TW201212146A - Handling device - Google Patents

Handling device Download PDF

Info

Publication number
TW201212146A
TW201212146A TW100109550A TW100109550A TW201212146A TW 201212146 A TW201212146 A TW 201212146A TW 100109550 A TW100109550 A TW 100109550A TW 100109550 A TW100109550 A TW 100109550A TW 201212146 A TW201212146 A TW 201212146A
Authority
TW
Taiwan
Prior art keywords
inspection
air
space
unit
outer layer
Prior art date
Application number
TW100109550A
Other languages
Chinese (zh)
Inventor
Tomoaki Hasegawa
Tomokazu Kiuchi
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW201212146A publication Critical patent/TW201212146A/en

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F7/00Ventilation
    • F24F7/04Ventilation with ducting systems, e.g. by double walls; with natural circulation
    • F24F7/06Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Combustion & Propulsion (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Ventilation (AREA)
  • Prevention Of Fouling (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The invention is able to solve the issues of large-sized device, complicated device, or device with high power consumption, at the same time to obtain the environment that fulfills the requirements for conducting inspection. The FPD inspection device of this invention includes a handling platform to transport work pieces, an inspection unit to examine the work pieces moving along the handling platform along the inspection line, the external layer of the handling unit for receiving the handling platform, and the external layer of the inspection part for receiving the inspection unit, the FFU that sends clean air out to the external layer, and the wind tunnel that guides clean air from the FFU to the inspection unit.

Description

201212146 六、發明說明: 【發明所屬之技術領域】 發明領域 本發明係有關於一種處理裝置,特別係有關於一種平 面顯示器用玻璃基板、半導體或印刷基板等處理對象基板 之處理裝置。 ί:先前技術3 發明背景 通常,平面顯示器(FPD)基板或半導體晶圓等之缺陷檢 查係在空間内之清潔度高之所謂無塵室内進行。一般,無 塵室具有於呈長方體之檢測空間之天花板等約等間隔地配 置之風扇過濾器單元(Fan Filter Unit : FFU)。藉以此FFU送 出之清潔之空氣於檢測空間内形成降流,無塵室内可保持 粒子等塵埃少之清潔之狀態。又,於如以下所示之專利文 獻1揭示有藉於地板側設複數個氣流調整風扇,可控制無塵 室内之氣流之技術。 先行技術文獻 專利文獻 專利文獻1 日本專利公開公報平8-114342號 【發明内容】 發明概要 發明欲解決之課題 然而,在上述習知之無塵室中,為獲得檢查等處理要 求之環境,需藉於檢測空間全體形成降流,將檢測空間内 201212146 全體保持在清潔 之狀態。因此,必須同時使複數個FFU運[Technical Field] The present invention relates to a processing apparatus, and more particularly to a processing apparatus for a substrate to be processed such as a glass substrate for a flat panel display, a semiconductor or a printed substrate. LY: Prior Art 3 Background of the Invention In general, defect inspection of a flat panel display (FPD) substrate or a semiconductor wafer is performed in a so-called clean room having high cleanliness in space. Generally, the clean room has a fan filter unit (Fan Filter Unit: FFU) arranged at equal intervals on a ceiling of a detection space of a rectangular parallelepiped. The clean air sent by the FFU forms a downflow in the detection space, and the dust-free room can maintain a state in which dust such as particles is less cleaned. Further, Patent Document 1 as shown below discloses a technique for controlling the airflow in the clean room by providing a plurality of air flow adjusting fans on the floor side. SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION However, in the above-mentioned clean room, in order to obtain an environment for processing such as inspection, it is necessary to borrow A downflow is formed in the entire detection space, and the entire 201212146 in the detection space is kept in a clean state. Therefore, it is necessary to transport multiple FFUs at the same time.

用以欲解決課題之手段 為達成此目的,本發明一態樣之處理裝置包含有搬送 對象基板之搬送台、對在該搬送台上移動之前述對象基板 施行預定處理之處理單元;該處理裝置之特徵在於包含有 收谷則述搬送台及前述處理單元之外層、將集塵處理後之 空氣送出至前述外層内之送風部、及將從前述送風部送出 之則述空氣引導至前述處理單元之風洞。 發明效果 根據本發明,由於藉將從送風部送出之清潔之空氣集 中於處理單元附近,而可令特別要求高清潔度之處理單元 附近有效率地呈清潔之狀態’故可實現避免裝置大型化及 複雜化或耗費電力增大等’並且獲得檢查等處理要求之環 境之處理裝置。 圖式簡單說明 第1圖係顯示第1實施形態之平面顯示器(FPD)檢查裝 置之概略結構的立體圖。 第2圖係顯示在第1實施形態中’於搬送路徑上未載置 工作件時之無塵室内之空氣之流動的模式圖。 第3圖係顯示在第1實施形態中,於搬送略經上載置有 4 201212146 工作件時之無塵室内之空氣之流動的模式圖。 第4圖係顯示於第1圖所示之FPD檢查裝置之搬送部外 層之天花板部份設有藉滑動而開關之門時之例的模式圖。 第5圖係顯示第2實施形態之F P D檢查裝置之概略結構 的模式截面圖,係顯示在第2實施形態中,從上游搬送空間 至檢查空間之搬送路徑上有工作件時之無塵室内之空氣之 流動的模式圖。 第6圖係顯示第2實施形態之F P D檢查裝置之概略結構 的模式截面圖,係顯示在本第2實施形態中,從檢查空間至 下游搬送空間之搬送路徑上有工作件時之無塵室内之空氣 之流動的模式圖。 第7圖係顯示第3實施形態之F P D檢查裝置之概略結構 的模式截面圖。 第8圖係顯示第4實施形態之FPD檢查裝置之概略結構 的模式截面圖,係顯示在本第4實施形態中,從上游搬送空 間至檢查空間之搬送路徑上有工作件時之無塵室内之空氣 之流動的模式圖。 第9圖係顯示第4實施形態之FPD檢查裝置之概略結構 的模式截面圖,係顯示在第4實施形態中,從檢查空間至下 游搬送空間之搬送路徑上有工作件時之無塵室内之空氣之 流動的模式圖。 I:實施方式3 用以實施發明之形態 以下,將用以實施本發明之形態與圖式一同詳細地說 5 201212146 月此外,在以下之說明中,各圖僅為概略地顯示形狀、 大丨及位置關係至可理解本發明之内容之程度,因而, 本’X月非僅限定在各圖所例示之形狀、大小及位置關係 者又,在各圖中,為明瞭結構,乃省略截面之剖面線之 告 P 。ffi 4v 丹者,在後述例示之數值僅為本發明較佳之例, 因而本發明非以例示之數值為限者。 第1實施形態 首先,就本發明第1實施形態之處理裝置,參照圖式, 羊說月此外,在以下之說明中,FpD用玻璃基板半 導體基板或印刷基板f處理對象基板(以下稱為卫作件)係 以線内式檢查裝置為例來說明。._,不限於此,亦可為離 線式檢查裝置。 第1圖係顯示本第1實施形態之平面顯示器㈣D)檢查 裝置之概略結構的立體圖。如第1圖所示,FPD檢查裝b a有搬送工作件之搬送台u〜16、檢測在搬送台μ〜μ上 作件之缺陷的檢查單元1〇。此外,檢查單元1〇亦 了將對工作件之缺陷部份進行之雷射騎修復或塗佈修正 等修復^、觀察㈣存圖像之拍攝單元、進行配線等之 尺寸測量、膜厚測量、顏色測量等之測量單元等的處理置 換成在預疋位置(處理區域)施行之其他處理單元。即,處理 単兀含有檢查單元、修復單元、拍攝單元、測量單元等。 搬送台14〜16分別具有以複數個長方形板可在與工作 件之搬送方向D垂直之方向於諸板間形成間隙之狀態等間 隔地排列之構造。藉將此搬送台14〜16於搬送方向〇排列, 201212146 可形成工作件之搬送路徑。工作件之搬送方法有於搬送台 設浮起板,使基板藉空氣浮起,同時,吸附保持基板之端 部來搬送之吸附搬送及於搬送台設複數個輥,而以親之旋 轉,搬送基板之輥搬送等。 檢查單元10拍攝通過設定於搬送台14〜16形成之搬送 路徑上之檢查線L15(處理區域)的工作件。藉解析以此檢查 單元1 〇取得之圖像,可檢測工作件是否有缺陷。檢杳線L15 設於搬送台15。檢查單元1〇設成可從上方拍攝檢查線U5。 在本說明中’將設檢查單元1〇之區域稱為檢查空間pR。又, 將檢查空間PR以外之區域稱為搬送空間TR。 搬送台14~ 16及檢查單元10固定於架台11。架台η以組 合有塊狀大理石或鋼材之框架等耐震性高之構件構成。此 外’於架台11與設置面(例如地板)間設以彈簣或油壓減震器 等構成之振動吸收機構12。藉此,可更減低搬送台14〜16 及檢查單元10之振動。 又,FPD檢查裝置1具有包圍檢查空間PR之檢查部外層 18、 分別包圍上游及下游搬送空間TR之搬送部外層17及 19。 檢查部外層18以及搬送部外層17及19藉組合,可形成! 個空間(無塵室)。即,形成收容搬送台及檢查單元之外層。 此無塵空間除了工作件之搬入口及搬出口以及下部之導管 以外,為密閉之空間。 在上述結構中,搬送部外層17及19以及檢查部外層is 之一部份形成將從FFU101送出之清潔空氣引導至檢查單 元10附近及檢查線L15周邊之風洞C。此風洞C只要為開口 201212146 朝向檢查單元ίο或從上方覆蓋檢查單元10之一部份之形狀 即可。在本第1實施形態中,藉使檢查部外層18之天花板對 搬送部外層17及19之天花板突出,形成有從上方覆蓋檢查 單元10之一部份之風洞C。因而,風洞c以搬送部外層17及 19以及檢查部外層18形成之天花板之突出之部份的側壁構 成。又’於此突出之部份、即檢查部外層18之天花板設用 以送出已去除粒子等塵埃之清潔之空氣(以下稱為清潔空 氣)的FFU101。即’ FFU101具有作為送出集塵處理後之空 氣(清潔空氣)之送風部的功能。因而,從FFU101送出之清 潔空氣藉以風洞C限制流動,可朝檢查單元10集中流動,之 後,集中流動至檢查單元10附近及檢查線L15周邊。結果, 可令檢查空間PR之特別是檢查單元10附近及檢查線L15周 邊呈塵埃少之清潔之狀態。又,集中送出至檢查單元1〇附 近及檢查線L15周邊之清潔之空氣在無塵室形成降流後,主 要從下部排氣口排放。 在此,參照圖式,詳細說明在檢查部外層18與搬送部 外層17及19形成之無塵室之空氣的流動。第2圖係顯示在本 第1實施形態中,於搬送路徑上未載置有工作件時之無塵室 内之空氣之流動的模式圖。第3圖係顯示在本第1實施形態 中,於搬送路徑上載置有工作件時之無塵室内之空氣之流 動的模式圖。 如第2圖所示,當工作件W未載置於搬送台14〜16上 時,從FFU101送出之清潔空氣首先形成以風洞C集中地流 往檢查單元10之降流FL0。接著,清潔空氣形成降流FL1, 8 201212146 以包圍檢查單元10。藉此,清潔空氣遍及檢查單元10附近 及檢查線L15周邊,而可獲得此區域之高清潔度。此外,形 成降流FL1之清潔空氣之後穿過搬送台15之間隙,流入至無 塵室内之下側。又,形成降流FL1之無塵空氣之一部份從檢 查部外層18内流入至搬送部外層17或19内。流入之清潔空 氣同樣地形成穿過搬送台14或15及16之間隙之降流FL2,流 入至無塵室内之下側。以降流FL1及FL2流入至無塵室之下 側之清潔空氣如第2圖之降流FL3所示,之後藉由形成於無 塵室、即分別形成於檢查部外層18之地板面以及搬送部外 層17及19之地板面的導管,排放至外部。惟,亦可為清潔 空氣之一部份從工作件W之搬入口或搬出口排放之結構。 另一方面,如第3圖所示,當工作件W载置於搬送台 14〜16上時,從FFU101送出之清潔空氣首先形成以風洞C集 地流往檢查單元10之降流FL0。接著’清潔空氣形成降流 FL4,以包圍檢查單元1〇,吹送至搬送台14〜16上之工作件 W。之後,以工作件W遮斷了往下方之流動之清潔空氣形 成沿著工作件W之上面朝向至端部之氣流。藉此,不僅 檢查單元10附近及檢查線L15周邊,工作件…之上面側亦可 呈塵埃少之清潔的狀態。之後,沿著工作件W之上面流動 之π春空氣在工作件w之端部形成流入至工作件w之下方 之氣流FL6後,如第3圖之降流FL3所示,藉由分別形成於 檢查部外層18之地板面以及搬送部外層17及19之地板面之 導管,排放至外部。 如以上,在本第1實施形態中,構造成從FFU101送出 201212146 之清潔空氣集中流動至特別要求高清潔度之檢查單元10附 近及檢查線L15周邊。結果,在本第1實施形態中,由於令 特別要求高清潔度之區域使用少數之FFU(1個FFU),而可 有效率地呈清潔之狀態,故可避免裝置之大型化及複雜化 或耗費電力之增大等,並且可獲得對檢查等要求之環境。 又’在未設有檢查單元1〇之區域、即搬送空間TR,藉 令搬送台Μ〜16上之工作件w之上面與搬送部外層π及19 之天花板間之空間為狹窄,流至檢查單元1〇附近及檢查線 L15周邊之清潔空氣可有效率地在工作件w上面傳遞,流至 工作件W端部。結果,可有效率地防止因搬送時之灰塵產 生等引起之塵埃在工作件表面W的附著。即,不僅檢查單 元10附近及檢查線L15周邊,連工作件w上之空間亦可有效 率地保持在清潔之狀態。 又,為可於維修時,進入至裂置内部,亦可於外層部 設門。此門亦可為可將搬送部外層[7及丨9之天花板部份開 關之門。第4圖係顯示於第1圖所示之FpD檢查裝置之搬送 部外層之天花板部份設有藉滑動而開關之門時之例的模式 圖。如第4圖所示,設在搬送部外層Η之天花板部份之門具 有片狀擋門112 '藉捲繞擋門112而收容之捲繞機構〖Η。同 樣地,設在搬送部外層19之天花板部份之門具有片狀擋門 114、藉捲繞擋門114而收容之捲繞機構113。藉捲繞機構 111/113旋轉,擋門112/114在搬送部外層17/19之天花板部份 於箭號D1/D2方向移動。藉此,搬送部外層17/19之天花板 部份可開關。此外,亦可採用可以外部驅動開關之構造之 10 201212146 門或其他伸縮囊式、輥式門《藉形成此種結構,可易進行 在去除垃圾或搬送中破損之工作件之處理等的維佟。 又,外層部之強度僅對之處理區域周邊之 外層部份要求高強度。其他之外層部則不需高強度。即, 相對於檢查部外層18,搬送部外層17及19之強度可為低 者。用於搬送部外層17及19之材料亦可為伸縮彈1構件^ 藉形成此種結構,可謀求裝置之簡易化及輕量化。 第2實施形態 接著,就本發明之第2實施形態之檢查裝置,參照圖 式,詳細說明。此外,在以下之說明中,關於與上述第工 實施形態相同之結構,附上同一標號,省略重複之說明。 第5圖及第6圖係顯示本第2實施形態之FPD檢查骏置 之概略結構的模式截面圖。此外,在第5圖中,顯示在本第 2實施形態’從上游搬送空間至檢查空間之搬送路徑上有工 作件時之無塵室内之空氣的流動。又,在第6圖中,顯示在 本第2實施形態中’從檢查空間至下游搬送空間之搬送路押 上有工作件時之無塵室内之空氣的流動。 如第5圖及第6圖所示,本第2實施形態之FPD檢查较置 2在與第1圖〜第3圖所示之FPD檢查裝置1相同之結構中, 於 上游搬送空間T R之搬送台14下側具有排氣風扇21 a作為主 動地將無塵室内之空氣排放至外部之排氣口,並且於下、轉 搬送空間TR之搬送台16下側具有將無塵室内之空氣主動地 排放至外部之排氣風扇21b。又,FPD檢查裝置2具有探% 於上游搬送空間TR側及下游搬送空氣TR任一側是否有^ 201212146 作件W之感測器22a及22b。 感測器22a及22b以光學感測器或紅外線感測器構成, 檢測於自身上方是否有工作件W。此感測器22a及22b配置 於為工作件W之搬送路徑上,並通過檢查空間pr或ffuIOI 之送風口之中心,且以與搬送方向D垂直之面及搬送路徑之 父點為中心之點對稱的位置。惟,不限於此,只要可探測 於上游搬送空間TR側與下游搬送空間TR之任一側是否有 工作件W即可。又,感測器22a及22b之檢測結果可輸入至 圖中未示之控制部。控制部並依據所輸入之檢測結果,控 制排氣風扇21a及21b。 舉例言之’當以感測器22a檢測出上方之工作件w時, 即’檢測出上游搬送空間TR側有工作件W時,如第5圖所 示’控制部驅動排氣風扇21a。藉此,從FFU101形成降流 FL0及FL4而流至檢查單元1〇附近之清潔空氣形成沿著工 作件W之上面之氣流FL5及流入至工作件W下方之氣流FL6 後’以排氣風扇21a積極地形成降流FL7,從無塵室排放。 此外’此時’不驅動無工作件W之下游搬送空間tr側之排 氣風扇21b。因此,從FFU101形成降流FL0後吹送至檢查單 元1 〇之清潔空氣與第1實施形態同樣地,形成穿過搬送台! 5 及16各自之間隙之降流FL1&FL2,流至搬送台14〜16之下 側後,形成經由導管之降流FL3,而從無塵室排放。 另一方面,以感測器22b檢測出上方之工作件w時, 即’檢測出於下游搬送空間TR側有工作件W時,如第6圖所 示,控制部驅動排氣風扇21 b。藉此,從FFU101形成降流 12 201212146 FLO及FL4,流至檢查單元l〇附近及檢查線L15周邊之清潔 空氣形成沿著工作件W上面之氣流FL5及流入至工作件W 下方之氣流FL6後’以排氣風扇21b積極地形成降流FL8, 從無塵室排放。此時,由於不驅動無工作件…之上游搬送 空氣7尺側之排氣風扇213,故從??11101形成降流?1^0後吹送 至檢查單元10之清潔空氣與第5圖同樣地,形成穿過搬送台 14之間隙之降流FL1及FL2,流至搬送台14〜16之下側後, 形成經由導管之降流FL3,從無塵室排放。 此外,感測器22a與感測器22b間之距離相對於工作件 W之搬送方向D之長度,可長可短。當令2個感測器22a及22b 間之距離較工作件W之搬送方向D的長度長時,若於2個感 測器22a及22b間有工作件W時,控制部亦可驅動排氣風扇 21a及21b兩者。另一方面,當令2個感測器22a及22b間之距 離較工作件W之搬送方向D的長度短時,控制部亦可於以2 個感測器22a及22b兩者檢測工作件w之期間,驅動排氣風 扇21a及2lb兩者。 如以上,本第2實施形態具有驅動排氣風扇21a或21b, 而使許多清潔空氣流至有工作件w之側。藉此,在本第2實 施形態中,不僅特別要求高清潔度之檢查單元1〇附近及檢 查線U5周邊’按照工作件r位置’亦可有效率地使清潔 空氣流至作件W之上面。結果,可準確且有效率地防止 因搬送時之灰塵產生引起之塵埃在卫作件w表面的附著。 即,不僅檢查單附近及檢查線U5周邊,連工作件w上 之空間亦可準Μ有效率地保持清潔之狀態。 13 201212146 此外’在上述中’舉了使用2他 工柞杜w如 個感測器22a及22b ,檢測 工作件W之存在之情形為例, 於此,亦可構造成當平 乂圖中未示之位置感測器監視工 a At- ^ ^ , 作件w之位置時,依據 μ此位置感測器所檢測出 2lb〇 v, ^ 位置,驅動排氣風扇21a及 2lb。此外,除了上述感測器 ^ ,ΰτ 亦可從工作件搬送驅動之 控制。P(PLC)界定工作件位置。 杳此外,本第2實施形態之檢 查早几1〇亦可將對工作件之缺陷 或塗佈修正等修復單元、觀察及料=之雷射照射修復 ”及保持圖像之拍攝單元、進 仃配線等之尺寸測量、獏厚 ㈣重顏色測量等之測量單元 -处理置換成在預定位置(處理區域)施行之其他處理單 ^即’處理單元包含檢查單元、修復單元、拍攝單元、 測量單元等。又’由於其他之結構及效果與上述第i實施形 態相同,故在此省略重複之說明。 第3實施形態 接著,就本發明第3實施形態,參照圖式,詳細說明。 此外,在以下之說明中,關於與上述^實施形態相同之結 構,附上相同之標號,省略重複之說明。 第7圖係顯示本第3實施形態之F P D檢查裝置之概略結 構的模式截面圖。如第7圖所示,本第3實施形態之FpD檢 查裝置3在與第1圖〜第3圖所示之FPD檢查裝置丨相同之結 構中,形成檢查空間PR之檢查部外層18置換成檢查部外層 28檢查部外層28係開口朝向檢查單元1 〇或從上方覆蓋檢 查單元10之一部份之風洞以呈具有相對於無塵空氣之送出 口,本體部較細之收縮部CC的形狀。藉於風洞CH^收縮部 201212146 CC,可使檢查單元ι〇附近之清潔空氣之風速增大。藉此, 由於在檢查單元10附近及檢查線L15周邊,形成風速大之降 流FL9 ’故可將特別要求兩清潔度之檢查單元丨〇附近及檢查 線L15周邊更有效率地保持清潔之狀態。此外,第3實施例 之檢查單元10亦可將對工作件之缺陷部份進行之雷射照射 修復或塗佈修正等修復單元、觀察及保存圖像之拍攝單 疋、進行配線等之尺寸測量、膜厚測量、顔色測量等之測 量單元等處理置換成在預定位置施行之其他處理單元。 即’處理單元包含檢查單元、修復單力、拍攝單元、測量 單兀等。此外,由於其他之結構及效果與上述第丨或第2實 施形態相同,故在此省略重複之說明。 第4實施形態 接著,就本發明第4實施形態,參照圖式,詳細說明。 此外,在以下之說明中,關於與上述第1〜3實施形態相同之 結構,附上相同之標號,省略重複之說明。 第8圖及第9圖係顯示第4實施形態之FpD檢查裝置之 概略結構的模式戴面圖。此外,在第8圖中,顯示在本第4 貫施升v態中’從上游搬送空間至檢查空間之搬送路徑上有 工作件時之無塵室内之空氣的流動。又,在第9圖中,顯示 在本第4實;㈣中,從檢查空間至下游搬送空間之搬送路 徑上有工作件時之無塵室内之空氣的流動。 如第8圖及第9圖所示,本第4實施形態之FPD檢查敦置 4係在與第1圖〜第3圖所示之FpD檢查裝置工相同之結構 中’具有可選擇地限制供從卿⑻送出之清潔空氣形成降 15 201212146 流FLO後流動之導風路徑的導風路徑控制閥4la及4lb。又, FPD檢查裝置4與第5圖及第6圖所示之FPD檢查裝置2同樣 地,具有探測於上游搬送空間TR側及下游搬送空間tr任一 側是否有工作件之感測器22a及22b。 在此結構中’導風路徑控制閥41 a及41 b通常收容於檢 查部外層18之沿著風洞C之内壁面的位置。在此,以感測器 22a檢測出上方之工作件W時,即,檢測出於上游搬送空間 TR側有工作件W時,如第8圖所示,控制部藉控制圖中未示 之驅動部,控制下游側導風路徑控制閥41a。藉此,可限制 從F F U101形成降流F L 0後吹送至檢查單元1 〇之清潔空氣流 入至下游。結果,從FFU101送出之大部份之清潔空氣形成 降流F L 4及氣流F L 5而在位於上游之工作件w上面流動後, 在工作件W之端部形成流入至工作件W之下方的氣流 FL6,而流入至搬送台14〜16之下側。之後,如第8圖之降流 FL3所示,藉由分別形成於檢查部外層18之地板面以及搬送 部外層17及19之地板面之導管’排放至外部。 另一方面,當以感測器22b檢測出上方之工作件W時, 即,檢測出於下游之搬送空間TR側有工作件W時,如第9 圖所示,控制部藉控制圖中未示之驅動部,控制上游側導 風路徑控制閥41b。藉此’可限制從FFU101形成降流FL0後 吹送至檢查單元10之清潔空氣流入至上游。結果,從 FFU101送出之大部份之清潔空氣形成降流FL4及氣流FL5 而在位於下游之工作件1^上面流動後,在工作件W之端部 形成流入至工作件w之下方的氣流FL6,而流入至搬送台 16 201212146 14〜16之下側。之後,第9圖之降流⑴所示,藉由分別形 成於檢查部外層18之地板面以及搬送部外層17及丨9之地板 面的導管,排放至外部。 如以上,本第4實施形態具有開關導風路徑控制閥— 及41b ’而使許多清潔空氣流至有工作件w之側之結構。藉 此’在本帛4實郷態,;^僅_要求冑料紅檢查單元 10附近及檢查線L15周邊,按照工作件w之位置,也有效率 地抓至工作件w之上面。結果,可準確且有效率地防止因 搬送時之灰塵產生等引起之塵埃在卫作件W表面之附著。 即,不僅檢查單元10附近及檢查線L15周邊,連工作件W上 之空間亦可準確且有效率地保持清潔之狀態。此外,第4實 施例之榀查單元1〇亦可將對工作件之缺陷部份進行之雷射 照射修復或塗佈修正等修復單元、觀察及保存圖像之拍攝 單元、進行配線等之尺寸測量、膜厚測量、顏色測量等之 測量單元等處理置換成在預定位置施行之其他處理單元。 即,處理單元包含檢查單元、修復單元、拍攝單元、測量 單元等。此外,由於其他之結構及效果與上述第丨〜第3實施 形態相同,故在此省略重複之說明。 又,上述貫施形態僅為用以實施本發明之例,本發明 非以該等為限者,按規格等進行各種變形係在本發明之範 圍内,再者,從上述記载自然可明瞭在本發明之範圍内, 可進行其他各種實施形態。舉例言之,對各實施形態適當 例示之變形例亦可對其他實施形態應用是無須贅言的。 17 201212146 【圖式簡單說明】 第1圖係顯示第1實施形態之平面顯示器(FPD)檢查裝 置之概略結構的立體圖。 第2圖係顯示在第1實施形態中,於搬送路徑上未載置 工作件時之無塵室内之空氣之流動的模式圖。 第3圖係顯示在第1實施形態中,於搬送路徑上載置有 工作件時之無塵室内之空氣之流動的模式圖。 第4圖係顯示於第1圖所示之FPD檢查裝置之搬送部外 層之天花板部份設有藉滑動而開關之門時之例的模式圖。 第5圖係顯示第2實施形態之FPD檢查裝置之概略結構 的模式截面圖,係顯示在第2實施形態中,從上游搬送空間 至檢查空間之搬送路徑上有工作件時之無塵室内之空氣之 流動的模式圖。 第6圖係顯示第2實施形態之F P D檢查裝置之概略結構 的模式截面圖,係顯示在本第2實施形態中,從檢查空間至 下游搬送空間之搬送路徑上有工作件時之無塵室内之空氣 之流動的模式圖。 第7圖係顯示第3實施形態之F P D檢查裝置之概略結構 的模式截面圖。 第8圖係顯示第4實施形態之F P D檢查裝置之概略結構 的模式截面圖,係顯示在本第4實施形態中,從上游搬送空 間至檢查空間之搬送路徑上有工作件時之無塵室内之空氣 之流動的模式圖。 第9圖係顯示第4實施形態之F P D檢查裝置之概略結構 18 201212146 的模式截面圖,係顯示在第4實施形態中,從檢查空間至下 游搬送空間之搬送路徑上有工作件時之無塵室内之空氣之 流動的模式圖。 【主要元件符號說明】 1-4…FPD檢查裝置 112,114...擋門 10…檢查單元 C,C1...風洞 11...架台 CC...收縮部 12...振動吸收機構 D...搬送方向 14-16...搬送台 D卜D2".箭號 17,19...搬送部外層 FL0-FL4,FL7-FL9…降流 18,28...檢查部外層 FL5,FL6...氣流 21a,21b...排氣風扇 L15...檢查線 22a,22b...感測器 PR...檢查空間 41a,41b...導風路徑控制閥 TR...搬送空間 101...FFU W...工作件 111,113...捲繞機構 19In order to achieve the object, a processing apparatus according to an aspect of the present invention includes a transfer table for transferring a substrate to be processed, and a processing unit for performing predetermined processing on the target substrate moving on the transfer table; The present invention is characterized in that it includes a transfer tray and an outer layer of the processing unit, a blower that sends the air after the dust collection to the outer layer, and an air that is sent from the blower to the processing unit. Wind tunnel. Advantageous Effects of Invention According to the present invention, since the clean air sent from the air blowing unit is concentrated in the vicinity of the processing unit, the vicinity of the processing unit particularly requiring high cleanliness can be efficiently cleaned, so that the device can be prevented from being enlarged. And a processing device that complicates or consumes electric power, etc., and obtains an environmental treatment request such as inspection. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a schematic configuration of a flat panel display (FPD) inspection apparatus according to a first embodiment. Fig. 2 is a schematic view showing the flow of air in the clean room when the workpiece is not placed on the transport path in the first embodiment. Fig. 3 is a schematic view showing the flow of air in the clean room when the 4 201212146 workpiece is placed on the transport in the first embodiment. Fig. 4 is a schematic view showing an example in which the ceiling portion of the outer layer of the conveying portion of the FPD inspection apparatus shown in Fig. 1 is provided with a door for opening and closing by sliding. Fig. 5 is a schematic cross-sectional view showing a schematic configuration of an FPD inspection apparatus according to a second embodiment, showing a dust-free room when there is a workpiece from the upstream transfer space to the transport path of the inspection space in the second embodiment. A pattern diagram of the flow of air. FIG. 6 is a schematic cross-sectional view showing a schematic configuration of an FPD inspection apparatus according to a second embodiment, and shows a clean room in which a workpiece is placed on a conveyance path from an inspection space to a downstream conveyance space in the second embodiment. A pattern diagram of the flow of air. Fig. 7 is a schematic cross-sectional view showing a schematic configuration of an F P D inspection apparatus according to a third embodiment. FIG. 8 is a schematic cross-sectional view showing a schematic configuration of an FPD inspection apparatus according to a fourth embodiment, and shows a clean room in which a workpiece is placed on the transport path from the upstream transport space to the inspection space in the fourth embodiment. A pattern diagram of the flow of air. FIG. 9 is a schematic cross-sectional view showing a schematic configuration of an FPD inspection apparatus according to a fourth embodiment, and shows a clean room in which a workpiece is present on a conveyance path from an inspection space to a downstream conveyance space in the fourth embodiment. A pattern diagram of the flow of air. I. Embodiment 3 Mode for Carrying Out the Invention Hereinafter, the form for carrying out the present invention will be described in detail with reference to the drawings. 5 201212146. In addition, in the following description, each figure only shows the shape and the outline. And the positional relationship is to the extent that the content of the present invention can be understood. Therefore, the 'X month is not limited to the shape, size, and positional relationship exemplified in each figure. In each figure, the structure is omitted, and the section is omitted. Cross-section report P. The numerical values exemplified in the following description are only preferred examples of the present invention, and thus the present invention is not limited to the numerical values exemplified. First Embodiment First, the processing apparatus according to the first embodiment of the present invention will be described with reference to the drawings. In the following description, the glass substrate semiconductor substrate for FpD or the printed substrate f is used to process the target substrate (hereinafter referred to as Wei). The workpiece is described by taking an in-line inspection device as an example. ._, not limited to this, it can also be an off-line inspection device. Fig. 1 is a perspective view showing a schematic configuration of a flat panel display (four) D) inspection apparatus according to the first embodiment. As shown in Fig. 1, the FPD inspection unit b a has transport units u to 16 for transporting the workpieces, and an inspection unit 1 for detecting defects on the transport tables μ to μ. In addition, the inspection unit 1 also performs repairs such as laser riding repair or coating correction on the defective portion of the workpiece, observation (4) imaging unit for storing images, dimension measurement of wiring, etc., film thickness measurement, The processing of the measurement unit or the like of the color measurement or the like is replaced with another processing unit that is executed at the pre-turn position (processing area). That is, the processing unit includes an inspection unit, a repair unit, a photographing unit, a measuring unit, and the like. Each of the transfer tables 14 to 16 has a structure in which a plurality of rectangular plates can be arranged in a state in which a gap is formed between the plates in a direction perpendicular to the transport direction D of the workpiece. By transporting the transfer tables 14 to 16 in the transport direction, the 201212146 can form a transport path for the workpiece. In the transfer method of the workpiece, the floating plate is provided on the transfer table, and the substrate is floated by the air. At the same time, the end of the substrate is adsorbed and held, and the transfer is carried out, and a plurality of rollers are disposed on the transfer table, and the transfer is carried out by the parent. Roller transfer of the substrate, etc. The inspection unit 10 captures a workpiece passing through the inspection line L15 (processing area) set on the transport path formed by the transport stages 14 to 16. By analyzing the image obtained by checking the unit 1 , it is possible to detect whether the workpiece is defective. The inspection line L15 is provided on the transfer table 15. The inspection unit 1 is configured to take an inspection line U5 from above. In the present description, the area in which the inspection unit 1 is located is referred to as an inspection space pR. Further, an area other than the inspection space PR is referred to as a conveyance space TR. The transfer tables 14 to 16 and the inspection unit 10 are fixed to the gantry 11. The gantry η is composed of a member having a high shock resistance such as a frame of a block of marble or steel. Further, a vibration absorbing mechanism 12 composed of a magazine or a hydraulic shock absorber is disposed between the gantry 11 and the installation surface (e.g., the floor). Thereby, the vibration of the transfer tables 14 to 16 and the inspection unit 10 can be further reduced. Further, the FPD inspection apparatus 1 has an outer layer 18 for inspecting the inspection space PR, and outer layers 17 and 19 for conveying portions that surround the upstream and downstream conveyance spaces TR, respectively. The outer layer 18 of the inspection portion and the outer layers 17 and 19 of the conveying portion can be combined to form! Space (clean room). That is, the outer layer that accommodates the transfer table and the inspection unit is formed. This dust-free space is a closed space except for the entrance and exit of the work piece and the duct of the lower part. In the above configuration, the outer portions 17 and 19 of the conveying portion and the outer portion is of the inspection portion form a wind tunnel C which guides the clean air sent from the FFU 101 to the vicinity of the inspection unit 10 and the periphery of the inspection line L15. The wind tunnel C may be shaped such that the opening 201212146 faces the inspection unit ίο or covers a portion of the inspection unit 10 from above. In the first embodiment, the ceiling of the outer layer 18 of the inspection portion protrudes from the ceiling of the outer layers 17 and 19 of the conveying portion, and a wind tunnel C covering a part of the inspection unit 10 from above is formed. Therefore, the wind tunnel c is constituted by the side walls of the protruding portions of the ceiling portions 17 and 19 of the conveying portion and the outer layer 18 of the inspection portion. Further, the portion of the outer portion of the inspection unit outer layer 18 is provided with an FFU 101 for supplying clean air (hereinafter referred to as clean air) from which dust such as particles is removed. In other words, the FFU 101 has a function as a blowing portion for sending air (clean air) after the dust collecting treatment. Therefore, the clean air sent from the FFU 101 is restricted from flowing by the wind tunnel C, and can be concentratedly flowed toward the inspection unit 10, and then concentratedly flows to the vicinity of the inspection unit 10 and the periphery of the inspection line L15. As a result, it is possible to make the inspection space PR particularly clean in the vicinity of the inspection unit 10 and the inspection line L15 with less dust. Further, the clean air that is sent out to the vicinity of the inspection unit 1 and the inspection line L15 is mainly discharged from the lower exhaust port after the cleaned air is formed in the clean room. Here, the flow of air in the clean room formed by the outer layer 18 of the inspection portion and the outer layers 17 and 19 of the conveying portion will be described in detail with reference to the drawings. Fig. 2 is a schematic view showing the flow of air in the clean room when the workpiece is not placed on the transport path in the first embodiment. Fig. 3 is a schematic view showing the flow of air in the clean room when the workpiece is placed on the transport path in the first embodiment. As shown in Fig. 2, when the workpiece W is not placed on the transfer tables 14 to 16, the clean air sent from the FFU 101 first forms a downflow FL0 which is concentrated in the wind tunnel C to the inspection unit 10. Then, the clean air forms a downflow FL1, 8 201212146 to surround the inspection unit 10. Thereby, the clean air is passed around the inspection unit 10 and the periphery of the inspection line L15, and the high cleanliness of this area can be obtained. Further, the clean air which forms the downflow FL1 passes through the gap of the transfer table 15 and flows into the lower side of the clean room. Further, a part of the dust-free air forming the downflow FL1 flows from the inside of the outer layer 18 of the inspection portion into the outer layer 17 or 19 of the conveying portion. The inflowing clean air similarly forms a downflow FL2 passing through the gap between the transfer tables 14 or 15 and 16 and flows into the lower side of the clean room. The clean air flowing into the lower side of the clean room by the downflows FL1 and FL2 is as shown in the downflow FL3 of Fig. 2, and then formed in the clean room, that is, the floor surface and the conveying portion which are respectively formed on the outer layer 18 of the inspection portion. The ducts on the floor surfaces of the outer layers 17 and 19 are discharged to the outside. However, it is also possible to discharge a part of the clean air from the inlet or the outlet of the work piece W. On the other hand, as shown in Fig. 3, when the workpiece W is placed on the transfer tables 14 to 16, the clean air sent from the FFU 101 first forms a downflow FL0 which flows toward the inspection unit 10 in a wind tunnel C. Then, the clean air forms a downflow FL4 to surround the inspection unit 1 and is blown to the work piece W on the transfer tables 14 to 16. Thereafter, the flow of clean air flowing downward is formed by the work piece W to form an air flow toward the end portion along the upper surface of the work piece W. Thereby, not only the vicinity of the inspection unit 10 but also the periphery of the inspection line L15, the upper side of the work member can be cleaned with less dust. Thereafter, the π spring air flowing along the upper surface of the workpiece W forms an airflow FL6 flowing into the lower side of the workpiece w at the end of the workpiece w, and is formed by the downstream flow FL3 as shown in FIG. 3, respectively. The floor surface of the outer layer 18 of the inspection portion and the floor surface of the outer layers 17 and 19 of the conveying portion are discharged to the outside. As described above, in the first embodiment, the clean air that is sent from the FFU 101 and 201212146 is configured to flow intensively to the vicinity of the inspection unit 10 and the inspection line L15 which are particularly required for high cleanliness. As a result, in the first embodiment, since a small number of FFUs (1 FFU) are used in a region where high cleanliness is particularly required, the cleaning can be efficiently performed, so that the size and complexity of the device can be avoided or An increase in power consumption, etc., and an environment for inspection and the like can be obtained. Further, in the area where the inspection unit 1 is not provided, that is, the conveyance space TR, the space between the upper surface of the workpiece w on the conveyance table 16 and the ceiling of the outer layer π and 19 of the conveyance portion is narrow, and the inspection is performed. The clean air near the unit 1〇 and around the inspection line L15 can be efficiently transferred over the work piece w to the end of the work piece W. As a result, adhesion of dust due to dust generation during transportation or the like to the surface W of the workpiece can be effectively prevented. That is, not only the vicinity of the inspection unit 10 but also the periphery of the inspection line L15, the space on the work member w can be effectively maintained in a clean state. Further, in order to be able to enter the inside of the split during maintenance, a door may be provided in the outer layer. This door can also be a door that can open the outer part of the conveyor [7 and 丨9. Fig. 4 is a schematic view showing an example in which the ceiling portion of the outer layer of the conveying portion of the FpD inspection device shown in Fig. 1 is provided with a sliding door. As shown in Fig. 4, the door provided in the ceiling portion of the outer layer of the conveying portion has a sheet-like stopper door 112' which is a winding mechanism that is accommodated by winding the shutter 112. Similarly, the door provided in the ceiling portion of the outer layer 19 of the conveying portion has a sheet-like stopper door 114 and a winding mechanism 113 accommodated by winding the shutter 114. By the rotation of the winding mechanism 111/113, the shutter 112/114 moves in the direction of the arrow D1/D2 in the ceiling portion of the outer layer 17/19 of the conveying portion. Thereby, the ceiling portion of the outer layer 17/19 of the conveying portion can be switched. In addition, it is also possible to use a 10 201212146 door or other bellows type or roller type door that can externally drive the switch. . Further, the strength of the outer layer portion requires only high strength for the outer layer portion around the treatment region. Other outer layers do not require high strength. That is, the strength of the outer layers 17 and 19 of the conveying portion with respect to the outer layer 18 of the inspection portion can be low. The material for the outer layers 17 and 19 of the conveying portion may be such a structure that the telescopic projectile 1 member can be formed, and the device can be simplified and reduced in weight. (Second Embodiment) Next, an inspection apparatus according to a second embodiment of the present invention will be described in detail with reference to the drawings. In the following description, the same components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof will not be repeated. Fig. 5 and Fig. 6 are schematic cross-sectional views showing a schematic configuration of an FPD inspection apparatus according to the second embodiment. Further, in the fifth embodiment, the flow of air in the clean room in the case where there is a workpiece from the upstream transfer space to the transport path of the inspection space is shown. Further, in the second embodiment, the flow of air in the clean room when the workpiece is placed on the transport path from the inspection space to the downstream transport space is shown in the second embodiment. As shown in Fig. 5 and Fig. 6, the FPD inspection of the second embodiment is carried out in the same configuration as the FPD inspection apparatus 1 shown in Figs. 1 to 3, and is transported in the upstream transport space TR. The lower side of the stage 14 has an exhaust fan 21a as an exhaust port for actively discharging the air in the clean room to the outside, and has an air on the lower side of the transfer table 16 of the lower and reverse transfer space TR to actively move the air in the clean room The exhaust fan 21b is discharged to the outside. Further, the FPD inspection apparatus 2 has sensors 22a and 22b which detect whether or not there is a 201212146 workpiece W on either the upstream conveyance space TR side and the downstream conveyance air TR side. The sensors 22a and 22b are constituted by an optical sensor or an infrared sensor, and detect whether there is a workpiece W above itself. The sensors 22a and 22b are disposed on the transport path of the workpiece W, and pass through the center of the air supply port of the inspection space pr or ffuIOI, and are centered on the plane perpendicular to the transport direction D and the parent point of the transport path. Symmetrical position. However, the present invention is not limited thereto, and it is only necessary to detect whether or not there is a work piece W on either side of the upstream transfer space TR side and the downstream transfer space TR. Further, the detection results of the sensors 22a and 22b can be input to a control unit not shown. The control unit controls the exhaust fans 21a and 21b in accordance with the input detection result. For example, when the upper working member w is detected by the sensor 22a, that is, when the working member W is detected on the upstream transfer space TR side, as shown in Fig. 5, the control unit drives the exhaust fan 21a. Thereby, the clean air flowing from the FFU 101 to the vicinity of the inspection unit 1 is formed by the downflow FL0 and FL4, and the airflow FL5 along the upper surface of the workpiece W and the airflow FL6 flowing under the workpiece W are formed. Actively form the downflow FL7 and discharge it from the clean room. Further, at this time, the exhaust fan 21b on the downstream side of the transport space tr without the workpiece W is not driven. Therefore, the clean air blown to the inspection unit 1 after the downflow FL0 is formed from the FFU 101 is formed through the transfer table in the same manner as in the first embodiment! The downflows FL1 & FL2 of the respective gaps of 5 and 16 flow to the lower side of the transfer stages 14 to 16 to form a downflow FL3 via the duct, and are discharged from the clean room. On the other hand, when the upper working member w is detected by the sensor 22b, that is, when the workpiece W is detected on the downstream conveying space TR side, as shown in Fig. 6, the control unit drives the exhaust fan 21b. Thereby, the downflow 12 201212146 FLO and FL4 are formed from the FFU 101, and the clean air flowing near the inspection unit 10 and the inspection line L15 forms the airflow FL5 along the upper surface of the workpiece W and the airflow FL6 flowing under the workpiece W. The downflow FL8 is actively formed by the exhaust fan 21b, and is discharged from the clean room. At this time, since the exhaust fan 213 on the 7-foot side of the air is not driven upstream of the no-moving member, the slave is removed. ? 11101 formed a downflow? The clean air blown to the inspection unit 10 after 1^0 is formed into a downflow FL1 and FL2 passing through the gap of the transfer table 14 in the same manner as in the fifth embodiment, and flows to the lower side of the transfer tables 14 to 16, and then formed through the conduit. Downflow FL3, discharged from the clean room. Further, the distance between the sensor 22a and the sensor 22b may be longer or shorter than the length of the transport direction D of the workpiece W. When the distance between the two sensors 22a and 22b is longer than the length of the transport direction D of the workpiece W, if there is a workpiece W between the two sensors 22a and 22b, the control unit can also drive the exhaust fan. Both 21a and 21b. On the other hand, when the distance between the two sensors 22a and 22b is shorter than the length of the transport direction D of the workpiece W, the control unit can detect the workpiece w with both of the two sensors 22a and 22b. During this period, both of the exhaust fans 21a and 2lb are driven. As described above, the second embodiment has the driving of the exhaust fan 21a or 21b, and a lot of clean air flows to the side having the workpiece w. Therefore, in the second embodiment, not only the vicinity of the inspection unit 1A having high cleanliness but also the vicinity of the inspection line U5 'according to the position of the workpiece r' can efficiently flow the cleaning air to the upper surface of the workpiece W. . As a result, it is possible to accurately and efficiently prevent the adhesion of the dust caused by the dust generated during the transportation on the surface of the guard w. That is, not only the vicinity of the inspection sheet but also the periphery of the inspection line U5, the space on the work piece w can be kept clean and efficiently. 13 201212146 In addition, 'in the above-mentioned', the use of 2 other workers such as a sensor 22a and 22b, detecting the existence of the working piece W as an example, here, can also be configured to be in the map The position sensor monitor a at- ^ ^ is shown, and when the position of the workpiece w is detected, the exhaust fans 21a and 2lb are driven according to the position detected by the position sensor by 2 lb 〇v, ^. In addition, in addition to the above-mentioned sensor ^, ΰτ can also be controlled from the workpiece transport drive. P (PLC) defines the position of the work piece. In addition, in the inspection of the second embodiment, the repair unit such as the defect of the workpiece or the correction of the coating, the laser irradiation repair of the observation and the material can be repaired, and the image capturing unit for holding the image can be used. Measurement unit for wiring size measurement, thickness measurement (4) heavy color measurement, etc. - processing is replaced with other processing units executed at predetermined positions (processing areas). The processing unit includes an inspection unit, a repair unit, a photographing unit, a measuring unit, and the like. In addition, the other structures and effects are the same as those of the above-described first embodiment, and the description thereof will not be repeated here. Third Embodiment Next, a third embodiment of the present invention will be described in detail with reference to the drawings. In the above description, the same components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof will not be repeated. Fig. 7 is a schematic cross-sectional view showing the schematic configuration of the FPD inspection apparatus according to the third embodiment. As shown in the figure, in the FpD inspection apparatus 3 of the third embodiment, the inspection space PR is formed in the same configuration as the FPD inspection apparatus 第 shown in Figs. 1 to 3; The outer layer 18 is replaced with the outer layer 28 of the inspection portion. The outer layer 28 of the inspection portion is opened toward the inspection unit 1 or covers a portion of the wind tunnel from the upper portion of the inspection unit 10 to have a narrower contraction with respect to the dust-free air. The shape of the portion CC. By the wind tunnel CH^ constriction portion 201212146 CC, the wind speed of the clean air near the inspection unit ι can be increased. Thereby, the wind speed is greatly reduced in the vicinity of the inspection unit 10 and around the inspection line L15. The flow FL9' can particularly maintain a clean state near the inspection unit 两 of the two cleanliness and the periphery of the inspection line L15. Further, the inspection unit 10 of the third embodiment can also perform the defective portion of the work piece. Reprocessing units such as laser irradiation repair or coating correction, photographing sheets for observing and storing images, measuring units such as wiring measurement, film thickness measurement, color measurement, etc., are replaced by processing at predetermined positions. Other processing units. That is, the processing unit includes an inspection unit, a repair single force, a shooting unit, a measurement unit, etc. In addition, due to other structures and effects and The second embodiment is the same as the second embodiment, and the description thereof will not be repeated here. Fourth Embodiment Next, a fourth embodiment of the present invention will be described in detail with reference to the drawings. The same reference numerals are given to the same components as those in the first to third embodiments, and the description thereof will be omitted. Fig. 8 and Fig. 9 are schematic diagrams showing the schematic configuration of the FpD inspection apparatus according to the fourth embodiment. In Fig. 8, the flow of air in the clean room when there is a work piece from the upstream transfer space to the transport path in the inspection space is shown in Fig. 8. Further, in Fig. 9, the display is shown in Fig. 9. In the fourth embodiment, (4), the flow of air in the clean room is provided when there is a workpiece from the inspection space to the downstream transfer space. As shown in Figs. 8 and 9, the fourth embodiment The FPD inspection of the Dunhuang 4 series in the same structure as the FpD inspection apparatus shown in Figures 1 to 3 'has a limit on the flow of the clean air formed by the Qing (8). Wind path control valve 4l for wind path a and 4lb. Further, similarly to the FPD inspection apparatus 2 shown in FIGS. 5 and 6, the FPD inspection apparatus 4 has a sensor 22a that detects whether or not there is a workpiece on either the upstream transfer space TR side and the downstream transfer space tr. 22b. In this configuration, the air guiding path control valves 41a and 41b are normally housed at positions along the inner wall surface of the wind tunnel C of the outer layer 18 of the inspection portion. Here, when the upper working member W is detected by the sensor 22a, that is, when the working member W is detected on the upstream transfer space TR side, as shown in FIG. 8, the control unit drives the drive not shown in the control chart. The downstream side air passage path control valve 41a is controlled. Thereby, it is possible to restrict the flow of the clean air blown to the inspection unit 1 to the downstream from the formation of the downflow F L 0 from the F F U101. As a result, most of the clean air sent from the FFU 101 forms the downflow FL 4 and the air flow FL 5 to flow on the upstream working member w, and forms an air flow flowing into the lower portion of the workpiece W at the end of the workpiece W. FL6 flows into the lower side of the transfer tables 14 to 16. Thereafter, as shown by the downflow FL3 of Fig. 8, the ducts respectively formed on the floor surface of the outer layer 18 of the inspection portion and the floor surfaces of the outer layers 17 and 19 of the conveying portions are discharged to the outside. On the other hand, when the upper working member W is detected by the sensor 22b, that is, when the working member W is detected on the downstream transfer space TR side, as shown in Fig. 9, the control unit borrows the control map. The drive unit shown controls the upstream side air path control valve 41b. Thereby, it is possible to restrict the flow of the clean air blown to the inspection unit 10 to the upstream after the downflow FL0 is formed from the FFU 101. As a result, most of the clean air sent from the FFU 101 forms the downflow FL4 and the airflow FL5 to flow on the downstream work piece 1^, and the airflow FL6 flowing into the lower side of the work piece w is formed at the end of the work piece W. And flow into the lower side of the transfer station 16 201212146 14~16. Thereafter, as shown by the downflow (1) of Fig. 9, the ducts are formed on the floor surface of the outer layer 18 of the inspection portion and the floor surfaces of the outer layer 17 of the conveying portion and the floor surface of the crucible 9, respectively, and are discharged to the outside. As described above, the fourth embodiment has the configuration of the switch air passage path control valve - and 41b' to allow a lot of clean air to flow to the side having the workpiece w. By this, it is effective in grasping the top of the work piece w in accordance with the position of the work piece w, in the vicinity of the inspection material line 10 and the inspection line L15. As a result, it is possible to accurately and efficiently prevent the adhesion of dust caused by the generation of dust or the like during transportation to the surface of the guard W. That is, not only the vicinity of the inspection unit 10 but also the periphery of the inspection line L15, the space on the workpiece W can be accurately and efficiently maintained in a clean state. Further, in the inspection unit 1 of the fourth embodiment, the repair unit such as the laser irradiation repair or the coating correction for the defective portion of the workpiece, the imaging unit for observing and storing the image, and the wiring may be sized. Processing such as measurement, film thickness measurement, color measurement, etc., is replaced by other processing units that are executed at predetermined locations. That is, the processing unit includes an inspection unit, a repair unit, a photographing unit, a measurement unit, and the like. Further, since the other configurations and effects are the same as those of the above-described third to third embodiments, the overlapping description will be omitted. Further, the above-described embodiments are merely examples for carrying out the present invention, and the present invention is not limited thereto, and various modifications are possible within the scope of the present invention, and further, it is naturally clear from the above description. Other various embodiments are possible within the scope of the invention. For example, it is needless to say that the modifications exemplified as appropriate for the respective embodiments can be applied to other embodiments. 17 201212146 [Brief Description of the Drawings] Fig. 1 is a perspective view showing a schematic configuration of a flat panel display (FPD) inspection apparatus according to the first embodiment. Fig. 2 is a schematic view showing the flow of air in the clean room when the workpiece is not placed on the transport path in the first embodiment. Fig. 3 is a schematic view showing the flow of air in the clean room when the workpiece is placed on the transport path in the first embodiment. Fig. 4 is a schematic view showing an example in which the ceiling portion of the outer layer of the conveying portion of the FPD inspection apparatus shown in Fig. 1 is provided with a door for opening and closing by sliding. Fig. 5 is a schematic cross-sectional view showing a schematic configuration of an FPD inspection apparatus according to a second embodiment, showing a dust-free room when there is a workpiece from the upstream transfer space to the transport path of the inspection space in the second embodiment. A pattern diagram of the flow of air. FIG. 6 is a schematic cross-sectional view showing a schematic configuration of an FPD inspection apparatus according to a second embodiment, and shows a clean room in which a workpiece is placed on a conveyance path from an inspection space to a downstream conveyance space in the second embodiment. A pattern diagram of the flow of air. Fig. 7 is a schematic cross-sectional view showing a schematic configuration of an F P D inspection apparatus according to a third embodiment. FIG. 8 is a schematic cross-sectional view showing a schematic configuration of an FPD inspection apparatus according to a fourth embodiment, and shows a clean room in which a workpiece is placed on the transport path from the upstream transport space to the inspection space in the fourth embodiment. A pattern diagram of the flow of air. Fig. 9 is a schematic cross-sectional view showing a schematic configuration of the FPD inspection apparatus of the fourth embodiment, 201212146, showing a dust-free operation when there is a workpiece on the conveyance path from the inspection space to the downstream conveyance space in the fourth embodiment. A pattern diagram of the flow of air in the room. [Description of main component symbols] 1-4...FPD inspection device 112,114...gate 10...inspection unit C, C1...wind tunnel 11...stand CC...contraction 12...vibration absorption mechanism D...Transport direction 14-16...Transport station D Bu D2".Arrow 17,19...Transportation unit outer layer FL0-FL4, FL7-FL9...downflow 18,28...inspection part outer layer FL5 , FL6... airflow 21a, 21b... exhaust fan L15... inspection line 22a, 22b... sensor PR... inspection space 41a, 41b... air guiding path control valve TR.. .Transport space 101...FFU W...Working pieces 111, 113... Winding mechanism 19

Claims (1)

201212146 七、申請專利範圍: 1. 一種處理裝置,係包含有: 搬送台,係搬送對象基板者; 處理單元,係對在該搬送台上移動之前述對象基板 施行預定處理者; 該處理裝置之特徵在於包含有: 外層,係收容前述搬送台及前述處理單元者; 送風部,係將集塵處理後之空氣送出至前述外層内 者;及 風洞,係將從前述送風部送出之前述空氣引導至前 述處理單元者。 2. 如申請專利範圍第1項之處理裝置,其中前述風洞係將 從前述送風部送出之前述空氣引導至以前述處理單元 施行處理之處理區域。 3. 如申請專利範圍第1項之處理裝置,其中前述風洞之前 述空氣之送出口朝向前述處理單元或覆蓋前述處理單 元之至少一部份。 4. 如申請專利範圍第1項之處理裝置,其中相對於前述空 氣之送出口,前述風洞之本體部較細。 5. 如申請專利範圍第1項之處理裝置,其中前述外層具有 一部份突出之天花板,前述送風部設於前述天花板之前 述突出之部份,前述風洞係以前述突出之部份之側壁構 成。 6. 如申請專利範圍第5項之處理裝置,其中前述外層之内 20 201212146 P由配置有m述處理單元之檢查空間及該檢查空間以 外之搬送空間構成, 二前述突出之部份係前述外層之前述天花板中位於 前述檢查空間之部份。 如申明專利乾圍第6項之處理裝置’該處理裝置更包含 有從前述搬送"將前衫氣職至前料層外之耕 氣部, 、,前述排氣部於前述對象基板之至少-部份位於前 述搬送空間内時,從前述搬送空間排放前述空氣。 8·如申請專·圍第6項之處理裝置,該處理裝置更包含 有控制從前述送風部送出之前述空氣流動之方向的導 風路徑控制閥, 月’J述搬达空間具有在將前述對象基板搬入至前述 檢查空間内之側的上游搬送空間及搬出已通過前述檢 查空間内之前述對象基板的下游搬送空間,前述導風路 〃控制閥於則述對象基板之至少—部份位於前述上游 搬送空間内、且不位於前述下游搬送空間内時,控制前 述空氣流動之方向’俾使前述空氣流往前述上游搬送空 間’於前述對象基板之至少_部份位於前述下游搬送空 :内、且不位於前述上游搬送空間内時,控制前述空氣 机動之方向,俾使前較氣流往前述下職送空間。 ·==範圍第i項之處理裝置,其中前述處理單元 ’、欢—則述對象基板之缺陷之檢查單元。 10·如申請專利範圍第1項之處理裝置 颉處理裝置更包含 21 201212146 有設於前述外層之前述搬送台上面部之開關式的門。 22201212146 VII. Patent application scope: 1. A processing device comprising: a transfer table that transports a target substrate; and a processing unit that performs a predetermined process on the target substrate that moves on the transfer table; The present invention includes an outer layer that accommodates the transfer table and the processing unit, a blower that sends air that has been dust-collected to the outer layer, and a wind tunnel that guides the air that is sent from the blower. To the aforementioned processing unit. 2. The processing apparatus according to claim 1, wherein the wind tunnel guides the air sent from the air blowing unit to a processing area that is processed by the processing unit. 3. The processing apparatus of claim 1, wherein the air outlet of the air tunnel is directed toward the processing unit or covers at least a portion of the processing unit. 4. The processing apparatus of claim 1, wherein the body portion of the wind tunnel is thinner than the air outlet. 5. The processing device of claim 1, wherein the outer layer has a partially protruding ceiling, the air supply portion is disposed on the protruding portion of the ceiling, and the wind tunnel is formed by a side wall of the protruding portion. . 6. The processing device of claim 5, wherein the inner layer 20 201212146 P is composed of an inspection space in which the processing unit is disposed and a transport space other than the inspection space, and the protruding portion is the outer layer The aforementioned ceiling is located in part of the aforementioned inspection space. For example, the processing device of claim 6 of the patent circumference includes the cultivating portion that transports the front vest from the front to the front layer, and the exhaust portion is at least the target substrate When the portion is located in the transport space, the air is discharged from the transport space. 8. If the processing device of the sixth item is applied, the processing device further includes an air guiding path control valve for controlling the direction of the air flow sent from the air blowing unit, and the moving space has the The target substrate is carried into the upstream transfer space on the side in the inspection space and the downstream transfer space that has passed through the target substrate in the inspection space, and at least a portion of the air path control valve is located in the aforementioned substrate When the upstream air transport space is not located in the downstream transport space, the direction of the air flow is controlled such that the air flows to the upstream transport space, and at least part of the target substrate is located in the downstream transport space: When it is not located in the upstream transport space, the direction of the air maneuver is controlled, and the airflow is forwarded to the lower service space. === The processing device of the item i of the range, wherein the processing unit ’, the ——the inspection unit for the defect of the target substrate. 10. The processing device according to claim 1 of the patent application 颉 The processing device further includes 21 201212146 A switch type door having a face on the transfer table provided on the outer layer. twenty two
TW100109550A 2010-04-12 2011-03-21 Handling device TW201212146A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010091608A JP2011220631A (en) 2010-04-12 2010-04-12 Treatment device

Publications (1)

Publication Number Publication Date
TW201212146A true TW201212146A (en) 2012-03-16

Family

ID=44961973

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100109550A TW201212146A (en) 2010-04-12 2011-03-21 Handling device

Country Status (4)

Country Link
JP (1) JP2011220631A (en)
KR (1) KR20120042608A (en)
CN (1) CN102243986A (en)
TW (1) TW201212146A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI641849B (en) * 2015-03-16 2018-11-21 日商精工愛普生股份有限公司 Electronic component transfer device and electronic component inspection device
TWI641850B (en) * 2015-03-16 2018-11-21 日商精工愛普生股份有限公司 Electronic component conveying device and electronic component inspection device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6043123B2 (en) * 2012-08-22 2016-12-14 オイレス工業株式会社 Non-contact support device and coating device
JP7018368B2 (en) * 2018-07-12 2022-02-10 東京エレクトロン株式会社 Inspection equipment and cleaning method of inspection equipment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI641849B (en) * 2015-03-16 2018-11-21 日商精工愛普生股份有限公司 Electronic component transfer device and electronic component inspection device
TWI641850B (en) * 2015-03-16 2018-11-21 日商精工愛普生股份有限公司 Electronic component conveying device and electronic component inspection device
US10416231B2 (en) 2015-03-16 2019-09-17 Seiko Epson Corporation Electronic component transport apparatus and electronic component inspection apparatus

Also Published As

Publication number Publication date
JP2011220631A (en) 2011-11-04
KR20120042608A (en) 2012-05-03
CN102243986A (en) 2011-11-16

Similar Documents

Publication Publication Date Title
JP5755038B2 (en) Assembly equipment and production system
TWI486578B (en) Plate glass inspection unit and manufacturing equipment
JP7351543B2 (en) inkjet printer
JP5912552B2 (en) X-ray inspection equipment
JP5773316B2 (en) Substrate processing equipment and substrate processing method
TW201212146A (en) Handling device
CN109791086B (en) Leak inspection support device and leak inspection method using same
JP2007107945A5 (en)
WO2011108215A1 (en) Substrate storing device
TW201230237A (en) Inspection device
TW201230230A (en) Inspection device and positioning method for substrate
WO2003102475A1 (en) Clean assembling module device, production system formed with the module, industrial robot, and pollution spred prevention system
TWI757473B (en) Wafer Inspection Device
KR20130007389A (en) Substrate processing apparatus and substrate processing method
JP7219148B2 (en) Inspection system and method for driving inspection system
JPH1020478A (en) Aligner
JP6977557B2 (en) Inspection equipment
KR101682038B1 (en) Inspection device
CN214526159U (en) Circuit board drilling transportation dust removal mechanism
JP2004299885A (en) Air current control structure and air current control method
JPS62157127A (en) Conveying method and device for workpiece in clean room or the like
JPH0273141A (en) Laser inspection device
TW202410511A (en) Low-particle gas enclosure systems and methods
KR20110122415A (en) Automatic assembly system and method for assemblying optical sheets of backlight unit
TW201227866A (en) Processing apparatus