TW201434655A - Release film for producing green sheet and method of producing release film for producing green sheet - Google Patents

Release film for producing green sheet and method of producing release film for producing green sheet Download PDF

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TW201434655A
TW201434655A TW103108758A TW103108758A TW201434655A TW 201434655 A TW201434655 A TW 201434655A TW 103108758 A TW103108758 A TW 103108758A TW 103108758 A TW103108758 A TW 103108758A TW 201434655 A TW201434655 A TW 201434655A
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layer
green sheet
substrate
release agent
release film
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TW103108758A
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TWI551457B (en
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Tomomi Fukaya
Shinya Ichikawa
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Lintec Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28BSHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B1/00Producing shaped prefabricated articles from the material
    • B28B1/30Producing shaped prefabricated articles from the material by applying the material on to a core or other moulding surface to form a layer thereon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/16Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/38Layered products comprising a layer of synthetic resin comprising epoxy resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/538Roughness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/748Releasability
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/16Capacitors

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)
  • Producing Shaped Articles From Materials (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

A release film of the present invention for producing a green sheet includes a base having a first surface and a second surface, a smoothing layer provided on the first surface, and a release agent layer provided at a side of a surface of the smoothing layer opposite to the base. The smoothing layer is formed by heating and curing a smoothing layer forming composition which includes a thermosetting compound having a mass average molecular weight of 950 or less. An average roughness Ra1 of an outer surface of the release agent layer is 8 nm or less and a height Rp1 of a maximum protrusion of the outer surface is 50 nm or lower. According to the present invention, it is possible to prevent pinholes from occurring to a surface of the green sheet and produce the green sheet having high reliability.

Description

生坯片製造用離形膜及生坯片製造用離形膜之製造方法 Release film for producing green sheet and method for producing release film for producing green sheet

本發明係關於一種生坯片(green sheet)製造用離形膜及生坯片製造用離形膜之製造方法。 The present invention relates to a release film for producing a green sheet and a method for producing a release film for producing a green sheet.

關於陶瓷電容器(ceramic condenser)之製造中,為了形成生坯片而使用著生坯片製造用離形膜。 In the production of a ceramic capacitor, a release film for producing a green sheet is used in order to form a green sheet.

一般而言,生坯片製造用離形膜係由基材及離形劑層構成。於如此之生坯片製造用離形膜上塗覆陶瓷漿料並將其乾燥而製造出生坯片,陶瓷漿料係於有機溶劑中分散、溶解陶瓷粒子與黏合劑樹脂。接著,所製造出之生坯片係從生坯片製造用離形膜剝離下來而用於陶瓷電容器之製造。 In general, a release film for producing a green sheet is composed of a substrate and a release agent layer. The ceramic slurry is coated on the release film for producing a green sheet and dried to produce a green sheet which is dispersed and dissolved in an organic solvent to dissolve the ceramic particles and the binder resin. Next, the produced green sheet was peeled off from the release film for green sheet production and used for the production of a ceramic capacitor.

使用習知之生坯片製造用離形膜製造生坯片的過程中,生坯片製造用離形膜之表面凹凸狀態會轉印至生坯片,而使得生坯片之表面產生針孔等問題。如此之結果,堆疊如此之生坯片而製造出的陶瓷電容器中,會產生因短路所導致之故障問題。為了解決這樣的問題,必須對於生坯片製造用離形膜之表面(鑄 造表面)要求非常高的平滑性。 In the process of manufacturing a green sheet using a release film by the conventional green sheet manufacturing, the surface unevenness state of the release film for producing a green sheet is transferred to the green sheet, and pinholes are formed on the surface of the green sheet. problem. As a result, in the ceramic capacitor manufactured by stacking such a green sheet, a problem of malfunction due to a short circuit occurs. In order to solve such a problem, it is necessary to mold the surface of the release film for green sheet production (casting) Surface preparation) requires very high smoothness.

因此,有人提出表面平滑之生坯片製造用離形膜之 製造方法,此離形膜係於具有表面微細凹凸狀態的基材板之一個表面上,藉由塗布熱硬化樹脂液並對其加熱、硬化而設置熱硬化樹脂層,且於熱硬化樹脂層上塗布離形劑而形成離形劑層(例如參照專利文獻1,日本專利公開案2007-069360號公報)。 Therefore, it has been proposed to use a release film for the production of a smooth surface green sheet. In the manufacturing method, the release film is attached to one surface of a substrate sheet having a surface fine uneven state, and a thermosetting resin layer is provided by applying a thermosetting resin liquid and heating and hardening, and is provided on the thermosetting resin layer. The release agent is applied to form a release agent layer (for example, see Patent Document 1, Japanese Patent Laid-Open Publication No. 2007-069360).

再者,近年隨著陶瓷電容器的小型化及高密度化, 人們要求生坯片必須更加薄膜化。然而,使用習知之生坯片製造用離形膜製造薄的生坯片時,便會在生坯片之表面產生針孔,而難以得到高信賴度的生坯片。 Furthermore, in recent years, with the miniaturization and high density of ceramic capacitors, It is required that green sheets must be more thinned. However, when a thin green sheet is produced by using a conventional release film for producing a green sheet, pinholes are formed on the surface of the green sheet, and it is difficult to obtain a green sheet of high reliability.

本發明之目的在於提供生坯片製造用離形膜,其能 夠防止生坯片之表面發生針孔或部分過厚之不均等情形,而能夠製造高信賴度之生坯片。再者,本發明之另一目的在於提供生坯片製造用離形膜之製造方法,其能夠防止生坯片之表面發生針孔或部分過厚之不均等情形。 The object of the present invention is to provide a release film for producing a green sheet, which can It is possible to prevent pinholes or partial thickness from being uneven on the surface of the green sheet, and it is possible to manufacture a green sheet of high reliability. Further, another object of the present invention is to provide a method for producing a release film for producing a green sheet which can prevent pinholes or partial unevenness from occurring on the surface of the green sheet.

藉由下述(1)~(7)之本發明達成所述目的。 The object is achieved by the present invention of (1) to (7) below.

(1)一種生坯片製造用離形膜,包括一基材、一平 滑化層及一離形劑層。基材具有一第一表面及一第二表面。平滑化層設置於前述基材之前述第一表面位置。離形劑層設置於前述平滑化層之相反於前述基材之一表面位置。前述平滑化層係藉由加熱並硬化含有一質量平均分子量為950以下之一熱硬化性化合 物之一平滑化層形成用組成物而形成。前述離形劑層之一外表面之一算數平均粗糙度Ra1為8nm以下,且前述離形劑層之前述外表面之一最大突起高度Rp1為50nm以下。 (1) A release film for producing a green sheet, comprising a substrate, a smoothing layer, and a release agent layer. The substrate has a first surface and a second surface. The smoothing layer is disposed on the aforementioned first surface position of the substrate. The release agent layer is disposed on a surface of the smoothing layer opposite to a surface of the substrate. The smoothing layer is formed by heating and hardening a composition for forming a smoothing layer containing one of thermosetting compounds having a mass average molecular weight of 950 or less. From one of the outer surface of one layer form an arithmetic average roughness Ra 1 of 8nm or less and the layer formed from the outer surface of one of the maximum projection height Rp 1 to 50nm or less.

(2)如上述(1)所述之生坯片製造用離形膜,其 中前述第一表面之一算數平均粗糙度Ra2為10~200nm,且前述第一表面之一最大突起高度Rp2為80~1000nm。 (2) The release film for producing a green sheet according to the above (1), wherein the first surface has an arithmetic mean roughness Ra 2 of 10 to 200 nm, and one of the first surfaces has a maximum protrusion height Rp 2 It is 80~1000nm.

(3)如上述(1)或(2)所述之生坯片製造用離形 膜,其中前述平滑化層之一平均膜厚為0.2~10μm。 (3) A release sheet for producing a green sheet according to the above (1) or (2) The film, wherein one of the aforementioned smoothing layers has an average film thickness of 0.2 to 10 μm.

(4)如上述(1)至(3)之其中之一所述之生坯片 製造用離形膜,其中前述熱硬化性化合物為雙酚(bisphenol)型之環氧(epoxy)化合物。 (4) The green sheet according to any one of the above (1) to (3) A release film for manufacturing, wherein the thermosetting compound is a bisphenol type epoxy compound.

(5)如上述(1)至(4)之其中之一所述之生坯片 製造用離形膜,其中前述平滑化層具有相反於前述基材之一表面,前述平滑化層之相反於前述基材之前述表面之一算數平均粗糙度Ra4為8nm以下,且前述平滑化層之相反於前述基材之前述表面之一最大突起高度Rp4為50nm以下。 (5) The release film for producing a green sheet according to any one of the above (1), wherein the smoothing layer has a surface opposite to the surface of the substrate, and the smoothing layer is opposite to The arithmetic mean roughness Ra 4 of the surface of the substrate is 8 nm or less, and the maximum protrusion height Rp 4 of the smoothing layer opposite to the surface of the substrate is 50 nm or less.

(6)如上述(1)至(5)之其中之一所述之生坯片 製造用離形膜,其中前述第二表面之一算數平均粗糙度Ra3為10~200nm,且前述第二表面之一最大突起高度Rp3為80~1000nm。 (6) The release film for green sheet production according to any one of (1) to (5), wherein the second surface has an arithmetic mean roughness Ra 3 of 10 to 200 nm, and the second One of the surfaces has a maximum protrusion height Rp 3 of 80 to 1000 nm.

(7)如上述(1)至(6)之其中之一所述之生坯片 製造用離形膜之製造方法,包括一基材準備製程、一塗布層形成 製程、一平滑化層形成製程及一離形劑層形成製程。基材準備製程係製備前述基材,前述基材具有前述第一表面及前述第二表面。塗布層形成製程係藉由將含有前述質量平均分子量為950以下之前述熱硬化性化合物之前述平滑化層形成用組成物塗布於前述基材之前述第一表面位置而形成一塗布層。平滑化層形成製程係藉由加熱並硬化前述塗布層而形成前述平滑化層。離形劑層形成製程係於前述平滑化層之相反於前述基材之前述表面位置形成前述離形劑層。其中,前述離形劑層之前述外表面之前述算數平均粗糙度Ra1為8nm以下,且前述離形劑層之前述外表面之前述最大突起高度Rp1為50nm以下。 (7) The method for producing a release film for producing a green sheet according to any one of the above (1) to (6), comprising a substrate preparation process, a coating layer formation process, and a smoothing layer formation process And a release agent layer forming process. The substrate preparation process is to prepare the substrate, and the substrate has the first surface and the second surface. In the coating layer forming process, a coating layer is formed by applying the smoothing layer forming composition containing the thermosetting compound having a mass average molecular weight of 950 or less to the first surface position of the substrate. The smoothing layer forming process forms the smoothing layer by heating and hardening the coating layer. The release agent layer forming process is performed on the surface of the smoothing layer opposite to the surface of the substrate to form the release agent layer. The arithmetic mean roughness Ra 1 of the outer surface of the release agent layer is 8 nm or less, and the maximum protrusion height Rp 1 of the outer surface of the release agent layer is 50 nm or less.

藉由本發明,能夠提供生坯片製造用離形膜,其能 夠防止生坯片之表面發生針孔或部分過厚之不均等情形,而能夠製造高信賴度之生坯片。尤其,即使使用表面粗糙度較大的基材做為構成生坯片製造用離形膜的基材,亦能夠提供外表面平滑性優良之生坯片製造用離形膜。若使用如此之生坯片製造用離形膜,便能夠防止生坯片之表面發生針孔或部分過厚之不均等情形。如此之結果,於堆疊生坯片以製作電容器時,能防止因短路所導致之故障問題。再者,藉由本發明,能夠易於確實製造出生坯片製造用離形膜,其能夠製造表面平滑性優良之生坯片。 According to the present invention, it is possible to provide a release film for producing a green sheet, which can It is possible to prevent pinholes or partial thickness from being uneven on the surface of the green sheet, and it is possible to manufacture a green sheet of high reliability. In particular, even if a substrate having a large surface roughness is used as a substrate constituting a release film for producing a green sheet, it is possible to provide a release film for producing a green sheet having excellent outer surface smoothness. When such a release film for producing a green sheet is used, it is possible to prevent pinholes or partial thickness from being uneven on the surface of the green sheet. As a result, when the green sheets are stacked to form a capacitor, the problem of malfunction due to the short circuit can be prevented. According to the present invention, it is possible to easily produce a release film for producing a green sheet, which is capable of producing a green sheet having excellent surface smoothness.

1‧‧‧生坯片製造用離形膜 1‧‧‧Folding film for green sheet manufacturing

11‧‧‧基材 11‧‧‧Substrate

111‧‧‧基材之第一表面 111‧‧‧The first surface of the substrate

112‧‧‧基材之第二表面 112‧‧‧Second surface of the substrate

12‧‧‧平滑化層 12‧‧‧Smoothing layer

121‧‧‧表面(第三表面) 121‧‧‧ surface (third surface)

13‧‧‧離形劑層 13‧‧‧ release agent layer

131‧‧‧離形劑層之外表面 131‧‧‧Outer surface of the release agent layer

第1圖繪示本發明之生坯片製造用離形膜之側視剖面圖。 Fig. 1 is a side sectional view showing a release film for producing a green sheet of the present invention.

以下將參照優選實施型態而詳細說明本發明。 The invention will be described in detail below with reference to preferred embodiments.

以下將描述生坯片製造用離形膜。 The release film for green sheet production will be described below.

本發明之生坯片製造用離形膜係用來製造生坯片。而且,所製造出之生坯片係例如用於陶瓷電容器等物之製造。 The release film for producing a green sheet of the present invention is used to produce a green sheet. Moreover, the green sheets produced are used, for example, for the manufacture of ceramic capacitors and the like.

第1圖繪示本發明之生坯片製造用離形膜之側視剖面圖。而且,於以下說明中,第1圖之上側以「上」表示,下側以「下」表示。 Fig. 1 is a side sectional view showing a release film for producing a green sheet of the present invention. Further, in the following description, the upper side of the first drawing is indicated by "upper" and the lower side is indicated by "lower".

如第1圖所示,生坯片製造用離形膜1具有一基材11、一平滑化層12及一離形劑層13。基材11具有一第一表面111及一第二表面112。平滑化層12設置於基材11之第一表面111上。離形劑層13設置於平滑化層12之相反於基材11之一表面121(以下有時亦稱為「第三表面121」)之位置。換言之,如第1圖所示,生坯片製造用離形膜1為基材11、平滑化層12及離形劑層13以依序相互接合之方式堆疊而成的三層構造。 As shown in Fig. 1, the release film 1 for green sheet production has a substrate 11, a smoothing layer 12, and a release agent layer 13. The substrate 11 has a first surface 111 and a second surface 112. The smoothing layer 12 is disposed on the first surface 111 of the substrate 11. The release agent layer 13 is provided at a position opposite to the surface 121 of the smoothing layer 12 (hereinafter sometimes referred to as "the third surface 121"). In other words, as shown in Fig. 1, the release film 1 for producing a green sheet is a three-layer structure in which the base material 11, the smoothing layer 12, and the release agent layer 13 are stacked in this order.

再者,於本說明書中,使用生坯片製造用離形膜1製造生坯片的場合下,生坯片例如以於離形劑層13之外表面131上塗覆經溶解之陶瓷漿料之方式形成。 Further, in the present specification, in the case where a green sheet is produced using the release film 1 for green sheet production, the green sheet is coated with a dissolved ceramic slurry, for example, on the outer surface 131 of the release agent layer 13. The way is formed.

於本發明中,生坯片製造用離形膜1具有基材11、離形劑層13及位於二者之間的平滑化層12。而且,本發明之生坯片製造用離形膜1具有下述特徵,平滑化層12係藉由加熱並硬化含有質量平均分子量指定為950以下之一熱硬化性化合物之 一平滑化層形成用組成物而形成,離形劑層13之外表面131之一算數平均粗糙度Ra1為8nm以下,且離形劑層13之外表面131之一最大突起高度Rp1為50nm以下。 In the present invention, the release film 1 for producing a green sheet has a substrate 11, a release agent layer 13, and a smoothing layer 12 interposed therebetween. Further, the release film 1 for producing a green sheet of the present invention has the following feature, and the smoothing layer 12 is formed by heating and hardening a smoothing layer containing one of thermosetting compounds having a mass average molecular weight of 950 or less. The composition is formed such that the arithmetic average roughness Ra 1 of the outer surface 131 of the release agent layer 13 is 8 nm or less, and the maximum protrusion height Rp 1 of the outer surface 131 of the release agent layer 13 is 50 nm or less.

藉由如此之特徵,能夠提升離形劑層13之外表面131之平滑性,還能夠得到離形性優良之生坯片製造用離形膜1。若使用此生坯片製造用離形膜1製造生坯片,能夠防止生坯片之表面發生針孔或部分過厚之不均等情形,而能夠製造高信賴度之生坯片。如此之結果,於堆疊生坯片以製作電容器時,能防止因短路所導致之故障問題。 According to such a feature, the smoothness of the outer surface 131 of the release agent layer 13 can be improved, and the release film 1 for producing a green sheet excellent in release property can be obtained. When the green sheet is produced by using the release film 1 for green sheet production, it is possible to prevent pinholes or partial thickness from being uneven on the surface of the green sheet, and it is possible to manufacture a green sheet of high reliability. As a result, when the green sheets are stacked to form a capacitor, the problem of malfunction due to the short circuit can be prevented.

附帶一提,用以做為基材之膜體,能夠具有各種表面粗糙度。往往廉價的膜體之表面粗糙度具有比較粗糙的傾向。即使使用如此表面粗糙度比較粗糙的基材形成生坯片製造用離形膜的場合下,藉由於基材的表面設置具有前述特徵之平滑化層,亦能夠確實填入(消除)基材表面之凹凸狀態。如此之結果,平滑化層之相反於基材之表面能夠變得平滑。藉此,能夠防止基材表面之凹凸狀態影響形成於平滑化層之上之離形劑層之外表面,而能夠得到離形劑層之外表面平滑性優良之生坯片製造用離形膜。 Incidentally, the film body used as the substrate can have various surface roughnesses. The surface roughness of an inexpensive film body tends to be rough. Even when a release film having a rough surface roughness is used to form a release film for producing a green sheet, it is possible to surely fill (eliminate) the surface of the substrate by providing a smoothing layer having the above-described characteristics on the surface of the substrate. The bump state. As a result, the surface of the smoothing layer opposite to the substrate can be made smooth. Thereby, it is possible to prevent the uneven state of the surface of the substrate from affecting the outer surface of the release agent layer formed on the smoothing layer, and to obtain a release film for producing a green sheet excellent in surface smoothness other than the release agent layer. .

以下,將依序說明關於本實施型態之構成生坯片製造用離形膜之各層。 Hereinafter, each layer of the release film for forming a green sheet of the present embodiment will be described in order.

以下將說明基材11。 The substrate 11 will be explained below.

基材11係具有將剛性、可撓性等物理強度賦予生坯 片製造用離形膜1(以下有時亦僅稱為「離形膜1」)之功能。 The substrate 11 has a physical strength such as rigidity and flexibility imparted to the green body. The function of the release film 1 for sheet production (hereinafter sometimes referred to simply as "release film 1").

基材11如第1圖所示,具有第一表面111及第二表 面112。 The substrate 11 has a first surface 111 and a second surface as shown in FIG. Face 112.

構成基材11之材料並未特別受限,舉例而言,可為 如聚對苯二甲酸丁二酯(poly butylene terephthalate,PBT)樹脂、聚對苯二甲酸乙二酯(poly ethylene terephthalate,PET)樹脂及聚萘二甲酸乙二醇酯(poly ethylene naphthalate,PEN)樹脂等之聚酯(polyester)樹脂、如聚丙烯(polypropylene,PP)樹脂及聚甲基戊烯(polymethylpentene,PMP)樹脂等之聚烯烴(polyolefin)樹脂及聚碳酸酯(polycarbonate,PC)樹脂等之塑膠製之膜材。基材11能為單層膜材,亦能為同種或不同種之二層以上的多層膜材。其中特別以聚酯膜為佳,以聚對苯二甲酸乙二酯膜為較佳,更甚者以雙軸延伸之聚對苯二甲酸乙二酯膜為佳。尤其聚酯膜於加工時及使用時之過程中不易產生粉塵。為此,舉例而言,使用以聚酯樹脂所製造之離形膜1製造生坯片之場合中,能夠有效防止因粉塵所導致之陶瓷漿料塗覆不良。如此之結果,能夠製造較少針孔之生坯片。 The material constituting the substrate 11 is not particularly limited, and for example, Such as polybutylene terephthalate (PBT) resin, polyethylene terephthalate (PET) resin and polyethylene naphthalate (PEN) Polyester resin such as resin, polyolefin resin such as polypropylene (PP) resin and polymethylpentene (PMP) resin, and polycarbonate (PC) resin, etc. The plastic film. The substrate 11 can be a single layer film or a multilayer film of two or more layers of the same type or different types. Among them, a polyester film is preferred, a polyethylene terephthalate film is preferred, and a biaxially stretched polyethylene terephthalate film is preferred. In particular, the polyester film is less prone to dust during processing and during use. For this reason, for example, in the case of producing a green sheet using the release film 1 made of a polyester resin, it is possible to effectively prevent coating failure of the ceramic slurry due to dust. As a result, a green sheet having fewer pinholes can be produced.

此外,基材11除了前述材料以外,亦能含有填充物 等物。填充物能夠使用二氧化矽(silica)、二氧化鈦、碳酸鈣、高嶺土及氧化鋁等之其中一種或組合二種以上之材料。藉由包含如此之填充物,能同時將機械強度賦予基材11,提升基材11之表面及背面的平滑度,還能抑制結塊現象(blocking)。 In addition, the substrate 11 can contain a filler in addition to the aforementioned materials. Etc. The filler can be one or a combination of two or more of silica, titania, calcium carbonate, kaolin, and alumina. By including such a filler, mechanical strength can be simultaneously imparted to the substrate 11, and the smoothness of the surface and the back surface of the substrate 11 can be improved, and blocking can be suppressed.

另外,基材11之第一表面111之算數平均粗糙度 Ra2以10~200nm為佳,且其最大突起高度Rp2以80~1000nm為佳。 Further, the arithmetic mean roughness Ra 2 of the first surface 111 of the substrate 11 is preferably 10 to 200 nm, and the maximum protrusion height Rp 2 is preferably 80 to 1000 nm.

更甚者,第一表面111之算數平均粗糙度Ra2以15 ~100nm為較佳,第一表面111之算數平均粗糙度Ra2以20~50nm為更佳。再者,第一表面111之最大突起高度Rp2以90~800nm為較佳,第一表面111之最大突起高度Rp2以100~600nm為更佳。 Furthermore, the arithmetic mean roughness Ra 2 of the first surface 111 is preferably 15 to 100 nm, and the arithmetic mean roughness Ra 2 of the first surface 111 is preferably 20 to 50 nm. Further, the maximum protrusion height Rp 2 of the first surface 111 is preferably 90 to 800 nm, and the maximum protrusion height Rp 2 of the first surface 111 is preferably 100 to 600 nm.

若第一表面111之算數平均粗糙度Ra2及最大突起 高度Rp2落於前述範圍內,即使後述之平滑化層12之膜厚比較薄,亦能夠更適當地填入基材11之第一表面111之凹凸狀態,而能夠使平滑化層12之相反於基材11之表面121變得更加平滑。 如此之結果,能夠更適當地防止基材11之第一表面111之凹凸狀態影響到形成於平滑化層12上之離形劑層13之外表面131。 If the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface 111 fall within the above range, even if the film thickness of the smoothing layer 12 to be described later is relatively thin, the first substrate 11 can be more appropriately filled. The uneven state of the surface 111 makes it possible to make the surface 121 of the smoothing layer 12 opposite to the substrate 11 smoother. As a result, it is possible to more appropriately prevent the uneven state of the first surface 111 of the substrate 11 from affecting the outer surface 131 of the release agent layer 13 formed on the smoothing layer 12.

再者,第一表面111之算數平均粗糙度Ra2及其最 大突起高度Rp2落於前述範圍內之基材11係易於以較便宜的價格取得。 Further, the substrate 11 having the arithmetic mean roughness Ra 2 of the first surface 111 and its maximum protrusion height Rp 2 falling within the above range is easily obtained at a relatively low price.

此外,若第一表面111之算數平均粗糙度Ra2及最 大突起高度Rp2超過前述之上限值,根據平滑化層形成用組成物之構成材料,由於難以使其充分填進第一表面111之凹凸狀態中,而有必須使離形劑層13之膜厚變得較厚的情形發生。 In addition, when the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface 111 exceed the above upper limit, it is difficult to sufficiently fill the first surface 111 according to the constituent material of the composition for forming a smoothing layer. In the uneven state, it is necessary to make the film thickness of the release agent layer 13 thick.

而且,於本說明書中,基材11之第一表面111之算 數平均粗糙度Ra2及最大突起高度Rp2為依照日本工業標準(Japanese Industrial Standards,JIS)B0601-1994使用三豐(Mitutoyo)社製造之表面粗糙度測定機SV3000S4(觸針式)測定而求得之數值。此外,於本說明書中,除非另有規定,「算數平均粗糙度及最大突起高度」所指的是以前述方式測定而得到的數值。 Further, in the present specification, the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface 111 of the substrate 11 are Mitutoyo according to Japanese Industrial Standards (JIS) B0601-1994. The value obtained by measuring the manufactured surface roughness measuring machine SV3000S4 (stylus type). In addition, in the present specification, unless otherwise specified, "arithmetic average roughness and maximum protrusion height" refer to values obtained by the above-described methods.

另外,基材11之第二表面112之算數平均粗糙度 Ra3以10~200nm為佳,且其最大突起高度Rp3以80~1000nm為佳。更甚者,第二表面112之算數平均粗糙度Ra3以15~100nm為較佳,第二表面112之算數平均粗糙度Ra3以20~50nm為更佳。再者,第二表面112之最大突起高度Rp3以90~800nm為較佳,第二表面112之最大突起高度Rp3以100~600nm為更佳。 Further, the arithmetic mean roughness Ra 3 of the second surface 112 of the substrate 11 is preferably 10 to 200 nm, and the maximum protrusion height Rp 3 is preferably 80 to 1000 nm. Furthermore, the arithmetic mean roughness Ra 3 of the second surface 112 is preferably 15 to 100 nm, and the arithmetic average roughness Ra 3 of the second surface 112 is preferably 20 to 50 nm. Further, the maximum protrusion height Rp 3 of the second surface 112 is preferably 90 to 800 nm, and the maximum protrusion height Rp 3 of the second surface 112 is preferably 100 to 600 nm.

若第二表面112之算數平均粗糙度Ra3及最大突起 高度Rp3落於前述範圍內,能夠適當地防止將離形膜1捲繞成滾筒狀時發生捲曲滑移的情形。另外,還能夠防止將離形膜1捲繞成滾筒狀以茲存放時發生結塊現象。具體而言,離形膜1能根據需求而捲繞於紙製、塑膠製或金屬製等之核心材而呈滾筒狀以茲存放。此時,若第二表面112之算數平均粗糙度Ra3及最大突起高度Rp3落於前述範圍內,則能夠於離形膜1捲繞成滾筒狀時充分排除空氣,而有效抑制捲曲滑移的情形。因此,離形膜1捲繞成滾筒狀時,不必提高捲繞的張力,而能夠抑制因捲繞的張力所導致之卷芯部分的變形。再者,於捲筒狀之離形膜1中,若第二 表面112之算數平均粗糙度Ra3及最大突起高度Rp3落於前述範圍內,能夠更有效地防止因離形劑層13與基材11之第二表面112彼此黏合而發生的結塊現象。因此,能夠易於展開捲筒狀之離形膜1。 When the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 fall within the above range, it is possible to appropriately prevent the occurrence of curl slip when the release film 1 is wound into a roll shape. Further, it is also possible to prevent the occurrence of agglomeration when the release film 1 is wound into a roll shape to be stored. Specifically, the release film 1 can be wound around a core material such as paper, plastic, or metal, and stored in a roll shape as needed. At this time, if the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 fall within the above range, the air can be sufficiently removed when the release film 1 is wound into a roll shape, and the curl slip can be effectively suppressed. The situation. Therefore, when the release film 1 is wound into a roll shape, it is not necessary to increase the tension of the winding, and deformation of the core portion due to the tension of the winding can be suppressed. Further, in the roll-shaped release film 1, if the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 fall within the above range, the release agent layer 13 can be more effectively prevented. The agglomeration phenomenon occurs when the second surface 112 of the substrate 11 is bonded to each other. Therefore, the roll-shaped release film 1 can be easily unwound.

對此,若第二表面112之算數平均粗糙度Ra3及最 大突起高度Rp3未達前述之下限值,將離形膜1捲繞成滾筒狀時,離形膜1之表面及背面(基材11之第二表面112及離形劑層13之外表面131)恐易於發生結塊現象。 On the other hand, if the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface 112 do not reach the aforementioned lower limit value, when the release film 1 is wound into a roll shape, the surface and the back surface of the release film 1 ( The second surface 112 of the substrate 11 and the outer surface 131 of the release agent layer 13 may be prone to agglomeration.

另外,基材11之平均膜厚雖並未特別受限,但以 10~300μm為佳,以15~200μm為較佳。藉此,離形膜1能具有適度的可撓性,也同時具有特別優良的耐撕裂性及耐破斷性。 In addition, although the average film thickness of the substrate 11 is not particularly limited, 10~300μm is preferred, and 15~200μm is preferred. Thereby, the release film 1 can have moderate flexibility, and at the same time has particularly excellent tear resistance and breakage resistance.

以下將說明平滑化層12。 The smoothing layer 12 will be explained below.

平滑化層12係相反於離形劑層13之外表面131, 且具有減緩基材11之第一表面111之凹凸狀態影響的功能。 The smoothing layer 12 is opposite to the outer surface 131 of the release agent layer 13, And has a function of slowing down the influence of the uneven state of the first surface 111 of the substrate 11.

如第1圖所示,平滑化層12係設置於基材11之第 一表面111上。 As shown in FIG. 1, the smoothing layer 12 is provided on the substrate 11 On a surface 111.

平滑化層12係由含有指定的熱硬化性化合物之平 滑化層形成用組成物所構成。而且,平滑化層12係藉由加熱並硬化平滑化層形成用組成物而形成。 The smoothing layer 12 is made of a flat containing a specified thermosetting compound The composition for forming a sliding layer is composed of a composition. Further, the smoothing layer 12 is formed by heating and hardening the composition for forming a smoothing layer.

如此之平滑化層形成用組成物係如同前述,含有質 量平均分子量為950以下之熱硬化性化合物,尤其是含有質量平均分子量為300~700之熱硬化性化合物為佳。藉此,塗布於基 材11之第一表面111並加熱前之平滑化層形成用組成物能夠具有適度的黏度,而使平滑化層形成用組成物具有適度的流動性。藉由使用如此之平滑化層形成用組成物,於基材11之第一表面111之位置形成平滑化層12,而能夠適當地填入基材11之第一表面111之凹凸狀態。如此之結果,能夠防止基材11之凹凸狀態對於平滑化層12之第三表面121產生影響,而能夠使平滑化層12之第三表面121變得平滑。因此,能夠防止基材11之凹凸狀態對形成於平滑化層12上之離形劑層13之外表面131產生影響,而能夠使離形劑層13之外表面131變得平滑。 Such a composition for forming a smoothing layer is as described above, and contains a substance The thermosetting compound having a volume average molecular weight of 950 or less is particularly preferably a thermosetting compound having a mass average molecular weight of 300 to 700. Thereby applying to the base The composition for forming a smoothing layer before the first surface 111 of the material 11 and before heating can have a moderate viscosity, and the composition for forming a smoothing layer has moderate fluidity. By using such a composition for forming a smoothing layer, the smoothing layer 12 is formed at the position of the first surface 111 of the substrate 11, and the uneven state of the first surface 111 of the substrate 11 can be appropriately filled. As a result, it is possible to prevent the uneven state of the substrate 11 from affecting the third surface 121 of the smoothing layer 12, and to smooth the third surface 121 of the smoothing layer 12. Therefore, it is possible to prevent the uneven state of the substrate 11 from affecting the outer surface 131 of the release agent layer 13 formed on the smoothing layer 12, and to smooth the outer surface 131 of the release agent layer 13.

尤其是即使在基材11之第一表面111之表面凹凸狀 態較大時,因能夠藉由前述平滑化層形成用組成物之作用及效果以適當地填入第一表面111之凹凸狀態,而亦能夠得到離形劑層13之外表面131之平滑性優良的離形膜1。 In particular, even if the surface of the first surface 111 of the substrate 11 is uneven When the state is large, the smoothness of the outer surface 131 of the release agent layer 13 can be obtained by appropriately filling the uneven state of the first surface 111 by the action and effect of the composition for forming a smoothing layer. Excellent release film 1.

對此,若熱硬化性化合物之質量平均分子量超過前 述之上限值,平滑化層形成用組成物之流動性較低,平滑化層12恐會沿著基材11之第一表面111之凹凸狀態而形成。如此之結果,可能會使平滑化層12之第三表面121具有隨同基材11之第一表面之凹凸狀態的形狀。 In this case, if the mass average molecular weight of the thermosetting compound exceeds The upper limit is described, and the fluidity of the composition for forming a smoothing layer is low, and the smoothing layer 12 may be formed along the uneven state of the first surface 111 of the substrate 11. As a result, the third surface 121 of the smoothing layer 12 may have a shape accompanying the uneven state of the first surface of the substrate 11.

再者,舉例而言,質量平均分子量落於前述範圍內 之熱硬化性化合物除了可為雙酚A(bisphenol A,BPA)型環氧化合物、雙酚A型環氧酯(epoxy ester)化合物、雙酚F(bisphenol F,BPF)型環氧化合物及雙酚F型環氧酯化合物等之雙酚型環氧 化合物、三聚氰胺(melamine)化合物及尿素化合物等之胺基(amino)化合物以外,還可為異氰酸酯(isocyanate)化合物、噁唑啉(oxazoline)化合物、胺基甲酸酯(urethane)化合物、丙烯醯(acryl)化合物、苯酚(phenol)化合物、醇酸(alkyd)化合物及聚酯化合物等材料。其中特別以雙酚型環氧化合物為佳,且以雙酚A型環氧酯化合物為較佳。藉此,除了能夠更易於確實填進基材11之第一表面111之表面凹凸狀態,還能夠在即使平滑化層12之膜厚較薄的情況下仍具有特別優良的硬化性。 Furthermore, for example, the mass average molecular weight falls within the aforementioned range The thermosetting compound may be a bisphenol A (BPA) type epoxy compound, a bisphenol A type epoxy ester compound, a bisphenol F (BPF) type epoxy compound, and a double Bisphenol type epoxy such as phenol F type epoxy ester compound In addition to an amino compound such as a compound, a melamine compound or a urea compound, it may be an isocyanate compound, an oxazoline compound, a urethane compound, or an acrylonitrile ( Materials such as acryl) compounds, phenol compounds, alkyd compounds, and polyester compounds. Among them, a bisphenol type epoxy compound is particularly preferred, and a bisphenol A type epoxy ester compound is preferred. Thereby, in addition to being able to more reliably fill the surface unevenness state of the first surface 111 of the substrate 11, it is possible to have particularly excellent hardenability even when the film thickness of the smoothing layer 12 is thin.

另外,平滑化層形成用組成物雖然包含質量平均分 子量落於前述範圍內之熱硬化性化合物,但亦能根據需求而包含溶劑。藉此,能夠易於調整塗布於基材11之第一表面111時之平滑化層形成用組成物之黏度。 In addition, although the composition for forming a smoothing layer contains a mass average score The thermosetting compound having a sub-quantity within the above range may contain a solvent as needed. Thereby, the viscosity of the composition for forming a smoothing layer applied to the first surface 111 of the substrate 11 can be easily adjusted.

舉例而言,溶劑能夠使用甲苯(toluene)及二甲苯 (xylene)等之芳香族烴(aromatic hydrocarbons)、乙酸乙酯(ethyl acetate)及乙酸正丁酯(butyl acetate)等之脂肪酸酯(fatty acid esters)、甲基乙基酮(methyl ethyl ketone,MEK)及甲基異丁基酮(methyl isobutyl ketone,MIBK)等之酮(ketone)類、己烷(hexane)、庚烷(heptane)等之脂肪族烴(aliphatic hydrocarbons)等之有機溶劑之其中一種或組合二種以上者。藉此,塗布於基材11之第一表面111並加熱前之平滑化層形成用組成物易於具有適度的黏度。 For example, the solvent can use toluene and xylene Fatty acid esters such as aromatic hydrocarbons, ethyl acetate and butyl acetate, and methyl ethyl ketone (xylene). MEK) and an organic solvent such as a ketone such as methyl isobutyl ketone (MIBK), an aliphatic hydrocarbon such as hexane or heptane, or the like. One or a combination of two or more. Thereby, the smoothing layer forming composition applied to the first surface 111 of the substrate 11 and heated can easily have an appropriate viscosity.

而且,平滑化層形成用組成物除了前述成分以外, 亦能含有其他成分。其他成分可為催化劑、染料、分散劑、抗靜電劑、硬化劑等。此外,於含有前述其他成分的場合下,於平滑化層形成用組成物之中(以固體含量計算),前述其他成分的含量以0.1~10之質量百分比為佳。 Further, the composition for forming a smoothing layer is in addition to the aforementioned components, It can also contain other ingredients. Other ingredients may be catalysts, dyes, dispersants, antistatic agents, hardeners, and the like. Further, in the case where the other components are contained, the content of the other components is preferably 0.1 to 10% by mass in the composition for forming a smoothing layer (calculated as a solid content).

另外,於含有溶劑之平滑化層形成用組成物之中, 熱硬化性化合物之含量雖並未特別受限,但以0.5~60之質量百分比為佳,以1~45之質量百分比為較佳。藉此,平滑化層形成用組成物易於具有適當的黏度。 Further, among the compositions for forming a smoothing layer containing a solvent, The content of the thermosetting compound is not particularly limited, but is preferably from 0.5 to 60% by mass, preferably from 1 to 45% by mass. Thereby, the composition for forming a smoothing layer tends to have an appropriate viscosity.

再者,於平滑化層形成用組成物之中(以固體含量 計算),熱硬化性化合物之含量雖並未特別受限,但以90以上之質量百分比為佳,以95以上之質量百分比為較佳。藉此,平滑化層形成用組成物能具有特別優良的硬化性。 Furthermore, among the compositions for forming a smoothing layer (in terms of solid content) The content of the thermosetting compound is not particularly limited, but is preferably 90% by mass or more, and more preferably 95% by mass or more. Thereby, the composition for forming a smoothing layer can have particularly excellent hardenability.

另外,平滑化層12之第三表面121之算數平均粗糙 度Ra4以8nm以下為佳,且其最大突起高度Rp4以50nm以下為佳。更甚者,第三表面121之算數平均粗糙度Ra4以6nm以下為佳。而且,第三表面121之最大突起高度Rp4以40nm以下為佳。 Further, the arithmetic mean roughness Ra 4 of the third surface 121 of the smoothing layer 12 is preferably 8 nm or less, and the maximum protrusion height Rp 4 is preferably 50 nm or less. Furthermore, the arithmetic mean roughness Ra 4 of the third surface 121 is preferably 6 nm or less. Further, the maximum protrusion height Rp 4 of the third surface 121 is preferably 40 nm or less.

若第三表面121之算數平均粗糙度Ra4及最大突起 高度Rp4落於前述範圍內,能夠更適當地防止基材11之表面凹凸狀態影響到離形劑層13之外表面131。 When the arithmetic mean roughness Ra 4 and the maximum protrusion height Rp 4 of the third surface 121 fall within the above range, it is possible to more suitably prevent the surface unevenness state of the substrate 11 from affecting the outer surface 131 of the release agent layer 13.

對此,若第三表面121之算數平均粗糙度Ra4超過 前述之上限值,離形劑層13與平滑化層12之間發生必須要進一步設置新的平滑化層的情況。 On the other hand, when the arithmetic mean roughness Ra 4 of the third surface 121 exceeds the above upper limit value, a new smoothing layer needs to be further provided between the release agent layer 13 and the smoothing layer 12.

此外,若第三表面121之最大突起高度Rp4超過前 述之上限值,離形劑層13與平滑化層12之間發生必須要進一步設置新的平滑化層的情況。 Further, if the maximum protrusion height Rp 4 of the third surface 121 exceeds the above upper limit value, a situation in which a new smoothing layer needs to be further provided between the release agent layer 13 and the smoothing layer 12 occurs.

另外,平滑化層12之平均膜厚雖並未特別受限,但 以0.2~10μm為佳,以0.3~5μm為較佳。藉此,能夠更確實地填入基材11之第一表面111之凹凸狀態,也能夠更加提高離形膜1之外表面之平滑性。而且,使平滑化層12能夠具有適度的可撓性。 In addition, although the average film thickness of the smoothing layer 12 is not particularly limited, It is preferably 0.2 to 10 μm, and preferably 0.3 to 5 μm. Thereby, the unevenness of the first surface 111 of the substrate 11 can be more reliably filled, and the smoothness of the outer surface of the release film 1 can be further improved. Moreover, the smoothing layer 12 can be made to have moderate flexibility.

對此,若平滑化層12之平均膜厚未達前述之下限 值,根據構成平滑化層形成用組成物之成分,為了使其能充分填入基材11之第一表面111之凹凸狀態,會發生必須使用第一表面111之表面粗糙度為較小之基材11的情形。另外,若平滑化層12之平均膜厚超過前述之上限值,根據構成平滑化層形成用組成物之成分,係易於因平滑化層12硬化收縮而於離形膜1發生翹曲,而降低離形膜1之操作性。 In this regard, if the average film thickness of the smoothing layer 12 does not reach the aforementioned lower limit The value of the component constituting the smoothing layer forming composition is such that the surface roughness of the first surface 111 must be small in order to sufficiently fill the uneven state of the first surface 111 of the substrate 11. The situation of the material 11. In addition, when the average thickness of the smoothing layer 12 exceeds the above-described upper limit, it is easy to cause warpage of the release film 1 due to curing and shrinkage of the smoothing layer 12 depending on the composition of the composition for forming the smoothing layer. The operability of the release film 1 is lowered.

以下將說明離形劑層13。 The release agent layer 13 will be described below.

離形劑層13具有將離形性賦予離形膜1之功能。 The release agent layer 13 has a function of imparting a release property to the release film 1.

離形劑層13如第1圖所示,設置於平滑化層12之 第三表面121。 The release agent layer 13 is disposed on the smoothing layer 12 as shown in FIG. The third surface 121.

離形劑層13係藉由乾燥並硬化塗布於平滑化層12 之第三表面121之離形劑層形成用組成物而形成。 The release agent layer 13 is applied to the smoothing layer 12 by drying and hardening. The composition for forming a release agent layer on the third surface 121 is formed.

如此之離形劑層形成用組成物包含離形劑。 Such a composition for forming a release agent layer contains a release agent.

離形劑能夠使用醇酸系化合物、丙烯醯系化合物、 矽酮(silicone)系化合物、含長鏈烷基(long-chain alkyl group)之化合物、氟化物等之其中一種或組合二種以上之離形劑。其中以使用醇酸系化合物、丙烯醯系化合物、矽酮系化合物、含長鏈烷基之化合物為佳。藉此,在具有適度硬化性的同時,還能夠得到對於生坯片而言有特別優良之離形性的離形劑層13。 The release agent can use an alkyd compound, an acrylonitrile compound, One or a combination of two or more of a silicone compound, a long-chain alkyl group-containing compound, a fluoride, and the like. Among them, an alkyd compound, a propylene oxime compound, an fluorenone compound, or a compound containing a long-chain alkyl group is preferably used. Thereby, it is possible to obtain the release agent layer 13 which is particularly excellent in the release property from the green sheet while having moderate hardenability.

具體舉例而言,醇酸系化合物能夠使用長鏈烷變性 醇酸化合物、矽酮變性醇酸化合物等之變性物。另外,於使用醇酸系化合物的場合下,離形劑層形成用組成物中,亦能夠另添加交聯劑及催化劑。藉由對如此之離形劑層形成用組成物加熱硬化之方法,而能夠得到具有含交聯結構之醇酸系化合物的離形劑層13。 Specific examples, alkyd compounds can be denatured using long-chain alkane A denatured product of an alkyd compound, an anthrone denaturing alkyd compound, or the like. Further, when an alkyd compound is used, a crosslinking agent and a catalyst may be additionally added to the composition for forming a release agent layer. The release agent layer 13 having an alkyd compound having a crosslinked structure can be obtained by a method of heat-hardening the composition for forming a release agent layer.

再者,具體舉例而言,丙烯醯系化合物能夠使用長 鏈烷變性丙烯醯化合物、矽酮變性丙烯醯化合物等之變性物。另外,於離形劑層形成用組成物中含有丙烯醯系化合物的場合下,亦能夠於離形劑層形成用組成物中另添加交聯劑及催化劑。藉由對如此之離形劑層形成用組成物加熱硬化之方法,而能夠得到具有含交聯結構之丙烯醯系化合物的離形劑層13。 Furthermore, for example, the propylene oxime compound can be used long A denatured product of an alkane-denatured acryl oxime compound, an fluorenone-modified acryl oxime compound or the like. Further, when the acrylonitrile-based compound is contained in the composition for forming a release agent layer, a crosslinking agent and a catalyst can be additionally added to the composition for forming a release agent layer. The release agent layer 13 having a propylene-based compound having a crosslinked structure can be obtained by a method of heat-hardening the composition for forming a release agent layer.

再者,具體舉例而言,矽酮系化合物係能夠使用含 有以聚二甲基矽氧烷(dimethylpolysiloxane)做為基本骨架之矽酮系化合物。矽酮系化合物有加成反應型、縮合反應型、紫外線硬化型、電子束硬化型等類型。加成反應型之矽酮系化合物因反 應性高而能優化生產性。與縮合反應型之矽酮系化合物相比,加成反應型之矽酮系化合物因具有於製造後的離形力變化較小及無硬化收縮情形等優點,而有利使用於構成離形劑層13之離形劑。 Furthermore, as an example, an anthrone-based compound can be used. There is an anthrone-based compound having dimethylpolysiloxane as a basic skeleton. The anthrone-based compound has an addition reaction type, a condensation reaction type, an ultraviolet curing type, and an electron beam curing type. Addition reaction type anthrone compound It is highly adaptable and can optimize productivity. Compared with the oxime ketone compound of the condensation reaction type, the oxime ketone compound of the addition reaction type is advantageously used for constituting the release agent layer because it has a small change in the release force after production and no hardening and shrinkage. 13 release agent.

具體舉例而言,上述加成反應型之矽酮系化合物能 夠為一種有機聚矽氧烷(organopolysiloxane),係於此化合物之分子末端及/或側鏈處接有如乙烯基(vinyl)、烯丙基(allyl)、丙烯基(propenyl)、己烯基(hexenyl)等之碳原子數為2~10個之烯基(alkenyl)中之二個以上烯基。使用如此之加成反應型之矽酮系化合物時,亦能夠合併使用交聯劑及催化劑。 Specifically, the above-mentioned addition reaction type anthrone compound can It is an organopolysiloxane which is attached to the molecular terminal and/or side chain of the compound such as vinyl, allyl, propenyl, hexenyl ( Hexenyl) or the like has two or more alkenyl groups of 2 to 10 alkenyl groups. When such an oxime ketone compound of the addition reaction type is used, a crosslinking agent and a catalyst can also be used in combination.

上述之交聯劑例如為具有於一分子中與至少二個矽 原子結合之氫原子之有機聚矽氧烷,具體而言,例如為二甲基氫矽烷氧基(dimethyl hydrogen siloxy)封端之二甲基矽氧烷(dimethyl siloxane)一甲基氫矽氧烷(methyl hydrogen siloxane)共聚物、三甲基矽烷氧基(trimethyl siloxy)封端之二甲基矽氧烷一甲基氫矽氧烷共聚物、三甲基矽烷氧基(trimethyl siloxy)封端之甲基氫聚矽氧烷(methyl hydrogen polysiloxane)、聚(氫倍半矽氧烷)(poly(hydrogen silsesquioxane))等物質。 The above crosslinking agent is, for example, having one molecule and at least two hydrazines An organic polyoxane of an atom-bonded hydrogen atom, specifically, for example, dimethyl hydrogen siloxy-terminated dimethyl siloxane monomethylhydroquinoxane (methyl hydrogen siloxane) copolymer, trimethyl siloxy-terminated dimethyl methoxy oxy-monomethyl hydride copolymer, trimethyl siloxy-terminated Methylhydrogen polysiloxane, poly(hydrogen silsesquioxane), etc.

另外,上述催化劑可為微粒狀白金、吸附於碳粉載 體之微粒狀白金、氯鉑酸、醇變性氯鉑酸、氯鉑酸之烯烴(olefin)配合物(complex)、鈀(palladium)、銠(rhodium)等之白金系化合物。藉由使用如此之催化劑,能夠更有效率地進行離形劑層 形成用組成物之硬化反應。 In addition, the above catalyst may be particulate platinum and adsorbed on carbon powder. A platinum-based compound such as particulate fine platinum, chloroplatinic acid, alcohol-modified chloroplatinic acid, olefinic complex of chloroplatinic acid, palladium, rhodium or the like. By using such a catalyst, the release agent layer can be more efficiently carried out A hardening reaction for forming a composition.

再者,含長鏈烷基之化合物係例如使用於聚乙烯醇 (polyvinyl alcohol)系聚合物中反應碳原子數為8~30個之長鏈烷基異氰酸酯(alkyl isocyanate)而得到之聚乙烯氨基甲酸酯(polyvinyl carbamate)及於聚乙烯亞胺(polyethyleneimine)中反應碳原子數為8~30個之長鏈烷基異氰酸酯而得到之烷基脲(urea)衍生物。 Further, the compound containing a long-chain alkyl group is used, for example, for polyvinyl alcohol. (polyvinyl alcohol) is a polyvinyl carbamate obtained by reacting a long-chain alkyl isocyanate having 8 to 30 carbon atoms in a polymer, and in a polyethyleneimine. An alkylurea derivative obtained by reacting a long-chain alkyl isocyanate having 8 to 30 carbon atoms.

另外,具體舉例而言,氟化物能夠使用氟矽酮 (fluorine silicone)化合物、氟硼(boron)化合物等化合物。 In addition, for example, fluoride can be used with fluorenone (fluorine silicone) compound, a compound such as a boron compound.

再者,離形劑層形成用組成物中,除了前述之離形 劑以外,亦能包含分散劑及溶劑。藉由含有分散劑及溶劑中之至少一者,能夠使塗布於平滑化層12之第三表面121並乾燥前之離形劑層形成用組成物具有適度的黏度。 Further, in the composition for forming a release agent layer, in addition to the aforementioned release form In addition to the agent, a dispersing agent and a solvent can also be contained. By containing at least one of a dispersing agent and a solvent, the composition for forming a release agent layer applied to the third surface 121 of the smoothing layer 12 and dried can have an appropriate viscosity.

舉例而言,分散劑或溶劑能夠使用甲苯等之芳香族 烴、乙酸乙酯等之脂肪酸酯、甲基乙基酮等之酮類、己烷、庚烷等之脂肪族烴等之有機溶劑之其中一種或組合二種以上者。 For example, the dispersant or solvent can use aromatics such as toluene One or a combination of two or more of a fatty acid ester such as a hydrocarbon or ethyl acetate, a ketone such as methyl ethyl ketone, or an organic solvent such as an aliphatic hydrocarbon such as hexane or heptane.

而且,離形劑層形成用組成物除了前述成分以外, 亦能含有其他成分。其他成分可例如為催化劑、染料、分散劑、抗靜電劑、硬化劑等。此外,於含有前述其他成分的場合下,於離形劑層形成用組成物之中,前述其他成分的含量以0.1~10之質量百分比為佳。 Further, the composition for forming a release agent layer is in addition to the aforementioned components, It can also contain other ingredients. Other ingredients may be, for example, catalysts, dyes, dispersants, antistatic agents, hardeners, and the like. Further, in the case where the other components are contained, the content of the other components in the composition for forming a release agent layer is preferably 0.1 to 10% by mass.

再者,如同前述,離形劑層13之外表面131之算數 平均粗糙度Ra1為8nm以下,且其最大突起高度Rp1為50nm以下。更甚者,離形劑層13之外表面131之算數平均粗糙度Ra1以6nm以下為佳。而且,離形劑層13之外表面131之最大突起高度Rp1以40nm以下為佳。 Further, as described above, the arithmetic mean roughness Ra 1 of the outer surface 131 of the release agent layer 13 is 8 nm or less, and the maximum protrusion height Rp 1 is 50 nm or less. Furthermore, the arithmetic average roughness Ra 1 of the outer surface 131 of the release agent layer 13 is preferably 6 nm or less. Further, the maximum protrusion height Rp 1 of the outer surface 131 of the release agent layer 13 is preferably 40 nm or less.

離形劑層13之外表面131之算數平均粗糙度Ra1及 最大突起高度Rp1落於前述範圍內,於形成生坯片時,藉由外表面131之較平滑表面形狀轉印至生坯片,而能夠更適當地防止生坯片之表面產生針孔等情形。如此之結果,能夠得到表面更為平滑之生坯片。 The arithmetic mean roughness Ra 1 and the maximum protrusion height Rp 1 of the outer surface 131 of the release agent layer 13 fall within the foregoing range, and are transferred to the green body by the smooth surface shape of the outer surface 131 when the green sheet is formed. The sheet can more appropriately prevent the occurrence of pinholes or the like on the surface of the green sheet. As a result, a green sheet having a smoother surface can be obtained.

另外,離形劑層13之平均膜厚以0.01~3μm為佳, 以0.03~1μm為較佳。若離形劑層13之厚度未達0.01μm,根據構成離形劑層13之材料,也會有使其無法充分發揮做為離形劑層之功能的情況。另一方面,若離形劑層13之厚度超過3μm,將離形膜1捲繞成滾筒狀時,因容易發生結塊現象,而可能產生離形膜1捲繞不良的情形,也可能會於離形膜1捲出時發生高靜電性等問題。 In addition, the average film thickness of the release agent layer 13 is preferably 0.01 to 3 μm. It is preferably 0.03 to 1 μm. If the thickness of the release agent layer 13 is less than 0.01 μm, depending on the material constituting the release agent layer 13, there is a case where the function as a release agent layer cannot be sufficiently exhibited. On the other hand, when the thickness of the release agent layer 13 exceeds 3 μm, when the release film 1 is wound into a roll shape, agglomeration may occur easily, and the release film 1 may be wound poorly, or may be caused. When the release film 1 is unwound, problems such as high static electricity occur.

以下將說明生坯片製造用離形膜之製造方法。 Hereinafter, a method of producing a release film for producing a green sheet will be described.

接下來,將說明關於如同前述之生坯片製造用離形膜1之製造方法之適當的實施型態。 Next, a description will be given of a suitable embodiment regarding the manufacturing method of the release film 1 for producing a green sheet as described above.

本實施型態之離形膜1之製造方法包括一基材準備製程、一塗布層形成製程、一平滑化層形成製程及一離形劑層形成製程。基材準備製程係製備基材11。塗布層形成製程係將含有 指定之熱硬化性化合物之平滑化層形成用組成物塗布於基材11之第一表面111再加以乾燥而形成一塗布層。平滑化層形成製程係藉由加熱並硬化塗布層而形成平滑化層12。離形劑層形成製程係於平滑化層12之相反於前述基材11之表面121位置形成離形劑層13。 The manufacturing method of the release film 1 of the present embodiment includes a substrate preparation process, a coating layer forming process, a smoothing layer forming process, and a release agent layer forming process. The substrate preparation process prepares the substrate 11. Coating layer forming process system will contain The smoothing layer forming composition of the specified thermosetting compound is applied onto the first surface 111 of the substrate 11 and dried to form a coating layer. The smoothing layer forming process forms the smoothing layer 12 by heating and hardening the coating layer. The release agent layer forming process is performed at a position opposite to the surface 121 of the aforementioned substrate 11 of the smoothing layer 12 to form a release agent layer 13.

以下,將詳細說明各個製程。 Hereinafter, each process will be described in detail.

以下將說明基材準備製程。 The substrate preparation process will be described below.

首先,製備基材11。 First, the substrate 11 is prepared.

基材11能夠使用如同前述所構成之基材11。 The substrate 11 can use the substrate 11 as described above.

接著,能夠於基材11之第一表面111進行氧化法等 之表面處理或施加底漆(primer)處理。藉此,能夠特別優化基材11與設置於基材11之第一表面111之位置之平滑化層12間之黏著性。 Next, an oxidation method or the like can be performed on the first surface 111 of the substrate 11. The surface treatment or application of a primer treatment. Thereby, the adhesion between the substrate 11 and the smoothing layer 12 provided at the position of the first surface 111 of the substrate 11 can be particularly optimized.

氧化法等之表面處理能夠根據基材11之種類而適 當地選擇。舉例而言,可為電暈(corona)放電處理、電漿(plasma)放電處理、鉻(chrome)氧化處理(濕式)、火焰處理、熱風處理、臭氧(ozone)處理、紫外線照射處理等。其中從優化與平滑化層12間之黏著性及簡化處理之操作之觀點來看,特別以使用電暈放電處理為較佳。 The surface treatment such as the oxidation method can be adapted to the type of the substrate 11 Local selection. For example, it may be a corona discharge treatment, a plasma discharge treatment, a chrome oxidation treatment (wet), a flame treatment, a hot air treatment, an ozone treatment, an ultraviolet irradiation treatment, or the like. Among them, from the viewpoint of optimizing the adhesion between the smoothing layer 12 and the operation of simplifying the processing, it is preferable to use a corona discharge treatment in particular.

以下將說明塗布層形成製程。 The coating layer forming process will be described below.

於本製程中,首先製備平滑化層形成用組成物。 In the present process, a composition for forming a smoothing layer is first prepared.

平滑化層形成用組成物能夠單獨使用如同前述之熱 硬化性化合物。除此之外,亦能夠根據需求而使用混合了如同前述之溶劑或其他成分之平滑化層形成用組成物。 The composition for forming a smoothing layer can be used alone as the heat mentioned above A hardening compound. In addition to this, it is also possible to use a composition for forming a smoothing layer in which a solvent or other component as described above is mixed as needed.

接著,於基材11之第一表面111上塗布成為液狀之 平滑化層形成用組成物。藉此,得到塗布層。如同前述,由於平滑化層形成用組成物具有適度的流動性,能藉由將平滑化層形成用組成物塗布於基材11之第一表面111上並乾燥而使其確實填入基材11之第一表面111之凹凸狀態,而得到外表面平滑的塗布層。 Then, it is applied to the first surface 111 of the substrate 11 to be liquid. A composition for forming a smoothing layer. Thereby, a coating layer was obtained. As described above, since the smoothing layer forming composition has moderate fluidity, it can be applied to the substrate 11 by applying the smoothing layer forming composition onto the first surface 111 of the substrate 11 and drying it. The uneven state of the first surface 111 is obtained to obtain a coating layer having a smooth outer surface.

塗布平滑化層形成用組成物之方法,例如為凹版塗 層(gravure coat)法、棒塗(bar coat)法、噴塗(spray coat)法、旋塗(spin coat)法、氣刀塗(air knife coat)法、輥塗(roll coat)法、刮刀(blade coat)法、閘輥塗(gate roll coat)法、模塗(die coat)法。其中特別以凹版塗層法及棒塗法為較佳,以棒塗法為更佳。藉此,能夠易於形成目標厚度的塗布層。 a method of coating a composition for forming a smoothing layer, for example, gravure coating Gravure coat method, bar coat method, spray coat method, spin coat method, air knife coat method, roll coat method, doctor blade ( A blade coat method, a gate roll coat method, and a die coat method. Among them, a gravure coating method and a bar coating method are preferable, and a bar coating method is more preferable. Thereby, the coating layer of the target thickness can be easily formed.

以下將說明平滑化層形成製程。 The smoothing layer forming process will be described below.

接著,藉由加熱並硬化由塗布層形成製程得到之塗 布層而形成平滑化層12。 Next, by heating and hardening the coating obtained by the coating layer forming process The smoothing layer 12 is formed by a cloth layer.

於本製程中,係以保持外表面平滑性之方式硬化利 用前述塗布層形成製程而確實填入基材11之第一表面111之凹凸狀態之塗布層。如此之結果,能夠得到第三表面121十分平滑的平滑化層12。藉此,能夠更適當地防止基材11之第一表面111之凹凸狀態影響至離形劑層13之外表面131。因此,於後述之離形劑層形成製程中,能夠優化離形劑層13之外表面131之平滑 性。 In this process, it is hardened to maintain the smoothness of the outer surface. The coating layer forming process is used to surely fill the coating layer in the uneven state of the first surface 111 of the substrate 11. As a result, the smoothing layer 12 in which the third surface 121 is very smooth can be obtained. Thereby, it is possible to more appropriately prevent the uneven state of the first surface 111 of the substrate 11 from affecting the outer surface 131 of the release agent layer 13. Therefore, smoothing of the outer surface 131 of the release agent layer 13 can be optimized in the process of forming the release agent layer described later. Sex.

加熱方法雖並未特別受限,但可例如為以熱風乾燥 爐加熱之方法等加熱方法。 Although the heating method is not particularly limited, it can be, for example, dried by hot air. Heating method such as furnace heating method.

再者,加熱條件並未特別受限。加熱溫度以攝氏80 ~150度為佳,加熱時間以持續5秒~1分鐘為佳。藉此,能夠防止平滑化層12非本意地變質,同時亦能夠特別有效率地形成平滑化層12。如此之結果,能夠提升最終所得到之離形膜1之生產性。另外,若加熱溫度落於前述範圍內,於平滑化層形成用組成物含有溶劑之場合下,隨著溶劑於加熱時蒸發,而能夠特別防止平滑化層12發生翹曲及裂紋。 Furthermore, the heating conditions are not particularly limited. Heating temperature in Celsius 80 It is preferably ~150 degrees, and the heating time is preferably from 5 seconds to 1 minute. Thereby, it is possible to prevent the smoothing layer 12 from being unintentionally deteriorated, and at the same time, the smoothing layer 12 can be formed particularly efficiently. As a result, the productivity of the finally obtained release film 1 can be improved. In addition, when the heating temperature is within the above range, when the composition for forming a smoothing layer contains a solvent, warping and cracking of the smoothing layer 12 can be particularly prevented as the solvent evaporates during heating.

以下將說明離形劑層形成製程。 The release agent layer forming process will be described below.

接下來,於平滑化層12之相反於基材11之表面121 位置形成離形劑層13。 Next, on the surface 121 of the smoothing layer 12 opposite to the substrate 11 The release agent layer 13 is formed at the position.

準備混合了如同前述之材料做為構成離形劑層13 之離形劑層形成用組成物。 It is prepared to mix as the aforementioned material as the detaching agent layer 13 The composition for forming a release agent layer.

接著,於平滑化層12之相反於基材11之表面121 上塗布液狀之離形劑層形成用組成物之後,對其乾燥並硬化,以得到離形劑層13。 Next, on the surface 121 of the smoothing layer 12 opposite to the substrate 11 After the liquid composition for forming a release agent layer is applied, it is dried and hardened to obtain a release agent layer 13.

乾燥方法雖並未特別受限,但可例如為使用熱風乾 燥爐等之乾燥方法。 Although the drying method is not particularly limited, it can be, for example, dried using hot air. Drying method such as drying furnace.

再者,乾燥條件並未特別受限。乾燥溫度以攝氏80 ~150度為佳,乾燥時間以持續5秒~1分鐘為佳。藉此,能夠 防止離形劑層13非本意地變質,同時亦能夠特別有效率地形成離形劑層13。如此之結果,能夠提升最終所得到之離形膜1之生產性。 Further, the drying conditions are not particularly limited. Drying temperature is 80 ° C It is preferably ~150 degrees, and the drying time is preferably from 5 seconds to 1 minute. Thereby being able to The release agent layer 13 is prevented from being unintentionally deteriorated, and the release agent layer 13 can also be formed particularly efficiently. As a result, the productivity of the finally obtained release film 1 can be improved.

藉由以上之製程,能夠易於確實製造平滑性優良、 離形性優良且高信賴度之離形膜1。 With the above process, it is easy to manufacture and have excellent smoothness. The release film 1 is excellent in release property and high in reliability.

另外,藉由使用如此之離形膜1製造生坯片,能夠 防止生坯片之表面產生針孔等情形。 In addition, by using such a release film 1 to manufacture a green sheet, Prevent the occurrence of pinholes or the like on the surface of the green sheet.

而且,使用離形膜1製造陶瓷生坯片之方法,能例 如為以下方法,此方法包括於離形膜之離形劑層之表面塗布陶瓷粉末分散漿料並加以乾燥,形成生坯片之後,堆疊從離形膜剝離下來之生坯片而得到堆疊體,於燒結此堆疊體而得到之陶瓷片上形成電極。藉此,能夠得到陶瓷電容器。因此,藉由使用離形膜1所形成生坯片形成陶瓷電容器,能防止因短路所導致之故障問題而得到高信賴度之陶瓷電容器。 Further, a method of manufacturing a ceramic green sheet using the release film 1 can be exemplified In the following method, the method comprises coating a surface of the release agent layer of the release film with a ceramic powder dispersion slurry and drying it to form a green sheet, and then stacking the green sheets peeled off the release film to obtain a stacked body. An electrode is formed on the ceramic sheet obtained by sintering the stacked body. Thereby, a ceramic capacitor can be obtained. Therefore, by forming a ceramic capacitor using the green sheet formed by the release film 1, it is possible to prevent a ceramic capacitor having high reliability due to a problem of malfunction due to a short circuit.

以上基於本發明之優選實施型態之詳細說明,並非 用以限定本發明。 The above detailed description based on the preferred embodiment of the present invention is not It is used to define the invention.

舉例而言,前述之本實施型態中,雖以基材具有單 層構造之方式進行說明,但並非限定於此。基材亦能具有同種或不同種之二層以上的多層構造。另外,關於平滑化層及離形劑層亦同樣地以其具有單層構造之方式進行說明,但並非限定於此。 平滑化層及離形劑層亦能夠各自具有同種或不同種之二層以上的多層構造。 For example, in the foregoing embodiment, although the substrate has a single The method of the layer structure will be described, but is not limited thereto. The substrate can also have a multilayer structure of two or more layers of the same or different species. Further, the smoothing layer and the release agent layer are similarly described as having a single layer structure, but are not limited thereto. The smoothing layer and the release agent layer can also each have a multilayer structure of two or more layers of the same or different species.

再者,前述之本實施型態中,雖以生坯片製造用離 形膜為依序相互接合之基材、平滑化層及離形劑層並堆疊成三層構造之方式進行說明,但並非限定於此。於平滑化層及離形劑層之間亦能夠設置中間層。而且,於基材及平滑化層之間亦能夠設置中間層。如此之中間層能夠為提升平滑化層及離形劑層間之黏著性的層體,另外,亦能夠為捲繞生坯片形成前之生坯片製造用離形膜時能夠更加抑制靜電發生的層體。 Furthermore, in the above-described embodiment, the green sheet is manufactured by using a green sheet. The film is described as a substrate, a smoothing layer, and a release agent layer which are sequentially bonded to each other and stacked in a three-layer structure, but is not limited thereto. An intermediate layer can also be provided between the smoothing layer and the release agent layer. Further, an intermediate layer can also be provided between the substrate and the smoothing layer. Such an intermediate layer can be a layer which improves the adhesion between the smoothing layer and the release agent layer, and can also suppress the occurrence of static electricity when the release film for the green sheet before the formation of the green sheet is wound. Layer body.

再者,本發明之生坯片製造用離形膜之製造方法並 非限定於前述之方法,亦可根據需求而追加任何製程。 Furthermore, the method for producing a release film for producing a green sheet of the present invention It is not limited to the above method, and any process may be added as needed.

以下將說明實施例。 The embodiment will be described below.

接下來,雖然將說明關於本發明之生坯片製造用離 形膜之具體的實施例,但並非將本發明僅限定於此些實施例。 Next, although the production of the green sheet according to the present invention will be explained The specific embodiment of the film is not intended to limit the invention to only these embodiments.

以下將說明生坯片製造用離形膜之製作。 The production of a release film for producing a green sheet will be described below.

以下將說明實施例1。 Embodiment 1 will be explained below.

首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙 二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].

接下來,得到固體含量為20之質量百分比之平滑化 層形成用組成物,其混合有100個質量份之做為熱硬化性化合物之雙酚A型環氧酯化合物〔日立化成聚合物株式會社製之「TA31-059D」,固體含量濃度為50之質量百分比,質量平均分 子量為530〕與3個質量份之對甲苯磺酸(p-toluenesulfonic acid)之酸催化劑及甲苯與甲基乙基酮。 Next, a smoothing of a mass percentage of 20 by weight is obtained. a layer-forming composition in which 100 parts by mass of a bisphenol A epoxy ester compound (TA31-059D) manufactured by Hitachi Chemicals Co., Ltd., having a solid content concentration of 50, is mixed with 100 parts by mass of a thermosetting compound. Mass percentage The amount is 530] and 3 parts by mass of an acid catalyst of p-toluenesulfonic acid and toluene and methyl ethyl ketone.

所得到之平滑化層形成用組成物係以四號繞線棒(Meyer bar #4)塗布於基材之第一表面以得到塗布層。 The obtained composition for forming a smoothing layer was applied to the first surface of the substrate by a No. 4 wire bar (Meyer bar #4) to obtain a coating layer.

接下來,藉由以攝氏130度對塗布層持續加熱1分鐘而形成平滑化層(厚度1.3μm)。 Next, a smoothing layer (thickness 1.3 μm) was formed by continuously heating the coating layer at 130 ° C for 1 minute.

再接著,以甲苯稀釋100個質量份之混合物而得到稀釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述平滑化層之相反於基材之表面均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Then, a mixture of 100 parts by mass was diluted with toluene to obtain a diluted solution, and the mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", and a solid content of 30% by mass) was mixed. An addition reaction type anthrone compound and a crosslinking agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The composition for forming a release agent layer was uniformly coated on the surface of the smoothing layer opposite to the surface of the substrate so that the thickness of the composition for forming the release agent layer was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.

以下將說明實施例2。 Embodiment 2 will be described below.

除了將實施例1之雙軸延伸之聚對苯二甲酸乙二酯膜變更為雙軸延伸之聚對苯二甲酸乙二酯膜〔厚度:31μm,第一表面之算數平均粗糙度Ra2:29nm,第一表面之最大突起高度Rp2:257nm,第二表面之算數平均粗糙度Ra3:29nm,第二表 面之最大突起高度Rp3:257nm〕以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to changing the biaxially stretched polyethylene terephthalate film of Example 1 to a biaxially stretched polyethylene terephthalate film [thickness: 31 μm, the arithmetic mean roughness Ra 2 of the first surface: 29 nm, the maximum protrusion height Rp 2 of the first surface: 257 nm, the arithmetic mean roughness Ra 3 of the second surface: 29 nm, and the maximum protrusion height Rp 3 of the second surface: 257 nm are the same as in the first embodiment. A method is used to manufacture a release film for the production of a green sheet.

以下將說明實施例3。 Embodiment 3 will be explained below.

除了將實施例1之雙軸延伸之聚對苯二甲酸乙二酯 膜變更為雙軸延伸之聚對苯二甲酸乙二酯膜〔厚度:31μm,第一表面之算數平均粗糙度Ra2:15nm,第一表面之最大突起高度Rp2:98nm,第二表面之算數平均粗糙度Ra3:15nm,第二表面之最大突起高度Rp3:98nm〕以及將平滑化層之厚度變更為0.4μm以外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to changing the biaxially stretched polyethylene terephthalate film of Example 1 to a biaxially stretched polyethylene terephthalate film [thickness: 31 μm, the arithmetic mean roughness Ra 2 of the first surface: 15 nm, the maximum protrusion height Rp 2 of the first surface is: 98 nm, the arithmetic mean roughness Ra 3 of the second surface is 15 nm, the maximum protrusion height of the second surface is Rp 3 : 98 nm, and the thickness of the smoothing layer is changed to 0.4 μm. A release film for producing a green sheet was produced in the same manner as in Example 1 except that the rest was carried out.

以下將說明實施例4。 Embodiment 4 will be explained below.

除了將實施例1之平滑化層之厚度變更為1.8μm以 外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to changing the thickness of the smoothing layer of Example 1 to 1.8 μm Further, a release film for producing a green sheet was produced in the same manner as in Example 1 except for the rest.

以下將說明實施例5。 Embodiment 5 will be explained below.

除了將實施例1之平滑化層之厚度變更為2.3μm以 外,以其餘皆與實施例1相同之方式製造出生坯片製造用離形膜。 In addition to changing the thickness of the smoothing layer of Example 1 to 2.3 μm Further, a release film for producing a green sheet was produced in the same manner as in Example 1 except for the rest.

以下將說明比較例1。 Comparative Example 1 will be described below.

首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙 二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].

接著,以甲苯稀釋100個質量份之混合物而得到稀 釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述基材之第一表面上均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Next, a mixture of 100 parts by mass is diluted with toluene to obtain a rare Release liquid, this mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", solid content of 30% by mass] mixed with an addition-type anthrone-based compound as a release agent and cross-linking Agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The release agent layer-forming composition was uniformly coated on the first surface of the substrate so that the thickness of the release agent layer-forming composition after drying was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.

以下將說明比較例2。 Comparative Example 2 will be described below.

首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙 二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].

接下來,得到平滑化層形成用組成物,其混合有100 個質量份之做為熱硬化性化合物之硬脂醯(stearyl)變性醇酸化合物及甲基(methyl)化三聚氰胺化合物之混合物〔日立化成聚合物株式會社製,商品名為「TESFINE 303」,固體含量為20之質量百分比,質量平均分子量為15000〕與3個質量份之對甲苯磺酸之酸催化劑。 Next, a composition for forming a smoothing layer is obtained, which is mixed with 100 a mixture of a stearyl denatured alkyd compound and a methylated melamine compound as a thermosetting compound (manufactured by Hitachi Chemical Co., Ltd., trade name "TESFINE 303", solid The acid catalyst having a content of 20% by mass, a mass average molecular weight of 15000] and 3 parts by mass of p-toluenesulfonic acid.

所得到之平滑化層形成用組成物係以四號繞線棒塗 布於基材之第一表面以得到塗布層。 The resulting composition for forming a smoothing layer is coated with a wire rod of No. 4 The first surface of the substrate is applied to obtain a coating layer.

接下來,藉由以攝氏130度對塗布層持續加熱1分 鐘而形成平滑化層(厚度1.0μm)。 Next, the coating layer is continuously heated by 1 minute at 130 degrees Celsius. A smoothing layer (thickness 1.0 μm) was formed in the clock.

再接著,以甲苯稀釋100個質量份之混合物而得到 稀釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述平滑化層之相反於基材之表面均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Then, a mixture of 100 parts by mass of toluene is diluted to obtain Diluate, this mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", solid content of 30% by mass] mixed with an addition-type anthrone-based compound as a release agent and cross-linking Agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The composition for forming a release agent layer was uniformly coated on the surface of the smoothing layer opposite to the surface of the substrate so that the thickness of the composition for forming the release agent layer was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.

以下將說明比較例3。 Comparative Example 3 will be described below.

首先,準備做為基材之雙軸延伸之聚對苯二甲酸乙 二酯膜〔厚度:38μm,第一表面之算數平均粗糙度Ra2:42nm,第一表面之最大突起高度Rp2:619nm,第二表面之算數平均粗糙度Ra3:42nm,第二表面之最大突起高度Rp3:619nm〕。 First, a biaxially stretched polyethylene terephthalate film as a substrate (thickness: 38 μm, arithmetic mean roughness Ra 2 of the first surface: 42 nm, maximum protrusion height Rp 2 of the first surface: 619 nm) The arithmetic mean roughness Ra 3 of the second surface is 42 nm, and the maximum protrusion height Rp 3 of the second surface is 619 nm].

接下來,得到固體含量為20之質量百分比之平滑化 層形成用組成物,其混合有80個質量份之做為熱硬化性化合物之聚酯化合物〔東洋紡績(株)製,商品名為「VYLON 20SS」,固體含量為30之質量百分比,質量平均分子量為3000〕、20個 質量份之做為交聯劑之甲基化三聚氰胺化合物、3個質量份之對甲苯磺酸之酸催化劑、甲苯及甲基乙基酮。 Next, a smoothing of a mass percentage of 20 by weight is obtained. A composition for forming a layer, which is a polyester compound (manufactured by Toyobo Co., Ltd., trade name "VYLON 20SS", manufactured by Toyobo Co., Ltd., having a solid content of 30% by mass, mass average, 80 parts by mass of a polyester compound as a thermosetting compound. Molecular weight is 3000], 20 The mass fraction is a methylated melamine compound as a crosslinking agent, three parts by mass of an acid catalyst of p-toluenesulfonic acid, toluene and methyl ethyl ketone.

所得到之平滑化層形成用組成物係以四號繞線棒塗 布於基材之第一表面以得到塗布層。 The resulting composition for forming a smoothing layer is coated with a wire rod of No. 4 The first surface of the substrate is applied to obtain a coating layer.

接下來,藉由以攝氏130度對塗布層持續加熱1分 鐘而形成平滑化層(厚度1.2μm)。 Next, the coating layer is continuously heated by 1 minute at 130 degrees Celsius. A smoothing layer (thickness 1.2 μm) was formed in the clock.

再接著,以甲苯稀釋100個質量份之混合物而得到 稀釋液,此混合物〔信越化學工業株式會社製,商品名為「SILICONE KS-847H」,固體含量為30之質量百分比〕混合有做為離形劑之加成反應型矽酮系化合物及交聯劑。於此稀釋液中添加2個質量份之白金催化劑〔信越化學工業株式會社製,商品名為「PL-50T」〕並加以混合而得到固體含量為1.5之質量百分比之離形劑層形成用組成物。以離形劑層形成用組成物乾燥後之厚度為0.1μm之方式,於前述平滑化層之相反於基材之表面均勻塗布離形劑層形成用組成物。之後,於攝氏130度持續1分鐘以乾燥離形劑層形成用組成物而形成離形劑層,而製造出生坯片製造用離形膜。 Then, a mixture of 100 parts by mass of toluene is diluted to obtain Diluate, this mixture (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "SILICONE KS-847H", solid content of 30% by mass] mixed with an addition-type anthrone-based compound as a release agent and cross-linking Agent. To the diluted solution, two parts by mass of a platinum catalyst (manufactured by Shin-Etsu Chemical Co., Ltd., trade name "PL-50T") was added and mixed to obtain a composition for forming a release agent layer having a solid content of 1.5% by mass. Things. The composition for forming a release agent layer was uniformly coated on the surface of the smoothing layer opposite to the surface of the substrate so that the thickness of the composition for forming the release agent layer was 0.1 μm. Thereafter, the release agent layer was formed by drying the composition for forming a release agent layer at 130 ° C for 1 minute to produce a release film for producing a green sheet.

表1-1~1-3表示各實施利及各比較例之生坯片製造 用離形膜之構成。 Tables 1-1 to 1-3 show the manufacture of green sheets for each of the comparative examples. The composition of the release film is used.

而且於表中,做為熱硬化性化合物之雙酚A型環氧 酯化合物〔日立化成聚合物株式會社製之「TA31-059D」,固體含量濃度為50之質量百分比〕表示為「A1」,做為熱硬化性化合物之硬脂醯變性醇酸化合物及甲基化三聚氰胺化合物之混合物〔日立化成聚合物株式會社製,商品名為「TESFINE 303」,固體含量為20之質量百分比〕表示為「A2」,做為熱硬化性化合物之聚酯化合物〔東洋紡績(株)製,商品名為「VYLON 20SS」,固體含 量為30之質量百分比〕表示為「A3」。 Also in the table, bisphenol A type epoxy as a thermosetting compound The ester compound [TA31-059D, manufactured by Hitachi Chemical Co., Ltd., a solid content concentration of 50% by mass] is expressed as "A1", and is a hard curable compound of a thermosetting compound and methylated. A mixture of melamine compounds (trade name "TESFINE 303", manufactured by Hitachi Chemical Co., Ltd., and a solid content of 20% by mass) is expressed as "A2", and is a polyester compound of a thermosetting compound [Toyobo Co., Ltd. ), the product name is "VYLON 20SS", solid content The mass percentage of 30 is expressed as "A3".

再者,各實施例及各比較例之基材、平滑化層及離 形劑層之膜厚,係各自以反射式膜厚計「F20」〔FILMETRICS株式會社製〕測定。 Further, the substrate, the smoothing layer and the separation of each of the examples and the comparative examples The film thickness of each of the coating layers was measured by a reflective film thickness meter "F20" (manufactured by FILMETRICS Co., Ltd.).

另外,係依照如下之方式各自測定基材之第一表面 之算數平均粗糙度Ra2及最大突起高度Rp2、基材之第二表面之算數平均粗糙度Ra3及最大突起高度Rp3、平滑化層之第三表面之算數平均粗糙度Ra4及最大突起高度Rp4、離形劑層之外表面之算數平均粗糙度Ra1及最大突起高度Rp1。首先,於玻璃板上貼附雙面膠帶。接下來,將利用各實施例及各比較例所得到之生坯片製造用離形膜,以欲測定之算數平均粗糙度及最大突起高度之位置表面之相反表面朝向玻璃板之方式,固定於雙面膠帶上。 藉此,依照日本工業標準JIS B0601-1994使用三豐社製造之表面粗糙度測定機SV3000S4(觸針式)測定前述之算數平均粗糙度Ra2、Ra3、Ra4、Ra1及前述之最大突起高度Rp2、Rp3、Rp4、Rp1Further, the arithmetic mean roughness Ra 2 and the maximum protrusion height Rp 2 of the first surface of the substrate, the arithmetic mean roughness Ra 3 and the maximum protrusion height Rp 3 of the second surface of the substrate, and smoothing are each measured in the following manner. The arithmetic mean roughness Ra 4 and the maximum protrusion height Rp 4 of the third surface of the layer, the arithmetic mean roughness Ra 1 of the outer surface of the release agent layer, and the maximum protrusion height Rp 1 . First, attach double-sided tape to the glass. Next, the release film for producing a green sheet obtained by each of the examples and the comparative examples is fixed to the glass plate so that the opposite surface of the positional surface of the arithmetic mean roughness and the maximum protrusion height to be measured is oriented to the glass sheet. On double-sided tape. In this way, the arithmetic mean roughness Ra 2 , Ra 3 , Ra 4 , Ra 1 and the maximum amount described above were measured in accordance with Japanese Industrial Standard JIS B0601-1994 using a surface roughness measuring machine SV3000S4 (stylus type) manufactured by Mitutoyo Corporation. Protrusion heights Rp 2 , Rp 3 , Rp 4 , Rp 1 .

以下將說明各實施例及各比較例之評價。 The evaluation of each of the examples and the comparative examples will be described below.

以下進行關於如上述所得到之生坯片製造用離形膜的評價。 The evaluation of the release film for producing a green sheet obtained as described above was carried out.

以下將說明各實施例及各比較例之結塊性評價。 The cavitability evaluation of each of the examples and the comparative examples will be described below.

利用各實施例及各比較例所得到之生坯片製造用離形膜其寬幅為400mm,長度為5000m,且捲繞成滾筒狀,而得到離形膜滾筒。將此離形膜滾筒於攝氏40度且濕度百分之50以 下的環境下存放30日。之後,以目視方式觀察離形膜滾筒的外觀,並以下列判斷基準評價其結塊性。 The release film for producing a green sheet obtained by each of the examples and the comparative examples had a width of 400 mm, a length of 5000 m, and was wound into a roll shape to obtain a release film roll. Roll the release film at 40 degrees Celsius and 50% humidity Store under the environment for 30 days. Thereafter, the appearance of the release film roll was visually observed, and the caking property was evaluated on the following criteria.

A:比較將生坯片製造用離形膜捲繞成滾筒狀而得到 之存放前的離形膜滾筒外觀,存放後之離形膜滾筒外觀並未產生變化(無結塊現象)。 A: Comparison is carried out by winding a release film for producing a green sheet into a roll shape. The appearance of the release film roll before storage, the appearance of the release film roll after storage did not change (no agglomeration phenomenon).

B:於生坯片製造用離形膜滾筒中有局部色調改變的 區域(有結塊的傾向但仍可使用)。 B: local tonal change in the release film cylinder for green sheet manufacturing Area (has a tendency to agglomerate but can still be used).

C:於生坯片製造用離形膜滾筒中,大範圍區域之色 調改變(有結塊現象)。 C: In the release film cylinder for the production of green sheets, the color of a large area Change the tone (with agglomeration).

如同前述基準C,因生坯片製造用離形膜之表面及 背面彼此黏著而發生結塊的現象,於離形膜滾筒之大範圍區域之色調發生變化的場合,為無法正常捲出生坯片製造用離形膜的場合。 Like the aforementioned reference C, the surface of the release film for green sheet production and When the back surfaces adhere to each other and agglomerate, when the color tone of a large area of the release film roll changes, the release film for the raw green sheet cannot be normally wound.

以下將說明各實施例及各比較例之凹部數量評價。 The evaluation of the number of recesses of each of the examples and the comparative examples will be described below.

以乾燥後之厚度為3μm之方式,將於甲苯/乙醇混合溶劑(質量比為6/4)中溶解聚乙烯醇縮丁醛(polyvinyl butyral,PVB)樹脂之塗覆液,塗布於利用各實施例及各比較例而得到之生坯片製造用離形膜之離形劑層上(外表面),而得到塗布層。於攝氏80度持續1分鐘以乾燥塗布層,而形成聚乙烯醇縮丁醛樹脂層。接下來,於其聚乙烯醇縮丁醛樹脂層之表面貼附聚酯膠帶。再接下來,從聚乙烯醇縮丁醛樹脂層剝離生坯片製造用離形膜,而將聚乙烯醇縮丁醛樹脂層轉移至聚酯膠帶。然 後,使用光干涉式表面形狀觀察裝置「WYKO-1100」〔株式會社Veeco社製造〕,觀察聚乙烯醇縮丁醛樹脂層之與生坯片製造用離形膜之離形劑層接觸之表面。觀察條件為PSI模式之50倍率。聚乙烯醇縮丁醛樹脂層之表面於91.2×119.8μm之範圍內,於聚乙烯醇縮丁醛樹脂層之表面所發現之凹部的計數。其凹部為離形劑層之形狀所轉印之深度達150nm以上者。以下列判斷基準評價凹部數量。而且,使用評價為下述基準C之聚乙烯醇縮丁醛樹脂層(生坯片)製造出電容器的場合,具有易於發生因崩潰電壓低下而導致短路的傾向。 A coating liquid of polyvinyl butyral (PVB) resin was dissolved in a toluene/ethanol mixed solvent (mass ratio of 6/4) so as to have a thickness of 3 μm after drying. The coating layer was obtained on the release agent layer (outer surface) of the release film for producing a green sheet obtained in each of the comparative examples. The coating layer was dried at 80 ° C for 1 minute to form a polyvinyl butyral resin layer. Next, a polyester tape was attached to the surface of the polyvinyl butyral resin layer. Next, the release film for producing a green sheet was peeled off from the polyvinyl butyral resin layer, and the polyvinyl butyral resin layer was transferred to a polyester tape. Of course After that, the surface of the polyvinyl butyral resin layer in contact with the release agent layer of the release film for producing a green sheet was observed using an optical interference type surface shape observation device "WYKO-1100" (manufactured by Veeco Co., Ltd.). . The observation condition is 50 times the PSI mode. The surface of the polyvinyl butyral resin layer was counted in the range of 91.2 × 119.8 μm, and the number of recesses found on the surface of the polyvinyl butyral resin layer was counted. The concave portion is a depth at which the shape of the release agent layer is transferred to a depth of 150 nm or more. The number of recesses was evaluated on the following criteria. In addition, when a capacitor is produced using a polyvinyl butyral resin layer (green sheet) which is evaluated as the following reference C, there is a tendency that a short circuit is likely to occur due to a breakdown voltage being lowered.

A:凹部數量為0個。 A: The number of recesses is zero.

B:凹部數量為1~5個。 B: The number of recesses is 1 to 5.

C:凹部數量為6個以上。 C: The number of recesses is six or more.

如此之結果如表2所示。 The results are shown in Table 2.

由表2可知,本發明之生坯片製造用離形膜,其外 表面具有優良的平滑性。而且,使用本發明之生坯片製造用離形膜而形成之生坯片,幾乎未發現粗大的凹部。再者,藉由使用本發明之生坯片製造用離形膜而形成之生坯片製造陶瓷電容器,並未發現短路等故障之發生。相反地,比較例則無法得到滿意的結果。 As can be seen from Table 2, the release film for producing a green sheet of the present invention is externally The surface has excellent smoothness. Further, the green sheet formed by using the release film of the green sheet of the present invention produced almost no large concave portion. Further, by manufacturing a ceramic capacitor using the green sheet formed by using the green sheet of the present invention to produce a release film, no occurrence of a failure such as a short circuit was observed. On the contrary, the comparative example did not give satisfactory results.

1‧‧‧生坯片製造用離形膜 1‧‧‧Folding film for green sheet manufacturing

11‧‧‧基材 11‧‧‧Substrate

111‧‧‧基材之第一表面 111‧‧‧The first surface of the substrate

112‧‧‧基材之第二表面 112‧‧‧Second surface of the substrate

12‧‧‧平滑化層 12‧‧‧Smoothing layer

121‧‧‧表面(第三表面) 121‧‧‧ surface (third surface)

13‧‧‧離形劑層 13‧‧‧ release agent layer

131‧‧‧離形劑層之外表面 131‧‧‧Outer surface of the release agent layer

Claims (7)

一種生坯片(green sheet)製造用離形膜,包括:一基材,具有一第一表面及一第二表面;一平滑化層,設置於該基材之該第一表面位置;以及一離形劑層,設置於該平滑化層之相反於該基材之一表面位置;其中,該平滑化層係藉由加熱並硬化含有一質量平均分子量為950以下之一熱硬化性化合物之一平滑化層形成用組成物而形成;其中,該離形劑層之一外表面之一算數平均粗糙度Ra1為8nm以下,且該離形劑層之該外表面之一最大突起高度Rp1為50nm以下。 A release film for manufacturing a green sheet, comprising: a substrate having a first surface and a second surface; a smoothing layer disposed on the first surface of the substrate; and a a release agent layer disposed on a surface of the smoothing layer opposite to a surface of the substrate; wherein the smoothing layer is heated and hardened to contain one of thermosetting compounds having a mass average molecular weight of 950 or less Forming a composition for smoothing layer formation; wherein, one of the outer surfaces of the release agent layer has an arithmetic mean roughness Ra 1 of 8 nm or less, and one of the outer surfaces of the release agent layer has a maximum protrusion height Rp 1 It is 50 nm or less. 如請求項1所述之生坯片製造用離形膜,其中該第一表面之一算數平均粗糙度Ra2為10~200nm,且該第一表面之一最大突起高度Rp2為80~1000nm。 The release film for producing a green sheet according to claim 1, wherein an arithmetic mean roughness Ra 2 of the first surface is 10 to 200 nm, and a maximum protrusion height Rp 2 of the first surface is 80 to 1000 nm. . 如請求項1所述之生坯片製造用離形膜,其中該平滑化層之一平均膜厚為0.2~10μm。 The release film for producing a green sheet according to claim 1, wherein one of the smoothing layers has an average film thickness of 0.2 to 10 μm. 如請求項1所述之生坯片製造用離形膜,其中該熱硬化性化合物為雙酚(bisphenol)型之環氧(epoxy)化合物。 The release film for producing a green sheet according to claim 1, wherein the thermosetting compound is a bisphenol type epoxy compound. 如請求項1所述之生坯片製造用離形膜,其中該平滑化層具有相反於該基材之一表面,該平滑化層之相反於該基材之該表面之一算數平均粗糙度Ra4為8nm以下,且該平滑化層 之相反於該基材之該表面之一最大突起高度Rp4為50nm以下。 The release film for producing a green sheet according to claim 1, wherein the smoothing layer has a surface roughness opposite to a surface of the substrate, and the smoothing layer is opposite to an average roughness of the surface of the substrate. Ra 4 is 8 nm or less, and the maximum protrusion height Rp 4 of the surface of the smoothing layer opposite to the surface of the substrate is 50 nm or less. 如請求項1所述之生坯片製造用離形膜,其中該第二表面之一算數平均粗糙度Ra3為10~200nm,且該第二表面之一最大突起高度Rp3為80~1000nm。 The release film for producing a green sheet according to claim 1, wherein an arithmetic mean roughness Ra 3 of the second surface is 10 to 200 nm, and a maximum protrusion height Rp 3 of the second surface is 80 to 1000 nm. . 如請求項1至6之其中之一所述之生坯片製造用離形膜之製造方法,包括以下製程:一基材準備製程,係製備該基材,該基材具有該第一表面及該第二表面;一塗布層形成製程,係藉由將含有該質量平均分子量為950以下之該熱硬化性化合物之該平滑化層形成用組成物塗布於該基材之該第一表面位置而形成一塗布層;一平滑化層形成製程,係藉由加熱並硬化該塗布層而形成該平滑化層;以及一離形劑層形成製程,係於該平滑化層之相反於該基材之該表面位置形成該離形劑層;其中,該離形劑層之該外表面之該算數平均粗糙度Ra1為8nm以下,且該離形劑層之該外表面之該最大突起高度Rp1為50nm以下。 The method for producing a release film for producing a green sheet according to any one of claims 1 to 6, comprising the following process: a substrate preparation process for preparing the substrate, the substrate having the first surface and The second surface; a coating layer forming process by applying the smoothing layer forming composition containing the thermosetting compound having a mass average molecular weight of 950 or less to the first surface position of the substrate Forming a coating layer; forming a smoothing layer to form the smoothing layer by heating and hardening the coating layer; and forming a release agent layer on the opposite side of the smoothing layer The surface position forms the release agent layer; wherein the arithmetic mean roughness Ra 1 of the outer surface of the release agent layer is 8 nm or less, and the maximum protrusion height Rp 1 of the outer surface of the release agent layer It is 50 nm or less.
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