JP2014232159A - Antiglare film, mold for producing antiglare film, and method for producing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an antiglare film exhibiting excellent antiglare property and high contrast and capable of effectively suppressing both of glare and white blur, and to provide a mold for producing the antiglare film.SOLUTION: The antiglare film includes an antiglare layer 102 laminated on a light-transmitting support layer 101; and the antiglare layer has a surface composed of a first rugged surface 103 on an opposite side to the light-transmitting support layer. The first rugged surface has such characteristics that: a ratio H/H, where Hrepresents an energy spectrum of the height of the surface at a spatial frequency of 0.01 μmand Hrepresents an energy spectrum of the height at a spatial frequency of 0.1 μm, ranges from 2000 to 6000; and a ratio H/H, where Hrepresents an energy spectrum of the height at a spatial frequency of 0.04 μm, ranges from 30 to 60.

Description

  The present invention relates to a method for producing an antiglare film using an antiglare film and a mold. Moreover, this invention relates to the metal mold | die for glare-proof film manufacture, and its manufacturing method.

  In an image display device such as a liquid crystal display, a plasma display panel, a cathode ray tube (CRT) display, and an organic electroluminescence (EL) display, visibility is significantly impaired when external light is reflected on the display surface. As a method for preventing the reflection of external light, an antiglare film having fine irregularities on the outer surface has been conventionally arranged on the surface of the image display device.

  In recent years, the required properties required for anti-glare films have become increasingly sophisticated, and anti-glare properties (prevention of reflection of external light) are required, as well as good contrast when placed on the surface of an image display device. That the entire display surface becomes whitish due to scattered light when placed on the surface of the image display device, and can suppress the occurrence of “whiteness” in which the display becomes cloudy, and further, the surface of the image display device Therefore, it is required to suppress the occurrence of “glare” in which a luminance distribution is generated due to interference between the pixels of the image display device and the surface uneven shape of the antiglare film when the display image is disposed.

  Various types of anti-glare films having improved optical properties have been proposed in the past. For example, in Japanese Patent Application Laid-Open No. 2011-112964 (Patent Document 1), an uneven shape of an antiglare layer is used as an antiglare layer as an antiglare optical laminate that can prevent reflection of outside scenes, glare, and contrast. The concavo-convex shape (A) formed by phase separation of the binder resin that constitutes the surface and the concavo-convex shape (B) formed by the internal scattering particles contained in the antiglare layer, and the ten-point average roughness Rz is less than 3 μm An optical laminate is disclosed.

  Japanese Patent Application Laid-Open No. 2012-103701 (Patent Document 2) discloses an antiglare optical laminate that can improve glare prevention and black reproducibility. An optical laminate that satisfies the angle θa and the average roughness Rz is disclosed.

  JP 2011-253106 A (Patent Document 3) discloses an optical functional layer (anti-glare layer) as an anti-glare optical laminate that can have anti-glare properties, blackness in a bright room, and anti-glare properties. Of the inclination angle distribution of 0.5 degrees or less, the ratio of the inclination angle distribution of 0.6 degrees or more and 1.6 degrees or less, and the inclination angle component of 3.0 degrees or more An optical laminate in which the ratio is within a predetermined range is disclosed.

  In JP 2011-209700 A (Patent Document 4), the uneven surface of the anti-glare layer exhibits specific energy spectrum characteristics as an anti-glare film that can prevent a decrease in visibility due to the occurrence of whitishness and glare. An antiglare film is disclosed.

JP 2011-112964 A JP 2012-103701 A JP 2011-253106 A JP 2011-209700 A

  Conventionally proposed anti-glare films still have room for improvement in terms of optical characteristics required for them, particularly in terms of glare prevention and whitening prevention. In addition, it is difficult to reduce the thickness of the antiglare film; sometimes it is difficult to control the surface irregularity shape of the antiglare layer, or it tends to be insufficient. If the surface unevenness of the antiglare layer is not precisely controlled, satisfactory optical characteristics cannot be obtained.

  The present invention has been made in view of the above problems, and its object is to provide excellent anti-glare properties and high contrast, and to effectively suppress both glare and whitishness. Is to provide.

  Another object of the present invention is to provide a mold for producing an anti-glare film suitable for producing an anti-glare film having the above-mentioned excellent optical characteristics with good reproducibility by precisely controlling the surface irregularity shape of the anti-glare layer. And it is providing the manufacturing method of the said metal mold | die. Still another object of the present invention is to provide a method for producing an antiglare film using the mold.

  The present invention includes the following antiglare film, a mold for producing the antiglare film, a method for producing the mold, and a method for producing the antiglare film.

[1] A translucent support layer and an antiglare layer laminated on the translucent support layer,
In the antiglare layer, the surface opposite to the translucent support layer is composed of a first uneven surface,
The ratio H ₁ ² between the energy spectrum H ₁ ² of the elevation of the first uneven surface at a spatial frequency of 0.01 μm ⁻¹ and the energy spectrum H ₂ ² of the elevation of the first uneven surface at a spatial frequency of 0.1 μm ⁻¹ . / H ₂ ² is in the range of 2000 to 6000,
The energy spectrum H ₃ ² elevation of the first concave-convex surface in the spatial frequency 0.04 .mu.m ^-1, the ratio H ₃ of the energy spectrum H ₂ ² elevation of the first uneven surface in a spatial frequency 0.1 [mu] m ^{-1 2} / H ₂ ² is in the range of 30 to 60, the antiglare film.

[2] A ratio between an altitude energy spectrum H ₄ ² of the first uneven surface at a spatial frequency of 0.06 μm ⁻¹ and an altitude energy spectrum H ₂ ^{2 of} the first uneven surface at a spatial frequency of 0.1 μm ⁻¹ . The antiglare film according to [1], wherein H ₄ ² / H ₂ ² is 10 or more.

  [3] The antiglare film according to [1] or [2], wherein the first uneven surface includes 95% or more of a surface having an inclination angle of 5 ° or less.

  [4] The antiglare film according to any one of [1] to [3], wherein the total haze is less than 1.5%.

[5] A mold for producing the antiglare film according to any one of [1] to [4],
Including a base material, a first copper plating layer, and a nickel plating layer in this order;
The outermost surface opposite to the base material is composed of a second uneven surface,
The ratio H ₁ ² between the energy spectrum H ₁ ² of the altitude of the second uneven surface at a spatial frequency of 0.01 μm ⁻¹ and the energy spectrum H ₂ ² of the altitude of the second uneven surface at a spatial frequency of 0.1 μm ⁻¹ . / H ₂ ² is in the range of 2000 to 6000,
The energy spectrum H ₃ ² elevation of the second concave-convex surface in the spatial frequency 0.04 .mu.m ^-1, the ratio H ₃ of the energy spectrum H ₂ ² elevation of the second concave-convex surface in the spatial frequency 0.1 [mu] m ^{-1 2} Mold with / H ₂ ² in the range of 30-60.

[6] The ratio between the altitude energy spectrum H ₄ ² of the second uneven surface at a spatial frequency of 0.06 μm ⁻¹ and the altitude energy spectrum H ₂ ^{2 of} the second uneven surface at a spatial frequency of 0.1 μm ⁻¹ . The mold according to [5], wherein H ₄ ² / H ₂ ² is 10 or more.

  [7] The mold according to [5] or [6], further including a protective layer mainly composed of carbon laminated on the nickel plating layer.

  [8] In any one of [5] to [7], including the base material, the second copper plating layer, the silver plating layer, the first copper plating layer, and the nickel plating layer in this order. Mold.

[9] A method for producing a mold according to any one of [5] to [8],
Forming the first copper plating layer on the substrate;
Polishing the surface of the first copper plating layer;
Forming a photosensitive resin film on the polished surface of the first copper plating layer;
Exposing a pattern on the photosensitive resin film;
Developing a photosensitive resin film exposed to the pattern;
Performing a first etching process using the developed photosensitive resin film as a mask, and forming a concavo-convex shape on the polished surface of the first copper plating layer;
Peeling the photosensitive resin film;
Dulling the uneven shape by a second etching process;
Forming the nickel plating layer on the concavo-convex surface of the first copper plating layer comprising the concavo-convex shape blunted by the second etching process;
Including
The method for manufacturing a mold, wherein the pattern shows an energy spectrum having a maximum value in a spatial frequency range of 0.05 to 0.1 μm ⁻¹ .

[10] The mold manufacturing method according to [9], wherein the energy spectrum further has a maximum value in a range of a spatial frequency of 0.007 to 0.015 μm ⁻¹ .

[11] A step of preparing the mold according to any one of [5] to [8];
Transferring the concavo-convex shape of the second concavo-convex surface of the mold to the surface of the resin layer laminated on the translucent support layer;
A method for producing an antiglare film, comprising:

  According to the present invention, there is provided an anti-glare film that exhibits excellent anti-glare properties, has both high contrast in a trade-off relationship and high glare-suppressing properties, and can effectively suppress whitening. can do. According to the mold for producing an antiglare film provided by the present invention, the antiglare film having the above excellent optical characteristics can be produced with good reproducibility by precisely controlling the surface irregularity shape of the antiglare layer. .

It is sectional drawing which shows typically an example of the anti-glare film of this invention. It is a perspective view which shows typically the surface of the anti-glare film of this invention. It is a schematic diagram which shows the state from which the function h (x, y) showing an altitude is obtained discretely. It is the figure which represented the altitude of the 1st uneven | corrugated surface of the anti-glare layer with which the anti-glare film of this invention is provided with the two-dimensional discrete function h (x, y). The altitude energy spectrum H ² (f _x , f _y ) obtained by discrete Fourier transform of the two-dimensional function h (x, y) shown in FIG. 4 is shown in white and black gradation. Energy spectrum _{^{H 2 (f x, f y}} ) shown in FIG. 5 is a view showing a cross section taken along f _x = 0 in. It is a schematic diagram for demonstrating the measuring method of the inclination-angle of the 1st uneven surface. It is a graph which shows an example of the histogram of the inclination-angle distribution of the fine uneven surface which an anti-glare layer has. It is sectional drawing which shows typically an example of the manufacturing method of the metal mold | die for anti-glare film manufacture concerning this invention. Two-dimensional energy spectrum _{^{G 2 (f x, f y}} ) is a schematic view for explaining a method of averaging the distance f from the origin in the spatial frequency space. It is a figure which shows the pattern used in the case of metal mold | die preparation of Example 1. FIG. It is a view showing a cross section taken along f _x = 0 of the energy spectrum G ² obtained for pattern to that used during the mold production of Example _{1 (f x, f y)} . It is a view showing a cross section taken along f _x = 0 in Example 1 and Comparative Examples 1 to 3 energy spectrum of elevation of the first concave-convex surface having antiglare film produced is at _{^{H 2 (f x, f y}} ).

<Anti-glare film>
FIG. 1 is a cross-sectional view schematically showing an example of the antiglare film of the present invention. The antiglare film of the present invention includes a translucent support layer 101 and an antiglare layer 102 laminated on the translucent support layer 101 as in the example shown in FIG. The surface (outermost surface) of the antiglare layer 102 opposite to the translucent support layer 101 is constituted by a first uneven surface 103 made of a fine uneven surface. Hereinafter, the antiglare film of the present invention will be described in more detail.

(1) Translucent support layer The translucent support layer 101 can be a translucent thermoplastic resin film, and is preferably a substantially optically transparent thermoplastic resin film. Specific examples of the thermoplastic resin constituting the thermoplastic resin film include, for example, polyolefin resins such as chain polyolefin resins and cyclic polyolefin resins (norbornene resins, etc.); polyester resins; (meth) acrylic resins Cellulose ester resins such as cellulose triacetate and cellulose diacetate; Polycarbonate resins; Polyvinyl alcohol resins; Polyvinyl acetate resins; Polyarylate resins; Polystyrene resins; Polyethersulfone resins; Polysulfone resins; Resin, polyimide resin; and mixtures and copolymers thereof.

  Among these, from the viewpoint of transparency, mechanical strength, adhesion to the antiglare layer 102, etc., the thermoplastic resin constituting the thermoplastic resin film is a cellulose ester resin, a polyester resin, or a (meth) acrylic resin. Polycarbonate resins and cyclic polyolefin resins are preferred.

  The translucent support layer 101 may have a single-layer structure composed of one resin layer composed of one or two or more thermoplastic resins, or a resin layer composed of one or two or more thermoplastic resins. A multilayer structure in which a plurality of layers are stacked may be used. Although the thickness in particular of the translucent support layer 101 is not restrict | limited, Usually, it is 10-250 micrometers, Preferably it is 20-125 micrometers. The haze of the translucent support layer 101 is preferably 0.5% or less, more preferably 0.3% or less, and most preferably substantially zero.

Haze is the ratio between the total light transmittance Tt that represents the total amount of light transmitted through the light transmitting support layer 101 and the diffused light transmittance Td diffused and transmitted by the light transmitting support layer 101. To the following formula [A]:
Haze (%) = (Td / Tt) × 100 [A]
Is required.

  The total light transmittance Tt is the sum of the parallel light transmittance Tp and the diffused light transmittance Td that are transmitted coaxially with the incident light. The total light transmittance Tt and the diffused light transmittance Td are values measured in accordance with JIS K 7361.

(2) Antiglare layer [Spatial frequency distribution characteristics of the first uneven surface]
The antiglare layer 102 provided in the antiglare film of the present invention includes an energy spectrum H ₁ ^{2 at} an altitude of the first uneven surface 103 at a spatial frequency of 0.01 μm ⁻¹ and a first uneven surface 103 at a spatial frequency of 0.1 μm ⁻¹ . The energy spectrum H ₃ of the altitude of the first concavo-convex surface 103 at a spatial frequency of 0.04 μm ⁻¹ , with a ratio H ₁ ² / H ₂ ² to the altitude energy spectrum H ₂ ^{2 in} the range of 2000 to 6000. ² and the ratio H ₃ ² / H ₂ ² of the altitude energy spectrum H ₂ ² of the first uneven surface 103 at a spatial frequency of 0.1 μm ^{−1 is} in the range of 30-60.

  By providing the first concavo-convex surface 103 exhibiting a specific spatial frequency distribution defined using the “elevation energy spectrum” as described above, the antiglare film of the present invention exhibits excellent antiglare properties, A high contrast and a high glare-suppressing property are compatible, and further whitening can be effectively suppressed.

  Below, the energy spectrum of the altitude of the 1st uneven surface which the glare-proof layer 102 has first is demonstrated. FIG. 2 is a perspective view schematically showing the surface of the antiglare film of the present invention. As shown in FIG. 2, the antiglare film 1 of the present invention includes an antiglare layer having a first uneven surface composed of fine unevenness 2. The “elevation of the first concavo-convex surface” referred to in the present invention is a virtual height having the height at the lowest point of the first concavo-convex surface at an arbitrary point P on the first concavo-convex surface of the antiglare film 1. It means a linear distance in the main normal direction 5 (normal direction in the virtual plane) of the antiglare film from the plane (altitude is 0 μm as a reference). As shown in FIG. 2, when the orthogonal coordinates in the antiglare film plane are displayed as (x, y), the elevation of the first uneven surface is a two-dimensional function h (x, y) of the coordinates (x, y). ). In FIG. 2, the entire surface of the antiglare film is displayed on the projection surface 3.

The elevation of the first concavo-convex surface can be obtained from the three-dimensional information of the surface shape measured by an apparatus such as a confocal microscope, an interference microscope, an atomic force microscope (AFM) or the like. The horizontal resolution required for the measuring instrument is at least 5 μm or less, preferably 2 μm or less, and the vertical resolution is at least 0.1 μm or less, preferably 0.01 μm or less. As a non-contact three-dimensional surface shape / roughness measuring device suitable for this measurement, New View 5000 series (manufactured by Zygo Corporation, available from Zygo Corporation in Japan), three-dimensional microscope PLμ2300 (manufactured by Sensofar), etc. Can be mentioned. Since the resolution of the energy spectrum of the altitude needs to be 0.01 μm ⁻¹ or less, the measurement area is preferably at least 200 μm × 200 μm, more preferably 500 μm × 500 μm.

Next, a method for obtaining the energy spectrum of the altitude from the two-dimensional function h (x, y) representing the altitude will be described. First, from the two-dimensional function h (x, y), a two-dimensional function H (f _x, f _y) by a two-dimensional Fourier transform defined by the following formula (1) is obtained.

f _x and f _y are the x and y directions of the spatial frequency, respectively, with the dimension of reciprocal length. Further, in Expression (1), π is a pi and i is an imaginary unit. The resulting two-dimensional function H (f _x, f _y) by squaring the energy spectrum ^{_{H 2 (f x, f y}} ) of altitude can be obtained. The energy spectrum ^{_{H 2 (f x, f y}} ) represents the spatial frequency distribution of the first uneven surface antiglare layer has.

  The method for obtaining the energy spectrum of the altitude of the first uneven surface of the antiglare layer will be described more specifically. The three-dimensional information of the surface shape actually measured by the above confocal microscope, interference microscope, atomic force microscope or the like is generally obtained as discrete values, that is, elevations corresponding to a large number of measurement points. FIG. 3 is a schematic diagram showing a state in which the function h (x, y) representing the altitude is obtained discretely. As shown in FIG. 3, the orthogonal coordinates in the antiglare film plane are displayed as (x, y), and the line divided for each Δx in the x axis direction and Δy in the y axis direction on the projection plane 3 of the antiglare film. If the line divided | segmented for every is shown with a broken line, the elevation of the 1st uneven | corrugated surface will be obtained as a discrete elevation value for every intersection of each broken line on the projection surface 3 of an anti-glare film in actual measurement.

  The number of altitude values obtained is determined by the measurement range and Δx and Δy. As shown in FIG. 3, when the measurement range in the x-axis direction is X = MΔx and the measurement range in the y-axis direction is Y = NΔy, The number of altitude values obtained is (M + 1) × (N + 1).

  As shown in FIG. 3, the coordinates of the point of interest A on the projection surface 3 of the antiglare film are (jΔx, kΔy) [j is 0 or more and M or less, and k is 0 or more and N or less. ], The elevation of the point P on the first uneven surface of the antiglare film corresponding to the point of interest A can be expressed as h (jΔx, kΔy).

  The measurement intervals Δx and Δy depend on the horizontal resolution of the measuring device, and in order to accurately evaluate the first uneven surface, both Δx and Δy are preferably 5 μm or less, as described above, preferably 2 μm or less. It is more preferable. Further, as described above, the measurement ranges X and Y are both preferably 200 μm or more, and more preferably 500 μm or more.

Thus, in actual measurement, a function representing the elevation of the first uneven surface is obtained as a discrete function h (x, y) having (M + 1) × (N + 1) values. Thus, a discrete function H (f _x, f _y) by a discrete Fourier transform defined by obtained by measuring discrete function h (x, y) and the following formula (2) is Motomari, discrete function H (f _x, f discrete function H ² (f _x of energy spectrum by squaring _y), f _y) is determined. In the following formula (2), l is an integer from − (M + 1) / 2 to (M + 1) / 2 and m is an integer from − (N + 1) / 2 to (N + 1) / 2. Also, Delta] f _x and Delta] f _y are the spatial frequency intervals of x and y directions, it is defined by the following formulas (3) and (4). Delta] f _x and Delta] f _y correspond to the horizontal resolution of the energy spectrum of the altitude.

  FIG. 4 is an example of a diagram in which the elevation of the first uneven surface of the antiglare layer provided in the antiglare film of the present invention is represented by a two-dimensional discrete function h (x, y). In FIG. 4, the altitude is indicated by a gradation of white and black. The discrete function h (x, y) shown in FIG. 4 has 512 × 512 values, and the horizontal resolutions Δx and Δy are 1.66 μm.

FIG. 5 shows the energy spectrum H ² (f _x , f _y ) of the altitude obtained by discrete Fourier transform of the two-dimensional function h (x, y) shown in FIG. 4 with a white and black gradation. Is. Elevation of the energy spectrum _{^{H 2 (f x, f y}} ) shown in FIG. 5 is also a discrete function having a 512 × 512 pieces of value, the horizontal resolution Delta] f _x and Delta] f _y of the energy spectrum of the altitude 0.0012μm ^-1 .

As in the example shown in FIG. 4, the first uneven surface of the anti-glare layer provided in the anti-glare film of the present invention is made of randomly formed unevenness, so the energy spectrum of the altitude is as shown in FIG. 5. In addition, it is symmetric about the origin. Therefore, sectional certain spatial frequencies (some f _x or f _y) of altitude in the energy spectrum ^{_{H 2 (f x, f y}} ) is passing through the origin of the energy spectrum ^{_{H 2 (f x, f y}} ) is a two-dimensional function It can be obtained more. 6, showing a cross section of an f _x = 0 of the energy spectrum ^{_{H 2 (f x, f y}} ) shown in FIG. In FIG. 6, the energy spectrum H ₁ ² of the elevation of the first uneven surface at a spatial frequency of 0.01 μm ⁻¹ is 36.5, and the energy spectrum H ₂ ² of the elevation of the first uneven surface at a spatial frequency of 0.1 μm ⁻¹ is The energy spectrum H ₃ ² of the elevation of the first uneven surface at 0.0068 and a spatial frequency of 0.04 μm ⁻¹ is 0.32, and therefore the ratio H ₁ ² / H ₂ ² is 5349 and the ratio H ₃ ² / H. ₂ ² is calculated as 48.

As described above, in the present invention, the ratio H between the energy spectrum H ₁ ² of the elevation of the first uneven surface at a spatial frequency of 0.01 μm ⁻¹ and the energy spectrum H ₂ ² of the elevation at a spatial frequency of 0.1 μm ⁻¹ . ₁ ² / H ₂ ² is in the range of 2000 to 6000. An altitude energy spectrum ratio H ₁ ² / H ₂ ² of less than 2000 indicates that the first concavo-convex surface contains a lot of short-period components of less than 10 μm, and in this case, whitening tends to occur. . That is, a short-period component of less than 10 μm included in the first uneven surface does not contribute to the antiglare property effectively, but causes light incident on the first uneven surface to scatter and causes whitening. In addition, the ratio H ₁ ² / H ₂ ² exceeding 6000 indicates that the first uneven surface has a large number of irregular shapes having a long period of 100 μm or more and a small number of irregular patterns having a short period of less than 10 μm. . In such a case, the glare tends to occur when the antiglare film is disposed in a high-definition image display device.

In order to more effectively suppress whitishness and glare, the altitude energy spectrum ratio H ₁ ² / H ₂ ² is preferably in the range of 3000 to 6000, preferably in the range of 4000 to 6000. It is more preferable.

In the present invention, the energy spectrum H ₃ ² elevation of first uneven surface in a spatial frequency 0.04 .mu.m ^-1, the ratio H ₃ ² / H of the energy spectrum H ₂ ² elevation in a spatial frequency 0.1 [mu] m ^-1 ₂ ² is in the range of 30-60, and preferably in the range of 40-55. An altitude energy spectrum ratio H ₃ ² / H ₂ ² of less than 30 indicates that the first concavo-convex surface contains a large number of short-period components of less than 10 μm and is likely to be whitish. In addition, the ratio H ₃ ² / H ₂ ² exceeding 60 indicates that the first uneven surface has many uneven shapes with a short period of less than 25 μm. In such a case, reflection of external light cannot be effectively prevented, and sufficient antiglare performance cannot be obtained.

The ratio H ₄ ² / H ₂ ² between the energy spectrum H ₄ ² of the elevation of the first uneven surface at a spatial frequency of 0.06 μm ⁻¹ and the energy spectrum H ₂ ² of the elevation at a spatial frequency of 0.1 μm ⁻¹ is 10 The above is preferable. The fact that the ratio H ₄ ² / H ₂ ^{2 of the} altitude energy spectrum is less than 10 means that the first concavo-convex surface has many concavo-convex shapes with a long period of 100 μm or more and few concavo-convex shapes with a short period of less than 17 μm. Is shown. In such a case, glare may occur when the antiglare film is placed in a high-definition image display device. In order to suppress the glare more effectively, the ratio H ₄ ² / H ₂ ² is more preferably 12 or more.

[Inclination angle of the first uneven surface]
The first uneven surface 103 of the antiglare layer 102 preferably includes 95% or more of a surface (a minute surface) having an inclination angle of 5 ° or less. If the ratio of the surface with an inclination angle of 5 ° or less is less than 95%, the inclination angle of the uneven surface becomes steep, condensing light from the surroundings, and the display surface is whitened as a whole. It becomes easy to do. In order to suppress such a condensing effect and effectively prevent whitishness, the higher the ratio of the surface whose inclination angle is 5 ° or less, the better, preferably 97% or more, More preferably, it is 99% or more.

  “The inclination angle of the first uneven surface” refers to the unevenness in the main normal direction 5 of the antiglare film at an arbitrary point P on the first uneven surface of the antiglare film 1 with reference to FIG. This means an angle (surface inclination angle) ψ formed by the local normal 6 added. The inclination angle of the first concavo-convex surface can also be obtained from the three-dimensional information of the surface shape measured by an apparatus such as a confocal microscope, an interference microscope, an atomic force microscope (AFM), and the like, similar to the altitude.

  FIG. 7 is a schematic diagram for explaining a method of measuring the inclination angle of the first uneven surface. A specific method for determining the tilt angle will be described with reference to FIG. 7. First, a point of interest A on a virtual plane FGHI indicated by a dotted line is determined, and the vicinity of the point of interest A on the x-axis passing therethrough is determined. In addition, points B and D are almost symmetrical with respect to the point A, and points C and E are almost symmetrical with respect to the point A in the vicinity of the point of interest A on the y-axis passing through the point A. Points Q, R, S, and T on the first uneven surface of the antiglare film corresponding to B, C, D, and E are determined. In addition, in FIG. 7, the orthogonal coordinate in the anti-glare film surface is displayed by (x, y), and the coordinate of the anti-glare film thickness direction is displayed by z. The plane FGHI is parallel to the x axis passing through the point C on the y axis and parallel to the x axis passing through the point E on the y axis and to the y axis passing through the point B on the x axis. It is a surface formed by the respective intersections F, G, H, and I with a straight line and a straight line passing through the point D on the x-axis and parallel to the y-axis. In FIG. 7, the actual position of the anti-glare film surface is drawn with respect to the plane FGHI, but the actual position of the anti-glare film surface depends on the position taken by the point of interest A. May come above or below.

  The inclination angle is the actual anti-glare corresponding to the point P on the first uneven surface of the actual antiglare film corresponding to the point of interest A and the four points B, C, D, E taken in the vicinity of the point of interest A. Four polygon planes stretched by a total of five points Q, R, S, and T on the first uneven surface of the glare film, that is, normal vectors 6a, 6b, and 6c of four triangles PQR, PRS, PST, and PTQ. , 6d averaged, the polar angle of the average normal vector (the average normal vector is synonymous with the local normal 6 with the irregularities shown in FIG. It can be obtained by obtaining from three-dimensional information. After obtaining the tilt angle for each measurement point, a histogram is calculated.

  FIG. 8 is a graph showing an example of a histogram of the inclination angle distribution of the first uneven surface of the antiglare layer. In the graph shown in FIG. 8, the horizontal axis is the inclination angle, and is divided in increments of 0.5 °. For example, the leftmost vertical bar shows the distribution of a set having an inclination angle in the range of 0 to 0.5 °, and the angle increases by 0.5 ° as going to the right. In FIG. 8, the lower limit value is displayed for every two scales on the horizontal axis. For example, a portion with “1” on the horizontal axis is a distribution of a set whose inclination angle is in the range of 1 to 1.5 °. Indicates. In addition, the vertical axis represents the distribution of the tilt angle, which is a value that becomes 1 (100%) when summed up. In this example, the ratio of the surface having an inclination angle of 5 ° or less is approximately 100%.

[Maximum cross-sectional height Rt of the first uneven surface]
As for the 1st uneven surface 103 of the glare-proof layer 102, it is preferable that the largest cross-sectional height Rt based on the prescription | regulation of JISB0601 is 0.3-1 micrometer. When the maximum cross-sectional height Rt is less than 0.3 μm, the antiglare property may be insufficient. On the other hand, when the maximum cross-sectional height Rt exceeds 1 μm, whitening may occur, and the unevenness of the uneven shape may be reduced, resulting in glare.

[Configuration of antiglare layer]
The antiglare layer 102 is a translucent resin layer, and is formed of, for example, an active energy ray curable resin such as an ultraviolet curable resin or an electron beam curable resin; a thermosetting resin; a thermoplastic resin; a metal alkoxide or the like. can do. Among these, active energy ray-curable resins are preferred because they have high hardness and can impart high scratch resistance. When an active energy ray curable resin, a thermosetting resin, or a metal alkoxide is used, the antiglare layer 102 is formed by curing the resin by irradiation or heating with an active energy ray.

  The active energy ray-curable resin can contain a polyfunctional (meth) acrylate compound. The polyfunctional (meth) acrylate compound is a compound having at least two (meth) acryloyloxy groups in the molecule. The active energy ray-curable resin can contain one or more polyfunctional (meth) acrylate compounds.

  Specific examples of the polyfunctional (meth) acrylate compound include ester compounds of polyhydric alcohol and (meth) acrylic acid, urethane (meth) acrylate compounds, polyester (meth) acrylate compounds, epoxy (meth) acrylate compounds, etc. ) A polyfunctional polymerizable compound containing two or more acryloyl groups.

  Examples of the polyhydric alcohol include ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, tetrapropylene glycol, polypropylene glycol, propanediol, butanediol, and pentanediol. , Hexanediol, neopentyl glycol, 2-ethyl-1,3-hexanediol, 2,2'-thiodiethanol, divalent alcohols such as 1,4-cyclohexanedimethanol; trimethylolpropane, glycerol, pentaerythritol , Trihydric or higher alcohols such as diglycerol, dipentaerythritol and ditrimethylolpropane.

  Specific examples of the esterified product of polyhydric alcohol and (meth) acrylic acid include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, neopentyl glycol di ( (Meth) acrylate, trimethylolpropane tri (meth) acrylate, trimethylolethane tri (meth) acrylate, tetramethylolmethane tri (meth) acrylate, 1,6-hexanediol di (meth) acrylate, tetramethylolmethanetetra (meth) Acrylate, pentaglycerol tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, glycerin tri (meth) acrylate, dipenta Suritorutori (meth) acrylate containing, dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate.

  Examples of the urethane (meth) acrylate compound include urethanized reaction products of an isocyanate having a plurality of isocyanate groups in one molecule and a (meth) acrylic acid derivative having a hydroxyl group. The organic isocyanate having a plurality of isocyanate groups in one molecule includes two in one molecule such as hexamethylene diisocyanate, isophorone diisocyanate, tolylene diisocyanate, naphthalene diisocyanate, diphenylmethane diisocyanate, xylylene diisocyanate, dicyclohexylmethane diisocyanate. In addition to organic isocyanates having an isocyanate group, organic isocyanates having three isocyanate groups in one molecule obtained by isocyanurate-modified, adduct-modified or biuret-modified these organic isocyanates can be mentioned.

  Specific examples of the (meth) acrylic acid derivative having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, pentaerythritol triacrylate.

  A suitable example of the polyester (meth) acrylate compound is a polyester (meth) acrylate obtained by reacting a hydroxyl group-containing polyester with (meth) acrylic acid. The hydroxyl group-containing polyester preferably used is a hydroxyl group-containing polyester obtained by an esterification reaction between a polyhydric alcohol and a carboxylic acid, a compound having a plurality of carboxyl groups and / or an anhydride thereof.

  Examples of the polyhydric alcohol include the same compounds as those described above. A compound having a phenolic hydroxyl group such as bisphenol A can also be used as the polyhydric alcohol. Examples of the carboxylic acid include formic acid, acetic acid, butyl carboxylic acid, benzoic acid and the like. The compounds having a plurality of carboxyl groups and / or anhydrides thereof include maleic acid, phthalic acid, fumaric acid, itaconic acid, adipic acid, terephthalic acid, maleic anhydride, phthalic anhydride, trimellitic acid, cyclohexanedicarboxylic anhydride Thing etc. are mentioned.

  Among the polyfunctional (meth) acrylate compounds as described above, hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, Ester compounds such as tripropylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa (meth) acrylate; hexamethylene diisocyanate and 2-hydroxyethyl (meth) Adduct of acrylate; Adduct of isophorone diisocyanate and 2-hydroxyethyl (meth) acrylate; Adduct of tolylene diisocyanate and 2-hydroxyethyl (meth) acrylate; Adducts of transfected modified isophorone diisocyanate with 2-hydroxyethyl (meth) acrylate; and, it is preferable to use adducts of biuret of isophorone diisocyanate and 2-hydroxyethyl (meth) acrylate. Further, the active energy ray-curable resin preferably contains a urethane (meth) acrylate compound because the cured product exhibits good flexibility.

  The active energy ray-curable resin can contain a monofunctional (meth) acrylate compound in addition to the polyfunctional (meth) acrylate compound. Specific examples of the monofunctional (meth) acrylate compound include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, 2-hydroxyethyl (meth) ) Acrylate, 2-hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate, glycidyl (meth) acrylate, acryloylmorpholine N-vinylpyrrolidone, tetrahydrofurfuryl (meth) acrylate, cyclohexyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isobornyl (meth) acrylate, acetyl (meth) ) Acrylate, benzyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethyl carbitol (meth) acrylate, phenoxy (meth) acrylate, ethylene oxide modified phenoxy (meth) acrylate, Propylene oxide (meth) acrylate, nonylphenol (meth) acrylate, ethylene oxide modified (meth) acrylate, propylene oxide modified nonylphenol (meth) acrylate, methoxydiethylene glycol (meth) acrylate, 2- (meth) acryloyloxyethyl-2-hydroxypropyl Including phthalate, dimethylaminoethyl (meth) acrylate, methoxytriethylene glycol (meth) acrylate and the like. A monofunctional (meth) acrylate compound may be used individually by 1 type, and may use 2 or more types together.

  The active energy ray-curable resin can contain a polymerizable oligomer in addition to the polyfunctional (meth) acrylate compound. By containing a polymerizable oligomer, the hardness of the antiglare layer 102 can be adjusted. As the polymerizable oligomer, only one kind may be used alone, or two or more kinds may be used in combination.

  The polymerizable oligomer is, for example, the aforementioned polyfunctional (meth) acrylate compound, that is, an ester compound of a polyhydric alcohol and (meth) acrylic acid, a urethane (meth) acrylate compound, a polyester (meth) acrylate compound, or an epoxy (meth) ) It can be an oligomer such as a dimer such as an acrylate or a trimer.

  As another example of the polymerizable oligomer, a urethane (meta) obtained by reacting a polyisocyanate having at least two isocyanate groups in the molecule with a polyhydric alcohol having at least one (meth) acryloyloxy group. ) Acrylate oligomers. Specific examples of the polyisocyanate include hexamethylene diisocyanate, isophorone diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, a polymer of xylylene diisocyanate, and the like. A specific example of the polyhydric alcohol having at least one (meth) acryloyloxy group is a hydroxyl group-containing (meth) acrylic ester obtained by an esterification reaction of a polyhydric alcohol and (meth) acrylic acid, For example, 1,3-butanediol, 1,4-butanediol, 1,6-hexanediol, diethylene glycol, triethylene glycol, neopentyl glycol, polyethylene glycol, polypropylene glycol, trimethylolpropane, glycerin, penta Including erythritol, dipentaerythritol and the like. In this polyhydric alcohol having at least one (meth) acryloyloxy group, a part of the alcoholic hydroxyl group of the polyhydric alcohol is esterified with (meth) acrylic acid, and the alcoholic hydroxyl group is present in the molecule. It remains.

  Furthermore, as another example of the polymerizable oligomer, a polyester (meta) obtained by reacting a compound having a plurality of carboxyl groups and / or an anhydride thereof with a polyhydric alcohol having at least one (meth) acryloyloxy group. ) Acrylate oligomers. Examples of the compound having a plurality of carboxyl groups and / or anhydrides thereof are the same as those described above for the polyester (meth) acrylate compound. Examples of the polyhydric alcohol having at least one (meth) acryloyloxy group include those described for the aforementioned urethane (meth) acrylate oligomer.

  Other examples of urethane (meth) acrylate oligomers include compounds obtained by reacting isocyanates with hydroxyl groups of a hydroxyl group-containing polyester, a hydroxyl group-containing polyether, or a hydroxyl group-containing (meth) acrylic acid ester. The hydroxyl group-containing polyester preferably used is a hydroxyl group-containing polyester obtained by an esterification reaction of a polyhydric alcohol, a carboxylic acid, a compound having a plurality of carboxyl groups, and / or an anhydride thereof. Examples of the polyhydric alcohol, the compound having a plurality of carboxyl groups, and / or the anhydride thereof are the same as those described for the polyester (meth) acrylate compound.

  The hydroxyl group-containing polyether preferably used is a hydroxyl group-containing polyether obtained by adding one or more alkylene oxides and / or ε-caprolactone to a polyhydric alcohol. The polyhydric alcohol may be the same as that which can be used for the aforementioned hydroxyl group-containing polyester.

  Examples of the hydroxyl group-containing (meth) acrylic acid ester preferably used include the same as those described for the urethane (meth) acrylate oligomer as the polymerizable oligomer described above. The isocyanate is preferably a compound having one or more isocyanate groups in the molecule, and more preferably a divalent isocyanate compound such as tolylene diisocyanate, hexamethylene diisocyanate, or isophorone diisocyanate.

  Specific examples of the thermosetting resin include thermosetting urethane resin composed of acrylic polyol and isocyanate prepolymer; phenol resin; urea melamine resin; epoxy resin; unsaturated polyester resin;

  Specific examples of the thermoplastic resin include cellulose derivatives such as acetylcellulose, nitrocellulose, acetylbutylcellulose, ethylcellulose, methylcellulose; vinyl acetate and copolymers thereof, vinyl chloride and copolymers thereof, vinylidene chloride and copolymers thereof Acetal resins such as polyvinyl formal and polyvinyl butyral; (meth) acrylic resins such as acrylic resins and copolymers thereof, methacrylic resins and copolymers; polystyrene resins; polyamides Resin; Polyester resin; Polycarbonate resin.

  As the metal alkoxide, a silicon oxide matrix or the like using a silicon alkoxide material as a raw material can be used. Specifically, it is tetramethoxysilane, tetraethoxysilane or the like, and can be made into an inorganic or organic-inorganic composite matrix by hydrolysis or dehydration condensation.

  The antiglare layer 102 may contain translucent fine particles that cause internal scattering, but preferably does not contain such translucent fine particles. When translucent fine particles are contained, although there is a tendency to improve glare, it tends to cause whitishness. Also, the contrast tends to decrease.

  Translucent fine particles include organic fine particles made of (meth) acrylic resin, melamine resin, polyethylene, polystyrene, organic silicone resin, acrylic-styrene copolymer, calcium carbonate, silica, aluminum oxide, barium carbonate, sulfuric acid. Mention may be made of inorganic fine particles made of barium, titanium oxide, glass or the like. The weight average particle diameter of the translucent fine particles is preferably about 0.5 to 20 μm (more preferably 5 to 10 μm), and the shape is preferably spherical or substantially spherical.

  The thickness of the glare-proof layer 102 is about 1-20 micrometers normally, Preferably it is 3-15 micrometers. The “thickness of the antiglare layer” refers to the maximum thickness from the surface on the translucent support layer 101 side to the opposite surface (first uneven surface 103) of the antiglare layer 102.

[Anti-glare layer haze]
The total haze and internal haze of the antiglare layer 102 are each preferably 5% or less, more preferably 3% or less, and even more preferably less than 1.5%. Moreover, the surface haze resulting from the 1st uneven surface 103 of the glare-proof layer 102 is preferably 1.2% or less, and more preferably 1% or less. The preferable ranges of the total haze, internal haze, and surface haze of the antiglare film including the antiglare layer 102 on the translucent support layer 101 are the same.

  The “total haze” is the haze of the antiglare layer 102 obtained by the above formula [A]. The “internal haze” is a haze other than the haze (surface haze) caused by the first uneven surface 103 among all the hazes.

  When the total haze and internal haze of the antiglare layer 102 are too high, the contrast tends to decrease. Moreover, when the surface haze resulting from the 1st uneven | corrugated surface 103 is too high, it will be easy to generate | occur | produce whiteness by surface irregular reflection.

  The total haze, internal haze, and surface haze of the antiglare film or antiglare layer 102 can be measured as follows. First, in order to prevent warpage of the object to be measured, an optically transparent pressure-sensitive adhesive is used to bond the object to be measured to the glass substrate so that the first uneven surface 103 becomes the surface, thereby producing a measurement sample. The total haze value is measured for the measurement sample. For the total haze value, the total light transmittance Tt and the diffused light transmittance Td are determined using a haze transmittance meter (for example, a haze meter “HM-150” manufactured by Murakami Color Research Laboratory Co., Ltd.) in accordance with JIS K 7136. Measured and calculated by the above formula [A].

Next, a triacetyl cellulose film having substantially zero haze is bonded to the first concavo-convex surface 103 using glycerin, and the haze is measured in the same manner as the measurement of total haze. The haze can be regarded as internal haze because it is canceled out by the triacetyl cellulose film to which the haze due to the first uneven surface 103 is bonded. Accordingly, the surface haze is represented by the following formula [B]:
Surface haze (%) = Total haze (%)-Internal haze (%) [B]
It can be obtained more.

<Method for producing antiglare film>
The antiglare film of the present invention is formed on the surface of a resin layer made of a curable resin such as an ultraviolet curable resin or a thermoplastic resin, which is laminated on the translucent support layer 101, and an uneven surface of a mold. (Hereinafter referred to as “second uneven surface”) can be suitably manufactured by a method including a step of transferring the uneven shape. The uneven shape on the second uneven surface is a transfer structure having an uneven shape on the first uneven surface 103 of the antiglare layer 102. A mold preferably used in the manufacturing method and a manufacturing method thereof will be described later.

  The resin layer to be the antiglare layer 102 includes a resin component (active energy ray curable resin, thermosetting resin, thermoplastic resin, metal alkoxide, or the like) that forms the antiglare layer 102, and an organic solvent or the like as necessary. It is formed by applying a coating liquid containing other components such as a solvent, a leveling agent, a dispersant, an antistatic agent, and an antifouling agent on the translucent support layer 101 and drying it as necessary. Can do. When an ultraviolet curable resin is used as the resin component, the coating liquid further contains a photopolymerization initiator (radical polymerization initiator).

  Examples of the photopolymerization initiator include acetophenone photopolymerization initiator, benzoin photopolymerization initiator, benzophenone photopolymerization initiator, thioxanthone photopolymerization initiator, triazine photopolymerization initiator, and oxadiazole photopolymerization initiator. An initiator or the like can be used. Examples of the photopolymerization initiator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetraphenyl-1,2 '-Biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene compound and the like can also be used. The usage-amount of a photoinitiator is 0.5-20 weight part normally with respect to 100 weight part of resin components contained in a coating liquid, Preferably it is 1-5 weight part.

  Specific examples of the organic solvent include aliphatic hydrocarbons such as hexane, cyclohexane, and octane; aromatic hydrocarbons such as toluene and xylene; alcohols such as ethanol, 1-propanol, isopropanol, 1-butanol, and cyclohexanol. Ketones such as methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; esters such as ethyl acetate, butyl acetate and isobutyl acetate; ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene Glycol ethers such as glycol monoethyl ether; ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether Esterified glycol ethers such as diacetate; cellsolves such as 2-methoxyethanol, 2-ethoxyethanol, 2-butoxyethanol; 2- (2-methoxyethoxy) ethanol, 2- (2-ethoxyethoxy) ethanol , Carbitols such as 2- (2-butoxyethoxy) ethanol. A coating liquid can contain 1 type, or 2 or more types of organic solvents.

  Application of the coating liquid onto the translucent support layer 101 is performed by, for example, a gravure coating method, a micro gravure coating method, a rod coating method, a knife coating method, an air knife coating method, a kiss coating method, or a die coating method. Can do.

  Various surface treatments may be applied to the surface of the translucent support layer 101 (the surface on the resin layer side) for the purpose of improving the coating property of the coating solution or improving the adhesion to the antiglare layer 102. Examples of the surface treatment include corona discharge treatment, glow discharge treatment, acid surface treatment, alkali surface treatment, and ultraviolet irradiation treatment. Further, for example, another layer such as a primer layer may be formed on the translucent support layer 101, and a resin layer may be formed on the other layer.

  Next, the second uneven surface of the mold is pressed onto the surface of the obtained resin layer to transfer the uneven shape of the second uneven surface to the surface of the resin layer, and then the first uneven surface is peeled off from the mold. An antiglare film comprising the antiglare layer 102 having 103 and the translucent support layer 101 is obtained. When the resin layer is composed of a curable resin, the active energy ray is irradiated from the translucent support layer 101 side in a state where the second uneven surface of the mold is in close contact with the surface of the resin layer, or The resin layer is cured by heating.

  The active energy ray can be appropriately selected from ultraviolet rays, electron rays, near ultraviolet rays, visible light, near infrared rays, infrared rays, X-rays, etc., depending on the type of curable resin contained in the coating liquid. Among them, ultraviolet rays and electron beams are preferable, and ultraviolet rays are particularly preferable because they are easy to handle and high energy can be obtained.

  As the ultraviolet light source, for example, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, or the like can be used. An ArF excimer laser, a KrF excimer laser, an excimer lamp, synchrotron radiation, or the like can also be used.

  As the electron beam, 50 to 1000 keV, preferably 100 to 300 keV emitted from various electron beam accelerators such as cockroft walton type, bandegraph type, resonance transformation type, insulation core transformation type, linear type, dynamitron type, and high frequency type. An electron beam having the following energy can be exemplified.

<Mold for producing antiglare film and method for producing the same>
The mold for producing the antiglare film of the present invention has a second uneven structure in which the outermost surface (the outermost surface on the side opposite to the base material) has the first uneven surface 103 of the antiglare layer 102. This mold is suitable for producing the above-described antiglare film according to the present invention, which is constituted by an uneven surface. The metal mold | die of this invention has a laminated structure which contains a base material, a 1st copper plating layer, and a nickel plating layer in this order. The metal mold | die of this invention can further further contain the protective layer which has as a main component the carbon laminated | stacked on a nickel plating layer arbitrarily. Moreover, the 2nd copper plating layer and silver plating layer which are arrange | positioned between a base material and a 1st copper plating layer can also be included arbitrarily.

In addition, the second uneven surface of the mold has the following spatial frequency distribution characteristics:
The ratio H ₁ ² / H ₂ ² between the energy spectrum H ₁ ² of the altitude of the second uneven surface at a spatial frequency of 0.01 μm ⁻¹ and the energy spectrum H ₂ ² of the altitude at a spatial frequency of 0.1 μm ⁻¹ is 2000 to 2000 in the range of 6000 (preferably in the range of 3,000 to 6,000), and the energy spectrum H ₃ ² elevation of a second uneven surface in the spatial frequency 0.04 .mu.m ^-1, elevation in the spatial frequency 0.1 [mu] m ^-1 The ratio H ₃ ² / H ₂ ² to the energy spectrum H ₂ ² is in the range of 30 to 60 (preferably in the range of 40 to 55).
Satisfied. The second irregular surface also preferably has the following spatial frequency distribution characteristics:
The ratio H ₄ ² of the altitude energy spectrum H ₄ ² of the second uneven surface at a spatial frequency of 0.06 μm ⁻¹ and the altitude energy spectrum H ₂ ² of the second uneven surface at a spatial frequency of 0.1 μm ⁻¹ . / H ₂ ² is 10 or more (more preferably 12 or more),
Satisfied.

  The spatial frequency distribution characteristic indicated by the second uneven surface is the same as the spatial frequency distribution characteristic of the first uneven surface 103. Therefore, by using the mold of the present invention, an antiglare film having the first uneven surface 103 showing the spatial frequency distribution characteristic equivalent to the spatial frequency distribution characteristic of the mold is manufactured with good controllability and reproducibility. Can do.

  In addition, the mold of the present invention in which a nickel plating layer is arranged on the outermost surface (immediately below when a protective layer containing carbon as a main component is provided) is resistant to the occurrence of fine cracks in the nickel plating layer. Are better. Moreover, according to the metal mold | die of this invention, generation | occurrence | production of the glare resulting from the unintended fine unevenness | corrugation formed in the 1st uneven surface 103 of the glare-proof layer 102 by the transfer of a crack structure can be prevented.

The mold of the present invention has the following steps:
A third plating step for forming a first copper plating layer on the substrate;
A polishing step for polishing the surface of the first copper plating layer;
A photosensitive resin film forming step of forming a photosensitive resin film on the polished surface of the first copper plating layer;
An exposure process for exposing a pattern on the photosensitive resin film;
A developing process for developing the photosensitive resin film on which the pattern is exposed;
Performing a first etching process using the developed photosensitive resin film as a mask, and forming an uneven shape on the polished surface of the first copper plating layer;
A photosensitive resin film peeling step for peeling the photosensitive resin film;
A second etching step of dulling the concavo-convex shape formed by the first etching step by a second etching process;
A fourth plating step of forming a nickel plating layer on the concavo-convex surface of the first copper plating layer made of the concavo-convex shape blunted by the second etching treatment;
It can manufacture suitably by the method containing these. Moreover, the 1st plating process which forms a 2nd copper plating layer on the base-material surface, and the 2nd plating process which forms a silver plating layer on a 2nd copper plating layer are provided before a 3rd plating process. Alternatively, after the fourth plating step, a vapor deposition step of forming a protective layer mainly composed of carbon by vapor deposition may be provided. Hereinafter, the mold manufacturing method will be described in detail with reference to FIG. 9 schematically showing a cross section of the mold in each step.

(1) First Plating Step This step is an optional step for forming a second copper plating layer 71 as a base on the surface of the substrate 7 used in the mold [FIG. 9 (a)]. By forming the second copper plating layer 71 on the surface of the base material 7, defects existing on the surface of the base material 7 can be effectively eliminated. That is, by performing copper plating having a high covering property and a strong smoothing action, it is possible to fill a minute unevenness or void of the base material 7 and form a flat and glossy surface. Further, since the copper plating layer has good workability, polishing processing described later is facilitated.

  The copper used in the first plating step may be a copper pure metal or an alloy mainly composed of copper. Copper plating may be performed by electrolytic plating or electroless plating, but is usually performed by electrolytic plating.

  If the second copper plating layer 71 is too thin, the influence of the surface of the base material 7 cannot be completely eliminated. Therefore, the thickness is preferably 50 μm or more. Moreover, the thickness of the 2nd copper plating layer 71 is about 500 micrometers or less normally.

  The base material 7 can be made of aluminum or iron from the viewpoint of cost and the like, and is preferably made of light aluminum from the viewpoint of handleability. The aluminum and iron here may be pure metals, respectively, or may be an alloy mainly composed of aluminum or iron.

  The shape of the base material 7 can be an appropriate shape that is conventionally employed in the field, and may be, for example, a flat plate shape, or a columnar or cylindrical roll. If a mold is produced using a roll-shaped substrate, there is an advantage that the antiglare film can be produced in a continuous roll shape.

(2) Second plating step This step is an optional step of forming a silver plating layer 72 on the second copper plating layer 71 formed on the surface of the substrate 7 in the first plating step. [FIG. 9B]. Since this silver plating layer 72 has low adhesion to the first copper plating layer 8 formed in the subsequent third plating step, it is a convenient layer when the substrate 7 is reused. That is, the upper layer can be easily peeled off from the first copper plating layer 8 when removing the uneven surface of the mold once produced. Since the base layer 7 from which the upper layer is peeled off and reused from the first copper plating layer 8 already has the second copper plating layer 71 and the silver plating layer 72, the first plating step and the second plating are performed. No process is required. Further, after the first plating step, if the surface of the second copper plating layer 71 on the base material 7 is machined so as to have a desired mechanical accuracy, the machine is used when the base material 7 is reused. Processing is also unnecessary.

  The silver plating layer 72 formed in the second plating step is preferably formed by displacement silver plating. The replacement silver plating is performed by applying a replacement silver plating solution. The coating method can be a conventionally known method such as spin coating, spray coating, or dip coating.

  The replacement silver plating solution is a solution containing a soluble silver salt and a complexing agent. As the soluble silver salt, any soluble salt that generates silver ions in a solution can be used, and specific examples thereof are silver sulfate, silver sulfite, silver carbonate, silver acetate, silver lactate, silver sulfosuccinate. , Silver nitrate, Silver organic sulfonate, Silver borofluoride, Silver citrate, Silver tartrate, Silver gluconate, Silver sulfamate, Silver oxalate, Silver oxide, Silver methanesulfonate, Silver ethanesulfonate, Silver acetate, Silver lactate, Contains silver citrate. Examples of the complexing agent include sulfur-containing compounds such as thioureas, sulfides, and mercaptans.

  Since it is desired that the silver plating layer 72 does not affect the shape of the second copper plating layer 71 formed in the first plating step, it is preferable that the silver plating layer 72 is thin. Specifically, it is preferably 1 μm or less, and more preferably 0.5 μm or less.

  Before performing the second plating step, the surface of the second copper plating layer 71 is preferably machined to a desired accuracy by polishing. This is because the surface is not always completely smooth if the second copper plating layer 71 is formed in the first plating step. Further, as described above, if the machining process having a desired mechanical accuracy is performed on the surface of the second copper plating layer 71 after the first plating step, the base material 7 can be easily reused. As a method for polishing the surface of the second copper plating layer 71, mechanical polishing using a rotating grindstone or mirror cutting using a cutting tool is preferably used.

(3) Third Plating Step This step is a step of forming the first copper plating layer 8 on the base material (in the case where the first and second plating steps are performed, the silver plating layer 72) [FIG. (C)]. The copper used in the third plating step may be a pure copper metal or an alloy mainly composed of copper, as in the first plating step. Copper plating may be performed by electrolytic plating or electroless plating, but is usually performed by electrolytic plating.

  If the first copper plating layer 8 is too thin, the influence of the surface of the base material 7 cannot be completely eliminated. Therefore, the thickness is preferably 50 μm or more. Moreover, the thickness of the 1st copper plating layer 8 is about 500 micrometers or less normally.

(4) Polishing Step This step is a step of polishing the surface 80 of the first copper plating layer 8 opposite to the silver plating layer 72 [FIG. 9 (c)]. Through this polishing step, the surface 80 of the first copper plating layer 8 is preferably polished in a state close to a mirror surface. This is because the base material 7 (metal plate, metal roll, etc.) is often subjected to machining such as cutting and grinding in order to obtain the desired surface shape. This is because the processed marks remain, and even when the copper plating is applied, the processed marks may remain, and the surface may not be completely smooth in the plated state.

  That is, even if the process described later is performed on the surface on which such processed marks remain, the unevenness such as processed marks may be deeper than the unevenness formed after performing each process. The effect may remain, and when an antiglare film is produced using such a mold, the optical properties may be unexpectedly affected.

  The method for polishing the surface 80 of the first copper plating layer 8 is not particularly limited, and any of a mechanical polishing method, an electrolytic polishing method, and a chemical polishing method can be used. Examples of the mechanical polishing method include super finishing, lapping, fluid polishing, and buffing. Moreover, it is good also considering the surface 80 as a mirror surface by carrying out mirror surface cutting using a cutting tool. The material, shape, etc. of the cutting tool at that time are not particularly limited, and carbide tools, CBN tools, ceramic tools, diamond tools, etc. can be used, but diamond tools are preferably used from the viewpoint of processing accuracy.

  As for the surface roughness of the surface 80 after the polishing step, the center line average roughness Ra based on JIS B 0601 is preferably 0.1 μm or less, and more preferably 0.05 μm or less. If the center line average roughness Ra after polishing is larger than 0.1 μm, the uneven shape of the second uneven surface of the mold finally obtained may be affected by the surface roughness after polishing, which is not preferable. . The lower limit of the center line average roughness Ra is not particularly limited, and is appropriately determined in consideration of processing time, processing cost, and the like.

(5) Photosensitive resin film forming step In this step, a coating solution containing a photosensitive resin is applied to the surface 80 of the first copper plating layer 8 polished by the polishing step described above, and is heated and dried. This is a step of forming the photosensitive resin film 9 [FIG. 9D].

  A conventionally known photosensitive resin can be used as the photosensitive resin. Examples of the negative photosensitive resin having a property of curing the photosensitive part include (meth) acrylic acid ester monomers and prepolymers having a (meth) acrylic group in the molecule, and a mixture of bisazide and diene rubber. Polyvinyl cinnamate compounds and the like can be used. In addition, as a positive photosensitive resin having a property that a photosensitive part is eluted by development and only an unexposed part remains, for example, a phenol resin type or a novolac resin type can be used. If necessary, the photosensitive resin may contain various additives such as a sensitizer, a development accelerator, an adhesion modifier, and a coating property improver.

  In order to form a good coating film, the coating solution preferably contains a solvent. As the solvent, cellosolve solvents, propylene glycol solvents, ester solvents, alcohol solvents, ketone solvents, highly polar solvents, and the like can be used.

  The photosensitive resin film 9 is preferably formed so that the variation coefficient of the film thickness is less than 10%, more preferably 5% or less. Thus, by setting the coefficient of variation of the film thickness to less than a predetermined value and a more uniform film thickness, it is possible to reduce unevenness of the uneven shape on the second uneven surface of the mold obtained. In addition, unevenness of the uneven shape on the first uneven surface of the antiglare film produced using the mold can be suppressed.

  The “variation coefficient of the film thickness of the photosensitive resin film” means a value obtained by dividing the standard deviation of the film thickness of the photosensitive resin film 9 by the average value of the film thickness of the photosensitive resin film 9. That is, the larger the variation coefficient, the more uneven the film thickness is. When the film thickness of the photosensitive resin film 9 is different, the sensitivity in the subsequent exposure process and the development time in the subsequent development process also change. Therefore, when the variation coefficient of the film thickness is 10% or more, the pattern developed on the photosensitive resin film 9 by the developing process also has a large unevenness. As a result, the second uneven surface of the obtained mold A large unevenness also occurs in the uneven shape and the uneven shape of the first uneven surface of the antiglare film.

  The variation coefficient of the film thickness can be obtained by measuring the film thickness of the photosensitive resin film 9 at three or more points and calculating the average value and the standard deviation. In order to obtain the coefficient of variation with high accuracy, it is preferable to measure the thickness of the photosensitive resin film 9 at 10 or more locations.

  As a method for coating and forming the photosensitive resin film 9 so that the variation coefficient of the film thickness is less than 10%, (a) adjusting the kind and amount of the leveling agent added to the coating liquid containing the photosensitive resin. Thereby adjusting the leveling property of the coating liquid, (b) adjusting the dilution ratio of the coating liquid, (c) adopting a suitable coating format, and (d) adjusting the coating conditions. The method etc. can be mentioned.

  As the leveling agent, it is preferable to use a silicone-based leveling agent. When a silicone-based leveling agent is added to the coating solution, the surface tension of the coated coating solution is effectively reduced and the leveling property is improved. Specific examples of silicone leveling agents include alkyl-modified silicone oil, polyether-modified silicone oil, epoxy-modified silicone oil, amino-modified silicone oil, carboxy-modified silicone oil, carbinol-modified silicone oil, alkoxy-modified silicone oil, both-end modified Organically modified silicone oils such as silicone oils, polyester modified silicone oils, aralkyl modified silicone oils and acrylic silicone oils are included.

  A leveling agent may be used individually by 1 type, and may use 2 or more types together. The addition amount of the leveling agent is preferably 0.1 to 5 parts by weight with respect to 100 parts by weight of the photosensitive resin. If the amount of the leveling agent added is too small, the effect of improving the leveling property is difficult to obtain, and if it is too large, the adhesiveness of the photosensitive resin film 9 is lowered or the stability of the coating solution is lowered.

  The content of the photosensitive resin in the coating liquid is preferably 3 to 50% by weight, and more preferably 5 to 20% by weight. When the content of the photosensitive resin exceeds 50% by weight, the leveling property when the coating liquid is applied and dried is insufficient, and the coefficient of variation of the film thickness of the photosensitive resin film 9 may increase. There is. On the other hand, when the content of the photosensitive resin is less than 3% by weight, dripping or the like occurs when the coating liquid is applied and dried, and the variation coefficient of the film thickness of the photosensitive resin film 9 is large. There is a risk.

  As the solvent for diluting the photosensitive resin, the above-mentioned solvents can be used. In order to improve the leveling property, a solvent having a relatively low boiling point such as methanol, ethanol, isopropyl alcohol, and methyl ethyl ketone, and methyl isobutyl ketone are used. It is preferable to use a mixed solvent with a solvent having a relatively high boiling point such as methyl cellosolve, ethyltyl cellosolve, and propylene glycol monomethyl ether.

  As the coating format of the coating liquid, spin coating, roll coating, wire bar coating, and ring coating can be preferably employed. Among these, the ring coat method is particularly preferably employed. The ring coating method is effective as a method for uniformly applying a coating liquid to a cylindrical substrate. In the ring coating method, the coating liquid is applied by moving a disk-shaped coating head surrounding the outer periphery of the cylindrical base material relatively along the cylindrical base material. The cylindrical base material is vertically supported in the coating apparatus, and after the coating liquid is supplied to the disk-shaped coating head surrounding the outer periphery, the coating head is moved from the upper end side to the lower end side of the cylindrical base material. The coating liquid is uniformly applied to the surface of the cylindrical base material by moving it at a predetermined speed. While the coating liquid is applied to the cylindrical substrate, a predetermined amount of the coating liquid is continuously supplied to the coating head. When the ring coating method is adopted, an important parameter for uniformly coating the coating liquid is a relative moving speed of the coating head. Although the relative moving speed of the coating head depends on the viscosity and leveling property of the coating liquid to be coated, it cannot be generally stated, but is preferably 0.5 to 300 mm / second.

  It is preferable to apply a drying treatment by heating after coating the coating liquid. The drying temperature is preferably 20 to 80 ° C, and more preferably 25 to 40 ° C. When the drying temperature is below 20 ° C., the drying time becomes longer, and the possibility of dripping during drying increases. On the other hand, when the drying temperature exceeds 80 ° C., the drying time becomes extremely short, the leveling effect is not exhibited during the drying, and the variation coefficient of the film thickness of the photosensitive resin film 9 may increase.

(6) Exposure Step This step is a step of exposing a predetermined pattern onto the photosensitive resin film 9 formed in the above-described photosensitive resin film forming step [FIG. 9 (e)]. The light source used in the exposure process may be appropriately selected according to the photosensitive wavelength and sensitivity of the photosensitive resin. For example, the g-line (wavelength: 436 nm) of a high-pressure mercury lamp, the h-line (wavelength: 405 nm) of a high-pressure mercury lamp, Mercury lamp i-line (wavelength: 365 nm), semiconductor laser (wavelength: 830 nm, 532 nm, 488 nm, 405 nm, etc.), YAG laser (wavelength: 1064 nm), KrF excimer laser (wavelength: 248 nm), ArF excimer laser (wavelength: 193 nm) F2 excimer laser (wavelength: 157 nm) or the like can be used.

  In order to accurately form the concavo-convex shape on the second concavo-convex surface of the mold, and thus the concavo-convex shape on the first concavo-convex surface of the antiglare film, the pattern is exposed on the photosensitive resin film 9 in a precisely controlled state. More specifically, it is preferable to create a pattern as image data on a computer and draw a pattern based on the image data with a laser beam emitted from a computer-controlled laser head. A laser drawing apparatus for making a printing plate can be used for laser drawing. Examples of such a laser drawing apparatus include Laser Stream FX (manufactured by Sink Laboratories).

  “Pattern” means image data composed of two gradations (for example, image data binarized into white and black) created by a computer or gradations of three or more gradations. Data that can be uniquely converted (matrix data or the like) may also be included. Data that can be uniquely converted to image data includes data in which only the coordinates and gradation of each pixel are stored.

  FIG. 9E schematically shows a state where the pattern is exposed to the photosensitive resin film 9. When the photosensitive resin film 9 is formed of a negative photosensitive resin, the exposed region 91 undergoes a crosslinking reaction of the resin by exposure, and the solubility in a developing solution described later decreases. Therefore, the unexposed area 90 in the development process is dissolved by the developer, and only the exposed area 91 remains, which becomes a mask. On the other hand, when the photosensitive resin film 9 is formed of a positive type photosensitive resin, the exposed region 91 is cut by the bond of the resin by the exposure, so that the solubility in the developer described later increases. Therefore, the area 91 exposed in the development process is dissolved by the developer, and only the unexposed area 90 remains, which becomes a mask.

[Spatial frequency distribution characteristics of exposed pattern]
Pattern exposed on the photosensitive resin film 9 preferably has an energy spectrum is one that has a maximum value within the range of spatial frequencies 0.05 to 0.1 [mu] m ^-1, the spatial frequency 0.007 to 0 More preferably, it has another maximum value in the range of .015 μm ⁻¹ . By using such a pattern showing the spatial frequency distribution characteristics, it is possible to accurately manufacture a mold having the second uneven surface having the spatial frequency distribution characteristics described above.

Maximum value of the energy intensity at a range of spatial frequencies 0.007～0.015Myuemu ^-1 is preferably less than the maximum value of the energy intensity at a range of spatial frequencies 0.05 to 0.1 [mu] m ^-1. Thereby, glare can be suppressed more effectively.

For example, if the energy spectrum of the pattern is image data, the image data is converted into binary image data having two gradations, and then the gradation of the image data is expressed by a two-dimensional function g (x, y). two-dimensional function g (x, y) to Fourier transform the two-dimensional function G (f _x, f _y) were calculated with a two resulting dimensional function G (f _x, f _y) calculated by squaring It is done. x and y represent orthogonal coordinates of the image data plane (e.g., x-direction is horizontal direction of the image data, y direction is the vertical direction of the image data.), f _x and f _y are spatial respective x-direction It represents the frequency and the spatial frequency in the y direction.

  Similarly to the case of obtaining the energy spectrum of the altitude of the first uneven surface 103 of the antiglare layer 102, when obtaining the energy spectrum of the pattern, the two-dimensional function g (x, y) representing the gradation of the image data is Since the gradation for each pixel is obtained as a value corresponding to each pixel, it is generally a discrete function. In that case, the energy spectrum is calculated by discrete Fourier transform, as in the case of obtaining the altitude energy spectrum of the first uneven surface 103 of the antiglare layer 102.

Specifically, the following formula (5) discrete function G (f _x, f _y) by a discrete Fourier transform defined by computes the discrete function G (f _x, f _y) energy spectrum by squaring the Desired. In equation (5), π is a pi, and i is an imaginary unit. M is the number of pixels in the x direction, N is the number of pixels in the y direction, l is an integer from −M / 2 to M / 2, and m is from −N / 2 to N / 2. It is an integer. Delta] f _x and Delta] f _y are the spatial frequency intervals of x and y directions, it is defined by the following formulas (6) and (7). Δx and Δy in Expression (6) and Expression (7) are horizontal resolutions in the x-axis direction and the y-axis direction, respectively. When the pattern is image data, Δx and Δy are equal to the length of one pixel in the x-axis direction and the length in the y-axis direction, respectively. That is, when a pattern is created as 6400 dpi image data, Δx = Δy = 4 μm, and when a pattern is created as 12800 dpi image data, Δx = Δy = 2 μm.

Preferably the pattern to be exposed is random, if the pattern is random, energy spectrum ^{_{G 2 (f x, f y}} ) is symmetrical about the origin _{(f x = 0, f y} = 0). Therefore, energy spectrum ^{_{G 2 (f x, f y}} ) at a spatial frequency (which f _x or f _y) is determined from the cross-section passing through the origin of the energy spectrum ^{_{G 2 (f x, f y}} ) is a two-dimensional function be able to.

If the pattern is random, G ² (f _x , f _y ) can be converted into a one-dimensional function G ² (f) having a distance f (unit: μm ⁻¹ ) from the origin as a variable. it can.

Specifically, referring to FIG. 10, first, all the points located at a distance of (n−1 / 2) Δf or more and less than (n + 1/2) Δf from the origin O (f _x = 0, f _y = 0). The number N _n of points (black circle points in FIG. 10) is calculated. In the example shown in FIG. 10, N _n = 16. Next, the total value G ² _n of G ² (f _x , f _y ) of all points located at a distance of (n−1 / 2) Δf or more and less than (n + 1/2) Δf from the origin O (in FIG. 10) G ² (total value of f _x , f _y ) at the black circle points) is calculated. The one-dimensional function G ² (f) is expressed by the following equation (8):

As shown in FIG. 5, the average value of G ² (f _x , f _y ), that is, the total value G ² _n divided by the number of points N _n is defined.

When M ≧ N, n is an integer of 0 or more and N / 2 or less, and when M <N, n is an integer of 0 or more and M / 2 or less. Further, Δf in the formula (8) represents (Δf _x + Δf _y ) / 2.

The pattern showing the spatial frequency distribution characteristics as described above is, for example, a pattern created by randomly arranging a large number of dots, or a pattern having a random brightness distribution in which the density is determined by a random number or a pseudo-random number generated by a computer On the other hand, it can be obtained by performing a band-pass filter process for removing a low spatial frequency component below a specific spatial frequency S and a high spatial frequency component above a specific spatial frequency T. When a large number of dots are randomly arranged, the shape of the dots may be a circle, a circle such as an ellipse, a polygon, or the like, and a large number of dots having the same shape may be arranged or different. You may arrange many dots of 2 or more types of shapes. The dot diameter is not particularly limited. In addition, the spatial frequency S in the band-pass filter processing is preferably a frequency corresponding to a period of about 1/10 or less with respect to the average pixel size of one side of the display device. The spatial frequency T is preferably 1 / (D × 2) μm ⁻¹ or less. D (μm) is the resolution of a processing apparatus (for example, the above-described laser drawing apparatus) used when processing the concavo-convex shape on the mold.

(7) Exposure Step This step is a step of developing the photosensitive resin film having the pattern exposed [FIG. 9 (f)]. When a negative photosensitive resin is used for the photosensitive resin film 9, the unexposed area 90 is dissolved by the developer, and only the exposed area 91 remains on the first copper plating layer 8, It functions as a mask in the subsequent first etching step. On the other hand, when a positive photosensitive resin is used for the photosensitive resin film 9, only the exposed region 91 is dissolved by the developer, and the unexposed region 90 remains on the first copper plating layer 8. Then, it functions as a mask in the subsequent first etching step. FIG. 9F shows an example in which a positive photosensitive resin is used for the photosensitive resin film 9.

  The developer can be a conventionally known one. Specific examples of the developer include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, and aqueous ammonia; primary amines such as ethylamine and n-propylamine; diethylamine Secondary amines such as di-n-butylamine; tertiary amines such as triethylamine and methyldiethylamine; alcohol amines such as dimethylethanolamine and triethanolamine; tetramethylammonium hydroxide and tetraethylammonium hydroxide Quaternary ammonium salts such as trimethylhydroxyethylammonium hydroxide; alkaline aqueous solutions represented by cyclic amines such as pyrrole and piperidine, and organic solvents such as xylene and toluene.

  The development method is not particularly limited, and methods such as immersion development, spray development, brush development, and ultrasonic development can be used.

(8) 1st etching process This process mainly etches the area | region 81 without a mask of the 1st copper plating layer 8 using the photosensitive resin film 9 which remained after the image development process as a mask (1st etching process). This is a step of forming an uneven shape on the polished surface of the first copper plating layer 8 [FIG. 9 (g)].

The first etching treatment usually corrodes the metal surface using a ferric chloride (FeCl ₃ ) solution, a cupric chloride (CuCl ₂ ) solution, or an alkaline etching solution (Cu (NH ₃ ) ₄ Cl ₂ ). However, a strong acid such as hydrochloric acid or sulfuric acid can be used, or reverse electrolytic etching by applying a potential opposite to that during electrolytic plating can be used.

  The etching amount in the first etching treatment is preferably 1 to 50 μm, more preferably 2 to 10 μm. The “etching amount” is the thickness of the first copper plating layer 8 that is etched away. When the etching amount is less than 1 μm, the concave and convex shape is hardly formed on the surface of the first copper plating layer 8 and the die is almost flat, which is not suitable for producing an antiglare film. In addition, when the etching amount exceeds 50 μm, the height difference of the concavo-convex shape formed on the surface of the first copper plating layer 8 becomes excessively large, and an antiglare film produced using the obtained mold is used. The applied image display device is likely to be whitish. In order to obtain an antiglare film having a first uneven surface including 95% or more of a surface having an inclination angle of 5 ° or less, the etching amount in the first etching treatment is more preferably 2 to 8 μm.

  The first etching process may be performed by one etching process, or may be performed in two or more times. In the case where the etching process is performed twice or more, the total etching amount of these etching processes is preferably within the above range. The etching amount can be controlled by adjusting the etching method, the composition of the processing liquid used for the etching process, the etching temperature, the etching time, and the like. Among them, a method of controlling the magnitude of the etching amount by fixing the method of etching treatment, the composition of the treatment liquid, and the treatment temperature and adjusting the length of the treatment time is simple and preferable.

(9) Photosensitive resin film peeling step In this step, the photosensitive resin film 9 used as a mask is peeled from the surface of the first copper plating layer 8 on which the concavo-convex shape 82 is formed in the first etching step. [FIG. 9 (h)]. The photosensitive resin film 9 is usually dissolved and removed using a stripping solution. As the stripper, the same developer as that described above can be used. By adjusting the pH, temperature, concentration, and / or immersion time of the stripping solution, the exposed part is exposed when a negative photosensitive resin film is used, and the non-exposure is performed when a positive photosensitive resin film is used. Part of the photosensitive resin film is completely dissolved and removed. The peeling method is not particularly limited, and methods such as immersion development, spray development, brush development, and ultrasonic development can be used.

(10) Second Etching Step This step is a step of blunting the concavo-convex shape 82 formed by the first etching step by the second etching process (FIG. 9I). This second etching process eliminates a portion having a steep surface slope in the concavo-convex shape 82 formed by the first etching process, whereby the optical characteristics of the antiglare film manufactured using the obtained mold are preferable. Change in direction.

Similarly to the first etching process, the second etching process is usually a ferric chloride (FeCl ₃ ) solution, a cupric chloride (CuCl ₂ ) solution, an alkaline etching solution (Cu (NH ₃ ) ₄ Cl ₂ ), or the like. Is used by corroding the surface, but strong acid such as hydrochloric acid or sulfuric acid can be used, or reverse electrolytic etching by applying a potential opposite to that at the time of electrolytic plating can also be used.

  The bluntness of the unevenness after the second etching treatment is different depending on the size and depth of the unevenness obtained by the kind of the base metal, the etching method, and the first etching step, so it cannot be generally stated, The largest factor in controlling the dullness is the etching amount. The etching amount here is also the thickness of the first copper plating layer 8. When the etching amount is small, the effect of dulling the uneven shape 82 obtained by the first etching step is insufficient, and the optical characteristics of the antiglare film obtained by transferring the uneven shape are not so good. On the other hand, if the etching amount is too large, the uneven shape is almost lost and a substantially flat mold is formed, which is not suitable for producing an antiglare film. Therefore, the etching amount is preferably in the range of 1 to 50 μm, and in order to obtain an antiglare film having a first uneven surface including 95% or more of a surface having an inclination angle of 5 ° or less, 4 to 20 μm. It is more preferable to be within the range.

  Similarly to the first etching process, the second etching process may be performed by one etching process, or may be performed in two or more times. In the case where the etching process is performed twice or more, the total etching amount of these etching processes is preferably within the above range.

(11) Fourth Plating Step This step is a step of forming a nickel plating layer 83 on the concavo-convex surface of the first copper plating layer 8 composed of the concavo-convex shape 82 blunted by the second etching process [FIG. ]]. The nickel plating layer 83 is a layer that plays a role of protecting the mold surface. By forming the nickel plating layer 83 by nickel plating, it is possible to form a highly durable protective layer that is less prone to cracking. Further, by forming the nickel plating layer 83 having a high covering property on the surface of the first copper plating layer 8 on which the fine concavo-convex shape is formed, the concavo-convex shape is industrially advantageously blunted and the concavo-convex shape is prevented. It changes in a preferable direction as a mold for glare film production.

  When the protective layer is formed not by nickel plating but by chromium plating, fine cracks are generated on the entire surface of the chromium plating protective layer. When this crack structure is transferred as a part of the first uneven surface 103 of the antiglare film, surface scattering increases due to fine unevenness, resulting in glare or reduced contrast. Moreover, since the 1st copper plating layer 8 exposed from a crack rusts gradually, the metal mold | die which has a chromium plating protective layer tends to lack long-term storage stability. Furthermore, such rust causes defects on the mold surface, and the defects can adversely affect the uneven shape of the first uneven surface 103 of the antiglare film.

  The type of nickel plating is not particularly limited, but it is preferable to use nickel plating that expresses good gloss, so-called bright nickel plating. Nickel plating is preferably performed by electrolysis, and an aqueous solution containing nickel sulfate, nickel chloride, and boric acid is used as the plating bath. The thickness of the nickel plating layer 83 can be controlled by adjusting the current density and the electrolysis time.

  The greatest factor in controlling the bluntness of the uneven shape by the nickel plating layer 83 is the plating thickness. When the thickness of the nickel plating layer 83 is thin, the effect of dulling the uneven shape is insufficient, and the optical characteristics of the antiglare film obtained by transferring the uneven shape are not so good. On the other hand, when the thickness of the nickel plating layer 83 is too thick, the cost increases and the productivity decreases, and a projection-like plating defect called a nodule may occur. Therefore, the thickness of the nickel plating layer 83 is preferably in the range of 1 to 10 μm, and more preferably in the range of 2 to 8 μm.

  If the thickness of the nickel plating layer 83 is less than 1 μm, it is difficult to control the film thickness, so that the plating cannot be performed uniformly and unevenness occurs, or the protection of the base becomes insufficient. obtain. Further, if the thickness of the nickel plating layer 83 is 10 μm or more, the uneven shape of the mold surface may be flattened and desired optical characteristics may not be obtained.

(12) Vapor deposition step This step is an optional step in which a protective layer 85 containing carbon as a main component is formed on the surface 84 of the nickel plating layer 83 opposite to the first copper plating layer 8 by vapor deposition. Yes (FIG. 9 (k)). When the protective layer 85 is formed, the surface of the protective layer 85 is a second uneven surface, and when the protective layer 85 is not formed, the surface of the nickel plating layer 83 is a second uneven surface. The protective layer 85 containing carbon as a main component is glossy, has a high hardness, and has a small friction coefficient, so that it can provide good releasability. The protective layer 85 can improve the surface hardness and wear resistance of the mold and further improve the durability of the mold. That is, by forming the protective layer 85, it is possible to prevent the unevenness from being worn away or the mold from being damaged during use.

  The protective layer 85 is preferably a protective film called diamond-like carbon, such as a hydrogenated amorphous carbon film, a tetrahedral amorphous carbon film, a hydrogenated tetrahedral amorphous film, or a sputtered amorphous carbon film. The protective layer 85 may contain some other elements such as hydrogen and oxygen.

  As a method for forming the protective layer 85, various vapor deposition methods can be used. For example, a hydrogenated amorphous carbon film or a hydrogenated tetrahedral amorphous film can be formed by a plasma CVD method, an ionized vapor deposition method, or the like. The sputtered amorphous carbon film can be formed by a sputtering method or the like by an ion beam evaporation method or the like.

  Even when the protective layer 85 is formed, it is desirable that the uneven shape on the mold surface after the nickel plating layer 83 is formed hardly change. Therefore, the thickness of the protective layer 85 is in the range of 0.1 to 5 μm. It is preferable that it is in the range of 0.5 to 3 μm. If the thickness of the protective layer 85 is excessively thin, the mold durability improvement effect may be insufficient. On the other hand, when the thickness of the protective layer 85 is excessively thick, not only the productivity is lowered, but also the uneven shape of the mold surface is changed by the formation of the protective layer 85, and the antiglare film having the desired first uneven surface. May not be obtained.

  EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated in detail, this invention is not limited to these. The mold for producing the antiglare film performed in the following example, the pattern used for producing the mold, the evaluation items of the antiglare film, and the evaluation method thereof are as follows.

[1] Measurement of spatial frequency distribution characteristics of antiglare film, mold and pattern (a) Energy spectrum of altitude of first uneven surface of antiglare layer Using three-dimensional microscope “PLμ2300” (manufactured by Sensofar), The uneven shape of the first uneven surface of the antiglare layer of the antiglare film was measured. In order to prevent warpage of the antiglare film, measurement was performed after the antiglare film was bonded to the glass substrate using an optically transparent adhesive so that the first uneven surface was the outermost surface. At the time of measurement, the magnification of the objective lens was 10 times. The horizontal resolutions Δx and Δy were both 1.66 μm and the measurement area was 850 μm × 850 μm.

From the measurement data obtained above, the elevation of the first uneven surface of the antiglare film is obtained as a two-dimensional function h (x, y), and the obtained two-dimensional function h (x, y) is subjected to discrete Fourier transform. two-dimensional function H (f _x, f _y) was determined. Two-dimensional function H (f _x, f _y) a two-dimensional function ^{_{H 2 (f x, f y}} ) of the energy spectrum of the altitude and squaring calculates a, H ² (0 is a cross-sectional curve of f _x = 0, than f _y), energy spectrum H ₁ ² in a spatial frequency 0.01 [mu] m ^-1, the energy spectrum H ₂ ² in the spatial frequency 0.1 [mu] m ^-1, the energy spectrum H ₃ ² and a spatial frequency in a spatial frequency 0.04 .mu.m ^-1 0 The energy spectrum H ₄ ² at 0.06 μm ⁻¹ was determined, and the energy spectrum ratios H ₁ ² / H ₂ ² , H ₃ ² / H ₂ ² and H ₄ ² / H ₂ ² were calculated.

(B) Elevation energy spectrum of the second uneven surface of the mold In the same manner as the energy spectrum of the elevation of the first uneven surface of the antiglare layer, the uneven shape of the second uneven surface of the mold is measured, The energy spectrum ratios H ₁ ² / H ₂ ² , H ₃ ² / H ₂ ² and H ₄ ² / H ₂ ² were calculated.

(C) Energy spectrum of pattern The gradation of the pattern for mold production created as image data is represented by a two-dimensional discrete function g (x, y). The horizontal resolutions Δx and Δy of the discrete function g (x, y) are both 2 μm. The resulting two-dimensional discrete function g (x, y) and discrete Fourier transform determined a two-dimensional function _{G (f x, f y)} , the two-dimensional function G ² (f _x energy spectrum by squaring this , F _y ) and G ² (0, f _y ), which is a cross-sectional curve of f _x = 0, within a spatial frequency range of 0.05 to 0.1 μm ⁻¹ and 0.007 to 0.015 μm ^−. The presence or absence of a local maximum value in the range of ¹ and the local maximum value (the intensity of the energy spectrum at the peak) were determined.

[2] Inclination angle of the first uneven surface of the antiglare layer Based on the measurement data obtained by the three-dimensional microscope obtained above, a histogram of the inclination angle of the first uneven surface is calculated based on the algorithm described above. The distribution was made for each inclination angle from the created area, and the ratio of the surfaces having the inclination angle of 5 ° or less was calculated.

[3] Maximum cross-sectional height Rt of the first uneven surface of the antiglare layer
The maximum surface height Rt of the first uneven surface of the antiglare layer was measured using a small surface roughness measuring machine Surf Test SJ-301 (manufactured by Mitutoyo Corporation) in accordance with JIS B 0601: 2001.

[4] Optical properties of antiglare film (a) Haze Using a haze meter “HM-150” (manufactured by Murakami Color Research Laboratory Co., Ltd.) in accordance with JIS K 7136, the antiglare film Total haze was measured. In order to prevent warpage of the antiglare film, measurement was performed after the antiglare film was bonded to the glass substrate using an optically transparent adhesive so that the first uneven surface was the outermost surface.

  Next, the first concavo-convex surface was bonded with a triacetyl cellulose film having substantially zero haze using glycerin, and the haze was measured in the same manner as the measurement of all hazes. did. From the total haze value and the internal haze value obtained, the surface haze was calculated by the above formula [B].

  In general, when the haze increases, the image becomes dark when the antiglare film is applied to the image display device, and as a result, the front contrast tends to decrease. Therefore, a lower haze is preferable.

(B) Reflection and whitish In order to prevent reflection from the back surface of the antiglare film, after the antiglare film is bonded to the black acrylic resin plate so that the first uneven surface becomes the outermost surface, the fluorescent lamp Observation was performed from the surface of the first uneven surface in a bright room with a mark, and the presence or absence of reflection of a fluorescent lamp and the degree of whitish were visually evaluated according to the following criteria.

Reflection A: Reflection is not observed,
B: Reflection is slightly observed,
C: Reflection is clearly observed.

Whiteness A: Whiteness is not observed,
B: A little whitish is observed,
C: Whitish is clearly observed.

(C) Contrast and Glitter The original polarizing plate on both the front and back sides of the liquid crystal cell is peeled off from the commercially available liquid crystal television 55XS5 (manufactured by Toshiba Corporation), and the polarizing plate “Sumikaran SRDB31E” is provided on both the back side and the display side. (Sumitomo Chemical Co., Ltd.) was bonded via an adhesive so that each absorption axis coincided with the absorption axis of the original polarizing plate. Next, on the display surface side polarizing plate, the antiglare film shown in each of the following examples was bonded via an adhesive so that the first concavo-convex surface became the outermost surface, and a liquid crystal display device for evaluation was produced. .

  In a dark room, using a luminance meter BM-5A (manufactured by Topcon Corporation), the front luminance in the white display state and the black display state of the evaluation liquid crystal display device is measured, and the contrast (front contrast) is calculated as the ratio of these. Evaluation was made according to the following criteria.

  Moreover, the liquid crystal display device for evaluation was operated in a bright room with a fluorescent lamp, and the degree of glare was evaluated according to the following criteria by visual observation from a position about 30 cm away from the display surface.

Contrast A: The decrease in contrast is less than 5% compared to the state where the antiglare film is not bonded.
B: The decrease in contrast is 5 to 10% compared to the state in which the antiglare film is not bonded.
C: The decrease in contrast is more than 10% as compared with the state where the antiglare film is not bonded.

Glitter A: Glitter is not observed,
B: Some glare is observed,
C: Glare is clearly observed.

[5] Durability of molds The molds produced in Examples 1 and 2 and Comparative Example 1 were placed in a wooden box and stored for 3 months in a room where temperature and humidity were not controlled. After storage, the mold surface was visually observed to evaluate the occurrence of corrosion in the first copper plating layer. The case where corrosion did not occur was A, and the case where corrosion occurred was B.

<Example 1>
(Production of anti-glare film manufacturing mold)
An aluminum roll having a diameter of 200 mm (A5056 according to JIS) was prepared by applying copper ballad plating to the surface. The copper ballad plating is composed of a second copper plating layer / silver plating layer / first copper plating layer, and the total thickness of these plating layers is about 200 μm. The surface of the first copper plating layer was mirror-polished, and a photosensitive resin was applied to the polished surface and dried to form a photosensitive resin film. A positive photosensitive resin was used for the photosensitive resin film.

Next, a pattern in which a plurality of patterns consisting of image data shown in FIG. 11 were continuously arranged repeatedly was exposed on a photosensitive resin film with a laser beam and developed. Exposure by laser light and development were performed using “Laser Stream FX” (manufactured by Sink Laboratories). The pattern shown in FIG. 11 is a band that removes a low spatial frequency component having a spatial frequency of 0.040 μm ⁻¹ or less and a high spatial frequency component having a spatial frequency of 0.070 μm ⁻¹ or more from a pattern having a random brightness distribution. Created by applying a path filter. Energy spectrum _{^{G 2 (f x, f y}} ) calculated for the pattern used for exposure of the cross-section at f _x = 0 in FIG. 12. As shown in FIG. 12, the pattern had the maximum value within the range and 0.007～0.015Myuemu ^-1 spatial frequency 0.05 to 0.1 [mu] m ^-1. The respective maximum values (energy spectrum intensity at the peak) were 1.1 and 0.11.

  Then, the 1st etching process was performed with the cupric chloride liquid by using the developed photosensitive resin film as a mask. The etching amount was 3 μm. Next, after removing the photosensitive resin film on the first copper plating layer, a second etching process was performed using a cupric chloride solution. The etching amount was 10 μm. Then, the nickel plating process was performed and the metal mold | die was produced. The thickness of the nickel plating layer was 4 μm.

(Preparation of antiglare film)
Photocurable resin composition GRANDIC 806T (manufactured by Dainippon Ink & Chemicals, Inc.) was diluted with ethyl acetate to give a 50% strength solution. Further, photopolymerization initiator Lucillin TPO (manufactured by BASF Chemical Co., Ltd.) (Name: 2,4,6-trimethylbenzoyldiphenylphosphine oxide) was added in an amount of 5 parts by weight per 100 parts by weight of the photocurable resin component to prepare a coating solution for forming an antiglare layer.

In a drier set at 60 ° C., the coating liquid was applied on one side of a 80 μm thick triacetylcellulose (TAC) film so that the thickness of the photocurable resin composition layer after drying was 5 μm. Dry for 3 minutes. The dried film was brought into close contact with the uneven surface (second uneven surface) of the mold obtained above with a rubber roll so that the photo-curable resin composition layer was on the mold side. In this state, light from a high-pressure mercury lamp with an intensity of 20 mW / cm ² was irradiated from the TAC film side so that the amount of light in terms of h-line was 200 mJ / cm ² to cure the photocurable resin composition layer. Then, the TAC film was peeled from the mold together with the cured resin layer, and a transparent antiglare film comprising a laminate of the cured resin layer (antiglare layer) having the first uneven surface and the TAC film was produced.

<Example 2>
A mold was produced in the same manner as in Example 1 except that a protective layer made of a diamond-like carbon (DLC) film as the protective film 85 was formed on the nickel plating layer by sputtering. The thickness of the protective layer was 0.5 μm. Next, an antiglare film was produced in the same manner as in Example 1 except that this mold was used.

<Comparative Example 1>
A mold was produced in the same manner as in Example 1 except that chromium plating was performed instead of nickel plating. The thickness of the chromium plating layer was 4 μm. Next, an antiglare film was produced in the same manner as in Example 1 except that this mold was used.

<Comparative example 2>
An antiglare film was produced as follows without using a mold. 60 parts by weight of pentaerythritol triacrylate, 40 parts by weight of polyfunctional urethanized acrylate (reaction product of isophorone diisocyanate and t-butyl methacrylate), polystyrene particles (refractive index: 1.59, weight average particle size: 2 μm) 3 After mixing parts by weight and isopropanol, a solution having a solid content of 50% by weight was obtained, and then Irgacure 184 (manufactured by Ciba Specialty Chemicals) as a photopolymerization initiator was added to this per 100 parts by weight of the photocurable resin component. 5 parts by weight was added to prepare a coating solution for forming an antiglare layer.

In a drier set at 60 ° C., the coating liquid was applied on one side of a 80 μm thick triacetylcellulose (TAC) film so that the thickness of the photocurable resin composition layer after drying was 2 μm. Dry for 3 minutes. The film after drying is irradiated with light from a high-pressure mercury lamp having an intensity of 20 mW / cm ² from the photocurable resin composition layer side so that the amount of light in terms of h-line is 200 mJ / cm ² . By curing the resin composition layer, a transparent antiglare film consisting of a laminate of a cured resin layer (antiglare layer) having a first uneven surface and a TAC film was produced.

<Comparative Example 3>
Except for containing 25 parts by weight of polystyrene-based particles (refractive index: 1.59, weight average particle diameter: 3 μm) per 100 parts by weight of the photocurable resin component in the coating solution for forming the antiglare layer, An antiglare film was produced in the same manner as in Comparative Example 1.

  Table 1 shows the measurement results of the spatial frequency distribution characteristics and the durability evaluation results of the molds produced in Example 1, Example 2, Comparative Example 1 and Comparative Example 3. In addition, since the metal mold | die of Example 2 showed the spatial frequency distribution characteristic substantially equivalent to the metal mold | die of Example 1, the spatial frequency distribution characteristic of the metal mold | die of Example 2 is omitted.

  When the 2nd uneven surface of the metal mold | die of the comparative example 1 and 3 which formed the chromium plating layer in the outermost surface which forms the 2nd uneven surface was observed with the optical microscope, the fine crack was confirmed on the whole surface. In the above durability test, corrosion was confirmed in the first copper plating layer exposed from the crack.

Table 2 summarizes the structures and evaluation results of the antiglare films prepared in each Example and Comparative Example. Also, figure shows a cross section taken along f _x = 0 in Example 1 and Comparative Examples 1 to 3 energy spectrum of elevation of the first concave-convex surface having antiglare film produced is at ^{_{H 2 (f x, f y}} ) 13 Shown in In addition, the anti-glare film of Example 2 showed the energy spectrum substantially equivalent to the anti-glare film of Example 1.

  The antiglare films of Examples 1 and 2 exhibited predetermined spatial frequency distribution characteristics, had excellent antiglare performance, exhibited high contrast, and were able to prevent whitish and glare. On the other hand, the antiglare film of Comparative Example 1 produced using a mold having an outermost surface made of a chromium plating layer did not satisfy the predetermined spatial frequency distribution characteristics, and glare was recognized. Similarly, the antiglare film of Comparative Example 3 produced using a mold having an outermost surface made of a chrome plating layer contained a large amount of particles in the antiglare layer, so that glare was eliminated, but whitishness occurred. Contrast also decreased. When the 1st uneven | corrugated surface of the anti-glare film of the comparative examples 1 and 3 was observed with the optical microscope, the fine crack was confirmed on the whole surface.

  The antiglare film of Comparative Example 2 produced without using a mold also did not satisfy the predetermined spatial frequency distribution characteristics, and was whitish and glaring.

  DESCRIPTION OF SYMBOLS 1 Anti-glare film, 2 Concavity and convexity which comprises the 1st uneven surface, 3 Projection surface of anti-glare film, 5 Main normal direction of anti-glare film, 6 Local normal which considered unevenness, ψ Surface inclination angle, 6a , 6b, 6c, 6d Polygon surface normal vector, 7 base material, 8 first copper plating layer, 9 photosensitive resin film, 71 second copper plating layer, 72 silver plating layer, 80 surface of first copper plating layer 81 Unmasked region of the first copper plating layer 82 Uneven shape of the first copper plating layer 83 Nickel plating layer 84 Surface of the nickel plating layer 85 Protection layer 90 Unexposed region of the photosensitive resin film 91, Exposed region of photosensitive resin film, 101 Translucent support layer, 102 Anti-glare layer, 103 First uneven surface.

Claims (11)

Including a translucent support layer and an antiglare layer laminated on the translucent support layer,
In the antiglare layer, the surface opposite to the translucent support layer is composed of a first uneven surface,
The ratio H ₁ ² between the energy spectrum H ₁ ² of the elevation of the first uneven surface at a spatial frequency of 0.01 μm ⁻¹ and the energy spectrum H ₂ ² of the elevation of the first uneven surface at a spatial frequency of 0.1 μm ⁻¹ . / H ₂ ² is in the range of 2000 to 6000,
The energy spectrum H ₃ ² elevation of the first concave-convex surface in the spatial frequency 0.04 .mu.m ^-1, the ratio H ₃ of the energy spectrum H ₂ ² elevation of the first uneven surface in a spatial frequency 0.1 [mu] m ^{-1 2} / H ₂ ² is in the range of 30 to 60, the antiglare film. The ratio H ₄ ² between the energy spectrum H ₄ ² of the elevation of the first uneven surface at a spatial frequency of 0.06 μm ⁻¹ and the energy spectrum H ₂ ² of the elevation of the first uneven surface at a spatial frequency of 0.1 μm ⁻¹ . The antiglare film according to claim 1, wherein / H ₂ ² is 10 or more.   The antiglare film according to claim 1 or 2, wherein the first uneven surface includes 95% or more of a surface having an inclination angle of 5 ° or less.   The anti-glare film according to any one of claims 1 to 3, wherein the total haze is less than 1.5%. A mold for producing the antiglare film according to any one of claims 1 to 4,
Including a base material, a first copper plating layer, and a nickel plating layer in this order;
The outermost surface opposite to the base material is composed of a second uneven surface,
The ratio H ₁ ² between the energy spectrum H ₁ ² of the altitude of the second uneven surface at a spatial frequency of 0.01 μm ⁻¹ and the energy spectrum H ₂ ² of the altitude of the second uneven surface at a spatial frequency of 0.1 μm ⁻¹ . / H ₂ ² is in the range of 2000 to 6000,
The energy spectrum H ₃ ² elevation of the second concave-convex surface in the spatial frequency 0.04 .mu.m ^-1, the ratio H ₃ of the energy spectrum H ₂ ² elevation of the second concave-convex surface in the spatial frequency 0.1 [mu] m ^{-1 2} Mold with / H ₂ ² in the range of 30-60. The ratio H ₄ ² of the altitude energy spectrum H ₄ ² of the second uneven surface at a spatial frequency of 0.06 μm ⁻¹ and the altitude energy spectrum H ₂ ² of the second uneven surface at a spatial frequency of 0.1 μm ⁻¹ . The mold according to claim 5, wherein / H ₂ ² is 10 or more.   The metal mold | die of Claim 5 or 6 further including the protective layer which has as a main component the carbon laminated | stacked on the said nickel plating layer.   The metal mold | die in any one of Claims 5-7 containing the said base material, a 2nd copper plating layer, a silver plating layer, a said 1st copper plating layer, and the said nickel plating layer in this order. A method for producing a mold according to any one of claims 5 to 8,
Forming the first copper plating layer on the substrate;
Polishing the surface of the first copper plating layer;
Forming a photosensitive resin film on the polished surface of the first copper plating layer;
Exposing a pattern on the photosensitive resin film;
Developing a photosensitive resin film exposed to the pattern;
Performing a first etching process using the developed photosensitive resin film as a mask, and forming a concavo-convex shape on the polished surface of the first copper plating layer;
Peeling the photosensitive resin film;
Dulling the uneven shape by a second etching process;
Forming the nickel plating layer on the concavo-convex surface of the first copper plating layer comprising the concavo-convex shape blunted by the second etching process;
Including
The said pattern shows the energy spectrum which has a local maximum in the range of 0.05-0.1 micrometer < ^-1 > spatial frequency, The manufacturing method of a metal mold | die. The said energy spectrum is a manufacturing method of the metal mold | die of Claim 9 which further has local maximum in the range of 0.007-0.015 micrometer < ^-1 > spatial frequency. Preparing the mold according to any one of claims 5 to 8,
Transferring the concavo-convex shape of the second concavo-convex surface of the mold to the surface of the resin layer laminated on the translucent support layer;
A method for producing an antiglare film, comprising: