JP2008129248A - Pattern drawing device and pattern drawing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pattern drawing device capable of decreasing irregularity occurring in the seam of scanning regions. <P>SOLUTION: The pattern drawing device draws a pattern by exposure scanning in a plurality of times in a main scanning direction. The width h where an exposure head is relatively moved in a sub-scanning direction with respect to a substrate 9 between a preceding scanning exposure and a succeeding scanning exposure is shorter than the width w of one scanning region As in the sub-scanning direction. Thereby, scanning regions As partially overlap in the preceding exposure scanning and the succeeding exposure scanning. Consequently, an overlap region B1 is formed in the seam between adjacent scanning regions As, where exposure scanning is carried out twice by the preceding exposure scanning and the following exposure scanning. Since the influences of non-uniformity characteristics at both ends of the exposure head are mixed and averaged in the overlap region B1, irregularity occurring in the seam of scanning regions As can be decreased. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to a technique for drawing a regular pattern on a substrate on which a photosensitive material is formed.

  Conventionally, in the manufacturing process of substrates for color filters, liquid crystal display devices, flat panel display (FPD) glass substrates such as liquid crystal display devices and plasma display devices, semiconductor substrates, printed circuit boards and the like, photosensitive materials have been used. 2. Description of the Related Art A pattern drawing apparatus that draws a regular pattern on the surface of a substrate by irradiating the substrate with the light is used.

  As such a pattern drawing apparatus, for example, one described in Patent Document 1 is known. The pattern drawing apparatus of Patent Document 1 includes an exposure head that exposes a substrate by irradiating the substrate with light from a light source that has passed through an opening of the mask, and the exposure head is exposed to the substrate while irradiating light from the exposure head. Are moved relative to each other in a predetermined main scanning direction so that a regular pattern is drawn on the substrate.

JP 2006-145745 A

  In the pattern drawing apparatus as described above, pattern drawing on the substrate is not performed by one exposure scanning in the main scanning direction, but multiple exposures in the main scanning direction using a relatively compact exposure head. Proposed by scanning. In this case, the exposure head is moved relative to the substrate in the sub-scanning direction orthogonal to the main scanning direction between the preceding exposure scanning and the subsequent exposure scanning.

  By the way, when the pattern drawing is performed by a plurality of exposure scans in the main scanning direction as described above, the plurality of scanning regions that are the targets of the plurality of exposure scans are sub-scanning directions on the substrate. Are arranged in close contact with each other. At the boundary between adjacent scanning regions, the size and position of the drawn pattern are discontinuous due to aberrations of the optical system, position error of the opening of the mask, movement error of the exposure head, etc. May change. Since the discontinuity of the pattern generated at the joint of the scanning regions is recognized as unevenness on the product, an improvement measure has been demanded.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a pattern drawing apparatus that can alleviate unevenness that occurs at the joint between adjacent scanning regions.

  In order to solve the above problems, the invention of claim 1 is a pattern drawing apparatus for drawing a regular pattern on a substrate on which a photosensitive material is formed, and includes a light source and a plurality of openings in a predetermined sub-scanning direction. An exposure head having apertures arranged at regular intervals, irradiating the substrate with light from the light source that has passed through the plurality of openings, exposing the substrate, and drawing the pattern; and the substrate Relative to the main scanning direction orthogonal to the sub-scanning direction, the main scanning mechanism for causing the exposure head to perform exposure scanning on the substrate, and the preceding exposure scanning and the subsequent exposure scanning. A sub-scanning mechanism that moves the exposure head relative to the substrate in the sub-scanning direction to change a scanning area on the substrate that is subject to the exposure scanning, and the sub-scanning mechanism includes: The above A part of the scanning area is divided between the preceding exposure scanning and the subsequent exposure scanning by changing the scanning area by relatively moving the exposure head with a width shorter than the width of the inspection area in the sub-scanning direction. Are duplicated.

  According to a second aspect of the present invention, in the pattern drawing apparatus according to the first aspect, the number of exposures in the preceding exposure scan and the subsequent exposure scan for each pattern included in the overlapping range of the scanning region. The result obtained by adding the number of exposures is equal to the number of exposures for each pattern included in the non-overlapping range of the scanning region.

  According to a third aspect of the present invention, in the pattern drawing apparatus according to the first aspect, one pattern row along the main scanning direction included in the overlapping range of the scanning regions corresponds to the preceding exposure scanning. The result of adding the lengths in the main scanning direction of the aperture of the aperture and the aperture of the aperture corresponding to the subsequent exposure scan corresponds to the non-overlapping range of the scanning region. This coincides with the length in the main scanning direction of the opening of the aperture.

  According to a fourth aspect of the present invention, in the pattern drawing apparatus according to the third aspect, in the aperture portion, the length in the main scanning direction of the opening corresponding to the overlapping range corresponds to the non-overlapping range. This is half the length of the opening in the main scanning direction.

  The invention according to claim 5 is the pattern drawing apparatus according to claim 1, wherein the aperture section includes an opening row composed of a plurality of openings arranged at regular intervals in the sub-scanning direction. A plurality of openings are provided in each direction, and each of the plurality of openings corresponds to one pattern by one light irradiation, and the preceding pattern row in the main scanning direction is included in the overlapping range of the scanning region. The result obtained by adding the respective numbers of the apertures of the aperture corresponding to the exposure scanning of the aperture and the apertures of the aperture corresponding to the subsequent exposure scanning is included in the non-overlapping range of the scanning region. This corresponds to the number of openings of the aperture corresponding to one pattern row along the main scanning direction.

  The invention according to claim 6 is the pattern drawing apparatus according to claim 5, wherein, in the aperture section, the number of openings in the main scanning direction corresponding to the overlapping range corresponds to the non-overlapping range. Half of the number in the main scanning direction.

  The invention according to claim 7 is the pattern drawing apparatus according to claim 1, wherein each pattern included in the overlapping range of the scanning area is either one of the preceding exposure scan and the subsequent exposure scan. The exposure head draws a part of the pattern at a constant pitch in the preceding exposure scan for one pattern row along the main scanning direction included in the overlapping range of the scanning region, The remaining pattern is drawn by the subsequent exposure scanning.

  The invention according to claim 8 is a pattern drawing method for drawing a regular pattern on a substrate on which a photosensitive material is formed, wherein the aperture has a plurality of openings arranged at predetermined intervals in a predetermined sub-scanning direction. An exposure head that irradiates the substrate with light from a predetermined light source that has passed through the plurality of openings, exposes the substrate, and draws the pattern, in the sub-scanning direction with respect to the substrate The exposure head is moved relative to the substrate between a main scanning step of causing the exposure head to perform exposure scanning on the substrate and a preceding exposure scan and a subsequent exposure scan. A sub-scanning step of changing the scanning region on the substrate to be subjected to the exposure scanning, and in the sub-scanning step, the width of the scanning region in the sub-scanning direction Shorter than In by changing the scanning region by relatively moving the exposure head, to duplicate a portion of the scanning region and the subsequent exposure scanning and exposure scanning of the preceding.

  According to the first to eighth aspects of the present invention, since a part of the scanning area related to the continuous exposure scanning is overlapped, the joints of the adjacent scanning areas can be smoothly connected. As a result, it is possible to alleviate unevenness that occurs at the joint of the scanning areas.

  In particular, according to the second aspect of the present invention, the exposure amount of each pattern included in the overlapping range of the scanning region can be matched with the exposure amount of each pattern included in the non-overlapping range.

  In particular, according to the invention of claim 3, the exposure amount of each pattern included in the overlapping range of the scanning region can be matched with the exposure amount of each pattern included in the non-overlapping range.

  In particular, according to the invention of claim 4, since the influence of the non-uniform characteristics of the both ends of the exposure head can be reflected at the same rate, the joints in the adjacent scanning regions can be connected more smoothly.

  In particular, according to the invention of claim 5, the exposure amount of each pattern included in the overlapping range of the scanning region can be matched with the exposure amount of each pattern included in the non-overlapping range.

  In particular, according to the invention of claim 6, since the influence of the non-uniform characteristics at both ends of the exposure head can be reflected in the drawing result at the same rate, the joints in the adjacent scanning regions can be connected more smoothly. Can do.

  In particular, according to the invention of claim 7, since each of the pattern drawn by the preceding exposure scan and the pattern drawn by the subsequent exposure scan can be periodically present, both ends of the exposure head It can prevent that the characteristic of a part is reflected unevenly.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

<1. First Embodiment>
<1-1. Configuration>
1 and 2 are diagrams showing a configuration of the pattern drawing apparatus 1 according to the first embodiment, in which FIG. 1 is a side view and FIG. 2 is a top view. The pattern drawing device 1 is a glass substrate for color filter (hereinafter simply referred to as “substrate”) on which a photosensitive material (in this embodiment, a color resist) is formed in the process of manufacturing a color filter of a liquid crystal display device. Reference numeral 9 denotes an apparatus for drawing a predetermined pattern. As shown in FIGS. 1 and 2, the pattern drawing apparatus 1 mainly includes a base 11, a stage 10 for holding the substrate 9, a drive unit 20 that drives the stage 10 relative to the base 11, And a plurality of exposure heads 30.

  In the following description, the three-dimensional XYZ orthogonal coordinates shown in the figure are used as appropriate when indicating the direction and direction. The XYZ axes are fixed relative to the base 11. Here, the X-axis and Y-axis directions are horizontal directions, and the Z-axis direction is a vertical direction. The main scanning direction in the pattern drawing apparatus 1 corresponds to the Y-axis direction, and the sub-scanning direction corresponds to the X-axis direction.

  The stage 10 has a flat outer shape and functions as a holding unit that holds the substrate 9 placed on the upper surface thereof in a substantially horizontal posture. A plurality of suction holes (not shown) are formed on the upper surface of the stage 10. The substrate 9 placed on the stage 10 is fixed and held on the upper surface of the stage 10 by the suction pressure of these suction holes.

  The drive unit 20 drives the base 10 to move the stage 10 in the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (rotation direction about the Z-axis). Mechanism. The drive unit 20 includes a rotation mechanism 21 that rotates the stage 10, a support plate 22 that supports the stage 10 from the lower surface side, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. A base plate 24 that supports the support plate 22, and a main scanning mechanism 25 that moves the base plate 24 in the main scanning direction.

  The rotation mechanism 21 includes a linear motor 21 a that is configured by a mover attached to the −Y side end of the stage 10 and a stator laid on the upper surface of the support plate 22. The rotation mechanism 21 has a rotation shaft 21b between the lower surface side of the center portion of the stage 10 and the support plate 22. For this reason, when the linear motor 21a is operated, the mover moves in the X-axis direction along the stator, and the stage 10 rotates within a predetermined angle range around the rotation shaft 21b on the support plate 22.

  The sub-scanning mechanism 23 includes a linear motor 23 a configured by a mover attached to the lower surface of the support plate 22 and a stator laid on the upper surface of the base plate 24. In addition, the sub-scanning mechanism 23 has a pair of guide portions 23 b extending in the sub-scanning direction between the support plate 22 and the base plate 24. For this reason, when the linear motor 23a is operated, the support plate 22 moves in the sub-scanning direction along the guide portion 23b on the base plate 24. Since the stage 10 is supported by the support plate 22, the sub-scanning mechanism 23 moves the stage 10 with respect to the base 11 in the sub-scanning direction.

  The main scanning mechanism 25 has a linear motor 25 a configured by a mover attached to the lower surface of the base plate 24 and a stator laid on the base 11. The main scanning mechanism 25 has a pair of guide portions 25b extending in the main scanning direction between the base plate 24 and the base 11. For this reason, when the linear motor 25 a is operated, the base plate 24 moves in the main scanning direction along the guide portion 25 b on the base 11. Since the stage 10 is supported by the support plate 22 and the base plate 24, the main scanning mechanism 25 moves the stage 10 with respect to the base 11 in the main scanning direction.

  The plurality of exposure heads 30 irradiate the upper surface of the substrate 9 placed on the stage 10 with pulsed light, expose the substrate 9 and draw a regular pattern. The base 11 is fixedly provided with a frame 31 having a bridge structure that spans −X side and + X side ends of the base 11 along the sub-scanning direction and straddles the stage 10 and the drive unit 20. The plurality of exposure heads 30 are attached to the frame 31 in the same pitch along the sub-scanning direction. Accordingly, the positions of the plurality of exposure heads 30 are fixed with respect to the base 11.

  As described above, the main scanning mechanism 25 and the sub scanning mechanism 23 of the drive unit 20 move the stage 10 relative to the base 11. Therefore, when the main scanning mechanism 25 is driven, the plurality of exposure heads 30 move relative to the substrate 9 placed on the stage 10 in the main scanning direction, and when the sub-scanning mechanism 23 is driven, the stage 10. The plurality of exposure heads 30 move relative to the substrate 9 placed thereon in the sub-scanning direction.

  Each exposure head 30 is connected to one laser oscillator 33 which is a light source of pulsed light via an illumination optical system 32, and a laser driving unit 34 is connected to the laser oscillator 33. Therefore, when the laser driving unit 34 is operated, pulse light is oscillated from the laser oscillator 33, and the oscillated pulse light is guided into each exposure head 30 through the illumination optical system 32.

  In each exposure head 30, an emission part 35 for emitting the pulsed light guided by the illumination optical system 32 downward, and a part of the pulsed light to form a light beam having a predetermined shape. Aperture part 36 and a projection optical system 37 for irradiating the upper surface of the substrate 9 with the light beam.

  The pulsed light emitted from the emission part 35 is partially shielded by a mask having a plurality of slots when passing through the aperture part 36, is formed into a light beam having a predetermined shape, and enters the projection optical system 37. Then, the upper surface of the substrate 9 is irradiated with pulsed light having a predetermined shape that has passed through the projection optical system 37, whereby the photosensitive material applied to the substrate 9 is exposed. In this embodiment, in order to prevent damage to the photosensitive material due to excessive light irradiation at one time, the same region is irradiated twice with pulsed light that does not cause damage, and is exposed twice. Thus, one pattern is drawn.

  FIG. 3 is a diagram illustrating an example of the mask 361 included in the aperture unit 36. The mask 361 is made of a glass plate, a metal plate, or the like that has been processed to block light. As shown in the figure, the mask 361 has a large number of slots SL, which are openings through which light passes, arranged at regular intervals along the sub-scanning direction. As the pulsed light passes through these slots SL, pulsed light having a shape corresponding to the shape of the slot SL is projected onto the substrate 9.

  Each slot SL has a rectangular shape whose longitudinal direction is the main scanning direction. However, the length of each slot SL in the main scanning direction is not uniform throughout the mask 361. Specifically, a slot SL1 having a relatively long length in the main scanning direction is formed in most of the mask 361 including the central portion in the sub scanning direction. On the other hand, slots SL2 and SL3 that are relatively shorter in the main scanning direction than the slot SL1 are formed at the + X side end and the −X side end of the mask 361, respectively.

  The length of the slots SL2 and SL3 in the main scanning direction is half of the length of the slot SL1 in the main scanning direction. The slot SL2 has the position of the −Y side end thereof matched with the position of the −Y side end of the slot SL1, and the slot SL3 has the position of the + Y side end thereof matched with the position of the + Y side end of the slot SL1. Yes. Also, the width in the sub-scanning direction of the region at the + X side end where the slot SL2 is formed is the same as the width in the sub-scanning direction of the region at the −X side end where the slot SL3 is formed. That is, the number of slots SL2 is the same as the number of slots SL3.

  The pattern drawing apparatus 1 includes a control unit 50 that controls the entire apparatus and performs various arithmetic processes. FIG. 4 is a block diagram conceptually showing the configuration of the pattern drawing apparatus 1 including the control unit 50. The control unit 50 is configured by a computer including a CPU, a memory, and the like. When the CPU performs arithmetic processing according to a program stored in advance in the memory, control functions of various units and various arithmetic functions are realized. As shown in the figure, the main scanning mechanism 25, the sub-scanning mechanism 23, the rotating mechanism 21, the laser driving unit 34, and the like described above are electrically connected to the control unit 50 and operate under the control of the control unit 50.

  The pattern drawing apparatus 1 further includes an operation unit 51 that receives various user operations, and a data input unit 52 that inputs drawing data necessary for pattern drawing. The data input unit 52 is configured as, for example, a reading device that reads a recording medium or a communication device that performs data communication with an external device. The operation unit 12 and the data input unit 13 are also electrically connected to the control unit 50. Accordingly, the operation content of the operation unit 12 is input as a signal to the control unit 50, and the drawing data input to the data input unit 13 is stored in the memory of the control unit 50.

<1-2. Basic operation>
Next, the basic operation of the pattern drawing apparatus 1 will be described. FIG. 5 is a diagram illustrating a basic operation flow of the pattern drawing apparatus 1. First, the substrate 9 on which a photosensitive material (color resist) is applied in advance is carried in by a transfer robot or the like and placed on the upper surface of the stage 10. The substrate 9 is sucked into the suction port formed on the upper surface of the stage 10 and is held in a substantially horizontal posture on the upper surface of the stage 10 (step S1).

  Next, a regular pattern is drawn on the substrate 9. 6 to 10 are views showing the state of the substrate 9 in the process of drawing a pattern. In these drawings, an area denoted by reference numeral 91 indicates a drawing target area where a pattern should be drawn. The drawing target area 91 is determined based on drawing data stored in advance in the memory of the control unit 50. In these drawings, a rectangular range indicated by reference numeral 80 is a range in which a single exposure head 30 can draw a pattern by emitting pulse light once (exposure range) (hereinafter referred to as “drawing range”). ). As described above, since the plurality of exposure heads 30 are arranged at the same pitch H (for example, 200 mm in the present embodiment) along the sub-scanning direction, a plurality of drawing ranges corresponding to the plurality of exposure heads 30 respectively. 80 are also arranged at the same pitch H (for example, 200 mm) along the sub-scanning direction.

  Each exposure head 30 scans the area of the width H on the substrate 9 up to the exposure head 30 adjacent to the + X side in four times. Specifically, as shown in FIG. 6, first, the plurality of exposure heads 30 (that is, the drawing range 80) are moved to the start position of the substrate 9 determined by the drawing data (step S2).

  Next, as shown in FIG. 7, the exposure head 30 (that is, the drawing range 80) is moved relative to the substrate 9 at a constant speed to the + Y side in the main scanning direction. At this time, pulse light is emitted from the exposure head 30 at a predetermined time period. As a result, for each exposure head 30, exposure scanning is performed on the region As extending in the main scanning direction on the substrate 9. The region As on the substrate 9 that is subject to exposure scanning in the main scanning direction in this way is hereinafter referred to as a “scanning region”. A regular pattern is drawn in the scanning region As exposed by the exposure scanning. In the figure, the area where the pattern is drawn is indicated by hatching (step S3).

  When exposure scanning in the main scanning direction is completed once, the exposure head 30 (that is, the drawing range 80) moves relative to the substrate 9 relative to the + X side in the sub scanning direction with respect to the substrate 9 in order to perform the next exposure scanning. (Yes in step S4, step S5). Next, as shown in FIG. 8, the exposure head 30 (that is, the drawing range 80) is moved relative to the substrate 9 at a constant speed toward the −Y side in the main scanning direction. As a result, for each exposure head 30, exposure scanning is performed for one scanning area As that is different from the scanning area As targeted in the previous exposure scanning (step S3).

  Similarly, as shown in FIG. 9, the exposure head 30 is relatively moved to the + X side with respect to the substrate 9 between the previous exposure scan and the subsequent exposure scan, and the target scan area As is being changed. The exposure scanning in the main scanning direction is further repeated twice (one reciprocation) (Yes in step S4, step S5, step S3). Thereby, as shown in FIG. 10, a regular pattern is drawn on the entire drawing target area 91.

  The substrate 9 on which the pattern is drawn is unloaded from the upper surface of the stage 10 by a transfer robot or the like (No in step S4, step S6). Each pattern drawn on the substrate 9 is developed in a later process to be a sub-pixel having one of R, G, and B colors. Then, by repeating the formation of subpixels (pattern drawing and development) three times so as to correspond to R, G, and B, the drawing target area 91 of the substrate 9 is made one color filter. Become.

  By the way, in the pattern drawing operation described above, the adjacent scanning regions As are not exactly adjacent to each other, and are partially overlapped. As shown in the enlarged view of the lower area A in FIG. 10, the preceding exposure is performed with respect to the width w in the sub-scanning direction of one scanning area As (that is, the width of the drawing range 80 in the sub-scanning direction, for example, 52 mm). The width h (for example, 50 mm) for moving the exposure head 30 relative to the substrate 9 in the sub-scanning direction between the scanning and the subsequent exposure scanning is shortened. For this reason, a part of the scanning region As is overlapped in the preceding exposure scan and the subsequent exposure scan. Accordingly, an overlapping range B1 in which two exposure scans of the preceding exposure scan and the subsequent exposure scan are performed is formed at the joint between the adjacent scanning regions As.

  In each scanning region As, the majority including the central portion in the sub-scanning direction is a non-overlapping range B0 that does not overlap, and the end portion in the sub-scanning direction is an overlapping range B1. By forming the overlapping range B1 in which the exposure scanning is performed twice at the joint between the adjacent scanning regions As in this way, unevenness generated at the joint is reduced.

  FIG. 11 and FIG. 12 are diagrams for conceptually explaining the drawing results related to the joints of the scanning areas As. In the figure, the horizontal axis indicates the position in the sub-scanning direction (X-axis direction). On the other hand, the vertical axis conceptually indicates the degree of influence of various non-uniform characteristics in the exposure head 30 on the pattern drawing result. Here, the non-uniform characteristic is a characteristic of the exposure head 30 that impairs the uniformity of the pattern drawing result. The aberration of the illumination optical system 32 and the projection optical system 37, the positional error of the slot SL of the mask 361, and the like. Is mentioned. The non-uniform characteristics differ depending on the portion of the exposure head 30 in the sub-scanning direction, and a difference occurs in the non-uniform characteristics between both ends of the exposure head 30. Then, as shown in the drawing, a drawing result reflecting the influence of such non-uniform characteristics of the exposure head 30 is formed for each scanning region As.

  Therefore, as shown in FIG. 11, when the adjacent scanning regions As are adjacent to each other without overlapping, due to a difference in non-uniform characteristics between the two ends of the exposure head 30, The drawing result changes discontinuously at the boundary B between the adjacent scanning regions As, and the discontinuity is recognized as unevenness on the product.

  On the other hand, as shown in FIG. 12, when the adjacent scanning areas As are overlapped, the exposure scanning is performed twice in the overlapping range B1 in the preceding exposure scanning and the subsequent exposure scanning. The influence of the non-uniform characteristics at both ends of the exposure head 30 can be mixed and leveled. For this reason, the drawing result can be smoothly changed at the joint (overlapping range B1) between the adjacent scanning regions As, and unevenness generated at the joint can be reduced.

<1-3. Matching exposure amount>
In the overlapping range B1, two exposure scans of the preceding exposure scan and the subsequent exposure scan are performed, while only one exposure scan is performed in the non-overlapping region B0. For this reason, it is necessary to match the exposure amount of the pattern included in the overlapping range B1 with the exposure amount of the pattern included in the non-overlapping region B0. Hereinafter, a method for matching the exposure amounts of the patterns in the overlapping range B1 and the non-overlapping region B0 will be described.

  FIG. 13 is an enlarged view showing a part of the drawing target area 91 of the substrate 9 before the pattern is drawn. As shown in the drawing, a black matrix 92 that is a grid-like black frame is formed in the drawing target region 91 of the substrate 9. Such an area within the frame of the black matrix 92 is an area that finally becomes a sub-pixel of any of R, G, and B of the color filter. Therefore, the pattern drawing apparatus 1 draws one pattern for each of the regions 93 within the frame of the black matrix 92. Hereinafter, an area 93 corresponding to one pattern (one subpixel) is referred to as an “element area” 93.

  As shown in the drawing, in the drawing target area 91, element areas 93 to be R, G, and B sub-pixels are periodically arranged in this order along the sub-scanning direction. Therefore, the element regions 93 relating to a certain color (for example, R) are arranged at a constant pitch at a ratio of one to the three element regions 93. The pattern drawing apparatus 1 draws a pattern only for the element region 93 related to a certain color by performing a series of processes shown in FIG. 5 once.

  Hereinafter, the operation of drawing a pattern in each element region 93 will be specifically described with reference to FIGS. In these drawings, a part of the drawing target area 91 corresponding to the vicinity of the overlapping range B1 of the adjacent scanning areas As is enlarged. In the drawing, only the element region 93 relating to one color (for example, R) that is a pattern drawing target in one process is shown, and the other element regions 93 and the black matrix 92 are not shown. The scanning area As on the left side in the figure is the scanning area As1 that is the subject of the preceding exposure scanning, and the scanning area As on the right side in the drawing is the scanning area As2 that is the subject of the subsequent exposure scanning.

  In addition, rectangular regions 81, 82, and 83 shown in these drawings indicate irradiation regions irradiated with pulsed light that has passed through the slots SL1, SL2, and SL3 (see FIG. 3) of the mask 361, respectively. The length in the main scanning direction of the irradiation region 81 that is the projection region of the relatively long slot SL1 is twice the pitch P1 of the arrangement of the element regions 93 in the main scanning direction. Further, the lengths in the main scanning direction of the irradiation areas 82 and 83, which are the projection areas of the relatively short slots SL2 and SL3, coincide with the pitch P1. Each element region 93 included in the non-overlapping range B0 is exposed in the irradiation region 81, and each element region 93 included in the overlapping range B1 is exposed in the irradiation regions 82 and 83.

  Specifically, first, in the preceding exposure scan, the exposure head 30 is moved relative to the substrate 9 at a constant speed to the + Y side in the main scanning direction. For this reason, as shown in FIGS. 14 to 16, the irradiation areas 81 and 82 also move at a constant speed in the scanning area As1 of the substrate 9 to the + Y side. Further, every time the irradiation areas 81 and 82 (that is, the exposure head 30) move by the pitch P1, pulse light is emitted, and the element area 93 included in the irradiation areas 81 and 82 is exposed at the time of emission.

  As a result of this operation, as shown in FIGS. 14 to 16, for each element region 93 included in the non-overlapping range B0 in the scanning region As1, first, the first exposure is performed on the + Y side half of the irradiation region 81. The Then, at the time when the next pulse light is emitted (after movement of the irradiation region 81 with the pitch P1), the second exposure is performed on the half of the same irradiation region 81 on the −Y side. In the drawing, the element region 93 exposed once is shown with a relatively sparse hatching, and the element region 93 exposed twice is shown with a relatively dense hatching.

  On the other hand, with respect to each element region 93 included in the overlapping range B1 in the scanning region As1, only one exposure is performed in the irradiation region 82. This is because the irradiation region 82 moves to the element region 93 adjacent to the + Y side of the element region 93 when the next pulse light is emitted after the element region 93 is exposed.

  Therefore, when the preceding exposure scan is completed, as shown in FIG. 17, in each of the element regions 93 included in the non-overlapping range B0 in the scan region As1, two exposures necessary for pattern drawing are completed. It becomes. On the other hand, each element region 93 included in the overlapping range B1 in the scanning region As1 is in a state where only one exposure has been performed.

  In the subsequent exposure scanning, the exposure head 30 is moved relative to the substrate 9 at a constant speed on the −Y side in the main scanning direction. For this reason, as shown in FIGS. 18 to 20, the irradiation areas 81 and 83 also move the scanning area As2 of the substrate 9 to the −Y side at a constant speed. Also in this case, pulsed light is emitted each time the irradiation regions 81 and 83 move by the pitch P1.

  As a result of this operation, as shown in FIGS. 18 to 20, the element region 93 included in the non-overlapping range B0 in the scanning region As2 is exposed twice in the irradiation region 81 as in the preceding exposure scanning. Made. On the other hand, for each element region 93 (element region 93 that has already been exposed once) included in the overlapping range B <b> 1, the second exposure is performed in the irradiation region 83. Therefore, when the subsequent exposure scan is completed, as shown in FIG. 21, all the element regions 93 included in the non-overlapping range B0 and the overlapping range B1 are exposed twice, and the pattern is drawn. It becomes.

  Thus, for each pattern included in the overlapping range B1, the first exposure is performed in the preceding exposure scan, and the second exposure is performed in the subsequent exposure scan. As a result, the exposure amounts of the respective patterns included in the overlapping range B1 and the non-overlapping range B0 can be matched. In more general terms, the result of adding the number of exposures in the preceding exposure scan (one time) and the number of exposures in the subsequent exposure scan (one time) for each pattern included in the overlapping range B1 is as follows. It can be said that the exposure amount of each pattern is matched by matching the number of exposures (twice) for each pattern included in the non-overlapping range B0.

  In the mask 361 of the aperture portion 36, the length in the main scanning direction of the slots SL2 and SL3 corresponding to the overlapping range B1 is half the length in the main scanning direction of the slot SL1 corresponding to the non-overlapping range B0. Realized by being. More generally expressed, with respect to one pattern row (row of element regions 93) along the main scanning direction included in the overlapping range B1, the slot SL2 corresponding to the preceding exposure scan and the subsequent exposure scan It can be said that the result of adding the respective lengths in the main scanning direction with the corresponding slot SL3 is realized by matching the length in the main scanning direction of the slot SL1 corresponding to the non-overlapping range B0.

<1-4. Modification of mask>
The shape and arrangement of the slots SL formed in the mask 361 of the aperture portion 36 are not limited to those shown in FIG. “With respect to one pattern row along the main scanning direction included in the overlapping range B1, the lengths in the main scanning direction of the slot SL2 corresponding to the preceding exposure scanning and the slot SL3 corresponding to the subsequent exposure scanning are determined. Any mask 361 may be employed as long as the slot SL is formed so as to satisfy the condition that the result of the addition matches the length of the slot SL1 corresponding to the non-overlapping range B0 in the main scanning direction. .

  For example, in FIG. 3, the slot SL2 and the slot SL3 are arranged point-symmetrically with respect to the center of the mask 361, but may be arranged line-symmetrically with respect to the center of the mask 361 in the sub-scanning direction as shown in FIG. Good. Also in this case, the length of the slots SL2 and SL3 in the main scanning direction is half of the length of the slot SL1 in the main scanning direction, and the result of adding the lengths of the slots SL2 and SL3 in the main scanning direction is the slot. It coincides with the length of SL1 in the main scanning direction. For this reason, the exposure amount of each pattern can be made to correspond in the overlapping range B1 and the non-overlapping region B0.

  Further, if the number of exposures required for drawing one pattern is three, a mask 361 as shown in FIGS. 23 to 25 can be used. In the figure, the slot SL2 and the slot SL3 with the same reference numerals (a, b, c, d) correspond to the same pattern row along the main scanning direction included in the overlapping range B1. In any case, one of the lengths of the slots SL2 and SL3 corresponding to one pattern row along the main scanning direction in the main scanning direction is 1/3 of the length of the slot SL1 in the main scanning direction. The other is 2/3. Therefore, the result of adding the lengths of the slots SL2 and SL3 corresponding to one pattern row along the main scanning direction in the main scanning direction coincides with the length of the slot SL1 in the main scanning direction.

  In this case, each element region 93 included in the non-overlapping range B0 is exposed three times via the slot SL1. On the other hand, for each element region 93 included in the overlapping range B1, exposure is performed three times in total, that is, once in the preceding exposure scan and the subsequent exposure scan and twice in the other. For this reason, the exposure amount of each pattern can be made to correspond in the overlapping range B1 and the non-overlapping region B0.

  Of course, the number of exposures required for drawing one pattern may be four or more. When the required number of exposures is an even number, as in the above embodiment, the length in the main scanning direction of the slots SL2 and SL3 corresponding to the overlapping range B1 is the main scanning direction of the slot SL1 corresponding to the non-overlapping range B0. If the length is half the length, the influence of the non-uniform characteristics at both ends of the exposure head 30 can be reflected in the drawing result at the same rate. For this reason, the joints in the adjacent scanning areas As can be connected more smoothly.

  In addition, the slot SL (especially the slot SL1) of the mask 361 is configured to carry out exposure related to a plurality of patterns (element regions 93) by one-time irradiation of pulsed light. You may come to bear the exposure regarding only one pattern (element area | region 93) by irradiation of pulsed light.

  FIG. 26 is a diagram showing an example of a mask 362 in which one slot SL corresponds to only one pattern by one-time pulse light irradiation. In the mask 362, slot rows (opening row) SLL including a plurality of slots SL arranged at regular intervals in the sub-scanning direction are arranged in two rows in the main scanning direction. Each of these slots SL has the same size, and the length in the main scanning direction of the irradiation region irradiated with the pulsed light that has passed through each slot SL is the pitch P1 (the arrangement pitch of the element regions 93 in the main scanning direction). Is consistent with That is, only one element region 93 is included in one irradiation region.

  Then, in most of the region including the central portion in the sub-scanning direction of the mask 362 that corresponds to the non-overlapping range B0, two slots SL1 are arranged in the main scanning direction and correspond to the overlapping range B1. In the region of the + X side end and the −X side end of the mask 362, only one slot SL2, SL3 is arranged in the main scanning direction.

  If this mask 362 is also used in the same manner as the mask 361 in the above embodiment, each element region 93 included in the non-overlapping range B0 can be exposed twice in one exposure scan. Each element region 93 included in the range B1 can be exposed twice in total, once in the preceding exposure scan and once in the subsequent exposure scan. For this reason, also in this case, the result of adding the number of exposures in the preceding exposure scan (one time) and the number of exposures in the subsequent exposure scan (one time) for each pattern included in the overlapping range B1 is non-overlapping. This matches the number of exposures (twice) for each pattern included in the range B0, so that the exposure amount of each pattern can be matched.

  In the mask 362 of the aperture unit 36, the number of slots SL2 and SL3 corresponding to the overlapping range B1 in the main scanning direction is half the number of slots SL1 corresponding to the non-overlapping range B0 in the main scanning direction. It is realized by. More generally expressed, one pattern row along the main scanning direction included in the overlapping range B1 corresponds to the number (one) of slots SL2 corresponding to the preceding exposure scanning and to the subsequent exposure scanning. The result of adding the number (one) of the slots SL3 is realized by matching the number (two) of the slots SL1 corresponding to one pattern row along the main scanning direction included in the non-overlapping range B0. It can also be said.

  Therefore, “the result of adding the respective numbers of the slot SL2 corresponding to the preceding exposure scan and the slot SL3 corresponding to the subsequent exposure scan with respect to one pattern row along the main scanning direction included in the overlapping range B1. Is equal to the number of slots SL1 corresponding to one pattern row along the main scanning direction included in the non-overlapping range B0. ”What mask 362 is to be formed if the slot SL is formed so as to satisfy the condition of May be adopted.

  For example, if the number of exposures necessary for pattern drawing is three, a mask 362 as shown in FIG. 27 can be used. In the mask 362, slot rows SLL including a plurality of slots SL are formed in three rows in the main scanning direction. Also in this figure, the slot SL2 and the slot SL3 with the same reference numerals (a, b, c, d) correspond to the same pattern row along the main scanning direction included in the overlapping range B1. In any case, the number of slots SL2 and SL3 corresponding to one pattern row in the main scanning direction is one in the main scanning direction and the other is two. Therefore, the result of adding the numbers in the main scanning direction of the slots SL2 and SL3 corresponding to one pattern row along the main scanning direction (three) is the result of the slot SL1 corresponding to one pattern row. It matches the number in the main scanning direction (three).

  Of course, the number of exposures required for drawing one pattern may be four or more. When the required number of exposures is an even number, the number of slots SL2 and SL3 corresponding to the overlapping range B1 in the main scanning direction should be half the number of slots SL1 corresponding to the non-overlapping range B0 in the main scanning direction. For example, the influence of the non-uniform characteristics at both ends of the exposure head 30 can be reflected in the drawing result at the same rate. For this reason, the joints in the adjacent scanning areas As can be connected more smoothly.

  In addition, in the case of the mask 362 in which one slot SL corresponds to only one pattern by one light irradiation, the shape of the slot SL need not be a rectangular shape along the main scanning direction. For this reason, as shown in FIG. 28, it is possible to use a mask 362 provided with a slot SL having a shape inclined with respect to the main scanning direction.

<2. Second Embodiment>
Next, a second embodiment will be described. Since the configuration and basic operation of the pattern drawing apparatus 1 of the second embodiment are substantially the same as those of the first embodiment, the following description will be focused on differences from the first embodiment.

  In the first embodiment, one pattern is drawn by a plurality of exposures. In the second embodiment, one pattern is drawn by a single exposure. ing. That is, each pattern included in the overlapping range B1 is not drawn by the exposure of the preceding exposure scan and the exposure of the subsequent exposure scan, but any one of the preceding exposure scan and the subsequent exposure scan. It is drawn by exposure.

  Hereinafter, with reference to FIG. 29 to FIG. 34, the operation of drawing a pattern in each element region 93 according to the second embodiment will be specifically described. These drawings are enlarged views of a part of the drawing target area 91 corresponding to the vicinity of the overlapping range B1 of the adjacent scanning areas As1 and As2, as in FIGS. Further, the mask of the aperture portion 36 used in this description is the mask 361 shown in FIG. 3, and the projection areas of the slots SL1, SL2, and SL3 of the mask 361 are irradiation areas 81, 82, and 83, respectively. In these drawings, the exposed element region 93 is indicated by hatching.

  In drawing a pattern, first, in the preceding exposure scan, the exposure head 30 is moved relative to the substrate 9 at a constant speed to the + Y side in the main scanning direction. Accordingly, as shown in FIGS. 29 to 31, the irradiation areas 81 and 82 also move the scanning area As1 of the substrate 9 to the + Y side at a constant speed. However, in the second embodiment, every time the irradiation regions 81 and 82 (that is, the exposure head 30) move by twice the pitch P1 (corresponding to the length of the irradiation region 81 in the main scanning direction), the pulsed light is emitted. Emitted.

  Therefore, as shown in FIG. 29 to FIG. 31, in the non-overlapping range B0 in the scanning region As1, all the element regions 93 are exposed once for pattern drawing. Each element region 93 is exposed in either the + Y side half or the −Y side half of the irradiation region 81, and a pattern is drawn in each element region 93.

  On the other hand, in the overlapping range B1 in the scanning region As1, exposure is performed once every other column with respect to the columns of the element regions 93 along the sub-scanning direction. Thereby, the columns of the element regions 93 in which the pattern is drawn and the columns of the element regions 93 in which the pattern is not drawn are alternately arranged along the main scanning direction. This is because, at the time when the next pulse light is emitted after an element region 93 is exposed in the irradiation region 82, the irradiation region 82 moves to the two adjacent element regions 93 on the + Y side of the element region 93. It is.

  In the subsequent exposure scanning, the exposure head 30 is moved relative to the substrate 9 at a constant speed on the −Y side in the main scanning direction. Accordingly, as shown in FIGS. 32 to 34, the irradiation areas 81 and 83 also move the scanning area As1 of the substrate 9 to the −Y side at a constant speed. Also in this case, pulsed light is emitted each time the irradiation regions 81 and 83 move by twice the pitch P1.

  By this operation, as shown in FIGS. 32 to 34, in the non-overlapping range B0 in the scanning area As2, as in the preceding exposure scanning, all the element areas 93 are exposed once, and each element area 93 is exposed. A pattern is drawn at 93.

  On the other hand, in the overlapping range B1 in the scanning region As2, the exposure is performed once every other column with respect to the column of the element regions 93 along the sub-scanning direction, and the element region 93 in which the pattern is not drawn by the preceding exposure scan. Exposure is made. Therefore, when the subsequent exposure scanning is completed, a pattern is drawn on all the element regions 93 included in the non-overlapping range B0 and the overlapping range B1.

  In this way, in the second embodiment, a part of the pattern is drawn in the preceding exposure scan with respect to the overlapping range B1, and the remaining pattern is drawn in the subsequent exposure scan. For this reason, in this case as well, in the overlapping range B1, the influence of the non-uniform characteristics at both ends of the exposure head 30 can be mixed and leveled, and unevenness occurring at the joint between adjacent scanning regions As can be alleviated. Become.

  When attention is paid to one pattern row along the main scanning direction included in the overlapping range B1, a part of the pattern is drawn at a constant pitch in the preceding exposure scan, and the remaining pattern is drawn at a constant pitch in the subsequent exposure scan. Drawn. For this reason, in the overlapping range B1 after processing, each of the pattern drawn by the preceding exposure scan and the pattern drawn by the subsequent exposure scan can be periodically present. For this reason, it is possible to prevent uneven characteristics at both ends of the exposure head 30 from being reflected unevenly in the drawing result.

  Also in the present embodiment, the shape and arrangement of the slots SL formed in the mask 361 of the aperture portion 36 are not limited to those shown in FIG. For the overlapping range B1, any mask can be used as long as a slot SL is formed so that a part of the pattern can be drawn by the preceding exposure scan and the remaining pattern can be drawn by the subsequent exposure scan. Good. Specifically, an area not drawn in the entire slot SL (slot SL2) corresponding to the overlapping range B1 at one end of the mask and a slot SL (slot SL3) corresponding to the overlapping range B1 at the other end. It suffices if the shape and orientation of the entire drawing area match.

  Therefore, out of the masks 361 and 362 shown in FIGS. 22 to 28, all the masks 361 and 362 other than the mask 361 shown in FIG. 24 can be preferably used also in the second embodiment. . The mask 361 in FIG. 24 cannot be used because the direction of the area not drawn in the entire slot SL2 and the direction drawn in the entire slot SL3 do not match.

<3. Other embodiments>
Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications are possible. Hereinafter, such other embodiments will be described. Of course, you may combine the form demonstrated below suitably.

  For example, in the above embodiment, the exposure scanning for each of the plurality of scanning regions is shared by the plurality of exposure heads 30, but the exposure scanning for all the scanning regions is performed by one exposure head 30. It may be. However, since the number of exposure scans can be greatly reduced, it is preferable to share the exposure heads 30 as in the above embodiment.

  Further, in the above-described embodiment, it has been described that a part of the scanning areas As assigned to one exposure head 30 is overlapped, but of course, the scanning area As assigned to one of the adjacent exposure heads 30 and the other are assigned. A part of the scanning area As may be overlapped.

  Further, in the first embodiment, the slot SL corresponding to the overlapping range B1 in the mask of the aperture unit 36 is reduced in size or reduced in number compared to the non-overlapping range B0. The exposure amount of each pattern was matched in the range B1 and the non-overlapping area B0. On the other hand, by disposing a neutral density filter or the like in the optical system of the pulsed light, the intensity of the pulsed light irradiated on the overlapping range B1 is made lower than that in the non-overlapping range B0, so You may make it make the exposure amount of each pattern correspond with area | region B0.

  Moreover, in the said embodiment, although the linear motor was used as a drive mechanism of each part, you may use well-known drive mechanisms other than a linear motor. For example, a mechanism that converts the driving force of the motor into a linear motion via a ball screw may be used.

  In the above embodiment, the glass substrate 9 for color filter has been described as a processing target, but other substrates such as a semiconductor substrate, a printed circuit board, and a glass substrate for a plasma display device are processing targets. May be.

  In the apparatus of the above embodiment, the pattern is drawn by irradiating the substrate 9 with the pulsed light from the laser oscillator 33, but the light source and the drawing method are not limited to this. For example, the light applied to the substrate 9 may be not only short-wavelength light but also light in which a plurality of wavelengths are mixed, or ultraviolet light. Further, for example, the substrate 9 may be irradiated in a pulsed manner by periodically blocking continuously irradiated light with a shutter mechanism or the like.

It is a side view which shows the structure of a pattern drawing apparatus. It is a top view which shows the structure of a pattern drawing apparatus. It is a figure which shows an example of the mask which an aperture part has. It is a block diagram which shows notionally the structure of a pattern drawing apparatus. It is a figure which shows the flow of basic operation | movement of a pattern drawing apparatus. It is a figure which shows the state of the board | substrate in the process of the operation | movement which draws a pattern. It is a figure which shows the state of the board | substrate in the process of the operation | movement which draws a pattern. It is a figure which shows the state of the board | substrate in the process of the operation | movement which draws a pattern. It is a figure which shows the state of the board | substrate in the process of the operation | movement which draws a pattern. It is a figure which shows the state of the board | substrate in the process of the operation | movement which draws a pattern. It is a figure which illustrates notionally the drawing result concerning the joint of a scanning area | region. It is a figure which illustrates notionally the drawing result concerning the joint of a scanning area | region. It is an enlarged view of a part of the drawing target area of the substrate before drawing a pattern. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure which shows another example of the mask which an aperture part has. It is a figure which shows another example of the mask which an aperture part has. It is a figure which shows another example of the mask which an aperture part has. It is a figure which shows another example of the mask which an aperture part has. It is a figure which shows another example of the mask which an aperture part has. It is a figure which shows another example of the mask which an aperture part has. It is a figure which shows another example of the mask which an aperture part has. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region. It is a figure for demonstrating the operation | movement which draws a pattern in each element area | region.

Explanation of symbols

23 Sub-scanning mechanism 25 Main scanning mechanism 30 Exposure head 36 Aperture section 361, 362 Mask 92 Black matrix 93 Element area As scanning area B0 Non-overlapping range B1 Overlapping range

Claims (8)

A pattern drawing apparatus for drawing a regular pattern on a substrate on which a photosensitive material is formed,
A light source;
An aperture having a plurality of openings arranged at a predetermined interval in a predetermined sub-scanning direction, irradiating the substrate with light from the light source that has passed through the plurality of openings, and exposing the substrate An exposure head for drawing the pattern;
A main scanning mechanism that moves the exposure head relative to the substrate in a main scanning direction orthogonal to the sub-scanning direction, and causes the exposure head to perform exposure scanning on the substrate;
Sub scanning for changing the scanning area on the substrate to be subjected to the exposure scanning by moving the exposure head relative to the substrate in the sub scanning direction between the preceding exposure scanning and the subsequent exposure scanning. Mechanism,
With
The sub-scanning mechanism changes the scanning area by relatively moving the exposure head with a width shorter than the width of the scanning area in the sub-scanning direction, thereby allowing the preceding exposure scanning and the subsequent exposure scanning to be performed. A pattern drawing apparatus, wherein a part of the scanning region is overlapped. The pattern drawing apparatus according to claim 1,
For each pattern included in the overlapping range of the scanning region, the result of adding the number of exposures in the preceding exposure scan and the number of exposures in the subsequent exposure scan,
The pattern drawing apparatus, wherein the number of exposures for each pattern included in the non-overlapping range of the scanning area is the same. The pattern drawing apparatus according to claim 1,
With respect to one pattern row along the main scanning direction included in the overlapping range of the scanning area, the aperture of the aperture corresponding to the preceding exposure scan and the aperture corresponding to the subsequent exposure scanning The result of adding the length in the main scanning direction with each of the openings is as follows:
The pattern drawing apparatus according to claim 1, wherein the pattern drawing device matches a length in the main scanning direction of an opening of the aperture corresponding to a non-overlapping range of the scanning region. The pattern drawing apparatus according to claim 3,
In the aperture portion, the length in the main scanning direction of the opening corresponding to the overlapping range is half the length in the main scanning direction of the opening corresponding to the non-overlapping range. Drawing device. The pattern drawing apparatus according to claim 1,
The aperture section includes a plurality of aperture rows in the main scanning direction, each of which includes a plurality of apertures arranged at regular intervals in the sub-scanning direction.
Each of the plurality of openings corresponds to one pattern by one light irradiation,
With respect to one pattern row along the main scanning direction included in the overlapping range of the scanning area, the aperture of the aperture corresponding to the preceding exposure scan and the aperture corresponding to the subsequent exposure scanning The result of adding each number with the opening is
The pattern drawing apparatus according to claim 1, wherein the number of apertures of the aperture portion corresponding to one pattern row along the main scanning direction included in the non-overlapping range of the scanning region is the same. The pattern drawing apparatus according to claim 5, wherein
In the aperture section, the number of openings corresponding to the overlapping range in the main scanning direction is half of the number of openings corresponding to the non-overlapping range in the main scanning direction. . The pattern drawing apparatus according to claim 1,
Each pattern included in the overlapping range of the scanning area is drawn by one exposure of the preceding exposure scan and the subsequent exposure scan,
The exposure head draws a part of the pattern at a constant pitch in the preceding exposure scan with respect to one pattern row along the main scanning direction included in the overlapping range of the scanning area, and in the subsequent exposure scanning. A pattern drawing apparatus for drawing the remaining pattern. A pattern drawing method for drawing a regular pattern on a substrate on which a photosensitive material is formed,
An aperture having a plurality of openings arranged at predetermined intervals in a predetermined sub-scanning direction; irradiating the substrate with light from a predetermined light source that has passed through the plurality of openings; and exposing the substrate A main scanning step of moving the exposure head for drawing the pattern relative to the substrate in a main scanning direction orthogonal to the sub-scanning direction, and causing the exposure head to perform exposure scanning on the substrate;
Sub scanning for changing the scanning area on the substrate to be subjected to the exposure scanning by moving the exposure head relative to the substrate in the sub scanning direction between the preceding exposure scanning and the subsequent exposure scanning. Process,
With
In the sub-scanning step, the exposure head is relatively moved by a width shorter than the width of the scanning area in the sub-scanning direction, and the scanning area is changed to change the preceding exposure scanning and the subsequent exposure scanning. A pattern drawing method characterized in that a part of the scanning region is overlapped.

Images