TW201505198A - Pattern forming apparatus and pattern forming method - Google Patents

Abstract

The pattern forming apparatus of the present invention includes at least one of airflow blowing equipment (1C) and pattern shaping equipment, in which the shape of a pattern (LP) is controlled by air. The airflow blowing equipment (1C) is corresponding to at least one of ejecting start and ejecting stop of coating liquid, so as to eject air toward the surface of a substrate (W) at the upstream side of a first direction X relative to a position (P1) which the coating liquid is supplied to the substrate (W), and blow airflow AF to a liquid flow of the coating liquid in the middle of an ejecting outlet (21) of a coating liquid spray nozzle (2) and a surface of the substrate (W). The pattern shaping equipment is provided to eject air to the pattern (LP) formed on the surface of the substrate (W) in a pulsed manner so as to perform the shaping.

Description

Pattern forming device and pattern forming method

The present invention relates to a pattern forming technique for forming a pattern by linearly supplying a coating liquid from a coating liquid nozzle to a substrate that relatively moves with respect to a coating liquid nozzle.

As a device to which such a pattern forming technique is applied, for example, a pattern forming device in which a line pattern such as a wiring pattern is formed on a substrate for a solar cell element is known. In the pattern forming apparatus, while the substrate is moved in a specific direction, the supply of the coating liquid (electrode paste) is started from the coating liquid nozzle that is fixedly disposed while the substrate is moving, and then the supply of the coating liquid is stopped. Thereby, a linear pattern having a length corresponding to the supply duration is formed on the surface of the substrate. The beginning and the end of the line pattern thus formed sometimes cause the following problems. That is, at the beginning of the line pattern, the end portion of the line is deformed into a spherical shape. Further, a tail (drawing) of the coating liquid is generated at the wire terminal. In particular, in order to form a wiring pattern, it is tens [pa.] when it has a high viscosity, for example, a shear rate of 1 [s ^-1 ]. s (Pascal seconds)] ~ hundreds [Pa. The electrode paste of s] is an important issue.

Therefore, in order to eliminate such problems, a technique described in, for example, Japanese Laid-Open Patent Publication No. SHO-62-183584 is proposed. That is, the proposed technique suppresses the generation of the smear by injecting air from the air nozzle.

In the apparatus described in Japanese Laid-Open Patent Publication No. SHO-62-183584, the glue (corresponding to the "coating liquid" of the present invention) ejected from the glue nozzle is applied to the paperboard conveyed by the conveyor belt. And the pressurized air is ejected in a direction orthogonal to the flow of the glue. By this air flow, it is possible to suppress the occurrence of smear. However, the direction of the pressurized air is in the same direction as the direction of movement of the cardboard, and the glue blown by the pressurized air scatters to contaminate the cardboard and the device. Moreover, it is completely ineffective for the technical problem that the end portion of the wire is deformed into a spherical shape.

Further, one of the important properties of the pattern forming device is that the pattern formed on the substrate is finally processed into a desired shape. Therefore, a technique of shaping the pattern into a desired shape after forming a pattern on the substrate is required.

The present invention has been made in view of the above problems, and an object thereof is to provide a pattern forming technique capable of forming a line pattern in a good shape on a substrate.

A pattern forming apparatus according to an aspect of the present invention is characterized in that a pattern is formed on a surface of a substrate by a linear coating liquid which is a discharge port of a coating liquid nozzle. Dissipating the surface of the substrate that is relatively moved in the first direction with respect to the coating liquid nozzle, the pattern forming device including at least one of an airflow blowing device and a pattern shaping device, wherein the airflow blowing device corresponds to the coating At least one of the discharge start of the discharge liquid and the discharge stoppage, the gas is ejected toward the surface of the substrate on the upstream side in the first direction with respect to the supply position of the coating liquid to the coating liquid nozzle. a flow of the liquid to the coating liquid is blown between the discharge port and the surface of the substrate; the pattern shaping device injects and shapes the pattern on the surface of the substrate in a pulsed manner; and is controlled by the gas The shape of the pattern.

Further, in another aspect of the present invention, a pattern forming method is characterized in that a pattern is formed on a surface of a substrate by a linear coating liquid, and the linear coating liquid is applied from a coating liquid nozzle. The second ejection port is ejected onto the surface of the substrate that relatively moves in the first direction with respect to the coating liquid nozzle, and the pattern forming method performs at least one of the following steps And controlling the shape of the pattern in one step: the first step is to correspond to at least one of a discharge start and a discharge stop of the coating liquid, and to face the first position with respect to a supply position of the coating liquid to the substrate a gas is ejected from a surface of the substrate on the upstream side of the direction, and a flow of the liquid is blown to the liquid of the coating liquid between the second discharge port of the coating liquid nozzle and the surface of the substrate; and the second step is to form a pair The pattern on the surface of the above substrate is pulsed to eject and shape the gas.

In the invention thus constituted, the shape of the pattern is controlled by performing at least one of a flow of the liquid to the coating liquid and a patterning of the gas by patterning the pattern on the substrate.

Here, in the middle of the discharge port of the coating liquid nozzle and the surface of the substrate, the supply of the gas flow to the liquid flow of the coating liquid acts to connect the coating hydraulic pressure to the substrate, and does not cause the coating liquid. The scattering may be performed by supplying a gas flow to the liquid flow of the coating liquid in accordance with at least one of the discharge start and the discharge stop of the coating liquid. For example, by supplying the gas flow in accordance with the start of the discharge of the coating liquid, it is possible to suppress the start of the linear pattern from becoming spherical, and to supply the gas flow in response to the discharge of the coating liquid, thereby suppressing the line type. The terminal of the pattern produces a trailing tail.

On the other hand, when the gas formed on the substrate is pulsed and pressurized, the portion of the pattern that is pressurized is shaped by being attached to the substrate. Here, "pulsing the gas in a pulse shape" means that the gas is ejected and the ejection is stopped repeatedly, and the pattern is shaped so as not to cause a pattern defect. That is, as described in detail below, when the gas is continuously ejected continuously, the portion of the pattern that is subjected to the pressure of the gas scatters, causing pattern defects. On the other hand, by injecting the gas in a pulsed manner, the portion subjected to the pressure of the gas is not scattered around, and the pattern can be shaped.

According to the present invention, a line pattern can be formed in a good shape on a substrate.

1‧‧‧ pattern forming device

1A, 200‧‧‧ platform mobile agencies (mobile devices)

1B‧‧‧ Coating liquid ejection device

1C‧‧‧ gas ejection device (airflow blowing device)

1D‧‧‧pattern shaping device (pattern shaping equipment)

2‧‧‧ Coating liquid nozzle

3‧‧‧Nozzle group

4, 560‧‧‧ coating liquid discharge control department

5‧‧‧Support block

6‧‧‧Upper holder

7‧‧‧Bottom holder

8‧‧‧ Coating Liquid Supply Department

21, P1~P3, P24~P26‧‧‧ (coating liquid nozzle) spray outlet

22‧‧‧ Coating Liquid Storage Department

23‧‧‧ Coating liquid flow path

23D‧‧‧ downstream side flow path

23U‧‧‧ upstream side flow path

24‧‧‧ openings

31, 422‧‧‧through holes

41‧‧‧Rotary drive department

42‧‧‧Rotary axis

43, 44‧‧‧ Sealing members

45, 46‧‧‧ ball bearings

47‧‧‧ spacers

51‧‧‧Introduction hole

61‧‧‧Caps

62‧‧‧Cylinder components

110, 160‧‧‧ nozzle holder

120‧‧‧(1) gas nozzle

130‧‧‧(1) Gas Supply Department

131‧‧‧Continuous blowing system (2nd supply system)

131a, 132a, 181a‧‧‧ piping

131b, 132b, 181b‧‧‧ adjusters

131c, 132c, 181c‧‧ needles

131d, 132d, 181d‧‧‧ drive open and close valves

132‧‧‧Pulse blowing system (1st supply system)

140‧‧‧Valve Control Unit (Gas Supply Control Unit)

150‧‧‧pulse drive unit (gas supply control unit)

170‧‧‧(2nd) gas nozzle

171‧‧‧Spray outlet

180‧‧‧(2nd) gas supply unit

181‧‧‧Pulse blowing system

210‧‧‧X direction moving mechanism

211, 221, 231‧ ‧ motor

212‧‧‧Rolling screw

213‧‧‧ nuts

214, 224‧ ‧ rails

220‧‧‧Y direction moving mechanism

221‧‧‧ platform lifting mechanism

230‧‧‧θ rotating mechanism

240‧‧‧ platform lifting mechanism

300‧‧‧ platform

411‧‧‧Micro electric motor

412‧‧‧Reducer

413‧‧‧Encoder

421‧‧‧Flow Adjustment Department

423‧‧‧ Groove

424‧‧‧Non-groove

500‧‧‧Coating head

510‧‧‧Base

520‧‧‧ Coating Liquid Supply Department

521‧‧‧Syringe pump

524‧‧‧Plunger

530‧‧‧Lighting section (pattern hardening section)

531‧‧‧ fiber optic

532‧‧‧Light source unit

550‧‧‧Nozzle set

551‧‧‧Spray outlet

560‧‧‧ Coating Liquid Discharge Control Department

600‧‧‧Control Department

710‧‧‧Abutment

721‧‧‧Frame

800‧‧‧ gas ejection device

AF‧‧‧air flow (airflow)

B‧‧‧ bus bar wiring pattern

C‧‧‧ center axis

Fluid flow of CF‧‧‧ coating liquid

CPd‧‧‧ downstream side intersection

CPu‧‧‧ upstream intersection

D2‧‧‧Spray direction (2nd direction)

D3‧‧‧jet direction (3rd direction)

ER‧‧‧ end area

F‧‧‧ finger wiring pattern

Fe, Fr‧‧‧ electrode pattern (line pattern)

H1, H2‧‧‧ height

L12‧‧‧ length

LP‧‧‧Line pattern

The beginning of LPa‧‧‧ (the Department of Plastic Surgery)

LPb‧‧‧ Terminal Department (Organized Department)

P‧‧‧Orientation

PS1‧‧‧ (coating solution) supply location

PS2‧‧‧ (air) supply location

Q‧‧‧Spoke direction

R‧‧‧axis direction

RR‧‧‧Rectangular area

S‧‧‧ solar battery unit

S101~S110‧‧‧Steps

T1, T2, T3, T4‧‧‧ timing

W‧‧‧Substrate

W1‧‧‧ upstream intersection point CPu and downstream side intersection point CPd distance

W2‧‧‧The outer diameter of the width direction P of the rotating shaft 42

Wn‧‧‧Width of groove part 423

X‧‧‧Moving direction (1st direction)

Y, Z‧‧‧ direction

△T12, △T34‧‧‧ time

Fig. 1A and Fig. 1B are views showing the appearance of a first embodiment of the pattern forming apparatus of the present invention.

Fig. 2 is a cross-sectional view showing a coating liquid ejecting apparatus provided in the pattern forming apparatus.

Fig. 3 is a cross-sectional view taken along line B-B of the coating liquid discharge device.

4A to 4D are views schematically showing the discharge control operation of the coating liquid discharge device.

Fig. 5 is a view schematically showing the configuration of a gas ejection device provided in the pattern forming apparatus.

6A and 6B are timing charts showing the operation of the pattern forming apparatus shown in Fig. 1A.

Fig. 7 is a view schematically showing the configuration of a gas discharge device provided in a second embodiment of the pattern forming apparatus of the present invention.

Fig. 8 is a timing chart showing an example of the operation of the pattern forming apparatus shown in Fig. 7.

Fig. 9 is a timing chart showing another example of the operation of the pattern forming apparatus shown in Fig. 7.

Fig. 10 is a view schematically showing the configuration of a gas discharge device provided in a third embodiment of the pattern forming apparatus of the present invention.

Fig. 11 is a timing chart showing the operation of the third embodiment of the pattern forming apparatus.

Fig. 12 is a view showing a fourth embodiment of the pattern forming apparatus of the present invention.

Fig. 13 is a timing chart showing the operation of the pattern forming apparatus when patterning is performed without using a pattern shaping device.

Fig. 14 is a timing chart showing the operation of the pattern forming apparatus when patterning is performed using the pattern shaping device.

Fig. 15 is a view schematically showing changes in the shape of the start end portion and the end portion of the pattern as a function of the pulse width of the gas jet.

Fig. 16 is a view showing a fifth embodiment of the pattern forming apparatus of the present invention.

Fig. 17 is a timing chart showing the operation of the pattern forming apparatus shown in Fig. 16.

Fig. 18 is a timing chart showing the operation of the sixth embodiment of the pattern forming apparatus.

Fig. 19 is a view showing the operation of the seventh embodiment of the pattern forming apparatus equipped with the pattern shaping device of the present invention.

Fig. 20 is a view showing an eighth embodiment of the pattern forming apparatus of the present invention.

Fig. 21 is a view showing an example of a solar battery cell formed using the pattern forming device of Fig. 20.

Fig. 22 is a view schematically showing a state in which the finger electrodes are formed by the apparatus of Fig. 20.

Fig. 23 is a flow chart showing the pattern forming process of the eighth embodiment.

<First embodiment>

Fig. 1A and Fig. 1B are views showing the appearance of a first embodiment of the pattern forming apparatus of the present invention. In more detail, FIG. 1A is a perspective view of a patterning device, and FIG. 1B is a side view of the patterning device. The pattern forming apparatus 1 is a device for applying a coating liquid containing a material for forming a pattern, for example, an electrode paste, on a substrate, which can be applied to, for example, forming a wiring pattern on a substrate having a photoelectric conversion surface to manufacture photoelectric conversion. The technology of components.

The pattern forming apparatus 1 includes a stage moving mechanism (symbol 1A in FIG. 5) for moving the substrate W in the X direction, and a coating liquid which ejects four coating liquids in a line shape in the substrate W moving in the X direction. The apparatus 1B; and a gas discharge device 1C that supplies an air flow to the liquid flow of each coating liquid. Further, on the one hand, the stage moving mechanism 1A moves the substrate W at a specific moving speed in the X direction, and on the other hand, the coating liquid ejecting apparatus 1B ejects the coating liquid at a discharge speed equal to the above moving speed, thereby maximizing the substrate W. Four line patterns can be formed. Hereinafter, the configuration of the coating liquid discharge device 1B and the gas discharge device 1C will be described, and the operation of the pattern forming device 1 will be described.

The coating liquid discharge device 1B includes a plurality of nozzle groups 3 in which four coating liquid nozzles 2 are integrally held. That is, in the multi-string nozzle group 3, the four coating liquid nozzles 2 are arranged in a row, and the discharge ports 21 of the respective coating liquid nozzles 2 are exposed in a row to the plurality of nozzle groups 3 in the arrangement direction. surface. Further, each of the coating liquid nozzles 2 is provided with a coating liquid discharge control unit 4 that controls the discharge of the coating liquid from the discharge port 21, and the four coating liquid discharge control units 4 are independently operated to control the self-coating. The coating liquid that is pressure-fed by the liquid supply unit 8 is ejected from each of the ejection ports 21. In the present embodiment, the direction in which the coating liquid nozzles 2 are arranged is referred to as "arrangement direction P", and the direction in which the coating liquid from the respective ejection ports 21 is ejected is referred to as "discharge direction Q". The direction in which the direction P and the discharge direction Q intersect at right angles is referred to as "cross direction R".

Fig. 2 is a cross-sectional view taken along line A-A of the coating liquid ejecting apparatus shown in Fig. 1B and parallel to the plane of Fig. 1B, and Fig. 3 is a cross-sectional view taken along line B-B of the coating liquid ejecting apparatus shown in Fig. 1B. 4A to 4D are views schematically showing the discharge control operation of the coating liquid discharge device shown in Figs. 1A and 1B. The coating liquid discharge device 1B includes a plurality of nozzle groups 3 that integrally hold four coating liquid nozzles 2, four coating liquid discharge control units 4, and a rotation driving unit 41 that supports the coating liquid discharge control unit 4. Supporting block 5; squeezing from the upper side (+R direction side) to hold the component upper retainer 6 of the coating liquid discharge control unit 4 mounted on the multi-string nozzle group 3; and from the lower side (-R direction) The lower side holder 7 of the constituent parts of the coating liquid discharge control portion 4 is held while being pressed.

In the multi-string nozzle group 3, as shown in FIG. 3, a rectangular parallelepiped space extending in the arrangement direction P is provided at the (-Q) side end portion, and functions as a coating liquid storage portion 22, and the coating liquid is stored. The portion 22 temporarily stores the coating liquid that is pressure-fed from the coating liquid supply portion 8 (FIG. 1B) through the introduction hole 51 provided at the lower end portion of the support block 5. The coating liquid storage unit 22 has four coating liquid nozzles 2 having the same shape arranged in a row at equal intervals (in the present embodiment, at intervals of 2 [mm]) in the arrangement direction P. Each of the coating liquid nozzles 2 is extended in the discharge direction, that is, in the (+Q) direction, and the tip end portion thereof is connected to the (+Q) side end surface of the plurality of nozzle groups 3 to be the discharge port 21. Therefore, the cylindrical space having a substantially elliptical cross section from the rectangular parallelepiped space portion 22 to the discharge port 21 in the inside of the coating liquid nozzle 2 functions as the coating liquid flow path 23, and is stored in the coating liquid storage portion 22. The coating liquid is guided to the discharge port 21. So in this embodiment In the middle, the coating liquid which is sent out by the coating liquid storage unit 22 is distributed to the four coating liquid nozzles 2 and guided.

In each of the coating liquid nozzles 2, as shown in FIG. 2, one opening 24 is formed in each of the upper side (+R direction side) and the lower side (-R direction side) of the intermediate position of the coating liquid flow path 23. In the present embodiment, in order to prevent the coating liquid discharge control portions 4 adjacent to each other from interfering with each other, the position at which the opening 24 is provided is divided into two stages. In other words, as shown in FIG. 3, the opening 24 is placed close to the coating liquid storage portion 22 with respect to the coating liquid nozzle 2 of the nozzle number "1" and the nozzle number "3" closest to the (+P) side. On the other hand, the coating liquid nozzle 2 closest to the nozzle number "4" on the (-P) side and the nozzle number "2" is provided at a position close to the discharge port 21. In this way, the openings 24 formed in each of the two coating liquid nozzles 2 adjacent to each other are formed at positions different from each other in the discharge direction Q orthogonal to the arrangement direction P. Further, in the multi-string nozzle group 3, the through hole 31 is provided from the upper side opening 24 of the coating liquid nozzle 2 upward (+R direction) and downward (-R direction) from the lower opening 24. The through holes 31 are used to provide various components (the rotating shaft 42, the sealing members 43, 44, and the ball bearings 45 and 46) of the coating liquid discharge control unit 4 described below, and the inner diameter thereof is set to be wider than the opening 24. . Moreover, the diameter (shaft diameter) of each of the openings 24 and the rotating shaft 42 of the coating liquid discharge control unit 4 is the same size, and is also set to be wider than the width of the coating liquid flow path 23 in the arrangement direction P.

Each of the coating liquid discharge control units 4 includes a rotation shaft 42 that extends in the intersecting direction R. In the present embodiment, a stainless steel rod having a shaft shape having a diameter of 1 [mm] is used as the rotating shaft 42. The front end portion of the rotating shaft 42 , that is, the (-R) side end portion is inserted into the through hole 31 , and further penetrates the coating liquid nozzle 2 through the two openings 24 .

A portion of the front end portion of the rotating shaft 42 between the two openings 24 (hereinafter referred to as "flow rate adjusting portion 421") is inserted into the coating liquid flow path 23 of the coating liquid nozzle 2. Further, as shown in FIG. 3, the diameter of the flow rate adjusting portion 421 is also wider than the width of the arrangement direction P of the coating liquid flow path 23, so that the flow rate adjusting portion 421 divides the coating liquid flow path 23 into the upstream side flow path. 23U and downstream side flow path 23D. Here, in the flow rate adjustment unit 421, the side of the rotating shaft 42 is placed The groove portion 423 is formed by cutting the surface, and the groove portion 423 can guide the coating liquid in the (+Q) direction. More specifically, as shown in FIG. 2, the groove portion 423 has the same or a higher height H1 than the coating liquid flow path 23 in the direction in which the rotating shaft 42 intersects with the coating liquid flow path 23 (axial direction R). Low height H2. Moreover, the width direction P orthogonal to the axial direction R and the flow path direction Q has the following dimensional relationship. That is, as shown in FIG. 4A, the distance between the "upstream side intersection point CPu" and the "downstream side intersection point CPd" is set to "W1". Moreover, the outer diameter of the width direction P of the rotating shaft 42 is set to "W2". Then, when the width Wn of the groove portion 423 satisfies W1 < Wn < W2, it can be turned on/off every 90 degrees. Therefore, by rotating the rotating shaft 42, the communication state between the upstream side flow path 23U and the downstream side flow path 23D can be controlled in multiple stages.

FIG. 4A shows a state in which the rotating shaft 42 is positioned in a state in which the groove portion 423 faces the downstream side flow path 23D. Here, the portion where the groove portion 423 is not provided, that is, the non-groove portion 424 is directed toward the upstream side flow path 23U, and the coating liquid flow path 23 is blocked. Therefore, the upstream side flow path 23U and the downstream side flow path 23D are blocked, and the discharge of the coating liquid from the discharge port 21 is turned off. When the rotating shaft 42 is rotated counterclockwise from this state on the sheet surface, the coating liquid flow path 23 is blocked to a fixed angle, but if the angle is exceeded, the upstream side flow path 23U and the downstream side flow are started. When the path 23D is connected, the coating liquid flows through the coating liquid flow path 23 and is ejected from the ejection port 21 (see FIG. 3) (on state). When the rotating shaft 42 is further rotated, the ratio of the communication gradually increases, and if the rotation angle reaches 90°, the ratio of the communication as shown in FIG. 4B becomes maximum.

When the rotating shaft 42 is further rotated counterclockwise on the plane of the drawing, the ratio of the communication gradually decreases, and the upstream side flow path 23U and the downstream side flow path 23D are again blocked, and the coating from the discharge port 21 is again applied. The discharge of the liquid is turned off. For example, when the rotation shaft 42 is rotated by 180° from the state of FIG. 4A, the groove portion 423 is in a state of being oriented toward the upstream side flow path 23U, and the non-groove portion 424 is directed toward the downstream side flow path 23D to block the coating liquid flow path 23 (eg Figure 4C). Therefore, the upstream side flow path 23U and the downstream side flow path 23D are blocked, and the discharge of the coating liquid from the discharge port 21 is turned off. When the rotating shaft 42 is further rotated from the state to the counterclockwise direction on the sheet surface, the coating liquid flow path 23 is blocked to a fixed angle. When the angle is exceeded, the upstream side flow path 23U and the downstream side flow path 23D are started to communicate with each other, and the coating liquid flows through the coating liquid flow path 23 and is ejected again from the discharge port 21 (on state). When the rotating shaft 42 is further rotated, the ratio of the communication is gradually increased. When the rotating shaft 42 is rotated by 270 degrees from the state of FIG. 4A, the ratio of the communication as shown in FIG. 4D is again maximized. In this manner, the off state and the on state can be alternately switched by rotating the rotary shaft 42 by 90 degrees. Of course, the discharge amount can also be adjusted in multiple stages by controlling the rotational position.

As described above, in the present embodiment, the discharge of the coating liquid from the discharge port 21 can be controlled by the rotation of the rotary shaft 42, and the discharge amount can be controlled in a plurality of stages by controlling the rotational position. Of course, even if a through hole is provided instead of the groove portion, the same discharge control can be performed. In addition, in order to prevent leakage of the coating liquid from the rotating portion and to stably rotate the rotating shaft 42, the present embodiment is configured as follows.

A pair of sealing members 43 and 44 are provided in the through hole 31 so as to sandwich the coating liquid nozzle 2 from the vertical direction (R direction). In other words, on the upper side of the coating liquid nozzle 2, that is, on the (+R) direction side, an annular sealing member 43 is disposed in the vicinity of the position where the rotating shaft 42 and the upper opening 24 intersect. Further, on the lower side of the coating liquid nozzle 2, that is, on the (-R) direction side, an annular sealing member 44 is disposed in the vicinity of the position where the rotating shaft 42 and the lower opening 24 intersect. Further, in the through hole 31, a rotary bearing such as a ball bearing 45 that rotatably supports the rotating shaft 42 is provided on the upper side of the sealing member 43, that is, the (+R) direction side. Further, the sealing member 44 side is also the same, that is, the ball bearing 46 that rotatably supports the rotating shaft 42 is provided on the lower side of the sealing member 44, that is, on the (-R) direction side. The rotating shaft 42 is freely rotatable in the through hole 31 by the two ball bearings 45 and 46.

In this way, the sealing member and the ball bearing are disposed on each of the upper and lower sides of the coating liquid nozzle 2. However, in the present embodiment, in order to prevent the sealing members 43 and 44 from coming into direct contact with the rotating shaft 42, the sealing members 43 and 44 are respectively The ball bearings 45 and 46 abut against the outer wheel, and on the other hand, a relief portion is provided on the sealing members 43 and 44 so as to form a gap with the inner wheel. Further, instead of the sealing members 43, 44, it is also possible to use fluorine according to conditions such as chemical resistance or sealing property. O-ring composed of rubber or the like.

The sealing member 44 and the ball bearing 46, which are formed on the lower side, are sandwiched by a PTFE (polytetrafluoroethylene) (polytetrafluoroethylene) spacer 47 and held by a stainless steel lower side holder 7. Here, the spacer 47 is pressed against the outer ring of the ball bearing 46 to seal the leakage of the coating liquid, and the coating liquid for preventing leakage is dropped from the coating liquid discharge device 1B. Further, the lower holder 7 also functions as an abutting surface of the axial end of the rotating shaft 42, and adjusts the movement of the rotating shaft 42 in the axial direction.

Further, the upper sealing member 43 and the ball bearing 45 are held by the upper holder 6 and held. As shown in FIG. 2, the upper holder 6 includes a cover member 61 and a cylindrical member 62 extending downward from the lower surface of the cover member 61, and is made of, for example, a stainless steel material. A through hole for inserting the rotating shaft 42 is formed in the cover member 61. Further, the cylindrical member 62 is finally processed to be inserted into the through hole 31 freely, and when inserted into the through hole 31, the ball bearing 45 is held by pressing only the outer ring of the ball bearing 45 with the lower end surface of the cylindrical member 62 facing downward. And a sealing member 43.

As shown in FIG. 1A, FIG. 1B and FIG. 2, the upper end portion of each of the rotating shafts 42, that is, the (+R)-side end portion is coupled to the upper end portion of the support block 5 having an inverted L-shaped cross section. The rotation drive unit 41. Each of the rotation driving units 41 includes a micro electric motor (for example, a micromotor SLB series manufactured by Tochigi Precision Co., Ltd.) 411, a speed reducer 412, and an encoder 413. The rotating shaft of the micro electric motor 411 is connected to the rotating shaft 42 via the speed reducer 412. When the micro electric motor 411 is actuated, the rotation of the rotating shaft of the micro electric motor 411 is transmitted to the rotating shaft 42 after being decelerated to, for example, 1/30 by the speed reducer 412.

Further, in the present embodiment, the micro electric motor 411 is formed on the rotating shaft to form a horizontal hole through which the light passes, and the pulse signal is outputted each time the transmissive photodetector detects the horizontal hole, thereby detecting The approximate angle of the axis of rotation. Further, it is configured such that the rotation axis of the micro electric motor 411 outputs a pulse signal from the encoder 413 every one rotation. Then, the origin is correctly determined using the signals, and the control is formed on the rotating shaft 42. The rotational position of the through hole 422 with respect to the coating liquid nozzle 2 can thereby control the discharge amount in the above manner.

Next, the configuration of the gas discharge device 1C will be described with reference to FIGS. 1A, 1B, and 5. Fig. 5 is a view schematically showing the configuration of a gas ejection device. The gas ejection device 1C includes: a nozzle holder 110 coupled to the upper holder 6; four gas nozzles 120 supported by the nozzle holder 110; a gas supply unit 130 that supplies compressed air to each of the gas nozzles 120; The valve control unit 140 that supplies the air from the gas supply unit 130 to the gas nozzle 120.

The nozzle holder 110 is made of, for example, aluminum, and is attached to the upper holder 6 by two mounting screws (not shown) on the (+Q) direction side of the upper holder 6. On the nozzle holder 110, a through hole for inserting and fixing the gas nozzle 120 is provided for each gas nozzle 120. Further, in the present embodiment, as shown in Fig. 1A, the front ends of the gas nozzles 120 are uniformly arranged at a pitch of 2 [mm], and thus the four through holes are provided in a zigzag manner and at different inclination angles.

Each of the gas nozzles 120 has a cylindrical shape, and the front end portions of the respective gas nozzles 120 are chamfered. More specifically, in the present embodiment, a stainless steel pipe having an outer diameter of Φ1/16 [inch] and a hole diameter of Φ 0.5 [mm] is chamfered. Then, the four gas nozzles 120 are inserted into the respective through holes, and the gas discharge ports of the gas nozzles 120 are arranged in a row in the same manner as the discharge port rows of the coating liquid nozzles 2 at a pitch of 2 [mm]. Further, each of the gas nozzles 120 is fixed to the nozzle holder 110 by a fastening screw (not shown). Further, the position and angle of each gas nozzle 120 can be adjusted by fastening screws to satisfy the arrangement relationship as described below.

The four gas nozzles 120 fixed to the nozzle holder 110 are arranged in a one-to-one correspondence relationship with the four coating liquid nozzles as follows. In other words, the gas nozzle 120 is disposed on the downstream side in the moving direction X of the substrate W with respect to the coating liquid nozzle 2, and ejects the air flow AF to the liquid flow CF of the coating liquid. Specifically, if compressed air is supplied from the gas supply unit 130 to the gas In the nozzle 120, air is ejected from the gas nozzle 120 to the substrate surface on the upstream side in the substrate moving direction X with respect to the supply position PS1 (see FIG. 5) on the substrate W with respect to the coating liquid, and the discharge port of the coating liquid nozzle 2 is ejected. 21 and the surface of the substrate W blow air flow AF to the liquid flow CF of the coating liquid. In the present embodiment, the coating liquid nozzle 2 is disposed on the upstream side (the left-hand side in FIG. 5) of the substrate moving direction X with respect to the supply position PS1 of the coating liquid toward the supply position PS1, and is opposed to each other. The coating liquid is ejected in the discharge direction D2 in which the normal to the surface of the substrate W is inclined. On the other hand, the air ejected from the gas nozzle 120 is ejected in the ejection direction D3 orthogonal to the ejection direction D2. Further, the ejection direction D3 is not limited thereto, and may be set to 0° (parallel to the substrate surface) on the virtual plane (the paper surface of FIG. 5) including the liquid flow CF of the coating liquid and the air flow AF. Between 90° (the direction orthogonal to the surface of the substrate).

In the gas supply unit 130, a continuous blowing system 131 that supplies compressed air to the gas nozzle 120 is provided for each gas nozzle 120. As shown in Fig. 5, the continuous blowing system 131 includes a pipe 131a, a regulator 131b, a needle valve 131c, and a drive opening and closing valve 131d. One end of the pipe 131a is connected to a gas supply source that generates compressed air, and the other end is connected to the gas nozzle 120. Further, the regulator 131b, the needle valve 131c, and the drive opening and closing valve 131d are inserted into the pipe 131a, and pressure adjustment, flow rate adjustment, and supply control are performed, respectively. That is, after the regulator 131b adjusts the pressure of the compressed air supplied from the gas supply source, the flow rate of the air is further adjusted by the needle valve 131c. Then, the drive opening and closing valve 131d is opened in accordance with an opening command from the valve control unit 140 to supply the compressed air whose adjustment is completed to the gas nozzle 120, and the air is ejected from the gas nozzle 120 as described above, and the liquid flow CF of the coating liquid is blown. Air flow AF. On the other hand, the drive opening and closing valve 131d is closed by the closing command from the valve control unit 140 to stop the supply of the compressed air to the gas nozzle 120, and the injection of the air from the gas nozzle 120 is stopped. Further, as the flow rate of the air ejected from the gas nozzle 120, it is preferable to set the flow rate of the linear pattern LP on the substrate which is not continuously scattered in the continuous blowing which continuously ejects air for a specific time as described below. (hereinafter referred to as "scattering limit flow rate"), in the present embodiment, it is set to 50 [NmL/min].

6A and 6B are timing charts showing the operation of the pattern forming apparatus shown in Fig. 1A. On the other hand, Fig. 6A shows the action of forming a line pattern when air ejection is not performed, that is, when no air blowing is performed, and the other On the other hand, FIG. 6B shows an operation of performing air blowing in accordance with the start of discharge of the coating liquid and the stop of discharge, and forming a line pattern. When the blast is not performed, as described, a spherical deformation portion is generated at the beginning of the line pattern LP, and a tail of the coating liquid is generated at the end. As a factor causing the ball in the above, it is considered that the wind generated between the substrate W and the coating liquid nozzle 2 due to the relative movement of the substrate W with respect to the coating liquid nozzle 2 is one of the main causes. That is, it is considered that the flow CF of the coating liquid immediately after the ejection is caused by the generation of the wind, which causes the generation of the ball. Also, it is considered that the generation of the smear is generated in the following process. In other words, immediately after the discharge of the coating liquid is stopped, the coating liquid located in the vicinity of the discharge port 21 of the coating liquid nozzle 2 is elongated, and then is dropped and dropped onto the surface of the substrate W, which is present as a trailing end.

Therefore, in the present embodiment, the gas nozzle 120 is provided as described above, and as shown in FIG. 6B, the valve control unit 140 issues the drive opening and closing valve 131d at a timing slightly earlier than the discharge start time (timing T1) of the coating liquid. Turn on the command and start the jet of air flow AF. Then, the state in which the air flow AF is ejected toward the substrate surface on the upstream side in the substrate moving direction X to the supply position PS1 (see FIG. 5) of the coating liquid is maintained, and the discharge of the coating liquid is started at the timing T1. Therefore, the rolling up of the liquid flow CF of the coating liquid can be suppressed, thereby suppressing the generation of the ball. Further, since the front end of the liquid flow CF of the coating liquid is pressed against the surface of the substrate W by the air flow AF, the coating liquid does not scatter, and the effect of suppressing the deviation of the position of the start end of the line pattern can be obtained.

Shortly after the time series T1, the valve control unit 140 issues a closing command to the drive opening and closing valve 131d to stop the injection of the air flow AF. This is because the cross-sectional shape of the line pattern LP is affected by the pressure applied to the line pattern LP by the air blow.

When it is close to the terminal of the linear pattern LP, the valve control unit 140 issues an open command to the drive opening and closing valve 131d at a timing earlier than the discharge stop time point (timing T2) of the coating liquid, and starts the air flow AF. Spraying, and maintaining this state, stopping coating at timing T2 The liquid is sprayed out. Thereby, the air flow AF can assist the cutting of the liquid flow CF of the coating liquid to suppress the occurrence of smear.

As described above, according to the present embodiment, the gas nozzle 120 is disposed on the downstream side of the substrate moving direction X with respect to the coating liquid nozzle 2, and the supply position PS1 from the gas nozzle 120 to the coating liquid. On the other hand, air is ejected toward the surface of the substrate on the upstream side in the substrate moving direction X, and the air flow AF is supplied to the liquid flow CF of the coating liquid between the discharge port 21 of the coating liquid nozzle 2 and the surface of the substrate W. Further, air injection, that is, continuous blowing is continuously performed for a specific time in accordance with the start of discharge of the coating liquid and the stop of discharge. Therefore, the supply of the air flow AF acts in the direction in which the application hydraulic pressure is applied to the substrate, so that the coating liquid is not scattered, and the start of the linear pattern LP can be prevented from becoming spherical and the deviation of the start position can be suppressed. It is possible to suppress tailing of the terminal of the line pattern LP.

<Second embodiment>

In the above-described first embodiment, the continuous blowing is performed. However, instead of the continuous blowing, the so-called continuous blowing of the gas nozzle 120 is performed by jetting air from the gas nozzle 120 to blow the air flow AF to the liquid flow CF of the coating liquid. Pulse blowing (second embodiment). Hereinafter, a second embodiment of the present invention will be described with reference to Figs. 7 and 8 .

The pattern forming apparatus 1 of the second embodiment is the same as the first embodiment except for a part of the configuration of the gas ejection device 1C. Therefore, the description will be made focusing on the same points, and the same reference numerals will be given to the same components, and description thereof will be omitted.

Fig. 7 is a view schematically showing the configuration of a gas discharge device provided in a second embodiment of the pattern forming apparatus of the present invention. The second embodiment differs from the first embodiment in that a pulse driving unit 150 is added to the gas ejection device 1C, and a high-speed driving type is used as the driving on-off valve. In other words, in the second embodiment, the gas injection system 132 is provided with a pulse injection system 132 that supplies compressed air to the gas nozzle 120 in a pulsed manner. The basic configuration of the pulse injection system 132 includes a pipe 132a, a regulator 132b, a needle valve 132c, and a drive opening and closing valve 132d similarly to the continuous injection system 131. But, in order to be For the pulse injection, a pulse injection valve PJ series manufactured by CKD Co., Ltd., for example, is used as the drive opening and closing valve 132d. Further, the pulse driving unit 150 supplies a high-speed pulse driving voltage having a pulse width of about 500 [μsec] to the high-speed driving opening and closing valve 132d, thereby instantaneously operating the electromagnet that drives the opening and closing valve 132d at a high speed to obtain a sharp air pulse. In the case where the air pulse is ejected as described above, it is preferable that the air having a higher flow rate than the continuous injection is instantaneously injected. In the second embodiment, the flow rate exceeding the scattering limit flow rate is set, for example, about 200 [NmL/min].

FIG. 8 is a timing chart showing the operation of the second embodiment of the pattern forming apparatus, and shows an operation of forming a line pattern while performing pulse jetting in response to the start of discharge of the coating liquid and the stop of discharge. In the present embodiment, as described above, the gas nozzle 120 is provided, and as shown in FIG. 8, the valve control unit 140 outputs an opening command at a timing slightly earlier than the discharge start timing (timing T1) of the coating liquid. Thereby, the pulse drive unit 150 that has received the open command generates a high-speed pulse drive voltage having a pulse width of about 500 [μsec] and supplies it to the high-speed drive on-off valve 132d. In response to this, the high-speed drive on-off valve 132d performs a pulse operation to start the ejection of the pulsed air flow AF. Then, the pulse blowing continues beyond the timing T1, and the discharge of the coating liquid is started at the timing T1. Therefore, it is possible to obtain the same effect as the case of performing continuous blowing (the first embodiment), that is, the suppression effect of the ball generation and the suppression effect of the start position deviation.

The inventors of the present invention studied the results of pulse jet analysis corresponding to the start of discharge of the coating liquid in the following manner. That is, the pulsed air flow AF before and after the timing T1 instantaneously presses only the beginning of the wiring pattern LP to prevent the coating liquid from being rolled up, and even if a ball is generated, the pulse blowing will be squeezed and formed. It is a flat shape. Therefore, the effect of suppressing both the generation of the ball and the deviation of the start position is more excellent in the second embodiment, and the same result can be confirmed even when the line pattern LP actually formed is visually observed.

Shortly after the timing T1, the valve control unit 140 outputs a closing command to stop the injection of the air flow AF. This is because, similarly to the first embodiment, the cross-sectional shape of the linear pattern LP is prevented from being affected by the pressure applied to the linear pattern LP by the air blow. especially In the pulse injection, the injection is instantaneous, but in order to supply the air having a flow rate exceeding the scattering limit flow rate to the linear pattern LP, it is preferable to stop the pulse injection at a timing other than the start of the discharge of the coating liquid and the stop of the discharge.

When it is close to the terminal of the linear pattern LP, the valve control unit 140 outputs the ON command again to start the pulse injection at the timing earlier than the discharge stop time point (timing T2) of the coating liquid, and stops the coating at the timing T2. The supply of liquid. Thereby, the suppression effect of the occurrence of the smear can be obtained in the same manner as in the case of the continuous blowing (the first embodiment).

The inventors of the present invention studied the results of the pulse injection analysis corresponding to the discharge stop of the coating liquid as follows. That is, the pulsed air flow AF before the timing T2 shapes the rear end of the line pattern LP into a flat shape, thereby improving the aesthetics of the line pattern LP. Further, the pulsed air flow AF after the time series T2 cuts off and disappears. Therefore, the second embodiment is more excellent in the aesthetics of the rear end of the line pattern LP, and the same result can be confirmed even when the line pattern LP actually formed is visually observed.

As described above, in the second embodiment, the continuous blowing is changed to the pulse blowing, and not only the same effects as those of the first embodiment can be obtained, but also the effects such as the above effects can be further improved to form a better pattern.

Further, in the second embodiment, the pulse interval is fixed. However, in consideration of the effect of the pulse injection, the FM modulation (Frequency Modulation) shown in Fig. 9 can be appropriately changed. That is, when it is desired to increase the pressure-bonding force to increase the suppression effect of the ball generation, the pulse interval after the time series T1 is made dense to enhance the pressure of the air flow AF applied to the liquid flow CF of the coating liquid. Further, when it is desired to further suppress the scattering of the coating liquid when the tailing is improved, the pulse interval after the timing T2 is increased to reduce the pressure of the air flow AF applied to the liquid flow CF of the coating liquid by the pulse injection. Just fine. In this way, the pulse modulation waveform is FM-modulated to adjust the effect of the pulse injection. Of course, the modulation method is not limited to the FM modulation described above, and various modulation methods such as PWM (pulse width modulation) may be used.

<Third embodiment>

In the first embodiment, only the continuous blowing is performed, and in the second embodiment, only the pulse blowing is performed. However, the third embodiment may be configured to be combined and executed (third embodiment). Hereinafter, a third embodiment of the present invention will be described with reference to Figs. 10 and 11 .

Fig. 10 is a view schematically showing the configuration of a gas discharge device provided in a third embodiment of the pattern forming apparatus of the present invention. In the pattern forming apparatus 1 of the third embodiment, as shown in Fig. 10, a continuous blowing system 131 and a pulse blowing system 132 are arranged side by side, and continuous blowing and pulse spraying can be performed in accordance with an instruction from the valve control unit 140. blow. Further, as the gas flow rate of each gas nozzle 120, it is preferable to set the gas flow rate of the continuous injection to 50 [NmL/min], and to set the gas flow rate of the pulse injection to about 200 [NmL/min]. In the middle, the so-called four-channel multi-nozzle including the four coating liquid nozzles 2 has a flow rate of (50 + 200) × 4 = 1000 [NmL / min] as a whole. The other configurations are the same as those of the first embodiment and the second embodiment. Therefore, the same components are denoted by the same reference numerals, and their description is omitted.

FIG. 11 is a timing chart showing the operation of the third embodiment of the pattern forming apparatus, and shows that a continuous pattern is ejected in response to the start of the discharge of the coating liquid and the discharge is stopped, and the pulse pattern is appropriately complementarily formed to form a line pattern. The action. In the present embodiment, as shown in FIG. 11, the valve control unit 140 issues an opening command to the drive opening/closing valve 131d of the continuous blowing system 131 at a timing slightly earlier than the discharge start time (timing T1) of the coating liquid, and starts the air. Jet of flow AF. Then, the state in which the air flow AF is ejected toward the substrate surface on the upstream side in the substrate moving direction X to the supply position PS1 (see FIG. 5) of the coating liquid is maintained, and the supply of the coating liquid is started at the timing T1. Thereby, similarly to the first embodiment, the winding of the liquid flow CF of the coating liquid can be suppressed, and the generation of the ball can be suppressed.

However, in some cases, only continuous spraying does not necessarily have a sufficient effect of suppressing the generation of the ball. Therefore, in the third embodiment, the pulse control unit 140 outputs an opening command to the pulse driving unit 150 at the timing T1, and pulse injection is additionally performed. Pulsed air flow AF by the additional pulse When the rinsing is blown and only the beginning of the wiring pattern LP is pressed at an instant, the coating liquid is more effectively prevented from being rolled up. And even if there is a ball, the pulse blowing will break it and form a flat shape. As a result, compared with the first embodiment, the suppression effect of the ball generation and the suppression effect of the start position deviation can be further improved, and a more preferable line pattern LP can be formed.

Shortly after the time series T1, the valve control unit 140 issues a closing command to the pulse driving unit 150 to stop the pulse blowing, and then issues a closing command to the driving opening and closing valve 131d of the continuous blowing system 131 to stop the continuous blowing. Further, during the formation of the intermediate portion of the line pattern LP, the air ejection from the gas nozzle 120 is stopped to eliminate the influence of the air flow AF on the line pattern LP.

Then, when it is close to the terminal of the line pattern LP, the valve control unit 140 starts the continuous injection by again issuing an opening command to the drive opening and closing valve 131d at a timing earlier than the discharge stop time point (timing T2) of the coating liquid. Blowing is performed, and an impulse command is issued to the pulse driving unit 150 to start pulse blowing. Thus, the rear end of the line pattern LP is formed into a flat shape by the pulse blowing immediately before the timing T2, thereby improving the aesthetics of the line pattern LP.

Thus, the discharge of the coating liquid is stopped in the state where the continuous blowing and the pulse blowing are performed (timing T2). At the time of the discharge stop, the liquid flow CF of the coating liquid is supplied not only to the continuous injection but also to the liquid flow CF of the coating liquid, thereby suppressing the occurrence of the tail. According to the third embodiment, the suppression effect of the occurrence of the trailing can be improved as compared with the first embodiment, and a more preferable linear pattern LP can be formed.

<Fourth embodiment>

In the first embodiment to the third embodiment, the shape of the pattern is controlled by blowing the gas stream to the liquid flow of the coating liquid by the gas discharge device 1C. However, instead of the gas discharge device 1C, the surface may be formed on the surface of the substrate W. One of the patterns LP is a pattern shaping device 1D that shapes the pattern by supplying air in a pulsed manner. Hereinafter, reference is made to FIGS. 1A, 1B, and 12.

Figure 12 is a schematic view showing the fourth embodiment of the pattern forming apparatus of the present invention. A diagram of the composition of the pattern shaping device. The pattern shaping device 1D includes: a nozzle holder 160 coupled to the upper holder 6; four gas nozzles 170 supported by the nozzle holder 160; and a gas supply unit 180 for supplying compressed air to each of the gas nozzles 170; The gas supply unit 180 supplies the valve control unit 140 to the air of the gas nozzle 170; and the pulse drive unit 150.

The nozzle holder 160 is made of, for example, aluminum, and is attached to the upper holder 6 by two mounting screws (not shown) on the (+Q) direction side of the upper holder 6. On the nozzle holder 160, a through hole for inserting and fixing the gas nozzle 170 is provided for each gas nozzle 170. Further, in the present embodiment, as shown in Fig. 1, the front ends of the gas nozzles 170 are uniformly arranged at a pitch of 2 [mm], and thus the four through holes are provided in a zigzag manner and at different inclination angles.

Each of the gas nozzles 170 has a cylindrical shape, and the front end portions of the respective gas nozzles 170 are chamfered. More specifically, in the present embodiment, a stainless steel pipe having an outer diameter of Φ1/16 [inch] and a hole diameter of Φ 0.5 [mm] is chamfered. Then, the four gas nozzles 170 are inserted into the respective through holes, and the gas discharge ports of the gas nozzles 170 are arranged in a row in the same manner as the discharge port rows of the coating liquid nozzles 2 at a pitch of 2 [mm]. Further, each of the gas nozzles 170 is fixed to the nozzle holder 160 by a fastening screw (not shown). Further, the position and angle of each gas nozzle 170 can be adjusted by fastening screws to satisfy the arrangement relationship as described below.

The four gas nozzles 170 fixed to the nozzle holder 160 are arranged in a one-to-one correspondence relationship with the four linear patterns LP formed on the surface of the substrate W as follows. In other words, the gas nozzle 170 is disposed on the downstream side (the right-hand side in FIG. 12) of the moving direction X of the substrate W with respect to the coating liquid nozzle 2, and ejects the air flow AF to the linear pattern LP on the substrate W. Specifically, when compressed air is supplied from the gas supply unit 180 to the gas nozzle 170, air is ejected from the gas nozzle 170 toward the substrate surface of the supply position PS2, and the supply position PS2 is supplied from the coating liquid on the substrate W. The position PS1 (refer to FIG. 12) starts from the substrate moving direction X away from the distance As a result of L12, the air flow AF is blown to the line pattern LP at the supply position PS2. The line pattern LP is pressurized at the supply position PS2 by the air flow AF, and is shaped into a desired shape as described below. In the present embodiment, the discharge port 171 is disposed toward the supply position PS2 on the upstream side (the left-hand side in FIG. 12) of the substrate movement direction X with respect to the supply position PS2, and is inclined toward the normal to the surface of the substrate W. The air is sprayed in the spray direction. Further, the ejection direction is not limited thereto, and may be configured to eject air from a direction orthogonal to the surface of the substrate W, for example.

In the gas supply unit 180, a pulse injection system 181 that supplies compressed air to the gas nozzle 170 is provided for each gas nozzle 170. As shown in FIG. 12, the pulse injection system 181 is composed of a pipe 181a, a regulator 181b, a needle valve 181c, and a drive opening and closing valve 181d. One end of the pipe 181a is connected to a gas supply source that generates compressed air, and the other end is connected to the gas nozzle 170. Further, the regulator 181b, the needle valve 181c, and the drive opening and closing valve 181d are inserted into the pipe 181a, and pressure adjustment, flow rate adjustment, and supply control are performed, respectively. That is, after the regulator 181b adjusts the pressure of the compressed air supplied from the gas supply source, the flow rate of the air is further adjusted by the needle valve 181c. Then, the opening and closing valve 181d is opened and closed to control the supply of air to the gas nozzle 170. In the present embodiment, the drive opening/closing valve 181d is opened and closed at a high speed by the pulse drive unit 150 to supply the air flow AF to the linear pattern LP in a pulsed manner, and the high-speed drive type is used as the drive opening and closing valve 181d. For example, the pulse injection valve PJ series manufactured by CKD Co., Ltd.

The pulse drive unit 150 controls the drive voltage supplied to the drive opening and closing valve 181d to open and close the drive opening/closing valve 181d in response to an opening/closing command from the valve control unit 140. For example, when the valve control unit 140 issues a closing command, the pulse driving unit 150 does not perform the driveable opening of the drive opening and closing valve 181d, but maintains the drive opening and closing valve 181d in a closed state. On the other hand, when the valve control unit 140 issues an open command, the pulse drive unit 150 supplies, for example, a high-speed pulse drive voltage having a pulse width of about 500 [μsec] to the drive opening and closing valve 181d, and instantaneously drives the electromagnet of the open/close valve 132d at a high speed. Act to get a sharp air pulse. So jetting air pulses In the case of the case, the air having a high flow rate can be instantaneously injected. In the present embodiment, the flow rate exceeding the scattering limit flow rate is set, for example, about 200 [NmL/min]. In addition, the "scattering limit flow rate" refers to a flow rate in which the linear pattern LP on the substrate W does not scatter during the continuous blowing in which the air is continuously ejected, and the electrode pattern or the wiring pattern of the photoelectric conversion element is formed. The time is about 50 [NmL/min].

Next, when the substrate W is moved by the pattern forming apparatus 1 configured as described above and a line pattern is formed on the surface of the substrate W, air is blown from the gas nozzle 170 in a pulsed manner to blow the air flow AF to the line pattern LP. The case of pulse injection (see Fig. 13) and the case of pulse injection (Fig. 14) will be described separately.

Fig. 13 is a timing chart showing the operation of the pattern forming apparatus when pulse spraying is not performed, that is, when patterning is not performed using the pattern shaping device. When the pulse is not applied, the linear pattern LP formed on the surface of the substrate W has a spherical deformed portion at the start end portion LPa as shown in the uppermost schematic view of Fig. 13, and is formed at the end portion LPb. A tailing of the coating liquid is produced.

Fig. 14 is a timing chart showing the operation of the pattern forming apparatus when pulse blowing is performed, that is, when patterning is performed using a pattern shaping device. In the present embodiment, as shown in FIG. 14, the coating liquid is ejected from the ejection port 21 of the coating liquid nozzle 2 at the ejection start time point (timing T1), and the starting end portion LPa of the linear pattern LP is formed on the substrate W. . Thereafter, the coating liquid is ejected, and the linear pattern LP is extended after the start end portion LPa. However, when the ΔT12 is passed from the timing T1, the line pattern LP is extended only by the length L12, and the start end portion LPa reaches the supply position PS2 (timing T2). During a fixed period of time before and after the timing T2, the pulse driving unit 150 supplies the high-speed pulse driving voltage to the driving opening and closing valve 181d in accordance with an opening command from the valve control unit 140, and pulsates the starting end portion LPa and pressurizes it. Thereby, the spherical starting end portion LPa is linearly formed by moving on the surface of the substrate so as to ooze out in a direction parallel to the substrate moving direction X. When the start end portion LPa of the line pattern LP enters the region where the air is injected (the supply position PS2), the pulse injection is performed on the start end portion LPa and the start end portion LPA is executed. Plastic surgery.

After the start end portion LPa passes through the supply position PS2, the substrate movement and the coating liquid discharge are continued, and the line pattern LP is elongated in the X direction. Then, when the line pattern LP reaches the desired length, the coating liquid is ejected (timing T3). At this time, the tail portion LPb of the line pattern LP is smeared. Therefore, in the present embodiment, the substrate W is continuously moved after the formation of the line pattern LP. As a result, when ΔT34 elapses from the timing T3, the terminal portion LPb of the line pattern LP reaches the supply position PS2 (timing T4). During the fixed time period from the valve control unit 140, the pulse drive unit 150 supplies the high-speed pulse drive voltage to the drive opening and closing valve 181d, and the terminal portion LPb is pulse-jetted and pressurized. Thereby, the tail end portion LPb is mainly formed in a linear shape by moving on the surface of the substrate so as to ooze out in a direction parallel to the substrate moving direction X. In the same manner as the start end portion LPa, the terminal portion LPb of the linear pattern LP performs pulse injection and performs the shaping of the terminal portion LPb when entering the region where the air is injected (the supply position PS2). Further, in the present embodiment, in the forming operation of the line pattern LP, since the substrate W is moved at a constant speed, the times ΔT12 and ΔT34 are the same value, but the start end portion LPa and the end portion LPb are passed through the supply position. When the substrate speeds at the time of PS2 are different from each other, the time ΔT12 and ΔT34 may be different depending on the time.

As described above, according to the present embodiment, the start end portion LPa and the end portion LPb of the line pattern LP are used as the "shaved portion" of the present invention, and when each of the start end portion LPa and the end portion LPb passes through the supply position PS2, Since the shaping portion presses the air in a pulsed manner, the linear pattern LP can be well shaped.

Further, it is also conceivable to perform the so-called continuous blowing in which the shaped portion continuously ejects the air to shape the pattern, but continuous spraying causes the coating liquid constituting the shaped portion to scatter to cause pattern failure. On the other hand, in the present embodiment, by performing pulse jetting, scattering of the coating liquid in the shaped portion can be suppressed, and the pattern can be well shaped. However, in the case of pulse injection, if it is close to continuous blowing, it is easy to produce as the pulse width becomes longer. The coating liquid is scattered. Therefore, in order to form a better pattern, it is preferable to study the pulse width as described below.

Therefore, in the pattern forming apparatus 1 equipped with the pattern shaping device 1D shown in FIG. 12, the linear pattern LP is shaped by various kinds of pulse injection, and the inventors observed the shapes of the start end portion LPa and the end portion LPb of the line pattern LP. This observation is summarized into Figure 15. Fig. 15 is a view schematically showing changes in the shape of the start end portion and the end portion of the pattern as a function of the pulse width of the gas jet. The "pulse width" in the figure is the pulse width of the high-speed pulse driving voltage supplied from the pulse driving unit 150 to the driving opening and closing valve 181d, and is prepared for 5 [msec], 2 [msec], 1 [msec], and 0.5 [msec]. Five kinds of 0.1 [msec]. Further, in the column of "starting end" and "terminal", the mode diagram shows the observation results of the leading end portion LPa and the terminal portion LPb of the linear pattern LP at the time of pulse jetting for each pulse width, which is similar to the pear skin. The portion of the spot indicates the bleed portion generated by the pulse blowing, and the black square mark indicates the scattering coating liquid.

As the pulse width, that is, the time during which the air is ejected, becomes longer, the application time of the air flow AF to the shaped portion (the start end portion LPa or the end portion LPb) becomes longer, and the coating liquid constituting the shaped portion mainly oozes in the X direction and spreads. The oozing area (the area similar to the pear skin spot in the figure) becomes large. In order to eliminate the area of the spherical shape or the tail shape generated at both end portions of the line pattern LP and to homogenize it, it is preferable to set the pulse width to be longer than 0.1 [msec]. The reason for this is that if the pulse width is extremely short, the drive opening and closing valve 181d cannot be opened and closed with sufficient responsiveness, and the air cannot be jetted in a pulsed manner, and the flow rate of the air flow is also small, so that the spherical shape or the tail shape remains. . Therefore, as shown by "x" in the determination column corresponding to 0.1 [msec] in FIG. 15, it is difficult to shape the line pattern LP more preferably.

On the other hand, as the pulse width is lengthened, the opening and closing valve 181d is driven to open and close at a high speed, and the air is sprayed in a pulsed manner to diffuse the coating liquid of the ball portion or the tail portion to reduce the ball portion or the tail portion. As can be seen from the column of "starting end" and "terminal" in Fig. 15, the area of the oozing area is enlarged as the ball portion is reduced, and the ball portion is made to have a pulse width of 2 [msec] or more. The minutes and tails disappear. However, when the pulse width is set to 5 [msec] or more, the coating liquid is scattered around the linear pattern LP (refer to "x" in the column corresponding to the determination of 5 [msec] in Fig. 15). Therefore, in consideration of this point, it is preferable to set the pulse width to be shorter than 5 [msec].

Therefore, in order to form the line pattern LP more preferably, it is preferable to set the pulse width to be longer than 0.1 [msec] and shorter than 5 [msec]. Moreover, it is preferable to set the pulse width to 0.5 [msec] or more and 2 [msec] or less (refer to the triangular mark, the circular mark, and the double circular mark in the column of the judgment in FIG. 15). Further, when the amount of bleeding increases, the length of the line pattern LP becomes longer than the set value, or the interval between the adjacent line patterns LP becomes narrower at the start end portion LPa or the end portion LPb. In view of such a viewpoint, it is preferable to set the pulse width to 0.5 [msec] or more and 1 [msec] or less, and it is preferable to set it to 0.5 [msec] as a whole.

<Fifth Embodiment>

In the pattern forming apparatus 1 of the fourth embodiment, the pattern shaping device 1D is provided instead of the gas ejection device 1C. However, the gas ejection device 1C and the pattern shaping device 1D may be provided together (the fifth embodiment). Along with this, a better pattern can be formed. Hereinafter, a fifth embodiment of the present invention will be described with reference to Figs. 16 and 17 .

Fig. 16 is a view showing a fifth embodiment of the pattern forming apparatus of the present invention. The fifth embodiment differs greatly from the fourth embodiment in that a gas discharge device 1C for supplying an air flow to a liquid flow of a coating liquid discharged from each coating liquid nozzle 2 is further provided, and other components are provided. Basically, it is the same as that of the fourth embodiment. Further, the configuration of the gas ejection device 1C is the same as that of the gas ejection device of the first embodiment. Therefore, the same configurations as those in the first embodiment or the fourth embodiment are denoted by the same reference numerals and will not be described.

Fig. 17 is a timing chart showing the operation of the pattern forming apparatus shown in Fig. 16. In the pattern forming apparatus 1, when the air blow is not performed, as described, a spherical deformation portion is formed at the beginning end portion LPa of the line pattern LP, and a trailing of the coating liquid is generated at the end portion LPb. As the cause of the ball generated in the above, it is considered that the phase of the substrate W relative to the coating liquid nozzle 2 The wind generated between the substrate W and the coating liquid nozzle 2 due to the movement is one of the main causes. That is, it is considered that the flow CF of the coating liquid immediately after the ejection is caused by the generation of the wind, which causes the generation of the ball. Also, it is considered that the generation of the smear is generated in the following process. In other words, immediately after the discharge of the coating liquid is stopped, the coating liquid located in the vicinity of the discharge port 21 of the coating liquid nozzle 2 is elongated, and then is dropped and dropped onto the surface of the substrate W, which is present as a trailing end.

Therefore, in the present embodiment, the gas nozzle 120 is provided as described above, and as shown in FIG. 17, the valve control unit 140 issues the drive opening and closing valve 131d at a timing slightly earlier than the discharge start time (timing T1) of the coating liquid. Turn on the command and start the jet of air flow AF. Then, the state in which the air flow AF is ejected toward the substrate surface on the upstream side in the substrate moving direction X to the supply position PS1 (see FIG. 16) of the coating liquid is maintained, and the discharge of the coating liquid is started at the timing T1. Therefore, the rolling up of the liquid flow CF of the coating liquid can be suppressed, thereby suppressing the generation of the ball. Further, since the front end of the liquid flow CF of the coating liquid is pressed against the surface of the substrate W by the air flow AF, the coating liquid does not scatter, and the effect of suppressing the deviation of the position of the start end of the line pattern can be obtained.

Shortly after the time series T1, the valve control unit 140 issues a closing command to the drive opening and closing valve 131d to stop the injection of the air flow AF. This is because the cross-sectional shape of the line pattern LP is affected by the pressure applied to the line pattern LP by the air blow.

On the other hand, when ΔT12 elapses from the timing T1, the line pattern LP is extended only by the length L12, and the start end portion LPa reaches the supply position PS2 (timing T2). In the same period as in the first embodiment, the starting end portion LPa is pulse-sprayed and pressurized from the gas nozzle 170, and the starting end portion LPa is shaped.

Then, when it is close to the terminal of the linear pattern LP, the valve control unit 140 issues an open command to the drive opening and closing valve 131d at a timing earlier than the discharge stop time point (timing T3) of the coating liquid, and starts the gas from the gas. The air flow AF of the nozzle 120 is ejected, and this state is maintained, and the discharge of the coating liquid is stopped at the timing T2. Thereby, the air flow AF can assist the cutting of the liquid flow CF of the coating liquid to suppress the occurrence of smear.

Further, if ΔT34 elapses from the timing T3, the terminal portion LPb of the line pattern LP arrives The position PS2 is supplied (timing T4). Therefore, in the same manner as in the first embodiment, the terminal portion LPb is pulsed and pressurized from the gas nozzle 170 again during the fixed time period before and after the timing T4, and the terminal portion LPb is shaped.

As described above, according to the fifth embodiment, the shaping of the line pattern LP is performed not only in the same manner as in the fourth embodiment, but also the generation of the ball at the start end portion LPa and the occurrence of the trailing end portion LPb are suppressed. In other words, the gas nozzle 120 is disposed on the downstream side of the substrate moving direction X with respect to the coating liquid nozzle 2, and is upstream from the supply position PS1 of the coating liquid toward the substrate moving direction X. The surface of the substrate is sprayed with air, and the air flow AF is supplied to the liquid flow CF of the coating liquid between the discharge port 21 of the coating liquid nozzle 2 and the surface of the substrate W. Further, air ejection, that is, continuous blowing, is continuously performed for a specific time in accordance with the start of discharge of the coating liquid and the stop of discharge. Therefore, the supply of the air flow AF acts in the direction in which the application hydraulic pressure is applied to the substrate, so that the coating liquid is not scattered, and the start of the linear pattern LP can be prevented from becoming spherical and the deviation of the start position can be suppressed. It is possible to suppress tailing of the terminal of the line pattern LP. Therefore, the line pattern LP can be formed more preferably.

<Sixth embodiment>

In the fifth embodiment, the gas supply unit 130 is provided with the continuous blowing system 131, and the air flow AF is continuously blown to the liquid flow CF of the coating liquid, that is, the continuous blowing is performed, but the continuous blowing may be used instead. It is configured to perform pulse blowing (sixth embodiment). That is, a pulse blowing system can also be used instead of the continuous blowing system 131. More specifically, a high-speed drive type, for example, a pulse injection valve PJ series manufactured by CKD Co., Ltd., is used as the drive opening and closing valve 131d, and as shown in FIG. 18, a discharge start time point (timing T1) of the coating liquid is earlier. According to the opening command from the valve control unit 140, the pulse driving unit 150 supplies the high-speed pulse driving voltage to the driving opening and closing valve 131d, and pulse-sprays the liquid flow CF of the coating liquid. Thereby, the winding up of the liquid flow CF of the coating liquid can be suppressed, and the generation of a ball can be suppressed. Further, the front end of the liquid flow CF of the coating liquid is pressed against the substrate W by the air flow AF Since the coating liquid does not scatter, the effect of suppressing the deviation of the position of the starting end of the line pattern can be obtained.

The inventors of the present invention studied the results of pulse jet analysis corresponding to the start of discharge of the coating liquid in the following manner. That is, the pulsed air flow AF before and after the timing T1 instantaneously presses the only end of the wiring pattern LP to prevent the coating liquid from being rolled up, and even if a ball is generated, the pulse blowing will be crushed and formed into Flat shape. Therefore, the effect of suppressing both the generation of the ball and the deviation of the start position is more excellent in the sixth embodiment, and the same result can be confirmed even when the line pattern LP actually formed is visually observed.

In the same manner as in the fifth embodiment, when the terminal of the linear pattern LP is approached, the valve control unit 140 outputs an opening command again to start the pulse injection at a timing slightly earlier than the discharge stop timing (timing T3) of the coating liquid. After the blowing, the supply of the coating liquid is stopped after a fixed time. Thereby, the suppression effect of the occurrence of the smear can be obtained in the same manner as in the case of the continuous blasting (the fifth embodiment).

The inventors of the present invention studied the results of the pulse injection analysis corresponding to the discharge stop of the coating liquid as follows. That is, the pulse-shaped air flow AF immediately before the timing T3 forms the rear end of the line pattern LP into a flat shape, thereby improving the aesthetics of the line pattern LP. Further, the pulsed air flow AF after the time series T3 cuts off and disappears. Therefore, the sixth embodiment is more excellent in terms of the aesthetics of the rear end of the line pattern LP, and the same result can be confirmed even when the line pattern LP actually formed is visually observed.

As described above, in the sixth embodiment, the linear pattern LP is shaped by the pulse injection, the generation of the ball at the start end portion LPa is suppressed, and the occurrence of the trailing end portion LPb is suppressed. Therefore, the line pattern LP can be formed more preferably.

<Seventh embodiment>

In the fifth embodiment, only the continuous blowing is performed, and the air flow AF is blown to the liquid flow CF of the coating liquid. In the sixth embodiment, only the pulse injection is performed, and the air flow AF is blown to the liquid flow CF of the coating liquid. It can be configured to be executed in combination or the like (seventh embodiment). That is, in the gas The supply unit 130 is provided with a continuous blowing system and a pulse blowing system side by side, and in order to blow the air flow AF to the liquid flow CF of the coating liquid as shown in FIG. 12, continuous blowing and pulse blowing may be combined (7th) Implementation form).

Fig. 19 is a view showing the operation of the seventh embodiment of the pattern forming apparatus equipped with the pattern shaping device of the present invention. In the figure, two "pulse blowing" are described, and the ball for the upper side nozzle 120 is generated and the pulse for the tail is suppressed. On the other hand, the pulse for pattern shaping of the lower side nozzle 170 is described. Blowing. In the seventh embodiment, as shown in FIG. 19, at a timing slightly earlier than the discharge start time (timing T1) of the coating liquid, the valve control unit 140 issues an opening command to the drive opening and closing valve of the continuous injection system to start the air. Jet of flow AF. Then, the state in which the air flow AF is ejected toward the substrate surface on the upstream side in the substrate moving direction X to the supply position PS1 (see FIG. 16) of the coating liquid is maintained, and the supply of the coating liquid is started at the timing T1. Thereby, similarly to the fifth embodiment, the winding of the liquid flow CF of the coating liquid can be suppressed, and the generation of the ball can be suppressed.

However, there are cases in which continuous blowing is not always sufficient to suppress the ball. Therefore, in the seventh embodiment, at the timing T1, the valve control unit outputs an opening command to the pulse driving unit to additionally perform pulse blowing. The pulsed air flow AF instantaneously presses only the beginning of the wiring pattern LP by the additional pulse blowing, so that the coating liquid is more effectively prevented from being wound up. Moreover, even if a ball is generated, the pulse blowing will crush it and form it into a flat shape. As a result, compared with the fifth embodiment, the suppression effect of the ball generation and the suppression effect of the start position deviation can be further improved, and a more preferable line pattern LP can be formed.

When the terminal of the linear pattern LP is approached, the valve control unit 140 issues an open command to the drive opening and closing valve of the continuous injection system at a timing slightly earlier than the discharge stop time point (timing T3) of the coating liquid. On the other hand, continuous blowing is started, and an on command is issued to the pulse driving unit 150 to start pulse blowing. Thus, the rear end of the line pattern LP is formed into a flat shape by the pulse blowing immediately before the timing T3, thereby improving the beauty of the line pattern LP. View.

In the seventh embodiment, the linear pattern LP is shaped by pulse blowing, and the continuous blowing and the pulse blowing are combined to suppress the generation of the ball at the start end portion LPa and the occurrence of the trailing end portion LPb. Therefore, the line pattern LP can be formed more preferably.

In the above-described embodiment, the pulse interval is fixed. However, similarly to the modification of the second embodiment, the PWM interval shown in FIG. 9 can be appropriately changed in consideration of the effect of the pulse injection. Change (frequency modulation).

In the above-described first to seventh embodiments, the present invention is applied to a so-called four-channel pattern forming apparatus including four coating liquid nozzles 2, but the number of nozzles is not limited thereto. Further, the plurality of coating liquid nozzles 2 are integrated in the plurality of nozzle groups 3, but the present invention can also be applied to a pattern forming apparatus in which a plurality of coating liquid nozzles are separately provided.

In the above-described embodiment, the present invention is applied to the pattern forming apparatus 1 in which the coating liquid discharge control unit 4 is provided for all of the coating liquid nozzles 2. However, at least one or more coating liquids may be applied to the coating liquid discharge control unit 4. The present invention (eighth embodiment) is applied to a pattern forming apparatus in which a nozzle is provided with a coating liquid discharge control unit. Hereinafter, an eighth embodiment of the present invention will be described with reference to Figs. 20 to 23 .

<Eighth Embodiment>

Fig. 20 is a view showing an eighth embodiment of the pattern forming apparatus of the present invention. The pattern forming apparatus 1 is a device which applies a coating liquid containing a material for forming a pattern onto a substrate and hardens it, and is applicable to, for example, forming a wiring pattern on a substrate having a photoelectric conversion surface to manufacture a photovoltaic The technology of converting components. Further, according to the following technical background, the coating liquid discharge control unit is provided only for a part of the coating liquid nozzle, and the gas discharge device 1C is provided. That is, the shape of the substrate to be patterned by the pattern forming apparatus 1 is various. For example, as a single crystal germanium substrate used as a substrate of a solar cell, there is an octagonal shape in which four corners of a square are cut out. The reason for this is that the area of the circular single crystal germanium wafer is effectively utilized. Therefore, the length of the pattern to be formed at the position corresponding to the four corners is intended to be formed The patterns of other locations are different in length.

Therefore, in the pattern forming apparatus 1 of the eighth embodiment, the coating liquid discharge control unit is provided to the coating liquid nozzle 2 that discharges the coating liquid at positions corresponding to the four corners. More specifically, among the 26 nozzles arranged in a row in the arrangement direction, the coating liquid discharge control unit is provided only for the three most upstream sides and the most downstream side of the arrangement direction. Therefore, by controlling the ejection of the coating liquid and the ejection stop, the substrate which is not rectangular (hereinafter referred to as "shaped substrate") can be efficiently formed by coating.

In the pattern forming apparatus 1, a stage moving mechanism 200 is provided on the base 710, and the stage 300 holding the substrate W is movable in the X-Y plane shown in Fig. 20 by the stage moving mechanism 200. A frame 721 is fixed to the base 710 so as to straddle the platform 300, and the coating head 500 is attached to the frame 721.

The platform moving mechanism 200 includes an X-direction moving mechanism 210 that moves the platform 300 in the X direction, a Y-direction moving mechanism 220 that moves the platform 300 in the Y direction, and a θ that rotates the platform 300 about the axis in the Z direction. Rotating mechanism 230. The X-direction moving mechanism 210 has a structure in which a ball screw 212 is connected to the motor 211, and a nut 213 fixed to the Y-direction moving mechanism 220 is attached to the ball screw 212, and a guide rail 214 is fixed above the ball screw 212. When the motor 211 rotates, the Y-direction moving mechanism 220 and the nut 213 smoothly move along the guide rail 214 in the X direction.

The Y-direction moving mechanism 220 also includes a motor 221, a ball screw mechanism, and a guide rail 224. When the motor 221 rotates, the θ rotation mechanism 230 moves in the Y direction along the guide rail 224 by the ball screw mechanism. The θ rotation mechanism 230 rotates the stage 300 by the motor 231. Furthermore, the center of rotation is the Z-axis. According to the above configuration, the relative moving direction and orientation of the coating head 500 with respect to the substrate W can be changed. Each of the motors of the platform moving mechanism 200 is controlled by a control unit 600 that controls the operation of each unit of the apparatus.

Further, between the θ rotation mechanism 230 and the stage 300, a platform elevating mechanism 240 is provided. The platform lifting mechanism 240 raises the platform 300 according to a control command from the control unit 600. Lower, the substrate W is positioned at the designated height (Z-direction position). As the platform elevating mechanism 240, for example, a person formed by an actuator such as a solenoid or a piezoelectric element, a person formed by a gear, and a mesh formed by engagement of a wedge can be used.

A coating liquid supply unit 520 is provided on the base 510 of the coating head 500, and a liquid (paste) coating liquid is stored therein, and the coating is ejected onto the substrate W according to a control command from the control unit 600. Cloth liquid. The coating liquid supply unit 520 includes a syringe pump 521 that stores a coating liquid inside a cavity, and a plunger 524 that is inserted into an internal space of the pump 521. The plunger 524 is driven up and down by an actuator such as a motor or a solenoid that is driven and controlled by the control unit 600, compressed air, or the like, and pressurizes the coating liquid stored in the internal space of the syringe pump 521.

Further, a plurality of nozzle groups 550 are attached to the lower portion of the coating liquid supply unit 520. The multi-string nozzle group 550 is formed by integrating 26 coating liquid nozzles (not shown) that eject the coating liquid onto the substrate W, and the liquid nozzles are applied and arranged in a row in the Y direction. That is, in the pattern forming apparatus 1, the Y direction is the arrangement direction of the coating liquid nozzles. In addition, the coating liquid nozzle is connected to the coating liquid supply unit 520, and the coating liquid pumped from the coating liquid supply unit 520 is applied along the coating liquid provided inside. The flow path is guided and can be ejected from the ejection outlet 551. In the six coating liquid nozzles, the coating liquid discharge control unit 560 is attached to the three coating liquid nozzles on the most upstream side in the Y direction and the three coating liquid nozzles on the most downstream side, and the remaining center side is coated with 20 coatings. The coating liquid discharge nozzle is not provided with the coating liquid discharge control unit. Therefore, the syringe pump 521 is actuated by the action of the plunger 524, whereby the coating liquid is pumped to the respective coating liquid nozzles provided in the plurality of nozzle groups 550, and the coating liquid ejection control unit is not provided. In the center of the 560, the 20 coating liquid nozzles of the 560 are directly sprayed out of the coating liquid, and the coating liquid is ejected from the total of six coating liquid nozzles of the three most upstream and three most downstream sides. The rotation axis (not shown) of the control unit 560 is rotated, and the discharge of the coating liquid is individually turned on and off for each of the discharge ports 551. The basic configuration of the coating liquid discharge control unit 560 is the same as that employed in the coating liquid discharge device 1B. Further, a gas discharge device 800 is provided corresponding to the coating liquid nozzle provided with the coating liquid discharge control unit 560. Gas spray The basic configuration of the outlet device 800 is the same as that employed in the gas ejection device 1C described above.

Further, on the base 510 of the coating head 500, a light irradiation portion 530 that irradiates the substrate W with ultraviolet light (ultraviolet rays) is attached. The light irradiation unit 530 is connected to the light source unit 532 that generates ultraviolet light via the optical fiber 531. Although not shown in the drawings, the light source unit 532 includes a shutter that can be opened and closed in the light emitting portion, and can control the on, off, and light amount of the emitted light according to the opening and closing and the opening degree. The light source unit 532 is controlled by the control unit 600.

Fig. 21 is a view showing an example of a solar battery cell formed using the pattern forming device of Fig. 20. The solar cell unit S has a structure in which a surface of a single crystal germanium substrate W (a photoelectric conversion surface and a surface on which an antireflection film is provided) is provided, and a plurality of finger wiring patterns F having a narrow width are provided, and a cross section is provided. In these manners, a bus bar wiring pattern B having a wide width is provided. The finger wiring pattern F and the bus bar wiring pattern B are electrically connected at their intersections.

For example, the width and height of the finger wiring pattern F are set to about 50 μm, the width of the bus bar wiring pattern B is set to 1.8 mm to 2.0 mm, and the height is set to 50 μm to 70 μm, but the size is not limited thereto. The value of these.

The ruthenium substrate W is an octagonal shape which is formed by cutting four corners of a substantially square shape and is line symmetrical with respect to the central axis C. This shape is formed by forming a wafer into a disk shape from a wafer cut out of a single-crystal rod manufactured into a substantially cylindrical shape, and it is necessary to efficiently use the surface area thereof to fabricate the substrate W.

Therefore, the plurality of finger electrodes F formed on the substrate W have a fixed length on the rectangular portion RR which is regarded as a substantially rectangular shape at the central portion of the substrate W, but the shape is matched to the end region ER, each of which The length of the finger electrodes F is different. Specifically, any one of the plurality of electrodes Fr formed on the rectangular region RR has the same length which is slightly shorter than the length of the substrate W. On the other hand, the length of the electrode Fe formed on the end region ER is accompanied by the substrate. The W end face changes back and changes, and the closer to the end of the substrate, the shorter the length becomes. In the example of FIG. 21, 20 electrode patterns Fr of the same length are formed on the rectangular region RR at the center of the substrate, and three electrodes having different lengths are formed on the end regions ER at both end portions of the substrate. Pattern Fe. In addition, this is only an example, and the number of patterns is not limited to these, but the number of the coating liquid discharge control units 560 must be set in accordance with the number of electrode patterns Fe provided on the end portion region ER. Correspondence.

The prior art in which a plurality of coating liquid nozzles which are controlled to be connected to each other by a plurality of coating liquid nozzles are integrally moved relative to each other to form a pattern (for example, Japanese Patent Laid-Open Publication No. 2011-60873) cannot cope with such a shape. Substrate. Further, the specific technique for individually turning on and off the respective coating liquid nozzles has not been put into practical use until now. On the other hand, in the pattern forming apparatus 1 of the present embodiment, the coating liquid discharge control unit 560 having the same configuration as that of FIG. 2 is provided, and the coating liquid discharge control unit 560 controls the discharge of the coating liquid and the discharge stop. Thus, even in the case of the irregular substrate as shown in FIG. 21, pattern formation can be performed efficiently.

Fig. 22 is a view schematically showing a state in which the finger electrodes are formed by the apparatus of Fig. 20. As shown in the figure, in the apparatus 1, the multi-string nozzle group 550 is relatively scanned in the (-X) direction with respect to the surface of the substrate W by moving the stage 300 on which the substrate W is placed in the X direction. . 26 discharge ports 551 are provided on the lower surface of the plurality of nozzle groups 550, and the discharge ports 551 are arranged in a row at equal intervals in the Y direction. The size of the multi-string nozzle group 550 in the Y direction is equal to or greater than the size of the substrate W in this direction. Therefore, the finger electrode patterns Fr and Fe can be formed on the entire surface of the substrate W by performing the scanning movement of the plurality of nozzle groups 550 with respect to the substrate W only once.

As the coating liquid, a conductive paste, that is, a paste having conductivity and photocurability and containing, for example, conductive particles, an organic vehicle (a mixture of a solvent, a resin, a tackifier, and the like) and a photopolymerization initiator can be used. a mixture of forms. The conductive particles are, for example, silver powder used as a material of the electrode, and the organic vehicle contains ethyl cellulose as a resin material and an organic solvent. Further, the viscosity of the coating liquid is preferably 50 [Pa. before the hardening treatment by light irradiation. s] below, after performing hardening treatment is 350 [Pa. s] above.

The coating liquid immediately after being ejected from the ejection outlet 551 toward the surface of the substrate W is irradiated with the coating liquid. The light emitted from the light-irradiating portion 530 disposed behind the ejection port 551 in the scanning movement direction (-X direction) of the cloth liquid nozzle. Thereby, the coating liquid is hardened while maintaining the cross-sectional shape immediately after the ejection, and the electrode patterns Fr and Fe are formed. By appropriately setting the shape of the discharge port 551, the viscosity of the coating liquid, and the light irradiation conditions, a pattern having various cross-sectional shapes can be formed, and in particular, a ratio of the pattern height to the pattern width, that is, a pattern having a relatively high aspect ratio can be formed.

Fig. 23 is a flow chart showing the pattern forming process of the eighth embodiment. This processing is performed using a plurality of nozzle groups 550 having 26 ejection ports 551 corresponding to the number of patterns to be formed. The coating liquid discharge control unit 560 is provided to the coating liquid nozzle that is connected to each of the three discharge ports 551 on the most upstream side in the Y direction and the three discharge ports 551 on the most downstream side in the discharge port 551, independently. The discharge and discharge stop of the coating liquid from each of the discharge ports 551 are controlled. Therefore, in the state where the discharge from the most upstream three discharge ports 551 and the most downstream three discharge ports 551 is stopped by the coating liquid discharge control unit 560, the coating liquid is supplied from the coating liquid supply unit 520. When the coating liquid nozzle is pressure-fed, the coating liquid is simultaneously discharged from the center side 20 discharge ports 551. Thereafter, each of the coating liquid discharge control units 560 rotates the rotary shaft, whereby the discharge of the coating liquid from each of the discharge ports 551 can be individually controlled. Further, the symbols P1 to P3 and P24 to P26 shown in Fig. 22 are used to specify the symbols for ejecting the ejection ports of the end regions ER. In other words, the discharge ports located at the outermost of the 26 discharge ports are indicated by the symbols P1 and P26, and the discharge ports from the inside to the inside are indicated by the symbols P2 and P25, and the discharge ports from the inside to the inside are indicated as Symbols P3, P24. The remaining 20 ejection ports except for these are used for the formation of the pattern Fr of the rectangular region RR. The discharge ports P1 to P3 and P24 to P26 are respectively subjected to the discharge control of the discharge control by the coating liquid discharge control unit 560 at a timing different from the other discharge ports, and the discharge ports are hereinafter referred to as "control". Object spray outlet".

In this process, the substrate W is first carried into the pattern forming apparatus 1 and the surface on which the pattern is to be formed is placed on the stage 300 (step S101). Moreover, the rotation axis of the coating liquid discharge control unit 560 is rotated about the axis, and the discharge from the discharge ports P1 to P3 and P24 to P26 is stopped (step S102). Specifically, for example, the coating liquid of "Nozzle No. 1" in FIG. Similarly, the ratio of the communication between the upstream side flow path and the downstream side flow path is set to 0 [%].

In this state, the platform 300 is moved in the X direction by the stage moving mechanism 200 (step S103), and the plurality of nozzle groups 550 are moved right above the X-direction end of the substrate W. Then, the coating liquid is pressurized by the syringe pump 521 and the substrate W is moved in the X direction (step S104). Accordingly, the coating liquid was discharged only from the 20 discharge ports 551 located at the center portion. Thereby, the pattern Fr of the rectangular region RR is formed.

Thereafter, the control target discharge port is sequentially opened in the following order (step S105). In other words, after a certain period of time has elapsed since the start of the pressurization of the syringe pump 521, the discharge from the discharge ports P3 and P24 closest to the center of the control target discharge port is first released, and the coating liquid flow path is opened. Subsequently, the discharge ports P2, P25 adjacent to the outer sides are opened, and finally the outermost discharge ports P1, P26 are opened. Thereby, in the end region ER of the substrate W, the pattern Fe having different starting positions is formed in accordance with the opening timing of the discharge port. In the same manner as in the first embodiment to the third embodiment, the supply of the air flow from the gas discharge device 800 is controlled in accordance with the start of the discharge of the coating liquid to prevent the start of the electrode pattern (linear pattern) from becoming spherical. , or the deviation of the starting position.

While maintaining this state, the scanning movement of the plurality of nozzle groups 550 with respect to the substrate W is continued, thereby forming 26 electrode patterns parallel to each other on the substrate W. This state is continued until the substrate W reaches the specific position (step S106), and the discharge ports P1 to P3 and P24 to P26 are sequentially closed in the order reverse to the order of opening (step S107). That is, the outermost discharge ports P1, P26 are closed, and then the discharge ports P2, P25 adjacent thereto are closed. Further, the innermost discharge ports P3 and P24 are closed. With the closing of the discharge port, the coating liquid from the discharge port is patterned in a sequence with a slight time difference. Therefore, the terminal positions of the patterns are also different. In the same manner as in the first embodiment to the third embodiment, the supply of the air flow from the gas discharge device 800 is controlled in accordance with the stop of the discharge of the coating liquid to suppress the occurrence of smearing at the end of the electrode pattern (linear pattern).

This completes the pattern formation on the end region ER on the terminal side, and if so, When the mouth group 550 reaches the end of the rectangular area RR, the pressurization from the syringe pump 521 is stopped (step S108). Thereafter, the movement of the stage 300 is stopped (step S109), and the substrate W on which the finger electrode patterns F (Fr, Fe) are formed is carried out (step S110), and the processing is completed.

According to the pattern forming process as described above, the pattern Fr which is parallel to each other and has the same length is formed on the rectangular region RR at the central portion of the substrate W. On the other hand, on the end region ER at both ends of the substrate, the closer to the outside of the substrate W, the later the formation of the pattern starts, and the earlier the formation is completed. Since the substrate W and the plurality of nozzle groups 550 are relatively moved at a fixed speed, the difference in timing is reflected on the position of the beginning and the end of the pattern on the substrate W, and finally the finger electrode patterns as shown in FIGS. 21 and 22 are formed. F. During this period, the scanning movement of the multi-string nozzle group 550 with respect to the substrate W is only one time.

In addition, the coating liquid discharge control unit 560 is provided to the coating liquid nozzle in accordance with each of the control target discharge ports 551, and the discharge from the discharge port 551 and the discharge stop are individually controlled by the rotation of the rotary shaft. . Therefore, for one of the plurality of linear patterns simultaneously formed by the scanning movement of the plurality of strings of nozzle groups 550, the start position and the end position of the pattern can be made different from the other patterns. As a result, even if it is a deformed substrate as shown in FIG. 21 or FIG. 22, a pattern can be formed efficiently on the whole surface. In addition, the supply of the air flow from the gas discharge device 800 is controlled in the same manner as in the above embodiment in accordance with the start of the discharge of the coating liquid and the discharge stop. Therefore, the substrate W or the device is not contaminated, and the pattern can be formed in a good shape on the substrate W.

Moreover, the rotation axis of the coating liquid discharge control unit 4 is attached to the coating liquid nozzle including the control target discharge port 551, and the discharge of the coating liquid from the discharge port 551 is controlled by the rotation of the rotary shaft, so that it does not There is deformation of the constituent parts, and the high-precision discharge control of the coating liquid can be stably performed.

Further, the coating liquid discharge control unit 560 is disposed at a position different from each other in the direction orthogonal to the arrangement direction Y, that is, arranged in a zigzag shape or in a staggered shape, so that the coating liquid discharge control unit 4 can be prevented from interfering with each other. Moreover, the distance between the coating liquid nozzles can be narrowed. The result is that The interval between the patterns formed by the pattern forming device 1 can be narrowed.

Further, in the eighth embodiment, only the gas ejection device 800 is provided to control the shape of the pattern. However, the pattern shaping device 1D may be provided instead of the gas ejection device 800, or the pattern shaping device 1D may be provided together with the gas ejection device 800. . In such a case, the air flow from the pattern shaping device 1D is supplied to the start and end portions of the pattern Fe to perform pattern shaping, so that the pattern Fe and the pattern Fr can be approximated, and an excellent aesthetic feeling can be obtained. Moreover, the following effects can be obtained by arranging the light irradiation unit 530 behind the pattern shaping device 1D. In other words, the coating liquid is cured in a state in which the cross-sectional shape immediately after shaping by the pattern shaping device 1D is maintained, and the electrode pattern Fe is formed. By appropriately setting the shape of the discharge port 551, the viscosity of the coating liquid, and the light irradiation conditions, and appropriately setting the shaping conditions of the pattern shaping device 1D, a pattern having various cross-sectional shapes can be formed, and in particular, the pattern height can be formed with respect to the pattern. The ratio of the widths, that is, the pattern having a relatively high aspect ratio, and the electrode pattern Fr and the electrode pattern Fe can be formed in an approximate shape.

As described above, in the above-described embodiment, the stage moving mechanisms 1A and 200 correspond to an example of a "mobile device" that relatively moves the substrate W in the first direction with respect to the coating liquid nozzle. Further, the substrate moving direction X, the discharge direction D2, and the ejection direction D3 correspond to the "first direction", the "second direction", and the "third direction" of the present invention, respectively. Further, the pulse blowing system 132 and the continuous blowing system 131 correspond to an example of the "first supply system" and the "second supply system" of the present invention, respectively.

In the above embodiment, the gas ejection device 1C corresponds to an example of the "airflow blowing device" of the present invention, and the pattern shaping device 1D corresponds to an example of the "pattern shaping device" of the present invention. The gas nozzles 120 and 170 correspond to an example of the "first gas nozzle" and the "second gas nozzle" of the present invention, respectively. Each of the gas supply units 130 and 180 corresponds to an example of the "first gas supply unit" and the "second gas supply unit" of the present invention.

In the first embodiment and the fifth embodiment, the valve control unit 140 corresponds to an example of the "first gas supply control unit", and is in the second embodiment, the third embodiment, and the sixth embodiment. In the embodiment and the seventh embodiment, the valve control unit 140 and the pulse drive unit 150 function as the "first gas supply control unit" of the present invention. In the fourth embodiment to the seventh embodiment, the valve control unit 140 and the pulse drive unit 150 function as the "second gas supply control unit" of the present invention. Further, the light irradiation unit 530 corresponds to an example of the "pattern hardening portion" of the present invention.

<Other>

The present invention is not limited to the above-described embodiments, and various modifications may be made without departing from the scope of the invention. For example, in the above embodiment, the nozzle holder 110 is provided with a plurality of through holes in a zigzag shape and at different inclination angles, and the gas nozzles 120 are disposed in the respective through holes. By adopting such an arrangement relationship, it is possible to prevent the gas nozzles 120 from interfering with each other and to narrow the pitch, and it is also possible to correspond to the narrowing of the pattern interval. However, the arrangement relationship of the gas nozzles 120 is not limited thereto, and may be arranged, for example, in a row. In this regard, the same applies to the gas nozzle 170.

In addition, in the first embodiment to the third embodiment, the fifth embodiment, and the seventh embodiment, the injection of air from the gas nozzle is controlled in accordance with any of the discharge start and the discharge stop of the coating liquid. The air injection control may be performed only in accordance with the start of the discharge of the coating liquid, or conversely, the air injection control may be performed only in accordance with the discharge stop of the coating liquid. Further, when it is necessary to shape a portion other than the start end portion and the end portion of the line pattern, the portion may be used as the "shaped portion" of the present invention, and the portion may be jetted with air in a pulsed manner. Plastic surgery.

Further, in the above-described embodiment, the coating liquid nozzle and the gas nozzle are fixedly arranged, and the substrate W is moved in the X direction to form a linear pattern. However, the coating liquid nozzle and the gas nozzle may be integrally formed. The X direction moves to form a line pattern. That is, the present invention is generally applicable to a pattern forming technique for forming a line pattern by relatively moving the substrate W with respect to the nozzle in the X direction.

Further, in the above embodiment, air is blown to the liquid flow CF of the coating liquid, but The "gas" of the present invention is not limited thereto, and it may be configured such that nitrogen gas is ejected from the gas nozzle as the "gas" of the present invention.

The present invention is generally applicable to a pattern forming technique in which a coating liquid is supplied linearly from a coating liquid nozzle to a substrate that relatively moves with respect to the coating liquid nozzle to form a linear pattern. Further, in order to control the shape of the pattern, the shape of the pattern can be favorably controlled by providing only the gas ejection device (airflow blowing device) 1C, providing only the pattern shaping device (pattern shaping device) 1D, or both. Further, regarding the pattern shaping device, a technique for forming a pattern on a substrate is generally applicable, and patterning can be performed for any pattern.

1A‧‧‧ platform moving mechanism

1C‧‧‧ gas ejection device

2‧‧‧ Coating liquid nozzle

21‧‧‧Spray outlet

110‧‧‧Nozzle holder

120‧‧‧ gas nozzle

130‧‧‧Gas Supply Department

131‧‧‧Continuous blowing system

131a‧‧‧Pipe

131b‧‧‧Regulator

131c‧‧‧ needle valve

131d‧‧‧Drive on-off valve

140‧‧‧Valve Control Department

AF‧‧‧Air flow

CF‧‧‧ (coating liquid) flow

D2‧‧‧Spray direction

D3‧‧‧jet direction

LP‧‧‧Line pattern

PS1‧‧‧ supply location

W‧‧‧Substrate

X‧‧‧ substrate moving direction

Claims (21)

A shape control device characterized in that a pattern is formed on a surface of a substrate by a linear coating liquid, and the linear coating liquid is ejected from a discharge port of the coating liquid nozzle to be coated with respect to the coating a surface of the substrate that moves relative to the first direction in the first direction; the shape control device includes at least one of a gas flow blowing device and a pattern shaping device, wherein the airflow blowing device corresponds to a discharge start of the coating liquid and At least one of the discharge stops, the gas is ejected toward the surface of the substrate on the upstream side in the first direction with respect to the supply position of the coating liquid, and the discharge port of the coating liquid nozzle and the substrate are The liquid flow is blown to the liquid of the coating liquid in the middle of the surface; the pattern shaping device sprays and shapes the pattern on the surface of the substrate in a pulsed manner; and controls the shape of the pattern by the gas. The pattern forming apparatus according to claim 1, wherein the airflow blowing device includes: a first gas nozzle disposed on a downstream side of the first direction with respect to the coating liquid nozzle; and a first gas supply unit that supplies a gas The first gas nozzle and the first gas supply control unit control the supply of the gas in the first gas supply unit. The pattern forming apparatus according to claim 2, wherein the coating liquid nozzle is disposed on the upstream side of the first direction toward the supply position with respect to the supply position of the coating liquid toward the supply position, and the first gas supply The part ejects the gas in a third direction orthogonal to the second direction in which the coating liquid is supplied. The pattern forming apparatus of claim 2, wherein the first gas supply unit includes a first supply In the first system, the first supply system switches the supply and supply of the gas to the first gas nozzle in response to a command from the first gas supply control unit, and the first gas supply control unit repeatedly supplies the first supply. The system performs the supply of the gas and the supply stop, and performs a pulse injection of the gas from the first gas nozzle in a pulsed manner. The pattern forming apparatus according to claim 4, wherein the first gas supply control unit starts the pulse injection immediately before the discharge of the coating liquid. The pattern forming apparatus according to claim 5, wherein the first gas supply control unit compares the pressure of the gas stream applied to the liquid flow of the coating liquid by the pulse jet after the start of the discharge of the coating liquid, The pressure of the gas stream applied to the liquid flow of the coating liquid by the above-described pulse jet is more enhanced immediately before the discharge of the cloth liquid is started. The pattern forming apparatus according to claim 4, wherein the first gas supply control unit stops the supply of the gas after the discharge of the coating liquid is stopped. The pattern forming apparatus according to claim 7, wherein the first gas supply control unit is configured to cause a pressure of the gas stream applied to the liquid flow of the coating liquid by the pulse jet after the discharge of the coating liquid is stopped, The pressure of the liquid flow applied to the coating liquid by the above-described pulse jet is more weakened immediately before the discharge of the coating liquid is stopped. The pattern forming apparatus according to claim 4, wherein the first gas supply unit further includes a second supply system, and the second supply system switches the gas to the first gas nozzle in response to an instruction from the first gas supply control unit When the supply and the supply are stopped, the first gas supply control unit maintains the supply of the gas in the second supply system, and performs the gas from the first gas nozzle in accordance with the discharge start and the discharge stop of the application liquid. Continuous jet of ground spray. The pattern forming apparatus of claim 9, wherein the first gas supply control unit is from the top The continuous injection by the second supply system immediately before the start of the discharge of the coating liquid is performed, and the pulse injection of the first supply system is additionally performed from the discharge start time of the coating liquid. The pattern forming apparatus according to claim 9, wherein the first gas supply control unit stops the continuous injection of the second supply system after the discharge of the coating liquid is stopped, and before the discharge of the coating liquid is stopped and after the discharge is stopped At least one of the above-described pulse injection of the first supply system is additionally performed. The pattern forming apparatus according to claim 1, wherein the pattern shaping device includes: a second gas nozzle disposed to face a pattern formed on the substrate; and a second gas supply unit that supplies gas to The second gas nozzle sprays the gas from the second discharge port in a pulsed manner, and when the second discharge port faces the shaped portion of the pattern, the gas is sprayed from the second discharge port in a pulsed manner. It is shaped by the shaping department. The pattern shaping device according to claim 12, further comprising: a second gas supply control unit that controls supply of the gas to the second gas nozzle by the second gas supply unit, wherein one end of the pattern and At least one of the other end portions is the shaped portion, and the second gas supply control unit enters the region where the gas is pulsed from the second discharge port by the relative movement of the substrate in the shaped portion. At the time of the second gas supply unit, the supply of the gas to the second gas nozzle is performed. The pattern forming device of claim 12, wherein the time width at which the gas is ejected is longer than 0.1 [msec] and shorter than 5 [msec]. The pattern forming device of claim 14, wherein the time width of the gas is short At 2 [msec]. The pattern forming apparatus according to claim 15, wherein the time width at which the gas is ejected is 0.5 [msec] or more and 1 [msec] or less. The pattern forming apparatus according to claim 2, wherein the pattern shaping device includes: a second gas nozzle having a second discharge port facing the downstream side of the first gas nozzle in the first direction; and a second discharge port facing the substrate And a second gas supply unit that supplies gas to the second gas nozzle, and causes the gas to be pulsed from the second discharge port; and the second discharge port is shaped toward the pattern At the time of the part, the shaped portion is shaped by spraying the gas from the second discharge port in a pulsed manner. The pattern forming apparatus according to any one of claims 12 to 17, comprising a pattern-cured portion that hardens the pattern on a downstream side of the second gas nozzle in the first direction. A pattern forming method is characterized in that a pattern is formed on a surface of a substrate by a linear coating liquid, and the linear coating liquid is ejected from a second ejection port of the coating liquid nozzle to a relative The pattern forming method performs at least one of the following steps and controls the shape of the pattern by the coating liquid nozzle on the surface of the substrate that relatively moves in the first direction: the first step corresponds to the coating liquid At least one of the discharge start and the discharge stop, the gas is ejected toward the surface of the substrate on the upstream side in the first direction with respect to the supply position of the substrate by the coating liquid, and is the second in the coating liquid nozzle. a flow of the liquid to the coating liquid is blown between the discharge port and the surface of the substrate; and a second step of injecting a gas into the pattern formed on the surface of the substrate in a pulsed manner. The pattern forming method of claim 19, wherein the first step and the second step are performed together. The pattern forming method of claim 20, further comprising a third step of hardening the pattern shaped by the second step.