成25cm×25cm樣品,樣品貼放在豎直平面上,用尺測量四角翹起的距離,得到的四個數值相加,除於得出捲曲值判斷捲曲情況,小於9cm即視為平整。上述測試結果見表1。Each of the non-adhesive soft copper foil substrates of Examples 1 to 6 was measured. The specific measurement method was as follows: 1. Peel strength, and the peel strength was tested according to the IPC-TM-6502.4.9 method by the following manner: The soft copper foil substrate is then etched into a 0.375 mm wide line, and the minimum force required to peel the copper foil at a speed of 50 mm/min is measured at a temperature of 90 degrees from the surface of the polyimide film at normal temperature, and the force is used. Except for 0.375, the peel strength value can be obtained; 2. Solder heat resistance, solder heat resistance is tested according to IPC-TM-650 2.4.13 method, and the adhesive-free soft copper foil substrate is cut into 5 cm × 5 cm sample at 400 ° C The electrode was immersed in the bath for 10 seconds to observe whether it was layered or not. 3. Curl appearance, the curl before and after etching was tested according to the IPC-TM-650 2.4.22 method, and the non-adhesive soft copper foil substrate was cut into 25 cm × 25 cm samples. Place it on a vertical plane and measure the distance between the four corners with a ruler. The four values obtained are added together, and the curl value is judged to be the curl value. If it is less than 9 cm, it is considered to be flat. The above test results are shown in Table 1.
表1Table 1
表1中BPDA:聯二苯四羧酸二酐;BTDA:二苯酮四羧酸二酐;PMDA:均苯四羧酸二酐;DATA:三氮雜苯二元胺;ODA:二胺基二苯醚。表1為各實施例中各組分含量以及各實施例中無接著劑軟性銅箔基板的性能。從表1中資料可見,本發明產品具有良好的外觀、高耐熱性、高黏結性、高平坦性和透光性好等優點。Table 1 BPDA: biphenyltetracarboxylic dianhydride; BTDA: benzophenone tetracarboxylic dianhydride; PMDA: pyromellitic dianhydride; DATA: triazabenzene diamine; ODA: diamine Diphenyl ether. Table 1 shows the contents of the respective components in the respective examples and the properties of the non-adhesive soft copper foil substrate in each of the examples. It can be seen from the data in Table 1 that the product of the invention has the advantages of good appearance, high heat resistance, high adhesion, high flatness and good light transmission.
以上所述僅為本發明之較佳實施例,非用以限定本發明之專利範圍,其他運用本發明之專利精神之等效變化,均應俱屬本發明之專利範圍。The above is only the preferred embodiment of the present invention, and is not intended to limit the scope of the invention, and other equivalent variations of the patent spirit of the present invention are all within the scope of the invention.
無no
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102131403A TW201508040A (en) | 2013-08-30 | 2013-08-30 | Polyimide adhesive |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW102131403A TW201508040A (en) | 2013-08-30 | 2013-08-30 | Polyimide adhesive |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201508040A true TW201508040A (en) | 2015-03-01 |
Family
ID=53186093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102131403A TW201508040A (en) | 2013-08-30 | 2013-08-30 | Polyimide adhesive |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW201508040A (en) |
-
2013
- 2013-08-30 TW TW102131403A patent/TW201508040A/en unknown
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI716524B (en) | Copper clad laminate and printed circuit board | |
JP4634439B2 (en) | Metal laminate and manufacturing method thereof | |
JP5019874B2 (en) | Thermosetting resin composition, laminated body using the same, and circuit board | |
TWI500501B (en) | Second layer double sided flexible metal laminated board and manufacturing method thereof | |
KR102694527B1 (en) | Metal-clad laminate and circuit board | |
TW200536443A (en) | Heat-resistant resin laminate film, laminate film with metal layer using the same, and semiconductor device | |
WO2006112523A1 (en) | Polyimide film laminate | |
TW201805337A (en) | Polyimide, polyimide-based adhesive, film-like adhesive material, adhesive layer, adhesive sheet, copper foil with resin, copper-clad laminate and printed wiring board, and multilayer wiring board and method for manufacturing the same | |
TWI405792B (en) | A polyimide film having a high adhesion property and a method for producing the same | |
JPH091723A (en) | Heat resisting bonding sheet | |
TW200930565A (en) | Metal-clad laminate | |
TW202337695A (en) | Metal-clad laminate, circuit board, multilayer circuit board and method of manufacturing the same excellent in dimensional stability of a conductor circuit | |
TWI413460B (en) | Laminate for wiring board | |
TWI804658B (en) | Metal-clad laminates and circuit boards | |
TWI249563B (en) | Novel polyimide copolymer and metal laminate comprising the same | |
JP4426774B2 (en) | Thermosetting resin composition, laminated body using the same, and circuit board | |
JPWO2020022129A5 (en) | ||
JP2007281361A (en) | Polyimide printed circuit board and polyimide printed wiring board | |
CN106795284B (en) | Polyimide copolymer and molded body using same | |
JP5547874B2 (en) | Polyimide resin | |
JP2008303372A (en) | Polyimide precursor having asymmetric structure, polyimide, and their production methods | |
JP2009299009A (en) | Polyamic acid varnish composition, polyimide resin, and metal-polyimide complex | |
KR20090013921A (en) | Polyimide film for electronic device component | |
JP2729063B2 (en) | Method of manufacturing flexible metal foil laminate | |
JP2007189011A (en) | Substrate for flexible printed wiring board and its production process |