TW201300196A - Grinding processing method - Google Patents

Grinding processing method Download PDF

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Publication number
TW201300196A
TW201300196A TW100122210A TW100122210A TW201300196A TW 201300196 A TW201300196 A TW 201300196A TW 100122210 A TW100122210 A TW 100122210A TW 100122210 A TW100122210 A TW 100122210A TW 201300196 A TW201300196 A TW 201300196A
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Taiwan
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grinding
workpiece
devices
processing method
polishing
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TW100122210A
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Chinese (zh)
Inventor
Fang-Jui Hsu
Chin-Ling Chen
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Hold Seiki Company Ltd
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Priority to TW100122210A priority Critical patent/TW201300196A/en
Publication of TW201300196A publication Critical patent/TW201300196A/en

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Abstract

A grinding processing method is used for a grinding processing apparatus has plural grinding devices which are rotatable. The grinding processing method includes the steps of providing a work; fixing the work to the grinding processing apparatus; and adjusting the rotation angles and/or position of the grinding devices and performing grinding processing to the different surfaces of the work by the grinding devices simultaneously. The grinding processing method of the present invention can improve the accuracy and the calibration rate of products.

Description

研磨加工方法Grinding method

本發明係關於一種研磨加工方法。The present invention relates to a method of grinding.

隨著科技的不斷進步,對應各種不同產品的製程設備也日漸地被發展出來。因此,為加工不同製程設備所需的基本工件,利用於各種研磨加工設備的研磨加工方法之重要性也逐漸地提高。With the continuous advancement of technology, process equipment for various products has been gradually developed. Therefore, the importance of the grinding processing method for various grinding processing equipment is gradually increasing for the basic workpieces required for processing different process equipment.

請參照圖1所示,一種習知之研磨加工設備1包含一固定裝置11及二研磨裝置12、13。該等研磨裝置12、13對應設置於固定裝置11的左右兩側。請同時參照圖1及圖2所示,應用研磨加工設備1的研磨加工方法包含步驟S1至步驟S3。步驟S1為提供一工件,步驟S2為將工件固定於研磨加工設備,步驟S3為藉由該等研磨裝置對工件的二不同的表面同時進行研磨加工。Referring to FIG. 1, a conventional grinding processing apparatus 1 includes a fixing device 11 and two grinding devices 12, 13. The polishing apparatuses 12 and 13 are disposed on the left and right sides of the fixing apparatus 11 correspondingly. Referring to FIG. 1 and FIG. 2 simultaneously, the polishing processing method to which the polishing processing apparatus 1 is applied includes steps S1 to S3. Step S1 is to provide a workpiece, step S2 is to fix the workpiece to the grinding processing device, and step S3 is to simultaneously grind the two different surfaces of the workpiece by the grinding devices.

因此,當一待加工之工件W設置於固定裝置11後,研磨裝置12、13的砂輪121、131會對應於工件W的左右兩側的表面P1、P2。藉此,即可利用研磨裝置12、13之砂輪121、131分別對工件W的左右兩側表面P1、P2進行研磨加工。Therefore, when the workpiece W to be processed is placed on the fixing device 11, the grinding wheels 121, 131 of the grinding devices 12, 13 correspond to the surfaces P1, P2 on the left and right sides of the workpiece W. Thereby, the left and right side surfaces P1 and P2 of the workpiece W can be polished by the grinding wheels 121 and 131 of the polishing apparatuses 12 and 13, respectively.

然而,由於研磨加工設備1設置於固定裝置11的左右兩側,因此,若工件W之上側的表面P3或其它表面亦需加工時,研磨加工設備1並無法作加工,必須改以不同的研磨設備或置換工件W的擺放方向,方能進行加工。如此,會造成加工精度的降低以及生產產能的減少等問題。However, since the lapping processing apparatus 1 is disposed on the left and right sides of the fixing device 11, if the surface P3 or other surface on the upper side of the workpiece W needs to be processed, the lapping processing apparatus 1 cannot be processed, and it is necessary to change to different grinding. The equipment can be processed by replacing the orientation of the workpiece W. As a result, problems such as reduction in processing accuracy and reduction in production capacity are caused.

因此,如何設計一種能提升研磨加工的精度及提升其產能的研磨加工方法,已成為重要課題之一。Therefore, how to design a grinding processing method that can improve the precision of grinding processing and increase its productivity has become one of the important topics.

有鑑於上述課題,本發明之目的為提供一種能提升研磨加工的精度及提升其產能之研磨加工方法。In view of the above problems, an object of the present invention is to provide a polishing processing method which can improve the precision of polishing processing and increase the productivity thereof.

為達上述目的,依據本發明之一種研磨加工方法應用於一具有複數個可旋轉之研磨裝置的研磨加工設備,研磨加工方法包含以下步驟:提供一工件;將工件固定於研磨加工設備;以及調整該等研磨裝置之旋轉角度及或位置,並藉由該等研磨裝置對工件的不同的表面同時進行研磨加工。To achieve the above object, a grinding processing method according to the present invention is applied to a grinding processing apparatus having a plurality of rotatable grinding apparatuses, the grinding processing method comprising the steps of: providing a workpiece; fixing the workpiece to the grinding processing apparatus; and adjusting The rotation angles and or positions of the polishing devices are simultaneously polished by the polishing devices on different surfaces of the workpiece.

在一實施例中,經研磨加工後,工件呈U形、V形或ㄩ形。In one embodiment, the workpiece is U-shaped, V-shaped or ㄩ-shaped after being ground.

在一實施例中,該等研磨裝置可分別延一第一軸向及/或一第二軸向移動。In one embodiment, the grinding devices are each movable in a first axial direction and/or a second axial direction.

在一實施例中,該等研磨裝置分別具有一驅動單元及一角度調整單元,該等驅動單元分別驅動該等研磨裝置於第一軸向及/或第二軸向移動,該等角度調整單元分別控制該等研磨裝置旋轉。In one embodiment, the polishing devices each have a driving unit and an angle adjusting unit, and the driving units respectively drive the grinding devices to move in the first axial direction and/or the second axial direction, and the equal angle adjusting unit The rotation of the grinding devices is controlled separately.

在一實施例中,該等研磨裝置的旋轉角度分別介於0度至180度之間。In one embodiment, the angles of rotation of the grinding devices are between 0 and 180 degrees, respectively.

在一實施例中,研磨加工進行的時間為可調整。In one embodiment, the time during which the grinding process is performed is adjustable.

在一實施例中,該等研磨裝置施加於工件的作用力為可調整。In an embodiment, the force applied by the grinding device to the workpiece is adjustable.

在一實施例中,該等研磨裝置設置於研磨加工設備之一固定裝置。In one embodiment, the grinding devices are disposed in one of the grinding apparatus.

在一實施例中,等研磨裝置分別研磨工件之對向表面。In one embodiment, the equal grinding device grinds the opposing surfaces of the workpiece, respectively.

承上所述,因依據本發明之研磨加工方法係應用於具有複數個可旋轉之研磨裝置的研磨加工設備,且該等研磨裝置分別設置於固定裝置的不同側。因此,當需對一工件的上側表面或其它表面進行研磨加工時,即可藉由該等研磨裝置調整研磨單元之旋轉角度及或位置,以從不同的位置及方向分別對工件同時進行研磨加工。藉此,不僅可提升研磨加工的精度,也可提升其生產產能。As described above, the grinding processing method according to the present invention is applied to a grinding processing apparatus having a plurality of rotatable grinding apparatuses, and the grinding apparatuses are respectively disposed on different sides of the fixing apparatus. Therefore, when the upper surface or other surface of a workpiece needs to be polished, the rotation angle and or the position of the grinding unit can be adjusted by the grinding device to simultaneously grind the workpiece from different positions and directions. . This not only improves the precision of the grinding process, but also increases its production capacity.

以下將參照相關圖式,說明依據本發明較佳實施例之一種研磨加工方法,其中相同的元件將以相同的參照符號加以說明。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a grinding processing method according to a preferred embodiment of the present invention will be described with reference to the accompanying drawings, wherein the same elements will be described with the same reference numerals.

請同時參照圖3及圖4所示,其中,圖3為本發明之一種研磨加工方法的步驟流程圖,而圖4為配合圖3的步驟流程圖之一研磨加工設備2的示意圖。本發明之研磨加工方法包含步驟M1至步驟M3。另外,研磨加工方法係應用於研磨加工設備2,而研磨加工設備2可包含一第一承載裝置21、一第二承載裝置22、一固定裝置23以及複數個研磨裝置。於此,係以二個研磨裝置24、25為例。在其它的研磨加工設備中,研磨裝置可為二個以上。3 and FIG. 4, wherein FIG. 3 is a flow chart of the steps of a grinding processing method of the present invention, and FIG. 4 is a schematic view of the grinding processing apparatus 2 in conjunction with the flow chart of FIG. The grinding processing method of the present invention comprises the steps M1 to M3. In addition, the grinding processing method is applied to the grinding processing apparatus 2, and the grinding processing apparatus 2 may include a first carrying device 21, a second carrying device 22, a fixing device 23, and a plurality of grinding devices. Here, two polishing apparatuses 24 and 25 are taken as an example. In other grinding processing equipment, the number of grinding apparatuses may be two or more.

研磨加工方法的步驟M1為提供一工件W;步驟M2為將工件W固定於研磨加工設備2;而步驟M3為調整該等研磨裝置24、25之旋轉角度及或位置,並藉由該等研磨裝置24、25對工件W的不同表面同時進行研磨加工。其中,工件W為一線性滑軌或其他相似之長形結構者,但不以此為限。The step M1 of the grinding processing method is to provide a workpiece W; the step M2 is to fix the workpiece W to the polishing processing device 2; and the step M3 is to adjust the rotation angle and or position of the polishing devices 24, 25, and by the grinding The devices 24, 25 simultaneously grind different surfaces of the workpiece W. Wherein, the workpiece W is a linear slide or other similar elongated structure, but is not limited thereto.

以下,請再參照圖4所示以說明研磨加工設備2。其中,第二承載裝置22係設置於第一承載裝置21,而工件W設置於第二承載裝置22,且視其規劃研磨的部分而決定基準面,如圖4所示,工件W以外側之第一表面P1為基準面。另外,第一承載裝置21具有一驅動單元(圖未顯示),而驅動單元可驅動第二承載裝置22於一第三軸向X移動。其中,第三軸向X為工件W之長軸軸向。於此,第二承載裝置22可沿工件W之長軸方向相對固定裝置23移動。Hereinafter, the polishing processing apparatus 2 will be described with reference to FIG. 4 again. The second carrier device 22 is disposed on the first carrier device 21, and the workpiece W is disposed on the second carrier device 22, and the reference surface is determined according to the portion planned to be polished. As shown in FIG. 4, the workpiece W is outside. The first surface P1 is a reference surface. In addition, the first carrying device 21 has a driving unit (not shown), and the driving unit can drive the second carrying device 22 to move in a third axial direction X. The third axial direction X is the long axis axial direction of the workpiece W. Here, the second carrier device 22 is movable relative to the fixture 23 along the long axis direction of the workpiece W.

在圖4中,第二承載裝置22具有一固定工件W的承載元件R1,以承載工件W,而承載元件R1與工件W的外側第一表面P1接觸,以提供工件W均勻穩定的支撐力。在其他實施態樣中,第二承載裝置22則可具有容置工件W的空間,例如凹槽。另外,第一承載裝置21具有二軌道R2、R3,以承載第二承載裝置22及工件W,並提供第二承載裝置22及工件W均勻穩定的支撐力,且工件W可藉由第二承載裝置22於第一承載裝置21上移動。在其他實施態樣中,第一承載裝置21可具有容置第二承載裝置22的空間,例如凹槽。In Fig. 4, the second carrier 22 has a carrier member R1 for fixing the workpiece W to carry the workpiece W, and the carrier member R1 is in contact with the outer first surface P1 of the workpiece W to provide a uniform and stable supporting force for the workpiece W. In other embodiments, the second carrier 22 can have a space for receiving the workpiece W, such as a groove. In addition, the first carrier device 21 has two rails R2 and R3 for carrying the second carrier device 22 and the workpiece W, and provides a uniform and stable supporting force for the second carrier device 22 and the workpiece W, and the workpiece W can be supported by the second carrier. The device 22 moves on the first carrier device 21. In other embodiments, the first carrier device 21 can have a space for receiving the second carrier device 22, such as a recess.

固定裝置23設置於第一承載裝置21之上,具體而言,兩者可以其他懸吊裝置(圖未示)維持彼此間的相對位置關係。再者,二研磨裝置24、25分別連結於固定裝置23,由固定裝置23個別提供足夠的支撐,且二個研磨裝置24、25分別設置於工件W之兩側。進一步而言,圖4之固定裝置23實質上呈ㄇ字形,而二個研磨裝置24、25分別固定於一端。詳細而言,相對於固定裝置23,研磨裝置24設置於第二承載裝置22之左側;研磨裝置25設置於第二承載裝置22之右側。藉此,研磨裝置24、25可以對工件W之至少二個不同的表面同時研磨加工。The fixing device 23 is disposed on the first carrying device 21, and specifically, the two can maintain relative positional relationship with each other by other hanging devices (not shown). Further, the two polishing devices 24 and 25 are respectively coupled to the fixing device 23, and the fixing device 23 individually provides sufficient support, and the two polishing devices 24 and 25 are respectively disposed on both sides of the workpiece W. Further, the fixing device 23 of Fig. 4 is substantially U-shaped, and the two grinding devices 24, 25 are respectively fixed at one end. In detail, the polishing device 24 is disposed on the left side of the second carrier device 22 with respect to the fixing device 23; the polishing device 25 is disposed on the right side of the second carrier device 22. Thereby, the grinding devices 24, 25 can simultaneously grind at least two different surfaces of the workpiece W.

研磨裝置24、25與固定裝置23連結,且研磨裝置24、25分別延一第一軸向A、Y及/或一第二軸向B、Z移動,以同時研磨加工工件W。於此,研磨裝置24、25分別具有一驅動單元241、251,該等驅動單元241、251分別驅動二個研磨裝置24、25於第一軸向A、Y及/或第二軸向B、Z移動。其中,第一軸向A(Y)及第二軸向B(Z)的夾角可為任意角度,圖4係以90度為例作說明。當然,在其他實施態樣中,第一軸向A(Y)及第二軸向B(Z)的夾角可視其需要,例如可介於0度至180度。The polishing devices 24, 25 are coupled to the fixtures 23, and the polishing devices 24, 25 are respectively moved in a first axial direction A, Y and/or a second axial direction B, Z to simultaneously grind the workpiece W. Here, the polishing devices 24, 25 respectively have a driving unit 241, 251, which drive the two grinding devices 24, 25 respectively in the first axial direction A, Y and / or the second axial direction B, Z moves. The angle between the first axial direction A(Y) and the second axial direction B(Z) may be any angle, and FIG. 4 is taken as an example with 90 degrees. Of course, in other embodiments, the angle between the first axial direction A (Y) and the second axial direction B (Z) may be as needed, for example, between 0 degrees and 180 degrees.

另外,研磨裝置24、25更可分別具有一研磨單元242、252及一驅動部件243、253,該等驅動部件243、253可分別驅動該等研磨單元242、252轉動。其中,研磨單元242、252可分別具有一砂輪或一磨輪,圖4以砂輪為例作說明,且驅動部件243、253可分別驅動研磨單元242、252之砂輪運轉,藉由砂輪與驅動部件243、253配合可對工件W進行研磨加工。其中,需注意的是,研磨裝置24、25的設計方式不應以圖4為限,可視需求有不同的方式,端以能提高研磨加工之效率為優先考量。In addition, the polishing devices 24, 25 may further have a polishing unit 242, 252 and a driving member 243, 253, respectively, which drive the polishing units 242, 252 to rotate. The grinding units 242 and 252 respectively have a grinding wheel or a grinding wheel. FIG. 4 illustrates the grinding wheel as an example, and the driving members 243 and 253 can respectively drive the grinding wheels of the grinding units 242 and 252 to operate by the grinding wheel and the driving component 243. The 253 can be used to grind the workpiece W. It should be noted that the design of the grinding devices 24, 25 should not be limited to FIG. 4, and there are different ways of visually demanding, and the end is considered as a priority to improve the efficiency of the grinding process.

研磨裝置24、25更可分別具有一角度調整單元244、254,依工件W不同的加工需求,角度調整單元244、254使研磨裝置24、25順時針或逆時針旋轉,以對工件W表面的不同位置進行加工,藉此更可提高研磨裝置24、25的自由度。當然,角度調整單元244、254的設置位置並無特別限制。在圖4中,研磨裝置24、25之研磨單元242、252的旋轉角度可介於0度至180度之間。不過,當研磨單元242、252研磨加工工件W時,較佳者之研磨角度可介於0度至90度之間,其中0度為研磨單元242、252分別平行第一軸向A、Y,而90度為研磨單元242、252垂直於第一軸向A、Y。另外,再說明的是,角度調整單元244、254可分別以手動或自動(例如以伺服馬達驅動)方式調整該研磨裝置24、25的旋轉角度,於此並不加以限制。The grinding devices 24, 25 may each have an angle adjusting unit 244, 254. The angle adjusting units 244, 254 rotate the grinding devices 24, 25 clockwise or counterclockwise to the surface of the workpiece W depending on the processing requirements of the workpiece W. The processing is performed at different positions, whereby the degree of freedom of the polishing devices 24, 25 can be further improved. Of course, the installation position of the angle adjusting units 244, 254 is not particularly limited. In FIG. 4, the angle of rotation of the grinding units 242, 252 of the grinding devices 24, 25 can be between 0 and 180 degrees. However, when the grinding unit 242, 252 grinds the workpiece W, the preferred grinding angle may be between 0 and 90 degrees, wherein 0 degrees is the grinding unit 242, 252 parallel to the first axial direction A, Y, respectively. At 90 degrees, the grinding units 242, 252 are perpendicular to the first axial directions A, Y. In addition, it is to be noted that the angle adjusting units 244 and 254 can adjust the rotation angles of the grinding devices 24 and 25 manually or automatically (for example, by a servo motor), and are not limited thereto.

此外,圖4之二個研磨裝置24、25係設置於固定裝置23之同一側,且為同一平面。換言之,研磨裝置24、25是並排且設置於第二軸向B、Z的同一平面。不過,在其它的實施例中,研磨裝置24、25亦可前後錯位、或設置於固定裝置23之相反側。In addition, the two polishing devices 24 and 25 of FIG. 4 are disposed on the same side of the fixing device 23 and are in the same plane. In other words, the polishing devices 24, 25 are arranged side by side and disposed in the same plane of the second axial directions B, Z. However, in other embodiments, the polishing devices 24, 25 may also be misaligned back and forth or disposed on opposite sides of the fixture 23.

因此,當工件W設置於固定裝置23時,可先調整二個研磨裝置24、25之旋轉角度及或位置,以對工件W的不同表面進行研磨加工工作。Therefore, when the workpiece W is disposed on the fixture 23, the rotation angles and or positions of the two polishing devices 24, 25 can be adjusted to perform a grinding process on different surfaces of the workpiece W.

以下,請配合圖5所示,以進一步說明研磨裝置24、25之該等研磨單元242、252研磨加工物件W之情況。為了清楚說明,圖5只顯示研磨單元242、252及工件W,且兩者之比例與圖4不同,兩者之比例亦與實際比例不同。另外,研磨加工步驟例如是對工件W進行表面磨平或成型研磨,且經研磨加工後呈U形、V形或ㄩ形,於此,是以ㄩ形成型研磨為例作說明。Hereinafter, please refer to FIG. 5 to further explain the case where the polishing units 242 and 252 of the polishing apparatuses 24 and 25 polish the workpiece W. For the sake of clarity, FIG. 5 only shows the polishing units 242, 252 and the workpiece W, and the ratio of the two is different from that of FIG. 4, and the ratio of the two is also different from the actual ratio. Further, the polishing processing step is, for example, a surface smoothing or molding polishing of the workpiece W, and is formed into a U-shape, a V-shape, or a ㄩ shape after the polishing process. Here, the ㄩ-forming type polishing is exemplified.

如圖4及圖5所示,由於驅動單元241、251可分別驅動二個研磨裝置24、25之研磨單元242、252於第一軸向A、Y及/或第二軸向B、Z移動,因此,研磨單元242、252可同時分別研磨加工工件W之第二表面P2及第三表面P3。另外,當要研磨工件W之第四表面P4、第五表面P5、第六表面P6、第七表面P7及第八表面P8時,可藉由驅動單元241、251及角度調整單元244、254調整研磨單元242、252之位置及旋轉角度,例如研磨單元242、252移動至適當位置並分別旋轉90度時可研磨加工第六表面P6、第七表面P7及第八表面P8。另外,研磨單元242、252移動至適當位置並分別旋轉0度與90度之間時,研磨單元242可研磨加工第四表面P4,而研磨單元252可研磨加工第五表面P5,於此,二個研磨單元242、252可分別研磨工件W之對向表面(第四表面P4及第五表面P5)。因此,研磨加工設備2不僅可研磨加工物件W外側之第二表面P2及第三表面P3,可不用更換其它的研磨加工設備而同樣可研磨加工物件W內側之第四表面P4、第五表面P5、第六表面P6、第七表面P7及第八表面P8(上表面)。As shown in FIG. 4 and FIG. 5, the driving units 241, 251 can respectively drive the grinding units 242, 252 of the two grinding devices 24, 25 to move in the first axial direction A, Y and/or the second axial direction B, Z. Therefore, the polishing units 242, 252 can simultaneously grind the second surface P2 and the third surface P3 of the workpiece W, respectively. In addition, when the fourth surface P4, the fifth surface P5, the sixth surface P6, the seventh surface P7, and the eighth surface P8 of the workpiece W are to be polished, the driving units 241 and 251 and the angle adjusting units 244 and 254 can be adjusted. The position and the rotation angle of the polishing units 242, 252, for example, when the polishing units 242, 252 are moved to the appropriate positions and rotated by 90 degrees, respectively, the sixth surface P6, the seventh surface P7, and the eighth surface P8 can be polished. In addition, when the grinding units 242, 252 are moved to the appropriate positions and rotated between 0 degrees and 90 degrees, respectively, the grinding unit 242 can grind the fourth surface P4, and the grinding unit 252 can grind the fifth surface P5, where The polishing units 242, 252 can respectively polish the opposite surfaces (the fourth surface P4 and the fifth surface P5) of the workpiece W. Therefore, the polishing processing apparatus 2 can not only polish the second surface P2 and the third surface P3 on the outer side of the workpiece W, but can also polish the fourth surface P4 and the fifth surface P5 inside the workpiece W without replacing other grinding processing equipment. a sixth surface P6, a seventh surface P7, and an eighth surface P8 (upper surface).

承上,若工件W之其它表面需加工時,可直接以研磨加工設備2加工研磨,不用取下工件W並更換不同的研磨加工設備或置換工件W的擺放方向。如此,不僅可提升研磨加工的精度,也可提升其生產產能。If the other surfaces of the workpiece W need to be processed, the grinding processing equipment 2 can be directly processed and ground without removing the workpiece W and replacing the different grinding processing equipment or replacing the placement direction of the workpiece W. In this way, not only can the precision of the grinding process be improved, but also the production capacity can be increased.

在此值得一提的是,研磨加工進行的時間為可調整的,且該等研磨裝置24、25施加於工件W的作用力亦為可調整的。另外,該等研磨裝置24、25也可錯位設置於固定裝置23的同一側,或者設置於固定裝置23的相反側。或者,於固定裝置23的一側設置二個研磨裝置24、25時,同時也於固定裝置23的另一側(例如相反側)設置其它的研磨裝置(圖未顯示),以對工件W的不同表面同時進行研磨工作。It is worth mentioning here that the time during which the grinding process is carried out is adjustable, and the force applied by the grinding devices 24, 25 to the workpiece W is also adjustable. Further, the polishing apparatuses 24 and 25 may be disposed on the same side of the fixing device 23 in a misaligned manner or on the opposite side of the fixing device 23. Alternatively, when two grinding devices 24, 25 are provided on one side of the fixing device 23, other grinding devices (not shown) are also provided on the other side (for example, the opposite side) of the fixing device 23 to the workpiece W. Different surfaces are simultaneously ground.

綜上所述,因依據本發明之研磨加工方法係應用於具有複數個可旋轉之研磨裝置的研磨加工設備,且該等研磨裝置分別設置於固定裝置的不同側。因此,當需對一工件的上側表面或其它表面進行研磨加工時,即可藉由該等研磨裝置調整研磨單元之旋轉角度及或位置,以從不同的位置及方向分別對工件同時進行研磨加工。藉此,不僅可提升研磨加工的精度,也可提升其生產產能。In summary, the grinding processing method according to the present invention is applied to a grinding processing apparatus having a plurality of rotatable grinding apparatuses, and the grinding apparatuses are respectively disposed on different sides of the fixing apparatus. Therefore, when the upper surface or other surface of a workpiece needs to be polished, the rotation angle and or the position of the grinding unit can be adjusted by the grinding device to simultaneously grind the workpiece from different positions and directions. . This not only improves the precision of the grinding process, but also increases its production capacity.

以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。The above is intended to be illustrative only and not limiting. Any equivalent modifications or alterations to the spirit and scope of the invention are intended to be included in the scope of the appended claims.

1、2...研磨加工設備1, 2. . . Grinding equipment

11、23...固定裝置11,23. . . Fixtures

12、13、24、25...研磨裝置12, 13, 24, 25. . . Grinding device

121、131...砂輪121, 131. . . Grinding wheel

21...第一承載裝置twenty one. . . First carrier

22...第二承載裝置twenty two. . . Second carrier

241、251...驅動單元241, 251. . . Drive unit

242、252...研磨單元242, 252. . . Grinding unit

243、253...驅動部件243, 253. . . Drive unit

244、254...角度調整單元244, 254. . . Angle adjustment unit

A、Y...第一軸向A, Y. . . First axial direction

B、Z...第二軸向B, Z. . . Second axial direction

M1~M3、S1~S3...步驟M1~M3, S1~S3. . . step

P1~P8...表面P1 ~ P8. . . surface

R1...承載元件R1. . . Carrier element

R2~R3...軌道R2 ~ R3. . . track

W...工件W. . . Workpiece

X...第三軸向X. . . Third axial direction

圖1為一種習知之研磨加工設備的示意圖;Figure 1 is a schematic view of a conventional grinding processing apparatus;

圖2為一種習知之研磨加工方法的步驟流程圖;2 is a flow chart showing the steps of a conventional grinding processing method;

圖3為本發明較佳實施例之一種研磨加工方法的步驟流程圖;3 is a flow chart showing the steps of a grinding processing method according to a preferred embodiment of the present invention;

圖4為本發明之一種研磨加工設備示意圖;以及Figure 4 is a schematic view of a grinding processing apparatus of the present invention;

圖5為圖4之研磨單元研磨加工工件的示意圖。Figure 5 is a schematic view of the grinding unit of Figure 4 grinding the workpiece.

M1~M3...步驟M1~M3. . . step

Claims (10)

一種研磨加工方法,應用於一具有複數個可旋轉之研磨裝置的研磨加工設備,該研磨加工方法包含以下步驟:提供一工件;將該工件固定於該研磨加工設備;以及調整該等研磨裝置之旋轉角度及或位置,並藉由該等研磨裝置對該工件的不同表面同時進行研磨加工。A grinding processing method for a grinding processing apparatus having a plurality of rotatable grinding apparatuses, the grinding processing method comprising the steps of: providing a workpiece; fixing the workpiece to the grinding processing apparatus; and adjusting the grinding apparatus Rotating angles and or positions, and simultaneously grinding different surfaces of the workpiece by the grinding devices. 如申請專利範圍第1項所述之研磨加工方法,其中該研磨加工步驟係對該工件進行表面磨平或成型研磨。The method of grinding according to claim 1, wherein the grinding step is to perform surface smoothing or profile grinding on the workpiece. 如申請專利範圍第1項所述之研磨加工方法,其中經研磨加工後,該工件呈U形、V形或ㄩ形。The grinding processing method of claim 1, wherein the workpiece is U-shaped, V-shaped or ㄩ-shaped after being ground. 如申請專利範圍第1項所述之研磨加工方法,其中該等研磨裝置可分別延一第一軸向及/或一第二軸向移動。The method of grinding according to claim 1, wherein the grinding devices are respectively movable in a first axial direction and/or a second axial direction. 如申請專利範圍第4項所述之研磨加工方法,其中該等研磨裝置分別具有一驅動單元及一角度調整單元,該等驅動單元分別驅動該等研磨裝置於該第一軸向及/或該第二軸向移動,該等角度調整單元分別控制該等研磨裝置旋轉。The grinding processing method of claim 4, wherein the grinding devices each have a driving unit and an angle adjusting unit, and the driving units respectively drive the grinding devices in the first axial direction and/or The second axial movement, the equal angle adjustment units respectively control the rotation of the grinding devices. 如申請專利範圍第1項所述之研磨加工方法,其中該等研磨裝置的旋轉角度分別介於0度至180度之間。The grinding processing method of claim 1, wherein the grinding devices have a rotation angle of between 0 and 180 degrees, respectively. 如申請專利範圍第1項所述之研磨加工方法,其中研磨加工進行的時間為可調整。The grinding processing method according to claim 1, wherein the polishing processing time is adjustable. 如申請專利範圍第1項所述之研磨加工方法,其中該等研磨裝置施加於該工件的作用力為可調整。The method of grinding according to claim 1, wherein the force applied by the grinding device to the workpiece is adjustable. 如申請專利範圍第1項所述之研磨加工方法,其中該等研磨裝置設置於該研磨加工設備之一固定裝置。The method of grinding according to claim 1, wherein the grinding device is disposed in one of the fixing devices of the grinding processing device. 如申請專利範圍第1項所述之研磨加工方法,其中該等研磨裝置分別研磨該工件之對向表面。The method of grinding according to claim 1, wherein the grinding devices respectively grind the opposing surfaces of the workpiece.
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