TW201343740A - Prepreg and method for manufacturing prepreg - Google Patents

Prepreg and method for manufacturing prepreg Download PDF

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TW201343740A
TW201343740A TW102106894A TW102106894A TW201343740A TW 201343740 A TW201343740 A TW 201343740A TW 102106894 A TW102106894 A TW 102106894A TW 102106894 A TW102106894 A TW 102106894A TW 201343740 A TW201343740 A TW 201343740A
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resin
resin layer
prepreg
base material
layer
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TW102106894A
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TWI575003B (en
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Takeshi Hosomi
Yasushi Takimoto
Haruyuki Hatano
Kohei Anada
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Sumitomo Bakelite Co
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29BPREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
    • B29B15/00Pretreatment of the material to be shaped, not covered by groups B29B7/00 - B29B13/00
    • B29B15/08Pretreatment of the material to be shaped, not covered by groups B29B7/00 - B29B13/00 of reinforcements or fillers
    • B29B15/10Coating or impregnating independently of the moulding or shaping step
    • B29B15/12Coating or impregnating independently of the moulding or shaping step of reinforcements of indefinite length
    • B29B15/122Coating or impregnating independently of the moulding or shaping step of reinforcements of indefinite length with a matrix in liquid form, e.g. as melt, solution or latex
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/02Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments
    • B32B17/04Layered products essentially comprising sheet glass, or glass, slag, or like fibres in the form of fibres or filaments bonded with or embedded in a plastic substance
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/12Layered products comprising a layer of synthetic resin next to a fibrous or filamentary layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/306Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising vinyl acetate or vinyl alcohol (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/34Layered products comprising a layer of synthetic resin comprising polyamides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/38Layered products comprising a layer of synthetic resin comprising epoxy resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/22Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
    • B32B5/24Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/02Fibres or whiskers
    • C08K7/04Fibres or whiskers inorganic
    • C08K7/14Glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0366Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/02Composition of the impregnated, bonded or embedded layer
    • B32B2260/021Fibrous or filamentary layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/04Impregnation, embedding, or binder material
    • B32B2260/046Synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2262/00Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
    • B32B2262/10Inorganic fibres
    • B32B2262/101Glass fibres
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2264/00Composition or properties of particles which form a particulate layer or are present as additives
    • B32B2264/10Inorganic particles
    • B32B2264/102Oxide or hydroxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2300/00Characterised by the use of unspecified polymers
    • C08J2300/22Thermoplastic resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2363/00Characterised by the use of epoxy resins; Derivatives of epoxy resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0183Dielectric layers
    • H05K2201/0195Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0275Fibers and reinforcement materials
    • H05K2201/029Woven fibrous reinforcement or textile

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Reinforced Plastic Materials (AREA)
  • Laminated Bodies (AREA)
  • Moulding By Coating Moulds (AREA)

Abstract

The invention relates to a prepreg (1) comprising a fibrous substrate (2), a first resin layer (3) covering one side of the fibrous substrate (2) and being composed of a first resin composition, and a second resin layer (4) covering the other side of the fibrous substrate (2) and being composed of a second resin composition that is different from the first resin composition. The second resin layer (4) is impregnated in the fibrous substrate (2) throughout at least 90% of the thickness of the fibrous substrate (2) from the other side of the fibrous substrate (2).

Description

預浸體及預浸體之製造方法 Prepreg and prepreg manufacturing method

本發明係關於一種預浸體及預浸體之製造方法。 The present invention relates to a method for producing a prepreg and a prepreg.

近年來,為了使電子零件、電子機器等小型化、薄膜化,而要求使其所使用之電路基板等小型化、薄膜化。為了應對該要求,現使用多層構造之電路基板而使其之各層變薄。 In recent years, in order to reduce the size and thickness of electronic components and electronic devices, it is required to reduce the size and thickness of circuit boards used. In order to cope with this demand, a circuit board having a multilayer structure has been used to make each layer thin.

一般而言,為了使電路基板變薄,而採用於預浸體之一面形成電路圖案,利用鄰接於該預浸體之其他預浸體埋入該電路圖案的方法。專利文獻1中揭示有適用於此種構造之電路基板之預浸體。專利文獻1中揭示有於纖維基材之兩側形成有厚度不同之2層樹脂層的預浸體。 In general, in order to thin a circuit board, a circuit pattern is formed on one surface of a prepreg, and a method of embedding the circuit pattern by another prepreg adjacent to the prepreg is used. Patent Document 1 discloses a prepreg suitable for a circuit board of such a configuration. Patent Document 1 discloses a prepreg in which two resin layers having different thicknesses are formed on both sides of a fiber base material.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本專利特開2004-216784號公報 Patent Document 1: Japanese Patent Laid-Open Publication No. 2004-216784

如上所述,有於預浸體之一面形成電路圖案,利用鄰接於該預浸體之其他預浸體埋入該電路圖案的方法。於該情形時,於預浸體之一面之樹脂層上形成電路圖案,並且於另一面之樹脂層中埋入 鄰接之預浸體之電路圖案。因此,對於預浸體之一側之樹脂層要求與電路圖案之密接性,對於另一側之樹脂層要求電路圖案之埋入性。即,對於預浸體之2層樹脂層分別要求不同之特性。專利文獻1中所記載之預浸體由於一樹脂層之厚度厚於另一樹脂層,故而可於厚度較厚之樹脂層中埋入電路圖案。然而,專利文獻1所記載之預浸體由於兩樹脂層由相同之樹脂組成物所構成,因此難以滿足上述之2個不同特性。 As described above, there is a method in which a circuit pattern is formed on one surface of a prepreg, and the circuit pattern is buried by another prepreg adjacent to the prepreg. In this case, a circuit pattern is formed on the resin layer on one side of the prepreg, and buried in the resin layer on the other side. The circuit pattern of the adjacent prepreg. Therefore, the resin layer on one side of the prepreg is required to have adhesion to the circuit pattern, and the resin layer on the other side is required to have embedding of the circuit pattern. That is, different characteristics are required for each of the two resin layers of the prepreg. In the prepreg described in Patent Document 1, since the thickness of one resin layer is thicker than the other resin layer, a circuit pattern can be buried in the resin layer having a relatively large thickness. However, in the prepreg described in Patent Document 1, since the two resin layers are composed of the same resin composition, it is difficult to satisfy the above two different characteristics.

本發明者等人為了使預浸體之一面側之樹脂層與另一面側之樹脂層滿足不同之特性,而提出以不同之樹脂組成物構成該等樹脂層。然而,得知於將不同之上述樹脂組成物之兩者含浸於纖維基材中之情形時,必須係對纖維基材之含浸性良好,且對各樹脂組成物之設計加以限制,於各樹脂層中難以充分地發揮所需之特性。本發明係基於此種見解而提出者。 In order to satisfy the different characteristics of the resin layer on the one side of the prepreg and the resin layer on the other side, the inventors of the present invention proposed to form the resin layers with different resin compositions. However, it has been found that when two or more of the above resin compositions are impregnated into the fibrous base material, it is necessary to have good impregnation properties to the fibrous base material, and to limit the design of each resin composition to each resin. It is difficult to fully exert the required characteristics in the layer. The present invention has been made based on such findings.

即,根據本發明,提供一種預浸體,其具備纖維基材、被覆上述纖維基材之一面側且由第1樹脂組成物構成之第1樹脂層、及被覆上述纖維基材之另一面側且由與上述第1樹脂組成物不同之第2樹脂組成物構成的第2樹脂層,並且上述第2樹脂層至少自上述纖維基材之另一面起遍及上述纖維基材之厚度之90%而含浸於上述纖維基材中。 In other words, according to the present invention, there is provided a prepreg comprising a fiber base material, a first resin layer which is coated on one surface side of the fiber base material and which is composed of a first resin composition, and another side surface on which the fiber base material is coated a second resin layer composed of a second resin composition different from the first resin composition, and the second resin layer is present at least 90% of the thickness of the fiber base material from the other surface of the fiber base material. Immersed in the above fibrous substrate.

於此種預浸體中,形成有至少自纖維基材之另一面起遍及纖維基材之厚度之90%而含浸於纖維基材中的第2樹脂層。因此,無需使第1樹脂層大量含浸於纖維基材中。因此,構成第1樹脂層之第1樹脂組成物並不限定於對纖維基材之含浸性良好者,第1樹脂組成物之選擇範圍擴大。並且,可製成具備具有所需特性之第1樹脂層 的預浸體。 In such a prepreg, a second resin layer impregnated into the fibrous base material over at least 90% of the thickness of the fibrous base material from the other side of the fibrous base material is formed. Therefore, it is not necessary to impregnate the first resin layer in a large amount in the fibrous base material. Therefore, the first resin composition constituting the first resin layer is not limited to those having good impregnation with the fiber base material, and the selection range of the first resin composition is widened. Also, a first resin layer having desired characteristics can be produced Prepreg.

進而,亦可提供一種上述預浸體之製造方法。即,根據本發明,可提供一種預浸體之製造方法,其包括將第1樹脂片材壓合於纖維基材之一面而設置由第1樹脂組成物構成之第1樹脂層的步驟,於上述纖維基材之另一面側形成由與上述第1樹脂組成物不同之第2樹脂組成物構成之第2樹脂層的步驟,並且於形成第2樹脂層之上述步驟中,形成至少自上述纖維基材之另一面起遍及上述纖維基材之厚度之90%而含浸於上述纖維基材中的第2樹脂層。 Further, a method of producing the above prepreg can also be provided. In other words, according to the present invention, there is provided a method for producing a prepreg comprising the steps of: pressing a first resin sheet against one surface of a fiber base material and providing a first resin layer composed of a first resin composition; a step of forming a second resin layer composed of a second resin composition different from the first resin composition on the other surface side of the fiber base material, and forming at least the fiber in the step of forming the second resin layer The other surface of the substrate is impregnated with the second resin layer in the fiber base material over 90% of the thickness of the fiber base material.

根據該製造方法,形成至少自纖維基材之另一面起遍及纖維基材之厚度之90%而含浸於纖維基材中的第2樹脂層。因此,無需使第1樹脂片材大量含浸於纖維基材中。因此,構成第1樹脂層之第1樹脂組成物並不限定於對纖維基材之含浸性良好者,第1樹脂組成物之選擇範圍擴大,可形成具有所需特性之第1樹脂層。進而,亦可提供一種基板,其係具有上述預浸體之硬化體,且具備電路層,上述預浸體之硬化體之上述第2樹脂層中埋入上述電路層,並且上述預浸體之硬化體之上述第1樹脂層上設置有金屬層。又,亦可提供一種半導體裝置,其具備該基板、及搭載於上述基板上之半導體元件。 According to this production method, the second resin layer impregnated into the fiber base material at least 90% of the thickness of the fiber base material from the other side of the fiber base material is formed. Therefore, it is not necessary to impregnate the first resin sheet in a large amount in the fibrous base material. Therefore, the first resin composition constituting the first resin layer is not limited to those having good impregnation with the fiber base material, and the selection range of the first resin composition is expanded to form the first resin layer having desired characteristics. Furthermore, a substrate having a hardened body of the prepreg and a circuit layer in which the circuit layer is embedded in the second resin layer of the cured body of the prepreg, and the prepreg is provided A metal layer is provided on the first resin layer of the cured body. Further, a semiconductor device including the substrate and a semiconductor element mounted on the substrate may be provided.

根據本發明,可提供一種具有不同之樹脂層,可更確實地發揮各樹脂層之所需特性的預浸體及預浸體之製造方法。 According to the present invention, it is possible to provide a prepreg and a method for producing a prepreg which have different resin layers and can more reliably exhibit desired characteristics of the respective resin layers.

1、1a~1f‧‧‧預浸體 1, 1a~1f‧‧‧ prepreg

2‧‧‧纖維基材 2‧‧‧Fiber substrate

3‧‧‧第1樹脂層 3‧‧‧1st resin layer

3'‧‧‧第1樹脂片材 3'‧‧‧1st resin sheet

4‧‧‧第2樹脂層 4‧‧‧2nd resin layer

4'‧‧‧第2樹脂片材 4'‧‧‧2nd resin sheet

5、7‧‧‧片材 5, 7‧‧‧ sheets

6、6a‧‧‧製造裝置 6, 6a‧‧‧ manufacturing equipment

8‧‧‧樹脂薄膜 8‧‧‧Resin film

10‧‧‧基板 10‧‧‧Substrate

11‧‧‧積層體 11‧‧‧Layer

12‧‧‧金屬層 12‧‧‧metal layer

13‧‧‧內層電路基板 13‧‧‧ Inner layer circuit board

31‧‧‧第1含浸部 31‧‧‧1st impregnation

32、42‧‧‧被覆部 32, 42‧‧‧ Coverage Department

43‧‧‧第2含浸部 43‧‧‧2nd Impregnation Department

51‧‧‧支持體 51‧‧‧Support

64‧‧‧乾燥裝置 64‧‧‧Drying device

65‧‧‧貼合裝置 65‧‧‧Fitting device

100‧‧‧半導體裝置 100‧‧‧Semiconductor device

200‧‧‧多層基板 200‧‧‧Multilayer substrate

201a~201e‧‧‧電路部 201a~201e‧‧‧ Circuit Department

202、203‧‧‧導體部 202, 203‧‧‧ conductor

300‧‧‧焊墊部 300‧‧‧ solder pad

400‧‧‧配線部 400‧‧‧Wiring Department

500‧‧‧半導體元件 500‧‧‧Semiconductor components

501‧‧‧凸塊 501‧‧‧Bumps

611‧‧‧噴嘴 611‧‧‧ nozzle

621~629、651、652‧‧‧輥 621~629, 651, 652‧‧ ‧ rolls

F‧‧‧界面 F‧‧‧ interface

T、ta、ta1、tb、tb1‧‧‧厚度 T, ta, ta 1 , tb, tb 1 ‧ ‧ thickness

θ‧‧‧角度 Θ‧‧‧ angle

上述目的、其他目的、特徵及優點可藉由以下所述之較佳之實施形態、及其隨附之以下之圖式而進一步明確。 The above and other objects, features, and advantages of the invention will be apparent from the description and appended claims appended claims

圖1係本發明之一實施形態之預浸體之剖面圖。 BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a prepreg according to an embodiment of the present invention.

圖2係預浸體之剖面圖。 Figure 2 is a cross-sectional view of the prepreg.

圖3係表示預浸體之製造裝置之示意圖。 Fig. 3 is a schematic view showing a manufacturing apparatus of a prepreg.

圖4係表示預浸體之製造裝置之示意圖。 Fig. 4 is a schematic view showing a manufacturing apparatus of a prepreg.

圖5係表示基板之剖面圖。 Fig. 5 is a cross-sectional view showing a substrate.

圖6係表示半導體裝置之剖面圖。 Fig. 6 is a cross-sectional view showing a semiconductor device.

圖7(a)至(c)係表示樹脂流動率之測定方法之示意圖。 7(a) to 7(c) are schematic views showing a method of measuring the resin flow rate.

圖8係表示實施例1之預浸體之剖面的圖。 Fig. 8 is a view showing a cross section of the prepreg of Example 1.

圖9係表示實施例5之預浸體之剖面的圖。 Fig. 9 is a view showing a cross section of the prepreg of Example 5.

圖10係表示實施例6之預浸體之剖面的圖。 Fig. 10 is a view showing a cross section of a prepreg of Example 6.

圖11係表示比較例1之預浸體之剖面的圖。 Fig. 11 is a view showing a cross section of a prepreg of Comparative Example 1.

圖12係表示比較例2之預浸體之剖面的圖。 Fig. 12 is a view showing a cross section of a prepreg of Comparative Example 2.

以下,基於圖式對本發明之實施形態進行說明。再者,於全部圖式中,相同之構成要素附加相同之符號,其詳細之說明可適當省略以免重複。首先,參照圖1及圖3,對本實施形態之預浸體及其製造方法之概要進行說明。 Hereinafter, embodiments of the present invention will be described based on the drawings. In the drawings, the same components are denoted by the same reference numerals, and the detailed description thereof may be omitted as appropriate. First, an outline of a prepreg according to the present embodiment and a method of manufacturing the same will be described with reference to Figs. 1 and 3 .

圖1係表示預浸體之剖面圖。本實施形態之預浸體1具備纖維基材2、被覆纖維基材2之一面側且包含第1樹脂組成物構成之第1樹脂層3、及被覆纖維基材2之另一面側且包含與上述第1樹脂組成物不同之第2樹脂組成物構成的第2樹脂層4,並且第1樹脂層3與第2樹脂層4接觸而形成界面F。並且,第2樹脂層4至少自纖維基材2之另一面起遍及纖維基材2之厚度之90%而含浸於纖維基材2中。此處,所謂第1樹脂組成物與第2樹脂組成物不同,可為構成各樹脂 組成物之構成成分之種類不同,或者亦可為組成比不同。 Figure 1 is a cross-sectional view showing a prepreg. The prepreg 1 of the present embodiment includes the fiber base material 2, the first resin layer 3 including the first resin composition on one side of the coated fiber base material 2, and the other surface side of the coated fiber base material 2, and The second resin layer 4 composed of the second resin composition having the first resin composition is different, and the first resin layer 3 is in contact with the second resin layer 4 to form the interface F. Further, the second resin layer 4 is impregnated into the fibrous base material 2 from at least 90% of the thickness of the fibrous base material 2 from the other surface of the fibrous base material 2. Here, the first resin composition is different from the second resin composition, and may constitute each resin. The composition of the composition may be different or may be different in composition ratio.

又,本實施形態之預浸體之製造方法包括如下步驟:將第1樹脂片材3'壓合於纖維基材2之一面而設置包含由第1樹脂組成物形成之第1樹脂層3的步驟,及於纖維基材2之另一面側形成包含與上述第1樹脂組成物不同之由第2樹脂組成物形成之第2樹脂層4的步驟。於形成第2樹脂層4之上述步驟中,形成至少自上述纖維基材2之另一面起遍及上述纖維基材2之厚度之90%而含浸於纖維基材2中的第2樹脂層4。 Moreover, the method for producing a prepreg according to the present embodiment includes the step of pressing the first resin sheet 3' against one surface of the fiber base material 2 and providing the first resin layer 3 including the first resin composition. In the step, the second resin layer 4 formed of the second resin composition different from the first resin composition is formed on the other surface side of the fiber base material 2. In the above step of forming the second resin layer 4, the second resin layer 4 impregnated into the fiber base material 2 from at least 90% of the thickness of the fibrous base material 2 from the other surface of the fibrous base material 2 is formed.

其次,參照圖1~圖4,對預浸體及預浸體之製造方法進行詳細說明。 Next, a method of manufacturing a prepreg and a prepreg will be described in detail with reference to Figs. 1 to 4 .

<預浸體> <Prepreg>

以下,對本實施形態之預浸體1進行詳細說明。再者,以下之說明中,將圖1(以下之各圖中相同)中之上側說明為「上」,下側說明為「下」。 Hereinafter, the prepreg 1 of the present embodiment will be described in detail. In the following description, the upper side of FIG. 1 (the same applies to the following drawings) is referred to as "upper", and the lower side is described as "lower".

圖1所示之預浸體1具有平板狀之纖維基材2、位於纖維基材2之一面(下表面)側之第1樹脂層3、及位於纖維基材2之另一面(上表面)側之第2樹脂層4。該預浸體1係印刷配線基板(電路基板)用途。 The prepreg 1 shown in Fig. 1 has a flat fibrous base material 2, a first resin layer 3 on one side (lower surface) side of the fibrous base material 2, and another surface (upper surface) on the fibrous base material 2. The second resin layer 4 on the side. This prepreg 1 is used for a printed wiring board (circuit board).

纖維基材2具有提高預浸體1之機械強度之功能。作為該纖維基材2,例如可列舉:玻璃織布、玻璃不織布等玻璃纖維基材;包含以聚醯胺樹脂纖維、芳香族聚醯胺樹脂纖維或全芳香族聚醯胺樹脂纖維等醯胺纖維等聚醯胺系樹脂纖維,聚酯樹脂纖維、芳香族聚酯樹脂纖維、全芳香族聚酯樹脂纖維等聚酯系樹脂纖維,聚對伸苯基苯并雙唑、聚醯亞胺樹脂纖維、氟樹脂纖維等中之任1種以上作為主 成分之織布或不織布的合成纖維基材;以牛皮紙、棉短絨紙、棉絨與牛皮紙漿之混抄紙等作為主成分之紙纖維基材等有機纖維基材等纖維基材等。於該等之中,可使用任1種以上之纖維基材。 The fibrous base material 2 has a function of improving the mechanical strength of the prepreg 1. Examples of the fiber base material 2 include glass fiber substrates such as glass woven fabrics and glass nonwoven fabrics, and phthalamides such as polyamide resin fibers, aromatic polyamide resin fibers, or wholly aromatic polyamide resin fibers. Polyurethane resin fiber such as fiber, polyester resin fiber such as polyester resin fiber, aromatic polyester resin fiber or wholly aromatic polyester resin fiber, polyparaphenylene benzobis a synthetic fiber substrate of woven or non-woven fabric as a main component of any one or more of azole, polyimine resin fiber, fluororesin fiber, etc.; kraft paper, cotton velvet paper, mixed paper of cotton velvet and kraft pulp, etc. A fibrous base material such as an organic fiber base material such as a paper fiber base material as a main component. Among these, any one or more kinds of fibrous base materials can be used.

於該等之中,纖維基材2較佳為玻璃纖維基材。藉由使用該玻璃纖維基材,可進一步提高預浸體1之機械強度。又,亦存在亦可縮小預浸體1之熱膨脹係數之效果。 Among these, the fibrous base material 2 is preferably a glass fiber base material. By using the glass fiber substrate, the mechanical strength of the prepreg 1 can be further improved. Further, there is also an effect that the thermal expansion coefficient of the prepreg 1 can be reduced.

作為構成此種玻璃纖維基材之玻璃,例如可列舉:E玻璃、C玻璃、A玻璃、S玻璃、D玻璃、NE玻璃、T玻璃、Q玻璃、H玻璃、UT玻璃、L玻璃等,於該等之中,可使用任1種以上。於該等之中,玻璃較佳為S玻璃、T玻璃、UT玻璃、或Q玻璃。藉此,可使玻璃纖維基材之熱膨脹係數變得相對較小,因此,可將預浸體1設為其熱膨脹係數儘可能小者。 Examples of the glass constituting the glass fiber substrate include E glass, C glass, A glass, S glass, D glass, NE glass, T glass, Q glass, H glass, UT glass, L glass, and the like. Any one or more of these may be used. Among these, the glass is preferably S glass, T glass, UT glass, or Q glass. Thereby, the thermal expansion coefficient of the glass fiber base material can be made relatively small, and therefore, the prepreg 1 can be set to have a thermal expansion coefficient as small as possible.

纖維基材2之平均厚度T並無特別限定,較佳為150 μm以下,更佳為100 μm以下,進而較佳為10 μm~50 μm左右。藉由使用該厚度之纖維基材2,可確保預浸體1之機械強度,並且謀求其薄型化。進而,亦可提高對預浸體1實施打孔等加工時之加工性。再者,纖維基材2之平均厚度T可藉由於纖維基材2之縱絲與橫絲之交點部分,測定10個部位之自纖維基材2之一面至另一面之厚度,並算出其平均值而獲得。 The average thickness T of the fiber base material 2 is not particularly limited, but is preferably 150 μm or less, more preferably 100 μm or less, still more preferably about 10 μm to 50 μm. By using the fiber base material 2 having such a thickness, the mechanical strength of the prepreg 1 can be ensured, and the thickness thereof can be reduced. Further, the workability in the case where the prepreg 1 is subjected to drilling or the like can be improved. Further, the average thickness T of the fibrous base material 2 can be measured from the thickness of one side of the fibrous base material 2 to the other surface by the intersection of the longitudinal and transverse threads of the fibrous base material 2, and the average is calculated. Obtained by value.

於該纖維基材2之一面側設置有第1樹脂層3,又,於另一面側設置有第2樹脂層4。又,第1樹脂層3係第1樹脂組成物構成,第2樹脂層4係與上述第1樹脂組成物不同之第2樹脂組成物構成。第1樹脂層3被覆纖維基材2之一面,第2樹脂層4被覆纖維基材2之另一面。第1樹脂層3係於其上部直接形成配線部(金屬層)之 層。另一方面,第2樹脂層4係埋入電路層之層。再者,於本發明中,預浸體不包括製造基板時所剝離之薄膜。再者,第1樹脂層3及第2樹脂層4為半硬化(B階)之狀態。 The first resin layer 3 is provided on one surface side of the fiber base material 2, and the second resin layer 4 is provided on the other surface side. Further, the first resin layer 3 is composed of a first resin composition, and the second resin layer 4 is composed of a second resin composition different from the first resin composition. The first resin layer 3 covers one surface of the fiber base material 2, and the second resin layer 4 covers the other surface of the fiber base material 2. The first resin layer 3 is formed by directly forming a wiring portion (metal layer) on the upper portion thereof. Floor. On the other hand, the second resin layer 4 is buried in the layer of the circuit layer. Further, in the present invention, the prepreg does not include a film which is peeled off when the substrate is manufactured. Further, the first resin layer 3 and the second resin layer 4 are in a state of semi-hardening (B-stage).

於本實施形態中,為了於第1樹脂層3上形成金屬製之配線部(電路部),第1樹脂組成物設定為如與金屬之密接性優異之組成。若更詳細地說明,則將該預浸體1之第1樹脂層3與銅箔重疊,於負重2 MPa、溫度220℃之條件下於大氣中熱處理1小時後之90°剝離強度A高於將該預浸體1之第2樹脂層4與銅箔重疊,於負重2 MPa、溫度220℃之條件下於大氣中熱處理1小時後之90°剝離強度B。剝離強度可依據JIS C 6481之90度剝離法,於90度方向上對銅箔剝離樹脂層進行測定。具體而言,於25℃下,利用90度剝離試驗機以每分鐘50 mm之速度測定剝離樹脂層時之90度剝離強度。更具體而言,剝離強度A較佳為0.5 kN/m以上。進而更佳為0.6 kN/m以上,特佳為0.8 kN/m以上。藉由設為0.5 kN/m以上,可提高與配線部之密接性。再者,剝離強度A之上限值並無特別限定,較佳為2 kN/m以下。另一方面,剝離強度B較佳為0.4 N/m以上。其中,較佳為0.5 N/m以上。藉由設為0.4 N/m以上,可提高與內層電路配線部之密接。另一方面,剝離強度B之上限值並無特別限定,較佳為1 kN/m以下。剝離強度A-剝離強度B較佳為0.1 kN/m以上,且進而較佳為1.6 kN/m以下。 In the present embodiment, in order to form a metal wiring portion (circuit portion) on the first resin layer 3, the first resin composition is set to have a composition excellent in adhesion to metal. More specifically, the first resin layer 3 of the prepreg 1 is superposed on the copper foil, and the 90° peel strength A after heat treatment in the atmosphere for 1 hour under a load of 2 MPa and a temperature of 220 ° C is higher than that. The second resin layer 4 of the prepreg 1 was superposed on the copper foil, and the 90° peel strength B after heat treatment in the air for 1 hour under a load of 2 MPa and a temperature of 220 ° C. The peel strength can be measured in the 90 degree direction in accordance with the 90 degree peeling method of JIS C 6481. Specifically, the 90-degree peel strength at the time of peeling off the resin layer was measured at a speed of 50 mm per minute at 25 ° C using a 90-degree peeling tester. More specifically, the peel strength A is preferably 0.5 kN/m or more. More preferably, it is 0.6 kN/m or more, and particularly preferably 0.8 kN/m or more. By setting it as 0.5 kN/m or more, the adhesiveness with a wiring part can be improved. Further, the upper limit of the peel strength A is not particularly limited, but is preferably 2 kN/m or less. On the other hand, the peel strength B is preferably 0.4 N/m or more. Among them, it is preferably 0.5 N/m or more. By setting it as 0.4 N/m or more, the adhesion to the inner layer wiring part can be improved. On the other hand, the upper limit of the peel strength B is not particularly limited, but is preferably 1 kN/m or less. The peel strength A-peeling strength B is preferably 0.1 kN/m or more, and more preferably 1.6 kN/m or less.

又,為了確實地埋入其他預浸體1之配線部(電路),第2樹脂組成物較佳為設定為第2樹脂層4之最低熔融黏度低於第1樹脂層3的組成。關於最低熔融黏度,於下文進行說明。又,於本實施形態中,為了使第2樹脂層4含浸於纖維基材2內部,構成第2樹脂層4之第2樹脂組成物較佳為成為對纖維基材2之含浸性良好之組成。關 於各樹脂組成物,於下文進行詳細說明。 Moreover, in order to reliably embed the wiring portion (circuit) of the other prepreg 1, the second resin composition is preferably set such that the lowest melt viscosity of the second resin layer 4 is lower than that of the first resin layer 3. The lowest melt viscosity is explained below. Further, in the present embodiment, in order to impregnate the second resin layer 4 with the inside of the fiber base material 2, the second resin composition constituting the second resin layer 4 preferably has a good impregnation property with respect to the fiber base material 2. . turn off Each resin composition is described in detail below.

如圖1所示,於本實施形態中,於纖維基材2上遍及其厚度方向整體而含浸第2樹脂層4之一部分。若更詳細地說明,則第2樹脂層4包含含浸於纖維基材2內部之含浸部43、及被覆纖維基材2之表面(另一面)之被覆部42。此處,第2樹脂層4之含浸部43至少遍及自以纖維基材2之被覆部42被覆之表面至纖維基材2之厚度之90%之位置而含浸於纖維基材2中。於本實施形態中,含浸部43遍及纖維基材2之厚度整體,而含浸於纖維基材2中。含浸部43與第1樹脂層3接觸,但含浸部43與第1樹脂層3未相互混合,於含浸部43與第1樹脂層3之間形成成為邊界之界面F。藉此,可確實地發揮各樹脂層3、4之功能。 As shown in Fig. 1, in the present embodiment, one portion of the second resin layer 4 is impregnated throughout the thickness direction of the fiber base material 2. More specifically, the second resin layer 4 includes an impregnation portion 43 impregnated inside the fiber base material 2 and a coating portion 42 covering the surface (the other surface) of the fiber base material 2. Here, the impregnation portion 43 of the second resin layer 4 is impregnated into the fiber base material 2 at least at a position from the surface covered with the coating portion 42 of the fiber base material 2 to 90% of the thickness of the fiber base material 2. In the present embodiment, the impregnation portion 43 is impregnated into the fiber base material 2 over the entire thickness of the fiber base material 2. The impregnation portion 43 is in contact with the first resin layer 3, but the impregnation portion 43 and the first resin layer 3 are not mixed with each other, and an interface F at the boundary is formed between the impregnation portion 43 and the first resin layer 3. Thereby, the functions of the respective resin layers 3 and 4 can be reliably exhibited.

又,含浸部43與第1樹脂層3之界面F位於纖維基材2之外側。若更詳細地說明,則第1樹脂層3與纖維基材2之一面抵接,但未含浸於纖維基材2內部。並且,含浸部43與第1樹脂層3抵接,形成界面F。再者,於本實施形態中,第1樹脂層3直接與纖維基材2之一面抵接,但並不限定於此,亦可以使含浸部43自纖維基材2之一面露出之方式含浸,而使第1樹脂層3不直接與纖維基材2之一面抵接。於本實施形態中,纖維基材2之平均厚度T與第2樹脂層4之厚度ta相等。如此藉由使第2樹脂層4與第1樹脂層3之界面存在於纖維基材2之外部,而上述界面與纖維基材2之交點消失。此處,於大量存在界面與纖維基材2之交點之情形時,有產生如下現象之擔憂。可認為於預浸體上形成通孔等孔,於該孔內部形成金屬層之情形時,金屬離子自纖維基材2與樹脂層間之界面之交點進入,進而沿上述界面遷移。通常,纖維基材2與樹脂層之密接性較差,因此認為金屬離 子容易自纖維基材2與樹脂層間之界面之交點進入。藉由金屬離子遷移,電洞間之絕緣可靠性降低。相對於此,可藉由使界面與纖維基材2之交點消失,而防止自纖維基材2與第2樹脂層4之間進入之金屬離子於上述界面遷移。藉此,可提高電洞間之絕緣可靠性。又,於本實施形態中,第1樹脂層3未含浸於纖維基材2中,因此無需考慮對纖維基材2之含浸性。並且,作為第1樹脂層3,只要選擇與金屬之密接性良好者即可,故而可擴大第1樹脂層3之設計範圍。再者,藉由利用掃描式電子顯微鏡(SEM,Scanning Electron Microscope)觀察與預浸體1之厚度方向正交之剖面,可確認第1樹脂層3與第2樹脂層4之界面。又,於與預浸體1之厚度方向正交之剖面中,較佳為遍及預浸體1之寬度方向整體而形成第1樹脂層3與第2樹脂層4之界面。藉由成為此種構造,可確實地發揮各樹脂層3、4之功能。再者,第1樹脂層3未含浸於纖維基材2中,於第1樹脂層3中不存在其他纖維基材。 Further, the interface F between the impregnation portion 43 and the first resin layer 3 is located on the outer side of the fiber base material 2. More specifically, the first resin layer 3 is in contact with one surface of the fiber base material 2, but is not impregnated into the fiber base material 2. Further, the impregnation portion 43 abuts against the first resin layer 3 to form an interface F. Further, in the present embodiment, the first resin layer 3 is directly in contact with one surface of the fiber base material 2, but the present invention is not limited thereto, and the impregnation portion 43 may be impregnated from one surface of the fiber base material 2, On the other hand, the first resin layer 3 is not directly in contact with one surface of the fiber base material 2. In the present embodiment, the average thickness T of the fibrous base material 2 is equal to the thickness ta of the second resin layer 4. As described above, the interface between the second resin layer 4 and the first resin layer 3 is present outside the fiber base material 2, and the intersection of the interface with the fiber base material 2 disappears. Here, in the case where a large number of intersections of the interface and the fibrous base material 2 exist, there is a fear that the following phenomenon occurs. It is considered that a hole such as a through hole is formed in the prepreg, and when a metal layer is formed inside the hole, metal ions enter from the intersection of the interface between the fiber substrate 2 and the resin layer, and further migrate along the interface. Generally, the adhesion between the fibrous base material 2 and the resin layer is poor, so that the metal is considered to be away from the metal. The precursor easily enters from the intersection of the interface between the fibrous substrate 2 and the resin layer. By metal ion migration, the insulation reliability between holes is reduced. On the other hand, by the disappearance of the intersection of the interface and the fibrous base material 2, the metal ions entering between the fibrous base material 2 and the second resin layer 4 can be prevented from migrating to the interface. Thereby, the insulation reliability between the holes can be improved. Further, in the present embodiment, since the first resin layer 3 is not impregnated into the fibrous base material 2, it is not necessary to consider the impregnation property with respect to the fibrous base material 2. Further, as the first resin layer 3, it is only necessary to select a good adhesion to the metal, so that the design range of the first resin layer 3 can be expanded. In addition, the cross section perpendicular to the thickness direction of the prepreg 1 was observed by a scanning electron microscope (SEM, Scanning Electron Microscope), and the interface between the first resin layer 3 and the second resin layer 4 was confirmed. Moreover, in the cross section orthogonal to the thickness direction of the prepreg 1, it is preferable to form the interface between the first resin layer 3 and the second resin layer 4 over the entire width direction of the prepreg 1. By having such a structure, the functions of the respective resin layers 3 and 4 can be reliably exhibited. Further, the first resin layer 3 is not impregnated into the fibrous base material 2, and no other fibrous base material is present in the first resin layer 3.

再者,於本實施形態中,含浸部43遍及纖維基材2之厚度整體,而含浸於纖維基材2中,但並不限定於此,第1樹脂層3亦可含浸於纖維基材2中。如圖2所示,第2樹脂層4之含浸部43遍及自經纖維基材2之被覆部42被覆之表面(另一面)至纖維基材2之厚度之90%以上之位置而含浸於纖維基材2中。即,含浸部43之厚度ta1為纖維基材2之厚度T之90%以上。又,第1樹脂層3之含浸部31含浸於纖維基材2中。含浸部31遍及自經被覆部32被覆之纖維基材2之表面(一面)至纖維基材2之厚度之10%以下之位置而含浸於纖維基材2中。含浸部31之厚度tb1為纖維基材2之厚度T之10%以下。含浸部31係含浸未由含浸部43含浸之區域。並且,作為第1樹脂層3 之一部分的第1含浸部31與作為第2樹脂層4之一部分的第2含浸部43位於纖維基材2內。於纖維基材2內,第1含浸部31(第1樹脂層3之下表面)與第2含浸部43(第2樹脂層4之上表面)接觸。又,於第1含浸部31與含浸部43之邊界形成界面F。其他方面與圖1相同。 Further, in the present embodiment, the impregnation portion 43 is impregnated into the fiber base material 2 over the entire thickness of the fiber base material 2, but the present invention is not limited thereto, and the first resin layer 3 may be impregnated into the fiber base material 2 in. As shown in FIG. 2, the impregnation portion 43 of the second resin layer 4 is impregnated into the fiber from the surface (the other surface) covered by the covering portion 42 of the fiber base material 2 to 90% or more of the thickness of the fiber base material 2. In the substrate 2. That is, the thickness ta 1 of the impregnation portion 43 is 90% or more of the thickness T of the fiber base material 2. Further, the impregnation portion 31 of the first resin layer 3 is impregnated into the fibrous base material 2. The impregnation portion 31 is impregnated into the fibrous base material 2 at a position from the surface (one surface) of the fibrous base material 2 covered by the covering portion 32 to 10% or less of the thickness of the fibrous base material 2. The thickness tb 1 of the impregnation portion 31 is 10% or less of the thickness T of the fiber base material 2. The impregnation portion 31 is impregnated with a region not impregnated by the impregnation portion 43. Further, the first impregnation portion 31 as a part of the first resin layer 3 and the second impregnation portion 43 as a part of the second resin layer 4 are located in the fiber base material 2. In the fiber base material 2, the first impregnation portion 31 (the lower surface of the first resin layer 3) is in contact with the second impregnation portion 43 (the upper surface of the second resin layer 4). Further, an interface F is formed at the boundary between the first impregnation portion 31 and the impregnation portion 43. The other aspects are the same as in Fig. 1.

如此,含浸部43遍及自經纖維基材2之被覆部42被覆之表面至纖維基材2之厚度之90%以上之位置而含浸於纖維基材2中,藉此可減少第2樹脂層4與第1樹脂層3之界面、與纖維基材2之交點。藉此,可防止自纖維基材2與第2樹脂層4之間進入之金屬離子於上述界面遷移。藉此,可提高電洞間之絕緣可靠性。此外,含浸部31遍及自經被覆部32被覆之纖維基材2之表面至纖維基材2之厚度之10%以下之位置而含浸於纖維基材2中,但含浸部31之含浸量僅為少量,故幾乎無需考慮含浸部31對纖維基材2之含浸性。因此,作為第1樹脂層3,只要選擇與金屬之密接性良好者即可,故而可擴大第1樹脂層3之設計範圍。又,如圖2所示,藉由於纖維基材2內部使第1樹脂層3與第2樹脂層4接觸,而可防止於第1樹脂層3及第2樹脂層4間產生剝離。即,藉由於織入之纖維基材2中含浸第1樹脂層3與第2樹脂層4,而使構成第1樹脂層3之第1樹脂組成物、構成第2樹脂層4之第2樹脂組成物卡在纖維基材2上,可防止於第1樹脂層3及第2樹脂層4間產生剝離。 In this manner, the impregnation portion 43 is impregnated into the fiber base material 2 from the surface covered by the covering portion 42 of the fiber base material 2 to 90% or more of the thickness of the fiber base material 2, whereby the second resin layer 4 can be reduced. The interface with the first resin layer 3 and the intersection with the fibrous base material 2. Thereby, metal ions entering between the fiber base material 2 and the second resin layer 4 can be prevented from migrating at the above interface. Thereby, the insulation reliability between the holes can be improved. Further, the impregnation portion 31 is impregnated into the fibrous base material 2 at a position from the surface of the fibrous base material 2 covered by the covering portion 32 to 10% or less of the thickness of the fibrous base material 2, but the impregnation amount of the impregnation portion 31 is only In a small amount, it is almost unnecessary to consider the impregnation property of the impregnation portion 31 with respect to the fibrous base material 2. Therefore, as the first resin layer 3, it is only necessary to select a good adhesion to the metal, so that the design range of the first resin layer 3 can be expanded. Moreover, as shown in FIG. 2, the first resin layer 3 and the second resin layer 4 are brought into contact with each other inside the fiber base material 2, whereby peeling between the first resin layer 3 and the second resin layer 4 can be prevented. In other words, the first resin composition constituting the first resin layer 3 and the second resin constituting the second resin layer 4 are impregnated with the first resin layer 3 and the second resin layer 4 by the woven fiber base material 2. The composition is caught on the fibrous base material 2 to prevent peeling between the first resin layer 3 and the second resin layer 4.

再者,第2樹脂層4遍及至纖維基材2之厚度之90%之位置而含浸於纖維基材2中的情況可以如下方式確認。算出纖維基材2之厚度之平均值T,算出該厚度之90%(數值C)。並且,只要自纖維基材2之另一面至第1樹脂層3與第2樹脂層4之界面F的距離之平均值D(測定10個部位)超過數值C即可。 In addition, the case where the second resin layer 4 is impregnated into the fiber base material 2 at a position 90% of the thickness of the fiber base material 2 can be confirmed as follows. The average value T of the thickness of the fiber base material 2 was calculated, and 90% of the thickness (value C) was calculated. Further, the average value D (measured at 10 locations) from the other surface of the fibrous base material 2 to the interface F between the first resin layer 3 and the second resin layer 4 may exceed the numerical value C.

又,為了於第1樹脂層3與第2樹脂層4之間形成界面F,詳細內容於下文說明,例如只要使第1樹脂層3之最低熔融黏度η1與第2樹脂層4之最低熔融黏度η2之比(η1/η2)為1.1倍以上,或於製造時將任一層以片狀供給至纖維基材2,並且將其他層以清漆狀供給至纖維基材2即可。 Further, in order to form the interface F between the first resin layer 3 and the second resin layer 4, the details will be described below. For example, the lowest melt viscosity η1 of the first resin layer 3 and the lowest melt viscosity of the second resin layer 4 may be used. The ratio η2 (η1/η2) is 1.1 times or more, or any layer may be supplied to the fiber base material 2 in a sheet form at the time of production, and the other layer may be supplied to the fiber base material 2 in the form of a varnish.

又,將第2樹脂層4之被覆部42之平均厚度設為ta[μm],將第1樹脂層3之中被覆纖維基材2之一面之部分之平均厚度設為tb[μm]時,較佳為ta大於tb。於預浸體1之表面(樹脂層3上)可以較高之加工性形成配線部。另一方面,第2樹脂層4可具有較高之可撓性及充分之厚度,因此於該第2樹脂層4中埋入其他預浸體1之配線部或其他纖維基材時,可確實地進行該埋入,即提高對其他預浸體1之配線部或其他纖維基材之埋入性。 Moreover, the average thickness of the covering portion 42 of the second resin layer 4 is t a [μm], and the average thickness of the portion of the first resin layer 3 covering the one surface of the fiber base material 2 is t b [μm] Preferably, t a is greater than t b . The wiring portion can be formed on the surface of the prepreg 1 (on the resin layer 3) with high workability. On the other hand, since the second resin layer 4 can have high flexibility and a sufficient thickness, when the wiring portion or other fiber substrate of the other prepreg 1 is embedded in the second resin layer 4, it can be confirmed. This embedding is performed to improve the embedding property of the wiring portion or other fibrous substrate of the other prepreg 1.

具體而言,平均厚度tb較佳為0.1~15 μm,更佳為1~10 μm。另一方面,平均厚度ta較佳為4~50 μm,更佳為8~40 μm。 Specifically, the average thickness t b is preferably from 0.1 to 15 μm, more preferably from 1 to 10 μm. On the other hand, the average thickness t a is preferably from 4 to 50 μm, more preferably from 8 to 40 μm.

再者,平均厚度ta及平均厚度tb可藉由以任意之間隔測定10個部位,算出其平均值而獲得。 Further, the average thickness t a and the average thickness t b can be obtained by measuring 10 points at arbitrary intervals and calculating the average value.

又,自25℃以3℃/min之升溫速度升溫時之50~150℃之範圍內的第1樹脂層3之最低熔融黏度(η1)與第2樹脂層4之最低熔融黏度(η2)之比η1/η2較佳為1.1以上、且100以下。再者,第1樹脂層3之最低熔融黏度(η1)高於第2樹脂層4之最低熔融黏度(η2)。藉此,可提高第2樹脂層4對纖維基材2之含浸性,並且防止第1樹脂層3大量含浸於纖維基材2中。又,藉由將最低熔融黏度比η1/η2設為1.1以上,可使第1樹脂層3與第2樹脂層4無法混合,而於第1樹脂層3及第2樹脂層4間形成界面。又,藉由將最低熔融黏度比η1/η2設為 100以下,尤其是設為80以下,具有提高界面之密接性之效果。最低熔融黏度之測定條件係如下所述。使用動態黏彈性測定裝置,於測定頻率62.83 rad/sec、升溫速度3℃/min、50~150℃之條件下進行計測。此處,具體而言,第1樹脂層3之最低熔融黏度η1較佳為1000 Pa.s以上、且25000 Pa.s以下。另一方面,第2樹脂層4之最低熔融黏度(η2)較佳為50 Pa.s以上、且10000 Pa.s以下,其中,為5000 Pa.s以下、進而為3000 Pa.s以下。較理想將第1樹脂層3之最低熔融黏度(η1)設為第2樹脂層4之最低熔融黏度(η2)之1.1倍以上,並且將各樹脂層之最低熔融黏度設為上述範圍,藉此可容易地製造第2樹脂層4至少遍及至纖維基材2之厚度之90%之位置而含浸於纖維基材2中的預浸體。 Further, the lowest melt viscosity (η1) of the first resin layer 3 and the lowest melt viscosity (η2) of the second resin layer 4 in the range of 50 to 150 ° C when the temperature is raised at a temperature increase rate of 3 ° C/min at 25 ° C The ratio η1/η2 is preferably 1.1 or more and 100 or less. Further, the lowest melt viscosity (η1) of the first resin layer 3 is higher than the lowest melt viscosity (η2) of the second resin layer 4. Thereby, the impregnation property of the second resin layer 4 with respect to the fiber base material 2 can be improved, and the first resin layer 3 can be prevented from being impregnated into the fiber base material 2 in a large amount. In addition, when the lowest melt viscosity ratio η1/η2 is 1.1 or more, the first resin layer 3 and the second resin layer 4 cannot be mixed, and an interface is formed between the first resin layer 3 and the second resin layer 4. Also, by setting the lowest melt viscosity ratio η1/η2 100 or less, especially 80 or less, has the effect of improving the adhesiveness of an interface. The measurement conditions of the lowest melt viscosity are as follows. The measurement was carried out under the conditions of a measurement frequency of 62.83 rad/sec, a temperature increase rate of 3 ° C/min, and 50 to 150 ° C using a dynamic viscoelasticity measuring apparatus. Here, specifically, the lowest melt viscosity η1 of the first resin layer 3 is preferably 1000 Pa. s above, and 25000 Pa. s below. On the other hand, the lowest melt viscosity (η2) of the second resin layer 4 is preferably 50 Pa. Above s, and 10000 Pa. s below, of which, is 5000 Pa. s below, and further 3000 Pa. s below. It is preferable that the lowest melt viscosity (η1) of the first resin layer 3 is 1.1 times or more the lowest melt viscosity (η2) of the second resin layer 4, and the lowest melt viscosity of each resin layer is set to the above range. The prepreg in which the second resin layer 4 is impregnated into the fiber base material 2 at least 90% of the thickness of the fiber base material 2 can be easily produced.

進而,本實施形態之預浸體1較佳為亦滿足以下特性。依據IPC-TM-650法2.3.17,於171±3℃、1380±70 kPa之條件下加熱加壓5分鐘而測得之樹脂流動率為15重量%以上、且50重量%以下,於以對向之一對橡膠板夾持該預浸體1之狀態下,於120℃、2.5 MPa之條件下進行加熱及加壓時,俯視下自纖維基材2之外緣露出之樹脂層之重量(第1樹脂層3及第2樹脂層4之合計重量)相對於第1樹脂層3整體及第2樹脂層4整體之合計重量為5%以下,上述橡膠板滿足下述(i)~(iii)。 Further, it is preferable that the prepreg 1 of the present embodiment also satisfies the following characteristics. According to the IPC-TM-650 method 2.3.17, the resin flow rate measured under conditions of 171±3° C. and 1380±70 kPa for 5 minutes is 15% by weight or more and 50% by weight or less. The weight of the resin layer exposed from the outer edge of the fibrous base material 2 in a plan view when heated and pressurized at 120 ° C and 2.5 MPa in a state in which the pair of rubber sheets are sandwiched between the pair of rubber sheets (the total weight of the first resin layer 3 and the second resin layer 4) is 5% or less based on the total weight of the entire first resin layer 3 and the entire second resin layer 4, and the rubber sheet satisfies the following (i) to (() Iii).

(i)依據JIS K 6253 A測得之橡膠硬度為60° (i) The rubber hardness measured according to JIS K 6253 A is 60°

(ii)厚度為3 mm (ii) thickness is 3 mm

(iii)材質為矽 (iii) Material is 矽

藉由將依據IPC-TM-650法2.3.17,於171±3℃、1380±70 kPa之條件下加熱加壓5分鐘而測得之樹脂流動率設為15重量%以上,可獲得電路之埋入性優異之預浸體。又,藉由將樹脂流動率之上 限設為50重量%以下,於對預浸體進行積層壓製時,可抑制樹脂層自預浸體之流出。因此,可製成積層於內層電路基板13等核心層(參照圖5)上時內層電路基板13之電路之埋入性優異,且於積層壓製時可抑制樹脂層自預浸體流出的增層用預浸體。進而,於以對向之一對橡膠板夾持預浸體1之狀態下,於120℃、2.5 MPa之條件下加熱及加壓時,將俯視下自纖維基材2之外緣露出之樹脂層之重量設為5重量%以下,藉此可提高所獲得之積層板之厚度均勻性。因此,可實現積層於內層電路基板13上時內層電路基板13之電路之埋入性優異,於積層壓製時可抑制樹脂層自預浸體流出,且可提高厚度均勻性的預浸體。再者,於以對向之一對橡膠板夾持預浸體1之狀態下,於120℃、2.5 MPa之條件下加熱及加壓時,俯視下自纖維基材2之外緣露出之樹脂層之重量之下限值並無特別限定,例如為0.1重量%。 By using the IPC-TM-650 method 2.3.17, the resin flow rate measured under conditions of 171±3° C. and 1380±70 kPa for 5 minutes is 15% by weight or more, and the circuit can be obtained. A prepreg with excellent embedding properties. Again, by above the resin flow rate When the thickness is 50% by weight or less, when the prepreg is laminated, the outflow of the resin layer from the prepreg can be suppressed. Therefore, when the core layer (see FIG. 5) such as the inner layer circuit board 13 is laminated, the circuit of the inner layer circuit board 13 is excellent in embedding property, and when the laminate is pressed, the resin layer can be prevented from flowing out of the prepreg. The prepreg is used for layering. Further, when the prepreg 1 is sandwiched between the pair of rubber sheets, the resin is exposed from the outer edge of the fiber substrate 2 in plan view when heated and pressurized at 120 ° C and 2.5 MPa. The weight of the layer is set to 5% by weight or less, whereby the thickness uniformity of the obtained laminate can be improved. Therefore, it is possible to achieve excellent embedding property of the circuit of the inner layer circuit board 13 when laminated on the inner layer circuit board 13, and to prevent the resin layer from flowing out of the prepreg during lamination pressing, and to improve the thickness uniformity of the prepreg. . Further, when the prepreg 1 is sandwiched between the pair of rubber sheets, the resin exposed from the outer edge of the fiber substrate 2 in plan view is heated and pressurized at 120 ° C and 2.5 MPa. The lower limit of the weight of the layer is not particularly limited and is, for example, 0.1% by weight.

此處,為了分別獲得具有上述特性之第1樹脂層3及第2樹脂層4,第1樹脂組成物及第2樹脂組成物較佳為設為如下組成。 Here, in order to obtain the first resin layer 3 and the second resin layer 4 having the above characteristics, the first resin composition and the second resin composition are preferably configured as follows.

第1樹脂組成物係例如含有熱硬化性樹脂,視需要含有硬化助劑(例如硬化劑、硬化促進劑等)及無機填充材料中之至少1種而構成。 The first resin composition contains, for example, a thermosetting resin, and optionally contains at least one of a curing aid (for example, a curing agent, a curing accelerator, and the like) and an inorganic filler.

為了提高與構成配線部之金屬之密接性,可列舉如下方法:使用與金屬之密接性優異之熱硬化性樹脂的方法、使用提高與金屬之密接性之硬化助劑(例如硬化劑、硬化促進劑等)的方法、使用可溶於酸者作為無機填充材料的方法、併用無機填充材料與有機填充材料之方法、及使用特定之熱可塑性樹脂之方法等。 In order to improve the adhesion to the metal constituting the wiring portion, a method of using a thermosetting resin having excellent adhesion to metal, and a curing aid for improving adhesion to a metal (for example, a curing agent or a hardening promotion) may be mentioned. A method of using a solvent, etc., a method of using an acid-soluble material as an inorganic filler, a method of using an inorganic filler and an organic filler, and a method of using a specific thermoplastic resin.

該熱硬化性樹脂中,例如可適宜地使用:脲(urea)樹脂、三聚氰胺樹脂、雙馬來醯亞胺樹脂、聚胺基甲酸酯樹脂、具有苯并 環之樹脂、氰酸酯樹脂、雙酚S型環氧樹脂、雙酚F型環氧樹脂及雙酚S與雙酚F之共聚合環氧樹脂等環氧樹脂等。於該等之中,可使用任1種以上。又,於該等之中,熱硬化性樹脂尤佳為使用氰酸酯樹脂(含有氰酸酯樹脂之預聚物)。 In the thermosetting resin, for example, urea (urea) resin, melamine resin, bismaleimide resin, polyurethane resin, and benzoic acid can be suitably used. An epoxy resin such as a ring resin, a cyanate resin, a bisphenol S type epoxy resin, a bisphenol F type epoxy resin, and a copolymerized epoxy resin of bisphenol S and bisphenol F. Any one or more of these may be used. Further, among these, a thermosetting resin is preferably a cyanate resin (prepolymer containing a cyanate resin).

該氰酸酯樹脂例如可藉由使鹵化氰化合物與酚類反應,視需要以加熱等方法進行預聚物化而獲得。 The cyanate resin can be obtained, for example, by reacting a halogenated cyanide compound with a phenol, and if necessary, prepolymerizing by heating or the like.

作為具體之氰酸酯樹脂,例如可列舉:酚醛清漆型氰酸酯樹脂、雙酚A型氰酸酯樹脂、雙酚E型氰酸酯樹脂、四甲基雙酚F型氰酸酯樹脂等雙酚型氰酸酯樹脂等。於該等之中,可使用任1種以上。亦於該等之中,氰酸酯樹脂較佳為酚醛清漆型氰酸酯樹脂。 Specific examples of the cyanate resin include a novolak type cyanate resin, a bisphenol A type cyanate resin, a bisphenol E type cyanate resin, and a tetramethylbisphenol F type cyanate resin. A bisphenol type cyanate resin or the like. Any one or more of these may be used. Among these, the cyanate resin is preferably a novolac type cyanate resin.

若使用酚醛清漆型氰酸酯樹脂,則於製作下述基板10(參照圖5)之後,硬化後之第1樹脂層3中交聯密度增加,因此可謀求提高硬化後之第1樹脂層3(所獲得之基板)之耐熱性及難燃性。 When a novolac type cyanate resin is used, the crosslinking density of the first resin layer 3 after curing is increased after the substrate 10 (see FIG. 5) described below is produced. Therefore, the cured first resin layer 3 can be obtained. Heat resistance and flame retardancy of the obtained substrate.

此處,可認為耐熱性之提高係由酚醛清漆型氰酸酯樹脂於硬化反應後形成三環而引起。又,認為難燃性之提高係由以下原因引起:酚醛清漆型氰酸酯樹脂於其構造方面苯環之比例較高,而該苯環容易碳化(石墨化),會於硬化後之第1樹脂層3中產生碳化部分。 Here, it can be considered that the improvement in heat resistance is formed by a novolac type cyanate resin after the hardening reaction. Caused by the ring. Further, it is considered that the improvement of the flame retardancy is caused by the fact that the novolac type cyanate resin has a high proportion of the benzene ring in its structure, and the benzene ring is easily carbonized (graphitized), and will be the first after hardening. A carbonized portion is produced in the resin layer 3.

進而,若使用酚醛清漆型氰酸酯樹脂,則即便於使預浸體1薄型化(例如,厚度35 μm以下)之情形時,亦可對預浸體1賦予優異之剛性。又,該硬化物於加熱時之剛性亦優異,因此所獲得之基板10於安裝半導體元件500(參照圖6)時之可靠性亦優異。具體而言,可使用式(I)所表示之酚醛清漆型氰酸酯樹脂。 Further, when a novolac type cyanate resin is used, even when the prepreg 1 is made thinner (for example, having a thickness of 35 μm or less), the prepreg 1 can be provided with excellent rigidity. Moreover, since the cured product is excellent in rigidity at the time of heating, the obtained substrate 10 is also excellent in reliability when the semiconductor element 500 (see FIG. 6) is mounted. Specifically, a novolac type cyanate resin represented by the formula (I) can be used.

[化1] [Chemical 1]

於式(I)所表示之酚醛清漆型氰酸酯樹脂中,其平均重複單位數「n」並無特別限定,較佳為1~10,更佳為2~7。若平均重複單位數「n」未滿上述下限值,則酚醛清漆型氰酸酯樹脂變得容易結晶化,因此於通用溶劑中之溶解性降低。因此,根據酚醛清漆型氰酸酯樹脂之含量等而存在變得難以使用第1樹脂組成物之情形。又,存在於製作預浸體1之情形時產生黏性,預浸體1彼此接觸時相互附著,或產生一預浸體1之第1樹脂組成物轉移至其他預浸體1之現象(轉印)的情形。另一方面,若平均重複單位數「n」超過上述上限值,則存在第1樹脂組成物之黏度變得過高,製作預浸體1時之效率(第1樹脂層3之成形性)降低之情形。 In the novolac type cyanate resin represented by the formula (I), the average repeating unit number "n" is not particularly limited, but is preferably 1 to 10, more preferably 2 to 7. When the average repeating unit number "n" is less than the above lower limit value, the novolac type cyanate resin is easily crystallized, and thus the solubility in a general-purpose solvent is lowered. Therefore, it is difficult to use the first resin composition depending on the content of the novolac type cyanate resin or the like. Further, there is a phenomenon in which the viscous property is generated when the prepreg 1 is produced, the first prepreg 1 is adhered to each other, or the first resin composition of the prepreg 1 is transferred to the other prepreg 1 (transfer) The case of India). On the other hand, when the average number of repeating units "n" exceeds the above upper limit, the viscosity of the first resin composition becomes too high, and the efficiency of the prepreg 1 is formed (formability of the first resin layer 3). Reduce the situation.

又,於併用提高與金屬之密接性之硬化劑或硬化促進劑之情形時,除上述熱硬化性樹脂以外,例如亦可使用:酚系酚醛清漆樹脂、甲酚酚醛清漆樹脂、雙酚A酚醛清漆樹脂等酚醛清漆型酚系樹脂,未改質之酚醛樹脂(resole phenolic resin)、經桐油、亞麻仁油、核桃油等改質之油改質酚醛樹脂等酚醛型酚系樹脂等酚系樹脂,雙酚A環氧樹脂、雙酚F環氧樹脂等雙酚型環氧樹脂,酚醛清漆環氧樹脂、甲酚酚醛清漆環氧樹脂等酚醛清漆型環氧樹脂,聯苯型環氧樹脂等環氧樹脂,不飽和聚酯樹脂、酞酸二烯丙酯樹脂、聚矽氧樹脂等其他熱硬化性樹脂。於該等之中,可使用任1種以上。 Further, when a curing agent or a curing accelerator for improving adhesion to a metal is used in combination, in addition to the above thermosetting resin, for example, a phenol novolak resin, a cresol novolak resin, or a bisphenol A phenol aldehyde may be used. A phenolic resin such as a novolak type phenol resin such as a varnish resin, a resole phenolic resin, a modified phenol resin such as tung oil, linseed oil or walnut oil, and the like, and a phenol resin such as a phenolic phenol resin , bisphenol type epoxy resin such as bisphenol A epoxy resin, bisphenol F epoxy resin, novolak type epoxy resin such as novolak epoxy resin, cresol novolac epoxy resin, biphenyl type epoxy resin, etc. Other thermosetting resins such as epoxy resin, unsaturated polyester resin, diallyl phthalate resin, and polyoxyn resin. Any one or more of these may be used.

熱硬化性樹脂之含量並無特別限定,較佳為第1樹脂組成物整體之5~50重量%,更佳為10~40重量%。若熱硬化性樹脂之含量未滿上述下限值,則根據熱硬化性樹脂之種類等,存在第1樹脂組成物之清漆之黏度變得過低,而難以形成預浸體1之情形。另一方面,若熱硬化性樹脂之含量超過上述上限值,則由於其他成分之量變得過少,故而根據熱硬化性樹脂之種類等,存在預浸體1之機械強度降低之情形。再者,於本說明書中,樹脂組成物之情形係指除去溶劑者,將溶劑以外之成分設為100重量份,而規定各成分之含量。 The content of the thermosetting resin is not particularly limited, but is preferably 5 to 50% by weight, and more preferably 10 to 40% by weight based on the entire first resin composition. When the content of the thermosetting resin is less than the above-mentioned lower limit, the viscosity of the varnish of the first resin composition may be too low depending on the type of the thermosetting resin, and it may be difficult to form the prepreg 1 . On the other hand, when the content of the thermosetting resin is more than the above-mentioned upper limit, the amount of the other components is too small, and the mechanical strength of the prepreg 1 may be lowered depending on the type of the thermosetting resin or the like. In the present specification, the case of the resin composition means that the solvent is removed, and the components other than the solvent are made into 100 parts by weight, and the content of each component is specified.

作為上述硬化助劑(例如硬化劑、硬化促進劑等),例如可列舉:三乙基胺、三丁胺、二吖雙環[2,2,2]辛烷等三級胺類,2-乙-4-乙基咪唑、2-苯-4-甲咪唑、2-苯-4-甲-5-羥甲咪唑、2-苯-4,5-二羥甲咪唑、2,4-二胺-6-[2'-甲咪唑-(1')]-乙-對稱三、2,4-二胺-6-(2'-十一基咪唑)-乙-對稱三、2,4-二胺-6-[2'-乙-4-甲咪唑-(1')]-乙-對稱三、1-苄-2-苯咪唑等咪唑化合物。於該等之中,可使用任1種以上。 Examples of the above-mentioned curing aid (for example, a curing agent, a curing accelerator, and the like) include tertiary amines such as triethylamine, tributylamine, and diazepam [2,2,2]octane, and 2-B. 4-ethylimidazole, 2-benzene-4-methylimidazole, 2-phenyl-4-methyl-5-hydroxymyimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2,4-diamine- 6-[2'-methimidazole-(1')]-B-symmetric three 2,4-Diamine-6-(2'-undecylimidazole)-B-symmetric three 2,4-Diamine-6-[2'-ethyl-4-methylimidazolium-(1')]-B-symmetric three An imidazole compound such as 1-benzyl-2-benzimidazole. Any one or more of these may be used.

於該等之中,硬化助劑較佳為選自如下咪唑化合物中之1種以上,該咪唑化合物具有2個以上選自脂肪族烴基、芳香族烴基、羥烷基及氰基烷基中之官能基,其中,更佳為2-苯-4,5-二羥甲咪唑。 Among these, the curing aid is preferably one or more selected from the group consisting of an aliphatic compound having an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a hydroxyalkyl group, and a cyanoalkyl group selected from the group consisting of an aliphatic hydrocarbon group, an aromatic hydrocarbon group, and a hydroxyalkyl group. A functional group, more preferably 2-benzene-4,5-dihydroxymethane.

又,第1樹脂組成物中,可組合使用例如:環烷酸鋅、環烷酸鈷、辛酸錫、辛酸鈷、雙乙醯丙酮鈷(II)、三乙醯丙酮鈷(III)等有機金屬鹽,苯酚、雙酚A、壬酚等酚化合物,乙酸、苯甲酸、水楊酸、對甲苯磺酸等有機酸等。於該等之中,可使用任1種以上。 Further, in the first resin composition, for example, an organic metal such as zinc naphthenate, cobalt naphthenate, tin octylate, cobalt octoate, acetoacetate cobalt (II), or triethyl sulfonium cobalt (III) may be used in combination. A salt, a phenol compound such as phenol, bisphenol A or indophenol, an organic acid such as acetic acid, benzoic acid, salicylic acid or p-toluenesulfonic acid. Any one or more of these may be used.

於使用硬化助劑之情形時,其含量較佳為第1樹脂組成物整體之0.01~3重量%,更佳為0.1~1重量%。 When the curing aid is used, the content thereof is preferably from 0.01 to 3% by weight, more preferably from 0.1 to 1% by weight, based on the total of the first resin composition.

又,第1樹脂組成物較佳為含有無機填充材料。藉此, 即便使預浸體1薄型化(例如,厚度35 μm以下),亦可獲得機械強度優異之預浸體1。進而,亦可提高預浸體1之低熱膨脹性。 Further, the first resin composition preferably contains an inorganic filler. With this, Even if the prepreg 1 is made thinner (for example, having a thickness of 35 μm or less), the prepreg 1 having excellent mechanical strength can be obtained. Further, the low thermal expansion property of the prepreg 1 can be improved.

作為無機填充材料,例如可列舉:滑石、氧化鋁、玻璃、如熔融二氧化矽之二氧化矽、雲母、氫氧化鋁、氫氧化鎂等。於該等之中,可使用任1種以上。又,根據無機填充材料之使用目的,可適當選擇破碎狀、球狀者。於該等之中,就低熱膨脹性優異之觀點而言,無機填充劑較佳為二氧化矽,更佳為熔融二氧化矽(尤其是球狀熔融二氧化矽)。 Examples of the inorganic filler include talc, alumina, glass, cerium oxide such as molten cerium oxide, mica, aluminum hydroxide, magnesium hydroxide, and the like. Any one or more of these may be used. Further, depending on the purpose of use of the inorganic filler, a crushed or spherical shape can be appropriately selected. Among these, the inorganic filler is preferably cerium oxide, and more preferably molten cerium oxide (especially spherical molten cerium oxide) from the viewpoint of excellent low thermal expansion property.

無機填充材料之平均粒徑較佳為0.01~5.0 μm,更佳為0.2~2.0 μm。再者,該平均粒徑為d50,可藉由如下方式計測。藉由超音波使無機填充材料分散於水中,利用動態光散射式粒度分佈測定裝置(HORIBA公司製造,LB-550)以體積基準測定無機填充材料之粒度分佈,將其中數半徑設為平均粒徑。 The average particle diameter of the inorganic filler is preferably from 0.01 to 5.0 μm, more preferably from 0.2 to 2.0 μm. Further, the average particle diameter is d 50 and can be measured by the following method. The inorganic filler was dispersed in water by ultrasonic waves, and the particle size distribution of the inorganic filler was measured by a dynamic light scattering type particle size distribution measuring apparatus (HL-550, manufactured by HORIBA, Inc.), and the radius was set as the average particle diameter. .

尤其是作為無機填充材料,較佳為平均粒徑為5.0 μm以下之球狀熔融二氧化矽。 In particular, as the inorganic filler, spherical molten cerium oxide having an average particle diameter of 5.0 μm or less is preferable.

又,為了提高第1樹脂層3與配線部之密接性,作為無機填充材料,亦可使用可溶於酸之無機填充材料。藉此,於利用鍍敷法使配線部(導體層)形成於第1樹脂層3上之情形時,可提高該配線部對第1樹脂層3之密接性(鍍敷密接性)。作為可溶於該酸之無機填充材料,例如可列舉碳酸鈣、氧化鋅、氧化鐵等金屬氧化物等。 Further, in order to improve the adhesion between the first resin layer 3 and the wiring portion, an inorganic filler which is soluble in acid may be used as the inorganic filler. When the wiring portion (conductor layer) is formed on the first resin layer 3 by the plating method, the adhesion of the wiring portion to the first resin layer 3 (plating adhesion) can be improved. Examples of the inorganic filler which is soluble in the acid include metal oxides such as calcium carbonate, zinc oxide, and iron oxide.

又,為了提高第1樹脂層3與配線部之密接性,亦可併用無機填充材料與有機填充材料。作為該有機填充材料,例如可列舉液晶聚合物、聚醯亞胺等樹脂系填充材料。 Further, in order to improve the adhesion between the first resin layer 3 and the wiring portion, an inorganic filler and an organic filler may be used in combination. Examples of the organic filler include a resin-based filler such as a liquid crystal polymer or a polyimide.

於使用無機填充材料之情形時,其含量並無特別限定, 較佳為第1樹脂組成物整體之20~70重量%,更佳為30~60重量%。 In the case of using an inorganic filler, the content thereof is not particularly limited. It is preferably 20 to 70% by weight, and more preferably 30 to 60% by weight based on the entire first resin composition.

於使用氰酸酯樹脂(尤其是酚醛清漆型氰酸酯樹脂)作為熱硬化性樹脂之情形時,較佳為併用環氧樹脂(實質上不含鹵素原子)。作為該環氧樹脂,例如可列舉酚系酚醛清漆型環氧樹脂、雙酚型環氧樹脂、萘型環氧樹脂、芳基伸烷基型環氧樹脂等。於該等之中,可使用任1種以上。 When a cyanate resin (particularly a novolak type cyanate resin) is used as the thermosetting resin, it is preferred to use an epoxy resin in combination (substantially free of halogen atoms). Examples of the epoxy resin include a phenol novolak type epoxy resin, a bisphenol type epoxy resin, a naphthalene type epoxy resin, and an aryl alkylene type epoxy resin. Any one or more of these may be used.

於該等之中,環氧樹脂較佳為萘型環氧樹脂、芳基伸烷基型環氧樹脂中之任1者以上。藉由使用該等環氧樹脂,可提高硬化後之第1樹脂層3之吸濕焊接耐熱性(吸濕後之焊接耐熱性)及難燃性。 Among these, the epoxy resin is preferably one or more of a naphthalene type epoxy resin and an aryl alkylene type epoxy resin. By using these epoxy resins, the moisture-absorbing solder heat resistance (weld heat resistance after moisture absorption) and the flame retardancy of the first resin layer 3 after curing can be improved.

所謂萘型環氧樹脂,係指重複單位中具有萘骨架者。作為萘型環氧樹脂,較佳為萘酚型環氧樹脂、萘二酚型環氧樹脂、2官能至4官能之環氧型萘樹脂、伸萘基醚型環氧樹脂等。於該等之中,可使用任1種以上。藉此,可進一步提高耐熱性、低熱膨脹性。又,與苯環相比,萘環之π-π堆疊效果較高,因此尤其是低熱膨脹性、低熱收縮性優異。進而,由於為多環構造故而剛直效果較高,玻璃轉移溫度尤其高,因此迴焊前後之熱收縮變化較小。作為萘酚型環氧樹脂,例如可以下述通式(VII-1)表示,作為萘二酚型環氧樹脂,可以下述式(VII-2)表示,作為2官能至4官能之環氧型萘樹脂,可以下述式(VII-3)(VII-4)(VII-5)表示,作為伸萘基醚型環氧樹脂,例如可以下述通式(VII-6)表示,於該等之中,可使用任1種以上。其中,就低吸水、低熱膨脹之觀點而言,較佳為伸萘基醚型環氧樹脂。所謂伸萘基醚型環氧樹脂,係指具有萘骨架經由氧原子與其他伸芳基構造鍵結而成之構造的環氧樹脂。 The naphthalene type epoxy resin refers to a group having a naphthalene skeleton in a repeating unit. The naphthalene type epoxy resin is preferably a naphthol type epoxy resin, a naphthalene diphenol type epoxy resin, a bifunctional to tetrafunctional epoxy type naphthalene resin, or a naphthyl ether type epoxy resin. Any one or more of these may be used. Thereby, heat resistance and low thermal expansion property can be further improved. Further, since the naphthalene ring has a higher π-π stacking effect than the benzene ring, it is particularly excellent in low thermal expansion property and low heat shrinkage property. Further, since the rigidity of the multi-ring structure is high and the glass transition temperature is particularly high, the change in heat shrinkage before and after the reflow is small. The naphthol type epoxy resin can be represented, for example, by the following formula (VII-1), and as the naphthalenediol type epoxy resin, it can be represented by the following formula (VII-2), and is a bifunctional to tetrafunctional epoxy. The naphthalene resin can be represented by the following formula (VII-3) (VII-4) (VII-5), and the stannaphthyl ether type epoxy resin can be represented, for example, by the following formula (VII-6). Any one or more of them may be used. Among them, a naphthyl ether type epoxy resin is preferred from the viewpoint of low water absorption and low thermal expansion. The stretched naphthyl ether type epoxy resin refers to an epoxy resin having a structure in which a naphthalene skeleton is bonded to another aryl group via an oxygen atom.

[化2] [Chemical 2]

(n表示平均1以上、且6以下之數,R表示環氧丙基或碳數1以上、且10以下之烴基;其中,任一個R為環氧丙基) (n represents an average of 1 or more and 6 or less, and R represents a glycidyl group or a hydrocarbon group having 1 or more carbon atoms and 10 or less; wherein any one of R is a glycidyl group)

(式中,R1表示氫原子或甲基,R2分別獨立地表示氫原子、碳原子數1~4之烷基、或芳烷基、或萘基、或含有縮水甘油醚基之萘基,o及m分別為0~2之整數,且o或m之任一者為1以上) (wherein R 1 represents a hydrogen atom or a methyl group, and R 2 each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an aralkyl group, or a naphthyl group, or a naphthyl group having a glycidyl ether group; , o and m are integers from 0 to 2, respectively, and either o or m is 1 or more)

作為伸萘基醚型環氧樹脂,亦可使用例如以下之式(6)、(7)所示者。 As the stearyl ether type epoxy resin, for example, those shown by the following formulas (6) and (7) can also be used.

所謂芳基伸烷基型環氧樹脂,係指重複單位中具有一個以上芳基伸烷基之環氧樹脂,例如可列舉苯二甲型環氧樹脂、聯苯二亞甲基型環氧樹脂等。於該等之中,可使用任1種以上。又,於該等之中,芳基伸烷基型環氧樹脂較佳為聯苯二亞甲基型環氧樹脂。 The arylalkylene-type epoxy resin is an epoxy resin having one or more arylalkylene groups in the repeating unit, and examples thereof include a phthalic epoxy resin and a biphenyl dimethylene epoxy resin. Any one or more of these may be used. Further, among these, the arylalkylene type epoxy resin is preferably a biphenyl dimethylene type epoxy resin.

具體而言,可使用式(II)所表示之聯苯二亞甲基型環氧樹脂。 Specifically, a biphenyl dimethylene type epoxy resin represented by the formula (II) can be used.

式(II)所表示之聯苯二亞甲基型環氧樹脂之平均重複單位數「n」並無特別限定,較佳為1~10,更佳為2~5。若平均重複單 位數「n」未滿上述下限值,則聯苯二亞甲基型環氧樹脂變得容易結晶化,因此於通用溶劑中之溶解性降低。因此,存在第1樹脂組成物之清漆變得難以操作之情形。另一方面,若平均重複單位數「n」超過上述上限值,則有根據所使用之溶劑,第1樹脂組成物之清漆之黏度上升之虞。於該情形時,無法使第1樹脂組成物充分地含浸於纖維基材2中,結果存在成為預浸體1之成形不良或機械強度降低之原因的情況。 The average repeating unit number "n" of the biphenyl dimethylene type epoxy resin represented by the formula (II) is not particularly limited, but is preferably 1 to 10, more preferably 2 to 5. If the average repeat When the number of bits "n" is less than the above lower limit, the biphenyl dimethylene type epoxy resin is easily crystallized, so that the solubility in a general-purpose solvent is lowered. Therefore, there is a case where the varnish of the first resin composition becomes difficult to handle. On the other hand, when the average repeating unit number "n" exceeds the above upper limit value, the viscosity of the varnish of the first resin composition rises depending on the solvent to be used. In this case, the first resin composition cannot be sufficiently impregnated into the fiber base material 2, and as a result, molding failure of the prepreg 1 or deterioration of mechanical strength may occur.

環氧樹脂之含量之下限並無特別限定,較佳為樹脂組成物整體之1重量%以上,尤佳為2重量%以上。若含量過小,則有氰酸酯樹脂之反應性降低,或所獲得之製品之耐濕性降低之情形。環氧樹脂之含量之上限並無特別限定,較佳為40重量%以下。若含量過大,則有耐熱性降低之情形。 The lower limit of the content of the epoxy resin is not particularly limited, but is preferably 1% by weight or more, and particularly preferably 2% by weight or more based on the entire resin composition. If the content is too small, the reactivity of the cyanate resin is lowered, or the moisture resistance of the obtained product is lowered. The upper limit of the content of the epoxy resin is not particularly limited, but is preferably 40% by weight or less. If the content is too large, heat resistance may be lowered.

環氧樹脂之重量平均分子量(Mw)之下限並無特別限定,較佳為Mw500以上,尤佳為Mw800以上。若Mw過小,則有樹脂層產生黏性之情形。Mw之上限並無特別限定,較佳為Mw20,000以下,尤佳為Mw15,000以下。若Mw過大,則存在製作絕緣樹脂層時,對纖維基材之含浸性降低,而無法獲得均勻之製品之情形。環氧樹脂之Mw例如可藉由凝膠滲透層析法(GPC,Gel Permeation Chromatography)而測定。 The lower limit of the weight average molecular weight (Mw) of the epoxy resin is not particularly limited, but is preferably Mw 500 or more, and particularly preferably Mw 800 or more. If the Mw is too small, there is a case where the resin layer is sticky. The upper limit of Mw is not particularly limited, and is preferably Mw 20,000 or less, and particularly preferably Mw 15,000 or less. When the Mw is too large, when the insulating resin layer is formed, the impregnation property to the fibrous base material is lowered, and a uniform product cannot be obtained. The Mw of the epoxy resin can be measured, for example, by gel permeation chromatography (GPC, Gel Permeation Chromatography).

進而,亦可於第1樹脂組成物中,添加如提高與金屬之密接性之成分(含有樹脂等)。作為該成分,例如可列舉:苯氧基樹脂、聚乙烯縮醛系樹脂、聚醯胺系樹脂之熱可塑性樹脂,較佳為含有該等中之任1種以上。於該等樹脂之中,就與金屬之密接性之觀點而言,較佳為含有苯氧基樹脂。進而,第1樹脂組成物較佳為含有偶合劑。 Further, a component (including a resin or the like) which improves adhesion to a metal may be added to the first resin composition. The thermoplastic resin of the phenoxy resin, the polyvinyl acetal resin, and the polyamidamide resin is preferably contained in the above-mentioned one or more. Among these resins, from the viewpoint of adhesion to metal, it is preferred to contain a phenoxy resin. Further, the first resin composition preferably contains a coupling agent.

作為苯氧基樹脂,例如可列舉:具有雙酚骨架之苯氧基 樹脂、具有萘骨架之苯氧基樹脂、具有聯苯骨架之苯氧基樹脂等。又,亦可使用具有複數種該等骨架之構造之苯氧基樹脂。作為苯氧基樹脂,於該等之中,可使用任1種以上。 As the phenoxy resin, for example, a phenoxy group having a bisphenol skeleton can be cited. A resin, a phenoxy resin having a naphthalene skeleton, a phenoxy resin having a biphenyl skeleton, or the like. Further, a phenoxy resin having a structure of a plurality of such skeletons may also be used. As the phenoxy resin, any one or more of them may be used.

於該等之中,苯氧基樹脂較佳為使用具有聯苯骨架及雙酚S骨架之苯氧基樹脂。藉此,可藉由聯苯骨架所具有之剛直性,而提高苯氧基樹脂之玻璃轉移溫度,並且可藉由存在雙酚S骨架,而提高苯氧基樹脂與金屬之密接性。其結果為,可謀求提高第1樹脂層3之耐熱性,並且可於製造多層基板時,提高配線部(金屬)對第1樹脂層3之密接性。 Among these, the phenoxy resin is preferably a phenoxy resin having a biphenyl skeleton and a bisphenol S skeleton. Thereby, the glass transition temperature of the phenoxy resin can be increased by the rigidity of the biphenyl skeleton, and the adhesion of the phenoxy resin to the metal can be improved by the presence of the bisphenol S skeleton. As a result, the heat resistance of the first resin layer 3 can be improved, and the adhesion between the wiring portion (metal) and the first resin layer 3 can be improved when the multilayer substrate is produced.

又,苯氧基樹脂較佳亦為使用具有雙酚A骨架及雙酚F骨架之苯氧基樹脂。藉此,可於製造多層基板時,進一步提高配線部對第1樹脂層3之密接性。 Further, the phenoxy resin is preferably a phenoxy resin having a bisphenol A skeleton and a bisphenol F skeleton. Thereby, when the multilayer substrate is manufactured, the adhesion of the wiring portion to the first resin layer 3 can be further improved.

苯氧基樹脂之分子量並無特別限定,重量平均分子量較佳為5,000~70,000,更佳為10,000~60,000。 The molecular weight of the phenoxy resin is not particularly limited, and the weight average molecular weight is preferably 5,000 to 70,000, more preferably 10,000 to 60,000.

於使用苯氧基樹脂之情形時,其含量並無特別限定,較佳為第1樹脂組成物整體之1~40重量%,更佳為5~30重量%。 In the case of using a phenoxy resin, the content thereof is not particularly limited, but is preferably 1 to 40% by weight, and more preferably 5 to 30% by weight based on the entire first resin composition.

聚乙烯縮醛系樹脂係利用甲醛或乙醛等羰基化合物將聚乙烯醇縮醛化而成的樹脂,作為聚乙烯縮醛系樹脂,例如可列舉聚乙烯甲醛或聚乙烯丁醛等。於該等之中,可使用任1種以上。就吸水性之觀點而言,聚乙烯縮醛樹脂之縮醛化度較佳為40%以上,就相溶性之觀點而言,較佳為80%以下。作為聚醯胺系樹脂,就耐熱性之觀點而言,可列舉芳香族系聚醯胺。又,就與導體層之密接性之觀點而言,聚醯胺系樹脂之重量平均分子量較佳為1.5萬以上。作為聚醯胺系樹脂,可列舉含有酚性羥基之芳香族聚醯胺-聚(丁二烯-丙烯腈)嵌段共 聚合體(例如,商品名KAYAFLEX BPAM-155(日本化藥,末端為醯胺基))。 The polyvinyl acetal resin is a resin obtained by acetalizing polyvinyl alcohol with a carbonyl compound such as formaldehyde or acetaldehyde. Examples of the polyvinyl acetal resin include polyethylene formaldehyde and polyvinyl butyral. Any one or more of these may be used. The degree of acetalization of the polyvinyl acetal resin is preferably 40% or more from the viewpoint of water absorbability, and is preferably 80% or less from the viewpoint of compatibility. As the polyamine-based resin, an aromatic polyamine can be cited from the viewpoint of heat resistance. Moreover, the weight average molecular weight of the polyamine-based resin is preferably 15,000 or more from the viewpoint of adhesion to the conductor layer. Examples of the polyamine-based resin include aromatic polyamine-poly(butadiene-acrylonitrile) blocks containing a phenolic hydroxyl group. Polymer (for example, trade name KAYAFLEX BPAM-155 (Japanese chemical, terminal is amidino)).

如以上之熱可塑性樹脂較佳為第1樹脂組成物整體之1~40重量%,更佳為10~30重量%。 The thermoplastic resin as described above is preferably from 1 to 40% by weight, more preferably from 10 to 30% by weight, based on the total of the first resin composition.

偶合劑較佳為使用例如選自環氧矽烷偶合劑、鈦酸酯系偶合劑、胺基矽烷偶合劑及矽油型偶合劑中之1種以上。 The coupling agent is preferably one or more selected from the group consisting of an epoxy cyclane coupling agent, a titanate coupling agent, an amino decane coupling agent, and an eucalyptus type coupling agent.

於使用偶合劑之情形時,其含量並無特別限定,相對於無機填充材料100重量份,較佳為0.05~3重量份,更佳為0.1~2重量份。 In the case of using a coupling agent, the content thereof is not particularly limited, and is preferably 0.05 to 3 parts by weight, more preferably 0.1 to 2 parts by weight, per 100 parts by weight of the inorganic filler.

又,第1樹脂組成物中,除以上所說明之成分以外,可視需要含有消泡劑、均染劑、顏料、抗氧化劑等添加劑。 Further, the first resin composition may contain an additive such as an antifoaming agent, a leveling agent, a pigment, or an antioxidant, in addition to the components described above.

第2樹脂組成物係設定為與第1樹脂組成物不同之組成,具體而言,設定為第2樹脂層4之埋入性變得優於第1樹脂層3,進而滿足上述物性的組成。 The second resin composition is set to have a composition different from that of the first resin composition, and specifically, the embedding property of the second resin layer 4 is set to be superior to that of the first resin layer 3, and the composition of the above physical properties is satisfied.

第2樹脂組成物之構成成分中,可使用與第1樹脂組成物中所舉出者相同者,但樹脂或填充材料等之種類及含量、樹脂之分子量(平均重複單位數)等不同。其結果為,第2樹脂層4具有與第1樹脂層3不同之特性。第2樹脂組成物例如含有上述之熱可塑性樹脂、熱硬化性樹脂、無機填充劑、硬化促進劑等。第2樹脂組成物例如含有上述之環氧樹脂、氰酸酯樹脂及無機填充材料。作為環氧樹脂,較佳為上述具有萘骨架且具有萘骨架經由氧原子與其他伸芳基構造鍵結而成之構造的環氧樹脂。此處,第2樹脂層4中所含之無機填充材料較佳為平均粒徑為5.0 μm以下之球狀熔融二氧化矽,更佳為平均粒徑為0.01~2.0 μm、尤其是平均粒徑為10~50 nm之球狀熔融二氧化矽。 藉由使用此種平均粒徑為50 nm以下之二氧化矽(奈米二氧化矽),可提高預浸體1之耐熱性。得知於使用平均粒徑50 nm以下之二氧化矽之情形時,二氧化矽分散於纖維基材2之股線中,並且樹脂成分亦滲透於股線中。藉此,可抑制預浸體1之纖維基材2之股線中形成空隙之情況,可提高預浸體1之耐熱性。又,第2樹脂組成物較佳為除了粒徑為50 nm以下之上述二氧化矽以外,亦含有平均粒徑為0.5~5 μm之二氧化矽。另一方面,對於第1樹脂組成物,為了形成微細之凹凸,提高與導體電路層之密接性,較佳為使用平均粒徑為0.5 μm~50 nm之二氧化矽。 The constituents of the second resin composition may be the same as those exemplified in the first resin composition, but the type and content of the resin or the filler, the molecular weight of the resin (the average number of repeating units), and the like are different. As a result, the second resin layer 4 has characteristics different from those of the first resin layer 3. The second resin composition contains, for example, the above-described thermoplastic resin, thermosetting resin, inorganic filler, curing accelerator, and the like. The second resin composition contains, for example, the above-described epoxy resin, cyanate resin, and inorganic filler. The epoxy resin is preferably an epoxy resin having a naphthalene skeleton and having a structure in which a naphthalene skeleton is bonded to another aryl group via an oxygen atom. Here, the inorganic filler contained in the second resin layer 4 is preferably a spherical molten cerium oxide having an average particle diameter of 5.0 μm or less, more preferably an average particle diameter of 0.01 to 2.0 μm, particularly an average particle diameter. It is a spherical molten cerium oxide of 10 to 50 nm. By using such cerium oxide (nano-cerium oxide) having an average particle diameter of 50 nm or less, the heat resistance of the prepreg 1 can be improved. It is known that in the case of using cerium oxide having an average particle diameter of 50 nm or less, cerium oxide is dispersed in the strands of the fibrous substrate 2, and the resin component is also infiltrated into the strands. Thereby, it is possible to suppress the formation of voids in the strands of the fiber base material 2 of the prepreg 1, and it is possible to improve the heat resistance of the prepreg 1. Further, the second resin composition preferably contains cerium oxide having an average particle diameter of 0.5 to 5 μm in addition to the above-mentioned cerium oxide having a particle diameter of 50 nm or less. On the other hand, in order to form fine concavities and convexities and to improve adhesion to the conductor circuit layer, it is preferable to use cerium oxide having an average particle diameter of 0.5 μm to 50 nm.

又,第2樹脂層4中之熱可塑性樹脂之含量低於第1樹脂層3中之熱可塑性樹脂之含量。藉此,可提高第2樹脂層4之電路之埋入性。另一方面,可使第1樹脂層3中之導體電路之密接性成為良好。具體而言,第2樹脂層4中之熱可塑性樹脂之含量為構成第2樹脂層4之第2樹脂組成物的10重量%以下,其中較佳為5重量%以下。但,第2樹脂層4亦可不含熱可塑性樹脂。 Further, the content of the thermoplastic resin in the second resin layer 4 is lower than the content of the thermoplastic resin in the first resin layer 3. Thereby, the embedding property of the circuit of the second resin layer 4 can be improved. On the other hand, the adhesion of the conductor circuit in the first resin layer 3 can be made good. Specifically, the content of the thermoplastic resin in the second resin layer 4 is 10% by weight or less, and preferably 5% by weight or less, of the second resin composition constituting the second resin layer 4. However, the second resin layer 4 may not contain a thermoplastic resin.

<預浸體之製造方法> <Method of Manufacturing Prepreg>

如以上之預浸體1使用圖3所示之製造裝置,可藉由如下方式製造。如圖3所示,製造裝置6具有輥621~628、噴嘴(作為吐出手段之模塗布機)611、及乾燥裝置64。 As the prepreg 1 described above, the manufacturing apparatus shown in Fig. 3 can be used as follows. As shown in FIG. 3, the manufacturing apparatus 6 has the rollers 621-628, the nozzle (the die coater as a discharge means) 611, and the drying apparatus 64.

輥621係送出成為第1樹脂層3之第1樹脂片材3'之手段,於該輥621上捲繞有附有支持體51之第1樹脂片材3'(圖3中,將包含支持體51及第1樹脂片材3'之片材設為片材5)。輥621係以利用未圖示之馬達(驅動源)而旋轉之方式構成,若該輥621旋轉,則自輥621送出包含第1樹脂片材3'之片材5。再者,作為支持體51,例如可 列舉金屬箔(金屬層)、樹脂薄膜等,於該等之中,較佳為金屬箔。金屬箔係例如加工成配線部(電路)等之部分。作為構成該金屬箔之金屬材料,例如可列舉:銅或銅系合金、鋁或鋁系合金、鐵或鐵系合金、不鏽鋼等。並且,作為構成金屬箔之金屬材料,於該等之中,導電性優異,容易藉由蝕刻而形成電路,又,就廉價之方面而言,較佳為銅或銅系合金。又,第1樹脂片材3'於50~150℃下之最低熔融黏度為1000 Pa.s以上、且25000 Pa.s以下。藉由如此將50~150℃下之最低熔融黏度設為1000 Pa.s以上,第1樹脂片材3'變得不易含浸於纖維基材2中。又,變得不易與第2樹脂層4混合。藉由將50~150℃下之最低熔融黏度設為25000 Pa.s以下,可確保與纖維基材2之密接性。再者,測定方法如上所述。 The roller 621 feeds the first resin sheet 3' which becomes the first resin layer 3, and the first resin sheet 3' to which the support 51 is attached is wound around the roller 621 (in FIG. 3, support is included) The sheet of the body 51 and the first resin sheet 3' is referred to as a sheet 5). The roller 621 is configured to rotate by a motor (drive source) (not shown), and when the roller 621 rotates, the sheet 5 including the first resin sheet 3' is fed from the roller 621. Furthermore, as the support 51, for example, A metal foil (metal layer), a resin film, etc. are mentioned, among these, a metal foil is preferable. The metal foil is processed, for example, into a portion such as a wiring portion (circuit). Examples of the metal material constituting the metal foil include copper or a copper alloy, aluminum or aluminum alloy, iron or iron alloy, and stainless steel. Further, among the metal materials constituting the metal foil, among them, conductivity is excellent, and it is easy to form a circuit by etching, and in terms of inexpensiveness, copper or a copper-based alloy is preferable. Further, the lowest melt viscosity of the first resin sheet 3' at 50 to 150 ° C is 1000 Pa. s above, and 25000 Pa. s below. By this, the lowest melt viscosity at 50 to 150 ° C is set to 1000 Pa. s or more, the first resin sheet 3' is less likely to be impregnated into the fibrous base material 2. Moreover, it becomes difficult to mix with the 2nd resin layer 4. By setting the lowest melt viscosity at 50~150 °C to 25000 Pa. Below s, the adhesion to the fiber base material 2 can be ensured. Furthermore, the measurement method is as described above.

又,輥623係送出纖維基材2之手段,於該輥623上捲繞有纖維基材2。輥623係以利用未圖示之馬達而旋轉之方式構成,若該輥623旋轉,則自輥623連續送出纖維基材2。 Further, the roller 623 is a means for feeding the fiber base material 2, and the fiber base material 2 is wound around the roll 623. The roller 623 is configured to rotate by a motor (not shown), and when the roller 623 rotates, the fiber base material 2 is continuously fed from the roller 623.

又,輥622係限制片材5之移動方向的手段,且設置於輥621之後段。 Further, the roller 622 is a means for restricting the moving direction of the sheet 5, and is provided in the subsequent stage of the roller 621.

又,輥624係限制纖維基材2之移動方向的手段,且設置於輥622之後段。 Further, the roller 624 is a means for restricting the moving direction of the fiber base material 2, and is provided in the subsequent stage of the roller 622.

又,輥625係使第1樹脂片材3'與纖維基材2貼合之手段,且設置於輥622及624之後段。沿該輥625之外周面,以與上述外周面接觸之方式搬送第1樹脂片材3'。此時,第1樹脂片材3'經由支持體51與輥625之圓周之1/4以上面接觸。又,纖維基材2亦沿輥625之外周面,以與上述外周面接觸之方式搬送。纖維基材2係於使輥625間接地與第1樹脂片材3'接觸之部位,經由第1樹脂片材3'與輥 625接觸。纖維基材2係沿輥625之外周面,以與上述外周面接觸之方式搬送。但,纖維基材2與輥625之接觸面積小於第1樹脂片材3'與輥625之接觸面積。又,纖維基材2及第1樹脂片材3'於搬送方向上拉伸,於該等上施加有張力。藉此,可利用輥625之外周面,而壓合第1樹脂片材3'與纖維基材2。藉由如此使用輥625壓合纖維基材2與第1樹脂片材3',可防止使第1樹脂片材3'過度地含浸於纖維基材2中。又,輥626及輥627係限制包含第1樹脂片材3'之片材5、纖維基材2、進而纖維基材2上之第2樹脂層4之移動方向的手段,且依序設置於輥625之後段。 Further, the roller 625 is a means for bonding the first resin sheet 3' to the fiber base material 2, and is provided in the subsequent stage of the rolls 622 and 624. The first resin sheet 3' is conveyed so as to be in contact with the outer peripheral surface of the outer peripheral surface of the roller 625. At this time, the first resin sheet 3' is in contact with the upper surface via the support 51 and the 1/4 of the circumference of the roller 625. Further, the fiber base material 2 is also conveyed so as to be in contact with the outer peripheral surface of the outer surface of the roller 625. The fiber base material 2 is a portion where the roller 625 is indirectly contacted with the first resin sheet 3', and passes through the first resin sheet 3' and the roller. 625 contact. The fiber base material 2 is conveyed so as to be in contact with the outer peripheral surface of the outer surface of the roll 625. However, the contact area between the fibrous base material 2 and the roller 625 is smaller than the contact area between the first resin sheet 3' and the roller 625. Further, the fiber base material 2 and the first resin sheet 3' are stretched in the conveying direction, and tension is applied thereto. Thereby, the first resin sheet 3' and the fiber base material 2 can be press-bonded by the outer peripheral surface of the roll 625. By pressing the fiber base material 2 and the first resin sheet 3' by the roller 625 as described above, it is possible to prevent the first resin sheet 3' from being excessively impregnated into the fiber base material 2. Further, the roller 626 and the roller 627 restrict the movement direction of the sheet 5 including the first resin sheet 3', the fiber base material 2, and the second resin layer 4 on the fiber base material 2, and are sequentially disposed on The next step of the roller 625.

又,輥628係捲取預浸體1之手段。輥628係以利用未圖示之馬達而旋轉之方式構成,若該輥628旋轉,則將預浸體1捲取至輥628上。 Further, the roller 628 is a means for winding the prepreg 1. The roller 628 is configured to rotate by a motor (not shown), and when the roller 628 is rotated, the prepreg 1 is wound onto the roller 628.

又,噴嘴611係於纖維基材2之與第1樹脂層3相反側之面,於常溫(25℃)下吐出(供給)液狀(清漆狀)之第2樹脂組成物的手段(例如,模塗布機)。再者,所謂液狀,並不限制於液體,為包含具有流動性者之概念。 In addition, the nozzle 611 is a means for discharging (supplying) a liquid (varnish-like) second resin composition at a normal temperature (25 ° C) on the surface of the fiber base material 2 opposite to the first resin layer 3 (for example, Mold coating machine). In addition, the liquid state is not limited to a liquid, and is a concept including a fluidity.

乾燥裝置64係設置於噴嘴611與輥626之間。作為乾燥裝置64,於本實施形態中,可使用一面水平地搬送對象物一面進行乾燥者。藉此,可使對纖維基材2施加之張力變得相對較小,可防止或抑制內部扭曲。 The drying device 64 is disposed between the nozzle 611 and the roller 626. In the present embodiment, the drying device 64 can be dried while the object is horizontally conveyed. Thereby, the tension applied to the fibrous base material 2 can be made relatively small, and internal distortion can be prevented or suppressed.

(第1步驟) (Step 1)

如圖3所示,使製造裝置6之輥621旋轉,自該輥621連續地送出包含第1樹脂片材3'之片材5,又,使輥623旋轉,自該輥623送出(連續地供給)纖維基材2,並且使輥628旋轉,將預浸體1捲取至該輥 628上。 As shown in FIG. 3, the roll 621 of the manufacturing apparatus 6 is rotated, the sheet 5 containing the first resin sheet 3' is continuously fed from the roll 621, and the roll 623 is rotated and sent out from the roll 623 (continuously The fiber substrate 2 is supplied, and the roller 628 is rotated to wind the prepreg 1 to the roller 628.

第1樹脂片材3'成為B階狀態。繼而,於輥625上壓合第1樹脂片材3'與纖維基材2。 The first resin sheet 3' is in a B-stage state. Then, the first resin sheet 3' and the fiber base material 2 are press-bonded to the roll 625.

此時之第1樹脂片材3'與纖維基材2所成之角之角度(貼合角度)θ較佳為銳角。藉此,可防止或抑制纖維基材2發生變形。 At this time, the angle (bonding angle) θ of the angle formed by the first resin sheet 3' and the fiber base material 2 is preferably an acute angle. Thereby, deformation of the fiber base material 2 can be prevented or suppressed.

又,纖維基材2側之張力較佳為小於第1樹脂片材3'側之張力。具體而言,纖維基材2側之張力較佳為30 N以下,更佳為15~25 N左右。藉此,可防止或抑制纖維基材2之尺寸變化或內部變形。再者,如圖2所示,於使第1樹脂層3含浸於纖維基材2中之情形時,調整第1樹脂片材3'之張力,可使第1樹脂層含浸於纖維基材2中。 Further, the tension on the side of the fiber base material 2 is preferably smaller than the tension on the side of the first resin sheet 3'. Specifically, the tension on the side of the fiber base material 2 is preferably 30 N or less, more preferably about 15 to 25 N. Thereby, the dimensional change or internal deformation of the fibrous base material 2 can be prevented or suppressed. Further, as shown in FIG. 2, when the first resin layer 3 is impregnated into the fiber base material 2, the tension of the first resin sheet 3' is adjusted, and the first resin layer can be impregnated into the fiber base material 2. in.

(第2步驟) (Step 2)

繼而,自噴嘴611吐出含有第2樹脂組成物之清漆,向纖維基材2之與第1樹脂片材3'相反側之面供給該清漆。 Then, the varnish containing the second resin composition is discharged from the nozzle 611, and the varnish is supplied to the surface of the fiber base material 2 opposite to the first resin sheet 3'.

(第3步驟(乾燥步驟)) (Step 3 (drying step))

繼而,利用乾燥裝置64,使第1樹脂片材3'及含有第2樹脂組成物之清漆加熱乾燥。藉此,獲得預浸體1。該預浸體1係捲取至輥628上。再者,如圖2所示,於使第1樹脂層含浸於纖維基材2中之情形時,亦可於該乾燥步驟中,使第1樹脂層含浸於纖維基材2中。 Then, the first resin sheet 3' and the varnish containing the second resin composition are heated and dried by the drying device 64. Thereby, the prepreg 1 is obtained. The prepreg 1 is taken up onto a roller 628. Further, as shown in FIG. 2, when the first resin layer is impregnated into the fibrous base material 2, the first resin layer may be impregnated into the fibrous base material 2 in the drying step.

作為乾燥條件,並無特別限定,可根據第1樹脂組成物及第2樹脂組成物之組成(尤其是第2樹脂組成物之組成)或各條件而適當設定,較佳為以使第2樹脂組成物中之揮發成分相對於樹脂成為1.5 wt%以下之方式設定,更佳為以成為0.8~1.0 wt%左右之方式設定。具體而言,乾燥溫度較佳為100~150℃,更佳為100~130℃左右。又,乾燥時間較佳為2~10分鐘左右,更佳為2~5分鐘左右。 The drying conditions are not particularly limited, and may be appropriately set depending on the composition of the first resin composition and the second resin composition (especially the composition of the second resin composition) or each condition, and it is preferable to use the second resin. The volatile component in the composition is set to be 1.5 wt% or less with respect to the resin, and more preferably set to be about 0.8 to 1.0 wt%. Specifically, the drying temperature is preferably from 100 to 150 ° C, more preferably from about 100 to 130 ° C. Further, the drying time is preferably about 2 to 10 minutes, more preferably about 2 to 5 minutes.

於本實施形態中,於將第1樹脂片材3'壓合於纖維基材2上,且形成第2樹脂層4時,將含有第2樹脂組成物之清漆供給至纖維基材2。藉此,可確實地形成第1樹脂層3及第2樹脂層4間之界面。進而,於本實施形態中,由於將含有第2樹脂組成物之清漆供給至纖維基材2,故而可容易地使第2樹脂組成物含浸於纖維基材2中。另一方面,第1樹脂層3預先成形為片狀,以片狀供給至纖維基材2,因此與第2樹脂層4相比,成為不易含浸於纖維基材2中之狀態。藉此,可容易地製造第2樹脂層4至少遍及纖維基材2之厚度之90%之位置而含浸於纖維基材2中之預浸體1。 In the present embodiment, when the first resin sheet 3' is press-bonded to the fiber base material 2 and the second resin layer 4 is formed, the varnish containing the second resin composition is supplied to the fiber base material 2. Thereby, the interface between the first resin layer 3 and the second resin layer 4 can be reliably formed. Further, in the present embodiment, since the varnish containing the second resin composition is supplied to the fiber base material 2, the second resin composition can be easily impregnated into the fiber base material 2. On the other hand, since the first resin layer 3 is formed into a sheet shape in advance and is supplied to the fiber base material 2 in a sheet form, it is less likely to be impregnated into the fiber base material 2 than the second resin layer 4 . Thereby, the prepreg 1 in which the second resin layer 4 is impregnated into the fiber base material 2 at least 90% of the thickness of the fiber base material 2 can be easily produced.

再者,於本實施形態中,使用圖3所示之製造裝置6製造預浸體1,但亦可使用圖4所示之製造裝置6a製造預浸體1。該製造裝置6a不具有製造裝置6之噴嘴611,具有貼合裝置65及輥629。其他方面與製造裝置6相同。 Further, in the present embodiment, the prepreg 1 is manufactured using the manufacturing apparatus 6 shown in Fig. 3. However, the prepreg 1 can be manufactured using the manufacturing apparatus 6a shown in Fig. 4. This manufacturing apparatus 6a does not have the nozzle 611 of the manufacturing apparatus 6, and has the bonding apparatus 65 and the roller 629. The other aspects are the same as the manufacturing apparatus 6.

貼合裝置65設置於輥627與輥628之間。貼合裝置65具有對向配置之1對輥651及652、及加熱輥651及652之未圖示之加熱部,且以於輥651與輥652之間夾持對象物,將該對象物加壓且加熱之方式構成。 The bonding device 65 is disposed between the roller 627 and the roller 628. The bonding apparatus 65 has a pair of rollers 651 and 652 disposed opposite to each other, and heating units (not shown) of the heating rollers 651 and 652, and the object is sandwiched between the roller 651 and the roller 652, and the object is added. It is composed of pressure and heating.

輥629設置於貼合裝置65之前段。輥629係送出對象物之手段,於該輥629上捲繞有下述片材7。輥629係以利用未圖示之馬達而旋轉之方式構成,若該輥629旋轉,則自輥629連續地送出片材7。 The roller 629 is disposed in front of the bonding device 65. The roller 629 is a means for feeding out an object, and the following sheet 7 is wound around the roller 629. The roller 629 is configured to rotate by a motor (not shown), and when the roller 629 rotates, the sheet 7 is continuously fed from the roller 629.

於乾燥裝置64中,對纖維基材2及第1樹脂片材3'加熱,使第1樹脂片材3'熔融。再者,如圖1所示,於不使第1樹脂層3含浸於纖維基材2中之情形時,亦可不使用乾燥裝置64。使製造裝置 6a之輥629旋轉,自該輥629送出片材7。片材7係如圖4所示,具有樹脂薄膜8、及設置於該樹脂薄膜8之一面且包含固形或半固形之第2樹脂組成物的第2樹脂片材4'。第2樹脂片材4'成為B階狀態。第2樹脂片材4'於50~150℃下之最低熔融黏度(η2)低於第1樹脂片材3'於50~150℃下之最低熔融黏度(η1)。藉此,可容易地使第2樹脂片材4'含浸於纖維基材2中,可使第2樹脂層4含浸至纖維基材2之厚度之90%以上。又,藉由將最低熔融黏度比η1/η2設為1.1以上,可使第1樹脂層3與第2樹脂層4無法混合,而於第1樹脂層3及第2樹脂層4間形成界面。又,藉由將最低熔融黏度比η1/η2設為100以下、尤其是80以下,有提高界面之密接性之效果。具體而言,第1樹脂片材3'之最低熔融黏度(η1)較佳為1000 Pa.s以上、且25000 Pa.s以下。另一方面,第2樹脂片材4'之最低熔融黏度(η2)較佳為50 Pa.s以上、且10000 Pa.s以下,其中,為5000 Pa.s以下、進而為3000 Pa.s以下較理想。再者,測定方法如上所述。 In the drying device 64, the fiber base material 2 and the first resin sheet 3' are heated to melt the first resin sheet 3'. Further, as shown in FIG. 1, when the first resin layer 3 is not impregnated into the fibrous base material 2, the drying device 64 may not be used. Manufacturing device The roller 629 of 6a is rotated, and the sheet 7 is fed from the roller 629. As shown in FIG. 4, the sheet 7 has a resin film 8 and a second resin sheet 4' provided on one surface of the resin film 8 and containing a solid or semi-solid second resin composition. The second resin sheet 4' is in a B-stage state. The lowest melt viscosity (η2) of the second resin sheet 4' at 50 to 150 ° C is lower than the lowest melt viscosity (η1) of the first resin sheet 3' at 50 to 150 °C. Thereby, the second resin sheet 4' can be easily impregnated into the fibrous base material 2, and the second resin layer 4 can be impregnated to 90% or more of the thickness of the fibrous base material 2. In addition, when the lowest melt viscosity ratio η1/η2 is 1.1 or more, the first resin layer 3 and the second resin layer 4 cannot be mixed, and an interface is formed between the first resin layer 3 and the second resin layer 4. Further, by setting the lowest melt viscosity ratio η1/η2 to 100 or less, particularly 80 or less, there is an effect of improving the adhesion of the interface. Specifically, the lowest melt viscosity (η1) of the first resin sheet 3' is preferably 1000 Pa. s above, and 25000 Pa. s below. On the other hand, the lowest melt viscosity (η2) of the second resin sheet 4' is preferably 50 Pa. Above s, and 10000 Pa. s below, of which, is 5000 Pa. s below, and further 3000 Pa. The following is ideal. Furthermore, the measurement method is as described above.

作為樹脂薄膜8,可使用與作為支持體51之樹脂薄膜所說明者相同者。 As the resin film 8, the same as those described for the resin film as the support 51 can be used.

於本步驟中,片材7及作為纖維基材2與支持體51之積層體之片材5通過貼合裝置65之輥651與輥652之間,此時,片材7及纖維基材2與支持體51之積層體利用該貼合裝置65獲得加壓並且被加熱。藉此,片材7可經由第2樹脂片材4'而壓合於纖維基材2之與第1樹脂層3相反側之面上,獲得作為積層片材之預浸體1。該預浸體1係捲取至輥628上。 In this step, the sheet 7 and the sheet 5 which is a laminate of the fibrous base material 2 and the support 51 pass between the roll 651 of the bonding device 65 and the roll 652. At this time, the sheet 7 and the fibrous substrate 2 The laminate with the support 51 is pressurized by the bonding device 65 and heated. Thereby, the sheet 7 can be press-bonded to the surface of the fiber base material 2 opposite to the first resin layer 3 via the second resin sheet 4', and the prepreg 1 as a laminated sheet can be obtained. The prepreg 1 is taken up onto a roller 628.

作為上述壓合時之條件,並無特別限定,可根據第2樹脂層4之第2樹脂組成物之組成或各條件而適當設定,壓力較佳為0.1 ~1.0 MPa/cm2左右,更佳為0.3~0.5 MPa/cm2左右。又,加熱溫度較佳為100~130℃。藉由該壓合時之加熱,第1樹脂片材3'、第2樹脂片材4'熔融,但第2樹脂層4之最低熔融黏度低於第1樹脂層3,藉此可使第2樹脂層4含浸於纖維基材2中。又,如上所述,藉由將第1樹脂層3與第2樹脂層4之最低熔融黏度比η1/η2設為1.1以上,而於第1樹脂層3與第2樹脂層4之間可形成界面。 The conditions at the time of the press-bonding are not particularly limited, and may be appropriately set depending on the composition or conditions of the second resin composition of the second resin layer 4, and the pressure is preferably about 0.1 to 1.0 MPa/cm 2 , more preferably It is about 0.3 to 0.5 MPa/cm 2 . Further, the heating temperature is preferably from 100 to 130 °C. The first resin sheet 3' and the second resin sheet 4' are melted by the heating at the time of press bonding, but the lowest melt viscosity of the second resin layer 4 is lower than that of the first resin layer 3, whereby the second resin layer 4 can be used. The resin layer 4 is impregnated into the fibrous base material 2. In addition, as described above, the lowest melt viscosity ratio η1/η2 of the first resin layer 3 and the second resin layer 4 can be formed between the first resin layer 3 and the second resin layer 4 by setting the ratio η1/η2 to 1.1 or more. interface.

<基板> <Substrate>

繼而,參照圖5對本發明之基板進行說明。該圖5所示之基板10具有積層體11、及設置於該積層體11之兩面之金屬層12。 Next, the substrate of the present invention will be described with reference to Fig. 5 . The substrate 10 shown in FIG. 5 has a laminate 11 and a metal layer 12 provided on both surfaces of the laminate 11.

積層體11具備以第2樹脂層4彼此為內側而配置之2個預浸體1、及夾持於第2樹脂層4彼此之間之內層電路基板13。預浸體1之樹脂層3、4於基板上成為完全硬化之狀態。 The laminated body 11 includes two prepregs 1 disposed inside the second resin layer 4 and an inner layer circuit board 13 sandwiched between the second resin layers 4 . The resin layers 3, 4 of the prepreg 1 are completely cured on the substrate.

形成於內層電路基板13之表面上之電路層(省略圖示)確實地埋入第2樹脂層4中。 The circuit layer (not shown) formed on the surface of the inner layer circuit board 13 is surely embedded in the second resin layer 4.

金屬層12係欲加工為配線部之部分,例如藉由將銅箔、鋁箔等金屬箔接合於積層體11,及將銅、鋁鍍敷於積層體11之表面等而形成。又,亦可將上述支持體51設為金屬層12。 The metal layer 12 is formed as a portion of the wiring portion, and is formed by, for example, bonding a metal foil such as a copper foil or an aluminum foil to the laminated body 11 and plating copper or aluminum on the surface of the laminated body 11. Further, the support 51 may be the metal layer 12.

金屬層12與第1樹脂層3之剝離強度較佳為0.5 kN/m以上,更佳為0.6 kN/m以上。藉此,將金屬層12加工成配線部,可進一步提高於所獲得之半導體裝置100(參照圖6)中之連接可靠性。 The peeling strength of the metal layer 12 and the first resin layer 3 is preferably 0.5 kN/m or more, and more preferably 0.6 kN/m or more. Thereby, the metal layer 12 is processed into a wiring portion, and the connection reliability in the obtained semiconductor device 100 (see FIG. 6) can be further improved.

此種基板10係準備2個於第1樹脂層3上形成有金屬層12之預浸體1,於以該等預浸體1夾持內層電路基板13之狀態下,例如可列舉:使用真空壓製機、常壓貼合機及於真空下加熱加壓之貼合機進行積層的方法。真空壓製可藉由夾持於平板間並利用通常之熱 壓機等而實施。例如可列舉:名機製作所公司製造之真空壓製機、北川精機公司製造之真空壓製機、Mikado Technos公司製造之真空壓製機等。又,作為貼合機裝置,可使用Nichigo-Morton公司製造之真空貼膜機(Vacuum Applicator)、名機製作所公司製造之真空加壓式貼合機、Hitachi Techno-Engineering公司製造之真空輥式乾燥塗佈機(Dry Coater)等市售之真空積層機或帶式壓製機等而製造。 In the substrate 10, two prepregs 1 in which the metal layer 12 is formed on the first resin layer 3 are prepared, and in the state in which the inner layer circuit board 13 is sandwiched by the prepreg 1, for example, A method of laminating a vacuum press, a normal pressure laminating machine, and a laminating machine heated and pressurized under vacuum. Vacuum pressing can be carried by clamping between the plates and using the usual heat It is implemented by a press or the like. For example, a vacuum press manufactured by a machine manufacturer, a vacuum press manufactured by Beichuan Seiki Co., Ltd., a vacuum press manufactured by Mikado Technos Co., Ltd., and the like can be cited. In addition, as a laminating machine, a vacuum applicator manufactured by Nichigo-Morton Co., Ltd., a vacuum pressurizing laminator manufactured by a machine manufacturer, and a vacuum roll drier manufactured by Hitachi Techno-Engineering Co., Ltd. can be used. It is manufactured by a commercially available vacuum laminator or a belt press, such as a Dry Coater.

再者,本發明之基板10可省略內層電路基板13,而包括使2個預浸體1直接接合第2樹脂層4彼此而成之積層體,亦可省略金屬層12。 Further, the substrate 10 of the present invention can omit the inner layer circuit board 13 and include a laminate in which the two prepregs 1 are directly joined to the second resin layer 4, and the metal layer 12 can be omitted.

<半導體裝置> <semiconductor device>

繼而,參照圖6對本發明之半導體裝置進行說明。再者,於圖6中,省略表示纖維基材2、內層電路基板13,且將第1樹脂層3及第2樹脂層4設為一體而表示。 Next, a semiconductor device of the present invention will be described with reference to FIG. In FIG. 6, the fiber base material 2 and the inner layer circuit board 13 are omitted, and the first resin layer 3 and the second resin layer 4 are integrally shown.

圖6所示之半導體裝置100具有多層基板200、設置於多層基板200之上表面之焊墊部300、設置於多層基板200之下表面之配線部400、藉由將焊墊部300與凸塊501連接而搭載於多層基板200上的半導體元件500。又,另外亦可於多層基板200之下表面設置配線部、焊墊部、焊接球等。 The semiconductor device 100 shown in FIG. 6 has a multilayer substrate 200, a pad portion 300 provided on the upper surface of the multilayer substrate 200, a wiring portion 400 provided on the lower surface of the multilayer substrate 200, and the pad portion 300 and the bumps. The semiconductor element 500 mounted on the multilayer substrate 200 is connected by 501. Further, a wiring portion, a pad portion, a solder ball, or the like may be provided on the lower surface of the multilayer substrate 200.

多層基板200具備作為核心基板而設置之基板10,設置於該基板10之上側之3個預浸體1a、1b、1c,設置於基板10之下側之3個預浸體1d、1e、1f。預浸體1a~1f與預浸體1相同。預浸體1a~1c係以於基板10側設置第2樹脂層4之方式、即自基板10側依序成為第2樹脂層4、纖維基材2、第1樹脂層3之方式配置預浸體1。另一方面,預浸體1d~1f係以於基板10側設置第2樹脂層4之方式、 即依序成為第2樹脂層4、纖維基材2、第1樹脂層3之方式配置預浸體1。於多層基板200中,預浸體1之樹脂層3、4成為完全硬化之狀態。 The multilayer substrate 200 includes a substrate 10 provided as a core substrate, three prepregs 1a, 1b, and 1c provided on the upper side of the substrate 10, and three prepregs 1d, 1e, and 1f provided on the lower side of the substrate 10. . The prepregs 1a to 1f are the same as the prepreg 1. In the prepreg 1a to 1c, the second resin layer 4 is provided on the substrate 10 side, that is, the prepreg is placed so as to be the second resin layer 4, the fiber base material 2, and the first resin layer 3 from the substrate 10 side. Body 1. On the other hand, the prepregs 1d to 1f are formed by providing the second resin layer 4 on the substrate 10 side. In other words, the prepreg 1 is placed in such a manner that the second resin layer 4, the fiber base material 2, and the first resin layer 3 are sequentially formed. In the multilayer substrate 200, the resin layers 3, 4 of the prepreg 1 are completely cured.

又,多層基板200具有設置於預浸體1a與預浸體1b之間之電路部201a、設置於預浸體1b與預浸體1c之間之電路部201b、設置於預浸體1d與預浸體1e之間之電路部201d、設置於預浸體1e與預浸體1f之間之電路部201e。各電路部201a~201e係利用第2樹脂層4而埋入。 Further, the multilayer substrate 200 has a circuit portion 201a provided between the prepreg 1a and the prepreg 1b, a circuit portion 201b provided between the prepreg 1b and the prepreg 1c, and a prepreg 1d and a pre-preg. The circuit portion 201d between the dip bodies 1e and the circuit portion 201e provided between the prepreg 1e and the prepreg 1f. Each of the circuit portions 201a to 201e is buried by the second resin layer 4.

進而,多層基板200具有分別貫通各預浸體1a~1f而設置之電洞,於電洞內形成有電性連接鄰接之電路部彼此、或電路部與焊墊部之導體部202。 Further, the multilayer substrate 200 has holes penetrating through the respective prepregs 1a to 1f, and a conductor portion 202 electrically connecting the adjacent circuit portions or the circuit portions and the pad portions is formed in the holes.

基板10之各金屬層12分別加工成既定之圖案,該經加工之金屬層12彼此係利用貫通基板10而設置之導體部203進行電性連接。 Each of the metal layers 12 of the substrate 10 is processed into a predetermined pattern, and the processed metal layers 12 are electrically connected to each other by a conductor portion 203 provided through the substrate 10.

再者,半導體裝置100(多層基板200)亦可於基板10之單面側設置4個以上之預浸體1。進而,半導體裝置100亦可包含本發明之預浸體1以外之預浸體。 Further, in the semiconductor device 100 (multilayer substrate 200), four or more prepregs 1 may be provided on one side of the substrate 10. Further, the semiconductor device 100 may include a prepreg other than the prepreg 1 of the present invention.

再者,本發明並不限定於上述實施形態,於可達成本發明之目的之範圍內的變換、改良等亦包含於本發明中。以上,關於本發明之預浸體、基板及半導體裝置,對圖示之實施形態進行了說明,但本發明並不限定於此,構成預浸體、基板及半導體裝置之各部可與可發揮相同功能之任意構成者交換。又,亦可附加任意之構成物。 Further, the present invention is not limited to the above-described embodiments, and modifications, improvements, etc. within the scope of the object of the invention can be included in the present invention. The embodiment of the present invention has been described with respect to the prepreg, the substrate, and the semiconductor device of the present invention. However, the present invention is not limited thereto, and the components constituting the prepreg, the substrate, and the semiconductor device may be the same. Any constitutive of the function is exchanged. Further, any constituent may be added.

<附記> <attachment>

(附記1) (Note 1)

一種預浸體,其具備纖維基材、被覆上述纖維基材之一面側且包含第1樹脂組成物構成之第1樹脂層、及被覆上述纖維基材之另一面側且包含與上述第1樹脂組成物不同之第2樹脂組成物構成之第2樹脂層,並且上述第1樹脂層與上述第2樹脂層接觸而形成界面。 A prepreg comprising a fiber base material, a first resin layer including a first resin composition covering one surface side of the fiber base material, and another surface side covering the fiber base material, and including the first resin The second resin layer composed of the second resin composition having a different composition, and the first resin layer is in contact with the second resin layer to form an interface.

(附記2) (Note 2)

如附記1之預浸體,其中,上述第1樹脂層係用以於其上表面設置金屬層之層,上述第2樹脂層係用以埋入電路之層。 The prepreg according to the first aspect, wherein the first resin layer is a layer provided with a metal layer on an upper surface thereof, and the second resin layer is a layer for embedding a circuit.

(附記3) (Note 3)

如附記1或2之預浸體,其中,上述第2樹脂層至少遍及自上述纖維基材之上述另一面至上述纖維基材之厚度之中心之間的區域而含浸於上述纖維基材中。 The prepreg according to the first or second aspect, wherein the second resin layer is impregnated into the fibrous base material at least in a region from the other surface of the fibrous base material to a center of a thickness of the fibrous base material.

(附記4) (Note 4)

如附記3之預浸體,其中,上述第2樹脂層至少遍及自上述纖維基材之上述另一面至上述纖維基材之厚度之90%之位置而含浸於上述纖維基材中。 The prepreg according to the third aspect, wherein the second resin layer is impregnated into the fibrous base material at least at a position from the other surface of the fibrous base material to 90% of the thickness of the fibrous base material.

(附記5) (Note 5)

如附記4之預浸體,其中,上述第2樹脂層含浸於上述纖維基材中,上述第1樹脂層與第2樹脂層之界面位於上述纖維基材之外部。 The prepreg according to the fourth aspect, wherein the second resin layer is impregnated into the fiber base material, and an interface between the first resin layer and the second resin layer is located outside the fiber base material.

(附記6) (Note 6)

如附記1至5中任一項之預浸體,其中,上述第1樹脂層之熱可塑性樹脂之含量高於上述第2樹脂層之熱可塑性樹脂之含量。 The prepreg according to any one of the preceding claims, wherein the content of the thermoplastic resin in the first resin layer is higher than the content of the thermoplastic resin in the second resin layer.

(附記7) (Note 7)

如附記1至6中任一項之預浸體,其中,將該預浸體之上述第1樹脂層與銅箔重疊,於負重2 MPa、溫度220℃之條件下熱處理1小時 後之90°剝離強度A高於將該預浸體之上述第2樹脂層與銅箔重疊,於負重2 MPa、溫度220℃之條件下熱處理1小時後之90°剝離強度B。 The prepreg according to any one of the preceding claims, wherein the first resin layer of the prepreg is overlapped with the copper foil, and heat-treated at a load of 2 MPa and a temperature of 220 ° C for 1 hour. The subsequent 90° peel strength A is higher than the 90° peel strength B after the second resin layer of the prepreg is overlapped with the copper foil and heat-treated at a load of 2 MPa and a temperature of 220° C. for 1 hour.

(附記8) (Note 8)

如附記1至7中任一項之預浸體,其中,依據IPC-TM-650法2.3.17,於171±3℃、1380±70 kPa之條件下加熱加壓5分鐘所測得之樹脂流動率為15重量%以上、且50重量%以下,於以對向之一對橡膠板夾持該預浸體之狀態下,於120℃、2.5 MPa之條件下加熱及加壓時,俯視下自上述纖維基材之外緣露出的上述第1樹脂層及上述第2樹脂層之合計重量相對於上述第1樹脂層整體及上述第2樹脂層整體之合計重量為5%以下,上述橡膠板滿足下述(i)~(iii), The prepreg according to any one of the items 1 to 7, wherein the resin is measured by heating and pressurizing for 5 minutes at 171 ± 3 ° C and 1380 ± 70 kPa according to the IPC-TM-650 method 2.3.17. When the flow rate is 15% by weight or more and 50% by weight or less, when the prepreg is sandwiched between the pair of rubber sheets, the glass is heated and pressurized at 120 ° C and 2.5 MPa, and is viewed from above. The total weight of the first resin layer and the second resin layer exposed from the outer edge of the fiber base material is 5% or less based on the total weight of the entire first resin layer and the entire second resin layer, and the rubber sheet Meet the following (i) to (iii),

(i)依據JIS K 6253 A測得之橡膠硬度為60° (i) The rubber hardness measured according to JIS K 6253 A is 60°

(ii)厚度為3 mm (ii) thickness is 3 mm

(iii)材質為矽。 (iii) The material is 矽.

(附記9) (Note 9)

如附記1至8中任一項之預浸體,其中,上述第1樹脂層含有熱可塑性樹脂,上述熱可塑性樹脂含有苯氧基樹脂、聚乙烯醇系樹脂、聚醯胺系樹脂之任1種以上。 The prepreg according to any one of the preceding claims, wherein the first resin layer contains a thermoplastic resin, and the thermoplastic resin contains any one of a phenoxy resin, a polyvinyl alcohol resin, and a polyamine resin. More than one species.

(附記10) (Note 10)

如附記1至9中任一項之預浸體,其中,上述第2樹脂層含有環氧樹脂、氰酸酯樹脂及無機填充材料。 The prepreg according to any one of the items 1 to 9, wherein the second resin layer contains an epoxy resin, a cyanate resin, and an inorganic filler.

(附記11) (Note 11)

如附記1至10中任一項之預浸體,其中,上述第1樹脂層及上述第2樹脂層含有具有萘骨架且具有萘骨架經由氧原子與其他伸芳基構造鍵結而成之構造的環氧樹脂。 The prepreg according to any one of the preceding claims, wherein the first resin layer and the second resin layer have a structure having a naphthalene skeleton and having a naphthalene skeleton bonded to another aryl group via an oxygen atom. Epoxy resin.

(附記12) (Note 12)

如附記1至11中任一項之預浸體,其中,該預浸體係藉由如下方式製造:對於上述第1樹脂層,使成為第1樹脂層之第1樹脂片材與上述纖維基材之一面抵接,並且自上述纖維基材之另一面側含浸成為第2樹脂層之第2樹脂片材或含有上述第2樹脂組成物之液狀組成物。 The prepreg according to any one of the preceding claims, wherein the prepreg system is produced by: forming a first resin sheet as a first resin layer and the fiber substrate in the first resin layer; One of the surfaces of the fiber substrate is impregnated with the second resin sheet or the liquid resin composition containing the second resin composition.

(附記13) (Note 13)

如附記1至12中任一項之預浸體,其中,自25℃以3℃/min之升溫速度升溫時之50℃以上、且150℃以下之範圍內的第1樹脂層之最低熔融黏度η1與第2樹脂層之最低熔融黏度η2之比η1/η2為1.1倍以上、且100倍以下。 The prepreg according to any one of the items 1 to 12, wherein the lowest melt viscosity of the first resin layer in the range of 50 ° C or more and 150 ° C or less when the temperature is raised at a temperature increase rate of 3 ° C / min at 25 ° C The ratio η1/η2 of the lowest melt viscosity η2 of η1 and the second resin layer is 1.1 times or more and 100 times or less.

(附記14) (Note 14)

如附記1至13中任一項之預浸體,其中,上述第2樹脂層含有粒徑為50 nm以下之二氧化矽。 The prepreg according to any one of the items 1 to 13, wherein the second resin layer contains cerium oxide having a particle diameter of 50 nm or less.

(附記15) (Note 15)

如附記14之預浸體,其中,上述纖維基材為玻璃布,該玻璃布之股線中存在上述二氧化矽。 The prepreg according to supplementary note 14, wherein the fibrous base material is a glass cloth, and the above-mentioned cerium oxide is present in a strand of the glass cloth.

(附記16) (Note 16)

一種基板,其係具有如附記1至15中任一項之預浸體者,且具備電路層,利用上述預浸體之上述2樹脂層埋入上述電路層,並且上述預浸體之上述第1樹脂層上設置有金屬層。 A substrate having a prepreg according to any one of the above-mentioned items 1 to 15, comprising a circuit layer, wherein said second resin layer of said prepreg is embedded in said circuit layer, and said first prepreg A metal layer is provided on the resin layer.

(附記17) (Note 17)

一種半導體裝置,其特徵在於:具備如附記16之基板、及搭載於上述基板上之半導體元件。 A semiconductor device comprising a substrate as shown in Attachment 16 and a semiconductor element mounted on the substrate.

(附記18) (Note 18)

一種預浸體之製造方法,其包括將第1樹脂片材壓合於纖維基材之一面而設置包含由第1樹脂組成物形成之第1樹脂層的步驟,及於上述纖維基材之另一面側形成包含與上述第1樹脂組成物不同之由第2樹脂組成物形成之第2樹脂層的步驟,並且於形成第2樹脂層之上述步驟中,形成至少自上述纖維基材之另一面起遍及上述纖維基材之厚度之90%而含浸於上述纖維基材中的第2樹脂層。 A method for producing a prepreg comprising the steps of: press-fitting a first resin sheet against one surface of a fiber base material, and providing a first resin layer formed of the first resin composition; and a step of forming a second resin layer formed of the second resin composition different from the first resin composition, and forming at least the other side of the fiber substrate in the step of forming the second resin layer The second resin layer is impregnated into the fiber base material over 90% of the thickness of the fiber base material.

(附記19) (Note 19)

如附記18之預浸體之製造方法,其中,上述第1樹脂片材於50~150℃下之最低熔融黏度為1000 Pa.s以上、且25000 Pa.s以下。 The method for producing a prepreg according to the eighth aspect, wherein the first resin sheet has a minimum melt viscosity of 1000 Pa at 50 to 150 ° C. s above, and 25000 Pa. s below.

(附記20) (Note 20)

如附記18或19之預浸體之製造方法,其中,於形成第2樹脂層之上述步驟中,於上述纖維基材之另一面側供給液狀之第2樹脂組成物。 The method for producing a prepreg according to the above-mentioned item 18 or 19, wherein in the step of forming the second resin layer, a liquid second resin composition is supplied to the other surface side of the fiber base material.

(附記21) (Note 21)

如附記18或19之預浸體之製造方法,其中,於形成第2樹脂層之上述步驟中,於上述纖維基材之另一面側供給成為第2樹脂層之第2樹脂片材,加熱上述第2樹脂片材,使之含浸於上述纖維基材中,自25℃以3℃/min之升溫速度升溫時之50℃以上、且150℃以下之範圍內的第1樹脂片材之最低熔融黏度η1與第2樹脂片材之最低熔融黏度η2之比η1/η2為1.1倍以上、且100倍以下。 The method of producing a prepreg according to the above-mentioned item 18 or 19, wherein in the step of forming the second resin layer, the second resin sheet serving as the second resin layer is supplied to the other surface side of the fiber base material, and the heating is performed. The second resin sheet is impregnated into the fiber base material, and the lowest melting of the first resin sheet in the range of 50° C. or higher and 150° C. or lower at 25° C. at a temperature increase rate of 3° C./min. The ratio η1/η2 of the viscosity η1 to the lowest melt viscosity η2 of the second resin sheet is 1.1 times or more and 100 times or less.

(附記22) (Note 22)

如附記18至21中任一項之預浸體之製造方法,其中,於將上述第1樹脂片材壓合於纖維基材之一面上之上述步驟中,以將上述第1樹脂片材直接或間接地與積層輥面接觸之方式沿上述積層輥之外周面 連續地搬送上述第1樹脂片材,於上述積層輥與上述第1樹脂片材接觸之部位,以經由上述第1樹脂片材而與上述積層輥接觸之方式面向上述積層輥連續地搬送上述纖維基材。 The method for producing a prepreg according to any one of the items 18 to 21, wherein, in the step of pressing the first resin sheet against one surface of the fiber base material, the first resin sheet is directly used Or indirectly contacting the surface of the laminating roll along the outer circumference of the laminating roll The first resin sheet is continuously conveyed, and the fiber is continuously conveyed toward the stacking roll so as to be in contact with the stacking roll via the first resin sheet at a portion where the stacking roll is in contact with the first resin sheet. Substrate.

(附記23) (Note 23)

如附記18至22中任一項之預浸體之製造方法,其中,上述第1樹脂片材捲取成輥狀,自該輥送出上述第1樹脂片材,於將上述第1樹脂片材壓合於纖維基材之一面上的上述步驟中係將該送出之上述第1樹脂片材壓合於纖維基材之一面上。 The method for producing a prepreg according to any one of the preceding claims, wherein the first resin sheet is wound into a roll, and the first resin sheet is fed from the roll to form the first resin sheet. In the above step of press-bonding to one surface of the fiber base material, the fed first resin sheet is pressed against one surface of the fiber base material.

(附記24) (Note 24)

如附記18至23中任一項之預浸體之製造方法,其中,上述第1樹脂片材係形成於支持體上,於將上述第1樹脂片材壓合於纖維基材之一面上之上述步驟中係將上述支持體上之上述第1樹脂片材壓合於纖維基材之一面上。 The method for producing a prepreg according to any one of the items 18 to 23, wherein the first resin sheet is formed on a support, and the first resin sheet is pressed against one side of the fiber base material. In the above step, the first resin sheet on the support is pressed against one surface of the fiber base material.

實施例 Example

繼而,對本發明之實施例進行說明。 Next, an embodiment of the present invention will be described.

(實施例1) (Example 1) (第1樹脂組成物) (first resin composition)

製作表1之A-1之第1樹脂組成物。首先,將萘型環氧樹脂(日本化藥公司製造,商品名NC-7300)12.2重量份、萘型環氧樹脂(DIC公司製造,商品名HP4700)5重量份、酚系酚醛清漆型氰酸酯樹脂(Lonza公司製造,商品名PT-30)17.2重量份、聯苯型苯氧基樹脂(三菱化學公司製造,商品名YX-6954BH30)15重量份(固形份換算)、及作為硬化劑之1-苄-2-甲咪唑(四國化成公司製造,Curezol 1B2PZ)0.4重量份溶解於甲基乙基酮中。進而,添加作為無機填充材料之球狀二氧化矽(電氣化 學工業公司製造,商品名SFP-20M,平均粒徑0.3 μm)50重量份、及環氧矽烷偶合劑(信越化學工業公司製造,商品名KBM-403E)0.2重量份,使用高速攪拌機攪拌60分鐘。藉此,製作樹脂組成物為70重量%之清漆。其次,使用聚對苯二甲酸乙二酯薄膜(Unitika公司製造,厚度38 μm,寬度560 mm)作為載體膜,利用缺角輪塗佈裝置塗佈上述清漆,利用乾燥裝置於170℃下乾燥3分鐘,形成厚度5 μm、寬度540 mm之第1樹脂片材(成為第1樹脂層之層)。再者,二氧化矽之平均粒徑係藉由超音波使二氧化矽分散於水中,藉由動態光散射式粒度分佈測定裝置(HORIBA公司製造,LB-550),以體積基準測定二氧化矽之粒度分佈,將其中數半徑設為平均粒徑。具體而言,平均粒徑係由體積累計粒徑d50所規定。以下之實施例、比較例亦相同。 The first resin composition of A-1 of Table 1 was produced. First, 12.2 parts by weight of a naphthalene type epoxy resin (manufactured by Nippon Kayaku Co., Ltd., trade name NC-7300), a naphthalene type epoxy resin (manufactured by DIC Corporation, trade name: HP4700), 5 parts by weight, and a phenolic novolak type cyanic acid. 17.2 parts by weight of an ester resin (manufactured by Lonza Co., Ltd., trade name: PT-30), 15 parts by weight of a biphenyl type phenoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name YX-6954BH30) (in terms of solid content), and as a hardener 1-benzyl-2-methimazole (manufactured by Shikoku Chemical Co., Ltd., Curezol 1B2PZ) 0.4 parts by weight was dissolved in methyl ethyl ketone. Further, 50 parts by weight of a spherical cerium oxide (manufactured by Electric Chemical Industry Co., Ltd., trade name: SFP-20M, average particle diameter: 0.3 μm), and an epoxy decane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd.) are added as an inorganic filler. The name KBM-403E) was 0.2 parts by weight and stirred for 60 minutes using a high speed mixer. Thereby, a varnish having a resin composition of 70% by weight was produced. Next, a polyethylene terephthalate film (manufactured by Unitika Co., Ltd., thickness: 38 μm, width: 560 mm) was used as a carrier film, and the above varnish was applied by a notch wheel coating device, and dried at 170 ° C by a drying device. In a minute, a first resin sheet having a thickness of 5 μm and a width of 540 mm (a layer serving as a first resin layer) was formed. Further, the average particle diameter of the cerium oxide is obtained by dispersing cerium oxide in water by ultrasonic waves, and the cerium oxide is measured on a volume basis by a dynamic light scattering type particle size distribution measuring apparatus (manufactured by HORIBA, LB-550). The particle size distribution is defined by the number of radii. Specifically, the average particle diameter is defined by the volume cumulative particle diameter d 50 . The following examples and comparative examples are also the same.

(第2樹脂組成物) (second resin composition)

製作表2之B-1所示之組成之第2樹脂組成物。將萘醚型環氧樹脂(DIC公司製造,商品名HP-6000)9重量份、聯苯芳烷基型酚系樹脂(日本化藥公司製造,商品名NC-3000)6重量份、酚系酚醛清漆型氰酸酯樹脂(Lonza公司製造,商品名PT-30)15.5重量份溶解於甲基乙基酮中。進而,添加作為無機填充材料之球狀二氧化矽(Admatechs公司製造,SO-31R,平均粒徑1.0 μm)66重量份與球狀二氧化矽(Admatechs公司製造,商品名Admanano,平均粒徑50 nm)3重量份、環氧矽烷偶合劑(信越化學工業公司製造,商品名KBM-403E)0.5重量份,使用高速攪拌機攪拌60分鐘。藉此,製作樹脂組成物為70重量%之清漆。 A second resin composition having the composition shown in B-1 of Table 2 was produced. 9 parts by weight of a naphthalene ether type epoxy resin (manufactured by DIC Corporation, trade name: HP-6000), 6 parts by weight of a biphenyl aralkyl type phenol resin (manufactured by Nippon Kayaku Co., Ltd., trade name NC-3000), and a phenol system 15.5 parts by weight of a novolac type cyanate resin (manufactured by Lonza Co., Ltd., trade name PT-30) was dissolved in methyl ethyl ketone. Further, 66 parts by weight of spherical cerium oxide (SO-31R, average particle diameter: 1.0 μm, manufactured by Admatech Co., Ltd.) and spherical cerium oxide (manufactured by Admatechs Co., Ltd., trade name Admanano, average particle diameter 50) were added as an inorganic filler. Nb) 0.5 parts by weight of an epoxy decane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-403E), 0.5 parts by weight, and stirred for 60 minutes using a high speed mixer. Thereby, a varnish having a resin composition of 70% by weight was produced.

(預浸體之製作) (Pre-impregnation production)

藉由圖3所示之製造裝置6製造預浸體。使製造裝置6之輥621旋轉,自該輥621送出附有載體膜之第1樹脂片材3'。又,使輥623 旋轉,自該輥623送出纖維基材2(日東紡公司製造,WEX-1017,基重12 g/m2,13 μm)。於輥625上壓合第1樹脂片材3'與纖維基材2。此時,輥625之溫度為95℃。其後,自噴嘴611吐出含有第2樹脂組成物之上述清漆,於纖維基材2之與第1樹脂層3相反側之面供給上述清漆。並且,繼而藉由乾燥裝置64將第1樹脂片材3'及含有第2樹脂組成物之清漆於120℃下加熱乾燥2分鐘。藉此,獲得預浸體1(厚度35 μm)。 The prepreg is manufactured by the manufacturing apparatus 6 shown in FIG. The roller 621 of the manufacturing apparatus 6 is rotated, and the first resin sheet 3' with the carrier film attached thereto is sent from the roller 621. Further, the roller 623 was rotated, and the fiber base material 2 (WEX-1017, basis weight 12 g/m 2 , 13 μm) was fed from the roll 623. The first resin sheet 3' and the fiber base material 2 are press-bonded to the roll 625. At this time, the temperature of the roller 625 was 95 °C. Thereafter, the varnish containing the second resin composition is discharged from the nozzle 611, and the varnish is supplied to the surface of the fiber base material 2 opposite to the first resin layer 3. Then, the first resin sheet 3' and the varnish containing the second resin composition were dried by heating at 120 ° C for 2 minutes by a drying device 64. Thereby, the prepreg 1 (thickness 35 μm) was obtained.

(實施例2) (Example 2)

(第1樹脂組成物) (first resin composition)

製作表1之A-2之第1樹脂組成物。首先,將萘改質甲酚酚醛清漆環氧樹脂(DIC公司製造,商品名HP-5000)12.2重量份、萘型環氧樹脂(DIC公司製造,商品名HP4700)5重量份、酚系酚醛清漆型氰酸酯樹脂(Lonza公司製造,商品名PT-30)17.2重量份、聯苯型苯氧基樹脂(三菱化學公司製造,商品名YX-6954BH30)15重量份(固形份換算)、及作為硬化劑之1-苄-2-甲咪唑(四國化成公司製造,Curezol 1B2PZ)0.4重量份溶解於甲基乙基酮中。進而,添加作為無機填充材料之球狀熔融二氧化矽(電氣化學工業公司製造,商品名SFP-20M,平均粒徑0.3 μm)50重量份、環氧矽烷偶合劑(信越化學工業公司製造,商品名KBM-403E)0.2重量份,使用高速攪拌機攪拌60分鐘。藉此,製作樹脂組成物為70重量%之清漆。繼而,使用聚對苯二甲酸乙二酯薄膜(Unitika公司製造,厚度38 μm,寬度560 mm)作為載體膜,利用缺角輪塗佈裝置塗佈上述清漆,利用乾燥裝置於170℃下乾燥3分鐘,形成厚度5 μm、寬度540 mm之第1樹脂片材(成為第1樹脂層之層)。 The first resin composition of A-2 of Table 1 was produced. First, 12.2 parts by weight of a naphthalene-modified cresol novolak epoxy resin (manufactured by DIC Corporation, trade name: HP-5000), and a naphthalene type epoxy resin (manufactured by DIC Corporation, trade name: HP4700), 5 parts by weight, a phenolic novolac 17.2 parts by weight of a cyanate resin (manufactured by Lonza Co., Ltd., trade name: PT-30), and 15 parts by weight of a biphenyl type phenoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name: YX-6954BH30) (in terms of solid content), and as The 1-benzyl-2-methylimidazole (manufactured by Shikoku Chemical Co., Ltd., Curezol 1B2PZ) of the hardener was dissolved in methyl ethyl ketone. Furthermore, 50 parts by weight of a spherical molten cerium oxide (manufactured by Electric Chemical Industry Co., Ltd., trade name: SFP-20M, average particle diameter: 0.3 μm) as an inorganic filler, and an epoxy decane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., The name KBM-403E) was 0.2 parts by weight and stirred for 60 minutes using a high speed mixer. Thereby, a varnish having a resin composition of 70% by weight was produced. Then, a polyethylene terephthalate film (manufactured by Unitika Co., Ltd., thickness: 38 μm, width: 560 mm) was used as a carrier film, and the above varnish was applied by a notch wheel coating device, and dried at 170 ° C by a drying device. In a minute, a first resin sheet having a thickness of 5 μm and a width of 540 mm (a layer serving as a first resin layer) was formed.

(第2樹脂組成物) (second resin composition)

作為第2樹脂組成物,係準備與實施例1相同者。 The second resin composition is prepared in the same manner as in the first embodiment.

(預浸體之製造) (manufacturing of prepreg)

使用上述附有聚對苯二甲酸乙二酯薄膜之樹脂層、含有上述第2樹脂組成物之清漆,利用與實施例1相同之方法製造預浸體。 A prepreg was produced in the same manner as in Example 1 by using the above-mentioned resin layer containing a polyethylene terephthalate film and a varnish containing the above second resin composition.

(實施例3) (Example 3)

(第1樹脂組成物) (first resin composition)

製作表1之A-3之第1樹脂組成物。首先,將萘改質甲酚酚醛清漆環氧樹脂(DIC公司製造,商品名HP-5000)16.2重量份、萘型環氧樹脂(DIC公司製造,商品名HP4700)9重量份、酚系酚醛清漆型氰酸酯樹脂(Lonza公司製造,商品名PT-30)24.2重量份、橡膠改質含酚性羥基之聚醯胺樹脂(日本化藥公司製造,商品名BPAM-155,Mw=1.5萬以上)15重量份、及作為硬化劑之1-苄-2-甲咪唑(四國化成公司製造,Curezol 1B2PZ)0.4重量份溶解於甲基乙基酮中。進而,添加作為無機填充材料之球狀熔融二氧化矽(電氣化學工業公司製造,商品名SFP-20M,平均粒徑0.3 μm)35重量份、環氧矽烷偶合劑(信越化學工業公司製造,商品名KBM-403E)0.2重量份,使用高速攪拌機攪拌60分鐘。藉此,製作樹脂組成物為70重量%之清漆。其次,使用聚對苯二甲酸乙二酯薄膜(Unitika公司製造,厚度38 μm,寬度560 mm)作為載體膜,利用缺角輪塗佈裝置塗佈上述清漆,利用乾燥裝置於170℃下乾燥3分鐘,形成厚度5 μm、寬度540 mm之第1樹脂片材(成為第1樹脂層之層)。 The first resin composition of A-3 of Table 1 was produced. First, a naphthalene-modified cresol novolac epoxy resin (manufactured by DIC Corporation, trade name: HP-5000), 16.2 parts by weight, a naphthalene-type epoxy resin (manufactured by DIC Corporation, trade name: HP4700), 9 parts by weight, a phenolic novolac Type cyanate resin (manufactured by Lonza Co., Ltd., trade name PT-30) 24.2 parts by weight, rubber modified phenolic hydroxyl group-containing polyamine resin (manufactured by Nippon Kayaku Co., Ltd., trade name BPAM-155, Mw = 15,000 or more 15 parts by weight and 0.4 parts by weight of 1-benzyl-2-methylimidazole (Curezol 1B2PZ, manufactured by Shikoku Chemicals Co., Ltd.) as a curing agent were dissolved in methyl ethyl ketone. Further, 35 parts by weight of a spherical molten cerium oxide (manufactured by Electric Chemical Industry Co., Ltd., trade name: SFP-20M, average particle diameter: 0.3 μm) as an inorganic filler, and an epoxy decane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., The name KBM-403E) was 0.2 parts by weight and stirred for 60 minutes using a high speed mixer. Thereby, a varnish having a resin composition of 70% by weight was produced. Next, a polyethylene terephthalate film (manufactured by Unitika Co., Ltd., thickness: 38 μm, width: 560 mm) was used as a carrier film, and the above varnish was applied by a notch wheel coating device, and dried at 170 ° C by a drying device. In a minute, a first resin sheet having a thickness of 5 μm and a width of 540 mm (a layer serving as a first resin layer) was formed.

(第2樹脂組成物) (second resin composition)

作為第2樹脂組成物,係準備與實施例1相同者。 The second resin composition is prepared in the same manner as in the first embodiment.

(預浸體之製造) (manufacturing of prepreg)

使用上述附有聚對苯二甲酸乙二酯薄膜之樹脂層、含有上述第2 樹脂組成物之清漆,利用與實施例1相同之方法製造預浸體。 Using the above resin layer with a polyethylene terephthalate film, including the above second A prepreg of the resin composition was produced in the same manner as in Example 1.

(實施例4) (Example 4)

(第1樹脂組成物) (first resin composition)

製作與實施例3相同之第1樹脂組成物,使用與實施例1相同之附有聚對苯二甲酸乙二酯薄膜之樹脂層。 A first resin composition similar to that of Example 3 was produced, and a resin layer having a polyethylene terephthalate film as in Example 1 was used.

(第2樹脂組成物) (second resin composition)

製作表2之B-2所示之組成之第2樹脂組成物。將雙環戊二烯型環氧樹脂(DIC公司製造,商品名HP-7200L)9重量份、聯苯芳烷基型酚系樹脂(日本化藥公司製造,商品名GPH-65)6重量份、酚系酚醛清漆型氰酸酯樹脂(Lonza公司製造,商品名PT-30)15.5重量份溶解於甲基乙基酮中。進而,添加作為無機填充材料之球狀二氧化矽(Admatechs公司製造,SO-31R,平均粒徑1.0 μm)66重量份與球狀熔融二氧化矽(Admatechs公司製造,商品名Admanano,平均粒徑50 nm)3重量份、及環氧矽烷偶合劑(信越化學工業公司製造,商品名KBM-403E)0.5重量份,使用高速攪拌機攪拌60分鐘。藉此,製作樹脂組成物為70重量%之清漆。 A second resin composition having the composition shown in Table 2-2 of Table 2 was produced. 9 parts by weight of a dicyclopentadiene type epoxy resin (manufactured by DIC Corporation, trade name: HP-7200L) and 6 parts by weight of a biphenyl aralkyl type phenol resin (manufactured by Nippon Kayaku Co., Ltd., trade name: GPH-65). A phenolic novolac type cyanate resin (manufactured by Lonza Co., trade name: PT-30) was dissolved in methyl ethyl ketone in an amount of 15.5 parts by weight. Further, 66 parts by weight of spherical cerium oxide (SO-31R, average particle diameter: 1.0 μm, manufactured by Admatech Co., Ltd.) and spherical molten cerium oxide (manufactured by Admatechs, trade name Admanano, average particle diameter) were added as an inorganic filler. 50 parts by weight of 0.5 parts by weight and 0.5 part by weight of an epoxy decane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-403E) was stirred for 60 minutes using a high speed mixer. Thereby, a varnish having a resin composition of 70% by weight was produced.

(預浸體之製造) (manufacturing of prepreg)

使用上述附有聚對苯二甲酸乙二酯薄膜之樹脂層、上述第2樹脂組成物之清漆,利用與實施例1相同之方法製造預浸體。 A prepreg was produced in the same manner as in Example 1 by using the above-mentioned resin layer containing a polyethylene terephthalate film and the varnish of the above second resin composition.

(實施例5) (Example 5)

(第1樹脂組成物) (first resin composition)

製作與實施例3相同之第1樹脂組成物,使用與實施例1相同之附有聚對苯二甲酸乙二酯薄膜之樹脂層。 A first resin composition similar to that of Example 3 was produced, and a resin layer having a polyethylene terephthalate film as in Example 1 was used.

(第2樹脂組成物) (second resin composition)

製作表2之B-3所示之組成之第2樹脂組成物。將萘醚型環氧樹脂(DIC公司製造,商品名HP-6000)10重量份、聯苯芳烷基型酚系樹脂(日本化藥公司製造,商品名GPH-65)8重量份、酚系酚醛清漆型氰酸酯樹脂(Lonza公司製造,商品名PT-30)14.5重量份、及聯苯型苯氧基樹脂(三菱化學公司製造,商品名YX-6954BH30)2重量份(固形份換算)溶解於甲基乙基酮中。進而,添加作為無機填充材料之球狀熔融二氧化矽(Admatechs公司製造,SO-31R,平均粒徑1.0 μm)65重量份、及環氧矽烷偶合劑(信越化學工業公司製造,商品名KBM-403E)0.5重量份,使用高速攪拌機攪拌60分鐘。藉此,製作樹脂組成物為70重量%之清漆。 A second resin composition having the composition shown in B-3 of Table 2 was produced. 10 parts by weight of a naphthalene ether type epoxy resin (manufactured by DIC Corporation, trade name: HP-6000), and a biphenyl aralkyl type phenol resin (manufactured by Nippon Kayaku Co., Ltd., trade name: GPH-65), 8 parts by weight, phenol system 14.5 parts by weight of a novolac type cyanate resin (manufactured by Lonza Co., Ltd., trade name: PT-30), and 2 parts by weight of a biphenyl type phenoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name: YX-6954BH30) (solid content conversion) Dissolved in methyl ethyl ketone. Further, 65 parts by weight of spherical molten cerium oxide (SO-31R, average particle diameter: 1.0 μm, manufactured by Admatech Co., Ltd.) and an epoxy decane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name KBM-) were added as an inorganic filler. 403E) 0.5 parts by weight, stirred using a high speed mixer for 60 minutes. Thereby, a varnish having a resin composition of 70% by weight was produced.

(預浸體之製造) (manufacturing of prepreg)

使用上述附有聚對苯二甲酸乙二酯薄膜之樹脂層、上述第2樹脂組成物之清漆,利用與實施例1相同之方法製造預浸體。 A prepreg was produced in the same manner as in Example 1 by using the above-mentioned resin layer containing a polyethylene terephthalate film and the varnish of the above second resin composition.

(實施例6) (Example 6)

(第1樹脂組成物) (first resin composition)

製作與實施例3相同之第1樹脂組成物,使用與實施例1相同之附有聚對苯二甲酸乙二酯薄膜之樹脂層。 A first resin composition similar to that of Example 3 was produced, and a resin layer having a polyethylene terephthalate film as in Example 1 was used.

(第2樹脂組成物) (second resin composition)

製作表2之B-4所示之組成之第2樹脂組成物。將雙二環戊二烯型環氧樹脂(DIC公司製造,商品名HP-7200L)10重量份、聯苯芳烷基型酚系樹脂(日本化藥公司製造,商品名GPH-65)8重量份、酚系酚醛清漆型氰酸酯樹脂(Lonza公司製造,商品名PT-30)14.5重量份、及聯苯型苯氧基樹脂(三菱化學公司製造,商品名YX-6954BH30)2重量份(固形分換算)溶解於甲基乙基酮中。進而,添加作為無機填充材料之球 狀熔融二氧化矽(Admatechs公司製造,SO-31R,平均粒徑1.0 μm)65重量份、及環氧矽烷偶合劑(信越化學工業公司製造,商品名KBM-403E)0.5重量份,使用高速攪拌機攪拌60分鐘。藉此,製作樹脂組成物為70重量%之清漆。 A second resin composition having the composition shown in B-4 of Table 2 was produced. 10 parts by weight of a dicyclopentadiene type epoxy resin (manufactured by DIC Corporation, trade name: HP-7200L), and a biphenyl aralkyl type phenol resin (manufactured by Nippon Kayaku Co., Ltd., trade name: GPH-65) And a phenolic novolac type cyanate resin (manufactured by Lonza Co., Ltd., trade name: PT-30), 14.5 parts by weight, and a biphenyl type phenoxy resin (manufactured by Mitsubishi Chemical Corporation, trade name: YX-6954BH30), 2 parts by weight ( The solid fraction conversion is dissolved in methyl ethyl ketone. Further, adding a ball as an inorganic filler 65 parts by weight of molten cerium oxide (manufactured by Admatech Co., Ltd., SO-31R, average particle diameter: 1.0 μm), and 0.5 parts by weight of an epoxy decane coupling agent (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KBM-403E), using a high-speed mixer Stir for 60 minutes. Thereby, a varnish having a resin composition of 70% by weight was produced.

(預浸體之製造) (manufacturing of prepreg)

使用上述附有聚對苯二甲酸乙二酯薄膜之樹脂層、上述第2樹脂組成物之清漆,利用與實施例1相同之方法製造預浸體。 A prepreg was produced in the same manner as in Example 1 by using the above-mentioned resin layer containing a polyethylene terephthalate film and the varnish of the above second resin composition.

(比較例1) (Comparative Example 1)

使用實施例1中所製造之A-1之組成之第1樹脂組成物之清漆、及B-1所示之組成之第2樹脂組成物之清漆,製造預浸體。自纖維基材之兩面使用模塗布機於一面上塗佈第1樹脂組成物之清漆,於另一面上塗佈第2樹脂組成物之清漆,於180℃下加熱乾燥2分鐘。藉此,獲得預浸體(厚度35 μm)。 A prepreg was produced using the varnish of the first resin composition of the composition of A-1 produced in Example 1 and the varnish of the second resin composition of the composition represented by B-1. The varnish of the first resin composition was applied to one surface of the fiber substrate by a die coater, and the varnish of the second resin composition was applied to the other surface, and dried by heating at 180 ° C for 2 minutes. Thereby, a prepreg (thickness 35 μm) was obtained.

(比較例2) (Comparative Example 2)

此處,利用與國際公開WO2007/063960之說明書之實施例1相同之方法,製造預浸體。詳細內容如下所述。 Here, the prepreg was produced in the same manner as in Example 1 of the specification of International Publication WO2007/063960. The details are as follows.

1.第1樹脂層之清漆之製備 1. Preparation of varnish of the first resin layer

將氰酸酯樹脂(Lonza Japan公司製造,Primaset PT-30,重量平均分子量約2,600)24重量%、作為環氧樹脂之聯苯二亞甲基型環氧樹脂(日本化藥公司製造,NC-3000,環氧當量275)24重量%,作為苯氧基樹脂之為雙酚A型環氧樹脂與雙酚F型環氧樹脂之共聚合體且末端部具有環氧基的苯氧基樹脂(Japan Epoxy Resins公司製造,EP-4275,重量平均分子量60,000)11.8重量%、及作為硬化觸媒之咪唑化合物(四國化成工業公司製造,「2-苯-4,5-二羥甲咪唑」)0.2重量%溶解於甲基乙 基酮中。進而,添加作為無機填充材料之球狀熔融二氧化矽(Admatechs公司製造,SO-25H,平均粒徑0.5 μm)39.8重量%、及環氧矽烷型偶合劑(Nippon Unicar公司製造,A-187)0.2重量%,使用高速攪拌裝置攪拌60分鐘,製備樹脂組成物為70重量%之樹脂清漆(表3之A-4之組成)。 Cyanate resin (manufactured by Lonza Japan Co., Ltd., Primaset PT-30, weight average molecular weight: about 2,600), 24% by weight, biphenyl dimethylene epoxy resin as epoxy resin (manufactured by Nippon Kayaku Co., Ltd., NC- 3000, epoxy equivalent 275) 24% by weight, as a phenoxy resin, a phenolic resin having a copolymer of a bisphenol A type epoxy resin and a bisphenol F type epoxy resin and having an epoxy group at the terminal portion (Japan) Manufactured by Epoxy Resins, EP-4275, weight average molecular weight 60,000) 11.8% by weight, and an imidazole compound as a hardening catalyst ("2-Benzene-4,5-dihydroxymethylimidazole" manufactured by Shikoku Chemical Industries, Ltd.) 0.2 % by weight dissolved in methyl b Ketone. Further, spherical molten cerium oxide (SO-25H, manufactured by Admatech Co., Ltd., average particle diameter: 0.5 μm) of 39.8 wt% and an epoxy decane type coupling agent (manufactured by Nippon Unicar Co., Ltd., A-187) were added as an inorganic filler. 0.2% by weight was stirred for 60 minutes using a high-speed stirring device to prepare a resin varnish having a resin composition of 70% by weight (composition of A-4 of Table 3).

2.第2樹脂層之清漆之製備 2. Preparation of varnish of second resin layer

將作為熱硬化性樹脂之酚醛清漆型氰酸酯樹脂(Lonza Japan公司製造,Primaset PT-30,重量平均分子量約2,600)15重量%、作為環氧樹脂之聯苯二亞甲基型環氧樹脂(日本化藥公司製造,NC-3000,環氧當量275)8.7重量%、及作為酚系樹脂之聯苯二亞甲基型酚系樹脂(日本化藥公司製造,GPH-65,羥基當量200)6.3重量%溶解於甲基乙基酮中。進而,添加作為無機填充材料之球狀熔融二氧化矽(Admatechs公司製造,SO-25H,平均粒徑0.5 μm)69.7重量%、及環氧矽烷型偶合劑(Nippon Unicar公司製造,A-187)0.3重量%,使用高速攪拌裝置攪拌60分鐘,製備樹脂組成物為70重量%之第2樹脂層之清漆(表3之B-5之組成)。 A novolac type cyanate resin (manufactured by Lonza Japan Co., Ltd., Primaset PT-30, weight average molecular weight: about 2,600), which is a thermosetting resin, 15% by weight of a biphenyl dimethylene epoxy resin as an epoxy resin. (manufactured by Nippon Kayaku Co., Ltd., NC-3000, epoxy equivalent 275) 8.7% by weight, and a biphenyl dimethylene phenol resin as a phenol resin (manufactured by Nippon Kayaku Co., Ltd., GPH-65, hydroxyl equivalent 200) 6.3 wt% was dissolved in methyl ethyl ketone. Further, spherical molten cerium oxide (SO-25H, manufactured by Admatech Co., Ltd., average particle diameter: 0.5 μm) of 69.7 wt% and an epoxy decane type coupling agent (manufactured by Nippon Unicar Co., Ltd., A-187) were added as an inorganic filler. 0.3% by weight was stirred for 60 minutes using a high-speed stirring device to prepare a varnish of a second resin layer having a resin composition of 70% by weight (composition of B-5 of Table 3).

3.載體材料之製造 3. Manufacture of carrier materials

使用聚對苯二甲酸乙二酯薄膜(三菱化學聚酯公司製造,SFB-38,厚度38 μm,寬度480 mm)作為載體膜,利用缺角輪塗佈裝置塗敷上述第1樹脂層之清漆,利用170℃之乾燥裝置使之乾燥3分鐘,以使厚度9 μm、寬度410 mm之樹脂層位於載體膜之寬度方向之中心之方式形成該樹脂層,而獲得載體材料I(最終形成第1樹脂層)。又,利用相同之方法調整所塗敷之第2樹脂層之清漆之量,以使厚度14 μm、寬度360 mm之樹脂層位於載體膜之寬度方向之中心之方式形成該樹脂 層,而獲得載體材料II(最終形成第2樹脂層)。 A polyethylene terephthalate film (manufactured by Mitsubishi Chemical Polyester Co., Ltd., SFB-38, thickness: 38 μm, width: 480 mm) was used as a carrier film, and the varnish of the above first resin layer was applied by a notch wheel coating device. The resin layer was formed by drying at 170 ° C for 3 minutes to form a resin layer having a thickness of 9 μm and a width of 410 mm in the width direction of the carrier film, thereby obtaining a carrier material I (final formation of the first Resin layer). Further, the amount of the varnish of the applied second resin layer is adjusted by the same method so that the resin layer having a thickness of 14 μm and a width of 360 mm is located at the center of the width direction of the carrier film to form the resin. The layer was obtained to obtain a carrier material II (finally forming a second resin layer).

4.預浸體之製造 4. Manufacturing of prepreg

使用玻璃織布(布型(cloth Type)#1015,寬度360 mm,厚度15 μm,基重17 g/m2)作為纖維基材,藉由真空積層裝置及熱風乾燥裝置製造預浸體。具體而言,以使上述載體材料I及載體材料II位於玻璃織布之寬度方向之中心之方式使之分別重疊於玻璃織布之兩面上,於1330 Pa之減壓條件下,使用80℃之積層輥進行接合。此處,於玻璃織布之寬度方向尺寸之內側區域,將載體材料I及載體材料II之樹脂層分別接合於纖維布之兩面側,並且於玻璃織布之寬度方向尺寸之外側區域,將載體材料I及載體材料II之樹脂層彼此接合。繼而,藉由使上述接合者歷時2分鐘通過設定為120℃之橫向搬送型熱風乾燥裝置內,於不施加壓力之情況下進行加熱處理,而獲得厚度30 μm(第1樹脂層:5 μm,纖維基材:15 μm,第2樹脂層:10 μm)之預浸體。 A prepreg was produced by a vacuum laminating apparatus and a hot air drying apparatus using a glass woven fabric (cloth type #1015, width 360 mm, thickness 15 μm, basis weight 17 g/m 2 ) as a fiber base material. Specifically, the carrier material I and the carrier material II are respectively placed on both sides of the glass woven fabric so as to be located at the center of the width direction of the glass woven fabric, and 80 ° C is used under a reduced pressure of 1330 Pa. The lamination rolls are joined. Here, in the inner region of the width direction of the glass woven fabric, the carrier material I and the resin layer of the carrier material II are respectively bonded to both sides of the fiber cloth, and the carrier is placed on the outer side of the width direction of the glass woven fabric. The resin layers of the material I and the carrier material II are bonded to each other. Then, the bonded body was passed through a lateral transfer type hot air drying device set to 120 ° C for 2 minutes, and heat treatment was performed without applying pressure to obtain a thickness of 30 μm (first resin layer: 5 μm, Fiber substrate: 15 μm, second resin layer: 10 μm) prepreg.

(評價方法) (evaluation method)

對利用上述實施例、比較例所製造之預浸體進行評價。 The prepreg produced by the above examples and comparative examples was evaluated.

(有無界面) (with or without interface)

利用SEM(倍率1000倍)觀察與各預浸體之厚度方向正交之剖面,藉由可否確認到第1樹脂層與第2樹脂層之間之界面,而評價是否形成界面。將結果示於表4,並且將實施例1、5、6之SEM照片示於圖8~10,將比較例1、2之SEM照片示於圖11、12。再者,於實施例5、6之預浸體中,存在第1樹脂層直接與纖維基材表面接觸之區域,及第2樹脂層伸出至纖維基材之外側而第1樹脂層不直接與纖維基材接觸之區域。 The cross section perpendicular to the thickness direction of each prepreg was observed by SEM (magnification: 1000 times), and whether the interface between the first resin layer and the second resin layer was confirmed was confirmed. The results are shown in Table 4, and the SEM photographs of Examples 1, 5, and 6 are shown in Figs. 8 to 10, and the SEM photographs of Comparative Examples 1 and 2 are shown in Figs. Further, in the prepregs of Examples 5 and 6, the first resin layer directly contacts the surface of the fiber base material, and the second resin layer protrudes to the outside of the fiber base material, and the first resin layer is not directly The area in contact with the fibrous substrate.

(含浸率) (impregnation rate)

利用SEM(倍率500倍)觀察與各預浸體之厚度方向正交之剖面,算出自玻璃布之表面至第1樹脂層與第2樹脂層之界面的距離之平均值B(測定10個部位)。並且,算出玻璃布之厚度之平均值A(測定10個部位),以B/A×100(%)算出含浸率。將結果示於表4。再者,玻璃布之厚度係以縱絲與橫絲之交點部分進行計測。 The cross section perpendicular to the thickness direction of each prepreg was observed by SEM (magnification: 500 times), and the average value B of the distance from the surface of the glass cloth to the interface between the first resin layer and the second resin layer was calculated (measurement of 10 parts) ). Then, the average value A of the thickness of the glass cloth (measured at 10 locations) was calculated, and the impregnation rate was calculated at B/A × 100 (%). The results are shown in Table 4. Furthermore, the thickness of the glass cloth is measured by the intersection of the longitudinal and transverse threads.

(樹脂層之性能) (performance of resin layer)

1.剝離強度 Peel strength

測定各實施例、比較例之第1樹脂層、第2樹脂層之剝離強度。測定方法如下所述。測定將預浸體1之第1樹脂層3與銅箔重疊,於負重2 MPa、溫度220℃之條件下於大氣中熱處理1小時後之90°剝離強度A。進而,測定將該預浸體之第2樹脂層4與銅箔重疊,於負重2 MPa、溫度220℃之條件下於大氣中熱處理1小時後之90°剝離強度B。剝離強度係依據JIS C 6481之90度剝離法,於90度方向上對銅箔剝離樹脂層而進行測定。具體而言,於25℃下,利用90度剝離試驗機以每分鐘50 mm之速度測定剝離樹脂層時之90度剝離強度。又,銅箔為厚度2 μm之銅箔(表面粗糙度Rz=2.0 μm,三井金屬工業公司製造,商品名MT Ex-2)。將結果示於表4。 The peeling strength of the first resin layer and the second resin layer of each of the examples and the comparative examples was measured. The measurement method is as follows. The 90° peel strength A after the first resin layer 3 of the prepreg 1 and the copper foil were superposed on each other and heat-treated in the air for 1 hour under a load of 2 MPa and a temperature of 220 ° C was measured. Further, the 90° peel strength B after the second resin layer 4 of the prepreg and the copper foil were superposed on each other and heat-treated in the air for 1 hour under the conditions of a load of 2 MPa and a temperature of 220 ° C was measured. The peel strength was measured by peeling off the resin layer on the copper foil in the direction of 90 degrees in accordance with the 90 degree peeling method of JIS C 6481. Specifically, the 90-degree peel strength at the time of peeling off the resin layer was measured at a speed of 50 mm per minute at 25 ° C using a 90-degree peeling tester. Further, the copper foil was a copper foil having a thickness of 2 μm (surface roughness Rz = 2.0 μm, manufactured by Mitsui Metals, Inc., trade name MT Ex-2). The results are shown in Table 4.

2.埋入性 2. Buried

準備表面具有電路圖案,電路厚度18 μm、銅殘留率50%之內層電路基板。以使第2樹脂層與該內層電路基板之電路圖案接觸之方式重疊預浸體,進行加壓加熱成形(1 MPa,200℃,90分鐘),而獲得10片基板。利用顯微鏡觀察各基板之剖面。並且,對第2樹脂層之埋入性進行評價。 An inner circuit substrate having a circuit pattern, a circuit thickness of 18 μm, and a copper residual ratio of 50% was prepared. The prepreg was placed so that the second resin layer was in contact with the circuit pattern of the inner layer circuit board, and subjected to pressure heating molding (1 MPa, 200 ° C, 90 minutes) to obtain ten substrates. The cross section of each substrate was observed with a microscope. Further, the embedding property of the second resin layer was evaluated.

◎:全部基板之埋入性優異。 ◎: The embedding property of all the substrates was excellent.

○:於板端產生實質上無問題之微小空隙。 ○: A minute gap which is substantially problem-free is generated at the end of the plate.

×:埋入不充分,產生大量空隙。 ×: Buried is insufficient, and a large amount of voids are generated.

將結果示於表4。 The results are shown in Table 4.

(通路間可靠性) (reliability between channels)

重疊8片實施例、比較例中所獲得之預浸體,於兩面重疊厚度12 μm之銅箔,於壓力4 MPa、溫度200℃下進行2小時加熱加壓成形,藉此獲得兩面具有銅箔之積層板。重疊預浸體時,以使第1樹脂層與第2樹脂層交替配置之方式堆積預浸體。其後,利用開銅窗法(conformal mask)使用二氧化碳雷射開通直徑0.15 mm、壁間距離100 μm之通孔,其後進行鍍敷,形成電路配線,於130℃、85%RH、施加電壓20 V之條件下處理500 h,以20 V測定絕緣電阻。測定用之試樣係準備N=10。 The prepreg obtained in the eight examples and the comparative examples was superposed, and a copper foil having a thickness of 12 μm was laminated on both surfaces, and subjected to heat and pressure molding at a pressure of 4 MPa and a temperature of 200 ° C for 2 hours, thereby obtaining copper foil on both sides. Laminated board. When the prepreg is superposed, the prepreg is deposited such that the first resin layer and the second resin layer are alternately arranged. Thereafter, a through-hole having a diameter of 0.15 mm and a wall-to-wall distance of 100 μm was opened by a carbon dioxide laser using a conformal mask, and then plating was performed to form a circuit wiring at 130 ° C, 85% RH, and applied voltage. The insulation resistance was measured at 20 V for 500 h under 20 V conditions. The sample used for the measurement was prepared to have N=10.

◎:全部試樣為1.0×107 Ω以上 ◎: All samples are 1.0 × 10 7 Ω or more

○:成為1.0×107 Ω以上之試樣為8個以上且未滿9個 ○: The number of samples which are 1.0 × 10 7 Ω or more is 8 or more and less than 9

×:成為1.0×107 Ω以上之試樣未滿8個 ×: less than 8 samples of 1.0 × 10 7 Ω or more

(最低熔融黏度) (lowest melt viscosity)

最低熔融黏度之測定條件如下所述。將結果示於表4。於實施例、比較例中,計測於50~150℃下之第1樹脂層、第2樹脂層之最低熔融黏度。此處,利用缺角輪塗佈裝置塗佈上述各實施例、比較例中所獲得之第1樹脂組成物之清漆、第2樹脂組成物之清漆,利用乾燥裝置於170℃下使之乾燥3分鐘,製成厚度5 μm之薄膜,以此為測定對象。其中,此處之計測結果與預浸體之狀態下之第1樹脂層、第2樹脂層之最低熔融黏度一致。測定條件如下所述。 The measurement conditions of the lowest melt viscosity are as follows. The results are shown in Table 4. In the examples and comparative examples, the lowest melt viscosity of the first resin layer and the second resin layer at 50 to 150 ° C was measured. Here, the varnish of the first resin composition obtained in each of the above Examples and Comparative Examples and the varnish of the second resin composition were applied by a knurling wheel coating device, and dried at 170 ° C by a drying device. In minutes, a film having a thickness of 5 μm was formed, which was used as a measurement object. Here, the measurement result here is the same as the lowest melt viscosity of the first resin layer and the second resin layer in the state of the prepreg. The measurement conditions are as follows.

動態黏彈性測定裝置(Anton Paar公司製造,裝置名Physica MCR-301) Dynamic viscoelasticity measuring device (manufactured by Anton Paar, the device name Physica) MCR-301)

頻率:62.83 rad/sec Frequency: 62.83 rad/sec

測定溫度:25~200℃、3℃/min Measurement temperature: 25~200°C, 3°C/min

幾何形狀:平行板 Geometric shape: parallel plate

板直徑:10 mm Plate diameter: 10 mm

板間隔:0.1 mm Board spacing: 0.1 mm

負重(法向力(normal force)):0 N(固定) Load (normal force): 0 N (fixed)

應變(strain):0.3% Strain: 0.3%

測定環境:空氣 Measuring environment: air

(樹脂流動率(重量%)) (resin flow rate (% by weight))

使用實施例、比較例之預浸體依據IPC-TM-650法2.3.17進行測定。即,如圖7所示,將實施例、比較例之預浸體切割成102 mm×102 mm之正方形,將其重疊4片,測定重量(W0(g))。並且,於預浸體之最外層之兩面貼附脫模薄膜(製品名:Sepaniumu 20M2C-S,製造商:Sun-Aluminum工業股份有限公司,尺寸:200 mm×240 mm)(圖7(a))。其後,於2片SUS板之間配置預浸體,加熱加壓至171℃、1.38 MPa,進行5分鐘熱板壓製(圖7(b))。繼而,將脫模薄膜剝離,以使預浸體之積層方向成為高度方向之方式將預浸體切出直徑81 mm之圓柱狀(圖7(c)),測定所獲得之圓柱狀之預浸體之重量(W2(g))。根據式(1)求出樹脂流動率。將結果示於表3。再者,於式(1)中,%為重量%。 The prepregs of the examples and the comparative examples were measured in accordance with IPC-TM-650 method 2.3.17. That is, as shown in Fig. 7, the prepregs of the examples and the comparative examples were cut into squares of 102 mm × 102 mm, and four sheets were superposed thereon, and the weight (W 0 (g)) was measured. Further, a release film is attached to both sides of the outermost layer of the prepreg (product name: Sepaniumu 20M2C-S, manufacturer: Sun-Aluminum Industrial Co., Ltd., size: 200 mm × 240 mm) (Fig. 7(a) ). Thereafter, a prepreg was placed between two SUS plates, and heated and pressurized to 171 ° C and 1.38 MPa, and hot plate pressing was performed for 5 minutes ( FIG. 7( b )). Then, the release film was peeled off, and the prepreg was cut out into a cylindrical shape having a diameter of 81 mm so that the lamination direction of the prepreg was in the height direction (Fig. 7(c)), and the obtained cylindrical prepreg was measured. Body weight (W 2 (g)). The resin flow rate was determined according to the formula (1). The results are shown in Table 3. Further, in the formula (1), % is % by weight.

(樹脂伸出量) (resin extension)

使用Nichigo-Morton股份有限公司製造之CVP300之熱壓裝置,壓製切割成200 mm×200 mm之實施例、比較例之預浸體,並測定樹脂伸出量。具體而言,於夾在該熱壓裝置之2個熱板(SUS1.5 mm)間之2片橡膠板之間載置上述實施例或比較例之預浸體,於120℃、2.5 MPa之條件下壓製60秒。橡膠板設為依據JIS K 6253 A所測得之橡膠硬度為60°且厚度為3 mm的矽橡膠。將結果示於表4。 The prepreg of the examples and comparative examples cut into 200 mm × 200 mm was pressed using a hot press apparatus of CVP300 manufactured by Nichigo-Morton Co., Ltd., and the amount of resin protrusion was measured. Specifically, the prepreg of the above-described embodiment or the comparative example was placed between two rubber sheets sandwiched between two hot plates (SUS 1.5 mm) of the hot press apparatus at 120 ° C and 2.5 MPa. Press for 60 seconds under conditions. The rubber sheet was set to a ruthenium rubber having a rubber hardness of 60° and a thickness of 3 mm as measured according to JIS K 6253 A. The results are shown in Table 4.

(積層體厚度) (layer thickness)

重疊8片實施例、比較例中所獲得之預浸體,於兩面重疊厚度12 μm之銅箔,於壓力3.5 MPa、溫度200℃下進行2小時加熱加壓成形,藉此獲得兩面具有銅箔之積層體。於該積層體中,上層側之4片預浸體係使第1樹脂層配置於上層之銅箔側,另外4片預浸體係使第1樹脂層配置於下層之銅箔側。其後,全部以蝕刻液(氯化鐵)進行蝕刻而除去銅箔,針對積層板(400 mm見方)之對角線,以40 mm間距進行厚度測定,算出最大-最小值。將結果示於表4。 The prepreg obtained in the eight examples and the comparative examples was superposed, and a copper foil having a thickness of 12 μm was superposed on both surfaces, and heated and pressed at a pressure of 3.5 MPa and a temperature of 200 ° C for 2 hours, thereby obtaining copper foil on both sides. The layered body. In the laminate, the first resin layer was placed on the copper foil side of the upper layer in the four prepreg systems on the upper layer side, and the first resin layer was placed on the copper foil side of the lower layer in the four prepreg systems. Thereafter, all of the copper foil was removed by etching with an etching solution (ferric chloride), and the thickness of the laminate (400 mm square) was measured at a pitch of 40 mm to calculate a maximum-minimum value. The results are shown in Table 4.

◎:未滿10 μm ◎: less than 10 μm

△:10 μm以上且未滿30 μm △: 10 μm or more and less than 30 μm

×:30 μm以上 ×: 30 μm or more

(積層體之翹曲) (warping of laminated body)

重疊8片實施例、比較例中所獲得之預浸體,於兩面重疊厚度12 μm之銅箔,於壓力3.5 MPa、溫度200℃下進行2小時加熱加壓成形,藉此獲得兩面具有銅箔之積層體。於該積層體中,上層側之4片預浸體係使第1樹脂層配置於上層之銅箔側,另外4片預浸體係使第1樹脂層配置於下層之銅箔側。其後,全部以蝕刻液(氯化鐵)進行蝕刻而除去銅箔,測定50 mm見方之單片翹曲。將結果示於表4。 The prepreg obtained in the eight examples and the comparative examples was superposed, and a copper foil having a thickness of 12 μm was superposed on both surfaces, and heated and pressed at a pressure of 3.5 MPa and a temperature of 200 ° C for 2 hours, thereby obtaining copper foil on both sides. The layered body. In the laminate, the first resin layer was placed on the copper foil side of the upper layer in the four prepreg systems on the upper layer side, and the first resin layer was placed on the copper foil side of the lower layer in the four prepreg systems. Thereafter, all of the copper foil was removed by etching with an etching solution (ferric chloride), and a single piece warpage of 50 mm square was measured. The results are shown in Table 4.

◎:未滿200 μm ◎: less than 200 μm

×:200 μm以上 ×: 200 μm or more

(耐熱性) (heat resistance)

重疊8片實施例、比較例中所獲得之預浸體,於兩面重疊厚度12 μm之銅箔,於壓力3.5 MPa、溫度200℃下進行2小時加熱加壓成形,藉此獲得兩面具有銅箔之積層體。於該積層體中,上層側之4片預浸體係使第1樹脂層配置於上層之銅箔側,另外4片預浸體係使第1樹脂層配置於下層之銅箔側。繼而,進行依據JEDEC標準2級之熱處理、吸濕處理,進行吸濕耐熱可靠性評價。具體而言,對上述積層體進行125℃/24小時之預乾燥後,於85℃、60%RH下進行196小時之吸濕處理,進而通過峰溫度為260℃之對應無鉛焊接之迴焊溫度曲線(reflow profile)之紅外迴焊爐20次。每次迴焊觀察積層體之外觀,確認有無膨脹。又,通過上述紅外迴焊爐10次後,使用超音波顯微鏡(SAT,Scanning Acoustic Tomography)(超音波影像裝置)亦調查積層體內部之膨脹。將結果示於表4。 The prepreg obtained in the eight examples and the comparative examples was superposed, and a copper foil having a thickness of 12 μm was superposed on both surfaces, and heated and pressed at a pressure of 3.5 MPa and a temperature of 200 ° C for 2 hours, thereby obtaining copper foil on both sides. The layered body. In the laminate, the first resin layer was placed on the copper foil side of the upper layer in the four prepreg systems on the upper layer side, and the first resin layer was placed on the copper foil side of the lower layer in the four prepreg systems. Then, heat treatment and moisture absorption treatment according to the JEDEC standard level 2 were carried out to evaluate the moisture absorption and heat resistance reliability. Specifically, the laminate is pre-dried at 125 ° C / 24 hours, and then subjected to a moisture absorption treatment at 85 ° C and 60% RH for 196 hours, and further passed a reflow temperature of a corresponding lead-free solder having a peak temperature of 260 ° C. The infrared reflow oven of the reflow profile was used 20 times. The appearance of the laminate was observed every time the reflow was observed to confirm the presence or absence of expansion. Further, after the infrared reflow furnace was used for 10 times, the expansion inside the laminate was also investigated using an ultrasonic microscope (SAT) (ultrasonic imaging device). The results are shown in Table 4.

◎:通過迴焊爐20次後,外觀無膨脹。積層體內部無膨脹。 ◎: After 20 times through the reflow furnace, the appearance did not swell. There is no expansion inside the laminate.

○:通過迴焊爐20次後,外觀無膨脹。積層體內部有膨脹。 ○: After 20 passes through the reflow furnace, the appearance did not swell. There is expansion inside the laminate.

×:通過迴焊爐1~5次後之任一次,外觀有膨脹。 ×: The appearance of the reflow furnace is expanded after 1 to 5 times.

於實施例1~6中,第2樹脂層至少遍及自纖維基材之表面至纖維基材之厚度之90%之位置而含浸於纖維基材中,因此只要以含浸性較高之樹脂組成物構成第2樹脂層即可,第1樹脂層之樹脂組成物並不限制於含浸性較高者。又,於實施例1~6中,第2樹脂層至少遍及自纖維基材之表面至纖維基材之厚度之90%之位置而含浸於纖維基材中,因此通路間可靠性亦良好。又,於實施例1~6中,可確 認到第1樹脂層與第2樹脂層接觸而存在界面。可認為第1樹脂層之最低熔融黏度η1與第2樹脂層之最低熔融黏度η2之比η1/η2為1.1倍以上,因此可形成明確之界面。又,可認為藉由將η1/η2設為1.1倍以上,變得容易將第2樹脂層含浸於纖維基材中。再者,於實施例1~6中,η1/η2為100以下,因此第1脂層與第2樹脂層之界面之密接性優異。又,得知於實施例1~6中,第1樹脂層之剝離強度A高於第2樹脂層之剝離強度B,第1樹脂層、第2樹脂層之剝離強度成為所需之強度。進而,得知電路圖案之埋入性亦良好,且第1樹脂層、第2樹脂層可發揮所需之特性。進而,亦得知樹脂流動率為15重量%以上,且電路之埋入性優異。又,樹脂流動率為50重量%以下,且於壓製時可抑制樹脂之流出。又,樹脂之伸出量為5重量%以下,因此積層板之厚度均勻性良好,且亦可抑制翹曲之產生。又,於實施例1~4中,藉由於第2樹脂層中使用平均粒徑為50 nm之二氧化矽,耐熱性變得非常良好。進而,於實施例1~4中,藉由於第2樹脂層中使用平均粒徑為50 nm之二氧化矽,通路間可靠性變得非常高。可認為藉由使奈米二氧化矽進入纖維束內,而形成奈米二氧化矽附著於纖維上之狀態,而提高通路間可靠性。進而,使用伸萘基醚型環氧樹脂之預浸體為低吸水、低熱膨脹。 In the first to sixth embodiments, the second resin layer is impregnated into the fibrous base material at least at a position from the surface of the fibrous base material to 90% of the thickness of the fibrous base material, so that the resin composition having a high impregnation property is used. The second resin layer may be formed, and the resin composition of the first resin layer is not limited to those having higher impregnation properties. Further, in Examples 1 to 6, the second resin layer was impregnated into the fiber base material at least at a position from the surface of the fiber base material to 90% of the thickness of the fiber base material, so that the reliability between the passages was also good. Moreover, in the first to sixth embodiments, it is confirmed It is recognized that the first resin layer is in contact with the second resin layer to have an interface. It is considered that the ratio η1/η2 of the lowest melt viscosity η1 of the first resin layer to the lowest melt viscosity η2 of the second resin layer is 1.1 times or more, so that a clear interface can be formed. In addition, it is considered that the second resin layer is easily impregnated into the fiber base material by setting η1/η2 to 1.1 times or more. In addition, in Examples 1 to 6, since η1/η2 is 100 or less, the adhesion between the first lipid layer and the second resin layer is excellent. Further, in Examples 1 to 6, the peel strength A of the first resin layer was higher than the peel strength B of the second resin layer, and the peel strength of the first resin layer and the second resin layer became the required strength. Further, it was found that the embedding property of the circuit pattern was also good, and the first resin layer and the second resin layer exhibited desired characteristics. Further, the resin flow rate was also 15% by weight or more, and the embedding property of the circuit was excellent. Further, the resin flow rate is 50% by weight or less, and the outflow of the resin can be suppressed at the time of pressing. Further, since the amount of protrusion of the resin is 5% by weight or less, the thickness uniformity of the laminated sheet is good, and the occurrence of warpage can be suppressed. Further, in Examples 1 to 4, since the second resin layer was made of cerium oxide having an average particle diameter of 50 nm, the heat resistance was extremely good. Further, in Examples 1 to 4, since the second resin layer was made of cerium oxide having an average particle diameter of 50 nm, the reliability between the passages was extremely high. It is considered that the nano cerium oxide is introduced into the fiber bundle to form a state in which nano cerium oxide adheres to the fiber, thereby improving the reliability between the channels. Further, the prepreg using the stretch naphthyl ether type epoxy resin has low water absorption and low thermal expansion.

可認為於比較例1中,由於將黏度程度相同之清漆含浸於纖維基材中,故而第1樹脂層、第2樹脂層之含浸速度成為相同程度,含浸率為50%左右。進而,可認為於比較例2中,由於將最低熔融黏度非常接近之樹脂片材彼此貼合於纖維基材上,故而第1樹脂層、第2樹脂層之含浸速度成為相同程度,含浸率為50%左右。於此種比較例1、2中,需要使第1樹脂層、第2樹脂層以相同程度含浸於纖維 基材中,因此限制樹脂組成物之選擇。進而,於比較例1中,無法確認到第1樹脂層與第2樹脂層之界面,第1樹脂層與第2樹脂層已混合。因此,與實施例1相比,第1樹脂層之剝離強度變弱。進而,電路圖案之埋入性與實施例1相比較差,第1樹脂層、第2樹脂層無法發揮所需之特性。進而,通路間可靠性不良,且積層板之厚度均勻性較差,而產生翹曲。於比較例1中,認為通路間可靠性不良之情況係由構成第1樹脂層之清漆及構成第2樹脂層之清漆不均勻地混合所引起。於比較例2中,亦無法確認第1樹脂層與第2樹脂層之界面,第1樹脂層與第2樹脂層已混合。因此,第1樹脂層之剝離強度低於所需之值。進而,於比較例2中,積層板產生翹曲。其原因在於,由於銅箔側之第1樹脂層之黏度較低,故而產生積層板之厚度不均。 In Comparative Example 1, since the varnish having the same viscosity is impregnated into the fiber base material, the impregnation speed of the first resin layer and the second resin layer is approximately the same, and the impregnation rate is about 50%. In addition, in Comparative Example 2, since the resin sheets having the lowest melt viscosity are bonded to each other on the fiber base material, the impregnation speed of the first resin layer and the second resin layer is the same, and the impregnation rate is the same. About 50%. In the first and second comparative examples, it is necessary to impregnate the first resin layer and the second resin layer to the same extent. In the substrate, therefore, the choice of resin composition is limited. Further, in Comparative Example 1, the interface between the first resin layer and the second resin layer could not be confirmed, and the first resin layer and the second resin layer were mixed. Therefore, the peeling strength of the first resin layer was weaker than that of Example 1. Further, the embedding property of the circuit pattern was inferior to that of the first embodiment, and the first resin layer and the second resin layer could not exhibit the desired characteristics. Further, the reliability between the vias is poor, and the thickness uniformity of the laminated sheets is poor, and warpage occurs. In Comparative Example 1, it was considered that the reliability between the passages was caused by the uneven mixing of the varnish constituting the first resin layer and the varnish constituting the second resin layer. In Comparative Example 2, the interface between the first resin layer and the second resin layer could not be confirmed, and the first resin layer and the second resin layer were mixed. Therefore, the peeling strength of the first resin layer is lower than the desired value. Further, in Comparative Example 2, the laminate was warped. This is because the thickness of the first resin layer on the copper foil side is low, so that the thickness of the laminated plate is uneven.

本申請案主張基於2012年2月28日提出申請之日本專利申請第2012-41917號、及2012年2月28日提出申請之日本專利申請第2012-41886號的優先權,將其揭示之全部內容併入本文中。 The present application claims the priority of Japanese Patent Application No. 2012-41917, filed on Feb. 28, 2012, and the priority of Japanese Patent Application No. 2012-41886, filed on Feb. The content is incorporated herein.

1‧‧‧預浸體 1‧‧‧Prepreg

2‧‧‧纖維基材 2‧‧‧Fiber substrate

3‧‧‧第1樹脂層 3‧‧‧1st resin layer

4‧‧‧第2樹脂層 4‧‧‧2nd resin layer

42‧‧‧被覆部 42‧‧‧The Ministry of Coverage

43‧‧‧第2含浸部 43‧‧‧2nd Impregnation Department

F‧‧‧界面 F‧‧‧ interface

T、ta、tb‧‧‧厚度 T, ta, tb‧‧‧ thickness

Claims (25)

一種預浸體,其具備:纖維基材、被覆上述纖維基材之一面側且由第1樹脂組成物構成之第1樹脂層、及被覆上述纖維基材之另一面側且由與上述第1樹脂組成物不同之第2樹脂組成物構成之第2樹脂層,並且上述第2樹脂層至少自上述纖維基材之另一面起遍及上述纖維基材之厚度之90%而含浸於上述纖維基材中。 A prepreg comprising: a fiber base material, a first resin layer covering a surface side of the fiber base material and comprising a first resin composition; and the other surface side covering the fiber base material, and the first surface a second resin layer composed of a second resin composition having a different resin composition, and the second resin layer is impregnated into the fiber substrate from at least 90% of the thickness of the fiber substrate from the other surface of the fiber substrate in. 如申請專利範圍第1項之預浸體,其中,上述第1樹脂層與上述第2樹脂層接觸而形成界面。 The prepreg according to claim 1, wherein the first resin layer is in contact with the second resin layer to form an interface. 如申請專利範圍第1項之預浸體,其中,上述第1樹脂層係用以於其上表面設置金屬層之層,上述第2樹脂層係用以埋入電路之層。 The prepreg according to claim 1, wherein the first resin layer is a layer provided with a metal layer on the upper surface thereof, and the second resin layer is a layer for embedding the circuit. 如申請專利範圍第1至3項中任一項之預浸體,其中,上述第1樹脂層及上述第2樹脂層為熱硬化性之層,且為半硬化之狀態。 The prepreg according to any one of claims 1 to 3, wherein the first resin layer and the second resin layer are thermosetting layers and are semi-hardened. 如申請專利範圍第1項之預浸體,其中,上述第2樹脂層含浸於上述纖維基材中,上述第1樹脂層與上述第2樹脂層接觸而形成界面,上述第1樹脂層與第2樹脂層之界面位於上述纖維基材之外部。 The prepreg according to claim 1, wherein the second resin layer is impregnated into the fiber base material, and the first resin layer is in contact with the second resin layer to form an interface, and the first resin layer and the first resin layer are The interface of the resin layer is located outside the fiber substrate. 如申請專利範圍第1項之預浸體,其中,上述第1樹脂層之熱可塑性樹脂之含量高於上述第2樹脂層之 熱可塑性樹脂之含量。 The prepreg according to claim 1, wherein the content of the thermoplastic resin of the first resin layer is higher than that of the second resin layer The content of the thermoplastic resin. 如申請專利範圍第1項之預浸體,其中,將該預浸體之上述第1樹脂層與銅箔重疊,於負重2 MPa、溫度220℃之條件下熱處理1小時後之90°剝離強度A高於將該預浸體之上述第2樹脂層與銅箔重疊,於負重2 MPa、溫度220℃之條件下熱處理1小時後之90°剝離強度B。 The prepreg according to the first aspect of the invention, wherein the first resin layer of the prepreg is overlapped with the copper foil, and the 90° peel strength after heat treatment for 1 hour under a load of 2 MPa and a temperature of 220 ° C A is higher than the 90° peel strength B after the second resin layer of the prepreg is superposed on the copper foil and heat-treated for 1 hour under the conditions of a load of 2 MPa and a temperature of 220 °C. 如申請專利範圍第7項之預浸體,其中,90°剝離強度A-90°剝離強度B≧0.1 kN/m。 A prepreg according to claim 7 wherein the 90° peel strength A-90° peel strength B ≧ 0.1 kN/m. 如申請專利範圍第1項之預浸體,其中,依據IPC-TM-650法2.3.17,於171±3℃、1380±70 kPa之條件下加熱加壓5分鐘所測得之樹脂流動率為15重量%以上且50重量%以下,於以對向之一對橡膠板夾持該預浸體之狀態下,於120℃、2.5 MPa之條件下進行加熱及加壓時,俯視下自上述纖維基材之外緣露出的上述第1樹脂層及上述第2樹脂層之合計重量相對於上述第1樹脂層整體及上述第2樹脂層整體之合計重量為5%以下,上述橡膠板滿足下述(i)~(iii),(i)依據JIS K 6253 A測得之橡膠硬度為60°(ii)厚度為3 mm(iii)材質為矽。 For example, the prepreg of the first application of the patent scope, wherein the resin flow rate is measured by heating and pressurizing for 5 minutes at 171±3°C and 1380±70 kPa according to the IPC-TM-650 method 2.3.17. When it is heated and pressurized at 120 ° C and 2.5 MPa in a state in which the prepreg is held by one of the opposite rubber sheets in a state of 15% by weight or more and 50% by weight or less, the above-mentioned The total weight of the first resin layer and the second resin layer exposed on the outer edge of the fiber base material is 5% or less based on the total weight of the entire first resin layer and the entire second resin layer, and the rubber sheet satisfies the lower (i) to (iii), (i) The rubber hardness measured according to JIS K 6253 A is 60° (ii) The thickness is 3 mm (iii) The material is 矽. 如申請專利範圍第1項之預浸體,其中,上述第1樹脂層含有熱可塑性樹脂,上述熱可塑性樹脂含有苯氧基樹脂、聚乙烯縮醛系樹脂、聚醯胺系樹脂中之任1種以上。 The prepreg according to the first aspect of the invention, wherein the first resin layer contains a thermoplastic resin, and the thermoplastic resin contains any one of a phenoxy resin, a polyvinyl acetal resin, and a polyamidamide resin. More than one species. 如申請專利範圍第1項之預浸體,其中,上述第2樹脂層含有環氧樹脂、氰酸酯樹脂及無機填充材料。 The prepreg according to claim 1, wherein the second resin layer contains an epoxy resin, a cyanate resin, and an inorganic filler. 如申請專利範圍第1項之預浸體,其中,上述第1樹脂層及上述第2樹脂層之中,至少任一者含有具有萘骨架且具有萘骨架經由氧原子與其他伸芳基構造鍵結而成之構造的環氧樹脂。 The prepreg according to the first aspect of the invention, wherein at least one of the first resin layer and the second resin layer has a naphthalene skeleton and has a naphthalene skeleton via an oxygen atom and another exoaryl group. A bonded epoxy resin. 如申請專利範圍第1項之預浸體,其中,該預浸體係藉由下述方式製造:對於上述第1樹脂層,使成為第1樹脂層之第1樹脂片材與上述纖維基材之一面接觸,並且自上述纖維基材之另一面側含浸成為第2樹脂層之第2樹脂片材或含有上述第2樹脂組成物之液狀組成物。 The prepreg according to the first aspect of the invention, wherein the prepreg system is produced by: forming a first resin sheet that is a first resin layer and the fiber substrate with respect to the first resin layer; The second resin sheet which is the second resin layer or the liquid composition containing the second resin composition is impregnated from the other side of the fiber substrate. 如申請專利範圍第1項之預浸體,其中,自25℃以3℃/min之升溫速度升溫時之50℃以上且150℃以下之範圍內的第1樹脂層之最低熔融黏度η1與第2樹脂層之最低熔融黏度η2之比η1/η2為1.1以上且100以下。 The prepreg according to the first aspect of the invention, wherein the lowest melt viscosity η1 of the first resin layer in the range of 50 ° C or more and 150 ° C or less when the temperature is raised at a temperature increase rate of 3 ° C / min at 25 ° C The ratio η1/η2 of the lowest melt viscosity η2 of the resin layer is 1.1 or more and 100 or less. 如申請專利範圍第1項之預浸體,其中,上述第2樹脂層包含粒徑為50 nm以下之二氧化矽。 The prepreg according to claim 1, wherein the second resin layer contains cerium oxide having a particle diameter of 50 nm or less. 如申請專利範圍第15項之預浸體,其中,上述纖維基材為玻璃布,該玻璃布之股線中存在有上述二氧化矽。 The prepreg according to claim 15, wherein the fibrous substrate is a glass cloth, and the above-mentioned ceria is present in a strand of the glass cloth. 一種基板,其係具有申請專利範圍第1項之預浸體之硬化體者,且具備電路層,上述預浸體之硬化體之上述第2樹脂層中埋入上述電路層,並且 上述預浸體之硬化體之上述第1樹脂層上設置有金屬層。 A substrate having a cured body of a prepreg according to claim 1 and having a circuit layer, wherein the circuit layer is embedded in the second resin layer of the cured body of the prepreg, and A metal layer is provided on the first resin layer of the cured body of the prepreg. 一種半導體裝置,其具備:申請專利範圍第17項之基板、及搭載於上述基板上之半導體元件。 A semiconductor device comprising: a substrate of claim 17; and a semiconductor device mounted on the substrate. 一種預浸體之製造方法,其包括:將第1樹脂片材壓合於纖維基材之一面而設置由第1樹脂組成物構成之第1樹脂層的步驟,於上述纖維基材之另一面側形成由與上述第1樹脂組成物不同之第2樹脂組成物構成之第2樹脂層的步驟,並且於形成第2樹脂層之上述步驟中,形成至少自上述纖維基材之另一面起遍及上述纖維基材之厚度之90%而含浸於上述纖維基材中的第2樹脂層。 A method for producing a prepreg, comprising: a step of pressing a first resin sheet against one surface of a fiber base material and providing a first resin layer composed of a first resin composition, on the other side of the fiber base material a step of forming a second resin layer composed of a second resin composition different from the first resin composition, and forming at least the other surface of the fiber substrate in the step of forming the second resin layer The second resin layer of the fiber base material is impregnated with 90% of the thickness of the fiber base material. 如申請專利範圍第19項之預浸體之製造方法,其中,上述第1樹脂片材於50~150℃下之最低熔融黏度為1000 Pa.s以上且25000 Pa.s以下。 The method for producing a prepreg according to claim 19, wherein the first resin sheet has a minimum melt viscosity of 1000 Pa at 50 to 150 ° C. s above and 25000 Pa. s below. 如申請專利範圍第19項之預浸體之製造方法,其中,於形成第2樹脂層之上述步驟中,於上述纖維基材之另一面側供給液狀之第2樹脂組成物。 The method for producing a prepreg according to claim 19, wherein in the step of forming the second resin layer, a liquid second resin composition is supplied to the other surface side of the fiber substrate. 如申請專利範圍第19項之預浸體之製造方法,其中,於形成第2樹脂層之上述步驟中,於上述纖維基材之另一面側供給成為第2樹脂層之第2樹脂片材,加熱上述第2樹脂片材,使之含浸於上述纖維基材中,自25℃以3℃/min之升溫速度升溫時之50℃以上且150℃以下之範圍內的第1樹脂片材之最低熔融黏度η1與第2樹脂片材之最 低熔融黏度η2之比η1/η2為1.1以上且100以下。 The method of producing a prepreg according to claim 19, wherein in the step of forming the second resin layer, the second resin sheet serving as the second resin layer is supplied to the other surface side of the fiber base material. The second resin sheet is heated and impregnated into the fiber base material, and the lowest of the first resin sheet in the range of 50° C. or higher and 150° C. or lower at 25° C. at a temperature increase rate of 3° C./min. Melt viscosity η1 and the second resin sheet The ratio η1/η2 of the low melt viscosity η2 is 1.1 or more and 100 or less. 如申請專利範圍第19項之預浸體之製造方法,其中,於將上述第1樹脂片材壓合於纖維基材之一面上之上述步驟中,以將上述第1樹脂片材直接或間接地與積層輥面接觸之方式沿上述積層輥之外周面連續地搬送上述第1樹脂片材,於上述積層輥與上述第1樹脂片材接觸之部位,以經由上述第1樹脂片材而與上述積層輥接觸之方式面向上述積層輥連續地搬送上述纖維基材。 The method for producing a prepreg according to claim 19, wherein in the step of pressing the first resin sheet onto one surface of the fiber base material, the first resin sheet is directly or indirectly The first resin sheet is continuously conveyed along the outer peripheral surface of the stacking roll in contact with the surface of the stacking roll, and the portion of the stacking roll that is in contact with the first resin sheet passes through the first resin sheet. The fiber substrate is continuously conveyed toward the stacking roll in such a manner that the stacking rolls are in contact with each other. 如申請專利範圍第19項之預浸體之製造方法,其中,上述第1樹脂片材捲取成輥狀,自該輥送出上述第1樹脂片材,並將上述第1樹脂片材壓合於纖維基材之一面上的上述步驟係將該送出之上述第1樹脂片材壓合於纖維基材之一面上。 The method for producing a prepreg according to claim 19, wherein the first resin sheet is wound into a roll, the first resin sheet is fed from the roll, and the first resin sheet is pressed. In the above step on one side of the fiber base material, the fed first resin sheet is pressed against one surface of the fiber base material. 如申請專利範圍第19項之預浸體之製造方法,其中,上述第1樹脂片材係於支持體上形成,將上述第1樹脂片材壓合於纖維基材之一面上之上述步驟係將上述支持體上之上述第1樹脂片材壓合於纖維基材之一面上。 The method for producing a prepreg according to claim 19, wherein the first resin sheet is formed on a support, and the step of pressing the first resin sheet onto one side of the fiber substrate is the above-described step The first resin sheet on the support is pressed against one surface of the fiber base material.
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105407625A (en) * 2014-09-05 2016-03-16 三星电机株式会社 Prepreg and method for manufacturing the same
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CN106717137A (en) * 2014-05-19 2017-05-24 塞拉电路公司 Embedded traces
TWI672413B (en) * 2015-03-26 2019-09-21 日商日鐵化學材料股份有限公司 Fiber reinforced plastic molding material, method for producing the same, and molded product
TWI762541B (en) * 2017-01-13 2022-05-01 日商松下知識產權經營股份有限公司 Printed wiring board with built-in thick conductor and method of manufacturing the same
US11446845B2 (en) 2017-03-28 2022-09-20 Showa Denko Materials Co., Ltd. Method for manufacturing FRP precursor and method for manufacturing FRP

Families Citing this family (16)

* Cited by examiner, † Cited by third party
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KR102306718B1 (en) * 2014-11-26 2021-09-30 삼성전기주식회사 Prepreg
ES2846002T3 (en) 2015-06-16 2021-07-28 Gh Craft Ltd Molding device and production method
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KR102570816B1 (en) * 2017-07-31 2023-08-24 바스프 에스이 Apparatus for impregnating fibers with defined fiber volume content
WO2020235488A1 (en) * 2019-05-23 2020-11-26 東レ株式会社 Method for producing fiber-reinforced resin substrate, fiber-reinforced resin substrate, and molded article integrated therewith
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EP4074761A4 (en) * 2019-12-11 2024-01-03 Toray Industries, Inc. Prepreg, laminate and integrated molded article
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JP7467906B2 (en) * 2019-12-23 2024-04-16 東レ株式会社 Fiber-reinforced resin molded body and composite molded body
DE112021000930T5 (en) * 2020-04-03 2022-11-24 Panasonic Intellectual Property Management Co., Ltd. HEAT CURING RESIN SHEET AND PRINTED WIRING BOARD
JP2022049935A (en) * 2020-09-17 2022-03-30 三菱重工航空エンジン株式会社 Method of manufacturing prepreg and forming composite material
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Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003313324A (en) * 2002-04-24 2003-11-06 Mitsubishi Gas Chem Co Inc Method for manufacturing base material-filled b-staged resin composition sheet
JP2003342399A (en) * 2002-05-28 2003-12-03 Matsushita Electric Works Ltd Prepreg and laminated plate having inner layer circuit obtained by using this prepreg
JP2005105035A (en) * 2003-09-29 2005-04-21 Asahi Schwebel Co Ltd Prepreg, manufacturing method thereof and laminated plate
JP4903989B2 (en) * 2004-07-27 2012-03-28 株式会社アドマテックス Composition for printed circuit boards
JP4957552B2 (en) * 2005-09-30 2012-06-20 住友ベークライト株式会社 Manufacturing method of prepreg with carrier for printed wiring board, prepreg with carrier for printed wiring board, manufacturing method of thin double-sided board for printed wiring board, thin double-sided board for printed wiring board, and manufacturing method of multilayer printed wiring board
JP5243715B2 (en) * 2005-12-01 2013-07-24 住友ベークライト株式会社 Prepreg, substrate and semiconductor device
CN101321813B (en) * 2005-12-01 2012-07-04 住友电木株式会社 Prepreg, process for producing prepreg, substrate, and semiconductor device
US8409704B2 (en) * 2007-01-25 2013-04-02 Panasonic Corporation Prepreg, printed wiring board, multilayer circuit board, and process for manufacturing printed wiring board
MY149785A (en) * 2007-03-30 2013-10-14 Sumitomo Bakelite Co Prepreg with carrier and process for manufacturing same, multi-layered printed wiring board and semiconductor device
JP5522051B2 (en) * 2008-10-29 2014-06-18 住友ベークライト株式会社 Multilayer printed wiring board and semiconductor device
TWI540170B (en) * 2009-12-14 2016-07-01 Ajinomoto Kk Resin composition
JP5547678B2 (en) * 2011-03-14 2014-07-16 住友ベークライト株式会社 Laminate production method
JP5403190B1 (en) * 2011-12-28 2014-01-29 日本ゼオン株式会社 Prepreg and laminate manufacturing method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106471873A (en) * 2014-05-19 2017-03-01 塞拉电路公司 Embedded trace
CN106717137A (en) * 2014-05-19 2017-05-24 塞拉电路公司 Embedded traces
CN105407625A (en) * 2014-09-05 2016-03-16 三星电机株式会社 Prepreg and method for manufacturing the same
TWI672413B (en) * 2015-03-26 2019-09-21 日商日鐵化學材料股份有限公司 Fiber reinforced plastic molding material, method for producing the same, and molded product
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US11446845B2 (en) 2017-03-28 2022-09-20 Showa Denko Materials Co., Ltd. Method for manufacturing FRP precursor and method for manufacturing FRP
TWI782968B (en) * 2017-03-28 2022-11-11 日商昭和電工材料股份有限公司 Method for producing fiber-reinforced plastic precursor and method for producing fiber-reinforced plastic

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