TW201314815A - Electrostatic chuck and manufacturing method thereof - Google Patents

Electrostatic chuck and manufacturing method thereof Download PDF

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TW201314815A
TW201314815A TW100135164A TW100135164A TW201314815A TW 201314815 A TW201314815 A TW 201314815A TW 100135164 A TW100135164 A TW 100135164A TW 100135164 A TW100135164 A TW 100135164A TW 201314815 A TW201314815 A TW 201314815A
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Taiwan
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electrostatic chuck
substrate
electrode layer
dielectric material
chuck according
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TW100135164A
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Chinese (zh)
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Hsuen-Hen Lu
Chin-Kuei Chang
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Calitech Co Ltd
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Abstract

An electrostatic chuck includes a substrate, an electrode layer, and a mixed dielectric material. The electrode layer is configured to induce electrostatic force and disposed on the substrate. The mixed dielectric material covers the electrode layer, including a first polymer and a plurality of electrically conductive particles, wherein the volume resistivity of the mixed dielectric material is between 10<SP>8</SP> and 10<SP>12</SP> ohm-centimeter.

Description

靜電吸盤及其製作方法Electrostatic chuck and manufacturing method thereof

本發明係關於一種靜電吸盤。The present invention relates to an electrostatic chuck.

靜電吸盤通常包含至少一電極和覆蓋該電極之一介電層。在至少一電極上施加電壓,使得靜電吸盤和搬運工件上分別聚集電性相反之電荷,藉由相反電荷間產生之靜電力,吸附工件。靜電吸盤可根據介電層之材料與靜電力的作用機制來區分。一般而言,有兩種靜電吸盤:庫侖式靜電吸盤(Coulomb chuck)和約翰遜‧拉貝克靜電吸盤(Johnsen Rahbek chuck)。An electrostatic chuck typically includes at least one electrode and a dielectric layer overlying the electrode. A voltage is applied to at least one of the electrodes such that the electrostatic chuck and the transporting workpiece respectively collect electrically opposite charges, and the workpiece is adsorbed by an electrostatic force generated between the opposite charges. The electrostatic chuck can be distinguished according to the mechanism of action of the material of the dielectric layer and the electrostatic force. In general, there are two types of electrostatic chucks: the Coulomb chuck and the Johnsen Rahbek chuck.

庫侖式靜電吸盤之介電層具有高電阻值(例如大於1012歐姆‧公分)。當電壓施加於電極上後,電極聚集電荷,而工件上聚集相反電荷,其中兩種電荷為介電層所隔開。The dielectric layer of the Coulomb electrostatic chuck has a high resistance value (eg, greater than 10 12 ohms ‧ cm). When a voltage is applied to the electrodes, the electrodes concentrate the charge and the opposite charges are accumulated on the workpiece, two of which are separated by a dielectric layer.

單極(monopolar)庫侖式靜電吸盤之靜電壓力(P)可利用下式來表示:The electrostatic pressure (P) of a monopolar Coulomb electrostatic chuck can be expressed by the following formula:

其中,F表靜電力,A為電極面積,Vo為施加電壓,ε 0 為空氣間隙介電係數(permittivity of air gap),K為介電層之相對介電係數(relative permittivity),tD為介電層厚度,而δ為工件與介電層表面間之總間隙(total gap)。Among them, F table electrostatic force, A is the electrode area, V o is the applied voltage, ε 0 is the permittivity of air gap, K is the relative permittivity of the dielectric layer, t D It is the thickness of the dielectric layer, and δ is the total gap between the workpiece and the surface of the dielectric layer.

由公式(1)可看出,靜電壓力與介電層厚度(tD)呈平方反比的關係。因此,為獲取較大的靜電壓力,一般庫侖式靜電吸盤介電層之厚度越小越好。It can be seen from the formula (1) that the electrostatic pressure is inversely proportional to the dielectric layer thickness (t D ). Therefore, in order to obtain a large electrostatic pressure, the thickness of the general Coulomb electrostatic chuck dielectric layer is preferably as small as possible.

約翰遜‧拉貝克靜電吸盤之介電層具有有限的電阻值,當電壓施加在電極上時,電流流經介電層和工件,在介電層和工件之間形成一電荷層,從而產生較強的吸引力。約翰遜‧拉貝克靜電吸盤產生之靜電壓力可區分成因庫倫效應所產生之部分和約翰遜‧拉貝克效應所產生之部分,通常庫倫效應所產生之部分因太小,而可忽略不計。The dielectric layer of the Johnson Labeck electrostatic chuck has a finite resistance value. When a voltage is applied to the electrode, current flows through the dielectric layer and the workpiece, forming a charge layer between the dielectric layer and the workpiece, resulting in a stronger Appeal. The electrostatic pressure generated by the Johnson Labec electrostatic chuck can be distinguished by the portion of the Coulomb effect and the portion produced by the Johnson Labeb effect. Usually the Coulomb effect is too small to be negligible.

庫侖式靜電吸盤之介電層常見以高分子材料,例如:聚醯亞胺(Polyimide;PI)或聚乙烯(Polyethylene;PE)材料所製作。介電層的厚度通常小於100微米(micrometers),以維持高靜電力。然而,薄PI或PE介電層容易損壞,特別是當工件上存在微粒時,微粒可能在薄PI或PE介電層緊密接觸工件時,刮壞PI或PE介電層。The dielectric layer of the Coulomb type electrostatic chuck is usually made of a polymer material such as polyimide (PI) or polyethylene (PE). The thickness of the dielectric layer is typically less than 100 microns to maintain high electrostatic forces. However, thin PI or PE dielectric layers are susceptible to damage, particularly when particles are present on the workpiece, which may scratch the PI or PE dielectric layer when the thin PI or PE dielectric layer is in intimate contact with the workpiece.

約翰遜‧拉貝克靜電吸盤之介電層可為燒結氧化鋁或氮化鋁等陶瓷材料製作而成。燒結後之介電層膠合在一基座上,並覆蓋住在基座上之電極。由於此介電層需另外燒結製作,然後以膠合方式固定,使其製作程序繁複,而且在膠合時,容易發生膠合不良之情況。另外,生胚需事先依照基座製作,然後燒結。為不同形狀之基座需製作不同的生胚,製作上頗為不便。再者,隨著搬運工件之大型化,亦須使用較大的靜電吸盤;而大的陶瓷介電層不易燒結製作及組合,而且大的陶瓷介電層重量重,不利於使用。The dielectric layer of the Johnson Labeke electrostatic chuck can be made of ceramic materials such as sintered alumina or aluminum nitride. The sintered dielectric layer is glued to a pedestal and covers the electrodes on the pedestal. Since the dielectric layer needs to be separately sintered and then fixed by gluing, the manufacturing process is complicated, and when the bonding is performed, the bonding failure is liable to occur. In addition, the raw embryos are prepared in advance according to the susceptor and then sintered. It is quite inconvenient to make different raw embryos for different shapes of the base. Furthermore, as the handling of the workpiece is increased, larger electrostatic chucks are also required; large ceramic dielectric layers are not easily sintered and combined, and large ceramic dielectric layers are heavy and unfavorable for use.

本發明之一方面提供一靜電吸盤,其較使用陶瓷介電層之靜電吸盤為輕。One aspect of the invention provides an electrostatic chuck that is lighter than an electrostatic chuck that uses a ceramic dielectric layer.

本發明之另一方面提供一靜電吸盤,其可運用在吸附玻璃或聚對苯二甲酯(poly(ethylene terephthalate)薄膜。Another aspect of the present invention provides an electrostatic chuck that can be used in an adsorbent glass or a poly(ethylene terephthalate) film.

本發明又一方面提供一靜電吸盤,其係以約翰遜‧拉貝克靜電力吸附搬運工件。Yet another aspect of the present invention provides an electrostatic chuck that is electrostatically adsorbed to carry a workpiece by Johnson Labebeck.

本發明一實施例提出一種靜電吸盤,該靜電吸盤包含一基底、一電極層,以及一混合介電材料。電極層用以產生靜電吸力,其中電極層係設置於基底上。混合介電材料覆蓋電極層。混合介電材料包含一第一高分子材料與複數個導電顆粒,其中混合介電材料之體阻值介於108至1012歐姆‧公分。An embodiment of the invention provides an electrostatic chuck comprising a substrate, an electrode layer, and a hybrid dielectric material. The electrode layer is used to generate electrostatic attraction, wherein the electrode layer is disposed on the substrate. A mixed dielectric material covers the electrode layer. The mixed dielectric material comprises a first polymer material and a plurality of conductive particles, wherein the mixed dielectric material has a bulk resistance of from 10 8 to 10 12 ohms ‧ cm.

本發明另一實施例提供一種靜電吸盤,該靜電吸盤包含一基底、一電極層,以及一混合介電材料。電極層用以產生靜電吸力,其中電極層係設置於基底上。混合介電材料覆蓋電極層。混合介電材料包含一第一高分子材料與複數個導電顆粒,其中以混合介電材料之總重計,該些導電顆粒之重量份介於3%至30%之間。Another embodiment of the present invention provides an electrostatic chuck comprising a substrate, an electrode layer, and a mixed dielectric material. The electrode layer is used to generate electrostatic attraction, wherein the electrode layer is disposed on the substrate. A mixed dielectric material covers the electrode layer. The mixed dielectric material comprises a first polymer material and a plurality of conductive particles, wherein the conductive particles are between 3% and 30% by weight based on the total weight of the mixed dielectric material.

本發明又一方面提供一靜電吸盤之製作方法,其包含下列步驟:混入複數個導電顆粒於一高分子材料中,以獲得一混合液;將該混合液塗佈於一基底上,形成一塗層;以及硬化該塗層,以獲得一混合介電材料,其中該混合介電材料之體阻值介於108至1012歐姆‧公分。According to still another aspect of the present invention, a method for fabricating an electrostatic chuck includes the steps of: mixing a plurality of conductive particles into a polymer material to obtain a mixed solution; and coating the mixed solution on a substrate to form a coating layer. And hardening the coating to obtain a mixed dielectric material, wherein the mixed dielectric material has a bulk resistance of from 10 8 to 10 12 ohms ‧ cm.

上文已相當廣泛地概述本揭露之技術特徵及優點,俾使下文之本揭露詳細描述得以獲得較佳瞭解。構成本揭露之申請專利範圍標的之其它技術特徵及優點將描述於下文。本揭露所屬技術領域中具有通常知識者應瞭解,可相當容易地利用下文揭示之概念與特定實施例可作為修改或設計其它結構或製程而實現與本揭露相同之目的。本揭露所屬技術領域中具有通常知識者亦應瞭解,這類等效建構無法脫離後附之申請專利範圍所界定之本揭露的精神和範圍。The technical features and advantages of the present disclosure have been broadly described above, and the detailed description of the present disclosure will be better understood. Other technical features and advantages of the subject matter of the claims of the present disclosure will be described below. It will be appreciated by those skilled in the art that the present invention may be practiced with the same or equivalents. It is also to be understood by those of ordinary skill in the art that this invention is not limited to the spirit and scope of the disclosure as defined by the appended claims.

圖1顯示本發明一實施例之靜電吸盤1之剖視圖。參照圖1所示,靜電吸盤1包含一基底11、一電極層13,以及一混合介電材料14。電極層13用以產生靜電吸力,其中電極層13係設置於基底11上。混合介電材料14覆蓋電極層13。Fig. 1 is a cross-sectional view showing an electrostatic chuck 1 according to an embodiment of the present invention. Referring to FIG. 1, the electrostatic chuck 1 includes a substrate 11, an electrode layer 13, and a mixed dielectric material 14. The electrode layer 13 is used to generate electrostatic attraction, wherein the electrode layer 13 is disposed on the substrate 11. The hybrid dielectric material 14 covers the electrode layer 13.

圖2顯示本發明一實施例之混合介電材料14之示意圖。參照圖2所示,混合介電材料14具有有限的電阻值(finite resistivity),如此靜電吸盤1可為約翰遜‧拉貝克靜電吸盤。混合介電材料14可包含一高分子材料141和複數個導電顆粒142,其中複數個導電顆粒142混合於高分子材料141內。2 shows a schematic diagram of a hybrid dielectric material 14 in accordance with an embodiment of the present invention. Referring to Figure 2, the hybrid dielectric material 14 has a finite resistivity such that the electrostatic chuck 1 can be a Johnson Labec electrostatic chuck. The hybrid dielectric material 14 may include a polymer material 141 and a plurality of conductive particles 142, wherein a plurality of conductive particles 142 are mixed in the polymer material 141.

高分子材料141可具有高的體阻值,例如:大於1014歐姆‧公分之體阻值。在一實施例中,高分子材料141可包含環氧樹脂、矽基樹脂(silicone)、丙烯酸酯(acrylic)或聚苯乙烯(polystyrene)等。The polymer material 141 may have a high body resistance value, for example, a body resistance value greater than 10 14 ohms ‧ cm. In an embodiment, the polymer material 141 may comprise an epoxy resin, a silicone, an acrylic or a polystyrene, or the like.

複數個導電顆粒142混合於具高體阻值之高分子材料141,藉此獲得較低體阻值之混合介電材料14。導電顆粒142可包含金屬,例如:銀、銅或其他類似者。導電顆粒142也可包含金屬氧化物,例如:二氧化鈦(TiO2)、二氧化錫(SnO2)、氧化鋅(ZnO)或其他類似者。此外,導電顆粒142可包含奈米金屬顆粒,例如:銀奈米顆粒、銅奈米顆粒或其他類似者。導電顆粒142亦可包含奈米金屬氧化物顆粒,例如:二氧化鈦奈米顆粒、二氧化錫奈米顆粒、氧化鋅奈米顆粒或其他類似者。A plurality of conductive particles 142 are mixed with the high molecular resistance 141, thereby obtaining a lower dielectric resistance mixed dielectric material 14. The conductive particles 142 may comprise a metal such as silver, copper or the like. Conductive particles 142 may also comprise a metal oxide such as titanium dioxide (TiO 2 ), tin dioxide (SnO 2 ), zinc oxide (ZnO) or the like. Further, the conductive particles 142 may include nano metal particles such as silver nanoparticles, copper nanoparticles or the like. The conductive particles 142 may also contain nano metal oxide particles such as titanium dioxide nanoparticles, tin dioxide nanoparticles, zinc oxide nanoparticles or the like.

在高分子材料141內混合足量之導電顆粒142,可獲得體阻值較低之混合介電材料14。而體阻值較低之混合介電材料14可允許當電極層13施加電壓時,電流流經其中。在一實施例中,混合介電材料14可介於108至1012歐姆‧公分。如此,當電極層13施加電壓時,電流可流經混合介電材料14,而在混合介電材料14與工件之間形成電荷層。By mixing a sufficient amount of the conductive particles 142 in the polymer material 141, a mixed dielectric material 14 having a low bulk resistance can be obtained. The mixed dielectric material 14 having a lower body resistance value allows current to flow therethrough when the voltage is applied to the electrode layer 13. In an embodiment, the hybrid dielectric material 14 can be between 10 8 and 10 12 ohms ‧ cm. As such, when a voltage is applied to the electrode layer 13, current can flow through the hybrid dielectric material 14 to form a charge layer between the hybrid dielectric material 14 and the workpiece.

藉由改變複數個導電顆粒142之混合量,可調整混合介電材料14之體阻值,以使靜電吸盤1可為約翰遜‧拉貝克靜電吸盤。在一實施例中,以混合介電材料14之總重計,複數個導電顆粒142之重量份介於3%至30%之間。混合介電材料14中混有3%至30%重量份之導電顆粒142,可獲得體阻值介於108至1012歐姆‧公分之混合介電材料14。By changing the mixing amount of the plurality of conductive particles 142, the body resistance of the mixed dielectric material 14 can be adjusted so that the electrostatic chuck 1 can be a Johnson Labec electrostatic chuck. In one embodiment, the weight of the plurality of electrically conductive particles 142 is between 3% and 30%, based on the total weight of the mixed dielectric material 14. The mixed dielectric material 14 is mixed with 3% to 30% by weight of the conductive particles 142 to obtain a mixed dielectric material 14 having a volume resistance value of from 10 8 to 10 12 ohms ‧ cm.

由於混合介電材料14具有較低之體阻值,電流可流經混合介電材料14,而在混合介電材料14與工件之間形成電荷層,使得靜電吸盤1可利用約翰遜‧拉貝克力吸附工件,而非僅以庫侖力吸附工件。由於此種效果,因此可增加基底11上之混合介電材料14之厚度,而不致影響靜電吸盤1之靜電吸力。較厚之混合介電材料14可具有較大的機械強度,較不易損壞,尤其是不易受到微粒刮壞。在一實施例中,基底11上之混合介電材料14之厚度可大於100微米(micrometers)。在另一實施例中,基底11上之混合介電材料14之厚度可介於200微米至500微米之間。Since the hybrid dielectric material 14 has a lower bulk resistance, current can flow through the hybrid dielectric material 14 to form a charge layer between the hybrid dielectric material 14 and the workpiece, such that the electrostatic chuck 1 can utilize Johnson Labec force. Adsorb the workpiece, not just the Coulomb force. Due to this effect, the thickness of the mixed dielectric material 14 on the substrate 11 can be increased without affecting the electrostatic attraction of the electrostatic chuck 1. The thicker hybrid dielectric material 14 can have greater mechanical strength, is less susceptible to damage, and is particularly less susceptible to particle scratching. In one embodiment, the thickness of the hybrid dielectric material 14 on the substrate 11 can be greater than 100 microns. In another embodiment, the thickness of the hybrid dielectric material 14 on the substrate 11 can be between 200 microns and 500 microns.

此外,相較於使用燒結陶瓷材料,使用混合介電材料14所製成之靜電吸盤1之重量較輕,使用上較為便利。Further, the electrostatic chuck 1 made of the mixed dielectric material 14 is lighter in weight than the sintered ceramic material, and is convenient to use.

複數個導電顆粒142混合在一液狀高分子材料內,混合液施佈在基底11,形成一塗層,待塗層硬化後,即可獲得混合介電材料14。在一實施例中,混合液施佈之方法包含旋轉塗佈、毛刷塗佈或浸泡等方法。A plurality of conductive particles 142 are mixed in a liquid polymer material, and the mixed solution is applied to the substrate 11 to form a coating layer. After the coating layer is hardened, the mixed dielectric material 14 is obtained. In one embodiment, the method of applying the mixed liquid comprises methods such as spin coating, brush coating, or soaking.

基底11之材料可為應用所需來決定,或其上覆層加工所需來決定。在本實施例中,基底11包含金屬,其包含鋁、鋁合金或不鏽鋼等。另,基底11可具任一形狀,其形狀可根據應用所需來決定。The material of the substrate 11 can be determined for the application, or as determined by the processing of the overlying layer. In the present embodiment, the substrate 11 contains a metal including aluminum, aluminum alloy, stainless steel, or the like. Alternatively, the substrate 11 can have any shape, the shape of which can be determined according to the needs of the application.

復參圖1所示,當基底11包含金屬時,靜電吸盤1可另包含一高分子材料12,高分子材料12設置於基底11與電極層13之間,以電氣隔離基底11與電極層13。在一實施例中,高分子材料12可包含環氧樹脂、矽基樹脂、丙烯酸酯或聚苯乙烯。高分子材料12之厚度需足夠電氣隔離基底11與電極層13,在一實施例中,高分子材料12之厚度可約為0.1~1.0公釐(millimeter)。Referring to FIG. 1 , when the substrate 11 comprises a metal, the electrostatic chuck 1 may further comprise a polymer material 12 disposed between the substrate 11 and the electrode layer 13 to electrically isolate the substrate 11 and the electrode layer 13 . . In an embodiment, the polymeric material 12 may comprise an epoxy resin, a sulfhydryl resin, an acrylate or a polystyrene. The thickness of the polymer material 12 needs to be sufficient to electrically isolate the substrate 11 from the electrode layer 13. In one embodiment, the polymer material 12 may have a thickness of about 0.1 to 1.0 millimeter.

參照圖1所示,電極層13形成在高分子材料12上。電極層13以一導線15耦接一電源供應器16,藉此提供電壓,以使靜電吸盤1可吸附工件。電極層13之材料可包含鉬或鎢。在一實施例中,電極層13係以印刷方法來製作。Referring to FIG. 1, the electrode layer 13 is formed on the polymer material 12. The electrode layer 13 is coupled to a power supply 16 by a wire 15, thereby providing a voltage so that the electrostatic chuck 1 can adsorb the workpiece. The material of the electrode layer 13 may comprise molybdenum or tungsten. In one embodiment, the electrode layer 13 is fabricated by a printing process.

圖3顯示本發明一實施例之靜電吸盤1'之剖視圖。參照圖3所示,靜電吸盤1'包含一基底11'、一前述之電極層13,以及一前述之混合介電材料14。基底11'包含絕緣材料。電極層13係直接形成於基底11'。混合介電材料14覆蓋電極層13。Fig. 3 is a cross-sectional view showing an electrostatic chuck 1' according to an embodiment of the present invention. Referring to FIG. 3, the electrostatic chuck 1' includes a substrate 11', an electrode layer 13 as described above, and a hybrid dielectric material 14 as described above. The substrate 11' contains an insulating material. The electrode layer 13 is formed directly on the substrate 11'. The hybrid dielectric material 14 covers the electrode layer 13.

在本實施例中,基底11'可包含一凸出部111,凸出部111形成在基底11'之一表面112上。電極層13形成在凸出部111之表面上。混合介電材料14覆蓋凸出部111及表面112,並延伸至基底11'之側表面,如圖3所示。In the present embodiment, the substrate 11' may include a protrusion 111 formed on a surface 112 of the substrate 11'. The electrode layer 13 is formed on the surface of the projection 111. The hybrid dielectric material 14 covers the projections 111 and the surface 112 and extends to the side surface of the substrate 11' as shown in FIG.

在一實施例中,基底11'之材料可包含石英或陶瓷等材料製作。In an embodiment, the material of the substrate 11' may be made of a material such as quartz or ceramic.

在一實施例中,電極層13以一導線15耦接一電源供應器16,藉此提供電壓,以使靜電吸盤1'可吸附工件。電極層13之材料可包含鉬或鎢。電極層13可利用熱噴塗方法形成在基底11'之凸出部111上,其中熱噴塗包含火焰噴塗、電漿噴塗、電弧噴塗、噴槍噴塗及高速氧/燃料噴塗。在另一實施例中,電極層13係以沈積製程來形成。In one embodiment, the electrode layer 13 is coupled to a power supply 16 by a wire 15, thereby providing a voltage such that the electrostatic chuck 1' can adsorb the workpiece. The material of the electrode layer 13 may comprise molybdenum or tungsten. The electrode layer 13 can be formed on the projections 111 of the substrate 11' by thermal spraying, wherein the thermal spraying includes flame spraying, plasma spraying, arc spraying, spray gun spraying, and high-speed oxygen/fuel spraying. In another embodiment, the electrode layer 13 is formed by a deposition process.

混合介電材料14覆蓋基底11',在一實施例中,混合介電材料14可利用包含導電顆粒142和高分子溶液之混合液製成,而混合液可利用旋轉塗佈、毛刷塗佈或浸泡等方法使其覆蓋基底11'。The mixed dielectric material 14 covers the substrate 11'. In one embodiment, the mixed dielectric material 14 can be made of a mixture comprising conductive particles 142 and a polymer solution, and the mixture can be coated by spin coating or brush coating. Or soaking or the like to cover the substrate 11'.

本揭露之技術內容及技術特點已揭示如上,然而本揭露所屬技術領域中具有通常知識者應瞭解,在不背離後附申請專利範圍所界定之本揭露精神和範圍內,本揭露之教示及揭示可作種種之替換及修飾。例如,上文揭示之許多製程可以不同之方法實施或以其它製程予以取代,或者採用上述二種方式之組合。The technical content and the technical features of the present disclosure have been disclosed as above, but those skilled in the art should understand that the teachings and disclosures of the present disclosure are disclosed without departing from the spirit and scope of the disclosure as defined by the appended claims. Can be used for various substitutions and modifications. For example, many of the processes disclosed above may be implemented in different ways or in other processes, or a combination of the two.

此外,本案之權利範圍並不侷限於上文揭示之特定實施例的製程、機台、製造、物質之成份、裝置、方法或步驟。本揭露所屬技術領域中具有通常知識者應瞭解,基於本揭露教示及揭示製程、機台、製造、物質之成份、裝置、方法或步驟,無論現在已存在或日後開發者,其與本案實施例揭示者係以實質相同的方式執行實質相同的功能,而達到實質相同的結果,亦可使用於本揭露。因此,以下之申請專利範圍係用以涵蓋用以此類製程、機台、製造、物質之成份、裝置、方法或步驟。Moreover, the scope of the present invention is not limited to the particular process, machine, manufacture, composition, means, method or method of the particular embodiments disclosed. It should be understood by those of ordinary skill in the art that, based on the teachings of the present disclosure, the process, the machine, the manufacture, the composition of the material, the device, the method, or the steps, whether present or future developers, The revealer performs substantially the same function in substantially the same manner, and achieves substantially the same result, and can also be used in the present disclosure. Accordingly, the scope of the following claims is intended to cover such <RTIgt; </ RTI> processes, machines, manufactures, compositions, devices, methods or steps.

1、1'...靜電吸盤1, 1'. . . Electrostatic chuck

11、11'...基底11, 11'. . . Base

12...高分子材料12. . . Polymer Materials

13...電極層13. . . Electrode layer

14...混合介電材料14. . . Mixed dielectric material

15...導線15. . . wire

16...電源供應器16. . . Power Supplier

111...凸出部111. . . Protrusion

112...表面112. . . surface

141...高分子材料141. . . Polymer Materials

142...導電顆粒142. . . Conductive particles

圖1顯示本發明一實施例之靜電吸盤之剖視圖;Figure 1 is a cross-sectional view showing an electrostatic chuck according to an embodiment of the present invention;

圖2顯示本發明一實施例之混合介電材料之示意圖;以及2 shows a schematic view of a hybrid dielectric material in accordance with an embodiment of the present invention;

圖3顯示本發明一實施例之靜電吸盤之剖視圖。Figure 3 is a cross-sectional view showing an electrostatic chuck according to an embodiment of the present invention.

1...靜電吸盤1. . . Electrostatic chuck

11...基底11. . . Base

12...高分子材料12. . . Polymer Materials

13...電極層13. . . Electrode layer

14...混合介電材料14. . . Mixed dielectric material

15...導線15. . . wire

16...電源供應器16. . . Power Supplier

Claims (20)

一種靜電吸盤,包含:一基底;一電極層,設置於該基底上,該電極層用以產生靜電吸力;以及一混合介電材料,覆蓋該電極層,該混合介電材料包含一第一高分子材料與複數個導電顆粒,其中該混合介電材料之體阻值介於108至1012歐姆‧公分。An electrostatic chuck comprising: a substrate; an electrode layer disposed on the substrate, the electrode layer for generating electrostatic attraction; and a mixed dielectric material covering the electrode layer, the mixed dielectric material comprising a first high The molecular material and the plurality of conductive particles, wherein the mixed dielectric material has a bulk resistance value of 10 8 to 10 12 ohms ‧ cm. 根據請求項1所述之靜電吸盤,其中該第一高分子材料之體阻值大於1014歐姆‧公分。The electrostatic chuck according to claim 1, wherein the first polymer material has a bulk resistance greater than 10 14 ohms ‧ cm. 根據請求項1所述之靜電吸盤,其中該些導電顆粒為奈米金屬顆粒或金屬氧化物。The electrostatic chuck according to claim 1, wherein the conductive particles are nano metal particles or metal oxides. 根據請求項1所述之靜電吸盤,其中各該導電顆粒包含二氧化鈦、二氧化錫、氧化鋅、銀或銅。The electrostatic chuck according to claim 1, wherein each of the conductive particles comprises titanium oxide, tin dioxide, zinc oxide, silver or copper. 根據請求項1所述之靜電吸盤,其中該第一高分子材料包含環氧樹脂、矽基樹脂、丙烯酸酯或聚苯乙烯。The electrostatic chuck according to claim 1, wherein the first polymer material comprises an epoxy resin, a sulfhydryl resin, an acrylate or a polystyrene. 根據請求項1所述之靜電吸盤,其中該基底包含絕緣材料,而該電極層直接形成於該基底上。The electrostatic chuck according to claim 1, wherein the substrate comprises an insulating material, and the electrode layer is formed directly on the substrate. 根據請求項6所述之靜電吸盤,其中該基底包含石英或陶瓷。The electrostatic chuck of claim 6, wherein the substrate comprises quartz or ceramic. 根據請求項1所述之靜電吸盤,其更包含一第二高分子材料,其中該第二高分子材料介於該基底與該電極層之間。The electrostatic chuck according to claim 1, further comprising a second polymer material, wherein the second polymer material is interposed between the substrate and the electrode layer. 根據請求項8所述之靜電吸盤,其中該基底包含金屬。The electrostatic chuck of claim 8, wherein the substrate comprises a metal. 一種靜電吸盤,包含:一基底;一電極層,設置於該基底上,該電極層用以產生靜電吸力;以及一混合介電材料,覆蓋該電極層,該混合介電材料包含一高分子材料與複數個金屬顆粒,其中以該混合介電材料之總重計,該些金屬顆粒之重量份介於3%至30%之間。An electrostatic chuck comprising: a substrate; an electrode layer disposed on the substrate, the electrode layer for generating electrostatic attraction; and a mixed dielectric material covering the electrode layer, the mixed dielectric material comprising a polymer material And a plurality of metal particles, wherein the metal particles are between 3% and 30% by weight based on the total weight of the mixed dielectric material. 根據請求項10所述之靜電吸盤,其中該混合介電材料之體阻值介於108至1012歐姆‧公分。The electrostatic chuck according to claim 10, wherein the mixed dielectric material has a bulk resistance of from 10 8 to 10 12 ohms ‧ cm. 根據請求項10所述之靜電吸盤,其中該第一高分子材料之體阻值大於1014歐姆‧公分。The electrostatic chuck according to claim 10, wherein the first polymer material has a bulk resistance greater than 10 14 ohms ‧ cm. 根據請求項10所述之靜電吸盤,其中該些導電顆粒為奈米金屬顆粒或金屬氧化物。The electrostatic chuck according to claim 10, wherein the conductive particles are nano metal particles or metal oxides. 根據請求項10所述之靜電吸盤,其中各該導電顆粒包含二氧化鈦、二氧化錫、氧化鋅、銀或銅。The electrostatic chuck according to claim 10, wherein each of the conductive particles comprises titanium dioxide, tin dioxide, zinc oxide, silver or copper. 根據請求項10所述之靜電吸盤,其中該第一高分子材料包含環氧樹脂、矽基樹脂、丙烯酸酯或聚苯乙烯。The electrostatic chuck according to claim 10, wherein the first polymer material comprises an epoxy resin, a sulfhydryl resin, an acrylate or a polystyrene. 根據請求項10所述之靜電吸盤,其中該基底包含絕緣材料,而該電極層直接形成於該基底上。The electrostatic chuck according to claim 10, wherein the substrate comprises an insulating material, and the electrode layer is formed directly on the substrate. 根據請求項16所述之靜電吸盤,其中該基底包含石英或陶瓷。The electrostatic chuck of claim 16, wherein the substrate comprises quartz or ceramic. 根據請求項10所述之靜電吸盤,其更包含一第二高分子材料,其中該第二高分子材料介於該基底與該電極層之間。The electrostatic chuck according to claim 10, further comprising a second polymer material, wherein the second polymer material is interposed between the substrate and the electrode layer. 根據請求項18所述之靜電吸盤,其中該基底包含金屬。The electrostatic chuck of claim 18, wherein the substrate comprises a metal. 一種靜電吸盤之製作方法,包含下列步驟:混入複數個導電顆粒於一高分子材料中,以獲得一混合液;將該混合液塗佈於一基底上,形成一塗層;以及硬化該塗層,以獲得一混合介電材料,其中該混合介電材料之體阻值介於108至1012歐姆‧公分。A method for manufacturing an electrostatic chuck, comprising the steps of: mixing a plurality of conductive particles into a polymer material to obtain a mixed solution; applying the mixed solution to a substrate to form a coating; and hardening the coating Obtaining a mixed dielectric material, wherein the mixed dielectric material has a bulk resistance of from 10 8 to 10 12 ohms ‧ cm.
TW100135164A 2011-09-29 2011-09-29 Electrostatic chuck and manufacturing method thereof TW201314815A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110036467A (en) * 2016-12-12 2019-07-19 应用材料公司 New-type restorative procedure for electrostatic chuck
CN111146974A (en) * 2018-11-06 2020-05-12 美科米尚技术有限公司 Electrostatic suction head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110036467A (en) * 2016-12-12 2019-07-19 应用材料公司 New-type restorative procedure for electrostatic chuck
CN111146974A (en) * 2018-11-06 2020-05-12 美科米尚技术有限公司 Electrostatic suction head

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