TW201204773A - Application liquid for forming transparent coating and substrate with transparent coating - Google Patents

Application liquid for forming transparent coating and substrate with transparent coating Download PDF

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TW201204773A
TW201204773A TW100125401A TW100125401A TW201204773A TW 201204773 A TW201204773 A TW 201204773A TW 100125401 A TW100125401 A TW 100125401A TW 100125401 A TW100125401 A TW 100125401A TW 201204773 A TW201204773 A TW 201204773A
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Taiwan
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transparent film
substrate
conductive inorganic
inorganic oxide
film
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TW100125401A
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Chinese (zh)
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TWI573821B (en
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Ryo Muraguchi
Masayuki Matsuda
Toshiharu Hirai
Michio Komatsu
Yuhko Hakoshima
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Jgc Catalysts & Chemicals Ltd
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24Electrically-conducting paints
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • C08K9/06Ingredients treated with organic substances with silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/20Diluents or solvents
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/001Conductive additives

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Non-Insulated Conductors (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

This invention provides an application liquid for forming transparent coating capable of forming a substrate with a transparent coating having high conductivity even if the blending amount of conductive inorganic oxide particles is small, also having high transparency, suppressed coloration and interference stripe and excellent economic efficiency. The application liquid for forming transparent coating of this invention contains conductive inorganic oxide particles, a matrix formation component and a dispersion media, wherein the conductive inorganic oxide particles have been surface-processed with an organic silicon compound represented by the following formula (1), the dispersing media contains ketone, the concentration of total solid content is within the range of 1 to 60 mass%, the surface-processed conductive inorganic oxide particles are not agglutinated and are highly dispersed, and has solid content by a concentration within the range of 0.01 to 6 mass%, the concentration of solid content of the matrix formation component is within the range of 0.1 to 59.4 mass%, and the conductive inorganic oxide particles tend to form a chain structure in the obtained transparent coating. Rn-SiX4-n (l) (provided that R is independently a unsubstituted or substituted hydrocarbon group having a carbon number of 1 to 10, and may be the same or different from one another, X is alkoxy group having a carbon number of 1 to 4, hydroxyl group, halogen or hydrogen, n is an integer of 0 to 3.)

Description

201204773 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種透明被膜形成用塗佈液及附有透明 被膜之基材’其經表面處理之導電性無機氧化物微粒子在 透明被膜中形成鏈狀構造同時形成高分散,因此即使導電 性無機氧化物微粒子之調配量少時亦可具有高導電性,且 透明性高’又可抑制著色及干擾條紋(interference fringes)之發生,亦具有優良之經濟性。 【先前技術】 已往’為增加玻璃、塑膠片、塑膠透鏡等基材表面之 财擦傷性’已知可在基材表面形成具有硬化膜機能之透明 被膜’即在玻璃及塑膠等之表面形成構成如此透明被膜之 有機樹脂臈或無機膜。同時,在有機樹脂膜或無機膜中再 調配樹脂粒子或二氧化矽等無機粒子而進一步提高其耐擦 傷性。 此外,使用於顯示裝置等時,除了具有硬化膜性質之 外,為了防止雜物、塵埃等之靜電附著,而對透明被膜賦 予導電性使其可以抗靜電。 為使其具有此種導電性,已知可在其中調配導電性氧 化物粒子。 導電性氧化物粒子已知之例,可舉如:氧化錫、以Sb、 F或P摻雜之氧化錫、氧化銦、以%或f摻雜之氧化銦、 五氧化銻、低價氧化鈦等。(專利文獻丨:日本特開 2002-79616 號公報) 4 323138 201204773 本專利申請人等,在作為含導電性氧化物粒子的附有 被膜之基材方面分別有下述提案:包含具有焦綠石 (pyrochlore)構造之五氧化銻微粒子的附有透明抗靜電膜 之基材(專利文獻2 ··日本特開_卜72929 E公報)、包含 五氧化娣·子之时硬化狀基材(專歡獻3 ••日本特 開2004-50810號公報)、及包含鏈狀五氧化銻微粒子之附 有硬化膜之基材(專利文獻4 :日本特開·5_139()26號公 報)’又再提案_種包含導電性微粒子係由有齡化物的水 解物所連結之鏈狀導電性微粒子(AT〇及其他各種)的附有 透明導電性被膜之基材(專利文獻5:日本特開2〇〇6_ 339113號公報)。 [先前技術文獻] 專利文獻 2002-79616 號公報 2001-72929 號公報 2004- 50810 號公報 2005- 139026 號公報 2006- 339113 號公報 [專利文獻1 ]曰本特開 [專利文獻2 ]日本特開 [專利文獻3 ]日本特開 [專利文獻4]日本特開 [專利文獻5]曰本特開 【發明内容】 (發明欲解決之課題) 然而’在使用已往之導電性氧化物粒子之附有被膜之 基材中’在使用如五氧化銻微粒子時,雖具有優良之透明 性但其導電性低而使抗靜電性能不足。因此而再增加五氧 化銻微粒子的含有量時,會有產生干擾條紋,或降低其經 5 323138 201204773 濟性之問題。 另外在使用p捧雜氧化錫(ΡΤ0)時,雖可比在使用五 氧化銻微粒子時增加其抗靜電性能但會使其透明性不足; 而使用Sb摻雜氧化錫(AT〇)時,雖可再提高其抗靜電性能 但會有透明性減低,或因著色而使透光度降低之情形。在 使用Sn摻雜氧化銦(IT〇)時,又可再提高其抗靜電性能但 仍會有透明性、著色性上之問題。 在氧化錫、氧化銦方面,如上所述已知以摻雜劑摻雜 而可提高其導電性。然而,ρ摻雜氧化錫微粒子(ρτ〇)、% 摻雜氧化銦微粒子⑽)、Sb摻雜氧化錫微粒子⑽)等雖 可提高其導電性,但會有透明性降低或產生著色的問題, 且可能有因基材、基體成分之折射率使其產生干擾條紋的 情形’為抑制著色而減少其含有量時,又會有抗靜電性能 不足的情形。 句诙冋导冤性而如專利文獻4中所記載,係使 祕子連結成鏈狀以減少其粒子部分之電阻,即使減少粒 =之使用量亦難以維持充分之抗靜電性能而不易製成 無者色且無干擾條紋之透明被膜。 此外,已往在要求硬側性能、抗靜紐能之兩者時, 更化膜層上再另外形成抗靜電層,因此期待能有一次 堂佈即可形成具有硬化膜性能與抗靜 塗佈液及附㈣賴撕。⑽之透明被膜的 (用以解決課題之手段) 本發明人等,殷繁於上述問題點而專心致志進行檢討 323138 6 .201204773 '之^果而發現·使用酮類之分散溶劑、及作為基體形成成 分之如環氧乙烷改質丙烯酸系樹脂時,其中經表面處理之 導電性無機氧化物粒子,可在透明被膜中以高分散之鍵狀 粒子之形態存在,即使少量使用亦可具有高導電性且具有 高透明度,並可抑制著色及干擾條紋之發生,因此可製成 硬化膜性能優良之透明被膜,遂而完成本發明。 亦即本發明係包含: [1] -種透明被膜形成用塗佈液,其係包含導電性無機氧 化物微粒子及基體形成成分以及分散溶劑,其中之導 電性無機氧化物錄子係以下述式⑴所*之有機石夕 化口物進行表面處理而成者,且分散溶劑包含嗣類, 而該塗佈液之總固形分之濃度在1至60質量%之範 圍;其絲錢理之導紐減氧化物微粒子為未凝 集且形成面分散’其固形分之濃度在〇 〇1至6質量% 之範圍,其基體形成成分之固形分之濃度在0.1至 59. 4質里%之範圍;且在製成之透明被膜中的導電性 無機氧化物微粒子可形成鏈狀構造者。201204773 VI. [Technical Field] The present invention relates to a coating liquid for forming a transparent film and a substrate coated with a transparent film, wherein the surface-treated conductive inorganic oxide fine particles are formed in a transparent film. The chain structure simultaneously forms a high dispersion, so that even if the amount of the conductive inorganic oxide fine particles is small, the conductive property can be high, and the transparency is high, and the occurrence of coloring and interference fringes can be suppressed, and it is excellent. Economical. [Prior Art] In the past, in order to increase the surface scratch resistance of glass, plastic sheets, plastic lenses, etc., it is known that a transparent film having a function of a cured film can be formed on the surface of a substrate, that is, a composition is formed on the surface of glass and plastic. An organic resin crucible or an inorganic film of such a transparent film. At the same time, inorganic particles such as resin particles or ceria are further added to the organic resin film or the inorganic film to further improve the scratch resistance. Further, when used in a display device or the like, in addition to having a cured film property, in order to prevent electrostatic adhesion of impurities, dust, and the like, the transparent film is made conductive and can be made antistatic. In order to have such conductivity, it is known that conductive oxide particles can be formulated therein. Known examples of the conductive oxide particles include tin oxide, tin oxide doped with Sb, F or P, indium oxide, indium oxide doped with % or f, antimony pentoxide, low-valent titanium oxide, and the like. . (Patent Document No. JP-A-2002-79616) 4 323138 201204773 The applicant of the present application has the following proposals as a substrate with a film containing conductive oxide particles, including pyrochlore A substrate having a transparent antistatic film attached to the pentoxide particles of the (pyrochlore) structure (Patent Document 2, Japanese Patent Laid-Open No. 72929 E), and a hardened substrate containing ruthenium pentoxide. (3) Japanese Laid-Open Patent Publication No. 2004-50810, and a substrate having a cured film containing chain-like pentoxide particles (Patent Document 4: JP-A-5_139() No. 26) A substrate containing a transparent conductive film containing a chain-shaped conductive fine particle (AT〇 and various other types) in which a conductive fine particle is connected to a hydrolyzate of an aged product (Patent Document 5: Japanese Patent Laid-Open Publication No. 2) 6_ 339113 bulletin). [PRIOR ART DOCUMENT] Patent Document No. 2002-79616, No. 2001-72929, No. 2004-50810, No. 2005- 139026, No. 2006-339113 [Patent Document 1] 曰本特开 [Patent Document 2] [Patent Document 3] Japanese Patent Laid-Open [Patent Document 4] Japanese Patent Application Laid-Open Publication No. JP-A No. JP-A No.---------------------------------------------------------- In the case of the substrate, when fine particles such as ruthenium pentoxide are used, although the transparency is excellent, the conductivity is low and the antistatic property is insufficient. Therefore, when the content of the cerium oxide microparticles is further increased, there is a problem that interference fringes are generated or the circumstance of 5 323 138 201204773 is lowered. In addition, when using p-doped tin oxide (ΡΤ0), the antistatic property can be increased compared to the use of ruthenium pentoxide microparticles, but the transparency is insufficient. When Sb-doped tin oxide (AT〇) is used, Further, the antistatic property is improved, but the transparency is lowered, or the transmittance is lowered due to coloring. When Sn-doped indium oxide (IT〇) is used, the antistatic property can be further improved, but there is still a problem of transparency and coloring. In the case of tin oxide or indium oxide, as described above, it is known that doping with a dopant improves the conductivity. However, although p-doped tin oxide fine particles (ρτ〇), % doped indium oxide fine particles (10), and Sb-doped tin oxide fine particles (10)) can improve conductivity, there is a problem that transparency is lowered or coloration is caused. There may be cases where interference fringes are caused by the refractive index of the substrate or the matrix component. When the content is reduced to suppress coloring, the antistatic property may be insufficient. As described in Patent Document 4, the secrets are linked in a chain shape to reduce the electric resistance of the particle portion, and it is difficult to maintain sufficient antistatic properties even if the amount of the particles is reduced. A transparent film that is colorless and has no interference fringes. In addition, in the past, when both the hard side performance and the anti-static energy were required, an antistatic layer was additionally formed on the film layer. Therefore, it is expected that the film can be formed to have a cured film property and an antistatic coating liquid. And attached (four) Lai tear. (10) The transparent film (the means for solving the problem) The inventors of the present invention have been concentrating on the above problems and have been concentrating on reviewing 323138 6 .201204773 ', and found that using a ketone dispersion solvent and forming a matrix When the composition is such as an ethylene oxide-modified acrylic resin, the surface-treated conductive inorganic oxide particles may be present in the form of highly dispersed key particles in the transparent film, and may have high conductivity even in a small amount. Since it has high transparency and can suppress the occurrence of coloring and interference fringes, it can be made into a transparent film excellent in the performance of a cured film, and the present invention has been completed. In other words, the present invention includes: [1] a coating liquid for forming a transparent film comprising conductive inorganic oxide fine particles, a matrix forming component, and a dispersion solvent, wherein the conductive inorganic oxide recording system has the following formula (1) The organic stone sulphate of the * is surface-treated, and the dispersion solvent contains hydrazine, and the total solid content of the coating liquid is in the range of 1 to 60% by mass; The concentration of the solid content of the matrix forming component is in the range of 0.1 to 59.4% by mass; Further, the conductive inorganic oxide fine particles in the produced transparent film can form a chain structure.

Rn~SiX4-n (1) (式中,R表示碳原子數1至10之非取代或取代之烴 基,可互為相同亦可不同。X表示碳原子數1至4之 烷氧基、羥基、鹵素、氫;η表示〇至3之整數) [2] 如[1]之透明被膜形成用塗佈液,其中,前述導電性 無機氧化物微粒子為Sb摻雜氧化錫(ΑΤ〇)微粒子及/ 或Ρ摻雜氧化錫(ΡΤ0)微粒子,其平均粒徑在5至l〇nm 7 323138 201204773 [3] [4] [5] [6] [7] [8] 之範圍。 如[1]或[2]之透明被膜形成用塗佈液,其伞穴丁,刚地導 電性無機氧化物微粒子’為導電性無機氧化物微粒子 之-次粒子以3個以上連結成鏈狀之鏈狀導電性 機氧化物微粒子。 如[1]至[3]之透明被膜形成用塗佈液, 穴丁,别返基 體形成成分為環氧烧改質丙婦酸系樹脂(A) 如[4]之透明被膜形成用塗佈液,其φ ^ 丹甲,則述環氧ρ 改質丙烯酸系樹脂(A)為環氧乙烷改暂^ ^ ^ 况1^質丙烯酸系樹 脂。 如[1]至[5]之透明被膜形成用塗佈液, 丹肀,前述某 體形成成分包含環氧烧改質丙稀酸系樹、、, 時包含非改質丙烯酸系樹脂(B),且装北a ^ 並同 、并改質丙婦酸 系樹脂(B)與環氧烧改質丙烯酸系樹脂(a)之 之重量比((B) : (A))在5 : 95至5〇 : μ + #固开^刀 之$色圍。 如[1]至[6]之透明被膜形成用塗佈液,甘丄 印履,其中,前 散溶劑之酮類,為由丙酮、甲基乙酮、 _ 〒基異丁綱、 丁基甲酮、環己酮、甲基環己酮、二丙 m 丫I戊綱、 一異丁酿!、異佛爾嗣、乙酿丙酮 擇之1種以上者。 如[7]之透明被膜形成用塗佈液,其中 劑之酮類為丙酮及/或曱基乙酮。 一種附有透明被膜之基材,其係包含基材 材表面之透明被膜;其中之透明被骐,係包 乙醯乙酸酯之中選 月’J述分散溶 323138 8 [9] 201204773 無機氧化物微粒子及基體成分,而導電性無機氧化物 微粒子係以下述式(1)所示之有機矽化合物進行表面 處理而成,且該導電性無機氧化物微粒子在透明被膜 中構成鏈狀構造,且形成高分散;透明被膜中之該導 電性無機氧化物微粒子的含有量在1至12質量%之範 圍,而透明被膜之表面電阻率在1〇8至1〇llQ/sq.之 範圍,霧度(haze)為0. 3%以下,全光線透光度(light transmission)為90%以上,基材之折射率(Ns)與前述 透明被膜之折射率(N„)之差為〇.02以下者。Rn~SiX4-n (1) (wherein R represents an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, which may be the same or different from each other. X represents an alkoxy group having 1 to 4 carbon atoms and a hydroxyl group. [2] The coating liquid for forming a transparent film according to [1], wherein the conductive inorganic oxide fine particles are Sb-doped tin oxide (yttrium) fine particles and / or ytterbium doped tin oxide (ΡΤ0) microparticles, the average particle size of which is in the range of 5 to l 〇 nm 7 323138 201204773 [3] [4] [5] [6] [7] [8]. The coating liquid for forming a transparent film according to [1] or [2], wherein the particles of the conductive inorganic oxide fine particles are electrically conductive inorganic oxide fine particles, and the secondary particles are connected in a chain shape by three or more. Chain-shaped conductive machine oxide fine particles. The coating liquid for forming a transparent film according to [1] to [3], and the component for forming a matrix, which is an epoxy-modified glycerol-based resin (A), and a coating for forming a transparent film, such as [4] The liquid, the φ ^ Dan A, the epoxy ρ modified acrylic resin (A) is an ethylene oxide modified ^ ^ ^ condition 1 ^ acrylic resin. The coating liquid for forming a transparent film according to [1] to [5], wherein the body forming component contains an epoxy-modified acrylic acid tree, and the non-modified acrylic resin (B) is included. And the weight ratio of (b): (A) in the ratio of (b): (A) is changed to 5:95 to the same as the modified abalone acid resin (B) and the epoxy-modified acrylic resin (a) 5〇: μ + #固开^刀的色围. The coating liquid for forming a transparent film according to any one of [1] to [6], wherein the ketone of the pre-dispersion solvent is acetone, methyl ethyl ketone, hydrazine, butyl ketone, butyl ketone, Cyclohexanone, methylcyclohexanone, dipropyl m 丫 I pterene, an isobutyl brew! One, more than one of the different types of sulphur and acetone. The coating liquid for forming a transparent film according to [7], wherein the ketone of the agent is acetone and/or mercaptoacetone. A transparent film-attached substrate comprising a transparent film on the surface of the substrate; wherein the transparent beryllium is selected from the group consisting of acetamidine acetate, and the dispersion is 323138 8 [9] 201204773 inorganic oxidation The fine particles and the matrix component, and the conductive inorganic oxide fine particles are surface-treated with an organic cerium compound represented by the following formula (1), and the conductive inorganic oxide fine particles form a chain structure in the transparent film, and The high dispersion is formed; the content of the conductive inorganic oxide fine particles in the transparent film is in the range of 1 to 12% by mass, and the surface resistivity of the transparent film is in the range of 1〇8 to 1〇llQ/sq., haze (haze) is 0.3% or less, the total light transmittance is 90% or more, and the difference between the refractive index (Ns) of the substrate and the refractive index (N„) of the transparent film is 〇.02 or less. By.

Rn~SiX4-n (1) (式中,R表示碳原子數1至1〇之非取代或取代之烴 基,可互為相同亦可不同。χ表示碳原子數1至4之 烷氧基、羥基、鹵素、氫;η表示0至3之整數) [1〇]如[9]之附有透明被膜之基材,其中’前述導電性無 機氧化物微粒子為Sb摻雜氧化錫(ΑΤΟ)微粒子及/或 Ρ摻雜氧化錫(ΡΤ0)微粒子,其構成鏈狀構造之一次 粒子的平均粒徑在5至i〇nm之範圍,連結數為3以 上。 Π1]如[9]或[10]之附有透明被膜之基材,其中,前述基 體成分為環氧烷改質丙烯酸系樹脂(A)。 [12] 如[11]之附有透明被膜之基材,其中,前述環氧烷改 質丙烯酸系樹脂(A)為環氧乙烷改質丙烯酸系樹脂。 [13] 如[9]至[12]之附有透明被膜之基材,其中,前述義 體成分中又含非改質丙烯酸系樹脂,且其非改^ 323138 9 201204773 丙稀酸系樹脂⑻與環氧烧改質丙烯酸系樹脂(A)之 固形分之重量比(⑻:(A))在5 : 95至50 : 50之範 圍。 [14] 如[9]至[13]之附有透明被膜之基材,其中,前述透 明被膜之膜厚在1至20 之範圍。 [15] 如[9]至[14]之附有透明被膜之基材,其中,前述基 材為三乙醯纖維素。 [16] 如[9]至[15]之附有透明被膜之基材,其中,前述透 明被膜,係使用如[1]至[8]記載之透明被膜形成用塗 佈液所製成者。 (發明之效果) 依據本發明,可提供一種透明被膜形成用塗佈液及附 有透明被膜之基材,而該透明被膜形成用塗佈液係,即使 導電性無機氧化物微粒子之調配量少,亦具有高導電性 此、透明性優良,同時無著色與干擾條紋之發生且抗靜電 性成佳’且與基材間之密接性、耐擦傷性、刮痕硬度、錯 筆硬度等優良,並有優良之經濟性而可用於附有透明被膜 之基材的形成者。 雖然其理由並不明確’但推測此係由於使用特定之溶 劑及基體形成成分,使塗佈液中之單分散粒子在透明被膜 中構成鏈狀粒子,同時在使用鏈狀粒子時,鏈狀粒子並不 凝集而形成高分散狀態,因此提高其抗靜電性,且改善與 基材間之密接性、耐擦傷性、刮痕硬度、鉛筆硬度。 【實施方式】 323138 10 201204773Rn~SiX4-n (1) (wherein R represents an unsubstituted or substituted hydrocarbon group having 1 to 1 carbon atoms, and may be the same or different from each other. χ represents an alkoxy group having 1 to 4 carbon atoms, a hydroxyl group, a halogen, or a hydrogen; η represents an integer of 0 to 3) [1] A substrate having a transparent film as described in [9], wherein the aforementioned conductive inorganic oxide fine particles are Sb-doped tin oxide (yttrium) fine particles And/or cerium doped tin oxide (ΡΤ0) fine particles, wherein the primary particles constituting the chain structure have an average particle diameter in the range of 5 to i 〇 nm, and the number of bonds is 3 or more. The substrate of the transparent film according to [9] or [10], wherein the substrate component is an alkylene oxide-modified acrylic resin (A). [12] The substrate comprising a transparent film according to [11], wherein the alkylene oxide-modified acrylic resin (A) is an ethylene oxide-modified acrylic resin. [13] The substrate of the transparent film according to [9] to [12], wherein the above-mentioned prosthetic component further comprises a non-modified acrylic resin, and the non-modified 323138 9 201204773 acrylic resin (8) The weight ratio of the solid content of the epoxy-fired modified acrylic resin (A) ((8): (A)) is in the range of 5:95 to 50:50. [14] The substrate of the transparent film according to [9] to [13], wherein the film thickness of the transparent film is in the range of 1 to 20. [15] The substrate comprising a transparent film according to [9] to [14], wherein the substrate is triacetyl cellulose. [16] The substrate having a transparent film according to [9] to [15], wherein the transparent film is made of the coating liquid for forming a transparent film according to [1] to [8]. (Effect of the Invention) According to the present invention, a coating liquid for forming a transparent film and a substrate having a transparent film can be provided, and the coating liquid for forming a transparent film can be used in a small amount of conductive inorganic oxide fine particles. It also has high conductivity, excellent transparency, no coloring and interference fringes, and excellent antistatic property, and excellent adhesion to the substrate, scratch resistance, scratch hardness, and pen hardness. And it has excellent economy and can be used for the formation of a substrate with a transparent film. Although the reason is not clear, it is presumed that the monodisperse particles in the coating liquid form chain-like particles in the transparent film by using a specific solvent and a matrix-forming component, and the chain-like particles are used when the chain-like particles are used. Since it does not aggregate and forms a highly dispersed state, the antistatic property is improved, and the adhesion to the substrate, the scratch resistance, the scratch hardness, and the pencil hardness are improved. [Embodiment] 323138 10 201204773

Hr林發日种之透㈣卿成用塗佈液。 C透月破骐形成用塗佈液) 機氧:::::透明被膜形成用塗佈液,係包含導電性無 1物錄子絲_成齡錢分散溶劑。 電性無機氧化物微粒子) 電性之導電性無機氧化物微粒子’可使用具有導 經Sb'F^PiT之無機氧化物微粒子’以使用由氧化錫、 仆鈿翁 之氧化錫、氧化銦、經SnW摻雜之氧 化鋼、氧化銻所成群中 ’ 電性=機氧化物微衫,可製敍有贿導 微粒錫⑽)微粒子、p摻雜氧化錫⑽) 之使用量:可減少導電性無機氧化物微粒子 且有優,透明:制著色,因此,即使形成厚膜亦可得到 八有優良透明性之附有透明被膜之基材。 塗佈液t之導電性無機氧化物微粒子,可 子’亦可使用先經連結成鏈狀之鏈狀粒子(n ==:_,由於本“ 鍵狀2 分’因此透明被膜形成時,亦可連結成 導電性無機氧化物微粒子(一次粒子) 5至l〇nm,更好是5至8nm之範圍為佳。 =1徑以在 導窜性無機氧化物微粒子(一次粒子)之 - 時’會有結晶構造無法充分成長之情形, 子之傾向’因此會有改善導電性之效果不足之情 323138 11 201204773 又有凝集時其透明性會降低,霧度會提高之情形。導電性 無機氧化物微粒子卜次粒子)之平均粒徑過大時亦 透明被财鏈狀化之傾向變小,g卩使鏈狀㈣不易有效妒 成導電性雜使導電性的改善效果不足之㈣。 夕 結者 導電性無機氧化物微粒子(一次粒子)之平均粒徑,可 用穿透型電子顯微鏡照片⑽)測定,以議個粒子測定其 粒徑,再求出其平均值。 、 本發明中使用之導電性無機氧化物微粒子(一次粒子) 的折射率之測定m係制料標準折料測定液之 CARGILL製造之Series A、AA,並以下述方法測定。 (1) 將導電性無機氧化物微粒子分散液裝於蒸餾器,再蒸 發其分散溶劑。 (2) 再將此於8〇。(:下乾燥12小時,製成粉末。 (3) 之後將已知折射率之標準折射率測定液2、3滴滴在玻 璃板上,再於其中混合上述粉末。 (4) 上述(3)之操作再以各種標準折射率測定液操作,其令 之混合液呈透明時之標準折射率測定液之折射率即為導電 f生無機氧化物微粒子之折射率。 本發明中使用之鏈狀導電性無機氧化物微粒子中之導 電性無機氧化物微粒子卜:欠粒子)之連結數以3以上為 佳,5以上更佳,特別是1〇以上又更佳。 323138 12 201204773 導電性無機氧化物微粒子(一次粒子)之連钟 2法得到充分之導電性改善效果’因此,為得::二 電性而無域少導電性無魏化物微好 之導 抑制著色的效果不足之情形。 史用置,而有 =先進行鏈狀化之鏈狀導電性無機氧化物微 -人粒子),可以依照如專利文獻4中揭示之方法製造。(― 對於導電性無機氧化物微粒子(二次粒 ^ ㈣機氧化物微粒子(二次粒子)之穿透型電 (進行測定,對⑽個—次粒子敎其粒徑後^出^ 平均值;連結數健對—妹子連結成线狀粒子測定其 50個之連結數’再求其平均值作為連結數。 透明被膜形成用塗佈液中之導電性無機氧化物微粒子 之濃度,其固形分宜在0.01至6質量%,更好是在〇 02至 4.8質量%之範圍。 至 透明被膜形成用塗佈液中之導電性無機氧化物微粒子 之濃度低時,會使其導電性能*足,而有製成之附有透明 被膜之基材的抗靜電性能不足之情形。又,導電性無機氧 化物微粒子過多時’會使製成之透明被膜的著色更顯著, 透光度降低’而有因透明被膜之折射率提高使基材因折射 率而發生干擾條致之情形。 此類導電丨生無機氧化物微粒子,係經下述式(1)所示之 有機石夕化合物進行表面處理。Hr Linfa's daily seeding (four) Qingcheng coating solution. C. The coating liquid for forming a ruthenium-breaking ruthenium): Oxygen::::: A coating liquid for forming a transparent film, which comprises a conductive material-free recording material. Electrical inorganic oxide fine particles) Electrically conductive inorganic oxide fine particles ' can be used with inorganic oxide fine particles having a conductivity of Sb'F^PiT to use tin oxide, tin oxide, indium oxide, and In the group of SnW-doped oxidized steel and yttrium oxide, the electric quantity = machine oxide micro-shirt can be used to produce micro-tin (10) fine particles and p-doped tin oxide (10). The inorganic oxide fine particles are excellent in transparency and coloring. Therefore, even if a thick film is formed, a substrate having a transparent film having excellent transparency can be obtained. The conductive inorganic oxide fine particles of the coating liquid t can also be used as chain-like particles which are first linked in a chain (n ==:_, because the "key 2 points" are formed, so that the transparent film is formed. It can be connected to the conductive inorganic oxide fine particles (primary particles) 5 to 10 nm, more preferably 5 to 8 nm. =1 diameter in the case of the conductive inorganic oxide fine particles (primary particles) - There is a case where the crystal structure cannot be sufficiently grown, and the tendency of the child is 'therefore, the effect of improving the conductivity is insufficient. 323138 11 201204773 When there is agglomeration, the transparency is lowered and the haze is improved. Conductive inorganic oxide When the average particle diameter of the microparticles is too large, the tendency of transparency to be chained is reduced, and the chain (4) is not easily entangled into conductive impurities, so that the effect of improving conductivity is insufficient (4). The average particle diameter of the inorganic oxide fine particles (primary particles) can be measured by a transmission electron micrograph (10), and the particle diameter is measured by a single particle, and the average value thereof is determined. The conductivity used in the present invention is not The measurement of the refractive index of the organic oxide fine particles (primary particles) is based on the series A and AA manufactured by CARGILL of the standard standard conversion measuring liquid, and is measured by the following method: (1) The conductive inorganic oxide fine particle dispersion is loaded In the distiller, the solvent was evaporated again. (2) This was further dried at 8 Torr. (: dried for 12 hours to prepare a powder. (3) 2, 3 drops of a standard refractive index measuring solution of known refractive index Dropping on a glass plate, and mixing the above powder. (4) The operation of the above (3) is performed by using various standard refractive index measuring liquids, and the refractive index of the standard refractive index measuring liquid when the mixed liquid is transparent is The refractive index of the conductive inorganic oxide fine particles is preferably: the number of the conductive inorganic oxide fine particles in the chain-shaped conductive inorganic oxide fine particles used in the present invention is less than or equal to 3, and more preferably 5 or more. It is better, especially 1 〇 or more. 323138 12 201204773 Conductive inorganic oxide fine particles (primary particles) by the clock 2 method to obtain a sufficient conductivity improvement effect 'Therefore, it is: two electric and no domain Conductivity The case where the effect of suppressing the coloration is insufficient, and the method of using the method described in Patent Document 4 can be followed by the method of using the chain-like conductive inorganic oxide micro-human particles which are first chained. Manufactured. (― Conductive inorganic oxide microparticles (secondary particles ^ (4) machine oxide microparticles (secondary particles) of penetrating electricity (measured, for (10) particles - particle size after ^ ^ ^ average The value of the connection number is the number of the connection number of the linear particles, and the average number of the connection is determined as the number of the connection. The concentration of the conductive inorganic oxide fine particles in the coating liquid for forming a transparent film is solid. The content is preferably in the range of 0.01 to 6% by mass, more preferably in the range of 〇02 to 4.8% by mass. When the concentration of the conductive inorganic oxide fine particles in the coating liquid for forming a transparent film is low, the conductive property is sufficient, and the antistatic property of the substrate to which the transparent film is formed is insufficient. Further, when the amount of the conductive inorganic oxide fine particles is too large, the color of the transparent film to be formed becomes more conspicuous, and the transmittance is lowered, and the refractive index of the transparent film is increased to cause interference of the substrate due to the refractive index. . Such an electroconductive inorganic oxide fine particle is subjected to surface treatment by an organic cerium compound represented by the following formula (1).

Rn'SiX4-n (1) (式中,R表示唆原子數1至10之非取代或取代之烴基, 13 323138 201204773 可互為相同亦可不同。X表示碳原子數1至4之烷氧基、 經基、鹵素、氫;η表示0至3之整數) 如式(1)所示之有機矽化合物之例,可舉如:四曱氧矽 烷、四乙氧矽烷、四丙氧矽烷、四丁氧矽烷、甲基三甲氧 矽烷、二甲基二甲氧矽烷、苯基三甲氧矽烷、二苯基二曱 氧梦炫、曱基三乙氧石夕烧、二曱基二乙氧石夕烧、苯基二乙 氧矽烷、二苯基二乙氧矽烷、異丁基三曱氧矽烷、乙烯基 三曱氧矽烷、乙烯基三乙氧矽烷、乙烯基參(yS-曱氧乙氧 基)矽烷、3, 3, 3-三氟丙基三曱氧矽烷、曱基-3, 3, 3-三氟 丙基二甲氧矽烷、/3-(3, 4-環氧基環己基)乙基三曱氧矽 烷、T-環氧丙氧基曱基三曱氧矽烷、T-環氧丙氧基曱基 三乙氧矽烷、T-環氧丙氧基乙基三甲氧矽烷、r-環氧丙 氧基乙基三乙氧矽烷、7-環氧丙氧基丙基三曱氧矽烷、r -環氧丙氧基丙基三曱氧矽烷、7-環氧丙氧基丙基三乙氧矽 烷、r-環氧丙氧基丙基三乙氧矽烷、r-(y3-環氧丙氧基 乙氧基)丙基三甲氧矽烷、r-(曱基)丙烯醯氧曱基三曱氧 矽烷、7*-(曱基)丙烯醯氧曱基三乙氧矽烷、r-(曱基)丙 烯醯氧乙基三曱氧矽烷、γ -(曱基)丙烯醯氧乙基三乙氧矽 烷、(曱基)丙烯醯氧丙基三曱氧矽烷、r-(曱基)丙烯 醯氧丙基三甲氧矽烷、r-(甲基)丙烯醯氧丙基三乙氧矽 烷、r-(曱基)丙烯醯氧丙基三乙氧矽烷、丁基三甲氧矽 烷、異丁基三乙氧矽烷、己基三乙氧矽烷、辛基三乙氧矽 烷、癸基三乙氧矽烷、丁基三乙氧矽烷、異丁基三乙氧矽 烷、己基三乙氧矽烷、辛基三乙氧矽烷、癸基三乙氧矽烷、 14 323138 201204773 3-脲基異丙基丙基三乙氧矽烷、全氟辛乙基三甲氧矽烷、 全氟辛乙基三乙氧矽烷、全氟辛乙基三異丙氧矽烷、三氟 丙基三曱氧矽烷、N-/3-(胺乙基)-τ-胺丙甲基二曱氧矽 烷、Ν-卢-(胺乙基)-r -胺丙基三曱氧矽烷、Ν-苯基-r -胺丙基三曱氧矽烷、r-氫硫丙基三曱氧矽烷、三曱基矽 醇、曱基三氯矽烷等以及此等化合物之混合物。 其中,如經前述式(1)中之n=0之有機石夕化合物表面處 理時,在使用導電性無機氧化物微粒子(一次粒子)時,導 電性無機氧化物微粒子(一次粒子)會有在形成透明被膜之 同時鏈狀化且經鏈狀化之粒子形成高分散之傾向;在使用 預先進行鏈狀化之導電性無機氧化物微粒子(二次粒子) 時,會有在形成透明被膜之同時鏈狀化粒子形成高分散之 傾向。 導電性無機氧化物微粒子(一次粒子)之表面處理,例 如可在導電性無機氧化物微粒子(一次粒子)之酒精分散液 中加入預定量之前述有機矽化合物,再加入水,並依照其 須要加入作為有機矽化合物水解用催化劑之酸或鹼,再使 有機矽化合物進行水解。此時,有機矽化合物之使用量係 依導電性無機氧化物微粒子(一次粒子)之大小而異,惟一 般以如Rn-SiX4-n/2之導電性無機氧化物微粒子(一次粒子) 約在2至30質量%,更好是3至10質量%之範圍為佳。 如此,經有機矽化合物之表面處理時,會在透明被膜 形成用塗佈液中形成均勻之高分散同時提高其安定性,使 透明被膜中進行鏈狀化,而鏈狀化之粒子即形成高分散, 15 323138 201204773 =广量之導電性無機氧 高導電性,透明极嗦业Λ 丁97便用下即可製成 又,對於赫^&、硬度等優良之透明被膜。 表面處理,係在無機氧化物微粒子(二次粒子)之 中將前述式⑴所之//無機氧化物微粒子之製造步驟 無機氧化物微;=化合物水解後使用,使導電性 理。 #子(—次粒子)在連結之同時進行表面處 (基體形成成分) 。土多成成刀以使用環氧烧改質丙稀酸系樹脂⑷為Rn'SiX4-n (1) (wherein, R represents an unsubstituted or substituted hydrocarbon group having 1 to 10 fluorene atoms, and 13 323138 201204773 may be the same or different from each other. X represents an alkoxy group having 1 to 4 carbon atoms. Examples of the organic ruthenium compound represented by the formula (1) include tetraoxoxane, tetraethoxyoxane, tetrapropoxydecane, and the like, and η represents an integer of 0 to 3. Tetrabutane, methyltrimethoxydecane, dimethyldimethoxydecane, phenyltrimethoxydecane, diphenyldioxanoxan, decyltriethoxylate, dimercaptodiethoxylate Xishou, phenyl diethoxy decane, diphenyl diethoxy decane, isobutyl trioxoxane, vinyl trioxoxane, vinyl triethoxy decane, vinyl ginseng (yS-oxime oxyethoxy) Base) decane, 3, 3, 3-trifluoropropyltrioxane, decyl-3,3,3-trifluoropropyldimethoxydecane, /3-(3,4-epoxycyclohexyl Ethyl trioxoxane, T-glycidoxydecyl trioxoxane, T-glycidoxydecyltriethoxydecane, T-glycidoxyethyltrimethoxydecane, r -glycidoxyethyltriethoxydecane 7-glycidoxypropyltrioxoxane, r-glycidoxypropyltrioxoxadecane, 7-glycidoxypropyltriethoxydecane, r-glycidoxypropane Triethoxyoxane, r-(y3-glycidoxyethoxy)propyltrimethoxyoxane, r-(mercapto)propenyloxydecyltrioxane, 7*-(indenyl)propene醯 曱 三 三 乙 、 、 、 r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r r Trioxane, r-(indenyl) propylene oxypropyltrimethoxy decane, r-(methyl) propylene oxypropyl triethoxy decane, r-(indenyl) propylene oxypropyl triethoxy Decane, butyl trimethoxy decane, isobutyl triethoxy decane, hexyl triethoxy decane, octyl triethoxy decane, decyl triethoxy decane, butyl triethoxy decane, isobutyl triethoxy decane , hexyl triethoxy decane, octyl triethoxy decane, decyl triethoxy decane, 14 323138 201204773 3-ureido isopropyl propyl triethoxy decane, perfluorooctyl ethyl methoxy decane, perfluorooctyl ethyl tri Oxane, perfluoro Ethyltriisopropane, trifluoropropyltrioxane, N-/3-(aminoethyl)-t-aminopropanemethyldioxanane, anthracene-lu-(aminoethyl)-r -Aminopropyltrioxoxadecane, fluorenyl-phenyl-r-aminopropyltrioxoxadecane, r-hydrothiopropyltrioxoxadecane, tridecyl decyl alcohol, decyltrichlorodecane, etc., and the like a mixture of compounds. When the surface of the organic cerium compound of n=0 in the above formula (1) is surface-treated, when the conductive inorganic oxide fine particles (primary particles) are used, the conductive inorganic oxide fine particles (primary particles) may be present. When the transparent film is formed, the chain-formed particles tend to be highly dispersed, and when the conductive inorganic oxide fine particles (secondary particles) which are previously chain-formed are used, there is a possibility of forming a transparent film. The chained particles tend to be highly dispersed. For the surface treatment of the conductive inorganic oxide fine particles (primary particles), for example, a predetermined amount of the above organic cerium compound may be added to the alcohol dispersion of the conductive inorganic oxide fine particles (primary particles), water may be added, and it is added according to the necessity The organic hydrazine compound is hydrolyzed as an acid or a base of a catalyst for hydrolyzing an organic hydrazine compound. In this case, the amount of the organic cerium compound used varies depending on the size of the conductive inorganic oxide fine particles (primary particles), but generally, a conductive inorganic oxide fine particle (primary particle) such as Rn-SiX4-n/2 is used. A range of 2 to 30% by mass, more preferably 3 to 10% by mass, is preferred. When the surface treatment of the organic ruthenium compound is carried out, uniform and high dispersion is formed in the coating liquid for forming a transparent film, and the stability is improved, and the transparent film is chain-formed, and the chain-formed particles are formed high. Dispersion, 15 323138 201204773 = A wide range of conductive inorganic oxygen with high conductivity, transparent and extremely practical Λ 97 97 can be used to make a transparent film that is excellent for He ^ & hardness. The surface treatment is a step of producing the inorganic oxide fine particles of the above formula (1) in the inorganic oxide fine particles (secondary particles). The inorganic oxide is fine; the compound is hydrolyzed and used to impart conductivity. The #子(—sub-particle) is bonded to the surface (substrate forming component). The soil is formed into a knife to use an epoxy-fired modified acrylic resin (4).

質丙烯鲅系樹脂(A)之例,可舉如:環氣乙j 改質丙烯酸系榭衣氧乙J 付月曰、環氧丙烷改質丙烯酸系樹脂等。 ,使用此類環氧烧改質丙賴系樹脂(C 之刀政溶劑為_系八者 理之導電性散溶劑時、或者在使用經前述表㈤ ^ …機氧化物微粒子(一次粒子)時,在其製成: 導電:生可形成鏈狀構造同時形成高分散,因此即」 之透明被膜:物,粒子之使用量少亦能製成導電性優1 .、特別是環氧乙烷改質丙烯酸系樹脂之此地^ 點更為優良。I_ 一 , 、,基體形成成分,係指此類丙烯酸系;j 月曰在聚合反應前之物。 八本發明中以前逃環氧烧改質丙稀酸系樹脂(A)之外· :非改質丙_系樹脂⑻更佳。在如此再使用非改質丙 =樹月曰(B)時其製成之透明被膜可更提高強度、硬度 傷性。 323138 201204773 非改質丙烯酸系樹脂(B)之例,可舉如:新戊四醇三丙 婦酸s旨、新戊四酵四丙烯酸s旨、三經甲基丙炫三(甲基)丙 烯酸酯、二(三羥曱基)丙烷四(甲基)丙烯酸酯、二新戊四 醇六丙烯酸酯、甲基丙嫦酸甲酯、甲基丙稀酸乙酯、甲基 丙烯酸丁酯、甲基丙婦酸異丁酉旨、甲基丙婦酸一2-乙基己 酯、甲基丙烯酸異癸酯、丙烯酸正月桂g旨、丙烯酸正硬脂 酯、1,6-己二醇二甲基丙稀酸醋、甲基丙稀酸全氟辛基乙 酯、曱基丙烯酸三氟乙酯、聚胺酯丙烯酸酯等以及此等之 混合物。 在包含非改質丙烯酸系樹脂(B)時,非改質丙烯酸系樹 月曰(B)與ί哀氧烧改質丙稀酸系樹脂(a)之固形分之重量比 ((A) : (Β))以在 5 : 95 至 50 : 50 ’ 更好是在 5 : 95 至 4〇 : 60之範圍為佳。 非改質丙烯酸系樹脂(Β)少時,其使用非改質丙烯酸系 樹脂(Β)之效果,即增加製成之透明被膜的強度、硬度、耐 擦傷性之效果會不足,在其過多時,會減少其導電性無機 氧化物微粒子發生鏈狀化之傾向,且會有導電性無機氧化 物微粒子、或以少量導電性無機氧化物微粒子之使用量而 提高導電性之效果不足之情形。 透明被膜形成用塗佈液中之基體形成成分之濃度,以 其固形分在0. 1至59.4質量%,更好是〇 2至47. 8質量% 之範圍為佳。 透明被膜形成用塗佈液中之基體形成成分之濃度低 時,會減少其導電性無機氧化物微粒子發生鏈狀化之傾 323138 17 201204773 向,且會有導電性無機氧化物微粒子、或以少量導電性無 機氧化物微粒子之使用量而提高導電性之效果不足之情 形。再又由於基體形成成分少,會有製成之透明被膜之耐 擦傷性、與基材間之密接性不足之情形。 透明被膜形成用塗佈液中之基體形成成分過多時,由 於導電性無機氧化物微粒子之減少會使導電性不足,而會 有其製成之附有透明被膜之基材的抗靜電性不足之情形, 或會有耐擦傷性、與基材間之密接性不足之情形。 (分散溶劑) 本發明中使用之分散溶劑以使用酮類為佳。 其具體之例,可舉如:丙酮、甲基乙酮、甲基異丁酮、 丁基曱酮、環己酮、曱基環己酮、二丙酮、曱基戊酮、二 異丁酮、異佛爾酮、乙醯丙酮、乙醯乙酸酯等酮類及此等 之混合溶劑。 其中,特別以丙酮、曱基乙酮及此等之混合物為佳。 分散溶劑中亦可再含酮類以外之分散溶劑,酮類以外 之分散溶劑之例,可舉如:曱醇、乙醇、丙醇、2-丙醇(IPA)、 丁醇、二丙酮醇、咬α南曱醇、四氫吱喃曱醇、乙二醇、己 二醇、異丙二醇等醇類;乙酸曱酯、乙酸乙酯、乙酸丁酯 等酯類;二乙醚、乙二醇單曱醚、乙二醇單乙醚、乙二醇 單丁醚、乙二醇異丙醚、二乙二醇單曱醚、二乙二醇單乙 醚、丙二醇單曱醚、丙二醇單乙醚等醚類;甲苯、二甲苯 等及此等之混合物。 將此等之混合分散溶劑與前述烷氧基改質丙烯酸系樹 18 323138 201204773 脂(A)併用時,在使料電性無機氧化物微粒子(…欠粒子) 時’透明被膜形成時其導電十生無機氧化物微粒子(一欠粒子) 會有鏈狀化之傾向;且聽導電性無機氧化物微粒子並不 互相凝集而形成高分散,因而提高導電性,因此即使以少 量之導電性氧化物微粒子,亦可製成具有優良之導電性、 透明性、透光度、硬度’且抑料擾條紋發生之透明被膜。 分散溶劑中之酮類之比例以3〇質量%以上,更好是4〇 質量%以上為佳。酮類之比例少時,透明被膜形成時會有導 電性無機氧化物微粒子不會鏈狀化之情形;且會有鏈狀導 電性無機氧化物微粒子互相凝集之情形;以及無法製成其 透明被膜中之鏈狀化導電性無機氧化物微粒子形成高分散 之透明被膜之情形。在其基材為TAC時,在其塗佈液中含 酮類時,可能因TAC之表面會膨潤或溶解使其與透明被膜 成分互相滲入而使境界中之光學界面變為不清楚,因此雖 有抑制干擾條紋之情形;但在酮類之比例少時,會有無法 得到此種抑制干擾條紋之效果的情形。 此外’在使用上述分散溶劑時,在其基材使用TAC膜 時’特別可以製成抑制干擾條紋之透明被膜。 透明膜形成用塗佈液之濃度,以其總固形分在1至60 質量%,更好是2至40質量%之範圍為佳。 透明被膜形成用塗佈液之總固形分濃度過低時,其導 電性氧化物微粒子會變成無鏈狀化之傾向,因此會有無法 得到提高導電性效果的情形;或有不易以1次塗佈而製成 厚膜之透明導電性被膜之情形,因此,如反覆地進行塗佈、 19 323138 201204773 乾燥操作時,會有膜之強度降低、經濟性減少之問題。 在總固开>分濃度過高時,會有塗佈液之黏度增高、塗 佈性減低’使則述導電性氧化物微粒子鏈狀化之粒子及鏈 狀化之導電性氧化物微粒子有凝集之傾向,因此會有無法 得到充分之導電性的情形;或使製成之透明被膜的霧度提 高、或耐擦傷性不足之情形。 此類塗佈液可使用含浸塗佈法、喷塗塗佈法、旋轉塗 佈法、凹版塗佈法、輥塗法等一般已知之方法在前述基材 上塗佈,再經乾燥、加熱處理、紫外線照射等使其硬化, 製成透明被膜。藉由該加熱/紫外線照射等之操作可使基 體形成成分聚合、硬化。 其次,對本發明中之附有透明被膜之基材進行說明。 (附有透明被膜之基材) 本發明中之附有透明被膜之基材,包含基材及在基材 表面上形成之透明被膜。 (基材) 本發明中使用之基材,可使用一般已知之玻璃、聚碳 酸酉旨、丙稀酸樹脂、聚對苯二甲酸伸乙醋(PET)、三乙酿纖 維素(TAC)等塑膠片、塑膠膜等、塑膠板等。 其中,以使用TAC、聚碳酸酯、丙烯酸樹脂基材等較 佳。特別是TAC,由於在本發明之透明被膜形成用塗佈液 之分散溶劑中使用酮類,會使TAC基材膨潤或溶解,使TAC 與透明被膜成分互相滲入而使境界中之光學界面變的不清 楚’或因使其折射率具有梯度而可以抑制干擾條紋之發 20 323138 201204773 生,因此更佳。 本發明τ使用之基材之折射率⑽,以在149至 1.59更好疋1.49至1.56,特別是149至152之範圍 為佳。 基狀折射率(Ns)不在前述之範圍時,其透明被膜的 折射率之膽*易’與基材之折射率⑽之折射率差無法 調在0.2以下,會有無法抑制干㈣紋之情形。 (透明被膜) 透明被膜’包含導電性無機氧化物微粒子及基體成分。 (導電性無機氧化物微粒子) 透明被膜中,前述塗佈液中使用之經表面處理的導電 性無機氧化物微粒子係形成鏈狀構造同時形成高分散。 、其中’上述之鏈料電性無機氧化物難子,係指塗 佈液中之前述-次粒子在被膜形成步驟中已形成連結者、 已預先形成連結之粒子、以及預先形成連結之粒子之 其與一次粒子形成連結者。 入曰其中,「咼分散」係指雖依導電性無機氧化物微粒子之 含量而異’但前述導電性無冑氧化物微粒子之鏈狀化之粒 子’鏈狀化導紐無機氧化物微好相互連結、或雖凝集 但平均分佈而不偏向凝集,使树明被財形成可觀察到 鏈狀^造形成高分散之狀態之意。鏈狀粒子之間亦可再形 透明被膜中之導電性無機氧化物微粒子之連結數,_ 般連結數以3以上,争将县5以μ ^± , θ 更好疋b以上,特別是10以上為佳 323138 21 201204773 鏈狀導電性無機氧化物微粒子之連結數少時會有無 法充分得到導電性的改善效果之情形。其他亦有使用預先 製成鏈狀粒子的情形、連結數再增加的情形、或單分散粒 子與鏈狀粒子形成連結的情形。 y 本發明之透明被膜中之鏈狀化導電性氧化物微粒子形 成高分散之理由雖仍不清楚,但推測應為上述之與本發明 中使用之特定之分散溶劑、特定之樹脂及前述塗佈液I 度有關。 / 透明被膜中之導電性無機氧化物微粒子之含量,以固 形物在1至12質量%,更好是i至10質量%之範圍為佳。 透明被膜中之導電性無機氧化物微粒子過少時,即使 前述鏈狀化之導電性微粒子形成高分散,亦有導電性不足 之情形。導電性無機氧化物微粒子過多時,即使提高其導 電性,亦會有仍可觀察到源自AT〇、pT〇等無機氧化物^ 色,或全光線透光度不足,或折射率增加,並依基材的 同而發生干擾條紋之情形。 * (基體成分) 基體成分係相當於前述環氧烧改質丙稀酸系樹脂(A) 經硬化之賴。又’除了該環氧狀㈣樹脂⑷ 之外,亦可包含非改質丙烯酸系樹脂(B)。 在併用非改質丙稀酸系樹脂⑻及環氧院改質丙婦酸 系樹脂(A)時,亦如前述之基體形成成分,其重量比((B) · (A))以在0 : 95至50 : 50,更好是在5 : %至4〇 :⑼ 範圍為佳。 323138 22 201204773 透明被膜中之基體成分之含量,以其總固形分在88至 99質量%,更好是90至99質量%之範圍為佳。 透明被膜中之基體成分少時,前述導電性無機氧化物 微粒子相對增多,會有發生著色的問題之情形。即使透明 被膜中之基體成分過多,其導電性無機氧化物微粒子會變 少,因此導電性會不足,而有抗靜電性能不足之情形。 基材之折射率(Ns)與前述透明被膜之折射率(Nh)的 差,以0. 02以下,更好是0. 01以下為佳。 前述折射率之差超過0.02時,會發生明顯之干擾條 紋,而成為外觀上之問題,或在顯示裝置使用時會有影像 之清晰度降低之情形。 本發明中之透明被膜之折射率(Nh)以在1.49至1. 59, 更好是1.49至1.56,特別是1.49至1.52之範圍為佳。 透明被膜之折射率(Nh)不在前述範圍時,其與使用之 基材之折射率(Ns)之折射率差大於0. 02時,會有發生干擾 條紋之情形。 透明被膜之表面電阻以在108至10uQ/sq.,更好是 108至101QQ/sq.之範圍為佳。 透明被膜之表面電阻過低時,前述導電性無機氧化物 微粒子之含莖須在12質置%以上,該情形時,會有發生者 色之問題的情形。 透明被膜之表面電阻過高時,會有抗靜電性能不足的 情形。 透明被膜之霧度以0. 3%以下,更好是0. 2%以下為佳。 23 323138 201204773 霧度高者,其透明性會不足,會有無法得到 光學 特性,例如對比、清晰性的情形。 / 透明被膜之全光線透光度為90%以上,以92%以上為 佳。 透光度低時,不只無法具有前述期望之光學特性,且 經著色而使全光線透光度低時會對光學組材之設計及外觀 性有不良影響的情形。 透明被膜之膜厚以在1至2〇ym,更好是在4至 之範圍為佳。 透明被膜之膜厚過薄時,會有無法具有充分之硬度、 耐擦傷性之情形;透明被膜之臈厚過厚時,亦會有因厚膜 而使著色增加,或透光度不足之情形。 本發明中,可在前述透明被膜上,形成具有比該透明 被膜之折射率更低折射率的透明被膜作為抗反射膜。抗反 射膜可以形成一般已知之抗反射膜,例如可使用本案專利 申請人所申請之日本特開2〇〇6_339113號公報中所揭示之 抗反射膜形成用塗佈液、抗反射膜。 [實施例] 以下’再以實施例更具體說明本發明,惟本發明並不 限定於此等實施例。 [實施例1] (鍵狀導電性無機氧化物微粒子(1)分散液之調製) 先將13〇g之锡酸鉀及30g之酒石酸銻鉀溶於400g之 純水中製成其混合溶液。此製成之溶液再於12小時内、60 24 323138 201204773 C麟下’加人讀ι· Qg之硝酸錢並錢氧化卸調其為 ΡΙΠ0.5之H)〇〇g之純水中進行水解。此時,同時添加⑽ 硝酸溶液使其騎在5。再雜分離洗淨其中生成之 沉殿物後,再次將其分散於水巾,難成H]形分濃度20質 1%之金屬氧化物前驅物氫氧化物分散液。 该分散液再於1’下喷霧乾燥,製成金屬氧化物前 驅物氫氧化物粉體。該粉體再於空氣中,經55(rc加熱處 理2小時’製成Sb摻雜氧化錫(ΑΤ0)粉末。 取6〇g之該粉末分散於U〇g之濃度4. 3質量%之氫氧 化鉀水溶液巾’並_面簡分餘在默—面以混砂機粉 碎3小時製成溶膠。 &其次於該溶膠中加入純水稀釋成濃度8質量%。此時該 之pH為5· 2 °之後該溶膠再以陰離子交換樹脂(日本 菱化干a司製造:diai〇n SANUPC)處理,並調其為pH 丄5 ’、人’再經200¾加熱處理24小時。繼之以陰離子 交換樹月曰(日本三菱化學公司製造:DIAION SANUPC)處理 後,再以陽離子交換樹脂(日本三菱化學公司製造:DIAI0N =K1BH)處理’製成ρΗ2· 7、濃度8質量%之溶膠。該溶膠再 &超縮’製成固形分濃度為20質量%之由Sb摻雜氧 化錫製成之導電性無機氧化物微粒子(1)分散液。該導電性 無機2物微粒子⑴之平均粒徑為8nm。 ,其次’將l〇〇g之濃度為2〇質量%之導電性雜機氧化物 微粒子(1)分散液調至25^,再以3分鐘加入5. 2g之四乙 氧夕烧(日本多摩化學公司製造:正石夕酸乙酯、Si〇2濃度為 25 323138 201204773 28.8質量%)後,進行3〇分鐘之擾拌。之後再於i分鐘内 加入l〇〇g之乙醇,並以30分鐘昇溫至5(rc,進行過熱處 理15小時。其中,其固形分漠度為10質量%。 f後再經超濾膜使其分散溶劑之水、乙醇取代為溶劑 之乙醇調製成固形分濃度為2〇質量%之有機石夕化合物經 鏈狀化及表面處理之鏈狀導電性無機氧化物微粒子〇)分 =液。其中所構成之鏈狀導電性無機氧化物微粒子(1)的一 次粒子之平均連結數為1〇個。該鏈狀導電性無機氧化物微 粒子(1)之折射率為1. 75。 (透明被膜形成用塗佈液(1)之調製) 在l〇〇g之固形分濃度為2〇質量%之經表面處理之鏈狀 導電性無機氧化物微粒子(1)分散液及48〇g之環氧乙烷改 質丙烯酸系樹脂(日本共榮社化學公司製造:LIGHT_ ACRYLATE TMP-3E0-A’ 樹脂濃度 100 質量%)中,加人 38 4g 之光起始劑(日本Ciba特化公司製造:irgacurei84)及作 為酮系溶劑之658g之丙酮、160g之甲基乙酮,並充分混 合後,調製成固形分濃度為4〇質量%之透明被膜形成用塗 佈液(1)。 (附有透明被膜之基材(1)之調製) 將透明被膜形成用塗佈液(1)在TAC膜(日本PANAC公 司製造:FT-PB80UL-M,厚度:8〇//m,折射率:15)上以 棒塗法(#10棒)進行塗佈,再於8〇它下乾燥12〇秒鐘後, 再經300mJ/cm2之紫外線照射使其硬化,調製成附有透明被 膜之基材(1)。該透明被膜之轉為5_。 26 323138 201204773 該附有透明被膜之基材(1)之全光線透光度、霧度、被 膜之折射率、表面電阻、密接性、鉛筆硬度、著色、干擾 條紋、鏈狀粒子之分散狀態及耐擦傷性如表中所示 。全光 線透光度及霧度分別以霧度測定儀(日本Suga試驗機公司 製造)、分光光度計(曰本分光社公司製造:Ubest_55)測 疋。表面電阻值,係以表面電阻計(曰本三菱化學公司製 造:Hiresta)測定。 又,其中未塗佈TAC膜之全光線透光度為93. 2%,霧 度為0. 2%,波長550nm之光的反射率為6. 〇%。 其密接性、鉛筆硬度、著色、干擾條紋、鏈狀粒子之 分散狀態、耐擦傷性係以以下之方法及評定基準評估,其 結果如表中所示。又,鏈狀粒子之分散狀態評估時之掃描 型電子顯微鏡照片如第1圖所示。 (折射率) 將透明被膜形成用塗佈液(1)在矽晶片上塗佈、乾燥、 硬化後形成透明被膜,再對該透明被膜之折射率以橢圓偏 光計(日本ULVAC公司製造:EMS-1)測定。 (著色) 係對附有透明被膜之基材(1)照射日光燈,再以目視觀 察透光中有無著色。其結果如表1中所示。 評定基準: 無色透明而完全未觀察到著色:◎ 可觀察到僅有些微著色 ··〇 可觀察到薄的著色 :△ 27 323138 201204773 可觀察到有濃的著色 :χ (密接性) 在附有透明被膜之基材(1)之表面,以刀片割出由縱橫 1mm間隔之11條平行割痕所隔出之1〇〇個格子,再貼以赛 路凡黏性膠帶接著,之後在剝離赛路凡黏性膠帶時,被膜 中未被剝離而殘留格子之數目,依照以下之4階級分類評 估其密接性。其結果如表1中所示。 殘留格子之數目為100個 :◎ 殘留格子之數目為90至99個:〇 殘留格子之數目為85至89個:△ 殘留格子之數目為84個以下:x (财擦傷性之測定) 使用#0000鋼絲絨以負載500g/cm2滑動50次再以目 察膜之表面’依照以下之基準評估,其結果如表i中 評定基準: 未觀察到條紋擦傷 :◎ 可觀察到輕微條紋擦傷:〇 可觀察到複數條紋擦傷:△ 面之全體被刮傷 :x (著色) 在附有透明被膜之基材(1)之背景為黑色之狀 日月被膜表面蚀η本格夕本浔射 態下,在 振 M〜〜π从曰硯觀察經光之千 擾的虹彩圖樣之形成,依照以下之基準評估。 323138 28 201204773Examples of the acryl-based oxime resin (A) include a cyclohexane resin, an acrylic styrene oxime, a propylene oxide-modified acrylic resin, and the like. Use such an epoxy-fired modified propylene-based resin (when the knife solvent of C is a conductive solvent of the same type, or when using the oxide particles (primary particles) of the above table (5) In its production: Conductive: raw can form a chain structure and form a high dispersion, so that the transparent film: the material, the amount of particles used can also be made into electrical conductivity. 1, especially ethylene oxide The acrylic resin is more excellent in this place. I_, ,, matrix forming component, refers to such acrylic acid; j 曰 曰 before the polymerization reaction. In addition to the dilute acid resin (A), the non-modified C-based resin (8) is more preferable. When the non-modified C = sap (B) is used in this way, the transparent film made thereof can further improve the strength and hardness. 323138 201204773 Examples of non-modified acrylic resin (B) include: pentaerythritol tripropionate s, neopentyltetraacetic acid s, and tris-methyl propyl tris (a) Acrylate, bis(trihydroxymethyl)propane tetra(meth)acrylate, dipentaerythritol hexaacrylic acid Ester, methyl methacrylate, ethyl methacrylate, butyl methacrylate, methyl propyl acetoin, methyl 2-propylhexyl methacrylate, methacrylic acid Anthracene ester, acrylic acid lauric acid, n-stearyl acrylate, 1,6-hexanediol dimethyl acrylate vinegar, perfluorooctyl methacrylate, trifluoroethyl methacrylate, Polyurethane acrylate, etc., and mixtures thereof. When non-modified acrylic resin (B) is included, non-modified acrylic tree (B) and oxidized oxy-modified acrylic resin (a) The weight ratio of the solid content ((A) : (Β)) is preferably in the range of 5: 95 to 50: 50 ', preferably in the range of 5: 95 to 4: 60. Non-modified acrylic resin (Β) When it is small, the effect of using a non-modified acrylic resin (,) is that the effect of increasing the strength, hardness, and scratch resistance of the formed transparent film is insufficient, and when it is excessive, the conductive inorganic oxide is reduced. The tendency of the microparticles to be chained, and the amount of conductive inorganic oxide fine particles or a small amount of conductive inorganic oxide fine particles to be used The mass of the composition of the substrate is 0. 1 to 59.4% by mass, more preferably 〇2 to 44.8 % by mass. When the concentration of the matrix-forming component in the coating liquid for forming a transparent film is low, the conductive inorganic oxide fine particles are reduced in chaining 323138 17 201204773, and conductive inorganic oxide fine particles are present. Or the effect of improving the conductivity by using a small amount of the conductive inorganic oxide fine particles is insufficient. Further, since the base forming component is small, the scratch resistance of the produced transparent film and the adhesion to the substrate are obtained. Insufficient situation. When the amount of the matrix-forming component in the coating liquid for forming a transparent film is too large, the conductivity of the conductive inorganic oxide fine particles is insufficient, and the antistatic property of the substrate to which the transparent film is formed is insufficient. In this case, there may be cases where the scratch resistance is insufficient and the adhesion to the substrate is insufficient. (Dispersing Solvent) The dispersing solvent used in the present invention is preferably a ketone. Specific examples thereof include acetone, methyl ethyl ketone, methyl isobutyl ketone, butyl fluorenone, cyclohexanone, nonylcyclohexanone, diacetone, decyl ketone, and diisobutyl ketone. Ketones such as isophorone, acetamidineacetone, and acetamidine acetate, and a mixed solvent thereof. Among them, acetone, mercaptoacetone and mixtures thereof are preferred. The dispersion solvent may further contain a dispersion solvent other than the ketone, and examples of the dispersion solvent other than the ketone may be decyl alcohol, ethanol, propanol, 2-propanol (IPA), butanol, diacetone alcohol, An alcohol such as α-sterol, tetrahydrofurfuryl alcohol, ethylene glycol, hexanediol or isopropyl glycol; esters such as decyl acetate, ethyl acetate and butyl acetate; diethyl ether and ethylene glycol monoterpenes Ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol isopropyl ether, diethylene glycol monoterpene ether, diethylene glycol monoethyl ether, propylene glycol monoterpene ether, propylene glycol monoethyl ether and other ethers; toluene , xylene, etc. and mixtures of these. When the mixed dispersion solvent is used in combination with the alkoxy-modified acrylic tree 18 323138 201204773 (A), the conductive film is formed when the transparent inorganic film is formed (when the particles are under-particles). The inorganic oxide fine particles (one under-particle) tend to be chained; and the conductive inorganic oxide fine particles do not aggregate with each other to form a high dispersion, thereby improving conductivity, and therefore even a small amount of conductive oxide fine particles It is also possible to produce a transparent film which has excellent electrical conductivity, transparency, transparency, hardness, and suppresses the occurrence of stray stripes. The proportion of the ketone in the dispersion solvent is preferably 3 〇 by mass or more, more preferably 4 〇 by mass or more. When the proportion of the ketone is small, when the transparent film is formed, the conductive inorganic oxide fine particles are not chained; and the chain-shaped conductive inorganic oxide fine particles are agglomerated with each other; and the transparent film cannot be formed. The case where the chain-shaped conductive inorganic oxide fine particles form a highly dispersed transparent film. When the base material is TAC, when the ketone is contained in the coating liquid, the surface of the TAC may swell or dissolve so that it penetrates into the transparent film component, and the optical interface in the boundary becomes unclear. There is a case where interference fringes are suppressed; however, when the ratio of ketones is small, such an effect of suppressing interference fringes may not be obtained. Further, when the above-mentioned dispersion solvent is used, when a TAC film is used for the substrate, a transparent film which suppresses interference streaks can be particularly formed. The concentration of the coating liquid for forming a transparent film is preferably from 1 to 60% by mass, more preferably from 2 to 40% by mass, based on the total solid content thereof. When the total solid content concentration of the coating liquid for forming a transparent film is too low, the conductive oxide fine particles tend to be unchained, so that the effect of improving the conductivity may not be obtained; or it may be difficult to apply once. In the case of a transparent conductive film having a thick film, it is a problem that the strength of the film is lowered and the economy is reduced when the coating is repeated and the drying operation is performed on 19 323 138 201204773. When the total solid concentration is too high, the viscosity of the coating liquid is increased and the coating property is lowered. The particles in which the conductive oxide fine particles are chained and the chain-shaped conductive oxide fine particles are Since there is a tendency to agglomerate, there is a case where sufficient conductivity cannot be obtained; or the haze of the produced transparent film is improved or the scratch resistance is insufficient. Such a coating liquid can be applied to the above-mentioned substrate by a generally known method such as an impregnation coating method, a spray coating method, a spin coating method, a gravure coating method, or a roll coating method, followed by drying and heat treatment. It is hardened by ultraviolet irradiation or the like to form a transparent film. The substrate forming component can be polymerized and hardened by the operation of the heating/ultraviolet irradiation or the like. Next, a substrate having a transparent film in the present invention will be described. (Substrate with transparent film) The substrate with a transparent film in the present invention comprises a substrate and a transparent film formed on the surface of the substrate. (Substrate) As the substrate used in the present invention, generally known glass, polycarbonate, acrylic resin, polyethylene terephthalate (PET), triethyl cellulose (TAC), etc. can be used. Plastic sheets, plastic films, etc., plastic sheets, etc. Among them, TAC, polycarbonate, acrylic resin substrate and the like are preferably used. In particular, in the case of using a ketone in the dispersion solvent of the coating liquid for forming a transparent film of the present invention, the TAC substrate is swollen or dissolved, and the TAC and the transparent film component are allowed to infiltrate each other to change the optical interface in the boundary. It is not clear 'or because it has a gradient of its refractive index, it can suppress the generation of interference fringes, so it is better. The refractive index (10) of the substrate used in the present invention τ is preferably in the range of 149 to 1.59, more preferably 1.49 to 1.56, particularly 149 to 152. When the base refractive index (Ns) is out of the above range, the refractive index difference between the refractive index of the transparent film and the refractive index (10) of the substrate cannot be adjusted to 0.2 or less, and the dry (four) grain may not be suppressed. . (Transparent film) The transparent film ' contains conductive inorganic oxide fine particles and a matrix component. (Conductive Inorganic Oxide Fine Particles) In the transparent film, the surface-treated conductive inorganic oxide fine particles used in the coating liquid form a chain structure and form a high dispersion. In the above-mentioned "chain-based electrical inorganic oxide", the above-mentioned secondary particles in the coating liquid are formed in the film forming step, the particles which have been previously joined, and the particles which are previously joined. It forms a link with the primary particles. In the meantime, "咼dispersion" means that the particles of the conductive non-tantalum oxide microparticles are different depending on the content of the conductive inorganic oxide fine particles. The connection, or agglutination, but evenly distributed without agglomeration, makes it possible for the tree to be formed by the formation of a chain to form a state of high dispersion. Between the chain particles, the number of the conductive inorganic oxide fine particles in the transparent film may be reshaped, and the number of connections may be 3 or more, and the county 5 is preferably μ ^ ± , θ is more preferably b or more, especially 10 When the number of the chain-like conductive inorganic oxide fine particles is small, the improvement effect of the conductivity may not be sufficiently obtained. Others may be used in the case where pre-formed chain-like particles are used, when the number of links is increased, or when monodisperse particles are linked to chain-like particles. y Although the reason why the chain-shaped conductive oxide fine particles in the transparent film of the present invention are highly dispersed is not clear, it is presumed to be the specific dispersion solvent, the specific resin, and the coating described above and used in the present invention. The liquid I degree is related. The content of the conductive inorganic oxide fine particles in the transparent film is preferably from 1 to 12% by mass, more preferably from 1 to 10% by mass, based on the solid content. When the amount of the conductive inorganic oxide fine particles in the transparent film is too small, even if the chain-shaped conductive fine particles are highly dispersed, the conductivity may be insufficient. When there are too many conductive inorganic oxide fine particles, even if the conductivity is improved, an inorganic oxide such as AT〇 or pT〇 may be observed, or the total light transmittance may be insufficient or the refractive index may be increased. Interference fringes occur depending on the substrate. * (Base component) The matrix component corresponds to the above-mentioned epoxy-fired modified acrylic resin (A) which is cured. Further, in addition to the epoxy (tetra) resin (4), a non-modified acrylic resin (B) may be contained. When a non-modified acrylic resin (8) and an epoxy-modified propylene-based resin (A) are used in combination, as in the above-mentioned matrix-forming component, the weight ratio ((B) · (A)) is 0. : 95 to 50: 50, better at 5: % to 4: (9) The range is better. 323138 22 201204773 The content of the matrix component in the transparent film is preferably from 88 to 99% by mass, more preferably from 90 to 99% by mass, based on the total solid content. When the amount of the matrix component in the transparent film is small, the conductive inorganic oxide fine particles are relatively increased, and there is a problem that coloring occurs. Even if the amount of the matrix component in the transparent film is too large, the amount of the conductive inorganic oxide fine particles is reduced, so that the conductivity is insufficient and the antistatic property is insufficient. 01以下以下。 Preferably, the difference between the refractive index (Ns) of the substrate and the refractive index (Nh) of the transparent film is preferably 0.02 or less, more preferably 0.01 or less. When the difference in refractive index exceeds 0.02, significant interference streaks occur, which may cause an appearance problem or a decrease in the definition of the image when the display device is used. The refractive index (Nh) of the transparent film in the present invention is preferably in the range of 1.49 to 1.59, more preferably 1.49 to 1.56, particularly 1.49 to 1.52. When the refractive index (Nh) of the transparent film is out of the above range, the difference in refractive index of the refractive index (Ns) of the substrate to be used is greater than 0.02, and interference fringes may occur. The surface resistivity of the transparent film is preferably in the range of 108 to 10 uQ/sq., more preferably 108 to 101 QQ/sq. When the surface resistance of the transparent film is too low, the stem of the conductive inorganic oxide fine particles must be at least 12% by mass, and in this case, there is a problem of occurrence of color. When the surface resistance of the transparent film is too high, there is a case where the antistatic property is insufficient. 2%以下优选。 Preferably, the haze of the transparent film is less than 0.3%, more preferably 0.2% or less. 23 323138 201204773 Those with high haze will have insufficient transparency and will not be able to obtain optical properties such as contrast and clarity. / The transparent film has a total light transmittance of 90% or more, preferably 92% or more. When the light transmittance is low, it is not only impossible to have the above-mentioned desired optical characteristics, but also when the total light transmittance is low by coloring, it may adversely affect the design and appearance of the optical composition. The film thickness of the transparent film is preferably from 1 to 2 μm, more preferably from 4 to. When the film thickness of the transparent film is too thin, the film may not have sufficient hardness and scratch resistance. When the thickness of the transparent film is too thick, the coloring may increase due to a thick film, or the transmittance may be insufficient. . In the present invention, a transparent film having a refractive index lower than that of the transparent film can be formed as an antireflection film on the transparent film. The antireflection film can be formed into a coating liquid for antireflection film formation and an antireflection film disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. [Examples] Hereinafter, the present invention will be more specifically described by the examples, but the present invention is not limited to the examples. [Example 1] (Preparation of the bond-shaped conductive inorganic oxide fine particles (1) dispersion) First, 13 gram of potassium stannate and 30 g of bismuth potassium tartrate were dissolved in 400 g of pure water to prepare a mixed solution. The prepared solution is then hydrolyzed in pure water of 12 hours, 60 24 323138 201204773 C Lin 'additional reading ι·Qg nitric acid money and oxidatively demodulating it to ΡΙΠ0.5H)〇〇g pure water . At this time, add (10) nitric acid solution to make it ride at 5. After the separation and washing of the precipitated material formed therein, the dispersion was again dispersed in a water towel, and it was difficult to form a metal oxide precursor hydroxide dispersion having a concentration of 20% by mass. The dispersion was further spray-dried at 1' to prepare a metal oxide precursor hydroxide powder. 3质量质量的氢的。 The powder is further dispersed in the air, and the concentration of U 〇g is 4.3% by mass of hydrogen. The potassium oxide aqueous solution was prepared by pulverizing the surface with a sand mixer for 3 hours to prepare a sol. & Secondly, the sol was diluted with pure water to a concentration of 8 mass%. At this time, the pH was 5 · After 2 °, the sol was treated with anion exchange resin (manufactured by Nippon Ryukyu Co., Ltd.: diii〇n SANUPC) and adjusted to pH 丄5 ', and then treated by heat treatment for 24 hours. Then anion After the treatment, the exchange sap (manufactured by Mitsubishi Chemical Corporation, Japan: DIAION SANUPC) was treated with a cation exchange resin (manufactured by Mitsubishi Chemical Corporation, Japan, DIAI0N = K1BH) to prepare a sol having a concentration of 8 mass%. Further, & super shrinking is made into a dispersion of conductive inorganic oxide fine particles (1) made of Sb-doped tin oxide having a solid concentration of 20% by mass. The average particle diameter of the conductive inorganic 2 fine particles (1) is 8nm., followed by 'the concentration of l〇〇g is 2〇% by mass The electrospray oxide fine particles (1) dispersion was adjusted to 25^, and then added in 5 minutes to 5. 2g of tetraethoxy oxime (manufactured by Tama Chemical Co., Ltd.: Ethyl ruthenium ethyl ester, Si〇2 concentration is After 25 323138 201204773 28.8% by mass, the mixture was stirred for 3 minutes. Then, l〇〇g of ethanol was added in i minutes, and the temperature was raised to 5 (rc) in 30 minutes, and heat treatment was carried out for 15 hours. The solid parting degree is 10% by mass. After f, the ultrafiltration membrane is used to disperse the water of the solvent, and the ethanol is replaced by the ethanol of the solvent to prepare the organic stone compound having a solid concentration of 2% by mass. The chain-like conductive inorganic oxide fine particles of the chain-shaped conductive inorganic oxide fine particles (1) have an average number of primary particles connected to each other. The chain-shaped conductive inorganic oxide The refractive index of the fine particles (1) is 1.75. (Preparation of the coating liquid for forming a transparent film (1)) Surface-treated chain conductivity at a solid concentration of 1 〇g Inorganic oxide microparticles (1) dispersion and 48 〇g of ethylene oxide Acrylic resin (manufactured by Kyoeisha Chemical Co., Ltd.: LIGHT_ACRYLATE TMP-3E0-A' resin concentration: 100% by mass), 38 4 g of a photoinitiator (manufactured by Ciba Special Chemical Co., Ltd.: irgacurei 84) and After 658 g of acetone and 160 g of methyl ethyl ketone in a ketone solvent were mixed well, a coating liquid for forming a transparent film (1) having a solid content concentration of 4% by mass was prepared. (Substrate with a transparent film) (1) Modification) The coating liquid for forming a transparent film (1) was applied by a bar coating method on a TAC film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness: 8 Å/m, refractive index: 15). (#10 stick) was applied, and after drying at 8 Torr for 12 sec., it was hardened by irradiation with ultraviolet rays of 300 mJ/cm 2 to prepare a substrate (1) having a transparent film. The transparent film is turned into 5_. 26 323138 201204773 The total light transmittance, haze, refractive index of the film, surface resistance, adhesion, pencil hardness, coloration, interference fringes, and dispersion state of chain particles of the substrate (1) with a transparent film The scratch resistance is shown in the table. The full-light transmittance and haze were measured by a haze meter (manufactured by Suga Test Machine Co., Ltd., Japan, and a spectrophotometer (manufactured by Sakamoto Seiko Co., Ltd.: Ubest_55). The surface resistance value was measured by a surface resistance meter (manufactured by Sakamoto Mitsubishi Chemical Corporation: Hiresta). 〇%。 The total light transmittance of the uncoated TAC film is 93.2%, the haze is 0.2%, the reflectance of light having a wavelength of 550nm is 6. 〇%. The adhesion, pencil hardness, coloration, interference fringes, dispersion state of the chain-like particles, and scratch resistance were evaluated by the following methods and evaluation criteria, and the results are shown in the table. Further, a scanning electron micrograph at the time of evaluation of the dispersion state of the chain-like particles is shown in Fig. 1. (Refractive Index) The coating liquid for forming a transparent film (1) is applied onto a ruthenium wafer, dried, and cured to form a transparent film, and the refractive index of the transparent film is measured by an ellipsometer (manufactured by ULVAC, Japan: EMS- 1) Determination. (Coloring) The base material (1) with the transparent film was irradiated with a fluorescent lamp, and the presence or absence of coloration in the light transmission was visually observed. The results are shown in Table 1. Evaluation criteria: Colorless and transparent, no coloration observed at all: ◎ Only a slight coloration was observed. · A thin coloration was observed: △ 27 323138 201204773 A strong coloration was observed: χ (adhesiveness) The surface of the substrate (1) of the transparent film is cut by a blade with 1 grid of 11 parallel slits separated by 1 mm in the longitudinal and lateral directions, and then attached to the Sai Lufan adhesive tape, followed by the stripping game. When Lufan adhesive tape is used, the number of remaining lattices in the film that has not been peeled off is evaluated according to the following four-class classification. The results are shown in Table 1. The number of residual lattices is 100: ◎ The number of residual lattices is 90 to 99: the number of residual lattices is 85 to 89: △ The number of residual lattices is 84 or less: x (measurement of the scratch resistance) Use # 0000 steel wool was slid 50 times at a load of 500 g/cm2 and then the surface of the film was observed. The results were evaluated according to the following criteria. The results are as shown in Table i: No scratches were observed: ◎ A slight streak can be observed: Multi-striped scratches were observed: △ The entire surface of the surface was scratched: x (coloring) The background of the substrate (1) with the transparent film was black, and the surface of the eclipse was eclipsed by the surface of the eclipse. The vibration M~~π is observed from the 曰砚 observation of the formation of the iridescent pattern of the light, and is evaluated according to the following criteria. 323138 28 201204773

完全無虹彩圖樣 有些微虹彩圖樣 • 〇 有明顯虹彩圖樣 極為清楚的虹彩圖樣 :X (鏈狀粒子之分散狀態) 拍攝透明被膜之斷面的穿透型電子顯微鏡照片,觀察 鏈狀導電性無機氧化物微粒子之分散狀態,再依照以下之 基準進行評估。 鏈狀粒子不互相連結而約略以均等間隔分散 :◎ 鏈狀粒子雖部分連結但約略以均等間隔分散 :◦ 鏈狀粒子多數連結而分散不均 :△ 單分散粒子並未鏈狀化而為單分散或凝集分散, 但鏈狀粒子形成凝集而分散不均 :χ [實施例2] (透明被膜形成用塗佈液(2)之調製) 在以100g之以如實施例1同樣操作調製成之經表面處 理的鏈狀導電性無機氧化物微粒子(1)分散液及384g之環 氧乙烷改質丙烯酸系樹脂(日本DAICEL-CYTEC公司製造: EBECRYL40,樹脂濃度1〇〇質量%)、96g之作為非改質丙烯 酸系樹脂(B)之二新戊四醇六丙烯酸酯(日本共榮社化學公 司製造:LIGHT-ACRYLATE DPE-6A,樹脂濃度100質量%) 中’加入38. 4g之光起始劑(日本ciba特化公司製造: Irgacurel84)及作為酮系溶劑之568g之丙酮、160g之甲 基乙酮’並充分混合後,調製成固形分濃度為40質量°/。之 29 323138 201204773 透明被膜形成用塗佈液(2 )。 (附有透明被膜之基材(2)之調製) 在實施例1中’除了使用透明被膜形成用塗佈液⑵ 以夕以同樣之操作調製成时透明被膜之紐⑵。該透 明被膜之膜厚為5;wm。 該製成之附有透明被膜之基材⑵之透光度、霧度、被 膜之折射率、表面電阻、密接性、錯筆硬度、著色、干擾 條紋鍵狀粒子之分散狀態、耐擦傷性如表中所示。 [實施例3] (透明被膜形成用塗佈液(3)之調製) 在以100g之以如實施例1同樣操作調製成之經表面處 理的鏈狀導電性無機氧化物微粒子(1)分散液及288g之環 氧乙院改質丙烯酸系樹脂(曰本新中村化學工業公司製 造:NK Ester ATM-4E,樹脂濃度1〇〇質量%)、i92g之非 改質丙烤酸系樹脂(日本共榮社化學公司製造:LIGHT-ACRYLATE DPE-6A ’ 樹脂濃度 1〇〇 質量%) 中 ,加入 38. 4g 之 光起始劑(日本Ciba特化公司製造:Ifgacurel84)及作為 酮系溶劑之568g之丙酮、160g之曱基乙酮,並充分混合 後,調製成固形分濃度為40質量%之透明被膜形成用塗佈 液(3)。 (附有透明被膜之基材(3)之調製) 在實施例1中,除了使用透明被膜形成用塗佈液(3) 以外,以同樣之操作調製成附有透明被膜之基材(3)。該透 明被膜之膜厚為5em。 30 323138 201204773 該製成之附有透明被膜之基材(3)之透光度、霧度、被 膜之折射率、密接性、錯筆硬度、著色、干擾條紋、鏈狀 粒子之分散狀態、耐擦傷性如表中所示。 [實施例4] (透明被膜形成用塗佈液(4)之調製) 在以50g之以如實施例1同樣操作調製成之經表面處 理的鏈狀導電性無機氧化物微粒子(1)分散液及294g之環 氧乙烷改質丙烯酸系樹脂(曰本新中村化學工業公司製 造:NK Ester ATM-4E,樹脂濃度1〇〇質量%)、196g之非 改質丙烯酸系樹脂(曰本共榮社化學公司製造:LIGHT-ACRYLATEDPE-6A,樹脂濃度1〇〇質量%)中,加入39.2g之 光起始劑(日本Ciba特化公司製造:Irgacurel84)及作為 酮系溶劑之600g之丙酮、169g之甲基乙酮,並充分混合 後,製成固形分濃度為40質量%之透明被膜形成用塗佈液 ⑷。 (附有透明被膜之基材(4)之調製) 在實施例1中,除了使用透明被膜形成用塗佈液(4) 以外’以同樣之操作調製成附有透明被膜之基材(4)。該透 明被膜之膜厚為。 該製成之附有透明被膜之基材(4)之全光線透光度、霧 度、被膜之折射率、密接性、鉛筆硬度、著色、干擾條紋、 鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [實施例5] (透明被膜形成用塗佈液(5)之調製) 31 323138 201204773 在以100g之以如實施例i同樣操作調製成之經表面處 理的鏈狀導電性無機氧化物微粒子(1)分散液及108g之環 氧乙烷改質丙烯酸系樹脂(曰本新中村化學工業公司製 造:NK Ester ATM-4E,樹脂濃度1〇0質量%)、72g之非改 質丙烯酸系樹脂(日本共榮社化學公司製造:LIGht— ACRYLATE DPE-6A,樹脂濃度100質量%)中,加入14 4g之 光起始劑(日本Ciba特化公司製造:irgacurei84)及作為 酮系溶劑之188g之丙酮、53g之曱基乙酮,並充分混合後, 調製成固形分濃度為40質量%之透明被膜形成用塗佈液 (5)。 (附有透明被膜之基材(5)之調製) 在實施例1中,除了使用透明被膜形成用塗佈液(5) 以外’以同樣之操作調製成附有透明被膜之基材(5)。該透 明被膜之膜厚為5#ra。 該製成之附有透明被膜之基材(5)之透光度、霧度、反 射率、被膜之折射率、密接性、鉛筆硬度、著色、干擾條 紋、鍵狀粒子之分散狀態、耐擦傷性如表中所示。 [實施例6] (透明被臈形成用塗佈液(6)之調製) 在實施例3中,除了使用288g之作為環氧烷改質丙烯 酸系樹脂之環氧丙烷改質丙烯酸系樹脂(日本新中村化學 工業公司製造:NK Ester ATM-4P,樹脂濃度100質量%) 以外’以同樣之操作調製成透明被膜形成用塗佈液(6)。 (附有透明被膜之基材(6)之調製) 32 323138 201204773 在實施例1中,除了使用透明被膜形成用塗佈液(6 ) 以外,以同樣之操作調製成附有透明被膜之基材(6)。該透 明被膜之膜厚為° 該製成之附有透明被膜之基材(6)之透光度、霧度、被 膜之折射率、密接性、錯筆硬度、著色、干擾條紋、鏈狀 粒子之分散狀態、耐擦傷性如表中所示。 [實施例7] (透明被膜形成用塗佈液(7)之調製) 在以100g之以如實施例1同樣操作調製成之固形分濃 度為20質量%之經表面處理的鏈狀導電性無機氧化物微粒 子(1)分散液及288g之環氧乙烷改質丙烯酸系樹脂(曰本 新中村化學工業公司製造:NK Ester ATM-4E ’樹脂濃度 100質量%)、192g之非改質丙烯酸系樹脂(曰本共榮社化學 公司製造:LIGHT-ACRYLATE DPE-6A,樹脂濃度100質量%) 中,加入38. 4g之光起始劑(日本Ciba特化公司製造: 1^&〇11^184)及作為酮系溶劑之5688之丙_、160轻之甲 基異丁酮,並充分混合後,調製成固形分濃度為40質量% 之透明被膜形成用塗佈液(7)。 (附有透明被膜之基材(7)之調製) 在實施例1中,除了使用透明被膜形成用塗佈液(7) 以外,以同樣之操作,調製成附有透明被膜之基材(7)。該 透明被膜之膜厚為5#m。 該製成之附有透明被膜之基材(7)之全光線透光度、霧 度、被膜之折射率、密接性、錯筆硬度、著色、干擾條紋、 33 323138 201204773 鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [實施例8](實施例3中改變為ΡΤ0粒子,粒子:樹脂=10 : 90) 鏈狀導電性無機氧化物粒子(3)分散液之調製 先將150g之錫酸鉀溶於430g之純水中製成溶液。此 製成之溶液再以12小時、於60°C、攪拌下加入800g之純 水及1. 3g之硝酸銨以及氫氧化鉀水溶液調成的pHiQ. 〇之 溶液中’使其進行水解。此時,同時添加漠度1 〇質量%之 硝酸水溶液使其保持在PH10. 0。再過濾分離//洗淨其中生 成之沉澱物後,再次將其分散於水中,製成200g之固形分 濃度20質量%之氫氧化錫分散液。 之後再於該分散液中加入3. 2g之濃度85質量%的磷酸 水溶液並攪拌30分鐘後,於溫度loot下喷霧乾燥,製成 磷摻雜氧化錫前驅物之氫氧化物粉體。該粉體再於空氣 中,經65(TC加熱處理2小時,製成磷摻雜氧化錫粉末。 再取60g之該粉末分散於140g之濃度4. 3質量%之氫 氧化鉀水溶液中,並一面保持分散液在30°C—面以混砂機 粉碎3小時調製成溶膠。 其次’該溶膠再以離子交換樹脂進行脫鹼處理至pH為 3· 3並加入純水,調製成濃度20質量%之由磷摻雜氧化錫 微好製叙導電糾錄子⑶分散液。 &導電性無機氧化物微粒子(3)分散液之PH為3.6。 此時=1:性無魏化物微粒子⑶之平均粒徑為8⑽。 其次’將1叫之該濃度為20質量%之導電性無機氧化 323138 34 201204773 物微粒子(3)分散液調至25°C,再以3分鐘加入 3. 5g之四 乙氧矽烷(日本多摩化學公司製造:正矽酸乙酯、Si〇2濃度 為28· 8質量%)後,進行3〇分鐘之攪拌。之後再於丨分鐘 内加入100g之乙醇,並以3〇分鐘昇溫至6〇〇c,進行過熱 處理12小時。此時之固形分濃度為質量%。 其後再經超濾膜使其分散溶劑之水及乙醇取代為溶劑 之乙醇’調製成固形分濃度為20質量%之有機矽化合物經 鏈狀化及表面處理之鏈狀導電性無機氧化物微粒子(3)分 散液。其中所構成之鏈狀導電性無機氧化物微粒子(3)的一 次粒子之平均連結數為5個。該鏈狀導電性無機氧化物微 粒子(3)之折射率為1.74。 (透明被膜形成用塗佈液(8)之調製) 在100g之固形分濃度為20質量%之經表面處理的鏈狀 導電性無機氧化物微粒子(3)分散液及i〇8g之環氧乙烷改 質丙烯酸系樹脂(日本新中村化學工業公司製造:NK Ester ATM-4E,樹脂濃度100質量%)、72g之非改質丙烯酸系樹 脂(日本共榮社化學公司製造:LIGHT-ACRYLATE DPE-6A, 樹脂濃度100質量%)中,加入14. 4g之光起始劑(曰本ciba 特化公司製造:Irgacurel84)及作為酮系溶劑之188g之丙 酮、53g之甲基乙酮,並充分混合後,調製成固形分濃度 為40質量%之透明被膜形成用塗佈液。 (附有透明被膜之基材(8)之調製) 在實施例1中,除了使用透明被膜形成用塗佈液(8) 以外,以同樣之操作調製成附有透明被膜之基材(8)。該透 323138 35 201204773 明被膜之膜厚為5/zm。 該製成之附有透明被膜之基材(8)之全光線透光度、霧 度、被膜之折射率、密接性、鉛筆硬度、著色、干擾條紋、 鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [實施例9] (附有透明被膜之基材(9)之調製) 將如實施例3同樣製造之透明被膜形成用塗佈液(3) 在TAC膜(日本PANAC公司製造:FT-PB80UL-M,厚度: 80//m ’折射率:1. 5)上以棒塗法(#4棒)進行塗佈,再於 80°C下乾燥120秒鐘後,再經300mJ/cm2之紫外線照射使其 硬化’調製成附有透明被膜之基材(9)。該透明被膜之膜厚 為 2 y m 〇 該製成之附有透明被膜之基材(9)之全光線透光度、霧 度、被膜之折射率、密接性、鉛筆硬度、著色、干擾條紋、 璉狀粒子之分散狀態、耐擦傷性如表中所示。 [實施例10] (附有透明被臈之基材(10)之調製) 將如實施例3同樣製造之透明被膜形成用塗佈液(3) 在TAC膜(日本PANAC公司製造:FT一pB8〇UL_M,厚度: 8〇^m,折射率:1.5)上以棒塗法(#20棒)進行塗佈,再於 80C下乾燥12〇秒鐘後,再經3〇〇mJ/cm2之紫外線照射使其 硬化,調製成附有透明被膜之基材(10)。該透明被膜之膜 厚為10 /z m。 該製成之附有透明被膜之基材(10)之全光線透光度、 323138 36 201204773 務度、被膜之折射率、被接性、錯筆硬度、著色、干擾條 紋、鏈狀粒子之分散狀態、耐擦傷性如表中所系。 [實施例11] (抗反射用透明被膜形成用塗佈液(1)之調製) 先在6. 5g之氧化矽系微粒子分散液(日本日揮觸媒化 成公司製造:斯陸利亞4320 ’粒子折射率=1.3〇,固形分 濃度20質量%,分散溶劑=甲基異丁酮)中加入5. 9g之曱基 異丁酮加以稀釋,之後再將1. 03g之二新戊四錄六丙稀酸 酯(日本共榮社化學公司製造:DPE-6A,固形分濃度100質 量%)及0.08g之撥水化材用反應性矽油(信越化學公司製 造:X-22-174DX,固形分濃度1〇〇質量%)及〇.〇9g之1,6-己二醇二丙稀酸酯(日本共榮社化學公司製造:LI GHT-ACRYLATE 1· 6HX-A)及0. 76g之光聚合起始劑(日本Ciba公 司製造:Irgacurel84 :溶於IPA中成固形分浪度10質量 %)與70.66g之異丙醇、15.〇〇g之異丙二醇混合,調製成 固形分濃度為2.5質量%之抗反射用透明被膜形成用塗佈 液⑴。 (附有透明被膜之基材(11)之調製) 如實施例3同樣操作調製成附有透明被膜之基材 (3) ’其次將抗反射用透明被膜形成用塗佈液(1)以棒塗法 (#3棒)進行塗佈,再於8〇°c下乾燥120秒鐘後,於N2環 境下經6 0 0m J / c m2之紫外線照射使其硬化,調製成含抗反射 膜之附有透明被膜之基材(11)。其中該抗反射用透明被膜 之膜厚為l〇〇nm。 37 323138 201204773 該製成之附有透明被膜之基材(11)之全光光产、 霧度、反射率、被膜之折射率、密接性、鉛筆硬度、著^、 干擾條紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [實施例12] (導電性無機氧化物粒子(12)分散液之調製) 將1〇〇g之以如實施例1同樣操作調製成之濃度為20 質量%的導電性無機氧化物微粒子⑴分散液調為肌,再 以3分鐘加入4. 9g之四乙氧矽烷(日本多摩化學公司製 造:正石夕酸乙酿、Si〇2濃度為28 8質量%)後,撥拌3〇分 鐘。之後再於1分鐘内加入1〇〇g之乙醇,並以3〇分鐘昇 溫至50 C,進行過熱處理2〇小時。此時之固形分濃度為 15質量%。 其後再經超濾膜使其分散溶劑之水及乙醇取代為溶劑 之乙醇’調製成固形分濃度為2G質量%之以有機魏合物 經表面處理之導電性無機氧化物微粒子(12)分散液。其中 之導電性無機氧化物微粒子(12)之平均粒徑為8nm。該導 電性無機氧化物微粒子(11)之折射率為1 · Μ。 (透明被膜形成用塗佈液(12)之調製) 在實施例3中’除了使用l〇〇g之以固形分濃度15質 量%之以有機魏合物表面處理的導電性無機氧化物微粒 子(12)分散液以外,以同樣之操作調製成固形分濃度質 量%之透明被膜形成用塗佈液G2)。 (附有透明被膜之基材(12)之調製) 在實施例1巾’除了使用透明被膜形成用塗佈液(12) 323138 38 201204773 以外,以同樣之操作調製成附有透明被膜之基材(12)。該 透明被膜之膜厚為5/zm。 該製成之附有透明被膜之基材(12)之全光線透光度、 霧度、反射率、被膜之折射率、密接性、鉛筆硬度、著色、 干擾條紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。 透明被膜中之鏈狀導電性無機氧化物微粒子,其平均粒徑 為8nm,連結數為3。 [比較例1 ] (透明被膜形成用塗佈液(R1)之調製)A completely iridescent pattern with some micro-irid patterns • An iridescent pattern with an obvious iridescent pattern: X (dispersed state of chain particles) A penetrating electron micrograph of a section of a transparent film is taken to observe chain-like conductive inorganic oxidation The dispersion state of the fine particles was evaluated according to the following criteria. The chain-like particles are not connected to each other and are approximately dispersed at equal intervals: ◎ The chain-like particles are partially connected but are dispersed at approximately equal intervals: ◦ Chain-like particles are mostly connected and dispersed unevenly: Δ Monodisperse particles are not chained and are single Disperse or agglomerate and disperse, but the chain-like particles form agglomerates and are unevenly dispersed: 实施 [Example 2] (Preparation of coating liquid (2) for forming a transparent film) The mixture was prepared in the same manner as in Example 1 at 100 g. Surface-treated chain-shaped conductive inorganic oxide fine particle (1) dispersion and 384 g of ethylene oxide-modified acrylic resin (manufactured by DAICEL-CYTEC, Japan: EBECRYL 40, resin concentration: 1% by mass), 96 g 4克的光起起 as a non-modified acrylic resin (B), a neopentyl alcohol hexaacrylate (manufactured by Kyoritsu Chemical Co., Ltd.: LIGHT-ACRYLATE DPE-6A, resin concentration: 100% by mass) The starting agent (manufactured by Japan Ciba Special Chemical Co., Ltd.: Irgacurel 84) and 568 g of acetone as a ketone solvent, and 160 g of methyl ethyl ketone' were thoroughly mixed, and the solid content was adjusted to 40 mass%. 29 323138 201204773 Coating liquid for forming a transparent film (2). (Preparation of the base material (2) with a transparent film) In the first embodiment, except for the use of the coating liquid for forming a transparent film (2), the transparent film (2) was prepared by the same operation. The film thickness of the transparent film was 5; wm. Transparency, haze, refractive index of the film, surface resistance, adhesion, stagger hardness, coloration, dispersion state of interfering streak-bonded particles, and scratch resistance, etc., of the substrate (2) with the transparent film formed thereon Shown in the table. [Example 3] (Preparation of coating liquid (3) for forming a transparent film) The surface-treated chain-shaped conductive inorganic oxide fine particle (1) dispersion prepared by the same operation as in Example 1 at 100 g And 288g of epoxy enamel modified acrylic resin (manufactured by Sakamoto Nakamura Chemical Industry Co., Ltd.: NK Ester ATM-4E, resin concentration: 1% by mass), i92g of non-modified acrylic acid resin (Japan total In the LIGHT-ACRYLATE DPE-6A 'resin concentration: 1% by mass), 38.4 g of a photoinitiator (manufactured by Ciba Specialty Chemical Co., Ltd.: Ifgacurel 84) and 568 g as a ketone solvent were added. After acetone and 160 g of decyl ketone were sufficiently mixed, a coating liquid (3) for forming a transparent film having a solid content concentration of 40% by mass was prepared. (Preparation of the base film (3) with a transparent film) In the first embodiment, a substrate having a transparent film (3) was prepared in the same manner except that the coating liquid for forming a transparent film (3) was used. . The film thickness of the transparent film was 5 cm. 30 323138 201204773 The transmittance, haze, refractive index of the film, adhesion, mis-hardness, coloration, interference fringes, dispersion state of chain-like particles, and resistance of the substrate (3) with the transparent film produced The scratch resistance is shown in the table. [Example 4] (Preparation of coating liquid (4) for forming a transparent film) The surface-treated chain-shaped conductive inorganic oxide fine particle (1) dispersion prepared by the same operation as in Example 1 at 50 g And 294g of ethylene oxide modified acrylic resin (manufactured by Sakamoto Nakamura Chemical Industry Co., Ltd.: NK Ester ATM-4E, resin concentration: 1% by mass), and 196g of non-modified acrylic resin (曰本共荣In the company: LIGHT-ACRYLATEDPE-6A, resin concentration: 1% by mass, 39.2 g of a photoinitiator (Irgacurel 84, manufactured by Ciba Specialty Chemical Co., Ltd.) and 600 g of acetone as a ketone solvent, 169 g were added. After the methyl ethyl ketone was sufficiently mixed, a coating liquid (4) for forming a transparent film having a solid content concentration of 40% by mass was prepared. (Preparation of the base material (4) with the transparent film) In the first embodiment, the substrate (4) having the transparent film is prepared by the same operation except that the coating liquid for forming a transparent film (4) is used. . The film thickness of the transparent film is. The total light transmittance, haze, refractive index of the film, adhesion, pencil hardness, coloration, interference fringes, dispersion state of chain particles, and scratch resistance of the substrate (4) to which the transparent film is formed As shown in the table. [Example 5] (Preparation of coating liquid (5) for forming a transparent film) 31 323138 201204773 Surface-treated chain-shaped conductive inorganic oxide fine particles prepared by the same operation as in Example i at 100 g (1) ) Dispersion and 108 g of ethylene oxide-modified acrylic resin (manufactured by Sakamoto Nakamura Chemical Co., Ltd.: NK Ester ATM-4E, resin concentration: 1.0% by mass), and 72 g of non-modified acrylic resin (Japan) Co., Ltd. manufactured by Kyoeisha Chemical Co., Ltd.: LIGht-ACRYLATE DPE-6A, resin concentration: 100% by mass), 14 4 g of a photoinitiator (manufactured by Ciba Special Chemical Co., Ltd.: irgacurei 84) and 188 g of acetone as a ketone solvent, After 53 g of decyl ethyl ketone was sufficiently mixed, a coating liquid (5) for forming a transparent film having a solid content concentration of 40% by mass was prepared. (Preparation of the base film (5) with a transparent film) In the first embodiment, a substrate (5) having a transparent film is prepared by the same operation except that the coating liquid for forming a transparent film (5) is used. . The film thickness of the transparent film was 5 #ra. Transparency, haze, reflectance, refractive index of the film, adhesion, pencil hardness, coloration, interference fringes, dispersion state of the bond particles, and scratch resistance of the substrate (5) with the transparent film formed thereon The sex is shown in the table. [Example 6] (Preparation of coating liquid (6) for transparent beryllium formation) In Example 3, 288 g of propylene oxide-modified acrylic resin as an alkylene oxide-modified acrylic resin was used (Japan) NK Ester ATM-4P, manufactured by Shin-Nakamura Chemical Co., Ltd., having a resin concentration of 100% by mass) was prepared by the same operation as a coating liquid for forming a transparent film (6). (Preparation of the substrate (6) with a transparent film) 32 323138 201204773 In the first embodiment, a substrate coated with a transparent film was prepared in the same manner except that the coating liquid (6) for forming a transparent film was used. (6). The film thickness of the transparent film is ° transmittance, haze, refractive index of the film, adhesion, stray hardness, coloration, interference fringes, chain-like particles of the substrate (6) with the transparent film. The dispersion state and scratch resistance are as shown in the table. [Example 7] (Preparation of coating liquid (7) for forming a transparent film) Surface-treated chain-shaped conductive inorganic substance having a solid content concentration of 20% by mass prepared in the same manner as in Example 1 at 100 g Oxide fine particle (1) dispersion and 288 g of ethylene oxide modified acrylic resin (manufactured by Sakamoto Nakamura Chemical Co., Ltd.: NK Ester ATM-4E 'resin concentration: 100% by mass), and 192 g of non-modified acrylic resin In the resin (manufactured by Sakamoto Kyoritsu Chemical Co., Ltd.: LIGHT-ACRYLATE DPE-6A, resin concentration: 100% by mass), 38.4 g of photoinitiator (manufactured by Ciba Special Chemical Co., Ltd., Japan: 1^&〇11^) 184) and a methyl ketone of 5688 as a ketone solvent, and the mixture was sufficiently mixed to prepare a coating liquid for forming a transparent film (7) having a solid content concentration of 40% by mass. (Preparation of the base material (7) with a transparent film) In the same manner as in the first embodiment, a substrate with a transparent film (7) was prepared in the same manner as in the case of using the coating liquid for forming a transparent film (7). ). The film thickness of the transparent film was 5 #m. The total light transmittance, haze, refractive index of the film, adhesion, wrong pen hardness, coloration, interference fringe, and dispersion state of the chain particles of the substrate (7) with the transparent film formed thereon The scratch resistance is shown in the table. [Example 8] (Changed to ΡΤ0 particles in Example 3, particles: Resin = 10: 90) Modulation of chain-like conductive inorganic oxide particles (3) Dispersion First, 150 g of potassium stannate was dissolved in 430 g of pure Make a solution in water. The resulting solution was further hydrolyzed by adding a solution of 800 g of pure water and 1.3 g of ammonium nitrate and an aqueous solution of potassium hydroxide in a solution of pHiQ. At this time, an aqueous solution of nitric acid having a degree of indifference of 1% by mass was added to keep it at pH 10.0. After the precipitate was separated by filtration and/or washed, the precipitate was again dispersed in water to prepare 200 g of a tin hydroxide dispersion having a solid content of 20% by mass. Then, 3.2 g of a 85 mass% phosphoric acid aqueous solution was added to the dispersion and stirred for 30 minutes, and then spray-dried at a temperature loot to prepare a hydroxide powder of a phosphorus-doped tin oxide precursor. And the powder is dispersed in a concentration of 4.3 g of a potassium hydroxide aqueous solution of 140 g, and the powder is dispersed in a solution of 60 g of the potassium hydroxide solution. While maintaining the dispersion at 30 ° C—the surface was pulverized by a sand mixer for 3 hours to prepare a sol. Next, the sol was de-alkali treated with an ion exchange resin to a pH of 3.3 and added with pure water to prepare a concentration of 20 mass. % of phosphorus-doped tin oxide is fine to make conductive tracer (3) dispersion. & Conductive inorganic oxide fine particles (3) The pH of the dispersion is 3.6. At this time = 1: no propionate fine particles (3) The average particle size is 8 (10). Next, the amount of the conductive inorganic oxide 323138 34 201204773 fine particle (3) dispersion is adjusted to 25 ° C, and then added to 3. 5g of 4 Oxy decane (manufactured by Tama Chemical Co., Ltd.: ethyl ortho-nonanoate, Si〇2 concentration: 28.8% by mass), and then stirred for 3 minutes. Then, 100 g of ethanol was added in a minute, and 3 〇 was added. The temperature was raised to 6 ° C in a minute and heat treated for 12 hours. The concentration is mass%. Thereafter, the ultrafiltration membrane is used to disperse the solvent water and the ethanol is replaced by the solvent of ethanol. The organic ruthenium compound having a solid content concentration of 20% by mass is chain-linked and surface-treated. The inorganic oxide fine particle (3) dispersion liquid, wherein the number of the primary particles of the chain-like conductive inorganic oxide fine particles (3) formed is five. The chain-shaped conductive inorganic oxide fine particles (3) The refractive index is 1.74. (Preparation of the coating liquid (8) for forming a transparent film) The surface-treated chain-shaped conductive inorganic oxide fine particles (3) dispersion and 100 μg of a solid content of 100% by mass 8 g of ethylene oxide modified acrylic resin (manufactured by Nippon Shinkensei Chemical Co., Ltd.: NK Ester ATM-4E, resin concentration: 100% by mass), and 72 g of non-modified acrylic resin (manufactured by Kyoritsu Chemical Co., Ltd.): LIGHT-ACRYLATE DPE-6A, a resin concentration of 100% by mass), 14.4 g of a photoinitiator (manufactured by ci本ciba specializing company: Irgacurel 84) and 188 g of acetone as a ketone solvent, 53 g of methyl ethyl Ketone, and After sufficiently mixing, a coating liquid for forming a transparent film having a solid content concentration of 40% by mass was prepared. (Preparation of a substrate (8) having a transparent film) In Example 1, except that a coating for forming a transparent film was used. A substrate (8) having a transparent film was prepared by the same operation except for the liquid (8). The film thickness of the film was 5/zm. The substrate to which the transparent film was attached was prepared ( 8) The total light transmittance, the haze, the refractive index of the film, the adhesion, the pencil hardness, the coloring, the interference fringes, the dispersion state of the chain particles, and the scratch resistance are as shown in the table. [Example 9] (Preparation of the substrate (9) with a transparent film) The coating liquid for forming a transparent film (3) produced in the same manner as in Example 3 was used in a TAC film (manufactured by PANAC, Japan: FT-PB80UL- M, thickness: 80 / / m 'refractive index: 1. 5) coated by bar coating method (#4 rod), and then dried at 80 ° C for 120 seconds, then irradiated with ultraviolet light of 300 mJ / cm 2 It is hardened 'modulated into a substrate (9) with a transparent film. The film thickness of the transparent film is 2 μm, and the total light transmittance, haze, refractive index of the film, adhesion, pencil hardness, coloration, interference fringe, and the like of the substrate (9) with the transparent film formed thereon. The dispersion state and scratch resistance of the braided particles are as shown in the table. [Example 10] (Preparation of substrate (10) with transparent beryllium) The coating liquid for forming a transparent film (3) produced in the same manner as in Example 3 was used in TAC film (manufactured by PANAC, Japan: FT-pB8) 〇UL_M, thickness: 8〇^m, refractive index: 1.5) coated by bar coating method (#20 rod), dried at 80C for 12 〇 second, and then irradiated with ultraviolet rays of 3〇〇mJ/cm2 It is hardened by irradiation to prepare a base material (10) with a transparent film. The film thickness of the transparent film was 10 /z m. The total light transmittance of the substrate (10) with the transparent film, 323138 36 201204773, the refractive index of the film, the bondability, the hardness of the pen, the coloration, the interference fringes, and the dispersion of the chain particles The state and scratch resistance are as listed in the table. [Example 11] (Preparation of the coating liquid (1) for forming a transparent film for anti-reflection) 6.5 g of cerium oxide-based fine particle dispersion (manufactured by Nippon Radiation Co., Ltd.: Slovakia 4320' particle refractive index) = 〇 新 新 新 20 20 20 20 丙 丙 丙 丙 丙 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 丙 1 1 1 1 1 1 1 1 1 1 1 1 1 1 Ester (manufactured by Kyoeisha Chemical Co., Ltd.: DPE-6A, solid concentration: 100% by mass) and 0.08 g of reactive eucalyptus for water-removing materials (manufactured by Shin-Etsu Chemical Co., Ltd.: X-22-174DX, solid concentration 1〇) 〇质量%) and 〇.〇9g of 1,6-hexanediol diacrylate (manufactured by Kyoeisha Chemical Co., Ltd.: LI GHT-ACRYLATE 1·6HX-A) and 0. 76g of photopolymerization start The agent (manufactured by Ciba, Japan: Irgacurel 84: dissolved in IPA to have a solid content of 10% by mass) is mixed with 70.66 g of isopropyl alcohol and 15. g of isopropyl alcohol to prepare a solid content concentration of 2.5% by mass. A coating liquid (1) for forming an antireflection transparent film. (Preparation of the base material (11) with a transparent film) The substrate (3) with a transparent film was prepared in the same manner as in Example 3, and the coating liquid (1) for forming an antireflection transparent film was used as a bar. The coating method (#3 rod) is applied, and after drying at 8 ° C for 120 seconds, it is hardened by irradiation with ultraviolet rays of 600 μm / m m 2 in an N 2 atmosphere to prepare an antireflection film. A substrate (11) with a transparent film attached thereto. The film thickness of the antireflection transparent film is 10 nm. 37 323138 201204773 The all-optical light, haze, reflectivity, refractive index of the film, adhesion, pencil hardness, interference, stray stripes, chain-like particles of the substrate (11) with the transparent film Dispersed state and scratch resistance are shown in the table. [Example 12] (Preparation of conductive inorganic oxide particles (12) dispersion liquid) Conductive inorganic oxide fine particles (1) dispersed at a concentration of 20% by mass prepared in the same manner as in Example 1 The solution was adjusted to muscle, and then added to 4.9 g of tetraethoxy decane (manufactured by Tama Chemical Co., Ltd., Japan, and the concentration of Si〇2 was 28% by mass) over 3 minutes, and then mixed for 3 minutes. Thereafter, 1 g of ethanol was added in 1 minute, and the temperature was raised to 50 C in 3 minutes, and heat treatment was carried out for 2 hours. The solid content concentration at this time was 15% by mass. Thereafter, the ultrafiltration membrane is used to disperse the water of the solvent and the ethanol is replaced by the solvent of the solvent to prepare a solid content concentration of 2 G% by mass. The surface of the organic Wei compound is dispersed by the conductive inorganic oxide fine particles (12). liquid. The conductive inorganic oxide fine particles (12) had an average particle diameter of 8 nm. The refractive index of the conductive inorganic oxide fine particles (11) is 1 · Μ. (Preparation of coating liquid (12) for transparent film formation) In Example 3, 'the conductive inorganic oxide fine particles surface-treated with an organic Wei compound at a solid content concentration of 15% by mass were used. 12) A coating liquid G2) for forming a transparent film which is prepared to have a solid content concentration % by the same operation as the dispersion. (Preparation of the base film (12) with a transparent film) In the same manner as in the case of using the coating liquid for forming a transparent film (12) 323138 38 201204773, the substrate having the transparent film was prepared in the same manner. (12). The film thickness of the transparent film was 5 / zm. The total light transmittance, haze, reflectance, refractive index of the film, adhesion, pencil hardness, coloration, interference fringes, dispersion state of chain particles, and the like of the substrate (12) with the transparent film formed thereon, The scratch resistance is shown in the table. The chain-shaped conductive inorganic oxide fine particles in the transparent film had an average particle diameter of 8 nm and a number of bonds of 3. [Comparative Example 1] (Preparation of coating liquid (R1) for forming a transparent film)

將100g之以如實施例1同樣操作調製.成之經表面處理 的鏈狀導電性無機氧化物微粒子(1)分散液與623g之聚胺 酯丙烯酸酯系紫外線硬化樹脂(日本DIC公司製造:UNIDIC 17-824-9,固形分濃度77質量%)、作為酮系溶劑之430g 之丙酮、121g之甲基乙酮充分混合,調製成固形分濃度為 40質量%之透明被膜形成用塗佈液(ri)。 (附有透明被膜之基材(R1)之調製) 在實施例1中,除了以透明被膜形成用塗佈液(R1)在 TAC 膜(日本 PANAC 公司製造:FT-PB80UL-M,厚度:8〇em, 折射率:1.5)上以棒塗法(#1〇棒)進行塗佈以外,以同樣 之操作’調製成附有透明被膜之基材(R1)。該透明被膜之 膜厚為5 // m。 該製成之附有透明被膜之基材(R1)之全光線透光度、 霧度、被臈之折射率、密接性、鉛筆硬度、著色、干擾條 紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。又,鏈 323138 39 201204773 狀粒子之分散狀態的S平估時之掃’描型電子顯微鏡照片如第 2圖所示。如第2圖所示’其粒子係形成凝集。 [比較例2 ] (透明被膜形成用塗佈液(R2)之調製) 將100g之以如比較例1同樣操作調製成之經表面處理 的鏈狀導電性無機氧化物微粒子(R1)分散液與288g之環 氧乙院改質丙稀酸系樹脂(曰本共榮社化學公司製造: LIGHT-ACRYLAH TMP-3E0-A,樹脂濃度 1〇〇 質量、192 g 之非改質丙烯酸系樹脂(日本共榮社化學公司製造:LIGHT_ ACRYLATEDPE-6A ’樹脂濃度1〇〇質量%)中,加入38. 4g之 光起始劑(日本Ciba特化公司製造:Irgacurel84)及568g 之異丙醇、160g之曱苯充分混合,調製成固形分濃度為4〇 質量%之透明被膜形成用塗佈液(2)。 (附有透明被膜之基材(R2)之調製) 在實施例1中,除了以透明被膜形成用塗佈液(R2)在 TAC 膜(日本 PANAC 公司製造:FT-PB80UL-M,厚度:80"m, 折射率:1.5)上以棒塗法(#2〇棒)進行塗佈以外,以同樣 之操作’調製成附有透明被膜之基材(R2)。該透明被膜之 膜厚為10 // m。 該製成之附有透明被膜之基材(R2)之全光線透光度、 霧度、被膜之折射率、密接性、鉛筆硬度、著色、干擾條 紋、鍵狀粒子之分散狀態、对擦傷性如表中所示。 [比較例3 ] (透明被膜形成用塗佈液(R3)之調製) 40 323138 201204773 將100g之以如比較例1同樣操作調製成之經表面處理 的鏈狀導電性無機氧化物微粒子(R1)分散液與48〇g之含 0H基之紫外線硬化樹脂二乙二醇二環氧丙基醚二丙烯酸酯 (曰本新中村化學工業公司製造:Nk 〇iig〇 EA-5821)中, 加入38· 4g之光起始劑(日本ciba特化公司製造:Irgacure 184)及568g之異丙醇、160g之乙基賽路蘇(ethyl cellosolve),並充分混合後’調製成固形分濃度為4〇質 量%之透明被膜形成用塗佈液(R3)。 (附有透明被膜之基材(R3)之製造) 在比較例1中,除了以透明被膜形成用塗佈液(R3)在 TAC 膜(日本 PANAC 公司製造:FT-PB80UL-M,厚度:80 /z m, 折射率:1.5)上以棒塗法(#10棒)進行塗佈以外,以同樣 之操作’調製成附有透明被膜之基材(r3)。該透明被膜之 膜厚為5以m。 該製成之附有透明被膜之基材(R3)之全光線透光度、 霧度、被膜之折射率、密接性、鉛筆硬度、著色、干擾條 紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [比較例4] (透明被膜形成用塗佈液(R4)之製造)100 g of the surface-treated chain-shaped conductive inorganic oxide fine particle (1) dispersion and 623 g of a polyurethane acrylate-based ultraviolet curable resin (manufactured by Nippon DIC Co., Ltd.: UNIDIC 17-) were prepared in the same manner as in Example 1. 824-9, a solid content of 77% by mass), 430 g of acetone as a ketone solvent, and 121 g of methyl ethyl ketone are sufficiently mixed to prepare a coating liquid for forming a transparent film (re) having a solid content concentration of 40% by mass. . (Preparation of the substrate (R1) with a transparent film) In the first embodiment, the coating liquid (R1) for forming a transparent film was used in a TAC film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness: 8) 〇em, refractive index: 1.5) The substrate (R1) having a transparent film was prepared by the same operation except that the coating was carried out by a bar coating method (#1 〇 bar). The film thickness of the transparent film was 5 // m. The total light transmittance, haze, refractive index of the bedding, the adhesion, the pencil hardness, the coloration, the interference fringes, the dispersion state of the chain particles, and the scratch resistance of the substrate (R1) with the transparent film formed thereon The sex is shown in the table. Further, the chain 323138 39 201204773 The state of the S-flattened state of the dispersed state of the particle is shown in Fig. 2 as shown in Fig. 2. As shown in Fig. 2, the particles form agglomerates. [Comparative Example 2] (Preparation of coating liquid (R2) for forming a transparent film) 100 g of the surface-treated chain-shaped conductive inorganic oxide fine particle (R1) dispersion prepared in the same manner as in Comparative Example 1 was used. 288g of epoxy epoxide modified acrylic resin (manufactured by Sakamoto Kyoritsu Chemical Co., Ltd.: LIGHT-ACRYLAH TMP-3E0-A, non-modified acrylic resin with resin concentration of 1〇〇, 192 g (Japan) Co., Ltd. manufactured by Kyoeisha Chemical Co., Ltd.: LIGHT_ACRYLATEDPE-6A 'resin concentration: 1% by mass%), 38.4 g of photoinitiator (manufactured by Ciba Specialty Chemical Co., Ltd.: Irgacurel 84) and 568 g of isopropyl alcohol, 160 g of The phthalic acid was sufficiently mixed to prepare a coating liquid for forming a transparent film (2) having a solid content concentration of 4% by mass. (Preparation of a substrate (R2) with a transparent film) In Example 1, except that it was transparent The coating liquid for coating film formation (R2) was applied by a bar coating method (#2 〇 bar) on a TAC film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness: 80 " m, refractive index: 1.5) , in the same operation 'modulated into a substrate (R2) with a transparent film. The film thickness of the film is 10 // m. The total light transmittance, haze, refractive index of the film, adhesion, pencil hardness, coloration, interference fringe of the substrate (R2) with the transparent film. The dispersion state of the key particles and the scratch resistance are shown in the table. [Comparative Example 3] (Modulation of coating liquid for forming a transparent film (R3)) 40 323138 201204773 100 g was prepared in the same manner as in Comparative Example 1. The surface-treated chain-shaped conductive inorganic oxide fine particle (R1) dispersion and 48 〇g of the UV-curable resin diethylene glycol diepoxypropyl ether diacrylate containing OH group (Sakamoto Shin-Nakamura Chemical Co., Ltd. Manufactured by an industrial company: Nk 〇iig〇EA-5821), 38. 4g of photoinitiator (made by Ribaacure 184, Japan) and 568g of isopropanol, 160g of ethyl serotonin (ethyl) After the cellosolve was sufficiently mixed, the coating liquid (R3) for forming a transparent film having a solid content concentration of 4% by mass was prepared. (Manufacture of substrate (R3) with a transparent film) In Comparative Example 1, In addition to the coating liquid for forming a transparent film (R3) on the TAC film (PANAC, Japan) The company manufactures: FT-PB80UL-M, thickness: 80 /zm, refractive index: 1.5), coated with a bar coating method (#10 bar), and the same operation is used to prepare a substrate with a transparent film ( R3) The film thickness of the transparent film is 5 m. The total light transmittance, haze, refractive index of the film, adhesion, pencil hardness, and coloration of the substrate (R3) to which the transparent film is formed. The interference fringes, the dispersion state of the chain particles, and the scratch resistance are as shown in the table. [Comparative Example 4] (Manufacture of coating liquid (R4) for forming a transparent film)

將l〇g之以如實施例1同樣操作製成之經表面處理的 鏈狀導電性無機氧化物微粒子(1)分散液與229g之環氧乙 烧改質丙烯酸系樹脂(日本新中村化學工業公司製造:NK Ester ATM-4E ’樹脂濃度100質量%)、I” g之非改質丙 烯酸系樹脂(日本共榮社化學公司製造:LIGHT-ACRYLATE 41 323138 201204773 DPE-6A’樹脂漠度議f量%)中,加入318g之光起始劑(日 本Ciba特化公司製造·· Irgacurel84)及作為酮系溶劑之 499g之丙酮、I41g之甲基乙酮,並充分混合後,調製成固 形分濃度為40質量%之透明被膜形成用塗佈液(R4)。 (附有透明被膜之基M(R4)之調製) 在實施例1中,除了以透明被膜形成用塗佈液(R4)在 TAC 膜(日本 PANAC 公司製造:FT-PB80UL-M,厚度:80 " m, 折射率.1. 5 )上以棒塗法(# 1 〇棒)進行塗佈以外,以同樣 之操作,調製成附有透明被膜之基材({?4)。該透明被膜之 膜厚為5 a m。 該製成之附有透明被膜之基材(R4)之全光線透光度、 霧度、被膜之折射率、密接性、鉛筆硬度、著色、干擾條 紋、鍵狀粒子之分散狀態、耐擦傷性如表中所示。 [比較例5 ] (透明被膜形成用塗佈液(R5)之調製) 將10Og之以如實施例1同樣操作調製成之經表面處理 的鏈狀導電性無機氧化物微粒子(1)分散液與48g之環氧 乙烷改質丙烯酸系樹脂(日本新中村化學工業公司製造:NK Ester ATM-4E ’樹脂濃度質量%)、32g之非改質丙稀 酸系樹脂(日本共榮社化學公司製造:LIGHT-ACRYLATE DPE-6A,樹脂濃度100質量中’加入6.4g之光起始劑(曰 本Ciba特化公司製造:Irgacurel84)及作為酮系溶劑之 62g之丙酮、18g之曱基乙酮並充分混合,調製成固形分濃 度為4〇質量%之透明被膜形成用塗佈液(R5)。 323138 42 201204773 (附有透明被膜之基材(K5)之調製) 除在實施例1中,除了以透明被臈形成用塗佈液(R5) 在TAC膜(日本PANAC公司製造:FT-PB80UL-M,厚度: 80/z m,折射率:1· 5)上以棒塗法(#ι〇棒)進行塗佈以外, 以同樣之操作,調製成附有透明被膜之基材(R5)。該透明 被膜之膜厚為5// m。 該製成之附有透明被膜之基材(R5)之全光線透光度、 霧度、被膜之折射率、密接性、錯筆硬度、著色、干擾條 紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [比較例6 ] (導電性無機氧化物粒子(R1)分散液之調製) 將130g之錫酸卸及3〇g之酒石酸錄鉀溶於4〇〇g之純 水中製成其混合溶液。此製成之溶液再於12小時内、60 °c、攪拌下,加入溶解1〇g之硝酸銨及12g之15%氨水之 1000g之純水中進行水解。此時,同時添加1〇%硝酸溶液使 其保持在PH8. 8。再過濾分離洗淨其中生成之沉澱物後, 再次將其分散於水中,製成固形分濃度20質量%之金屬氧 化物前驅物氫氧化物分散液。 該分散液再於l〇〇°C下喷霧乾燥,調製成金屬氧化物 前驅物氫氧化物粉體。該粉體再於空氣下,經55(TC加熱 處理2小時,製成Sb摻雜氧化錫(ΑΤΟ)粉末。再取60g之 該粉末分散於14〇g之濃度4.3質量%之氫氧化鉀水溶液 中並面保持分散液在30。〇—面以混砂機粉碎3小時而 調製成溶膠。 323138 43 201204773 其次’該轉再⑽子錢飽旨崎簡處 為3.0,調製成濃度20質量%之Sb摻雜氧化錫微^ 之導電性微粒子(1)分散液。該導電性 了 分敎液之州·2。帽她無機 之平均粒徑為20nm。 、) 微位^將^之濃度為Μ質量%之導電性無機氧化物 微粒子(IV刀散液調至25。(;,再以3分鐘加入4 %之四乙 氧石夕烧(日本多摩化學公司製造:正石夕酸乙醋、s 心質量%)後,難3〇分鐘。之後再以u鐘加入= 之乙醇’並以30分鐘昇溫至5〇,進行過熱處理i5小時。 此時之固形分濃度為15質量%。 其後再經超濾膜使其分散溶劑之水及乙醇取代為溶劑 之乙醇並同時進行濃縮’調製成固形分濃度為20質量%之 以有機矽化合物經鏈狀化及表面處理之鏈狀導電性無機氧 化物微粒子(R1)分散液。在導電性無機氧化物微粒子(R1) 中看不到鏈狀之連結。該導電性無機氧化物微粒子(Ri)之 折射率為1. 74。 (透明被膜形成用塗佈液(R6)之調製) 在l〇〇g之固形分濃度為20質量%之經表面處理的導電 性無機氧化物微粒子(R1)分散液及48g之環氧乙烧改質丙 烯酸系樹脂(曰本新中村化學工業公司製造:Nk Ester ATM-4E,樹脂濃度1〇〇質量%)、32g之非改質丙烯酸系樹 脂(日本共榮社化學公司製造:LIGHT-ACRYLATE DPE-6A, 樹脂濃度100質量%)中,加入6 4g之光起始劑(曰本Ciba 44 323138 201204773 特化公司製造:IrSacure184)及作為酮系溶劑之62g之丙 酮以及18g之甲基乙酮’並充分混合後,調製成固形分濃 度為40質量%之透明被膜形成用塗佈液(R6)。 (附有透明被膜之基材(R6)之調製) 在實施例1中,除了使用透明被膜形成用塗佈液(R6) 在TAC膜(日本PANAC公司製造:FT-PB80UL-M,厚度: 80/zm’折射率.1.5)上以棒塗法(#1〇棒)進行塗饰以夕卜, 以同樣之操作,調製成附有透明被膜之基材(狀)。該透明 被膜之膜厚為5/zm。該製成之附有透明被膜之基材(R6)之 透光度、霧度、被膜之折射率、密接性、錯筆硬度、著色、 干擾條紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [比較例7 ] (鏈狀導電性無機氧化物粒子⑺幻分散液之調製) 於800g之純水中溶解有25g之苛性鉀(日本旭玻璃公 司製造:純度85質量%)之溶液中懸浮5〇g之三氧化銻(曰 本住友鑛山公司製造:〇,純度98·5質量%)。該懸浮液再 加熱至=5°C ’之後再以9小時加入由15g之過氧化氯(日 本林純藥公司製造:特級’濃度35質量。/。)以50g之純水稀 釋之水溶液’使該三氧化錄溶解,之後再熟成u小時。在 其冷卻後’自該製紅额取$ _g,該溶㈣以難g 之純水稀釋後,以陽離子交換樹脂(日本三菱化學公司製 造:處理使其pH成為3. 5之方式進行脫離子。脫 離子後該製成之料胁耽下誠1G ]、時,再經超遽 膜濃縮’調製成由固形分濃度為14質量%之五氧化銻所成 323138 45 201204773 之導電性鮮子分錄。科電性齡子分舰 4.0,導電性微粒子之平均粒後為2_。 為 ”人’將1GGg之該導電性微粒子分散液調為25eC, 再以3分鐘加人❿之四乙氧魏(日本多摩化學公司製 造·正石夕酸乙醋、⑽2濃度為28.8質量%)後,攪拌3〇分 鐘。錢再以1分鐘加入_之乙醇,並以30分鐘昇溫 至50C,進行過轨處理iq , + 質量%。時。此時之固形分漢度為7 其後再經超渡膜使其分散溶劑之水及乙醇取代為溶劑 之乙醇同進仃濃縮’調製成固形分濃度為別質量%之以 有機石夕化合物㈣狀化及表⑽理之鏈狀導f性無機氧化 物微粒子(R2)分散f構成鏈狀導電性無機氧化物微粒子 (R2)之-次粒子的平均連結數為5個。該鏈狀導電性益機 氧化物微粒子(R2)之折射率為丨,65。 (透明被膜形成用塗佈液(R7)之調製) 在100g之固形分濃度為2〇質量%之經表面處理的鏈狀 導電性無機氧化物微粒子(R2)分散液及288g之環氧乙烷 改質丙烯酸系樹脂(日本新申村化學工業公司製造:NK Ester ATM-4E ’樹脂濃度100質量%)、I92g之非改質丙烯 酸系樹脂(日本共榮社化學公司製造:LIGHT-ACRYLATE DPE-6A,樹脂濃度100質量%)中,加入38.4g之光起始劑(曰 本Ciba特化公司製造:Irgacurel84)及作為酮系溶劑之 568g之丙酮、i6〇g之甲基乙酮,並充分混合後,調製成固 形分濃度為40質量%之透明被膜形成用塗佈液(R7)。 46 323138 201204773 (附有透明被膜之基材(R7)之調製) 在實施例1中,除了使用透明被膜形成用塗佈液(R7) 在TAC膜(日本PANAC公司製造:FT-PB80UL-M,厚度: 80从m,折射率:L5)上以棒塗法(#1〇棒)進行塗佈以外, 以同樣之操作,製成附有透明被膜之基材(R7)。該透明被 膜之膜厚為5 /z m。 該製成之附有透明被膜之基材(R7)之全光線透光度、 霧度、被膜之折射率、密接性、鉛筆硬度、著色、干擾條 紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。 [比較例8] (鏈狀導電性無機氧化物粒子⑺幻分散液之調製) 3將100g之以如實施例丨同樣操作調製成之濃度為2〇 質量/0之導電性無機氧化物微粒子(1)分散液調為烈它,再 以3分鐘加入6.9g之四乙氧矽烷(日本多摩化學公司製 j .正矽酸乙酯、Si〇2濃度為28 8質量%)後,攪拌3〇分 釦。之後再以1分鐘加入100g之乙醇,並以30分鐘昇溫 至5(TC,進行過熱處理15小時。此時之固形分濃度為^ 質量%。 其後再經超濾膜使其分散溶劑之水及乙醇取代為溶劑 之乙醇同時進行濃縮,調製成固形分濃度為20質量%之以 有機石夕化合物經鏈狀化及表面處理之鍵狀導電性無機氧化 物微粒子⑽分散液。其中可知構成雜導電性無機氧化 物微粒子(R3)之一次粒子為部分連結但幾乎為單分散之狀 態。該鏈狀導電性無機氧化物微粒子(R3)之折射率為丨.73。 323138 47 201204773 (透明被膜形成用塗佈液(R8)之調製) 將100g之固形分濃度為2〇質量%之經表面處理的鏈狀 導電性無機氧化物微粒子⑽)分散液及623g之紫外線硬 化树月曰(日本DIC公司製造:UNIDIC 17-824-9,固形分濃 度77質量%)、作為酮系溶劑之43〇g之丙酮、uig之甲基 乙酮充分混合,調製成固形分濃度為4〇質量%之透明被膜 形成用塗佈液(R8)。 (附有透明被膜之基材(R8)之調製) 在實施例1中,除了以透明被膜形成用塗佈液(R8)在 TAC 膜(日本 PANAC 公司製造:FT-PB80UL-M,厚度·· 8〇vm, 折射率.1. 5)上以棒塗法(# 1 〇棒)進行塗佈以外,以同樣 之操作,調製成附有透明被膜之基材(R8)。該透明被膜之 膜厚為5# m。 該製成之附有透明被膜之基材(R8)之全光線透光度、 霧度、反射率、被膜之折射率、密接性、鉛筆硬度、著色、 干擾條紋、鏈狀粒子之分散狀態、耐擦傷性如表中所示。 48 323138 201204773 濃度 質量X S S s S S s s S s S s s S s S s s s S s 拽 S S s S 匾 苗 9ί s 9 s 琢 S af 坩 s s s S s (0 ο 〇 〇 〇 ο B- Ο o Ο o κ) O 铨 ο o o O o 頃 珀 硪 确 蜗 确 蝤 珀 确 珀 珀 难 硪 砩 «1 B- B- B- Β- Β- β> β- B- fi- B- »- B- β- B- s- B- 5~ s S i £ S s~ K s 宝 ο 〇 S s € « « « «: nc « « « « « £ Qu « c « « ac CM 〇 ο -¾1 •v eo o «· <〇 〇〇 eo e*5 ai « (Ο eo CO* η eo eo (D CO eo* CO 〇θ CO oo CO eo eo M αο e*3 〇6 η σ> eo c4 « eo rt oo eo eo e*a e S s s s s s s s s s s 〇 S 〇 s s s s s 8 〇 S o ο ο ο ο e o o o c> e 写 〇 o o o o c> 4 Μ S 另 3 另 η 14.4 茺 罟 茭 另 涅 oo 苈 芑 苈 lA in in* id ΙΓ» (A in IT) ee n IT) 〇〇 CQ irt c*i in in uS Cd e e e e a e cn & O) « i改質丙烯故 樹脂(B) 1 IGHT-ACRYU DPE-6A [CHT-ACRYU DPE-6A [GiTr-ACRYU' DPE-6A :CHT-ACRYLA' DPE-6A GHT-ACRYU' DPE-6A GHT-ACRYU' DPE-6A CHT-ACRYU· DPE-6A CffT-ACRYU* DPE-6A LIGHT-ACRYU* DPE-6A GHT-ACRYU* DPE-6A CffT-ACRYLA, DPE-6A 荔 oo t— 〇 o CHT-ACRYU1 DPE-6A !fll CHT-ACRYLA1 DPE-6A GHT-ACRYU! DPE-6A GBT-ACRYU1 DPE-6A GHT-ACRYU1 DPE-6A 荔 oo P- o 〇 τ». ·_] mi mJ m 3 M «-> " 3 3 设 A _ S s S <〇 ή s g «〇 s S s S s SS 0Ί S g s s «f η CO CM « « csa « N eo Cs» eo CM « CS) « ΡΊ eo 0Ί S3 σ» CJ C*5 CM CO C4 龙 3 輙鵡 钵璉 Ik貊 _埋 抹@ 隹埋 !(庙 钵铟 挺埋 对$ «55 am a每 运u& urn $ <0铒 挺裔 赵丧 妓丧 域成 挺掩 0¾ 〇铒 tJ锸 Ofif «Stf 〇« 〇« 0话 〇银 κ)铒 tO铒 0 1st tO铒 β爱 政龙 «f致 «ί^ rf费 ef费 <#« *f梦 «f杳 我 谷龙 故笨 故贫 8? «?€ WHC 费《 费《 1?« «?« tf « « tf c a?« _ S CO to «ο αο ο (O CO ο (Ο to to CO eo «〇 <〇 ο co cO CO « Μ V o eo ΰ5·Η m in in m m in m in m m in m m m in in m in e 革 & 屮 β 9 理 雄 铒 涵 铒 a i8 留 珥 讶 筠 鉀 9 通 S3 S 9 廉 Ο Ο Ο Ο Ο ΚΪ o o Ο »0 Ο 〇 «0 〇 •0 〇 Ο o O 〇 Μ et 8 ϋ Et Β et B 9 Β s Β s a S s B 9 Bt Q 吞 « 甸 曾 铒 铒 铒 铒 铒 铒 铒 铒 切 铒 甸 ϋ Λ) k Μ «ί Ηί Hi Μ Hi Μ Hi «1 «1 U C4 « 〇 e ο o ο o e 〇 ο 〇 e e m * 杯势 1总目 耷屮§ eo CO 00 eo eo eo 00 β〇 αο oc 00 eo oo αο oo eo eo s S OO S g P g P g P p ο Ρ rf; 5 £ g s 5 5 i 1 § £λ i — N η ” m <〇 卜 ee 〇} o — CS] C4 CO in co 卜 CO 本 5 本 5 5 5 5 s s X 本 5 在 在 鸯 诔 鸯 楗 紫 « Vi V «! V K 1« *C a if •a 49 323138 201204773 % V es 柘 «f £ 3S 珐 t 〇 〇 ◎ Ο ◎ ◎ ◎ ◎ 〇 ◎ @ ◎ 〇 < < 〇 ◎ 〇 〇 〇 妨 V m $ 芑 茺 芑 ea s ca m B3 η XI 邾 & ◎ ◎ ◎ ◎ ◎ @ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ 〇 ◎ ◎ 〇 ® ◎ a « ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ 〇 ◎ ◎ X 〇 ◎ ◎ 4} ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ o ◎ ◎ X X ◎ Ο 屮 1 松 挺 襄 φ ◎ ◎ ◎ ◎ 〇 Ο 〇 〇 ◎ ◎ ◎ 〇 X X < 〇 〇 X 〇 〇 a* 〇 CJ 〇 CM e o’ CM 〇 CM e « o CM 〇 d CM Ο Ξ C>J o o in o CM e ο CM 〇 奇 o ο CM Ο 热· «ί 1 1 1 1 1 1 1 ! 1 1 O 1 1 t 1 1 1 1 1 1 » in C4 σι m C4 〇) lA C4 σ> «η u m ύ 却 eo ci σ> 1/) tf-i a* 00 e^i 01 in s o s cj 〇» CM 5 o ci α» eo csi σ> l〇 〇0 GO o σ» 00 ο* C4 〇> V CN) σ> 扭 % S' G β S S s β X β s & β 'x 1 |x o X o s "〇 s o :Ξ o |x -Μ =〇 •Μ =Ξ 史j 呤 S5 m m in if> «η LT5 in in CJ o in m iti o u? in m in 苗 e ο o o s o Ο e O o o o o o o o ο 爸 o o ο ο 茑 右 S s g s S s s s S s s g s s S S « 济 在 右 写 s s s s s s s s s s s g s S S -* c〇 03 茬 s s 芑 s s s 臣 芑 罟 茬 罟 苗 罟 m σ> σ» s 茬 % 茬 屮 想 珀 碁 « tl 咖 挺 许 ? JJ je· ? je· s ? JJ s: ? S Λ Μ 龙 m = C9 o o CM e o o o = o CO 罅屏 Q K* « w a κ· € W 崃屏 Ξ K· ο € IV 路逋 m if « w m^s 贫进 ιη Ξ Κ* *»« 体*» Ό· CM e o V rj· Tf rf m ο S τΤ φ « 霉 与 g s s s s S s s s s s g s s s s S s S S 8 * u u u o u g 写 本 CM κ eo 本 ¥ m *κ te t— I* 0Θ 5 雀 4χ CO 在 1« o 本 1 V c^t 本 «« Ϊ « c^» 本 ά CO 本 ^· Si ά m ii «ο « r— £ β 00 « 50 323138 201204773 【圖式簡單說明】 第1圖係呈示實施例1之粒子的分散狀態之掃描型電 子顯微鏡照片。 第2圖係呈示比較例1之粒子的分散狀態之掃描型電 子顯微鏡照片。 【主要元件符號說明】 無。 51 323138The surface-treated chain-shaped conductive inorganic oxide fine particle (1) dispersion prepared in the same manner as in Example 1 and 229 g of the epoxy-baked modified acrylic resin (Nippon Nakamura Chemical Industry Co., Ltd.) Manufactured by the company: NK Ester ATM-4E 'resin concentration 100% by mass), I" g non-modified acrylic resin (manufactured by Kyoritsu Chemical Co., Ltd.: LIGHT-ACRYLATE 41 323138 201204773 DPE-6A' resin inferiority f In amount %), 318 g of a photoinitiator (manufactured by Ciba Specialty Chemical Co., Ltd., Irgacurel 84, Japan), 499 g of acetone as a ketone solvent, and methyl iodide of I41 g were added and thoroughly mixed to prepare a solid concentration. 40% by mass of the coating liquid (R4) for forming a transparent film. (Preparation of the base M (R4) with a transparent film) In the first embodiment, the coating liquid (R4) for forming a transparent film is used in TAC. The film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness: 80 " m, refractive index: 1.5) was coated with a bar coating method (#1 crowbar), and the same operation was carried out to prepare a substrate with a transparent film ({?4). The film thickness of the transparent film is 5 Am. The total light transmittance, haze, refractive index of the film, adhesion, pencil hardness, coloration, interference fringes, dispersion state of the bonding particles, and resistance of the substrate (R4) with the transparent film The abrasion resistance is as shown in the table. [Comparative Example 5] (Preparation of coating liquid for forming a transparent film (R5)) 10Og of the surface-treated chain-shaped conductive inorganic oxide prepared by the same operation as in Example 1 Microparticles (1) dispersion and 48 g of ethylene oxide modified acrylic resin (manufactured by Nippon Shinkensin Chemical Co., Ltd.: NK Ester ATM-4E 'resin concentration mass%), 32 g of non-modified acrylic resin (Manufactured by Kyoritsu Chemical Co., Ltd.: LIGHT-ACRYLATE DPE-6A, resin concentration of 100% by adding 6.4 g of photoinitiator (manufactured by Ciba Special Chemical Co., Ltd.: Irgacurel 84) and 62 g of acetone as a ketone solvent 18 g of decyl ethyl ketone was mixed well to prepare a coating liquid for forming a transparent film (R5) having a solid content concentration of 4% by mass. 323138 42 201204773 (Modulation of a substrate with a transparent film (K5)) Except in Example 1, except that The coating liquid for forming a beryllium (R5) was applied by a bar coating method (#ι〇棒) on a TAC film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness: 80/zm, refractive index: 1.5) In the same manner as in the coating, a substrate (R5) having a transparent film was prepared in the same manner. The film thickness of the transparent film was 5 / m. The total light transmittance, haze, refractive index of the film, adhesion, mis-hardness, coloration, interference fringes, dispersion state of chain-like particles, and scratch resistance of the substrate (R5) with the transparent film formed thereon The sex is shown in the table. [Comparative Example 6] (Preparation of conductive inorganic oxide particle (R1) dispersion) 130 g of stannic acid was discharged and 3 g of potassium tartrate was dissolved in 4 g of pure water to prepare a mixed solution. The resulting solution was further hydrolyzed by adding 1 g of ammonium nitrate and 12 g of 15% aqueous ammonia in 1000 g of pure water under stirring at 60 ° C for 12 hours. 8。 At this time, the addition of 1%% nitric acid solution to maintain it at pH 8.8. Further, the precipitate formed therein was washed and separated, and then dispersed again in water to prepare a metal oxide precursor hydroxide dispersion having a solid content concentration of 20% by mass. The dispersion was further spray-dried at 10 ° C to prepare a metal oxide precursor hydroxide powder. The powder was further heated under air for 5 hours by TC to prepare Sb-doped tin oxide powder. 60 g of the powder was dispersed in 14 g of a 4.3% by mass aqueous potassium hydroxide solution. The middle side keeps the dispersion liquid at 30. The 〇-surface is pulverized by a sand mixer for 3 hours to prepare a sol. 323138 43 201204773 Next, the 'transfer' (10) sub-sufficiency is 3.0, and the concentration is 20% by mass. Sb-doped tin oxide micro-electrode fine particle (1) dispersion. This conductivity is the state of the bifurcation liquid. 2. The average particle size of the cap inorganic is 20 nm. % by mass of conductive inorganic oxide fine particles (IV knife dispersion liquid is adjusted to 25. (;, then add 4% of tetraethoxy oxysulfide in 3 minutes (made by Japan Tama Chemical Co., Ltd.: Orthodox Ethyl Acetate, s After the heart mass%), it was difficult to make it for 3 minutes. Then, the ethanol was added in the u clock and heated to 5 Torr in 30 minutes, and the heat treatment was performed for 5 hours. The solid content concentration at this time was 15% by mass. The ultrafiltration membrane is used to disperse the solvent water and ethanol to replace the solvent as ethanol and simultaneously concentrate A dispersion of chain-like conductive inorganic oxide fine particles (R1) in which the organic cerium compound is chain-formed and surface-treated with a solid content concentration of 20% by mass is not obtained in the conductive inorganic oxide fine particles (R1). The refractive index of the conductive inorganic oxide fine particles (Ri) is 1.74. (Preparation of the coating liquid for forming a transparent film (R6)) The solid content concentration at 10 μg is 20% by mass. The surface-treated conductive inorganic oxide fine particle (R1) dispersion and 48 g of epoxy-baked modified acrylic resin (manufactured by Sakamoto Nakamura Chemical Co., Ltd.: Nk Ester ATM-4E, resin concentration 1 〇〇 mass %), 32 g of non-modified acrylic resin (manufactured by Kyoeisha Chemical Co., Ltd.: LIGHT-ACRYLATE DPE-6A, resin concentration: 100% by mass), and 64 g of photoinitiator (Sakamoto Ciba 44 323138 201204773) After the production of IrSacure 184) and 62 g of acetone as a ketone solvent and 18 g of methyl ethyl ketone', the coating liquid (R6) for forming a transparent film having a solid content concentration of 40% by mass was prepared. (with transparent film Preparation of substrate (R6) In Example 1, except that a coating liquid for forming a transparent film (R6) was used in a TAC film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness: 80/zm' refractive index. 1.5) The substrate was coated with a bar coating method (#1 〇 bar), and the substrate was coated with a transparent film in the same manner. The film thickness of the transparent film was 5/zm. Transparency, haze, refractive index of the film, adhesion, erroneous hardness, coloration, interference fringes, dispersion state of chain-like particles, and scratch resistance of the substrate (R6) with a transparent film produced Shown in . [Comparative Example 7] (Preparation of chain-shaped conductive inorganic oxide particles (7) Magic dispersion) In a solution of 25 g of caustic potash (manufactured by Nippon Asahi Glass Co., Ltd.: purity: 85 mass%), it was suspended in 800 g of pure water.三g of antimony trioxide (manufactured by Sumitomo Mining Corporation: 〇, purity 98.5% by mass). After the suspension was heated again to = 5 ° C ', an aqueous solution of 15 g of peroxidic chlorine (manufactured by Nippon Pure Chemical Co., Ltd.: special grade '35 mass%) diluted with 50 g of pure water was added for 9 hours. The trioxide record was dissolved and then matured for another u hours. After the cooling, the amount of the red is taken from the amount of the red, and the solution is dilute with a cation exchange resin (manufactured by Mitsubishi Chemical Corporation, Japan: treated to have a pH of 3.5). After the deionization, the material prepared by the deuterium is 1G], and then concentrated by the ultra-tanning film to prepare a conductive fresh sub-point of 323138 45 201204773 which is composed of pentoxide with a solid concentration of 14% by mass. Record. Kedian age sub-ship 4.0, the average particle size of conductive particles is 2_. For "human", 1GGg of the conductive fine particle dispersion is adjusted to 25eC, and then added to the human body for 4 minutes. (Made in Japan, manufactured by Tama Chemical Co., Ltd., and the concentration of (10) 2 is 28.8% by mass), and then stirred for 3 minutes. The money was added to the ethanol in 1 minute, and the temperature was raised to 50 C in 30 minutes to carry out the rail treatment. Iq , + mass %. At this time, the solid content is 7 and then the solvent is mixed with water and ethanol is replaced by solvent. % of the organic stone compound (four) and the chain (f) The machine oxide fine particle (R2) dispersion f constitutes the chain-like conductive inorganic oxide fine particles (R2), and the average number of the secondary particles is 5. The refractive index of the chain-shaped conductive oxide fine particles (R2) is丨, 65. (Preparation of coating liquid (R7) for forming a transparent film) 100 g of a surface-treated chain-shaped conductive inorganic oxide fine particle (R2) dispersion having a solid content concentration of 2% by mass and 288 g of Ethylene oxide modified acrylic resin (manufactured by Nippon Shinshomura Chemical Co., Ltd.: NK Ester ATM-4E 'resin concentration: 100% by mass), I92g of non-modified acrylic resin (manufactured by Kyoritsu Chemical Co., Ltd.: LIGHT -ACRYLATE DPE-6A, resin concentration: 100% by mass), 38.4 g of a photoinitiator (manufactured by Ciba Special Chemical Co., Ltd.: Irgacurel 84) and 568 g of acetone as a ketone solvent, methyl b of i6 g After the ketone was sufficiently mixed, a coating liquid for forming a transparent film (R7) having a solid content concentration of 40% by mass was prepared. 46 323138 201204773 (Modulation of substrate (R7) with transparent film) In Example 1 In addition to the use of transparent film formation Cloth liquid (R7) The same applies to the TAC film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness: 80 from m, refractive index: L5) by bar coating (#1 〇 bar). The substrate (R7) with a transparent film is formed, and the film thickness of the transparent film is 5 /zm. The total light transmittance, haze, and the substrate (R7) with the transparent film are prepared. The refractive index, adhesion, pencil hardness, coloring, interference fringes, dispersion state of chain-like particles, and scratch resistance of the film are shown in the table. [Comparative Example 8] (Preparation of chain-like conductive inorganic oxide particles (7) Magic dispersion) 3 100 g of conductive inorganic oxide fine particles having a concentration of 2 〇 mass / 0 prepared in the same manner as in Example ( 1) The dispersion was adjusted to be vigorous, and 6.9 g of tetraethoxy decane (manufactured by Natsu Chemical Co., Ltd., J. Orthodecanoic acid, Si〇2 concentration: 28% by mass) was added over 3 minutes, and then stirred for 3 Torr. Split. Then, 100 g of ethanol was added in 1 minute, and the temperature was raised to 5 (TC, and heat-treated for 15 hours in 30 minutes. The solid content concentration at this time was ^ mass%. Thereafter, the ultrafiltration membrane was used to disperse the solvent water. And ethanol, which is substituted with ethanol as a solvent, and concentrated to prepare a dispersion of a bond-like conductive inorganic oxide fine particle (10) having a solid content concentration of 20% by mass and a surface-treated and surface-treated organic stone compound. The primary particles of the conductive inorganic oxide fine particles (R3) are partially connected but almost monodispersed. The refractive index of the chain-shaped conductive inorganic oxide fine particles (R3) is 丨.73. 323138 47 201204773 (transparent film formation Preparation of Coating Liquid (R8) 100 g of a surface-treated chain-shaped conductive inorganic oxide fine particle (10) dispersion having a solid concentration of 2% by mass and 623 g of an ultraviolet hardening tree (Japanese DIC Corporation) Manufactured: UNIDIC 17-824-9, solid content concentration: 77% by mass), as a ketone solvent, 43 〇g of acetone, and uig methyl ethyl ketone are thoroughly mixed to prepare a solid concentration of 4 〇. % of the coating liquid for forming a transparent film (R8). (Preparation of the substrate (R8) with a transparent film) In the first embodiment, the coating liquid (R8) for forming a transparent film is used in a TAC film (manufactured by PANAC, Japan: FT-PB80UL-M, thickness·· A substrate (R8) having a transparent film was prepared in the same manner as in the case of coating with a bar coating method (#1 crowbar). The film thickness of the transparent film was 5 # m. The total light transmittance, haze, reflectance, refractive index of the film, adhesion, pencil hardness, coloration, interference fringes, dispersion state of chain particles, and the like of the base material (R8) to which the transparent film is formed, The scratch resistance is shown in the table. 48 323138 201204773 Concentration mass XSS s SS ss S s S ss S s S sss S s 拽SS s S 匾 seed 9ί s 9 s 琢S af 坩sss S s (0 ο 〇〇〇ο B- Ο o Ο o κ ) O 铨ο oo O o 顷 硪 硪 蜗 蝤 确 确 确 硪砩 硪砩 硪砩 « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « « - s- B- 5~ s S i £ S s~ K s 宝ο 〇S s € « « « «: nc « « « « « £ Qu « c « « ac CM 〇ο -3⁄41 •v eo o « · <〇〇〇eo e*5 ai « (Ο eo CO* η eo eo (D CO eo* CO 〇θ CO oo CO eo eo M αο e*3 〇6 η σ> eo c4 « eo rt oo eo Eo e*ae S ssssssssss 〇S 〇sssss 8 〇S o ο ο ο ο eooo c> e write 〇oooo c> 4 Μ S another 3 another η 14.4 茺罟茭 涅 oo 苈芑苈lA in in* id ΙΓ » (A in IT) ee n IT) 〇〇CQ irt c*i in in uS Cd eeeeae cn & O) « i modified propylene resin (B) 1 IGHT-ACRYU DPE-6A [C HT-ACRYU DPE-6A [GiTr-ACRYU' DPE-6A :CHT-ACRYLA' DPE-6A GHT-ACRYU' DPE-6A GHT-ACRYU' DPE-6A CHT-ACRYU· DPE-6A CffT-ACRYU* DPE-6A LIGHT-ACRYU* DPE-6A GHT-ACRYU* DPE-6A CffT-ACRYLA, DPE-6A 荔oo t— 〇o CHT-ACRYU1 DPE-6A !fll CHT-ACRYLA1 DPE-6A GHT-ACRYU! DPE-6A GBT- ACRYU1 DPE-6A GHT-ACRYU1 DPE-6A 荔oo P- o 〇τ». ·_] mi mJ m 3 M «->" 3 3 Set A _ S s S <〇ή sg «〇s S s S s SS 0Ί S gss «f η CO CM « « csa « N eo Cs» eo CM « CS) « ΡΊ eo 0Ί S3 σ» CJ C*5 CM CO C4 Dragon 3 輙 钵琏 钵琏 Ik貊_ 埋@ 隹 buried! (The temple indium is buried to the $ «55 am a every u & urn $ < 0 铒 裔 赵 Zhao 妓 妓 妓 成 03 03 03 03 ⁄ ⁄ ⁄ ⁄ fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi fi 〇银κ)铒tO铒0 1st tO铒β爱政龙«f致«ί^ rf费ef费&#39_*f dream«f杳我谷龙故笨故故穷8? «?€ WHC fee Fee "1? « «? « tf « « tf ca?« _ S CO to «ο αο ο (O CO ο (Ο to to CO eo «〇<〇ο co cO CO « Μ V o eo ΰ5·Η m in in mm In m in mm in mmm in in m in e leather & 屮β 9 铒雄铒 铒 a i8 珥 珥 筠 筠 9 9 9 9 9 9 9 3 oo 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 〇Ο o O 〇Μ et 8 ϋ Et Β et B 9 Β s Β sa S s B 9 Bt Q 吞 « 铒铒铒铒铒铒铒铒 铒铒铒铒铒铒铒铒 铒铒铒铒铒铒铒铒 铒 铒 Λ k k k ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί Hi Μ Hi «1 «1 U C4 « 〇e ο o ο oe 〇ο 〇eem * Cup potential 1 total goal § eo CO 00 eo eo eo 00 β〇αο oc 00 eo oo αο oo eo eo s S OO S g P g P g P p ο Ρ rf; 5 £ gs 5 5 i 1 § £λ i — N η ” m &l t;〇卜ee 〇} o — CS] C4 CO in co Bu CO 5 This 5 5 5 5 ss X This 5 is in 鸯诔鸯楗紫 « Vi V «! VK 1« *C a if •a 49 323138 201204773 % V es 柘«f £ 3S 珐t 〇〇 ◎ Ο ◎ ◎ ◎ ◎ 〇 ◎ @ ◎ 〇 << 〇 ◎ 〇〇〇 V m V m m 芑茺芑 ea s ca m B3 η XI 邾 &amp ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ X 〇 ◎ ◎ 4} ◎ ◎ ◎ ◎ 〇 〇 ◎ ◎ ◎ ◎ ◎ ◎ ◎ o ◎ ◎ XX ◎ Ο 屮 1 松 襄 襄 ◎ ◎ ◎ ◎ 〇Ο 〇〇 ◎ ◎ ◎ XX < 〇〇X 〇〇a* 〇CJ 〇CM e o' CM 〇CM e « o CM 〇d CM Ο Ξ C>J oo in o CM e ο CM 〇 o o ο CM Ο 热 · «ί 1 1 1 1 1 1 1 ! 1 1 O 1 1 t 1 1 1 1 1 1 » in C4 σι m C4 〇) lA C4 σ> «η um ύ but eo ci σ> 1/) tf-i a* 00 e^i 01 in sos cj 〇» CM 5 o ci α» eo csi σ> l 〇〇0 GO o σ» 00 ο* C4 〇> V CN) σ> %% S' G β SS s β X β s & β 'x 1 |xo X os "〇so :Ξ o |x -Μ=〇•Μ=Ξ史j 呤S5 mm in if> «η LT5 in in CJ o in m iti ou? in m in 苗 e ο ooso Ο e O ooooooo ο dadoo ο ο 茑 right S sgs S sss S ssgss SS « 济在右写 ssssssssssssgs SS -* c〇03 茬ss 芑sss 芑罟茬罟s nursery m σ> σ» s 茬% 茬屮想珀碁« tl 咖咖许? JJ je· ? je · s ? JJ s: ? S Λ Μ dragon m = C9 oo CM eooo = o CO 罅 screen QK* « wa κ· € W 崃 Ξ K· ο € IV 逋 m if « wm^s poor ιη Ξ Κ* *»«体*» Ό· CM eo V rj· Tf rf m ο S τΤ φ « Mold and gssss S ssssssssss S s SS 8 * uuuoug Write CM κ eo this ¥ m *κ te t— I* 0Θ 5雀 4χ CO in 1« o this 1 V c^t this «« Ϊ « c^» 本ά CO 本^· Si ά m ii «ο « r- £ β 00 « 50 323138 201204773 BRIEF DESCRIPTION OF DRAWINGS FIG formula 1 a scanning electron presented based particles of Example 1 of the embodiment dispersion state micrograph. Fig. 2 is a scanning electron microscope photograph showing the dispersed state of the particles of Comparative Example 1. [Main component symbol description] None. 51 323138

Claims (1)

201204773 七 1. 、申請專利範圍: 種透明被膜形成用塗佈液,其特徵為:包含導電性無 機氧化物微粒子、基體形成成分以及分散溶剩,其中之 導電性無機氧化物微粒子係以下述式⑴所禾之有機石夕 化合物進行表面處理而成者,且分散溶劑包含_,而 該塗佈液之總固形分之濃度在1至60質量%之範園;其 經表面處理之導電性無機氧化物微粒子為未凝集真形 成兩分散’其固形分之濃度在0.01至6質量%之範園; 其基體形成成分之固形分之濃度在01 i 59.4質责% 之範圍;且在製成之透明被膜中的導電性I機氧化物微 粒子可形成鏈狀構造; Rn-SiX4-„ ⑴ (式中’ R表^碳原子數丨至1G之非取代或取代之嫂 基’可互為相同亦可不同;X表示碳原子數1至4之烷 氧基i备基、齒素、氫;η表示〇至3之整數;)。 2· r申^利範圍第1項所述之透明被膜形成用塗佈 液级其中’前述導電性無機 =〇i?子及/或p摻雜氧化錫_微粒子= 千均粒徑在5至i0nro之範圍。 八 3. :申:二利岔圍第1或2項所述之透明被膜形成用塗佈 ⑽氧化物微粒子,為導電性無 之鍵狀導電性無機氧;=子3個以上連結形成鍵狀 4. 如申請專利範圍第1至3項中任—項所述之透明被膜形 323138 1 201204773 成用塗佈液,其十,前述基體形成成分為環氧烷改質丙 稀酸系樹脂(A )。 5. 如申請專利範圍第4項所述之透明被膜形成用塗佈 液’其中,前述環氧烷改質丙烯酸系樹脂(A)為環氧乙 烷改質丙烯酸系樹脂。 6. 如申凊專利範圍第1至5項中任一項所述之透明被膜形 成用塗佈液’其中,前述基體形成成分包含環氧燒改質 丙烯酸系樹脂(A)、同時又包含非改質丙婦酸系樹脂 (B),且非改質丙烯酸系樹脂(B)與環氧烷改質丙烯酸系 樹脂(A)之固形分之重量比((B) : (A))在5 : 95至50 : 50之範圍。 7. 如申请專利範圍第1至6項中任一項所述之透明被膜形 成用塗佈液,其中,前述分散溶劑之酮類,為由丙鋼、 曱基乙酮、曱基異丁酮、丁基曱酮、環己酮、曱基環己 鲷、二丙酮、甲基戊酮、二異丁酮、異佛爾酮、乙醯丙 酮、乙醯乙酸酯之中選擇之1種以上者。 8. 如申請專利範圍第7項所述之透明被膜形成用塗佈 液’其中’前述分散溶劑之酮類為丙酮及/或甲基乙酮。 9. 一種附有透明被膜之基材,其特徵為:包含基材及形成 在基材表面之透明被膜; 其中之透明被膜係包含導電性無機氧化物微粒子 及基體成分,而導電性無機氧化物微粒子係以下述式(1) 所示之有機石夕化合物進行表面處理而成,且該導電性無 機氧化物微粒子在透明被膜中構成鏈狀構造,且形成高 323138 2 201204773 分散; 透明被膜中之該導電性無機氧化物微粒子的含有 量在1至12質量%之範圍, 而透明被膜之表面電阻率在108至10uQ/sq.之範 圍’霧度為0.3%以下,全光線透光度為9〇%以上, 基材之折射率(Ns)與前述透明被膜之折射率(Nh)之 差為0· 02以下; 表示碳原子數1至1〇之非取代或取代之4 二且為相同亦可不同;X表示碳原子數1至4之; 氧無基、自素、氫;η表示〇至3之整數)。 10. 如申請專利範圍第q 中,前述導電性無^之/寸有透明被膜之基材,】 (ΑΤΟ)微粒子及/或 ^微粒子為Sb摻雜氧化查 摻雜氧化錫(PT0)微粒子,其 鍵狀構造之-絲子的平 于其· 連結數為3以上。 虹在5至lOnm之範圍, 11. 如申請專利範圍第q 材,其中,前述A所述之附有制被膜之邊 ⑷。 ▲體成分為環氧燒改質丙稀酸系樹用 12.如申請專利範圍第^ 其中’前述環氧烷改 質丙烯酸系樹脂。 項所述之附有透明被膜之基材, 質丙婦酸系樹脂⑷為環氧乙烧改 13.如申請專利範圍第 被膜之基材,其中 323138 3 201204773 丙烯酸系樹脂(B),而非改質丙烯酸系樹脂(B)與環氧烷 改質丙烯酸系樹脂(A)之固形分之重量比((B) : (A))在 5 : 95至50 : 50之範圍。 14. 如申請專利範圍第9至13項中任一項所述之附有透明 被膜之基材,其中,前述透明被膜之膜厚在1至20以m 之範圍。 15. 如申請專利範圍第9至14項中任一項所述之附有透明 被膜之基材,其中,前述基材為三乙醯纖維素。 16. 如申請專利範圍第9至15項中任一項所述之附有透明 被膜之基材,其中,前述透明被膜,係使用如申請專利 範圍第1至8項中任一項所述之透明被膜形成用塗佈液 所製成者。 4 323138201204773 VII. Patent application form: A coating liquid for forming a transparent film, comprising: conductive inorganic oxide fine particles, a matrix forming component, and a dispersion-dissolving, wherein the conductive inorganic oxide fine particles are represented by the following formula: (1) The organic stone compound of the group is surface-treated, and the dispersion solvent comprises _, and the total solid content of the coating liquid is in the range of 1 to 60% by mass; the surface-treated conductive inorganic The oxide microparticles are non-aggregated to form two dispersions, and the concentration of the solid fraction thereof is in the range of 0.01 to 6 mass%; the concentration of the solid component of the matrix-forming component is in the range of 01 i 59.4% by weight; The conductive I machine oxide fine particles in the transparent film can form a chain structure; Rn-SiX4-„ (1) (wherein R = ^ carbon atom number 丨 to 1G of unsubstituted or substituted thiol group) can be identical to each other It may be different; X represents an alkoxy group having 1 to 4 carbon atoms, dentate, hydrogen; η represents an integer of 〇 to 3;) 2· r申^利范围范围1 The transparent film formation described in item 1 Use coating liquid level where ' The above-mentioned conductive inorganic=〇i? and/or p-doped tin oxide_microparticles=the average particle diameter is in the range of 5 to i0nro. 八3.: Shen: The transparency described in item 1 or 2 of the second side The coated (10) oxide fine particles for film formation are bond-shaped conductive inorganic oxygen having no conductivity; and the three or more bonds are bonded to each other to form a bond. 4. The transparent material as described in any one of claims 1 to 3. The coating liquid of the film shape 323138 1 201204773, and the base forming component is an alkylene oxide-modified acrylic resin (A). 5. The coating for forming a transparent film according to item 4 of the patent application. In the present invention, the above-mentioned alkylene oxide-modified acrylic resin (A) is an ethylene oxide-modified acrylic resin. The transparent film formation according to any one of claims 1 to 5. In the coating liquid, the substrate forming component includes an epoxy-fired modified acrylic resin (A) and a non-modified acrylic acid-based resin (B), and the non-modified acrylic resin (B) The weight ratio of the solid content of the alkylene oxide-modified acrylic resin (A) ((B): (A)) is 5:95 to 50:5 The coating liquid for forming a transparent film according to any one of the first to sixth aspects of the present invention, wherein the ketone of the dispersion solvent is a propylene, a mercapto ketone or an anthracene. Selection of isobutyl ketone, butyl fluorenone, cyclohexanone, decylcyclohexanone, diacetone, methyl amyl ketone, diisobutyl ketone, isophorone, acetoacetone, acetamidine acetate 8. The coating liquid for forming a transparent film according to the seventh aspect of the invention, wherein the ketone of the dispersion solvent is acetone and/or methyl ethyl ketone. The substrate of the film is characterized by comprising a substrate and a transparent film formed on the surface of the substrate; wherein the transparent film comprises conductive inorganic oxide fine particles and a matrix component, and the conductive inorganic oxide fine particles are represented by the following formula ( 1) The organic cerevisiae compound is surface-treated, and the conductive inorganic oxide fine particles form a chain structure in the transparent film, and are formed to have a high dispersion of 323138 2 201204773; the conductive inorganic oxide in the transparent film Microparticle content The amount is in the range of 1 to 12% by mass, and the surface resistivity of the transparent film is in the range of 108 to 10 uQ/sq., the haze is 0.3% or less, and the total light transmittance is 9% by or more. The difference between the refractive index (Nh) of (Ns) and the transparent film is 0. 02 or less; the unsubstituted or substituted 4 2 of the carbon number is 1 and may be the same or different; X represents the number of carbon atoms To 4; oxygen-free, self-priming, hydrogen; η means 〇 to an integer of 3). 10. In the scope of the patent application, in the qth, the conductive substrate has no transparent film, and the microparticles and/or the microparticles are Sb-doped oxide-doped tin oxide (PT0) particles. The number of the filaments in the bond-like structure is equal to or greater than 3 or more. The rainbow is in the range of 5 to lOnm, 11. For example, the patent material is the qth material, wherein the side of the above-mentioned A is attached with the side of the film (4). ▲ The body composition is an epoxy-fired modified acrylic acid tree. 12. The above-mentioned alkylene oxide-modified acrylic resin. The substrate with a transparent film as described in the item, the propylene-glycolic acid resin (4) is an epoxy epoxide modification. 13. The substrate of the coating film of the patent scope, wherein 323138 3 201204773 acrylic resin (B), instead The weight ratio of the solid content of the modified acrylic resin (B) to the alkylene oxide-modified acrylic resin (A) ((B): (A)) is in the range of 5:95 to 50:50. The substrate having a transparent film according to any one of claims 9 to 13, wherein the film thickness of the transparent film is in the range of 1 to 20 m. The substrate with a transparent film according to any one of claims 9 to 14, wherein the substrate is triacetyl cellulose. The transparent film-attached substrate according to any one of claims 9 to 15, wherein the transparent film is used according to any one of claims 1 to 8. It is produced by a coating liquid for forming a transparent film. 4 323138
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