KR20130007389A - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

PURPOSE: A substrate processing apparatus and substrate are provided to reduce process treatment time, to prevent counter-contamination and to selectively conduct dry cleansing and wet cleansing. CONSTITUTION: A substrate processing apparatus and substrate comprises an index part(1000), a treatment part, and a buffer unit(4000). The index part comprises a port and an index robot. A container with a substrate is put on a port. A treatment part conducts the substrate treatment. The buffer unit is arranged between the treatment part and the index part. The treatment part comprises a glue removing treatment module, and a substrate cooling treatment module, a heat treatment module, and a functional water treatment module. The treatment module(2000) comprises a glue-removing treatment module, a substrate-cooling treatment module, and a second treatment part(3000) conducting a dry and functionalized cleansing.

Description

Substrate processing apparatus and substrate processing method

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to substrate processing equipment and, more particularly, to substrate processing equipment and methods capable of wet cleaning and dry cleaning of substrates.

A photomask is used in a photolithography process for transferring a predetermined photoresist pattern onto a wafer with an exposure apparatus. The photo mask forms a predetermined light blocking film pattern, a phase inversion film pattern, or the like on the entire mask substrate. The photo mask is manufactured by attaching a pellicle covering the light blocking film pattern or the phase reversing film on the mask substrate to protect the light blocking film pattern or the phase reversing film pattern.

On the other hand, the photomask is cleaned to remove the contamination resulting from various requirements. Photomask cleaning includes wet cleaning including sulfuric acid (H 2 SO 4), and dry cleaning using ultraviolet rays and heat. This cleaning process is essentially passed after the repair process of the photomask.

However, in the conventional photo mask cleaning process, the equipment for the wet cleaning and the equipment for the dry cleaning are separately operated so that the process processing time becomes long and reverse pollution is caused by external exposure of the photo mask.

The present invention is to provide a substrate processing apparatus and method having less external exposure and less likely to be contaminated.

Further, the present invention is to provide a substrate processing apparatus and method capable of selectively performing dry cleaning and wet cleaning.

The objects of the present invention are not limited thereto, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

In order to achieve the above object, a substrate processing apparatus according to an embodiment of the present invention, the index unit having a port and an index robot, the container containing the substrate is placed; A processing unit which performs substrate processing; And a buffer unit disposed between the processing unit and the index unit, in which a substrate to be conveyed therebetween temporarily stays; The processing unit may include a glue removing processing module disposed along a transfer path for transporting a substrate, a substrate cooling processing module, a heating processing module, and a functional water processing module.

According to an embodiment of the present invention, the processing unit comprises a first processing unit in which the wet cleaning of the substrate is performed; And a second processing unit stacked on the first processing unit, and configured to dry and wash the functional water of the substrate.

According to an embodiment of the present invention, the first processing unit includes a first transport path having a first transport robot for transporting the substrate, wherein the glue removing processing module and the substrate cooling processing module are formed in the first transport path. The side may be disposed along the first transport path.

According to an embodiment of the present invention, the glue removal processing module is a front surface treatment module (HSU) for removing the glue by applying the SPM solution to the front surface of the substrate; And a partial processing module (HSU) for removing the glue by partially applying the SPM solution to the edge of the substrate.

According to an embodiment of the present invention, the second processing unit further includes a second transport path having a second transport robot for transporting the substrate, wherein the heat treatment module and the functional water treatment module are formed on the side of the second transport path. It may be disposed along the second transport path.

According to an embodiment of the present invention, the heat treatment module includes a baking plate for a baking process; And an ultraviolet lamp for the ultraviolet irradiation process, the baking process and the ultraviolet irradiation process may be performed alone or simultaneously.

According to an embodiment of the present invention, the functional water treatment module selectively removes particles on the surface of the substrate by using the functional water; The functional water may include ultrapure water added with carbon dioxide (CO 2), ultrapure water added with hydrogen (H 2), and ultrapure water added with ozone (O 3).

According to an embodiment of the present invention, an ionizer may be installed in the transfer path.

According to an embodiment of the present invention, the buffer unit comprises: a first buffer on which a substrate is placed; A driving unit for inverting the first buffer; And a frame having a front section and a rear section open and a central section in which the first buffer is located, and a driving section in which both sides of the central section are located and the driving section is positioned.

According to an embodiment of the present invention, the first buffer includes: a first support part supporting one surface of a substrate; And a second support part installed to face the first support part and supporting the other surface of the substrate placed on the first support part, wherein the driving part includes a rotation module configured to rotate the first support part and the second support part; And an elevating module for elevating the second support so that the substrate is gripped by the first support and the second support.

According to an embodiment of the present invention, the axis of rotation of the first buffer is eccentric with the grip position center of the substrate so that the loading position of the substrate and the unloading position after reversal are the same.

According to an embodiment of the present invention, the heating module includes a baking plate on which a substrate is loaded; A body having the bake plate positioned thereon and having an upper surface open and having an entrance and exit for carrying in and out of the substrate on one side thereof; A cover for opening and closing the opened upper surface of the main body; And ultraviolet lamps installed on the cover and irradiating ultraviolet rays to the substrate.

According to an embodiment of the invention, the lift pins for supporting the substrate to be carried in / out through the entrance; A first elevating driving unit for elevating a substrate supported by the lift pins between the baking plate and the ultraviolet lamp; And a second elevating driver for elevating the bake plate, wherein the first elevating driver includes a loading / unloading position at which the substrate is loaded / unloaded through the doorway; A bake position lower than the loading / unloading position, the substrate seated on the bake plate for bake processing of the substrate; And a lowering operation higher than the loading / unloading position, wherein the substrate is moved up and down at an ultraviolet irradiation position in which the substrate is positioned close to the ultraviolet lamp for the ultraviolet treatment of the substrate, and the second raising and lowering driving unit is configured to bake the substrate for ultraviolet treatment of the substrate. The plate may be moved up and down to an ultraviolet irradiation position proximate to the ultraviolet lamp.

According to an embodiment of the invention, the substrate cooling processing module comprises a chamber; A cooling unit installed in the inner space of the chamber; The cooling unit may include a first support frame and a second support frame spaced apart from each other; Cooling plates are installed inside the 1,2 support frame, the substrate is placed; Lift pins positioned below the cooling plate; And a driving part installed at an outer side of the first and second support frames and up and down the lift pins.

According to an embodiment of the present invention, the cooling unit further comprises a space partition cover covering the outer surface of the first support frame and the second support frame so that the drive unit space in which the drive unit is located is separated from the internal space of the chamber. It may include.

According to an embodiment of the invention, each of the first transport robot and the second transport robot is a base; At least one hand having a pocket on which the substrate is raised and moving from a groove position located above the base to a pickup position for substrate pickup; An alignment unit for aligning the position of the substrate when the at least one hand returns from the pick-up position to the home position; And a gantry installed spaced apart from an upper surface of the base and provided with the alignment unit.

Substrate processing method for achieving the above object is the step of providing a substrate contained in the container to the index portion; Transferring the substrate from the index portion to the processing portion where the cleaning process is performed on the substrate; Performing a cleaning process on the substrate in the processing unit; The cleaning treatment step may include removing glue from the substrate; And removing particles of the substrate surface from which the glue has been removed.

According to an embodiment of the present disclosure, the cleaning treatment step may further include a heating treatment step of baking the substrate and irradiating ultraviolet rays and a cooling step of cooling the substrate between the glue removal step and the particle removal step.

According to an embodiment of the present invention, a buffer unit in which a substrate temporarily stays between the index portion and the processing portion is arranged so that the substrate conveyed between the index and the processing portion is inverted while staying in the buffer unit.

According to an embodiment of the present invention, the glue removing step includes the steps of treating the surface of the substrate with a mixture of sulfuric acid and hydrogen peroxide (SPM); Treating the substrate surface with hot ultrapure water; Treating the substrate surface with an RCA standard clean 1 (SC-1); Treating the substrate surface with a rinse solution; And drying the surface of the substrate, wherein the particle removing step comprises using ultrapure water added with carbon dioxide (CO2), ultrapure water added with hydrogen (H2) and ultrapure water added with ozone (O3), and Remove organic matter.

According to an embodiment of the present invention, the substrate may be a photo mask.

According to the present invention, the dry cleaning and the wet cleaning are configured in one equipment, which not only shortens the process processing time but also prevents external pollution due to less external exposure.

In addition, the present invention can selectively perform dry cleaning and wet cleaning.

The drawings described below are for illustrative purposes only and are not intended to limit the scope of the invention.
1 is a view showing a photo mask cleaning equipment according to an embodiment of the present invention.
FIG. 2 shows a one-layer layout of the photo mask cleaning equipment shown in FIG. 1.
FIG. 3 shows a two-layer layout of the photo mask cleaning equipment shown in FIG. 1.
4 shows a substrate processing facility of a single layer structure.
5 is a perspective view of the buffer unit.
6 is a front view of the buffer unit.
7 is a plan view of the buffer unit.
8 is a cross-sectional view of the buffer unit.
9 and 10 are a plan view and a side view showing the sensing member shown in FIG.
11 to 14 are diagrams showing the photo mask inversion process step by step in the first buffer.
FIG. 15 is a plan view illustrating the front surface treatment module of FIG. 2.
FIG. 16 is a plan view illustrating the functional water treatment module illustrated in FIG. 3.
17 and 18 are plan and side cross-sectional views for explaining the photo mask cooling apparatus shown in FIG.
19 is a schematic perspective view of the heat treatment module shown in FIG. 2.
20 is a rear view of the heat treatment module.
FIG. 21 is a plan view of the main body shown in FIG. 19. FIG.
22 is a plan sectional view of the height adjusting unit.
23 to 26 are views showing various height changes of the photo mask in the heat treatment module.
FIG. 27 is a perspective view of the first transport apparatus shown in FIG. 2.
28 and 29 are plan views of the first transport apparatus.
It is a figure for demonstrating the drive part provided in the base of a 1st conveyance apparatus.
It is an enlarged view of the principal part of a 1st conveyance apparatus.
32 is a front view of the first transport apparatus.

Hereinafter, a substrate processing apparatus according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same reference numerals are used to designate the same or similar components throughout the drawings. In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

(Example)

1 is a block diagram showing a substrate processing facility according to an embodiment of the present invention. 2 and 3 are views showing the layout of the first and second layers of the substrate processing equipment shown in FIG.

In this embodiment, a photomask is used as the substrate. However, the substrate may be various kinds of substrates such as a semiconductor wafer and a flat display panel in addition to the photomask. In the present embodiment, the substrate processing equipment will be described as an example for cleaning the photomask. However, the substrate processing facility may be a facility that performs a cleaning process on another type of substrate such as a wafer. Optionally, the substrate processing facility may be a facility for performing a substrate, such as a photomask or a wafer, in addition to a cleaning process, other kinds of processes requiring inversion of the substrate.

1 to 3, the substrate processing apparatus 1 includes an index unit 1000, a processing unit 200, and a buffer unit 4000.

The index unit 1000 includes four ports 1100 on which a container containing a photo mask is placed, and an index robot 1200 for transferring the photo mask. The photo mask is transported in a container. The photo mask is contained in the container with the pattern side turned upside down. Therefore, the photo mask can minimize the contamination of the pattern surface during the transport process. The photo mask is provided after the pattern surface is inverted to face upward in the buffer unit 4000 before being loaded into the first processing unit 2000 or the second processing unit 3000.

The processor 200 has a first processor 2000 and a second processor 3000. The first processing unit 2000 performs wet cleaning of the photo mask. The first processing unit 2000 is connected to the inversion buffer unit 4000 and disposed along the first transport path 2100 and the first transport path 2100 having the first transport robot 2200 for transporting the photo mask. And glue removal processing modules (HSU and GSU) 2300 and 2400 and photo mask cooling processing modules (CPU) 2500.

Three glue removing processing modules may be provided, and two photo mask cooling processing modules may be provided.

The glue removal treatment modules (HSU, GSU) apply SPM (Surfuric acid peroxide mixture) solution to the entire surface of the photo mask to remove the glue and the high temp sulfur unit (HSU) 2300 and SPM solution It may include a partial removal module (GSU) 2400 to remove the glue by applying a portion of the edge. The photo mask cooling apparatus 2500 lowers the temperature of the photo mask heat treated by the heat treatment module 3300 to room temperature.

Here, SPM is used as a mixture of sulfuric acid (H 2 SO 4) + hydrogen peroxide (H 2 O 2) at a high temperature and is an organic material removal solution on the substrate surface.

The second processor 3000 is disposed to be partitioned into the first processor 2000 and the layers. In the second processing unit 3000, the photo mask is dried and washed with functional water. The second processor 3000 may include a heat treatment module (HPU) 3300 disposed along the second transport path 3100 and the second transport path 3100 having the second transport robot 3200 for transporting the photo mask. A functional water treatment module (SCU) 3400. The heat treatment module 3300 may heat the photo mask using ultraviolet rays. Two heat treatment modules 3300 may be provided, and two possible water treatment modules 3400 may be provided.

The functional water treatment module is for removing particles or organic matter on the surface of the substrate, and the functional water is ultrapure water containing carbon dioxide (CO2) (for prevention of charge) and ultrapure water containing hydrogen (H2) (with megasonic for removing particulates). Use) and ultrapure water (for removing organic matter) added with ozone (O3).

The buffer unit 4000 is disposed between the processing unit 200 and the index unit 1000. According to an example, the buffer unit 4000 is disposed between the first processing unit 2000 and the index unit 1000. In some embodiments, the buffer unit 4000 may be disposed between the second processing unit 3000 and the index unit 1000. The buffer unit 4000 inverts the photo mask.

In the substrate processing facility 1, modules for wet cleaning are provided in one layer, and modules for dry cleaning are provided in two layers. That is, the wet cleaning using the chemical liquid was arranged in one layer so that the ion contamination by the downflow did not affect the dry-processed photomask.

4 shows a substrate processing facility of a single layer structure.

As shown in FIG. 4, the substrate processing facility may be configured such that modules for wet and dry cleaning are disposed along a transport path on a side of the transport path having a transport robot in a single layer structure.

In the present embodiment, the treatment unit has been described as having a glue removal treatment module, a photo mask cooling treatment module, a heat treatment module, and a functional water treatment module. Alternatively, however, the type of substrate on which the processing is performed and the type of processing module provided to the processing unit according to the processing process may be different.

The substrate processing equipment can process up to five photo masks simultaneously, so high productivity can be expected.

The photomask is vulnerable to static electricity because the pattern surface is made of chromium (Cr) component. Therefore, the substrate processing equipment of the present invention has a movement path (first transport path and second transport path) to minimize damage caused by static electricity. In each processing module, an ionizer may be installed.

5 is a perspective view of the buffer unit, FIG. 6 is a front view of the buffer unit, and FIG. 7 is a plan view of the buffer unit. 8 is a cross-sectional view of the buffer unit.

5 to 8, the buffer unit 4000 includes a frame 4100, a first buffer 4200 having an inversion function, a second buffer 4300 having a simple buffer function, and a driver 4400. . Two first buffers and two second buffers may be provided.

The frame 4100 includes a base plate 4110, a first vertical plate 4120, a second vertical plate 4130, and two space compartment covers 4140.

The first vertical plate 4120 and the second vertical plate 4130 are installed perpendicular to the base plate 4110. The first vertical plate 4120 and the second vertical plate 4130 are spaced apart from each other. The space between the first vertical plate 4120 and the second vertical plate 4130 is defined as a central space CA (an inversion space in which the storage and reversal of the photo mask is performed), and the space between the right side of the first vertical plate 4120 and the right space of the first vertical plate 4120. The left space of the second vertical plate 4130 is defined as the driving unit space DA. In the central space CA, the front and rear surfaces of the photomask are opened and the first buffers 4200 and the second buffers 4300 are installed in a multi-stage structure to enable the import / export of the photo mask. The driver 4400 is installed in the driver space DA. The drive space DA is isolated from the external environment by the space partition cover 4140. The base plate 4110 of the frame 4100 includes a suction port 4112 for forming an exhaust pressure (negative pressure) of the driving unit space DA. That is, the drive unit space DA is not only isolated from the external environment by the space partition cover 4140, but also a negative pressure (exhaust pressure) is formed through the suction port 4112 to suppress the formation of airflow into the central space CA. do.

The second buffer 4300 is positioned below the first buffer 4200. The second buffer 4300 has a simple buffer function.

The first buffer 4200 is rotatably installed on the first vertical plate 4120 and the second vertical plate 4130. The first buffer 4200 includes a fixed holder 4210 as a first support part and a gripper holder 4220 as a second support part. The gripper holder 4220 and the fixed holder 4210 are positioned to face each other. The gripper holder 4220 is moved up and down in the vertical direction to hold the edge of the photo mask M placed on the fixed holder 4210. When viewed from the top, the fixed holder 4210 and the gripper holder 4220 has a rectangular frame shape. The fixed holder 4210 and the gripper holder 4220 include supporting protrusions 4212 and 4222 (shown in FIG. 4) at which the edges of the photo mask M are seated at each corner.

The driver 4400 includes a rotation module 4410 and a lift module 4420. The driver 4400 may be located in the driver space DA to prevent back contamination of the photo mask from particles generated by the driver 4400.

The rotating module 4410 includes two rotating bodies 4412 and one rotating driver 4414.

The rotating body 4412 is installed to correspond to the first vertical plate 4120 and the second vertical plate 4130, respectively. The rotation driver 4414 is installed on the first vertical plate 4120. The rotation driver 4414 includes a motor 4416, a belt 4417, and a pulley 4418 for inverting the rotating body 4412 by 180 degrees. The rotating body 4412 has a hollow shape having a passage therein. Both ends of the fixed holder 4210 is fixed to the rotating body 4412.

The elevating module 4420 includes a cylinder 4422, a connection block 4424, and an LM guide 4428. The cylinder 4422 is fixedly installed on the outside of the rotating body 4412 positioned in the drive unit space DA. The connection block 4424 is lifted by the driving of the cylinder 4422. The LM guide 4428 is fixed to the rotating body 4412. The LM guide 4428 guides the connecting block 4424 to be lifted and lowered by driving the cylinder 4422. The connection block 4424 is connected to the gripper holder 4220 located in the central space through the inner passage of the rotating body 4412.

The buffer unit may include only the first buffer having the inversion function. In addition, the buffer unit may be provided with one first buffer and one second buffer, or may be provided in different numbers as in the embodiment of FIG. 6. In addition, the positions of the first buffer and the second buffer may be changed.

On the other hand, the buffer unit 400 includes a sensing member 9300 for detecting the presence or absence of the attachment of the photo mask (M). The sensing members 9300 are installed at the photo mask loading / unloading heights of the first buffers 4200 and the second buffers 4300, respectively. The sensing members 9300 are installed in a diagonal direction for cross checking.

9 and 10 are a plan view and a side view showing the sensing member shown in FIG.

9 and 10, the sensing member 9300 is positioned around respective buffers. The sensing member 9300 may simultaneously detect the presence or absence of the photo mask M and a loading miss of the photo mask. The sensing member 9300 is provided such that a light emitting unit 9310 for emitting a laser beam and a light receiving unit 9320 for receiving a laser beam emitted from the light emitting unit 9310 are paired with each other. The light emitting unit 9310 and the light receiving unit 9320 are disposed such that the laser beam travels in the diagonal direction of the photo mask M. FIG. That is, the laser beam is obliquely incident on one side of the photo mask M. FIG.

The light emitting unit 9310 includes a light emitting sensor 9312 that emits a laser beam, and a first light blocking plate 9316 having a first slit window 9314 for restricting a beam width of the laser beam. The laser beam irradiated from the light emitting unit 9310 has a slit shape whose cross section is vertical.

The light receiving unit 9320 is provided with a second light blocking plate 9326 formed with a second slit window 9324, through which the laser beam radiated from the light emitting unit 9310 is introduced, and is positioned behind the light blocking plate 9326 and through the slit window 9324. And a light receiving sensor 9322 for sensing the sensitivity of the incoming laser beam.

The height h1 of the laser beam is higher than the height h2 of the photo mask, and the laser beam is positioned to transmit a portion of the photo mask. For example, when the photo mask has a height (thickness) of 6.35 mm and the laser beam has a height h1 of 10 mm, the presence or absence of loading miss sensitivity is easy when the height h3 of the laser beam passing through the photo mask is 5 mm. Do. In other words, the laser beam is preferably arranged such that half (5 mm) passes through the photo mask. On the other hand, a part of the laser beam (transmitted beam passing through the photo mask) is obliquely incident on the side of the photo mask M, and the incident laser beam passes through the photo mask M and is refracted by the light receiving unit 9320. Is not incident on the second slit window 9324. Then, only the laser beam passing through the upper surface of the photo mask M is incident on the second slit window 9324 of the light receiving unit 9320 to lower the sensitivity.

11 to 14 are diagrams showing the photo mask inversion process step by step in the first buffer.

1 to 14, the photo mask M is loaded into the center space of the inversion buffer unit by a transport device (not shown) and loaded into the fixed holder 4210. When the photo mask is loaded in the fixed holder 4210, the gripper holder 4220 is moved down by the elevating module 4320 to support the photo mask M from above. When the photo mask is fixed by the fixing holder 4210 and the gripper holder 4220, the first buffer 4200 is inverted by the rotation module 4410. After the reversal, the gripper holder 4220 is positioned at the bottom and the fixed holder 4210 is positioned at the top. The gripper holder 4220 is moved down by the elevating module 4320 to release the holding of the photo mask M. FIG. At this time, the photo mask is moved to the loading / unloading position while seated on the gripper holder 4220.

Here, the axis of rotation of the photo mask (indicated by the dashed-dotted line) is located above the photo mask. That is, the initial loading position and the unloading position after inversion are kept the same by giving the center of rotation and the center of the photo mask seating position (loading / unloading position of the photo mask) eccentrically.

FIG. 15 is a plan view illustrating the front surface treatment module of FIG. 2.

Referring to FIG. 15, the front treatment module 2300 is a device for removing glue and particles on a surface of a photo mask using various treatment fluids.

The front treatment module 2300 includes a chamber 2310, a processing container 2320, a photo mask supporting member 2330, a first swing nozzle unit 2340, a second swing nozzle unit 2350, and an aerosol / liquid nozzle unit ( 2360, a fixed nozzle unit 2370, and a back nozzle unit 2390.

The chamber 2310 provides a sealed interior space, and vertical air flow is generated inside the chamber 2310 by a fan filter unit (not shown) installed at an upper portion thereof. The processing container 2320 has a cylindrical shape with an open upper portion, and provides a process space for processing the photo mask. The opened upper surface of the processing container 2320 is provided as a carrying out and carrying in path of the photo mask. The photomask support member 2330 is positioned inside the processing container 2320. The photomask support member 2330 supports the photomask during the process and rotates the photomask.

The fixed nozzle unit 2370 is fixedly installed at the upper end of the processing vessel 2320 to supply ultrapure water to which nitrogen gas (N 2) and carbon dioxide (CO 2) are added to the center of the photo mask. The first swing nozzle unit 2340 is moved above the center of the photo mask through a swing movement to supply a fluid for removing glue on the photo mask M. FIG. The fluid comprises an SPM solution and hot DIW. The second swing nozzle unit 2350 is moved above the center of the photo mask through a swing movement to supply a fluid for removing organic matter on the photo mask. The fluid contains ultrapure water added with ozone. The aerosol / liquid nozzle unit 2360 is moved above the center of the photo mask through a swing movement to supply a liquid for cleaning on the photo mask in a liquid state or an aerosol state. The fluid contains RCA standard clean 1 (SC-1; standard clean 1), chemicals such as NH4OH + DIW, ultrapure water added with carbon dioxide, and SC-1 (aerosol spray), NH4OH + DIW + N2 (aerosol spray). It includes. The back nozzle unit 2390 supplies ultrapure water containing SC-1, N2, SPM, and carbon dioxide to the back surface of the photo mask.

Glue removal from front treatment module (2300) is supplied with sulfuric acid and hydrogen peroxide (SPM) supply-> high temperature ultra pure water (Hot DIW) supply-> RCA standard clean solution (SC-1; standard clean 1) supply-> Rinse solution (carbon dioxide value Added ultrapure water)-> dry gas (N2) supply process.

FIG. 16 is a plan view illustrating the functional water treatment module illustrated in FIG. 3.

Referring to FIG. 16, the functional water processing module (SCU) 3400 removes particles on the surface of the photo mask using various functional water.

The functional water treatment module 3400 includes a chamber 3410, a processing container 3420, a photo mask support member 3430, an aerosol nozzle unit 3440, a megasonic nozzle unit 3450, a swing nozzle unit 3460, and a fixed body. The nozzle unit 3470 and the back nozzle unit 3490 are included.

The chamber 3410 provides a sealed interior space, and vertical air flow is generated inside the chamber 3410 by a fan filter unit (not shown) installed at an upper portion thereof. The processing container 3420 has a cylindrical shape with an open upper portion, and provides a process space for processing the photo mask. The opened upper surface of the processing container 3420 serves as a carrying out and carrying in path of the photo mask. The photomask support member 3430 is positioned inside the processing container 3420. The photomask support member 3430 supports the photomask during the process and rotates the photomask.

The fixed nozzle unit 3470 is fixedly installed at the upper end of the processing vessel 3420 to supply ultrapure water to which nitrogen gas (N 2) and carbon dioxide (CO 2) are added to the center of the photo mask. The aerosol nozzle unit 3440 is moved above the center of the photo mask through a swing movement to supply a fluid for cleaning the substrate on the photo mask. The fluid includes high temperature ultrapure water (Hot DIW), hydrogen (H2) + ultrapure water (DIW), nitrogen gas (N2), SC-1 and ultrapure water to which carbon dioxide is added. The megasonic nozzle unit 3450 is moved above the center of the photo mask through a swing movement to supply a cleaning liquid onto the photo mask. The cleaning liquid contains ultrapure water, hydrogen (H 2) + ultrapure water (DIW) added with carbon dioxide. The megasonic nozzle unit 2350 vibrates by providing high frequency megasonic energy to the cleaning liquid sprayed on the photo mask to create a powerful acoustic stream of the fluid, and the flow removes contaminating particles on the photo mask. do.

The swing nozzle unit 2360 is moved above the center of the photo mask through a swing movement to supply the functional water for cleaning on the photo mask. The functional water includes ultrapure water added with hydrogen (H 2) for removing fine particles and ultrapure water added with ozone (O 3) for removing organic substances. The back nozzle unit 3490 supplies functional water and nitrogen gas to the back surface of the photo mask. A functional water includes ultrapure water added with carbon dioxide, hydrogen (H 2) + ultra pure water, and ozone (O 3) + ultra pure water.

Cleaning in the functional water treatment module 3400 supplies hydrogen (H2) + ultrapure water in the form of an aerosol-> RCA standard cleansing solution (SC-1; standard clean 1)-> ultrapure water with carbon dioxide (megasonic energy supply) )-> Rinse (functional water) supply-> Dry gas (N2) supply process.

17 and 18 are plan and side cross-sectional views for explaining the photo mask cooling apparatus shown in FIG.

17 and 18, the photo mask cooling apparatus 2500 includes a chamber 2510, a base plate 2520, and a cooling module 2530.

Chamber 2510 provides a closed interior space. The chamber 2510 is provided with a fan filter unit 2590 at the top. The fan filter unit 2590 generates vertical airflow inside the chamber 2510. In the chamber 2510, a substrate entrance 2514 is formed at a first surface 2512 adjacent to the first transfer path 2100. Although not shown, the surface facing the first surface on which the substrate entrance 2514 is formed consists of an open surface that is open for maintenance work, which is closed by a cover.

The fan filter unit 2590 is a module in which filters including an air filter and an air supply fan are modularized into one unit. The fan filter unit 2590 filters the clean air to supply the inside of the chamber 2510. The clean air passes through the fan filter unit 2590 and is supplied into the chamber 2510 to form vertical airflow.

The chamber 2510 is partitioned into a treatment area PA and a utility area UA by the base plate 2520. The cooling module 2530 is installed on the upper surface of the base plate 2520. The base plate 2520 includes a suction duct 2522 and a suction tube 2524 at a bottom thereof. The suction duct 2522 is connected with an external exhaust line 2528. The suction pipe 2524 connects the suction duct 2522 and the driving unit space DA of the cooling module 2530 to provide a negative pressure to the driving unit space DA. Particles generated in the driver space DA are exhausted to the suction duct 2522 through the suction pipe 2524.

On the other hand, the base plate 2520 has suction ports 2526 on all sides of the place where the cooling module 2530 is installed. Intake ports 2526 are connected to suction duct 2522. Thus, the cooling device 2500 is provided with a uniform air flow around the cooling module.

The air inside the chamber 2510 flows into the suction ports 2526 formed in the base plate 2520 and is exhausted through the suction duct 2522 to the exhaust line 2528, and the driving unit space DA of the cooling module 2530 is provided. Air is introduced into the suction pipe 2524 and exhausted through the suction duct 2522 to the exhaust line 2528, thereby maintaining a high cleanness around the cooling module 2530.

Although only a portion is shown in the drawing, the utility area UA is connected to the cooling plate 2540 and the driving unit 2560 of the cooling module 2530 in addition to the exhaust pipe 2524 connected to the driving unit space DA of the cooling module 2530. The space in which the coolant supply line, the pneumatic piping, the cable, etc. are located, the treatment area PA is preferably isolated from the utility area UA in order to maintain high cleanliness.

The cooling module 2530 includes a first support frame 2532, a second support frame 2534, a cooling plate 2540, lift pins 2550, a driver 2560, and a space partition cover 2536. The cooling module 2530 has photo mask detection sensors 2570 installed in a diagonal direction to detect whether the photo mask M placed on the cooling plate 2540 is normally seated.

The first support frame 2532 and the second support frame 2534 are spaced apart from each other so that the cooling plate 2540 on which the photo mask M is placed may be positioned. The cooling plate 2540 is installed between the first support frame 2532 and the second support frame 2534. The cooling plate 2540 has a top surface on which the photo mask M is placed, and a cooling water passage (not shown) through which cooling water passes is provided therein. Cooling water is provided through a coolant supply line 2548 connected to one side of a bottom surface of the cooling plate 2540. Guide pins 2252 are provided on the upper surface of the cooling plate 2540 to guide the loading position of the photo mask M. Although not shown, the cooling plate 2540 may include a sensor capable of sensing an internal temperature.

Lift pins 2550 are located below cooling plate 2540. The lift pins 2550 are installed on the pin support 2552, and the pin supports 2552 are installed on the first support frame 2532 and the second support frame 2534 to be liftable. The pin support 2552 is lifted up and down by the driving unit 2560 installed on the outer surface of the first support frame 2532. The driving unit 2560 is a linear driving device including a guide rail 2256 and a cylinder 2564. The drive is located in the drive space DA provided by the space compartment cover 2536.

The space partition cover 2536 is installed to cover the outer surfaces of the first support frame 2532 and the second support frame 2534. The driver 2560 is positioned in a space that is separated from the internal space of the chamber 2510 by the space partition cover 2536.

19 is a schematic perspective view of the heat treatment module shown in FIG. 2, and FIG. 20 is a rear view of the heat treatment module. 21 is a plan view of the main body. 22 is a plan sectional view of the height adjusting unit. 23 to 26 are views showing various height changes of the photo mask in the heat treatment module. 19 shows a simplified chamber structure for ease of drawing.

19 to 26, the heat treatment module 3300 includes a chamber 3310, a bake plate 3340, ultraviolet lamps 3350, lift pins 3360, and a height adjuster 3370. .

The chamber 3310 includes a body 3320 and a cover 3330. The main body 3320 has an open top surface and has an entrance and exit 3321 for loading and unloading a photo mask. Sides of the main body 3320 are provided with a view port (shown in FIG. 20) 3322 that allows an operator to see the inside, and sensing ports 3323 for photo mask detection. Sensing ports 3322 are positioned diagonally. The light receiving / light emitting sensors 3324 are disposed outside the sensing ports 3322 to detect the presence or absence of a photo mask and a position shift. The main exhaust port 3326 is provided at the rear of the main body 3320 to discharge ozone gas from the chamber internal space.

The main body 3320 has a gas injection unit 3328 supplying a process gas between a photo mask and an ultraviolet lamp positioned at an ultraviolet irradiation position (photo mask position shown in FIG. 24), and one side facing the gas injection unit 3328. And a gas exhaust section 3333 for exhausting the process gas. The process gas can be one of air, nitrogen, oxygen or argon. Arrows shown in FIG. 21 represent the flow of process gas.

The cover 3330 is hinged to the main body 3320 to open and close the open upper surface of the main body 3320. The cover 3330 has a lamp installation space 3331 in which the ultraviolet lamps 3350 are installed, and the lamp installation space 3331 is blocked by a quartz window 3332 in the chamber 3310. Although not shown, the cover 3330 may be provided with a coolant line for the thermal cutoff of the ultraviolet lamps 3350. For reference, the ultraviolet lamp 3350 is composed of four 172nm Ecximer.

The bake plate 3340 is provided adjacent to the bottom of the body 3320. The baking plate 3340 includes eight support protrusions 3332 on which the photo masks M are mounted. For example, the baking plate 3340 is heated up to 300 degrees, and consists of five heating zones for temperature uniformity. The bake plate 3340 is installed to move in height in the chamber. The bake plate 3340 has through holes in which the lift pins 3360 are located.

The lift pins 3360 are composed of four pins for supporting four corners of the photo mask M. FIG. The lift pins 3360 are connected to the height adjuster 3370 through the bottom of the chamber.

The height adjusting unit 3370 is installed below the chamber 3310. The height adjusting unit 3370 is a driving device for adjusting the heights of the lift pins 3360 and the baking plate 3340 in order to provide different positions of the photo mask M.

The height adjusting unit 3370 includes an upper plate 3171, a lower plate 3372, a first elevating driver 3380 for elevating the lift pins, and a second elevating driver 3390 for elevating the bake plate 3340. ). The upper plate 3371 is fixedly installed in the chamber 3310. Lower plate 3372 is located sufficiently apart from upper plate 3371.

The first lift driver 3380 includes a pair of first LM guides 3831, a first moving ring 3302, a first driving motor 3383, a first ball screw 3342, and a belt 3385 and a pulley ( 3386).

The pair of first LM guides 3831 are installed perpendicular to the upper plate 3331 and the lower plate 3372. The first moving ring 3302 is installed to be lowered and lowered along the pair of first LM guides 3831. Lower ends of the lift pins 3360 are fixed to the first moving ring 3302. A first ball screw 3338 is connected to the first moving ring 3338. The first driving motor 3383 is for rotating the first ball screw, the power of the first driving motor 3383 is transmitted to the first ball screw 3338 through the belt 3385 and the pulley 3386. The first moving ring 3302 is moved up and down along the first LM guide 3831 by the rotation of the first ball screw 3338. Lift pins 3360 are wrapped with metal bellows for space closure by vertical movement.

The first lift driver 3380 adjusts the lift pins 3360 to three levels.

The first stage height is a baking treatment height at which the photomask M is seated on the baking plate 3340. FIG. 25 shows a state where the photo mask M is positioned at the baking treatment height in a state where the photo mask M is seated on the baking plate 3340. The second stage height is a loading / unloading height at which the photo mask M is loaded / unloaded through the doorway. FIG. 23 shows a state where the photo mask M is located at the loading / unloading height in a state in which the photo mask M is seated on the lift pins 3360. The third stage height is an ultraviolet irradiation height at which the photo mask M is located close to the ultraviolet lamp 3350 for ultraviolet treatment of the photo mask M. FIG. FIG. 24 shows a state where the photo mask M is positioned at the UV irradiation height in a state in which the photo mask M is seated on the lift pins 3360.

The second elevating driving unit 3390 includes a pair of second LM guides 3391, a second moving ring 3332, a second driving motor 3393, a second ball screw 3394, a belt 3395, and a pulley ( 3396 and bake support pins 3398.

The pair of second LM guides 3391 are installed perpendicular to the upper plate 3371 and the lower plate 3372. The second moving ring 3392 is installed to be lowered and lowered along the pair of second LM guides 3391. Lower ends of the baking support pins 3398 are fixed to the second moving ring 3332. The bake support pin 3398 supports the bake plate 3340 through the chamber. A second ball screw 3394 is connected to the second moving ring 3392. The second driving motor 3393 is for rotating the second ball screw, the power of the second driving motor 3393 is transmitted to the second ball screw 3394 through the belt 3395 and the pulley 3396. The second moving ring 3392 is moved up and down along the second LM guide 3391 by the rotation of the second ball screw 3394. The bake support pins 3398 are wrapped with metal bellows for space closure by vertical movement.

The second lift driver 3390 adjusts the bake plate 3340 in two stages. The first stage height is a baking treatment height at which the photomask M is seated on the baking plate 3340. FIG. 10 shows a state where the photo mask M is positioned at the baking treatment height in a state where the photo mask M is seated on the baking plate 3340. The second stage height is an ultraviolet irradiation height which is positioned close to the ultraviolet lamp 3350 in a state where the photo mask M is seated on the baking plate 3340. FIG. 26 shows a state where the photo mask M is positioned at the ultraviolet irradiation height in a state where the photo mask M is seated on the baking plate 3340.

As such, the second lift driver 3390 raises and lowers the bake plate 3340 to two levels so that the photo mask M may simultaneously perform baking treatment by the bake plate 3340 and ultraviolet irradiation by the ultraviolet lamp. As for the ultraviolet irradiation height, it is preferable that the space | interval between the upper surface of a photo mask and the ultraviolet lamp 3350 is within 1-3 mm.

As described above, the heat treatment module 3300 of the present invention may perform the baking process and the ultraviolet irradiation process alone, or may perform the baking process and the ultraviolet irradiation process simultaneously.

The first transporting device 2200 and the second transporting device 3200 have the same configuration, and only the first transporting device 2200 will be described in detail in this embodiment.

FIG. 27 is a perspective view of the first transport apparatus shown in FIG. 2, FIGS. 28 and 29 are plan views of the first transport apparatus, and FIG. 30 is a view for explaining a driving unit installed in the base of the first transport apparatus. It is an enlarged view of the principal part of a 1st conveyance apparatus. 32 is a front view of the first transport apparatus.

Referring to FIGS. 27 to 32, the first transport apparatus 2200 may include a main body 2210, a base 2220 installed on the main body 2210, and a first hand 2230a moved in the front-rear direction to the base 2220. ) And a second hand 2230b, a gantry 2250 installed on the base 2220, a pair of alignment guides 2260 installed on the gantry 2250 to align the photo mask, and a grip part installed on the gantry 2250. And it is installed in the gantry 2250 and includes a distortion detection unit 2280 for detecting the distortion of the photo mask.

For example, the base 2220 is rotatable and height adjustable on the body 2210.

The first conveying apparatus 2200 of the present invention includes two hands for replacing the photo mask M. FIG. For example, one of the two hands performs a task of bringing the photomask, which has been processed, from the processing module, and the other hand brings the unprocessed photo mask to the processing module.

The first hand 2230a and the second hand 2230b may be moved back and forth independently at different heights. In the present embodiment, the first hand 2230a is positioned above the second hand 2230b. Each of the first and second hands 2230a and 2230b includes a pocket part 2232 on which the photo mask M is placed, and a driving part extending from one side of the pocket part 2232 and installed inside the base 2220 ( And a connection arm 2236 connected to 2224. The shape of the pocket portion 2232 can be changed in various forms.

In the first conveying apparatus 2200, the photo mask M is picked up in a state in which the first hand 2230a or the second hand 2230b is moved forward (pickup position), and the first hand 2230a or the first conveying device 2200 is formed. The photo mask M is conveyed in a state where the two hands 2230b are moved backwards (home position). Referring to FIG. 29, it can be seen that the first hand 2230a is moved to the pick-up position and the second hand 2230b is moved to the home position.

As shown in FIG. 30, the movement of the first hand 2230a and the second hand 2230b is performed by two driving units 2224 installed inside the base 2220. The driver 2224 may be configured to include a belt pulley 2224b for transmitting the power of the motor 2224a, the motor 2224a to the first hand 2230a (or the second hand), and the first hand (or the second hand). Guide rails 2224c for guiding forward and backward movement, and the like, which are shown in FIG. 30 for convenience of drawing. Of course, the drive unit may be another linear drive device such as a cylinder.

The gantry 2250 includes a horizontal beam 2252 spaced apart from an upper surface of the base 2220, a support 2254 that supports both ends of the horizontal beam 2252 and is fixed to both sides of the base 2252.

The pair of alignment guides 2260 are installed in the horizontal beam 2252 of the gantry 2250. The pair of alignment guides 2260 are positioned at the same height as the photo mask M placed on the first hand 2230a and the second hand 2230b. The pair of alignment guides 2260 are spaced apart from each other and guide both sides of the photo mask M. FIG. The pair of alignment guides 2260 has an inclined surface 2262 that is inclined outward so that the width of the tip side is widened, so that the pair of alignment guides 2260 can be easily entered between the pair of alignment guides 2260 even when the photo mask M is twisted. Do.

The photo mask M is aligned by a pair of alignment guides 2260 when moving from the picked up position to the home position to prevent positional shift. That is, even if the photo mask M is placed on the first hand 2230a (or the second hand) in a distorted state at the pick-up position, the photo mask M is aligned by the pair of alignment guides 2260 when moved to the home position.

The grip portion 2270 is provided at the front of the horizontal beam 2252. The grip portion 2270 has a bump 2227 at an upper end thereof. The prevention jaw 2272 blocks the upward departure of the photo mask mounted on the pocket portion 2232 when the first hand 2230a or the second hand 2230b returns from the pickup position to the home position. In addition, the grip part 2270 has a presence sensor 2274 for detecting a photo mask. The presence / absence sensor 2274 is pressed by the photo mask when the photo mask M is normally placed in the first hand 2230a (or the second hand) and is detected by the photo mask.

The position misalignment unit 2280 is installed in the gantry 2250. The position misalignment detecting unit 2280 detects misalignment of the photo mask M in the home position. The position misalignment unit 2280 senses the photo mask M in the vertical direction. The position misalignment detecting unit 2280 is provided with a light emitting unit 2228 and a light receiving unit 2284 above and below, and the position thereof is positioned to pass through the sensing holes P1 formed at both ends of the photo mask M. . If the photo mask M is placed on the pocket portion 2232 or shifted to one side, the light receiving portion 2284 of the position shift detection unit 2280 may not receive a signal from the light emitting unit 2228. In this case, the position of the photo mask M is determined to be in a wrong state, and an alarm is sounded to stop the process.

The foregoing description is merely illustrative of the technical idea of the present invention, and various changes and modifications may be made by those skilled in the art without departing from the essential characteristics of the present invention. Therefore, the embodiments disclosed in the present invention are intended to illustrate rather than limit the scope of the present invention, and the scope of the technical idea of the present invention is not limited by these embodiments. The protection scope of the present invention should be interpreted by the following claims, and all technical ideas within the equivalent scope should be interpreted as being included in the scope of the present invention.

1000: index portion
2000: first processing unit
3000: second processing unit
4000: Buffer Unit

Claims (21)

In substrate processing equipment:
An index unit having a port on which a container containing a substrate is placed and an index robot;
A processing unit which performs substrate processing; And
A buffer unit disposed between the processing unit and the index unit, wherein the substrate to be conveyed therebetween temporarily stays;
The processing unit
And a substrate removal processing module, a substrate cooling processing module, a heating processing module, and a functional water processing module disposed along a transport path for transporting the substrate. The method of claim 1,
The processing unit
A first treatment part for performing wet cleaning of the substrate; And
And a second processing unit which is disposed to be stacked with the first processing unit and which performs dry and functional water cleaning of the substrate. The method of claim 2,
The first processing unit
A first transport path having a first transport robot for transporting a substrate,
And the substrate removing processing module and the substrate cooling processing module are disposed along the first transfer path at a side of the first transfer path. The method of claim 3,
The glue removal processing module
A front processing module (HSU) for applying an SPM solution to the entire surface of the substrate to remove glue; And
And a partial processing module (HSU) for partially applying an SPM solution to the substrate edge to remove the glue. The method of claim 3,
The second processing unit
Further comprising a second transport path having a second transport robot for transporting the substrate,
And the heat treatment module and the functional water treatment module are disposed along the second transport path at a side of the second transport path. The method of claim 5,
The heat treatment module
A baking plate for the baking process; And an ultraviolet lamp for the ultraviolet irradiation process, wherein the baking process and the ultraviolet irradiation process are performed alone or simultaneously. The method of claim 5,
The functional water treatment module
Optionally using functional water to remove particles from the substrate surface;
The function number is
And ultrapure water added with carbon dioxide (CO2), ultrapure water added with hydrogen (H2) and ultrapure water added with ozone (O3). The method of claim 1,
And an ionizer is installed in the transfer path. The method according to claim 1 or 2,
The buffer unit,
A first buffer on which the substrate is placed;
A driving unit for inverting the first buffer; And
And a frame having a front section and a rear section open and a center section in which the first buffer is located, and a drive section disposed on both sides of the center section and in which the driving section is located. 10. The method of claim 9,
The first buffer
A first support part supporting one surface of the substrate; And
A second support part installed to face the first support part and supporting the other surface of the substrate placed on the first support part;
The driving unit
A rotation module for rotating the first support and the second support; And
And an elevating module for elevating the second support so that a substrate is gripped by the first support and the second support. The method of claim 10,
And the rotation axis of the first buffer is eccentric with the grip position center of the substrate so that the loading position of the substrate and the unloading position after inversion are the same. The method according to claim 1 or 2,
The heating treatment module
A baking plate onto which a substrate is loaded;
A main body having the bake plate positioned thereon and having an upper surface open and having an entrance and exit at one side thereof for carrying in and out of the substrate;
A cover for opening and closing the opened upper surface of the main body; And
And UV lamps installed on the cover to irradiate ultraviolet rays to the substrate. The method of claim 12,
Lift pins supporting a substrate to be loaded / exported through the doorway;
A first elevating driving unit for elevating a substrate supported by the lift pins between the baking plate and the ultraviolet lamp; And
Further comprising a second lift drive for lifting the bake plate,
The first lift drive unit
A loading / unloading position at which the substrate is loaded / unloaded through the doorway;
A bake position lower than the loading / unloading position, the substrate seated on the bake plate for bake processing of the substrate; And
Higher than the loading / unloading position, the substrate is moved up and down at an ultraviolet irradiation position in which the substrate is positioned close to the ultraviolet lamp for ultraviolet treatment of the substrate,
The second lift drive unit
And elevating the bake plate to an ultraviolet irradiation position proximate to the ultraviolet lamp for ultraviolet treatment of the substrate. The method according to claim 1 or 2,
The substrate cooling processing module
chamber;
A cooling unit installed in the inner space of the chamber;
The cooling unit
A first support frame and a second support frame spaced apart from each other;
Cooling plates are installed inside the 1,2 support frame, the substrate is placed;
Lift pins positioned below the cooling plate; And
And a driving unit installed outside the first and second support frames to up and down the lift pins. The method of claim 12,
The cooling unit
And a space partition cover covering an outer surface of the first support frame and the second support frame such that the drive space in which the drive unit is located is separated from the internal space of the chamber. The method of claim 5,
Each of the first transport robot and the second transport robot
Base;
At least one hand having a pocket on which the substrate is raised and moving from a groove position located above the base to a pickup position for substrate pickup;
An alignment unit for aligning the position of the substrate when the at least one hand returns from the pick-up position to the home position; And
And a gantry installed spaced apart from an upper surface of the base and provided with the alignment unit. In the substrate processing method:
Providing a substrate contained in a container to an index portion;
Transferring the substrate from the index portion to the processing portion where the cleaning process is performed on the substrate;
Performing a cleaning process on the substrate in the processing unit;
The cleaning treatment step
Removing the glue from the substrate; And
Removing particles of the substrate surface from which the glue has been removed. 18. The method of claim 17,
The cleaning treatment step
And a heating step of baking the substrate and irradiating ultraviolet rays and a cooling step of cooling the substrate between the glue removing step and the particle removing step. 18. The method of claim 17,
And a buffer unit in which a substrate temporarily stays between the index unit and the processing unit, so that the substrate conveyed between the index and the processing unit is inverted while staying in the buffer unit. 18. The method of claim 17,
The glue removal step is
Treating the substrate surface with a sulfuric acid and hydrogen peroxide mixed solution (SPM);
Treating the substrate surface with hot ultrapure water;
Treating the substrate surface with an RCA standard clean 1 (SC-1);
Treating the substrate surface with a rinse solution; And
Drying the substrate surface,
The particle removal step
A substrate treatment method comprising removing particulates and organics on the surface of a substrate by using ultrapure water added with carbon dioxide (CO2), ultrapure water added with hydrogen (H2) and ultrapure water added with ozone (O3). 18. The method of claim 17,
And said substrate is a photo mask.

Images