TW201229332A - Container for producing silicon ingot and method for producing silicon ingot - Google Patents

Container for producing silicon ingot and method for producing silicon ingot Download PDF

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Publication number
TW201229332A
TW201229332A TW100133444A TW100133444A TW201229332A TW 201229332 A TW201229332 A TW 201229332A TW 100133444 A TW100133444 A TW 100133444A TW 100133444 A TW100133444 A TW 100133444A TW 201229332 A TW201229332 A TW 201229332A
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Taiwan
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container
ingot
crucible
melt
inclination angle
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TW100133444A
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Chinese (zh)
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TWI539042B (en
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Akira Yoshizawa
Takayuki Shimizu
Toshiaki Asahi
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Jx Nippon Mining & Metals Corp
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B17/00Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)

Abstract

A container for producing silicon ingots and a method for producing silicon ingots are provided, which are designed such that grown silicon ingots can be easily taken out from the container and also such that the yield of silicon ingots can be increased. The container for producing silicon ingots has a cylindrical shape with an open top surface and a closed bottom and is used for growing polycrystalline silicon therein by solidifying silicon melt, wherein the sidewalls of the container comprise: a side surface lower part which is formed in the vertical direction; a side surface middle part which is inclined and extends from the side surface lower part so as to widen toward the top surface opening section at a predetermined taper angle (θ ) with respect to the vertical direction; and a side surface upper part which extends from the side surface middle part in the vertical direction. A silicon source material is placed in the silicon ingot forming container in a manner such that the surface of silicon melt is positioned at the inclined sections, and polycrystalline silicon is grown by means of the Kyropoulos method while a seed crystal is lifted out at very low speed.

Description

201229332 六、發明說明: 【發明所屬之技術領域】 本發明是關於用來製造太陽能電池等級的矽錠的矽錠 製造用容器以及矽錠的製造方法。 【先前技術】 以往已知的在太陽能電池所使用的矽錠的製造方法, 是在坩堝或鑄模等的容器中收容矽熔液,使該矽熔液從下 方凝固而使多晶矽成長的鑄造法(例如專利文獻1〜5) 。藉由該鑄造法,當矽熔液凝固時,結晶成長的方向整齊 定向,所以能防止晶界導致電阻率的增大而能製造出優質 的晶圓。藉由鑄造法,可大量生產矽錠。 一般來說,在藉由鑄造法所用的容器的內面形成有脫 模件。當藉由鑄造法製造矽錠時,當矽熔液在容器內凝固 時而矽與.容器反應的話,矽結晶會固著於容器而很難將矽 錠取出。因此,藉由在容器的內面形成脫模件,讓矽結晶 不與容器直接接觸。 而由於矽熔液的密度爲 2.5g/cm3,固體密度爲 2.3 3g/cm3,所以當矽熔液在容器內凝固時其.體積會大約 膨脹7%。而且伴隨該體積膨脹會對容器產生應力,而變 得不易從容器取出矽錠,並且有時會讓在容器上形成的脫 模件損壞。脫模件損壞的話,矽結晶接觸於容器而固著, 所以矽錠的取出性則更加惡化。 因此,需要用來緩和當使矽熔液凝固時伴隨體積膨脹 201229332 所產生的應力之技術。例如提出一種技術(例如專利文獻 1 ) ’藉由將容器的開口部從鉛直方向朝外側傾斜,在容 器側面緩和垂直的應力分力,讓矽結晶不易侵入容器。在 專利文獻1,是揭示一種具有傾斜部的容器,以朝向容器 的開口部擴張的方向’使側面全體傾斜3。以上。 [先前技術文獻] [專利文獻] [專利文獻1 ]日本實開昭5 8 - 2 2 9 3 6號公報 [專利文獻2]日本實公平3-22907號公報 [專利文獻3]日本特開平6-345416號公報 [專利文獻4]曰本特開平i〇_i82l33號公報 [專利文獻5]日本特表2010-503596號公報 【發明內容】 [發明欲解決的課題] 在使用專利文獻1記載的具有傾斜部的容器的情況, 如果容器側面的傾斜角太小的話,就無法得到將矽凝固時 的體積膨脹所伴隨產生的應力予以分散的效果,所以矽錠 不易從容器取出且讓脫模件損壞這樣的問題並沒有消除。 而容器側面的傾斜角太大的話,將矽錠的外周部切斷時的 損失就會變多’良率(原料採取率)會降低所以並不適合 (參考第5圖)。 當藉由鑄造法製造矽錠時,由於從形成有脫模件的容201229332 VI. Description of the Invention: [Technical Field] The present invention relates to a container for producing a bismuth ingot for producing a solar battery grade bismuth ingot and a method for producing the bismuth ingot. [Prior Art] A conventionally known method for producing a niobium ingot used in a solar cell is a casting method in which a crucible is accommodated in a container such as a crucible or a mold, and the crucible is solidified from below to grow polycrystalline crucible ( For example, Patent Documents 1 to 5). According to this casting method, when the crucible melt solidifies, the direction in which the crystal grows is aligned, so that it is possible to prevent the grain boundary from increasing the resistivity and to produce a high-quality wafer. The ingot can be produced in large quantities by the casting method. Generally, a release member is formed on the inner surface of the container used by the casting method. When the crucible is produced by the casting method, when the crucible melts in the container and the crucible reacts with the container, the crucible crystals are fixed to the container and it is difficult to take out the crucible. Therefore, by forming a release member on the inner surface of the container, the ruthenium crystal is not in direct contact with the container. Since the tantalum melt has a density of 2.5 g/cm3 and a solid density of 2.3 3 g/cm3, the volume of the tantalum melt expands by about 7% when it solidifies in the container. Further, as the volume expansion causes stress on the container, it becomes difficult to take out the bismuth ingot from the container, and sometimes the release member formed on the container is damaged. When the mold release member is damaged, the ruthenium crystal is fixed to the container, so that the detachment property of the ruthenium ingot is further deteriorated. Therefore, there is a need for a technique for mitigating the stress generated by volume expansion 201229332 when solidifying the tantalum melt. For example, a technique has been proposed (for example, Patent Document 1). By tilting the opening of the container from the vertical direction to the outside, the vertical stress component is relaxed on the side of the container, so that the ruthenium crystal does not easily intrude into the container. Patent Document 1 discloses a container having an inclined portion which is inclined by 3 in the direction of expansion toward the opening of the container. the above. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. 3-22907 (Patent Document 3) [Patent Document 4] Japanese Patent Application Publication No. 2010-503596 (Patent Document 5) [Problems to be Solved by the Invention] In the case of a container having an inclined portion, if the inclination angle of the side surface of the container is too small, the effect of dispersing the stress accompanying the volume expansion at the time of solidification of the crucible cannot be obtained, so that the crucible is not easily taken out from the container and the release member is allowed to be removed. The problem of damage is not eliminated. When the inclination angle of the side surface of the container is too large, the loss at the time of cutting the outer peripheral portion of the bismuth ingot is increased. The yield (raw material take-up rate) is lowered, so that it is not suitable (refer to Fig. 5). When the bismuth ingot is produced by the casting method, due to the volume from which the release member is formed

S -6- 201229332 器底部使矽結晶成長,所以很難減低結晶晶界。結果,會 因爲載體的損失導致結晶品質的降低、或因爲結晶晶界的 成長導致良率的降低。 本發明爲了解決上述課題,其目的要提供一種矽錠製 造用容器以及矽錠的製造方法,能容易將所培養的矽錠從 容器取出,並且能提高矽錠的良率。 [用以解決課題的手段] 請求項1記載的發明,是上面開口的有底筒狀的矽錠 製造用容器,用來使矽錠熔液凝固而使多晶矽成長; 該容器的側壁,是由:鉛直地形成的側面下部、與該 側面下部連接設置而傾斜成相對於鉛直方向以預定的傾斜 角0朝向上面開口部擴張的側面中部、以及鉛直地與該側 面中部連接設置的側面上部所構成。 請求項2記載的發明,在請求項1記載的矽錠製造用 容器其中,上述傾斜角0,爲10〜8〇。。 請求項3記載的發明,在請求項2記載的矽錠製造用 容器其中,上述傾斜角0,爲15〜6〇。^ 請求項4記載的發明’在請求項2記載的矽錠製造用 容器其中’上述傾斜角0,爲20〜7 〇»。 請求項5記載的發明’在請求項2記載的矽錠製造用 容器其中,上述傾斜角0 ,爲20〜45。。 5F3求項6記載的發明,在請求項1〜5其中任—項記 載的砂錠製造用容器’是以石英、Si3N4' SiC、石墨、氧 201229332 化銘的任何一種所構成的材料或將兩種以上組合成的材料 所構成。 請求項7記載的發明,對請求項1〜6其中任一項記 載的矽錠製造用容器,將矽原料投入成讓矽熔液的表面位 於上述傾斜部,使上述矽熔液凝固而使多晶矽成長。 請求項8記載的發明,在請求項7記載的矽錠的製造 方法其中,使種晶接觸於上述矽熔液的表面,一邊將上述 種晶拉起一邊使上述矽熔液從表面凝固而使多晶矽成長。 請求項9記載的發明,在請求項8記載的矽錠的製造 方法其中’以因應於上述矽熔液凝固時的體積膨脹的速度 ’將上述種晶拉起。 以下針對完成本發明的原委來說明。 習知作爲一種結晶成長法,已知有泡生法( Kyropulos Method),使種晶接觸於熔液表面,從熔液面 朝向下方使結晶成長。在該泡生法,由於從異物較少的熔 液面讓結晶成長,所以能預期較鑄造法有更高品質的矽結 晶。本發明者硏究取代從形成有脫模件的容器底部使結晶 成長的鑄造法,而確定利用泡生法來製造矽錠的方法。 首先,當利用泡生法來製造矽錠時,所用的方法是藉 由以極低速將成長結晶拉起,來緩和當砂凝固時的體積膨 脹所伴隨產生的縱方向的應力。可是,在以該方法製造砂 錠的情況’在容器的內面形成的脫模件,有很多處面狀地 消失,也很難將矽錠取出。 爲了追究原因而觀察製造矽錠之後的容器,而了解在The bottom of the S-6-201229332 crystal grows, so it is difficult to reduce the crystal grain boundaries. As a result, the loss of the crystal quality due to the loss of the carrier or the decrease in the yield due to the growth of the crystal grain boundary may result. In order to solve the above problems, an object of the present invention is to provide a container for producing a ruthenium ingot and a method for producing the ruthenium ingot, which can easily take out the ruthenium ingot to be incubated from the container and improve the yield of the ruthenium ingot. [Means for Solving the Problem] The invention according to claim 1 is a bottomed cylindrical ingot manufacturing container for opening, which is used for solidifying a crucible melt to grow polycrystalline crucible; a lower portion of the side surface formed vertically, and a side portion of the side surface which is connected to the lower portion of the side surface and which is inclined to extend toward the upper opening portion at a predetermined inclination angle 0 with respect to the vertical direction, and an upper portion of the side surface which is vertically connected to the middle portion of the side surface . According to the invention of claim 2, in the container for producing an ingot, the inclination angle 0 is 10 to 8 inches. . According to the invention of claim 3, in the container for manufacturing an ingot, the inclination angle 0 is 15 to 6 inches. The invention according to claim 4, wherein the above-mentioned inclination angle 0 is 20 to 7 〇». The invention of claim 5, wherein the inclination angle 0 is 20 to 45 in the container for producing an ingot. . According to the invention of claim 6, the container for manufacturing a sand ingot according to any one of claims 1 to 5 is a material composed of any one of quartz, Si3N4' SiC, graphite, and oxygen 201229332. A combination of the above materials. The invention according to any one of claims 1 to 6, wherein the crucible raw material is placed so that the surface of the crucible melt is located in the inclined portion, and the crucible melt is solidified to cause polycrystalline crucible growing up. According to the invention of the present invention, in the method of producing the bismuth ingot according to the seventh aspect, the seed crystal is brought into contact with the surface of the ruthenium melt, and the ruthenium melt is solidified from the surface while the seed crystal is pulled up. Polycrystalline growth. According to the invention of claim 9, in the method for producing an antimony ingot according to claim 8, the seed crystal is pulled up in accordance with the speed of the volume expansion when the crucible melt is solidified. The following is a description of the originality of the present invention. Conventionally, as a crystal growth method, a Kyropulos method has been known in which a seed crystal is brought into contact with a surface of a molten metal, and crystal growth is progressed from a molten surface toward a lower side. In the bubble generation method, since crystal growth is caused from a molten metal surface having a small foreign matter, it is expected that a higher quality tantalum crystal is formed than the casting method. The present inventors have intensively determined a method of producing a ruthenium ingot by a bubble generation method instead of a casting method in which crystals are grown from the bottom of a container in which a release member is formed. First, when the bismuth ingot is produced by the bubble generation method, the method is to pull up the growth crystal at a very low speed to alleviate the longitudinal stress accompanying the volume expansion when the sand is solidified. However, in the case where the ingot is produced by this method, the release member formed on the inner surface of the container has a large number of surface-like disappearances, and it is difficult to take out the crucible ingot. Observe the container after the manufacture of the ingot for the sake of investigation, and understand

S -8- 201229332 矽錠的頂部周緣,也就是與矽熔液的 化的部分對應的部分,脫模件面狀地 錠的頂部周緣,涵蓋周方向形成有高 的凸部。 另一方面,在藉由鑄造法製造矽 在與矽錠的頂部對應的部分,其脫模 是因爲結晶成長法所導致,而是當矽 時的體積膨脹所伴隨產生的應力,顯 固時的體積膨脹所伴隨的應力。而認 況,當矽熔液的表面附近凝固時,朝 (尤其是頂部周緣的凸部)侵入脫模 強拉地將其拉起則讓脫模件剝離。 而且發現,藉由著眼於矽熔液的 善容器的形狀,則能有效地分散矽凝 其是橫方向的體積膨脹)所伴隨產生 達到矽錠從容器取出的取出性與良率 [發明效果] 藉由本發明,緩和了當矽凝固時 生的對容器產生的應力,所以能有效 成的脫模件損壞的情形。於是讓所培 容器,而能容易取出。 而在矽錠製造用容器,將當矽凝 隨產生的應力變大的部’分作爲傾斜部 表面附近凝固而結晶 消失。而確認了在矽 度 0· 1〜0.5mm程度 錠的情況也同樣地, 件消失。所以應該不 熔液的表面附近凝固 著地大於其他部分凝 爲在利用泡生法的情 橫方向膨脹的矽結晶 件,在該狀態藉由半 表面位置的部分來改 固時的體積膨脹(尤 的應力,藉此能同時 ,而完成本發明。 的體積膨脹所伴隨產 地防止在容器內面形 養的矽錠不會固著於 固時的體積膨脹所伴 ,針對應力較小的部 -9 - 201229332 分(側面下部)則鉛直地形成,所以當將矽錠的外周部切 斷時的加工損失就會變少。於是,能達到提升矽錠的良率 【實施方式】 - 以下根據圖面來詳細說明本發明的實施方式》 第1圖是適用本發明的矽錠製造用容器的剖面圖。第 1圖所示的矽錠製造用容器(以下稱爲容器)11,例如是 以石英材料成形,上面部開口的有底的圓筒狀或方筒狀的 容器。容器1 1的側壁,區劃成:鉛直地形成的側面下部 (以下稱爲直體部)1 1 C、與側面下部1 1 C連接設置而傾 斜成以傾斜角(相對於鉛直方向的傾斜角)Θ朝向上面開 口部擴張的側面中部(以下稱爲傾斜部)lib、以及鉛直 地與傾斜部1 1 b連接設置的側面上部1 1 a。 這裡如第6圖(a)所示,當容器11的側壁na及底 壁lid的厚度爲T1時.,則厚度T1最好爲5〜20mm程度 。小於5mm的話,會有容器材料的脆弱性的問題。另一 方面,大於2 0 mm的話,則無法忽視因爲容器的隔熱性增 加所造成的影響,矽的熔融時間增加,則由於前導時間或 電力成本增加所以讓生產性降低。根據相同的原因,側面 下部11c的厚度T2希望爲5〜30mm程度。側面下部11c 的長度Lc ’雖然沒有特別限制,而當原料在容器內熔解 時,側面下部1 1 c以上的長度L a + L b與側面下部1 1 c的 長度Lc的比(La + Lb ) / Lc最好爲「2」以上。矽原料其S -8- 201229332 The top edge of the bismuth ingot, that is, the portion corresponding to the fused portion of the bismuth melt, and the top periphery of the planar part of the release member, which has a high convex portion formed in the circumferential direction. On the other hand, in the part corresponding to the top of the bismuth ingot by the casting method, the demolding is caused by the crystallization growth method, but the stress accompanying the volume expansion when 矽, when it is solidified The stress associated with volume expansion. On the other hand, when solidifying near the surface of the crucible melt, the mold release member is peeled off by invading the mold release (especially the convex portion of the top peripheral edge) and pulling it up. Further, it has been found that, by focusing on the shape of the good container of the bismuth melt, it is possible to effectively disperse the volume expansion which is entangled in the transverse direction, and the take-up property and yield of the bismuth ingot are taken out from the container. [Effect of the invention] According to the present invention, the stress generated on the container which is generated when the crucible is solidified is alleviated, so that the mold release member which can be effectively formed is damaged. The container is then allowed to be removed and can be easily removed. On the other hand, in the container for producing an ingot, the portion which becomes a large stress due to the coagulation is solidified as the vicinity of the surface of the inclined portion, and the crystal disappears. On the other hand, it was confirmed that the ingot was in the range of 0·1 to 0.5 mm, and the piece disappeared. Therefore, the solidified part near the surface of the molten metal should be solidified more than the other parts, and the solidified part which is expanded in the transverse direction by the bubble method, in this state, the volume expansion when it is modified by the half-surface position (especially The stress can thereby complete the present invention at the same time. The volume expansion is accompanied by the production place to prevent the volume of the bismuth ingot which is shaped in the inner surface of the container from being fixed at the time of solidification, and the part -9 having less stress - 201229332 (the lower part of the side) is formed vertically, so the machining loss when the outer peripheral portion of the bismuth ingot is cut is reduced. Therefore, the yield of the bismuth ingot can be improved. [Embodiment] - The following is based on the drawing. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The first embodiment is a cross-sectional view of a container for manufacturing a bismuth ingot according to the present invention. The container for producing a bismuth ingot (hereinafter referred to as a container) 11 shown in Fig. 1 is, for example, a quartz material. A bottomed cylindrical or rectangular tubular container having an open upper surface. The side wall of the container 1 is divided into a vertically lower side surface (hereinafter referred to as a straight body portion) 1 1 C and a side lower portion 1 1 C company It is inclined so as to be inclined at an inclination angle (inclination angle with respect to the vertical direction) 侧面 a side surface middle portion (hereinafter referred to as an inclined portion) lib which is expanded toward the upper opening portion, and a side surface upper portion 1 which is vertically connected to the inclined portion 1 1 b 1 a. Here, as shown in Fig. 6(a), when the thickness of the side wall na and the bottom wall lid of the container 11 is T1, the thickness T1 is preferably about 5 to 20 mm. If it is less than 5 mm, there is a container material. On the other hand, if it is larger than 20 mm, it cannot be ignored because of the influence of the increase in the heat insulation of the container, and the melting time of the crucible increases, so that the productivity is lowered due to the increase in the lead time or the cost of electricity. For the same reason, the thickness T2 of the side lower portion 11c is desirably about 5 to 30 mm. Although the length Lc' of the side lower portion 11c is not particularly limited, when the raw material is melted in the container, the length L a above the lower portion of the side surface 1 a The ratio (L + Lb ) / Lc of + L b to the length Lc of the side lower portion 1 1 c is preferably "2" or more.

S -10 - 201229332 固體的密度小於液體,所以爲了讓熔液面位置至少來到 Lc的位置(直體部分11c的最上端)’需要在容器內將 原料充塡至至少Lc的兩倍的高度的位置。雖然因爲原料 的形狀,而將其朝容器充塡的程度有所不同,而只要成爲 上述的尺寸比例的話,在實用上是足夠的。上述容器11 的厚度或長度,並不限定於方筒狀的容器的情況’圓筒狀 的容器也是一樣》 如第6圖(a)所示,容器11的上部及下部的內部尺 寸分別爲ml、m2時,兩者的差(ml— m2)爲2〜50mm 較佳,最好爲1〇〜20mm的範圍。低於2mm的話則無法 防止結晶成長中的矽錠侵入脫模件及容器。超過50mm的 話,由於容器側面傾斜部及其側面下部的厚壁部分的隔熱 性增加,所以與50mm以下的情況相比讓矽的熔融時間增 加,由於前導時間或電力成本增加所以讓生產性降低。而 在例如從方筒狀或圓筒狀的容器得到例如150〜270kg程 度的砂錬的情況,例如m2爲600mm,ml爲602〜650mm ’最好爲610mm〜620mm。 在容器11收容有矽熔液,使該矽熔液凝固而使多晶 矽成長的情況,位於傾斜部1 1 b的矽熔液凝固時的體積膨 脹所伴隨產生的應力,會分散爲與傾斜部1 1 b垂直的分力 與平行的分力。例如藉由讓傾斜角0成爲3 °以上而小於 90°,則能使體積膨脹所伴隨產生的應力分散成不會讓脫 模件剝離的程度。根據實驗已確認了,當傾斜角小於3°時 ,所培養的矽錠會侵入脫模件,而讓脫模件損壞。因此, -11 - 201229332 希望傾斜角0爲3°以上。 第2圖是使用容器11的結晶成長裝置的一個例子的 顯示圖。 第2圖所示的結晶成長裝置1,是藉由泡生法( Kyropulos Method)來製造矽錠,所使用的容器11是在 內面形成有Si3N4焙燒體等的脫模件12。在結晶成長裝置 1,容器11被石墨製的承座13所支承,在承座13的外周 配置有加熱器14。在容器11的中央配置有結晶拉起軸15 ,在其前端安裝有:由單晶Si (或多晶Si)所構成的種 晶1 6。 當使用結晶成長裝置1藉由泡生法來製造矽錠時,將 矽原料(例如矽熔液)投入到容器1 1,以讓矽熔液1 7的 表面位於傾斜部lib。然後使種晶16接觸於矽熔液17的 表面,使矽熔液1 7從表面凝固而使多晶矽成長。 此時,藉由一邊以極低速將種晶1 6拉起一邊使多晶 矽成長,則能緩和矽凝固時的體積膨脹所伴隨產生的縱方 向的應力。也就是說,種晶16的拉起速度,是與矽熔液 17凝固時的縱方向的體積膨脹因應來設定。 矽熔液1 7的表面,位於容器1 1的傾斜部1 1 b,所以 熔液表面附近凝固時的體積膨脹所伴隨在容器11產生的 橫方向的應力會被分散。也就是說,因應於傾斜度0的大 小而讓與傾斜部1 1 b垂直的應力分力變小,所以能防止矽 結晶侵入於脫模件1 2。於是在多晶矽的成長過程,脫模 件1 2不會損壞,所以所培養的矽錠不會固著於容器,能S -10 - 201229332 The density of the solid is less than the liquid, so in order to make the position of the melt surface at least to the position of Lc (the uppermost end of the straight portion 11c), it is necessary to fill the material to a height of at least twice the Lc in the container. s position. Although the degree of filling of the container differs depending on the shape of the raw material, it is practically sufficient as long as it is the above-described dimensional ratio. The thickness or length of the container 11 is not limited to the case of a rectangular tubular container. The same is true for the cylindrical container. As shown in Fig. 6(a), the internal dimensions of the upper and lower portions of the container 11 are respectively ml. In the case of m2, the difference (ml - m2) between the two is preferably 2 to 50 mm, preferably 1 to 20 mm. When it is less than 2 mm, it is impossible to prevent the ruthenium in the growth of crystal from intruding into the release member and the container. When the thickness is more than 50 mm, the heat insulating property of the inclined portion on the side of the container and the thick portion of the lower portion of the side of the container is increased. Therefore, the melting time of the crucible is increased as compared with the case of 50 mm or less, and the productivity is lowered due to an increase in the lead time or the electric power cost. . Further, for example, in the case of obtaining a mortar of, for example, 150 to 270 kg from a rectangular or cylindrical container, for example, m2 is 600 mm, and ml is 602 to 650 mm', preferably 610 mm to 620 mm. When the crucible is accommodated in the container 11 and the crucible melt is solidified to grow the polycrystalline crucible, the stress accompanying the volume expansion at the time of solidification of the crucible melt located in the inclined portion 1 1 b is dispersed in the inclined portion 1 1 b vertical component and parallel component. For example, by setting the inclination angle 0 to 3 ° or more and less than 90 °, the stress accompanying the volume expansion can be dispersed to such an extent that the release member is not peeled off. According to experiments, it has been confirmed that when the inclination angle is less than 3, the cultured ingot will invade the release member and the release member is damaged. Therefore, -11 - 201229332 expects the tilt angle 0 to be 3° or more. Fig. 2 is a view showing an example of a crystal growth apparatus using the container 11. In the crystal growth apparatus 1 shown in Fig. 2, a crucible ingot is produced by a Kyropulos method, and the container 11 to be used is a release member 12 in which an Si3N4 calcined body or the like is formed on the inner surface. In the crystal growth apparatus 1, the container 11 is supported by a socket 13 made of graphite, and a heater 14 is disposed on the outer circumference of the socket 13. A crystal pulling shaft 15 is disposed at the center of the container 11, and a seed crystal 16 made of single crystal Si (or polycrystalline Si) is attached to the tip end. When the ruthenium ingot is produced by the bubble growth method using the crystal growth apparatus 1, a ruthenium raw material (e.g., ruthenium melt) is introduced into the vessel 1 1 so that the surface of the ruthenium melt 17 is located at the inclined portion lib. Then, the seed crystal 16 is brought into contact with the surface of the crucible melt 17, and the crucible melt 17 is solidified from the surface to grow the polycrystalline crucible. At this time, by growing the polycrystalline silicon while pulling the seed crystal 16 at an extremely low speed, the longitudinal stress accompanying the volume expansion at the time of solidification of the crucible can be alleviated. That is, the pulling speed of the seed crystal 16 is set in accordance with the volume expansion in the longitudinal direction when the crucible melt 17 is solidified. Since the surface of the crucible melt 17 is located at the inclined portion 1 1 b of the container 1 1 , the volume expansion at the time of solidification near the surface of the melt is accompanied by the lateral stress generated in the container 11 being dispersed. In other words, the stress component perpendicular to the inclined portion 1 1 b is made smaller in accordance with the magnitude of the inclination 0, so that the ruthenium crystal can be prevented from intruding into the release member 12. Therefore, during the growth of the polycrystalline crucible, the release member 12 is not damaged, so the cultured ingot is not fixed to the container, and

S -12- 201229332 容易將其取出。 藉由將容器11的尺寸(直體部llc的內徑、傾斜角 0等)或所投入的矽原料的量(矽熔液17的表面位置) 適當地設定’也能藉由種晶16的拉起操作,讓矽錠的頂 部周緣不與容器11 (傾斜部llb)的內面接觸。 例如考慮’當位於傾斜部llb的矽熔液的表面附近凝 固時’考慮將在液面上形成的結晶以L從種晶1 6拉起至 容器的直體部分的情況的話,在拉起前後,熔液表面的直 徑會擴徑爲2Ltan Θ。於是該擴徑量(2Ltan 0 ),如果較 矽凝固時的橫方向的體積膨脹更大的話,則矽錠的頂部周 緣就不會與容器11 (傾斜部lib)的內面接觸。 矽熔液’已知當凝固時會朝橫方向膨脹1 mm左右, 而藉由本發明者等的實驗,判斷在矽錠的頂部周緣形成有 高度α (0.1〜0.5 mm程度)的凸部,所以藉由將種晶16 的拉起量L與傾斜角0設定成讓擴徑量(2Ltane)大於 (1.+ α ) ’則能讓矽錠的頂部周緣不與容器1 1 (傾斜部 lib)的內面接觸。例如 L = 10.5 (mm) · α = 0.1 ( mm )的情況,0 2 3 °。 在容器11,將伴隨矽凝固時的體積膨脹所產生的較 大應力的部分作爲傾斜部1 1 b,針對應力較小的側面下部 1 1 C則鉛直地形成,所以將矽錠的外周部切斷而加工成圓 柱狀或方柱狀時的損失較小。於是,能達到提升矽錠的良 率。 也就是說,如第5圖所示,如果將容器的側面全體傾 -13- 201229332 斜的話,雖然能將矽凝固時的體積膨脹所伴隨產生的應力 予以分散,可是由於矽錠的底部外徑與上部外徑的差變大 ,所以將矽錠加工成圓柱狀或方柱狀時的損失會變大。 例如使用容器的側面全體的傾斜角爲1 〇°的方筒狀容 器,而得到底部直徑爲90mm、高度爲1 10m、頂部直徑爲 128mm的矽錠的情況,損失體積爲全體的56%。同樣地 ,爲了製作底部直徑爲90mm、高度爲11 Omm的矽錠,而 傾斜角爲20°、30°、45°、70°的情況,除了方筒狀容器與 矽錠的上部外徑顯著增加而讓爐具大型化,且計算出在容 器底面的矽錠的損失率分別爲70%、79%、87%、97% 。以該方式,在使容器的側面全體傾斜而施加傾斜角的習 知的方法的情況,方柱狀矽錠的良率顯著降低。如果想稍 微提高良率的話,也會有切割次數增加的缺點。 相對的,在使用本發明的實施方式的容器1 1的情況 ,只在矽錠頂部側面上部具有傾斜部,其他側.面部爲直體 部,所以損失體積率爲3 6 %,即使將其傾斜角度變更爲 10°、20°、30°、45°、70°,損失體積率仍爲 36%。 當利用泡生法製造矽錠時,一邊將種晶拉起一邊使多 晶矽成長,所以藉由適當調整拉起速度,則能讓矽錠的頂 部周緣在不接觸脫模件1 2的狀態將其保持且持續成長。 於是,能更有效地防止矽錠侵入脫模件12,也不會因爲S -12- 201229332 It is easy to remove it. By appropriately setting the size of the container 11 (the inner diameter of the straight body portion llc, the inclination angle 0, etc.) or the amount of the raw material to be poured (the surface position of the crucible melt 17) can also be determined by the seed crystal 16 The pulling operation is such that the top periphery of the crucible is not in contact with the inner surface of the container 11 (inclined portion 11b). For example, consider that 'when solidified near the surface of the crucible melt located in the inclined portion 11b', considering the case where the crystal formed on the liquid surface is pulled up from the seed crystal 16 to the straight portion of the container, before and after the pulling up The diameter of the surface of the melt will increase to 2Ltan Θ. Then, if the volume expansion amount (2Ltan 0 ) is larger than the volume expansion in the lateral direction at the time of solidification, the top edge of the crucible ingot does not come into contact with the inner surface of the container 11 (inclined portion lib). The tantalum melt is known to expand in the lateral direction by about 1 mm when solidified, and it has been determined by experiments by the inventors of the present invention that a convex portion having a height α (about 0.1 to 0.5 mm) is formed on the top periphery of the tantalum ingot. By setting the pulling amount L of the seed crystal 16 and the tilt angle 0 such that the diameter expansion amount (2Ltane) is larger than (1.+ α ) ', the top circumference of the bismuth ingot can be made not to correspond to the container 1 1 (inclined portion lib). Inside contact. For example, L = 10.5 (mm) · α = 0.1 (mm), 0 2 3 °. In the container 11, the portion of the large stress generated by the volume expansion at the time of solidification of the crucible is used as the inclined portion 1 1 b, and the lower portion 1 1 C of the side surface having a small stress is formed vertically, so that the outer peripheral portion of the crucible ingot is cut. The loss when machining into a cylindrical shape or a square column is small. As a result, the yield of the bismuth ingot can be improved. In other words, as shown in Fig. 5, if the entire side of the container is inclined -13 - 201229332, the stress accompanying the volume expansion during solidification of the crucible can be dispersed, but the bottom outer diameter of the ingot is Since the difference from the upper outer diameter becomes large, the loss when the tantalum ingot is processed into a cylindrical shape or a square column shape becomes large. For example, in the case of a crucible having a bottom diameter of 1 〇° and a total of a side diameter of 90 mm, a height of 1 10 m, and a top diameter of 128 mm, the loss volume is 56% of the total. Similarly, in order to produce a bismuth ingot having a bottom diameter of 90 mm and a height of 11 Omm, and the inclination angle is 20°, 30°, 45°, and 70°, the outer diameter of the upper portion of the rectangular tubular container and the bismuth ingot is significantly increased. The furnace was enlarged, and the loss rate of the bismuth ingot on the bottom surface of the container was calculated to be 70%, 79%, 87%, and 97%, respectively. In this manner, in the case of a conventional method of inclining the entire side surface of the container and applying an inclination angle, the yield of the square columnar ingot is remarkably lowered. If you want to increase the yield slightly, there will be a disadvantage of increasing the number of cuts. On the other hand, in the case of using the container 1 of the embodiment of the present invention, the inclined portion is provided only on the upper side of the top side of the bismuth ingot, and the other side and the face are straight portions, so that the volume loss rate is 36% even if it is inclined. The angle was changed to 10°, 20°, 30°, 45°, 70°, and the loss volume rate was still 36%. When the bismuth ingot is produced by the bubble generation method, the polycrystalline enamel is grown while the seed crystal is pulled up. Therefore, by appropriately adjusting the pulling speed, the top peripheral edge of the bismuth ingot can be brought into contact with the release member 12. Maintain and continue to grow. Therefore, it is possible to more effectively prevent the ingot from intruding into the demolding member 12, and it is not because

I 侵入情形來妨礙成長結晶的拉起操作。 而藉由因應於矽凝固時的體積膨脹而將種晶16拉起 ’而緩和了體積膨脹所伴隨產生的縱方向的應力,所以也I Intrusion situation to hinder the pulling operation of growth crystallization. However, the seed crystal 16 is pulled up in response to the volume expansion at the time of solidification of the crucible, and the longitudinal stress accompanying the volume expansion is alleviated, so

S •14- 201229332 不會產生因爲壓縮矽熔液導致的缺失。 藉由讓傾斜角0爲3°以上而小於90°,則使矽凝 的體積膨脹所伴隨產生的應力,分散爲讓脫模件12 損壞的程度,可是如果傾斜角0太小的話,體積膨脹 隨產生的應力的分散效果較小,還是會有因爲不同情 脫模件1 2損壞的可能性。而傾斜角0太大的話,爲 保傾斜部1 1 b的高度,會將傾斜部1 1 b橫向大幅伸出 以會導致裝置的大型化,而成爲損失增加的原因,而 傾斜面與直體部分的交界的彎曲部分,脫模件容易裂 會有無法輕易取出矽錠的可能。根據這種觀點,傾斜 ’希望設定在10°〜80°,最好爲20°〜70°,或者15°· ,更好爲20°〜45°的範圍。 [實施例] 在實施例1〜4,藉由使用結晶成長裝置1的泡 來製造矽錠。容器11爲圓筒狀,其尺寸,直體部11 的開口部的內徑(ml )爲146mm,直體部1 lc底部 徑(m2)爲125mm,直體部11c的高度Lc爲30mm + Lb爲6 0mm。傾斜部1 lb的高度Lb,當傾斜角0 = 、30°、45。、70。時,分別爲 29mm、18mm、10mm、 ο 首先’將添加硼(濃度:l.〇xl〇16at〇m/cm3)的 液流入圓筒狀容器11,將矽熔液保持成:使矽熔液 面位於傾斜部1 1 b的中間點(從與直體部1 1 c的交界 固時 不會 所伴 況讓 了確 ,所 且在 開, 角0 、60。 生法 a上 的內 ,La = 20。 4mm 矽熔 的表 起算 -15- 201229332 5.25111111處),深度方向的溫度梯度爲1〇^:/(:111。 然後將結晶方位< 100>且3.5mm見方的Si單結晶所 構成的種晶16’接觸於矽熔液的表面,以手動方式一邊 將該種晶1 6以1 mm/h拉起一邊使多晶矽成長。此時’將 容器11及種晶16以5rpm旋轉,以種晶16爲中心使多晶 矽成長爲同心圓狀。藉由3小時的成長使矽熔液完全固化 ,而得到實施例的矽錠。容器1 1的底部的溫度,將成爲 矽的凝固點也就是1 4 1 0 °C的時間點看作結晶成長的終點 。在表1顯不其結果。 [表1]S •14- 201229332 does not produce a defect due to the compression of the melt. By setting the inclination angle 0 to 3° or more and less than 90°, the stress accompanying the expansion of the volume of the coagulation is dispersed to the extent that the release member 12 is damaged, but if the inclination angle 0 is too small, the volume is expanded. As the dispersion effect of the generated stress is small, there is still the possibility of damage due to the undesired release member. When the inclination angle 0 is too large, in order to maintain the height of the inclined portion 1 1 b, the inclined portion 1 1 b is largely extended laterally, which may cause an increase in size of the device, which may cause an increase in loss, and the inclined surface and the straight body In the curved portion of the boundary, the release member is easily cracked and there is a possibility that the bismuth ingot cannot be easily taken out. From this viewpoint, the inclination ′ is desirably set in the range of 10° to 80°, preferably 20° to 70°, or 15°·, more preferably 20° to 45°. [Examples] In Examples 1 to 4, a ruthenium ingot was produced by using a bubble of the crystal growth apparatus 1. The container 11 has a cylindrical shape, and the inner diameter (ml) of the opening portion of the straight body portion 11 is 146 mm, the bottom diameter (m2) of the straight body portion 11c is 125 mm, and the height Lc of the straight body portion 11c is 30 mm + Lb. It is 60 mm. The height Lb of the inclined portion 1 lb is when the inclination angle is 0 = , 30°, 45. 70. At the time, they are 29 mm, 18 mm, and 10 mm, respectively. ο First, the liquid to which boron (concentration: l.〇xl〇16 at〇m/cm3) is added flows into the cylindrical container 11, and the crucible is kept: The surface is located at the middle point of the inclined portion 1 1 b (the condition from the boundary with the straight body portion 1 1 c does not depend on the condition, and is open, angle 0, 60. Inside the birth method a, La = 20. The 4mm 矽 melting table starts from -15-201229332 5.25111111), the temperature gradient in the depth direction is 1〇^:/(:111. Then the crystal orientation is <100> and the 3.5mm square Si single crystal is formed. The seed crystal 16' is in contact with the surface of the crucible melt, and the polycrystalline crucible is grown by manually pulling the seed crystal 16 at 1 mm/h. At this time, the container 11 and the seed crystal 16 are rotated at 5 rpm to seed The polycrystalline silicon is grown into a concentric shape with the crystal 16 as the center. The crucible melt is completely solidified by the growth of 3 hours, and the crucible ingot of the embodiment is obtained. The temperature at the bottom of the vessel 11 will become the freezing point of the crucible, that is, 14 The time point of 10 ° C is regarded as the end point of crystal growth. The results are not shown in Table 1. [Table 1]

傾斜角度0【。】 對容器的侵入 脫模性 實施例1 20 Μ j\w 〇 實施例2 30 Μ j»\\ 〇 實施例3 45 Μ /»\N 〇 實施例4 70 Μ 〇 比較例1 2 有 X 比較例2 8 有 Δ 比較例3 85 有 X 比較例4 0 有 X 以實施例1〜4所進行的矽錠的製造’如第3圖所示 ,在成長過程,並沒有:多晶矽1 8侵入於脫模件1 2而妨 礙拉起操作的情形。也就是說’使用:形成有傾斜部1 1 b 的容器11,並且藉由一邊將種晶16拉起一邊使多晶矽成 長,藉此能有效地緩和在矽熔液17所產生的壓縮應力。 而能容易將所製造的矽錠從容器11取出。而並不會 -16 -Tilt angle 0 [. Intrusion release of the container Example 1 20 Μ j\w 〇 Example 2 30 Μ j»\\ 〇 Example 3 45 Μ /»\N 〇 Example 4 70 Μ 〇 Comparative Example 1 2 Having X comparison Example 2 8 Δ Comparative Example 3 85 X Comparative Example 4 0 X was produced by the bismuth ingots of Examples 1 to 4' As shown in Fig. 3, during the growth process, no polycrystalline germanium 18 was invaded. The release member 12 prevents the pulling operation. That is to say, the use of the container 11 having the inclined portion 1 1 b is formed, and the polycrystalline crucible is formed by pulling the seed crystal 16 while pulling, whereby the compressive stress generated in the crucible melt 17 can be effectively alleviated. Moreover, the produced bismuth ingot can be easily taken out from the container 11. And it won't -16 -

S 201229332 產生以往成爲問題的容器1 1與矽錠的頂窗 而且也並未產生在直體狀的矽錠加工時讓形 用上的問題。 並且,在所獲得的矽錠,其晶界是整齊 與藉由鑄造法所製造的矽錠比較,晶界品質 確認了使用實施方式的容器11,以泡生法 導致的有效性。 在實施例1〜4,雖然顯示了傾斜部1 爲2 0°、3 0°'、45°、70°的情況,而傾斜角0 j 能得到同樣的結果。將傾斜角0在1 0〜80 點改變來進行實驗而比較的結果,確認了: 15〜60°的情況,矽錠從容器取出的取出性 角0在20〜45°的情況的良率最優異。 [比較例] 第4圖是在比較例4所使用的結晶成J 造的顯示圖。在第4圖,是用相對於與實拥 長裝置1相同或對應的構成元件,加上20 晶成長裝置2,與實施方式的結晶成長裝置 在於使用一般的直體型的容器21。 在比較例1〜4,使用結晶成長裝置2 製造矽錠。在圓筒狀容器21,使用內徑爲 型的容器。針對矽原料的投入量、多晶矽的 實施例相同。 周緣的熔接。 錠裂開等的實 朝向縱方向, 更加提升。而 使結晶成長所 1 b的傾斜角0 爲60°的情況也 °的範圍一點一 在傾斜角0爲 更好,而傾斜 裝置的槪略構 方式的結晶成 的圖號。在結 1不同之處是 藉由泡生法來 125mm的直體 成長條件等與 -17- 201229332 在比較例1,在結晶拉起中會卡住容器,而在該狀態 持續成長的結果,體積膨脹應力會集中在容器的底部而破 壞容器。而確認將矽錠取出後的容器21,在容器21的底 面及側面的大半區域,雖然脫模件22並沒有剝離情形, 可是在與矽錠的頂部對應的部分,有很多區域的脫模件 22面狀地消失。這應該是當矽熔液27的表面附近凝固時 ,朝橫方向膨脹的多晶矽28侵入於脫模件22,因爲在該 狀態半強拉地拉起而讓脫模件22剝離,並且由於多晶矽 固著於容器21,所以很難將矽錠取出。 在比較例2的傾斜角8°的情況,當以泡生法將結晶拉 起時,結晶雖然沒有卡到容器,可是矽錠頂部側面與脫模 件的摩擦情形嚴重,而成爲很難取出的結果。 比較例3的情況,在容器的傾斜部分與與直體部分的 彎曲部分,脫模件裂開,所以在該部分矽錠與容器熔接而 很難將矽錠取出。應該是在彎曲部分,脆化的脫模件無法 承受體積膨脹應力的原因。 在比較例4所進行的矽錠的製造,如第4圖所示,在 成長過程,多晶矽2 8侵入於脫模件22而妨礙拉起操作。 而且限制了成長結晶朝上方的移動(拉起速度降低),結 果並未緩和矽凝固時的體積膨脹所導致的應力而將矽熔液 壓縮,而產生熔液從容器的中央劇烈噴起而飛濺到容器外 的現象(矽熔液的噴起情形)。由於在成長過程產生噴起 情形,而妨礙了良好的結晶成長,並且讓昂貴的裝置構件 損壞。S 201229332 The container 1 1 and the top window of the bismuth ingot have been produced, and there has been no problem in the shape of the bismuth ingot. Further, in the obtained niobium ingot, the grain boundary was neat and compared with the niobium ingot produced by the casting method, and the grain boundary quality confirmed the effectiveness by the bubble method using the container 11 of the embodiment. In the first to fourth embodiments, the case where the inclined portion 1 is 20°, 30°', 45°, and 70° is shown, and the inclination angle 0 j can obtain the same result. When the tilt angle 0 was changed from 10 to 80 points, the results of the experiment were compared. It was confirmed that: in the case of 15 to 60°, the yield of the bismuth ingot taken out from the container was 0 to 45°, and the yield was the highest. Excellent. [Comparative Example] Fig. 4 is a view showing a crystal formed in Comparative Example 4. In Fig. 4, the 20-crystal growth apparatus 2 is added to the constituent element which is the same as or corresponding to the solid-length apparatus 1, and the crystal growth apparatus of the embodiment is a general straight-type container 21. In Comparative Examples 1 to 4, a ruthenium ingot was produced using the crystal growth apparatus 2. In the cylindrical container 21, a container having an inner diameter is used. The examples in which the amount of the raw material to be poured and the polycrystalline germanium are the same are the same. The weld of the circumference. The actual direction of the ingot splitting is more vertical. In the case where the inclination angle 0 of the crystal growth 1 b is 60°, the range of ° is also slightly higher at the inclination angle 0, and the slanting device is crystallized into a pattern number. The difference in the knot 1 is the growth condition of 125 mm by the bubble method, etc., and -17-201229332. In Comparative Example 1, the container is caught in the crystal pulling up, and the volume continues to grow in this state, the volume The expansion stress concentrates on the bottom of the container and destroys the container. On the other hand, in the container 21 after the ingot was taken out, the mold release member 22 was not peeled off in the large half of the bottom surface and the side surface of the container 21, but there were many areas of the release member in the portion corresponding to the top of the crucible ingot. 22 disappeared in a face. This should be that when the vicinity of the surface of the crucible melt 27 is solidified, the polycrystalline crucible 28 which expands in the lateral direction intrudes into the demolding member 22 because the release member 22 is peeled off by the half-stretching in this state, and the polycrystalline compact is removed. It is placed on the container 21, so it is difficult to take out the bismuth ingot. In the case where the inclination angle of Comparative Example 2 is 8°, when the crystal is pulled up by the bubble generation method, although the crystal is not stuck to the container, the friction between the top side of the crucible ingot and the release member is severe, and it becomes difficult to take out. result. In the case of Comparative Example 3, the release member was cracked at the inclined portion of the container and the bent portion of the straight portion, so that the ingot was welded to the container at this portion, and it was difficult to take out the ingot. It should be that in the bent portion, the embrittled release member cannot withstand the volume expansion stress. In the production of the niobium ingot prepared in Comparative Example 4, as shown in Fig. 4, the polycrystalline crucible 28 invaded the mold release member 22 during the growth process to hinder the pulling operation. Further, the movement of the growth crystal upward is restricted (the pulling speed is lowered), and as a result, the stress caused by the volume expansion at the time of solidification is not moderated, and the crucible melt is compressed, and the melt is spattered from the center of the container and splashed. The phenomenon of going out of the container (the squirting of the melt). Due to the spouting process during the growth process, good crystal growth is hindered and expensive device components are damaged.

-18- S 201229332 綜合這些結果’判斷能將矽錠從容器毫無問題地取出 的傾斜角0 ,是在10°〜80°的範圍內的情況。 考慮到彎曲部分的脫模件容易剝離,橫方向的Si的 體積膨脹應力的話’了解傾斜角0在20°〜70°的情況更好 〇 以上雖然根據實施方式來具體說明本發明者所做的發 明,而本發明並不限定於上述實施方式,在不脫離其主旨 的範圍可進行變更。 例如在實施方式,雖然顯示以石英材料構成容器11 的情況,而能以石英、s i 3 N 4、S i C、石墨、氧化鋁的任何 一種所構成的材料或將兩種以上組合成的材料所構成。 而例如藉由容器1 1,以傾斜部1 1 b將矽凝固時的體 積膨脹所伴隨產生的應力予以分散,所以在藉由鑄造法製 造矽錠時也有效。在藉由鑄造法來製造矽錠的情況,也只 要讓砂溶液的表面位於傾斜部lib即可。即使容器11的 形狀由圓筒狀改爲方筒狀,也能得到與實施例1〜4、比 較例1〜4同樣的結果。 本次所揭示的實施方式其所有觀點都是舉例,並不是 加以限制。本發明的範圍並不是以上述說明而是以申請專 利範圍所揭示,代表包含與申請專利範圍相等的意義及範 圍內所有的變更。 【圖式簡單說明】 第1圖是適用本發明的矽錠製造用容器的剖面圖。 -19 - 201229332 第2圖是適用本發明的使用矽錠製造用容器的結晶成 長裝置的一個例子的顯示圖。 第3圖是使用實施方式的結晶成長裝置時的多晶矽的 成長過程的顯示圖。 第4圖是使用一般的直體型的矽錠製造用容器的結晶 成長裝置的顯示圖。 第5圖是使用習知的傾斜型容器時所產生的損失的顯 示圖。 第6圖是在本發明的實施方式所使用的矽錠製造用容 器側壁的剖面(a)、從容器上部朝向底壁面觀察時的容 器形狀的例子(方筒狀容器(b)、圓筒狀容器(c))、 以及其適當的厚度或長度的槪要說明圖。 【主要元件符號說明】 1 :結晶成長裝置 Π :矽錠製造用容器 1 1 a :側面上部 1 1 b :側面中部(傾斜部) 1 1 c :側面下部(直體部) 1 2 :脫模件 13 :承座 1 4 :加熱器 1 5 :結晶拉起軸 1 6 :種晶-18- S 201229332 Combining these results' The inclination angle 0 at which the bismuth ingot can be taken out from the container without any problem is in the range of 10° to 80°. In view of the fact that the release member of the curved portion is easily peeled off, and the volume expansion stress of Si in the lateral direction is 'inferior to the case where the inclination angle 0 is 20° to 70°, more preferably, the inventors have specifically explained what has been done by the inventors according to the embodiment. The invention is not limited to the embodiments described above, and may be modified without departing from the spirit and scope of the invention. For example, in the embodiment, a material composed of quartz, si 3 N 4 , Si C , graphite, or alumina or a combination of two or more types may be used as the case where the container 11 is made of a quartz material. Composition. Further, for example, the container 1 1 disperses the stress caused by the expansion of the volume when the crucible is solidified by the inclined portion 1 1 b, and is therefore effective also when the crucible is produced by the casting method. In the case of producing a bismuth ingot by a casting method, it is only necessary to allow the surface of the sand solution to be located at the inclined portion lib. Even when the shape of the container 11 was changed from a cylindrical shape to a rectangular tube shape, the same results as in the examples 1 to 4 and the comparative examples 1 to 4 were obtained. All of the ideas of the embodiments disclosed herein are examples and are not intended to be limiting. The scope of the present invention is defined by the scope of the claims and the scope of the claims BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a container for manufacturing a bismuth ingot to which the present invention is applied. -19 - 201229332 Fig. 2 is a view showing an example of a crystal growth apparatus using a container for producing an ingot in the present invention. Fig. 3 is a view showing a growth process of polycrystalline silicon when the crystal growth apparatus of the embodiment is used. Fig. 4 is a view showing a crystal growth apparatus using a general straight type ingot manufacturing container. Fig. 5 is a view showing the loss generated when a conventional tilt type container is used. Fig. 6 is a cross-sectional view (a) of a side wall of a container for manufacturing a ruthenium ingot according to an embodiment of the present invention, and an example of a shape of a container when viewed from an upper portion of the container toward a bottom wall surface (square tubular container (b), cylindrical shape) A brief description of the container (c)), and its appropriate thickness or length. [Explanation of main component symbols] 1 : Crystal growth device Π : Container for manufacturing enamel ingot 1 1 a : Side upper portion 1 1 b : Side middle portion (inclined portion) 1 1 c : Side lower portion (straight body portion) 1 2 : Release Item 13: Seat 1 4 : Heater 1 5 : Crystal pull-up shaft 1 6 : Seed crystal

S -20- 201229332 1 7 :矽熔液 1 8 :多晶砂 0 :傾斜角 -21 -S -20- 201229332 1 7 : 矽 melt 1 8 : polycrystalline sand 0 : tilt angle -21 -

Claims (1)

201229332 七、申請專利範圍: 1. 一種矽錠製造用容器,是上面開口的有底筒狀的 矽錠製造用容器,其用來使矽錠熔液凝固而使多晶矽成長 :其特徵爲: 該容器的側壁,是由: 鉛直地形成的側面下部; 與該側面下部連接設置而傾斜成相對於鉛直方向以預 定的傾斜角0朝向上面開口部擴張的側面中部; 以及鉛直地與該側面中部連接設置的側面上部所構成 〇 2- 如申請專利範圍第1項的矽錠製造用容器,其中 上述傾斜角0爲10〜80°。 3- 如申請專利範圍第2項的矽錠製造用容器,其中 上述傾斜角0爲1 5〜6 0 °。 4.如申請專利範圍第2項的矽錠製造用容器,其中 上述傾斜角0爲20〜70°。 5 ·如申請專利範圍第2項的矽錠製造用容器,其中 上述傾斜角0爲20〜45°。 6-如申請專利範圍第1〜5項其中任一項的矽錠製造 用容器,其是以石英、· Si3N4、SiC、石墨、氧化鋁的任何 一種所·構成的材料或將兩種以上組合成的材料所構成。 7.—種矽錠的製造方法,其特徵爲: 對申請專利範圍第1〜6項其中任一項記載的矽錠製 造用容器,將矽原料投入讓矽熔液的表面位於上述傾斜部 -22- S 201229332 使上述矽熔液凝固而使多晶矽成長。 8. 如申請專利範圍第7項的矽錠的製造方法,其中 使種晶接觸於上述矽熔液的表面, 一邊將上述種晶拉起一邊使上述矽熔液從表面凝固而 使多晶矽成長。 9. 如申請專利範圍第8項的矽錠的製造方法,其中 以與上述矽熔液凝固時的體積膨脹因應之速度’將上述種 晶拉起。 -23-201229332 VII. Patent application scope: 1. A container for manufacturing an antimony ingot, which is a bottomed cylindrical ingot manufacturing container for opening, which is used for solidifying a crucible ingot to grow polycrystalline crucible: characterized by: The side wall of the container is: a lower portion of the side surface formed vertically; a side portion of the side surface connected to the lower portion of the side surface and inclined to expand toward the upper opening portion at a predetermined inclination angle 0 with respect to the vertical direction; and vertically connected to the middle portion of the side surface The above-mentioned side upper portion constitutes a crucible 2 - a container for manufacturing an antimony ingot according to the first aspect of the patent application, wherein the inclination angle 0 is 10 to 80°. 3- Container for manufacturing an antimony ingot according to item 2 of the patent application, wherein the inclination angle 0 is 1 5 to 60 °. 4. The container for manufacturing an antimony ingot according to the second aspect of the invention, wherein the inclination angle 0 is 20 to 70°. 5. The container for manufacturing an antimony ingot according to the second aspect of the invention, wherein the inclination angle 0 is 20 to 45°. The container for producing an antimony ingot according to any one of claims 1 to 5, which is a material composed of any one of quartz, Si3N4, SiC, graphite, and alumina, or a combination of two or more thereof. Made up of materials. A method for producing a bismuth ingot, which is characterized in that: in the container for manufacturing a bismuth ingot according to any one of claims 1 to 6, the ruthenium raw material is placed on the surface of the sputum-melting liquid at the inclined portion - 22- S 201229332 The above-mentioned cerium melt is solidified to grow polycrystalline germanium. 8. The method for producing a niobium ingot according to claim 7, wherein the seed crystal is brought into contact with the surface of the niobium melt, and the crucible is solidified from the surface while the seed crystal is pulled up to grow the polycrystalline crucible. 9. The method of producing an antimony ingot according to claim 8, wherein the seed crystal is pulled up at a speed corresponding to a volume expansion at which the crucible melt is solidified. -twenty three-
TW100133444A 2010-09-16 2011-09-16 A crystal growth apparatus, and a method of manufacturing a silicon ingot TWI539042B (en)

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