TW201424834A - Photosensitive composition, gray curable film using the same, gray pixel and solid state imaging element - Google Patents

Photosensitive composition, gray curable film using the same, gray pixel and solid state imaging element Download PDF

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TW201424834A
TW201424834A TW102139580A TW102139580A TW201424834A TW 201424834 A TW201424834 A TW 201424834A TW 102139580 A TW102139580 A TW 102139580A TW 102139580 A TW102139580 A TW 102139580A TW 201424834 A TW201424834 A TW 201424834A
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group
mass
composition
gray
refractive index
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TWI621476B (en
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Kazutaka Takahashi
Yoshinori Taguchi
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Fujifilm Corp
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06Polymers provided for in subclass C08G
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02Polyamines
    • C08G73/0206Polyalkylene(poly)amines
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
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    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • C09D17/002Pigment pastes, e.g. for mixing in paints in organic medium
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints
    • C09D17/004Pigment pastes, e.g. for mixing in paints containing an inorganic pigment
    • C09D17/007Metal oxide
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/02Polyamines

Abstract

The invention provides a composition, which contains a particle having a high refractive index, a black pigment, a dispersing agent and an organic solvent.

Description

感光性組成物、使用其的灰色硬化膜、灰色畫素及固體攝影元件 Photosensitive composition, gray cured film using the same, gray pixel, and solid-state imaging element

本發明是有關於一種感光性組成物、使用其的灰色硬化膜及灰色畫素以及固體攝影元件。 The present invention relates to a photosensitive composition, a gray cured film using the same, a gray pixel, and a solid-state imaging element.

為了提高影像感測器(電荷耦合元件(Charge-coupled Device,CCD)、互補式金屬氧化物半導體(Complementary Metal-Oxide-Semiconductor,CMOS)的解析度,其畫素數增多並且畫素的微細化不斷發展。然而,開口部變小而成為感度降低的因素。因此,提出有即便開口部的大小受到限制亦為了實現感度而將多種顏色畫素的一種顏色設定為白色(透明)的技術(例如參照專利文獻1)。同時,亦正在推進該白色畫素的成形材料的研究,已提出有下述專利文獻2~專利文獻4等的感光性組成物。 In order to improve the resolution of a video sensor (Charge-coupled Device (CCD), Complementary Metal-Oxide-Semiconductor (CMOS), the number of pixels is increased and the pixels are miniaturized. However, the opening portion is small and becomes a factor for reducing the sensitivity. Therefore, there has been proposed a technique of setting one color of a plurality of color pixels to white (transparent) in order to achieve sensitivity even if the size of the opening is limited (for example, In the case of the research of the molding material of the white pixel, the photosensitive composition of the following Patent Document 2 to Patent Document 4 has been proposed.

進而,最近正在嘗試與上述白色畫素一併、或另行使用透射率低的灰色畫素,來擴大影像感測器的動態範圍(dynamic range)等(參照專利文獻5、專利文獻6)。 Furthermore, it has been attempted to increase the dynamic range of the image sensor by using the gray pixel with low transmittance or the use of the gray pixel (see Patent Document 5 and Patent Document 6).

[先前技術文獻] [Previous Technical Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2007-53153號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-53153

[專利文獻2]日本專利特開2010-49029號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2010-49029

[專利文獻3]日本專利特開2010-78729號公報 [Patent Document 3] Japanese Patent Laid-Open Publication No. 2010-78729

[專利文獻4]日本專利特開2011-127096號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2011-127096

[專利文獻5]日本專利特開2011-66637號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2011-66637

[專利文獻6]日本專利特開2012-74763號公報 [Patent Document 6] Japanese Patent Laid-Open Publication No. 2012-74763

關於上述白色畫素,如上所述正在進行其成形材料的研究開發。然而,關於最近首次提出的透射率低的灰色畫素,即便正在推進元件的設計,其材料的研究亦為尚未著手的狀況。 Regarding the above white pixels, research and development of the molding materials thereof are being carried out as described above. However, with regard to the gray pixel with low transmittance which was first proposed recently, even if the design of the component is being advanced, the research of the material is not yet in progress.

鑒於上述方面,本發明的目的在於提供一種組成物,其可製作具有較佳的光透射性及折射率的灰色硬化膜。另外,其目的在於視需要將上述組成物作為畫素形成用的感光性組成物,而提供一種光微影性特別優異的組成物。進而,其目的在於提供一種使用該感光性組成物所形成的硬化膜、畫素及固體攝影元件。 In view of the above, it is an object of the present invention to provide a composition which can produce a gray cured film having better light transmittance and refractive index. In addition, the above-described composition is used as a photosensitive composition for forming a pixel, and a composition excellent in photolithimetry is provided. Further, it is an object of the invention to provide a cured film, a pixel, and a solid-state imaging element formed using the photosensitive composition.

用以解決上述課題的手段如下所述。 The means for solving the above problems are as follows.

[1]一種組成物,含有高折射率粒子、黑色顏料、分散劑及有機溶劑。 [1] A composition comprising high refractive index particles, a black pigment, a dispersing agent, and an organic solvent.

[2]如[1]所記載的組成物,更含有聚合性化合物、光聚合起始劑及有機溶劑。 [2] The composition according to [1], further comprising a polymerizable compound, a photopolymerization initiator, and an organic solvent.

[3]如[1]或[2]所記載的組成物,其中上述高折射率粒子為二 氧化鈦或氧化鋯的粒子。 [3] The composition according to [1] or [2] wherein the high refractive index particles are two Particles of titanium oxide or zirconia.

[4]如[1]至[3]中任一項所記載的組成物,其中於上述組成物的總固體成分中,上述高折射率粒子的含量為5質量%~30質量%。 [4] The composition according to any one of [1] to [3] wherein the content of the high refractive index particles in the total solid content of the composition is from 5% by mass to 30% by mass.

[5]如[1]至[4]中任一項所記載的組成物,其中上述黑色顏料為鈦黑。 [5] The composition according to any one of [1] to [4] wherein the black pigment is titanium black.

[6]如[1]至[5]中任一項所記載的組成物,其中上述組成物的總固體成分中,上述黑色顏料的含量為0.5質量%~20質量%。 [6] The composition according to any one of [1] to [5] wherein, in the total solid content of the composition, the content of the black pigment is from 0.5% by mass to 20% by mass.

[7]如[1]至[6]中任一項所記載的組成物,其中上述分散劑為寡亞胺(oligo imine)系分散劑、丙烯酸系分散劑。 [7] The composition according to any one of [1] to [6] wherein the dispersing agent is an oligo imine dispersing agent or an acrylic dispersing agent.

[8]如[1]至[7]中任一項所記載的組成物,更含有紅色顏料。 [8] The composition according to any one of [1] to [7] further comprising a red pigment.

[9]如[1]至[8]中任一項所記載的組成物,更含有紫外線吸收劑。 [9] The composition according to any one of [1] to [8] further comprising an ultraviolet absorber.

[10]如[1]至[9]中任一項所記載的組成物,其中上述分散劑於總固體成分中的含量為0.05質量%~10質量%。 [10] The composition according to any one of [1] to [9] wherein the content of the dispersing agent in the total solid content is 0.05% by mass to 10% by mass.

[11]如[1]至[10]中任一項所記載的組成物,其中上述分散劑為分散樹脂,上述分散樹脂含有下述式(I-1)所表示的重複單元及式(I-2)所表示的重複單元、或式(I-1)所表示的重複單元及式(I-2a)所表示的重複單元,[化1] [11] The composition according to any one of [1] to [10] wherein the dispersing agent is a dispersion resin, and the dispersing resin contains a repeating unit represented by the following formula (I-1) and a formula (I) -2) a repeating unit represented by the formula or a repeating unit represented by the formula (I-1) and a repeating unit represented by the formula (I-2a), [Chemical Formula 1]

R1及R2分別獨立地表示氫原子、鹵素原子或烷基;a分別獨立地表示1~5的整數;*表示重複單元間的連結部;R8及R9為含意與R1相同的基團;L為單鍵、伸烷基、伸烯基、伸芳基、伸雜芳基、亞胺基、醚基、硫醚基、羰基或該些基團的組合的連結基;La為與CR8CR9及N一起形成環結構的結構部位;X表示具有pKa為14以下的官能基的基團;Y表示原子數為40~10,000的側鏈。 R 1 and R 2 each independently represent a hydrogen atom, a halogen atom or an alkyl group; a each independently represents an integer of 1 to 5; * represents a linking moiety between repeating units; and R 8 and R 9 have the same meaning as R 1 . group; L is a single bond, alkylene linking group in combination, alkenylene group, an arylene group, extending heteroaryl group, an imino group, an ether group, a thioether group, a carbonyl group or a group of the plurality; L a A structural moiety which forms a ring structure together with CR 8 CR 9 and N; X represents a group having a functional group having a pKa of 14 or less; and Y represents a side chain having an atomic number of 40 to 10,000.

[12]如[1]至[10]中任一項所記載的組成物,其中上述分散劑含有下述式(1)~式(5)的任一重複單元, [12] The composition according to any one of [1] to [10] wherein the dispersing agent contains any repeating unit of the following formula (1) to formula (5),

式中,X1~X6表示氫原子、鹵素原子或一價有機基;Y1~Y5表示單鍵或二價連結基;Z1~Z5表示氫原子或一價有機基;R表示氫原子或一價有機基,亦可於共聚物中存在結構不同的R;n、 m、p、q及r分別表示1~500的整數;j及k分別獨立地為2~8的整數。 In the formula, X 1 to X 6 represent a hydrogen atom, a halogen atom or a monovalent organic group; Y 1 to Y 5 represent a single bond or a divalent linking group; Z 1 to Z 5 represent a hydrogen atom or a monovalent organic group; and R represents A hydrogen atom or a monovalent organic group may have a structurally different R in the copolymer; n, m, p, q, and r each represent an integer of 1 to 500; and j and k are each independently an integer of 2 to 8.

[13]如[1]至[12]中任一項所記載的組成物,其為固體攝影元件的畫素形成用。 [13] The composition according to any one of [1] to [12] which is used for the formation of a pixel of a solid-state imaging device.

[14]一種灰色硬化膜,其是使如[1]至[13]中任一項所記載的組成物硬化而成。 [14] A gray cured film obtained by curing the composition according to any one of [1] to [13].

[15]如[14]所記載的灰色硬化膜,其中上述硬化膜為灰色,且該灰色是定義為於波長為400nm~700nm的可見光範圍內其透射率的最大值與最小值之差成為0.1%~30%以內的著色。 [15] The gray cured film according to [14], wherein the cured film is gray, and the gray is defined as a difference between a maximum value and a minimum value of a transmittance in a visible light range of a wavelength of 400 nm to 700 nm. Coloring within %~30%.

[16]一種固體攝影元件的灰色畫素,其為包含如[14]或[15]所記載的硬化膜的固體攝影元件的畫素,並且含有上述高折射率粒子、黑色顏料及分散劑。 [16] A gray pixel of a solid-state imaging device, which is a pixel of a solid-state imaging element comprising the cured film according to [14] or [15], and contains the above-mentioned high refractive index particles, a black pigment, and a dispersing agent.

[17]一種固體攝影元件,具備如[16]所記載的灰色畫素。 [17] A solid-state imaging element comprising the gray pixel as described in [16].

於本說明書中,於化學式中存在多個由特定符號所表示的取代基或連結基等(以下稱為取代基等)時,或同時或擇一地規定多個取代基等時,各取代基等可彼此相同亦可不同。該情況對於取代基等的個數的規定而言亦相同。於規定取代基等的個數為2個以上時,該2個以上的取代基等可彼此不同亦可相同。另外,只要無特別說明,則多個取代基等鄰接時該些基團亦可彼此連結或縮環而形成環。 In the present specification, when a plurality of substituents or a linking group represented by a specific symbol (hereinafter referred to as a substituent or the like) are present in the chemical formula, or when a plurality of substituents or the like are simultaneously or alternatively defined, each substituent is used. The same may be the same or different from each other. In this case, the same applies to the regulation of the number of substituents and the like. When the number of the predetermined substituents or the like is two or more, the two or more substituents may be different from each other or the same. Further, unless otherwise specified, when a plurality of substituents or the like are adjacent to each other, the groups may be bonded to each other or condensed to form a ring.

根據本發明的組成物,可製作具有較佳的光透射性及折 射率的灰色硬化膜。另外,本發明的組成物視需要可將其設定為畫素形成用的感光性組成物,該感光性組成物的光微影性特別優異。進而,根據本發明,可使用上述組成物來提供高品質的灰色硬化膜、利用該灰色硬化膜的畫素及固體攝影元件。 According to the composition of the present invention, it is possible to produce a light transmissive property and a fold Gray cured film with a rate of incidence. Further, the composition of the present invention can be set as a photosensitive composition for forming a pixel as needed, and the photosensitive composition is particularly excellent in light opacity. Further, according to the present invention, it is possible to provide a high-quality gray cured film, a pixel using the gray cured film, and a solid-state imaging element using the above composition.

本發明的上述及其他特徵及優點將根據下述記載及隨附的圖式而更為清楚明瞭。 The above and other features and advantages of the invention will be apparent from the description and appended claims.

圖1為表示實施例中製作的灰色硬化膜的透射率(波長為400nm~700nm、溫度為25℃)的圖表。 Fig. 1 is a graph showing the transmittance (wavelength of 400 nm to 700 nm and temperature of 25 ° C) of a gray cured film produced in Examples.

圖2(a)~圖2(b)為表示實施例及比較例中製作的灰色硬化膜((a)試驗101、(b)試驗C01)的外觀的顯微鏡照片(20000倍)。 2(a) to 2(b) are micrographs (20000 times) showing the appearance of the gray cured film ((a) test 101, (b) test C01) produced in the examples and the comparative examples.

本發明的組成物較佳為設定為固體攝影元件的畫素形 成用感光性組成物,較佳為含有特定折射率的高折射率粒子、黑色顏料、分散劑、聚合性化合物、光聚合起始劑及有機溶劑作為其成分。以下,以該成分組成的說明為中心對本發明的較佳實施形態加以說明。 The composition of the present invention is preferably a pixel shape set as a solid photographic element The photosensitive composition for use is preferably a high refractive index particle having a specific refractive index, a black pigment, a dispersant, a polymerizable compound, a photopolymerization initiator, and an organic solvent. Hereinafter, preferred embodiments of the present invention will be described focusing on the description of the composition of the components.

[高折射率粒子] [High refractive index particles]

高折射率粒子較佳為其構成材料(物質)的折射率為1.8以上,更佳為1.9以上,進而佳為2以上。上限較佳為3以下,更佳 為2.9以下,進而佳為2.8以下。藉由將高折射率粒子的折射率設定為上述上限值以下,可將硬化膜的透射率的變動量保持於特定範圍內,並且增加折射率,因而較佳。另一方面,藉由將其下限值設定為上述值以上,可抑制、防止與後述其他畫素的干涉,因而較佳。再者,高折射率粒子的折射率的測定方法只要無特別說明,則設定為採用後述實施例中測定的值。 The high refractive index particles are preferably a refractive index of the constituent material (substance) of 1.8 or more, more preferably 1.9 or more, and still more preferably 2 or more. The upper limit is preferably 3 or less, more preferably It is 2.9 or less, and further preferably 2.8 or less. By setting the refractive index of the high refractive index particles to be equal to or lower than the above upper limit value, it is preferable to maintain the fluctuation amount of the transmittance of the cured film within a specific range and increase the refractive index. On the other hand, by setting the lower limit value to be equal to or higher than the above value, interference with other pixels described later can be suppressed and prevented, which is preferable. In addition, the method of measuring the refractive index of the high refractive index particles is set to a value measured in the examples described later unless otherwise specified.

高折射率粒子的一次粒子的重量平均粒徑較佳為150nm以下,更佳為100nm以下,尤佳為80nm以下。下限值並不特別存在,實際上為1nm以上。層中的高折射率粒子的重量平均粒徑較佳為200nm以下,更佳為150nm以下,進而佳為100nm以下,尤佳為80nm以下。下限並不特別存在,較佳為1nm以上,更佳為5nm以上,進而佳為10nm以上。考慮到一次粒子於層中凝聚,因而如上述般將一次粒子的粒徑範圍規定為與層中的粒徑範圍不同的範圍。再者,關於高折射率粒子的重量平均粒徑,只要無特別說明,則設定為基於藉由後述實施例中採用的測定方法所測定的值。 The weight average particle diameter of the primary particles of the high refractive index particles is preferably 150 nm or less, more preferably 100 nm or less, and particularly preferably 80 nm or less. The lower limit value does not particularly exist, and is actually 1 nm or more. The weight average particle diameter of the high refractive index particles in the layer is preferably 200 nm or less, more preferably 150 nm or less, further preferably 100 nm or less, and particularly preferably 80 nm or less. The lower limit is not particularly limited, and is preferably 1 nm or more, more preferably 5 nm or more, and still more preferably 10 nm or more. In view of the aggregation of primary particles in the layer, the particle size range of the primary particles is defined as a range different from the particle size range in the layer as described above. In addition, the weight average particle diameter of the high refractive index particle is set based on the value measured by the measuring method used by the Example mentioned later, unless it demonstrates especially.

高折射率粒子的例子可列舉:包含金屬氧化物的粒子,上述金屬氧化物具有選自Ti、Zr、Sn、Sb、Cu、Fe、Mn、Pb、Cd、As、Cr、Hg、Zn、Al、Mg、Si、P及S中的至少一種元素。具體可列舉:二氧化鈦、氧化鋯、氧化錫、氧化銦、氧化鋅、氧化銦錫(Indium Tin Oxide,ITO)、二氧化矽、氧化鋁、氧化鎂、氧化釩、氧化鈮的粒子。其中,尤佳為氧化鈦、氧化鋯的粒子。 金屬氧化物粒子是以該些金屬的氧化物作為主成分,可更含有其他元素。所謂主成分,是指構成粒子的成分中含量(質量%)最多的成分。其他元素的例子可列舉:Ti、Zr、Sn、Sb、Cu、Fe、Mn、Pb、Cd、As、Cr、Hg、Zn、Al、Mg、Si、P及S等。以二氧化鈦作為主成分的無機微粒子的結晶結構較佳為金紅石、金紅石/銳鈦礦的混晶、銳鈦礦、非晶結構為主成分,尤佳為金紅石結構為主成分。 Examples of the high refractive index particles include particles containing a metal oxide having a selected from the group consisting of Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, and Al. At least one of Mg, Si, P, and S. Specific examples thereof include particles of titanium dioxide, zirconium oxide, tin oxide, indium oxide, zinc oxide, indium tin oxide (ITO), cerium oxide, aluminum oxide, magnesium oxide, vanadium oxide, and cerium oxide. Among them, particles of titanium oxide and zirconium oxide are particularly preferred. The metal oxide particles are mainly composed of oxides of these metals, and may further contain other elements. The main component refers to a component having the largest content (% by mass) of the components constituting the particles. Examples of other elements include Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si, P, and S. The crystal structure of the inorganic fine particles having titanium dioxide as a main component is preferably a mixed crystal of rutile, rutile/anatase, anatase, and an amorphous structure as a main component, and particularly preferably a rutile structure.

高折射率粒子較佳為經表面處理。表面處理可使用無機化合物或有機化合物來實施。表面處理中所用的無機化合物的例子可列舉氧化鋁、二氧化矽、氧化鋯及氧化鐵。其中,較佳為氧化鋁及二氧化矽。表面處理中所用的有機化合物的例子可列舉:多元醇、烷醇胺、硬脂酸、矽烷偶合劑及鈦酸酯偶合劑。 The high refractive index particles are preferably surface treated. The surface treatment can be carried out using an inorganic compound or an organic compound. Examples of the inorganic compound used in the surface treatment include alumina, ceria, zirconia, and iron oxide. Among them, alumina and cerium oxide are preferred. Examples of the organic compound used in the surface treatment include a polyhydric alcohol, an alkanolamine, a stearic acid, a decane coupling agent, and a titanate coupling agent.

本發明的較佳實施形態可列舉:於以二氧化鈦作為主成分的無機微粒子中含有選自Co(鈷)、Al(鋁)及Zr(鋯)中的至少一種元素的高折射率粒子。藉此,可抑制二氧化鈦所具有的光觸媒活性,從而可改良高折射率層的耐候性。 In a preferred embodiment of the present invention, high refractive index particles containing at least one element selected from the group consisting of Co (cobalt), Al (aluminum), and Zr (zirconium) are contained in the inorganic fine particles containing titanium dioxide as a main component. Thereby, the photocatalytic activity of the titanium oxide can be suppressed, and the weather resistance of the high refractive index layer can be improved.

高折射率粒子亦可組合兩種以上的表面處理來進行處理。金屬氧化物粒子的形狀較佳為米粒狀、球形狀、立方體狀、紡錘形狀或不定形狀。亦可於高折射率層及中折射率層中併用兩種以上的金屬氧化物粒子。 The high refractive index particles may also be treated by combining two or more surface treatments. The shape of the metal oxide particles is preferably a rice grain shape, a spherical shape, a cubic shape, a spindle shape or an indefinite shape. Two or more kinds of metal oxide particles may be used in combination in the high refractive index layer and the medium refractive index layer.

二氧化鈦粒子的市售物例如可列舉:石原產業(股)製造的TTO系列(TTO-51(A)、TTO-51(C)等)、TTO-S、V系列(TTO-S-1、 TTO-S-2、TTO-V-3等),帝化(Tayca)(股)製造的MT系列(MT-01、MT-05等)等。 For the commercially available product of the titanium dioxide particles, for example, TTO series (TTO-51 (A), TTO-51 (C), etc.) manufactured by Ishihara Sangyo Co., Ltd., TTO-S, V series (TTO-S-1, TTO-S-2, TTO-V-3, etc., MT series (MT-01, MT-05, etc.) manufactured by Tayca.

二氧化鋯粒子的市售物例如可列舉:UEP、UEP-100(第一稀元素化學工業(股)製造),PCS(日本電工(股)製造),JS-01、JS-03、JS-04(日本電工(股)製造)等。 Commercial products of the zirconium dioxide particles include, for example, UEP, UEP-100 (manufactured by the first rare element chemical industry), PCS (manufactured by Nippon Electric Co., Ltd.), JS-01, JS-03, JS- 04 (made by Nippon Electric Co., Ltd.), etc.

關於高折射率粒子於組成物中的含量,於總固體成分中較佳為5質量%以上,更佳為10質量%以上,進而佳為15質量%以上。上限較佳為50質量%以下,更佳為40質量%以下,進而佳為35質量%以下,尤佳為30質量%以下。 The content of the high refractive index particles in the composition is preferably 5% by mass or more, more preferably 10% by mass or more, and still more preferably 15% by mass or more based on the total solid content. The upper limit is preferably 50% by mass or less, more preferably 40% by mass or less, further preferably 35% by mass or less, and particularly preferably 30% by mass or less.

[黑色顏料] [black pigment]

黑色顏料可列舉作為無機顏料的碳黑或以下所示的含黑色金屬的無機顏料。含黑色金屬的無機顏料可列舉:含有選自由Co、Cr、Cu、Mn、Ru、Fe、Ni、Sn、Ti及Ag所組成的組群中的一種或兩種以上的金屬元素的金屬氧化物、金屬氮化物。該些顏料可僅使用一種,另外亦能以兩種以上的混合物的形式使用。另外,亦可藉由在黑色顏料中進一步組合使用其他色調的無機顏料,而以具有所需遮光性的方式製備。可組合使用的具體的無機顏料的例子例如可列舉:鋅白、鉛白、鋅鋇白、氧化鈦、氧化鉻、氧化鐵、沈降性硫酸鋇及重晶石粉(Barite)、紅丹、氧化鐵紅、鉻黃、鋅黃(1型鋅黃、2型鋅黃)、群青(ultramarine blue)、普魯士藍(Prussian blue)(亞鐵氰化鐵(ferric ferrocyanide)鉀)、鋯石灰(zircon grey)、鐠黃(Praseodymium yellow)、鉻鈦黃、鉻綠、孔 雀綠、維多利亞綠(Victoria green)、鐵藍(與普魯士藍無關)、釩鋯藍、鉻錫粉紅、錳紅(manganese pink)、橙紅(salmon pink)等。尤其為了表現出自紫外起至紅外為止的廣波長範圍內的遮光性,不僅可將該些黑色顏料或具有其他色調的無機顏料單獨使用,而且可將多種顏料混合使用。 Examples of the black pigment include carbon black as an inorganic pigment or a black metal-containing inorganic pigment shown below. The inorganic pigment containing a ferrous metal may, for example, be a metal oxide containing one or two or more metal elements selected from the group consisting of Co, Cr, Cu, Mn, Ru, Fe, Ni, Sn, Ti, and Ag. , metal nitride. These pigments may be used alone or in the form of a mixture of two or more. Further, it can also be prepared in such a manner that it has a desired light-shielding property by further using an inorganic pigment of another color tone in a black pigment. Examples of specific inorganic pigments that can be used in combination include, for example, zinc white, lead white, zinc antimony white, titanium oxide, chromium oxide, iron oxide, precipitated barium sulfate, and barite powder, red dan, and iron oxide. Red, chrome yellow, zinc yellow (type 1 zinc yellow, type 2 zinc yellow), ultramarine blue, Prussian blue (ferric ferrocyanide potassium), zircon grey , Praseodymium yellow, chrome titanium yellow, chrome green, hole Green, Victoria green, iron blue (not related to Prussian blue), vanadium zirconium blue, chrome tin pink, manganese red, orange pink, etc. In particular, in order to exhibit light-shielding properties in a wide wavelength range from ultraviolet light to infrared light, not only these black pigments or inorganic pigments having other color tones can be used alone, but also a plurality of pigments can be used in combination.

另外,就遮光性及硬化性的觀點而言,黑色顏料較佳為 銀及/或錫的金屬顏料、,就具有自紫外起至紅外為止的廣波長範圍的遮光性的觀點而言,尤佳為鈦黑。所謂鈦黑,是指含有鈦原子的黑色粒子。較佳為低價氧化鈦或氮氧化鈦等。 對於鈦黑粒子而言,為了提高分散性、抑制凝聚性等,視需要可對表面進行修飾。可利用氧化矽、氧化鈦、氧化鍺、氧化鋁、氧化鎂、氧化鋯來進行被覆,另外亦可利用日本專利特開2007-302836號公報中所示般的撥水性物質來進行處理。對於上述鈦黑而言,為了調整分散性、著色性等,亦可含有一種或以兩種以上的組合而含有Cu、Fe、Mn、V、Ni等的複合氧化物、氧化鈷、氧化鐵、碳黑等黑色顏料,於該情形時,設定為鈦黑粒子佔顏料的50質量%以上。鈦黑的市售品的例子可列舉:三菱材料(Mitsubishi Material)公司製造的鈦黑10S、鈦黑12S、鈦黑13R、鈦黑13M、鈦黑13M-C、鈦黑13R、鈦黑13R-N,赤穂化成(股)的提拉克(Tilack)D等。 Further, from the viewpoint of light blocking property and hardenability, the black pigment is preferably a metallic pigment of silver and/or tin, From the viewpoint of light-shielding properties in a wide wavelength range from ultraviolet light to infrared light, titanium black is particularly preferable. The term "titanium black" refers to black particles containing titanium atoms. It is preferably low-valent titanium oxide or titanium oxynitride. For the titanium black particles, the surface may be modified as needed in order to improve dispersibility, suppress cohesiveness, and the like. The coating can be carried out by using cerium oxide, titanium oxide, cerium oxide, aluminum oxide, magnesium oxide or zirconium oxide, or by using a water-repellent substance as shown in JP-A-2007-302836. The titanium black may contain one or a composite oxide of Cu, Fe, Mn, V, Ni or the like, cobalt oxide, iron oxide, or the like in order to adjust dispersibility, coloring property, and the like. In the case of a black pigment such as carbon black, titanium black particles are set to be 50% by mass or more of the pigment. Examples of the commercially available product of titanium black include titanium black 10S, titanium black 12S, titanium black 13R, titanium black 13M, titanium black 13M-C, titanium black 13R, and titanium black 13R manufactured by Mitsubishi Material Co., Ltd. N, Tilack D of Akasaka Chemicals Co., Ltd., etc.

鈦黑的製造方法有以下方法:將二氧化鈦與金屬鈦的混合物於還原環境下加熱而進行還原的方法(日本專利特開昭 49-5432號公報);於含氫的還原環境中將由四氯化鈦的高溫水解所得的超微細二氧化鈦還原的方法(日本專利特開昭57-205322號公報);於氨的存在下將二氧化鈦或氫氧化鈦高溫還原的方法(日本專利特開昭60-65069號公報、日本專利特開昭61-201610號公報);使二氧化鈦或氫氧化鈦附著於釩化合物上,於氨的存在下進行高溫還原的方法(日本專利特開昭61-201610號公報)等。然而,本發明不限定於該些方法。 The method for producing titanium black has the following method: a method in which a mixture of titanium dioxide and titanium metal is heated in a reducing environment for reduction (Japanese Patent Special Opening) (No. 49-5432); a method of reducing ultrafine titanium dioxide obtained by high-temperature hydrolysis of titanium tetrachloride in a hydrogen-containing reducing environment (Japanese Patent Laid-Open Publication No. SHO 57-205322); titanium dioxide in the presence of ammonia Or a method of high-temperature reduction of titanium hydroxide (Japanese Patent Laid-Open Publication No. SHO-60-65069, JP-A-61-201610), and titanium dioxide or titanium hydroxide is attached to a vanadium compound in the presence of ammonia. A method of high-temperature reduction (Japanese Patent Laid-Open No. 61-201610) and the like. However, the invention is not limited to the methods.

黑色顏料的粒徑較佳為平均一次粒徑為5nm以上,就分散性、遮光性、經時沈降性的觀點而言,較佳為平均一次粒徑為10nm以上。就同樣的觀點而言,上限較佳為10μm以下,更佳為1μm以下,進而佳為100nm以下。黑色顏料的粒徑只要無特別說明,則設定為採用後述實施例中測定的值。 The particle diameter of the black pigment is preferably an average primary particle diameter of 5 nm or more, and the average primary particle diameter is preferably 10 nm or more from the viewpoint of dispersibility, light blocking property, and time-dependent sedimentation property. From the same viewpoint, the upper limit is preferably 10 μm or less, more preferably 1 μm or less, and still more preferably 100 nm or less. The particle size of the black pigment is set to a value measured in Examples described later unless otherwise specified.

鈦黑的比表面積並無特別限定,為了使利用撥水劑對該鈦黑進行表面處理後的撥水性達到既定性能,較佳為利用布厄特(Brunauer-Emmett-Teller,BET)法測定的值通常為5m2/g~150m2/g左右,尤佳為20m2/g~100m2/g左右。 The specific surface area of titanium black is not particularly limited, and in order to achieve a predetermined water repellency after surface treatment of the titanium black with a water repellent, it is preferably measured by a Brunauer-Emmett-Teller (BET) method. value is usually about 5m 2 / g ~ 150m 2 / g, particularly preferably of about 20m 2 / g ~ 100m 2 / g.

黑色顏料可僅使用一種,亦可為多種的組合。 The black pigment may be used singly or in combination of plural kinds.

於總固體成分中,組成物中的黑色顏料的含量較佳為0.5質量%以上,更佳為1質量%以上,進而佳為5質量%以上,尤佳為10質量%以上。上限較佳為70質量%以下,更佳為50質量%以下,進而佳為30質量%以下,進而更佳為20質量%以下。 In the total solid content, the content of the black pigment in the composition is preferably 0.5% by mass or more, more preferably 1% by mass or more, further preferably 5% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 70% by mass or less, more preferably 50% by mass or less, further preferably 30% by mass or less, and still more preferably 20% by mass or less.

相對於上述高折射率粒子100質量份,黑色顏料的調配比較 佳為1份以上,更佳為2份以上,尤佳為5份以上。上限較佳為100份以下,更佳為70份以下,尤佳為50份以下。 Comparison of the blending of black pigments with respect to 100 parts by mass of the above high refractive index particles Preferably, it is 1 part or more, more preferably 2 parts or more, and particularly preferably 5 parts or more. The upper limit is preferably 100 parts or less, more preferably 70 parts or less, and particularly preferably 50 parts or less.

相對於上述二氧化鈦100質量份,鈦黑的調配比較佳為1份以上,更佳為2份以上,尤佳為5份以上。上限較佳為100份以下,更佳為70份以下,尤佳為50份以下。 The blending of titanium black is preferably 1 part or more, more preferably 2 parts or more, and particularly preferably 5 parts or more, based on 100 parts by mass of the above titanium oxide. The upper limit is preferably 100 parts or less, more preferably 70 parts or less, and particularly preferably 50 parts or less.

[分散劑] [Dispersant]

分散劑於組成物中並不特別區分而定義,但考慮到其功能方面,以高折射率粒子的分散能力高者與黑色顏料的分散能力高者來區分並記載於以下。然而,本發明不受此種記載的限定性解釋。 The dispersant is not particularly distinguished from the composition, but in view of its function, it is distinguished from those in which the dispersibility of the high refractive index particles is high and the dispersibility of the black pigment is high. However, the invention is not to be construed as limited by the description.

(高折射率粒子分散用分散劑) (Dispersant for dispersing high refractive index particles)

.特定分散樹脂A . Specific dispersion resin A

本發明中,較佳為使用下述式(A1)所表示的分散樹脂作為高折射率粒子分散用分散劑。 In the present invention, a dispersion resin represented by the following formula (A1) is preferably used as a dispersant for dispersing a high refractive index particle.

對各取代基及連結基依序進行說明,取代基A1與高折射率粒子相互作用,上述式(A1)所表示的分散劑藉由具有n個(1個~9個)取代基A1,可作為樹脂而與高折射率粒子牢固地相互作用。另外,聚合物鏈P1可作為立體排斥基而發揮功能,藉由 具有m個聚合物鏈P1,可發揮良好的立體排斥力而使高折射率粒子均勻地分散。進而可推測,上述式(A1)所表示的分散劑於分子結構上,亦不會產生現有的接枝無規結構的分散劑可能產生的由粒子間交聯導致的粒子凝聚等弊病。以下,對上述式(A1)的各基團加以詳細說明。再者,式(A1)所表示的分散劑於日本專利特開2007-277514(日本專利特願2006-269707)中亦揭示有同樣的分散劑,可參照該文獻並適當地應用於本發明中。 The substituents and the linking group are described in order, and the substituent A 1 interacts with the high refractive index particles, and the dispersing agent represented by the above formula (A1) has n (1 to 9) substituents A 1 It can act as a resin and strongly interact with high refractive index particles. Further, the polymer chain P 1 functions as a steric repulsion group, and by having m polymer chains P 1 , it is possible to exhibit a good steric repulsive force and uniformly disperse the high refractive index particles. Further, it is presumed that the dispersant represented by the above formula (A1) does not cause a problem such as aggregation of particles due to cross-linking between particles which may occur in the conventional graft-dispersed dispersant in the molecular structure. Hereinafter, each group of the above formula (A1) will be described in detail. Further, the dispersing agent represented by the formula (A1) is also disclosed in Japanese Patent Laid-Open No. Hei. No. 2007-277514 (Japanese Patent Application No. 2006-269707), the disclosure of which is incorporated herein by reference. .

.A1 . A 1

上述A1表示一價取代基,該一價取代基具有至少一種選自由酸基、脲基、胺基甲酸酯基、含配位性氧原子的基團、含鹼性氮原子的基團、雜環基、烷氧基羰基、烷基胺基羰基、羧酸鹽基、磺醯胺基、烷氧基矽烷基、環氧基、異氰酸基及羥基所組成的組群中的基團。再者,以下,將對高折射率粒子具有吸附能力的該部位(上述官能基及結構)適當統稱為「吸附部位」來進行說明。 The above A 1 represents a monovalent substituent having at least one group selected from the group consisting of an acid group, a urea group, an urethane group, a group having a coordinating oxygen atom, and a group containing a basic nitrogen atom. a group in the group consisting of a heterocyclic group, an alkoxycarbonyl group, an alkylaminocarbonyl group, a carboxylate group, a sulfonylamino group, an alkoxyalkyl group, an epoxy group, an isocyanate group, and a hydroxyl group group. In the following, the portion (the functional group and the structure) having an adsorption ability for the high refractive index particles will be collectively referred to as an "adsorption site" as appropriate.

上述吸附部位只要於一個A1中含有至少一種即可,亦可含有兩種以上。該取代基較佳為上述吸附部位與以下連結基鍵結而成的一價取代基,上述連結基是由1個~200個碳原子、0個~20個氮原子、0個~100個氧原子、1個~400個氫原子及0個~40個硫原子所形成。再者,於吸附部位自身可構成一價取代基的情形時,吸附部位本身亦可為A1所表示的一價取代基。 The adsorption site may contain at least one of A 1 and may contain two or more types. The substituent is preferably a monovalent substituent bonded to the above-mentioned adsorption site and the above-mentioned linking group, wherein the linking group is composed of 1 to 200 carbon atoms, 0 to 20 nitrogen atoms, and 0 to 100 oxygen atoms. An atom, one to 400 hydrogen atoms and 0 to 40 sulfur atoms are formed. Further, in the case where the adsorption site itself can constitute a monovalent substituent, the adsorption site itself can also be a monovalent substituent represented by A 1 .

上述「酸基」例如可列舉羧酸基、磺酸基、單硫酸酯基、磷酸基、單磷酸酯基、硼酸基作為較佳例,更佳為羧酸基、磺酸 基、單硫酸酯基、磷酸基、單磷酸酯基,進而佳為羧酸基、磺酸基、磷酸基,尤佳為羧酸基。 Examples of the above-mentioned "acid group" include a carboxylic acid group, a sulfonic acid group, a monosulfate group, a phosphoric acid group, a monophosphate group, and a boric acid group, and a carboxylic acid group or a sulfonic acid group is more preferred. The group, the monosulfate group, the phosphoric acid group, the monophosphate group, and further preferably a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, and more preferably a carboxylic acid group.

上述「脲基」例如可列舉-NR15CONR16R17(此處,R15、 R16及R17分別獨立地表示氫原子、碳數1~20的烷基、碳數6以上的芳基或碳數7以上的芳烷基)作為較佳例,更佳為-NR15CONHR17(此處,R15及R17分別獨立地表示氫原子或碳數1~10的烷基、碳數6以上的芳基、碳數7以上的芳烷基),尤佳為-NHCONHR17(此處,R17表示氫原子或碳數1~10的烷基、碳數6以上的芳基、碳數7以上的芳烷基)。 Examples of the "ureido group" include -NR 15 CONR 16 R 17 (wherein, R 15 , R 16 and R 17 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or an aryl group having 6 or more carbon atoms). Or an aralkyl group having a carbon number of 7 or more is more preferably -NR 15 CONHR 17 (wherein, R 15 and R 17 each independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, carbon number 6 or more aryl groups and aralkyl groups having 7 or more carbon atoms are particularly preferably -NHCONHR 17 (wherein R 17 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 or more carbon atoms, or carbon). Number 7 or more of aralkyl groups).

上述「胺基甲酸酯基」例如可列舉-NHCOOR18、 -NR19COOR20、-OCONHR21、-OCONR22R23(此處,R18、R19、R20、R21、R22及R23分別獨立地表示碳數1~20的烷基、碳數6以上的芳基、碳數7以上的芳烷基)等作為較佳例,更佳為-NHCOOR18、-OCONHR21(此處,R18、R21分別獨立地表示碳數1~20的烷基、碳數6以上的芳基、碳數7以上的芳烷基)等,尤佳為-NHCOOR18、-OCONHR21(此處,R18、R21分別獨立地表示碳數1~10的烷基、碳數6以上的芳基、碳數7以上的芳烷基)等。 Examples of the above-mentioned "urethane group" include -NHCOOR 18 , -NR 19 COOR 20 , -OCONHR 21 , and -OCONR 22 R 23 (here, R 18 , R 19 , R 20 , R 21 , R 22 and R 23 each independently represents an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, or an aralkyl group having 7 or more carbon atoms, and the like, and more preferably -NHCOOR 18 or -OCONHR 21 (this) Wherein R 18 and R 21 each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, an aralkyl group having 7 or more carbon atoms, and the like, and particularly preferably -NHCOOR 18 or -OCONHR 21 ( Here, R 18 and R 21 each independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms.

上述「含配位性氧原子的基團」例如可列舉乙醯丙酮 基、冠醚基等。 The above "coordinating oxygen atom-containing group" is exemplified by acetonitrile acetone. Base, crown ether group, etc.

另外,上述「含鹼性氮原子的基團」例如可列舉胺基 (-NH2)、取代亞胺基(-NHR8、-NR9R10,此處,R8、R9及R10分別獨立地表示碳數1~20的烷基、碳數6以上的芳基、碳數7以 上的芳烷基)、下述式(a1)所表示的胍基、下述式(a2)所表示的脒基等作為較佳例。 Further, examples of the "basic group containing a basic nitrogen atom" include an amine group (-NH 2 ) and a substituted imido group (-NHR 8 , -NR 9 R 10 , here, R 8 , R 9 and R 10 Each of the alkyl group having 1 to 20 carbon atoms, the aryl group having 6 or more carbon atoms, and the aralkyl group having 7 or more carbon atoms, and the fluorenyl group represented by the following formula (a1), and the following formula (a2) A thiol group or the like is shown as a preferred example.

式(a1)中,R11及R12分別獨立地表示碳數1~20的烷基、碳數6以上的芳基、碳數7以上的芳烷基。 In the formula (a1), R 11 and R 12 each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms.

式(a2)中,R13及R14分別獨立地表示碳數1~20的烷基、碳數6以上的芳基、碳數7以上的芳烷基。 In the formula (a2), R 13 and R 14 each independently represent an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms.

該些基團中,更佳為胺基(-NH2)、取代胺基(-NHR8、-NR9R10,此處,R8、R9及R10分別獨立地表示碳數1~10的烷基、苯基、苄基)、上述式(a1)所表示的胍基[式(a1)中,R11及R12分別獨立地表示碳數1~10的烷基、苯基、苄基]、上述式(a2)所表示的脒基[式(a2)中,R13及R14分別獨立地表示碳數1~10的烷基、苯基、苄基]等。 More preferably, these groups are an amine group (-NH 2 ) or a substituted amine group (-NHR 8 , -NR 9 R 10 , where R 8 , R 9 and R 10 each independently represent a carbon number of 1~ 10 alkyl group, phenyl group, benzyl group), fluorenyl group represented by the above formula (a1). In the formula (a1), R 11 and R 12 each independently represent an alkyl group having 1 to 10 carbon atoms, a phenyl group, and Benzyl], a fluorenyl group represented by the above formula (a2): In the formula (a2), R 13 and R 14 each independently represent an alkyl group having 1 to 10 carbon atoms, a phenyl group or a benzyl group, and the like.

尤其可較佳地使用胺基(-NH2)、取代亞胺基(-NHR8、-NR9R10,此處,R8、R9及R10分別獨立地表示碳數1~5的烷基、苯基、苄基)、上述式(a1)所表示的胍基[式(a1)中,R11及R12分別獨立地表示碳數1~5的烷基、苯基、苄基]、上述式(a2)所表示的脒基[式(a2)中,R13及R14分別獨立地表示碳數1~5的 烷基、苯基、苄基]等。 In particular, an amine group (-NH 2 ) or a substituted imido group (-NHR 8 , -NR 9 R 10 may be preferably used, wherein R 8 , R 9 and R 10 each independently represent a carbon number of 1 to 5; An alkyl group, a phenyl group, a benzyl group, and a fluorenyl group represented by the above formula (a1). In the formula (a1), R 11 and R 12 each independently represent an alkyl group having 1 to 5 carbon atoms, a phenyl group, and a benzyl group. In the formula (a2), R 13 and R 14 each independently represent an alkyl group having 1 to 5 carbon atoms, a phenyl group or a benzyl group, and the like.

上述「烷氧基羰基」中的烷基部分較佳為碳數1~20的烷基,例如可列舉甲基、乙基等。 The alkyl group in the above "alkoxycarbonyl group" is preferably an alkyl group having 1 to 20 carbon atoms, and examples thereof include a methyl group and an ethyl group.

上述「烷基胺基羰基」中的烷基部分較佳為碳數1~20的烷基,例如可列舉甲基、乙基、丙基等。 The alkyl group in the above "alkylaminocarbonyl group" is preferably an alkyl group having 1 to 20 carbon atoms, and examples thereof include a methyl group, an ethyl group, and a propyl group.

上述「羧酸鹽基」可列舉包含羧酸的銨鹽的基團等。 The "carboxylate group" may, for example, be a group containing an ammonium salt of a carboxylic acid.

作為上述「磺醯胺基」,鍵結於氮原子上的氫原子可經烷基(甲基等)、醯基(乙醯基、三氟乙醯基等)等所取代。 As the above "sulfonylamino group", a hydrogen atom bonded to a nitrogen atom may be substituted with an alkyl group (methyl group, etc.), a mercapto group (ethyl fluorenyl group, a trifluoroethenyl group or the like).

上述「雜環結構」例如可列舉以下結構作為較佳例:噻吩、呋喃、二苯并哌喃、吡咯、吡咯啉、吡咯啶、二氧戊環(dioxolane)、吡唑、吡唑啉、吡唑啶、咪唑、噁唑、噻唑、噁二唑、三唑、噻二唑、吡喃、吡啶、哌啶、二噁烷、嗎啉、噠嗪、嘧啶、哌嗪、三嗪、三噻烷(trithiane)、異吲哚啉、異吲哚啉酮、苯并咪唑酮、苯并噻唑,琥珀醯亞胺、鄰苯二甲醯亞胺、萘二甲醯亞胺等醯亞胺基,乙內醯脲(hydantoin)、吲哚、喹啉、咔唑、吖啶、吖啶酮、蒽醌。 The above-mentioned "heterocyclic structure" is exemplified by the following structures: thiophene, furan, dibenzopyran, pyrrole, pyrroline, pyrrolidine, dioxolane, pyrazole, pyrazoline, pyridyl Zolidine, imidazole, oxazole, thiazole, oxadiazole, triazole, thiadiazole, pyran, pyridine, piperidine, dioxane, morpholine, pyridazine, pyrimidine, piperazine, triazine, trithiane (trithiane), isoporphyrin, isoindolinone, benzimidazolone, benzothiazole, amber imine, phthalimide, naphthyl imine, etc. Hydantoin, guanidine, quinoline, carbazole, acridine, acridone, hydrazine.

再者,上述「雜環結構」亦可更具有取代基,該取代基例如可列舉:甲基、乙基等碳數1~20的烷基,苯基、萘基等碳數6~16的芳基,羥基,胺基,羧基,磺醯胺基,N-磺醯基醯胺基,乙醯氧基等碳數1~6的醯氧基,甲氧基、乙氧基等碳數1~20的烷氧基,氯、溴等鹵素原子,甲氧基羰基、乙氧基羰基、環己氧基羰基等碳數2~7的烷氧基羰基,氰基,碳酸第三丁酯等碳 酸酯基等。 Further, the above-mentioned "heterocyclic structure" may further have a substituent. Examples of the substituent include an alkyl group having 1 to 20 carbon atoms such as a methyl group and an ethyl group, and a carbon number of 6 to 16 such as a phenyl group or a naphthyl group. An aryl group, a hydroxyl group, an amine group, a carboxyl group, a sulfonylamino group, an N-sulfonyl decylamino group, an ethoxy group, a methoxy group having 1 to 6 carbon atoms, a methoxy group, an ethoxy group, etc. ~20 alkoxy group, halogen atom such as chlorine or bromine; alkoxycarbonyl group having a carbon number of 2 to 7 such as a methoxycarbonyl group, an ethoxycarbonyl group or a cyclohexyloxycarbonyl group; a cyano group; a third butyl carbonate; carbon Acid ester group and the like.

上述「烷氧基矽烷基」可為單烷氧基矽烷基、二烷氧基矽烷基、三烷氧基矽烷基的任一種,較佳為三烷氧基矽烷基,例如可列舉三甲氧基矽烷基、三乙氧基矽烷基等。 The above "alkoxyalkylene group" may be any of a monoalkoxyalkyl group, a dialkoxyalkyl group or a trialkoxyalkyl group, and is preferably a trialkoxyalkyl group. For example, a trimethoxy group may be mentioned. A decyl group, a triethoxy decyl group, and the like.

上述「環氧基」可列舉經取代或未經取代的氧雜環丙烷基(環氧乙烷基)。 The above "epoxy group" may, for example, be a substituted or unsubstituted oxiranyl group (oxiranyl group).

於本說明書中,關於以化合物的取代基或連結基的選項為首的溫度、厚度等各技術事項,即便其列表(list)已分別獨立地記載,亦可相互組合。 In the present specification, each of the technical matters such as the temperature and the thickness including the option of the substituent or the linking group of the compound may be combined with each other even if the list is independently described.

與上述吸附部位鍵結的連結基較佳為單鍵或由1個~100個碳原子、0個~10個氮原子、0個~50個氧原子、1個~200個氫原子及0個~20個硫原子所形成的連結基,該有機連結基可未經取代亦可更具有取代基。 The linking group bonded to the above adsorption site is preferably a single bond or consists of 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 a linking group formed by ~20 sulfur atoms, which may be unsubstituted or more substituted.

上述中,上述A1較佳為一價取代基,該一價取代基具有至少一種選自由酸基、脲基、胺基甲酸酯基、磺醯胺基、醯亞胺基及含配位性氧原子的基團所組成的組群中的基團。 In the above, the above A 1 is preferably a monovalent substituent having at least one selected from the group consisting of an acid group, a urea group, an urethane group, a sulfonamide group, a quinone group, and a coordination group. A group in a group consisting of groups of oxygen atoms.

尤其就與高折射率粒子良好地相互作用、提高折射率、且降低組成物的黏度的觀點而言,A1更佳為具有至少一種pKa為5~14的官能基的一價取代基。 In particular, from the viewpoint of well interacting with the high refractive index particles, increasing the refractive index, and lowering the viscosity of the composition, A 1 is more preferably a monovalent substituent having at least one functional group having a pKa of 5 to 14.

此處所謂「pKa」,與後述所定義者為相同含意。 Here, "pKa" is the same as that defined later.

上述pKa為5~14的官能基可列舉:脲基、胺基甲酸酯基、磺醯胺基、醯亞胺基或含配位性氧原子的基團。 The functional group having a pKa of 5 to 14 may, for example, be a ureido group, a urethane group, a sulfonylamino group, a quinone imine group or a group containing a coordinating oxygen atom.

具體而言,例如可列舉:脲基(pKa為12~14左右)、胺基甲酸酯基(pKa為11~13左右)、作為配位性氧原子的-COCH2CO-(pKa為8~10左右)、磺醯胺基(pKa為9~11左右)等。 Specific examples thereof include a urea group (pKa of about 12 to 14), a urethane group (pKa of about 11 to 13), and a COCO 2 CO- (a pKa of 8 as a coordinating oxygen atom). ~10 or so), sulfonamide group (pKa is about 9 to 11) and the like.

上述A1較佳為由下述式(A4)所表示的一價取代基所表示。 The above A 1 is preferably represented by a monovalent substituent represented by the following formula (A4).

上述式(A4)中,B1表示上述吸附部位(即,酸基、 脲基、胺基甲酸酯基、含配位性氧原子的基團、含鹼性氮原子的基團、烷氧基羰基、烷基胺基羰基、羧酸鹽基、磺醯胺基、雜環基、烷氧基矽烷基、環氧基、異氰酸基或羥基),R24表示單鍵或(a+1)價的連結基。a表示1~10的整數,於式(A4)中存在a個的B1可相同亦可不同。 In the above formula (A4), B 1 represents the above-mentioned adsorption site (i.e., an acid group, a urea group, a urethane group, a group containing a coordinating oxygen atom, a group containing a basic nitrogen atom, an alkoxy group). Alkylcarbonyl, alkylaminocarbonyl, carboxylate, sulfonylamino, heterocyclyl, alkoxyalkyl, epoxy, isocyanate or hydroxy), R 24 represents a single bond or (a+ 1) The linkage of the price. a represents an integer of 1 to 10, in the presence of a plurality of B in the formula (A4) 1 may be identical or different.

上述B1所表示的吸附部位可列舉與構成上述式(A1) 的A1的吸附部位相同的吸附部位,較佳例亦相同。 The adsorption site represented by the above B 1 may be the same adsorption site as the adsorption site of A 1 constituting the above formula (A1), and preferred examples are also the same.

其中,較佳為酸基、脲基、胺基甲酸酯基、磺醯胺基、醯亞胺基或含配位性氧原子的基團,更佳為pKa為5~14的官能基,就此觀點而言,更佳為脲基、胺基甲酸酯基、磺醯胺基、醯亞胺基或含配位性氧原子的基團。 Among them, an acid group, a urea group, a urethane group, a sulfonylamino group, a quinone imine group or a group having a coordinating oxygen atom is preferred, and a functional group having a pKa of 5 to 14 is more preferred. From this point of view, a ureido group, a urethane group, a sulfonylamino group, a quinone imine group or a group containing a coordinating oxygen atom is more preferable.

R24表示單鍵或(a+1)價的連結基,a表示1~10。較佳為a為1~7,更佳為a為1~5,尤佳為a為1~3。 R 24 represents a single bond or a (a+1)-valent linking group, and a represents 1 to 10. Preferably, a is 1 to 7, more preferably a is 1 to 5, and particularly preferably a is 1 to 3.

(a+1)價的連結基包含由1個~100個碳原子、0個~10個氮原子、0個~50個氧原子、1個~200個氫原子及0個~20個硫原子所形成的基團,可未經取代亦可更具有取代基。以下,將該連結基定義為連結基LA。 The (a+1)-valent linking group includes from 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 sulfur atoms. The group formed may be unsubstituted or more substituted. Hereinafter, this linking group is defined as a linking group LA.

連結基LA較佳為單鍵或由1個~50個碳原子、0個~8 個氮原子、0個~25個氧原子、1個~100個氫原子及0個~10個硫原子所形成的(a+1)價的連結基,更佳為單鍵或由1個~30個碳原子、0個~6個氮原子、0個~15個氧原子、1個~50個氫原子及0個~7個硫原子所形成的(a+1)價的連結基,尤佳為單鍵或由1個~10個碳原子、0個~5個氮原子、0個~10個氧原子、1個~30個氫原子及0個~5個硫原子所形成的(a+1)價的連結基。 The linking group LA is preferably a single bond or from 1 to 50 carbon atoms, 0 to 8 (a+1)-valent linking group formed by a nitrogen atom, 0 to 25 oxygen atoms, 1 to 100 hydrogen atoms, and 0 to 10 sulfur atoms, more preferably a single bond or one by one (a+1) valence linkage formed by 30 carbon atoms, 0 to 6 nitrogen atoms, 0 to 15 oxygen atoms, 1 to 50 hydrogen atoms, and 0 to 7 sulfur atoms. Preferably, it is a single bond or consists of 1 to 10 carbon atoms, 0 to 5 nitrogen atoms, 0 to 10 oxygen atoms, 1 to 30 hydrogen atoms, and 0 to 5 sulfur atoms. +1) the link of the price.

作為連結基LA,於上述基團中(a+1)價的連結基具有 取代基的情形時,該取代基例如可列舉:甲基、乙基等碳數1~20的烷基,苯基、萘基等碳數6~16的芳基,羥基,胺基,羧基,磺醯胺基,N-磺醯基醯胺基,乙醯氧基等碳數1~6的醯氧基,甲氧基、乙氧基等碳數1~6的烷氧基,氯、溴等鹵素原子,甲氧基羰基、乙氧基羰基、環己氧基羰基等碳數2~7的烷氧基羰基,氰基、碳酸第三丁酯等碳酸酯基等。 As the linking group LA, the (a+1)-valent linking group in the above group has In the case of a substituent, examples of the substituent include an alkyl group having 1 to 20 carbon atoms such as a methyl group and an ethyl group, an aryl group having 6 to 16 carbon atoms such as a phenyl group or a naphthyl group, a hydroxyl group, an amine group and a carboxyl group. Sulfhydryl group, N-sulfonyl decylamino group, ethoxycarbonyl group, etc. having 1 to 6 carbon atoms, alkoxy group such as methoxy group and ethoxy group, alkoxy group having 1 to 6 carbon atoms, chlorine and bromine Examples thereof include a halogen atom, a oxycarbonyl group having 2 to 7 carbon atoms such as a methoxycarbonyl group, an ethoxycarbonyl group or a cyclohexyloxycarbonyl group, and a carbonate group such as a cyano group or a tert-butyl carbonate.

.R2 . R 2

R2表示單鍵或二價連結基。n個R2可相同亦可不同。連結基可列舉上述連結基LA的例子(其中,價數為二價)。 R 2 represents a single bond or a divalent linking group. The n R 2 's may be the same or different. Examples of the linking group include the above-described linking group LA (wherein the valence is divalent).

.R1 . R 1

R1表示(m+n)價的連結基。m+n滿足3~10。上述R1所表示的(m+n)價的連結基可列舉由1個~100個碳原子、0個~10個氮原子、0個~50個氧原子、1個~200個氫原子及0個~20個硫原子所形成的基團(稱為連結基LB)。其中,較佳為由1個~60個碳原子、0個~10個氮原子、0個~50個氧原子、1個~100個氫原子及0個~20個硫原子所形成的基團。上述連結基亦可具有取代基,該取代基可列舉上述取代基LA可具有的取代基。上述R1所表示的(m+n)價的連結基的具體例可列舉:日本專利特開2007-277514(日本專利特願2006-269707)的[0082]、[0083]欄中揭示的具體例(1)~具體例(17)。 R 1 represents a (m + n) valent linking group. m+n satisfies 3~10. The (m+n)-valent linking group represented by R 1 above may be one to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, and 1 to 200 hydrogen atoms. A group formed by 0 to 20 sulfur atoms (referred to as a linking group LB). Among them, a group formed by 1 to 60 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 100 hydrogen atoms, and 0 to 20 sulfur atoms is preferred. . The linking group may have a substituent, and examples of the substituent include a substituent which the substituent LA may have. Specific examples of the (m+n)-valent linking group represented by the above R 1 include specific examples disclosed in the columns [0082] and [0083] of JP-A-2007-277514 (Japanese Patent Application No. 2006-269707). Example (1) to specific example (17).

以下示出上述R1所表示的(m+n)價的連結基的具體例。然而,本發明中,不限制於該些具體例。 Specific examples of the (m+n)-valent linking group represented by the above R 1 are shown below. However, the present invention is not limited to these specific examples.

[化6] [Chemical 6]

.m . m

m表示8以下的正數。m較佳為0.5~5,更佳為1~4,尤佳為1~3。 m represents a positive number of 8 or less. m is preferably from 0.5 to 5, more preferably from 1 to 4, and particularly preferably from 1 to 3.

.n . n

n表示1~9。n較佳為2~8,更佳為2~7,尤佳為3~6。 n means 1~9. n is preferably 2 to 8, more preferably 2 to 7, and particularly preferably 3 to 6.

.P1 . P 1

P1表示聚合物鏈,可自公知的聚合物等中根據目的等而選擇。m個P1可相同亦可不同。聚合物中,構成聚合物鏈時,較佳為選自由乙烯系單體的聚合物或共聚物、酯系聚合物、醚系聚合物、胺基甲酸酯系聚合物、醯胺系聚合物、環氧系聚合物、矽酮系聚合物及該些聚合物的改質物或共聚物[例如包括聚醚/聚胺基甲酸酯共聚物、聚醚/乙烯系單體的聚合物的共聚物等(可為無規共聚物、嵌段共聚物、接枝共聚物的任一種)]所組成的組群中的至少一種,更佳為選自由乙烯系單體的聚合物或共聚物、酯系聚合物、醚系聚合物、胺基甲酸酯系聚合物及該些聚合物的改質物或共聚物所組成的組群中的至少一種,尤佳為乙烯系單體的聚合物或共聚物。 P 1 represents a polymer chain, and can be selected from known polymers or the like according to the purpose and the like. m P 1 may be the same or different. In the polymer, when the polymer chain is formed, it is preferably a polymer or copolymer selected from a vinyl monomer, an ester polymer, an ether polymer, a urethane polymer, or a guanamine polymer. , an epoxy-based polymer, an anthrone-based polymer, and a modified or copolymer of the polymers [for example, copolymerization of a polymer including a polyether/polyurethane copolymer, a polyether/vinyl monomer) At least one of the group consisting of a substance (which may be any of a random copolymer, a block copolymer, and a graft copolymer) is more preferably selected from a polymer or copolymer of a vinyl monomer. At least one of a group consisting of an ester polymer, an ether polymer, a urethane polymer, and a modified or copolymer of the polymers, particularly preferably a polymer of a vinyl monomer or Copolymer.

聚合物鏈P1較佳為含有至少一種重複單元。就發揮立體 排斥力而提高分散性的觀點而言,聚合物鏈P1中的上述至少一種重複單元的重複數k較佳為3以上,更佳為5以上。另外,就抑制分散劑的大體積、使高折射率粒子密集地存在於白色硬化膜中的觀點而言,上述至少一種重複單元的重複單元數k較佳為50以下,更佳為40以下,進而佳為30以下。再者,上述聚合物鏈較佳為可溶於有機溶劑中。若與有機溶劑的親和性低,則與分散介質的親和性變弱,有時無法確保對於分散穩定化而言充分的吸附 層。 The polymer chain P 1 preferably contains at least one repeating unit. The number k of repetitions of the at least one repeating unit in the polymer chain P 1 is preferably 3 or more, and more preferably 5 or more, from the viewpoint of exerting a steric repulsive force and improving dispersibility. Further, from the viewpoint of suppressing the large volume of the dispersant and causing the high refractive index particles to be densely present in the white cured film, the number k of repeating units of the at least one repeating unit is preferably 50 or less, more preferably 40 or less. Further, it is preferably 30 or less. Further, the above polymer chain is preferably soluble in an organic solvent. When the affinity with an organic solvent is low, affinity with a dispersion medium becomes weak, and the adsorption layer which is sufficient for dispersion stabilization may not be ensured.

上述式(A1)所表示的分散劑中,較佳為下述式(A2)所表示的分散劑。 Among the dispersants represented by the above formula (A1), a dispersant represented by the following formula (A2) is preferred.

A2與上述A1為相同含意。 A 2 has the same meaning as A 1 above.

R4、R5分別獨立地表示單鍵或二價連結基。n個R4可相同亦可不同。另外,m個R5可相同亦可不同。R4、R5所表示的二價連結基可使用與作為上述式(A1)的R2所表示的二價連結基而列舉的基團相同的基團,較佳態樣亦相同。 R 4 and R 5 each independently represent a single bond or a divalent linking group. The n R 4 's may be the same or different. In addition, m R 5 's may be the same or different. The divalent linking group represented by R 4 and R 5 may be the same as those exemplified as the divalent linking group represented by R 2 of the above formula (A1), and the preferred embodiment is also the same.

R3為含意與上述R1相同的連結基。 R 3 is a linking group having the same meaning as the above R 1 .

m、n與上述式(A1)相同。 m and n are the same as the above formula (A1).

P2與上述P1為相同含意。 P 2 has the same meaning as the above P 1 .

上述式(A2)所表示的分散劑中,最佳為滿足以下所示的R3、R4、R5、P2、m及n全部的分散劑。 Among the dispersants represented by the above formula (A2), a dispersant which satisfies all of R 3 , R 4 , R 5 , P 2 , m and n shown below is preferable.

R3:上述具體例(1)、具體例(2)、具體例(10)、具體例(11)、具體例(16)或具體例(17) R 3 : the above specific example (1), specific example (2), specific example (10), specific example (11), specific example (16) or specific example (17)

R4:單鍵、或者下述結構單元或將該結構單元組合而構成的由「1個~10個碳原子、0個~5個氮原子、0個~10個氧原子、 1個~30個氫原子及0個~5個硫原子」所形成的二價連結基(亦可具有取代基,該取代基例如可列舉:甲基、乙基等碳數1~20的烷基,苯基、萘基等碳數6~16的芳基,羥基,胺基,羧基,磺醯胺基,N-磺醯基醯胺基,乙醯氧基等碳數1~6的醯氧基,甲氧基、乙氧基等碳數1~6的烷氧基,氯、溴等鹵素原子,甲氧基羰基、乙氧基羰基、環己氧基羰基等碳數2~7的烷氧基羰基,氰基,碳酸第三丁酯等碳酸酯基等) R 4 : a single bond, or the following structural unit or a combination of the structural units: "1 to 10 carbon atoms, 0 to 5 nitrogen atoms, 0 to 10 oxygen atoms, 1 to 30" A divalent linking group formed by a hydrogen atom and 0 to 5 sulfur atoms (may also have a substituent, and examples of the substituent include an alkyl group having 1 to 20 carbon atoms such as a methyl group or an ethyl group, and a phenyl group; a naphthyl group having 6 to 16 carbon atoms such as a aryl group, a hydroxyl group, an amine group, a carboxyl group, a sulfonylamino group, an N-sulfonyl decylamino group, an ethoxy group, and the like, and a decyloxy group having 1 to 6 carbon atoms. Alkoxy group having 1 to 6 carbon atoms such as an oxy group or an ethoxy group; a halogen atom such as chlorine or bromine; and an alkoxycarbonyl group having 2 to 7 carbon atoms such as a methoxycarbonyl group, an ethoxycarbonyl group or a cyclohexyloxycarbonyl group; , cyano group, carbonate ester such as tributyl carbonate, etc.)

R5:單鍵、伸乙基、伸丙基、下述基團(a)或下述基團(b) R 5 : single bond, ethyl group, propyl group, the following group (a) or the following group (b)

再者,下述基團中,R12表示氫原子或甲基,l表示1或2。 Further, in the following groups, R 12 represents a hydrogen atom or a methyl group, and 1 represents 1 or 2.

[化10] [化10]

P2:乙烯系單體的聚合物或共聚物、酯系聚合物、醚系聚合物、胺基甲酸酯系聚合物及該些聚合物的改質物 P 2 : a polymer or copolymer of a vinyl monomer, an ester polymer, an ether polymer, a urethane polymer, and a modified product of the polymers

m:1~3 m:1~3

n:3~6 n: 3~6

上述特定分散樹脂A的酸值並無特別限制,就分散性的觀點而言,酸值較佳為400mgKOH/g以下,更佳為300mgKOH/g以下,尤佳為250mgKOH/g以下。再者,酸值的下限值並無特別限制,就高折射率粒子的分散穩定性的觀點而言,較佳為5mgKOH/g以上,更佳為10mgKOH/g以上。此處,上述特定分散樹脂A的酸值為固體成分酸值。上述特定分散樹脂A的酸值例如可根據上述特定分散樹脂A中的酸基的平均含量來算出。 The acid value of the specific dispersion resin A is not particularly limited, and from the viewpoint of dispersibility, the acid value is preferably 400 mgKOH/g or less, more preferably 300 mgKOH/g or less, and particularly preferably 250 mgKOH/g or less. In addition, the lower limit of the acid value is not particularly limited, and is preferably 5 mgKOH/g or more, and more preferably 10 mgKOH/g or more from the viewpoint of dispersion stability of the high refractive index particles. Here, the acid value of the specific dispersion resin A is a solid component acid value. The acid value of the specific dispersion resin A can be calculated, for example, from the average content of the acid groups in the specific dispersion resin A described above.

上述特定分散樹脂A的分子量以重量平均分子量計,較佳為1000~50000,更佳為3000~30000,尤佳為3000~20000。若重量平均分子量為上述範圍內,則可充分發揮導入至聚合物的末端的多個上述吸附部位的效果,可發揮對二氧化鈦粒子表面的吸附性優異的性能。分子量的測定方法是依據後述定義的凝膠滲透層析法(Gel Permeation Chromatography,GPC)的條件。 The molecular weight of the specific dispersion resin A is preferably from 1,000 to 50,000, more preferably from 3,000 to 30,000, still more preferably from 3,000 to 20,000, based on the weight average molecular weight. When the weight average molecular weight is within the above range, the effect of introducing a plurality of the adsorption sites introduced into the terminal of the polymer can be sufficiently exhibited, and the property of exhibiting excellent adhesion to the surface of the titanium oxide particles can be exhibited. The method for measuring the molecular weight is based on the conditions of Gel Permeation Chromatography (GPC) as defined later.

上述特定分散樹脂A並無特別限制,可依據日本專利特 開2007-277514號公報段落0114~段落0140及段落0266~段落0348中記載的合成方法來合成。 The above specific dispersion resin A is not particularly limited and may be based on Japanese patents. The synthesis method described in paragraphs 0114 to 0140 and paragraphs 0266 to 0348 of No. 2007-277514 is synthesized.

.特定分散樹脂B . Specific dispersion resin B

高折射率粒子分散用分散劑較佳為使用在主鏈及側鏈的至少一個上含有氮原子的寡亞胺系分散劑。寡亞胺系分散劑較佳為分散樹脂(以下適當稱為「特定分散樹脂(B)」),該分散樹脂含有具有部分結構X(該部分結構X具有pKa為14以下的官能基)的重複單元、及含有原子數為40~10,000的側鏈Y的側鏈,且於主鏈及側鏈的至少一個上含有鹼性氮原子。此處,所謂鹼性氮原子,只要為呈鹼性的氮原子,則並無特別限制。 The dispersing agent for dispersing the high refractive index particles is preferably an oligoimine-based dispersing agent containing a nitrogen atom in at least one of the main chain and the side chain. The oligoimine-based dispersant is preferably a dispersion resin (hereinafter referred to as "specific dispersion resin (B)" as appropriate), and the dispersion resin contains a repeat having a partial structure X (the partial structure X has a pKa of 14 or less) The unit and the side chain containing the side chain Y having an atomic number of 40 to 10,000 contain a basic nitrogen atom in at least one of the main chain and the side chain. Here, the basic nitrogen atom is not particularly limited as long as it is a basic nitrogen atom.

特定樹脂(B)亦可具有與上述部分結構X等成對的部分結構W,部分結構W較佳為具有pKb為14以下的氮原子的結構部,更佳為含有具有pKb為10以下的氮原子的結構。所謂鹼強度pKb,是指水溫25℃下的pKb,是用以定量地表示鹼的強度的指標之一,與鹼度常數(basicity constant)為相同含意。鹼強度pKb與後述酸強度pKa有pKb=14-pKa的關係。再者,於部分結構X與部分結構W成對而形成鹽結構時,設想分別解離的結構,以質子(H+)或氫氧化物離子(OH-)離子鍵結於該些結構的化合物的形式來評價其pKa及pKb。關於部分結構X,將進一步於下文中加以詳細說明。 The specific resin (B) may have a partial structure W which is paired with the partial structure X or the like, and the partial structure W is preferably a structural portion having a nitrogen atom having a pKb of 14 or less, and more preferably a nitrogen having a pKb of 10 or less. The structure of the atom. The alkali strength pKb is one of the indexes for quantitatively indicating the strength of the alkali, and is the same as the basicity constant. The alkali strength pKb has a relationship of pKb = 1 - pKa with respect to the acid strength pKa described later. Further, when the partial structure X and the partial structure W are paired to form a salt structure, it is assumed that the respectively dissociated structure is bonded to the compound of the structures by proton (H + ) or hydroxide ion (OH - ) ions. Form to evaluate its pKa and pKb. The partial structure X will be further described in detail below.

關於部分結構X,其較佳範圍的詳細情況與下文將述的 部分結構X為相同含意。另外,關於上述側鏈Y,亦同樣地其較佳範圍的詳細情況與下文將述的側鏈Y為相同含意。上述W較佳為側鏈Y的連結部解離而成為離子鍵結性的部位的結構。 Regarding the partial structure X, the details of its preferred range are as will be described below. Part of the structure X is the same meaning. Further, the details of the preferred range of the above-mentioned side chain Y are the same as those of the side chain Y which will be described later. The above W is preferably a structure in which the connecting portion of the side chain Y is dissociated to become an ion-bonding portion.

特定分散樹脂(B)的一例可列舉下述式[B]所表示的樹脂。 An example of the specific dispersion resin (B) is a resin represented by the following formula [B].

上述式中,x、y及z分別表示重複單元的聚合莫耳比,較佳為x為5~50、y為5~60且z為10~90。l表示聚酯鏈的連結數,為可形成原子數為40~10,000的側鏈的整數,l較佳為5~100,000,更佳為20~20,000,進而佳為40~2,000。由式中的x規定共聚合比的重複單元為部分結構X,由式中的z規定共聚合比的重複單元為部分結構Y。 In the above formula, x, y and z respectively represent the polymerization molar ratio of the repeating unit, and preferably x is 5 to 50, y is 5 to 60, and z is 10 to 90. l represents the number of bonds of the polyester chain, and is an integer which can form a side chain having an atomic number of 40 to 10,000, and l is preferably 5 to 100,000, more preferably 20 to 20,000, and still more preferably 40 to 2,000. The repeating unit in which the copolymerization ratio is defined by x in the formula is a partial structure X, and the repeating unit in which the copolymerization ratio is defined by z in the formula is a partial structure Y.

特定分散樹脂(B)尤佳為含有重複單元(i)及含有原子數為40~10,000的側鏈Y的側鏈(ii)的分散樹脂(以下適當稱為「特定分散樹脂(B1)」),上述重複單元(i)為(i)選自聚(低級伸烷基亞胺)系重複單元、聚烯丙基胺系重複單元、聚二烯丙基 胺系重複單元、間二甲苯二胺-表氯醇聚縮合物系重複單元及聚乙烯基胺系重複單元中的至少一種含有鹼性氮原子的重複單元,且具有鍵結於上述鹼性氮原子且具有pKa為14以下的官能基的部分結構X。 The specific dispersion resin (B) is preferably a dispersion resin containing a repeating unit (i) and a side chain (ii) having a side chain Y having an atomic number of 40 to 10,000 (hereinafter referred to as "specific dispersion resin (B1)"). The above repeating unit (i) is (i) selected from a poly(lower alkylene imine) repeating unit, a polyallylamine repeating unit, a polydiallyl group At least one of an amine repeating unit, a meta-xylenediamine-epichlorohydrin polycondensate repeating unit, and a polyvinylamine repeating unit containing a basic nitrogen atom and having a bond to the basic nitrogen A partial structure X having an atom and having a functional group having a pKa of 14 or less.

特定分散樹脂(B1)含有上述重複單元(i)。藉此,分散樹脂對粒子表面的吸附力提高,且可減少粒子間的相互作用。聚(低級伸烷基亞胺)可為鏈狀亦可為網狀。此處,所謂低級伸烷基亞胺,是指含有碳數1~5的伸烷基鏈的伸烷基亞胺。上述重複單元(i)較佳為形成特定分散樹脂的主鏈部。該主鏈部的數量平均分子量、即自特定分散樹脂(B1)中去掉含有上述側鏈Y部分的側鏈所得的部分的數量平均分子量較佳為100~10,000,更佳為200~5,000,最佳為300~2,000。主鏈部的數量平均分子量可藉由利用GPC法的聚苯乙烯換算值來測定。 The specific dispersion resin (B1) contains the above repeating unit (i). Thereby, the adsorption force of the dispersion resin on the particle surface is improved, and the interaction between the particles can be reduced. The poly(lower alkylene imide) may be in the form of a chain or a network. Here, the lower alkylene imine refers to an alkyleneimine having an alkylene chain having 1 to 5 carbon atoms. The above repeating unit (i) is preferably a main chain portion forming a specific dispersion resin. The number average molecular weight of the main chain portion, that is, the portion obtained by removing the side chain containing the side chain Y moiety from the specific dispersion resin (B1), preferably has a number average molecular weight of 100 to 10,000, more preferably 200 to 5,000, most Good for 300~2,000. The number average molecular weight of the main chain portion can be measured by a polystyrene equivalent value by a GPC method.

特定分散樹脂(B1)較佳為含有下述式(I-1)所表示的重複單元及式(I-2)所表示的重複單元、或式(I-1)所表示的重複單元及式(I-2a)所表示的重複單元的分散樹脂。 The specific dispersion resin (B1) preferably contains a repeating unit represented by the following formula (I-1), a repeating unit represented by the formula (I-2), or a repeating unit represented by the formula (I-1). The dispersion resin of the repeating unit represented by (I-2a).

R1及R2分別獨立地表示氫原子、鹵素原子或烷基(較佳為碳數1~6)。a分別獨立地表示1~5的整數。*表示重複單元間的連結部。 R 1 and R 2 each independently represent a hydrogen atom, a halogen atom or an alkyl group (preferably, carbon number 1 to 6). a independently represents an integer from 1 to 5, respectively. * indicates the connection between the repeating units.

R8及R9為含意與R1相同的基團。 R 8 and R 9 are the same meaning as R 1 .

L為單鍵、伸烷基(較佳為碳數1~6)、伸烯基(較佳為碳數2~6)、伸芳基(較佳為碳數6~24)、伸雜芳基(較佳為碳數1~6)、亞胺基(較佳為碳數0~6)、醚基、硫醚基、羰基或該些基團的組合的連結基。其中,較佳為單鍵或-CR5R6-NR7-(亞胺基成為X或Y)。此處,R5、R6分別獨立地表示氫原子、鹵素原子、烷基(較佳為碳數1~6)。R7為氫原子或碳數1~6的烷基。 L is a single bond, an alkyl group (preferably having a carbon number of 1 to 6), an alkenyl group (preferably having a carbon number of 2 to 6), an extended aryl group (preferably having a carbon number of 6 to 24), and an extension of the aromatic group. A linking group (preferably having a carbon number of 1 to 6), an imido group (preferably having a carbon number of 0 to 6), an ether group, a thioether group, a carbonyl group or a combination of such groups. Among them, a single bond or -CR 5 R 6 -NR 7 - (imino group becomes X or Y) is preferred. Here, R 5 and R 6 each independently represent a hydrogen atom, a halogen atom, or an alkyl group (preferably, carbon number 1 to 6). R 7 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.

La為與CR8CR9及N一起形成環結構的結構部位,較佳為與CR8CR9的碳原子一起形成碳數3~7的非芳香族雜環的結構部位。進而佳為與CR8CR9的碳原子及N(氮原子)一起形成5員~7員的非芳香族雜環的結構部位,更佳為形成5員的非芳香族雜環的結構部位,尤佳為形成吡咯啶的結構部位。其中,該結構部位亦可更具有烷基等取代基。 L a is a structural moiety which forms a ring structure together with CR 8 CR 9 and N, and preferably forms a structural part of a non-aromatic heterocyclic ring having 3 to 7 carbon atoms together with the carbon atom of CR 8 CR 9 . Further, it is preferable to form a structural part of a non-aromatic heterocyclic ring of 5 to 7 members together with a carbon atom of CR 8 CR 9 and N (a nitrogen atom), and it is more preferable to form a structural part of a non-aromatic heterocyclic ring of 5 members. It is especially preferred to form a structural moiety of pyrrolidine. Among them, the structural moiety may further have a substituent such as an alkyl group.

X表示具有pKa為14以下的官能基的基團。 X represents a group having a functional group having a pKa of 14 or less.

Y表示原子數為40~10,000的側鏈。 Y represents a side chain having an atomic number of 40 to 10,000.

特定分散樹脂(B1)較佳為更含有式(I-3)、式(I-4)或式(I-5)所表示的重複單元作為共聚合成分。藉由特定分散樹脂(B1)含有此種重複單元,可進一步提高分散性能。 The specific dispersion resin (B1) preferably further contains a repeating unit represented by the formula (I-3), the formula (I-4) or the formula (I-5) as a copolymerization component. The dispersion property can be further improved by including such a repeating unit in the specific dispersion resin (B1).

[化13] [Chemistry 13]

R1、R2、R8、R9、L、La及a與式(I-1)、式(I-2)、式(I-2a)中的規定為相同含意。 R 1 , R 2 , R 8 , R 9 , L, La and a have the same meanings as defined in the formula (I-1), the formula (I-2) and the formula (I-2a).

Ya表示具有陰離子基的原子數為40~10,000的側鏈。式(I-3)所表示的重複單元可藉由以下方式形成:於主鏈部中具有一級胺基或二級胺基的樹脂中,添加具有與胺反應而形成鹽的基團的低聚物或聚合物來進行反應。Ya較佳為後述式(III-2)。 Ya represents a side chain having an anion group of 40 to 10,000 atoms. The repeating unit represented by the formula (I-3) can be formed by adding an oligomer having a group which reacts with an amine to form a salt in a resin having a primary amino group or a secondary amine group in the main chain portion. The reaction is carried out with a substance or a polymer. Ya is preferably a formula (III-2) described later.

式(I-1)~式(I-5)中,R1及R2尤佳為氫原子。就原料獲取的觀點而言,a較佳為2。 In the formula (I-1) to the formula (I-5), R 1 and R 2 are particularly preferably a hydrogen atom. From the viewpoint of raw material acquisition, a is preferably 2.

特定分散樹脂(B1)亦可更含有具有一級胺基或三級胺基的低級伸烷基亞胺作為重複單元。再者,此種低級伸烷基亞胺重複單元的氮原子上亦可進一步鍵結上述X、Y或Ya所表示的基團。另外,於此種主鏈結構中含有鍵結有X所表示的基團的重複單元與鍵結有Y的重複單元兩者的樹脂亦包含在特定分散樹脂(B1)中。 The specific dispersion resin (B1) may further contain a lower alkyleneimine having a primary amino group or a tertiary amino group as a repeating unit. Further, the group represented by the above X, Y or Ya may be further bonded to the nitrogen atom of the lower alkyleneimine repeating unit. Further, a resin containing both a repeating unit to which a group represented by X is bonded and a repeating unit to which Y is bonded in such a main chain structure is also contained in the specific dispersion resin (B1).

就保存穩定性、顯影性的觀點而言,於特定分散樹脂(B1)所含的所有重複單元中,式(I-1)所表示的重複單元較佳為含有1莫耳%~80莫耳%,最佳為含有3莫耳%~50莫耳%。就 保存穩定性的觀點而言,於特定分散樹脂(B1)所含的所有重複單元中,式(I-2)所表示的重複單元較佳為含有10莫耳%~90莫耳%,最佳為含有30莫耳%~70莫耳%。就分散穩定性及親疏水性的平衡的觀點而言,重複單元(I-1)及重複單元(I-2)的含有比[(I-1):(I-2)]較佳為以莫耳比計為10:1~1:100的範圍,更佳為1:1~1:10的範圍。就效果的觀點而言,於特定分散樹脂(B1)所含的所有重複單元中,視需要而併用的式(I-3)所表示的重複單元較佳為含有0.5莫耳%~20莫耳%,最佳為含有1莫耳%~10莫耳%。再者,聚合物鏈Ya進行離子鍵結的情況可藉由紅外光譜法(infrared spectroscopy)或鹼滴定來確認。 From the viewpoint of storage stability and developability, among all the repeating units contained in the specific dispersion resin (B1), the repeating unit represented by the formula (I-1) preferably contains 1 mol% to 80 mol%. %, preferably contains 3 mol% to 50 mol%. on From the viewpoint of storage stability, among all the repeating units contained in the specific dispersion resin (B1), the repeating unit represented by the formula (I-2) preferably contains 10 mol% to 90 mol%, which is the best. It contains 30% by mole to 70% by mole. From the viewpoint of the balance of dispersion stability and hydrophilicity and hydrophobicity, the content ratio of the repeating unit (I-1) and the repeating unit (I-2) is preferably [(I-1): (I-2)] The ear ratio is in the range of 10:1 to 1:100, more preferably in the range of 1:1 to 1:10. From the viewpoint of the effect, among all the repeating units contained in the specific dispersion resin (B1), the repeating unit represented by the formula (I-3) which is used in combination as needed preferably contains 0.5 mol% to 20 mol%. %, preferably contains 1 mol% to 10 mol%. Further, the case where the polymer chain Ya is ion-bonded can be confirmed by infrared spectroscopy or alkali titration.

再者,關於上述式(I-2)的共聚合比的說明對於式(I-2a)、式(I-4)、式(I-5)所表示的重複單元而言亦為相同含意,於包含兩者時是指其總量。 In addition, the description of the copolymerization ratio of the above formula (I-2) also has the same meaning for the repeating unit represented by the formula (I-2a), the formula (I-4), and the formula (I-5). When both are included, it refers to the total amount.

.部分結構X . Partial structure X

上述各式中的部分結構X具有於水溫25℃下的pKa為14以下的官能基。此處所謂「pKa」,是指化學便覽(II)(修訂4版,1993年,日本化學會編,丸善股份有限公司)中記載的定義。「pKa為14以下的官能基」只要物性滿足該條件,則其結構等並無特別限定,可列舉公知的官能基中pKa滿足上述範圍的基團,尤其較佳為pKa為12以下的官能基,特佳為pKa為11以下的官能基。 下限值並不特別存在,實際上為-5以上。部分結構X較佳為碳數1~12,更佳為1~6。具體而言,例如可列舉:具有羧酸基(pKa: 3~5左右)、磺酸基(pKa:-3~-2左右)、-COCH2CO-(pKa:8~10左右)、-COCH2CN(pKa:8~11左右)、-CONHCO-、酚性羥基、-RFCH2OH或-(RF)2CHOH(RF表示全氟伸烷基或全氟烷基。pKa:9~11左右)、磺醯胺基(pKa:9~11左右)等的基團,尤佳為具有羧酸基(pKa:3~5左右)、磺酸基(pKa:-3~-2左右)、-COCH2CO-(pKa:8~10左右)的基團。 The partial structure X in each of the above formulas has a functional group having a pKa of 14 or less at a water temperature of 25 °C. The term "pKa" as used herein refers to the definitions described in Chemical Handbook (II) (Revised 4th Edition, 1993, edited by the Chemical Society of Japan, Maruzen Co., Ltd.). "The functional group having a pKa of 14 or less" is not particularly limited as long as the physical properties satisfy the above conditions, and examples thereof include a group having a pKa satisfying the above range in a known functional group, and particularly preferably a functional group having a pKa of 12 or less. Particularly preferred is a functional group having a pKa of 11 or less. The lower limit does not particularly exist, and is actually -5 or more. The partial structure X is preferably a carbon number of 1 to 12, more preferably 1 to 6. Specifically, for example, it has a carboxylic acid group (pKa: about 3 to 5), a sulfonic acid group (pKa: about 3 to 2), -COCH 2 CO- (pKa: about 8 to 10), and COCH 2 CN (pKa: about 8 to 11), -CONHCO-, phenolic hydroxyl group, -R F CH 2 OH or -(R F ) 2 CHOH (R F represents a perfluoroalkylene group or a perfluoroalkyl group. pKa A group such as a sulfonamide group (pKa: about 9 to 11), preferably a carboxylic acid group (pKa: about 3 to 5) or a sulfonic acid group (pKa: -3~-) 2 or so), -COCH 2 CO- (pKa: about 8 to 10).

藉由部分結構X所具有的官能基的pKa為14以下,可達成與高折射率粒子的相互作用。部分結構X較佳為直接鍵結於上述含有鹼性氮原子的重複單元的鹼性氮原子上。部分結構X亦可不僅以共價鍵連結,而且以進行離子鍵結而形成鹽的態樣連結。部分結構X尤佳為具有下述式(V-1)、式(V-2)或式(V-3)所表示的結構。 The interaction with the high refractive index particles can be achieved by the pKa of the functional group of the partial structure X being 14 or less. The partial structure X is preferably a direct bond to the basic nitrogen atom of the above repeating unit containing a basic nitrogen atom. The partial structure X may be linked not only by a covalent bond but also by a state in which an ion bond is formed to form a salt. The partial structure X is particularly preferably a structure represented by the following formula (V-1), formula (V-2) or formula (V-3).

U表示單鍵或二價連結基。 U represents a single bond or a divalent linking group.

d及e分別獨立地表示0或1。 d and e each independently represent 0 or 1.

Q表示醯基或烷氧基羰基。 Q represents a mercapto or alkoxycarbonyl group.

U所表示的二價連結基例如可列舉:伸烷基(更具體而言,例如為-CH2-、-CH2CH2-、-CH2CHMe-(Me為甲基)、-(CH2)5-、 -CH2CH(n-C10H21)-等)、含有氧的伸烷基(更具體而言,例如為-CH2OCH2-、-CH2CH2OCH2CH2-等)、伸烯基(較佳為碳數2~12,更佳為2~6,尤佳為2~3)、伸芳基(例如伸苯基、伸甲苯基(tolylene)、伸聯苯基、伸萘基、伸呋喃基、伸吡咯基等)、伸烷氧基(例如伸乙氧基、伸丙氧基、伸苯氧基等)或其組合,尤佳為碳數1~30的伸烷基或碳數6~20的伸芳基,最佳為碳數1~20的伸烷基或碳數6~15的伸芳基。 The divalent linking group represented by U may, for example, be an alkylene group (more specifically, for example, -CH 2 -, -CH 2 CH 2 -, -CH 2 CHMe- (Me is a methyl group), -(CH) 2 ) 5- , -CH 2 CH(nC 10 H 21 )-, etc.), an alkyl group containing oxygen (more specifically, for example, -CH 2 OCH 2 -, -CH 2 CH 2 OCH 2 CH 2 - Etc.), an alkenyl group (preferably having a carbon number of 2 to 12, more preferably 2 to 6, more preferably 2 to 3), or an aryl group (for example, a phenyl group, a tolylene group, and a biphenyl group). a base, an anthranyl group, a furfuryl group, a pyrrolyl group, etc., an alkoxy group (e.g., an ethoxy group, a propenoxy group, a phenoxy group, etc.) or a combination thereof, particularly preferably a carbon number of 1 to 30. The alkyl group or the aryl group having a carbon number of 6 to 20 is preferably an alkyl group having 1 to 20 carbon atoms or an extended aryl group having 6 to 15 carbon atoms.

另外,就生產性的觀點而言,d較佳為1,另外,e較佳為0。 Further, from the viewpoint of productivity, d is preferably 1, and e is preferably 0.

Q表示醯基或烷氧基羰基。Q的醯基較佳為碳數1~30的醯基(例如甲醯基、乙醯基、正丙醯基、苯甲醯基等),尤佳為乙醯基。關於Q的烷氧基羰基,Q尤佳為醯基,就製造的容易性、原料(X的前驅物Xa)的獲取性的觀點而言,較佳為乙醯基。 Q represents a mercapto or alkoxycarbonyl group. The fluorenyl group of Q is preferably a fluorenyl group having 1 to 30 carbon atoms (e.g., a fluorenyl group, an ethyl fluorenyl group, a n-propyl fluorenyl group, a benzamidine group, etc.), and particularly preferably an acetamino group. The Q alkoxycarbonyl group, acyl Q particularly preferably, it is ease of manufacture, the viewpoint of obtaining a raw material (X precursors X a) is concerned, is preferably acetyl group.

部分結構X較佳為與含有鹼性氮原子的重複單元的該鹼性氮原子鍵結。藉此,二氧化鈦粒子的分散性、分散穩定性飛躍性地提高。一般認為部分結構X亦賦予溶劑溶解性,抑制經時的樹脂析出,藉此有助於分散穩定性。進而,部分結構X由於含有pKa為14以下的官能基,故亦作為鹼可溶性基而發揮功能。一般認為藉此而顯影性提高,可同時實現分散性、分散穩定性及顯影性。 The partial structure X is preferably bonded to the basic nitrogen atom of a repeating unit containing a basic nitrogen atom. Thereby, the dispersibility and dispersion stability of the titanium dioxide particles are drastically improved. It is considered that the partial structure X also imparts solvent solubility and suppresses precipitation of the resin over time, thereby contributing to dispersion stability. Further, since the partial structure X contains a functional group having a pKa of 14 or less, it also functions as an alkali-soluble group. It is considered that the developability is improved by this, and dispersibility, dispersion stability, and developability can be simultaneously achieved.

部分結構X中的pKa為14以下的官能基的含量並無特別限制,相對於特定分散樹脂(B1)1g,較佳為0.01mmol~5mmol,尤佳為0.05mmol~1mmol。另外,就酸值的觀點而言, 就顯影性的觀點而言較佳為以特定分散樹脂(B1)的酸值成為5mgKOH/g~50mgKOH/g左右的量而含有pKa為14以下的官能基。 The content of the functional group having a pKa of 14 or less in the partial structure X is not particularly limited, and is preferably 0.01 mmol to 5 mmol, particularly preferably 0.05 mmol to 1 mmol, per 1 g of the specific dispersion resin (B1). In addition, from the viewpoint of acid value, From the viewpoint of the developability, it is preferable that the acid value of the specific dispersion resin (B1) is about 5 mgKOH/g to 50 mgKOH/g, and the functional group having a pKa of 14 or less is contained.

.側鏈Y . Side chain Y

Y可列舉能與特定分散樹脂(B1)的主鏈部連結的聚酯、聚醯胺、聚醯亞胺、聚(甲基)丙烯酸酯等公知的聚合物鏈。Y的與特定分散樹脂(B1)的鍵結部位較佳為側鏈Y的末端。 Y is a known polymer chain such as polyester, polyamine, polyimide or poly(meth)acrylate which can be bonded to the main chain portion of the specific dispersion resin (B1). The bonding site of Y with the specific dispersion resin (B1) is preferably the terminal of the side chain Y.

Y較佳為與選自聚(低級伸烷基亞胺)系重複單元、聚烯丙基胺系重複單元、聚二烯丙基胺系重複單元、間二甲苯二胺-表氯醇聚縮合物系重複單元及聚乙烯基胺系重複單元中的至少一種含有氮原子的重複單元的上述氮原子鍵結。選自聚(低級伸烷基亞胺)系重複單元、聚烯丙基胺系重複單元、聚二烯丙基胺系重複單元、間二甲苯二胺-表氯醇聚縮合物系重複單元及聚乙烯基胺系重複單元中的至少一種含有鹼性氮原子的重複單元等的主鏈部與Y的鍵結方式為共價鍵、離子鍵、或共價鍵與離子鍵的混合。Y與上述主鏈部的鍵結方式的比率為共價鍵:離子鍵=100:0~0:100,較佳為95:5~5:95,尤佳為90:10~10:90。 Y is preferably a polycondensation with a poly(lower alkylene imine) repeating unit, a polyallylamine repeating unit, a polydiallylamine repeating unit, and m-xylenediamine-epichlorohydrin. The above nitrogen atom is bonded to at least one of the repeating unit of the system and the repeating unit of the polyvinylamine-based repeating unit containing a nitrogen atom. a poly(lower alkylene imine) repeating unit, a polyallylamine repeating unit, a polydiallylamine repeating unit, a meta-xylenediamine-epichlorohydrin polycondensate repeating unit, and The bonding method of the main chain portion and the Y of the repeating unit containing at least one of the polyvinylamine-based repeating units and the like is a covalent bond, an ionic bond, or a mixture of a covalent bond and an ionic bond. The ratio of the bonding mode of Y to the main chain portion is a covalent bond: ion bond = 100:0 to 0:100, preferably 95:5 to 5:95, and particularly preferably 90:10 to 10:90.

Y較佳為與上述含有鹼性氮原子的重複單元的上述氮原子形成醯胺鍵,或以羧酸鹽的形式形成離子鍵。 Y preferably forms a guanamine bond with the above nitrogen atom of the above-mentioned repeating unit containing a basic nitrogen atom, or forms an ionic bond as a carboxylate.

就分散性、分散穩定性及顯影性的觀點而言,上述側鏈Y的原子數較佳為50~5,000,更佳為60~3,000。 The number of atoms of the side chain Y is preferably from 50 to 5,000, more preferably from 60 to 3,000, from the viewpoint of dispersibility, dispersion stability, and developability.

另外,Y的數量平均分子量可藉由利用GPC法的聚苯乙烯換算值來測定。此時,Y實際上是以組入至樹脂中前的狀態來測定 其分子量。Y的數量平均分子量尤佳為1,000~50,000,就分散性、分散穩定性、顯影性的觀點而言,最佳為1,000~30,000。Y的分子量可根據成為Y的原料的高分子化合物來確定,其測定方法是依據後述GPC的測定條件。 Further, the number average molecular weight of Y can be measured by a polystyrene equivalent value by a GPC method. At this time, Y is actually measured in a state before being incorporated into the resin. Its molecular weight. The number average molecular weight of Y is particularly preferably from 1,000 to 50,000, and from the viewpoint of dispersibility, dispersion stability, and developability, it is preferably from 1,000 to 30,000. The molecular weight of Y can be determined based on the polymer compound which is a raw material of Y, and the measurement method is based on the measurement conditions of GPC which will be described later.

Y所表示的側鏈結構較佳為相對於主鏈而於樹脂一分子中連結2個以上,尤佳為連結5個以上。 The side chain structure represented by Y is preferably two or more in one molecule of the resin with respect to the main chain, and more preferably five or more.

尤佳為Y具有式(III-1)所表示的結構。 More preferably, Y has a structure represented by the formula (III-1).

式(III-1)中,Z為具有聚酯鏈作為部分結構的聚合物 或低聚物,表示自HO-CO-Z所表示的具有游離羧酸的聚酯中去掉羧基所得的殘基。於特定分散樹脂(B1)含有式(I-3)~式(I-5)所表示的重複單元的情形時,較佳為Ya為式(III-2)。 In the formula (III-1), Z is a polymer having a polyester chain as a partial structure Or an oligomer, which represents a residue obtained by removing a carboxyl group from a polyester having a free carboxylic acid represented by HO-CO-Z. When the specific dispersion resin (B1) contains a repeating unit represented by the formula (I-3) to the formula (I-5), it is preferred that Ya is a formula (III-2).

式(III-2)中,Z與式(III-1)中的Z為相同含意。上述部分結構Y中,於單末端具有羧基的聚酯可藉由羧酸與內酯的 聚縮合、含羥基的羧酸的聚縮合、二元醇與二元羧酸(或環狀酸酐)的聚縮合等而獲得。 In the formula (III-2), Z has the same meaning as Z in the formula (III-1). In the above partial structure Y, the polyester having a carboxyl group at a single terminal can be obtained by a carboxylic acid and a lactone. It is obtained by polycondensation, polycondensation of a hydroxyl group-containing carboxylic acid, polycondensation of a glycol with a dicarboxylic acid (or a cyclic acid anhydride), and the like.

Z較佳為以-(LB)nB-ZB為宜。 Z is preferably -(L B ) nB -Z B .

ZB表示氫原子或一價有機基。於ZB為有機基時,較佳為烷基(較佳為碳數1~30)、芳基、雜環基等。ZB亦可更具有取代基,該取代基可列舉碳數6~24的芳基、碳數3~24的雜環基。 Z B represents a hydrogen atom or a monovalent organic group. When Z B is an organic group, an alkyl group (preferably having 1 to 30 carbon atoms), an aryl group or a heterocyclic group is preferable. Further, Z B may have a substituent. Examples of the substituent include an aryl group having 6 to 24 carbon atoms and a heterocyclic group having 3 to 24 carbon atoms.

LB為伸烷基(較佳為碳數1~6)、伸烯基(較佳為碳數2~6)、伸芳基(較佳為碳數6~24)、伸雜芳基(較佳為碳數1~6)、亞胺基(較佳為碳數0~6)、醚基、硫醚基、羰基或該些基團的組合的連結基。其中,較佳為伸烷基(較佳為碳數1~6)、醚基、羰基或該些基團的組合的連結基。伸烷基可為分支亦可為直鏈。伸烷基亦可具有取代基,較佳的取代基為烷基(較佳為碳數1~6)、醯基(較佳為碳數2~6)、烷氧基(較佳為碳數1~6)、或烷氧基羰基(較佳為碳數2~8)。LB較佳為與連結於其的CO一起(即以CO-LB的形態)而採取-CO-RB-O-的結構。RB尤佳為可具有取代基的伸烷基(較佳為碳數1~12,更佳為1~6,尤佳為1~3)。nB為5~100,000的整數,較佳為5~1000的整數,更佳為5~100的整數。nB個LB亦可為各不相同的結構。 L B is an alkylene group (preferably having a carbon number of 1 to 6), an alkenyl group (preferably having 2 to 6 carbon atoms), an aryl group (preferably having a carbon number of 6 to 24), and a heteroaryl group ( A linking group having a carbon number of 1 to 6), an imido group (preferably having a carbon number of 0 to 6), an ether group, a thioether group, a carbonyl group or a combination of these groups is preferred. Among them, a linking group having an alkyl group (preferably having a carbon number of 1 to 6), an ether group, a carbonyl group or a combination of these groups is preferred. The alkyl group may be a branch or a straight chain. The alkylene group may have a substituent, and a preferred substituent is an alkyl group (preferably having 1 to 6 carbon atoms), a mercapto group (preferably having 2 to 6 carbon atoms), and an alkoxy group (preferably having a carbon number). 1~6), or an alkoxycarbonyl group (preferably having a carbon number of 2-8). L B preferably has a structure of -CO-R B -O- together with CO attached thereto (that is, in the form of CO-L B ). R B is particularly preferably an alkylene group which may have a substituent (preferably having a carbon number of 1 to 12, more preferably 1 to 6, more preferably 1 to 3). nB is an integer of 5 to 100,000, preferably an integer of 5 to 1000, more preferably an integer of 5 to 100. nB L Bs may also have different structures.

藉由樹脂所具有的重複單元的具體結構及其組合將特 定分散樹脂(B)的具體態樣示於以下,但本發明不限定於此。下述式中,k、l、m及n分別表示重複單元的聚合莫耳比,k為1~80,l為10~90,m為0~80,n為0~70,且k+l+m+n=100。由k、 l、m所定義者及僅由k、l所定義者分別是指k+l+m=100、k+l=100。p及q表示聚酯鏈的連結數,分別獨立地表示5~100,000。Ra表示氫原子或烷氧基羰基。 Specific examples of the specific dispersion resin (B) are shown below by the specific structure of the repeating unit of the resin and a combination thereof, but the present invention is not limited thereto. In the following formula, k, l, m and n respectively represent the polymerization molar ratio of the repeating unit, k is 1 to 80, l is 10 to 90, m is 0 to 80, n is 0 to 70, and k + l +m+n=100. The one defined by k, l, m and only defined by k and l respectively mean k+l+m=100 and k+l=100. p and q represent the number of linkages of the polyester chains, and each independently represents 5 to 100,000. R a represents a hydrogen atom or an alkoxycarbonyl group.

[化18] [化18]

[化19] [Chemistry 19]

[化20] [Chemistry 20]

[化21] [Chem. 21]

[化22] [化22]

[化23] [化23]

[化24] [Chem. 24]

[化25] [化25]

[化26] [Chem. 26]

合成特定分散樹脂(B1)時,可藉由以下方法來製造:(1)使具有一級胺基或二級胺基的樹脂、與部分結構X的前驅物x及Y的前驅物y反應的方法;(2)使含有與部分結構X相對應的結構的單體與含有Y的巨單體聚合的方法等。較佳為藉由以下方式來製造:首先合成主鏈中具有一級胺基或二級胺基的樹脂,其後使X的前驅物x及Y的前驅物y與該樹脂反應,藉由高分子反應而將部分結構X及Y導入至存在於主鏈中的氮原子上。該製造方法的詳細情況可參照日本專利特開2009-203462等。 When the specific dispersion resin (B1) is synthesized, it can be produced by the following method: (1) a method of reacting a resin having a primary amine group or a secondary amine group with a precursor y of a partial structure X precursor x and Y (2) A method of polymerizing a monomer having a structure corresponding to a part of the structure X and a macromonomer containing Y, and the like. Preferably, it is produced by first synthesizing a resin having a primary amine group or a secondary amine group in the main chain, and then reacting the precursor x of X and the precursor y of Y with the resin, by polymer The reaction introduces a part of the structures X and Y onto the nitrogen atom present in the main chain. The details of the manufacturing method can be referred to Japanese Patent Laid-Open No. 2009-203462 and the like.

上述特定分散樹脂B的分子量以重量平均分子量計,較佳為3,000~100,000,更佳為5,000~55,000若重量平均分子量為上述範圍內,則可充分發揮導入至聚合物的末端的多個上述吸附 部位的效果,可發揮對二氧化鈦粒子表面的吸附性優異的性能。再者,於本說明書中,GPC只要無特別說明,則是使用HLC-8020GPC(東曹(股)製造),將管柱設定為TSKgel SuperHZM-H、TSKgel SuperHZ4000、TSKgel SuperHZ200(東曹公司製造)來測定。載體只要適當選定即可,只要可溶解,則設定為使用四氫呋喃。 The specific molecular weight of the specific dispersion resin B is preferably 3,000 to 100,000, more preferably 5,000 to 55,000, and the weight average molecular weight is within the above range, and the plurality of adsorptions introduced to the end of the polymer can be sufficiently exhibited. The effect of the part is excellent in the adsorptivity to the surface of the titanium dioxide particle. In addition, in this specification, GPC is set to TSKgel SuperHZM-H, TSKgel SuperHZ4000, TSKgel SuperHZ200 (made by Tosoh Corporation) using HLC-8020GPC (made by Tosoh Co., Ltd.) unless otherwise specified. To determine. The carrier may be appropriately selected, and if it is soluble, it is set to use tetrahydrofuran.

於本發明的感光性組成物中,高折射率粒子用分散劑可單獨使用一種或組合使用兩種以上。 In the photosensitive composition of the present invention, the dispersing agent for the high refractive index particles may be used alone or in combination of two or more.

就分散性、分散穩定性的觀點而言,高折射率粒子用分散劑相對於本發明的組成物的總固體成分之含量較佳為0.05質量%以上,更佳為1質量%以上,進而佳為5質量%以上。上限較佳為50質量%以下,更佳為40質量%以下,進而佳為30質量%以下,尤佳為10質量%以下。若以與高折射率粒子的關係來論述,則相對於高折射率粒子100質量份,高折射率粒子用分散劑較佳為10質量份以上,更佳為15質量份以上。上限較佳為40質量份以下,更佳為30質量份以下。 The content of the dispersant for the high refractive index particles relative to the total solid content of the composition of the present invention is preferably 0.05% by mass or more, more preferably 1% by mass or more, and further preferably from the viewpoint of dispersibility and dispersion stability. It is 5% by mass or more. The upper limit is preferably 50% by mass or less, more preferably 40% by mass or less, further preferably 30% by mass or less, and particularly preferably 10% by mass or less. In the case of the high refractive index particles, the dispersing agent for the high refractive index particles is preferably 10 parts by mass or more, and more preferably 15 parts by mass or more, based on 100 parts by mass of the high refractive index particles. The upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less.

(黑色顏料用分散劑) (dispersant for black pigment)

可用作黑色顏料用分散劑的市售品具體而言,例如可列舉:有機矽氧烷聚合物KP341(信越化學工業(股)製造),(甲基)丙烯酸系(共)聚合物波利弗洛(Polyflow)No.75、波利弗洛(Polyflow)No.90、波利弗洛(Polyflow)No.95(共榮社化學工業(股)製造),W001(裕商(股)公司製造)等陽離子系界面 活性劑;聚氧伸乙基月桂基醚、聚氧伸乙基硬脂基醚、聚氧伸乙基油基醚、聚氧伸乙基辛基苯基醚、聚氧伸乙基壬基苯基醚、聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯、山梨糖醇酐脂肪酸酯等非離子系界面活性劑;W004、W005、W017(裕商(股)公司製造)等陰離子系界面活性劑;EFKA-46、EFKA-47、EFKA-47EA、EFKA聚合物100、EFKA聚合物400、EFKA聚合物401、EFKA聚合物450(均為汽巴精化(Ciba Speciality Chemicals)公司製造),迪斯帕艾德(Disperse-aid)6、迪斯帕艾德(Disperse-aid)8、迪斯帕艾德(Disperse-aid)15、迪斯帕艾德(Disperse-aid)9100(均為圣诺普科(Sannopco)公司製造)等高分子分散劑;索努帕斯(Solsperse)3000、索努帕斯(Solsperse)5000、索努帕斯(Solsperse)9000、索努帕斯(Solsperse)12000、索努帕斯(Solsperse)13240、索努帕斯(Solsperse)13940、索努帕斯(Solsperse)17000、索努帕斯(Solsperse)24000、索努帕斯(Solsperse)26000、索努帕斯(Solsperse)28000、索努帕斯(Solsperse)32000、索努帕斯(Solsperse)36000等各種索努帕斯(Solsperse)分散劑(日本路博潤(Lubrizol)(股)公司製造);艾迪科普羅尼克(Adeka Pluronic)L31、艾迪科普羅尼克(Adeka Pluronic)F38、艾迪科普羅尼克(Adeka Pluronic)L42、艾迪科普羅尼克(Adeka Pluronic)L44、艾迪科普羅尼克(Adeka Pluronic)L61、艾迪科普羅尼克(Adeka Pluronic)L64、艾迪科普羅尼克(Adeka Pluronic)F68、艾迪科普羅尼克(Adeka Pluronic)L72、 艾迪科普羅尼克(Adeka Pluronic)P95、艾迪科普羅尼克(Adeka Pluronic)F77、艾迪科普羅尼克(Adeka Pluronic)P84、艾迪科普羅尼克(Adeka Pluronic)F87、艾迪科普羅尼克(Adeka Pluronic)P94、艾迪科普羅尼克(Adeka Pluronic)L101、艾迪科普羅尼克(Adeka Pluronic)P103、艾迪科普羅尼克(Adeka Pluronic)F108、艾迪科普羅尼克(Adeka Pluronic)L121、艾迪科普羅尼克(Adeka Pluronic)P-123(艾迪科(ADEKA)(股)製造)及伊奧奈特(Eonet)S-20(三洋化成(股)製造),迪斯帕畢克(Disperbyk)101、迪斯帕畢克(Disperbyk)103、迪斯帕畢克(Disperbyk)106、迪斯帕畢克(Disperbyk)108、迪斯帕畢克(Disperbyk)109、迪斯帕畢克(Disperbyk)111、迪斯帕畢克(Disperbyk)112、迪斯帕畢克(Disperbyk)116、迪斯帕畢克(Disperbyk)130、迪斯帕畢克(Disperbyk)140、迪斯帕畢克(Disperbyk)142、迪斯帕畢克(Disperbyk)162、迪斯帕畢克(Disperbyk)163、迪斯帕畢克(Disperbyk)164、迪斯帕畢克(Disperbyk)166、迪斯帕畢克(Disperbyk)167、迪斯帕畢克(Disperbyk)170、迪斯帕畢克(Disperbyk)171、迪斯帕畢克(Disperbyk)174、迪斯帕畢克(Disperbyk)176、迪斯帕畢克(Disperbyk)180、迪斯帕畢克(Disperbyk)182、迪斯帕畢克(Disperbyk)2000、迪斯帕畢克(Disperbyk)2001、迪斯帕畢克(Disperbyk)2050、迪斯帕畢克(Disperbyk)2150(畢克化學(BYK Chemie)(股)公司製造)。另外,亦可列舉川研精化(Kawaken Fine Chemicals)(股)製造 的西諾科特(Hinoact)T-8000E等兩性分散劑。 Specific examples of the commercially available product which can be used as a dispersing agent for a black pigment include, for example, an organic siloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), and a (meth)acrylic (co)polymer polise. Polyflow No.75, Polyflow No.90, Polyflow No.95 (manufactured by Kyoeisha Chemical Industry Co., Ltd.), W001 (Yushang Co., Ltd.) Manufactured) Active agent; polyoxyethylene ethyl lauryl ether, polyoxyethylene ethyl stearyl ether, polyoxyethylene ethyl oleyl ether, polyoxyethyl octyl phenyl ether, polyoxyethyl phenyl benzene Nonionic surfactants such as ethyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester; W004, W005, W017 (manufactured by Yushang Co., Ltd.) Anionic surfactants; EFKA-46, EFKA-47, EFKA-47EA, EFKA polymer 100, EFKA polymer 400, EFKA polymer 401, EFKA polymer 450 (all Ciba Speciality Chemicals) ))), Disperse-aid 6, Disperse-aid 8, Disperse-aid 15, Disperse-aid 9100 (all manufactured by Sannopco) polymer dispersant; Solsperse 3000, Solsperse 5000, Solsperse 9000, Sonour Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 24000, Solsperse 26000 , Solsperse 28000, Solsperse 32000, Solsperse 36000 and other Solsperse dispersants (Lubrizol) Manufacturing); Adeka Pluronic L31, Adeka Pluronic F38, Adeka Pluronic L42, Adeka Pluronic L44, Eddie Popular Science Adeka Pluronic L61, Adeka Pluronic L64, Adeka Pluronic F68, Adeka Pluronic L72, Adeka Pluronic P95, Adeka Pluronic F77, Adeka Pluronic P84, Adeka Pluronic F87, Eddie Pronknik Adeka Pluronic) P94, Adeka Pluronic L101, Adeka Pluronic P103, Adeka Pluronic F108, Adeka Pluronic L121, Ai Adeka Pluronic P-123 (made by Adeco (ADEKA)) and Eonet S-20 (made by Sanyo Chemicals Co., Ltd.), Disperbyk 101, Disperbyk 103, Disperbyk 106, Disperbyk 108, Disperbyk 109, Disperbyk 111, Disperbyk 112, Disperbyk 116, Disperbyk 130, Disperbyk 140, Disperbyk 142, Disperbyk 162, Disperbyk 163, Disperbyk 164, Disperbyk 166, Di Disperbyk 167, Disperbyk 170, Disperbyk 171, Disperbyk 174, Disperbyk 176, Diss Disperbyk 180, Disperbyk 182, Disperbyk 2000, Disperbyk 2001, Disperbyk 2050, Diss Disperbyk 2150 (manufactured by BYK Chemie Co., Ltd.). In addition, it can also be manufactured by Kawaken Fine Chemicals Co., Ltd. An amphoteric dispersant such as Hinoact T-8000E.

除此以外,亦可較佳地列舉丙烯酸系共聚物等在分子末端或側鏈上具有極性基的低聚物或聚合物作為分散劑。另外,將聚酯鏈加成於重量平均分子量為300~20000的聚伸乙基亞胺或聚烯丙基胺的胺基上所得的胺基樹脂亦可用作分散劑。 In addition, an oligomer or a polymer having a polar group at a molecular terminal or a side chain such as an acrylic copolymer or the like can be preferably used as a dispersing agent. Further, an amine-based resin obtained by adding a polyester chain to an amine group of a polyethylenimine or a polyallylamine having a weight average molecular weight of 300 to 20,000 can also be used as a dispersing agent.

就分散性、顯影性、沈降性的觀點而言,較佳為以如下所示的樹脂為宜,尤其就分散性的觀點而言,較佳為於側鏈上具有聚酯鏈的高分子分散劑。另外,就分散性、及藉由光微影法所形成的圖案的解析性的觀點而言,較佳為具有酸基及聚酯鏈的樹脂。就吸附性的觀點而言,顏料分散劑中的較佳的酸基較佳為pKa為6以下的酸基,尤佳為羧酸、磺酸、磷酸。 From the viewpoint of dispersibility, developability, and sedimentation property, it is preferred to use a resin as described below, and in particular, from the viewpoint of dispersibility, it is preferred to disperse a polymer having a polyester chain in a side chain. Agent. Further, from the viewpoint of dispersibility and resolution of a pattern formed by photolithography, a resin having an acid group and a polyester chain is preferable. From the viewpoint of adsorptivity, a preferred acid group in the pigment dispersant is preferably an acid group having a pKa of 6 or less, and more preferably a carboxylic acid, a sulfonic acid or a phosphoric acid.

較佳的分散樹脂可列舉於分子內具有以下接枝鏈的接枝共聚物,上述接枝鏈的除了氫原子以外的原子數為40~10000的範圍,且是選自聚酯結構、聚醚結構及聚丙烯酸酯結構中。更佳為含有下述式(A)所表示的結構單元的接枝共聚物,尤佳為含有式(1)~式(5)的任一個所表示的結構單元的接枝共聚物(特定分散樹脂C)。 Preferred examples of the dispersing resin include graft copolymers having the following graft chains in the molecule, and the number of atoms of the graft chain other than a hydrogen atom is in the range of 40 to 10,000, and is selected from a polyester structure and a polyether. Structure and polyacrylate structure. More preferably, it is a graft copolymer containing a structural unit represented by the following formula (A), and more preferably a graft copolymer containing a structural unit represented by any one of the formulas (1) to (5) (specific dispersion) Resin C).

式中,XA表示氫原子、鹵素原子或一價有機基,YA表示單鍵或二價連結基,ZA表示氫原子或一價有機基。於ZA為有機基時,較佳為烷基(較佳為碳數1~30,更佳為1~12)、烯基(較佳為碳數2~30、更佳為2~12)、芳基(較佳為碳數6~30、更佳為6~10)、雜芳基(較佳為碳數1~30、更佳為1~6)等。烷基可為分支亦可為直鏈。芳基、雜芳基可為單環亦可為多環。該些基團亦可更具有取代基,該可具有的取代基為羥基、鹵素原子、醯基(較佳為碳數2~6)、胺基(較佳為碳數0~6)、烷氧基(較佳為碳數1~6)、或烷氧基羰基(較佳為碳數2~8)、芳基(較佳為碳數6~24)、雜環基(較佳為碳數1~12)。於存在多個LA時,亦可各不相同。ZA亦可更具有取代基,該取代基可列舉碳數6~24的芳基、碳數3~24的雜芳基。nA表示1~500的整數,較佳為5~100的整數。 In the formula, X A represents a hydrogen atom, a halogen atom or a monovalent organic group, Y A represents a single bond or a divalent linking group, and Z A represents a hydrogen atom or a monovalent organic group. When Z A is an organic group, it is preferably an alkyl group (preferably having a carbon number of 1 to 30, more preferably 1 to 12) or an alkenyl group (preferably having a carbon number of 2 to 30, more preferably 2 to 12). An aryl group (preferably having a carbon number of 6 to 30, more preferably 6 to 10) or a heteroaryl group (preferably having a carbon number of 1 to 30, more preferably 1 to 6). The alkyl group may be a branch or a straight chain. The aryl group and the heteroaryl group may be a single ring or a polycyclic ring. The groups may have more substituents, and the substituents may have a hydroxyl group, a halogen atom, a mercapto group (preferably having a carbon number of 2 to 6), an amine group (preferably having a carbon number of 0 to 6), and an alkane. An oxy group (preferably having a carbon number of 1 to 6), an alkoxycarbonyl group (preferably having 2 to 8 carbon atoms), an aryl group (preferably having a carbon number of 6 to 24), and a heterocyclic group (preferably carbon). Number 1~12). In the presence of a plurality of L A, may vary. Z A may further have a substituent, and examples of the substituent include an aryl group having 6 to 24 carbon atoms and a heteroaryl group having 3 to 24 carbon atoms. nA represents an integer of 1 to 500, preferably an integer of 5 to 100.

LA為伸烷基(較佳為碳數1~6)、伸烯基(較佳為碳數2~6)、伸芳基(較佳為碳數6~24)、伸雜芳基(較佳為碳數1~6)、亞胺基(較佳為碳數0~6)、醚基、硫醚基、羰基或該些基團的組合的連結基。其中,較佳為伸烷基(較佳為碳數1~6)、醚基、羰基或該些基團的組合的連結基。伸烷基可為分支亦可為直鏈。伸烷基亦可具有取代基,較佳的取代基為羥基、鹵素原子、醯基(較佳為碳數2~6)、胺基(較佳為碳數0~6)、烷氧基(較佳為碳數1~6)、或烷氧基羰基(較佳為碳數2~8)、芳基(較佳為碳 數6~24)、雜環基(較佳為碳數1~12)。於存在多個LA時,亦可各不相同。 L A is an alkylene group (preferably having a carbon number of 1 to 6), an alkenyl group (preferably having 2 to 6 carbon atoms), an aryl group (preferably having a carbon number of 6 to 24), and a heteroaryl group ( A linking group having a carbon number of 1 to 6), an imido group (preferably having a carbon number of 0 to 6), an ether group, a thioether group, a carbonyl group or a combination of these groups is preferred. Among them, a linking group having an alkyl group (preferably having a carbon number of 1 to 6), an ether group, a carbonyl group or a combination of these groups is preferred. The alkyl group may be a branch or a straight chain. The alkylene group may have a substituent. Preferred substituents are a hydroxyl group, a halogen atom, a fluorenyl group (preferably having a carbon number of 2 to 6), an amine group (preferably having a carbon number of 0 to 6), and an alkoxy group ( It is preferably a carbon number of 1 to 6), an alkoxycarbonyl group (preferably having 2 to 8 carbon atoms), an aryl group (preferably having a carbon number of 6 to 24), and a heterocyclic group (preferably having a carbon number of 1 to 6). 12). In the presence of a plurality of L A, may vary.

式中,X1~X6與上述XA為相同含意。Y1~Y5與上述 YA為相同含意。Z1~Z5與上述ZA為相同含意。R表示氫原子或一價有機基,亦可於共聚物中存在結構不同的R。n、m、p、q及r分別表示與nA為相同含意的整數。j及k分別獨立地為2~8的整數。 In the formula, X 1 to X 6 have the same meanings as X A above. Y 1 to Y 5 have the same meanings as the above Y A . Z 1 to Z 5 have the same meaning as the above Z A . R represents a hydrogen atom or a monovalent organic group, and R may have a structural difference in the copolymer. n, m, p, q, and r respectively represent integers having the same meaning as nA. j and k are each independently an integer of 2-8.

Y1~Y5較佳為烷基(較佳為碳數1~12,更佳為1~6,尤佳為1~3)、烯基(較佳為碳數6~22,更佳為6~14)、亞胺基(NRN:RN為氫原子或碳數1~6的烷基)、醚基(O)、羰基(CO)、硫醚基(S)或該些基團的組合。X1~X6為有機基時,較佳為烷基(較佳為碳數1~12,更佳為1~6,尤佳為1~3)。 Y 1 to Y 5 are preferably an alkyl group (preferably having a carbon number of 1 to 12, more preferably 1 to 6, more preferably 1 to 3) or an alkenyl group (preferably having a carbon number of 6 to 22, more preferably 6 to 14), an imido group (NR N : R N is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), an ether group (O), a carbonyl group (CO), a thioether group (S) or the groups The combination. When X 1 to X 6 are an organic group, an alkyl group is preferred (preferably, the carbon number is from 1 to 12, more preferably from 1 to 6, more preferably from 1 to 3).

於n、m、p、q、r為2以上時,各連結基的結構亦可不同。CjH2j、CkH2k所表示的伸烷基可為直鏈亦可為分支。另外,其H 亦可適當地經任意的取代基所取代。 When n, m, p, q, and r are 2 or more, the structure of each linking group may also differ. The alkylene group represented by C j H 2j and C k H 2k may be a straight chain or a branched chain. Further, H may be appropriately substituted with an arbitrary substituent.

其中,較佳為上述式(1)所表示的於側鏈上具有聚酯鏈的化合物。該些化合物的代表性者可較佳地使用日本專利特開2010-106268公報段落編號[0046]~段落編號[0078]中記載的例示化合物1~例示化合物71。 Among them, a compound having a polyester chain in a side chain represented by the above formula (1) is preferred. Representative examples of these compounds are preferably exemplified by the exemplified compound 1 to the exemplified compound 71 described in Paragraph No. [0046] to Paragraph No. [0078] of JP-A-2010-106268.

再者,以下記載作為較佳分散劑的例示化合物,但本發明不限制於該些例示化合物。下述例示化合物中,與各結構單元一併記載的數值表示該結構單元的含量[質量%,適當記載為(wt%)]。 Further, the exemplified compounds which are preferred dispersants are described below, but the present invention is not limited to the exemplified compounds. In the following exemplified compounds, the numerical values described in the respective structural units indicate the content of the structural unit [% by mass, suitably described as (wt%)].

[化29] [化29]

[化30] [化30]

[化31] [化31]

[化32] [化32]

[化33] [化33]

[化34] [化34]

[化35] [化35]

[化36] [化36]

[化37] [化37]

[化38] [化38]

上述特定分散樹脂B的分子量以重量平均分子量計,較佳為3,000~100,000,更佳為4,000~55,000若重量平均分子量在上述範圍內,則可充分發揮導入至聚合物的末端的多個上述吸附部位的效果,可發揮對二氧化鈦粒子表面的吸附性優異的性能。分子量的測定方法是設定為利用GPC測定且利用上文所述的條件 等。 The specific molecular weight of the specific dispersion resin B is preferably 3,000 to 100,000, more preferably 4,000 to 55,000, and the weight average molecular weight is within the above range, and the plurality of adsorptions introduced to the end of the polymer can be sufficiently exhibited. The effect of the part is excellent in the adsorptivity to the surface of the titanium dioxide particle. The method for determining the molecular weight is set to be measured by GPC and utilize the conditions described above. Wait.

就分散性、分散穩定性的觀點而言,黑色顏料用分散劑 相對於本發明的組成物的總固體成分之含量較佳為0.05質量%以上,更佳為1質量%以上,進而佳為5質量%以上。上限較佳為90質量%以下,更佳為70質量%以下,進而佳為50質量%以下,尤佳為10質量%以下。若以與黑色顏料的關係來論述,則相對於黑色顏料100質量份,黑色顏料用分散劑較佳為10質量份以上,更佳為15質量份以上。上限較佳為40質量份以下,更佳為35質量份以下。 Dispersing agent for black pigments from the viewpoint of dispersibility and dispersion stability The content of the total solid content of the composition of the present invention is preferably 0.05% by mass or more, more preferably 1% by mass or more, and still more preferably 5% by mass or more. The upper limit is preferably 90% by mass or less, more preferably 70% by mass or less, further preferably 50% by mass or less, and particularly preferably 10% by mass or less. In the case of the relationship with the black pigment, the dispersing agent for the black pigment is preferably 10 parts by mass or more, and more preferably 15 parts by mass or more, based on 100 parts by mass of the black pigment. The upper limit is preferably 40 parts by mass or less, more preferably 35 parts by mass or less.

於本發明的組成物中,分散劑的總量於固體成分中較佳 為0.05質量%以上,更佳為1質量%以上,進而佳為3質量%以上,尤佳為5質量%以上。上限較佳為30質量%以下,更佳為20質量%以下,尤佳為10質量%以下。藉由在此種範圍內使用分散劑,可有效地賦予分散性及分散穩定性且實現良好的光學特性或感光性,就此方面而言較佳。 In the composition of the present invention, the total amount of the dispersing agent is preferably in the solid content. It is 0.05% by mass or more, more preferably 1% by mass or more, further preferably 3% by mass or more, and particularly preferably 5% by mass or more. The upper limit is preferably 30% by mass or less, more preferably 20% by mass or less, and still more preferably 10% by mass or less. By using a dispersing agent in such a range, dispersibility and dispersion stability can be effectively imparted, and good optical characteristics or photosensitivity can be achieved, which is preferable in this respect.

[聚合起始劑] [Polymerization initiator]

聚合起始劑較佳為藉由光或熱而發生分解,引發、促進後述聚合性化合物的聚合的化合物。於利用光來引發聚合的情形時,較佳為於波長為300nm~500nm的範圍內具有吸收。於利用熱來引發聚合的情形時,較佳為於150℃~250℃下分解的起始劑。 The polymerization initiator is preferably a compound which is decomposed by light or heat to initiate and accelerate polymerization of a polymerizable compound described later. In the case where polymerization is initiated by light, it is preferred to have absorption in a wavelength range of 300 nm to 500 nm. In the case of using heat to initiate polymerization, an initiator which decomposes at 150 ° C to 250 ° C is preferred.

聚合起始劑較佳為至少具有芳香族基的化合物,例如可列舉:(雙)醯基膦氧化物或其酯類、苯乙酮系化合物、α-胺基酮 化合物、二苯甲酮系化合物、安息香醚系化合物、縮酮衍生物化合物、硫雜蒽酮化合物、肟酯化合物、六芳基聯咪唑化合物、三鹵代甲基(halomethyl)化合物、偶氮化合物、有機過氧化物,重氮鎓化合物、錪化合物、鋶化合物、嗪鎓化合物、茂金屬化合物等鎓鹽化合物、有機硼鹽化合物、二碸化合物等。 The polymerization initiator is preferably a compound having at least an aromatic group, and examples thereof include (bis)decylphosphine oxide or an ester thereof, an acetophenone-based compound, and an α-aminoketone. a compound, a benzophenone compound, a benzoin ether compound, a ketal derivative compound, a thioxanthone compound, an oxime ester compound, a hexaarylbiimidazole compound, a halomethyl compound, an azo compound An organic peroxide, a diazonium compound, an anthraquinone compound, an anthraquinone compound, a sulfonium compound, a metallocene compound or the like, an onium salt compound, an organic boron salt compound, a diterpene compound, and the like.

就感度的觀點而言,較佳為肟酯化合物、醯基膦氧化物系化合物、苯乙酮系化合物、α-胺基酮化合物、三鹵代甲基化合物、六芳基聯咪唑化合物及硫醇化合物。 From the viewpoint of sensitivity, an oxime ester compound, a mercaptophosphine oxide compound, an acetophenone compound, an α-amino ketone compound, a trihalogenated methyl compound, a hexaarylbiimidazole compound, and sulfur are preferred. Alcohol compound.

以下列舉較佳的聚合起始劑的例子,但本發明不限制於該些例子。 Examples of preferred polymerization initiators are listed below, but the invention is not limited to the examples.

苯乙酮系化合物具體而言,例如可列舉:2,2-二乙氧基 苯乙酮、對二甲基胺基苯乙酮、2-羥基-2-甲基-1-苯基-丙烷-1-酮、對二甲基胺基苯乙酮、4'-異丙基-2-羥基-2-甲基-苯丙酮、1-羥基-環己基-苯基-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1、2-甲苯基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙酮-1、2-甲基-1-(4-甲硫基苯基)-2-嗎啉基丙烷-1-酮、2-苄基-2-二甲基胺基-1-(4-嗎啉基苯基)-丁酮-1、2-(二甲基胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]-1-丁酮及2-甲基-1-(4-甲硫基苯基)-2-嗎啉基丙烷-1-酮等。其中,可較佳地使用的可作為市售品而獲取的化合物可列舉:2-甲基-1-(4-甲硫基苯基)-2-嗎啉基丙烷-1-酮[商品名「伊魯卡(Irgacure)-907」(汽巴精化(Ciba Speciality Chemicals)公司製造)]。 Specific examples of the acetophenone-based compound include 2,2-diethoxy group. Acetophenone, p-dimethylaminoacetophenone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, p-dimethylaminoacetophenone, 4'-isopropyl -2-hydroxy-2-methyl-propiophenone, 1-hydroxy-cyclohexyl-phenyl-one, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)- Butanone-1, 2-tolyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone-1, 2-methyl-1-[4-(methylthio) Phenyl]-2-morpholinylacetone-1, 2-methyl-1-(4-methylthiophenyl)-2-morpholinylpropan-1-one, 2-benzyl-2-dimethyl Amino-1-(4-morpholinylphenyl)-butanone-1, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4 -(4-morpholinyl)phenyl]-1-butanone and 2-methyl-1-(4-methylthiophenyl)-2-morpholinylpropan-1-one. Among them, a compound which can be preferably used as a commercially available product is exemplified by 2-methyl-1-(4-methylthiophenyl)-2-morpholinylpropan-1-one [trade name] "Irgacure-907" (manufactured by Ciba Speciality Chemicals).

另外,可作為市售品而獲取的起始劑亦可較佳地列舉α-烷基胺基苯酮[伊魯卡(Irgacure)-379(汽巴精化(Ciba Speciality Chemicals)公司製造)]等。 Further, an α-alkylaminobenzophenone [Irgacure-379 (manufactured by Ciba Speciality Chemicals)] is also preferably exemplified as the initiator which can be obtained as a commercial product. Wait.

三鹵代甲基化合物更佳可列舉至少一個單鹵素取代甲 基、二鹵素取代甲基或三鹵素取代甲基鍵結於均三嗪環上所得的均三嗪衍生物,具體而言,例如可列舉:2,4,6-三(單氯甲基)-均三嗪、2,4,6-三(二氯甲基)-均三嗪、2,4,6-三(三氯甲基)-均三嗪、2-甲基-4,6-雙(三氯甲基)-均三嗪、2-正丙基-4,6-雙(三氯甲基)-均三嗪、2-(α,α,β-三氯乙基)-4,6-雙(三氯甲基)-均三嗪、2-苯基-4,6-雙(三氯甲基)-均三嗪、2-(對甲氧基苯基)-4,6-雙(三氯甲基)-均三嗪、2-(3,4-環氧苯基)-4,6-雙(三氯甲基)-均三嗪、2-(對氯苯基)-4,6-雙(三氯甲基)-均三嗪、2-[1-(對甲氧基苯基)-2,4-丁二烯基]-4,6-雙(三氯甲基)-均三嗪、2-苯乙烯基-4,6-雙(三氯甲基)-均三嗪、2-(對甲氧基苯乙烯基)-4,6-雙(三氯甲基)-均三嗪、2-(對異丙氧基苯乙烯基)-4,6-雙(三氯甲基)-均三嗪、2-(對甲苯基)-4,6-雙(三氯甲基)-均三嗪、2-(4-甲氧基萘基)-4,6-雙(三氯甲基)-均三嗪、2-苯硫基-4,6-雙(三氯甲基)-均三嗪、2-苄硫基-4,6-雙(三氯甲基)-均三嗪、2,4,6-三(二溴甲基)-均三嗪、2,4,6-三(三溴甲基)-均三嗪、2-甲基-4,6-雙(三溴甲基)-均三嗪、2-甲氧基-4,6-雙(三溴甲基)-均三嗪等。 More preferably, the trihalogenated methyl compound may be substituted with at least one monohalogen substituted group A. a s-triazine derivative obtained by binding a dihalo-substituted methyl group or a trihalogen-substituted methyl group to a s-triazine ring, and specifically, for example, 2,4,6-tris(monochloromethyl) -s-triazine, 2,4,6-tris(dichloromethyl)-s-triazine, 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-4,6- Bis(trichloromethyl)-s-triazine, 2-n-propyl-4,6-bis(trichloromethyl)-s-triazine, 2-(α,α,β-trichloroethyl)-4 ,6-bis(trichloromethyl)-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6 - bis(trichloromethyl)-s-triazine, 2-(3,4-epoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-chlorophenyl) -4,6-bis(trichloromethyl)-s-triazine, 2-[1-(p-methoxyphenyl)-2,4-butadienyl]-4,6-bis(trichloromethane) -s-triazine, 2-styryl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxystyryl)-4,6-bis(trichloromethane) -s-triazine, 2-(p-isopropoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis ( Trichloromethyl)-s-triazine, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-phenylthio-4,6-bis ( Trichloromethyl)- Triazine, 2-benzylthio-4,6-bis(trichloromethyl)-s-triazine, 2,4,6-tris(dibromomethyl)-s-triazine, 2,4,6-tri (tribromomethyl)-s-triazine, 2-methyl-4,6-bis(tribromomethyl)-s-triazine, 2-methoxy-4,6-bis(tribromomethyl)- Is a triazine or the like.

六芳基聯咪唑化合物例如可列舉日本專利特公平 6-29285號公報、美國專利第3,479,185號、美國專利第4,311,783號、美國專利第4,622,286號等的各說明書中記載的各種化合物, 具體可列舉:2,2'-雙(鄰氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰溴苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰,對二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰氯苯基)-4,4',5,5'-四(間甲氧基苯基) 、2,2'-雙(鄰,鄰'-二氯苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰硝基苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰甲基苯基)-4,4',5,5'-四苯基聯咪唑、2,2'-雙(鄰三氟苯基)-4,4',5,5'-四苯基聯咪唑等。 Examples of the hexaarylbiimidazole compound include various compounds described in the respective specifications of Japanese Patent Publication No. Hei. 6-29285, U.S. Patent No. 3,479,185, U.S. Patent No. 4,311,783, and U.S. Patent No. 4,622,286. 2,2'-bis(o-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-bromophenyl)-4,4',5,5 '-Tetraphenylbiimidazole, 2,2'-bis(o-, p-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-chlorobenzene) Base)-4,4',5,5'-tetra(m-methoxyphenyl) , 2,2'-bis(o-o-o-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-nitrophenyl)-4 , 4',5,5'-tetraphenylbiimidazole, 2,2'-bis(o-methylphenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'- Bis(o-trifluorophenyl)-4,4',5,5'-tetraphenylbiimidazole and the like.

關於醯基膦氧化物系化合物,例如[2,4,6-三甲基苯甲醯 基-二苯基-膦氧化物]能以達羅卡(Darocur)TPO(日本汽巴(Ciba Japan)公司製造)的商品名獲取,[雙(2,4,6-三甲基苯甲醯基)-苯基膦氧化物]能以伊魯卡(Irgacure)819(日本汽巴(Ciba Japan)公司製造)的商品名而獲取。 About fluorenylphosphine oxide compounds, such as [2,4,6-trimethylbenzhydramidine The bis-diphenyl-phosphine oxide can be obtained under the trade name of Darocur TPO (manufactured by Ciba Japan Co., Ltd.) [bis(2,4,6-trimethylbenzhydrazide) The base)-phenylphosphine oxide can be obtained under the trade name of Irgacure 819 (manufactured by Ciba Japan Co., Ltd.).

肟酯化合物可列舉:「英國化學會志(Journal of the Chemical Society,J.C.S.)普爾金會刊(Perkin)II」(1979)1653-1660、「英國化學會志(Journal of the Chemical Society,J.C.S.)普爾金會刊(Perkin)II」(1979)156-162、「光聚合物科技與技術期刊(Journal of Photopolymer Science and Technology)」(1995)202-232、日本專利特開2000-66385號公報記載的化合物,日本專利特開2000-80068號公報、日本專利特表2004-534797號公報記載的化合物,市售品可列舉汽巴精化(Ciba Speciality Chemicals)公司製造的伊魯卡(IRGACURE)OXE 01(1,2-辛二酮,1-[4-(苯硫基)-,2-(鄰苯甲醯基肟)])、伊魯卡(IRGACURE)OXE 02(乙酮,1-[9- 乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-基]-,1-(鄰乙醯基肟))、TR-PBG-304(常州強力電子新材料有限公司製造)等作為較佳化合物。 The oxime ester compound can be listed as: "Journal of the Chemical Society, JCS) Perkin II (1979) 1653-1660, "Journal of the Chemical Society (JCS) Perkin II (1979) 156-162 , "The Journal of Photopolymer Science and Technology" (1995) 202-232, the compound described in Japanese Patent Laid-Open Publication No. 2000-66385, Japanese Patent Laid-Open No. 2000-80068, Japanese Patent In the case of the compound described in JP-A-2004-534797, commercially available products include IRGACURE OXE 01 (1,2-octanedione, 1-[4-) manufactured by Ciba Speciality Chemicals. (phenylthio)-, 2-(o-benzylidene hydrazide)]), IRGACURE OXE 02 (ethyl ketone, 1-[9- Ethyl-6-(2-methylbenzhydryl)-9H-indazol-3-yl]-,1-(o-ethylindenyl), TR-PBG-304 (Changzhou Power Electronic New Material Co., Ltd.) The company manufactures and the like as a preferred compound.

進而,亦可較佳地使用日本專利特開2007-231000公報及日本專利特開2007-322744公報中記載的環狀肟化合物。 Further, a cyclic ruthenium compound described in JP-A-2007-231000 and JP-A-2007-322744 can be preferably used.

最佳例可列舉:日本專利特開2007-269779公報中揭示的具有特定取代基的肟化合物、或日本專利特開2009-191061公報中揭示的具有硫代芳基的肟化合物。 The ruthenium compound having a specific substituent disclosed in Japanese Laid-Open Patent Publication No. 2007-269779, or the ruthenium compound having a thioaryl group disclosed in Japanese Laid-Open Patent Publication No. 2009-191061, is exemplified.

另外,亦可較佳地使用以下所示的肟化合物。 Further, the ruthenium compound shown below can also be preferably used.

[化39] [39]

肟化合物於350nm~500nm的波長範圍內具有最大吸 收波長,較佳為於360nm~480nm的波長範圍內具有吸收波長,尤佳為365nm及455nm的吸光度高。 Bismuth compounds have maximum absorption in the wavelength range of 350nm~500nm The absorption wavelength preferably has an absorption wavelength in a wavelength range of 360 nm to 480 nm, and particularly preferably a high absorbance at 365 nm and 455 nm.

就感度的觀點而言,肟化合物的365nm或405nm下的 莫耳吸光係數較佳為3,000~300,000,更佳為5,000~300,000,尤佳為10000~200,000。 From the viewpoint of sensitivity, the cerium compound is at 365 nm or 405 nm. The molar absorption coefficient is preferably from 3,000 to 300,000, more preferably from 5,000 to 300,000, and particularly preferably from 10,000 to 200,000.

化合物的莫耳吸光係數可使用公知的方法來測定,具體而 言,例如較佳為利用紫外可見分光光度計(瓦里安(Varian)公司製造的凱里-5分光光度計(carry-5 spectrophotometer))使用乙酸乙酯溶劑以0.01g/L的濃度進行測定。 The molar absorption coefficient of the compound can be determined by a known method, specifically For example, it is preferably measured by using an ultraviolet-visible spectrophotometer (carry-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g/L.

光聚合起始劑可單獨使用一種,亦可併用兩種以上。 於固體成分中,感光性組成物中的光聚合起始劑的含量較佳為0.01質量%~30質量%,更佳為0.1質量%~20質量%,尤佳為0.1質量%~15質量%。 The photopolymerization initiator may be used alone or in combination of two or more. In the solid content, the content of the photopolymerization initiator in the photosensitive composition is preferably from 0.01% by mass to 30% by mass, more preferably from 0.1% by mass to 20% by mass, even more preferably from 0.1% by mass to 15% by mass. .

[聚合性化合物] [Polymerizable compound]

聚合性化合物較佳為具有至少一個可進行加成聚合的乙烯性不飽和基的化合物。進而,聚合性化合物較佳為沸點於常壓下為100℃以上的化合物。聚合性化合物更佳為碳數14~70。 The polymerizable compound is preferably a compound having at least one ethylenically unsaturated group capable of undergoing addition polymerization. Further, the polymerizable compound is preferably a compound having a boiling point of 100 ° C or higher at normal pressure. The polymerizable compound is more preferably a carbon number of 14 to 70.

上述具有至少一個可進行加成聚合的乙烯性不飽和基、且沸點於常壓下為100℃以上的化合物例如可列舉:聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲基)丙烯酸酯、(甲基)丙烯酸苯氧基乙酯等單官能的丙烯酸酯或甲基丙烯酸酯;聚乙二醇二(甲基)丙烯酸酯、三羥甲基乙烷三(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、己二醇(甲基)丙烯酸酯、三羥甲基丙烷三(丙烯醯氧基丙基)醚、異三聚氰酸三(丙烯醯氧基乙基)酯、於甘油或三羥甲基乙烷等多官能醇上加成環氧乙烷或環氧丙烷後加以(甲基)丙烯酸酯化而成者、季戊四醇或二季戊四醇的聚(甲基)丙烯酸酯化物,日本專利特公昭48-41708號、日本專利特 公昭50-6034號、日本專利特開昭51-37193號公報中記載的丙烯酸胺基甲酸酯類,日本專利特開昭48-64183號、日本專利特公昭49-43191號、日本專利特公昭52-30490號公報中記載的聚酯丙烯酸酯類,作為環氧樹脂與(甲基)丙烯酸的反應產物的環氧丙烯酸酯類等多官能的丙烯酸酯或甲基丙烯酸酯。 Examples of the compound having at least one ethylenically unsaturated group capable of undergoing addition polymerization and having a boiling point of 100 ° C or more at normal pressure include polyethylene glycol mono (meth) acrylate and polypropylene glycol mono (methyl). a monofunctional acrylate or methacrylate such as acrylate or phenoxyethyl (meth)acrylate; polyethylene glycol di(meth)acrylate, trimethylolethane tri(meth)acrylic acid Ester, neopentyl glycol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, hexanediol (meth)acrylic acid Ester, trimethylolpropane tris(propylene methoxypropyl) ether, tris(propylene oxy)ethyl isocyanate, addition to polyfunctional alcohols such as glycerol or trimethylolethane Ethylene oxide or propylene oxide followed by (meth) acrylated, pentaerythritol or dipentaerythritol poly (meth) acrylate, Japanese Patent Special Publication No. 48-41708, Japanese Patent The urethane urethanes described in Japanese Laid-Open Patent Publication No. SHO-51-37193, Japanese Patent Laid-Open No. Sho-48-64183, Japanese Patent Publication No. Sho 49-43191, and Japanese Patent Publication No. Sho 52 The polyester acrylate described in the publication No. -30490 is a polyfunctional acrylate or methacrylate such as an epoxy acrylate which is a reaction product of an epoxy resin and (meth)acrylic acid.

進而,亦可使用日本接著協會志Vol.20、No.7、300頁~308頁中作為光硬化性單體及低聚物而介紹的化合物。 Further, a compound which is described as a photocurable monomer and an oligomer in the Japanese Society of Associations Vol. 20, No. 7, and pages 300 to 308 can also be used.

另外,亦可使用日本專利特開平10-62986號公報中作為式(1)及(2)而與其具體例一併記載的於上述多官能醇上加成環氧乙烷或環氧丙烷後加以(甲基)丙烯酸酯化而成的化合物。 In addition, it is also possible to add ethylene oxide or propylene oxide to the above polyfunctional alcohol as described in the above formulas (1) and (2) in Japanese Patent Publication No. Hei 10-62986. (Methyl) acrylated compound.

其中,較佳為二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯及該些化合物的丙烯醯基介隔乙二醇、丙二醇殘基的結構。亦可使用該等的低聚物類型。 Among them, preferred are dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and a structure of propylene sulfonate-based ethylene glycol or propylene glycol residues of these compounds. These oligomer types can also be used.

另外,亦較佳為如日本專利特公昭48-41708號、日本專利特開昭51-37193號、日本專利特公平2-32293號、日本專利特公平2-16765號中記載般的丙烯酸胺基甲酸酯類,或日本專利特公昭58-49860號、日本專利特公昭56-17654號、日本專利特公昭62-39417號、日本專利特公昭62-39418號記載的具有環氧乙烷系骨架的胺基甲酸酯化合物類。進而,藉由使用日本專利特開昭63-277653號、日本專利特開昭63-260909號、日本專利特開平1-105238號中記載的於分子內具有胺基結構或硫醚結構的加成聚合性化合物類,可獲得感光速度非常優異的光聚合性組成物。市 售品可列舉:胺基甲酸酯低聚物UAS-10、胺基甲酸酯低聚物UAB-140(山陽國策紙漿公司製造),UA-7200(新中村化學公司製造,DPHA-40H(日本化藥公司製造),UA-306H、UA-306T、UA-306I、AH-600、T-600、AI-600(共榮社製造)等。 Further, an amine acrylate group as described in JP-A-48-41708, JP-A-53-37193, JP-A-2-32293, and JP-A No. 2-16765 is also preferred. An acid ester, or an ethylene oxide-based skeleton described in Japanese Patent Publication No. Sho-58-49860, Japanese Patent Publication No. Sho 56-17654, Japanese Patent Publication No. Sho 62-39417, and Japanese Patent Publication No. Sho 62-39418 Carbamate compounds. Further, an addition having an amine structure or a thioether structure in the molecule described in Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. A polymerizable compound can obtain a photopolymerizable composition having a very excellent photospeed. city The products sold include: urethane oligomer UAS-10, urethane oligomer UAB-140 (manufactured by Shanyang Guoce Pulp Co., Ltd.), UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd., DPHA-40H ( Manufactured by Nippon Kayaku Co., Ltd., UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha).

另外,亦較佳為具有酸基的乙烯性不飽和化合物類,市售品例如可列舉:東亞合成股份有限公司製造的含羧基的三官能丙烯酸酯TO-756、及含羧基的五官能丙烯酸酯TO-1382等。 Further, an ethylenically unsaturated compound having an acid group is also preferable, and commercially available products include, for example, a carboxyl group-containing trifunctional acrylate TO-756 manufactured by Toagosei Co., Ltd., and a carboxyl group-containing pentafunctional acrylate. TO-1382 and so on.

另外,亦較佳為二季戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯的琥珀酸單體及二季戊四醇三丙烯酸酯等。 Further, preferred are dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate succinic acid monomer, and dipentaerythritol triacrylate.

聚合性化合物更佳為四官能以上的丙烯酸酯化合物。 The polymerizable compound is more preferably a tetrafunctional or higher acrylate compound.

聚合性化合物可單獨使用一種,亦可組合使用兩種以上。 The polymerizable compound may be used alone or in combination of two or more.

關於感光性組成物中的含量,只要可進行充分的硬化反應,則並無特別限制,例如以質量換算計,相對於總固體成分100份,較佳為3份~55份,更佳為10份~50份。於聚合性化合物的含量在上述範圍內時,硬化反應充分進行。 The content of the photosensitive composition is not particularly limited as long as a sufficient curing reaction can be carried out. For example, it is preferably 3 parts to 55 parts, more preferably 10 parts by mass based on 100 parts by total solid content. ~50 servings. When the content of the polymerizable compound is within the above range, the hardening reaction proceeds sufficiently.

[黏合聚合物] [bonded polymer]

本發明的組成物中,為了提高皮膜特性等,視需要可於不損及本發明效果的範圍內進而使用結構與上述成分不同的其他黏合聚合物。黏合劑較佳為使用線性有機聚合物。此種「線性有機聚合物」可任意使用公知的聚合物。較佳為選擇於水或弱鹼性水中為可溶性或膨潤性的線性有機聚合物,以可進行水顯影或弱鹼性 水顯影。線性有機聚合物是根據不僅作為皮膜形成劑而且作為水、弱鹼性水或有機溶劑顯影劑的用途而選擇使用。 In the composition of the present invention, in order to improve the film properties and the like, other binder polymers having a structure different from the above components may be further used as long as the effects of the present invention are not impaired. The binder is preferably a linear organic polymer. A well-known polymer can be used arbitrarily for such a "linear organic polymer". Preferably, it is a linear or organic polymer which is soluble or swellable in water or weakly alkaline water for water development or weak alkalinity. Water development. The linear organic polymer is selected for use not only as a film forming agent but also as a developer of water, weakly alkaline water or an organic solvent.

例如,若使用水可溶性有機聚合物,則可進行水顯影。此種線性有機聚合物可列舉:於側鏈上具有羧酸基的自由基聚合物,例如日本專利特開昭59-44615號、日本專利特公昭54-34327號、日本專利特公昭58-12577號、日本專利特公昭54-25957號、日本專利特開昭54-92723號、日本專利特開昭59-53836號、日本專利特開昭59-71048號中記載的聚合物,即,使具有羧基的單體進行均聚合或共聚合所得的樹脂、使具有酸酐的單體進行均聚合或共聚合並使酸酐單元進行水解或半酯化或半醯胺化而成的樹脂、利用不飽和單羧酸及酸酐將環氧樹脂改質所得的環氧丙烯酸酯等。具有羧基的單體可列舉:丙烯酸、甲基丙烯酸、衣康酸、丁烯酸、馬來酸、富馬酸、4-羧基苯乙烯等,具有酸酐的單體可列舉馬來酸酐等。 For example, if a water-soluble organic polymer is used, water development can be performed. Examples of such a linear organic polymer include a radical polymer having a carboxylic acid group in a side chain, for example, Japanese Patent Laid-Open No. 59-44615, Japanese Patent Publication No. Sho 54-34327, and Japanese Patent Publication No. Sho 58-12577 The polymer described in Japanese Patent Laid-Open Publication No. Sho 54-25957, Japanese Patent Laid-Open Publication No. Sho 54-92723, Japanese Patent Laid-Open Publication No. Sho 59-53836, No. 59-71048, a resin obtained by homopolymerization or copolymerization of a monomer of a carboxyl group, a resin obtained by homopolymerizing or copolymerizing a monomer having an acid anhydride, and hydrolyzing or semi-esterifying or semi-aminating an acid anhydride unit, using an unsaturated single An epoxidized acrylate obtained by modifying an epoxy resin with a carboxylic acid or an acid anhydride. Examples of the monomer having a carboxyl group include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, and 4-carboxystyrene. Examples of the monomer having an acid anhydride include maleic anhydride.

另外,有同樣地於側鏈上具有羧酸基的酸性纖維素衍生物。除此以外,於具有羥基的聚合物上加成環狀酸酐所得的化合物等有用。 Further, there is an acidic cellulose derivative having a carboxylic acid group in the side chain as well. In addition to this, a compound obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group or the like is useful.

另外,日本專利特公平7-12004號、日本專利特公平7-120041號、日本專利特公平7-120042號、日本專利特公平8-12424號、日本專利特開昭63-287944號、日本專利特開昭63-287947號、日本專利特開平1-271741號、日本專利特願平10-116232號等中記載的含有酸基的胺基甲酸酯系黏合聚合物由 於強度非常優異,故於低曝光適性的方面有利。 In addition, Japanese Patent Laid-Open No. 7-12004, Japanese Patent Special Publication No. 7-120041, Japanese Patent Special Publication No. 7-120042, Japanese Patent Special Publication No. 8-12424, Japanese Patent Laid-Open No. 63-287944, Japanese Patent The acid group-containing urethane-based adhesive polymer described in JP-A-63-287947, JP-A No. 1-271741, and Japanese Patent Application No. Hei 10-116232, etc. It is excellent in strength and is therefore advantageous in terms of low exposure suitability.

另外,歐洲專利993966、歐洲專利1204000、日本專利特開2001-318463等中記載的具有酸基的縮醛改質聚乙烯基醇系黏合聚合物的膜強度、顯影性的平衡優異,因而較佳。進而,除此以外,聚乙烯基吡咯啶酮或聚環氧乙烷等作為水溶性線性有機聚合物而有用。另外,為了提高硬化皮膜的強度,醇可溶性尼龍或2,2-雙-(4-羥基苯基)-丙烷與表氯醇的聚醚等亦有用。 In addition, the acetal-modified polyvinyl alcohol-based binder polymer having an acid group described in the above-mentioned European Patent No. 993966, the European Patent No. 2001-318463, and the like has an excellent balance between film strength and developability, and thus is preferable. . Further, in addition to this, polyvinylpyrrolidone or polyethylene oxide is useful as a water-soluble linear organic polymer. Further, in order to increase the strength of the hardened film, alcohol-soluble nylon or a polyether of 2,2-bis-(4-hydroxyphenyl)-propane and epichlorohydrin or the like is also useful.

於使用可共存的其他黏合聚合物的情形時,相對於組成物的總固體成分中的含量較佳為0.1質量%~10.0質量%,就抑制圖案剝離同時抑制顯影殘渣的觀點而言,更佳為0.3質量%~6.0質量%,進而佳為1.0質量%~5.0質量%。 In the case of using another binder polymer which can coexist, the content in the total solid content of the composition is preferably from 0.1% by mass to 10.0% by mass, and it is more preferable from the viewpoint of suppressing pattern peeling while suppressing development residue. It is 0.3% by mass to 6.0% by mass, and more preferably 1.0% by mass to 5.0% by mass.

[其他著色劑] [other colorants]

關於可併用的著色劑,有機顏料中例如可列舉日本專利特開2008-224982號公報的段落編號[0030]~段落編號[0044]中記載的顏料,或將顏色索引(Color Index,C.I.)顏料綠(Pigment Green)58、C.I.顏料藍(Pigment Blue)79的Cl取代基變更為OH所得的顏料等,該些顏料中,可較佳地使用的顏料可列舉以下顏料。然而,本發明中不限定於該些顏料。 For the coloring agent which can be used in combination, for example, a pigment described in Paragraph No. [0030] to Paragraph No. [0044] of JP-A-2008-224982, or a color index (Color Index, CI) pigment can be mentioned. The pigments obtained by changing the Cl substituent of the Pigment Green 58 and the Pigment Blue 79 are changed to OH, and the pigments which can be preferably used among the pigments include the following pigments. However, the present invention is not limited to these pigments.

C.I.顏料黃(Pigment Yellow)11、C.I.顏料黃24、C.I.顏料黃108、C.I.顏料黃109、C.I.顏料黃110、C.I.顏料黃138、C.I.顏料黃139、C.I.顏料黃150、C.I.顏料黃151、C.I.顏料黃154、C.I.顏料黃167、C.I.顏料黃180、C.I.顏料黃185, C.I.顏料橙(Pigment Orange)36,C.I.顏料紅(Pigment Red)122、C.I.顏料紅150、C.I.顏料紅171、C.I.顏料紅175、C.I.顏料紅177、C.I.顏料紅209、C.I.顏料紅224、C.I.顏料紅242、C.I.顏料紅254、C.I.顏料紅255,C.I.顏料紫(Pigment Violet)19、C.I.顏料紫23、C.I.顏料紫29、C.I.顏料紫32,C.I.顏料藍(Pigment Blue)15:1、C.I.顏料藍15:3、C.I.顏料藍15:6、C.I.顏料藍16、C.I.顏料藍22、C.I.顏料藍60、C.I.顏料藍66,C.I.顏料綠(Pigment Green)7、C.I.顏料綠36、C.I.顏料綠37、C.I.顏料綠58 CI Pigment Yellow 11, CI Pigment Yellow 24, CI Pigment Yellow 108, CI Pigment Yellow 109, CI Pigment Yellow 110, CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 151, CI Pigment Yellow 154, CI Pigment Yellow 167, CI Pigment Yellow 180, CI Pigment Yellow 185, CI Pigment Orange 36, CI Pigment Red 122, CI Pigment Red 150, CI Pigment Red 171, CI Pigment Red 175, CI Pigment Red 177, CI Pigment Red 209, CI Pigment Red 224, CI Pigment Red 242, CI Pigment Red 254, CI Pigment Red 255, CI Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29, CI Pigment Violet 32, CI Pigment Blue (Pigment Blue) 15:1, CI Pigment Blue 15:3, CI Pigment Blue 15:6, CI Pigment Blue 16, CI Pigment Blue 22, CI Pigment Blue 60, CI Pigment Blue 66, CI Pigment Green 7, Pig Pigment Green 36, CI Pigment Green 37 , CI Pigment Green 58

C.I.顏料黑(Pigment Black)1 C.I. Pigment Black 1

可用作著色劑的染料並無特別限制,可適當選擇使用公知的染料。例如為日本專利特開昭64-90403號公報、日本專利特開昭64-91102號公報、日本專利特開平1-94301號公報、日本專利特開平6-11614號公報、日本專利特登2592207號、美國專利第4,808,501號說明書、美國專利第5,667,920號說明書、美國專利第5,059,500號說明書、日本專利特開平5-333207號公報、日本專利特開平6-35183號公報、日本專利特開平6-51115號公報、日本專利特開平6-194828號公報、日本專利特開平8-211599號公報、日本專利特開平4-249549號公報、日本專利特開平10-123316號公報、日本專利特開平11-302283號公報、日本專利特開平 7-286107號公報、日本專利特開2001-4823號公報、日本專利特開平8-15522號公報、日本專利特開平8-29771號公報、日本專利特開平8-146215號公報、日本專利特開平11-343437號公報、日本專利特開平8-62416號公報、日本專利特開2002-14220號公報、日本專利特開2002-14221號公報、日本專利特開2002-14222號公報、日本專利特開2002-14223號公報、日本專利特開平8-302224號公報、日本專利特開平8-73758號公報、日本專利特開平8-179120號公報、日本專利特開平8-151531號公報等中記載的色素。 The dye which can be used as the colorant is not particularly limited, and a known dye can be appropriately selected and used. For example, Japanese Patent Laid-Open No. Sho 64-90403, Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. U.S. Patent No. 4,808,501, U.S. Patent No. 5,667,920, U.S. Patent No. 5,059,500, U.S. Patent No. 5,333,500, Japanese Patent Application Laid-Open No. Hei No. Hei No. Hei. Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Gazette, Japanese Patent Special Open Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Hei. Hei. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. A pigment described in, for example, Japanese Laid-Open Patent Publication No. Hei 8- No. Hei 8- No. Hei. .

化學結構可使用吡唑偶氮系、苯胺基偶氮系、三苯基甲烷系、蒽醌系、蒽吡啶酮系、亞苄基系、氧雜菁(oxonol)系、吡唑并三唑偶氮系、吡啶酮偶氮系、花青系、酚噻嗪(phenothiazine)系、吡咯并吡唑偶氮次甲基系、二苯并哌喃系、酞菁系、苯并吡喃系、靛藍系等的染料。 As the chemical structure, a pyrazole azo type, an anilino azo type, a triphenylmethane type, an anthraquinone type, an anthrapyridone type, a benzylidene type, an oxonol type, and a pyrazolotriazole couple can be used. Nitrogen, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, dibenzopyran, phthalocyanine, benzopyran, indigo a dye such as a system.

[有機溶劑] [Organic solvents]

於本發明的組成物中,使用有機溶劑。有機溶劑只要滿足各成分的溶解性或聚合性組成物的塗佈性,則基本上無特別限制,尤佳為考慮到紫外線吸收劑、黏合劑的溶解性、塗佈性、安全性,以成為適當的黏度固體成分濃度的方式選擇種類及量。另外,於製備感光性組成物時,較佳為含有至少兩種有機溶劑。 In the composition of the present invention, an organic solvent is used. The organic solvent is not particularly limited as long as it satisfies the solubility of each component or the coating property of the polymerizable composition, and it is particularly preferable to consider the solubility of the ultraviolet absorber and the binder, the coatability, and the safety. The type and amount are selected in a manner suitable for the concentration of the solid component of the viscosity. Further, in the preparation of the photosensitive composition, it is preferred to contain at least two kinds of organic solvents.

有機溶劑可較佳地列舉:作為酯類的例如乙酸乙酯、乙酸正丁酯、乙酸異丁酯、甲酸戊酯、乙酸異戊酯、乙酸異丁酯、 丙酸丁酯、丁酸異丙酯、丁酸乙酯、丁酸丁酯、乳酸甲酯、乳酸乙酯、氧基乙酸烷基酯(例如氧基乙酸甲酯、氧基乙酸乙酯、氧基乙酸丁酯(例如甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯等))、3-氧基丙酸烷基酯類(例如3-氧基丙酸甲酯、3-氧基丙酸乙酯等(例如3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯等))、2-氧基丙酸烷基酯類(例如2-氧基丙酸甲酯、2-氧基丙酸乙酯、2-氧基丙酸丙酯等(例如2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-甲氧基丙酸丙酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯))、2-氧基-2-甲基丙酸甲酯及2-氧基-2-甲基丙酸乙酯(例如2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸乙酯等)、丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧代丁酸甲酯、2-氧代丁酸乙酯等;以及作為醚類的例如二乙二醇二甲醚、四氫呋喃、乙二醇單甲醚、乙二醇單乙醚、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚、丙二醇單甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯等;以及作為酮類的例如甲基乙基酮、環己酮、2-庚酮、3-庚酮等;以及作為芳香族烴類的例如甲苯、二甲苯等。 The organic solvent is preferably exemplified by esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, Butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, alkyl oxyacetate (eg methyl oxyacetate, ethyl oxyacetate, oxygen) Butyl acetate (eg methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.), 3-oxypropionic acid Alkyl esters (eg methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. (eg methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxy) Methyl propyl propionate, ethyl 3-ethoxypropionate, etc.), alkyl 2-oxypropionate (eg methyl 2-oxypropionate, ethyl 2-oxypropionate, 2 -propyl oxypropionate or the like (for example, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, Ethyl 2-ethoxypropionate)), methyl 2-oxy-2-methylpropanoate and ethyl 2-oxy-2-methylpropionate (eg 2-methoxy-2-methyl) Methyl propyl propionate, ethyl 2-ethoxy-2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate, 2-oxobutyl Methyl ester, ethyl 2-oxobutanoate, etc.; and as ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate Ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether An acid ester, propylene glycol monopropyl ether acetate, etc.; and as a ketone such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc.; and as an aromatic hydrocarbon such as toluene, Toluene, etc.

就改良鹼可溶性樹脂的溶解性、塗佈面狀等觀點而言, 該些有機溶劑亦較佳為將兩種以上混合。於該情形時,尤佳為由選自以下溶劑中的兩種以上構成的混合溶液:上述3-乙氧基丙酸 甲酯、3-乙氧基丙酸乙酯、乙基溶纖劑乙酸酯、乳酸乙酯、二乙二醇二甲醚、乙酸丁酯、3-甲氧基丙酸甲酯、2-庚酮、環己酮、乙基卡必醇乙酸酯、丁基卡必醇乙酸酯、丙二醇甲醚及丙二醇甲醚乙酸酯。 From the viewpoints of improving the solubility of the alkali-soluble resin and coating the surface, These organic solvents are also preferably mixed in two or more kinds. In this case, a mixed solution composed of two or more selected from the group consisting of the above 3-ethoxypropionic acid is preferred. Methyl ester, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2- Heptone, cyclohexanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether and propylene glycol methyl ether acetate.

就塗佈性的觀點而言,有機溶劑的含量較佳為設定為組 成物的總固體成分濃度成為5質量%~80質量%的量,更佳為5質量%~60質量%,尤佳為10質量%~50質量%。 From the viewpoint of coatability, the content of the organic solvent is preferably set to be a group The total solid content concentration of the product is from 5% by mass to 80% by mass, more preferably from 5% by mass to 60% by mass, even more preferably from 10% by mass to 50% by mass.

[增感劑] [sensitizer]

於本發明的組成物中,以聚合起始劑的自由基產生效率的提高、感光波長的長波長化為目的,亦可含有增感劑。增感劑較佳為藉由電子轉移機制或能量轉移機制使併用的聚合起始劑增感。 增感劑的較佳例可列舉日本專利特開2008-214395號公報的段落編號[0085]~段落編號[0098]中記載的化合物。就感度及保存穩定性的觀點而言,相對於組成物的總固體成分的質量,增感劑的含量較佳為0.1質量%~30質量%的範圍,更佳為1質量%~20質量%的範圍,進而佳為2質量%~15質量%的範圍。 In the composition of the present invention, the sensitizer may be contained for the purpose of improving the radical generating efficiency of the polymerization initiator and increasing the wavelength of the photosensitive wavelength. The sensitizer is preferably sensitized by a combined polymerization initiator by an electron transfer mechanism or an energy transfer mechanism. Preferable examples of the sensitizer include the compounds described in Paragraph No. [0085] to Paragraph No. [0098] of JP-A-2008-214395. The content of the sensitizer is preferably in the range of 0.1% by mass to 30% by mass, more preferably 1% by mass to 20% by mass, based on the mass of the total solid content of the composition, from the viewpoint of sensitivity and storage stability. The range is preferably in the range of 2% by mass to 15% by mass.

[聚合抑制劑] [Polymerization inhibitor]

於本發明的組成物的製造過程中或保存過程中,理想的是添加少量的聚合抑制劑以阻止聚合性化合物的不需要的熱聚合。聚合抑制劑可使用公知的熱聚合防止劑,具體可列舉:對苯二酚、對甲氧基苯酚、二-第三丁基對甲酚、聯苯三酚、第三丁基鄰苯二酚、苯醌、4,4'-硫代雙(3-甲基-6-第三丁基苯酚)、2,2'-亞甲基雙(4- 甲基-6-第三丁基苯酚)、N-亞硝基苯基羥基胺亞鈰鹽等。 In the manufacturing process or during the storage of the composition of the present invention, it is desirable to add a small amount of a polymerization inhibitor to prevent unnecessary thermal polymerization of the polymerizable compound. A known thermal polymerization inhibitor can be used as the polymerization inhibitor, and specific examples thereof include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, biphenyltriol, and tert-butyl catechol. , benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4- Methyl-6-tert-butylphenol), N-nitrosophenylhydroxylamine sulfonium salt, and the like.

相對於組成物的總固體成分,熱聚合防止劑的添加量較佳為約0.01質量%~約5質量%。 The amount of the thermal polymerization inhibitor added is preferably from about 0.01% by mass to about 5% by mass based on the total solid content of the composition.

另外,視需要,為了防止因氧抑制聚合的情況,亦可添加山崳酸或山崳酸醯胺般的高級脂肪酸衍生物等,並使其於塗佈後的乾燥過程偏向塗佈膜的表面。高級脂肪酸衍生物的添加量較佳為總組成物的約0.5質量%~約10質量%。 Further, in order to prevent polymerization from being inhibited by oxygen, a higher fatty acid derivative such as maslinic acid or decyl amide may be added, and the drying process after coating may be applied to the surface of the coating film. . The amount of the higher fatty acid derivative added is preferably from about 0.5% by mass to about 10% by mass based on the total composition.

[密接改良劑] [Close Connection Improver]

於本發明的組成物中,為了提高與支持體等的硬質表面的密接性,可添加密接改良劑。密接改良劑可列舉矽烷系偶合劑、鈦偶合劑等。 In the composition of the present invention, in order to improve the adhesion to the hard surface of the support or the like, an adhesion improving agent may be added. Examples of the adhesion improving agent include a decane coupling agent and a titanium coupling agent.

矽烷系偶合劑較佳為γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三乙氧基矽烷、γ-丙烯醯氧基丙基三甲氧基矽烷、γ-丙烯醯氧基丙基三乙氧基矽烷、γ-巰基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基二甲氧基甲基矽烷、γ-胺基丙基三乙氧基矽烷、苯基三甲氧基矽烷,可較佳地列舉γ-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基二甲氧基甲基矽烷。 The decane coupling agent is preferably γ-methacryloxypropyltrimethoxydecane, γ-methylpropenyloxypropyltriethoxydecane, γ-propyleneoxypropyltrimethoxydecane. , γ-acryloxypropyltriethoxydecane, γ-mercaptopropyltrimethoxydecane, 3-methylpropenyloxypropyldimethoxymethylnonane, γ-aminopropyltri As the ethoxy decane or phenyltrimethoxy decane, γ-methacryloxypropyltrimethoxydecane and 3-methylpropenyloxypropyldimethoxymethylnonane are preferable.

於組成物的總固體成分中,密接改良劑的添加量較佳為0.5質量%~30質量%,更佳為0.7質量%~20質量%。 The amount of the adhesion improving agent added is preferably from 0.5% by mass to 30% by mass, and more preferably from 0.7% by mass to 20% by mass, based on the total solid content of the composition.

[界面活性劑] [Surfactant]

於本發明的組成物中,就進一步提高塗佈性的觀點而言,亦可添加各種界面活性劑。界面活性劑可使用氟系界面活性劑、非 離子系界面活性劑、陽離子系界面活性劑、陰離子系界面活性劑、矽酮系界面活性劑等各種界面活性劑。 In the composition of the present invention, various surfactants may be added from the viewpoint of further improving coatability. Surfactants can use fluorine-based surfactants, non- Various surfactants such as an ion-based surfactant, a cationic surfactant, an anionic surfactant, and an anthrone-based surfactant.

尤其本發明的較佳實施形態的組成物藉由含有氟系界 面活性劑,製備成塗佈液時的溶液特性(特別是流動性)進一步提高,故可進一步改善塗佈厚度的均勻性或省液性。 In particular, the composition of the preferred embodiment of the present invention contains a fluorine-based boundary The surface active agent has a further improved solution property (particularly fluidity) when it is prepared as a coating liquid, so that the uniformity of the coating thickness or the liquid-saving property can be further improved.

即,於使用應用含有氟系界面活性劑的組成物的塗佈液來形成膜的情形時,藉由使被塗佈面與塗佈液的界面張力降低,對被塗佈面的濡濕性得到改善,對被塗佈面的塗佈性提高。因此,即便於以少量的液量來形成幾微米(μm)左右的薄膜的情形時,亦可更佳地進行厚度不均一小的均勻厚度的膜形成,就此方面而言有效。 In other words, when a film is formed by using a coating liquid containing a composition containing a fluorine-based surfactant, the wettability of the surface to be coated is obtained by lowering the interfacial tension between the surface to be coated and the coating liquid. The coating property of the coated surface is improved. Therefore, even when a film having a thickness of about several micrometers (μm) is formed with a small amount of liquid, it is possible to more preferably form a film having a uniform thickness and a small thickness, which is effective in this respect.

氟系界面活性劑中的氟含有率較佳為3質量%~40質量 %,更佳為5質量%~30質量%,尤佳為7質量%~25質量%。若氟含有率在該範圍內,則氟系界面活性劑於塗佈膜的厚度均勻性或省液性的方面有效,於組成物中的溶解性亦良好。 The fluorine content in the fluorine-based surfactant is preferably from 3% by mass to 40% by mass. % is more preferably 5% by mass to 30% by mass, particularly preferably 7% by mass to 25% by mass. When the fluorine content is within this range, the fluorine-based surfactant is effective in thickness uniformity and liquid-saving property of the coating film, and solubility in the composition is also good.

氟系界面活性劑例如可列舉:美佳法(Megafac)F171、 美佳法(Megafac)F172、美佳法(Megafac)F173、美佳法(Megafac)F176、美佳法(Megafac)F177、美佳法(Megafac)F141、美佳法(Megafac)F142、美佳法(Megafac)F143、美佳法(Megafac)F144、美佳法(Megafac)R30、美佳法(Megafac)F437、美佳法(Megafac)F475、美佳法(Megafac)F479、美佳法(Megafac)F482、美佳法(Megafac)F554、美佳法(Megafac)F780、美佳 法(Megafac)F781(以上為迪愛生(DIC)(股)製造),弗拉德(Fluorad)FC430、弗拉德(Fluorad)FC431、弗拉德(Fluorad)FC171(以上為住友3M(股)製造),沙福隆(Surflon)S-382、沙福隆(Surflon)SC-101、沙福隆(Surflon)SC-103、沙福隆(Surflon)SC-104、沙福隆(Surflon)SC-105、沙福隆(Surflon)SC1068、沙福隆(Surflon)SC-381、沙福隆(Surflon)SC-383、沙福隆(Surflon)S393、沙福隆(Surflon)KH-40(以上為旭硝子(股)製造),索努帕斯(Solsperse)20000(日本路博潤(Lubrizol)(股)製造)等。 Examples of the fluorine-based surfactant include Megafac F171. Megafac F172, Megafac F173, Megafac F176, Megafac F177, Megafac F141, Megafac F142, Megafac F143, Meijia Method (Megafac) F144, Megafac R30, Megafac F437, Megafac F475, Megafac F479, Megafac F482, Megafac F554, Meijiafa (Megafac) F780, Meijia Method (Megafac) F781 (above is made by Di Aisheng (DIC)), Fluorad FC430, Fluorad FC431, Fluorad FC171 (above Sumitomo 3M) Manufacturing), Surflon S-382, Surflon SC-101, Surflon SC-103, Surflon SC-104, Surflon SC -105, Surflon SC1068, Surflon SC-381, Surflon SC-383, Surflon S393, Surflon KH-40 (above) Manufactured by Asahi Glass Co., Ltd., Solsperse 20000 (made by Lubrizol Co., Ltd.).

非離子系界面活性劑具體可列舉:甘油、三羥甲基丙 烷、三羥甲基乙烷以及該等的乙氧基化物及丙氧基化物(例如丙氧基化甘油、乙氧基化甘油等)、聚氧伸乙基月桂基醚、聚氧伸乙基硬脂基醚、聚氧伸乙基油基醚、聚氧伸乙基辛基苯基醚、聚氧伸乙基壬基苯基醚、聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯、山梨糖醇酐脂肪酸酯(巴斯夫(BASF)公司製造的普羅尼克(Pluronic)L10、普羅尼克(Pluronic)L31、普羅尼克(Pluronic)L61、普羅尼克(Pluronic)L62、普羅尼克(Pluronic)10R5、普羅尼克(Pluronic)17R2、普羅尼克(Pluronic)25R2、特羅尼克(Tetronic)304、特羅尼克(Tetronic)701、特羅尼克(Tetronic)704、特羅尼克(Tetronic)901、特羅尼克(Tetronic)904、特羅尼克(Tetronic)150R1等。 Specific examples of the nonionic surfactant include glycerin and trimethylolpropane. Alkanes, trimethylolethane, and such ethoxylates and propoxylates (e.g., propoxylated glycerol, ethoxylated glycerol, etc.), polyoxyethylene ethyl lauryl ether, polyoxyethylene Stearyl ether, polyoxyethylene ethyl oleyl ether, polyoxyethyl octyl phenyl ether, polyoxyethyl phenyl ether, polyethylene glycol dilaurate, polyethylene glycol Distearate, sorbitan fatty acid ester (Pluronic L10, Pluronic L31, Pluronic L61, Pluronic L62, Pro, manufactured by BASF) Pluronic 10R5, Pluronic 17R2, Pluronic 25R2, Tetronic 304, Tetronic 701, Tetronic 704, Tetronic 901, Tetronic 904, Tetronic 150R1, and the like.

陽離子系界面活性劑具體可列舉:酞菁衍生物(商品 名:EFKA-745,森下產業(股)製造),有機矽氧烷聚合物KP341(信越化學工業(股)製造),(甲基)丙烯酸系(共)聚合物波利弗洛(Polyflow)No.75、波利弗洛(Polyflow)No.90、波利弗洛(Polyflow)No.95(共榮社化學(股)製造),W001(裕商(股)製造)等。 Specific examples of the cationic surfactant include phthalocyanine derivatives (products). Name: EFKA-745, manufactured by Morishita Industry Co., Ltd.), organic siloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth)acrylic (co)polymer Polyflow No. .75, Polyflow No. 90, Polyflow No. 95 (manufactured by Kyoeisha Chemical Co., Ltd.), W001 (manufactured by Yusho Co., Ltd.), and the like.

陰離子系界面活性劑具體可列舉W004、W005、W017 (裕商(股)公司製造)等。 Specific examples of the anionic surfactants include W004, W005, and W017. (Manufactured by Yushang Co., Ltd.), etc.

矽酮系界面活性劑例如可列舉:東麗道康寧(Toray Dow-corning)(股)製造的「東麗矽酮(Toray Silicone)DC3PA」、「東麗矽酮(Toray Silicone)SH7PA」、「東麗矽酮(Toray Silicone)DC11PA」、「東麗矽酮(Toray Silicone)SH21PA」、「東麗矽酮(Toray Silicone)SH28PA」、「東麗矽酮(Toray Silicone)SH29PA」、「東麗矽酮(Toray Silicone)SH30PA」、「東麗矽酮(Toray Silicone)SH8400」,邁圖高新材料(Momentive Performance Materials)公司製造的「TSF-4440」、「TSF-4300」、「TSF-4445」、「TSF-4460」、「TSF-4452」,信越矽酮股份有限公司製造的「KP341」、「KF6001」、「KF6002」,畢克化學(BYK Chemie)公司製造的「BYK307」、「BYK323」、「BYK330」等。 Examples of the fluorenone-based surfactants include: Toray Dow Corning (Toray) "Toray Silicone DC3PA", "Toray Silicone SH7PA", "Toray Silicone DC11PA", "Torayone" manufactured by Dow-corning) (Toray Silicone) SH21PA", "Toray Silicone SH28PA", "Toray Silicone SH29PA", "Toray Silicone SH30PA", "Torayone (Toray) Silicone) SH8400", "TSF-4440", "TSF-4300", "TSF-4445", "TSF-4460", "TSF-4452" manufactured by Momentive Performance Materials, Inc. "KP341", "KF6001", "KF6002" manufactured by the company, "BYK307", "BYK323", "BYK330" manufactured by BYK Chemie.

界面活性劑可僅使用一種,亦可組合兩種以上。相對於組成物的總固體成分質量,界面活性劑的添加量較佳為0.001質量%~2.0質量%,更佳為0.005質量%~1.0質量%。 The surfactant may be used alone or in combination of two or more. The amount of the surfactant added is preferably 0.001% by mass to 2.0% by mass, and more preferably 0.005% by mass to 1.0% by mass based on the total solid content of the composition.

[其他添加劑] [Other additives]

進而,對於本發明的組成物,亦能以進一步提高增感色素或起始劑對活性放射線的感度、或抑制由氧妨礙光聚合性化合物的聚合等為目的而含有共增感劑。另外,為了改良硬化皮膜的物性,視需要亦可添加界面活性劑、稀釋劑、塑化劑、感脂劑等公知的添加劑。 Furthermore, the composition of the present invention can further contain a co-sensitizer for the purpose of further improving the sensitivity of the sensitizing dye or the initiator to the active radiation or suppressing the polymerization of the photopolymerizable compound by oxygen. Further, in order to improve the physical properties of the cured film, a known additive such as a surfactant, a diluent, a plasticizer or a fat-sensitive agent may be added as needed.

[灰色硬化膜] [Gray hardened film]

本發明的較佳實施形態的灰色硬化膜可藉由使上述感光性組成物硬化而形成。此處,若對灰色加以定義,則是指對於透射既定的膜時的透射光而言,於取出波長為400nm~700nm(可見光範圍)的光時,其透射率(25℃)的變動量(λ400-700)為30%以下。 若為了慎重起見而對上述變動量的求出方法加以補充說明,則首先於波長400nm~700nm的範圍內求出透射率光譜。取出其中的透射率的最大值(Tmax)與最小值(Tmin),將其差(Tmax-Tmin)設定為上述透射率的變動量。該變動量較佳為20%以下。該變動量並無特別的下限值,但實際上為0.1%以上。換言之,較佳為於上述可見光範圍的特定波長下不具有過度的吸收峰值,較佳為於該範圍內整體呈現出平坦狀態的透射光譜。該透射率及其變動量只要無特別說明,則設定為利用後述實施例中測定的值。如此,藉由設定為在特定波長下不顯示出過度吸收的良好的灰色硬化膜,例如可於用作攝影元件的灰色畫素時實現透射率並無偏差的良好性能。 The gray cured film of the preferred embodiment of the present invention can be formed by curing the photosensitive composition. Here, the term "gray" is defined as the amount of change in transmittance (25 ° C) when light having a wavelength of 400 nm to 700 nm (visible range) is taken out for transmitted light when a predetermined film is transmitted ( λ 400-700 ) is 30% or less. In order to supplement the description of the above-described variation amount for the sake of caution, the transmittance spectrum is first obtained in the range of wavelengths of 400 nm to 700 nm. The maximum value (Tmax) and the minimum value (Tmin) of the transmittance are taken out, and the difference (Tmax - Tmin) is set as the amount of change in the above transmittance. The amount of variation is preferably 20% or less. There is no particular lower limit for this amount of variation, but it is actually 0.1% or more. In other words, it is preferable to have no excessive absorption peak at a specific wavelength in the visible light range, and it is preferable to exhibit a flat transmission spectrum as a whole in the range. The transmittance and the amount of fluctuation thereof are set to values measured in Examples described later unless otherwise specified. As described above, by setting a good gray cured film which does not exhibit excessive absorption at a specific wavelength, for example, it can be used as a gray pixel of a photographic element to achieve good performance without variation in transmittance.

灰色硬化膜於400nm~700nm下的透射率的最小值較 佳為50%以上,更佳為60%以上。另外,400nm~700nm下的透射率的最大值較佳為90%以下,更佳為85%以下。藉由將透射率設定為此種範圍,尤其於用作攝影元件的灰色畫素時,可應對感度的提高或動態範圍的擴大的要求而實現良好的性能。 The minimum value of the transmittance of the gray cured film at 400nm~700nm Preferably, it is 50% or more, more preferably 60% or more. Further, the maximum value of the transmittance at 400 nm to 700 nm is preferably 90% or less, more preferably 85% or less. By setting the transmittance to such a range, particularly when used as a gray pixel for a photographic element, it is possible to achieve good performance in response to an increase in sensitivity or an increase in dynamic range.

本發明中,灰色硬化膜較佳為具有既定的折射率。藉由 如此般設定,例如可於用作攝影元件的灰色畫素時,不引起與鄰接著色畫素(R畫素、G畫素、B畫素)的光的干涉,較佳地發揮灰色畫素所要求的性能。就上述觀點而言,灰色畫素的折射率(25℃)較佳為超過1.60,更佳為1.65以上,尤佳為1.70以上。 上限值較佳為2.00以下,更佳為1.95以下。再者,於本發明中,膜的折射率只要無特別說明,則設定為使用後述實施例中測定的633nm下的值。 In the present invention, the gray cured film preferably has a predetermined refractive index. By In such a manner, for example, when used as a gray pixel of an imaging element, interference with light adjacent to the coloring pixels (R pixel, G pixel, B pixel) is not caused, and the gray pixel is preferably used. Required performance. From the above viewpoints, the refractive index (25 ° C) of the gray pixel is preferably more than 1.60, more preferably 1.65 or more, and still more preferably 1.70 or more. The upper limit is preferably 2.00 or less, more preferably 1.95 or less. In the present invention, the refractive index of the film is set to a value at 633 nm measured in Examples described later unless otherwise specified.

[實施例] [Examples]

以下,列舉實施例對本發明加以更詳細說明,但本發明不限定於以下的實施例。 Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited to the following examples.

<實施例1、比較例1> <Example 1 and Comparative Example 1>

(二氧化鈦分散液的製備) (Preparation of titanium dioxide dispersion)

使用壽工業股份有限公司製造的超微粉碎研磨機(Ultra Apex Mill)(商品名)作為循環型分散裝置(珠磨機),對下述組成的混合液如以下般進行分散處理,獲得作為分散組成物的二氧化鈦分散液。 An ultrafine pulverizing mill (Ultra Apex Mill) (trade name) manufactured by Shou Industrial Co., Ltd. was used as a circulating type dispersing device (bead mill), and a mixed liquid having the following composition was subjected to dispersion treatment as follows to obtain dispersion. A titanium dioxide dispersion of the composition.

<組成> <composition>

.二氧化鈦(石原產業(股)製造,商品名:TTO-51(C)):212.5份 . Titanium dioxide (Ishihara Industry Co., Ltd., trade name: TTO-51 (C)): 212.5 parts

.下述特定分散樹脂(A)(20%丙二醇單甲醚乙酸酯(以下簡稱為「PGMEA」)溶液):286.9份 . The following specific dispersion resin (A) (20% propylene glycol monomethyl ether acetate (hereinafter abbreviated as "PGMEA") solution): 286.9 parts

.PGMEA:350.6份 . PGMEA: 350.6 parts

於特定分散樹脂(A)中,k:l:m:n=25:40:5:30(聚合莫耳比),p=60,q=60,重量平均分子量為10,000。 In the specific dispersion resin (A), k:l:m:n=25:40:5:30 (polymerized molar ratio), p=60, q=60, and the weight average molecular weight was 10,000.

另外,分散裝置是於以下條件下運轉。 Further, the dispersion device was operated under the following conditions.

.珠粒粒徑:φ 0.05mm . Bead size: φ 0.05mm

.珠粒填充率:75體積% . Bead filling rate: 75% by volume

.周速:8m/sec . Weekly speed: 8m/sec

.泵供給量:10Kg/hour . Pump supply: 10Kg/hour

.冷卻水:自來水 . Cooling water: tap water

.珠磨機環狀通路內容積:0.15L . Bead mill annular passage internal volume: 0.15L

.進行分散處理的混合液量:0.44Kg . The amount of the mixed solution for dispersion treatment: 0.44Kg

藉由後述動態光散射法來求出所得的分散液所含的二 氧化鈦粒子的平均粒徑,結果為30nm。 The two dispersions contained in the obtained dispersion liquid were obtained by a dynamic light scattering method described later. The average particle diameter of the titanium oxide particles was 30 nm.

(分散劑1的合成) (Synthesis of Dispersant 1)

於500mL三口燒瓶中導入ε-己內酯600.0g、2-乙基-1-己醇22.8g,吹入氮氣同時進行攪拌溶解。添加氧化單丁基錫0.1g,加熱至100℃。8小時後,藉由氣相層析法(gas chromatography)確認到原料消失後,冷卻至80℃為止。添加2,6-二-第三丁基-4-甲基苯酚0.1g後,添加2-甲基丙烯醯氧基乙基異氰酸酯27.2g。5小時後,藉由1H-核磁共振(Nuclear Magnetic Resonance,NMR)確認到原料消失後,冷卻至室溫為止,獲得固體狀的前驅物M1[下述結構]200g。藉由1H-NMR、紅外(Infrared,IR)、質譜分析確認到所得的化合物為M1。 600.0 g of ε-caprolactone and 22.8 g of 2-ethyl-1-hexanol were introduced into a 500 mL three-necked flask, and the mixture was stirred and dissolved while blowing nitrogen gas. 0.1 g of monobutyltin oxide was added and heated to 100 °C. After 8 hours, it was confirmed by gas chromatography that the raw material disappeared and then cooled to 80 °C. After 0.1 g of 2,6-di-tert-butyl-4-methylphenol was added, 27.2 g of 2-methylpropenyloxyethyl isocyanate was added. After 5 hours, it was confirmed by 1 H-NMR (Nuclear Magnetic Resonance, NMR) that the disappearance of the starting material was carried out, and after cooling to room temperature, 200 g of a solid precursor M1 [the following structure] was obtained. It was confirmed by 1 H-NMR, infrared (IR), mass spectrometry that the obtained compound was M1.

將上述前驅物M1 30.0g、NK酯CB-1(鄰苯二甲酸-β-甲基丙烯醯氧基氧基乙基氫酯(β-Methacryloyl Oxyethyl Hydrogen Phthalate))70.0g、十二烷基硫醇2.3g及丙二醇單甲醚乙酸酯233.3g導入至經氮氣取代的三口燒瓶中,利用攪拌機(新東科學(股):三一馬達(Three One Motor))進行攪拌,於燒瓶內流通 氮氣同時進行加熱而升溫至75℃為止。於其中添加2,2-偶氮雙(2-甲基丙酸)二甲酯(和光純藥(股)製造的「V-601」)0.2g,於75℃下進行2小時加熱攪拌。2小時後,進一步添加V-601 0.2g並進行3小時加熱攪拌後,獲得下述結構的分散劑1的30%溶液。 30.0 g of the above precursor M1, NK ester CB-1 (β-Methacryloyl Oxyethyl Hydrogen Phthalate) 70.0 g, dodecyl sulfur 2.3 g of alcohol and 233.3 g of propylene glycol monomethyl ether acetate were introduced into a three-necked flask substituted with nitrogen, and stirred by a stirrer (New One Science) to circulate in the flask. Nitrogen gas was simultaneously heated and heated to 75 °C. 0.2 g of 2,2-azobis(2-methylpropionic acid) dimethyl ester ("V-601" manufactured by Wako Pure Chemical Industries, Ltd.) was added thereto, and the mixture was stirred under heating at 75 ° C for 2 hours. After 2 hours, 0.2 g of V-601 was further added and heated and stirred for 3 hours, and a 30% solution of Dispersant 1 having the following structure was obtained.

x:y=90:10 x:y=90:10

分散劑1的組成比、酸值及重量平均分子量(Mw)如下所述。 The composition ratio, acid value, and weight average molecular weight (Mw) of the dispersing agent 1 are as follows.

再者,重量平均分子量是藉由上述所定義的測定條件來測定。 Further, the weight average molecular weight is measured by the measurement conditions defined above.

.組成比:x=33(質量%),y=67(質量%) . Composition ratio: x = 33 (% by mass), y = 67 (% by mass)

.酸值:85mgKOH/g,Mw:35,000 . Acid value: 85 mgKOH/g, Mw: 35,000

(鈦黑分散液的製備) (Preparation of titanium black dispersion)

使用攪拌機(儀科(IKA)公司製造歐洲之星(EUROSTAR))將下述組成1所示的成分混合15分鐘,獲得分散混合物。 The components shown in the following composition 1 were mixed for 15 minutes using a stirrer (Eurostar (IKOSTAR) manufactured by IKK) to obtain a dispersion mixture.

(組成1) (composition 1)

.(A)鈦黑(三菱材料製造的13M-T(粉體))…24份 . (A) Titanium black (13M-T (powder) manufactured by Mitsubishi Materials)...24 parts

.(B)分散劑1的30質量%PGMEA溶液…25份 . (B) 30% by mass PGMEA solution of Dispersant 1 ... 25 parts

.(C)有機溶劑:PGMEA…25份 . (C) Organic solvent: PGMEA...25 parts

.(D)有機溶劑:乙酸丁酯…26份 . (D) Organic solvent: butyl acetate...26 parts

使用新丸企業(Shinmaru Enterprises)公司製造的珠磨機NPM以及循環式的配管及投入罐,對所得的分散混合物於下述條件下進行分散處理,獲得鈦黑分散液2000g。 Using the bead mill NPM manufactured by Shinmaru Enterprises Co., Ltd., and the circulating piping and the input tank, the obtained dispersion mixture was subjected to dispersion treatment under the following conditions to obtain 2000 g of a titanium black dispersion.

<分散條件> <dispersion conditions>

.珠粒粒徑:φ 0.05mm . Bead size: φ 0.05mm

.珠粒填充率:60體積% . Bead filling rate: 60% by volume

.磨機周速:10m/sec . Mill peripheral speed: 10m/sec

.進行分散處理的混合液量:5000g . The amount of the mixture to be dispersed: 5000 g

.循環流量(泵供給量):30kg/hour . Circulating flow (pump supply): 30kg/hour

.處理液溫度:25℃~30℃ . Treatment liquid temperature: 25 ° C ~ 30 ° C

.冷卻水:自來水 . Cooling water: tap water

.處理時間:30循環(pass) . Processing time: 30 cycles (pass)

(感光性組成物101的製備) (Preparation of photosensitive composition 101)

使用上述所得的二氧化鈦分散液(分散組成物),以成為以下組成的方式混合各成分而獲得感光性組成物。 Using the titanium dioxide dispersion liquid (dispersion composition) obtained above, the components were mixed so as to have the following composition, and a photosensitive composition was obtained.

<感光性組成物的組成> <Composition of photosensitive composition>

.上述所製備的二氧化鈦分散液(分散組成物):22.9份 . The titanium dioxide dispersion (dispersion composition) prepared above: 22.9 parts

.上述所製備的鈦黑分散液(分散組成物):3.3份 . The titanium black dispersion (dispersion composition) prepared above: 3.3 parts

.下述結構的聚合化合物(A):4.5份 . Polymeric compound (A) having the following structure: 4.5 parts

.光聚合起始劑(下述結構的肟化合物,商品名:伊魯卡 . Photopolymerization initiator (肟 compound of the following structure, trade name: Iruka

(IRGACURE)OXE-02,巴斯夫(BASF)公司製造):0.8份 (IRGACURE) OXE-02, manufactured by BASF): 0.8 parts

.下述結構的黏合聚合物(A)(20%PGMEA溶液):19.1份 . Adhesive polymer (A) of the following structure (20% PGMEA solution): 19.1 parts

.下述結構的紫外線吸收劑(A):0.6份 . Ultraviolet absorber (A) of the following structure: 0.6 parts

.界面活性劑(氟系界面活性劑,1%PGMEA溶液,迪愛生(DIC)(股)製造,商品名:美佳法(Megafac)F-781):2.5份 . Surfactant (fluorine-based surfactant, 1% PGMEA solution, manufactured by Di Aisheng (DIC) Co., Ltd., trade name: Megafac F-781): 2.5 parts

.環己酮/PGMEA:46.3份 . Cyclohexanone / PGMEA: 46.3 parts

(其他感光性組成物的製備) (Preparation of other photosensitive compositions)

分別製備碳黑分散液及紅色顏料分散液。使用所得的碳黑分散液及紅色顏料分散液,依照下述表1來變更各分散液添加量,除此以外,與實施例101同樣地分別製備實施例102~實施例108及比較例C01~比較例C02的感光性組成物。 A carbon black dispersion and a red pigment dispersion were separately prepared. The examples 102 to 108 and Comparative Example C01 were prepared in the same manner as in Example 101 except that the obtained carbon black dispersion and the red pigment dispersion were used, and the amounts of the respective dispersions were changed in accordance with the following Table 1. The photosensitive composition of Comparative Example C02.

(碳黑分散液的製備) (Preparation of carbon black dispersion)

使用攪拌機(儀科(IKA)公司製造的歐洲之星(EUROSTAR)),將下述組成1所示的成分混合15分鐘,獲得分散混合物。 The components shown in the following composition 1 were mixed for 15 minutes using a stirrer (Eurostar (IKOSTAR) manufactured by IKA) to obtain a dispersion mixture.

(組成1) (composition 1)

.(A)碳黑(碳黑MA-100R(三菱化成工業(股)製造))…19份 . (A) Carbon black (carbon black MA-100R (manufactured by Mitsubishi Chemical Industries Co., Ltd.))...19 parts

.(B)分散劑2的45質量%PGMEA溶液…18份 . (B) 45 mass% PGMEA solution of dispersant 2...18 parts

.(C)有機溶劑:PGMEA…63份 . (C) Organic solvent: PGMEA...63 parts

使用新丸企業(Shinmaru Enterprises)公司製造的珠磨機NPM以及循環式的配管及投入罐,對所得的分散混合物於下述條件下進行分散處理,獲得碳黑分散組成物2000g。 Using the bead mill NPM manufactured by Shinmaru Enterprises Co., Ltd., and the circulating piping and the input tank, the obtained dispersion mixture was subjected to dispersion treatment under the following conditions to obtain 2000 g of a carbon black dispersion composition.

<分散條件> <dispersion conditions>

.珠粒粒徑:φ 0.05mm . Bead size: φ 0.05mm

.珠粒填充率:60體積% . Bead filling rate: 60% by volume

.磨機周速:10m/sec . Mill peripheral speed: 10m/sec

.進行分散處理的混合液量:5000g . The amount of the mixture to be dispersed: 5000 g

.循環流量(泵供給量):30kg/hour . Circulating flow (pump supply): 30kg/hour

.處理液溫度:25℃~30℃ . Treatment liquid temperature: 25 ° C ~ 30 ° C

.冷卻水:自來水 . Cooling water: tap water

.處理時間:30循環 . Processing time: 30 cycles

(紅色顏料分散液的製備) (Preparation of red pigment dispersion)

(紅色(Red)顏料分散液:含有PR254/PY139的分散液) (Red (Red) pigment dispersion: dispersion containing PR254/PY139)

藉由珠磨機(氧化鋯珠粒,粒徑為0.3mm)將包含9.6份顏料紅(Pigment Red)254、4.3份顏料黃(Pigment Yellow)139、6.8份顏料分散劑BYK-161(畢克(BYK)公司製造)、79.3份丙二醇甲醚乙酸酯(以下稱為「PGMEA」)的混合液混合、分散3小時,製備顏料分散液。其後,進一步使用帶有減壓機構的高壓分散機NANO-3000-10(日本BEE(股)製造),於2000kg/cm3的壓力下將流量設定為500g/min來進行分散處理。 By using a bead mill (zirconia beads, particle size 0.3 mm), it will contain 9.6 parts of Pigment Red 254, 4.3 parts of Pigment Yellow 139, 6.8 parts of pigment dispersant BYK-161 (Bicker A mixed liquid of 79.3 parts of propylene glycol methyl ether acetate (hereinafter referred to as "PGMEA") was mixed and dispersed for 3 hours to prepare a pigment dispersion liquid. Thereafter, a high-pressure disperser NANO-3000-10 (manufactured by BEE Co., Ltd.) equipped with a pressure reducing mechanism was further used, and the flow rate was set to 500 g/min under a pressure of 2000 kg/cm 3 to carry out dispersion treatment.

將該分散處理重複10次,獲得紅色(Red)顏料分散液。 This dispersion treatment was repeated 10 times to obtain a red pigment dispersion.

<高折射率粒子的重量平均粒徑的測定方法> <Method for Measuring Weight Average Particle Diameter of High Refractive Index Particles>

粒子的重量平均粒徑是藉由以下方式獲得:利用丙二醇單甲醚乙酸酯將含有粒子的混合液或分散液稀釋至80倍,對所得的稀釋液使用動態光散射法進行測定。將粒子的重量平均粒徑設定為使用日機裝股份有限公司製造的麥克羅塔克(Microtrac)(商品名)UPA-EX150來進行該測定所得的重量平均粒徑。 The weight average particle diameter of the particles was obtained by diluting the mixed liquid or dispersion containing particles with propylene glycol monomethyl ether acetate to 80 times, and measuring the obtained diluted solution by dynamic light scattering. The weight average particle diameter of the particles was set to a weight average particle diameter obtained by performing the measurement using Microtrac (trade name) UPA-EX150 manufactured by Nikkiso Co., Ltd.

<高折射率粒子的折射率的測定方法> <Method for Measuring Refractive Index of High Refractive Index Particles>

構成高折射率粒子的物質的折射率測定方法是依據日本工業標準(JIS K 0062:1992)。 The method of measuring the refractive index of a substance constituting the high refractive index particles is based on the Japanese Industrial Standard (JIS K 0062: 1992).

<黑色顏料的平均一次粒徑的測定方法> <Method for Measuring Average Primary Particle Size of Black Pigment>

顏料粒子的平均一次粒徑可藉由透射式電子顯微鏡對分散的顏料粒子進行觀察,並根據所得的照片來求出。具體而言,求出顏料粒子的投影面積,將與其相對應的圓近似徑的平均值設定為顏料粒子的平均一次粒徑。另外,本發明中的平均一次粒徑是設定為對300個顏料粒子求出的圓近似徑的算術平均值。 The average primary particle diameter of the pigment particles can be observed by a transmission electron microscope to observe the dispersed pigment particles, and based on the obtained photograph. Specifically, the projected area of the pigment particles is determined, and the average value of the circular approximate diameter corresponding thereto is set as the average primary particle diameter of the pigment particles. Further, the average primary particle diameter in the present invention is an arithmetic mean value set as a circular approximate diameter obtained for 300 pigment particles.

<透射率、透射率變動量λ400-700> <Transmittance, transmittance variation λ 400-700 >

藉由旋塗法將上述所得的實施例及比較例的各感光性組成物以塗佈後的膜厚成為0.6μm的方式塗佈於玻璃晶圓上,其後於熱板上於100℃下加熱2分鐘。進而,於熱板上於200℃下加熱8分鐘,形成感光性組成物層。使用島津製作所製作的分光器UV3600對形成有感光性組成物層的基板測定分光透射率。測定溫度是設定為室溫(25℃)。 Each of the photosensitive compositions of the examples and the comparative examples obtained above was applied onto a glass wafer by a spin coating method so as to have a film thickness of 0.6 μm after coating, and then dried at 100 ° C on a hot plate. Heat for 2 minutes. Further, the film was heated at 200 ° C for 8 minutes on a hot plate to form a photosensitive composition layer. The spectral transmittance of the substrate on which the photosensitive composition layer was formed was measured using a spectroscope UV3600 manufactured by Shimadzu Corporation. The measurement temperature was set to room temperature (25 ° C).

將上述所製作的膜試驗體101及膜試驗體102的透射率光譜記載於圖1中。 The transmittance spectra of the film test body 101 and the film test body 102 produced above are shown in Fig. 1 .

<膜的折射率> <Refractive index of film>

將上述所得的實施例及比較例的各感光性組成物以塗佈後的膜厚成為0.6μm的方式塗佈於矽晶圓上,其後於熱板上於100℃下加熱2分鐘。進而,於熱板上於200℃下加熱8分鐘,形成感光性組成物層。使用橢圓偏光儀(ellipsometry)VUV-VASE(日本J.A.沃蘭(J.A.Woollam Japan)公司製造)對形成有該感光性組成物層的基板測定折射率。測定溫度是設定為室溫(25℃),測定波長是設定為633nm。 Each of the photosensitive compositions of the examples and the comparative examples obtained above was applied onto a ruthenium wafer so as to have a film thickness of 0.6 μm after application, and then heated at 100 ° C for 2 minutes on a hot plate. Further, the film was heated at 200 ° C for 8 minutes on a hot plate to form a photosensitive composition layer. The refractive index of the substrate on which the photosensitive composition layer was formed was measured using an ellipsometry VUV-VASE (manufactured by J.A. Woollam Japan Co., Ltd.). The measurement temperature was set to room temperature (25 ° C), and the measurement wavelength was set to 633 nm.

<圖案形成性> <pattern formation>

藉由旋塗法將上述所得的實施例及比較例的各感光性組成物以塗佈後的膜厚成為0.6μm的方式塗佈於帶有底塗層的矽晶圓上,其後於熱板上於100℃下加熱2分鐘,獲得感光性組成物層。 Each of the photosensitive compositions of the examples and the comparative examples obtained above was applied to a ruthenium wafer with an undercoat layer by a spin coating method so as to have a film thickness of 0.6 μm after coating, followed by heat. The plate was heated at 100 ° C for 2 minutes to obtain a photosensitive composition layer.

繼而,對所得的感光性組成物層使用i射線步進式曝光裝置FPA-3000i5+(佳能(Canon)(股)製造),介隔遮罩來曝光0.9μm四方至3.0μm四方的尺寸不同的5種點陣列圖案(dot array pattern)或拜爾圖案(bayer pattern)。繼而,對曝光後的感光性組成物層使用氫氧化四甲基銨(TMAH)0.3%水溶液,於23℃下進行60秒鐘浸置顯影。其後,利用旋轉噴水器(spin shower)進行淋洗,進而利用純水進行水洗,獲得透明圖案。 Then, the obtained photosensitive composition layer was irradiated with an i-ray stepwise exposure apparatus FPA-3000i5+ (manufactured by Canon), and exposed to a mask to expose a size of 0.9 μm square to 3.0 μm. A dot array pattern or a bayer pattern. Then, a 40% aqueous solution of tetramethylammonium hydroxide (TMAH) was used for the photosensitive composition layer after the exposure, and the mixture was immersed and developed at 23 ° C for 60 seconds. Thereafter, the mixture was rinsed with a spin shower, and further washed with pure water to obtain a transparent pattern.

使用測長掃描式電子顯微鏡(Scanning Electron Microscope, SEM)(商品名:S-7800H,日立製作所(股)製作),自矽晶圓上以30000倍來觀察所得的透明圖案的形狀。 Using a scanning electron microscope (Scanning Electron Microscope, SEM) (trade name: S-7800H, manufactured by Hitachi, Ltd.), and the shape of the obtained transparent pattern was observed at 30,000 times on the wafer.

將可解析的圖案尺寸(μm四方)示於表1中。 The resolvable pattern size (μm square) is shown in Table 1.

再者,「C」所示的結果表示無法以0.9μm四方至3.0μm四方的尺寸形成圖案,「B」所示的結果表示於所形成的圖案中觀察到表面粗糙。「A」所示的結果表示可較佳地形成圖案,且目測亦未觀察到表面粗糙。 Further, the results shown by "C" indicate that the pattern cannot be formed in a square shape of 0.9 μm to 3.0 μm, and the result shown by "B" indicates that the surface roughness was observed in the formed pattern. The result shown by "A" indicates that the pattern was preferably formed, and no surface roughness was observed by visual observation.

將上述膜試驗體101及比較例的膜試驗體C01的外觀顯微鏡照片分別記載於圖2(a)、圖2(b)中。如實施例的膜試驗體101般,表面並無粗糙而均質,由此於用作灰色畫素時可實現並無不均一的良好光學特性,因而較佳。 The appearance micrographs of the film test body 101 and the film test body C01 of the comparative example are shown in Fig. 2 (a) and Fig. 2 (b), respectively. As in the film test body 101 of the example, the surface is not rough and homogeneous, and thus it is preferable to use it as a gray pixel to achieve good optical characteristics without unevenness.

<帶有底塗層的矽晶圓> <矽 wafer with undercoat>

評價中所用的帶有底塗層的矽晶圓是如以下般製作。 The undercoated silicon wafer used in the evaluation was fabricated as follows.

(底塗層用組成物的製備) (Preparation of composition for undercoat layer)

(帶有底塗層的矽晶圓的製作) (Production of tantalum wafer with undercoat)

評價中所用的帶有底塗層的矽晶圓是如以下般製作。 The undercoated silicon wafer used in the evaluation was fabricated as follows.

於8吋矽晶圓上藉由旋塗來均勻地塗佈上述底塗層用組成物而形成塗佈膜,對所形成的塗佈膜於120℃的熱板上進行120秒鐘加熱處理。另外,旋塗的塗佈轉速是以上述加熱處理後的塗佈膜的膜厚成為約0.5μm的方式調整。 The composition for the undercoat layer was uniformly applied by spin coating on a 8 Å wafer to form a coating film, and the formed coating film was subjected to heat treatment on a hot plate at 120 ° C for 120 seconds. Further, the application rotation speed of the spin coating was adjusted so that the film thickness of the coating film after the heat treatment was about 0.5 μm.

進一步利用220℃的烘箱對上述加熱處理後的塗佈膜進行1小時處理,使塗佈膜硬化,製成底塗層。 Further, the coating film after the heat treatment was treated in an oven at 220 ° C for 1 hour to cure the coating film to obtain an undercoat layer.

如以上所述般於8吋矽晶圓上形成底塗層,獲得帶有底塗層的矽晶圓。 An undercoat layer was formed on the 8 Å wafer as described above to obtain a ruthenium wafer with an undercoat layer.

(表的註釋) (note to the table)

( )為調配量(質量份)…是指將合計量設定為100份,且其他為界面活性劑(2.5份)及溶劑(剩餘部分)。 ( ) is the blending amount (parts by mass)... It means that the total amount is set to 100 parts, and the other is a surfactant (2.5 parts) and a solvent (the remainder).

* 作為分散組成物的調配量 * As a dispersing composition

C開頭的試驗為比較例。 The test at the beginning of C is a comparative example.

TiO2:二氧化鈦粒子 TiO 2 : titanium dioxide particles

(石原產業(股)製造,商品名:TTO-51(C)) (Ishihara Industry Co., Ltd., trade name: TTO-51(C))

重量平均粒徑為30nm,折射率為2.71 The weight average particle size is 30 nm and the refractive index is 2.71.

TB:鈦黑(三菱材料製造的13M-T) TB: Titanium black (13M-T made by Mitsubishi Materials)

數量平均粒徑為75nm The number average particle size is 75nm

CB:碳黑(三菱化成工業(股)的MA-100R) CB: carbon black (MA-100R of Mitsubishi Chemical Industry Co., Ltd.)

數量平均粒徑為24nm The number average particle size is 24nm

OXE01:肟系聚合起始劑 OXE01: lanthanide polymerization initiator

(巴斯夫(BASF)公司製造,伊魯卡(Irgacure)OXE01(商品名)) (Manufactured by BASF, Irgacure OXE01 (trade name))

OXE02:肟系聚合起始劑 OXE02: lanthanide polymerization initiator

(巴斯夫(BASF)公司製造,伊魯卡(Irgacure)OXE02(商品名)) (Manufactured by BASF, Irgacure OXE02 (trade name))

IRG369:α胺基酮系聚合起始劑 IRG369: α-amino ketone polymerization initiator

(巴斯夫(BASF)公司製造,伊魯卡(Irgacure)369(商品名)) (Manufactured by BASF, Irgacure 369 (trade name))

XAN:環己酮 XAN: cyclohexanone

PGMEA:丙二醇1-單甲醚2-乙酸酯 PGMEA: propylene glycol 1-monomethyl ether 2-acetate

於併用兩種溶劑時,分別以等量來添加並以成為既定量的方式設定。 When two kinds of solvents are used in combination, they are added in equal amounts and set in a quantitative manner.

BP-A:黏合聚合物A BP-A: Adhesive Polymer A

BP-B:黏合聚合物B BP-B: Adhesive polymer B

UV-A:紫外線吸收劑A UV-A: UV absorber A

RPD:紅色顏料分散液 RPD: red pigment dispersion

樹脂A:特定分散樹脂A Resin A: specific dispersion resin A

MA:聚合性化合物MA MA: polymerizable compound MA

根據本發明的組成物,得知可製作具有較佳的光透射性及折射率的灰色的硬化膜。另外得知,本發明的該感光性組成物的光微影性特別優異,可形成如下硬化膜,該硬化膜可形成並無表面粗糙而光學特性並無不均一的良好灰色畫素。 According to the composition of the present invention, it is known that a cured film of gray having a good light transmittance and refractive index can be produced. Further, it has been found that the photosensitive composition of the present invention is particularly excellent in photo lithiativity, and can form a cured film which can form a good gray pixel which has no surface roughness and is not uniform in optical characteristics.

<實施例2> <Example 2>

除了將上述實施例1中所用的TiO2粒子變更為以下記載的各高折射率粒子以外,與試樣101同樣地製備感光性組成物,形成硬化膜。該硬化膜的折射率變動率(λ400-700)為10%左右,圖案形成性為「A」的結果且顯示出良好的性能。 A photosensitive composition was prepared in the same manner as in Sample 101 except that the TiO 2 particles used in the above Example 1 were changed to the respective high refractive index particles described below to form a cured film. The cured film had a refractive index change rate (λ 400-700 ) of about 10%, and the pattern formability was "A", and showed good performance.

.氧化鋯(zirconia)粒子(折射率為2.4,第一稀元素化學工業(股)製造,UEP-100) . Zirconia particles (refractive index of 2.4, manufactured by the first dilute element chemical industry, USP-100)

.氧化鋯(zirconium oxide)粒子(CIK奈米科技(Nanotech)股份有限公司製作的「ZRDMA30WT%-M22」) . Zirconium oxide particles ("ZRDMA30WT%-M22" by CIK Nanotech Co., Ltd.)

.ITO粒子/摻錫的氧化銦粉末(三菱材料(股)製造,P4-ITO) . ITO particles / tin-doped indium oxide powder (Mitsubishi Materials Co., Ltd., P4-ITO)

另外,除了將上述實施例1中所用的TiO2粒子變更為以下記載的各高折射率粒子以外,與試樣101同樣地製備感光性組成物,形成硬化膜。 In addition, the photosensitive composition was prepared in the same manner as the sample 101 except that the TiO 2 particles used in the above Example 1 were changed to the respective high refractive index particles described below to form a cured film.

.氧化鋅粒子(石原產業公司製造,FZO-50[商品名]) . Zinc oxide particles (manufactured by Ishihara Sangyo Co., Ltd., FZO-50 [trade name])

.二氧化矽粒子(贏創(EVONIK)公司製造,埃洛希爾(AEROSIL)(R)RX300[商品名]) . Antimony dioxide particles (made by EVONIK, AEROSIL (R) RX300 [trade name])

.氧化鋁粒子(贏創(EVONIK)公司製造,埃洛塞德(AEROXIDE)(R)Alu130[商品名]) . Alumina particles (made by EVONIK, AEROXIDE (R) Alu130 [trade name])

.氧化鎂粒子(境化學公司製造,SMO(1m)[商品名]) . Magnesium oxide particles (manufactured by Horizon Chemical Co., Ltd., SMO (1m) [trade name])

.氧化錫粒子(三菱材料電子化成公司製造,S-1[商品名]) . Tin oxide particles (manufactured by Mitsubishi Materials Electronics Co., Ltd., S-1 [trade name])

.氧化釩粒子(和光純藥公司製造,氧化釩) . Vanadium oxide particles (manufactured by Wako Pure Chemical Industries, Vanadium Oxide)

.氧化鈮粒子(和光純藥公司製造,氧化鈮) . Cerium oxide particles (manufactured by Wako Pure Chemical Industries, Inc., yttrium oxide)

<實施例3> <Example 3>

除了使用下表的分散劑來代替試驗101中所用的分散劑以外,同樣地製備感光性組成物,形成硬化膜。該硬化膜的折射率變動率(λ400-700)為10%左右,圖案形成性為「A」的結果且顯示出良好的性能。 A photosensitive composition was prepared in the same manner as in the above except that the dispersing agent used in the following Table was used instead of the dispersing agent used in the test 101 to form a cured film. The cured film had a refractive index change rate (λ 400-700 ) of about 10%, and the pattern formability was "A", and showed good performance.

對本發明與其實施態樣一併進行了說明,但只要本發明者並無特別指定,則不應將本發明限定於說明的任何細節部分,可認為本發明應於不違背隨附的申請專利範圍所示的發明的精神及範圍的情況下廣泛地解釋。 The present invention has been described in connection with the embodiments thereof, and the present invention should not be construed as limited to the details of the details. The spirit and scope of the invention as illustrated is widely explained.

本申請案主張基於2012年11月1日於日本提出專利申請的日本專利特願2012-242230的優先權,此處參照該文獻並將其內容作為本說明書的記載的一部分而併入至本文中。 The present application claims priority to Japanese Patent Application No. 2012-242230, filed on Jan. 1, 2011, the entire disclosure of which is hereby .

Claims (17)

一種組成物,含有高折射率粒子、黑色顏料、分散劑及有機溶劑。 A composition comprising high refractive index particles, a black pigment, a dispersing agent, and an organic solvent. 如申請專利範圍第1項所述的組成物,更含有聚合性化合物、光聚合起始劑及有機溶劑。 The composition according to claim 1 further contains a polymerizable compound, a photopolymerization initiator, and an organic solvent. 如申請專利範圍第1項所述的組成物,其中上述高折射率粒子為二氧化鈦或氧化鋯的粒子。 The composition according to claim 1, wherein the high refractive index particles are particles of titanium dioxide or zirconium oxide. 如申請專利範圍第1項所述的組成物,其中於上述組成物的總固體成分中,上述高折射率粒子的含量為5質量%~30質量%。 The composition according to claim 1, wherein the content of the high refractive index particles in the total solid content of the composition is 5 mass% to 30 mass%. 如申請專利範圍第1項所述的組成物,其中上述黑色顏料為鈦黑。 The composition of claim 1, wherein the black pigment is titanium black. 如申請專利範圍第1項所述的組成物,其中於上述組成物的總固體成分中,上述黑色顏料的含量為0.5質量%~20質量%。 The composition according to claim 1, wherein the content of the black pigment in the total solid content of the composition is from 0.5% by mass to 20% by mass. 如申請專利範圍第1項所述的組成物,其中上述分散劑為寡亞胺系分散劑、丙烯酸系分散劑。 The composition according to claim 1, wherein the dispersing agent is an oligoimide dispersing agent or an acrylic dispersing agent. 如申請專利範圍第1項所述的組成物,更含有紅色顏料。 The composition described in claim 1 further contains a red pigment. 如申請專利範圍第1項所述的組成物,更含有紫外線吸收劑。 The composition according to claim 1 further contains an ultraviolet absorber. 如申請專利範圍第1項所述的組成物,其中上述分散劑於總固體成分中的含量為0.05質量%~10質量%。 The composition according to claim 1, wherein the content of the dispersing agent in the total solid content is 0.05% by mass to 10% by mass. 如申請專利範圍第1項所述的組成物,其中上述分散劑為 分散樹脂,上述分散樹脂含有下述式(I-1)所表示的重複單元及式(I-2)所表示的重複單元、或者式(I-1)所表示的重複單元及式(I-2a)所表示的重複單元, R1及R2分別獨立地表示氫原子、鹵素原子或烷基;a分別獨立地表示1~5的整數;*表示重複單元間的連結部;R8及R9為與R1為相同含意的基團;L為單鍵、伸烷基、伸烯基、伸芳基、伸雜芳基、亞胺基、醚基、硫醚基、羰基或該些基團的組合的連結基;La為與CR8CR9及N一起形成環結構的結構部位;X表示具有pKa為14以下的官能基的基團;Y表示原子數為40~10,000的側鏈。 The composition according to claim 1, wherein the dispersing agent is a dispersion resin, and the dispersing resin contains a repeating unit represented by the following formula (I-1) and a repeating unit represented by the formula (I-2) Or a repeating unit represented by the formula (I-1) and a repeating unit represented by the formula (I-2a), R 1 and R 2 each independently represent a hydrogen atom, a halogen atom or an alkyl group; a each independently represents an integer of 1 to 5; * represents a linking moiety between repeating units; and R 8 and R 9 have the same meaning as R 1 a group; L is a single bond, an alkyl group, an alkylene group, an aryl group, a heteroaryl group, an imido group, an ether group, a thioether group, a carbonyl group or a combination of such groups; a is a structural moiety which forms a ring structure together with CR 8 CR 9 and N; X represents a group having a functional group having a pKa of 14 or less; and Y represents a side chain having an atomic number of 40 to 10,000. 如申請專利範圍第1項所述的組成物,其中上述分散劑含有下述式(1)~式(5)的任一重複單元,[化2] 式中,X1~X6表示氫原子、鹵素原子或一價有機基;Y1~Y5表示單鍵或二價連結基;Z1~Z5表示氫原子或一價有機基;R表示氫原子或一價有機基,亦可於共聚物中存在結構不同的R;n、m、p、q及r分別表示1~500的整數;j及k分別獨立地為2~8的整數。 The composition according to claim 1, wherein the dispersing agent contains any repeating unit of the following formulas (1) to (5), [Chemical 2] In the formula, X 1 to X 6 represent a hydrogen atom, a halogen atom or a monovalent organic group; Y 1 to Y 5 represent a single bond or a divalent linking group; Z 1 to Z 5 represent a hydrogen atom or a monovalent organic group; and R represents A hydrogen atom or a monovalent organic group may have a structurally different R in the copolymer; n, m, p, q, and r each represent an integer of 1 to 500; and j and k are each independently an integer of 2 to 8. 如申請專利範圍第1項所述的組成物,其為固體攝影元件的畫素形成用。 The composition according to claim 1, which is for forming a pixel of a solid-state imaging device. 一種灰色硬化膜,其是使如申請專利範圍第1項至第13項中任一項所述的組成物硬化而成。 A gray cured film obtained by hardening the composition according to any one of claims 1 to 13. 如申請專利範圍第14項所述的灰色硬化膜,其中上述硬化膜為灰色,並且該灰色是定義為於波長400nm~700nm的可見光範圍內其透射率的最大值與最小值之差成為0.1%~30%以內的著色。 The gray cured film according to claim 14, wherein the cured film is gray, and the gray is defined as a difference between a maximum value and a minimum value of a transmittance in a visible light range of a wavelength of 400 nm to 700 nm of 0.1%. Less than 30% of the color. 一種固體攝影元件的灰色畫素,其為包含如申請專利範圍第14項或第15項所述的硬化膜的固體攝影元件的畫素,並且含有上述高折射率粒子、上述黑色顏料及上述分散劑。 A gray pixel of a solid-state imaging element, which is a pixel of a solid-state imaging element comprising a cured film according to claim 14 or 15, and comprising the above-mentioned high refractive index particles, the above black pigment, and the above dispersion Agent. 一種固體攝影元件,具備如申請專利範圍第16項所述的灰色畫素。 A solid-state imaging element comprising the gray pixel as described in claim 16 of the patent application.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI688619B (en) * 2018-01-30 2020-03-21 臻鼎科技股份有限公司 Method for making printed circuit board, and photosensitive resin composition
TWI720100B (en) * 2016-01-14 2021-03-01 日商富士軟片股份有限公司 Radiation-sensitive composition, film, color filter, light-shielding film and solid-state imaging element
TWI788415B (en) * 2017-09-29 2023-01-01 日商富士軟片股份有限公司 Photocurable composition, laminated body, and solid imaging element

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6297155B2 (en) * 2014-07-25 2018-03-20 富士フイルム株式会社 Color filter, solid-state image sensor
WO2016152368A1 (en) * 2015-03-24 2016-09-29 富士フイルム株式会社 Dispersion composition, photosensitive composition, color filter and method for manufacturing same, and solid state imaging element
CN106198579B (en) * 2015-06-01 2019-03-26 中国石油化工股份有限公司 A kind of method of the content of organic matter in measurement shale
JP6518553B2 (en) * 2015-08-25 2019-05-22 アイシン精機株式会社 Method of manufacturing vanadium dioxide thin film for vehicle and method of manufacturing laminate thereof
JP6647238B2 (en) * 2016-03-30 2020-02-14 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. Gray photosensitive resin composition, color filter manufactured using the same, and display element including the color filter
KR102572753B1 (en) * 2016-03-30 2023-08-31 동우 화인켐 주식회사 Gray colored photosensitive resin composition, color filter and display device comprising the same
WO2018173446A1 (en) * 2017-03-22 2018-09-27 Jsr株式会社 Pattern forming method
WO2018179704A1 (en) * 2017-03-27 2018-10-04 Jsr株式会社 Pattern forming method
JP6842631B2 (en) * 2017-06-07 2021-03-17 リンテック株式会社 A coating liquid for forming a luminescent film, a method for preparing the same, and a method for producing a luminescent film.
WO2019065143A1 (en) * 2017-09-26 2019-04-04 富士フイルム株式会社 Laminate, and solid-state imaging element
WO2019188851A1 (en) * 2018-03-27 2019-10-03 富士フイルム株式会社 Black type ink composition for ink-jet printing, light-shielding film, optical member, and method for forming image
JPWO2020059374A1 (en) * 2018-09-20 2021-05-13 富士フイルム株式会社 Black ink composition, light-shielding film and its manufacturing method, and optical members
TW202104284A (en) * 2019-06-27 2021-02-01 日商富士軟片股份有限公司 Composition, film, and optical sensor
CN115516039B (en) * 2020-05-22 2023-09-15 富士胶片株式会社 Resin composition, film, optical filter, solid-state imaging element, and image display device
JP7068385B2 (en) * 2020-06-08 2022-05-16 富士フイルム株式会社 Radiation-sensitive compositions, films, color filters, light-shielding films and solid-state image sensors

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04371923A (en) * 1991-06-20 1992-12-24 Canon Inc Ferroelectric liquid crystal display device
JP3427508B2 (en) * 1994-08-31 2003-07-22 ジェイエスアール株式会社 Method of forming colored micropattern
JPH10268121A (en) * 1997-03-21 1998-10-09 Sumitomo Rubber Ind Ltd Ink for black matrix, and black matrix using it
JP4066706B2 (en) * 2001-09-04 2008-03-26 凸版印刷株式会社 Black pigment-containing active energy ray-curable composition and lenticular lens sheet using the same
JP2007053153A (en) 2005-08-16 2007-03-01 Toppan Printing Co Ltd Solid imaging element and its manufacturing method
JP4621639B2 (en) * 2006-07-21 2011-01-26 株式会社リコー Electrophotographic developer carrier, developer, image forming method and process cartridge
KR101412857B1 (en) * 2007-04-25 2014-06-26 아사히 가라스 가부시키가이샤 Photosensitive composition, partition wall, black matrix, and method for producing color filter
JP5270113B2 (en) * 2007-06-06 2013-08-21 新日鉄住金化学株式会社 Photosensitive resin composition for black resist, light shielding film and color filter using the same
JP5344843B2 (en) * 2008-03-31 2013-11-20 富士フイルム株式会社 Polymerizable composition and solid-state imaging device
JP5274151B2 (en) 2008-08-21 2013-08-28 富士フイルム株式会社 Photosensitive resin composition, color filter, method for producing the same, and solid-state imaging device
JP5121644B2 (en) 2008-09-24 2013-01-16 富士フイルム株式会社 Photosensitive resin composition, color filter, method for producing the same, and solid-state imaging device
US8808948B2 (en) * 2009-02-19 2014-08-19 Fujifilm Corporation Dispersion composition, photosensitive resin composition for light-shielding color filter, light-shielding color filter, method of producing the same, and solid-state image sensor having the color filter
JP5340198B2 (en) * 2009-02-26 2013-11-13 富士フイルム株式会社 Dispersion composition
JP2010215732A (en) * 2009-03-13 2010-09-30 Fujifilm Corp Pigment dispersion, colored curable composition, color filter using the same, and manufacturing method thereof
JP5526673B2 (en) 2009-09-16 2014-06-18 ソニー株式会社 Solid-state imaging device and electronic device
JP5701576B2 (en) 2009-11-20 2015-04-15 富士フイルム株式会社 Dispersion composition, photosensitive resin composition, and solid-state imaging device
JP5183754B2 (en) * 2010-02-12 2013-04-17 キヤノン株式会社 Optical element
JP2011227467A (en) * 2010-03-31 2011-11-10 Toray Ind Inc Photosensitive black resin composition and resin black matrix substrate
JP5442571B2 (en) 2010-09-27 2014-03-12 パナソニック株式会社 Solid-state imaging device and imaging device
JP5813325B2 (en) * 2010-10-04 2015-11-17 富士フイルム株式会社 Black polymerizable composition and method for producing black layer
JP5222922B2 (en) * 2010-10-12 2013-06-26 富士フイルム株式会社 Pattern forming method, pattern forming material, and photosensitive film, pattern film, low refractive index film, optical device, and solid-state imaging device using the same
KR101830206B1 (en) * 2010-12-28 2018-02-20 후지필름 가부시키가이샤 Titanium black dispersion composition for forming light blocking film and method of producing the same, black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film
JP5896787B2 (en) * 2011-03-07 2016-03-30 富士フイルム株式会社 Easy-adhesion sheet, solar cell protective sheet, solar cell backsheet member, solar cell backsheet, and solar cell module
JP5806491B2 (en) * 2011-03-31 2015-11-10 太陽インキ製造株式会社 Curable resin composition, dry film and printed wiring board using the same
JP2013238923A (en) * 2012-05-11 2013-11-28 Toppan Printing Co Ltd Front plate for touch panel, integrated sensor substrate of front plate for touch panel and touch panel sensor, and display unit equipped with these

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI720100B (en) * 2016-01-14 2021-03-01 日商富士軟片股份有限公司 Radiation-sensitive composition, film, color filter, light-shielding film and solid-state imaging element
TWI788415B (en) * 2017-09-29 2023-01-01 日商富士軟片股份有限公司 Photocurable composition, laminated body, and solid imaging element
TWI688619B (en) * 2018-01-30 2020-03-21 臻鼎科技股份有限公司 Method for making printed circuit board, and photosensitive resin composition

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