TW201439689A - Drawing device and drawing method - Google Patents

Abstract

The present invention provides a technique to improve the drawing accuracy of patterns in strip-like areas of a substrate end portion. A drawing apparatus100 irradiates strip-like drawing light on a substrate 90 formed with photoreceptor, so as to draw patterns on the substrate 90. The drawing device 100 includes: a plurality of optical heads 33a~33e to emit the drawing light; a sub-scanning mechanism 221 to move the optical heads 33a~33e relative to the substrate 90 toward the sub-scanning direction (+x direction), and a main scanning mechanism 231 to relatively move toward the main-scanning direction (+y, -y direction). Furthermore, the drawing apparatus 100 includes an autofocus mechanism 6 for automatically adjusting the focus position of drawing light emitted by the plurality of optical heads 33. The autofocus mechanism 6 of heads 33b~33e of the plurality of optical heads 33 uses the substrate position, which is shifted from the central position CP of the drawing light toward the direction (-x direction) opposite to the sub-scanning direction, as the detecting position 71 for detecting changes of the separation distance L1.

Description

Drawing device and drawing method

The present invention relates to a glass substrate for a flat panel display, a substrate for a magnetic disk, and a compact disk for a color filter substrate, a liquid crystal display device, or a plasma display device provided in a semiconductor substrate, a printed circuit board, or a liquid crystal display device. A technique of irradiating light on various substrates such as a substrate or a solar cell panel (hereinafter also simply referred to as "substrate") to draw a pattern on the substrate.

There is known an exposure apparatus (so-called drawing apparatus) that modulates light according to data of a description pattern without using a mask or the like when exposing a pattern such as a circuit on a photosensitive material applied to a substrate (depicting light) The photosensitive material on the substrate is scanned to directly expose the pattern on the photosensitive material. As such a drawing device, for example, an optical head including a spatial light modulator that turns on and off a light beam in units of pixels is known, and the substrate that is relatively moved relative to the optical head is irradiated with the drawing light. A person who exposes (drapes) a pattern on a substrate (for example, refer to Patent Document 1).

In the drawing device, for example, the optical head emits, for example, a strip-shaped drawing light, and moves relative to the substrate (main scanning) along an axis (main scanning axis) orthogonal to the longitudinal direction of the drawing light. By performing the main scanning, pattern exposure is performed on a strip-shaped region along the main scanning axis on the opposite substrate. After the optical head completes the main scanning accompanied by the illumination of the drawing light, the main scanning is performed with the sub-scanning axis orthogonal to the main scanning axis, and then the main scanning is performed with the irradiation of the drawing light. Thereby, the exposure pattern has been used in the previous main scan. The adjacent strip-shaped regions of the strip region are subjected to pattern exposure. In this manner, the main scanning accompanied by the irradiation of the drawing light is repeated by the interval sub-scanning, and the pattern is exposed over the entire area of the substrate. Further, in general, a plurality of optical heads are arranged in advance in the sub-scanning direction, and the pattern is drawn in a plurality of strip-shaped regions simultaneously by the main scanning.

Further, in order to align the focus of the drawing light on the substrate, there is a case where an optical focusing mechanism is provided to the optical head. The autofocus mechanism detects fluctuations in the distance between the optical head and the substrate during pattern drawing, and detects fluctuations in the exposure surface due to bending or unevenness of the substrate. The autofocus mechanism raises and lowers the lens of the optical head according to the change, thereby aligning the focus of the drawing light with the desired exposure surface on the substrate.

[Previous Technical Literature]

[Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open Publication No. 2009-237917

However, when the pattern drawing process is performed by the above-described scanning, there is a case where the detection position of the variation of the above-described distance obtained by the autofocus mechanism becomes the outer side of the substrate or the end of the substrate for one of the plurality of optical heads. . Since the end portion of the substrate is not laminated with a photoresist film or a step or a hole is formed, it is not suitable for the measurement of the above distance. Therefore, there is a case where the autofocus mechanism cannot function normally. Therefore, regarding the strip-shaped region in the vicinity of the substrate end, the drawing accuracy is lowered.

The present invention has been made in view of the above problems, and an object thereof is to provide a technique for improving the drawing accuracy of a pattern of a strip-shaped region at an end portion of a substrate.

In order to solve the above problems, the first aspect is a drawing device that irradiates light onto a substrate on which a photoreceptor is formed to draw a pattern on the substrate, and the drawing device includes a plurality of optical heads arranged in a sub-scanning direction and each of which is emitted. Strip-shaped depicting light; scanning mechanism by The plurality of optical heads are moved relative to the substrate in the sub-scanning direction and the main scanning direction orthogonal to the sub-scanning direction to scan the substrate by the drawing light; and a plurality of autofocus mechanisms are provided on the substrate Each of the plurality of optical heads adjusts a focus position of the drawing light of the optical head in accordance with a variation of the separation distance detected by a detector that detects a variation in a distance between the optical head and the substrate And the autofocusing mechanism of at least a part of the plurality of optical heads is a position on the substrate shifted from a central position of the drawing light to a direction opposite to the sub-scanning direction as a variation of the separation distance Detection position.

Further, the second aspect is the drawing device according to the first aspect, wherein the optical head includes the optical head disposed on the outermost side in the sub-scanning direction.

Further, the third aspect is the drawing device according to the first or second aspect, wherein the part of the optical head includes a mounting mechanism for setting the detection position at a center position with respect to the drawing light in the sub-scanning direction. The detector is mounted in such a manner that it is offset in the opposite direction.

Further, the fourth aspect is the drawing device according to any one of the first aspect to the third aspect, wherein the part of the optical head is the same as the end band portion of the end portion of the substrate in the sub-scanning direction In the above-described autofocusing mechanism of the optical head, when the end band region is drawn, the focus position is adjusted based on the detection result of the variation of the separation distance obtained in the previous main scanning.

Further, the fifth aspect is the drawing device according to any one of the first aspect to the fourth aspect, further comprising: a control unit that controls the scanning mechanism and the autofocus mechanism, wherein the control unit is configured to make the optical portion a head in which the detection position of the autofocus mechanism of the optical head of the end portion of the substrate in the sub-scanning direction is included in a predetermined effective area of the substrate, so that the optical head is along The sub-scanning direction is relatively moved, and then moved in the main scanning direction, and the autofocus mechanism detects the variation of the separation distance.

Further, the sixth aspect is a method of drawing a pattern on a substrate on which a photoreceptor is formed, and drawing a pattern on the substrate, the drawing method comprising: (a) emitting each of a plurality of optical heads arranged in the sub-scanning direction. a step of drawing light in a strip shape; (b) in the step (a), the plurality of optical heads are opposed to the substrate, and the main scanning direction is orthogonal to the sub-scanning direction and the sub-scanning direction Ground moving to scan the substrate by the above-described light scanning; and (c) in the above step (b), detecting, by the detector, a variation of the separation distance between the optical head and the substrate, and cooperating with the detected a step of adjusting a focus of the drawing light of the optical head by the variation of the separation distance; and in the step (c), at least a part of the optical heads of the plurality of optical heads are at a central position from the light to be drawn The change in the separation distance is detected at a position on the substrate offset from the sub-scanning direction.

Further, the seventh aspect is the drawing method according to the sixth aspect, wherein the part of the optical head includes the optical head disposed to the outermost side in the sub-scanning direction.

Further, the eighth aspect is the drawing method according to the sixth or seventh aspect, wherein the part of the optical head includes a mounting mechanism for setting the detection position at a central position with respect to the drawing light in the sub-scanning direction The detector is mounted in such a manner that it is offset in the opposite direction.

Further, the ninth aspect is the drawing method according to any one of the sixth aspect to the eighth aspect, wherein in the step (c), the end portion of the substrate in the sub-scanning direction is drawn for the portion of the optical head The optical head of the end band-shaped region adjusts the focus position based on the detection result of the variation of the separation distance obtained by the previous main scanning when the end band region is drawn.

Further, the tenth aspect is the drawing method of any one of the sixth to ninth aspects, wherein the step (c) comprises: (c-1) to position the substrate for the part of the optical head; The detection position of the optical head in the end strip region of the end portion in the sub-scanning direction is included in a predetermined effective area of the substrate, so that the optical head is along the above a step of relatively moving the sub-scanning direction; and (c-2) a step of detecting the variation of the separation distance while moving the optical head 33 in the main scanning direction after the step (c-1).

According to the first to tenth aspects, the detection position for the variation of the detection interval distance of at least a part of the optical head can be shifted in the direction opposite to the sub-scanning direction with respect to the central position of the drawing light. Thereby, it is possible to increase the possibility that the detection position is set to the area where the detection is effective when the end band portion of the substrate is drawn. Thereby, the drawing accuracy of the end band region can be improved.

Further, according to the second and seventh aspects, the detection position of the optical head for drawing the end band region can be displaced in the direction opposite to the sub-scanning direction with respect to the center of the drawing light. Thereby, the drawing accuracy of the end band region can be improved.

Further, according to the third and eighth aspects, the direction of displacement of the detection position for each optical head can be determined by changing the mounting method of the detector. With the commonality of such parts, it is easy to manage parts and reduce the cost of the device.

Further, according to the fourth and ninth aspects, even when the detection position of the optical head is deviated from the area where the detection is effective when the end band region is drawn, the focus position of the drawing light can be adjusted by the previous detection result. . Therefore, the end band region can be well patterned.

Further, according to the fifth and tenth aspects, before the pattern drawing, the optical head is moved such that the detection position is set to the effective area for detecting the detection, and then the variation of the separation distance is detected. Thereby, even when the detection position is deviated from the predetermined effective area in the pattern drawing of the end band-shaped region, the focus position of the drawing light can be effectively adjusted based on the fluctuation of the interval distance acquired in advance.

1‧‧‧ pedestal

2‧‧‧Mobile board set

3‧‧‧Exposure Department

4‧‧‧Light Modulation Department

5‧‧‧Control Department

6‧‧‧Auto Focus Mechanism

11‧‧‧Bridged structure

21‧‧‧Substrate retention board

22‧‧‧Support board

23‧‧‧floor

24‧‧‧Abutment

31‧‧‧LED light source department

32‧‧‧Lighting optical system

33‧‧‧ Optical head

33a‧‧‧ Optical head

33b‧‧‧ Optical head

33c‧‧ optical head

33d‧‧‧Optical head

33e‧‧ optical head

33R‧‧‧ depicting area

51‧‧‧CPU

52‧‧‧ROM

53‧‧‧RAM

54‧‧‧ memory

55‧‧‧Program

56‧‧‧Display Department

57‧‧‧Operation Department

61‧‧‧Detector

62‧‧‧Installation agency

63‧‧‧ Lifting mechanism

71‧‧‧Detection location

71a‧‧‧Detection location

71b‧‧‧Detection location

71c‧‧‧Detection location

71d‧‧‧Detection location

71e‧‧‧Detection location

81‧‧‧Chart

83‧‧‧ Chart

85‧‧‧Chart

90‧‧‧Substrate

100‧‧‧Drawing device

211‧‧‧Rotating mechanism

211a‧‧‧linear motor

211b‧‧‧Rotary axis

221‧‧‧Sub Scanning Mechanism

221a‧‧‧linear motor

221b‧‧‧Guidance

231‧‧‧Main scanning mechanism

231a‧‧‧Linear motor

231b‧‧‧Guidance

332‧‧‧Projection optical system

541‧‧‧Pattern information

611‧‧‧ Department of Irradiation

613‧‧‧Receiving Department

A‧‧‧distance

AR11‧‧‧ scan direction

AR12‧‧‧ scan direction

AR13‧‧‧ scan direction

CP‧‧‧Central location

CPa‧‧‧Central location

CPb‧‧‧ central location

CPc‧‧‧ central location

CPd‧‧‧ central location

CPe‧‧‧ central location

H‧‧‧ interval

L1‧‧‧ separation distance

Mx‧‧‧moving volume

NR‧‧‧Not suitable for the area

p‧‧‧Width

q‧‧‧Width

R‧‧‧ Effective area VR margin

R1‧‧‧ banded area

R2‧‧‧ banded area

R3‧‧‧ banded area

R11‧‧‧End strip zone

S1‧‧‧ steps

S2‧‧‧ steps

S3‧‧‧ steps

SW‧‧‧Draws the width of light (bar width)

VR‧‧‧effective area

Wb‧‧‧ width of sub-scanning direction

X‧‧‧ directions

X‧‧‧ direction

Y‧‧‧ direction

Y‧‧‧ direction

Z‧‧‧ direction

Fig. 1 is a perspective view showing the outline of the drawing device of the embodiment.

Fig. 2 is a plan view showing the outline of the drawing device.

Figure 3 is a diagram showing the busbar wiring diagram of the device.

Fig. 4 is a perspective view showing an outline of an exposure portion.

Fig. 5 is a plan view showing a substrate on which drawing processing is being performed.

Fig. 6 is a side view showing an outline of an optical head.

Fig. 7 is a schematic front view showing an exposure portion.

Figure 8 is a diagram conceptually showing the position at which a plurality of optical heads perform a main scan on a substrate.

Figure 9 is a schematic plan view showing an optical head depicting an end band region.

Figure 10 is a schematic plan view showing an optical head depicting an end band region.

Figure 11 is a graph showing the amount of variation in the separation distance detected by the detector of the optical head depicting the end band region.

Figure 12 is a graph showing the amount of variation in the separation distance detected by the detector of the optical head depicting the end band region.

Figure 13 is a graph showing the amount of variation in the separation distance detected by the detector of the optical head depicting the end band region.

Figure 14 is a schematic plan view showing an optical head depicting an end band region.

Fig. 15 is a schematic plan view showing an optical head in which a strip-shaped region located at an end portion opposite to the sub-scanning direction in the substrate is drawn.

Fig. 16 is a graph showing a graph showing changes in the surface height of the substrate obtained by pre-focusing.

Fig. 17 is a view showing the flow of the pattern drawing processing.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, in the drawings, for the sake of easy understanding, there is a case where the size or number of each part is exaggerated or simplified.

<1. Device configuration>

Fig. 1 is a perspective view showing the outline of the drawing device 100 of the embodiment. 2 is a plan view showing the outline of the drawing device 100. Furthermore, FIG. 3 is a diagram showing the busbar wiring diagram of the device 100. In FIG. 1, for convenience of illustration and description, the Z-axis direction is defined as a vertical direction, and the XY plane is a horizontal plane. However, it is defined to facilitate the grasp of the positional relationship, and is not limited to the directions described below. By. The same is true for the following figures. Further, in Fig. 2, for convenience of explanation, the bridge structure 11 and the optical head 33 are illustrated by a two-dot chain line.

The drawing device 100 is formed on a layer (photoreceptor) of a photosensitive material (photoresist film) formed on the upper surface of a printed substrate (hereinafter simply referred to as "substrate") 90 for the device formation in the step of manufacturing a printed substrate. The device of the pattern. As shown in FIGS. 1 and 2, the drawing device 100 mainly includes a pedestal 1, a moving plate group 2, an exposure unit 3, and a control unit 5.

○ pedestal 1

The pedestal 1 has a substantially rectangular parallelepiped shape, and has a bridge structure 11 or a moving plate group 2 in a substantially horizontal region of the upper surface thereof. The bridge structure 11 is mounted horizontally above the moving plate group 2 and fixed to the pedestal 1. As shown in FIG. 1, the pedestal 1 integrally supports the moving plate group 2 and the bridge structure 11.

○Mobile board group 2

The moving plate group 2 mainly includes a substrate holding plate 21 that holds the substrate 90 at a substantially horizontal area of the upper surface thereof, a support plate 22 that supports the substrate holding plate 21 from below, and a bottom plate 23 that supports the support plate 22 from below. a base 24 that supports the bottom plate 23 from below; a rotating mechanism 211 that rotates the substrate holding plate 21 about the Z axis; a sub-scanning mechanism 221 that moves the support plate 22 toward the X-axis direction; and a main scanning mechanism 231 It is used to move the bottom plate 23 in the Y-axis direction.

Although not shown in the drawings, the substrate holding plate 21 is provided with a plurality of adsorption holes dispersed on the upper surface thereof. The adsorption holes are connected to a vacuum pump, and by operating the vacuum pump, the gas between the substrate and the substrate holding plate 21 can be exhausted. Thereby, the substrate 90 can be adsorbed and held on the substrate. The upper surface of the plate 21.

As shown in FIG. 2, the rotation mechanism 211 has a linear motor 211a including a mover attached to the (-Y) side end portion of the substrate holding plate 21 and a stator provided on the upper surface of the support plate 22. Further, the rotation mechanism 211 has a rotation shaft 211b between the lower surface side of the central portion of the substrate holding plate 21 and the support plate 22. By operating the linear motor 211a, the mover moves in the X-axis direction along the stator, and the substrate holding plate 21 rotates in a region of a specific angle centering on the rotation shaft 211b on the support plate 22.

The sub-scanning mechanism 221 has a linear motor 221a including a mover mounted on a lower surface of the support plate 22 and a stator provided on an upper surface of the bottom plate 23. Further, the sub-scanning mechanism 221 has a pair of guide portions 221b extending in the X-axis direction between the support plate 22 and the bottom plate 23. By operating the linear motor 221a, the support plate 22 moves in the X-axis direction along the guide portion 221b on the bottom plate 23.

The main scanning mechanism 231 has a linear motor 231a including a mover mounted on the lower surface of the bottom plate 23 and a stator provided on the base 24. Further, the main scanning mechanism 231 has a pair of guiding portions 231b extending in the Y-axis direction between the bottom plate 23 and the pedestal 1. By operating the linear motor 231a, the bottom plate 23 moves in the Y-axis direction along the guide portion 231b on the base 24. Therefore, by holding the substrate 90 on the substrate holding plate 21, the main scanning mechanism 231 is operated, and the substrate 90 can be moved in the Y-axis direction. Further, these mobile mechanisms control the operation of the mobile unit by a control unit 5 which will be described later.

The driving of the rotation mechanism 211, the sub-scanning mechanism 221, and the main scanning mechanism 231 is not limited to those using the linear motors 211a, 221a, and 231a. For example, the rotation mechanism 211 and the sub-scanning mechanism 221 may be driven by a servo motor or a ball screw. Further, instead of moving the substrate 90, a moving mechanism for moving the exposure unit 3 may be provided. Furthermore, both the substrate 90 and the exposure unit 3 can be moved. Moreover, although not shown in the figure, for example, an elevating mechanism that raises and lowers the substrate 90 by moving the substrate holding plate 21 up and down in the Z-axis direction may be provided.

○ Exposure section 3

Referring back to FIG. 1 , the exposure unit 3 includes a plurality of optical units (here, five), and the optical units include an LED (Light Emitting Diode) light source unit 31, an illumination optical system 32, and an optical head 33. . Although not shown in FIG. 1, the LED light source unit 31 and the illumination optical system 32 are provided for each of the optical heads 33. The LED light source unit 31 is a light source device that emits laser light of a desired wavelength based on a required driving signal transmitted from the control unit 5. The light beam emitted from the LED light source unit 31 is guided to the optical head 33 via an illumination optical system 32 including a rod totalizer, a lens, and a mirror surface.

Each of the optical heads 33 irradiates the light emitted from the illumination optical system 32 to the upper surface of the substrate 90. Each of the optical heads 33 is disposed at an upper portion of the side surface of the bridge structure 11 at equal intervals along the X-axis direction.

FIG. 4 is a schematic perspective view showing the exposure unit 3. Moreover, FIG. 5 is a schematic side view showing the optical head 33. Further, in FIG. 4, the light modulation unit 4 and the projection optical system 332 are disposed at specific positions inside the optical heads 33. The light beam emitted from the LED light source unit 31 is formed into a rectangular shape in the illumination optical system 32. Then, the light beam that has passed through the illumination optical system 32 is introduced into the light modulation unit 4, and is irradiated to the modulation operation effective region of the light modulation unit 4.

The light beam that has been irradiated to the light modulation unit 4 is modulated by the control space of the control unit 5, and is incident on the projection optical system 332. The projection optical system 332 doubles the incident light to a desired magnification and directs it onto the substrate 90 that moves in the main scanning direction.

○Light modulation part 4

The light modulation unit 4 is provided with a digital mirror device (DMD: Digital Mirror Device), which adjusts the incident light spatially by electrical control, and does not contribute to the necessary light of the pattern and does not contribute to the depiction of the pattern. Necessary light, reflecting each other in different directions. The DMD is a spatial modulation element in which, for example, a square mirror having a square of about 10 μm is arranged in a matrix of 1920 × 1080. Each mirror is configured to be tilted at a desired angle based on the data written to the memory unit, with the diagonal of the square as the axis. According to the reset letter from the control unit 5 No., each mirror is driven together.

The pattern displayed on the DMD is projected onto the exposure surface of the substrate 90 by the projection optical system 332. Further, as will be described later, the pattern of the DMD is continuously rewritten by the reset pulse generated based on the encoder signal of the main scanning unit 231 as the substrate holding plate 21 generated by the main scanning unit 231 moves. Thereby, the drawing light is irradiated onto the exposure surface of the substrate 90 to form a strip image.

FIG. 5 is a plan view showing the substrate 90 in which the drawing process is being performed. The drawing process is performed by moving the substrate 90 on which the main scanning mechanism 231 and the sub-scanning mechanism 221 are placed on the substrate holding plate 21 relative to the plurality of optical heads 33 under the control of the control unit 5, and the plurality of optical heads 33 are self-contained. Each of these is performed by irradiating the surface of the substrate 90 with spatially modulated light.

In addition, in the following description, the x-axis direction and the y-axis direction orthogonal to each other are defined on the substrate 90. The xy coordinate system defined on the substrate 90 moves along the Y-axis direction of the XYZ coordinate system in accordance with the movement of the substrate 90 generated by the main scanning mechanism 231. Further, the xy coordinate moves along the X-axis direction of the XYZ coordinate system in accordance with the movement of the substrate 90 generated by the sub-scanning mechanism 221.

Moreover, the moving direction of the optical head 33 observed from the substrate 90 when the main scanning mechanism 231 moves the substrate 90 is taken as the main scanning direction. Moreover, the moving direction of the optical head 33 observed from the substrate 90 when the sub-scanning mechanism 231 moves the substrate 90 is referred to as the sub-scanning direction. In the example shown in FIG. 5, the main scanning direction is the +y direction (arrow symbol AR11) and the -y direction (arrow symbol AR13), and the sub-scanning direction is the +x direction (arrow symbol AR12).

First, the substrate holding plate 12 is moved in the -Y direction by the main scanning mechanism 231, whereby the substrate 90 is relatively moved relative to the optical head (main scanning). At this time, as viewed from the substrate 90, the plurality of optical heads 33 relatively move in the +y direction as indicated by the arrow symbol AR11. During the main scanning, each of the optical heads 33 continuously irradiates the substrate 90 with the drawing light having a rectangular cross section that is modulated according to the pattern data 541. That is, light is projected onto the exposure surface of the substrate 90. When each optical head 33 crosses the substrate 90 once in the main scanning direction (+y direction), it is associated with each drawing light. The drawing area 33R passes through the substrate 90, thereby drawing a pattern in the strip-shaped area R1. The strip-shaped region R1 extends in the main scanning direction, and the width along the sub-scanning direction corresponds to a region in which the width (bar width) of the light is drawn. Here, since the five optical heads 33 are simultaneously cross-sectionally formed on the substrate 90, the pattern can be drawn simultaneously in each of the five strip-shaped regions R1 by one main scanning.

After the main scanning is completed once, the substrate holding plate 21 is moved by a predetermined distance in the +X direction by the sub scanning mechanism 221, whereby the substrate 90 is relatively moved relative to the optical head 33 (sub-scanning). At this time, as viewed from the substrate 90, as shown by an arrow symbol AR12, the plurality of optical heads 33 are moved by a predetermined distance in the sub-scanning direction (+x direction).

After the sub-scan is finished, the main scan is performed again. That is, the substrate holding plate 21 is moved in the +Y direction by the main scanning mechanism 231, whereby the substrate 90 is relatively moved relative to the plurality of optical heads 33. At this time, as viewed from the substrate 90, each of the optical heads 33 is moved in the -y direction, as shown by the arrow symbol AR13, across the area of the substrate 90 adjacent to the strip-shaped region R1 depicted by the previous main scan. . In the main scanning, each of the optical heads 33 also continuously irradiates the substrate 90 with the drawing light modulated according to the pattern information 541. Thereby, a pattern is drawn in the strip-shaped region R2 adjacent to the strip-shaped region R1 drawn by the previous main scan.

Hereinafter, the main scanning and the sub-scanning are repeatedly performed in the same manner as described above, and the drawing process is completed after the pattern is drawn on the entire area of the drawing target area on the substrate 90. In the example shown in FIG. 5, each of the optical heads 33 crosses the strip-shaped regions R1, R2, and R3 by three main scanning intervals of two sub-scans, thereby forming a pattern in the entire region of the drawing target region.

○ Control unit 5

As shown in FIG. 3, the control unit 5 includes a CPU (Central Processing Unit) 51, a ROM (Read Only Memory) 52 for reading, and a RAM mainly used as a temporary working area of the CPU 51. (Random Access Memory) 53 and a non-volatile recording medium, that is, the memory 54. Moreover, the control unit 5, the display unit 56, the operation unit 57, the rotation mechanism 211, the sub-scanning mechanism 221, and the main scanning mechanism 231. The respective configurations of the drawing device 100 such as the LED light source unit 31 (in detail, the light source driver), the light modulation unit 4, and the autofocus mechanism 6 are connected, and the operations of the respective configurations are controlled.

The CPU 51 reads and executes the program 55 stored in the ROM 52, thereby performing operations on various materials stored in the RAM 53 or the memory 54.

The memory 54 memorizes the pattern material 541 regarding the pattern to be drawn on the substrate 90. The pattern data 541 is, for example, a material of a vector form produced by a CAD (computer-aided design) software, and is expanded into image data of a raster image. The control unit 5 controls the light modulation unit 4 based on the pattern data 541, thereby modulating the light beam emitted from the optical head 33. Further, in the drawing device 100, a modulated reset pulse is generated based on the linear scale signal transmitted from the linear motor 231a of the autonomous scanning mechanism 231. The patterning light modulated according to the position of the substrate 4 is emitted from each of the drawing heads 33 by the modulation unit 4 that operates based on the reset pulse.

Further, in the present embodiment, the pattern data 541 can be used as a material for a single image (an image representing a pattern to be formed on the entire surface substrate 90), and for example, according to the pattern material 541 for a single image, Each of the optical heads 33 individually generates image data for the portion of the optical head 33 that is each depicted.

The display unit 56 is constituted by a general liquid crystal display or the like, and displays various materials and various materials to the operator by the control of the control unit 5. Further, the operation unit 57 includes various buttons and buttons, a mouse, a touch panel, and the like, and is operated by an operator to input an instruction to the drawing device 100.

○Auto focus mechanism 6

Fig. 6 is a side view showing the outline of the optical head 33. As shown in FIG. 6, an autofocus mechanism 6 is provided on each of the optical heads 33. The autofocus mechanism 6 is provided with a detector 61 for detecting a variation in the distance L1 between the optical head 33 and the substrate 90 (in detail, the exposure surface). The autofocus mechanism 6 cooperates with the change of the separation distance L1 detected by the detector 61. The focus of the light drawn by the optical head 33 is adjusted.

The detector 61 includes an illuminating unit 611 that irradiates the laser light to the substrate 90, and a light receiving unit 613 that receives the laser light reflected by the substrate 90. The illuminating unit 611 causes the laser light to be incident on the upper surface of the substrate 90 along an axis which is inclined at a specific angle with respect to the normal direction of the surface of the substrate 90 (here, the Z-axis direction), and is irradiated in a spot shape. In the following description, the position on the substrate 90 on which the laser light is irradiated is taken as the detection position 71. The light receiving unit 613 includes, for example, a line sensor extending in the Z-axis direction. The variation of the upper surface of the substrate 90 is detected based on the incident position of the laser light on the line sensor. The detector 61 is fixed to the optical head 33 via a mounting mechanism 62 provided on the outer peripheral surface of the housing of the projection optical system 332 of the optical head 33.

Further, the autofocus mechanism 6 includes an elevating mechanism 63 that raises and lowers the lens of the projection optical system 332 in the Z-axis direction in accordance with the amount of fluctuation detected by the detector 61. The amount of fluctuation detected by the detector 61 is supplied to the control unit 5 or a dedicated arithmetic circuit (not shown), and the arithmetic processing is performed in accordance with a required program. Thereby, the amount of lifting and lowering of the lens generated by the lifting mechanism 63 is determined.

Fig. 7 is a schematic front view showing the exposure portion 3. In FIG. 7, in order to recognize the five optical heads 33, the symbols "a" to "e" are sequentially attached to the symbol "33" in the sub-scanning direction (+x direction). For example, the optical head 33 disposed on the outermost side in the direction opposite to the sub-scanning direction (-x direction) is the optical head 33a, and the optical head 33 disposed on the outermost side in the sub-scanning direction is the optical head 33e.

Further, in the detection position 71 of each of the autofocus mechanisms 6 included in each of the optical heads 33, the symbols "a" to "e" are respectively attached to the symbol "71" in the same manner as described above. For example, the detection position 71 of the autofocus mechanism 6 of the optical head 33a is set to the detection 71a.

Further, in the same manner as described above, the symbol "a" to "e" are respectively attached to the symbol "CP" in the center position CP of the sub-scanning direction of the drawing light emitted from each of the optical heads 33. For example, the central position CP of the drawing light of the optical head 33a is the central position CPa.

In the present embodiment, the detection position 71 of each autofocus mechanism 6 is relative to the pair. The central position CP of the light of the optical head 33 is shifted to the sub-scanning direction (+x direction) or its opposite direction (-x direction). More specifically, the optical head 33a is set at a position shifted by a predetermined distance from the center position CPa in the sub-scanning direction (+x direction). On the other hand, in the other optical heads 33b to 33e, the respective detection positions 71b to 71e are set to be offset from the center positions CPb to CPe in a direction opposite to the sub-scanning direction (-x direction) by a predetermined distance. Location.

The direction of displacement of the detection position 71 relative to the center position CP is determined by the mounting direction of the detector 61 relative to the optical head 33. In other words, as shown by the solid line, the mounting unit 62 fixes the detector 61 such that the irradiation unit 611 is disposed on the -Y side and the light receiving unit 613 is disposed on the +Y side. In this state, the detection position 71 is in a state of being displaced in the direction (-x direction) opposite to the sub-scanning direction with respect to the center position CP of the drawing light. Further, the detector 61 may be attached to the mounting mechanism 62 by rotating the detector 61 by 180 degrees, and the detector 61 may be fixed to the optical unit 613 while being disposed on the +Y side, and the light receiving unit 613 being disposed on the -Y side. Head 33. In this state, the detection position 71 is in a state of being displaced in the sub-scanning direction (+x direction) with respect to the center position CP of the drawing light. By providing such a mounting mechanism 62, the displacement direction of the detection position 71 can be changed by changing the mounting direction of the detector 61. In this way, the number of parts can be reduced by making the parts common. Therefore, it is easy to carry out part management, and it is also possible to reduce the cost of the device.

As shown in FIG. 5, a strip-shaped region (hereinafter, referred to as an end band-shaped region R11) on the end portion of the substrate 90 in the sub-scanning direction due to the width of the substrate 90 in the sub-scanning direction is provided. The case where the scanning area 33R is narrower. In this case, depending on the set position of the detection position 71 of the autofocus mechanism 6, there is a setting which is set at a position deviated from the object to be drawn. In the vicinity of the end portion of the substrate 90, there is a case where there is a step or the like, and if the autofocus mechanism 6 functions outside the drawing target region, the drawing accuracy is remarkably lowered.

In the present embodiment, the detection positions 71b to 71e of the respective autofocus mechanisms 6 included in the optical heads 33b to 33e are set at the central positions CPb to CPe with respect to the drawing light. Positioned in the opposite direction to the sub-scanning direction. That is, the detection position 71 of the autofocus mechanism 6 of each optical head 33 is displaced in the direction toward the inner side of the substrate 90. Therefore, it is possible to increase the position of the detection position 71 in the end band region R11 near the end portion of the substrate 90 and set it on the drawing target region. In view of this point, the research is done mathematically with reference to FIGS. 8 to 10.

FIG. 8 is a diagram conceptually showing a position at which a plurality of optical heads 33 perform main scanning on the substrate 90. As shown in FIG. 8, the width of the substrate 90 in the sub-scanning direction is Wb, the width of the drawing light (bar width) is SW, and when the interval between the adjacent optical heads 33 and 33 is H, the substrate 90 is drawn. The optical head 33 of the end band portion R11 of the end portion in the sub-scanning direction is determined by the following equation using the INT function.

N=int(Wb/H)+1‧‧‧(Form 1)

Here, N means the number of the optical head 33, and the head numbers "1" to "5" correspond to the optical heads 33a to 33e, respectively.

Moreover, the number of main scans (bar number S) when the end band region R11 is drawn is calculated by the following equation.

S=(Wb-(N-1)×H)/SW+1‧‧‧(Form 2)

Moreover, the width p of the end portion of the drawing light (the end portion opposite to the sub-scanning direction) emitted from the optical head 33 for drawing the end band-shaped region R11 to the end portion of the substrate 90 in the sub-scanning direction is Calculated by the following formula.

p=Wb-(N-1)×H-(S-1)×SW‧‧‧(Formula 3)

9 and 10 are schematic plan views showing the optical head 33 which depicts the end strip region R11. In FIGS. 9 and 10, the distance from the end in the opposite direction (-x side) from the sub-scanning direction of the drawing light to the detection position 71 is a. Further, since the end portion of the substrate 90 is apart from the region of the specific width (q), since the photoresist film is not laminated or a step or a hole is formed, it is not suitable for the region where the distance J1 is measured by the detector 61. (Not suitable for area NR). Fig. 9 is a view showing a state in which p-q≦a is established, and Fig. 10 is a view showing a state in which p-q>a is established. Figure.

As shown in FIG. 9, when p-q≦a is established, the detection position 71 is included in the unsuitable area NR. In this case, since the position of the surface of the substrate 90 is measured by the detector 61 and the adjustment of the inappropriate focus based on the result is performed, the focus of the light is shifted. On the other hand, as shown in FIG. 10, when p-q>a is satisfied, the detection position 71 is included in the area (effective area VR) which is more suitable for the area NR and more inside the substrate 90. Thereby, since the appropriate focus adjustment can be performed even in the end band-shaped region R11, the pattern can be drawn with high precision.

As described above, the smaller the a detection position 71 is, the higher the possibility of setting the position on the substrate 90 at the distance L1. As a result, the pattern of the high-precision pattern can be realized. Further, when a is set to "0" (that is, when the detection position 71 is set to the position of the inner end portion of the drawing light), the state shown in Fig. 9 is always maintained, and theoretically there is no detection position. 71 is included in the possibility of not suitable for the area NR. However, when the detection position 71 is set in the direction parallel to the sub-scanning direction and is set at the position where the light is shifted, it may be generated in one rectangular drawing light, and the exposure accuracy of the portion of the light from the detection position 71 away from the detection light 71 may be generated. Reduce the problem of inhomogeneity. Therefore, from the viewpoint of realizing high-precision drawing, it can be said that the detection position 71 is set as close as possible to the center position CP of the drawing light with respect to the sub-scanning direction.

<Processing when the detection position 71 is not suitable for the area NR>

When the optical head 33 depicts the end band region R11, as shown in FIG. 9, the detection position 71 of the autofocus mechanism 6 is included in the case where the region NR is not suitable (that is, when pq≦a is established), and the optical is utilized. The detection result of the variation of the separation distance L1 obtained by the previous main scan performed by the head 33 is also effective. The reason is because the end band-like region R11 is predicted to be similar in height to the band-like region R1 adjacent thereto. As the autofocus processing using the detection result of the previous main scan as described above, for example, a plurality of aspects described below will be exemplified.

11 to 13 are views showing the amount of change in the separation distance L1 detected by the detector 61 of the optical head 33 which depicts the end band-shaped region R11. In FIGS. 11 to 13, the horizontal axis represents the position of the substrate 90 in the y-axis direction, and the vertical axis represents the amount of variation of the separation distance L1. Further, a graph 83 indicated by a broken line indicates a variation in the separation distance L1 detected at the time of main scanning before the end strip region R11 is drawn. Further, a graph 81 indicated by a solid line indicates an imaginary fluctuation of the separation distance L1 determined by drawing the end strip region R11.

First, as shown in FIG. 11, in the first autofocus processing, the amount of change in the distance L1 at the time of drawing the end band region R11 is the last detected amount of change in the previous main scan. Therefore, in the first autofocus processing, the focus position of the drawing light is fixed at the focus position of the drawing light when the amount of change is finally detected at the time of the previous main scanning. In this case, there is an advantage that no special arithmetic processing is required. Further, there is an advantage that it is not necessary to maintain all the data of the amount of change detected in the previous main scan.

Further, as shown in FIG. 12, in the second autofocus processing, the fluctuation amount of the separation distance L1 when the end band region R11 is drawn is the average value of the fluctuation amount detected in the previous main scan.

Further, as shown in FIG. 13, in the third autofocus processing, the amount of change in the distance L1 when the end band region R11 is drawn is set to be the same position as the sub-scanning direction in the previous main scan. The amount of change. In the case of this aspect, since the autofocus processing is performed in accordance with the position of the main scanning direction of the substrate 90, there is an advantage that the possibility of realizing high-precision drawing is high.

Any of the examples described above with reference to FIGS. 11 to 13 performs other main scanning before the main scanning for the end strip region R11. However, depending on the width of the substrate 90 (in detail, the width of the drawing target region), it is also assumed that there is no previous main scanning, that is, a case where the pattern is drawn by the first main scanning in the end band region R11. In this case, the pre-focusing process is performed before the start of drawing.

In the pre-focusing process, the end band region R11 is drawn in the first main scan. The detection position 71 of the detector 61 provided in the optical head 33 is included in the effective area VR, and the substrate 90 is moved in a direction opposite to the sub-scanning direction. Further, in a state where the detection position 71 is included in the effective area VR, the substrate 90 is moved in the main scanning direction, and the detector 61 detects the variation of the separation distance L1 between the respective positions of the end strip regions R11 of the substrate 90. And stored in the memory department (also includes temporary memory information such as RAM). Further, in the pattern drawing processing, the data of the amount of fluctuation obtained at the time of the pre-focusing processing is read from the memory unit in advance, and is used for the autofocus processing of the optical head 33 for drawing the end strip region R11.

Fig. 14 is a schematic plan view showing the optical head 33 which depicts the end band region R11. Moreover, FIG. 15 is a schematic plan view showing the optical head 33 in which the strip-shaped region R1 located at the end opposite to the sub-scanning direction of the substrate 90 is drawn.

As shown in FIG. 14, the substrate 90 is moved in the -X direction at the time of the pre-focusing process. When viewed from the substrate 90, the optical head 33 relatively moves by the movement amount Mx in a direction opposite to the sub-scanning direction. The amount of movement Mx is expressed by the following equation in consideration of the margin (r) of the effective area VR.

Mx=a-p+q+r (Formula 4)

Further, by moving the substrate 90 in the -X direction, the detection position 71 of the detector 61 provided in the optical head 33 of the strip-shaped region R1 of the substrate 90 in the opposite direction to the sub-scanning direction is close to the substrate 90. The end. For the optical head 33 which depicts the strip-shaped region R1, it is not necessary to perform a pre-focusing process. The reason is that even if the pre-focusing process is not performed, the variation of the separation distance can be detected in the effective region VR when the strip region R1 is drawn. However, when the pre-focusing process is also performed on the optical head 33, it is necessary to include the detection position 71 of the detector 61 provided in the optical head 33 in the effective area VR when the substrate 90 is moved in the -X direction. Therefore, it is necessary to satisfy the following conditional expression as shown in FIG.

SW-a>a-p+2q+2r‧‧‧(式5)

a<SW/2-q-r‧‧‧(Form 6)

Figure 16 is a diagram showing the variation of the surface height of the substrate 90 obtained by the pre-focusing process. Figure 85. As shown in FIG. 16, when the height of the surface of the substrate 90 is detected, the amount of fluctuation of the highest frequency of occurrence is obtained by the arithmetic unit provided in the control unit 5 or the autofocus mechanism 6. Then, the main scanning is performed in a state where the focus position of the optical head 33 is fixed to the position corresponding to the fluctuation amount, and the pattern of the end band-shaped region R11 is scanned. Of course, as described in FIGS. 11 to 13, the variation amount of the separation distance L1 at the time of drawing the end band-shaped region R11 can be set as the amount of variation finally obtained in the pre-focusing process, which is obtained at the time of the pre-focusing process. The average of the amount of change or the amount of change in the corresponding position obtained during the pre-focusing process.

<2. Flow of pattern drawing processing>

Next, the flow of the pattern drawing processing of the drawing device 100 will be briefly described. Fig. 17 is a view showing the flow of the pattern drawing processing.

First, pre-focus processing is performed before the drawing process (FIG. 17: step S1). Next, after the pre-focusing process is completed, the operation content of the autofocus mechanism 6 when the end band region R11 is drawn is determined (FIG. 17: Step S2). Specifically, it is determined (1) where the optical head 33 performs the drawing of the end band region R11, and (2) the drawing of the end band region R11 is performed by the main scanning of the first few times. Further, it is determined (3) whether or not the detection position 71 of the autofocus mechanism 6 serving as the optical head 33 of the drawing is included in the preset effective area VR. Since the detection position 71 is included in the effective area VR, the fluctuation of the separation distance L1 can be smoothly measured, so that the normal auto focus processing operation is selected. On the other hand, when the detection position 71 is included in the unsuitable area NR outside the effective area VR, as described above, the auto focus processing using the detection result of the variation of the separation distance L1 obtained in the previous main scanning is selected.

After the operation of the autofocus mechanism 6 of the end band region R11 is determined, pattern drawing processing is performed (FIG. 17: Step S3). In the step S3, the first main scanning system performs the autofocus processing using the results obtained in the prefocusing processing of the step S1. Further, the end band-shaped region R11 is controlled such that the autofocus mechanism 6 performs the operation determined in step S2. The pattern of the drawing object area of the substrate 90 is described as above. painted.

The present invention has been described in detail above, but the description thereof is exemplified in all aspects, and the present invention is not limited thereto. Numerous variations that are not exemplified without departing from the scope of the invention are apparent.

3‧‧‧Exposure Department

6‧‧‧Auto Focus Mechanism

33a‧‧‧ Optical head

33b‧‧‧ Optical head

33c‧‧ optical head

33d‧‧‧Optical head

33e‧‧ optical head

61‧‧‧Detector

71a‧‧‧Detection location

71b‧‧‧Detection location

71c‧‧‧Detection location

71d‧‧‧Detection location

71e‧‧‧Detection location

90‧‧‧Substrate

332‧‧‧Projection optical system

613‧‧‧Receiving Department

CPa‧‧‧Central location

CPb‧‧‧ central location

CPc‧‧‧ central location

CPd‧‧‧ central location

CPe‧‧‧ central location

L1‧‧‧ separation distance

X‧‧‧ directions

X‧‧‧ direction

Y‧‧‧ direction

Y‧‧‧ direction

Z‧‧‧ direction

Claims (10)

A drawing device for irradiating light onto a substrate on which a photoreceptor is formed to draw a pattern on the substrate, and comprising: a plurality of optical heads arranged in a sub-scanning direction and each emitting strip-shaped drawing light; and a scanning mechanism And scanning the substrate by the drawing light by moving the plurality of optical heads relative to the substrate in the sub-scanning direction and the main scanning direction orthogonal to the sub-scanning direction; and a plurality of autofocus mechanisms And arranging the optical heads on each of the plurality of optical heads, and adjusting the variation of the separation distance detected by a detector that detects a change in a separation distance between the optical head and the substrate Depicting a focus position of the light; and the autofocusing mechanism of at least a part of the plurality of optical heads is located on a substrate offset from a central position of the drawing light in a direction opposite to the sub-scanning direction The detection position of the above variation of the separation distance. The drawing device of claim 1, wherein the part of the optical heads is one or more of the optical heads disposed on the outermost side in a direction opposite to the sub-scanning direction. The drawing device of claim 1, wherein the part of the optical head comprises: a mounting mechanism for setting the detection position to a position offset from the central position of the drawing light toward the sub-scanning direction or an opposite direction thereof; Install the above detector. The drawing device of claim 1, wherein the optical head of the drawing substrate in the partial optical head is located at an end strip region of the end portion in the sub-scanning direction The autofocus mechanism adjusts the focus position based on the detection result of the variation of the separation distance obtained in the previous main scan when the end band region is drawn. The drawing device of claim 1, further comprising: a control unit that controls the scanning mechanism and the autofocus mechanism; and the control unit operates to cause the substrate to be drawn in the sub-scanning direction at a portion of the optical head The detection position of the autofocus mechanism of the optical head of the end band region is included in a predetermined effective area of the substrate, so that the optical head relatively moves along the sub-scanning direction, and then faces the main scanning direction. Moving, the autofocus mechanism performs the detection of the variation of the separation distance. A drawing method for irradiating a substrate on which a photoreceptor is formed to draw a pattern on the substrate, and comprising: (a) each of a plurality of optical heads arranged in a sub-scanning direction emits a strip-shaped drawing light (b) in the step (a), the plurality of optical heads are relatively moved in the sub-scanning direction and the main scanning direction orthogonal to the sub-scanning direction by the plurality of optical heads relative to the substrate Depicting a step of scanning the substrate; and (c) in the step (b), detecting, by the detector, a variation in the distance between the optical head and the substrate, and matching the detected variation in the separation distance, a step of adjusting a focus of the light drawn by the optical head; and in the step (c), at least a part of the optical heads of the plurality of optical heads are opposite to the sub-scanning direction from a central position of the drawing light The position on the substrate shifted in direction is detected as a change in the separation distance. The drawing method of claim 6, wherein the part of the optical head includes the above-mentioned pair The scanning head is disposed on the outermost optical head. The drawing method of claim 6, wherein the part of the optical head includes a mounting mechanism for setting the detection position to a position shifted to a position relative to the sub-scanning direction or an opposite direction with respect to a central position of the drawing light, Install the above detector. The drawing method of claim 6, wherein in the step (c), the optical head of the end portion of the substrate in the sub-scanning direction of the substrate is drawn on the end portion In the case of the strip region, the focus position is adjusted based on the detection result of the variation of the above-described separation distance obtained by the previous main scan. The drawing method of claim 6, wherein the step (c) comprises: (c-1), wherein the optical head of the end strip region of the end portion of the substrate in the sub-scanning direction is drawn for the portion of the optical head The detecting position is included in a predetermined effective area of the substrate, and the optical head is relatively moved along the sub-scanning direction; and (c-2) after the step (c-1), the optical is made The step of detecting the change in the separation distance while the head is relatively moved in the main scanning direction.