TW201350246A - Method for cutting workpiece by layer and apparatus by same - Google Patents

Method for cutting workpiece by layer and apparatus by same Download PDF

Info

Publication number
TW201350246A
TW201350246A TW101131609A TW101131609A TW201350246A TW 201350246 A TW201350246 A TW 201350246A TW 101131609 A TW101131609 A TW 101131609A TW 101131609 A TW101131609 A TW 101131609A TW 201350246 A TW201350246 A TW 201350246A
Authority
TW
Taiwan
Prior art keywords
laser beam
processed
layer
stress layer
laser
Prior art date
Application number
TW101131609A
Other languages
Chinese (zh)
Inventor
yu-xing Zhao
Liang Guo
hai-bin Xu
Chuang-Peng Pan
Original Assignee
Suzhou Delphi Laser Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suzhou Delphi Laser Co Ltd filed Critical Suzhou Delphi Laser Co Ltd
Publication of TW201350246A publication Critical patent/TW201350246A/en

Links

Abstract

A method for cutting a workpiece by laser and an apparatus by same is provided. The method includes following steps of providing at least two laser beams including a first laser beam and a second laser beam; focusing the first laser beam on an inner of the workpiece, so as to generate an internal stress layer in the inner of the workpiece; focusing the second laser beam at a surface layer of the workpiece, so as to generate a stress layer of the surface layer; and piling up at least part of stresses released by the internal stress layer and the stress layer of the surface layer, so as to make the workpiece partly break and thus split.

Description

利用雷射光切割加工對象物的方法和裝置 Method and apparatus for cutting an object by laser light

本發明涉及一種利用雷射光切割加工對象物的方法。更具體來說,本發明涉及採用至少兩束雷射光,分別在加工對象物的內部和表層聚焦形成至少兩個應力層,並利用應力層釋放的疊加應力促使加工對象物斷裂並進而被分割開的雷射光加工方法。本發明還涉及一種用於實現上述方法的裝置。 The present invention relates to a method of cutting an object by laser light. More specifically, the present invention relates to the use of at least two beams of laser light, respectively forming at least two stress layers in the interior and the surface of the object to be processed, and using the superimposed stress released by the stress layer to cause the object to be fractured and further divided. Laser light processing method. The invention also relates to an apparatus for implementing the above method.

利用雷射光對加工對象物進行切割已經是雷射光加工領域中常見的工藝。傳統的雷射光切割方式是將雷射光匯聚於物體表面,當物質損傷閾值(threshold)低於雷射光功率密度時,物體便會產生熔融、氣化、離子化、重覆等物理或化學變化。當所用雷射光的功率足夠大時,加工對象物即可沿著發生上述變化的位置斷裂開,從而實現切割加工對象物的目的。這種方式所用到的雷射光器種類較多,如雷射脈衝光與連續雷射光。切割厚鋼板時會使用到最大雷射光功率達到千瓦甚至萬瓦級的CO2雷射光器。 Cutting the object with laser light has been a common process in the field of laser light processing. The traditional laser light cutting method is to concentrate the laser light on the surface of the object. When the material damage threshold is lower than the laser light power density, the object will undergo physical or chemical changes such as melting, gasification, ionization and repetition. When the power of the laser light used is sufficiently large, the object to be processed can be broken at a position where the above change occurs, thereby achieving the object of cutting the object to be processed. There are many types of lasers used in this way, such as laser pulsed light and continuous laser light. CO 2 lasers with a maximum laser power of kW or even 10,000 watts are used when cutting thick steel plates.

不過,當對被加工對象物的精細度要求較高時,往往會採用較小的功率的雷射脈衝光器,如奈秒雷射光器或是超短雷射脈衝光器。比較特殊的是應用在玻璃切割領域的雷射光切割工藝,這種工藝既使用較高功率的CO2連續雷射光器,又能夠達到很好的切割精度。在其切割過程中,雷射光對作為加工對象物的玻璃器件只起到加熱作用,並不對玻璃產生破壞。其實際上是利用在對玻璃器件加熱後進行快速冷却,從而在玻璃器件 上產生應力,之後再輔以機械外力將應力釋放,從而達到分割玻璃器件的目的。然而,對於此種切割方式,由於CO2雷射光本身的聚焦性質的限制(其最小聚焦光斑直徑需大於其波長)、高功率引起的熱擴散以及冷却時產生的污染等原因,使得這種切割方式只能應用於普通大幅面玻璃的切割,而不能應用於表面具有功能區玻璃的精細切割,例如以玻璃為襯底的晶圓。 However, when the fineness of the object to be processed is high, a small power laser illuminator such as a nanosecond laser or an ultrashort laser illuminator is often used. More special is the laser light cutting process applied in the field of glass cutting, which uses a higher power CO 2 continuous laser and achieves good cutting accuracy. In the cutting process, the laser light only heats the glass device as the object to be processed, and does not cause damage to the glass. In fact, it utilizes the rapid cooling after heating the glass device to generate stress on the glass device, and then the mechanical external force to release the stress, thereby achieving the purpose of splitting the glass device. However, for this type of cutting, this cutting is caused by the limitation of the focusing property of the CO 2 laser light itself (the minimum focal spot diameter needs to be larger than its wavelength), the heat diffusion caused by high power, and the pollution generated during cooling. The method can only be applied to the cutting of ordinary large-format glass, but not to the fine cutting of the glass with the functional area on the surface, such as a glass-based wafer.

因此,本發明的目的是提供一種利用雷射光切割加工對象物的方法,這種方法應該具有切割精度高、無污染、無熱損傷、加工效率高、應用範圍廣等優點,從而克服用於切割玻璃器件的常規雷射光切割方法的技術缺陷。 Accordingly, it is an object of the present invention to provide a method for cutting an object by laser light, which method has the advantages of high cutting precision, no pollution, no thermal damage, high processing efficiency, wide application range, and the like, thereby overcoming the use for cutting. Technical defects in conventional laser light cutting methods for glass devices.

根據本發明提出的雷射光切割方法,是利用至少兩束不同性質的雷射光作用於被加工對象物的內部與表層,並結合對表層的冷却,形成包括表層應力層與內部應力層的兩個或多個應力層。通過適當地控制表層應力層與內部應力層的範圍與間距,使得應力層中的應力得以釋放以形成應力斷面,還可額外輔以一定的機械外力,從而引發加工對象物沿著預定切割路徑的完全斷裂,進而達到分割被加工物的目的。 The laser light cutting method according to the present invention utilizes at least two different types of laser light to act on the inside and the surface of the object to be processed, and combined with the cooling of the surface layer to form two layers including a surface stress layer and an internal stress layer. Or multiple stress layers. By appropriately controlling the range and spacing of the surface stress layer and the internal stress layer, the stress in the stress layer is released to form a stress profile, and may additionally be supplemented with a certain mechanical external force, thereby causing the object to be processed along a predetermined cutting path. The complete breakage, in order to achieve the purpose of dividing the workpiece.

本發明的另一目的是提供一種實現上述雷射光切割方法的裝置。 Another object of the present invention is to provide an apparatus for implementing the above-described laser light cutting method.

本發明提出了一種利用雷射光切割加工對象物的方法,包括:提供至少兩束雷射光,其中該至少兩束雷射光包括第一雷射光束和第二雷射光束;將第一雷射光束聚焦於加工對象物的內部,藉由第一雷射光束對加工對象物的作用在內部產生內部 應力層;將第二雷射光束聚焦於加工對象物的表層處,藉由第二雷射光束對加工對象物的作用在表層處產生表層應力層;至少部分利用內部應力層和表層應力層所釋放的複數應力的疊加,使得加工對象物至少部分斷裂並進而能被分割開。 The present invention provides a method of cutting an object by laser light, comprising: providing at least two laser beams, wherein the at least two laser beams comprise a first laser beam and a second laser beam; and the first laser beam Focusing on the inside of the object to be processed, the inside of the object is internally generated by the action of the first laser beam on the object to be processed a stress layer; focusing the second laser beam on the surface layer of the object to be processed, and generating a surface stress layer at the surface layer by the action of the second laser beam on the object to be processed; at least partially utilizing the internal stress layer and the surface stress layer The superposition of the released complex stress causes the object to be at least partially broken and thus can be split.

在本發明的技術方案中,加工對象物的表層可包括加工對象物的表面。 In the aspect of the invention, the surface layer of the object to be processed may include the surface of the object to be processed.

根據一種具體實施方式,內部應力層通過第一雷射光束對加工對象物的光致損傷產生,表層應力層是利用第二雷射光束對加工對象物的熱效應在對加工對象物的表層進行加熱後經冷却產生。 According to a specific embodiment, the internal stress layer is generated by photo damage of the object to be processed by the first laser beam, and the surface stress layer is used to heat the surface layer of the object by utilizing the thermal effect of the second laser beam on the object to be processed. It is produced by cooling.

根據一種具體實施方式,第一雷射光束在焦點處的功率密度大於加工對象物在第一雷射光束作用下的最小損傷閾值。 According to a specific embodiment, the power density of the first laser beam at the focus is greater than the minimum damage threshold of the object under the action of the first laser beam.

根據一種具體實施方式,第一雷射光束在焦點處附近對加工對象物產生光致損傷並形成應力點,光致損傷選自熔融、氣化、等離子化、折射率變化或其組合。 According to a specific embodiment, the first laser beam causes photodamage to the object to be processed and forms a stress point near the focus, and the photodamage is selected from the group consisting of melting, gasification, plasmaization, refractive index change, or a combination thereof.

根據一種具體實施方式,第一雷射光束與加工對象物之間的相對運動使得沿一預定路徑形成多個應力點,從而構成內部應力層。 According to a specific embodiment, the relative movement between the first laser beam and the object to be processed causes a plurality of stress points to be formed along a predetermined path to constitute an internal stress layer.

根據一種具體實施方式,內部應力層包括大致沿著第一雷射光束入射到加工對象物的方向上排列配置的多個內部應力層。 According to a specific embodiment, the internal stress layer includes a plurality of internal stress layers arranged substantially in a direction in which the first laser beam is incident on the object to be processed.

根據一種具體實施方式,多個內部應力層是以逐漸靠近加工對象物的表層的方向按順序形成的。 According to a specific embodiment, the plurality of internal stress layers are formed in order in a direction gradually approaching the surface layer of the object to be processed.

根據一種具體實施方式,第一雷射光束屬於雷射脈衝光,具有脈衝寬度小於1奈秒(ns),且具有脈衝重複頻率範圍為10kHz~1MHz,其中第一雷射光束的脈衝重複頻率範圍更優選 為1MHz~80MHz。 According to a specific embodiment, the first laser beam belongs to laser pulse light, has a pulse width of less than 1 nanosecond (ns), and has a pulse repetition frequency ranging from 10 kHz to 1 MHz, wherein the pulse repetition frequency range of the first laser beam More preferred It is 1MHz~80MHz.

根據一種具體實施方式,第一雷射光束對於加工對象物具有透射性,其透射率大於0。 According to a specific embodiment, the first laser beam is transmissive to the object to be processed, and its transmittance is greater than zero.

根據一種具體實施方式,加工對象物為選自玻璃、矽、石英或藍寶石的透明材料。 According to a specific embodiment, the object to be processed is a transparent material selected from the group consisting of glass, enamel, quartz or sapphire.

根據一種具體實施方式,第二雷射光束為連續雷射光或雷射脈衝光。 According to a specific embodiment, the second laser beam is continuous laser light or laser pulsed light.

根據一種具體實施方式,第二雷射光束的波長處於被加工對象物線性吸收的範圍內,從而使其能量以熱傳遞的方式被加工對象物吸收,造成焦點附近的加工對象物表層溫度上升,但不使加工對象物產生實質損傷。 According to a specific embodiment, the wavelength of the second laser beam is within a range in which the object to be processed is linearly absorbed, so that the energy is absorbed by the object to be processed by heat transfer, and the surface temperature of the object to be processed near the focus rises. However, the object to be processed does not cause substantial damage.

根據一種具體實施方式,第二雷射光束在焦點處的功率密度小於加工對象物在第二雷射光束作用下的最小損傷閾值。 According to a specific embodiment, the power density of the second laser beam at the focus is less than the minimum damage threshold of the object under the action of the second laser beam.

根據一種具體實施方式,上述對經加熱的加工對象物的表層進行冷却的方式包含使用氣態冷却介質或液態冷却介質。 According to a specific embodiment, the manner of cooling the surface layer of the heated object to be processed includes using a gaseous cooling medium or a liquid cooling medium.

根據一種具體實施方式,所使用的冷却介質處於一個標準大氣壓下,溫度介於-210℃~20℃之間。 According to a specific embodiment, the cooling medium used is at a standard atmospheric pressure and the temperature is between -210 ° C and 20 ° C.

根據一種具體實施方式,對加工對象物的表層的加熱製程和冷却製程與產生內部應力層是同時進行的。 According to a specific embodiment, the heating process and the cooling process of the surface layer of the object to be processed are simultaneously performed with the generation of the internal stress layer.

根據一種具體實施方式,其中僅在形成最靠近加工對象物的表層的內部應力層的同時,進行對加工對象物的表層的加熱製程和冷却製程。 According to a specific embodiment, the heating process and the cooling process of the surface layer of the object to be processed are performed only while forming the inner stress layer of the surface layer closest to the object to be processed.

根據一種具體實施方式,對加工對象物的表層的加熱製程和冷却製程可在產生內部應力層之後進行。 According to a specific embodiment, the heating process and the cooling process of the surface layer of the object to be processed may be performed after the internal stress layer is generated.

根據一種具體實施方式,其中至少部分利用內部應力層和表層應力層所釋放的應力的疊加,使得加工對象物完全斷裂而 被分割開。 According to a specific embodiment, wherein the superposition of the stress released by the internal stress layer and the surface stress layer is at least partially utilized, the object to be processed is completely broken. Being split.

根據一種具體實施方式,其中在內部應力層和表層應力層釋放的應力的疊加之外,通過進一步施加機械外力,使得加工對象物完全斷裂而被分割開。 According to a specific embodiment, in addition to the superposition of the stress released by the internal stress layer and the surface stress layer, the object to be processed is completely broken by further applying a mechanical external force.

本發明還涉及一種利用雷射光切割加工對象物的裝置,包括:第一雷射光部,包括產生第一雷射光束的第一雷射光源,第一雷射光束能通過一聚焦鏡或物鏡聚焦於加工對象物的內部,藉由第一雷射光束對加工對象物的作用在內部產生內部應力層;第二雷射光部,包括產生第二雷射光束的第二雷射光源,第二雷射光束能通過聚焦鏡或物鏡聚焦於加工對象物的表層(包括加工對象物的表面)處,藉由第二雷射光束對加工對象物的作用在表層處產生表層應力層;成像部,其包括成像光路和照相機,以便對加工對象物進行成像,確定移動聚焦鏡或物鏡的基準點;運動系統,適於移動聚焦鏡或物鏡的部件和移動加工對象物的部件,上述移動聚焦鏡或物鏡的部件能將聚焦鏡或物鏡移動到預定位置,從而將第一雷射光束和第二雷射光束分別聚焦於加工對象物的內部和表層處,移動加工對象物的部件能使加工對象物沿一預定路徑相對於聚焦鏡或物鏡移動,從而分別在加工對象物的內部和表層處產生內部應力層和表層應力層,其中至少部分利用內部應力層和表層應力層的釋放的複數應力的疊加,能使加工對象物至少部分斷裂並進而能被分割開。 The present invention also relates to an apparatus for cutting an object by laser light, comprising: a first laser light portion comprising a first laser light source that generates a first laser beam, the first laser beam being capable of being focused by a focusing mirror or an objective lens Inside the object to be processed, an internal stress layer is internally generated by the action of the first laser beam on the object to be processed; the second laser beam portion includes a second laser source that generates the second laser beam, and the second Ray The beam of light can be focused by a focusing mirror or an objective lens on the surface layer of the object to be processed (including the surface of the object to be processed), and a surface stress layer is generated at the surface layer by the action of the second laser beam on the object to be processed; the image forming portion The imaging optical path and the camera are included to image the object to be processed, the reference point of the moving focusing mirror or the objective lens is determined; the motion system, the component suitable for moving the focusing mirror or the objective lens, and the moving object of the processing object, the moving focusing mirror or the objective lens The component can move the focusing mirror or the objective lens to a predetermined position, thereby focusing the first laser beam and the second laser beam respectively on the inside of the processing object At the surface layer, the moving object of the object can move the object along a predetermined path relative to the focusing mirror or the objective lens, thereby generating an internal stress layer and a surface stress layer at the inside and the surface of the object, respectively, at least partially utilizing The superposition of the complex stresses of the release of the internal stress layer and the surface stress layer enables the object to be at least partially broken and thus split.

根據一種具體實施方式,上述聚焦鏡或是物鏡的孔徑數值不小於0.4。 According to a specific embodiment, the aperture value of the focusing mirror or the objective lens is not less than 0.4.

本發明的利用雷射光切割加工對象物的裝置還包括適於排出冷却介質的冷却裝置,其中內部應力層通過第一雷射光束對加工對象物的光致損傷產生,表層應力層是利用第二雷射光束對加工對象物的熱效應在對加工對象物的表層加熱後經冷却裝置排出的冷却介質對其冷却產生。 The apparatus for cutting an object to be processed by laser light of the present invention further includes a cooling device adapted to discharge the cooling medium, wherein the internal stress layer is generated by the first laser beam to cause damage to the object to be processed, and the surface stress layer is utilized by the second The thermal effect of the laser beam on the object to be processed is cooled by a cooling medium discharged from the surface of the object to be processed by the cooling device.

優選地,冷却介質處於一個標準大氣壓下,溫度介於-210℃~20℃之間。 Preferably, the cooling medium is at a standard atmospheric pressure and the temperature is between -210 ° C and 20 ° C.

根據一種具體實施方式,冷却裝置排出冷却介質的方向基本上沿著聚焦鏡或物鏡的軸線,其中冷却介質為氣態。 According to a specific embodiment, the direction in which the cooling device discharges the cooling medium is substantially along the axis of the focusing mirror or the objective lens, wherein the cooling medium is in a gaseous state.

根據一種具體實施方式,冷却裝置排出冷却介質的方向與聚焦鏡或物鏡的軸線相交,其中冷却介質為氣態或液態。 According to a specific embodiment, the direction in which the cooling device discharges the cooling medium intersects the axis of the focusing mirror or the objective lens, wherein the cooling medium is in a gaseous or liquid state.

在本發明的利用雷射光切割加工對象物的裝置中,第一雷射光束可以是雷射脈衝光,其脈衝寬度小於1奈秒(ns),脈衝重複頻率範圍為10kHz~1MHz,其中脈衝重複頻率範圍更優選為1MHz~80MHz。 In the apparatus for cutting an object by laser light of the present invention, the first laser beam may be laser pulsed light having a pulse width of less than 1 nanosecond (ns) and a pulse repetition frequency ranging from 10 kHz to 1 MHz, wherein the pulse repetition The frequency range is more preferably 1 MHz to 80 MHz.

在本發明的利用雷射光切割加工對象物的裝置中,第一雷射光束對於加工對象物具有透射性,其透射率大於0。 In the apparatus for cutting an object to be processed by laser light according to the present invention, the first laser beam is transmissive to the object to be processed, and its transmittance is greater than zero.

在本發明的利用雷射光切割加工對象物的裝置中,第一雷射光束在焦點處的功率密度大於加工對象物在第一雷射光束作用下的最小損傷閾值。 In the apparatus for cutting an object by laser light of the present invention, the power density of the first laser beam at the focus is larger than the minimum damage threshold of the object under the action of the first laser beam.

在本發明的利用雷射光切割加工對象物的裝置中,第二雷射光束可以是連續雷射光或雷射脈衝光。 In the apparatus for cutting an object to be processed by laser light of the present invention, the second laser beam may be continuous laser light or laser pulsed light.

在本發明的利用雷射光切割加工對象物的裝置中,第二雷射光束在焦點處的功率密度小於加工對象物在第二雷射光束作用下的最小損傷閾值。 In the apparatus for cutting an object by laser light of the present invention, the power density of the second laser beam at the focus is smaller than the minimum damage threshold of the object under the action of the second laser beam.

本發明的利用雷射光切割加工對象物的裝置還可包括對 加工對象物施加機械外力的機構,從而在內部應力層和表層應力層釋放的應力的疊加之外,進一步利用機構施加的機械外力,使得加工對象物完全斷裂而被分割開。 The apparatus for cutting an object to be processed by laser light according to the present invention may further include The mechanism for applying a mechanical external force to the object to be processed causes the object to be completely broken and divided by the mechanical external force applied by the mechanism in addition to the superposition of the stress released by the internal stress layer and the surface stress layer.

為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下。 The above and other objects, features and advantages of the present invention will become more <RTIgt;

現在將參考概略的附圖,進一步解釋本發明的雷射光切割方法的具體實施方式。並且,在本說明書的附圖中,也概略性地示出了本發明的雷射光切割方法的實施裝置。 A specific embodiment of the laser light cutting method of the present invention will now be further explained with reference to the accompanying drawings. Further, in the drawings of the present specification, an apparatus for implementing the laser light cutting method of the present invention is also schematically shown.

圖1示出了實施本發明的雷射光切割方法的光路及系統示意圖。作為示例性的說明,如圖1所示,實施本發明雷射光切割方法的光路系統總體可由三部分構成。其中第一部分由第一雷射光源1發射雷射光束L1,經雷射光擴束鏡3擴大光束直徑並準直後,經雷射光反射鏡10反射進入雷射光聚焦鏡11,並聚焦於加工對象物12的內部。此時,在加工對象物12內部雷射光焦點附近的一定區域內可對加工對象物12產生物理性破壞,發生熔融、氣化、等離子化、折射率變化等一種光致損傷或多種同時發生的光致損傷,而加工對象物12在上述的一定區域外並未受到雷射光照射的影響。這樣,在加工對象物12中,焦點附近的一定區域內外產生了應力變化,從而形成內部應力點16。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic illustration of the optical path and system of a laser light cutting method embodying the present invention. As an illustrative illustration, as shown in FIG. 1, the optical path system embodying the laser light cutting method of the present invention may be generally constructed of three parts. In the first part, the laser beam L1 is emitted by the first laser light source 1, and the beam diameter is enlarged and collimated by the laser beam expander 3, and then reflected by the laser beam 10 into the laser focusing mirror 11 and focused on the object to be processed. The interior of 12. At this time, physical damage to the object 12 can be caused in a certain region in the vicinity of the focus of the laser light inside the object 12, and a photodamage or a plurality of simultaneous occurrences such as melting, vaporization, plasmaization, and refractive index change occur. Photoinduced damage, and the object 12 is not affected by the irradiation of the laser light outside the certain area described above. In this way, in the object 12 to be processed, a stress change occurs in a certain region near the focus, and an internal stress point 16 is formed.

根據本發明的一個優選實施例,雷射光聚焦鏡11具有較短的焦距。另外,也可用物鏡作為雷射光聚焦鏡。優選的是,聚焦鏡或物鏡的數值孔徑NA>0.4。 According to a preferred embodiment of the invention, the laser focusing mirror 11 has a shorter focal length. Alternatively, an objective lens can be used as the laser focusing mirror. Preferably, the focusing mirror or objective lens has a numerical aperture NA > 0.4.

實施本發明雷射光切割方法的光路系統中的第二部分由 第二雷射光源2發射雷射光束L2,經雷射光準直器4準直後,經雷射光反射鏡9反射,穿透雷射光反射鏡10進入雷射光聚焦鏡11,並聚焦於加工對象物12的表面處。 The second part of the optical path system implementing the laser light cutting method of the present invention consists of The second laser light source 2 emits a laser beam L2, is collimated by the laser collimator 4, is reflected by the laser beam mirror 9, passes through the laser beam mirror 10, enters the laser beam focusing mirror 11, and is focused on the object to be processed. At the surface of 12.

光路系統的第三部分為成像光路,其目的是對加工對象物12進行成像,從而確定基準點,以便移動聚焦鏡或物鏡11來調節雷射光束在加工對象物12上的聚焦位置。優選的是,成像光路為附圖1所示的同軸成像光路。所謂同軸成像光路,是指成像光路的成像軸與雷射光聚焦鏡11同軸。具體來看,在同軸成像光路中,利用照明光源5發出光束,光束經反射鏡8反射,依次穿透雷射光反射鏡9、雷射光反射鏡10進入雷射光聚焦鏡11,照射於加工對象物12的表面。其反射光逆向進入雷射光聚焦鏡11,依次穿透雷射光反射鏡10、雷射光反射鏡9、反射鏡8,並由成像鏡頭7聚焦成像於CCD相機6上。應該理解的是,本發明也可採用雷射光加工領域中的其它類型的成像系統。 The third portion of the optical path system is an imaging optical path for the purpose of imaging the object 12 to determine a reference point for moving the focusing mirror or objective lens 11 to adjust the focus position of the laser beam on the object 12. Preferably, the imaging optical path is the coaxial imaging optical path shown in FIG. The so-called coaxial imaging optical path means that the imaging axis of the imaging optical path is coaxial with the laser focusing mirror 11. Specifically, in the coaxial imaging optical path, the light source 5 emits a light beam, and the light beam is reflected by the mirror 8, and sequentially penetrates the laser light mirror 9 and the laser light mirror 10 to enter the laser light focusing mirror 11 to illuminate the object to be processed. The surface of 12. The reflected light is reversely entered into the laser focusing mirror 11, and sequentially penetrates the laser beam mirror 10, the laser beam mirror 9, and the mirror 8, and is focused and imaged by the imaging lens 7 on the CCD camera 6. It should be understood that other types of imaging systems in the field of laser light processing may also be employed in the present invention.

實施本發明雷射光切割方法的裝置還可包括運動系統,如附圖1所示,上述運動系統包括具有X軸運動平臺13、Y軸運動平臺14和Z軸運動平臺15的三維運動裝置。其中雷射光聚焦鏡11連接於Z軸運動平臺15上,可隨Z軸運動平臺15的移動而上下運動。加工對象物12設置在可由X軸運動平臺13和Y軸運動平臺14帶動的工件台(未示出)上,從而使得加工對象物12可隨著X軸運動平臺13或Y軸運動平臺14的移動相對於聚焦鏡或物鏡11移動。 The apparatus embodying the laser light cutting method of the present invention may further include a motion system, as shown in FIG. 1, which includes a three-dimensional motion device having an X-axis motion platform 13, a Y-axis motion platform 14, and a Z-axis motion platform 15. The laser light focusing mirror 11 is connected to the Z-axis motion platform 15 and can move up and down with the movement of the Z-axis motion platform 15. The object 12 is disposed on a workpiece table (not shown) that can be driven by the X-axis motion platform 13 and the Y-axis motion platform 14, so that the object 12 can be moved along with the X-axis motion platform 13 or the Y-axis motion platform 14. The movement moves relative to the focusing mirror or the objective lens 11.

這樣,利用光路系統的同軸成像光路,可上下移動Z軸運動平臺15,從而帶動雷射光聚焦鏡11上下移動,使得加工對象物12的上表面清晰成像於CCD相機6上。以此時的Z軸運 動平臺位置為基準點,使Z軸運動平臺朝向加工對象物內部移動預定距離,使雷射光聚焦鏡11的焦點位於加工對象物內部預定位置。這時如果打開第一雷射光源1出射雷射光,在上述焦點附近的一定區域內可對加工對象物12造成光致損傷,從而在加工對象物12的內部形成應力點16。此時保持Z軸運動平臺位置不動,可使X軸運動平臺13或是Y軸運動平臺14帶動加工對象物12沿預定切割路徑相對於雷射光聚焦鏡11運動。在這樣運動的同時,出射雷射光(即雷射光束L1)即可在加工對象物12的內部形成內部應力層17,如圖2a和圖2b中的陰影部分所示。具體來看,在圖2a中,當雷射光束L1使用雷射脈衝光時,其內部應力點(在圖中以黑點示出)呈現離散分布,這些離散的應力點組合構成了內部應力層17;在圖2b中,當雷射光束L1使用準連續雷射光時,其內部應力點相互重疊,呈現連續分布狀態,內部應力層17是以這些連續重疊的應力點組成的。應該注意到,在圖2b中,僅示出了內部應力層17,並未具體繪製相互重疊呈連續分布狀態的內部應力點。 Thus, the Z-axis motion stage 15 can be moved up and down by the coaxial imaging optical path of the optical path system, thereby causing the laser focusing mirror 11 to move up and down, so that the upper surface of the object 12 is clearly imaged on the CCD camera 6. Z-axis at this time The moving platform position is a reference point, and the Z-axis moving platform is moved toward the inside of the object to be processed by a predetermined distance so that the focus of the laser focusing mirror 11 is located at a predetermined position inside the object to be processed. At this time, if the first laser light source 1 is turned on to emit the laser light, the object 12 can be photo-damaged in a certain area in the vicinity of the focus, and the stress point 16 is formed inside the object 12. At this time, the position of the Z-axis moving platform is kept stationary, and the X-axis moving platform 13 or the Y-axis moving platform 14 can move the processing object 12 relative to the laser focusing mirror 11 along a predetermined cutting path. At the same time as the movement, the laser light (i.e., the laser beam L1) is emitted to form an internal stress layer 17 inside the object 12, as shown by the hatched portions in Figs. 2a and 2b. Specifically, in Fig. 2a, when the laser beam L1 uses laser pulsed light, its internal stress points (shown as black dots in the figure) exhibit a discrete distribution, and these discrete stress points combine to form an internal stress layer. 17; In Fig. 2b, when the laser beam L1 uses quasi-continuous laser light, its internal stress points overlap each other and exhibit a continuous distribution state, and the internal stress layer 17 is composed of these continuously overlapping stress points. It should be noted that in Fig. 2b, only the internal stress layer 17 is shown, and internal stress points which are in a continuously distributed state overlapping each other are not specifically drawn.

現在參看附圖3,當X軸運動平臺13或是Y軸運動平臺14帶動加工對象物12沿切割路徑相對於雷射光聚焦鏡11運動,形成一層內部應力層17後,改變Z軸運動平臺15朝向加工對象物12內部移動的預定距離,可使雷射光束L1會聚於加工對象物12內部的另一預定位置。此時,使X軸運動平臺13或是Y軸運動平臺14沿相同的切割路徑再次相對於雷射光聚焦鏡11運動,從而可形成新的內部應力層17。依次類推,可在加工對象物12內部形成處於不同位置的多個內部應力層17。優選地,上述多個內部應力層17是以逐漸靠近加工對象 物12的表層(有關該術語“表層”的含義,下文中將作詳細解釋和說明)的方向按順序形成的。以圖3中形成三個內部應力層的技術方案為例,優選先形成圖中最下方的內部應力層,之後形成位於中間位置的內部應力層,最後再形成位於最上方亦即最靠近加工對象物表層的內部應力層。 Referring now to FIG. 3, when the X-axis moving platform 13 or the Y-axis moving platform 14 drives the object 12 to move along the cutting path relative to the laser focusing mirror 11, forming an internal stress layer 17, the Z-axis moving platform 15 is changed. The predetermined distance moved toward the inside of the object 12 allows the laser beam L1 to be concentrated at another predetermined position inside the object 12. At this time, the X-axis moving platform 13 or the Y-axis moving platform 14 is moved again relative to the laser focusing mirror 11 along the same cutting path, so that a new internal stress layer 17 can be formed. By analogy, a plurality of internal stress layers 17 at different positions can be formed inside the object 12 to be processed. Preferably, the plurality of internal stress layers 17 are gradually approaching the processing object The direction of the surface layer of the object 12 (the meaning of the term "surface layer", which will be explained and explained in detail below) is formed in order. Taking the technical solution of forming three internal stress layers in FIG. 3 as an example, it is preferable to form the lowermost internal stress layer in the figure, and then form an internal stress layer at the intermediate position, and finally form the uppermost, that is, the closest to the processing object. The internal stress layer of the surface layer.

以下結合附圖4a和4b對利用本發明的雷射光切割方法和系統或裝置在加工對象物12的表層處形成表層應力層的工藝作詳細說明。其中圖4a所示為圖1中的雷射光束L2照射加工對象物表層的示意圖。圖4b所示為雷射光束L2在加工對象物表面的聚焦光斑分布。需要說明的是,在對本發明的技術方案的描述和說明中,術語“表層”指的是加工對象物上非常靠近作為雷射光入射面的加工表面處的物質層,但也包括該加工對象物的加工表面。或者說,術語“表層”指的是加工對象物上的加工面以及緊鄰加工面的部位。 A process for forming a surface stress layer at the surface layer of the object 12 to be processed by the laser light cutting method and system or apparatus of the present invention will be described in detail below with reference to Figs. 4a and 4b. 4a is a schematic view showing the laser beam L2 of FIG. 1 illuminating the surface layer of the object to be processed. Fig. 4b shows the focused spot distribution of the laser beam L2 on the surface of the object to be processed. It should be noted that in the description and description of the technical solution of the present invention, the term "surface layer" refers to a substance layer on the object to be processed which is very close to the processing surface as the incident surface of the laser light, but also includes the object to be processed. Machined surface. In other words, the term "surface layer" refers to a machined surface on a workpiece and a portion adjacent to the machined surface.

根據本發明的優選實施方案,當利用雷射光束L1在加工對象物12的內部形成最靠近表層的應力層的同時,可對加工對象物12的表面進行加熱處理。具體來說,雷射光束L2經雷射光準直器4調節後經過雷射光聚焦鏡11匯聚於加工對象物12的表層或表面。如圖4a所示,雷射光束L2聚焦於加工對象物12的表面,形成聚焦光斑18(在附圖4b中示出)。調節雷射光束L2的功率大小,使聚焦光斑範圍內的功率密度小於加工對象物12在此種雷射光作用下的損傷閾值,從而使雷射光束L2對加工對象物12表面及表層不產生熔融、氣化、等離子化、折射率變化等一種或是多種光致損傷。這樣,雷射光能量僅以形成熱量的方式傳遞至加工對象物12的表面及表層,在聚焦光斑範圍內及範圍外形成熱分布,造成焦點附近的 加工對象物表層溫度上升,但不使加工對象物產生實質損傷。當加工對象物12沿預定切割路徑相對於雷射光聚焦鏡11運動,即可形成沿切割路徑的條狀熱分布區域。當所使用的雷射光束L2為雷射脈衝光時,聚焦光斑18呈離散狀,控制工件台的運行速度及雷射光束L2的頻率,使得聚焦光斑18所加熱區域呈連續分布狀態,如附圖4b所示。 According to a preferred embodiment of the present invention, the surface of the object 12 can be heat-treated while the stress layer closest to the surface layer is formed inside the object 12 by the laser beam L1. Specifically, the laser beam L2 is adjusted by the laser collimator 4 and then concentrated by the laser focusing mirror 11 on the surface or surface of the object 12. As shown in Fig. 4a, the laser beam L2 is focused on the surface of the object 12 to form a focused spot 18 (shown in Figure 4b). The power of the laser beam L2 is adjusted so that the power density in the range of the focused spot is smaller than the damage threshold of the object 12 under the action of the laser light, so that the laser beam L2 does not melt on the surface and the surface of the object 12. One or more kinds of photodamage such as gasification, plasmaization, and refractive index change. In this way, the laser light energy is transmitted to the surface and the surface layer of the object 12 only in the form of heat generation, and heat distribution is formed within and outside the range of the focused spot, resulting in the vicinity of the focus. The surface temperature of the object to be processed rises, but the object to be processed does not cause substantial damage. When the object 12 is moved relative to the laser focusing mirror 11 along a predetermined cutting path, a strip-shaped heat distribution region along the cutting path can be formed. When the laser beam L2 used is laser pulsed light, the focused spot 18 is discrete, and the running speed of the workpiece stage and the frequency of the laser beam L2 are controlled, so that the heated area of the focused spot 18 is continuously distributed, as attached. Figure 4b shows.

根據本發明的優選實施方案,在以上述方式對加工對象物12的表面或表層進行加熱的同時或是之後,可用低溫氣體或是液體作為冷却介質對其進行冷却。這樣,可在加工對象物12的表層處形成表層應力層21(示出在附圖7至附圖9中)。進一步地,當加工對象物12的內部僅形成一個應力層時,對其表層的加熱及冷却可以在形成內部應力層的同時進行;當內部形成多個應力層時,優選在形成最靠近表層的應力層的同時,進行對表層的加熱及冷却過程。另外需要說明的是,對於某些加工對象物,僅對其進行冷却而省去加熱過程也可在其表層或表面形成應力層。 According to a preferred embodiment of the present invention, at the same time as or after the surface or surface layer of the object 12 is heated in the above manner, it can be cooled by using a low-temperature gas or a liquid as a cooling medium. Thus, the surface stress layer 21 (shown in FIGS. 7 to 9) can be formed at the surface layer of the object 12 to be processed. Further, when only one stress layer is formed inside the object 12, heating and cooling of the surface layer thereof may be performed while forming the internal stress layer; when a plurality of stress layers are formed inside, it is preferable to form the layer closest to the surface layer. At the same time as the stress layer, the surface layer is heated and cooled. In addition, it should be noted that for some objects to be processed, only the cooling process may be omitted, and the stress layer may be formed on the surface layer or surface thereof.

作為示例性的說明,附圖5所示為利用同軸冷却裝置19對經加熱的加工對象物12的表層進行冷却的示意圖。所謂同軸冷却裝置,指的是冷却裝置的冷却介質排出孔的中心與雷射光聚焦鏡11基本上處於同一軸線上。換言之,冷却裝置排出冷却介質的方向基本上沿著聚焦鏡或物鏡11的軸線。需要說明的是,同軸冷却裝置19不適於採用液體作為冷却介質,其原因在於,由於同軸冷却裝置19的冷却介質排出孔與雷射光聚焦鏡11基本上處於同一軸線,所以在液體冷却介質被導入雷射光聚焦鏡11與加工對象物12表面之間的空間內時,就很容易污染聚焦鏡11的鏡片,從而引起鏡片損傷。因此,對於 同軸冷却裝置19,優選採用低溫氣體作為冷却介質。具體來說,可將低溫氣體從外部被導入雷射光聚焦鏡11與加工對象物12表面之間的空間內,並吹向加工對象物12的表面。同時,加工對象物12沿預定的切割路徑進行運動,使加工對象物12表面的條狀熱分布區域得到快速冷却,並將熱量排向外部四周。優選地,所使用的冷却氣體例如是CO2氣體,低溫氮氣等,其溫度範圍為-210℃~20℃。 As an exemplary illustration, FIG. 5 is a schematic view showing cooling of the surface layer of the heated object 12 by the coaxial cooling device 19. The term "coaxial cooling device" means that the center of the cooling medium discharge hole of the cooling device is substantially on the same axis as the laser beam focusing mirror 11. In other words, the direction in which the cooling device discharges the cooling medium is substantially along the axis of the focusing mirror or objective lens 11. It should be noted that the coaxial cooling device 19 is not suitable for using a liquid as the cooling medium because the liquid cooling medium is introduced because the cooling medium discharge hole of the coaxial cooling device 19 and the laser focusing mirror 11 are substantially in the same axis. When the space between the laser beam focusing mirror 11 and the surface of the object 12 is processed, the lens of the focusing mirror 11 is easily contaminated, thereby causing damage to the lens. Therefore, for the coaxial cooling device 19, a low temperature gas is preferably used as the cooling medium. Specifically, the low-temperature gas can be introduced into the space between the laser beam focusing mirror 11 and the surface of the object 12 from the outside, and blown onto the surface of the object 12 to be processed. At the same time, the object 12 is moved along a predetermined cutting path, so that the strip-shaped heat distribution area on the surface of the object 12 is rapidly cooled, and the heat is discharged to the outside. Preferably, the cooling gas to be used is, for example, CO 2 gas, low-temperature nitrogen gas or the like, and its temperature ranges from -210 ° C to 20 ° C.

圖6所示為以旁軸方式利用冷却介質對加工對象物的表層進行冷却的示意圖。與同軸冷却裝置19不同的是,對於旁軸冷却裝置20來說,冷却裝置排出冷却介質的方向與聚焦鏡或物鏡11的軸線是相交的,而非同軸或平行。如圖6所示,由於使用旁軸冷却裝置20進行冷却時,冷却介質是從雷射光聚焦鏡11的一側導入,冷却介質不容易接觸到聚焦鏡11的鏡片,因此對於旁軸冷却裝置20來說,採用氣體或是液體作為冷却介質都是可行的。這樣,冷却氣體或是液體被導向加工對象物12的表面,同時加工對象物12沿預定的切割路徑進行運動,使加工對象物12的表面得到快速冷却,並將熱量排向雷射光聚焦鏡11的另一側。優選地,所使用的冷却氣體例如是CO2氣體,低溫氮氣等,其溫度範圍為-210℃~20℃。 Fig. 6 is a schematic view showing the cooling of the surface layer of the object to be processed by the cooling medium in a paraxial manner. Unlike the coaxial cooling device 19, for the paraxial cooling device 20, the direction in which the cooling device discharges the cooling medium intersects the axis of the focusing mirror or objective lens 11, rather than being coaxial or parallel. As shown in FIG. 6, when cooling is performed using the paraxial cooling device 20, the cooling medium is introduced from the side of the laser focusing mirror 11, and the cooling medium does not easily contact the lens of the focusing mirror 11, and thus the paraxial cooling device 20 In other words, it is feasible to use a gas or a liquid as a cooling medium. Thus, the cooling gas or the liquid is guided to the surface of the object 12, and the object 12 is moved along a predetermined cutting path, so that the surface of the object 12 is rapidly cooled, and the heat is discharged to the laser focusing mirror 11 The other side. Preferably, the cooling gas to be used is, for example, CO 2 gas, low-temperature nitrogen gas or the like, and its temperature ranges from -210 ° C to 20 ° C.

附圖7至附圖9示出了加工對象物上的表層應力層21與內部的一個或多個內部應力層17發生應力釋放,引起加工對象物部分斷裂的示意圖。其中在附圖7中,僅具有一個內部應力層17;在附圖8中,具有兩個內部應力層17;在附圖9中,具有三個內部應力層17。從這些附圖中可以清楚地看到,在利用上述雷射光加工工藝在加工對象物12上形成由內部應力點組成的內部應力層17和表層應力層21之後,在將內部應力 層17和表層應力層21的疊加應力釋放時,會在加工對象物12上形成應力斷面,造成加工對象物12至少部分發生斷裂。根據加工對象物的具體情况以及具體的切割要求,以及其它加工條件,可適當地控制表層應力層21與內部應力層17的區域範圍與間距,以及各個內部應力層17之間的間距和排列配置,使得在加工對象物中獲得適當大小和方向的組合應力,在該應力得以釋放時,即形成所需的應力斷面。附圖7至附圖9中示出了上述三種不同條件下產生的應力斷面的狀况。 7 to 9 show schematic diagrams of stress release of the surface stress layer 21 on the object to be processed and one or more internal stress layers 17 on the inside, causing partial breakage of the object to be processed. In Fig. 7, there is only one internal stress layer 17; in Fig. 8, there are two internal stress layers 17; in Fig. 9, there are three internal stress layers 17. As is clear from these drawings, after the internal stress layer 17 composed of internal stress points and the surface stress layer 21 are formed on the object 12 by the above-described laser light processing process, the internal stress is applied. When the superimposed stress of the layer 17 and the surface stress layer 21 is released, a stress cross section is formed on the object 12 to be processed, causing at least partial breakage of the object 12 to be processed. The range and spacing of the surface stress layer 21 and the internal stress layer 17 and the spacing and arrangement between the internal stress layers 17 can be appropriately controlled according to the specific conditions of the object to be processed and the specific cutting requirements, as well as other processing conditions. A combination of appropriate size and orientation is obtained in the object to be processed, and when the stress is released, the desired stress profile is formed. The state of the stress profile produced under the above three different conditions is shown in Figs. 7 to 9.

圖10示出了從加工對象物的側面觀察到的生成的多個應力斷面的情形。當加工對象物的表層及內部的應力足夠大時,表層及內部的應力疊加釋放可使加工對象物產生完全斷裂。這種情况通常發生在表層應力層及內部應力層所引發的縱向斷裂深度大於或等於加工對象物厚度的三分之一時。 Fig. 10 shows a case where a plurality of generated stress sections are observed from the side of the object to be processed. When the stress on the surface layer and the inside of the object to be processed is sufficiently large, the superposition of the stress on the surface layer and the inside can cause the object to be completely broken. This usually occurs when the longitudinal stress depth caused by the surface stress layer and the internal stress layer is greater than or equal to one-third of the thickness of the object to be processed.

作為一個優選實施方式,圖11所示為加工對象物發生部分斷裂後,另外施加機械外力引發加工對象物完全斷裂的示意圖。如圖11所示,如加工對象物僅發生部分斷裂,亦即加工對象物並未被完全分割開,這時可利用相應的裝置或部件沿著切割路徑施加一定大小的機械外力,便可使加工對象物發生全部斷裂,從而達到分割加工對象物的目的。 As a preferred embodiment, FIG. 11 is a schematic view showing that the object to be processed is partially broken, and then a mechanical external force is applied to cause the object to be completely broken. As shown in Fig. 11, if the object to be processed is only partially broken, that is, the object to be processed is not completely separated, the corresponding device or component can be applied with a certain amount of mechanical external force along the cutting path to process. The object is completely broken, so that the object to be processed is divided.

圖12所示為根據本發明的雷射光切割方法的簡易示例性的流程圖。具體來說,在利用本發明的雷射光切割方法對加工對象物進行切割時,在步驟S1,首先在加工對象物上設定預定的切割路徑。上述切割路徑可以是位於加工對象物上的假想的路徑。然後,在步驟S2,利用成像光路對加工對象物進行成像(優選是對其表面成像),從而確定基準點,以便移動實施本發明方法的雷射光加工裝置中的雷射光聚焦鏡來調節雷 射光束在加工對象物上的聚焦位置。具體來說,在步驟S3,當加工對象物在成像光路的相機上清晰成像時,以此時驅動雷射光聚焦鏡的Z軸運動平臺位置作為移動雷射光聚焦鏡的基準點。這樣,在步驟S4,可根據具體切割需求將雷射光束聚焦在加工對象物內部的規定位置。接下來,在步驟S5,通過帶動加工對象物的工件台的X軸運動平臺或是Y軸運動平臺的運動,使加工對象物沿預定切割路徑相對於雷射光聚焦鏡運動,從而在加工對象物中形成內部應力層。根據具體需要,可通過調節雷射光束在加工對象物內部的聚焦位置,形成多個內部應力層。在利用雷射光束在加工對象物的內部形成最靠近表層的應力層的同時,可用另外一束雷射光束對加工對象物的表層進行加熱處理,並同時或隨後輔以冷却處理,從而在加工對象物的表層處形成表層應力層(S6)。換言之,步驟S5與步驟S6既可以同時進行,也可以是在步驟S5完成之後,再開始進行步驟S6的工藝。在此以後,在步驟S7,至少部分利用內部應力層和表層應力層的疊加應力的釋放,使得加工對象物至少部分斷裂並進而能被分割開。 Figure 12 is a flow chart showing a simple example of a laser light cutting method in accordance with the present invention. Specifically, when the object to be processed is cut by the laser light cutting method of the present invention, in step S1, a predetermined cutting path is first set on the object to be processed. The above cutting path may be an imaginary path located on the object to be processed. Then, in step S2, the object to be processed is imaged (preferably by imaging its surface) using the imaging optical path, thereby determining a reference point for moving the laser focusing mirror in the laser beam processing apparatus embodying the method of the present invention to adjust the lightning The focus position of the beam on the object to be processed. Specifically, in step S3, when the object to be processed is clearly imaged on the camera of the imaging light path, the position of the Z-axis moving platform that drives the laser focusing mirror at this time is taken as the reference point of the moving laser focusing mirror. Thus, in step S4, the laser beam can be focused on a predetermined position inside the object to be processed according to a specific cutting requirement. Next, in step S5, by moving the X-axis motion platform or the Y-axis motion platform of the workpiece table of the object to be processed, the object to be processed is moved relative to the laser focusing mirror along a predetermined cutting path, thereby processing the object. An internal stress layer is formed in the middle. According to specific needs, a plurality of internal stress layers can be formed by adjusting the focus position of the laser beam inside the object to be processed. While the laser beam is used to form the stress layer closest to the surface layer inside the object to be processed, the surface layer of the object to be processed may be heat-treated by another laser beam, and simultaneously or subsequently supplemented by cooling treatment, thereby processing A surface stress layer is formed at the surface layer of the object (S6). In other words, step S5 and step S6 may be performed simultaneously, or after the step S5 is completed, the process of step S6 may be started. Thereafter, in step S7, the release of the superimposed stress of the inner stress layer and the surface stress layer is utilized at least in part, so that the object to be processed is at least partially broken and thus can be divided.

以上參照附圖並結合一些具體實施方式對根據本發明的利用雷射光切割加工對象物的方法和系統或裝置作了詳細說明。應該理解的是,上述具體實施例只是用來說明本發明的優選實施方式,並非用來限制本發明的保護範圍。例如,雖然在上述實施例中,在加工對象物的內部和表層(包括表面)沿著預定切割路徑形成內部應力層和表層應力層是通過保持加工雷射光束的聚焦鏡不動,同時沿X軸或Y軸移動加工對象物實現的。然而,也存在著保持加工對象物不動,通過移動加工雷射光束在加工對象物上形成內部應力層和表層應力層的技 術方案。本領域技術人員可以理解,只要是使加工雷射光束的聚焦鏡和加工對象物之間沿預定切割路徑發生相對運動,即可在加工對象物中形成促使其斷裂所需的應力層。因此,本領域技術人員在閱讀本說明書和附圖之後能夠想到的其它變形例都應在本發明的保護範圍之內。而本發明的具體保護範圍應由本說明書所附的權利要求來限定。 The method and system or apparatus for cutting an object to be processed by laser light according to the present invention have been described in detail above with reference to the accompanying drawings in conjunction with some specific embodiments. It is to be understood that the specific embodiments described above are merely illustrative of the preferred embodiments of the invention and are not intended to limit the scope of the invention. For example, although in the above embodiment, the internal stress layer and the surface stress layer are formed along the predetermined cutting path in the inside and the surface layer (including the surface) of the object to be processed by holding the focusing beam of the processing laser beam while moving along the X axis Or the Y-axis moves the object to be processed. However, there is also a technique of forming an internal stress layer and a surface stress layer on the object to be processed by moving the processed laser beam while keeping the object to be processed. Program. It will be understood by those skilled in the art that as long as the relative movement between the focusing mirror for processing the laser beam and the object to be processed is performed along a predetermined cutting path, a stress layer required to cause the fracture to be formed can be formed in the object to be processed. Therefore, other modifications that can be made by those skilled in the art after reading this specification and the drawings are within the scope of the invention. The specific scope of the invention should be defined by the claims appended hereto.

1‧‧‧第一雷射光源 1‧‧‧First laser source

2‧‧‧第二雷射光源 2‧‧‧second laser source

3‧‧‧雷射光擴束鏡 3‧‧‧Laser beam expander

4‧‧‧準直器 4‧‧‧ collimator

5‧‧‧照明光源 5‧‧‧Light source

6‧‧‧CCD相機 6‧‧‧CCD camera

7‧‧‧成像鏡頭 7‧‧‧ imaging lens

8‧‧‧反射鏡 8‧‧‧Mirror

9‧‧‧雷射光反射鏡 9‧‧‧Laser light mirror

10‧‧‧雷射光反射鏡 10‧‧‧Laser light mirror

11‧‧‧雷射光聚焦鏡 11‧‧‧Laser light focusing mirror

12‧‧‧加工對象物 12‧‧‧Processing objects

13‧‧‧X軸運動平臺 13‧‧‧X-axis motion platform

14‧‧‧Y軸運動平臺 14‧‧‧Y-axis motion platform

15‧‧‧Z軸運動平臺 15‧‧‧Z-axis motion platform

16‧‧‧內部應力點 16‧‧‧ Internal stress points

17‧‧‧內部應力層 17‧‧‧Internal stressor

18‧‧‧聚焦光斑 18‧‧‧ Focus spot

19‧‧‧同軸冷却裝置 19‧‧‧Coaxial cooling device

20‧‧‧旁軸冷却裝置 20‧‧‧Parallel cooling device

21‧‧‧表層應力層 21‧‧‧Surface stress layer

L1、L2‧‧‧雷射光束 L1, L2‧‧‧ laser beam

S1、S2、S3、S4、S5、S6、S7‧‧‧步驟 S1, S2, S3, S4, S5, S6, S7‧‧

圖1所示為實施本發明的雷射光切割方法的光路及系統示意圖。 1 is a schematic view of an optical path and system for implementing a laser light cutting method of the present invention.

圖2a所示為利用雷射脈衝光使圖1中的雷射光束L1經聚焦鏡匯聚於加工對象物內部,形成內部應力層的過程示意圖。 Fig. 2a is a schematic view showing a process of concentrating the laser beam L1 of Fig. 1 through a focusing mirror inside a processing object by laser light to form an internal stress layer.

圖2b所示為利用準連續雷射脈衝光使圖1中的雷射光束L1經聚焦鏡匯聚於加工對象物內部,形成內部應力層的過程示意圖。 Fig. 2b is a schematic view showing a process of concentrating the laser beam L1 of Fig. 1 through a focusing mirror inside a processing object by using quasi-continuous laser pulse light to form an internal stress layer.

圖3所示為利用本發明的雷射光切割方法在加工對象物內部形成多個內部應力層的過程示意圖。 Fig. 3 is a schematic view showing the process of forming a plurality of internal stress layers in the object to be processed by the laser light cutting method of the present invention.

圖4a所示為圖1中的雷射光束L2照射加工對象物表層的示意圖。 Fig. 4a is a schematic view showing the laser beam L2 of Fig. 1 illuminating the surface layer of the object to be processed.

圖4b所示為雷射光束L2在加工對象物表面的聚焦光斑分布。 Fig. 4b shows the focused spot distribution of the laser beam L2 on the surface of the object to be processed.

圖5所示為利用冷却介質以同軸方式對加工對象物的表層進行冷却的示意圖。 Fig. 5 is a schematic view showing the surface layer of the object to be processed being coaxially cooled by a cooling medium.

圖6所示為利用冷却介質以旁軸方式對加工對象物的表層進行冷却的示意圖。 Fig. 6 is a schematic view showing the cooling of the surface layer of the object to be processed by a cooling medium by a cooling medium.

圖7所示為加工對象物上的表層應力層與內部的一個內 部應力層發生應力釋放,引起加工對象物部分斷裂示意圖。 Figure 7 shows the surface stress layer on the object to be processed and one inside. Stress release occurs in the stress layer, causing partial fracture of the object to be processed.

圖8所示為加工對象物上的表層應力層與內部的兩個內部應力層發生應力釋放,引起加工對象物部分斷裂示意圖。 Fig. 8 is a schematic view showing the stress release of the surface stress layer on the object to be processed and the two internal stress layers on the inside, causing partial fracture of the object to be processed.

圖9所示為加工對象物上的表層應力層與內部的三個內部應力層發生應力釋放,引起加工對象物部分斷裂示意圖。 Fig. 9 is a view showing the stress release of the surface stress layer on the object to be processed and the three internal stress layers on the inside, causing partial fracture of the object to be processed.

圖10所示為加工對象物的表層應力層與內部應力層發生應力釋放,引起加工對象物完全斷裂的示意圖。 Fig. 10 is a view showing the stress release of the surface stress layer and the internal stress layer of the object to be processed, causing the object to be completely broken.

圖11所示為加工對象物發生部分斷裂後,施加機械外力引發加工對象物完全斷裂的示意圖。 Fig. 11 is a schematic view showing that the object to be processed is completely broken by applying a mechanical external force after partial breakage of the object to be processed.

圖12所示為根據本發明的雷射光切割方法的流程示意圖。 Figure 12 is a flow chart showing the laser light cutting method according to the present invention.

1‧‧‧第一雷射光源 1‧‧‧First laser source

2‧‧‧第二雷射光源 2‧‧‧second laser source

3‧‧‧雷射光擴束鏡 3‧‧‧Laser beam expander

4‧‧‧準直器 4‧‧‧ collimator

5‧‧‧照明光源 5‧‧‧Light source

6‧‧‧CCD相機 6‧‧‧CCD camera

7‧‧‧成像鏡頭 7‧‧‧ imaging lens

8‧‧‧反射鏡 8‧‧‧Mirror

9‧‧‧雷射光反射鏡 9‧‧‧Laser light mirror

10‧‧‧雷射光反射鏡 10‧‧‧Laser light mirror

11‧‧‧雷射光聚焦鏡 11‧‧‧Laser light focusing mirror

12‧‧‧加工對象物 12‧‧‧Processing objects

13‧‧‧X軸運動平臺 13‧‧‧X-axis motion platform

14‧‧‧Y軸運動平臺 14‧‧‧Y-axis motion platform

15‧‧‧Z軸運動平臺 15‧‧‧Z-axis motion platform

16‧‧‧內部應力點 16‧‧‧ Internal stress points

L1、L2‧‧‧雷射光束 L1, L2‧‧‧ laser beam

Claims (38)

一種利用一雷射光切割一加工對象物的方法,包括:提供至少兩束雷射光,其中該至少兩束雷射光包括一第一雷射光束和一第二雷射光束;將該第一雷射光束聚焦於該加工對象物的一內部,藉由該第一雷射光束對該加工對象物的作用在該內部產生一內部應力層;將該第二雷射光束聚焦於該加工對象物的一表層處,藉由該第二雷射光束對該加工對象物的作用在該表層處產生一表層應力層;以及至少部分利用該內部應力層和該表層應力層所釋放的複數應力的疊加,使得該加工對象物至少部分斷裂並進而被分割開。 A method for cutting a processed object using a laser beam, comprising: providing at least two laser beams, wherein the at least two laser beams comprise a first laser beam and a second laser beam; the first laser beam The light beam is focused on an interior of the object to be processed, and an internal stress layer is generated in the interior by the action of the first laser beam on the object to be processed; and the second laser beam is focused on one of the object to be processed At the surface layer, a surface stress layer is generated at the surface layer by the action of the second laser beam on the object to be processed; and at least partially utilizing the superposition of the complex stress released by the internal stress layer and the surface stress layer The object to be processed is at least partially broken and further divided. 如申請專利範圍第1項所述的方法,其中該加工對象物的該表層包括該加工對象物的一表面。 The method of claim 1, wherein the surface layer of the object to be processed includes a surface of the object to be processed. 如申請專利範圍第1項所述的方法,其中該內部應力層通過該第一雷射光束對該加工對象物的一光致損傷產生,該表層應力層是利用該第二雷射光束對該加工對象物的一熱效應在對該加工對象物的該表層進行一加熱後經一冷却產生。 The method of claim 1, wherein the internal stress layer generates a photoinduced damage to the object by the first laser beam, the surface stress layer is utilized by the second laser beam A thermal effect of the object to be processed is generated by a cooling of the surface layer of the object to be processed. 如申請專利範圍第1項所述的方法,其中該第一雷射光束在一焦點處的功率密度大於該加工對象物在該第一雷射光束作用下的一最小損傷閾值。 The method of claim 1, wherein the first laser beam has a power density at a focus greater than a minimum damage threshold of the object under the first laser beam. 如申請專利範圍第3項所述的方法,其中該第一雷射光束在一焦點處附近對該加工對象物產生該光致損傷並形成一應力點,該光致損傷選自一熔融、一氣化、一等離子化、一折射率變化或其組合。 The method of claim 3, wherein the first laser beam generates the photodamage to the object in the vicinity of a focus and forms a stress point selected from a melting point and a gas. , plasmonization, a change in refractive index, or a combination thereof. 如申請專利範圍第5項所述的方法,其中該第一雷射光束與該加工對象物之間的一相對運動使得沿一預定路徑形成多個該應力點,構成該內部應力層。 The method of claim 5, wherein a relative movement between the first laser beam and the object to be processed causes a plurality of the stress points to be formed along a predetermined path to constitute the internal stress layer. 如申請專利範圍第6項所述的方法,其中該內部應力層包括大致沿著該第一雷射光束入射到該加工對象物的方向上排列配置的多個該內部應力層。 The method of claim 6, wherein the internal stress layer comprises a plurality of the internal stress layers arranged substantially in a direction in which the first laser beam is incident on the object to be processed. 如申請專利範圍第7項所述的方法,其中以逐漸靠近該加工對象物的該表層的方向按順序形成多個該內部應力層。 The method of claim 7, wherein the plurality of internal stress layers are sequentially formed in a direction gradually approaching the surface layer of the object to be processed. 如申請專利範圍第1項所述的方法,其中該第一雷射光束為一雷射脈衝光,具有一脈衝寬度小於1奈秒(ns),且具有一脈衝重複頻率範圍為10kHz~1MHz。 The method of claim 1, wherein the first laser beam is a laser pulsed light having a pulse width of less than 1 nanosecond (ns) and a pulse repetition frequency ranging from 10 kHz to 1 MHz. 如申請專利範圍第9項所述的方法,其中該第一雷射光束的該脈衝重複頻率範圍為1MHz~80MHz。 The method of claim 9, wherein the pulse repetition frequency of the first laser beam ranges from 1 MHz to 80 MHz. 如申請專利範圍第1項所述的方法,其中該第一雷射光束對於該加工對象物具有一透射性,該第一雷射光束之一透 射率大於0。 The method of claim 1, wherein the first laser beam has a transmissivity to the object to be processed, and the first laser beam is transparent. The rate of incidence is greater than zero. 如申請專利範圍第11項所述的方法,其中該加工對象物為選自玻璃、矽、石英或藍寶石的一透明材料。 The method of claim 11, wherein the object to be processed is a transparent material selected from the group consisting of glass, enamel, quartz or sapphire. 如申請專利範圍第1項所述的方法,其中該第二雷射光束為一連續雷射光或一雷射脈衝光。 The method of claim 1, wherein the second laser beam is a continuous laser beam or a laser beam. 如申請專利範圍第13項所述的方法,其中該第二雷射光束的一波長處於被該加工對象物線性吸收的一範圍內,從而使其能量以熱傳遞的方式被該加工對象物吸收,造成一焦點附近的該加工對象物之該表層的一溫度上升,但不使該加工對象物產生一實質損傷。 The method of claim 13, wherein a wavelength of the second laser beam is within a range linearly absorbed by the object to be processed, so that the energy is absorbed by the object in a heat transfer manner. This causes a temperature rise of the surface layer of the object to be processed near a focus, but does not cause a substantial damage to the object to be processed. 如申請專利範圍第1項所述的方法,其中該第二雷射光束在一焦點處的一功率密度小於該加工對象物在該第二雷射光束作用下的一最小損傷閾值。 The method of claim 1, wherein a power density of the second laser beam at a focus is less than a minimum damage threshold of the object under the second laser beam. 如申請專利範圍第3項所述的方法,其中對經加熱的該加工對象物的該表層進行該冷却的方式包含使用一氣態冷却介質或一液態冷却介質。 The method of claim 3, wherein the cooling of the surface layer of the heated object to be processed comprises using a gaseous cooling medium or a liquid cooling medium. 如申請專利範圍第16項所述的方法,其中該冷却介質處於一個標準大氣壓下,該冷卻介質之一溫度介於-210℃~20℃之間。 The method of claim 16, wherein the cooling medium is at a standard atmospheric pressure, and the temperature of one of the cooling medium is between -210 ° C and 20 ° C. 如申請專利範圍第3項所述的方法,其中對該加工對象物的該表層的該加熱製程、該冷却製程與產生該內部應力層為同時進行。 The method of claim 3, wherein the heating process of the surface layer of the object to be processed, the cooling process, and the generation of the internal stress layer are simultaneously performed. 如申請專利範圍第8項所述的方法,其中僅在形成最靠近該加工對象物的該表層的該內部應力層的同時,進行對該加工對象物的該表層的該加熱製程和該冷却製程。 The method of claim 8, wherein the heating process and the cooling process of the surface layer of the object to be processed are performed only while the inner stress layer of the surface layer closest to the object to be processed is formed. . 如申請專利範圍第3項所述的方法,其中對該加工對象物的該表層的該加熱製程和該冷却製程為在產生該內部應力層之後進行。 The method of claim 3, wherein the heating process and the cooling process of the surface layer of the object to be processed are performed after the internal stress layer is produced. 如申請專利範圍第1項所述的方法,其中至少部分利用該內部應力層和該表層應力層所釋放的該些應力的疊加,使得該加工對象物完全斷裂而被分割開。 The method of claim 1, wherein the superposition of the stresses released by the internal stress layer and the surface stress layer at least partially causes the object to be completely broken and divided. 如申請專利範圍第21項所述的方法,其中在該內部應力層和該表層應力層釋放的該些應力的疊加之外,進一步施加一機械外力,使得該加工對象物完全斷裂而被分割開。 The method of claim 21, wherein a mechanical external force is further applied in addition to the superposition of the internal stress layer and the stress released by the surface stress layer, so that the object to be processed is completely broken and is divided. . 一種利用一雷射光切割一加工對象物的裝置,包括:一第一雷射光部,包括產生一第一雷射光束的一第一雷射光源,該第一雷射光束通過一聚焦鏡或一物鏡並聚焦於該加工對象物的一內部,藉由該第一雷射光束對該加工對象物的作用在該內部產生一內部應力層;一第二雷射光部,包括產生一第二雷射光束的一第二雷射 光源,該第二雷射光束通過該聚焦鏡或該物鏡並聚焦於該加工對象物的一表層處,藉由該第二雷射光束對該加工對象物的作用在該表層處產生一表層應力層;一成像部,包括一成像光路和一照相機,以便對該加工對象物進行成像,並確定移動該聚焦鏡或該物鏡的一基準點;以及一運動系統,適於移動該聚焦鏡或該物鏡的一部件和/或移動該加工對象物的一部件,該運動系統適於使該聚焦鏡或該物鏡與該加工對象物相對於彼此移動,從而將該第一雷射光束和該第二雷射光束分別聚焦於該加工對象物的該內部和該表層處,並且使該加工對象物與該聚焦鏡或該物鏡二者之間沿一預定路徑產生相對運動,從而分別在該加工對象物的該內部和該表層處產生該內部應力層和該表層應力層,其中至少部分利用該內部應力層和該表層應力層所釋放的複數應力的疊加,使該加工對象物至少部分斷裂並進而被分割開。 An apparatus for cutting a processing object by using a laser beam, comprising: a first laser light portion, comprising: a first laser light source for generating a first laser beam, the first laser beam passing through a focusing mirror or a An objective lens is focused on an interior of the object to be processed, and an internal stress layer is generated in the interior by the action of the first laser beam on the object to be processed; and a second laser beam portion includes a second laser beam a second laser beam a light source, the second laser beam passes through the focusing mirror or the objective lens and is focused on a surface layer of the processing object, and a surface stress is generated at the surface layer by the action of the second laser beam on the processing object a imaging portion comprising an imaging optical path and a camera for imaging the object to be processed and determining a reference point for moving the focusing mirror or the objective lens; and a motion system adapted to move the focusing mirror or the a component of the objective lens and/or a component of the object to be processed, the motion system being adapted to move the focusing mirror or the objective lens and the processing object relative to each other, thereby the first laser beam and the second The laser beam is respectively focused on the inside of the object to be processed and the surface layer, and causes a relative movement between the object to be processed and the focusing mirror or the objective lens along a predetermined path, thereby respectively processing the object The inner stress layer and the surface stress layer are generated at the inner portion and the surface layer, wherein at least part of the superposition of the internal stress layer and the complex stress released by the surface stress layer is utilized. The object to be processed is at least partially broken and further divided. 如申請專利範圍第23項所述的裝置,其中該聚焦鏡或是該物鏡的一孔徑數值不小於0.4。 The device of claim 23, wherein the focusing mirror or the objective lens has an aperture value of not less than 0.4. 如申請專利範圍第23項所述的裝置,更包括適於排出一冷却介質的一冷却裝置,其中該內部應力層通過該第一雷射光束對該加工對象物的一光致損傷產生,該表層應力層是利用該第二雷射光束對該加工對象物的一熱效應在對該加工對象物的該表層加熱後經該冷却裝置排出的該冷却介質對其冷却產生。 The device of claim 23, further comprising a cooling device adapted to discharge a cooling medium, wherein the internal stress layer is generated by the first laser beam to cause damage to the object to be processed, The surface stress layer is formed by cooling the cooling medium discharged by the cooling device after the surface layer of the object to be processed is heated by the thermal effect of the second laser beam on the object to be processed. 如申請專利範圍第25項所述的裝置,其中該冷却裝置排出該冷却介質的一方向基本上沿著該聚焦鏡或該物鏡的一軸線。 The device of claim 25, wherein the cooling device discharges a direction of the cooling medium substantially along an axis of the focusing mirror or the objective lens. 如申請專利範圍第25項所述的裝置,其中該冷却裝置排出該冷却介質的一方向與該聚焦鏡或該物鏡的一軸線相交。 The device of claim 25, wherein a direction in which the cooling device discharges the cooling medium intersects an axis of the focusing mirror or the objective lens. 如申請專利範圍第26項所述的裝置,其中該冷却介質為氣態。 The device of claim 26, wherein the cooling medium is in a gaseous state. 如申請專利範圍第27項所述的裝置,其中該冷却介質為氣態或液態。 The device of claim 27, wherein the cooling medium is in a gaseous or liquid state. 如申請專利範圍第23項所述的裝置,其中該第一雷射光束為一雷射脈衝光,具有一脈衝寬度小於1奈秒(ns),且具有一脈衝重複頻率範圍為10kHz~1MHz。 The device of claim 23, wherein the first laser beam is a laser pulsed light having a pulse width of less than 1 nanosecond (ns) and having a pulse repetition frequency ranging from 10 kHz to 1 MHz. 如申請專利範圍第30項所述的裝置,其中該第一雷射光束的該脈衝重複頻率範圍為1MHz~80MHz。 The device of claim 30, wherein the pulse repetition frequency of the first laser beam ranges from 1 MHz to 80 MHz. 如申請專利範圍第23項所述的方法,其中該第一雷射光束對於該加工對象物具有一透射性,該第一雷射光束之一透射率大於0。 The method of claim 23, wherein the first laser beam has a transmittance for the object to be processed, and a transmittance of the first laser beam is greater than zero. 如申請專利範圍第23項所述的裝置,其中該加工對 象物的該表層包括該加工對象物的一表面。 The device of claim 23, wherein the processing pair The surface layer of the object includes a surface of the object to be processed. 如申請專利範圍第23項所述的裝置,其中該第一雷射光束在一焦點處的一功率密度大於該加工對象物在該第一雷射光束作用下的一最小損傷閾值。 The device of claim 23, wherein a power density of the first laser beam at a focus is greater than a minimum damage threshold of the object under the first laser beam. 如申請專利範圍第23項所述的裝置,其中該第二雷射光束為一連續雷射光或一雷射脈衝光。 The device of claim 23, wherein the second laser beam is a continuous laser beam or a laser beam. 如申請專利範圍第23項所述的裝置,其中該第二雷射光束在一焦點處的一功率密度小於該加工對象物在該第二雷射光束作用下的一最小損傷閾值。 The device of claim 23, wherein a power density of the second laser beam at a focus is less than a minimum damage threshold of the object under the second laser beam. 如申請專利範圍第25項所述的方法,其中該冷却介質處於一個標準大氣壓下,該冷卻介質之一溫度介於-210℃~20℃之間。 The method of claim 25, wherein the cooling medium is at a standard atmospheric pressure, and the temperature of one of the cooling medium is between -210 ° C and 20 ° C. 如申請專利範圍第23項所述的方法,更包括對該加工對象物施加一機械外力的一機構,從而在該內部應力層和該表層應力層釋放的該些應力的疊加之外,進一步利用該機構施加的該機械外力,使得該加工對象物完全斷裂而被分割開。 The method of claim 23, further comprising a mechanism for applying a mechanical external force to the object to be further utilized in addition to the superposition of the stresses released by the internal stress layer and the surface stress layer The mechanical external force applied by the mechanism causes the object to be completely broken and divided.
TW101131609A 2012-06-01 2012-08-30 Method for cutting workpiece by layer and apparatus by same TW201350246A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012101787299A CN102699526A (en) 2012-06-01 2012-06-01 Method and device for cutting machined object by using laser

Publications (1)

Publication Number Publication Date
TW201350246A true TW201350246A (en) 2013-12-16

Family

ID=46892735

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101131609A TW201350246A (en) 2012-06-01 2012-08-30 Method for cutting workpiece by layer and apparatus by same

Country Status (2)

Country Link
CN (1) CN102699526A (en)
TW (1) TW201350246A (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102962588B (en) * 2012-12-12 2015-04-22 东莞市中镓半导体科技有限公司 Method for fabricating invisibly structured substrate
JP6208430B2 (en) * 2013-01-25 2017-10-04 株式会社ディスコ Laser processing method
CN103193381A (en) * 2013-04-07 2013-07-10 北京工业大学 Method for removing laser selection area of glass
EP3186030B1 (en) * 2014-08-28 2023-02-22 IPG Photonics Corporation Multi-laser system and method for cutting and post-cut processing hard dielectric materials
CN105643110B (en) * 2014-11-14 2018-04-06 大族激光科技产业集团股份有限公司 A kind of precise laser cutting system
CN104625433A (en) * 2014-12-31 2015-05-20 武汉华工激光工程有限责任公司 Method for cutting LED lamp filament transparent material support
JP6025917B1 (en) * 2015-06-10 2016-11-16 株式会社アマダホールディングス Laser cutting method
CN105436712B (en) * 2015-12-07 2017-12-12 武汉铱科赛科技有限公司 The fragility splinter method and system of a kind of brittle semiconductor materials
CN109317821A (en) * 2017-07-24 2019-02-12 北京中科镭特电子有限公司 A kind of laser welding system
CN108127206B (en) * 2017-12-21 2020-07-07 武汉比天科技有限责任公司 Laser brazing process transplanting method and laser brazing device capable of transplanting data
JP7105639B2 (en) 2018-07-05 2022-07-25 浜松ホトニクス株式会社 Laser processing equipment
CN110142503B (en) * 2019-05-17 2020-09-29 中国科学院西安光学精密机械研究所 Defocusing compensation system for laser cutting and compensation method thereof
CN110342806B (en) * 2019-06-27 2021-11-09 大族激光科技产业集团股份有限公司 Processing method of glass cover plate with through hole
CN112264722A (en) * 2020-10-16 2021-01-26 西安中科微精光子制造科技有限公司 Laser micropore machining equipment and machining method suitable for thin-wall parts
CN112935528B (en) * 2021-01-29 2023-05-23 西安工业大学 Method and device for high-quality cutting of wafer with larger thickness
CN116833576A (en) * 2023-08-21 2023-10-03 广东工业大学 Closed-loop feedback type laser precision machining method and equipment
CN117340450A (en) * 2023-12-06 2024-01-05 国科大杭州高等研究院 Wafer dicing system and method

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4838531B2 (en) * 2005-04-27 2011-12-14 サイバーレーザー株式会社 Plate cutting method and laser processing apparatus
US7761994B2 (en) * 2006-05-17 2010-07-27 Air Products And Chemicals, Inc. Reactor with expandable structure providing improved heat transfer
US20070298529A1 (en) * 2006-05-31 2007-12-27 Toyoda Gosei, Co., Ltd. Semiconductor light-emitting device and method for separating semiconductor light-emitting devices
CN101130216A (en) * 2006-08-25 2008-02-27 富士迈半导体精密工业(上海)有限公司 Laser cutting method
CN101209515A (en) * 2006-12-27 2008-07-02 富士迈半导体精密工业(上海)有限公司 Laser cutting equipment
JP5449665B2 (en) * 2007-10-30 2014-03-19 浜松ホトニクス株式会社 Laser processing method
JP5054496B2 (en) * 2007-11-30 2012-10-24 浜松ホトニクス株式会社 Processing object cutting method
CN101444875A (en) * 2008-12-08 2009-06-03 浙江工业大学 Cutting method of fragile material substrate
US8609512B2 (en) * 2009-03-27 2013-12-17 Electro Scientific Industries, Inc. Method for laser singulation of chip scale packages on glass substrates

Also Published As

Publication number Publication date
CN102699526A (en) 2012-10-03

Similar Documents

Publication Publication Date Title
TW201350246A (en) Method for cutting workpiece by layer and apparatus by same
US11345625B2 (en) Method and device for the laser-based machining of sheet-like substrates
JP7119028B2 (en) Systems and methods for processing transparent materials with adjustable length and diameter laser beam focal lines
US10377658B2 (en) Apparatuses and methods for laser processing
JP6585050B2 (en) Cutting stack transparent materials using ultrafast laser beam optics, destructive layers and other layers
KR102582719B1 (en) Apparatus and method for simultaneous multi-laser processing of transparent workpieces
TWI592244B (en) Method and apparatus for performing laser filamentation within transparent materials
TWI677394B (en) Method of closed form release for brittle materials using burst ultrafast laser pulses
JP5379384B2 (en) Laser processing method and apparatus for transparent substrate
US20190062196A1 (en) Apparatuses and methods for laser processing transparent workpieces using an afocal beam adjustment assembly
TWI702106B (en) Method for laser cutting and laser preparation of a coated substrate
JP2020500137A (en) Fabrication of holes and slots in glass substrates
JP2017502901A5 (en)
JP2009072829A (en) Apparatus and method for cutting substrate using ultrashort pulsed laser beam
Hendricks et al. Time-resolved study of femtosecond laser induced micro-modifications inside transparent brittle materials
KR100843411B1 (en) Laser beam machining system and method for cutting of substrate using the same
Loeschner et al. Micromachining of glass with short ns-pulses and highly repetitive fs-laser pulses
JP2011200897A (en) Method of manufacturing semiconductor wafer