CN104885011B

CN104885011B - Exposure sources

Info

Publication number: CN104885011B
Application number: CN201380046149.7A
Authority: CN
Inventors: 汉斯·奥普韦尔; 克劳斯·云格尔
Original assignee: Ke Lieao Semiconductor Technology Co Ltd
Current assignee: Ke Lieao Semiconductor Technology Co Ltd
Priority date: 2012-09-04
Filing date: 2013-09-02
Publication date: 2018-07-17
Anticipated expiration: 2033-09-02
Also published as: KR102221450B1; CN104885011A; DE102012108211A1; TW201423281A; WO2014037302A1; TWI612390B; KR20160003620A

Abstract

A kind of exposure sources for matrix,The matrix has the planar materials with base substrate surface away form one another as base substrate,And there is photosensitive layer on each base substrate surface of base substrate,In the photosensitive layer photochemistry can be triggered by selectively exposing,And thus, it is possible to generate selectable structure,The exposure sources include rack and at least one exposing unit,In order to improve the exposure sources allow its expose as efficiently as possible with back to side on the matrix of sensitive layer arranged,It is recommended that matrix guide portion is arranged in rack,The matrix guide portion makes matrix be parallel to exposure guide surface with its matrix surface and positions with limiting and can be guided with moving along the direction of feed that exposure guide surface extends is parallel to transverse to exposure guide surface,And in order to be exposed to photosensitive layer,The both sides of exposure guide surface are provided with the exposing unit being fixedly placed in rack,For selectively being exposed to one of photosensitive layer respectively,And matrix can be moved along direction of feed to be exposed relative to exposing unit.

Description

Exposure sources

Technical field

The present invention relates to a kind of exposure sources for matrix, which has with base substrate surface away form one another Planar materials have photosensitive layer as base substrate and on wherein each base substrate surface of base substrate, in photosensitive layer In by selectively exposing can trigger photochemistry and thus, it is possible to generate selectable structure, the exposure sources packet Including rack and at least one exposing unit.

Background technology

By such exposure sources known in the art, in the prior art, usually to the photosensitive layer of matrix into Row exposure, and other photosensitive layers are exposed after this.

Invention content

Therefore, task of the invention lies in the exposure sources for improving the described type of beginning as follows, that is, Ke Yijin May efficiently expose with back to side on the matrix of sensitive layer arranged.

According to the present invention, solved in the following way in the exposure sources of task type described by beginning, that is, Matrix guide portion is provided in rack, the matrix guide portion make matrix with its matrix surface be parallel to exposure guide surface and transverse to Exposure guide surface limits ground positioning and can be guided with moving along the direction of feed that exposure guide surface extends is parallel to, in order to Photosensitive layer is exposed, the both sides of exposure guide surface are provided with exposing unit of the fixed and arranged in rack, for distinguishing One of photosensitive layer is selectively exposed, and matrix can be relative to exposing unit along direction of feed in order to expose Movement.

Therefore, it is that it is possible to pass through it respectively with method in a simple manner the advantages of solution according to the present invention In at least one exposing unit expose two photosensitive layers, and thus provide the exposure sources of very efficient operation.

Particularly advantageously, exposure guide surface at least extends in matrix transverse to direction of feed transverse to direction of feed Extend on the propagation size of horizontal direction, and extends on length of lead along direction of feed.

The matrix for being exposed by exposing unit may be implemented using such extension of exposure guide surface Optimal restriction positioning.

Exposure sources according to the present invention particularly advantageously work in the case where there, that is, wherein each exposing unit quilt Be configured to selectively be exposed in exposure region using their corresponding photosensitive layers, wherein exposure region transverse into To direction on the width in the region to be exposed of matrix and along direction of feed in the length of lead positioned at exposure guide surface Extend on region.

That is, the length of lead of exposure guide surface is more than the extension ruler that corresponding exposure region is parallel to direction of feed It is very little, at least ensure the optimal positioning of matrix in region to be exposed.

In addition, here it is particularly advantageous that exposing unit is located so that the exposure that is exposed on of two photosensitive layers is drawn relative to each other It is carried out along direction of feed in the length of lead of guide face.

A kind of particularly suitable solution regulation, exposing unit are positioned to make the exposure region edge of exposing unit relative to each other Direction of feed is overlappingly arranged.

Herein according to advantageous manner, exposing unit be arranged to make relative to each other exposure region along direction of feed more than its along into To being overlapped in the half of the propagation size in direction.

It is advantageous in one kind of exposure sources in order to guide matrix relative to exposure guide surface with required positional accuracy It is provided in embodiment, positioning of the matrix relative to exposure guide surface is carried out by matrix guide portion.

Matrix guide portion can differently and method construct, to realize the positioning relative to exposure guide surface.

For example, the guide portion of the edge side positioned at matrix can be provided with.

A kind of suitable solution regulation, matrix guide portion are drawn relative to exposure guide surface with limiting in the following way Lead matrix, that is, so that matrix is contained between two directing plates, wherein directing plate can extend except exposure region.

Here, a kind of advantageous solution regulation, carries out the exposure to photosensitive layer, this is because thus across directing plate Optimal positioning of the matrix in exposure relative to exposure guide surface may be implemented.

Here, thinkable in principle be, suitable groove is arranged for directing plate.

However, since groove makes the guiding degradation of matrix again.

Due to this reason, a kind of advantageous solution regulation, directing plate needle at least in the region of corresponding exposure region It is transmissive to the electromagnetic radiation being arranged to expose, so as to be carried out to the photosensitive of matrix across the material of directing plate The exposure of layer, wherein " transmissive " is interpreted as the absorption to electromagnetic radiation under the 15% of incident radiation, preferably exists Under 10%.

In order on the one hand may be implemented to guide matrix relative to exposure guide surface as well as possible and on the other hand also may be used To realize movement of the matrix along direction of feed, about directing plate and matrix movement relative to each other it is contemplated that different solutions Certainly scheme.

Therefore, a kind of suitable solution regulation, matrix can be moved relative to directing plate along direction of feed to expose, That is, in this case, directing plate can be fixedly placed in rack in the simplest case.

But it is also envisioned that due to other reasons, movement of the directing plate relative to rack is set.

In order to realize the positioning as well as possible for the matrix that can be moved along direction of feed relative to directing plate, preferably provide, Matrix can be moved to low friction along direction of feed relative to directing plate and between these directing plates.

Therefore, along the movement of the low friction of direction of feed it is advantageously ensured that matrix relative to directing plate along direction of feed Smooth movement, so as to maintain feed speed, this is because the feed speed using exposing unit for being exposed Accuracy for be conclusive.

Such as thinkable in this case is corresponding coating to be arranged for directing plate, these coatings allow matrix phase Directing plate low friction is moved.

A kind of particularly suitable solution regulation, matrix can be corresponding with matrix photosensitive by corresponding directing plate Layer between lubricating film low friction relative to directing plate move.

Here, lubricating film can be formed by gel layer.

However, a kind of particularly simple solution regulation, lubricating film are formed by liquid, wherein such liquid Simple example be water.

In order to convey the medium for being used to form lubricating film, preferably provide, lubricant medium conveying device is associated with matrix and draws Portion is led, to allow lubricant medium to be delivered directly to matrix guide portion.

Such as it is arranged in such a way in this lubricant medium conveying device, that is, make it before being exposed to photosensitive layer Lubricating film is conveyed to the matrix moved along direction of feed, it is accurate relative to directing plate to make matrix pass through lubricating film in exposure Positioning.

In order to advantageously remove lubricating film from matrix again, preferably provide, matrix guide portion, which is equipped, to expose The lubricant medium receiving portion of lubricant medium is accommodated later.

Especially using lubricating film particularly advantageously, exposure guide surface is prolonged with a part along gravity direction Exhibition.

It is advantageous that exposure guide surface substantially extends along gravity direction, it is situated between using lubrication to which gravity is supported Matter forms lubricating film.

It according to suitable way, provides in this case, lubricant medium conveying device is arranged in accordingly along gravity direction On exposing unit.

Another structural scheme of matrix guide portion provides that matrix is clipped between directing plate, and can together with directing plate edge Direction of feed is moved to be exposed, that is to say, that in the solution, there is no relative motion between matrix and directing plate, But in such matrix guide portion, matrix is moved together as unit along direction of feed with directing plate.

This has the following advantages that, in this case, by being applied to the fortune that can be carried out on directing plate along direction of feed It is dynamic, and can be realized with simple mode detect the fortune of matrix by detecting directing plate along the movement of direction of feed in turn It is dynamic.

It for example provides in this case, matrix can intermittently move together with directing plate along direction of feed.

According to suitable way, in this case, matrix is proceeded as follows along the movement of direction of feed, that is, by Guidance unit and feed drive unit enable the directing plate for clamping matrix in-between to be moved along direction of feed.

Here, guidance unit has been provided in particular in the guiding precision for being parallel to exposure guide surface, to single by guiding Member, the directing plate for clamping matrix in-between are parallel to exposure guide surface guiding.

In order to clamp matrix between directing plate, preferably provide, position can be passed through by clamping the directing plate of matrix in-between Stretching unit except exposure area is tensioned each other.

Here, stretching unit can be constructed in the following manner, that is, these stretching units is made only directing plate to be made to be tensioned each other.

A kind of particularly advantageous solution regulation, clamp in-between matrix directing plate can by stretching unit that This is tensioned and can move out each other, so that matrix to be introduced into the intermediate space between directing plate, or by matrix from directing plate Between intermediate space in remove.

Optimal exposure process is carried out to matrix in order to be realized in exposure sources according to the present invention, is preferably provided, base Body supply unit is associated with matrix guide portion, which stores matrix, and then can be defeated to matrix guide portion Give the matrix to be exposed.

Furthermore it is preferred that regulation, matrix output unit are associated with matrix guide portion, which is contained in matrix and draws Lead the matrix being exposed in the region in portion.

It is thinkable in principle to be, feed motion is equally generated by matrix supply unit and/or matrix output unit.

Because having to highly precisely detect feed motion, so that the accurate exposure of matrix can be executed, it is advantageous to Regulation, at least one feed unit are associated with matrix guide portion.

Be associated with matrix guide portion such feed unit allow with required accuracy detect matrix relative to The feed motion of exposing unit.

Up to the present, it is described in detail not yet about the structural scheme of matrix.

A kind of particularly advantageous solution regulation being suitable for exposure sources according to the present invention, matrix is can be vertical along it To direction and can transverse to matrix surface be bent material, to allow matrix to be turned to when being guided through exposure sources, And it can also be precisely located relative to exposure guide surface in matrix guide portion.

Furthermore it is preferred that regulation, matrix is to be parallel to the longitudinal direction that direction of feed extends in exposing guide surface along it to resist The material of stretching, thus when generating feed motion, especially when matrix should be moved relative to directing plate along direction of feed, Keep matrix elongated, and the position of matrix can be accurately detected in turn.

Description of the drawings

Other feature and advantage of solution according to the present invention are following explanations and attached drawing to several embodiments Theme.In the accompanying drawings：

Fig. 1 shows the perspective schematic view of the matrix for being used in exposure sources according to the present invention；

Fig. 2 shows the explanatory views of the first embodiment of exposure sources according to the present invention；

Fig. 3 shows exposure sources according to the present invention in matrix guide portion and is associated with the feed unit of matrix guide portion Region in partial enlargement view；

Fig. 4 shows the view of the partial enlargement of the region X in Fig. 3；

Fig. 5 shows the vertical view of the embodiment of exposing unit according to the present invention；

Fig. 6 shows the perspective view of the embodiment according to Fig. 5 of exposing unit according to the present invention；

Fig. 7 shows the explanatory view of similar Fig. 2 of the second embodiment of exposure sources according to the present invention；

Fig. 8 shows the view of the partial enlargement of similar Fig. 4 of the second embodiment of exposure sources according to the present invention；

Fig. 9 shows the exposure sources according to the present invention before exposure with the directing plate for clamping matrix in-between The local perspective view of second embodiment；

Figure 10 shows the view of similar Fig. 9 with the directing plate for clamping matrix in-between in exposure；

Figure 11 shows to clamp the view of similar Fig. 9 of the directing plate of matrix in-between after exposition.

Specific implementation mode

Shown in Fig. 1 and the matrix 10 that exposure sources according to the present invention are exposed is utilized to include base substrate 12, which has carrier 14 made of planar materials, and L and horizontal direction Q extend the carrier along the longitudinal direction, and It is formed by non electrically conductive material.Carrier 14 is equipped on its carrier surface 16 and 18 away form one another and carrier surface is completely covered 16 and 18 conductive layer 22 or 24, conductivity have the conductivity value in range of metal.

Conductive layer 22 or 24 is, for example, layers of copper, and subsequent conductive traces can be manufactured by the layers of copper by structuring, conductor mark The circuit board for circuit can be collectively formed in line with carrier 14.

In order to establish the structuring of conductive layer 22 and 24, photosensitive layer 32 or 34 is applied to the base formed by conductive layer 22 and 24 It, can be by using the electromagnetic wave in the spectral region provided for photosensitive layer in the photosensitive layer on body substrate surface 26 or 28 The matrix surface 36 or 38 formed by photosensitive layer 32 and 34 is exposed to generate photochemical transformation process, to by there is choosing The exposure selected can generate corresponding and by corresponding photosensitive layer 32 with the then conductive traces made of conductive layer 22 and 24 Structure S made of selectable photochemical transformation with 34, wherein these structures S be based on photochemical transformation to matrix 10 into It will not be stripped off in etching process when row subsequent processing, and protect the area for subsequently forming conductive traces of conductive layer 22 and 24 Domain is stripped off to prevent it in such etching process, and remaining area without photochemical transformation of photosensitive layer 32 and 34 Domain and conductive layer 22 and 24 region covered by these photosensitive layers are stripped off by etching process.

In order to be provided with exposure sources 40 by establishing structure S by being selectively exposed in photosensitive layer 32 and 34 There is rack 42, the rack itself to be erected on placement surface 44 for embodiment shown in fig. 2, the embodiment.

Matrix supply unit 46 is arranged in rack 42, such as in can be bent transverse to carrier surface 16 and 18 and construction In the case of the carrier 14 of strip material and the opposite conductive layer 22 that should be able to be bent and 24 and photosensitive layer 32 and 34, matrix 10 It is stored in the matrix supply unit in the form of matrix volume 48.

Matrix 10 is unfolded in the form of matrix web 52 from matrix volume 48, and by the first feed unit 54 and second Feed unit 56 is conveyed to the matrix guide portion 60 being fixedly placed between feed unit 54 and 56 in rack 42, the matrix Guide portion 60 (as described in detail below) during exposure process accurately guides matrix 10, the especially embodiment shown in In be matrix web 52.

For this purpose, as being shown specifically in figure 2 and figure 3, the first feed unit 54 includes multiple, such as three steerings Roller 62,64 and 66, wherein in three guide rolls 62,64 and 66 at least two to be more than 90 °, preferably greater than 120 ° Winding angle is wound by matrix web 52, to obtain matrix web 52 and for example fricton-tight between slewing rollers 62 and 64 Friction lock (Reibschluss).

Here, matrix web 52 is placed on the matrix surface 36 formed by the first photosensitive layer 32 in slewing rollers 62,64 On one, such as slewing rollers 62, and matrix 10 is placed on slewing rollers 62,64 with the matrix surface 38 formed by the second photosensitive layer 34 In another, such as on slewing rollers 64.

Wherein each slewing rollers 62 and 64 couples itself with rotary encoder 72 and 74, wherein wherein each turn round Formula encoder 72 and 74 can detect matrix web 52 and slewing rollers 62 and 64 fricton-tightly speed of associated movement together.

Here, it is preferred that the average value of the peripheral speed known by rotary encoder 72 and 74 by slewing rollers 62 and 64 Obtain the speed of matrix web 52.

In addition, slewing rollers 66 are for example only used for that matrix web 52 is made to turn to, to make the matrix web be guided across matrix Portion 60.

After matrix guide portion 60, matrix web 52 is set to turn to by other slewing rollers 76, wherein slewing rollers 76 It is preferred that the slewing rollers and be arranged in matrix web 52 back to side nip rolls 78 between clamp matrix web 52, so as to subsequent Matrix web 52 is conveyed to matrix output unit 82.

In matrix output unit 82, matrix web for example can be rolled equally in the form of matrix is rolled up, or can be by it He rolls form, or can be stored by other forms.

In order to make in the present embodiment as matrix web 52 move across the matrix 10 of matrix guide portion 60 to The feed speed of prestige moves across matrix guide portion 60,62,64,66,76 and of wherein at least one slewing rollers along direction of feed 84 78 are driven by feed drive unit 86, which is for example associated with slewing rollers 76 and 78 according to fig. 2, thus because This feed drive unit 86 makes matrix web 52 move across matrix guide portion 60.

As shown in Figures 3 and 4, matrix guide portion 60 include two same fixed and arrangeds in rack 42 and phase each other Compartment of terrain arrangement directing plate 92 and 94, these directing plates have guide surface 96 and 98 facing with each other, these guide surfaces it Between there are intermediate spaces 100, matrix 10 can move across the intermediate space.

Here, the spacing A of guide surface 96,98 as follows determine size, that is, guide surface 96 and 98 with it is corresponding It is respectively present gap 102 or 104 between matrix surface 36 and 38, which preferably exists in the range of 30 microns to 150 microns In the range of 50 microns to 100 microns.

In principle, gap 102,104 can be structured as air gap, however this has as a drawback that, that is, in corresponding matrix table It can therefore rub between face 36 or 38 and corresponding guide surface 96 or 98.

As a result of which corresponding gap 102 or 104 is filled by lubricating film 106 or 108, which passes through defeated The lubricant medium for giving corresponding gap 102 or 104 is formed.

In the simplest case, lubricant medium is water, and matrix is conveyed to by lubricant medium delivery section 112 or 114 Guide portion 60, so that lubricant medium can pass through matrix guide portion 60 along direction of feed 84 and 10 associated movement of matrix, and And prevent matrix surface 36 and 38 and the guide surface 96 of corresponding these matrix surfaces of guiding of directing plate 92 and 94 and 98 it Between friction.

Basic guide portion 60 is preferably constructed in the following manner, that is, the directing plate 92 and 94 with guide surface 96 and 98 is with very Big part is along gravity direction, that is to say, that extend especially nearly vertically, so as to so that lubricant medium be based on gravity into Enter into gap 102 and 104, and can be along intermittent motion.

Here, the nearly vertical orientation for being interpreted as that at most ± 10 degree can be deviated with the direction of precise vertical.

According to advantageous manner, after the exposure of matrix 10, by the lubricant medium receiving portion for being associated with matrix guide portion 60 116,118 removal lubricant medium, lubricant medium receiving portion for example blow and/or siphon away lubricant medium off.

Due to gap 102 and 104 and the lubricating film 106 that is additionally provided in gap 102 and 104 and 108 it is very narrow The margin of tolerance, the exposure guide surface 120 for realizing opposite geometry accurately guide matrix 10 across directing plate 92 and 94, are somebody's turn to do Exposure guide surface medially extends between guide surface 96 and 98.

Therefore, when guide surface 96 is with 98 parallel extension relative to each other, exposure guide surface 120 is also parallel with guide surface 96 Extend with 98.

In addition, exposure guide surface 120 is parallel to the extension of direction of feed 84, wherein direction of feed 84 is preferably guided with exposure Face 120 overlaps.

Due to the directing plate 92,94 being fixedly placed in rack 42, realize through matrix guide portion 60 transverse to exposure 120 ground of light guide surface is accurately positioned matrix 10, and thus to matrix 10, especially its photosensitive layer 32 and 34 is exposed When, be not in apparent focal error in for the set electromagnetic radiation of exposure.

Limit exposure guide surface 120 directing plate 92 and 94 herein along the direction of its guide surface 96 and 98 and transverse into Give direction 84 ground, on entire propagation size of the matrix surface 36 and 38 transverse to direction of feed 84 and along direction of feed 84, until Few to extend on length of lead FL, which allows adequately accurately to position matrix 10 so that photosensitive layer 32 and 34 exposes.

In order to generate the electromagnetic radiation for being exposed to photosensitive layer 32 and 34, it is provided on the whole with 122 and 124 marks The exposing unit of note, these exposing units allow to be exposed corresponding photosensitive layer 32 or 34 in exposure region 126 or 128, On the one hand these exposure regions are parallel to exposure guide surface 120 and are extended on each section length ZL, and transverse to channeling direction It 84 and is parallel to exposure guide surface 120 and on sector width ZB extend (Fig. 5), which corresponds to photosensitive 32 or 34 and wait for The region B of exposure it is at least one transverse to direction of feed 84 and be parallel to exposure guide surface 120 extend width B (Fig. 4), lead to Structure S should be generated by crossing the selectable exposure.

As shown in Figure 4, exposing unit 122 and 124 be arranged in relative to each other herein matrix 10 back to side on, to So that the exposure region 126 and 128 of these exposing units is overlapped on the extension for the section length ZL for being parallel to direction of feed 84.

According to suitable way, exposing unit 122 and 124 is arranged relative to each other, to make exposure region 126 and 128 be arranged in Expose guide surface 120 back to side on, and it is preferably exactly away form one another so that 126 He of exposure region away form one another 128 section length ZL is largely overlapped with it along the extension of direction of feed 84.

In principle, directing plate 92 and 94 can have portion of leaving a blank in the region of exposure region 126,128, so as to use It is passed through in the electromagnetic radiation being exposed to photosensitive layer 32 and 34.

However, this just has as a drawback that, that is, thus can not accurately guide matrix 10 in exposure region 126 and 128.

Preferred regulation, directing plate 92 and 94 extend through exposure region 126,128 due to this reason, and at least in exposure region It is constructed for the electromagnetic radiation transmissive for being exposed to photosensitive layer 32 and 34 in 126 and 128 region, to make electricity Magnetic radiation passes through the guiding in exposure region 126,128 with absorbing with very little in the worst case substantially without ground is absorbed Plate 92 and 94, and therefore can ignore the heating of the directing plate 92 and 94 in exposure region 126 and 128.

In principle, each exposing unit 122 and 124 can be constructed arbitrarily.

Particularly advantageously, as shwon in Figures 5 and 6 like that, exposing unit is constructed in the following manner, that is, exposing unit With the arrangement 130 for projecting region 134 with the radiation arranged everywhere each other along orientation 132, exposing light beam is radiated from these It projects region to project, can be generated on photosensitive layer 32,34 by imaging unit using wherein every exposing light beam and be penetrated with radiation Go out 134 corresponding exposure spot of region, wherein each exposure spot can be by least one deflection unit transverse to row Column direction 132 and the deflection of deflection direction 136 for favouring the extension of direction of feed 84, which has moves along the direction of motion The deflecting element at least one reflecting surface, to using each exposing light beam can along deflection direction 136 it is multiple that The exposure spot at least locally to overlap each other is generated on this exposure spot position followed.

Such as such deflection is described in detail in DE 10 2,009 049 809 A1 or WO 2008/071347 Unit, thus in order to describe these exposure devices operation principle construction entirely by reference to these documents embodiment.

In the second embodiment of the exposure sources according to the present invention shown in Fig. 7 to Figure 11, exposure sources 40 ' are same It is equipped with the rack 42 ' being erected on placement surface 44.

In addition matrix supply unit 46 ' and matrix output unit 82 ' are provided with.

However it is different from first embodiment, matrix guide portion 60 ' is configured differently.

As shown in Figure 8, matrix guide portion 60 ' equally includes two directing plates 92 ' and 94 ', these directing plates are drawn with it Guide face 96 ' and 98 ' forms intermediate space 100 ', but guide surface 96 ' and 98 ' is directly placed on matrix surface 36 and 38, from And matrix 10 is made to be clipped between directing plate 92 ' and 94 ', and thus equally accurately drawn relative to exposure guide surface 120 It leads, which medially extends between guide surface 96 ' and 98 '.

However be different from first embodiment, when matrix 10 is moved along direction of feed 84 without matrix 10 relative to The relative motion for the directing plate 92 ' and 94 ' being fixedly placed in rack 42, but directing plate 92 ' and 94 ' is along direction of feed 84 Moved together with matrix 10, and be formed in together with matrix 10 photosensitive layer 32 and 34 of the matrix is exposed during can be whole The unit of body movement.

For this purpose, directing plate 92 ' and 94 ' is tensioned relative to each other by stretching unit 142 and 144, and in itself with flat Guide table 146 upper edge direction of feed 84 of the row in the platform surface 148 that exposure guide surface 120 extends guides, and by matching The feed drive unit 150 for belonging to guide table 146 is moved along direction of feed 84, that is to say, that relative to being fixedly placed on always Exposing unit 122 and 124 in rack 42 ' moves.

In this case, exposure region 126 and 128 is equally fixedly arranged, however directing plate 92 ' and 94 ' is along feeding side Exposure area 126 and 128 is moved across to 84, to make directing plate 92 ' and 94 ' generally speaking be directed to the required electromagnetism spoke of exposure It constructs with penetrating transmissive.

By the directing plate 92 ' and 94 ' that is connected to each other via stretching unit 142 and 144 along direction of feed 84 by guide table The movement that 146 platform surface 148 guides, the matrix 10 between directing plate 92 ' and 94 ' are same on the one hand along direction of feed 84 Movement, and being on the other hand accurately positioned transverse to exposure guide surface 120, and thus to the photosensitive layer 32 and 34 of matrix 10 into Apparent Wrong localization will not equally occur when row exposure.

Such as Fig. 9, Figure 10 and as shown in Figure 11, it is preferred that one group of directing plate 92 ' to link together and 94 ' along into To direction 84 exposure is moved to from intermediate space 154 of the side of exposing unit 122 and 124 across exposing unit 122 and 124 The other side of light unit 122 and 124, so as to be exposed to the matrix 10 being located between these directing plates 92 ' and 94 '.

Here, the movement of matrix 10 is come in the form of the matrix web 52 to link up relative to exposing unit 122 and 124 It carries out, but is intermittently carried out in the form of matrix section 152, these matrix sections can be clipped in one group of directing plate 92 ' respectively Between 94 '.

It is therefore preferable that matrix section 152 respectively from matrix supply unit 46 ' be conveyed to one group of directing plate 92 ' and 94 ', this group of directing plate is erected at according to Fig. 9 on the side towards matrix supply unit 46 ' of guide table 146, and the matrix area Section 152 is then transported along direction of feed 84 towards the direction of matrix output unit 82 ' in a manner of being clipped between directing plate 92 ' and 94 ' Dynamic, which takes over the matrix section 152 exposed from the intermediate space 100 ' between directing plate 92 ' and 94 ', from And make directing plate 92 ' and 94 ' can be in the case where being not at intermediate matrix section 152 again along matrix supply unit 46 ' direction movement, to accommodate the matrix section 152 of matrix supply unit 46 ' in position shown in fig.9 again.

Claims

1. one kind is used for the exposure sources (40) of matrix (10), described matrix have with base substrate surface away form one another (26, 28) planar materials are as base substrate (12), and each in the base substrate surface of described matrix substrate (12) All there is photosensitive layer (32,34) on base substrate surface, photochemistry can be triggered by selectively exposing in the photosensitive layer Process, and thus, it is possible to generate selectable structure (S), the exposure sources include rack (42) and at least one exposing unit (122,124),

It is characterized in that, being provided with matrix guide portion (60) in the rack (42), described matrix guide portion makes described matrix (10) exposure guide surface (120) is parallel to its matrix surface (36,38) and limits ground transverse to the exposure guide surface (120) Positioning and energy be guided along direction of feed (84) movement for being parallel to exposure guide surface (120) extension, and be The photosensitive layer (32,34) is exposed, is provided in the both sides of the exposure guide surface (120) and is fixedly placed on institute The exposing unit (122,124) in rack (42) is stated, for being carried out respectively to a photosensitive layer in the photosensitive layer (32,34) It selectively exposes, and described matrix (10) can be relative to the exposing unit (122,124) along the direction of feed (84) Movement is to be exposed, wherein carries out described matrix (10) relative to the exposure guide surface by matrix guide portion (60) (120) positioning, wherein described matrix guide portion (60) makes described matrix (10) limit ground in the following way relative to described Exposure guide surface (120) guides, that is, so that described matrix (10) is contained between two directing plates (92,94), wherein right The exposure of the photosensitive layer (32,34) is carried out across the directing plate (92,94), wherein the directing plate (92,94) at least exists It is transmissive to be directed to the electromagnetic radiation being arranged to expose in the region of corresponding exposure region, wherein described matrix (10) It can be moved along the direction of feed (84) to be exposed relative to the directing plate (92,94) during exposure.

2. exposure sources according to claim 1, which is characterized in that the exposure guide surface (120) transverse to it is described into To the extension ruler for the horizontal direction (Q) that direction (84) at least extend in described matrix (10) transverse to the direction of feed (84) Very little upper extension, and extend on length of lead (FL) along the direction of feed (84).

3. exposure sources according to claim 1 or 2, which is characterized in that each in the exposing unit (122,124) It is a to be all constructed in the following manner, that is, to utilize the exposing unit, corresponding photosensitive layer (32,34) is in exposure region (126,128) It can selectively be exposed, the exposure region is transverse to the direction of feed (84) in the area to be exposed of described matrix (10) In the length of lead (FL) positioned at the exposure guide surface (120) on the width (BB) in domain (B) and along the direction of feed (84) Extend on interior region.

4. exposure sources according to claim 1, which is characterized in that the exposing unit (122,124) cloth relative to each other Being set to keeps the length of lead (FL) for being exposed on the exposure guide surface (120) of two photosensitive layers (32,34) interior along the feeding Direction (84) carries out.

5. exposure sources according to claim 2, which is characterized in that the exposing unit (122,124) cloth relative to each other Being set to keeps the length of lead (FL) for being exposed on the exposure guide surface (120) of two photosensitive layers (32,34) interior along the feeding Direction (84) carries out.

6. exposure sources according to claim 1, which is characterized in that the exposing unit (122,124) is fixed relative to each other Position is at making the exposure region (126,128) of the exposing unit (122,124) overlappingly be arranged along the direction of feed (84).

7. exposure sources according to claim 2, which is characterized in that the exposing unit (122,124) is fixed relative to each other Position is at making the exposure region (126,128) of the exposing unit (122,124) overlappingly be arranged along the direction of feed (84).

8. exposure sources according to claim 1, which is characterized in that the exposing unit (122,124) cloth relative to each other Being set to makes the exposure region (126,128) along the direction of feed (84) in the extension ruler more than it along the direction of feed (84) It is overlapped in the half of very little (ZL).

9. exposure sources according to claim 2, which is characterized in that the exposing unit (122,124) cloth relative to each other Being set to makes the exposure region (126,128) along the direction of feed (84) in the extension ruler more than it along the direction of feed (84) It is overlapped in the half of very little (ZL).

10. according to the exposure sources described in claim 1,2,4,5,6,7,8, any one of 9, which is characterized in that described matrix (10) it can be moved to low friction along the direction of feed (84) to carry out relative to the directing plate (92,94) and between them Exposure.

11. according to the exposure sources described in claim 1,2,4,5,6,7,8, any one of 9, which is characterized in that described matrix It (10) can be respectively by between corresponding photosensitive layer (32,34) of the corresponding directing plate (92,94) with described matrix (10) Moved relative to the directing plate to lubricating film (106,108) low friction.

12. exposure sources according to claim 11, which is characterized in that the lubricating film (106,108) is formed by liquid.

13. exposure sources according to claim 11, which is characterized in that lubricant medium conveying device (112,114) is attached In described matrix guide portion (60).

14. exposure sources according to claim 13, which is characterized in that the lubricant medium conveying device (112,114) In the forward direction being exposed to the photosensitive layer (32,34) lubricating film is conveyed along the matrix (10) that direction of feed (84) moves (106、108)。

15. exposure sources according to claim 14, which is characterized in that described matrix guide portion (60), which is equipped, to expose The lubricant medium receiving portion (116,118) of lubricant medium is accommodated later.

16. exposure sources according to claim 13, which is characterized in that the exposure guide surface (120) is with a part of edge Gravity direction extends.

17. exposure sources according to claim 16, which is characterized in that the exposure guide surface (120) is along gravity direction Extend.

18. exposure sources according to claim 16, which is characterized in that the lubricant medium conveying device (112,114) It is arranged on corresponding exposing unit (122,124) along gravity direction.

19. one kind being used for the exposure sources (40) of matrix (10), described matrix has with base substrate surface away form one another The planar materials of (26,28) are and every in the base substrate surface of described matrix substrate (12) as base substrate (12) All there is photosensitive layer (32,34) on one base substrate surface, light can be triggered by selectively exposing in the photosensitive layer Chemical process, and thus, it is possible to generate selectable structure (S), the exposure sources include rack (42) and at least one exposure Unit (122,124),

It is characterized in that, being provided with matrix guide portion (60) in the rack (42), described matrix guide portion makes described matrix (10) exposure guide surface (120) is parallel to its matrix surface (36,38) and limits ground transverse to the exposure guide surface (120) Positioning and energy be guided along direction of feed (84) movement for being parallel to exposure guide surface (120) extension, and be The photosensitive layer (32,34) is exposed, is provided in the both sides of the exposure guide surface (120) and is fixedly placed on institute The exposing unit (122,124) in rack (42) is stated, for being carried out respectively to a photosensitive layer in the photosensitive layer (32,34) It selectively exposes, and described matrix (10) can be relative to the exposing unit (122,124) along the direction of feed (84) Movement is to be exposed, wherein carries out described matrix (10) relative to the exposure guide surface by matrix guide portion (60) (120) positioning, wherein described matrix guide portion (60) makes described matrix (10) limit ground in the following way relative to described Exposure guide surface (120) guides, that is, described matrix (10) is made to be contained between two directing plates (92 ', 94 '), wherein The exposure of the photosensitive layer (32,34) is carried out across the directing plate (92 ', 94 '), wherein the directing plate (92 ', 94 ') It is transmissive that the electromagnetic radiation being arranged to expose is directed at least in the region of corresponding exposure region, wherein the base Body is clipped between the directing plate (92 ', 94 ') during exposure and can be with the directing plate (92 ', 94 ') together along described Direction of feed (84) is moved to be exposed.

20. exposure sources according to claim 19, which is characterized in that described matrix (10) can be with the directing plate (92 ', 94 ') are intermittently moved along the direction of feed (84) together.

21. exposure sources according to claim 19, which is characterized in that by guidance unit (146) and feed unit (150), the directing plate (92 ', 94 ') can move along the direction of feed, and described matrix is clamped between the directing plate (10)。

22. exposure sources according to claim 19, which is characterized in that by the guidance unit (146), the guiding Plate (92 ', 94 ') is parallel to the exposure guide surface (120) and guides, and described matrix is clamped between the directing plate (10)。

23. exposure sources according to claim 19, which is characterized in that the directing plate (92 ', 94 ') can be by being located at Stretching unit (142,144) except the exposure area (B) is tensioned each other, and described matrix is clamped between the directing plate (10)。

24. exposure sources according to claim 23, which is characterized in that clamp described matrix between the directing plate (10), the directing plate (92 ', 94 ') can be each other tensioned and can be moved out each other by the stretching unit (142,144), with Just described matrix (10) is introduced into the intermediate space between the directing plate (92 ', 94 '), or by described matrix (10) from institute It states and is removed in the intermediate space between directing plate (92 ', 94 ').

25. according to the exposure sources described in claim 1,2,4,5,6,7,8,9, any one of 19 to 24, which is characterized in that base Body supply unit (46) is associated with described matrix guide portion (60).

26. according to the exposure sources described in claim 1,2,4,5,6,7,8,9, any one of 19 to 24, which is characterized in that base Body output unit (82) is associated with described matrix guide portion (60).

27. according to the exposure sources described in claim 1,2,4,5,6,7,8,9, any one of 19 to 24, which is characterized in that extremely A few feed unit (54,56,150) is associated with described matrix guide portion (60).

28. according to the exposure sources described in claim 1,2,4,5,6,7,8,9, any one of 19 to 24, which is characterized in that institute State matrix (10) be can be along its longitudinal direction (L) and the material that can be bent transverse to described matrix surface (36,38).

29. according to the exposure sources described in claim 1,2,4,5,6,7,8,9, any one of 19 to 24, which is characterized in that institute It is longitudinal direction (L) tension for being parallel to the direction of feed (84) extension in the exposure guide surface along it to state matrix (10) The material stretched.