JP5441968B2 - Intermittent coating equipment - Google Patents

Intermittent coating equipment Download PDF

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JP5441968B2
JP5441968B2 JP2011190337A JP2011190337A JP5441968B2 JP 5441968 B2 JP5441968 B2 JP 5441968B2 JP 2011190337 A JP2011190337 A JP 2011190337A JP 2011190337 A JP2011190337 A JP 2011190337A JP 5441968 B2 JP5441968 B2 JP 5441968B2
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gas
coating
roll
substrate
intermittent
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JP2013052322A (en
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満之 井上
一男 西浦
朋樹 林
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株式会社テクノスマート
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本発明は、基材の表面に間欠塗工装置で基材長手方向に沿って塗工域と非塗工域を交互に形成するときに、塗工域の塗工始端部又は塗工終端部に生じた盛り上がり部の盛り上がり高さ寸法を小さくすることに関するものである。   When the present invention alternately forms a coating area and a non-coating area along the longitudinal direction of the substrate with an intermittent coating apparatus on the surface of the substrate, the coating start end or the coating end of the coating area This relates to reducing the height of the raised portion of the raised portion.

例えば、電池の負極板を製造するときに、負極集電体用銅箔からなる基材に負極ペースト状塗工剤をダイ塗工装置で塗工域と非塗工域を交互に間欠塗工する場合、塗工開始時にはダイ内部の圧力が高くなっているため、塗工域の塗工始端部に盛り上がり部ができてしまうことがある(特許文献1)。   For example, when manufacturing a negative electrode plate for a battery, a negative electrode paste coating agent is applied intermittently between a coating area and a non-coating area on a substrate made of a copper foil for a negative electrode current collector using a die coating device. In this case, since the pressure inside the die is high at the start of coating, a rising portion may be formed at the coating start end of the coating area (Patent Document 1).

特開2003−223899号公報JP 2003-223899 A

前記盛り上がり部は、塗工域と非塗工域の境界面であるため、塗工後の乾燥時における熱的負荷が多くなり、結合剤のマイグレーションにより、負極集電体との密着強度が低下する等の問題点がある。また、盛り上がり部は、ダイ塗工装置による電池の負極板の製造に限定されるものでもなく、基材に高粘度(例えば、1000cps以上)の塗工剤をリバースキス塗工装置等で間欠塗工するときに塗工域の塗工終端部にできることもあり、基材との密着強度の低下や、後工程における圧延時の割れ等の諸問題を招くことがある。   Since the raised portion is the boundary surface between the coating area and the non-coating area, the thermal load during drying after coating increases, and the adhesion strength with the negative electrode current collector decreases due to migration of the binder. There are problems such as. Further, the raised portion is not limited to the production of the negative electrode plate of the battery by the die coating device, but a high viscosity (for example, 1000 cps or more) coating agent is intermittently applied to the substrate by a reverse kiss coating device or the like. There are cases where it can be made at the coating end portion of the coating area at the time of processing, and this may cause various problems such as a decrease in adhesion strength with the substrate and cracks during rolling in the subsequent process.

本発明は、盛り上がり部に起因する諸問題を解決するために、塗工域の塗工始端部又は塗工終端部に生じる盛り上がり部の盛り上がり高さ寸法を小さくできる、間欠塗工設備の提供を目的とする。 The present invention, in order to solve the problems caused by swelling portion, the raised height of the raised part generated on the coating starting end or coating the end of the coating zone can be reduced, provided between Ketsunuri Engineering Equipment With the goal.

ガス噴出用スリットから噴出するガスの風圧を最適値まで瞬時に高めて盛り上がり高さ寸法を確実に小さくさせるために請求項記載の本発明が採用した手段は、基材走行路の途中に設けられた間欠塗工装置で、基材走行路を走行する基材の表面に基材走行方向に沿って塗工域と非塗工域を交互に形成するときに、塗工域の塗工始端部又は塗工終端部に盛り上がり部が生じる間欠塗工設備において、盛り上がり部が通過する基材走行路の所定箇所に向かってガスを噴出させるガス噴出用スリットを備えたガス噴出装置と、ガス噴出用スリットから噴出させるガスをガス噴出装置へ設定時間だけ供給するガス供給装置を備え、前記ガス供給装置は、前記ガス噴出装置に逆止弁を介して通じると共にガス源に逆止弁を介して通じるシリンダー及びシリンダーに内嵌して進退するピストンからなり、前記ピストンの後退で前記ガス源から前記シリンダー内部にガスを取り込むと共に前記ピストンの前進で前記シリンダー内部のガスを前記ガス噴出装置へ供給するポンプと、前記ピストンを進退させる可変速式モータを備えたことを特徴とする間欠塗工設備である。 The means adopted by the present invention according to claim 1 is provided in the middle of the substrate traveling path in order to instantaneously increase the wind pressure of the gas ejected from the gas ejection slit to an optimum value and to reliably reduce the rising height dimension. When the coating area and the non-coating area are alternately formed along the substrate traveling direction on the surface of the substrate traveling on the substrate traveling path with the intermittent coating apparatus provided, the coating start of the coating area In an intermittent coating facility in which a swell portion is generated at a part or a coating end portion, a gas ejection device having a gas ejection slit for ejecting gas toward a predetermined portion of a substrate traveling path through which the swell portion passes, and a gas ejection the gas to be jetted from the use slit comprises a gas supply device for supplying only the set time to the gas injection device, the gas supply device, through a check valve to a gas source with leads through a check valve to the gas discharge device Cylinder and leading to Consists piston which internally fitted to advance and retreat in Linder, a pump for supplying the cylinder internal gas forward of the piston fetches the gas into the cylinder from the gas source in the retraction of the piston into the gas injection device, is intermittent coating equipment, characterized in that a speed-variable motor for advancing and retracting the piston.

請求項記載の本発明に係る間欠塗工設備は、可変速式モータを設定速度で起動させてピストンを前進させることで、ガス噴出装置のガス噴出用スリットから噴出すガスの風圧を最適値まで瞬時に高めて盛り上がり高さ寸法を確実に小さくさせることができる。 The intermittent coating equipment according to the first aspect of the present invention has an optimum value of the wind pressure of the gas ejected from the gas ejection slit of the gas ejection device by starting the variable speed motor at a set speed and moving the piston forward. It is possible to increase the height dimension up to an instant and to reliably reduce the raised height dimension.

欠塗工設備の第1の実施の形態を示すものであって、図(A)は間欠塗工設備1の全体の概略を示す側面図、図(B)は主要部の平面図である。There is shown a first embodiment of between Ketsunuriko設Bei, Fig (A) is a side view showing a schematic overall between Ketsunuri Engineering equipment 1, FIG. (B) is a plan view of a main portion It is. 同実施の形態おけるガス噴出装置7の近辺を拡大した側面図である。It is the side view to which the vicinity of the gas ejection apparatus 7 in the same embodiment was expanded. 同実施の形態においてガス噴出装置7で盛り上がり部Qを均し処理する状況を拡大して示す側面図であって、図(A)はガス噴出装置7のガス噴出用スリット14から盛り上がり部Qに向かってガスGを吹き付けた直後であり、図(B)はガスの吹き付けを停止し後の均し処理された盛り上がり部Q’の高さ寸法が小さくなった状態である。It is a side view which expands and shows the situation where the bulge part Q is equalized and processed in the gas jetting device 7 in the same embodiment, and the figure (A) is from the gas jetting slit 14 of the gas jetting device 7 to the bulging part Q. Immediately after the gas G is sprayed, FIG. (B) shows a state in which the height dimension of the raised portion Q ′ subjected to the leveling process after the gas spraying is stopped is reduced. 同実施の形態においてガス噴出装置で盛り上がり部を処理する異なる態様の状況を拡大して示す側面図であって、図(A)はガス噴出装置7のガス噴出用スリット14から盛り上がり部Qに向かってガスGを吹き付けた直後であり、図(B)はガスの吹き付けを停止し後の均し処理された盛り上がり部Q’の高さ寸法が小さくなった状態である。It is a side view which expands and shows the situation of a different mode which processes a rising part with a gas jetting device in the embodiment, and Drawing (A) goes to rising part Q from slit 14 for gas jetting of gas jetting device 7. FIG. 5B shows a state in which the height dimension of the bulging portion Q ′ subjected to the smoothing process after the gas blowing is stopped is reduced immediately after the gas G is sprayed. 同実施の形態においてガス噴出装置で盛り上がり部を処理する更に異なる態様の状況を拡大して示す側面図であって、図(A)はガス噴出装置7のガス噴出用スリット14から盛り上がり部Qに向かってガスGを吹き付けた直後であり、図(B)はガスの吹き付けを停止し後の均し処理された盛り上がり部Q’の高さ寸法が小さくなった状態である。It is a side view which expands and shows the situation of the further different mode which processes a swell part with a gas jetting device in the embodiment, and Drawing (A) is from swell 14 for gas jetting of gas jetting device 7 to swelling part Q. Immediately after the gas G is sprayed, FIG. (B) shows a state in which the height dimension of the raised portion Q ′ subjected to the leveling process after the gas spraying is stopped is reduced. 第2の実施の形態に係る間欠塗工設備21の全体の概略を示す側面図である。Is a side view showing an overall outline of a second between the Ru engaged to the embodiment Ketsunuri Engineering equipment 21. 第3の実施の形態に係る間欠塗工設備31の全体の概略を示す側面図である。Is a side view showing an overall outline of a third between Ketsunuri Engineering equipment 31 engaged Ru to the embodiment of. 第4の実施の形態に係る間欠塗工設備51の全体の概略を示す側面図である。Is a side view showing an overall outline of the fourth between Ru engaged to the embodiment Ketsunuri Engineering equipment 51. 第5の実施の形態に係る間欠塗工設備61の全体の概略を示す側面図である。Is a side view showing an overall outline of a fifth between Ketsunuri Engineering equipment 61 engaged Ru to the embodiment of.

欠塗工設備を図面に示す実施の形態に基づいて説明する。なお、「前」「後」「左」「右」「上」及び「下」は、各図面に示す通りであり、左右方向を基材Wの横断方向に沿うようにしてある。 It will be described with reference to embodiments shown between Ketsunuriko設Bei the drawings. Note that “front”, “rear”, “left”, “right”, “upper”, and “lower” are as shown in the drawings, and the horizontal direction is along the transverse direction of the substrate W.

(第1の実施の形態)
第1の実施の形態に係る間欠塗工設備1は、図1に示す如く、基材走行路Rの途中に設けられた間欠塗工装置2で、基材走行路Rを走行する基材Wの表面に基材走行方向Sに沿って塗工域Cと非塗工域Dを交互に形成するものである。本例における間欠塗工装置2は、ダイ塗工方式であり、電動モータ20で駆動されて設定速度で回転するバッキングロール3と、バッキングロール3の外周面3a上に形成される基材走行路Rに向かって塗工剤を吐出・停止させるダイ塗工ヘッド4と、ダイ塗工ヘッド4のダイ内部に対する塗工剤の供給と停止を交互に繰り返す塗工剤供給装置5を備えている。バッキングロール3は、基材走行路Rを走行する基材Wを、外周面3aに圧着した状態で巻回させつつ、設定速度Vで走行さる。ダイ塗工ヘッド4は、走行中の基材Wに対して、左右方向に延びる吐出口4aの先端開口部から吐出する塗工剤を膜状に塗着させて塗工域Cを形成すると共に、塗工剤の吐出を停止させて非塗工域Dを形成するように構成され、塗工開始時にはダイ内部の圧力が一時的に高くなるため、塗工域Cの塗工始端部Caに左右方向へ延びる盛り上がり部Qを生じさせる。
(First embodiment)
Engaging Ru between Ketsunuri Engineering equipment 1 in the first embodiment, as shown in FIG. 1, an intermittent coating apparatus 2 provided in the middle of the path of substrate travel R, groups traveling path of substrate travel R A coating area C and a non-coating area D are alternately formed on the surface of the material W along the substrate traveling direction S. The intermittent coating apparatus 2 in this example is a die coating method, and is a backing roll 3 that is driven by an electric motor 20 and rotates at a set speed, and a substrate traveling path that is formed on the outer peripheral surface 3a of the backing roll 3. A die coating head 4 that discharges and stops the coating agent toward R, and a coating agent supply device 5 that alternately repeats supply and stop of the coating agent to the inside of the die of the die coating head 4 are provided. The backing roll 3 travels at the set speed V while winding the base material W traveling on the base material travel path R in a state where the backing roll 3 is crimped to the outer peripheral surface 3a. The die coating head 4 forms a coating area C by applying a coating agent, which is discharged from the tip opening of the discharge port 4a extending in the left-right direction, to the traveling substrate W in a film shape. In this case, the non-coating region D is formed by stopping the discharge of the coating agent, and the pressure inside the die is temporarily increased at the start of coating. A raised portion Q extending in the left-right direction is generated.

欠塗工設備1は、図1に示す如く、盛り上がり部Qの盛り上がり高さ寸法を小さくするために均し装置6を備えている。均し装置6は、バッキングロール3の外周面3a上の基材走行路Rにおけるダイ塗工ヘッド4より下流側の箇所に向かってガスGを吹き付けるガス噴出装置7と、ガス噴出装置7へ噴出用ガスGを供給するガス供給装置8を備え、盛り上がり部Qが通過する基材走行路Rの所定箇所Ra(盛り上がり部Qの高さ寸法を小さくするための均し処理する箇所)に向かって、ガス噴出装置7から盛り上がり部Qの左右幅方向全域にガスGを設定時間だけ吹き付けるようにしてある。 During Ketsunuri Engineering equipment 1, as shown in FIG. 1, a leveling device 6 in order to reduce the swelling height of the swelling portion Q. The leveling device 6 is a gas jetting device 7 that blows a gas G toward the downstream side of the die coating head 4 in the base material traveling path R on the outer peripheral surface 3 a of the backing roll 3, and jets to the gas jetting device 7. A gas supply device 8 for supplying the working gas G is provided, toward a predetermined location Ra (a location for leveling to reduce the height of the raised portion Q) of the base material traveling path R through which the raised portion Q passes. The gas G is blown from the gas blowing device 7 to the entire width direction of the raised portion Q for a set time.

前記ガス噴出装置7は、図1に示す如く、内部に左右方向に延びるガス通路10aを形成した中空状の保持具10と、保持具10に取着した左右方向に延びる二枚のリップ片11,12を備え、リップ片11,12の間に左右方向へ連続的に延びるように形成されたガス噴出用スリット13をガス通路10aに連通させ、ガス供給装置8からガス通路10aへ供給されるガスGをガス噴出用スリット13の左右幅方向全域から基材走行路Rの所定箇所Raに向かって均一の風圧(例えば、ガス通路10aの静圧が大気圧基準で0.1〜0.5MPa)で噴出させるようにしてある。ガス供給装置8は、固定台(図示略)に調節具(図示略)を介して取着され、図2示す如く、スリット先端部13aからバッキングロール3の半径方向Eに沿って基材Wの表面に至るまでの距離H、及び基材Wの表面に対する噴出ガスの吹付け角度θ(ガス噴出用スリット13の中心線Jと基材表面の接線Kとの交差角度)を最適値に調節できるようにしてある。また、ガス供給装置8は、二枚のリップ片11,12の各々を矢符M方向へ移動させることで、噴出用スリット13の厚み寸法Tを最適値(例えば、10〜100μmの範囲で選択できる値)に調節できるようにしてある。   As shown in FIG. 1, the gas ejection device 7 includes a hollow holder 10 having a gas passage 10 a extending in the left-right direction therein, and two lip pieces 11 extending in the left-right direction attached to the holder 10. , 12, and a gas ejection slit 13 formed so as to extend continuously in the left-right direction between the lip pieces 11, 12 is communicated with the gas passage 10 a and supplied from the gas supply device 8 to the gas passage 10 a. A uniform wind pressure (for example, the static pressure of the gas passage 10a is 0.1 to 0.5 MPa on the basis of the atmospheric pressure) from the entire width direction of the gas ejection slit 13 toward the predetermined location Ra of the base material traveling path R. ). The gas supply device 8 is attached to a fixing base (not shown) via an adjustment tool (not shown), and as shown in FIG. 2, the gas supply device 8 extends from the slit tip portion 13 a along the radial direction E of the backing roll 3. The distance H to the surface and the spraying angle θ of the ejection gas with respect to the surface of the substrate W (intersection angle between the center line J of the gas ejection slit 13 and the tangent line K of the substrate surface) can be adjusted to optimum values. It is like that. Further, the gas supply device 8 moves each of the two lip pieces 11 and 12 in the direction of the arrow M, so that the thickness dimension T of the ejection slit 13 is selected to an optimum value (for example, in the range of 10 to 100 μm). Can be adjusted).

前記ガス供給装置8は、図1に示す如く、窒素や空気等の高圧ガスを貯留したタンク等からなるガス源15と、ガス源15からガス供給装置8のガス通路10aに至るガス供給路16と、ガス供給路16の上流側に設けた減圧弁などからなる圧力調整弁17と、ガス供給路16の下流側に設けた開閉弁18と、開閉弁18及び塗工剤供給装置5の制御弁5aに操作信号を発する制御装置19とを備えている。制御装置19は、塗工剤供給装置5の制御弁5aに開弁信号を発してダイ塗工ヘッド4による塗工域Cの塗着を開始させた後に、塗工域Cの塗工始端部Caに形成された盛り上がり部Qが、均し処理位置となる基材走行路Rの所定箇所Raへ至ったときに、ガス供給装置8の開閉弁18に開弁信号を発して、ガス噴出装置7のガス噴出用スリット13からガスGを設定時間(例えば、0.1〜0.5秒)だけ噴出させて盛り上がり部Qに吹き付けるようにしてある。盛り上がり部Qに吹き付けられたガスGは、図3に示す如く、盛り上がり部Qを均して、均し処理後の盛り上がり部Q’の高さ寸法を小さくさせる。制御装置19は、図1に示す如く、ガス供給装置8の開閉弁18に開弁信号を発しするタイミングを得る一例として、バッキングロール3の外周面3a上に形成されている基材走行路Rの塗工開始位置Rbから均し処理位置となる所定箇所Raへ至るまでの距離Lを、基材Wの走行速度V(バッキングロール3の外周面の回転速度)で除し(L÷V)て得られる時間で、そのタイミングを得るようにしている。基材Wの走行速度Vは、バッキングロール3を駆動する電動モータ20の回転計等からの速度信号で得る。タイミングを得る他例として、検知器14で検知された盛り上がり部Qが通過する基材走行路Rの検知位置から均し処理位置となる所定箇所Raへ至るまでの距離を、基材Wの走行速度Vで除して得られる時間で、そのタイミングを得るようにしている。ガス噴出用スリット13から盛り上がり部QにガスGを吹き付ける設定時間は、盛り上がり部Qの大きさ及び塗工剤の粘度等に応じて決定される。制御装置19は、塗工剤供給装置5の制御弁5aに対して、閉弁信号を発した後に設定長さ寸法の塗工域Cが形成されたとき、閉弁信号を発して塗工終端部Cbを形成させる。   As shown in FIG. 1, the gas supply device 8 includes a gas source 15 including a tank storing high pressure gas such as nitrogen and air, and a gas supply path 16 extending from the gas source 15 to the gas passage 10 a of the gas supply device 8. And a pressure regulating valve 17 including a pressure reducing valve provided on the upstream side of the gas supply passage 16, an on-off valve 18 provided on the downstream side of the gas supply passage 16, and the control of the on-off valve 18 and the coating agent supply device 5. And a control device 19 that issues an operation signal to the valve 5a. The control device 19 issues a valve opening signal to the control valve 5a of the coating agent supply device 5 to start the application of the coating area C by the die coating head 4, and then the coating start end of the coating area C When the swelled portion Q formed in Ca reaches a predetermined location Ra of the base material traveling path R serving as a leveling processing position, a valve opening signal is issued to the on-off valve 18 of the gas supply device 8, and the gas ejection device The gas G is ejected from the gas ejection slit 13 of No. 7 for a set time (for example, 0.1 to 0.5 seconds) and blown to the rising portion Q. As shown in FIG. 3, the gas G blown to the raised portion Q levels the raised portion Q and reduces the height dimension of the raised portion Q ′ after the leveling process. As shown in FIG. 1, the control device 19 is an example of obtaining the timing for issuing a valve opening signal to the on-off valve 18 of the gas supply device 8, and the base material traveling path R formed on the outer peripheral surface 3 a of the backing roll 3. The distance L from the coating start position Rb to the predetermined location Ra serving as the leveling position is divided by the traveling speed V of the substrate W (rotational speed of the outer peripheral surface of the backing roll 3) (L ÷ V). The timing is obtained by the time obtained by The traveling speed V of the base material W is obtained from a speed signal from a tachometer or the like of the electric motor 20 that drives the backing roll 3. As another example of obtaining the timing, the distance from the detection position of the base material travel path R through which the raised portion Q detected by the detector 14 passes to the predetermined location Ra serving as the leveling processing position is determined by the travel of the base material W. The timing is obtained by the time obtained by dividing by the speed V. The set time for blowing the gas G from the gas ejection slit 13 to the raised portion Q is determined according to the size of the raised portion Q, the viscosity of the coating agent, and the like. When the coating area C having a set length is formed after issuing a valve closing signal to the control valve 5a of the coating agent supply device 5, the control device 19 issues a valve closing signal to terminate the coating. Part Cb is formed.

欠塗工設備1を用いた間欠方法は、図1に示す如く、バッキングロール3に巻回されて走行する基材Wの表面に間欠塗工装置2で基材走行方向Sに沿って塗工域Cと非塗工域Dを交互に形成するときに、塗工域Cの塗工始端部Caに盛り上がり部Qを生じさせる場合において、図3(A)に示すようにガス噴出装置7のガス噴出用スリット13から噴出するガスGを設定時間だけ盛り上がり部Qに吹き付けて盛り上がり部Qを均し、同図(B)に示すように均し処理後の盛り上がり部Q’の高さ寸法を均し処理前の状態よりも小さくさせる。ガス噴出装置7のガス噴出用スリット13からガスを噴出させる方向としては、図3(A)に示すように基材Wの走行方向Sと逆方向の成分を含む場合と、図4(A)に示すように基材Wの走行方向Sと同方向の成分を含む場合と、図5(A)に示すようにバッキングロール3の半径方向(すなわち、基材Wの垂直方向)Eに沿う場合とがある。 Intermittent method using between Ketsunuri Engineering equipment 1, as shown in FIG. 1, along the substrate travel direction S on the surface of the substrate W which runs wound backing roll 3 wound with intermittent coating apparatus 2 When the coating area C and the non-coating area D are alternately formed, in the case where the rising portion Q is generated at the coating start end Ca of the coating area C, as shown in FIG. The gas G ejected from the gas ejection slit 13 is sprayed to the swell portion Q for a set time to level the swell portion Q, and the height of the swell portion Q ′ after the leveling process as shown in FIG. Make the dimensions smaller than before the leveling process. As a direction in which the gas is ejected from the gas ejection slit 13 of the gas ejection device 7, as shown in FIG. 3A, a case where a component in the direction opposite to the traveling direction S of the substrate W is included, and FIG. When the component in the same direction as the traveling direction S of the base material W is included as shown in FIG. 5 and when the radial direction of the backing roll 3 (that is, the vertical direction of the base material W) E is shown as shown in FIG. There is.

欠方法は、ガス噴出装置7のガス噴出用スリット13から噴出したガスの風圧で盛り上がり部Qを押し広げて表面を均し、均し処理後の盛り上がり部Q’の高さ寸法を塗工域Cの内側の塗工膜の厚み寸法に近似させるものであって、盛り上がり部Qを塗工域Cから分離させるように吹き飛ばすものではない。盛り上がり部Qを吹き飛ばすことは、飛散物で塗工域C又は非塗工域Dを汚すことになるため、好ましくない。なお、盛り上がり部Qを押し広げる方向としては、図3(B)に示すように塗工域Cの内側へ広げる場合と、図4(B)に示すように塗工域Cの外側へ広げる場合と、図5(B)に示すように塗工域Cの内側と外側へ分散させて広げる場合とがある。 Intermittent method, leveling the surface push the raised part Q in wind pressure of gas ejected from the gas ejection slit 13 of the gas injection device 7, coating the height of the raised part Q 'after the smoothing treatment It is approximated to the thickness dimension of the coating film inside the area C, and is not blown away so as to separate the raised portion Q from the coating area C. It is not preferable to blow off the swelled portion Q because the coating area C or the non-coating area D is soiled with scattered matter. In addition, as a direction which pushes up the swelling part Q, when expanding to the inner side of the coating area C as shown in FIG. 3 (B) and when expanding to the outer side of the coating area C as shown in FIG. 4 (B) In some cases, as shown in FIG. 5 (B), the coating area C is spread and dispersed inside and outside.

(第2の実施の形態)
図6は第2の実施の形態に係る間欠塗工設備21を示すものである。本実施の形態に係る間欠塗工設備21は、ガス噴出装置7のガス噴出用スリット13から噴出するガスを吹き付ける基材走行路Rの所定箇所Ra(盛り上がり部Qの高さ寸法を小さくするための均し処理位置となる箇所)を、基材走行路Rにおけるバッキングロール3よりも下流側に配設した均し処理用ローラ22の外周面上に位置させた点が前記第1の実施の形態と大きく異なり、その他の部分については第1の実施の形態と実質的に同一であり、図6において図1乃至図5に記載の符号と同一の符号は相当部分を示す。
(Second Embodiment)
6 shows between Ketsunuri Engineering equipment 21 engages Ru to the second embodiment. During Ketsunuri Engineering equipment 21 Ru engaged to the present embodiment, reduce the height of the predetermined portion Ra (raised part Q of the substrate travel path R to blow gas ejected from the gas ejection slit 13 of the gas injection device 7 Is a point where the leveling processing position for positioning) is positioned on the outer peripheral surface of the leveling roller 22 disposed on the downstream side of the backing roll 3 in the substrate traveling path R. Unlike the first embodiment, the other parts are substantially the same as those of the first embodiment. In FIG. 6, the same reference numerals as those shown in FIGS. 1 to 5 indicate the corresponding parts.

欠塗工設備21を用いた間欠方法は、バッキングロール3に巻回されて走行する基材Wの表面に間欠塗工装置2で基材走行方向に沿って塗工域Cと非塗工域D(図1参照)を交互に形成するときに、塗工域Cの塗工始端部Caに盛り上がり部Qを生じさせる場合において、盛り上がり部Qが均し処理用ローラ22の外周面上に形成された基材走行路Rの所定箇所Raを通過するときに、ガス噴出装置7のガス噴出用スリット13から設定時間だけガスを噴出させて盛り上がり部Qに吹き付けて均し、盛り上がり高さ寸法を小さくする。ガス噴出装置7のガス噴出用スリット13からガスを噴出させる方向としては、図3(A)に示すように基材Wの走行方向と逆方向の成分を含む場合と、図4(A)に示すように基材Wの走行方向と同方向の成分を含む場合と、図5(A)に示すように基材Wの垂直方向Eに沿う場合とがある。 During intermittent method using Ketsunuri Engineering equipment 21, the coating region C and Hinuri along the substrate travel direction on the surface of the substrate W which runs wound backing roll 3 wound with intermittent coating apparatus 2 When alternately forming the work areas D (see FIG. 1), when the raised portions Q are generated at the coating start end Ca of the coating area C, the raised portions Q are on the outer peripheral surface of the leveling processing roller 22. When passing through a predetermined location Ra of the substrate running path R formed on the gas, the gas is ejected from the gas ejection slit 13 of the gas ejection device 7 for a set time and blown to the swelled portion Q and leveled, and the swell height Reduce dimensions. As a direction in which the gas is ejected from the gas ejection slit 13 of the gas ejection device 7, as shown in FIG. As shown, there may be a case where a component in the same direction as the traveling direction of the substrate W is included, and a case where the component is along the vertical direction E of the substrate W as shown in FIG.

(第3の実施の形態)
図7は第3の実施の形態に係る間欠塗工設備31を示すものである。本実施の形態に係る間欠塗工設備31は、均し装置6を構成するガス供給装置38の一部が前記第1の実施の形態と大きく異なり、その他の部分については第1の実施の形態と実質的に同一であり、図7において図1乃至図5に記載の符号と同一の符号は相当部分を示す。
(Third embodiment)
Figure 7 shows a Ketsunuri Engineering equipment 31 while engaging Ru to the third embodiment. Ketsunuri Engineering equipment 31 between Ru engaged to this embodiment differs significantly from the part of the gas supply apparatus 38 constituting a leveling device 6 first embodiment, the first embodiment for the other parts In FIG. 7, the same reference numerals as those shown in FIGS. 1 to 5 denote corresponding parts.

前記ガス供給装置38は、第lの実施の形態における開閉弁18の代わりにガス押出し装置39を備えている。ガス押出し装置39は、ガス噴出装置7のガス噴出用スリット13に逆止弁34を介して通じさせると共にガス源15に逆止弁35を介して通じさせたシリンダー36及びシリンダー36に進退自在に内嵌したピストン37を備え、ピストン37の後退(矢符N方向への移動)でガス源15からシリンダー内部36aにガスを取り込むと共にピストン37の前進(矢符P方向への移動)でシリンダー内部36aのガスを加圧してガス噴出装置7へ供給するポンプ32と、ピストン37を進退させる駆動装置33とを備えている。駆動装置33は、可変速式モータ33aと、可変速式モータ33aの出力回転運動をピストン37の進退運動に変換するピニオン・ラックギア等の伝導機構33bとからなる。   The gas supply device 38 includes a gas extrusion device 39 instead of the on-off valve 18 in the first embodiment. The gas extruding device 39 communicates with the gas ejection slit 13 of the gas ejection device 7 through the check valve 34 and allows the gas source 15 to communicate with the gas source 15 through the check valve 35 and the cylinder 36 so as to freely advance and retreat. A piston 37 fitted therein is provided, and when the piston 37 moves backward (moving in the direction of arrow N), gas is taken into the cylinder interior 36a from the gas source 15 and the piston 37 moves forward (moving in the direction of arrow P) to move inside the cylinder. A pump 32 that pressurizes the gas 36a and supplies the gas to the gas ejection device 7 and a drive device 33 that moves the piston 37 back and forth are provided. The drive device 33 includes a variable speed motor 33a and a transmission mechanism 33b such as a pinion / rack gear for converting the output rotational motion of the variable speed motor 33a into the forward / backward motion of the piston 37.

前記ガス押出し装置39は、可変速式モータ33aの回転速度の変更でピストン37の移動速度が変化するため、可変速式モータ33aを増速してピストン37の前進を速くすることで、シリンダー内部36aのガス圧力を高めてガス噴出用スリット13から噴出すガスの風圧を高めることができ、逆に、可変速式モータ33aを減速してピストン37の前進を遅くすることで、シリンダー内部36aのガス圧力を低くしてガス噴出用スリット13から噴出すガスの風圧を低くすることができるため、盛り上がり部Qの均し処理に適した設定速度で可変速式モータ33aを起動させてピストン37を前進させることで、ガス噴出装置7のガス噴出用スリット13から噴出すガスの風圧を最適値まで瞬時に高め、均し処理後の盛り上がり高さ寸法を確実に小さくさせることができるようになる。   Since the moving speed of the piston 37 is changed by changing the rotational speed of the variable speed motor 33a, the gas pushing device 39 increases the speed of the variable speed motor 33a to make the piston 37 move forward faster. The gas pressure of gas 36a can be increased by increasing the gas pressure of the gas ejection slit 13a. Conversely, the variable speed motor 33a can be decelerated to slow the forward movement of the piston 37. Since the gas pressure can be lowered and the wind pressure of the gas ejected from the gas ejection slit 13 can be lowered, the variable speed motor 33a is activated at a set speed suitable for the leveling process of the swell portion Q, and the piston 37 is activated. By moving forward, the wind pressure of the gas ejected from the gas ejection slit 13 of the gas ejection device 7 is instantaneously increased to the optimum value, and the rising height after the leveling treatment It is possible to reliably reduce.

また、前記ガス押出し装置39は、ピストン37を前進させる可変速式モータ33aの起動から停止までの時間を設定してピストン37の前進時間を決定することで、ガス噴出装置7から盛り上がり部Qの左右幅方向全域にガスGを設定時間だけ吹き付けることができる。更に、前記ガス押出し装置39は、ピストン37を前進させている可変速式モータ33aの回転を停止後に直ちに逆回転させることで、シリンダー内部36aのガス圧力を急速に減圧させてガス噴出装置7のガス噴出用スリット13からのガスの噴出を停止させることができる。ガス押出し装置39は、可変速式モータ33aの起動・停止のタイミングと回転速度の設定で、ガス噴出用スリット13からガスを噴出させる開始から停止に至るまでの各経過時刻におけるガス噴出速度を最適値にすることができると共に、ガス噴出用スリット13から噴出するガスを瞬時に停止させることが可能となり、盛り上がり部Qの大きさや塗工剤の粘度等の仕様に対応させることができる。   Further, the gas pusher 39 sets the time from the start to the stop of the variable speed motor 33a for moving the piston 37 forward and determines the advance time of the piston 37, so that the gas jetting device 7 can increase the swell portion Q. The gas G can be sprayed for the set time over the entire lateral width direction. Further, the gas extrusion device 39 rapidly reverses the rotation of the variable speed motor 33a that advances the piston 37 immediately after the rotation, thereby rapidly reducing the gas pressure in the cylinder interior 36a, so that the gas ejection device 7 The ejection of gas from the gas ejection slit 13 can be stopped. The gas extrusion device 39 optimizes the gas ejection speed at each elapsed time from the start to the stop of gas ejection from the gas ejection slit 13 by setting the start / stop timing and rotation speed of the variable speed motor 33a. In addition, the gas ejected from the gas ejection slit 13 can be instantaneously stopped, and specifications such as the size of the raised portion Q and the viscosity of the coating agent can be met.

欠塗工設備31を用いた間欠方法は、ガス噴出装置7のガス噴出用スリット13からガスを噴出させる開始から停止に至るまでの各経過時刻におけるガス噴出速度を最適値にすることができると共に、ガス噴出用スリット13から噴出するガスを瞬時に停止させこと以外については、第1の実施の形態の場合の間欠方法と実質的に同一である。 Intermittent method using between Ketsunuri Engineering equipment 31, be optimized value of the gas ejection speed at each elapsed time up to the stop from the start for ejecting gas from the gas ejection slit 13 of the gas injection device 7 with it, except for possible to stop the gas ejected from the gas ejection slits 13 instantaneously, is substantially identical to the intermittent method in the case of the first embodiment.

(第4の実施の形態)
図8は第4の実施の形態に係る間欠塗工設備41を示すものである。本実施の形態に係る間欠塗工設備41は、間欠塗工装置42をリバースキス塗工方式とした点が前記第1の実施の形態と大きく異なり、その他の部分については第1の実施の形態と実質的に同一であり、図8において図1乃至図5に記載の符号と同一の符号は相当部分を示す。
(Fourth embodiment)
Figure 8 shows a between Ketsunuri Engineering equipment 41 engages Ru to the fourth embodiment. Ketsunuri Engineering equipment 41 between Ru engaged to this embodiment differs greatly intermittent coating apparatus 42 is a point which has a reverse kiss coating method with the first embodiment, the first embodiment for the other parts In FIG. 8, the same reference numerals as those shown in FIGS. 1 to 5 indicate the corresponding parts.

前記間欠塗工装置42は、基材走行路Rを形成する上流側の基材送りロール43と、基材送りロール43よりも基材走行路Rの下流側の非塗工面側Rdに基材走行方向Sへ向かって順番に設けた定位置の上流側基準ロール44、進退自在な塗工切替ロール45、進退自在な張力調整用ロール46及び定位置の下流側基準ロール(均し処理用ローラ)47と、上流側基準ロール44と塗工切替ロール45の間の基材走行路Rの塗工面側Rcの定位置に塗工切替ロール45の回転方向Uと同一方向へ回転するように配置され、ロール外周面48a上に凹部を刻設した塗工ロール48と、塗工切替ロール45を基材走行路Rの非塗工面側Rdから塗工面側Rcへ向かって非塗工操作位置Aから塗工操作位置Bまで前進させる塗工操作及びこの間で塗工切替ロール45を逆方向へ向かって後退させる非塗工操作を交互に繰り返す塗工切替ロール用操作装置49と、張力調整用ロール46を基材走行路Rの塗工面側Rcから非塗工面側Rdへ向かって非塗工操作位置Yから塗工操作位置Zまで後退させる塗工操作及びこの間で張力調整用ロール46を逆方向へ向かって後退させる非塗工操作を交互に繰り返す張力調整用ロール用操作装置50と、塗工切替ロール用操作装置49の電動サーボモータ等からなる駆動源49a及び張力調整用ロール用操作装置50の電動サーボモータ等からなる駆動源50aの操作を制御すると共にガス供給装置8の開閉弁18の開閉を制御する制御装置51とを備えている。   The intermittent coating apparatus 42 includes a base material feed roll 43 on the upstream side forming the base material travel path R, and a base material on the non-coating surface side Rd on the downstream side of the base material travel path R relative to the base material feed roll 43. A fixed position upstream reference roll 44, a forward / backward coating switching roll 45, a forward / backward tension adjusting roll 46, and a fixed position downstream reference roll (equalizing treatment roller) provided in order in the traveling direction S. ) 47, and arranged at a fixed position on the coating surface side Rc of the substrate traveling path R between the upstream reference roll 44 and the coating switching roll 45 so as to rotate in the same direction as the rotation direction U of the coating switching roll 45. The non-coating operation position A from the non-coating surface side Rd of the substrate travel path R toward the coating surface side Rc is applied to the coating roll 48 having a recess formed on the roll outer peripheral surface 48a. Coating operation to advance to coating operation position B and during this time The coating switching roll operating device 49 for alternately repeating the non-coating operation for retracting the switching roll 45 in the reverse direction, and the tension adjusting roll 46 from the coating surface side Rc of the base material traveling path R to the non-coating surface side. A tension adjusting roll that alternately repeats the coating operation for retreating from the non-coating operation position Y to the coating operation position Z toward Rd and the non-coating operation for retracting the tension adjusting roll 46 in the reverse direction during this period. Control the operation of a driving source 49a composed of an electric servo motor or the like of the operation device 50 for coating, an operation device 49 for a coating switching roll, and a driving source 50a composed of an electric servo motor or the like of the tension adjusting roll operation device 50 And a control device 51 that controls opening and closing of the on-off valve 18 of the supply device 8.

前記制御装置51は、塗工ロール48の外周面48aに基材走行路Rを走行する基材Wの塗工面側を接触せさて塗工域Cを形成する塗工操作(図中に実線で示す状態)と塗工ロール48の外周面48aから基材Wを離反させて非塗工域Dを形成する非塗工操作(図中に破線で示す状態)とを交互に繰り返すように、塗工切替ロール用操作装置49及び張力調整用ロール用操作装置50の各駆動源49a,50aへ起動・停止の信号を発信するものである。   The control device 51 applies a coating operation (indicated by a solid line in the drawing) to form a coating area C by bringing the coating surface side of the substrate W traveling on the substrate traveling path R into contact with the outer peripheral surface 48a of the coating roll 48. And a non-coating operation (state indicated by a broken line in the figure) in which the base material W is separated from the outer peripheral surface 48a of the coating roll 48 to form a non-coating area D. A start / stop signal is transmitted to each of the drive sources 49a and 50a of the work switching roll operating device 49 and the tension adjusting roll operating device 50.

前記制御装置51は、塗工域の始端縁及び終端縁について大きく湾曲させることなく直線状に近づけることができるようにするために、基材走行路Rに沿って上流側基準ロール44から下流側基準ロール47へ至る基材パスラインの寸法値について、塗工操作における塗工ロール48の外周面48aに対する基材走行路Rの塗工面側の接触を始めさせる時刻の前後に設定した設定時間、及び非塗工操作おける塗工ロール48の外周面48aから基材Wの塗工面側の離反を始めさせる時の前後に設定した設定時間の各時間内におけ寸法値が、これら設定時間以外における寸法値よりも増大するように、塗工切替ロール45の進退移動に追従して張力調整用ロール46の進退位置の制御を行なうようにしてある。間欠塗工装置42は、基材パスラインの寸法値の増大に伴い基材Wの張力を増大させて基材Wの左右幅方向の撓み量を小さくさせることで、塗工ロール48の外周面48aに対して基材Wの左右幅方向全域を同時に接触又は離反させることが可能となり、塗工域Cの始端出Ca及び終端部Cbの左右幅方向全域を直線状に近づけることができる。   The control device 51 is provided on the downstream side from the upstream reference roll 44 along the base material traveling path R so that the start edge and the end edge of the coating area can be approximated to a straight line without being greatly curved. For the dimension value of the substrate pass line to the reference roll 47, a set time set before and after the time to start contact of the coating surface side of the substrate traveling path R with the outer peripheral surface 48a of the coating roll 48 in the coating operation, And the dimension value within each set time set before and after starting the separation of the coating surface side of the base material W from the outer peripheral surface 48a of the coating roll 48 in the non-coating operation is outside these set times. The advance / retreat position of the tension adjusting roll 46 is controlled so as to follow the advance / retreat movement of the coating switching roll 45 so as to be larger than the dimension value. The intermittent coating device 42 increases the tension of the base material W with an increase in the dimension value of the base material pass line to reduce the amount of bending of the base material W in the left-right width direction. It is possible to simultaneously contact or separate the entire lateral width direction of the base material W with respect to 48a, and the lateral area in the lateral width direction of the start end Ca and the end portion Cb of the coating area C can be brought closer to a straight line.

前記制御装置51は、ガス供給装置8の開閉弁18に開弁信号を発しするタイミングを得る一例として、検知器14で盛り上がり部Qが検知される基材走行路Rの検知位置から均し処理位置となる所定箇所Raへ至る距離を、基材Wの走行速度V(下流側基準ロール47の外周面の回転速度)で除して得られる時間で、そのタイミングを得るようにしている。ガス噴出用スリット13から盛り上がり部QにガスGを吹き付ける設定時間は、盛り上がり部Qの大きさ及び塗工剤の粘度等に応じて決定される。   As an example of obtaining the timing for issuing the valve opening signal to the on-off valve 18 of the gas supply device 8, the control device 51 performs the leveling process from the detection position of the base material traveling path R where the rising portion Q is detected by the detector 14. The timing is obtained by the time obtained by dividing the distance to the predetermined location Ra as the position by the traveling speed V of the base material W (the rotational speed of the outer peripheral surface of the downstream reference roll 47). The set time for blowing the gas G from the gas ejection slit 13 to the raised portion Q is determined according to the size of the raised portion Q, the viscosity of the coating agent, and the like.

欠塗工設備41を用いた間欠方法は、走行する基材Wの表面に間欠塗工装置42で基材走行方向Sに沿って塗工域Cと非塗工域Dを交互に形成するときに、塗工域Cの塗工終端部Cbに盛り上がり部Qが生じる場合において、ガス噴出装置7のガス噴出用スリット13から噴出するガスを設定時間だけ盛り上がり部Qに吹き付けて均し、均し処理後の盛り上がり高さ寸法を小さくすることである。ガス噴出装置7のガス噴出用スリット13からガスを噴出させる方向としては、図3(A)に示すように基材Wの走行方向と逆方向の成分を含む場合と、図4(A)に示すように基材Wの走行方向と同方向の成分を含む場合と、図5(A)に示すように基材Wの垂直方向Eに沿う場合とがある。 Intermittent method using between Ketsunuri Engineering equipment 41, are alternately formed coating zone C and non-coated area D along the substrate travel direction S on an intermittent coating apparatus 42 on the surface of the substrate W to travel When the rising portion Q occurs in the coating end portion Cb of the coating area C, the gas jetted from the gas jetting slit 13 of the gas jetting device 7 is blown to the rising portion Q for a set time, and is leveled. It is to reduce the raised height dimension after the leveling process. As a direction in which the gas is ejected from the gas ejection slit 13 of the gas ejection device 7, as shown in FIG. As shown, there may be a case where a component in the same direction as the traveling direction of the substrate W is included, and a case where the component is along the vertical direction E of the substrate W as shown in FIG.

(第5の実施の形態)
図9は第5の実施の形態に係る間欠塗工設備61を示すものである。本実施の形態に係る間欠塗工設備61は、間欠塗工装置62をリバースグラビア塗工方式とした点が前記第1の実施の形態と大きく異なり、その他の部分については第1の実施の形態と実質的に同一であり、図9において図1乃至図5に記載の符号と同一の符号は相当部分を示す。
(Fifth embodiment)
Figure 9 shows a between Ketsunuri Engineering equipment 61 engages Ru to the fifth embodiment. Ketsunuri Engineering equipment 61 between Ru engaged to this embodiment differs greatly intermittent coating apparatus 62 is a point which has a reverse gravure coating method and the first embodiment, the first embodiment for the other parts 9. In FIG. 9, the same reference numerals as those shown in FIG. 1 to FIG.

前記間欠塗工装置62は、基材走行路Rの非塗工面側Rdをロール外周面63a上に形成して進退自在に配置される塗工切替ロール63と、基材走行路Rにおける塗工切替ロール63よりも下流側に配設した回転駆動される均し処理用ローラ64と、基材走行路Rの塗工面側Rcの定位置に、回転駆動される塗工切替ロール63の回転方向と同一方向へ回転するように回転駆動される状態で配置された塗工ロール65と、塗工切替ロール63を基材走行路Rの塗工面側Rcから非塗工面側Rdへ向かって、塗工切替ロール63の外周面上に形成される基材走行路Rの部分を塗工ロール65から離反させる非塗工操作位置F(図中に実線で示す位置)から該基材走行路Rの部分を塗工ロール65の外周面に転写塗工可能に接近させる塗工操作位置I(図中に破線で示す位置)まで前進させる塗工操作及びこの間で塗工切替ロール63を逆方向へ向かって後退させる非塗工操作を交互に繰り返す塗工切替ロール用操作装置66と、塗工切替ロール用操作装置65の操作及びガス供給装置8の開閉弁18の開閉を制御する制御装置69とを備えている。塗工ロール65は、ロール外周面65a上に凹部を刻設したグラビアロールからなる。   The intermittent coating device 62 includes a coating switching roll 63 formed on the outer peripheral surface 63a of the non-coating surface side Rd of the base material travel path R so as to be freely moved back and forth, and a coating on the base material travel path R. The rotational direction of the rotationally driven leveling roller 64 disposed downstream of the switching roll 63 and the rotational position of the coating switching roll 63 that is rotationally driven at a fixed position on the coating surface side Rc of the substrate traveling path R. The coating roll 65 and the coating switching roll 63 which are arranged so as to rotate in the same direction as the coating direction, are coated from the coating surface side Rc of the substrate traveling path R toward the non-coating surface side Rd. From the non-coating operation position F (a position indicated by a solid line in the figure) where the portion of the base material travel path R formed on the outer peripheral surface of the work switching roll 63 is separated from the coating roll 65, the base material travel path R Coating operation position to bring the part close to the outer peripheral surface of the coating roll 65 so that transfer coating is possible A coating switching roll operating device 66 that alternately repeats a coating operation to advance to I (position indicated by a broken line in the drawing) and a non-coating operation to retract the coating switching roll 63 in the reverse direction during this period; And a control device 69 that controls the operation of the operation device 65 for the coating switching roll and the opening and closing of the on-off valve 18 of the gas supply device 8. The coating roll 65 is composed of a gravure roll having a recess formed on the roll outer peripheral surface 65a.

前記制御装置69は、ガス供給装置8の開閉弁18に開弁信号を発しするタイミングを得る一例として、検知器14で盛り上がり部Qが検知される基材走行路Rの検知位置から均し処理位置となる所定箇所Raへ至る距離を、基材Wの走行速度V(均し処理用ローラ64の外周面の回転速度)で除して得られる時間で、そのタイミングを得るようにしている。ガス噴出用スリット13から盛り上がり部QにガスGを吹き付ける設定時間は、盛り上がり部Qの大きさ及び塗工剤の粘度等に応じて決定される。   As an example of obtaining timing for issuing a valve opening signal to the on-off valve 18 of the gas supply device 8, the control device 69 performs leveling processing from the detection position of the base material traveling path R where the swell portion Q is detected by the detector 14. The timing is obtained by the time obtained by dividing the distance to the predetermined location Ra as the position by the traveling speed V of the base material W (the rotational speed of the outer peripheral surface of the leveling roller 64). The set time for blowing the gas G from the gas ejection slit 13 to the raised portion Q is determined according to the size of the raised portion Q, the viscosity of the coating agent, and the like.

欠塗工設備61を用いた間欠方法は、走行する基材Wの表面に間欠塗工装置62で基材走行方向Sに沿って塗工域Cと非塗工域Dを交互に形成するときに、塗工域Cの塗工終端部Cbに盛り上がり部Qが生じる場合において、ガス噴出装置7のガス噴出用スリット13から噴出するガスを設定時間だけ盛り上がり部Qに吹き付けて均し、盛り上がり高さ寸法を小さくすることである。ガス噴出装置7のガス噴出用スリット13からガスを噴出させる方向としては、図3(A)に示すように基材Wの走行方向と逆方向の成分を含む場合と、図4(A)に示すように基材Wの走行方向と同方向の成分を含む場合と、図5(A)に示すように基材Wの垂直方向Eに沿う場合とがある。 Intermittent method using between Ketsunuri Engineering equipment 61, are alternately formed coating zone C and non-coated area D along the substrate travel direction S on an intermittent coating apparatus 62 on the surface of the substrate W to travel When the rising portion Q occurs in the coating end portion Cb of the coating area C, the gas jetted from the gas jetting slit 13 of the gas jetting device 7 is blown to the rising portion Q for a set time, and is leveled. It is to reduce the raised height dimension. As a direction in which the gas is ejected from the gas ejection slit 13 of the gas ejection device 7, as shown in FIG. As shown, there may be a case where a component in the same direction as the traveling direction of the substrate W is included, and a case where the component is along the vertical direction E of the substrate W as shown in FIG.

(その他の実施の形態)
第4の実施の形態(図8参照)に係る間欠塗工設備51及び第5の実施の形態(図9参照)に係る間欠塗工設備61は、各々に設けるガス供給装置8を、第3の実施の形態(図7参照)に係る間欠塗工設備31に設けたガス供給装置38に置換することも可能である。
(Other embodiments)
Fourth Embodiment Embodiment between the (see FIG. 8) engaged Ru Ketsunuri Engineering equipment 51 and the fifth between Ketsunuri Engineering equipment 61 engaging Ru (see FIG. 9), a gas supply device provided to each 8 and it is also possible to replace the third embodiment the gas supply apparatus 38 provided on Ketsunuri Engineering equipment 31 while engaging Ru (see Figure 7).

また、間欠塗工装置は、第1の実施の形態(図1乃至図5)、第2の実施の形態(図6参照)及び第3の実施の形態(図7参照)に係るダイ塗工方式、第4の実施の形態(図8参照)に係るリバースキス塗工方式及び第5の実施の形態(図9参照)に係るリバースグラビア塗工方式に限定するものではなく、図示は省略したが、グラビア塗工方式やリバースロール塗工方式等のように、塗工域Cの塗工始端部Ca又は塗工終端部Cbに盛り上がり部Qを生じるさせる塗工方式のものを採用することもある。   Further, the intermittent coating apparatus includes die coatings according to the first embodiment (FIGS. 1 to 5), the second embodiment (see FIG. 6), and the third embodiment (see FIG. 7). The method is not limited to the reverse kiss coating method according to the fourth embodiment (see FIG. 8) and the reverse gravure coating method according to the fifth embodiment (see FIG. 9), and the illustration is omitted. However, a gravure coating method, a reverse roll coating method, or the like that employs a coating method that generates a raised portion Q at the coating start end Ca or the coating end portion Cb of the coating area C may be employed. is there.

1(21,31,41,61)…間欠塗工設備、2…間欠塗工装置、3…バッキングロール、3a…外周面、4…ダイ塗工ベッド、4a…吐出口、5…塗工剤供給装置、5a…制御弁、6…均し装置、7…ガス噴出装置、8(38)…ガス供給装置、10…保持具、10a…ガス通路、11…リップ片、12…リップ片、13…ガス噴出用スリット、14…検知器、15…ガス源、16…ガス供給路、17…圧力調節弁、18…開閉弁、19…制御器、20…電動モータ、22…均し処理用ロール、32…ポンプ、33…駆動装置、33a…可変速モータ、33b…伝導機構、34…逆止弁、35…逆止弁、36…シリンダー、36a…内部、37…ピストン、39…ガス押出し装置、42…間欠塗工装置、43…基材送りロール、44…上流側基準ロール、45…塗工切替ロール、46…張力調整用ロール、47…下流側基準ロール、48…塗工ロール、48a…ロール外周面、49…塗工切替ロール用操作装置、49a…駆動源、50…張力調整用ロール用操作装置、50a…駆動源、51…制御装置、62…間欠塗工装置、63…塗工切替ロール、63a…ロール外周面、64…均し処理用ローラ、65…塗工ロール、65a…外周面、66…塗工切替ロール用操作装置、69…制御装置、A…非塗工操作位置、B…塗工操作位置、C…塗工域、Ca…塗工始端部、Cb…塗工終端部、D…非塗工域、E…ロール半径方向(基材Wの垂直方向)、F…非塗工操作位置、G…ガス、H…距離、I…塗工操作位置、J…中心線、K…接線、L…距離、M…矢符、N…矢符(後退方向を示す)、P…矢符(前進方向を示す)、Q…盛り上がり部、R…基材走行路、Ra…所定箇所(盛り上がり部Qの均し処理位置となる箇所)、Rb…塗工開始位置、Rc…塗工面側、Rd…非塗工面側、S…基材走行方向、T…厚み寸法、U…回転方向、V…基材の走行速度、W…基材、Y…非塗工操作位置、Z…塗工操作位置、θ…吹付け角度 1 (21,31,41,61) ... between Ketsunuri Engineering facilities, 2 ... intermittent coating apparatus, 3 ... backing roll, 3a ... outer peripheral surface, 4 ... die coating bed, 4a ... discharge port, 5 ... coating Agent supply device, 5a ... control valve, 6 ... leveling device, 7 ... gas ejection device, 8 (38) ... gas supply device, 10 ... holder, 10a ... gas passage, 11 ... lip piece, 12 ... lip piece, DESCRIPTION OF SYMBOLS 13 ... Gas ejection slit, 14 ... Detector, 15 ... Gas source, 16 ... Gas supply path, 17 ... Pressure control valve, 18 ... On-off valve, 19 ... Controller, 20 ... Electric motor, 22 ... For leveling process Roll, 32 ... Pump, 33 ... Drive device, 33a ... Variable speed motor, 33b ... Transmission mechanism, 34 ... Check valve, 35 ... Check valve, 36 ... Cylinder, 36a ... Inside, 37 ... Piston, 39 ... Gas extrusion Equipment 42 ... Intermittent coating equipment 43 ... Base material feed roll 44 ... Top Flow side reference roll, 45 ... coating switching roll, 46 ... tension adjusting roll, 47 ... downstream reference roll, 48 ... coating roll, 48a ... roll outer peripheral surface, 49 ... coating switching roll operating device, 49a ... Driving source 50 ... Tension adjusting roll operating device 50a ... Drive source 51 ... Control device 62 ... Intermittent coating device 63 ... Coating switching roll 63a ... Roll outer peripheral surface 64 ... Rolling roller , 65 ... coating roll, 65a ... outer peripheral surface, 66 ... operating device for coating switching roll, 69 ... control device, A ... non-coating operation position, B ... coating operation position, C ... coating area, Ca ... Coating start end, Cb ... coating end, D ... non-coating area, E ... roll radius direction (perpendicular to substrate W), F ... non-coating operation position, G ... gas, H ... distance, I ... Coating operation position, J ... Center line, K ... Tangent, L ... Distance, M ... Arrow, N ... Arrow (Reverse) ), P ... arrows (indicating the forward direction), Q ... swelling portion, R ... base material traveling path, Ra ... predetermined location (location that becomes the leveling processing position of the swelling portion Q), Rb ... start of coating Position, Rc: coated surface side, Rd: non-coated surface side, S: substrate running direction, T: thickness dimension, U: rotational direction, V: substrate running speed, W: substrate, Y: non-coated Operation position, Z: Coating operation position, θ: Spray angle

Claims (1)

基材走行路の途中に設けられた間欠塗工装置で、基材走行路を走行する基材の表面に基材走行方向に沿って塗工域と非塗工域を交互に形成するときに、塗工域の塗工始端部又は塗工終端部に盛り上がり部が生じる間欠塗工設備において、
盛り上がり部が通過する基材走行路の所定箇所に向かってガスを噴出させるガス噴出用スリットを備えたガス噴出装置と、ガス噴出用スリットから噴出させるガスをガス噴出装置へ設定時間だけ供給するガス供給装置を備え
前記ガス供給装置は、前記ガス噴出装置に逆止弁を介して通じると共にガス源に逆止弁を介して通じるシリンダー及びシリンダーに内嵌して進退するピストンからなり、前記ピストンの後退で前記ガス源から前記シリンダー内部にガスを取り込むと共に前記ピストンの前進で前記シリンダー内部のガスを前記ガス噴出装置へ供給するポンプと、前記ピストンを進退させる可変速式モータとを備えたことを特徴とする間欠塗工設備。
When intermittently forming a coating area and a non-coating area along the substrate traveling direction on the surface of the substrate traveling on the substrate traveling path with an intermittent coating device provided in the middle of the substrate traveling path In the intermittent coating equipment in which a swelled portion occurs at the coating start end or coating end of the coating area,
A gas jetting device having a gas jetting slit for jetting gas toward a predetermined portion of the substrate traveling path through which the swell portion passes, and a gas for supplying the gas jetted from the gas jetting slit to the gas jetting device for a set time A supply device ,
The gas supply device includes a cylinder that communicates with the gas ejection device through a check valve and a gas source that communicates with the gas source through the check valve, and a piston that is fitted in the cylinder, and moves forward and backward. An intermittent system comprising: a pump for taking gas into the cylinder from a source and supplying the gas inside the cylinder to the gas ejection device as the piston moves forward; and a variable speed motor for moving the piston forward and backward. Coating equipment.
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