CN104885011A

CN104885011A - Exposure apparatus

Info

Publication number: CN104885011A
Application number: CN201380046149.7A
Authority: CN
Inventors: 汉斯·奥普韦尔; 克劳斯·云格尔
Original assignee: Ke Lieao Semiconductor Technology Co Ltd
Current assignee: Ke Lieao Semiconductor Technology Co Ltd
Priority date: 2012-09-04
Filing date: 2013-09-02
Publication date: 2015-09-02
Anticipated expiration: 2033-09-02
Also published as: CN104885011B; KR20160003620A; TWI612390B; TW201423281A; KR102221450B1; DE102012108211A1; WO2014037302A1

Abstract

In order that an exposure apparatus for a substrate comprising, as a substrate base, a flat material having mutually opposite substrate base surfaces and, on each of the substrate base surfaces of the substrate base, a photosensitive layer in which photochemical processes can be initiated by selective exposure and selective structures can be produced as a result, comprising a machine frame, and at least one exposure unit, is improved in such a way that a substrate having sensitive layers arranged on opposite sides can be exposed as efficiently as possible, it is proposed that a substrate guide is provided on the machine frame, which substrate guide positions the substrate with the substrate surfaces thereof parallel to an exposure guiding area and transversely with respect to the exposure guiding area in a defined manner and guides it movably in an advancing direction running parallel to the exposure guiding area, that for the purpose of exposing the photosensitive layers exposure units arranged on the machine frame in a stationary manner on both sides of the exposure guiding area are provided for selectively exposing in each case one of the photosensitive layers, and that the substrate is movable for the purpose of exposure relative to the exposure units in the advancing direction.

Description

Exposure sources

Technical field

The present invention relates to a kind of exposure sources for matrix, this matrix has to be with the planar materials of matrix substrate surface away form one another as matrix substrate and to have photographic layer on wherein each matrix substrate surface of matrix substrate, can trigger photochemistry by selectively exposing and can produce selectable structure thus in photographic layer, this exposure sources comprises frame and at least one exposing unit.

Background technology

By the known such exposure sources of prior art, in the prior art, usually the photographic layer of matrix is exposed, and after this other photographic layers are exposed.

Summary of the invention

Therefore, task of the present invention is to improve as follows the exposure sources of the described type of beginning, that is, can expose as far as possible efficiently have back to side on the matrix of sensitive layer arranged.

According to the present invention, this task solves in the following way in the exposure sources of the described type of beginning, namely, frame is provided with matrix guide portion, this matrix guide portion makes matrix be parallel to exposure guide surface with its matrix surface and locates with limiting transverse to exposing guide surface and can guide with moving along the direction of feed being parallel to the extension of exposure guide surface, in order to expose photographic layer, the both sides of exposure guide surface are provided with the exposing unit of fixed and arranged in frame, for exposing selectively one of them photographic layer respectively, and matrix can move along direction of feed relative to exposing unit to expose.

Therefore, the advantage according to solution of the present invention is, can expose two photographic layers in a straightforward manner with method respectively by wherein at least one exposing unit, and thus provides the exposure sources of very efficient work.

Particularly advantageously, exposure guide surface at least transversely extends at matrix transverse to direction of feed on the propagation size of the horizontal direction of direction of feed extension, and extends on length of lead along direction of feed.

Utilize such expansion of exposure guide surface can realize the location of the restriction of the optimum for the matrix being undertaken exposing by exposing unit.

Exposure sources according to the present invention particularly advantageously works in the case where there, namely, wherein each exposing unit is configured to utilize their corresponding photographic layers can expose selectively in exposure region, wherein, exposure region transverse to direction of feed on the width in the region to be exposed of matrix and along direction of feed be positioned at exposure guide surface length of lead region on extend.

That is, the length of lead of exposure guide surface is greater than the propagation size that corresponding exposure region is parallel to direction of feed, thus in region to be exposed, at least guarantee the location of the optimum of matrix.

In addition, particularly advantageously, exposing unit be located so that relative to each other two photographic layers be exposed on exposure guide surface length of lead in carry out along direction of feed.

A kind of solution suitable especially regulation, exposing unit is positioned to the exposure region of exposing unit is arranged overlappingly along direction of feed relative to each other.

At this according to advantageous manner, exposing unit is arranged to make exposure region be greater than it along overlapping in the half of the propagation size of direction of feed along direction of feed relative to each other.

In order to guide matrix relative to exposure guide surface with required positional accuracy, specifying in a kind of favourable embodiment of exposure sources, carrying out the location of matrix phase for exposure guide surface by matrix guide portion.

Matrix guide portion can differently and method construct, to realize the location relative to exposure guide surface.

Such as, the guide portion of the edge side being positioned at matrix can be provided with.

A kind of suitable solution regulation, matrix guide portion guides matrix with limiting relative to exposure guide surface in the following way, that is, make matrix be contained between two guided plates, wherein, guided plate can at the extension of exposure region.

At this, a kind of favourable solution regulation, carries out the exposure to photographic layer through guided plate, this is because can realize matrix location relative to the optimum of exposure guide surface when exposing thus.

At this, thinkable in principle, for guided plate arranges suitable groove.

But, because groove makes again the guiding degradation of matrix.

Due to this reason, a kind of favourable solution regulation, guided plate is at least transmissive for the electromagnetic radiation arranged to expose in the region of corresponding exposure region, thus the exposure of the photographic layer to matrix can be carried out through the material of guided plate, wherein, " transmissive " be interpreted as to electromagnetic radiation be absorbed in incident radiation 15% under, better under 10%.

In order to realize guiding matrix relative to exposure guide surface as well as possible and also can realize matrix moving along direction of feed on the other hand on the one hand, expect different solutions about guided plate and matrix movable performance relative to each other.

Therefore, a kind of suitable solution regulation, matrix can move along direction of feed relative to guided plate to expose, and that is, in this case, guided plate can be fixedly placed in frame in the simplest situations.

But also thinkable, due to other reasons, the movement of guided plate relative to frame is set.

In order to realize the location as well as possible of the matrix that can move along direction of feed relative to guided plate, preferably specify, matrix lowly between these guided plates frictionally to move along direction of feed relative to guided plate.

Therefore; movement along the low friction of direction of feed is conducive to guaranteeing that matrix phase is for level and smooth move of guided plate along direction of feed; thus can maintain speed of feed, this is because this speed of feed is conclusive for the degree of accuracy utilizing exposing unit to carry out exposing.

Such as thinkable in this case, for guided plate arranges corresponding coating, these coatings allow matrix phase frictionally to move for guided plate is low.

A kind of solution suitable especially regulation, matrix can lowly by the lubricating film between corresponding guided plate and the corresponding photographic layer of matrix frictionally move relative to guided plate.

At this, lubricating film can be formed by gel layer.

But the simple especially solution regulation of one, lubricating film is formed by liquid, and wherein, the simple example of such liquid is water.

In order to carry the medium for the formation of lubricating film, preferably specify, lubricant medium conveying device is attached troops to a unit in matrix guide portion, thus makes lubricant medium can directly flow to matrix guide portion.

Such as be arranged in such a way in this lubricant medium conveying device, that is, make the matrix conveying lubricating film that it moves along direction of feed at the forward direction exposed photographic layer, thus when exposing, matrix is accurately located relative to guided plate by lubricating film.

In order to advantageously again remove lubricating film from matrix, preferably specify, matrix guide portion is equipped with the lubricant medium accommodation section holding lubricant medium after exposition.

Especially when use lubricating film particularly advantageously, exposure guide surface extend along gravity direction with a part.

At this advantageously, exposure guide surface extends along gravity direction substantially, thus gravity supports use lubricant medium to form lubricating film.

According to suitable way, specify in this case, lubricant medium conveying device is arranged on corresponding exposing unit along gravity direction.

Another structural scheme regulation of matrix guide portion, matrix is clipped between guided plate, and can move to expose along direction of feed together with guided plate, that is, in this solution, there is no relative motion between matrix and guided plate, but in such matrix guide portion, matrix moves along direction of feed as unit together with guided plate.

This tool has the following advantages, and in this case, can carry out moving along direction of feed by being applied on guided plate, and and then can realize detecting moving of matrix by detecting guided plate along moving of direction of feed by simple mode.

Such as specify in this case, matrix can move off and on along direction of feed together with guided plate.

According to suitable way, in this case, matrix carries out as follows along moving of direction of feed, that is, by guidance unit and feed drive unit, the guided plate clamping matrix in-between can be moved along direction of feed.

At this, guidance unit especially provides the guiding precision being parallel to exposure guide surface, thus by guidance unit, the guided plate clamping matrix is in-between parallel to exposure guide surface and guides.

In order to matrix can be clamped between guided plate, preferably specifying, clamping the guided plate of matrix in-between by being positioned at the stretching unit tensioning each other outside exposure area.

At this, stretching unit can construct as follows, that is, make these stretching units only make guided plate tensioning each other.

A kind of particularly advantageous solution regulation, the guided plate clamping matrix in-between can by stretching unit tensioning and can moving out each other each other, matrix is introduced in the intermediate space between guided plate, or matrix is removed from the intermediate space between guided plate.

In order to realize carrying out optimum exposure process to matrix in exposure sources according to the present invention, preferred regulation, matrix supply unit is attached troops to a unit in matrix guide portion, and this matrix supply unit stores matrix, and this matrix can be carried to expose to matrix guide portion subsequently.

In addition, preferably specify, matrix output unit is attached troops to a unit in matrix guide portion, and this matrix output unit is contained in the matrix be exposed in the region of matrix guide portion.

Thinkable in principle, produce feed motion equally by matrix supply unit and/or matrix output unit.

Because very accurately must detect feed motion, can perform the accurate exposure of matrix, so preferably specify, at least one feed unit is attached troops to a unit in matrix guide portion.

Such feed unit of attaching troops to a unit in matrix guide portion allows to detect the feed motion of matrix phase for exposing unit with required degree of accuracy.

Up to the present, the structural scheme about matrix does not also have detailed description.

A kind of particularly advantageous solution regulation be suitable for according to exposure sources of the present invention, matrix is can along its longitudinal direction and can transverse to the bending material of matrix surface, thus matrix can be turned to when being guided through exposure sources, and also accurately can locate relative to exposure guide surface in matrix guide portion.

In addition, preferred regulation, matrix is the material being parallel to the longitudinal direction stretch-proof that direction of feed extends along it in exposure guide surface, thus when producing feed motion, especially when matrix should move along direction of feed relative to guided plate, make matrix can not be elongated, and and then the position of matrix accurately can be detected.

Accompanying drawing explanation

Following to the explanation of some embodiments and the theme of accompanying drawing according to other feature and advantage of solution of the present invention.In the accompanying drawings:

Fig. 1 illustrates the perspective schematic view for the matrix used in exposure sources according to the present invention;

Fig. 2 illustrates the explanatory view of the first embodiment according to exposure sources of the present invention;

Fig. 3 illustrates the view of exposure sources according to the present invention at matrix guide portion and the partial enlargement in the region of the feed unit of matrix guide portion of attaching troops to a unit;

Fig. 4 illustrates the view of the partial enlargement of the region X in Fig. 3;

Fig. 5 illustrates the vertical view of the embodiment according to exposing unit of the present invention;

Fig. 6 illustrates the skeleton view of the embodiment according to Fig. 5 according to exposing unit of the present invention;

Fig. 7 illustrates the explanatory view of similar Fig. 2 of the second embodiment according to exposure sources of the present invention;

Fig. 8 illustrates the view of the partial enlargement of similar Fig. 4 of the second embodiment according to exposure sources of the present invention;

Fig. 9 illustrates the fragmentary, perspective view of second embodiment according to exposure sources of the present invention before exposure with the guided plate clamping matrix in-between;

Figure 10 illustrates the view when exposing with the similar Fig. 9 of the guided plate clamping matrix in-between;

Figure 11 illustrates the view of the similar Fig. 9 of the guided plate clamping matrix after exposition in-between.

Embodiment

Shown in Fig. 1 and the matrix 10 carrying out exposing according to exposure sources of the present invention will be utilized to comprise matrix substrate 12, this matrix substrate has the carrier 14 be made up of planar materials, this carrier along the longitudinal direction L and horizontal direction Q extends, and is formed by non electrically conductive material.Carrier 14 is equipped with the conductive layer 22 or 24 covering carrier surface 16 and 18 completely on its carrier surface 16 and 18 away form one another, and its conductivity has the conductivity value in range of metal.

Conductive layer 22 or 24 is such as layers of copper, and conductive traces can be manufactured by structuring by this layers of copper subsequently, and conductive traces can form with carrier 14 circuit board being used for circuit jointly.

In order to set up the structuring of conductive layer 22 and 24, photographic layer 32 or 34 is applied on the matrix substrate surface 26 or 28 that formed by conductive layer 22 and 24, by utilizing the electromagnetic wave in the spectral range provided for photographic layer to carry out exposure to produce photochemical transformation process to the matrix surface 36 or 38 formed by photographic layer 32 and 34 in this photographic layer, thus corresponding to the conductive traces be made up of conductive layer 22 and the 24 subsequently and structure S made by the selectable photochemical transformation of corresponding photographic layer 32 and 34 can be produced by selectable exposure, wherein, these structure S can not be stripped off when carrying out subsequent treatment to matrix 10 based on photochemical transformation in etching process, and protect the region forming conductive traces subsequently of conductive layer 22 and 24, in case it is stripped off in such etching process, and all the other regions without photochemical transformation of photographic layer 32 and 34 and the region hidden by these photographic layers of conductive layer 22 and 24 are stripped off by etching process.

In order to can by be selectively exposed on set up structure S in photographic layer 32 and 34 and be provided with exposure sources 40 in fig. 2 shown in embodiment, this embodiment has frame 42, and this frame itself is erected on placement surface 44.

Matrix supply unit 46 is arranged in frame 42, such as when can transverse to carrier surface 16 and 18 bending and when being configured to the carrier 14 of strip material and the relative conductive layer 22 and 24 that should be able to bend and photographic layer 32 and 34, the form that matrix 10 rolls up 48 with matrix is stored in this matrix supply unit.

Matrix 10 launches from matrix volume 48 with the form of matrix web 52, and flow to the matrix guide portion 60 be fixedly placed between feed unit 54 and 56 in frame 42 by the first feed unit 54 and the second feed unit 56, this matrix guide portion 60 (as described in detail below) during exposure process accurately guides matrix 10, is matrix web 52 especially in an illustrated embodiment.

For this reason, as being shown specifically in figs. 2 and 3, first feed unit 54 comprises multiple, such as three guide rolls 62,64 and 66, wherein, at least two in three guide rolls 62,64 and 66 to be greater than 90 °, the winding angle being preferably greater than 120 ° be wound around by matrix web 52, to obtain matrix web 52 and the nonslipping friction such as between slewing rollers 62 and 64 sealed (Reibschluss).

At this, matrix web 52 is placed in slewing rollers 62,64 with the matrix surface 36 formed by the first photographic layer 32, such as, on slewing rollers 62, and matrix 10 is placed on another in slewing rollers 62,64 with the matrix surface 38 formed by the second photographic layer 34, such as, on slewing rollers 64.

Wherein each slewing rollers 62 and 64 connect with rotary encoder 72 and 74 itself, and wherein, wherein each rotary encoder 72 and 74 can detect the speed of matrix web 52 and slewing rollers 62 fricton-tightly associated movement together with 64.

At this, preferably obtained the speed of matrix web 52 by the mean value of the peripheral speed known by rotary encoder 72 and 74 of slewing rollers 62 and 64.

In addition, slewing rollers 66 such as only for making matrix web 52 turn to, thus make this matrix web through matrix guide portion 60.

After passing matrix guide portion 60, by other slewing rollers 76, matrix web 52 is turned to, wherein, slewing rollers 76 preferably these slewing rollers and be arranged in matrix web 52 back to side nip rolls 78 between clamp matrix web 52, subsequently matrix web 52 is flowed to matrix output unit 82.

In matrix output unit 82, matrix web such as can be rolled with the form of matrix volume equally, maybe can roll by other forms, maybe can deposit by other forms.

In order to can make in the present embodiment as matrix web 52 move through matrix guide portion 60 matrix 10 with expect speed of feed move through matrix guide portion 60 along direction of feed 84, wherein at least one slewing rollers 62,64,66,76 and 78 is driven by feed drive unit 86, this feed drive unit is such as attached troops to a unit in slewing rollers 76 and 78 according to Fig. 2, thus therefore feed drive unit 86 makes matrix web 52 move through matrix guide portion 60.

As shown in Figures 3 and 4, matrix guide portion 60 comprise two same fixed and arranged in frame 42 and the guided plate 92 and 94 arranged spaced apartly, these guided plates have guide surface 96 and 98 facing with each other, between these guide surfaces, there is intermediate space 100, matrix 10 can move through this intermediate space.

At this, the spacing A of guide surface 96,98 determines size as follows, that is, between guide surface 96 and 98 and corresponding matrix surface 36 and 38, there is gap 102 or 104 respectively, this gap in the scope of 30 microns to 150 microns, preferably in the scope of 50 microns to 100 microns.

In principle, gap 102,104 can be configured to air gap, but this has following shortcoming, that is, corresponding matrix surface 36 or can therefore occur between 38 and corresponding guide surface 96 or 98 friction.

Due to this reason, corresponding gap 102 or 104 is filled by lubricating film 106 or 108, and this lubricating film is formed by the lubricant medium flowing to corresponding gap 102 or 104.

In the simplest situations, lubricant medium is water, it flows to matrix guide portion 60 by lubricant medium delivery section 112 or 114, thus make lubricant medium can pass matrix guide portion 60 along direction of feed 84 and matrix 10 associated movement, and prevent the friction between matrix surface 36 and 38 and the guide surface 96 and 98 of corresponding these matrix surfaces of guiding of guided plate 92 and 94.

Basic guide portion 60 preferably constructs as follows, namely, the guided plate 92 and 94 with guide surface 96 and 98 with very large part along gravity direction, that is especially almost extend vertically, thus lubricant medium can be made to enter into gap 102 and 104 based on gravity, and can along intermittent motion.

At this, be almost vertically interpreted as and can offset at most ± the orientation of 10 degree with the direction of precise vertical.

According to advantageous manner, after matrix 10 exposes, remove lubricant medium by attaching troops to a unit in the lubricant medium accommodation section 116,118 of matrix guide portion 60, lubricant medium accommodation section is such as blown off and/or is siphoned away lubricant medium.

Due to gap 102 and 104 and the very narrow margin tolerance of lubricating film 106 and 108 that additionally arranges in gap 102 and 104, the exposure guide surface 120 achieving relative geometric configuration accurately guides matrix 10 through guided plate 92 and 94, and this exposure guide surface medially extends between guide surface 96 and 98.

Therefore, guide surface 96 with 98 relative to each other parallel extension time, exposure guide surface 120 be also parallel to guide surface 96 and 98 extend.

In addition, exposure guide surface 120 is parallel to direction of feed 84 and extends, and wherein, direction of feed 84 preferably overlaps with exposure guide surface 120.

Owing to being fixedly placed on the guided plate 92,94 in frame 42, achieve and accurately locate matrix 10 by matrix guide portion 60 transverse to exposure guide surface 120 ground, thus thus to matrix 10, especially, when its photographic layer 32 and 34 exposes, in for the electromagnetic radiation set by exposure, there will not be obvious focal error.

Limit exposure guide surface 120 guided plate 92 and 94 at this along the direction of its guide surface 96 and 98 and transverse to direction of feed 84 ground, at matrix surface 36 and 38 transverse to direction of feed 84 with along on the whole propagation size of direction of feed 84, at least extend on length of lead FL, this length of lead allows fully accurately to locate matrix 10 and exposes to make photographic layer 32 and 34.

In order to produce the electromagnetic radiation for exposing photographic layer 32 and 34, be provided with on the whole with the exposing unit of 122 and 124 marks, these exposing units allow to expose corresponding photographic layer 32 or 34 in exposure region 126 or 128, these exposure regions are parallel to exposure guide surface 120 on the one hand and expand on each section length ZL, and transverse to channeling direction 84 and be parallel to exposure guide surface 120 on sector width ZB, expand (Fig. 5), this sector width is parallel to transverse to direction of feed 84 width B (Fig. 4) that exposure guide surface 120 extends corresponding at least one of region B to be exposed of photosensitive 32 or 34, selectively expose should produce structure S by this.

As shown in Figure 4, exposing unit 122 and 124 this be arranged in relative to each other matrix 10 back to side on, thus make the exposure region 126 and 128 of these exposing units overlapping on the extension of section length ZL being parallel to direction of feed 84.

According to suitable way, exposing unit 122 and 124 is arranged relative to each other, thus make exposure region 126 and 128 be arranged in exposure guide surface 120 back to side on, and preferably accurately away form one another, thus make the section length ZL of exposure region 126 and 128 away form one another overlapping to a great extent with its extension along direction of feed 84.

In principle, guided plate 92 and 94 can have the portion of leaving a blank in the region of exposure region 126,128, so that the electromagnetic radiation that can be used in photographic layer 32 and 94 exposes is passed.

But this just in time has following shortcoming, that is, cannot accurately guide matrix 10 thus in exposure region 126 and 128.

Because this reason preferably specifies, guided plate 92 and 94 extends through exposure region 126,128, and at least construct for the electromagnetic radiation transmissive for exposing photographic layer 32 and 34 in the region of exposure region 126 and 128, thus make the essentially no absorption ground of electromagnetic radiation, in the worst case with the very little guided plate 92 and 94 be passed in absorbing in exposure region 126,128, and therefore can ignore the heating of the guided plate 92 and 94 in exposure region 126 and 128.

In principle, each exposing unit 122 and 124 can at random construct.

Particularly advantageously, as shwon in Figures 5 and 6, exposing unit constructs as follows, namely, exposing unit has the arrangement 130 in the radiation injection region 134 arranged with following each other along orientation 132, exposing light beam is from these radiation injection region injection, utilizing wherein every bar exposing light beam to pass through image-generating unit can at photographic layer 32, produce on 34 and penetrate the corresponding exposure spot in region 134 with radiation, wherein, each exposure spot can by least one deflection unit transversely in orientation 132 and favour direction of feed 84 extend yawing moment 136 deflect, this deflection unit has the deflecting element with at least one reflecting surface moved along direction of motion, thus utilize each exposing light beam can produce along yawing moment 136 exposure spot at least locally overlapped each other on multiple exposure spot position of following each other.

Such as in DE 10 2,009 049 809 A1 or WO 2008/071347, describe such deflection unit in detail, therefore in order to describe the structure of the principle of work of these exposure devices completely with reference to the embodiment of these documents.

Shown in Fig. 7 to Figure 11 according in the second embodiment of exposure sources of the present invention, exposure sources 40 ' is equipped with the frame 42 ' be erected on placement surface 44 equally.

This is outside equipped with matrix supply unit 46 ' and matrix output unit 82 '.

But being different from the first embodiment, matrix guide portion 60 ' differently constructs.

As shown in Figure 8, matrix guide portion 60 ' comprises two guided plates 92 ' and 94 ' equally, these guided plates form intermediate space 100 ' with its guide surface 96 ' and 98 ', but guide surface 96 ' and 98 ' is directly placed on matrix surface 36 and 38, thus make matrix 10 be clipped between guided plate 92 ' and 94 ', and accurately guide relative to exposure guide surface 120 equally thus, this exposure guide surface medially extends between guide surface 96 ' and 98 '.

But be different from the first embodiment be, do not carry out matrix 10 when matrix 10 moves along direction of feed 84 relative to the guided plate 92 ' be fixedly placed in frame 42 and 94 ' relative motion, but guided plate 92 ' moves along direction of feed 84 with 94 ' together with matrix 10, and be formed in the unit photographic layer 32 and 34 of this matrix being carried out to energy mass motion between exposure period together with matrix 10.

For this reason, guided plate 92 ' and 94 ' is by stretching unit 142 and 144 tensioning relative to each other, and this in be parallel to exposure guide surface 120 extend platform surface 148 guide table 146 on guide along direction of feed 84, and moved along direction of feed 84 by the feed drive unit 150 of attaching troops to a unit in guide table 146, that is move relative to the exposing unit 122 and 124 be fixedly placed on all the time in frame 42 '.

In this case, exposure region 126 and 128 is fixedly arranged equally, but guided plate 92 ' and 94 ' moves through exposure area 126 and 128 along direction of feed 84, thus guided plate 92 ' and 94 ' is generally speaking constructed for the electromagnetic radiation transmissive needed for exposure.

What guided by the platform surface 148 of guide table 146 along direction of feed 84 by the guided plate that is connected to each other via stretching unit 142 and 144 92 ' and 94 ' being moved, be positioned at guided plate 92 ' one side same with the matrix 10 between 94 ' to move along direction of feed 84, and accurately locate transverse to exposure guide surface 120 on the other hand, thus obvious Wrong localization can not be there is equally when exposing the photographic layer 32 and 34 of matrix 10 thus.

As Fig. 9, Figure 10 and as shown in Figure 11, preferably, one group of guided plate linked together 92 ' and 94 ' moves to the opposite side of exposing unit 122 and 124 through the intermediate space 154 exposing unit 122 and 124 from the side of exposing unit 122 and 124 along direction of feed 84, thus can expose the matrix 10 be positioned between these guided plates 92 ' and 94 '.

At this, the motion of matrix 10 is not carry out with the form of the matrix web 52 coherent relative to exposing unit 122 and 124, but carries out off and on the form of matrix section 152, and these matrix sections can be clipped between one group of guided plate 92 ' and 94 ' respectively.

Therefore preferably, matrix section 152 flows to one group of guided plate 92 ' and 94 ' from matrix supply unit 46 ' respectively, this group guided plate according to Fig. 9 be erected at guide table 146 towards on the side of matrix supply unit 46 ', and this matrix section 152 moves along direction of feed 84 towards the direction of matrix output unit 82 ' in the mode be clipped between guided plate 92 ' and 94 ' subsequently, this matrix output unit takes over from the intermediate space 100 ' between guided plate 92 ' and 94 ' the matrix section 152 exposed, thus guided plate 92 ' and 94 ' can be moved along the direction of matrix supply unit 46 ' again when not being positioned at middle matrix section 152, again to hold the matrix section 152 of matrix supply unit 46 ' in the position in fig .9.

Claims

1. the exposure sources for matrix (10) (40), described matrix has the planar materials of band matrix substrate surface (26,28) away form one another as matrix substrate (12), and each in described matrix substrate (12) has photographic layer (32,34), by selectively exposing and can triggering photochemistry in described photographic layer, and selectable structure (S) can be produced thus, described exposure sources comprises frame (42) and at least one exposing unit (122,124)

It is characterized in that, described frame (42) is provided with matrix guide portion (60), described matrix guide portion makes described matrix (60) with its matrix surface (36, 38) be parallel to exposure guide surface (120) and limit location, ground and can along guiding with being parallel to direction of feed (84) motion that described exposure guide surface (120) extends transverse to described exposure guide surface (120), and in order to described photographic layer (32, 34) expose, the both sides of described exposure guide surface (120) are provided with the exposing unit (122 be fixedly placed in described frame (42), 124), for respectively to described photographic layer (32, 34) photographic layer in exposes selectively, and described matrix (10) can relative to described exposing unit (122, 124) move along described direction of feed (84) to expose.

2. exposure sources according to claim 1, it is characterized in that, the propagation size of the horizontal direction (Q) that described exposure guide surface (120) is at least transversely extended in described direction of feed (84) at described matrix (10) transverse to described direction of feed (84) extends, and extends length of lead (FL) is upper along described direction of feed (84).

3. the exposure sources according to any one of the claims, it is characterized in that, described exposing unit (122, 124) each in constructs as follows, namely, utilize described exposing unit, corresponding photographic layer (32, 34) in exposure region (126, 128) can expose selectively in, described exposure region is gone up transverse to the width (BB) of described direction of feed (84) in the region (B) to be exposed of described matrix (10) and extends on the region of length of lead (FL) being positioned at described exposure guide surface (120) along described direction of feed (84).

4. the exposure sources according to any one of the claims, it is characterized in that, described exposing unit (120) is arranged to make to carry out along described direction of feed (84) in the length of lead (FL) being exposed on described exposure guide surface (120) of two photographic layers (32,34) relative to each other.

5. the exposure sources according to any one of the claims, it is characterized in that, described exposing unit (122,124) is positioned to the exposure region of described exposing unit (122,124) (126,128) is arranged overlappingly along described direction of feed (84) relative to each other.

6. the exposure sources according to any one of the claims, it is characterized in that, described exposing unit (122,124) is arranged to make described exposure region (126,128) overlapping in the half being greater than its propagation size (ZL) along described direction of feed (84) along described direction of feed (84) relative to each other.

7. the exposure sources according to any one of the claims, is characterized in that, carries out the location of described matrix (10) relative to described exposure guide surface (120) by matrix guide portion (60).

8. exposure sources according to claim 7, it is characterized in that, described matrix guide portion (60) makes described matrix (10) guide relative to described exposure guide surface (120) with limiting in the following way, that is, described matrix (10) is made to be contained between two guided plates (92,94).

9. exposure sources according to claim 8, is characterized in that, carries out through described guided plate (92,94) the exposure of described photographic layer (32,34).

10. exposure sources according to claim 9, is characterized in that, described guided plate (92,94) is at least transmissive for the electromagnetic radiation arranged to expose in the region of corresponding exposure region.

11. exposure sources according to any one of claim 7 to 10, is characterized in that, described matrix (10) can relative to described guided plate (92,94) along described direction of feed (84) motion to expose.

12. exposure sources according to claim 11, it is characterized in that, described matrix (10) can relative to described guided plate (92,94) and between which low frictionally along described direction of feed (84) motion to expose.

13. exposure sources according to claim 11 or 12, it is characterized in that, described matrix (10) can lowly respectively by the lubricating film (106,108) between corresponding guided plate (92,94) and the corresponding photographic layer (32,34) of described matrix (10) frictionally move relative to described guided plate.

14. exposure sources according to claim 13, is characterized in that, described lubricating film (106,108) is formed by liquid.

15. exposure sources according to claim 13 or 14, it is characterized in that, lubricant medium conveying device (112,114) is attached troops to a unit in described matrix guide portion (60).

16. exposure sources according to claim 15, it is characterized in that, described lubricant medium conveying device (112,114) carries described lubricating film (106,108) at the forward direction exposed described photographic layer (32,34) along the matrix (10) that direction of feed (84) is moved.

17. exposure sources according to claim 16, is characterized in that, described matrix guide portion (60) is equipped with the lubricant medium accommodation section (116,118) holding lubricant medium after exposition.

18. exposure sources according to any one of claim 7 to 17, it is characterized in that, described exposure guide surface (120) is extended along gravity direction with a part.

19. exposure sources according to claim 18, is characterized in that, described exposure guide surface (120) is extended along gravity direction substantially.

20. exposure sources according to claim 18 or 19, it is characterized in that, described lubricant medium conveying device (112,114) is arranged on corresponding exposing unit (122,124) along gravity direction.

21. exposure sources according to any one of claim 1 to 10, it is characterized in that, described matrix is clipped between described guided plate (92 ', 94 '), and can move to expose along described direction of feed (84) together with described guided plate (92 ', 94 ').

22. exposure sources according to claim 21, is characterized in that, described matrix (10) can move off and on along described direction of feed (84) together with described guided plate (92 ', 94 ').

23. exposure sources according to claim 21 or 22, it is characterized in that, by guidance unit (146) and feed unit (150), described guided plate (92 ', 94 ') can move along described direction of feed, clamps described matrix (10) between described guided plate.

24. exposure sources according to claim 23, it is characterized in that, by described guidance unit (146), described guided plate (92 ', 94 ') is parallel to described exposure guide surface (120) and guides, and clamps described matrix (10) between described guided plate.

25. exposure sources according to any one of claim 21 to 24, it is characterized in that, described guided plate (92 ', 94 '), by being positioned at stretching unit (142, the 144) tensioning each other outside described exposure area (B), clamps described matrix (10) between described guided plate.

26. exposure sources according to claim 25, it is characterized in that, described matrix (10) is clamped between described guided plate, described guided plate (92 ', 94 ') is by described stretching unit (142,144) tensioning and moving out each other each other, described matrix (10) is introduced in the intermediate space between described guided plate (92 ', 94 '), or described matrix (10) is removed from the intermediate space between described guided plate (92 ', 94 ').

27. exposure sources according to any one of the claims, it is characterized in that, described matrix supply unit (46) is attached troops to a unit in described matrix guide portion (60).

28. exposure sources according to any one of the claims, it is characterized in that, matrix output unit (82) is attached troops to a unit in described matrix guide portion (60).

29. exposure sources according to any one of the claims, it is characterized in that, at least one feed unit (54,56,150) is attached troops to a unit in described matrix guide portion (60).

30. exposure sources according to any one of the claims, is characterized in that, described matrix (10) is can along its longitudinal direction (L) and can transverse to the bending material of described matrix surface (36,38).

31. exposure sources according to any one of the claims, it is characterized in that, described matrix (10) is the material being parallel to longitudinal direction (L) stretch-proof that described direction of feed (84) extends along it in described exposure guide surface.