JP6280392B2 - GUI apparatus for direct drawing apparatus, direct drawing system, drawing area setting method and program - Google Patents

Description

  The present invention relates to a graphical user interface device (GUI device) used in a direct drawing device for drawing a wiring pattern or the like on a substrate on which a photoresist film is formed.

  Conventionally, a pattern is formed by irradiating various substrates such as a semiconductor substrate, a printed wiring substrate, and a glass substrate with light via a photomask. In recent years, in order to cope with the formation of various patterns, a technique has been used in which exposure is performed by drawing a pattern by directly irradiating a substrate with spatially modulated light without using a photomask.

  An exposure apparatus that performs exposure processing as described above is referred to as a direct drawing apparatus. For example, Patent Document 1 describes a GUI apparatus used for a direct drawing apparatus. This GUI apparatus is used when setting exposure conditions such as drawing parameters in units of a plurality of blocks set over almost the entire surface of a circular substrate. This block has a rectangular shape and is arranged on the substrate in the row direction and the column direction. In other words, the plurality of blocks are arranged in a matrix on the substrate.

  Further, for example, Patent Document 2 discloses a technique for performing an exposure process on an arc-shaped belt-like region where a plating electrode is to be formed at the end of the substrate. In addition to the electrode for plating, an arc band numbering area in which a serial number or the like is already formed by laser marking or the like is set at the end of the substrate, and it is necessary to perform exposure processing in consideration of the arc band area.

JP2013-77718A (for example, paragraph 0054, FIG. 3) Japanese Patent Laying-Open No. 2005-5462 (for example, paragraph 0029, FIG. 17)

  FIG. 17 shows arc-shaped belt-like regions E1 to E8 in which eight plating electrodes are to be formed along the peripheral edge at the end of the circular substrate W. When drawing processing is performed directly on the arc belt-like areas E1 to E8 by the drawing device, it is necessary to set the positions of the arc belt-like areas E1 to E8 as the drawing area or the non-drawing area in the GUI device.

  For example, when one arc-shaped area E1 is designated by the GUI device, the two-dimensional coordinate values (x1, y1) of the positions P1, position P2, position P3, and position P4 at the four corners of the arc-shaped area E1, A method of designating (x2, y2), (x3, y3) and (x4, y4) is conceivable. In this method, since each coordinate value has two pieces of information, it is necessary to input a total of eight pieces of information in the GUI device, which causes a problem that the amount of setting work increases.

  Further, as described above, when the operator inputs the coordinate values of the four corners of the arc-shaped zone using the GUI device, it is difficult to intuitively understand the position and range of the arc-shaped zone with respect to the circular substrate. The problem also occurs. For example, if the substrate is on a rectangle, it is intuitively easy to set a band-shaped area with two-dimensional coordinate values, but the substrate is circular and the arc-shaped band area is intuitive with two-dimensional coordinates. It is not easy to figure out.

  An object of the present invention is to set an arc-shaped belt-like region on a circular substrate as a drawing region or a non-drawing region by a direct drawing device with a small amount of work and in an intuitive manner in view of the above points. It is an object to provide a GUI apparatus, a direct drawing system, a drawing area setting method, and a program for a direct drawing apparatus.

  The first invention according to claim 1 is used for a direct drawing apparatus for drawing a pattern on a photoresist film formed on the surface of a circular substrate, and the arc-shaped zone in the substrate is drawn or non-drawn. A GUI device for setting as an area, comprising: a display unit having a screen; an operation unit for operating the screen of the display unit; and a display control unit for controlling screen display of the display unit. A peripheral information input unit for displaying an input region for inputting information related to the circumferential length of the arc-shaped strip region on the screen of the display unit, and position information of the arc-shaped strip region in the radial direction of the substrate are input. Diameter information input section for displaying an input area for display on the screen of the display section, width information input section for displaying an input area for inputting width information in the radial direction of the arc-shaped belt-shaped area, and diameter information Input section, peripheral information input section and A drawing instruction input unit that displays an input area for inputting whether the arc-shaped area set by the width information input unit is a drawing area or a non-drawing area, a board outline, and diameter information A check display unit for displaying an arc-shaped band-like region based on information respectively input by the operation unit to the input unit, the circumference information input unit, the width information input unit, and the drawing instruction input unit, on the screen of the display unit Features.

  According to a second aspect of the present invention, in the first aspect, the display control unit uses the combination of the peripheral information input unit, the diameter information input unit, the width information input unit, and the drawing instruction input unit as a combination. An input area for sequentially inputting each information in the direction is displayed on the screen of the display unit.

According to a third aspect of the present invention, in the first aspect or the second aspect, the circumferential information input unit inputs an angle numerical value as information related to the circumferential length of the arc-shaped belt-like region. An input area for inputting the area or the length dimension of the arc is displayed on the screen of the display unit.

  According to a fourth aspect of the present invention, in any one of the first to third aspects, the width information input unit includes a plurality of input areas for inputting width information into a plurality of ranges in the radial direction as width information. Display on the display screen.

  According to a fifth aspect of the present invention (direct writing system), the GUI apparatus according to any one of the first to fourth aspects of the invention and a direct drawing of a pattern by scanning a spatially modulated light beam on the photoresist film. A drawing device.

  According to a sixth aspect of the present invention, there is provided a drawing area setting method for setting a drawing area to be drawn by a drawing apparatus directly by a GUI device having a display unit and an operation unit, or an arc belt-like area that is a non-drawing area not to be drawn. An input area for inputting information related to the circumferential length of the arc-shaped band area on the display screen, an input area for inputting position information of the arc-shaped band area in the radial direction of the substrate, An input screen display step for displaying an input area for inputting width information in the radial direction of the arc belt-shaped area and an input area for inputting information indicating whether the arc belt-shaped area is a drawing area or a non-drawing area. And an information input step for inputting each information by the operation unit to each input area displayed on the screen of the display unit by the input screen display step, and a substrate outline on the screen of the display unit, and Including a confirmation display step of displaying an arc belt-like area based on the information input by the broadcast input step.

  A seventh invention according to claim 7 is the sixth invention, wherein a plurality of combinations of input areas displayed in the input screen display process are displayed in the circumferential direction, and the information input process is performed for each combination of input areas. This is a step of sequentially inputting each information in the direction.

The eighth invention according to claim 8 is used for a direct drawing apparatus for drawing a pattern on a photoresist film formed on a surface of a circular substrate, and the arc-shaped belt-like region in the substrate is drawn or non-drawn. A computer-readable program provided in the GUI device for setting as an area, and an input for inputting information related to the length in the circumferential direction of the arc-shaped area on the screen of the display unit of the GUI apparatus Display function of peripheral information input area for displaying area, display function of diameter information input area for displaying input area for inputting position information of arc band area in radial direction of substrate, and radial direction of arc band area a display function of the width information input area for displaying input area for inputting a width information, arc zone set size information input area, by dividing information input area and width information input area Display function of drawing instruction input area that displays an input area for inputting information as to whether the area is a drawing area or a non-drawing area, a board outline, a diameter information input area, a circumference information input area, and width information characterized in that exert a confirmation display function for displaying the arc strip area based on information inputted by the operation unit included in the G UI device in the input area and the drawing instruction input area, to the computer.

  In a ninth aspect of the present invention based on the eighth aspect, the diameter information input area, the circumference information input area, the width information input area, and the drawing instruction input area are combined into one combination on the screen of the display unit. The computer has a function of displaying an input area for sequentially inputting information in the circumferential direction.

A tenth aspect of the invention according to claim 10 is the input for inputting a numerical value of an angle as information relating to the circumferential length of the arc-shaped belt-like region on the screen of the display unit in the eighth aspect or the ninth aspect. region, or to exhibit a function of displaying the input area for inputting an arc length dimension to the computer.

  According to an eleventh aspect of the present invention, in any one of the eighth to tenth aspects, the display unit has a plurality of input areas for inputting width information in a plurality of ranges in the radial direction on the screen of the display unit. The computer displays the function that is displayed on the screen.

  According to the invention of any one of claims 1 to 11, an arc belt-like region on a circular substrate can be intuitively and intuitively used as a drawing region or a non-drawing region by a direct drawing device. It is possible to provide a GUI apparatus, a direct drawing system, a drawing area setting method, and a program for a direct drawing apparatus that can be set.

It is a figure which shows the drawing system containing an exposure system. It is a block diagram which shows the hardware constitutions of a GUI apparatus. It is a block diagram which shows the function structure of a GUI apparatus. It is a flowchart which shows the flow of a drawing area | region setting. It is a figure which shows an initial input screen. It is a figure for demonstrating the information input operation | movement in 1st Example. It is a figure which shows the screen after input. It is a figure for demonstrating the information input operation | movement in 2nd Example. It is a figure for demonstrating the information input operation | movement in 3rd Example. It is a side view of a direct drawing apparatus. It is a top view of a direct drawing apparatus. It is a figure which shows an illumination optical system and a projection optical system. It is a figure which expands and shows a spatial light modulator. It is the block diagram which showed the connection structure of each part and control part of a direct drawing apparatus. It is a block diagram which shows the control part which controls drawing operation | movement. It is a flowchart of operation | movement of a direct drawing apparatus. It is a figure for demonstrating background art.

Embodiments of the present invention will be described below with reference to the accompanying drawings.
<Overall system configuration>
FIG. 1 is a diagram showing a graphic drawing system 400 including a direct drawing system 4 according to an embodiment of the present invention. The figure drawing system 400 directly draws a figure corresponding to a circuit pattern on a photoresist film by selectively exposing, for example, a photoresist film on a circular semiconductor substrate (hereinafter simply referred to as “substrate”). System.

  The graphic drawing system 400 includes a design data creation device 1, an image processing device 3, and a direct drawing device 100 connected to each other via a network N such as a LAN. The image processing device 3 includes a GUI device 2.

  The design data creation device 1 is a device that creates and edits data describing a pattern area to be drawn on a substrate that is a drawing target. Specifically, the data is created as graphic data described in a vector format by CAD. Hereinafter, this data is referred to as design data D0. The design data D0 created by the design data creation device 1 is transmitted to the image processing device 3 and the direct drawing device 100 via the network N, respectively. The design data D0 is data for forming a wiring pattern of a semiconductor chip or the like on the surface of the substrate W other than the arc belt-shaped regions E1 to E8 described later.

  The image processing apparatus 3 corrects the design data D0 transmitted via the network N, and creates corrected design data D1. The modified design data D1 created by the image processing apparatus 3 is directly transmitted to the drawing apparatus 100 via the network N.

  Specifically, the image processing apparatus 3 increases the line width dimension of the circuit pattern to be exposed (drawn) according to the change of the exposure condition (drawing condition) for the design data D0 (thickening process). Alternatively, it has a function of executing the process of reducing the line width dimension (thinning process) to obtain the modified design data D1. The thickening process and the thinning process are executed in units of a plurality of blocks that partition the substrate.

  Further, the image processing apparatus 3 corrects the exposure condition of each block in the design data D0. For example, when the design data D0 is data for exposing a standard pattern to all blocks, the design data D0 is corrected to data for exposing a test pattern to a specific block to obtain modified design data D1. Here, the “standard pattern” is a pattern for exposing a circuit pattern for forming a semiconductor element, and the “test pattern” is different from the “standard pattern”, for example, for trial production of a semiconductor element or verification of a manufacturing process. It is a pattern for exposing a circuit pattern.

  Further, the image processing apparatus 3 uses the GUI device 2 to set an arc band-like area for forming a plating electrode or an arc band-like area for forming a numbering symbol or the like on the edge of the substrate. Has a function of obtaining arc region data T1 for setting. In addition, the arc region data T1 indicates that the numbering region where the serial number and the like are formed is an arc belt-like region so that the serial number and the like already formed at the end of the substrate by laser marking or the like is not crushed by a subsequent process. The data may be set as

<Configuration of GUI device>
The GUI device 2 is provided in the image processing device 3 and functions as a graphical user interface for the operator. FIG. 2 is a block diagram showing a hardware configuration of the GUI device 2.

  The GUI device 2 is, for example, a computer 5 and includes a CPU 230, a ROM 231, a memory 232, a media drive 233, a display unit 200, an operation unit 234, and the like. These hardwares are electrically connected to each other by a bus line 235.

  The CPU 230 controls each part of the hardware based on a program (or a program read by the media drive 233) P stored in the ROM 231 to realize the function of the computer 5 (GUI device 2). The program P can be read by the computer 5 and causes the computer 5 to perform each function. Note that the program P stored in the hard disk drive (HDD) may be read into the RAM so that each function is performed by the computer 5.

  The ROM 231 is a read-only storage device that stores in advance a program P and data necessary for controlling the GUI device 2.

  The memory 232 is a storage device that can be read and written, and temporarily stores data generated during arithmetic processing by the CPU 230. The memory 232 is configured by SRAM, DRAM, or the like.

  The media drive 233 has a function of reading information stored in the recording medium M. Part. The recording medium M is a portable recording medium such as a CD-ROM, a DVD (Digital Versatile Disk), or a flexible disk.

  The display unit 200 includes a display such as a color LCD, and variably displays an image for GUI operation, various data, an operation state, and the like on the screen.

  The operation unit 234 is an input device having a keyboard and a mouse, and accepts user operations such as input of commands and various data. Using the operation unit 234, the operator inputs various information to the GUI operation screen displayed on the display unit 200 and operates the screen of the display unit 200.

  FIG. 3 is a block diagram showing a functional configuration of the GUI device 2. FIG. 3 is a block diagram showing the functions exhibited by the hardware configuration of the GUI device 2 by the program P shown in FIG. 2, but these functional blocks can be changed in various forms depending on the combination of hardware and software. Can be realized.

  As shown in FIG. 3, the GUI device 2 includes a display control unit 240. The display control unit 240 controls the screen display of the display unit 200 and includes a circumference information input unit 241, a diameter information input unit 242, a width information input unit 243, a drawing instruction input unit 244, and a confirmation display unit 245. Have. The display control unit 2 realizes the function of each unit by the operation of the operation unit 234 by the operator, details of which will be described later in the description of the operation.

<Drawing area setting flow>
FIG. 4 is a flowchart showing a flow of drawing area setting. The flow of work for setting the arc-shaped belt-like region will be described with reference to FIG. First, in the input screen display step of step S10, an initial input screen is displayed on the screen of the display unit 200 provided in the GUI device 2. FIG. 5 is an example of an initial input screen, and a confirmation display area 80 and an input area 90 are displayed on the screen 7. The input area 90 is displayed on the screen 7 by the functions of the circumference information input unit 241, the diameter information input unit 242, the width information input unit 243, and the drawing instruction input unit 245 described above. Details of the input area 90 will be described in the information input process of step S20, which is the next process.

  Returning to FIG. 4, the information input process in step S20 will be described. This information input process includes a circumference information input process (step S21), a diameter information input process (step S22), a width information input process (step S23), and a drawing instruction input process (step S24).

<First embodiment>
The first embodiment, which is an example of the information input process (step S20), will be described with reference to FIG. FIG. 6A is a diagram conceptually showing a state in which the first arc belt-like region E1 and the second arc belt-like region E2 are set, and FIG. It shows the state being done.

  As shown in FIG. 6B, the input area 90 is a list-like input area having a matrix. In the “No.” column 91 in the first column, the row number of the list is displayed, and “0” is displayed as the initial value (default value) in the first row. In the second and subsequent lines, “1, 2, 3,...” Are displayed in order, and each line is one combination for designating one arc-shaped belt-like region.

  The “θ” column 92 in the second column is an input area displayed by the function of the circumference information input unit 241 and is an input area into which a numerical value of an angle is input. As will be described later, when the “Arc Length” column 99 is an input area displayed by the function of the circumference information input unit 241, the “θ” column 91 is the length of the arc input in the “Arc Length” column 99. The numerical value of the angle according to the length is displayed. The numerical value of the angle input in the “θ” column 92 or the length dimension of the arc input in the “Arc Length” column 99 is information related to the circumferential length of the arc-shaped zone.

  The “R0” column 93 in the third column is one of pieces of positional information of the arc-shaped strip region in the radial direction of the circular substrate to be drawn, and is the length from the center of the substrate to the arc-shaped strip region in the radial direction. This is an input area for inputting dimensions, and is an input area displayed by the function of the diameter information input unit 242.

  In the “Inside” column 94 in the fourth column and the “Outside” column 95 in the fifth column, the length dimension inward from the virtual circle whose radius is the length dimension input in the “R0” column 93 is input. It is an input area for Specifically, the “Inside” column 94 and the “Outside” column 95 are input regions for setting and inputting the width dimension of the arc-shaped strip region in the radial direction in two stages. The width dimension on the center Ct side is input, and the width dimension on the virtual circle side is input in the “Outside” field 95. The input area in the “Inside” field 94 and / or the “Outside” field 95 is an input area displayed by the function of the width information input unit 243.

  In the “Expose” column 96 in the sixth column, two radio buttons 97 and 98 arranged on the left and right are displayed. When the left radio button 97 is selected, information indicating that the area input and set in the “Inside” field 94 is a drawing area to be drawn (to be exposed) is input. When the right radio button 98 is selected, information indicating that the area input and set in the “Outside” field 95 is a drawing area to be drawn (to be exposed) is input. Conversely, the state in which the radio buttons 97 and 98 are not selected is a state in which it is input that the area is a non-drawing area that is not an area to be drawn. The “Expose” field 96 is displayed by the function of the drawing instruction input unit 244.

  In the “Arc Length” column 99 in the seventh column, the angle input in the “θ” column 92 out of the circumferential length of the virtual circle whose radius is the length dimension input in the “R0” column 93. The length of the range is displayed as the arc length dimension. The “Arc Length” field 99 may be an input area in which the “Arc Length” field 99 is displayed by the function of the circumference information input unit 242. In this case, information related to the arc length of the arc belt-like region is input to the “Arc Length” column 99, and the numerical value of the angle is displayed in the “θ” column 92 as described above according to this input value.

  In “No. 0” in the first row, the “θ” column 92 displays 0 degrees as an initial value (default value). This conceptually indicates a virtual line R0 extending in the radial direction from the center Ct of the substrate shown in FIG.

  Returning to FIG. 4, the information input step S20 will be described. First, in the circumference information input step of step S21, for example, “10” degrees is input in the “θ” column 92 in “No. 1” in the second row of the input area 90 shown in FIG. Next, for example, “150” mm is entered in the “R0” column 93 in the diameter information input step of step S22.

  Conceptually, the imaginary line R1 extending 150 mm in the radial direction from the center Ct of the substrate shown in FIG. 6A is positioned at an angle of 10 degrees counterclockwise with respect to the imaginary line R0. Indicates that it is located. Note that WO indicates the outline of the substrate, and in this example, the radius of the substrate is 150 mm. In this embodiment, the outline of the substrate WO and the virtual circle L3 coincide. The value to be entered in the “R0” column 93 is arbitrary, and if it is a numerical value other than “150” mm, the outer diameter line WO does not match the virtual circle.

  Next, in the width information input step of step S23, for example, “5” mm is input in the “Inside” column 94 of the same row (second row). This sets the width dimension t1 of the inner region to 5 mm among the above two-step regions inside the arc (in the center Ct side of the substrate) in the virtual circle L3 connecting the end of the virtual line R0 to the end of the virtual line R1. It is shown that. Then, “0” mm is entered in the “Outside” column 95, which indicates that there is no width of the outer region in the two-step region. As a result, a first arc belt-like region E1 having a width dimension t1 of 5 mm is set.

  Next, in the drawing instruction input process of step S24, the radio button 97 on the left side of the “Expose” column 96 on the same line (second line) is selected and designated. This selection designation corresponds to the input of the area of the width dimension input in the “Inside” field 94 as the drawing area to be drawn, and as a result, the drawing area to be drawn by the first arc-shaped band area E1. Will be entered as. Conversely, when setting the first arc-shaped belt-like region E1 as a non-drawing region not to be drawn, the radio button 98 on the right side of the “Expose” field 96 is selected and designated. In this case, since the left radio button 97 corresponding to the drawing instruction in the “Inside” field 94 is not selected, the area of the width dimension input in the “Inside” field 94 is set as a non-drawing area. Become.

  In the “Arc Length” column 99 of the same row (second row), “26.17” mm is displayed as the arc length in conjunction with the input operation to the “θ” column 92. When the circumference information input step (step S22) is executed using the “Arc Length” column 99 as an input area, if “26.17” mm is input in the “Arc Length” column 99, the first information is similarly displayed. The arc-shaped belt region E1 can be set. In this case, “10” degrees are displayed in the “θ” column 92 in conjunction with the input operation to the “Arc Length” column 99.

  In addition, the circumference information input process, the diameter information input process, the width information input process, and the drawing instruction process in the information input process do not need to be performed in the above order, and the process order may be arbitrarily set.

  Next, in the confirmation display step of step S30, the shape of the first arc-shaped band region E1 and the arrangement position on the substrate are displayed in the confirmation display region 80 of the screen 7 by the function of the confirmation display unit 245.

  Next, in step S40, it is determined by the operator based on the display contents in the confirmation display area 80 or the like whether or not the setting of the arc belt-shaped area on the substrate has been completed. ) Return to the information input step (step S20) and continue the input operation. When it is determined that the setting work has been completed (in the case of Yes), the setting work is completed.

  In step S4, in the case of No, for example, the operator performs steps S21 to S24, which are input operations for “No. 2” in the third row shown in the input area 90 in FIG. 6B. Specifically, “35” degrees in the “θ” column 92, “150” mm in the “R0” column 93, “0” mm in the “Inside” column 94, and “0” mm in the “Outside” column. Is input using the operation unit 234 and the radio button 97 on the left side of the “Expose” 96 column is designated. At this time, “91.58” mm is displayed in the “Arc Length” column 99. In the same manner as described above, the input operation to the “Arc Length” column 99 may be performed instead of the input to the “θ” column 92.

  By inputting each information into each input area of “No. 2” in the third row, conceptually, the position is advanced 35 degrees counterclockwise from the virtual line R1 shown in FIG. The arranged virtual line R2 having a length of 150 mm is shown. A region having a width of “0” mm in each of the two steps inside the arc connecting the end of the imaginary line R1 and the end of the imaginary line R2 is an arc belt-like region. Specifically, the arc-shaped band area is not set.

  Next, the operator executes steps S21 to S24, which are the input operations for "No. 3" on the fourth line shown in the input area 90 of FIG. 6B. This input content is the same as the input content in “No. 2” in the second row, “10” degrees in the “θ” column 92, “150” mm in the “R0” column 93, and “Inside” column 94. The operator inputs “5” mm and “0” mm in the “Outside” field using the operation unit 234 and designates the radio button 97 on the left side of the “Expose” field. At this time, “Arc Length” column 99 displays “26.17” mm. In the same manner as described above, the input operation to the “Arc Length” column 99 may be performed instead of the input to the “θ” column 92.

  By entering each information into each input area of “No. 3” in the fourth row, conceptually, the position is advanced 10 degrees counterclockwise from the virtual line R2 shown in FIG. The arranged virtual line R3 having a length of 150 mm is shown. An area having a width of “5” mm inside from the arc connecting the end of the imaginary line R2 and the end of the imaginary line R3 is set as the second arc-shaped area E2.

  FIG. 7 is an example of the screen 7 when it is determined in step S40 of FIG. 6 that the setting operation has been completed (Yes). In FIG. 7, as a result of repeating the work shown in FIG. 6, it is confirmed in the confirmation display area 80 together with the outer shape WO of the substrate that eight arc belt-shaped areas E1 to E8 from 1 to 8 are set. It is displayed by the function of the display unit 245. Specifically, eight arc belt-like regions E1 to E8 having a circumferential length of 10 degrees and a radial dimension of 5 mm are spaced from each other by 35 degrees along the substrate outer shape WO. The arranged state is displayed in the confirmation display area 80. The input area 90 displays the input results from the second line (No. 1) to the 17th line (No. 16).

  When the setting operation in step S40 is completed, the arc area data T1 corresponding to the arc belt-like areas E1 to E8 is generated by the image processing apparatus 3 and transmitted directly to the drawing apparatus 100 via the network N. For example, the image processing device 3 generates the arc region data T1 as vector data indicating an outline such as the arc-shaped belt region E1. Note that the arc processing area data T1 is synthesized on the design data D0 or the modified design data D1 and the vector data by the image processing device 3, and the vector data after the synthesis processing is transmitted directly to the drawing device 100 via the network N. You may do it.

  As described above, the arc-shaped belt-like region is set by the three pieces of information including the circumference information input to the “θ” column 92, the diameter information input to the “R0” column, and the width information input to the “Inside” column 94. The amount of work can be reduced as compared with the conventional example that is set by eight pieces of information for specifying the coordinates of the four corners of the arc belt-shaped region shown in FIG.

  In addition, as described above, the circumferential length of the arc belt-like region is designated by angle information or arc length information, the radial position is designated by the distance from the center of the substrate, and the radial direction By designating the width dimension by the length information from the arc, it is possible to intuitively set the arc belt-like region as compared with the method of designating the coordinates of the four corners of the arc belt-like region shown in FIG. This is because the substrate has a circular shape and an arc band-like region is set on the peripheral edge of the substrate and the like, so it can be said that the setting method according to this embodiment can be performed intuitively.

  Furthermore, the information input process (step S20) from step S21 to step S24 described above is set as one combination to set one arc belt-like region, and this setting operation is sequentially repeated in the circumferential direction of the substrate, thereby the circumferential direction. Can be easily set in the entire area. As in the conventional example shown in FIG. 17, for example, it is not easy to specify the coordinate positions of the four corners of the eight arc-shaped belt-like regions because the two-dimensional coordinate position on the circular substrate needs to be found for each coordinate. Absent.

<Second embodiment>
A second embodiment which is another example of the information input step (step S20) will be described with reference to FIG.

  In the width information input step of step S23, “0” mm is input in the “Inside” column 94 of the second row (No. 1) shown in the input area 90, and “Outside” column 95 has “ The point which inputs 5 "mm differs from the said 1st Example. Further, it is different from the first embodiment in that the right radio button 98 in the “Expose” column 96 on the same line (second line) is selected and designated in the drawing instruction input process in step S24.

  In the second embodiment, the outer region is set to a width dimension of 5 mm and the inner region is set to 0 mm in the inner two-stage region from the arc in the virtual circle L3 connecting the end of the virtual line R0 to the end of the virtual line R1. Set to the width dimension. Further, since the outer area of 5 mm is set as the drawing area, as a result, as in the first embodiment, the first arc-shaped band area E1 having the width dimension t1 of 5 mm is set as the drawing area. When the first arc-shaped area E1 is set as a non-drawing area that is not drawn, the radio button 97 on the left side of the “Expose” field 96 is selected and designated. In this case, since the right radio button 98 corresponding to the drawing instruction in the “Outside” field 95 is not selected, the area of the width dimension input in the “Outside” field 95 is set as a non-drawing area. Become.

  For the third row (No. 2) shown in the input area 90, the same information input step (step S20) as in the first embodiment is executed, and for the fourth row (No. 3), The information input process (step S20) similar to the second line (No. 2) of the second embodiment is executed. As a result of this operation being performed in the circumferential direction, according to the second embodiment, as in the first embodiment, eight arc-shaped areas E1 to E8 shown in the confirmation display area 80 of FIG. 7 are set. can do.

<Third embodiment>
A third embodiment, which is another example of the information input process (step S20), will be described with reference to FIG.

  In the width information input step of step S23, “2” mm is input in the “Inside” column 94 of the second row (No. 1) shown in the input area 90, and “Outside” column 95 has “ The point which inputs 3 "mm differs from the said 1st Example and 2nd Example. Further, it is different from the first embodiment in that the right radio button 97 in the “Expose” column 96 on the same line (second line) is selected and designated in the drawing instruction input process in step S24.

  In the third embodiment, the outer area is set to a width dimension of 3 mm and the inner area is set to 2 mm in the inner two-stage area from the arc in the virtual circle L3 connecting the end of the virtual line R0 to the end of the virtual line R1. Set to the width dimension. Further, since the outer region having a width of 3 mm is set as the drawing region, as a result, the first arc-shaped belt region E1a having the width dimension t2 of 3 mm is set as the drawing region.

  In addition, an area having an inner width of 2 mm is set as the non-drawing area k1 in the two-stage area inside from the arc. The non-drawing region k1 also has a meaning as a drawing prohibited region k1 in which a pattern such as a wiring pattern other than the arc belt-like region is not drawn. In this manner, by providing the drawing prohibition region k1 between the first arc-shaped belt-like region E1a and the wiring pattern or the like, a desired gap is formed between the arc-shaped plating electrode or the like formed on the substrate and the wiring pattern. Can be reliably provided.

  For the third row (No. 2) shown in the input area 90, the same information input step (step S20) as in the first embodiment is executed, and for the fourth row (No. 3), The information input process (step S20) similar to the 2nd line (No. 2) of 3 Example is performed. As a result of this operation being performed in the circumferential direction, eight arc-shaped belt-like areas E1a to E8a and drawing prohibited areas k1 to k8 are set, and the setting results are displayed in the confirmation display area 80 of FIG.

  In the width information input step of step S23 in each of the above embodiments, the inner side from the arc in the virtual circle L3 is input in a two-step range, but may be two or more steps, and may be a plurality of ranges in the radial direction. You may input width information respectively. Moreover, you may input the width information of the area | region of not only the inner side of the said circular arc but an outer side area | region and both inside and outside.

<Configuration of direct drawing apparatus>
Next, the configuration of the direct drawing apparatus 100 will be described with reference to FIGS. 10 and 11. 10 is a side view of the direct drawing apparatus 100 according to an embodiment of the present invention, and FIG. 11 is a plan view of the direct drawing apparatus 100 shown in FIG.

  The direct drawing apparatus 100 is an apparatus for drawing an exposure pattern by scanning a spatially modulated light beam on the surface of a substrate W such as a semiconductor substrate or a glass substrate provided with a photoresist film (photosensitive material). is there. Specifically, in the manufacturing process of a semiconductor device chip, a wiring pattern is drawn on a photosensitive photoresist film formed on the surface of a support substrate (hereinafter simply referred to as “substrate”) W that is a substrate to be exposed. It is a device for doing. The substrate W has a circular shape, and a notch called a notch is formed in a part of the outer peripheral edge thereof. An orientation flat may be provided on a part of the outer peripheral edge of the substrate W instead of the notch. The direct drawing apparatus 100 is an exposure apparatus that performs exposure processing in units of blocks that divide the substrate W.

  As shown in FIGS. 10 and 11, the direct drawing apparatus 100 mainly measures the stage 10 that holds the substrate W, the stage moving mechanism 20 that moves the stage 10, and the position parameter corresponding to the position of the stage 10. A position parameter measuring mechanism 30, an optical head unit 50 that irradiates the surface of the substrate W with pulsed light, one alignment camera 60, and a control unit 70.

  Further, in the direct drawing apparatus 100, each part of the apparatus is arranged inside the main body formed by attaching the cover 102 to the main body frame 101 to form the main body, and outside the main body (in this embodiment, As shown in FIG. 11, the substrate storage cassette 110 is disposed on the right hand side of the main body. The substrate storage cassette 110 stores an unprocessed substrate W to be subjected to exposure processing, and is loaded into the main body by a transfer robot 120 disposed inside the main body. Further, after the exposure process (pattern drawing process) is performed on the unprocessed substrate W, the substrate W is unloaded from the main body by the transfer robot 120 and returned to the substrate storage cassette 110. Thus, the transfer robot 120 functions as a transfer unit.

  In this main body, as shown in FIG. 11, the transfer robot 120 is arranged at the right hand end inside the main body surrounded by the cover 102. A base 130 is disposed on the left hand side of the transfer robot 120. One end side region (the right hand side region in FIGS. 10 and 11) of the base 130 is a substrate delivery region for delivering the substrate W to and from the transfer robot 120, while the other end side region. (Left-hand side region in FIGS. 10 and 11) is a pattern drawing region for pattern drawing on the substrate W. On the base 130, a head support 140 is provided at the boundary position between the substrate delivery area and the pattern drawing area. In the head support portion 140, as shown in FIG. 10, two leg members 141 and 142 are erected upward from the base 130, and a beam is formed so as to bridge the top portions of the leg members 141 and 142. A member 143 is provided horizontally. Then, as shown in FIG. 10, an alignment camera (imaging unit) 60 is fixed to the beam member 143 on the side opposite to the pattern drawing region side, and the surface of the substrate W held on the stage 10 (to be drawn) as will be described later. A plurality of alignment marks and lower layer patterns on the surface and the exposed surface).

  The stage 10, which is a support unit that supports the substrate W, is moved in the X direction, the Y direction, and the θ direction by the stage moving mechanism 20 on the base 130. That is, the stage moving mechanism 20 positions the stage 10 by moving it two-dimensionally in the horizontal plane and adjusting the relative angle with respect to the optical head unit 50 described later by rotating it around the θ axis (vertical axis). To do.

  Further, the optical head unit 50 is attached to the head support unit 140 configured in this manner so as to be movable in the vertical direction. As described above, the alignment camera 60 and the optical head unit 50 are attached to the head support unit 140, and the positional relationship between the two in the XY plane is fixed. The optical head unit 50 performs pattern drawing on the substrate W, and is moved in the vertical direction by a head moving mechanism (not shown). When the head moving mechanism operates, the optical head unit 50 moves in the vertical direction, and the distance between the optical head unit 50 and the substrate W held on the stage 10 can be adjusted with high accuracy. Thus, the optical head unit 50 functions as a drawing head.

  Two leg members 141 and 142 are also erected at the end of the base 130 opposite to the board delivery side (the left hand side end in FIGS. 10 and 11). And the box 172 which accommodated the optical system of the optical head part 50 is provided so that the beam member 143 and the top part of the two leg members 141 and 142 may be bridged, and the pattern drawing area | region of the base 130 is provided from upper direction. Covering.

  The stage 10 has a cylindrical outer shape, and is a holding unit for placing and holding the substrate W in a horizontal posture on the upper surface thereof. A plurality of suction holes (not shown) are formed on the upper surface of the stage 10. For this reason, when the substrate W is placed on the stage 10, the substrate W is attracted and fixed to the upper surface of the stage 10 by the suction pressure of the plurality of suction holes. In the present embodiment, a photoresist (photosensitive material) film is formed in advance on the surface (main surface) of the substrate W to be subjected to the drawing process by a spin coating method (rotary coating method) or the like.

  The stage moving mechanism 20 moves the stage 10 in the main scanning direction (Y-axis direction), sub-scanning direction (X-axis direction), and rotation direction (rotation direction around the Z-axis) with respect to the base 130 of the direct drawing apparatus 100. It is a mechanism for moving. The stage moving mechanism 20 includes a rotation mechanism 21 that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. And a main scanning mechanism 25 for moving the base plate 24 in the main scanning direction.

  The rotation mechanism 21 has a motor constituted by a rotor attached inside the stage 10. A rotary bearing mechanism is provided between the lower surface side of the center portion of the stage 10 and the support plate 22. For this reason, when the motor is operated, the rotor moves in the θ direction, and the stage 10 rotates within a predetermined angle range around the rotation axis of the rotary bearing mechanism.

  The sub-scanning mechanism 23 has a linear motor 23 a that generates a propulsive force in the sub-scanning direction by a mover attached to the lower surface of the support plate 22 and a stator laid on the upper surface of the base plate 24. The sub-scanning mechanism 23 has a pair of guide rails 23 b that guide the support plate 22 along the sub-scanning direction with respect to the base plate 24. For this reason, when the linear motor 23a is operated, the support plate 22 and the stage 10 move in the sub-scanning direction along the guide rail 23b on the base plate 24.

  The main scanning mechanism 25 has a linear motor 25 a that generates a propulsive force in the main scanning direction by a moving element attached to the lower surface of the base plate 24 and a stator laid on the upper surface of the head support portion 140. The main scanning mechanism 25 has a pair of guide rails 25b for guiding the base plate 24 along the main scanning direction with respect to the head support portion 140. For this reason, when the linear motor 25a is operated, the base plate 24, the support plate 22, and the stage 10 move in the main scanning direction along the guide rail 25b on the base 130. As such a stage moving mechanism 20, a conventionally used XY-θ axis moving mechanism can be used.

  The position parameter measuring mechanism 30 is a mechanism for measuring a position parameter of the stage 10 using laser beam interference. The position parameter measurement mechanism 30 mainly includes a laser beam emitting unit 31, a beam splitter 32, a beam bender 33, a first interferometer 34, and a second interferometer 35.

  The laser beam emitting unit 31 is a light source device for emitting a measurement laser beam. The laser beam emitting unit 31 is installed at a fixed position, that is, a position fixed to the base 130 and the optical head unit 50 of the present apparatus. The laser light emitted from the laser light emitting unit 31 first enters the beam splitter 32 and travels from the beam splitter 32 to the beam bender 33 and from the beam splitter 32 to the second interferometer 35. The light is branched to the second branched light.

  The first branched light is reflected by the beam bender 33 and is incident on the first interferometer 34, and at the same time, a first part (here, the −Y side end of the stage 10 from the first interferometer 34). Irradiated to the central portion 10a of the end on the -Y side. Then, the first branched light reflected by the first part 10a is incident on the first interferometer 34 again. The first interferometer 34 determines a positional parameter corresponding to the position of the first portion 10a of the stage 10 based on the interference between the first branched light traveling toward the stage 10 and the first branched light reflected from the stage 10. measure.

  On the other hand, the second branched light is incident on the second interferometer 35, and the second part (different from the first part 10a) on the −Y side end of the stage 10 from the second interferometer 35. Part) 10b is irradiated. Then, the second branched light reflected at the second portion 10 b is incident on the second interferometer 35 again. The second interferometer 35 sets a positional parameter corresponding to the position of the second portion 10b of the stage 10 based on the interference between the second branched light traveling toward the stage 10 and the second branched light reflected from the stage 10. measure. The first interferometer 34 and the second interferometer 35 transmit the position parameters acquired by the respective measurements to the control unit 70.

  The optical head unit 50 is a light irradiation unit that emits pulsed light toward the surface of the substrate W held on the stage 10. The optical head unit 50 includes a beam member 143 laid on the base 130 so as to straddle the stage 10 and the stage moving mechanism 20, and one optical head provided on the beam member 143 substantially at the center in the sub-scanning direction. Part 50. The optical head unit 50 is connected to one laser oscillator 54 via the illumination optical system 53. Further, a laser drive unit 55 that drives the laser oscillator 54 is connected to the laser oscillator 54 that is a light source. When the laser driving unit 55 is operated, pulsed light is emitted from the laser oscillator 54, and the pulsed light is introduced into the optical head unit 50 through the illumination optical system 53.

  In the optical head unit 50, pulse light is introduced from the illumination optical system 53 into the optical head unit 50 from the introduction unit, and the introduced pulse light is converted into a light beam shaped into a predetermined pattern shape. A pattern is drawn on the surface of the substrate W by irradiating the surface of the substrate W and exposing the photoresist film (photosensitive layer) on the substrate W.

  In the direct drawing apparatus 100 of FIG. 10, a laser oscillator 54 as a light source is provided in the box 172, and light from the laser oscillator 54 is introduced into the optical head unit 50 through the illumination optical system 53. In this embodiment, a photoresist (photosensitive material) film that is exposed to ultraviolet rays is formed in advance on the main surface of the substrate W, and the laser oscillator 54 uses ultraviolet rays (i-line) having a wavelength λ of about 365 nm. It is a laser light source which radiates | emits. Of course, the laser oscillator 54 may emit light of other wavelengths included in the wavelength band in which the photosensitive material of the substrate W is exposed.

  FIG. 12 is a diagram showing the illumination optical system 53 and the projection optical system 517 of the direct drawing apparatus 100. Light from the laser oscillator 54 shown in FIG. 10 is irradiated to the spatial light modulator 511 of the light modulation unit 512 via the illumination optical system 53 and the mirror 516 shown in FIG. The light spatially modulated by the spatial light modulator 511 is irradiated onto the substrate W supported by the stage 10 via the projection optical system 517.

  The illumination optical system 53 includes a telescope 540, a condenser lens 541, an attenuator 542, and a focusing lens 543. The telescope 540 has a function of expanding the beam diameter (cross-sectional shape) of light (laser beam) in the X and Z directions, and is composed of three lenses. The condenser lens 541 has a function of expanding the laser beam in the X direction. The attenuator 542 adjusts the energy amount (transmission amount) of the laser beam that passes therethrough. The focusing lens 543 has a function of reducing the cross-sectional dimension of the laser beam in the Z direction. Light (laser beam) emitted from the focusing lens 543 is applied to the spatial light modulator 511 as linear illumination light that extends in the X direction and is reduced in the Y direction via the mirror 516. The illumination optical system 53 is not necessarily configured as shown in FIG. 12, and other optical elements may be added.

  The light irradiated from the illumination optical system 53 to the spatial modulator 511 passes through the opening of the shielding plate 521 of the projection optical system, which will be described later, from the specularly reflected light (zeroth-order light) reflected from the spatial light modulator 511. Since the (± 1) -order diffracted light generated from the modulator 511 is shielded by the shielding plate 521, it is preferably closer to parallel light. For this reason, the numerical aperture NA1 of the illumination optical system 53 is set to be larger than 0 (zero) and 0.06 or less. The numerical aperture NA1 is obtained by NA1 = n · sin θ1, where θ1 is the maximum angle with respect to the optical axis of the illumination light in the YZ plane through which linear illumination light extending in the X direction passes. However, n is the refractive index of the medium. In the present embodiment, the medium is air, so the refractive index n is 1.

  The projection optical system 517 includes four lenses 518, 519, 520, and 522, a shielding plate (aperture member) 521, a zoom lens 523, and a focusing lens 524. The lenses 518, 519, 520, 522 and the shielding plate 521 of the projection optical system 517 constitute a schrieren optical system that is telecentric on both sides, and the light that has passed through the lens 520 is guided to the shielding plate 521 having an aperture. In addition, a part of the light (regular reflection light (0th order light)) is guided to the lens 522 through the opening, and the remaining light ((± 1) order diffracted light) is shielded by the shielding plate 521. The light that has passed through the lens 522 is guided to the zoom lens 523, and is guided to the photoresist film (photosensitive material) on the substrate W at a predetermined magnification via the focusing lens 524. Note that the projection optical system 517 is not necessarily configured as shown in FIG. 12, and other optical elements may be added.

  In order to reduce the change in the diameter (width) of light irradiated onto the substrate W according to the focal position (focus position), it is necessary to set the depth of field of the projection optical system 517 to be long (deep). For this reason, the numerical aperture NA2 of the projection optical system 517 is preferably small, and is set to 0.1, for example. The numerical aperture NA2 is obtained by NA2 = n · sin θ2, where θ2 is the maximum angle with respect to the optical axis of the projection light on the YZ plane through which linear projection light extending in the X direction passes. However, n is the refractive index of the medium. In the present embodiment, the medium is air, so the refractive index n is 1.

  The value (σ value) obtained by dividing the numerical aperture NA1 of the illumination optical system 53 by the numerical aperture NA2 of the projection optical system 517 is a substrate in which the specularly reflected light reflected by the spatial light modulator 511 is formed in a desired shape as described above. In order to irradiate on W, it is preferable to be close to 0, for example, larger than 0 and set to 0.6 or less.

  A drawing controller 515 that performs modulation control of the light modulation unit 512 is electrically connected to the spatial light modulator 511. The drawing control unit 515 and the projection optical system 517 are built in the optical head unit 50. An exposure control unit 514 and a drawing signal processing unit 513 are electrically connected to the drawing control unit 515, respectively. A drawing signal processing unit 513 and the stage moving mechanism 20 are electrically connected to the exposure control unit 514. The exposure control unit 514 and the drawing signal processing unit 513 are provided in the control unit 70 of FIG.

  FIG. 13 is an enlarged view showing the spatial light modulator 511. A spatial light modulator 511 shown in FIG. 13 is manufactured using a semiconductor device manufacturing technique, and is a diffraction grating capable of changing the depth of the grating. In the spatial light modulator 511, a plurality of movable ribbons 530a and fixed ribbons 531b are alternately arranged in parallel. As will be described later, the movable ribbon 530a can be moved up and down individually with respect to the reference plane behind, and fixed. The ribbon 531b is fixed with respect to the reference plane. As a diffraction grating type spatial light modulator, for example, GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (San Jose, Calif.)) Is known.

  A fixed reflection surface is provided on the upper surface of the fixed ribbon 531b, and a movable reflection surface is provided on the upper surface of the movable ribbon 530a. A plurality of movable ribbons 530a and fixed ribbons 531b are irradiated with linear light whose light beam cross section is long in the arrangement direction. In the spatial light modulator 511, if each of the adjacent movable ribbon 530a and fixed ribbon 531b has a single ribbon pair as a lattice element, three or more adjacent lattice elements are drawn in one pixel of a pattern to be drawn. Correspond. In this embodiment, a set of four lattice elements adjacent to each other is a modulation element corresponding to one pixel, and in FIG. 13, a set of ribbon pairs constituting one modulation element is denoted by reference numeral 535. Surrounded by a thick rectangle.

  The driver circuit unit 536 deflects the movable ribbon 530a toward the reference plane side by applying a voltage (potential difference) between the movable ribbon 530a and the reference plane. As a result, the movable ribbon 530a moves up and down between an initial position separated from the reference plane and a position in contact with the reference plane, and the height position of the movable ribbon 530a is set.

  A control unit 70 shown in FIG. 10 is an information processing unit for directly controlling the operation of each unit in the drawing apparatus 100 while executing various arithmetic processes. FIG. 14 is a block diagram illustrating a connection configuration between the above-described units of the direct drawing apparatus 100 and the control unit 70. As shown in FIG. 14, the control unit 70 includes the rotation mechanism 21, linear motors 23 a and 25 a, the laser light emitting unit 31, the first interferometer 34, the second interferometer 35, the illumination optical system 53, The laser drive unit 55, the projection optical system 517, and the alignment camera 60 are electrically connected. The control unit 70 is configured by, for example, a computer having a CPU and a memory, and performs operation control of the above-described units when the computer operates according to a program installed in the computer.

  In addition, the control unit 70 configured as described above has a CPU 71, a memory 72, and the like as shown in FIG. Arranged in an electrical rack (not shown). FIG. 15 is a block diagram illustrating a control unit that controls the drawing operation. The rasterization unit 73 and the data generation unit 75 are realized by the CPU in the computer 71 performing arithmetic processing according to a predetermined program.

  For example, pattern data corresponding to one semiconductor package is pattern data generated by an external CAD or the like, and is prepared in advance in the memory 72 as drawing pattern data 76. The drawing pattern of the semiconductor package is drawn on the substrate W as described later. Here, the computer 71 plays a role of the drawing signal processing unit 513 shown in FIG. The drawing pattern data 76 corresponds to the design data D0, the modified design data D1, and the arc region data T1. The drawing pattern data 76 may be data obtained by combining the design data D0 or the modified design data D1 and the arc region data T1.

  The rasterizing unit 73 divides and rasterizes the unit area indicated by the drawing data generated by the data generating unit 75, generates raster data 77, and stores it in the memory 72. In this way, the unprocessed substrate W is drawn after the preparation of the raster data 77 or in parallel with the preparation of the raster data 77.

  The drawing data generated in this way is sent from the data generation unit 75 to the exposure control unit 514, and the exposure control unit 514 controls each part of the light modulation unit 512 and the stage moving mechanism 20, thereby drawing one stripe. Is called. Control of the light modulation unit 512 by the exposure control unit 514 is executed via the drawing control unit 515 as shown in FIG. When the exposure recording for one stripe is completed, the same processing is performed for the next divided region, and drawing is repeated for each stripe. In the present embodiment, the control unit of the present invention is realized by the control unit 70, the drawing control unit 515, the exposure control unit 514, the driver circuit unit 536, and the like.

  Further, the direct drawing apparatus 100 divides the substrate W by controlling the light modulation unit 512 by the exposure control unit 514 executed via the drawing control unit 515 shown in FIG. 12 during the drawing operation for each stripe. The exposure operation is executed in units of blocks based on the exposure conditions set for each block.

  In addition, the direct drawing apparatus 100 performs a drawing operation on the first to eighth arc belt-shaped regions E1 to E8 set according to the first embodiment, the second embodiment, or the third embodiment described above, for example. These arc-shaped belt-like regions are regions where, for example, plating electrodes are formed, and are regions where the photoresist film is removed in a later development processing step. When the photoresist film is a positive type, the direct drawing apparatus 100 uses the arc-shaped belt-like region as a drawing region, scans with a light beam, and exposes the photoresist film in the region. When the photoresist film is a negative type, the direct drawing apparatus 100 sets the arc-shaped area as a non-drawing area and does not scan the photoresist film in the area without scanning with the light beam.

  In the case where the arc belt-shaped region is the above numbering region, consideration is given to whether the photoresist film is a positive type or a negative type, process processing in the subsequent step, etc. so that the laser marking in the numbering region is not crushed in the subsequent step. Then, the drawing process is executed using the arc-shaped belt-like region as the drawing region or the non-drawing region.

  In this embodiment, the computer 71 shown in FIG. 15 is directly provided in the drawing apparatus 100. However, the computer 71 may be provided in the image processing apparatus 3 shown in FIG.

<Stage position control>
The direct drawing apparatus 100 has a function of controlling the position of the stage 10 based on the measurement results of the first interferometer 34 and the second interferometer 35. Hereinafter, such position control of the stage 10 will be described.

  As described above, the first interferometer 34 and the second interferometer 35 measure position parameters corresponding to the positions of the first part 10a and the second part 10b of the stage 10, respectively. The first interferometer 34 and the second interferometer 35 transmit the position parameters P1 and P2 acquired by the respective measurements to the control unit 70. As illustrated in FIG. 15, the control unit 70 includes a computer 71 as a calculation unit. The function of the computer 71 is realized by the CPU of the computer 71 operating according to a predetermined program, for example.

  On the other hand, the control unit 70 calculates the position of the stage 10 (the position in the Y-axis direction and the rotation angle around the Z-axis) based on the position parameters transmitted from the first interferometer 34 and the second interferometer 35. . Next, the control unit 70 accurately controls the position of the stage 10 and the moving speed of the stage 10 by operating the stage moving mechanism 20 while referring to the calculated position of the stage 10. Here, the control unit 70 also corrects the tilt of the stage 10 (shift in the rotation angle around the Z axis) accompanying the movement in the main scanning direction by rotating the stage 10 around the Z axis. Further, the control unit 70 accurately controls the irradiation position of the pulsed light on the surface of the substrate W by operating the laser driving unit 55 while referring to the calculated position of the stage 10.

<Operation of direct drawing device>
Next, an example of the operation of the direct drawing apparatus 100 will be described with reference to the flowchart of FIG.

  When processing the substrate W in the direct drawing apparatus 100, first, calibration processing for adjusting the position and light amount of the pulsed light emitted from the optical head unit 50 is performed (step S1). In the calibration process, first, the CCD camera (not shown) is arranged below the optical head unit 50 by moving the base plate 24. Then, while moving the CCD camera in the sub-scanning direction, the optical head unit 50 emits pulsed light, and the emitted pulsed light is photographed by the CCD camera. The control unit 70 operates the illumination optical system 53 of the optical head unit 50 based on the acquired image data, and thereby adjusts the position and amount of pulsed light emitted from the optical head unit 50.

  When the calibration process is completed, the transfer robot 120 then carries the substrate W and places it on the upper surface of the stage 10 (step S2).

  Subsequently, the direct drawing apparatus 100 performs an alignment process for adjusting the relative position between the substrate W placed on the stage 10 and the optical head unit 50 (step S3). In step S2, the substrate W is placed at a substantially predetermined position on the stage 10, but the positional accuracy for drawing a fine pattern is often not sufficient. For this reason, by performing the alignment process, the position and inclination of the substrate W are finely adjusted to improve the accuracy of the subsequent drawing process.

  In the alignment process, first, alignment marks formed at the four corners of the upper surface of the substrate W are photographed by the alignment camera 60, respectively. Based on the position of each alignment mark in the image acquired by the alignment camera 60, the control unit 70 shifts the substrate W from the ideal position (a positional shift amount in the X-axis direction, a positional shift amount in the Y-axis direction, And the amount of inclination around the Z axis). And the position of the board | substrate W is correct | amended by operating the stage moving mechanism 20 in the direction which reduces the calculated deviation | shift amount.

  Subsequently, the direct drawing apparatus 100 performs a drawing process on the substrate W after the alignment process (step S4). That is, the direct drawing apparatus 100 irradiates the upper surface of the substrate W with the pulsed light from the optical head unit 50 toward the upper surface of the substrate W while moving the stage 10 in the main scanning direction and the sub-scanning direction. A pattern is drawn for each of a plurality of blocks that partition the substrate W. Further, a drawing operation for the arc-shaped belt-like regions E1 to E8 is executed.

  When the drawing process is completed, the direct drawing apparatus 100 operates the stage moving mechanism 20 to move the stage 10 and the substrate W to the carry-out position. Then, the transfer robot 120 unloads the substrate W from the upper surface of the stage 10 (step S5).

<Deformation implementation>
In the direct drawing apparatus 100 of the above embodiment, the substrate W is moved with respect to the optical head unit 50 and the like, but the relative movement is realized by moving the optical head unit 50 and the like with respect to the solid-supported substrate W. You may let them.

DESCRIPTION OF SYMBOLS 2 GUI apparatus 4 Direct drawing system 5 Computer 7 Screen 80 Confirmation display area 90 Input area 100 Direct drawing apparatus 200 Display part 234 Operation part 240 Display control part 241 Circumferential information input part 242 Diameter information input part 243 Width information input part 244 Drawing instruction | indication Input unit 245 Confirmation display unit W Substrate P Program E1 Circular belt-shaped area

Claims (11)

A GUI device used for a direct drawing device for drawing a pattern on a photoresist film formed on the surface of a circular substrate, and for setting an arc-shaped belt-like region in the substrate as a drawing region or a non-drawing region. And
A display unit having a screen;
An operation unit for operating the screen of the display unit;
A display control unit for controlling the screen display of the display unit;
With
The display control unit
A circumferential information input unit for displaying an input area for inputting information related to the circumferential length of the arc-shaped belt-shaped region on the screen of the display unit;
A diameter information input unit for displaying an input area for inputting position information of the arc-shaped band-shaped region in the radial direction of the substrate on the screen of the display unit;
A width information input section for displaying an input area for inputting width information in the radial direction of the arc-shaped belt-shaped area on the screen of the display section;
Drawing instruction to display on the screen of the display section an input area for inputting whether the arc-shaped band area set by the diameter information input section, circumference information input section and width information input section is a drawing area or a non-drawing area An input section;
Confirmation display unit for displaying on the screen of the display unit the substrate outer shape, and the arc-shaped band region based on the information respectively input by the operation unit to the diameter information input unit, the circumference information input unit, the width information input unit, and the drawing instruction input unit When,
A GUI apparatus for a direct drawing apparatus, comprising: The GUI apparatus for a direct drawing apparatus according to claim 1,
The display control unit
The peripheral information input unit, diameter information input unit, width information input unit, and drawing instruction input unit are combined into one combination, and an input area for sequentially inputting information in the circumferential direction is displayed on the screen of the display unit. GUI device for direct drawing device. In the GUI apparatus for a direct drawing apparatus according to claim 1 or 2,
Peripheral information input section displays an input area for inputting the numerical value of the angle or an input area for inputting the length of the arc as information related to the circumferential length of the arc belt-shaped area GUI device for direct drawing device to be displayed on the screen. In the GUI apparatus for direct drawing apparatuses in any one of Claims 1-3,
A GUI apparatus for a direct drawing apparatus in which a width information input unit displays a plurality of input areas for inputting width information in a plurality of ranges in the radial direction on a screen of a display unit.   5. A direct drawing system comprising: the GUI device according to claim 1; and a direct drawing device that draws a pattern by scanning a spatially modulated light beam on the photoresist film. A drawing area setting method for setting a drawing area to be drawn by a drawing apparatus directly by a GUI apparatus having a display unit and an operation unit, or an arc-shaped belt-like area that is a non-drawing area not to be drawn,
An input area for inputting information related to the circumferential length of the arc-shaped strip area on the display screen, an input area for inputting position information of the arc-shaped strip area in the radial direction of the substrate, and an arc-shaped strip area An input screen display step for displaying an input region for inputting width information in the radial direction of the input region, and an input region for inputting information on whether the arc-shaped belt-like region is a drawing region or a non-drawing region;
An information input step of inputting each information by the operation unit to each input area displayed on the screen of the display unit by the input screen display step;
On the screen of the display unit, a confirmation display step for displaying the outer shape of the substrate and the arc-shaped belt region based on each information input by the information input step,
Drawing area setting method including The drawing area setting method according to claim 6,
A plurality of combinations of input areas displayed in the input screen display process are displayed in the circumferential direction,
A drawing area setting method in which the information input process is a process of sequentially inputting each information in the circumferential direction for each combination of the input areas. Used for a direct drawing apparatus that draws a pattern on a photoresist film formed on the surface of a circular substrate, and includes a GUI device for setting an arc-shaped belt-like region in the substrate as a drawing region or a non-drawing region A computer-readable program,
On the screen of the display unit that the GUI device has,
A display function of a circumferential information input area for displaying an input area for inputting information related to the circumferential length of the arc-shaped belt-shaped area;
A display function of a diameter information input area for displaying an input area for inputting position information of the arc-shaped belt-shaped area in the radial direction of the substrate;
A display function of a width information input area for displaying an input area for inputting width information in the radial direction of the arc-shaped belt-shaped area;
A drawing instruction input area for displaying an input area for inputting information indicating whether the arc-shaped band area set by the diameter information input area , the circumference information input area, and the width information input area is a drawing area or a non-drawing area. Display function,
Confirmation display function for displaying a board shape, size information input area, peripheral information input area, and a circular arc band area based on information inputted by the operation unit G UI device has the width information input area and the drawing instruction input region When,
A program characterized by causing a computer to demonstrate. In the program according to claim 8,
On the display screen,
The diameter information input area, circumference information input area, width information input area, and drawing instruction input area are combined as one combination, and this combination displays a function for displaying an input area for sequentially inputting each information in the circumferential direction. Program to be demonstrated. In the program according to claim 8 or 9,
On the display screen,
As the information related to the circumferential length of the arcuate band-like region, an input area for inputting an angle of numeric, or, a function of displaying the input area for inputting the arc length to the computer Program to be demonstrated. In the program according to any one of claims 8 to 10,
On the display screen,
A program that causes a computer to exhibit a function of displaying a plurality of input areas for inputting width information in a plurality of ranges in the radial direction on a screen of a display unit.

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