TW201313386A - Method for grinding thin sheet-like workpiece and double-end surface grinder - Google Patents

Method for grinding thin sheet-like workpiece and double-end surface grinder Download PDF

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Publication number
TW201313386A
TW201313386A TW101124333A TW101124333A TW201313386A TW 201313386 A TW201313386 A TW 201313386A TW 101124333 A TW101124333 A TW 101124333A TW 101124333 A TW101124333 A TW 101124333A TW 201313386 A TW201313386 A TW 201313386A
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Taiwan
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carrier
static pressure
workpiece
static
carrier ring
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TW101124333A
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Chinese (zh)
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TWI604918B (en
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Atsushi Shibanaka
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Koyo Machine Ind Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/04Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/10Single-purpose machines or devices
    • B24B7/16Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
    • B24B7/17Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings for simultaneously grinding opposite and parallel end faces, e.g. double disc grinders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

To reduce influences of external forces that are to be applied to a carrier ring and improve workpiece grinding precision, and maintain high grinding precision over a long period of time without problems such as wear, etc. In a double-end surface grinder that grinds both surfaces of a thin sheet-like workpiece W by a pair of grinding wheels 3 while rotating the workpiece W via a carrier 4 in a state where the workpiece W fitted to the carrier 4 is supported by static pressures of a pair of static pressure pads 1 in a non-contact manner, a plurality of static pressure carrier guides 6a and 6b that support a carrier ring 5 on the outer periphery of the carrier 4 by static pressures in a non-contact manner are provided in the circumferential direction. The carrier ring 5 has a cylindrical outer peripheral surface 12, and in proximity to the outer peripheral surface 12, static pressure carrier guides 6a and 6b are disposed at substantially even intervals. The static pressure carrier guides 6a and 6b may be fixed or floatable.

Description

薄板狀工件之研磨方法及雙面平面磨床 Method for grinding thin plate-shaped workpiece and double-sided surface grinder

本發明係關於對矽晶圓等之薄板狀工件進行研磨時所使用的薄板狀工件之研磨方法及雙面平面磨床。 The present invention relates to a method of polishing a thin plate-shaped workpiece used for polishing a thin plate-shaped workpiece such as a tantalum wafer, and a double-sided surface grinder.

於使用橫軸雙面平面磨床對矽晶圓等之薄板狀工件進行研磨時,一面使藉由左右一對之靜壓研磨墊以非接觸方式靜壓支撐的工件繞其中心旋轉,一面藉由繞橫軸旋轉之左右一對研磨砂輪研磨迄至既定的完工厚度為止。 When a thin plate-shaped workpiece such as a tantalum wafer is polished by using a horizontal-axis double-sided surface grinder, a workpiece that is statically supported by a pair of left and right static pressure polishing pads is rotated around the center thereof by a static pressure polishing pad. A pair of left and right grinding wheels that are rotated about the horizontal axis are ground until a predetermined thickness is completed.

關於可旋轉自如地支撐工件之支撐方式,有直接接觸於工件之外周地支撐的直接接觸支撐方式(專利文獻1、2)、及透過載具、載具環支撐工件之載具支撐方式(專利文獻3),另外,直接接觸支撐方式有輥支撐方式(專利文獻1)及帶支撐方式(專利文獻2)。 Regarding the support method for rotatably supporting the workpiece, there is a direct contact support method that directly contacts the outer circumference of the workpiece (Patent Documents 1 and 2), and a carrier support method for supporting the workpiece through the carrier and the carrier ring (patent Document 3) In addition, the direct contact support method includes a roll support method (Patent Document 1) and a belt support method (Patent Document 2).

輥支撐方式(專利文獻1)係建構成:藉由複數個支撐輥將圓板狀之工件的外周支撐成沿圓周方向旋轉自如,並藉由其中任一支撐輥使工件繞中心旋轉。帶支撐方式(專利文獻2)係建構成:藉由二組支撐帶將圓板狀之工件的外周支撐成沿圓周方向旋轉自如,並藉由此支撐帶使工件繞中心旋轉。 The roller support method (Patent Document 1) is constructed such that the outer circumference of the disk-shaped workpiece is rotatably supported in the circumferential direction by a plurality of support rollers, and the workpiece is rotated around the center by any one of the support rollers. The belt support method (Patent Document 2) is constructed such that the outer circumference of the disk-shaped workpiece is supported to be rotatable in the circumferential direction by the two sets of support belts, and the workpiece is rotated around the center by the support belt.

載具支撐方式(專利文獻3)係於外周被固定在載具環上之薄板狀的載具之裝設孔裝設工件,將載具環藉由於其外周大致等分地配置之複數個支撐輥進行接觸並支撐,且藉由嚙合於載具環之內周側的環形齒輪之驅動齒輪,透過載具環、載具而使工件繞中心旋轉。 The carrier support method (Patent Document 3) mounts a workpiece on a mounting hole of a thin plate-shaped carrier that is fixed to the carrier ring on the outer circumference, and the carrier ring is provided with a plurality of supports that are substantially equally divided by the outer circumference thereof. The roller is contacted and supported, and the workpiece is rotated around the center by the carrier ring and the carrier by the drive gear of the ring gear meshed on the inner peripheral side of the carrier ring.

先前技術 Prior art 專利文獻 Patent literature

專利文獻1 日本國特開平10-175144號公報 Patent Document 1 Japanese Patent Laid-Open No. Hei 10-175144

專利文獻2 日本國特開平10-156681號公報 Patent Document 2 Japanese Patent Laid-Open No. Hei 10-156681

專利文獻3 日本國特開2005-205528號公報 Patent Document 3 Japanese Patent Laid-Open Publication No. 2005-205528

以往的直接接觸支撐方式係以支撐輥或支撐帶直接支撐工件之外周,藉由此支撐輥或支撐帶驅動工件使之旋轉,因此,具有無法於高精度地研磨薄板狀之工件的情況下採用之問題。 In the conventional direct contact support method, the outer circumference of the workpiece is directly supported by the support roller or the support belt, and the workpiece is driven to rotate by the support roller or the support belt, and therefore, the workpiece is not capable of grinding the thin plate-shaped workpiece with high precision. The problem.

另一方面,載具支撐方式為,使用外周被固定於載具環之薄板狀的載具,於其裝設孔內嵌入工件的狀態下,驅動藉由外周之支撐輥所支撐之載具環使之旋轉,所以,與直接接觸支撐方式相比較,具有可高精度地研磨薄片狀之工件的優點。但是,以往的載具支撐方式係採用將此載具環藉由於其外周大致等分地配置之複數個支撐輥進行接觸支撐的接觸支撐方式,所以具有以下之問題。 On the other hand, the carrier support method is to drive a carrier ring supported by the outer peripheral support roller in a state in which the workpiece is fixed to the carrier ring and the workpiece is embedded in the mounting hole. Since it is rotated, there is an advantage that the sheet-like workpiece can be polished with high precision as compared with the direct contact support method. However, the conventional carrier support method employs the contact support method in which the carrier ring is contact-supported by a plurality of support rollers arranged substantially equally on the outer circumference thereof, and thus has the following problems.

即為:以往藉由複數個支撐輥以挾入導環之方式接觸支撐,各支撐輥之振動傳遞給載具環且被合成,因而具有因其組合而造成工件的旋轉精度惡化之問題。另外,若支撐輥之支軸的安裝精度、尤其是相對於載具環之旋轉中心的平行度有不良的話,會有使得旋轉以外之力被傳遞給載具環,而造成載具環與工件發生傾斜等之問題。 That is, in the past, the support was contacted by a plurality of support rollers so as to break into the guide ring, and the vibration of each support roller was transmitted to the carrier ring and combined, so that the rotation accuracy of the workpiece was deteriorated due to the combination thereof. In addition, if the mounting accuracy of the support shaft of the support roller, especially the parallelism with respect to the rotation center of the carrier ring, is poor, the force other than the rotation is transmitted to the carrier ring, and the carrier ring and the workpiece are caused. There is a problem such as tilting.

另外,支撐輥係有使用對載具環不容易造成損傷、且不會滑動而可確實地支撐載具環之將高硬度聚氨酯等之樹脂材注塑成型且以機械加工作精加工而成者的情況,但於此情況下,因支撐輥係樹脂製,所以有以下之問題。亦即,具有難以穩定地作出支撐輥所要求之真圓度,另外,隨著時間之推移,容易引起支撐輥之品質劣化,更容易造成支撐輥之摩擦損耗等的問題。 In addition, the support roller is formed by injection molding a resin material such as high-hardness polyurethane which is not easily damaged by the carrier ring and can reliably support the carrier ring, and is mechanically finished. In this case, in this case, since the support roll is made of resin, there are the following problems. That is, it is difficult to stably achieve the roundness required for the support roller, and it is easy to cause deterioration of the quality of the support roller over time, and it is more likely to cause problems such as friction loss of the support roller.

本發明係有鑒於此種先前技術之問題點,其目的在於提供一種薄板狀工件之研磨方法及雙面平面磨床,其可減少施加於載具環之外力的影響,提高工件之研磨精度,並且不會產生摩擦等之問題,可長時間維持良好之研磨精度。 The present invention has been made in view of the problems of the prior art, and an object thereof is to provide a method for polishing a thin plate-like workpiece and a double-sided surface grinder which can reduce the influence of force applied to the carrier ring and improve the grinding precision of the workpiece, and There is no problem such as friction, and good polishing precision can be maintained for a long time.

本發明之薄板狀工件之研磨方法,係於藉由一對靜壓研磨墊非接觸式地靜壓支撐裝設於載具之薄板狀工件,一面透過該載具使該工件旋轉,一面藉由一對研磨砂輪對該工件之兩面進行研磨時,藉由複數個靜壓載具導引件於圓周方向非接觸式地靜壓支撐該載具之外周的載具環。 The method for polishing a thin plate-shaped workpiece according to the present invention is to non-contact statically support a thin plate-shaped workpiece mounted on a carrier by a pair of static pressure polishing pads, and to rotate the workpiece through the carrier while rotating the workpiece When a pair of grinding wheels grind both sides of the workpiece, the carrier rings of the outer periphery of the carrier are statically supported in a circumferential direction by a plurality of static-pressure carrier guides in a non-contact manner.

本發明之雙面平面磨床,係藉由一對靜壓研磨墊非接觸式地靜壓支撐裝設於載具之薄板狀工件,一面透過該載具使該工件旋轉,一面藉由一對研磨砂輪對該工件之兩面進行研磨,該雙面平面磨床係於圓周方向具有複數個非接觸式地靜壓支撐該載具之外周的載具環之靜壓載具導引件。 The double-sided surface grinder of the present invention is a non-contact static pressure supporting support of a thin plate-shaped workpiece mounted on a carrier by a pair of static pressure polishing pads, and the workpiece is rotated by the carrier while being rotated by a pair of grinding The grinding wheel grinds both sides of the workpiece, the double-sided surface grinding machine having a plurality of non-contact static pressure carrier guides for non-contact static support of the carrier ring around the carrier.

亦可為該載具環具有圓筒面狀之外周面,且接近該外周面大致等分地配置該各靜壓載具導引件。該靜壓載具導引件亦可固定。另外,該靜壓載具導引件亦可浮動。 The carrier ring may have a cylindrical outer peripheral surface, and the static pressure carrier guides may be disposed substantially equally to the outer circumferential surface. The static pressure carrier guide can also be fixed. In addition, the static pressure carrier guide can also float.

亦可為藉由與該載具環之旋轉中心大致平行的浮動軸樞支該各靜壓載具導引件,在該各靜壓載具導引件上具備靜壓穴,其在該載具環之旋轉方向上相對於該浮動軸呈大致對稱,且朝與該載具環之外周面之間供給靜壓流體。 The static pressure carrier guides may be pivotally supported by a floating shaft substantially parallel to the rotation center of the carrier ring, and the static pressure carrier guides are provided with static pressure holes at the load. The ring is substantially symmetrical with respect to the floating axis in the direction of rotation, and a hydrostatic fluid is supplied between the outer circumferential surface of the carrier ring.

亦可具備:支撐臂,其藉由與該載具環之旋轉中心大致平行的樞軸可擺動自如地樞支,且可朝遠離或接近該載具環之方向移動地支撐至少一部分之該靜壓載具環;驅動機構,其使該支撐臂繞該樞軸轉動;及止動機構,其使該支撐臂停止於既定位置。 The support arm can also be pivotally supported by a pivot substantially parallel to the center of rotation of the carrier ring, and can support at least a portion of the static movement away from or in proximity to the carrier ring. a ballast ring; a drive mechanism that rotates the support arm about the pivot; and a stop mechanism that stops the support arm in a predetermined position.

該靜壓載具導引件亦可變更為固定狀態及繞與該載具環之旋轉中心大致平行的浮動軸浮動之浮動狀態。 The static pressure carrier guide can also be changed to a fixed state and a floating state in which a floating axis that is substantially parallel to the center of rotation of the carrier ring floats.

亦可具備在該載具環之外周大致等分地配置的3個以上之該靜壓載具導引件,且具備間隙調整機構,其在該載具環之大致直徑方向對該3個以上之靜壓載具導引件中至少一個該靜壓載具導引件的位置進行調整,從而調整該3個以上之靜壓載具導引件的靜壓面與該載具環之外周面的間隙。 It is also possible to provide three or more static-pressure carrier guides that are arranged substantially equally in the outer circumference of the carrier ring, and that include a gap adjustment mechanism that is three or more in the substantially radial direction of the carrier ring. Adjusting the position of at least one of the static pressure carrier guides to adjust the static pressure surface of the three or more static pressure carrier guides and the outer circumference of the carrier ring Clearance.

根據本發明,藉由靜壓載具導引件靜壓支撐載具環,所以,具有可減少施加於載具環之外力的影響,提高工件之研磨精度,並且不會產生摩擦等之問題,可長期間地維持良好之研磨精度的優點。 According to the present invention, since the static pressure carrier guide is used to statically support the carrier ring, there is a problem that the influence of the force applied to the carrier ring can be reduced, the polishing precision of the workpiece can be improved, and friction or the like is not generated. The advantage of maintaining good grinding accuracy over a long period of time.

以下,參照圖式,針對本發明之各實施形態詳細進行說明。圖面乃例示採用本發明之臥式雙面平面磨床。此臥式雙面平面磨床,如第1、第2圖所示,具有:左右一對之靜壓研磨墊1,其等左右相對向地配置且以非接觸方式靜壓支撐薄板狀工件W;左右一對之研磨砂輪3,其等與各靜壓研磨墊1之缺口部2對應,可繞左右方向之研磨砂輪軸旋轉自如地配置,且朝切入軸之軸心方向移動,對藉由靜壓研磨墊1支撐之工件W的左右兩側面進行研磨;載具4,其使所裝設之工件W在藉由靜壓研磨墊1保持之狀態下繞切入軸之軸心旋轉;載具環5,其支撐載具4之外周;及複數個靜壓載具導引件6a,6b,其等在載具環5之外周大致等分地配置,且將載具環5自外周以非接觸方式靜壓支撐成可旋轉自如。 Hereinafter, each embodiment of the present invention will be described in detail with reference to the drawings. The drawing is a illustration of a horizontal double-sided surface grinder using the present invention. The horizontal double-sided surface grinder, as shown in the first and second figures, has a pair of right and left static pressure polishing pads 1, which are disposed opposite to each other and are statically supported in a non-contact manner to support the thin plate-like workpiece W; A pair of left and right grinding wheels 3 corresponding to the notch portions 2 of the static pressure polishing pads 1 are rotatably arranged around the grinding wheel shaft in the left and right direction, and are moved toward the axis of the cutting axis, thereby The left and right sides of the workpiece W supported by the pressure polishing pad 1 are ground; the carrier 4 rotates the mounted workpiece W around the axis of the cutting axis while being held by the static pressure polishing pad 1; the carrier ring 5, which supports the outer circumference of the carrier 4; and a plurality of static pressure carrier guides 6a, 6b, which are arranged substantially equally in the outer circumference of the carrier ring 5, and the carrier ring 5 is non-contacted from the outer circumference The static pressure support is rotatable.

各靜壓研磨墊1係建構成:配置於可朝切入軸之軸心方向移動之左右一對的活動台8之對向端側,且可於保持工件W之前進位置及自工件W退避的退避位置之間沿切入軸方向自由移動,並在前進位置透過朝與工件W對向之靜壓面側供給之靜壓水等的靜壓流體,以非接觸方式靜壓支撐工件W。 Each of the static pressure polishing pads 1 is configured to be disposed on the opposite end side of the pair of right and left movable stages 8 that are movable in the axial direction of the cutting axis, and is capable of retracting from the workpiece W before the workpiece W is held. The retracted position is freely moved in the direction of the cutting axis, and the static pressure fluid such as static pressure water supplied to the static pressure side facing the workpiece W is transmitted through the advanced position, and the workpiece W is statically supported in a non-contact manner.

載具4係比工件W之完工尺寸還薄的薄板狀之圓板,且具有呈大致同心圓狀之裝設孔9,可供工件W拆卸自如地裝設。如第1至第4圖所示,載具4係藉由在其外周呈大致同心狀配置之載具環5及固定於載具環5內且將載具4之外周朝載具環5側按壓之壓環10所支 撐。載具環5係相對於載具4之旋轉中心大致同心狀地具有形成為圓筒面狀之外周面12,另外,軸心方向之兩側的端面係與靜壓研磨墊1之靜壓面外周側的台階部11隔著間隙而相對向。由載具4、載具環、壓環10構成載具機構7,工件W之存取等係與此載具機構7成一體地存取。 The carrier 4 is a thin plate-shaped circular plate which is thinner than the finished size of the workpiece W, and has a mounting hole 9 which is substantially concentric, and the workpiece W can be detachably mounted. As shown in the first to fourth figures, the carrier 4 is fixed to the carrier ring 5 by the carrier ring 5 arranged substantially concentrically on the outer circumference thereof, and the outer circumference of the carrier 4 is directed toward the carrier ring 5 side. Pressed on the pressure ring 10 support. The carrier ring 5 has a cylindrical outer peripheral surface 12 formed substantially in a concentric shape with respect to the center of rotation of the carrier 4, and the end faces on both sides in the axial direction and the static pressure surface of the static pressure polishing pad 1 The step portion 11 on the outer peripheral side faces each other with a gap therebetween. The carrier 4, the carrier ring, and the pressure ring 10 constitute the carrier mechanism 7, and the access of the workpiece W is integrally accessed with the carrier mechanism 7.

又,載具環5係採用薄璧且容易提高真圓度之氧化鋁等的陶瓷材料,但亦可為不鏽鋼等之金屬製。於壓環10之內周設有環形齒輪13,藉由嚙合於此環形齒輪13之驅動齒輪14,旋轉驅動含有載具4、載具環5之載具機構7。 Further, the carrier ring 5 is made of a ceramic material such as alumina which is thin and has a good roundness, but may be made of a metal such as stainless steel. A ring gear 13 is provided on the inner circumference of the pressure ring 10, and the carrier mechanism 7 including the carrier 4 and the carrier ring 5 is rotationally driven by the drive gear 14 engaged with the ring gear 13.

各靜壓載具導引件6a,6b係裝設在與一活動台8之載具4對向的對向端側,且於載具環5的外周沿圓周方向大致等分地配置3個以上。例如,於本實施形態中,大致四等分地配置4個靜壓載具導引件6a,6b,如第3、第4、第6圖所示,此各靜壓載具導引件6a,6b係透過浮動軸15a,15b樞接於活動台8,並透過固定機構16a,16b、限制機構17a,17b,以可變更為固定狀態及浮動狀態的方式裝設。 Each of the static-pressure carrier guides 6a, 6b is attached to the opposite end side of the carrier 4 of the movable table 8, and is arranged substantially equally in the circumferential direction on the outer circumference of the carrier ring 5. the above. For example, in the present embodiment, four static-pressure carrier guides 6a, 6b are arranged substantially equally, and as shown in the third, fourth, and sixth figures, each of the static-pressure carrier guides 6a 6b is pivotally connected to the movable table 8 via the floating shafts 15a, 15b, and is fixed in a more fixed state and a floating state by the fixing mechanisms 16a, 16b and the restricting mechanisms 17a, 17b.

如第7及第8圖所示,各靜壓載具導引件6a,6b係於載具環5之在旋轉方向(以下,簡稱為旋轉方向)的大致中央形成有供浮動軸15a,15b插通之軸孔20,並設有配置於軸孔20之兩側的2個銷孔21、與載具環5之外周面12相隔微小間隙而對向之靜壓面22、設於此靜壓面22側之2個靜壓穴23、及配置於2個靜壓穴23間之 逃逸槽24。浮動軸15a,15b、銷孔21、軸孔20係與載具環5之旋轉軸心及切入軸大致平行,銷孔21係於旋轉方向之兩側相對於軸孔20大致對稱地配置。 As shown in FIGS. 7 and 8, each of the static-pressure carrier guides 6a, 6b is formed with a floating shaft 15a, 15b substantially at the center of the carrier ring 5 in the rotational direction (hereinafter, simply referred to as the rotational direction). The shaft hole 20 is inserted, and two pin holes 21 disposed on both sides of the shaft hole 20 and a static gap 22 opposite to the outer peripheral surface 12 of the carrier ring 5 are provided. Two static pressure holes 23 on the pressure surface 22 side and two static pressure holes 23 Escape slot 24. The floating shafts 15a, 15b, the pin holes 21, and the shaft holes 20 are substantially parallel to the rotation axis and the cutting axis of the carrier ring 5, and the pin holes 21 are arranged substantially symmetrically with respect to the shaft holes 20 on both sides in the rotation direction.

各靜壓載具導引件6a,6b之靜壓面22,係沿載具環5之外周面12形成為圓弧狀,且與載具環5之外周面12之間相隔微小之間隙(例如,10~30μm)而於直徑方向相對向。靜壓穴23係用以朝靜壓載具導引件6a,6b之靜壓面22與載具環5之外周面12之間供給靜壓水等的靜壓流體者,其由從靜壓面22凹入且在旋轉方向具有較長長度的凹部所構成,且於旋轉方向的兩側相對於浮動軸15a,15b、軸孔20大致對稱地配置。各靜壓穴23係自內部之連通孔25透過靜壓面22相反側之可撓性軟管26等連接至靜壓流體之供給源29。 The static pressure surface 22 of each of the hydrostatic carrier guides 6a, 6b is formed in an arc shape along the outer peripheral surface 12 of the carrier ring 5, and is spaced apart from the outer peripheral surface 12 of the carrier ring 5 by a slight gap ( For example, 10 to 30 μm) and opposed in the diametrical direction. The static pressure hole 23 is for supplying static pressure fluid such as static pressure water between the static pressure surface 22 of the static pressure carrier guides 6a, 6b and the outer circumferential surface 12 of the carrier ring 5, which is subjected to static pressure. The surface 22 is recessed and has a long length in the rotation direction, and is disposed substantially symmetrically with respect to the floating shafts 15a, 15b and the shaft holes 20 on both sides in the rotational direction. Each of the static pressure holes 23 is connected to the supply source 29 of the hydrostatic fluid from the inner communication hole 25 through the flexible hose 26 or the like on the opposite side of the static pressure surface 22.

各靜壓載具導引件6a,6b中的與載具環5之直徑方向相對向的2個靜壓載具導引件6a,6b,如第9圖所示,係透過同一回路27連接於靜壓流體之供給源29。又,於各回路27裝設有壓力調整閥30、流量計31,藉由這些裝置來管理壓力及流量。 The two hydrostatic carrier guides 6a, 6b of the hydrostatic carrier guides 6a, 6b facing the diametrical direction of the carrier ring 5 are connected through the same circuit 27 as shown in FIG. The source 29 is a static pressure fluid. Further, a pressure regulating valve 30 and a flow meter 31 are installed in each circuit 27, and the pressure and flow rate are managed by these devices.

如第3、第4、第6圖所示,上側的2個靜壓載具導引件6a,6b係裝設於藉由樞軸33可擺動自如地樞接於活動台8上之支撐臂34,於拆裝載具機構7時,藉由驅動機構19使支撐臂34繞樞軸33擺動,以使上側之靜壓載具導引件6a朝遠離或接近載具環5之方向移動。樞軸33係與浮動軸15a大致平行。 As shown in the third, fourth, and sixth figures, the two hydrostatic carrier guides 6a, 6b on the upper side are mounted on the support arm pivotally connected to the movable table 8 by the pivot 33. 34. When the loader mechanism 7 is removed, the support arm 34 is pivoted about the pivot 33 by the drive mechanism 19 to move the upper static pressure carrier guide 6a away from or near the carrier ring 5. The pivot 33 is substantially parallel to the floating shaft 15a.

於支撐臂34之一端側,且於收容部35內裝設有靜壓載具導引件6a,於另一端連結有構成驅動機構19之缸體36。如第4、第6圖所示,收容部35係沿載具環5之直徑方向貫通地設於支撐臂34之側壁35a,35b之間,於此收容部35內收容有靜壓載具導引件6a,靜壓載具導引件6a係藉由貫通此收容部35兩側之側壁35a,35b而插通於支撐臂34的浮動軸15a所樞支。收容部35內之靜壓載具導引件6a,如第3、第6圖所示,係藉由固定機構16a而能以適宜角度固定於支撐臂34上,另外於解除固定機構16a時,可於藉由控制機構17a所限制之浮動範圍內浮動。 On one end side of the support arm 34, a static pressure carrier guide 6a is mounted in the housing portion 35, and a cylinder 36 constituting the drive mechanism 19 is coupled to the other end. As shown in the fourth and sixth figures, the accommodating portion 35 is provided between the side walls 35a and 35b of the support arm 34 in the radial direction of the carrier ring 5, and the static pressure carrier guide is accommodated in the accommodating portion 35. The lead member 6a and the static-pressure carrier guide 6a are pivotally supported by the floating shaft 15a of the support arm 34 through the side walls 35a, 35b on both sides of the accommodating portion 35. As shown in the third and sixth figures, the static pressure carrier guide 6a in the accommodating portion 35 can be fixed to the support arm 34 at an appropriate angle by the fixing mechanism 16a, and when the fixing mechanism 16a is released, It can float within the floating range limited by the control mechanism 17a.

固定機構16a係具有壓入於靜壓載具導引件6a之一個銷孔21內的固定銷39及具有供固定銷39可移除地嵌入的銷孔38b且可拆裝自如地裝設於支撐臂34的側面之固定支架38。固定支架38係藉由基部側之固定螺栓40可拆裝自如地樞接於支撐臂34上,且可藉由貫通此長孔38a而螺合於支撐臂34側之調整螺栓41繞固定螺栓40調整角度。銷孔38b係設於固定支架38之前端部,可移除地嵌入自如的固定銷39係嵌合於此銷孔38b內。控制機構17a係由靜壓載具導引件6a之另一個銷孔21及貫通收容部35且插通於銷孔21之限制銷42所構成,於限制銷42與銷孔21之間設有相當於浮動範圍之間隙。 The fixing mechanism 16a has a fixing pin 39 that is press-fitted into one of the pin holes 21 of the static-pressure carrier guide 6a and a pin hole 38b that is removably fitted with the fixing pin 39 and is detachably mounted to A mounting bracket 38 that supports the side of the arm 34. The fixing bracket 38 is detachably pivotally connected to the support arm 34 by the fixing bolt 40 on the base side, and the adjusting bolt 41 screwed to the side of the support arm 34 through the long hole 38a surrounds the fixing bolt 40. Adjust the angle. The pin hole 38b is fastened to the front end of the fixing bracket 38, and the removably insertable fixing pin 39 is fitted into the pin hole 38b. The control mechanism 17a is composed of another pin hole 21 of the static pressure carrier guide 6a and a restriction pin 42 that penetrates the housing portion 35 and is inserted through the pin hole 21, and is disposed between the restriction pin 42 and the pin hole 21. Corresponds to the gap of the floating range.

缸體36係介設於支撐臂34之連結銷44與活動台8的樞支銷45之間,使支撐臂34繞樞軸33擺動,以使靜壓載具導引件6a朝遠離或接近載具環5之方向(大致直 徑方向)移動。於支撐臂34之一端側設有使支撐臂34停止於既定位置之止動機構47。 The cylinder 36 is interposed between the coupling pin 44 of the support arm 34 and the pivot pin 45 of the movable table 8, and swings the support arm 34 about the pivot 33 to move the static pressure carrier guide 6a away or close. The direction of the carrier ring 5 (substantially straight The direction of the movement). A stopper mechanism 47 for stopping the support arm 34 at a predetermined position is provided on one end side of the support arm 34.

如第3、第6圖所示,止動機構47係具有固定於活動台8之抵接部48及可調整地螺合於支撐臂34的一端側之螺旋式止動器49,藉由調整止動器49,使得載具環5之直徑方向兩側的靜壓載具導引件6a,6b之靜壓面22間的間隔變化,可調整間隙,使載具環5能位於此兩靜壓載具導引件6a,6b之間的大致中央處。藉此,止動機構47可兼用作調整靜壓載具導引件6a之靜壓面22與載具環5的外周面12之間隙的間隙調整機構。 As shown in FIGS. 3 and 6, the stopper mechanism 47 has an abutting portion 48 fixed to the movable table 8 and a screw stopper 49 that is adjustably screwed to one end side of the support arm 34, by adjusting The stopper 49 changes the interval between the static pressure surfaces 22 of the static-pressure carrier guides 6a, 6b on both sides in the diameter direction of the carrier ring 5, and the gap can be adjusted so that the carrier ring 5 can be located at the two positions. At substantially the center between the ballast guides 6a, 6b. Thereby, the stopper mechanism 47 can also serve as a gap adjustment mechanism for adjusting the gap between the static pressure surface 22 of the static pressure carrier guide 6a and the outer circumferential surface 12 of the carrier ring 5.

如第3、第5、第10、第11圖所示,下側的2個靜壓載具導引件6b係透過包含有浮動軸15b、固定支架50之固定機構16b(參照第3、第5、第10圖)及限制機構17b(參照第11圖),可變更地裝設成固定狀態及浮動狀態。 As shown in the third, fifth, tenth, and eleventh figures, the two static-pressure carrier guides 6b on the lower side pass through the fixing mechanism 16b including the floating shaft 15b and the fixing bracket 50 (refer to the third and the third 5. Fig. 10) and the restriction mechanism 17b (see Fig. 11) are detachably mounted in a fixed state and a floating state.

浮動軸15b係固定於活動台8上。固定支架50係裝設成長度方向之一端側可相對於浮動軸15b作表裏翻轉且可繞浮動軸15b調整角度,另外,於另一端側設有固定孔53及比此固定孔53更大徑之浮動凹部54。靜壓載具導引件6b係藉由浮動軸15b樞支,於另一銷孔21內壓入卡合銷55。卡合銷55之朝固定支架50側的突出量,係在使浮動凹部54朝向靜壓載具導引件6b側時,不會卡合於固定孔53之程度。 The floating shaft 15b is fixed to the movable table 8. The fixing bracket 50 is installed such that one end side in the longitudinal direction can be inverted with respect to the floating shaft 15b and can be adjusted around the floating shaft 15b. Further, the fixing hole 53 is provided on the other end side and a larger diameter than the fixing hole 53 is provided. Floating recess 54. The static pressure carrier guide 6b is pivotally supported by the floating shaft 15b, and the engagement pin 55 is press-fitted into the other pin hole 21. The amount of projection of the engaging pin 55 toward the fixing bracket 50 is such that the floating recess 54 does not engage with the fixing hole 53 when it faces the hydrostatic carrier guide 6b side.

如第3、第5、第10圖所示,固定靜壓載具導引件6b時之固定機構16b,係由卡合銷55及固定支架50之 銷孔21所構成,藉由將卡合銷55插入銷孔21內,用以固定靜壓載具導引件6b。 As shown in the third, fifth, and tenth views, the fixing mechanism 16b for fixing the static pressure carrier guide 6b is composed of the engaging pin 55 and the fixing bracket 50. The pin hole 21 is formed by inserting the engaging pin 55 into the pin hole 21 for fixing the static pressure carrier guide 6b.

另外,限制靜壓載具導引件6b之浮動範圍的限制機構17b,如第1圖所示,係由卡合銷55及固定支架50之浮動凹部54所構成,且建構成在卡合銷55進入浮動凹部54時兩者的間隙與靜壓載具導引件6b之浮動範圍對應。 In addition, as shown in FIG. 1, the restricting mechanism 17b for restricting the floating range of the static-pressure carrier guide 6b is constituted by the engaging pin 55 and the floating recess 54 of the fixing bracket 50, and is constructed in the engaging pin. The gap between the two when entering the floating recess 54 corresponds to the floating range of the static-pressure carrier guide 6b.

於固定支架50之一端側設有把持浮動軸15b之基部的切開狀的把持部56、及緊固此把持部56之緊固螺栓57,固定支架50係可相對於浮動軸15b作角度調整。又,固定孔53、浮動凹部54係在固定支架50之長度方向形成較長,俾能繞浮動軸15b對固定支架50進行角度調整。 On one end side of the fixing bracket 50, a gripping portion 56 for gripping the base portion of the floating shaft 15b and a fastening bolt 57 for fastening the grip portion 56 are provided, and the fixing bracket 50 is angularly adjustable with respect to the floating shaft 15b. Further, the fixing hole 53 and the floating recess 54 are formed long in the longitudinal direction of the fixing bracket 50, and the fixing bracket 50 can be angularly adjusted around the floating shaft 15b.

於工件W之研磨時,藉由一對靜壓研磨墊1自左右兩側以非接觸方式靜壓支撐被裝設於載具4之工件W,並從在載具環5之外周大致四等分配置的各靜壓載具導引件6a,6b的靜壓穴23朝載具環5之外周面12供給靜壓流體,藉由各靜壓載具導引件6a,6b並透過靜壓流體以非接觸方式靜壓支撐載具環5,藉由驅動齒輪14且透過內部齒輪13驅動載具環5,使裝設於載具4之工件W繞其旋轉軸心旋轉,並藉由一對研磨砂輪3將工件W之兩面研磨迄至既定的完工尺寸為止。 At the time of polishing the workpiece W, the workpiece W mounted on the carrier 4 is statically supported by the pair of static pressure polishing pads 1 from the left and right sides in a non-contact manner, and is substantially four times from the outer circumference of the carrier ring 5. The static pressure holes 23 of the respective static pressure carrier guides 6a, 6b are supplied with static pressure fluid toward the outer peripheral surface 12 of the carrier ring 5, and the static pressure carrier guides 6a, 6b are passed through the static pressure. The fluid is statically pressed in a non-contact manner to support the carrier ring 5, and the carrier gear 5 is driven by the driving gear 14 and transmitted through the internal gear 13, so that the workpiece W mounted on the carrier 4 is rotated about its rotation axis, and by one The grinding wheel 3 is used to grind both sides of the workpiece W up to a predetermined finished size.

根據上述,可藉由外周之靜壓載具導引件6a,6b以非接觸方式靜壓支撐載具環5。亦即,於載具環5之外周面12間有被供給源自各靜壓載具導引件6a,6b的靜壓流體,從而可藉由此各靜壓載具導引件6a,6b透過靜壓 流體自外周側以非接觸方式靜壓支撐載具環5。另一方面,在與載具環5之兩端面之間,與以往相同地有被供給源自各靜壓研磨墊1之靜壓流體,而可藉由各靜壓研磨墊1透過靜壓流體以非接觸方式靜壓支撐。 According to the above, the carrier ring 5 can be statically supported in a non-contact manner by the peripheral static-pressure carrier guides 6a, 6b. That is, the hydrostatic fluid from the hydrostatic carrier guides 6a, 6b is supplied between the outer peripheral faces 12 of the carrier ring 5, whereby the hydrostatic carrier guides 6a, 6b can be thereby provided. Static pressure The fluid is statically supported to support the carrier ring 5 from the outer peripheral side in a non-contact manner. On the other hand, between the end faces of the carrier ring 5, the static pressure fluid supplied from each of the static pressure polishing pads 1 is supplied in the same manner as in the related art, and the static pressure polishing pad 1 can be passed through the static pressure fluid. Static support in a non-contact manner.

因此,載具環5之外周及兩端面均被以非接觸方式靜壓支撐,相較於藉由導輥支撐載具環5之習知的接觸支撐方式,於研磨周期中自載具環5透過載具4所施加於工件W上之外力減少,可改善工件W之旋轉精度(主要為外周振動)。因此,可提高工件W之研磨精度。 Therefore, the outer circumference and the both end faces of the carrier ring 5 are statically supported in a non-contact manner, and the self-loading ring 5 is in the grinding cycle as compared with the conventional contact support mode in which the carrier ring 5 is supported by the guide roller. The external force applied to the workpiece W by the carrier 4 is reduced, and the rotation accuracy of the workpiece W (mainly peripheral vibration) can be improved. Therefore, the grinding accuracy of the workpiece W can be improved.

而且,因為是藉由各靜壓載具導引件6a,6b透過靜壓流體以非接觸方式且旋轉自如地靜壓支撐載具環5,所以,不會有像在接觸支撐方式之情況時的構件相互接觸而造成之摩擦損耗等的問題,可半永久性地維持良好之旋轉精度。因此,可防止因摩擦損耗等所引起之工件W的研磨精度惡化、保養工時之增加、消耗品的費用之發生等。 Further, since the static pressure carrier guides 6a, 6b are statically and rotatably supported by the static pressure fluid in a non-contact manner and statically support the carrier ring 5, there is no case where the contact support method is used. The problem of friction loss caused by the contact of the members with each other can maintain a good rotation accuracy semi-permanently. Therefore, it is possible to prevent deterioration of polishing precision of the workpiece W due to friction loss or the like, increase in maintenance man-hours, and occurrence of cost of consumables.

另外,於載具環5之外周大致呈四等分配置的各靜壓載具導引件6a,6b中,配置於載具環5的直徑方向兩側之靜壓載具導引件6a,6b,如第3圖所示,連接於靜壓流體之壓力及流量非常大的同一回路27上,所以,於靜壓載具導引件6a,6b之靜壓面22與載具環5的外周面12之間的間隙發生變動時,欲將同一回路27內之壓力集中之力發生作用,由於載具環5欲保持在固定位置,從而可獲得穩定之旋轉精度。 Further, in each of the static-pressure carrier guides 6a, 6b which are disposed substantially in the outer circumference of the carrier ring 5, the static-pressure carrier guides 6a are disposed on both sides in the radial direction of the carrier ring 5, 6b, as shown in Fig. 3, is connected to the same circuit 27 where the pressure and flow rate of the hydrostatic fluid are very large, so that the static pressure surface 22 of the static pressure carrier guides 6a, 6b and the carrier ring 5 When the gap between the outer peripheral surfaces 12 is changed, the force for concentrating the pressure in the same circuit 27 is exerted, and since the carrier ring 5 is intended to be held at a fixed position, stable rotation accuracy can be obtained.

亦即,因不明之原因使對向之一對靜壓載具導引件6a,6b的壓力平衡發生破壞,例如,於下側之靜壓載具導引件6b與載具環5之間隙變窄的情況下,此靜壓載具導引件6b之靜壓穴23內的壓力上昇。反之,上側之靜壓載具導引件6a與載具環5之間隙變寬,則此靜壓載具導引件6a之靜壓穴23內的壓力降低。因此,載具環5係藉由兩靜壓載具導引件6a,6b之靜壓穴23的壓力差,以兩靜壓載具導引件6a,6b間之間隙均等的方式移動,從而確保在固定位置上。 That is, the pressure balance of one of the opposing counterstatic carrier guides 6a, 6b is broken for unknown reasons, for example, in the gap between the lower static pressure carrier guide 6b and the carrier ring 5. In the case of narrowing, the pressure in the static pressure hole 23 of the static pressure carrier guide 6b rises. On the other hand, when the gap between the upper static-pressure carrier guide 6a and the carrier ring 5 is widened, the pressure in the static pressure hole 23 of the static-pressure carrier guide 6a is lowered. Therefore, the carrier ring 5 is moved by the pressure difference between the static pressure holes 23 of the two static pressure carrier guides 6a, 6b so that the gap between the two static pressure carrier guides 6a, 6b is equal, thereby Make sure it is in a fixed position.

載具環5之外周面12係相對於載具4之旋轉中心呈大致同心狀的圓筒面,且為無靜壓流體之壓力逃出的槽等的形狀,靜壓載具導引件6a,6b之靜壓面22係相隔微小之間隙而接近於此載具環5之外周面12,所以,可藉由靜壓流體穩定性佳地支撐載具環5,可獲得載具環5之穩定的旋轉精度。而且,於各靜壓載具導引件6a,6b之靜壓面22,沿載具環5之旋轉方向具有2個靜壓穴23,且成為以中間之逃逸槽24所半分之構成,所以,能以各靜壓載具導引件6a,6b的單體,使載具環5之旋轉方向兩側的靜壓流體之壓力保持平衡。 The outer peripheral surface 12 of the carrier ring 5 is a cylindrical surface that is substantially concentric with respect to the center of rotation of the carrier 4, and is a shape of a groove that does not escape from the pressure of the hydrostatic fluid, and the static pressure carrier guide 6a. The static pressure surface 22 of the 6b is close to the outer circumferential surface 12 of the carrier ring 5 with a small gap therebetween. Therefore, the carrier ring 5 can be supported by the hydrostatic fluid stability, and the carrier ring 5 can be obtained. Stable rotation accuracy. Further, the static pressure surface 22 of each of the hydrostatic carrier guides 6a, 6b has two static pressure holes 23 in the direction of rotation of the carrier ring 5, and is formed by a half of the escape groove 24 in the middle. The pressure of the hydrostatic fluid on both sides of the rotation direction of the carrier ring 5 can be balanced by the individual of each of the static pressure carrier guides 6a, 6b.

於載具機構7之拆裝時,藉由缸體36使支撐臂34如第3圖之虛線所示沿第3圖之a箭頭所示方向繞樞軸33擺動,以使上側之2個靜壓載具導引件6a朝載具環5之直徑方向離開。另外,於載具環5進入既定位置後,藉由缸體36使支撐臂34朝a箭頭所示相反方向繞樞軸33轉動。然後,當上側之靜壓載具導引件6a之靜壓面 22與載具環5的外周面12達到既定間隙時,止動器49抵接於抵接部48,從而限制支撐臂34之轉動。 When the carrier mechanism 7 is disassembled, the support arm 34 is swung around the pivot 33 in the direction indicated by the arrow a in FIG. 3 by the cylinder 36 as shown by the broken line in FIG. 3, so that the upper two are static. The ballast guide 6a is separated from the diameter of the carrier ring 5. Further, after the carrier ring 5 enters the predetermined position, the support arm 34 is rotated about the pivot 33 in the opposite direction indicated by the arrow a by the cylinder 36. Then, when the static pressure surface of the upper static pressure carrier guide 6a When the outer peripheral surface 12 of the carrier ring 5 reaches a predetermined gap, the stopper 49 abuts against the abutting portion 48, thereby restricting the rotation of the support arm 34.

如此,藉由缸體36驅動支撐臂34而使上側之靜壓載具導引件6a移動,使得配置於載具環5之直徑方向兩側的一對靜壓載具導引件6a,6b間的間隔發生變化,所以,可容易進行載具環5之進出,並可容易達成自動化。 Thus, the upper side static-pressure carrier guide 6a is moved by the cylinder 36 driving the support arm 34, so that a pair of static-pressure carrier guides 6a, 6b disposed on both sides in the diameter direction of the carrier ring 5 are provided. The interval between the two changes, so that the entry and exit of the carrier ring 5 can be easily performed, and automation can be easily achieved.

另外,藉由調整止動機構47之螺旋式止動器49所抵接於抵接部48之位置,可任意地調整各靜壓載具導引件6a,6b之靜壓面22與載具環5的外周面12的間隙。亦即,藉由調整止動器49,止動器49所抵接於抵接部48時之支撐臂34的位置變化,使得載具環5直徑方向兩側之靜壓載具導引件6a的靜壓面22間之間隔變化。另外,於自載具環5之直徑方向兩側的靜壓載具導引件6a,6b朝載具環5之外周供給靜壓流體時,載具環5位於兩靜壓載具導引件6a,6b間之大致中央,載具環5之外周面12與兩側之靜壓載具導引件6a的靜壓面22間之間隔大致一致。藉此,可根據載具環5之直徑方向兩側之靜壓載具導引件6a,6b的靜壓面22間之間隔,調整各靜壓載具導引件6a,6b之靜壓面22與載具環5的外周面12間之間隔。 Further, by adjusting the position at which the screw stopper 49 of the stopper mechanism 47 abuts against the abutting portion 48, the static pressure surface 22 of each of the hydrostatic carrier guides 6a, 6b and the carrier can be arbitrarily adjusted. The gap of the outer peripheral surface 12 of the ring 5. That is, by adjusting the stopper 49, the position of the support arm 34 when the stopper 49 abuts against the abutment portion 48 is changed, so that the static pressure carrier guide 6a on both sides in the diameter direction of the carrier ring 5 The interval between the static pressure faces 22 varies. Further, when the hydrostatic carrier guides 6a, 6b on both sides in the diametrical direction of the carrier ring 5 supply static fluid to the outer periphery of the carrier ring 5, the carrier ring 5 is located at the two static pressure carrier guides. The center of the outer peripheral surface 12 of the carrier ring 5 and the static pressure surface 22 of the hydrostatic carrier guide 6a on both sides substantially coincide with each other between the centers 6a and 6b. Thereby, the static pressure surfaces of the static-pressure carrier guides 6a, 6b can be adjusted according to the interval between the static pressure surfaces 22 of the static-pressure carrier guides 6a, 6b on both sides in the diameter direction of the carrier ring 5. 22 is spaced from the outer peripheral surface 12 of the carrier ring 5.

各靜壓載具導引件6a,6b係可變更為固定狀態及浮動狀態,藉由依需要改變程序,可適宜地區別使用。例如,於載具環5之真圓度高且可確實地靜壓支撐載具環5之情況下,可將各靜壓載具導引件6a,6b設為固定狀態,另外,於載具環5之真圓度低的情況下,可將各靜 壓載具導引件6a,6b設為浮動狀態。另外,亦可將下側之2個靜壓載具導引件6b固定,將上側之2個靜壓載具導引件6a設為浮動狀態。 Each of the hydrostatic carrier guides 6a, 6b can be changed to a more fixed state and a floating state, and can be appropriately distinguished by changing the program as needed. For example, in the case where the true roundness of the carrier ring 5 is high and the support carrier ring 5 can be statically supported, the static-pressure carrier guides 6a, 6b can be set to a fixed state, and the carrier can be fixed. When the true roundness of the ring 5 is low, each can be quiet. The ballast guides 6a, 6b are set to be in a floating state. Further, the two static-pressure carrier guides 6b on the lower side may be fixed, and the two static-pressure carrier guides 6a on the upper side may be in a floating state.

第3、第6圖顯示固定各靜壓載具導引件6a,6b之狀態。於將上側之靜壓載具導引件6a固定的情況下,如第3、第5、第6、第10圖所示,將靜壓載具導引件6a之固定銷39插入固定支架38的銷孔38b,並以固定螺栓40將固定支架38樞接於支撐臂34上。於此狀態下,當於長孔38a之範圍內使固定支架38繞固定螺栓40轉動時,則靜壓載具導引件6a繞浮動軸15a轉動,於浮動軸15a之兩側,靜壓載具導引件6a之靜壓面22與載具環5的外周面12之間隙變化,所以,於浮動軸15a之兩側,只要於此間隙大致均等的位置旋緊固定調整螺栓41即可。 The third and sixth figures show the state in which the hydrostatic carrier guides 6a, 6b are fixed. When the upper static-pressure carrier guide 6a is fixed, as shown in the third, fifth, sixth, and tenth views, the fixing pin 39 of the static-pressure carrier guide 6a is inserted into the fixing bracket 38. The pin hole 38b is pivotally connected to the support arm 34 by a fixing bolt 40. In this state, when the fixing bracket 38 is rotated around the fixing bolt 40 within the range of the long hole 38a, the static pressure carrier guiding member 6a is rotated about the floating shaft 15a, and on both sides of the floating shaft 15a, static ballast Since the gap between the static pressure surface 22 having the guide member 6a and the outer circumferential surface 12 of the carrier ring 5 is changed, the adjustment bolts 41 may be screwed to the both sides of the floating shaft 15a so as to be substantially equal to the gap.

又,靜壓載具導引件6a之固定時的調整量,通常在與銷孔21之限制銷42的間隙之範圍內,所以,限制銷42只要維持插通於銷孔21之狀態即可。另外,靜壓載具導引件6a之靜壓面22與載具環5的外周面12之間隙的大小,可藉由止動機構47適宜地調整。 Further, since the amount of adjustment of the static-pressure carrier guide 6a at the time of fixing is generally within the range of the gap with the regulating pin 42 of the pin hole 21, the regulating pin 42 can be maintained in the state of being inserted into the pin hole 21. . Further, the size of the gap between the static pressure surface 22 of the static pressure carrier guide 6a and the outer circumferential surface 12 of the carrier ring 5 can be appropriately adjusted by the stopper mechanism 47.

於將下側之靜壓載具導引件6b固定的情況下,如第5、第10圖所示,將卡合銷55插入靜壓載具導引件6b與固定支架50的固定孔53內,於浮動軸15b之兩側,以靜壓載具導引件6b之靜壓面22與載具環5的外周面12之間隙大致均等的方式,繞浮動軸15b調整固定支架50的角度後,栓緊緊固螺栓57而將固定支架50固定於 浮動軸15b上。藉此,下側之靜壓載具導引件6b成為固定狀態。 When the lower static pressure carrier guide 6b is fixed, as shown in FIGS. 5 and 10, the engagement pin 55 is inserted into the static pressure carrier guide 6b and the fixing hole 53 of the fixing bracket 50. The angle of the fixing bracket 50 is adjusted around the floating shaft 15b on the two sides of the floating shaft 15b so that the gap between the static pressure surface 22 of the static pressure carrier guide 6b and the outer circumferential surface 12 of the carrier ring 5 is substantially equal. After that, the fastening bolt 57 is tightened to fix the fixing bracket 50 to Floating shaft 15b. Thereby, the lower static pressure carrier guide 6b is in a fixed state.

如此,即使於固定各靜壓載具導引件6a,6b之情況下,因於各靜壓載具導引件6a,6b之靜壓面22具有2個靜壓穴23,且自此各靜壓穴23朝載具環5的外周面12供給靜壓流體,所以,可透過靜壓流體靜壓支撐載具環5。另外,因各靜壓載具導引件6a,6b為固定狀態,所以,可防止載具環5之鬆動,確實地靜壓支撐載具環5。 Thus, even in the case where the hydrostatic carrier guides 6a, 6b are fixed, the static pressure faces 22 of the hydrostatic carrier guides 6a, 6b have two static pressure holes 23, and since then The static pressure hole 23 supplies the static pressure fluid to the outer peripheral surface 12 of the carrier ring 5, so that the carrier ring 5 can be supported by static pressure hydrostatic pressure. Further, since the hydrostatic carrier guides 6a, 6b are in a fixed state, it is possible to prevent the carrier ring 5 from being loosened and to reliably press the support carrier ring 5.

於將上側靜壓載具導引件6a設為浮動狀態之情況下,只要拆下固定支架38,靜壓載具導引件6a之固定銷39即從固定支架38的銷孔38b脫離,所以,可解除固定機構16a對靜壓載具導引件6a之固定。藉此,可在限制銷42與銷孔21之間隙的範圍內,使靜壓載具導引件6a繞浮動軸15a浮動。 When the upper static-pressure carrier guide 6a is in the floating state, the fixing pin 39 of the static-pressure carrier guide 6a is detached from the pin hole 38b of the fixing bracket 38 as long as the fixing bracket 38 is removed. The fixing of the static pressure carrier guide 6a by the fixing mechanism 16a can be released. Thereby, the hydrostatic carrier guide 6a can be floated around the floating shaft 15a within the range of the gap between the pin 42 and the pin hole 21.

另外,於將下側之靜壓載具導引件6b設為浮動狀態之情況下,如第11圖所示,使固定支架50翻轉,於限制機構17b之範圍內可浮動地裝設靜壓載具導引件6b。首先,最初將靜壓載具導引件6b自浮動軸15b拆下,使固定支架50表裏翻轉後裝設於浮動軸15b上。接著,將靜壓載具導引件6b嵌套於浮動軸15b,使卡合銷55卡合於固定支架50之浮動凹部54內。 Further, when the lower static-pressure carrier guide 6b is in a floating state, as shown in Fig. 11, the fixing bracket 50 is turned over, and the static pressure is floatably installed within the range of the restriction mechanism 17b. Carrier guide 6b. First, the static pressure carrier guide 6b is initially detached from the floating shaft 15b, and the fixed bracket 50 is turned over and attached to the floating shaft 15b. Next, the static pressure carrier guide 6b is nested in the floating shaft 15b, and the engagement pin 55 is engaged in the floating recess 54 of the fixing bracket 50.

然後,於浮動軸15b之兩側,以靜壓載具導引件6b之靜壓面22與載具環5的外周面12之間隙大致均等的方式,繞浮動軸15b調整固定支架50且利用緊固螺栓57固定。藉此,可於卡合銷55與浮動凹部54之間隙的範圍內,使靜壓載具導引件6b繞浮動軸15b浮動。 Then, on both sides of the floating shaft 15b, the fixing bracket 50 is adjusted around the floating shaft 15b so that the gap between the static pressure surface 22 of the static pressure carrier guide 6b and the outer circumferential surface 12 of the carrier ring 5 is substantially equal. The fastening bolt 57 is fixed. Thereby, the static-pressure carrier guide 6b can be floated around the floating shaft 15b within the range of the gap between the engaging pin 55 and the floating recess 54.

如此,於可浮動地設置各靜壓載具導引件6a,6b之後,當自各靜壓載具導引件6a,6b之靜壓穴23朝載具環5的外周面12供給靜壓流體時,可透過此靜壓流體靜壓支撐載具環5。另外,於浮動軸15a,15b之兩側,於靜壓載具導引件6a,6b之靜壓面22與載具環5的外周面12之間隙產生有差異時,以浮動軸15a,15b之兩側的間隙大致一致之方式,使靜壓載具導引件6a,6b繞浮動軸15a,15b浮動。因此,可預先防止靜壓載具導引件6a,6b與載具環5的接觸。又,因為具有限制靜壓載具導引件6a,6b之浮動範圍的限制機構17a,17b,所以,可防止靜壓載具導引件6a,6b之繞浮動軸15a,15b的不穩定之擺動等。 Thus, after the hydrostatic carrier guides 6a, 6b are floatably disposed, the hydrostatic fluid is supplied from the static pressure holes 23 of the hydrostatic carrier guides 6a, 6b toward the outer peripheral surface 12 of the carrier ring 5. The carrier ring 5 can be supported by this hydrostatic hydrostatic pressure. Further, on both sides of the floating shafts 15a, 15b, when there is a difference between the static pressure surface 22 of the static-pressure carrier guides 6a, 6b and the outer peripheral surface 12 of the carrier ring 5, the floating shafts 15a, 15b The static pressure carrier guides 6a, 6b float around the floating shafts 15a, 15b in such a manner that the gaps on both sides are substantially uniform. Therefore, the contact of the hydrostatic carrier guides 6a, 6b with the carrier ring 5 can be prevented in advance. Further, since the restriction mechanisms 17a, 17b for restricting the floating range of the static-pressure carrier guides 6a, 6b are provided, the instability of the static-pressure carrier guides 6a, 6b around the floating shafts 15a, 15b can be prevented. Swing and so on.

除了可將各靜壓載具導引件6a,6b全部設為固定狀態或浮動狀態而予使用以外,還可例如將下側之2個靜壓載具導引件6b固定,使裝設於支撐臂34上之上側的2個靜壓載具導引件6a繞浮動軸15a,15b浮動而予使用。於此情況下,可一面容易地進行載具環5的拆裝作業,一面減小靜壓載具導引件6a,6b之靜壓面22與載具環5的外周面12之間隙,從而可穩定地靜壓支撐載具環5。 In addition to the fact that all of the static-pressure carrier guides 6a, 6b can be used in a fixed state or a floating state, for example, the two static-pressure carrier guides 6b on the lower side can be fixed and mounted on The two hydrostatic carrier guides 6a on the upper side of the support arm 34 are floated around the floating shafts 15a, 15b for use. In this case, the gap between the static pressure surface 22 of the static-pressure carrier guides 6a and 6b and the outer circumferential surface 12 of the carrier ring 5 can be reduced while the carrier ring 5 can be easily attached and detached. The support carrier ring 5 can be stably hydrostatically supported.

亦即,於將上側之靜壓載具導引件6a裝設於繞樞軸33轉動的支撐臂34上的情況下,若將此靜壓載具導引件6a固定於支撐臂34上的話,因誤差之累積等恐有靜壓載具導引件6a與載具環5接觸之虞,使得減小靜壓載具導引件6a,6b與載具環5之間隙變得困難。但是,藉 由可浮動地將靜壓載具導引件6a裝設於支撐臂43上,可一面減小靜壓載具導引件6a,6b之靜壓面22與載具環5的外周面12之間隙,一面藉由上側之靜壓載具導引件6a的浮動來防止與載具環5的接觸。 That is, in the case where the upper static-pressure carrier guide 6a is mounted on the support arm 34 that rotates about the pivot 33, if the static-pressure carrier guide 6a is fixed to the support arm 34, The accumulation of the error or the like may cause the static pressure carrier guide 6a to contact the carrier ring 5, making it difficult to reduce the gap between the static pressure carrier guides 6a, 6b and the carrier ring 5. But borrow By mounting the hydrostatic carrier guide 6a on the support arm 43 in a floating manner, the static pressure surface 22 of the static pressure carrier guides 6a, 6b and the outer peripheral surface 12 of the carrier ring 5 can be reduced. The gap is prevented from coming into contact with the carrier ring 5 by the floating of the upper static pressure carrier guide 6a.

順便一提,於使用陶瓷製之載具環5,針對本發明之非接觸支撐方式與先前技術之支撐輥的接觸支撐方式進行驗證的結果,於本發明之非接觸支撐方式中,與先前技術之接觸支撐方式比較,可將載具環5之外周振動抑制為1/5程度。第12圖顯示載具環5之真圓度的測量結果。第13圖顯示先前技術之接觸支撐方式的情況,第14圖顯示本發明之非接觸支撐方式的情況下的各載具環5之外周振動的測量結果。 By the way, in the case of using the ceramic carrier ring 5, the result of verifying the contact support mode of the present invention and the contact support method of the prior art support roller, in the non-contact support mode of the present invention, and the prior art In comparison with the contact support method, the peripheral vibration of the carrier ring 5 can be suppressed to about 1/5. Fig. 12 shows the measurement results of the roundness of the carrier ring 5. Fig. 13 shows the case of the contact support method of the prior art, and Fig. 14 shows the measurement results of the peripheral vibration of each of the carrier rings 5 in the case of the non-contact support mode of the present invention.

如第12圖所示,載具環5係使用外周真圓度約為5μm(實測值為4.5μm)之陶瓷製,並對先前技術之接觸支撐方式及本發明之非接觸支撐方式的各方式中之載具環5之外周振動進行了測量。於先前技術之接觸支撐方式的情況下,如第13圖所示,外周振動之測量值約為15μm,當自此數值減去載具環5之外周真圓度(約為5μm)時,外周振動約為10μm。相對於此,如第14圖所示,非接觸支撐方式之情況下的振動之測量值約為7μm,當自此數值減去載具環5之外周真圓度(約為5μm)時,外周振動約為2μm。 As shown in Fig. 12, the carrier ring 5 is made of ceramic having a peripheral roundness of about 5 μm (measured value of 4.5 μm), and various methods of the prior art contact support method and the non-contact support method of the present invention. The outer peripheral vibration of the carrier ring 5 was measured. In the case of the prior art contact support mode, as shown in Fig. 13, the measured value of the peripheral vibration is about 15 μm, and when the roundness of the circumference of the carrier ring 5 is subtracted from this value (about 5 μm), the outer circumference The vibration is about 10 μm. On the other hand, as shown in Fig. 14, the measured value of the vibration in the case of the non-contact support mode is about 7 μm, and when the roundness of the circumference of the carrier ring 5 is subtracted from this value (about 5 μm), the outer circumference The vibration is about 2 μm.

經上述驗證可知,於本發明之非接觸支撐方式中,與先前技術之接觸支撐方式比較,可將載具環5之外周振動抑制為1/5程度。因此,載具環5之旋轉精度,透 過載具4直接傳遞至連接於其內周的工件W,且作用於研磨周期中由一對研磨砂輪4挾入而固定之工件W的研磨點,而立即對工件W之研磨產生影響,但藉由採用本發明之非接觸支撐方式,可減小載具環5之外周振動的影響,可獲得工件W之穩定的研磨精度。 As a result of the above verification, in the non-contact support method of the present invention, the peripheral vibration of the carrier ring 5 can be suppressed to about 1/5 as compared with the contact support method of the prior art. Therefore, the rotation accuracy of the carrier ring 5 is transparent. The overloading tool 4 is directly transmitted to the workpiece W connected to the inner circumference thereof, and acts on the grinding point of the workpiece W which is fixed by the pair of grinding wheels 4 during the grinding cycle, and immediately affects the grinding of the workpiece W, but borrows By adopting the non-contact support method of the present invention, the influence of the vibration of the outer circumference of the carrier ring 5 can be reduced, and the stable polishing precision of the workpiece W can be obtained.

以上,針對本發明之實施形態詳細地進行了說明,但本發明不受此實施形態所限制,只要在未超出本發明之實質範圍內,即可作各種之變更。例如,於實施形態中,可將各靜壓載具導引件6a,6b變更為固定狀態與浮動狀態,但亦可將所有之靜壓載具導引件6a,6b設為固定式或浮動式,亦可將下側之複數個靜壓載具導引件6b設為固定式,將上側之複數個靜壓載具導引件6a設為浮動式。 The embodiments of the present invention have been described in detail above, but the present invention is not limited thereto, and various modifications can be made without departing from the spirit and scope of the invention. For example, in the embodiment, each of the static-pressure carrier guides 6a, 6b may be changed to a fixed state and a floating state, but all of the static-pressure carrier guides 6a, 6b may be fixed or floating. Alternatively, the plurality of static-pressure carrier guides 6b on the lower side may be fixed, and the plurality of static-pressure carrier guides 6a on the upper side may be in a floating type.

以靜壓載具導引件6a,6b係大致等分配置於載具環5之外周較為適宜,但只要能藉由複數個靜壓載具導引件6a,6b靜壓支撐載具環5,並不需要大致等分配置。另外,於大致等分地配置靜壓載具導引件6a,6b之情況下,靜壓載具導引件6a,6b只要為3個以上即可。另外,於靜壓載具導引件6a,6b為3個之情況下,例如,於下側配置2個靜壓載具導引件6b,並將上側之1個靜壓載具導引件6a可移動地設於載具環5之直徑方向。 It is preferable that the static pressure carrier guides 6a, 6b are substantially equally distributed on the outer circumference of the carrier ring 5, but the carrier ring 5 can be statically supported by a plurality of static pressure carrier guides 6a, 6b. It does not need to be roughly halved. In addition, when the static pressure carrier guides 6a and 6b are arranged substantially equally, the static pressure carrier guides 6a and 6b may be three or more. Further, in the case where there are three static-pressure carrier guides 6a, 6b, for example, two static-pressure carrier guides 6b are disposed on the lower side, and one static-pressure carrier guide on the upper side is provided. 6a is movably disposed in the diameter direction of the carrier ring 5.

於靜壓載具導引件6a,6b的靜壓面22沿旋轉方向相對於浮動軸15a,15b大致對稱地設置靜壓穴23之情況下,可像實施形態所例示那樣於旋轉方向分半進行配置,亦可於旋轉方向連續狀地設置1個較長的靜壓穴 23。驅動支撐臂34之驅動機構19,除可為缸體36外,亦可藉由馬達構成,藉由馬達透過螺桿或齒輪來驅動支撐臂34。 When the static pressure surface 22 of the static pressure carrier guides 6a, 6b is provided with the static pressure holes 23 substantially symmetrically with respect to the floating shafts 15a, 15b in the rotational direction, it may be divided into half in the rotational direction as exemplified in the embodiment. For configuration, it is also possible to continuously set a long static pressure point in the direction of rotation. twenty three. The drive mechanism 19 for driving the support arm 34, in addition to the cylinder 36, may be constituted by a motor, and the support arm 34 is driven by a motor through a screw or a gear.

於使靜壓載具導引件6a,6b朝遠離或接近載具環5之方向移動的情況下,亦可於活動台8設置載具環5之大致直徑方向的導引機構,沿此導引機構可移動自如地設置靜壓載具導引件6a,6b。另外,於實施形態中,係設為將使支撐臂34停止於既定位置之止動機構47及調整靜壓載具導引件6a,6b之靜壓面22與載具環5之外周面12的間隙之間隙調整機構兼並使用,但兩者亦可分開設置。 In the case where the hydrostatic carrier guides 6a, 6b are moved away from or in the direction of the carrier ring 5, a guide mechanism of the carrier ring 5 in the substantially diametric direction may be provided on the movable table 8, along which The guiding mechanism is movably provided with the static pressure carrier guides 6a, 6b. Further, in the embodiment, the stopper mechanism 47 for stopping the support arm 34 at a predetermined position and the static pressure surface 22 of the static pressure carrier guides 6a, 6b and the outer circumferential surface 12 of the carrier ring 5 are provided. The gap adjustment mechanism of the gap is used in combination, but the two can also be separately provided.

可將所有之靜壓載具導引件6a,6b經由同一回路27連接於靜壓流體之供給源29,亦可將各靜壓載具導引件6a,6b透過個別獨立之壓力控制電路連接於供給源29。又,於實施形態中,雖例示了臥式平面磨床,但立式亦可同樣實施。另外,只要工件W為薄板狀者,不限任何之工件。 All of the hydrostatic carrier guides 6a, 6b can be connected to the supply 29 of hydrostatic fluid via the same circuit 27, or the hydrostatic carrier guides 6a, 6b can be connected via separate independent pressure control circuits. At the supply source 29. Further, in the embodiment, the horizontal surface grinder is exemplified, but the vertical type may be similarly implemented. Further, as long as the workpiece W is a thin plate, it is not limited to any workpiece.

W‧‧‧工件 W‧‧‧Workpiece

1‧‧‧靜壓研磨墊 1‧‧‧Static pressure polishing pad

2‧‧‧缺口部 2‧‧‧Gap section

3‧‧‧研磨砂輪 3‧‧‧ Grinding wheel

4‧‧‧載具 4‧‧‧ Vehicles

5‧‧‧載具環 5‧‧‧Carriage ring

6a,6b‧‧‧靜壓載具導引件 6a, 6b‧‧‧Static press carrier guides

7‧‧‧載具機構 7‧‧‧Carriage

8‧‧‧活動台 8‧‧‧ activity table

9‧‧‧裝設孔 9‧‧‧Installation hole

10‧‧‧壓環 10‧‧‧ Pressure ring

11‧‧‧台階 11 ‧ ‧ steps

12‧‧‧外周面 12‧‧‧ outer perimeter

13‧‧‧環形齒輪 13‧‧‧ring gear

14‧‧‧驅動齒輪 14‧‧‧ drive gear

15a,15b‧‧‧浮動軸 15a, 15b‧‧‧ floating shaft

16a,16b‧‧‧固定機構 16a, 16b‧‧‧fixed institutions

17a,17b‧‧‧限制機構 17a, 17b‧‧‧Restricted institutions

19‧‧‧驅動機構 19‧‧‧ drive mechanism

20‧‧‧軸孔 20‧‧‧Axis hole

21‧‧‧銷孔 21‧‧‧ pinhole

22‧‧‧靜壓面 22‧‧‧Static pressure surface

23‧‧‧靜壓穴 23‧‧‧ Static pressure points

24‧‧‧逃逸槽 24‧‧‧ escape trough

25‧‧‧連通孔 25‧‧‧Connected holes

26‧‧‧可撓性軟管 26‧‧‧Flexible hose

27‧‧‧回路 27‧‧‧ Circuit

29‧‧‧供給源 29‧‧‧Supply source

30‧‧‧壓力調整閥 30‧‧‧Pressure adjustment valve

31‧‧‧流量計 31‧‧‧ Flowmeter

33‧‧‧樞軸 33‧‧‧ pivot

34‧‧‧支撐臂 34‧‧‧Support arm

35‧‧‧收容部 35‧‧‧ Housing Department

35a‧‧‧側壁 35a‧‧‧ side wall

36‧‧‧缸體 36‧‧‧Cylinder block

38‧‧‧固定支架 38‧‧‧Fixed bracket

38a‧‧‧長孔 38a‧‧‧Long hole

38b‧‧‧銷孔 38b‧‧‧ pinhole

39‧‧‧固定銷 39‧‧‧fixed pin

40‧‧‧固定螺栓 40‧‧‧ fixing bolts

41‧‧‧調整螺栓 41‧‧‧Adjustment bolts

42‧‧‧限制銷 42‧‧‧Restriction pin

44‧‧‧連結銷 44‧‧‧Links

45‧‧‧樞支銷 45‧‧‧ pivot

47‧‧‧止動機構(間隙調整機構) 47‧‧‧stop mechanism (gap adjustment mechanism)

48‧‧‧抵接部 48‧‧‧Apartment

49‧‧‧止動器 49‧‧‧stops

50‧‧‧固定支架 50‧‧‧Fixed bracket

53‧‧‧固定孔 53‧‧‧Fixed holes

54‧‧‧浮動凹部 54‧‧‧Floating recess

55‧‧‧卡合銷 55‧‧‧ card sales

56‧‧‧把持部 56‧‧‧The Department of Control

57‧‧‧緊固螺栓 57‧‧‧ fastening bolts

第1圖為顯示本發明之一實施形態的臥式雙面平面磨床之概略側視圖。 Fig. 1 is a schematic side view showing a horizontal double-sided surface grinder according to an embodiment of the present invention.

第2圖為同概略剖視圖。 Fig. 2 is a schematic cross-sectional view.

第3圖為同主要部分之放大側視圖。 Figure 3 is an enlarged side view of the main part.

第4圖為同上側之靜壓載具導引件的支撐部之放大剖視圖。 Fig. 4 is an enlarged cross-sectional view showing the support portion of the hydrostatic carrier guide of the upper side.

第5圖為同靜壓載具導引件之固定狀態的剖視圖。 第6圖為沿同第3圖之X-X線所作之剖視圖。 Fig. 5 is a cross-sectional view showing a state in which the static pressure carrier guide is fixed. Fig. 6 is a cross-sectional view taken along line X-X of Fig. 3.

第7圖為同靜壓載具導引件之剖視圖。 Figure 7 is a cross-sectional view of the same static pressure carrier guide.

第8圖為同靜壓載具導引件之仰視圖。 Figure 8 is a bottom plan view of the same static pressure carrier guide.

第9圖為同靜壓載具導引件之靜壓回路圖。 Figure 9 is a static pressure circuit diagram of the same static pressure carrier guide.

第10圖為沿同第3圖之Y-Y線所作之剖視圖。 Fig. 10 is a cross-sectional view taken along line Y-Y of Fig. 3.

第11圖為同靜壓載具導引件之浮動狀態的剖視圖。 Figure 11 is a cross-sectional view showing the floating state of the same static pressure carrier guide.

第12圖為載具環之真圓度的測量結果之示意圖。 Figure 12 is a schematic diagram showing the measurement results of the roundness of the carrier ring.

第13圖為以先前技術之接觸支撐方式所支撐的載具環之外周振動的測量結果之示意圖。 Figure 13 is a schematic illustration of the measurement results of the peripheral vibration of the carrier ring supported by the prior art contact support.

第14圖為以本發明之非接觸支撐方式所支撐的載具環之外周振動的測量結果之示意圖。 Fig. 14 is a view showing the measurement results of the vibration of the outer circumference of the carrier ring supported by the non-contact support method of the present invention.

W‧‧‧工件 W‧‧‧Workpiece

2‧‧‧缺口部 2‧‧‧Gap section

3‧‧‧研磨砂輪 3‧‧‧ Grinding wheel

4‧‧‧載具 4‧‧‧ Vehicles

5‧‧‧載具環 5‧‧‧Carriage ring

6a,6b‧‧‧靜壓載具導引件 6a, 6b‧‧‧Static press carrier guides

7‧‧‧載具機構 7‧‧‧Carriage

9‧‧‧裝設孔 9‧‧‧Installation hole

10‧‧‧壓環 10‧‧‧ Pressure ring

12‧‧‧外周面 12‧‧‧ outer perimeter

14‧‧‧驅動齒輪 14‧‧‧ drive gear

15a,15b‧‧‧浮動軸 15a, 15b‧‧‧ floating shaft

16a,16b‧‧‧固定機構 16a, 16b‧‧‧fixed institutions

17a‧‧‧限制機構 17a‧‧‧Restricted institutions

19‧‧‧驅動機構 19‧‧‧ drive mechanism

21‧‧‧銷孔 21‧‧‧ pinhole

22‧‧‧靜壓面 22‧‧‧Static pressure surface

23‧‧‧靜壓穴 23‧‧‧ Static pressure points

24‧‧‧逃逸槽 24‧‧‧ escape trough

33‧‧‧樞軸 33‧‧‧ pivot

34‧‧‧支撐臂 34‧‧‧Support arm

35‧‧‧收容部 35‧‧‧ Housing Department

35a‧‧‧側壁 35a‧‧‧ side wall

36‧‧‧缸體 36‧‧‧Cylinder block

38‧‧‧固定支架 38‧‧‧Fixed bracket

38a‧‧‧長孔 38a‧‧‧Long hole

38b‧‧‧銷孔 38b‧‧‧ pinhole

39‧‧‧固定銷 39‧‧‧fixed pin

40‧‧‧固定螺栓 40‧‧‧ fixing bolts

41‧‧‧調整螺栓 41‧‧‧Adjustment bolts

42‧‧‧限制銷 42‧‧‧Restriction pin

44‧‧‧連結銷 44‧‧‧Links

45‧‧‧樞支銷 45‧‧‧ pivot

47‧‧‧止動機構(間隙調 整機構) 47‧‧‧stop mechanism (gap adjustment) Entire institution)

48‧‧‧抵接部 48‧‧‧Apartment

49‧‧‧止動器 49‧‧‧stops

50‧‧‧固定支架 50‧‧‧Fixed bracket

53‧‧‧固定孔 53‧‧‧Fixed holes

54‧‧‧浮動凹部 54‧‧‧Floating recess

55‧‧‧卡合銷 55‧‧‧ card sales

56‧‧‧把持部 56‧‧‧The Department of Control

57‧‧‧緊固螺栓 57‧‧‧ fastening bolts

Claims (9)

一種薄板狀工件之研磨方法,其特徵為:於藉由一對靜壓研磨墊以非接觸方式靜壓支撐被裝設於載具之薄板狀工件,一面透過該載具使該工件旋轉,一面藉由一對研磨砂輪對該工件之兩面進行研磨時,藉由複數個靜壓載具導引件於圓周方向以非接觸方式靜壓支撐該載具之外周的載具環。 A method for polishing a thin plate-shaped workpiece, wherein a workpiece is mounted on a thin plate-shaped workpiece mounted on a carrier by a pair of static pressure polishing pads in a non-contact manner, and the workpiece is rotated by the carrier. When both sides of the workpiece are ground by a pair of grinding wheels, the carrier rings of the outer periphery of the carrier are statically supported in a non-contact manner by a plurality of hydrostatic carrier guides in a circumferential direction. 一種雙面平面磨床,係藉由一對靜壓研磨墊以非接觸方式靜壓支撐被裝設於載具之薄板狀工件,一面透過該載具使該工件旋轉,一面藉由一對研磨砂輪對該工件之兩面進行研磨,該雙面平面磨床之特徵為:於圓周方向具有複數個以非接觸方式靜壓支撐該載具之外周的載具環之靜壓載具導引件。 A double-sided surface grinder is a non-contact static pressure supporting a thin plate-shaped workpiece mounted on a carrier by a pair of static pressure polishing pads, and rotating the workpiece through the carrier while rotating a pair of grinding wheels The two sides of the workpiece are ground. The double-sided surface grinder is characterized by a plurality of hydrostatic carrier guides in the circumferential direction that statically support the carrier ring of the outer periphery of the carrier in a non-contact manner. 如申請專利範圍第2項之雙面平面磨床,其中該載具環具有圓筒面狀之外周面,且使該各靜壓載具導引件接近該外周面地大致等分地作配置。 A double-sided surface grinder according to claim 2, wherein the carrier ring has a cylindrical outer peripheral surface, and the hydrostatic carrier guides are arranged substantially equally in proximity to the outer peripheral surface. 如申請專利範圍第2或3項之雙面平面磨床,其中該靜壓載具導引件係固定。 A double-sided surface grinder as claimed in claim 2, wherein the hydrostatic carrier guide is fixed. 如申請專利範圍第2或3項之雙面平面磨床,其中該靜壓載具導引件係可浮動。 A double-sided surface grinder as claimed in claim 2, wherein the hydrostatic carrier guide is floatable. 如申請專利範圍第2至5項中任一項之雙面平面磨床,其中藉由與該載具環之旋轉中心大致平行的浮動軸樞支各該靜壓載具導引件,各該靜壓載具導引件上具備靜壓穴,其在該載具環之旋轉方向上相對於該浮動軸呈大致對稱,用以朝與該載具環之外周面之間供給靜壓流體。 The double-sided surface grinder of any one of claims 2 to 5, wherein each of the static pressure carrier guides is pivotally supported by a floating shaft substantially parallel to a center of rotation of the carrier ring, each of the static The ballast guide has a static pressure hole that is substantially symmetrical with respect to the floating shaft in the direction of rotation of the carrier ring for supplying static pressure fluid to the outer circumferential surface of the carrier ring. 如申請專利範圍第2至6項中任一項之雙面平面磨床,其中具備:支撐臂,其藉由與該載具環之旋轉中心大致平行的樞軸樞支成可擺動自如,且將至少一部分之該靜壓載具環支撐成可朝遠離或接近該載具環之方向移動;驅動機構,其使該支撐臂繞該樞軸轉動;及止動機構,其使該支撐臂停止於既定位置。 A double-sided surface grinder according to any one of claims 2 to 6, wherein: a support arm pivotally supported by a pivot substantially parallel to a center of rotation of the carrier ring, and At least a portion of the hydrostatic carrier ring is supported for movement away from or proximate to the carrier ring; a drive mechanism that rotates the support arm about the pivot; and a stop mechanism that stops the support arm The established location. 如申請專利範圍第2至7項中任一項之雙面平面磨床,其中該靜壓載具導引件係可變更為固定狀態及繞與該載具環之旋轉中心大致平行的浮動軸浮動之浮動狀態。 A double-sided surface grinder as claimed in any one of claims 2 to 7, wherein the hydrostatic carrier guide is variable in a more fixed state and floats around a floating axis substantially parallel to the center of rotation of the carrier ring. Floating state. 如申請專利範圍第2至8項中任一項之雙面平面磨床,其中具備在該載具環之外周大致等分地配置的3個以上之該靜壓載具導引件,且具備間隙調整機構,其在該載具環之大致直徑方向對該3個以上之靜壓載具導引件中至少一個該靜壓載具導引件的位置進行調整,從而調整該3個以上之靜壓載具導引件的靜壓面與該載具環之外周面的間隙。 The double-sided surface grinder according to any one of claims 2 to 8, further comprising three or more of the static-pressure carrier guides arranged substantially equally on the outer circumference of the carrier ring, and having a gap An adjustment mechanism that adjusts a position of at least one of the three or more static pressure carrier guides in the substantially diametrical direction of the carrier ring to adjust the three or more static positions a gap between the static pressure surface of the ball carrier guide and the outer circumferential surface of the carrier ring.
TW101124333A 2011-07-08 2012-07-06 Method for grinding thin sheet-like workpiece and double-end surface grinder TWI604918B (en)

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