KR20120138751A - Substrate processing device - Google Patents
Substrate processing device Download PDFInfo
- Publication number
- KR20120138751A KR20120138751A KR1020127021746A KR20127021746A KR20120138751A KR 20120138751 A KR20120138751 A KR 20120138751A KR 1020127021746 A KR1020127021746 A KR 1020127021746A KR 20127021746 A KR20127021746 A KR 20127021746A KR 20120138751 A KR20120138751 A KR 20120138751A
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- South Korea
- Prior art keywords
- substrate
- sheet
- processing
- seat board
- stage
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Networks & Wireless Communication (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The substrate processing apparatus includes a conveying unit for conveying a strip-shaped sheet substrate in a first direction, a plurality of processing units each processing a plurality of sections in a second direction crossing the first direction among the sheet substrates, and a plurality of It is provided corresponding to each processing part of, and the stage apparatus which supports a sheet | seat board | substrate is provided.
Description
The present invention relates to a substrate processing apparatus.
As a display element which comprises a display apparatus, such as a display apparatus, a liquid crystal display element, an organic electroluminescent (organic EL) element, the electrophoretic element used for an electronic paper, etc. are known, for example. At present, as these display elements, active elements (active devices) that form a switching element called a thin film transistor (TFT) on a substrate surface and form respective display devices thereon have become mainstream. .
In recent years, the technique of forming a display element on a sheet-like board | substrate (for example, a film member etc.) is proposed. As such a technique, for example, a method called a roll-to-roll method (hereinafter, simply referred to as a "roll method") is known (see Patent Document 1, for example). The roll method sends out a sheet-like substrate (for example, a strip-shaped film member) wound around a supply roller on a substrate supply side, and winds up the sent substrate with a recovery roller on the substrate recovery side. To return.
And the gate electrode, gate oxide film, and semiconductor which comprise a TFT using a some processing apparatus, for example, conveying a board | substrate using a some conveyance roller etc. between a board | substrate being sent out and winding up. A film, a source / drain electrode, and the like are formed, and components of the display element are sequentially formed on the target surface of the substrate. For example, when forming an organic EL element, a light emitting layer, an anode, a cathode, an electric circuit, etc. are formed in order on a board | substrate. In recent years, since a large display element is requested | required, the board | substrate of a larger dimension has arisen.
However, when the dimension of a board | substrate becomes large in the orthogonal direction (direction of a board | substrate) with respect to the conveyance direction of a board | substrate, there exists a possibility that a board | substrate may wheel in the said width direction, for example during conveyance. Such warping of the substrate may cause, for example, a decrease in the alignment accuracy of each component of the display element formed on the surface to be processed of the substrate.
It is an object of the present invention to provide a substrate processing apparatus capable of performing the processing accuracy on the target surface of the substrate with high accuracy regardless of the dimensions of the substrate.
According to the aspect of this invention, the conveyance part which conveys a strip | belt-shaped sheet | seat board | substrate to a 1st direction, the some processing part which performs processing with respect to the some area | region of the 2nd direction which cross | intersects a 1st direction among the sheet substrates, and A substrate processing apparatus is provided corresponding to each of a plurality of processing units and includes a stage device for supporting a sheet substrate.
According to the aspect of this invention, a process can be performed with high precision on the said board | substrate irrespective of the dimension of a board | substrate.
BRIEF DESCRIPTION OF THE DRAWINGS The figure which shows the structure of the substrate processing apparatus which concerns on this embodiment.
2 is a diagram illustrating a configuration of a stage device according to the present embodiment.
3 is a diagram illustrating the configuration of an exposure apparatus and a stage apparatus according to the present embodiment.
4 is a diagram illustrating a configuration of an exposure apparatus and a stage apparatus according to the present embodiment.
5 is a diagram illustrating a configuration of an exposure apparatus and a stage apparatus according to the present embodiment.
6 is a diagram illustrating an exposure operation of an exposure apparatus.
FIG. 7 is a view showing alignment operation of the exposure apparatus and the stage apparatus. FIG.
8 illustrates alignment operation between the stage apparatus and the sheet substrate.
9 illustrates alignment operation between the stage apparatus and the exposure apparatus.
10 is a diagram showing another configuration of the substrate processing apparatus according to the present embodiment.
11 is a diagram showing another configuration of the substrate processing apparatus according to the present embodiment.
12 is a diagram showing another configuration of the substrate processing apparatus according to the present embodiment.
13 is a diagram showing another configuration of the substrate processing apparatus according to the present embodiment.
14 is a diagram showing another configuration of the substrate processing apparatus according to the present embodiment.
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1: is a figure which shows the structure of the substrate processing apparatus FPA which concerns on embodiment.
As shown in FIG. 1, the substrate processing apparatus FPA is a board | substrate supply part SU which supplies a sheet | seat board | substrate (for example, a strip | belt-shaped film member, FB), and the surface (surface to-be-processed) of the sheet | seat board | substrate FB. It has a substrate processing part PR which performs a process with respect to the board | substrate, the board | substrate collection | recovery part CL which collect | recovers the sheet | seat board | substrate FB, and the control part CONT which controls each part of these. The substrate processing apparatus FPA is installed in a factory or the like, for example.
The substrate processing apparatus FPA is a sheet | seat board | substrate FB after the sheet | seat board | substrate FB is sent out from the board | substrate supply part SU, and until the sheet | seat board | substrate FB is collect | recovered by the board | substrate collection | recovery part CL. A roll-to-roll method (hereinafter, simply referred to as a "roll method") that performs various processes on the surface of the device. The substrate processing apparatus FPA can be used when forming display elements (electronic devices), such as an organic electroluminescent element and a liquid crystal display element, on the sheet | seat board | substrate FB. Of course, the processing apparatus FPA can be used also when forming elements other than these elements.
As the sheet | seat board | substrate FB which becomes a process target in the substrate processing apparatus FPA, foil (foil), such as a resin film and stainless steel, can be used, for example. For example, the resin film is polyethylene resin, polypropylene resin, polyester resin, ethylene vinyl copolymer resin, polyvinyl chloride resin, cellulose resin, polyamide resin, polyimide resin, polycarbonate resin, polystyrene resin, vinyl acetate Materials, such as resin, can be used.
The dimension of the Y direction (short direction) of the sheet | seat board | substrate FB is formed in about 1 m-2 m, for example, and the dimension of X direction (long direction) is formed in 10 m or more, for example. Of course, this dimension is merely an example, and the present invention is not limited thereto. For example, the dimension of the Y direction of the sheet | seat board | substrate FB may be 1 m or less or 50 cm or less, and may be 2 m or more. In this embodiment, even if the sheet | seat board | substrate FB in which the dimension of a Y direction exceeds 2 m is used suitably. Moreover, the dimension of the X direction of the sheet | seat board | substrate FB may be 10 m or less.
The sheet substrate FB is formed to have flexibility, for example. The flexibility here means, for example, that the substrate can be bent without breaking or breaking even when a predetermined force of at least self-weight is applied to the substrate. For example, the flexibility to bend by the predetermined force is also included in the flexibility. Moreover, the said flexibility changes with the environment, such as the material, size, thickness, or temperature of the said board | substrate. In addition, as a sheet | seat board | substrate FB, although you may use one strip | belt-shaped board | substrate, you may set it as a structure formed by connecting several unit board | substrates and forming strip | belt-shaped.
It is preferable that the sheet substrate FB has a relatively small coefficient of thermal expansion such that its dimensions do not substantially change (small thermal deformation) even when the sheet substrate FB receives heat at a relatively high temperature (for example, about 200 ° C). For example, an inorganic filler can be mixed with a resin film and a thermal expansion coefficient can be made small. As an example of an inorganic filler, titanium oxide, zinc oxide, alumina, silicon oxide, etc. are mentioned.
The board | substrate supply part SU sends out and supplies the sheet | seat board | substrate FB wound by roll shape, for example to the board | substrate process part PR. The board | substrate supply part SU is provided with the shaft part which winds up the sheet | seat board | substrate FB, the rotation drive source which rotates this shaft part, etc., for example. Alternatively and / or additionally, the substrate supply unit SU may be, for example, a configuration in which a cover portion for covering the sheet substrate FB wound in a roll shape or the like is provided.
The board | substrate collection | recovery part CL winds up the sheet | seat board | substrate FB from board | substrate process part PR, for example in roll shape, and collect | recovers it. Like the substrate supply part SU, the board | substrate collection | recovery part CL is provided with the axial part for winding the sheet | seat board | substrate FB, the rotation drive source which rotates this axial part, the cover part which covers the recovered sheet | seat board | substrate FB, and the like. Substantially and / or additionally, when the sheet substrate FB is cut into a panel shape, for example, in the substrate processing part PR, for example, the sheet substrate FB is recovered in an overlapping state. The part CL may be a structure which collect | recovers the sheet | seat board | substrate FB in a state different from the state wound by roll shape.
The substrate processing part PR conveys the sheet | seat board | substrate FB supplied from the board | substrate supply part SU to the board | substrate collection | recovery part CL, and processes with respect to the to-be-processed surface Fp of the sheet | seat board | substrate FB in a conveyance process. Is done. The substrate processing part PR has the
The
The conveying
The
In this embodiment, the case where the
2 is a perspective view showing the configuration of the stage apparatus FST.
As shown in FIG. 2, the stage apparatus FST has a
The
The support table 75 is arrange | positioned in the center part of the X-direction, for example on the
Between the
In addition, although only two stage reference marks SFM are shown in FIG. 2, a pair of stage references | standards are provided for each
The detection camera DC which detects the said stage reference mark SFM is provided in the
The
The
That is, these roller parts are removed from the
In this embodiment, as shown in FIG. 3, the
The
4 shows the configuration of the
As shown in FIG. 4, the
As shown in FIG. 4, the
The illumination optical system IL illuminates the predetermined illumination area | region on the mask M with exposure light EL of uniform illuminance distribution. As exposure light EL emitted from illumination optical system IL, the bright line (g line, g line, h line, i line) etc. which are emitted from a mercury lamp are used, for example. The mask stage MST is moved by the
The two-dimensional position of the mask stage MST is measured by a laser interferometer (not shown), and the control unit CONT controls the position and speed of the mask stage MST through the
The
In this embodiment, after exposure of the pattern of the mask M with respect to one to-be-processed area | region Fp among the surface (to-be-processed surface) of the sheet | seat board | substrate FB is complete | finished, the next to-be-processed area | region is exposed. Before doing this, the mask stage MST is moved in the -X direction. Then, the mask stage MST and the sheet substrate FB are synchronized again in the X direction to expose the exposure area in the next to-be-processed area.
Thus, with respect to the sheet | seat board | substrate FB conveyed continuously in an X direction, while moving the mask M to X direction and after completion of one to-be-processed area | region, the mask M is moved to -X direction. By repeating the above operation, the image of the pattern of the mask M can be exposed on the plurality of processing areas of the sheet substrate FB.
In addition, as shown in FIG. 5, the
On the other hand, the
In addition, as shown in FIG. 5, the roller part of the
Specifically, the
Similarly, the
The stage reference marks (stage position detection reference marks, reference marks, SFM) are provided so as to face the projection optical systems PL1 to PL3, respectively. For example, the stage reference mark SFM is provided on the upstream side of the illumination region of the projection optical system PL of the
The substrate processing apparatus FPA comprised as mentioned above manufactures display elements (electronic device), such as an organic electroluminescent element and a liquid crystal display element, by a roll system by control of the control part CONT. Hereinafter, the process of manufacturing a display element using the substrate processing apparatus FPA of the said structure is demonstrated.
First, the strip | belt-shaped sheet | seat board | substrate FB wound by the roller is attached to the board | substrate supply part SU. The control part CONT rotates the roller so that the said sheet | seat board | substrate FB may be sent out from the board | substrate supply part SU in this state. And the sheet | seat board | substrate FB which passed the board | substrate process part PR is wound up by the roller of the board | substrate collection part CL. By controlling this board | substrate supply part SU and the board | substrate collection | recovery part CL, the to-be-processed surface of the sheet | seat board | substrate FB can be conveyed continuously with respect to the board | substrate process part PR.
The control part CONT is a sheet | seat by the conveying
During this step, in the case where the processing is performed by the
By using the
In this way, since each pair of
Next, an operation of performing alignment between the
In this operation, before performing exposure of the sheet | seat board | substrate FB with the
In addition, in this embodiment, rough alignment of the sheet | seat board | substrate FB with respect to 10A of exposure apparatuses is performed by the
In this embodiment, the alignment operation between the stage apparatus FST, the sheet | seat board | substrate FB, and the
FIG. 7: is a perspective view which shows the positional relationship between the stage apparatus FST, the sheet | seat board | substrate FB, and the
Moreover, the image of a pair of mask reference marks (process position detection reference mark, 2nd reference mark, MFM) provided in the mask M of the
In addition, in the two masks M used in the
8 is a diagram illustrating the alignment operation between the stage apparatus FST and the sheet substrate FB.
As shown in FIG. 8, the sheet | seat board | substrate FB has the to-be-processed area | region Fpa in which the display element is formed, for example in the surface (to-be-processed surface). The substrate reference mark FFM is formed in the area | region Fpb which deviated from the said to-be-processed area | region Fpa among the sheet | seat board | substrate FB, for example. The control part CONT, for example, is the timing at which the exposure process by the
In addition, a constant scale operation can be performed by forming, for example, a reference scale or the like on a portion of the back surface of the sheet substrate FB corresponding to the stage reference mark SFM. In this case, since the position of the sheet | seat board | substrate FB can also be detected continuously, the position and the moving speed of the mask M, or the illumination intensity of illumination optical system IL are matched with the conveyance speed of the sheet | seat board | substrate FB, for example. Etc. can also be adjusted. In addition, the imaging characteristics of the projection optical system PL1 and the projection optical system PL2 included in the
For example, even when the conveyance speed of the sheet substrate FB is not constant, the position and movement speed of the mask M, the illuminance of the illumination optical system IL, and the imaging characteristics of the projection optical system (image position, image plane) Surface shape), etc., and the exposure of high precision is performed, without adjusting the conveyance speed of the sheet | seat board | substrate FB. In addition, as a structure which detects the position of the sheet | seat board | substrate FB, it is not limited to the said structure, You may provide a position detection sensor etc. separately.
9 is a diagram illustrating alignment operation between the stage apparatus FST and the
In addition, when overlapping exposure area | regions F1-F5 in an exposure operation | movement, for example, after performing the exposure process by the
As mentioned above, according to this embodiment, the
Moreover, according to this embodiment, after performing exposure processing of a to-be-processed area | region by the
The technical scope of this invention is not limited to the said embodiment, A change can be added suitably in the range which does not deviate from the meaning of this invention.
In the said embodiment, although the board | substrate FB was supported by the support table 75 which has the flat surface parallel to the XY plane among the stage apparatus FST, it is not limited to this. For example, as shown in FIG. 10, you may use the roller stage RST as a stage corresponding to
Moreover, when using rollers, such as the
As a structure which deform | transforms the roller RR or roller parts Ra-Rc, the roller surface is used, for example as a surface of a roller (guide surface which guides the sheet | seat board | substrate FB), for example using a flexible member. The configuration is deformable. In addition, the roller surface is deformed by adjusting, for example, heat, hydraulic pressure, air pressure, and the like inside the roller. Thereby, the roller RR or roller parts Ra-Rc can be deformed to a desired shape. By deforming the rollers RR and the roller portions Ra to Rc in this manner, for example, wrinkles are formed locally on the sheet substrate FB, or the guide speed of the sheet substrate FB is changed. By advancing, the advancing direction and position shift of the said sheet | seat board | substrate FB can be adjusted.
Moreover, before the back surface of the sheet | seat board | substrate FB is supported by the
In addition, in the said embodiment, although the
For example, as shown in FIG. 13, projection area | region EA11, EA12, EA21, EA22 by
In addition, in the said embodiment, although the
In addition, in the said description, although the form which shifted the projection area | region by the some exposure apparatus to the X direction was demonstrated as an example, it is not limited to this. Alternatively and / or additionally, for example, a configuration in which the projection areas by the plurality of exposure apparatuses are aligned in the X direction, that is, arranged in a line in the Y direction can be applied.
In addition, in the said description, although the stage apparatus FST arrange | positioned corresponding to the some exposure apparatus was set as the structure provided with the 1st detection mechanism and the 2nd detection mechanism, it is not limited to this. Alternatively and / or additionally, the first detection mechanism and the second detection mechanism may be provided only in part of the stage apparatus FST.
In addition, in the said description, although the exposure apparatus was mentioned as the
FPA… Substrate processing apparatus FB. Sheet substrate
PR… Substrate processing unit CONT. The control unit
Fp… Surface FST to be processed. Stage device
DC… Detection camera M... Mask
MST… Mask stage IL... Illumination optical system
PL… Projection optical system CA. Detection camera
SFM… Stage reference mark FFM... Board reference mark
MFM… Mask reference marks F1 to F5. Exposure area
PL (PL1 to PL3). Projection optical system EA (EA1 to EA42). Projection area
10 ...
11 ... Stage driving
50 ...
71, 72...
73a to 73e, 74a to 74e, Ra to Rc... Roller parts
75... Support table 76... Groove
Claims (18)
A plurality of processing units which perform processing on a plurality of sections in the second direction crossing the first direction among the sheet substrates;
A substrate processing apparatus provided corresponding to each of said plurality of processing units and comprising a stage device for supporting the sheet substrate.
At least one of the said some processing part is arrange | positioned shifting | deviating from the exterior in the said 1st direction.
At least two of the said some process part is arrange | positioned shifting | deviating from another process part in the said 2nd direction.
Two said processing parts which perform a process with respect to the said section of the both ends of a said 2nd direction among the said some processing parts are arrange | positioned along the said 2nd direction.
A first detection mechanism for detecting a first positional relationship between the stage apparatus and the sheet substrate in at least one of the first direction and the second direction;
And a first position adjusting mechanism for adjusting the first positional relationship based on a detection result of the first detecting mechanism.
The stage apparatus has a reference mark provided in a portion supporting the sheet substrate,
The said 1st detection mechanism measures the said board | substrate mark provided in the said reference mark and the said sheet | seat board | substrate, and detects the said 1st positional relationship based on a measurement result.
The substrate mark is mounted so as to correspond to one or two or more of the plurality of sections.
The said 1st detection mechanism is a substrate processing apparatus provided in the said stage apparatus.
A second detection mechanism for detecting a second positional relationship between the stage device and the plurality of processing units in at least one of the first direction and the second direction;
And a second position adjusting mechanism for adjusting the second positional relationship based on the detection result of the second detecting mechanism.
The stage apparatus has a first reference mark provided in a portion supporting the sheet substrate,
The plurality of processing units have a second reference mark provided at a position at which the processing is performed,
The said 2nd detection mechanism measures the said 1st reference mark and the said 2nd reference mark, and detects the said 2nd positional relationship based on a measurement result.
The said 2nd detection mechanism is a substrate processing apparatus provided in the said stage apparatus.
A processing state detection mechanism for detecting a processing state of the section in which the processing is performed in the sheet substrate;
And a processing control unit for controlling the processing by the plurality of processing units on the sheet substrate based on the detection result by the processing state detection mechanism.
The said stage apparatus is further equipped with the support roller which supports the back surface of the said sheet | seat board | substrate.
The said support roller has a substrate processing apparatus which has the groove part which opposes at least one of the edge part in the said 2nd direction of the area | region corresponding to the said section among the back surface of the said sheet substrate.
The groove portion opposes both of the end portions in the second direction of the region.
The support roller has a divided structure corresponding to the plurality of sections.
At least one part of the said support roller is a substrate processing apparatus in which the magnitude | size of the radial direction is formed so that deformation is possible.
An exposure apparatus for exposing the section of the sheet substrate to at least one of the plurality of processing units.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US30398610P | 2010-02-12 | 2010-02-12 | |
| US61/303,986 | 2010-02-12 | ||
| PCT/JP2011/052879 WO2011099563A1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020177037335A Division KR101948467B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device and substrate processing method |
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| Publication Number | Publication Date |
|---|---|
| KR20120138751A true KR20120138751A (en) | 2012-12-26 |
| KR101816327B1 KR101816327B1 (en) | 2018-01-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020127021746A KR101816327B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device |
| KR1020177037335A KR101948467B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device and substrate processing method |
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| KR1020177037335A KR101948467B1 (en) | 2010-02-12 | 2011-02-10 | Substrate processing device and substrate processing method |
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|---|---|
| JP (1) | JP5761034B2 (en) |
| KR (2) | KR101816327B1 (en) |
| CN (1) | CN102741754B (en) |
| HK (1) | HK1171820A1 (en) |
| TW (2) | TWI492326B (en) |
| WO (1) | WO2011099563A1 (en) |
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| KR101816343B1 (en) * | 2012-04-13 | 2018-02-21 | 가부시키가이샤 니콘 | Cassette apparatus, substrate transfer apparatus, substrate processing apparatus, and substrate processing method |
| TWI611996B (en) * | 2012-05-18 | 2018-01-21 | 尼康股份有限公司 | Substrate processing apparatus |
| CN102790002B (en) * | 2012-07-27 | 2015-02-11 | 京东方科技集团股份有限公司 | Flexible substrate treatment device |
| JP6459234B2 (en) * | 2014-06-16 | 2019-01-30 | 株式会社ニコン | Substrate processing equipment |
| WO2015005118A1 (en) * | 2013-07-08 | 2015-01-15 | 株式会社ニコン | Substrate processing apparatus, device manufacturing system, device manufacturing method, and pattern formation apparatus |
| KR20160136439A (en) * | 2014-03-25 | 2016-11-29 | 가부시키가이샤 알박 | Film-formation device and film-formation method |
| TWI661280B (en) * | 2014-04-01 | 2019-06-01 | 日商尼康股份有限公司 | Substrate processing method and substrate processing device |
| JP6597601B2 (en) * | 2014-04-01 | 2019-10-30 | 株式会社ニコン | Substrate processing apparatus and device manufacturing method |
| CN109375475A (en) * | 2015-11-30 | 2019-02-22 | 株式会社尼康 | Substrate processing method using same and element fabricating device |
| JP6723831B2 (en) * | 2016-06-01 | 2020-07-15 | 株式会社オーク製作所 | Exposure equipment |
| JP7023620B2 (en) * | 2017-05-30 | 2022-02-22 | 株式会社オーク製作所 | Exposure equipment and substrate mounting method |
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2011
- 2011-02-10 WO PCT/JP2011/052879 patent/WO2011099563A1/en active Application Filing
- 2011-02-10 KR KR1020127021746A patent/KR101816327B1/en active IP Right Grant
- 2011-02-10 JP JP2011553890A patent/JP5761034B2/en active Active
- 2011-02-10 CN CN201180007819.5A patent/CN102741754B/en active Active
- 2011-02-10 KR KR1020177037335A patent/KR101948467B1/en active IP Right Grant
- 2011-02-11 TW TW100104532A patent/TWI492326B/en active
- 2011-02-11 TW TW104118584A patent/TWI557840B/en active
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| KR101816327B1 (en) | 2018-01-08 |
| KR20180004833A (en) | 2018-01-12 |
| CN102741754A (en) | 2012-10-17 |
| HK1171820A1 (en) | 2013-04-05 |
| JPWO2011099563A1 (en) | 2013-06-17 |
| WO2011099563A1 (en) | 2011-08-18 |
| JP5761034B2 (en) | 2015-08-12 |
| TW201535576A (en) | 2015-09-16 |
| TW201207980A (en) | 2012-02-16 |
| TWI557840B (en) | 2016-11-11 |
| KR101948467B1 (en) | 2019-02-14 |
| CN102741754B (en) | 2015-12-02 |
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