TW201423281A - Exposure apparatus - Google Patents

Abstract

An exposure apparatus is used for exposuring a substrate. The substrate has a flat material as a substrate-basis, the substrate basis having two opposite substrate-basis surfaces with a photo-sensitive layer on each substrate-basis surface of the substrate-basis, in which selective structures can be generated on the photo-sensitive layer when a photo-chemical process is trigged by selective exposure of the photo-sensitive layer. The exposure apparatus includes a machine-stand and at least one exposure unit. In order to make an improvement on the exposure apparatus, so that an exposure of the substrate to the sensitive layers, arranged on opposite sides, can be efficiently performed as much as possible, it is suggested that a substrate guide is provided on the machine stand, which substrate guide right neutrally positions the substrate with its substrate surface parallel to an exposure-guide face and transverse to the exposure-guide face, so that the substrate is guided to move in a forward direction extending parallel to the exposure-guide face. As such, in order to expose the photo-sensitive layers on both sides of the exposure-guide face, exposure units arranged fixedly on the machine stand are provided to selectively expose one of the photo-sensitive layers and the substrate is movable relative to the exposure units in the forward direction to perform exposure.

Description

Exposure device

The present invention relates to an exposure apparatus for a substrate having a flat material as a substrate having a substrate substrate surface facing each other and having a surface of each substrate of the substrate substrate A photosensitive layer in which the photochemical process is triggered by selective exposure and thus produces a selective structure. The exposure apparatus of the present invention comprises a machine table and at least one exposure unit.

Exposure devices of the type described above are known in the prior art, which typically exposes one of the photosensitive layers of the substrate and then exposes the other photosensitive layer.

It is an object of the present invention to improve an exposure apparatus of the type described at the outset such that exposure of the substrate is carried out as efficiently as possible, the substrate having a photosensitive layer disposed on the opposite side.

According to the present invention, the above object is achieved in an exposure apparatus of the type described at the beginning of the present invention by "providing a substrate guide on a machine table" for guiding the substrate and the substrate surface parallel to the exposure guide. And the guiding surface for exposure is clearly positioned and movably guided in a forward direction extending parallel to the guiding surface for exposure Therefore, in order to expose the photosensitive layer on both sides of the guiding surface for exposure, a plurality of exposure units fixedly disposed on the machine are provided to selectively expose one of the plurality of photosensitive layers, respectively. The substrate is movable relative to the exposure unit in the advancement direction for exposure.

An advantage of the solution according to the invention is that the two photosensitive layers can be exposed in a relatively simple manner by at least one exposure unit of a plurality of exposure units, so that a very efficient working exposure device is available.

When the guiding surface for the exposure extends in a lateral direction extending transversely to the advancing direction, at least over the extent of the substrate, transverse to the advancing direction, and particularly extending in a guiding length in the advancing direction advantageous.

By using the above range of the guiding faces for exposure, the substrate can be optimally positioned when exposed by the exposure unit.

The exposure apparatus of the present invention can be particularly advantageously operated when each of the exposure units is formed such that the respective photosensitive layers are selectively exposed in the exposure zone by the exposure units, wherein the exposure area is transverse to the advancement The direction extends over the width of the area to be exposed of the substrate and in the direction of advancement over a region within the guiding length of the guiding surface for exposure.

That is, the guiding length of the guiding surface for the exposure is larger than the range of the respective exposure regions parallel to the advancing direction to ensure that the substrate is optimally positioned at least in the area to be exposed.

Further, when the exposure units are relatively positioned, the two photosensitive layers within the guiding length of the guiding surface for exposure are in the forward direction It is especially advantageous when exposed.

A particularly suitable solution consists in that the individual exposure units are positioned relative to each other such that the respective exposure zones of the exposure units are arranged superimposed in the direction of advancement.

Therefore, it is advantageous if the respective exposure units are arranged oppositely such that each exposure zone can overlap in the advancement direction in a direction greater than one half of its extent in the advancement direction.

In order to guide the substrate with respect to the guiding surface for exposure with the required positioning accuracy, it is necessary in an advantageous embodiment to provide the exposure device for the substrate relative to the exposure by means of the substrate guide The guide surface is positioned.

The substrate guide can be formed in different ways to achieve a positioning function with respect to the guiding surface for exposure.

For example, a side edge guide of the substrate can be provided.

A suitable solution is that the substrate guide unambiguously guides the substrate to the guiding surface for exposure such that the substrate is received between the two guiding plates, wherein each guiding plate can extend outside the exposure area .

Therefore, an advantageous solution consists in that the exposure of the photosensitive layer takes place via the guide web, so that the substrate can be optimally positioned when exposed to the guiding surface for exposure.

Therefore, basically, each of the guide sheets can be provided with a suitable recess.

However, the quality of guiding of the substrate is further deteriorated due to the notch.

For the above reasons, an advantageous solution is that each of the guiding plates can transmit electromagnetic radiation for exposure at least in the respective exposure regions. Exposure of the photosensitive layer of the substrate can be carried out via the material of the respective guide sheets, wherein "transmission" means that the absorption of electromagnetic radiation is less than 15%, more preferably less than 10%, of the incident radiation.

In order to achieve the best possible guidance of the substrate relative to the guiding surface for exposure, on the other hand, the movement of the substrate can also be realized in the forward direction, so that the guiding plates and the substrate are relatively movable. There are different solutions for sex.

Therefore, a suitable solution is that the substrate can be moved in the advancement direction with respect to the respective guide sheets for exposure, that is, in this case, the guide sheets can be fixedly arranged in the simplest case. On the machine.

However, for other reasons, the guide plates can also be moved relative to the machine table.

In order to achieve the best possible positioning of the substrate that can be moved relative to the guiding plates in the forward direction, a preferred solution is that the substrate can be moved relative to the guiding plates and can be used in each guiding plate. There is little friction between them moving in this forward direction.

Therefore, it is advantageous to have less frictional movability in the advancing direction in order to ensure that the substrate does not make a slamming movement relative to each of the guide plates in the advancing direction, thus maintaining the advancement rate, which is due to The rate of advancement is decisive for the exposure accuracy achieved with the exposure unit.

For example, in this case the guide plates may also be provided with a suitable coating which allows the substrate to be less frictionally moved relative to the respective guide plates.

A particularly suitable solution is that the substrate can be moved relative to the respective guide sheets with less friction between the respective guide sheets and the respective photosensitive layers of the substrate by a smoothing film.

Therefore, the smoothing film can be formed by a gel layer.

However, a particularly simple solution consists in that the smoothing membrane is formed by a fluid, a simple example of which is water.

In order to provide a medium to form the smoothing film, it is preferred that a smoothing medium supply is associated with the substrate guide such that the smoothing medium can be directly supplied to the substrate guide.

For example, a smoothing medium supply must be disposed such that the smoothing film is supplied to the substrate moving in the advancing direction before the photosensitive layer is exposed, so that the substrate is accurately aligned with respect to the respective guiding plates by the smoothing film during exposure. Being positioned.

In order to be able to remove the smoothing film from the substrate in an advantageous manner, it is preferred that the substrate guide is provided with a smoothing medium receptacle for accommodating the smoothing medium after exposure.

Particularly when inserting a smoothing film, it is particularly advantageous when the guiding surface for the exposure extends in a direction of gravity with a component.

Therefore, it is advantageous when the guiding surface for the exposure extends substantially in the direction of gravity, so that gravity can support the insertion of the smoothing medium to form the smoothing film.

In this case, it is appropriate that the smoothing medium supply is disposed above the respective exposure unit in the direction of gravity.

Another way of forming the substrate guide is that the substrate is clamped Between the guide plates for exposure and movement with the guide plates in the advancement direction, that is, in this solution, no relative movement is made between the substrate and the guide plates, and vice versa. In the substrate guide of the form, the substrate and the guide plates are moved as a unit in the advancing direction.

This has the advantage that the movement in the forward direction can be achieved by the action on the guide plates and can therefore be measured in a simple manner by the guide plates in the forward direction. The movement of the substrate is measured by the movement.

In this case, the design is, for example, that the substrate and the guide sheets are intermittently movable in the advancing direction.

In this case, it is appropriate to move the substrate in the advancing direction to move the substrate between the clamping guide plates in the advancing direction by a guiding unit and a forward drive.

Therefore, in particular, the guiding unit provides an accuracy of guiding parallel to the guiding surface for exposure, so that the substrate between the guiding sheets for clamping can be parallel to the guide for exposure by the guiding unit Guided by the lead.

In order to be able to clamp the substrate between the guide sheets, it is preferable that the substrates between the guide sheets for clamping are clamped to each other by a clamping unit located outside the exposure area.

Therefore, each of the clamping units can be formed such that only the guide plates are clamped to each other.

A particularly advantageous solution is that the substrates between the clamping guide plates can be clamped to each other by the clamping unit and can be moved away from each other And moving to guide the substrate into an intermediate zone between the guide plates or to be removed from the intermediate zone between the guide plates.

In the exposure apparatus of the present invention, in order to achieve an optimum flow of exposure of the substrate, it is preferable to arrange a substrate supply unit to the substrate guide, the substrate supply unit stores the substrate and then supplies the substrate for substrate guiding The exposure of the pilot.

In addition, a preferred method is to have a substrate carry-out unit associated with the substrate guide, the substrate carry-out unit housing the exposed substrate in the area of the substrate guide.

In principle, the forward movement can also be produced by the substrate supply unit and/or the substrate transport unit.

Since the advancement movement must be accurately measured so that an accurate exposure of the substrate can be performed, it is preferred that at least one of the advance units is associated with the substrate guide.

Such a pre-entry unit that is associated with the substrate guide allows the substrate to be moved forward relative to the exposure unit with the required accuracy.

In terms of the formation of the substrate, no more detailed guidance has been made so far.

A particularly advantageous solution to the exposure apparatus of the present invention is that the substrate is a material that is bendable in both its longitudinal direction and transverse to the surface of the substrate such that the substrate can be steered when guided by the exposure device It can also be accurately positioned in the substrate guide relative to the guiding surface for exposure.

In addition, it is preferable that the substrate is a non-dragable material in a longitudinal direction extending parallel to the advancing direction of the guiding surface for exposure. The substrate is positioned such that the substrate is not elongated, and thus the substrate can be accurately measured, particularly when moving in the advancement direction relative to the guide sheet to produce a progressive movement.

Other features and advantages of the solution of the present invention are illustrated in the following description and drawings of the various embodiments.

10‧‧‧Substrate

12‧‧‧Substrate matrix

14‧‧‧ Carrier

16, 18‧‧‧ carrier surface

22, 24‧‧‧ conductive layer

26, 28‧‧‧ substrate substrate surface

32, 34‧‧‧Photosensitive layer

36, 38‧‧‧ substrate surface

40, 40'‧‧‧ exposure device

42, 42’‧‧‧ machine

44‧‧‧standing face

46, 46'‧‧‧Substrate supply unit

48‧‧‧Substrate spool

52‧‧‧ substrate track

54, 56‧‧‧ Forward unit

60, 60'‧‧‧ substrate guide

62, 64, 66, 76‧‧‧ steering wheel

72, 74‧‧‧ Rotary setter

78‧‧‧Clamping roller

82, 82'‧‧‧ substrate transport unit

84‧‧‧ Forward direction

92, 92', 94, 94' guide plates

96, 96’, 98, 98’ ‧ ‧ guide faces

100, 100’‧‧‧ intermediate zone

102, 104‧‧ ‧ gap

106, 108‧‧‧ smooth film

112, 114‧‧‧Smooth media supply

116, 118‧‧‧Smooth media holder

120‧‧‧ Guide surface for exposure

122, 124‧‧‧ exposure unit

126, 128‧‧ ‧ exposure area

130‧‧‧

132‧‧‧ column direction

134‧‧‧radiation area

136‧‧‧Direction

142, 144‧‧‧ clamping unit

146‧‧‧ guide table

148‧‧‧Desktop

150‧‧‧Forward drive

152‧‧‧Substrate section

154‧‧‧Intermediate area

A‧‧‧ distance

B‧‧‧Width

FL‧‧‧ lead length

S‧‧‧ structure

ZB‧‧‧ area width

ZL‧‧‧ area length

Fig. 1 is a perspective view of a substrate used in the exposure apparatus of the present invention.

Fig. 2 is a schematic view showing a first embodiment of the exposure apparatus of the present invention.

Figure 3 is a partial enlarged view of the exposure apparatus of the present invention in the area of the substrate guide and the advancement unit associated with the substrate guide.

Figure 4 is a partial enlarged view of a region in Figure 3.

Figure 5 is a plan view of one embodiment of the exposure unit of the present invention.

Fig. 6 is a perspective view showing an embodiment of the exposure unit of the present invention shown in Fig. 5.

Fig. 7 is a schematic view showing a second embodiment of the exposure apparatus of the present invention, which is similar to Fig. 2.

Figure 8 is a partially enlarged view of a second embodiment of the exposure apparatus of the present invention, which is similar to Figure 4.

Figure 9 is a partial perspective view of a second embodiment of the exposure apparatus of the present invention, the substrate being interposed between the guiding sheets for clamping before exposure.

Figure 10 is similar to Figure 9, where the substrate is clamped during exposure. Between the guide plates.

Fig. 11 is similar to Fig. 9, and the substrate is interposed between the guiding sheets for clamping after exposure.

The substrate 10, which can be exposed by the exposure apparatus of the present invention, shown in Fig. 1, comprises a substrate substrate 12 having a carrier 14 of a planar material which extends in the longitudinal direction L and the transverse direction Q and which is non-conductive. The material is formed. The carrier 14 is provided on its mutually facing carrier surfaces 16 and 18 with a conductive layer 22 or 24 which completely covers the carrier surfaces 16 and 18, the conductivity of which is in the range of the electrical conductivity of the metal.

For example, the conductive layer 22 or 24 is a copper layer, and later the copper layer can be formed into a conductive track by structuring, which can form a circuit board for the circuit together with the carrier 14.

In order to achieve structuring of the conductor tracks 22 and 24, a photosensitive layer 32 or 34 must be applied over the substrate substrate surface 26 or 28 formed by the conductive layers 22 and 24, in a spectral region predetermined for the photosensitive layer. The electromagnetic waves are exposed to the substrate surface 36 or 38 formed by the photosensitive layers 32 and 34 to produce a photochemical conversion process, so that a plurality of photosensitive layers 32 and 34 can be produced by selective exposure. The structure S made by selective photochemical conversion corresponds to a conductive track which is later made of the conductive layers 22 and 24, wherein each structure S does not exist in the subsequent processing of the substrate 10 due to photochemical conversion. Separate during etching and during such etching, the areas of the conductive layers 22 and 24 that are later used to form the conductive tracks are protected from separation, and the remaining portions of the photosensitive layers 32 and 34 that are not photochemically converted and conductive Layers 22 and 24 The area covered by the area is separated by an etching process.

In order to form the structure S in the photosensitive layers 32 and 34 by selective exposure, an exposure apparatus 40 as shown in the embodiment of Fig. 2 is provided, which has a machine table 42 which stands On a standing surface 44.

A substrate supply unit 46 is provided on the machine table 42 in which, for example, a carrier 14 and a correspondingly bendable conductive layer 22 and 24 and a photosensitive layer 32 are formed which are bendable and formed into a strip-like material transverse to the carrier surfaces 16 and 18. In the case of 34, the substrate 10 is stored in the form of a substrate bobbin 48.

The substrate 10 can be unfolded by the substrate spool 48 in the form of a substrate track 52 and supplied to the machine 42 by a first advance unit 54 and a second advance unit 56 to be fixedly disposed between the advance units 54 and 56. A substrate guide 60 that accurately guides the substrate 10 during exposure, particularly in the illustrated embodiment, accurately guides the substrate track 52, as described below.

Thus, as shown in Figures 2 and 3, the first advancement unit 54 includes a plurality (e.g., three) of steering rollers 62, 64, and 66, wherein at least two of the three steering rollers 62, 64, and 66 The substrate track 52 is wound at a winding angle that is greater than 90 degrees, preferably greater than 120 degrees, to achieve a slip-free frictional engagement between the substrate track 52 and, for example, the steering rollers 62 and 64.

Thus, the substrate track 52 is located on one of the steering rollers 62, 64 (eg, the steering roller 62), which is achieved by the substrate surface 36 formed by the first photosensitive layer 32, but the substrate 10 is located at the steering rollers 62, 64. The other (e.g., steering roller 64) is achieved by the substrate surface 38 formed by the second photosensitive layer 34.

Each of the steering rollers 62, 64 is coupled to a rotary setter 72 and 74, wherein each of the rotary setters 72 and 74 achieves a rate whereby the substrate track 52 and the steering rollers 62, 64 are free from slippage. Move together.

Preferably, the rate of the substrate track 52 is obtained from the average of the peripheral speeds of the steering rollers 62, 64 as measured by the rotary setters 72 and 74.

In addition, the steering roller 66 is used, for example, only to steer the substrate track 52 through the substrate guide 60.

After passing through the substrate guide 60, the substrate track 52 is steered by another steering roller 76, wherein the steering roller 76 preferably clamps the substrate track 52 between it and a clamping roller 78, the clamping roller 78 configuration On one of the opposite sides of the substrate track 52, the substrate track 52 is supplied to the substrate carry-out unit 82.

In the substrate transport unit 82, the substrate track can, for example, also be wound in the form of a substrate spool or otherwise wound or otherwise unfolded.

In the present embodiment, in order to allow the substrate 10 moving via the substrate guide 60 to move in the advancement direction 84 at the desired advancement rate via the substrate guide 60 in the form of the substrate guide 52, the steering rollers 62, 64 are moved. At least one of 66, 76, and 78 is driven by a forward drive 86 that is associated with steering rollers 76 and 78 as shown in FIG. 2 such that the advance drive 86 can thereby cause the substrate track 52 moves through the substrate guide 60.

As shown in FIGS. 3 and 4, the substrate guide 60 includes two guide plates 92 and 94 which are also fixed to the table 42 and spaced apart from each other, and have mutually facing guides. Faces 96 and 98 have an intermediate zone 100 therebetween through which substrate 10 can be moved.

Therefore, the distance A of the guiding faces 96, 98 must be set such that there is a gap 102 or 104 between the guiding faces 96, 98 and the corresponding substrate surfaces 36, 38, which is between 30 microns and 150 microns. In the range, it is preferably in the range of 40 μm to 100 μm.

The gaps 102, 104 can in principle be formed as air gaps, but have the disadvantage that friction can occur between the respective substrate surfaces 36 or 38 and the corresponding guiding surfaces 96 or 98.

For this reason, the respective gaps 102 or 104 must be filled with a smoothing film 106 or 108 formed by a smoothing medium supplied to the respective gaps 102 or 104.

In the simplest case, the smoothing medium is water that is supplied to the substrate guide 60 by the smoothing medium supply 112 or 114 such that the smoothing medium can be along with the substrate 10 via the substrate guide 60 in the forward direction 84 The movement between the substrate surfaces 36, 38 and the guiding surfaces 92, 94 of the guiding plates 92, 94 corresponding to the surface of the substrate is prevented from moving.

Preferably, the substrate guide 60 is formed such that the guiding plates 92, 94 having the guiding faces 96, 98 and an important component extend in the direction of gravity (i.e., particularly close to the vertical direction), the smoothing Medium by It enters the gaps 102 and 104 under gravity and can move along the gap.

Thus, the so-called near vertical direction refers to an orientation that can deviate from the exact vertical direction by ±10 degrees.

Advantageously, after exposure to the substrate 10, the smoothing medium is removed by the smoothing medium receivers 116, 118 associated with the substrate guide 60, which smoothes the smoothing medium, for example, and/or Or suck out.

Due to the narrow tolerances of the gaps 102, 104 and the smoothing films 106 and 108 provided in the gaps 102, 104, the substrate 10 must be guided by the guide plates 92 and 94 for geometric exposure. The face 120 is accurately guided, and the exposure guide face 120 extends in the middle between the guide faces 96 and 98.

Therefore, when the guiding faces 96 and 98 extend parallel to each other, the guiding faces 120 for exposure also extend parallel to the guiding faces 96 and 98.

Further, the guiding surface 120 for exposure extends parallel to the advancing direction 84, wherein the advancing direction 84 is preferably superposed on the guiding surface 120 for exposure.

By the guide plates 92, 94 fixedly disposed on the machine table 42, the substrate 10 can be accurately positioned transversely to the guiding surface 120 for exposure by the substrate guide 60, thus on the substrate 10 (especially It is the photosensitive layer 32 and 34) that the exposure electromagnetic radiation does not cause significant focusing error.

The guide plates 92 and 94 for defining the exposure guide surface 120 thus extend in the direction of the guide faces 96 and 98 and are transverse to the entire extent of the substrate surfaces 36 and 38 transverse to the advancement direction 84. Extending in direction 84 and extending in at least one guiding length FL in the advancing direction 84, the guiding length FL allows the substrate 10 to have a sufficiently accurate positioning to expose the photosensitive layers 32 and 34.

In order to generate electromagnetic radiation for exposing the photosensitive layers 32 and 34, an exposure unit, generally indicated at 122 and 124, is required to allow the respective photosensitive layer 32 or 34 to be exposed in the exposure region 126 or 128. The exposure regions 126 or 128 extend on the one hand in a region length ZL parallel to the exposure guiding surface 120 and transverse to the guiding direction 84 on one region width ZB and parallel to the guiding surface 120 for exposure. Extending (Fig. 5), the area width ZB corresponds to at least one of the photosensitive layer 32 or 34 to be exposed B, transverse to the advancing direction 84 and parallel to the width of the guiding surface 120 for exposure (Fig. 4) It should produce structure S by selective exposure.

As shown in Fig. 4, each of the exposure units 122 and 124 must now be disposed on opposite sides of the substrate 10 such that the exposure regions 126 and 128 overlap in a range parallel to the length ZL of the region of the advancement direction 84.

Suitably, each of the exposure units 122 and 124 must be disposed such that the exposure regions 126 and 128 face each other on opposite sides of the exposure guide surface 120 and preferably face each other accurately, such that The extent length ZL of the exposed regions 126 and 128 facing each other can broadly overlap with their extent in the advancement direction 84.

In principle, each of the guide plates 92 and 94 may have a notch in the range of the exposed regions 126, 128 to allow electromagnetic waves to pass through to expose the photosensitive layers 32 and 94.

However, the disadvantage shown here is that the substrate 10 in the exposed areas 126 and 128 cannot be accurately guided.

For this reason, it is preferred that the guide sheets 92 and 94 are extended via the exposure regions 126, 128 and at least in the exposure regions 126 and 128 to be permeable to electromagnetic radiation to expose the photosensitive layers 32 and 34. Electromagnetic radiation is substantially unabsorbed (and, in the worst case, a lesser amount of absorption) through the respective guide plates 92 and 94 in the exposed regions 126, 128, and thus the guide plates in the exposed regions 126 and 128 can be made. The heating of 92 and 94 was ignored.

The respective exposure regions 122 and 124 are substantially arbitrarily formed.

It is particularly advantageous when forming the exposure units as shown in FIGS. 5 and 6 such that the exposure units have a plurality of columns 130 of radiation emitting regions 134 arranged in the column direction 132, generated by the radiation emitting region 134. Radiation for exposure, wherein an exposure spot corresponding to the radiation emitting region 134 can be produced on the photosensitive layers 32, 34 by the imaging unit, wherein each exposed spot can be deflected by at least one steering element in a moving direction ( It has at least one steering unit having a reflecting surface and is turned into an opening direction 136 extending transversely to the column direction 132 and inclined to the advancing direction 84 so as to be able to illuminate each exposure radiation in the direction 136 At least a portion of the exposed spots that overlap each other are produced in a plurality of sequentially exposed spot positions.

Such a steering unit has been described in detail, for example, in DE 10 2009 046 809 A1 or WO 2008/071347, and therefore, in order to describe the constitution of the mode of action of these exposure devices, reference can be made to these contents. The implementation of the document.

A second embodiment of the exposure apparatus of the present invention is shown in Figures 7 through 11, wherein the exposure unit 40' is also provided with a machine table 42' which stands on the standing surface 44.

Further, a substrate supply unit 46' and a substrate carry-out unit 82' are provided.

However, unlike the first embodiment, the substrate guide 60' is formed in a different manner.

As shown in Fig. 8, the substrate guide 60' also includes two guiding plates 92' and 94' which form an intermediate portion 100' with their guiding faces 96' and 98'. Of course, each guiding surface 96 'and 98' are located directly on the substrate surfaces 36 and 38 such that the substrate 10 is clamped between the guide plates 92' and 94' and thus can also be accurately guided relative to the guiding surface 120 for exposure, exposure The guide face 120 used extends in the middle between the guide faces 96' and 98'.

However, when the substrate 10 is moved in the advancing direction 84, unlike the first embodiment, the substrate 10 is not moved relative to the guide plates 92' and 94' fixedly disposed on the table 42 but The guide plates 92' and 94' are moved together with the substrate 10 in the advancement direction 84 and form an integrally movable unit with the substrate 10 during exposure of the photosensitive layers 32 and 34.

Thus, the guide plates 92' and 94' are clamped to each other by the clamping units 142 and 144 and are advanced on a guide table 146 having a table top 148 which extends parallel to the guiding surface 120 for exposure. Guided in direction 84 and by a forward drive associated with the guide table 146 While moving in the forward direction and even moving relative to the exposure units 122 and 124, each of the exposure units 122 and 124 is fixedly disposed on the table 42' as before.

In this case, each of the exposure regions 126 and 128 is also fixedly disposed, of course, the guide plates 92' and 94' are moved in the advancement direction 84 via the exposure regions 126 and 128, so that the guide plates 92' and 94 are provided. 'The whole is formed as electromagnetic radiation required for permeable exposure.

The movement of the guide plates 92' and 94' connected to each other via the clamping units 142 and 144 in the advancement direction 84 can also be located on the guide plate under the guidance of the table top 148 of the guide table 146. The substrate 10 between 92' and 94' is moved on the one hand in the advancement direction 84 and on the other hand can be accurately positioned transversely to the exposure guide surface 120, so that when the photosensitive layers 32 and 34 of the substrate 10 are exposed There is also no significant positional error.

As shown in Figures 9, 10 and 11, it is preferred to have a set of connected guide plates 92' and 94' in the advancement direction 84 between one of the exposure units 122 and 124 via the exposure units 122 and 124. The intermediate portion 154 moves to the other side of the exposure units 122 and 124 such that the substrate 10 between the guide sheets 92' and 94' can be exposed.

Therefore, the substrate 10 is not moved relative to the exposure units 122 and 124 in the form of the connected substrate tracks 52, but is intermittently moved in the form of the substrate segments 152, and the substrate segments 152 can be individually clamped to each other. A set of guide plates 92' and 94'.

Therefore, it is preferable that the substrate section 152 is guided by the substrate supply unit 46' to a set of guide sheets 92' and 94', respectively, according to Fig. 9. Standing on the side of the guide table 146 facing the substrate supply unit 46', and the substrate section 152 is clamped between the guide plates 92' and 94' in the direction of the substrate carry-out unit 82' in the forward direction 84. Medium movement, then, the substrate carry-out unit 82' accommodates the exposed substrate section 152 from the intermediate portion 100' between the guide sheets 92' and 94' such that the guide sheets 92' and 94' have no substrate in between In the case of the section 152, it is again movable in the direction of the substrate supply unit 46' to accommodate the substrate section 152 from the substrate supply unit 46' in the condition shown in FIG.

40‧‧‧Exposure device

42‧‧‧ machine

44‧‧‧standing face

46‧‧‧Substrate supply unit

48‧‧‧Substrate spool

52‧‧‧ substrate track

54, 56‧‧‧ Forward unit

60‧‧‧Substrate guide

62, 64, 66, 76‧‧‧ steering wheel

78‧‧‧Clamping roller

82‧‧‧Substrate delivery unit

84‧‧‧ Forward direction

112, 114‧‧‧Smooth media supply

116, 118‧‧‧Smooth media holder

Claims (31)

An exposure apparatus (40) for a substrate (10) having a planar material as a substrate substrate (12) having substrate substrate surfaces (26, 28) facing each other, and in the substrate substrate (12) a photosensitive layer (32, 34) on the surface of each of the substrates, wherein the photosensitive layer (32, 34) triggers a photochemical process by selective exposure and thus produces a selective structure (S), the exposure apparatus (40) comprising a machine (42) and at least one exposure unit (122, 124), the exposure device (40) being characterized in that a substrate guide (60) is disposed on the machine (42), The substrate (60) and the substrate surface (36, 38) are parallel to the exposure guiding surface (120), and are laterally positioned transversely to the exposure guiding surface (120), and in a parallel The guiding surface (120) for exposure is movably guided in the extending forward direction (84), so that the photosensitive layer (32, 34) on both sides of the guiding surface (120) for exposure is used. Exposure, comprising a plurality of exposure units (122, 124) fixedly disposed on the machine table (42) for selectively exposing one of the plurality of photosensitive layers (32, 34), respectively, such that the substrate (10) )in The advancement direction (84) is moved relative to the exposure unit (122, 124) for exposure. The exposure apparatus of claim 1, wherein the exposure guiding surface (120) extends in a lateral direction (Q) extending transversely to the advancing direction (84), at least over the range of the substrate (10) The transverse direction extends in the advancing direction (84) and extends in a guiding length (FL) in the advancing direction (84). An exposure apparatus according to claim 1 or 2, wherein each of the exposure units (122, 124) is formed so as to be made by the exposure units The respective photosensitive layer (32, 34) is selectively exposed in the exposed regions (126, 128), the exposed regions (126, 128) being transverse to the advancement direction (84) and on the substrate (10) The width (BB) of the exposed area (B) extends over, and in the forward direction (84), extends over a region within the guiding length (FL) of the guiding surface (120) for exposure. The exposure apparatus according to any one of claims 1 to 3, wherein the guiding surface (120) for exposure is relatively disposed such that the guiding length of the guiding surface (120) for exposure The two photosensitive layers (32, 34) in (FL) are exposed in the advancing direction (84). The exposure apparatus of any one of claims 1 to 4, wherein the exposure unit (122, 124) is relatively positioned such that each exposure area (126, 128) of the exposure unit (122, 124) is The forward direction (84) is arranged to overlap. The exposure apparatus of any one of claims 1 to 5, wherein the exposure unit (122, 124) is relatively disposed such that the exposure area (126, 128) is greater than the exposure area (126, 128) in the forward direction (84) One half of the range (ZL) can overlap in the forward direction (84). The exposure apparatus according to any one of claims 1 to 6, wherein the substrate (10) is positioned relative to the guiding surface (120) for exposure by the substrate guide (60) The exposure apparatus of claim 7, wherein the substrate guide (60) explicitly guides the substrate (10) to the guiding surface (120) for exposure, so that the substrate (10) is housed in Between the two guide plates (92, 94). An exposure apparatus according to claim 8 wherein the photosensitive layer The exposure of (32, 34) is performed via the guide sheets (92, 94). The exposure apparatus of claim 9, wherein the guide sheets (92, 94) are permeable to electromagnetic radiation for exposure at least in respective exposure areas. The exposure apparatus according to any one of claims 7 to 10, wherein the substrate (10) is movable in the advancing direction (84) with respect to each of the guiding plates (92, 94) for exposure. The exposure apparatus of claim 11, wherein the substrate (10) is movable relative to each of the guiding plates (92, 94) and friction can be less in the advancing direction between the guiding plates ( 84) Move in for exposure. An exposure apparatus according to claim 11 or 12, wherein the substrate (10) is separately formed by the smoothing film (106, 108) on the respective guiding plates (92, 94) and the substrate (10) The respective photosensitive layers (32, 34) are moved relative to each of the guide sheets with less friction. The exposure apparatus of claim 13, wherein the smoothing film (106, 108) is formed by a fluid. The exposure apparatus of claim 13 or 14, wherein the substrate guide (60) is provided with a smoothing medium supply (112, 114). The exposure apparatus of claim 15, wherein the smoothing medium supply (112, 114) supplies the smoothing film (106, 108) to the advancing direction before the photosensitive layer (32, 34) is exposed (84) The substrate (10) moved in the middle. The exposure apparatus of claim 16, wherein the substrate guide (60) is provided with a smoothing medium receiving member (116, 118) for exposure The smoothing medium is accommodated after the light. The exposure apparatus according to any one of claims 7 to 17, wherein the guiding surface (120) for exposure extends in a direction of gravity by a component. The exposure apparatus of claim 18, wherein the guiding surface (120) for exposure extends substantially in the direction of gravity. The exposure apparatus of claim 18 or 19, wherein the smoothing medium supply (112, 114) is disposed above the respective exposure unit (122, 124) in the direction of gravity. The exposure apparatus according to any one of claims 1 to 10, wherein the substrate is clamped between the guide sheets (92', 94') for exposure and can be associated with each of the guide sheets (92', 94). ') moves together in this forward direction (84). The exposure apparatus of claim 21, wherein the substrate (10) and each of the guide sheets (92', 94') are intermittently movable in the advancing direction (84). The exposure apparatus of claim 21 or 22, wherein the substrate (10) between the guiding plates (92', 94') for clamping is advanced by a guiding unit (146) The unit (150) moves in the forward direction. The exposure apparatus of claim 23, wherein the substrate (10) between the guiding plates (92', 94') for clamping can be parallel to the exposure by the guiding unit (146) The guiding surface (120) is guided. An exposure apparatus according to any one of claims 21 to 24, The substrate (10) between the guide sheets (92', 94') for clamping can be clamped to each other by clamping units (142, 144) located outside the exposure area (B). The exposure apparatus of claim 25, wherein the substrate (10) between the guiding plates (92', 94') for clamping can be clamped to each other by the clamping unit (142, 144) And moving away from each other to guide the substrate (10) into or between an intermediate region between the guiding plates (92', 94') Removed in the middle zone. The exposure apparatus according to any one of claims 1 to 26, wherein the substrate guide (60) is provided with a substrate supply unit (46). The exposure apparatus according to any one of claims 1 to 27, wherein the substrate guide (60) is provided with a substrate carry-out unit (82). The exposure apparatus of any one of claims 1 to 28, wherein the substrate guide (60) is provided with at least one advancing unit (54, 56, 150). The exposure apparatus according to any one of claims 1 to 29, wherein the substrate (10) is bendable in a longitudinal direction (L) thereof and a direction transverse to the substrate surface (36, 38). material. The exposure apparatus according to any one of claims 1 to 30, wherein the substrate (10) is difficult in the longitudinal direction (L) extending parallel to the advancing direction (84) in the guiding surface for exposure thereof Drag the material.