TW201443290A - Electrolytic copper foil, battery current collector comprising said electrolytic copper foil, electrode obtained using said current collector for secondary battery, and secondary battery obtained using said electrode - Google Patents

Electrolytic copper foil, battery current collector comprising said electrolytic copper foil, electrode obtained using said current collector for secondary battery, and secondary battery obtained using said electrode Download PDF

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TW201443290A
TW201443290A TW103103448A TW103103448A TW201443290A TW 201443290 A TW201443290 A TW 201443290A TW 103103448 A TW103103448 A TW 103103448A TW 103103448 A TW103103448 A TW 103103448A TW 201443290 A TW201443290 A TW 201443290A
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copper foil
electrolytic copper
tungsten
foil
current collector
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TW103103448A
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TWI602953B (en
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Masato Ebisugi
Akitoshi Suzuki
Kensaku Shinozaki
Kimiko Fujisawa
Takeshi Ezura
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Furukawa Electric Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00Electroforming
    • C25D1/04Wires; Strips; Foils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/64Carriers or collectors
    • H01M4/66Selection of materials
    • H01M4/661Metal or alloys, e.g. alloy coatings
    • H01M4/662Alloys
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Cell Electrode Carriers And Collectors (AREA)

Abstract

An electrolytic copper foil is provided in which the tensile strength measured at ordinary temperature after a 300 C1 hour heat treatment is 500 MPa or higher. Also provided is an electrolytic copper foil which, when laminated to a polyimide film, gives a printed wiring board having excellent mechanical strength. Furthermore provided is a copper alloy foil which, when used as a current collector (copper foil) in a lithium-ion secondary battery employing an active material based on an Si or Sn alloy, retains adhesion to the active material with the aid of a polyimide binder and suffers neither deformation nor breakage. The electrolytic copper foils contain tungsten in an amount of 0.06-0.5 wt%, with the remainder comprising copper. The electrolytic copper foils have a tensile strength measured at ordinary temperature after a 300 C1 hour heat treatment of 500 MPa or higher. A secondary battery is further provided in which either of the electrolytic copper foils is used as a current collector.

Description

電解銅箔、使用該電解銅箔之電池用集電體、使用該集電體之二次電池用電極以及使用該電極之二次電池 Electrolytic copper foil, battery current collector using the electrolytic copper foil, secondary battery electrode using the current collector, and secondary battery using the same

本發明有關一種電解銅箔,其電解析出面具有低粗糙度,並且機械強度大,即使於高溫下加熱,機械強度亦難以變化。 The present invention relates to an electrolytic copper foil having an electrical resolution surface having a low roughness and a high mechanical strength, and it is difficult to change the mechanical strength even when heated at a high temperature.

本發明有關使用上述電解銅箔作為二次電池用集電體,於該集電體上堆疊活性物質後作為二次電池用電極,並組裝有該電極之二次電池。 The present invention relates to a secondary battery in which the electrodeposited copper foil is used as a current collector for a secondary battery, and an active material is stacked on the current collector to be an electrode for a secondary battery, and the electrode is assembled.

本發明之電解銅箔可適用於使用該電解銅箔作為導電材料之剛性印刷線路板、可撓性印刷線路板、以及電磁遮罩材料等。 The electrolytic copper foil of the present invention can be suitably used for a rigid printed wiring board, a flexible printed wiring board, an electromagnetic shielding material, or the like using the electrolytic copper foil as a conductive material.

另外,本說明書中,無需區別表示電解銅箔、電解銅合金箔(箔中含有銅及第三金屬之合金之箔,箔中以固溶狀態含有第三金屬之箔)時,表示為「電解銅箔」,此外,機械強度係指拉伸強度。 In addition, in the present specification, when it is not necessary to distinguish between an electrolytic copper foil and an electrolytic copper alloy foil (a foil containing an alloy of copper and a third metal in a foil, and a foil containing a third metal in a solid solution state in the foil), it is expressed as "electrolysis". Copper foil, in addition, mechanical strength refers to tensile strength.

銅箔已被用於剛性印刷線路板、可撓性印刷線路板、電磁遮罩材料、以及電池之集電體等各種領域。 Copper foil has been used in various fields such as rigid printed wiring boards, flexible printed wiring boards, electromagnetic shielding materials, and battery collectors.

於該等領域中貼合聚醯亞胺薄膜之印刷線路板(可撓性線路板,以下稱「FPC」)之領域,硬碟(以下稱「HDD」) 懸架材料、或者卷帶自動結合(以下稱「TAB」)材料要求提高銅箔之強度。 A hard disk (hereinafter referred to as "HDD") in the field of printed circuit boards (flexible circuit boards, hereinafter referred to as "FPC") coated with polyimide film in these fields. Suspension materials, or automatic tape-bonding (hereinafter referred to as "TAB") materials require an increase in the strength of the copper foil.

搭載於HDD上之懸架隨著HDD之高容量化的發展,大部分已從以往使用之鋼絲型懸架轉換為可相對於記憶媒體即碟片確保穩定之浮動磁頭之浮力及位置精度的配線一體型懸架。 Suspension mounted on the HDD With the development of the high capacity of the HDD, most of the wire-type suspensions that have been used in the past have been converted into a wiring-integrated type that can ensure the buoyancy and positional accuracy of a stable floating head with respect to a memory medium, that is, a disk. Suspension.

該配線一體型懸架中分為以下三種類型。 The wiring-integrated suspension is classified into the following three types.

a. FSA(flex suspension assembly,柔性懸臂組合)法懸架,其係對柔性印刷基板進行加工,並利用黏合劑使之貼合者;b. CIS(circuit integrated suspension,線路一體懸臂)法懸架,其係對聚醯亞胺樹脂之前驅體即醯胺酸實施形狀加工後,使其醯亞胺化,並再於所獲得之聚醯亞胺上實施電鍍加工,從而形成配線者;c. TSA(trace suspension assembly,線路懸臂組合)法懸架,其係藉由蝕刻加工將由不銹箔-聚醯亞胺樹脂-銅箔構成之疊層體加工成規定形狀者。 a FSA (flex suspension assembly) suspension, which is used to process a flexible printed circuit board and adhere it with an adhesive; b. CIS (circuit integrated suspension) suspension, After the shape processing of the precursor of the polyimine resin, ie, proline, the oxime is imidized, and then electroplating is performed on the obtained polyimine to form a router; c. TSA ( A trace suspension assembly is a suspension in which a laminate composed of a stainless foil-polyimine resin-copper foil is processed into a predetermined shape by etching.

由於TSA法懸架將具有高強度之銅合金箔進行疊層,所以能夠容易地形成飛線,形狀加工之自由度高,較為廉價並且尺寸精度高,因此正在被廣泛使用。 Since the TSA suspension is used to laminate a copper alloy foil having high strength, the flying wire can be easily formed, and the shape processing has a high degree of freedom, is inexpensive, and has high dimensional accuracy, and is therefore widely used.

藉由TSA法形成之疊層體係使用不銹箔之厚度為12~30μm左右、聚醯亞胺樹脂層之厚度為5~20μm左右、銅箔之厚度為7~14μm左右之材料而製成者。 The laminated system formed by the TSA method is made of a material having a thickness of about 12 to 30 μm, a thickness of a polyimide resin layer of about 5 to 20 μm, and a thickness of a copper foil of about 7 to 14 μm. .

製造疊層體時,首先於作為基體之不銹箔上塗佈聚醯亞胺樹脂液。塗佈後,藉由預備加熱去除溶劑,然後再實 施加熱處理,形成醯亞胺。繼而,於醯亞胺化之聚醯亞胺樹脂層上重疊銅合金箔,於300℃左右之溫度下實施加熱壓接並層壓製成由不銹層-聚醯亞胺層-銅合金層構成之疊層體。 In the production of a laminate, a polyimide resin solution is first applied onto a stainless foil as a substrate. After coating, remove the solvent by preheating, and then re-solidify A heat treatment is applied to form a quinone imine. Then, a copper alloy foil is superposed on the polyimide layer of the yttrium imidized, and is subjected to heat-bonding at a temperature of about 300 ° C and laminated to form a layer composed of a stainless layer-polyimine layer-copper alloy layer. The laminate.

於該300℃左右下加熱時,不銹箔幾乎未發生尺寸變化。然而,使用以往之電解銅箔時,電解銅箔會於300℃左右之溫度下退火,進行再結晶並軟化,導致發生尺寸變化。因此,層壓後疊層體會產生翹起,產品之尺寸精度會降低。 When heated at about 300 ° C, the stainless foil hardly changes in size. However, when the conventional electrolytic copper foil is used, the electrolytic copper foil is annealed at a temperature of about 300 ° C, recrystallized and softened, resulting in dimensional change. Therefore, the laminated body is warped after lamination, and the dimensional accuracy of the product is lowered.

為了層壓後不使疊層體產生翹起,要求提供一種加熱時之尺寸變化儘量小之銅合金箔。 In order to prevent the laminate from being lifted after lamination, it is required to provide a copper alloy foil having a dimensional change as small as possible during heating.

此外,TAB材料與HDD懸架材料同樣,要求銅箔具有高強度並且箔表面之粗糙度低。 In addition, the TAB material, like the HDD suspension material, requires high strength of the copper foil and low roughness of the foil surface.

TAB產品中,將IC晶片之多個端子直接與在位於產品之幾乎中央部之裝置孔處所配置的內引線(飛線)相結合。此結合使用結合裝置,通過瞬間通電加熱,施加固定之結合壓力而進行。此時,將電解銅箔進行蝕刻形成後獲得之內部引線會存有由於結合壓力而被拉伸,導致伸長之問題。 In the TAB product, a plurality of terminals of the IC chip are directly combined with inner leads (flying wires) disposed at the device holes located at almost the center of the product. This combination is carried out by using a bonding device by applying a fixed bonding pressure by instantaneous energization heating. At this time, the inner lead obtained by etching the electrolytic copper foil may have a problem that it is stretched due to the bonding pressure, resulting in elongation.

並且,若電解銅箔之強度過低,則會因塑性變形出現以下問題,即內部引線發生鬆弛,嚴重時甚至斷裂。 Further, if the strength of the electrolytic copper foil is too low, there is a problem in that the internal lead is slack due to plastic deformation, and even if it is severe, it is broken.

因此,為了將內部引線之線寬變細,業界要求使用之電解銅箔具有實施過低粗化處理之粗面,並且具有高強度。 Therefore, in order to make the line width of the inner lead thinner, the electrolytic copper foil required for use in the industry has a rough surface which is subjected to a low roughening treatment and has high strength.

此時,銅箔必須於常態(常溫、常壓狀態)下具有高強度,並且加熱後仍具有高強度。用於TAB用途時,會使用銅箔與聚醯亞胺貼合之2層或3層FPC。3層FPC時,於 將聚醯亞胺貼合至銅箔上時,會使用環氧類黏合劑,於180℃左右之溫度下實施貼合。此外,使用有聚醯亞胺類黏合劑之2層FPC時,會於300℃左右之溫度下實施貼合。 At this time, the copper foil must have high strength in a normal state (normal temperature, normal pressure state), and still have high strength after heating. For TAB use, a 2- or 3-layer FPC in which copper foil is bonded to polyimine is used. 3 layer FPC, when When the polyimide is bonded to a copper foil, an epoxy-based adhesive is used, and the bonding is carried out at a temperature of about 180 °C. Further, when a two-layer FPC having a polyimide-based adhesive is used, the bonding is carried out at a temperature of about 300 °C.

即使電解銅箔於常態下之機械強度大,但若於接合到聚醯亞胺上時銅箔會發生軟化,則並無意義。以往之高強度之電解銅箔於常態下之機械強度大,即使於180℃左右進行加熱,機械強度亦幾乎不變化,但於300℃左右下進行加熱時,則會發生退火並進行再結晶,因此會迅速軟化,機械強度會降低。此種銅箔不適用於TAB用途。 Even if the electrolytic copper foil is mechanically strong in a normal state, it is meaningless if the copper foil softens when it is bonded to the polyimide. In the past, the high-strength electrolytic copper foil has a large mechanical strength under normal conditions, and the mechanical strength hardly changes even when heated at about 180 ° C. However, when heated at about 300 ° C, annealing occurs and recrystallization is performed. Therefore, it will soften rapidly and the mechanical strength will decrease. This copper foil is not suitable for TAB use.

此外,銅箔還被用作鋰離子二次電池等之電池用集電體。鋰離子二次電池基本上由正極、負極、以及電解液構成。通過於用作集電體之銅箔之表面塗覆負極活性物質層,形成負極。 Further, the copper foil is also used as a current collector for a battery such as a lithium ion secondary battery. A lithium ion secondary battery basically consists of a positive electrode, a negative electrode, and an electrolyte. A negative electrode is formed by coating a surface of a copper foil used as a current collector with a negative electrode active material layer.

作為負極之形成方法,一般採用將負極活性物質與黏合劑樹脂(為使活性物質與銅箔基板黏合而添加)溶於溶劑中之漿料塗佈於銅箔基板上,使其在黏合劑樹脂之硬化溫度以上之溫度下乾燥後,通過壓制而形成之方法。 As a method of forming the negative electrode, a slurry in which a negative electrode active material and a binder resin (added to bond the active material to the copper foil substrate) is dissolved in a solvent is applied to the copper foil substrate to form a binder resin. A method of forming by pressing after drying at a temperature higher than the hardening temperature.

作為黏合劑樹脂,業界廣泛使用聚偏氟乙烯(PVDF)及丁苯橡膠(SBR)等。 As a binder resin, polyvinylidene fluoride (PVDF) and styrene-butadiene rubber (SBR) are widely used in the industry.

近年來,隨著電池之高容量化,由理論容量高之矽、錫、鍺合金類材料等構成之活性物質受到關注,由於隨著充放電時之鋰之插入脫附,其體積膨脹率非常大,上述黏合劑樹脂之強度存在不足。於是,業界優選使用與銅基板之黏合強度高之聚醯亞胺類樹脂。然而,聚醯亞胺類樹脂與上述黏合劑 樹脂不同,其硬化溫度非常高,達到300℃左右,因此要求負極集電體(銅箔)能夠承受該加熱條件。 In recent years, with the increase in capacity of batteries, active materials composed of ruthenium, tin, and ruthenium alloy materials having a high theoretical capacity have attracted attention, and their volume expansion ratio is very high due to insertion and desorption of lithium during charge and discharge. Large, the strength of the above binder resin is insufficient. Therefore, it is preferable in the industry to use a polyimide resin having a high bonding strength with a copper substrate. However, the polyimide resin and the above adhesive Unlike the resin, the hardening temperature is very high and reaches about 300 ° C. Therefore, it is required that the negative electrode current collector (copper foil) can withstand the heating condition.

如此,FPC領域、二次電池領域皆使用硬化溫度非常高,達到300℃左右之聚醯亞胺類樹脂作為黏合劑,因此要求銅箔能夠承受該加熱條件。 As described above, in the FPC field and the secondary battery field, a polyimide resin having a very high curing temperature and a temperature of about 300 ° C is used as a binder, and therefore it is required that the copper foil can withstand the heating condition.

使用含有硫酸銅與硫酸之電解液作為電解銅箔之電解液,並為了銅箔表面之光澤化及平滑化、銅箔之應力減少等,於電鍍浴中添加有各種添加劑。不使用添加劑時,無法獲得銅箔所要求之表面形態及機械特性等,因此添加劑之重要性非常高。特別是硫酸銅電鍍浴為單純酸性浴,因此均勻電鍍性差,無添加劑時難以製造所期望之電解銅箔。作為用於硫酸銅電鍍浴中之添加劑,氯離子、聚氧乙烯類介面活性劑、平滑劑、有機硫化物等之光澤劑、膠、明膠等被提出並使用。 An electrolytic solution containing copper sulfate and sulfuric acid is used as an electrolytic solution of the electrolytic copper foil, and various additives are added to the plating bath for the glossing and smoothing of the surface of the copper foil, and the stress reduction of the copper foil. When the additive is not used, the surface morphology and mechanical properties required for the copper foil cannot be obtained, and therefore the importance of the additive is very high. In particular, the copper sulfate plating bath is a simple acid bath, so that the uniform plating property is poor, and it is difficult to produce a desired electrolytic copper foil without an additive. As an additive used in a copper sulfate plating bath, a brightener such as a chloride ion, a polyoxyethylene type surfactant, a smoothing agent, an organic sulfide, a gel, gelatin or the like is proposed and used.

若硫酸銅電鍍浴中未添加氯或添加劑,則電鍍會集中於容易流動電氣之高電流部分(接近陽極之部位、陰極端、尖銳物之前端等),成為一般所說之「燒焦狀態(電鍍面更為凸凹)」。為此,通常之電鍍硫酸銅時要添加氯離子。 If chlorine or an additive is not added to the copper sulfate plating bath, the electroplating will concentrate on the high current portion (close to the anode, the cathode end, the front end of the sharp object, etc.) of the easy-flowing electrical, and become a so-called "burnt state" ( The plating surface is more convex and concave)". For this reason, it is common to add chloride ions when electroplating copper sulfate.

然而,若一般電解液中存有氯離子,則難以使銅箔中混入特定金屬,改變銅箔之特性。即,雖然不存在氯離子之電解液中,能夠使其他金屬混入銅箔中,混入其他金屬(合金化)後能夠改變銅箔之特性,但電解液中加入氯離子後,其他金屬難以混入銅箔中,極難通過其他金屬改變銅箔之特性。 However, if chlorine ions are generally present in the electrolytic solution, it is difficult to mix a specific metal into the copper foil to change the characteristics of the copper foil. In other words, in the electrolyte solution in which chloride ions are not present, other metals can be mixed in the copper foil, and the characteristics of the copper foil can be changed by mixing other metals (alloying). However, when chlorine ions are added to the electrolyte solution, it is difficult for other metals to be mixed into the copper. In foil, it is extremely difficult to change the characteristics of copper foil by other metals.

另外,例如專利文獻1及2揭示了利用於硫酸-硫酸銅電解液中添加鎢,並再添加膠及氯離子之電解液製造電解 銅箔之方法,文獻稱,其效果可製成180℃時之熱延伸率為3%以上,粗面之粗糙度大,並且針孔產生少之銅箔。 Further, for example, Patent Documents 1 and 2 disclose that electrolytic solution is used for adding tungsten to a sulfuric acid-copper sulfate electrolyte solution, and further adding a gel and a chloride ion. The method of copper foil, the literature says, the effect is that the thermal elongation at 180 ° C is 3% or more, the roughness of the rough surface is large, and the copper foil having less pinholes is produced.

於是,本發明者們反復實施於硫酸-硫酸銅電解液中加入鎢,再加入膠及氯離子之實驗,製成了專利文獻1中記載之以電解銅箔為目的物之180℃時的加熱延伸率為3%以上,粗面粗糙度大,針孔發生少的銅箔。 Then, the inventors of the present invention repeatedly performed the experiment of adding tungsten to a sulfuric acid-copper sulfate electrolyte solution and adding a gel and a chloride ion to prepare a heating at 180 ° C for the purpose of the electrolytic copper foil described in Patent Document 1. A copper foil having an elongation of 3% or more, a rough surface roughness, and a small occurrence of pinholes.

然而,對該銅箔實施300℃×1小時熱處理後,發現無法保持機械強度。於是,對該銅箔實施分析後,其結果為電析銅中未共析出鎢。 However, after the copper foil was subjected to heat treatment at 300 ° C for 1 hour, it was found that mechanical strength could not be maintained. Then, after analyzing the copper foil, the result was that tungsten was not co-deposited in the electrodeposited copper.

即,根據專利文獻1、2之方法,利用於硫酸-硫酸銅電解液中加入鎢,再添加10mg/L以下之膠及20~100mg/L之氯離子之電解液實施電析,因此銅箔中未共析出鎢,結果無法製成即使於300℃下加熱亦可保持高機械強度之電解銅箔。 That is, according to the methods of Patent Documents 1 and 2, electrolysis is carried out by adding tungsten to a sulfuric acid-copper sulfate electrolyte solution, and further adding an electrolyte of 10 mg/L or less and a chloride ion of 20 to 100 mg/L, thereby performing copper plating. Tungsten was not precipitated in the middle, and as a result, it was impossible to produce an electrolytic copper foil which maintained high mechanical strength even when heated at 300 °C.

如上所述,電解銅箔通過於含有硫酸銅及硫酸之電解液中作為添加劑添加氯及有機化合物而製成。 As described above, the electrolytic copper foil is produced by adding chlorine and an organic compound as an additive to an electrolytic solution containing copper sulfate and sulfuric acid.

有機添加劑通常大多具有抑制結晶成長之效果,因此一般認為被攝入晶粒介面。 Organic additives generally have an effect of suppressing crystal growth, and are therefore generally considered to be ingested into a grain interface.

此時,攝入晶粒介面之有機添加劑之量越多,則越會出現機械強度提高之趨勢(非專利文獻1:志賀章二,金屬表面技術,Vol31,No10,p573(1980))。 At this time, the more the amount of the organic additive that ingests the grain interface, the more the mechanical strength tends to increase (Non-Patent Document 1: Shiga Chapter 2, Metal Surface Technology, Vol. 31, No. 10, p. 573 (1980)).

如非專利文獻1中所述,攝入電解銅箔之有機添加劑可提高銅箔之機械強度。可考察到其因素在於,有機添加劑主要被攝入晶粒介面,並於常溫下提高機械強度。然而,於300℃以上之高溫下加熱攝入該有機添加劑之電解銅箔時,機 械強度會降低。一般推測其原因是,有機添加劑會加熱分解,最終導致機械強度降低。 As described in Non-Patent Document 1, the organic additive that ingests the electrolytic copper foil can improve the mechanical strength of the copper foil. It can be considered that the organic additive is mainly taken into the grain interface and the mechanical strength is increased at normal temperature. However, when the electrolytic copper foil of the organic additive is heated at a high temperature of 300 ° C or higher, the machine The mechanical strength will decrease. It is generally assumed that the organic additive will decompose by heating, eventually resulting in a decrease in mechanical strength.

另一方面,作為滿足上述要求之銅箔,業界使用軋製銅合金箔。軋製銅合金箔於300℃左右之溫度下難以發生退火,加熱時之尺寸變化小,機械強度變化亦少。 On the other hand, as a copper foil which satisfies the above requirements, a rolled copper alloy foil is used in the industry. The rolled copper alloy foil is less likely to be annealed at a temperature of about 300 ° C, and the dimensional change during heating is small, and the mechanical strength change is small.

但是軋製銅箔之價格高於電解銅箔,並且難以滿足寬度、厚度等要求。 However, the price of rolled copper foil is higher than that of electrolytic copper foil, and it is difficult to meet the requirements of width, thickness, and the like.

於是,本發明者們作為與聚醯亞胺樹脂基材貼合之面具有低粗糙度並且機械強度優異之電解銅箔、以及適用於以聚醯亞胺類樹脂為黏合劑樹脂之用途之電解銅箔,嘗試於銅箔中添加各種金屬,改善其耐熱性。 Then, the inventors of the present invention have an electrolytic copper foil having a low roughness and excellent mechanical strength as a surface to be bonded to a polyimide resin substrate, and an electrolytic solution suitable for use as a binder resin for a polyimide resin. Copper foil, try to add various metals to the copper foil to improve its heat resistance.

然而,極難將可改善銅箔之耐熱性之金屬攝入電解銅箔中。即,改善銅箔耐熱性之金屬係極難攝入銅箔中之金屬。 However, it is extremely difficult to ingest a metal which can improve the heat resistance of the copper foil into the electrolytic copper foil. That is, a metal which improves the heat resistance of a copper foil is extremely difficult to ingest a metal in a copper foil.

【現有技術文獻】 [Prior Art Literature]

【專利文獻】 [Patent Literature]

【專利文獻1】日本專利第3238278號 [Patent Document 1] Japanese Patent No. 3238278

【專利文獻2】日本專利特開平9-67693號公報 [Patent Document 2] Japanese Patent Laid-Open No. Hei 9-67693

【特許文獻3】國際公開第2013/018773號 [Private Document 3] International Publication No. 2013/018773

【非專利文獻】 [Non-patent literature]

【非專利文獻1】志賀章二,金屬表面技術,Vol31,No10,p573(1980) [Non-Patent Document 1] Shiga Chapter 2, Metal Surface Technology, Vol31, No. 10, p573 (1980)

本發明者們深入研究後,最終克服上述課題,成功開發出一種含有鎢(W)並且300℃×1小時熱處理後常溫下測定之拉伸強度為450MPa以上之電解銅箔(參照專利文獻3),進而繼續反復研究,最終成功開發出一種鎢含量為0.06wt%~0.5wt%、氯(Cl)含量為0.001wt%~0.07wt%,並且300℃×1小時熱處理後常溫下測定之拉伸強度為500MPa以上之電解銅箔。 After intensive research, the present inventors have succeeded in developing an electrolytic copper foil having tungsten (W) and having a tensile strength of 450 MPa or more measured at room temperature after heat treatment at 300 ° C for 1 hour (refer to Patent Document 3). And continue to study repeatedly, and finally successfully developed a tungsten content of 0.06wt% ~ 0.5wt%, chlorine (Cl) content of 0.001wt% ~ 0.07wt%, and 300 ° C × 1 hour heat treatment after the tensile test Electrolytic copper foil having a strength of 500 MPa or more.

此外,本發明者們成功開發出一種電解銅箔,其例如作為HDD懸架材料、TAB材料,或作為於Si或Sn合金類活性物質等重複大幅膨脹和收縮之活性物質中可使用聚醯亞胺黏合劑之集電體(銅箔)不會變形。 Further, the present inventors have succeeded in developing an electrolytic copper foil which can be used, for example, as an HDD suspension material, a TAB material, or as an active material which repeatedly expands and contracts greatly in an active material such as Si or a Sn alloy. The current collector (copper foil) of the adhesive does not deform.

本發明之目的在於提供一種電解銅箔,其300℃×1小時熱處理後常溫下測定之拉伸強度為500MPa以上。 An object of the present invention is to provide an electrolytic copper foil which has a tensile strength measured at room temperature after heat treatment at 300 ° C for 1 hour of 500 MPa or more.

此外,本發明之目的在於提供一種貼合聚醯亞胺薄膜之印刷線路板領域之用途中機械強度優異的電解銅箔。 Further, an object of the present invention is to provide an electrolytic copper foil excellent in mechanical strength in the field of a printed wiring board to which a polyimide film is bonded.

進而,本發明之目的在於提供一種銅箔,其於使用Si或Sn合金類活性物質之鋰離子二次電池中,對於Si或Sn合金類活性物質之大幅膨脹和收縮,藉由聚醯亞胺黏合劑保持集電體(銅箔)與活性物質之密貼性,集電體(銅箔)不會變形或斷裂。 Further, an object of the present invention is to provide a copper foil which is used for a large expansion and contraction of an active material of Si or a Sn alloy in a lithium ion secondary battery using an active material of Si or a Sn alloy, by polyimine The adhesive maintains the adhesion of the current collector (copper foil) to the active material, and the current collector (copper foil) does not deform or break.

本發明之電解銅箔中鎢含量為0.06wt%以上。 The electrolytic copper foil of the present invention has a tungsten content of 0.06 wt% or more.

更優選本發明之電解銅箔中鎢含量為0.06wt%~0.5wt%。 More preferably, the electrolytic copper foil of the present invention has a tungsten content of from 0.06 wt% to 0.5 wt%.

本發明之電解銅箔中,鎢含量為0.06wt%~0.5wt%,氯含量為0.001wt%~0.07wt%。 In the electrolytic copper foil of the present invention, the tungsten content is from 0.06 wt% to 0.5 wt%, and the chlorine content is from 0.001 wt% to 0.07 wt%.

優選將上述鎢之全部或部份作為氧化物攝入。 Preferably, all or part of the above tungsten is taken up as an oxide.

此外,根據本發明,提供一種電解銅箔,其含有鎢,剩餘部份實質上由銅構成。另外,上述「剩餘部份實質上由銅構成」,係指允許銅中含有來自原料等之不可避免之雜質或者電解製箔製程等之微量添加物之意。 Further, according to the present invention, there is provided an electrolytic copper foil containing tungsten, the remainder being substantially composed of copper. In addition, the above-mentioned "the remaining portion is substantially composed of copper" means that the copper is contained in an inevitable impurity such as a raw material or a trace amount of an additive such as an electrolytic foil-forming process.

本發明之電解銅箔中,鎢含量為0.06wt%~0.5wt%,300℃×1小時熱處理後常溫下測定之拉伸強度為500MPa以上。 In the electrolytic copper foil of the present invention, the tungsten content is 0.06 wt% to 0.5 wt%, and the tensile strength measured at room temperature after heat treatment at 300 ° C for 1 hour is 500 MPa or more.

此外,本發明之電解銅箔之鎢含量為0.06wt%~0.5wt%,氯含量為0.001wt%~0.07wt%,300℃×1小時熱處理後常溫下測定之拉伸強度為500MPa以上。 Further, the electrolytic copper foil of the present invention has a tungsten content of 0.06 wt% to 0.5 wt%, a chlorine content of 0.001 wt% to 0.07 wt%, and a tensile strength of 500 MPa or more measured at room temperature after heat treatment at 300 ° C for 1 hour.

本發明之二次電池用集電體之特徵在於:使用上述任一項所述之電解銅箔。 The current collector for a secondary battery of the present invention is characterized by using the electrolytic copper foil according to any one of the above.

此外,本發明之二次電池用電極之特徵在於:使用上述任一項所述之電解銅箔作為二次電池用集電體,並於其表面堆疊活性物質。 Further, the electrode for a secondary battery of the present invention is characterized in that the electrodeposited copper foil according to any one of the above-mentioned items is used as a current collector for a secondary battery, and an active material is stacked on the surface thereof.

本發明之二次電池係使用上述二次電池用電極之二次電池。 The secondary battery of the present invention is a secondary battery using the above electrode for a secondary battery.

根據本發明,可提供一種電解銅箔,其常態之機 械強度大,並且於300℃以上加熱後亦難以發生熱劣化。 According to the present invention, an electrolytic copper foil can be provided, which is a normal machine The mechanical strength is large, and it is difficult to cause thermal deterioration after heating at 300 ° C or higher.

本發明之電解銅箔係含有鎢,剩餘部份為銅之電解銅箔。 The electrolytic copper foil of the present invention contains tungsten, and the remainder is copper electrolytic copper foil.

上述電解銅箔中之鎢含量為0.06wt%以上,更優選為0.06wt%~0.5wt%之範圍內。 The tungsten content in the above electrolytic copper foil is 0.06 wt% or more, more preferably 0.06 wt% to 0.5 wt%.

將鎢含量設為0.06wt%以上之原因在於,與含量低於0.06wt%之銅箔相比,其可提高300℃×1小時熱處理後常溫下測定之拉伸強度,並且可用作電池用集電體,因此可延長電池之循環壽命。 The reason why the tungsten content is set to 0.06 wt% or more is that the tensile strength measured at room temperature after heat treatment at 300 ° C for 1 hour can be improved as compared with the copper foil having a content of less than 0.06 wt %, and can be used as a battery. The current collector can extend the cycle life of the battery.

鎢之添加量優選為0.5wt%以下之原因在於,即使添加量高於0.5wt%,其效果亦飽和,幾乎看不到物性改善之效果。此外,亦會導致導電率降低,因此並非優選。 The reason why the amount of addition of tungsten is preferably 0.5% by weight or less is that even if the amount added is more than 0.5% by weight, the effect is saturated, and the effect of improving physical properties is hardly observed. In addition, it also causes a decrease in electrical conductivity, which is not preferable.

本發明者們為製造含有W之電解銅箔,反複進行了各種實驗。其結果為,含有氯離子之電解液中,即使在液體中大量添加鎢,鎢亦未攝入製成之銅箔中,當然利用此種電解液製成之銅箔的常溫以及加熱後之箔之機械強度沒有提高。 The inventors of the present invention repeated various experiments in order to produce an electrolytic copper foil containing W. As a result, in the electrolyte containing chlorine ions, even if a large amount of tungsten is added to the liquid, tungsten is not taken into the copper foil, and of course, the normal temperature of the copper foil made of the electrolyte and the foil after heating are used. The mechanical strength has not improved.

然而,獲得了這種認知:即使於電解液中添加氯離子,若於液體中添加硫脲類化合物,則鎢亦會根據製箔條件而攝入箔中。 However, it has been recognized that even if a chloride ion is added to the electrolyte, if a thiourea compound is added to the liquid, the tungsten is taken up in the foil according to the foil-forming conditions.

此外,本發明之電解銅箔中,鎢含量為0.06wt%~0.5wt%,氯含量為0.001wt%~0.07wt%。 Further, in the electrolytic copper foil of the present invention, the tungsten content is from 0.06 wt% to 0.5 wt%, and the chlorine content is from 0.001 wt% to 0.07 wt%.

氯含量為0.001wt%以上之原因在於,若含量低於0.001wt%,則銅箔表面會失去表面平滑性。此外,將氯含量設為0.07wt%以下之原因在於,若含量高於0.07wt%,則製成之電解銅箔會出現初始強度降低之趨勢,並且由於初始強度降低,加熱後之強度亦會降低。 The reason why the chlorine content is 0.001% by weight or more is that if the content is less than 0.001% by weight, the surface of the copper foil loses surface smoothness. Further, the reason why the chlorine content is set to 0.07 wt% or less is that if the content is more than 0.07 wt%, the electrolytic copper foil produced tends to have a tendency to decrease in initial strength, and since the initial strength is lowered, the strength after heating is also increased. reduce.

藉由於上述認知之基礎上,按以下條件製造電解銅箔,成功製成耐熱性優異之電解銅箔。 Based on the above findings, an electrolytic copper foil was produced under the following conditions, and an electrolytic copper foil excellent in heat resistance was successfully produced.

基本電解浴組成: Basic electrolytic bath composition:

Cu=70g/L Cu=70g/L

H2SO4=50g/L H 2 SO 4 = 50g / L

電解條件: Electrolysis conditions:

電流密度=40A/dm2 Current density = 40A/dm 2

液溫=45℃ Liquid temperature = 45 ° C

添加至硫酸-硫酸銅類銅電解液中之添加劑如下所述。 The additive added to the sulfuric acid-copper sulfate-based copper electrolyte is as follows.

添加劑A:硫脲類化合物=2~20mg/L Additive A: Thiourea compound = 2~20mg/L

添加劑B:鎢鹽(作為鎢)=150~1,000mg/L Additive B: Tungsten salt (as tungsten) = 150~1,000mg/L

添加劑C:氯離子=5~70mg/L Additive C: chloride ion = 5~70mg/L

另外,上述添加劑B係「作為鎢金屬相當於150~1,000mg/L之鎢鹽」之意(以下相同)。 Further, the above-mentioned additive B is intended to mean "a tungsten metal equivalent to a tungsten salt of 150 to 1,000 mg/L" (the same applies hereinafter).

添加劑A:硫脲類化合物係指具有下述結構之有機化合物。 Additive A: A thiourea compound means an organic compound having the following structure.

>N-C(=S)-N< >N-C(=S)-N<

作為硫脲類化合物之例,可列舉硫脲、N,N-二乙 基硫脲、四甲基硫脲、以及乙烯硫脲。然而,該等僅為例示了下述實施例中之使用物質,只要具有上述構造之特徵,可發揮同樣效果,亦可使用任意化合物。 Examples of the thiourea compound include thiourea, N, N-diethyl Thiourea, tetramethylthiourea, and ethylene thiourea. However, these are merely illustrative of the substances used in the following examples, and as long as they have the characteristics of the above-described structure, the same effects can be exerted, and any compound can be used.

添加劑B:鎢鹽為溶解於含有硫酸銅及硫酸之電解液中者,可列舉鎢酸鈉、鎢酸銨、鎢酸鉀等。 Additive B: The tungsten salt is dissolved in an electrolytic solution containing copper sulfate and sulfuric acid, and examples thereof include sodium tungstate, ammonium tungstate, and potassium tungstate.

添加劑C:添加氯離子時,從溶解於含有硫酸銅及硫酸之電解液的化合物中進行選擇。可列舉鹽酸、氯化鈉、氯化鉀等。 Additive C: When chloride ion is added, it is selected from a compound dissolved in an electrolytic solution containing copper sulfate and sulfuric acid. Examples thereof include hydrochloric acid, sodium chloride, and potassium chloride.

使用硫脲類化合物作為有機添加劑之原因在於,硫脲類化合物具有之〔=S〕構造會優先吸附至銅上形成有機分子之吸附層,於該吸附層上吸附鎢氧化物,從而鎢會與硫脲類化合物一同攝入箔中。 The reason why a thiourea compound is used as an organic additive is that a thiourea compound having a [=S] structure preferentially adsorbs to an adsorption layer of copper to form an organic molecule, and a tungsten oxide is adsorbed on the adsorption layer, whereby tungsten is combined with The thiourea compound is taken together in the foil.

鎢於酸性溶液中作為氧化物存在,但使用含有氯之電解液實施銅電析時,氯離子覆蓋於銅之析出面上,因此鎢氧化物不會吸附至銅上,並且鎢不會攝入箔中。若於該電解液中添加硫脲類化合物,則〔=S〕構造會較氯離子優先吸附至銅上,於銅上形成有機分子之吸附層。一般推測,藉由鎢氧化物吸附至該吸附層上,鎢會與硫脲類化合物一同攝入箔中。 Tungsten exists as an oxide in an acidic solution. However, when copper electrolysis is performed using an electrolyte containing chlorine, chloride ions cover the precipitation surface of copper, so tungsten oxide is not adsorbed onto copper, and tungsten is not ingested. In the foil. When a thiourea compound is added to the electrolytic solution, the [=S] structure is preferentially adsorbed onto the copper than the chloride ion, and an adsorption layer of an organic molecule is formed on the copper. It is generally assumed that tungsten is adsorbed onto the adsorption layer by tungsten oxide, and the tungsten is taken into the foil together with the thiourea compound.

如此,本發明電解銅箔從於硫酸-硫酸銅電解液中含有鎢、硫脲類化合物、氯而成之電解液藉由電解析出而形成。一般認為,於這種含有鎢、硫脲類化合物以及氯之硫酸-硫酸銅電解液中電解析出銅時,鎢氧化物會與硫脲類化合物一同吸附至銅之晶粒介面中,結晶核之成長受到抑制,結晶粒變得細小(低粗糙度化),形成常態下具有高機械強度之電解銅 箔。 As described above, the electrolytic copper foil of the present invention is formed by electrolysis of an electrolytic solution containing tungsten, a thiourea compound, and chlorine in a sulfuric acid-copper sulfate electrolyte. It is generally believed that when copper is electrolyzed in such a sulfuric acid-sulfur urea-containing compound and chlorine-containing sulfuric acid-copper sulfate electrolyte, the tungsten oxide is adsorbed together with the thiourea compound into the grain interface of copper, and the crystal nucleus The growth is suppressed, the crystal grains become fine (low roughness), and electrolytic copper having high mechanical strength under normal conditions is formed. Foil.

因此,一般認為,即使將含有鎢之電解銅箔於300℃左右之高溫下進行加熱,鎢氧化物亦會停留在晶粒介面中,防止銅之微細結晶因熱量而發生再結晶,使結晶變粗大。 Therefore, it is generally considered that even if the electrolytic copper foil containing tungsten is heated at a high temperature of about 300 ° C, the tungsten oxide stays in the grain interface to prevent the fine crystal of copper from recrystallizing due to heat, and the crystal is changed. Coarse.

本發明之電解銅箔即使於300℃左右之高溫下加熱後,亦具有低粗糙度且機械強度降低小這種此前藉由使用有機添加劑之硫酸-硫酸銅類電解液製成之電解銅箔所不具備的優異特徵。 The electrolytic copper foil of the present invention has a low roughness and a low mechanical strength even after being heated at a high temperature of about 300 ° C. The electrolytic copper foil which has been previously produced by using a sulfuric acid-copper sulfate electrolyte using an organic additive Excellent features not available.

一般認為,添加入硫酸-硫酸銅類電解液中之硫脲類化合物於電解液中與金屬元素、氯一同形成錯合物。 It is considered that the thiourea compound added to the sulfuric acid-copper sulfate electrolyte solution forms a complex compound with the metal element and chlorine in the electrolytic solution.

未添加鎢時,於用來製造電解銅箔之電解液中添加之金屬元素為銅。因此,含有硫酸銅與硫酸之電解液中會形成銅-硫脲類化合物。通過該電解液之銅電析形成電解銅箔後,銅-硫脲類化合物會被吸附至晶粒介面中,結晶核之成長受到抑制,結晶粒變得細小,形成常態下機械強度大之電解銅箔。 When tungsten is not added, the metal element added to the electrolytic solution for producing the electrolytic copper foil is copper. Therefore, a copper-thiourea compound is formed in an electrolyte containing copper sulfate and sulfuric acid. After the electrolytic copper foil is formed by electrolysis of copper of the electrolytic solution, the copper-thiourea compound is adsorbed to the grain interface, the growth of the crystal nucleus is suppressed, and the crystal grains become fine, and the electrolysis is performed under normal conditions. Copper foil.

但是,一般認為於該銅箔中,存在於晶粒介面中之物質為銅-硫脲類化合物,銅會被內部銅結晶結合或者被吸收,存在於晶粒介面中之物質僅為硫脲類化合物,因此暴露於300℃左右之高溫下時會進行分解,最終機械強度會降低。 However, it is generally considered that in the copper foil, the substance present in the grain interface is a copper-thiourea compound, copper is crystallized or absorbed by the internal copper crystal, and the substance present in the grain interface is only a thiourea. The compound is thus decomposed when exposed to a high temperature of about 300 ° C, and the final mechanical strength is lowered.

一般認為,於300℃左右的高溫下進行加熱時拉伸強度會顯著降低之原因在於,如上所述存在於晶粒介面中的化合物係有機化合物,該有機化合物容易因300℃左右之加熱而發生分解,因此機械強度會降低。 It is considered that the tensile strength is remarkably lowered when heated at a high temperature of about 300 ° C. The reason that the compound existing in the grain interface is an organic compound as described above, and the organic compound is liable to be heated by heating at about 300 ° C. Decomposed, so the mechanical strength will decrease.

按照專利文獻1、2所揭示之方法,使用不同之有機化合物實施電解析出,製造了電解銅箔,但其皆係藉由含有有機添加劑及氯之硫酸-硫酸銅電解液製成者,並且吸附於電解銅箔之晶粒介面者為有機化合物成分,因此該電解銅箔暴露於300℃以上之高溫下時機械強度顯著下降,其原因一般認為在於,吸附至晶粒介面中之化合物皆為300℃以上之高溫加熱下容易分解的有機化合物。 According to the methods disclosed in Patent Documents 1 and 2, electrolysis is carried out using different organic compounds to produce an electrolytic copper foil, but all of them are made of a sulfuric acid-copper sulfate electrolyte containing an organic additive and chlorine, and The grain interface adsorbed on the electrolytic copper foil is an organic compound component. Therefore, when the electrolytic copper foil is exposed to a high temperature of 300 ° C or higher, the mechanical strength is remarkably lowered. The reason is generally that the compounds adsorbed into the grain interface are An organic compound that is easily decomposed under heating at a temperature of 300 ° C or higher.

於之不同,本發明藉由於含有硫酸銅及硫酸之電解液中添加鎢、硫脲類化合物、氯而成之電解液實施銅電析,形成銅合金箔,因此鎢氧化物會與硫脲類化合物一同吸附至銅上。藉由所吸附之鎢氧化物以及硫脲類化合物,結晶核之成長會受到抑制、結晶粒會變細小、形成常態下機械強度大之電解銅箔。 However, in the present invention, copper electrolysis is carried out by adding an electrolyte solution containing tungsten, a thiourea compound, and chlorine to an electrolytic solution containing copper sulfate and sulfuric acid to form a copper alloy foil, so that the tungsten oxide and the thiourea are different. The compounds are adsorbed together onto the copper. By the adsorbed tungsten oxide and the thiourea compound, the growth of the crystal nucleus is suppressed, the crystal grains become fine, and the electrolytic copper foil having a high mechanical strength in a normal state is formed.

如此,一般認為,本發明之電解銅箔中,鎢氧化物及硫脲類化合物會存在於晶粒介面中,因此不同於銅-硫脲類化合物時,鎢氧化物不會被內部之銅結晶結合或吸收,鎢氧化物以及硫脲類化合物會繼續停留在晶粒介面中。因此,即使暴露於300℃左右之高溫下,鎢金屬之氧化物亦會停留在晶粒介面中,防止銅之微細結晶因熱量而發生再結晶,使結晶變得粗大。 Thus, it is considered that in the electrolytic copper foil of the present invention, tungsten oxide and thiourea compounds are present in the grain interface, and therefore, unlike the copper-thiourea compound, the tungsten oxide is not crystallized by the inner copper. In combination with or absorption, tungsten oxide and thiourea compounds will continue to reside in the grain interface. Therefore, even when exposed to a high temperature of about 300 ° C, the oxide of the tungsten metal stays in the grain interface, preventing the fine crystal of copper from being recrystallized by heat, and the crystal becomes coarse.

如上所述使用添加有氯離子之電解液時,極難將鎢真正地攝入銅箔中。然而,本發明中藉由添加硫脲類化合物,將鎢成功攝入銅箔中。 When an electrolyte solution to which chloride ions are added is used as described above, it is extremely difficult to actually take tungsten into the copper foil. However, in the present invention, tungsten is successfully taken up into the copper foil by the addition of a thiourea compound.

將硫脲類化合物之添加量設為2mg/L~20mg/L之 原因在於,若不足2mg/L則無法將鎢以規定量攝入銅箔中,300℃×1小時熱處理後之拉伸強度會降低,若添加量超過20mg/L,則箔之狀態中翹起(捲曲)會增強,因此添加量之範圍優選為2mg/L~20mg/L。 The amount of the thiourea compound to be added is set to 2 mg/L to 20 mg/L. The reason is that if it is less than 2 mg/L, tungsten cannot be taken into the copper foil by a predetermined amount, and the tensile strength after heat treatment at 300 ° C for 1 hour is lowered, and if the amount is more than 20 mg / L, the state of the foil is lifted. (Curling) is enhanced, so the amount of addition is preferably in the range of 2 mg/L to 20 mg/L.

氯離子之添加量為5~70mg/L。若氯離子之添加量不足5mg/L,則會出現表面粗糙度顯著增大(表面之平滑性會受損)等問題,因此並非優選,若氯離子之添加量超過70mg/L,則箔之初始強度會降低,因此並非優選。因此,氯離子之添加量之範圍優選為5~70mg/L,更優選為10~30mg/L。 The amount of chloride ion added is 5~70mg/L. When the amount of chlorine ions added is less than 5 mg/L, there is a problem that the surface roughness is remarkably increased (the smoothness of the surface is impaired), which is not preferable. If the amount of chlorine ions added exceeds 70 mg/L, the foil is used. The initial strength is lowered, so it is not preferred. Therefore, the amount of chlorine ions added is preferably in the range of 5 to 70 mg/L, more preferably 10 to 30 mg/L.

使用以上述規定量添加有鎢、硫脲類化合物、以及氯離子之硫酸銅溶液作為電解液,以貴金屬氧化物覆蓋鈦為陽極,以鈦製轉鼓為陰極,於電流密度30~100A/dm2、液溫30~70℃之條件下實施電解處理,從而製成電解銅箔。 A copper sulfate solution containing tungsten, a thiourea compound, and a chloride ion added in the above-mentioned predetermined amount is used as an electrolytic solution, titanium is coated with a noble metal oxide as an anode, and a titanium drum is used as a cathode at a current density of 30 to 100 A/dm. 2. Electrolytic treatment is carried out under the conditions of a liquid temperature of 30 to 70 ° C to prepare an electrolytic copper foil.

使用聚醯亞胺黏合劑時,構成鋰離子二次電池之負極集電體之集電體(銅箔)通常必須能夠承受300℃×1小時熱處理。即,於鋰離子二次電池用集電體表面上塗佈於活性物質、導電材以及黏合劑之混合物中加入溶劑等而調製成糊狀的活性物質組合物,經過乾燥製程,製成鋰離子二次電池之電極。於該乾燥製程中,必須實施300℃×1小時熱處理。作為能夠承受該乾燥製程之加熱條件,並且能夠承受活性物質之充放電循環產生之膨脹和收縮的銅箔,優選必須具有滿足300℃×1小時熱處理後常溫下測定之拉伸強度為500MPa以上之條件的性能。 When a polyimide polyimide binder is used, the current collector (copper foil) constituting the anode current collector of the lithium ion secondary battery usually must be capable of withstanding heat treatment at 300 ° C for 1 hour. In other words, a surface of a current collector for a lithium ion secondary battery is applied to a mixture of an active material, a conductive material, and a binder, and a solvent or the like is added to prepare a paste-form active material composition, which is subjected to a drying process to produce a lithium ion. The electrode of the secondary battery. In the drying process, heat treatment at 300 ° C for 1 hour must be performed. The copper foil which can withstand the heating conditions of the drying process and can withstand the expansion and contraction caused by the charge and discharge cycle of the active material preferably has a tensile strength of 500 MPa or more measured at room temperature after heat treatment at 300 ° C for 1 hour. Conditional performance.

此外,與碳等活性物質相比,Si及Sn等活性物質 之電子傳導性較差。若活性物質之導電性差,則會增大電極之內部電阻,因此循環特性會劣化。 In addition, active substances such as Si and Sn are compared with active substances such as carbon. The electron conductivity is poor. If the conductivity of the active material is poor, the internal resistance of the electrode is increased, and the cycle characteristics are deteriorated.

本發明之含鎢電解銅箔滿足上述二次電池用集電體要求之各項特性。因此,藉由將該電解銅箔作為集電體,於該集電體中疊層矽、鍺、錫或該等之合金化合物或以該等為主要成分之活性物質形成電極,並組入該電極,可製造性能優異之鋰離子二次電池。 The tungsten-containing electrolytic copper foil of the present invention satisfies the various characteristics required for the above-mentioned secondary battery collector. Therefore, by using the electrolytic copper foil as a current collector, an electrode is formed by laminating bismuth, antimony, tin or the alloy compound or the active material as a main component in the current collector, and the electrode is incorporated. The electrode can produce a lithium ion secondary battery with excellent performance.

另外,本發明電解銅箔特別適合用作鋰離子二次電池之集電體,當然亦可適合用作其他電池之電極用集電體。 Further, the electrolytic copper foil of the present invention is particularly suitable as a current collector for a lithium ion secondary battery, and can of course be suitably used as a current collector for electrodes of other batteries.

實施例 Example

(實施例1-1~1-7) (Examples 1-1 to 1-7)

使用添加有表1所示之量之銅、硫酸、氯離子、鎢、硫脲類有機添加劑的含有硫酸銅與硫酸之電解液,以貴金屬氧化物覆蓋鈦為陽極,以鈦製轉鼓為陰極,按照下述電解條件製成電解銅箔。 An electrolyte containing copper sulfate and sulfuric acid added with an amount of copper, sulfuric acid, chloride ion, tungsten, or thiourea organic additive added in Table 1, with titanium as a noble metal oxide as anode and titanium as a cathode An electrolytic copper foil was produced in accordance with the following electrolysis conditions.

電解條件 Electrolytic condition

電流密度40A/dm2 Current density 40A/dm 2

溫度45℃ Temperature 45 ° C

另外,表1及表2中,「加熱後」係指於惰性氣體環境中實施300℃×1小時熱處理後常溫下測定之結果。「常溫」係指實施上述熱處理前常溫下測定之結果。以下實施例中亦相同。 In addition, in Table 1 and Table 2, "after heating" means the result of measuring at normal temperature after performing 300 degreeC*1 hour heat processing in an inert gas environment. "Normal temperature" means the result of measurement at room temperature before the above heat treatment. The same is true in the following embodiments.

防銹處理 Anti-rust treatment

按照以下條件對如此製成之電解銅箔實施防銹處理。 The thus-prepared electrolytic copper foil was subjected to rustproof treatment in accordance with the following conditions.

將製成之電解銅箔(未處理銅合金箔)於CrO3;1g/L水溶液中浸漬5秒鐘,實施鉻酸鹽處理,水洗後使其乾燥。 The prepared electrolytic copper foil (untreated copper alloy foil) was immersed in a CrO 3 ;1 g/L aqueous solution for 5 seconds, subjected to chromate treatment, washed with water, and then dried.

另外,此處雖然實施了鉻酸鹽處理,但當然亦可實施苯並三唑類處理、或矽烷偶合劑處理、或於鉻酸鹽處理後再實施矽烷偶合劑處理。 Further, although the chromate treatment has been carried out here, it is of course possible to carry out the treatment with a benzotriazole treatment or a decane coupling agent or a treatment with a decane coupling agent after the chromate treatment.

(比較例2-1、2-2) (Comparative Examples 2-1 and 2-2)

使用添加有表1所示之量之銅、硫酸、氯、硫脲類有機添加劑的含有硫酸銅與硫酸之電解液,以貴金屬氧化物覆蓋鈦為陽極,以鈦製轉鼓為陰極,按照下述電解條件製成電解銅箔。 An electrolyte containing copper sulfate and sulfuric acid added with an amount of the copper, sulfuric acid, chlorine, and thiourea organic additives shown in Table 1 is used, the titanium is coated with a noble metal oxide as an anode, and the titanium drum is used as a cathode. The electrolysis conditions were made into electrolytic copper foil.

電解條件 Electrolytic condition

電流密度40A/dm2 Current density 40A/dm 2

溫度45℃ Temperature 45 ° C

對如此製成之銅箔實施與實施例相同之表面處理。 The copper foil thus produced was subjected to the same surface treatment as in the examples.

(參考例2-3) (Reference Example 2-3)

使用添加有表1所示之量之銅、硫酸、氯離子、鎢、硫脲類有機添加劑的含有硫酸銅與硫酸之電解液,以貴金屬氧化物覆蓋鈦為陽極,以鈦製轉鼓為陰極,按照下述電解條件製成電解銅箔。 An electrolyte containing copper sulfate and sulfuric acid added with an amount of copper, sulfuric acid, chloride ion, tungsten, or thiourea organic additive added in Table 1, with titanium as a noble metal oxide as anode and titanium as a cathode An electrolytic copper foil was produced in accordance with the following electrolysis conditions.

電解條件 Electrolytic condition

電流密度40A/dm2 Current density 40A/dm 2

溫度45℃ Temperature 45 ° C

對如此製成之銅箔實施與實施例相同之表面處理。 The copper foil thus produced was subjected to the same surface treatment as in the examples.

對所製成之銅箔實施以下試驗。 The following test was carried out on the produced copper foil.

銅箔中鎢含量之測定 Determination of tungsten content in copper foil

關於鎢含量,以酸溶解一定重量之電解銅箔後,利用ICP發光分光分析法進行計算。 Regarding the tungsten content, after a certain weight of the electrolytic copper foil was dissolved with an acid, it was calculated by ICP emission spectrometry.

使用機器:ICPS-7000(島津製作所) Machine used: ICPS-7000 (Shimadzu Corporation)

銅箔之拉伸強度之測定 Determination of tensile strength of copper foil

銅箔之拉伸強度係基於IPC-TM-650於箔之加熱前及加熱後測定者。 The tensile strength of the copper foil is based on IPC-TM-650 before and after heating of the foil.

使用機器:AG-I(島津製作所) Machine: AG-I (Shimadzu Corporation)

氯含量之測定 Determination of chlorine content

以酸溶解一定重量之電解銅箔後,藉由硝酸銀滴定將溶液中之氯進行定量,計算出氯含量。 After dissolving a certain weight of the electrolytic copper foil with an acid, the chlorine in the solution was quantified by titration with silver nitrate to calculate the chlorine content.

鎢之解析 Tungsten analysis

藉由XAFS(X光吸收細微結構:X-ray Absorption Fine Structure)法,解析了電解銅合金中含有之鎢之化學結合狀態及電子狀態。根據XAFS法,一邊變化X射線能量一邊對樣本照射X射線,從所獲得之X射線吸收光譜,解析樣本中之化學結合狀態及電子狀態。 The chemical bonding state and electronic state of tungsten contained in the electrolytic copper alloy were analyzed by XAFS (X-ray Absorption Fine Structure) method. According to the XAFS method, X-rays are irradiated to the sample while changing the X-ray energy, and the chemical bonding state and the electronic state in the sample are analyzed from the obtained X-ray absorption spectrum.

作為獲得X射線吸收光譜之其他方法,可列舉根據入射之X射線之強度及透過之X射線之強度計算X射線吸收光譜之透過法、以及測定隨著X射線之吸收而自樣本中發出之螢光X射線之強度之螢光法。 As another method for obtaining an X-ray absorption spectrum, a transmission method for calculating an X-ray absorption spectrum from the intensity of incident X-rays and the intensity of transmitted X-rays, and a measurement of the fluorescence emitted from the sample by absorption of X-rays are exemplified. Fluorescence method of intensity of light X-rays.

將金屬材料等添加元素作為分析對象時,其添加量為微量,難以通過透過法獲得XAFS光譜。此時,上述螢光法為有效方法。螢光法之特徵在於:藉由從其光軸係大幅獲得X射線之照射面積,即使是微量成分之元素亦可實施XAFS測定。 When an additive element such as a metal material is used as an analysis target, the amount of addition is a small amount, and it is difficult to obtain an XAFS spectrum by a transmission method. At this time, the above-described fluorescent method is an effective method. The fluorimetry method is characterized in that XAFS measurement can be performed even with elements of a trace component by sufficiently obtaining an irradiation area of X-rays from its optical axis system.

本測定之目的在於獲知高強度銅箔中鎢之化學結合狀態及電子狀態,由於鎢之量為微量,難以通過透過法獲得XAFS光譜,因此選擇了螢光法。 The purpose of this measurement is to know the chemical bonding state and the electronic state of tungsten in the high-strength copper foil. Since the amount of tungsten is a small amount, it is difficult to obtain the XAFS spectrum by the transmission method, and therefore the fluorescence method is selected.

測定中,使用SPring-8之產業利用光束線BL14B2。所測定之X射線之能量範圍為10000~10434eC。該能量範圍中含有鎢之L3-吸收端(10207eV),因此符合本測定之目的。 In the measurement, the industry using SPring-8 utilizes the beam line BL14B2. The measured X-ray energy range is 10000~10434eC. This energy range contains the L3-absorption end of tungsten (10207 eV) and is therefore suitable for the purposes of this assay.

測定樣本準備了鎢含量為0.48wt%之銅箔(實施例1-3)。此外,為進行比較,準備了鎢箔及WO3。作為測定 時間,每個樣本為4小時。含鎢銅箔之光譜於並非與金屬鎢而是與WO3之光譜幾乎一致之能量區域中存有峰值,因此得知電解銅箔中之鎢元素係作為氧化物狀態含有。基於該結果於各實施例中亦進行了測定,確認其以氧化物狀態含有。 The measurement sample was prepared with a copper foil having a tungsten content of 0.48 wt% (Examples 1-3). Further, for comparison, a tungsten foil and WO 3 were prepared . As the measurement time, each sample was 4 hours. The spectrum of the tungsten-containing copper foil has a peak in an energy region which does not substantially coincide with the metal tungsten but the spectrum of WO 3 . Therefore, it is found that the tungsten element in the electrolytic copper foil is contained as an oxide state. Based on the results, it was also measured in each of the examples, and it was confirmed that it was contained in an oxide state.

電池性能試驗 Battery performance test

繼而,將實施例中製成之電解銅箔作為集電體,製成鋰離子二次電池,實施循環壽命試驗。 Then, the electrolytic copper foil produced in the examples was used as a current collector to prepare a lithium ion secondary battery, and a cycle life test was carried out.

以粉末狀Si合金類活性物質(平均粒徑0.1μm~10μm)為85、黏合劑(聚醯亞胺)為15之比率(重量比)進行混合,使其分散於N-甲基吡咯烷酮(溶劑)中,形成活性物質漿料。 The powdery Si alloy active material (average particle diameter: 0.1 μm to 10 μm) was 85, and the binder (polyimine) was mixed at a ratio of 15 (weight ratio) to be dispersed in N-methylpyrrolidone (solvent). In the formation of an active material slurry.

繼而,將該漿料塗佈至製成之厚度為12μm之電解銅箔兩面,乾燥後利用滾筒壓制機壓縮形成,然後於氮氣環境下以300℃燒結1小時,形成負極。該負極中,成形後之負極合劑之膜厚兩面相同,皆為20μm。 Then, the slurry was applied to both sides of an electrolytic copper foil having a thickness of 12 μm, dried, and then formed by compression using a roller press, and then sintered at 300 ° C for 1 hour in a nitrogen atmosphere to form a negative electrode. In the negative electrode, the film thickness of the negative electrode mixture after molding was the same on both sides, and both were 20 μm.

鋰離子二次電池之製作 Production of lithium ion secondary battery

於氬氣環境下之手套箱內,以下述結構構築評價用三極式單元。 In the glove box under an argon atmosphere, a three-pole unit for evaluation was constructed by the following structure.

負極:上述製作之Si合金類負極 Negative electrode: Si alloy type negative electrode prepared above

對極、參照極:鋰箔 Counter electrode, reference pole: lithium foil

電解液:1mol/L LiPF6/EC+DEC(3:7vol%) Electrolyte: 1 mol/L LiPF 6 /EC+DEC (3:7 vol%)

將所構築之單元從箱中取出至大氣中,於25℃之環境下實施充放電測定。 The constructed unit was taken out from the tank to the atmosphere, and subjected to charge and discharge measurement in an environment of 25 °C.

相對於Li之標準單極電位標準,以恆定電流實施 充電至0.02V,然後以CV模式(保持恆定電位)使電流降低至0.05C,將此時作為充電結束。另外,C表示充放電速率。藉由恆定電流以0.1C放電至1.5V(Li標準)。以同樣的0.1C之相當電流重複充放電。 Implemented at a constant current relative to the standard unipolar potential standard of Li The battery was charged to 0.02 V, and then the current was lowered to 0.05 C in the CV mode (maintaining a constant potential), and this was ended as charging. In addition, C represents the charge and discharge rate. It was discharged to 1.5 V (Li standard) by a constant current at 0.1 C. The charge and discharge were repeated with the same current of 0.1 C.

循環壽命為放電容量達到第1循環之放電容量之70%時之循環數。此外,在充放電循環後拆卸電池,評價箔之變形性。其結果如表1所示。 The cycle life is the number of cycles when the discharge capacity reaches 70% of the discharge capacity of the first cycle. Further, the battery was disassembled after the charge and discharge cycle, and the deformability of the foil was evaluated. The results are shown in Table 1.

如表1所示,含鎢電解銅箔之鎢含量為0.06wt%~0.5wt%時,充放電試驗後未發現褶皺等問題,循環特性亦良好,但超出該範圍之比較例中,充放電試驗後發生了褶皺,並且循環特性出現了顯著降低。 As shown in Table 1, when the tungsten content of the tungsten-containing electrolytic copper foil was 0.06 wt% to 0.5 wt%, no wrinkles and the like were observed after the charge and discharge test, and the cycle characteristics were also good, but in the comparative example exceeding the range, charge and discharge were obtained. Wrinkles occurred after the test and the cycle characteristics were significantly reduced.

此外,鎢含量之範圍為0.06wt%~0.5wt%之實施例與超出該範圍之參考例相比,循環特性良好。 Further, the examples in which the tungsten content is in the range of 0.06 wt% to 0.5 wt% have good cycle characteristics as compared with the reference examples outside the range.

此外,雖然實施例1-6之鎢含量與實施例1-3程度相同,但氯含量超過了0.07wt%,因此初始強度低於實施例1-3及比較例2-1、2-2。然而,其後之加熱後強度高於比較例2-1、2-2,由此可知加熱造成之降低程度小。 Further, although the tungsten content of Examples 1-6 was the same as that of Examples 1-3, the chlorine content exceeded 0.07 wt%, and thus the initial strength was lower than that of Examples 1-3 and Comparative Examples 2-1 and 2-2. However, the strength after heating was higher than that of Comparative Examples 2-1 and 2-2, and it was found that the degree of reduction by heating was small.

然而,如上所述若氯含量超過0.07wt%,則初始強度會降低,最終加熱後強度值會降低,並且導致循環特性降低,因此氯含量優選為0.07wt%以下。 However, if the chlorine content exceeds 0.07 wt% as described above, the initial strength may be lowered, the strength value may be lowered after the final heating, and the cycle characteristics may be lowered, so the chlorine content is preferably 0.07 wt% or less.

製作HDD懸架用基板 Making a substrate for HDD suspension

本實施例中,於製成電解銅箔後,製成由不銹箔-聚醯亞胺樹脂層-電解銅箔構成之HDD懸架用基板,實施其特性評價。 In the present embodiment, after the electrolytic copper foil was produced, a substrate for HDD suspension composed of a stainless foil-polyimine resin layer-electrolytic copper foil was prepared, and its characteristics were evaluated.

電解銅箔之準備 Preparation of electrolytic copper foil

如表2所示,使用實施例1-2~4、1-6、比較例2-2、參考例2-3之電解銅箔,製成HDD懸架用基板。 As shown in Table 2, the substrates for HDD suspension were produced using the electrolytic copper foils of Examples 1-2 to 4, 1-6, Comparative Example 2-2, and Reference Example 2-3.

聚醯亞胺樹脂之合成 Synthesis of polyimine resin

合成例1 Synthesis Example 1

為合成線膨脹係數為30ppm/K以下之低熱膨脹性之聚醯亞胺類樹脂,稱取9.0莫耳之DADMB,並於40L之行星式混合機中一邊攪拌一邊使其溶解於溶劑DMAc25.5kg中。繼而,添加8.9莫耳之BPDA,於室溫下繼續攪拌3小時,實施聚合反應,獲得黏稠之聚醯亞胺先驅體A之溶液。本合成例獲得之聚醯亞胺先驅體A於亞胺化後之線膨脹係數為13ppm/K。 In order to synthesize a low thermal expansion polyimine resin having a linear expansion coefficient of 30 ppm/K or less, 9.0 mol of DADMB was weighed and dissolved in a 40 L planetary mixer while dissolving in a solvent DMAc 25.5 kg. in. Then, 8.9 mol of BPDA was added, and stirring was continued for 3 hours at room temperature, and polymerization was carried out to obtain a solution of the viscous polyimine precursor A. The polyamidene precursor A obtained in this synthesis example has a linear expansion coefficient of 13 ppm/K after imidization.

合成例2 Synthesis Example 2

為合成玻璃轉化溫度為300℃以下之聚醯亞胺類樹脂,稱取6.3mol之DADMB,並於40L之行星式混合機中一邊攪拌一邊使其溶解於溶劑DMAc25.5kg中。繼而,添加6.4mol之BPDA,於室溫下繼續攪拌3小時,實施聚合反應, 獲得黏稠之聚醯亞胺先驅體B之溶液。本合成例獲得之聚醯亞胺先驅體B於亞胺化後,使用動態黏彈性測定裝置測定之玻璃轉化溫度為225℃。 In order to synthesize a polyimine-based resin having a glass transition temperature of 300 ° C or less, 6.3 mol of DADMB was weighed and dissolved in a solvent DMAc of 25.5 kg while stirring in a 40 L planetary mixer. Then, 6.4 mol of BPDA was added, and stirring was continued for 3 hours at room temperature to carry out a polymerization reaction. A solution of the viscous polyimine precursor B is obtained. The glass transition temperature of the polybendimimine precursor B obtained in this synthesis example after imidization was measured using a dynamic viscoelasticity measuring apparatus to be 225 °C.

另外,此處使用之縮寫如下所示。 In addition, the abbreviations used here are as follows.

DADMB:4,4’-二氨基-2,2’-二甲基聯苯 DADMB: 4,4'-diamino-2,2'-dimethylbiphenyl

DMAc:N,N-二甲基乙醯胺 DMAc: N,N-dimethylacetamide

BPDA:3,3’,4,4’-聯苯四甲酸二酐 BPDA: 3,3',4,4'-biphenyltetracarboxylic dianhydride

BAPP:2,2’-二[4-(4-氨基苯氧基)苯基]丙烷 BAPP: 2,2'-bis[4-(4-aminophenoxy)phenyl]propane

HDD懸架用基板之製作 Fabrication of HDD suspension substrate

使用實施例1-2~4、1-6、比較例2-2、參考例2-3中準備之電解銅箔,製成由不銹箔-聚醯亞胺樹脂層-電解銅箔構成之HDD懸架用基板。 Using the electrolytic copper foil prepared in Examples 1-2 to 4, 1-6, Comparative Example 2-2, and Reference Example 2-3, it was made of a stainless foil-polyimine resin layer-electrolytic copper foil. HDD suspension substrate.

(a)將合成例2中獲得之聚醯亞胺先驅體B之溶液塗佈於不銹箔(新日本製鐵株式會社製、SUS304、張力退火處理品、厚度為20μm)上,使硬化後之厚度為1μm,並於110℃下乾燥3分鐘,(b)然後,於其上塗佈合成例1中獲得之聚醯亞胺先驅體A之溶液,使硬化後之厚度為7.5μm,(c)於110℃下乾燥10分鐘,(d)再於其上塗佈合成例2中獲得之聚醯亞胺先驅體B之溶液,使硬化後之厚度分別為1.5μm,(e)於110℃下乾燥3分鐘,(f)然後,再於130~360℃之範圍內藉由數階段、每階段各3分鐘之熱處理,完成亞胺化,(g)於不銹箔上獲得聚醯亞胺樹脂層之厚度為10μm之疊層體。另外,第1層之聚醯亞胺樹脂層與第3層目之聚醯亞胺樹脂層相同。 (a) The solution of the polyimine precursor B obtained in the synthesis example 2 was applied to a stainless foil (manufactured by Nippon Steel Co., Ltd., SUS304, tension-annealed product, thickness: 20 μm) to be cured. The thickness was 1 μm, and dried at 110 ° C for 3 minutes. (b) Then, a solution of the polyimide precursor A obtained in Synthesis Example 1 was applied thereon to have a thickness of 7.5 μm after hardening. c) drying at 110 ° C for 10 minutes, (d) further coating a solution of the polyimide precursor B obtained in Synthesis Example 2 to a thickness of 1.5 μm after hardening, (e) at 110 Drying at °C for 3 minutes, (f) and then, in the range of 130-360 ° C, the imidization is completed by heat treatment in several stages and each stage for 3 minutes, (g) obtaining poly-pyrene on the stainless foil. The laminate of the amine resin layer having a thickness of 10 μm. Further, the first layer of the polyimide resin layer is the same as the third layer of the polyimide layer.

繼而,在其上重疊所準備之電解銅箔,使用真空壓力機,於表面壓力15Mpa、溫度320℃、壓制時間20分鐘之條件下實施加熱壓接,獲得目標之HDD懸架用基板。 Then, the prepared electrolytic copper foil was superposed thereon, and subjected to thermocompression bonding under the conditions of a surface pressure of 15 MPa, a temperature of 320 ° C, and a pressing time of 20 minutes using a vacuum press to obtain a target HDD suspension substrate.

剝離強度之測定 Determination of peel strength

對于金屬箔與聚醯亞胺類樹脂之間之接合力,於不銹箔上形成聚醯亞胺類樹脂層後,再熱壓接電解銅箔製成雙面金屬箔之疊層體,藉由加工成規定之形狀,製成配線寬度為1/8英吋之測定用試驗片。將該樣本之SUS箔側及銅合金箔或銅箔側分別貼附於固定板上,使用拉伸試驗機,將各金屬箔向90°方向剝離,測定剝離強度。 For the bonding force between the metal foil and the polyimide resin, after forming a polyimide resin layer on the stainless foil, the electrolytic copper foil is thermocompression-bonded to form a laminate of double-sided metal foil. A test piece for measurement having a wiring width of 1/8 inch was produced by processing into a predetermined shape. The SUS foil side and the copper alloy foil or the copper foil side of the sample were attached to a fixing plate, and each metal foil was peeled off in a 90° direction using a tensile tester, and the peel strength was measured.

翹起之測定 Determination of lifting

加工疊層體,製成直徑為65mm之碟片,於溫度23℃、濕度50%下放置24小時後,使用遊標卡尺測定放置於桌上時翹起最大之部分。 The laminate was processed to prepare a disc having a diameter of 65 mm, and after standing at a temperature of 23 ° C and a humidity of 50% for 24 hours, the portion which was most tilted when placed on the table was measured using a vernier caliper.

線熱膨脹係數之測定 Determination of linear thermal expansion coefficient

測定線熱膨脹係數時,使用熱機械分析儀(Seiko Instruments(株)/精工儀器(株)製)以20℃/分鐘之速度升溫至255℃,於該溫度下保持10分鐘後,再以5℃/分鐘之固定速度進行冷卻。計算出冷卻時自240℃至100℃之平均熱膨脹係數(線熱膨脹係數)。 When measuring the linear thermal expansion coefficient, the temperature was raised to 255 ° C at a rate of 20 ° C / min using a thermomechanical analyzer (Seiko Instruments Co., Ltd.), and the temperature was maintained at 10 ° C for 10 minutes. Cool at a fixed speed of /min. The average thermal expansion coefficient (linear thermal expansion coefficient) from 240 ° C to 100 ° C at the time of cooling was calculated.

結果如表2所示。使用實施例、參考例之電解銅箔製成的由不銹箔-聚醯亞胺樹脂層-電解銅箔構成之HDD懸架用基板係充分滿足作為懸架基板材料之要求特性者。 The results are shown in Table 2. The substrate for HDD suspension composed of the stainless foil-polyimine resin layer-electrolytic copper foil made of the electrolytic copper foil of the examples and the reference examples sufficiently satisfies the required characteristics as a suspension substrate material.

使用比較例之電解銅箔所製成之HDD懸架用基板 作為懸架基板材料時,翹起大,未能滿足要求特性。 Substrate for HDD suspension made of electrolytic copper foil of Comparative Example When it is used as a suspension substrate material, the lift is large and the required characteristics are not satisfied.

如上所述,根據本發明,可提供一種電解銅箔,其常態之機械強度大,並且於300℃以上加熱後亦難以發生熱劣化。 As described above, according to the present invention, it is possible to provide an electrolytic copper foil which has a large mechanical strength and is hardly deteriorated after heating at 300 ° C or higher.

此外,根據本發明,作為鋰離子二次電池用集電體,能夠提供一種優異之電解銅箔,並且通過使用該集電體,能夠提供一種優異之二次電池。 Further, according to the present invention, it is possible to provide an excellent electrolytic copper foil as a current collector for a lithium ion secondary battery, and it is possible to provide an excellent secondary battery by using the current collector.

【產業上之可利用性】 [Industrial Availability]

本發明之電解銅箔適用於加熱後亦要求高機械強度之印刷線路板材料,例如HDD懸架材料或TAB材料之領域之構成材料。 The electrolytic copper foil of the present invention is suitable for use in a printed wiring board material which is also required to have high mechanical strength after heating, such as a constituent material in the field of HDD suspension materials or TAB materials.

此外,不僅印刷線路板,還可適用於高溫加熱後亦要求高機械強度及導電性之領域之構成材料。 Further, not only a printed wiring board but also a constituent material in a field requiring high mechanical strength and electrical conductivity after high-temperature heating can be applied.

Claims (10)

一種電解銅箔,含有0.06wt%以上之鎢(W)。 An electrolytic copper foil containing 0.06 wt% or more of tungsten (W). 一種電解銅箔,含有0.06wt%~0.5wt%之鎢(W)。 An electrolytic copper foil containing 0.06 wt% to 0.5 wt% of tungsten (W). 一種電解銅箔,含有鎢,剩餘部份實質上由銅構成。 An electrolytic copper foil containing tungsten and the remainder consisting essentially of copper. 一種電解銅箔,鎢(W)含量為0.06wt%~0.5wt%,氯(Cl)含量為0.001wt%~0.07wt%。 An electrolytic copper foil having a tungsten (W) content of 0.06 wt% to 0.5 wt% and a chlorine (Cl) content of 0.001 wt% to 0.07 wt%. 如申請專利範圍第1至第4項中任一項所述之電解銅箔,其中上述鎢之全部或部分為氧化物。 The electrolytic copper foil according to any one of claims 1 to 4, wherein all or part of the tungsten is an oxide. 一種電解銅箔,鎢含量為0.06wt%~0.5wt%,300℃×1小時熱處理後常溫下測定之拉伸強度為500MPa以上。 An electrolytic copper foil having a tungsten content of 0.06 wt% to 0.5 wt%, and a tensile strength measured at room temperature after heat treatment at 300 ° C for 1 hour is 500 MPa or more. 一種電解銅箔,鎢含量為0.06wt%~0.5wt%,氯(Cl)含量為0.001wt%~0.07wt%,300℃×1小時熱處理後常溫下測定之拉伸強度為500MPa以上。 The electrolytic copper foil has a tungsten content of 0.06 wt% to 0.5 wt%, a chlorine (Cl) content of 0.001 wt% to 0.07 wt%, and a tensile strength of 500 MPa or more measured at room temperature after heat treatment at 300 ° C for 1 hour. 一種二次電池用集電體,使用如申請專利範圍第1至7項中任一項所述之電解銅箔。 A current collector for a secondary battery using the electrolytic copper foil according to any one of claims 1 to 7. 一種二次電池用電極,使用如申請專利範圍第1至7項中任一項所述之電解銅箔作為集電體,並且於該集電體表面堆疊活性物質。 An electrode for a secondary battery using the electrolytic copper foil according to any one of claims 1 to 7 as a current collector, and an active material is stacked on the surface of the current collector. 一種二次電池,使用如申請專利範圍第1至7項中任一項所述之電解銅箔作為集電體。 A secondary battery using the electrolytic copper foil according to any one of claims 1 to 7 as a current collector.
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KR101733410B1 (en) * 2016-11-11 2017-05-10 일진머티리얼즈 주식회사 Electrolytic copper foil of secondary battery enhanced for low temperature property and manufacturing method thereof
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