CN104299927A - Pattern forming apparatus and pattern forming method - Google Patents
Pattern forming apparatus and pattern forming method Download PDFInfo
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- CN104299927A CN104299927A CN201410250180.9A CN201410250180A CN104299927A CN 104299927 A CN104299927 A CN 104299927A CN 201410250180 A CN201410250180 A CN 201410250180A CN 104299927 A CN104299927 A CN 104299927A
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/05—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells
- H01L31/0504—Electrical interconnection means between PV cells inside the PV module, e.g. series connection of PV cells specially adapted for series or parallel connection of solar cells in a module
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Sustainable Development (AREA)
- Electromagnetism (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Energy (AREA)
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Nozzles (AREA)
Abstract
The invention provides a pattern forming apparatus and a pattern forming method, allowing line patterns to be formed on a substrate in good shapes. The pattern forming apparatus comprises at least one of an air blowing unit (1C) and a patter shaping unit. The air blowing unit (1C) corresponds to starting or stopping of spraying of coating liquid, sprays air onto the surface, closer to the upstream side than a supply position (P1) where the coating liquid is supplied to the substrate (W) along a first direction (X), of the substrate (W), and blows air (AF) to the liquid flow of the coating liquid between a spray opening (21) of a coating liquid nozzle (2) and the surface of the substrate. The pattern shaping unit shapes a pattern (LP) formed on the surface of the substrate (W) through spraying air onto the pattern (LP) in a pulsed manner.
Description
Technical field
The present invention relates to from coating liquid nozzle to the substrate relative to this coating liquid nozzle movement is that wire supply coating liquid is to form the pattern formation technology of pattern.
Background technology
As the device applying this pattern formation technology, the such as known patterning device forming wiring pattern isogram(s) case (line pattern) on the substrate of solar cell device.In this patterning device, substrate is moved to prescribed direction, while start coating liquid nozzle supply coating liquid (electrode cream) from fixed configurations in the process of substrate movement, then stop supply coating liquid.Thus, the line pattern of the length corresponding with the supply continuation time is formed on a surface of a substrate.Following problem may be produced at the top of the line pattern formed like this and end.That is, may englobement at the top thread end of line pattern.In addition, the afterbody (wire drawing) of coating liquid may be produced at the end of line pattern.Especially, in order to form wiring pattern, may use that ratio of viscosities is higher, such as shear rate is 1s
-1time there is the electrode cream of the viscosity of tens of pas (pascal second) ~ hundreds of pa8, these become important problem.
Therefore, in order to remove the problems referred to above, proposing such as to be applied in JP and opening the technology recorded in clear 62-183584 publication in fact.That is, with regard to this technology proposed, by spraying the generation that air suppresses afterbody (tail) from air nozzle.
But, open in the device recorded in clear 62-183584 publication in fact at above-mentioned JP, the glue sprayed from glue nozzle (being equivalent to " coating liquid " of the present invention) is coated in be transferred machine carrying cardboard (carton) on, and spray forced air to the direction that the liquid stream with glue is vertical.Afterbody is suppressed to produce by this air stream.But, forced air towards identical with the moving direction of cardboard, the glue that pressurized air dispels disperses and causes polluting cardboard and device.In addition, completely invalid to the technical problem that thread end englobement is such.
In addition, one of important performance of patterning device is, the pattern be formed on substrate is processed into desired shape.Therefore, wish to there is following technology, that is, after forming the pattern on substrate, this pattern is shaped to desired shape.
Summary of the invention
The present invention proposes in view of the above problems, and its object is to provides a kind of pattern formation technology that can form line pattern on substrate with good shape.
The patterning device of a mode of the present invention, by from the ejiction opening of coating liquid nozzle to the coating liquid of the wire sprayed to the surface of the substrate of first direction movement relative to described coating liquid nozzle, the surface of described substrate forms pattern, it is characterized in that
This patterning device has at least one in airflow blow unit and pattern shaping unit, wherein, described airflow blow unit with start to spray described coating liquid and stop to spray in described coating liquid at least one accordingly, towards described substrate in said first direction than the surperficial gas jet of upstream side, supply position supplying described coating liquid to described substrate, and in the centre on the ejiction opening of described coating liquid nozzle and the surface of described substrate, to the liquid stream blow flow of described coating liquid; Described pattern shaping unit to the pattern on the surface being formed in described substrate be pulse type gas jet to carry out shaping, controlled the shape of described pattern by described gas.
In addition, the pattern formation method of alternate manner of the present invention, by from the second ejiction opening of coating liquid nozzle to the coating liquid of the wire sprayed to the surface of the substrate of first direction movement relative to described coating liquid nozzle, the surface of described substrate forms pattern, it is characterized in that
Perform at least one in the first operation and the second operation to control the shape of described pattern, wherein, in described first operation, with start to spray described coating liquid and stop to spray in described coating liquid at least one accordingly, towards described substrate in said first direction than the surperficial gas jet of upstream side, supply position supplying described coating liquid to described substrate, and in the centre on the second ejiction opening of described coating liquid nozzle and the surface of described substrate, to the liquid stream blow flow of described coating liquid; In described second operation, be that pulse type gas jet is to carry out shaping to the pattern on the surface being formed in described substrate.
In the invention formed like this, carry out at least one that the action to the liquid stream blow flow of coating liquid and the impulse jet by gas carry out the pattern on substrate in the action of pattern shaping, thus control the shape of pattern.
At this, at the air-flow that the centre on the ejiction opening of coating liquid nozzle and the surface of substrate supplies to the liquid stream of coating liquid, carry out the direction that pressure contacts to have an effect to making coating liquid and substrate, when not making coating liquid disperse, and start to spray coating liquid and stop at least one ejection in coating liquid to supply air-flow to the liquid stream of coating liquid accordingly.Such as by with start to spray coating liquid and supply the top englobement that air-flow suppresses line pattern accordingly, in addition, supply said flow accordingly to suppress and produce afterbody by spraying coating liquid with stopping at the end of line pattern.
On the other hand, to the pattern be formed on substrate be pulse type gas jet pressurize time, the pressurized position in pattern is shaped with the state be attached on substrate.At this, " in pulse type gas jet " refers to, repeatedly carry out gas injection and stop spray, carry out with not producing bad pattern pattern shaping in play an important role.That is, as described in detail in the back, when continuing continuous gas jet, dispersing in the position being subject to the pressure of gas in pattern, causes pattern bad.In contrast, by pulse type gas jet, can when not making the position of the pressure being subject to gas disperse towards periphery shaping pattern.
According to the present invention, can with the line pattern of shape formation well on substrate.
Accompanying drawing explanation
Figure lA and Figure 1B is the figure of the outward appearance of the patterning device that the first execution mode of the present invention is shown.
Fig. 2 is the cutaway view of the coating liquid blowoff that patterning device has.
Fig. 3 is the cutaway view of the B-B line cutting along coating liquid blowoff.
Fig. 4 A to Fig. 4 D is the figure schematically showing the ejection control action undertaken by coating liquid blowoff.
Fig. 5 is the figure of the structure schematically showing the gas discharge device that patterning device has.
Fig. 6 A and Fig. 6 B is the sequential chart of the action that the patterning device shown in figure lA is shown.
Fig. 7 is the figure of the structure of the gas discharge device that the patterning device schematically showing the second execution mode of the present invention has.
Fig. 8 is the sequential chart of an example of the action that the patterning device shown in Fig. 7 is shown.
Fig. 9 is the sequential chart of other example of the action that the patterning device shown in Fig. 7 is shown.
Figure 10 is the figure of the structure of the gas discharge device that the patterning device schematically showing the 3rd execution mode of the present invention has.
Figure 11 is the sequential chart of the action of the patterning device that the 3rd execution mode is shown.
Figure 12 is the figure of the patterning device that the 4th execution mode of the present invention is shown.
Figure 13 is the sequential chart of the action of the patterning device illustrated when not using pattern apparatus for shaping and form pattern.
Figure 14 is the sequential chart of the action of the patterning device illustrated when using pattern apparatus for shaping to form pattern.
Figure 15 is the figure schematically showing the top portion of pattern and the change of shape of terminal part caused along with the pulse width variation of gas injection.
Figure 16 is the figure of the patterning device that the 5th execution mode of the present invention is shown.
Figure 17 is the sequential chart of the action that the patterning device shown in Figure 16 is shown.
Figure 18 is the sequential chart of the action of the patterning device that the 6th execution mode is shown.
Figure 19 is the figure of the action of the patterning device that the 7th execution mode with pattern apparatus for shaping of the present invention is shown.
Figure 20 is the figure of the patterning device that the 8th execution mode of the present invention is shown.
Figure 21 is the figure of the example that the solar battery cell utilizing the patterning device of Figure 20 to be formed is shown.
Figure 22 schematically shows the figure being formed the situation of finger-like (finger) electrode by the device of Figure 20.
Figure 23 is the flow chart of the pattern formation processing that the 8th execution mode is shown.
Wherein, description of reference numerals is as follows:
11: patterning device
1A, 200: objective table travel mechanism (mobile unit)
1C: gas discharge device (airflow blow unit)
1D: pattern apparatus for shaping (pattern shaping unit)
2: coating liquid nozzle
4,560: coating liquid ejection control part
21, P1 ~ P3, P24 ~ P26:(coating liquid nozzle) ejiction opening
120:(first) gas nozzle
130:(first) gas supply part
131: continous blowing system (the second feed system)
132: pulse supply air system (the first feed system)
140: valve control part (gas supply control part)
150: pulsed drive portion (gas supply control part)
170:(second) gas nozzle
180:(second) gas supply part
530: illumination part (pattern cured portion)
AF: air stream (air-flow)
D2: emission direction (second direction)
D3: injection direction (third direction)
Fe: electrode pattern (line pattern)
LP: line pattern
LPa: top portion (being shaped portion)
LPb: terminal part (being shaped portion)
PS1:(coating liquid) supply position
PS2:(air) supply position
W: substrate
X: moving direction (first direction)
Embodiment
< first execution mode >
Figure lA and Figure 1B is the figure of the outward appearance of the patterning device that the first execution mode of the present invention is shown.In more detail, figure lA is the stereogram of patterning device, and Figure 1B is the end view of patterning device.This patterning device 1 is the device coating liquid of the material comprised for the formation of pattern, such as electrode cream be coated on substrate, such as, can be applicable to form wiring pattern in the technology manufacturing electrooptical device on the substrate with photoelectric conversion surface.
This patterning device 1 has: objective table travel mechanism (the Reference numeral 1A in Fig. 5), and it makes substrate W move to X-direction; Coating liquid blowoff 1B, it is that wire sprays 4 coating liquids towards the substrate W to X-direction movement; Gas discharge device 1C, it is to the liquid stream air supply stream of each coating liquid.And, while make substrate W move to X-direction with the translational speed of regulation by objective table travel mechanism lA, while spray coating liquid by coating liquid blowoff 1B with the spouting velocity equal with above-mentioned translational speed, thus the line pattern of maximum 4 can be formed on substrate W.Below, after being described the structure of coating liquid blowoff lB and gas discharge device lC, the action for patterning device 1 is described.
Coating liquid blowoff 1B have integrally maintain 4 coating liquid nozzles 2 connect spray nozzle part 3 more.That is, connect in spray nozzle part 3 at this, 4 coating liquid nozzles 2 form a line more, and in this orientation, the ejiction opening 21 of each coating liquid nozzle 2 exposes to the outer surface connecting spray nozzle part 3 in row more.In addition, each coating liquid nozzle 2 is provided with for controlling the coating liquid ejection control part 4 of coating liquid from the ejection of ejiction opening 21, above-mentioned 4 coating liquids ejection control part 4 separately can carry out action, controls to spray from the coating liquid of coating liquid supply unit 8 force feed from each ejiction opening 21.In addition, in the present embodiment, the orientation of coating liquid nozzle 2 is called " orientation P ", the emission direction that coating liquid sprays from each ejiction opening 21 is called " emission direction Q ", is called with above-mentioned orientation P and the crisscross of emission direction Q square crossing " crisscross R ".
Fig. 2 is by the A-A line of coating liquid blowoff shown in figure lB and the cutaway view parallel with the paper of Figure 1B, and Fig. 3 is the cutaway view of the B-B line cutting along the coating liquid blowoff shown in figure lB.Fig. 4 A to Fig. 4 D is the figure of the ejection control action schematically showing the coating liquid blowoff shown in figure lA and Figure 1B.This coating liquid blowoff 1B has: connect spray nozzle part 3 more, and it integrally maintains 4 coating liquid nozzles 2; 4 coating liquid ejection control parts 4; Support portion 5, it is for supporting the rotary driving part 41 of coating liquid ejection control part 4; Top bracket 6, it presses from upper side (side ,+R direction) and keeps being arranged on the structural elements of the coating liquid ejection control part 4 connected spray nozzle part 3 more; Bottom bracket 7, its from below side (side ,-R direction) press and keep coating liquid to spray the structural elements of control part 4.
As shown in Figure 3, connecting in spray nozzle part 3 more, be provided with the rectangular parallelepiped space extended along orientation P at-Q side end, play the function of the coating liquid reservoir 22 being used for the coating liquid that temporarily storage comes via entrance hole 51 force feed that the downside end in support portion 5 is arranged from coating liquid supply unit 8 (Figure 1B).4 coating liquid nozzles 2 from this coating liquid reservoir 22 with same shape are configured with row along orientation P with equidistant (in the present embodiment for the interval of 2mm).Each coating liquid nozzle 2 is that+Q direction is extended to emission direction, and top ends is connected with+Q the side end face connecting spray nozzle part 3 more, thus forms ejiction opening 21.Therefore, play the function of coating liquid stream 23 in the inside of coating liquid nozzle 2 from rectangular parallelepiped space portion 22 towards the cylindrical space with substantially elliptical cross section of ejiction opening 21, the coating liquid be stored in coating liquid reservoir 22 is guided to ejiction opening 21.Like this, in the present embodiment, the coating liquid from coating liquid reservoir 22 force feed distributed and guide to 4 coating liquid nozzles 2.
As shown in Figure 2, in each coating liquid nozzle 2, in the centre position of coating liquid stream 23, also side (side ,+R direction) and lower side (side ,-R direction) are formed with an opening 24 respectively up.In the present embodiment, in order to prevent coating liquid ejection control part 4 adjacent one another are from mutually interfering, the position arranging opening 24 is divided into two.Namely, as shown in Figure 3, for the coating liquid nozzle 2 that be the coating liquid nozzle 2 of " 1 " and nozzle number be " 3 " of the nozzle number by (+P) side, opening 24 is arranged on the position close to coating liquid reservoir 22, on the other hand, for the coating liquid nozzle 2 that be the coating liquid nozzle 2 of " 4 " and nozzle number be " 2 " of the nozzle number by (-p) side, opening 24 is arranged on the position close to ejiction opening 21.Like this, the opening 24 that adjacent one another are two coating liquid nozzles 2 are formed respectively, the emission direction Q vertical with orientation P is formed on position different from each other.In addition, be provided with through hole 31 connecting on spray nozzle part 3 more, this through hole 31 from the upper side opening 24 of coating liquid nozzle 2 upward (+R direction) extend, and, from open lower side 24 downward (-R direction) extend.Above-mentioned through hole 31 is for arranging the various structural elements (rotating shaft 42, containment member 43,44 and ball bearing 45,46) of the coating liquid ejection control part 4 then illustrated, the internal diameter of above-mentioned through hole 31 is greater than opening 24.In addition, each opening 24 has the identical size of the diameter (diameter of axle) of the rotating shaft 42 spraying control part 4 with coating liquid, and is greater than the width of coating liquid stream 23 on orientation P.
Each coating liquid ejection control part 4 has along the extended rotating shaft 42 of crisscross R.In the present embodiment, be that the stainless steel bar with shape shaft of 1mm is as rotating shaft 42 by diameter.The top ends of this rotating shaft 42, i.e. (-R) side end are inserted in through hole 31, and via two through coating liquid nozzles 2 of opening 24.
The part (hereinafter referred to " flow adjustment part 421 ") between two openings 24 in the top ends of this rotating shaft 42, is inserted in the coating liquid stream 23 of coating liquid nozzle 2.Further, as shown in Figure 3, the diameter due to flow adjustment part 421 is greater than the width of coating liquid stream 23 on orientation P, therefore by flow adjustment part 421, coating liquid stream 23 is divided into upstream-side channel 23U and downstream-side channel 23D.Wherein, flow adjustment part 421 is formed with notch part 423 in the mode of the side of cutting rotating shaft 42, coating liquid can be guided by this notch part 423 to+Q direction.In more detail, as shown in Figure 2, carry out on the direction (axial R) that intersects at rotating shaft 42 and coating liquid stream 23, notch part 423 has identical with the height H l of coating liquid stream 23 or is less than the height H 2 of height H l.In addition, on the Width P perpendicular with axial R and path direction Q, there is size relationship below.That is, as shown in Figure 4 A, the distance of " upstream side intersection point CPu " and " downstream intersection point CPd " is set to " W1 ".In addition, the external diameter of rotating shaft 42 on Width P is set to " W2 ".Further, if the width W n of notch part 423 is set to Wl<Wn<W2, then can carry out when every half-twist opening/closing.Therefore, it is possible to by controlling the connected state between upstream-side channel 23U and downstream-side channel 23D with rotating rotating shaft 42 multistage.
State when Fig. 4 A illustrates to make notch part 423 to position towards the state of downstream-side channel 23D rotating shaft 42.At this, be not provided with the part of notch part 423, i.e. non-notch part 424 towards upstream-side channel 23U to block coating liquid stream 23.Therefore, cut off upstream-side channel 23U and downstream-side channel 23D, the action spraying coating liquid from ejiction opening 21 is in closed condition.When rotating counterclockwise in this figure paper in this condition, to certain angle, coating liquid stream 23 is cut off, but upstream-side channel 23U starts to be communicated with downstream-side channel 23D when being above this certain angle, coating liquid flows and sprays (opening state) from ejiction opening 21 (with reference to Fig. 3) in coating liquid stream 23.When making rotating shaft 42 further rotate, the ratio of connection little by little becomes large, and when the anglec of rotation reaches 90 °, the ratio be communicated with as shown in Figure 4B becomes maximum.
In addition, when making rotating shaft 42 rotate counterclockwise further in this figure paper, the ratio of connection little by little diminishes, and again cuts off upstream-side channel 23U and downstream-side channel 23D, and the coating liquid ejection from ejiction opening 21 is in closed condition.Such as, when the state making rotating shaft 42 from Fig. 4 A rotates 180 °, notch part 423 is in the state towards upstream-side channel 23U, and non-notch part 424 blocks coating liquid stream 23 (such as Fig. 4 C) towards downstream-side channel 23D.Therefore, cut off upstream-side channel 23U and downstream-side channel 23D, the action spraying coating liquid from ejiction opening 21 is in closed condition.When rotating counterclockwise further in this figure paper in this condition, to certain angle, coating liquid stream 23 is cut off, but upstream-side channel 23U starts to be communicated with downstream-side channel 253D when being above this certain angle, coating liquid flows and again sprays (opening state) from ejiction opening 21 in coating liquid stream 23.When making rotating shaft 42 further rotate, the ratio of connection little by little becomes large, and when the state making rotating shaft 42 from Fig. 4 A rotates 270 °, as shown in Figure 4 D, the ratio of connection becomes maximum again.Like this, by making each half-twist of rotating shaft 42, mutually can switch closed condition and opening state.Certainly, also spray volume can be adjusted with carrying out the multistage by controlling position of rotation.
So in the present embodiment, can control spray coating liquid from ejiction opening 21 and stop spraying coating liquid from ejiction opening 21 by making rotating shaft 42 rotate, and, spray volume can also be adjusted with carrying out the multistage by controlling position of rotation.Certainly, through hole is set to replace notch part, also can carries out same ejection and control.In addition, to leak from rotating part to prevent coating liquid and rotating shaft 42 is stably rotated, in the present embodiment, there is following structure.
In through hole 31, the mode clamping coating liquid nozzle 2 from above-below direction (R direction) is provided with a pair containment member 43,44.That is, at the upper side of coating liquid nozzle 2, i.e. side ,+R direction, carry out at rotating shaft 42 and upper side opening 24 being configured with circular containment member 43 near the position that intersects.In addition, in the lower side of coating liquid nozzle 2, i.e. side ,-R direction, carry out at rotating shaft 42 and open lower side 24 being configured with circular containment member 44 near the position that intersects.And, in through hole 31, at the upper side of containment member 43, i.e. side ,+R direction, be provided with supporting rotating shaft 42 such as, with the rolling type bearing that can rotate freely, ball bearing 45.In addition, in containment member 44 side too, that is, in the lower side of containment member 44, i.e. side ,-R direction, supporting rotating shaft 42 is provided with the ball bearing 46 that can rotate freely.By above-mentioned two ball bearings 45,46, rotating shaft 42 is rotated freely in through hole 31.
Like this, configure containment member and ball bearing respectively up and down at coating liquid nozzle 2, but in the present embodiment, containment member 43,44 abuts against with the outer ring of ball bearing 45,46 respectively, on the other hand, containment member 43,44 is provided with incised notch portion and to produce gap between inner ring.In addition, also can use according to the condition such as drug resistance, sealing the O type circle be made up of fluorubber etc., replace containment member 43,44.
The bottom bracket 7 that the containment member 44 of the downside of such formation and ball bearing 46 are made up of stainless steel presses maintenance through the packing ring 47 of PTFE.At this, packing ring 47 carries out pressure with the outer ring of ball bearing 46 and contacts, and seals the coating liquid of leakage, thus the coating liquid of Leakage prevention falls from coating liquid blowoff 1B.In addition, bottom bracket 7 also plays the function of the bearing surface of the axle head of rotating shaft 42, the movement in the axial direction of restriction rotating shaft 42.
In addition, the containment member 43 of upside and ball bearing 45 press maintenance by top bracket 6.As shown in Figure 2, this top bracket 6 has: lid component 61 and cylinder element 62, and cylinder element 62 extends downward from the lower surface of lid component 61; This top bracket 6 is such as made up of stainless steel material.This lid component 61 is formed the through hole for inserting rotating shaft 42.In addition, cylinder element 62 is processed to can freely insert in through hole 31, and when inserting through hole 31, the outer ring only pressing ball bearing 45 with the lower surface of cylinder element 62 downwards keeps ball bearing 45 and containment member 43.
As shown in Figure 1A, Figure 1B and Fig. 2, the upper end of each rotating shaft 42, i.e.+R side end, be connected with rotary driving part 41 by shaft coupling, and the upper end with the word of falling L cross section of this rotary driving part 41 supported portion 5 supports.Each rotary driving part 41 is made up of miniature electric motor (the micro motor SLB series that such as Namiki Seimitsu Houseki K.K. manufactures) 411, decelerator 412 and encoder 413.The rotating shaft of miniature electric motor 411 is connected with rotating shaft 42 by decelerator 412.When 411 action of miniature electric motor, the rotation of the rotating shaft of miniature electric motor 411 is reduced to such as after 1/30 by decelerator 412, is passed to rotating shaft 42.
In addition, in the present embodiment, can be formed with close to miniature electric motor 411 cross-drilled hole that light is passed through on the rotary shaft, the output pulse signal when infiltration type photoelectric sensor detects this cross-drilled hole at every turn, thus the roughly angle that can detect rotating shaft.And, can the rotating shaft of miniature electric motor 411 often revolve turn around time, export pulsatile once signal from encoder 413.Further, use above-mentioned signal to determine initial point exactly, control to be formed in the position of rotation of the notch part 423 on rotating shaft 42 relative to coating liquid nozzle 2, thus spray volume can be controlled as described above.
Then, with reference to figure lA, Figure 1B and Fig. 5, while be described the structure of gas discharge device 1C.Fig. 5 is the figure of the structure schematically showing gas discharge device.This gas discharge device 1C has: nozzle holder 110, and it is connected on top bracket 6; 4 gas nozzles 120, are supported by nozzle holder 110; Gas supply part 130, it supplies compressed air to each gas nozzle 120; Valve control part 140, it controls air from gas supply part 130 to the supply of gas nozzle 120.
Nozzle holder 110 is such as made of aluminum, is arranged on top bracket 6 by not shown two mounting screws in the side ,+Q direction of top bracket 6.This nozzle holder 110 is provided with for making gas nozzle 120 insert the through hole fixed for each gas nozzle 120.In addition, in the present embodiment, as shown in figure lA, in order to make the top of gas nozzle 120 with the spacing aligned configuration of 2mm, by above-mentioned 4 through holes with staggered and arrange with different angles of inclination.
Cylindrically, and each gas nozzle 120 top ends is chamfered each gas nozzle 120.In more detail, in the present embodiment, external diameter is φ 1/16 inch and cut sth. askew and make in the top that aperture is the stainless steel pipe arrangement of φ 0.5mm.Further, 4 gas nozzles 120 are inserted in respectively in corresponding through hole, in the same manner as the gas vent of gas nozzle 120 to arrange with the ejiction opening of coating liquid nozzle 2 with the spacing of 2mm, are configured to row.In addition, by the not shown screw that holds out against, each gas nozzle 120 is fixed on nozzle holder 110.In addition, position and the angle of each gas nozzle 120 can be adjusted in the mode meeting configuration relation described below by holding out against screw.
Be fixed on 4 gas nozzles 120 on nozzle holder 110 and 4 coating liquid nozzles with 1 to 1 corresponding relation arrange as below.That is, on the moving direction X of substrate W, gas nozzle 120 is disposed in the downstream of coating liquid nozzle 2, to the liquid stream CF jet airstream AF of coating liquid.Specifically, when supplying compressed air from gas supply part 130 to this gas nozzle 120, air is sprayed at substrate moving direction X than the surface of supply position PS1 (with reference to Fig. 5) the upstream side supplying coating liquid to substrate W, in the centre on the ejiction opening 21 of coating liquid nozzle 2 and the surface of substrate W to the liquid stream CF blow air stream AF of coating liquid from gas nozzle 120 towards substrate.Especially, in the present embodiment, coating liquid nozzle 2 is positioned at the upstream side (left-hand side of Fig. 5) on substrate moving direction X relative to the supply position PS1 of coating liquid, ejiction opening 21 is configured towards supply position PSl, and the emission direction D2 come to the face normal slope relative to substrate W sprays coating liquid.In contrast, spray from the air of gas nozzle 120 injection to the injection direction D3 perpendicular with emission direction D2.In addition, injection direction D3 is not limited thereto, and also can be set in the imaginary plane (paper of Fig. 5) of the liquid stream CF and air stream AF that comprise coating liquid between 0 ° (direction parallel with substrate surface) and 90 ° (and substrate surface perpendicular direction).
In gas supply part 130, each gas nozzle 120 is provided with the continous blowing system 131 for compressed air being supplied to gas nozzle 120.As shown in Figure 5, continous blowing system 131 is made up of pipe arrangement 131a, adjuster (regulator) 131b, needle valve (needle valve) 131c and driven opening/closing valve 131d.One end of pipe arrangement 131a is connected with for generation of compressed-air actuated supplies for gas, and the other end is connected with gas nozzle 120.Further, pipe arrangement 131a is provided with adjuster 131b, needle valve 131c and driven opening/closing valve 131d, carries out pressure adjusting, flow adjustment and supply respectively and control.That is, after the compressed-air actuated pressure supplied supplies for gas by adjuster 131b is adjusted, the flow of air is adjusted further by needle valve 131c.Then, open driven opening/closing valve 131d according to the OPEN from valve control part 140, thus adjusted compressed air is supplied to gas nozzle 120, spray air from gas nozzle 120 as described above, to the liquid stream CF blow air stream AF of coating liquid.On the other hand, close driven opening/closing valve 131d according to the out code from valve control part 140, thus stop supplying compressed air to gas nozzle 120, stop spraying air from gas nozzle 120.In addition, as the flow of the air sprayed from gas nozzle 120, be preferably set to and be less than particular flow rate, this particular flow rate refers to, in the continous blowing of such continuous injection air regulations time described below, the flow (hereinafter, referred to as " disperse limit flux ") that the line pattern LP on substrate does not disperse, in the present embodiment, 50NmL/min is set as.
Fig. 6 A and Fig. 6 B is the sequential chart of the action that the patterning device shown in figure lA is shown, Fig. 6 A illustrate when do not carry out air injection, namely air air-supply form line pattern time action, on the other hand, Fig. 6 B illustrates and starts to spray coating liquid and stop to spray coating liquid and carry out air accordingly and blow while form the action of line pattern.When not carrying out air air-supply, as mentioned above, producing spherical variant part at the top of line pattern LP, producing the afterbody of coating liquid at end.As the main cause of above-mentioned generation ball, think that the wind produced between substrate W and coating liquid nozzle 2 relative to the movement of coating liquid nozzle 2 because of substrate W is one in main cause.That is, because the liquid stream CF of the coating liquid after just spraying rolls by the wind of above-mentioned generation, the generation of ball is caused like this.In addition, think that afterbody produces in such below process.That is, after just stopping ejection coating liquid, after the coating liquid near the ejiction opening 21 being positioned at coating liquid nozzle 2 is elongated, disconnects and drop on the surface of substrate W, forming afterbody like this.
Therefore, in the present embodiment, gas nozzle 120 is set as described above, as shown in fig. 6b than starting moment (moment T1) moment a little earlier spraying coating liquid, send OPEN from valve control part 140 to driven opening/closing valve 131d, thus start jet airstream AF.Further, keep towards substrate surface on substrate moving direction X than under the state of the part jet airstream AF of supply position PS1 (with reference to Fig. 5) the upstream side of coating liquid, start to spray coating liquid at moment Tl.Therefore, suppress the liquid stream CF of coating liquid to roll, thus suppress the generation of ball.In addition, by air stream AF by the top of the liquid stream CF of coating liquid by being pressed on the surface of substrate W, coating liquid therefore can not be made to disperse, but also the action effect of the deviation of the position, top of the line pattern that is inhibited.
When from moment Tl through after a while, send out code from valve control part 140 to driven opening/closing valve 131d, thus stop jet airstream AF.Its reason is, the pressure putting on line pattern LP because of air air-supply may impact the cross sectional shape of line pattern LP.
When end close to line pattern LP, in moment (moment T2) moment a little earlier than stopping ejection coating liquid, again OPEN is sent to driven opening/closing valve 131d by valve control part 140, thus start jet airstream AF, and in this condition, stop ejection coating liquid at moment T2.Thus, air stream AF assists the liquid stream CF of coating liquid to disconnect, thus can suppress the generation of afterbody.
As mentioned above, according to the present embodiment, on substrate moving direction X, gas nozzle 120 is configured in the downstream of coating liquid nozzle 2, from above-mentioned gas nozzle 120 towards substrate on substrate moving direction X than the PS1 upstream side, supply position of coating liquid surface spray air, can in the centre on the surface of the ejiction opening 21 of coating liquid nozzle 2 and substrate W, to the liquid stream CF air supply stream AF of coating liquid.Further, with start to spray coating liquid and stop to spray coating liquid and spray air accordingly at the appointed time continuously and namely carry out continous blowing.Therefore, have an effect in direction that pressure contacts to making coating liquid and substrate carry out for the air stream AF of supply, thus can when not making coating liquid disperse, suppress the top englobement of line pattern LP and suppress the deviation of position, top, and suppressing to produce afterbody on the end of line pattern LP.
< second execution mode >
Carry out continous blowing in the above-described first embodiment, but also can carry out spraying air from gas nozzle 120 with pulse type to come, to liquid stream CF blow air stream AF, the so-called pulse air-supply of coating liquid, to replace continous blowing (the second execution mode).Below, with reference to Fig. 7 and Fig. 8, while be described for the second execution mode of the present invention.
The patterning device 1 of this second execution mode is except the part in the structure of gas discharge device lC, identical with the first execution mode.Therefore, at this, be described centered by difference, identical Reference numeral marked for identical structure and omits the description.
Fig. 7 is the figure of the structure of the gas discharge device schematically shown on the patterning device being arranged on the second execution mode of the present invention.The second execution mode difference different from the first execution mode is, gas discharge device lC adds pulsed drive portion 150, and employs the open and close valve of high-speed driving type as driven opening/closing valve.That is, in this second embodiment, be provided with for supplying compressed-air actuated pulse supply air system 132 with pulse type to gas nozzle 120 for each gas nozzle 120.The basic structure of pulse supply air system 132, in the same manner as continous blowing system 131, is made up of pipe arrangement 132a, adjuster 132b, needle valve 132c and driven opening/closing valve 132d.Wherein, in order to pulse air-supply can be carried out, as driven opening/closing valve 132d, such as, use the impulse jet valve PJ series that CKD Corp. makes.Further, pulsed drive portion 150 applies to high-speed driving open and close valve 132d the high-speed pulse driving voltage that pulse duration is 500 μ about sec, thus makes the electromagnet of high-speed driving open and close valve 132d instantaneously action occur, thus obtains sharp-pointed air pulse.When spraying like this air pulse, preferably spraying the air being greater than the flow of continous blowing instantaneously, in this second embodiment, being set as exceeding the flow of limit flux of dispersing, such as about 200NmL/min.
Fig. 8 is the sequential chart of the action of the patterning device that the second execution mode is shown, illustrates and starts to spray coating liquid and stop to spray coating liquid and carry out pulse accordingly and blow while form the action of line pattern.In the present embodiment, arrange gas nozzle 120 as described above, as shown in Figure 8, than starting moment (moment T1) moment a little earlier spraying coating liquid, valve control part 140 exports OPEN.So the pulsed drive portion 150 that have received OPEN produces the high-speed pulse driving voltage that pulse duration is 500 μ about sec, and puts on high-speed driving open and close valve 132d.Like this, high-speed driving open and close valve 132d carries out action in a pulsed fashion, starts the air stream AF of injection pulse shape.Then, this pulse air-supply also proceeds when exceeding moment Tl, and starts to spray coating liquid at moment Tl.Therefore, obtain the effect identical with the situation of carrying out continous blowing (the first execution mode), be namely inhibited ball generation effect and suppress the effect of deviation of position, top.
To with start to spray the corresponding pulse of coating liquid and to blow the result analyzed, present inventor studies as follows.That is, the air stream AF of the pulse type before and after moment Tl only makes the top of line pattern LP moment carry out pressure with substrate to contact, thus prevents coating liquid from rolling, and in addition, even if produce ball, this ball also flattens and forms flat shape by pulse air-supply.Therefore, with regard to suppressing the action effect of the generation of ball and the deviation of position, top, the second execution mode is more excellent, when the line pattern LP by the actual formation of visualization, also confirms same result.
When from moment Tl through after a while time, valve control part 140 exports out code, stops jet airstream AF.In the same manner as the first execution mode, this is the impact in order to prevent the cross sectional shape of pressure on line pattern LP putting on line pattern LP because of air air-supply from causing.Especially, in pulse air-supply, although be carry out instantaneously, because the air flowing exceed the limit flux that disperses puts on line pattern LP, therefore preferred except starting to spray coating liquid and stopping the moment stop pulse air-supply except ejection coating liquid.
When end close to line pattern LP, than moment (moment T2) moment a little earlier stopping ejection coating liquid, valve control part 140 exports OPEN again, after starting to carry out pulse air-supply, stops supply coating liquid at moment T2.Thus, in the same manner as the situation (the first execution mode) of carrying out continous blowing, the effect that the afterbody that is inhibited produces.
To blow the result analyzed to spraying the corresponding pulse of coating liquid with stopping, present inventor studies as follows.That is, the shape that the air stream AF of the pulse type before moment T2 makes the rear end of line pattern LP become flat, thus improve the attractive in appearance of line pattern LP.In addition, the air stream AF of the pulse type after moment T2 cuts off and removes afterbody.Therefore, with regard to line pattern LP rear end attractive in appearance with regard to, the second execution mode is more excellent, when by the line pattern LP of visualization actual formation, also confirms same result.
As mentioned above, continous blowing is changed to pulse air-supply and obtains by the second execution mode, not only obtains the action effect same with the first execution mode, and further increases above-mentioned action effect, thus can form pattern more well.
In addition, make the pulse spacing constant in the above-described 2nd embodiment, but also can consider that the action effect that above-mentioned pulse is blown appropriately changes the pulse spacing, such as, carry out FM modulation (frequency modulation(FM)) as shown in Figure 9.That is, when pressure contact force will be improved improve the effect suppressing ball to produce, as long as the pulse spacing after making moment Tl becomes close, and the pressure putting on the air stream AF of the liquid stream CF of coating liquid is become large.In addition, when will suppress the dispersing of coating liquid further when improving afterbody, greatly the pressure putting on the air stream AF of the liquid stream CF of coating liquid because pulse air-supply is diminished as long as the pulse spacing after moment T2 is become.Like this, the waveform of paired pulses air-supply carries out FM modulation, thus can adjust the action effect of pulse air-supply.Certainly, modulation system is not limited to above-mentioned FM and modulates, and also can utilize various modulation system, such as PWM (pulse width modulation, pulse width modulation).
< the 3rd execution mode >
In the above-described first embodiment, only carry out continous blowing, only carry out pulse air-supply in this second embodiment, but also can combine both (the 3rd execution modes).Below, with reference to Figure 10 and Figure 11, while be described for the 3rd execution mode of the present invention.
Figure 10 is the figure of the structure of the gas discharge device schematically shown on the patterning device being arranged on the 3rd execution mode of the present invention.In the patterning device 1 of the 3rd execution mode, as shown in Figure 10, be set side by side with continous blowing system 131 and pulse supply air system 132, continous blowing and pulse air-supply can be carried out according to the instruction from valve control part 140.And, as the throughput of each gas nozzle 120, preferred settings continous blowing is 50NmL/min, pulse air-supply is about 200NmL/min, in the present embodiment, be the multiinjector of so-called 4 passages with 4 coating liquid nozzles 2, therefore overall flow is (50+200) × 4=1000NmL/min.In addition, other structure is identical with the first execution mode and the second execution mode, therefore marks identical Reference numeral to identical structure and omits the description.
Figure 11 is the sequential chart of the action of the patterning device that the 3rd execution mode is shown, illustrate while with start to spray coating liquid and stop to spray coating liquid and carry out continous blowing accordingly and supplement rightly carrying out pulse air-supply, the action of formation line pattern.In the present embodiment, as shown in Figure 11, than starting moment (moment T1) moment a little earlier spraying coating liquid, valve control part 140 sends OPEN to the driven opening/closing valve 131d of continous blowing system 131, starts jet airstream AF.Then, keep towards substrate on substrate moving direction X than under the state of the surperficial jet airstream AF of supply position PS1 (with reference to Fig. 5) the upstream side of coating liquid, start to supply coating liquid at moment Tl.Thus, suppress the liquid stream CF of coating liquid to roll in the same manner as the first execution mode, thus suppress ball to produce.
But if only carry out continous blowing, then also there is following situation, that is, the effect suppressing ball to produce is not necessarily abundant.Therefore, in the third embodiment, at moment Tl, export OPEN to add to pulsed drive portion 150 by valve control part 140 and carry out pulse air-supply.By this additional pulse air-supply, the air stream AF of pulse type only makes the top of line pattern LP moment carry out pressure with substrate to contact, therefore effectively prevent coating liquid from rolling further.In addition, even if produce ball, this ball flattens and becomes flat shape by pulse air-supply.As a result, compared with the first execution mode, the effect of the effect suppressing ball to produce and the deviation suppressing position, top can be improved further, thus line pattern LP can be formed more well.
When from moment Tl through after a while time, to be sent after out code carrys out stop pulse air-supply to pulsed drive portion 150 by valve control part 140, the driven opening/closing valve 131d to continous blowing system 131 sends out code, and continous blowing is also stopped.Then, during the pars intermedia forming line pattern LP, stop spraying air from gas nozzle 120, thus the impact that deaeration stream AF causes line pattern LP.
And, when end close to line pattern LP, in moment (moment T2) moment a little earlier than stopping ejection coating liquid, again send OPEN to driven opening/closing valve 131d by valve control part 140 to start to carry out continous blowing, and send OPEN to start to pulsed drive portion 150 and carry out pulse air-supply.Like this, by the pulse air-supply before moment T2, the rear end of line pattern LP is become flat shape, thus improve the attractive in appearance of line pattern LP.
Like this, under the state of carrying out continous blowing and pulse air-supply, ejection coating liquid (moment T2) is stopped.When stopping this ejection, the liquid stream CF not only to coating liquid supplies continous blowing, also pulse air-supply is supplied to the liquid stream CF of coating liquid, thus suppresses the generation of afterbody.Like this, according to the 3rd execution mode, compared with the first execution mode, the effect suppressing afterbody to produce can be improved, line pattern LP can be formed more well.
< the 4th execution mode >
At above-mentioned first execution mode in the 3rd execution mode, controlled the shape of pattern to the liquid stream blow flow of coating liquid by gas discharge device 1C, but the part that also can arrange to the pattern LP on the surface being formed in substrate W carrys out the pattern apparatus for shaping 1D of shaping pattern with pulse type air supply, replace above-mentioned gas blowoff 1C.Below, with reference to Figure 1A, Figure 1B and Figure 12, while be described the structure of pattern apparatus for shaping 1D.
Figure 12 is the figure of the structure of the pattern apparatus for shaping schematically shown on the patterning device being arranged on the 4th execution mode of the present invention.This pattern apparatus for shaping 1D has: nozzle holder 160, and it is connected on top bracket 6; 4 gas nozzles 170, are supported by nozzle holder 160; Gas supply part 180, it supplies compressed air to each gas nozzle 170; Valve control part 140, it controls air from gas supply part 180 to the supply of gas nozzle 170; Pulsed drive portion 150.
Nozzle holder 160 is such as made of aluminum, in the side ,+Q direction of top bracket 6, is arranged on top bracket 6 by not shown two mounting screws.On this nozzle holder 160, be provided with for making gas nozzle 170 insert the through hole fixed for each gas nozzle 170.In addition, in the present embodiment, as shown in Figure 1, in order to make the top of gas nozzle 170 with the spacing aligned configuration of 2mm, above-mentioned 4 through holes are arranged with staggered and different angles of inclination.
Cylindrically, and each gas nozzle 170 top ends is chamfered each gas nozzle 170.In more detail, in the present embodiment, external diameter is φ 1/16 inch and incline to cutting and make in the top that aperture is the stainless steel pipe arrangement of φ 0.5mm.Further, 4 gas nozzles 170 are inserted in respectively in corresponding through hole, in the same manner as the gas vent of gas nozzle 170 to arrange with the ejiction opening of coating liquid nozzle 2 with the spacing of 2mm, are configured to row.In addition, by the not shown screw that holds out against, each gas nozzle 170 is fixed on nozzle holder 160.In addition, position and the angle of each gas nozzle 170 can be adjusted in the mode meeting configuration relation described below by holding out against screw.
Be fixed on 4 gas nozzles 170 on nozzle holder 160, with the 4 bar chart case LP be formed on the surface of substrate W with 1 to 1 corresponding relation arrange as below.That is, on the moving direction X of substrate W, gas nozzle 170 is disposed in the downstream (right-hand side in Figure 12) of coating liquid nozzle 2, to the line pattern LP jet airstream AF on substrate W.Specifically, when supplying compressed air from gas supply part 180 to this gas nozzle 170, air is sprayed, at this supply position PS2 to line pattern LP blow air stream AF towards the substrate surface leaving the supply position PS2 of distance L12 on substrate moving direction X with the supply position PS1 (with reference to Figure 12) supplying coating liquid to substrate W from gas nozzle 170.At supply position PS2, line pattern LP is pressurizeed by this air stream AF, be shaped as desired shape as described later.Especially, in the present embodiment, in the downstream (right-hand side of Figure 12) of supply position PS2 on substrate moving direction X, ejiction opening 171 is configured towards supply position PS2, the injection direction to the face normal slope relative to substrate W sprays air.In addition, injection direction is not limited thereto, such as, also can spray air from the direction vertical with the surface of substrate W.
In gas supply part 180, each gas nozzle 170 is provided with the pulse supply air system 181 for compressed air being supplied to gas nozzle 170.As shown in figure 12, pulse supply air system 181 is made up of pipe arrangement 181a, adjuster 181b, needle valve 181c and driven opening/closing valve 181d.One end of pipe arrangement 181a is connected with for generation of compressed-air actuated supplies for gas, and the other end is connected with gas nozzle 170.Further, pipe arrangement 181a is provided with adjuster 181b, needle valve 181c and driven opening/closing valve 181d, carries out pressure adjusting, flow adjustment and supply respectively and control.That is, after by adjuster 181b the compressed-air actuated pressure supplied from supplies for gas being adjusted, the flow of air is adjusted further by needle valve 181c.Then, driven for opening and closing open and close valve 181d controls the supply of air to gas nozzle 170.In addition, in the present embodiment, as the following describes, come to line pattern LP to be carried out high speed opening and closing by 150 pairs, pulsed drive portion driven opening/closing valve 181d with pulse type air supply stream AF, as driven opening/closing valve 181d, employ high-speed driving type open and close valve, the impulse jet valve PJ series that such as CKD Corp. makes.
Pulsed drive portion 150, according to the opening and closing instruction from valve control part 140, controls the driving voltage applied to driven opening/closing valve 181d, thus carries out driven for opening and closing to driven opening/closing valve 181d.Such as when sending out code from valve control part 140, pulsed drive portion 150 does not open driving to driven opening/closing valve 181d, and driven opening/closing valve 181d is maintained closed condition.On the other hand, when sending OPEN from valve control part 140, pulse duration is such as that the high-speed pulse driving voltage of 500 μ about sec is applied on driven opening/closing valve 181d by pulsed drive portion 150, make the electromagnet of high-speed driving open and close valve 132d carry out action instantaneously, thus obtain sharp-pointed air pulse.When spraying air pulse like this, the air of large discharge can be sprayed instantaneously, be set as the flow exceeding the limit flux that disperses in the present embodiment, such as about 200NmL/min.In addition, " disperse limit flux " refers to, is spraying the flow not making the line pattern LP on substrate W disperse in the continous blowing of air continuously, is about 50NmL/min when forming electrode pattern or the wiring pattern of electrooptical device.
Then, substrate W is moved while when forming line pattern on the surface of this substrate W by the patterning device 1 that forms as described above, be divided into and do not carry out spraying with pulse type the situation (reference Figure 13) that air blows to the so-called pulse of line pattern LP blow air stream AF from gas nozzle 170 and the situation (Figure 14) of carrying out pulse air-supply is described.
Figure 13 is the sequential chart of the action of the patterning device illustrated when not carrying out pulse air-supply, namely do not use pattern apparatus for shaping and form pattern.When not carrying out pulse air-supply, in the line pattern LP on the surface being formed in substrate W, as shown in the schematic diagram of the topmost of Figure 13, in top portion, LPa produces spherical variant part, produces the afterbody of coating liquid at terminal part LPb.
Figure 14 be illustrate carry out pulse air-supply, the sequential chart of the action of patterning device when namely using pattern apparatus for shaping to form pattern.In the present embodiment, as shown in figure 14, starting the moment (moment T1) spraying coating liquid, spray coating liquid from the ejiction opening 21 of coating liquid nozzle 2, thus on substrate W, form the top portion LPa of line pattern LP.Also continue ejection coating liquid afterwards, line pattern LP then top portion LPa continues to extend, but when have passed through △ T12 time from moment Tl, L12 is so much for line pattern LP development length, top portion LPa arrival supply position PS2 (moment T2).During the certain hour of the front and back of this moment T2, according to the OPEN from valve control part 140, high-speed pulse driving voltage is applied on driven opening/closing valve 181d by pulsed drive portion 150, carries out pulse air-supply pressurize to top portion LPa.Thus, spherical top portion LPa mainly moves on the surface of the substrate in the mode of oozing out to the direction parallel with substrate moving direction X thus is shaped as wire.Like this when the top portion LPa of line pattern LP enters region (the supply position PS2) spraying air, carry out pulse air-supply and carry out shaping top portion LPa.
At top portion LPa by after the PS2 of supply position, also continue substrate is moved and sprays coating liquid, thus line pattern LP is extended to X-direction.Then, when line pattern LP arrive desired by length time, stop ejection coating liquid (moment T3).At this moment, afterbody is produced at the terminal part LPb of line pattern LP.Therefore, in the present embodiment, also continue substrate W is moved after formation line pattern LP.Then, when have passed through △ T34 time from moment T3, the terminal part LPb of line pattern LP arrives supply position PS2 (moment T4).During the certain hour of the front and back of this moment T4, again according to from the OPEN of valve control part 140, high-speed pulse driving voltage is applied on driven opening/closing valve 181d by pulsed drive portion 150, thus pulse air-supply is carried out to terminal part LPb pressurizes.Thus, the terminal part LPb of afterbody shape mainly with the mode of oozing out to the direction parallel with substrate moving direction X on the surface of the substrate movement to be shaped as wire.Like this, the terminal part LPb of line pattern LP, in the same manner as top portion LPa, when entering region (the supply position PS2) spraying air, carrying out pulse air-supply, thus carrying out shaping to terminal part LPb.In addition, in the present embodiment, in the action forming line pattern LP, move with constant speed owing to making substrate W, therefore above-mentioned time △ T12, △ T34 are identical value, but when making top portion LPa and terminal part LPb different from each other by the substrate speed during PS2 of supply position, as long as accordingly make time △ T12, △ T34 different.
As mentioned above, according to the present embodiment, using the top portion LPa of line pattern LP and terminal part LPb as " being shaped portion " of the present invention, when top portion LPa and terminal part LPb is respectively by supply position PS2, spray air to the portion that is shaped with pulse type to pressurize, therefore, it is possible to shaping line pattern LP well.
In addition, also consider that the so-called continous blowing carrying out spraying continuously to the portion of being shaped air carrys out shaping pattern, but the coating liquid that continous blowing can make formation be shaped portion disperses, thus cause pattern bad.In contrast, in the present embodiment, suppress to be shaped dispersing of the coating liquid in portion by carrying out pulse air-supply, thus can shaping pattern well.Wherein, even if when carrying out pulse air-supply, also along with close to continous blowing, that is, produce greatly and easily dispersing of coating liquid along with pulse duration becomes.Therefore, in order to form pattern more well, the face that is preferably as follows illustrates studies pulse duration like that.
Therefore, present inventor in the patterning device 1 with the pattern apparatus for shaping 1D shown in Figure 12, the line pattern LP with various pulse air-supply shaping, and observe the top portion LPa of line pattern LP and the shape of terminal part LPb.Figure 15 is the figure summing up above-mentioned observed result.Figure 15 is the figure schematically showing the top portion of pattern and the change of shape of terminal part caused along with the change of the pulse duration of gas injection." pulse duration " in this figure refers to, is applied to the pulse duration of the high-speed pulse driving voltage of driven opening/closing valve 181d from pulsed drive portion 150, has prepared these 5 kinds of 5msec, 2msec, 1msec, 0.5msec, 0.1msec.In addition, in the hurdle at " top " and " end ", schematically show the top portion LPa of line pattern LP, the observed result of terminal part LPb during the pulse air-supply carrying out each pulse duration, dot-hatched part in this figure represent by pulse blow produce ooze out portion, black square mark the coating liquid dispersed is shown.
Along with pulse duration becomes large, the time of namely spraying air is elongated, elongated to the time being shaped portion (top portion LPa and terminal part LPb) air supply stream AF, form the coating liquid being shaped portion and mainly to ooze out and the seepage areas expanded (the dot-hatched region in this figure) becomes greatly to X-direction.In order to eliminate the both ends of line pattern LP produce ball shape and tail shape region and make it even, preferably by pulse width set for being greater than 0.1msec.If this is also that then driven opening/closing valve 181d cannot carry out opening and closing with sufficient response because pulse duration is too small, air cannot be sprayed in pulse type, and the flow of air stream is also few, therefore can remain ball shape and tail shape.Therefore, as marked "×" in the hurdle of the judgement corresponding with the 0.1msec in Figure 15, shaping line pattern LP is well difficult to further.
On the other hand, along with making pulse duration become large, driven opening/closing valve 181d carries out high speed opening and closing to spray air in pulse type, and the coating liquid spreading out ball portion and tail portion diminishes to make ball portion and tail portion.Learn from the hurdle at " top " and " end " of Figure 15, reduce along with bulb grades and make the area of seepage areas become large, when pulse duration is more than 2msec, ball portion and tail portion disappear.But, if be more than 5msec by pulse width set, then make coating liquid disperse ("×" with reference in the hurdle of the judgement corresponding with the 5msec in Figure 15) to the surrounding of line pattern LP.Therefore, consider this point, preferably by pulse width set for being less than 5msec.
Therefore, in order to form line pattern LP well further, preferably by pulse width set for being greater than 0.1msec and being less than 5msec.In addition, preferably pulse width set is more than 0.5msec and below 2msec (triangular mark, circular mark, dual circular mark with reference in the hurdle of the judgement in Figure 15).In addition, when seepage discharge increases, the length of line pattern LP becomes and is greater than set point, or the interval between line pattern LP adjacent in top portion LPa and terminal part LPb diminishes.When considering such problem, preferably pulse width set is more than 0.5msec and below 1msec, and is comprehensively most preferably set as 0.5msec.
< the 5th execution mode >
In the patterning device 1 of above-mentioned 4th execution mode, pattern apparatus for shaping 1D is set to replace gas discharge device 1C, but gas discharge device 1C and pattern apparatus for shaping 1D (the 5th execution mode) also can be set simultaneously.Thereby, it is possible to form pattern more well.Below, with reference to Figure 16 and Figure 17, while be described for the 5th execution mode of the present invention.
Figure 16 is the figure of the patterning device that the 5th execution mode of the present invention is shown.5th execution mode significant difference compared with the 4th execution mode is, is also provided with the gas discharge device 1C for the liquid stream air supply stream to the coating liquid sprayed from each coating liquid nozzle 2, and other structure is basic identical with the 4th execution mode.In addition, the structure of gas discharge device 1C is identical with the first execution mode.Therefore, for the structure identical with the 4th execution mode with the first execution mode, mark identical Reference numeral and omit the description.
Figure 17 is the sequential chart of the action that the patterning device shown in Figure 16 is shown.In patterning device 1, when not carrying out air air-supply, as mentioned above, producing spherical variant part at the top portion LPa of line pattern LP, producing the afterbody of coating liquid at terminal part LPb.Wherein, as the main cause producing ball, think that the wind produced between substrate W and coating liquid nozzle 2 relative to the movement of coating liquid nozzle 2 because of substrate W is one in main cause.That is, make just to spray because producing above-mentioned wind after the liquid stream CF of coating liquid roll, cause the generation of ball like this.In addition, think that afterbody produces in such below process.That is, after just stopping ejection coating liquid, after the coating liquid near the ejiction opening 21 being positioned at coating liquid nozzle 2 is elongated, disconnects and drop on the surface of substrate W, forming afterbody like this.
Therefore, in the present embodiment, gas nozzle 120 is set as described above, as shown in Figure 17 than starting moment (moment T1) moment a little earlier spraying coating liquid, send OPEN from valve control part 140 to driven opening/closing valve 131d, thus start jet airstream AF.Further, keep towards substrate on substrate moving direction X than under the state of the surperficial jet airstream AF of supply position PS1 (with reference to Figure 16) the upstream side of coating liquid, start to spray coating liquid at moment Tl.Therefore, suppress the liquid stream CF of coating liquid to roll, thus suppress the generation of ball.In addition, by air stream AF by the top of the liquid stream CF of coating liquid by being pressed on the surface of substrate W, coating liquid therefore can not be made to disperse, but also the action effect of the deviation of the position, top of the line pattern that is inhibited.
When Tl have passed through a period of time from the moment, send out code from valve control part 140 to driven opening/closing valve 131d, thus stop jet airstream AF.Its reason is, the pressure putting on line pattern LP because of air air-supply may bring impact to the cross sectional shape of line pattern LP.
On the other hand, when have passed through △ T12 from moment Tl, L12 is so much for line pattern LP development length, and top portion LPa arrives supply position PS2 (moment T2).During the certain hour of the front and back of this moment T2, in the same manner as the first execution mode, carry out pulse air-supply from gas nozzle 170 to top portion LPa and pressurize, thus shaping top portion LPa.
And, when end close to line pattern LP, in moment (moment T3) moment a little earlier than stopping ejection coating liquid, again OPEN is sent to driven opening/closing valve 131d by valve control part 140, thus start to spray the air stream AF from gas nozzle 120, and in this condition, stop ejection coating liquid at moment T3.Thus, air stream AF assists the liquid stream CF of coating liquid to disconnect, thus can suppress the generation of afterbody.
In addition, when have passed through △ T34 from moment T3 and being so much, the terminal part LPb of line pattern LP arrives supply position PS2 (moment T4).Therefore, in the same manner as the first execution mode, during the certain hour of the front and back of this moment T4, again carry out pulse air-supply from gas nozzle 170 terminad portion LPb and pressurize, thus shaping terminal part LPb.
As mentioned above, according to the 5th execution mode, not only shaping line pattern LP in the same manner as the 4th execution mode, and the generation suppressing the afterbody in the generation of the ball in top portion LPa and terminal part LPb.Namely, on substrate moving direction X, gas nozzle 120 is configured in the downstream of coating liquid nozzle 2, from above-mentioned gas nozzle 120 towards substrate on substrate moving direction X than the PS1 upstream side, supply position of coating liquid surface spray air, and can in the centre on the surface of the ejiction opening 21 of coating liquid nozzle 2 and substrate W, to the liquid stream CF air supply stream AF of coating liquid.Further, and start to spray coating liquid and stop spraying coating liquid to spray air continuously in the stipulated time accordingly, namely carry out continous blowing.Therefore, have an effect in direction that pressure contacts to making coating liquid and substrate carry out for the air stream AF of supply, thus can when not making coating liquid disperse, suppress the top englobement of line pattern LP while suppress the deviation of position, top, and suppress to produce afterbody on the end of line pattern LP.Therefore, it is possible to form line pattern LP more well.
< the 6th execution mode >
In the above-described 5th embodiment, gas supply part 130 is provided with continous blowing system 131, to coating liquid liquid stream CF continuous blow air stream AF, namely carry out continous blowing, but also can carry out pulse air-supply replace continous blowing (the 6th execution mode).That is, pulse supply air system can be used to replace continous blowing system 131.In more detail, as driven opening/closing valve 131d, use the open and close valve of high-speed driving type, the impulse jet valve PJ series that such as CKD Corp. makes, as shown in Figure 18, than starting moment (moment T1) moment a little earlier spraying coating liquid, according to the OPEN from valve control part 140, make pulsed drive portion 150 that high-speed pulse driving voltage is applied to driven opening/closing valve 131d, thus carry out pulse air-supply to the liquid stream CF of coating liquid.Thus, the liquid stream CF of coating liquid is suppressed to roll, from the generation suppressing ball.In addition, by air stream AF by the top of the liquid stream CF of coating liquid by being pressed on the surface of substrate W, coating liquid therefore can not be made to disperse, but also the action effect of the deviation of the position, top of the line pattern that is inhibited.
To with start to spray the corresponding pulse of coating liquid and to blow the result analyzed, present inventor studies as follows.That is, the air stream AF of the pulse type before and after moment Tl only makes the top of line pattern LP moment carry out pressure with substrate to contact, thus prevents coating liquid from rolling, and in addition, even if produce ball, this ball also flattens and forms flat shape by pulse air-supply.Therefore, with regard to suppressing the action effect of the generation of ball and the deviation of position, top, the 6th execution mode is more excellent, when by observing the actual line pattern LP formed, also confirms same result.
In addition, in the same manner as the 5th execution mode, when end close to line pattern LP, than moment (moment T3) moment a little earlier stopping ejection coating liquid, valve control part 140 exports OPEN again, stops supply coating liquid after starting to carry out the certain hour after pulse air-supply.Thus, in the same manner as the situation (the 5th execution mode) of carrying out continous blowing, the inhibition that the afterbody that is inhibited produces.
To blow the result analyzed to spraying the corresponding pulse of coating liquid with stopping, present inventor studies as follows.That is, the shape that the air stream AF of the pulse type before moment T3 makes the rear end of line pattern LP become flat, thus improve the attractive in appearance of line pattern LP.In addition, the air stream AF of the pulse type after moment T3 cuts off and removes afterbody.Therefore, with regard to line pattern LP rear end attractive in appearance with regard to, the 6th execution mode is more excellent, when by observing the actual line pattern LP formed, also confirms same result.
As mentioned above, in the 6th execution mode, by carrying out pulse air-supply, the generation of the afterbody in shaping line pattern LP, the generation suppressing the ball in top portion LPa and terminal part LPb.Therefore, it is possible to form line pattern LP more well.
< the 7th execution mode >
Liquid stream CF blow air stream AF just to coating liquid says, only carries out continous blowing in the above-described 5th embodiment, in the 6th execution mode, carries out pulse air-supply, but also can combine both carries out (the 7th execution mode).That is, gas supply part 130 arranges continous blowing system and pulse supply air system, as shown in figure 12, in order to the liquid stream CF blow air stream AF to coating liquid, combination continous blowing and pulse air-supply (the 7th execution mode).
Figure 19 is the figure of the action of the patterning device that the 7th execution mode being provided with pattern apparatus for shaping of the present invention is shown.In addition, in the figure, describe two " pulse air-supplies ", but the pulse for the generation and afterbody that suppress ball that upside is nozzle 120 is blown, and downside is the air-supply of the pulse for shaping pattern of nozzle 170.In the 7th execution mode, as shown in Figure 19, than starting moment (moment T1) moment a little earlier spraying coating liquid, valve control part 140 sends OPEN to the driven opening/closing valve of continous blowing system, starts jet airstream AF.Further, keep towards substrate on substrate moving direction X than under the state of the surperficial jet airstream AF of supply position PS1 (with reference to Figure 16) the upstream side of coating liquid, start to supply coating liquid at moment T1.Thus, suppress the liquid stream CF of coating liquid to roll in the same manner as the 5th execution mode, thus suppress the generation of ball.
But if only carry out continous blowing, then also there is following situation, that is, the effect suppressing ball to produce is not necessarily abundant.Therefore, in the 7th execution mode, at moment Tl, export OPEN by valve control part to pulsed drive portion and add and carry out pulse air-supply.By this additional pulse air-supply, the air stream AF of pulse type only makes the top of line pattern LP moment carry out pressure with substrate to contact, therefore effectively prevent coating liquid from rolling further.In addition, even if produce ball, this ball flattens and becomes flat shape by pulse air-supply.As a result, compared with the 5th execution mode, the effect of the effect suppressing ball to produce and the deviation suppressing position, top can be improved further, thus line pattern LP can be formed more well.
In addition, when end close to line pattern LP, in moment (moment T3) moment a little earlier than stopping ejection coating liquid, again send OPEN to the driven opening/closing valve of continous blowing system by valve control part 140 to start to carry out continous blowing, and send OPEN to start to pulsed drive portion 150 and carry out pulse air-supply.Like this, by the pulse air-supply before moment T3, the rear end of line pattern LP is become flat shape, thus improve the attractive in appearance of line pattern LP.
Like this, in the 7th execution mode, carry out shaping line pattern LP by carrying out pulse air-supply, and combine the generation that continous blowing and pulse air-supply suppress the afterbody in the generation of ball in top portion LPa and terminal part LPb.Therefore, it is possible to form line pattern LP more well.
In addition, in the above-described embodiment, make the pulse spacing constant, but also can in the same manner as the variation of the second execution mode, consider the action effect that above-mentioned pulse is blown and change the pulse spacing rightly, such as shown in Figure 9 FM modulation (frequency modulation(FM)).
At above-mentioned first execution mode in the 7th execution mode, the present invention is applicable in the patterning device of so-called 4 passages with 4 coating liquid nozzles 2, but nozzle number is not limited thereto.In addition, multiple coating liquid nozzle 2 is arranged on and connects on spray nozzle part 3 and integration more, but also the present invention can be used in the patterning device being separately provided with multiple coating liquid nozzle.
In addition, in the above-described embodiment, the present invention is applicable to be provided with in the patterning device 1 of coating liquid ejection control part 4 all coating liquid nozzles 2, but also the present invention can be applicable to only the coating liquid nozzle that at least 1 wherein is above to be provided with coating liquid sprays in the patterning device of control part (the 8th execution mode).Below, with reference to Figure 20 to Figure 23, while be described for the 8th execution mode of the present invention.
< the 8th execution mode >
Figure 20 is the figure of the patterning device that the 8th execution mode of the present invention is shown.This patterning device 1 to be coated in comprising on substrate for the formation of the coating liquid of the material of pattern and to make it the device that solidifies, and this patterning device 1 such as can be applicable on the substrate with photoelectric conversion surface, form wiring pattern to manufacture the technology of electrooptical device.Further, according to technical background such below, only coating liquid ejection control part is set for a part of coating liquid nozzle, and gas discharge device 1C is set.That is, the shape that should form the substrate of pattern by patterning device 1 is various.Such as, the monocrystalline silicon substrate as the substrate being used as solar cell is, the octagon obtaining as cut away foursquare corner.This is the area in order to effectively utilize circular silicon single crystal wafer.Therefore, the length of the pattern on the position corresponding with corner should be formed in, different from the length of the pattern that should be formed on other position.
Therefore, in the patterning device 1 of the 8th execution mode, the coating liquid nozzle 2 to the position corresponding with corner ejection coating liquid is provided with above-mentioned coating liquid ejection control part.More particularly, among 26 nozzles along orientation configuration one row, only coating liquid ejection control part is set for 3 nozzles of the side, most upstream in orientation and 3 nozzles of most downstream side.Therefore, by controlling the ejection of the coating liquid of force feed and stopping this ejection, even if also pattern can be formed efficiently by coating on the substrate (hereinafter, referred to as " special-shaped substrate ") not being rectangle.
In this patterning device 1, base station 710 is provided with objective table travel mechanism 200, can be used in by objective table travel mechanism 200 and keeps the objective table 300 of substrate W to move in the X-Y plane shown in Figure 20.Base station 710 is fixed with frame 721 in the mode of crossing over objective table 300, frame 721 is provided with coating head 500.
Objective table travel mechanism 200 has: X-direction travel mechanism 210, and it makes objective table 300 move in X-direction; Y-direction travel mechanism 220, it makes objective table 300 move in the Y direction; θ rotating mechanism 230, it makes objective table 300 to rotate centered by the axle of Z-direction.X-direction travel mechanism 210 has following structure, that is, motor 211 is connected with ball screw 212, and the nut 213 be fixed in Y-direction travel mechanism 220 is arranged on ball screw 212.Above ball screw 212, be fixed with guide rail 214, when motor 211 rotates, Y-direction travel mechanism 220 moves reposefully in the X direction along guide rail 214 together with nut 213.
Y-direction travel mechanism 220 also has motor 221, ball screw mechanism and guide rail 224, when motor 221 rotates, by ball screw mechanism, θ rotating mechanism 230 is moved in the Y direction along guide rail 224.θ rotating mechanism 230 makes objective table 300 rotate by motor 231.In addition, pivot is Z-direction axle.According to said structure, can change coating head 500 relative to substrate W moving direction and towards.The control part 600 that each motor of objective table travel mechanism 200 is used to the action in each portion of control device controls.
And, between θ rotating mechanism 230 and objective table 300, be provided with lifting mechanism for objective table 240.Lifting mechanism for objective table 240 makes objective table 300 be elevated according to the control command from control part 600, thus substrate W is positioned on specified height (Z-direction position).As lifting mechanism for objective table 240, the elevating mechanism etc. such as can use the elevating mechanism formed by the actuator such as electromagnetically operated valve or piezoelectric element, the elevating mechanism formed by gear, being formed by the engagement of chock.
The pedestal 510 of coating head 500 is provided with coating liquid supply unit 520, has the coating liquid of aqueous (glue) at this coating liquid supply unit 520 in internal storage, according to the control command from control part 600, spray this coating liquid towards substrate W.Coating liquid supply unit 520 has: syringe pump (syringe pump) 521, and its inside is cavity, for storing coating liquid; Plunger 524, it inserts the inner space of this pump 521.By by actuator or compressed air etc. such as the motor of control part 600 drived control, electromagnetically operated valves, actuation plunger 524 moves up and down, thus pressurizes to the coating liquid be stored in the inner space of syringe pump 521.
In addition, be provided with in the bottom of coating liquid supply unit 520 and connect spray nozzle part 550 more.This connects spray nozzle part 550 more makes 26 coating liquid nozzles (omitting diagram) the formation one spraying coating liquid towards substrate W obtain, and coating liquid nozzle is configured to row along the Y direction.That is, in this patterning device 1, Y-direction is the orientation of coating liquid nozzle.In addition, although omit diagram in fig. 20, each coating liquid nozzle is connected with coating liquid supply unit 520, the coating liquid from coating liquid supply unit 520 force feed can be guided along being arranged on inner coating liquid stream, and sprays from ejiction opening 551.Among above-mentioned 26 coating liquid nozzles, be provided with coating liquid ejection control part 560 for 3 coating liquid nozzles of the side, most upstream of Y-direction and 3 coating liquid nozzles of most downstream side, 20 coating liquid nozzles for remaining center side do not arrange coating liquid ejection control part.Therefore, syringe pump 521 action is made by the action of plunger 524, thus towards being arranged on each coating liquid nozzle force feed coating liquid connected on spray nozzle part 550 more, never 20 the coating liquid nozzles arranging the center side of coating liquid ejection control part 560 directly spray coating liquid, on the other hand, 6 coating liquid nozzles are amounted to for 3 nozzles of side, most upstream and 3 nozzles of most downstream side, rotated by the rotating shaft (omitting diagram) making each coating liquid spray control part 560, thus control the opening/closing of the ejection of coating liquid for each ejiction opening 551 independently.In addition, the basic structure of coating liquid ejection control part 560 is identical with the structure adopted in above-mentioned coating liquid blowoff 1B.And, be provided with gas discharge device 800 accordingly with the coating liquid nozzle being provided with coating liquid and spraying control part 560.The basic structure of gas discharge device 800 is identical with the structure adopted in above-mentioned gas blowoff 1C.
In addition, the pedestal 510 of coating head 500 is provided with illumination part 530, this illumination part 530 irradiates UV light (ultraviolet) towards substrate W.Illumination part 530 is connected with for generation of ultraviolet light source cell 532 by optical fiber 531.Although the diagram of omission, has the shutter of freely openable in the light exit portion of light source cell 532, the irradiation of emergent light/do not irradiate and light quantity can be controlled by the opening and closing of shutter and aperture.Light source cell 532 is controlled by control part 600.
Figure 21 is the figure of the example that the solar battery cell utilizing the patterning device of Figure 20 to be formed is shown.The structure of this solar battery cell S is, on the surface (being provided with the face of photoelectric conversion surface and antireflection film) of monocrystalline silicon substrate W, be provided with the little multiple finger-like wiring pattern of width and, route bus pattern B that the width that arranges in the mode of crossing above-mentioned finger-like wiring pattern is larger.Finger-like wiring pattern F and route bus pattern B is electrically connected at intersection point.
With regard to the size in each portion, such as, can set the width of finger-like wiring pattern F and be highly about 50 μm, the width of setting route bus pattern B is 1.8mm to 2.0mm and is highly 50 μm to 70 μm, but is not limited to above-mentioned numerical value.
The octagon-shaped that silicon substrate W obtains in being cut away roughly subquadrate corner is symmetrical about central shaft C line.Because the wafer cut from the silicon single crystal rod of substantial cylindrical is circular plate shape, so substrate W adopts such shape to effectively utilize the surface area of this wafer.
Therefore, just formed with regard to multiple finger electrode F on substrate W, substrate W central portion be considered as in substantially rectangular rectangular area RR, there is certain length, and in end regions ER, with its shape accordingly, the length of each finger electrode F is different.Specifically, the length being formed in the multiple electrode Fr in the RR of rectangular area is all identical and be less than the length of substrate W, and the length being formed in the electrode Fe in end regions ER changes along with the retrogressing of substrate W end face, and more close to the most end of substrate, then length is less.In the example of Figure 21, in the rectangular area RR entreated in a substrate, be formed with the electrode pattern Fr of 20 equal length, in the end regions ER at substrate both ends, be formed with 3 electrode pattern Fe that length is different from each other respectively.In addition, this is only an example, and the number of pattern is not limited thereto, but needs the number arranging coating liquid ejection control part 560 according to the number of the electrode pattern Fe be arranged in end regions ER.
Making ejection/stopping ejection being moved relative to substrate integratedly in the conventional art (such as Japanese Unexamined Patent Publication 2011-60873 publication) forming pattern by the unified multiple coating liquid nozzles controlled, the substrate of such shape can not be tackled.In addition, for carrying out the concrete technology of opening/closing control independently to each coating liquid nozzle, also unrealized practical up to now.Relative to this, in the patterning device 1 of present embodiment, arrange and spray control part 560 with the coating liquid of Fig. 2 same structure, control the ejection of coating liquid by each coating liquid ejection control part 560 and stop this ejection, thus also can form pattern efficiently on the special-shaped substrate that Figure 21 is such.
Figure 22 schematically shows the figure being formed the situation of finger electrode by the device of Figure 20.As shown in the drawing, in this device 1, by making the objective table 300 being placed with substrate W move to X-direction, make to connect more spray nozzle part 550 relative to substrate W surface to-that X-direction carries out scanning is mobile.This lower surface connecting spray nozzle part 550 is provided with 26 ejiction openings 551, and above-mentioned ejiction opening 551 is along the Y direction to be configured to row at equal intervals more.The size connecting spray nozzle part 550 in Y-direction compared with the size of the party substrate W upwards, identical or be more than or equal to the size of substrate W more.Therefore, only make to connect spray nozzle part 550 more and carry out scanning movement once relative to substrate W, just can form finger electrode pattern Fr, Fe on whole of substrate W.
Coating liquid can adopt the conductive paste with conductivity and photocuring characteristic, such as, comprise the mixed liquor of the paste of electroconductive particle, organic carrier (mixtures of solvent, resin, thickener etc.) and photo-induced polymerization initiator.Electroconductive particle is the such as silver powder of the material as electrode, and organic carrier comprises ethyl cellulose as resin material and organic solvent.In addition, with regard to the viscosity of coating liquid, preferably penetrated by illumination be cured process before such as below 50Pas, and after being cured process, be more than 350pas.
To the coating liquid just from ejiction opening 551 to substrate W surface after ejection, the scanning moving direction (-X-direction) of the next comfortable coating liquid nozzle of irradiation is configured in the emergent light of the illumination part 530 at the rear of ejiction opening 551.Thus, under the state maintaining the cross sectional shape after just having sprayed, coating liquid is solidified, thus form electrode pattern Fr, Fe.By setting the shape of ejiction opening 551, the viscosity of coating liquid and light illuminate condition rightly, the pattern with various cross sectional shape can be formed, especially can form pattern height and the large pattern of the ratio of width, i.e. depth-width ratio.
Figure 23 is the flow chart of the pattern formation processing that the 8th execution mode is shown.Utilize and connect spray nozzle part 550 more and carry out this process, and connect spray nozzle part 550 more there are 26 ejiction openings 551 corresponding with the number of the pattern that should be formed.For the coating liquid nozzle that 3 ejiction openings 551 of the side, most upstream with the Y-direction in above-mentioned ejiction opening 551 and 3 ejiction openings 551 of most downstream side are connected respectively, be respectively arranged with coating liquid ejection control part 560, thus independent control from the coating liquid of each ejiction opening 551 ejection and stop this ejection.Therefore, when under the state making the ejection from 3 ejiction openings 551 of side, most upstream and 3 ejiction openings 551 of most downstream side stop by coating liquid ejection control part 560, during from coating liquid supply unit 520 towards coating liquid nozzle force feed coating liquid, spray coating liquid from 20 ejiction openings 551 of center side simultaneously.Then, by each coating liquid ejection control part 560, rotating shaft is rotated, thus the ejection of the coating liquid from each ejiction opening 551 can be controlled independently.In addition, the Reference numeral P1 to P3 shown in Figure 22 and P24 to P26 is the Reference numeral of the ejiction opening determining application tip region ER.Namely, among 26 ejiction openings, outermost ejiction opening Reference numeral P1, P26 will be positioned at represent, represent than P1, P26 near the ejiction opening of Reference numeral P2, P25 to the inside, will represent with Reference numeral P3, P24 near the ejiction opening of to the inside further.20 remaining ejiction openings are in addition for the formation of the pattern Fr of rectangular area RR.Above-mentioned ejiction opening P1 ~ P3, P24 ~ P26 control alone by coating liquid ejection control part 560 ejiction opening that sprays as described later in the moment different from other ejiction opening, be called " control object ejiction opening " by these ejiction openings below.
In this process, first, substrate W is moved into patterning device 1, what make to be formed pattern faces to be placed in (step S101) on objective table 300.In addition, the rotating shaft making coating liquid spray control part 560 rotates the ejection (step S102) stopped from ejiction opening P1 ~ P3, P24 ~ P26 around axle center.Specifically, such as, in the same manner as the coating liquid nozzle of " nozzle number 1 " in Fig. 3, the ratio that upstream-side channel is communicated with downstream-side channel is set as 0%.
In this condition, by objective table travel mechanism 200, objective table 300 is moved (step S103) to X-direction, make to connect spray nozzle part 550 more and move to directly over the X-direction end of substrate W.Then, begin through syringe pump 521 pairs of coating liquids and pressurize, and substrate W is moved (step S104) to X-direction.Like this, only from 20 ejiction openings 551 being positioned at middle body, coating liquid is sprayed.Thus, the pattern Fr formed in the RR of rectangular area is started.
Then, control object ejiction opening (step S105) is opened successively with following steps.That is, carrying out pressurization after the stipulated time from beginning through syringe pump 521, the ejection first removed from ejiction opening P3, P24 closest to central authorities in control object ejiction opening stops, thus opens coating liquid stream.Then, open ejiction opening P2, P25 adjacent outside them, finally open outermost ejiction opening P1, P26.Thus, the end regions ER of substrate W is formed the pattern Fe that position, top is different respectively along with the difference opening the moment of ejiction opening.In addition, in the same manner as the first execution mode to the 3rd execution mode, start the supply of the air stream controlled accordingly from gas discharge device 800 with the ejection of coating liquid, thus prevent the top englobement of electrode pattern (line pattern) or position, top from producing deviation.
In this condition, continue to make to connect spray nozzle part 550 more and carry out scanning movement relative to substrate W, thus on substrate W, form 26 electrode patterns parallel to each other.Continue this state until substrate W arrives assigned position (step S106), with the order contrary with the order opened, block each ejiction opening P1 ~ P3, P24 ~ P26 (step S107) successively.That is, block outermost ejiction opening P1, P26, then block ejiction opening P2, P25 of being adjacent.And then, ejiction opening P3, P24 inside blocking.Along with blocking ejiction opening, by forming the action of pattern from the coating liquid of this ejiction opening, terminate successively in the mode with a little time difference.Therefore, the terminal position of above-mentioned pattern is also different.In addition, in the same manner as the first execution mode to the 3rd execution mode, stop the supply of the air stream controlled accordingly from gas discharge device 800 with the ejection of coating liquid, thus suppress to produce afterbody at the end of electrode pattern (line pattern).
Terminate the action forming pattern at the end regions ER of end side like this, and when connecting spray nozzle part 550 more and arriving the end of rectangular area RR, stop the pressurization (step S108) from syringe pump 521.Then, objective table 300 is stopped mobile (step S109), takes out of the substrate W (step S110) being formed with finger electrode pattern F (Fr, Fe), and end process.
According to such pattern formation processing, in the rectangular area RR of the central portion of substrate W, form the parallel to each other and pattern Fr that length is equal above.On the other hand, in the end regions ER at substrate two ends, more close to the outside of substrate W, then the moment starting to be formed pattern is slow, and terminates the morning in moment of formation.Substrate W and Duo Lian spray nozzle part 550 carry out relative movement with constant speed, and the difference in the moment therefore formed is reflected in top and the terminal position of the pattern on substrate W, final formation Figure 21 and finger electrode pattern F as shown in Figure 22.In the meantime, connect the scanning that spray nozzle part 550 carries out relative to substrate W to move for once more.
In addition, the coating liquid nozzle corresponding with each control object ejiction opening 551 is provided with coating liquid and sprays control part 560, by make rotating shaft rotate control independently from ejiction opening 551 ejection and stop this ejection.Therefore, it is possible to the position, top of the pattern of a part in the multiple linear pattern scanning by connecting spray nozzle part 550 being moved more once formed and terminal position different from other pattern.As a result, even Figure 21 or special-shaped substrate as shown in Figure 22, also on whole, pattern can be formed efficiently.And, in the same manner as above-mentioned execution mode, start with the ejection of coating liquid and spray the supply stopping the air stream controlled accordingly from gas discharge device 800.Therefore, it is possible to when not polluting substrate W or device, with the pattern of shape formation well on substrate W.
In addition, the rotating shaft of coating liquid ejection control part 4 is installed for the coating liquid nozzle with each control object ejiction opening 551, by the ejection making this rotating shaft rotate the coating liquid controlled from ejiction opening 551, therefore, it is possible to stably control the ejection of high-precision coating liquid when not making structural elements deform.
In addition, making coating liquid spray control part 560 is configured on position different from each other on the direction vertical with orientation Y, namely with staggered or zigzag configuration, therefore, it is possible to prevent coating liquid from spraying control part 4 mutual interference occurs, the pitch smaller of coating liquid nozzle can be made.As a result, the interval that can allow to the pattern formed by patterning device 1 is diminished.
In addition, in the above-described 8th embodiment, in order to control the shape of pattern, gas discharge device 800 is only provided with, but pattern apparatus for shaping 1D also can be set or gas discharge device 800 and pattern apparatus for shaping lD are set simultaneously, replace arranging gas discharge device 800.Under these circumstances, the air stream that top portion and terminal part to pattern Fe supply from pattern apparatus for shaping lD carries out pattern shaping, therefore, it is possible to make pattern Fe and pattern Fr be similar to, thus obtains the attractive in appearance of excellence.In addition, by the rear of pattern apparatus for shaping lD configuration illumination part 530, action effect is below obtained.That is, under maintenance is just by the state of the cross sectional shape after pattern apparatus for shaping lD shaping, coating liquid is solidified, thus form electrode pattern Fe.Set the shape of ejiction opening 551, the viscosity of coating liquid and light illuminate condition rightly, in addition, set the trim conditions of pattern apparatus for shaping lD rightly, thus the pattern with various cross sectional shape can be formed, especially pattern height and the large pattern of the ratio of width, i.e. depth-width ratio can be formed, and electrode pattern Fr and electrode pattern Fe approximate shape can be formed as.
Like this, in the above-described embodiment, objective table travel mechanism lA, 200 is equivalent to make substrate W relative to the example of coating liquid nozzle to " mobile unit " of first direction movement.In addition, substrate moving direction X, emission direction D2 and injection direction D3 are equivalent to " first direction " of the present invention, " second direction ", " third direction " respectively.In addition, pulse supply air system 132 and continous blowing system 131 are equivalent to an example of " the first feed system " of the present invention and " the second feed system " respectively.
In addition, in the above-described embodiment, gas discharge device 1C is equivalent to an example of " airflow blow unit " of the present invention, and pattern apparatus for shaping lD is equivalent to an example of " pattern shaping unit " of the present invention.Gas nozzle 120,170 is equivalent to an example of " the first gas nozzle " of the present invention and " the second gas nozzle " respectively.Gas supply part 130,180 is equivalent to an example of " the first gas supply part " of the present invention and " the second gas supply part " respectively.
In addition, in the first execution mode and the 5th execution mode, the example that valve control part 140 is equivalent to " the first gas supply control part ", in the second execution mode, the 3rd execution mode, the 6th execution mode and the 7th execution mode, valve control part 140 and pulsed drive portion 150 play the function of " the first gas supply control part " of the present invention.At the 4th execution mode in the 7th execution mode, valve control part 140 and pulsed drive portion 150 play the function of " the second gas supply control part " of the present invention.And illumination part 530 is equivalent to an example in " pattern cured portion " of the present invention.
Other > of <
In addition, the present invention is not limited to above-mentioned execution mode, can carry out the various changes except aforesaid way when not departing from its aim.Such as, in the above-described embodiment, nozzle holder 110 is provided with multiple through hole with staggered and different angles of inclination, in each through hole, is configured with gas nozzle 120.By adopting such configuration relation, can prevent the mutual interference of gas nozzle 120 from spacing is diminished, pattern spacing can also be made to diminish.Wherein, the configuration relation of gas nozzle 120 is not limited thereto, such as, also can be configured to row.About this point, gas nozzle 170 too.
In addition, at the first execution mode to the 3rd execution mode, the 5th execution mode in the 7th execution mode, with start to spray coating liquid and stop spraying the injection that coating liquid controls the air from gas nozzle all accordingly, but also can only with start to spray the spraying fire that coating liquid carries out air accordingly, or on the contrary only with stopping spray the spraying fire that coating liquid carries out air accordingly.In addition, when needing to carry out shaping to the position except top portion and terminal part in line pattern, also this position can be set to " being shaped portion " of the present invention, be that pulse type sprays air to carry out shaping to this position.
In addition, in the above-described embodiment, fixed configurations coating liquid nozzle and gas nozzle, on the other hand, make substrate W move to X-direction and form line pattern, but coating liquid nozzle and gas nozzle also can be made to move to X-direction integratedly forms line pattern.That is, the present invention can be applicable to make substrate W relative to nozzle in the X direction relative movement in all pattern formation technologies forming line pattern.
In addition, in the above-described embodiment, to the liquid stream CF blow air of coating liquid, but " gas " of the present invention is not limited thereto, such as, also can spray nitrogen from gas nozzle and be used as " gas " of the present invention.
The present invention can be applicable to, and is that wire supply coating liquid is to all pattern formation technologies forming line pattern from coating liquid nozzle to the substrate relative to this coating liquid nozzle relative movement.Further, in order to control the shape of pattern, gas discharge device (airflow blow unit) 1C is only set or pattern apparatus for shaping (pattern shaping unit) 1D is only set or arrange above-mentioned both, thus the shape of pattern can be controlled well.In addition, pattern apparatus for shaping can be applicable to be formed in all technology of pattern on substrate well, can carry out pattern shaping to arbitrary pattern.
Claims (21)
1. a patterning device, by from the ejiction opening of coating liquid nozzle to the coating liquid of the wire sprayed to the surface of the substrate of first direction movement relative to described coating liquid nozzle, the surface of described substrate forms pattern, it is characterized in that,
This patterning device has at least one in airflow blow unit and pattern shaping unit, wherein, described airflow blow unit with start to spray described coating liquid and stop to spray in described coating liquid at least one accordingly, towards described substrate in said first direction than the surperficial gas jet of upstream side, supply position supplying described coating liquid to described substrate, and in the centre on the ejiction opening of described coating liquid nozzle and the surface of described substrate, to the liquid stream blow flow of described coating liquid; Described pattern shaping unit to the pattern on the surface being formed in described substrate be pulse type gas jet to carry out shaping,
The shape of described pattern is controlled by described gas.
2. patterning device according to claim 1, is characterized in that,
Described airflow blow unit has:
First gas nozzle, it is configured at the downstream of described coating liquid nozzle in said first direction;
First gas supply part, it is to described first gas nozzle supply gas;
First gas supply control part, it controls the supply of the described gas undertaken by described first gas supply part.
3. patterning device according to claim 2, is characterized in that,
Described coating liquid nozzle is configured at the upstream side of the supply position of described coating liquid in said first direction, and described ejiction opening configures towards described supply position,
Described first gas supply part is along the third direction gas jet perpendicular with the second direction of the described coating liquid of supply.
4. patterning device according to claim 2, is characterized in that,
Described first gas supply part has the first feed system, this first feed system is supplying described gas according to the instruction from described first gas supply control part and is stopping supplying between described gas to described first gas nozzle switching to described first gas nozzle
Described first gas supply control part repeatedly carries out supplying described gas by described first feed system and stops the described gas of supply, thus carry out from described first gas nozzle be the impulse jet that pulse type sprays described gas.
5. patterning device according to claim 4, is characterized in that,
Described first gas supply control part started to carry out described impulse jet before starting to spray described coating liquid.
6. patterning device according to claim 5, is characterized in that,
Described first gas supply control part, the pressure putting on the described air-flow of the liquid stream of described coating liquid by described impulse jet after starting to spray described coating liquid is greater than, before starting to spray described coating liquid, is put on the pressure of the described air-flow of the liquid stream of described coating liquid by described impulse jet.
7. patterning device according to claim 4, is characterized in that,
After the described coating liquid of stopping ejection, described first gas supply control part stops the described gas of supply.
8. patterning device according to claim 7, is characterized in that,
Described first gas supply control part, the pressure putting on the described air-flow of the liquid stream of described coating liquid by described impulse jet after stopping the described coating liquid of ejection is less than, before stopping the described coating liquid of ejection, is put on the pressure of the described air-flow of the liquid stream of described coating liquid by described impulse jet.
9. patterning device according to claim 4, is characterized in that,
Described first gas supply part also has the second feed system, this second feed system is supplying described gas according to the instruction from described first gas supply control part and is stopping supplying between described gas to described first gas nozzle switching to described first gas nozzle
Described first gas supply control part with start to spray described coating liquid and stop spraying described coating liquid to spray continuously accordingly, wherein, described continuous injection refers to, maintain and supply described gas by described second feed system, spray described gas continuously from described first gas nozzle.
10. patterning device according to claim 9, is characterized in that,
Described first gas supply control part was sprayed continuously by described second feed system before starting to spray described coating liquid, and from starting to spray the moment of described coating liquid, was added carry out impulse jet by described first feed system.
11. patterning devices according to claim 9, is characterized in that,
Described first gas supply control part, stop being sprayed continuously by described second feed system after the described coating liquid of stopping ejection, and, stop ejection described coating liquid before and stop ejection described coating liquid after at least one, by described first feed system add carry out impulse jet.
12. patterning devices according to claim 1, is characterized in that,
Described pattern shaping unit has:
Second gas nozzle, it makes the second ejiction opening configure towards the pattern formed on the substrate,
Second gas supply part, it is to described second gas nozzle supply gas, thus is that pulse type sprays described gas from described second ejiction opening;
Described second ejiction opening towards described pattern be shaped portion time, be that pulse type sprays described gas and carries out shaping to the described portion of being shaped from described second ejiction opening.
13. patterning devices according to claim 12, is characterized in that,
This patterning device has the second gas supply control part, and this second gas supply control part controls the supply to described second gas nozzle of the described gas that undertaken by described second gas supply part,
In one end of described pattern and the other end at least one for described in be shaped portion,
Described be shaped portion to enter because of the relative movement of described substrate from described second ejiction opening be pulse type spray the region of described gas time, described second gas supply control part supplies described gas by described second gas supply part to described second gas nozzle.
14. patterning devices according to claim 12, is characterized in that,
The time span of spraying described gas is greater than 0.1msec and is less than 5msec.
15. patterning devices according to claim 14, is characterized in that,
The time span of spraying described gas is less than 2msec.
16. patterning devices according to claim 15, is characterized in that,
The time span of spraying described gas is more than 0.5msec and below 1msec.
17. patterning devices according to claim 2, is characterized in that,
Described pattern shaping unit has:
Second gas nozzle, it is configured at the described downstream of described first gas nozzle in said first direction, and the second ejiction opening is configured towards the pattern formed on the substrate,
Second gas supply part, it is to described second gas nozzle supply gas, thus is that pulse type sprays described gas from described second ejiction opening;
Described second ejiction opening towards described pattern be shaped portion time, be that pulse type sprays described gas and carries out shaping to the described portion of being shaped from described second ejiction opening.
18., according to claim 12 to the patterning device according to any one of 17, is characterized in that,
This patterning device has pattern cured portion, and this pattern cured portion makes described pattern cured in the downstream of described second gas nozzle in said first direction.
19. 1 kinds of pattern formation methods, by from the second ejiction opening of coating liquid nozzle to the coating liquid of the wire sprayed to the surface of the substrate of first direction movement relative to described coating liquid nozzle, the surface of described substrate form pattern, it is characterized in that,
Perform at least one in the first operation and the second operation to control the shape of described pattern, wherein, in described first operation, with start to spray described coating liquid and stop to spray in described coating liquid at least one accordingly, towards described substrate in said first direction than the surperficial gas jet of upstream side, supply position supplying described coating liquid to described substrate, and in the centre on the second ejiction opening of described coating liquid nozzle and the surface of described substrate, to the liquid stream blow flow of described coating liquid; In described second operation, be that pulse type gas jet is to carry out shaping to the pattern on the surface being formed in described substrate.
20. pattern formation methods according to claim 19, is characterized in that,
Described first operation and the second operation all perform.
21. pattern formation methods according to claim 20, is characterized in that,
Also there is the 3rd operation, in described 3rd operation, make the pattern cured by described second operation shaping.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-150295 | 2013-07-19 | ||
| JP2013150295A JP2015020118A (en) | 2013-07-19 | 2013-07-19 | Pattern formation device and pattern formation method |
| JP2013169493A JP2015038928A (en) | 2013-08-19 | 2013-08-19 | Pattern shaping device, pattern shaping method, and pattern formation device |
| JP2013-169493 | 2013-08-19 |
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| CN104299927A true CN104299927A (en) | 2015-01-21 |
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| CN201410250180.9A Pending CN104299927A (en) | 2013-07-19 | 2014-06-06 | Pattern forming apparatus and pattern forming method |
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| KR (1) | KR101565250B1 (en) |
| CN (1) | CN104299927A (en) |
| TW (1) | TW201505198A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107812673A (en) * | 2017-10-19 | 2018-03-20 | 苏州协鑫纳米科技有限公司 | The apparatus for coating of perovskite thin film |
| CN110548954A (en) * | 2018-05-31 | 2019-12-10 | 株式会社电装天 | Coating device and coating method |
| CN114643141A (en) * | 2020-12-21 | 2022-06-21 | 普罗科技有限公司 | Viscous solution aerosol spraying device |
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| US5403617A (en) * | 1993-09-15 | 1995-04-04 | Mobium Enterprises Corporation | Hybrid pulsed valve for thin film coating and method |
| CN1325129A (en) * | 2000-03-28 | 2001-12-05 | 株式会社东芝 | Film-forming device |
| CN1396007A (en) * | 2001-07-05 | 2003-02-12 | 日本电气株式会社 | Chemical applying method and its applying device |
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| JP2008036454A (en) | 2006-08-01 | 2008-02-21 | Seiko Epson Corp | Coating device, and method for manufacturing electro-optical device |
| US20100117254A1 (en) * | 2008-11-07 | 2010-05-13 | Palo Alto Research Center Incorporated | Micro-Extrusion System With Airjet Assisted Bead Deflection |
| KR101350948B1 (en) | 2011-09-30 | 2014-01-14 | 세메스 주식회사 | Apparatus and method for treating substrate |
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2014
- 2014-04-16 TW TW103113930A patent/TW201505198A/en unknown
- 2014-06-06 CN CN201410250180.9A patent/CN104299927A/en active Pending
- 2014-06-18 KR KR1020140074350A patent/KR101565250B1/en not_active IP Right Cessation
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5403617A (en) * | 1993-09-15 | 1995-04-04 | Mobium Enterprises Corporation | Hybrid pulsed valve for thin film coating and method |
| CN1325129A (en) * | 2000-03-28 | 2001-12-05 | 株式会社东芝 | Film-forming device |
| CN1396007A (en) * | 2001-07-05 | 2003-02-12 | 日本电气株式会社 | Chemical applying method and its applying device |
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| CN107812673A (en) * | 2017-10-19 | 2018-03-20 | 苏州协鑫纳米科技有限公司 | The apparatus for coating of perovskite thin film |
| CN110548954A (en) * | 2018-05-31 | 2019-12-10 | 株式会社电装天 | Coating device and coating method |
| CN114643141A (en) * | 2020-12-21 | 2022-06-21 | 普罗科技有限公司 | Viscous solution aerosol spraying device |
Also Published As
| Publication number | Publication date |
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| TW201505198A (en) | 2015-02-01 |
| KR20150010583A (en) | 2015-01-28 |
| KR101565250B1 (en) | 2015-11-02 |
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