TW201341470A - Heat conductive silicone composition and cured product thereof - Google Patents

Heat conductive silicone composition and cured product thereof Download PDF

Info

Publication number
TW201341470A
TW201341470A TW101149791A TW101149791A TW201341470A TW 201341470 A TW201341470 A TW 201341470A TW 101149791 A TW101149791 A TW 101149791A TW 101149791 A TW101149791 A TW 101149791A TW 201341470 A TW201341470 A TW 201341470A
Authority
TW
Taiwan
Prior art keywords
group
component
mass
thermally conductive
parts
Prior art date
Application number
TW101149791A
Other languages
Chinese (zh)
Other versions
TWI548699B (en
Inventor
Akihiro Endo
Yuuki Sakurai
Tsukasa Igawa
Takahiro Maruyama
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of TW201341470A publication Critical patent/TW201341470A/en
Application granted granted Critical
Publication of TWI548699B publication Critical patent/TWI548699B/en

Links

Abstract

The present invention provides a heat conductive silicone composition which is excellent in compressibility, insulativity, heat conductivity and workability and especially has a heat conductivity of 3.0 W/mK or more so as to suitably form a heat conductive resin molded article installed between a heat-generating part and a heat-dissipating part in, for example, electric equipment for heat dissipation, and also provides a cured product thereof. The present invention provides a heat conductive silicone composition characterized by containing: (A) an organic polysiloxane containing at least two alkenyl groups in one molecule; (B) an organic hydrogen polysiloxane containing at least two hydrogen atoms directly bonded to silicon atom; and (C) a heat conductive filler, and (D) a platinum group metal-based curing catalyst, wherein the heat conductive filler of the (C) component consists of the following components in specified quantity: (C-i) amorphous aluminum oxide having an average particle diameter of 10 ~ 30μm; (C-ii) spherical aluminum oxide having an average particle diameter of 30 ~ 85μm; and (C-iii) insulated inorganic filler having an average particle diameter of 0.1 ~ 6μm.

Description

熱傳導性聚矽氧組成物及其硬化物 Thermally conductive polyfluorene composition and hardened material thereof

本發明尤其關於利用熱傳導用於電子零件冷卻之介隔在於發熱性電子零件之熱交界面與散熱片或電路基板等散熱構件之界面之作為導熱材料有用之熱傳導性聚矽氧組成物及其硬化物。 More particularly, the present invention relates to a thermally conductive polyphosphonium composition useful as a heat conductive material for thermal conduction of an electronic component by means of an interface between a heat interface of a heat-generating electronic component and a heat dissipating member such as a heat sink or a circuit board, and hardening thereof. Things.

個人電腦、數位影音光碟、行動電話等之電子設備中使用之CPU、驅動IC或記憶體等之LSI晶片隨著高性能化.高速化.小型化.高積體化,其本身產生大量熱,因該熱造成之晶片溫度上升引起晶片之動作不良、破壞。因此,已提案用以抑制動作中之晶片溫度上升之多種散熱方法及其中所使用之散熱構件。 LSI chips such as CPUs, driver ICs, or memories used in electronic devices such as personal computers, digital video discs, and mobile phones are becoming more sophisticated. High speed. miniaturization. Highly integrated, it generates a large amount of heat itself, and the rise in wafer temperature due to the heat causes malfunction and destruction of the wafer. Therefore, various heat dissipation methods for suppressing the rise in temperature of the wafer during operation and heat dissipation members used therein have been proposed.

過去,電子設備等之中,為了抑制動作中之晶片溫度上升,而使用利用鋁或銅等熱傳導率高之金屬板之散熱片。該散熱片傳導該晶片產生之熱,藉由與外部空氣之溫度差異而將該熱自表面釋出。 In the past, in electronic equipment and the like, in order to suppress an increase in the temperature of the wafer during operation, a heat sink using a metal plate having a high thermal conductivity such as aluminum or copper is used. The heat sink conducts heat generated by the wafer, and the heat is released from the surface by a temperature difference from the outside air.

為了使自晶片產生之熱有效地傳遞到散熱片,必須使散熱片密著於晶片,但由於各晶片之高度差異或因組裝加工而有公差,故藉由在晶片與散熱片之間介隔裝有具有柔軟性之薄片、或油脂,透過該薄片或油脂而實現自晶片朝散熱片之熱傳導。 In order to efficiently transfer the heat generated from the wafer to the heat sink, the heat sink must be adhered to the wafer, but the gap between the wafer and the heat sink is separated by the difference in height of each wafer or tolerance due to assembly processing. A flexible sheet or grease is placed through which the heat transfer from the wafer to the heat sink is achieved.

相較於油脂,薄片之處理性優異,故在各種領域中使 用藉熱傳導性聚矽氧橡膠等形成之熱傳導薄片(熱傳導性聚矽氧橡膠薄片)。 Compared with grease, the flakes are excellent in rationality, so they are made in various fields. A heat conductive sheet (thermal conductive polyoxyethylene rubber sheet) formed by heat conductive polyoxymethylene rubber or the like is used.

特開昭47-32400號公報(專利文獻1)中揭示於聚系氧橡膠等之合成橡膠100質量份中調配100~800質量份之由氧化鋇、氧化鋁、水合氧化鋁、氧化鎂、氧化鋅所選出之至少一種以上之金屬氧化物而成之絕緣性組成物。 JP-A-47-32400 (Patent Document 1) discloses that 100 to 800 parts by mass of yttrium oxide, alumina, hydrated alumina, magnesia, and oxidation are blended in 100 parts by mass of a synthetic rubber such as a polyoxyethylene rubber. An insulating composition made of at least one metal oxide selected from zinc.

又,作為用在不需絕緣性之場所之散熱材料,特開昭56-100849號公報(專利文獻2)中揭示於加成硬化型聚矽氧橡膠組成物中調配60~500質量份之二氧化矽及銀、金、矽等熱傳導性粉末而成之組成物。 Further, as a heat-dissipating material for use in a place where no insulation is required, JP-A-56-100849 (Patent Document 2) discloses that 60 to 500 parts by mass of the addition-hardening type polyoxymethylene rubber composition is blended. A composition of cerium oxide and a thermally conductive powder such as silver, gold or bismuth.

然而,該等熱傳導性材料之熱傳導率均低,且,為了提高熱傳導性而以大量高填充熱傳導性填充材時,於液狀聚矽氧橡膠組成物之情況時會有流動性降低之問題,於混練型之聚矽氧橡膠組成物之情況時會有可塑度增加,且均有成形加工性極差之問題。 However, these thermal conductive materials have low thermal conductivity, and when a large amount of highly thermally filled filler is filled in order to improve thermal conductivity, there is a problem that fluidity is lowered in the case of a liquid polyoxyethylene rubber composition. In the case of a kneaded polyoxymethylene rubber composition, there is an increase in plasticity and a problem of extremely poor formability.

因此,解決該等之方法,特開平1-69661號公報(專利文獻3)中揭示填充由平均粒徑5μm以下之氧化鋁粒子10~30質量%及其餘部分為單一粒子之平均粒徑10μm以上且無切割邊緣之形狀的球狀剛玉(corundum)粒子所組成之氧化鋁之高熱傳導性橡膠.塑膠組成物。另外,特開平4-328163號公報(專利文獻4)中揭示由併用平均聚合度6,000~12,000之橡膠狀有機聚矽氧烷與平均聚合度200~2,000之油狀有機聚矽氧烷之珠粒與球狀氧化鋁粉末500~1,200質量份所成之熱傳導性聚矽氧橡膠組成物。 Therefore, in order to solve such a method, it is disclosed in JP-A-1-69661 (Patent Document 3) that the alumina particles having an average particle diameter of 5 μm or less are filled in an amount of 10 to 30% by mass, and the remaining portion is a single particle having an average particle diameter of 10 μm or more. And the high thermal conductivity rubber of alumina composed of spherical corundum particles without cutting edge shape. Plastic composition. Japanese Patent Publication No. 4-328163 (Patent Document 4) discloses a rubbery organopolysiloxane having an average polymerization degree of 6,000 to 12,000 and an oily organopolyoxane having an average polymerization degree of 200 to 2,000. A thermally conductive polyxanthene rubber composition comprising 500 to 1,200 parts by mass of spherical alumina powder.

然而,即使使用該等方法,例如高填充化1,000質量份以上(氧化鋁70體積%以上)之氧化鋁粉末時,僅僅是粒子之組合及聚矽氧珠粒之黏度調整對於成形加工性之提高仍有界限。 However, even if such a method is used, for example, when the alumina powder of 1,000 parts by mass or more (more than 70% by volume of alumina) is highly filled, only the combination of particles and the viscosity adjustment of the poly-xylene beads improve the formability. There are still boundaries.

另一方面,隨著個人電腦、文字處理器、CD-ROM驅動器等之電子設備之高積體化進展,裝置內之LSI、CPU等之積體電路元件之發熱量亦增加,故藉過去之冷卻方法有不足之情況。尤其,於攜帶用之筆記型電腦之情況,由於設備內部之空間狹小故無法安裝大的散熱片或冷卻風扇。另外,該等設備中,積體電路元件係事先搭載於印刷基板上,且基板之材質係使用熱傳導性差之玻璃補強環氧樹脂或聚醯亞胺樹脂,故如過去之介隔散熱絕緣片無法使基板之熱逃逸。 On the other hand, with the advancement of electronic devices such as personal computers, word processors, and CD-ROM drives, the amount of heat generated by integrated circuit components such as LSIs and CPUs in the devices has increased. There are insufficient conditions for the cooling method. In particular, in the case of a notebook computer for carrying, a large heat sink or a cooling fan cannot be installed due to the narrow space inside the device. Further, in these devices, the integrated circuit component is mounted on the printed circuit board in advance, and the material of the substrate is made of a glass-reinforced epoxy resin or a polyimide resin having poor thermal conductivity, so that the heat-insulating insulating sheet cannot be separated in the past. The heat of the substrate escapes.

因此,使用在積體電路元件附近設置自然冷卻型或強制冷卻型之散熱零件,使元件產生之熱傳遞到散熱零件之方式。以該方式使元件與散熱零件直接接觸時,由於表面凹凸使熱的傳遞變差,而且即使介隔散熱絕緣薄片而安裝,由於散熱絕緣薄片之柔軟性稍差,故仍有因熱膨脹而在元件與基板之間施加應力而破損之虞。 Therefore, a heat-dissipating component of a natural cooling type or a forced cooling type is provided in the vicinity of the integrated circuit component to transfer the heat generated by the component to the heat-dissipating component. When the element is directly in contact with the heat dissipating member in this manner, the heat transfer is deteriorated due to the surface unevenness, and even if the heat insulating insulating sheet is interposed, since the heat insulating sheet is slightly inferior, the element is still thermally expanded. A stress is applied between the substrate and the substrate.

又,於各電路元件上裝設散熱零件時需要多餘空間,而使設備難以小型化,故亦採用將若干個元件組合於一散熱零件上而冷卻之方式。 Further, when a heat dissipating component is mounted on each circuit component, an extra space is required, and the device is difficult to be miniaturized. Therefore, a method in which a plurality of components are combined on one heat dissipating component and cooled is also employed.

尤其是筆記型個人電腦中使用之BGA型CPU,由於高度比其他元件低且發熱量大,故必須充分考慮冷卻方 式。 Especially for BGA type CPUs used in notebook PCs, since the height is lower than other components and the heat is large, it is necessary to fully consider the cooling side. formula.

因此,需要可將因每個元件之高度不同產生之各種間隙埋入之低硬度之高熱傳導性材。針對該課題,期望熱傳導性優異、具有柔軟性、且可對應各種間隙之熱傳導性薄片。又,隨著逐年驅動頻率之高頻化,CPU性能提高且發熱量增大,故要求更高熱傳導性之材料。 Therefore, there is a need for a high-hardness conductive material of low hardness which can be buried in various gaps due to the difference in height of each element. In response to this problem, a thermally conductive sheet which is excellent in thermal conductivity and has flexibility and can cope with various gaps is desired. Further, as the frequency of the drive frequency is increased year by year, the CPU performance is improved and the amount of heat generation is increased, so that a material having higher thermal conductivity is required.

該情況下,特開平2-196453號公報(專利文獻5)中揭示使於聚矽氧樹脂中混入金屬氧化物等熱傳導性材料者而成形之薄片,係於具有處理上必要強度之聚矽氧樹脂層上層合柔軟且容易變形之聚矽氧層之薄片。另外,特開平7-266356號公報(專利文獻6)中揭示組合含有熱傳導性填充材且ASKER C硬度為5~50之聚矽氧橡膠層與具有直徑0.3mm以上之孔的多孔性補強材層而成之熱傳導性複合薄片。特開平8-238707號公報(專利文獻7)中揭示以熱傳導性聚矽氧橡膠被覆可撓性之三次元網狀體或發泡體之骨架格子表面之薄片。特開平9-1738號公報(專利文獻8)中揭示內置有具有補強性之薄片或布,且至少一面具有黏著性且ASKER C硬度為5~50之厚度0.4mm以下之熱傳導性複合聚矽氧薄片。特開平9-296114號公報(專利文獻9)中揭示含有加成反應型液狀聚矽氧橡膠與熱傳導性絕緣性陶瓷粉末,且其硬化物之ASKER C硬度為25以下之熱阻抗為3.0℃/W以下之散熱隔離片。 In this case, a sheet formed by mixing a thermally conductive material such as a metal oxide into a polyoxynoxy resin is disclosed in JP-A No. 2-196453 (Patent Document 5), and is a polysiloxane having a necessary strength for processing. A sheet of a soft and easily deformable polysiloxane layer is laminated on the resin layer. Japanese Patent Publication No. Hei 7-266356 (Patent Document 6) discloses a porous reinforced rubber layer having a thermally conductive filler and having an Asker C hardness of 5 to 50 and a pore having a diameter of 0.3 mm or more. A thermally conductive composite sheet. JP-A-H08-238707 (Patent Document 7) discloses a sheet in which a flexible three-dimensional network or a skeleton lattice surface of a foam is coated with a thermally conductive polyoxymethylene rubber. Japanese Laid-Open Patent Publication No. Hei 9-1738 (Patent Document 8) discloses a thermally conductive composite polyfluorene having a reinforcing sheet or cloth and having at least one surface adhesiveness and an Asker C hardness of 5 to 50 and a thickness of 0.4 mm or less. Sheet. Japanese Laid-Open Patent Publication No. Hei 9-296114 (Patent Document 9) discloses an addition reaction type liquid polyoxyxene rubber and a thermally conductive insulating ceramic powder, and the thermal resistance of the cured product having an Asker C hardness of 25 or less is 3.0 ° C. Thermal spacers below /W.

該等熱傳導性聚矽氧硬化物由於大多亦要求絕緣性,故熱傳導率在0.5~6W/mK之範圍時,大多主要使用氧化 鋁(alumina)作為熱傳導性填充材。通常,不定形氧化鋁相較於球狀氧化鋁,提高熱傳導率之效果較高,但對於聚矽氧之填充性差,會有因填充使材料黏度上升,且加工性變差之缺點。另外,氧化鋁如使用於研磨劑中般其莫氏硬度為9,非常硬。因此,尤其使用粒徑為10μm以上之不定形氧化鋁之熱傳導性聚矽氧組成物在製造時若施加剪力,則會有刨削反應釜內壁或攪拌葉片之問題。於是,會於熱傳導性聚矽氧組成物中混入反應釜或攪拌葉片之成分,使熱傳導性聚矽氧組成物及使用其之硬化物之絕緣性降低。又,反應釜與攪拌葉片之間隙變寬,而使攪拌效率下降,在相同條件下製造亦無法獲得一定品質。且會有為了防止該等情況而需要頻繁更換零件之問題。 Most of these thermally conductive polyanthracene cured materials require insulation, so when the thermal conductivity is in the range of 0.5 to 6 W/mK, oxidation is mainly used. Aluminum is used as a thermally conductive filler. In general, the amorphous alumina phase has a higher effect of improving the thermal conductivity than the spherical alumina, but the poor filling property of the polyfluorene oxide has a disadvantage that the viscosity of the material increases due to the filling and the workability is deteriorated. Further, alumina has a Mohs hardness of 9, as used in an abrasive, and is very hard. Therefore, in particular, when a heat conductive polyfluorene oxide composition having an amorphous alumina having a particle diameter of 10 μm or more is used, if a shear force is applied at the time of manufacture, there is a problem that the inner wall of the reaction vessel or the stirring blade is shaved. Then, the components of the reaction vessel or the stirring blade are mixed in the thermally conductive polysiloxane composition, and the insulation properties of the thermally conductive polyfluorene composition and the cured product using the same are lowered. Further, the gap between the reaction vessel and the stirring blade is widened, and the stirring efficiency is lowered, and a certain quality cannot be obtained by manufacturing under the same conditions. There is also the problem of frequent replacement of parts in order to prevent such situations.

為解決該問題,也有僅使用球狀氧化鋁粉之方法,但為了高熱傳導化,相較於不定形氧化鋁,有必要大量填充,而使組成物之黏度上升,使加工性變差。又,由於相對地減少了組成物及其硬化物中之聚矽氧存在量,故會使硬度上升,成為壓縮性差者。再者,由於氧化鋁之理論比重為3.98,相當重,故填充大量氧化鋁時,組成物及硬化物之比重上升。近年來,電子設備朝小型化、輕量化進展,為使電子設備整體輕量化,以零件單位來看時,要求在維持性能下以克或毫克單位更為輕量化者。而氧化鋁之大量填充,由輕量化之觀點而言亦為不利。 In order to solve this problem, there is a method in which only spherical alumina powder is used. However, in order to achieve high heat conduction, it is necessary to fill a large amount of alumina compared to amorphous alumina, and the viscosity of the composition is increased to deteriorate workability. Further, since the amount of polyfluorene oxide in the composition and the cured product thereof is relatively reduced, the hardness is increased and the compressibility is poor. Furthermore, since the theoretical specific gravity of alumina is 3.98, it is quite heavy, so when a large amount of alumina is filled, the specific gravity of the composition and the cured product increases. In recent years, electronic devices have been reduced in size and weight, and in order to reduce the weight of electronic devices as a whole, it is required to be more lightweight in units of grams or milligrams under maintenance performance when viewed in parts. The large amount of filling of alumina is also disadvantageous from the viewpoint of weight reduction.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]特開昭47-32400號公報 [Patent Document 1] JP-A-47-32400

[專利文獻2]特開昭56-100849號公報 [Patent Document 2] JP-A-56-100849

[專利文獻3]特開平1-69661號公報 [Patent Document 3] Japanese Patent Laid-Open No. Hei 1-61661

[專利文獻4]特開平4-328163號公報 [Patent Document 4] JP-A-4-328163

[專利文獻5]特開平2-196453號公報 [Patent Document 5] JP-A-2-196453

[專利文獻6]特開平7-266356號公報 [Patent Document 6] JP-A-H07-266356

[專利文獻7]特開平8-238707號公報 [Patent Document 7] JP-A-8-238707

[專利文獻8]特開平9-1738號公報 [Patent Document 8] Japanese Patent Publication No. 9-1738

[專利文獻9]特開平9-296114號公報 [Patent Document 9] JP-A-9-296114

本發明係鑑於上述情況而完成者,其目的係提供一種壓縮性、絕緣性、熱傳導性、加工性優異,尤其是具有3.0W/mK以上之熱傳導率之適用於例如設置在電子設備內之發熱零件與散熱零件之間之作為散熱用之熱傳導性樹脂成形體之熱傳導性聚矽氧組成物及其硬化物。 The present invention has been made in view of the above circumstances, and an object thereof is to provide a compressibility, an insulating property, a thermal conductivity, and a processability, and in particular, a thermal conductivity of 3.0 W/mK or more is suitable for, for example, heat generation in an electronic device. A thermally conductive polyxanthine composition and a cured product thereof as a thermally conductive resin molded body for heat dissipation between a component and a heat dissipating component.

本發明人等為達成上述目的而進行積極檢討之結果,發現藉由以特定比例併用平均粒徑10~30μm之不定形氧化鋁與平均粒徑為30~85μm之球狀氧化鋁可解決上述問題。亦即,藉由使用平均粒徑為10~30μm之不定形氧化鋁,可有效地提高熱傳導性,抑制比重之增加,且增加組 成中之聚矽氧之比例,可促進橡膠特性之展現。且,藉由併用具有與不定形氧化鋁相同或其以上之平均粒徑之球狀氧化鋁,可提高組成物之流動性,且改善加工性。進而可抑制反應釜或攪拌葉片之磨耗,提高絕緣性。 As a result of conducting a positive review to achieve the above object, the present inventors have found that the above problems can be solved by using a combination of amorphous alumina having an average particle diameter of 10 to 30 μm and spherical alumina having an average particle diameter of 30 to 85 μm in a specific ratio. . That is, by using an amorphous alumina having an average particle diameter of 10 to 30 μm, heat conductivity can be effectively improved, the specific gravity can be suppressed, and the group can be increased. The proportion of polyoxygen in the middle can promote the appearance of rubber properties. Further, by using spherical alumina having an average particle diameter of the same or higher than that of the amorphous alumina, the fluidity of the composition can be improved and the workability can be improved. Further, the abrasion of the reaction vessel or the stirring blade can be suppressed, and the insulation property can be improved.

亦即,發現藉由以球狀氧化鋁彌補不定形氧化鋁之缺點,且藉由不定形氧化鋁彌補球狀氧化鋁之缺點,可獲得壓縮性、絕緣性、熱傳導性、加工性優異,尤其是具有3.0W/mK以上之熱傳導率之熱傳導性聚矽氧組成物及硬化物,因而完成本發明。 That is, it has been found that the disadvantages of the amorphous alumina are compensated by the spherical alumina, and the disadvantages of the spherical alumina are compensated by the amorphous alumina, so that the compressibility, the insulating property, the thermal conductivity, and the workability are excellent, especially It is a thermally conductive polyfluorene composition having a thermal conductivity of 3.0 W/mK or more and a cured product, and thus the present invention has been completed.

因此,本發明提供下述之熱傳導性聚矽氧組成物及其硬化物。 Accordingly, the present invention provides the following thermally conductive polydecane oxide composition and cured product thereof.

[1] [1]

一種熱傳導性聚矽氧組成物,其特徵係含有:(A)一分子中具有至少兩個烯基之有機聚矽氧烷:100質量份,(B)具有至少兩個直接鍵結於矽原子之氫原子的有機氫聚矽氧烷:直接鍵結於矽原子之氫原子的莫耳數為源自(A)成分之烯基之莫耳數之0.1~5.0倍之量,(C)熱傳導性填充材:1,200~6,500質量份,(D)鉑族金屬系硬化觸媒:相對於(A)成分以鉑族金屬元素質量換算為0.1~2,000ppm,且(C)成分之熱傳導性填充材係由下列成分所成:(C-i)平均粒徑10~30μm之不定形氧化鋁500~1,500質量份, (C-ii)平均粒徑30~85μm之球狀氧化鋁150~4,000質量份,(C-iii)平均粒徑0.1~6μm之絕緣性無機填料500~2,000質量份。 A thermally conductive polydecane oxygen composition characterized by: (A) an organopolyoxyalkylene having at least two alkenyl groups in one molecule: 100 parts by mass, (B) having at least two directly bonded to a ruthenium atom The organic hydrogen polyoxyalkylene of a hydrogen atom: the molar number of the hydrogen atom directly bonded to the halogen atom is 0.1 to 5.0 times the number of moles of the alkenyl group derived from the component (A), and (C) heat conduction Filling material: 1,200-6,500 parts by mass, (D) Platinum group metal-based hardening catalyst: 0.1 to 2,000 ppm based on the mass of the platinum group metal element (A), and the thermal conductive filler of the component (C) It is made of the following components: (Ci) 500 to 1,500 parts by mass of amorphous alumina having an average particle diameter of 10 to 30 μm. (C-ii) 150 to 4,000 parts by mass of spherical alumina having an average particle diameter of 30 to 85 μm, and (C-iii) 500 to 2,000 parts by mass of an insulating inorganic filler having an average particle diameter of 0.1 to 6 μm.

[2] [2]

如[1]項所記載之熱傳導性聚矽氧組成物,其進而含有作為(F)成分之由(F-1)以下述通式(1)表示之烷氧基矽烷化合物及(F-2)以下述通式(2)表示之分子鏈單末端以三烷氧基矽烷基封端之二甲基聚矽氧烷所組成之群組選出之至少一種:相對於(A)成分100質量份含有0.01~300質量份,R1 aR2 bSi(OR3)4-a-b (1)(式中,R1獨立為碳原子數6~15之烷基,R2獨立為未取代或經取代之碳原子數1~12之一價烴基,R3獨立為碳原子數1~6之烷基,a為1~3之整數,b為0~2之整數,但a+b為1~3之整數), (式中,R4獨立為碳原子數1~6之烷基,c為5~100之整數)。 The thermally conductive polyfluorene composition according to the above [1], further comprising (F-1) an alkoxydecane compound represented by the following formula (1) as (F) component and (F-2) At least one selected from the group consisting of a dimethyloxypolyoxane terminated with a trialkoxyalkylene group at a single terminal of the molecular chain represented by the following formula (2): 100 parts by mass relative to the component (A) Containing 0.01 to 300 parts by mass of R 1 a R 2 b Si(OR 3 ) 4-ab (1) (wherein R 1 is independently an alkyl group having 6 to 15 carbon atoms, and R 2 is independently unsubstituted or Substituted ones having 1 to 12 carbon atoms, R 3 is independently an alkyl group having 1 to 6 carbon atoms, a is an integer from 1 to 3, and b is an integer from 0 to 2, but a+b is 1~ 3 integer), (wherein R 4 is independently an alkyl group having 1 to 6 carbon atoms, and c is an integer of 5 to 100).

[3] [3]

如[1]或[2]項所記載之熱傳導性聚矽氧組成物,其進而含有相對於(A)成分100質量份為0.1~100質量份之作為(G)成分之以下述通式(3)表示之在23℃之動黏度為10~100,000mm2/s之有機聚矽氧烷, (式中,R5獨立為碳原子數1~12之不含脂肪族不飽和鍵之一價烴基,d為5~2,000之整數)。 The thermally conductive polyfluorene composition according to the above [1] or [2], which further contains 0.1 to 100 parts by mass of the component (G) as the component (G), and has the following formula ( 3) an organic polyoxane having an kinetic viscosity at 23 ° C of 10 to 100,000 mm 2 /s, (wherein R 5 is independently a hydrocarbon group having 1 to 12 carbon atoms and no aliphatic unsaturated bond, and d is an integer of 5 to 2,000).

[4] [4]

如[1]~[3]項中任一項所記載之熱傳導性聚矽氧組成物,其在23℃之黏度為800Pa.s以下。 The thermally conductive polyfluorene composition according to any one of [1] to [3], which has a viscosity at 23 ° C of 800 Pa. s below.

[5] [5]

一種熱傳導性聚矽氧硬化物,其係使如[1]~[4]項中任一項所記載之熱傳導性聚矽氧組成物硬化而成。 A thermally conductive polysulfonated cured product obtained by curing the thermally conductive polydecane oxide composition according to any one of [1] to [4].

[6] [6]

如[5]項所記載之熱傳導性聚矽氧硬化物,其熱傳導率為3.0W/mK以上。 The thermally conductive polyanion cured product according to [5], which has a thermal conductivity of 3.0 W/mK or more.

[7] [7]

如[5]或[6]項所記載之熱傳導性聚矽氧硬化物,其硬度以ASKER C硬度計測量為60以下。 The thermally conductive polyanthracene hardened material as described in [5] or [6] has a hardness of 60 or less as measured by an Asker C hardness meter.

[8] [8]

如[5]~[7]項中任一項所記載之熱傳導性聚矽氧硬化物,其絕緣破壞電壓為10kV/mm以上。 The thermally conductive polyanthracene hardened material according to any one of the items [5] to [7], wherein the dielectric breakdown voltage is 10 kV/mm or more.

本發明之熱傳導性聚矽氧組成物藉由以特定比例併用平均粒徑為10~30μm之不定形氧化鋁及平均粒徑為30~85μm之球狀氧化鋁,藉由以球狀氧化鋁彌補不定形氧化鋁之缺點,且以不定形氧化鋁彌補球狀氧化鋁之缺點,可提供壓縮性、絕緣性、熱傳導性、加工性優異,尤其是具有3.0W/mK以上之熱傳導率之熱傳導性聚矽氧硬化物。 The thermally conductive polyfluorene oxide composition of the present invention is made up of spherical alumina by using amorphous alumina having an average particle diameter of 10 to 30 μm and spherical alumina having an average particle diameter of 30 to 85 μm in a specific ratio. The disadvantage of amorphous alumina, and the disadvantage of amorphous alumina to make up the spherical alumina, can provide excellent compressibility, insulation, thermal conductivity, and processability, especially thermal conductivity with thermal conductivity of 3.0 W/mK or more. Polyoxygenated hardened material.

本發明之熱傳導性聚矽氧組成物含有下列作為必要成分:(A)含有烯基之有機聚矽氧烷、(B)有機氫聚矽氧烷、(C)熱傳導性填充材、(D)鉑族金屬系硬化觸媒。 The thermally conductive polyxanthene composition of the present invention contains the following as an essential component: (A) an alkenyl group-containing organopolyoxane, (B) an organic hydrogen polyoxyalkylene, (C) a thermally conductive filler, and (D) Platinum group metal-based hardening catalyst.

[含烯基之有機聚矽氧烷] [Alkenyl group-containing organic polyoxane]

(A)成分的含有烯基之有機聚矽氧烷為一分子中具有兩個以上鍵結於矽原子之烯基之有機聚矽氧烷,係成為本發明之熱傳導性聚矽氧硬化物之主劑者。通常一般係主鏈 部分基本上由二有機矽氧烷單位之重複所成,但該等亦可為分子構造之一部分含分枝狀之構造者,且亦可為環狀體,但就硬化物之機械強度等、物性方面而言,以直鏈狀二有機聚矽氧烷較佳。 The alkenyl group-containing organopolyoxane of the component (A) is an organopolysiloxane having two or more alkenyl groups bonded to a ruthenium atom in one molecule, and is a thermally conductive polyanthracene of the present invention. The main agent. Usually the main chain Partially consists of repeating units of diorganooxane units, but these may also be those having a branched structure in one part of the molecular structure, and may also be a ring body, but the mechanical strength of the hardened material, etc. In terms of physical properties, a linear diorganopolyoxyalkylene is preferred.

鍵結於矽原子之烯基以外之官能基為未取代或經取代之一價烴基,列舉為例如甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、庚基、辛基、壬基、癸基、十二烷基等之烷基,環戊基、環己基、環庚基等之環烷基,苯基、甲苯基、二甲苯基、萘基、聯苯基等之芳基、苄基、苯乙基、苯丙基、甲基苄基等之芳烷基,以及該等基中之碳原子所鍵結之氫原子之一部分或全部經氟、氯、溴等鹵原子、氰基等取代之基,例如氯甲基、2-溴乙基、3-氯丙基、3,3,3-三氟丙基、氯苯基、氟苯基、氰基乙基、3,3,4,4,5,5,6,6,6-九氟己基等,代表性者為碳原子數1~10者,最具代表性者為碳原子數1~6者,較好為甲基、乙基、丙基、氯甲基、溴乙基、3,3,3-三氟丙基、氰基乙基等之碳原子數1~3之未取代或經取代之烷基,及苯基、氯苯基、氟苯基等之未取代或經取代之苯基。且,鍵結於矽原子之烯基以外之官能基並不限定為全部相同。 The functional group bonded to the alkenyl group of the ruthenium atom is an unsubstituted or substituted one-valent hydrocarbon group, and is exemplified by, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group. An alkyl group such as a pentyl group, a neopentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group, a decyl group or a dodecyl group; a cycloalkyl group such as a cyclopentyl group, a cyclohexyl group or a cycloheptyl group; An aryl group such as an aryl group such as a tolyl group, a xylyl group, a naphthyl group or a biphenyl group; an aralkyl group such as a benzyl group, a phenethyl group, a phenylpropyl group or a methylbenzyl group; and a bond of a carbon atom in the group; a group in which a part or all of a hydrogen atom is substituted with a halogen atom such as fluorine, chlorine or bromine, a cyano group or the like, such as chloromethyl, 2-bromoethyl, 3-chloropropyl, 3,3,3-trifluoropropane. a group, a chlorophenyl group, a fluorophenyl group, a cyanoethyl group, a 3,3,4,4,5,5,6,6,6-nonafluorohexyl group, etc., and a representative one having a carbon number of 1 to 10, The most representative ones are those having 1 to 6 carbon atoms, preferably methyl, ethyl, propyl, chloromethyl, bromoethyl, 3,3,3-trifluoropropyl, cyanoethyl, etc. Unsubstituted or substituted alkyl group having 1 to 3 carbon atoms, and unsubstituted phenyl, chlorophenyl or fluorophenyl groups The phenyl or substituted. Further, the functional groups other than the alkenyl group bonded to the ruthenium atom are not limited to being all the same.

另外,烯基列舉為例如乙烯基、烯丙基、丙烯基、異丙烯基、丁烯基、己烯基、環己烯基等之通常碳原子數為2~8左右之烯基,其中以乙烯基、烯丙基等之低級烯基較佳,尤其較好為乙烯基。又,烯基較好於分子中存在兩個 以上,但為成為所得硬化物之柔軟性良好者,較好僅鍵結於分子量末端之矽原子上而存在。 Further, the alkenyl group is, for example, an alkenyl group having a usual carbon number of from 2 to 8 such as a vinyl group, an allyl group, a propenyl group, an isopropenyl group, a butenyl group, a hexenyl group or a cyclohexenyl group. A lower alkenyl group such as a vinyl group or an allyl group is preferred, and a vinyl group is particularly preferred. Also, the alkenyl group preferably has two in the molecule In the above, in order to obtain good flexibility of the obtained cured product, it is preferred to bond only to the ruthenium atom at the end of the molecular weight.

該有機聚矽氧烷在23℃之動黏度通常為10~100,000mm2/s,最好為500~50,000mm2/s之範圍。前述黏度太低時,會有所得組成物之儲存安定性變差之情況,且太高時會有所得組成物之伸展性變差之情況。又,動黏度為使用Ostwald黏度計測定時之值(以下同)。 The organic polysiloxane has an kinetic viscosity at 23 ° C of usually 10 to 100,000 mm 2 /s, preferably 500 to 50,000 mm 2 /s. When the viscosity is too low, the storage stability of the obtained composition may be deteriorated, and if it is too high, the stretchability of the obtained composition may be deteriorated. Further, the dynamic viscosity is a value measured by an Ostwald viscometer (the same applies hereinafter).

該(A)成分之有機聚矽氧烷可單獨使用一種,亦可組合黏度不同之兩種以上使用。 The organopolyoxane of the component (A) may be used singly or in combination of two or more kinds having different viscosities.

[有機氫聚矽氧烷] [organic hydrogen polyoxyalkylene]

(B)成分之有機氫聚矽氧烷為一分子中具有平均兩個以上,較好2~100個直接鍵結於矽原子上之氫原子(Si-H基)之有機氫聚矽氧烷,係作為(A)成分之交聯劑而作用之成分。亦即,(B)成分中之Si-H基與(A)成分中之烯基藉由後述之(D)成分的鉑族金屬系硬化觸媒促進之氫矽烷基化反應予以加成,獲得具有交聯構造之三次元網目構造。又,Si-H基之數未達兩個時無法硬化。 The organic hydrogen polyoxymethane of the component (B) is an organic hydrogen polyoxyalkylene having an average of two or more, preferably 2 to 100, hydrogen atoms (Si-H groups) directly bonded to the ruthenium atom in one molecule. It is a component which acts as a crosslinking agent of (A) component. In other words, the Si-H group in the component (B) and the alkenyl group in the component (A) are added by a hydroquinone alkylation reaction promoted by a platinum group metal-based curing catalyst of the component (D) described later. A three-dimensional mesh structure having a crosslinked structure. Further, when the number of Si-H groups is less than two, it cannot be hardened.

至於有機氫聚矽氧烷係使用以下述平均構造式(4)表示者,但並不限於該等。 The organohydrogen polyoxyalkylene is represented by the following average structural formula (4), but is not limited thereto.

(式中,R6獨立為氫原子或不含脂肪族不飽和鍵之未取代或經取代之一價烴基,但至少兩個,較好2~10個為氫原子,e為1以上之整數,較好為10~200之整數)。 (wherein R 6 is independently a hydrogen atom or an unsubstituted or substituted one-valent hydrocarbon group which does not contain an aliphatic unsaturated bond, but at least two, preferably 2 to 10 are hydrogen atoms, and e is an integer of 1 or more , preferably an integer from 10 to 200).

式(4)中,R6之氫原子以外之不含脂肪族不飽和鍵之未取代或經取代之一價烴基列舉為例如甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、庚基、辛基、壬基、癸基、十二烷基等之烷基,環戊基、環己基、環庚基等之環烷基,苯基、甲苯基、二甲苯基、萘基、聯苯基等之芳基,苄基、苯乙基、苯丙基、甲基苄基等之芳烷基,及該等基之碳原子所鍵結之氫原子之一部分或全部經氟、氯、溴等鹵原子、氰基等取代之基,例如氯甲基、2-溴乙基、3-氯丙基、3,3,3-三氟丙基、氯苯基、氟苯基、氰基乙基、3,3,4,4,5,5,6,6,6-九氟己基等,代表性者為碳原子數1~10者,最具代表性者為碳原子數1~6者,較好為甲基、乙基、丙基、氯甲基、溴乙基、3,3,3-三氟丙基、氰基乙基等之碳原子數1~3之未取代或經取代之烷基,及苯基、氯苯基、氟苯基等之未取代或經取代之苯基。且,R6不限定於全部相同者。 In the formula (4), an unsubstituted or substituted monovalent hydrocarbon group other than a hydrogen atom of R 6 which does not contain an aliphatic unsaturated bond is exemplified by, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group or a different group. An alkyl group such as a butyl group, a tert-butyl group, a pentyl group, a neopentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group, a decyl group or a dodecyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group or the like. An aryl group such as a cycloalkyl group, a phenyl group, a tolyl group, a xylyl group, a naphthyl group or a biphenyl group; an aralkyl group such as a benzyl group, a phenethyl group, a phenylpropyl group or a methylbenzyl group; and the like a group in which a part or all of a hydrogen atom to which a carbon atom is bonded is substituted with a halogen atom such as fluorine, chlorine or bromine, a cyano group or the like, such as a chloromethyl group, a 2-bromoethyl group, a 3-chloropropyl group, or a 3,3 group. , 3-trifluoropropyl, chlorophenyl, fluorophenyl, cyanoethyl, 3,3,4,4,5,5,6,6,6-hexafluorohexyl, etc., representative of carbon atoms The number of 1 to 10, the most representative ones are those having 1 to 6 carbon atoms, preferably methyl, ethyl, propyl, chloromethyl, bromoethyl, 3,3,3-trifluoropropyl. An unsubstituted or substituted alkyl group having 1 to 3 carbon atoms such as a cyanoethyl group, and a phenyl group, a chlorophenyl group, a fluorophenyl group, or the like. Of an unsubstituted or substituted phenyl. Further, R 6 is not limited to all the same.

(B)成分之添加量係成為源自(B)成分之Si-H基相對於源自(A)成分之烯基1莫耳為0.1~5.0莫耳之量,較好為0.3~2.0莫耳之量,更好為0.5~1.0莫耳之量。源自(B)成分之Si-H基之量相對於源自(A)成分之烯基1莫耳未達0.1莫耳時無法硬化,或因硬化物之強度不足而無法保持 為成形體之形狀而有無法作業之情況。又,超過5.0莫耳時,硬化物之柔軟性消失,硬化物變脆。 The amount of the component (B) added is such that the Si-H group derived from the component (B) is 0.1 to 5.0 moles, preferably 0.3 to 2.0 moles, based on the alkenyl group 1 mole derived from the component (A). The amount of the ear is preferably 0.5 to 1.0 mole. The amount of the Si-H group derived from the component (B) cannot be hardened when the alkenyl group 1 derived from the component (A) is less than 0.1 mol, or cannot be maintained due to insufficient strength of the cured product. There is a case where the shape of the molded body is unworkable. Further, when it exceeds 5.0 mol, the softness of the cured product disappears and the cured product becomes brittle.

[熱傳導性填充材] [thermal conductive filler]

(C)成分的熱傳導性填充材為主要含有氧化鋁者,且為由下述(C-i)~(C-iii)成分所成者。 The thermally conductive filler of the component (C) is mainly composed of the following (C-i) to (C-iii) components.

(C-i)平均粒徑10~30μm之不定形氧化鋁,(C-ii)平均粒徑30~85μm之球狀氧化鋁,(C-iii)平均粒徑0.1~6μm之絕緣性無機填料。 (C-i) an amorphous alumina having an average particle diameter of 10 to 30 μm, (C-ii) a spherical alumina having an average particle diameter of 30 to 85 μm, and (C-iii) an insulating inorganic filler having an average particle diameter of 0.1 to 6 μm.

又,本發明中,上述平均粒徑為以日機裝(股)製造之粒度分析計Microtrack MT3300EX測定之體積基準之累積平均粒徑(中值直徑)之值。 Further, in the present invention, the average particle diameter is a value of a cumulative average particle diameter (median diameter) based on a volume basis measured by a particle size analyzer Microtrack MT3300EX manufactured by a Japanese machine.

(C-i)成分之不定形氧化鋁可更提高熱傳導率。不定形氧化鋁之平均粒徑為10~30μm,較好為15~25μm。平均粒徑未達10μm時,提高熱傳導性之效果變低,且,組成物黏度上升,加工性變差。另外,平均粒徑大於30μm時,反應釜或攪拌葉片之磨耗顯著,使組成物之絕緣性下降。(C-i)成分之不定形氧化鋁可使用一種或複合兩種以上使用。又,不定形氧化鋁可使用一般市售品。 The amorphous alumina of the (C-i) component can further increase the thermal conductivity. The average particle diameter of the amorphous alumina is 10 to 30 μm, preferably 15 to 25 μm. When the average particle diameter is less than 10 μm, the effect of improving the thermal conductivity is lowered, and the viscosity of the composition is increased, and the workability is deteriorated. Further, when the average particle diameter is more than 30 μm, the abrasion of the reaction vessel or the stirring blade is remarkable, and the insulation of the composition is lowered. The amorphous alumina of the component (C-i) may be used alone or in combination of two or more. Further, as the amorphous alumina, a general commercial product can be used.

(C-ii)成分的球狀氧化鋁提高了組成物之熱傳導率,同時抑制不定形氧化鋁與反應釜或攪拌葉片之接觸,提供抑制磨耗之障壁效果。平均粒徑為30~85μm,較好為40~80μm。平均粒徑未達30μm時,障壁效果降低,因不定形粒子造成之反應釜或攪拌葉片之磨耗顯著。另一方面平 均粒徑大於85μm時,組成物中氧化鋁變得容易沉降,而損及組成物之均勻性。(C-ii)成分的球狀氧化鋁可使用一種亦可複合兩種以上使用。又,球狀氧化鋁可使用一般市售品。 The spherical alumina of the component (C-ii) increases the thermal conductivity of the composition while suppressing the contact of the amorphous alumina with the reaction vessel or the stirring blade, thereby providing a barrier effect of suppressing abrasion. The average particle diameter is 30 to 85 μm, preferably 40 to 80 μm. When the average particle diameter is less than 30 μm, the barrier effect is lowered, and the abrasion of the reaction vessel or the stirring blade due to the amorphous particles is remarkable. On the other hand When the average particle diameter is more than 85 μm, the alumina in the composition tends to settle easily, and the uniformity of the composition is impaired. The spherical alumina of the component (C-ii) may be used singly or in combination of two or more. Further, as the spherical alumina, a general commercial product can be used.

(C-iii)成分的絕緣性無機填料亦擔任提高組成物之熱傳導率之角色,但其主要角色為調整組成物之黏度、防止沉降、提高滑動性、提高填充性。且,亦擔任著色、難燃性提高、強度提高、壓縮永久變形提高等之角色。為了確保組成物之絕緣性,填充劑有必要具有絕緣性。(C-iii)成分的平均粒徑為0.1~6μm,為了展現上述特性較好為0.5~4μm。平均粒徑未達0.1μm時,組成物之黏度顯著變大,而大幅損及成形性。又,平均粒徑大於6μm時,損及組成物之滑動性,且填料之沉降急速進行,故損及成形體之熱傳導性及組成物之成形性。 The insulating inorganic filler of the component (C-iii) also serves to improve the thermal conductivity of the composition, but its main role is to adjust the viscosity of the composition, prevent sedimentation, improve slidability, and improve filling. In addition, it also plays a role in coloring, improvement in flame retardancy, improvement in strength, and improvement in compression set. In order to ensure the insulation of the composition, it is necessary for the filler to have insulation. The average particle diameter of the component (C-iii) is 0.1 to 6 μm, and it is preferably 0.5 to 4 μm in order to exhibit the above characteristics. When the average particle diameter is less than 0.1 μm, the viscosity of the composition is remarkably large, and the formability is largely impaired. Further, when the average particle diameter is more than 6 μm, the slidability of the composition is impaired, and the sedimentation of the filler proceeds rapidly, so that the thermal conductivity of the molded body and the formability of the composition are impaired.

至於(C-iii)成分的絕緣性無機填料可使用例如上述(C-i)、(C-ii)成分以外之氧化鋁、二氧化矽、氧化鎂、紅色氧化鐵、氧化鋇、氧化鈦、氧化鋯等之金屬氧化物,氮化鋁、氮化矽、氮化硼等之金屬氮化物、氫氧化鋁、氫氧化鎂等之金屬氫氧化物、人工鑽石等,該等形狀可為球狀亦可為不定形,進而可使用該等之一種或複合兩種以上使用。又,絕緣性無機填料可使用一般之市售品。 As the insulating inorganic filler of the component (C-iii), for example, alumina other than the above (Ci) and (C-ii) components, cerium oxide, magnesium oxide, red iron oxide, cerium oxide, titanium oxide, or zirconia can be used. Metal oxides such as aluminum nitride, tantalum nitride, boron nitride, metal hydroxides such as aluminum hydroxide or magnesium hydroxide, artificial diamonds, etc., and the shapes may be spherical or In order to be indefinite, one type or a combination of two or more types may be used. Further, as the insulating inorganic filler, a general commercial product can be used.

(C-i)成分之調配量相對於(A)成分100質量份為500~1,500質量份,較好為700~1,200質量份。太少時熱傳導率之提升困難,太多時組成物喪失流動性,損及成形 性。又,反應釜或攪拌葉片之磨耗變顯著,使組成物之絕緣性下降。 The blending amount of the component (C-i) is 500 to 1,500 parts by mass, preferably 700 to 1,200 parts by mass, per 100 parts by mass of the component (A). Too little thermal conductivity is difficult to increase, too much composition loses fluidity, damages forming Sex. Further, the abrasion of the reaction vessel or the stirring blade is remarkable, and the insulation of the composition is lowered.

(C-ii)成分之調配量相對於(A)成分100質量份為150~4,000質量份,較好為200~3,000質量份。太少時熱傳導率之提升困難,太多時組成物喪失流動性,而損及成形性。 The blending amount of the component (C-ii) is 150 to 4,000 parts by mass, preferably 200 to 3,000 parts by mass, per 100 parts by mass of the component (A). When the amount is too small, the improvement of the thermal conductivity is difficult. When too much, the composition loses fluidity and the formability is impaired.

(C-iii)成分之調配量相對於(A)成分100質量份為500~2,000質量份,較好為600~1,800質量份。太少時損及組成物之滑動性,且由於填料之沉降急速進行,故損及成形體之熱傳導性及組成物之成形性。太多時組成物之黏度顯著變大,而大幅損及成形性。 The blending amount of the component (C-iii) is 500 to 2,000 parts by mass, preferably 600 to 1,800 parts by mass, per 100 parts by mass of the component (A). When the amount is too small, the slidability of the composition is impaired, and the sedimentation of the filler proceeds rapidly, thereby impairing the thermal conductivity of the molded body and the formability of the composition. When too much, the viscosity of the composition is remarkably large, and the formability is greatly impaired.

另外,(C)成分之調配量(亦即,上述(C-i)~(C-iii)成分之合計調配量)相對於(A)成分100質量份需為1,200~6,500質量份,較好為1,500~5,500質量份。該調配量未達1,200質量份時,所得組成物之熱傳導率變差以外,組成物黏度亦成為極低黏度,成為缺乏儲存安定性者,超過6,500質量份時,組成物缺乏伸展性,成為硬度高且強度弱之成形物。 In addition, the amount of the component (C) (that is, the total amount of the components (Ci) to (C-iii)) is required to be 1,200 to 6,500 parts by mass, preferably 1,500, per 100 parts by mass of the component (A). ~5,500 parts by mass. When the amount is less than 1,200 parts by mass, the thermal conductivity of the obtained composition is deteriorated, and the viscosity of the composition is extremely low viscosity, which is a lack of storage stability. When the amount exceeds 6,500 parts by mass, the composition lacks stretchability and becomes hardness. A molded product that is high and weak.

藉由以上述調配比例使用(C)成分,可更有利且確實地達成上述本發明之效果。 By using the component (C) in the above-mentioned blending ratio, the effects of the above-described invention can be more advantageously and surely achieved.

[鉑族金屬系硬化觸媒] [Platinum group metal-based hardening catalyst]

(D)成分之鉑族金屬系硬化觸媒為促進源自(A)成分之烯基與源自(B)成分之Si-H基之加成反應用之觸媒,列舉 為作為氫矽烷基化反應用之觸媒而周知者。其具體例列舉為鉑(包含鉑黑)、銠、鈀等之鉑族金屬單體、H2PtCl4.nH2O、H2PtCl6.nH2O、NaHPtCl6.nH2O、KaHPtCl6.nH2O、Na2PtCl6.nH2O、K2PtCl4.nH2O、PtCl4.nH2O、PtCl2、Na2HPtCl4.nH2O(但,式中,n為0~6之整數,較好為0或6)等之氯化鉑、氯化鉑酸及氯化鉑酸鹽、醇改質之氯化鉑酸(參照美國專利第3,220,972號說明書)、氯化鉑酸與烯烴之錯合物(參照美國專利第3,159,601號說明書、美國專利第3,159,662號說明書、美國專利第3,775,452號說明書)、使鉑黑、鈀等之鉑族金屬擔持於氧化鋁、二氧化矽、碳等擔體上者、銠-烯烴錯合物、氯參(三苯膦)銠(威爾金森氏(Wilkinson)觸媒)、氯化鉑、氯化鉑酸或氯化鉑酸鹽與含有乙烯基之矽氧烷,尤其是與含乙烯基之環狀矽氧烷之錯合物等。 The platinum group metal-based curing catalyst of the component (D) is a catalyst for promoting an addition reaction of an alkenyl group derived from the component (A) and a Si-H group derived from the component (B), and is exemplified as a hydroquinone alkyl group. It is known to use the catalyst for the reaction. Specific examples thereof include platinum group metal monomers such as platinum (including platinum black), ruthenium, and palladium, and H 2 PtCl 4 . nH 2 O, H 2 PtCl 6 . nH 2 O, NaHPtCl 6 . nH 2 O, KaHPtCl 6 . nH 2 O, Na 2 PtCl 6 . nH 2 O, K 2 PtCl 4 . nH 2 O, PtCl 4 . nH 2 O, PtCl 2 , Na 2 HPtCl 4 . nH 2 O (however, n is an integer of 0 to 6, preferably 0 or 6), such as platinum chloride, chloroplatinic acid and chloroplatinate, and alcohol-modified platinum chloride ( Refer to the specification of U.S. Patent No. 3,220,972, the chloroplatinic acid and olefin complexes (refer to the specification of U.S. Patent No. 3,159,601, the specification of U.S. Patent No. 3,159,662, the specification of U.S. Patent No. 3,775,452), such as platinum black, palladium, etc. The platinum group metal is supported on a support such as alumina, ceria, or carbon, a ruthenium-olefin complex, a chloroform (triphenylphosphine) ruthenium (Wilkinson catalyst), and a platinum chloride. And a platinum chloride acid or a platinum chloride salt and a vinyl group-containing decane, especially a complex of a vinyl group-containing cyclic siloxane.

(D)成分之使用量相對於(A)成分之以鉑族金屬元素之質量換算為0.1~2,000ppm,較好為50~1,000ppm。 The amount of the component (D) to be used is 0.1 to 2,000 ppm, preferably 50 to 1,000 ppm, based on the mass of the platinum group metal element of the component (A).

[反應控制劑] [Reaction Control Agent]

本發明之熱傳導性聚矽氧組成物可進一步使用加成反應控制劑作為(E)成分。加成反應控制劑可全部使用一般之加成反應硬化型聚矽氧組成物所使用之習知加成反應控制劑。列舉為例如1-乙炔基-1-己醇、3-丁炔-1-醇、乙炔基亞甲基卡必醇等之乙炔化合物或各種氮化合物、有機磷化合物、肟化合物、有機氯化合物等。 The thermally conductive polyfluorene composition of the present invention may further use an addition reaction controlling agent as the component (E). As the addition reaction controlling agent, a conventional addition reaction controlling agent used in a general addition reaction hardening type polyoxo composition can be used. For example, it is an acetylene compound such as 1-ethynyl-1-hexanol, 3-butyn-1-ol, ethynylmethylene carbitol, or various nitrogen compounds, organophosphorus compounds, hydrazine compounds, organochlorine compounds, and the like. .

調配(E)成分時之使用量相對於(A)成分100質量份宜為0.01~1質量份,最好為0.1~0.8質量份左右。調配量太多時硬化反應無法進行,有損及成形效率之情況。 The amount of the component (E) to be used is preferably 0.01 to 1 part by mass, more preferably about 0.1 to 0.8 part by mass, per 100 parts by mass of the component (A). When the amount of the mixture is too large, the hardening reaction cannot be performed, which may impair the forming efficiency.

[表面處理劑] [surface treatment agent]

本發明之熱傳導性聚矽氧組成物中,在組成物調製時為了使(C)成分的熱傳導性填充材經疏水化處理,提高與(A)成分的有機聚矽氧烷之濡濕性,使(C)成分的熱傳導性填充材均勻分散於由(A)成分所成之基質中,而可調配(F)成分的表面處理劑。該(F)成分最好為下述所示之(F-1)成分及(F-2)成分。 In the thermally conductive polyanthracene composition of the present invention, in order to prepare the heat conductive filler of the component (C) by hydrophobization during preparation of the composition, the wettability of the organopolyoxyalkylene of the component (A) is improved. The thermally conductive filler of the component (C) is uniformly dispersed in a matrix formed of the component (A), and a surface treatment agent of the component (F) is formulated. The component (F) is preferably a component (F-1) and a component (F-2) shown below.

(F-1)成分為以下述通式(1)表示之烷氧基矽烷化合物。 The component (F-1) is an alkoxydecane compound represented by the following formula (1).

R1 aR2 bSi(OR3)4-a-b (1) R 1 a R 2 b Si(OR 3 ) 4-ab (1)

(式中,R1獨立為碳原子數6~15之烷基,R2獨立為未取代或經取代之碳原子數1~12之一價烴基,R3獨立為碳原子數1~6之烷基,a為1~3之整數,b為0~2之整數,但a+b為1~3之整數)。 (wherein R 1 is independently an alkyl group having 6 to 15 carbon atoms, and R 2 is independently an unsubstituted or substituted hydrocarbon group having 1 to 12 carbon atoms, and R 3 is independently a carbon number of 1 to 6 Alkyl, a is an integer from 1 to 3, and b is an integer from 0 to 2, but a+b is an integer from 1 to 3.

上述通式(1)中,以R1表示之烷基列舉為例如己基、辛基、壬基、癸基、十二烷基、十四烷基等。以該R1表示之烷基之碳原子數滿足6~15之範圍時,(A)成分之濡濕性充分提高,處理性良好,且成為組成物之低溫特性良 好者。 In the above formula (1), the alkyl group represented by R 1 is exemplified by, for example, a hexyl group, an octyl group, a decyl group, a decyl group, a dodecyl group, a tetradecyl group or the like. When the number of carbon atoms of the alkyl group represented by R 1 is in the range of 6 to 15, the wettability of the component (A) is sufficiently improved, the handleability is good, and the low-temperature characteristics of the composition are good.

以R2表示之未取代或經取代之一價烴基列舉為例如甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、庚基、辛基、壬基、癸基、十二烷基等之烷基,環戊基、環己基、環庚基等之環烷基,苯基、甲苯基、二甲苯基、萘基、聯苯基等之芳基,苄基、苯乙基、苯丙基、甲基苄基等之芳烷基,及該等基之碳原子所鍵結之氫原子之一部分或全部經氟、氯、溴等鹵原子、氰基等取代之基,例如氯甲基、2-溴乙基、3-氯丙基、3,3,3-三氟丙基、氯苯基、氟苯基、氰基乙基、3,3,4,4,5,5,6,6,6-九氟己基等,代表性者為碳原子數1~10者,最具代表性者為碳原子數1~6者,較好為甲基、乙基、丙基、氯甲基、溴乙基、3,3,3-三氟丙基、氰基乙基等之碳原子數1~3之未取代或經取代之烷基,及苯基、氯苯基、氟苯基等之未取代或經取代之苯基。至於R3列舉為甲基、乙基、丙基、丁基、己基等。 The unsubstituted or substituted one-valent hydrocarbon group represented by R 2 is exemplified by, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl. An alkyl group such as heptyl, octyl, decyl, decyl or dodecyl, a cycloalkyl group such as a cyclopentyl group, a cyclohexyl group or a cycloheptyl group, a phenyl group, a tolyl group, a xylyl group or a naphthyl group. An aryl group such as a biphenyl group, an aralkyl group such as a benzyl group, a phenethyl group, a phenylpropyl group or a methylbenzyl group, and a part or all of a hydrogen atom bonded to a carbon atom of the group is partially or partially fluorine-containing. a halogen atom such as chlorine or bromine, or a substituted group such as a cyano group, such as chloromethyl, 2-bromoethyl, 3-chloropropyl, 3,3,3-trifluoropropyl, chlorophenyl or fluorophenyl. Cyanoethyl, 3,3,4,4,5,5,6,6,6-nonafluorohexyl, etc., representative of the number of carbon atoms 1 to 10, the most representative is the number of carbon atoms ~6, preferably methyl, ethyl, propyl, chloromethyl, bromoethyl, 3,3,3-trifluoropropyl, cyanoethyl, etc., unsubstituted with 1 to 3 carbon atoms Or a substituted alkyl group, and an unsubstituted or substituted phenyl group such as a phenyl group, a chlorophenyl group, a fluorophenyl group or the like. R 3 is exemplified by methyl, ethyl, propyl, butyl, hexyl and the like.

(F-2)成分為以下述通式(2)表示之分子鏈末端以三烷氧基矽烷基封端之二甲基聚矽氧烷。 The component (F-2) is a dimethylpolyoxane terminated with a trialkoxyalkylene group at the end of the molecular chain represented by the following formula (2).

(式中,R4獨立為碳原子數1~6之烷基,c為5~ 100,較好為5~70,最好為10~50之整數)。 (wherein R 4 is independently an alkyl group having 1 to 6 carbon atoms, and c is 5 to 100, preferably 5 to 70, more preferably an integer of 10 to 50).

上述通式(2)中,以R4表示之烷基可例示與上述通式(1)中之以R3表示之烷基相同者。 In the above formula (2), the alkyl group represented by R 4 may be the same as the alkyl group represented by R 3 in the above formula (1).

(F)成分之表面處理劑可調配(F-1)成分與(F-2)成分之任一者亦可組合二者調配均無妨。 The surface treatment agent of the component (F) may be blended with either the (F-1) component or the (F-2) component.

調配(F)成分時之調配量相對於(A)成分100質量份較好為0.01~300質量份,最好為0.1~200質量份。本成分之比例較多時會有誘發油分離之可能性。 The amount of the component (F) to be blended is preferably from 0.01 to 300 parts by mass, more preferably from 0.1 to 200 parts by mass, per 100 parts by mass of the component (A). When the proportion of this component is large, there is a possibility of inducing oil separation.

[有機聚矽氧烷] [Organic Polyoxane]

本發明之熱傳導性聚矽氧組成物為了賦予熱傳導性聚矽氧組成物之黏度調整等特性,可添加作為(G)成分之以下述通式(3)表示之在23℃下之動黏度為10~100,000mm2/s之有機聚矽氧, In order to impart characteristics such as viscosity adjustment of the thermally conductive polyfluorene composition, the thermal conductive polyfluorene composition of the present invention may have a dynamic viscosity at 23 ° C represented by the following general formula (3) as a component (G). 10~100,000mm 2 /s organic polyoxygen,

(式中,R5獨立為碳原子數1~12之不含脂肪族不飽和鍵之一價烴基,d為5~2,000之整數)。(G)成分可單獨使用一種,亦可併用兩種以上。 (wherein R 5 is independently a hydrocarbon group having 1 to 12 carbon atoms and no aliphatic unsaturated bond, and d is an integer of 5 to 2,000). The component (G) may be used alone or in combination of two or more.

上述通式(3)中,R5獨立為未取代或經取代之碳原子數1~12之不含脂肪族不飽和鍵之一價烴基。至於R5列 舉為例如甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、新戊基、己基、庚基、辛基、壬基、癸基、十二烷基等之烷基,環戊基、環己基、環庚基等之環烷基,苯基、甲苯基、二甲苯基、萘基、聯苯基等之芳基,苄基、苯乙基、苯丙基、甲基苄基等之芳烷基,及該等基之碳原子所鍵結之氫原子之一部分或全部經氟、氯、溴等鹵原子、氰基等取代之基,例如氯甲基、2-溴乙基、3-氯丙基、3,3,3-三氟丙基、氯苯基、氟苯基、氰基乙基、3,3,4,4,5,5,6,6,6-九氟己基等,代表性者為碳原子數為1~10者,最具代表性者為碳原子數為1~6者,較好為甲基、乙基、丙基、氯甲基、溴乙基、3,3,3-三氟丙基、氰基乙基等之碳原子數1~3之未取代或經取代之烷基,及苯基、氯苯基、氟苯基等之未取代或經取代之苯基,最好為甲基、苯基。 In the above formula (3), R 5 is independently an unsubstituted or substituted one-valent hydrocarbon group having 1 to 12 carbon atoms and having no aliphatic unsaturated bond. R 5 is exemplified by, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, heptyl, octyl, decyl, fluorene. An alkyl group such as a cycloalkyl group, a cycloalkyl group such as a cyclopentyl group, a cyclohexyl group or a cycloheptyl group; an aryl group such as a phenyl group, a tolyl group, a xylyl group, a naphthyl group or a biphenyl group; An aralkyl group such as phenethyl, phenylpropyl or methylbenzyl, and a part or all of a hydrogen atom bonded to a carbon atom of the group are substituted by a halogen atom such as fluorine, chlorine or bromine, or a cyano group. a group such as chloromethyl, 2-bromoethyl, 3-chloropropyl, 3,3,3-trifluoropropyl, chlorophenyl, fluorophenyl, cyanoethyl, 3,3,4, 4,5,5,6,6,6-nonafluorohexyl, etc., representatively having a carbon number of 1 to 10, the most representative ones having a carbon number of 1 to 6, preferably a methyl group An unsubstituted or substituted alkyl group having 1 to 3 carbon atoms, such as ethyl, propyl, chloromethyl, bromoethyl, 3,3,3-trifluoropropyl or cyanoethyl, and benzene The unsubstituted or substituted phenyl group such as a chlorophenyl group or a fluorophenyl group is preferably a methyl group or a phenyl group.

上述d基於所要求之黏度的觀點觀之,較好為5~2,000之整數,最好為10~1,000之整數。 The above d is preferably an integer of 5 to 2,000, preferably an integer of 10 to 1,000, based on the viewpoint of the desired viscosity.

又,(G)成分的在23℃之動黏度較好為10~100,000mm2/s,最好為100~10,000mm2/s。該動黏度低於10mm2/s時,所得組成物之硬化物容易發生滲油。該動黏度大於100,000mm2/s時,所得熱傳導性聚矽氧組成物容易缺乏柔軟性。 Further, the dynamic viscosity of the component (G) at 23 ° C is preferably from 10 to 100,000 mm 2 /s, preferably from 100 to 10,000 mm 2 /s. When the dynamic viscosity is less than 10 mm 2 /s, the cured product of the obtained composition is liable to seep. When the dynamic viscosity is more than 100,000 mm 2 /s, the resulting thermally conductive polyfluorene composition tends to be inferior in flexibility.

本發明之熱傳導性聚矽氧組成物中添加(G)成分時,其添加量並無特別限制,只要是獲得期望效果之量即可,但相對於(A)成分100質量份較好為0.1~100質量份,更 好為1~50質量份。該添加量落在該範圍時,硬化前之熱傳導性聚矽氧組成物容易維持良好之流動性、作業性,且(C)成分之熱傳導性填充材容易填充於該組成物中。 When the component (G) is added to the thermally conductive polyfluorene composition of the present invention, the amount thereof to be added is not particularly limited as long as it is a desired effect, but it is preferably 0.1 part by mass based on 100 parts by mass of the component (A). ~100 parts by mass, more It is preferably 1 to 50 parts by mass. When the amount of addition is within this range, the thermally conductive polyfluorene composition before curing tends to maintain good fluidity and workability, and the thermally conductive filler of the component (C) is easily filled in the composition.

[其他成分] [Other ingredients]

本發明之熱傳導性聚矽氧組成物中,在不損及本發明之目的及作用效果之範圍內,亦可進一步調配其他成分。例如可調配氧化鐵、氧化鈰等之耐熱性提高劑;二氧化矽等之黏度調整劑;著色劑;脫模劑等之任意成分。 In the thermally conductive polyfluorene composition of the present invention, other components may be further blended within the range not impairing the object and the effects of the present invention. For example, it is possible to adjust a heat resistance improving agent such as iron oxide or cerium oxide; a viscosity adjusting agent such as cerium oxide; a coloring agent; and an optional component such as a releasing agent.

[熱傳導性聚矽氧組成物之調製] [Modulation of thermally conductive polyfluorene composition]

本發明之熱傳導性聚矽氧組成物可依據慣用方法均勻混合上述各成分而調製。 The thermally conductive polyfluorene composition of the present invention can be prepared by uniformly mixing the above components in accordance with a conventional method.

[組成物之黏度] [Viscosity of composition]

本發明之熱傳導性聚矽氧組成物之黏度在23℃為800Pa.s以下,較好為700Pa.s以下。黏度太高時有損及成形性之情況。又,本發明中,其黏度係基於以B型黏度計測定者。 The viscosity of the thermally conductive polyfluorene composition of the present invention is 800 Pa at 23 ° C. Below s, preferably 700Pa. s below. When the viscosity is too high, the formability is impaired. Further, in the present invention, the viscosity is based on a B-type viscosity meter.

[熱傳導性聚矽氧硬化物之製造方法] [Manufacturing method of thermally conductive polyfluorene cured product]

使熱傳導性聚矽氧組成物成形之硬化條件與習知之加成反應硬化型聚矽氧橡膠組成物相同即可,例如在常溫下即可充分硬化,但亦可視需要加熱。較好在100~120℃加 成硬化8~12分鐘。如此本發明之聚矽氧硬化物之熱傳導性優異。 The curing conditions for forming the thermally conductive polydecane oxide composition may be the same as those of the conventional addition reaction-curable polyoxyxene rubber composition. For example, the curing can be sufficiently cured at normal temperature, but it may be heated as needed. Better in 100~120 °C Hardened for 8~12 minutes. Thus, the polyoxygenated hardened material of the present invention is excellent in thermal conductivity.

[成形體之熱傳導率] [The thermal conductivity of the molded body]

本發明之成形體(熱傳導性聚矽氧硬化物)之熱傳導率以熱盤(hot disc)法測定之在25℃之測定值宜為3.0W/mK以上,最好為4.0W/mK以上。熱傳導率未達3.0W/mK時,會有無法應用於發熱量大之發熱體之情況。又該熱傳導率可藉由調整熱傳導性填充材之種類或粒徑之組合予以調整。 The thermal conductivity of the molded article (thermally conductive polysulfide cured product) of the present invention is preferably 3.0 W/mK or more, preferably 4.0 W/mK or more, as measured by a hot disc method at 25 °C. When the thermal conductivity is less than 3.0 W/mK, there is a case where it cannot be applied to a heating element having a large amount of heat. Further, the thermal conductivity can be adjusted by adjusting the type of the thermally conductive filler or a combination of the particle diameters.

[成形體之絕緣破壞電壓] [Insulation breakdown voltage of molded body]

本發明之成形體之絕緣破壞電壓係依據JIS K 6249測定1mm厚之成形體之絕緣破壞電壓時之測定值,較好為10kV以上,更好為13kV以上。絕緣破懷電壓為10kV/mm以下之薄片時,使用時難以確保安定的絕緣。又,該絕緣破壞電壓可藉由調整填料之種類或純度予以調整。 The dielectric breakdown voltage of the molded article of the present invention is preferably 10 kV or more, more preferably 13 kV or more, in accordance with JIS K 6249, when the dielectric breakdown voltage of a molded body having a thickness of 1 mm is measured. When the insulation damage voltage is 10 kV/mm or less, it is difficult to ensure stable insulation during use. Moreover, the dielectric breakdown voltage can be adjusted by adjusting the type or purity of the filler.

[成形體之硬度] [hardness of formed body]

本發明之成形體之硬度以ASKER C硬度計測定之在25℃之測定值為60以下,較好為40以下,更好為30以下,且較好為5以上。硬度超過60時,會有無法沿著被散熱體之形狀而變形,無法對被散熱體施加應力而難以顯示良好之散熱特性之情況。又,該硬度可藉由改變(A)成 分與(B)成分之比率,調整交聯密度予以調整。 The hardness of the molded article of the present invention is 60 or less, preferably 40 or less, more preferably 30 or less, and more preferably 5 or more, as measured by an Asker C hardness meter at 25 °C. When the hardness exceeds 60, the shape of the heat dissipating body cannot be deformed, and it is not possible to apply stress to the heat dissipating body, and it is difficult to exhibit good heat dissipation characteristics. Also, the hardness can be changed by (A) The ratio of the component to the component (B) is adjusted to adjust the crosslinking density.

[實施例] [Examples]

以下顯示實施例及比較例具體說明本發明,但本發明並不受限於下述實施例。又,動黏度係在23℃以Ostwald黏度計測定。且,平均粒徑係以日機裝(股)製造之粒度分析計MicrotrackMT3300EX測定之體積基準之累積平均粒徑(中值直徑)之值。 The present invention will be specifically described below by showing examples and comparative examples, but the present invention is not limited to the following examples. Further, the dynamic viscosity was measured at 23 ° C using an Ostwald viscometer. Further, the average particle diameter is a value of a cumulative average particle diameter (median diameter) of a volume basis measured by a particle size analyzer Microtrack MT3300EX manufactured by Nikkiso Co., Ltd.

下述實施例及比較例中所使用之(A)~(F)成分示於下述。 The components (A) to (F) used in the following examples and comparative examples are shown below.

(A)成分: (A) Ingredients:

以下述式(5)表示之有機聚矽氧烷。 An organopolyoxane represented by the following formula (5).

(式中,X為乙烯基,f為獲得下述黏度之數)。 (wherein X is a vinyl group and f is a number of the following viscosity).

(A-1)動黏度:600mm2/s (A-1) Dynamic viscosity: 600mm 2 / s

(A-2)動黏度:30,000mm2/s (A-2) Dynamic viscosity: 30,000 mm 2 /s

(B)成分: (B) Ingredients:

以下述式(6)表示之有機氫聚矽氧烷。 An organohydrogenpolyoxyalkylene represented by the following formula (6).

(式中,g為28,h為2)。 (wherein g is 28 and h is 2).

(C)成分: (C) ingredients:

平均粒徑如下述之不定形氧化鋁、球狀氧化鋁、不定形氫氧化鋁。 The average particle diameter is as follows: amorphous alumina, spherical alumina, and amorphous aluminum hydroxide.

(C-1)平均粒徑為1μm之不定形氫氧化鋁 (C-1) Amorphous aluminum hydroxide having an average particle diameter of 1 μm

(C-2)平均粒徑為1.5μm之不定形氧化鋁 (C-2) Unshaped alumina having an average particle diameter of 1.5 μm

(C-3)平均粒徑為1.5μm之球狀氧化鋁 (C-3) Spherical alumina having an average particle diameter of 1.5 μm

(C-4)平均粒徑為3.6μm之不定形氧化鋁 (C-4) Unshaped alumina having an average particle diameter of 3.6 μm

(C-5)平均粒徑為18μm之不定形氧化鋁 (C-5) Unshaped alumina having an average particle diameter of 18 μm

(C-6)平均粒徑為50μm之不定形氧化鋁 (C-6) Unshaped alumina having an average particle diameter of 50 μm

(C-7)平均粒徑為17μm之球狀氧化鋁 (C-7) Spherical alumina having an average particle diameter of 17 μm

(C-8)平均粒徑為45μm之球狀氧化鋁 (C-8) Spherical alumina having an average particle diameter of 45 μm

(C-9)平均粒徑為70μm之球狀氧化鋁 (C-9) Spherical alumina having an average particle diameter of 70 μm

(D)成分: (D) Ingredients:

5質量%之氯化鉑酸2-乙基己醇溶液。 5 mass% of a solution of chloroplatinic acid 2-ethylhexanol.

(E)成分: (E) Ingredients:

以乙炔基亞甲基卡必醇作為加成反應控制劑。 Ethylene methylene carbitol is used as an addition reaction controlling agent.

(F)成分:(F-2)成分 (F) component: (F-2) component

以下述式(7)表示之平均聚合度為30之單末端以三甲氧基矽烷基封端之二甲基聚矽氧烷。 A dimethylpolyoxane terminated with a trimethoxydecyl group at a single terminal end, which has an average degree of polymerization of 30, represented by the following formula (7).

(G)成分 (G) component

作為可塑劑為以下述式(8)表示之二甲基聚矽氧烷。 The plasticizer is dimethyl polyoxyalkylene represented by the following formula (8).

(式中,j為80)。 (where j is 80).

[實施例1~3、比較例1~3] [Examples 1 to 3, Comparative Examples 1 to 3]

實施例1~3及比較例1~3中,上述(A)~(G)成分係使用下述表1所示之特定量調製如下述之組成物,且經成形硬化,依據下述方法測定或觀察組成物之黏度、硬化物之熱傳導率、硬度、絕緣破壞電壓、比重、反應釜之磨耗。結果一併列於表1。 In Examples 1 to 3 and Comparative Examples 1 to 3, the components (A) to (G) were prepared by using the specific amounts shown in Table 1 below, and were subjected to work hardening, and were measured according to the following methods. Or observe the viscosity of the composition, the thermal conductivity of the hardened material, the hardness, the dielectric breakdown voltage, the specific gravity, and the wear of the reactor. The results are shown in Table 1.

[組成物之調製] [modulation of composition]

以下述表1之實施例1~3及比較例1~3所示之特定 量添加(A)、(C)、(F)、(G)成分,且以行星式混練機混練60分鐘。 Specific examples shown in Examples 1 to 3 and Comparative Examples 1 to 3 of Table 1 below The components (A), (C), (F), and (G) were added in an amount and kneaded in a planetary kneader for 60 minutes.

接著以下述表1之實施例1~3及比較例1~3所示之特定量於其中添加(D)、(E)成分,接著添加有效量之信越化學工業(股)製造之苯基改質聚矽氧油的KF-54作為之促進與隔離片之脫模之內添加脫模劑,且混練30分鐘。 Then, the components (D) and (E) were added thereto in the specific amounts shown in the following Examples 1 to 3 and Comparative Examples 1 to 3, and then an effective amount of the phenyl group manufactured by Shin-Etsu Chemical Co., Ltd. was added. The KF-54 of the polyoxygenated oil was used as a promoter to add a release agent to the release sheet of the separator, and kneaded for 30 minutes.

接著以下述表1之實施例1~3及比較例1~3所示之特定量於其中添加(B)成分,混練30分鐘,獲得組成物。 Next, the component (B) was added thereto in the specific amounts shown in Examples 1 to 3 and Comparative Examples 1 to 3 of the following Table 1, and kneaded for 30 minutes to obtain a composition.

[成形方法] [Forming method]

將實施例1~3及比較例1~3所得之組成物流入60mm×60mm×6mm之模具中,使用加壓成形機,以120℃、10分鐘之條件成形。 The compositions obtained in Examples 1 to 3 and Comparative Examples 1 to 3 were placed in a mold of 60 mm × 60 mm × 6 mm, and molded at 120 ° C for 10 minutes using a press molding machine.

[評價方法] [Evaluation method]

組成物之黏度: Viscosity of the composition:

以B型黏度計,在23℃環境下測定實施例1~3及比較例1~3所得之組成物之黏度。 The viscosities of the compositions obtained in Examples 1 to 3 and Comparative Examples 1 to 3 were measured under a 23 ° C environment using a B-type viscometer.

熱傳導率: Thermal conductivity:

使用加壓成型機,在120℃、10分鐘之條件下使實施例1~3及比較例1~3所得之組成物硬化成6mm厚之薄片狀,使用兩片該薄片,以熱傳導率計(商品名:TPA-501,京都電子工業(股)製造)測定該薄片之熱傳導率。 The composition obtained in Examples 1 to 3 and Comparative Examples 1 to 3 was cured into a sheet having a thickness of 6 mm by using a press molding machine at 120 ° C for 10 minutes, and two sheets of the sheet were used as a thermal conductivity meter ( Trade name: TPA-501, manufactured by Kyoto Electronics Industry Co., Ltd.) The thermal conductivity of the sheet was measured.

硬度: hardness:

與上述同樣地使實施例1~3及比較例1~3所得之組成物硬化成6mm厚之薄片狀,重疊兩片該薄片且以ASKER C硬度計進行測定。 The compositions obtained in Examples 1 to 3 and Comparative Examples 1 to 3 were cured into a sheet having a thickness of 6 mm in the same manner as above, and the sheets were stacked and measured by an Asker C hardness meter.

絕緣破壞電壓: Insulation breakdown voltage:

使用加壓成型機,以120℃、10分鐘之條件使實施例1~3及比較例1~3所得之組成物硬化成1mm厚之薄片狀,依據JIS K 6249測定絕緣破壞電壓。 The composition obtained in Examples 1 to 3 and Comparative Examples 1 to 3 was cured into a sheet having a thickness of 1 mm by a press molding machine at 120 ° C for 10 minutes, and the dielectric breakdown voltage was measured in accordance with JIS K 6249.

比重: proportion:

使用加壓成型機,以120℃、10分鐘之條件使實施例1~3及比較例1~3所得之組成物硬化成1mm厚之薄片狀,且以水中置換法測定硬化物之比重。 The composition obtained in Examples 1 to 3 and Comparative Examples 1 to 3 was cured into a sheet having a thickness of 1 mm by a press molding machine at 120 ° C for 10 minutes, and the specific gravity of the cured product was measured by a water displacement method.

反應釜之磨耗: The abrasion of the reactor:

依循上述調製法,在調製組成物之階段,以目視若確認到反應釜刨削之黑色成分混入則記為「有」,若未確認到則記為「無」。由於實施例及比較例中使用之氧化鋁與氫氧化鋁為白色粉末,故組成物原本為白色,因此容易看到黑色成分之混入。 According to the above-described modulation method, at the stage of modulating the composition, if it is confirmed that the black component of the reactor planer is mixed, it is marked as "Yes", and if it is not confirmed, it is marked as "None". Since the alumina and aluminum hydroxide used in the examples and the comparative examples were white powders, the composition was originally white, so that the mixing of the black components was easy to see.

如比較例1之熱傳導性填充材之總質量份超過6,500質量份時,組成物之濡濕性不足,無法獲得油脂狀之均勻 組成物。如比較例2之不含(C-i)成分的平均粒徑10~30μm之不定形氧化鋁時,觀察到熱傳導性下降或硬度上升。如比較例3之使用平均粒徑超過30μm之不定形氧化鋁(亦即,(C-i)~(C-iii)成分以外之熱傳導性填充材)時,顯著地觀察到反應釜之磨耗,且因其影響,使成形之薄片之絕緣破壞電壓顯著下降。 When the total mass portion of the thermally conductive filler of Comparative Example 1 exceeds 6,500 parts by mass, the wettability of the composition is insufficient, and the uniformity of the grease cannot be obtained. Composition. When the amorphous alumina having an average particle diameter of 10 to 30 μm containing no (C-i) component of Comparative Example 2 was observed, a decrease in thermal conductivity or an increase in hardness was observed. When the amorphous alumina having an average particle diameter of more than 30 μm (that is, a thermally conductive filler other than the components (Ci) to (C-iii)) was used as in Comparative Example 3, the abrasion of the reactor was remarkably observed, and The effect is that the dielectric breakdown voltage of the formed sheet is significantly reduced.

如實施例般,(C)成分之調配量相對於(A)成分100質量份為1,200~6,500質量份之範圍,且(C)成分係由下列組成時,組成物之黏度、硬化物之熱傳導率、硬度、比重、絕緣破壞電壓均成為良好之結果,且也未觀察到反應釜之磨耗,(C-i)平均粒徑10~30μm之不定形氧化鋁500~1,500質量份,(C-ii)平均粒徑30~85μm之球狀氧化鋁150~4,000質量份,(C-iii)平均粒徑0.1~6μm之絕緣性無機填料500~2,000質量份。 When the amount of the component (C) is in the range of 1,200 to 6,500 parts by mass relative to 100 parts by mass of the component (A), and the component (C) is composed of the following composition, the viscosity of the composition and the heat conduction of the cured product are as described in the examples. The rate, hardness, specific gravity, and dielectric breakdown voltage were all good results, and no abrasion of the reactor was observed. (Ci) 500 to 1,500 parts by mass of amorphous alumina having an average particle diameter of 10 to 30 μm, (C-ii) 150 to 4,000 parts by mass of spherical alumina having an average particle diameter of 30 to 85 μm, and (C-iii) 500 to 2,000 parts by mass of an insulating inorganic filler having an average particle diameter of 0.1 to 6 μm.

Claims (8)

一種熱傳導性聚矽氧組成物,其特徵係含有:(A)一分子中具有至少兩個烯基之有機聚矽氧烷:100質量份,(B)具有至少兩個直接鍵結於矽原子之氫原子的有機氫聚矽氧烷:直接鍵結於矽原子之氫原子的莫耳數為源自(A)成分之烯基之莫耳數之0.1~5.0倍之量,(C)熱傳導性填充材:1,200~6,500質量份,(D)鉑族金屬系硬化觸媒:相對於(A)成分以鉑族金屬元素質量換算為0.1~2,000ppm,且(C)成分之熱傳導性填充材係由下列成分所成:(C-i)平均粒徑10~30μm之不定形氧化鋁500~1,500質量份,(C-ii)平均粒徑30~85μm之球狀氧化鋁150~4,000質量份,(C-iii)平均粒徑0.1~6μm之絕緣性無機填料500~2,000質量份。 A thermally conductive polydecane oxygen composition characterized by: (A) an organopolyoxyalkylene having at least two alkenyl groups in one molecule: 100 parts by mass, (B) having at least two directly bonded to a ruthenium atom The organic hydrogen polyoxyalkylene of a hydrogen atom: the molar number of the hydrogen atom directly bonded to the halogen atom is 0.1 to 5.0 times the number of moles of the alkenyl group derived from the component (A), and (C) heat conduction Filling material: 1,200-6,500 parts by mass, (D) Platinum group metal-based hardening catalyst: 0.1 to 2,000 ppm based on the mass of the platinum group metal element (A), and the thermal conductive filler of the component (C) It is made up of (Ci) 500 to 1,500 parts by mass of amorphous alumina having an average particle diameter of 10 to 30 μm, and (C-ii) 150 to 4,000 parts by mass of spherical alumina having an average particle diameter of 30 to 85 μm. C-iii) 500 to 2,000 parts by mass of the insulating inorganic filler having an average particle diameter of 0.1 to 6 μm. 如請求項1之熱傳導性聚矽氧組成物,其進而含有作為(F)成分之由(F-1)以下述通式(1)表示之烷氧基矽烷化合物及(F-2)以下述通式(2)表示之分子鏈單末端以三烷氧基矽烷基封端之二甲基聚矽氧烷所組成之群組選出之至少一種:相對於(A)成分100質量份含有0.01~300質量份,R1 aR2 bSi(OR3)4-a-b (1) (式中,R1獨立為碳原子數6~15之烷基,R2獨立為未取代或經取代之碳原子數1~12之一價烴基,R3獨立為碳原子數1~6之烷基,a為1~3之整數,b為0~2之整數,但a+b為1~3之整數), (式中,R4獨立為碳原子數1~6之烷基,c為5~100之整數)。 The thermally conductive polyfluorene composition of claim 1, which further comprises, as the component (F), an alkoxydecane compound represented by the following formula (1) and (F-2) as (F): At least one selected from the group consisting of a monoalkyl end group having a monoalkyloxyalkylene group terminated by a trialkoxyalkylene group represented by the formula (2): 0.01% by mass based on 100 parts by mass of the component (A) 300 parts by mass, R 1 a R 2 b Si(OR 3 ) 4-ab (1) (wherein R 1 is independently an alkyl group having 6 to 15 carbon atoms, and R 2 is independently an unsubstituted or substituted carbon Atomic number 1 to 12 one-valent hydrocarbon group, R 3 is independently an alkyl group having 1 to 6 carbon atoms, a is an integer of 1 to 3, b is an integer of 0 to 2, but a + b is an integer of 1 to 3 ), (wherein R 4 is independently an alkyl group having 1 to 6 carbon atoms, and c is an integer of 5 to 100). 如請求項1之熱傳導性聚矽氧組成物,其進而含有相對於(A)成分100質量份為0.1~100質量份之作為(G)成分之以下述通式(3)表示之在23℃之動黏度為10~100,000mm2/s之有機聚矽氧烷, (式中,R5獨立為碳原子數1~12之不含脂肪族不飽和鍵之一價烴基,d為5~2,000之整數)。 The thermally conductive polyfluorene composition of claim 1, which further contains 0.1 to 100 parts by mass of the component (A) as the component (G) and is represented by the following formula (3) at 23 ° C. An organic polyoxane having a viscosity of 10 to 100,000 mm 2 /s, (wherein R 5 is independently a hydrocarbon group having 1 to 12 carbon atoms and no aliphatic unsaturated bond, and d is an integer of 5 to 2,000). 如請求項1之熱傳導性聚矽氧組成物,其在23℃之黏度為800Pa.s以下。 The thermally conductive polyfluorene composition of claim 1, which has a viscosity of 800 Pa at 23 ° C. s below. 一種熱傳導性聚矽氧硬化物,其係使如請求項1至4中任一項之熱傳導性聚矽氧組成物硬化而成。 A thermally conductive polysulfonated cured product obtained by hardening the thermally conductive polydecaneoxy composition according to any one of claims 1 to 4. 如請求項5之熱傳導性聚矽氧硬化物,其熱傳導率為3.0W/mK以上。 The thermally conductive polyanthracene of claim 5 has a thermal conductivity of 3.0 W/mK or more. 如請求項5之熱傳導性聚矽氧硬化物,其硬度以ASKER C硬度計測量為60以下。 The thermally conductive polyanthracene hardened material of claim 5, which has a hardness of 60 or less as measured by an Asker C hardness meter. 如請求項5之熱傳導性聚矽氧硬化物,其絕緣破壞電壓為10kV/mm以上。 The thermally conductive polyanthracene hardened material of claim 5, which has an insulation breakdown voltage of 10 kV/mm or more.
TW101149791A 2012-01-23 2012-12-25 Thermally conductive silicone oxygen compositions and their hardened products TWI548699B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012010677A JP5664563B2 (en) 2012-01-23 2012-01-23 Thermally conductive silicone composition and cured product thereof

Publications (2)

Publication Number Publication Date
TW201341470A true TW201341470A (en) 2013-10-16
TWI548699B TWI548699B (en) 2016-09-11

Family

ID=48813039

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101149791A TWI548699B (en) 2012-01-23 2012-12-25 Thermally conductive silicone oxygen compositions and their hardened products

Country Status (3)

Country Link
JP (1) JP5664563B2 (en)
CN (1) CN103214853B (en)
TW (1) TWI548699B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI766937B (en) * 2017-01-27 2022-06-11 日商邁圖高新材料日本合同公司 Thermoconductive polyorgano siloxane composition
TWI785740B (en) * 2020-08-19 2022-12-01 南韓商Kcc有機硅有限公司 Polysiloxane composition for optical use and refelective materials for optical semiconductor comprising the same
TWI814766B (en) * 2018-01-17 2023-09-11 日商信越化學工業股份有限公司 Thermal conductive film-like hardened material and manufacturing method thereof, and thermal conductive member

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6075261B2 (en) * 2013-10-02 2017-02-08 信越化学工業株式会社 Thermally conductive silicone composition and cured product thereof
KR102255123B1 (en) * 2013-11-15 2021-05-24 신에쓰 가가꾸 고교 가부시끼가이샤 Thermal conductive composite sheet
CN104672907A (en) * 2013-11-30 2015-06-03 招远市东晟橡胶制品有限公司 Silicon rubber composition
JP6297914B2 (en) * 2014-05-01 2018-03-20 日本特殊陶業株式会社 Temperature sensor and temperature sensor
JP6214094B2 (en) * 2014-06-10 2017-10-18 信越化学工業株式会社 Thermally conductive sheet
JP6202475B2 (en) * 2014-06-27 2017-09-27 信越化学工業株式会社 Thermally conductive composite silicone rubber sheet
JP6260519B2 (en) * 2014-11-25 2018-01-17 信越化学工業株式会社 Method for storing and curing one-component addition-curable silicone composition
US10683444B2 (en) 2015-05-22 2020-06-16 Momentive Performance Materials Japan Llc Thermally conductive composition
JP6323398B2 (en) * 2015-06-10 2018-05-16 信越化学工業株式会社 Thermally conductive silicone putty composition
US11254849B2 (en) 2015-11-05 2022-02-22 Momentive Performance Materials Japan Llc Method for producing a thermally conductive polysiloxane composition
CN107614619B (en) 2015-11-19 2023-05-09 积水化学工业株式会社 Thermosetting material and cured product
CN105315673A (en) * 2015-12-08 2016-02-10 苏州市享乐惠信息科技有限公司 High-insulation silica gel plate
JP6553520B2 (en) * 2016-01-14 2019-07-31 信越化学工業株式会社 Thermally conductive cured product, adhesive tape and adhesive sheet having the cured product
JP6558301B2 (en) * 2016-05-19 2019-08-14 信越化学工業株式会社 Thermally conductive composite sheet
JP6610429B2 (en) * 2016-05-24 2019-11-27 信越化学工業株式会社 Thermally conductive silicone composition, cured product thereof and method for producing the same
CN109476846A (en) 2016-07-22 2019-03-15 迈图高新材料日本合同公司 Thermal conductivity constituent polyorganosiloxane composition surface treating agent
EP3489305B1 (en) 2016-07-22 2023-10-18 Momentive Performance Materials Japan LLC Thermally conductive polysiloxane composition
JP6246986B1 (en) 2016-07-22 2017-12-13 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 Thermally conductive polysiloxane composition
WO2018139506A1 (en) * 2017-01-27 2018-08-02 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 Thermally conductive polyorganosiloxane composition
KR102166470B1 (en) 2017-05-16 2020-10-16 주식회사 엘지화학 Resin Composition
CN110719939B (en) * 2017-05-31 2022-02-18 迈图高新材料日本合同公司 Thermally conductive silicone composition
EP3608384B1 (en) * 2017-06-27 2022-02-09 Sekisui Polymatech Co., Ltd. Heat-conductive sheet
JP6448736B2 (en) * 2017-09-28 2019-01-09 信越化学工業株式会社 Thermally conductive sheet
US20200010621A1 (en) * 2017-11-17 2020-01-09 Fuji Polymer Industries Co., Ltd. Two-step curable thermally conductive silicone composition and method for producing same
JP6674590B1 (en) * 2018-05-08 2020-04-01 富士高分子工業株式会社 Thermal conductive sheet, mounting method using the same, and bonding method using the same
CN112236482B (en) * 2018-06-08 2022-12-27 信越化学工业株式会社 Heat-conductive silicone composition and method for producing same
JP2020002236A (en) * 2018-06-27 2020-01-09 信越化学工業株式会社 Heat-conductive silicone composition, heat-conductive silicone sheet, and method of manufacturing the same
CN112041411B (en) * 2018-12-25 2022-04-01 富士高分子工业株式会社 Thermally conductive composition and thermally conductive sheet using same
TW202031763A (en) * 2019-01-25 2020-09-01 日商電化股份有限公司 Filler composition, silicone resin composition, and heat dissipation component
JP2022520317A (en) * 2019-02-13 2022-03-30 シーカ テクノロジー アクチェンゲゼルシャフト Thermally conductive curable composition
KR20210136826A (en) 2019-03-07 2021-11-17 후지고분시고오교오가부시끼가이샤 Thermally conductive sheet and manufacturing method thereof
JP2022536577A (en) * 2019-04-10 2022-08-18 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン Thermally conductive silicone potting composition
EP3792305B1 (en) * 2019-06-24 2024-03-27 Fuji Polymer Industries Co., Ltd. Heat-tolerant thermally conductive composition and heat-tolerant thermally conductive sheet
WO2020262449A1 (en) 2019-06-26 2020-12-30 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 Thermally conductive polysiloxane composition
JP7339073B2 (en) * 2019-08-30 2023-09-05 株式会社イノアックコーポレーション Heat dissipation sheet and its manufacturing method
KR20220089701A (en) * 2019-10-24 2022-06-28 신에쓰 가가꾸 고교 가부시끼가이샤 Thermally conductive silicone composition and method for manufacturing the same
JP7136065B2 (en) * 2019-11-14 2022-09-13 信越化学工業株式会社 THERMALLY CONDUCTIVE SILICONE COMPOSITION AND THERMALLY CONDUCTIVE SILICONE SHEET
EP3929242A4 (en) 2019-12-18 2022-04-06 Fuji Polymer Industries Co., Ltd. Thermally conductive composition and method for producing same
EP4114892B1 (en) * 2020-03-05 2024-01-10 Dow Global Technologies LLC Shear thinning thermally conductive silicone compositions
JP7285231B2 (en) * 2020-05-08 2023-06-01 信越化学工業株式会社 Thermally conductive silicone composition and cured product thereof
KR102403680B1 (en) * 2020-07-13 2022-05-31 한국세라믹기술원 Polysiloxane composite containing ceramic beads of various sizes and method for manufacturing the same
CN112266617A (en) * 2020-09-21 2021-01-26 平湖阿莱德实业有限公司 High-filling type modified ceramic composite material and preparation method thereof
TW202227588A (en) 2020-10-09 2022-07-16 日商陶氏東麗股份有限公司 Thermally conductive silicone composition and thermally conductive member
JP2022165108A (en) * 2021-04-19 2022-10-31 信越化学工業株式会社 Thermally conductive composite sheet and method for mounting heat-generating electronic component
JP7217079B1 (en) * 2022-01-14 2023-02-02 富士高分子工業株式会社 Thermally conductive composition, thermally conductive sheet using the same, and method for producing the same
WO2023135857A1 (en) * 2022-01-14 2023-07-20 富士高分子工業株式会社 Thermally conductive composition, thermally conductive sheet obtained from same, and production method therefor
JP2023104800A (en) * 2022-01-18 2023-07-28 信越化学工業株式会社 Thermally conductive silicone composition and semiconductor device
WO2023162323A1 (en) * 2022-02-22 2023-08-31 富士高分子工業株式会社 Thermally conductive composition, thermally conductive sheet, and method for manufacturing same
WO2023188491A1 (en) * 2022-03-31 2023-10-05 富士高分子工業株式会社 Thermally conductive silicone composition, thermally conductive silicone sheet, and method for manufacturing said sheet
CN116041962A (en) * 2023-01-31 2023-05-02 安徽迈腾新材料有限公司 Low-compressibility flame-retardant silicone rubber material

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE416235T1 (en) * 2001-05-14 2008-12-15 Dow Corning Toray Co Ltd HEAT CONDUCTIVE SILICONE COMPOSITION
JP2005325158A (en) * 2004-05-12 2005-11-24 Shin Etsu Chem Co Ltd Addition cure silicone rubber compound
US20060264566A1 (en) * 2005-05-19 2006-11-23 Wacker Chemical Corporation HCR room temperature curable rubber composition
JP2006328164A (en) * 2005-05-25 2006-12-07 Shin Etsu Chem Co Ltd Thermally conductive silicone composition
JP2007119589A (en) * 2005-10-27 2007-05-17 Momentive Performance Materials Japan Kk Thermoconductive silicone rubber composition
JP5155033B2 (en) * 2008-06-26 2013-02-27 モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社 Thermally conductive silicone composition
JP5534837B2 (en) * 2010-01-28 2014-07-02 東レ・ダウコーニング株式会社 Thermally conductive silicone rubber composition
JP5418298B2 (en) * 2010-02-26 2014-02-19 信越化学工業株式会社 Thermally conductive silicone composition and cured product thereof
CN102002346B (en) * 2010-10-15 2013-01-30 深圳市安品有机硅材料有限公司 Organic silicon heat conduction composition and organic silicon heat conduction patch
JP2012214612A (en) * 2011-03-31 2012-11-08 Aica Kogyo Co Ltd Silicone heat dissipation member

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI766937B (en) * 2017-01-27 2022-06-11 日商邁圖高新材料日本合同公司 Thermoconductive polyorgano siloxane composition
TWI814766B (en) * 2018-01-17 2023-09-11 日商信越化學工業股份有限公司 Thermal conductive film-like hardened material and manufacturing method thereof, and thermal conductive member
TWI785740B (en) * 2020-08-19 2022-12-01 南韓商Kcc有機硅有限公司 Polysiloxane composition for optical use and refelective materials for optical semiconductor comprising the same

Also Published As

Publication number Publication date
CN103214853A (en) 2013-07-24
TWI548699B (en) 2016-09-11
JP2013147600A (en) 2013-08-01
JP5664563B2 (en) 2015-02-04
CN103214853B (en) 2017-04-12

Similar Documents

Publication Publication Date Title
TWI548699B (en) Thermally conductive silicone oxygen compositions and their hardened products
JP5304588B2 (en) Thermally conductive silicone composition and cured product thereof
JP5418298B2 (en) Thermally conductive silicone composition and cured product thereof
JP5233325B2 (en) Thermally conductive cured product and method for producing the same
TWI822954B (en) Thermal conductive silicone composition and manufacturing method thereof, and thermally conductive silicone hardened material
KR102132243B1 (en) Thermal conductive silicone composition and cured product, and composite sheet
EP3872135B1 (en) Thermally conductive silicone composition and cured product thereof
JP6202475B2 (en) Thermally conductive composite silicone rubber sheet
JP7285231B2 (en) Thermally conductive silicone composition and cured product thereof
JP5131648B2 (en) Thermally conductive silicone composition and thermally conductive silicone molding using the same
CN114729193B (en) Thermally conductive silicone composition and thermally conductive silicone sheet
KR20230015340A (en) High thermal conductivity silicone composition
TWI813738B (en) Thermally conductive silicon oxide composition and its hardened product
WO2021131681A1 (en) Thermally conductive silicone resin composition
WO2022239519A1 (en) Thermally conductive silicone composition and cured product of same
WO2022255004A1 (en) Thermally conductive silicone composition and cured product of same
JP2023153695A (en) Thermally conductive silicone composition and cured product