TW201210709A - Cleaning system - Google Patents

Cleaning system Download PDF

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Publication number
TW201210709A
TW201210709A TW100118093A TW100118093A TW201210709A TW 201210709 A TW201210709 A TW 201210709A TW 100118093 A TW100118093 A TW 100118093A TW 100118093 A TW100118093 A TW 100118093A TW 201210709 A TW201210709 A TW 201210709A
Authority
TW
Taiwan
Prior art keywords
roller
cleaning
foreign matter
clean
voltage
Prior art date
Application number
TW100118093A
Other languages
Chinese (zh)
Other versions
TWI406716B (en
Inventor
Masashi Ohta
Mikio Tsutsumi
Yuka Murakawa
Original Assignee
Bando Chemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bando Chemical Ind filed Critical Bando Chemical Ind
Publication of TW201210709A publication Critical patent/TW201210709A/en
Application granted granted Critical
Publication of TWI406716B publication Critical patent/TWI406716B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B6/00Cleaning by electrostatic means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/02Plant or installations having external electricity supply
    • B03C3/04Plant or installations having external electricity supply dry type
    • B03C3/10Plant or installations having external electricity supply dry type characterised by presence of electrodes moving during separating action
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/32Transportable units, e.g. for cleaning room air
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B03SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03CMAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03C3/00Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
    • B03C3/34Constructional details or accessories or operation thereof
    • B03C3/74Cleaning the electrodes
    • B03C3/743Cleaning the electrodes by using friction, e.g. by brushes or sliding elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/50Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/52Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/50Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/54Cleaning by methods involving the use of tools involving cleaning of the cleaning members using mechanical tools

Landscapes

  • Electrostatic Charge, Transfer And Separation In Electrography (AREA)
  • Cleaning In General (AREA)

Abstract

Provided is a system in which the adsorption of foreign matter by a cleaning roller can be continued for a prolonged period of time without performing maintenance operations on the cleaning roller. The disclosed cleaning roller (11) moves relatively with respect to an object to be cleaned (S) while rotating and contacting the surface of the object to be cleaned (S), and removes foreign matter, such as dust and dirt, adhering to the surface of the object to be cleaned (S) by utilizing electrostatic force. A transferring roller (21) rotates while contacting the surface of the cleaning roller (11). The cleaning roller (11) is grounded via a voltage stabilizing circuit (12), and can have the roller surface charged stably with an electric charge for carrying out adsorption with said electrostatic force. The transferring roller (21) can have the surface thereof charged with an electric charge for adsorbing foreign matter adhering to the surface of the cleaning roller (11) by utilizing electrostatic force, and the transferring roller is connected to an external power source (31) such that the electrification voltage for the adsorption of said foreign matter with said electrostatic force is kept constant.

Description

201210709 六、發明說明: 【發明所屬之技術領域】 本發明,係有關於藉靜電力而將附著於被潔淨材表面 之異物(塵埃等)予以除去之潔料統。特別料於當被 材為薄型物件之情形(例如玻璃基板、印刷基板(pcb、pcba 等)、薄膜、薄片、及塑膠板等表面較為平滑者)。 【先前技術】 -直以來’作為用以除去在薄型被潔淨材(平面顯示器 P FPD之玻璃基板、或貼合薄㈣、印刷基板等)表面附著之 塵埃等異物之潔淨系統,已知有使用黏著滾筒以藉由其黏 著力去除該異物者(例如參照專利文獻丨)。 以此類點著滾筒’並無法除去微小異物(例如,平均徑 1…下的異物)’對於暫時附著在黏著滚筒表面(黏 之塵埃等異物’極不易完全除去,其維護性不佳。又,由 於係將黏著滾筒朝被潔淨材施加某種程度的壓力以除 物’因此,當被潔淨材為例如可能不僅是該異物的 除去,甚至可能使薄膜亦貼附至滾筒表面。 此處,本案之發明者,根據以下想法而已另外申 利(參照日本制2__271797)4從被潔料去除塵埃等 =物之際’只要以施加電壓的方式,冑潔淨滚筒的表面 有能以靜電力吸附該異物的電荷,則能利用 、▲ 潔淨滾筒去除該異物。 ’以戌 然而’在上述内容中,藉由潔淨滾筒,利用靜電力之 3 201210709 吸附力而從被潔淨材的表面所去除的異物,係依序堆積在 該潔淨滾筒的滾筒表面(外周面),因此,必須要定期的進行 從該滾筒表面去除異物之維護作業。 此外,在利用黏著滾筒的黏著力之潔淨系統中,一般 所*用之機構,係使接觸於黏著力較潔淨滚筒(黏著滾筒) 為強之轉印滾筒(黏著滾筒),以將異物從該潔淨滾筒移送至 轉印滾筒之側。 此處所思考者,係將具有該強黏著力之轉印滾筒利用 於該潔淨系統。 (專利文獻) 專利文獻1 :日本特開2008-168188號公報 【發明内容】 然而,在如上述使用具有強黏著力之轉印滾筒後,並 不能在潔淨滾筒的表面穩定的帶有能以靜電力來吸附異物 的電荷。因此,在不對於潔淨滾筒施以維護作業的情況下, 潔淨滾筒對異物的吸附動作將難以長期持續進行。 本發明之目的在於,提供一種無需對潔淨滾筒施以維 護作業,即可長期持續進行潔淨滾筒對異物之吸附動作之 春淨系統。 此外,在以靜電力(庫侖力)來吸附異物的情形,在滾筒 表面所保持之電荷越多,則吸附力越強,但若滾筒表面具 有過剩的帶電壓,則有可能在潔淨滾筒與其對象物、亦即 被潔淨材之間,造成火花放電、或使滾筒表面或被潔淨材 201210709 之帶電狀態產生不均勻’而使異物被吸弓丨至該不均勻處, 而不再能發揮穩定的潔淨功能。除此之外,尚有 電而傷害對象物的風險。再者,當被潔淨材為不耐靜電匕之 半導體等電子零件時,即使所蓄積電荷不至造成火花放電 仍會發生靜電破壞的問題。 此處,本發明之目的,除了上述目的以外,尚在於提 供-種潔淨裝置,其能將藉靜電力吸附異物而在滾筒表面 產生之帶電壓抑制成不高於必要值,而能夠穩定該帶電壓。 申請專利範圍帛i項之發明,係—種潔淨系統,其具[Technical Field] The present invention relates to a cleaning system for removing foreign matter (dust, etc.) adhering to the surface of a cleaned material by electrostatic force. It is particularly desirable when the material is a thin object (for example, a glass substrate, a printed substrate (pcb, pcba, etc.), a film, a sheet, and a plastic plate, etc.). [Prior Art] - It is known that it is used as a cleaning system for removing foreign matter such as dust adhering to the surface of a thin cleaned material (a glass substrate of a flat display PFPD, a thin laminated film (four), a printed circuit board, etc.). The adhesive roller is used to remove the foreign matter by its adhesive force (for example, refer to the patent document 丨). By clicking on the roller as such, it is impossible to remove minute foreign matter (for example, foreign matter under the average diameter of 1). For temporary adhesion to the surface of the adhesive roller (foreign matter such as sticky dust) is extremely difficult to remove completely, and its maintenance is poor. Since the adhesive roller applies a certain degree of pressure to the object to be cleaned to remove the object's, therefore, when the material to be cleaned is, for example, not only the removal of the foreign matter, but also the film may be attached to the surface of the drum. In the case of the inventor of the present invention, according to the following idea, the other side of the cleaning drum is capable of being electrostatically adsorbed by the application of a voltage by applying a voltage to the cleaning material (see Japanese-made 2__271797). For the charge of the foreign matter, the foreign matter can be removed by the ▲ clean roller. 'In the above, the foreign matter removed from the surface of the cleaned material by the electrostatic force 3 201210709 by the cleaning roller, Since it is deposited on the drum surface (outer peripheral surface) of the cleaning drum in this order, it is necessary to perform maintenance work for removing foreign matter from the surface of the drum periodically. In the cleaning system using the adhesive force of the adhesive roller, the mechanism generally used is a transfer roller (adhesive roller) which is stronger than the adhesion roller (adhesive roller) to remove foreign matter from the cleaning. The roller is transferred to the side of the transfer roller. The transfer roller having the strong adhesive force is used in the cleaning system. (Patent Document 1) Japanese Patent Laid-Open Publication No. 2008-168188 】 However, after the transfer roller having a strong adhesive force as described above, it is not stable on the surface of the cleaning roller with an electric charge capable of adsorbing foreign matter by electrostatic force. Therefore, maintenance work is not performed on the cleaning roller. In this case, it is difficult for the cleaning operation of the foreign matter by the cleaning roller to continue for a long period of time. It is an object of the present invention to provide a spring cleaning system that can continuously perform the adsorption operation of the cleaning roller on the foreign matter without performing maintenance work on the cleaning roller. In addition, in the case of adsorbing foreign matter by electrostatic force (Coulomb force), the more charge is held on the surface of the drum, the adsorption force Strong, but if the surface of the drum has an excessive voltage, it is possible to cause spark discharge between the clean drum and its object, that is, the material to be cleaned, or to cause unevenness in the charged state of the surface of the drum or the cleaned material 201210709' Therefore, the foreign matter is sucked to the unevenness, and the stable clean function can no longer be exerted. In addition, there is a risk of damage to the object due to electricity. Moreover, when the cleaned material is not resistant to static electricity, In the case of an electronic component such as a semiconductor, even if the stored charge does not cause a spark discharge, electrostatic discharge may occur. Here, in addition to the above object, an object of the present invention is to provide a cleaning device capable of electrostatically charging The force of adsorbing foreign matter and suppressing the voltage generated on the surface of the drum is not higher than necessary, and the voltage of the strip can be stabilized. The invention of claim 帛i is a clean system with

備邊接觸於被潔;爭μ &志&、息A 汉办手材的表面邊旋轉而相對移動 筒,係藉由該潔淨滾筒,利用靜電力以去除在該被潔L 表面上所附著的塵埃等異物; 其特徵在於, 以相對該潔淨滚筒的方式,設有邊接觸於該潔淨滚筒 表面邊旋轉之轉印滾筒;該潔淨滚筒,在表面能帶有用以 藉靜電力來吸附在該被潔淨材表面上所附著異物之電荷; 該轉印滾筒’在表面能帶有用以藉靜電力來吸附在該潔淨 滾筒表面上所附著異物夕带#. 者吳物之電何,該潔淨滾筒係透過穩壓電 路而接地;該轉印浪筒,後古 尚係直接或間接的與外部電源連接; 該穩壓電路,可供轡-缔絲h、Α μ丄 變更該轉印滾疴中用以藉靜電力吸附該 異物之帶電壓。 藉此方& &於潔淨滚筒在表面能帶有用以藉靜電力 來吸附在被潔淨材表面上所附著異物之電荷,故在被潔淨 材表面上的異物’遂由該潔淨滾筒所吸附。又,由於轉印 201210709 滚筒在表面能帶有用以藉靜電力來吸附在該潔淨滾筒表面 上所附著異物之電肖,因此,被吸附至潔淨滾筒之異物, 遂被吸附至該轉印滾筒。因1^,對於潔淨滾筒,無需施以 疋期去除(清掃)或定期交換等維護作業。 再者,藉著變更與潔淨滾筒連接之穩壓電路之設定電 壓值,可抑制藉靜電力吸附異物時在滾筒表面所產生之帶 電壓咼於必要值,而能穩定該帶電壓。又,亦可防止半導 體等不耐靜電之電子零件受到靜電的破壞。 在此情形,如申請專利範圍第2項所示,該穩壓電路, 可,用固定電阻器、可變電阻器、或是具有複數個固定電 I1器而可切換所使用之固定電阻器以變更電阻值之切換式 電阻器。 ' 藉此方式,藉由變更固定電阻器、可變電阻器、或切 換式電阻器的電阻值,該轉印滚筒之藉靜電力吸附該異物 之帶電壓,其變更電路(即穩壓電路)能以簡單的方式構成。 再者’在使用固定電阻器的情形,亦可交換固定電阻器而 變更電阻值》 亦即,藉由該電阻值的變更,該潔淨滾筒之藉靜電力 吸附該異物之帶電壓即可變t ’因此,即使對於該轉印滾 筒有外部電源的電壓施加’ #能在不變更該施加電壓的情 兄下對於$潔’淨滾筒,改變對於吸附至該潔淨滾筒之異 物的吸附力。例如’只要將連接於該潔淨滾筒之電阻器的 電阻值無限制的縮小’即可減少藉靜電力吸附該潔淨滚筒 表面上所附著異物的電# ’而能使該潔淨滾筒,失去對於 201210709 吸附至該潔淨滾μ $ s & & 淨滾筒之異物,/異物的吸附力。其結果,被吸附至潔 作業趨於容易/至該轉印滚筒。因此,上述之維護 筒r,雹料、屑如利用黏著滾筒之黏著力之習知的潔淨滾 去二产h於附著在潔淨滾筒之滚筒表面的異物實施定期 “月约、或對附著有該異物之潔淨滾 維護作業,即可霜适“ ·《耳他疋期父換等 對於施加至轉印=維邊性佳之潔淨系統。又’由於無須 至轉印滾筒…電壓進行頻繁控制,故將電壓施加 疴之外部電源,能被設計得更為精簡。 々申%專利範3項所示,該轉印滚筒,較佳係邊 接^該潔淨滾筒之表面邊旋轉,藉此而在其與該潔淨滾筒 之照該轉印滾筒與該潔淨滾筒之表面特性的差異(例 如帶電序列)而產生電位差。 藉此方式’利用潔淨滾筒與轉印滾筒之旋轉而產生的 接觸剝離,在該轉印滾筒,依照其與該潔淨滾筒之表面特 性⑼如帶電序列)之差異而產生電位差,而使帶有電荷,以 供利用靜電力來吸附在被潔淨材表面上之附著異物。 又’如申請專利範圍第4項所示,較佳構成,係以相 對該轉印滾筒的方式,設有朝併轉方向或逆向旋轉之潔淨 刷子,並以相對該潔淨刷子的方式而設有朝併轉方向或逆 向旋轉之金屬滾筒;該外部電源與該金屬滚筒連接,在該 轉印滾筒、該潔淨刷子、及該金屬滚筒之間產生電位差/ 藉此方式,藉潔淨刷子而從轉印滾筒去除異物,並利 用靜電力而移至金屬滾筒,有效率的從該轉印滚筒去除異 201210709 物。特別是,亦能配合與金屬滾筒連接 之與該轉印滚筒間的電位差 °電源所產生 搬送至該金屬滾筒。 變更、有效率的將異物 在此情形,可如申請專利範圍帛 滾筒的表面附近,配置有能山 載’在该金屬 Μ轰面刮除部來到除在該金屬 濃尚表面上之附者異物之潔淨刮片。 藉此方式,因靜電力而被吸附至金 物,传藉由嘴潘丨丨ϋ + 〇i 间表· Φ之異 係籍由潔淨刮片之則端到除部而被刮除 從該金屬滾筒去除異物。 有效率的 再者,如中請專利範圍第6項所示,較佳係在該潔淨 入片附近,设置有能藉真空壓來吸引異物之真空手段的吸 口’或者疋设有用來回收及累積由潔淨到片所 物之異物收置箱。 異 藉此方式’因靜電力而被吸附至該金屬滾筒表面之異 口’係被潔淨刮片之前端到除部所刮除,並通過真空手段 之吸入口,而使該異物被負壓所吸引,或是被異物收置 所回收’因此’該異物不再有污染該金屬滾筒周邊之虞。目 六別疋S己置有異物收置箱的情形時,能在不設置新的動 的情況下,將異物回收至異物收置箱。 亦可如申請專利範圍第7項所示,以夾該被潔淨材之 式,在該潔淨滾筒之反側配置有引導滾筒, 倍田I、/坦一 Α Μ守展同, 、用以扣尚該潔淨滾筒藉靜電力吸附在該被潔淨材表 之附著異物之電場強度。 上 藉此方式,係以2只滾筒夾被潔淨材而成對向之方式, 201210709 使被潔淨材在與潔淨滚筒及引導滾筒接觸的位置從上下被 支承,而能在穩定地受到支承的狀態下,去除被潔淨材表 面上的異物。 又,潔淨滾筒係藉由引導滾筒’提高了以靜電力吸附 在該被潔淨材表面上所附著異物的電場強度,被潔淨材上 的帶電異物,乃隨著被賦予的電場而被吸附至潔淨滾筒, 有效去除之。 申明專利範圍第8項之發明,係一種潔淨系統,其具 備邊接觸於被潔淨材之表面邊旋轉而相對移動的潔淨滾 筒,其係藉由該潔淨滾筒’利用靜電力以去除在該被潔淨 材表面上所附著的塵埃等異物;其特徵在於, 其係以相對該潔淨滾筒的方式,設有邊接觸於該潔淨 滾筒的表面邊旋轉的轉印滚筒;該潔淨滾筒,在表面能帶 有用以藉靜電力來吸附在該被潔淨材表面上所附著異物之 電荷;該轉印滾筒,在表面能帶有用以藉靜電力來吸附在 該潔淨滾筒表面上所附著異物之電荷;在該轉印滾筒,外 部電源之電壓以直接或間接施加的方式構成;該潔淨滚 琦係透過用以將該潔淨滾筒之帶電壓控制於設定電壓以 下之第1穩壓電路而接地,另一方面,在該潔淨滚筒與該 轉印滚筒之間’設置有用以在其等之間產生電位差的第2 穩壓電路。 *藉此方式,與上述發明相同,潔淨滚筒在表面能帶有 藉由靜電力來吸附在被潔淨材表面上所附著異物之電荷, 因此被淨材表面上的異物,遂被吸附至該潔淨滾筒。 201210709 又’轉印滾筒在表面能德女μ 锋圭工 帶有藉由靜電力來吸附在該潔淨滾 靖表面上所附著異物之 思札 €何,因此,被吸附至潔淨滾筒的 吳物,被吸附至轉印滾 期實施去除(清掃)<以5此,對於潔淨滾筒,已無定 .^ )次疋期交換等維護作業的必要。因之,無 需如利用黏著滾筒之點& 1 ^ 者力之習知的潔淨系統般,需要有 除(清掃)潔淨滾筒之滾筒表面之附著異物、或定期交 、附者有该異物的潔淨滾筒等維護作業,即能獲得 佳之潔淨系統。 壓值 產生 定。 破壞 特別是’#變更與潔淨滾筒連接之穩壓電路之設定電 藉此而能抑制為了藉靜電力吸附異物而在滾筒表面 之帶電壓高於必要信丨v u ,. ^ 要值以上,而能使該帶電壓保持穩 又,亦可防止不耐靜電之半導體等電子零件受到靜電 又,藉著變更該帛1穩壓電路之設定電壓值,對於咳 潔淨滾筒,可降低對於吸附至該潔淨滾筒之異物的吸: 力。例如’若使該帛i穩壓電路之設定電壓值成為正負相 逆的極性,藉靜電力來吸附在該潔淨滾筒表面上所附著異 物之電荷’將會發生反轉’而能造成該潔淨滾筒失去對於 吸附至該潔淨滾筒之異物的吸附力。其結果,被吸附至潔 淨滾筒之異物,被吸附至該轉印滾筒。因而使上述之維護 作業趨於容易。 在此情形’較佳係如申請專利範圍第9項所示,該轉 印滾筒邊接觸於該潔淨滾筒的表面邊旋轉,藉以在其與該 潔淨滾筒之間,依照該轉印滾筒與該潔淨滾筒之表面特性 10 201210709 的差異(例如帶電序列)而產生電位差。 藉此方式’係藉由潔淨滾筒與轉印滾筒之旋轉造成的 接觸剝離,而在該轉印滾筒,依照其與該潔淨滾筒之表面 特性(例如帶電序列)的差異而產生電位差,因而帶有電荷, 以供藉由靜電力來吸附在被潔淨材表面上所附著之異物。 又,如申請專利範圍第1 〇項所示,較佳係以相對該轉 印滾筒之方式,設有朝併轉方向或逆向旋轉之潔淨刷子, 並以相對該潔淨刷子的方式,設有朝併轉方向或逆向旋轉 之金屬滚筒,對該金屬滾筒連接有該外部電源,在該轉印 滾筒與該潔淨刷子之間,設有用以在該轉印滾筒與該潔淨 刷子之間產生電位差之帛3 „電路;在該潔淨刷子與該 金屬滾筒之間,設有用以在該潔淨刷子與該金屬滾筒之間 產生電位差之第4穩壓電路。 ^藉此方式,在藉由潔淨刷子從轉印滾筒除去異物,藉 靜電力移至金屬滾筒,並藉帛4穩壓電路 的帶電壓而造成該金屬滾筒失去對於其所吸附之異金= 附力時,有效率的從該金屬滾筒去除異物。特別是,亦可 該金屬滾筒連接之外部電源所產生之與該轉 =的電位差來變更’而能有效率的將異物搬送至該金屬 又’亦可如申請專利範圍第"項所示般 穩壓電路,分別具有第丨〜第4 錯該第 電阻器’將施加至相互接觸之該滚 ^ Μ m . . 琦或该刷子間的電壓以 方式構成。此處之電阻器可為固定電阻器或可變電阻 201210709The side is in contact with the cleansing; the surface of the hand of the Han handicraft is rotated while the surface of the hand is rotated, and the cylinder is relatively moved by the electrostatic roller to remove the surface on the surface of the cleaned L. a foreign matter such as dust attached; characterized in that, in a manner opposite to the cleaning roller, a transfer roller that is rotated while contacting the surface of the cleaning roller is provided; the cleaning roller is provided on the surface to be adsorbed by an electrostatic force The charge of the foreign matter attached to the surface of the cleaned material; the transfer roller' can have a foreign matter attached to the surface of the clean roller by electrostatic force on the surface. The roller is grounded through a voltage stabilizing circuit; the transfer wave is connected directly or indirectly to an external power source; the voltage stabilizing circuit can be used to change the transfer roller by 辔-缔丝 h, Α μ丄The voltage used to adsorb the foreign matter by electrostatic force. The cleaning roller can have a charge on the surface of the cleaning roller for adsorbing foreign matter adhering to the surface of the object to be cleaned by the electrostatic force, so that the foreign matter on the surface of the cleaned material is adsorbed by the cleaning roller. . Further, since the transfer 201210709 roller has an electric surface on the surface for adsorbing foreign matter adhering to the surface of the cleaning roller by electrostatic force, the foreign matter adsorbed to the cleaning roller is adsorbed to the transfer roller. Because of the 1^, for the clean drum, maintenance work such as periodic removal (cleaning) or regular exchange is not required. Further, by changing the set voltage value of the voltage stabilizing circuit connected to the clean roller, it is possible to suppress the voltage generated on the surface of the drum when the foreign matter is adsorbed by the electrostatic force, and to stabilize the voltage. Further, it is possible to prevent the electronic components which are not resistant to static electricity such as semiconductors from being damaged by static electricity. In this case, as shown in the second item of the patent application, the voltage stabilizing circuit can be switched by a fixed resistor, a variable resistor, or a fixed resistor having a plurality of fixed electric I1s. A switching resistor that changes the resistance value. In this way, by changing the resistance value of the fixed resistor, the variable resistor, or the switching resistor, the transfer roller adsorbs the voltage of the foreign matter by the electrostatic force, and the circuit is changed (ie, the voltage regulator circuit) Can be constructed in a simple way. Furthermore, in the case of using a fixed resistor, it is also possible to exchange a fixed resistor and change the resistance value. That is, by changing the resistance value, the electrostatic pressure of the clean roller can be changed by the electrostatic force of the foreign matter. Therefore, even if the voltage of the external transfer source is applied to the transfer roller, the suction force of the foreign matter adsorbed to the cleaning roller can be changed without changing the applied voltage. For example, 'as long as the resistance value of the resistor connected to the clean roller is reduced indefinitely', the electric force that adsorbs the foreign matter adhering to the surface of the clean roller by the electrostatic force can be reduced, and the clean roller can be lost to the adsorption of 201210709. To the clean roll μ $ s &&&&&&&< As a result, the adsorption to the cleaning operation tends to be easy/to the transfer roller. Therefore, the above-mentioned maintenance cylinder r, the material and the scraps are cleaned by the conventional cleaning roller which uses the adhesive force of the adhesive roller, and the foreign matter attached to the surface of the drum of the clean roller is periodically "approx. The cleaning of the foreign matter of the foreign matter can be carried out, and the cream can be applied to the "cleaning system of the application of the transfer to the transfer of the edge." Further, since the voltage is not frequently controlled to the transfer roller, the external power supply to which the voltage is applied can be designed to be more compact. The transfer roller is preferably rotated while the surface of the cleaning roller is rotated, whereby the surface of the transfer roller and the cleaning roller are illuminated with the cleaning roller. A difference in characteristics (such as a charged sequence) produces a potential difference. In this way, the contact peeling caused by the rotation of the cleaning roller and the transfer roller is utilized, and the potential difference is generated in the transfer roller according to the difference in surface characteristics (9) such as the charging sequence of the cleaning roller, so that the charge is charged. For the attachment of foreign matter on the surface of the material to be cleaned by electrostatic force. Further, as shown in item 4 of the patent application, a preferred embodiment is provided with a cleaning brush that rotates in the direction of rotation or reverse in a manner opposite to the transfer roller, and is provided in a manner opposite to the cleaning brush. a metal roller that rotates in the opposite direction or in the opposite direction; the external power source is connected to the metal roller, and a potential difference is generated between the transfer roller, the cleaning brush, and the metal roller/by way of a cleaning brush The roller removes foreign matter and moves to the metal roller by electrostatic force, effectively removing the 201210709 from the transfer roller. In particular, it can also be transported to the metal drum in cooperation with a potential difference between the transfer roller and the transfer roller. In the case of changing or efficiently transferring foreign matter in this case, it can be arranged in the vicinity of the surface of the drum of the patent application scope, and can be placed on the surface of the metal smashing surface to be attached to the surface of the metal. A clean blade of foreign matter. In this way, it is adsorbed to the gold object by the electrostatic force, and is transferred from the mouth of the nozzle to the ·i. The Φ is separated from the end of the clean blade to the eliminator, and the foreign matter is removed from the metal roller. . In addition, as shown in item 6 of the patent scope, it is preferable to provide a suction port or a vacuum device capable of vacuuming to attract foreign matter in the vicinity of the clean film. The box is cleaned from the foreign objects that are cleaned to the pieces. In this way, the "dissimilar port that is adsorbed to the surface of the metal roller by the electrostatic force" is scraped off from the front end of the cleaning blade to the removing portion, and is passed through the suction port of the vacuum means, so that the foreign matter is negatively pressed. Attracted, or recovered by foreign matter collection. Therefore, the foreign matter no longer contaminates the periphery of the metal drum. In the case where the foreign object storage box is placed in the sixth place, the foreign matter can be recovered to the foreign matter storage box without setting a new movement. Alternatively, as shown in item 7 of the patent application scope, a guide roller is disposed on the opposite side of the cleaning roller in the manner of the cleaned material, and the Ubuntu I, / Tan Α Μ Μ 展 展 , , The clean roller is also adsorbed by the electrostatic force to the electric field strength of the foreign matter attached to the surface of the cleaned material. In this way, the two rollers are placed in a direction in which the cleaning material is placed in the opposite direction. In 201210709, the material to be cleaned is supported from the upper and lower sides at a position in contact with the cleaning roller and the guide roller, and can be stably supported. Next, remove foreign matter on the surface of the cleaned material. Further, the clean roller is configured to increase the electric field strength of the foreign matter adhered to the surface of the object to be cleaned by the electrostatic force by the guide roller, and the charged foreign matter on the cleaned material is adsorbed to the clean with the applied electric field. Roller, effectively remove it. The invention of claim 8 is a clean system having a clean drum that is relatively moved while being in contact with the surface of the cleaned material, and is cleaned by the electrostatic roller by the electrostatic force a foreign matter such as dust attached to the surface of the material; characterized in that it is provided with a transfer roller that rotates while contacting the surface of the cleaning roller in a manner opposite to the cleaning roller; the cleaning roller can be used on the surface The electrostatic charge is used to adsorb the charge of the foreign matter attached to the surface of the cleaned material; the transfer roller has a charge on the surface for adsorbing foreign matter attached to the surface of the clean roller by electrostatic force; In the printing cylinder, the voltage of the external power source is directly or indirectly applied; the cleaning roller is grounded through the first voltage stabilizing circuit for controlling the voltage of the cleaning roller to be equal to or lower than the set voltage, and A second voltage stabilizing circuit is provided between the cleaning roller and the transfer roller to generate a potential difference between them. * In this way, as in the above invention, the clean roller has a charge on the surface which is adsorbed by the electrostatic force on the surface of the object to be cleaned, so that the foreign matter on the surface of the cleaned material is adsorbed to the clean. roller. 201210709 In addition, the 'transfer roller' on the surface can be used to absorb the foreign matter attached to the surface of the clean rolling surface by electrostatic force. Therefore, the object that is adsorbed to the clean roller is It is removed by the adsorption to the transfer roll (cleaning) < 5, for the clean roll, there is no need for maintenance work such as the second cycle exchange. Therefore, it is not necessary to use a cleaning system such as the point of the adhesive roller and the conventional cleaning system, and it is necessary to have a foreign matter attached to the surface of the roller of the cleaning roller, or to periodically pay the cleaning of the foreign object. A good cleaning system can be obtained by maintenance work such as rollers. The pressure value is determined. Destruction, in particular, the setting of the voltage regulator circuit of the '#change and the clean drum connection can be suppressed, so that the voltage on the surface of the drum is higher than the necessary signal vu, . ^ in order to adsorb foreign matter by electrostatic force. By keeping the voltage of the strip stable, it is also possible to prevent the electronic components such as semiconductors that are not resistant to static electricity from being electrostatically charged, and by changing the set voltage value of the 帛1 voltage stabilizing circuit, for the cough cleaning roller, the adsorption to the clean roller can be reduced. The suction of foreign objects: force. For example, if the set voltage value of the 稳压i voltage stabilizing circuit is reversed, the charge of the foreign matter attached to the surface of the clean roller by the electrostatic force will be reversed, and the cleaning roller can be caused. The adsorption force for the foreign matter adsorbed to the clean roller is lost. As a result, the foreign matter adsorbed to the cleaning drum is adsorbed to the transfer roller. Therefore, the maintenance work described above tends to be easy. In this case, preferably, as shown in item 9 of the patent application, the transfer roller is rotated while contacting the surface of the cleaning roller, whereby between the cleaning roller and the cleaning roller, according to the transfer roller and the cleaning A difference in the surface characteristics of the roller 10 201210709 (for example, a charged sequence) produces a potential difference. In this way, the contact peeling is caused by the rotation of the cleaning roller and the transfer roller, and the transfer roller is subjected to a potential difference according to the difference in surface characteristics (for example, a charging sequence) from the cleaning roller, thereby A charge for adsorbing foreign matter adhering to the surface of the object to be cleaned by electrostatic force. Further, as shown in the first aspect of the patent application, it is preferable to provide a cleaning brush that rotates in the direction of rotation or reverse in a manner opposite to the transfer roller, and is provided in a manner opposite to the cleaning brush. And a metal roller rotating in the opposite direction or in the opposite direction, the external power source is connected to the metal roller, and between the transfer roller and the cleaning brush, a potential difference is generated between the transfer roller and the cleaning brush. 3 „circuit; between the clean brush and the metal roller, a fourth voltage stabilizing circuit for generating a potential difference between the clean brush and the metal roller is provided. ^ In this way, the transfer is performed by a clean brush The roller removes the foreign matter, moves to the metal roller by the electrostatic force, and causes the metal roller to lose the foreign gold adsorbed by the voltage of the voltage regulator of the 稳压4, and removes the foreign matter from the metal roller efficiently. In particular, it is also possible to change the potential difference generated by the external power source connected to the metal drum and to change the potential difference of the turn to "transport the foreign matter to the metal efficiently" as in the patent application scope &q. The voltage regulation circuit shown in the item uot; has the first to fourth error, respectively, and the first resistor 'will be applied to the roller Μ m . . . or the voltage between the brushes in a manner. The resistor can be a fixed resistor or a variable resistor 201210709

方式,第1〜第4之穩壓電路’係構成以電阻器分 電路,藉此可在該滾筒或是該刷子之間分別獲得所 要的第1〜第4電壓。 如申請專利範圍第12項所示,該第i〜第4電阻器之較 方式’係被設定成較相互接觸之該滾筒或該刷子間之接 觸電阻為小之電阻值。 接緬:此方式’係以電阻值較相互接觸之滾筒或刷子間之 為小的電阻器來分壓,藉此,可獲得與相互接觸 相對稃淨刷子間之接觸電阻的誤差或變化相較能呈現 相對穩定之電壓。 & 如申請專利_ 13項所示,該第(〜第3之穩壓電路 =方V係具有定電壓二極體或變阻器(非直線性電阻 器者。Θ第4穩壓電路’係具有固定電阻器或可變電阻 或變!Γ二藉由第1〜第3穩壓電路具有定電壓二極體 該第4穩壓電路具有固定電阻器或可變電阻器, 而旎經由分壓獲得穩定的電壓。 之9 =請專利範圍第14項所示般’該第1〜第3穩麼電路 二電壓二極體,較佳係將其等以面對面或背對背方式 藉此方式’藉由將具有稽納效果之定電壓二極體以面 面或背對背方式串接’而能在無關於極性的情況下保持 一定的電位差。 12 201210709 在此情形,如申請專利範圍第15項所示,較佳係具備 有電壓之正負極性切換手段’以供切換以該外部電源施加 至該滚筒或該刷子之電壓的正負極性。 藉此方式,可將該外部電源之正負極性自由的反轉。 如申請專利II圍第16項所示,在該金屬滾筒的表面附 近,配置有藉前端刮除部來到除在該金屬滾筒表面上所附 著異物之潔淨到片。 、曰此方式’被靜電力吸附至金屬滾筒表面之異物 被潔淨到片之前端逢,丨A ,、 '、邛斤到除,因而有效率從該金屬 筒去除異物。 在此情形, 該潔淨到片附近 手段的吸入口、 之異物之異物收 如申請專利範圍第1 7項所示般,較佳係在 ,配置有可藉真空壓力來吸引異物之真空 或是配置有回收及累積由潔淨刮片所到除 置箱。 “匕方式’因靜電力而被吸附至該金屬滾筒表面之 係被潔淨刮片之前端刮除部所刮除,並通過真空手段 之及入口 ’而使該異物被負壓所吸引,或是被異物收置箱 :二’因此,該異物不再有污染該金屬滾筒周 。 ,別疋,配置有異物收置箱的情形時,能在不 力的情況下,將異物回收至異物收置箱。 ㈣動 方弋亦:士申明專利範圍第18項所示,以夾該被潔淨材之 =以=淨滾筒之反側配置有引導滚筒,該引導滚筒, 係用“該潔淨滾筒藉靜電力吸附 之附著異物之電場強度。 何表面上In the first to fourth voltage regulator circuits, a resistor circuit is formed, whereby the first to fourth voltages can be obtained between the roller or the brush. As shown in item 12 of the patent application, the ith to fourth resistors are arranged such that the contact resistance between the roller or the brush which is in contact with each other is a small resistance value.接 蒙: This method is based on the resistance between the rollers or the brush that is in contact with each other to divide the pressure, thereby obtaining the error or variation of the contact resistance between the brushes and the mutual contact. Can exhibit a relatively stable voltage. & As shown in the patent application _13, the first (~3rd voltage regulator circuit = square V system has a constant voltage diode or varistor (non-linear resistor. Θ 4th voltage regulator circuit) has Fixed resistor or variable resistor or variable! Γ2 has a constant voltage diode through the first to third regulator circuits. The fourth regulator circuit has a fixed resistor or a variable resistor, and the 旎 is obtained by dividing the voltage. Stable voltage. 9 = Please as shown in item 14 of the patent range 'The 1st to 3rd stable circuit two voltage diodes, preferably by face-to-face or back-to-back mode by this way' The constant voltage diodes with the effect of the sense are connected in series or back-to-back mode to maintain a certain potential difference without polarity. 12 201210709 In this case, as shown in item 15 of the patent application, Preferably, the positive and negative polarity switching means for voltage is provided for switching the positive and negative polarity of the voltage applied to the drum or the brush by the external power source. In this way, the positive and negative polarities of the external power source can be freely reversed. As shown in item 16 of Patent II, In the vicinity of the surface of the metal drum, the front end scraping portion is disposed to clean the sheet from the foreign matter attached to the surface of the metal drum. In this manner, the foreign matter adsorbed to the surface of the metal drum by the electrostatic force is cleaned to the sheet. In the case of the front end, the 丨A, , ', 邛 到 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , As shown in the item, it is preferable to arrange a vacuum capable of attracting foreign matter by vacuum pressure or to arrange for recovery and accumulation from the clean blade to the removal box. The "匕 method" is adsorbed to the electrostatic force. The surface of the metal roller is scraped off by the scraping portion at the front end of the cleaning blade, and the foreign matter is attracted by the negative pressure by the vacuum means or the foreign matter, or the foreign matter is collected: "Therefore, the foreign matter There is no longer any pollution of the metal drum. If you are equipped with a foreign object storage box, you can recycle the foreign matter to the foreign object collection box if it is weak. (4) 动方弋:Shi Shenming Patent Scope 18 Illustrated, which is sandwiched = = trans to the side of the net drum arranged a clean sheet of guide rollers, the guide rollers, with the line "a clean drum by the electrostatic field intensity of the foreign matter adhering to the suction power. Ho surface

13 201210709 、藉此方係卩2只;袞筒夾被潔淨材而成對向 使被潔淨材在與潔淨滾筒及引導滾筒接觸的位置從上;被 ^物在穩定地受到支承的狀態τ ’去除被潔淨材表面上 又’潔淨滾筒係藉由引 在該被潔淨材表面上所附著 的帶電異物,乃隨著被賦予 有效去除之。 導滾筒,提高了以靜電力吸附 異物的電場強度,被潔淨材上 的電場而被吸附至潔淨滾筒, 本發明,如上述之構成,可變更對於吸附至潔淨滾筒 表面上之異物的吸附力,並可將異物穩定的轉印至轉印滾 筒之側,0此,無需如利用黏著滾筒之黏著力之習知的潔 淨系統般,需要有定期去除(清掃)潔淨滾筒之滾筒表面之附 著異物、或定期交換附著有該異物的潔淨滾筒等維護作 業’即能獲得維護性佳之潔淨系統。 特別疋,申請專利範圍第丨項之發明,變更連接至潔 淨滚筒之穩壓電路的設定電壓值,藉此方式,對於該潔淨 滾筒’可弱化其對於吸附至該潔淨滾筒之異物的吸附力, 可使付被吸附至潔淨滾筒之異物,被該轉印滾筒所吸附。 再且,藉由變更連接至潔淨滾筒之穩壓電路之設定電 壓值,可抑制為了藉靜電力來吸附異物而在滚筒表面所產 生之帶電壓高於必要值,穩定該帶電壓。又,亦可防止不 耐靜電之半導體等電子零件受到靜電破壞。 f請專利範圍帛8項之發明’能變更該潔淨滾筒之用 以藉靜電力來吸附該異物的帶電壓,因此,在不變更與該 201210709 轉印滾筒連接之外部電源之施加電壓的情況下,即可對於 該潔淨滾筒弱化其對於吸附至該潔淨滾筒之異物的吸附 力。其結果是’被潔淨滾筒所吸附之異物,被吸附至該轉 印滾筒。因而使上述維護作業趨於容易。 在此情形’同樣藉由變更連接至潔淨滾筒之穩壓電路 之設定電壓值,可抑制為了藉靜電力來吸附異物而在滾筒 表面所產生之帶電壓高於必要值,穩定該帶電壓。又,亦 可防止不耐靜電之半導體等電子零件受到靜電破壞。 【實施方式】 以下,沿著圖面說明本發明之實施形態❶ · (第1實施形態) 圖i(a)、(b)’係本發明之潔淨系統之第1實施形態之 動作原理的說明圖。 如圖1(a)所示’潔淨系·統1具備有:潔淨滾筒u,以 及,以相對於該潔淨滾筒u之方式邊接觸於潔淨滚筒n 之表面邊旋轉之轉印滾筒21。 潔淨滚筒11,係邊接觸於被潔淨材s之表面邊旋轉以 使相對移動’其可利用靜電力以去除附著在被潔淨材s之 表面上之塵埃等異物。該潔淨材11,在外周面能帶有用以 藉靜電力來吸附在被潔淨材S表面上所附著異物的電荷, 係利用該潔淨滚筒之滾筒表面(外周面)的帶電性來吸附異 物。 轉印滾筒21 ’係以邊接觸於潔淨滾筒11之表面邊旋轉 15 201210709 :方式’而在與潔淨滚筒n之間, 淨滾筒u之表面特性差異(例如帶電而=21與潔 藉由潔淨滚筒u與轉印 生電位差。 在轉印、袞2 1 5 疋轉造成的接觸剝離, 在轉印滚湾2卜依照與潔淨滾筒u 電序列)的差里,二* · 衣®将『生(例如帶 … 產生相對應的電位差,而帶有可藉靜電 力來吸附在被潔淨材S表面上所附著異物之電荷。藉靜電 如上述’係在潔淨滾筒11之與被潔淨材S位居反向之 側’以接觸於潔淨滾筒11的方式而設有轉印滾筒21,藉此, 將因為靜電力而附著在潔淨滾筒11的異物,轉印(移動) 轉P滾筒21之側。藉此,係在附著在潔淨滾筒"之外 周商之異物被轉印至轉印滚筒21的狀態下,使潔淨滚筒11 與被潔淨材S接觸。因此’潔淨滾筒ut外周面上的異物, 系不V的被轉印至轉印滾筒2 i之側,潔淨滾筒"始終能 發揮潔淨效果,因此’潔淨滾筒丨丨能夠較長期的持續進行 異物之吸附動作。其結果,已無需對潔淨滾筒11之外周面 的異物實施定期去除,或定期交換潔淨滾筒11等維護作 業’有利於提昇維護性。 以所不股地由固定電阻器12b構成(以下祁l〇J ; 潔淨滾筒11,係在表面上能帶有用以藉靜電力 轉印滾筒21之金屬芯,係藉由外部電源3丨而施加一 疋的電壓。在潔淨滾筒11中,係透過第1穩壓電路12而 接地’在滾尚的表面穩定的帶電,以供藉靜電力來吸附在 被潔淨材S表面上所附著的異物。第1穩壓電路12,係由 可變電阻器12a所構成(參照圖1 (a))。第1穩壓電路12 ’當 然可如圖1 (b)所示般地由固定電阻器12b構成(以下相同)。 上述之13 201210709, the two sides of the 卩 只 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮 衮The removal of the cleaned toner on the surface of the cleaned material by the charged foreign matter attached to the surface of the cleaned material is effectively removed. The guide roller improves the electric field strength of the foreign matter adsorbed by the electrostatic force, and is adsorbed to the clean roller by the electric field on the cleaned material. According to the present invention, the adsorption force to the foreign matter adsorbed on the surface of the clean roller can be changed as described above. The foreign matter can be stably transferred to the side of the transfer roller. Therefore, it is not necessary to regularly remove (clean) the foreign matter attached to the surface of the roller of the cleaning roller, as in the conventional cleaning system using the adhesive force of the adhesive roller. Or a maintenance system such as a clean drum to which the foreign matter is attached is regularly exchanged, that is, a clean system with good maintainability can be obtained. In particular, the invention of the scope of the patent application of the present invention changes the set voltage value of the voltage stabilizing circuit connected to the clean drum, by which the adsorption force for the foreign matter adsorbed to the clean drum can be weakened for the clean drum' The foreign matter adsorbed to the clean roller can be absorbed by the transfer roller. Further, by changing the set voltage value of the voltage stabilizing circuit connected to the clean roller, it is possible to suppress the band voltage generated on the surface of the drum from being adsorbed by the electrostatic force to be higher than necessary, and to stabilize the voltage. In addition, it is possible to prevent electronic components such as semiconductors that are not resistant to static electricity from being damaged by static electricity. f The invention of the patent scope 帛8 can change the voltage of the clean roller for adsorbing the foreign matter by electrostatic force, and therefore, without changing the applied voltage of the external power source connected to the 201210709 transfer roller That is, the cleaning roller can weaken its adsorption force for foreign matter adsorbed to the cleaning drum. As a result, the foreign matter adsorbed by the cleaning roller is adsorbed to the transfer cylinder. Therefore, the above maintenance work tends to be easy. In this case, by changing the set voltage value of the voltage stabilizing circuit connected to the clean roller, it is possible to suppress the band voltage generated on the surface of the drum from being adsorbed by the electrostatic force to be higher than necessary, and to stabilize the voltage. In addition, it is possible to prevent electronic components such as semiconductors that are not resistant to static electricity from being damaged by static electricity. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. (First Embodiment) Figs. i(a) and (b) are views showing the principle of operation of the first embodiment of the cleaning system of the present invention. Figure. As shown in Fig. 1 (a), the "cleaning system 1" includes a cleaning roller u and a transfer roller 21 that rotates while contacting the surface of the cleaning roller n with respect to the cleaning roller u. The cleaning roller 11 is rotated while being in contact with the surface of the object to be cleaned s to move relative to each other. It is possible to remove foreign matter such as dust adhering to the surface of the object to be cleaned by electrostatic force. The clean material 11 is provided with an electric charge on the outer peripheral surface for adsorbing foreign matter adhering to the surface of the cleaned material S by electrostatic force, and the foreign matter is adsorbed by the charging property of the drum surface (outer peripheral surface) of the clean drum. The transfer roller 21' is rotated by the side of the surface of the cleaning roller 11 to rotate 15 201210709 : between the way and the cleaning roller n, the difference in surface characteristics of the cleaning roller u (for example, charging = 21 and cleaning by the cleaning roller) u is different from the transfer potential. In the difference between the transfer and the peeling caused by 衮2 1 5 疋, in the difference between the transfer roller and the cleaning roller, the second * 衣® will be raw ( For example, the belt generates a corresponding potential difference, and has a charge that can be adsorbed on the surface of the material to be cleaned by electrostatic force. The electrostatic charge is as described above in the clean drum 11 and the cleaned material S. The transfer roller 21 is provided on the side to be in contact with the cleaning drum 11, whereby the foreign matter adhering to the cleaning drum 11 due to the electrostatic force is transferred (moved) to the side of the P roller 21. In the state in which the foreign matter attached to the cleaning roller is transferred to the transfer roller 21, the cleaning roller 11 is brought into contact with the cleaned material S. Therefore, the foreign matter on the outer peripheral surface of the cleaning roller ut is not V is transferred to the side of the transfer roller 2 i, clean The cylinder " always exerts a cleansing effect, so that the 'cleaning roller 丨丨 can continuously perform the adsorption operation of the foreign matter for a long period of time. As a result, it is no longer necessary to periodically remove the foreign matter on the outer surface of the cleaning drum 11 or periodically exchange the cleaning drum 11 The maintenance work 'is advantageous for improving the maintenance. It is composed of the fixed resistor 12b (hereinafter, the cleaning roller 11 is provided with a metal core for transferring the roller 21 by the electrostatic force). The voltage is applied by the external power source 3丨. The clean drum 11 is grounded through the first voltage stabilizing circuit 12 and is electrically connected to the surface of the rolling surface for adsorption by electrostatic force. The first voltage regulator circuit 12 is composed of a variable resistor 12a (see FIG. 1(a)). The first voltage regulator circuit 12' can of course be as shown in FIG. 1(b). It is generally constituted by a fixed resistor 12b (the same applies hereinafter).

S 16 201210709 來吸附在被潔淨材s表面上所附著異物的電荷,因此,被 潔淨材S表面上的異物,被吸附至潔淨滾筒U的表面。又, 轉印滾清21,係在滾筒表面能帶有用以藉靜電力來吸附在 潔淨滾筒11表面上所附著異物之電荷,因此,被吸附至潔 /爭滾筒11表面之異物,被吸附至轉印滚筒21的表面,而 從潔淨滾筒11移動至轉印滾筒2 1 ^因此,已無需對於潔淨 滚筒11施以定期去除(清掃)或定期交換等維護作業,可獲 得維護性佳之潔淨系統。 又,由於具備有連接於潔淨滾筒11之第1穩壓電路 12,而可變更第1穩壓電路12(可變電阻器i2a)的電阻值, 變更潔淨滾筒11之用以藉靜電力來吸附該異物的帶電壓, 因此,對於潔淨滾筒i丨,可以改變對於吸附至潔淨滾筒11 之異物的吸附力。因此’即使有外部電源3丨對於轉印滾筒 21施加電壓,亦可在不變更該施加電壓的情況下,對於潔 淨滾筒11,改變對於吸附至潔淨滾筒n之異物之吸附力。 例如,若是將連接於潔淨滾筒n之可變電阻器i2a的電阻 值儘可能降低’則可減少用來以靜電力吸附在潔淨滾筒η 表面上所附著異物之電荷,而可使潔淨滾筒i t失去其對於 吸附至潔淨滾筒1 1之異物的吸附力。其結果被吸附至潔 淨滾筒η之異物,被吸附至轉印滾_ 21n _ 護作業料容胃。 因此,無需如同利用黏著滾筒之黏著力之習知的潔淨 系統般’需實施對附著於潔淨滾筒之滾筒表面的異物予以 定期去除(清掃)、或是將附著有該異物之潔淨滾筒實施定期 17 201210709 交換等維護作業,即能獲得維護性良好的潔淨系統。又, 由於無需對於連接至轉印滾筒21之外部電源31'的施加電 壓進行頻繁控制,而能將外部電源31設計的更簡潔。 接著’說明潔淨滾筒1 1及轉印滾筒2 i。 潔淨滾筒11具備有:作為導電性軸構件之金屬芯iia; 設置在該金屬芯1 la之外周部具有導電性的内層部1 lb ;及 設在該内層部1 lb之外側、且由電阻較内層部1 b為高之 材料所構成的薄圓筒狀的外層部llc,而形成為二層構:。 用以形成該潔淨滾筒U之外層部Uc之材才斗,曰係選擇 可帶有電荷用以藉靜電力來吸附在被潔淨# s表面 著之塵埃等異物者。 潔淨滾筒1 1之外層部i lc的厚度, ,,,Λ ^ 子汉以2〜5〇〇" m為較 佳(更佳則為5〜50 "m)。其原因在於,當 層邵1le之厚度 未滿2 // m時,在滾筒表面(外層部表面)不易帶有電衣 超過500…厚度時則不具工業效率。再者,亦可二: 屬芯而使用由具備導電性之碳材或合成樹脂複合 所構成之芯棒。金屬芯(芯棒)lla,在 屈4〇 屬心之中腹部與今 屬芯端部間之電阻值以ι〇5Ω以下為佳。 |興金 在内層部lib中,使用具有導電性之彈 含碳(導電材)之聚酷系氨醋等),較外層部uc (例如 或大致同一硬度。又,内’石度為低 更沒X 0層部llb只要較外層部 為低,則並無特別限定,但體積電阻率以! 電阻 範圍為佳。 Ώ cm的 在外層部11c所使用的材料 具有5〇。以上的JIS_A之 201210709 硬度(較佳是50。以上未滿100。’更佳是55。以上未滿1〇〇〇, 若是6 5 °以上未滿1 0 0。者則又更佳)。又,外層部丨丨c的體 積電阻率較内層部11 b為高。外層部11 c具有1 〇8 Ω cm以 上的體積電阻率,更佳為101()Ω cm以上的體積電阻率。 用以形成潔淨滚筒11之外層部11 c之材料,較佳為氨 酯樹脂、以及丙烯酸混合氨酯或氟混合氨酯。此處之「丙 稀酸混合氣」’係指由聚s旨聚氨S旨或聚喊聚氨醋為主成 分’(i)熱塑性氨酯樹脂與矽/丙烯酸共聚合樹脂的混合物, (ii)由丙烯酸樹脂(例如’將氨乙基接枝於由曱基丙稀酸-甲 基丙烯酸甲酯共聚物所構成之主鏈而成之接枝化合物)與熱 塑性氨酯樹脂構成的混合物’或(iii)由丙稀酸樹脂、氨酯樹 月曰、及乱系表面塗佈劑構成的混合物;「氣混合氨g旨」, 係指以聚氨酯作為主成分’將氨酯•氟共聚物混合至熱塑 性氨酯樹脂者。 轉印滚筒21,與潔淨滚筒丨丨相同,具備:具有導電性 之金屬芯2 1 a、設在該金屬芯21 a之外側之圓筒狀的内層部 2 1 b、及設在該内層部21 b之外側之外層部2 1 c(彈性層部), 外層部21c可為體積電阻率較内層部21b為高者。然而,轉 印滾筒21,亦可為直接在金屬芯2U具有圓筒狀之外層部 (彈性層部)的構造。又,轉印滾筒2丨之外層部2丨c所選用 者,係較金屬芯21a之體積電阻率為高、且帶有電荷用以將 潔淨滚筒1 1之外周面所附著異物藉靜電力吸附至外周面。 轉印滾筒2 1 ’係與潔淨滾筒丨丨併轉,藉由接觸剝離而 帶電,而在轉印滾筒21之外周面與潔淨滾筒n之外周面 19 201210709 ^間產生電位差’該電位差之強度,足以藉由靜電力將附 著在潔淨滾筒11之外周面之異物轉印(移動)至轉印滾筒2ι 的外周面。亦即,轉印滾筒21,係因為滾筒之表面特性(例 如帶電序列)的差異,具有相對於滚冑U,與潔淨滾筒u 之所帶電荷(正電荷或負電荷)為同一荷號,且帶電麼之絕對 值較滾筒11為大之可供吸附異物的電位差。因此,用以形 成轉印滾筒21之外層部21e之素材,較佳係選用與潔淨滾 筒η為同-極性、且在不會損及敎之吸附性之範圍内儘 可能有最大電位差產生者。 因為潔淨滾筒11與轉印滾筒21之接觸剝離所產生之 電位差而被轉印至轉印滾筒21側之異物,會因為轉印滾筒 21的停止旋轉使轉印滾筒21本身失去靜電力帶來的吸附 力,而可較容易從轉印滾筒21去除。 除以上所述’亦可如圖2所示般’設與轉印滾筒2 ^朝 併轉方向之逆向而旋轉的潔淨刷+ 41,並設置與該潔淨刷 子“朝併轉方向旋轉之金屬滾筒42。在此情形,外部電源 31係連接於金屬滾筒42。在此情形,亦可如圖3所示般, 使用具有複數個固定電阻器43a、且可藉由切換開關仙來 。、所使用之固疋電阻n 43a以變更電阻值之切換式電阻 器43 ’以取代可變電阻器作為第!穩壓電路μ。 ) 又’亦可如圖4所示般,在金屬滾筒42之上側的表面 附j,配置能以前端到除部來刮除在金屬滾筒42表面上所 厂'異物之潔’爭刮片44,並在該潔淨到片W附近之金屬滾 ~的上方’ g己置能以負壓來吸引異物之真空手段(未圖示S 16 201210709 adsorbs the electric charge attached to the foreign matter adhering to the surface of the cleaned material s. Therefore, the foreign matter on the surface of the cleaned material S is adsorbed to the surface of the clean roll U. Further, the transfer rinsing 21 is provided with a charge on the surface of the drum for adsorbing foreign matter adhering to the surface of the cleaning drum 11 by electrostatic force, and therefore, the foreign matter adsorbed to the surface of the cleaning drum 11 is adsorbed to The surface of the transfer roller 21 is moved from the cleaning drum 11 to the transfer roller 2 1 . Therefore, maintenance work such as periodic removal (cleaning) or periodic exchange is not required for the cleaning drum 11, and a clean system with good maintainability can be obtained. Further, since the first voltage stabilizing circuit 12 connected to the cleaning drum 11 is provided, the resistance value of the first voltage stabilizing circuit 12 (variable resistor i2a) can be changed, and the cleaning roller 11 can be changed to adsorb by electrostatic force. The voltage of the foreign matter is such that, for the clean roller, the adsorption force to the foreign matter adsorbed to the cleaning drum 11 can be changed. Therefore, even if an external power source 3 applies a voltage to the transfer roller 21, the adsorption force against the foreign matter adsorbed to the cleaning roller n can be changed with respect to the cleaning drum 11 without changing the applied voltage. For example, if the resistance value of the variable resistor i2a connected to the cleaning roller n is lowered as much as possible, the charge for adsorbing foreign matter adhering to the surface of the cleaning roller η by electrostatic force can be reduced, and the cleaning roller can be lost. Its adsorption force for foreign matter adsorbed to the cleaning drum 1 1. As a result, it is adsorbed to the foreign matter of the cleaning drum η, and is adsorbed to the transfer roller _ 21n _ the protective material to the stomach. Therefore, it is not necessary to perform regular removal (cleaning) of the foreign matter attached to the surface of the drum of the cleaning drum, or to perform the cleaning of the clean drum to which the foreign matter adheres, as in the conventional cleaning system using the adhesive force of the adhesive roller. 201210709 Maintenance work such as exchange, you can get a clean and good maintenance system. Further, since it is not necessary to frequently control the applied voltage of the external power source 31' connected to the transfer roller 21, the external power source 31 can be designed more compactly. Next, the cleaning roller 1 1 and the transfer roller 2 i will be described. The cleaning drum 11 is provided with a metal core iia as a conductive shaft member, an inner layer portion 11b provided on the outer peripheral portion of the metal core 1la, and an outer layer portion 11b provided on the outer side of the inner layer portion 11b, and having a resistance The inner layer portion 1b is a thin cylindrical outer layer portion llc composed of a high material, and is formed in a two-layer structure:. The material used to form the outer layer portion Uc of the clean roller U is selected to be charged with an electrostatic force to adsorb foreign matter such as dust on the surface of the cleaned surface. The thickness of the outer layer portion i lc of the cleaning roller 1 1 is preferably 2 to 5 〇〇 " m is preferred (more preferably 5 to 50 " m). The reason is that when the thickness of the layer 1e is less than 2 // m, it is not industrially efficient when the surface of the drum (the surface of the outer layer) is less likely to have an electric coat of more than 500... thickness. Further, it is also possible to use a core rod composed of a conductive carbon material or a synthetic resin composite. The metal core (core rod) lla preferably has a resistance value of ι 〇 5 Ω or less between the abdomen and the core end portion of the core. |In the inner layer lib, Xingjin uses a conductive carbon-containing carbon (electrically conductive material), which is more than the outer layer uc (for example, or approximately the same hardness. In addition, the inner 'stone' is lower. The X 0 layer portion 11b is not particularly limited as long as it is lower than the outer layer portion, but the volume resistivity is preferably in the range of the resistance. The material used for the outer layer portion 11c of Ώ cm has 5 〇. The above JIS_A 201210709 Hardness (preferably 50. The above is less than 100. 'More preferably 55. If the above is less than 1〇〇〇, if it is more than 6 5 ° and less than 100, it is better.) The volume resistivity of c is higher than that of the inner layer portion 11 b. The outer layer portion 11 c has a volume resistivity of 1 〇 8 Ω cm or more, more preferably a volume resistivity of 101 () Ω cm or more. The material of the outer layer portion 11c is preferably a urethane resin, and a mixed urethane acrylate or a fluoromixed urethane. Here, the "acrylic acid mixture" means a poly s Ammonia vinegar as the main component '(i) a mixture of thermoplastic urethane resin and hydrazine/acrylic copolymerized resin, (ii) from propylene a resin (for example, a mixture of a grafting compound in which an aminoethyl group is grafted to a main chain composed of a mercaptoacrylic acid-methyl methacrylate copolymer) and a thermoplastic urethane resin' or (iii) a mixture of an acrylic resin, a urethane tree, and a chaotic surface coating agent; "gas-mixed ammonia g" means that polyurethane is used as a main component to mix a urethane/fluoro copolymer to a thermoplastic ammonia. In the same manner as the cleaning roller, the transfer roller 21 includes a conductive metal core 2 1 a, a cylindrical inner layer portion 2 1 b provided on the outer side of the metal core 21 a, and a design. The outer layer portion 21c may have a volume resistivity higher than that of the inner layer portion 21b in the outer layer portion 2 1 c (elastic layer portion) on the outer side of the inner layer portion 21 b. However, the transfer roller 21 may be directly on the metal core. 2U has a structure of a cylindrical outer layer portion (elastic layer portion). Further, the user of the outer layer portion 2丨c of the transfer roller 2 is selected to have a higher volume resistivity than the metal core 21a and has a charge. The foreign matter attached to the outer peripheral surface of the cleaning drum 1 1 is adsorbed to the outer peripheral surface by an electrostatic force. The transfer roller 2 1 ' is rotated in parallel with the cleaning roller, and is charged by contact peeling, and a potential difference of the potential difference is generated between the outer peripheral surface of the transfer roller 21 and the outer peripheral surface 19 201210709 ^ of the cleaning roller n, It is sufficient to transfer (move) foreign matter adhering to the outer peripheral surface of the cleaning drum 11 to the outer peripheral surface of the transfer cylinder 2 by electrostatic force. That is, the transfer roller 21 is due to the surface characteristics of the drum (for example, a charging sequence). The difference is that the electric charge (positive charge or negative charge) with respect to the roll U is the same as the charge (positive charge or negative charge) of the clean roll u, and the absolute value of the charge is larger than that of the drum 11 to absorb the foreign matter. Therefore, in order to form the material of the outer layer portion 21e of the transfer cylinder 21, it is preferable to use the same polarity as the clean roller η and to generate the maximum potential difference as much as possible without impairing the adsorption property of the crucible. The foreign matter transferred to the transfer roller 21 side due to the potential difference generated by the contact between the cleaning roller 11 and the transfer roller 21 may cause the transfer roller 21 itself to lose electrostatic force due to the stop rotation of the transfer roller 21. The adsorption force is relatively easy to remove from the transfer roller 21. In addition to the above, as shown in FIG. 2, a cleaning brush + 41 that rotates in the opposite direction to the direction of the transfer roller 2^ is provided, and a metal roller that rotates in the direction of the rotation of the cleaning brush is provided. 42. In this case, the external power source 31 is connected to the metal drum 42. In this case, as shown in Fig. 3, a plurality of fixed resistors 43a may be used, and the switch may be used. The fixed resistor n 43a is a switching resistor 43' that changes the resistance value instead of the variable resistor as the first voltage regulator circuit μ.) Also, as shown in FIG. 4, on the upper side of the metal drum 42 The surface is attached with j, and the front end to the cutout can be used to scrape off the factory's 'cleanth of foreign matter' on the surface of the metal drum 42 and to scrape the sheet 44 above the metal roll to the vicinity of the sheet W. Vacuum means capable of attracting foreign matter with negative pressure (not shown

20 S 201210709 的吸入口 45。藉此,藉由潔淨刮片44夕二α 乃4之剛端刮除部而被刮 除的異物,由於係通過真空手段之吸 而被負壓所吸 引,而使該異物不再有弄髒金屬滾筒42周邊之虞。 亦可如圖5所示般,設異物收置箱 1相46,用以回收及累 積以設置在金屬滾筒42之表面上的嚟潘丨 上旳為夺到片44所刮除的 異物;亦可設有用來回收及累積因刷 冲』卞之紅轉而四散的異 物之異物收置箱。 ' 亦可如圖6所示般,夾被潔淨材s而在潔淨滾筒^之 反側設置引導滾筒5卜引導滚筒51,可用以提高該潔淨滾 靖之電場強度,以供該潔淨滚筒藉靜電力來吸附在該被潔 淨材表面上所附著之異物。 (方法) 在圖2所示之潔淨系統中,係使被具有絕緣性之構件 (未圖不)所保持之潔淨滾筒丨丨及轉印滾筒2丨彼此接觸並 以5m/mm的周速併轉,且將透過可變電阻器i2a之接地設 置於潔淨滾筒11的金屬芯Ua。又,係將外部電源31連接 ;金屬滚疴42,該金屬滾筒42係透過潔淨刷子41而設置 ^相對於轉印滾筒21。潔淨刷子41被設置成,相對轉印滾 筒21而旋轉於併轉方向的逆向;金屬滾筒42被設置成, 相對於潔淨刷子4丨而旋轉於併轉的方向。 在上述狀態下,使用表面電位計(Tree社製、型號 341β),來測定相對於可變電阻器12a之電阻值的變化之各 構件的表面電位。 21 201210709 (表1) 可變電阻值ηνίΩ、 0 20.3 50.3 97.9 143.6 0 20.3 50.3 97.9 143.6 外部電源電位 +1000 +1000 +1000 +1000 +1000 -1000 -1000 -1000 -1000 -1000 金屬滾筒電位ΛΑ +1000 +1000 +1000 +1000 +1000 •1000 -1000 -1000 -1000 -1000 潔淨刷子電位ΑΛ +768 +830 +864 +884 +903 -759 -824 -85? -88? -894 轉印滾筒電位(ΛΓ» +342 +520 +606 +688 +730 •312 -46? -544 -632 -662 潔淨滾筒電位(ΛΛ +8 +148 +263 +368 +446 -5 -194 -324 •487 -565 由上述測定結果可以了解’藉由可變電阻器12 a之電阻 值的調整’而可調整潔淨滾筒1丨之表面電位,而可改變對 於吸附於潔淨滾筒11之異物的吸附力。 (第2實施形態) 如圖7(a)所示,潔淨滾筒11在表面能帶有藉由靜電力 來吸附在被潔淨材表面上所附著異物之電荷,係透過具有 定電壓二極體13a之穩壓電路13而接地。另以相對於該潔 淨滾筒11的方式,設邊接觸於潔淨滾筒丨丨之表面邊旋轉 的轉印滾筒21 ’轉印滾筒21與外部電源3 1連接,在表面 能帶有藉由靜電力來吸附在潔淨滾筒表面上所附著異物之 電荷》 如上述’第1及第2穩壓電路13、14,係以具有可變 電阻器14a與稽納效果之定電壓二極體13a所構成,而可得 到穩定的帶電壓。再者,當然亦可如圖7(b)所示般,使用 固定電阻器14b來代替可變電阻器i4a。 第1穩壓電路13,亦可如圖7(c)(d)所示般,在構成中 具有設置成相對向(或背靠背)之一對定電壓二極體ih、 13a(稽納二極體)。若是如上述般將具有稽納效果之定電壓 22 201210709 二極體以面對面或背靠背方式串接,則可無關於極性而得 到穩定的帶電壓。 藉由在潔淨滾筒1 1與轉印滾筒21之間設置第2穩壓 電路14的方式’而在潔淨滾筒u與轉印滾筒2 1之間產生 電位差。該第2穩壓電路14雖具有可變電阻器i4a,當然 亦可為固定電阻器14 b。 特別是’藉由變更定電壓二極體13a(第1穩壓電路13) 之設定電壓值,對於潔淨滚筒丨丨,就可減弱對於吸附至潔 淨滾筒11之異物的吸附力。例如,若是使第1穩壓電路1 3 之》又疋電壓值成為正負相逆的極性,則能使得用來以靜電 力吸附潔淨滾筒11表面所附著異物之電荷發生反轉,而能 使潔淨滾筒11失去對於其所吸附之異物的吸附力。其結 果,被潔淨滾筒1 1所吸附之異物,被轉印滚筒2 i所吸附。 因而使上述之維護作業趨於容易。 因此,與第1實施形態相同,對於潔淨滾筒i i,無需 施以定期性去除(清掃)或定期性交換等維護作業。 在此第2實施形態之情形,與第i實施形態相同,亦 可如圖8(a)所示般,以相對轉印滾筒21的方式’設朝併轉 方向之逆向旋轉的潔淨刷子4卜並且以相對㈣淨刷子41 之方式,設朝併轉之方向旋轉的金屬滾筒42。 在此情形’其構成方式係在潔淨清钟Η 牡/系净/农肖11與轉印滾筒21 之間連接第2穩壓電路15(定電壓二極體叫;在轉印滚筒 與潔淨刷子41之間連接第3穩壓電路16(定電壓二極體 叫在潔淨刷子41與金屬滾筒42之間連接第4穩壓電路 23 201210709 1 7(可變電阻器i 7a),而在轉印滚筒2卜潔淨刷子4丨、及金 屬滾筒42之間產生電位差。再者,第4穩壓電路17,亦可 如圖8⑻所示般’使用固定電阻H 17b來代替可變電阻器 17a (以下相同)。 ° 若藉此方式,藉由潔淨刷子41從轉印滾筒21除去異 物,並藉靜電力而移送至金屬滾筒42。又,在藉由第4穩 壓電路17來變更金屬滾筒42之帶電壓而使金屬滾筒42失 去對其吸附之異物之吸附力_,能更有效率的從金屬滾筒 42去除異物。特別是,亦可配合於與金屬滾筒42連接之外 P電源31所產生之與轉印滾筒2 i間的電位差來變更,而 能有效的將異物搬送至金屬滾筒42。 =’第1〜第4穩壓電路13、15〜17,係由具有稽納效 果之疋電壓—極體13a、15a、16a與可變電阻器^所構成, 而能獲得穩定的電壓。 又’亦可如圖9所示般,在金屬滾筒42之上側的表面 附近,配置以前端刮除部來刮除在金屬滾筒42表面所附著 異物之潔淨刮44,並在該潔淨刮片44附近之金屬滾筒 的上方’配置能藉負壓來吸引異物之真空手段的吸入口 45 〇 右藉此方式,藉靜電力而被吸附至金屬滾筒42表面的 異物,被潔淨刮片44之前端刮除部所刮除。如上述,藉靜 電力而此被吸附至金屬滚筒42表面之異物,因為被潔淨刮片 44之别端刮除部所到除,故有效的從金屬滾筒42去除異 又由於係通過真空手段之吸入口 45而使該異物被負 24 a 201210709 壓所吸引,故該異物不再有污損金屬滾筒45周邊之虞。 如圖ίο所示,亦可設置異物收置箱46,用以回收及累 積由潔淨刮片44所刮除的異物,該潔淨刮片44係設置在 金屬滚筒42之表面上且位在側邊。 藉此方式,無需設置新的動力,即可將異物回收至異 物收置箱46。異物收置箱46,亦可設置在可喊及累積因 刷子41之旋轉而四散之異物的位置。 如圖11所示,亦可將引導滾筒51配置於夾被潔淨材s 之潔淨滾筒11的反側。該引導滾筒5丨,係用以提高潔淨滾 筒11之電場強度,以供藉由靜電力來吸附在被潔淨材s表 面上所附著異物。 藉此方式’ 2只滾筒U、5 i係夾被潔淨材s而呈對向, 被潔淨材S在潔淨滾筒〖丨及引導滚筒5丨接觸的位置係從 上下被支承’在穩定之受支承狀態下進行被潔淨材s表面 上之異物的去除。 又’潔淨滾筒11 ’藉由引導滾筒5 i提昇藉靜電力來吸 附在被潔淨材s表面上所附著異物的電場強度,係對應於 被賦予的電場’而使被潔淨材S上之帶電異物被吸附至潔 淨滾筒11’有效的去除之。 又’如圖12(a)所示般,使第1、第2、第3、及第4之 穩壓電路13B、15B、16B、17亦由可變電阻器13b、15b、 16b、17a所構成,而形成由此等可變電阻器13b、15b、16b、 17a所分壓的電路結構,亦可得到穩定之第1〜第4電壓。 在此情形’亦可如圖l2(b)所示般,使用固定電阻器13c、 25 201210709 15c 16c及17b’來作為第1、第2、第3、及第4穩麼電 路 13B、15B、16B、及 17。 在此情形,藉由以較相接觸之滾筒11、21、42或刷子 41間之接觸電阻為小的電阻值之可變電阻器nn 16b、及17a來分麼,可以獲得穩定之電壓,而無關於相接 觸之滾4 11 21、42或潔淨刷子41間之接觸電阻的誤差 或變化。 如圖1 3所不般,若是設可供切換外部電源31之施加 電壓的正負極性之極性切換電路61,則可簡單的進行該極 性的切換。在此情形’係將第1〜第3之穩壓電路nA、i5A、 16A由面對面串接的2個定電壓二極體…、⑴、—所構 成,而能無關於極性而獲得穩定的電壓。 接著在圖13所不之潔淨系統中,係使由具有絕緣性 之構件(未圖示)所保持之潔淨滾筒u及轉印滾筒21相互接 觸,以5m/min之周速使其併轉,將透過由定電壓二極體 13a(稽納一極體)所構成之第丨穩壓電路丨3(定電壓二極體 13a)之接地設置於潔淨滾筒n的金屬芯。又,係相對轉印 滾筒21而設置潔淨刷子41及金屬滾筒&並分別在潔淨 滾筒11與轉印滾筒21之金屬芯之間設第2穩壓電路"(定 電壓一極體15a) ’在轉印滾筒21與潔淨滚筒41之金屬芯 之間設第3穩壓電路16(定電壓二極體16a),在潔淨刷子41 與金屬/衰洵42之金屬芯之間設第4穩壓電路i7(可變電阻 器17a)。潔淨刷子41係被設置成,相對於轉印滾筒2丨而 朝著併轉之方向的逆向旋轉;金屬滾筒42係被設置成,相 26 a 201210709 對於潔淨料41㈣著併轉之方向旋轉。 341B),來態下’使用表面電位計(Trec社製,型號 )來测定穩壓電路丨3 印滚η 15 17導致之潔淨滚筒11、轉 心、潔淨刷子41、及金屬滾筒42的表面電位。 金屬滾筒 潔淨刷子雷衍 身淨滾筒Hrv) 的絕 -1000 992 -832 +85020 S 201210709 suction inlet 45. Thereby, the foreign matter scraped off by the scraping portion of the cleaning blade 44, the second end is a suction by the vacuum means, and the foreign matter is no longer contaminated by the suction. The circumference of the metal drum 42 is the same. As shown in FIG. 5, a foreign matter collecting box 1 phase 46 may be provided for collecting and accumulating the upper surface of the metal drum 42 to remove the foreign matter scraped off by the sheet 44; There may be a foreign matter collection box for recovering and accumulating foreign matter that has been scattered due to the red color of the brush. ' As shown in FIG. 6, the cleaning roller s is placed on the opposite side of the cleaning roller ^, and the guiding roller 5 is provided on the opposite side of the cleaning roller to improve the electric field strength of the cleaning roller for the electrostatic roller to absorb the electrostatic force. To adsorb foreign matter attached to the surface of the cleaned material. (Method) In the cleaning system shown in Fig. 2, the cleaning drum 丨丨 and the transfer roller 2 held by the insulating member (not shown) are brought into contact with each other and at a peripheral speed of 5 m/mm. It is turned and placed on the metal core Ua of the cleaning drum 11 through the ground of the variable resistor i2a. Further, the external power source 31 is connected to the metal roller 42, and the metal roller 42 is provided through the cleaning brush 41 with respect to the transfer roller 21. The cleaning brush 41 is disposed to rotate in the opposite direction to the direction of rotation with respect to the transfer roller 21; the metal roller 42 is disposed to rotate in the direction of rotation with respect to the cleaning brush. In the above state, the surface potential of each member with respect to the change in the resistance value of the variable resistor 12a was measured using a surface potentiometer (manufactured by Tree Corporation, model No. 341β). 21 201210709 (Table 1) Variable resistance value ηνίΩ, 0 20.3 50.3 97.9 143.6 0 20.3 50.3 97.9 143.6 External power supply potential +1000 +1000 +1000 +1000 +1000 -1000 -1000 -1000 -1000 -1000 Metal roller potential ΛΑ +1000 +1000 +1000 +1000 +1000 •1000 -1000 -1000 -1000 -1000 Clean brush potential ΑΛ +768 +830 +864 +884 +903 -759 -824 -85? -88? -894 Transfer roller potential (ΛΓ» +342 +520 +606 +688 +730 •312 -46? -544 -632 -662 Clean roller potential (ΛΛ +8 +148 +263 +368 +446 -5 -194 -324 •487 -565 by As a result of the above measurement, it can be understood that the surface potential of the clean roller 1 can be adjusted by adjusting the resistance value of the variable resistor 12a, and the adsorption force to the foreign matter adsorbed to the cleaning drum 11 can be changed. Morphology) As shown in Fig. 7(a), the cleaning roller 11 has a charge on the surface of the foreign matter adhered to the surface of the object to be cleaned by electrostatic force, and is transmitted through a voltage stabilizing circuit having a constant voltage diode 13a. 13 and grounded. Further, in a manner relative to the cleaning drum 11, the side is rotated in contact with the surface of the cleaning drum. The print cylinder 21' is connected to the external power source 31, and has a surface capable of adsorbing foreign matter adhering to the surface of the clean drum by electrostatic force. The first and second regulator circuits 13 are as described above. 14. The constant voltage diode 13a having the variable resistor 14a and the effect of the sense is used to obtain a stable voltage. Further, of course, as shown in FIG. 7(b), the fixed voltage can be used. The resistor 14b is used instead of the variable resistor i4a. The first voltage stabilizing circuit 13 may have a set voltage that is set to be opposite (or back to back) in the configuration as shown in Fig. 7 (c) and (d). Diode ih, 13a (Junner diode). If the constant voltage 22 201210709 diode with the effect of the above is connected in series or face back, the stable voltage can be obtained without polarity. A potential difference is generated between the cleaning roller u and the transfer roller 21 by means of providing the second voltage stabilizing circuit 14 between the cleaning roller 11 and the transfer roller 21. The second voltage regulator circuit 14 has The variable resistor i4a, of course, may also be a fixed resistor 14b. More set voltage value constant voltage diode 13a (first constant-voltage circuit 13), the drum to clean Shushu, can weaken the adsorption force for adsorbing the foreign matter to be clean of the drum 11. For example, if the voltage of the first voltage stabilizing circuit 13 is reversed, the charge applied to the surface of the cleaning drum 11 by the electrostatic force can be reversed, and the electric charge can be cleaned. The drum 11 loses the adsorption force for the foreign matter it adsorbs. As a result, the foreign matter adsorbed by the cleaning drum 1 1 is adsorbed by the transfer roller 2 i. Therefore, the above maintenance work tends to be easy. Therefore, as in the first embodiment, it is not necessary to perform maintenance work such as periodic removal (cleaning) or periodic exchange for the cleaning drum i i . In the case of the second embodiment, as in the case of the i-th embodiment, as shown in Fig. 8(a), a cleaning brush 4 that is reversely rotated in the direction of the rotation may be provided in the manner of the transfer roller 21. Further, a metal drum 42 that rotates in the direction of the turning direction is provided in the manner of the (four) net brush 41. In this case, the configuration is based on the connection of the second regulator circuit 15 between the clean bells/mud/system net/farm 11 and the transfer cylinder 21 (fixed voltage diodes; in the transfer cylinder and the clean brush) The third voltage stabilizing circuit 16 is connected between 41 (the constant voltage diode is connected between the clean brush 41 and the metal roller 42 by the fourth voltage stabilizing circuit 23 201210709 1 7 (variable resistor i 7a), and in the transfer A potential difference is generated between the cleaning brush 4 and the metal roller 42. Further, the fourth voltage stabilizing circuit 17 may use a fixed resistor H 17b instead of the variable resistor 17a as shown in Fig. 8 (8) (below In this manner, the foreign matter is removed from the transfer roller 21 by the cleaning brush 41, and is transferred to the metal roller 42 by the electrostatic force. Further, the metal roller 42 is changed by the fourth regulator circuit 17. With the voltage, the metal drum 42 loses the adsorption force of the foreign matter adsorbed thereto, and the foreign matter can be removed from the metal drum 42 more efficiently. In particular, it can also be combined with the P power source 31 generated in addition to the metal drum 42. The potential difference between the transfer roller 2 and the transfer roller 2 i is changed, and the foreign matter can be effectively moved. To the metal roller 42. = 'The first to fourth voltage stabilizing circuits 13, 15 to 17 are composed of the 疋 voltage-pole bodies 13a, 15a, 16a having the effect of the effect and the variable resistors, and can be obtained. a stable voltage. Further, as shown in FIG. 9, a cleaning blade 44 for scraping a foreign matter adhering to the surface of the metal drum 42 with a front end scraping portion is disposed in the vicinity of the upper surface of the metal drum 42. The upper side of the metal drum near the clean blade 44 is disposed with a suction port 45 capable of attracting foreign matter by a negative pressure. Right, the foreign matter adsorbed to the surface of the metal drum 42 by electrostatic force is cleaned. 44 is scraped off at the front end scraping portion. As described above, the foreign matter adsorbed to the surface of the metal drum 42 by the electrostatic force is effectively removed from the metal roller by the scraping portion of the other end of the cleaning blade 44. Since the foreign matter is attracted by the negative 24 a 201210709 pressure by the suction port 45 of the vacuum means, the foreign matter no longer stains the periphery of the metal roller 45. As shown in the figure, it can also be set. Foreign matter collection box 46 for recycling and accumulation The foreign matter scraped off by the cleaning blade 44 is disposed on the surface of the metal drum 42 and located on the side. In this way, the foreign matter can be recovered to the foreign matter collection box without providing new power. 46. The foreign matter collecting box 46 may be disposed at a position that can shout and accumulate foreign matter scattered by the rotation of the brush 41. As shown in Fig. 11, the guide roller 51 may be disposed in the cleaning drum sandwiching the cleaned material s. The guide roller 5丨 is used to increase the electric field strength of the cleaning drum 11 for adsorbing foreign matter adhering to the surface of the cleaned material s by electrostatic force. In this way, 'two rollers U, 5 i The clip is opposed to the cleaned material s, and the cleaned material S is supported from the upper and lower sides at the position where the clean roll 丨 and the guide roll 5 丨 are in contact with each other. The removal of foreign matter. Further, the 'cleaning roller 11' raises the electric field strength of the foreign matter adhered on the surface of the material to be cleaned by the electrostatic force by the guiding roller 5 i, and the charged foreign matter on the cleaned material S corresponding to the applied electric field ' It is effectively removed by the adsorption to the cleaning drum 11'. Further, as shown in FIG. 12(a), the first, second, third, and fourth voltage stabilizing circuits 13B, 15B, 16B, and 17 are also provided by the variable resistors 13b, 15b, 16b, and 17a. In the configuration, the circuit configuration in which the variable resistors 13b, 15b, 16b, and 17a are divided is formed, and the stable first to fourth voltages can be obtained. In this case, as shown in FIG. 12(b), the fixed resistors 13c, 25 201210709 15c 16c and 17b' are used as the first, second, third, and fourth stable circuits 13B, 15B, 16B, and 17. In this case, by dividing the contact resistance between the relatively contact rollers 11, 21, 42 or the brush 41 into small resistance values of the variable resistors nn 16b, and 17a, a stable voltage can be obtained, and There is no error or change in the contact resistance between the contact rolls 4 11 21, 42 or the clean brush 41. As shown in Fig. 13, if the polarity switching circuit 61 for switching the positive and negative polarity of the applied voltage of the external power source 31 is provided, the polarity switching can be easily performed. In this case, the first to third regulator circuits nA, i5A, and 16A are composed of two constant voltage diodes (1) and − which are connected in series to face each other, and a stable voltage can be obtained regardless of the polarity. . Next, in the cleaning system of Fig. 13, the cleaning roller u and the transfer roller 21 held by the insulating member (not shown) are brought into contact with each other, and are rotated at a peripheral speed of 5 m/min. The ground of the second voltage regulator circuit 丨3 (the constant voltage diode 13a) composed of the constant voltage diode 13a (the stator body) is placed on the metal core of the cleaning drum n. Further, a cleaning brush 41 and a metal roller are mounted on the transfer roller 21, and a second voltage stabilizing circuit is provided between the cleaning roller 11 and the metal core of the transfer roller 21 (constant voltage first electrode 15a). A third voltage stabilizing circuit 16 (constant voltage diode 16a) is provided between the transfer cylinder 21 and the metal core of the cleaning drum 41, and a fourth stable is provided between the clean brush 41 and the metal core of the metal/damper 42 Voltage circuit i7 (variable resistor 17a). The cleaning brush 41 is disposed to be reversely rotated in the direction of the rotation with respect to the transfer roller 2; the metal roller 42 is disposed such that the phase 26a 201210709 rotates in the direction in which the cleaning material 41 (4) is rotated. 341B), using the surface potentiometer (manufactured by Trec, model) to measure the surface potential of the cleaning roller 11, the center of rotation, the clean brush 41, and the metal roller 42 by the voltage regulator 丨3 . Metal Roller Clean Brush Ray Yan Body Cleaner Roller Hrv) -1000 992 -832 +850

-523 -52 +1000 +976 +848 +536 +51 根據該結果可以了解’可將潔淨滾筒"、轉印滾筒Η、 ::刷子41、及金屬滾筒42的電位在不破壞絕緣的情況下 :、Η意之值。因此’可以穩定對於吸附至潔淨滾筒" 面上之異物的吸附力,將異物穩定的轉印至轉印滾筒 21、潔淨刷子41、或金屬滾筒42之側。 本發明,除了上述内容,尚可進行下述之變更。 (1) ’亦可如圖14所示,將潔淨單元組(潔淨滾筒 U、轉印滾筒21、潔淨刷子41、及金屬滾筒42)與潔淨單 元組U2(潔淨滾筒11 ’、轉印滾筒2 1 '、潔淨刷子41 '、及金 屬滚筒42’)連續配置2組,在各單元組ui、U2中,對於潔 淨滾筒11、11,,係使與潔淨滚筒U、u,之外周面所帶電 之電荷成為符號相逆。藉此方式,對於附著在被潔淨材s 表面上之帶正電性的異物,可由帶負電之潔淨滚筒11 (潔淨 27 201210709 單元組υι)予以去除’對於帶負電性的異物,可由帶正 潔淨滾筒11,(潔淨單元組U2)予以去除,而使可去除異Z之 範圍變大。再者,圖14係將圖2所示之物連續配:2組= 呈現,但無庸贅言的,對於其他實施形態亦可同樣連續配 置2組’而擴大能去除異物的範圍。 (ii) ’本發明中的被潔淨材,以薄膜、薄片、印刷基板 (PCB、PCBA)等薄型物尤為適合,但並不侷限於此。 【圖式簡單說明】 圖1 (a)(b)分別係本發明之潔淨系統之第1實施形態之 動作原理的說明圖。 圖2係顯示上述第1實施形態之一例之說明圖。 圖3係顯示圖2所示實施形態之第1變形例之圖。 圖4係顯示圖2所示實施形態之第2變形例之圖。 圖5係顯示圖2所示實施形態之第3變形例之圖。 圖6係顯示圖2所示實施形態之第4變形例之圖。 圖7(a)(b)(c)(d)係本發明之潔淨系統之第2實施形態之 動作原理的說明圖。 圖8(a)(b)係顯示上述第2實施形態之一例之說明圖。 圖9係顯示圖8所示實施形態之第丨變形例之圖。 圖1 〇係顯示圖8所示實施形態之第2變形例之圖。 圖11係顯示圖8所示實施形態之第3變形例之圖。 圖12(a)(b)係顯示圖8所示實施形態之第4變形例之 28 a 201210709 圖13係顯示圖8所示實施形態之第5 圖2為相同之圖。 圖14係顯示將潔淨單元連續配置2 圖。 【主要元件符號說明】 變形例的圖,與 組之實施形態之-523 -52 +1000 +976 +848 +536 +51 According to the results, it can be understood that the potential of 'cleaning roller", transfer roller Η, ::brush 41, and metal roller 42 can be prevented without damaging the insulation. :, the value of willingness. Therefore, the adsorption force to the foreign matter adsorbed on the surface of the clean roller can be stabilized, and the foreign matter can be stably transferred to the side of the transfer roller 21, the clean brush 41, or the metal drum 42. In addition to the above, the present invention can be modified as described below. (1) 'As shown in FIG. 14, the cleaning unit group (cleaning roller U, transfer roller 21, cleaning brush 41, and metal roller 42) and the cleaning unit group U2 (cleaning roller 11', transfer roller 2) 1 ', the clean brush 41', and the metal drum 42') are continuously arranged in two groups, and in each of the unit groups ui, U2, for the cleaning drums 11, 11, the outer circumferences of the cleaning drums U, u are charged. The charge becomes opposite to the sign. In this way, the positively charged foreign matter adhering to the surface of the cleaned material s can be removed by the negatively charged cleaning roller 11 (cleaning 27 201210709 unit group υ ι). For the negatively charged foreign matter, the belt can be cleaned. The drum 11, (cleaning unit group U2) is removed, and the range in which the dissimilar Z can be removed becomes large. Further, Fig. 14 is a continuous arrangement of the objects shown in Fig. 2: two sets = representation, but it goes without saying that in the other embodiments, two sets can be continuously arranged in the same manner, and the range in which foreign matter can be removed can be expanded. (ii) The material to be cleaned in the present invention is particularly suitable for a thin material such as a film, a sheet, or a printed circuit board (PCB, PCBA), but is not limited thereto. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 (a) and (b) are explanatory views of the principle of operation of the first embodiment of the cleaning system of the present invention. Fig. 2 is an explanatory view showing an example of the first embodiment. Fig. 3 is a view showing a first modification of the embodiment shown in Fig. 2; Fig. 4 is a view showing a second modification of the embodiment shown in Fig. 2; Fig. 5 is a view showing a third modification of the embodiment shown in Fig. 2; Fig. 6 is a view showing a fourth modification of the embodiment shown in Fig. 2; Fig. 7 (a), (b), (c) and (d) are explanatory views showing the principle of operation of the second embodiment of the cleaning system of the present invention. Fig. 8 (a) and (b) are explanatory views showing an example of the second embodiment. Fig. 9 is a view showing a third modification of the embodiment shown in Fig. 8. Fig. 1 is a view showing a second modification of the embodiment shown in Fig. 8. Fig. 11 is a view showing a third modification of the embodiment shown in Fig. 8. Fig. 12 (a) and Fig. 12 (b) show a fourth modification of the embodiment shown in Fig. 8. 28 a 201210709 Fig. 13 is a view showing the fifth embodiment of the embodiment shown in Fig. 8. Fig. 14 is a view showing the continuous arrangement of the clean unit. [Description of main component symbols] A diagram of a modification, and an embodiment of the group

14 、 15 、 15A 、 15B14, 15, 15A, 15B

S 11 12、12A 12a 12b 13、13A、13B 13a、 15a、 16a 被潔淨材 潔淨滚筒 穩壓電路 可變電阻器 固定電阻器 第1穩壓電路 定電壓二極體 第2穩壓電路 14a、17a、13b、15b 14b 、 17b 、 13c 、 15cS 11 12, 12A 12a 12b 13, 13A, 13B 13a, 15a, 16a Clean material clean roller voltage regulator circuit Resistor fixed resistor 1st voltage regulator constant voltage diode 2nd voltage regulator circuit 14a, 17a , 13b, 15b 14b, 17b, 13c, 15c

16、16A、16B 17 21 31 41 42 43 44 16b 可變電 16c 固定電 第3穩壓電路 第4穩壓電路 轉印滾筒 外部電源 潔淨刷子 金屬滚筒 切換式電阻器 潔淨刮片 器 器16, 16A, 16B 17 21 31 41 42 43 44 16b Variable power 16c Fixed power 3rd voltage regulator circuit 4th voltage regulator Transfer roller External power supply Clean brush Metal roller Switching resistor Clean blade

29 201210709 45 吸入口 46 異物收置箱 51 引導滚筒 61 極性切換電路 3029 201210709 45 Suction port 46 Foreign matter storage box 51 Guide roller 61 Polarity switching circuit 30

Claims (1)

201210709 七、申請專利範圍: 1. 一種潔淨系統,其具備邊接觸於被潔淨材的表面邊旋 轉而相對移動之潔淨滾筒,藉由該潔淨滾筒,利用靜電力 以去除在該被潔淨材表面上所附著的塵埃等異物,其特徵 在於: 相對該潔淨滚筒設有邊接觸於該潔淨滾筒表面邊旋轉 之轉印滾筒; 該潔淨滾筒,在表面能帶有用以藉靜電力來吸附在該 被潔淨材表面上所附著異物之電荷; 該轉印滾筒,在表面能帶有用以藉靜電力來吸附在該 潔淨滾筒表面上所附著異物之電荷; 該潔淨滾筒係透過穩壓電路而接地,該轉印滾筒,係 直接或間接的與外部電源連接; 該穩壓電路,可變更該轉印滾筒之用以藉靜電力吸附 該異物之帶電壓。 2. 如申請專利範圍帛i項之潔淨系統,其中,該穩壓電 路,係使用固定電阻器、可變電阻器、或是具有複數個固 定電阻器而可切換所使用之固定電阻器以變更電阻值之切 換式電阻器。 〃 3々巾請專利範圍第丨項之潔淨系統,其巾,該轉印滾 筒,係邊接觸該潔淨滚筒之表面邊旋轉,藉此在其與該潔 淨滾筒之間,依照該轉印滾筒與該潔淨滾筒之表面帶電特 性的差異而產生電位差。 4·如申請專利範圍第i項之潔淨系統,其中,相對該轉 e 31 201210709 印滚筒設有朝併轉方向或逆向_之 潔淨刷子設有朝併轉方向$ 、彳子,並相對該 逆向旋轉之金屬滚 該外部電源與該金屬滚筒連接,以在 μ 潔淨刷子、及該金屬滾筒之間產生電位差 湾、該 5·如申請專利範圍第4項之潔淨系統,其 滚疴的表面附近,配置有 &山 、 μ金屬 * 别知刮除部刮除在該金屬宁衿 表面上所附著之異物之潔淨到片。 金屬滾畸 “。申請專利範圍第5項之潔淨系統 刮片附近,配置有能藉真空 在。亥為净 „ ^ 哩及引異物之真空手段的吸入 ,或配置有用來回收及累積由 異物收置胃。 ㈣料片所刮除之異物之 ,7.如申請專利範圍第】項之潔淨系統,其中, 被潔淨材之方式,在該潔 ” ^ ㈣[奋贫 H繁淨“之反側配置有引導滾筒, 該引導滚疴,係用以提高該潔事 系淨滾琦藉靜電力吸附在該被 潔淨材表面上所附著之異物之電場強度。 8.—種潔淨系統’其具備邊接觸於被潔淨材之表面邊旋 轉而相對移動之潔淨滾筒,#由該潔淨滾筒,利用靜電力 以去除在5亥被潔淨材表面上所附著的塵埃等異#,其特徵 在於: ' 相對該潔淨滾筒設有邊接觸於該潔淨滾筒表面邊旋轉 之轉印滾筒; s玄潔淨滾筒’在表面能帶有用以藉靜電力來吸附在該 被潔淨材表面上所附著異物之電荷; s亥轉印滚筒’在表面能帶有用以藉靜電力來吸附在該 32 S 201210709 潔淨滾筒表面上所附著異物之電荷; 外部電源之電壓直接或間接地施加在該轉印滾筒; 該潔淨滾筒,係透過用以將該潔淨滾筒之帶電壓控制 於設定電壓以下之第1穩壓電路而接地,另一方面,在該 潔淨滾筒與該轉印滾筒之間,設置有用以在其等之間產生 電位差的第2穩壓電路。 9·如申請專利範圍第8項之潔淨系統,其中,該轉印衷 筒,係邊接觸該潔淨滾筒之表面邊旋轉,藉此在其與該潔 淨滚筒之間,㈣該轉印滾筒與該潔淨滾筒之表面帶電特 性的差異而產生電位差。 10.如申請專利範圍第8項之潔淨系統,其中,相對該 轉印滾筒設有朝併轉方向或逆向旋轉之潔淨刷子; 人 並相對該潔淨刷子設有朝併魅古a +」 , ,朝併轉方向或逆向旋轉之金屬 對該金屬滾筒連接有該外部電源; 在該轉印滾筒與該潔淨刷子之間, 0又有用以在該棘 滾筒與該潔淨刷子之間產生電位差 〜乐j穩壓電路,在兮 潔淨刷子與該金屬滾筒之間, 隹該 ^ Π °又有用以在該潔淨刷子盥兮 金屬滚筒之間產生電位差之第4穩壓電路。 子/、該 比如申請專利範圍帛10項之潔淨系 1〜第4穩壓電路,分別 具中忒第 ’弟1第4電阻器; 藉該第1〜第4電阻器,從始丄 电I且益,將施加至相互接 該刷子間的電壓予以分壓。 接觸之该滾荀或 12.如申請專利範圍第u /繁夺系'统,其中,該第201210709 VII. Patent application scope: 1. A clean system, which has a clean roller that is relatively moved while being in contact with the surface of the cleaned material, and the electrostatic roller is used to remove the surface of the cleaned material by electrostatic force. a foreign matter such as dust attached thereto, characterized in that: the cleaning roller is provided with a transfer roller that is rotated while contacting the surface of the cleaning roller; the cleaning roller is provided on the surface for being electrostatically absorbed to be cleaned The charge of the foreign matter attached to the surface of the material; the transfer roller has a charge on the surface for adsorbing foreign matter attached to the surface of the clean roller by electrostatic force; the cleaning roller is grounded through the voltage stabilizing circuit, the turn The printing cylinder is directly or indirectly connected to an external power source; the voltage stabilizing circuit can change the voltage of the transfer roller for adsorbing the foreign matter by electrostatic force. 2. For a clean system of the patent scope 帛i, wherein the voltage regulator circuit is modified by using a fixed resistor, a variable resistor, or a fixed resistor having a plurality of fixed resistors Switching resistor with resistance value. 〃 3 々 请 请 洁净 之 之 之 之 之 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净 洁净A difference in charging characteristics of the surface of the cleaning roller causes a potential difference. 4. The cleaning system of claim i, wherein the printing cylinder is provided with a direction toward the turning direction or a reverse direction of the cleaning roller, and the cleaning brush is provided with a direction toward the turning direction, the dice, and opposite to the reverse direction. a rotating metal roller is connected to the metal power source to generate a potential difference between the μ clean brush and the metal roller, and the clean system of the fourth aspect of the patent application, near the surface of the roll, It is equipped with & mountain, μ metal*. The scraping part scrapes off the cleansing of the foreign matter attached to the surface of the metal lining. Metal Rolling Distortion. "Applicable to the clean system blade near the fifth paragraph of the patent application, it is equipped with a vacuum that can be vacuumed. It is a vacuum that is used to recover and accumulate foreign matter. Set the stomach. (4) The foreign matter scraped off by the material, 7. The clean system of the scope of the patent application, in which the method of being cleaned, is guided by the opposite side of the clean "^ (4) [Poverty-rich H complex" The roller, the guiding roller, is used to increase the electric field strength of the foreign matter attached to the surface of the cleaned material by the electrostatic force. 8. A cleaning system which has a clean roller that is relatively moved while being in contact with the surface of the material to be cleaned. #The cleaning roller uses electrostatic force to remove dust attached to the surface of the cleaned material at 5 ha. ##, which is characterized by: 'relative to the cleaning roller is provided with a transfer roller that is rotated while contacting the surface of the cleaning roller; s Xuan clean roller' is capable of being attached to the surface of the object to be cleaned by electrostatic force The charge of the foreign matter attached thereto; the shai transfer roller' has a charge on the surface for adsorbing foreign matter attached to the surface of the 32 S 201210709 clean roller by electrostatic force; the voltage of the external power source is directly or indirectly applied thereto a transfer roller; the cleaning roller is grounded by a first voltage stabilizing circuit for controlling a voltage of the cleaning roller to be equal to or lower than a set voltage; and is disposed between the cleaning roller and the transfer roller There is a second regulator circuit for generating a potential difference between them. 9. The cleaning system of claim 8, wherein the transfer cylinder is rotated while contacting the surface of the cleaning roller, whereby between the cleaning roller and the cleaning roller, A potential difference is generated by a difference in the charging characteristics of the surface of the cleaning roller. 10. The cleaning system of claim 8, wherein the transfer roller is provided with a cleaning brush that rotates in the opposite direction or in the opposite direction; and the person is provided with a glimpse and a charm relative to the cleaning brush, The metal is connected to the metal roller in a direction of rotation or reverse rotation; between the transfer roller and the cleaning brush, 0 is useful to generate a potential difference between the ratchet roller and the cleaning brush. The voltage stabilizing circuit is between the 兮 clean brush and the metal roller, and the fourth voltage stabilizing circuit for generating a potential difference between the clean brush and the metal roller. Sub/, for example, the clean system 1 to the 4th voltage regulator circuit of the patent application scope 帛10, respectively, the middle 4th resistor of the 1st brother; the 1st to the 4th resistor, the slave I And, the voltage applied to each other between the brushes is divided. Contact the roll or 12. If the patent application scope u / multiplication system, where the 33 201210709 卜第4電阻器’係被設定成較相互接觸之該 間之接觸電阻小之電阻值。 ~〜Μ子 13.如申請專利範圍第10項之潔淨系統 1〜第3穩屋電路,係具有定電壓二極體或變阻器者:遠第 該第4穩壓電路,係具有固定電阻器或可變電阻 如申請專利範圍帛13項之潔淨系統,盗者。 1〜第3穩壓電路之該定電麼二極體,係以”第 背對背方式串接。 ' 面對面或 .如申請專利範圍fl4項之潔淨系統,其 以該外部電源施加至該滾筒或該刷子之電、正' ^換 手段。 j止貞極性之 16. 如申請專利範圍第10項之潔淨系統,其 ==面附近,配置有,到除部刮除 : 琦表面上所附著之異物之潔淨到片。 /金屬滾 17. 如申請專利範圍第16項 淨刮片附近,配置有能藉真空麼二系 入口'或配置有用來回收及、 、二手段的吸 之異物收置箱。 及累積由潔淨到片所刮除之異物 18. 如申請專利範圍第8 被潔淨材之方心在該潔淨二之之=統’其中,以爽該 該_筒’係用以提高 二:=引導滾筒, 潔淨材表面上所附著之異物之電場二藉靜電力吸附在該被 3433 201210709 The fourth resistor ’ is set to have a smaller resistance value than the contact resistance between them. ~~Μ子13. As for the clean system 1~3rd stable circuit of claim 10, it is a fixed voltage diode or varistor: the fourth voltage regulator circuit has a fixed resistor or Variable resistors such as the patent system Scope 13 clean system, the thief. 1~ The third voltage regulator circuit of the constant voltage diode is connected in series by "back-to-back mode." Face-to-face or as in the clean system of the patent application scope fl4, which is applied to the drum or the external power source Brush electric, positive '^ change means. j stop 贞 polarity 16. As in the patent system scope 10 clean system, its == near the surface, configured, to the scraping part: the foreign matter attached to the surface It is clean to the sheet. /Metal Roller 17. As in the vicinity of the net scraper of the 16th article of the patent application, there is a foreign object storage box that can be used to collect the vacuum and the second type of inlet. And accumulating the foreign matter scraped from the clean to the sheet 18. If the scope of the patented item 8 is cleaned, the square of the cleansing material is in the cleansing of the two, in order to improve the two: Guide roller, the electric field of the foreign matter attached to the surface of the clean material is adsorbed by the electrostatic force in the 34
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TWI725170B (en) * 2016-03-09 2021-04-21 日商阪東化學股份有限公司 Cleaning device
TWI762481B (en) * 2016-03-09 2022-05-01 日商阪東化學股份有限公司 Cleaning device and cleaning method

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EP2583761A1 (en) 2013-04-24
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CN102933323B (en) 2014-07-02
EP2583761A4 (en) 2014-02-12
EP2583761B1 (en) 2015-04-08
JP5015365B2 (en) 2012-08-29
JPWO2011158504A1 (en) 2013-08-19
WO2011158504A1 (en) 2011-12-22
CN102933323A (en) 2013-02-13
KR20130029392A (en) 2013-03-22

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