TWI565657B - Containers for silicon ingots - Google Patents

Containers for silicon ingots Download PDF

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TWI565657B
TWI565657B TW100136467A TW100136467A TWI565657B TW I565657 B TWI565657 B TW I565657B TW 100136467 A TW100136467 A TW 100136467A TW 100136467 A TW100136467 A TW 100136467A TW I565657 B TWI565657 B TW I565657B
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container
release material
ingot
less
sic
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TW201228934A (en
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Akira Yoshizawa
Takayuki Shimizu
Toshiaki Asahi
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Jx Nippon Mining & Metals Corp
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/02Silicon
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/56Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides
    • C04B35/565Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbides or oxycarbides based on silicon carbide
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/584Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on silicon nitride
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    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B38/00Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00939Uses not provided for elsewhere in C04B2111/00 for the fabrication of moulds or cores
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/72Products characterised by the absence or the low content of specific components, e.g. alkali metal free alumina ceramics

Description

矽錠製造用容器 矽Ingot manufacturing container

本發明係關於用來製造太陽電池等級的矽錠之矽錠製造用容器。 The present invention relates to a container for manufacturing an antimony ingot for use in the manufacture of a solar cell grade crucible.

以往以來,作為使用於太陽電池等之矽錠的製造方法,將矽熔化液收容於石墨製或石英製的容器(甘堝、鑄模等)中,從下方使此矽熔化液凝固而讓矽多結晶成長之鑄造(cast)法為眾所皆知。 In the past, as a method for producing a niobium ingot used in a solar cell or the like, the niobium melt is contained in a container made of graphite or quartz (such as a sorghum, a mold, or the like), and the crucible melt is solidified from below to allow the crucible to be solidified. The casting method of crystal growth is well known.

若依據此鑄造法,因在矽熔化液凝固時可使結晶成長的方向朝向一致,所以,能夠製造抑制了晶界之比抵抗增大的良質晶圓。又,若依據鑄造法,亦可進行矽錠的大量生產。 According to this casting method, since the direction in which crystal growth progresses can be made uniform when the crucible melt is solidified, it is possible to manufacture a good quality wafer in which the ratio resistivity of the grain boundary is suppressed. Moreover, if the casting method is used, mass production of the bismuth ingot can also be carried out.

一般,在用於鑄造法之容器的內面,形成有脫模材。在藉由鑄造法製造矽錠之情況,當在容器內使矽熔化液凝固時,一旦矽與容器材料產生反應,則,矽結晶會固定接著於容器,變得不易取出錠。因此,藉由在容器的內面形成脫模材,來讓矽結晶不會與容器直接接觸。作為這樣的脫模材,一般使用氮化矽(Si3N4)、二氧化矽(SiO2)、或或這些的混合物。 Generally, a release material is formed on the inner surface of the container used for the casting method. In the case where the crucible is produced by the casting method, when the crucible melt is solidified in the container, once the crucible reacts with the container material, the crucible crystal is fixed to the container, and it becomes difficult to take out the ingot. Therefore, by forming a release material on the inner surface of the container, the ruthenium crystal is not directly in contact with the container. As such a release material, tantalum nitride (Si 3 N 4 ), cerium oxide (SiO 2 ), or a mixture of these is generally used.

在使由Si3N4等所構成的脫模材形成於容器內面之情況,會採用下述方法,即,將對Si3N4粉末混合聚乙烯醇等的黏結劑所製作之水系漿體塗佈在容器內面,然後在氧 環境下進行燒成之方法。 In the case where a release material composed of Si 3 N 4 or the like is formed on the inner surface of the container, a method of mixing a Si 3 N 4 powder with a binder such as polyvinyl alcohol is used. The body is coated on the inner surface of the container and then fired in an oxygen atmosphere.

關於此Si3N4,眾所皆知的特性為燒結性(當將固體粉末的集合體以較融點低的溫度進行加熱時會凝固,而成為被稱為燒結體之緻密物體的性質)低,且在未添加金屬不純物等的燒結輔助劑之情況,其強度低並脆弱。因此,由形成於容器內面之Si3N4燒結體所構成的脫模材,在矽錠的製造製程(矽熔化液的保持時、結晶成長時、自容器取出時),其受損的可能性高。 Regarding this Si 3 N 4 , a well-known characteristic is sinterability (the solidification of a solid powder assembly when it is heated at a lower melting point, and becomes a dense object called a sintered body) It is low and is low in strength and fragile in the case where a sintering aid such as a metal impurity is not added. Therefore, the release material consisting of the sintered body of Si 3 N 4 formed on the inner surface of the container is damaged in the manufacturing process of the bismuth ingot (when the mash is held, the crystal grows, and is taken out from the container) High probability.

例如,矽熔化液的密度為2.5g/cm3,但由於其固體密度為2.33g/cm3,故,當在容器內使矽熔化液凝固時,大約7%體積會產生膨脹。當伴隨此矽凝固時的體積膨脹,在容器產生過度的應力時,會造成脫模材損壞。 For example, the density of the cerium melt is 2.5 g/cm 3 , but since the solid density is 2.33 g/cm 3 , about 7% of the volume expands when the cerium melt is solidified in the vessel. When the volume expansion occurs as the crucible solidifies, the release material is damaged when the container is subjected to excessive stress.

又,當在一連串的矽錠的製造製程中脫模材損壞時,則,由於會有體積膨脹應力殘留在所產生之矽錠上,故,會造成轉移的增加等之結晶品質降低。就算矽錠未破損,也無法避免結晶品質降低。 Further, when the release material is damaged in the manufacturing process of a series of bismuth ingots, since the volume expansion stress remains on the generated ruthenium ingot, the crystal quality such as an increase in the transfer is lowered. Even if the ingot is not broken, the crystal quality cannot be prevented from being lowered.

又,當在結晶成長中,脫模材損壞時,由於矽結晶會與容器接觸並固定接著,故,不僅造成矽錠的取出性更惡化,且會有剝離後的脫模材混入到矽錠,導致結晶性降低。且,因無法將容器進行再利用,所以會成為製造成本提高之原因。 Further, when the release material is damaged during the growth of the crystal, since the ruthenium crystal is brought into contact with the container and fixed, the detachment of the bismuth ingot is deteriorated, and the release material after the detachment is mixed into the bismuth ingot. , resulting in a decrease in crystallinity. Moreover, since the container cannot be reused, the manufacturing cost is increased.

因此,期望開發出具有良好的脫模性,並且在矽錠的製造製程,能夠防止脫模材損壞之情況產生的矽錠製造用容器。 Therefore, it has been desired to develop a container for manufacturing a bismuth ingot which has good mold release property and can prevent the damage of the release material in the manufacturing process of the bismuth ingot.

例如,在專利文獻1~3,揭示有將Si3N4、SiO2、或這些材料的混合物層積,用以將脫模材作成為多層構造之技術。又,在專利文獻4,5,揭示有將樹脂混入到Si3N4等的脫模材之技術技術。又,在專利文獻6,7,揭示有形成以氮化鋁(AlN)或二氧化鈰(CeO2),氧化釔(Y2O3)作為燒結輔助劑之脫模材的技術。如此,在脫模材形成製程添加金屬氧化物、碳之技術,為一般用來將脫模材予以強固化之方法。 For example, Patent Documents 1 to 3 disclose a technique in which Si 3 N 4 , SiO 2 , or a mixture of these materials is laminated to form a release material into a multilayer structure. Further, Patent Documents 4 and 5 disclose a technique of mixing a resin into a release material such as Si 3 N 4 . Further, Patent Documents 6 and 7 disclose a technique of forming a release material using aluminum nitride (AlN), cerium oxide (CeO 2 ), and cerium oxide (Y 2 O 3 ) as a sintering aid. Thus, the technique of adding metal oxide and carbon in the mold release forming process is a method generally used for strongly curing the release material.

[專利文獻1]日本特開2003-313023號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2003-313023

[專利文獻2]日本特表2007-534590號公報 [Patent Document 2] Japanese Patent Publication No. 2007-534590

[專利文獻3]日本特開2006-327912號公報 [Patent Document 3] Japanese Laid-Open Patent Publication No. 2006-327912

[專利文獻4]日本特開2006-218537號公報 [Patent Document 4] Japanese Patent Laid-Open Publication No. 2006-218537

[專利文獻5]日本特開2007-191345號公報 [Patent Document 5] Japanese Patent Laid-Open Publication No. 2007-191345

[專利文獻6]日本特開2008-230932號公報 [Patent Document 6] Japanese Patent Laid-Open Publication No. 2008-230932

[專利文獻7]日本特開平7-206419號公報 [Patent Document 7] Japanese Patent Laid-Open No. Hei 7-206419

[非專利文獻1]Journal of Crystal Growth 79 (1986), 583-589 [Non-Patent Document 1] Journal of Crystal Growth 79 (1986), 583-589

但,在形成含有金屬氧化物、碳等之脫模材的情況,在脫模材漿體燒成製程,產生碳化矽(SiC)。又,所產生之SiC會混入到矽錠而析出至結晶晶界,不僅造成錠之品質降低,且亦會成為將矽錠加工成晶圓時之障礙。 However, in the case of forming a release material containing a metal oxide or carbon, cerium carbide (SiC) is generated in the release process of the release material slurry. Further, the generated SiC is mixed into the bismuth ingot and precipitated to the crystal grain boundary, which not only causes a decrease in the quality of the ingot, but also becomes a hindrance when the bismuth ingot is processed into a wafer.

又,含於脫模材漿體之金屬氧化物、碳等會成為使容器劣化之原因。例如,由於形成於石墨製的容器內面之脫模材,會因碳化(SiC化)變得容易剝離成膜狀,故,不僅脫模性不充分,且亦會使石墨容器消耗。 Further, the metal oxide, carbon, and the like contained in the mold release slurry may cause deterioration of the container. For example, since the release material formed on the inner surface of the graphite container is easily peeled off into a film shape by carbonization (SiC formation), not only the mold release property is insufficient, but also the graphite container is consumed.

再者,為了提升脫模材的強度,一般會在漿體中添加作為燒結輔助劑之二氧化矽(例如非專利文獻1),但,在為石墨製容器的情況,由於容器材料之石墨會與二氧化矽產生反應,故,會加速上述問題產生。 In addition, in order to increase the strength of the release material, cerium oxide as a sintering aid is generally added to the slurry (for example, Non-Patent Document 1). However, in the case of a graphite container, the graphite of the container material may be It reacts with cerium oxide, so it accelerates the above problems.

另外,當在石英製的容器內面形成脫模材之情況時,在漿體燒成製程,雖未產生脫模材及容器材料劣化之問題,但,由於在結晶成長時的高溫下,容器產生劣化、變形,故,其結果,無法有效地防止脫模材及容器的損壞。 Further, when a release material is formed on the inner surface of a container made of quartz, the slurry is not subjected to the problem of deterioration of the release material and the container material in the slurry baking process, but the container is high in temperature at the time of crystal growth. Deterioration and deformation occur, and as a result, damage to the release material and the container cannot be effectively prevented.

又,在專利文獻1~3所記載的技術,由於將脫模材作成為多層構造,故,在脫模材的形成上花費工時與成本。在專利文獻4~7所記載的技術,雖脫模材的強度高、不易損壞,但,會有含於脫模材之樹脂、金屬等的不純物混入到矽錠,造成結晶品質降低之虞。例如,含於脫模材及容器之金屬氧化物,在脫模材形成製程中,作為生成SiC之觸媒來發揮作用。所生成之SiC會成為熔化液面浮遊物,妨礙柴可斯基(Czochralski)法、凱氏長晶(Kyropoulos)法等的結晶拉晶所進行之單結晶化。 Further, in the techniques described in Patent Documents 1 to 3, since the release material has a multilayer structure, it takes time and cost to form the release material. In the techniques described in Patent Documents 4 to 7, the release material is high in strength and is not easily damaged. However, impurities such as a resin or a metal contained in the release material are mixed into the crucible, and the crystal quality is lowered. For example, the metal oxide contained in the release material and the container functions as a catalyst for forming SiC in the process of forming the release material. The generated SiC becomes a molten liquid floating matter, and hinders single crystallization by crystal pulling of a Czochralski method or a Kyropoulos method.

本發明係為了解決前述課題而開發完成的發明,其目的係在於提供能夠反復地使用於多結晶矽錠的製造之矽錠的矽錠製造用容器。 The present invention has been made in order to solve the above problems, and an object of the invention is to provide a container for producing a ruthenium ingot which can be repeatedly used in the production of a polycrystalline ruthenium ingot.

請求項1所記載的發明的矽錠製造用容器,係用來讓矽熔化液凝固而使矽多結晶成長之矽錠製造用容器,其特徵為, 在由以氮化矽或碳化矽形成且開氣孔率為10%以上40%以下的多孔質體所構成的容器本體的內面,形成有由氮化矽所構成且厚度為300~1000μm的脫模材。 The container for producing an antimony ingot according to the invention of the first aspect of the invention is a container for producing an ingot in which a crucible melt is solidified to grow polycrystalline crystals, and is characterized in that In the inner surface of the container body composed of a porous body formed of tantalum nitride or tantalum carbide and having an open porosity of 10% or more and 40% or less, a thickness of 300 to 1000 μm is formed by tantalum nitride. Mold material.

在此,開氣孔率係指與外部連通的空孔之容積對多孔質體的表觀上容積的總和之比例。 Here, the open porosity refers to the ratio of the volume of the pores communicating with the outside to the sum of the apparent volumes of the porous bodies.

請求項2所記載的發明係如請求項1所記載的矽錠製造容器,其中,前述多孔質體的開氣孔率為20%以上30%以下。 The invention of claim 2, wherein the porous body has an open porosity of 20% or more and 30% or less.

請求項3所記載的發明係如請求項1所記載的矽錠製造容器,其中,由前述氮化矽的多孔質體所構成之容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為1000ppm以下。 The invention of claim 3, wherein the metal ingot of the container body composed of the porous body of the tantalum nitride (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni, W, V, Zn, and Zr) are each 1000 ppm or less.

請求項4所記載的發明係如請求項3所記載的矽錠製造容器,其中,由前述碳化矽的多孔質體所構成之容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為10ppm以下。 The invention according to claim 3, wherein the metal ingot of the container body composed of the porous body of the niobium carbide (Fe, Al, Mn, Mg, Ca, Cu) Ti, Cr, Ni, W, V, Zn, and Zr) are each 10 ppm or less.

請求項5所記載的發明係如請求項1至3中任一項之 所記載的矽錠製造容器,其中,由前述碳化矽的多孔質體所構成之容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為100ppm以下,期望為10ppm以下。 The invention recited in claim 5 is as claimed in any one of claims 1 to 3 The crucible ingot production container described above, wherein the metal impurities of the container body composed of the porous body of the niobium carbide (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni, W, V, Zn) Zr) is 100 ppm or less, and desirably 10 ppm or less.

請求項6所記載的發明係如請求項5所記載的矽錠製造容器,其中,由前述碳化矽的多孔質體所構成之容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為10ppm以下。 The invention according to claim 5, wherein the metal ingot of the container body composed of the porous body of the niobium carbide (Fe, Al, Mn, Mg, Ca, Cu) Ti, Cr, Ni, W, V, Zn, and Zr) are each 10 ppm or less.

請求項7所記載的發明係如請求項1至6中任一項所記載的矽錠製造容器,其中,前述脫模材的厚度為350~600μm。 The invention according to any one of claims 1 to 6, wherein the release material has a thickness of 350 to 600 μm.

若依據本發明,因具有良好的脫模性之脫模材強固地形成於容器本體的內面,所以,能有效地防止因伴隨矽凝固時的體積膨脹引起之應力造成脫模材損壞之情況產生。因此,能夠反復地使用於矽錠的製造,並且能良品率佳地製造具有良好的品質之矽錠。 According to the present invention, since the release material having good mold release property is strongly formed on the inner surface of the container body, it is possible to effectively prevent the damage of the release material due to the stress caused by the volume expansion at the time of solidification of the crucible. produce. Therefore, it can be used repeatedly in the manufacture of the bismuth ingot, and the bismuth ingot having a good quality can be manufactured with good yield.

以下,依據圖面詳細地說明本發明的實施形態。 Hereinafter, embodiments of the present invention will be described in detail based on the drawings.

圖1係適用本發明的矽錠製造用容器的斷面圖。如圖1所示,實施形態之矽錠製造用容器(以下,稱為容器) 10具備:具有耐熱性之容器本體11;及為了提升所生成之矽錠的脫模性,而形成在容器本體11的內面之脫模材12。 Fig. 1 is a cross-sectional view showing a container for manufacturing a bismuth ingot to which the present invention is applied. As shown in Fig. 1, a container for manufacturing an ingot (hereinafter referred to as a container) of the embodiment 10 includes: a container body 11 having heat resistance; and a release material 12 formed on the inner surface of the container body 11 in order to improve the release property of the produced ruthenium ingot.

容器本體11係以Si3N4或SiC的多孔質體(多孔材)所構成。容器本體11的厚度係為在成形時不會產生翹曲程度,例如5mm以上。 The container body 11 is made of a porous body (porous material) of Si 3 N 4 or SiC. The thickness of the container body 11 is such that it does not cause warpage at the time of molding, for example, 5 mm or more.

容器本體11係藉由例如,將Si3N4或SiC粉末進行燒結成形所製作,其開氣孔率為10%以上40%以下。在構成容器本體11之多孔質體的開氣孔率未滿10%的情況,因氣泡殘留於脫模材12的內部,造成脫模材12脆弱化而變得容易破損。又,在開氣孔率超過40%的情況,會造成產生熔化液洩漏的可能性提高。因此,構成容器本體11之多孔質體的開氣孔率係作成10%以上40%以下為佳。 The container body 11 is produced by, for example, sintering Si 3 N 4 or SiC powder, and has an open porosity of 10% or more and 40% or less. When the porosity of the porous body constituting the container body 11 is less than 10%, the air bubbles remain in the interior of the mold release material 12, and the mold release material 12 is weakened and easily broken. Moreover, when the open porosity exceeds 40%, the possibility of leakage of the molten liquid increases. Therefore, the porosity of the porous body constituting the container body 11 is preferably 10% or more and 40% or less.

由Si3N4或SiC的多孔質成形體所構成之容器本體11,比起石英製的容器,其耐熱性佳、且在矽錠製造時的高溫化時,也不會劣化、變形。因此,當進行矽錠的製造時,能夠有效地防止因容器本體11的劣化、變形造成脫模材12損壞的情況產生。再者,在容器本體11由Si3N4的多孔質成形體所構成之情況,所含有的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為1000ppm以下,期望為10ppm以下。在容器本體11由SiC的多孔質整形體所構成的情況,金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為100ppm以下,期望為10ppm以下。 The container body 11 made of a porous molded body of Si 3 N 4 or SiC is excellent in heat resistance as compared with a container made of quartz, and does not deteriorate or deform at the time of high temperature during the production of the bismuth ingot. Therefore, when the production of the bismuth ingot is performed, it is possible to effectively prevent the occurrence of damage of the release material 12 due to deterioration or deformation of the container body 11. Further, when the container body 11 is composed of a porous molded body of Si 3 N 4 , the metal impurities (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni, W, V, and Zn and Zr) are each 1000 ppm or less, and desirably 10 ppm or less. When the container body 11 is made of a porous SiC shaped body, the metal impurities (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni, W, V, Zn, and Zr) are each 100 ppm or less. It is desirable to be 10 ppm or less.

藉由減少含於脫模材及容器之金屬氧化物,能夠在Si結晶成長中減少SiO氣體的產生量,能夠抑制含於脫模材及容器之碳與前述SiO氣體反應之SiC異物生成。藉此,因SiC異物變得不會浮游於熔化液面,所以,柴可斯基(Czochralski)法、凱氏長晶(Kyropoulos)法等的結晶拉晶所進行之單結晶化變得容易。又,即使在藉由鑄造法等製造Si多結晶時,因可預防SiC熔化液面浮遊物混入到結晶內,所以,其結果,使得Si結晶品質提升。 By reducing the metal oxide contained in the release material and the container, the amount of SiO gas generated can be reduced during the growth of the Si crystal, and the formation of SiC foreign matter in which the carbon contained in the release material and the container reacts with the SiO gas can be suppressed. As a result, since the SiC foreign matter does not float on the molten liquid surface, the single crystal formation by the crystal pulling of the Czochralski method or the Kyropoulos method becomes easy. Further, even when Si polycrystals are produced by a casting method or the like, since the SiC molten liquid surface floats can be prevented from being mixed into the crystals, the Si crystal quality is improved as a result.

脫模材12係由Si3N4的燒結體所構成。脫模材12係藉由將例如,對Si3N4粉末混合聚乙烯醇等的黏結劑所調製的水系漿體以刷毛、噴霧等塗佈於容器本體11的內面,在氧環境下或氬等不活性氣體環境下、700~1550℃進行燒成所形成。脫模材12的厚度為300~1000μm。在較300μm薄的情況,Si的體積膨脹應力緩和不充分,在結晶會產生裂痕。相反地在較1000μm厚的情況,在結晶成長中脫模材會破裂而成為熔化液面浮遊物,變得容易妨礙自熔化液面之單結晶化。當脫模材形成工序時,脫模材的期望厚度為300~600μm。 The release material 12 is composed of a sintered body of Si 3 N 4 . The release material 12 is applied to the inner surface of the container body 11 by bristles, sprays, or the like by, for example, applying an aqueous slurry prepared by mixing a Si 3 N 4 powder with a binder such as polyvinyl alcohol, in an oxygen atmosphere or It is formed by firing at 700 to 1550 ° C in an inert gas atmosphere such as argon. The release material 12 has a thickness of 300 to 1000 μm. In the case where it is thinner than 300 μm, the volume expansion stress of Si is not sufficiently alleviated, and cracks are formed in the crystal. On the other hand, in the case of a thickness of 1000 μm, the release material is broken during the growth of the crystal to become a molten surface float, and it is easy to hinder the single crystal from the molten liquid surface. When the release material forming step, the desired thickness of the release material is 300 to 600 μm.

塗佈於容器本體11之漿體,由於容器本體11以多孔質體所構成,故會逐漸朝容器本體11的氣孔浸透。又,利用以多孔質體所構成的容器本體11,將漿體內的氣泡加以脫泡。由於在此狀態下進行燒成,故,脫模材12強固地形成於容器本體11的內面。因此,當進行矽錠的製造時,能夠有效地防止脫模材12損壞。 The slurry applied to the container body 11 is gradually formed toward the pores of the container body 11 because the container body 11 is made of a porous body. Further, the bubble body in the slurry is defoamed by the container body 11 made of a porous body. Since the firing is performed in this state, the release material 12 is strongly formed on the inner surface of the container body 11. Therefore, when the manufacture of the niobium ingot is performed, the mold release material 12 can be effectively prevented from being damaged.

當氣泡殘留於脫模材12中時,由於因應殘留氣泡的數量、大小等,進行矽錠的製造時,會有脫模材12變得容易破損之傾向,故,以往以來,當在容器本體形成脫模材時,實施利用減壓等之脫泡處理。相對於此,在本實施形態的容器10的情況,當進行脫模材12的形成時不需要實施脫泡處理,即可簡單地形成脫模材12。 When the air bubbles remain in the mold release material 12, the mold release material 12 tends to be easily broken when the ruthenium ingot is produced in accordance with the number and size of the remaining air bubbles. Therefore, in the conventional container body, When the release material is formed, a defoaming treatment by a reduced pressure or the like is performed. On the other hand, in the case of the container 10 of the present embodiment, when the release material 12 is formed, it is not necessary to perform the defoaming treatment, and the release material 12 can be easily formed.

又,因脫模材12強固地形成於容器本體11的內面,所以,不需要如以往作成為多層構造。因此,不會增加在容器10製作上所耗費的工序與成本,亦可容易增加脫模材12的膜厚。 Further, since the mold release material 12 is strongly formed on the inner surface of the container body 11, it is not necessary to have a multilayer structure as in the related art. Therefore, the process and cost incurred in the production of the container 10 are not increased, and the film thickness of the release material 12 can be easily increased.

圖2係顯示使用實施形態的容器之結晶成長裝置的一例之圖。圖2所示的結晶成長裝置1係用於製造矽錠。在結晶成長裝置1,容器10被支承於石墨製的承受器13,在承受器13的外周配置有加熱器14。 Fig. 2 is a view showing an example of a crystal growth apparatus using a container according to an embodiment. The crystal growth apparatus 1 shown in Fig. 2 is used for producing a ruthenium ingot. In the crystal growth apparatus 1, the container 10 is supported by a graphite susceptor 13, and a heater 14 is disposed on the outer circumference of the susceptor 13.

在使用結晶成長裝置1,以鑄造法製造矽錠之情況,首先,將預定量的矽原料(例如矽熔化液)15投入至容器10。然後,藉由逐漸降溫,從容器10的熔化液面,使矽熔化液凝固,來讓矽多結晶15a成長,製造矽錠。 In the case where the ruthenium ingot is produced by the casting method using the crystal growth apparatus 1, first, a predetermined amount of ruthenium raw material (for example, ruthenium melt) 15 is supplied to the vessel 10. Then, by gradually lowering the temperature, the crucible melt is solidified from the molten liquid surface of the container 10, and the crucible polycrystal 15a is grown to produce a crucible.

在容器材料的開口氣孔率小的情況,脫模材變得容易剝離,在結晶成長中成為熔化液面浮遊物,妨礙自Si熔化液面之單結晶化。另外,在容器材料的開口氣孔率過大之情況,脫模材的厚成為300μm以下,脫模材之體積膨脹應力緩和變得不充分,在錠上確認到裂痕。下述表1顯示使用Si3N4甘堝之實驗結果。 When the opening porosity of the container material is small, the release material is easily peeled off, and becomes a molten liquid float during crystal growth, which hinders single crystal formation from the Si molten liquid surface. In addition, when the opening porosity of the container material is too large, the thickness of the release material is 300 μm or less, and the volume expansion stress relief of the release material is insufficient, and cracks are confirmed on the ingot. Table 1 below shows the experimental results using Si 3 N 4 kansui.

〔實施例1〕 [Example 1]

在開口氣孔率為10%的情況,以刷毛塗佈漿體時之氣泡會殘留,造成在表面產生大的凹陷,燒成後,產生多數以凹陷為起點之龜裂。雖可從容器取出錠,但,在容器底部的R部分(底壁與側壁之境界的彎曲部)有龜裂大的傾向,在從熔化液面所凝固之Si錠的底部確認到裂痕。 In the case where the opening porosity is 10%, the bubbles are left when the slurry is applied by the bristles, causing a large depression on the surface, and after the firing, most of the cracks originating from the depression are generated. Although the ingot can be taken out from the container, the R portion (the curved portion of the boundary between the bottom wall and the side wall) at the bottom of the container tends to have a large crack, and a crack is confirmed at the bottom of the Si ingot solidified from the molten liquid surface.

〔實施例2,3〕 [Examples 2, 3]

在開口氣孔率為20%與30%之情況,以刷毛塗佈漿體後氣泡不會殘留,即使將膜厚增加至600μm,也未確認到裂痕。在將形成有這樣脫模材的容器內,從Si熔融面予以凝固所製作之錠係呈無表面凹凸、裂痕等之平滑形態,容易從容器取出。 In the case where the opening porosity was 20% and 30%, the bubbles did not remain after the slurry was applied with the bristles, and even if the film thickness was increased to 600 μm, no crack was observed. In the container in which the mold release material is formed, the ingot obtained by solidifying from the Si molten surface is in a smooth form without surface irregularities, cracks, and the like, and is easily taken out from the container.

〔實施例4〕 [Example 4]

在開口氣孔率40%的情況,脫模材漿體之浸透大,不 易增厚脫模材。在脫模材的厚度較300μm小的情況,確認到在錠的底部表面產生凹凸之情況。雖可從容器取出錠,但,在容器底部的R部分,確認到錠產生裂痕。 In the case of an open porosity of 40%, the impregnation of the release material slurry is large, Easy to thicken the release material. When the thickness of the release material was smaller than 300 μm, it was confirmed that irregularities were generated on the bottom surface of the ingot. Although the ingot can be taken out from the container, it is confirmed that the ingot is cracked in the R portion at the bottom of the container.

〔比較例1〕 [Comparative Example 1]

在開口氣孔率超過40%之情況,雖在脫模材未確認到裂痕,但,不易增厚膜厚。當在容器內,從Si熔化液面進行凝固時,自底部產生熔化液洩漏。這是由於結晶下部的熔化液被壓縮,造成熔化液浸透到細孔部分之故。 When the open porosity was more than 40%, cracks were not observed in the release material, but it was difficult to increase the thickness. When solidified from the surface of the Si melt in the vessel, a melt leak occurs from the bottom. This is because the molten liquid in the lower portion of the crystal is compressed, causing the molten liquid to permeate into the pore portion.

〔比較例2〕 [Comparative Example 2]

在開口氣孔率未滿10%之情況,脫模材漿體在容器材料上不易濕潤,容易殘留有以刷毛塗佈漿體後之溝,因自漿體之發泡,造成全體凹凸劇烈產生,在燒成後產生裂痕。由於氣泡激烈使得脫模材變脆,故,不易將膜厚作成為400μm以上。當在這樣的容器使Si從熔化液面凝固時,容器與Si之一部分繃緊造成錠破裂。 When the open porosity is less than 10%, the release material slurry is not easily wetted on the container material, and the groove after coating the slurry with the bristles is likely to remain, and the entire unevenness is caused by the foaming of the slurry. A crack is formed after firing. Since the release material is brittle due to the intense air bubbles, it is difficult to make the film thickness 400 μm or more. When Si is solidified from the molten surface in such a container, the container and one of the Si portions are tightened to cause the ingot to break.

如以上所示,容器材料的開口氣孔率係與脫模材的厚度及有無裂痕相關連。Si錠的脫模可能範圍係開口氣孔率10~40%,理想為20~30%。 As indicated above, the open porosity of the container material is related to the thickness of the release material and the presence or absence of cracks. The release range of the Si ingot may range from 10 to 40%, preferably from 20 to 30%.

〔實施例5〕 [Example 5]

在圖1的結晶成長裝置1,使用於頂部內徑:68.2mm,下部內徑:36mm,深度:48mm,厚度:2mm、 且全金屬不純物(Na,Ca,Al,Cr,Cu,Fe,Ni,Ti,W,V,Zn,Zr)分別為10ppm以下之SiC容器本體(開氣孔率:20%)11的內面形成有厚度350~600μm的脫模材12之容器10,使Si熔融後,再從熔化液面固化。 The crystal growth apparatus 1 of Fig. 1 is used for the top inner diameter: 68.2 mm, the lower inner diameter: 36 mm, the depth: 48 mm, and the thickness: 2 mm. And the inner surface of the SiC container body (opening porosity: 20%) 11 of all metal impurities (Na, Ca, Al, Cr, Cu, Fe, Ni, Ti, W, V, Zn, Zr) of 10 ppm or less, respectively. The container 10 having the release material 12 having a thickness of 350 to 600 μm is melted and then solidified from the surface of the melt.

具體而言,在容器10內收容100g的矽原料,在氬環境1atm下升溫至1550℃,讓矽熔解。在後,以10℃/min將加熱器進行降溫。 Specifically, 100 g of the ruthenium raw material was placed in the container 10, and the temperature was raised to 1,550 ° C in an argon atmosphere at 1 atm to melt the ruthenium. Thereafter, the heater was cooled at 10 ° C/min.

〔實施例6,7〕 [Examples 6, 7]

在實施例6,在與實施例5相同規格的SiC容器內面形成脫模材後,在氬1atm下進行1550℃×12時間之前置烘烤後,以與實施例5相同的方法,進行矽的熔融凝固。 In Example 6, after the release material was formed on the inner surface of the SiC container of the same specification as in Example 5, it was baked at 1550 ° C for 12 hours under argon at 1 atm, and then, in the same manner as in Example 5, Melt solidification of the crucible.

在實施例7,頂部內徑:84.4mm,底部內徑:48mm,深度:48mm,厚度:10mm的尺寸、金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為10~1000ppm之Si3N4容器內面形成脫模材後,以與實施例5相同的方法進行矽的熔融凝固。這些結果顯示於表2。 In Example 7, the top inner diameter: 84.4 mm, the bottom inner diameter: 48 mm, the depth: 48 mm, the thickness: 10 mm, the metal impurities (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni, W) After the mold release material was formed on the inner surface of the Si 3 N 4 container having V, Zn, and Zr) of 10 to 1000 ppm, respectively, the melt solidification of the crucible was carried out in the same manner as in Example 5. These results are shown in Table 2.

在使用開口氣孔率20%的容器材料之實施例5,6,7,未確認到脫模材的剝離。所獲得的矽錠不會與容器10固定接著,僅將容器10上下顛倒即可容易取出。 In Examples 5, 6, and 7 using a container material having an open porosity of 20%, peeling of the release material was not confirmed. The obtained bismuth ingot is not fixed to the container 10, and the container 10 can be easily taken out only by turning it upside down.

在觀察矽錠的表面及製造後的容器10的內面時,確認到矽錠的表面極為平滑,在容器10的內面也沒有脫模材12損壞的痕跡。由於在將脫模材漿體塗佈於多孔質容器表面時,完全未產生氣泡,故,形成均等、高密度且強固的脫模材。藉此,矽錠體積膨脹成沿著脫模材12滑動,在脫模材12與矽錠之界面幾乎未產生摩擦,因此,能夠有效地緩和伴隨矽凝固時的體積膨脹所引起之應力。 When the surface of the crucible ingot and the inner surface of the container 10 after the production were observed, it was confirmed that the surface of the crucible ingot was extremely smooth, and there was no trace of damage of the release material 12 on the inner surface of the container 10. When the release material slurry is applied to the surface of the porous container, no bubbles are generated at all, so that a uniform, high-density, and strong release material is formed. Thereby, the volume of the crucible is expanded to slide along the release material 12, and almost no friction occurs at the interface between the release material 12 and the crucible, and therefore, the stress caused by the volume expansion at the time of solidification of the crucible can be effectively alleviated.

又,由於脫模材12及容器本體11未損壞,故,容器10可再利用,在矽錠的製造上能夠反復使用10次以上。 Moreover, since the mold release material 12 and the container main body 11 are not damaged, the container 10 can be reused, and it can be used repeatedly 10 times or more in manufacture of a bismuth ingot.

〔比較例3〕 [Comparative Example 3]

在比較例3,使用於石英製的容器本體的內面形成有與實施例相同的脫模材之容器,以與實施例相同的製造條件製造矽錠。 In Comparative Example 3, a container of the same release material as that of the embodiment was formed on the inner surface of a container body made of quartz, and a crucible ingot was produced under the same manufacturing conditions as in the examples.

比起實施例所獲得的矽錠,比較例所獲得的矽錠之凹凸大,特別是在錠上端側面與底部,變形顯著,在錠上產生裂痕破裂。由於剝離後的脫模材咬入到所取出的矽錠的具有凹凸之表面,故,因伴隨矽凝固時的體積膨脹及高溫之容器的熱變形所產生之應力,造成脫模材損壞,且由於矽錠的一部分與容器固定接著,故,在錠產生裂痕破裂。 又,在結晶成長中產生熔化液面浮遊物之SiC,會與成長中剝離的脫模材一同混入到矽錠中,造成矽錠的結晶品質惡化。 Compared with the bismuth ingot obtained in the examples, the bismuth ingot obtained in the comparative example had a large unevenness, particularly at the side and the bottom of the upper end of the ingot, and the deformation was remarkable, and crack cracking occurred on the ingot. Since the release material after peeling bites into the surface of the extracted bismuth ingot having irregularities, the release material is damaged due to the stress caused by the volume expansion during solidification of the crucible and the thermal deformation of the container at a high temperature, and Since a part of the bismuth ingot is fixed to the container, cracks are broken in the ingot. Further, SiC which generates a molten liquid floating matter during crystal growth is mixed into the bismuth ingot together with the release material which is peeled off during growth, and the crystal quality of the bismuth ingot is deteriorated.

〔比較例4〕 [Comparative Example 4]

在比較例4,在頂部內徑:84.4mm,底部內徑:48mm,深度:48mm,厚度:10mm的Si3N4容器內面形成脫模材後,在氬1atm下進行1550℃×12時間前置烘烤後,再以與實施例5相同的方法進行熔融凝固。 In Comparative Example 4, after forming a release material on the inner surface of the Si 3 N 4 container having a top inner diameter: 84.4 mm, a bottom inner diameter: 48 mm, a depth of 48 mm, and a thickness of 10 mm, 1550 ° C × 12 time was performed at 1 atm of argon. After the prebaking, the melt solidification was carried out in the same manner as in Example 5.

當打開爐取出容器時得知,Si熔化液從容器底漏出。雖Si在脫模材濕潤擴散分佈,但未從側面洩漏。這應該是因從熔化液面使Si固化,所以,在容器底部被壓縮的熔化液透過多孔質材料之故。 When the furnace was taken out of the vessel, it was found that the Si melt leaked from the bottom of the vessel. Although Si is diffused and diffused in the release material, it does not leak from the side. This should be because the Si is solidified from the surface of the molten metal, so that the molten liquid compressed at the bottom of the container passes through the porous material.

在實施例5,6之SiC容器的情況,雖在結晶成長中未產生有熔化液面浮遊物,但,在實施例7之Si3N4的情況,產生大量之SiC浮遊物。當產生大量SiC浮遊物時,大量的SiO亦附著至爐壁。SiO會與殘留於脫模材之碳產生反應而產生SiC。 In the case of the SiC containers of Examples 5 and 6, although the molten liquid float was not generated during the crystal growth, in the case of Si 3 N 4 of Example 7, a large amount of SiC float was generated. When a large amount of SiC float is produced, a large amount of SiO is also attached to the furnace wall. SiO reacts with carbon remaining in the release material to produce SiC.

將比較Si結晶中的金屬不純物濃度之結果顯示於以下的表3。 The results of comparing the metal impurity concentrations in the Si crystal are shown in Table 3 below.

如實施例5,6,當在非燒結法、而是使用轉化法所製造之低金屬不純物SiC(POCO製)容器內製作Si錠時,比起如實施例7在以燒結法所製作的Si3N4容器製作Si錠時,能夠減少殘留於Si中之金屬不純物。藉由在結晶成長製程前對形成有脫模材的容器進行前置烘烤,能夠減低Fe,Al,Ca,Cu,Cr等的金屬不純物。又,在金屬不純物濃度更小之SiC容器的情況,確認到未產生熔化液面浮遊物之SiC。 As in Examples 5 and 6, when a Si ingot was produced in a low-metal impurity SiC (POCO) container manufactured by a non-sintering method using a conversion method, Si produced by a sintering method as in Example 7 When a Si ingot is produced in a 3 N 4 container, metal impurities remaining in Si can be reduced. By pre-baking the container in which the release material is formed before the crystal growth process, metal impurities such as Fe, Al, Ca, Cu, Cr, etc. can be reduced. Moreover, in the case of the SiC container in which the metal impurity concentration was smaller, it was confirmed that SiC which does not generate a molten surface float was confirmed.

在比較例4,從前置烘烤前後的包含脫模材的容器重量之差與前置烘烤時間得知,容器重量減少速率為0.2Wt%/h。在前置烘烤後,大量的SiO附著在爐內。在以相同條件進行前置烘烤後的低金屬不純物之SiC容器的情況(實施例6),並未確認到重量減少、及結晶成長中之SiO的大量產生。因此,會有含有大量的SiO2及金屬氧化物之Si3N4容器本體及鄰接之Si3N4脫模材作為SiO被熱分解之可能性。即,由於被SiO2所覆蓋之脫模材的Si3N4粒子的燒結性在前置烘烤中降低,故,在比較例4產生熔化液洩漏。 In Comparative Example 4, the difference in the weight of the container containing the release material before and after the pre-baking and the pre-baking time were found to be 0.2 Wt%/h. After the prebaking, a large amount of SiO is attached to the furnace. In the case of the SiC container of the low-metal impurity after the pre-baking under the same conditions (Example 6), the weight reduction and the large amount of SiO in the crystal growth were not confirmed. Therefore, there is a possibility that the Si 3 N 4 container body containing a large amount of SiO 2 and a metal oxide and the adjacent Si 3 N 4 release material are thermally decomposed as SiO. That is, since the sinterability of the Si 3 N 4 particles of the release material covered with SiO 2 was lowered in the prebaking, the melt leakage occurred in Comparative Example 4.

如前述,實施形態的容器10係在Si3N4或SiC的多孔質體所構成的容器本體11的內面形成有以Si3N4所構成的脫模材12。又,構成容器本體11之多孔質體的開氣孔率為10%以上40%以下,期望為20%以上、未滿40%。 As described above, in the container 10 of the embodiment, the mold release material 12 made of Si 3 N 4 is formed on the inner surface of the container body 11 made of a porous body of Si 3 N 4 or SiC. Moreover, the porosity of the porous body constituting the container body 11 is 10% or more and 40% or less, and is desirably 20% or more and less than 40%.

在此容器10,因具有良好的脫模性之脫模材12強固地形成於容器本體11的內面,所以,能有效地防止因伴隨矽凝固時的體積膨脹引起之應力脫模材12損壞產生。 In this container 10, since the release material 12 having a good mold release property is strongly formed on the inner surface of the container body 11, it is possible to effectively prevent the stress release material 12 from being damaged due to volume expansion accompanying solidification of the crucible. produce.

又,藉由將以轉化法所製造的低金屬不純物的多孔質SiC作為容器材料來使用,比起以往的使用以燒結法所製作之Si3N4容器的情況,能夠製造含有極少的金屬不純物之Si錠。且,在使用前述SiC容器之情況,以較前述Si3N4容器更高溫的條件進行前置烘烤,能夠減低Si錠中的金屬不純物。藉由將以低金屬不純物容器作為Si錠製造用容器來使用,能夠抑制SiC異物混入到熔化液內。 Moreover, by using the porous SiC of the low-metal impurity produced by the conversion method as a container material, it is possible to produce a metal impurity containing a very small amount compared to the conventional Si 3 N 4 container produced by the sintering method. Si ingots. Further, in the case of using the SiC container described above, the pre-baking is performed at a higher temperature than the Si 3 N 4 container, and the metal impurities in the Si ingot can be reduced. By using a container having a low metal impurity as a container for manufacturing an ingot, it is possible to suppress the incorporation of SiC foreign matter into the melt.

因此,能夠反復地使用於矽錠的製造,並且能夠製造具有良好的品質之矽錠。 Therefore, it can be used repeatedly for the manufacture of a bismuth ingot, and it can manufacture the bismuth ingot of the favorable quality.

以上,依據實施形態具體地說明了本發明者所開發出的發明,但,本發明不限於前述實施形態,在不超出其技術思想範圍下可進行各種變更。 The invention developed by the inventors of the present invention has been specifically described above based on the embodiments. However, the present invention is not limited to the embodiments described above, and various modifications can be made without departing from the scope of the invention.

實施形態的容器10,不僅在鑄造法,亦可在容器內將Si熔化液予以保持並凝固的所有之矽錠的製造法皆可使用。例如,能夠在使種結晶與矽熔化液的表面接觸,一邊拉引此種結晶一邊從表面使矽熔化液凝固,而讓矽單結晶成長之凱氏長晶法。這是因為能夠抑制會妨礙從種結晶所 要進行的單結晶化之熔化液面浮遊物的產生,能夠藉由在低金屬不純物的多孔質容器材料上強固地形成脫模材來解決因伴隨矽凝固時的體積膨脹引起之應力脫模材損壞。 The container 10 of the embodiment can be used not only in the casting method but also in the manufacturing method of all the ingots in which the Si melt is held and solidified in the container. For example, the Kjeldahl growth method in which the cerium melt is solidified from the surface while the seed crystal is brought into contact with the surface of the cerium melt, and the cerium melt is allowed to grow. This is because it can suppress the crystallization from the seed crystal. The production of a single crystallized molten liquid float to be carried out can solve the stress release material caused by the volume expansion accompanying the solidification of the crucible by strongly forming the release material on the porous metal material of the low metal impurity. damage.

又,容器本體11,不僅適用將Si3N4或SiC成形為甘堝形狀者,亦適用組合將Si3N4或SiC成形為板狀的複數個板狀構件作為鑄模之組裝型者。 Further, the container body 11 is not only suitable for molding Si 3 N 4 or SiC into a shape of a kansui, but also a combination of a plurality of plate-like members in which Si 3 N 4 or SiC is formed into a plate shape as a mold.

以上所揭示的實施形態的內容僅為例示者,不限定本發明。本發明的範圍不限於前述發明,而是依據申請專利範圍者,在與申請專利範圍均等的意思及範圍內之所有變更皆含於本發明。 The contents of the embodiments disclosed above are merely illustrative and are not intended to limit the invention. The scope of the present invention is not limited to the foregoing invention, but all modifications within the meaning and scope of the claims are intended to be included in the invention.

1‧‧‧結晶成長裝置 1‧‧‧ Crystal Growth Unit

10‧‧‧矽錠製造用容器 10‧‧‧矽Ingot manufacturing container

11‧‧‧容器本體 11‧‧‧ container body

12‧‧‧脫模材 12‧‧‧Removable materials

13‧‧‧承受器 13‧‧‧ susceptor

14‧‧‧加熱器 14‧‧‧heater

15‧‧‧矽原料(矽熔化液) 15‧‧‧矽 Raw materials (矽 melt)

15a‧‧‧矽多結晶 15a‧‧‧More crystals

圖1係適用本發明之矽錠製造用容器的斷面圖。 Fig. 1 is a cross-sectional view showing a container for manufacturing a ruthenium ingot to which the present invention is applied.

圖2係顯示使用實施形態的容器之結晶成長裝置的一例之圖。 Fig. 2 is a view showing an example of a crystal growth apparatus using a container according to an embodiment.

10‧‧‧矽錠製造用容器 10‧‧‧矽Ingot manufacturing container

11‧‧‧容器本體 11‧‧‧ container body

12‧‧‧脫模材 12‧‧‧Removable materials

Claims (7)

一種矽錠製造用容器,係用來讓矽熔化液凝固而使矽多結晶成長之矽錠製造用容器,其特徵為:在由以氮化矽或碳化矽形成且開氣孔率為10%以上40%以下的多孔質體所構成的容器本體的內面,形成有由氮化矽所構成且厚度為300~1000μm的脫模材。 A container for producing a bismuth ingot, which is a container for producing a ruthenium ingot for solidifying ruthenium melt to grow polycrystalline ruthenium, characterized in that it is formed of tantalum nitride or tantalum carbide and has an open porosity of 10% or more. A mold release material composed of tantalum nitride and having a thickness of 300 to 1000 μm is formed on the inner surface of the container body made of a porous body of 40% or less. 如申請專利範圍第1項之矽錠製造用容器,其中,前述多孔質體的開氣孔率為20%以上30%以下。 The container for producing an ingot in the first aspect of the invention, wherein the porous body has an open porosity of 20% or more and 30% or less. 如申請專利範圍第1項之矽錠製造用容器,其中,前述氮化矽的多孔質體所構成的容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為1000ppm以下。 The container for producing an ingot according to the first aspect of the invention, wherein the metal body of the container body composed of the porous body of tantalum nitride is Fe (Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni). , W, V, Zn, and Zr) are each 1000 ppm or less. 如申請專利範圍第3項之矽錠製造用容器,其中,前述氮化矽的多孔質體所構成的容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為10ppm以下。 The container for manufacturing an antimony ingot according to the third aspect of the invention, wherein the metal impurities of the container body composed of the porous body of the tantalum nitride (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni) , W, V, Zn, and Zr) are each 10 ppm or less. 如申請專利範圍第1項之矽錠製造用容器,其中,由前述碳化矽的多孔質體所構成之容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為100ppm以下。 The container for producing an ingot in the first aspect of the invention, wherein the metal impurities (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni) of the container body composed of the porous body of the niobium carbide. , W, V, Zn, and Zr) are each 100 ppm or less. 如申請專利範圍第5項之矽錠製造用容器,其中,由前述碳化矽的多孔質體所構成之容器本體的金屬不純物(Fe、Al、Mn、Mg、Ca、Cu、Ti、Cr、Ni、W、V、Zn、Zr)分別為10ppm以下。 The container for producing an ingot according to the fifth aspect of the invention, wherein the metal impurities (Fe, Al, Mn, Mg, Ca, Cu, Ti, Cr, Ni) of the container body composed of the porous body of the niobium carbide. , W, V, Zn, and Zr) are each 10 ppm or less. 如申請專利範圍第1至6項中任一項之矽錠製造用容器,其中,前述脫模材的厚度為350~600μm。 The container for manufacturing an antimony ingot according to any one of claims 1 to 6, wherein the release material has a thickness of 350 to 600 μm.
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