TW201304617A - 電漿處理裝置及電漿產生用天線 - Google Patents

電漿處理裝置及電漿產生用天線 Download PDF

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Publication number
TW201304617A
TW201304617A TW101111240A TW101111240A TW201304617A TW 201304617 A TW201304617 A TW 201304617A TW 101111240 A TW101111240 A TW 101111240A TW 101111240 A TW101111240 A TW 101111240A TW 201304617 A TW201304617 A TW 201304617A
Authority
TW
Taiwan
Prior art keywords
plasma
processing apparatus
shower head
plasma processing
gas
Prior art date
Application number
TW101111240A
Other languages
English (en)
Chinese (zh)
Inventor
Taro Ikeda
Tomohito Komatsu
Shigeru Kasai
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW201304617A publication Critical patent/TW201304617A/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
TW101111240A 2011-03-31 2012-03-30 電漿處理裝置及電漿產生用天線 TW201304617A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011078029 2011-03-31
JP2012072759A JP2012216525A (ja) 2011-03-31 2012-03-28 プラズマ処理装置及びプラズマ発生用アンテナ

Publications (1)

Publication Number Publication Date
TW201304617A true TW201304617A (zh) 2013-01-16

Family

ID=47269094

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101111240A TW201304617A (zh) 2011-03-31 2012-03-30 電漿處理裝置及電漿產生用天線

Country Status (3)

Country Link
JP (1) JP2012216525A (enExample)
KR (1) KR20120112261A (enExample)
TW (1) TW201304617A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI584342B (zh) * 2015-01-22 2017-05-21 Screen Holdings Co Ltd Plasma processing device
TWI643236B (zh) * 2013-09-11 2018-12-01 日商東京威力科創股份有限公司 Plasma processing device

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101485964B1 (ko) * 2013-01-16 2015-01-27 주식회사 아이브이웍스 마이크로파 플라즈마 반응기
JP6356415B2 (ja) * 2013-12-16 2018-07-11 東京エレクトロン株式会社 マイクロ波プラズマ源およびプラズマ処理装置
KR101588609B1 (ko) * 2014-06-16 2016-01-27 주식회사 윈텔 플라즈마 발생 장치
JP6671230B2 (ja) 2016-04-26 2020-03-25 東京エレクトロン株式会社 プラズマ処理装置およびガス導入機構
JP6796450B2 (ja) 2016-10-25 2020-12-09 東京エレクトロン株式会社 プラズマ処理装置
JP6283438B2 (ja) * 2017-03-28 2018-02-21 東京エレクトロン株式会社 マイクロ波放射アンテナ、マイクロ波プラズマ源およびプラズマ処理装置
JP7058485B2 (ja) * 2017-05-16 2022-04-22 東京エレクトロン株式会社 プラズマ処理装置
JP6914149B2 (ja) * 2017-09-07 2021-08-04 東京エレクトロン株式会社 プラズマ処理装置
JP7026498B2 (ja) 2017-12-12 2022-02-28 東京エレクトロン株式会社 アンテナ及びプラズマ成膜装置
CN108566717B (zh) * 2018-06-29 2024-07-02 合肥中科离子医学技术装备有限公司 采用微波垂直注入激励等离子体发生装置
TW202233887A (zh) * 2021-02-03 2022-09-01 美商Ｍｋｓ儀器公司 利用微波輻射能量對原子層沉積製程進行微波輔助表面化學退火的微波系統
JP2024106239A (ja) * 2023-01-26 2024-08-07 東京エレクトロン株式会社 分散板、ガス供給機構及び基板処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2662219B2 (ja) * 1987-04-22 1997-10-08 株式会社日立製作所 プラズマ処理装置
JP3164188B2 (ja) * 1994-06-14 2001-05-08 日本電気株式会社 プラズマ処理装置
JP5082459B2 (ja) * 2006-01-20 2012-11-28 東京エレクトロン株式会社 プラズマ処理装置及び天板の製造方法
JP5213530B2 (ja) * 2008-06-11 2013-06-19 東京エレクトロン株式会社 プラズマ処理装置
JP5309847B2 (ja) * 2008-09-30 2013-10-09 東京エレクトロン株式会社 プラズマ処理装置
JP2010244805A (ja) * 2009-04-03 2010-10-28 Tokyo Electron Ltd プラズマ処理装置
WO2010140526A1 (ja) * 2009-06-01 2010-12-09 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理装置の給電方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI643236B (zh) * 2013-09-11 2018-12-01 日商東京威力科創股份有限公司 Plasma processing device
TWI584342B (zh) * 2015-01-22 2017-05-21 Screen Holdings Co Ltd Plasma processing device

Also Published As

Publication number Publication date
KR20120112261A (ko) 2012-10-11
JP2012216525A (ja) 2012-11-08

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