201221494 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種玻璃蝕刻裝置及其蝕刻玻璃之方 法，尤指一種包含一上片區段、一第一清洗區段、一緩衝 區段、一蝕刻區段、一第二清洗區段、一微拋光區段、一 第三清洗區段、一中和區段、一第四清洗區段及一下片區 段之玻璃蝕刻裝置，其藉由一系列之處理程序而可完成特 φ 定之玻璃蝕刻樣式。 【先前技術】201221494 VI. Description of the Invention: [Technical Field] The present invention relates to a glass etching apparatus and a method of etching the same, and more particularly to a method comprising an upper sheet section, a first cleaning section, a buffer section, and a a etched section, a second cleaning section, a micro-polished section, a third cleaning section, a neutralization section, a fourth cleaning section, and a glass etching apparatus of the lower section, by a series of The processing procedure can be used to complete the glass etching pattern. [Prior Art]
霧面壓克力模具玻璃為平板喷砂霧狀之型態，PMMA 經調和後澆注於兩片玻璃板中做聚合後即產生霧面之壓克 力板，喷砂的表面處理無法滿足光學材料之需求及模具玻 璃之使用壽命有鑑於此提供滿足更高的霧度及光穿透且可 才几指紋之霧面壓克力模具玻璃。The matte acrylic mold glass is in the form of a flat spray sand mist. After the PMMA is blended and poured into two glass plates to form a polymerized acrylic sheet, the surface treatment of the matte surface cannot meet the optical material. The demand and the service life of the mold glass are in view of the provision of a matte acrylic mold glass that satisfies higher haze and light penetration and can be fingerprinted.
塑膠的平板或模無法達到更高的抗刮耐磨之性能，本 製作工法以玻璃的硬度極耐磨性呈現於使用上達更高需求 並可降低設備材料及加工成本。 擴散板主要應用在液晶顯示器直下式背光模組，主要 功能為光線透過擴散層而產线射，以提㈣晶顯示器亮 ::佈均勻之面光源。光源經過擴散板可均勾分佈擴散， 均勻 取之輝度。擴散板除使光源 佈卜，更具有消除燈管排列所產生之陰影等功能。 201221494 s知之擴散板係將—擴散膜貼附於一導光板之上來達 成，一般傳統的擴散膜主要是在擴散膜基材中，加入一顆 顆的化學顆粒’作為散射粒子，所以光線在經過擴散層時 會不斷的在兩個折射率相異的介質中穿過，在此同時光線 就會發生許多折#、反射與散射的ϊ見象’如此便造成了光 學擴散的效果。 然而’目前之顯示器已大量使用發光二極體（LightThe plastic flat plate or mold can not achieve higher scratch and wear resistance. The manufacturing method is based on the hardness and wear resistance of the glass, which can be used in higher demand and can reduce equipment materials and processing costs. The diffuser board is mainly used in the direct-lit backlight module of the liquid crystal display. The main function is that the light is transmitted through the diffusion layer to produce a line shot, so as to raise the surface light of the (four) crystal display. The light source can be uniformly distributed through the diffusion plate to uniformly spread the brightness. In addition to making the light source, the diffuser has the function of eliminating the shadow generated by the arrangement of the lamps. 201221494 s know that the diffusion plate is attached to a light guide plate by a diffusion film. Generally, the conventional diffusion film is mainly used in a diffusion film substrate, and a chemical particle is added as a scattering particle, so the light passes through When the diffusion layer is continually passed through two media with different refractive indices, at the same time, the light will have many defects, reflections and scatterings, which will cause optical diffusion. However, the current display has used a large number of light-emitting diodes (Light
Emitting Diode，LED )作為發光源，由於在發光的同 時會產生高溫，而擴散膜持續處於高溫的環境之下便會被 破壞結構，最終使擴散板耗損。 有鑑於此，必須提供一種創新的擴散片及其製造方法， 並配合獨特之裝置以進行其製造程序，藉由此種創新的擴 片可免除1知擴散膜的使用，以提升擴散板以及顯示器 的使用壽命及效能。 【發明内容】 故，有鑒於前述之問題與缺失，發明人以多年之經驗 累積’並發揮想像力與創造力，在不斷試作與修改之後， 始有本發明之-種玻璃㈣裝置及其㈣破璃之方法。 本發明之主要目的係提供一種玻璃蝕刻裝置，藉由一 系列具有不同功能之處理區&，可對—玻璃之表面進行特 殊之蝕刻處理，使其具有抗眩光及擴散板之功能。 為達上述目的，本發明係提供一種破璃蝕刻裝置，其 201221494 至少包含：一上片區段，係用以將一玻璃送入該玻璃蝕刻 裝置中；一第一清洗區段，係與該上片區段連接，其係用 以將該玻璃之一蝕刻面清洗乾淨，並可將玻璃吹乾；一緩 衝區段’係與該第一清洗區段連接’其係用以暫存清洗完 成之玻璃’並可調整玻璃之溫度及溼度；一蝕刻區段，係 與該緩衝區段連接’其係利用一蝕刻液對玻璃之蝕刻面進 行姓刻處理；一第二清洗區段，係與該蝕刻區段連接，其 係用以清洗玻璃經敍刻處理後所產生之鹽類及殘酸，並可 將玻璃吹乾；至少一微拋光區段’係與該第二清洗區段連 接’其係將玻璃傾斜固定，並以一拋光液對玻璃之蝕刻面 進行微拋光處理；一第三清洗區段，係與該微拋光區段連 接，其係用以清洗玻璃經微拋光處理後所產生之鹽類及殘 酸’並可將玻璃吹乾；一中和區段，係與該第三清洗區段 連接，其係利用一中和液將玻璃經過蝕刻處理及微拋光處 理後所殘留的殘酸進行中和處理；一第四清洗區段，係與 該中和區段連接，其係用以清洗玻璃，並可將玻璃吹乾； 及一下片區段，係與該第四清洗區段連接，其係用以將蝕 刻處理完成之玻璃由玻璃蝕刻裝置中送出。 本發明之另一目的係提供一種利用該玻璃敍刻裝置银 刻玻璃的方法，藉由一系列之蝕刻處理程序，並配合玻璃 蝕刻裝置之各處理區段，可對於玻璃之表面進行精細之特 殊蝕刻處理，使處理後之玻璃可作為生產霧面壓克力用之 201221494 澆鑄模具玻璃及抗眩光玻璃擴散板玻璃使用β 為達上述目的’本發明係提供一種利用該玻璃蚀刻裝 置蝕刻玻璃的方法’至少包含以下步驟：（1 )該玻璃蝕刻 裝置之一上片區段將一玻璃送入玻璃蝕刻裝置中；（2)玻 璃飯刻裝置之一第一清洗區段將該玻璃之一蝕刻面清洗乾 淨，並將玻璃吹乾；（3 )玻璃停放於玻璃钱刻裝置之一緩 衝區段中，並藉由該緩衝區段以調整其溫度及溼度；（4 ) 鲁玻璃蚀刻裝置之一敍刻區段將一飯刻液均勻塗佈於玻璃之 蝕刻面；（5 )玻璃在該蝕刻區段中靜置一段時間，以進行 蝕刻反應；（6 )玻璃蝕刻裝置之一第二清洗區段將玻璃清 洗乾淨，並將玻璃吹乾；（7)玻璃蝕刻装置之至少一微拋 光區段將玻璃傾斜固定，並以一拋光液對玻璃之蝕刻面進 行微拋光處理；（8)玻璃蝕刻裝置之一第三清洗區段將玻 璃清洗乾淨，並將玻璃吹乾；（9)玻璃蝕刻裝置之一中和 離區段制-中和液將玻璃經過㈣處理及微拋光處理後所 殘留的殘酸進行中和處理；（1〇)玻璃蝕刻裝置之一第四清 洗區段將玻璃清洗乾淨，並將玻璃吹乾；及（η)玻璃钱 刻裝置之一下片區段將银刻處理完成之玻璃由玻璃姓刻裝 置中送出。 【實施方式】 為達前述之目的與功效，發明人將各個鞋刻處理程序 作整合’在不斷的調整與修正之下，始得到本發明之一種 201221494 玻璃姓刻裝置及其㈣玻璃之方法。兹分別以本發明之一 第-較佳實施例、一第二較佳實施例及一第三較佳實施例 之-種玻㈣刻裝置及其钱刻破璃之方法，對於本發明之 裝置架構及其處理程序進行詳細之介紹。Emitting Diode (LED), as a light source, generates high temperatures at the same time as the light is emitted, and the diffusion film continues to be in a high temperature environment, and the structure is destroyed, eventually causing the diffusion plate to be worn. In view of this, it is necessary to provide an innovative diffuser and its manufacturing method, and with a unique device to carry out its manufacturing process, by using such an innovative expansion film, the use of a known diffusion film can be dispensed with to enhance the diffusion plate and the display. Service life and performance. SUMMARY OF THE INVENTION Therefore, in view of the aforementioned problems and deficiencies, the inventors have accumulated years of experience and exerted imagination and creativity, and after continuous trial and modification, the invention has been invented with a glass (four) device and (four) broken The method of glass. SUMMARY OF THE INVENTION A primary object of the present invention is to provide a glass etching apparatus which can perform a special etching treatment on the surface of a glass by a series of processing regions having different functions to have an anti-glare and diffusion plate function. In order to achieve the above object, the present invention provides a glass etching apparatus, wherein 201221494 comprises at least: an upper sheet section for feeding a glass into the glass etching apparatus; and a first cleaning section coupled thereto a sheet section connection for cleaning one of the etched surfaces of the glass and drying the glass; a buffer section 'connecting to the first cleaning section' for temporarily storing the cleaned glass 'The temperature and humidity of the glass can be adjusted; an etched section is connected to the buffer section', which uses an etching solution to etch the etched surface of the glass; a second cleaning section is etched a section connection for cleaning the salt and residual acid produced by the etched glass, and drying the glass; at least one micro-polished section is connected to the second cleaning section The glass is fixed obliquely, and the etched surface of the glass is micro-polished with a polishing liquid; a third cleaning section is connected to the micro-polished section for cleaning the glass after micro-polishing treatment Salts and residual acids' The glass may be blown dry; a neutralization section is connected to the third cleaning section, and the neutralization liquid is used to neutralize the residual acid remaining after the etching treatment and the micropolishing treatment of the glass; a fourth cleaning section is connected to the neutralization section for cleaning the glass and drying the glass; and a lower section connected to the fourth cleaning section for etching The finished glass is sent out of the glass etching apparatus. Another object of the present invention is to provide a method for etching a glass using the glass sculpt device, which can perform fine special on the surface of the glass by a series of etching processes and with each processing section of the glass etching apparatus. Etching treatment, so that the treated glass can be used as a matte acrylic for the production of 201221494 casting mold glass and anti-glare glass diffusion plate glass. To achieve the above purpose, the present invention provides a method for etching glass by using the glass etching device. 'At least the following steps are: (1) one of the glass etching devices has a sheet section feeding a glass into the glass etching apparatus; and (2) one of the glass rice carving apparatus is cleaned by etching the surface of one of the first cleaning sections Clean and dry the glass; (3) the glass is parked in a buffer section of the glass money engraving device, and the buffer zone is used to adjust its temperature and humidity; (4) one of the Lu glass etching devices The section uniformly applies a meal to the etched surface of the glass; (5) the glass is allowed to stand in the etching section for a period of time to perform an etching reaction; (6) glass a second cleaning section of the engraving device cleans the glass and blows the glass; (7) at least one micro-polished section of the glass etching apparatus tilts the glass and micro-etches the etched surface of the glass with a polishing liquid Polishing treatment; (8) one of the glass etching devices: the third cleaning section cleans the glass and blows the glass; (9) one of the glass etching devices and the neutralization-neutralization liquid passes the glass through (four) treatment And neutralizing the residual acid remaining after the micro-polishing treatment; (1〇) one of the glass etching devices, the fourth cleaning section cleans the glass, and blows the glass; and (n) one of the glass money carving devices The sheet section is sent out of the glass-finished device by the silver-finished device. [Embodiment] In order to achieve the above-mentioned purpose and effect, the inventors integrated the respective shoe-cutting processes. Under continuous adjustment and correction, a method of the 201221494 glass surname device and the method of (4) glass of the present invention is obtained. The apparatus of the present invention is provided by the method of the present invention, the second preferred embodiment and the third preferred embodiment, the glass (four) engraving device and the method for etching the glass The architecture and its handlers are described in detail.
首先’请參照如第一圖所示，係本發明該第一較佳實 施例之玻璃钱刻裝置之架構示意圖，該玻璃钮刻裝置i係 包含一上片區段100、_第一清洗區段11〇、—緩衝區段 120、一淋幕蝕刻區段13〇、一第二清洗區段m〇、一微拋 光區段150、一第三清洗區段16〇、一中和區段17〇、一第 四清洗區段1 8 0及一下片區段19 〇。 该上片H 1 00係、用以將—玻璃&入該玻璃蝕刻裝置 1中。 該第一清洗區段110係與該上片區段1〇〇連接，其係 用以將該玻璃之一蝕刻面清洗乾淨，並可將玻璃吹乾。 战緩衝區段120係與該第—清洗區段1丨〇連接，其係 用以暫存清洗完成之玻璃，並可調整玻璃之溫度及溼度。 該淋幕蝕刻區段130係與該緩衝區段丨2〇連接，其係 利用一蝕刻液對玻璃之蝕刻面進行淋幕蝕刻處理。 該第二清洗區段140係與該淋幕蝕刻區段丨3〇連接， 其係用以清洗玻璃經餘刻處理後所產生之鹽類及殘酸，並 可將玻璃吹乾。 該微拋光區段150係與該第二清洗區段丨4〇連接，其 201221494 係將玻璃傾斜固定’並以一抛光液對玻璃之姓刻面進行微 拋光處理。 該第三清洗區段1 60係與該微拋光區段1 50連接，其 係用以清洗玻璃經微拋光處理後所產生之鹽類及殘酸，並 可將玻璃吹乾。 該中和區段1 70係與該第三清洗區段1 60連接，其係 利用一中和液將玻璃經過蝕刻處理及微拋光處理後所殘留 φ 的殘酸進行中和處理。 該第四清洗區段1 8〇係與該中和區段170連接，其係 用以清洗玻璃，並可將玻璃吹乾。 該下片區段190係與該第四清洗區段18〇連接，其係 用以將飯刻處理完成之玻璃由玻璃触刻裝置1中送出。 接著請參照如第二圖所示，係本發明第一較佳實施例 之淋幕触刻區段結構示意圖，該淋幕蝕刻區段13〇主要包 • 含：一容器13卜係用以容置該蝕刻液132 ; —流幕器133， 係與該容器131連接’其具有一流幕口 134，蝕刻液ι32 可透過該流幕口 134流出而附於玻璃1〇之表面上，該流幕 口 134之寬度為〇.3〜3mm;及一循環果135，係設置於容 器131與該流幕器133之間，可將容器131中的蝕刻液132 主動輸送至流幕器13 3中。另外，淋幕姓刻區段13 〇更可 包含一些輔助元件，例如一壓力調節閥136、一據清器 137、一壓力计138及一加熱/冷卻器139，該壓力調節閥 201221494 136可用以調節管路中之蝕刻液132的壓力，該濾清器a? 可用以過濾掉蝕刻液132中之雜質，該壓力計138可用以 測量管路中之蝕刻液132的壓力，該加熱/冷卻器139可 用以對於容器131中的蝕刻液132進行加熱或冷卻，使蝕 刻液1 32達到最佳反應溫度。 接著晴參閱下列之表一，係顯示本發明玻璃蝕刻裝置 1中各區段的參數值。如表一所示，第一清洗區段11〇之 籲傳送速度為〇.5〜4m/min，緩衝區段120、淋幕蝕刻區段 130、第二清洗區段14〇、微拋光區段ι5〇、第三清洗區段 160及中和區段170之傳送速度為1〜4〇m/min，第四清洗 又180之傳送速度為1〜5m/min。另外，第一清洗區段 110、淋幕蝕刻區段130、第二清洗區段14〇、微拋光區段 150、第三清洗區段160、中和區段17〇及第四清洗區段180 之溫度為10〜45 °C，緩衝區段120之溫度為室溫。再者， 镰 淋幕蝕刻區段130、第二清洗區段14〇、微拋光區段15〇、 第三清洗區段160及中和區段17〇之傾斜角度為〇〜45度。 10 201221494 表一 區段 傳送速度 (m/min ) 溫度（°C ) 傾斜角度 第一清洗區段 0.5〜4 10〜45 緩衝區段 1〜40 室溫 淋幕蝕刻區段 1〜40 10〜45 0〜45 第二清洗區段 1〜40 10〜45 0〜45 微拋光區段 1〜40 10〜45 0〜45 第三清洗區段 1〜40 10〜45 0〜45 中和區段 1〜40 10〜45 0〜45 第四清洗區段 1〜5 10〜45 接著請參閱下列之表二，係本發明所使用之蝕刻液配 方列表。其中，配方一之成分包含質量分i〜5之硫酸（密 度為1.84g/cm3)、質量分8〜25之氟化鉀以及質量分10〜 鲁 100之水；配方二之成分包含質量分10〜40之醋酸、質量 分9〜30之氟化鈉以及質量分1〇〇之水；配方三之成分包 含質量分40〜80之氫氟酸（49%)、質量分100〜400之氟 化錢（40%)以及質量分〇〜之水；配方四之成分包含 質量分25〜75之鹽酸（密度為1 19g/cm3)、質量分14〜 5〇之硫酸鉀、質量分25〜40之氟氫化鉀以及質量分1〇〇 之水；配方五之成分包含質量分2〇〜6〇之氫氟酸（49% )、 質量分40〜120之硫酸（密度為1 84g/crn3)、質量分1〇〜 11 201221494First, please refer to the schematic diagram of the glass engraving device of the first preferred embodiment of the present invention as shown in the first figure. The glass button engraving device i includes a top sheet section 100, a first cleaning section. 11〇, a buffer section 120, a shower etch section 13〇, a second cleaning section m〇, a micro-polished section 150, a third cleaning section 16〇, a neutral section 17〇 a fourth cleaning section 180 and a next section 19 〇. The top sheet H 1 00 is used to feed the glass into the glass etching apparatus 1. The first cleaning section 110 is coupled to the upper panel section 1 , to clean the etched surface of one of the glass and to dry the glass. The battle buffer section 120 is connected to the first cleaning section 1 ,, which is used for temporarily storing the cleaned glass and adjusting the temperature and humidity of the glass. The curtain etched section 130 is connected to the buffer section ,2〇, which is subjected to a curtain etching process on the etched surface of the glass by an etchant. The second cleaning section 140 is connected to the curtain etching section 丨3〇 for cleaning the salt and residual acid produced by the residual treatment of the glass, and drying the glass. The micro-polished section 150 is connected to the second cleaning section ,4〇, and the 201221494 is used to fix the glass obliquely and to micro-polish the facet of the glass with a polishing liquid. The third cleaning section 160 is connected to the micro-polished section 150 for cleaning the salt and residual acid produced by the micro-polishing treatment of the glass, and drying the glass. The neutralization section 174 is connected to the third cleaning section 160, and neutralizes the residual acid of φ after etching and micropolishing the glass by a neutralizing liquid. The fourth cleaning section 18 is coupled to the neutralization section 170 for cleaning the glass and drying the glass. The lower panel section 190 is coupled to the fourth cleaning section 18A for dispensing the glass-cutting glass from the glass-touching apparatus 1. Referring to the second embodiment, a schematic diagram of the structure of the shower screen of the first preferred embodiment of the present invention is provided. The shower etching section 13 is mainly provided with a container 13 for housing. The etching liquid 132 is connected to the container 131. It has a first-class screen 134 through which the etching liquid ι32 flows out and is attached to the surface of the glass 1 . The width of the mouth 134 is 〇.3~3 mm; and a circulation fruit 135 is disposed between the container 131 and the flow curtain 133, and the etching liquid 132 in the container 131 can be actively transported into the flow screen 13 3 . In addition, the showering portion 13 can further include some auxiliary components, such as a pressure regulating valve 136, a cleaner 137, a pressure gauge 138, and a heater/cooler 139. The pressure regulating valve 201221494 136 can be used. The pressure of the etchant 132 in the line is adjusted, the filter a? can be used to filter out impurities in the etchant 132, and the pressure gauge 138 can be used to measure the pressure of the etchant 132 in the line, the heater/cooler 139 can be used to heat or cool the etchant 132 in the vessel 131 to bring the etchant 1 32 to an optimum reaction temperature. Next, referring to Table 1 below, the parameter values of the respective sections in the glass etching apparatus 1 of the present invention are shown. As shown in Table 1, the first cleaning section 11 has a transfer speed of 〇.5 to 4 m/min, the buffer section 120, the curtain etching section 130, the second cleaning section 14〇, and the micro-polished section. The transport speed of the ι5 〇, the third cleaning section 160 and the neutral section 170 is 1 to 4 〇 m/min, and the transmission speed of the fourth cleaning 180 is 1 to 5 m/min. In addition, the first cleaning section 110, the shower etching section 130, the second cleaning section 14A, the micro-polishing section 150, the third cleaning section 160, the neutralization section 17A, and the fourth cleaning section 180 The temperature is 10 to 45 ° C, and the temperature of the buffer section 120 is room temperature. Further, the tilt angle of the etched etched section 130, the second cleaning section 14A, the micro-polished section 15A, the third cleaning section 160, and the neutralization section 17A is 〇45 degrees. 10 201221494 Table 1 Section conveying speed (m/min) Temperature (°C) Tilt angle First cleaning section 0.5~4 10~45 Buffer section 1~40 Room temperature curtain etching section 1~40 10~45 0~45 Second cleaning section 1~40 10~45 0~45 Micro-polishing section 1~40 10~45 0~45 Third cleaning section 1~40 10~45 0~45 Neutral section 1~ 40 10~45 0~45 Fourth Cleaning Section 1~5 10~45 Next, please refer to Table 2 below, which is a list of etching liquid formulations used in the present invention. Wherein, the component of the formula 1 comprises sulfuric acid having a mass fraction of i~5 (density of 1.84 g/cm3), potassium fluoride having a mass fraction of 8 to 25, and water of a mass fraction of 10 to 100; the composition of the formula 2 comprises a mass fraction of 10 ~40 of acetic acid, sodium fluoride of 9~30 by mass and water of 1 part by mass; the composition of formula III comprises hydrofluoric acid (49%) with mass fraction of 40~80, and fluorination of mass fraction of 100~400 Money (40%) and the quality of the water ~ the composition of the formula 4 contains 25 to 75 parts of hydrochloric acid (density of 1 19g / cm3), mass fraction of 14 ~ 5 〇 potassium sulfate, mass points 25 ~ 40 Potassium fluorohydride and water of 1 part by mass; the composition of formula 5 contains hydrofluoric acid (49%) with mass fraction of 2〇~6〇, sulfuric acid with mass of 40~120 (density of 1 84g/crn3), quality Points 1 to 11 201221494
30之硫酸鍵以及質量分1〇〇之水；配方六之成分包含質量 分1〜10之鹽酸（密度為丨19g/cm3)、質量分1〇〜6〇之氟 化鉀以及質量分100之水。 成份 配方一 配方二 配方三 配方四 配方五 配方六 氫氟酸 (49% ) 0〜25 〇〜35 40〜80 0〜30 20〜60 0〜50 硫酸 (密度 1.84g/c m3 ) 1〜5 〇〜10 0〜8 0〜12 40〜 120 0〜35 鹽酸 (密度 1.19g/c m3 ) 0〜30 〇〜25 0〜30 25 〜75 0〜30 • 1〜10 醋酸 0〜25 10〜40 0〜30 0〜30 0〜40 0〜36 乾化敍 (40% ) 0〜35 〇〜15 100〜 400 0〜40 〇〜10 0〜45 氟化納 氟化鉀 0〜40 8〜25 兰〜30 0〜15 0〜25. 〇〜30 0〜20 0〜20 0〜35 0〜30 '----— 〇〜20 10〜60 0〜45 硫酸銨 硫酸斜 1氫化 鉀 0〜20 0 〜15 — 0〜20 0〜30 0〜20 0〜5 — 10〜30 〇〜35 〇〜15 0〜15 0〜30 14〜50 25〜40 0〜35 --—-- 100 第一較> 0〜35 0〜25 100 ί圭實施倒 水 接著1 10〜 100 青參閱如 100 f第三圖 0 〜100 所示，Ί; 100 卜、本發明 之利用玻璃蝕刻裝置蝕刻玻璃的方法步驟 此方法包 12 201221494 含以下步驟：該玻璃钮刻裝置之—上片區段將一玻璃送入 玻璃儀刻裝置中（步驟201 );玻璃蝕刻裝置之一第一清洗 區段將該玻璃之一蝕刻面清洗乾淨，並將玻璃吹乾（步驟 202 )，其中，此步驟之反應時間為1〜丨5分鐘；玻璃停放 於玻璃蝕刻裝置之一緩’衝區段中，並藉由該緩衝區段以調 整其溫度及溼度（步驟203 );玻璃蝕刻裝置之一流幕蝕刻 區段將一蝕刻液均勻塗佈於玻璃之蝕刻面（步驟204 );玻 • 璃在該流幕蝕刻區段中靜置一段時間，以進行蝕刻反應（步 驟205)，其中，此步驟之反應時間為ι〜15分鐘；玻璃蝕 刻裝置之一第二清洗區段將玻璃清洗乾淨，並將玻璃吹乾 (步驟206 )’其中，此步驟之反應時間為1〜丨5分鐘；玻 璃飯刻裝置之一微拋光區段將玻璃傾斜固定，並以一拋光 液對玻璃之蝕刻面進行微拋光處理（步驟2〇7)，其中，此 步驟之反應時間為1〜9 〇分鐘；玻璃银刻裝置之一第三清 鲁洗區段將玻璃清洗乾淨，並將玻璃吹乾（步驟208 )，其中， 此步驟之反應時間為丨〜丨5分鐘；玻璃蝕刻裝置之一中和 區段利用一中和液將玻璃經過蝕刻處理及微拋光處理後所 殘留的殘酸進行中和處理（步驟209 )，其中，此步驟之反 應時間為1〜15分鐘；玻璃蝕刻裝置之一第四清洗區段將 玻璃清洗乾淨，並將玻璃吹乾（步驟210 )，其中，此步驟 之反應時間為1〜1 5分鐘；及玻璃蝕刻裝置之—下片區段 將姓刻處理完成之玻璃由玻璃蝕刻裝置中送出（步驟211)。 13 201221494 接著叫參閱如第四圖所示，係本發明該第二較佳實施 例之玻璃蝕刻裝置之恕+杳固 咕 + _ 不罝之糸構不意圖，第二較佳實施例之玻璃 姓刻裝置3所包含_卜ΗΓό'πιηη a*.. 5 上片區釵300、一第一清洗區段310、 緩衝區^又320、一第二清洗區段34〇、一微拋光區段35〇、 一第三清洗區段360、一中和區段37〇、一第四清洗區段 380及一下片區段39〇，其結構與功能皆與第一較佳實施例 相同，因此不再贅述。第二較佳實施例與第一較佳實施例 # 之差異在於第二較佳實施例所包含之蝕刻區段係一種喷塗 蝕刻區段330，其含有一蝕刻液喷嘴331，該蝕刻液喷嘴 331之口徑為〇.7〜i.5mm，該喷塗蝕刻區段330之空氣壓 力為0.2MPa ’其空氣使用量為75 Ι/min，其蝕刻液喷出量 為 80 ml/min 〇 接著請參閱如第五圖所示，係本發明第二較佳實施例 之利用玻璃蝕刻裝置蝕刻玻璃的方法步驟圖示，此方法包 籲 含以下步驟：該玻璃飯刻裝置之一上片區段將一玻璃送入 玻璃蝕刻裝置中（步驟40 1 );玻璃蝕刻裝置之一第一清洗 區段將該玻璃之一姓刻面清洗乾淨，並將玻璃吹乾（步驟 402 )’其中，此步驟之反應時間為1〜1 5分鐘；玻璃停放 於玻璃蝕刻裝置之一緩衝區段中，並藉由該緩衝區段以調 整其溫度及溼度（步驟403 );玻璃蝕刻裝置之一喷塗蝕刻 區段將一蝕刻液透過壓力及溫度之調整而均勻喷塗於玻璃 之蝕刻面（步驟404 );玻璃在該喷塗蝕刻區段中靜置一段 14 201221494 時間，以進行蝕刻反應（步驟405 )，其中’此步驟之反應 時間為1〜1 5分鐘；玻璃蝕刻裝置之一第二清洗區段將玻 璃清洗乾淨，並將玻璃吹乾（步驟406 )，其中，此步驟之 反應時間為1〜15分鐘；玻璃蝕刻裝置之一微拋光區段將 玻璃傾斜固定，並以一拋光液對玻璃之蝕刻面進行微拋光 處理（步驟407 )，其中，此步驟之反應時間為1〜90分鐘； 玻璃蝕刻裝置之一第三清洗區段將玻璃清洗乾淨，並將玻 φ 璃吹乾（步驟408 )，其中，此步驟之反應時間為1〜1 5分 鐘；玻璃蝕刻裝置之一中和區段利用一中和液將玻璃經過 蝕刻處理及微拋光處理後所殘留的殘酸進行中和處理（步 驟409)，其中，此步驟之反應時間為ι〜15分鐘；玻璃蝕 刻裝置之一第四清洗區段將玻璃清洗乾淨，並將玻璃吹乾 (步驟410) ’其中，此步驟之反應時間為ι〜15分鐘；及 玻璃蝕刻裝置之一下片區段將蝕刻處理完成之玻璃由玻璃 # 蝕刻裝置中送出（步驟411)。 接著請參閱如第六圖所示，係本發明該第三較佳實施 例之玻璃蝕刻裝置之架構示意圖，第三較佳實施例之玻璃 蝕刻裝置5所包含一上片區段5〇〇、一第一清洗區段5】〇、 一緩衝區段520、一第二清洗區段54〇、一微拋光區段55〇、 -第三清洗區段560、一中和區段57〇、一第四清洗區段 580及一下片區段59〇’其結構與功能皆與第一較佳實施例 及第-較佳實施例相同，因此不再贅述。第三較佳實施例 15 201221494 與第一較佳實施例及第二較佳實施例之差異在於第三較佳 實施例所包含之蝕刻區段係一種浸入蝕刻區段5 3 〇，請參 閱如第七圓所示，係本發明第三較佳實施例之浸入蝕刻區 段之結構示意圖’該浸入钱刻區段5 3 〇係包含一酸餘槽 531’該酸钱槽531内裝有触刻液532，玻璃50被送至此 次入触刻區段5 3 0時便會浸泡於酸姓槽5 3 1内之触刻液5 3 2 中’以進行特定時間之触刻反應。玻璃5 〇在浸泡的過程中 φ 必需靜置，因此餘刻液5 3 2不可有流動的情形。 接著請參閱如第八圖所示，係本發明第三較佳實施例 之利用玻璃蝕刻裝置蝕刻玻璃的方法步驟圖示，此方法包 含以下步驟：該玻璃餘刻裝置之一上片區段將一玻璃送入 玻璃蝕刻裝置中（步驟601 );玻璃蝕刻裝置之一第一清洗 區段將該玻璃之一蝕刻面清洗乾淨，並將玻璃吹乾（步驟 602 )，其中’此步驟之反應時間為ι〜15分鐘；玻璃停放 • 於玻璃蝕刻裝置之一緩衝區段中，並藉由該緩衝區段以調 整其溫度及溼度（步驟603 );玻璃被送至一浸入蝕刻區段 中’並浸泡於酸蝕槽内之蝕刻液中（步驟604 );玻璃在該 浸入蝕刻區段中靜置一段時間，以進行蝕刻反應（步驟 605 )’其中，此步驟之反應時間為ι〜15分鐘；玻璃蝕刻 裝置之一第二清洗區段將玻璃清洗乾淨，並將玻璃吹乾（步 驟606 )，其中，此步驟之反應時間為1〜丨5分鐘；玻璃蝕 刻裝置之一微拋光區段將玻璃傾斜固定，並以一拋光液對 16 201221494 玻璃之韻刻面進行微拋光處理（步驟6⑺，其中，此步驟 之反應時間為1〜90分鐘；玻璃敍刻裝置之-第三清洗區 段將玻璃’月洗乾淨’並將玻璃吹乾（步驟_)，其中，此 步驟之反應時間；^ ! ~丨ςu L ^ 呼门為1 15分鐘，玻璃蝕刻裝置之一中和區 &利用巾和液將玻璃經過银刻處理及微拋光處理後所殘 留的殘酸進行中和處理（步驟609)，其中，此步驟之反應The sulfuric acid bond of 30 and the water of 1 part by mass; the component of the formula 6 comprises hydrochloric acid having a mass fraction of 1 to 10 (density of 丨19 g/cm3), potassium fluoride having a mass fraction of 1 〇 to 6 以及, and a mass fraction of 100 water. Ingredients Formulation One Formulation Two Formulation Three Formulation Four Formulation Five Formulation Hexahydrofluoric Acid (49%) 0~25 〇~35 40~80 0~30 20~60 0~50 Sulfuric Acid (density 1.84g/c m3 ) 1~5 〇~10 0~8 0~12 40~120 0~35 Hydrochloric acid (density 1.19g/c m3) 0~30 〇~25 0~30 25 ～75 0~30 • 1~10 Acetic acid 0~25 10~40 0~30 0~30 0~40 0~36 Drying (40%) 0~35 〇~15 100~400 0~40 〇~10 0~45 Potassium fluoride fluoride 0~40 8~25 Lan ~30 0~15 0~25. 〇~30 0~20 0~20 0~35 0~30 '----- 〇~20 10~60 0~45 Ammonium sulfate slant 1 potassium hydride 0~20 0 ~15 — 0~20 0~30 0~20 0~5 — 10~30 〇~35 〇~15 0~15 0~30 14~50 25~40 0~35 ----- 100 First Comparison > 0~35 0~25 100 ί 圭 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施 实施Method Pack 12 201221494 comprises the following steps: the glass button engraving device - the upper section sends a glass into the glass In the engraving device (step 201); one of the glass etching devices cleans one of the etched surfaces of the glass and blows the glass (step 202), wherein the reaction time of the step is 1 to 丨5 Minutes; the glass is parked in a slow-cut section of the glass etching apparatus, and the buffer section is used to adjust its temperature and humidity (step 203); one of the glass etching apparatus is etched to uniformly coat an etching liquid An etched surface of the glass (step 204); the glass is allowed to stand in the etched section of the screen for a period of time to perform an etching reaction (step 205), wherein the reaction time of the step is ι 15 minutes; a second cleaning section of the etching apparatus cleans the glass and blows the glass (step 206) 'wherein the reaction time of this step is 1 to 5 minutes; one of the glass rice carving apparatus micro-polished sections Tilt-fixed, and micro-polishing the etched surface of the glass with a polishing solution (step 2〇7), wherein the reaction time of this step is 1~9 〇 minutes; one of the glass silver engraving devices is the third Qinglu wash area The section will clean the glass Net, and the glass is blown dry (step 208), wherein the reaction time of this step is 丨~丨5 minutes; one of the glass etching devices neutralizes the glass by etching and micro-polishing after using a neutralizing liquid The residual residual acid is subjected to a neutralization treatment (step 209), wherein the reaction time of the step is 1 to 15 minutes; the fourth cleaning section of the glass etching apparatus cleans the glass and blows the glass (step 210) Wherein, the reaction time of this step is 1 to 15 minutes; and the glass section of the glass etching apparatus sends the glass which is processed by the last name to the glass etching apparatus (step 211). 13 201221494 Next, as shown in the fourth figure, the glass etching apparatus of the second preferred embodiment of the present invention is not intended to be used, and the glass of the second preferred embodiment is not intended. The last name device 3 includes _卜ΗΓό'πιηη a*.. 5 upper film area 、300, a first cleaning section 310, a buffer area 320, a second cleaning section 34A, and a micro-polished section 35.结构, a third cleaning section 360, a neutral section 37〇, a fourth cleaning section 380, and a lower section 39〇, the structure and function of which are the same as those of the first preferred embodiment, and therefore will not be described again. . The second preferred embodiment differs from the first preferred embodiment in that the etched section included in the second preferred embodiment is a spray etched section 330 comprising an etchant nozzle 331, the etchant nozzle The diameter of 331 is 〇.7~i.5mm, the air pressure of the spray etched section 330 is 0.2 MPa', the air usage is 75 Ι/min, and the etchant discharge amount is 80 ml/min. Referring to FIG. 5, a method step of etching a glass by using a glass etching apparatus according to a second preferred embodiment of the present invention, the method includes the following steps: one of the upper sections of the glass rice cutting apparatus will be The glass is fed into the glass etching apparatus (step 40 1 ); one of the first etching sections of the glass etching apparatus cleans the surface of one of the glass and blows the glass (step 402) 'where the reaction of the step The time is from 1 to 15 minutes; the glass is parked in a buffer section of one of the glass etching devices, and the buffer section is used to adjust its temperature and humidity (step 403); one of the glass etching devices sprays the etching section Adjustment of an etchant through pressure and temperature And uniformly spraying on the etched surface of the glass (step 404); the glass is left in the spray etched section for a period of time 201221494 to perform an etching reaction (step 405), wherein the reaction time of the step is 1~1 5 minutes; one of the glass etching devices, the second cleaning section cleans the glass, and blows the glass (step 406), wherein the reaction time of the step is 1 to 15 minutes; one of the glass etching devices is micro-polished The glass is fixed obliquely, and the etched surface of the glass is micro-polished with a polishing liquid (step 407), wherein the reaction time of the step is 1 to 90 minutes; and the third cleaning section of the glass etching device cleans the glass Clean and dry the glass φ (step 408), wherein the reaction time of this step is 1 to 15 minutes; one of the glass etching devices neutralizes the glass with a neutralizing solution and micro-polishing The residual acid remaining after the treatment is subjected to a neutralization treatment (step 409), wherein the reaction time of the step is 1 to 15 minutes; and the fourth cleaning section of the glass etching apparatus cleans the glass, and Glass drying (step 410) 'wherein the reaction time of this step is ι~15 min; glass etching apparatus and the etching process at the completion of lobe segments of glass out of a glass # etching apparatus (step 411). Referring to FIG. 6 , which is a schematic structural view of a glass etching apparatus according to a third preferred embodiment of the present invention, the glass etching apparatus 5 of the third preferred embodiment includes a top sheet section 5 〇〇 The first cleaning section 5 〇, a buffer section 520, a second cleaning section 54〇, a micro-polished section 55〇, a third cleaning section 560, a neutral section 57〇, a first The structure and function of the four cleaning sections 580 and the lower section 59' are the same as those of the first preferred embodiment and the first preferred embodiment, and therefore will not be described again. The third preferred embodiment 15 201221494 differs from the first preferred embodiment and the second preferred embodiment in that the etched section included in the third preferred embodiment is an immersion etched section 5 3 〇, see eg The seventh circle shows a schematic diagram of the immersion etching section of the third preferred embodiment of the present invention. The immersed money section 5 3 includes an acid residue 531'. The engraving 532, the glass 50 is sent to the contact engraving section 5 3 0 when it enters the etched section 5 3 0, and is immersed in the etchant 5 3 2 in the acid surname tank 531 to perform the etch reaction at a specific time. Glass 5 〇 During the soaking process φ must be allowed to stand, so the residual liquid 5 3 2 must not flow. Referring to FIG. 8 , a method step of etching a glass by using a glass etching apparatus according to a third preferred embodiment of the present invention includes the following steps: one of the upper portions of the glass remnant device will be The glass is fed into the glass etching apparatus (step 601); the first cleaning section of the glass etching apparatus cleans one of the etched surfaces of the glass, and blows the glass (step 602), wherein the reaction time of the step is ι~15 minutes; glass parking • in a buffer section of a glass etching apparatus, and the buffer section is used to adjust its temperature and humidity (step 603); the glass is sent to an immersion etching section and immersed In the etching solution in the etching chamber (step 604); the glass is allowed to stand in the immersion etching section for a period of time to perform an etching reaction (step 605), wherein the reaction time of the step is ι 15 minutes; a second cleaning section of the etching apparatus cleans the glass and blows the glass (step 606), wherein the reaction time of the step is 1 to 5 minutes; one of the glass etching apparatuses is micro-polished The glass is fixed obliquely, and the polishing surface of the 16 201221494 glass is micro-polished with a polishing liquid (step 6 (7), wherein the reaction time of the step is 1 to 90 minutes; the third cleaning section of the glass etch device will The glass is 'washed clean' and the glass is blown dry (step _), wherein the reaction time of this step; ^ ! ~丨ςu L ^ is 1 15 minutes for the door, one of the glass etching devices and the area & And the liquid neutralizes the residual acid remaining after the silver etching treatment and the micro-polishing treatment (step 609), wherein the reaction of the step
時間為卜15分鐘；玻璃㈣裝置之一第四清洗區段將玻 璃清洗乾淨，並將玻璃吹乾（步驟61()) n❹Μ 反應時間為1〜15分鐘；及玻璃蝕刻裝置之-下片區段將 ㈣處理完成之玻璃由玻璃㈣裝置中送出（步驟611卜 經由上述對本發明之系統結構及技術内容進行詳 細之 說明以後’可歸納出下列優點： 1. 藉由本發明之製造方法所生產得到之蝕刻玻璃，其具有 非常優良之擴散板性能，因此可應用㈣光面板之結構 中’以得到理想的效能及壽命。 2. 本發明所使用的-系列製造方法，彳簡化傳統㈣玻璃 之机程，不僅縮短製程之時間，更可節省成本，對於操 作人員安全更有保障，因此是一項非常具有潛力之裝置 及製程。 3. 本發明之玻璃蝕刻裝置具有非常優良之產能，因此可在 相同時間之内產出更多量且更精確之蝕刻玻璃。 4. 由於利用本發明所製成之玻璃，其蝕刻結構係直接形成 17 201221494 於玻璃之表面上，因此不會被LED所產生之高溫破壞， 因而具有較高之性能以及較長之壽命，並且在應用於防 眩光的玻璃面板上不易產生變形且耐磨抗刮。 以上所述之實施例僅係說明本發明之技術思想與特 點，其目的在使熟習此項技藝之人士能夠瞭解本發明之内 容並據以實施’當不能以之限定本發明之專利範圍，若依 本發明所揭露之精神作均等變化或修飾，仍應涵蓋在本發 明之專利範圍内。 【圖式簡單說明】The time is 15 minutes; one of the glass (four) devices is cleaned by the fourth cleaning section, and the glass is blown dry (step 61 ()) n ❹Μ reaction time is 1 to 15 minutes; and the glass etching device - the lower section The (4) processed glass is sent out from the glass (four) device (step 611, after detailed description of the system structure and technical contents of the present invention described above), the following advantages can be summarized: 1. Produced by the manufacturing method of the present invention Etched glass, which has very good diffuser performance, so it can be applied in (4) the structure of the light panel to achieve the desired performance and longevity. 2. The -series manufacturing method used in the present invention, simplifies the traditional (four) glass machine It not only shortens the time of the process, but also saves costs, and is more secure for the operator. Therefore, it is a very promising device and process. 3. The glass etching device of the invention has very good productivity and can therefore be the same Produce more and more precise etched glass within time. 4. Due to the etched structure of the glass produced by the present invention Directly formed on the surface of the glass 201221494, so it will not be destroyed by the high temperature generated by the LED, so it has higher performance and longer life, and is not easy to be deformed and wear-resistant on the glass panel applied to the anti-glare. The above-mentioned embodiments are merely illustrative of the technical spirit and characteristics of the present invention, and the purpose of the present invention is to enable those skilled in the art to understand the contents of the present invention and to implement the patent scope of the present invention. If the spirit of the present invention is changed or modified equally, it should be covered within the scope of the patent of the present invention.
第一圖 第二圖 第三圖 第四圖 第五圖 第六圖 第七圖 係本發明一第—較佳實施例之玻璃蝕刻裝置 之架構示意圖； 係本發明該第—較佳實施例之淋幕蝕刻區段 結構示意圖； 係' 本發明第—較佳實施例之利用玻璃蝕刻裝 置蝕刻破璃的方法步驟圖示； 係本發明一第二較佳實施例之玻璃蝕刻裝置 之架構示意圖； 係本發明該第二較佳實施例之利用玻璃蝕刻 裝置蝕刻玻璃的方法步驟圖示； 係本發明一第三較佳實施例之玻璃蝕刻裝置 之架構示意圖； 係本發明該第三較佳實施例之浸入蝕刻區段 18 201221494 之結構示意圖；及 第八圖 係本發明第三較佳實施例之利用玻璃蝕刻裝 置蝕刻玻璃的方法步驟圖示。 【主要元件符號說明】 1 ' 3 ' 5 玻璃蝕刻裝置 10、50 玻璃 100 ' 300 、 500 上片區段 110 、 310 、 510 第一清洗區段 120 、 320 ' 520 緩衝區段 130 淋幕触刻區段 131 容器 132 、 532 姓刻液 133 流幕器 134 流幕口 135 循環栗 136 壓力調節閥 137 濾、清器 138 壓力計 139 加熱/冷卻器 140 、 340 、 540 第二清洗區段 150 、 350 ' 550 微拋光區段 160 > 360 ' 560 第三清洗區段 19 201221494 170 、 370 ' 570 中和區段 180 、 380 、 580 第四清洗區段 190 ' 390 ' 590 下片區段 201〜211 第一較佳實施例之步驟編號 330 喷塗姓刻區段 331 蝕刻液噴嘴 401〜411 第二較佳實施例之步驟編號 • 530 浸入姓刻區段 531 酸蝕槽 601〜611 第三較佳實施例之步驟編號 • 201 is a first embodiment, a third embodiment, a fourth embodiment, a fifth embodiment, a seventh embodiment, and a seventh embodiment of the present invention. A schematic diagram of a method for etching a glass etched device by a glass etching apparatus according to a first preferred embodiment of the present invention; and a schematic structural view of a glass etching apparatus according to a second preferred embodiment of the present invention; A schematic diagram of a method for etching a glass by using a glass etching apparatus according to the second preferred embodiment of the present invention; a schematic structural view of a glass etching apparatus according to a third preferred embodiment of the present invention; A schematic diagram of a immersion etched section 18 201221494; and an eighth illustration of a method of etching a glass using a glass etching apparatus according to a third preferred embodiment of the present invention. [Description of main component symbols] 1 ' 3 ' 5 Glass etching apparatus 10, 50 Glass 100 ' 300 , 500 Upper section 110 , 310 , 510 First cleaning section 120 , 320 ' 520 Buffer section 130 Screening touch area Section 131 Container 132, 532 Surname 133 Flow Screen 134 Flow Curtain 135 Recirculation Chest 136 Pressure Regulator 137 Filter Cleaner 138 Pressure Gauge 139 Heater/Cooler 140, 340, 540 Second Cleaning Section 150, 350 ' 550 micro-polished section 160 > 360 ' 560 third cleaning section 19 201221494 170 , 370 ' 570 neutral section 180 , 380 , 580 fourth cleaning section 190 ' 390 ' 590 lower section 201 ~ 211 Step No. 330 of a preferred embodiment Spraying the last minute section 331 Etching liquid nozzles 401 411 411 Step number of the second preferred embodiment • 530 Immersion lasting section 531 Acid etching tank 601 611 611 Third preferred embodiment Example step number • 20