TW201137409A - Antiglare film and antiglare polarizing sheet - Google Patents

Abstract

The present invention provides an antiglare film and an antiglare polarizing sheet using the same, the antiglare film having a base film and an antiglare layer laminated on the base film and having a concave-convex surface, the base film containing an acrylic resin, the ratio H12/H22 of the energy spectrum H12 of altitude of the concave-convex surface at the space frequency of 0.01 μ m<SP>-1</SP> to the energy spectrum H22 at the space frequency of 0.04 μ m<SP>-1</SP> being within the range of 3 to 20, the ratio H32/H22 of the energy spectrum H32 at the space frequency of 0.1 μ m<SP>-1</SP> to the energy spectrum H22 being 0.1 or less, and the concave-convex surface containing 95% or more of planes having a tilting angle equal to or lower than 5 DEG.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anti-glare (antiglare) film and an anti-glare polarizing plate using the anti-glare film. [Prior Art]

An image display device such as a liquid crystal display, a plasma display panel, a cathode ray tube (CRT (Cathode Ray Tube)) display, or an organic electroluminescence (EL) display, when external light is mapped to the display surface Will significantly damage the viewing. In order to prevent such mapping of external light, in the case of TVs and personal computers that emphasize image quality, cameras and digital cameras that are used outdoors, and mobile phones that use reflected light for display, The surface of the image display device is provided with an anti-glare film for preventing the mapping of external light. For example, JP-A-2006-053371 discloses that a mold for a polished mold base is subjected to sandblasting, and then electroless nickel plating is applied to produce a mold having fine irregularities on the surface, and then a side is produced. The photocurable resin layer formed on the polyethylene terephthalate (Tac : Triacetyl Cellulose) is pressed against the uneven surface of the mold to be cured, whereby the mold is transferred onto the surface of the photocurable resin layer. Anti-glare film for uneven surface. SUMMARY OF THE INVENTION In addition to anti-glare properties, it is desirable for the anti-glare film to exhibit high contrast when disposed on the surface of the image display device, and to suppress scattered light when disposed on the surface of the image display device. Whitening the entire display surface to produce the so-called "whitening" of the liquid crystal display, and when it is disposed on the surface of the image display device, the pixel and the anti-glare film of the image display device can be suppressed. The surface uneven shape produces a so-called "flash spot" which interferes with the generation of a luminance distribution and is difficult to see. However, the anti-glare film described in the above-mentioned Japanese Patent Publication No. 2006-053371 is produced by using a mold which is formed into a concave-convex shape by sandblasting, so that the accuracy of the uneven shape formed on the anti-glare film is insufficient, and it is particularly possible. Since a relatively large uneven shape having a period of 50/m or more is produced, there is a problem that "flash spots" are likely to occur. Further, the antiglare film described in the same document is liable to cause damage, and is not necessarily sufficient from the viewpoint of mechanical strength. Further, the antiglare film described in the same document has insufficient moisture resistance, and when the antiglare film is bonded to a polarizing film, the polarizing film may be deteriorated by moisture absorption. Accordingly, it is an object of the present invention to provide an anti-glare film which can exhibit better anti-glare properties and exhibit good contrast, and can prevent deterioration of visibility due to "whitening" and "flash spots". And an anti-glare polarizing plate which is an anti-glare polarizing plate which is composed of a laminate of the anti-glare film and the polarizing film, and can effectively suppress deterioration of the polarizing film. . The present invention provides an anti-glare film comprising: a base film; and an anti-glare layer laminated on the base film and having an uneven surface, wherein the base film contains an acrylic resin; and the spatial frequency is 0.01# πΓ1 The ratio of the energy spectrum Hi2 of the elevation of the concave-convex surface to the energy spectrum Η22 of the elevation of the concave-convex surface in the spatial frequency 0.04# πΓ1 is in the range of 3 to 20; the spatial frequency is 0.1. From the energy spectrum Η32 of the elevation of the concave-convex surface in πΓ1 and the energy spectrum 标 of the elevation of the concave-convex surface in the spatial frequency 5 322870 201137409 rate 2 〇.04/zm, the ratio η&quot; 仏2 ' is oi or less; The uneven surface contains 95% or more of a surface having an inclination angle of 5 or less. The thickness of the base film is preferably 2 〇 ym or more and 1 〇〇 or less. Furthermore, the present invention provides an anti-glare polarizing plate comprising: the anti-glare film; and a polarizing film laminated on a surface of the base film opposite to the anti-glare layer. The anti-glare film of the present invention can exhibit better anti-glare properties and exhibit good contrast, and can effectively prevent deterioration of visibility due to the occurrence of "whitening" and "flash spots". Further, the antiglare film of the present invention is excellent in mechanical strength and moisture resistance. In the anti-glare polarizing plate of the present invention using the anti-glare film, deterioration of the polarizing film due to moisture absorption can be effectively suppressed. [Embodiment] &lt;Anti-glare film&gt; Fig. 1 is a cross-sectional view schematically showing an example of an anti-glare film of the present invention. The antiglare film of the present invention has a base film 1〇1 containing an acrylic resin and an antiglare layer 102 laminated on the base film 1〇1 as shown in the figure. The surface of the antiglare layer 1 to 2 opposite to the base film 1〇1 is composed of a fine uneven surface (fine uneven surface 1〇3). The antiglare film of the present invention will be described in more detail below. (Anti-glare layer) In the anti-glare layer 102 of the anti-glare film of the present invention, the energy spectrum Ηι2 and the spatial frequency of the elevation of the fine concave-convex surface 1〇3 in the spatial frequency of 0.011 are small (the fineness in Μβπτ1) The energy of the elevation of the bump surface 1〇3 is 2 ratio 322870 6 201137409

The Hi2/H22 ' is located in the range of 3 to 20, and the spatial frequency 〇. 1 is the energy spectrum of the energy spectrum Ha2 of the level of the fine uneven surface 103 in m_1 and the level of the fine uneven surface 103 of the spatial frequency of 0.04//^. The ratio of HJ is H32/H22, which is 0.1 or less. In the past, the period of the fine uneven surface of the anti-glare film is based on the average length RSm of the coarse sugar curve elements contained in jISB 0601, the average length PSm of the profile curve elements, and the average length wSm of the curved curve elements. Evaluation. However, in such conventional evaluation methods, it is not possible to correctly evaluate the plurality of periods included in the surface of the fine uneven surface. Therefore, the correlation between the speckle and the fine uneven surface and the correlation between the anti-glare property and the fine uneven surface cannot be correctly evaluated. Under the control of the values of RSm, pSm, WSm, etc., it is difficult to produce An anti-glare film with suppression of flash spots and sufficient anti-glare properties. The present inventors have found that in an anti-glare film having an anti-glare layer having a fine uneven surface and laminated on a base film containing an acrylic resin, the fine I convex surface exhibits the use of "the level of the fine uneven surface. The special (4) spatial frequency distribution of the energy spectrum, that is, the energy spectrum of the elevation is in the range of 3 to 20 in the range of 至2/仏2, and the anti-glare film of "2" is less than 1 and can be revealed. It has better anti-glare properties and prevents a decrease in visibility due to the generation of ubi-(4). Even when the high-definition image display device is in operation, no speckle is generated and high contrast can be exhibited. Day domain. :t illustrates the energy level of the fine uneven surface of the anti-glare film. The schematic diagram shows the surface of the anti-glare film of the present invention. FIG. 2 is a perspective view of the anti-glare system of the present invention. The anti-glare layer of the fine uneven surface composed of the fine 322870 7 201137409 unevenness 2. Here, the elevation of the surface of the fine uneven surface in the present invention means a virtual plane having the height at the lowest point of the fine uneven surface in any point on the surface of the anti-glare film 1 (the elevation plane) The linear distance of the main normal direction 5 (the normal direction of the imaginary plane) of the anti-glare film based on 0//Π1. As shown in Fig. 2, when the orthogonal coordinates in the plane of the anti-glare film are expressed by (x, y), the elevation of the fine concave-convex surface can be represented by the two-dimensional function h(x, y) of the coordinates (X, y). No. In Fig. 2, the surface of the entire anti-glare film is indicated by the projection surface 3. The elevation of the fine uneven surface can be obtained from three-dimensional information of the surface shape measured by a device such as a confocal microscope or an AFM (Atomic Force Microscope). The lower resolution energy required for the measuring machine is at least 5 to be 111 or less, preferably 2/m or less, and the other 'vertical decomposition energy is at least 〇. lym or less, preferably 0. 01/zm or less. A non-contact three-dimensional surface shape and roughness measuring machine suitable for the measurement is a New View 5000 series (manufactured by Zygo Corporation, available from Zygo Co., Ltd. in Japan), and a three-dimensional microscope PL# 2300 (manufactured by Sensofar Co., Ltd.) )Wait. Regarding the measurement area, since the decomposition energy of the energy spectrum of the elevation must be 0. Ol/ζπΓ1 or less, it is preferably at least 20 〇emx200 // m or more, and more preferably 500/z mx500 // m or more. Next, a method of obtaining the energy spectrum of the elevation from the two-dimensional function h(x, y) will be described. First, the two-dimensional function H(fx, fy) is obtained from the two-dimensional function h(x, y) by the two-dimensional Fourier transform defined by the following equation (1). Λ) ^ J fKx, y)^p[- +fyy)]^fy Equation (1) 8 322870 201137409: This '匕 and fy are the dimensions of the reciprocal of the spatial frequency system in the x direction and the y direction, respectively. Further, the rate f imaginary in the equation (1) is early. By squaring the obtained two-dimensional function H(fx, fy), the energy spectrum bamboo fx, fy) of the f-score can be obtained. This energy spectrum H2 (fx, w represents the spatial frequency distribution of the fine uneven surface of the anti-glare film. Hereinafter, a method for obtaining the energy spectrum of the level of the fine uneven surface of the anti-glare film will be more specifically described. The three-dimensional information of the actual surface shape of a focal microscope, an interference microscope, an atomic force microscope, etc. can generally be obtained as a discrete value, that is, an elevation corresponding to a plurality of measurement points. Fig. 3 shows a function of discretely obtaining an elevation value. h mode diagram: as shown in Fig. 3 (4), (4) (x, y) represents the thief_inside: the intersection mark, and the dotted line indicates the line divided by Δχ in the direction of the yaw axis on the projection surface 3 of the anti-glare film. And the line divided by Ay in the y-axis direction. 'In the actual measurement, the elevation of the fine uneven surface can be used as the discrete elevation of each intersection of each dotted line on the shirt face 3 of the anti-glare film. The value of the obtained elevation value is determined by the measurement range and as shown in Fig. 3, when the measurement range in the x-axis direction is χ = Μ Δ χ, and the measurement range in the y-axis direction is Y = NAy When the number of elevation values obtained is Μ+1)χ(Ν+1). As shown in Fig. 3, when the projection 4 of the projection point 3 on the projection surface 3 of the anti-glare film is shown as (j^X, k^y) (in Therefore, when j is 〇 or more and μ or less, and k is 〇 or more and N or less, the elevation of the point p on the surface of the anti-glare film corresponding to the point of view A can be expressed as h(j Ax, kAy). 9 322870 201137409 The measurement interval Δχ and the Ay system are dependent on the horizontal decomposition energy of the measuring device, and the fine uneven surface is evaluated for accuracy. As described above, Δχ and Δγ are preferably 5/zm or less, and more preferably 2em or less. The 疋 range X and γ are preferably all of the above, and more preferably 500 # m or more. Thus, in actual measurement, a function indicating the elevation of the fine uneven surface can be obtained as (M+l)x. Obtained by a discrete function h(x, y) of (N + 1) values. Therefore, by the discrete function h(x, y) obtained by the measurement and the discrete Fourier transform defined by the following formula (2), To obtain the discrete function H(fx, fy), and by squaring the discrete function fj(fx,fy), we can obtain the discrete function H2 of the energy spectrum (fx, fy^ in the formula (2) is —(3)+丨) The integer 'm of the above (MH)/2 or less is an integer of _(n+i)/2 or more (1)/2 or less. Further, Δ乜 and 匕 are the spatial frequency intervals in the χ direction and the y direction, respectively. It is defined by equations (3) and (4) respectively. It is equivalent to the horizontal decomposition energy of the energy spectrum of the elevation. &quot;(Ky )s + 】)(#+))石|^(/Δχ,Μ;/) Χρ[- 2m\jUsxisfx +km6ybfy\ (2)

(Λ^ + 1) Δχ (3) ¥y = (N+l)Ay Formula U) Figure 4 shows the anti-glare film of the present invention with a two-dimensional discrete function h(x, y) An example of a map of the elevation of the fine uneven surface of the glare layer. In Fig. 4, the elevation is expressed in terms of white and black gradations. Figure 4 shows the scatter function h(x, y) with 512x512 values, horizontal decomposition energy Δχ and Ay . 1.66 y m. % Fig. 5 is a diagram showing the energy spectrum H2(fx, fy) of the elevation obtained by discrete Fourier transform of the two-dimensional function h(x, y) shown in Fig. 4 in white and black gradation. . The energy spectrum H2(fx,fy) of the elevation shown in Fig. 5 is also a discrete function with 512x512 values, and the horizontal decomposition energy Δ and Δ of the energy spectrum of the elevation. It is 0.0012VHT1. As shown in Fig. 4, since the fine uneven surface of the antiglare layer provided in the antiglare film of the present invention is composed of randomly formed irregularities, the energy spectrum H2 of the standard south is as shown in Fig. 5. It is symmetrical with the origin as the center. Therefore, the energy spectrum of the elevation in the spatial frequency of 0.01 ynf1 can be obtained from the profile of the origin of the energy spectrum H2 (fx, fy) belonging to the two-dimensional function 2、! 2, the elevation of the spatial frequency of 0. 04 μ m_1 Energy spectrum (1) 2 and spatial frequency 〇. 1 The energy spectrum of the elevation in enf1 Η /. Fig. 6 is a view showing a cross section of f χ = 〇 in the energy spectrum H ( f X, f y ) shown in Fig. 5. It can be seen from Fig. 6 that the energy spectrum (1) 2 of the elevation in the spatial frequency of 0.01/zm-1 is 4.4, and the spatial frequency 〇〇4 has an energy spectrum 仏2 of the elevation of πΓ1 of 0.35, and the spatial frequency 〇. 1 The energy spectrum H32 of the elevation in enf1 is 〇· 00076, which is 14 for 2/%2 and 0.0022 for H32/H22. As described above, in the anti-glare film of the present invention, the ratio Hi2/H22 of the energy spectrum Hl2 of the level of the fine uneven surface in the spatial frequency O.Wyf and the energy spectrum HJ of the spatial frequency of 0.04^^ is set at 3 to 20 range. The ratio of the energy spectrum of the elevation is lower than that of the Hl2/H22, which indicates that the long-period irregular shape of 1 〇〇/zm or more contained in the fine uneven surface of the anti-glare layer is small, and 322870 11 201137409 is 25_ There are many irregular shapes in short cycles. The external light is not mapped, and sufficient anti-glare performance cannot be obtained. On the other hand, the ratio of the energy spectrum of the elevation h, VH22 is higher than 20, and it is shown that 3 of the fine uneven surface is longer than ' There are many irregularities in the period, and the uneven shape of the short period of 25 = m is less. At this time, when the anti-glare film is disposed in the south-fine image display device, there is a tendency to generate a flare. In order to show the anti-glare property of 2, the energy spectrum of the speckle level is more effectively suppressed, and the H2 #乂 is preferably in the range of 5 to 18, more preferably in the range of 8 to 15. Further, in the anti-glare film of the present invention, the ratio H32/H22 of the energy spectrum H32 of the level of the fine uneven surface in the spatial frequency G. 1^ and the space frequency L, which is the same as the same, is set at 〇 i or less, preferably 〇〇1 or less: less than H3/H22 ,", it is shown that the short period component of less than 10 _ contained in the surface of the fine uneven surface can be sufficiently reduced, thereby effectively Inhibit the generation of whitening. The three-cycle component 1 which is not contained in the fine uneven surface is not effectively miscible, and the light incident on the fine uneven surface is scattered to cause whitening. In the conventional anti-glare film described in the above-mentioned Japanese Patent Publication No. 2-053371, the energy spectrum Hl2 of the southmost surface of the fine uneven surface of the spatial frequency 〇〇1_^ and the spatial frequency of 0.04^ are used. The ratio of the ancient Γ Ηΐ ί 7 ί Ηΐ ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί The energy spectrum of the elevation is 仏. In this way, the anti-glare film having the fine embossed surface of the 322870 12 201137409 elevation of the surface of the ostrich 空间 空间 , 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被18._m below 18H does not have a pattern of maximum energy spectrum, and is ideally produced. Here, the "pattern" generally means that the silk is formed into a fine concavo-convex surface of the anti-glare film by a computer-made image data of a second-order tone (for example, "valued to white and black". ) or image data composed of gradations above the 3rd order, but may also contain data that can be converted into the image data in a single meaning - (in the order ##, etc.). It can be converted into image data in a single meaning. The data includes, for example, the coordinates of each pixel and the data of only the tone, etc. Thus, by using the spectrum which shows that the spatial frequency is larger than 〇 and that 〇·〇4 has a maximum value from m or less The pattern is formed to form a fine uneven surface of the anti-glare film, and the energy spectrum Hi of the elevation of the fine uneven surface in the spatial frequency 有效· can be effectively reduced, and the HiVH22 is set in the range of 3 to 20. Further, in order to obtain The ratio of the energy spectrum (1)2 of the elevation of the surface of the fine uneven surface in the spatial frequency 〇. to the energy spectrum 仏2 of the elevation in the spatial frequency of 0.04/ζπΓ1 is 2/!^ is 防. 1 below the anti-glare film of the fine uneven surface The energy spectrum of the aforementioned pattern is preferably The frequency is larger than γ and does not reach 〇. The maximum value is in the range of 1//ΠΓ 1. By using the pattern with such energy spectrum to form the fine concave and convex surface of the anti-glare film, the spatial frequency can be effectively increased. The energy spectrum m2 of the level of the fine uneven surface in 04 μ nf1 is set to be less than or equal to 1 Η 32/Η22. The method of forming the fine uneven surface of the anti-glare film using such a pattern is preferably used. A method of producing a mold having a concave-convex surface and transferring the uneven surface of the mold 322870 13 201137409 to the surface of the resin layer formed on the base film (embossing method). The inventors have found that anti-glare The fine uneven surface of the layer exhibits a characteristic oblique angle distribution, which can exhibit better anti-glare performance' and is more effective in preventing whitening. That is, in the anti-glare film of the present invention, the fine unevenness of the anti-glare layer The surface system contains 95% or more of the inclined angle of 5. The following surface. When the inclination angle of the fine uneven surface is 5. When the ratio of the surface below is less than 9 (10), the inclination angle of the uneven surface becomes steep, and the light from the surroundings is obtained. Collecting light' It is easy to cause a whitening phenomenon in which the entire display surface is whitened. In order to suppress the condensing effect to prevent whitening, the inclination of the surface of the fine uneven surface is preferably as high as possible, preferably 97% or more. Here, the "inclination angle of the fine uneven surface" in the present invention means the main normal direction with respect to the anti-glare film at any point p on the surface of the anti-glare film i with reference to Fig. 2 5' The angle (surface tilt angle) of the local normal 6 which is weighted by the unevenness at this point is 0. The inclination angle ' of the fine uneven surface is the same as the elevation, and can be obtained from three-dimensional information of the surface shape measured by a device such as a confocal microscope, an interference microscope, or an atomic force microscope (10). Fig. 7 is a schematic view for explaining a method of measuring the inclination angle of the fine uneven surface. When the specific tilt angle determining method is described, as shown in FIG. 7, it is first determined that the eye point A' on the virtual plane FG{n indicated by the broken line is near the eye point A on the X-axis passing through the point. The point MD is almost symmetric with respect to point a, and is near the point A of the Tongchong ky red (four) eye point 'points c and E which are almost symmetrical with respect to _ point A, 322870 14 201137409 at these points B, C, Points Q, R, S, and T on the anti-glare film surface of D and E. In Fig. 7, (x, y) denotes an orthogonal coordinate in the plane of the anti-glare film, and z denotes a coordinate in the thickness direction of the anti-glare film. The plane FGHI is a line parallel to the X-axis passing through the point C on the y-axis, and a line parallel to the X-axis passing through the point E on the y-axis, respectively, passing through the point B on the X-axis parallel to the y-axis. The straight line and the line formed by the straight line parallel to the y-axis of the point D on the X-axis and the intersections F, G, Η, and I. In addition, in Fig. 7, the position of the actual anti-glare film surface is drawn upward with respect to the plane FGHI, but of course, the actual anti-glare film surface can be made different depending on the position of the eye point A. Position above or below the plane FGHI. Regarding the tilt angle, the point p corresponding to the actual anti-glare film surface corresponding to the eye point A and the point corresponding to the point near the eye point A can be obtained from the three-dimensional information of the measured surface shape. Four points B, C, D, and E The four planes of the polygon formed by the total of five points Q, R, S, and τ on the anti-glare film surface, that is, four triangles? Hey,? The average normal vector obtained by averaging the normal vectors 6a, 6b, 6c, and 6d of the anti-fence, 15 nails, and 151^ (the average normal vector system and the local normal 6 of the 2nd s Synonymous) is obtained with respect to the polar angle of the main normal direction of the anti-glare film. After obtaining the tilt angle for each measurement point, the histogram is calculated. Fig. 8 is a graph showing a histogram of a histogram of the inclination angle distribution of the fine uneven surface of the antiglare layer provided in the antiglare film. In the graph shown in Fig. 8, the horizontal axis is the oblique angle and is divided by 〇. For example, the straight column of the leftmost = is a knife cloth whose inclination angle is located in the range of 〇 to 〇.^, and then the angle increases by 〇. 5 each time as it moves to the right. . No. 8 322870 15 201137409 In the figure, the lower limit value of the value of every two scales of the horizontal axis is shown. For example, the portion ' of the horizontal axis 2 1_1 indicates that the inclination angle is from 1 to I5. The scope of the set of σ force cloth. Further, the vertical axis indicates the distribution of the inclination angles and is a value of 1 (100%) in total. In this case, the tilt angle is 5. The ratio of the following is approximately 100%. In order to produce a surface of a fine uneven surface of the anti-glare layer, which has a surface having an inclination angle of 5° or less of 5° or less, it is preferable to use a pattern to form a mold having a concave-convex surface and to rotate the uneven surface of the mold. A method of printing onto the surface of a resin layer formed on a substrate film (embossing method). In the embossing method, the inclination angle of the fine uneven surface of the antiglare layer is determined by the manufacturing conditions of the mold having the uneven surface. Specifically, it is possible to control by changing the (four) amount of the (four) guard sequence in the manufacturing method of the mold described later. That is, by reducing the (fourth)th of the first (fourth):th order, the height difference of the uneven shape of the i-th surface formed can be reduced, and the inclination angle is increased by five. The ratio of the following faces. In order to obtain an angle of inclination of 5 with 95% or more. The following surface fine embossing table _ anti-glare film, 帛丨 (4) 卫序# is preferably 2 to 8 to 111. When the etching amount is less than 2 #m, the metal surface is hardly formed into a concave-convex shape and becomes a nearly flat mold, and the anti-glare film produced by using the mold cannot exhibit sufficient anti-glare property. Further, when the etching amount exceeds 8, the height difference of the uneven shape formed on the metal surface is large, and the inclination angle may be 5. The following surface is less than 95% β. The anti-glare film produced by using this mold has the suspicion of whitening. Further, the inclination angle of the fine uneven surface of the antiglare layer can be controlled by the etching amount of the second etching step. By increasing the side amount 322870 16 201137409 of the second etching step, the portion of the surface of the first surface uneven shape which is steeply inclined can be effectively passivated, and the inclination angle is increased to 5. In order to obtain an angle of inclination of 5 or more. The amount of the second anti-glare film of the fine uneven surface of the following surface is preferably set to be in the range of 4 to 2 Å. When the amount of _ is small, the optical characteristics of the film obtained by transferring the uneven shape by the surface of the uneven surface obtained by the second etching step are transferred (4). On the other hand, when the amount of money is too large, the uneven shape almost disappears and becomes an almost flat mold: therefore, the anti-glare property cannot be exhibited. In the present invention, the antiglare layer may be composed of a cured product of a curable resin such as a photocurable resin or a thermoplastic resin, and among them, a π (four) towel composed of a cured product of a photocurable resin is preferably used, and may be dispersed. The hardened resin or the heat-resistant resin has (four) refractive index particles. Dream By dispersing the particles, it is more effective in suppressing the flare. 9 When the above particles are dispersed in the layer, the average particle size of the particles is 5 // m or more, and the female, rabbit, r, m, and , can be set to ln to be Win μ. In addition, the average particle yield of the microparticles is less than, the following "' is preferably the following. When the average particle diameter is low, (4)" when the microparticles are used to make the (4) light on the side of the image, the contrast is lowered when the image is displayed. Tendency of the field: plasticity of the field: = the ratio of the refractive index of the second refractive index to the cured product of the hardened resin or the heat, '3, and the ratio of the refractive index ηι_, w(1), preferably the above or lower: lower or h 〇 1 or more h 〇4 or less 'Easy is 〇·97 or more 0.98 or 言1 ί·01 or more (10) or less. When the refractive index ratio Wnr is lower than 0.93 s; G4 a, hardened resin or thermoplastic resin and micro 322870 17 201137409 Increased reflectivity at the interface of the grain 'The result is that the backscattering increases, and the total light transmittance decreases. The decrease in total light transmittance increases the haze of the anti-glare film. When the refractive index ratio nb/nr exceeds 〇. 98 and does not reach 丨.〇1, the internal scattering effect due to the microparticles is small' in order to impart predetermined scattering characteristics to When the anti-glare layer is subjected to the effect of suppressing the speckle caused by the particles, it may be necessary to increase the micro The amount of the fine particles is usually 50 parts by weight or less, preferably 40 parts by weight or less, relative to the hardening type of the resin or the thermoplastic resin. Further, the content of the fine particles is preferably 10 parts by weight. More preferably, it is 15 parts by weight or more. When the content of the fine particles is less than 1 part by weight, the effect of suppressing the speckle formed by the fine particles may be insufficient. The material constituting the fine particles preferably satisfies the above preferred refractive index ratio. As described later, it is preferable to use the ϋν embossing method in the UV embossing method. It is preferable to use an ultraviolet curing resin. In this case, the curing of the ultraviolet curing resin is used. Since a large amount of material exhibits a refractive index of about 150, it can be combined with the design of an anti-glare film, and it is preferable to use a resin bead as a fine particle from a refractive index of i•xian to about 1.60. It is almost spherical. Examples of the preferred resin beads are as follows. 1-2 Amine beads (refractive index 1 57), polymethyl propyl acetoacetate beads (refractive index) 1.49), mercapto acrylate styrene / styrene Polymer resin beads (refractive index i 5〇. 322870 201137409 polycarbonate beads (refractive index 1.55), polyethylene beads (refractive index 1.53), polystyrene beads (refractive index 1. 6), Polyvinyl chloride beads (refractive index 1.46), polyoxyalkylene resin beads (refractive index 1.46), etc. (Substrate film) The substrate film used in the antiglare film of the present invention is transparent and resistant. An acrylic resin which is excellent in wetness and weather resistance and which is excellent in mechanical strength is mainly composed of an acrylic resin. Here, the acrylic resin in the present invention means a thiol based acrylic resin and a necessary The added additives and the like are mixed and melt-blended and obtained. The above-mentioned mercaptoacrylic resin is a polymer mainly composed of mercaptoacrylate. The methacrylic resin may be a monomeric methacrylate or a copolymer of mercapto acrylate with other mercapto acrylate or acrylate. The mercapto acrylate may, for example, be an alkyl acrylate such as decyl acrylate, decyl acrylate or butyl methacrylate, and the alkyl group usually has a carbon number of about 1 to 4. Further, an acrylate copolymerizable with a mercapto acrylate, preferably an alkyl acrylate, may, for example, be decyl acrylate, ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate or the like, the alkyl group The carbon number is usually about 1 to 8. Further, in the copolymer, an aromatic vinyl compound such as styrene having a compound having at least one polymerizable carbon-carbon double bond in the molecule or an ethylene cyanide compound such as acrylonitrile may be used. The acrylic tree 19 322870 201137409 preferably contains acrylic rubber particles from the viewpoint of impact resistance and film forming properties of the base film. The amount of the acrylic rubber particles which may be contained in the acrylic resin is preferably 5% by weight or more, and particularly preferably 10% by weight or more. The upper limit of the amount of the acrylic rubber particles is not limited, but when the amount of the acrylic rubber particles is too large, the surface hardness of the base film is lowered, and when the surface treatment is applied to the base film, it is relative to the surface treatment agent. The solvent solubility of organic solvents is reduced. Therefore, the amount of the acrylic rubber particles which may be contained in the acrylic resin is preferably 80% by weight or less, and particularly preferably 60% by weight or less. The acrylic rubber particles are particles in which an elastic polymer mainly composed of acrylate is used as an essential component, and may be a single layer structure consisting essentially of only the elastic polymer, or the elastic polymer may be composed of 1 Multilayer construction of layers. Specifically, the elastic polymer is preferably a crosslinked elastic copolymer obtained by polymerization of the following monomer composition, which is composed of: acrylic vinegar 50 to 99.99% by weight, at least one type 1至十重量百分比的。 The other vinyl monomer copolymerized with the alkyl acrylate is 0 to 49.9% by weight, and the copolymerizable crosslinkable monomer 0.1 to 10% by weight. The alkyl acrylate which forms the elastic polymer may, for example, be methyl acrylate, ethyl acrylate, butyl acrylate or 2-ethylhexyl acrylate. The alkyl group usually has a carbon number of about 1 to 8. Further, examples of the other vinyl monomer copolymerizable with the above alkyl acrylate include a compound having one polymerizable carbon-carbon double bond in the molecule, and more specifically, decyl methacrylate. A mercapto acrylate, an aromatic vinyl compound such as styrene, an ethylene cyanide compound such as acrylonitrile, or the like. Further, the above-mentioned copolymerizable crosslinkable monomer may, for example, be a compound having at least two crosslinks of poly 20 322870 201137409 conjugated carbon-carbon double bond in the molecule, and specifically, for example, (Meth) acrylates of polyols of (meth)acrylic acid glycol and butylene glycol di(meth)acrylate, such as (mercapto) propyl acrylate and (meth) acrylic acid An allyl ester of methacrylic acid acrylate, diethyl benzene, and the like. In the present specification, the term "(meth)acrylate" means methacrylate or acrylate, and the term "(meth)acrylic acid" means methacrylic acid or acrylic acid. The acrylic resin may contain a usual additive in addition to the above acrylic rubber particles, and examples thereof include an ultraviolet absorber, an organic dye, a pigment, an inorganic dye, an antioxidant, an antistatic agent, and a surfactant. In view of improving weather resistance, an ultraviolet absorber can be preferably used. Examples of the ultraviolet absorber include, for example, 2,2,-methylenebis[4_fluorene, ^3,3-tetradecylbutyl)-6-(211-benzotriazole-2-yl). Phenol], 2_(5-methyl-2-hydroxyphenyl)-2H-benzotriazole, 2-[2-hydroxy-3,5-bis(α,α-dimercaptophenyl)phenyl -2Η-stupid and salivary, 2_(3,5-di-tertiary butyl-2-phenyl)-2-indole-benzotrisole, 2-(3-tri-butyl-5-methyl- 2_Phenyl) -5-gas benzotrisole, 2_(3,5-di-tertiary butyl-2-yl-phenyl)_5_ chloroprobenzo-salt, 2' (3,5_ Di-tertiary pentyl-2-phenyl)-2H-benzotrimethylene, 2-(2'-transyl-10-thanooctylphenyl)_2H_benzotrimide UV absorber; such as 2- minus 4-oxime diphenyl hydrazine, 2_ thio-4-octyloxy dipyridyl ketone, 2,4-di-diphenyl ketone, 2 _ base + methoxy -4 di-chlorodiphenyl, 2,2,-di-based-&quot;oxydiphenyl steel, , Fenggong soil '4-methoxydiphenyl ketone 2-based diphenyl ketone Ultraviolet absorber; such as salicylic acid for tertiary butylbenzene, salicylic acid, octyl benzene vinegar, stearic acid, ultraviolet light, rabbit, &amp; ^ receiving 4, can be necessary The use of such above 232287021 201137409 kinds. When the amount of the ultraviolet ray absorbing agent is, the amount is usually 0.1% by weight or more, preferably 0.3% by weight or more, and more preferably 2% by weight or less. The thickness of the base film is preferably from the viewpoint of preventing the film from being curled when the antiglare layer is formed, from the viewpoint of the mechanical strength and the handleability, and the thickness and cost of the image display device. From the viewpoint, it is preferably 100_ or less. The thickness of the base film is preferably 4 or less and 80 a m or less. In the method for producing the base film used in the antiglare film of the present invention, for example, various methods generally known, such as melt extrusion molding, can be used. Among them, from the viewpoint of producing a film having a good surface property, it is preferred to carry out melt extrusion molding from the mold, and to contact at least one side of the obtained molten film sheet to the surface of the surface or the belt surface. The method of film making. In particular, from the viewpoint of improving the surface smoothness and surface gloss of the base film, it is preferred to form a film by double-sided contact with the surface of the ring roll or the surface of the molten film obtained by the melt extrusion molding. . The roll or belt 10 used at this time has a smooth surface, preferably a mirror surface, on the surface of the roll or the surface of the belt which is in contact with the molten film of propylene. The earth material film base film may be composed of a multilayer structure, and the multilayer structure may be a laminated structure including a layer containing acrylic rubber particles and a crucible containing no acrylic rubber particles. The substrate film having a multilayer structure can be suitably produced, for example, by multilayer melt extrusion molding 1 using a feed block or a multi-manifold mold. By forming the base film into a multilayer structure, the properties of the substrate can be imparted to the substrate film. For example, a substrate film having a layer containing propylene 322870 22 201137409 gel particles in the intermediate layer and having a multilayer structure not containing a layer of acrylic rubber particles on the outermost surface of the surface layer may be provided with a propylene glycol acid layer The intermediate layer of the rubber particles has high impact resistance and has high surface hardness by not containing the surface layer of the acrylic rubber particles. Further, the substrate film used in the antiglare film of the present invention may be subjected to a stretching treatment on a film formed of the acrylic resin obtained above. By the stretching treatment, stronger impact resistance can be imparted. The stretching method may be any method, and is not particularly limited, and examples thereof include a method in which the glass transition temperature is higher than the temperature, a transverse stretching by a tenter, and a heat setting treatment, or a glass transition temperature or higher. The temperature is longitudinally set by a tenter = heat-fixed after stretching, and then subjected to transverse solid stretching and then subjected to a heat-solid treatment. &lt;Method for Producing Antiglare Film&gt; The antiglare film of the present invention is preferably produced by a method comprising the following steps (A) and (B). (A) a process of producing a mold having a concave-convex surface according to a pattern showing an energy spectrum having a maximum value in a space having a spatial frequency greater than 0"^ and 0.04"^! or less; and (B) The uneven surface of the mold is transferred to a surface of the resin layer formed of a curable resin such as a photocurable resin or a thermoplastic resin, which is formed on the base film. By using a pattern having an energy spectrum having a maximum value in a range where the spatial frequency is larger than ΟΜΠΓ1 and 0.04/ζπΓ1 or less, the fine uneven surface having the above-described specific space-rate distribution can be formed with high precision. Further, by the method of producing a mold having a concave-convex surface from the pattern by 322870 23 201137409, and transferring the uneven surface of the mold to the surface of the resin layer formed on the base film (embossing method), the precision can be improved. An anti-glare layer having a fine uneven surface is produced with good reproducibility. Here, the "pattern" generally means a second-order tone (for example, binarized image data of white and black) which is used by a computer for forming a fine uneven surface of an anti-glare film. Or image data consisting of gradation above the 3rd order, but may also contain information (array, etc.) that can be converted into the image data in a single sense. It can be converted into information of image data in a single sense. For example, there are silks of various materials and information on cranes and other enemies. The energy spectrum of the pattern used in the above sequence (A), for example, if it is image data, can be converted into a 2nd order by image data.

After the 'two-dimensional letter... to represent the tone of the figure, =: the -dimensional function g (X, y) performs discrete Fourier transform to calculate the two-dimensional coffee, w 'and then the resulting two-dimensional function G (fx , f 〇 is calculated by squaring. Here, X and y represent the orthogonal seatpost in the image data plane, and £ and fy respectively represent the spatial frequency in the X direction and the spatial frequency in the y direction. The energy spectrum of the elevation of the surface of the fine concave and convex surface is the same. 'When the energy spectrum of the pattern is obtained, the two-dimensional function g(x, y) of the tone is generally obtained as a discrete function. At this time, the surface of the fine concave surface is obtained. The energy spectrum of the elevation can be calculated by the discrete Fourier transform to calculate the energy spectrum. Specifically, the discrete Fourier transform defined by equation (5) is used to calculate the 'caffe, and then the obtained discrete function is sent, fy) to obtain the energy peak. Fy) Here, V in the formula (5) is a pi, and a number is early. Further, Μ is the number of pixels in the X direction, and the number of pixels in the direction, 322870 24 201137409 1 is an integer of -M/2 or more and M/2 or less. , m is an integer of _^/2 or more and N/2 or less. Further, 'the space between the χ direction and the y direction is respectively And are defined by equations (6) and (7), respectively. Δχ and Ay in equations (6) and (7) are horizontal decomposition energies in the X-axis direction and the y-axis direction, respectively. When the pattern is image data It is equal to the length of the pixel axis: and the length of the y-axis direction. That is, when the pattern is made into 6 shed dpi image data, (4), when the pattern is made into 12800 dpi image data , also Λ) = 敎 ( (4) exp[-2 as in (5)

Afy^¥^ Formula (7) Fig. 9 is a view showing a portion of an image data which can be used to produce a pattern used for the antiglare film of the present invention, which is a two-dimensional discrete function g(x'y) of a tone. The table is not. The image data of the pattern shown in Fig. 9 is 2_2 coffee, and is made at 12800 dpi. Fig. 10 is a diagram showing the energy spectrum G (fx, fy) obtained by performing discrete Fourier transform on the one-dimensional function g(x, y) of the tone 1 shown in Fig. 9 in white and black gradations. Since the pattern shown in Fig. 9 is randomly arranged, the energy spectrum G2(fx, fy) is symmetrical about the origin as shown in Fig. 1 . Therefore, the spatial frequency of the maximum value of the apparent spectrum G(fx, fy) of the pattern can be obtained from the profile passing through the origin of the energy spectrum. The nth figure shows the shaving surface of fx=〇 in the energy spectrum G2(fx, fy) shown in Fig. 322870 25 201137409. As can be seen from the figure, the pattern shown in Fig. 9 has a maximum value in the spatial frequency 〇·〇45#mH, but does not have a maximum value when it is larger than O/im 1 and is less than 〇Q4wra-i. . When the energy spectrum G2(fx, fy) of the pattern for forming the anti-glare film has a maximum value in a spatial frequency range larger than 〇//πΓ1 and less than 〇.〇4vnT1, the obtained anti-glare film The fine uneven surface does not exhibit the above-described specific spatial frequency distribution, so that the elimination of the flare and the sufficient anti-glare property cannot be achieved at the same time. The energy spectrum G2(fx,fy) is larger than 〇# γ and is 〇. 〇4 # γ, and the following spatial frequency range does not have a pattern of maximum values, such as the pattern shown in Fig. 9, by A plurality of points are randomly and uniformly arranged to be produced. The spot diameters to be randomly arranged may be one or plural. Further, in a pattern in which a plurality of points are randomly arranged, the spectrum is displayed in a spatial frequency at a reciprocal of the average distance between the points, and the first maximum value is displayed (the spatial frequency is smaller than the minimum spatial frequency of 0" The maximum value ^ Therefore, in order to produce a spectrum whose energy spectrum is larger than W and is less than 0.04/zm-i, there is no: a pattern with a maximum value, so that the average distance between the points is less than 25am. It is sufficient to make a pattern. In addition, the ratio of the energy spectrum (1)2 of the elevation of the fine concave-convex surface in the spatial frequency 〇1 of the anti-glare film to the energy spectrum 仏2 of the elevation in the spatial frequency 〇〇4 is set to 〇.丄Hereinafter, the energy spectrum of the pattern is preferably such that the spatial frequency is greater than 〇. 〇4 μ γ and does not reach 〇· i #心 has a maximum value. Such a pattern can be obtained by making the point _ average distance ^ 1〇 is made in a way that m is still large and does not reach the range of “^^. 322870 26 201137409 = outside' can also be used from a random configuration of such a majority of points, Xuan &lt; Γ v ^吏Through the high-pass (9) to remove the low spatial frequency below the specific spatial frequency The pattern H can also be formed by using a plurality of points from the random 2 arrangement to pass the band-pass chopper for removing the low spatial frequency components below the special spatial frequency and the south spatial frequency components above the specific spatial frequency. And the pattern obtained. As shown in Fig. 11, the 'energy spectrum of the pattern created by randomly arranging a plurality of points' indicates the average distance between the points and the points of the arranged points, and the larger the album. Such a pattern can remove unnecessary components through the aforementioned high-passor or the aforementioned leather device. Thus, the energy spectrum of the pattern of the high-pass filter or the band pass filter is removed in the space by the money device, so in the space The frequency is greater than "heart and does not have a maximum value in the range of 0 field ^ or less. In addition, it is possible to more efficiently produce a pattern having a spatial frequency greater than G.OWnfi (UW's _maximum value. Here, When the aforementioned high-pass chopper is used, in order to remove the maximum value in the range of the spatial frequency greater than 0/znf1 and below G.G4/ZIU.1, the upper limit spatial frequency of the removed low spatial frequency component is preferably the following In addition, When the aforementioned bandpass damper is used, in order to remove the spatial frequency greater than 0/ζπΓ1 and the maximum value of the range of 1 or less, and the spatial frequency is greater than 0·0-丨 and not within the range of u(10)-丨The upper limit of the frequency of the low-frequency component removed by the pole value is preferably 〇 shoulder//in, and the lower-order spatial frequency of the removed high-altitude-rate component is preferably 0.08 a nf1 or more. High-pass filter or bandpass filter, waver, etc. to make 322870 27 201137409 pattern 'passing the pattern before the filter, you can use the random number generated by random numbers or computer to determine the shade and have random Pattern of Brightness Distribution The details of the method of producing a mold according to the pattern obtained as described above will be described in detail later. The above step (B)' is a step of forming an antiglare layer having a fine uneven surface on the base film by an embossing method. The embossing method is exemplified by a UV embossing method using a photo-curable resin and a thermal method using a thermoplastic resin. From the viewpoint of productivity, a UV embossing method is preferred. In the ϋν embossing method, a photocurable resin layer is formed on the surface of the base film, and the photocurable resin layer is pressed while being pressed against the uneven surface of the mold, thereby transferring the uneven surface of the mold to A method of photocurable resin layer. More specifically, the coating liquid containing the photocurable resin is applied onto the substrate crucible, and the coated photocurable resin is adhered to the uneven surface of the mold, and is irradiated from the substrate film side. The light-curable resin is cured by light such as ultraviolet rays, and then the base film on which the cured photo-curable resin layer is formed is peeled off from the mold, whereby the uneven shape of the mold can be obtained and transferred to the cured state. An anti-glare film of a photo-curable resin layer (anti-glare layer). It is preferable to use a photocurable resin in the case of using the UV embossing method, and it is preferable to use a hard 彳b line hardening type lining by ultraviolet rays, or to combine an appropriately selected photoinitiator into an ultraviolet curable resin, and (4) A resin that is hardened by visible light of a wave or a line. The ultraviolet ray tree is not particularly limited, and a commercially available suitable product can be used. A preferred example of the ultraviolet ray grease is i or more than one or more of the polyfunctional acrylates including tris-acrylic acid triacetate, 322870 28 201137409 pentaerythritol tetraacrylate, and Irgacure 907 (Chiba Specialty Chemicals) Company), Irgacure 184 (manufactured by Chiba Specialty Chemicals),

A resin composition of a photopolymerization initiator such as Lucirin TP0 (manufactured by BASF Corporation). The coating liquid can be prepared by adding fine particles, a solvent, or the like to the ultraviolet curable resin as necessary. &lt;Manufacturing method of mold for producing anti-glare film&gt; Hereinafter, a method for producing a mold used in the production of the anti-glare film of the present invention will be described. The method for producing a mold used in the production of the anti-glare film of the present invention is not particularly limited as long as it can obtain a specific surface shape obtained according to the above-described pattern, but is manufactured with high precision and reproducibility. The fine uneven surface 'preferably basically contains [1] the jth plating step, the [2] polishing step, the [3] photosensitive resin film forming step, the exposure step, the developing step, and [6] the first etching step, [ 7] The photosensitive resin film peeling process, and [8] the second clock cover order. Fig. 12 is a view schematically showing a preferred example of the first half of the manufacturing method of the mold. Fig. 13 is a view schematically showing a preferred example of the latter half of the method of manufacturing the mold. In Figs. 12 and 13, the cross section of the mold in each step is schematically shown. Hereinafter, each of the above steps will be described in detail with reference to Figs. 12 and 13. [1] First plating step In this step, the surface of the substrate used in the mold is subjected to key copper or nickel plating. As described above, by applying copper plating or nickel plating to the surface of the substrate for a mold, the adhesion and gloss of chrome plating in the subsequent second plating step can be improved. This is because copper plating or nickel plating has high coating properties and high smoothing effect, and it is possible to form a flat and shiny surface by embedding 323870 29 201137409 fine irregularities or voids of the substrate for a mold. By the characteristics of (4) copper or money recording, even if chrome plating is applied in the second bonding step described later, the cause of the rust plating or the pits ((5) (9) of the chrome-plated surface can be eliminated. ==' and because of the high coverage of _ or lin, it can reduce the occurrence of fine cracks. The steel or record used in the first money-receiving process, in addition to pure metal, may be steel-based alloy or Therefore, the term "copper" in the specification refers to the meaning of steel and copper alloy. In addition, nickel" contains the meaning of nickel and nickel alloy. Copper plating and nickel plating can be respectively performed by deplating. For the purpose of carrying out or electroless plating, it is generally forged. # When applying copper or key recording, when the plating is too thin, the influence of the surface of the bottom is not completely eliminated, so the thickness is preferably 5G//. More than m. The thickness of the ore layer is not limited. In terms of cost, etc., it is generally preferred to be 5: ^. The metal material formed by the base (4) of the mold is used to list aluminum from the viewpoint of cost. , iron, etc. In addition, in terms of handling convenience, especially good ': lightweight! s. In this case, the so-called Ming or iron, in addition to pure metal, also the alloy is the alloy with Ming or iron as the main body. In addition, the shape of the substrate for the mold is as long as used in the field: A suitable shape may be a cylindrical or cylindrical roll in addition to a flat plate shape. When a roll-shaped base material is used to form a mold, the anti-glare film can be produced in a continuous roll shape. Advantages: 322870 30 201137409 [2] Polishing step In the subsequent polishing step, the surface of the substrate which has been subjected to copper plating or nickel plating in the first plating step is polished. The surface of the material is ground to a state close to the mirror surface. This is because the metal plate or the metal roll that serves as the base material is often subjected to machining such as cutting or grinding in order to achieve the desired precision, so that processing marks remain on the surface of the substrate, even if In the case where copper plating or nickel plating is applied, such processing marks may remain, or in the plated state, the surface may not be completely smoothed. That is, even if the process described later is applied thereto Residual The surface of the deep processing mark may be deeper than the unevenness formed by the process, and may have the influence of residual processing marks. When using such a mold to manufacture an anti-glare film, it may be The optical properties are unpredictable. The 12th (a) towel is a schematic display of a flat substrate 7 for a mold, and the surface is subjected to copper plating or nickel plating in the first plating process (this process) The shape of the medium is in the form of (4) (four) prefecture _), and the surface of the substrate 8 having the mirror-polished surface is not particularly limited. The method of polishing the surface of the substrate to which the plated steel or the nickel is applied is not particularly limited. Any of the polishing method, the electrolytic polishing method, and the chemical polishing method. The mechanical polishing method may, for example, be a super processing method, a lapping method, a fluid polishing method, a buffing method, or the like. The X-cutting tool is mirror-cut, and the surface of the substrate for the mold is mirror-finished. The material or shape of the cutting aid used at this time is particularly limited. 'Superhard knives, CBN W, Tao Jing knives, diamond knives, etc. can be used, and diamond knives are preferred from the viewpoint of processing accuracy. 322870 31 201137409 Surface roughness after grinding' The center line average roughness Ra according to JIS B 0601 is preferably 〇. lym or less, and particularly preferably 〇 〇5#m or less. When the average center roughness Ra of the center line after grinding is larger than 〇, Jem, the influence of the surface roughness after polishing may remain on the uneven shape of the surface of the finally formed mold. Further, the lower limit of the center line average roughness Ra is not particularly limited, and may be appropriately determined in consideration of processing time and processing cost. [3] Photosensitive resin film forming step In the subsequent photosensitive resin film forming step, a solution in which a photosensitive resin is dissolved in a solvent is applied to a substrate for a mold which is mirror-polished by the polishing step. The polished surface 8 of 7 is heated and dried to form a photosensitive resin film. Fig. 12 (8) t is a view schematically showing a state in which the photosensitive resin film 9 is formed on the polished surface 8 of the substrate 7 for a mold. As the photosensitive resin, a conventionally known photosensitive (tetra) grease can be used. (4) A negative photosensitive resin having a photohardenable property of a photosensitive portion, which has an acrylic group or a methacrylic acid or a prepolymer, a mixture of a double azide and a dilute rubber in the molecule; In addition, as a positive type photosensitive having the property of borrowing cinnamon = only: leaving the photosensitive portion: tree; purpose, =: resin line secret tree, in addition, sensitizing agent, development accelerator, dense T in response to photosensitive Various additives such as a clarifying agent. The coating agent is modified, and the ground material of the substrate 7 is diluted in a suitable solution. When the photosensitive resin is applied to the surface 8, the film is formed 322870 32 201137409 The agent is applied. A cellosolve solvent, a propylene glycol solvent, an ester solvent, an alcohol solvent, a ketone solvent, a highly polar solvent or the like can be used as the solvent. The method of applying the photosensitive resin solution may be a bump coating, a jet coating, a dip coating, a spin coating, a roll coating, a wire bar coating, an air knife coating, a knife coating, or a curtain coating. A method generally known. The thickness of the coating film is preferably in the range of 1 to 6 #m after drying. [4] Exposure step In the subsequent exposure step, the above-described spectrum of the photosensitive resin film formation process is exposed to a pattern having a maximum value in the spatial frequency range of more than Oynf1 and less than 0·04#nf1. The photosensitive resin film 9 is formed. The light source used in the exposure step can be appropriately selected in accordance with the photosensitivity and/or sensitivity of the photosensitive resin. For example, g-rays (wavelength··436 nm) of a high-pressure mercury lamp and h-rays of a high-pressure mercury lamp (wavelength: 405 nm) can be appropriately selected. , i-ray (wavelength: 365nm) of high-pressure mercury lamp, semiconductor laser (wavelength: 830nm, 532 nm, 488 nm, 405 nm, etc.), YAG laser (wavelength: 1064 nm), KrF excimer laser (wavelength: 248 nm) , ArF excimer laser (wavelength: 193 nm), F2 excimer laser (wavelength: 15711111) and the like. In order to accurately form the surface uneven shape of the mold and the surface uneven shape of the antiglare layer, it is preferable to expose the pattern to the photosensitive resin film in a state of being precisely controlled in the exposure step, specifically, A pattern is created in the computer as image data, and based on the image data, the pattern is drawn onto the photosensitive resin film by laser light emitted from a computer-controlled laser head. When performing laser drawing, a laser drawing device for printing plate production can be used. Such a laser drawing device is exemplified by Laser St ream 322870 33 201137409 FX (manufactured by Think Laboratory). In Fig. 12(c), the state in which the pattern is exposed to the photosensitive dendrite film 9 is schematically shown. When the photosensitive resin film is formed of a negative photosensitive resin, the exposed region 1 is subjected to a crosslinking reaction of the resin by exposure, so that the solubility with respect to the developer described later is lowered. Therefore, in the developing process, the field gg and the region 1 1 are dissolved by the developer, and only the exposed region 1 is formed on the surface of the material to form a mask. On the other hand, when the photosensitive resin film is formed by positive photosensitive printing, the exposed region is cut by the light, and the solubility of the developer is described later. Therefore, the exposed region 1 () is exposed by the developer in the developing process, and the unexposed region remains on the surface of the substrate. [5] The development process is performed in the subsequent development process, when the negative type is used. When the photosensitive resin is used as the raw resin film 9, the unexposed region 11 is dissolved by the developer, and only the exposed region 10 remains on the substrate for the mold' and is in the succeeding i-th wax; SI:: single. On the other hand, 'When positive-type photosensitive sap is used = 1 to film 9', only the exposed (four) region lQ is developed, and the unexposed region u remains on the substrate for the mold - the first It acts as a mask in the etching process. In the case of the sputum sputum used in the process towel, it is possible to use the conventionally known m sodium, potassium hydroxide, sodium carbonate, sodium citrate, and sodium hexamine; the amines such as ethylamine and n-propylamine. Class II; second amines:::--amines; triethylamine, methyldiethylamine, etc. - methylethanolamine, triethanolamine and other alcohol amines; oxidant 322870 34 201137409 tetramethyl record An aqueous solution of tetramethylammonium hydroxide, &amp; quaternary ammonium salt pyrrole, piperazine oxyoxylated dimethyl hydroxyethyl ammonium, toluene, methyl ester, etc. In the development process, the development method, the spray development, and the magnetic brush are particularly limited, and a method such as sound wave development in the immersion _ 12 (4) can be used. The photosensitive resin film g is subjected to *'', The member does not use the negative photosensitive resin as the unexposed area. In the 12th figure (c), 10 remains on the surface of the substrate. ^·Dissolved in the 'only exposed area'. The positive feeling is used: sex: =. Fig. 4 (t) t shows the state of the development treatment. On the 12th fth day, the photosensitive resin film 9 is used for the liquid solution. Dissolved, in the future, the exposed area 10 is marked by the mask 12. The unexploded area 11 remains on the surface of the substrate [6] The first rhyme process is followed by the first moxibustion丨τ strict &amp; After the development of the surface of the substrate for the mold, the mold is used as a mask for the mold without the mask, and the main surface is formed with irregularities. Second, after the grinding, the main one is unmasked: two: the state of the material. The lower part of the material 12, the substrate 7 into the surface of the engraved surface is etched, extending along with #土, although not from the mold substrate line Side: Therefore: the progress of = is also from the unobstructed (10) mask 12 in the lower part of the ^^: near the border with the unshielded heart, the mask 12 and the unshielded ^, will be in this place 13 Near the parent boundary, the mold 322870 35 201137409 in the lower part of the mask 12 is also etched by the substrate 7. This is called the side etching. The etching process of the first etching process generally uses gasified iron (FeCl3) liquid and vaporized copper. (CuCl2) liquid, alkali etching solution (Cu(10) ACL), etc., by performing corrosion on the metal surface, 'but a strong acid such as hydrochloric acid or sulfuric acid may be used' or The reverse electrolysis is performed by applying a potential opposite to that at the time of electrolytic plating. The concave shape formed on the substrate for a mold during the etching treatment is based on the type of the underlying metal, the type of the photosensitive resin film, and etching. The technique is different, and it cannot be generalized. However, when the etching amount is 10/zm or less, the etching can be performed substantially in the same direction from the metal surface contacting the etching liquid. The so-called "sampling amount" means by etching. The thickness of the substrate to be removed. The engraving amount 'in the first remaining step' is preferably from 1 to #m, particularly preferably from 2 to 10 μm. When the etching amount is less than i, the metal surface is hardly formed into a concave-convex shape. It becomes an almost flat mold, so it cannot show anti-glare properties. Further, when the etching amount exceeds 5 Torr, the height difference of the concave-convex shape formed on the metal surface is increased, and there is a fear that the image display apparatus using the anti-glare film produced by the obtained mold has a ubiquity. In order to obtain an angle of inclination of 5 with more than 95%. The anti-glare film on the surface of the fine uneven surface of the following surface is preferably 2 to 8 #m in the etching amount in the first etching step. The etching treatment in the i-th etching step can be performed by one etching process or by dividing the etching process into two or more times. When the etching treatment is carried out in two or more steps, the total etching amount of the etching treatment of two or more times is preferably within the above range. [7] Photosensitive resin film peeling step In the subsequent photosensitive resin film peeling step, the photosensitive resin film remaining as a mask in the first etching work 36 322870 201137409 is completely removed. In the photosensitive resin film peeling step, a peeling liquid is used to dissolve the resin film. The peeling liquid can be used in the above-mentioned developing solution: changing pH, temperature, concentration, and immersion time, etc., when the film is used, the photosensitive resin film in the exposed portion can be completely dissolved, and in the case of the photosensitive resin, the non-exposed portion can be used. The photosensitive resin 臈 is completely dissolved and removed. The method of developing the photosensitive resin _ away from the process, etc. (4) Development, magnetic brush development, and ultrasonication. In the figure (6), the photosensitive resin film is peeled off by the photosensitive resin film, and the photosensitive resin film used as the mask U in the first step (4) is removed. By using the side formed by the photosensitive resin film, the first surface uneven shape 15 can be formed in the mold [8]. The second plating step is formed by the uneven surface formed (the first surface uneven shape, 俜/ The uneven shape of the surface is passivated. Fig. 13 (7) The chrome layer 16 is formed on the first surface uneven shape 15 formed by the first (fourth) turn, so that the unevenness is formed more than the first! The state of the passivated surface (chrome-plated surface 17). The high-tit is made of a glossy surface on a flat plate or a light surface, and the hardness of the chromium is not + +, and can give a good release property. : can be / made 'but preferably using so-called glossy chrome or decorative chrome plating with good gloss. It is usually carried out by electrolysis 322870 37 201137409, the plating bath can be used with anhydrous chromic acid (CrOO With a small amount of aqueous solution of sulfuric acid, the thickness of chrome plating can be controlled by adjusting the current density and the electrolysis time. In the second plating step, plating other than chrome plating is not preferable. This is due to plating in chrome plating. Due to the low hardness or wear resistance, the mold is made The durability is lowered, and the unevenness may be worn or damaged during use. In the anti-glare film produced by the mold, it is likely that it is difficult to obtain sufficient anti-glare function, and in addition, the possibility of defects on the anti-glare film is generated. Further, the surface polishing after plating is also poor. That is, it is preferable that the surface is not polished after the second plating step, and the uneven surface after the chrome plating is directly used as the transfer. The uneven surface of the mold printed on the surface of the resin layer on the substrate film. This causes a flat portion to be formed on the outermost surface due to polishing, which may cause deterioration of optical characteristics, and may cause an increase in shape control factors. Therefore, it is difficult to perform shape control such as reproducibility. Thus, by applying a key chrome to the surface on which the fine surface unevenness is formed, the uneven shape can be passivated, and a mold whose surface hardness is improved can be obtained. The degree of passivation differs depending on the type of the underlying metal, the size and depth of the unevenness obtained by the first etching step, and the type and thickness of the plating. However, the biggest factor in controlling the degree of passivation is still the plating thickness. When the chrome plating thickness is thin, the effect of passivating the surface shape of the unevenness obtained before chrome plating is insufficient, and the anti-glare obtained by transferring the concave-convex shape is obtained. On the other hand, when the thickness of the chrome plating is too thick, in addition to the deterioration of productivity, a protrusion called a bulge is produced. 38 322870 201137409 1 shape: Surrounding: It is not good. The thickness is preferably in the range of 1 to 10 /zm, particularly preferably in the range of 3 to 6 / / m. The chrome plating layer formed in the stacking process is preferably formed to have a Vickers hardness of _ or more. In addition, when the Vickers hardness of the chrome plating layer is less than _, the hardness of the secret layer is lowered, and the hardness of the secret layer is lowered, and the possibility of abnormality such as electrolysis conditions is high. == The possibility that the group situation has a less favorable impact is increased. In addition, in the case of the mold for producing the anti-glare film of the present invention, the m-thickness resin film _Wei order and (8) the second plated recess 3 are formed by the first etching process by the residual processing. In the second remaining step of the second step of the purification step, the first surface uneven shape 15 formed by using the photosensitive resin film as the masking wire 2 is passivated by the (four) process. By the second surname processing, it is possible to eliminate the portion of the surface of the first surface concave shape 15 formed by the i-th remaining process, which is steeply inclined, so that the obtained mold can be used to produce the fresh characteristic of the anti-glare film. Change in the preferred direction. In the drawing of Fig. 14, it is shown that the first surface uneven shape 15 of the substrate 7 for a mold is passivated by the second etch processing, and the portion having a steep surface is passivated, and is formed to be gentle. The state of the second surface uneven shape 18 in which the surface is inclined. The etching process in the second etching step is generally the same as in the first etching step, in which a metal oxide iron (FeCh) solution, a copper chloride (CuCl 2 ) solution, an alkali etching solution (Xu (NU 3 ) 4 C 12 ), or the like is used. The surface is subjected to a rot, but it is also possible to use a strong acid such as hydrochloric acid or sulfuric acid, or a reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating, in 39 322870 201137409. The degree of passivation of the unevenness after the etching treatment differs depending on the type of the underlying metal, the etching method, and the size and depth of the unevenness obtained by the first etching step, and cannot be generalized, but the maximum factor for controlling the degree of passivation is etching. the amount. Here, the etching amount is the same as the first etching step, and refers to the thickness of the substrate removed by etching. When the etching amount is small, the effect of passivating the surface shape of the unevenness obtained by the first etching step is insufficient, and the optical characteristics of the anti-glare film obtained by transferring the uneven shape are not good. On the other hand, when the etching amount is too large, the uneven shape almost disappears and becomes a nearly flat mold, so that the anti-glare property cannot be exhibited. Therefore, the amount of the etch is preferably in the range of 1 to 50 // m, and further, in order to obtain an anti-glare film having a fine uneven surface containing 95% or more of the surface having an inclination angle of 5 or less, it is particularly preferable. Within the range of 4 to 20/zm. The etching treatment in the second etching step can be performed by one etching treatment or the etching treatment can be divided into two or more steps as in the first etching step. Here, when the etching treatment is carried out in two or more steps, the total etching amount of the etching treatment of two or more times is preferably within the above range. &lt;Anti-glare polarizing plate&gt; The anti-glare film of the present invention can exhibit good anti-glare properties and exhibit good contrast, and is effectively prevented from being caused by "whitening" and "flash spots". Since the visibility is lowered, the viewing property is good when it is mounted on the image display device. When the image display device is a liquid crystal display, the anti-glare film can be applied to the polarizing plate. In other words, the polarizing plate is generally in the form of a protective film bonded to the early surface of the polarizing film composed of the polyvinyl alcohol-based resin of 40 322870 201137409, but it can constitute the protection of the square. membrane. Partial == anti-glare film, can constitute anti-glare a light 1 / is un-layered (four), or a layer of protective film or pre-film state 'or laminated to be useful for bonding to the liquid helium unit The anti-glare film of the present invention can be bonded to the base film side of the polarizing film on the protective film of at least one of the first sheets to constitute an anti-glare polarizing plate. Further, in the polarizing plate in which the protective film is bonded to at least one surface of the polarizing film, the base film may be formed as a polarizing film on the substrate, and the anti-glare layer may be formed on the substrate film. Thereby, it constitutes an anti-polarity plate. EXAMPLES The following examples are given to illustrate the invention in more detail, and the invention is not limited to the examples. The evaluation methods of the anti-glare film and the anti-glare pattern for the following examples are as follows. [1] Measurement of the surface shape of the anti-glare film The surface shape of the anti-glare film was measured using a two-dimensional microscope PL// 2300 (manufactured by Sensofar Co., Ltd.). In order to prevent the surface curvature of the sample, a transparent adhesive is used, and the surface of the concave-convex surface is attached to the pre-formed sheet, and then used for measurement. In the measurement, the magnification of the objective lens is set to 1 () 俾 base = then. Horizontal decomposition energy = 850 ^rax850 ^m ° Buy horses (the ratio of the energy spectrum of the elevations Hi2/H22 and H32/H22) 201137409 From the above measured data, find the defensive J.® -S', The fine concave and convex surface is used as a two-dimensional function h(x, y), and the obtained two-dimensional function is transformed into a discrete Fourier transform to obtain two-dimensional, ^ f (X, W is squared to calculate the two-dimensional function H2 of the energy spectrum) (X, W 'and h2 from the profile curve of fx = 0 (the energy spectrum η in the 0.0W rate, and the spatial frequency &quot; two-frequency H&quot; and calculate the energy spectrum of HlVH22. In addition, 'seeking spatial frequency The energy spectrum m2 in 〇1, and calculate the energy spectrum ratio h32/H22. (The inclination angle of the fine concave and convex surface) • According to the above measured H and calculated according to the above algorithm, the inclination angle of the concave and convex surface is made. Rectangular®, from which the distribution of each inclination angle is obtained, and the ratio of the inclination angle to 5. The ratio of the following surface is calculated. [2] Measurement of optical characteristics of anti-glare film (haze) Anti-glare film haze The measurement is carried out by the method specified in JIS K 7136. Specifically, a haze meter HM_15 according to this specification is used. (The Murakami Color Technology Research Institute) measures the haze. In order to prevent the warpage of the anti-glare film, an optically transparent adhesive is used, and the surface of the uneven surface is bonded to the glass substrate, and then applied to the measurement. In general, when the haze is increased, the image used in the image display device is darkened, and as a result, the front contrast is easily lowered. Therefore, the haze is lower. [3] Anti-glare film Measurement of mechanical strength (pencil hardness) and moisture permeability (pencil hardness) The pencil hardness of the anti-glare film is measured by the method of 42 322870 201137409 specified in JIS K 5600-5-4. Specifically, the basis for use is determined. The electric pencil scraping hardness tester (manufactured by Yasuda Seiki Co., Ltd.) of this specification was measured at a load of 500 g. (Hypothelium) The moisture permeability of the anti-glare film was measured at a temperature of 40 ° C by the method specified in JIS Z0208. The measurement was carried out under the condition of a relative humidity of 90%. [4] Evaluation of the anti-glare property of the anti-glare film (mapping, visual evaluation of whitening) In order to prevent reflection from the inner surface of the anti-glare film, the surface of the uneven surface is made to be a surface will The glare film was attached to a black acrylic plate, and it was visually observed from the side of the uneven surface in a bright room in which the fluorescent lamp was turned on, and the degree of whitening of the map of the glory lamp was visually evaluated. Mapping, whitening, and The texture was evaluated by the following criteria in 3 stages of 1 to 3. Mapping 1: No mapping was observed 2: Some mappings were observed 3: Mappings were clearly observed. Whitening 1: No pans were observed White. 2: A little whitening was observed. 3: Whitening was clearly observed. (Evaluation of the freckle) The freckle was evaluated by the following method. In other words, the polarizing plate on both sides of the front and back sides was peeled off from a commercially available liquid crystal television (LC-32GH3 (manufactured by Sharp Corporation)). Then, the polarizing plate "Sumikalan SRDB31E" (manufactured by Sumitomo Chemical Co., Ltd.) was placed in the same manner as the absorption axis of the original polarizing plate, and the adhesive was bonded to the back side and the display side to replace the original one. In the polarizing plate, the antiglare film shown in the following examples was applied so that the uneven surface became a surface, and the intermediate adhesive was further bonded to the display surface side polarizing plate. In this state, observation was visually observed from a position of about 30 cm from the sample, whereby the speckle was evaluated for functionality in 7 stages. Level 1 is the state in which no flash spots are observed at all, level 7 is equivalent to the state in which very severe flash spots are observed, and level 3 is the state in which some flash spots are observed. [4] Evaluation of pattern for manufacturing an anti-glare film The two-dimensional discrete function g(x, y) is used to express the tone of the created pattern data. The horizontal decomposition energies Δχ and Δγ of the discrete function g(x, y) are both 2#πι. The obtained two-dimensional function g(x, y) is subjected to discrete Fourier transform to obtain a two-dimensional function G(fx, fy). The two-dimensional function G(fx,fy) is squared to calculate the two-dimensional function G2(fx,fy) of the energy spectrum, and is evaluated from G2(0, fy) of the profile curve of fx=0. /ζπΓ1 and whether it has a maximum value in the spatial frequency range of 0.04//πΓ1 or less. &lt;Example 1&gt; (Production of mold for producing an anti-glare film) First, a copper ball-plated plate was applied to the surface of a crystal of 200 mm in diameter (according to JIS 5056). The copper ballard plating is formed by a copper plating layer/thin silver plating layer/surface copper plating layer, and the thickness of the entire plating layer is set to be about 200 #m. The copper-plated surface was mirror-polished, and a photosensitive resin was applied to the polished copper-plated surface and dried to form a photosensitive resin film. Then, a pattern in which a plurality of patterns composed of the image data shown in Fig. 15 are successively repeated is repeatedly exposed and developed on the photosensitive resin film by laser light into 44 322870 201137409. Exposure fish based on laser light, .峨%, system 侫m

Laser Stream FX (manufactured by Think Laboratory) uses a positive photosensitive resin for the resin film. Fig. 15 shows a pattern of dots that are randomly arranged with a plurality of dot diameters 12#m, and τ is used to divide +β ffl'1 to remove the spatial frequency of 0·04. It is produced by a band-pass filter with a low spatial frequency component below ζπΓ1 and a high spatial frequency component on 〇j 戈. Then, the first residual treatment was carried out with a copper chloride solution (the amount of money was measured. 3. After the first etching treatment, the photosensitive resin film was removed from the roll, and the copper solution was subjected to a second etching treatment (etching amount: 10 μm). The mold A is produced by chrome-plating the chrome-plating degree to 4#m. (Production of the base film) 30 parts by weight of the propylene oxide rubber particles are contained in the sinter A & oxime ester / methyl acrylate = 96 / 4 (by weight) copolymer (refractive index j 49) = heavy Dong 丙 丙 糸 resin composition 'in the first extruder (screw sentence 65mm A single shaft and a vent hole (manufactured by Toshiba Machine Co., Ltd.) are supplied and fused and supplied to a feed block. In addition, 3 Å of acryl rubber particles are contained in methacrylate. /Acrylic acid methyl vinegar = 96/4 (by weight) copolymer (refractive index 1.49) 70 parts by weight of acrylic resin composition, in the second extruder (screw diameter 45 mm, uniaxial, with vent holes (Hitachi Produced by the shipbuilding company)) melt blended and supplied to the splitter to supply the tree from the first extruder to the splitter In the intermediate layer, the resin supplied from the second extruder to the flow divider is formed into a surface layer (double-sided), which is co-extruded at 265 ° C, and is produced by a premature element set at 85 ° C. A base film A having a three-layer structure having a thickness of 80/zm (intermediate layer 50 &quot; m, surface layer 15y mx 45 322870 201137409 2). (Formation of an anti-glare layer) The photocurable resin composition "GRANDIC 806T" ( Dissolved in ethyl acetate to form a 50% by weight solution, and then Lucirin TP0 (manufactured by BASF Corporation, chemical name: 2, 4, 6-trimethyl), which is a photopolymerization initiator The benzamidine diphenylphosphon oxide is prepared by adding 5 parts by weight per 1 part by weight of the curable resin component. The base film A is coated to have a coating thickness after drying. This coating liquid was applied in a 6/zm method, and dried in a dryer set to 6 (TC) for 3 minutes. The base film A after drying was used to make the photocurable resin composition layer a mold side. In this manner, the rubber sheet is pressed against the uneven surface of the previously obtained mold A and adhered. In this state, light from a high-pressure mercury lamp having a strength of 20 mW/cm 2 was irradiated from the side of the base film A so that the amount of light that was changed by h-rays was 200 mJ/cm 2 , and the photocurable resin composition layer was cured. Then, the base film A is peeled off from the mold by each of the hardening resins, and a transparent anti-glare film a composed of a laminate of a cured resin (anti-glare layer) having irregularities on the surface and the base film A is produced. [Example 2] 2 In the exposure process of the mold making process, a pattern in which a plurality of patterns of the image of the 16th f51 βρί* is not continuously arranged is repeatedly repeated, and the light is applied to the photosensitive film. Exposure to light is performed so that the etch of the first etching process is set to 5 m, and the surrogate amount of the second etch process is set to m, and other implementations are performed. In the same manner as in Example 1, the mold B was produced. An anti-glare film B was produced in the same manner as in Example 1 of 322870 46 201137409 except that the obtained mold B was used. The 16th pattern for the point where the majority of the ship's 12-heart point is randomly arranged is 'to remove the space. 〇35_, the lower spatial frequency is formed; ^Use the band-pass filter for the high spatial frequency component above W^, 0.135 &lt;Comparative Example 1&gt; In addition to the base film A, other examples and comparative examples <Comparative Example 2> 珥丨 眩 眩 0 0 First, the surface of the material of diameter __ (according to A5Q56 of JIS) was mirror-polished, and a sand blasting device was used (not (Second production company), to, pressure denier 0 · lMPa (measured pressure), the amount of beads (light surface area per cm used 1), the second oxidation of the beads Tz_sx_17 (T〇s〇h company, average The particle size of .20/zm) is blasted to the polished inscription surface to form irregularities on the surface. The obtained aluminum roll with irregularities was subjected to electroless nickel plating to prepare a mold. At this time, the thickness of the electroless nickel plating was set to 15 #m. An anti-glare film D was produced in the same manner as in Example 1 except that the known mold C was used. The measurement and evaluation results of the above [1] to [4] of the obtained antiglare films A to D are summarized in Table 1. Further, Fig. 17 is a cross-sectional view showing fx = 中 in the energy spectrum G2 (fx, fy) obtained from the pattern used in the production of the mold A of the first embodiment and the mold B of the second embodiment. From Fig. 17, it can be seen that the energy spectrum of the pattern used in the production of the mold A of the first embodiment and the mold b of the second embodiment is in a spatial frequency range larger than ΟμπΓ1 and less than 〇. 〇4/ζπΓΐ. Does not have a maximum value. 47 322870 201137409 1st Table 1 - 1st Example 1 Example 2 Comparative Example 1 Comparative Example 2 Anti-glare film ____ ABCD base film __-' A (acrylic resin) A (propionic acid resin) TAC Film A (acrylic resin) chessboard ABAC surface shape energy spectrum ratio H.VH^ 19 4 19 41 — ^ HaVH^ 0. 002 0. 001 0. 002 0. 003 Tilt angle surface tt 5 · below, Example (3⁄4) 100 100 100 100 Optical characteristic haze (3⁄4) 0.4 0. 6 0. 4 0. 4 Anti-glare performance map 1 1 1 1 Whitening 1 1 1 1 Flash spot 1 1 1 6 Pencil hardness 4H 4H 3H 4H moisture permeability (g/m2. 24hr) 52 48 287 50 From the results shown in Table 1, it can be seen that the anti-glare film A and the anti-glare film B satisfying all the requirements of the present invention have no flare at all. It shows sufficient anti-glare properties and does not produce whitening. In addition, since the haze is also low, even when it is disposed in the image display device, the contrast is not lowered. Further, the pencil has high hardness and strong mechanical strength, and has low moisture permeability and high moisture resistance. On the other hand, the anti-glare film C which does not use the base film composed of the acrylic resin exhibits excellent anti-glare properties, but the erroneous pen hardness and the wet-resistant anti-glare film A and _ film B are more low. Further, the anti-glare film D' which is not made according to the predetermined pattern I produces a flare spot because the energy spectrum ratio HiVH22 does not satisfy the requirement of the present invention 48 322870 201137409 pieces. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing an example of an anti-glare film of the present invention. Fig. 2 is a perspective view showing the surface of the antiglare film of the present invention. Figure 3 shows a pattern of the sorrows of the function h(x, y) representing the elevation. Fig. 4 is a view showing an example of the elevation of the fine uneven surface of the antiglare layer of the antiglare film of the present invention by a two-dimensional discrete function h(x, y). Fig. 5 is a diagram showing the energy spectrum H2(fx, fy) of the elevation obtained by performing the discrete Fourier transform of the two-dimensional function h(x, y) shown in Fig. 4 in white and black gradations. Fig. 6 is a view showing a cross section of fx = 中 in the energy spectrum H2 (fx, fy) shown in Fig. 5. Fig. 7 is a schematic view for explaining a method of measuring the inclination angle of the fine uneven surface. Fig. 8 is a graph showing an example of a histogram of the oblique angle distribution of the fine uneven surface of the antiglare layer provided in the antiglare film. Fig. 9 is a view showing a part of image data which can be used to fabricate the pattern used for the antiglare film of the present invention. Fig. 10 is a diagram showing the energy spectrum G2(fx, fy) obtained by performing discrete Fourier transform on the two-dimensional function g(X, y) of the gradation shown in Fig. 9 in white and black gradations. 49 322870 201137409 Figure 11 is a diagram showing the profile of h = 中 in the energy spectrum G2 (fx, fy) shown in Fig. 10. "Twelfth, (3) to (6) are diagrams schematically showing a preferred example of the first half of the manufacturing method of the mold. Fig. 13 (a) to (c) are schematic diagrams showing the latter half of the manufacturing method of the mold. Fig. 14 (a) to (b) are diagrams schematically showing a state in which the uneven surface formed in the second etching step is passivated by the second etching step. Fig. 16 is a view showing a pattern used in the production of the mold of the embodiment. Fig. 17 is a view showing a pattern used in the production of the mold of the second embodiment. Fig. 17 is a view showing the patterns shown in Figs. 15 and 16. The spectrum of the energy spectrum G (fx, fy) fx = 〇. [Main component symbol description] 1 Anti-glare film 2 Fine bumps 3 Anti-glare film projection surfaces 6a, 6b, 6c, 6d Normal vector 7 Substrate for mold 8 Polished surface 9 Photosensitive resin film 10 Expoched area 11 Unexposed area 12 Mask 13 No mask 15 First surface uneven shape 16 Chrome plating layer 17 Mineral surface 18 Second surface Concavo-convex shape 101 Substrate film 102 Anti-glare layer 103 Fine uneven surface 322870 50

Claims (1)

201137409 * VII. Patent application scope: 1. An anti-glare film comprising: a base film, and an anti-glare layer laminated on the base film and having a concave-convex surface, the anti-glare film is characterized by: The material film contains an acrylic resin; the ratio of the energy spectrum 12 of the elevation of the aforementioned concave-convex surface in the spatial frequency 0.01 ynf1 to the energy spectrum Η22 of the elevation of the aforementioned concave-convex surface in the spatial frequency 0.04# nf1 is located at 3 to The ratio of the energy spectrum H32 of the elevation of the aforementioned concave-convex surface in the spatial frequency of 0.1 gnf1 to the spatial frequency of 0. 04# πΓ1 is the ratio of the energy spectrum Η22 of the elevation of the surface of the concave-convex surface Η32/Η22, which is 0.1 or less. And the uneven surface contains 95% or more of a surface having an inclination angle of 5 or less. 2. The antiglare film according to claim 1, wherein the base film has a thickness of 20 or more and 100//m or less. 3. The anti-glare film according to claim 1, wherein the substrate film contains acrylic rubber particles. An anti-glare polarizing plate comprising: an anti-glare film according to claim 1; and a polarizing film laminated on a surface of the base film opposite to the anti-glare layer. 1 322870