TW201441028A - Mold release film and method for using mold release film - Google Patents

Mold release film and method for using mold release film Download PDF

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TW201441028A
TW201441028A TW102135048A TW102135048A TW201441028A TW 201441028 A TW201441028 A TW 201441028A TW 102135048 A TW102135048 A TW 102135048A TW 102135048 A TW102135048 A TW 102135048A TW 201441028 A TW201441028 A TW 201441028A
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release film
release
layer
release layer
film
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TW102135048A
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TWI508854B (en
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Hirohito Taniguchi
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Sumitomo Bakelite Co
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/40Adhesives in the form of films or foils characterised by release liners
    • C09J7/405Adhesives in the form of films or foils characterised by release liners characterised by the substrate of the release liner
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2467/00Presence of polyester
    • C09J2467/006Presence of polyester in the substrate

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

Provided is a mold release film which is capable of providing a molded product having excellent property by suppressing reacting the functional group of material forming the releasing surface of the mold release film with the material forming objective surface on which the mold release film is applied thereby interact with each other. Such a mold release film is the mold release film (10) having the mold releasing layer (1) containing polyester resin material, in which the amount of terminal carboxylic acid measured by indicator titrimetry using the mold releasing layer (1) is 40 or less, or the mold release film (30) having the mold releasing layer (21) containing polyester resin material, in which the intrinsic viscosity of the mold releasing layer (21) measured at 35 DEG C according to ASTM D2857 ranges from 0.9 to 1.5.

Description

脫模薄膜及脫模薄膜之使用方法 Release film and use method of release film

本發明係關於脫模薄膜及脫模薄膜之使用方法。 The present invention relates to a method of using a release film and a release film.

本案係根據2013年4月30日於日本申請之特願2013-095653號及2013年6月6日於日本申請之特願2013-119521號主張優先權,並且將該等之內容引用至此。 The priority is claimed in Japanese Patent Application No. 2013-119653, filed on Jan.

作為脫模薄膜,例如有以下者。 Examples of the release film include the following.

專利文獻1揭示一種脫模薄膜,其具有:針對玻璃轉移溫度與結晶化速度指標顯示特定之值的聚酯系彈性體層;與聚酯層,由以特定質量比所摻合之結晶性芳香族聚酯及1,4-環己二甲醇共聚合聚對苯二甲酸乙二酯構成,係由針對玻璃轉移溫度與結晶融解熱量顯示特定之值的聚酯形成。根據專利文獻1記載之脫模薄膜,可提供一種柔軟性、脫模性、耐熱性、非污染性優異,尤其對於具有精密圖案之印刷基板的填埋能力(embedability)良好,並且在捲取或裁剪薄片時之處理作業性優異之脫模薄膜。 Patent Document 1 discloses a release film having a polyester-based elastomer layer which exhibits a specific value for a glass transition temperature and a crystallization rate index, and a polyester aromatic layer which is blended with a specific mass ratio. The polyester and 1,4-cyclohexanedimethanol copolymerized polyethylene terephthalate are formed of a polyester exhibiting a specific value for the glass transition temperature and the heat of crystal melting. According to the release film described in Patent Document 1, it is excellent in flexibility, mold release property, heat resistance, and non-contamination property, and in particular, the embedability of a printed circuit board having a precise pattern is good, and in winding or A release film excellent in workability when trimming a sheet.

專利文獻2揭示一種脫模薄膜,其具有:針對結晶融解熱量與結晶化速度指標顯示特定之值的結晶性聚酯層、與針對結晶融解熱量與結晶化速度指標顯示特定之值的聚酯層。根據專利文獻2記載之脫模薄膜,可提供一種柔軟性、脫模性、耐熱性、非污染性優異,尤其對於具有精密圖案之印 刷基板的填埋能力良好,並且在捲取或裁剪薄片時之處理作業性優異之脫模薄膜。 Patent Document 2 discloses a release film having a crystalline polyester layer which exhibits a specific value for crystal heat of fusion and a crystallization rate index, and a polyester layer which exhibits a specific value for the heat of crystal melting and the crystallization rate index. . According to the release film described in Patent Document 2, it is excellent in flexibility, mold release property, heat resistance, and non-contamination property, especially for printing with a precise pattern. A mold release film having a good landfilling ability and excellent handling workability when winding or cutting a sheet.

專利文獻3揭示一種脫模薄膜,其具有:針對玻璃轉移溫度與結晶化速度指標顯示特定之值的聚酯系彈性體層;與針對升溫時之結晶化開始溫度、升溫結晶化峰值溫度及升溫結晶化熱量顯示特定之值的共聚合聚酯層。根據專利文獻3記載之脫模薄膜,可提供一種柔軟性、脫模性、耐熱性、非污染性優異,尤其能以高程度兼具對於具有精密圖案之印刷基板的填埋能力與脫模性,並且在捲取或裁剪薄片時之處理作業性優異之脫模薄膜。 Patent Document 3 discloses a release film having a polyester-based elastomer layer exhibiting a specific value for a glass transition temperature and a crystallization rate index, a crystallization start temperature at a temperature rise, a temperature rise crystallization peak temperature, and a temperature rise crystallization. The heat shows a specific value of the copolymerized polyester layer. According to the release film described in Patent Document 3, it is excellent in flexibility, mold release property, heat resistance, and non-contamination property, and in particular, it can have a high degree of landfill ability and mold release property for a printed circuit board having a precise pattern. And a release film excellent in handling workability when winding or cutting a sheet.

【先前技術文獻】 [Previous Technical Literature] 【專利文獻】 [Patent Literature]

【專利文獻1】日本特開2011-88351號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2011-88351

【專利文獻2】日本特開2011-88352號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2011-88352

【專利文獻3】日本特開2011-245812號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2011-245812

專利文獻1及2等記載之脫模薄膜,要求均衡地滿足以下列舉之4種特性。 The release film described in Patent Documents 1 and 2 and the like is required to satisfy the following four characteristics in a balanced manner.

(1)加熱成形後,可輕易地自配線基板剝離脫模薄膜(脫模性)。 (1) After the heat molding, the release film (release property) can be easily peeled off from the wiring substrate.

(2)在配線基板之外圍部中,互相黏著之脫模薄膜彼此容易剝離(低自我融黏性)。 (2) In the peripheral portion of the wiring substrate, the release films adhered to each other are easily peeled off from each other (low self-melting property).

(3)加熱成形時,良好地追隨設置於基板表面之電路配線的凹凸,並且埋入電路配線間,防止自覆蓋層(cover lay)滲出之黏著劑進入電路配線間(良好的填埋能力)。 (3) During heat molding, the unevenness of the circuit wiring provided on the surface of the substrate is favorably followed, and buried in the circuit wiring to prevent the adhesive which has leaked from the cover lay-up into the circuit wiring (good landfill capability) .

(4)與脫模薄膜之摻合樹脂間具有良好的互溶性。 (4) Good compatibility with the blended resin of the release film.

然而,近年來針對脫模薄膜之各種特性所要求之技術水準日漸高漲。 However, in recent years, the technical level required for various characteristics of the release film has been increasing.

本發明者等針對脫模薄膜,發現如下之課題。 The inventors of the present invention have found the following problems with respect to the release film.

本發明者等發現一種新課題:當使用專利文獻1~3記載之脫模薄膜時,熱壓時形成脫模薄膜之脫模面的材料之官能基,有與形成配置上述脫模薄膜之對象物表面的材料反應並交互作用之情形。此時,在剝離該脫模薄膜後,脫模薄膜之一部分會殘留作為污染物,而無法得到良好的成型品。 The present inventors have found a new problem: when the release film described in Patent Documents 1 to 3 is used, the functional group of the material of the release surface of the release film is formed during hot pressing, and the object of the release film is formed. The reaction of materials on the surface of the object and the interaction. At this time, after the release film is peeled off, a part of the release film remains as a contaminant, and a good molded article cannot be obtained.

有鑑於上述情形,本發明係提供一種脫模薄膜,其抑制熱壓時形成脫模薄膜之脫模面的材料之官能基與形成配置該脫模薄膜之對象物表面的材料反應並交互作用,可獲得具有良好品質之成型品。 In view of the above circumstances, the present invention provides a release film which inhibits the reaction and interaction of a functional group of a material which forms a release surface of a release film during hot pressing with a material which forms a surface on which an object of the release film is disposed, A molded article of good quality can be obtained.

本發明者等為了達成上述課題而不斷潛心研究,結果發現在形成具有包含聚酯樹脂材料之脫模層的脫模薄膜時,使用脫模層而藉由指示劑滴定法測得之末端羧酸量之尺度作為這種設計方針為有效,而達成本發明。 The present inventors have continually studied in order to achieve the above-mentioned problems, and as a result, it has been found that when a release film having a release layer containing a polyester resin material is formed, a terminal carboxylic acid measured by an indicator titration method using a release layer is used. The scale of the quantity is effective as such a design policy, and the present invention has been achieved.

根據本發明,可提供一種脫模薄膜,其係具有包含聚酯樹脂材料之脫模層的脫模薄膜,其中使用上述脫模層而藉由指示劑滴定法測得之末端羧酸量為小於40。 According to the present invention, there is provided a release film comprising a release film comprising a release layer of a polyester resin material, wherein the amount of terminal carboxylic acid measured by an indicator titration method using the above release layer is less than 40.

再者,根據本發明,可提供一種脫模薄膜之使用方法,其包含於對象物上配置上述脫模薄膜之步驟、與對於配置有上述脫模薄膜之上述對象物進行熱壓之步驟,在配置脫模薄膜之上述步驟中,上述對象物配置有上述脫模薄膜之面係藉由包含半硬化狀態之熱硬化性樹脂的材料所形成。 Furthermore, according to the present invention, there is provided a method of using a release film comprising the steps of disposing the release film on an object and hot pressing the object to which the release film is disposed, In the above step of disposing the release film, the surface of the object to which the release film is disposed is formed of a material containing a thermosetting resin in a semi-hardened state.

又,本發明者等為了達成上述課題而不斷潛心研究,結果發現在形成具有包含聚酯樹脂材料之脫模層的脫模薄膜時,依據ASTM D2857於35℃所測定之脫模層的固有黏度之尺度作為這種設計方針為有效,而達成本發 明。 In addition, the present inventors have continually studied in order to achieve the above problems, and as a result, found that the intrinsic viscosity of the release layer measured at 35 ° C according to ASTM D2857 when forming a release film having a release layer containing a polyester resin material. The scale is effective as this design policy, and the achievement of this issue Bright.

根據本發明,可提供一種脫模薄膜,其係具有包含聚酯樹脂材料之脫模層的脫模薄膜,其中依據ASTM D2857於35℃所測定之上述脫模層的固有黏度為0.9以上1.5以下。 According to the present invention, there is provided a release film comprising a release film comprising a release layer of a polyester resin material, wherein the release layer has an intrinsic viscosity of 0.9 or more and 1.5 or less as measured according to ASTM D2857 at 35 ° C. .

再者,根據本發明,可提供一種脫模薄膜之使用方法,其包含在對象物上配置上述脫模薄膜之步驟,與對於配置有上述脫模薄膜之上述對象物進行熱壓之步驟,在配置脫模薄膜之上述步驟中,上述對象物配置有上述脫模薄膜之面係藉由包含半硬化狀態之熱硬化性樹脂的材料所形成。 Furthermore, according to the present invention, there is provided a method of using a release film comprising the steps of disposing the release film on an object and hot pressing the object to which the release film is disposed, In the above step of disposing the release film, the surface of the object to which the release film is disposed is formed of a material containing a thermosetting resin in a semi-hardened state.

根據本發明,可提供一種脫模薄膜,其抑制熱壓時形成脫模薄膜之脫模面的材料之官能基與形成配置該脫模薄膜之對象物表面的材料反應並交互作用,可獲得具有良好品質之成型品。 According to the present invention, it is possible to provide a release film which can inhibit the reaction of a functional group of a material which forms a release surface of a release film during hot pressing with a material which forms a surface of an object on which the release film is disposed, and can have Good quality molded products.

1、21‧‧‧脫模層 1, 21‧‧‧ release layer

2、22‧‧‧緩衝層 2, 22‧‧‧ buffer layer

3、23‧‧‧脫模層 3, 23‧‧‧ release layer

10、30‧‧‧脫模薄膜 10, 30‧‧‧ release film

圖1顯示本發明之第一實施形態的脫模薄膜之剖面圖。 Fig. 1 is a cross-sectional view showing a release film according to a first embodiment of the present invention.

圖2顯示本發明之第一實施形態的脫模薄膜之剖面圖。 Fig. 2 is a cross-sectional view showing a release film according to the first embodiment of the present invention.

圖3顯示本發明之第二實施形態的脫模薄膜之剖面圖。 Fig. 3 is a cross-sectional view showing a release film according to a second embodiment of the present invention.

圖4顯示本發明之第二實施形態的脫模薄膜之剖面圖。 Fig. 4 is a cross-sectional view showing a release film according to a second embodiment of the present invention.

(第一實施形態) (First embodiment)

以下針對本發明之第一實施形態,利用圖式加以說明。此外,在所有圖式中,對於相同構成要素附加相同符號,並且適當地省略說明。 Hereinafter, the first embodiment of the present invention will be described with reference to the drawings. In the drawings, the same components are denoted by the same reference numerals, and the description is omitted as appropriate.

<脫模薄膜> <release film>

本實施形態之脫模薄膜10係具有包含聚酯樹脂材料之脫模層1的脫模薄膜10,使用該脫模層1而藉由指示劑滴定法測得之末端羧酸量為小於40。藉此,可得到脫模薄膜10,其抑制熱壓時形成脫模薄膜10之脫模面的材料之官能基與形成配置該脫模薄膜10之對象物表面的材料反應並交互作用,可得到具有良好品質之成型品。 The release film 10 of the present embodiment has a release film 10 comprising a release layer 1 of a polyester resin material, and the amount of terminal carboxylic acid measured by an indicator titration method using the release layer 1 is less than 40. Thereby, the release film 10 can be obtained, which suppresses the reaction and interaction of the functional group of the material which forms the release surface of the release film 10 at the time of hot pressing with the material which forms the surface of the object which arrange|positions the said release film 10, and can obtain it. A molded product of good quality.

在本實施形態之脫模薄膜10中,脫模層1係在至少將該脫模薄膜10配置於對象物上時,形成接觸對象物之面(以下亦表示為「脫模面」)的樹脂層;聚酯樹脂係多元羧酸(二羧酸)與多元醇(二醇)之聚縮合物,為具有複數羧基(-COOH)之化合物。 In the release film 10 of the present embodiment, the release layer 1 is a resin which forms a surface of the object to be contacted (hereinafter also referred to as a "release surface") when at least the release film 10 is placed on the object. The polyester resin is a polycondensate of a polyvalent carboxylic acid (dicarboxylic acid) and a polyhydric alcohol (diol), and is a compound having a plurality of carboxyl groups (-COOH).

又,配置脫模薄膜10前之對象物表面通常係藉由包含半硬化狀態之熱硬化性樹脂的材料所形成。本實施形態之脫模薄膜10係配置於藉由包含上述半硬化狀態之熱硬化性樹脂的材料所形成之對象物表面上而使用。而且,藉由在於對象物表面配置該脫模薄膜10之狀態進行熱壓,可得到成型品。 Moreover, the surface of the object before the release film 10 is usually formed by a material containing a thermosetting resin in a semi-hardened state. The release film 10 of the present embodiment is used by being disposed on the surface of an object formed of a material containing the thermosetting resin in the semi-hardened state. Further, by performing hot pressing in a state in which the release film 10 is placed on the surface of the object, a molded article can be obtained.

當使用以往的脫模薄膜時,推測會發生以下之現象。 When a conventional release film is used, it is presumed that the following phenomenon occurs.

茲認為以往在熱壓時,在脫模薄膜中形成脫模面之材料中的羧基,會與覆蓋層薄膜黏著劑所具有之未反應的官能基反應並交互作用。這種未反應的官能基並未特別限定,例如以容易相互作用之官能基而言可列舉環氧基。 It is considered that in the conventional hot pressing, the carboxyl group in the material forming the release surface in the release film reacts with and interacts with the unreacted functional groups of the cover film adhesive. Such an unreacted functional group is not particularly limited, and examples thereof include an epoxy group which is a functional group which is easy to interact with.

以下舉出未反應的官能基為環氧基之情形為例進行說明。 Hereinafter, a case where the unreacted functional group is an epoxy group will be described as an example.

當使用專利文獻1~3等記載之以往的脫模薄膜時,於覆蓋層薄膜殘留脫模薄膜之一部分作為污染物之原因雖然尚未明朗,茲認為係如羧基之極性基與成形品之污染有關。 When the conventional release film described in Patent Documents 1 to 3 and the like is used, the reason why a part of the release film remains as a contaminant in the cover film is not clear, and it is considered that the polar group such as a carboxyl group is related to the contamination of the molded article. .

而且,使用專利文獻1~3等記載之以往的脫模薄膜之脫模層而藉由指示劑滴定法測得之末端羧酸量,係不同於本實施形態之脫模薄膜10的技術 水準。像這樣,當使用以往的脫模薄膜所包含之聚酯樹脂材料時,無法充分地抑制未反應的官能基與形成對象物表面之材料中的極性基(例如羧基)反應並交互作用。 Further, the amount of the terminal carboxylic acid measured by the indicator titration method using the release layer of the conventional release film described in Patent Documents 1 to 3, etc., is different from the technique of the release film 10 of the present embodiment. level. As described above, when the polyester resin material contained in the conventional release film is used, it is not possible to sufficiently prevent the unreacted functional group from reacting with and interacting with a polar group (for example, a carboxyl group) in the material forming the surface of the object.

相對於此,根據本實施形態之脫模薄膜10,使用該脫模薄膜10之脫模層1而藉由指示劑滴定法測得之末端羧酸量滿足上述特定條件,因此可抑制極微量的異物或脫模薄膜10之一部分附著於自熱壓所得之成型體剝離脫模薄膜10後之成型品表面,能得到防止成型品表面產生粗糙之程度的高度優異的脫模性。茲認為這係因為:藉由使用該脫模薄膜10之脫模層1而藉由指示劑滴定法測得之末端羧酸量呈現小於40之值的材料作為形成脫模面之材料,使得與存在於成型品表面之未反應的官能基反應並交互作用之羧基的量相較於以往有所減少。因此,相較於以往的脫模薄膜,本實施形態之脫模薄膜10可得到高度優異的脫模性。 On the other hand, according to the release film 10 of the present embodiment, the amount of the terminal carboxylic acid measured by the indicator titration method using the release layer 1 of the release film 10 satisfies the above specific conditions, so that a very small amount can be suppressed. A part of the foreign matter or the release film 10 is adhered to the surface of the molded article obtained by peeling the release film 10 from the molded body obtained by hot pressing, and it is possible to obtain a mold release property which is excellent in height to prevent the surface of the molded article from being rough. It is considered that this is because a material having a value of a terminal carboxylic acid having a value of less than 40 as measured by an indicator titration method by using the release layer 1 of the release film 10 is used as a material for forming a release surface, so that The amount of carboxyl groups which react with and react with unreacted functional groups present on the surface of the molded article is less than that of the prior art. Therefore, the release film 10 of the present embodiment can obtain a highly excellent mold release property as compared with the conventional release film.

此外,在熱壓後之成型品表面產生的粗糙係指成型品表面之一部分有起伏、成型品表面之一部分潰爛、成型品表面之形狀不光滑、變成粗糙狀態等。 Further, the roughness generated on the surface of the molded article after hot pressing means that one part of the surface of the molded article has undulations, one part of the surface of the molded article is festered, the shape of the surface of the molded article is not smooth, and the state is rough.

又,使用本實施形態之脫模薄膜10的脫模層1而藉由指示劑滴定法測得之末端羧酸量係以小於40為較佳、若為25以下則更佳。藉此,可抑制熱壓時形成脫模薄膜10之脫模面的材料之官能基與形成配置該脫模薄膜10之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 Further, the amount of the terminal carboxylic acid measured by the indicator titration method using the release layer 1 of the release film 10 of the present embodiment is preferably less than 40, more preferably 25 or less. Thereby, the functional group of the material which forms the release surface of the release film 10 at the time of hot pressing can be suppressed and reacted with the material which forms the surface of the object which arrange|positions the said release film 10, and the molded object of the favorable quality is obtained.

又,在本實施形態中聚酯樹脂材料並未特別限定,例如可列舉聚對苯二甲酸乙二酯樹脂、聚對苯二甲酸丁二酯樹脂、聚對苯二甲酸丙二酯樹脂、聚對苯二甲酸己二酯樹脂等聚對苯二甲酸烷二酯(polyalkylene terephthalate)樹脂。此等之中又以使用聚對苯二甲酸丁二酯樹脂為較佳。藉此,可抑制熱壓時形成脫模薄膜10之脫模面的材料之官能基與形成配置該脫模薄膜10之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 Further, the polyester resin material in the present embodiment is not particularly limited, and examples thereof include polyethylene terephthalate resin, polybutylene terephthalate resin, polytrimethylene terephthalate resin, and poly A polyalkylene terephthalate resin such as a hexylene phthalate resin. Among these, it is preferred to use a polybutylene terephthalate resin. Thereby, the functional group of the material which forms the release surface of the release film 10 at the time of hot pressing can be suppressed and reacted with the material which forms the surface of the object which arrange|positions the said release film 10, and the molded object of the favorable quality is obtained.

又,聚酯樹脂材料亦可因應需要而為共聚合了其它成分之聚酯系共聚物樹脂。作為共聚合之成分,可列舉眾所周知的酸成分、醇成分、酚成分或具有酯形成能力之此等之衍生物、聚伸烷二醇成分等。 Further, the polyester resin material may be a polyester-based copolymer resin in which other components are copolymerized as needed. Examples of the copolymerization component include a well-known acid component, an alcohol component, a phenol component, a derivative having such an ester forming ability, a polyalkylene glycol component, and the like.

又,作為可共聚合之酸成分,例如可列舉2價以上之碳數8~22的芳香族羧酸、2價以上之碳數4~12的脂肪族羧酸、進一步可列舉2價以上之碳數8~15的脂環式羧酸、及具有酯形成能力之此等之衍生物。作為上述可共聚合之酸成分的具體例,例如可列舉對苯二甲酸、間苯二甲酸、萘二羧酸、雙(對碳二苯基)甲烷蒽二羧酸、4-4'-二苯羧酸、1,2-雙(苯氧基)乙烷-4,4'-二羧酸、間苯二甲酸5-磺酸鈉、己二酸、癸二酸、壬二酸、十二烷二酸、馬來酸、苯均三酸、偏苯三酸、苯均四酸、1,3-環己二羧酸、1,4-環己二羧酸及具有酯形成能力之此等之衍生物。此等可單獨或併用2種以上來使用。 In addition, examples of the acid component which can be copolymerized include an aromatic carboxylic acid having a carbon number of 8 to 22 or more, a divalent or higher aliphatic carboxylic acid having 4 to 12 carbon atoms, and more preferably a divalent or higher valence. An alicyclic carboxylic acid having 8 to 15 carbon atoms and such a derivative having an ester forming ability. Specific examples of the above-mentioned copolymerizable acid component include terephthalic acid, isophthalic acid, naphthalene dicarboxylic acid, bis(p-carbodiphenyl)methane dicarboxylic acid, and 4-4'-di. Benzenecarboxylic acid, 1,2-bis(phenoxy)ethane-4,4'-dicarboxylic acid, sodium 5-sulfonate isophthalate, adipic acid, sebacic acid, sebacic acid, twelve Alkanoic acid, maleic acid, trimesic acid, trimellitic acid, pyromellitic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and ester forming ability a derivative. These may be used alone or in combination of two or more.

又,作為可共聚合之醇成分及/或酚成分,例如可列舉2價以上之碳數2~15的脂肪族醇、2價以上之碳數6~20的脂環式醇、碳數6~40的2價以上之芳香族醇、或酚及具有酯形成能力之此等之衍生物。作為上述可共聚合之醇成分及/或酚成分之具體例,可列舉乙二醇、丙二醇、丁二醇、己二醇、癸二醇、新戊二醇、環己二甲醇、環己二醇、2,2'-雙(4-羥苯基)丙烷、2,2'-雙(4-羥環己基)丙烷、氫醌、丙三醇、新戊四醇等化合物、及具有酯形成能力之此等之衍生物、ε-己內酯等環狀酯。 Further, examples of the copolymerizable alcohol component and/or the phenol component include a divalent or higher aliphatic alcohol having 2 to 15 carbon atoms, a divalent or higher aliphatic carbon number of 6 to 20 carbon atoms, and a carbon number of 6 ~40 of a divalent or higher aromatic alcohol, or a phenol and such a derivative having an ester forming ability. Specific examples of the copolymerizable alcohol component and/or phenol component include ethylene glycol, propylene glycol, butanediol, hexanediol, decanediol, neopentyl glycol, cyclohexanedimethanol, and cyclohexane. Alcohol, 2,2'-bis(4-hydroxyphenyl)propane, 2,2'-bis(4-hydroxycyclohexyl)propane, hydroquinone, glycerol, neopentyl alcohol, etc., and ester formation Such derivatives are such derivatives as cyclic esters such as ε-caprolactone.

作為可共聚合之聚伸烷二醇成分,例如可列舉聚乙二醇、聚丙二醇、聚四甲二醇、及此等之無規或嵌段共聚物、雙酚化合物之伸烷二醇(聚乙二醇、聚丙二醇、聚四甲二醇、及此等之無規或嵌段共聚物等)附加物等改性聚氧伸烷二醇等。 Examples of the copolymerizable polyalkylene glycol component include polyethylene glycol, polypropylene glycol, polytetramethylene glycol, and random or block copolymers thereof, and alkylene glycols of bisphenol compounds. Modified polyoxyalkylene glycol, etc., such as polyethylene glycol, polypropylene glycol, polytetramethylene glycol, and the like, such as random or block copolymers.

在這種聚酯系共聚物樹脂之中又以聚酯樹脂材料與聚伸烷二醇成分之共聚物為較佳、更具體為聚酯系樹脂與聚四甲二醇之共聚物、再更具體為聚對苯二甲酸丁二酯樹脂與聚四甲二醇之共聚物為較佳。藉此,即使在鍍敷附著性之觀點亦可得到優異之脫模薄膜10。 Among the polyester-based copolymer resins, a copolymer of a polyester resin material and a polyalkylene glycol component is preferred, more specifically a copolymer of a polyester resin and a polytetramethylene glycol, and further Specifically, a copolymer of polybutylene terephthalate resin and polytetramethylene glycol is preferred. Thereby, the release film 10 excellent in the viewpoint of plating adhesion can be obtained.

上述可共聚合之其它成分(尤其聚四甲二醇)的含量並未特別限定,以聚酯系共聚物樹脂全體之5重量%以上50重量%以下為較佳、以10重量%以上40重量%以下為特佳。當含量為上述下限值以上時,可提升該脫模薄膜10對於對象物之追隨性。又,當含量為上述上限值以下時,可進一步提升脫模性。 The content of the other copolymerizable component (particularly polytetramethylene glycol) is not particularly limited, and is preferably 5% by weight or more and 50% by weight or less based on the total amount of the polyester copolymer resin, and is preferably 10% by weight or more and 40% by weight. % below is especially good. When the content is at least the above lower limit value, the followability of the release film 10 to the object can be improved. Moreover, when the content is at most the above upper limit value, the mold release property can be further improved.

又,形成脫模面之材料,除了聚酯樹脂材料以外,亦可含有抗氧化劑、助滑劑、抗黏連劑(anti-blocking agent)、抗靜電劑、染料及顏料等著色劑、安定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。 Further, the material for forming the release surface may contain an antioxidant, a slip agent, an anti-blocking agent, an antistatic agent, a coloring agent such as a dye and a pigment, and a stabilizer, in addition to the polyester resin material. An impact filler such as an additive, a fluororesin or a silicone rubber, or an inorganic filler such as titanium oxide, calcium carbonate or talc.

又,在本實施形態之脫模薄膜10中,依據ASTM D2857於35℃所測定之脫模層1的固有黏度係以0.9以上1.5以下為較佳、若為1.0以上1.3以下則更佳。藉此,可得到能得到具有良好品質之成型品的脫模薄膜10。 Further, in the release film 10 of the present embodiment, the intrinsic viscosity of the release layer 1 measured at 35 ° C according to ASTM D2857 is preferably 0.9 or more and 1.5 or less, more preferably 1.0 or more and 1.3 or less. Thereby, the release film 10 which can obtain the molded article of the favorable quality can be obtained.

此外,專利文獻1~3等記載之以往的脫模薄膜依據ASTM D2857於35℃所測定之脫模層的固有黏度係不同於本實施形態之脫模薄膜10的技術水準。而且,當使用以往的脫模薄膜所包含之聚酯樹脂材料時,無法充分地抑制未反應的官能基與形成對象物表面之材料中的極性基(例如羧基)反應並交互作用。 Further, the conventional release film described in Patent Documents 1 to 3 and the like has an intrinsic viscosity of the release layer measured at 35 ° C according to ASTM D2857, which is different from the technical level of the release film 10 of the present embodiment. Moreover, when the polyester resin material contained in the conventional release film is used, it is not possible to sufficiently suppress the reaction and interaction of the unreacted functional group with a polar group (for example, a carboxyl group) in the material forming the surface of the object.

圖1及2係本實施形態之脫模薄膜10的剖面圖。 1 and 2 are cross-sectional views of the release film 10 of the present embodiment.

本實施形態之脫模薄膜10可為形成單層結構者,亦可為形成多層結構者。如圖1所示,當脫模薄膜10為形成單層結構者時,可簡化脫模薄膜10之製造步驟。相對於此,如圖2所示,若脫模薄膜10之層結構為多層結構,則可適當調節與對象物之脫模性或追隨性。 The release film 10 of the present embodiment may be formed into a single layer structure or may be formed into a multilayer structure. As shown in Fig. 1, when the release film 10 is formed into a single layer structure, the manufacturing steps of the release film 10 can be simplified. On the other hand, as shown in FIG. 2, when the layer structure of the mold release film 10 is a multilayer structure, the mold release property or the followability with respect to an object can be adjusted suitably.

以下,作為本實施形態之脫模薄膜10,舉出圖2所示之形成多層結構者為例進行說明。 Hereinafter, as the release film 10 of the present embodiment, a case where the multilayer structure shown in FIG. 2 is formed will be described as an example.

如圖2所示,本實施形態之脫模薄膜10係脫模層1、緩衝層2、與脫模層3依此順序積層。以下依序說明各層。 As shown in Fig. 2, in the release film 10 of the present embodiment, the release layer 1, the buffer layer 2, and the release layer 3 are laminated in this order. The layers are described in order below.

首先,脫模層1係保持與成型品表面之脫模性者。又,亦具備因應配置該脫模薄膜10之對象物的形狀而追隨脫模層1之圖案追隨性功能。此外,脫模層1係形成脫模面之層,其藉由聚酯樹脂材料所形成。 First, the release layer 1 is one that retains the release property from the surface of the molded article. Further, the pattern following function of the release layer 1 is followed by the shape of the object to which the release film 10 is placed. Further, the release layer 1 is a layer which forms a release surface, which is formed by a polyester resin material.

又,作為形成脫模層1之方法,例如可列舉空冷或水冷充氣擠製法、T模擠製法等眾所周知的方法。 Moreover, as a method of forming the mold release layer 1, for example, a well-known method such as an air-cooling or water-cooling gas-filling method or a T-die extrusion method can be mentioned.

脫模層1之厚度並未特別限定,以5μm以上40μm以下為較佳、若為7μm以上20μm以下則更佳。若脫模層1之厚度為上述範圍內,則可提升對於成型品之填埋能力。 The thickness of the mold release layer 1 is not particularly limited, and is preferably 5 μm or more and 40 μm or less, and more preferably 7 μm or more and 20 μm or less. If the thickness of the release layer 1 is within the above range, the filling ability for the molded article can be improved.

又,脫模層1之例如180℃之黏彈性模數並未特別限定,以10MPa以上200MPa以下為較佳、若為30MPa以上150MPa以下則更佳。當脫模層1之黏彈性模數為上述下限值以上時,可抑制該脫模薄膜10之脫模性降低。又,當脫模層1之黏彈性模數為上述上限值以下時,可抑制該脫模薄膜10之填埋能力降低。 Further, the modulus of elasticity of the release layer 1 at, for example, 180 ° C is not particularly limited, and is preferably 10 MPa or more and 200 MPa or less, and more preferably 30 MPa or more and 150 MPa or less. When the number of viscoelastic modulus of the release layer 1 is at least the above lower limit value, the release property of the release film 10 can be suppressed from being lowered. Moreover, when the viscoelastic modulus of the release layer 1 is at most the above upper limit value, the decrease in the filling ability of the release film 10 can be suppressed.

此外,脫模層1之黏彈性模數例如可藉由以動態黏彈性測定裝置於拉伸模式、頻率1Hz、以升溫速度5℃/min自常溫至250℃進行測定來評價。 Further, the viscoelastic modulus of the release layer 1 can be evaluated, for example, by measuring the dynamic viscoelasticity measuring apparatus in a tensile mode at a frequency of 1 Hz and at a temperature elevation rate of 5 ° C/min from a normal temperature to 250 ° C.

其次,緩衝層2具備用以埋入與該脫模薄膜10之脫模層1鄰接的對象物表面間隙之緩衝功能。又,藉由作成具有緩衝層2之脫模薄膜10,可在熱壓時使施加於配置有脫模薄膜10之對象物全體的壓力均一化。再者,當製造可撓性電路基板時,可作成外觀完成度(尤其是降低皺紋的產生)優異者。 Next, the buffer layer 2 is provided with a buffering function for embedding a surface gap of an object adjacent to the release layer 1 of the release film 10. Moreover, by forming the release film 10 having the buffer layer 2, the pressure applied to the entire object on which the release film 10 is placed can be made uniform during hot pressing. Further, when manufacturing a flexible circuit board, it is excellent in the degree of appearance completion (especially, generation of wrinkles).

又,緩衝層2係藉由不同於聚酯樹脂材料之第2樹脂所形成。此時, 作為第2樹脂,可列舉組成不同於形成脫模層1之聚酯樹脂材料的聚酯樹脂材料或聚酯樹脂材料以外之種類的樹脂等。此等之中又以形成上述脫模層1之聚酯樹脂材料以外的樹脂為較佳。 Further, the buffer layer 2 is formed of a second resin different from the polyester resin material. at this time, The second resin may be a resin other than the polyester resin material or the polyester resin material having a composition different from the polyester resin material forming the release layer 1 . Among these, a resin other than the polyester resin material forming the release layer 1 is preferable.

在此,作為形成脫模層1之聚酯樹脂材料以外的樹脂,例如可列舉聚乙烯、聚丙烯等α烯烴系聚合物;具有乙烯、丙烯、丁烯、戊烯、己烯、甲基戊烯等作為共聚物成分之α烯烴系共聚物;聚醚碸、聚苯硫醚等工程塑膠系樹脂;此等可單獨或亦可併用複數。此等之中又以α烯烴系共聚物為較佳。具體而言可列舉乙烯等α烯烴與(甲基)丙烯酸酯之共聚物、乙烯與乙酸乙烯酯之共聚物、乙烯與(甲基)丙烯酸之共聚物、以及此等之部分離子交聯物等。 Here, examples of the resin other than the polyester resin material forming the release layer 1 include an α-olefin polymer such as polyethylene or polypropylene; and ethylene, propylene, butene, pentene, hexene, and methyl pentane. An alpha olefin copolymer which is a copolymer component such as a olefin; an engineering plastic resin such as polyether oxime or polyphenylene sulfide; these may be used singly or in combination. Among these, an α-olefin copolymer is preferred. Specific examples thereof include a copolymer of an α-olefin such as ethylene and a (meth)acrylate, a copolymer of ethylene and vinyl acetate, a copolymer of ethylene and (meth)acrylic acid, and a part of the ionomers thereof. .

這種第2樹脂之中尤其又以第2樹脂之硬化物的例如於90℃之彈性模數為10MPa以下者為較佳、2MPa以上8MPa以下者為特佳。若第2樹脂之硬化物的彈性模數為上述範圍內,則尤其當製造可撓性電路時,可作成緩衝功能優異之脫模薄膜10。 In particular, in the second resin, for example, a cured modulus of the second resin is preferably 10 MPa or less, and preferably 2 MPa or more and 8 MPa or less. When the elastic modulus of the cured product of the second resin is within the above range, the release film 10 having excellent cushioning function can be obtained particularly when a flexible circuit is produced.

此外,彈性模數係例如可藉由以動態黏彈性測定裝置於拉伸模式、頻率1Hz、升溫速度5℃/min自常溫至250℃進行測定來評價。 Further, the elastic modulus can be evaluated, for example, by measuring with a dynamic viscoelasticity measuring apparatus in a stretching mode, a frequency of 1 Hz, and a temperature rising rate of 5 ° C/min from a normal temperature to 250 ° C.

又,為了進一步提升緩衝性,緩衝層2除了第2樹脂以外亦可包含橡膠成分。 Moreover, in order to further improve the cushioning property, the buffer layer 2 may contain a rubber component in addition to the second resin.

作為橡膠成分,例如可列舉苯乙烯-丁二烯共聚物、苯乙烯-異戊二烯共聚物等苯乙烯系熱塑性彈性體、烯烴系熱塑性彈性體、醯胺系彈性體、聚酯系彈性體等熱塑性彈性體材料;天然橡膠、異戊二烯橡膠、氯丁二烯橡膠、矽氧橡膠等橡膠材料等。 Examples of the rubber component include a styrene-based thermoplastic elastomer such as a styrene-butadiene copolymer or a styrene-isoprene copolymer, an olefin-based thermoplastic elastomer, a guanamine-based elastomer, and a polyester-based elastomer. Thermoplastic elastomer materials; rubber materials such as natural rubber, isoprene rubber, chloroprene rubber, and silicone rubber.

又,緩衝層2中之橡膠成分的含量並未特別限定,以相對於第2樹脂100重量份而言為5重量份以上50重量份以下為較佳、若為10重量份以上40重量份以下則更佳。若緩衝層2中之橡膠成分的含量為上述範圍內,則 可作成緩衝性更為優異之脫模薄膜10。 In addition, the content of the rubber component in the buffer layer 2 is not particularly limited, and is preferably 5 parts by weight or more and 50 parts by weight or less based on 100 parts by weight of the second resin, and more preferably 10 parts by weight or more and 40 parts by weight or less. It is better. If the content of the rubber component in the buffer layer 2 is within the above range, A release film 10 having more excellent cushioning properties can be obtained.

又,緩衝層2除了第2樹脂以外,亦可含有抗氧化劑、助滑劑、抗黏連劑、抗靜電劑、染料及顏料等著色劑、安定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。 Further, the buffer layer 2 may contain an antioxidant, a slip agent, an anti-blocking agent, an antistatic agent, a coloring agent such as a dye or a pigment, an additive such as a stabilizer, a fluororesin, a silicone rubber, or the like in addition to the second resin. An inorganic filler such as an impact imparting agent, titanium oxide, calcium carbonate or talc.

此外,作為形成緩衝層2之方法,例如可列舉空冷或水冷充氣擠製法、T模擠製法等眾所周知的方法。 Further, as a method of forming the buffer layer 2, for example, a well-known method such as an air-cooling or water-cooling gas-filling method or a T-die extrusion method can be mentioned.

又,緩衝層2之厚度並未特別限定,以30μm以上100μm以下為較佳、若為50μ以上70μm以下則更佳。當緩衝層2之厚度為上述下限值以上時,可抑制脫模薄膜10之緩衝性降低。當緩衝層2之厚度為上述上限值以下時,可抑制脫模性降低。 Further, the thickness of the buffer layer 2 is not particularly limited, and is preferably 30 μm or more and 100 μm or less, and more preferably 50 μm or more and 70 μm or less. When the thickness of the buffer layer 2 is at least the above lower limit value, the cushioning property of the release film 10 can be suppressed from being lowered. When the thickness of the buffer layer 2 is at most the above upper limit value, the decrease in mold release property can be suppressed.

又,緩衝層2之軟化溫度並未特別限定,以80℃以上150℃以下為較佳、尤其若為90℃以上140℃以下則更佳。若緩衝層2之軟化溫度為上述範圍內,則可作成緩衝性更為優異之脫模薄膜10。 Further, the softening temperature of the buffer layer 2 is not particularly limited, and is preferably 80° C. or higher and 150° C. or lower, and particularly preferably 90° C. or higher and 140° C. or lower. When the softening temperature of the buffer layer 2 is within the above range, the release film 10 having more excellent cushioning properties can be obtained.

脫模層3係保持與在熱壓等成型時所使用之加強板的脫模性。 The release layer 3 maintains the releasability of the reinforcing sheet used in molding at the time of hot pressing or the like.

脫模層3係以軟化點高於第2樹脂之第3樹脂所構成。藉此,可更進一步提升與加強板之脫模性。 The release layer 3 is composed of a third resin having a softening point higher than that of the second resin. Thereby, the release property of the reinforcing plate can be further improved.

作為第3樹脂,例如可列舉4-甲基-1-戊烯樹脂、4-甲基-1-戊烯、與其它α-烯烴例如乙烯、丙烯、1-丁烯、1-己烯、1-辛烯、1-癸烯、1-十四烯、1-十八烯等碳數2~20之α-烯烴之共聚物、聚丙烯等烯烴系樹脂、與脫模層1所用相同之聚酯系樹脂等。 Examples of the third resin include 4-methyl-1-pentene resin, 4-methyl-1-pentene, and other α-olefins such as ethylene, propylene, 1-butene, and 1-hexene. a copolymer of a carbon number of 2 to 20 such as octene, 1-decene, 1-tetradecene or 1-octadecene, or an olefin-based resin such as polypropylene, and the same polymerization as that used for the release layer 1. Ester resin or the like.

又,第3樹脂與形成脫模層1之聚酯樹脂材料可相同亦可不同,而以相同為較佳。藉此,可以無表裏之分地使用脫模薄膜10,因此可以避免脫模薄膜10表裏面的誤用。 Further, the third resin may be the same as or different from the polyester resin material forming the release layer 1, and the same is preferable. Thereby, the release film 10 can be used without any distinction, so that misuse of the inside of the release film 10 can be avoided.

又,第3樹脂之軟化點並未特別限定,以100℃以上為較佳、尤其若為120℃以上則更佳。藉此,除了脫模性以外,更可減少起因於第3樹脂之揮發成分或第3樹脂附著於以SUS板等所構成之加強板。 Further, the softening point of the third resin is not particularly limited, and is preferably 100 ° C or more, more preferably 120 ° C or more. Thereby, in addition to the mold release property, the volatilization component of the third resin or the third resin adheres to the reinforcing plate made of a SUS plate or the like can be reduced.

又,脫模層3除了第3樹脂以外,亦可含有抗氧化劑、助滑劑、抗黏連劑、抗靜電劑、染料及顏料等著色劑、安定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。 Further, the release layer 3 may contain, in addition to the third resin, an antioxidant, a slip agent, an anti-blocking agent, an antistatic agent, a coloring agent such as a dye or a pigment, an additive such as a stabilizer, a fluororesin, a silicone rubber, or the like. An impact filler, an inorganic filler such as titanium oxide, calcium carbonate or talc.

此外,作為形成脫模層3之方法,例如可列舉空冷或水冷充氣擠製法、T模擠製法等眾所周知的方法。 Further, as a method of forming the release layer 3, for example, a well-known method such as an air-cooling or water-cooling aeration extrusion method or a T-die extrusion method can be mentioned.

又,脫模層3之厚度並未特別限定,若為5μm以上60μm以下則更佳。當脫模層3之厚度為上述下限值以上時,在熱壓時脫模薄膜10全體成為剛性物,提升脫模性。又,當脫模層3之厚度為上述上限值以下時,脫模薄膜10之成膜性成為適宜者。 Further, the thickness of the release layer 3 is not particularly limited, and is preferably 5 μm or more and 60 μm or less. When the thickness of the mold release layer 3 is at least the above lower limit value, the entire release film 10 becomes a rigid material during hot pressing, and the mold release property is improved. Moreover, when the thickness of the mold release layer 3 is less than or equal to the above upper limit value, the film formability of the release film 10 is suitable.

本實施形態之脫模薄膜10係以形成脫模層1/緩衝層2/脫模層3之三層結構而成者為較佳。 The release film 10 of the present embodiment is preferably formed by a three-layer structure in which the release layer 1 / the buffer layer 2 / the release layer 3 are formed.

又,本實施形態之脫模薄膜10雖然呈現脫模層1、緩衝層2及脫模層3之以3層所構成者,惟本發明並不限定於此,亦可為具有黏著層、阻氣層等之4層、5層等4層以上之構成。 Further, the release film 10 of the present embodiment has three layers of the release layer 1, the buffer layer 2, and the release layer 3, but the present invention is not limited thereto, and may have an adhesive layer or a resist. Four or more layers, such as a gas layer, and the like, are composed of four or more layers.

又,本實施形態之脫模薄膜10並未特別限定,可配置於由上鑄模及下鑄模所構成之鑄模內部,亦可配置於覆蓋層薄膜上或覆銅積層板上。此等之中,又以配置於覆蓋層薄膜上或覆銅積層板上之情形,可充分發揮本實施形態之脫模薄膜10的脫模性。 Further, the release film 10 of the present embodiment is not particularly limited, and may be disposed inside a mold composed of an upper mold and a lower mold, or may be disposed on a cover film or a copper clad laminate. Among these, in the case of being disposed on the cover film or on the copper clad laminate, the release property of the release film 10 of the present embodiment can be sufficiently exhibited.

作為本實施形態之對象物,可列舉覆蓋層薄膜或覆銅積層板等。該對象物係藉由至少包含熱壓前之表面為半硬化狀態之熱硬化性樹脂的材料所 形成者。又,作為熱硬化性樹脂,例如可列舉環氧樹脂等。 Examples of the object of the embodiment include a cover film or a copper-clad laminate. The object is made of a material containing at least a thermosetting resin whose surface is semi-hardened before hot pressing. Former. Moreover, as a thermosetting resin, an epoxy resin etc. are mentioned, for example.

<脫模薄膜之製造方法> <Method of Manufacturing Release Film>

本實施形態之脫模薄膜10,可利用分別製造這種脫模層1、緩衝層2、與脫模層3之後藉由層合機等來接合而得到脫模薄膜10,而以將脫模層1、緩衝層2、與脫模層3利用例如空冷式或水冷式共擠製充氣法、共擠製T模法來成膜之方法以得到脫模薄膜10之方法為較佳。其中從可優異地控制各層之厚度的觀點來看,又以利用共擠製T模法來成膜之方法為特佳。 The release film 10 of the present embodiment can be obtained by separately producing the release layer 1, the buffer layer 2, and the release layer 3, and then joining them by a laminator or the like to obtain a release film 10, thereby releasing the release film 10. The layer 1, the buffer layer 2, and the release layer 3 are preferably formed by a method such as air-cooling or water-cooling co-extrusion aeration or co-extrusion T-die to form a release film 10. Among them, from the viewpoint of excellent control of the thickness of each layer, a method of forming a film by a co-extrusion T-die method is particularly preferable.

又,脫模層1、緩衝層2、與脫模層3可直接接合,亦可隔著黏著層而接合。 Further, the release layer 1, the buffer layer 2, and the release layer 3 may be directly joined or joined together via an adhesive layer.

以往係使用例如在熔融狀態進行聚縮合反應所得之聚酯樹脂來製作脫模薄膜。像這樣使用聚縮合所得之聚酯樹脂材料來製作脫模薄膜一事本身,亦有在先前技術中施行。 Conventionally, a release film has been produced by using, for example, a polyester resin obtained by performing a polycondensation reaction in a molten state. The use of the polyester resin material obtained by polycondensation to produce a release film as such is also carried out in the prior art.

相對於此,在本實施形態之脫模薄膜10中形成脫模面之脫模層1及/或脫模層3並非使用以往的聚縮合反應所得之聚酯樹脂材料,而是使用例如固相聚合所得之聚酯樹脂材料來製作。 On the other hand, in the release film 10 of the present embodiment, the release layer 1 and/or the release layer 3 which form the release surface are not using the polyester resin material obtained by the conventional polycondensation reaction, but using, for example, a solid phase. It is produced by polymerizing the obtained polyester resin material.

本實施形態之脫模薄膜10,為了將使用脫模層1藉由指示劑滴定法測得之末端羧酸量控制在小於40,係藉由控制固相聚合反應所用之聚合觸媒的種類、反應溫度、反應時間等反應條件方可得到。為了將本實施形態之脫模薄膜10作成可抑制熱壓時形成脫模薄膜10之脫模面的材料之官能基與形成配置該脫模薄膜10之對象物表面的材料反應並交互作用,得到具有良好品質之成型品者,控制此等因子為格外重要。 In the release film 10 of the present embodiment, in order to control the amount of the terminal carboxylic acid measured by the indicator titration method using the release layer 1 to less than 40, the type of the polymerization catalyst used for controlling the solid phase polymerization reaction is The reaction conditions such as the reaction temperature and the reaction time can be obtained. In order to prevent the functional group of the material for forming the release surface of the release film 10 during hot pressing from reacting with the material forming the surface of the object on which the release film 10 is disposed, and interacting with each other, the release film 10 of the present embodiment is obtained. Controlling these factors is especially important for molded products of good quality.

<脫模薄膜之使用方法> <How to use the release film>

接著,針對本實施形態之脫模薄膜10之使用方法進行說明。 Next, a method of using the release film 10 of the present embodiment will be described.

首先,在藉由包含半硬化狀態之熱硬化性樹脂的材料所形成之對象物的表面配置上述本實施形態之脫模薄膜10。然後,在鑄模內對於配置有脫模薄膜10之對象物進行熱壓。藉此,可抑制脫模薄膜10中未反應的官能 基、與形成對象物表面之材料中的極性基(例如羧基)反應並交互作用。藉此,可抑制極微量的異物或脫模薄膜10之一部分附著於自熱壓所得之成型體剝離脫模薄膜10後之成型品表面,防止成型品表面產生粗糙,因此可抑制熱壓時形成脫模薄膜10之脫模面的材料之官能基與形成配置該脫模薄膜10之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 First, the release film 10 of the present embodiment described above is placed on the surface of an object formed of a material containing a thermosetting resin in a semi-hardened state. Then, the object on which the release film 10 is placed is hot-pressed in the mold. Thereby, unreacted functionalities in the release film 10 can be suppressed. The base reacts with and interacts with a polar group (for example, a carboxyl group) in the material forming the surface of the object. Thereby, it is possible to suppress the adhesion of a very small amount of foreign matter or a part of the release film 10 to the surface of the molded article after peeling off the release film 10 from the molded body obtained by hot pressing, thereby preventing the surface of the molded article from being rough, thereby suppressing formation at the time of hot pressing. The functional group of the material of the release surface of the release film 10 reacts with and interacts with the material forming the surface of the object on which the release film 10 is disposed, thereby obtaining a molded article having good quality.

以上針對本發明之實施形態進行陳述,惟此等係本發明之例示,亦可採用上述以外之各種構成。 The embodiments of the present invention have been described above, but other embodiments than the above may be employed as exemplified by the present invention.

【實施例】 [Examples]

以下藉由實施例及比較例說明本發明,惟本發明並不限定於此等。此外,本實施例係舉出以下圖2所示之由三層結構所構成之脫模薄膜10為例進行說明。 Hereinafter, the present invention will be described by way of examples and comparative examples, but the invention is not limited thereto. Further, in the present embodiment, a release film 10 composed of a three-layer structure shown in Fig. 2 will be described as an example.

<脫模薄膜之製造> <Manufacture of release film> (實施例1) (Example 1)

1.聚酯樹脂材料之製造 1. Manufacture of polyester resin materials

使用2-(4’-羥丁氧基)四氫呋喃(以下表示為「HTHF」)之含量相對於1,4-丁二醇(以下表示為「BG」)為0.4重量%之BG 1104g、乙酸之含量相對於對苯二甲酸(以下表示為「TPA」)為0.14重量%之TPA 1132g(BG/TPA莫耳比1.8)而進行酯化反應,接著進行聚縮合反應。 The content of 2-(4'-hydroxybutoxy)tetrahydrofuran (hereinafter referred to as "HTHF") was 0.44% by weight based on 1,4-butanediol (hereinafter referred to as "BG"). The content was subjected to an esterification reaction with respect to terephthalic acid (hereinafter referred to as "TPA") of 0.14% by weight of TPA 1132 g (BG/TPA molar ratio of 1.8), followed by a polycondensation reaction.

首先,將TPA總量、BG 750g、鈦酸四丁酯0.8g、單丁基羥基氧化錫0.7g投入附有精餾塔之反應器,在190℃、400mmHg之條件下開始酯化反應後,在徐徐升溫的同時,連續地添加殘餘的BG。 First, a total amount of TPA, BG 750 g, 0.8 g of tetrabutyl titanate, and 0.7 g of monobutyl hydroxytin oxide were placed in a reactor equipped with a rectification column, and after starting the esterification reaction at 190 ° C and 400 mmHg, The residual BG was continuously added while slowly heating up.

於該反應物添加鈦酸四丁酯0.08g、磷酸0.01g,於250℃、0.5mmHg進行聚縮合反應。 0.08 g of tetrabutyl titanate and 0.01 g of phosphoric acid were added to the reactant, and a polycondensation reaction was carried out at 250 ° C and 0.5 mmHg.

將生成之聚合物的細粒狀物投入旋轉式反應容器,在190℃、0.5mmHg的減壓下進行8小時固相聚合,得到高聚合度聚對苯二甲酸丁二酯(以下表示為PBT)。 The fine particles of the produced polymer were placed in a rotary reaction vessel, and subjected to solid phase polymerization at 190 ° C under a reduced pressure of 0.5 mmHg for 8 hours to obtain a high polymerization degree polybutylene terephthalate (hereinafter referred to as PBT). ).

2.脫模薄膜之製造 2. Manufacture of release film

藉由熱壓來製造包含由藉由上述方法所製造之PBT所構成之脫模層1、由聚丙烯、改性聚乙烯及藉由上述方法所製造之PBT所構成之緩衝層2、與由藉由上述方法所製造之PBT所構成之脫模層3的3層之脫模薄膜。脫模層1及脫模層3之PBT的末端羧酸量(AV值)均為24.0。 A buffer layer 2 comprising a release layer composed of PBT manufactured by the above method, a polypropylene layer, a modified polyethylene, and a PBT manufactured by the above method is produced by hot pressing. A three-layer release film of the release layer 3 composed of PBT produced by the above method. The amount of terminal carboxylic acid (AV value) of the PBT of the release layer 1 and the release layer 3 was 24.0.

又,緩衝層2係使用以下材料所形成。 Further, the buffer layer 2 is formed using the following materials.

聚丙烯:住友化學公司製、FH1016 Polypropylene: Sumitomo Chemical Co., Ltd., FH1016

改性聚乙烯:乙烯-甲基丙烯酸甲酯共聚物(住友化學公司製、WD106)與酸改性聚乙烯(三菱化學公司製、F515A) Modified polyethylene: ethylene-methyl methacrylate copolymer (made by Sumitomo Chemical Co., Ltd., WD106) and acid-modified polyethylene (Mitsubishi Chemical Co., Ltd., F515A)

PBT:使用與脫模層所用之PBT相同者。 PBT: The same as the PBT used for the release layer.

然後,以摻合比例成為聚丙烯:乙烯-甲基丙烯酸甲酯共聚物:酸改性聚乙烯:PBT=15:30:40:15之比例的方式進行混合。又,所得之脫模薄膜的各層厚度係脫模層1:30μm、緩衝層2:60μm、脫模層3:30μm。 Then, mixing was carried out in such a manner that the blending ratio became a ratio of polypropylene:ethylene-methyl methacrylate copolymer: acid-modified polyethylene: PBT = 15:30:40:15. Further, the thickness of each layer of the obtained release film was 1:30 μm for the release layer, 60 μm for the buffer layer 2, and 30 μm for the release layer.

(實施例2) (Example 2)

除了以將脫模層1及脫模層3之PBT的AV值成為18.7的方式變更固相聚合反應相關之反應條件以外,以與實施例1相同的方法製作脫模薄膜,進行評價。 A release film was produced and evaluated in the same manner as in Example 1 except that the reaction conditions related to the solid phase polymerization reaction were changed so that the AV value of the PBT of the release layer 1 and the release layer 3 was 18.7.

(實施例3) (Example 3)

除了以將脫模層1及脫模層3之PBT的AV值成為14.3的方式變更固相聚合反應相關之反應條件以外,以與實施例1相同的方法製作脫模薄膜,進行評價。 A release film was produced and evaluated in the same manner as in Example 1 except that the reaction conditions related to the solid phase polymerization reaction were changed so that the AV value of the PBT of the release layer 1 and the release layer 3 was 14.3.

(實施例4) (Example 4)

除了以將脫模層1及脫模層3之PBT的AV值成為28.1的方式變更固相聚合反應相關之反應條件以外,以與實施例1相同的方法製作脫模薄膜,進行評價。 A release film was produced and evaluated in the same manner as in Example 1 except that the reaction conditions related to the solid phase polymerization reaction were changed so that the AV value of the PBT of the release layer 1 and the release layer 3 was 28.1.

(比較例1) (Comparative Example 1)

除了在脫模層1及脫模層3使用AV值為45.0之PBT(東麗公司製、TORAYCON商品編號1100M)以外,以與實施例1相同的方法製作脫模薄膜,進行評價。 A release film was produced and evaluated in the same manner as in Example 1 except that PBT (manufactured by Toray Industries, Inc., TORAYCON product number: 1100 M) having an AV value of 45.0 was used for the release layer 1 and the release layer 3.

以下針對關於上述實施例1~4及比較例1所進行之測定方法及評價方法進行詳細說明。 The measurement methods and evaluation methods performed in the above Examples 1 to 4 and Comparative Example 1 will be described in detail below.

<評價項目> <evaluation item>

末端羧酸量(AV值):藉由指示劑滴定法所測定。具體而言係使用藉由以下方法所調整之試料,由下述式(A)算出。 The amount of terminal carboxylic acid (AV value): determined by indicator titration. Specifically, the sample adjusted by the following method was used and calculated from the following formula (A).

(1)測定試料之調配 (1) Measurement of the preparation of samples

首先,將所得之脫模層1約2g秤量於100mL瓶。接著,於瓶中注入鄰甲酚50mL。然後,在該瓶內投入攪拌子,於100±5℃加熱攪拌約30分鐘直到脫模層完全溶解為止。脫模層熔融後,載置直到瓶內的溶液溫度成為30℃為止。接著,添加0.01mol/L之氯化鉀溶液3mL,以0.05mol/L之乙醇性氫氧化鉀溶液滴定。 First, about 2 g of the obtained release layer 1 was weighed into a 100 mL bottle. Next, 50 mL of o-cresol was injected into the bottle. Then, a stir bar was placed in the bottle, and the mixture was heated and stirred at 100 ± 5 ° C for about 30 minutes until the release layer was completely dissolved. After the release layer was melted, it was placed until the temperature of the solution in the bottle became 30 °C. Next, 3 mL of a 0.01 mol/L potassium chloride solution was added, and the mixture was titrated with a 0.05 mol/L ethanolic potassium hydroxide solution.

(2)標準試料之評價 (2) Evaluation of standard samples

首先,將鄰甲酚50mL秤量於100mL燒瓶。接著,在該100mL燒瓶內投入攪拌子,添加0.01mol/L之氯化鉀溶液3mL。使用與測定試料所用之電極相同者來進行標準試料之滴定。 First, 50 mL of o-cresol was weighed into a 100 mL flask. Next, a stir bar was placed in the 100 mL flask, and 3 mL of a 0.01 mol/L potassium chloride solution was added. The titration of the standard sample was carried out using the same electrode as that used for the measurement of the sample.

(3)AV值之計算 (3) Calculation of AV value

藉由以下之式(A)算出。此外,計算結果係以meq COOH/kg來表示。 It is calculated by the following formula (A). In addition, the calculation results are expressed in meq COOH/kg.

式(A):末端羧酸量={(對於測定試料所滴下之KOH量[mL]-對於標準試料所滴下之KOH量[mL])×KOH之規定數×1000}/測定試料之重量[g] Formula (A): The amount of terminal carboxylic acid = {(the amount of KOH dropped in the measurement sample [mL] - the amount of KOH dropped on the standard sample [mL]) × the specified number of KOH × 1000} / the weight of the measured sample [ g]

固有黏度(IV值):依據ASTM D2857於35℃所測定。具體而言係使用藉由以下方法所調整之試料,由下述式(B)算出。 Intrinsic viscosity (IV value): determined at 35 ° C according to ASTM D2857. Specifically, the sample adjusted by the following method was used and calculated from the following formula (B).

(1)測定試料之調配 (1) Measurement of the preparation of samples

首先,將所得之脫模層約3~5g投入100mL燒杯後,於燒杯內注入丙 酮。之後,使用烘箱使燒杯內的試料於105℃乾燥30分鐘。接著,於100mL瓶,以小數點以下4位的精度量取0.45~0.5g之乾燥聚合物。接著,使用自動測定器,以使精度成為±0.01mL的方式,將每單位體積之脫模層重量稀釋100倍。之後,將脫模層移至瓶中,使用密合墊片(gasket)將瓶密閉。接著,在攪拌直到脫模層完全熔融的同時,於110℃使瓶加熱約60~75分鐘。然後,將所得之瓶自恆溫槽取出,載置於冷卻槽。 First, about 3~5g of the obtained release layer is put into a 100mL beaker, and then injected into the beaker. ketone. Thereafter, the sample in the beaker was dried at 105 ° C for 30 minutes using an oven. Next, in a 100 mL bottle, 0.45 to 0.5 g of the dried polymer was measured in an accuracy of 4 points below the decimal point. Next, the weight of the release layer per unit volume was diluted 100 times using an automatic measuring device so that the accuracy was ±0.01 mL. Thereafter, the release layer was transferred to the bottle, and the bottle was sealed with a gasket. Next, the bottle was heated at 110 ° C for about 60 to 75 minutes while stirring until the release layer was completely melted. Then, the obtained bottle was taken out from the constant temperature bath and placed in a cooling bath.

(2)測定 (2) Determination

首先,將使用量瓶所量取的18mL之溶劑注入黏度計的管狀構件,以洗淨管狀構件內部。然後,在將黏度計的管狀部材設定為35℃+0.1℃起10分後,將聚合物溶液3次注入黏度計。接著,利用幫浦使黏度計內成為真空,在配置於管狀構件上部之容器內吸引溶液。之後,解除黏度計內之真空狀態,利用計時器測定溶媒通過管狀構件內之2處之間的時間。進行4次該測定,算出平均值。此外,在本測定中係使用自動黏度計(SCHOTT AVS-500)。 First, 18 mL of the solvent measured using the measuring flask was injected into the tubular member of the viscometer to wash the inside of the tubular member. Then, after setting the tubular member of the viscometer to 35 ° C + 0.1 ° C for 10 minutes, the polymer solution was injected into the viscometer three times. Next, the inside of the viscometer was vacuumed by a pump, and the solution was sucked in the container disposed in the upper portion of the tubular member. Thereafter, the vacuum state in the viscometer was released, and the time between the passage of the solvent in the tubular member was measured by a timer. This measurement was performed four times, and the average value was calculated. In addition, an automatic viscometer (SCHOTT AVS-500) was used in this measurement.

(3)IV值之計算 (3) Calculation of IV value

使用於30℃之酚/四氯乙烷比為3:2之35℃的鄰氯酚作為標準試料。本實施例中之IV值係藉由以下之式(B)算出。 An o-chlorophenol having a phenol/tetrachloroethane ratio of 3:2 at 35 ° C at 30 ° C was used as a standard sample. The IV value in the present embodiment is calculated by the following formula (B).

式(B):IV值={(測定試料之流通時間/標準試料之流通時間)-1}×0.7789+0.111 Formula (B): IV value = {(measurement flow time of sample / circulation time of standard sample) - 1} × 0.7789 + 0.111

脫模性:在脫模薄膜之脫模面貼合有澤製作所公司製的CL(CM型)之黏著劑面,以195℃×2分×6MPa進行熱壓,利用拉伸試驗機(A&D公司製Force gauge AD-4932A-50N),以於180°方向約1000mm/分之速度,測定脫模面與CL黏著劑間之剝離力。測定係在按壓之後立刻實施,基於以下基準來評價脫模性。 Mold release property: The adhesive surface of CL (CM type) manufactured by Zesho Co., Ltd. was bonded to the release surface of the release film, and hot pressed at 195 ° C × 2 min × 6 MPa, and a tensile tester (manufactured by A&D Co., Ltd.) was used. Force gauge AD-4932A-50N), the peeling force between the release surface and the CL adhesive was measured at a speed of about 1000 mm/min in the 180° direction. The measurement was performed immediately after the pressing, and the mold release property was evaluated based on the following criteria.

○:可剝離 ○: peelable

×:不易剝離而薄膜或CL破裂 ×: not easily peeled off and film or CL cracked

追隨性(完工外觀皺紋):依據JPCA規格之「7.5.7.2項皺紋」來測定。 Followability (finished appearance wrinkles): Measured according to the "7.5.7.2 wrinkles" of the JPCA specification.

○:皺紋產生率小於2.0% ○: wrinkle generation rate is less than 2.0%

×:皺紋產生率2.0%以上 ×: wrinkle generation rate is 2.0% or more

CL黏著劑之滲出量:對於電路基板是否有CL之黏著劑層的滲出,依據「JPCA規格之7.5.3.6項覆蓋層的黏著劑之流動及面塗之滲出」,評價朝電路端子部之滲出量。滲出量小於150μm為合格。 The amount of exudation of the CL adhesive: for the presence or absence of the adhesive layer of the CL on the circuit board, the evaluation of the bleed out toward the terminal portion of the circuit according to "JPCA specification 7.5.3.6, Adhesive flow of the cover layer and bleed of the top coat" the amount. The amount of exudation is less than 150 μm .

○:滲出量小於150μm ○: The amount of exudation is less than 150 μ m

×:滲出量150μm以上 ×: The amount of exudation is 150 μm or more

成形性:成形性係依據「JPCA規格之7.5.3.3項的氣泡」以目視進行評價。各符號係如以下所示。將評價樣品數設為各n=100來進行評價,在樣品表面確認有空隙者數小於評價樣品數之2%者為合格。 Formability: Formability was evaluated visually in accordance with "JPCA Standard 7.5.3.3 Bubbles". Each symbol is as follows. The number of evaluation samples was evaluated as n=100, and it was confirmed that the number of voids on the sample surface was less than 2% of the number of evaluation samples.

○:空隙發生率小於2.0% ○: void incidence is less than 2.0%

×:空隙發生率2.0%以上 ×: The void occurrence rate is 2.0% or more

將關於上述評價項目之評價結果示於以下之表1。 The evaluation results regarding the above evaluation items are shown in Table 1 below.

實施例之脫模薄膜,相較於比較例之脫模薄膜,可抑制熱壓時形成脫模薄膜之脫模面的材料之官能基與形成配置該脫模薄膜之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 The release film of the embodiment can suppress the reaction of the functional group of the material forming the release surface of the release film during hot pressing with the material forming the surface of the object on which the release film is disposed, compared to the release film of the comparative example. Interactions give molded products of good quality.

(第二實施形態) (Second embodiment)

以下針對本發明之第二實施形態,利用圖式加以說明。此外,在所有圖式中,對於相同構成要素附加相同符號,並且適當地省略說明。 Hereinafter, a second embodiment of the present invention will be described with reference to the drawings. In the drawings, the same components are denoted by the same reference numerals, and the description is omitted as appropriate.

<脫模薄膜> <release film>

本實施形態之脫模薄膜30係具有包含聚酯樹脂材料之脫模層21的脫模薄膜30,其為包含依據ASTM D2857於35℃所測定之上述脫模層21的固有黏度為0.9以上1.5以下之聚酯樹脂材料者。藉此,可得到脫模薄膜30,其可抑制熱壓時形成脫模薄膜30之脫模面的材料之官能基與形成配置該脫模薄膜30之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 The release film 30 of the present embodiment has a release film 30 comprising a release layer 21 of a polyester resin material, and the intrinsic viscosity of the release layer 21 measured at 35 ° C according to ASTM D2857 is 0.9 or more and 1.5. The following polyester resin materials. Thereby, the release film 30 can be obtained, which can suppress the reaction and interaction of the functional groups of the material forming the release surface of the release film 30 during hot pressing with the material forming the surface of the object on which the release film 30 is disposed, thereby obtaining A molded product of good quality.

在本實施形態之脫模薄膜30中,脫模層21係在至少將該脫模薄膜30配置於對象物上時,形成接觸對象物之面(以下亦表示為「脫模面」)的樹脂層;聚酯樹脂係多元羧酸(二羧酸)與多元醇(二醇)之聚縮合物,為具有複數羧基(-COOH)之化合物。 In the release film 30 of the present embodiment, the release layer 21 is a resin which forms a surface of the object to be contacted (hereinafter also referred to as a "release surface") when at least the release film 30 is placed on the object. The polyester resin is a polycondensate of a polyvalent carboxylic acid (dicarboxylic acid) and a polyhydric alcohol (diol), and is a compound having a plurality of carboxyl groups (-COOH).

又,配置脫模薄膜前之對象物表面通常係藉由包含半硬化狀態之熱硬化性樹脂的材料所形成。本實施形態之脫模薄膜30係配置於藉由包含上述半硬化狀態之熱硬化性樹脂的材料所形成之對象物表面上而使用。而且,藉由在於對象物表面配置該脫模薄膜30之狀態進行熱壓,可得到成型品。 Further, the surface of the object before the release film is disposed is usually formed of a material containing a thermosetting resin in a semi-hardened state. The release film 30 of the present embodiment is used by being disposed on the surface of an object formed of a material containing the thermosetting resin in the semi-hardened state. Moreover, the molded article can be obtained by hot pressing in a state in which the release film 30 is placed on the surface of the object.

當使用以往的脫模薄膜時,推測會發生以下之現象。 When a conventional release film is used, it is presumed that the following phenomenon occurs.

茲認為以往在熱壓時,在脫模薄膜中形成脫模面之材料中的羧基,會與覆蓋層薄膜黏著劑所具有之未反應的官能基反應並交互作用。這種未反應的官能基並未特別限定,例如以容易相互作用之官能基而言可列舉環氧基。 It is considered that in the conventional hot pressing, the carboxyl group in the material forming the release surface in the release film reacts with and interacts with the unreacted functional groups of the cover film adhesive. Such an unreacted functional group is not particularly limited, and examples thereof include an epoxy group which is a functional group which is easy to interact with.

以下舉出未反應的官能基為環氧基之情形為例進行說明。 Hereinafter, a case where the unreacted functional group is an epoxy group will be described as an example.

當使用專利文獻1~3等記載之以往的脫模薄膜時,於覆蓋層薄膜殘留脫模薄膜之一部分作為污染物之原因雖然尚未明朗,茲認為係如羧基之極 性基與成形品之污染有關。 When the conventional release film described in Patent Documents 1 to 3 and the like is used, the reason why a part of the release film remains as a contaminant in the cover film is not clear, and it is considered to be a pole of a carboxyl group. The base is related to the contamination of the molded article.

而且,專利文獻1~3等記載之以往的脫模薄膜之依據ASTM D2857於35℃所測定之脫模層21的固有黏度,係不同於本實施形態之脫模薄膜30的技術水準。像這樣,當使用以往的脫模薄膜所包含之聚酯樹脂材料時,無法充分地抑制未反應的官能基與形成對象物表面之材料中的極性基(例如羧基)反應並交互作用。 Further, the conventional mold release films described in Patent Documents 1 to 3 and the like have an intrinsic viscosity of the release layer 21 measured at 35 ° C according to ASTM D2857, which is different from the technical level of the release film 30 of the present embodiment. As described above, when the polyester resin material contained in the conventional release film is used, it is not possible to sufficiently prevent the unreacted functional group from reacting with and interacting with a polar group (for example, a carboxyl group) in the material forming the surface of the object.

相對於此,根據本實施形態之脫模薄膜30,依據ASTM D2857於35℃所測定之脫模層21的固有黏度滿足上述特定條件,因此可抑制極微量的異物或脫模薄膜30之一部分附著於自熱壓所得之成型體剝離脫模薄膜30後之成型品表面,並且得到可防止成型品表面產生粗糙之程度的高度優異的脫模性。茲認為這係因為:藉由使用依據ASTM D2857於35℃所測定之脫模層21的固有黏度呈現0.9以上1.5以下之值的聚酯樹脂材料作為形成脫模面之材料,使與存在於成型品表面之未反應的官能基反應並交互作用之羧基的量相較於以往有所減少。因此,相較於以往的脫模薄膜,本實施形態之脫模薄膜30可得到高度優異的脫模性。 On the other hand, according to the release film 30 of the present embodiment, the intrinsic viscosity of the release layer 21 measured at 35 ° C according to ASTM D2857 satisfies the above specific conditions, so that it is possible to suppress a slight amount of foreign matter or a part of the release film 30 from adhering. The surface of the molded article after the release film 30 is peeled off from the molded body obtained by hot pressing, and a mold release property excellent in height to prevent the surface of the molded article from being roughened is obtained. It is considered that this is because a polyester resin material exhibiting a value of 0.9 or more and 1.5 or less by using the intrinsic viscosity of the release layer 21 measured at 35 ° C according to ASTM D2857 is used as a material for forming a release surface, and is present in the molding. The amount of carboxyl groups reacting and interacting with unreacted functional groups on the surface of the product is reduced compared to the prior art. Therefore, the release film 30 of the present embodiment can obtain a highly releasable property as compared with the conventional release film.

此外,在熱壓後之成型品表面產生的粗糙係指成型品表面之一部分有起伏、成型品表面之一部分潰爛、成型品表面之形狀不光滑、變成粗糙狀態等。 Further, the roughness generated on the surface of the molded article after hot pressing means that one part of the surface of the molded article has undulations, one part of the surface of the molded article is festered, the shape of the surface of the molded article is not smooth, and the state is rough.

又,在本實施形態之脫模薄膜30中,依據ASTM D2857於35℃所測定之脫模層21的固有黏度只要為0.9以上1.5以下即可,而若為1.0以上1.3以下則更佳。藉此,可抑制熱壓時形成脫模薄膜30之脫模面的材料之官能基與形成配置該脫模薄膜30之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 Further, in the release film 30 of the present embodiment, the intrinsic viscosity of the release layer 21 measured at 35 ° C according to ASTM D2857 may be 0.9 or more and 1.5 or less, and more preferably 1.0 or more and 1.3 or less. Thereby, the functional group of the material forming the release surface of the release film 30 at the time of hot pressing can be prevented from reacting with and interacting with the material forming the surface of the object on which the release film 30 is disposed, and a molded article having good quality can be obtained.

又,在本實施形態中聚酯樹脂材料並未特別限定,例如可列舉聚對苯二甲酸乙二酯樹脂、聚對苯二甲酸丁二酯樹脂、聚對苯二甲酸丙二酯樹脂、 聚對苯二甲酸己二酯樹脂等聚對苯二甲酸烷二酯樹脂。此等之中又以使用聚對苯二甲酸丁二酯樹脂為較佳。藉此,可抑制熱壓形成脫模薄膜30之脫模面的材料之官能基與形成配置該脫模薄膜30之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 Further, the polyester resin material in the present embodiment is not particularly limited, and examples thereof include polyethylene terephthalate resin, polybutylene terephthalate resin, and polytrimethylene terephthalate resin. A polyalkylene terephthalate resin such as a polybutylene terephthalate resin. Among these, it is preferred to use a polybutylene terephthalate resin. Thereby, the functional group of the material which is hot-pressed to form the release surface of the release film 30 can be inhibited from reacting with and interacting with the material forming the surface of the object on which the release film 30 is disposed, thereby obtaining a molded article having good quality.

又,聚酯樹脂材料亦可因應需要而為共聚合了其它成分之聚酯系共聚物樹脂。作為共聚合之成分,可列舉眾所周知的酸成分、醇成分、酚成分或具有酯形成能力之此等之衍生物、聚伸烷二醇成分等。 Further, the polyester resin material may be a polyester-based copolymer resin in which other components are copolymerized as needed. Examples of the copolymerization component include a well-known acid component, an alcohol component, a phenol component, a derivative having such an ester forming ability, a polyalkylene glycol component, and the like.

又,作為可共聚合之酸成分,例如可列舉2價以上之碳數8~22的芳香族羧酸、2價以上之碳數4~12的脂肪族羧酸、進一步可列舉2價以上之碳數8~15的脂環式羧酸、及具有酯形成能力之此等之衍生物。作為上述可共聚合之酸成分的具體例,例如可列舉對苯二甲酸、間苯二甲酸、萘二羧酸、雙(對碳二苯基)甲烷蒽二羧酸、4-4'-二苯羧酸、1,2-雙(苯氧基)乙烷-4,4'-二羧酸、5-磺酸鈉間苯二甲酸、己二酸、癸二酸、壬二酸、十二烷二酸、馬來酸、苯均三酸、偏苯三酸、苯均四酸、1,3-環己二羧酸、1,4-環己二羧酸及具有酯形成能力之此等之衍生物。此等可單獨或併用2種以上來使用。 In addition, examples of the acid component which can be copolymerized include an aromatic carboxylic acid having a carbon number of 8 to 22 or more, a divalent or higher aliphatic carboxylic acid having 4 to 12 carbon atoms, and more preferably a divalent or higher valence. An alicyclic carboxylic acid having 8 to 15 carbon atoms and such a derivative having an ester forming ability. Specific examples of the above-mentioned copolymerizable acid component include terephthalic acid, isophthalic acid, naphthalene dicarboxylic acid, bis(p-carbodiphenyl)methane dicarboxylic acid, and 4-4'-di. Benzenecarboxylic acid, 1,2-bis(phenoxy)ethane-4,4'-dicarboxylic acid, sodium 5-sulfonate isophthalic acid, adipic acid, sebacic acid, sebacic acid, twelve Alkanoic acid, maleic acid, trimesic acid, trimellitic acid, pyromellitic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, and ester forming ability a derivative. These may be used alone or in combination of two or more.

又,作為可共聚合之醇成分及/或酚成分,例如可列舉2價以上之碳數2~15的脂肪族醇、2價以上之碳數6~20的脂環式醇、碳數6~40的2價以上之芳香族醇、或酚及具有酯形成能力之此等之衍生物。作為上述可共聚合之醇成分及/或酚成分之具體例,可列舉乙二醇、丙二醇、丁二醇、己二醇、癸二醇、新戊二醇、環己二甲醇、環己二醇、2,2'-雙(4-羥苯基)丙烷、2,2'-雙(4-羥環己基)丙烷、氫醌、丙三醇、新戊四醇等化合物、及具有酯形成能力之此等之衍生物、ε-己內酯等環狀酯。 Further, examples of the copolymerizable alcohol component and/or the phenol component include a divalent or higher aliphatic alcohol having 2 to 15 carbon atoms, a divalent or higher aliphatic carbon number of 6 to 20 carbon atoms, and a carbon number of 6 ~40 of a divalent or higher aromatic alcohol, or a phenol and such a derivative having an ester forming ability. Specific examples of the copolymerizable alcohol component and/or phenol component include ethylene glycol, propylene glycol, butanediol, hexanediol, decanediol, neopentyl glycol, cyclohexanedimethanol, and cyclohexane. Alcohol, 2,2'-bis(4-hydroxyphenyl)propane, 2,2'-bis(4-hydroxycyclohexyl)propane, hydroquinone, glycerol, neopentyl alcohol, etc., and ester formation Such derivatives are such derivatives as cyclic esters such as ε-caprolactone.

作為可共聚合之聚伸烷二醇成分,例如可列舉聚乙二醇、聚丙二醇、聚四甲二醇、及此等之無規或嵌段共聚物、雙酚化合物之伸烷二醇(聚乙二醇、聚丙二醇、聚四甲二醇、及此等之無規或嵌段共聚物等)附加物等改性聚氧伸烷二醇等。 Examples of the copolymerizable polyalkylene glycol component include polyethylene glycol, polypropylene glycol, polytetramethylene glycol, and random or block copolymers thereof, and alkylene glycols of bisphenol compounds. Modified polyoxyalkylene glycol, etc., such as polyethylene glycol, polypropylene glycol, polytetramethylene glycol, and the like, such as random or block copolymers.

在這種聚酯系共聚物樹脂之中又以聚酯樹脂材料與聚伸烷二醇成分之共聚物為較佳、更具體為聚酯系樹脂與聚四甲二醇之共聚物、再更具體為聚對苯二甲酸丁二酯樹脂與聚四甲二醇之共聚物為較佳。藉此,即使在鍍敷附著性之觀點亦可得到優異之脫模薄膜30。 Among the polyester-based copolymer resins, a copolymer of a polyester resin material and a polyalkylene glycol component is preferred, more specifically a copolymer of a polyester resin and a polytetramethylene glycol, and further Specifically, a copolymer of polybutylene terephthalate resin and polytetramethylene glycol is preferred. Thereby, the release film 30 excellent in the viewpoint of plating adhesion can be obtained.

上述可共聚合之其它成分(尤其聚四甲二醇)的含量並未特別限定,以聚酯系共聚物樹脂全體之5重量%以上50重量%以下為較佳、以10重量%以上40重量%以下為特佳。當含量為上述下限值以上時,可提升該脫模薄膜30對於對象物之追隨性。又,當含量為上述上限值以下時,可進一步提升脫模性。 The content of the other copolymerizable component (particularly polytetramethylene glycol) is not particularly limited, and is preferably 5% by weight or more and 50% by weight or less based on the total amount of the polyester copolymer resin, and is preferably 10% by weight or more and 40% by weight. % below is especially good. When the content is at least the above lower limit value, the followability of the release film 30 to the object can be improved. Moreover, when the content is at most the above upper limit value, the mold release property can be further improved.

又,形成脫模面之材料,除了聚酯樹脂材料以外,亦可含有抗氧化劑、助滑劑、抗黏連劑、抗靜電劑、染料及顏料等著色劑、安定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。 Further, the material for forming the release surface may contain, in addition to the polyester resin material, an antioxidant, a slip agent, an anti-blocking agent, an antistatic agent, a coloring agent such as a dye or a pigment, an additive such as a stabilizer, a fluororesin, or the like. An impact-imparting agent such as a silicone rubber, or an inorganic filler such as titanium oxide, calcium carbonate or talc.

又,使用本實施形態之脫模薄膜30的脫模層21而藉由指示劑滴定法測得之末端羧酸量係以小於40為較佳、若為25以下則更佳。藉此,可抑制熱壓時形成脫模薄膜30之脫模面的材料之官能基與形成配置該脫模薄膜30之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 Further, the amount of the terminal carboxylic acid measured by the indicator titration method using the release layer 21 of the release film 30 of the present embodiment is preferably less than 40, more preferably 25 or less. Thereby, the functional group of the material forming the release surface of the release film 30 at the time of hot pressing can be prevented from reacting with and interacting with the material forming the surface of the object on which the release film 30 is disposed, and a molded article having good quality can be obtained.

此外,使用專利文獻1~3等記載之以往的脫模薄膜的脫模層而藉由指示劑滴定法測得之末端羧酸量,係不同於本實施形態之脫模薄膜30的技術水準。像這樣,當使用以往的脫模薄膜所包含之聚酯樹脂材料時,無法充分地抑制未反應的官能基與形成對象物表面之材料中的極性基(例如羧基)反應並交互作用。 In addition, the amount of the terminal carboxylic acid measured by the indicator titration method using the release layer of the conventional release film described in Patent Documents 1 to 3 and the like is different from the technical level of the release film 30 of the present embodiment. As described above, when the polyester resin material contained in the conventional release film is used, it is not possible to sufficiently prevent the unreacted functional group from reacting with and interacting with a polar group (for example, a carboxyl group) in the material forming the surface of the object.

圖3及4係本實施形態之脫模薄膜30的剖面圖。 3 and 4 are cross-sectional views of the release film 30 of the present embodiment.

本實施形態之脫模薄膜30可為形成單層結構者,亦可為形成多層結構 者。如圖3所示,當脫模薄膜30為形成單層結構者時,可簡化脫模薄膜30之製造步驟。相對於此,如圖4所示,若脫模薄膜30之層結構為多層結構,則可適當調節與對象物之脫模性或追隨性。 The release film 30 of the present embodiment may be a single layer structure or a multilayer structure. By. As shown in FIG. 3, when the release film 30 is formed into a single layer structure, the manufacturing steps of the release film 30 can be simplified. On the other hand, as shown in FIG. 4, when the layer structure of the mold release film 30 is a multilayer structure, the mold release property or the followability with respect to an object can be adjusted suitably.

以下,作為本實施形態之脫模薄膜30,舉出圖4所示之形成多層結構者為例進行說明。 Hereinafter, as the release film 30 of the present embodiment, a case where the multilayer structure shown in FIG. 4 is formed will be described as an example.

如圖4所示,本實施形態之脫模薄膜30係脫模層21、緩衝層22、與脫模層23依此順序積層。以下依序說明各層。 As shown in Fig. 4, the release film 30 of the present embodiment is a layer in which the release layer 21, the buffer layer 22, and the release layer 23 are laminated in this order. The layers are described in order below.

首先,脫模層21係保持與成型品表面之脫模性者。又,亦具備因應配置該脫模薄膜30之對象物的形狀而追隨脫模層21之圖案追隨性功能。此外,脫模層21係形成脫模面之層,其藉由聚酯樹脂材料所形成。 First, the release layer 21 is kept from the surface of the molded article. Further, the pattern followability function of the release layer 21 is followed by the shape of the object to which the release film 30 is placed. Further, the release layer 21 is a layer which forms a release surface which is formed of a polyester resin material.

又,作為形成脫模層21之方法,例如可列舉空冷或水冷充氣擠製法、T模擠製法等眾所周知的方法。 Further, as a method of forming the release layer 21, for example, a well-known method such as an air-cooling or water-cooling gas-filling method or a T-die extrusion method can be mentioned.

脫模層21之厚度並未特別限定,以5μm以上40μm以下為較佳、若為7μm以上20μm以下則更佳。若脫模層21之厚度為上述範圍內,則可提升對於成型品之填埋能力。 The thickness of the mold release layer 21 is not particularly limited, and is preferably 5 μm or more and 40 μm or less, and more preferably 7 μm or more and 20 μm or less. If the thickness of the release layer 21 is within the above range, the filling ability for the molded article can be improved.

又,脫模層21之例如180℃之黏彈性模數並未特別限定,以10MPa以上200MPa以下為較佳、若為30MPa以上150MPa以下則更佳。當脫模層21之黏彈性模數為上述下限值以上時,可抑制該脫模薄膜30之脫模性降低。又,當脫模層21之黏彈性模數為上述上限值以下時,可抑制該脫模薄膜30之填埋能力降低。 Further, the modulus of elasticity of the mold release layer 21, for example, at 180 ° C is not particularly limited, and is preferably 10 MPa or more and 200 MPa or less, and more preferably 30 MPa or more and 150 MPa or less. When the modulus of elasticity of the release layer 21 is at least the above lower limit value, the release property of the release film 30 can be suppressed from being lowered. Moreover, when the number of viscoelastic modulus of the release layer 21 is at most the above upper limit value, the decrease in the filling ability of the release film 30 can be suppressed.

此外,脫模層21之黏彈性模數例如可藉由以動態黏彈性測定裝置於拉伸模式、頻率1Hz、以升溫速度5℃/min自常溫至250℃進行測定來評價。 Further, the viscoelastic modulus of the release layer 21 can be evaluated, for example, by a dynamic viscoelasticity measuring apparatus in a tensile mode at a frequency of 1 Hz and at a temperature elevation rate of 5 ° C/min from a normal temperature to 250 ° C.

其次,緩衝層22具備用以埋入與該脫模薄膜30之脫模層21鄰接的對 象物表面間隙之緩衝功能。又,藉由作成具有緩衝層22之脫模薄膜30,可在熱壓時使施加於配置有脫模薄膜30之對象物全體的壓力均一化。再者,當製造可撓性電路基板時,可作成外觀完成度(尤其是降低皺紋的產生)優異者。 Next, the buffer layer 22 is provided with a pair for burying adjacent to the release layer 21 of the release film 30. The buffer function of the surface gap of the object. Moreover, by forming the release film 30 having the buffer layer 22, the pressure applied to the entire object on which the release film 30 is disposed can be made uniform during hot pressing. Further, when manufacturing a flexible circuit board, it is excellent in the degree of appearance completion (especially, generation of wrinkles).

又,緩衝層22係藉由不同於聚酯樹脂材料之第2樹脂所形成。此時,作為第2樹脂,可列舉組成不同於形成脫模層21之聚酯樹脂材料的聚酯樹脂材料或聚酯樹脂材料以外之種類的樹脂等。此等之中又以形成上述脫模層21之聚酯樹脂材料以外的樹脂為較佳。 Further, the buffer layer 22 is formed of a second resin different from the polyester resin material. In this case, the second resin may be a resin other than the polyester resin material or the polyester resin material having a composition different from the polyester resin material forming the release layer 21 . Among these, a resin other than the polyester resin material forming the release layer 21 is preferable.

在此,作為形成脫模層21之聚酯樹脂材料以外的樹脂,例如可列舉聚乙烯、聚丙烯等α烯烴系聚合物;具有乙烯、丙烯、丁烯、戊烯、己烯、甲基戊烯等作為共聚物成分之α烯烴系共聚物;聚醚碸、聚苯硫醚等工程塑膠系樹脂;此等可單獨或亦可併用複數。此等之中又以α烯烴系共聚物為較佳。具體而言可列舉乙烯等α烯烴與(甲基)丙烯酸酯之共聚物、乙烯與乙酸乙烯酯之共聚物、乙烯與(甲基)丙烯酸之共聚物、以及此等之部分離子交聯物等。 Here, examples of the resin other than the polyester resin material forming the release layer 21 include an α-olefin polymer such as polyethylene or polypropylene; and ethylene, propylene, butene, pentene, hexene, and methyl pentane. An alpha olefin copolymer which is a copolymer component such as a olefin; an engineering plastic resin such as polyether oxime or polyphenylene sulfide; these may be used singly or in combination. Among these, an α-olefin copolymer is preferred. Specific examples thereof include a copolymer of an α-olefin such as ethylene and a (meth)acrylate, a copolymer of ethylene and vinyl acetate, a copolymer of ethylene and (meth)acrylic acid, and a part of the ionomers thereof. .

這種第2樹脂之中尤其又以第2樹脂之硬化物的例如於90℃之彈性模數為10MPa以下者為較佳、2MPa以上8MPa以下者為特佳。若第2樹脂之硬化物的彈性模數為上述範圍內,則尤其當製造可撓性電路時,可作成緩衝功能優異之脫模薄膜30。 In particular, in the second resin, for example, a cured modulus of the second resin is preferably 10 MPa or less, and preferably 2 MPa or more and 8 MPa or less. When the elastic modulus of the cured product of the second resin is within the above range, the release film 30 having excellent cushioning function can be obtained particularly when a flexible circuit is manufactured.

此外,彈性模數係例如可藉由以動態黏彈性測定裝置於拉伸模式、頻率1Hz、升溫速度5℃/min自常溫至250℃進行測定來評價。 Further, the elastic modulus can be evaluated, for example, by measuring with a dynamic viscoelasticity measuring apparatus in a stretching mode, a frequency of 1 Hz, and a temperature rising rate of 5 ° C/min from a normal temperature to 250 ° C.

又,為了進一步提升緩衝性,緩衝層22除了第2樹脂以外亦可包含橡膠成分。 Moreover, in order to further improve the cushioning property, the buffer layer 22 may contain a rubber component in addition to the second resin.

作為橡膠成分,例如可列舉苯乙烯-丁二烯共聚物、苯乙烯-異戊二烯共聚物等苯乙烯系熱塑性彈性體、烯烴系熱塑性彈性體、醯胺系彈性體、聚 酯系彈性體等熱塑性彈性體材料;天然橡膠、異戊二烯橡膠、氯丁二烯橡膠、矽氧橡膠等橡膠材料等。 Examples of the rubber component include a styrene-based thermoplastic elastomer such as a styrene-butadiene copolymer or a styrene-isoprene copolymer, an olefin-based thermoplastic elastomer, a guanamine-based elastomer, and a poly A thermoplastic elastomer material such as an ester elastomer; a rubber material such as natural rubber, isoprene rubber, chloroprene rubber or silicone rubber.

又,緩衝層22中之橡膠成分的含量並未特別限定,以相對於第2樹脂100重量份而言為5重量份以上50重量份以下為較佳、若為10重量份以上40重量份以下則更佳。若緩衝層22中之橡膠成分的含量為上述範圍內,則可作成緩衝性更為優異之脫模薄膜30。 In addition, the content of the rubber component in the buffer layer 22 is not particularly limited, and is preferably 5 parts by weight or more and 50 parts by weight or less based on 100 parts by weight of the second resin, and more preferably 10 parts by weight or more and 40 parts by weight or less. It is better. When the content of the rubber component in the buffer layer 22 is within the above range, the release film 30 having more excellent cushioning properties can be obtained.

又,緩衝層22除了第2樹脂以外,亦可含有抗氧化劑、助滑劑、抗黏連劑、抗靜電劑、染料及顏料等著色劑、安定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。 Further, the buffer layer 22 may contain an antioxidant, a slip agent, an anti-blocking agent, an antistatic agent, a coloring agent such as a dye or a pigment, an additive such as a stabilizer, a fluororesin, a silicone rubber, or the like in addition to the second resin. An inorganic filler such as an impact imparting agent, titanium oxide, calcium carbonate or talc.

此外,作為形成緩衝層22之方法,例如可列舉空冷或水冷充氣擠製法、T模擠製法等眾所周知的方法。 Further, as a method of forming the buffer layer 22, for example, a well-known method such as an air-cooling or water-cooling gas-filling method or a T-die extrusion method can be mentioned.

又,緩衝層22之厚度並未特別限定,以30μm以上100μm以下為較佳、若為50μ以上70μm以下則更佳。當緩衝層22之厚度為上述下限值以上時,可抑制脫模薄膜30之緩衝性降低。當緩衝層22之厚度為上述上限值以下時,可抑制脫模性降低。 Further, the thickness of the buffer layer 22 is not particularly limited, and is preferably 30 μm or more and 100 μm or less, and more preferably 50 μm or more and 70 μm or less. When the thickness of the buffer layer 22 is at least the above lower limit value, the cushioning property of the release film 30 can be suppressed from being lowered. When the thickness of the buffer layer 22 is at most the above upper limit value, the decrease in mold release property can be suppressed.

又,緩衝層22之軟化溫度並未特別限定,以80℃以上150℃以下為較佳、尤其若為90℃以上140℃以下則更佳。若緩衝層22之軟化溫度為上述範圍內,則可作成緩衝性更為優異之脫模薄膜30。 Further, the softening temperature of the buffer layer 22 is not particularly limited, and is preferably 80° C. or higher and 150° C. or lower, and particularly preferably 90° C. or higher and 140° C. or lower. When the softening temperature of the buffer layer 22 is within the above range, the release film 30 having more excellent cushioning properties can be obtained.

脫模層23係保持與在熱壓等成型時所使用之加強板的脫模性。 The release layer 23 maintains the releasability of the reinforcing sheet used in molding at the time of hot pressing or the like.

脫模層23係以軟化點高於第2樹脂之第3樹脂所構成。藉此,可更進一步提升與加強板之脫模性。 The release layer 23 is composed of a third resin having a softening point higher than that of the second resin. Thereby, the release property of the reinforcing plate can be further improved.

作為第3樹脂,例如可列舉4-甲基-1-戊烯樹脂、4-甲基-1-戊烯、與其它α-烯烴例如乙烯、丙烯、1-丁烯、1-己烯、1-辛烯、1-癸烯、1-十四烯、 1-十八烯等碳數2~20之α-烯烴之共聚物、聚丙烯等烯烴系樹脂、與脫模層21所用相同之聚酯系樹脂等。 Examples of the third resin include 4-methyl-1-pentene resin, 4-methyl-1-pentene, and other α-olefins such as ethylene, propylene, 1-butene, and 1-hexene. -octene, 1-decene, 1-tetradecene, A copolymer of an α-olefin having 2 to 20 carbon atoms such as 1-octadecene, an olefin resin such as polypropylene, and a polyester resin similar to those used for the release layer 21.

又,第3樹脂與形成脫模層21之聚酯樹脂材料可相同亦可不同,而以相同為較佳。藉此,可以無表裏之分地使用脫模薄膜30,因此可以避免脫模薄膜30表裏面的誤用。 Further, the third resin may be the same as or different from the polyester resin material forming the release layer 21, and the same is preferable. Thereby, the release film 30 can be used without any difference in the surface, so that misuse of the inside of the release film 30 can be avoided.

又,第3樹脂之軟化點並未特別限定,以100℃以上為較佳、尤其若為120℃以上則更佳。藉此,除了脫模性以外,更可減少起因於第3樹脂之揮發成分或第3樹脂附著於以SUS板等所構成之加強板。 Further, the softening point of the third resin is not particularly limited, and is preferably 100 ° C or more, more preferably 120 ° C or more. Thereby, in addition to the mold release property, the volatilization component of the third resin or the third resin adheres to the reinforcing plate made of a SUS plate or the like can be reduced.

又,脫模層23除了第3樹脂以外,亦可含有抗氧化劑、助滑劑、抗黏連劑、抗靜電劑、染料及顏料等著色劑、安定劑等添加劑、氟樹脂、矽氧橡膠等耐衝擊性賦予劑、氧化鈦、碳酸鈣、滑石等無機填充劑。 Further, the mold release layer 23 may contain an antioxidant, a slip agent, an anti-blocking agent, an antistatic agent, a coloring agent such as a dye or a pigment, an additive such as a stabilizer, a fluororesin, a silicone rubber, etc., in addition to the third resin. An impact filler, an inorganic filler such as titanium oxide, calcium carbonate or talc.

此外,作為形成脫模層23之方法,例如可列舉空冷或水冷充氣擠製法、T模擠製法等眾所周知的方法。 Further, as a method of forming the release layer 23, for example, a well-known method such as an air-cooling or water-cooling gas-filling method or a T-die extrusion method can be mentioned.

又,脫模層23之厚度並未特別限定,若為5μm以上60μm以下則更佳。當脫模層23之厚度為上述下限值以上時,在熱壓時脫模薄膜30全體成為剛性物,提升脫模性。又,當脫模層23之厚度為上述上限值以下時,脫模薄膜30之成膜性成為適宜者。 Further, the thickness of the release layer 23 is not particularly limited, and is preferably 5 μm or more and 60 μm or less. When the thickness of the mold release layer 23 is at least the above lower limit value, the entire release film 30 becomes a rigid material during hot pressing, and the mold release property is improved. Moreover, when the thickness of the mold release layer 23 is less than or equal to the above upper limit value, the film formability of the release film 30 is suitable.

本實施形態之脫模薄膜30係以形成脫模層21/緩衝層22/脫模層23之三層結構而成者為較佳。 The release film 30 of the present embodiment is preferably formed by a three-layer structure in which the release layer 21, the buffer layer 22, and the release layer 23 are formed.

又,本實施形態之脫模薄膜30雖然呈現脫模層21、緩衝層22及脫模層23之以3層所構成者,惟本發明並不限定於此,亦可為具有黏著層、阻氣層等之4層、5層等4層以上之構成。 Further, the release film 30 of the present embodiment has three layers of the release layer 21, the buffer layer 22, and the release layer 23, but the present invention is not limited thereto, and may have an adhesive layer or a resist. Four or more layers, such as a gas layer, and the like, are composed of four or more layers.

又,本實施形態之脫模薄膜30並未特別限定,可配置於由上鑄模及下鑄模所構成之鑄模內部,亦可配置於覆蓋層薄膜上或覆銅積層板上。此等之中,又以配置於覆蓋層薄膜上或覆銅積層板上之情形,可充分發揮本實施形態之脫模薄膜30的脫模性。 Further, the release film 30 of the present embodiment is not particularly limited, and may be disposed inside a mold composed of an upper mold and a lower mold, or may be disposed on a cover film or a copper clad laminate. Among these, in the case of being disposed on the cover film or on the copper clad laminate, the release property of the release film 30 of the present embodiment can be sufficiently exhibited.

作為本實施形態之對象物,可列舉覆蓋層薄膜或覆銅積層板等。該對象物係藉由至少包含熱壓前之表面為半硬化狀態之熱硬化性樹脂的材料所形成者。又,作為熱硬化性樹脂,例如可列舉環氧樹脂等。 Examples of the object of the embodiment include a cover film or a copper-clad laminate. The object is formed by a material containing at least a thermosetting resin whose surface is semi-hardened before hot pressing. Moreover, as a thermosetting resin, an epoxy resin etc. are mentioned, for example.

<脫模薄膜之製造方法> <Method of Manufacturing Release Film>

本實施形態之脫模薄膜30可分別製造這種脫模層21、緩衝層22、與脫模層23之後藉由層合機等來接合而得到脫模薄膜30,而以將脫模層21、緩衝層22、與脫模層23利用例如空冷式或水冷式共擠製充氣法、共擠製T模法來成膜之方法以得到脫模薄膜30之方法為較佳。其中從可優異地控制各層之厚度的觀點來看,又以利用共擠製T模法來成膜之方法為特佳。 In the release film 30 of the present embodiment, the release layer 21, the buffer layer 22, and the release layer 23, respectively, are joined by a laminator or the like to obtain a release film 30, and the release layer 21 is obtained. The buffer layer 22 and the release layer 23 are preferably formed by a method such as air-cooling or water-cooling co-extrusion aeration or co-extrusion T-die to form a release film 30. Among them, from the viewpoint of excellent control of the thickness of each layer, a method of forming a film by a co-extrusion T-die method is particularly preferable.

又,脫模層21、緩衝層22、與脫模層23可直接接合,亦可隔著黏著層而接合。 Further, the release layer 21, the buffer layer 22, and the release layer 23 may be directly bonded to each other or may be joined via an adhesive layer.

以往係使用例如在熔融狀態進行聚縮合反應所得之聚酯樹脂來製作脫模薄膜。像這樣使用聚縮合所得之聚酯樹脂材料來製作脫模薄膜一事本身,亦有在先前技術中施行。 Conventionally, a release film has been produced by using, for example, a polyester resin obtained by performing a polycondensation reaction in a molten state. The use of the polyester resin material obtained by polycondensation to produce a release film as such is also carried out in the prior art.

相對於此,在本實施形態之脫模薄膜30中形成脫模面之脫模層21及/或脫模層23並非使用以往的聚縮合反應所得之聚酯樹脂材料,而是使用例如固相聚合所得之聚酯樹脂材料來製作。 On the other hand, in the release film 30 of the present embodiment, the release layer 21 and/or the release layer 23 which form the release surface are not using the polyester resin material obtained by the conventional polycondensation reaction, but using, for example, a solid phase. It is produced by polymerizing the obtained polyester resin material.

本實施形態之脫模薄膜30係為了將依據ASTM D2857於35℃所測定之脫模層21的固有黏度控制在0.9以上1.5以下,而藉由控制固相聚合反應所用之聚合觸媒的種類、反應溫度、反應時間等反應條件方可得到。為了將本實施形態之脫模薄膜30作成可得到抑制熱壓時形成脫模薄膜30之脫模面的材料之官能基與形成配置該脫模薄膜30之對象物表面的材料反應並交互作用,具有良好品質之成型品者,控制此等因子為格外重要。 The release film 30 of the present embodiment is used to control the type of the polymerization catalyst used for the solid phase polymerization by controlling the intrinsic viscosity of the release layer 21 measured at 35 ° C according to ASTM D2857 to 0.9 or more and 1.5 or less. The reaction conditions such as the reaction temperature and the reaction time can be obtained. The functional group of the material for forming the release surface of the release film 30 at the time of suppressing hot pressing reacts with and reacts with the material forming the surface of the object on which the release film 30 is disposed, in order to obtain the release film 30 of the present embodiment. Controlling these factors is especially important for molded products of good quality.

<脫模薄膜之使用方法> <How to use the release film>

接著,針對本實施形態之脫模薄膜30之使用方法進行說明。 Next, a method of using the release film 30 of the present embodiment will be described.

首先,在藉由包含半硬化狀態之熱硬化性樹脂的材料所形成之對象物的表面配置上述本實施形態之脫模薄膜30。然後,在鑄模內對於配置有脫模薄膜30之對象物進行熱壓。藉此,可抑制脫模薄膜30中未反應的官能基、與形成對象物表面之材料中的極性基(例如羧基)反應並交互作用。藉此,可抑制極微量的異物或脫模薄膜30之一部分附著於自熱壓所得之成型體剝離脫模薄膜30後之成型品表面,防止成型品表面產生粗糙,因此可抑制熱壓時形成脫模薄膜30之脫模面的材料之官能基與形成配置該脫模薄膜30之對象物表面的材料反應並交互作用,得到具有良好品質之成型品。 First, the release film 30 of the present embodiment described above is placed on the surface of an object formed of a material containing a thermosetting resin in a semi-hardened state. Then, the object on which the release film 30 is placed is hot-pressed in the mold. Thereby, it is possible to suppress the interaction between the unreacted functional groups in the release film 30 and the polar groups (for example, carboxyl groups) in the material forming the surface of the object. Thereby, it is possible to suppress the adhesion of a very small amount of foreign matter or a part of the release film 30 to the surface of the molded article after peeling off the release film 30 from the molded body obtained by hot pressing, thereby preventing the surface of the molded article from being rough, thereby suppressing formation at the time of hot pressing. The functional group of the material of the release surface of the release film 30 reacts with and interacts with the material forming the surface of the object on which the release film 30 is disposed, thereby obtaining a molded article having good quality.

以上針對本發明之實施形態進行陳述,惟此等係本發明之例示,亦可採用上述以外之各種構成。 The embodiments of the present invention have been described above, but other embodiments than the above may be employed as exemplified by the present invention.

【實施例】 [Examples]

以下藉由實施例及比較例說明本發明,惟本發明並不限定於此等。此外,本實施例係舉出以下圖4所示之由三層結構所構成之脫模薄膜30為例進行說明。 Hereinafter, the present invention will be described by way of examples and comparative examples, but the invention is not limited thereto. Further, in the present embodiment, a release film 30 composed of a three-layer structure shown in Fig. 4 below will be described as an example.

<脫模薄膜之製造> <Manufacture of release film> (實施例5) (Example 5)

1.聚酯樹脂材料之製造 1. Manufacture of polyester resin materials

使用2-(4’-羥丁氧基)四氫呋喃(以下表示為「HTHF」)之含量相對於1,4-丁二醇(以下表示為「BG」)為0.4重量%之BG 1104g、乙酸之含量相對於對苯二甲酸(以下表示為「TPA」)為0.14重量%之TPA 1132g(BG/TPA莫耳比1.8)而進行酯化反應,接著進行聚縮合反應。 The content of 2-(4'-hydroxybutoxy)tetrahydrofuran (hereinafter referred to as "HTHF") was 0.44% by weight based on 1,4-butanediol (hereinafter referred to as "BG"). The content was subjected to an esterification reaction with respect to terephthalic acid (hereinafter referred to as "TPA") of 0.14% by weight of TPA 1132 g (BG/TPA molar ratio of 1.8), followed by a polycondensation reaction.

首先,將TPA總量、BG 750g、鈦酸四丁酯0.8g、單丁基羥基氧化錫0.7g投入附有精餾塔之反應器,在190℃、400mmHg之條件下開始酯化反 應後,在徐徐升溫的同時,連續地添加殘餘的BG。 First, the total amount of TPA, BG 750g, 0.8 g of tetrabutyl titanate, and 0.7 g of monobutyl hydroxytin oxide were put into a reactor equipped with a rectification column, and the esterification reaction was started at 190 ° C and 400 mmHg. After that, the residual BG was continuously added while slowly heating up.

於該反應物添加鈦酸四丁酯0.08g、磷酸0.01g,於250℃、0.5mmHg進行聚縮合反應。 0.08 g of tetrabutyl titanate and 0.01 g of phosphoric acid were added to the reactant, and a polycondensation reaction was carried out at 250 ° C and 0.5 mmHg.

將生成之聚合物的細粒狀物投入旋轉式反應容器,在190℃、0.5mmHg的減壓下進行8小時固相聚合,得到高聚合度聚對苯二甲酸丁二酯(以下表示為PBT)。 The fine particles of the produced polymer were placed in a rotary reaction vessel, and subjected to solid phase polymerization at 190 ° C under a reduced pressure of 0.5 mmHg for 8 hours to obtain a high polymerization degree polybutylene terephthalate (hereinafter referred to as PBT). ).

2.脫模薄膜之製造 2. Manufacture of release film

藉由熱壓來製造包含由藉由上述方法所製造之PBT所構成之脫模層21、由聚丙烯、改性聚乙烯及藉由上述方法所製造之PBT所構成之緩衝層22、與由藉由上述方法所製造之PBT所構成之脫模層23的3層之脫模薄膜。脫模層21及脫模層23之PBT的固有黏度(IV值)均為1.22。 A buffer layer 22 comprising a release layer 21 composed of PBT manufactured by the above method, a polypropylene layer, a modified polyethylene, and a PBT manufactured by the above method is produced by hot pressing, and A three-layer release film of the release layer 23 composed of PBT manufactured by the above method. The intrinsic viscosity (IV value) of the PBT of the release layer 21 and the release layer 23 was 1.22.

又,緩衝層22係使用以下材料所形成。 Further, the buffer layer 22 is formed using the following materials.

聚丙烯:住友化學公司製、FH1016 Polypropylene: Sumitomo Chemical Co., Ltd., FH1016

改性聚乙烯:乙烯-甲基丙烯酸甲酯共聚物(住友化學公司製、WD106)與酸改性聚乙烯(三菱化學公司製、F515A) Modified polyethylene: ethylene-methyl methacrylate copolymer (made by Sumitomo Chemical Co., Ltd., WD106) and acid-modified polyethylene (Mitsubishi Chemical Co., Ltd., F515A)

PBT:使用與脫模層所用之PBT相同者。 PBT: The same as the PBT used for the release layer.

然後,以摻合比例成為聚丙烯:乙烯-甲基丙烯酸甲酯共聚物:酸改性聚乙烯:PBT=15:30:40:15之比例的方式進行混合。又,所得之脫模薄膜的各層厚度係脫模層21:30μm、緩衝層22:60μm、脫模層23:30μm。 Then, mixing was carried out in such a manner that the blending ratio became a ratio of polypropylene:ethylene-methyl methacrylate copolymer: acid-modified polyethylene: PBT = 15:30:40:15. Further, the thickness of each layer of the obtained release film was a release layer 21: 30 μm, a buffer layer 22: 60 μm, and a release layer 23: 30 μm.

(實施例6) (Example 6)

除了以將脫模層21及脫模層23之IV值成為1.08的方式變更固相聚合反應相關之反應條件以外,以與實施例5相同的方法製作脫模薄膜,進行評價。 A release film was produced and evaluated in the same manner as in Example 5 except that the reaction conditions related to the solid phase polymerization reaction were changed so that the IV values of the release layer 21 and the release layer 23 were 1.08.

(實施例7) (Example 7)

除了以將脫模層21及脫模層23之IV值成為1.08、而且脫模層21及脫模層23之PBT的末端羧酸量(AV值)成為14.3的方式變更固相聚合反應相關之反應條件以外,以與實施例6相同的方法製作脫模薄膜,進行評價。 The solid phase polymerization reaction was changed so that the IV value of the release layer 21 and the release layer 23 was 1.08, and the amount of terminal carboxylic acid (AV value) of the PBT of the release layer 21 and the release layer 23 was 14.3. A release film was produced in the same manner as in Example 6 except for the reaction conditions, and evaluated.

(實施例8) (Example 8)

除了以將脫模層21及脫模層23之IV值成為1.14的方式變更固相聚合反應相關之反應條件以外,以與實施例5相同的方法製作脫模薄膜,進行評價。 A release film was produced and evaluated in the same manner as in Example 5 except that the reaction conditions related to the solid phase polymerization reaction were changed so that the IV values of the release layer 21 and the release layer 23 were 1.14.

(比較例2) (Comparative Example 2)

除了以將脫模層21及脫模層23之IV值成為0.85的方式,使用PBT(東麗公司製、TORAYCON商品編號1100M)以外,以與實施例5相同的方法製作脫模薄膜,進行評價。 A release film was produced in the same manner as in Example 5 except that PBT (manufactured by Toray Industries, TORAYCON product number 1100M) was used, and the IV value of the release layer 21 and the release layer 23 was changed to 0.85. .

以下針對關於上述實施例5~8及比較例2所進行之測定方法及評價方法進行詳細說明。 The measurement methods and evaluation methods performed in the above Examples 5 to 8 and Comparative Example 2 will be described in detail below.

<評價項目> <evaluation item>

固有黏度(IV值):依據ASTM D2857於35℃所測定。具體而言係使用藉由以下方法所調整之試料,由下述式(A)算出。 Intrinsic viscosity (IV value): determined at 35 ° C according to ASTM D2857. Specifically, the sample adjusted by the following method was used and calculated from the following formula (A).

(1)測定試料之調配 (1) Measurement of the preparation of samples

首先,將所得之脫模層約3~5g投入100mL燒杯後,於燒杯內注入丙酮。之後,使用烘箱使燒杯內的試料於105℃乾燥30分鐘。接著,於100mL瓶,以小數點以下4位的精度量取0.45~0.5g之乾燥聚合物。接著,使用自動測定器,以使精度成為±0.01mL的方式,將每單位體積之脫模層重量稀釋100倍。之後,將脫模層移至瓶中,使用密合墊片將瓶密閉。接著,在攪拌直到脫模層完全熔融的同時,於110℃使瓶加熱約60~75分鐘。然後,將所得之瓶自恆溫槽取出,載置於冷卻槽。 First, about 3 to 5 g of the obtained release layer was placed in a 100 mL beaker, and then acetone was injected into the beaker. Thereafter, the sample in the beaker was dried at 105 ° C for 30 minutes using an oven. Next, in a 100 mL bottle, 0.45 to 0.5 g of the dried polymer was measured in an accuracy of 4 points below the decimal point. Next, the weight of the release layer per unit volume was diluted 100 times using an automatic measuring device so that the accuracy was ±0.01 mL. After that, the release layer was transferred to the bottle and the bottle was sealed with a tight gasket. Next, the bottle was heated at 110 ° C for about 60 to 75 minutes while stirring until the release layer was completely melted. Then, the obtained bottle was taken out from the constant temperature bath and placed in a cooling bath.

(2)測定 (2) Determination

首先,將使用量瓶所量取的18mL之溶劑注入黏度計的管狀構件,以洗淨管狀構件內部。然後,在將黏度計的管狀部材設定為35℃+0.1℃起10分後,將聚合物溶液3次注入黏度計。接著,利用幫浦使黏度計內成為真空,在配置於管狀構件上部之容器內吸引溶液。之後,解除黏度計內之真空狀 態,利用計時器測定溶媒通過管狀構件內之2處之間的時間。進行4次該測定,算出平均值。此外,在本測定中係使用自動黏度計(SCHOTT AVS-500)。 First, 18 mL of the solvent measured using the measuring flask was injected into the tubular member of the viscometer to wash the inside of the tubular member. Then, after setting the tubular member of the viscometer to 35 ° C + 0.1 ° C for 10 minutes, the polymer solution was injected into the viscometer three times. Next, the inside of the viscometer was vacuumed by a pump, and the solution was sucked in the container disposed in the upper portion of the tubular member. After that, the vacuum in the viscometer is released. State, using a timer to measure the time between the two passes of the solvent through the tubular member. This measurement was performed four times, and the average value was calculated. In addition, an automatic viscometer (SCHOTT AVS-500) was used in this measurement.

(3)IV值之計算 (3) Calculation of IV value

使用於30℃之酚/四氯乙烷比為3:2之35℃的鄰氯酚作為標準試料。本實施例中之IV值係藉由以下之式(A)算出。 An o-chlorophenol having a phenol/tetrachloroethane ratio of 3:2 at 35 ° C at 30 ° C was used as a standard sample. The IV value in the present embodiment is calculated by the following formula (A).

式(A):IV值={(測定試料之流通時間/標準試料之流通時間)-1}×0.7789+0.111 Formula (A): IV value = {(measurement flow time of sample / circulation time of standard sample) - 1} × 0.7789 + 0.111

末端羧酸量(AV值):藉由指示劑滴定法所測定。具體而言係使用藉由以下方法所調整之試料,由下述式(B)算出。 The amount of terminal carboxylic acid (AV value): determined by indicator titration. Specifically, the sample adjusted by the following method was used and calculated from the following formula (B).

(1)測定試料之調配 (1) Measurement of the preparation of samples

首先,將所得之脫模層21約2g秤量於100mL瓶。接著,於瓶中注入鄰甲酚50mL。然後,在該瓶內投入攪拌子,直到脫模層完全溶解為止約30分鐘,於100±5℃加熱攪拌。脫模層熔融後,載置直到瓶內的溶液溫度成為30℃為止。接著,添加0.01mol/L之氯化鉀溶液3mL,以0.05mol/L之乙醇性氫氧化鉀溶液滴定。 First, about 2 g of the obtained release layer 21 was weighed into a 100 mL bottle. Next, 50 mL of o-cresol was injected into the bottle. Then, a stirrer was placed in the bottle until the release layer was completely dissolved for about 30 minutes, and the mixture was heated and stirred at 100 ± 5 °C. After the release layer was melted, it was placed until the temperature of the solution in the bottle became 30 °C. Next, 3 mL of a 0.01 mol/L potassium chloride solution was added, and the mixture was titrated with a 0.05 mol/L ethanolic potassium hydroxide solution.

(2)標準試料之評價 (2) Evaluation of standard samples

首先,將鄰甲酚50mL秤量於100mL燒瓶。接著,在該100mL燒瓶內投入攪拌子,添加0.01mol/L之氯化鉀溶液3mL。使用與測定試料所用之電極相同者來進行標準試料之滴定。 First, 50 mL of o-cresol was weighed into a 100 mL flask. Next, a stir bar was placed in the 100 mL flask, and 3 mL of a 0.01 mol/L potassium chloride solution was added. The titration of the standard sample was carried out using the same electrode as that used for the measurement of the sample.

(3)AV值之計算 (3) Calculation of AV value

藉由以下之式(B)算出。此外,計算結果係以meq COOH/kg來表示。 It is calculated by the following formula (B). In addition, the calculation results are expressed in meq COOH/kg.

式(B):末端羧酸量={(對於測定試料所滴下之KOH量[mL]-對於標準試料所滴下之KOH量[mL])×KOH之規定數×1000}/測定試料之重量[g] Formula (B): The amount of terminal carboxylic acid = {(the amount of KOH dropped in the measurement sample [mL] - the amount of KOH dropped in the standard sample [mL]) × the specified number of KOH × 1000} / the weight of the measured sample [ g]

脫模性:在脫模薄膜之脫模面貼合有澤製作所公司製的CL(CM型)之黏著劑面,以195℃×2分×6MPa進行熱壓,利用拉伸試驗機(A&D公司製Force gauge AD-4932A-50N),以於180°方向約1000mm/分之速度,測定脫模面與CL黏著劑間之剝離力。測定係在按壓之後立刻實施,基於以下基準 來評價脫模性。 Mold release property: The adhesive surface of CL (CM type) manufactured by Zesho Co., Ltd. was bonded to the release surface of the release film, and hot pressed at 195 ° C × 2 min × 6 MPa, and a tensile tester (manufactured by A&D Co., Ltd.) was used. Force gauge AD-4932A-50N), the peeling force between the release surface and the CL adhesive was measured at a speed of about 1000 mm/min in the 180° direction. The measurement is performed immediately after pressing, based on the following criteria To evaluate the release property.

○:可剝離 ○: peelable

×:不易剝離而薄膜或CL破裂 ×: not easily peeled off and film or CL cracked

追隨性(完工外觀皺紋):依據JPCA規格之「7.5.7.2項皺紋」來測定。 Followability (finished appearance wrinkles): Measured according to the "7.5.7.2 wrinkles" of the JPCA specification.

○:皺紋產生率小於2.0% ○: wrinkle generation rate is less than 2.0%

×:皺紋產生率2.0%以上 ×: wrinkle generation rate is 2.0% or more

CL黏著劑之滲出量:對於電路基板是否有CL之黏著劑層的滲出,依據「JPCA規格之7.5.3.6項覆蓋層的黏著劑之流動及面塗之滲出」,評價朝電路端子部之滲出量。滲出量小於150μm為合格。 The amount of exudation of the CL adhesive: for the presence or absence of the adhesive layer of the CL on the circuit board, the evaluation of the bleed out toward the terminal portion of the circuit according to "JPCA specification 7.5.3.6, Adhesive flow of the cover layer and bleed of the top coat" the amount. The amount of exudation is less than 150 μm .

○:滲出量小於150μm ○: The amount of exudation is less than 150 μ m

×:滲出量150μm以上 ×: The amount of exudation is 150 μm or more

成形性:成形性係依據「JPCA規格之7.5.3.3項的氣泡」以目視進行評價。各符號係如以下所示。將評價樣品數設為各n=100來進行評價,在樣品表面確認有空隙者數小於評價樣品數之2%者為合格。 Formability: Formability was evaluated visually in accordance with "JPCA Standard 7.5.3.3 Bubbles". Each symbol is as follows. The number of evaluation samples was evaluated as n=100, and it was confirmed that the number of voids on the sample surface was less than 2% of the number of evaluation samples.

○:空隙發生率小於2.0% ○: void incidence is less than 2.0%

×:空隙發生率2.0%以上 ×: The void occurrence rate is 2.0% or more

將關於上述評價項目之評價結果示於以下之表1。 The evaluation results regarding the above evaluation items are shown in Table 1 below.

實施例之脫模薄膜,相較於比較例之脫模薄膜,可抑制熱壓時形成脫模薄膜之脫模面的材料之官能基與形成配置該脫模薄膜之對象物表面的材料反應並交互作用,能得到具有良好品質之成型品。 The release film of the embodiment can suppress the reaction of the functional group of the material forming the release surface of the release film during hot pressing with the material forming the surface of the object on which the release film is disposed, compared to the release film of the comparative example. Interaction, can get molded products with good quality.

【產業上之可利用性】 [Industrial Availability]

本發明由於熱壓時形成脫模薄膜之脫模面的材料之官能基與形成配置該脫模薄膜之對象物表面的材料反應並交互作用受到抑制,能適用在要求獲得具有良好品質之成型品的脫模薄膜及脫模薄膜之使用方法。 According to the present invention, since the functional group of the material forming the release surface of the release film during hot pressing reacts with the material forming the surface of the object on which the release film is disposed and the interaction is suppressed, it can be applied to obtain a molded article having good quality. The release film and the use of the release film.

1‧‧‧脫模層 1‧‧‧ release layer

2‧‧‧緩衝層 2‧‧‧buffer layer

3‧‧‧脫模層 3‧‧‧ release layer

10‧‧‧脫模薄膜 10‧‧‧ release film

Claims (15)

一種脫模薄膜,其具有包含聚酯樹脂材料之脫模層;使用該脫模層而藉由指示劑滴定法測得之末端羧酸量為小於40。 A release film having a release layer comprising a polyester resin material; the amount of terminal carboxylic acid measured by indicator titration using the release layer is less than 40. 如申請專利範圍第1項之脫模薄膜,其中,該聚酯樹脂材料為聚對苯二甲酸丁二酯樹脂。 The release film of claim 1, wherein the polyester resin material is a polybutylene terephthalate resin. 如申請專利範圍第1或2項之脫模薄膜,其中,依據ASTM D2857於35℃所測定之該脫模層的固有黏度為0.9以上1.5以下。 The release film of claim 1 or 2, wherein the release layer has an intrinsic viscosity of 0.9 or more and 1.5 or less as measured according to ASTM D2857 at 35 °C. 如申請專利範圍第1至3項中任一項之脫模薄膜,其中,該脫模薄膜形成多層結構。 The release film of any one of claims 1 to 3, wherein the release film forms a multilayer structure. 如申請專利範圍第1至4項中任一項之脫模薄膜,其係形成該脫模層/緩衝層/該脫模層之三層結構而成。 The release film according to any one of claims 1 to 4, which is formed by forming a three-layer structure of the release layer/buffer layer/the release layer. 如申請專利範圍第1至5項中任一項之脫模薄膜,其係疊於覆蓋層薄膜(cover lay film)之表面來使用。 A release film according to any one of claims 1 to 5, which is laminated on the surface of a cover lay film for use. 如申請專利範圍第1至5項中任一項之脫模薄膜,其係疊於覆銅積層板(copper clad laminate)之表面來使用。 A release film according to any one of claims 1 to 5, which is laminated on the surface of a copper clad laminate for use. 一種脫模薄膜之使用方法,其包含於對象物上配置如申請專利範圍第1至7項中任一項之脫模薄膜之步驟,與對於配置有該脫模薄膜之該對象物進行熱壓(hot press)之步驟;在配置脫模薄膜之該步驟中,該對象物配置該脫模薄膜之面係藉由包含半硬化狀態之熱硬化性樹脂的材料所形成。 A method of using a release film comprising the step of disposing a release film according to any one of claims 1 to 7 on a subject, and subjecting the object to which the release film is disposed to be hot pressed (hot press) step; in the step of disposing the release film, the surface of the object to which the release film is disposed is formed of a material containing a thermosetting resin in a semi-hardened state. 一種脫模薄膜,其具有包含聚酯樹脂材料之脫模層;依據ASTM D2857於35℃所測定之該脫模層的固有黏度為0.9以上1.5以下。 A release film having a release layer comprising a polyester resin material; the intrinsic viscosity of the release layer measured at 35 ° C according to ASTM D2857 is 0.9 or more and 1.5 or less. 如申請專利範圍第9項之脫模薄膜,其中,該聚酯樹脂材料為聚對苯二甲酸丁二酯樹脂。 The release film of claim 9, wherein the polyester resin material is a polybutylene terephthalate resin. 如申請專利範圍第9或10項之脫模薄膜,其中,該脫模薄膜形成多層結構。 The release film of claim 9 or 10, wherein the release film forms a multilayer structure. 如申請專利範圍第9至11項中任一項之脫模薄膜,其係形成該脫模層/緩衝層/該脫模層之三層結構而成。 The release film according to any one of claims 9 to 11, which is formed by forming a three-layer structure of the release layer/buffer layer/the release layer. 如申請專利範圍第9至12項中任一項之脫模薄膜,其係疊於覆蓋層薄膜之表面來使用。 A release film according to any one of claims 9 to 12, which is laminated on the surface of the cover film for use. 如申請專利範圍第9至13項中任一項之脫模薄膜,其係疊於覆銅積層板之表面來使用。 A release film according to any one of claims 9 to 13 which is laminated on the surface of a copper clad laminate for use. 一種脫模薄膜之使用方法,其包含於對象物上配置如申請專利範圍第9至14項中任一項之脫模薄膜之步驟,與對於配置有該脫模薄膜之該對象物進行熱壓之步驟;在配置脫模薄膜之該步驟中,該對象物配置該脫模薄膜之面係藉由包含半硬化狀態之熱硬化性樹脂的材料所形成。 A method of using a release film comprising the step of disposing a release film according to any one of claims 9 to 14 on a subject, and hot pressing the object to which the release film is disposed In the step of disposing the release film, the surface of the object to which the release film is disposed is formed of a material containing a thermosetting resin in a semi-hardened state.
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